TW202004264A - Moire fringe suppression film, laminated film for moire fringe suppression and composite display device with moire fringe suppression film - Google Patents

Abstract

Provided is a moire fringe suppression film and the like, having a maintaining predetermined straight transmission and an effectively suppressing a moire phenomenon and the like. A moire fringe suppression film and the like for suppressing a moire phenomenon caused by a difference between two spatial frequencies, comprises a plurality of columnar objects made of a material having a comparatively high refractive index in a region having a comparatively low refractive index consisted of a single layer and has a straight transmittance defined by a following relational expression (1) which is set to a value of 8% or less. Straight transmittance = Lp/Lo*100 (1) (Lp: Luminance of transmitted light measured with a moire fringe suppression film provided between two polarizing plates arranged in Parallel Nicol state (cd/m2), Lo: Luminance of transmitted light measured with only two polarizing plates arranged in Parallel Nicol state (cd/m2)).

Description

Ripple suppression film, ripple suppression film laminate, composite display device with ripple suppression film

The invention relates to a ripple suppression film, a ripple suppression film laminate, and a composite display device provided with a ripple suppression film. In particular, when a liquid crystal panel or the like includes a fine-patterned structure layer inside, when it is used between two optical members with a patterned structure layer, the ripple suppression is excellent, and furthermore, it can be displayed due to the excellent anti-scattering property of the incident light. A ripple suppression film for an image with excellent contrast, a ripple suppression film laminate, and a composite display device provided with a ripple suppression film.

Conventionally, as a type of display device, a stereoscopic image display device that stereoscopically displays an image (Patent Document 1 etc.) has been proposed. More specifically, it is a stereoscopic image display device, which is a stereoscopic image display device with a structure in which two liquid crystal cells overlap in the vertical direction. By adjusting the brightness of each liquid crystal cell in the image direction, the two eyes of the recognizer Send different image information, and display the image stereoscopically.

In addition, a liquid crystal display device (Patent Documents 2 to 3, etc.) that improves contrast and further attempts to suppress moire is also proposed. More specifically, it is a liquid crystal display device including a light source unit, a first liquid crystal panel that displays a first image based on an image signal, and a second liquid crystal panel that displays a second image corresponding to the first image, the first liquid crystal panel Separated from the second liquid crystal panel, a particle dispersion type light diffusion layer having a specific haze value is used between the panels. [Prior Technical Literature] [Patent Literature]

[Patent Document 1] Japanese Patent Laid-Open No. 2015-114371 (application of patent scope, etc.) [Patent Document 2] Japanese Patent Laid-Open No. 2015-191052 (Application for Patent Scope etc.) [Patent Document 3] Japanese Patent No. 487803 (Patent Application etc.)

[Problem to be solved by invention]

Here, the three-dimensional image display device disclosed in Patent Document 1 has a structure in which two liquid crystal cells face each other with a gap. Moreover, the liquid crystal cell has a pattern structure layer such as a color filter inside. Therefore, the stereoscopic image display device disclosed in Patent Document 1 will see a problem that the optical interference in the two patterned structure layers corresponding to the two liquid crystal cells causes moire phenomenon, which makes it difficult to see the stereoscopic image display.

In addition, the liquid crystal display devices disclosed in Patent Documents 2 and 3 each propose to use only particle dispersion having a specific haze value (for example, 50% or more or 90% or more) between the first liquid crystal display panel and the second liquid crystal display panel Type of light diffusion layer. Indeed, even for this light diffusion layer, although it exhibits ripple suppression to some extent, it cannot be said to be sufficient. In addition, when only the particle-dispersed light diffusion layer is used as the light diffusion layer, the problem of backscattering of incident light occurs, which makes it difficult to obtain a high-contrast stereoscopic image display.

Therefore, in view of the above circumstances, the present inventors have made great efforts and found that by using an optical member having at least an internal refractive index distribution structure between the optical member of the first patterned structure layer and the optical member of the second patterned structure layer The ripple suppression film, and the linear transmittance expressed by the specific relational expression is controlled to a specific value or less, so that the ripple controllability is excellent, and the backscattering is small, so the contrast can be increased, and the present invention has been completed. That is, an object of the present invention is to provide a ripple suppression film that is excellent in ripple suppression properties and has low backscattering, which can increase contrast, a ripple suppression film laminate including these ripple suppression films, and a ripple suppression film provided with these Composite display device for good stereoscopic image display. [Means to solve the problem]

According to the present invention, a ripple suppression film is provided, which is a ripple suppression film that suppresses the ripple phenomenon caused by the difference in two spatial frequencies, and is characterized by a relatively low refractive index region formed by a single layer, having The above-mentioned problems can be solved by a plurality of columns formed of a relatively high-refractive index material, and the linear transmittance of the ripple suppression film defined by the following relationship (1) is 8% or less. Straight transmittance = Lp/Lo×100 (1) (Lp: the brightness of the transmitted light (cd/m ² measured between the two polarizers arranged in a parallel Nicol lens state with the ripple suppression film interposed ), Lo: The brightness (cd/m ² ) of the transmitted light measured only for the two polarizing plates arranged in a parallel Nicol lens state. The use of a corrugation suppression film having such an internal refractive index distribution structure and a specific linear transmittance between two optical members containing a patterned structure layer is excellent in corrugation suppression. In addition, a high-contrast stereo image can be recognized.

Furthermore, when configuring the present invention, when the traveling direction of the manufacturing step of the ripple suppression film is set to the MD direction, and the direction crossing the horizontal and vertical direction of the manufacturing step is set to the TD direction, MD is preferably used The direction and TD directions are based on the ±70˚ variable-angle haze value, or the variable-angle haze value on either side is set to a value of 80% or more. By making such a ripple suppression film that considers the variable angle haze value based on the MD direction and the TD direction at the time of manufacture of the ripple suppression film, excellent ripple suppression properties can be obtained no matter which direction is recognized.

Furthermore, when constituting the present invention, it is preferable to set the haze value (normal haze value) measured according to JIS K 7136: 2000 to a value of 80% or more. By creating a ripple suppression film that also considers the normal haze value measured in accordance with JIS, it is possible to obtain more excellent ripple suppression regardless of thickness deviations and the like.

Furthermore, when constituting the present invention, the thickness is preferably set to a value in the range of 40 to 500 μm. By making a ripple suppression film with such a thickness, even when it is arranged and used between, for example, an optical member of a first patterned structural layer and an optical member of a second patterned structural layer, the whole does not become excessively thick, but Obtain excellent ripple suppression.

Moreover, when constituting the present invention, it is preferable to provide an adhesive layer on at least one surface. By making such a ripple control film, the usability can be improved, and the gap between the optical member of the first patterned structural layer and the optical member of the second patterned structural layer can be strongly maintained.

In addition, another aspect of the present invention is a ripple suppression film laminate including any of the aforementioned ripple suppression films, and it is preferable to provide a particle dispersion type light diffusion layer on at least one surface of the ripple suppression film. By using the ripple suppression film and the particle-dispersed light diffusion layer in combination with these light diffusion layers with an internal refractive index distribution structure, the ripple suppression or contrast can be finely adjusted, and the overall manufacturing cost of the ripple suppression film becomes variable Low, it is economically advantageous. Furthermore, by using a particle-dispersed light diffusion layer of a specific thickness in combination, the following advantages can also be obtained: it can correspond to the gap between the optical member of the first patterned structure layer and the second optical member of the patterned structure layer, easily Adjust the entire light diffusion layer to an appropriate thickness.

In addition, another aspect of the present invention is a ripple suppression film laminate that suppresses the ripple phenomenon caused by the difference in two spatial frequencies and includes a first ripple suppression film and a second ripple suppression film The laminate is characterized in that the first ripple suppression film and the second ripple suppression film have a plurality of pillars made of a relatively high refractive index material in a region with a relatively low refractive index made of a single layer, The angle formed between the MD direction of the first ripple suppression film and the MD direction of the second ripple suppression film is set to a value in the range of 1 to 179˚, and the layer of the ripple suppression film laminate defined by the above relationship (1) The linear transmittance is set to a value of 8% or less. By adjusting the angle formed between the MD direction of the first ripple suppression film and the MD direction of the second ripple suppression film in this way, even when there is a deviation in the direction of the light diffusivity, the variable angle haze can be further finely controlled Value, the ripple suppression can be more effectively exerted.

In addition, another aspect of the present invention is a composite display device having at least an optical member disposed between a first pattern-containing structural layer and a second pattern-containing structural layer, and capable of suppressing two factors The composite display device of the ripple suppression film of the ripple phenomenon caused by the spatial frequency difference is characterized in that the ripple suppression film is made of a relatively high refractive index material in a region with a relatively low refractive index formed by a single layer A plurality of columns, and the linear transmittance of the ripple suppression film defined by the above relationship (1) is set to a value of 8% or less. By forming the composite display device using the ripple suppression film having an internal refractive index distribution structure and the like between the optical member of the first patterned structure layer and the optical member of the second patterned structure layer, good ripples are obtained Inhibition, in addition, there is less backscattering, and high-contrast images can be recognized.

[First Embodiment] The first embodiment is a ripple suppression film 10, as shown in FIGS. 1 and 2(a) to (c), a ripple suppression film that suppresses the ripple phenomenon caused by the difference in two spatial frequencies, It is characterized by a relatively low refractive index region formed by a single layer, having a plurality of pillars made of a relatively high refractive index material, and the ripple suppression film defined by the following relationship (1) The linear transmittance is set to a value of 8% or less. Straight transmittance = Lp/Lo×100 (1) (Lp: the brightness of the transmitted light (cd/m ² measured between the two polarizers arranged in a parallel Nicol lens state with the ripple suppression film interposed ), Lo: The brightness (cd/m ² ) of the transmitted light measured only for the two polarizing plates arranged in a parallel Nicol lens state.

1 is a schematic perspective view of the ripple suppression film 10, FIG. 2(a) is a vertical cross-sectional view of the ripple suppression film 10, and FIG. 2(b) is a vertical cross-section of an example in which the peeling film 16 is provided on one side of the ripple suppression film 2(c) is a vertical cross-sectional view of an example in which peeling films 16a and 16b are provided on both sides of the ripple suppression film 10. Hereinafter, the ripple suppression film 10 according to the first embodiment of the present invention will be specifically described with reference to the drawings.

1. Basic Structure As shown in FIGS. 1 and 2(a) to (c), the ripple suppression film 10 has an internal refractive index distribution structure made of a single layer as a basic structure, and is provided in a single layer with a relatively low refractive index The structure of the refractive index region 14 and the plural columns 12 made of a relatively high refractive index material. That is, as shown in FIG. 2(a), the column 12 having a relatively high refractive index has a specific interval (t3) within the low-refractive index region 14 having a relatively low refractive index existing around it, and becomes a standing Set state. Thereby, the effect as a light diffusion film can be exerted. When the incident light is within the light diffusion incident angle region, it can be fully diffused in the direction of travel. On the other hand, when the light diffusion is outside the incident angle region, it can be along The direction of travel passes directly through the plural columns, or shows a weaker diffusion than in the area of the incident angle of light diffusion.

Therefore, if it is possible to diffuse and transmit such specific incident light, the so-called phase-separated type light diffusion film with an internal refractive index distribution structure in which the specific incident light can be directly transmitted or weakly diffused to diffuse light is preferred. To use. More specifically, if it is a simple pillar structure (refer to FIG. 1 etc.), a pillar structure having a bent portion, a pillar structure having a repeated structure in a single layer/a combined structure of the pillar structure, a simple structure made up of a plurality of layers At least one of the combined structure (see FIG. 6 etc.) of the pillar structure can be used as an image display device which can sufficiently suppress the ripple phenomenon caused by the difference in two spatial frequencies and obtain a high contrast image display device film.

