TW202000201A - Process for preparing 1-arylsulfonyl-pyrrolidine-2-carboxamide Transient Receptor Potential channel antagonist compounds and crystalline forms thereof - Google Patents

Process for preparing 1-arylsulfonyl-pyrrolidine-2-carboxamide Transient Receptor Potential channel antagonist compounds and crystalline forms thereof Download PDF

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TW202000201A
TW202000201A TW108105242A TW108105242A TW202000201A TW 202000201 A TW202000201 A TW 202000201A TW 108105242 A TW108105242 A TW 108105242A TW 108105242 A TW108105242 A TW 108105242A TW 202000201 A TW202000201 A TW 202000201A
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凱里 布萊德雷 帕司庫歐 克拉格
法蘭西斯 葛賽琳
韓翀
詹姆士 李維 克尼佩爾
約瑟夫 路巴哈
史考特 賽維奇
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瑞士商赫孚孟拉羅股份公司
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    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D401/00Heterocyclic compounds containing two or more hetero rings, having nitrogen atoms as the only ring hetero atoms, at least one ring being a six-membered ring with only one nitrogen atom
    • C07D401/02Heterocyclic compounds containing two or more hetero rings, having nitrogen atoms as the only ring hetero atoms, at least one ring being a six-membered ring with only one nitrogen atom containing two hetero rings
    • C07D401/04Heterocyclic compounds containing two or more hetero rings, having nitrogen atoms as the only ring hetero atoms, at least one ring being a six-membered ring with only one nitrogen atom containing two hetero rings directly linked by a ring-member-to-ring-member bond
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    • A61KPREPARATIONS FOR MEDICAL, DENTAL OR TOILETRY PURPOSES
    • A61K31/00Medicinal preparations containing organic active ingredients
    • A61K31/33Heterocyclic compounds
    • A61K31/395Heterocyclic compounds having nitrogen as a ring hetero atom, e.g. guanethidine or rifamycins
    • A61K31/495Heterocyclic compounds having nitrogen as a ring hetero atom, e.g. guanethidine or rifamycins having six-membered rings with two or more nitrogen atoms as the only ring heteroatoms, e.g. piperazine or tetrazines
    • A61K31/505Pyrimidines; Hydrogenated pyrimidines, e.g. trimethoprim
    • A61K31/506Pyrimidines; Hydrogenated pyrimidines, e.g. trimethoprim not condensed and containing further heterocyclic rings
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D401/00Heterocyclic compounds containing two or more hetero rings, having nitrogen atoms as the only ring hetero atoms, at least one ring being a six-membered ring with only one nitrogen atom
    • C07D401/14Heterocyclic compounds containing two or more hetero rings, having nitrogen atoms as the only ring hetero atoms, at least one ring being a six-membered ring with only one nitrogen atom containing three or more hetero rings

Abstract

The invention relates generally to methods of preparing 1-arylsulfonyl-pyrrolidine-2-carboxamide Transient Receptor Potential channel antagonist compounds of the following structure (I): The invention further relates to solvate and co-crystal polymorphs of crystalline formula (I), and methods of preparation thereof.

Description

製備1-芳基磺醯基-吡咯啶-2-甲醯胺瞬時受體電位通道拮抗劑化合物及其結晶型式之方法Method for preparing 1-arylsulfonyl-pyrrolidine-2-carboxamide transient receptor potential channel antagonist compound and its crystal form

本發明之領域大體上關於製備以下結構(I)之1-芳基磺醯基-吡咯啶-2-甲醯胺瞬時受體電位通道拮抗劑化合物之方法:

Figure 02_image004
。 本發明之領域另外係關於結晶式(I)之溶劑合物及共晶體多晶型物及其製備方法。The field of the present invention generally relates to a method for preparing 1-arylsulfonyl-pyrrolidine-2-carboxamide transient receptor potential channel antagonist compounds of the following structure (I):
Figure 02_image004
. The field of the invention additionally relates to crystalline solvates and eutectic polymorphs of formula (I) and methods for their preparation.

瞬時受體電位(TRP)通道係見於多種(及其他動物)細胞類型之質膜上之一類離子通道。存在至少28種已知人類TRP通道,其係基於序列同源性及功能斷裂成多個家族或群組。瞬時受體電位陽離子通道,子族A成員1 (TRPA1)係經由鈉、鉀及鈣流動(flux)調節膜電位之非選擇性陽離子傳導通道。已展示TRPA1在人類背根(dorsal root)神經節神經元及外周感覺神經中高度表現。在人類中,TRPA1藉由多種反應性化合物(諸如丙烯醛、烯丙基異硫氰酸酯、臭氧)以及非反應性化合物(諸如菸鹼及薄荷醇)活化,且因此被認為充當化學感測器。The transient receptor potential (TRP) channel is a type of ion channel found on the plasma membrane of various (and other animal) cell types. There are at least 28 known human TRP channels that are broken into multiple families or groups based on sequence homology and function. Transient receptor potential cation channel, subgroup A member 1 (TRPA1) is a non-selective cation conduction channel that regulates membrane potential via sodium, potassium, and calcium flux. TRPA1 has been shown to be highly expressed in human dorsal root ganglion neurons and peripheral sensory nerves. In humans, TRPA1 is activated by a variety of reactive compounds (such as acrolein, allyl isothiocyanate, ozone) and non-reactive compounds (such as nicotine and menthol), and is therefore considered to act as a chemical sensor Device.

許多已知TRPA1促效劑係在人類及其他動物中引起疼痛、刺激及神經性炎症之刺激物。因此,將預期阻礙TRPA1通道活化劑生物效應之TRPA1拮抗劑或藥劑將適用於治療諸如哮喘及其惡化、慢性咳嗽及相關疾病之疾病,以及適用於治療急性及慢性疼痛。近期,亦已展示組織損傷及氧化應激之產物(例如4-羥基壬烯醛及相關化合物)活化TRPA1通道。此研究結果提供小分子TRPA1拮抗劑在治療與組織損傷、氧化應激及支氣管平滑肌收縮相關之疾病(諸如哮喘、慢性阻塞性肺病(COPD)、職業性哮喘及病毒誘發之肺炎)中之效用的額外基本原理。此外,近期研究結果係TRPA1通道之活化與疼痛感覺增加相關(Kosugi等人, J. Neurosci 27, (2007) 4443-4451;Kremayer等人, Neuron 66 (2010) 671-680;Wei等人, Pain 152 (2011) 582-591);Wei等人, Neurosci Lett 479 (2010) 253-256)),提供小分子TRPA1抑制劑在治療疼痛病症中之效用的額外基本原理Many known TRPA1 agonists are irritants that cause pain, irritation, and neuropathic inflammation in humans and other animals. Therefore, it is expected that TRPA1 antagonists or agents that block the biological effects of TRPA1 channel activators will be suitable for the treatment of diseases such as asthma and its exacerbation, chronic cough and related diseases, and for the treatment of acute and chronic pain. Recently, products of tissue damage and oxidative stress (such as 4-hydroxynonenal and related compounds) have also been shown to activate TRPA1 channels. The results of this study provide the effectiveness of small molecule TRPA1 antagonists in the treatment of diseases related to tissue damage, oxidative stress and bronchial smooth muscle contraction, such as asthma, chronic obstructive pulmonary disease (COPD), occupational asthma, and virus-induced pneumonia Extra basic principles. In addition, recent research results are related to activation of TRPA1 channel and increased pain perception (Kosugi et al., J. Neurosci 27, (2007) 4443-4451; Kremayer et al., Neuron 66 (2010) 671-680; Wei et al., Pain 152 (2011) 582-591); Wei et al., Neurosci Lett 479 (2010) 253-256)), providing additional rationale for the effectiveness of small molecule TRPA1 inhibitors in the treatment of pain disorders

以下結構I(a)之TRP通道拮抗劑化合物(2S ,4R ,5S )-4-氟-1-((4-氟苯基)磺醯基)-5-甲基-N -((5-(三氟甲基)-2-(2-(三氟甲基)嘧啶-5-基)吡啶-4-基)甲基)吡咯啶-2-甲醯胺:

Figure 02_image007
自國際公開案第WO 2016/128529號已知,其以全文引用的方式併入本文中。可使用(2S ,4R ,5S )-4-氟-1-((4-氟苯基)磺醯基)-5-甲基-N -((5-(三氟甲基)-2-(2-(三氟甲基)嘧啶-5-基)吡啶-4-基)甲基)吡咯啶-2-甲醯胺之替代名稱,但以所示化學結構為準。WO 2016/128529公開案揭示適用於製備化合物I(a)之方法。方法示於圖4中。然而,先前技術方法之步驟4所產生之中間物以鹽酸鹽型式分離,且步驟3及4之組合的產率係約17%。此外,在先前技術方法中化合物I(a)以非晶固體型式分離。此外,先前技術方法需要多個層析純化步驟以獲得所需純度。TRP channel antagonist compound (2 S ,4 R ,5 S )-4-fluoro-1-((4-fluorophenyl)sulfonyl)-5-methyl- N -( (5-(Trifluoromethyl)-2-(2-(trifluoromethyl)pyrimidin-5-yl)pyridin-4-yl)methyl)pyrrolidin-2-carboxamide:
Figure 02_image007
It is known from International Publication No. WO 2016/128529, which is incorporated herein by reference in its entirety. (2 S ,4 R ,5 S )-4-fluoro-1-((4-fluorophenyl)sulfonyl)-5-methyl- N -((5-(trifluoromethyl)- Alternative name for 2-(2-(trifluoromethyl)pyrimidin-5-yl)pyridin-4-yl)methyl)pyrrolidin-2-carboxamide, but subject to the chemical structure shown. The WO 2016/128529 publication discloses a method suitable for preparing compound I(a). The method is shown in Figure 4. However, the intermediate produced in step 4 of the prior art method is separated in the form of hydrochloride, and the yield of the combination of steps 3 and 4 is about 17%. In addition, in the prior art method, the compound I(a) is isolated as an amorphous solid. In addition, prior art methods require multiple chromatographic purification steps to obtain the required purity.

因此需要存在製備結構(I)之TRP拮抗劑化合物,諸如(2S ,4R ,5S )-4-氟-1-((4-氟苯基)磺醯基)-5-甲基-N -((5-(三氟甲基)-2-(2-(三氟甲基)嘧啶-5-基)吡啶-4-基)甲基)吡咯啶-2-甲醯胺及其中間化合物的改良方法。Therefore, there is a need to prepare TRP antagonist compounds of structure (I), such as (2 S ,4 R ,5 S )-4-fluoro-1-((4-fluorophenyl)sulfonyl)-5-methyl- N -((5-(trifluoromethyl)-2-(2-(trifluoromethyl)pyrimidin-5-yl)pyridin-4-yl)methyl)pyrrolidin-2-carboxamide and its intermediate Compound improvement methods.

另外存在對可提供諸如穩定性、溶解度、溶解速率、硬度、可壓縮性及熔點中之一或多者的改良之特性的化合物(I)之結晶型式之需要。In addition, there is a need for a crystalline form of compound (I) that can provide improved characteristics such as one or more of stability, solubility, dissolution rate, hardness, compressibility, and melting point.

在一些實施例中,提供用於製備化合物3之方法。該方法包含根據以下步驟1使化合物1與磺化劑在溶劑中反應以形成化合物2,其中Y係芳基磺醯基或烷基磺醯基:

Figure 02_image009
。In some embodiments, methods for preparing compound 3 are provided. The method includes reacting compound 1 with a sulfonating agent in a solvent to form compound 2 according to the following step 1, wherein Y is arylsulfonyl or alkylsulfonyl:
Figure 02_image009
.

該方法進一步包含根據以下步驟2使化合物2與氮源在溶劑中反應以形成化合物3:

Figure 02_image011
。The method further includes reacting compound 2 with a nitrogen source in a solvent according to the following step 2 to form compound 3:
Figure 02_image011
.

化合物3係游離鹼。以化合物1計,化合物3之產率係至少30%。R1 選自鹵基、鹵基-C1-4 烷基-、鹵基-C1-4 烷氧基-及-CN。R2 選自H及環丙基-。Compound 3 is the free base. Based on compound 1, the yield of compound 3 is at least 30%. R 1 is selected from halo, halo-C 1-4 alkyl-, halo-C 1-4 alkoxy- and -CN. R 2 is selected from H and cyclopropyl-.

基團Y可藉由化合物1與諸如磺酸酯、芳基磺醯鹵或低碳烷基磺醯鹵之磺化劑之反應引入。例示性磺化劑包含甲苯磺醯(甲苯磺醯基)氯及甲磺醯(甲磺醯基)氯。氮源可為氨或銨鹽,其與化合物2反應以置換Y-O-基團且得到胺化合物3。The group Y can be introduced by the reaction of Compound 1 with a sulfonating agent such as sulfonate, arylsulfonyl halide or lower alkylsulfonyl halide. Exemplary sulfonating agents include tosyl (tosyl) chloride and mesyl (tosyl) chloride. The nitrogen source may be ammonia or an ammonium salt, which reacts with compound 2 to displace the Y-O- group and obtain amine compound 3.

在一些其他實施例中,提供製備結晶化合物I或其溶劑合物或共晶體之方法。該方法包含如下在反應步驟中使化合物6 (呈酸式鹽型式)、化合物7及鹼在溶劑系統中反應以形成化合物(I)

Figure 02_image013
。In some other embodiments, a method of preparing crystalline Compound I or a solvate or co-crystal thereof is provided. The method comprises reacting compound 6 (in acid salt form), compound 7 and base in a solvent system to form compound (I) as follows
Figure 02_image013
.

R1 選自鹵基、鹵基-C1-4 烷基-、鹵基-C1-4 烷氧基-及-CN。R2 選自H及-環丙基。R3 係C1-4 烷基-,且R4 選自H及-F,或R3 及R4 連同其所連接之環原子一起形成三員碳環。R5 係鹵基。X1 及X2 各係C,或X1 及X2 中之一者係N,且另一者係C。n係1或2。各星號表示對掌性中心。R 1 is selected from halo, halo-C 1-4 alkyl-, halo-C 1-4 alkoxy- and -CN. R 2 is selected from H and -cyclopropyl. R 3 is C 1-4 alkyl-, and R 4 is selected from H and -F, or R 3 and R 4 together with the ring atoms to which they are attached form a three-membered carbocyclic ring. R 5 is a halogen group. X 1 and X 2 are each C, or one of X 1 and X 2 is N, and the other is C. n系1 or 2. The asterisks indicate the palm center.

該方法進一步包含由化合物(I)藉由溶劑交換,從反應步驟之溶劑系統移至選自以下之有機溶劑,而形成化合物(I)之溶液:(a)介電常數大於2之非極性溶劑;(b)極性非質子溶劑;或(c)極性質子溶劑。The method further includes moving the solvent system of the reaction step from the solvent system of the reaction step to an organic solvent selected from the following by the compound (I) by solvent exchange to form a solution of the compound (I): (a) a nonpolar solvent having a dielectric constant greater than 2 ; (B) polar aprotic solvents; or (c) polar protic solvents.

該方法進一步包含使化合物(I)之溶液與反溶劑接觸以形成結晶化合物(I)之漿料。The method further includes contacting the solution of compound (I) with an anti-solvent to form a slurry of crystalline compound (I).

在一些其他實施例中,提供一種結晶(2S ,4R ,5S )-4-氟-1-(4-氟苯磺醯基)-5-甲基-N -((5-(三氟甲基)-2-(2-(三氟甲基)嘧啶-5-基)吡啶-4-基)甲基)吡咯啶-2-甲醯胺化合物。In some other embodiments, a crystalline (2 S ,4 R ,5 S )-4-fluoro-1-(4-fluorobenzenesulfonyl)-5-methyl- N -((5-(三Fluoromethyl)-2-(2-(trifluoromethyl)pyrimidin-5-yl)pyridin-4-yl)methyl)pyrrolidin-2-carboxamide compound.

在一些其他實施例中,提供一種包含本發明化合物及至少一種醫藥學上可接受之賦形劑、稀釋劑及/或載劑之醫藥組合物。In some other embodiments, there is provided a pharmaceutical composition comprising a compound of the present invention and at least one pharmaceutically acceptable excipient, diluent, and/or carrier.

在一些其他實施例中,提供一種呈游離鹼無水物結晶E型之化合物(2S ,4R ,5S )-4-氟-1-(4-氟苯磺醯基)-5-甲基-N -((5-(三氟甲基)-2-(2-(三氟甲基)嘧啶-5-基)吡啶-4-基)甲基)吡咯啶-2-甲醯胺,其特徵為X射線粉末繞射峰含有三個、四個或五個選自以下之峰:7.5°±0.2°、8.2°±0.2°、12.6°±0.2°、13.1°±0.2°、13.4°±0.2°、14.7°±0.2°、15.1°±0.2°、15.5°±0.2°、16.1°±0.2°、16.6°±0.2°、18.2°±0.2°、18.9°±0.2°、19.9°±0.2°、20.4°±0.2°、21.0°±0.2°、21.5°±0.2°、21.8°±0.2°、22.4°±0.2°、22.7°±0.2°、24.3°±0.2°、25.0°±0.2°、25.4°±0.2°及28.4°±0.2°。In some other embodiments, a compound E (2 S ,4 R ,5 S )-4-fluoro-1-(4-fluorobenzenesulfonyl)-5-methyl is provided as a free base anhydrous crystal -N -((5-(trifluoromethyl)-2-(2-(trifluoromethyl)pyrimidin-5-yl)pyridin-4-yl)methyl)pyrrolidin-2-carboxamide, which The characteristic is that the X-ray powder diffraction peak contains three, four or five peaks selected from the following: 7.5°±0.2°, 8.2°±0.2°, 12.6°±0.2°, 13.1°±0.2°, 13.4°± 0.2°, 14.7°±0.2°, 15.1°±0.2°, 15.5°±0.2°, 16.1°±0.2°, 16.6°±0.2°, 18.2°±0.2°, 18.9°±0.2°, 19.9°±0.2° , 20.4°±0.2°, 21.0°±0.2°, 21.5°±0.2°, 21.8°±0.2°, 22.4°±0.2°, 22.7°±0.2°, 24.3°±0.2°, 25.0°±0.2°, 25.4 °±0.2° and 28.4°±0.2°.

在一些其他實施例中,提供一種包含呈游離鹼無水物結晶E型之(2S ,4R ,5S )-4-氟-1-(4-氟苯磺醯基)-5-甲基-N -((5-(三氟甲基)-2-(2-(三氟甲基)嘧啶-5-基)吡啶-4-基)甲基)吡咯啶-2-甲醯胺及至少一種醫藥學上可接受之賦形劑、稀釋劑及/或載劑之醫藥組合物。In some other embodiments, there is provided (2 S ,4 R ,5 S )-4-fluoro-1-(4-fluorobenzenesulfonyl)-5-methyl which is a free base anhydrous crystalline form E -N -((5-(trifluoromethyl)-2-(2-(trifluoromethyl)pyrimidin-5-yl)pyridin-4-yl)methyl)pyrrolidine-2-carboxamide and at least A pharmaceutical composition of pharmaceutically acceptable excipients, diluents and/or carriers.

在一些其他實施例中,提供一種製備呈游離鹼無水物結晶E型之(2S ,4R ,5S )-4-氟-1-(4-氟苯磺醯基)-5-甲基-N -((5-(三氟甲基)-2-(2-(三氟甲基)嘧啶-5-基)吡啶-4-基)甲基)吡咯啶-2-甲醯胺之方法。In some other embodiments, a method for preparing (2 S ,4 R ,5 S )-4-fluoro-1-(4-fluorobenzenesulfonyl)-5-methyl which is a free base anhydrous crystalline form E is provided -Method of N -((5-(trifluoromethyl)-2-(2-(trifluoromethyl)pyrimidin-5-yl)pyridin-4-yl)methyl)pyrrolidin-2-carboxamide .

該方法包含使(2S ,4R ,5S )-4-氟-1-(4-氟苯磺醯基)-5-甲基-N -((5-(三氟甲基)-2-(2-(三氟甲基)嘧啶-5-基)吡啶-4-基)甲基)吡咯啶-2-甲醯胺游離鹼起始物質與二氯甲烷混合以形成具有至少50 mg/mL之(2S ,4R ,5S )-4-氟-1-(4-氟苯磺醯基)-5-甲基-N -((5-(三氟甲基)-2-(2-(三氟甲基)嘧啶-5-基)吡啶-4-基)甲基)吡咯啶-2-甲醯胺濃度之溶液。The method includes making (2 S ,4 R ,5 S )-4-fluoro-1-(4-fluorobenzenesulfonyl)-5-methyl- N -((5-(trifluoromethyl)-2 -(2-(trifluoromethyl)pyrimidin-5-yl)pyridin-4-yl)methyl)pyrrolidin-2-carboxamide free base starting material is mixed with dichloromethane to form a solution with at least 50 mg/ (2 S ,4 R ,5 S )-4-fluoro-1-(4-fluorobenzenesulfonyl)-5-methyl- N -((5-(trifluoromethyl)-2-( 2-(Trifluoromethyl)pyrimidin-5-yl)pyridin-4-yl)methyl)pyrrolidine-2-carboxamide concentration solution.

該方法進一步包含使該(2S ,4R ,5S )-4-氟-1-(4-氟苯磺醯基)-5-甲基-N -((5-(三氟甲基)-2-(2-(三氟甲基)嘧啶-5-基)吡啶-4-基)甲基)吡咯啶-2-甲醯胺之溶液與具有小於2之介電常數之非極性反溶劑組合達至二氯甲烷與反溶劑之總體積比率係約1:1.5至約1:10,以形成包含游離鹼無水物結晶E型(2S ,4R ,5S )-4-氟-1-(4-氟苯磺醯基)-5-甲基-N -((5-(三氟甲基)-2-(2-(三氟甲基)嘧啶-5-基)吡啶-4-基)甲基)吡咯啶-2-甲醯胺之漿料。The method further includes making the (2 S ,4 R ,5 S )-4-fluoro-1-(4-fluorobenzenesulfonyl)-5-methyl- N -((5-(trifluoromethyl) A solution of -2-(2-(trifluoromethyl)pyrimidin-5-yl)pyridin-4-yl)methyl)pyrrolidin-2-carboxamide and a non-polar antisolvent with a dielectric constant of less than 2 The combined volume ratio of dichloromethane to anti-solvent is about 1:1.5 to about 1:10 to form crystalline E-type (2 S ,4 R ,5 S )-4-fluoro-1 containing free base anhydrous -(4-fluorobenzenesulfonyl)-5-methyl- N -((5-(trifluoromethyl)-2-(2-(trifluoromethyl)pyrimidin-5-yl)pyridine-4- Base) methyl) pyrrolidine-2-carboxamide slurry.

該方法進一步包含自漿料分離游離鹼無水物結晶E型(2S ,4R ,5S )-4-氟-1-(4-氟苯磺醯基)-5-甲基-N -((5-(三氟甲基)-2-(2-(三氟甲基)嘧啶-5-基)吡啶-4-基)甲基)吡咯啶-2-甲醯胺。The method further includes separating free base anhydrous crystalline E-type (2 S , 4 R , 5 S )-4-fluoro-1-(4-fluorobenzenesulfonyl)-5-methyl- N- ( (5-(Trifluoromethyl)-2-(2-(trifluoromethyl)pyrimidin-5-yl)pyridin-4-yl)methyl)pyrrolidin-2-carboxamide.

相關申請案之交叉參考Cross-reference of related applications

本申請案主張2018年2月20日申請之美國臨時申請案第62/632,653號之優選權,其揭示內容以引用的方式併入本文中。This application claims the priority of US Provisional Application No. 62/632,653 filed on February 20, 2018, the disclosure content of which is incorporated herein by reference.

現將詳細參考本發明之某些實施例,其實例在隨附結構及式中加以說明。雖然本發明將結合所列舉之實施例描述,但應瞭解其不欲將本發明限於彼等實施例。相反,本發明意欲涵蓋所有替代方案、修改及等效物,其可包括在申請專利範圍所界定之本發明範疇內。熟習此項技術者應能識別類似或等效於本文所述之多種方法及材料,其可用於本發明之實踐中。本發明決不限於所述方法及材料。在所併入之文獻、專利及類似材料中之一或多者不同於本申請案(包括(但不限於)所定義之術語、術語用法、所述技術或其類似物)或與其矛盾之情況下,以本申請案為準。除非另外定義,否則本文所用之所有技術及科學術語均具有與本發明所屬領域的一般技術者通常所理解之含義相同的含義。儘管類似或等效於本文所述之彼等方法及材料可用於實踐或測試本發明,但適合的方法及材料描述如下。所有公開案、專利申請案、專利及所提及之其他參考案均以全文引用的方式併入本文中。Reference will now be made in detail to certain embodiments of the invention, examples of which are illustrated in the accompanying structures and formulas. Although the invention will be described in conjunction with the listed embodiments, it should be understood that it is not intended to limit the invention to those embodiments. On the contrary, the present invention is intended to cover all alternatives, modifications, and equivalents, which may be included within the scope of the present invention as defined by the scope of the patent application. Those skilled in the art should be able to identify various methods and materials similar or equivalent to those described herein, which can be used in the practice of the present invention. The present invention is by no means limited to the methods and materials. One or more of the incorporated documents, patents, and similar materials differ from or contradict this application (including but not limited to the defined terms, term usage, the described technology, or the like) Below, the application shall prevail. Unless otherwise defined, all technical and scientific terms used herein have the same meaning as commonly understood by those of ordinary skill in the art to which this invention belongs. Although methods and materials similar or equivalent to those described herein can be used in the practice or testing of the present invention, suitable methods and materials are described below. All publications, patent applications, patents and other references mentioned are incorporated by reference in their entirety.

本發明提供製備化合物(I)之改良方法:

Figure 02_image015
化合物(I) 。The present invention provides an improved method for preparing compound (I):
Figure 02_image015
Compound (I).

本發明進一步提供化合物(I)之結晶型式。本發明又進一步提供化合物(I)之多種結晶聚合型式。本發明又進一步提供製備化合物(I)之改良方法及製備化合物(I)之多種結晶聚合型式之方法。The present invention further provides the crystalline form of compound (I). The present invention further provides various crystalline polymerization forms of compound (I). The present invention further provides an improved method for preparing compound (I) and a method for preparing various crystal polymerization types of compound (I).

定義definition

當指示取代基數目時,術語「至少一個」及「一或多個」係指一個取代基至最高可能數目之取代之範圍,亦即藉由取代基置換一個氫至置換所有氫。術語「取代基」指示置換母體分子上之氫原子的原子或一組原子。術語「經取代之」指示帶有一或多個取代基之指定基團。在任何基團可帶有多個取代基且提供多種可能的取代基之情況下,取代基經獨立地選擇且無需相同。術語「未經取代」意謂指定基團不帶有取代基。術語「視情況經取代」意謂指定基團未經取代或經一或多個獨立地選自可能的取代基之群的取代基取代。當指示取代基數目時,術語「至少一個」及「一或多個」意謂一個取代基至最高可能數目之取代,亦即藉由取代基置換一個氫至置換所有氫。When indicating the number of substituents, the terms "at least one" and "one or more" refer to the range of one substituent to the highest possible number of substitutions, that is, replacement of one hydrogen to replacement of all hydrogens by the substituent. The term "substituent" indicates an atom or group of atoms that replaces a hydrogen atom on the parent molecule. The term "substituted" indicates a designated group with one or more substituents. Where any group may carry multiple substituents and provide multiple possible substituents, the substituents are independently selected and need not be the same. The term "unsubstituted" means that the specified group has no substituents. The term "optionally substituted" means that the specified group is unsubstituted or substituted with one or more substituents independently selected from the group of possible substituents. When indicating the number of substituents, the terms "at least one" and "one or more" mean one substituent to the highest possible number of substitutions, that is, replacement of one hydrogen to replacement of all hydrogens by the substituents.

如本文所用,「烷基」係指單獨由碳及氫原子組成且具有一至十二個碳原子之單價直鏈或支鏈飽和烴部分。「低碳烷基」係指具有一至六個碳原子、或一至四個碳原子之烷基,諸如C1-4 烷基。烷基之實例包括(但不限於)甲基、乙基、丙基、異丙基、異丁基、第二丁基、第三丁基、戊基、正己基、辛基、十二烷基及其類似基團。烷基可視情況經一或多個取代基取代。As used herein, "alkyl" refers to a monovalent straight or branched chain saturated hydrocarbon moiety consisting solely of carbon and hydrogen atoms and having one to twelve carbon atoms. "Lower alkyl" refers to an alkyl group having one to six carbon atoms, or one to four carbon atoms, such as a C 1-4 alkyl group. Examples of alkyl groups include, but are not limited to, methyl, ethyl, propyl, isopropyl, isobutyl, second butyl, third butyl, pentyl, n-hexyl, octyl, dodecyl And similar groups. The alkyl group is optionally substituted with one or more substituents.

如本文所用,術語「鹵基」及「鹵素」係指氯、氟、溴及碘。As used herein, the terms "halo" and "halogen" refer to chlorine, fluorine, bromine, and iodine.

如本文所用,術語「鹵烷基」係指如本文所定義之烷基,其中一或多個氫原子經相同或不同的鹵素置換。例示性鹵烷基包括鹵基-C1-4 烷基,例如-CH2 Cl、-CH2 CF3 、-CH2 CCl3 、-CF3 及-CHF2As used herein, the term "haloalkyl" refers to an alkyl group as defined herein, wherein one or more hydrogen atoms are replaced by the same or different halogen. Exemplary haloalkyl groups include halo-C 1-4 alkyl groups, such as -CH 2 Cl, -CH 2 CF 3 , -CH 2 CCl 3 , -CF 3 and -CHF 2 .

如本文所用,術語「烷氧基」係指結構-OR之部分,其中R係如本文所定義之烷基部分。烷氧基部分之實例包括(但不限於)甲氧基、乙氧基及異丙氧基。As used herein, the term "alkoxy" refers to the moiety of the structure -OR, where R is an alkyl moiety as defined herein. Examples of alkoxy moieties include, but are not limited to, methoxy, ethoxy, and isopropoxy.

如本文所用,術語「鹵烷氧基」係指如本文所定義之烷氧基,其中一或多個氫原子經相同或不同的鹵素置換。例示性鹵烷氧基包含鹵基-C1-4 烷氧基,例如-OCH2 Cl、-OCH2 CF3 、-OCH2 CCl3 、-OCF3 及-OCHF2As used herein, the term "haloalkoxy" refers to an alkoxy group as defined herein, wherein one or more hydrogen atoms are replaced by the same or different halogen. Exemplary haloalkoxy groups include halo-C 1-4 alkoxy groups, such as -OCH 2 Cl, -OCH 2 CF 3 , -OCH 2 CCl 3 , -OCF 3 and -OCHF 2 .

如本文所用,術語「環烷基」及「碳環」係指包含3至12個碳原子且由單環或雙環組成之單價飽和碳環部分。環烷基部分之實例包括(但不限於)環丙基、環丁基、環戊基、環己基、環庚基及其類似基團,包括其部分不飽和(環烯基)衍生物。As used herein, the terms "cycloalkyl" and "carbocycle" refer to a monovalent saturated carbocyclic moiety containing 3 to 12 carbon atoms and consisting of a monocyclic or bicyclic ring. Examples of cycloalkyl moieties include, but are not limited to, cyclopropyl, cyclobutyl, cyclopentyl, cyclohexyl, cycloheptyl, and the like, including their partially unsaturated (cycloalkenyl) derivatives.

如本文所用,「離去基」係指在化學反應中置換為穩定物種之原子或原子之基團。適合的離去基在此項技術中已熟知,例如參見March's Advanced Organic Chemistry, 增刊第5版, 編者:Smith, M. B及March, J., John Wiley & Sons, New York: 2001及T. W. Greene,Protective Groups in Organic Synthesis , John Wiley & Sons, New York, 1991,其各者全部內容以引用的方式併入本文中。此類離去基包括(但不限於)鹵素、烷氧基、磺醯基氧基、視情況經取代之烷基磺醯基、視情況經取代之烯基磺醯基、視情況經取代之芳基磺醯基及重氮部分。一些離去基之實例包含氯、碘、溴、氟、甲烷磺醯基(甲磺醯基)、甲苯磺醯基、三氟甲磺酸酯、硝基-苯磺醯基(硝基苯磺醯基)及溴-苯磺醯基(溴苯磺醯基)。As used herein, "leaving group" refers to an atom or a group of atoms that is replaced with a stable species in a chemical reaction. Suitable leaving groups are well known in the art, see for example March's Advanced Organic Chemistry, Supplement 5th Edition, Editors: Smith, M. B and March, J., John Wiley & Sons, New York: 2001 and TW Greene , Protective Groups in Organic Synthesis , John Wiley & Sons, New York, 1991, the entire contents of each of which are incorporated herein by reference. Such leaving groups include (but are not limited to) halogen, alkoxy, sulfonyloxy, optionally substituted alkylsulfonyl, optionally substituted alkenylsulfonyl, optionally substituted Arylsulfonyl and diazo moieties. Some examples of leaving groups include chlorine, iodine, bromine, fluorine, methanesulfonyl (methanesulfonyl), tosylate, triflate, nitro-benzenesulfonyl (nitrobenzenesulfonate) (Acyl) and bromo-benzenesulfonyl (bromobenzenesulfonyl).

如本文所用,「保護基」係指用於保護中間物之遠端官能基(例如一級或二級胺)之基團。此類保護之需要將視遠端官能基之性質及製備方法之條件而變化。適合的胺基保護基包括乙醯基、三氟乙醯基、第三丁氧基羰基(BOC)、苯甲氧基羰基(Cbz)及9-茀基亞甲氧基羰基(Fmoc)。對於保護基及其用途之通用描述,參見March及Green。As used herein, "protecting group" refers to a group used to protect a remote functional group (eg, primary or secondary amine) of an intermediate. The need for such protection will vary depending on the nature of the remote functional group and the conditions of the preparation method. Suitable amine protecting groups include acetyl, trifluoroacetyl, third butoxycarbonyl (BOC), benzyloxycarbonyl (Cbz), and 9- stilboxymethyleneoxycarbonyl (Fmoc). For a general description of protecting groups and their uses, see March and Green.

如本文所用,「脫除保護基劑」係指將裂解如本文所定義之保護基之化合物。As used herein, "deprotection agent" refers to a compound that will cleave a protection group as defined herein.

如本文所用,「偶合劑」係指促進自胺及羧酸形成醯胺之試劑。偶合劑之實例包括(但不限於)丙烷膦酸酐(T3P®);1-[雙(二甲胺基)亞甲基]-1H-1,2,3-三唑并[4,5-b]吡錠3-氧化六氟磷酸鹽(HATU);2-(1H-苯并三唑-1-基)-1,1,3,3-四甲基

Figure 108105242-A0101-12-0011
六氟磷酸鹽(HBTU);N,N'-二環己基碳化二亞胺(DCC);苯并三唑-1-基氧基)參(二甲胺基)鏻六氟磷酸鹽(BOP);苯并三唑-1-基-氧基三吡咯啶基鏻六氟磷酸鹽(PyBOP);1,1'-羰基二咪唑(CDI);1-乙基-3-(3-二甲胺基丙基)碳化二亞胺(EDC)及羥基苯并三唑(HOBt);及EDC及4-二甲胺基吡啶(DMAP)。As used herein, "coupling agent" refers to an agent that promotes the formation of amides from amines and carboxylic acids. Examples of coupling agents include, but are not limited to, propanephosphonic anhydride (T3P®); 1-[bis(dimethylamino)methylene]-1H-1,2,3-triazolo[4,5-b Pyridinium 3-oxide hexafluorophosphate (HATU); 2-(1H-benzotriazol-1-yl)-1,1,3,3-tetramethyl
Figure 108105242-A0101-12-0011
Hexafluorophosphate (HBTU); N,N'-dicyclohexylcarbodiimide (DCC); benzotriazol-1-yloxy) ginseng (dimethylamino) phosphonium hexafluorophosphate (BOP) ; Benzotriazol-1-yl-oxytripyrrolidinylphosphonium hexafluorophosphate (PyBOP); 1,1'-carbonyldiimidazole (CDI); 1-ethyl-3-(3-dimethylamine Propyl) carbodiimide (EDC) and hydroxybenzotriazole (HOBt); and EDC and 4-dimethylaminopyridine (DMAP).

如本文所用,術語「游離鹼」係指與其任何鹽不同的母體化合物(I)。As used herein, the term "free base" refers to the parent compound (I) different from any of its salts.

如本文所用,術語「有機鹼」係指含有一或多個氮原子且充當鹼之有機化合物。有機鹼之實例包括(但不限於)三級胺鹼。有機鹼之實例包括(但不限於) N-甲基-嗎啉(NMM)、二異丙基乙胺(DIPEA)及三乙胺(TEA)。As used herein, the term "organic base" refers to an organic compound that contains one or more nitrogen atoms and acts as a base. Examples of organic bases include (but are not limited to) tertiary amine bases. Examples of organic bases include, but are not limited to, N-methyl-morpholine (NMM), diisopropylethylamine (DIPEA), and triethylamine (TEA).

如本文所用,術語「無機鹼」係指包含無機組分之鹼。無機鹼之實例包括(但不限於)鹼金屬氫氧化物、氫氧化銨、碳酸鉀、碳酸氫鉀、碳酸鈉及碳酸氫鈉。As used herein, the term "inorganic base" refers to a base that contains inorganic components. Examples of inorganic bases include, but are not limited to, alkali metal hydroxides, ammonium hydroxide, potassium carbonate, potassium bicarbonate, sodium carbonate, and sodium bicarbonate.

如本文所用,術語「有機酸」係指充當酸之有機化合物。有機酸之實例包含(但不限於)羧酸。有機酸之實例包括(但不限於)甲酸、草酸、丙二酸、丁二酸、戊二酸、丁二酸、己二酸、酒石酸及檸檬酸。As used herein, the term "organic acid" refers to an organic compound that acts as an acid. Examples of organic acids include, but are not limited to, carboxylic acids. Examples of organic acids include, but are not limited to, formic acid, oxalic acid, malonic acid, succinic acid, glutaric acid, succinic acid, adipic acid, tartaric acid, and citric acid.

如本文所用,術語「無機酸」係指包含無機組分之酸。無機酸之實例包含無機酸,包括(但不限於)鹽酸、氫溴酸、氫碘酸、硫酸、硝酸、磷酸及硼酸。As used herein, the term "inorganic acid" refers to an acid containing inorganic components. Examples of inorganic acids include inorganic acids, including but not limited to hydrochloric acid, hydrobromic acid, hydroiodic acid, sulfuric acid, nitric acid, phosphoric acid, and boric acid.

如本文所用,術語「極性非質子溶劑」係指不具有質子供給能力之任何極性溶劑。實例不加任何限制地包含2-甲基四氫呋喃、四氫呋喃、乙酸乙酯、乙酸丙酯(例如乙酸異丙酯)、丙酮、二甲亞碸、N,N-二甲基甲醯胺、乙腈、N,N-二甲基乙醯胺、N-甲基吡咯啶酮、六甲基磷醯胺及碳酸丙二酯。As used herein, the term "polar aprotic solvent" refers to any polar solvent that does not have proton donating ability. Examples without any limitation include 2-methyltetrahydrofuran, tetrahydrofuran, ethyl acetate, propyl acetate (e.g. isopropyl acetate), acetone, dimethylsulfoxide, N,N-dimethylformamide, acetonitrile, N,N-dimethylacetamide, N-methylpyrrolidone, hexamethylphosphoramide and propylene carbonate.

如本文所用,術語「極性質子溶劑」係指具有質子供給能力之任何極性溶劑。實例包括(但不限於)水、甲醇、乙醇、1-丙醇、2-丙醇、1-丁醇、甲酸、硝基甲烷及乙酸。有機極性質子溶劑不包括任何有效量之水。As used herein, the term "polar protic solvent" refers to any polar solvent with proton donating ability. Examples include, but are not limited to, water, methanol, ethanol, 1-propanol, 2-propanol, 1-butanol, formic acid, nitromethane, and acetic acid. Organic polar protic solvents do not include any effective amount of water.

如本文所用,術語「極性有機溶劑」係指極性非質子溶劑與極性質子溶劑,不包括水。As used herein, the term "polar organic solvent" refers to polar aprotic and polar protic solvents, excluding water.

如本文所用,術語「非極性溶劑」係指在諸如碳及氫之具有類似電負性之原子之間含有鍵以使得分子上之電荷均勻分佈的溶劑。非極性溶劑之特徵為具有低介電常數。實例包括(但不限於)戊烷(例如正戊烷)、己烷(例如正己烷)、庚烷(例如正庚烷)、環戊烷、甲基第三丁基醚、二乙醚、甲苯、苯、1,4-二噁烷、四氯化碳、三氯甲烷及二氯甲烷(DCM)。在一些態樣中,非極性溶劑具有小於2之介電常數,其實例包括(但不限於)正戊烷、正己烷及正庚烷。與其他非極性溶劑相比,DCM展現鍵水準(亦即在碳與氯之間)之一定程度極性,但由於基於對稱性之極性抵消僅展現分子水準之小程度極性。As used herein, the term "nonpolar solvent" refers to a solvent that contains bonds between atoms with similar electronegativity, such as carbon and hydrogen, so that the charge on the molecules is evenly distributed. Non-polar solvents are characterized by a low dielectric constant. Examples include (but are not limited to) pentane (e.g. n-pentane), hexane (e.g. n-hexane), heptane (e.g. n-heptane), cyclopentane, methyl tertiary butyl ether, diethyl ether, toluene, Benzene, 1,4-dioxane, carbon tetrachloride, chloroform and dichloromethane (DCM). In some aspects, the non-polar solvent has a dielectric constant of less than 2, and examples thereof include, but are not limited to, n-pentane, n-hexane, and n-heptane. Compared with other non-polar solvents, DCM exhibits a certain degree of polarity at the bond level (that is, between carbon and chlorine), but due to the symmetry-based polarity cancellation only exhibits a small degree of polarity at the molecular level.

如本文所用,術語「溶劑」係指極性非質子溶劑、極性質子溶劑及非極性溶劑。As used herein, the term "solvent" refers to polar aprotic solvents, polar protic solvents, and nonpolar solvents.

如本文所用,術語「反溶劑」係指所提及化合物可溶性差且誘導該化合物自溶液沈澱或結晶之溶劑。As used herein, the term "anti-solvent" refers to a solvent that has poor solubility of the mentioned compound and induces precipitation or crystallization of the compound from solution.

如本文所用,「銨鹽」係指具有銨陽離子之鹽。實例包括(但不限於)碳酸銨、氯化銨及硝酸銨。As used herein, "ammonium salt" refers to a salt having an ammonium cation. Examples include, but are not limited to, ammonium carbonate, ammonium chloride, and ammonium nitrate.

如本文所用,「多晶型物」或「多形現象」係指物質以多於一種晶體型式存在之能力,其中特定物質之不同晶體型式稱為「多晶型物」。一般而言,咸信多形現象可受物質分子改變其構形或形成不同分子間或分子內相互作用,尤其氫鍵之能力影響,其反映在不同多晶型物之晶體晶格中之不同原子佈置中。物質之不同多晶型物可具有不同晶格能量,且因此,在固態下其可展示不同物理特性,諸如型式、密度、熔點、顏色、穩定性、溶解度、溶解速率等,其又可影響諸如且不限於以下之特性:既定多晶型物之穩定性、溶解速率及/或生物可用性及其用作藥物及用於醫藥組合物中之適用性。As used herein, "polymorph" or "polymorphism" refers to the ability of a substance to exist in more than one crystal form, where different crystal forms of a particular substance are called "polymorphs." In general, Xianxin polymorphism can be affected by the ability of material molecules to change their configuration or form different intermolecular or intramolecular interactions, especially hydrogen bonding, which is reflected in the different crystal lattices of different polymorphs Atomic arrangement. Different polymorphs of matter can have different lattice energies, and therefore, in the solid state they can exhibit different physical properties, such as type, density, melting point, color, stability, solubility, dissolution rate, etc., which in turn can affect factors such as It is not limited to the following characteristics: stability, dissolution rate and/or bioavailability of a given polymorph and its suitability for use as a medicament and in a pharmaceutical composition.

如本文所用,「形態」係指晶體之外部形狀及存在之平面,不參考內部結構。晶體可根據諸如生長率、攪拌及雜質之存在之不同條件展示不同形態。As used herein, "morphology" refers to the external shape and existing plane of a crystal, without reference to the internal structure. Crystals can exhibit different morphologies according to different conditions such as growth rate, agitation, and the presence of impurities.

如本文所用,「溶劑合物」係指藉由非共價鍵與另一分子(諸如極性溶劑)結合之任何型式之化合物(I)。此類溶劑合物通常係具有實質上固定之溶質與溶劑莫耳比之結晶固體。代表性溶劑包含正庚烷、N,N-二甲基乙醯胺、苯甲醚、乙醇、甲苯、2-丙醇、1-丁醇、2-甲基四氫呋喃、四氫呋喃、異丁醇及二甲亞碸。As used herein, "solvate" refers to any type of compound (I) bonded to another molecule (such as a polar solvent) by a non-covalent bond. Such solvates are usually crystalline solids with a substantially fixed solute to solvent molar ratio. Representative solvents include n-heptane, N,N-dimethylacetamide, anisole, ethanol, toluene, 2-propanol, 1-butanol, 2-methyltetrahydrofuran, tetrahydrofuran, isobutanol and di Jia Yajie.

如本文所用,術語「晶種」可作為名詞用於描述結晶化合物(I)之一或多種晶體(例如化合物I(a)多晶型物E型)。術語「接種」亦可作為動詞用以描述將結晶化合物(I)之該一或多種晶體引入至環境(包括(但不限於)例如溶液、混合物、懸浮液或分散液)中由此使得形成更多結晶化合物(I)之晶體之動作。As used herein, the term "seed" can be used as a noun to describe one or more crystals of a crystalline compound (I) (eg, compound I (a) polymorph E form). The term "inoculation" can also be used as a verb to describe the introduction of the one or more crystals of the crystalline compound (I) into the environment (including but not limited to, for example, solutions, mixtures, suspensions or dispersions) thereby making the formation of more The action of crystals of polycrystalline compound (I).

分子式相同,但其原子之鍵結性質或次序或其原子在空間中之排列不同的化合物稱為「異構體」。原子空間排列不同之異構體稱為「立體異構體」。非對映異構體係在一或多個對掌性中心處具有相反組態之立體異構體,其不係對映異構體。彼此係不可重疊鏡像之具有一或多個不對稱中心之立體異構體稱為「對映異構體」。當化合物具有不對稱中心時,舉例而言,若當化合物具有不對稱中心時,例如若碳原子鍵結至四個不同基團,則一對對映異構體係可能的。對映異構體之特徵可在於其一或多個不對稱中心之絕對組態,且藉由Cahn、Ingold及Prelog之R-及S-定序規則或藉由分子使偏光平面旋轉之方式描述,且指定為右旋或左旋(亦即分別指定為(+)-異構體或(-)-異構體)。對掌性化合物可以個別對映異構體型式或以其混合物型式存在。含有相等比例之對映異構體之混合物稱為「外消旋混合物」。在某些實施例中,化合物富含至少約90重量%之單個非對映異構體或對映異構體。在其他實施例中,化合物富含至少約95重量%、98重量%或99重量%之單個非對映異構體或對映異構體。Compounds with the same molecular formula but different bonding properties or order of their atoms or their arrangement in space are called "isomers". Isomers with different arrangement of atoms in space are called "stereoisomers". A diastereoisomeric system has stereoisomers of opposite configuration at one or more opposite centers, which are not enantiomers. The stereoisomers with one or more asymmetric centers that are not overlapping mirror images of each other are called "enantiomers". When the compound has an asymmetric center, for example, if the compound has an asymmetric center, for example, if a carbon atom is bonded to four different groups, a pair of enantiomeric systems is possible. Enantiomers can be characterized by the absolute configuration of one or more asymmetric centers, and described by the R- and S-sequencing rules of Cahn, Ingold, and Prelog, or by means of molecules rotating the plane of polarization , And designated as right-handed or left-handed (that is, designated as (+)-isomer or (-)-isomer, respectively). Dipalmitic compounds can exist in the form of individual enantiomers or in the form of mixtures thereof. A mixture containing equal proportions of enantiomers is called a "racemic mixture". In certain embodiments, the compound is enriched in at least about 90% by weight of individual diastereomers or enantiomers. In other embodiments, the compound is enriched in at least about 95%, 98%, or 99% by weight of individual diastereomers or enantiomers.

本發明之化合物可含有不對稱或對掌性中心,且因此以不同立體異構型式存在。希望包括(但不限於)非對映異構體、對映異構體及滯轉異構體以及其混合物(諸如外消旋混合物)之本發明化合物之所有立體異構型式形成本發明的部分。在一些情況下,立體化學尚未確定或已臨時指定。許多有機化合物以光學活性型式存在,亦即其能夠使平面偏振光之平面旋轉。在描述光學活性化合物中,使用前綴D及L或R及S表示分子圍繞其對掌性中心之絕對組態。The compounds of the present invention may contain asymmetric or contra palm centers, and therefore exist in different stereoisomeric forms. It is intended that all stereoisomeric forms of the compounds of the invention including, but not limited to, diastereomers, enantiomers and delayed isomers and mixtures thereof (such as racemic mixtures) form part of the invention . In some cases, stereochemistry has not been determined or has been provisionally designated. Many organic compounds exist in optically active forms, that is, they can rotate the plane of plane polarized light. In describing optically active compounds, the prefixes D and L or R and S are used to denote the absolute configuration of the molecule around its palm center.

如本文所用,術語「大約」及「約」係指參考值之90%、95%或99%的值。As used herein, the terms "about" and "about" refer to values of 90%, 95%, or 99% of the reference value.

術語化合物之「治療有效量」意謂有效預防、緩解或改善疾病之症狀或延長所治療個體之存活期的化合物之量。治療有效量之測定在此項技術中之技能內。根據本發明之化合物之治療有效量或劑量可在廣泛界限內變化且可以此項技術中已知之方式測定。The term "therapeutically effective amount" of a compound means the amount of the compound that is effective to prevent, alleviate or ameliorate the symptoms of the disease or prolong the survival of the treated individual. The determination of the therapeutically effective amount is within the skill in this technology. The therapeutically effective amount or dose of the compound according to the invention can vary within wide limits and can be determined in a manner known in the art.

製備化合物Preparation of compounds (I)(I) 之方法Method

根據本發明之一個態樣,TRP拮抗劑化合物(I)可根據圖1中所示之方法製備。According to one aspect of the present invention, the TRP antagonist compound (I) can be prepared according to the method shown in FIG. 1.

在一些態樣中,具有5-(吡啶-2-基)嘧啶核心之化合物3可如下藉由步驟1及2由化合物1製備。In some aspects, compound 3 having a 5-(pyridin-2-yl)pyrimidine core can be prepared from compound 1 through steps 1 and 2 as follows.

在步驟1中,如下使化合物1與作為部分Y來源之磺化劑在溶劑中反應以形成化合物2:

Figure 02_image017
In step 1, compound 1 is reacted with a sulfonating agent as a source of part Y in a solvent to form compound 2 as follows:
Figure 02_image017

R1 選自鹵基、鹵基-C1-4 烷基-、鹵基-C1-4 烷氧基-及-CN。在一些態樣中,R1 選自-F、-CF3 、-CHF2 、-OCF3 、-OCHF2 、-OCH2 CF3 及-CN。在一些其他態樣中,R1 係-CF3R 1 is selected from halo, halo-C 1-4 alkyl-, halo-C 1-4 alkoxy- and -CN. In some aspects, R 1 is selected from —F, —CF 3 , —CHF 2 , —OCF 3 , —OCHF 2 , —OCH 2 CF 3 and —CN. In some other aspects, R 1 is -CF 3 .

R2 選自H及-環丙基。在一些態樣中,R2 係H。R 2 is selected from H and -cyclopropyl. In some aspects, R 2 is H.

基團Y可為例如芳基磺醯基或烷基磺醯基,且可藉由化合物1與諸如甲苯磺醯氯(甲苯磺醯氯)之芳基磺醯鹵試劑或諸如甲磺醯氯(甲烷磺醯氯)之低碳烷基磺醯鹵試劑之反應引入。The group Y may be, for example, arylsulfonyl or alkylsulfonyl, and may be obtained by compound 1 and an arylsulfonyl halide reagent such as tosyl chloride (tosyl chloride) or such as mesylate ( (Methanesulfonyl chloride) is introduced by the reaction of the lower alkyl sulfonyl halide reagent.

在一些實施例中,步驟1溶劑包含或係極性非質子溶劑。在一些此類態樣中,溶劑選自以下中之一或多者:2-甲基四氫呋喃(MeTHF)、四氫呋喃(THF)、乙酸乙酯、乙酸丙酯、丙酮、二甲基甲醯胺(DMF)、乙腈及二甲亞碸(DMSO)。在一些態樣中,極性非質子溶劑選自MeTHF及THF。在一些態樣中,極性非質子溶劑係MeTHF。In some embodiments, the step 1 solvent comprises or is a polar aprotic solvent. In some such aspects, the solvent is selected from one or more of the following: 2-methyltetrahydrofuran (MeTHF), tetrahydrofuran (THF), ethyl acetate, propyl acetate, acetone, dimethylformamide ( DMF), acetonitrile and dimethyl sulfoxide (DMSO). In some aspects, the polar aprotic solvent is selected from MeTHF and THF. In some aspects, the polar aprotic solvent is MeTHF.

一般而言,可將極性非質子溶劑添加諸如夾套反應器之容器中,之後在攪拌下添加化合物1。化合物1之濃度適當地可為約0.05至約2 kg/L,諸如約1 kg/L。接著可在攪拌下添加有機鹼,且反應器內含物冷卻至低於約25℃,諸如約0℃至約10℃之溫度。鹼一般可以化合物1莫耳過量存在。接著可在保持溫度的同時,在攪拌下添加基團Y之芳基磺醯鹵或低碳烷基磺醯鹵來源以形成反應混合物。芳基磺醯鹵或低碳烷基磺醯鹵一般可以化合物1莫耳過量存在,且鹼可為離去基來源莫耳過量的。反應混合物可在攪拌下保持於一定溫度,且反應直至形成包含化合物2之步驟1反應產物混合物,其含有小於5%、小於2%、小於1%或小於0.5%之起始化合物1。分析可藉由如本文其他地方所述之HPLC進行。In general, a polar aprotic solvent can be added to a container such as a jacketed reactor, and then compound 1 is added with stirring. The concentration of Compound 1 may suitably be about 0.05 to about 2 kg/L, such as about 1 kg/L. The organic base can then be added with stirring, and the reactor contents are cooled to a temperature below about 25°C, such as from about 0°C to about 10°C. The base can generally be present in excess of Compound 1 molar. The source of the arylsulfonyl halide or lower alkylsulfonyl halide of the group Y can then be added with stirring while maintaining the temperature to form a reaction mixture. The aryl sulfonyl halide or the lower alkyl sulfonyl halide may generally be present in excess of Compound 1 molar, and the base may be in molar excess of the source of the leaving group. The reaction mixture can be maintained at a certain temperature with stirring, and reacted until a step 1 reaction product mixture comprising compound 2 is formed, which contains less than 5%, less than 2%, less than 1%, or less than 0.5% of starting compound 1. The analysis can be performed by HPLC as described elsewhere herein.

包含化合物2之步驟1反應產物混合物可用酸的水溶液、鹽的水溶液洗滌至少一次或以任何次序用其依序洗滌。在一些此類態樣中,包含化合物2之反應產物混合物可用約2 wt%至約10 wt%,諸如約5 wt%之酸的水溶液(例如檸檬酸)洗滌。在一些態樣中,酸的水溶液與反應產物混合物之體積比可適當地為約0.5:1至約5:1、約0.5:1至約2:1,諸如約1:1。在一些態樣中,包含化合物2之反應產物混合物可用約5 wt%至約40 wt%,諸如約25wt %之鹽的水溶液(例如氯化鈉)洗滌。在一些態樣中,鹽的水溶液與反應產物混合物之體積比可適當地為約0.5:1至約3:1、約0.5:1至約2:1,諸如約0.75:1。The reaction product mixture of Step 1 containing Compound 2 may be washed with an aqueous acid solution or an aqueous salt solution at least once or sequentially in any order. In some such aspects, the reaction product mixture comprising Compound 2 may be washed with an aqueous solution of acid (eg, citric acid) from about 2 wt% to about 10 wt%, such as about 5 wt%. In some aspects, the volume ratio of the aqueous acid solution to the reaction product mixture may suitably be about 0.5:1 to about 5:1, about 0.5:1 to about 2:1, such as about 1:1. In some aspects, the reaction product mixture comprising Compound 2 may be washed with an aqueous solution of salt (eg, sodium chloride) of about 5 wt% to about 40 wt%, such as about 25 wt%. In some aspects, the volume ratio of the aqueous salt solution to the reaction product mixture may suitably be about 0.5:1 to about 3:1, about 0.5:1 to about 2:1, such as about 0.75:1.

在一些態樣中,可實現步驟1反應產物混合物中之極性非質子溶劑至第二溶劑之溶劑交換。在一些態樣中,第二溶劑係極性非質子溶劑。在一些特定態樣中,第二溶劑包含或係乙酸乙酯。在一些態樣中,可將第二溶劑添加至步驟1反應產物混合物中,之後一或多個如本文其他地方所述之視情況選用之洗滌步驟,諸如在酸洗滌之後及在鹽洗滌之前。第二溶劑與步驟1中之溶劑之體積比可適當地為約1.5:1至約5:1,諸如約3:1。在一些態樣中,在將第二溶劑添加至步驟1反應產物混合物中及至少一個洗滌步驟之後,可再添加第二溶劑,之後進行蒸餾。在一些此類態樣中,第二溶劑與步驟1中之溶劑之體積比可為約0.5:1至約2:1,諸如約0.75:1。蒸餾可在減壓下進行以產生包含濃縮之化合物2之混合物,例如化合物2濃度係約0.25 g/mL至約1 g/mL,諸如約0.5 g/mL。蒸餾溫度可適當地為低於約50℃。In some aspects, the solvent exchange of the polar aprotic solvent to the second solvent in the reaction product mixture of step 1 can be achieved. In some aspects, the second solvent is a polar aprotic solvent. In some specific aspects, the second solvent comprises or is ethyl acetate. In some aspects, a second solvent may be added to the reaction product mixture of step 1, followed by one or more optional washing steps as described elsewhere herein, such as after acid washing and before salt washing. The volume ratio of the second solvent to the solvent in Step 1 may suitably be about 1.5:1 to about 5:1, such as about 3:1. In some aspects, after the second solvent is added to the reaction product mixture of step 1 and at least one washing step, a second solvent may be added, followed by distillation. In some such aspects, the volume ratio of the second solvent to the solvent in step 1 may be from about 0.5:1 to about 2:1, such as about 0.75:1. Distillation may be performed under reduced pressure to produce a mixture containing concentrated compound 2, for example, compound 2 concentration is about 0.25 g/mL to about 1 g/mL, such as about 0.5 g/mL. The distillation temperature may suitably be below about 50°C.

固體化合物2可藉由將反溶劑添加至包含化合物2或化合物2之任何溶液之反應產物混合物中形成。在一些態樣中,反溶劑具有小於2之介電常數。在一些態樣中,反溶劑選自正戊烷、正己烷、正庚烷及環戊烷中之一或多者。在一些態樣中,反溶劑包含或係正庚烷。在一些態樣中,蒸餾在反溶劑添加之後進行。在一些此類蒸餾態樣中,反溶劑與步驟1中之溶劑之體積比可適當地為約0.25:1至約2:1、約0.25:1至約1:1,諸如約0.5:1。蒸餾可在減壓下進行以產生包含濃縮之化合物2之混合物,例如化合物2濃度係約0.25 g/mL至約1 g/mL,諸如約0.5 g/mL。蒸餾步驟可重複一或多次。在最終蒸餾步驟之後,可添加反溶劑以產生可容易轉移且過濾之漿料。舉例而言,漿料中之化合物2濃度可適當地為約0.05至約0.5 g/mL、約0.1至約0.3 g/mL,諸如約0.2 g/mL。Solid compound 2 can be formed by adding an anti-solvent to the reaction product mixture containing compound 2 or any solution of compound 2. In some aspects, the anti-solvent has a dielectric constant of less than 2. In some aspects, the anti-solvent is selected from one or more of n-pentane, n-hexane, n-heptane, and cyclopentane. In some aspects, the anti-solvent comprises or is n-heptane. In some aspects, the distillation is performed after the anti-solvent is added. In some such distillation aspects, the volume ratio of the anti-solvent to the solvent in Step 1 may suitably be about 0.25:1 to about 2:1, about 0.25:1 to about 1:1, such as about 0.5:1. Distillation may be performed under reduced pressure to produce a mixture containing concentrated compound 2, for example, compound 2 concentration is about 0.25 g/mL to about 1 g/mL, such as about 0.5 g/mL. The distillation step can be repeated one or more times. After the final distillation step, an anti-solvent can be added to produce a slurry that can be easily transferred and filtered. For example, the compound 2 concentration in the slurry may suitably be about 0.05 to about 0.5 g/mL, about 0.1 to about 0.3 g/mL, such as about 0.2 g/mL.

固體化合物2可藉由此項技術中已知之技術分離,包括過濾、離心及沈澱。經分離固體化合物2可視情況選用反溶劑及/或母液洗滌,且接著視情況乾燥。乾燥可藉由此項技術中已知之技術進行,包括在諸如約30℃至約50℃之高溫下真空乾燥。The solid compound 2 can be separated by techniques known in the art, including filtration, centrifugation, and Shendian. The separated solid compound 2 is optionally washed with an anti-solvent and/or mother liquor, and then dried as appropriate. Drying can be performed by techniques known in the art, including vacuum drying at high temperatures such as about 30°C to about 50°C.

以化合物1計化合物2產率係至少85%、至少90%或至少95%,例如90%或95%。如藉由本文其他地方所述之HPLC方法所量測之純度係至少95%、至少96%或至少97%,諸如約97%或約97.5%。The yield of compound 2 based on compound 1 is at least 85%, at least 90% or at least 95%, for example 90% or 95%. The purity as measured by the HPLC method described elsewhere herein is at least 95%, at least 96%, or at least 97%, such as about 97% or about 97.5%.

在一些態樣中,化合物1係以下化合物1(a),(5-(三氟甲基)-2-(2-(三氟甲基)嘧啶-5-基)吡啶-4-基)甲醇:

Figure 02_image019
化合物1(a)。In some aspects, compound 1 is the following compound 1(a), (5-(trifluoromethyl)-2-(2-(trifluoromethyl)pyrimidin-5-yl)pyridin-4-yl)methanol :
Figure 02_image019
Compound 1(a).

在一些態樣中,化合物2係以下化合物2(a),甲烷磺酸(5-(三氟甲基)-2-(2-(三氟甲基)嘧啶-5-基)吡啶-4-基)甲酯:

Figure 02_image021
化合物2(a)。In some aspects, compound 2 is the following compound 2(a), methanesulfonic acid (5-(trifluoromethyl)-2-(2-(trifluoromethyl)pyrimidin-5-yl)pyridine-4- Base) methyl ester:
Figure 02_image021
Compound 2(a).

在步驟2中,化合物2及溶劑中之氮源如下反應以形成化合物3:

Figure 02_image023
。In step 2, compound 2 and the nitrogen source in the solvent react as follows to form compound 3:
Figure 02_image023
.

R1 及R2 如先前所述。R 1 and R 2 are as previously described.

在步驟2中,化合物2與溶劑在反應器中在攪拌下組合,直至形成溶液。在一些態樣中,溶劑包含或係極性有機溶劑。在一些態樣中,極性有機溶劑可選自以下中之一或多者:甲醇、乙醇、1-丙醇、2-丙醇、1-丁醇、甲酸、乙酸、MeTHF、THF、乙酸乙酯、乙酸丙酯、丙酮、DMF、乙腈及DMSO。在一些態樣中,極性有機溶劑選自THF及MeTHF中之一或多者。在一些態樣中,溶劑係THF。在一些態樣中,氮源係氨或銨鹽。溶液中化合物2之濃度可適當地為約0.05至約1.0 g/mL、約0.05至約0.5 g/mL、或約0.1 g/mL至約0.3 g/mL,諸如約0.2 g/mL。將化合物2之溶液與氨或銨鹽組合以形成包含化合物2之反應混合物。在一些態樣中,氨或銨鹽可呈於有機極性質子溶劑中之溶液,該有機極性質子溶劑選自甲醇、乙醇、1-丙醇、2-丙醇、1-丁醇、甲酸、硝基甲烷及乙酸。在一些態樣中,有機極性質子溶劑選自甲醇、乙醇、1-丙醇及2-丙醇。在一些態樣中,有機極性質子溶劑包含或係甲醇。在任何此類態樣中,溶液可為約3莫耳濃度至約9莫耳濃度,諸如約7莫耳濃度之氨或銨鹽。氨或銨鹽溶液與化合物2溶液之體積可為約1:1至約10:1、或約4:1至約8:1,諸如約5:1,諸如約6:1。使反應混合物加熱以形成包含化合物3之反應產物混合物。適合的反應溫度可為約30℃至約60℃、約30℃至約50℃、或約35℃至約45℃。反應混合物可在攪拌下保持於一定溫度,且反應直至形成包含化合物3之步驟2反應產物混合物,其含有小於0.5%、小於0.2%或小於0.1%之化合物2。分析可藉由如本文其他地方所述之HPLC進行。In step 2, compound 2 and the solvent are combined in the reactor with stirring until a solution is formed. In some aspects, the solvent includes or is a polar organic solvent. In some aspects, the polar organic solvent may be selected from one or more of the following: methanol, ethanol, 1-propanol, 2-propanol, 1-butanol, formic acid, acetic acid, MeTHF, THF, ethyl acetate , Propyl acetate, acetone, DMF, acetonitrile and DMSO. In some aspects, the polar organic solvent is selected from one or more of THF and MeTHF. In some aspects, the solvent is THF. In some aspects, the nitrogen source is ammonia or ammonium salt. The concentration of compound 2 in the solution may suitably be about 0.05 to about 1.0 g/mL, about 0.05 to about 0.5 g/mL, or about 0.1 g/mL to about 0.3 g/mL, such as about 0.2 g/mL. The solution of Compound 2 is combined with ammonia or an ammonium salt to form a reaction mixture containing Compound 2. In some aspects, the ammonia or ammonium salt may be a solution in an organic polar protic solvent selected from methanol, ethanol, 1-propanol, 2-propanol, 1-butanol, formic acid , Nitromethane and acetic acid. In some aspects, the organic polar protic solvent is selected from methanol, ethanol, 1-propanol, and 2-propanol. In some aspects, the organic polar protic solvent comprises or is methanol. In any such aspect, the solution may be an ammonia or ammonium salt having a concentration of about 3 mol to about 9 mol, such as a concentration of about 7 mol. The volume of the ammonia or ammonium salt solution and the compound 2 solution may be about 1:1 to about 10:1, or about 4:1 to about 8:1, such as about 5:1, such as about 6:1. The reaction mixture is heated to form a reaction product mixture containing compound 3. A suitable reaction temperature may be about 30°C to about 60°C, about 30°C to about 50°C, or about 35°C to about 45°C. The reaction mixture may be maintained at a certain temperature with stirring, and react until a step 2 reaction product mixture comprising compound 3 is formed, which contains less than 0.5%, less than 0.2%, or less than 0.1% of compound 2. The analysis can be performed by HPLC as described elsewhere herein.

在一些態樣中,步驟2可視情況包含純化步驟。在一些此類態樣中,純化步驟可包含:(i)由步驟2溶劑交換成介電常數大於2之非極性溶劑,以形成化合物3於非極性溶劑中之第一溶液;(ii)藉由添加酸,使固體化合物3自溶液中沈澱,之後分離固體化合物3及視情況洗滌分離之固體化合物3;(iii)藉由添加鹼將化合物3溶解於介電常數大於2之非極性溶劑中以形成化合物3於非極性溶劑中之第二溶液;(iv)藉由添加反溶劑,使固體化合物3游離鹼自第二溶液中沈澱,藉由移除非極性溶劑來濃縮,或其組合;及(v)分離純化之化合物3游離鹼。In some aspects, step 2 may optionally include a purification step. In some such aspects, the purification step may include: (i) exchanging the solvent from step 2 into a non-polar solvent having a dielectric constant greater than 2 to form a first solution of compound 3 in the non-polar solvent; (ii) The solid compound 3 is precipitated from the solution by adding an acid, and then the solid compound 3 and optionally the separated solid compound 3 are washed; (iii) the compound 3 is dissolved in a non-polar solvent with a dielectric constant greater than 2 by adding a base To form a second solution of compound 3 in a non-polar solvent; (iv) by adding an anti-solvent, the solid compound 3 free base is precipitated from the second solution, concentrated by removing the non-polar solvent, or a combination thereof; And (v) isolated and purified compound 3 free base.

在一些此類純化態樣中,可進行由極性有機溶劑至介電常數大於2之非極性溶劑的步驟2反應產物溶劑交換/洗滌步驟。適合的非極性溶劑包含甲基第三丁基醚(MTBE)、二乙醚、甲苯、苯、1,4-二噁烷、四氯化碳、三氯甲烷及二氯甲烷。在一些態樣中,非極性溶劑包含或係MTBE。在此類態樣中,可將步驟2反應產物混合物與非極性溶劑以約1.25:1至約4:1、約1:5:1至約3:1,諸如約2:1之與極性有機溶劑之體積比摻合。所得組合可進一步與無機鹼水溶液摻合。在一些態樣中,鹼選自鹼金屬氫氧化物、氫氧化銨、碳酸鉀、碳酸氫鉀、碳酸鈉及碳酸氫鈉。在一些態樣中,鹼可為碳酸氫鉀或碳酸氫鈉。無機鹼水溶液可適當地為約2 wt%至約30 wt%之鹼。對於諸如碳酸氫鉀或碳酸氫鈉之弱鹼,濃度可適當地為約15 wt%至約30 wt%或約20 wt%至約25 wt%。在此類態樣中,使各相分離,且移除下層水相。水相可用非極性溶劑以約0.5:1至約4:1、約1:5:1至約3:1,諸如約0.5:1或2:1之非極性溶劑與用以形成步驟2(a)反應混合物之極性有機溶劑之體積比洗滌至少一次。合併來自各洗滌步驟之有機相。在一些態樣中,以約2:1之溶劑體積比進行兩個洗滌步驟,之後以約0.5:1之溶劑體積比進行一個洗滌步驟。可減壓蒸餾包含化合物3之合併之有機層以將化合物3濃縮至諸如約0.03 g/mL至約0.2 g/mL,諸如約0.07 g/mL之濃度。低於約50℃之蒸餾溫度適用於實踐本發明。In some such purification aspects, a step 2 reaction product solvent exchange/washing step from a polar organic solvent to a non-polar solvent having a dielectric constant greater than 2 may be performed. Suitable non-polar solvents include methyl tertiary butyl ether (MTBE), diethyl ether, toluene, benzene, 1,4-dioxane, carbon tetrachloride, chloroform and dichloromethane. In some aspects, the non-polar solvent contains or is MTBE. In such an aspect, the reaction product mixture of step 2 and the non-polar solvent may be from about 1.25:1 to about 4:1, from about 1:5:1 to about 3:1, such as from about 2:1 to a polar organic The volume ratio of the solvent is blended. The resulting combination can be further blended with an inorganic alkaline aqueous solution. In some aspects, the base is selected from alkali metal hydroxides, ammonium hydroxide, potassium carbonate, potassium bicarbonate, sodium carbonate, and sodium bicarbonate. In some aspects, the base may be potassium bicarbonate or sodium bicarbonate. The aqueous inorganic base solution may suitably be about 2 wt% to about 30 wt% base. For weak bases such as potassium bicarbonate or sodium bicarbonate, the concentration may suitably be about 15 wt% to about 30 wt% or about 20 wt% to about 25 wt%. In this aspect, the phases are separated and the lower aqueous phase is removed. The aqueous phase can be formed with a non-polar solvent from about 0.5:1 to about 4:1, about 1:5:1 to about 3:1, such as about 0.5:1 or 2:1, and a non-polar solvent used to form step 2(a ) The volume ratio of the polar organic solvent of the reaction mixture is washed at least once. The organic phases from each washing step are combined. In some aspects, two washing steps are performed at a solvent volume ratio of about 2:1, followed by one washing step at a solvent volume ratio of about 0.5:1. The combined organic layer containing Compound 3 may be distilled under reduced pressure to concentrate Compound 3 to a concentration such as about 0.03 g/mL to about 0.2 g/mL, such as about 0.07 g/mL. Distillation temperatures below about 50°C are suitable for practicing the present invention.