2. Pillars with relatively high refractive index (1) High refractive index section In addition, the type of material used to form the high-refractive-index portion (hereinafter sometimes simply referred to as the high-refractive-index portion) of the relatively high-refractive-index columns in the low-refractive-index region is not particularly limited, but it is generally preferred The main component is a (meth)acrylate polymer containing a plurality of aromatic rings. The reason is that if it is the material substance, not only can the high refractive index portion be effectively formed, but also the dependence of the incident angle from the high refractive index portion and the divergence angle of diffused light can be further improved. That is, it is presumed that the main component of the high refractive index portion (hereinafter sometimes referred to as (A1) component) is a polymer of a specific (meth)acrylate, and the light irradiated by the active energy ray Polymerization to make the monomer component (A1) component (hereinafter sometimes referred to as monomer (A1) component) polymerize faster than the main component of the low refractive index portion (hereinafter sometimes referred to as (B1) component) The reason for the polymerization rate of the monomer component (hereinafter sometimes referred to as the monomer (B1) component). Therefore, it is presumed that there is a specific difference in the polymerization rate between the monomer components, and the uniform copolymerization of the two monomer components with each other is suppressed, more specifically, by reducing the compatibility of the two monomer components to a specific range Phase separation can effectively reduce the copolymerization of the two monomer components.

Examples of the (meth)acrylate containing plural aromatic rings as components of these monomers (A1) include biphenyl (meth)acrylate, naphthyl (meth)acrylate, anthracene (meth)acrylate, ( Benzylphenyl methacrylate, biphenoxyalkyl (meth)acrylate, naphthoxyalkyl (meth)acrylate, anthracoxyalkyl (meth)acrylate, benzyl (meth)acrylate Phenoxyalkyl esters, etc., or at least one of the compounds in which some of these are substituted with halogen, alkyl, alkoxy, halogenated alkyl, etc.

Furthermore, the (meth)acrylate containing a plurality of aromatic rings as a component of the monomer (A1) preferably contains a biphenyl ring-containing compound, and particularly preferably contains a biphenyl compound represented by the following general formula (1).

(In the general formula (1), R ¹ to R ¹⁰ are independent, and at least one of R ¹ to R ¹⁰ is a substituent represented by the following general formula (2), and the rest are a hydrogen atom, a hydroxyl group, a carboxyl group, an alkyl group, Alkoxy, halogenated alkyl, hydroxyalkyl, carboxyalkyl and any substituent of halogen atom).

(In the general formula (2), R ¹¹ is a hydrogen atom or a methyl group, the carbon number n is an integer of 1 to 4, and the repetition number m is an integer of 1 to 10).

The reason is presumed that by using a biphenyl compound having a specific structure as the monomer (A1) component, the polymerization rate of the monomer (A1) component can be made faster than the polymerization rate of the monomer (B1) component. In addition, it is estimated that the compatibility with the monomer (B1) component can be more easily reduced to a specific range, and the refractive index of the region derived from the (A1) component can be increased. As a result, it can be more easily derived from the (B1) component. The difference in the refractive index of the component area is adjusted to a value above a specific value. Furthermore, depending on the biphenyl compound having a specific structure, it is in a liquid state at the monomer stage before light curing, and there are amino acids that can be used as a representative example of the monomer (B1) component even without using a dilution solvent, etc. The advantages of uniform mixing of ester (meth)acrylate.

In addition, when the substituents R ¹ to R ¹⁰ in the general formula (1) include any one of an alkyl group, an alkoxy group, a halogenated alkyl group, a hydroxyalkyl group, and a carboxyalkyl group, the carbon number of the alkyl portion is preferably Set to a value within the range of 1 to 4. The reason is that when the carbon number is set to a value exceeding 4, the polymerization rate of the monomer (A1) component decreases, the refractive index of the region derived from the (A1) component is too low, and it is difficult to effectively form specific pillars The reason. Therefore, when the substituents R ¹ to R ¹⁰ in the general formula (1) include any one of an alkyl group, an alkoxy group, a halogenated alkyl group, a hydroxyalkyl group, and a carboxyalkyl group, the carbon number of the alkyl portion is better It is set to a value within the range of 1~3, and more preferably to a value within the range of 1~2.

In addition, any of R ² to R ⁹ in the general formula (1) is preferably a substituent represented by the general formula (2). The reason is that by setting the position of the substituent represented by the general formula (2) to a position other than R ¹ and R ¹⁰ in the biphenyl ring, the monomer (A1) components are aligned with each other in the stage before photocuring, It can effectively prevent crystallization. Thereby, at the stage of photo-curing, the monomer (A1) component and the monomer (B1) component may aggregate or phase separate to a fine degree, and the specificity as the high refractive index portion can be more effectively obtained in the low refractive index portion The reason for the column. Furthermore, from the same viewpoint, it is particularly preferred that any one of R ³ , R ⁵ , R ⁶ and R ⁸ in the general formula (1) be a substituent represented by the general formula (2).

In addition, the repetition number m in the substituent represented by the general formula (2) is usually preferably an integer of 1 to 10. The reason is that when the number of repetitions m is set to a value exceeding 10, the oxyalkylene chain connecting the polymerization site and the biphenyl ring is too long, which may prevent the monomer (A1) components of the polymerization site from polymerizing with each other. Therefore, the repetition number m in the substituent represented by the general formula (2) is more preferably an integer of 1 to 4, and particularly preferably an integer of 1 to 2. In addition, from the same viewpoint, the carbon number n in the substituent represented by the general formula (2) is usually preferably an integer of 1 to 4. In particular, from the viewpoint of preventing the position of the polymerizable carbon-carbon double bond at the polymerization site from being too close to the biphenyl ring, making the biphenyl ring a steric obstacle, and reducing the polymerization rate of the monomer (A1) component, the general formula (2 ) The carbon number n in the substituent represented by is preferably set to an integer of 2~4, and more preferably set to an integer of 2~3.

In addition, as specific examples of the biphenyl compound represented by the general formula (1), compounds represented by the following formulas (3) to (4) can be exemplified.

In addition, the weight average molecular weight of the monomer (A1) component is usually preferably set to a value in the range of 200 to 2,500. The reason is presumed that by setting the weight average molecular weight of the monomer (A1) component to a specific range, the polymerization rate of the monomer (A1) component can be accelerated, and the monomer (A1) component and monomer (B1) can be more effectively reduced ) The reason for the copolymerization of the components. As a result, during photocuring, a columnar substance in which the monomer (A1) component and the monomer (B1) component alternately extend in the direction of the film surface can be formed more effectively. That is, the reason is that if the weight average molecular weight of the monomer (A1) component is set to a value less than 200, for example, the position of the plural aromatic rings is too close to the position of the polymerizable carbon-carbon double bond, and the polymerization is caused by steric obstacles. The rate is reduced, which is close to the polymerization rate of the monomer (B1) component, and there is a possibility that copolymerization with the monomer (B1) component is likely to occur. On the other hand, if the weight average molecular weight of the monomer (A1) component is set to a value exceeding 2,500, the polymerization rate of the monomer (A1) component decreases and is close to that of the monomer (B1) component, and the monomer (B1) component is easily generated. ) The copolymerization of the components may result in difficulty in forming pillars regularly and correctly. Therefore, the weight average molecular weight of the monomer (A1) component is preferably set to a value in the range of 240 to 1,500, and more preferably set to a value in the range of 260 to 1,000. In addition, the weight average molecular weight of the monomer (A1) component may be measured using gel permeation chromatography (GPC), or may be calculated from a structural formula based on the atomic weight of constituent atoms.

(2) Maximum diameter Further, as shown in FIG. 2(a), in the ripple suppression film 10, the maximum diameter (t2) in the vertical cross section of the column 12 is preferably set to a value in the range of 0.1 to 15 μm. The reason is that by setting the maximum diameter to a value in the range of 0.1 to 15 μm, the incident light in the column structure as the ripple suppression film can be reflected more stably, and the dependence of the incident angle from the ripple suppression film can be further improved And the spread angle of diffuse light. That is, when the maximum diameter is set to a value less than 0.1 μm, it may be difficult to display light diffusivity regardless of the incident angle of incident light. On the other hand, when the maximum diameter is set to a value exceeding 15 μm, the light traveling straight in the injection structure increases, and the uniformity of light diffusion may deteriorate. Therefore, in the corrugation suppression film, the maximum diameter in the cross section of the columnar material is preferably set to a value in the range of 0.5 to 10 μm, and more preferably set to a value in the range of 1 to 5 μm. In addition, the horizontal cross-sectional shape of the columnar object is not particularly limited, but it is preferably, for example, a circle, an ellipse, a polygon, or an irregular shape. In addition, the horizontal cross section of the pillar means a cross section cut by a plane parallel to the film surface. In addition, the maximum diameter (t2) or length (t1) of the pillars, or the interval (t3) between adjacent pillars can be observed by an optical digital microscope, and actually calculated on the basis of the scale.

(3) Length of column Moreover, as shown in FIG. 2(a), in the ripple suppression film 10, the length (t1) of the columnar material is preferably set to a value in the range of 5 to 495 μm. In addition, the length means the length in the thickness direction of the portion where the pillar is formed. The reason is that when the length of the pillar is set to a value less than 5 μm, the length of the pillar is insufficient, the incident light that goes straight into the pillar structure increases, and it is difficult to obtain sufficient incidence angle dependence and the opening of diffused light The reason for the divergent angle. On the other hand, when the length of the pillar is set to a value exceeding 495 μm, when the composition for the ripple suppression film is irradiated with active energy rays to form a pillar structure, the pillar structure formed at the initial stage will diffuse the direction of photopolymerization, However, there is a case where it is difficult to form a desired pillar structure. Therefore, in the corrugation suppression film, the length of the pillar is preferably set to a value in the range of 40 to 310 μm, and more preferably set to a value in the range of 95 to 255 μm. In addition, although the length (t1) of the pillars is generally regarded as equivalent to the thickness of the ripple suppression film, there are cases where the non-formation region of the pillars is formed on one side or both sides of the ripple suppression film. Therefore, when the non-formed region where the pillars are formed, the value obtained by subtracting the thickness from the thickness of the ripple suppression film is taken as the length of the pillars (t1).

(4) Space between pillars Furthermore, as shown in FIG. 2(a), in the ripple suppression film, the interval (t3) between adjacent pillars, that is, the distance between the centers of adjacent pillars is preferably set to a value within a range of 0.1 to 15 μm . The reason is that by setting the interval to a value in the range of 0.1 to 15 μm, the incident light in the column structure as the ripple suppression film can be reflected more stably, and the dispersion of the diffused light from the ripple suppression film can be further improved Perspective. That is, when the interval is set to a value less than 0.1 μm, it may be difficult to display light diffusivity regardless of the incident angle of incident light. On the other hand, when the interval is set to a value exceeding 15 μm, the light traveling straight in the pillar structure increases, and the uniformity of light diffusion may deteriorate. Therefore, in the ripple suppression film, the lower limit of the interval (t3) of adjacent pillars is more preferably 0.5 μm or more, and more preferably 1 μm or more. In addition, the upper limit of the interval (t3) between adjacent pillars is preferably set to a value of 10 μm or less, and more preferably set to a value of 5 μm or less.

(5) Tilt angle/bending structure In addition, although not shown, in the ripple suppression film, it is preferable that a plurality of columnar objects stand at a certain inclination angle with respect to the film thickness direction. The reason is that by setting the inclination angle of the pillars to be constant, the incident light in the column structure as the ripple suppression film can be reflected more stably, and the opening angle of the diffused light from the ripple suppression film can be further increased .

In addition, although not shown in the figure, in the ripple suppression film, it is also preferable that one columnar body is bent at a specific angle halfway. The reason is that by bending the column at a bending angle, the incident light that travels straight in the column structure can be reduced, and the uniformity of light diffusion can be improved. In addition, such a curved pillar can be obtained by irradiating light while changing the irradiation angle of the irradiated light when irradiating with active energy rays, adding a trace amount of ultraviolet absorber, or irradiating light through an ultraviolet absorption filter. Moreover, the bending angle means the angle formed by the tangent of the interface of the pillar before the change and the tangent of the interface of the pillar after the change when the pillar is changed in the thickness direction and the extending direction.