在一些此類純化態樣中,可將步驟化合物3或其濃縮物與諸如有機酸之酸於諸如非極性溶劑之溶劑中之溶液摻合。在一些態樣中,有機酸係羧酸。在一些態樣中,羧酸選自甲酸、草酸、丙二酸、丁二酸、戊二酸丁二酸及己二酸中之一或多者。在一些態樣中,有機酸包含或係草酸。非極性溶劑係如本文其他地方所述。在一些態樣中,非極性溶劑包含或係MTBE。非極性溶劑中之有機酸濃度可適當地為約0.02 g/mL至約0.1 g/mL,諸如約0.03 g/mL,諸如約0.04 g/mL。可在約室溫下攪動摻合物至少約1小時以形成固體化合物3。固體化合物3可藉由本文其他地方所述之方法分離,且視情況用非極性溶劑洗滌。In some such purification aspects, step compound 3 or its concentrate may be blended with a solution of an acid such as an organic acid in a solvent such as a non-polar solvent. In some aspects, the organic acid is a carboxylic acid. In some aspects, the carboxylic acid is selected from one or more of formic acid, oxalic acid, malonic acid, succinic acid, glutaric acid succinic acid, and adipic acid. In some aspects, the organic acid comprises or is oxalic acid. The non-polar solvent system is as described elsewhere herein. In some aspects, the non-polar solvent contains or is MTBE. The concentration of the organic acid in the non-polar solvent may suitably be about 0.02 g/mL to about 0.1 g/mL, such as about 0.03 g/mL, such as about 0.04 g/mL. The blend can be agitated at about room temperature for at least about 1 hour to form solid compound 3. Solid compound 3 can be isolated by methods described elsewhere herein, and optionally washed with a non-polar solvent.

在一些此類純化態樣中,固體化合物3可在攪拌下與額外非極性溶劑(例如MTBE)組合達至約0.05 g/mL至約0.5 g/mL、或約與0.1 g/mL至約0.2 g/mL之化合物3濃度。化合物3混合物可用如先前所述之無機鹼水溶液以約0.5:1至約5:1、約1:1至約3:1、或約1:1至約1.5:1之無機鹼溶液與額外非極性溶劑之體積比洗滌。使各相分離,且移除下層水相,且視情況用如先前所述之額外非極性溶劑洗滌至少一次。減壓蒸餾含有化合物3之合併之有機相以產生包含濃縮之化合物3之混合物,例如化合物3濃度係約0.25 g/mL至約1 g/mL,諸如約0.5 g/mL。蒸餾溫度適當地為低於約50℃。In some such purification aspects, solid compound 3 can be combined with additional non-polar solvents (eg, MTBE) to about 0.05 g/mL to about 0.5 g/mL, or about 0.1 g/mL to about 0.2 with stirring g/mL of compound 3 concentration. The compound 3 mixture may use an inorganic base aqueous solution as previously described with an inorganic base solution of about 0.5:1 to about 5:1, about 1:1 to about 3:1, or about 1:1 to about 1.5:1 with additional non- Wash by volume ratio of polar solvents. The phases are separated, and the lower aqueous phase is removed, and optionally washed with additional non-polar solvent as previously described at least once. The combined organic phase containing Compound 3 is distilled under reduced pressure to produce a mixture containing concentrated Compound 3, for example, Compound 3 concentration is about 0.25 g/mL to about 1 g/mL, such as about 0.5 g/mL. The distillation temperature is suitably below about 50°C.

在最終純化步驟中,將反溶劑,諸如如本文其他地方所述之具有小於2之介電常數之非極性反溶劑(例如正庚烷)添加至化合物3濃縮物中以形成化合物3濃度約0.05至約0.5 g/mL、約0.1至約0.3 g/mL,諸如約0.2 g/mL之化合物3游離鹼漿料。In the final purification step, an anti-solvent, such as a non-polar anti-solvent with a dielectric constant of less than 2 (such as n-heptane) as described elsewhere herein is added to the compound 3 concentrate to form a compound 3 concentration of about 0.05 Compound 3 free base slurry to about 0.5 g/mL, about 0.1 to about 0.3 g/mL, such as about 0.2 g/mL.

在一些態樣中,化合物3係以下化合物3(a),(5-(三氟甲基)-2-(2-(三氟甲基)嘧啶-5-基)吡啶-4-基)甲胺

Figure 02_image025
化合物3(a)。In some aspects, compound 3 is compound 3(a), (5-(trifluoromethyl)-2-(2-(trifluoromethyl)pyrimidin-5-yl)pyridin-4-yl)methyl amine
Figure 02_image025
Compound 3(a).

在一些態樣中,固體化合物3可藉由本文其他地方所述之方法分離。分離之化合物3可視情況用非極性溶劑洗滌。化合物3固體可視情況藉由此項技術中已知之技術乾燥,包括在諸如約20℃至約50℃之高溫下真空乾燥。In some aspects, solid compound 3 can be isolated by methods described elsewhere herein. The isolated compound 3 is washed with a non-polar solvent as appropriate. Compound 3 solids can be optionally dried by techniques known in the art, including vacuum drying at high temperatures such as about 20°C to about 50°C.

以化合物2計化合物3產率係至少70%、至少75%或至少80%,例如80%或85%。如藉由本文其他地方所述之HPLC方法所量測之分析百分比(w/w)係至少90%或至少95%,諸如約95%或約96%。如藉由本文其他地方所述之HPLC方法所量測之純度係至少97%、至少98%或至少99%,諸如約99%或約99.5%。The yield of compound 3 based on compound 2 is at least 70%, at least 75%, or at least 80%, such as 80% or 85%. The percentage of analysis (w/w) as measured by the HPLC method described elsewhere herein is at least 90% or at least 95%, such as about 95% or about 96%. The purity as measured by the HPLC method described elsewhere herein is at least 97%, at least 98%, or at least 99%, such as about 99% or about 99.5%.

以化合物1計化合物3產率係至少30%、至少40%、至少50%、至少60%、至少70%或至少80%。The yield of compound 3 based on compound 1 is at least 30%, at least 40%, at least 50%, at least 60%, at least 70%, or at least 80%.

在步驟3中,如下根據步驟3,化合物3、化合物4及偶合劑在溶劑中反應以形成化合物5:

Figure 02_image027
In step 3, according to step 3, compound 3, compound 4 and the coupling agent are reacted in a solvent to form compound 5 as follows:
Figure 02_image027

R1 及R2 如先前所述。R 1 and R 2 are as previously described.

在一些態樣中,R3 係-C1-4 烷基。在一些態樣中,R3 係-CH3In some aspects, R 3 is -C 1-4 alkyl. In some aspects, R 3 is -CH 3 .

在一些態樣中,R4 選自H及F。在一些其他態樣中,R4 係F。In some aspects, R 4 is selected from H and F. In some other aspects, R 4 is F.

在一些其他態樣中,R3 及R4 與其所連接之環原子一起形成三員碳環。In some other aspects, R 3 and R 4 together with the ring atoms to which they are attached form a three-membered carbocyclic ring.

各星號係指對掌性中心。Each asterisk refers to the palm center.

PG係指胺保護基。在一些態樣中,PG選自乙醯基、三氟乙醯基、第三丁氧基羰基(BOC)、苯甲氧基羰基(CBz)及9-茀基亞甲氧基羰基(Fmoc)。在一些態樣中,PG係BOC。PG means amine protecting group. In some aspects, PG is selected from the group consisting of acetyl, trifluoroacetyl, third butoxycarbonyl (BOC), benzyloxycarbonyl (CBz), and 9-茀ylmethyleneoxycarbonyl (Fmoc) . In some aspects, PG is BOC.

在一些態樣中,化合物4係以下化合物4(a),(2S,4R,5S)-1-(第三丁氧基羰基)-4-氟-5-甲基吡咯啶-2-羧酸:

Figure 02_image029
化合物4(a)。In some aspects, compound 4 is the following compound 4(a), (2S,4R,5S)-1-(third butoxycarbonyl)-4-fluoro-5-methylpyrrolidine-2-carboxylic acid :
Figure 02_image029
Compound 4(a).

在一些態樣中,化合物5係以下化合物5(a),(2S,3R,5S)-3-氟-2-甲基-5-((5-(三氟甲基)-2-(2-(三氟甲基)嘧啶-5-基)吡啶-4-基)甲基胺甲醯基)吡咯啶-1-甲酸第三丁酯:

Figure 02_image031
化合物5(a)。In some aspects, compound 5 is the following compound 5(a), (2S,3R,5S)-3-fluoro-2-methyl-5-((5-(trifluoromethyl)-2-(2 -(Trifluoromethyl)pyrimidin-5-yl)pyridin-4-yl)methylaminecarboxamide)pyrrolidine-1-carboxylic acid third butyl ester:
Figure 02_image031
Compound 5(a).

在一些態樣中,偶合劑可選自:丙烷膦酸酐(T3P®);1-[雙(二甲胺基)亞甲基]-1H-1,2,3-三唑并[4,5-b]吡錠3-氧化六氟磷酸鹽(HATU);2-(1H-苯并三唑-1-基)-1,1,3,3-四甲基

Figure 108105242-A0101-12-0011
六氟磷酸鹽(HBTU);N,N'-二環己基碳化二亞胺(DCC);苯并三唑-1-基氧基)參(二甲胺基)鏻六氟磷酸鹽(BOP);苯并三唑-1-基-氧基三吡咯啶基鏻六氟磷酸鹽(PyBOP);1,1'-羰基二咪唑(CDI);1-乙基-3-(3-二甲胺基丙基)碳化二亞胺(EDC)及羥基苯并三唑(HOBt);及EDC及4-二甲胺基吡啶(DMAP)。在一些態樣中,偶合劑係T3P®。偶合劑可視情況呈於有機溶劑中之溶液,例如50 wt%之T3P®於乙酸乙酯中之溶液。In some aspects, the coupling agent may be selected from: propanephosphonic anhydride (T3P®); 1-[bis(dimethylamino)methylene]-1H-1,2,3-triazolo[4,5 -b]pyridine 3-oxide hexafluorophosphate (HATU); 2-(1H-benzotriazol-1-yl)-1,1,3,3-tetramethyl
Figure 108105242-A0101-12-0011
Hexafluorophosphate (HBTU); N,N'-dicyclohexylcarbodiimide (DCC); benzotriazol-1-yloxy) ginseng (dimethylamino) phosphonium hexafluorophosphate (BOP) ; Benzotriazol-1-yl-oxytripyrrolidinylphosphonium hexafluorophosphate (PyBOP); 1,1'-carbonyldiimidazole (CDI); 1-ethyl-3-(3-dimethylamine Propyl) carbodiimide (EDC) and hydroxybenzotriazole (HOBt); and EDC and 4-dimethylaminopyridine (DMAP). In some aspects, the coupling agent is T3P®. The coupling agent may optionally be present in a solution in an organic solvent, such as 50 wt% T3P® in ethyl acetate.

在一些態樣中,用於形成化合物5之反應混合物進一步包含鹼。在一些態樣中,鹼係有機鹼。在一些其他態樣中,鹼係三級胺鹼。在一些其他態樣中,鹼選自N-甲基-嗎啉(NMM)、二異丙基乙胺(DIPEA)及三乙胺(TEA)。在一些其他態樣中,鹼包含或係NMM。In some aspects, the reaction mixture used to form compound 5 further comprises a base. In some aspects, the base is an organic base. In some other aspects, the base is a tertiary amine base. In some other aspects, the base is selected from N-methyl-morpholine (NMM), diisopropylethylamine (DIPEA), and triethylamine (TEA). In some other aspects, the base comprises or is NMM.

在一些態樣中,用於形成化合物5之反應混合物之溶劑包含或係極性非質子溶劑。在一些態樣中,極性非質子溶劑選自以下中之一或多者:MeTHF、THF、乙酸乙酯、乙酸丙酯、乙酸異丙酯、丙酮、DMF、乙腈及DMSO。在一些態樣中,極性非質子溶劑選自乙酸乙酯及乙酸丙酯中之一者或兩者。In some aspects, the solvent used to form the reaction mixture of compound 5 comprises or is a polar aprotic solvent. In some aspects, the polar aprotic solvent is selected from one or more of MeTHF, THF, ethyl acetate, propyl acetate, isopropyl acetate, acetone, DMF, acetonitrile, and DMSO. In some aspects, the polar aprotic solvent is selected from one or both of ethyl acetate and propyl acetate.

用於步驟3之反應混合物可藉由在攪拌下在反應器中組合化合物3、化合物4及溶劑直至形成溶液而形成。添加次序嚴格來講並不關鍵。反應可使用化合物3及4之大致化學計量之當量比。化合物3之濃度可適當地為約0.03 g/mL至約0.3 g/mL、約0.05 g/mL至約0.15 g/mL,諸如約0.1 g/mL。接著添加鹼至化合物3及4之溶液中。鹼通常以化合物3莫耳過量存在,諸如莫耳比在1:1與3:1之間,係約1.1:1至約2:1、約1.2:1至約1.5:1,諸如約1.3:1。接著添加偶合劑以形成反應混合物。在一些態樣中,鹼及偶合劑之當量以大致化學計量之等量存在。The reaction mixture used in Step 3 can be formed by combining Compound 3, Compound 4 and the solvent in the reactor with stirring until a solution is formed. The order of addition is strictly not critical. The reaction can use the approximate stoichiometric equivalent ratio of compounds 3 and 4. The concentration of Compound 3 may suitably be about 0.03 g/mL to about 0.3 g/mL, about 0.05 g/mL to about 0.15 g/mL, such as about 0.1 g/mL. Next, a base is added to the solution of compounds 3 and 4. The base is usually present in excess of compound 3 molar, such as a molar ratio between 1:1 and 3:1, ranging from about 1.1:1 to about 2:1, about 1.2:1 to about 1.5:1, such as about 1.3: 1. The coupling agent is then added to form the reaction mixture. In some aspects, the equivalent amounts of base and coupling agent are present in approximately stoichiometric equivalent amounts.

將反應混合物加熱,以便達至至少40℃,諸如約40℃至約70℃或約50℃至約60℃。反應混合物可在攪拌下保持於一定溫度,且反應直至形成包含化合物5之步驟3(a)反應產物混合物,其含有小於5%、小於2%、小於1%或小於0.5%之起始化合物4及/或化合物3。分析可藉由如本文其他地方所述之HPLC進行。反應時間通常係至少1小時、至少2小時或至少3小時。若反應產物混合物包含超過5%之化合物4,則可添加額外偶合劑且可繼續反應。The reaction mixture is heated so as to reach at least 40°C, such as about 40°C to about 70°C or about 50°C to about 60°C. The reaction mixture may be kept at a certain temperature with stirring, and react until a reaction product mixture of step 3 (a) containing compound 5 is formed, which contains less than 5%, less than 2%, less than 1%, or less than 0.5% of starting compound 4 And/or compound 3. The analysis can be performed by HPLC as described elsewhere herein. The reaction time is usually at least 1 hour, at least 2 hours, or at least 3 hours. If the reaction product mixture contains more than 5% of compound 4, additional coupling agent can be added and the reaction can continue.

在一些態樣中,步驟3可進一步包含:(i)由用於化合物5反應混合物之溶劑(例如極性非質子溶劑)至第二溶劑(例如極性質子溶劑)之溶劑交換步驟;及(ii)沈澱步驟,其中藉由添加反溶劑產生固體化合物5。在一些態樣中,溶劑交換步驟可包含鹼,諸如無機鹼。在一些態樣中,鹼選自以下中之一或多者:鹼金屬氫氧化物、氫氧化銨、碳酸鉀及碳酸鈉。在一些態樣中,鹼係強鹼。在一些態樣中,鹼係氫氧化鈉或氫氧化鉀。在一些態樣中,鹼呈水溶液。In some aspects, step 3 may further include: (i) a solvent exchange step from a solvent (eg, polar aprotic solvent) used in the compound 5 reaction mixture to a second solvent (eg, polar protic solvent); and (ii ) Precipitation step, in which solid compound 5 is produced by adding an anti-solvent. In some aspects, the solvent exchange step may include a base, such as an inorganic base. In some aspects, the base is selected from one or more of the following: alkali metal hydroxide, ammonium hydroxide, potassium carbonate, and sodium carbonate. In some aspects, the base is a strong base. In some aspects, the base is sodium hydroxide or potassium hydroxide. In some aspects, the base is an aqueous solution.

在一些態樣中,溶劑交換中之第二溶劑係極性質子溶劑。在此類態樣中,極性質子溶劑可選自以下中之一或多者:甲醇、乙醇、1-丙醇、2-丙醇、1-丁醇、甲酸及乙酸。在一些態樣中,極性質子溶劑選自以下中之一或多者:甲醇、乙醇、1-丙醇及2-丙醇。在一些態樣中,極性質子溶劑包含或係乙醇。In some aspects, the second solvent in the solvent exchange is a polar protic solvent. In such aspects, the polar protic solvent may be selected from one or more of the following: methanol, ethanol, 1-propanol, 2-propanol, 1-butanol, formic acid, and acetic acid. In some aspects, the polar protic solvent is selected from one or more of the following: methanol, ethanol, 1-propanol, and 2-propanol. In some aspects, the polar protic solvent comprises or is ethanol.

在溶劑交換步驟中,可視情況在攪拌下將鹼水溶液添加至包含化合物5之步驟3反應產物混合物中。停止攪拌且使各相分離,且自反應器移除下層水相。減壓蒸餾含有化合物5之剩餘有機相,同時在溶劑交換步驟中添加極性質子溶劑,同時保持大致恆定的體積。持續溶劑交換直至藉由如本文其他地方所述之GC所量測極性非質子溶劑含量小於2%。化合物5藉由添加水以固體型式產生。接著可向反應器中添加水,且可加熱反應產物混合物,以便達至至少40℃,諸如約40℃至約75或約50℃至約70℃。以起始化合物3重量計水之量可適當地為約0.5 mL/g至約2 mL/g、約0.5 mL/g至約1.5 mL/g,諸如約1 mL/g。接著可使反應產物混合物冷卻至低於約35℃,諸如約5℃至約30℃或約10℃至約25℃。接著可再添加水,其中以起始化合物3重量計水之量可適當地為約2 mL/g至約10 mL/g、約4 mL/g至約8 mL/g,諸如約6 mL/g。In the solvent exchange step, an aqueous alkali solution is optionally added to the reaction product mixture of step 3 containing compound 5 with stirring. Agitation was stopped and the phases were separated, and the lower aqueous phase was removed from the reactor. The remaining organic phase containing compound 5 was distilled under reduced pressure while adding a polar protic solvent in the solvent exchange step while maintaining a substantially constant volume. Continue solvent exchange until the content of polar aprotic solvent as measured by GC as described elsewhere herein is less than 2%. Compound 5 was produced in solid form by adding water. Water may then be added to the reactor, and the reaction product mixture may be heated so as to reach at least 40 °C, such as about 40 °C to about 75 or about 50 °C to about 70 °C. The amount of water based on the weight of the starting compound 3 may be suitably about 0.5 mL/g to about 2 mL/g, about 0.5 mL/g to about 1.5 mL/g, such as about 1 mL/g. The reaction product mixture can then be cooled to below about 35°C, such as from about 5°C to about 30°C or from about 10°C to about 25°C. Water may then be added, where the amount of water may suitably be about 2 mL/g to about 10 mL/g, about 4 mL/g to about 8 mL/g, such as about 6 mL/g based on the weight of the starting compound 3 g.

固體化合物5可藉由如本文其他地方所述之此項技術中已知的技術分離。分離之固體化合物5可視情況用極性質子溶劑及水洗滌,且接著視情況乾燥。乾燥可藉由此項技術中已知的技術進行,包括在諸如約40℃至約60℃之高溫下真空乾燥。The solid compound 5 can be isolated by techniques known in the art as described elsewhere herein. The separated solid compound 5 is washed with a polar protic solvent and water as appropriate, and then dried as appropriate. Drying can be performed by techniques known in the art, including vacuum drying at high temperatures such as about 40°C to about 60°C.

以化合物3計化合物5產率係至少80%、至少85%或至少90%,例如85%或90%。如藉由本文其他地方所述之HPLC方法所量測之純度係至少95%、至少97%或至少99%,諸如約99%或約99.5%。The yield of compound 5 based on compound 3 is at least 80%, at least 85%, or at least 90%, such as 85% or 90%. The purity as measured by the HPLC method described elsewhere herein is at least 95%, at least 97%, or at least 99%, such as about 99% or about 99.5%.

在步驟4中,化合物5及酸性脫除保護基劑如下在溶劑中反應以使化合物5脫除保護基且形成化合物6:

Figure 02_image033
In step 4, compound 5 and the acidic deprotecting base agent are reacted in a solvent as follows to deprotect the compound 5 and form compound 6:
Figure 02_image033

PG、R1 、R2 、R3 及R4 如先前所述。PG, R 1 , R 2 , R 3 and R 4 are as previously described.

在一些態樣中,化合物5係本文其他地方所揭示之化合物5(a)。在一些此類態樣中,化合物6係以下化合物6(a) (2S,4R,5S)-4-氟-5-甲基-N-((5-(三氟甲基)-2-(2-(三氟甲基)嘧啶-5-基)吡啶-4-基)甲基)吡咯啶-2-甲醯胺之酸式鹽:

Figure 02_image035
化合物6(a)In some aspects, compound 5 is compound 5(a) disclosed elsewhere herein. In some such aspects, compound 6 is the following compound 6(a) (2S,4R,5S)-4-fluoro-5-methyl-N-((5-(trifluoromethyl)-2-( Acid salt of 2-(trifluoromethyl)pyrimidin-5-yl)pyridin-4-yl)methyl)pyrrolidin-2-carboxamide:
Figure 02_image035
Compound 6(a)

酸性脫除保護基劑可為有機酸或無機酸。在一些態樣中,酸性脫除保護基劑係醯基鹵化物或無機酸。在一些態樣中,酸性脫除保護基劑係選自以下之醯基氯化物:乙醯氯、甲醯氯、丙醯氯及丁醯氯,或係選自鹽酸及硫酸之無機酸。在一些態樣中,酸性脫除保護基劑係乙醯氯,以使得化合物6(a)係乙酸鹽。在某些實施例中,酸性脫除保護基劑係鹽酸,以使得化合物6(a)係鹽酸鹽。The acidic deprotection base agent may be an organic acid or an inorganic acid. In some aspects, the acidic deprotecting base agent is an acyl halide or an inorganic acid. In some aspects, the acidic deprotecting base agent is selected from the following acyl chlorides: acetyl chloride, methyl chloride, propyl chloride, and butyl chloride, or inorganic acids selected from hydrochloric acid and sulfuric acid. In some aspects, the acidic deprotection base is acetyl chloride, so that compound 6(a) is the acetate salt. In certain embodiments, the acidic deprotection base is hydrochloric acid, so that compound 6(a) is the hydrochloride salt.

在一些態樣中,步驟4中所用之溶劑包含或係極性質子溶劑。在一些態樣中,極性質子溶劑選自以下中之一或多者:甲醇、乙醇、1-丙醇、2-丙醇、1-丁醇、甲酸及乙酸。在一些態樣中,極性質子溶劑選自以下中之一或多者:甲醇、乙醇、1-丙醇及2-丙醇。在一些態樣中,極性質子溶劑包含或係1-丙醇。In some aspects, the solvent used in step 4 contains or is a polar protic solvent. In some aspects, the polar protic solvent is selected from one or more of methanol, ethanol, 1-propanol, 2-propanol, 1-butanol, formic acid, and acetic acid. In some aspects, the polar protic solvent is selected from one or more of the following: methanol, ethanol, 1-propanol, and 2-propanol. In some aspects, the polar protic solvent comprises or is 1-propanol.

在步驟4中,溶劑、化合物5及酸性脫除保護基劑在反應器中在攪拌下組合以形成反應混合物。酸性脫除保護基劑係化合物5當量過量的。在一些態樣中,酸性脫除保護基劑與化合物5之莫耳比可在1:1與5:1之間,係約1.5:1至約4:1、或約2:1至約3:1,諸如約2.5:1。反應混合物中化合物5之濃度可適當地為約0.05 g/mL至約1 g/mL、約0.075 g/mL至約0.5 g/mL、或約0.1 g/mL至約0.3 g/mL,諸如約0.2 g/mL。在攪拌下加熱反應混合物至至少40℃,諸如約40℃至約75℃或約50℃至約70℃,且靜置直至形成包含化合物6之反應產物混合物,其含有小於5%、小於2%、小於1%或小於0.5%之起始化合物5。分析可藉由如本文其他地方所述之HPLC進行。反應時間通常係至少1小時、至少2小時或至少3小時。In step 4, the solvent, compound 5 and acidic deprotection base are combined in the reactor with stirring to form a reaction mixture. The acidic deprotection base compound is 5 equivalent excess. In some aspects, the molar ratio of the acidic deprotecting base agent to Compound 5 may be between 1:1 and 5:1, ranging from about 1.5:1 to about 4:1, or from about 2:1 to about 3 :1, such as about 2.5:1. The concentration of compound 5 in the reaction mixture may suitably be about 0.05 g/mL to about 1 g/mL, about 0.075 g/mL to about 0.5 g/mL, or about 0.1 g/mL to about 0.3 g/mL, such as about 0.2 g/mL. The reaction mixture is heated to at least 40°C with stirring, such as about 40°C to about 75°C or about 50°C to about 70°C, and is left to stand until a reaction product mixture comprising Compound 6, which contains less than 5%, less than 2% , Less than 1% or less than 0.5% of the starting compound 5. The analysis can be performed by HPLC as described elsewhere herein. The reaction time is usually at least 1 hour, at least 2 hours, or at least 3 hours.

在一些態樣中,可減壓蒸餾包含化合物6之反應產物混合物,同時添加具有小於2之介電常數之非極性反溶劑(例如正庚烷)且同時保持大致恆定的體積。添加反溶劑形成於反應產物混合物中之固體化合物6。持續蒸餾直至獲得約至少0.5:1、0.75:1或1:1之步驟4反應混合物中存在之非極性反溶劑與極性質子溶劑之體積比,諸如約1:1至約4:1、約1.5:1至約3:1,諸如約2:1。接著使反應器內含物冷卻至低於約40℃,諸如約5℃至約30℃,且化合物6固體藉由如本文其他地方所述之方法分離。分離之化合物6固體可視情況用極性質子溶劑及非極性反溶劑之組合洗滌。In some aspects, the reaction product mixture containing Compound 6 may be distilled under reduced pressure while adding a non-polar anti-solvent (eg, n-heptane) having a dielectric constant of less than 2 while maintaining a substantially constant volume. An anti-solvent is added to form solid compound 6 in the reaction product mixture. Distillation is continued until a volume ratio of non-polar antisolvent to polar protic solvent present in the reaction mixture of step 4 of at least about 0.5:1, 0.75:1 or 1:1, such as about 1:1 to about 4:1, about 1.5:1 to about 3:1, such as about 2:1. The reactor contents are then cooled to below about 40°C, such as from about 5°C to about 30°C, and Compound 6 solids are separated by methods as described elsewhere herein. The isolated compound 6 solid is optionally washed with a combination of polar protic solvent and non-polar anti-solvent.

化合物6固體可視情況乾燥。乾燥可藉由此項技術中已知的技術進行,包括在諸如約30℃至約40℃之高溫下真空乾燥。Compound 6 solid may be dried as appropriate. Drying can be performed by techniques known in the art, including vacuum drying at high temperatures such as about 30°C to about 40°C.

以化合物5計化合物6產率係至少80%、至少85%或至少90%,例如85%或90%。如藉由本文其他地方所述之HPLC方法所量測之純度係至少96%、至少97%或至少98%,諸如約98%或約98.5%。The yield of compound 6 based on compound 5 is at least 80%, at least 85%, or at least 90%, such as 85% or 90%. The purity as measured by the HPLC method described elsewhere herein is at least 96%, at least 97%, or at least 98%, such as about 98% or about 98.5%.

在步驟5中,化合物6酸式鹽、化合物7及鹼如下在溶劑系統中反應以形成化合物(I):

Figure 02_image037
Figure 02_image039
In step 5, the acid salt of compound 6, compound 7 and base are reacted in a solvent system as follows to form compound (I):
Figure 02_image037
Figure 02_image039

R1 、R2 、R3 及R4 如先前所述。R 1 , R 2 , R 3 and R 4 are as previously described.

R5 係鹵基。在一些態樣中,R5 係F。R 5 is a halogen group. In some aspects, R 5 is F.

n係1或2。在一些態樣中,n係1。n系1 or 2. In some aspects, n is 1.

X1 及X2 各係C,或X1 及X2 中之一者係N且另一者係C。在一些態樣中,X1 及X2 各係C。在一些態樣中,X1 係C且X2 係N。在一些態樣中,X1 係N且X2 係C。X 1 and X 2 are each C, or one of X 1 and X 2 is N and the other is C. In some aspects, X 1 and X 2 are each C. In some aspects, X 1 is C and X 2 is N. In some aspects, X 1 is N and X 2 is C.

在一些態樣中,化合物6係本文其他地方所揭示之化合物6(a)。在一些此類態樣中,化合物(I)係以下化合物I(a),(2S,4R,5S)-4-氟-1-(4-氟苯磺醯基)-5-甲基-N-((5-(三氟甲基)-2-(2-(三氟甲基)嘧啶-5-基)吡啶-4-基)甲基)吡咯啶-2-甲醯胺:

Figure 02_image041
化合物I(a)。In some aspects, compound 6 is compound 6(a) disclosed elsewhere herein. In some such aspects, compound (I) is the following compound I(a), (2S,4R,5S)-4-fluoro-1-(4-fluorobenzenesulfonyl)-5-methyl-N -((5-(trifluoromethyl)-2-(2-(trifluoromethyl)pyrimidin-5-yl)pyridin-4-yl)methyl)pyrrolidin-2-carboxamide:
Figure 02_image041
Compound I(a).

在步驟5中,化合物6、包含非極性溶劑之溶劑系統、鹼及化合物7在攪拌下組合以形成反應混合物,之後使其反應以形成包含化合物(I)之反應產物混合物。在一些態樣中,反應混合物藉由以下形成:組合化合物6與非極性溶劑,之後視情況添加極性質子溶劑,且接著添加鹼水溶液。In step 5, compound 6, a solvent system containing a non-polar solvent, a base, and compound 7 are combined with stirring to form a reaction mixture, and then allowed to react to form a reaction product mixture containing compound (I). In some aspects, the reaction mixture is formed by combining Compound 6 with a non-polar solvent, then adding a polar protic solvent as appropriate, and then adding an aqueous alkaline solution.

用於步驟5之鹼可為有機鹼或無機鹼。在一些態樣中,鹼係無機鹼。在一些態樣中,鹼係無機鹼水溶液。在一些此類態樣中,鹼選自鹼金屬氫氧化物、氫氧化銨、碳酸鉀及碳酸鈉之水溶液。在一些態樣中,鹼係碳酸鉀或碳酸鈉之水溶液。The base used in step 5 may be an organic base or an inorganic base. In some aspects, the base is an inorganic base. In some aspects, the alkali is an inorganic alkali aqueous solution. In some such aspects, the base is selected from aqueous solutions of alkali metal hydroxides, ammonium hydroxide, potassium carbonate, and sodium carbonate. In some aspects, the alkali is an aqueous solution of potassium carbonate or sodium carbonate.

用於步驟5之溶劑系統包含介電常數大於2之非極性溶劑。在一些態樣中,非極性溶劑選自以下中之一或多者:甲基第三丁基醚、二乙醚、1,4-二噁烷及三氯甲烷。在一些態樣中,非極性溶劑選自甲基第三丁基醚及二乙醚。在一些態樣中,溶劑包含或係甲基第三丁基醚。溶劑系統可視情況進一步包含選自以下中之一或多者之極性質子溶劑:甲醇、乙醇、1-丙醇、2-丙醇、1-丁醇、甲酸及乙酸。在一些態樣中,極性質子溶劑選自以下中之一或多者:甲醇、乙醇、1-丙醇及2-丙醇。在一些態樣中,極性質子溶劑包含或係乙醇。非極性溶劑與視情況選用之極性質子溶劑之體積比可適當地為約1:1至約20:1、約1:2至約20:1、約5:1至約15:1,諸如約10:1。鹼與化合物6之當量比可大於1:1,在約1:1與約4:1之間,係約1.5:1至約3:1,諸如約2:1。The solvent system used in step 5 contains a non-polar solvent with a dielectric constant greater than 2. In some aspects, the non-polar solvent is selected from one or more of the following: methyl tertiary butyl ether, diethyl ether, 1,4-dioxane, and chloroform. In some aspects, the non-polar solvent is selected from methyl tert-butyl ether and diethyl ether. In some aspects, the solvent comprises or is methyl tertiary butyl ether. The solvent system may further include a polar protic solvent selected from one or more of methanol, ethanol, 1-propanol, 2-propanol, 1-butanol, formic acid, and acetic acid as the case may be. In some aspects, the polar protic solvent is selected from one or more of the following: methanol, ethanol, 1-propanol, and 2-propanol. In some aspects, the polar protic solvent comprises or is ethanol. The volume ratio of the non-polar solvent to the optional polar protic solvent may be suitably about 1:1 to about 20:1, about 1:2 to about 20:1, about 5:1 to about 15:1, such as About 10:1. The equivalent ratio of base to compound 6 may be greater than 1:1, between about 1:1 and about 4:1, ranging from about 1.5:1 to about 3:1, such as about 2:1.

在反應混合物中,非極性溶劑中化合物(I)之濃度可適當地為約0.05 g/mL至約1 g/mL、約0.1 g/mL至約0.75 g/mL、約0.15 g/mL至約0.4 g/mL、約0.2 g/mL至約0.3 g/mL,諸如約0.25 g/mL。在涉及無機鹼之水溶液的態樣中,反應混合物中水與非極性溶劑之體積比可適當地為約0.25:1至約4:1、約0.5:1至約2:1,諸如約1:1。In the reaction mixture, the concentration of the compound (I) in the non-polar solvent may be suitably about 0.05 g/mL to about 1 g/mL, about 0.1 g/mL to about 0.75 g/mL, about 0.15 g/mL to about 0.4 g/mL, about 0.2 g/mL to about 0.3 g/mL, such as about 0.25 g/mL. In the aspect involving an aqueous solution of an inorganic base, the volume ratio of water to non-polar solvent in the reaction mixture may be suitably about 0.25:1 to about 4:1, about 0.5:1 to about 2:1, such as about 1: 1.

使反應混合物保持於一定溫度持續一定時間段,以足以產生包含化合物(I)及低於約5%之化合物6之反應產物混合物,如藉由如本文其他地方所述之HPLC量測。反應溫度適當地係約約10℃至約60℃、約10℃至約50℃或約15℃至約40℃。反應時間通常係至少1小時、至少2小時或至少3小時。The reaction mixture is maintained at a certain temperature for a certain period of time sufficient to produce a reaction product mixture comprising Compound (I) and less than about 5% of Compound 6, as measured by HPLC as described elsewhere herein. The reaction temperature is suitably about 10°C to about 60°C, about 10°C to about 50°C, or about 15°C to about 40°C. The reaction time is usually at least 1 hour, at least 2 hours, or at least 3 hours.

在反應產物混合物包含水之本發明之態樣中,使各相分離,且移除下層水相。在各個態樣中之任一者中,可在攪拌下將水添加至反應器中之有機混合物中,使各相分離,且移除下層水相。額外水洗滌步驟或用鹽水溶液洗滌步驟係在本發明之範疇內。可減壓蒸餾包含化合物(I)之剩餘有機相以減小體積且形成包含化合物(I)之反應產物混合物濃縮物。在一些態樣中,可持續蒸餾直至達至最小攪拌體積。In the aspect of the present invention where the reaction product mixture contains water, the phases are separated, and the lower aqueous phase is removed. In any of the various aspects, water can be added to the organic mixture in the reactor with stirring to separate the phases and remove the lower aqueous phase. Additional water washing steps or washing with saline solution are within the scope of the present invention. The remaining organic phase containing compound (I) can be distilled under reduced pressure to reduce the volume and form a concentrate of the reaction product mixture containing compound (I). In some aspects, the distillation may continue until the minimum stirring volume is reached.

可進行溶劑交換步驟以將包含化合物(I)之反應產物混合物濃縮物中之溶劑交換成選自以下之新穎溶劑:(i)如本文其他地方所述之介電常數大於2之第二非極性溶劑;(ii)如本文其他地方所述之極性非質子溶劑;或(iii)如本文其他地方所述之極性質子溶劑,且由此形成化合物(I)於新穎溶劑中之溶液。溶劑交換可適當地藉由將新穎溶劑添加至包含化合物(I)之反應產物混合物濃縮物中進行,之後減壓蒸餾,同時添加新穎溶劑且同時保持大致恆定的體積。A solvent exchange step may be performed to exchange the solvent in the concentrate of the reaction product mixture containing compound (I) with a novel solvent selected from the following: (i) a second non-polarity having a dielectric constant greater than 2 as described elsewhere herein Solvents; (ii) polar aprotic solvents as described elsewhere herein; or (iii) polar protic solvents as described elsewhere herein, and thereby form a solution of compound (I) in a novel solvent. The solvent exchange can be suitably performed by adding the novel solvent to the reaction product mixture concentrate containing the compound (I), followed by distillation under reduced pressure while adding the novel solvent while maintaining a substantially constant volume.

接著可在攪拌下將如本文其他地方所述之非極性反溶劑(例如正庚烷)添加至包含化合物(I)之蒸餾混合物中,且可將摻合物適當地加熱至約40℃至約85℃或約50℃至約80℃,之後冷卻至小於20℃,諸如約-10℃至約15℃或約-5℃至約10℃,以形成呈介電常數大於2之第二非極性溶劑、極性非質子溶劑或交換為步驟5反應混合物中之溶劑的極性質子溶劑之溶劑合物的固體結晶化合物(I)。反溶劑中化合物(I)之適合濃度可為約0.025至約1 g/mL或約0.05至約0.5 g/mL。結晶化合物(I)可藉由本文其他地方所述之方法分離。分離之化合物(I)可在諸如約30℃至約70℃或約40℃至約60℃,諸如約50℃至約60℃之高溫下藉由本文其他地方所述之此項技術中已知的技術乾燥。可將化合物(I)乾燥直至如藉由如本文其他地方所述之GC所量測非極性反溶劑含量小於0.5%。以化合物6計化合物(I)產率係至少80%、至少85%或至少90%,例如85%或90%。藉由其他地方所述之HPLC方法所量測之分析係至少85%或至少90%,諸如約90%或約92%。如藉由本文其他地方所述之HPLC方法所量測之純度係至少97%、至少98%或至少99%,諸如約98.5%或約99%。A non-polar anti-solvent (such as n-heptane) as described elsewhere herein can then be added to the distilled mixture containing compound (I) with stirring, and the blend can be suitably heated to about 40°C to about 85°C or about 50°C to about 80°C, and then cooled to less than 20°C, such as about -10°C to about 15°C or about -5°C to about 10°C to form a second nonpolar with a dielectric constant greater than 2 The solvent, the polar aprotic solvent or the solid crystalline compound (I) exchanged as a solvate of the polar protic solvent of the solvent in the reaction mixture of step 5. A suitable concentration of compound (I) in the anti-solvent may be about 0.025 to about 1 g/mL or about 0.05 to about 0.5 g/mL. The crystalline compound (I) can be isolated by methods described elsewhere herein. The isolated compound (I) may be known in the art described elsewhere herein at high temperatures such as about 30°C to about 70°C or about 40°C to about 60°C, such as about 50°C to about 60°C Technical drying. Compound (I) can be dried until the non-polar antisolvent content is less than 0.5% as measured by GC as described elsewhere herein. The yield of compound (I) based on compound 6 is at least 80%, at least 85% or at least 90%, for example 85% or 90%. The analysis measured by the HPLC method described elsewhere is at least 85% or at least 90%, such as about 90% or about 92%. The purity as measured by the HPLC method described elsewhere herein is at least 97%, at least 98%, or at least 99%, such as about 98.5% or about 99%.

在溶劑交換步驟中之新穎溶劑係DMAc之態樣中,結晶化合物(I)係指定為C型之DMAc溶劑合物。在新穎溶劑係苯甲醚之態樣中,結晶化合物(I)係指定為D型之苯甲醚溶劑合物。在新穎溶劑係乙醇之態樣中,結晶化合物(I)係指定為F型之乙醇溶劑合物。在新穎溶劑係甲苯之態樣中,結晶化合物(I)係指定為G型之甲苯溶劑合物。在新穎溶劑係2-丙醇之態樣中,結晶化合物(I)係指定為H型之2-丙醇溶劑合物。在新穎溶劑係1-丁醇之態樣中,結晶化合物(I)係指定為I型之1-丁醇溶劑合物。在新穎溶劑係MeTHF之態樣中,結晶化合物(I)係指定為J型之MeTHF溶劑合物。在新穎溶劑係THF之態樣中,結晶化合物(I)係指定為K型之THF溶劑合物。在新穎溶劑係異丁醇之態樣中,結晶化合物(I)係指定為L型之異丁醇溶劑合物。在新穎溶劑係DMSO之態樣中,結晶化合物(I)係指定為M型之DMSO溶劑合物。在新穎溶劑係2-戊醇之態樣中,結晶化合物(I)係指定為BK型之2-戊醇溶劑合物。在新穎溶劑係乙酸異丙酯之態樣中,結晶化合物(I)係指定為BK型之乙酸異丙酯溶劑合物。In the aspect of the novel solvent DMAc in the solvent exchange step, the crystalline compound (I) is designated as the C-type DMAc solvate. In the aspect of the novel solvent anisole, the crystalline compound (I) is designated as the D-type anisole solvate. In the aspect of the novel solvent-based ethanol, the crystalline compound (I) is designated as the F-type ethanol solvate. In the aspect of the novel solvent-based toluene, the crystalline compound (I) is designated as the G-type toluene solvate. In the aspect of the novel solvent system 2-propanol, the crystalline compound (I) is designated as H-type 2-propanol solvate. In the aspect of the novel solvent system 1-butanol, the crystalline compound (I) is designated as the type I 1-butanol solvate. In the aspect of the novel solvent system MeTHF, the crystalline compound (I) is designated as the J-type MeTHF solvate. In the aspect of the novel solvent system THF, the crystalline compound (I) is designated as the K-type THF solvate. In the case of the novel solvent system isobutanol, the crystalline compound (I) is designated as the L-type isobutanol solvate. In the aspect of the novel solvent system DMSO, the crystalline compound (I) is designated as the M-type DMSO solvate. In the aspect of the novel solvent system 2-pentanol, the crystalline compound (I) is designated as the 2-pentanol solvate of the BK type. In the aspect of the novel solvent system isopropyl acetate, the crystalline compound (I) is designated as a BK type isopropyl acetate solvate.

在一些態樣中,F型可藉由緩慢蒸發化合物(I)於乙醇中之溶液獲得。在一些其他態樣中,H型可藉由緩慢蒸發化合物(I)於IPA中之溶液或藉由緩慢蒸發化合物(I)於MTBE及IPA中之溶液獲得。In some aspects, Form F can be obtained by slowly evaporating a solution of Compound (I) in ethanol. In some other aspects, Form H can be obtained by slowly evaporating the solution of compound (I) in IPA or by slowly evaporating the solution of compound (I) in MTBE and IPA.

在本發明之一些態樣中,結晶化合物(I) E型可由非晶化合物(I)或由多種結晶水合物類型中之任一者製備。在此類態樣中,在低於約50℃之溫度下將化合物(I)溶解於DCM中以形成溶液。溫度適當地係約5℃至約50℃、約10℃至約40℃或約10℃至約30℃。化合物(I)於DCM中之濃度可適當地為約0.05 g/mL至約2 g/mL、約0.1 g/mL至約1 g/mL或約0.1 g/mL至約0.5 g/mL。將如本文其他地方所述之具有小於2之介電常數之非極性反溶劑(例如正庚烷)添加至化合物(I)溶液中以誘導結晶化合物(I) E型之結晶且形成其漿料。總反溶劑與DCM之體積比可適當地為約1:1及約5:1、約1.5:1至約4:1、或約1.5:1至約3:1,諸如約2:1。在一些態樣中,進行初始反溶劑添加,之後經諸如約1小時至約5小時或約2小時至約4小時之添加時段其他以增量添加。在初始反溶劑添加之後及在一或多次其他反溶劑添加之前,可視情況添加結晶化合物(I) E型晶種。In some aspects of the invention, the crystalline compound (I) Form E can be prepared from the amorphous compound (I) or from any of a variety of crystalline hydrate types. In such aspect, the compound (I) is dissolved in DCM at a temperature below about 50°C to form a solution. The temperature is suitably about 5°C to about 50°C, about 10°C to about 40°C, or about 10°C to about 30°C. The concentration of compound (I) in DCM may suitably be about 0.05 g/mL to about 2 g/mL, about 0.1 g/mL to about 1 g/mL, or about 0.1 g/mL to about 0.5 g/mL. Add a non-polar anti-solvent (such as n-heptane) with a dielectric constant of less than 2 as described elsewhere in this article to the compound (I) solution to induce crystallization of the crystalline compound (I) Form E and form its slurry . The volume ratio of total antisolvent to DCM may suitably be about 1:1 and about 5:1, about 1.5:1 to about 4:1, or about 1.5:1 to about 3:1, such as about 2:1. In some aspects, the initial anti-solvent addition is performed, followed by addition in increments over an addition period such as about 1 hour to about 5 hours or about 2 hours to about 4 hours. After the initial anti-solvent addition and before one or more other anti-solvent additions, the crystalline compound (I) E-type seed crystal is optionally added.

固體結晶化合物(I) E型可藉由如本文其他地方所述之此項技術中已知的技術自漿料分離,同時伴隨產生母液。分離之固體可視情況用母液及/或反溶劑洗滌,且接著視情況乾燥。結晶化合物(I) E型可在諸如約30℃至約70℃、或約40℃至約60℃,諸如約45℃至約55℃之高溫下藉由本文其他地方所述之此項技術中已知的技術來乾燥。將化合物(I)乾燥直至DCM含量係小於600 ppm,且非極性反溶劑含量係小於0.45%,如藉由如本文其他地方所述之GC所量測。以化合物6計化合物(I)產率係至少80%、至少85%或至少90%,例如85%或90%。如藉由本文其他地方所述之HPLC方法所量測之純度係至少98%、至少99%或至少99.5 %,諸如約99%、約99.5%或約99.9%。The solid crystalline compound (I) Form E can be separated from the slurry by techniques known in the art as described elsewhere herein, with the concomitant production of mother liquor. The separated solids are washed with mother liquor and/or anti-solvent as appropriate, and then dried as appropriate. The crystalline compound (I) Form E can be used in such techniques as described elsewhere herein at high temperatures such as about 30°C to about 70°C, or about 40°C to about 60°C, such as about 45°C to about 55°C Known techniques to dry. Compound (I) is dried until the DCM content is less than 600 ppm and the non-polar anti-solvent content is less than 0.45%, as measured by GC as described elsewhere herein. The yield of compound (I) based on compound 6 is at least 80%, at least 85% or at least 90%, for example 85% or 90%. The purity as measured by the HPLC method described elsewhere herein is at least 98%, at least 99%, or at least 99.5%, such as about 99%, about 99.5%, or about 99.9%.

化合物1可根據圖2中所示之三步驟方法且進一步參考實例來製備。Compound 1 can be prepared according to the three-step method shown in FIG. 2 and further referring to examples.

在第一步驟中,化合物10A、烷基酯形成劑及鹼根據以下在溶劑中反應以形成化合物10B:

Figure 02_image043
。In the first step, compound 10A, an alkyl ester-forming agent and a base are reacted in a solvent according to the following to form compound 10B:
Figure 02_image043
.

烷基酯形成劑可為烷基化劑,且在許多實施例中,可為甲基化劑,諸如甲苯磺酸甲酯。The alkyl ester-forming agent may be an alkylating agent, and in many embodiments, may be a methylating agent, such as methyl tosylate.

反應混合物由化合物10A、溶劑、烷基化劑甲基化劑及鹼形成,且反應混合物在約25℃至約60℃或約30℃至約50℃之溫度下反應以形成包含化合物1B之反應產物混合物。在一些態樣中,溶劑包含或係極性非質子溶劑。R1 及R2 、極性非質子溶劑、甲基化劑及鹼係如本文其他地方所述。在一些態樣中,極性非質子溶劑包含或係DMF。在一些態樣中,烷基化劑係可選自碘甲烷、甲苯磺酸甲酯及甲磺酸甲酯之甲基化劑。在一些態樣中,鹼係無機鹼,或係選自以下之無機鹼:碳酸鉀、碳酸氫鉀、碳酸鈉及碳酸氫鈉。反應產物混合物可與水及如本文其他地方所述之介電常數大於2之非極性溶劑(例如MTBE)組合,之後進行相分離以移除水相。水相可用額外非極性溶劑洗滌一或多次。包含化合物1B之有機相可與極性非質子溶劑(例如THF)組合且蒸餾至化合物1B濃度係約0.1至約2 g/mL或約0.25至約0.75 g/mL。The reaction mixture is formed of compound 10A, a solvent, an alkylating agent, a methylating agent, and a base, and the reaction mixture is reacted at a temperature of about 25°C to about 60°C or about 30°C to about 50°C to form a reaction including compound 1B Product mixture. In some aspects, the solvent comprises or is a polar aprotic solvent. R 1 and R 2 , polar aprotic solvents, methylating agents, and bases are as described elsewhere herein. In some aspects, the polar aprotic solvent comprises or is DMF. In some aspects, the alkylating agent may be a methylating agent selected from methyl iodide, methyl tosylate, and methyl methanesulfonate. In some aspects, the base is an inorganic base, or an inorganic base selected from the group consisting of potassium carbonate, potassium bicarbonate, sodium carbonate, and sodium bicarbonate. The reaction product mixture may be combined with water and a non-polar solvent having a dielectric constant greater than 2 (eg MTBE) as described elsewhere herein, followed by phase separation to remove the aqueous phase. The aqueous phase can be washed one or more times with additional non-polar solvents. The organic phase containing Compound 1B can be combined with a polar aprotic solvent (such as THF) and distilled to a Compound 1B concentration of about 0.1 to about 2 g/mL or about 0.25 to about 0.75 g/mL.

在某些實施例中,甲基化劑可經其他低碳烷基試劑置換以使得化合物10B係如所示之除甲酯外之低碳烷基酯。In some embodiments, the methylating agent can be replaced with other lower alkyl reagents so that compound 10B is a lower alkyl ester other than the methyl ester as shown.

在第二步驟中,化合物1B及還原劑根據以下在溶劑中反應以形成化合物1C:

Figure 02_image045
。In the second step, compound 1B and the reducing agent are reacted in a solvent according to the following to form compound 1C:
Figure 02_image045
.

形成包含於溶劑(例如THF)中之化合物1B、額外溶劑(例如THF)、水及還原劑之反應混合物,且在低於25℃,諸如約5℃至約20℃之溫度下反應以形成包含化合物1C之反應產物混合物。在一些態樣中,溶劑係極性非質子溶劑。R1 及R2 及極性非質子溶劑如本文其他地方所述。在一些態樣中,還原劑係硼氫化物化合物,諸如硼氫化鈉NaBH4 。用無機酸(例如HCl)將反應產物混合物之pH值調節至約1,且在一定溫度下攪拌調節之反應產物混合物例如至少1小時或至少4小時。使各相分離,且移除下層水相,留下包含化合物1C之有機相。水相可再用如本文其他地方所述之極性非質子溶劑(例如乙酸乙酯)洗滌至少一次。合併之包含化合物1C之有機相可用無機鹼水溶液(例如碳酸氫鈉或碳酸氫鉀)及/或鹽水溶液(例如NaCl)洗滌一或多次。使洗滌之有機相與如本文其他地方所述之具有小於2之介電常數之非極性溶劑(例如正庚烷)組合,之後在低於約70℃之溫度下減壓蒸餾。可再添加非極性溶劑,且使混合物冷卻至低於約20℃,諸如約-5℃至約5℃。固體化合物1C可藉由如本文其他地方所述之此項技術中已知的技術自漿料分離。分離之固體可視情況用反溶劑洗滌,且接著視情況藉由本文其他地方所述之此項技術中已知的技術乾燥。以化合物1B計化合物1C產率係至少70%、至少75%或至少80%,例如80%。如藉由本文其他地方所述之HPLC方法所量測之純度係至少98%或至少99%,諸如約99%或約99.4%。Forming a reaction mixture of compound 1B contained in a solvent (eg THF), additional solvent (eg THF), water and a reducing agent, and reacting at a temperature below 25°C, such as from about 5°C to about 20°C to form The reaction product mixture of compound 1C. In some aspects, the solvent is a polar aprotic solvent. R 1 and R 2 and polar aprotic solvents are as described elsewhere herein. In some aspects, the reducing agent is a borohydride compound, such as sodium borohydride NaBH 4 . The pH value of the reaction product mixture is adjusted to about 1 with an inorganic acid (eg, HCl), and the adjusted reaction product mixture is stirred at a certain temperature, for example, for at least 1 hour or at least 4 hours. The phases were separated, and the lower aqueous phase was removed, leaving the organic phase containing compound 1C. The aqueous phase can be washed at least once again with a polar aprotic solvent (such as ethyl acetate) as described elsewhere herein. The combined organic phases containing compound 1C can be washed one or more times with an inorganic base aqueous solution (eg sodium bicarbonate or potassium bicarbonate) and/or saline solution (eg NaCl). The washed organic phase is combined with a non-polar solvent (such as n-heptane) having a dielectric constant of less than 2 as described elsewhere herein, and then distilled under reduced pressure at a temperature below about 70°C. A further non-polar solvent can be added, and the mixture is cooled to below about 20°C, such as from about -5°C to about 5°C. The solid compound 1C can be separated from the slurry by techniques known in the art as described elsewhere herein. The separated solids are optionally washed with anti-solvent, and then optionally dried by techniques known in the art described elsewhere herein. The yield of compound 1C based on compound 1B is at least 70%, at least 75%, or at least 80%, for example 80%. The purity as measured by the HPLC method described elsewhere herein is at least 98% or at least 99%, such as about 99% or about 99.4%.

在第三步驟中,化合物1C、化合物8、催化劑及鹼根據以下在溶劑中反應以形成化合物1:

Figure 02_image047
。In the third step, compound 1C, compound 8, catalyst and base are reacted in a solvent according to the following to form compound 1:
Figure 02_image047
.

形成包含化合物1C、化合物8、溶劑、催化劑及鹼之反應混合物,且在約65℃至約90℃、約70℃至約85℃、或約75℃至約80℃之溫度下反應以形成包含化合物1之反應產物混合物。在一些態樣中,溶劑係介電常數大於2之非極性溶劑。R1 及R2 、鹼及非極性溶劑如本文其他地方所述。在一些態樣中,溶劑包含或係1,4-二噁烷。在一些態樣中,鹼係無機鹼,或選自碳酸氫鉀及碳酸氫鈉。在一些態樣中,催化劑係鈀催化劑,諸如(但不限於)Pd(dppf)Cl2 。持續反應直至藉由如本文其他地方所述之HPLC所量測化合物1C含量小於5%。在反應完成之後,可蒸餾反應產物混合物以減小體積,且使包含化合物1之所得濃縮物與水及介電常數大於2之非極性溶劑(例如MTBE)組合。使各相分離,且移除下層水相,留下包含化合物1之有機相。水相可再用介電常數大於2之非極性溶劑(例如MTBE)洗滌至少一次。將合併之有機相與如本文其他地方所述之具有小於2之介電常數之非極性反溶劑(例如正庚烷)混合,之後在低於約70℃之溫度下減壓蒸餾以減小體積。可再進行至少一次非極性反溶劑添加及蒸餾步驟。可再添加非極性溶劑(例如DCM),且使混合物冷卻至低於約40℃,諸如約20℃至約35℃。固體化合物1可藉由如本文其他地方所述之此項技術中已知的技術自漿料分離。分離之固體可視情況用反溶劑及介電常數大於2之非極性溶劑洗滌。化合物1接著可視情況藉由本文其他地方所述之此項技術中已知的技術乾燥。以化合物1C計化合物1產率係至少70%或至少75%,例如75%或78%。如藉由本文其他地方所述之HPLC方法所量測之純度係至少97%、至少98%或至少98.5%,諸如約98%或約98.7%。Forming a reaction mixture comprising Compound 1C, Compound 8, solvent, catalyst, and base, and reacting at a temperature of about 65°C to about 90°C, about 70°C to about 85°C, or about 75°C to about 80°C to form an inclusion The reaction product mixture of compound 1. In some aspects, the solvent is a non-polar solvent with a dielectric constant greater than 2. R 1 and R 2 , the base and the non-polar solvent are as described elsewhere herein. In some aspects, the solvent comprises or is 1,4-dioxane. In some aspects, the base is an inorganic base, or is selected from potassium bicarbonate and sodium bicarbonate. In some aspects, the catalyst is a palladium catalyst, such as (but not limited to) Pd(dppf)Cl 2 . The reaction was continued until the compound 1C content was less than 5% as measured by HPLC as described elsewhere herein. After the reaction is complete, the reaction product mixture can be distilled to reduce the volume, and the resulting concentrate containing Compound 1 is combined with water and a non-polar solvent (eg, MTBE) having a dielectric constant greater than 2. The phases were separated, and the lower aqueous phase was removed, leaving the organic phase containing Compound 1. The aqueous phase can be washed at least once again with a non-polar solvent (eg MTBE) having a dielectric constant greater than 2. Mix the combined organic phase with a non-polar anti-solvent (such as n-heptane) having a dielectric constant of less than 2 as described elsewhere herein, and then distill under reduced pressure at a temperature below about 70°C to reduce the volume . At least one more non-polar anti-solvent addition and distillation steps can be performed. A non-polar solvent (eg, DCM) may be added, and the mixture is cooled to below about 40°C, such as from about 20°C to about 35°C. Solid compound 1 can be separated from the slurry by techniques known in the art as described elsewhere herein. The separated solid can be washed with anti-solvent and non-polar solvent with a dielectric constant greater than 2 as appropriate. Compound 1 is then optionally dried by techniques known in the art described elsewhere herein. The yield of compound 1 based on compound 1C is at least 70% or at least 75%, for example 75% or 78%. The purity as measured by the HPLC method described elsewhere herein is at least 97%, at least 98%, or at least 98.5%, such as about 98% or about 98.7%.

在一些態樣中,化合物10A係如下化合物10A(i),2-氯-5-甲基異菸酸:

Figure 02_image049
。In some aspects, compound 10A is the following compound 10A(i), 2-chloro-5-methylisonicotinic acid:
Figure 02_image049
.

在一些態樣中,化合物10B係如下化合物10B(i),2-氯-5-甲基異菸酸甲酯:

Figure 02_image051
。In some aspects, compound 10B is the following compound 10B(i), 2-chloro-5-methyl isonicotinic acid methyl ester:
Figure 02_image051
.

在一些態樣中,化合物10C係如下化合物10C(i),(2-氯-5-甲基吡啶-4-基)甲醇:

Figure 02_image053
。In some aspects, compound 10C is the following compound 10C(i), (2-chloro-5-methylpyridin-4-yl)methanol:
Figure 02_image053
.

以下化合物8可如下由化合物8A 5-溴-2-碘嘧啶來製備:藉由引入三氟甲基以形成化合物8(b) (5-溴-2-(三氟甲基)嘧啶),其又根據圖2中所示之二步驟方法且進一步參考如下實例轉換為

Figure 108105242-A0101-12-0030-1
酸酯化合物8:
Figure 02_image055
。The following compound 8 can be prepared from compound 8A 5-bromo-2-iodopyrimidine as follows: by introducing trifluoromethyl to form compound 8(b) (5-bromo-2-(trifluoromethyl)pyrimidine), which According to the two-step method shown in FIG. 2 and further referring to the following example, it is converted to
Figure 108105242-A0101-12-0030-1
Ester compound 8:
Figure 02_image055
.

極性非質子溶劑在本文其他地方加以描述。在一些態樣中,用於步驟1之溶劑包含或係DMF,且用於步驟2之溶劑包含或係THF。Polar aprotic solvents are described elsewhere in this article. In some aspects, the solvent used in Step 1 contains or is DMF, and the solvent used in Step 2 contains or is THF.

在本發明之一些態樣中,化合物4(a) (2S,4R,5S)-1-(第三丁氧基羰基)-4-氟-5-甲基吡咯啶-2-甲酸可由化合物4A根據圖3中所示之7步驟方法且進一步參考實例來製備。In some aspects of the invention, compound 4(a) (2S,4R,5S)-1-(third butoxycarbonyl)-4-fluoro-5-methylpyrrolidine-2-carboxylic acid can be obtained from compound 4A It was prepared according to the 7-step method shown in FIG. 3 and with further reference to the examples.

化合物Chemical compound (I)(I) 之多晶型物及製備方法Polymorph and preparation method

本文提供化合物(I)之結晶型式(例如化合物I(a))及包含化合物(I)之結晶型式之醫藥組合物。化合物(I)之某些結晶多晶型鹽亦在本發明之範疇內。已發現,化合物(I)之結晶型式可製備成一或多種多晶型式,包括水合物、溶劑合物及鹽型式。此等多晶型式與先前技術非晶型式相比展現新穎物理特性,其可用以獲得新穎藥理學特性且可用於藥物物質及藥品研發中。更特定言之,化合物(I)之結晶型式及其藥物組合物適用於預防、改善或治療藉由TRPA1介導之疾病。Provided herein are crystalline forms of compound (I) (eg, compound I(a)) and pharmaceutical compositions comprising the crystalline forms of compound (I). Certain crystalline polymorphic salts of compound (I) are also within the scope of the present invention. It has been found that the crystal form of compound (I) can be prepared in one or more polymorphic forms, including hydrate, solvate and salt forms. These polymorphic forms exhibit novel physical properties compared to prior art amorphous forms, which can be used to obtain novel pharmacological properties and can be used in the development of pharmaceutical substances and drugs. More specifically, the crystalline form of Compound (I) and its pharmaceutical composition are suitable for preventing, ameliorating, or treating diseases mediated by TRPA1.

與化合物(I)游離鹼之非晶型式相反,結晶型式之特徵為在經結晶型式量測之粉末X射線繞射(PXRD)圖案中存在可觀察到的峰。本文中報導之鹽及結晶型式之量測或計算之PXRD圖案表示可相比於其他以實驗方式測定之圖案以發現匹配之指紋圖譜。各別結晶型式之一致性已藉由以實驗方式測定之PXRD圖案與本文中報導之結晶型式之PXRD圖案之重疊或匹配確定。在各種實施例中,鹽及結晶型式之特徵為展現此處報導之PXRD峰中之至少一者。因此,在各種實施例中,鹽或結晶型式之特徵為來自各別PXRD圖案之兩個或更多個峰之匹配、3個或更多個峰之匹配、4個或更多個峰之匹配、或5個或更多個峰之匹配等。Contrary to the amorphous form of the compound (I) free base, the crystalline form is characterized by the presence of observable peaks in the powder X-ray diffraction (PXRD) pattern measured by the crystalline form. The measured or calculated PXRD patterns of the salt and crystal types reported herein represent fingerprint patterns that can be compared to other experimentally determined patterns to find matching fingerprints. The consistency of the individual crystalline patterns has been determined by the overlapping or matching of the PXRD patterns determined experimentally and the PXRD patterns of the crystalline patterns reported herein. In various embodiments, the salt and crystal forms are characterized by exhibiting at least one of the PXRD peaks reported here. Therefore, in various embodiments, the salt or crystalline pattern is characterized by a match of two or more peaks, a match of 3 or more peaks, a match of 4 or more peaks, or 5 from each PXRD pattern Matching of one or more peaks, etc.

在一些實施例中,本文所述化合物(I)之鹽或結晶型式中之任一者之結晶度百分比可根據化合物(I)之總量而變化。詳言之,某些實施例提供至少10%、至少20%、至少30%、至少40%、至少50%、至少60%、至少70%、至少80%、至少90%、至少95%或至少99%之化合物(I)之鹽或結晶型式之結晶度百分比。在一些實施例中,結晶度百分比可為實質上100%,其中實質上100%指示化合物(I)之全部量似乎為結晶,如可使用此項技術中已知的方法測定為最佳。因此,醫藥組合物及化合物(I)之治療有效量可包括結晶度改變之量。此等情況包括化合物(I)用作多種調配物及固體型式中之活性醫藥成分(API)之情況,包括使一定量之呈固體型式之化合物(I)相繼溶解、部分溶解或懸浮或分散於液體中之情況。In some embodiments, the percent crystallinity of any of the salts or crystal forms of Compound (I) described herein may vary according to the total amount of Compound (I). In particular, certain embodiments provide at least 10%, at least 20%, at least 30%, at least 40%, at least 50%, at least 60%, at least 70%, at least 80%, at least 90%, at least 95%, or at least 99% of the crystallinity percentage of the salt or crystal form of Compound (I). In some embodiments, the percentage of crystallinity may be substantially 100%, where substantially 100% indicates that the entire amount of compound (I) appears to be crystalline, as determined best using methods known in the art. Therefore, the therapeutically effective amount of the pharmaceutical composition and compound (I) may include an amount of change in crystallinity. Such cases include the use of compound (I) as a variety of formulations and active pharmaceutical ingredients (API) in solid form, including the sequential dissolution, partial dissolution or suspension or dispersion of a certain amount of compound (I) in solid form The situation in the liquid.

如所述,在一些實施例中,提供包含化合物(I)之API組合物,其中API組合物中之至少一部分化合物(I)呈鹽或結晶型式中之一者。舉例而言,含有化合物(I)之API組合物有至少10%、至少20%、至少30%、至少40%、至少50%、至少60%、至少70%、至少80%、至少90%、至少95%或至少99%之組合物之化合物呈鹽或結晶型式中之一者。在一些實施例中,API調配物之基本上100%之化合物(I)呈如本文所述之鹽或結晶型式。As mentioned, in some embodiments, an API composition comprising compound (I) is provided, wherein at least a portion of compound (I) in the API composition is in one of a salt or a crystalline form. For example, the API composition containing compound (I) is at least 10%, at least 20%, at least 30%, at least 40%, at least 50%, at least 60%, at least 70%, at least 80%, at least 90%, At least 95% or at least 99% of the compounds of the composition are in one of the salt or crystalline forms. In some embodiments, substantially 100% of the API formulation of compound (I) is in the salt or crystalline form as described herein.

化合物(I)之結晶型式(包括鹽及溶劑化型式)中之任一者可適用作製備醫藥組合物之API。溶劑化型式可如上文所指示適用作製備無溶劑型式中之製程中間物。化合物(I)鹽及結晶型式可用於製備適用於多種向有需要之受試者投與之途徑(包括經口)之醫藥組合物。因此,在一些實施例中,提供包含化合物(I)之結晶型式及一或多種醫藥學上可接受之賦形劑的醫藥組合物。Any of the crystalline forms (including salts and solvated forms) of Compound (I) can be used as an API for preparing a pharmaceutical composition. The solvated version can be applied as a process intermediate in the preparation of the solvent-free version as indicated above. Compound (I) salts and crystalline forms can be used to prepare pharmaceutical compositions suitable for various routes of administration (including oral) to subjects in need. Therefore, in some embodiments, a pharmaceutical composition comprising a crystalline form of compound (I) and one or more pharmaceutically acceptable excipients is provided.

在一些實施例中,化合物(I)之鹽或結晶型式包含以下之鹽或結晶型式:(1)具有PXRD圖案A之化合物(I)游離鹼水合物;(2)具有PXRD圖案E之化合物(I)游離鹼無水物;(3)具有PXRD圖案C之化合物(I)游離鹼N,N-二甲基乙醯胺溶劑合物;(4)具有PXRD圖案D之化合物(I)游離鹼苯甲醚溶劑合物;(5)具有圖案F之化合物(I)游離鹼乙醇溶劑合物;(6)具有PXRD圖案G之化合物(I)游離鹼甲苯溶劑合物;(7)具有PXRD圖案H之化合物(I)游離鹼2-丙醇溶劑合物;(8)具有PXRD圖案I之化合物(I)游離鹼1-丁醇溶劑合物;(9)具有PXRD圖案J之化合物(I)游離鹼2-甲基四氫呋喃溶劑合物;(10)具有PXRD圖案K之化合物(I)游離鹼四氫呋喃溶劑合物;(11)具有PXRD圖案L之化合物(I)異丁醇溶劑合物;(12)具有PXRD圖案M之化合物(I)DMSO溶劑合物;(13)具有共晶體PXRD圖案A之化合物(I)無水龍膽酸共晶體;(14)具有共晶體PXRD圖案B之化合物(I)無水龍膽酸共晶體;(15)具有共晶體PXRD圖案C之化合物(I)水合吡啶甲醯胺共晶體;(16)具有PXRD圖案AL之化合物(I)游離鹼無水物;(17)具有PXRD圖案BO之化合物(I)游離鹼水合物;(18)化合物(I)游離鹼正庚烷溶劑合物PXRD圖案BP;(19)化合物(I)游離鹼2-戊醇溶劑合物PXRD圖案BK;(20)化合物(I)游離鹼1-丙醇溶劑合物PXRD圖案AX;(21)化合物(I)游離鹼間二甲苯溶劑合物PXRD圖案Q;(22)化合物(I)游離鹼2-甲氧基乙醇溶劑合物PXRD圖案P;及(23)化合物(I)游離鹼第二丁基乙醇溶劑合物PXRD圖案AQ。In some embodiments, the salt or crystalline form of compound (I) includes the following salt or crystalline form: (1) compound with PXRD pattern A (I) free base hydrate; (2) compound with PXRD pattern E ( I) Free base anhydrous; (3) Compound with PXRD pattern C (I) Free base N,N-dimethylacetamide solvate; (4) Compound with PXRD pattern D (I) Free base benzene Methyl ether solvate; (5) compound with pattern F (I) free base ethanol solvate; (6) compound with PXRD pattern G (I) free base toluene solvate; (7) with PXRD pattern H Compound (I) free base 2-propanol solvate; (8) compound with PXRD pattern I (I) free base 1-butanol solvate; (9) compound with PXRD pattern J (I) free Base 2-methyltetrahydrofuran solvate; (10) Compound with PXRD pattern K (I) Free base tetrahydrofuran solvate; (11) Compound with PXRD pattern L (I) Isobutanol solvate; (12 ) Compound with PXRD pattern M (I) DMSO solvate; (13) Compound with eutectic PXRD pattern A (I) Anhydrogen gentisic acid co-crystal; (14) Compound with eutectic PXRD pattern B (I) Anhydrous gentisic acid co-crystal; (15) compound with co-crystal PXRD pattern C (I) hydrated pyridine-carboxamide co-crystal; (16) compound with PXRD pattern AL (I) free base anhydrous; (17) with PXRD pattern BO compound (I) free base hydrate; (18) compound (I) free base n-heptane solvate PXRD pattern BP; (19) compound (I) free base 2-pentanol solvate PXRD pattern BK; (20) Compound (I) free base 1-propanol solvate PXRD pattern AX; (21) Compound (I) free base m-xylene solvate PXRD pattern Q; (22) Compound (I) free base 2-Methoxyethanol solvate PXRD pattern P; and (23) Compound (I) free base second butyl ethanol solvate PXRD pattern AQ.