3. Regions with relatively low refractive index (1) Low refractive index part In addition, the type of material used to form the low-refractive-index portion of the relatively low-refractive-index region around the column having a relatively high refractive index is not particularly limited, and its main component is preferably a carbamate ( Methacrylate polymer. The reason is that if it is the material substance, not only the low refractive index but also the pillars derived from the high refractive index (A1) component of the high refractive index portion can be effectively formed, so the spread angle of the diffused light can be further increased Reason. That is, by setting the (B1) component of the main component of the low refractive index portion as a urethane (meth)acrylate polymer, not only can the columnar refraction derived from the (A1) component be more easily adjusted The difference between the ratio and the columnar refractive index derived from the (B1) component, and can effectively suppress the deviation of the columnar refractive index derived from the (B1) component, and can more effectively obtain the internal refractive index distribution structure with a specific pillar Therefore. (Meth)acrylate means both acrylate and methacrylate.

First, the urethane (meth)acrylate as the component (B1) is preferably composed of (a) a compound containing at least two isocyanate groups, (b) polyalkylene glycol and (c) (meth)acrylic acid Formed by hydroxyalkyl esters. Among them, the compound containing (a) at least two isocyanate groups may be exemplified by 2,4-xylene diisocyanate, 2,6-xylene diisocyanate, 1,3-toluene diisocyanate, 1,4-toluene diisocyanate Aromatic polyisocyanates such as isocyanates, aliphatic polyisocyanates such as hexamethylene diisocyanate, alicyclic polyisocyanates such as isophorone diisocyanate (IPDI), hydrogenated diphenylmethane diisocyanate, and the like Urea bodies, isocyanurate bodies, and further adducts of reactants with low molecular active hydrogen-containing compounds such as ethylene glycol, propylene glycol, neopentyl glycol, trimethylolpropane, castor oil, etc. ( For example, toluene diisocyanate trifunctional adduct) and so on.

In addition, among the above, alicyclic polyisocyanate is preferred. The reason is that if it is an alicyclic polyisocyanate, it is easier to set the reaction rate of each isocyanate group poorer than the aliphatic polyisocyanate due to the relationship of the stereo ligand, etc., and the resulting urethane (methyl) The molecular design of acrylic ester becomes easier. In addition, the component (a) is preferably an alicyclic diisocyanate. The reason is that if it is an alicyclic diisocyanate, for example, it is possible to suppress the reaction of the (a) component with the (b) component only, or to suppress the reaction of the (a) component with the (c) component only, and the (a) component with the (b ) The components and (c) components do react to prevent the occurrence of excess by-products. As a result, it is possible to effectively suppress the refractive index deviation in the low refractive index portion derived from the (B1) component of the internal refractive index distribution structure.

Moreover, if it is an alicyclic diisocyanate, compared with an aromatic diisocyanate, the compatibility of the obtained monomer (B1) component and the biphenyl compound which has a specific structure as a representative example of the monomer (A1) component can be made By reducing to a specific range, the low refractive index portion can be formed more efficiently. Furthermore, if it is an alicyclic diisocyanate, compared with an aromatic diisocyanate, the refractive index of the obtained monomer (B1) component can be reduced, so it has a specific structure as a representative example of the monomer (A1) component. The increased refractive index difference of the biphenyl compound can more effectively form pillars with excellent dependence on the incident angle. Moreover, among these alicyclic diisocyanates, isophorone diisocyanate (IPDI) is particularly preferred because the reaction difference between the two isocyanate groups is large.

In addition, examples of the polyalkylene glycol as the component (b) include polyethylene glycol, polypropylene glycol, polybutylene glycol, polyethylene glycol, and polytetramethylene ether glycol. Among these, polypropylene glycol is particularly preferred. The reason is that if it is polypropylene glycol, the viscosity is low, so it can be handled without a solvent. In addition, in the case of polypropylene glycol, when the monomer (B1) component is cured, it becomes a good soft segment in the cured product, which can effectively improve the handleability or installability of the ripple suppression film. In addition, the weight average molecular weight of the monomer (B1) component can be adjusted by the weight average molecular weight of the (b) component. Here, the weight average component of (b) component is usually 2,000 to 19,500, more preferably 3,500 to 14,300, and particularly preferably 6,300 to 12,300.

Furthermore, (c) component hydroxyalkyl (meth)acrylate is exemplified by, for example, 2-hydroxyethyl (meth)acrylate, 2-hydroxypropyl (meth)acrylate, 3-hydroxypropyl (meth)acrylate , 2-hydroxybutyl (meth)acrylate, 3-hydroxybutyl (meth)acrylate, 4-hydroxybutyl (meth)acrylate, etc. In addition, since the polymerization rate of the obtained urethane (meth)acrylate is reduced and a specific low refractive index portion is more effectively formed, hydroxyalkyl methacrylate is preferred, and 2-hydroxymethacrylate is more preferred. Ethyl ester.

In addition, the synthesis of the urethane (meth)acrylates of the components (a) to (c) can be carried out according to common methods. In this case, the blending amount of the components (a) to (c), based on the molar ratio, is preferably set to (a) component: (b) component: (c) component = 1 to 5: 1:1 to 5 ratio . The reason is that by setting this ratio, two hydroxyl groups of the component (b) react with one isocyanate group of the component (a), and another isocyanate group of the two components (a), It reacts with the hydroxyl group of component (c) and bonds to form urethane (meth)acrylate effectively. Therefore, the blending amount of the components (a) to (c), in terms of molar ratio, is preferably set to the ratio of (a) component: (b) component: (c) component=1 to 3:1:1 to 3 , And better set to a 2:1:2 ratio.

In addition, the weight average molecular weight of the monomer (B1) component is preferably set to a value in the range of 3,000 to 20,000. The reason is presumed that by setting the weight average molecular weight of the monomer (B1) component to 3,000 or more, the polymerization rate of the monomer (A1) component and the monomer (B1) component can be made to have a certain difference, and the two can be phased. The reason why the copolymerization of the components is reduced. As a result, at the time of photo-curing, high refractive index pillars standing at specific intervals can be effectively formed in the low refractive index portion. On the other hand, when the weight average molecular weight of the monomer (B1) component exceeds 20,000, the compatibility with the monomer (A1) component is excessively low, and it may be difficult to uniformly disperse the coating stage of the composition for suppressing ripples . Therefore, the weight average molecular weight of the monomer (B1) component is preferably set to a value in the range of 5,000 to 15,000, and more preferably set to a value in the range of 7,000 to 13,000. In addition, the weight average molecular weight of the monomer (B1) component may be measured using gel permeation chromatography (GPC), or may be calculated from a structural formula based on the atomic weight of constituent atoms.

Furthermore, the monomer (B1) component may be used in combination of two or more different molecular structures or weight-average molecular weights, but from the viewpoint of suppressing the refractive index deviation of the columnar substance derived from the (B1) component in the columnar substance, it is preferred to use only 1 kind.

(2) Refractive index difference In addition, the difference between the refractive index of the columnar object in the high refractive index portion and the refractive index predicted in the low refractive index region of the low refractive index portion is preferably set to a value of 0.01 or more. The reason is that by setting the difference in refractive index to 0.01 or more, in the column structure region of the ripple suppression film, the opening angle of the diffused light from the film can be further increased, and the incident light can be reflected stably. A high haze value is obtained, and at the same time, it can be made to have a low straight transmittance or a low backscattering property. That is, when the difference in refractive index is set to a value less than 0.01, the angle area of total reflection of incident light in the column structure becomes narrow, so the opening angle of diffused light is excessively narrowed, and the ripple suppression effect is reduced. The reason. Therefore, the difference between the refractive index of the pillar of the ripple suppression film and the refractive index of the medium is preferably set to a value of 0.05 or more, and more preferably set to a value of 0.1 or more. In addition, the larger the refractive index difference, the better. However, from the viewpoint of selecting a material that can form a pillar structure, it is considered that about 0.3 is the upper limit.

4. Thickness The thickness of the ripple suppression film is preferably set to a value in the range of 40 to 500 μm. That is, by setting the value to 40 μm or more, the length of the pillar in the film thickness direction can be securely ensured, and incident light can be reflected more stably in the area of the pillar structure as the ripple suppression film, which can further improve the origin of the ripple The reason for suppressing the spread angle of the diffused light of the film.

On the other hand, by setting the thickness to a value of 500 μm or less, it is possible to more easily form a pillar structure having pillars having a uniform length in the thickness direction. Therefore, the lower limit of the thickness of the ripple suppression film is preferably set to a value of 60 μm or more, and more preferably set to a value of 100 μm or more. On the other hand, the upper limit of the thickness of the ripple suppression film is preferably set to a value within a range of 350 μm or less, and more preferably set to a value of 260 μm or less.

5. Lamination type The corrugation suppression film made of a single layer is also better to cooperate with multiple layers to form a lamination type. For example, in order to control the variable-angle haze value of the ripple suppression film, the normal haze value, and the total thickness of the ripple suppression film to a value within a specific range, it is preferable to pluralize the ripple suppression film made of more than two single layers The sheets are laminated. However, when over-laminated, there will be a decrease in the sense of use and the total light transmittance. Therefore, when laminating the ripple suppression film made of a single layer, it is preferably set to a value in the range of 2 to 5 pieces, more preferably set to a value in the range of 2 to 4 pieces, and more preferably set to 2 pieces Or 3 tablets.

6. Straight forward transmittance (%) The characteristic is that the straight forward transmittance of the ripple suppression film defined by the following relational expression (1) is set to a value of 8% or less. Straight transmittance = Lp/Lo×100 (1) (Lp: the brightness of the transmitted light (cd/m ² measured between the two polarizers arranged in a parallel Nicol lens state with the ripple suppression film interposed ), Lo: The brightness (cd/m ² ) of the transmitted light measured only for the two polarizing plates arranged in a parallel Nicol lens state.

The reason for this is that, as shown in FIG. 3, by setting the linear transmittance of the ripple suppression film to a specific value or less, excellent ripple suppression properties can be obtained. Therefore, not only the left and right directions (corresponding to the TD direction) of the ripple suppression film, but also the ripple suppression properties in the up and down directions (also in the MD direction) are good, and the linear transmittance is preferably set to a value of 7% or less, and it is better to set It is a value of 6% or less, and Tejia is set to a value of 4% or less. However, if the straight-through transmittance of the ripple suppression film is too small, the range of resin materials that can be used is too narrow, which may significantly reduce the yield, which is economically disadvantageous. Therefore, the lower limit of the straight-through transmittance of the ripple suppression film is preferably set to a value of 0.1% or more, a value of 1% or more, and a value of 2% or more.

7. Variable angle haze value The variable-angle haze value of the ripple suppression film, that is, the variable-angle haze value of ±70˚ measured by a variable-angle haze meter (meaning the haze measured in the range of ±70˚ for the normal direction of the ripple suppression film) The lowest value. For example, the so-called variable-angle haze value in the TD direction is to fix the incident light in the normal direction of the original film, based on the axis extending in the MD direction, to make the film between -70~70˚ Rotate to converge the emitted light at each angle with an integrating sphere, and measure the haze value at each angle of incidence, and refer to its lowest value). It is preferably set to a value of 70% or more. The reason is that by setting the variable-angle haze value to a specific value or more, excellent ripple suppression properties can be obtained.

Therefore, the lower limit of the variable angle haze value of the ripple suppression film is preferably set to a value of 85% or more, more preferably to a value of 90% or more. However, when the variable-angle haze value of the ripple suppression film is excessively high, the selection range of the resin and the like constituting the ripple suppression film is excessively narrow, and the production yield is significantly reduced, which is economically disadvantageous. Therefore, the upper limit of the angle-of-change haze value of the ripple suppression film is preferably set to a value of 99% or less, and more preferably to a value of 98% or less.

In addition, in the moire suppression film, when only the haze value (normal haze value) measured in accordance with JIS K 7136:2000 is considered, there may be cases where the moire suppression property is insufficient. However, the usual haze value of the ripple suppression film has the advantage that it can be measured in a relatively simple and short time. Therefore, on the premise of considering the variable-angle haze value of the above-mentioned moire suppression film, it can be said that it is preferable to consider and use the usual haze value together. Therefore, in the ripple suppression film, the lower limit of the usual haze value measured with a haze meter is preferably set to a value of 85% or more, more preferably a value of 90% or more, and even more preferably a value of 95% or more. On the other hand, from the viewpoint of production yield, the upper limit of the haze value is usually preferably set to a value of 99% or less, and more preferably set to a value of 98% or less.

8. Manufacturing method Next, typical methods (a) to (c) for forming the ripple suppression film will be described. (a) Steps for preparing the composition for ripple suppression film (b) Steps of applying the composition for the ripple suppression film to the process sheet and forming the coating layer (c) For the coating layer, the gap layer method is used to irradiate the active energy rays of parallel light to form a columnar structure area formed by a plurality of pillars with a relatively high refractive index in a region with a relatively low refractive index step

(1) Step (a): Step of preparing the composition for ripple suppression film Step (a) is a step of preparing a composition for a ripple suppression film. More specifically, the monomer (A) component and the monomer (B) component are stirred under a high-temperature condition of 40 to 80°C to prepare a uniform mixed liquid. Also, at the same time, it is preferable to add other additives such as the component (C) described later as desired to the mixture, stir until uniform and add a diluent solvent as needed to obtain a desired viscosity, thereby obtaining a ripple suppression film Use a solution of the composition. In addition, the monomer (A) component becomes the main component of the high refractive index portion constituting the ripple suppression film by polymerization. The component of the monomer (B) becomes the main component of the low-refractive-index portion of the ripple suppression film by polymerization. The details of the types of the monomer (A) component and the monomer (B) component are described as the monomers (A1) and (A2) and (B1) and (B2) components in the first embodiment, respectively. , So it is omitted.

In addition, the refractive index of the monomer (A) component is preferably set to a value in the range of 1.5 to 1.65. The reason is that by setting the refractive index of the monomer (A) component to a value within this range, the refractive index of the portion derived from the (A) component and the portion derived from the (B) component in the column structure can be adjusted more easily The difference can more effectively obtain the ripple suppression film with a specific pillar structure. That is, when the refractive index of the monomer (A) component is set to a value less than 1.5, the difference between the refractive index of the monomer (B) component and the monomer (B) component is too small, and it may be difficult to obtain the desired incident angle dependency. On the other hand, when the refractive index of the monomer (A) component is set to a value exceeding 1.65, the refractive index difference from the monomer (B) component becomes large, but the viscosity is too low, making it difficult to interact with the monomer (B) component The reason for the miscibility. Therefore, the refractive index of the monomer (A) component is preferably set to a value in the range of 1.55 to 1.6, and more preferably set to a value in the range of 1.56 to 1.59. In addition, the refractive index of the said monomer (A) component means the refractive index of the monomer (A) component before hardening by light irradiation. Furthermore, the refractive index of the monomer (A) component can be measured according to, for example, JIS K0062.

In addition, the content of the monomer (A) component is preferably within a range of 25 to 400 parts by weight with respect to 100 parts by weight of the monomer (B) component described later. The reason is that by setting the content of the monomer (A) component to a value within this range, the miscibility with the monomer (B) component can be maintained, and when light is irradiated, the copolymerization of the two components can be effectively reduced , Can effectively form a specific pillar structure. Therefore, the content of the monomer (A) component relative to 100 parts by weight of the monomer (B) component is preferably set to a value within the range of 40 to 300 parts by weight, more preferably within a range of 50 to 200 parts by weight value.

In addition, the refractive index of the monomer (B) component is preferably set to a value in the range of 1.4 to 1.5. The reason is that by setting the refractive index of the monomer (B) component to a value within this range, the refractive index of the portion derived from the (A) component and the portion derived from the (B) component in the column structure can be adjusted more easily The difference can more effectively obtain the ripple suppression film with a specific pillar structure. Therefore, the refractive index of the monomer (B) component is preferably set to a value in the range of 1.45 to 1.49, more preferably set to a value in the range of 1.46 to 1.48. In addition, the refractive index of the said monomer (B) component means the refractive index of the monomer (B) component before hardening by light irradiation. Furthermore, the refractive index of the monomer (B) component can be measured according to, for example, JIS K0062.

In addition, the content of the monomer (B) component is preferably set to a value within a range of 20 to 80% by weight relative to the total amount (100% by weight) of the composition for ripple suppression film. The reason is that when the content of the monomer (B) component is less than 20% by weight, the proportion of the monomer (B) component relative to the monomer (A) component decreases, and the column structure is derived from the (B) component The width of the part and the like are excessively smaller than the width and the like of the part derived from the component (A), and it may be difficult to obtain a pillar structure having good incident angle dependence. In addition, the length of the pillars in the thickness direction of the ripple suppression film may be insufficient. On the other hand, when the content of the monomer (B) component is set to a value exceeding 80% by weight, the proportion of the monomer (B) component relative to the monomer (A) component increases, and the column structure is derived from (B) The partial width of the component is excessively larger than the width of the part derived from the (A) component, and it may be difficult to obtain a pillar structure having good incident angle dependence. In addition, the length of the pillars in the thickness direction of the ripple suppression film may be insufficient. Therefore, the content of the monomer (B) component is preferably set to a value in the range of 30 to 70% by weight, and more preferably set to a value in the range of 40 to 60% by weight relative to the total amount of the composition for ripple suppression film .

In addition, the composition for the ripple suppression film of the present embodiment preferably contains a photopolymerization initiator as the component (C) as desired. The reason is that by containing the photopolymerization initiator, when the active energy ray is irradiated to the composition for the ripple suppression film, a specific pillar structure can be effectively formed. Here, the photopolymerization initiator means a compound that generates radical species by irradiation of active energy rays such as ultraviolet rays.

Examples of the photopolymerization initiator include benzoin, benzoin methyl ether, benzoin ether, benzoin isopropyl ether, benzoin n-butyl ether, benzoin isobutyl ether, and benzophenone , Dimethylaminoacetophenone, 2,2-dimethoxy-2-phenylacetophenone, 2,2-diethoxy-2-phenylacetophenone, 2-hydroxy-2-methyl -1-phenylpropane-1-one, 1-hydroxycyclohexylphenyl ketone, 2-methyl-1-[4-(methylthio)phenyl]-2-morpholinyl-propane-1- Ketone, 4-(2-hydroxyethoxy)phenyl-2-(hydroxy-2-propyl) ketone, benzophenone, p-phenylbenzophenone, 4,4'-diethylamino Benzophenone, dichlorobenzophenone, 2-methylanthraquinone, 2-ethylanthraquinone, 2-tert-butylanthraquinone, 2-aminoanthraquinone, 2-methylthioxanthone, 2-ethylthioxanthone, 2-chlorothioxanthone, 2,4-dimethylthioxanthone, 2,4-diethylthioxanthone, benzyl dimethyl acetal, acetophenone dimethyl Acetal, p-dimethylaminobenzoate, oligo[2-hydroxy-2-methyl-1-[4-(1-methylvinyl)phenyl]propane], etc., can be used alone One of these can also be used in combination of two or more. Moreover, as the content when the photopolymerization initiator is contained, it is preferably set to a value in the range of 0.2 to 20% by weight based on 100% by weight of the total amount of the monomer (A) component and the monomer (B) component, It is more preferably set to a value in the range of 0.5 to 15% by weight, and more preferably set to a value in the range of 1 to 10% by weight.

In addition, other additives may be added as appropriate within a range that does not impair the effects of the present invention. Examples of other additives include, for example, antioxidants, ultraviolet absorbers, antistatic agents, polymerization accelerators, polymerization inhibitors, infrared absorbers, plasticizers, dilution solvents, and leveling agents. In addition, the content of other additives is generally 100% by weight relative to the total amount of the monomer (A) component and the monomer (B) component, preferably a value in the range of 0.01 to 5% by weight, more preferably 0.02 The value in the range of ~3% by weight is preferably set to a value in the range of 0.05~2% by weight.

(2) Step (b): coating step Step (b) is a step of applying the prepared composition for a ripple suppression film to a process sheet to form a coating layer. As the process sheet, any one of plastic film and paper can be used. Among them, examples of the plastic film include polyester-based films such as polyethylene terephthalate, polyolefin-based films such as polyethylene films and polypropylene films, and cellulose-based films such as triethylene cellulose film. Polyimide film, etc. In addition, examples of the paper include cellophane, coated paper, laminated paper, and the like.

In addition, for the process sheet, in order to facilitate the peeling of the self-processed sheet after the photocuring, the obtained ripple suppression film is preferably provided with a peeling layer on the coated surface side of the composition for the process sheet's ripple suppression film. The release layer can be formed using a conventionally known release agent such as a polysiloxane-based release agent, a fluorine-based release agent, an alkyd-based release agent, an olefin-based release agent, and the like. In addition, the thickness of the process sheet is usually preferably set to a value in the range of 25 to 200 μm.

In addition, as a method for applying the composition for the ripple suppression film on the process step, for example, a blade coating method, a roll coating method, a bar coating method, a blade coating method, a die coating method, and a gravure can be used Conventional methods such as coating methods are used. In this case, the thickness of the coating layer is preferably set to a value in the range of 100 to 700 μm.

(3) Active energy ray irradiation step 1 (gap layer law) Step (c) is to use a so-called gap layer method to irradiate the coating layer through the transparent peeling film and irradiate parallel light active energy rays in one stage to form a columnar structure region in which a plurality of pillars having a relatively high refractive index stand up A step of. That is, it is preferred that the coating layer formed on the process sheet irradiates parallel light with a high degree of parallelism through the transparent release film.

Here, the term "parallel light" means light that is slightly parallel and does not have expansion when viewed from any direction. More specifically, it is preferable that, for example, light from a point light source becomes parallel light by a lens, and then irradiates the coating layer, or light from a linear light source becomes parallel light by an aggregate of cylindrical objects, and then irradiates于涂层。 The coating layer. As a specific example of the parallel light irradiation device, for example, an optional uniform exposure adapter is installed on the ultraviolet point light source "HYPERCURE 200" manufactured by Yamashita Denki Co., Ltd.

Next, preferably, the parallelism of the parallel light is set to a value of 10° or less with respect to the normal of the coating layer. The reason is that by setting the parallelism to a value of 10˚ or less, it is possible to efficiently and stably manufacture a plurality of columnar structures with a certain angle of inclination with respect to the film thickness direction as a columnar structure region of the ripple suppression film . Therefore, the parallelism of parallel light is preferably set to a value of 5˚ or less, and more preferably to a value of 2˚ or less, preferably to a value of 1˚ or less.

In addition, as the irradiation light, ultraviolet rays, electron beams, etc. are exemplified, but ultraviolet rays are more preferably used. In addition, as the irradiation condition of ultraviolet rays, it is preferable to set the illuminance to a value in the range of 0.01 to 30 mW/cm ² . The reason is that if the illuminance is set to a value less than 0.1 mW/cm ² , it may be difficult to form a column structure clearly. On the other hand, if the illuminance is set to a value exceeding 30 mW/cm ² , the component (A) and the component (B) are hardened before phase separation, and conversely, it is difficult to clearly form a pillar structure. Therefore, the illuminance of ultraviolet rays is preferably set to a value in the range of 0.05 to 20 mW/cm ² , and is more preferably set to a value in the range of 0.1 to 10 mW/cm ² . In addition, regarding the moving speed of the coating layer or the irradiation angle of the irradiation light, the first active energy ray irradiation step may be the same.