基於某些屬性且在一些態樣中,結晶化合物I(a)游離鹼無水物E型係較佳多晶型式。舉例而言,E型,其係僅有的發現之無水物。研磨評估指示E型在噴射研磨之後不形成任何明顯的非晶材料。當藉由XRPD及HPLC評估時,E型展示在80℃ (密閉)/24小時、25℃/60% RH/6天及40℃/75% RH/6天之條件下之良好物理及化學穩定性。此外,E型在25℃下DVS評估之後展示無型式改變。此外,E型產生可藉由在室溫下在DCM/正庚烷中反溶劑結晶而容易按比例增加。Based on certain attributes and in some aspects, the crystalline Compound I(a) free base anhydrous E form is the preferred polymorphic form. For example, the E type is the only anhydrous found. The grinding evaluation indicates that the E-type does not form any significant amorphous material after jet grinding. When evaluated by XRPD and HPLC, Type E exhibits good physical and chemical stability under conditions of 80°C (sealed)/24 hours, 25°C/60% RH/6 days and 40°C/75% RH/6 days Sex. In addition, Type E showed no type change after DVS evaluation at 25°C. In addition, Form E production can be easily scaled up by anti-solvent crystallization in DCM/n-heptane at room temperature.

在本文所述方法之某些實施例中,化合物(I)之溶劑合物型式可藉由使化合物暴露於連續溶劑中以便形成化合物(I)晶體而獲得。舉例而言,但不限於,可將化合物(I)溶解於第一溶劑(例如二氯甲烷)中,且接著藉由添加反溶劑(例如正庚烷)誘發結晶。在多個態樣中之任一者中,晶體可藉由此項技術中已知的技術分離,包括過濾、離心及沈澱。分離之晶體可視情況用反溶劑洗滌且接著乾燥。乾燥可藉由此項技術中已知的技術進行,包括在諸如約35℃至約60℃之高溫下真空乾燥。In certain embodiments of the methods described herein, the solvate version of compound (I) can be obtained by exposing the compound to a continuous solvent to form crystals of compound (I). For example, but not limited to, compound (I) may be dissolved in a first solvent (such as dichloromethane), and then crystallization is induced by adding an anti-solvent (such as n-heptane). In any of a number of aspects, crystals can be separated by techniques known in the art, including filtration, centrifugation, and Shendian. The separated crystals are optionally washed with anti-solvent and then dried. Drying can be performed by techniques known in the art, including vacuum drying at high temperatures such as about 35°C to about 60°C.

化合物(I)(例如化合物I(a))游離鹼無水物E型可由化合物(I)游離鹼於二氯甲烷(DCM)中之溶液製備。溶液中之化合物(I)濃度在室溫下適當地係至少50 g/L,諸如約200 g/L、約150 g/L、約300 g/L、約350 g/L或約400 g/L及其範圍,諸如約200 g/L至約400 g/L或約250 g/L至約350 g/L。接著以如下DCM與正庚烷之體積:體積比添加正庚烷:約1:2、約1:2.5、約1:3、約1:3.5、約1:4或約1:5及其範圍,諸如約1:2至約1:5、或約1:2.5至約1:3.5。可視情況添加化合物(I) E型晶種以誘導及/或增強結晶。Compound (I) (eg Compound I(a)) free base anhydrous form E can be prepared from a solution of compound (I) free base in dichloromethane (DCM). The concentration of compound (I) in the solution is suitably at least 50 g/L at room temperature, such as about 200 g/L, about 150 g/L, about 300 g/L, about 350 g/L, or about 400 g/ L and its range, such as about 200 g/L to about 400 g/L or about 250 g/L to about 350 g/L. Then add n-heptane in the following volume of DCM and n-heptane: volume ratio: about 1:2, about 1:2.5, about 1:3, about 1:3.5, about 1:4 or about 1:5 and its range , Such as about 1:2 to about 1:5, or about 1:2.5 to about 1:3.5. E-type seeds of Compound (I) may be added as appropriate to induce and/or enhance crystallization.

視情況,結晶化合物(I)(例如化合物I(a))游離鹼無水物E型可藉由固相轉變製備。在一種此類態樣中,E型可藉由加熱固體化合物(I)游離鹼苯甲醚D型溶劑合物至大於約100℃,諸如約110℃來製備。在另一此類態樣中,E型可藉由加熱固體化合物(I)游離鹼乙醇F型溶劑合物至大於約100℃,諸如約105℃來製備。在另一此類態樣中,E型可藉由加熱固體化合物(I)游離鹼甲苯G型溶劑合物至大於約100℃,諸如約110℃來製備。在另一此類態樣中,E型可藉由加熱固體化合物(I)游離鹼2-丙醇H型溶劑合物至大於約110℃,諸如約125℃來製備。Optionally, crystalline compound (I) (for example, compound I(a)) free base anhydrous form E can be prepared by solid phase transformation. In one such aspect, Form E can be prepared by heating the solid compound (I) free base anisole form D solvate to greater than about 100°C, such as about 110°C. In another such aspect, Form E can be prepared by heating the solid compound (I) free base ethanol Type F solvate to greater than about 100°C, such as about 105°C. In another such aspect, Form E can be prepared by heating the solid compound (I) free base toluene type G solvate to greater than about 100°C, such as about 110°C. In another such aspect, Form E can be prepared by heating the solid compound (I) free base 2-propanol form H solvate to greater than about 110°C, such as about 125°C.

在結晶化合物I(a)係指定為E型之游離鹼無水物之態樣中,E型可根據XRPD分析中之特徵峰鑑別。在一種此類態樣中,E型展現之XRPD圖案具有在如下以2θ度表示之角度處之特徵峰:7.5°±0.2°、8.2°±0.2°、12.6°±0.2°、13.1°±0.2°、13.4°±0.2°、14.7°±0.2°、15.1°±0.2°、15.5°±0.2°、16.1°±0.2°、16.6°±0.2°、18.2°±0.2°、18.9°±0.2°、19.9°±0.2°、20.4°±0.2°、21.0°±0.2°、21.5°±0.2°、21.8°±0.2°、22.4°±0.2°、22.7°±0.2°、24.3°±0.2°、25.0°±0.2°、25.4°±0.2°及28.4°±0.2°。E型之吸熱峰(開始)測定為147.0℃。在另一態樣中,E型游離鹼無水物展現實質上與圖10一致之XRPD圖案。在另一態樣中,E型展現實質上與圖11一致之TGA及DSC光譜曲線。在另一態樣中,E型展現實質上與圖12一致之NMR光譜。在另一態樣中,E型展現實質上與圖13一致之DVS等溫圖。In the state where the crystalline compound I(a) is designated as the free base anhydrous of type E, the type E can be identified according to the characteristic peak in the XRPD analysis. In one such aspect, the XRPD pattern exhibited by the Type E has characteristic peaks at angles expressed as 2θ degrees as follows: 7.5°±0.2°, 8.2°±0.2°, 12.6°±0.2°, 13.1°±0.2 °, 13.4°±0.2°, 14.7°±0.2°, 15.1°±0.2°, 15.5°±0.2°, 16.1°±0.2°, 16.6°±0.2°, 18.2°±0.2°, 18.9°±0.2°, 19.9°±0.2°, 20.4°±0.2°, 21.0°±0.2°, 21.5°±0.2°, 21.8°±0.2°, 22.4°±0.2°, 22.7°±0.2°, 24.3°±0.2°, 25.0° ±0.2°, 25.4°±0.2° and 28.4°±0.2°. The endothermic peak (start) of type E was determined to be 147.0°C. In another aspect, the E-type free base anhydrate exhibits an XRPD pattern that is substantially consistent with FIG. 10. In another aspect, the E type exhibits TGA and DSC spectral curves that are substantially consistent with FIG. 11. In another aspect, Type E exhibits an NMR spectrum that is substantially consistent with FIG. 12. In another aspect, the E-type exhibits a DVS isotherm that is substantially consistent with FIG. 13.

結晶化合物(I)游離鹼水合物A型可由溶液製備,其係在60℃下,由E形或非晶材料依125 mg/mL溶解於甲醇中,之後添加5-20% (v/v)水,及接著冷卻至10℃。接著經由真空過濾收集固體,且在環境室溫及壓力下乾燥。The crystalline compound (I) free base hydrate form A can be prepared from a solution, which is dissolved at 60°C from an E-shaped or amorphous material at 125 mg/mL in methanol, after which 5-20% (v/v) is added Water, and then cooled to 10°C. The solid was then collected by vacuum filtration and dried at ambient room temperature and pressure.

在結晶化合物I(a)係游離鹼水合物A型之態樣中,其可根據XRPD分析中之特徵峰鑑別。在一種此類態樣中,A型展現之XRPD圖案具有在如下以2θ度表示之角度處之特徵峰:7.2°±0.2°、12.2°±0.2°、14.0°±0.2°、14.2°±0.2°、15.5°±0.2°、15.8°±0.2°、17.0°±0.2°、17.2°±0.2°、18.4°±0.2°、21.3°±0.2°、21.6°±0.2°、22.2°±0.2°、23.4°±0.2°、24.4°±0.2°及25.2°±0.2°。A型之吸熱峰(開始)測定為98.0℃。在另一態樣中,A型游離鹼水合物展現實質上與圖6一致之XRPD圖案。在另一態樣中,A型展現實質上與圖7一致之TGA及DSC光譜曲線。在另一態樣中,A型展現實質上與圖8一致之NMR光譜。在另一態樣中,A型展現實質上與圖9一致之DVS等溫圖。In the aspect that the crystalline compound I(a) is a form of free base hydrate A, it can be identified according to the characteristic peak in XRPD analysis. In one such aspect, the XRPD pattern exhibited by Type A has characteristic peaks at angles expressed as 2θ degrees as follows: 7.2°±0.2°, 12.2°±0.2°, 14.0°±0.2°, 14.2°±0.2 °, 15.5°±0.2°, 15.8°±0.2°, 17.0°±0.2°, 17.2°±0.2°, 18.4°±0.2°, 21.3°±0.2°, 21.6°±0.2°, 22.2°±0.2°, 23.4°±0.2°, 24.4°±0.2° and 25.2°±0.2°. The endothermic peak (start) of type A was determined to be 98.0°C. In another aspect, Type A free base hydrate exhibits an XRPD pattern substantially consistent with FIG. 6. In another aspect, Type A exhibits TGA and DSC spectral curves that are substantially consistent with FIG. 7. In another aspect, Type A exhibits an NMR spectrum that is substantially consistent with FIG. 8. In another aspect, Type A exhibits a DVS isotherm that is substantially consistent with FIG. 9.

結晶化合物(I)游離鹼N,N-二甲基乙醯胺(DMAc)溶劑合物C型可由化合物(I)於中DMAc之溶液藉由添加水反溶劑來製備。視情況,C型晶體可藉由自溶液蒸發DMAc及/或藉由使溶液冷卻至低於約10℃,諸如約0℃至約5℃來製備。可視情況添加化合物(I) DMAc溶劑合物C型晶種以誘導及/或增強結晶。The crystalline compound (I) free base N,N-dimethylacetamide (DMAc) solvate form C can be prepared from a solution of compound (I) in DMAc by adding a water antisolvent. Optionally, type C crystals can be prepared by evaporating DMAc from the solution and/or by cooling the solution below about 10°C, such as from about 0°C to about 5°C. Optionally, Compound (I) DMAc solvate C-type seeds are added to induce and/or enhance crystallization.

在結晶化合物I(a)係DMAc溶劑合物C型之態樣中,其可根據XRPD分析中之特徵峰鑑別。在一種此類態樣中,C型展現之XRPD圖案具有在如下以2θ度表示之角度處之特徵峰:10.8°±0.2°、12.1°±0.2°、12.3°±0.2°、13.6°±0.2°、13.8°±0.2°、14.9°±0.2°、16.0°±0.2°、16.2°±0.2°、17.1°±0.2°、18.2°±0.2°、21.2°±0.2°、21.5°±0.2°、22.4°±0.2°、21.2°±0.2°、23.5°±0.2°、24.2°±0.2°、25.2°±0.2°、27.2°±0.2°及27.9°±0.2°。C型之吸熱峰(開始)測定為100.4℃。在另一態樣中,C型DMAc溶劑合物展現實質上與圖25一致之XRPD圖案。在另一態樣中,C型展現實質上與圖26一致之TGA及DSC光譜曲線。在另一態樣中,C型展現實質上與圖27一致之NMR光譜。In the aspect that the crystalline compound I(a) is the DMAc solvate form C, it can be identified according to the characteristic peak in the XRPD analysis. In one such aspect, the XRPD pattern exhibited by Type C has characteristic peaks at angles expressed as 2θ degrees as follows: 10.8°±0.2°, 12.1°±0.2°, 12.3°±0.2°, 13.6°±0.2 °, 13.8°±0.2°, 14.9°±0.2°, 16.0°±0.2°, 16.2°±0.2°, 17.1°±0.2°, 18.2°±0.2°, 21.2°±0.2°, 21.5°±0.2°, 22.4°±0.2°, 21.2°±0.2°, 23.5°±0.2°, 24.2°±0.2°, 25.2°±0.2°, 27.2°±0.2° and 27.9°±0.2°. The endothermic peak (start) of type C was determined to be 100.4°C. In another aspect, the C-type DMAc solvate exhibits an XRPD pattern that is substantially consistent with FIG. 25. In another aspect, Type C exhibits TGA and DSC spectral curves that are substantially consistent with FIG. 26. In another aspect, Form C exhibits an NMR spectrum that is substantially consistent with FIG. 27.

結晶化合物(I) (例如化合物I(a))游離鹼苯甲醚溶劑合物D型可由化合物(I)於苯甲醚中之溶液苯甲醚添加正庚烷反溶劑來製備。在一些態樣中,可使化合物(I)於苯甲醚中之溶液與正庚烷蒸氣接觸以形成水。視情況,D型晶體可藉由自溶液蒸發苯甲醚及/或藉由使溶液冷卻至低於約10℃,諸如約0℃至約5℃來製備。可視情況添加化合物(I)苯甲醚溶劑合物D型晶種以誘導及/或增強結晶。The crystalline compound (I) (for example, compound I(a)) free base anisole solvate Form D can be prepared from a solution of compound (I) in anisole by adding anisole in n-heptane antisolvent. In some aspects, a solution of compound (I) in anisole can be contacted with n-heptane vapor to form water. Optionally, D-type crystals can be prepared by evaporating anisole from the solution and/or by cooling the solution to below about 10°C, such as from about 0°C to about 5°C. The anisole solvate D-type seeds of compound (I) may be added as appropriate to induce and/or enhance crystallization.

在結晶化合物I(a)係指定為D型之游離鹼苯甲醚溶劑合物之態樣中,其可根據XRPD分析中之特徵峰鑑別。在一種此類態樣中,D型展現之XRPD圖案具有在如下以2θ度表示之角度處之特徵峰:5.7°±0.2°、12.8°±0.2°、15.4°±0.2°、17.1°±0.2°、18.1°±0.2°及20.8°±0.2°。D型之吸熱峰(開始)測定為94.9℃。在另一態樣中,D型苯甲醚溶劑合物展現實質上與圖28一致之XRPD圖案。在另一態樣中,D型展現實質上與圖29一致之TGA及DSC光譜曲線。在另一態樣中,D型展現實質上與圖30一致之NMR光譜。In the state where the crystalline compound I(a) is designated as the free base anisole solvate of type D, it can be identified according to the characteristic peak in the XRPD analysis. In one such aspect, the XRPD pattern exhibited by the D pattern has characteristic peaks at angles expressed as 2θ degrees as follows: 5.7°±0.2°, 12.8°±0.2°, 15.4°±0.2°, 17.1°±0.2 °, 18.1°±0.2° and 20.8°±0.2°. The endothermic peak (start) of type D was determined to be 94.9°C. In another aspect, the D-anisole solvate exhibits an XRPD pattern substantially consistent with FIG. 28. In another aspect, the D-type exhibits TGA and DSC spectral curves that are substantially consistent with FIG. 29. In another aspect, the D-form exhibits an NMR spectrum that is substantially consistent with FIG. 30.

結晶化合物(I)(例如化合物I(a))游離鹼乙醇溶劑合物F型可由化合物(I)於乙醇中之溶液藉由添加正庚烷反溶劑來製備。視情況,F型晶體可藉由自溶液蒸發乙醇及/或藉由使溶液冷卻至低於約10℃,諸如約0℃至約5℃來製備。可視情況添加化合物(I)乙醇溶劑合物F型晶種以誘導及/或增強結晶。The crystalline Compound (I) (eg Compound I(a)) free base ethanol solvate Form F can be prepared from a solution of Compound (I) in ethanol by adding n-heptane antisolvent. Optionally, type F crystals can be prepared by evaporating ethanol from the solution and/or by cooling the solution to below about 10°C, such as from about 0°C to about 5°C. Optionally, the compound (I) ethanol solvate F-type seed crystal is added to induce and/or enhance crystallization.

在結晶化合物I(a)係指定為F型之游離鹼乙醇溶劑合物之態樣中,其可根據XRPD分析中之特徵峰鑑別。在一種此類態樣中,F型展現之XRPD圖案具有在如下以2θ度表示之角度處之特徵峰:11.7°±0.2°、12.9°±0.2°、13.3°±0.2°、17.4°±0.2°、18.5°±0.2°、19.4°±0.2°、23.5°±0.2°、24.3°±0.2°及25.9°±0.2°。F型之吸熱峰(開始)測定為100.3℃及36.4℃。在另一態樣中,F型游離鹼乙醇溶劑合物展現實質上與圖32一致之XRPD圖案。在另一態樣中,F型展現實質上與圖33一致之TGA及DSC光譜曲線。在另一態樣中,F型展現實質上與圖34一致之NMR光譜。In the state where the crystalline compound I(a) is designated as the free base ethanol solvate of type F, it can be identified according to the characteristic peak in the XRPD analysis. In one such aspect, the XRPD pattern exhibited by the Type F has characteristic peaks at angles expressed as 2θ degrees as follows: 11.7°±0.2°, 12.9°±0.2°, 13.3°±0.2°, 17.4°±0.2 °, 18.5°±0.2°, 19.4°±0.2°, 23.5°±0.2°, 24.3°±0.2° and 25.9°±0.2°. The endothermic peaks (start) of type F were measured at 100.3°C and 36.4°C. In another aspect, the F-type free base ethanol solvate exhibits an XRPD pattern substantially consistent with FIG. 32. In another aspect, the F-type exhibits TGA and DSC spectral curves that are substantially consistent with FIG. 33. In another aspect, Form F exhibits an NMR spectrum that is substantially consistent with FIG. 34.

結晶化合物(I)(例如化合物I(a))游離鹼甲苯溶劑合物G型可由化合物(I)於甲苯中之溶液藉由使溶液冷卻至低於約10℃,諸如約0℃至約5℃來製備。視情況,G型晶體可藉由自溶液蒸發甲苯之後冷卻來製備。可視情況添加化合物(I)甲苯溶劑合物G型晶種以誘導及/或增強結晶。Crystalline Compound (I) (eg Compound I(a)) free base toluene solvate Form G can be prepared from a solution of Compound (I) in toluene by cooling the solution to below about 10°C, such as from about 0°C to about 5 ℃ to prepare. Optionally, G-type crystals can be prepared by evaporating toluene from the solution and then cooling. Optionally, a compound (I) toluene solvate G type seed crystal is added to induce and/or enhance crystallization.

在結晶化合物I(a)係指定為G型之游離鹼甲苯溶劑合物之態樣中,其可根據XRPD分析中之特徵峰鑑別。在一種此類態樣中,G型展現之XRPD圖案具有在如下以2θ度表示之角度處之特徵峰:13.8°±0.2°、16.7°±0.2°、17.6°±0.2°、17.8°±0.2°、18.8°±0.2°、22.5°±0.2°及25.1°±0.2°。G型之吸熱峰(開始)測定為106.3℃。在另一態樣中,G型游離鹼甲苯溶劑合物展現實質上與圖36一致之XRPD圖案。在另一態樣中,G型展現實質上與圖37一致之TGA及DSC光譜曲線。在另一態樣中,G型展現實質上與圖38一致之NMR光譜。In the aspect that the crystalline compound I(a) is designated as the free base toluene solvate of type G, it can be identified according to the characteristic peak in the XRPD analysis. In one such aspect, the XRPD pattern exhibited by the Type G has characteristic peaks at angles expressed as 2θ degrees as follows: 13.8°±0.2°, 16.7°±0.2°, 17.6°±0.2°, 17.8°±0.2 °, 18.8°±0.2°, 22.5°±0.2° and 25.1°±0.2°. The endothermic peak (start) of type G was determined to be 106.3°C. In another aspect, the G-type free base toluene solvate exhibits an XRPD pattern substantially consistent with FIG. 36. In another aspect, the G-type exhibits TGA and DSC spectral curves that are substantially consistent with FIG. 37. In another aspect, Form G exhibits an NMR spectrum that is substantially consistent with FIG. 38.

結晶化合物(I)(例如化合物I(a))游離鹼2-丙醇溶劑合物H型可由化合物(I)於MTBE中之溶液藉由添加2-丙醇反溶劑來製備。可視情況添加化合物(I)2-丙醇溶劑合物H型晶種以誘導及/或增強結晶。The crystalline Compound (I) (eg Compound I(a)) free base 2-propanol solvate Form H can be prepared from a solution of Compound (I) in MTBE by adding 2-propanol antisolvent. The compound (I) 2-propanol solvate H-type seed crystal may be added as appropriate to induce and/or enhance crystallization.

在結晶化合物I(a)係指定為H型之游離鹼2-丙醇溶劑合物之態樣中,其可根據XRPD分析中之特徵峰鑑別。在一種此類態樣中,H型展現之XRPD圖案具有在如下以2θ度表示之角度處之特徵峰:11.5°±0.2°、12.8°±0.2°、13.1°±0.2°、17.5°±0.2°、18.2°±0.2°、22.3°±0.2°、23.2°±0.2°及24.0°±0.2°。H型之吸熱峰(開始)測定為116.3℃。在另一態樣中,H型游離鹼2-丙醇溶劑合物展現實質上與圖40一致之XRPD圖案。在另一態樣中,H型展現實質上與圖41一致之TGA及DSC光譜曲線。在另一態樣中,H型展現實質上與圖42一致之NMR光譜。In the aspect that the crystalline compound I(a) is designated as the free base 2-propanol solvate of the H form, it can be identified according to the characteristic peak in the XRPD analysis. In one such aspect, the XRPD pattern exhibited by the H pattern has characteristic peaks at angles expressed as 2θ degrees as follows: 11.5°±0.2°, 12.8°±0.2°, 13.1°±0.2°, 17.5°±0.2 °, 18.2°±0.2°, 22.3°±0.2°, 23.2°±0.2° and 24.0°±0.2°. The endothermic peak (start) of the H type was determined to be 116.3°C. In another aspect, the H-type free base 2-propanol solvate exhibits an XRPD pattern substantially consistent with FIG. 40. In another aspect, the H-type exhibits TGA and DSC spectral curves that are substantially consistent with FIG. 41. In another aspect, the H-form exhibits an NMR spectrum that is substantially consistent with FIG. 42.

結晶化合物(I)(例如化合物I(a))游離鹼1-丁醇溶劑合物I型可在大於約35℃,諸如約40℃、約50℃或約60℃之溫度下由A型晶體之漿料來製備。可視情況添加化合物(I)1-丙醇溶劑合物I型晶種以誘導及/或增強結晶。The crystalline Compound (I) (eg Compound I(a)) free base 1-butanol solvate Form I can be crystallized from Form A at a temperature greater than about 35°C, such as about 40°C, about 50°C or about 60°C The slurry is prepared. Compound (I) 1-propanol solvate type I seeds may be added as appropriate to induce and/or enhance crystallization.

在結晶化合物I(a)係指定為I型之游離鹼1-丁醇溶劑合物之態樣中,其可根據XRPD分析中之特徵峰鑑別。在一種此類態樣中,I型展現之XRPD圖案具有在如下以2θ度表示之角度處之特徵峰:12.0°±0.2°、12.4°±0.2°、12.6°±0.2°、13.3°±0.2°、14.0°±0.2°、15.1°±0.2°、17.2°±0.2°、17.9°±0.2°、18.3°±0.2°、19.7°±0.2°、19.9°±0.2°、23.1°±0.2°、24.3°±0.2°、25.4°±0.2°、25.9°±0.2°及27.3°±0.2°。I型之吸熱峰(開始)測定為90.0℃。在另一態樣中,I型游離鹼1-丁醇溶劑合物展現實質上與圖44一致之XRPD圖案。在另一態樣中,I型展現實質上與圖45一致之TGA及DSC光譜曲線。在另一態樣中,I型展現實質上與圖46一致之NMR光譜。In the state where the crystalline compound I(a) is designated as the free base 1-butanol solvate of type I, it can be identified according to the characteristic peak in the XRPD analysis. In one such aspect, the XRPD pattern exhibited by Type I has characteristic peaks at angles expressed as 2θ degrees as follows: 12.0°±0.2°, 12.4°±0.2°, 12.6°±0.2°, 13.3°±0.2 °, 14.0°±0.2°, 15.1°±0.2°, 17.2°±0.2°, 17.9°±0.2°, 18.3°±0.2°, 19.7°±0.2°, 19.9°±0.2°, 23.1°±0.2°, 24.3°±0.2°, 25.4°±0.2°, 25.9°±0.2° and 27.3°±0.2°. The endothermic peak (start) of type I was determined to be 90.0°C. In another aspect, the Type I free base 1-butanol solvate exhibits an XRPD pattern substantially consistent with FIG. 44. In another aspect, Type I exhibits TGA and DSC spectral curves that are substantially consistent with FIG. 45. In another aspect, Type I exhibits an NMR spectrum that is substantially consistent with FIG. 46.

結晶化合物(I)(例如化合物I(a))游離鹼2-甲基四氫呋喃(MeTHF)溶劑合物J型可在約室溫下由A型晶體於MeTHF及正庚烷中之漿料來製備。MeTHF與正庚烷之適合體積比係約1:1.1至約1:5,諸如約1:1.15、1:2、1:2.5或1:3。可視情況添加化合物(I) MeTHF溶劑合物J型晶種以誘導及/或增強結晶。Crystalline compound (I) (eg compound I(a)) free base 2-methyltetrahydrofuran (MeTHF) solvate Form J can be prepared from a slurry of Form A crystals in MeTHF and n-heptane at about room temperature . A suitable volume ratio of MeTHF to n-heptane is about 1:1.1 to about 1:5, such as about 1:1.15, 1:2, 1:2.5 or 1:3. Optionally, compound (I) MeTHF solvate J-type seeds are added to induce and/or enhance crystallization.

在結晶化合物I(a)係指定為J型之游離鹼MeTHF溶劑合物之態樣中,其可根據XRPD分析中之特徵峰鑑別。在一種此類態樣中,J型展現之XRPD圖案具有在如下以2θ度表示之角度處之特徵峰:11.8°±0.2°、13.1°±0.2°、14.5°±0.2°、16.8°±0.2°、18.4°±0.2°、19.4°±0.2°、20.7°±0.2°、21.8°±0.2°、24.3°±0.2°及26.4°±0.2°。J型之吸熱峰(開始)測定為82.2℃。在另一態樣中,J型游離鹼MeTHF溶劑合物展現實質上與圖47一致之XRPD圖案。在另一態樣中,J型展現實質上與圖48一致之TGA及DSC光譜曲線。在另一態樣中,J型展現實質上與圖49一致之NMR光譜。In the aspect that the crystalline compound I(a) is designated as the J-type free base MeTHF solvate, it can be identified according to the characteristic peak in the XRPD analysis. In one such aspect, the XRPD pattern exhibited by the J pattern has characteristic peaks at angles expressed as 2θ degrees as follows: 11.8°±0.2°, 13.1°±0.2°, 14.5°±0.2°, 16.8°±0.2 °, 18.4°±0.2°, 19.4°±0.2°, 20.7°±0.2°, 21.8°±0.2°, 24.3°±0.2° and 26.4°±0.2°. The endothermic peak (start) of the J type was determined to be 82.2°C. In another aspect, the J-type free base MeTHF solvate exhibits an XRPD pattern substantially consistent with FIG. 47. In another aspect, the J-type exhibits TGA and DSC spectral curves that are substantially consistent with FIG. 48. In another aspect, the J-form exhibits an NMR spectrum that is substantially consistent with FIG. 49.

結晶化合物(I)(例如化合物I(a))游離鹼THF溶劑合物K型可在約室溫下由A型晶體於THF及正庚烷中之漿料來製備。THF與正庚烷之適合體積比係約1:1.1至約1:5,諸如約1:1.15、1:2、1:2.5或1:3。可視情況添加化合物(I) THF溶劑合物K型晶種以誘導及/或增強結晶。Crystalline Compound (I) (eg Compound I(a)) free base THF solvate form K can be prepared from a slurry of form A crystals in THF and n-heptane at about room temperature. A suitable volume ratio of THF to n-heptane is about 1:1.1 to about 1:5, such as about 1:1.15, 1:2, 1:2.5 or 1:3. Optionally, compound (I) THF solvate K-type seeds are added to induce and/or enhance crystallization.

在結晶化合物I(a)係指定為K型之游離鹼THF溶劑合物之態樣中,其可根據XRPD分析中之特徵峰鑑別。在一種此類態樣中,K型展現之XRPD圖案具有在如下以2θ度表示之角度處之特徵峰:11.0°±0.2°、12.0°±0.2°、12.4°±0.2°、12.6°±0.2°、13.3°±0.2°、13.5°±0.2°、14.1°±0.2°、14.7°±0.2°、17.2°±0.2°、18.5°±0.2°、19.5°±0.2°、20.9°±0.2°、21.4°±0.2°、21.6°±0.2°、22.0°±0.2°、22.2°±0.2°、22.9°±0.2°、24.8°±0.2°、27.1°±0.2°、27.4°±0.2°及28.3°±0.2°。K型之吸熱峰(開始)測定為86.8℃。在另一態樣中,K型游離鹼THF溶劑合物展現實質上與圖50一致之XRPD圖案。在另一態樣中,K型展現實質上與圖51一致之TGA及DSC光譜曲線。在另一態樣中,K型展現實質上與圖52一致之NMR光譜。In the state where the crystalline compound I(a) is designated as the K-type free base THF solvate, it can be identified according to the characteristic peak in the XRPD analysis. In one such aspect, the XRPD pattern exhibited by the K-type has characteristic peaks at angles expressed as 2θ degrees as follows: 11.0°±0.2°, 12.0°±0.2°, 12.4°±0.2°, 12.6°±0.2 °, 13.3°±0.2°, 13.5°±0.2°, 14.1°±0.2°, 14.7°±0.2°, 17.2°±0.2°, 18.5°±0.2°, 19.5°±0.2°, 20.9°±0.2°, 21.4°±0.2°, 21.6°±0.2°, 22.0°±0.2°, 22.2°±0.2°, 22.9°±0.2°, 24.8°±0.2°, 27.1°±0.2°, 27.4°±0.2° and 28.3° ±0.2°. The endothermic peak (start) of K-type was determined to be 86.8°C. In another aspect, the K-type free base THF solvate exhibits an XRPD pattern substantially consistent with FIG. 50. In another aspect, the K-type exhibits TGA and DSC spectral curves that are substantially consistent with FIG. 51. In another aspect, the K-type exhibits an NMR spectrum that is substantially consistent with FIG. 52.

結晶化合物(I)(例如化合物I(a))游離鹼異丁醇溶劑合物L型可在約室溫下由無水化合物(I)或A型晶體於異丁醇中之漿料來製備。可視情況添加化合物(I)異丁醇溶劑合物L型晶種以誘導及/或增強結晶。The crystalline compound (I) (eg, compound I(a)) free base isobutanol solvate L form can be prepared from a slurry of anhydrous compound (I) or form A crystals in isobutanol at about room temperature. The L-type seed crystal of compound (I) isobutanol solvate may be added as appropriate to induce and/or enhance crystallization.

在結晶化合物I(a)係指定為L型之游離鹼異丁醇溶劑合物之態樣中,其可根據XRPD分析中之特徵峰鑑別。在一種此類態樣中,L型展現之XRPD圖案具有在如下以2θ度表示之角度處之特徵峰:11.6°±0.2°、12.8°±0.2°、13.1°±0.2°、14.2°±0.2°、17.5°±0.2°、18.1°±0.2°、22.8°±0.2°、23.1°±0.2°、24.0°±0.2°及25.3°±0.2°。L型之吸熱峰(開始)測定為106.8℃。在另一態樣中,L型游離鹼異丁醇溶劑合物展現實質上與圖53一致之XRPD圖案。在另一態樣中,L型展現實質上與圖54一致之TGA及DSC光譜曲線。在另一態樣中,L型展現實質上與圖55一致之NMR光譜。In the state where the crystalline compound I(a) is designated as the L-type free base isobutanol solvate, it can be identified according to the characteristic peak in the XRPD analysis. In one such aspect, the XRPD pattern exhibited by the L-shape has characteristic peaks at angles expressed as 2θ degrees as follows: 11.6°±0.2°, 12.8°±0.2°, 13.1°±0.2°, 14.2°±0.2 °, 17.5°±0.2°, 18.1°±0.2°, 22.8°±0.2°, 23.1°±0.2°, 24.0°±0.2° and 25.3°±0.2°. The L-shaped endothermic peak (start) was measured to be 106.8°C. In another aspect, the L-type free base isobutanol solvate exhibits an XRPD pattern substantially consistent with FIG. 53. In another aspect, the L-shape exhibits TGA and DSC spectral curves that are substantially consistent with FIG. 54. In another aspect, the L-form exhibits an NMR spectrum that is substantially consistent with FIG. 55.

結晶化合物(I)(化合物I(a))游離鹼DMSO溶劑合物M型可在約室溫下由E型晶體於DMSO及水中之漿料來製備。THF與正庚烷之適合體積比係約1:2至約2:1,諸如約1:2、1:1.5、1:1、1.5:1或2:1。可視情況添加化合物(I) DMSO溶劑合物M型晶種以誘導及/或增強結晶。Crystalline Compound (I) (Compound I(a)) free base DMSO solvate Form M can be prepared from a slurry of Form E crystals in DMSO and water at about room temperature. A suitable volume ratio of THF to n-heptane is about 1:2 to about 2:1, such as about 1:2, 1:1.5, 1:1, 1.5:1 or 2:1. Optionally, the compound (I) DMSO solvate M-type seed crystal is added to induce and/or enhance crystallization.

在結晶化合物I(a)係指定為M型之游離鹼DMSO溶劑合物之態樣中,其可根據XRPD分析中之特徵峰鑑別。在一種此類態樣中,M型展現之XRPD圖案具有在如下以2θ度表示之角度處之特徵峰:12.1°±0.2°、13.4°±0.2°、14.7°±0.2°、18.4°±0.2°、20.9°±0.2°、21.5°±0.2°、24.9°±0.2°、26.8°±0.2°及27.6°±0.2°。M型之吸熱峰(開始)測定為110.7℃。在另一態樣中,M型游離鹼DMSO溶劑合物展現實質上與圖56一致之XRPD圖案。在另一態樣中,M型展現實質上與圖57一致之TGA及DSC光譜曲線。在另一態樣中,M型展現實質上與圖58一致之NMR光譜。In the state where the crystalline compound I(a) is designated as the M-type free base DMSO solvate, it can be identified according to the characteristic peak in the XRPD analysis. In one such aspect, the XRPD pattern exhibited by the M-type has characteristic peaks at angles expressed as 2θ degrees as follows: 12.1°±0.2°, 13.4°±0.2°, 14.7°±0.2°, 18.4°±0.2 °, 20.9°±0.2°, 21.5°±0.2°, 24.9°±0.2°, 26.8°±0.2° and 27.6°±0.2°. The endothermic peak (start) of the M type was determined to be 110.7°C. In another aspect, the M-type free base DMSO solvate exhibits an XRPD pattern substantially consistent with FIG. 56. In another aspect, the M-type exhibits TGA and DSC spectral curves that are substantially consistent with FIG. 57. In another aspect, the M-type exhibits an NMR spectrum that is substantially consistent with FIG. 58.

化合物(I)(例如化合物I(a))游離鹼無水物AL型可由E型晶體於EtOAc及正庚烷中之漿料來製備。EtOAc與正庚烷EtOAc適合體積比可為約2:1至約1:5,諸如約2:1、1:1、1:2、1:3、1:4或1:5。可視情況添加化合物(I) AL型晶種以誘導及/或增強結晶。結晶溫度可適當為約15℃至約60℃或約50℃至約60℃,諸如約15℃、25℃、35℃、45℃、50℃、55℃或60℃。結晶時間可為至少約12小時,諸如12小時、1天、3天、5天或更長。Compound (I) (e.g. Compound I(a)) free base anhydrous Form AL can be prepared from a slurry of Form E crystals in EtOAc and n-heptane. A suitable volume ratio of EtOAc to n-heptane EtOAc may be about 2:1 to about 1:5, such as about 2:1, 1:1, 1:2, 1:3, 1:4 or 1:5. Compound (I) AL type seed crystals may be added as appropriate to induce and/or enhance crystallization. The crystallization temperature may be suitably about 15°C to about 60°C or about 50°C to about 60°C, such as about 15°C, 25°C, 35°C, 45°C, 50°C, 55°C or 60°C. The crystallization time may be at least about 12 hours, such as 12 hours, 1 day, 3 days, 5 days, or longer.

在結晶化合物I(a)係指定為AL型之游離鹼無水物之態樣中,其可根據XRPD分析中之特徵峰鑑別。在一種此類態樣中,AL型展現之XRPD圖案具有在如下以2θ度表示之角度處之特徵峰:7.6°±0.2°、8.4°±0.2°、13.2°±0.2°、13.8°±0.2°、14.8°±0.2°、15.2°±0.2°、15.6°±0.2°、15.9°±0.2°、16.9°±0.2°、18.1°±0.2°、20.5°±0.2°及21.3°±0.2°。AL型之吸熱峰(開始)測定為93.3℃及147.5℃。在另一態樣中,M型游離鹼無水物展現實質上與圖81一致之XRPD圖案。在另一態樣中,AL型展現實質上與圖82一致之TGA及DSC光譜曲線。在另一態樣中,AL型展現實質上與圖83一致之NMR光譜。In the state where the crystalline compound I(a) is designated as the free base anhydrous of type AL, it can be identified according to the characteristic peak in the XRPD analysis. In one such aspect, the XRPD pattern exhibited by the AL type has characteristic peaks at angles expressed as 2θ degrees as follows: 7.6°±0.2°, 8.4°±0.2°, 13.2°±0.2°, 13.8°±0.2 °, 14.8°±0.2°, 15.2°±0.2°, 15.6°±0.2°, 15.9°±0.2°, 16.9°±0.2°, 18.1°±0.2°, 20.5°±0.2° and 21.3°±0.2°. The endothermic peaks (start) of the AL type were measured at 93.3°C and 147.5°C. In another aspect, the M-type free base anhydrous exhibits an XRPD pattern that is substantially consistent with FIG. 81. In another aspect, the AL type exhibits TGA and DSC spectral curves substantially consistent with FIG. 82. In another aspect, the AL type exhibits an NMR spectrum that is substantially consistent with FIG. 83.

結晶化合物(I)(例如化合物I(a))游離鹼水合物BO型可由E型晶體於甲醇及水中之溶液來製備。甲醇與水之適合體積比可為約3:1至約1:3,諸如約3:1、2:1、1:1、1:2或1:3。溶解溫度可為約30℃至約70℃或約50℃至約60℃,諸如約30℃、40℃、50℃、55℃、60℃、65℃或70℃ 結晶溫度可低於約60℃,諸如約60℃、50℃、40℃、30℃、20℃、10℃或5℃。結晶時間可為至少約12小時,諸如12小時、1天、2天、3天或更長。根據XPRD比較,根據圖84確定化合物I(a)晶體係BN型。在環境條件下乾燥BN型晶體至少約一小時之後獲得BO型。The crystalline compound (I) (for example, compound I(a)) free base hydrate BO form can be prepared from a solution of E form crystals in methanol and water. A suitable volume ratio of methanol to water may be about 3:1 to about 1:3, such as about 3:1, 2:1, 1:1, 1:2, or 1:3. The dissolution temperature may be about 30°C to about 70°C or about 50°C to about 60°C, such as about 30°C, 40°C, 50°C, 55°C, 60°C, 65°C or 70°C. The crystallization temperature may be less than about 60°C , Such as about 60 ℃, 50 ℃, 40 ℃, 30 ℃, 20 ℃, 10 ℃ or 5 ℃. The crystallization time may be at least about 12 hours, such as 12 hours, 1 day, 2 days, 3 days, or longer. Based on XPRD comparison, the BN type of the compound I(a) crystal system was determined according to FIG. 84. The BO type is obtained after drying the BN type crystals under ambient conditions for at least about one hour.

在結晶化合物I(a)係游離鹼水合物BO型之態樣中,其可根據XRPD分析中之特徵峰鑑別。在一種此類態樣中,BO型展現之XRPD圖案具有在如下以2θ度表示之角度處之特徵峰:12.1°±0.2°、12.4°±0.2°、13.9°±0.2°、15.0°±0.2°、15.4°±0.2°、17.1°±0.2°、18.3°±0.2°、21.5°±0.2°、22.1°±0.2°、24.4°±0.2°、25.1°±0.2°、26.2°±0.2°及26.3°±0.2°。BO型之吸熱峰(開始)測定為86.2℃及148.3℃,且放熱峰測定為在136.4℃處。在另一態樣中,BO型游離鹼水合物展現實質上與圖84一致之XRPD圖案。在另一態樣中,BO型展現實質上與圖85一致之TGA及DSC光譜曲線。在另一態樣中,BO型展現實質上與圖86一致之NMR光譜。In the state where the crystalline compound I(a) is the free base hydrate BO type, it can be identified according to the characteristic peak in the XRPD analysis. In one such aspect, the XRPD pattern exhibited by the BO type has characteristic peaks at angles expressed as 2θ degrees as follows: 12.1°±0.2°, 12.4°±0.2°, 13.9°±0.2°, 15.0°±0.2 °, 15.4°±0.2°, 17.1°±0.2°, 18.3°±0.2°, 21.5°±0.2°, 22.1°±0.2°, 24.4°±0.2°, 25.1°±0.2°, 26.2°±0.2° and 26.3°±0.2°. The endothermic peaks (start) of the BO type were measured at 86.2°C and 148.3°C, and the exothermic peaks were measured at 136.4°C. In another aspect, the BO-type free base hydrate exhibits an XRPD pattern substantially consistent with FIG. 84. In another aspect, the BO type exhibits TGA and DSC spectral curves that are substantially consistent with FIG. 85. In another aspect, the BO type exhibits an NMR spectrum that is substantially consistent with FIG. 86.

結晶化合物(I)(例如化合物I(a))游離鹼正庚烷溶劑合物BP型可由E型晶體於(i)乙酸異丙酯及正庚烷中之漿料,之後由E型晶體於(ii)乙酸異丁酯及正庚烷中之漿料來製備。乙酸異丙酯與正庚烷及乙酸異丁酯與正庚烷中之各者的適合體積比可為約3:1至約1:3,諸如約3:1、2:1、1:1、1:2或1:3。漿料溫度可為約30℃至約80℃或65℃至約75℃,諸如約30℃、40℃、50℃、60℃、65℃、70℃、75℃或80℃。Crystalline compound (I) (for example, compound I(a)) free base n-heptane solvate BP type can be a slurry of E-type crystals in (i) isopropyl acetate and n-heptane, followed by E-type crystals (ii) Prepared by slurry in isobutyl acetate and n-heptane. A suitable volume ratio of each of isopropyl acetate and n-heptane and isobutyl acetate and n-heptane may be about 3:1 to about 1:3, such as about 3:1, 2:1, 1:1 , 1:2 or 1:3. The slurry temperature may be about 30°C to about 80°C or 65°C to about 75°C, such as about 30°C, 40°C, 50°C, 60°C, 65°C, 70°C, 75°C or 80°C.

在結晶化合物I(a)係游離鹼正庚烷溶劑合物BP型之態樣中,其可根據XRPD分析中之特徵峰鑑別。在一種此類態樣中,BP型展現之XRPD圖案具有在如下以2θ度表示之角度處之特徵峰:8.5°±0.2°、12.9°±0.2°、17.6°±0.2°、18.1°±0.2°、19.4°±0.2°、20.8°±0.2°、21.2°±0.2°、22.9°±0.2°及24.0°±0.2°。BP型之吸熱峰(開始)測定為122.5℃及147.3℃。在另一態樣中,BP型游離鹼正庚烷溶劑合物展現實質上與圖87一致之XRPD圖案。在另一態樣中,BP型展現實質上與圖88一致之TGA及DSC光譜曲線。在另一態樣中,BP型展現實質上與圖89一致之NMR光譜。The crystalline Compound I(a) is the free base n-heptane solvate BP type, which can be identified according to the characteristic peak in XRPD analysis. In one such aspect, the XRPD pattern exhibited by the BP type has characteristic peaks at angles expressed as 2θ degrees as follows: 8.5°±0.2°, 12.9°±0.2°, 17.6°±0.2°, 18.1°±0.2 °, 19.4°±0.2°, 20.8°±0.2°, 21.2°±0.2°, 22.9°±0.2° and 24.0°±0.2°. The endothermic peaks (start) of the BP type were measured at 122.5°C and 147.3°C. In another aspect, the BP-type free base n-heptane solvate exhibits an XRPD pattern substantially consistent with FIG. 87. In another aspect, the BP type exhibits TGA and DSC spectral curves substantially consistent with FIG. 88. In another aspect, the BP type exhibits an NMR spectrum substantially consistent with FIG. 89.

結晶化合物(I)(例如化合物I(a))游離鹼2-戊醇溶劑合物BK型可由E型晶體於2-戊醇及正庚烷中之漿料來製備。乙酸異丙酯與正庚烷及乙酸異丁酯與正庚烷中之各者的適合體積比可為約4:1至約1:2,諸如約4:1、3:1、2:1、1:1或1:2。漿料溫度可為約30℃至約70℃或約45℃至約55℃,諸如約30℃、40℃、45℃、50℃、55℃、60℃或70℃。The crystalline compound (I) (for example, compound I(a)) free base 2-pentanol solvate form BK can be prepared from a slurry of form E crystals in 2-pentanol and n-heptane. A suitable volume ratio of each of isopropyl acetate and n-heptane and isobutyl acetate and n-heptane may be about 4:1 to about 1:2, such as about 4:1, 3:1, 2:1 , 1:1 or 1:2. The slurry temperature may be about 30°C to about 70°C or about 45°C to about 55°C, such as about 30°C, 40°C, 45°C, 50°C, 55°C, 60°C or 70°C.

在結晶化合物I(a)係游離鹼2-戊醇溶劑合物BK型之態樣中,其可根據XRPD分析中之特徵峰鑑別。在一種此類態樣中,BK型展現之XRPD圖案具有在如下以2θ度表示之角度處之特徵峰:11.9°±0.2°、13.0°±0.2°、14.4°±0.2°、14.7°±0.2°、16.9°±0.2°、17.9°±0.2°、19.3°±0.2°、21.8°±0.2°、22.7°±0.2°、23.9°±0.2°、24.6°±0.2°及26.1°±0.2°。BK型之吸熱峰(開始)測定為71.5℃。在另一態樣中,BK型游離鹼2-戊醇溶劑合物展現實質上與圖90一致之XRPD圖案。在另一態樣中,BK型展現實質上與圖91一致之TGA及DSC光譜曲線。在另一態樣中,BK型展現實質上與圖92一致之NMR光譜。In the form of the crystalline compound I(a) which is the free base 2-pentanol solvate type BK, it can be identified according to the characteristic peak in the XRPD analysis. In one such aspect, the XRPD pattern exhibited by the BK type has characteristic peaks at angles expressed as 2θ degrees as follows: 11.9°±0.2°, 13.0°±0.2°, 14.4°±0.2°, 14.7°±0.2 °, 16.9°±0.2°, 17.9°±0.2°, 19.3°±0.2°, 21.8°±0.2°, 22.7°±0.2°, 23.9°±0.2°, 24.6°±0.2° and 26.1°±0.2°. The endothermic peak (start) of the BK type was determined to be 71.5°C. In another aspect, the BK-type free base 2-pentanol solvate exhibits an XRPD pattern substantially consistent with FIG. 90. In another aspect, the BK type exhibits TGA and DSC spectral curves that are substantially consistent with FIG. 91. In another aspect, the BK type exhibits an NMR spectrum that is substantially consistent with FIG. 92.

結晶化合物(I)(例如化合物I(a))游離鹼1-丙醇溶劑合物AX型可由快速蒸發化合物(I)於1-丙醇及乙酸異丙酯之溶液中之溶液來製備。1-丙醇與乙酸異丙酯之適合體積比可為約3:1至約1:3,諸如約3:1、2:1、1.25:1、1:1、1:2或1:3。蒸發可在部分真空下進行,且蒸發溫度可為約15℃至約60℃或約20℃至約35℃,諸如約15℃、20℃、25℃、30℃、35℃、40℃、50℃或60℃。The crystalline compound (I) (eg compound I(a)) free base 1-propanol solvate form AX can be prepared by rapidly evaporating a solution of compound (I) in a solution of 1-propanol and isopropyl acetate. A suitable volume ratio of 1-propanol to isopropyl acetate may be about 3:1 to about 1:3, such as about 3:1, 2:1, 1.25:1, 1:1, 1:2, or 1:3 . The evaporation may be performed under partial vacuum, and the evaporation temperature may be about 15°C to about 60°C or about 20°C to about 35°C, such as about 15°C, 20°C, 25°C, 30°C, 35°C, 40°C, 50 ℃ or 60℃.

在結晶化合物I(a)係游離鹼1-丙醇溶劑合物AX型之態樣中,其可根據XRPD分析中之特徵峰鑑別。在一種此類態樣中,AX型展現之XRPD圖案具有在如下以2θ度表示之角度處之特徵峰:11.5°±0.2°、12.9°±0.2°、13.1°±0.2°、17.4°±0.2°、18.2°±0.2°、23.1°±0.2°、23.9°±0.2°及25.9°±0.2°。AX型之吸熱峰(開始)測定為113.5℃及122.0℃。在另一態樣中,AX型游離鹼1-丙醇溶劑合物展現實質上與圖93一致之XRPD圖案。在另一態樣中,AX型展現實質上與圖94一致之TGA及DSC光譜曲線。在另一態樣中,AX型展現實質上與圖95一致之NMR光譜。In the aspect that the crystalline compound I(a) is the free base 1-propanol solvate type AX, it can be identified according to the characteristic peak in the XRPD analysis. In one such aspect, the XRPD pattern exhibited by the AX type has characteristic peaks at angles expressed as 2θ degrees as follows: 11.5°±0.2°, 12.9°±0.2°, 13.1°±0.2°, 17.4°±0.2 °, 18.2°±0.2°, 23.1°±0.2°, 23.9°±0.2° and 25.9°±0.2°. The endothermic peaks (start) of type AX were measured at 113.5°C and 122.0°C. In another aspect, the AX-type free base 1-propanol solvate exhibits an XRPD pattern substantially consistent with FIG. 93. In another aspect, the AX type exhibits TGA and DSC spectral curves that are substantially consistent with FIG. 94. In another aspect, the AX type exhibits an NMR spectrum that is substantially consistent with FIG. 95.

結晶化合物(I)(例如化合物I(a))游離鹼間二甲苯溶劑合物Q型可由快速蒸發化合物(I)於乙酸甲酯及間二甲苯之溶液中之溶液來製備。乙酸甲酯與間二甲苯之適合體積比可為約3:1至約1:3,諸如約3:1、2:1、1.25:1、1:1、1:2或1:3。蒸發可在部分真空下進行,且蒸發溫度可為約15℃至約60℃或約20℃至約35℃,諸如約15℃、20℃、25℃、30℃、35℃、40℃、50℃或60℃。Crystalline Compound (I) (e.g. Compound I(a)) free base m-xylene solvate Form Q can be prepared by rapidly evaporating a solution of compound (I) in a solution of methyl acetate and m-xylene. A suitable volume ratio of methyl acetate to m-xylene may be about 3:1 to about 1:3, such as about 3:1, 2:1, 1.25:1, 1:1, 1:2, or 1:3. The evaporation may be performed under partial vacuum, and the evaporation temperature may be about 15°C to about 60°C or about 20°C to about 35°C, such as about 15°C, 20°C, 25°C, 30°C, 35°C, 40°C, 50 ℃ or 60℃.

在結晶化合物I(a)係游離鹼間二甲苯溶劑合物Q型之態樣中,其可根據XRPD分析中之特徵峰鑑別。在一種此類態樣中,Q型展現之XRPD圖案具有在如下以2θ度表示之角度處之特徵峰:5.5°±0.2°、12.5°±0.2°、15.0°±0.2°、17.6°±0.2°、20.2°±0.2°、22.1°±0.2°、22.8°±0.2°及26.6°±0.2°。Q型之吸熱峰(開始)測定為78.8℃。在另一態樣中,Q型游離鹼間二甲苯溶劑合物展現實質上與圖96一致之XRPD圖案。在另一態樣中,Q型展現實質上與圖97一致之TGA及DSC光譜曲線。在另一態樣中,Q型展現實質上與圖98一致之NMR光譜。The crystalline compound I(a) is a form Q of free base meta-xylene solvate, which can be identified according to the characteristic peak in XRPD analysis. In one such aspect, the XRPD pattern exhibited by the Q pattern has characteristic peaks at angles expressed as 2θ degrees as follows: 5.5°±0.2°, 12.5°±0.2°, 15.0°±0.2°, 17.6°±0.2 °, 20.2°±0.2°, 22.1°±0.2°, 22.8°±0.2° and 26.6°±0.2°. The Q-type endothermic peak (start) was measured to be 78.8°C. In another aspect, the Q-type free base meta-xylene solvate exhibits an XRPD pattern substantially consistent with FIG. 96. In another aspect, the Q-type exhibits TGA and DSC spectral curves that are substantially consistent with FIG. 97. In another aspect, the Q-type exhibits an NMR spectrum that is substantially consistent with FIG. 98.

結晶化合物(I)(例如化合物I(a))游離鹼2-甲氧基乙醇(EGME)溶劑合物P型可由快速蒸發化合物(I)於EGME及正庚烷中之溶液來製備。EGME與正庚烷之適合體積比可為約3:1至約1:3,諸如約3:1、2:1、1.25:1、1:1、1:2或1:3。蒸發可在部分真空下進行,且蒸發溫度可為約15℃至約60℃或約20℃至約35℃,諸如約15℃、20℃、25℃、30℃、35℃、40℃、50℃或60℃。The crystalline Compound (I) (eg Compound I(a)) free base 2-methoxyethanol (EGME) solvate Form P can be prepared by rapidly evaporating a solution of Compound (I) in EGME and n-heptane. A suitable volume ratio of EGME to n-heptane may be about 3:1 to about 1:3, such as about 3:1, 2:1, 1.25:1, 1:1, 1:2, or 1:3. The evaporation may be performed under partial vacuum, and the evaporation temperature may be about 15°C to about 60°C or about 20°C to about 35°C, such as about 15°C, 20°C, 25°C, 30°C, 35°C, 40°C, 50 ℃ or 60℃.

在結晶化合物I(a)係游離鹼EGME溶劑合物P型之態樣中,其可根據XRPD分析中之特徵峰鑑別。在一種此類態樣中,P型展現之XRPD圖案具有在如下以2θ度表示之角度處之特徵峰:11.9°±0.2°、12.3°±0.2°、12.7°±0.2°、14.0°±0.2°、17.1°±0.2°、20.0°±0.2°、23.9°±0.2°、24.1°±0.2°、25.5°±0.2°、25.8°±0.2°及27.2°±0.2°。P型之吸熱峰(開始)測定為104.7℃及142.0℃。在另一態樣中,P型游離鹼EGME無水物展現實質上與圖99一致之XRPD圖案。在另一態樣中,P型展現實質上與圖100一致之TGA及DSC光譜曲線。在另一態樣中,P型展現實質上與圖101一致之NMR光譜。In the form of the crystalline compound I(a) which is the free base EGME solvate P type, it can be identified according to the characteristic peak in the XRPD analysis. In one such aspect, the XRPD pattern exhibited by the P-type has characteristic peaks at angles expressed as 2θ degrees as follows: 11.9°±0.2°, 12.3°±0.2°, 12.7°±0.2°, 14.0°±0.2 °, 17.1°±0.2°, 20.0°±0.2°, 23.9°±0.2°, 24.1°±0.2°, 25.5°±0.2°, 25.8°±0.2° and 27.2°±0.2°. The P-type endothermic peaks (start) were measured at 104.7°C and 142.0°C. In another aspect, the P-type free base EGME anhydrous exhibits an XRPD pattern that is substantially consistent with FIG. 99. In another aspect, the P-type exhibits TGA and DSC spectral curves that are substantially consistent with FIG. 100. In another aspect, the P-type exhibits an NMR spectrum that is substantially consistent with FIG. 101.

結晶化合物(I)(例如化合物I(a))游離鹼第二丁醇溶劑合物AQ型可由快速蒸發化合物(I)於第二丁醇及MTBE中之溶液來製備。第二丁醇與MTBE之適合體積比可為約3:1至約1:3,諸如約3:1、2:1、1.25:1、1:1、1:2或1:3。蒸發可在部分真空下進行,且蒸發溫度可為約15℃至約60℃或約20℃至約35℃,諸如約15℃、20℃、25℃、30℃、35℃、40℃、50℃或60℃。The crystalline compound (I) (eg compound I(a)) free base second butanol solvate form AQ can be prepared by rapidly evaporating a solution of compound (I) in second butanol and MTBE. A suitable volume ratio of second butanol to MTBE may be about 3:1 to about 1:3, such as about 3:1, 2:1, 1.25:1, 1:1, 1:2, or 1:3. The evaporation may be performed under partial vacuum, and the evaporation temperature may be about 15°C to about 60°C or about 20°C to about 35°C, such as about 15°C, 20°C, 25°C, 30°C, 35°C, 40°C, 50 ℃ or 60℃.

在結晶化合物I(a)係指定為AQ型之游離鹼第二丁醇溶劑合物之態樣中,其可根據XRPD分析中之特徵峰鑑別。在一種此類態樣中,AQ型展現之XRPD圖案具有在如下以2θ度表示之角度處之特徵峰:11.5°±0.2°、12.7°±0.2°、12.9°±0.2°、14.1°±0.2°、17.4°±0.2°、17.9°±0.2°、21.9°±0.2°、22.7°±0.2°、23.1°±0.2°、23.5°±0.2°、23.9°±0.2°、25.5°±0.2°及27.6°±0.2°。AQ型之吸熱峰(開始)測定為99.7℃及110.8℃。在另一態樣中,AQ型游離鹼第二丁醇溶劑合物展現實質上與圖102一致之XRPD圖案。在另一態樣中,AQ型展現實質上與圖103一致之TGA及DSC光譜曲線。在另一態樣中,AQ型展現實質上與圖104一致之NMR光譜。In the aspect that the crystalline compound I(a) is designated as the free base second butanol solvate of the AQ type, it can be identified according to the characteristic peak in the XRPD analysis. In one such aspect, the XRPD pattern exhibited by the AQ type has characteristic peaks at angles expressed as 2θ degrees as follows: 11.5°±0.2°, 12.7°±0.2°, 12.9°±0.2°, 14.1°±0.2 °, 17.4°±0.2°, 17.9°±0.2°, 21.9°±0.2°, 22.7°±0.2°, 23.1°±0.2°, 23.5°±0.2°, 23.9°±0.2°, 25.5°±0.2° and 27.6°±0.2°. The endothermic peaks (start) of the AQ type were determined to be 99.7°C and 110.8°C. In another aspect, the AQ-type free base second butanol solvate exhibits an XRPD pattern substantially consistent with FIG. 102. In another aspect, the AQ type exhibits TGA and DSC spectral curves that are substantially consistent with FIG. 103. In another aspect, the AQ type exhibits an NMR spectrum that is substantially consistent with FIG. 104.

化合物(I)(例如化合物I(a))龍膽酸無水物共晶體A型可由化合物(I)游離鹼及龍膽酸於乙酸乙酯(EtOAc)中之溶液來製備。化合物(I)之濃度適當地係約20 g/L至約100 g/L、約30 g/L至約75 g/L或約50 g/L。化合物(I)及龍膽酸以大致化學計量之量存在。將諸如正庚烷之反溶劑添加至溶液中以誘導結晶。EtOAc與反溶劑之體積比適當地係約1:1.1至約1:5,諸如約1:1.15、1:2、1:2.5或1:3。可視情況添加化合物(I)龍膽酸無水物共晶體A型晶種以誘導及/或增強結晶。可使漿料冷卻,以便達至小於10℃,諸如約0℃至約5℃,以誘導進一步結晶。化合物(I)龍膽酸無水物共晶體A型可藉由如本文其他地方所述之此項技術中已知的方法收集,且如本文其他地方所述在約室溫下乾燥。Compound (I) (eg Compound I(a)) gentisic acid anhydrous co-crystal form A can be prepared from a solution of compound (I) free base and gentisic acid in ethyl acetate (EtOAc). The concentration of the compound (I) is suitably about 20 g/L to about 100 g/L, about 30 g/L to about 75 g/L, or about 50 g/L. Compound (I) and gentisic acid are present in approximately stoichiometric amounts. An anti-solvent such as n-heptane is added to the solution to induce crystallization. The volume ratio of EtOAc to anti-solvent is suitably about 1:1.1 to about 1:5, such as about 1:1.15, 1:2, 1:2.5 or 1:3. Optionally, compound (I) gentisic acid anhydrous eutectic type A seed crystal is added to induce and/or enhance crystallization. The slurry can be cooled so as to reach less than 10°C, such as about 0°C to about 5°C, to induce further crystallization. Compound (I) gentisic acid anhydrous co-crystal form A can be collected by methods known in the art as described elsewhere herein, and dried at about room temperature as described elsewhere herein.

在另一態樣中,化合物I(a)龍膽酸無水物共晶體A型展現實質上與圖66一致之XRPD圖案。在其他態樣中,特徵峰係如下角度處之2θ度:12.5°±0.2°、13.0°±0.2°、14.4°±0.2°、15.7°±0.2°、17.5°±0.2°、21.7°±0.2°、25.5°±0.2°及26.3°±0.2°。在另一態樣中,共晶體A型展現實質上與圖67一致之TGA及DSC光譜曲線。在另一態樣中,共晶體A型展現實質上與圖68一致之NMR光譜。In another aspect, Compound I(a) gentisic acid anhydrate eutectic Form A exhibits an XRPD pattern substantially consistent with FIG. 66. In other aspects, the characteristic peak is 2θ degrees at the following angles: 12.5°±0.2°, 13.0°±0.2°, 14.4°±0.2°, 15.7°±0.2°, 17.5°±0.2°, 21.7°±0.2 °, 25.5°±0.2° and 26.3°±0.2°. In another aspect, the eutectic type A exhibits TGA and DSC spectral curves that are substantially consistent with FIG. 67. In another aspect, eutectic Form A exhibits an NMR spectrum that is substantially consistent with FIG. 68.

化合物(I)(例如化合物I(a))游離鹼無水物共晶體B型可由化合物(I)游離鹼及龍膽酸於THF中之溶液來製備。化合物(I)之濃度適當地係約20 g/L至約100 g/L、約30 g/L至約75 g/L或約50 g/L。化合物(I)及龍膽酸以大致化學計量之量存在。將諸如正庚烷之反溶劑添加至溶液中以誘導結晶。THF與反溶劑之體積比適當地係約1:1.1至約1:5,諸如約1:1.15、1:2、1:2.5或1:3。可視情況添加化合物(I)龍膽酸無水物共晶體B型晶種以誘導及/或增強結晶。可使漿料冷卻,以便達至小於10℃,諸如約0℃至約5℃,以誘導進一步結晶。化合物(I)龍膽酸無水物共晶體B型可藉由如本文其他地方所述之此項技術中已知的方法收集,且如本文其他地方所述在約室溫下乾燥。Compound (I) (eg Compound I(a)) free base anhydrous co-crystal form B can be prepared from a solution of compound (I) free base and gentisic acid in THF. The concentration of the compound (I) is suitably about 20 g/L to about 100 g/L, about 30 g/L to about 75 g/L, or about 50 g/L. Compound (I) and gentisic acid are present in approximately stoichiometric amounts. An anti-solvent such as n-heptane is added to the solution to induce crystallization. The volume ratio of THF to anti-solvent is suitably about 1:1.1 to about 1:5, such as about 1:1.15, 1:2, 1:2.5 or 1:3. Optionally, compound (I) gentisic acid anhydrous eutectic B-type seed crystal is added to induce and/or enhance crystallization. The slurry can be cooled so as to reach less than 10°C, such as about 0°C to about 5°C, to induce further crystallization. Compound (I) gentisic acid anhydrous eutectic Form B can be collected by methods known in the art as described elsewhere herein, and dried at approximately room temperature as described elsewhere herein.

在另一態樣中,化合物I(a)龍膽酸無水物共晶體B型展現實質上與圖69一致之XRPD圖案。在另一態樣中,特徵峰係如下角度之2θ度:6.6°±0.2°、7.9°±0.2°、12.2°±0.2°、12.4°±0.2°、14.0°±0.2°、15.1°±0.2°、16.3°±0.2°、21.1°±0.2°、25.3°±0.2°及25.6°±0.2°。在另一態樣中,共晶體B型展現實質上與圖72一致之TGA及DSC光譜曲線。在另一態樣中,共晶體B型展現實質上與圖73一致之NMR光譜。In another aspect, Compound I(a) gentisic acid anhydrate eutectic Form B exhibits an XRPD pattern substantially consistent with FIG. 69. In another aspect, the characteristic peak is the following 2θ degrees: 6.6°±0.2°, 7.9°±0.2°, 12.2°±0.2°, 12.4°±0.2°, 14.0°±0.2°, 15.1°±0.2 °, 16.3°±0.2°, 21.1°±0.2°, 25.3°±0.2° and 25.6°±0.2°. In another aspect, the eutectic type B exhibits TGA and DSC spectral curves that are substantially consistent with FIG. 72. In another aspect, the eutectic type B exhibits an NMR spectrum that is substantially consistent with FIG. 73.

化合物(I)(例如化合物I(a))吡啶甲醯胺水合物共晶體A型可由化合物(I)游離鹼及吡啶甲醯胺於EtOAc中之溶液來製備。化合物(I)之濃度適當地係約20 g/L至約100 g/L、約30 g/L至約75 g/L或約50 g/L。化合物(I)及吡啶甲醯胺以大致化學計量之量至吡啶甲醯胺輕微莫耳過量存在,諸如約1:1至約1:4,諸如約1:2。將諸如正庚烷之反溶劑添加至溶液中以誘導結晶。EtOAc與反溶劑之體積比適當地係約1:1.1至約1:5,諸如約1:1.15、1:2、1:2.5或1:3。可視情況添加化合物(I)水合物共晶體A型晶種以誘導及/或增強結晶。可使漿料冷卻,以便達至小於10℃,諸如約0℃至約5℃,以誘導進一步結晶。化合物(I)吡啶甲醯胺水合物共晶體A型可藉由如本文其他地方所述之此項技術中已知的方法收集,且如本文其他地方所述在約室溫下乾燥。Compound (I) (e.g. Compound I(a)) pyridylcarboxamide hydrate co-crystal form A can be prepared from compound (I) free base and a solution of pyridylcarboxamide in EtOAc. The concentration of the compound (I) is suitably about 20 g/L to about 100 g/L, about 30 g/L to about 75 g/L, or about 50 g/L. The compound (I) and picolinamide are present in approximately stoichiometric amounts to a slight molar excess of picolinamide, such as from about 1:1 to about 1:4, such as about 1:2. An anti-solvent such as n-heptane is added to the solution to induce crystallization. The volume ratio of EtOAc to anti-solvent is suitably about 1:1.1 to about 1:5, such as about 1:1.15, 1:2, 1:2.5 or 1:3. The compound (I) hydrate co-crystal A type seed crystal may be added as appropriate to induce and/or enhance crystallization. The slurry can be cooled so as to reach less than 10°C, such as about 0°C to about 5°C, to induce further crystallization. Compound (I) pyridylcarboxamide hydrate co-crystal form A can be collected by methods known in the art as described elsewhere herein, and dried at about room temperature as described elsewhere herein.

在另一態樣中,化合物I(a)吡啶甲醯胺水合物共晶體A型展現實質上與圖74一致之XRPD圖案。2θ度之特徵峰在如下角度處:12.1°±0.2°、12.4°±0.2°、14.5°±0.2°、15.8°±0.2°、18.1°±0.2°、19.1°±0.2°、22.0°±0.2°、24.5°±0.2°、25.6°±0.2°及26.6°±0.2°。在另一態樣中,共晶體A型展現實質上與圖75一致之TGA及DSC光譜曲線。在另一態樣中,共晶體A型展現實質上與圖76一致之NMR光譜。In another aspect, Compound I(a) pyridylcarboxamide hydrate co-crystal form A exhibits an XRPD pattern substantially consistent with FIG. 74. The characteristic peaks of 2θ degrees are at the following angles: 12.1°±0.2°, 12.4°±0.2°, 14.5°±0.2°, 15.8°±0.2°, 18.1°±0.2°, 19.1°±0.2°, 22.0°±0.2 °, 24.5°±0.2°, 25.6°±0.2° and 26.6°±0.2°. In another aspect, the eutectic type A exhibits TGA and DSC spectral curves substantially consistent with FIG. 75. In another aspect, eutectic Form A exhibits an NMR spectrum that is substantially consistent with FIG. 76.

醫藥組合物Pharmaceutical composition

本發明亦提供包含化合物(I)及至少一種醫藥學上可接受之載劑的組合物及藥物。本發明之組合物可用以選擇性抑制患者(例如人類)中之TRPA1。如本文所用,術語「組合物」意欲涵蓋包含指定量之指定成分的產物,以及直接或間接由指定量之指定成分之組合產生的任何產物。The invention also provides compositions and medicaments comprising compound (I) and at least one pharmaceutically acceptable carrier. The composition of the present invention can be used to selectively inhibit TRPA1 in patients, such as humans. As used herein, the term "composition" is intended to encompass products that contain the specified ingredients in the specified amounts, as well as any product that results, directly or indirectly, from a combination of the specified ingredients in the specified amounts.

在一個態樣中,本發明提供包含化合物(I)(例如化合物I(a))或其實施例(及其立體異構體、溶劑合物、代謝物或其醫藥學上可接受之鹽)及醫藥學上可接受之載劑、稀釋劑或賦形劑之醫藥組合物或藥物。在另一實施例中,本發明提供包含本發明化合物之組合物(或藥物)之製備。在另一實施例中,本發明提供化合物(I)(例如化合物I(a))或其實施例及包含化合物(I)或其實施例之組合物向有需要患者(例如人類患者)之投與。In one aspect, the invention provides compounds (I) (eg compound I(a)) or examples thereof (and their stereoisomers, solvates, metabolites or pharmaceutically acceptable salts thereof) And pharmaceutical compositions or drugs of pharmaceutically acceptable carriers, diluents or excipients. In another embodiment, the present invention provides the preparation of a composition (or drug) comprising a compound of the present invention. In another embodiment, the present invention provides the administration of compound (I) (eg compound I(a)) or embodiments thereof and compositions comprising compound (I) or embodiments thereof to patients in need (eg human patients) versus.

組合物以與良好醫學實踐一致之方式調配、給與及投與。在此情形下考慮之因素包括所治療之特定病症、所治療之特定哺乳動物、個別患者之臨床病狀、病症起因、藥劑遞送部位、投藥方法、投藥時程及醫學從業者已知的其他因素。待投與之化合物之有效量將藉由此類考慮控管,且係如預防或治療不合需要之疾病或病症(諸如疼痛)所需的抑制TRPA1活性所要的最少量。舉例而言,此類量可總體上低於對正常細胞或哺乳動物有毒的量。The composition is formulated, administered and administered in a manner consistent with good medical practice. Factors considered in this context include the specific condition being treated, the specific mammal being treated, the clinical condition of the individual patient, the cause of the condition, the site of drug delivery, the method of administration, the time of administration, and other factors known to medical practitioners . The effective amount of the compound to be administered will be controlled by such considerations, and is the minimum amount required to inhibit TRPA1 activity as required to prevent or treat undesirable diseases or conditions such as pain. For example, such amounts may be generally lower than those that are toxic to normal cells or mammals.

本發明化合物可藉由任何適合的手段投與,包括經口、表面(包括經頰及舌下)、經直腸、經陰道、經皮、非經腸、皮下、腹膜內、肺內、皮內、鞘內及硬膜外及鼻內,且若局部治療需要,則病灶內投與。非經腸輸注包括肌肉內、靜脈內、動脈內、腹膜內、腦內、眼內、病灶內或皮下投與。The compounds of the present invention can be administered by any suitable means, including oral, superficial (including buccal and sublingual), transrectal, transvaginal, transdermal, parenteral, subcutaneous, intraperitoneal, intrapulmonary, intradermal , Intrathecal and epidural and intranasal, and if local treatment is required, intralesional administration. Parenteral infusions include intramuscular, intravenous, intraarterial, intraperitoneal, intracerebral, intraocular, intralesional, or subcutaneous administration.

作為API,化合物(I)游離鹼之結晶型式或其混合物可具有優於非晶型式之優勢。舉例而言,API純化至大多數管理機構所要之高純度可更高效,且因此成本更低,其中API呈與非晶型式相反之結晶型式。結晶之API固體之物理及化學穩定性,且因此之儲存期限亦可較之非晶型式更佳。處理簡易性相對於可為油性或黏性的非晶型式可有所改良。與在非晶材料之情況下相比,在結晶材料之情況下,乾燥可更簡單且更易於控制,其可具有明確界定之乾燥或去溶劑化溫度,該非晶材料對有機溶劑可具有更大親和力且無明確界定之乾燥溫度。使用結晶API之後續加工可進一步准許增強的製程控制。在液體調配物(例如於脂質載劑中之溶液)之製備中,結晶化合物(I)可較快溶解,且在溶解期間可不易於形成凝膠。此等優勢係說明性及非限制性的。As an API, the crystalline form of compound (I) free base or a mixture thereof may have an advantage over the amorphous form. For example, the purification of the API to the high purity required by most regulatory agencies can be more efficient and therefore cost less, where the API is in a crystalline form opposite to the amorphous form. The physical and chemical stability of crystalline API solids, and therefore the shelf life can also be better than the amorphous form. The ease of handling can be improved relative to the amorphous form that can be oily or viscous. Compared to the case of amorphous materials, drying can be simpler and easier to control in the case of crystalline materials, it can have a well-defined drying or desolvation temperature, and the amorphous material can have a greater effect on organic solvents Affinity and no clearly defined drying temperature. Subsequent processing using crystalline API can further permit enhanced process control. In the preparation of liquid formulations (for example, solutions in lipid carriers), the crystalline compound (I) can dissolve faster, and gels may not be easily formed during dissolution. These advantages are illustrative and non-limiting.

包含結晶化合物(I)游離鹼,或使用結晶化合物(I)游離鹼或化合物(I)之鹽作為API製備之醫藥組合物含有當根據適當方案向有需要之個體投與組合物時可為治療有效之量的化合物(I)。除非上下文另外要求,否則在本文中劑量表示為游離鹼當量。通常,在向稱重大致70Kg之成年人類經口或非經腸投與之情況下,可以適當頻率(例如每日兩次至每週一次)投與之單位劑量(單次投與之量),約0.1 mg至約5,000 mg、約1 mg至約1,000 mg、約7 mg至約1,400 mg或約1 mg至100 mg之每日劑量可為適當的,但若指定亦可超出下限及上限。換言之,每劑量中非經腸投與之本發明化合物之治療有效量將在每天每公斤患者體重約0.01至100 mg、約0.01至100 mg、或約例如0.1至20 mg之範圍內,其中所用化合物之典型初始範圍係0.3至15 mg/kg/天。可調節此給藥方案以提供最佳治療反應。化合物可按每天1至4次,較佳每天一次或兩次之方案投與。每日劑量可作為單次劑量或分次劑量投與,或用於非經腸投與,其可以連續輸注型式提供。The pharmaceutical composition containing the crystalline compound (I) free base, or using the crystalline compound (I) free base or a salt of the compound (I) as an API contains a pharmaceutical composition that can be treated when administered to an individual in need according to an appropriate protocol An effective amount of compound (I). Unless the context requires otherwise, dosages are expressed herein as free base equivalents. Generally, in the case of oral or parenteral administration to adults weighing approximately 70 kg, the unit dose (a single dose) can be administered at an appropriate frequency (for example, twice a day to once a week) A daily dose of about 0.1 mg to about 5,000 mg, about 1 mg to about 1,000 mg, about 7 mg to about 1,400 mg, or about 1 mg to 100 mg may be appropriate, but if specified, the lower and upper limits may also be exceeded. In other words, the therapeutically effective amount of the compound of the present invention administered parenterally per dose will be in the range of about 0.01 to 100 mg, about 0.01 to 100 mg, or about, for example, 0.1 to 20 mg per kg of patient's body weight per day. The typical initial range of compounds is 0.3 to 15 mg/kg/day. This dosage regimen can be adjusted to provide the best therapeutic response. The compound can be administered 1 to 4 times a day, preferably once or twice a day. The daily dose can be administered as a single dose or in divided doses, or for parenteral administration, which can be provided as a continuous infusion.

本發明化合物可以任何便利的投與型式投與,例如錠劑、散劑、膠囊、溶液、分散液、懸浮液、糖漿、噴霧劑、栓劑、凝膠、乳液、貼片等。此類組合物可含有醫藥製劑中習知之組分,例如稀釋劑、載劑、pH值改質劑、甜味劑、膨化劑及其他活性劑。The compound of the present invention can be administered in any convenient administration form, such as tablets, powders, capsules, solutions, dispersions, suspensions, syrups, sprays, suppositories, gels, emulsions, patches, and the like. Such compositions may contain conventional components in pharmaceutical preparations, such as diluents, carriers, pH modifiers, sweeteners, bulking agents, and other active agents.

適合的經口投與型式之實例係錠劑,其含有約1 mg、5 mg、10 mg、25 mg、30 mg、50 mg、80 mg、100 mg、150 mg、250 mg、300 mg及500 mg之本發明化合物與約90至30 mg無水乳糖、約5至40 mg交聯羧甲纖維素鈉、約5至30 mg聚乙烯吡咯啶酮(PVP) K30及約1至10 mg硬脂酸鎂複合。首先將粉末狀成分混合在一起,且接著與PVP之溶液混合。可將所得組合物乾燥,粒化,與硬脂酸鎂混合且使用習知設備壓縮成錠劑型式。可藉由將例如5至400 mg本發明化合物溶解於適合的緩衝溶液(例如磷酸鹽緩衝劑)中,必要時添加張力劑(例如鹽,諸如氯化鈉),來製備氣溶膠調配物之實例。溶液可例如使用0.2微米過濾器過濾以移除雜質及污染物。Examples of suitable oral administration forms are lozenges, which contain about 1 mg, 5 mg, 10 mg, 25 mg, 30 mg, 50 mg, 80 mg, 100 mg, 150 mg, 250 mg, 300 mg and 500 mg of the compound of the invention with about 90 to 30 mg of anhydrous lactose, about 5 to 40 mg of croscarmellose sodium, about 5 to 30 mg of polyvinylpyrrolidone (PVP) K30, and about 1 to 10 mg of stearic acid Magnesium compound. The powdered ingredients are mixed together first, and then mixed with the solution of PVP. The resulting composition can be dried, granulated, mixed with magnesium stearate and compressed into a tablet form using conventional equipment. Examples of aerosol formulations can be prepared by dissolving, for example, 5 to 400 mg of the compound of the present invention in a suitable buffer solution (e.g. phosphate buffer) and adding a tonicity agent (e.g. salt such as sodium chloride) if necessary . The solution can be filtered, for example, using a 0.2 micron filter to remove impurities and contaminants.

對於治療眼睛或其他外部組織(例如口部及皮膚),較佳以含有例如0.075至20% w/w之量的活性成分之表面軟膏或乳膏型式施用調配物。當調配為軟膏時,活性成分可與石蠟或水可混溶性軟膏基劑一起採用。或者,活性成分可與水包油乳膏基劑一起調配成乳膏。必要時,乳膏基劑之水相可包括多元醇,亦即具有兩個或更多個羥基之醇,諸如丙二醇、1,3-丁二醇、甘露糖醇、山梨糖醇、丙三醇及聚乙二醇(包括PEG 400)及其混合物。表面調配物宜可包括增強活性成分經由皮膚或其他受影響區域之吸收或滲透的化合物。此類真皮滲透增強劑之實例包括DMSO及相關類似物。For the treatment of eyes or other external tissues (eg mouth and skin), it is preferred to apply the formulation in the form of a surface ointment or cream containing the active ingredient in an amount of, for example, 0.075 to 20% w/w. When formulated as an ointment, the active ingredient can be used with a paraffin or water-miscible ointment base. Alternatively, the active ingredient can be formulated as a cream with an oil-in-water cream base. If necessary, the water phase of the cream base may include a polyhydric alcohol, that is, an alcohol having two or more hydroxyl groups, such as propylene glycol, 1,3-butanediol, mannitol, sorbitol, glycerin And polyethylene glycol (including PEG 400) and mixtures thereof. Surface formulations may suitably include compounds that enhance the absorption or penetration of the active ingredient through the skin or other affected areas. Examples of such dermal penetration enhancers include DMSO and related analogs.

對於表面調配物,需要向目標區域投與有效量之根據本發明之醫藥組合物,目標區域係例如皮膚表面、黏膜及其類似區域,其靠近待治療之外周神經元。視待治療之區域,使用係診斷性、預防性抑或治療性使用,症狀之嚴重程度及所採用之表面媒劑之性質而定,此量一般將在每次施用約0.0001 mg至約1 g之本發明化合物之範圍內。較佳表面製劑係軟膏,其中每cc軟膏基劑使用約0.001至約50 mg之活性成分。醫藥組合物可調配為經皮組合物或經皮遞送裝置(「貼片」)。此類組合物包括例如背襯、活性化合物儲集層、控制膜、內襯及接觸黏著劑。此類經皮貼片可用以提供連續作用,或視需要按需遞送本發明化合物。For surface formulations, an effective amount of the pharmaceutical composition according to the present invention needs to be administered to a target area, such as the skin surface, mucous membranes and the like, which is close to the peripheral neurons to be treated. Depending on the area to be treated, whether the use is diagnostic, prophylactic or therapeutic, the severity of the symptoms and the nature of the surface vehicle used, this amount will generally be about 0.0001 mg to about 1 g per administration Within the scope of the compounds of the present invention. A preferred surface preparation is an ointment, wherein about 0.001 to about 50 mg of active ingredient is used per cc of ointment base. The pharmaceutical composition can be formulated as a transdermal composition or a transdermal delivery device ("patch"). Such compositions include, for example, backings, active compound reservoirs, control films, liners, and contact adhesives. Such transdermal patches can be used to provide continuous action, or to deliver the compounds of the present invention as needed.

包含化合物(I)之組合物通常根據標準醫藥實踐調配成醫藥組合物。典型調配物藉由將本發明化合物與稀釋劑、載劑或賦形劑混合來製備。適合的稀釋劑、載劑及賦形劑為熟習此項技術者所熟知且詳細描述於例如Ansel, Howard C.等人, Ansel's Pharmaceutical Dosage Forms and Drug Delivery Systems. Philadelphia: Lippincott, Williams & Wilkins, 2004;Gennaro, Alfonso R.等人, Remington: The Science and Practice of Pharmacy. Philadelphia: Lippincott, Williams & Wilkins, 2000;及Rowe, Raymond C. Handbook of Pharmaceutical Excipients. Chicago, Pharmaceutical Press, 2005中。The composition containing the compound (I) is usually formulated into a pharmaceutical composition according to standard medical practice. Typical formulations are prepared by mixing the compounds of the invention with diluents, carriers or excipients. Suitable diluents, carriers and excipients are well known to those skilled in the art and are described in detail in, for example, Ansel, Howard C. et al., Ansel's Pharmaceutical Dosage Forms and Drug Delivery Systems. Philadelphia: Lippincott, Williams & Wilkins, 2004 ; Gennaro, Alfonso R. et al., Remington: The Science and Practice of Pharmacy. Philadelphia: Lippincott, Williams & Wilkins, 2000; and Rowe, Raymond C. Handbook of Pharmaceutical Excipients. Chicago, Pharmaceutical Press, 2005.

調配物亦可包括一或多種緩衝劑、穩定劑、界面活性劑、濕潤劑、潤滑劑、乳化劑、懸浮劑、防腐劑、抗氧化劑、避光劑、滑動劑、加工助劑、著色劑、甜味劑、芳香劑、調味劑、稀釋劑及其他使得藥物(亦即本發明化合物或其醫藥組合物)精緻呈現或幫助製造醫藥產品(亦即藥物)之已知的添加劑。適合的載劑、稀釋劑及賦形劑為熟習此項技術者所熟知且包括緩衝劑,諸如磷酸鹽、檸檬酸鹽及其他有機酸;抗氧化劑,包括抗壞血酸及甲硫胺酸;防腐劑(諸如氯化十八烷基二甲基苯甲基銨;氯化六羥季銨;苯紮氯銨、苄索氯銨;苯酚、丁醇或苯甲醇;對羥基苯甲酸烷基酯,諸如對羥基苯甲酸甲酯或對羥基苯甲酸丙酯;兒茶酚;間苯二酚;環己醇;3-戊醇;及間甲酚);低分子量(少於約10個殘基)多肽;蛋白質,諸如血清白蛋白、明膠或免疫球蛋白;親水性聚合物,諸如聚乙烯吡咯啶酮;胺基酸,諸如甘胺酸、麩醯胺酸、天冬醯胺、組胺酸、精胺酸或離胺酸;單醣、雙醣及其他碳水化合物,包括葡萄糖、甘露糖或糊精;螯合劑,諸如EDTA;糖,諸如蔗糖、甘露糖醇、海藻糖或山梨糖醇;成鹽相對離子,諸如鈉;金屬錯合物(例如Zn-蛋白質錯合物);及/或非離子界面活性劑,諸如TWEEN™、PLURONICS™或聚乙二醇(PEG)。本發明之化合物(I)亦可例如藉由凝聚技術或藉由界面聚合包覆於所製備之微膠囊中,例如分別在膠狀藥物遞送系統(例如脂質體、白蛋白微球體、微乳液、奈米粒子及奈米囊劑)中或於巨乳液中之羥甲基纖維素或明膠微膠囊及聚-(甲基丙烯酸甲酯)微膠囊。此類技術揭示於Remington: The Science and Practice of Pharmacy: Remington the Science and Practice of Pharmacy (2005)第21版,Lippincott Williams & Wilkins, Philidelphia, PA中。所用之特定載劑、稀釋劑或賦形劑將取決於施用本發明化合物之方式及目的。溶劑一般基於待向哺乳動物投與之熟習此項技術者公認為安全(GRAS)之溶劑進行選擇。一般而言,安全溶劑係無毒水性溶劑,諸如水及可溶於水或可混溶於水之其他無毒溶劑。適合的水性溶劑包括水、乙醇、丙二醇、聚乙二醇(例如PEG 400、PEG 300)等及其混合物。可接受之稀釋劑、載劑、賦形劑及穩定劑在所採用之劑量及濃度下對接受者無毒。The formulation may also include one or more buffers, stabilizers, surfactants, wetting agents, lubricants, emulsifiers, suspending agents, preservatives, antioxidants, light shielding agents, slip agents, processing aids, colorants, Sweeteners, fragrances, flavoring agents, diluents, and other known additives that make medicines (ie, compounds of the present invention or pharmaceutical compositions thereof) delicately present or aid in the manufacture of pharmaceutical products (ie, medicines). Suitable carriers, diluents and excipients are well known to those skilled in the art and include buffers such as phosphates, citrates and other organic acids; antioxidants, including ascorbic acid and methionine; preservatives ( Such as octadecyldimethylbenzylammonium chloride; hexahydroxyammonium chloride; benzalkonium chloride, benzethonium chloride; phenol, butanol or benzyl alcohol; alkyl parabens such as Methyl hydroxybenzoate or propyl parahydroxybenzoate; catechol; resorcinol; cyclohexanol; 3-pentanol; and m-cresol); low molecular weight (less than about 10 residues) polypeptide; Proteins, such as serum albumin, gelatin, or immunoglobulins; hydrophilic polymers, such as polyvinylpyrrolidone; amino acids, such as glycine, glutamate, aspartame, histidine, spermine Acid or lysine; monosaccharides, disaccharides, and other carbohydrates, including glucose, mannose, or dextrin; chelating agents, such as EDTA; sugars, such as sucrose, mannitol, trehalose, or sorbitol; salt-forming relative Ions, such as sodium; metal complexes (eg, Zn-protein complexes); and/or nonionic surfactants, such as TWEEN™, PLURONICS™, or polyethylene glycol (PEG). The compound (I) of the present invention can also be coated in the prepared microcapsules by, for example, coagulation technology or by interfacial polymerization, for example, in a colloidal drug delivery system (such as liposomes, albumin microspheres, microemulsion, Nanoparticles and nanocapsules) or hydroxymethyl cellulose or gelatin microcapsules and poly-(methyl methacrylate) microcapsules in giant emulsions. Such techniques are disclosed in Remington: The Science and Practice of Pharmacy: Remington the Science and Practice of Pharmacy (2005) 21st Edition, Lippincott Williams & Wilkins, Philidelphia, PA. The specific carrier, diluent or excipient used will depend on the manner and purpose of administration of the compound of the invention. Solvents are generally selected based on solvents that are known to be safe (GRAS) by those skilled in the art to be administered to mammals. In general, safe solvents are non-toxic aqueous solvents, such as water and other non-toxic solvents that are soluble or miscible in water. Suitable aqueous solvents include water, ethanol, propylene glycol, polyethylene glycol (eg PEG 400, PEG 300), etc. and mixtures thereof. Acceptable diluents, carriers, excipients and stabilizers are non-toxic to the recipient at the dosage and concentration used.

可製備本發明化合物(I)之持續釋放型製劑。持續釋放型製劑之適合的實例包括含有化合物(I)之固體疏水性聚合物之半滲透基質,該等基質呈成形物品型式,例如膜或微膠囊。持續釋放型基質之實例包括聚酯、水凝膠(例如聚(2-羥基乙基-甲基丙烯酸酯)或聚(乙烯醇))、聚乳酸交酯(美國專利第3,773,919號)、L-麩胺酸及γ-乙基-L-麩胺酸之共聚物(Sidman等人, Biopolymers 22:547, 1983)、不可分解乙烯-乙酸乙烯酯(Langer等人, J. Biomed. Mater. Res. 15:167, 1981)、可分解乳酸-乙醇酸共聚物(諸如LUPRON DEPOT™ (由乳酸-乙醇酸共聚物及乙酸亮丙立德構成之可注射微球體))及聚-D-(-)-3-羥基丁酸(EP 133,988A)。持續釋放型組合物亦包括經脂質體包覆之化合物,其可藉由本身已知的方法製備(Epstein等人,Proc. Natl. Acad. Sci. U.S.A. 82:3688, 1985;Hwang等人,Proc. Natl. Acad. Sci. U.S.A. 77:4030, 1980;美國專利第4,485,045號及第4,544,545號;及EP 102,324A)。通常,脂質體屬於小(約200至800埃)單層型,其中脂質含量大於約30莫耳%膽固醇,所選擇之比例經調節用於最佳療法。A sustained-release preparation of the compound (I) of the present invention can be prepared. Suitable examples of sustained-release preparations include semipermeable matrices of solid hydrophobic polymers containing Compound (I), which matrices are in the form of shaped articles, such as films or microcapsules. Examples of sustained-release matrix include polyester, hydrogel (e.g. poly(2-hydroxyethyl-methacrylate) or poly(vinyl alcohol)), polylactide (US Patent No. 3,773,919), L- Copolymers of glutamic acid and γ-ethyl-L-glutamic acid (Sidman et al., Biopolymers 22:547, 1983), non-decomposable ethylene-vinyl acetate (Langer et al., J. Biomed. Mater. Res. 15:167, 1981), decomposable lactic acid-glycolic acid copolymers (such as LUPRON DEPOT™ (injectable microspheres consisting of lactic acid-glycolic acid copolymers and leuprolide acetate)) and poly-D-(-) -3-hydroxybutyric acid (EP 133,988A). Sustained-release compositions also include compounds coated with liposomes, which can be prepared by methods known per se (Epstein et al., Proc. Natl. Acad. Sci. USA 82:3688, 1985; Hwang et al., Proc Natl. Acad. Sci. USA 77:4030, 1980; US Patent Nos. 4,485,045 and 4,544,545; and EP 102,324A). Generally, liposomes are small (approximately 200 to 800 Angstroms) unilamellar in which the lipid content is greater than approximately 30 mole% cholesterol, and the selected ratio is adjusted for optimal therapy.

在一個實例中,化合物(I)可藉由在環境溫度下,在適當pH下及在所需純度下與生理學上可接受之載劑(亦即在蓋倫投藥劑型(galenical administration form)中所採用之劑量及濃度下對接受者無毒之載劑)混合來調配。調配物之pH值主要取決於特定用途及化合物之濃度,但較佳為約3至約8範圍內之任何數值。在一個實例中,在乙酸鹽緩衝劑中,在pH 5下調配化合物(I)。在另一實施例中,化合物(I)係無菌的。化合物可例如以固體或非晶組合物型式、以凍乾調配物或水溶液型式儲存。In one example, the compound (I) can be prepared by using a physiologically acceptable carrier (i.e., in a galenical administration form) at ambient temperature, at an appropriate pH, and at a desired purity. Carriers that are not toxic to the recipient at the dosage and concentration used in the formula) are mixed for formulation. The pH of the formulation depends mainly on the specific application and the concentration of the compound, but is preferably any value in the range of about 3 to about 8. In one example, compound (I) is formulated at pH 5 in an acetate buffer. In another embodiment, compound (I) is sterile. The compounds can be stored, for example, in the form of solid or amorphous compositions, in the form of lyophilized formulations or aqueous solutions.

適用於經口投與之化合物(I)之調配物可製備為離散單元,諸如丸劑、膠囊、扁囊劑或錠劑,其各自含有預定量之本發明化合物。Formulations suitable for oral administration of compound (I) can be prepared as discrete units, such as pills, capsules, cachets, or lozenges, each containing a predetermined amount of a compound of the present invention.

壓縮錠劑可藉由在適合的機器中壓縮視情況與黏合劑、潤滑劑、惰性稀釋劑、防腐劑、表面活性劑或分散劑混合之自由流動型式(諸如粉末或顆粒)的活性成分來製備。模製錠劑可藉由使經惰性液體稀釋劑濕潤之粉末狀活性成分之混合物在適合的機器中模製來製造。可將錠劑視情況包覆包衣或刻痕且視情況調配,以便提供活性成分自其緩慢或控制釋放。Compressed lozenges can be prepared by compressing in a suitable machine the active ingredients of a free-flowing type (such as powder or granules) mixed with binders, lubricants, inert diluents, preservatives, surfactants or dispersants. . Molded lozenges can be manufactured by molding a mixture of powdered active ingredients moistened with an inert liquid diluent in a suitable machine. The lozenges can be coated or scored as appropriate and formulated as appropriate to provide slow or controlled release of the active ingredient from it.

可製備錠劑、糖衣錠、口含錠、水性或油性懸浮液、可分散散劑或顆粒劑、乳劑、硬膠囊或軟膠囊(例如明膠膠囊)、糖漿或酏劑用於經口使用。意欲經口使用之化合物(I)之調配物可根據製造醫藥組合物之技術中已知的任何方法製備,且此類組合物可含有一或多種藥劑,包括甜味劑、調味劑、著色劑及防腐劑,以提供可口製劑。含有與醫藥學上可接受之無毒賦形劑混合的活性成份之錠劑係可接受的,其中該賦形劑適用於製造錠劑。此等賦形劑可為例如惰性稀釋劑,諸如碳酸鈣或碳酸鈉、乳糖、磷酸鈣或磷酸鈉;粒化劑及崩解劑,諸如玉米澱粉或海藻酸;結合劑,諸如澱粉、明膠或阿拉伯膠(acacia);及潤滑劑,諸如硬脂酸鎂、硬脂酸或滑石。錠劑可未包覆包衣或可藉由已知技術(包括微囊封裝)包覆包衣以延遲在胃腸道中崩解及吸收,且由此提供較長時期的持久作用。舉例而言,諸如單硬脂酸甘油酯或二硬脂酸甘油酯之時間延遲材料可單獨採用或與蠟一起採用。Tablets, dragees, buccal tablets, aqueous or oily suspensions, dispersible powders or granules, emulsions, hard or soft capsules (eg gelatin capsules), syrups or elixirs can be prepared for oral use. The formulation of the compound (I) intended for oral use can be prepared according to any method known in the art of manufacturing pharmaceutical compositions, and such compositions may contain one or more agents including sweeteners, flavoring agents, coloring agents And preservatives to provide palatable preparations. Lozenges containing active ingredients mixed with pharmaceutically acceptable non-toxic excipients are acceptable, and the excipients are suitable for the manufacture of lozenges. Such excipients can be, for example, inert diluents such as calcium carbonate or sodium carbonate, lactose, calcium phosphate or sodium phosphate; granulating agents and disintegrating agents such as corn starch or alginic acid; binding agents such as starch, gelatin or Acacia; and lubricants such as magnesium stearate, stearic acid or talc. Lozenges may be uncoated or they may be coated by known techniques, including microencapsulation, to delay disintegration and absorption in the gastrointestinal tract and thereby provide a sustained action over a longer period. For example, time delay materials such as glyceryl monostearate or glyceryl distearate can be used alone or with wax.

適合的經口投與型式之實例係錠劑,其含有約1 mg、5 mg、10 mg、25 mg、30 mg、50 mg、80 mg、100 mg、150 mg、250 mg、300 mg及500 mg之本發明化合物與約90至30 mg無水乳糖、約5至40 mg交聯羧甲纖維素鈉、約5至30 mg聚乙烯吡咯啶酮(PVP) K30及約1至10 mg硬脂酸鎂複合。首先將粉末狀成分混合在一起,且接著與PVP之溶液混合。可將所得組合物乾燥,粒化,與硬脂酸鎂混合且使用習知設備壓縮成錠劑型式。可藉由將例如5至400 mg本發明化合物溶解於適合的緩衝溶液(例如磷酸鹽緩衝劑)中,必要時添加張力劑(例如鹽,諸如氯化鈉),來製備氣溶膠調配物之實例。溶液可例如使用0.2微米過濾器過濾以移除雜質及污染物。Examples of suitable oral administration forms are lozenges, which contain about 1 mg, 5 mg, 10 mg, 25 mg, 30 mg, 50 mg, 80 mg, 100 mg, 150 mg, 250 mg, 300 mg and 500 mg of the compound of the invention with about 90 to 30 mg of anhydrous lactose, about 5 to 40 mg of croscarmellose sodium, about 5 to 30 mg of polyvinylpyrrolidone (PVP) K30, and about 1 to 10 mg of stearic acid Magnesium compound. The powdered ingredients are mixed together first, and then mixed with the solution of PVP. The resulting composition can be dried, granulated, mixed with magnesium stearate and compressed into a tablet form using conventional equipment. Examples of aerosol formulations can be prepared by dissolving, for example, 5 to 400 mg of the compound of the present invention in a suitable buffer solution (e.g. phosphate buffer) and adding a tonicity agent (e.g. salt such as sodium chloride) if necessary . The solution can be filtered, for example, using a 0.2 micron filter to remove impurities and contaminants.

調配物可封裝於單位劑量或多劑量容器中,例如密封安瓿及小瓶中,且可儲存在冷凍乾燥(凍乾)之條件下,僅需要在即將使用前添加例如水之無菌液體載劑即可注射。可自先前所述種類之無菌散劑、顆粒劑及錠劑製備臨時注射溶液及懸浮液。較佳單位劑量調配物為含有如上文所述之日劑量或單位每日子劑量或其適當部分之活性成分的調配物。The formulation can be packaged in unit-dose or multi-dose containers, such as sealed ampoules and vials, and can be stored in freeze-dried (lyophilized) conditions, just add a sterile liquid carrier such as water just before use injection. Temporary injection solutions and suspensions can be prepared from sterile powders, granules, and lozenges of the kind previously described. A preferred unit dose formulation is a formulation containing the daily dosage or unit daily sub-dose or an appropriate portion of the active ingredient as described above.

當結合目標位於大腦中時,本發明之某些實施例提供能夠穿越血腦障壁之化合物(I)。某些神經退化性疾病與血腦障壁之滲透性增加有關,以使得可容易將化合物(I)引入至大腦中。當血腦障壁保持完整時,存在若干此項技術已知之用於穿過該血腦障壁輸送分子之方法,包括(但不限於)物理方法、基於脂質之方法及基於受體及通道之方法。When the binding target is located in the brain, some embodiments of the present invention provide a compound (I) capable of crossing the blood-brain barrier. Certain neurodegenerative diseases are associated with increased permeability of the blood-brain barrier, so that the compound (I) can be easily introduced into the brain. When the blood-brain barrier remains intact, there are several methods known in the art for transporting molecules through the blood-brain barrier, including (but not limited to) physical methods, lipid-based methods, and receptor and channel-based methods.

跨越血腦障壁輸送化合物(I)之物理方法包括(但不限於)完全規避血腦障壁或藉由在血腦障壁中產生開口。Physical methods of transporting the compound (I) across the blood-brain barrier include, but are not limited to, completely avoiding the blood-brain barrier or by creating an opening in the blood-brain barrier.

規避方法包括(但不限於)直接注射至大腦中(參見例如Papanastassiou等人, Gene Therapy 9:398-406, 2002)、間質輸注/對流增強之遞送(參見例如Bobo等人,Proc. Natl. Acad. Sci. U.S.A. 91 :2076-2080, 1994)及在大腦中植入遞送裝置(參見例如Gill等人,Nature Med. 9:589-595, 2003;及Gliadel Wafers™, Guildford。Circumvention methods include (but are not limited to) direct injection into the brain (see, for example, Papanastassiou et al., Gene Therapy 9:398-406, 2002), interstitial infusion/convection enhanced delivery (see, for example, Bobo et al., Proc. Natl. Acad. Sci. USA 91: 2076-2080, 1994) and implantation of delivery devices in the brain (see, for example, Gill et al., Nature Med. 9:589-595, 2003; and Gliadel Wafers™, Guildford.

在障壁中形成開口之方法包括(但不限於)超音波(參見例如美國專利公開案第2002/0038086號)、滲透壓(例如藉由投與高滲透壓甘露糖醇(Neuwelt, E. A., Implication of the Blood-Brain Barrier and its Manipulation,第1及2卷,Plenum Press, N.Y., 1989))及藉由例如緩激肽(bradykinin)或滲透劑A-7之滲透(參見例如美國專利第5,112,596號、第5,268,164號、第5,506,206號及第5,686,416號)。Methods for forming openings in the barrier include (but are not limited to) ultrasound (see, for example, U.S. Patent Publication No. 2002/0038086), osmotic pressure (for example, by administering high osmolarity mannitol (Neuwelt, EA, Implication of the Blood-Brain Barrier and its Manipulation, Volumes 1 and 2, Plenum Press, NY, 1989)) and penetration by, for example, bradykinin or penetrant A-7 (see, for example, U.S. Patent No. 5,112,596, Nos. 5,268,164, 5,506,206 and 5,686,416).

跨越血腦障壁輸送化合物(I)之基於脂質之方法包括(但不限於)將化合物(I)囊封於與抗體結合片段偶合之脂質體中,該等抗體結合片段結合至血腦障壁之血管內皮上之受體(參見例如美國專利申請公開案第2002/0025313號)及將化合物(I)塗佈於低密度脂蛋白粒子(參見例如美國專利申請公開案第2004/0204354號)或載脂蛋白E(參見例如美國專利申請公開案第2004/0131692號)中。Lipid-based methods for delivering compound (I) across the blood-brain barrier include, but are not limited to, encapsulating compound (I) in liposomes coupled to antibody-binding fragments that bind to blood vessel of blood-brain barrier Receptor on the endothelium (see, for example, U.S. Patent Application Publication No. 2002/0025313) and applying compound (I) to low-density lipoprotein particles (see, for example, U.S. Patent Application Publication No. 2004/0204354) or apolipolipid Protein E (see, eg, US Patent Application Publication No. 2004/0131692).

跨越血腦障壁輸送化合物(I)之基於受體及通道之方法包括(但不限於)使用糖皮質激素阻斷劑以增加血腦障壁之滲透性(參見例如美國專利申請公開案第2002/0065259號、第2003/0162695號及第2005/0124533號);活化鉀通道(參見例如美國專利申請公開案第2005/0089473號),抑制ABC藥物轉運蛋白(參見例如美國專利申請公開案第2003/0073713號);用轉鐵蛋白塗佈化合物(I)及調節一或多種轉鐵蛋白受體之活性(參見例如美國專利申請公開案第2003/0129186號)及使抗體陽離子化(參見例如美國專利第5,004,697號)。Receptor and channel-based methods for delivering compound (I) across the blood-brain barrier include (but are not limited to) the use of glucocorticoid blockers to increase the permeability of the blood-brain barrier (see, eg, US Patent Application Publication No. 2002/0065259 No. 2003/0162695 and 2005/0124533); activated potassium channels (see, eg, US Patent Application Publication No. 2005/0089473), inhibiting ABC drug transporters (see, eg, US Patent Application Publication No. 2003/0073713) No.); coating compound (I) with transferrin and modulating the activity of one or more transferrin receptors (see, eg, US Patent Application Publication No. 2003/0129186) and cationizing antibodies (see, eg, US Patent No. 5,004,697).

關於腦內用途,在某些實施例中,化合物可藉由輸注至CNS之儲液層中來連續投與,但快速注射可為可接受的。抑制劑可投與至腦室中或以其他方式引入至CNS或脊髓液中。投與可藉由使用留置導管及諸如泵之連續投與構件進行;或其可藉由植入投與,例如藉由腦內植入持續釋放型媒劑。更特定言之,抑制劑可經由長期植入之插管注射或藉助於滲透微型泵長期灌注。可用皮下泵,其經由小管將蛋白質遞送至腦室。高度精密泵可經由皮膚再填充且其傳遞速率可經設定,無需手術介入。涉及皮下泵裝置或經完全植入之藥物遞送系統進行連續腦室內輸注的適合的投與方案及遞送系統之實例係用於向阿茲海默氏症(Alzheimer's disease)患者及帕金森氏症(Parkinson's disease)之動物模型投與多巴胺、多巴胺促進劑及膽鹼激導性促進劑之彼等投與方案及遞送系統,如Harbaugh, J. Neural Transm.增刊24:271, 1987;及DeYebenes等人,Mov. Disord. 2: 143, 1987所述。Regarding intracerebral use, in certain embodiments, the compound may be continuously administered by infusion into the CNS reservoir, but rapid injection may be acceptable. The inhibitor can be administered into the ventricle or otherwise introduced into the CNS or spinal fluid. The administration can be performed by using an indwelling catheter and a continuous administration member such as a pump; or it can be administered by implantation, for example, by implanting a sustained-release vehicle into the brain. More specifically, the inhibitor may be injected through a long-term implanted cannula or long-term infusion by means of an osmotic micropump. A subcutaneous pump can be used, which delivers the protein to the ventricle via a small tube. The highly precise pump can be refilled through the skin and its delivery rate can be set without surgical intervention. Examples of suitable administration protocols and delivery systems involving continuous intraventricular infusion of a hypodermic pump device or a fully implanted drug delivery system are used for Alzheimer's disease patients and Parkinson's disease ( Parkinson's disease) animal model administration dopamine, dopamine accelerators and choline stimulating accelerators and other administration programs and delivery systems, such as Harbaugh, J. Neural Transm. Supplement 24:271, 1987; and DeYebenes and others , Mov. Disord. 2: 143, 1987.

適應症及治療方法Indications and treatment

已展示代表性本發明化合物調節TRPA1活性(參見例如WO 2016/128529)。因此,本發明化合物適用於治療由TRPA1活性介導之疾病及病狀。此類疾病及病狀包括(但不限於):疼痛(急性、慢性、發炎性或神經性疼痛);瘙癢或多種發炎性病症;內耳病症;發熱或其他溫度調節病症;氣管支氣管或隔膜功能障礙;胃腸或泌尿道病症;慢性阻塞性肺病;失禁;及與至CNS之血流減少或CNS低氧相關之病症。Representative compounds of the invention have been shown to modulate TRPA1 activity (see for example WO 2016/128529). Therefore, the compounds of the present invention are suitable for the treatment of diseases and conditions mediated by TRPA1 activity. Such diseases and conditions include (but are not limited to): pain (acute, chronic, inflammatory or neuropathic pain); itching or various inflammatory conditions; inner ear disorders; fever or other temperature regulation disorders; tracheobronchial or diaphragm dysfunction ; Gastrointestinal or urinary tract disorders; chronic obstructive pulmonary disease; incontinence; and disorders related to decreased blood flow to the CNS or CNS hypoxia.

在一特定實施例中,可投與本發明化合物以治療疼痛,包括(但不限於)神經性及發炎性疼痛以及其他疼痛。某些類型之疼痛可認為係疾病或病症,而其他類型可認為係多種疾病或病症之症狀,且疼痛可包括多種致病源。可用根據本發明之TRPA1調節劑治療之例示性疼痛類型包括與以下有關、由其產生或由其所致之疼痛:骨關節炎、肌腱套病症、關節炎(例如類風濕性關節炎或發炎性關節炎;參見Barton等人 Exp. Mol. Pathol. 2006, 81(2), 166-170)、肌肉纖維疼痛、偏頭痛及頭痛(例如叢集性頭痛、竇性頭痛或緊張性頭痛;參見Goadsby Curr. Pain Headache Reports 2004, 8, 393)、鼻竇炎、口腔黏膜炎、牙痛、牙損傷、拔牙、牙感染、灼傷(Bolcskei等人, Pain 2005, 117(3), 368-376)、曬傷、皮膚炎、乾癬、濕疹、昆蟲蜇傷或叮咬、肌肉骨胳病症、骨折、韌帶扭傷、蹠筋膜炎、肋軟骨炎、肌腱炎、滑囊炎、網球肘、投手肘、髕骨肌腱炎、反覆拉傷、肌筋膜症候群、肌肉扭傷、肌炎、顳下頜關節病、切除術、下背痛、脊髓損傷、頸痛、頸部受傷、膀胱痙攣、腸胃道病症、膀胱炎、間質性膀胱炎、膽囊炎、泌尿道感染、尿道絞痛、腎絞痛、咽炎、唇疱疹、口腔炎、外耳炎、中耳炎(Chan等人, Lancet, 2003, 361, 385)、口腔灼熱症候群、黏膜炎、食道疼痛、食道痙攣、腹部病症、胃食道逆流病、胰臟炎、腸炎、腸激躁症、發炎性腸病、克羅恩氏病(Crohn's disease)、潰瘍性結腸炎、結腸擴張、腹部收縮、憩室病、憩室炎、腸氣、痔瘡、肛裂、肛門直腸病、前列腺炎、附睪炎、睪丸疼痛、直腸炎、直腸疼痛、陣痛、分娩、子宮內膜異位、月經痛性痙攣、骨盆疼痛、外陰疼痛、陰道炎、口唇及生殖器感染(例如單純疱疹病毒)、肋膜炎、心包炎、非心胸疼痛、挫傷、擦傷、皮膚切口(Honore, P.等人, J Pharmacal Exp Ther., 2005, 314, 410-21)、手術後疼痛、周邊神經病變、中樞神經病、糖尿病性神經病、急性疱疹性神經痛、疱疹後神經痛、三叉神經痛、舌咽神經痛、非典型面部疼痛、神經根病變(gradiculopathy)、HIV相關之神經病、物理性神經損傷、灼性神經痛、反射性交感神經失養症、坐骨神經痛、頸椎、胸部或腰椎神經根病變、肱叢病、腰叢病、神經退化病症、枕骨神經痛、肋間神經痛、眶上神經痛、腹股溝神經痛、異常性股痛、生殖股神經痛、腕隧道症候群、摩頓氏神經瘤(Morton's neuroma)、乳房切除術後症候群、開胸術後症候群、脊髓灰質炎後症候群、格-巴二氏症候群(Guillain-Barre syndrome)、雷諾氏症候群(Raynaud's syndrome)、冠狀動脈痙攣(普林茲氏(Printzmetal's)或變異型心絞痛)、內臟痛覺過敏(Pomonis, J.D.等人 J. Pharmacal. Exp. Ther. 2003, 306, 387;Walker, K.M.等人, J. Pharmacal. Exp. Ther. 2003, 304(1), 56-62)、丘腦疼痛、癌症(例如藉由輻射或化學療法治療癌症或藉由與癌症有關之神經或骨骼病變得到之由癌症(包括溶骨肉瘤)所致之疼痛(參見Menendez, L.等人, Neurosci. Lett. 2005, 393 (1), 70-73;Asai, H.等人, Pain 2005, 117, 19-29)或骨骼破壞疼痛(參見Ghilardi, J.R.等人, J. Neurosci. 2005, 25, 3126-31))、感染或代謝疾病。另外,化合物可用以治療疼痛適應症,諸如內臟疼痛、眼痛、熱疼痛、牙齒疼痛、辣椒鹼誘發之疼痛(以及由辣椒鹼誘發之其他症狀性病症,諸如咳嗽、流淚及支氣管痙攣)。In a particular embodiment, the compounds of the present invention can be administered to treat pain, including but not limited to neuropathic and inflammatory pain and other pain. Some types of pain can be considered as diseases or conditions, while other types can be considered as symptoms of multiple diseases or conditions, and pain can include multiple pathogenic sources. Exemplary types of pain treatable with TRPA1 modulators according to the present invention include pain related to, caused by, or caused by: osteoarthritis, tendon cuff disorders, arthritis (eg, rheumatoid arthritis or inflammatory) Arthritis; see Barton et al. Exp. Mol. Pathol. 2006, 81(2), 166-170), muscle fiber pain, migraine and headache (such as cluster headache, sinus headache or tension headache; see Godsby Curr . Pain Headache Reports 2004, 8, 393), sinusitis, oral mucositis, toothache, tooth injury, tooth extraction, tooth infection, burns (Bolcskei et al., Pain 2005, 117(3), 368-376), sunburn, Dermatitis, psoriasis, eczema, insect stings or bites, musculoskeletal disorders, fractures, ligament sprains, plantar fasciitis, costochonditis, tendonitis, bursitis, tennis elbow, pitcher elbow, patellar tendonitis, Repetitive strain, myofascial syndrome, muscle sprain, myositis, temporomandibular joint disease, resection, lower back pain, spinal cord injury, neck pain, neck injury, bladder spasm, gastrointestinal disorders, cystitis, interstitial Cystitis, cholecystitis, urinary tract infection, urethral colic, renal colic, pharyngitis, cold sores, stomatitis, otitis media, otitis media (Chan et al., Lancet, 2003, 361, 385), oral burning syndrome, mucositis , Esophageal pain, esophageal cramps, abdominal disorders, gastroesophageal reflux disease, pancreatitis, enteritis, irritable bowel disease, inflammatory bowel disease, Crohn's disease (Crohn's disease), ulcerative colitis, colon dilation, abdomen Contractions, diverticulosis, diverticulitis, intestinal gas, hemorrhoids, anal fissure, anorectal disease, prostatitis, epididymitis, testicular pain, proctitis, rectal pain, labor pain, labor, endometriosis, menstrual pain spasms , Pelvic pain, vulvar pain, vaginitis, mouth and genital infections (such as herpes simplex virus), pleurisy, pericarditis, non-cardiothoracic pain, contusion, abrasions, skin incisions (Honore, P. et al., J Pharmacal Exp Ther., 2005, 314, 410-21), postoperative pain, peripheral neuropathy, central neuropathy, diabetic neuropathy, acute herpes neuralgia, post-herpetic neuralgia, trigeminal neuralgia, glossopharyngeal neuralgia, atypical facial pain, nerve Root disease (gradiculopathy), HIV-related neuropathy, physical nerve damage, cauteric neuralgia, reflex sympathetic dystrophy, sciatica, cervical spine, chest or lumbar radiculopathy, brachial plexus disease, lumbar plexus disease, nerve Degenerative disorders, occipital neuralgia, intercostal neuralgia, supraorbital neuralgia, inguinal neuralgia, abnormal femoral pain, reproductive femoral neuralgia, carpal tunnel syndrome, Morton's neuroma, postoperative mastectomy syndrome, open Thoracic surgery Posterior syndrome, post-polio syndrome, Guillain-Barre syndrome, Raynaud's syndrome, coronary artery spasm (Printzmetal's or variant angina), visceral hyperalgesia (Pomonis, JD et al. J. Pharmacal. Exp. Ther. 2003, 306, 387; Walker, KM et al., J. Pharmacal. Exp. Ther. 2003, 304(1), 56-62), thalamic pain, cancer (E.g. pain caused by cancer (including osteolytic sarcoma) obtained by treatment of cancer by radiation or chemotherapy or by nerve or bone lesions associated with cancer (see Menendez, L. et al., Neurosci. Lett. 2005, 393 (1), 70-73; Asai, H. et al., Pain 2005, 117, 19-29) or bone destruction pain (see Ghilardi, JR et al., J. Neurosci. 2005, 25, 3126-31)) , Infection or metabolic diseases. In addition, the compounds can be used to treat pain indications such as visceral pain, eye pain, heat pain, tooth pain, capsaicin-induced pain (as well as other symptomatic conditions induced by capsaicin, such as cough, tearing, and bronchospasm).

在另一特定實施例中,可投與本發明化合物以治療瘙癢,該瘙癢可由多種來源引起,諸如皮膚或發炎性病症。In another particular embodiment, the compounds of the present invention can be administered to treat itching, which can be caused by a variety of sources, such as skin or inflammatory conditions.

在另一特定實施例中,可投與本發明化合物以治療發炎性病症,包括選自由以下組成之群的病症:腎或肝膽病症、免疫病症、藥物反應及未知/特發性病症。可用本發明藥劑治療之發炎性病症包括例如發炎性腸病(IBO)、克羅恩氏病及潰瘍性結腸炎(Geppetti, P.等人, Br. J. Pharmacal. 2004, 141, 1313-20;Yiangou, Y.等人, Lancet2001, 357, 1338-39;Kimball, E.S.等人, Neurogastroenterol. Motif., 2004,16, 811)、骨關節炎(Szabo, A.等人, J. Pharmacal. Exp. Ther. 2005, 314, 111-119)、牛皮癬、牛皮癬性關節炎、類風濕性關節炎、重症肌無力、多發性硬化、硬皮病、絲球體腎炎、胰臟炎、發炎性肝炎、哮喘、慢性阻塞性肺病、過敏性鼻炎、葡萄膜炎及心臟血管炎症表現,包括動脈粥樣硬化、心肌炎、心包炎及血管炎。In another specific embodiment, the compounds of the present invention can be administered to treat inflammatory disorders, including disorders selected from the group consisting of renal or hepatobiliary disorders, immune disorders, drug reactions, and unknown/idiopathic disorders. Inflammatory conditions that can be treated with the agent of the present invention include, for example, inflammatory bowel disease (IBO), Crohn's disease, and ulcerative colitis (Geppetti, P. et al., Br. J. Pharmacal. 2004, 141, 1313-20 ; Yiangou, Y. et al., Lancet 2001, 357, 1338-39; Kimball, ES et al., Neurogastroenterol. Motif., 2004, 16, 811), osteoarthritis (Szabo, A. et al., J. Pharmacal. Exp Ther. 2005, 314, 111-119), psoriasis, psoriatic arthritis, rheumatoid arthritis, myasthenia gravis, multiple sclerosis, scleroderma, spheroid nephritis, pancreatitis, inflammatory hepatitis, asthma , Chronic obstructive pulmonary disease, allergic rhinitis, uveitis, and cardiovascular inflammation, including atherosclerosis, myocarditis, pericarditis, and vasculitis.

在另一特定實施例中,可投與本發明化合物以治療內耳病症。此類病症包括例如聽覺過敏、耳鳴、前庭超敏及間歇性頭暈。In another specific embodiment, the compounds of the present invention can be administered to treat inner ear disorders. Such conditions include, for example, hearing allergies, tinnitus, vestibular hypersensitivity, and intermittent dizziness.

舉例而言,可投與本發明化合物以治療氣管支氣管及隔膜功能障礙,包括例如哮喘及過敏相關之免疫反應(Agopyan, N.等人, Am. J. Physiol. Lung Cell Mol. Physiol. 2004, 286, L563-72;Agopyan, N.等人, Toxicol. Appl. Pharmacal. 2003, 192, 21-35)、咳嗽(例如急性或慢性咳嗽,或由胃食道逆流病刺激引起之咳嗽;參見Lalloo, U.G.等人, J. Appl. Physiol. 1995, 79(4), 1082-7)、支氣管痙攣、慢性阻塞性肺病、慢性支氣管炎、肺氣腫及連續打嗝(打嗝、呃逆)。For example, the compounds of the present invention can be administered to treat tracheobronchial and septal dysfunction, including, for example, asthma and allergy-related immune responses (Agopyan, N. et al., Am. J. Physiol. Lung Cell Mol. Physiol. 2004, 286, L563-72; Agopyan, N. et al., Toxicol. Appl. Pharmacal. 2003, 192, 21-35), cough (for example, acute or chronic cough, or cough caused by gastroesophageal reflux disease stimulation; see Lalloo, UG et al., J. Appl. Physiol. 1995, 79(4), 1082-7), bronchospasm, chronic obstructive pulmonary disease, chronic bronchitis, emphysema, and continuous hiccups (hiccups, hiccups).

在另一特定實施例中,可投與本發明化合物以治療胃腸及泌尿道病症,諸如膀胱過度活性、發炎性痛覺過敏、膀胱之內臟反射亢進、出血性膀胱炎(Dinis, P.等人, J Neurosci., 2004, 24, 11253-11263)、間質性膀胱炎(Sculptoreanu, A.等人, Neurosci Lett., 2005, 381, 42-46)、發炎性前列腺疾病、前列腺炎(Sanchez, M.等人, Eur J Pharmacal., 2005, 515, 20-27)、噁心、嘔吐、腸痙攣、腸腹脹、膀胱痙攣、尿急、便急及失禁衝動。In another specific embodiment, the compounds of the present invention can be administered to treat gastrointestinal and urinary tract disorders such as overactive bladder, inflammatory hyperalgesia, hypervisceral reflex of the bladder, hemorrhagic cystitis (Dinis, P. et al., J Neurosci., 2004, 24, 11253-11263), interstitial cystitis (Sculptoreanu, A. et al., Neurosci Lett., 2005, 381, 42-46), inflammatory prostate disease, prostatitis (Sanchez, M . Et al., Eur J Pharmacal., 2005, 515, 20-27), nausea, vomiting, intestinal cramps, intestinal bloating, bladder spasm, urgency, urgency, and impulsive incontinence.

在另一特定實施例中,可投與本發明化合物以治療與至CNS之血流減少或CNS低氧相關之病症。此類病症包括例如頭部外傷、脊損傷、血栓栓塞或出血性中風、瞬時缺血發作、大腦血管痙攣、低血糖症、心跳驟停、持續性癲癇、圍產期窒息、阿茲海默氏病及亨廷頓氏病(Huntington's Disease)。In another specific embodiment, the compounds of the present invention can be administered to treat conditions associated with reduced blood flow to the CNS or CNS hypoxia. Such conditions include, for example, head trauma, spinal injury, thromboembolism or hemorrhagic stroke, transient ischemic attack, cerebral vasospasm, hypoglycemia, cardiac arrest, persistent epilepsy, perinatal asphyxia, Alzheimer's Disease and Huntington's Disease.

在其他實施例中,可投與本發明化合物以治療由TRPA1活性介導之其他疾病、病症或病狀,諸如焦慮;學習或記憶病症;眼部相關病症(諸如青光眼、視覺喪失、眼內壓升高及結膜炎);禿髮(例如藉由刺激毛髮生長);糖尿病(包括耐胰島素糖尿病或由胰島素敏感性或分泌介導之糖尿病病狀);肥胖(例如藉由食慾抑制);消化不良;膽絞痛;腎絞痛;疼痛膀胱症候群;食道發炎;上呼吸道疾病;尿失禁;急性膀胱炎;及螫刺毒作用(諸如海洋生物、蛇或昆蟲蟄傷或叮咬,包括水母、蜘蛛或魟魚螫刺毒作用)。In other embodiments, the compounds of the present invention may be administered to treat other diseases, disorders or conditions mediated by TRPA1 activity, such as anxiety; learning or memory disorders; eye-related disorders (such as glaucoma, vision loss, intraocular pressure Elevation and conjunctivitis); Baldness (for example by stimulating hair growth); Diabetes (including insulin-resistant diabetes or diabetic conditions mediated by insulin sensitivity or secretion); Obesity (for example by appetite suppression); Indigestion; Biliary colic; renal colic; painful bladder syndrome; inflammation of the esophagus; upper respiratory tract disease; urinary incontinence; acute cystitis; and stinging effects (such as marine life, snake or insect stings or bites, including jellyfish, spiders, or stingrays) Fish sting poison effect).

在一個特定實施例中,投與本發明化合物以治療疼痛(包括(但不限於)急性、慢性、神經性及發炎性疼痛)、關節炎、瘙癢、咳嗽、哮喘或發炎性腸病。In a particular embodiment, the compounds of the present invention are administered to treat pain (including but not limited to acute, chronic, neuropathic and inflammatory pain), arthritis, itching, cough, asthma or inflammatory bowel disease.

在另一實施例中,本發明提供用於治療神經性疼痛或發炎性疼痛之方法,包含向有需要之個體投與治療有效量之如本文所述之化合物的步驟。In another embodiment, the present invention provides a method for treating neuropathic pain or inflammatory pain, comprising the step of administering a therapeutically effective amount of a compound as described herein to an individual in need.

在另一實施例中,本發明提供如本文所述之化合物或其醫藥學上可接受之鹽,其用於調節TRPA1活性。In another embodiment, the present invention provides a compound as described herein or a pharmaceutically acceptable salt thereof for use in modulating TRPA1 activity.

在另一實施例中,本發明提供如本文所述之化合物或其醫藥學上可接受之鹽,其用於醫學療法。In another embodiment, the present invention provides a compound as described herein or a pharmaceutically acceptable salt thereof for use in medical therapy.

在另一實施例中,本發明提供用於治療選自慢性阻塞性肺病(COPD)、哮喘、過敏性鼻炎及支氣管痙攣之呼吸道病症的方法,包含向有需要之個體投與治療有效量之如本文所述之化合物的步驟。In another embodiment, the present invention provides a method for treating a respiratory tract disorder selected from chronic obstructive pulmonary disease (COPD), asthma, allergic rhinitis and bronchospasm, comprising administering a therapeutically effective amount such as The steps of the compounds described herein.

在另一實施例中,本發明提供如本文所述之化合物或其醫藥學上可接受之鹽,其用於治療或預防呼吸道病症。In another embodiment, the present invention provides a compound as described herein or a pharmaceutically acceptable salt thereof for use in the treatment or prevention of respiratory disorders.

在另一實施例中,本發明提供如本文所述之化合物或其醫藥學上可接受之鹽的用途,其用於製備供治療或預防呼吸道病症用之藥物。In another embodiment, the present invention provides the use of a compound as described herein or a pharmaceutically acceptable salt thereof for the preparation of a medicament for the treatment or prevention of respiratory disorders.

在另一實施例中,本發明提供用於治療哺乳動物(例如人類)之呼吸道病症之方法,其包含向哺乳動物投與如本文所述之化合物或其醫藥學上可接受之鹽。In another embodiment, the present invention provides a method for treating a respiratory disorder of a mammal (eg, a human), which comprises administering to a mammal a compound as described herein or a pharmaceutically acceptable salt thereof.

在另一實施例中,本發明提供用於調節TRPA1活性之方法,其包含使TRPA1與如本文所述之化合物或其醫藥學上可接受之鹽接觸。In another embodiment, the present invention provides a method for modulating TRPA1 activity, which comprises contacting TRPA1 with a compound as described herein or a pharmaceutically acceptable salt thereof.

在另一實施例中,本發明提供如本文所述之化合物或其醫藥學上可接受之鹽,其用於治療或預防由TRPA1活性介導之疾病或病狀。在此實施例之態樣內,疾病或病狀係疼痛(包括(但不限於)急性、慢性、神經性或發炎性疼痛)、瘙癢、發炎性病症、內耳病症、發熱或其他溫度調節病症、氣管支氣管或隔膜功能障礙、胃腸或泌尿道病症、慢性阻塞性肺病、失禁或與至CNS之血流減少或CNS低氧相關之病症。在此實施例之某些態樣內,其中疾病或病狀係疼痛(包括但不限於急性、慢性、神經性及發炎性疼痛)、關節炎、瘙癢、咳嗽、哮喘、發炎性腸疾病或內耳病症。In another embodiment, the present invention provides a compound as described herein or a pharmaceutically acceptable salt thereof for use in the treatment or prevention of diseases or conditions mediated by TRPA1 activity. In the aspect of this embodiment, the disease or condition is pain (including but not limited to acute, chronic, neuropathic or inflammatory pain), itching, inflammatory disorders, inner ear disorders, fever or other temperature regulation disorders, Tracheobronchial or diaphragm dysfunction, gastrointestinal or urinary tract disorders, chronic obstructive pulmonary disease, incontinence, or disorders related to reduced blood flow to the CNS or CNS hypoxia. Within certain aspects of this embodiment, where the disease or condition is pain (including but not limited to acute, chronic, neuropathic, and inflammatory pain), arthritis, itching, cough, asthma, inflammatory bowel disease, or inner ear disease.

在另一實施例中,本發明提供如本文所述之化合物或其醫藥學上可接受之鹽的用途,其用於製備供治療或預防由TRPA1活性介導之疾病或病狀用之藥物。在此實施例之態樣內,疾病或病狀係疼痛(包括(但不限於)急性、慢性、神經性或發炎性疼痛)、瘙癢、發炎性病症、內耳病症、發熱或其他溫度調節病症、氣管支氣管或隔膜功能障礙、胃腸或泌尿道病症、慢性阻塞性肺病、失禁或與至CNS之血流減少或CNS低氧相關之病症。在此實施例之態樣內,疾病或病狀係疼痛(包括(但不限於)急性、慢性、神經性及發炎性疼痛)、關節炎、瘙癢、咳嗽、哮喘、發炎性腸病或內耳病症。In another embodiment, the present invention provides the use of a compound as described herein or a pharmaceutically acceptable salt thereof for the preparation of a medicament for the treatment or prevention of a disease or condition mediated by TRPA1 activity. In the aspect of this embodiment, the disease or condition is pain (including but not limited to acute, chronic, neuropathic or inflammatory pain), itching, inflammatory disorders, inner ear disorders, fever or other temperature regulation disorders, Tracheobronchial or diaphragm dysfunction, gastrointestinal or urinary tract disorders, chronic obstructive pulmonary disease, incontinence, or disorders related to reduced blood flow to the CNS or CNS hypoxia. Within the aspect of this embodiment, the disease or condition is pain (including but not limited to acute, chronic, neuropathic and inflammatory pain), arthritis, itching, cough, asthma, inflammatory bowel disease or inner ear disorders .

在另一實施例中,本發明提供用於治療哺乳動物(例如人類)之由TRPA1活性介導之疾病或病狀之方法,其包含向哺乳動物投與如本文所述之化合物或其醫藥學上可接受之鹽。在此實施例之某些態樣內,疾病或病狀係疼痛(包括(但不限於)急性、慢性、神經性或發炎性疼痛)、瘙癢、發炎性病症、內耳病症、發熱或其他溫度調節病症、氣管支氣管或隔膜功能障礙、胃腸或泌尿道病症、慢性阻塞性肺病、失禁或與至CNS之血流減少或CNS低氧相關之病症。在此實施例之某些態樣內,疾病或病狀係疼痛(包括但不限於急性、慢性、神經性及發炎性疼痛)、關節炎、瘙癢、咳嗽、哮喘、發炎性腸疾病或內耳病症。在一些實施例中,疾病或病狀係哮喘。In another embodiment, the present invention provides a method for treating a disease or condition mediated by TRPA1 activity in a mammal (eg, a human), which comprises administering to the mammal a compound as described herein or a pharmaceutical Acceptable salt. In certain aspects of this embodiment, the disease or condition is pain (including but not limited to acute, chronic, neuropathic, or inflammatory pain), itching, inflammatory disorders, inner ear disorders, fever, or other temperature regulation Disorders, tracheobronchial or diaphragm dysfunction, gastrointestinal or urinary tract disorders, chronic obstructive pulmonary disease, incontinence, or disorders related to reduced blood flow to the CNS or CNS hypoxia. In certain aspects of this embodiment, the disease or condition is pain (including but not limited to acute, chronic, neuropathic and inflammatory pain), arthritis, itching, cough, asthma, inflammatory bowel disease or inner ear disorders . In some embodiments, the disease or condition is asthma.

組合療法Combination therapy

在治療離子通道介導之疾病及病狀中,本發明化合物可有效地與一或多種其他本發明化合物或一種或多種其他治療劑組合或作為其任何組合。舉例而言,本發明化合物可同時、依序或分別與其他治療劑組合投與,該等其他治療劑包括(但不限於)以下。In the treatment of diseases and conditions mediated by ion channels, the compounds of the present invention can be effectively combined with one or more other compounds of the present invention or one or more other therapeutic agents or as any combination thereof. For example, the compounds of the present invention can be administered simultaneously, sequentially, or separately in combination with other therapeutic agents, including (but not limited to) the following.

鴉片鎮痛劑,例如嗎啡鹼(morphine)、海洛因(heroin)、可卡因(cocaine)、氧化嗎啡(oxymorphine)、左啡諾(levorphanol)、左洛啡烷(levallorphan)、氧可酮(oxycodone)、可待因(codeine)、二氫可待因、丙氧吩(propoxyphene)、納美芬(nalmefene)、芬太尼(fentanyl)、氫可酮(hydrocodone)、氫嗎啡酮(hydromorphone)、美利皮定(meripidine)、美沙酮(methadone)、納洛芬(nalorphine)、納洛酮(naloxone)、納曲酮(naltrexone)、丁基原啡因(buprenorphine)、布托啡諾(butorphanol)、納布啡(nalbuphine)及戊唑星(pentazocine)。Opioid analgesics, such as morphine, heroin, cocaine, oxymorphine, levorphanol, levallorphan, oxycodone, cocaine Codeine, dihydrocodeine, propoxyphene, nalmefene, fentanyl, hydrocodone, hydromorphone, melipid Meripidine, methadone, nalorphine, naloxone, naltrexone, buprenorphine, butorphanol, butorphanol nalbuphine) and pentazocine.

非鴉片鎮痛劑,例如乙醯美尼芬(acetomeniphen)及水楊酸鹽(例如阿司匹林(aspirin))。Non-opioid analgesics, such as acetomeniphen and salicylates (such as aspirin).

非類固醇抗炎藥物(NSAID),例如布洛芬(ibuprofen)、萘普生(naproxen)、非諾洛芬(fenoprofen)、酮洛芬(ketoprofen)、塞內昔布(celecoxib)、雙氯芬酸(diclofenac)、地夫西納(diflusinal)、依託度酸(etodolac)、芬布芬(fenbufen)、非諾洛芬(fenoprofen)、氟苯柳(flufenisal)、氟比洛芬(flurbiprofen)、布洛芬、吲哚美辛(indomethacin)、酮洛芬、酮咯酸(ketorolac)、甲氯芬那酸(meclofenamic acid)、甲芬那酸(mefenamic acid)、美洛昔康(meloxicam)、萘丁美酮(nabumetone)、萘普生(naproxen)、尼美舒利(nimesulide)、硝基氟吡洛芬(nitroflurbiprofen)、奧沙拉嗪(olsalazine)、奧沙普嗪(oxaprozin)、苯基丁氮酮(phenylbutazone)、吡羅昔康(piroxicam)、柳氮磺胺吡啶(sulfasalazine)、舒林酸(sulindac)、托美丁(tolmetin)及佐美酸(zomepirac)。Non-steroidal anti-inflammatory drugs (NSAIDs), such as ibuprofen, naproxen, fenoprofen, ketoprofen, celecoxib, diclofenac ), diflusinal, etodolac, fenbufen, fenoprofen, flufenisal, flurbiprofen, ibuprofen, Indomethacin, ketoprofen, ketorolac, meclofenamic acid, mefenamic acid, meloxicam, nabumetone (nabumetone), naproxen, nimesulide, nitroflurbiprofen, olsalazine, oxaprozin, phenylbutazone ( phenylbutazone), piroxicam (piroxicam), sulfasalazine (sulfasalazine), sulindac (sulindac), tolmetin (tolmetin) and zomepiric acid (zomepirac).

抗痙攣劑,例如卡馬西平(carbamazepine)、奧卡西平(oxcarbazepine)、拉莫三嗪(lamotrigine)、丙戊酸鹽(valproate)、托吡酯(topiramate)、加巴噴丁(gabapentin)及普瑞巴林(pregabalin)。Antispasmodic agents such as carbamazepine, oxcarbazepine, lamotrigine, valproate, topiramate, gabapentin, and pregabalin ).

抗抑鬱劑,諸如三環抗抑鬱劑,例如阿米曲替林(amitriptyline)、氯米帕明(clomipramine)、去甲丙咪嗪(despramine)、丙咪嗪(imipramine)及去甲替林(nortriptyline)。Antidepressants, such as tricyclic antidepressants, such as amitriptyline, clomipramine, despramine, imipramine, and nortriptyline ( nortriptyline).

COX-2選擇性抑制劑,例如塞內昔布(celecoxib)、羅非考昔(rofecoxib)、帕瑞考昔(parecoxib)、伐地考昔(valdecoxib)、德拉昔布(deracoxib)、依他昔布(etoricoxib)及盧米羅可(lumiracoxib)。COX-2 selective inhibitors, such as celecoxib, celecoxib, rofecoxib, parecoxib, valdecoxib, deracoxib, etaxibu (etoricoxib) and lumiracoxib.

α腎上腺素能藥物,例如多沙唑嗪(doxazosin)、他蘇洛辛(tamsulosin)、可樂定(clonidine)、胍法新(guanfacine)、右旋美托咪啶(dexmetatomidine)、莫達非尼(modafinil)及4-胺基-6,7-二甲氧基-2-(5-甲烷磺醯胺基-1,2,3,4-四氫異喹啉-2-基)-5-(2-吡啶基)喹唑啉。Alpha adrenergic drugs, such as doxazosin, doxazosin, tamsulosin, clonidine, guanfacine, dexmetatomidine, modafinil (modafinil) and 4-amino-6,7-dimethoxy-2-(5-methanesulfonamido-1,2,3,4-tetrahydroisoquinolin-2-yl)-5- (2-pyridyl) quinazoline.

巴比妥酸鹽鎮靜劑,例如異戊巴比妥(amobarbital)、阿普比妥(aprobarbital)、布塔巴比妥(butabarbital)、布他比妥(butabital)、甲苯巴比妥(mephobarbital)、甲巴比妥(metharbital)、美索比妥(methohexital)、戊巴比妥(pentobarbital)、苯巴比妥(phenobartital)、司可巴比妥(secobarbital)、他布比妥(talbutal)、塞米樂(theamylal)及硫噴妥(thiopental)。Barbiturate sedatives, such as amobarbital (amobarbital), aprobarbital (aprobarbital), butabarbital (butabarbital), butabital (butabital), metobarbital (mephobarbital), Methobarbital, methohexital, pentobarbital, phenobartital, phenobartital, secobarbital, talbutal, and cyprol Miller (theamylal) and thiopental (thiopental).

速激肽(NK)拮抗劑,尤其NK-3、NK-2或NK-1拮抗劑,例如(aR, 9R)-7-[3,5-雙(三氟甲基)苯甲基)]-8,9,10,11-四氫-9-甲基-5-(4-甲基苯基)-7H-[1,4]二氮雜環辛并[2,1-g][1,7]-㖠啶-6-13-二酮(TAK-637)、5-[[2R,3S)-2-[(1R)-1-[3,5-雙(三氟甲基苯基]乙氧基-3-(4-氟苯基)-4-嗎啉基]-甲基]-1,2-二氫-3H-1,2,4-三唑-3-酮(MK-869)、阿瑞匹坦(aprepitant)、蘭比特(lanepitant)、達比特(dapitant)或3-[[2-甲氧基5-(三氟甲氧基)苯基]-甲胺基]-2-苯基哌啶(2S,3S)。Tachykinin (NK) antagonists, especially NK-3, NK-2 or NK-1 antagonists, such as (aR, 9R)-7-[3,5-bis(trifluoromethyl)benzyl)] -8,9,10,11-tetrahydro-9-methyl-5-(4-methylphenyl)-7H-[1,4]diazepine[2,1-g][1 ,7]-㖠idine-6-13-dione (TAK-637), 5-[[2R,3S)-2-[(1R)-1-[3,5-bis(trifluoromethylphenyl ]Ethoxy-3-(4-fluorophenyl)-4-morpholinyl]-methyl]-1,2-dihydro-3H-1,2,4-triazol-3-one (MK- 869), aprepitant, lanepitant, dapitant or 3-[[2-methoxy5-(trifluoromethoxy)phenyl]-methylamino]- 2-phenylpiperidine (2S, 3S).

煤焦油鎮痛劑,例如撲熱息痛(paracetamol)。Coal tar analgesics, such as paracetamol.

血清素再吸收抑制劑,例如帕羅西汀(paroxetine)、舍曲林(sertraline)、去甲氟西汀(norfluoxetine)(氟西汀去甲基代謝物)、代謝物去甲舍曲林(demethylsertraline)、'3氟伏沙明('3 fluvoxamine)、帕羅西汀(paroxetine)、西它普蘭(citalopram)、西它普蘭代謝物去甲西他普蘭、草酸依西普蘭(escitalopram)、d,l-氟苯丙胺、非莫西汀(femoxetine)、依夫西汀(ifoxetine)、氰基多沙必(cyanodothiepin)、立替西汀(litoxetine)、達泊西汀(dapoxetine)、奈法唑酮(nefazodone)、塞瑞拉明(cericlamine)、曲唑酮(trazodone)及氟西汀(fluoxetine)。Serotonin reuptake inhibitors such as paroxetine, sertraline, norfluoxetine (fluoxetine demethyl metabolite), metabolite demethylsertraline , '3 fluvoxamine,'paroxetine, paroxetine, citalopram, citalopram metabolite norcitapram, escitalopram oxalate (escitalopram), d,l-fluoroamphetamine , Femoxetine, ifoxetine, cyanodothiepin, litodoxiepin, litoxetine, dapoxetine, nefazodone, cephalosporin Reliamine (cericlamine), trazodone (trazodone) and fluoxetine (fluoxetine).