(4) Active energy ray irradiation step 2 (two-stage irradiation) Preferably, step (c) is divided into two stages. First, as step (c1'), the first active energy ray irradiation is performed on the coating layer. The lower part is used as the first structure region. In a region with a relatively low refractive index, a columnar region is formed by alternately arranging a plurality of columns with a relatively high refractive index along the film surface direction, and above the coating layer Leave unformed areas. That is, for the coating layer formed on the process sheet, an active energy ray such as ultraviolet rays, which is formed only by direct parallel light at a controlled irradiation angle, is irradiated. Here, as the ultraviolet irradiation conditions, the illuminance is preferably set to a value within a range of 0.01 to 50 mW/cm ² . The reason is that if the illuminance is set to a value less than 0.01 mW/cm ² , it may be difficult to clearly form the first structure region. On the other hand, if the illuminance is set to a value exceeding 50 mW/cm ² , (A) component and (B) component are hardened before phase separation, and conversely, it is difficult to form clearly in step (c2') described later The reason for the second structure area. Therefore, the ultraviolet illuminance is preferably set to a value in the range of 0.05 to 20 mW/cm ² , and more preferably set to a value in the range of 0.1 to 10 mW/cm ² .

Next, as step (c2'), it is preferable to irradiate the coating layer with the second active energy ray, and the lower part of the coating layer is used as the second structure region, and the region with a relatively low refractive index is formed along the direction of the film surface. The column regions formed by plural columns with relatively high refractive indexes are arranged in parallel and alternately. It is preferable to use a so-called pillar structure/pillar structure laminated in the up-down direction in such a single layer, so as to set it as a ripple suppressing film having more ripple suppressing properties or a lower straight-through transmittance.

(5) Formation of adhesive layer Although it is an arbitrary step, it is preferable to provide an adhesive forming step. As shown in FIGS. 2(b) to (c), an adhesive layer (including an adhesive layer, as follows) is provided on at least one surface of the ripple suppression film 10 Same) 16, 16a, 16b. The reason for this is that the ripple suppression film of this aspect improves the sense of use. Moreover, for example, the optical member of the first pattern-containing structural layer and the optical member of the second pattern-containing structural layer can be firmly fixedly arranged, so that the adjustment of the linear transmittance expressed by the relationship (1) or The adjustment of variable angle haze value is easier.

In addition, as the type of the adhesive layer, considering the method of using the ripple suppression film, it is preferably a resin layer derived from an optical adhesive. Therefore, the total light transmittance is preferably set to a value of 90% or more. Moreover, when the adhesive layer is formed, its thickness is usually preferably set to a value in the range of 1 to 500 μm, more preferably set to a value in the range of 10 to 100 μm, and more preferably set to a value in the range of 20 to 50 μm. value.

[Second Embodiment] The second embodiment is a variation of the ripple suppression film of the first embodiment. As shown in FIGS. 4(a) to (b), the ripple suppression film 10 and the particle dispersion type light diffusion film 18 having an internal refractive index distribution structure The laminated ripple suppression film laminate 20, 20'. More specifically, the ripple suppression film laminate 20, 20' that suppresses the ripple phenomenon caused by the difference in two spatial frequencies is in a low-refractive-index region 14 made of a single layer and having a relatively low refractive index, Corrugation suppression film laminate after lamination of a corrugation suppression film 10 having a plurality of columns 12 made of a relatively high refractive index material and a particle dispersion type light diffusion film 18 in which particles 18a are dispersed in a resin component 18b . Furthermore, the ripple suppression film laminates 20, 20' characterized by the linear transmittance of the relational expression (1) being 8% or less (hereinafter, in order to distinguish it from the ripple suppression film laminate of the third embodiment, (Sometimes referred to as the first ripple suppression film laminate).

FIG. 4(a) shows a ripple suppression film laminate 20 having a particle dispersion type light diffusion film 18 on one side of a ripple suppression film 10 having an internal refractive index distribution structure. In addition, Fig. 4(b) shows a ripple suppression film laminate 20' provided with particle-dispersed light diffusion films 18, 18' on both sides of the ripple suppression film 10 having an internal refractive index distribution structure. Hereinafter, a description will be given focusing on the structure of the particle dispersion type light diffusion film that is significantly different from the first embodiment in the ripple suppression film laminate of the second embodiment of the present invention.

1. Ripple suppression film with internal refractive index distribution structure Regarding the ripple suppression film having an internal refractive index distribution structure, basically, the ripple suppression film described in the first embodiment can be of the same form, and therefore, a further description will be omitted.

2. Particle dispersion type light diffusion film (1) Particle As the particles (light-diffusing fine particles) formulated in the particle-dispersed light-diffusing film, in the case of being formulated in the particle-dispersed light-diffusing film, as long as the haze suppression film laminate can increase the haze value, it can be in any form. . Therefore, examples of the particles include inorganic fine particles such as silicon oxide, calcium carbonate, aluminum hydroxide, magnesium hydroxide, clay, talc, and titanium dioxide; acrylic resin, polystyrene resin, polyethylene resin, epoxy resin, etc. Organic light-transmissive fine particles; fine particles made of silicon-containing compounds with an inorganic and inorganic intermediate structure such as polysiloxane resin (for example, TOSPEARL series manufactured by Momentive Performance Materials Japan), etc. Among them, acrylic resin fine particles and fine particles made of a silicon-containing compound having an inorganic and inorganic intermediate structure are preferred from the viewpoint of correspondence of high definition of the adhesive layer. In addition, fine particles made of a silicon-containing compound with an inorganic and inorganic intermediate structure can exert its effect even if added in a small amount, and maintain the adhesion of the active energy ray-curable adhesive component well, which is particularly preferable. The above light diffusion fine particles may be used alone or in combination of two or more.

In addition, the particle shape is preferably spherical fine particles with uniform light diffusion. Moreover, based on obtaining good light diffusivity or haze value, the lower limit of the average particle diameter of the particles is preferably set to a value of 1.0 μm or more, more preferably set to a value of 2.0 μm or more, and still more preferably set to 2.5 μm or more Value. On the other hand, the upper limit of the average particle diameter of the particles is preferably set to a value of 10 μm or less, more preferably set to a value of 7 μm or less, and most preferably set to a value of 5 μm or less. By setting the average particle diameter of such particles to a value within a specific range, good light diffusivity can be obtained, and on the other hand, a specific haze value can be obtained, which exhibits the effect of suppressing ripples. In addition, the average particle diameter of the particles may be, for example, the average value directly measured using a caliper or a micrometer, but it may also be measured as an arithmetic average value using a laser analyzer according to JIS Z 8825:2013.

In addition, the particle content is usually set to a value in the range of 0.1 to 30 parts by mass with respect to 100 parts by mass of the resin component. The reason is that when the content of the particles is less than 0.1 part by mass, the desired haze value may not be obtained. On the other hand, when the content of the particles is set to a value exceeding 30 parts by mass, the particles may easily aggregate, the handling may be difficult, or the transparency may be excessively reduced. Therefore, the lower limit of the particle content is preferably set to 1 part by mass or more, and more preferably set to 3 parts by mass or more. The upper limit of the particle content is preferably 20 parts by mass or less, and more preferably 10 parts by mass or less.

(2) Resin composition The type of resin component is not particularly limited, but from the viewpoint of being excellent in durability, it is preferable to contain an active energy ray-curable adhesive component as the resin component. That is, the active energy ray-curable adhesive component means a component that hardens by irradiating the active energy ray and shows adhesiveness. Therefore, it may be composed of a single hardened component, or may include a component hardened by irradiation with active energy rays and a component that does not harden by irradiation with active energy rays and shows adhesion. More specifically, it is preferably an active energy ray-curable adhesive component containing the (meth)acrylate polymer shown below.

(2)-1 (meth)acrylate polymer As a monomer constituting the (meth)acrylate polymer, the alkyl group-derived (meth)acrylate having a carbon number of 1 to 20 can exhibit good adhesion. Examples of alkyl (meth)acrylates having 1 to 20 carbon atoms as alkyl groups are, for example, methyl (meth)acrylate, ethyl (meth)acrylate, propyl (meth)acrylate, (meth)acrylic acid N-butyl ester, n-pentyl (meth)acrylate, n-hexyl (meth)acrylate, 2-ethylhexyl (meth)acrylate, isooctyl (meth)acrylate, n-decyl (meth)acrylate , N-dodecyl (meth)acrylate, myristyl (meth)acrylate, palmyl (meth)acrylate, stearyl (meth)acrylate, etc. Among them, from the viewpoint of improving the adhesiveness, alkyl (meth)acrylate having a carbon number of 1 to 8 is preferred, and n-butyl (meth)acrylate or 2-ethylhexyl (meth)acrylate is particularly preferred. ester.

In addition, the weight average molecular weight of the (meth)acrylate polymer is usually preferably in the range of 100,000 to 2 million. The reason is that when the weight average molecular weight of the (meth)acrylate polymer exceeds 2 million, the film strength of the obtained adhesive becomes too high, and the manufacturing time may be excessively long. On the other hand, when the weight average molecular weight of the (meth)acrylate polymer is less than 100,000, the resulting tackiness is significantly reduced, the amount of unreacted monomers is increased, and handling may be difficult. Therefore, the lower limit of the weight average molecular weight of the (meth)acrylate polymer is more preferably 200,000 or more, and more preferably 300,000 or more. On the other hand, the upper limit of the weight average molecular weight of the (meth)acrylate polymer is more preferably 1 million or less, and more preferably 800,000 or less. In addition, the weight average molecular weight of the (meth)acrylate polymer can be measured by gel permeation chromatography (GPC) method as a standard polystyrene conversion value.

(2)-2 (meth)acrylate polymer with reactive groups in the molecule The (meth)acrylate polymer as the main component of the above-mentioned resin component preferably has a reactive group which reacts with a crosslinking agent (C) described later as a monomer unit constituting the polymer. The reason is that by containing a reactive group derived from a monomer containing a reactive group, it reacts with a cross-linking agent to form a cross-linked structure (three-dimensional mesh structure), thereby obtaining a resin component with high cohesive force.

Here, in order to introduce a reactive group into the molecule, as the reactive group-containing monomer used when polymerizing the (meth)acrylate polymer, a monomer having a hydroxyl group in the molecule (hydroxyl-containing monomer) can be preferably exemplified , Monomer with carboxyl group in the molecule (monomer containing carboxyl group), monomer with amine group in molecule (monomer containing amine group), etc. Among these, Teka is a hydroxyl-containing monomer that has excellent reactivity with a cross-linking agent and has less adverse effects on the adherend. More specifically, as such hydroxyl-containing monomers, for example, 2-hydroxyethyl (meth)acrylate, 2-hydroxypropyl (meth)acrylate, 3-hydroxypropyl (meth)acrylate, ( Hydroxyalkyl (meth)acrylate such as 2-hydroxybutyl methacrylate, 3-hydroxybutyl (meth)acrylate, 4-hydroxybutyl (meth)acrylate, etc.

(2)-3 Active energy ray hardening compound The active energy ray-curable compound contained in the resin component may be any one that can improve the durability or cohesion of the resulting resin component to a desired level, and may be any of monomers, oligomers, or polymers. It is a mixture of these. Among them, polyacrylic acid-based monomers having excellent compatibility with preferred (meth)acrylate polymers as components and the like can be preferably exemplified. Therefore, in the resin component, by irradiation with active energy rays, the active energy ray-curable compounds form chemical bonds with each other to generate a three-dimensional mesh structure. Moreover, by capturing the (meth)acrylate polymer in this structure, the cohesive force is improved, and as a result, it becomes excellent in durability.

Here, examples of the multifunctional acrylate monomer include 1,4-butanediol di(meth)acrylate, 1,6-hexanediol di(meth)acrylate, and neopentyl glycol di(meth)acrylate. Meth)acrylate, polyethylene glycol di(meth)acrylate, neopentyl glycol adipate di(meth)acrylate, hydroxyvalerate neopentyl glycol di(meth)acrylate, di Cyclopentyl di(meth)acrylate, caprolactone modified dicyclopentenyl di(meth)acrylate, ethylene oxide modified di(meth)acrylate, ethylene oxide modified 2-functional type of isocyanuric acid di(meth)acrylate, di(acryloxyethyl)isocyanurate, allylated cyclohexyl di(meth)acrylate, etc.; trimethylol Propane tri(meth)acrylate, dipentaerythritol tri(meth)acrylate, propionic acid modified dipentaerythritol tri(meth)acrylate, pentaerythritol tri(meth)acrylate, propylene oxide modified trimethylol Propane tri (meth) acrylate, tri (acryloyloxyethyl) isocyanurate, ε-caprolactone modified tri-(2-(meth)acryloyloxyethyl) isocyanide 3-functional type of urate, ethylene oxide modified isocyanurate tri(meth)acrylate, etc.; 4-functionality of diglycerol tetra(meth)acrylate, pentaerythritol tetra(meth)acrylate; propylene Acid-modified 5-functional type of dipentaerythritol penta(meth)acrylate, etc.; 6-functional type of dipentaerythritol hexa(meth)acrylate, caprolactone modified dipentaerythritol hexa(meth)acrylate, etc. Among them, the one having a weight average molecular weight of 1,000 or less is preferably lower. These can be used alone or in combination of two or more.