去甲腎上腺素(正腎上腺素)再吸收抑制劑,例如麥普替林(maprotiline)、洛夫帕明(lofepramine)、米氮平(mirtazepine)、羥丙替林(oxaprotiline)、非左拉明(fezolamine)、托莫西汀(tomoxetine)、米安色林(mianserin)、丁胺苯丙酮(buproprion)、丁胺苯丙酮代謝物羥基丁胺苯丙酮、諾米芬辛(nomifensine)及維洛沙嗪(viloxazine)(Vivalan®)),尤其選擇性去甲腎上腺素再吸收抑制劑,諸如瑞波西汀(reboxetine),尤其(S,S)-瑞波西汀,及文拉法辛(venlafaxine)度洛西汀(duloxetine)精神安定鎮靜劑/抗焦慮劑。Norepinephrine (norepinephrine) reuptake inhibitors, such as maprotiline (lopropramine), lofepramine, mirtazepine, oxaprotiline, non-levolamin (fezolamine), tomoxetine, mianserin, buproprion, buproprion, hydroxybutamine acetone, nomifensine and vero Viloxazine (Vivalan®)), especially selective norepinephrine reuptake inhibitors, such as reboxetine, especially (S,S)-reboxetine, and venlafaxine Duloxetine is a sedative/anxiolytic agent.

雙血清素-去甲腎上腺素再吸收抑制劑,諸如文拉法辛、文拉法辛代謝物O-去甲文拉法辛、氯米帕明、氯米帕明代謝物去甲氯米帕明、度洛西汀、米那普侖(milnacipran)及丙咪嗪。Double serotonin-norepinephrine reuptake inhibitors, such as venlafaxine, venlafaxine metabolite O-desvenlafaxine, clomipramine, clomipramine metabolite norclomipramine Ming, duloxetine, milnacipran and imipramine.

乙醯膽鹼酯酶抑制劑,例如多奈哌齊(donepezil)。Acetylcholinesterase inhibitors, such as donepezil.

5-HT3拮抗劑,例如昂丹司瓊(ondansetron)。5-HT3 antagonists, such as ondansetron.

代謝型麩胺酸受體(mGluR)拮抗劑。Metabolic glutamate receptor (mGluR) antagonist.

局部麻醉劑,例如美西律(mexiletine)及利多卡因(lidocaine)。Local anesthetics such as mexiletine and lidocaine.

皮質類固醇,例如地塞米松(dexamethasone)。Corticosteroids, such as dexamethasone.

抗心律失常藥,例如美西律及苯妥英(phenytoin)。Antiarrhythmic drugs, such as mexiletine and phenytoin.

蕈毒鹼拮抗劑,例如托特羅定(tolterodine)、丙哌維林(propiverine)、曲司氯銨(tropsium chloride)、達非那新(darifenacin)、索非那新(solifenacin)、替米維林(temiverine)及異丙托銨(ipratropium)。Muscarinic antagonists such as tolterodine, propiverine, tropsium chloride, darifenacin, solifenacin, tilmi Temiverine and ipratropium.

大麻素(cannabinoid)。Cannabinoid.

香草精類受體促效劑(例如樹脂氟瑞辛(resinferatoxin))或拮抗劑(例如辣椒平(capsazepine))。Vanilla extract receptor agonists (such as resinferatoxin) or antagonists (such as capsazepine).

鎮靜劑,例如格魯米特(glutethimide)、安寧(meprobamate)、甲喹酮(methaqualone)及氯醛比林(dichloralphenazone)。Sedatives, such as glutetimide, meprobamate, methaqualone, and dichloralphenazone.

抗焦慮劑,例如苯并二氮呯。Anxiolytics, such as benzodiazepines.

抗抑鬱劑,例如米氮平。Antidepressants, such as mirtazapine.

局部藥劑,例如利多卡因、辣椒鹼及樹脂毒素(resiniferotoxin)。Topical agents, such as lidocaine, capsaicin and resiniferotoxin.

肌肉鬆弛劑,例如苯并二氮呯、氯苯胺丁酸、肌安寧(carisoprodol)、氯唑沙宗(chlorzoxazone)、環苯紮平(cyclobenzaprine)、美索巴莫(methocarbamol)及鄰甲苯海拉明(orphrenadine)。Muscle relaxants, such as benzodiazepine, chloramphenicol, carisoprodol, chlorzoxazone, cyclobenzaprine, methocarbamol and o-toluate Ming (orphrenadine).

抗組胺或H1拮抗劑。Antihistamine or H1 antagonist.

NMDA受體拮抗劑。NMDA receptor antagonist.

5-HT受體促效劑/拮抗劑。5-HT receptor agonist/antagonist.

PDEV抑制劑。PDEV inhibitor.

Tramadol®。Tramadol®.

膽鹼激導性(菸鹼類)鎮痛劑。Choline-induced (nicotine) analgesics.

α-2-δ配體。α-2-δ ligand.

前列腺素E2亞型拮抗劑。Prostaglandin E2 subtype antagonist.

白三烯B4拮抗劑。Leukotriene B4 antagonist.

5-脂肪加氧酶抑制劑。5-lipoxygenase inhibitor.

5-HT3拮抗劑。5-HT3 antagonist.

如本文所用,「組合」係指一或多種本發明化合物及一或多種其他本發明化合物或一或多種額外治療劑之任何混合物或置換。除非上下文另外闡明,否則「組合」可包括同時或依序遞送本發明化合物與一或多種治療劑。除非上下文另外闡明,否則「組合」可包括本發明化合物與另一治療劑之劑型。除非上下文另外闡明,否則「組合」可包括投與本發明化合物與另一治療劑之途徑。除非上下文另外闡明,否則「組合」可包括本發明化合物與另一治療劑之調配物。劑型、投藥途徑及醫藥組合物包括(但不限於)本文所描述之劑型、投藥途徑及醫藥組合物。As used herein, "combination" refers to any mixture or replacement of one or more compounds of the invention and one or more other compounds of the invention or one or more additional therapeutic agents. Unless the context dictates otherwise, "combination" may include the simultaneous or sequential delivery of a compound of the invention and one or more therapeutic agents. Unless the context dictates otherwise, "combination" may include a dosage form of a compound of the invention and another therapeutic agent. Unless the context dictates otherwise, "combination" may include the route of administration of a compound of the invention with another therapeutic agent. Unless the context dictates otherwise, "combination" may include the formulation of a compound of the invention with another therapeutic agent. Dosage forms, administration routes, and pharmaceutical compositions include, but are not limited to, the dosage forms, administration routes, and pharmaceutical compositions described herein.

實例Examples

實例1:製備式(I)之(2S,4R,5S)-4-氟-1-(4-氟苯磺醯基)-5-甲基-N-((5-(三氟甲基)-2-(2-(三氟甲基)嘧啶-5-基)吡啶-4-基)甲基)吡咯啶-2-甲醯胺

Figure 02_image057
Example 1: Preparation of (2S,4R,5S)-4-fluoro-1-(4-fluorobenzenesulfonyl)-5-methyl-N-((5-(trifluoromethyl)) of formula (I) -2-(2-(trifluoromethyl)pyrimidin-5-yl)pyridin-4-yl)methyl)pyrrolidin-2-carboxamide
Figure 02_image057

實例1A:由化合物1製備化合物式(I)Example 1A: Preparation of compound formula (I) from compound 1

實例1A分析方法

Figure 108105242-A0304-0001
Figure 108105242-A0304-0002
Figure 108105242-A0304-0003
Example 1A analysis method
Figure 108105242-A0304-0001
Figure 108105242-A0304-0002
Figure 108105242-A0304-0003

參看圖1,化合物I(a)由化合物1根據如下步驟1至5來製備。Referring to FIG. 1, compound I(a) is prepared from compound 1 according to the following steps 1 to 5.

實例1A步驟1:甲磺醯化Example 1A Step 1: Mesylate

化合物2(a) (5-(4-(甲氧基甲基)-5-(三氟甲基)吡啶-2-基)-2-(三氟甲基)嘧啶)如下由化合物1(a) ((5-(三氟甲基)-2-(2-(三氟甲基)嘧啶-5-基)吡啶-4-基)甲醇)製備,其中MS表示甲磺醯基(甲烷磺醯基):

Figure 02_image059
。Compound 2(a) (5-(4-(methoxymethyl)-5-(trifluoromethyl)pyridin-2-yl)-2-(trifluoromethyl)pyrimidine) is as follows from compound 1(a ) ((5-(trifluoromethyl)-2-(2-(trifluoromethyl)pyrimidin-5-yl)pyridin-4-yl)methanol) preparation, where MS stands for mesylate (methanesulfonyl) base):
Figure 02_image059
.

在攪拌下向惰性化反應器中添加2-甲基四氫呋喃(147.7 kg,8.54 kg/kg化合物1(a)),之後添加化合物1(a) (17.3 kg,53.53 mol)。向反應器中添加三乙胺(7.03 kg,0.407 kg/kg化合物1(a))且使內含物冷卻至0℃至10℃。向反應器中緩慢添加甲烷磺醯氯(甲磺醯氯) (7.36 kg,0.425 kg/kg化合物1(a))以保持溫度低於10℃。在該溫度下攪動反應器內含物至少2小時。對反應器內含物取樣且藉由HPLC方法-012測試化合物1(a)含量。持續取樣及LC測試(以1小時時間間隔)直至化合物1(a)含量小於5.0%。2-Methyltetrahydrofuran (147.7 kg, 8.54 kg/kg Compound 1(a)) was added to the inertization reactor with stirring, and then Compound 1(a) (17.3 kg, 53.53 mol) was added. Triethylamine (7.03 kg, 0.407 kg/kg Compound 1(a)) was added to the reactor and the contents were cooled to 0°C to 10°C. Methanesulfonyl chloride (methasulfonyl chloride) (7.36 kg, 0.425 kg/kg Compound 1(a)) was slowly added to the reactor to keep the temperature below 10°C. The reactor contents were agitated at this temperature for at least 2 hours. The reactor contents were sampled and the content of compound 1(a) was tested by HPLC method-012. Continue sampling and LC testing (at 1 hour intervals) until the content of compound 1(a) is less than 5.0%.

向反應器中添加5%檸檬酸水溶液(173 kg,10 kg/kg化合物1(a))且在25℃下攪拌反應器內含物至少30分鐘。向反應器中添加乙酸乙酯(77.6 kg,5.94 kg/kg化合物1(a))且攪拌反應器內含物至少30分鐘。停止攪拌以使得相分離,且移除下層水相。向反應器中之有機相中添加25% NaCl水溶液(102.8 kg,5.94 kg/kg化合物1(a))且攪拌反應器內含物至少10分鐘。停止攪拌以使得相分離,且移除下層水相。在小於50℃之溫度下減壓蒸餾剩餘有機相至體積係2公升/公斤化合物1(a)。在攪拌下向反應器中添加乙酸乙酯(77.6 kg,5.94 kg/kg化合物1(a))且在小於50℃之溫度下減壓蒸餾反應器內含物至體積係2公升/公斤化合物1(a)。在攪拌下向反應器中添加正庚烷(59.2 kg,3.42 kg/kg化合物1(a))且在小於50℃之溫度下減壓蒸餾反應器內含物至體積係2公升/公斤化合物1(a)。添加正庚烷且重複蒸餾兩次。向反應器中添加正庚烷(47.3 kg,2.73 kg/kg化合物1(a))且在25℃至30℃下攪拌內含物至少2小時。過濾反應器內含物以收集固體化合物2(a),且用正庚烷(23.7 kg,1.37 kg/kg化合物1(a))洗滌反應器繼續穿過收集之化合物2(a)固體。在30℃至40℃下在真空烘箱中乾燥固體化合物2(a)至少14小時,得到化合物2(a) (21.85 kg,產率95%)。藉由方法HPLC-012得到之HPLC純度係97.66%,雜質係2.61%。A 5% citric acid aqueous solution (173 kg, 10 kg/kg Compound 1(a)) was added to the reactor and the reactor contents were stirred at 25°C for at least 30 minutes. Ethyl acetate (77.6 kg, 5.94 kg/kg compound 1(a)) was added to the reactor and the reactor contents were stirred for at least 30 minutes. The stirring was stopped to allow the phases to separate, and the lower aqueous phase was removed. A 25% aqueous NaCl solution (102.8 kg, 5.94 kg/kg Compound 1(a)) was added to the organic phase in the reactor and the reactor contents were stirred for at least 10 minutes. The stirring was stopped to allow the phases to separate, and the lower aqueous phase was removed. The remaining organic phase was distilled under reduced pressure at a temperature of less than 50°C to a volume of 2 liters/kg of Compound 1(a). Ethyl acetate (77.6 kg, 5.94 kg/kg Compound 1(a)) was added to the reactor with stirring and the contents of the reactor were distilled under reduced pressure to a volume of 2 liters/kg Compound 1 at a temperature of less than 50°C. (a). Add n-heptane (59.2 kg, 3.42 kg/kg Compound 1(a)) to the reactor with stirring and distill the contents of the reactor under reduced pressure to a volume of 2 liters/kg Compound 1 at a temperature of less than 50°C (a). Add n-heptane and repeat the distillation twice. Add n-heptane (47.3 kg, 2.73 kg/kg Compound 1(a)) to the reactor and stir the contents at 25°C to 30°C for at least 2 hours. The reactor contents were filtered to collect the solid compound 2(a), and the reactor was washed with n-heptane (23.7 kg, 1.37 kg/kg compound 1(a)) to continue through the collected compound 2(a) solids. The solid compound 2(a) was dried in a vacuum oven at 30°C to 40°C for at least 14 hours to obtain compound 2(a) (21.85 kg, yield 95%). The HPLC purity obtained by the method HPLC-012 was 97.66%, and the impurity was 2.61%.

實例1A步驟2:胺形成Example 1A Step 2: Amine formation

化合物3(a) (5-(三氟甲基)-2-(2-(三氟甲基)嘧啶-5-基)吡啶-4-基)甲胺如下由化合物2(a) 5-(4-(甲氧基甲基)-5-(三氟甲基)吡啶-2-基)-2-(三氟甲基)嘧啶製備:

Figure 02_image061
。Compound 3(a) (5-(trifluoromethyl)-2-(2-(trifluoromethyl)pyrimidin-5-yl)pyridin-4-yl)methanamine is as follows from compound 2(a) 5-( 4-(Methoxymethyl)-5-(trifluoromethyl)pyridin-2-yl)-2-(trifluoromethyl)pyrimidine Preparation:
Figure 02_image061
.

在攪拌下向惰性化反應器中依序添加化合物2(a) (11 kg,27.41莫耳)、THF (48.9 kg,4.45 kg/kg),直至形成溶液。在攪拌下使化合物2(a)之溶液與NH3 /MeOH (7M甲醇溶液,257.1 kg,23.4 kg/kg)組合,緩慢加熱至35℃至45℃,且在該溫度下老化至少2小時以形成化合物3。對反應器內含物取樣且藉由HPLC方法-014測試化合物2(a)含量。持續取樣及LC測試(以1小時時間間隔)直至化合物1(a)含量小於5.0%。To the inertization reactor, compound 2(a) (11 kg, 27.41 moles) and THF (48.9 kg, 4.45 kg/kg) were sequentially added with stirring until a solution was formed. Combine the solution of compound 2(a) with NH 3 /MeOH (7M methanol solution, 257.1 kg, 23.4 kg/kg) with stirring, slowly heat to 35°C to 45°C, and age at this temperature for at least 2 hours to Compound 3 is formed. The reactor contents were sampled and the compound 2(a) content was tested by HPLC method-014. Continue sampling and LC testing (at 1 hour intervals) until the content of compound 1(a) is less than 5.0%.

在攪拌下使包含化合物3之反應器內含物與MTBE (81.4 kg,7.4 kg/kg化合物2(a))及20% KHCO3 水溶液(27.3 kg,2.48 kg/kg化合物2(a))組合。停止攪拌且使混合物相分離至少10分鐘。移除下層水相且在攪拌下與MTBE (81.4 kg,7.4 kg/kg化合物2(a))組合,且混合至少10分鐘。停止攪拌且使混合物相分離至少10分鐘。在第二洗滌步驟中,移除下層水相且在攪拌下與MTBE (81.4 kg,7.4 kg/kg化合物2(a))組合,且混合至少10分鐘。停止攪拌且使混合物相分離至少10分鐘。在第三洗滌步驟中,移除下層水相且在攪拌下與MTBE (40.7 kg,3.7 kg/kg化合物2(a))組合,且混合至少10分鐘。停止攪拌,使混合物相分離至少10分鐘,且移除下層水相。The contents of the reactor containing compound 3 were combined with MTBE (81.4 kg, 7.4 kg/kg compound 2(a)) and 20% aqueous KHCO 3 solution (27.3 kg, 2.48 kg/kg compound 2(a)) with stirring . Stop stirring and allow the mixture to phase separate for at least 10 minutes. The lower aqueous phase was removed and combined with MTBE (81.4 kg, 7.4 kg/kg Compound 2(a)) with stirring, and mixed for at least 10 minutes. Stop stirring and allow the mixture to phase separate for at least 10 minutes. In the second washing step, the lower aqueous phase was removed and combined with MTBE (81.4 kg, 7.4 kg/kg Compound 2(a)) with stirring, and mixed for at least 10 minutes. Stop stirring and allow the mixture to phase separate for at least 10 minutes. In the third washing step, the lower aqueous phase was removed and combined with MTBE (40.7 kg, 3.7 kg/kg Compound 2(a)) with stirring, and mixed for at least 10 minutes. The stirring was stopped, the mixture phase was separated for at least 10 minutes, and the lower aqueous phase was removed.

四個包含化合物3之有機相在反應器中合併且在小於50℃之溫度下減壓蒸餾以達至體積係15 L/kg化合物2(a)。經3小時使草酸(1.73 kg,0.157 kg/kg化合物2(a))於MTBE (40.7 kg,3.7 kg/kg)中之溶液與蒸餾之有機相組合,同時使溫度保持於20℃至30℃下以形成包含化合物3之漿料,之後在草酸添加完成之後老化至少20分鐘。過濾漿料以收集固體粗化合物3草酸鹽,且用MTBE (16.3 kg,1.48 kg/kg化合物2(a))洗滌反應器繼續穿過收集之固體。Four organic phases containing compound 3 were combined in the reactor and distilled under reduced pressure at a temperature of less than 50°C to reach a volume of 15 L/kg of compound 2(a). Combine a solution of oxalic acid (1.73 kg, 0.157 kg/kg Compound 2(a)) in MTBE (40.7 kg, 3.7 kg/kg) with the organic phase of distillation over 3 hours while maintaining the temperature at 20°C to 30°C Next, to form a slurry containing compound 3, and then to age for at least 20 minutes after the oxalic acid addition is complete. The slurry was filtered to collect the solid crude compound 3 oxalate, and the reactor was washed with MTBE (16.3 kg, 1.48 kg/kg compound 2(a)) and continued through the collected solids.

在攪拌下使粗化合物3與MTBE (81.4 kg,7.4 kg/kg化合物2(a))在反應器中組合,之後在攪拌下添加25% (w/w) KHCO3 水溶液(57.1 kg,5.19 kg/kg化合物2(a)),同時使溫度保持於20℃至30℃。在攪拌下老化反應器內含物30分鐘,停止攪拌,且使混合物相分離至少10分鐘。移除下層水相且在攪拌下與MTBE (81.4 kg,7.4 kg/kg化合物2(a))組合,且混合至少10分鐘。在第二洗滌步驟中,移除下層水相且在攪拌下與MTBE (40.7 kg,3.7 kg/kg化合物2(a))組合,且混合至少10分鐘。停止攪拌,使混合物相分離至少10分鐘,且移除下層水相。Crude compound 3 and MTBE (81.4 kg, 7.4 kg/kg compound 2(a)) were combined in the reactor with stirring, after which 25% (w/w) KHCO 3 aqueous solution (57.1 kg, 5.19 kg) was added with stirring /kg Compound 2(a)) while maintaining the temperature at 20°C to 30°C. The contents of the reactor were aged for 30 minutes with stirring, the stirring was stopped, and the mixture was phase separated for at least 10 minutes. The lower aqueous phase was removed and combined with MTBE (81.4 kg, 7.4 kg/kg Compound 2(a)) with stirring, and mixed for at least 10 minutes. In the second washing step, the lower aqueous phase was removed and combined with MTBE (40.7 kg, 3.7 kg/kg Compound 2(a)) with stirring, and mixed for at least 10 minutes. The stirring was stopped, the mixture phase was separated for at least 10 minutes, and the lower aqueous phase was removed.

三個包含化合物3之有機相在反應器中合併且在小於50℃之溫度下減壓蒸餾以達至體積係2 L/kg 化合物2(a)。在攪拌下向反應器中添加正庚烷(30.1 kg,2.74 kg/kg化合物2(a))且在小於50℃之溫度下減壓蒸餾反應器內含物以達至體積係2 L/kg化合物2(a)。在攪拌下向反應器中添加正庚烷(30.1 kg,2.74 kg/kg化合物2(a))且使反應器內含物保持在20℃至30℃下3小時。過濾反應器內含物以分離固體化合物3,且用正庚烷(15 kg,2.74 kg/kg 化合物2(a))洗滌反應器繼續穿過收集之固體。在30℃至40℃下在真空烘箱中乾燥固體化合物3至少14小時,得到呈淺棕色固體狀之化合物3 (7.2 kg,產率82%)。1H NMR得到之身分標識指示化合物3與化合物3標準物一致。HPLC分析係95.9%,且HPLC純度係99.42%。Three organic phases containing compound 3 were combined in the reactor and distilled under reduced pressure at a temperature of less than 50°C to reach a volume of 2 L/kg of compound 2(a). Add n-heptane (30.1 kg, 2.74 kg/kg Compound 2(a)) to the reactor with stirring and distill the contents of the reactor under reduced pressure at a temperature of less than 50 °C to reach a volume of 2 L/kg Compound 2(a). N-Heptane (30.1 kg, 2.74 kg/kg Compound 2(a)) was added to the reactor with stirring and the reactor contents were kept at 20°C to 30°C for 3 hours. The reactor contents were filtered to isolate solid compound 3, and the reactor was washed with n-heptane (15 kg, 2.74 kg/kg compound 2(a)) and continued through the collected solids. The solid compound 3 was dried in a vacuum oven at 30°C to 40°C for at least 14 hours to obtain compound 3 (7.2 kg, yield 82%) as a light brown solid. The identification obtained by 1H NMR indicates that compound 3 is consistent with the standard of compound 3. The HPLC analysis system was 95.9%, and the HPLC purity system was 99.42%.

實例1A步驟3:縮合反應以形成醯胺Example 1A Step 3: Condensation reaction to form amide

化合物5(a) (2S,3R,5S)-3-氟-2-甲基-5-((5-(三氟甲基)-2-(2-(三氟甲基)嘧啶-5-基)吡啶-4-基)甲基胺甲醯基)吡咯啶-1-甲酸第三丁酯如下由化合物3(a) (5-(三氟甲基)-2-(2-(三氟甲基)嘧啶-5-基)吡啶-4-基)甲胺及化合物4(a) (2S,4R,5S)-1-(第三丁氧基羰基)-4-氟-5-甲基吡咯啶-2-甲酸製備:

Figure 02_image063
。Compound 5(a) (2S,3R,5S)-3-fluoro-2-methyl-5-((5-(trifluoromethyl)-2-(2-(trifluoromethyl)pyrimidine-5- Yl)pyridin-4-yl)methylaminemethanyl)pyrrolidine-1-carboxylic acid tert-butyl ester is as follows from compound 3(a) (5-(trifluoromethyl)-2-(2-(trifluoro (Methyl)pyrimidin-5-yl)pyridin-4-yl)methylamine and compound 4(a) (2S,4R,5S)-1-(third butoxycarbonyl)-4-fluoro-5-methyl Preparation of pyrrolidine-2-carboxylic acid:
Figure 02_image063
.

在攪拌下使化合物3(a) (13 g,40.4 mmol)及化合物4(a) (10.0 g,40.4 mmol)與乙酸異丙酯(90 mL,9.0 mg/kg化合物4(a))在反應器中組合直至形成溶液。在攪拌下向反應器中依序添加N-甲基嗎啉(5.3 g,0.58 mL/g 化合物4,52.5 mmol)、於乙酸乙酯中之T3P®(33.4 g,3.12 mL/g化合物4(a),3.34 g/g 化合物4,52.5 mmol)。使反應器內含物加熱至50℃至60℃。用乙酸異丙酯(10 mL,1.0 mL/g化合物3(a),0.87 g/g 化合物4(a))沖洗反應器,且使反應器內含物保持在該溫度下至少3小時以形成化合物5(a)。對反應器內含物取樣且藉由LC方法-V1.0測試化合物3(a)含量。持續取樣及LC測試(以1小時時間間隔)直至化合物3(a)含量小於5.0%。With stirring, compound 3(a) (13 g, 40.4 mmol) and compound 4(a) (10.0 g, 40.4 mmol) were reacted with isopropyl acetate (90 mL, 9.0 mg/kg compound 4(a)) Until the solution is formed. To the reactor, N-methylmorpholine (5.3 g, 0.58 mL/g Compound 4, 52.5 mmol) and T3P® in ethyl acetate (33.4 g, 3.12 mL/g Compound 4 ( a), 3.34 g/g compound 4, 52.5 mmol). The reactor contents are heated to 50°C to 60°C. Flush the reactor with isopropyl acetate (10 mL, 1.0 mL/g compound 3(a), 0.87 g/g compound 4(a)), and keep the reactor contents at this temperature for at least 3 hours to form Compound 5(a). The contents of the reactor were sampled and the content of compound 3(a) was tested by LC method-V1.0. Continue sampling and LC testing (at 1 hour intervals) until the content of compound 3(a) is less than 5.0%.

在攪拌下使包含化合物5(a)之反應器內含物與2N NaOH (54 g,5.4 g/g化合物4(a))組合且在40℃至60℃下混合至少10分鐘。停止攪拌且使混合物相分離至少10分鐘,40℃至60℃。移除下層水相。減壓(100至400毫巴)蒸餾反應器內含物至總體積係9至11 mL/g化合物4(a)。進一步減壓(100至400毫巴)蒸餾反應器內含物,同時添加乙醇(300 mL,30 mL/g化合物4(a)),同時保持恆定體積係9至11 mL/g化合物4(a)。對反應器內含物取樣且藉由GC測試乙酸異丙酯含量。持續用乙醇溶劑交換,直至乙酸異丙酯含量小於2.0%。The contents of the reactor containing compound 5(a) were combined with 2N NaOH (54 g, 5.4 g/g compound 4(a)) with mixing and mixed at 40°C to 60°C for at least 10 minutes. Stop stirring and allow the mixture to phase separate for at least 10 minutes, 40°C to 60°C. Remove the lower aqueous phase. The contents of the reactor were distilled under reduced pressure (100 to 400 mbar) to a total volume of 9 to 11 mL/g of compound 4(a). The reactor contents were distilled under further reduced pressure (100 to 400 mbar) while adding ethanol (300 mL, 30 mL/g compound 4(a)) while maintaining a constant volume of 9 to 11 mL/g compound 4(a ). The reactor contents were sampled and the isopropyl acetate content was tested by GC. Continue to use ethanol solvent exchange until the isopropyl acetate content is less than 2.0%.

在攪拌下向反應器中添加20℃至55℃之水(57 mL,5.7 mL/g化合物4(a))且加熱至55℃至65℃至少10分鐘,之後經1至3小時冷卻至15℃至25℃。在攪拌下使反應器內含物保持在15℃至25℃下1小時,以形成包含固體化合物5(a)之漿料。藉由過濾收集固體,且用母液洗滌收集之固體。用於水中之乙醇50 v/v% (4 mL/g化合物4(a))洗滌反應器繼續穿過收集之固體。洗滌之固體化合物5(a)在真空烘箱(<100毫巴,在30℃下)中乾燥至少6小時。對化合物5(a)取樣,且藉由卡爾費歇爾方法(Karl Fischer method)測試水。持續乾燥直至水含量小於1。1H NMR得到之身分標識指示化合物5(a)與化合物5(a)標準物一致。產生呈棕色/橙色固體狀之化合物5(a) (20.1 g,產率90%)。藉由HPLC得到之純度係99.28%。Add water (20 mL to 55°C (57 mL, 5.7 mL/g Compound 4(a)) to the reactor with stirring and heat to 55°C to 65°C for at least 10 minutes, then cool to 15 over 1 to 3 hours ℃ to 25 ℃. The contents of the reactor were kept at 15°C to 25°C for 1 hour with stirring to form a slurry containing solid compound 5(a). The solid was collected by filtration, and the collected solid was washed with mother liquor. The ethanol used in water 50 v/v% (4 mL/g compound 4(a)) was washed in the reactor and continued through the collected solids. The washed solid compound 5(a) is dried in a vacuum oven (<100 mbar at 30°C) for at least 6 hours. The compound 5(a) was sampled, and the water was tested by Karl Fischer method. Continue to dry until the water content is less than 1. The identity label obtained by 1H NMR indicates that compound 5(a) is consistent with the standard of compound 5(a). Compound 5(a) was produced as a brown/orange solid (20.1 g, 90% yield). The purity obtained by HPLC was 99.28%.

實例1A步驟4:脫除保護基Example 1A Step 4: Deprotection

化合物6(a),(2S,4R,5S)-4-氟-5-甲基-N-((5-(三氟甲基)-2-(2-(三氟甲基)嘧啶-5-基)吡啶-4-基)甲基)吡咯啶-2-甲醯胺鹽酸鹽如下由化合物5(a) (2S,3R,5S)-3-氟-2-甲基-5-((5-(三氟甲基)-2-(2-(三氟甲基)嘧啶-5-基)吡啶-4-基)甲基胺甲醯基)吡咯啶-1-甲酸第三丁酯製備:

Figure 02_image065
。Compound 6(a), (2S,4R,5S)-4-fluoro-5-methyl-N-((5-(trifluoromethyl)-2-(2-(trifluoromethyl)pyrimidine-5 -Yl)pyridin-4-yl)methyl)pyrrolidin-2-carboxamide hydrochloride is as follows from compound 5(a) (2S,3R,5S)-3-fluoro-2-methyl-5-( (5-(Trifluoromethyl)-2-(2-(trifluoromethyl)pyrimidin-5-yl)pyridin-4-yl)methylamine formamide)pyrrolidine-1-carboxylic acid tert-butyl ester preparation:
Figure 02_image065
.

向反應器中添加1-丙醇(58.6 mL,3.77 mL/g化合物5(a))且冷卻至-5℃至5℃,之後在攪拌下添加乙醯氯(5.3 mL,73.4 mmol,0.34 mL/g化合物5(a)),同時保持溫度小於40℃。混合物在該溫度下老化至少10分鐘。向反應器中添加化合物5(a) (15.56 g,28.2 mmol),之後再添加1-丙醇(31 mL,2 mL/g化合物5(a))。在攪拌下將反應混合物加熱至55℃至65℃且保持在該溫度下至少3小時以產生化合物6。對反應器內含物取樣且藉由LC方法-V1.0測試化合物5(a)含量。持續取樣及LC測試(以1小時時間間隔)直至化合物5(a)含量小於5.0%。Add 1-propanol (58.6 mL, 3.77 mL/g compound 5(a)) to the reactor and cool to -5°C to 5°C, then add acetyl chloride (5.3 mL, 73.4 mmol, 0.34 mL) with stirring /g compound 5(a)) while keeping the temperature below 40°C. The mixture is aged at this temperature for at least 10 minutes. Compound 5(a) (15.56 g, 28.2 mmol) was added to the reactor, followed by 1-propanol (31 mL, 2 mL/g compound 5(a)). The reaction mixture was heated to 55°C to 65°C with stirring and maintained at this temperature for at least 3 hours to produce compound 6. The contents of the reactor were sampled and the content of compound 5(a) was tested by LC method-V1.0. Continue sampling and LC testing (at 1 hour intervals) until the content of compound 5(a) is less than 5.0%.

減壓(100至400毫巴)蒸餾反應器內含物,同時添加正庚烷(187 mL,12 mL/g 化合物5(a)),同時保持恆定體積係約7 mL/g化合物5(a)。對反應器內含物取樣且藉由GC測試1-丙醇含量。將反應器內容物冷卻至15℃至25℃且攪拌至少1小時。過濾反應器內含物以收集固體化合物6(a),且用母液洗滌反應器繼續穿過收集之化合物6(a)固體。進一步用1-丙醇(10.9 mL,0.7 mL/g化合物5(a))及正庚烷(43.6 mL,2.8 mL/g 化合物5(a))之混合物洗滌收集之固體。在50℃下在真空烘箱(小於100毫巴)中乾燥固體化合物6(a)至少6小時,得到呈棕色/橙色固體狀之化合物6(a)(20.1 g,產率90%)。藉由方法HPLC-012得到之HPLC純度係97.66%,雜質係2.61%。對乾燥之物質取樣且藉由GC測試2-丙醇及正庚烷含量。持續乾燥直至1-丙醇及正庚烷含量各小於0.5%。藉由HPLC得到之化合物6(a)純度為98.81%。The reactor contents were distilled under reduced pressure (100 to 400 mbar) while adding n-heptane (187 mL, 12 mL/g compound 5(a)) while maintaining a constant volume of about 7 mL/g compound 5(a ). The reactor contents were sampled and the 1-propanol content was tested by GC. The reactor contents were cooled to 15°C to 25°C and stirred for at least 1 hour. The reactor contents were filtered to collect the solid compound 6(a), and the reactor was washed with the mother liquor to continue to pass through the collected compound 6(a) solids. The collected solid was further washed with a mixture of 1-propanol (10.9 mL, 0.7 mL/g compound 5(a)) and n-heptane (43.6 mL, 2.8 mL/g compound 5(a)). The solid compound 6(a) was dried in a vacuum oven (less than 100 mbar) at 50°C for at least 6 hours to obtain compound 6(a) as a brown/orange solid (20.1 g, yield 90%). The HPLC purity obtained by the method HPLC-012 was 97.66%, and the impurity was 2.61%. The dried material was sampled and tested for 2-propanol and n-heptane content by GC. Continue to dry until the contents of 1-propanol and n-heptane are less than 0.5% each. The purity of compound 6(a) obtained by HPLC was 98.81%.

實例1A步驟5:製備化合物(I)aExample 1A Step 5: Preparation of compound (I)a

化合物(I)(a),(2S,4R,5S)-4-氟-1-(4-氟苯磺醯基)-5-甲基-N-((5-(三氟甲基)-2-(2-(三氟甲基)嘧啶-5-基)吡啶-4-基)甲基)吡咯啶-2-甲醯胺如下由化合物6(a) (2S,4R,5S)-4-氟-5-甲基-N-((5-(三氟甲基)-2-(2-(三氟甲基)嘧啶-5-基)吡啶-4-基)甲基)吡咯啶-2-甲醯胺鹽酸鹽及化合物7(a) 4-氟苯-1-磺醯氯製備為乙醇溶劑合物:

Figure 02_image067
。Compound (I)(a), (2S,4R,5S)-4-fluoro-1-(4-fluorobenzenesulfonyl)-5-methyl-N-((5-(trifluoromethyl)- 2-(2-(trifluoromethyl)pyrimidin-5-yl)pyridin-4-yl)methyl)pyrrolidin-2-carboxamide is as follows from compound 6(a) (2S,4R,5S)-4 -Fluoro-5-methyl-N-((5-(trifluoromethyl)-2-(2-(trifluoromethyl)pyrimidin-5-yl)pyridin-4-yl)methyl)pyrrolidine- 2-Methylamine hydrochloride and compound 7(a) 4-fluorobenzene-1-sulfonyl chloride were prepared as ethanol solvates:
Figure 02_image067
.

在攪拌下向反應器添加中化合物6(a) (10 g,20.5 mmol)及MTBE (15 mL,1.5 ml g化合物6a)) 。在攪拌下向反應器中添加乙醇(4 mL,0.4 mL/g化合物6(a))及10% K2 CO3 水溶液(38.2 mL,3.82 mL/g化合物6(a)),之後添加化合物7(a)於MTBE (4.4 g化合物7(a),0.44 g/g化合物6(a),22.6 mmol;21 mL MTBE 2.6 mL/g化合物6(a))中之溶液。在15℃至40下混合反應混合物至少2小時以形成化合物I(a)。對反應器內含物取樣且藉由LC方法-V1.0測試化合物6(a)含量。持續取樣及LC測試(以1小時時間間隔)直至化合物6(a)含量小於5.0%。停止攪拌以使得相分離,且移除下層水相。在攪拌下向反應器中添加水(20 mL,2.0 mL/g化合物6(a))且混合至少10分鐘。停止攪拌以使得相分離,且移除下層水相。To the reactor were added middle compound 6(a) (10 g, 20.5 mmol) and MTBE (15 mL, 1.5 ml g compound 6a)) with stirring. Ethanol (4 mL, 0.4 mL/g compound 6(a)) and 10% K 2 CO 3 aqueous solution (38.2 mL, 3.82 mL/g compound 6(a)) were added to the reactor with stirring, and then compound 7 was added (a) A solution in MTBE (4.4 g compound 7(a), 0.44 g/g compound 6(a), 22.6 mmol; 21 mL MTBE 2.6 mL/g compound 6(a)). The reaction mixture is mixed at 15°C to 40 for at least 2 hours to form compound I(a). The contents of the reactor were sampled and the content of compound 6(a) was tested by LC method-V1.0. Continue sampling and LC testing (at 1 hour intervals) until the content of compound 6(a) is less than 5.0%. The stirring was stopped to allow the phases to separate, and the lower aqueous phase was removed. Water (20 mL, 2.0 mL/g compound 6(a)) was added to the reactor with stirring and mixed for at least 10 minutes. The stirring was stopped to allow the phases to separate, and the lower aqueous phase was removed.

減壓(100至400毫巴)蒸餾包含化合物I(a)之反應器內含物至最小值攪拌體積。向反應器中添加乙醇(10至50 mL,1至5 mL/g化合物6(a))至總體積係4至5 mL/g化合物6(a)。減壓(100至400毫巴)蒸餾反應器內含物,同時添加乙醇(60 mL,6.0 mL/g化合物6(a))以保持恆定體積係約4.5 mL/g化合物(a)。對反應器內含物取樣且藉由GC評估MTBE。向反應器中添加正庚烷(100 mL,10.0 mL/g化合物6(a))且加熱至60℃至70℃,之後攪拌至少15分鐘。經1至3小時使反應混合物冷卻至-5℃至5℃且在攪拌下老化30分鐘。過濾反應器內含物以收集固體化合物I(a),且用母液洗滌反應器繼續穿過收集之化合物I(a)固體。用正庚烷(20 mL,2 mL/g化合物6(a))洗滌反應器繼續穿過收集之化合物6(a)固體。在50℃至60℃下在真空烘箱中乾燥固體化合物I(a)至少18小時,得到呈灰白色至褐色固體狀之化合物I(a)(11.7 g,產率94%)。對乾燥之物質取樣且藉由GC測試正庚烷含量。持續乾燥直至正庚烷含量小於0.5%。藉由HPLC之化合物I(a)分析係92.81%且藉由HPLC得到之純度係98.99%。化合物I(a)鑑別為化合物I(a)之結晶游離鹼乙醇溶劑合物F型。The contents of the reactor containing compound I(a) were distilled to a minimum stirring volume under reduced pressure (100 to 400 mbar). Ethanol (10 to 50 mL, 1 to 5 mL/g compound 6(a)) was added to the reactor to a total volume of 4 to 5 mL/g compound 6(a). The reactor contents were distilled under reduced pressure (100 to 400 mbar) while adding ethanol (60 mL, 6.0 mL/g compound 6(a)) to maintain a constant volume of about 4.5 mL/g compound (a). The reactor contents were sampled and MTBE was evaluated by GC. Add n-heptane (100 mL, 10.0 mL/g compound 6(a)) to the reactor and heat to 60°C to 70°C, followed by stirring for at least 15 minutes. The reaction mixture was cooled to -5°C to 5°C over 1 to 3 hours and aged with stirring for 30 minutes. The reactor contents were filtered to collect the solid compound I(a), and the reactor was washed with the mother liquor to continue to pass through the collected compound I(a) solid. Washing the reactor with n-heptane (20 mL, 2 mL/g compound 6(a)) continued through the collected compound 6(a) solids. The solid compound I(a) was dried in a vacuum oven at 50°C to 60°C for at least 18 hours to obtain the compound I(a) as an off-white to brown solid (11.7 g, yield 94%). The dried material was sampled and tested for n-heptane content by GC. Continue to dry until the n-heptane content is less than 0.5%. The analysis of compound I(a) by HPLC was 92.81% and the purity by HPLC was 98.99%. Compound I(a) was identified as Form F of the crystalline free base ethanol solvate of Compound I(a).

實例1A:製備結晶化合物I(a)游離鹼無水物E型Example 1A: Preparation of crystalline compound I (a) free base anhydrous form E

在15℃至25℃下攪拌固體結晶游離鹼化合物I(a)乙醇溶劑合物(10.0 g)及DCM (25 mL,2.5 mL/g化合物I(a))以形成溶液。溶液經由0.45 μm濾筒過濾至反應器中,在其中其在攪拌下與正庚烷(22 mL,2.2 mL/g 化合物I(a))組合。在15℃至25℃下在攪拌下將結晶化合物I(a)游離鹼無水物E型晶種添加至反應器中至少30分鐘。在攪拌下經2.5至3.5小時將正庚烷(16 mL,1.6 mL/g化合物6(a))添加至反應器中。在攪拌下經1.5至2.5小時再將正庚烷(16 mL,1.6 mL/g化合物6(a))添加至反應器中。在攪拌下經0.5至1.5小時再將正庚烷(16 mL,1.6 mL/g化合物6(a))添加至反應器中。藉由過濾收集結晶化合物I(a)游離鹼無水物E型固體,且用母液洗滌反應器繼續穿過收集之固體。用正庚烷(20 mL/g,2.0 mL/g化合物6(a))洗滌反應器繼續穿過收集之固體。在真空烘箱(<20毫巴,在45℃至55℃下)中乾燥洗滌之結晶化合物I(a)游離鹼無水物E型至少18小時。對乾燥之物質(8.4 g,產率90%)取樣且藉由GC測試DCM及正庚烷含量。持續乾燥直至DCM含量小於600 ppm且正庚烷含量小於0.45%。1H NMR得到之身分標識指示化合物I(a)游離鹼無水物與化合物I(a)游離鹼無水物標準物一致。HPLC純度係99.87%。The solid crystalline free base Compound I(a) ethanol solvate (10.0 g) and DCM (25 mL, 2.5 mL/g Compound I(a)) were stirred at 15°C to 25°C to form a solution. The solution was filtered through a 0.45 μm filter cartridge into the reactor, where it was combined with n-heptane (22 mL, 2.2 mL/g Compound I(a)) with stirring. The crystalline Compound I(a) free base anhydrous E-type seed crystals were added to the reactor for at least 30 minutes under stirring at 15-25°C. N-Heptane (16 mL, 1.6 mL/g compound 6(a)) was added to the reactor over 2.5 to 3.5 hours with stirring. With stirring, n-heptane (16 mL, 1.6 mL/g compound 6(a)) was added to the reactor over 1.5 to 2.5 hours. With stirring, n-heptane (16 mL, 1.6 mL/g compound 6(a)) was added to the reactor over 0.5 to 1.5 hours. The crystalline Compound I(a) free base anhydrous type E solid was collected by filtration, and the reactor was washed with the mother liquor to continue passing through the collected solid. The reactor was washed with n-heptane (20 mL/g, 2.0 mL/g compound 6(a)) and continued through the collected solids. The washed crystalline Compound I(a) free base anhydrous Form E is dried in a vacuum oven (<20 mbar at 45°C to 55°C) for at least 18 hours. The dried material (8.4 g, 90% yield) was sampled and tested for DCM and n-heptane content by GC. Continue drying until the DCM content is less than 600 ppm and the n-heptane content is less than 0.45%. The identification obtained by 1H NMR indicates that the compound I(a) free base anhydrous is consistent with the compound I(a) free base anhydrous standard. The HPLC purity is 99.87%.

實例1B:製備化合物1(c)之(5-(三氟甲基)-2-(2-(三氟甲基)嘧啶-5-基)吡啶-4-基)甲醇.Example 1B: Preparation of compound 1(c) of (5-(trifluoromethyl)-2-(2-(trifluoromethyl)pyrimidin-5-yl)pyridin-4-yl)methanol.

化合物1(c)根據圖2中描繪之方法製備。Compound 1(c) was prepared according to the method depicted in Figure 2.

實例1B分析方法

Figure 108105242-A0304-0004
Figure 108105242-A0304-0005
Figure 108105242-A0304-0006
Example 1B analysis method
Figure 108105242-A0304-0004
Figure 108105242-A0304-0005
Figure 108105242-A0304-0006

參看圖2,化合物1(a)根據如下步驟1至3由化合物10A及化合物8製備。Referring to FIG. 2, compound 1(a) is prepared from compound 10A and compound 8 according to the following steps 1 to 3.

實例1B步驟1Example 1B Step 1

化合物10B(i) 2-氯-5-甲基異菸酸甲酯如下由化合物10A(i) 2-氯-5-甲基異菸酸製備:

Figure 02_image069
Compound 10B(i) 2-chloro-5-methyl isonicotinic acid methyl ester was prepared from compound 10A(i) 2-chloro-5-methyl isonicotinic acid as follows:
Figure 02_image069
.

向惰性化第一個反應器中添加二甲基甲醯胺(99.3 kg,4.75 kg/kg化合物10A(i))且攪拌。向反應器中依序添加化合物10A(i) (20.9 kg, 92.7 mol)、碳酸氫鈉(15.6 kg,0.745 kg/kg化合物10A(i))及甲苯磺酸甲酯(22.4 kg,1.07 kg/kg化合物10A(i))。將反應混合物加熱至35至45℃至保持在該溫度下至少4小時。自反應混合物移除樣品且用乙腈稀釋。對反應器內含物取樣且藉由HPLC方法-008測試化合物10A(i)含量。持續取樣及LC測試(以1小時時間間隔)直至化合物10A(i)含量小於5.0%。使反應混合物冷卻至20至30℃。To the inertized first reactor, dimethylformamide (99.3 kg, 4.75 kg/kg compound 10A(i)) was added and stirred. To the reactor, add compound 10A(i) (20.9 kg, 92.7 mol), sodium bicarbonate (15.6 kg, 0.745 kg/kg compound 10A(i)) and methyl tosylate (22.4 kg, 1.07 kg/ kg compound 10A(i)). The reaction mixture is heated to 35 to 45°C to maintain at this temperature for at least 4 hours. The sample was removed from the reaction mixture and diluted with acetonitrile. The reactor contents were sampled and the compound 10A(i) content was tested by HPLC method-008. Continue sampling and LC testing (at 1 hour intervals) until the content of compound 10A(i) is less than 5.0%. The reaction mixture was cooled to 20 to 30°C.

向惰性化第二個反應器中添加水(313.5 kg,15.0 kg/kg化合物10A(i))且攪拌。經1小時之時段向第二個反應器中添加第一個反應器之內含物,同時保持溫度低於25℃。攪拌混合物至少10分鐘,之後添加甲基第三丁基醚(77.3 kg,3.70 kg/kg化合物10A(i)),其後使混合物靜置10分鐘。移除底部水層且轉移至第一個容器中,且排出有機層且轉移至第二個容器中。向第二個反應器中添加含有水相之第一個容器之內含物,之後將甲基第三丁基醚(77.3 kg,3.70 kg/kg化合物10A(i))添加至第二個反應器中。攪拌此混合物至少10分鐘,停止攪動,且使混合物靜置至少10分鐘。移除底部水層且轉移至第一個容器中,且排出有機層且轉移至第二個容器中。向第二個反應器中添加含有水相之第一個容器之內含物,之後將甲基第三丁基醚(77.3 kg,3.70 kg/kg化合物10A(i))添加至第二個反應器中。攪拌此混合物至少10分鐘,停止攪動,且使混合物靜置至少10分鐘。移除底部水層且轉移至第一個容器中。Water (313.5 kg, 15.0 kg/kg compound 10A(i)) was added to the inertized second reactor and stirred. The contents of the first reactor were added to the second reactor over a period of 1 hour while maintaining the temperature below 25°C. The mixture was stirred for at least 10 minutes, after which methyl tert-butyl ether (77.3 kg, 3.70 kg/kg compound 10A(i)) was added, after which the mixture was allowed to stand for 10 minutes. The bottom water layer was removed and transferred to the first container, and the organic layer was drained and transferred to the second container. Add the contents of the first vessel containing the aqueous phase to the second reactor, and then add methyl tertiary butyl ether (77.3 kg, 3.70 kg/kg compound 10A(i)) to the second reaction器中. Stir the mixture for at least 10 minutes, stop stirring, and let the mixture stand for at least 10 minutes. The bottom water layer was removed and transferred to the first container, and the organic layer was drained and transferred to the second container. Add the contents of the first vessel containing the aqueous phase to the second reactor, and then add methyl tertiary butyl ether (77.3 kg, 3.70 kg/kg compound 10A(i)) to the second reaction器中. Stir the mixture for at least 10 minutes, stop stirring, and let the mixture stand for at least 10 minutes. Remove the bottom water layer and transfer to the first container.

向第二個反應器中依序添加第二個容器中之有機相、鹽水溶液(3.4 M 氯化鈉,125 kg,5.98 kg/kg化合物10A(i))。攪拌第二個反應器之內含物至少10分鐘,之後使混合物靜置至少10分鐘。移除底部水層且作為廢棄物轉移。向第二個反應器中添加鹽水溶液(3.4 M氯化鈉,125 kg,5.98 kg/kg化合物10A(i)),且攪拌第二個反應器之內含物至少10分鐘,之後使混合物靜置至少10分鐘。移除底部水層且作為廢棄物轉移。To the second reactor, the organic phase and the saline solution (3.4 M sodium chloride, 125 kg, 5.98 kg/kg compound 10A(i)) in the second vessel were added in order. The contents of the second reactor were stirred for at least 10 minutes, after which the mixture was allowed to stand for at least 10 minutes. Remove the bottom water layer and transfer as waste. To the second reactor was added saline solution (3.4 M sodium chloride, 125 kg, 5.98 kg/kg compound 10A(i)), and the contents of the second reactor were stirred for at least 10 minutes, after which the mixture was allowed to stand Set at least 10 minutes. Remove the bottom water layer and transfer as waste.

減壓蒸餾第二個反應器之內含物至體積係2 L/kg,同時保持反應器之溫度低於45℃。向第二個反應器中添加四氫呋喃(37.2 kg,1.78 kg/kg化合物10A(i)),且減壓蒸餾反應器內含物以達至體積係2 L/kg (其中化合物10B(i)呈溶液型式),同時保持反應器之溫度低於45℃℃ 使溫度保持在20℃至30℃下以用於下一步驟。The contents of the second reactor were distilled under reduced pressure to a volume of 2 L/kg, while keeping the temperature of the reactor below 45°C. Tetrahydrofuran (37.2 kg, 1.78 kg/kg compound 10A(i)) was added to the second reactor, and the contents of the reactor were distilled under reduced pressure to reach a volume of 2 L/kg (where compound 10B(i) was Solution type) while keeping the temperature of the reactor below 45°C to maintain the temperature at 20°C to 30°C for the next step.

實例1B步驟2Example 1B Step 2

化合物10C(i) (2-氯-5-甲基吡啶-4-基)甲醇如下由化合物10B(i) 2-氯-5-甲基異菸酸甲酯製備:

Figure 02_image071
Compound 10C(i) (2-chloro-5-methylpyridin-4-yl)methanol was prepared from compound 10B(i) 2-chloro-5-methylisonicotinic acid methyl ester as follows:
Figure 02_image071
.

向攪拌之惰性化反應器中添加呈四氫呋喃溶液之化合物10B(i) (42 L,1.9 L/kg)。向反應器中添加四氫呋喃(167.4 kg,7.6 kg/kg化合物10B(i))及水(14.6 kg,0.7 kg/kg化合物10B(i))且使混合物冷卻至10至20℃。向反應器中添加氯化鋰(5.9 kg,0.265 kg/kg化合物10B(i)),同時保持溫度低於25℃,之後經2小時之時段分批添加硼氫化鈉(3.5 kg,0.16 kg/kg化合物10B(i)),同時保持溫度低於25℃。使反應混合物保持在15至25℃下至少5小時。對反應器內含物取樣且藉由HPLC方法-008測試化合物10B(i)含量。持續取樣及LC測試(以1小時時間間隔)直至化合物10B(i)含量小於5.0%To the stirred inertization reactor was added compound 10B(i) (42 L, 1.9 L/kg) as a tetrahydrofuran solution. Tetrahydrofuran (167.4 kg, 7.6 kg/kg compound 10B(i)) and water (14.6 kg, 0.7 kg/kg compound 10B(i)) were added to the reactor and the mixture was cooled to 10 to 20°C. Lithium chloride (5.9 kg, 0.265 kg/kg compound 10B(i)) was added to the reactor while maintaining the temperature below 25°C, after which sodium borohydride (3.5 kg, 0.16 kg/ kg compound 10B(i)) while keeping the temperature below 25°C. The reaction mixture is kept at 15 to 25°C for at least 5 hours. The reactor contents were sampled and the compound 10B(i) content was tested by HPLC method-008. Continue sampling and LC testing (at 1 hour intervals) until the content of compound 10B(i) is less than 5.0%

向反應器中添加鹽酸(2N,230 L,10.4 L/kg)以獲得約1之pH值,同時保持反應器溫度低於20℃至攪拌至少4小時。停止攪動且使混合物靜置至少10分鐘。將水層轉移至第一個容器中且將有機層轉移至第二個容器中。向反應器中依序添加水層、乙酸乙酯(94 kg,4.2 kg/kg化合物10B(i)),且攪拌混合物至少10分鐘。停止攪動,使混合物靜置至少10分鐘,且將水相排出成廢棄物。向反應器中添加碳酸氫鈉(115 kg,5.18 kg/kg化合物10B(i))且攪拌混合物至少10分鐘。停止攪動且使混合物靜置至少10分鐘。將水層轉移至第一個容器中且將有機層轉移至第二個容器中。向反應器中依序添加水層、乙酸乙酯(94 kg,4.2 kg/kg化合物10B(i)),且攪拌混合物至少10分鐘。停止攪動,使混合物靜置至少10分鐘,且將水相排出成廢棄物。Hydrochloric acid (2N, 230 L, 10.4 L/kg) was added to the reactor to obtain a pH of about 1, while maintaining the reactor temperature below 20°C to stirring for at least 4 hours. Stop the agitation and let the mixture sit for at least 10 minutes. Transfer the aqueous layer to the first container and the organic layer to the second container. Aqueous layer, ethyl acetate (94 kg, 4.2 kg/kg compound 10B(i)) were added to the reactor sequentially, and the mixture was stirred for at least 10 minutes. Stop the agitation, let the mixture stand for at least 10 minutes, and drain the aqueous phase into waste. Sodium bicarbonate (115 kg, 5.18 kg/kg compound 10B(i)) was added to the reactor and the mixture was stirred for at least 10 minutes. Stop the agitation and let the mixture sit for at least 10 minutes. Transfer the aqueous layer to the first container and the organic layer to the second container. Aqueous layer, ethyl acetate (94 kg, 4.2 kg/kg compound 10B(i)) were added to the reactor sequentially, and the mixture was stirred for at least 10 minutes. Stop the agitation, let the mixture stand for at least 10 minutes, and drain the aqueous phase into waste.

向第二個反應器中依序添加第二個容器中之有機相、鹽水溶液(3.4 M氯化鈉,125 kg,5.63 kg/kg化合物10B(i))。攪拌混合物至少10分鐘,停止攪動,且使混合物靜置至少10分鐘。移除水層且轉移成廢棄物。第二次重複此乾燥製程。減壓蒸餾反應器之內含物以達至體積係2 L/kg,同時保持反應器之溫度低於60℃。向反應器中添加庚烷(71 kg,3.2 L/kg,3.2 kg/kg化合物10B(i))且減壓蒸餾反應器內含物至體積係2 L/kg,同時保持反應器之溫度低於60℃。向反應器中添加庚烷(71 kg,3.2 L/kg,3.2 kg/kg化合物10B(i)),使反應器內含物冷卻至0℃且老化至少1小時,同時使反應溫度保持在-5與5℃之間。過濾固體且用庚烷(14.2 kg,3.2 L/kg,0.64 kg/kg化合物10B(i))洗滌反應器及濾餅兩次。在真空烘箱中乾燥產物至恆重之呈灰白色固體狀之化合物10C(i) (15.8 kg,產率81%,經兩個步驟)。使用分析型HPLC方法-009測定化合物10C(i)產物之純度係99.38 A%。To the second reactor, the organic phase and the saline solution (3.4 M sodium chloride, 125 kg, 5.63 kg/kg compound 10B(i)) in the second vessel were added in sequence. Stir the mixture for at least 10 minutes, stop the agitation, and let the mixture stand for at least 10 minutes. Remove the water layer and transfer to waste. Repeat this drying process a second time. The contents of the vacuum distillation reactor to reach a volume of 2 L/kg while keeping the temperature of the reactor below 60°C. Add heptane (71 kg, 3.2 L/kg, 3.2 kg/kg compound 10B(i)) to the reactor and distill the contents of the reactor under reduced pressure to a volume of 2 L/kg, while keeping the temperature of the reactor low At 60°C. Heptane (71 kg, 3.2 L/kg, 3.2 kg/kg compound 10B(i)) was added to the reactor, and the reactor contents were cooled to 0°C and aged for at least 1 hour while keeping the reaction temperature at − Between 5 and 5°C. The solid was filtered and the reactor and filter cake were washed twice with heptane (14.2 kg, 3.2 L/kg, 0.64 kg/kg compound 10B(i)). The product was dried in a vacuum oven to a constant weight of compound 10C(i) as an off-white solid (15.8 kg, yield 81%, in two steps). The purity of the compound 10C(i) product was determined to be 99.38 A% using analytical HPLC method-009.

實例1B步驟3Example 1B Step 3

化合物1(a) (5-甲基-2-(2-(三氟甲基)嘧啶-5-基)吡啶-4-基)甲醇如下由 化合物10C(i) (2-氯-5-甲基吡啶-4-基)甲醇及化合物8 2-(三氟甲基)嘧啶-5-基

Figure 108105242-A0101-12-0030-1
酸製備:
Figure 02_image073
。Compound 1(a) (5-methyl-2-(2-(trifluoromethyl)pyrimidin-5-yl)pyridin-4-yl)methanol is as follows from compound 10C(i) (2-chloro-5-methyl Pyridin-4-yl)methanol and compound 8 2-(trifluoromethyl)pyrimidin-5-yl
Figure 108105242-A0101-12-0030-1
Acid preparation:
Figure 02_image073
.

在第一個攪拌之惰性化反應器中添加1,4-二噁烷(52.73 kg,7.22 kg/kg化合物10C(i))及水(36.5 kg,5 kg/kg化合物10C(i))且攪拌。向第一個反應器中依序添加碳酸鉀(11.9 kg,1.63 kg/kg化合物10C(i))、化合物10C(i) (7.3 kg,93 mol)。將混合物之溫度調整至25至30℃且在第一個反應器中進一步添加氯化[1,1'-雙(二苯基膦基)二茂鐵]鈀(II) (0.505 kg,0.07 kg/kg化合物10C(i))。氮氣鼓泡通過溶液1至2小時,之後將溶液加熱至75至80℃且攪拌2小時。對第一個反應器內含物取樣且藉由HPLC方法-011測試化合物10C(i)含量。持續取樣及LC測試(以30分鐘時間間隔)直至化合物10C(i)含量小於5.0%。Add 1,4-dioxane (52.73 kg, 7.22 kg/kg compound 10C(i)) and water (36.5 kg, 5 kg/kg compound 10C(i)) to the first stirred inertization reactor and Stir. To the first reactor, potassium carbonate (11.9 kg, 1.63 kg/kg compound 10C(i)) and compound 10C(i) (7.3 kg, 93 mol) were added in sequence. Adjust the temperature of the mixture to 25 to 30°C and further add [1,1'-bis(diphenylphosphino)ferrocene]palladium(II) chloride (0.505 kg, 0.07 kg) in the first reactor /kg compound 10C(i)). Nitrogen was bubbled through the solution for 1 to 2 hours, after which the solution was heated to 75 to 80°C and stirred for 2 hours. The contents of the first reactor were sampled and the compound 10C(i) content was tested by HPLC method-011. Continue sampling and LC testing (at 30-minute intervals) until the compound 10C(i) content is less than 5.0%.

使反應混合物冷卻至45℃且減壓蒸餾第一個反應器內含物以達至體積係3 L/kg,同時保持反應器之溫度低於60℃。向第一個反應器中依序添加水(58.4 kg,8.0 kg/kg化合物2C)、甲基第三丁基醚(54 kg,7.4 kg/kg化合物10C(i)),且攪拌混合物至少10分鐘。停止攪動且使混合物靜置至少10分鐘。移除底部水層且轉移至第一個容器中,且將有機層排出至第二個容器中。向第一個反應器中依序添加水相、甲基第三丁基醚(27 kg,3.7 kg/kg化合物10C(i)),且攪拌混合物至少10分鐘。停止攪動且使混合物靜置至少10分鐘。移除底部水層且轉移至第一個容器中,且將有機層排出至第二個容器中。向第一個反應器中依序添加水相、甲基第三丁基醚(27 kg,3.7 kg/kg化合物10C(i)),且攪拌混合物至少10分鐘。停止攪動且使混合物靜置至少10分鐘。移除底部水層且轉移至第一個容器中。The reaction mixture was cooled to 45°C and the contents of the first reactor were distilled under reduced pressure to reach a volume of 3 L/kg, while keeping the temperature of the reactor below 60°C. To the first reactor, add water (58.4 kg, 8.0 kg/kg compound 2C), methyl tert-butyl ether (54 kg, 7.4 kg/kg compound 10C(i)) in sequence, and stir the mixture for at least 10 minute. Stop the agitation and let the mixture sit for at least 10 minutes. The bottom water layer was removed and transferred to the first container, and the organic layer was discharged into the second container. To the first reactor, the aqueous phase, methyl tert-butyl ether (27 kg, 3.7 kg/kg compound 10C(i)) were added in sequence, and the mixture was stirred for at least 10 minutes. Stop the agitation and let the mixture sit for at least 10 minutes. The bottom water layer was removed and transferred to the first container, and the organic layer was discharged into the second container. To the first reactor, the aqueous phase, methyl tert-butyl ether (27 kg, 3.7 kg/kg compound 10C(i)) were added in sequence, and the mixture was stirred for at least 10 minutes. Stop the agitation and let the mixture sit for at least 10 minutes. Remove the bottom water layer and transfer to the first container.

向第一個反應器中依序添加第二個容器中之有機相、矽膠(3.65 kg,0.50 kg/kg化合物10C(i)),且在25至30℃下攪拌反應器內含物至少2小時。過濾反應器內含物且將濾液收集於第三個容器中。用甲基第三丁基醚(27 kg,3.7 kg/kg化合物10C(i))沖洗第一個反應器,接著經由濾餅過濾且收集於第三個容器。取第三個容器之濾液添加第二個反應器中。To the first reactor, add the organic phase and silicone rubber (3.65 kg, 0.50 kg/kg compound 10C(i)) in the second container in sequence, and stir the reactor contents at 25 to 30°C for at least 2 hour. The reactor contents were filtered and the filtrate was collected in a third container. The first reactor was rinsed with methyl tert-butyl ether (27 kg, 3.7 kg/kg compound 10C(i)), then filtered through a filter cake and collected in a third container. Take the filtrate from the third container and add it to the second reactor.

減壓蒸餾第二個反應器之內含物以達至體積係2 L/kg,同時保持反應器之溫度低於50℃。向第二個反應器中添加庚烷(25 kg,3.42 kg/kg化合物10C(i)),且減壓蒸餾第二個反應器之內含物以達至體積係4 L/kg,同時保持反應器之溫度低於50℃。在第二個反應器中添加庚烷且再重複如所述蒸餾反應器內含物兩次。接著在第二個反應器中添加二氯甲烷(14.56 kg,2.0 kg/kg化合物10C(i)),且在25至30℃下攪拌混合物至少2小時。過濾第二個反應器之內含物且用二氯甲烷(3.24 kg,0.44 kg/kg化合物10C(i))及庚烷(3.32 kg,0.45 kg/kg化合物10C(i))之混合物洗滌濾餅及反應器。在30至40℃下真空乾燥濾餅14小時,得到粗化合物1(a)(約10 kg)。在惰性化第三個反應器中依序添加二氯甲烷(26.6 kg,3.64 kg/kg化合物10C(i))、粗化合物1(a) (約10 kg)。將反應器內含物加熱至35至45℃且攪拌至少2小時。經3小時之時段,在第三個反應器中添加庚烷(27.36,3.75 kg/kg化合物10C(i))。使混合物冷卻至20至30℃溫且保持此溫度至少2小時。過濾固體且用二氯甲烷(4.44 kg,0.61 kg/kg化合物10C(i))及庚烷(4.55 kg, 0.62 kg/kg化合物10C(i))之混合物洗滌濾餅。在30至40℃下在真空烘箱中乾燥固體至少14小時,得到化合物1(a)(8.53 kg,產率78%)。使用分析型HPLC方法-011測定產物之純度係98.71 A%。The contents of the second reactor were distilled under reduced pressure to reach a volume of 2 L/kg, while keeping the temperature of the reactor below 50°C. Heptane (25 kg, 3.42 kg/kg compound 10C(i)) was added to the second reactor, and the contents of the second reactor were distilled under reduced pressure to reach a volume of 4 L/kg while maintaining The temperature of the reactor is below 50°C. Add heptane in the second reactor and repeat the distillation of the reactor contents twice as described. Dichloromethane (14.56 kg, 2.0 kg/kg compound 10C(i)) was then added in the second reactor, and the mixture was stirred at 25 to 30°C for at least 2 hours. Filter the contents of the second reactor and wash the filter with a mixture of dichloromethane (3.24 kg, 0.44 kg/kg compound 10C(i)) and heptane (3.32 kg, 0.45 kg/kg compound 10C(i)) Cake and reactor. The filter cake was vacuum dried at 30 to 40°C for 14 hours to obtain crude compound 1(a) (about 10 kg). In the third inertized reactor, dichloromethane (26.6 kg, 3.64 kg/kg compound 10C(i)) and crude compound 1(a) (about 10 kg) were added in this order. Heat the reactor contents to 35 to 45°C and stir for at least 2 hours. Over a period of 3 hours, heptane (27.36, 3.75 kg/kg compound 10C(i)) was added to the third reactor. The mixture was cooled to a temperature of 20 to 30°C and maintained at this temperature for at least 2 hours. The solid was filtered and the filter cake was washed with a mixture of dichloromethane (4.44 kg, 0.61 kg/kg compound 10C(i)) and heptane (4.55 kg, 0.62 kg/kg compound 10C(i)). The solid was dried in a vacuum oven at 30 to 40°C for at least 14 hours to obtain compound 1(a) (8.53 kg, yield 78%). The purity of the product was 98.71 A% by analytical HPLC method-011.

實例1C:製備(2-(三氟甲基)嘧啶-5-基)

Figure 108105242-A0101-12-0030-1
酸(化合物8)Example 1C: Preparation (2-(trifluoromethyl)pyrimidin-5-yl)
Figure 108105242-A0101-12-0030-1
Acid (Compound 8)

實例1C分析方法

Figure 108105242-A0304-0007
Figure 108105242-A0304-0008
Example 1C analysis method
Figure 108105242-A0304-0007
Figure 108105242-A0304-0008

化合物8 2-(三氟甲基)嘧啶-5-基

Figure 108105242-A0101-12-0030-1
酸如下由化合物8A 5-溴-2-碘嘧啶及8B 5-溴-2-(三氟甲基)嘧啶製備:
Figure 02_image075
Compound 8 2-(trifluoromethyl)pyrimidin-5-yl
Figure 108105242-A0101-12-0030-1
The acid is prepared from compounds 8A 5-bromo-2-iodopyrimidine and 8B 5-bromo-2-(trifluoromethyl)pyrimidine as follows:
Figure 02_image075
.

在步驟1中,在攪拌下向惰性化反應器中添加DMF (149.6 kg,7 L/kg化合物8A)。向反應器中依序添加化合物8A (22.5 kg,78.98莫耳, 1當量)、CuI (6 kg,0.4當量,2.674 kg/kg化合物8A)及MeO2 CCF2 SO2 F (21.2 kg,0.944 kg/kg化合物8A)。在80至90℃下攪拌反應器內含物至少3小時,以形成包含化合物8B之反應產物混合物。對反應器取樣且藉由LC測試化合物8A含量,其中界限係化合物8A < 5%。持續在80至90℃下混合直至化合物8A含量係< 5%。使25莫耳濃度之NaHCO3 (371.3 kg,16.5 kg/kg,化合物8A)與反應產物混合物組合且在攪拌下保持在20℃至30℃下6小時。使MTBE (116.6 kg,5.18 kg/kg化合物8A)與反應產物混合物,之後與矽藻土助濾劑(22.5 kg,1 kg/kg化合物8A)組合。在20至30℃下攪拌反應產物混合物15分鐘,過濾且收集濾液。用MTBE (33.3 kg,1.48 kg/kg化合物8A)洗滌濾餅且合併濾液。In Step 1, DMF (149.6 kg, 7 L/kg compound 8A) was added to the inertization reactor with stirring. To the reactor, add compound 8A (22.5 kg, 78.98 moles, 1 equivalent), CuI (6 kg, 0.4 equivalent, 2.674 kg/kg compound 8A) and MeO 2 CCF 2 SO 2 F (21.2 kg, 0.944 kg /kg compound 8A). The reactor contents were stirred at 80 to 90°C for at least 3 hours to form a reaction product mixture containing compound 8B. The reactor was sampled and the compound 8A content was tested by LC, where the limit was compound 8A <5%. Continue mixing at 80 to 90°C until the compound 8A content is <5%. NaHCO 3 (371.3 kg, 16.5 kg/kg, compound 8A) at a concentration of 25 mol was combined with the reaction product mixture and kept under stirring at 20° C. to 30° C. for 6 hours. MTBE (116.6 kg, 5.18 kg/kg compound 8A) was combined with the reaction product, followed by diatomite filter aid (22.5 kg, 1 kg/kg compound 8A). The reaction product mixture was stirred at 20 to 30°C for 15 minutes, filtered and the filtrate was collected. The filter cake was washed with MTBE (33.3 kg, 1.48 kg/kg compound 8A) and the filtrates were combined.

使收集之濾液靜置至少10分鐘且移除底部水層。用MTBE (116.6 kg,5.18 kg/kg化合物8A)洗滌水層兩次,其中在各MTBE洗滌之後進行相分離及水層移除。合併三個有機層且進一步與5莫耳濃度NaCl水溶液(212 kg,9.42 kg/kg化合物8A)組合且攪拌至少10分鐘。使摻合物靜置至少10分鐘且移除底部水層。使有機層與5莫耳濃度NaCl水溶液(212 kg,9.42 kg/kg化合物8A)組合且攪拌至少10分鐘。使摻合物靜置至少10分鐘且移除底部水層。在大氣壓力下蒸餾反應器中剩餘之有機層以使體積減小至最小攪拌體積(約1L/kg化合物8A)。接著進一步減壓(50至100毫巴)蒸餾反應器內含物,且收集化合物8B作為80至90℃溶離份。化合物8A之產率係76.6%,且藉由HPLC方法003 V01,藉由方法MTH-003得到之HPLC純度係95.71%。The collected filtrate was allowed to stand for at least 10 minutes and the bottom water layer was removed. The aqueous layer was washed twice with MTBE (116.6 kg, 5.18 kg/kg Compound 8A), where phase separation and aqueous layer removal were performed after each MTBE wash. The three organic layers were combined and further combined with 5 molar NaCl aqueous solution (212 kg, 9.42 kg/kg Compound 8A) and stirred for at least 10 minutes. Let the blend stand for at least 10 minutes and remove the bottom water layer. The organic layer was combined with 5 molar NaCl aqueous solution (212 kg, 9.42 kg/kg Compound 8A) and stirred for at least 10 minutes. Let the blend stand for at least 10 minutes and remove the bottom water layer. The remaining organic layer in the reactor was distilled under atmospheric pressure to reduce the volume to the minimum stirring volume (about 1 L/kg compound 8A). Then the contents of the reactor were distilled under further reduced pressure (50 to 100 mbar), and compound 8B was collected as a fraction of 80 to 90°C. The yield of compound 8A was 76.6%, and the HPLC purity obtained by method MTH-003 by HPLC method 003 V01 was 95.71%.