In addition, the content of the active energy ray-curable compound is preferably 1 part by mass or more, particularly preferably 3 parts by mass or more, and particularly preferably 5 parts by mass or more with respect to 100 parts by mass of the (meth)acrylate polymer. The content of the active energy ray-curable compound (B) is preferably 30 parts by mass or less, more preferably 25 parts by mass or less, particularly preferably 20 parts by mass or less, and still more preferably 10 parts by mass or less. When the content of the active energy ray-curable compound (B) falls within the above range, the obtained adhesive becomes more excellent in durability, and the handleability of the obtained light diffusion adhesive layer 21 becomes excellent. Furthermore, the adhesiveness caused by the (meth)acrylate polymer can be maintained well.

(2)-4 Crosslinking agent The resin component (before curing) constituting the particle dispersion type light diffusion film preferably contains a crosslinking agent for crosslinking the (meth)acrylate polymer having a reactive group in the molecule. The reason is that when the resin component is heated or the like, the crosslinking agent reacts with the (meth)acrylate polymer having a reactive group in the molecule to increase the cohesive force of the obtained resin component.

Here, the crosslinking agent may be any one that can react with the reactive functional group possessed by the (meth)acrylate polymer, and examples thereof include isocyanate-based crosslinking agents, epoxy-based crosslinking agents, and amine-based crosslinking agents. Linking agent, melamine-based crosslinking agent, aziridine-based crosslinking agent, amine-based crosslinking agent, aldehyde-based crosslinking agent, oxazoline-based crosslinking agent, metal alkoxide-based crosslinking agent, metal chelating agent System crosslinking agent, metal salt system crosslinking agent, ammonium salt system crosslinking agent, etc. When the (meth)acrylate polymer has a hydroxyl group as the reactive functional group, among the above, an isocyanate-based crosslinking agent excellent in reactivity with the hydroxyl group is preferably used. In addition, one kind of crosslinking agent may be used alone, or two or more kinds may be used in combination.

In addition, the isocyanate-based crosslinking agent preferably contains at least a polyisocyanate compound. Examples of such polyisocyanate compounds include aromatic polyisocyanates such as toluene diisocyanate, diphenylmethane diisocyanate, xylene diisocyanate, aliphatic polyisocyanates such as hexamethylene diisocyanate, isophorone diisocyanate, Alicyclic polyisocyanates such as hydrogenated diphenylmethane diisocyanate, etc., and such urea bodies, isocyanurate bodies, and further with ethylene glycol, propylene glycol, neopentyl glycol, trimethylolpropane , Castor oil and other low-molecular-weight active hydrogen compound reactant adducts, etc. Among them, from the viewpoint of reactivity with hydroxyl groups, trimethylolpropane-modified aromatic polyisocyanate is preferred, and trimethylolpropane-modified toluene diisocyanate is particularly preferred. In addition, the content of the crosslinking agent is preferably 0.01 to 10 parts by mass, particularly preferably 0.05 to 5 parts by mass, and more preferably 0.1 to 1 part by mass relative to 100 parts by mass of the (meth)acrylate polymer.

(2)-5 various additives Active energy ray-curable adhesive components are preferably formulated with various additives such as photopolymerization initiators, silane coupling agents, refractive index modifiers, antistatic agents, adhesion imparting agents, antioxidants, ultraviolet absorbers, light stabilizers, and softeners as desired Agents, fillers, etc.

(3) Thickness The thickness of the particle-dispersed light-diffusing film can be appropriately changed according to the application and various purposes, but it is usually preferably set to a value in the range of 5 to 200 μm. The reason is that when the thickness of the particle-dispersed light diffusion film is set to 5 μm, handling is difficult, and there may be no lamination effect (haze value increase effect). On the other hand, when the thickness of the particle-dispersed light-diffusing film is more than 200 μm, the value of the linear transmittance may decrease sharply, and the ratio of backscattering may increase too much. Therefore, the lower limit of the thickness of the particle dispersion type light diffusion film is preferably set to a value of 10 μm or more, and more preferably set to a value of 20 μm or more. On the other hand, the upper limit of the thickness of the particle dispersion type light diffusion film is preferably set to a value of 150 μm or less, and more preferably set to a value of 100 μm or less.

(4) Manufacturing method The particle dispersion type light diffusion film can be manufactured by uniformly mixing and dispersing a specific amount of specific particles in a resin component before curing, forming a coating film therefrom, and further irradiating active energy rays such as ultraviolet rays.

(5) Normal haze value The usual haze value of the particle-dispersed light-diffusing film monomer, that is, the haze value measured in accordance with JIS K 7136: 2000 is preferably set to a value of 5% or more. The reason for this is that, by setting the normal haze value of the particle-dispersed light-diffusing film monomer to a specific value or more, and adding the variable-angle haze value to it, it is possible to obtain excellent moire suppression. Therefore, the lower limit of the usual haze value of the particle-dispersed light-diffusing film monomer is preferably set to a value of 20% or more, and more preferably set to a value of 50% or more. However, when the upper limit of the usual haze value of the particle-dispersed light-diffusing thin film monomer is too large, the yield may be significantly reduced in manufacturing. Therefore, the upper limit of the usual haze value of the particle-dispersed light-diffusing film monomer is preferably set to a value of 95% or less, more preferably a value of 90% or less, and even more preferably a value of 88% or less.

3. Effect According to the ripple suppression film laminate 20, the lamination effect to the particle-dispersed light-diffusing film monomer having a variable angle haze value as shown in FIG. 5 can be obtained. That is, line A in FIG. 5 is a graph showing the variable angle haze value in the MD direction of the ripple suppression film (single layer) of Example 1 described later. In addition, the middle line B in FIG. 5 is a graph showing the variable angle haze value in the MD direction of the ripple suppression film laminate according to Example 6 described later. More specifically, it shows that for a ripple suppression film laminate (single layer) according to Example 1 to be described later, a laminate of a particle dispersion type light diffusion film monomer (usually haze value: 20%) is formed. Graph of variable angle haze value. From the comparison between line B and line A, it can be understood that by laminating a specific particle-dispersed light-diffusing thin film monomer (usually haze value: 20%), the variable-angle haze value can be adjusted from 81.0% to 84.8 %.

In addition, the line C in FIG. 5 is a graph showing the variable angle haze value in the MD direction of the ripple suppression film laminate according to Example 7 described later. More specifically, it shows a laminate of a ripple-inhibiting film formed by laminating a particle-dispersed light-diffusing film monomer (usually haze value: 40%) according to the ripple-inhibiting film (single layer) of Example 1 described later. Graph of variable angle haze value. From this line C, etc., it can be understood that by laminating a specific particle dispersion type light-diffusing film monomer (usually haze value: 40%), the variable-angle haze value can be adjusted from 81.0% to 86.3%.

In addition, the line D in FIG. 5 is a graph showing the variable angle haze value in the MD direction of the ripple suppression film laminate according to Example 8 described later. More specifically, it shows that for a ripple suppression film (single layer) according to Example 1 described later, a ripple suppression film laminate formed by laminating a particle dispersion type light diffusion film monomer (usually haze value: 60%) Graph of variable angle haze value. From this line D, etc., it can be understood that by laminating a specific particle dispersion type light-diffusing thin film monomer (usually haze value: 60%), the variable-angle haze value can be adjusted from 81.0% to 90.2%. Therefore, if the ripple suppression film laminate 20, 20' is formed by laminating a specific particle dispersion type light diffusion film to the ripple suppression film, the value of the variable angle haze value can be economically leveled and can be set to a specific range The value within.

[Third Embodiment] As shown in FIG. 6, the third embodiment is a ripple suppression film laminate 30 including a first ripple suppression film 10a and a second ripple suppression film 10b that suppresses the ripple phenomenon caused by two spatial frequency differences. In addition, the first ripple suppression film 10a and the second ripple suppression film 10b each have a low refractive index region 14 having a relatively low refractive index in a single layer, and a plurality of pillars 12 made of a relatively high refractive index material . Furthermore, it is a ripple suppression film layer characterized by laminating an angle formed by the MD direction of the first ripple suppression film 10a and the MD direction of the second ripple suppression film 10b within a range of 1 to 179˚ The combined body 30 is a corrugated film laminate 30 characterized by the linear transmittance expressed by the relational expression (1) of the corrugated film laminate 30 as a value of 8% or less (hereinafter, in order to The difference in the form of the ripple suppression film laminate is sometimes referred to as the second ripple suppression film laminate). By constructing the ripple suppression film laminate 30 in this way, it is possible to absorb characteristic deviations such as the usual haze value in the MD direction and the like, and it is possible to finely and easily adjust the straight-line transmittance or variable-angle haze value expressed by the relationship (1) Etc., can exert a specific ripple suppression effect. Hereinafter, the ripple suppression film laminate of the third embodiment of the present invention will be specifically described with reference to the drawings.

1. Basic Composition In particular, when the direction of travel of the manufacturing step of the first ripple suppression film 10a is set to the MD direction, and the direction of parallel to the direction of travel (MD direction) of the manufacturing step of the first ripple suppression film 10a and the perpendicular direction is set to the TD direction, in particular In the MD direction, there are cases where the value of the variable-angle haze varies based on the internal refractive index distribution structure (refer to FIG. 7(b), dashed line A (MD direction) and solid line B (TD direction)), This estimation is due to the traveling direction (MD direction) of the manufacturing process, the variation of the irradiation amount of the active energy rays irradiated to the both end portions, and the like. Therefore, by laminating the intersection angle between the MD direction of the first ripple suppression film and the MD direction of the second ripple suppression film to a value in the range of 1 to 179˚, the width direction of the ripple suppression film can be Those with reduced haze deviation (refer to solid line C in Fig. 7(a); laminated at a cross angle of 90˚, showing the variable angle haze in the TD direction and MD direction of the first ripple suppression film reference, both showing overlap behavior). Therefore, it is better to laminate in such a way that the intersection angle between the MD direction of the first ripple suppression film and the MD direction of the second ripple suppression film is set to a value in the range of 30 to 150˚, and it is better to use the intersection angle as Lamination by means of values in the range of 60~120˚, it is best to laminate by means of the value of the intersection angle set in the range of 80~100˚, such as 90˚.

2. MD direction of the first and second ripple suppression films The MD direction of the first and second ripple suppression films means the direction of travel of the manufacturing steps of the ripple suppression film. In other words, the MD direction of the ripple suppression film is continuously transported during manufacturing, so it is susceptible to slight angle changes or parallelism changes. Therefore, when the angle is changed between the MD direction and the TD direction, the direction in which the difference in the haze value is large can be easily visually determined as the MD direction. In addition, in order to make it easy to discriminate the MD direction of the corrugated suppression film, when manufacturing the corrugated suppression film, it is also preferable to expose the identification marks such as arrows at the same time when the active energy rays are irradiated.

3. Effect Therefore, considering the MD direction of the first ripple suppression film and the MD direction of the second ripple suppression film, by laminating the two in the direction shown by arrow A in FIG. 6, as shown in FIG. 7(a), the Values such as variable angle haze in the MD direction and TD direction are averaged and adjusted to high values.

[Fourth Embodiment] The fourth embodiment is arranged along the arrow A shown in FIG. 8 and is arranged from the bottom to the plural pattern-containing patterns of the optical member 54 including at least the first pattern-containing structural layer and the second optical member 58 including the pattern-containing structural layer A composite display device 100 having a ripple suppression film 10 between the optical members of the structural layer and suppressing the ripple phenomenon caused by the difference in two spatial frequencies. Furthermore, the ripple suppression film 10 has a plurality of pillars made of a material with a relatively high refractive index in a region with a relatively low refractive index made of a single layer, and is expressed by the relationship (1) The linear transmittance of the ripple suppression film is set to a value of 8% or less as a characteristic of the composite display device 100. Hereinafter, the composite display device 100 according to the fourth embodiment of the present invention will be specifically described with reference to the drawings.

1. Basic Composition It is a composite display device provided with a ripple suppression film disposed at least between the optical member of the first patterned structural layer and the optical member of the second patterned structural layer and suppressing the ripple phenomenon caused by the difference in two spatial frequencies . For example, in the case where the composite image display device is a liquid crystal display device, as shown in FIG. 8, the backlight 50, the first liquid crystal panel 54 including the first patterned structure layer optical component, and the ripple The second liquid crystal panel 58 which is an optical member of the suppression film 10 and the second patterned structure layer. In addition, the aforementioned ripple suppression film may be replaced with the first ripple suppression film laminate or the second ripple suppression film laminate.

2. The first optical component with patterned structure layer The optical member as the first pattern-containing structure layer is typically a liquid crystal panel. In addition, due to the relationship with the optical member of the second patterned structural layer, the appearance of the first optical member of the patterned structural layer like the ripple phenomenon is preferably, for example, an organic EL element, a liquid crystal display device The color filter, the color filter of the organic EL element, the special electrode pattern of the liquid crystal display device, the special electrode pattern of the organic EL element, the prismatic pattern of the liquid crystal display device, etc. also serve as the first patterned structure layer Optical components.

3. The second optical component with patterned structure layer The optical member as the second patterned structure layer is typically a second liquid crystal panel. In addition, due to the relationship with the optical member of the first patterned structure layer, the appearance of the second patterned structure layer-like optical member like the ripple phenomenon is preferably, for example, an organic EL element, a liquid crystal display device The color filter, the color filter of the organic EL element, the special electrode pattern of the liquid crystal display device, the special electrode pattern of the organic EL element, the prismatic pattern of the liquid crystal display device, etc. also serve as the second pattern-containing structure layer Optical components.

4. Effect The composite display device using the ripple suppression film having an internal refractive index distribution structure and the like between the optical member of the first patterned structure layer and the optical member of the second patterned structure layer is effective It exerts ripple suppression effect, maintains a low straight-through transmittance, and can also suppress backscattering, and can recognize high-contrast images. [Example]

The present invention will be described in more detail below with reference to examples. However, unless there is no particular reason, the scope of the present invention is not limited to the description of the following examples.

[Example 1] 1. Preparation of (meth)acrylate copolymer In a polymerization vessel with a stirring device, as a monomer component, containing 1 mole of polypropylene glycol (PPG) with a weight average molecular weight of 9,200, containing 2 moles of isophorone diisocyanate (IPDI) and 2-hydroxyethyl methacrylate (HEMA) After 2 moles, solution polymerization was carried out according to a common method to obtain polyether carbamate methacrylate with a weight average molecular weight of 9,900. The weight average molecular weight of the obtained polyether carbamate methacrylate was measured using a gel permeation chromatography (GPC) method under the following measurement conditions as a polystyrene conversion value, and was 500,000. ・GPC measuring device: manufactured by TOSOH Corporation, HLC-8020 ・GPC string: manufactured by TOSOH Corporation (the following description is in order of passage) TSK protective column HXL-H TSK gel GMHXL (×2) TSK gel G2000HXL ・Measurement solvent: Tetrahydrofuran ・Measurement temperature: 40℃

2. Modulation of composition for ripple suppression film Next, add 100 parts by weight of o-phenylphenoxyethoxyethyl acrylate having a weight average molecular weight of 268 to 100 parts by weight of the obtained polyether carbamate methacrylate in a container with a stirring device After mixing with 10 parts by weight of 2-hydroxy-2-methylphenylacetone, the mixture was heated and mixed at 80°C to obtain a composition for a ripple suppression film. In addition, after measuring the refractive indexes of polyether carbamate methacrylate and o-phenylphenoxyethoxyethyl acrylate, it was measured by an Abbe refractometer [manufactured by Atago Corporation, product name "Abbe Refractometer DR-M2", Na light source, wavelength: 589 nm], measured according to JIS K0062, 1.58 and 1.46, respectively.

3. Coating of the composition for ripple suppression film Next, using a doctor blade applicator, the obtained composition for a corrugation suppression film was peeled off on one side of a polyethylene terephthalate film with a polysiloxane-based peeling agent, and a heavy peeling type peeling sheet (LINTEC (share ), the coating layer is formed on the peeling surface of the product name "SP-PET188CL"). Next, using a drying furnace, heat treatment was carried out at 90°C for 1 minute to obtain a coating layer having a thickness of 120 μm. Next, on the exposed surface side of the coating layer, a 38 μm-thick light-peeling film (made by LINTEC Co., Ltd., product name “SP-PLZ383030”) with a thickness of 38 μm was laminated to form a so-called gap lamination structure.

4. The photohardening of the coating layer is followed. For the coating layer of the gap lamination structure, the film is lightly peeled off and installed by an ultraviolet irradiation device (for the ultraviolet point light source "HYPERCURE 200" manufactured by Yamashita Denso (Co., Ltd.). (Uniform exposure adapter) The parallel light of the ultraviolet rays obtained is exposed to the coating film at 0˚ with a peak illuminance of 1.0 mW/cm ² and a cumulative light amount of 25 mJ/cm ² Light curing of the coating layer. Furthermore, as shown in the schematic diagram of FIG. 1, a ripple suppression film having a column structure of high refractive index formed throughout the film in a low refractive index region was obtained.

5. Evaluation (1) Measurement of straight-through transmittance The straight-through transmittance of the obtained ripple suppression film was measured using a light source, two polarizing plates, and a luminance meter. That is, between the two polarizing plates arranged in a parallel Nicole lens, the state of the obtained corrugated suppression film is sandwiched in such a manner that the absorption axis of the polarizing plate coincides with the MD direction of the corrugated suppression film, and the transmission is measured The brightness of light (Lp). On the other hand, for the two polarizers arranged with parallel Nicols in a state where the ripple suppression film is not sandwiched, that is, the blank brightness of the transmitted light was measured under the same conditions for only two polarizers (Lo=2763cd /m ² ). Next, from the obtained Lp(cd/m ² ) and Lo(cd/m ² ), the linear transmittance is calculated according to the following relational expression. Straight transmission = Lp/Lo×100 (1)

(2) Determination of variable angle haze After peeling off the peeling film on both sides of the obtained ripple suppression film, it was attached to a 1.1 mm thick glass plate without using an adhesive, and a measurement sample was prepared. Secondly, for the measurement sample, use a variable-angle haze meter (manufactured by Toyo Seiki Co., Ltd., product name "Haze Meter with Variable Incident Angle Device"), continuous at an angle range of -70˚~+70˚ Measure the haze value, and set the lowest haze value as the variable angle haze value (%).

(3) Measurement of usual haze value and total light transmittance After peeling off the peeling film on both sides of the obtained ripple suppression film, it was attached to a 1.1 mm thick glass plate without using an adhesive, and a measurement sample was prepared. Secondly, for the ripple suppression film, according to JIS K 7136:2000, a haze meter (manufactured by Nippon Denshoku Industries Co., Ltd., product name "NDH5000") was used to measure the usual haze value (%) and total light transmittance (% ).

(4) Ripple suppression evaluation 1 (left-right direction) The light peeling film of the obtained ripple suppression film is peeled off, and the exposed surface of the ripple suppression film is attached to the surface of the tablet computer terminal (made by the US Apple Inc., product name "iPad (registered trademark)", resolution: 264dpi) in a state of facing Attached. Next, the heavy peeling film was peeled off, and a mask for a liquid crystal display device having a lattice pattern of 60, 120, and 180 ppi was attached to the exposed surface of the ripple suppression film as an evaluation sample. Next, set the screen of the tablet computer terminal to full green display (RGB value (R, G, B)=0, 255, 0), visually observe the left-right direction (corresponding to the CD direction), and proceed according to the following criteria Evaluation of inhibition of ripple 1. ◎: For the display screen, from the front (0˚ direction) and the oblique direction (60˚ direction) of the normal direction, no wrinkles were observed in any grid pattern. ○: For the display screen, although the frontal visual observation from the normal direction does not observe the occurrence of moire, if it is recognized from the oblique direction, some moire occurs in any lattice pattern. △: For the display screen, although the frontal visual observation from the normal direction does not observe the occurrence of moire, if it is recognized from the oblique direction, the occurrence of moire is clearly observed in any lattice pattern. ×: For the display screen, the frontal visual observation from the normal direction and the oblique viewing direction clearly show that the occurrence of moiré is observed in any lattice pattern.

(5) Ripple suppression evaluation 2 (vertical direction) Set the screen of the tablet computer terminal to a full green display (RGB value (R, G, B) = 0, 255, 0), visually observe the up and down direction (corresponding to the MD direction), and perform the resulting ripple based on the following criteria Evaluation of the suppression of the ripple of the film 2 ◎: For the display screen, from the front (0˚ direction) and the oblique direction (60˚ direction) of the normal direction, no wrinkles were observed in any grid pattern. ○: For the display screen, although the frontal visual observation from the normal direction does not observe the occurrence of moire, if it is recognized from the oblique direction, some moire occurs in any lattice pattern. △: For the display screen, although the frontal visual observation from the normal direction does not observe the occurrence of moire, if it is recognized from the oblique direction, the occurrence of moire is clearly observed in any lattice pattern. ×: For the display screen, the frontal visual observation from the normal direction and the oblique viewing direction clearly show that the occurrence of moiré is observed in any lattice pattern.

(6) Recognition of the degree of backscatter After peeling off the peeling film on both sides of the obtained ripple suppression film, it was attached to a 1.1 mm thick glass plate without using an adhesive, and a measurement sample was prepared. The exposed surface of the ripple suppression film is attached to the display screen of the anti-glare liquid crystal display device. Next, the liquid crystal display device was set to black display, and the back surface of the obtained ripple suppression film was visually observed to obtain a photograph as shown in FIG. 9. The observation environment is conducted in a bright environment illuminated by fluorescent lamps from various directions. From the state shown in this photograph, the degree of backscattering was evaluated according to the following criteria. ◎: Observed from the front and oblique rear, no blushing is seen, it is assumed that there is no backscattering. ○: Observed from the front and oblique rear, a little whitishness was observed, and the degree of rear scattering was small. △: Observed from the front and oblique rear, and whitish slightly, the degree of rear scattering is quite large. ×: Observed from the front and oblique rear, whitening is seen, and the back scattering is remarkable.

[Example 2] In Example 2, in addition to replacing the 120 μm-thick UV-penetrating light peeling film of Example 1, a gap layering method using a 60 μm-thick UV-penetrating light peeling film (hereinafter sometimes referred to as 60 μm gap layer) was implemented Except for the law), in the same manner as in Example 1, a moire suppression film was prepared, and the moire suppression properties were evaluated.

[Example 3] In Example 3, two ripple suppression films (120 μm gap lamination method) obtained in the same manner as in Example 1 were prepared, and these were laminated in such a way that the MD direction and the TD direction of the ripple suppression film were 90° orthogonal to each other Except for making a ripple suppression film laminate, in the same manner as in Example 1, the ripple suppression properties and the like were evaluated.

[Example 4] In Example 4, two pieces of the ripple suppression film (60 μm gap lamination method) obtained in the same manner as in Example 2 were prepared, and these were laminated in such a manner that the MD direction and the TD direction of the ripple suppression film were orthogonal to each other to make a ripple Except for the suppression film laminate, in the same manner as in Example 1, the ripple suppression properties and the like were evaluated.