在步驟2中,向惰性化反應器中依序添加THF (179.4 kg,7.12 kg/kg化合物8B)、化合物8B (25.2 kg,111 mol)及B(Oi-Pr)3 (31.3 kg,12.43 kg/kg化合物8B)且冷卻至-70至-80℃。經6小時向反應器中逐滴添加n-BuLi (39.7 kg,1.58 kg/kg化合物8B)以形成反應混合物,之後攪動至少1小時以形成包含化合物8之反應產物混合物。對反應產物混合物取樣且藉由HPLC方法007 V01測試化合物8B含量。持續反應直至化合物8B含量小於5%。In step 2, add THF (179.4 kg, 7.12 kg/kg compound 8B), compound 8B (25.2 kg, 111 mol) and B(Oi-Pr) 3 (31.3 kg, 12.43 kg) to the inertization reactor in this order /kg compound 8B) and cooled to -70 to -80°C. N-BuLi (39.7 kg, 1.58 kg/kg Compound 8B) was added dropwise to the reactor over 6 hours to form a reaction mixture, followed by stirring for at least 1 hour to form a reaction product mixture containing Compound 8. The reaction product mixture was sampled and tested for compound 8B content by HPLC method 007 V01. The reaction was continued until the content of compound 8B was less than 5%.

在攪拌下將水(7 kg,0.28 kg/kg化合物8B)之THF (22.4 kg,0.88 kg/kg化合物8B)溶液添加至反應產物混合物中,同時保持溫度-55至-65℃,且在攪拌下使反應產物混合物保持在該溫度下至少30分鐘。經1至2小時將反應產物加熱至0℃且接著使水(376 kg,13kg/kg化合物8B)與反應產物混合物組合,同時將溫度保持在10℃下且將反應產物混合物保持在彼等條件下至少30分鐘。使摻合物靜置至少10分鐘且移除包含化合物8之底部水層。使水層與MTBE (93.2 kg,3.7 kg/kg化合物8B)摻合且攪拌至少10分鐘。使摻合物靜置至少10分鐘且移除包含化合物8之底部水層。在小於25℃之溫度下用濃HCl (12.35 kg,0.49 kg/kg化合物8B)將水層之pH值調節至1至2。A solution of water (7 kg, 0.28 kg/kg Compound 8B) in THF (22.4 kg, 0.88 kg/kg Compound 8B) was added to the reaction product mixture with stirring, while maintaining the temperature of -55 to -65°C, while stirring The reaction product mixture is kept at this temperature for at least 30 minutes. The reaction product was heated to 0°C over 1 to 2 hours and then water (376 kg, 13 kg/kg compound 8B) was combined with the reaction product mixture while maintaining the temperature at 10°C and the reaction product mixture under these conditions At least 30 minutes. Allow the blend to stand for at least 10 minutes and remove the bottom aqueous layer containing compound 8. The water layer was blended with MTBE (93.2 kg, 3.7 kg/kg compound 8B) and stirred for at least 10 minutes. Allow the blend to stand for at least 10 minutes and remove the bottom aqueous layer containing compound 8. The pH of the aqueous layer was adjusted to 1 to 2 with concentrated HCl (12.35 kg, 0.49 kg/kg Compound 8B) at a temperature less than 25°C.

使調節pH值之水相與MTBE (93.2 kg,3.7 kg/kg化合物8B)摻合且攪拌至少10分鐘。使摻合物靜置至少10分鐘且移除底部水層,留下包含化合物8之有機層。使水層與MTBE (93.2 kg,3.7 kg/kg化合物8B)摻合且攪拌至少10分鐘,且使摻合物靜置至少10分鐘,且移除底部水層。重複摻合水層之步驟,且捨棄水層。有機層合併於反應器中且在小於45℃之溫度下減壓蒸餾以使體積減小至約3 L/kg化合物8B。在攪拌下向反應器中添加1,4-二噁烷(130.16 kg,5.17 kg/kg化合物8B)且減壓蒸餾反應器內含物以使體積減小至約3 L/kg化合物8B。使反應器內含物冷卻至25℃,得到化合物8於1,4-二噁烷中之溶液(71.3 kg,產率82%)。分析測定為24.5 w/w%化合物8。The pH-adjusted aqueous phase was blended with MTBE (93.2 kg, 3.7 kg/kg compound 8B) and stirred for at least 10 minutes. The blend was allowed to stand for at least 10 minutes and the bottom water layer was removed, leaving the organic layer containing compound 8. The water layer was blended with MTBE (93.2 kg, 3.7 kg/kg Compound 8B) and stirred for at least 10 minutes, and the blend was allowed to stand for at least 10 minutes, and the bottom water layer was removed. Repeat the steps of blending the water layer, and discard the water layer. The organic layer was combined in the reactor and distilled under reduced pressure at a temperature of less than 45°C to reduce the volume to about 3 L/kg of compound 8B. 1,4-Dioxane (130.16 kg, 5.17 kg/kg Compound 8B) was added to the reactor with stirring and the reactor contents were distilled under reduced pressure to reduce the volume to about 3 L/kg Compound 8B. The reactor contents were cooled to 25°C to obtain a solution of compound 8 in 1,4-dioxane (71.3 kg, yield 82%). The analysis determined that it was 24.5 w/w% compound 8.

實例1D:製備化合物4(a)Example 1D: Preparation of compound 4(a)

化合物4(a) (2S,4R,5S)-1-(第三丁氧基羰基)-4-氟-5-甲基吡咯啶-2-甲酸根據圖3中描繪及下文所述之方法製備。Compound 4(a) (2S,4R,5S)-1-(third butoxycarbonyl)-4-fluoro-5-methylpyrrolidine-2-carboxylic acid was prepared according to the method depicted in Figure 3 and described below .

實例1D分析方法

Figure 108105242-A0304-0009
Figure 108105242-A0304-0010
Example 1D analysis method
Figure 108105242-A0304-0009
Figure 108105242-A0304-0010

實例1D步驟1.Example 1D Step 1.

化合物4B (2S,4S)-1-(第三丁氧基羰基)-4-(第三丁基二甲基矽烷氧基)吡咯啶-2-甲酸如下由化合物4A (2S,4S)-1-(第三丁氧基羰基)-4-羥基吡咯啶-2-甲酸製備:

Figure 02_image077
Compound 4B (2S,4S)-1-(third butoxycarbonyl)-4-(third butyldimethylsilyloxy)pyrrolidin-2-carboxylic acid is as follows from compound 4A (2S,4S)-1 -(Third butoxycarbonyl)-4-hydroxypyrrolidine-2-carboxylic acid preparation:
Figure 02_image077
.

向含有DCM (279 L)之具玻璃內襯之反應器中添加化合物4A (65.2 kg)及咪唑(37.8 kg,0.580 kg/kg化合物4A)。在10至15℃下在2.5至3小時之時間段內向反應混合物中逐滴添加第三丁基二甲基矽烷基氯(46.2 kg,0.709 kg/kg化合物4A)。在25至30℃下攪拌反應混合物5小時。對反應器內含物取樣且藉由HPLC方法-001測試化合物4A含量。持續取樣及測試直至化合物4A含量小於0.1%。To a glass-lined reactor containing DCM (279 L), compound 4A (65.2 kg) and imidazole (37.8 kg, 0.580 kg/kg compound 4A) were added. To the reaction mixture, tributyldimethylsilyl chloride (46.2 kg, 0.709 kg/kg compound 4A) was added dropwise at 10 to 15°C over a period of 2.5 to 3 hours. The reaction mixture was stirred at 25 to 30°C for 5 hours. The reactor contents were sampled and the compound 4A content was tested by HPLC method-001. Continue sampling and testing until the content of compound 4A is less than 0.1%.

使反應混合物冷卻至10至15℃,過濾且用15 L DCM洗滌三次。使各相分離且用5 w%檸檬酸(80 kg)洗滌有機相兩次且攪動20分鐘。接著用鹽水(80 kg)洗滌有機相兩次且攪動20分鐘。接著有機相經無水硫酸鈉(約25 kg)脫水,用100目非編織濾布過濾,且用DCM (10L)洗滌三次。在40至45℃下真空濃縮溶離份。向反應器中添加乙酸乙酯(130 kg,2.0 kg/kg化合物4A),且經5小時在45℃下濃縮溶離份,得到呈淺黃色溶液狀之於乙酸乙酯中之化合物4A(142.5 kg)。藉由HPLC方法-001得到之HPLC純度係98.6%,雜質係0.6%。粗產物直接用於實例1D之步驟2。The reaction mixture was cooled to 10 to 15°C, filtered and washed three times with 15 L DCM. The phases were separated and the organic phase was washed twice with 5 w% citric acid (80 kg) and stirred for 20 minutes. The organic phase was then washed twice with brine (80 kg) and stirred for 20 minutes. The organic phase was then dehydrated over anhydrous sodium sulfate (approximately 25 kg), filtered with 100 mesh non-woven filter cloth, and washed three times with DCM (10 L). The dissolved fraction was concentrated in vacuo at 40 to 45°C. Ethyl acetate (130 kg, 2.0 kg/kg compound 4A) was added to the reactor, and the dissolved fraction was concentrated at 45°C over 5 hours to obtain compound 4A (142.5 kg) in ethyl acetate as a pale yellow solution. ). The HPLC purity obtained by HPLC method-001 was 98.6%, and the impurity was 0.6%. The crude product was used directly in Step 2 of Example ID.

實例1D步驟2.Example 1D Step 2.

化合物4C (2S,4S)-1-(第三丁氧基羰基)-4-(第三丁基二甲基矽烷氧基)-5-側氧基吡咯啶-2-甲酸如下由化合物4B (2S,4S)-1-(第三丁氧基羰基)-4-(第三丁基二甲基矽烷氧基)吡咯啶-2-甲酸製備:

Figure 02_image079
Compound 4C (2S, 4S)-1-(third butoxycarbonyl)-4-(third butyldimethylsilyloxy)-5- pendant pyrrolidine-2-carboxylic acid is as follows from compound 4B ( Preparation of 2S,4S)-1-(third butoxycarbonyl)-4-(third butyldimethylsilyloxy)pyrrolidine-2-carboxylic acid:
Figure 02_image079
.

向攪拌之反應器中添加水(650 kg,19.8 kg/kg化合物4B)及高碘酸鈉(58.7 kg,1.79 kg/kg化合物4B)。在攪拌10分鐘之後,獲得黃色溶液,接著與乙酸乙酯反應劑(245 kg,7.47 kg/kg化合物4B)組合。經30分鐘向反應器中添加化合物4B於乙酸乙酯(16 kg)中之溶液(49 kg,67 w%)。向反應器中添加二氧化釕(770 g,0.0235 kg/kg化合物4B),且反應器之內含物用氮氣淨化三次,且在50至55℃下在氮氣下攪拌24小時以形成反應產物混合物。對反應器內含物取樣且藉由HPLC方法-001測試化合物4B含量及化合物4C含量。持續取樣及測試直至化合物4B含量小於0.24%且化合物4C含量超出95.0%。Water (650 kg, 19.8 kg/kg Compound 4B) and sodium periodate (58.7 kg, 1.79 kg/kg Compound 4B) were added to the stirred reactor. After stirring for 10 minutes, a yellow solution was obtained, which was then combined with ethyl acetate reactant (245 kg, 7.47 kg/kg compound 4B). A solution of compound 4B in ethyl acetate (16 kg) (49 kg, 67 w%) was added to the reactor over 30 minutes. Ruthenium dioxide (770 g, 0.0235 kg/kg compound 4B) was added to the reactor, and the contents of the reactor were purged with nitrogen three times, and stirred under nitrogen at 50 to 55° C. for 24 hours to form a reaction product mixture . The reactor contents were sampled and the compound 4B content and compound 4C content were tested by HPLC method-001. Continue sampling and testing until the compound 4B content is less than 0.24% and the compound 4C content exceeds 95.0%.

使反應產物混合物冷卻至室溫(約25℃),且經由矽藻土襯墊過濾。用乙酸乙酯(20 kg)洗滌所得濾餅。分離各相且用乙酸乙酯(120 kg)萃取水相。合併有機相,冷卻至低於10℃,且緩慢添加至10 wt %亞硫酸氫鈉水溶液(120 kg,pH = 7,用120 kg 10 wt% NaOH調節)中以保持內部溫度低於10℃。分離各相且用10 w%亞硫酸氫鈉水溶液(pH = 7,用80 kg 10 wt% NaOH調節)萃取有機相。有機相用鹽水(50 kg)洗滌兩次,經無水硫酸鈉(約35 kg)脫水,且用100目非編織濾布過濾。用乙酸乙酯(25 kg)洗滌所得濾餅。將濾液及濃縮物組合且在40至45℃下真空濃縮8小時。獲得呈黃色油狀之粗化合物4C (55 kg)。The reaction product mixture was cooled to room temperature (about 25°C) and filtered through a pad of celite. The resulting filter cake was washed with ethyl acetate (20 kg). The phases were separated and the aqueous phase was extracted with ethyl acetate (120 kg). The organic phases were combined, cooled to below 10°C, and slowly added to a 10 wt% sodium bisulfite aqueous solution (120 kg, pH=7, adjusted with 120 kg 10 wt% NaOH) to keep the internal temperature below 10°C. The phases were separated and the organic phase was extracted with 10 w% aqueous sodium bisulfite solution (pH = 7, adjusted with 80 kg 10 wt% NaOH). The organic phase was washed twice with brine (50 kg), dehydrated with anhydrous sodium sulfate (about 35 kg), and filtered with a 100-mesh non-woven filter cloth. The resulting filter cake was washed with ethyl acetate (25 kg). The filtrate and concentrate were combined and concentrated in vacuo at 40 to 45°C for 8 hours. The crude compound 4C (55 kg) was obtained as a yellow oil.

如下使化合物4C結晶。將庚烷(2 L/kg,137 kg)添加至110 kg粗化合物4C中,且在40至45℃下經6小時使反應混合物濃縮至約1 L/kg。添加庚烷(2 L/kg,137 kg)且對反應混合物取樣且進行GC測試(GC,EA:0.17A%)。將庚烷(3.75 L/kg,263 kg)添加至反應混合物中,且經1小時之時段用冰水浴冷卻至15℃,使得自溶液沈澱出固體化合物4C。在15至20℃下攪拌混合物30分鐘,經2小時之時段用冰水浴冷卻至5℃,且在5至10℃下攪拌30分鐘。過濾反應混合物以獲得潤濕粗化合物4C。在25℃下真空乾燥潤濕粗物質6小時,以自101 kg潤濕固體產生67.8 kg化合物4C,LC純度係98.1 A%。獲得之分離產率係64.4% (藉由LC分析計算)。Compound 4C was crystallized as follows. Heptane (2 L/kg, 137 kg) was added to 110 kg of crude compound 4C, and the reaction mixture was concentrated to about 1 L/kg at 40 to 45°C over 6 hours. Heptane (2 L/kg, 137 kg) was added and the reaction mixture was sampled and subjected to GC test (GC, EA: 0.17A%). Heptane (3.75 L/kg, 263 kg) was added to the reaction mixture, and cooled to 15°C with an ice water bath over a period of 1 hour, so that a solid compound 4C precipitated from the solution. The mixture was stirred at 15 to 20°C for 30 minutes, cooled to 5°C with an ice water bath over a period of 2 hours, and stirred at 5 to 10°C for 30 minutes. The reaction mixture was filtered to obtain wet crude compound 4C. The wetted crude material was dried under vacuum at 25° C. for 6 hours to produce 67.8 kg of compound 4C from 101 kg of wetted solid, and the LC purity was 98.1 A%. The isolated yield obtained was 64.4% (calculated by LC analysis).

在40至45℃下真空濃縮母液6小時,產生約90 kg呈黃色油狀之粗化合物4C。將粗化合物4C溶解於正庚烷(137 kg,2 L/kg)中,經2小時之時段用冰水浴使混合物冷卻至5℃且在0至5℃下攪拌30分鐘。過濾混合物以獲得化合物4C之潤濕粗物質(約9 kg,LC純度係95.6 C%)。在25℃下真空乾燥潤濕粗物質6小時,以自9 kg潤濕固體產生6.9 kg化合物4C,LC純度係96.9 A%。分離產率係6.5% (藉由LC分析計算)。The mother liquor was concentrated in vacuo at 40 to 45°C for 6 hours, yielding about 90 kg of crude compound 4C as a yellow oil. The crude compound 4C was dissolved in n-heptane (137 kg, 2 L/kg), and the mixture was cooled to 5°C with an ice water bath over a period of 2 hours and stirred at 0 to 5°C for 30 minutes. The mixture was filtered to obtain the wet crude material of compound 4C (about 9 kg, LC purity 95.6 C%). The wetted crude material was dried under vacuum at 25°C for 6 hours to produce 6.9 kg of compound 4C from 9 kg of wetted solid, with an LC purity of 96.9 A%. The isolated yield was 6.5% (calculated by LC analysis).

在40至45℃下真空濃縮第二母液且傾入於二氧化矽(20 kg,200至300目,2.5 kg/kg)上。用石油醚及乙酸乙酯(10/1,v/v,100 L)之溶液洗滌二氧化矽,且收集濾液且在45℃下真空濃縮至乾燥。將庚烷(3 L/kg)添加至化合物4C粗油狀物中,且經1小時之時段用冰水浴使混合物由室溫冷卻至15℃,致使形成沈澱物。在15至20℃下攪拌混合物30分鐘,經2小時之時段用冰水浴冷卻至5℃,且在5至10℃下攪拌30分鐘。過濾反應混合物以獲得潤濕粗化合物4C。在25℃下真空乾燥潤濕粗物質6小時,產生3.3 kg化合物4C,LC純度係95.3 A%。分離產率係64.4% (藉由LC分析計算)。獲得之化合物4C之總和係78 kg,分離產率係77.4%(藉由LC分析計算)。The second mother liquor was concentrated in vacuo at 40 to 45°C and poured onto silica (20 kg, 200 to 300 mesh, 2.5 kg/kg). The silica was washed with a solution of petroleum ether and ethyl acetate (10/1, v/v, 100 L), and the filtrate was collected and concentrated to dryness in vacuo at 45°C. Heptane (3 L/kg) was added to the crude oil of compound 4C, and the mixture was cooled from room temperature to 15°C with an ice water bath over a period of 1 hour, resulting in the formation of a precipitate. The mixture was stirred at 15 to 20°C for 30 minutes, cooled to 5°C with an ice water bath over a period of 2 hours, and stirred at 5 to 10°C for 30 minutes. The reaction mixture was filtered to obtain wet crude compound 4C. The crude material was dried under vacuum at 25°C for 6 hours to produce 3.3 kg of compound 4C with an LC purity of 95.3 A%. The isolated yield was 64.4% (calculated by LC analysis). The total of the obtained compound 4C was 78 kg, and the isolated yield was 77.4% (calculated by LC analysis).

實例1D步驟3Example 1D Step 3

化合物4D (2S,4S)-1-(第三丁氧基羰基)-4-(第三丁基二甲基矽烷氧基)-5-亞甲基吡咯啶-2-甲酸如下由化合物4C (2S,4S)-1-(第三丁氧基羰基)-4-(第三丁基二甲基矽烷氧基)-5-側氧基吡咯啶-2-甲酸製備:

Figure 02_image081
Compound 4D (2S, 4S)-1-(third butoxycarbonyl)-4-(third butyldimethylsilyloxy)-5-methylenepyrrolidine-2-carboxylic acid is as follows from compound 4C ( Preparation of 2S,4S)-1-(third butoxycarbonyl)-4-(third butyldimethylsilyloxy)-5- pendant pyrrolidine-2-carboxylic acid:
Figure 02_image081
.

向反應器中添加二甲基二茂鈦(289 kg,於甲苯中8.9 wt%,1.28 kg/kg化合物4C)、二氯化二茂鈦(0.803 kg,0.040 kg/kg化合物4C)及20.1 kg化合物4C以產生紅色混合物。反應器用氮氣淨化5次,且相繼攪拌反應混合物8小時,同時使內部溫度保持在75至80℃下。移除反應混合物之樣品,用乙腈稀釋,且藉由HPLC使用方法-001進行分析。該方法展示產生90.6%之化合物4D且保留0.34%之化合物4C。To the reactor, add dimethyl titanocene (289 kg, 8.9 wt% in toluene, 1.28 kg/kg compound 4C), titanocene dichloride (0.803 kg, 0.040 kg/kg compound 4C) and 20.1 kg Compound 4C to produce a red mixture. The reactor was purged with nitrogen 5 times, and the reaction mixture was successively stirred for 8 hours while maintaining the internal temperature at 75 to 80°C. A sample of the reaction mixture was removed, diluted with acetonitrile, and analyzed by HPLC using method-001. This method demonstrates that 90.6% of compound 4D is produced and 0.34% of compound 4C is retained.

使反應混合物冷卻至25℃且在45℃下經14小時之時段真空濃縮至乾燥產生約60 kg固體粗物質。在5至10℃下在攪拌下將庚烷(114 kg)添加至以上殘餘物中1小時。過濾混合物且用庚烷(約50 kg)洗滌濾餅。在45℃下經7小時之時段真空組合濾液及濃縮物至乾燥,產生約30 kg固體粗物質。在5至10℃下在攪拌下添加庚烷(28.4 kg) 1小時。過濾混合物且用庚烷(約10 kg)洗滌濾餅,產生化合物4D與庚烷之溶液(62 kg)。經30分鐘之時段將二氧化矽(14 kg,60至100目)添加至以上溶液中,同時在25至30℃之溫度下攪拌溶液。在真空(石油醚/乙酸乙酯=20/1)下將溶液傾入二氧化矽(35 g,200至300目)中。在45℃下真空組合濾液及濃縮物至乾燥。獲得17.1 kg化合物4D,LC純度係92.8 A%且產率係85.5%。The reaction mixture was cooled to 25°C and concentrated in vacuo to dryness at 45°C over a period of 14 hours to produce approximately 60 kg of solid crude material. Heptane (114 kg) was added to the above residue under stirring at 5 to 10°C for 1 hour. The mixture was filtered and the filter cake was washed with heptane (about 50 kg). The filtrate and concentrate were combined under vacuum at 45°C for a period of 7 hours to dryness, yielding approximately 30 kg of crude solid material. Heptane (28.4 kg) was added under stirring at 5 to 10°C for 1 hour. The mixture was filtered and the filter cake was washed with heptane (about 10 kg) to produce a solution of compound 4D and heptane (62 kg). Add silicon dioxide (14 kg, 60 to 100 mesh) to the above solution over a period of 30 minutes, while stirring the solution at a temperature of 25 to 30°C. The solution was poured into silica (35 g, 200 to 300 mesh) under vacuum (petroleum ether/ethyl acetate=20/1). Combine the filtrate and concentrate in vacuo at 45°C to dryness. 17.1 kg of compound 4D was obtained, the LC purity was 92.8 A% and the yield was 85.5%.

實例1D步驟4.Example 1D Step 4.

化合物4E (2S,4S,5S)-1-(第三丁氧基羰基)-4-(第三丁基二甲基矽烷氧基)-5-甲基吡咯啶-2-甲酸如下由化合物4D (2S,4S)-1-(第三丁氧基羰基)-4-(第三丁基二甲基矽烷氧基)-5-亞甲基吡咯啶-2-甲酸製備:

Figure 02_image083
Compound 4E (2S, 4S, 5S)-1-(third butoxycarbonyl)-4-(tert-butyldimethylsilyloxy)-5-methylpyrrolidine-2-carboxylic acid is as follows from compound 4D Preparation of (2S,4S)-1-(third butoxycarbonyl)-4-(third butyldimethylsilyloxy)-5-methylenepyrrolidine-2-carboxylic acid:
Figure 02_image083
.

向反應器中添加化合物4D (17.1 kg,46.1 mol)、甲醇(136 kg,7.68 kg/kg化合物4D)及活性碳(1.7 kg,0.1 kg/kg化合物4D)且在25至30℃下攪拌1小時。接著過濾反應混合物且添加活性碳(1.7 kg)。用甲醇(10 )洗滌所得濾餅兩次。收集大致20 kg濾液。在25至30℃下攪拌濾液1小時,過濾(約220 L),且與潤濕鈀/碳(5 wt%,4.25 kg)組合。用甲醇(10 L)洗滌濾餅兩次,且收集大致30 kg濾液。含有此溶液之反應器用氫氣淨化三次,且在25至30℃下在氫氣氛圍(P = 1 atm)下攪拌溶液18小時。對反應器內含物取樣且藉由HPLC方法-001測試化合物4E含量,且展示化合物4E之含量係95.3 A%。Add compound 4D (17.1 kg, 46.1 mol), methanol (136 kg, 7.68 kg/kg compound 4D) and activated carbon (1.7 kg, 0.1 kg/kg compound 4D) to the reactor and stir at 25 to 30°C for 1 hour. The reaction mixture was then filtered and activated carbon (1.7 kg) was added. The resulting filter cake was washed twice with methanol (10). Collect approximately 20 kg of filtrate. The filtrate was stirred at 25 to 30°C for 1 hour, filtered (about 220 L), and combined with wetted palladium/carbon (5 wt%, 4.25 kg). The filter cake was washed twice with methanol (10 L), and approximately 30 kg of filtrate was collected. The reactor containing this solution was purged with hydrogen three times, and the solution was stirred under a hydrogen atmosphere (P = 1 atm) at 25 to 30°C for 18 hours. The contents of the reactor were sampled and the content of compound 4E was tested by HPLC method-001, and the content of compound 4E was shown to be 95.3 A%.

過濾混合物且用甲醇(約25 L)洗滌。將濾液及洗滌溶液組合且在45℃下真空濃縮至約15 L。濃縮物中添加活性碳(0.3 kg,0.18 kg/kg化合物4D),且在25至30℃下攪拌此混合物1小時,過濾(約15 L)且添加潤濕鈀/碳(5 wt%,0.556 kg)。含有此溶液之反應器用氫氣淨化三次,且在25至30℃下在氫氣氛圍(P = 1 atm)下攪拌溶液18小時。對反應器內含物取樣且藉由HPLC方法-001測試化合物4E含量,且展示化合物4E之含量係95.3 A%。The mixture was filtered and washed with methanol (about 25 L). The filtrate and washing solution were combined and concentrated in vacuo to about 15 L at 45°C. Activated carbon (0.3 kg, 0.18 kg/kg Compound 4D) was added to the concentrate, and the mixture was stirred at 25 to 30°C for 1 hour, filtered (about 15 L) and wetted palladium/carbon (5 wt%, 0.556) was added kg). The reactor containing this solution was purged with hydrogen three times, and the solution was stirred under a hydrogen atmosphere (P = 1 atm) at 25 to 30°C for 18 hours. The contents of the reactor were sampled and the content of compound 4E was tested by HPLC method-001, and the content of compound 4E was shown to be 95.3 A%.

過濾混合物且用甲醇(約5 L)洗滌,且在45℃下真空濃縮至乾燥。獲得14.4 kg化合物4E (產率=84%),純度係97.3 A%。The mixture was filtered and washed with methanol (about 5 L) and concentrated to dryness in vacuo at 45°C. 14.4 kg of compound 4E (yield=84%) was obtained with a purity of 97.3 A%.

實例1D步驟5.Example 1D Step 5.

化合物4F (2S,4S,5S)-1-(第三丁氧基羰基)-4-羥基-5-甲基吡咯啶-2-甲酸如下由化合物4E (2S,4S,5S)-1-(第三丁氧基羰基)-4-(第三丁基二甲基矽烷氧基)-5-甲基吡咯啶-2-甲酸製備:

Figure 02_image085
Compound 4F (2S, 4S, 5S)-1-(third butoxycarbonyl)-4-hydroxy-5-methylpyrrolidine-2-carboxylic acid is as follows from compound 4E (2S,4S,5S)-1-( Third butoxycarbonyl)-4-(third butyldimethylsilyloxy)-5-methylpyrrolidine-2-carboxylic acid Preparation:
Figure 02_image085
.

向反應器中添加化合物4E (30.3 kg,81.11 mol)及四氫呋喃(135 kg,4.46 kg/kg化合物4E)且攪拌10分鐘。使混合物冷卻至20至25℃,之後添加氟化四丁基銨三水合物(25.6 kg,0.845 kg/kg化合物4E)以形成反應混合物。反應器用氮氣淨化三次,接著在20至30℃下攪拌1小時以形成包含化合物4F之反應產物混合物。對反應器內含物取樣且藉由HPLC方法-001測試化合物4F含量,且展示化合物4F之含量係83.6 A%。Compound 4E (30.3 kg, 81.11 mol) and tetrahydrofuran (135 kg, 4.46 kg/kg compound 4E) were added to the reactor and stirred for 10 minutes. The mixture was cooled to 20 to 25°C, after which tetrabutylammonium fluoride trihydrate (25.6 kg, 0.845 kg/kg compound 4E) was added to form a reaction mixture. The reactor was purged with nitrogen three times, followed by stirring at 20 to 30°C for 1 hour to form a reaction product mixture containing compound 4F. The contents of the reactor were sampled and the content of compound 4F was tested by HPLC method-001, and the content of compound 4F was shown to be 83.6 A%.

使反應產物混合物冷卻至10℃,與水(130 kg,4.29 kg/kg化合物4E,約10℃)混合且攪拌10分鐘。混合物之有機相用乙酸乙酯(108 kg,81 kg及54 kg)萃取三次。合併萃取之有機相且用鹽水(120 kg,20 wt%)洗滌兩次。混合物用無水硫酸鈉(50 kg)乾燥。藉由過濾收集固體,且用乙酸乙酯(25 kg)洗滌兩次。在50℃下真空濃縮濾液。HPLC分析展示乙酸乙酯之含量係0.6 A%。將石油醚(40 kg,1.3 kg/kg化合物4E)及水(90 kg,3.0 kg/kg化合物4E)添加至殘餘物中且在5至15℃下劇烈攪拌30分鐘。藉由過濾收集固體且用預先冷卻之水(28 kg)洗滌兩次。獲得27.1 kg潤濕產物。將潤濕產物溶解於DCM (143 kg,4.72 kg/kg化合物4E)中,且用鹽水(54 kg,20 w%)洗滌混合物。分離各相且有機相經無水硫酸鈉(21 kg)乾燥,之後攪拌10分鐘。添加無水硫酸鎂(10.8 kg)且攪拌混合物30分鐘,過濾且用DCM (20 kg)洗滌兩次。在45至55℃下真空濃縮混合物。獲得20.3 kg化合物4F,LC純度係97.8 A%且未校正產率係96.6%。The reaction product mixture was cooled to 10°C, mixed with water (130 kg, 4.29 kg/kg Compound 4E, about 10°C) and stirred for 10 minutes. The organic phase of the mixture was extracted three times with ethyl acetate (108 kg, 81 kg and 54 kg). The extracted organic phases were combined and washed twice with brine (120 kg, 20 wt%). The mixture was dried with anhydrous sodium sulfate (50 kg). The solid was collected by filtration and washed twice with ethyl acetate (25 kg). The filtrate was concentrated in vacuo at 50°C. HPLC analysis showed that the content of ethyl acetate was 0.6 A%. Petroleum ether (40 kg, 1.3 kg/kg compound 4E) and water (90 kg, 3.0 kg/kg compound 4E) were added to the residue and stirred vigorously at 5 to 15°C for 30 minutes. The solid was collected by filtration and washed twice with pre-cooled water (28 kg). 27.1 kg of wetting product was obtained. The wetting product was dissolved in DCM (143 kg, 4.72 kg/kg compound 4E), and the mixture was washed with brine (54 kg, 20 w%). The phases were separated and the organic phase was dried over anhydrous sodium sulfate (21 kg), followed by stirring for 10 minutes. Anhydrous magnesium sulfate (10.8 kg) was added and the mixture was stirred for 30 minutes, filtered and washed twice with DCM (20 kg). The mixture was concentrated in vacuo at 45 to 55°C. 20.3 kg of compound 4F was obtained with an LC purity of 97.8 A% and an uncorrected yield of 96.6%.

實例1D步驟6。Example 1D Step 6.

化合物4G (2S,4S,5S)-1-(第三丁氧基羰基)-4-氟-5-甲基吡咯啶-2-甲酸如下由化合物4F (2S,4S,5S)-1-(第三丁氧基羰基)-4-(第三丁基二甲基矽烷氧基)-5-甲基吡咯啶-2-甲酸製備:

Figure 02_image087
Compound 4G (2S, 4S, 5S)-1-(third butoxycarbonyl)-4-fluoro-5-methylpyrrolidine-2-carboxylic acid is as follows from compound 4F (2S,4S,5S)-1-( Third butoxycarbonyl)-4-(third butyldimethylsilyloxy)-5-methylpyrrolidine-2-carboxylic acid Preparation:
Figure 02_image087
.

向反應器中添加化合物4F (20.3 kg,78.29 mol)、THF (110 kg,5.4 kg/kg化合物4F)及TEA (19.8 kg,0.975 kg/kg化合物4F)。用冰浴使混合物冷卻至10℃,且接著反應器用氮氣淨化三次。在10至20℃下逐滴添加三氫氟化三乙胺(10.1 kg,0.498 kg/kg化合物4F),之後添加全氟-1-丁烷磺醯氟(52.06 kg,2.56 kg/kg化合物4F),其亦係在10至20℃下逐滴添加。在10至30℃下攪拌反應混合物12小時。自反應混合物移除樣品且用乙腈稀釋以用於分析。藉由HPLC方法-001之分析展示化合物4G之含量係40.6 A%且保留0.53 A%之化合物4F。To the reactor, compound 4F (20.3 kg, 78.29 mol), THF (110 kg, 5.4 kg/kg compound 4F) and TEA (19.8 kg, 0.975 kg/kg compound 4F) were added. The mixture was cooled to 10°C with an ice bath, and then the reactor was purged with nitrogen three times. Triethylamine trihydrofluoride (10.1 kg, 0.498 kg/kg compound 4F) was added dropwise at 10 to 20°C, followed by perfluoro-1-butane sulfonyl fluoride (52.06 kg, 2.56 kg/kg compound 4F) ), which is also added dropwise at 10 to 20°C. The reaction mixture was stirred at 10 to 30°C for 12 hours. The sample was removed from the reaction mixture and diluted with acetonitrile for analysis. Analysis by HPLC method-001 showed that the content of compound 4G was 40.6 A% and 0.53 A% of compound 4F was retained.

使混合物冷卻至10℃。在10至20℃下逐滴添加高錳酸鉀水溶液(150 kg,3.22 wt%)以淨化任何去除產物。在10至20℃下攪拌反應混合物1小時。自反應混合物移除樣品且用乙腈稀釋以用於分析。藉由HPLC方法-001之分析展示化合物4G之含量係50.3 A%且不保留去除產物。The mixture was cooled to 10°C. Aqueous potassium permanganate (150 kg, 3.22 wt%) was added dropwise at 10 to 20°C to purify any removal products. The reaction mixture was stirred at 10 to 20°C for 1 hour. The sample was removed from the reaction mixture and diluted with acetonitrile for analysis. Analysis by HPLC method-001 showed that the content of compound 4G was 50.3 A% and the removal product was not retained.

在5至10℃下逐份添加碳酸氫鈉(10.15 kg,0.5 kg/kg化合物4F,pH = 7至8)且攪拌10分鐘。添加甲苯(18 kg,0.89 kg/kg化合物4F),且攪拌混合物5分鐘且經矽藻土(13 kg,0.64 kg/kg化合物4F)過濾。收集之濾餅接著用30 kg甲苯,且接著用20 kg甲苯洗滌兩次。分離有機相且用甲苯(87 kg,4.3 kg/kg化合物4F)萃取三次。合併有機相,用20 wt%鹽水(165 kg,8.1 kg/kg化合物4F)洗滌,且經無水硫酸鈉(41.2 kg,2.03 kg/kg化合物4F)脫水。混合物接著用甲苯(20 kg)洗滌兩次且在60℃下真空濃縮。LC分析展示保留60 A%甲苯。Sodium bicarbonate (10.15 kg, 0.5 kg/kg Compound 4F, pH = 7 to 8) was added portionwise at 5 to 10° C. and stirred for 10 minutes. Toluene (18 kg, 0.89 kg/kg compound 4F) was added, and the mixture was stirred for 5 minutes and filtered through celite (13 kg, 0.64 kg/kg compound 4F). The collected filter cake was then washed twice with 30 kg toluene and then with 20 kg toluene. The organic phase was separated and extracted three times with toluene (87 kg, 4.3 kg/kg compound 4F). The organic phases were combined, washed with 20 wt% brine (165 kg, 8.1 kg/kg Compound 4F), and dehydrated over anhydrous sodium sulfate (41.2 kg, 2.03 kg/kg Compound 4F). The mixture was then washed twice with toluene (20 kg) and concentrated in vacuo at 60°C. LC analysis showed that 60 A% of toluene was retained.

將石油醚(65 kg,3.2 kg/kg化合物4F)及矽膠(20 kg,200至300目)添加至殘餘物中且攪拌10分鐘。混合物經矽膠(40 kg,200至300目)過濾且用乙酸乙酯及石油醚之溶液(1:10,1.7 L)溶離。在45℃下真空濃縮混合物。獲得13.1 kg化合物4G,LC純度係90.2 A%且未校正產率係63.7%。Petroleum ether (65 kg, 3.2 kg/kg compound 4F) and silicone gel (20 kg, 200 to 300 mesh) were added to the residue and stirred for 10 minutes. The mixture was filtered through silica gel (40 kg, 200 to 300 mesh) and dissolved with a solution of ethyl acetate and petroleum ether (1:10, 1.7 L). The mixture was concentrated in vacuo at 45°C. 13.1 kg of compound 4G was obtained, the LC purity was 90.2 A% and the uncorrected yield was 63.7%.

實例1D步驟7。Example 1D Step 7.

化合物4(a) (2S,4R,5S)-1-(第三丁氧基羰基)-4-氟-5-甲基吡咯啶-2-甲酸如下由化合物4G (2S,4S,5S)-1-(第三丁氧基羰基)-4-氟-5-甲基吡咯啶-2-甲酸製備:

Figure 02_image089
。Compound 4(a) (2S,4R,5S)-1-(third butoxycarbonyl)-4-fluoro-5-methylpyrrolidine-2-carboxylic acid is as follows from compound 4G (2S,4S,5S)- Preparation of 1-(third butoxycarbonyl)-4-fluoro-5-methylpyrrolidine-2-carboxylic acid:
Figure 02_image089
.

向反應器中添加化合物4G (13 kg,49.75 mol)、甲醇(83 kg,6.4 kg/kg化合物4G)及THF (92.5 kg,7.1 kg/kg化合物4G)。用冰浴使混合物冷卻至10℃。向反應混合物中逐滴添加於水(105 kg,8.1 kg/kg化合物4G)中之氫氧化鋰(2.7 kg,0.27 kg/kg化合物4G)。經1小時之時段使混合物逐漸升溫至25至30℃,且在該溫度下攪拌12小時以形成包含化合物4(a)之反應產物混合物。自反應混合物移除樣品且用乙腈稀釋以用於分析。藉由HPLC方法-002之分析展示化合物4(a)之含量係84.5 A%且保留1.45 A%之化合物4G。To the reactor, compound 4G (13 kg, 49.75 mol), methanol (83 kg, 6.4 kg/kg compound 4G) and THF (92.5 kg, 7.1 kg/kg compound 4G) were added. The mixture was cooled to 10°C with an ice bath. Lithium hydroxide (2.7 kg, 0.27 kg/kg compound 4G) in water (105 kg, 8.1 kg/kg compound 4G) was added dropwise to the reaction mixture. The mixture was gradually warmed to 25 to 30°C over a period of 1 hour, and stirred at this temperature for 12 hours to form a reaction product mixture containing compound 4(a). The sample was removed from the reaction mixture and diluted with acetonitrile for analysis. Analysis by HPLC method-002 showed that the content of compound 4(a) was 84.5 A% and retained 1.45 A% of compound 4G.

在45℃下真空濃縮混合物且使殘餘物(約120 kg)冷卻至20℃,用80 kg DCM洗滌兩次且用47 kg DCM洗滌一次。收集有機相。使水相冷卻至10℃,經大致2.5小時之時段將1M HCl(約65 kg,0至10℃)逐滴添加至反應混合物而將pH值調節至2至3。在反應混合物中形成白色沈澱物。反應混合物在0至10℃下持續攪拌30分鐘,過濾,且收集之固體用冷水(18 kg)洗滌兩次。固體接著在60℃下真空乾燥7小時,得到10.1 kg粗產物化合物4(a)(產率= 82.1%),LC純度係99.6 A%。The mixture was concentrated in vacuo at 45°C and the residue (about 120 kg) was cooled to 20°C, washed twice with 80 kg DCM and once with 47 kg DCM. Collect the organic phase. The aqueous phase was cooled to 10°C, and 1M HCl (about 65 kg, 0 to 10°C) was added dropwise to the reaction mixture over a period of approximately 2.5 hours to adjust the pH to 2 to 3. A white precipitate formed in the reaction mixture. The reaction mixture was continuously stirred at 0 to 10°C for 30 minutes, filtered, and the collected solid was washed twice with cold water (18 kg). The solid was then dried under vacuum at 60°C for 7 hours to obtain 10.1 kg of crude product compound 4(a) (yield = 82.1%) with an LC purity of 99.6 A%.

實例2:製備結晶型式Example 2: Preparation of crystalline form

實例2-A:多晶型物篩選Example 2-A: Polymorph screening

化合物I(a)起始物質藉由X射線粉末繞射(XRPD)(參見圖6)、熱重分析(TGA)及差示掃描熱量測定法(DSC)(參見圖7)、質子核磁共振(1H NMR)(參見圖8)及動態氣相吸附(DVS)(參見圖9)表徵。表徵結果展示起始物質係略微吸濕的水合物,指定為A型。Compound I(a) starting material by X-ray powder diffraction (XRPD) (see Figure 6), thermogravimetric analysis (TGA) and differential scanning calorimetry (DSC) (see Figure 7), proton nuclear magnetic resonance ( 1H NMR) (see Figure 8) and dynamic gas phase adsorption (DVS) (see Figure 9). The characterization results show that the starting material is a slightly hygroscopic hydrate, designated as type A.

使用A型作為起始物質,多晶型物篩選經由蒸氣擴散、反溶劑添加、漿料轉化、緩慢蒸發及緩慢冷卻之方法執行。由篩選及後續研究,發現總計14種晶體型式,包括無水物E型、水合物A型、10種溶劑合物型式及兩種瞬時型式(在環境條件下轉化為A型之A0及B型)。14種晶體型式之表徵結果概述於以下表1中,且互相轉化圖式圖示於圖5中。在A型於水中磁力攪拌之後觀察到非晶形成。Using Form A as the starting material, polymorph screening is performed via vapor diffusion, anti-solvent addition, slurry conversion, slow evaporation, and slow cooling. Through screening and subsequent research, a total of 14 crystal types were found, including anhydrous E type, hydrate A type, 10 solvate types and two transient types (converted to A type A0 and B type under environmental conditions) . The characterization results of the 14 crystal types are summarized in Table 1 below, and the interconversion diagrams are shown in FIG. 5. Amorphous formation was observed after magnetic stirring of type A in water.

表1:晶體型式之表徵結果

Figure 108105242-A0304-0011
Table 1: Characterization results of crystal types
Figure 108105242-A0304-0011

選擇水合物A型及無水物E型按比例增加以用於進一步評估。A及E型各自分別在室溫(RT,約25℃)及50℃下使用磁攪拌及振盪懸浮於水中。對於A與E型,磁攪拌使得明顯非晶形成,然而經由振盪未觀察到結晶度降低,表明其機械穩定性問題。在37℃下在HPLC水、pH 6.5磷酸鹽緩衝劑及0.01 N HCl中量測A及E型之動力學溶解度。在1、2、4及24小時之端點獲取溶解度樣品,以及用於XRPD測試之濾餅及用於HPLC及pH分析之上清液。結果展示兩種型式均無型式變化,且在所有三種水性介質中A型展示比E型更高之總溶解度,表明在37℃下E型可能比A型更熱力學穩定。Hydrate type A and anhydrous type E were selected to increase proportionally for further evaluation. Types A and E were suspended in water at room temperature (RT, about 25°C) and 50°C using magnetic stirring and shaking, respectively. For Types A and E, magnetic stirring caused significant amorphous formation, however, no decrease in crystallinity was observed via oscillation, indicating a mechanical stability problem. The kinetic solubility of Forms A and E was measured at 37°C in HPLC water, pH 6.5 phosphate buffer and 0.01 N HCl. Solubility samples were taken at the end points of 1, 2, 4, and 24 hours, as well as filter cakes for XRPD testing and supernatants for HPLC and pH analysis. The results show that both types have no type change, and that in all three aqueous media, type A exhibits a higher total solubility than type E, indicating that type E may be more thermodynamically stable than type A at 37°C.

進一步研究E型之按比例增加及噴射研磨可行性。在A及E型之混合物在室溫下於DCM/正庚烷(v/v,1:3)中磁力攪拌之後獲得純E型,指示可直接分離E型。經由在室溫下於DCM/正庚烷中在晶種存在下反溶劑結晶,成功製備3-g規模之E型且藉由XRPD、TGA、DSC、偏光顯微術(PLM)、粒度分佈(PSD)及氣相層析法(GC)充分表徵,如以下實例中所更詳細地指示。觀察到長針狀晶體,且兩種溶劑殘餘物係低於50 ppm。在對2.86 g E型噴射研磨之後,收集有限之樣品(< 50 mg),且藉由XRPD、DSC、PLM及PSD表徵。在噴射研磨之產物中未偵測到明顯非晶的。Further study the proportional increase of E type and the feasibility of jet grinding. After the mixture of form A and E was magnetically stirred in DCM/n-heptane (v/v, 1:3) at room temperature, pure form E was obtained, indicating that form E could be directly separated. By anti-solvent crystallization in DCM/n-heptane in the presence of seed crystals at room temperature, a 3-g scale of Form E was successfully prepared and by XRPD, TGA, DSC, polarized microscopy (PLM), particle size distribution ( PSD) and gas chromatography (GC) are fully characterized, as indicated in more detail in the examples below. Long needle-like crystals were observed, and the two solvent residues were below 50 ppm. After 2.86 g Type E jet milling, a limited sample (<50 mg) was collected and characterized by XRPD, DSC, PLM and PSD. No obvious amorphous was detected in the jet milled product.

實例2-B:多晶型物篩選Example 2-B: Polymorph screening

用於多晶型物研究之分析方法。Analytical methods for polymorphic studies.

X射線粉末繞射(XRPD)X-ray powder diffraction (XRPD)

對於XRPD分析,使用PANalytical及Bruker X射線粉末繞射儀。所用XRPD參數列於下文,其中量測溫度係25℃。

Figure 108105242-A0304-0012
For XRPD analysis, PANalytical and Bruker X-ray powder diffractometers were used. The XRPD parameters used are listed below, where the measured temperature is 25°C.
Figure 108105242-A0304-0012

熱重分析(TGA)及差示掃描熱量測定法(DSC)Thermogravimetric analysis (TGA) and differential scanning calorimetry (DSC)

TGA資料使用來自TA Instruments之TA Q500/Q5000 TGA收集。DSC及mDSC使用來自TA Instruments之TA Q200/Q2000 DSC執行。所用詳細參數列於下文。

Figure 108105242-A0304-0013
TGA data was collected using TA Q500/Q5000 TGA from TA Instruments. DSC and mDSC were performed using TA Q200/Q2000 DSC from TA Instruments. The detailed parameters used are listed below.
Figure 108105242-A0304-0013

質子核磁共振(1 H NMR)Proton Nuclear Magnetic Resonance ( 1 H NMR)

1 H NMR資料使用DMSO-d6經Bruker 400M NMR光譜儀收集。 1 H NMR data was collected by Bruker 400M NMR spectrometer using DMSO-d6.

動態氣相吸附(DVS) DVS經由SMS (表面量測系統) DVS Intrinsic儀器量測。DVS測試參數列於下文。

Figure 108105242-A0304-0014
Dynamic Vapor Phase Adsorption (DVS) DVS is measured by SMS (Surface Measurement System) DVS Intrinsic instrument. The DVS test parameters are listed below.
Figure 108105242-A0304-0014

高壓液相層析(HPLC)High pressure liquid chromatography (HPLC)

利用Agilent 1100 HPLC且溶解度量測之詳細層析條件列於下文。

Figure 108105242-A0304-0015
Detailed chromatography conditions using Agilent 1100 HPLC and dissolution measurements are listed below.
Figure 108105242-A0304-0015

粒度分佈(PSD)Particle size distribution (PSD)

PSD資料使用雷射繞射粒度S-3500收集,且參數列於下文。

Figure 108105242-A0304-0016
PSD data was collected using laser diffraction particle size S-3500, and the parameters are listed below.
Figure 108105242-A0304-0016

氣相層析法(GC)Gas chromatography (GC)

溶劑殘餘物使用具有Agilent 7697A頂部空間之Agilent 7820A GC系統來量測。所用詳細參數列於下文。

Figure 108105242-A0304-0017
The solvent residue was measured using an Agilent 7820A GC system with an Agilent 7697A headspace. The detailed parameters used are listed below.
Figure 108105242-A0304-0017

實例2-B(1) - 反溶劑添加實驗Example 2-B(1)-Anti-solvent addition experiment

在室溫下在22種溶劑中估算化合物I(a) A型之溶解度。將大致2 mg固體添加至3 mL玻璃小瓶中。接著將表2中之溶劑以50、50、200及700 µL之次序逐步添加至小瓶中,直至固體溶解或總體積達至1 mL。表2中所概述之結果用以在多晶型物篩選中指導溶劑選擇。The solubility of Compound I(a) Form A was estimated in 22 solvents at room temperature. Approximately 2 mg of solid was added to a 3 mL glass vial. Next, the solvents in Table 2 were gradually added to the vial in the order of 50, 50, 200, and 700 µL until the solids dissolved or the total volume reached 1 mL. The results summarized in Table 2 are used to guide solvent selection in polymorph screening.

表2:溶解度實驗之概述

Figure 108105242-A0304-0018
Table 2: Overview of solubility experiments
Figure 108105242-A0304-0018

進行總計16個反溶劑添加實驗。對於各實驗,將約15 mg 化合物I(a) A型稱取至20 mL玻璃小瓶中,之後添加0.3至1.0 mL對應溶劑。混合物接著在500 RPM之速度下磁力攪拌以在室溫下得到澄清溶液。隨後,將相關反溶劑添加至溶液中以誘導沈澱或直至反溶劑之總量達至10.0 mL。澄清溶液轉移至在5℃下打漿。若未發生沈澱,則溶液接著轉移至室溫下緩慢蒸發。固體經分離供用於XRPD分析。表3中所概述之結果展示產生B、C、D、F、H及K型。A total of 16 anti-solvent addition experiments were conducted. For each experiment, weigh approximately 15 mg of Compound I(a) Type A into a 20 mL glass vial, and then add 0.3 to 1.0 mL of the corresponding solvent. The mixture was then magnetically stirred at 500 RPM to obtain a clear solution at room temperature. Subsequently, the relevant anti-solvent is added to the solution to induce precipitation or until the total amount of anti-solvent reaches 10.0 mL. The clear solution was transferred to beating at 5°C. If no precipitation occurs, the solution is then transferred to room temperature and slowly evaporated. The solid was isolated for XRPD analysis. The results summarized in Table 3 show that types B, C, D, F, H and K are produced.

表3:反溶劑添加實驗之概述

Figure 108105242-A0304-0019
*:固體經由在5℃下攪拌獲得。 **:固體經由在室溫下緩慢蒸發獲得。Table 3: Overview of anti-solvent addition experiment
Figure 108105242-A0304-0019
*: The solid was obtained by stirring at 5°C. **: The solid is obtained via slow evaporation at room temperature.

實例2-B(2) - 固體蒸氣擴散實驗Example 2-B(2)-Solid Vapor Diffusion Experiment

固體蒸氣擴散實驗使用11種溶劑進行。對於各實驗,將約10 mg 化合物I(a) A型稱取至3 mL小瓶中,其置放於具有4 mL對應溶劑之20 mL小瓶中。20 mL小瓶用蓋密封且保持在室溫下12天,以使得溶劑蒸氣與固體樣本相互作用。藉由XRPD測試分離之固體。結果概述於表4中且指示獲得A、B及F型。The solid vapor diffusion experiment was conducted using 11 solvents. For each experiment, approximately 10 mg of Compound I(a) Form A was weighed into a 3 mL vial and placed in a 20 mL vial with 4 mL of corresponding solvent. The 20 mL vial was sealed with a cap and kept at room temperature for 12 days to allow the solvent vapor to interact with the solid sample. The isolated solids were tested by XRPD. The results are summarized in Table 4 and indicate that types A, B and F were obtained.

表4:固體蒸氣擴散實驗之概述

Figure 108105242-A0304-0020
Table 4: Overview of solid vapor diffusion experiments
Figure 108105242-A0304-0020

實例2B-(3) - 緩慢蒸發實驗Example 2B-(3)-Slow evaporation experiment

緩慢蒸發實驗在12種條件下執行。對於各實驗,將大約15 mg 化合物I(a) A型稱取至3 mL玻璃小瓶中,之後添加對應溶劑或溶劑混合物,得到澄清溶液。隨後,小瓶覆蓋有具有3至4個針孔之封口膜,且保持在室溫下以使得溶液緩慢蒸發。藉由XRPD測試分離之固體。如表5中所概述,產生A、E、F及H型。The slow evaporation experiment was performed under 12 conditions. For each experiment, weigh approximately 15 mg of Compound I(a) Type A into a 3 mL glass vial, and then add the corresponding solvent or solvent mixture to obtain a clear solution. Subsequently, the vial was covered with a parafilm with 3 to 4 pinholes and kept at room temperature to allow the solution to evaporate slowly. The isolated solids were tested by XRPD. As outlined in Table 5, types A, E, F and H are generated.

表5:緩慢蒸發實驗之概述

Figure 108105242-A0304-0021
Table 5: Overview of the slow evaporation experiment
Figure 108105242-A0304-0021

實例2-B(4) - 室溫下之漿料轉化實驗Example 2-B(4)-Slurry conversion experiment at room temperature

漿料轉化實驗在室溫下在不同溶劑系統中進行。對於各實驗,使約20 mg 化合物I(a) A型於1.5 mL玻璃小瓶中懸浮於0.3 mL對應溶劑中。在懸浮液在室溫下磁力攪拌9天之後,剩餘固體經分離供用於XRPD分析。表6中所概述之結果展示獲得A、F、G、H及J型。Slurry conversion experiments were carried out in different solvent systems at room temperature. For each experiment, approximately 20 mg of Compound I(a) Form A was suspended in a 0.3 mL corresponding solvent in a 1.5 mL glass vial. After the suspension was magnetically stirred at room temperature for 9 days, the remaining solid was separated for XRPD analysis. The results summarized in Table 6 show that types A, F, G, H and J were obtained.

表6:漿料轉化實驗之概述

Figure 108105242-A0304-0022
Table 6: Overview of slurry conversion experiments
Figure 108105242-A0304-0022

實例2-B(5) - 50℃下之漿料轉化實驗Example 2-B(5)-Slurry conversion experiment at 50℃

漿料轉化實驗在50℃下在不同溶劑系統中進行。對於各實驗,使約20 mg 化合物I(a) A型於1.5 mL玻璃小瓶中懸浮於0.3 mL對應溶劑中。在懸浮液在50℃下磁力攪拌9天之後,剩餘固體經分離供用於XRPD分析。表7中所概述之結果指示產生D、F、G、H及I型。The slurry conversion experiment was conducted at 50°C in different solvent systems. For each experiment, approximately 20 mg of Compound I(a) Form A was suspended in a 0.3 mL corresponding solvent in a 1.5 mL glass vial. After the suspension was magnetically stirred at 50°C for 9 days, the remaining solid was separated for XRPD analysis. The results summarized in Table 7 indicate the generation of D, F, G, H and I types.

表7:50℃下之漿料轉化實驗之概述

Figure 108105242-A0304-0023
Table 7: Summary of slurry conversion experiment at 50℃
Figure 108105242-A0304-0023

實例2-B(6) - 液體蒸氣擴散Example 2-B(6)-Liquid vapor diffusion

進行14個液體蒸氣擴散實驗。對於各實驗,將約15 mg 化合物I(a) A型於3 mL小瓶中溶解於0.5至1.0 mL之對應溶劑中以獲得澄清溶液。隨後,將溶液置放於具有4 mL相關反溶劑之20 mL小瓶中。20 mL小瓶用蓋密封且保持在室溫下,允許溶劑蒸氣與溶液相互作用之足夠時間。固體經分離供用於XRPD分析。表8中所概述之結果展示獲得B、D、E及H型。14 liquid vapor diffusion experiments were conducted. For each experiment, approximately 15 mg of Compound I(a) Form A was dissolved in a corresponding solvent of 0.5 to 1.0 mL in a 3 mL vial to obtain a clear solution. Subsequently, the solution was placed in a 20 mL vial with 4 mL of relevant anti-solvent. The 20 mL vial is sealed with a cap and kept at room temperature, allowing sufficient time for the solvent vapor to interact with the solution. The solid was isolated for XRPD analysis. The results summarized in Table 8 show that types B, D, E and H were obtained.

表8:液體蒸氣擴散實驗之概述

Figure 108105242-A0304-0024
Table 8: Overview of liquid vapor diffusion experiments
Figure 108105242-A0304-0024

實例2-B(7) - 緩慢冷卻Example 2-B(7)-Slow cooling

緩慢冷卻實驗在14個溶劑系統中進行。對於各實驗,在室溫下使約20 mg 化合物I(a) A型於3 mL玻璃小瓶中懸浮於1.0 mL對應溶劑中。懸浮液在50℃下經磁性攪拌器以500 RPM之速度轉移至打漿。在50℃下平衡樣品2小時且使用0.45 μm耐綸(Nylon)膜過濾。隨後,濾液以0.1℃/min之速率自50℃緩慢冷卻至5℃。在XRPD分析之前將樣品儲存於5℃下。表9中所概述之結果指示獲得G及H型。The slow cooling experiment was conducted in 14 solvent systems. For each experiment, approximately 20 mg of Compound I(a) Form A was suspended in 1.0 mL of the corresponding solvent in a 3 mL glass vial at room temperature. The suspension was transferred to beating at 500 RPM via a magnetic stirrer at 50°C. The sample was equilibrated at 50°C for 2 hours and filtered using 0.45 μm Nylon membrane. Subsequently, the filtrate was slowly cooled from 50°C to 5°C at a rate of 0.1°C/min. The samples were stored at 5°C before XRPD analysis. The results summarized in Table 9 indicate that types G and H were obtained.

表9:緩慢冷卻實驗之概述

Figure 108105242-A0304-0025
Table 9: Overview of the slow cooling experiment
Figure 108105242-A0304-0025

實例2-C:共晶體篩選Example 2-C: Co-crystal screening

根據游離鹼之大致溶解度資料,在篩選中使用四個溶劑系統。對於各溶劑丙酮、THF及EtOAc,個別製備濃度30 mg/mL之游離鹼儲備溶液。在各實驗中,將0.5 mL儲備溶液與對應酸以1:1之莫耳濃度饋入比率混合,且在室溫下攪拌隔夜。對於IPA/H2O (19:1,v/v)下之條件,將溶劑添加至1:1之莫耳濃度饋入比率之游離鹼固體與酸之混合物中,在室溫下攪拌獲得之懸浮液隔夜。對在固體離心且在室溫下真空乾燥之前獲得懸浮液施用加熱-冷卻(65℃至5℃)。對於無任何固體之樣品,將澄清溶液轉移成5℃且攪拌2.5天。若仍不獲得固體,則將1.0 mL H2O添加至丙酮澄清溶液中,且對獲得之乳液施用加熱-冷卻(65℃至5℃);將1.0 mL正庚烷添加至THF/EtOAc溶液中且接著轉移成5℃。最終,將在反溶劑添加之後獲得之澄清溶液轉移至室溫下蒸發。Based on the approximate solubility data of the free base, four solvent systems were used in the screening. For each solvent acetone, THF and EtOAc, a free base stock solution with a concentration of 30 mg/mL was prepared individually. In each experiment, 0.5 mL of the stock solution and the corresponding acid were mixed at a feed ratio of 1:1 molar concentration, and stirred overnight at room temperature. For the conditions under IPA/H2O (19:1, v/v), add the solvent to the mixture of free base solid and acid at a molar ratio of 1:1 and feed ratio, and stir the obtained suspension at room temperature Overnight. Heating-cooling (65°C to 5°C) was applied to the suspension obtained before the solid was centrifuged and dried under vacuum at room temperature. For samples without any solids, the clear solution was transferred to 5°C and stirred for 2.5 days. If no solid is still obtained, 1.0 mL of H2O is added to the acetone clear solution, and heating-cooling (65°C to 5°C) is applied to the obtained emulsion; 1.0 mL of n-heptane is added to the THF/EtOAc solution and then Transfer to 5°C. Finally, the clear solution obtained after the addition of the anti-solvent was transferred to room temperature and evaporated.

如表10中所概述,分離總計三種結晶命中物,且其特徵資料概述於表11中。As outlined in Table 10, a total of three crystal hits were isolated, and their characteristic data are summarized in Table 11.

表10:共晶體篩選之概述

Figure 108105242-A0304-0026
N/A:觀察到無固體或有限量之固體。 *:觀察到有限之繞射峰。Table 10: Overview of eutectic screening
Figure 108105242-A0304-0026
N/A: No solid or limited amount of solid is observed. *: A limited diffraction peak was observed.

表11:共晶體之資料概述

Figure 108105242-A0304-0027
N/A:觀察到無固體或有限量之固體。 *:在1 H NMR中未偵測到明顯信號。觀察到有限之繞射峰。Table 11: Overview of eutectic data
Figure 108105242-A0304-0027
N/A: No solid or limited amount of solid is observed. *: No obvious signal was detected in 1 H NMR. A limited diffraction peak was observed.

實例2-D:藉由WO 2016/128529之先前技術方法製備化合物I(a)Example 2-D: Preparation of compound I(a) by the prior art method of WO 2016/128529

化合物I(a)藉由WO 2016/128529中所揭示之方法製備且藉由XRPD表徵且認為是非晶的。參見圖59及61。該化合物之TGA及DSC結果亦示於圖62中。該化合物之HPLC結果示於圖63中。Compound I(a) was prepared by the method disclosed in WO 2016/128529 and characterized by XRPD and considered to be amorphous. See Figures 59 and 61. The TGA and DSC results of this compound are also shown in FIG. 62. The HPLC results of this compound are shown in Figure 63.

實例2-E:化合物I(a)水合物A型Example 2-E: Compound I(a) Hydrate Form A

化合物I(a)起始物質藉由XRPD、TGA、DSC、1H NMR及DVS表徵。圖6之XRPD結果指示起始物質係結晶A型。TGA及DSC資料示於圖7中。在TGA中觀察到高達130℃時3.3%之重量損失,且DSC結果展示在98.0℃ (起始溫度)處之相對寬峰吸熱峰。其他XRPD結果展示在將A型在氮氣保護下加熱至80℃,冷卻至30℃且接著暴露於空氣之後無型式變化。另外,如圖8中所示,藉由1 H NMR未偵測到製程溶劑MeOH,指示A型係水合物。Compound I(a) starting material was characterized by XRPD, TGA, DSC, 1H NMR and DVS. The XRPD results in Figure 6 indicate that the starting material is crystalline Form A. TGA and DSC data are shown in Figure 7. A weight loss of 3.3% at up to 130°C was observed in TGA, and DSC results showed a relatively broad endothermic peak at 98.0°C (initial temperature). Other XRPD results showed no pattern change after heating Type A to 80°C under nitrogen protection, cooling to 30°C and then exposure to air. In addition, as shown in FIG. 8, the process solvent MeOH was not detected by 1 H NMR, indicating type A hydrate.

為進一步鑑別A型且研究其脫水特性,進行敞口條件下之DSC以測試圖7中觀察到之相對寬吸熱峰是否由重疊脫水峰及熔融峰所致,且執行變溫XRPD (VT-XRPD)以觀察A型之脫水型式。另一A型批料之未封蓋DSC結果展示在101.6℃(峰值溫度)下熔融之前歸因於脫水之56.4℃(峰值溫度)之吸熱峰。在脫水溫度已知之情況下,在氮氣保護下在增加至80且返回至30℃之溫度下執行VT-XRPD。在70℃下A型脫水之後觀察到獨特XRPD,且此新穎型式指定為A0型。在暴露於環境條件約30分鐘之後,A0型轉化為A型。因此,認為A0型係可在保護免受濕氣下觀察到之瞬時無水物。To further identify Type A and study its dehydration characteristics, DSC under open conditions was tested to test whether the relatively broad endothermic peak observed in Figure 7 was caused by overlapping dehydration peaks and melting peaks, and temperature-variable XRPD (VT-XRPD) was performed To observe the dehydration pattern of type A. The uncapped DSC results of another Type A batch showed an endothermic peak of 56.4°C (peak temperature) due to dehydration before melting at 101.6°C (peak temperature). Under the condition that the dehydration temperature is known, VT-XRPD is performed under a nitrogen atmosphere at a temperature increased to 80 and returned to 30°C. A unique XRPD was observed after Type A dehydration at 70°C, and this novel type was designated Type A0. After exposure to ambient conditions for about 30 minutes, Type A0 is converted to Type A. Therefore, it is considered that the A0 type system can be protected from moisture at the moment when the anhydrous substance is observed.

為在不同濕度下評估A型之吸濕性及物理穩定性,在環境濕度70% RH下樣品平衡之後,在25℃下收集DVS資料。如圖9中所示,在相對濕度高於10% RH且水分吸收係0.3%下觀察到吸水率緩慢增加達至80% RH,表明A型樣品略具吸濕性。在0% RH下發生脫水,指示A及A0型在25℃下之臨界水活性在0% RH與10% RH之間。To evaluate the hygroscopicity and physical stability of Type A at different humidity, DVS data was collected at 25°C after the sample was equilibrated at an ambient humidity of 70% RH. As shown in Fig. 9, at a relative humidity higher than 10% RH and a moisture absorption system of 0.3%, the water absorption rate was slowly increased to 80% RH, indicating that the type A sample was slightly hygroscopic. Dehydration occurs at 0% RH, indicating that the critical water activity of Types A and A0 at 25°C is between 0% RH and 10% RH.

實例2-F:化合物I(a)無水物E型Example 2-F: Compound I(a) Anhydrate Form E

化合物I(a) E型經由在室溫下DCM/正庚烷(v/v,1:1)中之緩慢蒸發而獲得。XRPD圖案示於圖10中,且TGA/DSC曲線示於圖11中。結果指示E型係在TGA中140℃之前重量損失係1.7%及DSC中尖銳熔融吸熱峰在147.0℃(起始溫度)之結晶。藉由如圖12中所示之1 H NMR偵測無明顯溶劑信號,指示E型係無水物。Compound I (a) Form E was obtained by slow evaporation in DCM/n-heptane (v/v, 1:1) at room temperature. The XRPD pattern is shown in FIG. 10, and the TGA/DSC curve is shown in FIG. The results indicated that the E-type system had a weight loss of 1.7% before 140°C in TGA and a sharp melting endothermic peak in DSC at 147.0°C (initial temperature). No obvious solvent signal was detected by 1 H NMR as shown in FIG. 12, indicating that the E type is anhydrous.

化合物I(a) E型經由在室溫下在DCM/正庚烷(v/v,1:2)中緩慢蒸發而重新製備成100 mg規模,且觀察到針狀晶體。為評估E型之吸濕性,在樣品在0% RH下預先平衡以移未結合除水之後在25℃下收集DVS資料。圖13中所示之DVS結果展示在25℃/80% RH下0.3%之水分吸收,表明式E型樣品略具有吸濕性。XRPD結果展示在DVS測試之後無型式變化,如圖71中所示。Compound I(a) Form E was re-prepared to a 100 mg scale via slow evaporation in DCM/n-heptane (v/v, 1:2) at room temperature, and needle-like crystals were observed. To evaluate the hygroscopicity of Form E, DVS data was collected at 25°C after the sample was pre-equilibrated at 0% RH to remove unbound water. The DVS results shown in Fig. 13 show a water absorption of 0.3% at 25°C/80% RH, indicating that the sample of formula E is slightly hygroscopic. The XRPD results show no pattern changes after the DVS test, as shown in Figure 71.

實例2-G:評估A型及E型Example 2-G: Evaluation of type A and type E

根據型式鑑別結果,選擇A及E型且重新製備以用於進一步評估,包括機械穩定性研究、臨界水活性測定及動力學溶解度量測。Based on the type identification results, types A and E were selected and re-prepared for further evaluation, including mechanical stability studies, critical water activity measurements, and kinetic dissolution measurements.

如下重新製備A型。Form A was re-prepared as follows.

化合物I(a)水合物A型經由在60℃下乾燥B型濾餅(由非晶化合物I(a)製備)而重新製備成1 g,以用於評估。將1.0 g非晶化合物I(a)固體稱取至20 mL玻璃小瓶中。在室溫下在機械攪拌下將8 mL MeOH添加至小瓶中隔夜以形成懸浮液。對懸浮液取樣以用於XPRD且所得圖案與B型對應。在室溫下蒸發懸浮液以誘導額外沈澱。在溶劑移除之後,在60℃下乾燥固體隔夜。XRPD結果示於圖20中且指示製了A型。根據圖21中所示之TGA及DSC結果,觀察到高達80℃時2.1%之重量損失及98.1℃下之寬吸熱峰。Compound I(a) hydrate form A was reconstituted into 1 g by drying the filter cake of type B (prepared from amorphous compound I(a)) at 60°C for evaluation. 1.0 g of amorphous compound I(a) solid was weighed into a 20 mL glass vial. 8 mL of MeOH was added to the vial under mechanical stirring at room temperature overnight to form a suspension. The suspension was sampled for XPRD and the resulting pattern corresponds to type B. The suspension was evaporated at room temperature to induce additional precipitation. After the solvent was removed, the solid was dried at 60°C overnight. The XRPD result is shown in FIG. 20 and indicates that Type A is made. According to the TGA and DSC results shown in Fig. 21, a 2.1% weight loss at 80°C and a wide endothermic peak at 98.1°C were observed.

如下重新製備E型。Form E was re-prepared as follows.

化合物I(a) E型經由在室溫下在DCM/正庚烷中添加反溶劑,之後蒸發至乾燥而製備成1 g。將1.0 g非晶化合物I(a)固體稱取至20 mL玻璃小瓶中。添加4 mL DCM且在室溫下攪拌得到澄清溶液。將4 mL正庚烷添加至溶液中,之後添加約1 mg 化合物I(a) E型晶種。溶液即刻變混濁。持續攪拌6小時。在室溫下蒸發懸浮液以誘導進一步結晶。在溶劑移除之後,在60℃下乾燥固體隔夜。圖22中所示之XRPD結果展示成功重新製備了E型。根據圖23中所示之TGA及DSC資料,觀察到高達145℃時0.4%之重量損失及145.9℃(起始溫度)之尖銳熔融吸熱峰。Compound I(a) Form E was prepared by adding an anti-solvent in DCM/n-heptane at room temperature, and then evaporated to dryness to prepare 1 g. 1.0 g of amorphous compound I(a) solid was weighed into a 20 mL glass vial. Add 4 mL DCM and stir at room temperature to get a clear solution. 4 mL of n-heptane was added to the solution, and then about 1 mg of Compound I(a) Type E seed crystal was added. The solution became cloudy immediately. Continue stirring for 6 hours. The suspension was evaporated at room temperature to induce further crystallization. After the solvent was removed, the solid was dried at 60°C overnight. The XRPD results shown in Figure 22 show that the E-type was successfully re-prepared. According to the TGA and DSC data shown in FIG. 23, a weight loss of 0.4% at 145°C and a sharp melting endothermic peak of 145.9°C (initial temperature) were observed.