[Example 5] In Example 5, three pieces of the ripple suppression film obtained in the same manner as in Example 1 (120 μm gap lamination method) were prepared, and these 3 layers were laminated in such a way that the MD direction of the ripple suppression film was completely aligned to make a ripple suppression film layer Except for the combination, in the same manner as in Example 1, the moire suppression property and the like were evaluated.

[Example 6] In Example 6, on one side of the ripple suppression film (120 μm gap lamination method) obtained in the same manner as Example 1, a particle-dispersed ripple suppression film (thickness: 60 μm, haze value: 20%) was produced, and a ripple suppression film was made Except for the laminate, in the same manner as in Example 1, the moire suppressability and the like were evaluated.

In addition, the particle-dispersed ripple suppression film is derived from a composition for a ripple suppression film that uses an acrylate copolymer (as a monomer component, 2-ethylhexyl acrylate) obtained by a solution polymerization method 60 parts by weight of ester, 10 parts by weight of isobornyl acrylate, 10 parts by weight of N-acryloylmorpholine and 20 parts by weight of 2-hydroxyethyl acrylate) 100 parts by weight, active energy ray hardening component (ethylene oxide modified A mixture of high-quality isocyanuric acid diacrylate and ethylene oxide-modified isocyanuric acid triacrylate (manufactured by East Asia Synthetic Co., Ltd., product name "ALUNIX M315")) 5 parts by weight as a photopolymerization initiator 0.25 parts by weight of 2-hydroxy-2-methyl-1-phenylpropane-1-one, 0.25 parts by weight of benzophenone, 0.2 parts by weight of trimethylolpropane modified toluene diisocyanate as a crosslinking agent, 0.3 parts by weight of 3-glycidoxypropyltrimethoxysilane as a silane coupling agent, and fine particles made of silicon-containing compounds (manufactured by Momentive Performance Materials Japan, product name "TOSPEARL 145L", average particle diameter: 4.5 μm, refractive index: 1.43) 1 part by weight is mixed and obtained by diluting with methyl ethyl ketone. Next, using a doctor blade applicator, the obtained composition for a ripple suppression film was peeled off on one side of polyethylene terephthalate with a silicone release agent (a heavy-duty peeling sheet (manufactured by Lintec Co., Ltd.) The product name "SP-PET382050") forms a coating layer on the peeled surface. Next, using a drying oven, heat treatment was carried out at 90°C for 1 minute to obtain a 50 μm thick coating layer. Next, on the exposed surface side of the coating layer, a light-peeling film with a thickness of 120 μm having ultraviolet transmittance (manufactured by LINTEC Co., Ltd., product name “SP-PET382120”) was laminated. Then, by lightly peeling off the film, the parallel light of the ultraviolet rays obtained by the ultraviolet irradiation device (the one that installs the optional uniform exposure adapter for the ultraviolet point light source "HYPERCURE 200" made by Yamashita Denki Co., Ltd.) is used to apply the parallel light. When the cloth film is incident at 0˚, it is exposed to light with a peak illuminance of 1.0 mW/cm ² and a cumulative light amount of 25 mJ/cm ² to photo-harden the coating layer. Finally, after curing for 7 days under the conditions of 23° C. and 50% Rh, the resulting particle-dispersed ripple suppression film (thickness: 50 μm, usual haze value: 20%) is one side of one sheet of the ripple suppression film obtained in Example 1. The sticking was carried out to prepare a ripple suppression film laminate, and in the same manner as in Example 1, the ripple suppression properties were evaluated.

[Example 7] In Example 7, on one side of the ripple suppression film (120 μm gap layer method) obtained in the same manner as Example 1, the amount of particles in the particle dispersion-type ripple suppression film produced in Example 6 was adjusted to produce a particle-dispersion-type ripple suppression The film (thickness: 50 μm, haze value: 40%), except for the formation of a ripple suppression film laminate, was evaluated in the same manner as in Example 1 to evaluate the ripple suppression properties and the like.

[Example 8] In Example 8, on one side of the ripple suppression film (120 μm gap layer method) obtained in the same manner as Example 1, the amount of particles in the particle dispersion-type ripple suppression film produced in Example 6 was adjusted to produce a particle-dispersion-type ripple suppression A film (thickness: 50 μm, haze value: 60%), except for the formation of a ripple suppression film laminate, was evaluated in the same manner as in Example 1 to evaluate the ripple suppression properties and the like.

[Comparative Example 1] In Comparative Example 1, the amount of particles in the particle-dispersed ripple suppression film prepared in Example 6 was adjusted, and the particle-dispersed ripple suppression film (thickness: 50 μm, haze value: 75%) was used as a monomer. In Example 1, the moire suppressability and the like were evaluated.

[Comparative Example 2] In Comparative Example 2, the particle type in the particle-dispersed ripple suppression film produced in Example 6 was used as a styrene particle filler (average particle diameter: 4.5 μm, blending amount: 10.0% by mass), and the particle-dispersed ripple suppression film (Thickness: 50 μm, haze value: 87%) Except for use as a monomer, in the same manner as in Example 1, the moire suppression property and the like were evaluated.

[Comparative Example 3] In Comparative Example 3, the particle type in the particle-dispersed ripple suppression film produced in Example 6 was used as a styrene particle filler (average particle diameter: 2.5 μm, blending amount: 22.4% by mass) to obtain the first particle-dispersed ripple Suppression film (usually haze value: 85%, thickness: 12 μm). Similarly, the particle type in the particle-dispersed ripple suppression film produced in Example 6 was used as a styrene particle filler (average particle diameter: 2.5 μm, blending amount: 7.1% by mass) to obtain a second particle-dispersed ripple suppression film ( Haze value: 53%, thickness: 12 μm). The first particle dispersion-type ripple suppression film and the second particle dispersion-type ripple suppression film were laminated to form a ripple suppression film laminate (usually haze value: 91%, thickness: 24 μm). As in Example 1, the ripple suppression was evaluated Sex and so on.

[產業上之可利用性]

[Industry availability]

As described above in detail, according to the present invention, by setting the linear transmittance expressed by the specific relational expression (1) to a value within a specific range, it is possible to provide a ripple suppressing film with good ripple suppressing properties and a low degree of rearward diffusion. Therefore, the ripple suppression film and the like of the present invention can be arranged between the gaps of the first display device and the second display device to form a composite display device, which can obtain excellent ripple suppression properties, and the degree of rearward diffusion is small, and the recognition is high Contrast stereo image, etc.

Further, although the application object of the ripple suppression film of the present invention is typically a combination of the first liquid crystal panel and the second liquid crystal panel, it can also be widely used in a combination in which ripple generation is a problem. Therefore, not only the liquid crystal display device but also the organic EL element and the electrode pattern may be used, so it can also be used for the combination of the first organic EL element and the second organic EL element, or the first liquid crystal panel and the second liquid crystal panel Combinations, etc. where the same ripples are a problem. That is, even for such applications, it is expected to have good ripple suppression, or less degree of later diffusion, and contribute to the improvement of the quality of stereoscopic images.

10‧‧‧Wave suppression film 12‧‧‧Columns with relatively high refractive index (high refractive index part) 14‧‧‧Low refractive index region with relatively low refractive index (low refractive index section) 16, 16a, 16b ‧‧‧ adhesive layer 18. 18’‧‧‧Particle-dispersed ripple suppression film 18a‧‧‧particle 18b‧‧‧Resin layer 20‧‧‧Wave suppression film laminate (1st wave suppression film laminate) 30‧‧‧Wave suppression film laminate (2nd wave suppression film laminate) 50‧‧‧Backlight 52‧‧‧First polarizing film 54‧‧‧First optical component with patterned structure layer 56‧‧‧The second polarizing film 58‧‧‧Second optical component with patterned structure layer 60‧‧‧The third polarizing film 90, 100, 110‧‧‧ composite display device

Fig. 1 is a schematic perspective view of a ripple suppression film. Figure 2 (a) ~ (c) is a vertical cross-sectional view of the ripple suppression film. FIG. 3 is a diagram for explaining the relationship between the ripple evaluation (relative value) of the ripple suppression film and the linear transmission (Lp/Lo×100) (%). 4(a) to (b) are diagrams for explaining the ripple suppression film laminate (first ripple suppression film laminate). FIG. 5 is a diagram for explaining the effect of the ripple suppression film laminate (first ripple suppression film laminate). FIG. 6 is a diagram for explaining the effect of another ripple suppression film laminate (second ripple suppression film laminate). 7(a) to (b) are diagrams for explaining the effect of another ripple suppression film laminate (second ripple suppression film laminate). FIG. 8 is a diagram for explaining a composite display device using a ripple suppression film. 9 is a graph (photograph) showing the degree of backscattering of the ripple suppression film and the ripple suppression film laminate.

10‧‧‧Wave suppression film

12‧‧‧Columns with relatively high refractive index (high refractive index part)

14‧‧‧Low refraction area with relatively low refractive index (low refractive index section)

Claims (8)

A ripple suppression film that suppresses the ripple phenomenon caused by the difference in two spatial frequencies, and is characterized by a relatively low refractive index region formed by a single layer, having a relatively high refractive index A plurality of pillars made of the material, and the linear transmittance of the ripple suppression film defined by the following relationship (1) is set to a value of 8% or less, linear transmittance = Lp/Lo×100 (1) ( Lp: the brightness of the transmitted light (cd/m ² ) measured between the two polarizers arranged in parallel Nicole lens state with the ripple suppression film interposed, Lo: only for the parallel Nicole lens state The brightness of the transmitted light measured by the two polarizers (cd/m ² )). The ripple suppression film according to claim 1, wherein the variable angle haze value of the aforementioned ripple suppression film based on the MD direction and the TD direction is ±70˚, or either of the variable angle haze values is set to 80% The above value. As for the ripple suppression film of claim 1, the haze value measured in accordance with JIS K 7136:2000 is set to a value of 80% or more. As for the ripple suppression film of claim 1, the thickness is set to a value in the range of 40 to 500 μm. The ripple suppression film according to claim 1, wherein an adhesive layer is provided on at least one surface. A ripple suppression film laminate, which is characterized by comprising a ripple suppression film laminate as claimed in claim 1, A particle-dispersed light diffusion layer is provided on at least one surface of the ripple suppression film. A ripple suppression film laminate, which suppresses the ripple phenomenon caused by the difference in two spatial frequencies, and includes a first ripple suppression film and a second ripple suppression film. The ripple suppression film laminate is characterized by the aforementioned first The ripple suppression film and the second ripple suppression film have a plurality of pillars made of a relatively high refractive index material in a region with a relatively low refractive index made of a single layer. The angle formed between the MD direction and the MD direction of the aforementioned second ripple suppression film corresponding to these is set to a value in the range of 1 to 179˚, and the ripple suppression film laminate defined by the following relationship (1) The linear transmittance is set to a value of 8% or less, linear transmittance = Lp/Lo × 100 (1) (Lp: between two polarizing plates arranged in a parallel Nicol lens state, sandwiching the ripple suppression film state measurement of transmitted light luminance ^{(cd / m 2), Lo} : 2 only polarizing plates arranged parallel to the Fresnel lens Nike state measurement of transmitted light luminance (cd / m ^2)). A composite display device comprising at least an optical member disposed between a first patterned structural layer and an optical member of a second patterned structural layer, and capable of suppressing a ripple phenomenon caused by a difference in two spatial frequencies The composite display device of the ripple suppression film is characterized in that the aforementioned ripple suppression film has a plurality of pillars made of a relatively high refractive index material in a region with a relatively low refractive index made of a single layer, and The linear transmittance of the ripple suppression film defined by the following relationship (1) is set to a value of 8% or less, linear transmittance = Lp/Lo × 100 (1) (Lp: placed in a parallel Nicol lens state The brightness of the transmitted light (cd/m ² ) measured between the two polarizing plates with the ripple suppression film interposed, Lo: the brightness of the transmitted light measured only for the two polarizing plates arranged in a parallel Nicol lens state (cd/m ² )).

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