重新製備之A及E型於水中之磁攪拌使得非晶形成,然而經由振盪未觀察到結晶度降低,表明機械穩定性問題。三種水性介質(HPLC水、pH 6.5磷酸鹽緩衝劑及0.01N HCl)中之動力學溶解度結果顯示在37℃下長達24小時時A型展示比E型更高之總溶解度,展現在37℃下E型可能比A型更熱力學穩定。The magnetic stirring of the re-prepared Forms A and E in water led to the formation of amorphous, however, no decrease in crystallinity was observed through shaking, indicating a problem of mechanical stability. The kinetic solubility results in three aqueous media (HPLC water, pH 6.5 phosphate buffer and 0.01N HCl) showed that type A exhibited a higher total solubility than type E at 37°C for up to 24 hours at 37°C The lower E type may be more thermodynamically stable than the A type.

實例2-G(1):於水中之機械力穩定性Example 2-G(1): Stability of mechanical force in water

在室溫及50℃下於水中磁攪拌九天之後,水合物A型易於轉變成非晶的。1 H NMR結果展示在室溫下漿料樣品無顯而易見的化學降解。為研究非晶形成之原因,分別在室溫及50℃下使用磁攪拌及振盪使A及E型懸浮於水中。結果概述於表12中(其中「Exp」係指實驗,「S. Form」係指起始型式,「負載量」係指固體負載量(mg/mL),「方法」係指打漿方法,「Temp.」係指以℃計之溫度,「時間」係指以天計之取樣時間且「固體型式」係指在打漿之後獲得固體型式。如XRPD結果所示,在室溫下獲得非晶,且在50℃下於水中將E型磁力攪拌七天之後觀察到非晶暈。A型及A及E型之混合物在室溫下在水中振盪三天。XRPD結果展示無明顯結晶度降低,指示磁攪拌之機械研磨效應有助於在水中非晶形成。After magnetic stirring in water at room temperature and 50°C for nine days, the hydrate form A is easily transformed into amorphous. The 1 H NMR results show that there is no obvious chemical degradation of the slurry sample at room temperature. In order to study the reasons for the formation of amorphous, magnetic stirring and shaking were used to suspend A and E types in water at room temperature and 50°C, respectively. The results are summarized in Table 12 (where "Exp" refers to the experiment, "S. Form" refers to the initial type, "Load" refers to the solid loading (mg/mL), and "Method" refers to the beating method, ""Temp." refers to the temperature in ℃, "time" refers to the sampling time in days and "solid type" refers to the solid type obtained after beating. As shown by the XRPD results, the amorphous is obtained at room temperature, And after stirring E-type magnetic force in water at 50°C for seven days, an amorphous halo was observed. The mixture of type A and A and E was shaken in water for three days at room temperature. XRPD results showed no significant crystallinity decrease, indicating magnetic The mechanical grinding effect of stirring contributes to the formation of amorphous in water.

表12:A型及E型打漿實驗之概述

Figure 108105242-A0304-0028
Table 12: Overview of Type A and Type E Beating Experiments
Figure 108105242-A0304-0028

實例2-G(2):臨界水活性Example 2-G(2): critical water activity

為測定A與E型之間的臨界水活性,試圖在室溫下在三種溶劑-水系統(包括丙酮、ACN及DMSO)中經由振盪方法進行漿料轉化,其中自多晶型物篩選未觀察到溶劑化。In order to determine the critical water activity between Forms A and E, an attempt was made to perform slurry conversion by shaking method in three solvent-water systems (including acetone, ACN and DMSO) at room temperature, where no screening from polymorphs was observed To solvate.

詳細而言,約40 mg固體在1 mL溶劑混合物中以500 RPM之速度振盪。結果概述於表13中。A與E型在室溫下在丙酮/H2O (v/v,1:2)及ACN/H2O (v/v,1:2)中振盪之後轉化為油狀物,然而在DMSO/H2O (v/v,1:2)中觀察到新穎DMSO溶劑合物M型。In detail, approximately 40 mg of solid was shaken at a rate of 500 RPM in a 1 mL solvent mixture. The results are summarized in Table 13. Types A and E were converted into oil after shaking in acetone/H2O (v/v, 1:2) and ACN/H2O (v/v, 1:2) at room temperature, but in DMSO/H2O (v /v, 1:2) The novel DMSO solvate M type was observed.

表13:A型及E型水活性實驗之概述

Figure 108105242-A0304-0029
Table 13: Overview of Type A and Type E water activity experiments
Figure 108105242-A0304-0029

實例2-G(3):動力學溶解度Example 2-G(3): Kinetic solubility

為比較A與E型之間的活體外溶解,在1、2、4及24小時之端點量測37℃下於水(HPLC級)、pH 6.5磷酸鹽緩衝劑及0.01N HCl中之動力學溶解度。將懸浮液於4 mL塑膠小瓶中混合且在37℃下於恆溫箱中滾轉(25 RPM),初始固體負載量係5 mg/mL。在1、2、4及24小時之端點,經由以14000 RPM之高速離心來分離懸浮液。固體藉由XRPD表徵,且上清液藉由HPLC及pH測試分析。觀察到在所有三種介質中長達24小時時A及E型均無型式變化。結果概述於表14中(其中「Phos.」係指磷酸鹽,「S」係指以μg/mL計之溶解度,「pH」係指最終pH值,且「FC」係指型式變化)。在所有三種水性介質中A型展示比E型更高之總溶解度,表明在37℃下E型可能比A型更熱力學穩定。To compare the in vitro dissolution between types A and E, the kinetics in water (HPLC grade), pH 6.5 phosphate buffer and 0.01N HCl at 37°C at the endpoints of 1, 2, 4, and 24 hours were measured. Learn solubility. The suspension was mixed in a 4 mL plastic vial and rolled (25 RPM) in a thermostat at 37° C. The initial solid loading was 5 mg/mL. At the end points of 1, 2, 4 and 24 hours, the suspension was separated by high-speed centrifugation at 14000 RPM. The solid was characterized by XRPD, and the supernatant was analyzed by HPLC and pH test. It was observed that there was no pattern change in types A and E for up to 24 hours in all three media. The results are summarized in Table 14 (where "Phos." refers to phosphate, "S" refers to solubility in μg/mL, "pH" refers to the final pH, and "FC" refers to the type change). Type A showed higher total solubility than Type E in all three aqueous media, indicating that Type E may be more thermodynamically stable than Type A at 37°C.

表14:

Figure 108105242-A0304-0030
Table 14:
Figure 108105242-A0304-0030

實例2-H:E型之按比例增加及噴射研磨可行性Example 2-H: Proportional increase of E type and the feasibility of jet grinding

實例2-H(1):水合物A型及無水物E型在DCM/正庚烷中之打漿競爭實驗Example 2-H(1): Competition experiment of beating of hydrate type A and anhydrous type E in DCM/n-heptane

執行水合物A型及無水物E之打漿競爭實驗。在室溫下在攪拌下製備化合物I(a)A型於DCM/正庚烷(1:3 v/v)中之飽和溶液30分鐘。將約5 mg化合物I(a)A型及E型中之各者置放於HPLC小瓶中。A型溶液經由PTFE過濾器過濾至小瓶中以形成混合物,且在室溫下磁力攪拌內含物。在平衡隔夜之後,將混合物離心且取樣以用於XRPD分析。XRPD結果描繪於圖14中。Perform beating competition experiment of hydrate type A and anhydrous E. A saturated solution of Compound I(a) Form A in DCM/n-heptane (1:3 v/v) was prepared at room temperature with stirring for 30 minutes. Approximately 5 mg of each of Compound I (a) Form A and Form E was placed in an HPLC vial. The Type A solution was filtered through a PTFE filter into a vial to form a mixture, and the contents were magnetically stirred at room temperature. After equilibrating overnight, the mixture was centrifuged and sampled for XRPD analysis. The XRPD results are depicted in Figure 14.

實例2-H(2):於DCM/正庚烷之中反溶劑結晶Example 2-H(2): Anti-solvent crystallization in DCM/n-heptane

化合物I(a)無水物E型如下按比例增加至3 g。將2.89 g非晶化合物I(a)固體置放於100 mL反應器中且在攪拌下與10 mL DCM組合以獲得澄清溶液。正庚烷以3 mL增量添加直至在已添加9 mL正庚烷之後觀察到混濁。在攪拌下添加0.40 g化合物I(a) E型晶種且老化1小時。經4小時用注射泵添加21 mL正庚烷,且持續攪拌隔夜。晶體藉由過濾分離且在50℃下在真空烘箱中乾燥隔夜。獲得3.01 g乾燥固體產率係約93.3%。初識化合物I(a)濃度係約280 mg/mL;晶種負載係14%;接種點發生在DCM/正庚烷10:9 v/v;最終DCM/正庚烷比率係1:3 v/v;母液濃度係3.1 mg/mL;觀察到針狀晶體形態;晶體型式係E型;且熔點係147.5℃;殘餘溶劑係< 32 ppm DCM及19.4 ppm正庚烷。粒度分佈資料(PSD)示於以下表15中。Compound I (a) Anhydrous Form E is scaled up to 3 g as follows. 2.89 g of amorphous Compound I(a) solid was placed in a 100 mL reactor and combined with 10 mL DCM with stirring to obtain a clear solution. The n-heptane was added in 3 mL increments until turbidity was observed after 9 mL of n-heptane had been added. With stirring, 0.40 g of Compound I(a) Form E seed crystals were added and aged for 1 hour. 21 mL of n-heptane was added with a syringe pump over 4 hours, and stirring was continued overnight. The crystals were separated by filtration and dried in a vacuum oven at 50°C overnight. The yield of 3.01 g of dried solid was about 93.3%. The initial concentration of compound I(a) is about 280 mg/mL; the seed loading system is 14%; the inoculation point occurs at DCM/n-heptane 10:9 v/v; the final DCM/n-heptane ratio is 1:3 v /v; mother liquor concentration is 3.1 mg/mL; needle-like crystal morphology is observed; crystal type is E-type; and melting point is 147.5°C; residual solvent is <32 ppm DCM and 19.4 ppm n-heptane. The particle size distribution data (PSD) are shown in Table 15 below.

表15:化合物I(a) E型粒度分佈

Figure 108105242-A0304-0031
Table 15: Compound I(a) E-type particle size distribution
Figure 108105242-A0304-0031

圖15中所示之XRPD結果指示獲得E型。根據圖16中之TGA及DSC資料,觀察到145℃之前的重量損失係0.8%且尖銳吸熱峰在147.5℃(起始溫度)。PSD資料展示粒度之雙峰式分佈,且第二最大值歸因於小聚結物,因為其在超音波處理之後降低。The XRPD results shown in Fig. 15 indicate that type E was obtained. According to the TGA and DSC data in Fig. 16, the weight loss before 145°C was observed to be 0.8% and the sharp endothermic peak was at 147.5°C (initial temperature). The PSD data shows a bimodal distribution of particle size, and the second maximum is attributed to small agglomerates because it decreases after ultrasound treatment.

實例2-H(3):噴射研磨研究Example 2-H(3): Jet grinding research

對2.86 g 化合物I(a) E型執行噴射研磨以研究任何可能的機械效應。在該研究中,在0.7 mPa及2 kg/h之饋入速率下研磨2.86 g E型。PSD特徵資料(無超音波處理)概述於表16中。PSD特徵資料(有超音波處理)概述於表17中Jet milling was performed on 2.86 g of Compound I(a) Type E to investigate any possible mechanical effects. In this study, 2.86 g Type E was ground at 0.7 mPa and a feed rate of 2 kg/h. PSD characteristic data (without ultrasonic processing) are summarized in Table 16. PSD characteristic data (with ultrasound processing) are summarized in Table 17

表16:噴射研磨資料(無超音波處理)

Figure 108105242-A0304-0032
Table 16: Jet grinding data (without ultrasonic processing)
Figure 108105242-A0304-0032

表16:噴射研磨資料(無超音波處理)

Figure 108105242-A0304-0033
Table 16: Jet grinding data (without ultrasonic processing)
Figure 108105242-A0304-0033

如圖17中所示之XRPD結果,未觀察到噴射研磨產物型式變化或明顯非晶暈。DSC結果圖18展示140.8℃(起始溫度)之加寬的吸熱峰。研磨產物由小顆粒、小聚結物及少量長針狀物組成。表16中所概述之PSD資料展示不規則粒度分佈,且超音波處理之後的降低之最大值(>10 µm)歸因於小聚結物。As shown in the XRPD results shown in FIG. 17, no change in the type of jet mill product or significant amorphous halo was observed. DSC results Figure 18 shows a broadened endothermic peak at 140.8°C (starting temperature). The ground product consists of small particles, small agglomerates and a small amount of long needles. The PSD data summarized in Table 16 shows an irregular particle size distribution, and the maximum decrease (>10 µm) after ultrasound treatment is attributed to small agglomerates.

實例2-I:化合物I(a) A0型Example 2-I: Compound I(a) Form A0

A0型藉由在氮氣保護下使A型脫水獲得,且XRPD圖案示於圖24中。咸信A0型係瞬時型式,因為其在暴露於環境條件之後轉化為A型。Type A0 is obtained by dehydrating Type A under the protection of nitrogen, and the XRPD pattern is shown in FIG. 24. Xianxin A0 type is a transient type because it is converted to type A after being exposed to environmental conditions.

實例2-J:化合物I(a) B型Example 2-J: Compound I(a) Type B

B型可藉由MeOH介導之結晶或固相轉變獲得。如圖19中所示,在透射模式下收集B型之代表性XRPD圖案,其經由A型固體與MeOH蒸氣之相互作用獲得。在10分鐘內風乾之後觀察到B至A型之快速形式轉化。考慮到由多種醇形成溶劑合物,推測B型係瞬時MeOH溶劑合物。Type B can be obtained by MeOH-mediated crystallization or solid phase transformation. As shown in FIG. 19, a representative XRPD pattern of type B was collected in transmission mode, which was obtained through the interaction of type A solid with MeOH vapor. A rapid form conversion of Forms B to A was observed after air drying within 10 minutes. Considering the formation of solvates from multiple alcohols, it is speculated that the B-type transient MeOH solvates.

實例2-K:化合物I(a) C型Example 2-K: Compound I(a) Form C

C型可經由將H2 O添加至DMAc溶液中可再生產地獲得。圖25中之XRPD結果展示C型具有高結晶度。圖26中之TGA及DSC結果展示在200℃之前12.3%之相當大的重量損失及在分解之前100.4℃(起始溫度)之尖銳吸熱峰。如圖27中所示之1 H NMR結果,偵測到相對於化合物I(a) 0.90當量之DMAc (11.4%),與TGA重量損失一致。此外,XRPD結果展示C型在氮氣保護下加熱至105℃且冷卻至30℃且暴露於空氣之後轉化為非晶。因此,咸信C型係DMAc溶劑合物。Form C can be reproducibly obtained by adding H 2 O to the DMAc solution. The XRPD results in Figure 25 show that Form C has high crystallinity. The TGA and DSC results in FIG. 26 show a considerable weight loss of 12.3% before 200°C and a sharp endothermic peak of 100.4°C (initial temperature) before decomposition. As shown in the 1 H NMR result shown in FIG. 27, 0.90 equivalents of DMAc (11.4%) relative to Compound I(a) was detected, which was consistent with the TGA weight loss. In addition, XRPD results show that Form C was converted to amorphous after being heated to 105°C under nitrogen and cooled to 30°C and exposed to air. Therefore, Xianxin C-type DMAc solvate.

實例2-L:化合物I(a) D型Example 2-L: Compound I(a) Form D

D型經由苯甲醚介導之結晶獲得。D型經由苯甲醚溶液與正庚烷蒸氣之相互作用獲得,且其XRPD示圖28中。圖29中之TGA及DSC結果展示200℃之前20.7%之相當大的重量損失及94.9℃(起始溫度)下之尖銳吸熱峰。如圖30中所示之1 H NMR結果,偵測到相對於化合物I(a) 0.84當量之苯甲醚(13.0%)且未偵測到明顯量之正庚烷。此外,在D型在氮氣保護下加熱至100℃,冷卻至30℃且暴露於空氣之後觀察到若干E型之特徵峰,如圖31中之XRPD所示。因此,咸信D型係苯甲醚溶劑合物。Form D is obtained through anisole-mediated crystallization. Form D was obtained through the interaction of anisole solution and n-heptane vapor, and its XRPD is shown in FIG. 28. The TGA and DSC results in Figure 29 show a considerable weight loss of 20.7% before 200°C and a sharp endothermic peak at 94.9°C (starting temperature). As a result of 1 H NMR shown in FIG. 30, 0.84 equivalents of anisole (13.0%) relative to Compound I(a) was detected and no significant amount of n-heptane was detected. In addition, after the type D was heated to 100°C under nitrogen protection, cooled to 30°C and exposed to air, several characteristic peaks of the type E were observed, as shown by XRPD in Fig. 31. Therefore, Xianxin D type anisole solvate.

實例2-M:化合物I(a) F型Example 2-M: Compound I(a) Form F

F型可藉由EtOH介導之結晶或固相轉變獲得。F型經由在室溫下緩慢蒸發EtOH溶液獲得,且其XRPD示於圖32中。圖33中之TGA及DSC結果展示在200℃之前8.3%之重量損失及100.3℃之尖銳吸熱峰,之後136.4℃(起始溫度)之小吸熱峰。如圖34中所示之1 H NMR結果,偵測到相對於化合物I(a) 0.88當量之EtOH (6.2%)。此外,在F型在氮氣保護下加熱至105℃,冷卻至30℃且暴露於空氣之後觀察到若干E型之特徵峰,如圖35中之XRPD所示。因此,咸信F型係EtOH溶劑合物。Type F can be obtained by EtOH-mediated crystallization or solid phase transformation. Form F was obtained by slowly evaporating the EtOH solution at room temperature, and its XRPD is shown in FIG. 32. The TGA and DSC results in Figure 33 show a weight loss of 8.3% before 200°C and a sharp endothermic peak of 100.3°C, followed by a small endothermic peak of 136.4°C (starting temperature). As a result of 1 H NMR shown in FIG. 34, 0.88 equivalents of EtOH (6.2%) relative to Compound I(a) was detected. In addition, after the F-type was heated to 105° C. under nitrogen, cooled to 30° C. and exposed to air, several characteristic peaks of the E-type were observed, as shown by XRPD in FIG. 35. Therefore, Xianxin F type EtOH solvate.

實例2-N:化合物I(a) G型Example 2-N: Compound I(a) Form G

G型可藉由甲苯介導之結晶獲得。G型經由使甲苯溶液由50℃緩慢冷卻至5℃獲得,且其XRPD示於圖36中。圖37中之TGA及DSC結果展示200℃之前17.8%之重量損失及106.3℃(起始溫度)之尖銳吸熱峰。1 H NMR結果圖38展示偵測到相對於化合物I(a) 0.82當量之甲苯(11.0%)。此外,G型轉在氮氣保護下加熱至110,冷卻至30℃且暴露於空氣之後化為E型,如圖39中之XRPD所示。因此,咸信G型係甲苯溶劑合物。Form G can be obtained by toluene-mediated crystallization. Form G was obtained by slowly cooling the toluene solution from 50°C to 5°C, and its XRPD is shown in Fig. 36. The TGA and DSC results in Figure 37 show a weight loss of 17.8% before 200°C and a sharp endothermic peak of 106.3°C (starting temperature). 1 H NMR results Figure 38 shows that 0.82 equivalents of toluene (11.0%) relative to compound I(a) was detected. In addition, the G-type switch was heated to 110 under the protection of nitrogen, cooled to 30°C and exposed to air and then transformed into the E-type, as shown by XRPD in FIG. 39. Therefore, Xianxin G type toluene solvate.

實例2-O:化合物I(a) H型Example 2-O: Compound I(a) H type

H型可藉由IPA介導之結晶或相變獲得。H型經由在室溫下緩慢蒸發MTBE/IPA (v/v,1:1)獲得,且其XRPD示於圖40中。圖41中之TGA及DSC結果展示200℃之前15.8%之重量損失及116.3℃(起始溫度)之尖銳吸熱峰。1 H NMR結果圖42展示偵測到相對於化合物I(a) 1.02當量之IPA (9.1%)未偵測到明顯量之MTBE。此外,H型在氮氣保護下加熱至125℃,冷卻至30℃且暴露於空氣之後轉化為E型,如圖43中之XRPD所示。因此,咸信H型係IPA溶劑合物。Type H can be obtained by IPA-mediated crystallization or phase transformation. Form H was obtained by slowly evaporating MTBE/IPA (v/v, 1:1) at room temperature, and its XRPD is shown in FIG. 40. The TGA and DSC results in Figure 41 show a 15.8% weight loss before 200°C and a sharp endothermic peak of 116.3°C (starting temperature). 1 H NMR results Figure 42 shows that 1.02 equivalents of IPA (9.1%) relative to compound I(a) was detected, and no significant amount of MTBE was detected. In addition, the H type is heated to 125°C under nitrogen protection, cooled to 30°C and exposed to air and then converted to the E type, as shown by XRPD in Fig. 43. Therefore, Xianxin H-type IPA solvate.

實例2-P:化合物I(a) I型Example 2-P: Compound I(a) Form I

I型藉由在50℃下A型在1-丁醇中之漿料轉化獲得。圖44中之XRPD結果展示I型具有高結晶度。圖45中之TGA及DSC結果展示200℃之前13.7%之重量損失及90.0℃(起始溫度)之尖銳吸熱峰。1 H NMR結果圖46展示偵測到相對於化合物I(a) 1.13當量之1-丁醇(12.1%)。此外,I型在氮氣保護下加熱至95℃,冷卻至30℃且接著暴露於空氣之後轉化為非晶。因此,咸信I型係1-丁醇溶劑合物。Type I is obtained by slurry conversion of Type A in 1-butanol at 50°C. The XRPD results in Figure 44 show that Type I has high crystallinity. The TGA and DSC results in Figure 45 show a 13.7% weight loss before 200°C and a sharp endothermic peak at 90.0°C (starting temperature). 1 H NMR results Figure 46 shows that 1.13 equivalents of 1-butanol (12.1%) relative to compound I(a) were detected. In addition, Type I was heated to 95°C under nitrogen protection, cooled to 30°C and then transformed into amorphous after being exposed to air. Therefore, Xianxin Type I is a 1-butanol solvate.

實例2-Q:化合物I(a) J型Example 2-Q: Compound I(a) Type J

J型經由在室溫下A型在MeTHF/正庚烷(v/v,1:2)中打漿獲得。圖47中之XRPD結果展示J型具有高結晶度。圖48中之TGA及DSC結果展示200℃之前14.4%之重量損失及82.2℃ (起始溫度)之尖銳吸熱峰。1 H NMR結果圖49展示偵測到相對於化合物I(a) 0.93當量之MeTHF(11.6%)未偵測到明顯量之正庚烷。此外,在J型在氮氣保護下加熱至85℃,冷卻至30℃且暴露於空氣之後產生明顯量之非晶。因此,咸信J型係MeTHF溶劑合物。Form J was obtained by beating form A in MeTHF/n-heptane (v/v, 1:2) at room temperature. The XRPD results in Figure 47 show that the J-type has high crystallinity. The TGA and DSC results in Figure 48 show a weight loss of 14.4% before 200°C and a sharp endothermic peak of 82.2°C (starting temperature). 1 H NMR results Figure 49 shows that 0.93 equivalents of MeTHF (11.6%) to compound I(a) was detected, and no significant amount of n-heptane was detected. In addition, the J-type was heated to 85°C under nitrogen, cooled to 30°C and exposed to air to produce a significant amount of amorphous. Therefore, Xianxin J-type MeTHF solvate.

實例2-R:化合物I(a) K型Example 2-R: Compound I(a) Type K

K型經由在-20℃下A型在THF/正庚烷(v/v,1:2)中打漿獲得。圖50中之XRPD結果展示K型具有高結晶度。圖51中之TGA及DSC結果展示200℃之前10.0%之重量損失及86.8℃(起始溫度)之尖銳吸熱峰。1 H NMR結果圖52展示偵測到相對於化合物I(a) 0.76當量之THF(8.3%)。此外,在K型在氮氣保護下加熱至90℃,冷卻至30℃且暴露於空氣之後產生明顯量之非晶。因此,咸信K型係THF溶劑合物。Form K was obtained by beating form A in THF/n-heptane (v/v, 1:2) at -20°C. The XRPD results in Figure 50 show that the K-type has high crystallinity. The TGA and DSC results in Figure 51 show a weight loss of 10.0% before 200°C and a sharp endothermic peak of 86.8°C (initial temperature). 1 H NMR results Figure 52 shows that 0.76 equivalents of THF (8.3%) relative to compound I(a) were detected. In addition, the K-type was heated to 90°C under nitrogen protection, cooled to 30°C and exposed to air to produce a significant amount of amorphous. Therefore, Xianxin K-type THF solvate.

實例2-S:化合物I(a) L型Example 2-S: Compound I(a) L form

L型經由在室溫下非晶形化合物I(a)在異丁醇中打漿獲得。圖53中之XRPD結果展示L型具有高結晶度。圖54中之TGA及DSC結果展示200℃之前11.2%之相當大的重量損失及106.8℃(起始溫度)之尖銳吸熱峰。1 H NMR結果圖55展示偵測到相對於化合物I(a) 0.97當量之異丁醇(10.6%)。此外,L型在氮氣保護下加熱至110℃,冷卻至30℃且接著暴露於空氣之後轉化為非晶。因此,咸信L型係異丁醇溶劑合物。The L form is obtained by beating amorphous compound I(a) in isobutanol at room temperature. The XRPD results in Figure 53 show that the L-type has high crystallinity. The TGA and DSC results in Figure 54 show a considerable weight loss of 11.2% before 200°C and a sharp endothermic peak of 106.8°C (initial temperature). 1 H NMR results Figure 55 shows that 0.97 equivalents of isobutanol (10.6%) relative to compound I(a) was detected. In addition, the L-form was heated to 110°C under the protection of nitrogen, cooled to 30°C and then transformed into amorphous after being exposed to air. Therefore, Xianxin L-type isobutanol solvate.

實例2-T:化合物I(a) M型Example 2-T: Compound I(a) Form M

M型經由在室溫下振盪在DMSO/水(v/v,1:1)中之E型獲得。圖56中之XRPD結果展示M型具有高結晶度。圖57中之TGA及DSC結果展示200℃之前10.7%之相當大的重量損失及110.7℃(起始溫度)之尖銳吸熱峰。藉由1 H NMR圖58,偵測到相對於化合物I(a) 0.90當量之DMSO (10.4%),與TGA重量損失一致。此外,M型在氮氣保護下加熱至115℃,冷卻至30℃且接著暴露於空氣之後轉化為非晶。因此,咸信M型係DMSO溶劑合物。The M form was obtained by shaking the E form in DMSO/water (v/v, 1:1) at room temperature. The XRPD results in Figure 56 show that the M-type has high crystallinity. The TGA and DSC results in Figure 57 show a considerable weight loss of 10.7% before 200°C and a sharp endothermic peak of 110.7°C (initial temperature). From 1 H NMR chart 58, 0.90 equivalents of DMSO (10.4%) relative to compound I(a) was detected, which was consistent with the TGA weight loss. In addition, the M type was heated to 115°C under the protection of nitrogen, cooled to 30°C, and then transformed into amorphous after being exposed to air. Therefore, Xianxin M-type DMSO solvate.

實例2-U:化合物I(a) E型由非晶起始物質按比例增長Example 2-U: Compound I(a) Form E grows proportionally from amorphous starting material

化合物I(a) E型由非晶化合物I(a)經由在室溫下在DCM/正庚烷中有晶種下反溶劑結晶來製備。將66.6 g非晶形化合物I(a)添加1 L反應器中。在室溫下在攪拌下將220 mL DCM添加至反應器中以獲得澄清溶液。添加125 mL正庚烷,之後添加約5 mg 化合物I(a) E型晶種。緩慢溶解晶種。再依序添加5 mL正庚烷、2.6 g 化合物I(a) E型晶種。大多數晶種溶解且在攪拌期間在反應器壁上觀察到僅有限的針狀晶體。經4小時用注射泵添加530 mL正庚烷。在再添加20 mL正庚烷之後觀察到混濁。在老化隔夜之後,結晶之固體藉由過濾收集且用正庚烷洗滌。在50℃下在真空下烘箱乾燥濾餅隔夜。收集62.6 g固體,產率係約93.4%。Compound I(a) Form E was prepared from amorphous compound I(a) via anti-solvent crystallization at room temperature in DCM/n-heptane with seed crystals. 66.6 g of amorphous compound I(a) was added to the 1 L reactor. 220 mL of DCM was added to the reactor with stirring at room temperature to obtain a clear solution. 125 mL of n-heptane was added, followed by about 5 mg of Compound I(a) Form E seed crystals. Slowly dissolve the seed crystal. Then, 5 mL of n-heptane and 2.6 g of Compound I(a) E type seed crystals were added sequentially. Most seed crystals dissolved and only limited needle-like crystals were observed on the reactor wall during stirring. 530 mL of n-heptane was added with a syringe pump over 4 hours. After an additional 20 mL of n-heptane was added, turbidity was observed. After aging overnight, the crystalline solid was collected by filtration and washed with n-heptane. The filter cake was oven dried at 50°C under vacuum overnight. 62.6 g of solid was collected with a yield of about 93.4%.

觀察到長針狀晶體。在攪拌期間大多數晶種溶解,然而,仍獲得E型產物之良好品質屬性。因此,在DCM/正庚烷中之反溶劑結晶方法在有限的晶種下係商業上實用的。圖64中所示之XRPD結果展示E型由反溶劑結晶獲得。根據圖65中所展示之TGA及DSC資料,在TGA中觀察到高達145℃時1.2%之重量損失,且DSC結果展示147.3℃ (起始溫度)之尖銳熔融吸熱峰。產物藉由XRPD、TGA、DSC、PLM、HPLC及GC表徵,結果概述於下表中。

Figure 108105242-A0304-0034
*:此時2.6 g晶種之大多數溶解,且在22:15之DCM/正庚烷之溶劑比率下觀察到顯而易見的混濁。 **:起始物質之HPLC純度係99.18面積%。Long needle crystals were observed. During the stirring most of the seeds dissolve, however, good quality attributes of the E-type product are still obtained. Therefore, the antisolvent crystallization method in DCM/n-heptane is commercially practical under limited seed crystals. The XRPD results shown in Figure 64 show that Form E was obtained by antisolvent crystallization. According to the TGA and DSC data shown in FIG. 65, a 1.2% weight loss at 145°C was observed in the TGA, and the DSC results showed a sharp melting endothermic peak of 147.3°C (initial temperature). The product was characterized by XRPD, TGA, DSC, PLM, HPLC and GC. The results are summarized in the table below.
Figure 108105242-A0304-0034
*: Most of the 2.6 g seed crystals were dissolved at this time, and a clear turbidity was observed at a solvent ratio of DCM/n-heptane of 22:15. **: The HPLC purity of the starting material is 99.18 area%.

實例2-V:無水物化合物I(a)龍膽酸共晶體A型Example 2-V: Anhydrous compound I(a) gentisic acid co-crystal type A

將化合物I(a)游離鹼(300.1 mg)及龍膽酸(76.1 mg)組合於20 mL玻璃小瓶中且接著添加6.0 mL EtOAc以形成澄清溶液。向小瓶中依序添加8.0 mL正庚烷、約50 mg 化合物I(a)龍膽酸共晶體A型晶種,且觀察到混濁溶液。將5.0 mL正庚烷添加至小瓶中且在室溫下攪拌2小時之後觀察到懸浮液。使懸浮液冷卻至5℃且攪拌17小時以誘導額外結晶。過濾懸浮液且在室溫下真空乾燥收集之晶體4小時,得到66.5%之產率。XRPD結果示於圖66中。特徵峰在如下角度之2θ度處:12.5°±0.2°、13.0°±0.2°、14.4°±0.2°、15.7°±0.2°、17.5°±0.2°、21.7°±0.2°、25.5°±0.2°及26.3°±0.2°。如圖67及圖70中所示,在TGA中觀察到高達110℃時2.5%之重量損失,且DSC結果展示一個吸熱峰在170.8℃(起始溫度)。化學計量比率測定為1.00 (酸/游離鹼)且由1H NMR未偵測到明顯溶劑信號,如圖68中所示。根據收集之特徵資料,咸信龍膽酸共晶體A型係無水物。Compound I(a) free base (300.1 mg) and gentisic acid (76.1 mg) were combined in a 20 mL glass vial and then 6.0 mL of EtOAc was added to form a clear solution. To the vial, 8.0 mL of n-heptane, about 50 mg of Compound I(a) gentisic acid co-crystal type A seed crystals were sequentially added, and a cloudy solution was observed. 5.0 mL of n-heptane was added to the vial and the suspension was observed after stirring at room temperature for 2 hours. The suspension was cooled to 5°C and stirred for 17 hours to induce additional crystallization. The suspension was filtered and the collected crystals were dried under vacuum at room temperature for 4 hours to obtain a yield of 66.5%. The XRPD results are shown in Figure 66. The characteristic peak is at 2θ degrees of the following angles: 12.5°±0.2°, 13.0°±0.2°, 14.4°±0.2°, 15.7°±0.2°, 17.5°±0.2°, 21.7°±0.2°, 25.5°±0.2 ° and 26.3°±0.2°. As shown in FIGS. 67 and 70, a weight loss of 2.5% at 110°C was observed in TGA, and the DSC results showed an endothermic peak at 170.8°C (initial temperature). The stoichiometric ratio was determined to be 1.00 (acid/free base) and no significant solvent signal was detected by 1H NMR, as shown in Figure 68. According to the collected characteristic data, Xianxin gentisic acid eutectic type A is anhydrous.

在37℃下使用化合物I(a)游離鹼E型作為對照量測水及三種生物相關介質(SGF、FaSSIF及FeSSIF)中龍膽酸共晶體A型之動力學溶解度。所有溶解度樣品(初始固體負載量係約10 mg/mL)在37℃下在滾轉恆溫箱上保持以25 rpm之速度滾轉,且分別在1、2、4及24小時取樣。在離心之後,收集上清液以用於HPLC及pH測試,且收集潤濕濾餅以用於XRPD特徵。與游離鹼E型相比,龍膽酸共晶體A型展示在FaSSIF/FeSSIF中之溶解度增加(兩倍)且在SGF/水中之溶解度相當。此外,在龍膽酸共晶體A型或游離鹼E型懸浮於水及三種生物介質(SGF/FaSSIF/FeSSIF)中24小時之後未觀察到型式變化。The kinetic solubility of gentisic acid co-crystal type A in water and three biological related media (SGF, FaSSIF and FeSSIF) was measured at 37°C using Compound I (a) free base type E as a control. All solubility samples (the initial solid loading was about 10 mg/mL) were kept rolling at 25 rpm on a rolling incubator at 37°C, and samples were taken at 1, 2, 4, and 24 hours, respectively. After centrifugation, the supernatant was collected for HPLC and pH testing, and the wet filter cake was collected for XRPD characterization. Compared with the free base form E, gentisic acid co-crystal form A exhibited increased solubility (two-fold) in FaSSIF/FeSSIF and comparable solubility in SGF/water. In addition, no type change was observed after 24 hours of gentisic acid co-crystal type A or free base type E suspended in water and three biological media (SGF/FaSSIF/FeSSIF).

在80℃(密閉)/24小時、25℃/60% RH/6天及40℃/75% RH/6天下在化合物I(a)游離鹼E型作為對照下評估龍膽酸共晶體A型之固態穩定性。穩定性樣品藉由檢查任何固體型式變化之XRPD及檢查純度變化之HPLC表徵。在根據XRPD及HPLC結果進行穩定性測試之後未觀察到固體型式變化或明顯的HPLC純度降低,指示龍膽酸共晶體A型及游離鹼E型在測試條件下係物理與化學穩定的。Evaluation of gentisic acid co-crystal form A at 80°C (sealed)/24 hours, 25°C/60% RH/6 days and 40°C/75% RH/6 days under compound I(a) free base E form as a control Solid state stability. Stability samples are characterized by XRPD checking any solid type changes and HPLC checking purity changes. After performing stability tests based on XRPD and HPLC results, no solid type change or significant HPLC purity reduction was observed, indicating that gentisic acid co-crystal type A and free base type E were physically and chemically stable under the test conditions.

為研究隨濕度而變之固體型式穩定性,在25℃下收集DVS等溫圖資料,展示化合物I(a)龍膽酸共晶體A型及化合物I(a)游離鹼E型略具吸濕性且在DVS測試之後無固體型式變化。In order to study the stability of the solid type that changes with humidity, the DVS isotherm data was collected at 25°C to show that compound I(a) gentisic acid co-crystal type A and compound I(a) free base type E were slightly hygroscopic Performance and no solid type change after DVS test.

為評估其機械力穩定性,在磁力攪拌下且在將化合物I(a)游離鹼E型作為對照下,使化合物I(a)龍膽酸共晶體A型懸浮於H2 O及正庚烷中。在室溫下在游離鹼E型於H2 O中磁力攪拌6天之後藉由XRPD測試觀察到非晶固體,然而對於以下中之各者仍觀察到結晶樣品:(i)於正庚烷中磁力攪拌6天之游離鹼E型;(ii)於正庚烷中磁力攪拌之化合物I(a)龍膽酸共晶體A型;及(iii)於H2 O中磁力攪拌6天之化合物I(a)龍膽酸共晶體A型。因而,龍膽酸共晶體A型展示於H2 O中之機械力穩定性比游離鹼E型更佳。In order to evaluate its mechanical stability, compound I(a) gentisic acid co-crystal type A was suspended in H 2 O and n-heptane under magnetic stirring and using compound I(a) free base type E as a control in. After magnetic stirring at room temperature in free base form E in H 2 O for 6 days, an amorphous solid was observed by XRPD test, however, crystalline samples were still observed for each of the following: (i) in n-heptane Free base form E with magnetic stirring for 6 days; (ii) Compound I with magnetic stirring in n-heptane (a) Form A of gentisic acid co-crystal; and (iii) Compound I with magnetic stirring in H 2 O for 6 days (a) Gentianic acid co-crystal type A. Therefore, the mechanical stability of the gentisic acid eutectic type A exhibited in H 2 O is better than that of the free base type E.

實例2-W:無水物化合物I(a)龍膽酸共晶體B型Example 2-W: Anhydrous compound I(a) gentisic acid co-crystal B type

無水物化合物I(a)龍膽酸共晶體B型可藉由與製備化合物I(a)龍膽酸共晶體A型之方法類似之方法製備,但其中EtOAc經THF置換。XRPD結果示於圖69中。以2θ度計之特徵峰資料以如下角度展示:6.6°±0.2°、7.9°±0.2°、12.2°±0.2°、12.4°±0.2°、14.0°±0.2°、15.1°±0.2°、16.3°±0.2°、21.1°±0.2°、25.3°±0.2°及25.6°±0.2°。B型之TGA/DSC資料示於圖72中。在TGA中觀察到高達160℃時8.6%之重量損失,且DSC結果展示多個熔融/分解之前的熱事件。化學計量測定為0.95 (酸/游離鹼)且如圖73中所示由1H NMR偵測到6.6% THF (與游離鹼之莫耳比係0.60),表明B型可能係THF溶劑合物。Anhydrous compound I(a) gentisic acid co-crystal form B can be prepared by a method similar to the method of preparing compound I(a) gentisic acid co-crystal form A, but in which EtOAc is replaced with THF. The XRPD results are shown in Figure 69. The characteristic peak data in 2θ degrees is displayed at the following angles: 6.6°±0.2°, 7.9°±0.2°, 12.2°±0.2°, 12.4°±0.2°, 14.0°±0.2°, 15.1°±0.2°, 16.3 °±0.2°, 21.1°±0.2°, 25.3°±0.2° and 25.6°±0.2°. The TGA/DSC data for Type B is shown in Figure 72. A weight loss of 8.6% at 160°C was observed in TGA, and DSC results showed multiple thermal events before melting/decomposition. The stoichiometric determination was 0.95 (acid/free base) and 6.6% THF was detected by 1H NMR as shown in FIG. 73 (the molar ratio to the free base was 0.60), indicating that type B may be a THF solvate.

實例2-X:水合物化合物I(a)吡啶甲醯胺共晶體A型Example 2-X: Hydrate Compound I(a) Pyridinamide Co-crystal Form A

化合物I(a)游離鹼(200.9 mg)及吡啶甲醯胺(40.3 mg)組合於20 mL玻璃小瓶中,且接著添加2.0 mL EtOAc以形成澄清溶液。向小瓶中依序添加8.0 mL正庚烷、約10 mg 化合物I(a)吡啶甲醯胺共晶體A型晶種,且觀察到混濁溶液。將10.0 mL正庚烷添加至小瓶中且在室溫下攪拌28小時之後觀察到懸浮液。在室溫下在攪拌下經快速蒸發17小時以誘導進一步結晶。過濾懸浮液且在室溫下真空乾燥收集之晶體6小時。XRPD結果示於圖74及圖78中。如圖75及圖79中所示,在TGA中觀察到高達65℃時3.5%之重量損失且DSC結果展示64.6℃(起始溫度)之寬吸熱峰。化學計量測定為1.19 (酸/游離鹼)且由1H NMR未偵測到明顯溶劑信號,如圖76及圖80中所示。如圖77中所示,樣品在加熱至75℃之後變成非晶的。根據收集之特徵資料,咸信吡啶甲醯胺共晶體A型係水合物,伴隨降解及熔融存在水之損失。Compound I(a) free base (200.9 mg) and pyridylformamide (40.3 mg) were combined in a 20 mL glass vial, and then 2.0 mL of EtOAc was added to form a clear solution. To the vial, 8.0 mL of n-heptane, about 10 mg of Compound I (a) pyridylcarboxamide co-crystal type A seed crystals were sequentially added, and a turbid solution was observed. 10.0 mL of n-heptane was added to the vial and the suspension was observed after stirring at room temperature for 28 hours. Rapid evaporation at room temperature with stirring for 17 hours to induce further crystallization. The suspension was filtered and the collected crystals were dried under vacuum at room temperature for 6 hours. The XRPD results are shown in Figure 74 and Figure 78. As shown in FIGS. 75 and 79, a weight loss of 3.5% at 65°C was observed in TGA and DSC results showed a wide endothermic peak of 64.6°C (initial temperature). The stoichiometric determination was 1.19 (acid/free base) and no significant solvent signal was detected by 1H NMR, as shown in Figure 76 and Figure 80. As shown in Fig. 77, the sample became amorphous after being heated to 75°C. According to the collected characteristic data, Xianxin pyridinecarboxamide co-crystal type A hydrate, with the loss of water due to degradation and melting.

實例2-Y:製備結晶化合物I(a)游離鹼無水物AL型Example 2-Y: Preparation of crystalline compound I(a) free base anhydrous AL form

AL型結晶化合物I(a)游離鹼無水物經由在50℃下E型在EtOAc/正庚烷(v/v,1:3)中打漿五天獲得。XRPD圖案示於圖81中,且TGA/DSC曲線示於圖82中。AL型展現如下角度處之2θ度之特徵峰:7.6°±0.2°、8.4°±0.2°、13.2°±0.2°、13.8°±0.2°、14.8°±0.2°、15.2°±0.2°、15.6°±0.2°、15.9°±0.2°、16.9°±0.2°、18.1°±0.2°、20.5°±0.2°及21.3°±0.2°。結果指示AL型係在TGA中150℃之前的重量損失係1.1%且在DSC (具有密閉封蓋)中兩個吸熱峰在93.3及147.5℃ (開始)的結晶。當DSC測試在封蓋敞開下執行時,大約93.3℃之吸熱峰消失,表明第一吸熱峰不可由強烈鍵結之水/溶劑所產生。如圖83中之1 H NMR光譜中所示,未偵測到EtOAc/正庚烷信號。因此,基於一種可能的理論,咸信圖82中觀察到之第一吸熱峰可由表面水產生。The crystalline compound I (a) of the AL type free base anhydrous was obtained by beating the E form in EtOAc/n-heptane (v/v, 1:3) at 50°C for five days. The XRPD pattern is shown in FIG. 81, and the TGA/DSC curve is shown in FIG. 82. The AL type exhibits characteristic peaks of 2θ degrees at the following angles: 7.6°±0.2°, 8.4°±0.2°, 13.2°±0.2°, 13.8°±0.2°, 14.8°±0.2°, 15.2°±0.2°, 15.6 °±0.2°, 15.9°±0.2°, 16.9°±0.2°, 18.1°±0.2°, 20.5°±0.2° and 21.3°±0.2°. The results indicated that the AL type system had a weight loss of 1.1% before 150°C in TGA and two endothermic peaks crystallized at 93.3 and 147.5°C (beginning) in DSC (with closed cap). When the DSC test is performed with the lid open, the endothermic peak at about 93.3°C disappears, indicating that the first endothermic peak cannot be generated by strongly bonded water/solvent. As shown in the 1 H NMR spectrum in Figure 83, no EtOAc/n-heptane signal was detected. Therefore, based on a possible theory, the first endothermic peak observed in Xianxin 82 can be produced by surface water.

AL型在暴露於環境條件(23±2℃,70% RH)三天之後轉換為無水物E型,指示在室溫(23±2℃)下無水物E型比AL型更具熱力學穩定性。此結果可闡明以下事實,當將AL型樣品在氮氣層下加熱至120℃且冷卻至30℃且接著暴露於空氣時,觀察到無水物E型。Type AL is converted to anhydrous type E after three days of exposure to environmental conditions (23±2℃, 70% RH), indicating that anhydrous type E is more thermodynamically stable at room temperature (23±2℃) than type AL . This result may clarify the fact that when a sample of type AL was heated to 120°C and cooled to 30°C under a nitrogen blanket and then exposed to air, an anhydrous type E was observed.

實例2-Z:製備結晶化合物I(a)游離鹼水合物BO型Example 2-Z: Preparation of crystalline compound I(a) free base hydrate BO type

化合物I(a) E型晶體在60℃下在MeOH/H2 O (v/v,1:1)中打漿以形成澄清溶液。在兩天之後觀察到固體材料。根據XRPD比較,獲得之潤濕固體材料係新穎結晶型式,指定為BN型。在環境條件下風乾固體BN型約1.5小時之後獲得BO型。其XRPD圖案示於圖84中。以2θ度表現之特徵峰在如下角度處:12.1°±0.2°、12.4°±0.2°、13.9°±0.2°、15.0°±0.2°、15.4°±0.2°、17.1°±0.2°、18.3°±0.2°、21.5°±0.2°、22.1°±0.2°、24.4°±0.2°、25.1°±0.2°、26.2°±0.2°及26.3°±0.2°。BO型之DSC曲線示於圖85中。結果指示BO型係結晶,一個交疊吸熱峰在84.2℃ (開始),且一個放熱峰在128.5℃ (開始),之後一個尖銳吸熱峰在148.3℃(峰值)。因為非晶材料在將BO型加熱至120℃之後獲得且由圖86中所示之1 H NMR未偵測到MeOH信號,咸信BO型係水合物。Compound I(a) E-type crystals were slurried in MeOH/H 2 O (v/v, 1:1) at 60° C. to form a clear solution. Solid material was observed after two days. According to XRPD comparison, the obtained wet solid material is a novel crystal type, designated as BN type. The BO type was obtained after air-drying the solid BN type at ambient conditions for about 1.5 hours. The XRPD pattern is shown in FIG. 84. The characteristic peaks expressed in 2θ degrees are at the following angles: 12.1°±0.2°, 12.4°±0.2°, 13.9°±0.2°, 15.0°±0.2°, 15.4°±0.2°, 17.1°±0.2°, 18.3° ±0.2°, 21.5°±0.2°, 22.1°±0.2°, 24.4°±0.2°, 25.1°±0.2°, 26.2°±0.2° and 26.3°±0.2°. The DSC curve of the BO model is shown in FIG. 85. The results indicated that the BO-type system crystallized, an overlapping endothermic peak at 84.2°C (start), and an exothermic peak at 128.5°C (start), and then a sharp endothermic peak at 148.3°C (peak). Since the amorphous material is obtained after heating the BO type to 120°C and the MeOH signal is not detected by the 1 H NMR shown in FIG. 86, Xianxin BO type hydrates.

實例2-AA:製備結晶化合物I(a)游離鹼正庚烷溶劑合物BP型Example 2-AA: Preparation of crystalline Compound I(a) free base n-heptane solvate BP type

化合物I(a) E型晶體分別在70℃下於乙酸異丙酯/正庚烷中及在90℃下於乙酸異丁酯/正庚烷中打漿。所得固體材料藉由XRPD及TGA/DSC表徵且指定為BP型,結果示於圖87及圖88中。以2θ度表現之特徵峰在如下角度處:8.5°±0.2°、12.9°±0.2°、17.6°±0.2°、18.1°±0.2°、19.4°±0.2°、20.8°±0.2°、21.2°±0.2°、22.9°±0.2°及24.0°±0.2°。BP型係在TGA中高達140℃時重量損失係3.0%且在DSC中在147.3℃(峰值)之尖銳熔融/分解信號之前微小吸熱峰在122.5℃的結晶。在BP型樣品在氮氣層下加熱至130℃且冷卻至30℃且暴露於空氣之後觀察到無水物E型。如圖89中之1 H NMR光譜所示,正庚烷:API之化學計量比率係0.16:1 (2.6 wt%)。與加熱之後的型式變化組合,咸信BP型係正庚烷溶劑合物。Compound I (a) E-type crystals were slurried in isopropyl acetate/n-heptane at 70°C and isobutyl acetate/n-heptane at 90°C, respectively. The obtained solid material was characterized by XRPD and TGA/DSC and designated as BP type, and the results are shown in FIG. 87 and FIG. 88. The characteristic peaks expressed in 2θ degrees are at the following angles: 8.5°±0.2°, 12.9°±0.2°, 17.6°±0.2°, 18.1°±0.2°, 19.4°±0.2°, 20.8°±0.2°, 21.2° ±0.2°, 22.9°±0.2° and 24.0°±0.2°. The BP type crystallizes at a weight loss of 3.0% in TGA up to 140°C and in DSC before a sharp melting/decomposition signal at 147.3°C (peak) at 122.5°C. Anhydrous E type was observed after the BP type sample was heated to 130°C under a nitrogen blanket and cooled to 30°C and exposed to air. As shown in the 1 H NMR spectrum in FIG. 89, the stoichiometric ratio of n-heptane:API is 0.16:1 (2.6 wt%). Combined with the type change after heating, Xianxin BP type is n-heptane solvate.

實例2-AB:製備結晶化合物I(a)游離鹼2-戊醇溶劑合物BK型Example 2-AB: Preparation of crystalline compound I(a) free base 2-pentanol solvate form BK

化合物I(a) E型晶體在50℃下在2-戊醇/正庚烷(v/v,2:1)中打漿。所得固體材料藉由XRPD及TGA/DSC表徵且指定為BK型,結果示於圖90及圖91中。以2θ度表現之特徵峰在如下角度處:11.9°±0.2°、13.0°±0.2°、14.4°±0.2°、14.7°±0.2°、16.9°±0.2°、17.9°±0.2°、19.3°±0.2°、21.8°±0.2°、22.7°±0.2°、23.9°±0.2°、24.6°±0.2°及26.1°±0.2°。結果指示BK型係在TGA中在120℃之前重量損失係11.6%且在DSC中一個尖銳熔融吸熱峰在71.5℃ (峰值)的結晶。為進一步鑑別BK型,加熱實驗在89℃下進行且結果指示在加熱之後BK型轉換為非晶型式。另外,在樣品中藉由圖92中所示之1 H NMR偵測到大約0.92莫耳當量之2-戊醇(15.5 wt%)。與加熱之後的型式變化組合,咸信BK型係2-戊醇溶劑合物。Compound I (a) E-type crystals were beaten in 2-pentanol/n-heptane (v/v, 2:1) at 50°C. The obtained solid material was characterized by XRPD and TGA/DSC and designated as type BK. The results are shown in FIG. 90 and FIG. 91. The characteristic peaks expressed in 2θ degrees are at the following angles: 11.9°±0.2°, 13.0°±0.2°, 14.4°±0.2°, 14.7°±0.2°, 16.9°±0.2°, 17.9°±0.2°, 19.3° ±0.2°, 21.8°±0.2°, 22.7°±0.2°, 23.9°±0.2°, 24.6°±0.2° and 26.1°±0.2°. The results indicated that the BK type system was 11.6% by weight loss in TGA before 120°C and a sharp melting endothermic peak crystallized at 71.5°C (peak) in DSC. To further identify the BK type, the heating experiment was conducted at 89°C and the results indicated that the BK type was converted to the amorphous type after heating. In addition, about 0.92 mole equivalent of 2-pentanol (15.5 wt%) was detected by 1 H NMR shown in FIG. 92 in the sample. Combined with the type change after heating, Xianxin BK type 2-pentanol solvate.

實例2-AC:製備結晶化合物I(a)游離鹼1-丙醇溶劑合物AX型Example 2-AC: Preparation of crystalline Compound I(a) free base 1-propanol solvate form AX

AX型經由在室溫下快速蒸發於1-丙醇/乙酸異丙酯(v/v,5:4)中之化合物I(a)獲得。所得固體材料藉由XRPD及TGA/DSC表徵且指定為AX型,結果示於圖93及圖94中。以2θ度表現之特徵峰在如下角度處:11.5°±0.2°、12.9°±0.2°、13.1°±0.2°、17.4°±0.2°、18.2°±0.2°、23.1°±0.2°、23.9°±0.2°及25.9°±0.2°。結果指示AX型係在TGA中在150℃之前重量損失係11.0%且在DSC中在分解之前吸熱峰在113.5℃及122.0℃ (峰值)的結晶。為進一步鑑別AX型,在118℃下進行加熱實驗且結果指示在加熱之後AX型轉換為非晶型式。另外,在樣品中藉由圖95中所示之1 H NMR偵測到約0.94莫耳當量之1-戊醇(11.3 wt%)。與加熱實驗結果組合,咸信AX型係1-丙醇溶劑合物。Form AX was obtained by rapid evaporation of compound I(a) in 1-propanol/isopropyl acetate (v/v, 5:4) at room temperature. The obtained solid material was characterized by XRPD and TGA/DSC and designated as AX type, and the results are shown in FIG. 93 and FIG. 94. The characteristic peaks expressed in 2θ degrees are at the following angles: 11.5°±0.2°, 12.9°±0.2°, 13.1°±0.2°, 17.4°±0.2°, 18.2°±0.2°, 23.1°±0.2°, 23.9° ±0.2° and 25.9°±0.2°. The results indicate that the AX type system crystallized in the TGA before 150°C with a weight loss of 11.0% and the endothermic peaks before decomposition in DSC at 113.5°C and 122.0°C (peak value). To further identify the AX type, a heating experiment was performed at 118°C and the results indicated that the AX type was converted to an amorphous type after heating. In addition, about 0.94 mole equivalent of 1-pentanol (11.3 wt%) was detected by 1 H NMR shown in FIG. 95 in the sample. Combined with heating experiment results, Xianxin AX type 1-propanol solvate.

實例2-AD:製備結晶化合物I(a)游離鹼間二甲苯溶劑合物Q型Example 2-AD: Preparation of crystalline Compound I (a) free base m-xylene solvate Form Q

Q型經由在室溫下快速蒸發於乙酸甲酯/間二甲苯(v/v,5:4)中之化合物I(a)獲得。所得固體材料藉由XRPD及TGA/DSC表徵且指定為Q型,結果示於圖96及圖97中。以2θ度表現之特徵峰示於如下角度處:5.5°±0.2°、12.5°±0.2°、15.0°±0.2°、17.6°±0.2°、20.2°±0.2°、22.1°±0.2°、22.8°±0.2°及26.6°±0.2°。結果指示Q型係在TGA中在200℃之前二步重量損失係13.7%且在DSC中在分解之前一個吸熱峰在78.8℃(峰值)的結晶。為進一步鑑別Q型,在80℃下進行加熱實驗且結果指示在加熱之後Q型轉換為非晶型式。另外,在樣品中藉由圖98中所示之1 H NMR偵測到約0.73莫耳當量之間二甲苯(14.9 wt%)。與加熱實驗結果組合,咸信Q型係間二甲苯溶劑合物。Form Q was obtained by rapid evaporation of compound I(a) in methyl acetate/m-xylene (v/v, 5:4) at room temperature. The obtained solid material was characterized by XRPD and TGA/DSC and designated as type Q, and the results are shown in FIG. 96 and FIG. 97. The characteristic peaks expressed in 2θ degrees are shown at the following angles: 5.5°±0.2°, 12.5°±0.2°, 15.0°±0.2°, 17.6°±0.2°, 20.2°±0.2°, 22.1°±0.2°, 22.8 °±0.2° and 26.6°±0.2°. The results indicate that the Q-type system crystallizes in a two-step weight loss system of 13.7% before 200°C in TGA and an endothermic peak at 78.8°C (peak) before decomposition in DSC. To further identify the Q-type, a heating experiment was conducted at 80°C and the results indicated that the Q-type was converted to an amorphous type after heating. In addition, about 0.73 mole equivalent of xylene (14.9 wt%) was detected in the sample by 1 H NMR shown in FIG. 98. Combined with heating experiment results, Xianxin Q-type xylene solvate.

實例2-AE:製備結晶化合物I(a)游離鹼EGME溶劑合物P型Example 2-AE: Preparation of crystalline compound I(a) free base EGME solvate form P

P型經由在室溫下快速蒸發於EGME/間二甲苯(v/v,1:1)中之化合物I(a)獲得。所得固體材料藉由XRPD及TGA/DSC表徵且指定為P型,結果示於圖99及圖100中。以2θ度表現之特徵峰示於如下角度處:11.9°±0.2°、12.3°±0.2°、12.7°±0.2°、14.0°±0.2°、17.1°±0.2°、20.0°±0.2°、23.9°±0.2°、24.1°±0.2°、25.5°±0.2°、25.8°±0.2°及27.2°±0.2°。結果指示P型係在TGA中在150℃之前重量損失係13.8%且在DSC中在分解之前兩個吸熱峰在104.7及142.0℃ (峰值)的結晶。為進一步鑑別P型,在105℃下進行加熱實驗且結果指示在加熱之後P型轉換為非晶型式。另外,在樣品中藉由圖101中所示之1 H NMR偵測到約1.03莫耳當量之EGME (15.1 wt%)。與加熱實驗結果組合,咸信P型係EGME溶劑合物。Form P was obtained by rapid evaporation of compound I(a) in EGME/m-xylene (v/v, 1:1) at room temperature. The obtained solid material was characterized by XRPD and TGA/DSC and designated as P-type, and the results are shown in FIG. 99 and FIG. 100. The characteristic peaks expressed in 2θ degrees are shown at the following angles: 11.9°±0.2°, 12.3°±0.2°, 12.7°±0.2°, 14.0°±0.2°, 17.1°±0.2°, 20.0°±0.2°, 23.9 °±0.2°, 24.1°±0.2°, 25.5°±0.2°, 25.8°±0.2° and 27.2°±0.2°. The results indicate that the P-type system crystallizes in the TGA before 150°C with a weight loss of 13.8% and in DSC before decomposition in the two endothermic peaks at 104.7 and 142.0°C (peak). To further identify the P-type, a heating experiment was conducted at 105°C and the results indicated that the P-type was converted to an amorphous form after heating. In addition, about 1.03 mole equivalent of EGME (15.1 wt%) was detected by 1 H NMR shown in FIG. 101 in the sample. Combined with heating experiment results, Xianxin P-type EGME solvate.

實例2-AF:製備結晶化合物I(a)游離鹼第二丁醇溶劑合物AQ型Example 2-AF: Preparation of crystalline compound I(a) free base second butanol solvate form AQ

AQ型經由在室溫下快速蒸發於第二丁醇/MTBE(v/v,5:4)中之化合物I(a)獲得。所得固體材料藉由XRPD及TGA/DSC表徵且指定為AQ型,結果示於圖102及圖103中。以2θ度表現之特徵峰示於如下角度處:11.5°±0.2°、12.7°±0.2°、12.9°±0.2°、14.1°±0.2°、17.4°±0.2°、17.9°±0.2°、21.9°±0.2°、22.7°±0.2°、23.1°±0.2°、23.5°±0.2°、23.9°±0.2°、25.5°±0.2°及27.6°±0.2°。結果指示AQ型係在TGA中在120℃之前重量損失係16.3%且在分解之前兩個吸熱峰在99.7℃及110.8℃(峰值)的結晶。為進一步鑑別AQ型,在108℃下進行加熱實驗且結果指示在加熱之後AQ型轉換為非晶型式。另外,在樣品中藉由圖104中所示之1 H NMR偵測到約0.92莫耳當量之第二丁醇(13.1 wt%)。與加熱實驗結果組合,咸信AQ型係第二丁醇溶劑合物。Form AQ was obtained by rapid evaporation of compound I(a) in second butanol/MTBE (v/v, 5:4) at room temperature. The obtained solid material was characterized by XRPD and TGA/DSC and designated as AQ type, and the results are shown in FIG. 102 and FIG. 103. The characteristic peaks expressed in 2θ degrees are shown at the following angles: 11.5°±0.2°, 12.7°±0.2°, 12.9°±0.2°, 14.1°±0.2°, 17.4°±0.2°, 17.9°±0.2°, 21.9 °±0.2°, 22.7°±0.2°, 23.1°±0.2°, 23.5°±0.2°, 23.9°±0.2°, 25.5°±0.2° and 27.6°±0.2°. The results indicate that the AQ type system crystallizes in the TGA at a weight loss of 16.3% before 120°C and two endothermic peaks at 99.7°C and 110.8°C (peak) before decomposition. To further identify the AQ type, a heating experiment was conducted at 108°C and the results indicated that the AQ type was converted to an amorphous type after heating. In addition, about 0.92 mole equivalent of second butanol (13.1 wt%) was detected by 1 H NMR shown in FIG. 104 in the sample. Combined with heating experiment results, Xianxin AQ type is the second butanol solvate.

此書面說明書使用實例來揭示本發明,包括最佳模式,且亦使得任何熟習此項技術者能夠實踐本發明,包括製造且使用任何裝置或系統且執行任何所併入之方法。本發明之可獲專利範疇係藉由申請專利範圍所界定,且可包括熟習此項技術者所想到之其他實例。若此等其他實例具有並非不同於申請專利範圍字面語言之結構要素,或若該等其他實例包括與申請專利範圍字面語言無實質差異之等效結構要素,則該等實例意欲在申請專利範圍之範疇內。This written description uses examples to disclose the invention, including the best mode, and also to enable any person skilled in the art to practice the invention, including making and using any devices or systems and performing any incorporated methods. The patentable scope of the present invention is defined by the scope of the patent application, and may include other examples conceived by those skilled in the art. If these other examples have structural elements that are not different from the literal language of the patent scope, or if they include equivalent structural elements that are not materially different from the literal language of the patent scope, the examples are intended to be within the scope of the patent application Within the category.

圖1展示一種製備TRP拮抗劑化合物(I)之本發明方法。Fig. 1 shows a method of the present invention for preparing a TRP antagonist compound (I).

圖2展示一種製備中間化合物1之本發明方法及一種製備中間化合物8之本發明方法。Figure 2 shows a method of the invention for preparing intermediate compound 1 and a method of the invention for preparing intermediate compound 8.

圖3展示一種製備與圖1之化合物4對應之中間化合物4(a)之本發明方法,其中R3 係-CH3 ,R4 係F且PG係第三丁氧基羰基(BOC)。3 shows a method of the present invention for preparing intermediate compound 4(a) corresponding to compound 4 of FIG. 1, wherein R 3 is -CH 3 , R 4 is F and PG is the third butoxycarbonyl (BOC).

圖4展示製備非晶(2S ,4R ,5S )-4-氟-1-((4-氟苯基)磺醯基)-5-甲基-N -((5-(三氟甲基)-2-(2-(三氟甲基)嘧啶-5-基)吡啶-4-基)甲基)吡咯啶-2-甲醯胺(化合物I(a))之先前技術方法。Figure 4 shows the preparation of amorphous (2 S ,4 R ,5 S )-4-fluoro-1-((4-fluorophenyl)sulfonyl)-5-methyl- N -((5-(trifluoro Prior art method of methyl)-2-(2-(trifluoromethyl)pyrimidin-5-yl)pyridin-4-yl)methyl)pyrrolidin-2-carboxamide (compound I(a)).

圖5展示化合物I(a)之結晶型式之間的互相轉化關係。Figure 5 shows the interconversion relationship between the crystal forms of compound I(a).

圖6展示結晶化合物I(a) A型之XRPD圖案。Figure 6 shows the XRPD pattern of crystalline Compound I(a) Type A.

圖7展示結晶化合物I(a) A型之TGA及DSC曲線。Figure 7 shows the TGA and DSC curves of crystalline Compound I(a) Form A.

圖8展示結晶化合物I(a) A型之1 H NMR光譜。Fig. 8 shows the 1 H NMR spectrum of the crystalline compound I(a) Form A.

圖9展示結晶化合物I(a) A型之DVS曲線。Figure 9 shows the DVS curve of crystalline Compound I(a) Form A.

圖10展示結晶化合物I(a) E型之XRPD圖案。Fig. 10 shows the XRPD pattern of the crystalline compound I(a) E type.

圖11展示結晶化合物I(a) E型之TGA及DSC曲線。Fig. 11 shows the TGA and DSC curves of the crystalline compound I(a) E form.

圖12展示結晶化合物I(a) E型之1 H NMR光譜。Figure 12 shows the 1 H NMR spectrum of the crystalline compound I(a) Form E.

圖13展示結晶化合物I(a) E型之DVS曲線。Figure 13 shows the DVS curve of the crystalline compound I(a) Form E.

圖14展示化合物I(a) A型及E型之漿料之樣品的XRPD重疊圖。Figure 14 shows an XRPD overlay of samples of Compound I (a) Type A and Type E slurries.

圖15展示結晶化合物I(a) E型之XRPD圖案。Figure 15 shows the XRPD pattern of crystalline compound I(a) E type.

圖16展示結晶化合物I(a) E型之TGA及DSC曲線。Fig. 16 shows the TGA and DSC curves of the crystalline Compound I(a) Form E.

圖17展示結晶化合物I(a) E型在噴射研磨之前及之後的XRPD圖案。Figure 17 shows the XRPD pattern of crystalline compound I(a) Form E before and after jet milling.

圖18展示結晶化合物I(a) E型在噴射研磨之後的DSC曲線。Figure 18 shows the DSC curve of crystalline compound I(a) Form E after jet milling.

圖19展示結晶化合物I(a) B型在風乾之前及之後的XRPD重疊圖。Figure 19 shows XRPD overlays of crystalline Compound I(a) Form B before and after air drying.

圖20展示重新製備之結晶化合物I(a) A型在乾燥之前及之後的XRPD重疊圖。Figure 20 shows the XRPD overlay of the re-prepared crystalline Compound I(a) Form A before and after drying.

圖21展示重新製備之結晶化合物I(a) A型之TGA及DSC曲線。Figure 21 shows the TGA and DSC curves of the newly prepared crystalline compound I(a) Form A.

圖22展示重新製備之結晶化合物I(a) E型之XRPD圖案。Fig. 22 shows the XRPD pattern of the newly prepared crystalline compound I(a) E type.

圖23展示重新製備之結晶化合物I(a) E型之TGA及DSC曲線。Figure 23 shows the TGA and DSC curves of the newly prepared crystalline Compound I(a) Form E.

圖24展示結晶化合物I(a) A0型之XRPD圖案。FIG. 24 shows the XRPD pattern of crystalline compound I(a) A0 type.

圖25展示結晶化合物I(a) C型之XRPD圖案。Figure 25 shows the XRPD pattern of crystalline Compound I(a) Type C.

圖26展示結晶化合物I(a) C型之TGA及DSC曲線。Figure 26 shows the TGA and DSC curves of the crystalline Compound I(a) Form C.

圖27展示結晶化合物I(a) C型之1 H NMR光譜。Fig. 27 shows the 1 H NMR spectrum of the crystalline compound I(a) Form C.

圖28展示結晶化合物I(a) D型之XRPD圖案。Figure 28 shows the XRPD pattern of the crystalline compound I(a) D form.

圖29展示結晶化合物I(a) D型之TGA及DSC曲線。Figure 29 shows the TGA and DSC curves of the crystalline Compound I(a) D form.

圖30展示結晶化合物I(a) D型之1 H NMR光譜。Fig. 30 shows the 1 H NMR spectrum of the crystalline compound I(a) Form D.

圖31展示結晶化合物I(a) D型在加熱之前及之後的XRPD重疊圖。Figure 31 shows an XRPD overlay of crystalline Compound I(a) Form D before and after heating.

圖32展示結晶化合物I(a) F型之XRPD圖案。Figure 32 shows the XRPD pattern of crystalline Compound I(a) F type.

圖33展示結晶化合物I(a) F型之TGA及DSC曲線。Fig. 33 shows the TGA and DSC curves of the crystalline compound I(a) F type.

圖34展示結晶化合物I(a) F型之1 H NMR光譜。Fig. 34 shows the 1 H NMR spectrum of the crystalline compound I(a) Form F.

圖35展示結晶化合物I(a) F型在加熱之前及之後的XRPD重疊圖。Figure 35 shows an XRPD overlay of crystalline Compound I(a) Form F before and after heating.

圖36展示結晶化合物I(a) G型之XRPD圖案。Figure 36 shows the XRPD pattern of crystalline Compound I(a) Type G.

圖37展示結晶化合物I(a) G型之TGA及DSC曲線。Figure 37 shows the TGA and DSC curves of the crystalline Compound I(a) Form G.

圖38展示結晶化合物I(a) G型之1 H NMR光譜。Fig. 38 shows the 1 H NMR spectrum of the crystalline compound I(a) Form G.

圖39展示結晶化合物I(a) G型在加熱之前及之後的XRPD重疊圖。Figure 39 shows an XRPD overlay of crystalline Compound I(a) Form G before and after heating.

圖40展示結晶化合物I(a) H型之XRPD圖案。Fig. 40 shows the XRPD pattern of the crystalline compound I(a) H type.

圖41展示結晶化合物I(a) H型之TGA及DSC曲線。Figure 41 shows the TGA and DSC curves of the crystalline compound I(a) H form.

圖42展示結晶化合物I(a) H型之1 H NMR光譜。Figure 42 shows the 1 H NMR spectrum of the crystalline compound I(a) H form.

圖43展示結晶化合物I(a) H型在加熱之前及之後的XRPD重疊圖。Figure 43 shows an XRPD overlay of crystalline Compound I(a) Form H before and after heating.

圖44展示結晶化合物I(a) I型之XRPD圖案。Figure 44 shows the XRPD pattern of crystalline Compound I(a) Type I.

圖45展示結晶化合物I(a) I型之TGA及DSC曲線。Figure 45 shows the TGA and DSC curves of crystalline Compound I(a) Type I.

圖46展示結晶化合物I(a) I型之1 H NMR光譜。Fig. 46 shows the 1 H NMR spectrum of the crystalline compound I(a) Type I.

圖47展示結晶化合物I(a) J型之XRPD圖案。Fig. 47 shows the XRPD pattern of the crystalline compound I(a) J type.

圖48展示結晶化合物I(a) J型之TGA及DSC曲線。Fig. 48 shows the TGA and DSC curves of the crystalline compound I(a) J type.

圖49展示結晶化合物I(a) J型之1 H NMR光譜。Fig. 49 shows the 1 H NMR spectrum of the crystalline compound I(a) Form J.

圖50展示結晶化合物I(a) K型之XRPD圖案。Fig. 50 shows the XRPD pattern of the crystalline compound I(a) type K.

圖51展示結晶化合物I(a) K型之TGA及DSC曲線。Fig. 51 shows the TGA and DSC curves of the crystalline Compound I(a) Type K.

圖52展示結晶化合物I(a) K型之1 H NMR光譜。Fig. 52 shows the 1 H NMR spectrum of the crystalline compound I(a) Type K.

圖53展示結晶化合物I(a) L型之XRPD圖案。Fig. 53 shows the XRPD pattern of the crystalline compound I(a) L type.

圖54展示結晶化合物I(a) L型之TGA及DSC曲線。Figure 54 shows the TGA and DSC curves of the crystalline compound I(a) L-form.

圖55展示結晶化合物I(a) L型之1 H NMR光譜。Figure 55 shows the 1 H NMR spectrum of the crystalline compound I(a) L form.

圖56展示結晶化合物I(a) M型之XRPD圖案。Figure 56 shows the XRPD pattern of the crystalline compound I(a) M type.

圖57展示結晶化合物I(a) M型之TGA及DSC曲線。Figure 57 shows the TGA and DSC curves of the crystalline compound I(a) M form.

圖58展示結晶化合物I(a) M型之1 H NMR光譜。Fig. 58 shows the 1 H NMR spectrum of the crystalline compound I(a) M type.

圖59展示藉由先前技術方法製備之非晶化合物I(a)之XRPD圖案。Fig. 59 shows the XRPD pattern of the amorphous compound I(a) prepared by the prior art method.

圖60展示藉由先前技術方法製備之非晶化合物I(a)游離鹼之TGA及DSC曲線。Fig. 60 shows the TGA and DSC curves of the amorphous compound I(a) free base prepared by the prior art method.

圖61展示藉由先前技術方法製備之非晶化合物I(a)游離鹼之XRPD圖案。FIG. 61 shows the XRPD pattern of the amorphous compound I(a) free base prepared by the prior art method.

圖62展示藉由先前技術方法製備之非晶化合物I(a)之TGA及mDSC曲線。Fig. 62 shows the TGA and mDSC curves of the amorphous compound I(a) prepared by the prior art method.

圖63展示藉由先前技術方法製備之非晶化合物I(a)之HPLC層析圖。Fig. 63 shows an HPLC chromatogram of amorphous compound I(a) prepared by the prior art method.

圖64展示結晶化合物I(a) E型及E型晶種材料之XRPD圖案。FIG. 64 shows XRPD patterns of crystalline compound I(a) E-type and E-type seed materials.

圖65展示結晶化合物I(a) E型之TGA及DSC曲線。Figure 65 shows the TGA and DSC curves of the crystalline compound I(a) E form.

圖66展示龍膽酸-化合物I(a)共晶體A型之XRPD重疊圖。Figure 66 shows an XRPD overlay of gentisic acid-compound I(a) co-crystal form A.

圖67展示龍膽酸-化合物I(a)共晶體A型之TGA及DSC曲線。Figure 67 shows the TGA and DSC curves of gentisic acid-compound I(a) co-crystal form A.

圖68展示龍膽酸-化合物I(a)共晶體A型之1 H NMR光譜。Figure 68 shows the 1 H NMR spectrum of gentisic acid-compound I(a) co-crystal form A.

圖69展示龍膽酸-化合物I(a)共晶體A及B型之XRPD重疊圖。Figure 69 shows an XRPD overlay of gentisic acid-compound I(a) co-crystals A and B.

圖70展示龍膽酸-化合物I(a)共晶體A型之TGA及DSC曲線。Figure 70 shows the TGA and DSC curves of gentisic acid-compound I(a) co-crystal form A.

圖71展示結晶化合物I(a) E型在DVS測試之前及之後的圖案之XPRD重疊圖。Figure 71 shows the XPRD overlay of the pattern of crystalline compound I(a) Form E before and after the DVS test.

圖72展示龍膽酸-化合物I(a)共晶體B型之TGA及DSC曲線。Figure 72 shows the TGA and DSC curves of the gentisic acid-compound I(a) co-crystal B form.

圖73展示龍膽酸-化合物I(a)共晶體B型之1 H NMR光譜。Fig. 73 shows the 1 H NMR spectrum of gentisic acid-compound I(a) co-crystal B type.

圖74展示吡啶甲醯胺化合物I(a)共晶體A型之XRPD重疊圖。Fig. 74 shows the XRPD overlay of the pyridine formamide compound I(a) eutectic Form A.

圖75展示吡啶甲醯胺化合物I(a)共晶體A型之TGA及DSC曲線。Fig. 75 shows the TGA and DSC curves of the co-crystal Form A of the pyridylcarboxamide compound I(a).

圖76展示吡啶甲醯胺化合物I(a)共晶體A型之1 H NMR光譜。Fig. 76 shows the 1 H NMR spectrum of the pyridine formamide compound I(a) eutectic Form A.

圖77展示吡啶甲醯胺化合物I(a)共晶體A型在加熱之前及之後的XRPD重疊圖。Figure 77 shows the XRPD overlay of pyridylcarboxamide compound I(a) eutectic Form A before and after heating.

圖78展示吡啶甲醯胺化合物I(a)共晶體A型之XRPD圖案。Fig. 78 shows the XRPD pattern of the co-crystal form A of pyridylcarboxamide compound I(a).

圖79展示吡啶甲醯胺化合物I(a)共晶體A型之TGA及DSC曲線。Fig. 79 shows the TGA and DSC curves of the co-crystal Form A of the pyridylcarboxamide compound I(a).

圖80展示吡啶甲醯胺化合物I(a)共晶體A型之1 H NMR光譜。Fig. 80 shows the 1 H NMR spectrum of the form A co-crystal of the pyridylcarboxamide compound I(a).

圖81展示結晶化合物I(a) AL型之XRPD圖案。Fig. 81 shows the XRPD pattern of crystalline compound I(a) AL type.

圖82展示結晶化合物I(a) AL型之TGA及DSC曲線。Figure 82 shows the TGA and DSC curves of the crystalline compound I(a) AL form.

圖83展示結晶化合物I(a) AL型之1 H NMR光譜。Fig. 83 shows the 1 H NMR spectrum of the crystalline compound I(a) AL form.

圖84展示結晶化合物I(a) BO型及BN型之XRPD重疊圖。Fig. 84 shows an XRPD overlay of the crystalline compound I(a) BO type and BN type.

圖85展示結晶化合物I(a) BO型之TGA及DSC曲線。Fig. 85 shows the TGA and DSC curves of the crystalline compound I(a) BO type.

圖86展示結晶化合物I(a) BO型之1 H NMR光譜。Fig. 86 shows the 1 H NMR spectrum of the crystalline compound I(a) BO type.

圖87展示結晶化合物I(a) BP型之XRPD圖案。Fig. 87 shows the XRPD pattern of the BP type of the crystalline compound I(a).

圖88展示結晶化合物I(a) BP型之TGA及DSC曲線。Fig. 88 shows the TGA and DSC curves of the BP type of the crystalline compound I(a).

圖89展示結晶化合物I(a) BP型之1 H NMR光譜。Fig. 89 shows the 1 H NMR spectrum of the BP type of the crystalline compound I(a).

圖90展示結晶化合物I(a) BK型之XRPD圖案。Fig. 90 shows the XRPD pattern of the crystalline compound I(a) BK type.

圖91展示結晶化合物I(a) BK型之TGA及DSC曲線。Figure 91 shows the TGA and DSC curves of the crystalline compound I(a) BK type.

圖92展示結晶化合物I(a) BK型之1 H NMR光譜。Fig. 92 shows the 1 H NMR spectrum of the crystalline compound I(a) BK type.

圖93展示結晶化合物I(a) AX型之XRPD圖案。Figure 93 shows the XRPD pattern of crystalline compound I(a) AX type.

圖94展示結晶化合物I(a) AX型之TGA及DSC曲線。Fig. 94 shows TGA and DSC curves of AX type crystalline compound I(a).

圖95展示結晶化合物I(a) AX型之1 H NMR光譜。FIG. 95 shows the 1 H NMR spectrum of AX type crystalline compound I(a).

圖96展示結晶化合物I(a) Q型之XRPD圖案。Fig. 96 shows the XRPD pattern of the crystalline compound I(a) Q type.

圖97展示結晶化合物I(a) Q型之TGA及DSC曲線。Fig. 97 shows the TGA and DSC curves of the Q type of crystalline compound I(a).

圖98展示結晶化合物I(a) Q型之1 H NMR光譜。Fig. 98 shows the 1 H NMR spectrum of the crystalline compound I(a) Q type.

圖99展示結晶化合物I(a) P型之XRPD圖案。Fig. 99 shows the XRPD pattern of the crystalline compound I(a) P type.

圖100展示結晶化合物I(a) P型之TGA及DSC曲線。Figure 100 shows the TGA and DSC curves of the crystalline compound I(a) P-type.

圖101展示結晶化合物I(a) P型之1 H NMR光譜。Fig. 101 shows the 1 H NMR spectrum of the crystalline compound I(a) P type.

圖102展示結晶化合物I(a) AQ型之XRPD圖案。Fig. 102 shows the XRPD pattern of the crystalline compound I(a) AQ type.

圖103展示結晶化合物I(a) AQ型之TGA及DSC曲線。Fig. 103 shows the TGA and DSC curves of the crystalline compound I(a) AQ type.

圖104展示結晶化合物I(a) AQ型之1 H NMR光譜。Fig. 104 shows the 1 H NMR spectrum of the crystalline compound I(a) AQ type.

Figure 01_image004
Figure 01_image004

Claims (156)

一種製備化合物3之方法,該方法包含: (i) 根據步驟1使化合物1與磺化劑在溶劑中反應以形成化合物2,其中Y係芳基磺醯基或烷基磺醯基
Figure 03_image091
; 及 (ii) 根據步驟2使化合物2與氮源在溶劑中反應以形成化合物3,
Figure 03_image093
, 其中: 化合物3係游離鹼; 以化合物1計,化合物3之產率係至少30%; R1 選自鹵基、鹵基-C1-4 烷基-、鹵基-C1-4 烷氧基-及-CN;及 R2 選自H及環丙基-。
A method for preparing compound 3, which comprises: (i) reacting compound 1 with a sulfonating agent in a solvent according to step 1 to form compound 2, wherein Y is arylsulfonyl or alkylsulfonyl
Figure 03_image091
; And (ii) reacting compound 2 with a nitrogen source in a solvent according to step 2 to form compound 3,
Figure 03_image093
, Where: Compound 3 is the free base; based on compound 1, the yield of compound 3 is at least 30%; R 1 is selected from halo, halo-C 1-4 alkyl-, halo-C 1-4 alkyl Oxygen- and -CN; and R 2 are selected from H and cyclopropyl-.
如請求項1之方法,其中R1 選自-F、-CF3 、-CHF2 、-OCF3 、-OCHF2 、-OCH2 CF3 及-CN。The method of claim 1, wherein R 1 is selected from -F, -CF 3 , -CHF 2 , -OCF 3 , -OCHF 2 , -OCH 2 CF 3 and -CN. 如請求項2之方法,其中R1 係-CF3The method of claim 2, wherein R 1 is -CF 3 . 如請求項1至3中任一項之方法,其中R2 係H。The method according to any one of claims 1 to 3, wherein R 2 is H. 如請求項1至4中任一項之方法,其中該磺化劑:(i)係磺酸酯;(ii)選自甲磺醯氯及甲苯磺醯氯;或(iii)係甲磺醯氯。The method according to any one of claims 1 to 4, wherein the sulfonating agent: (i) is a sulfonate; (ii) is selected from mesylate chloride and tosylate chloride; or (iii) is mesylate chlorine. 如請求項1至5中任一項之方法,其中該步驟1反應進一步包含鹼。The method according to any one of claims 1 to 5, wherein the step 1 reaction further comprises a base. 如請求項6之方法,其中該步驟1之鹼係(i)胺鹼或(ii)選自三甲胺、二異丙基乙胺、三丁胺及辛胺之胺鹼。The method of claim 6, wherein the base in step 1 is (i) an amine base or (ii) an amine base selected from trimethylamine, diisopropylethylamine, tributylamine, and octylamine. 如請求項1至7中任一項之方法,其中該步驟1之溶劑:(i)包含或係極性非質子溶劑;(ii)選自以下中之一或多者:2-甲基四氫呋喃、四氫呋喃、乙酸乙酯、乙酸丙酯、丙酮、二甲基甲醯胺、乙腈及二甲亞碸;(iii)選自2-甲基四氫呋喃及四氫呋喃;或(iv)係2-甲基四氫呋喃。The method according to any one of claims 1 to 7, wherein the solvent in step 1: (i) contains or is a polar aprotic solvent; (ii) is selected from one or more of the following: 2-methyltetrahydrofuran, Tetrahydrofuran, ethyl acetate, propyl acetate, acetone, dimethylformamide, acetonitrile, and dimethylsulfoxide; (iii) selected from 2-methyltetrahydrofuran and tetrahydrofuran; or (iv) 2-methyltetrahydrofuran. 如請求項1至8中任一項之方法,其中該步驟2之氮源係氨或銨鹽。The method according to any one of claims 1 to 8, wherein the nitrogen source of step 2 is ammonia or ammonium salt. 如請求項1至9中任一項之方法,其中該步驟2之溶劑:(i)包含或係極性有機溶劑;(ii)選自以下中之一或多者:甲醇、乙醇、1-丙醇、2-丙醇、1-丁醇、甲酸、乙酸、2-甲基四氫呋喃、四氫呋喃、乙酸乙酯、乙酸丙酯、丙酮、二甲基甲醯胺、乙腈及二甲亞碸;(iii)選自以下中之一或多者:甲醇、乙醇、1-丙醇及2-丙醇;或(iv)係甲醇。The method according to any one of claims 1 to 9, wherein the solvent in step 2: (i) contains or is a polar organic solvent; (ii) is selected from one or more of the following: methanol, ethanol, 1-propane Alcohol, 2-propanol, 1-butanol, formic acid, acetic acid, 2-methyltetrahydrofuran, tetrahydrofuran, ethyl acetate, propyl acetate, acetone, dimethylformamide, acetonitrile and dimethylsulfoxide; (iii ) Is selected from one or more of the following: methanol, ethanol, 1-propanol and 2-propanol; or (iv) methanol. 如請求項1至10中任一項之方法,其進一步包含純化步驟,其中化合物3藉由以下純化: (i) 由該步驟2溶劑交換成介電常數大於2之非極性溶劑,以形成化合物3於該非極性溶劑中之第一溶液; (ii) 藉由添加酸,使固體化合物3自該第一溶液中沈澱,之後分離固體化合物3及視情況洗滌所分離之固體化合物3; (iii) 藉由添加鹼,讓化合物3溶解於介電常數大於2之非極性溶劑中,形成化合物3於該非極性溶劑中之第二溶液; (iv) 藉由添加反溶劑,使固體化合物3游離鹼自該第二溶液中沈澱,或藉由移除非極性溶劑來濃縮,或其組合;及 (v) 分離純化之呈游離鹼形式之化合物3。The method according to any one of claims 1 to 10, further comprising a purification step, wherein compound 3 is purified by: (i) from the step 2 solvent exchange to a non-polar solvent with a dielectric constant greater than 2 to form the first solution of compound 3 in the non-polar solvent; (ii) by adding an acid, the solid compound 3 is precipitated from the first solution, and then the solid compound 3 is separated and the separated solid compound 3 is optionally washed; (iii) by adding a base, compound 3 is dissolved in a non-polar solvent with a dielectric constant greater than 2 to form a second solution of compound 3 in the non-polar solvent; (iv) by adding an anti-solvent, the solid compound 3 free base is precipitated from the second solution, or concentrated by removing the non-polar solvent, or a combination thereof; and (v) Separation and purification of compound 3 in free base form. 如請求項11之方法,其中該介電常數大於2之非極性溶劑:(i)選自以下中之一或多者:甲基第三丁基醚、二乙醚、甲苯、1,4-二噁烷及三氯甲烷;(ii)選自甲基第三丁基醚及二乙醚中之一者或兩者;或(iii)係甲基第三丁基醚。The method of claim 11, wherein the non-polar solvent having a dielectric constant greater than 2: (i) is selected from one or more of the following: methyl tertiary butyl ether, diethyl ether, toluene, 1,4-bis Oxane and chloroform; (ii) one or both selected from methyl tertiary butyl ether and diethyl ether; or (iii) methyl tertiary butyl ether. 如請求項11或12之方法,其中該使化合物3沈澱之酸:(i)係有機酸;(ii)係羧酸;(iii)選自以下中之一或多者:甲酸、草酸、丙二酸、丁二酸、戊二酸、丁二酸及己二酸;或(iv)係草酸。The method of claim 11 or 12, wherein the acid that precipitates compound 3: (i) is an organic acid; (ii) is a carboxylic acid; (iii) is selected from one or more of the following: formic acid, oxalic acid, propylene Diacid, succinic acid, glutaric acid, succinic acid and adipic acid; or (iv) oxalic acid. 如請求項11至13中任一項之方法,其中該反溶劑:(i)具有小於2之介電常數;(ii)選自以下中之一或多者:正戊烷、正己烷、正庚烷及環戊烷;或(iii)係正庚烷。The method according to any one of claims 11 to 13, wherein the antisolvent: (i) has a dielectric constant of less than 2; (ii) is selected from one or more of the following: n-pentane, n-hexane, n-hexane Heptane and cyclopentane; or (iii) n-heptane. 如請求項1至14中任一項之方法,其中以化合物1計,該化合物3之產率係至少40%、至少50%、至少60%、至少70%或至少80%。The method according to any one of claims 1 to 14, wherein the yield of the compound 3 is at least 40%, at least 50%, at least 60%, at least 70%, or at least 80% based on the compound 1. 如請求項1至15中任一項之方法,其進一步包含藉由包含以下之方法,由化合物3形成化合物6: (i) 根據步驟3使化合物3、化合物4及偶合劑在溶劑中反應以形成化合物5
Figure 03_image095
其中 各星號指示對掌性中心,及 PG指示胺保護基;及 (ii) 根據以下步驟4,使化合物5及酸性脫除保護基劑在溶劑中反應以形成化合物6
Figure 03_image097
, 其中 R3 係C1-4 烷基-且R4 選自H及-F,或 R3 及R4 與其所連接之環原子一起形成三員碳環。
The method according to any one of claims 1 to 15, further comprising forming compound 6 from compound 3 by a method including: (i) reacting compound 3, compound 4 and the coupling agent in a solvent according to step 3; Formation of compound 5
Figure 03_image095
Where each asterisk indicates a palmarity center, and PG indicates an amine protecting group; and (ii) according to the following step 4, compound 5 and an acidic deprotecting group reacting in a solvent to form compound 6
Figure 03_image097
Where R 3 is C 1-4 alkyl- and R 4 is selected from H and -F, or R 3 and R 4 together with the ring atoms to which they are attached form a three-membered carbocyclic ring.
如請求項16之方法,其中R3 係-CH3 且R4 係-F。The method of claim 16, wherein R 3 is -CH 3 and R 4 is -F. 如請求項16或17之方法,其中該步驟3反應進一步包含鹼且該胺保護基:(i)選自乙醯基、三氟乙醯基、第三丁氧基羰基、苯甲氧基羰基及9-茀基亞甲基氧基羰基;或(ii)係第三丁氧基羰基。The method according to claim 16 or 17, wherein the step 3 reaction further comprises a base and the amine protecting group: (i) is selected from acetyl, trifluoroacetyl, third butoxycarbonyl, benzyloxycarbonyl And 9-oxylmethyleneoxycarbonyl; or (ii) is the third butoxycarbonyl group. 如請求項18之方法,其中該步驟3之鹼:(i)係有機鹼;(ii)係三級胺鹼;(iii)選自N-甲基-嗎啉、二異丙基乙胺及三乙胺;或(iv)係N-甲基-嗎啉。The method according to claim 18, wherein the base in step 3: (i) is an organic base; (ii) is a tertiary amine base; (iii) is selected from N-methyl-morpholine, diisopropylethylamine and Triethylamine; or (iv) N-methyl-morpholine. 如請求項16至19中任一項之方法,其中該偶合劑:(i)選自丙烷膦酸酐;1-[雙(二甲胺基)亞甲基]-1H-1,2,3-三唑并[4,5-b]吡啶鎓3-氧化六氟磷酸鹽;2-(1H-苯并三唑-1-基)-1,1,3,3-四甲基
Figure 108105242-A0101-12-0011
六氟磷酸鹽;N,N'-二環己基碳化二亞胺;苯并三唑-1-基氧基)參(二甲胺基)鏻六氟磷酸鹽;苯并三唑-1-基-氧基三吡咯啶基鏻六氟磷酸鹽;1,1'-羰基二咪唑;1-乙基-3-(3-二甲胺基丙基)碳化二亞胺及羥基苯并三唑;及1-乙基-3-(3-二甲胺基丙基)碳化二亞胺及4-二甲胺基吡啶;或(ii)係丙烷膦酸酐。
The method according to any one of claims 16 to 19, wherein the coupling agent: (i) is selected from propanephosphonic anhydride; 1-[bis(dimethylamino)methylene]-1H-1,2,3- Triazolo[4,5-b]pyridinium 3-oxide hexafluorophosphate; 2-(1H-benzotriazol-1-yl)-1,1,3,3-tetramethyl
Figure 108105242-A0101-12-0011
Hexafluorophosphate; N,N'-dicyclohexylcarbodiimide; benzotriazol-1-yloxy) ginseng (dimethylamino)phosphonium hexafluorophosphate; benzotriazol-1-yl -Oxytripyrrolidinylphosphonium hexafluorophosphate; 1,1'-carbonyldiimidazole; 1-ethyl-3-(3-dimethylaminopropyl) carbodiimide and hydroxybenzotriazole; And 1-ethyl-3-(3-dimethylaminopropyl) carbodiimide and 4-dimethylaminopyridine; or (ii) propanephosphonic anhydride.
如請求項16至20中任一項之方法,其中該步驟3之溶劑:(i)包含或係極性非質子溶劑;(ii)選自以下中之一或多者:-2-甲基四氫呋喃、四氫呋喃、乙酸乙酯、乙酸丙酯、丙酮、二甲基甲醯胺、乙腈及二甲亞碸;或(iii)選自乙酸乙酯及乙酸丙酯中之一者或兩者。The method according to any one of claims 16 to 20, wherein the solvent in step 3: (i) contains or is a polar aprotic solvent; (ii) is selected from one or more of the following: 2-methyltetrahydrofuran , Tetrahydrofuran, ethyl acetate, propyl acetate, acetone, dimethylformamide, acetonitrile, and dimethyl sulfoxide; or (iii) one or both selected from ethyl acetate and propyl acetate. 如請求項21之方法,其中步驟3進一步包含: (i) 由該極性非質子溶劑交換成極性質子溶劑;及 (ii) 藉由添加反溶劑,使固體化合物5沈澱。The method of claim 21, wherein step 3 further comprises: (i) exchange of the polar aprotic solvent into a polar protic solvent; and (ii) The solid compound 5 is precipitated by adding an anti-solvent. 如請求項22之方法,其中該極性質子溶劑:(i)選自以下中之一或多者:甲醇、乙醇、1-丙醇、2-丙醇、1-丁醇、甲酸及乙酸;(ii)選自以下中之一或多者:甲醇、乙醇、1-丙醇及2-丙醇;或(iii)係乙醇。The method of claim 22, wherein the polar protic solvent: (i) is selected from one or more of the following: methanol, ethanol, 1-propanol, 2-propanol, 1-butanol, formic acid, and acetic acid; (ii) one or more selected from methanol, ethanol, 1-propanol and 2-propanol; or (iii) ethanol. 如請求項16至23中任一項之方法,其中該酸性脫除保護基劑係:(i)有機酸或無機酸;(ii)醯基鹵化物或無機酸;(iii)選自乙醯氯、甲醯氯、丙醯氯及丁醯氯之醯基氯化物或選自鹽酸及硫酸之無機酸;或(iv)係乙醯氯。The method according to any one of claims 16 to 23, wherein the acidic deprotecting base agent is: (i) an organic acid or an inorganic acid; (ii) an acyl halide or an inorganic acid; (iii) selected from acetyl Chloride, methyl chloride, propyl chloride and butyl chloride's acetyl chloride or inorganic acid selected from hydrochloric acid and sulfuric acid; or (iv) is acetyl chloride. 如請求項16至24中任一項之方法,其中該步驟4之溶劑(i)包含或係極性質子溶劑;(ii)選自以下中之一或多者:甲醇、乙醇、1-丙醇、2-丙醇、1-丁醇、甲酸及乙酸;(iii)選自以下中之一或多者:甲醇、乙醇、1-丙醇及2-丙醇;或(iv)係1-丙醇。The method according to any one of claims 16 to 24, wherein the solvent of step 4 (i) contains or is a polar protic solvent; (ii) is selected from one or more of the following: methanol, ethanol, 1-propane Alcohol, 2-propanol, 1-butanol, formic acid, and acetic acid; (iii) one or more selected from the group consisting of methanol, ethanol, 1-propanol, and 2-propanol; or (iv) 1- Propanol. 如請求項16至25中任一項之方法,其中化合物6呈溶液形式且步驟4進一步包含藉由添加反溶劑形成固體化合物6之漿料,其中該反溶劑:(i)具有小於2之介電常數;(ii)選自以下中之一或多者:正戊烷、正己烷、正庚烷及環戊烷;或(iii)係正庚烷。The method of any one of claims 16 to 25, wherein compound 6 is in the form of a solution and step 4 further comprises forming a slurry of solid compound 6 by adding an anti-solvent, wherein the anti-solvent: (i) has less than 2 Electrical constant; (ii) one or more selected from the group consisting of n-pentane, n-hexane, n-heptane, and cyclopentane; or (iii) n-heptane. 如請求項16至26中任一項之方法,其進一步包含藉由包含以下之方法由化合物6形成結晶化合物I或其溶劑合物或共晶體: (i) 根據以下步驟5,使化合物6、化合物7及鹼在溶劑系統中反應以形成化合物(I)
Figure 03_image099
其中: R5 係鹵基; X1 及X2 各係C,或X1 及X2 中之一者係N且另一者係C;及 n係1或2。
The method according to any one of claims 16 to 26, further comprising forming crystalline compound 1 or a solvate or co-crystal thereof from compound 6 by a method comprising: (i) according to the following step 5, compound 6, Compound 7 and base react in a solvent system to form compound (I)
Figure 03_image099
Wherein: R 5 is a halogen group; X 1 and X 2 are each C, or one of X 1 and X 2 is N and the other is C; and n is 1 or 2.
如請求項27之方法,其進一步包含: (i) 由化合物(I)藉由溶劑交換,從溶劑系統移至選自以下之有機溶劑中,形成化合物(I)之溶液: (a) 介電常數大於2之非極性溶劑, (b) 極性非質子溶劑,或 (c) 極性質子溶劑;及 (ii) 使該化合物(I)之溶液與反溶劑接觸以形成結晶化合物(I)之溶劑合物與該介電常數大於2之非極性溶劑、極性非質子溶劑或極性質子溶劑之漿料。The method of claim 27 further includes: (i) The compound (I) is transferred from the solvent system to the organic solvent selected from the following by solvent exchange to form a solution of the compound (I): (a) Non-polar solvents with a dielectric constant greater than 2, (b) polar aprotic solvents, or (c) polar protic solvents; and (ii) contacting the solution of the compound (I) with an antisolvent to form a slurry of the solvate of the crystalline compound (I) and the nonpolar solvent, polar aprotic solvent or polar protic solvent with a dielectric constant greater than 2 . 如請求項27或28之方法,其中該反溶劑具有小於2之介電常數,或選自正戊烷、正己烷及正庚烷,或係正庚烷。The method of claim 27 or 28, wherein the anti-solvent has a dielectric constant of less than 2, or is selected from n-pentane, n-hexane, and n-heptane, or is n-heptane. 如請求項27至29中任一項之方法,其中該鹼:(i)係無機鹼之水溶液;(ii)選自鹼金屬氫氧化物、氫氧化銨、碳酸鉀及碳酸鈉之水溶液;或(iii)係碳酸鉀或碳酸鈉之水溶液。The method according to any one of claims 27 to 29, wherein the base: (i) is an aqueous solution of an inorganic base; (ii) is an aqueous solution selected from alkali metal hydroxides, ammonium hydroxide, potassium carbonate, and sodium carbonate; or (iii) is an aqueous solution of potassium carbonate or sodium carbonate. 如請求項27至30中任一項之方法,其中該步驟5之溶劑系統:(i)包含或係介電常數大於2之非極性溶劑;(ii)選自以下中之一或多者:甲基第三丁基醚、二乙醚、1,4-二噁烷及三氯甲烷;(iii)選自甲基第三丁基醚及二乙醚;或(iv)係甲基第三丁基醚。The method according to any one of claims 27 to 30, wherein the solvent system of step 5: (i) contains or is a non-polar solvent having a dielectric constant greater than 2; (ii) is selected from one or more of the following: Methyl tertiary butyl ether, diethyl ether, 1,4-dioxane and chloroform; (iii) selected from methyl tertiary butyl ether and diethyl ether; or (iv) methyl tertiary butyl ether. 如請求項28至31中任一項之方法,其中用於該溶劑交換及形成化合物(I)之溶液的該有機溶劑選自: (i) N,N-二甲基乙醯胺,且形成結晶化合物(I) N,N-二甲基乙醯胺溶劑合物C型; (ii) 苯甲醚,且形成結晶化合物(I)苯甲醚溶劑合物D型; (iii) 乙醇,且形成結晶化合物(I)乙醇溶劑合物F型; (iv) 甲苯,且形成結晶化合物(I)甲苯溶劑合物G型; (v)2-丙醇,且形成結晶化合物(I) 2-丙醇溶劑合物H型; (vi) 1-丁醇,且形成結晶化合物(I) 1-丁醇溶劑合物I型; (vii) 2-甲基四氫呋喃,且形成結晶化合物(I) 2-甲基四氫呋喃溶劑合物J型; (viii) 四氫呋喃,且形成結晶化合物(I)四氫呋喃溶劑合物K型; (ix) 異丁醇,且形成結晶化合物(I)異丁醇溶劑合物L型;及 (x) 二甲亞碸,且形成結晶化合物(I)二甲亞碸溶劑合物M型。The method according to any one of claims 28 to 31, wherein the organic solvent used for the solvent exchange and forming a solution of compound (I) is selected from: (i) N,N-dimethylacetamide and form a crystalline compound (I) N,N-dimethylacetamide solvate Form C; (ii) anisole and form crystalline compound (I) anisole solvate form D; (iii) Ethanol, and form crystalline compound (I) ethanol solvate Form F; (iv) Toluene, and form crystalline compound (I) Toluene solvate Form G; (v) 2-propanol, and form a crystalline compound (I) 2-propanol solvate form H; (vi) 1-butanol and form crystalline compound (I) 1-butanol solvate Form I; (vii) 2-methyltetrahydrofuran, and the crystalline compound (I) 2-methyltetrahydrofuran solvate Form J is formed; (viii) Tetrahydrofuran, and form crystalline compound (I) Tetrahydrofuran solvate form K; (ix) Isobutanol and form crystalline compound (I) I-butanol solvate L form; and (x) Dimethyl sulfoxide and form crystalline compound (I) Dimethyl sulfoxide solvate M type. 如請求項28至32中任一項之方法,其中用於該溶劑交換及形成化合物(I)之溶液的該有機溶劑係乙醇。The method according to any one of claims 28 to 32, wherein the organic solvent used for the solvent exchange and forming the solution of the compound (I) is ethanol. 如請求項28至33中任一項之方法,其進一步包含:(i)將該化合物(I)溶劑合物溶解於二氯甲烷中及(ii)使該化合物(I)於二氯甲烷中之溶液與反溶劑接觸,以形成結晶化合物(I)之溶劑合物及該反溶劑之漿料, 其中該反溶劑:(i)係具有小於2之介電常數之非極性界面活性劑;(ii)選自正戊烷、正己烷及正庚烷;或(iii)係正庚烷。The method according to any one of claims 28 to 33, further comprising: (i) dissolving the compound (I) solvate in dichloromethane and (ii) dissolving the compound (I) in dichloromethane The solution is contacted with the antisolvent to form the solvate of the crystalline compound (I) and the slurry of the antisolvent, Wherein the anti-solvent: (i) is a non-polar surfactant having a dielectric constant of less than 2; (ii) is selected from n-pentane, n-hexane and n-heptane; or (iii) is n-heptane. 如請求項34之方法,其中用於該溶劑交換及形成化合物(I)之溶液的該有機溶劑係乙醇,該反溶劑係正庚烷,且結晶化合物(I)係游離鹼無水物E型。The method of claim 34, wherein the organic solvent used for the solvent exchange and forming a solution of compound (I) is ethanol, the antisolvent is n-heptane, and the crystalline compound (I) is free base anhydrous form E. 如請求項16至35中任一項之方法,其中: (i) 化合物4具有結構4(a)
Figure 03_image101
化合物4(a); (ii) 化合物5具有結構5(a)
Figure 03_image103
化合物5(a);且 (iii) 化合物6具有結構6(a)
Figure 03_image105
化合物6(a)。
The method according to any one of claims 16 to 35, wherein: (i) Compound 4 has the structure 4(a)
Figure 03_image101
Compound 4(a); (ii) Compound 5 has structure 5(a)
Figure 03_image103
Compound 5(a); and (iii) Compound 6 has structure 6(a)
Figure 03_image105
Compound 6(a).
如請求項27至36中任一項之方法,其中化合物(I)具有結構I(a):
Figure 03_image107
化合物I(a)。
The method according to any one of claims 27 to 36, wherein the compound (I) has the structure I(a):
Figure 03_image107
Compound I(a).
一種製備結晶化合物I或其溶劑合物或共晶體之方法,該方法包含: (i) 使化合物6酸式鹽、化合物7及鹼在溶劑系統中進行下列反應,以形成化合物I
Figure 03_image109
Figure 03_image111
其中, R1 選自鹵基、鹵基-C1-4 烷基-、鹵基-C1-4 烷氧基-及-CN, R2 選自H及-環丙基, R3 係C1-4 烷基-,且R4 選自H及-F,或R3 及R4 連同其所連接之環原子一起形成三員碳環, R5 係鹵基, X1 及X2 各係C,或X1 及X2 中之一者係N且另一者係C, n係1或2,及 各星號表示對掌性中心; (ii) 由化合物(I)藉由溶劑交換,從反應步驟(i)之溶劑系統移至選自以下之有機溶劑,形成化合物(I)之溶液: (a) 介電常數大於2之非極性溶劑, (b) 極性非質子溶劑,或 (c) 極性質子溶劑;及 (iii) 使該化合物(I)之溶液與反溶劑接觸以形成結晶化合物(I)之漿料。
A method for preparing crystalline compound I or a solvate or co-crystal thereof, the method comprising: (i) subjecting compound 6 acid salt, compound 7 and base to the following reaction in a solvent system to form compound I
Figure 03_image109
Figure 03_image111
Wherein R 1 is selected from halo, halo-C 1-4 alkyl-, halo-C 1-4 alkoxy- and -CN, R 2 is selected from H and -cyclopropyl, R 3 is C 1-4 alkyl-, and R 4 is selected from H and -F, or R 3 and R 4 together with the ring atoms to which they are attached form a three-membered carbocycle, R 5 is a halo group, X 1 and X 2 are each C, or one of X 1 and X 2 is N and the other is C, n is 1 or 2, and each asterisk indicates a palmarity center; (ii) by compound (I) by solvent exchange, from The solvent system of reaction step (i) is moved to an organic solvent selected from the following to form a solution of compound (I): (a) a non-polar solvent with a dielectric constant greater than 2, (b) a polar aprotic solvent, or (c) Polar protic solvent; and (iii) contacting the solution of compound (I) with an anti-solvent to form a slurry of crystalline compound (I).
如請求項38之方法,其中結晶化合物(I)係與該介電常數大於2之非極性溶劑、極性非質子溶劑或極性質子溶劑之溶劑合物。The method of claim 38, wherein the crystalline compound (I) is a solvate with the nonpolar solvent, polar aprotic solvent, or polar protic solvent having a dielectric constant greater than 2. 如請求項38或39之方法,其中R1 選自-F、-CF3 、-CHF2 、-OCF3 、-OCHF2 、-OCH2 CF3 及-CN。The method of claim 38 or 39, wherein R 1 is selected from the group consisting of —F, —CF 3 , —CHF 2 , —OCF 3 , —OCHF 2 , —OCH 2 CF 3 and —CN. 如請求項40之方法,其中R1 係-CF3The method of claim 40, wherein R 1 is -CF 3 . 如請求項38至41中任一項之方法,其中R2 係H。The method according to any one of claims 38 to 41, wherein R 2 is H. 如請求項38至42中任一項之方法,其中R3 係-CH3 且R4 係-F。The method of any one of claims 38 to 42, wherein R 3 is -CH 3 and R 4 is -F. 如請求項38至43中任一項之方法,其中R5 係-F,X1 及X2 各係C,且n係1。The method according to any one of claims 38 to 43, wherein R 5 is -F, X 1 and X 2 are each C, and n is 1. 如請求項38至44中任一項之方法,其中該反溶劑具有小於2之介電常數,或選自正戊烷、正己烷及正庚烷,或係正庚烷。The method according to any one of claims 38 to 44, wherein the anti-solvent has a dielectric constant of less than 2, or is selected from n-pentane, n-hexane, and n-heptane, or is n-heptane. 如請求項38至45中任一項之方法,其中該鹼:(i)係無機鹼之水溶液;(ii)選自鹼金屬氫氧化物、氫氧化銨、碳酸鉀及碳酸鈉之水溶液;或(iii)係碳酸鉀或碳酸鈉之水溶液。The method according to any one of claims 38 to 45, wherein the base: (i) is an aqueous solution of an inorganic base; (ii) is an aqueous solution selected from alkali metal hydroxides, ammonium hydroxide, potassium carbonate, and sodium carbonate; or (iii) is an aqueous solution of potassium carbonate or sodium carbonate. 如請求項38至40中任一項之方法,其中該用於形成化合物(I)之溶劑系統:(i)包含或係介電常數大於2之非極性溶劑;(ii)選自以下中之一或多者:甲基第三丁基醚、二乙醚、1,4-二噁烷及三氯甲烷;(iii)選自甲基第三丁基醚及二乙醚;或(iv)係甲基第三丁基醚。The method according to any one of claims 38 to 40, wherein the solvent system for forming compound (I): (i) contains or is a non-polar solvent having a dielectric constant greater than 2; (ii) selected from the following One or more: methyl tertiary butyl ether, diethyl ether, 1,4-dioxane, and chloroform; (iii) selected from methyl tertiary butyl ether and diethyl ether; or (iv) The third butyl ether. 如請求項38至47中任一項之方法,其中用於該溶劑交換及形成化合物(I)之溶液的該有機溶劑選自: (i) N,N-二甲基乙醯胺,且形成結晶化合物(I) N,N-二甲基乙醯胺溶劑合物C型; (ii) 苯甲醚,且形成結晶化合物(I)苯甲醚溶劑合物D型; (iii) 乙醇,且形成結晶化合物(I)乙醇溶劑合物F型; (iv) 甲苯,且形成結晶化合物(I)甲苯溶劑合物G型; (v)2-丙醇,且形成結晶化合物(I) 2-丙醇溶劑合物H型; (vi) 1-丁醇,且形成結晶化合物(I) 1-丁醇溶劑合物I型; (vii) 2-甲基四氫呋喃,且形成結晶化合物(I) 2-甲基四氫呋喃溶劑合物J型; (viii) 四氫呋喃,且形成結晶化合物(I)四氫呋喃溶劑合物K型; (ix) 異丁醇,且形成結晶化合物(I)異丁醇溶劑合物L型;及 (x) 二甲亞碸,且形成結晶化合物(I)二甲亞碸溶劑合物M型。The method according to any one of claims 38 to 47, wherein the organic solvent used for the solvent exchange and forming a solution of compound (I) is selected from: (i) N,N-dimethylacetamide and form a crystalline compound (I) N,N-dimethylacetamide solvate Form C; (ii) anisole and form crystalline compound (I) anisole solvate form D; (iii) Ethanol, and form crystalline compound (I) ethanol solvate Form F; (iv) Toluene, and form crystalline compound (I) Toluene solvate Form G; (v) 2-propanol, and form a crystalline compound (I) 2-propanol solvate form H; (vi) 1-butanol and form crystalline compound (I) 1-butanol solvate Form I; (vii) 2-methyltetrahydrofuran, and the crystalline compound (I) 2-methyltetrahydrofuran solvate Form J is formed; (viii) Tetrahydrofuran, and form crystalline compound (I) Tetrahydrofuran solvate form K; (ix) Isobutanol and form crystalline compound (I) I-butanol solvate L form; and (x) Dimethyl sulfoxide and form crystalline compound (I) Dimethyl sulfoxide solvate M type. 如請求項38至48中任一項之方法,其中用於該溶劑交換及形成化合物(I)之溶液的該有機溶劑係乙醇。The method of any one of claims 38 to 48, wherein the organic solvent used for the solvent exchange and forming a solution of compound (I) is ethanol. 如請求項38至49中任一項之方法,其進一步包含:(i)將該化合物(I)或其溶劑合物溶解於二氯甲烷中及(ii)使該化合物(I)於二氯甲烷中之溶液與反溶劑接觸以形成結晶化合物(I)之溶劑合物及該反溶劑之漿料, 其中該反溶劑:(i)係介電常數小於2之非極性界面活性劑;(ii)選自正戊烷、正己烷及正庚烷;或(iii)係正庚烷。The method according to any one of claims 38 to 49, further comprising: (i) dissolving the compound (I) or a solvate thereof in methylene chloride and (ii) dissolving the compound (I) in dichloromethane The solution in methane contacts the antisolvent to form the solvate of the crystalline compound (I) and the slurry of the antisolvent, Wherein the anti-solvent: (i) is a non-polar surfactant with a dielectric constant of less than 2; (ii) is selected from n-pentane, n-hexane and n-heptane; or (iii) is n-heptane. 如請求項50之方法,其中用於該溶劑交換及形成化合物(I)之溶液的該有機溶劑係乙醇,該反溶劑係正庚烷,且結晶化合物(I)係游離鹼無水物E型。The method of claim 50, wherein the organic solvent used for the solvent exchange and forming the solution of compound (I) is ethanol, the antisolvent is n-heptane, and the crystalline compound (I) is free base anhydrous form E. 如請求項38至51中任一項之方法,其進一步包含形成化合物6,該方法包含: (i) 根據以下步驟使化合物3、化合物4及偶合劑在溶劑中反應以形成化合物5
Figure 03_image113
其中 PG表示胺保護基;及 (ii) 根據以下步驟使化合物5與酸性脫除保護基劑在溶劑中反應,以形成化合物6
Figure 03_image115
The method of any one of claims 38 to 51, further comprising forming compound 6, the method comprising: (i) reacting compound 3, compound 4, and a coupling agent in a solvent to form compound 5 according to the following steps
Figure 03_image113
Where PG represents an amine protecting group; and (ii) react compound 5 with an acidic deprotecting group agent in a solvent according to the following steps to form compound 6
Figure 03_image115
.
如請求項52之方法,其中該形成化合物5之反應進一步包含鹼,且該胺保護基:(i)選自乙醯基、三氟乙醯基、第三丁氧基羰基、苯甲氧基羰基及9-茀基亞甲基氧基羰基;或(ii)係第三丁氧基羰基。The method of claim 52, wherein the reaction to form compound 5 further comprises a base, and the amine protecting group: (i) is selected from the group consisting of acetyl, trifluoroethoxy, third butoxycarbonyl, and benzyloxy Carbonyl and 9- stilbene methyleneoxycarbonyl; or (ii) is the third butoxycarbonyl. 如請求項53之方法,其中該鹼:(i)係有機鹼;(ii)係三級胺鹼;(iii)選自N-甲基-嗎啉、二異丙基乙胺及三乙胺;或(iv)係N-甲基-嗎啉。The method of claim 53, wherein the base: (i) is an organic base; (ii) is a tertiary amine base; (iii) is selected from N-methyl-morpholine, diisopropylethylamine and triethylamine ; Or (iv) is N-methyl-morpholine. 如請求項52至54中任一項之方法,其中該偶合劑:(i)選自丙烷膦酸酐;1-[雙(二甲胺基)亞甲基]-1H-1,2,3-三唑并[4,5-b]吡啶鎓3-氧化六氟磷酸鹽;2-(1H-苯并三唑-1-基)-1,1,3,3-四甲基
Figure 108105242-A0101-12-0011
六氟磷酸鹽;N,N'-二環己基碳化二亞胺;苯并三唑-1-基氧基)參(二甲胺基)鏻六氟磷酸鹽;苯并三唑-1-基-氧基三吡咯啶基鏻六氟磷酸鹽;1,1'-羰基二咪唑;1-乙基-3-(3-二甲胺基丙基)碳化二亞胺及羥基苯并三唑;及1-乙基-3-(3-二甲胺基丙基)碳化二亞胺及4-二甲胺基吡啶;或(ii)係丙烷膦酸酐。
The method according to any one of claims 52 to 54, wherein the coupling agent: (i) is selected from propanephosphonic anhydride; 1-[bis(dimethylamino)methylene]-1H-1,2,3- Triazolo[4,5-b]pyridinium 3-oxide hexafluorophosphate; 2-(1H-benzotriazol-1-yl)-1,1,3,3-tetramethyl
Figure 108105242-A0101-12-0011
Hexafluorophosphate; N,N'-dicyclohexylcarbodiimide; benzotriazol-1-yloxy) ginseng (dimethylamino)phosphonium hexafluorophosphate; benzotriazol-1-yl -Oxytripyrrolidinylphosphonium hexafluorophosphate; 1,1'-carbonyldiimidazole; 1-ethyl-3-(3-dimethylaminopropyl) carbodiimide and hydroxybenzotriazole; And 1-ethyl-3-(3-dimethylaminopropyl) carbodiimide and 4-dimethylaminopyridine; or (ii) propanephosphonic anhydride.
如請求項52至55中任一項之方法,其中形成化合物5之溶劑:(i)係極性非質子溶劑;(ii)選自以下中之一或多者:2-甲基四氫呋喃、四氫呋喃、乙酸乙酯、乙酸丙酯、丙酮、二甲基甲醯胺、乙腈及二甲亞碸;或(iii)選自乙酸乙酯及乙酸丙酯中之一者或兩者。The method according to any one of claims 52 to 55, wherein the solvent forming Compound 5: (i) is a polar aprotic solvent; (ii) is selected from one or more of the following: 2-methyltetrahydrofuran, tetrahydrofuran, Ethyl acetate, propyl acetate, acetone, dimethylformamide, acetonitrile, and dimethyl sulfoxide; or (iii) one or both selected from ethyl acetate and propyl acetate. 如請求項56之方法,其中形成化合物5之步驟進一步包含: (i) 由該極性非質子溶劑交換成極性質子溶劑,及 (ii) 藉由添加反溶劑,使固體化合物5沈澱。The method of claim 56, wherein the step of forming compound 5 further comprises: (i) exchange of the polar aprotic solvent into a polar protic solvent, and (ii) The solid compound 5 is precipitated by adding an anti-solvent. 如請求項57之方法,其中形成化合物5之步驟中之該極性質子溶劑:(i)選自以下中之一或多者:甲醇、乙醇、1-丙醇、2-丙醇、1-丁醇、甲酸及乙酸;(ii)選自以下中之一或多者:甲醇、乙醇、1-丙醇及2-丙醇;或(iii)係乙醇。The method of claim 57, wherein the polar protic solvent in the step of forming compound 5: (i) is selected from one or more of the following: methanol, ethanol, 1-propanol, 2-propanol, 1- Butanol, formic acid and acetic acid; (ii) one or more selected from the group consisting of methanol, ethanol, 1-propanol and 2-propanol; or (iii) ethanol. 如請求項52至58中任一項之方法,其中該酸性脫除保護基劑係:(i)有機酸或無機酸;(ii)醯基鹵化物或無機酸;(iii)選自乙醯氯、甲醯氯、丙醯氯及丁醯氯之醯基氯化物或選自鹽酸及硫酸之無機酸;或(iv)係乙醯氯。The method according to any one of claims 52 to 58, wherein the acidic deprotecting base agent is: (i) an organic acid or an inorganic acid; (ii) an acyl halide or an inorganic acid; (iii) selected from acetyl Chloride, methyl chloride, propyl chloride and butyl chloride's acetyl chloride or inorganic acid selected from hydrochloric acid and sulfuric acid; or (iv) is acetyl chloride. 如請求項52至59中任一項之方法,其中使化合物5脫除保護基之溶劑:(i)包含或係極性質子溶劑;(ii)選自以下中之一或多者:甲醇、乙醇、1-丙醇、2-丙醇、1-丁醇、甲酸及乙酸;(iii)選自以下中之一或多者:甲醇、乙醇、1 -丙醇及2-丙醇;或(iv)係1-丙醇。The method according to any one of claims 52 to 59, wherein the solvent for deprotecting compound 5: (i) contains or is a polar protic solvent; (ii) is selected from one or more of the following: methanol, Ethanol, 1-propanol, 2-propanol, 1-butanol, formic acid and acetic acid; (iii) one or more selected from the group consisting of methanol, ethanol, 1 -propanol and 2-propanol; or ( iv) is 1-propanol. 如請求項52至60中任一項之方法,其中化合物6呈溶液形式且該方法進一步包含藉由添加反溶劑形成固體化合物6之漿料,其中該反溶劑:(i)具有小於2之介電常數;(ii)選自以下中之一或多者:正戊烷、正己烷、正庚烷及環戊烷;或(iii)係正庚烷。The method of any one of claims 52 to 60, wherein compound 6 is in the form of a solution and the method further comprises forming a slurry of solid compound 6 by adding an anti-solvent, wherein the anti-solvent: (i) has less than 2 Electrical constant; (ii) one or more selected from the group consisting of n-pentane, n-hexane, n-heptane, and cyclopentane; or (iii) n-heptane. 如請求項52至61中任一項之方法,其進一步包含形成化合物3,該方法包含: (i) 根據以下步驟2,使化合物1與磺化劑在溶劑中反應以形成化合物2,其中Y係芳基磺醯基或烷基磺醯基
Figure 03_image117
;及 (ii) 根據以下步驟,使化合物2與氮源在溶劑中反應以形成化合物3,其中化合物3係游離鹼
Figure 03_image119
The method of any one of claims 52 to 61, further comprising forming compound 3, the method comprising: (i) reacting compound 1 with a sulfonating agent in a solvent to form compound 2 according to the following step 2, wherein Y Arylsulfonyl or alkylsulfonyl
Figure 03_image117
; And (ii) according to the following steps, reacting compound 2 with a nitrogen source in a solvent to form compound 3, wherein compound 3 is the free base
Figure 03_image119
.
如請求項62之方法,其中該磺化劑:(i)係磺酸酯;(ii)選自甲磺醯氯及甲苯磺醯氯;或(iii)係甲磺醯氯。The method of claim 62, wherein the sulfonating agent: (i) is a sulfonate; (ii) is selected from mesylate chloride and tosylate chloride; or (iii) is mesylate chloride. 如請求項62或63之方法,其中形成化合物2之混合物進一步包含鹼。The method of claim 62 or 63, wherein the mixture of compound 2 is formed further comprising a base. 如請求項64之方法,其中該鹼係胺鹼,或選自三甲胺、二異丙基乙胺、三丁胺及辛胺之胺鹼。The method of claim 64, wherein the base is an amine base, or an amine base selected from trimethylamine, diisopropylethylamine, tributylamine, and octylamine. 如請求項62至65中任一項之方法,其中該形成化合物2之反應的溶劑:(i)係極性非質子溶劑;(ii)選自以下中之一或多者:2-甲基四氫呋喃、四氫呋喃、乙酸乙酯、乙酸丙酯、丙酮、二甲基甲醯胺、乙腈及二甲亞碸;(iii)選自2-甲基四氫呋喃、四氫呋喃;或(iv)係2-甲基四氫呋喃。The method according to any one of claims 62 to 65, wherein the solvent for the reaction for forming Compound 2: (i) is a polar aprotic solvent; (ii) is selected from one or more of the following: 2-methyltetrahydrofuran , Tetrahydrofuran, ethyl acetate, propyl acetate, acetone, dimethylformamide, acetonitrile, and dimethylsulfoxide; (iii) selected from 2-methyltetrahydrofuran, tetrahydrofuran; or (iv) 2-methyltetrahydrofuran . 如請求項62至66中任一項之方法,其中該形成化合物3之反應的氮源係氨或銨鹽。The method according to any one of claims 62 to 66, wherein the nitrogen source of the compound 3 forming reaction is ammonia or ammonium salt. 如請求項62至67中任一項之方法,其中該形成化合物3之反應的溶劑:(i)包含或係極性有機溶劑;(ii)選自以下中之一或多者:甲醇、乙醇、1-丙醇、2-丙醇、1-丁醇、甲酸、乙酸、2-甲基四氫呋喃、四氫呋喃、乙酸乙酯、乙酸丙酯、丙酮、二甲基甲醯胺、乙腈及二甲亞碸;(iii)選自以下中之一或多者:甲醇、乙醇、1-丙醇及2-丙醇;或(iv)係甲醇。The method according to any one of claims 62 to 67, wherein the solvent for the reaction of forming compound 3: (i) contains or is a polar organic solvent; (ii) is selected from one or more of the following: methanol, ethanol, 1-propanol, 2-propanol, 1-butanol, formic acid, acetic acid, 2-methyltetrahydrofuran, tetrahydrofuran, ethyl acetate, propyl acetate, acetone, dimethylformamide, acetonitrile and dimethylsulfoxide ; (Iii) one or more of the following: methanol, ethanol, 1-propanol and 2-propanol; or (iv) methanol. 如請求項62至68中任一項之方法,其進一步包含純化步驟,其中化合物3藉由以下次序之步驟純化: (i) 由該形成化合物3之反應的溶劑交換成介電常數大於2之非極性溶劑,以形成化合物3於該非極性溶劑中之第一溶液; (ii) 藉由添加酸,使固體化合物3自溶液中沈澱,之後分離固體化合物3及視情況洗滌所分離之固體化合物3; (iii) 藉由添加鹼,使化合物3溶解於介電常數大於2之非極性溶劑中,以形成化合物3於該非極性溶劑中之第二溶液; (iv) 藉由添加反溶劑,使固體化合物3游離鹼自該第二溶液中沈澱,藉由移除非極性溶劑來濃縮,或其組合;及 (v) 分離純化之化合物3游離鹼。The method according to any one of claims 62 to 68, further comprising a purification step, wherein compound 3 is purified by the following sequence of steps: (i) The solvent of the reaction to form compound 3 is exchanged into a non-polar solvent having a dielectric constant greater than 2 to form a first solution of compound 3 in the non-polar solvent; (ii) By adding an acid, the solid compound 3 is precipitated from the solution, and then the solid compound 3 is separated and the separated solid compound 3 is optionally washed; (iii) by adding a base, compound 3 is dissolved in a non-polar solvent with a dielectric constant greater than 2 to form a second solution of compound 3 in the non-polar solvent; (iv) by adding an anti-solvent, the solid compound 3 free base is precipitated from the second solution, concentrated by removing the non-polar solvent, or a combination thereof; and (v) Separation and purification of compound 3 free base. 如請求項69之方法,其中該介電常數大於2之非極性溶劑:(i)選自以下中之一或多者:甲基第三丁基醚、二乙醚、甲苯、1,4-二噁烷及三氯甲烷;(ii)選自甲基第三丁基醚及二乙醚中之一者或兩者;或(iii)係甲基第三丁基醚。The method of claim 69, wherein the non-polar solvent having a dielectric constant greater than 2: (i) is selected from one or more of the following: methyl tertiary butyl ether, diethyl ether, toluene, 1,4-bis Oxane and chloroform; (ii) one or both selected from methyl tertiary butyl ether and diethyl ether; or (iii) methyl tertiary butyl ether. 如請求項69或70之方法,其中該使化合物3沈澱之酸係:(i)有機酸;(ii)係羧酸;(iii)選自以下中之一或多者:甲酸、草酸、丙二酸、丁二酸、戊二酸、丁二酸及己二酸;或(iv)係草酸。The method of claim 69 or 70, wherein the acid that precipitates compound 3 is: (i) an organic acid; (ii) a carboxylic acid; (iii) one or more selected from the group consisting of formic acid, oxalic acid, and propylene Diacid, succinic acid, glutaric acid, succinic acid and adipic acid; or (iv) oxalic acid. 如請求項69至71中任一項之方法,其中該反溶劑:(i)具有小於2之介電常數;(ii)選自以下中之一或多者:正戊烷、正己烷、正庚烷及環戊烷;或(iii)係正庚烷。The method according to any one of claims 69 to 71, wherein the antisolvent: (i) has a dielectric constant less than 2; (ii) is selected from one or more of the following: n-pentane, n-hexane, n-hexane Heptane and cyclopentane; or (iii) n-heptane. 如請求項62至72中任一項之方法,其中以化合物1計,化合物3之產率係至少30%、至少40%、至少50%、至少60%、至少70%或至少80%。The method of any one of claims 62 to 72, wherein the yield of compound 3 based on compound 1 is at least 30%, at least 40%, at least 50%, at least 60%, at least 70%, or at least 80%. 如請求項52至73中任一項之方法,其中: (i) 化合物4具有結構4(a)
Figure 03_image121
化合物4(a) ;且 (ii) 化合物5具有結構5(a)
Figure 03_image123
化合物5(a)。
The method according to any one of claims 52 to 73, wherein: (i) Compound 4 has the structure 4(a)
Figure 03_image121
Compound 4(a); and (ii) Compound 5 has structure 5(a)
Figure 03_image123
Compound 5(a).
如請求項38至74中任一項之方法,其中: (i) 化合物6具有結構6(a)
Figure 03_image125
化合物6(a);且 (ii) 化合物(I)具有結構I(a):
Figure 03_image127
化合物I(a)。
The method according to any one of claims 38 to 74, wherein: (i) Compound 6 has the structure 6(a)
Figure 03_image125
Compound 6(a); and (ii) Compound (I) has structure I(a):
Figure 03_image127
Compound I(a).
一種結晶(2S ,4R ,5S )-4-氟-1-(4-氟苯磺醯基)-5-甲基-N -((5-(三氟甲基)-2-(2-(三氟甲基)嘧啶-5-基)吡啶-4-基)甲基)吡咯啶-2-甲醯胺化合物。A crystal (2 S ,4 R ,5 S )-4-fluoro-1-(4-fluorobenzenesulfonyl)-5-methyl- N -((5-(trifluoromethyl)-2-( 2-(trifluoromethyl)pyrimidin-5-yl)pyridin-4-yl)methyl)pyrrolidin-2-carboxamide compound. 如請求項76之化合物,其中該化合物係游離鹼無水物多晶型物E型,其展現之XRPD圖案具有至少三個、至少四個或至少五個在以2θ度表示之如下角度處之特徵峰:7.5°±0.2°、8.2°±0.2°、12.6°±0.2°、13.1°±0.2°、13.4°±0.2°、14.7°±0.2°、15.1°±0.2°、15.5°±0.2°、16.1°±0.2°、16.6°±0.2°、18.2°±0.2°、18.9°±0.2°、19.9°±0.2°、20.4°±0.2°、21.0°±0.2°、21.5°±0.2°、21.8°±0.2°、22.4°±0.2°、22.7°±0.2°、24.3°±0.2°、25.0°±0.2°、25.4°±0.2°及28.4°±0.2°。A compound as claimed in claim 76, wherein the compound is the free base anhydrous polymorph E, and exhibits an XRPD pattern having at least three, at least four, or at least five features at the following angles expressed in degrees 2θ Peak: 7.5°±0.2°, 8.2°±0.2°, 12.6°±0.2°, 13.1°±0.2°, 13.4°±0.2°, 14.7°±0.2°, 15.1°±0.2°, 15.5°±0.2°, 16.1°±0.2°, 16.6°±0.2°, 18.2°±0.2°, 18.9°±0.2°, 19.9°±0.2°, 20.4°±0.2°, 21.0°±0.2°, 21.5°±0.2°, 21.8° ±0.2°, 22.4°±0.2°, 22.7°±0.2°, 24.3°±0.2°, 25.0°±0.2°, 25.4°±0.2° and 28.4°±0.2°. 如請求項76或77之化合物,其中該化合物係具有根據圖10之粉末X射線繞射圖案之游離鹼無水物多晶型物E型。A compound according to claim 76 or 77, wherein the compound is a free base anhydrous polymorph E form having a powder X-ray diffraction pattern according to FIG. 如請求項76至78中任一項之化合物,其中該化合物係具有根據圖11之熱重分析曲線及/或差示掃描熱量測定法曲線之游離鹼無水物多晶型物E型。The compound according to any one of claims 76 to 78, wherein the compound is a free base anhydrous polymorph E form having a thermogravimetric analysis curve and/or a differential scanning calorimetry curve according to FIG. 11. 如請求項76之化合物,其中該化合物係游離鹼水合物多晶型物A型,其展現之XRPD圖案具有至少三個、至少四個或至少五個在如下以2θ度表示之角度處之特徵峰:7.2°±0.2°、12.2°±0.2°、14.0°±0.2°、14.2°±0.2°、15.5°±0.2°、15.8°±0.2°、17.0°±0.2°、17.2°±0.2°、18.4°±0.2°、21.3°±0.2°、21.6°±0.2°、22.2°±0.2°、23.4°±0.2°、24.4°±0.2°及25.2°±0.2°。A compound as claimed in claim 76, wherein the compound is free base hydrate polymorph Form A, and exhibits an XRPD pattern having at least three, at least four, or at least five features at an angle expressed as 2θ degrees as follows Peak: 7.2°±0.2°, 12.2°±0.2°, 14.0°±0.2°, 14.2°±0.2°, 15.5°±0.2°, 15.8°±0.2°, 17.0°±0.2°, 17.2°±0.2°, 18.4°±0.2°, 21.3°±0.2°, 21.6°±0.2°, 22.2°±0.2°, 23.4°±0.2°, 24.4°±0.2° and 25.2°±0.2°. 如請求項76或80之化合物,其中該化合物係具有根據圖6之粉末X射線繞射圖案之游離鹼水合物多晶型物A型。A compound according to claim 76 or 80, wherein the compound is a free base hydrate polymorph Form A having a powder X-ray diffraction pattern according to FIG. 6. 如請求項76、80或81中任一項之化合物,其中該化合物係具有根據圖7之熱重分析曲線及/或差示掃描熱量測定法曲線之游離鹼水合物多晶型物A型。The compound of any one of claims 76, 80, or 81, wherein the compound is a free base hydrate polymorph Form A having a thermogravimetric analysis curve and/or a differential scanning calorimetry curve according to FIG. 7. 如請求項76之化合物,其中該化合物係游離鹼二甲基乙醯胺溶劑合物多晶型物C型,其展現之XRPD圖案具有至少三個、至少四個或至少五個在如下以2θ度表示之角度處之特徵峰:10.8°±0.2°、12.1°±0.2°、12.3°±0.2°、13.6°±0.2°、13.8°±0.2°、14.9°±0.2°、16.0°±0.2°、16.2°±0.2°、17.1°±0.2°、18.2°±0.2°、21.2°±0.2°、21.5°±0.2°、22.4°±0.2°、21.2°±0.2°、23.5°±0.2°、24.2°±0.2°、25.2°±0.2°、27.2°±0.2°。The compound according to claim 76, wherein the compound is the free base dimethylacetamide solvate polymorph Form C, which exhibits at least three, at least four, or at least five XRPD patterns at 2θ as follows Characteristic peaks at angles expressed in degrees: 10.8°±0.2°, 12.1°±0.2°, 12.3°±0.2°, 13.6°±0.2°, 13.8°±0.2°, 14.9°±0.2°, 16.0°±0.2° , 16.2°±0.2°, 17.1°±0.2°, 18.2°±0.2°, 21.2°±0.2°, 21.5°±0.2°, 22.4°±0.2°, 21.2°±0.2°, 23.5°±0.2°, 24.2 °±0.2°, 25.2°±0.2°, 27.2°±0.2°. 如請求項76或83之化合物,其中該化合物係具有根據圖25之粉末X射線繞射圖案之游離鹼二甲基乙醯胺溶劑合物多晶型物C型。The compound according to claim 76 or 83, wherein the compound is a free base dimethylacetamide solvate polymorph Form C having a powder X-ray diffraction pattern according to FIG. 25. 如請求項76、83或84中任一項之化合物,其中該化合物係具有根據圖26之熱重分析曲線及/或差示掃描熱量測定法曲線之游離鹼二甲基乙醯胺溶劑合物多晶型物C型。The compound according to any one of claims 76, 83, or 84, wherein the compound is a free base dimethylacetamide solvate having a thermogravimetric analysis curve and/or a differential scanning calorimetry curve according to FIG. 26 Polymorph C type. 如請求項76之化合物,其中該化合物係游離鹼苯甲醚溶劑合物多晶型物D型,其展現之XRPD圖案具有至少三個、至少四個或至少五個在如下以2θ度表示之角度處之特徵峰:5.7°±0.2°、12.8°±0.2°、15.4°±0.2°、17.1°±0.2°、18.1°±0.2°及20.8°±0.2°。A compound as claimed in claim 76, wherein the compound is the free base anisole solvate polymorph Form D, which exhibits at least three, at least four, or at least five XRPD patterns expressed as 2θ degrees below Characteristic peaks at angles: 5.7°±0.2°, 12.8°±0.2°, 15.4°±0.2°, 17.1°±0.2°, 18.1°±0.2° and 20.8°±0.2°. 如請求項76或86之化合物,其中該化合物係具有根據圖28之粉末X射線繞射圖案之游離鹼苯甲醚溶劑合物多晶型物D型。A compound according to claim 76 or 86, wherein the compound is a free base anisole solvate polymorph D form having a powder X-ray diffraction pattern according to FIG. 28. 如請求項76、86或87中任一項之化合物,其中該化合物係具有根據圖29之熱重分析曲線及/或差示掃描熱量測定法曲線之游離鹼苯甲醚溶劑合物多晶型物D型。The compound according to any one of claims 76, 86, or 87, wherein the compound is a free base anisole solvate polymorph having a thermogravimetric analysis curve and/or a differential scanning calorimetry curve according to FIG. 29 Type D. 如請求項76之化合物,其中該化合物係游離鹼乙醇溶劑合物多晶型物F型,其展現之XRPD圖案具有至少三個、至少四個或至少五個在如下以2θ度表示之角度處之特徵峰:11.7°±0.2°、12.9°±0.2°、13.3°±0.2°、17.4°±0.2°、18.5°±0.2°、19.4°±0.2°、23.5°±0.2°、24.3°±0.2°及25.9°±0.2°。A compound as claimed in claim 76, wherein the compound is a free base ethanol solvate polymorph Form F, which exhibits at least three, at least four, or at least five XRPD patterns at an angle expressed as 2θ degrees as follows The characteristic peaks: 11.7°±0.2°, 12.9°±0.2°, 13.3°±0.2°, 17.4°±0.2°, 18.5°±0.2°, 19.4°±0.2°, 23.5°±0.2°, 24.3°±0.2 ° and 25.9°±0.2°. 如請求項76或89之化合物,其中該化合物係具有根據圖32之粉末X射線繞射圖案之游離鹼乙醇溶劑合物多晶型物F型。A compound according to claim 76 or 89, wherein the compound is a free base ethanol solvate polymorph Form F having a powder X-ray diffraction pattern according to FIG. 32. 如請求項76、89或90中任一項之化合物,其中該化合物係具有根據圖33之熱重分析曲線及/或差示掃描熱量測定法曲線之游離鹼乙醇溶劑合物多晶型物F型。The compound according to any one of claims 76, 89, or 90, wherein the compound is a free base ethanol solvate polymorph F having a thermogravimetric analysis curve and/or a differential scanning calorimetry curve according to FIG. 33 type. 如請求項76之化合物,其中該化合物係游離鹼甲苯溶劑合物多晶型物G型,其展現之XRPD圖案具有至少三個、至少四個或至少五個在如下以2θ度表示之角度處之特徵峰:13.8°±0.2°、16.7°±0.2°、17.6°±0.2°、17.8°±0.2°、18.8°±0.2°、22.5°±0.2°及25.1°±0.2°。The compound of claim 76, wherein the compound is the free base toluene solvate polymorph Form G, which exhibits at least three, at least four, or at least five XRPD patterns at an angle expressed as 2θ degrees as follows The characteristic peaks: 13.8°±0.2°, 16.7°±0.2°, 17.6°±0.2°, 17.8°±0.2°, 18.8°±0.2°, 22.5°±0.2° and 25.1°±0.2°. 如請求項76或92之化合物,其中該化合物係具有根據圖36之粉末X射線繞射圖案之游離鹼甲苯溶劑合物多晶型物G型。A compound according to claim 76 or 92, wherein the compound is a free base toluene solvate polymorph Form G having a powder X-ray diffraction pattern according to FIG. 36. 如請求項76、92或93中任一項之化合物,其中該化合物係具有根據圖37之熱重分析曲線及/或差示掃描熱量測定法曲線之游離鹼甲苯溶劑合物多晶型物G型。The compound according to any one of claims 76, 92 or 93, wherein the compound is a free base toluene solvate polymorph G having a thermogravimetric analysis curve and/or a differential scanning calorimetry curve according to FIG. 37 type. 如請求項76之化合物,其中該化合物係游離鹼異丙醇溶劑合物多晶型物H型,其展現之XRPD圖案具有至少三個、至少四個或至少五個在如下以2θ度表示之角度處之特徵峰:11.5°±0.2°、12.8°±0.2°、13.1°±0.2°、17.5°±0.2°、18.2°±0.2°、22.3°±0.2°、23.2°±0.2°及24.0°±0.2°。A compound as claimed in claim 76, wherein the compound is a free base isopropanol solvate polymorph Form H, which exhibits at least three, at least four, or at least five XRPD patterns expressed in 2θ degrees as follows Characteristic peaks at angles: 11.5°±0.2°, 12.8°±0.2°, 13.1°±0.2°, 17.5°±0.2°, 18.2°±0.2°, 22.3°±0.2°, 23.2°±0.2° and 24.0° ±0.2°. 如請求項76或95之化合物,其中該化合物係具有根據圖40之粉末X射線繞射圖案之游離鹼異丙醇溶劑合物多晶型物H型。A compound according to claim 76 or 95, wherein the compound is a free base isopropyl alcohol solvate polymorph H form having a powder X-ray diffraction pattern according to FIG. 40. 如請求項76、95或96中任一項之化合物,其中該化合物係具有根據圖41之熱重分析曲線及/或差示掃描熱量測定法曲線之游離鹼異丙醇溶劑合物多晶型物H型。The compound according to any one of claims 76, 95, or 96, wherein the compound is a free base isopropyl alcohol solvate polymorph having a thermogravimetric analysis curve and/or a differential scanning calorimetry curve according to FIG. 41物H型。 Type H. 如請求項76之化合物,其中該化合物係游離鹼1-丁醇溶劑合物多晶型物I型,其展現之XRPD圖案具有至少三個、至少四個或至少五個在如下以2θ度表示之角度處之特徵峰:12.0°±0.2°、12.4°±0.2°、12.6°±0.2°、13.3°±0.2°、14.0°±0.2°、15.1°±0.2°、17.2°±0.2°、17.9°±0.2°、18.3°±0.2°、19.7°±0.2°、19.9°±0.2°、23.1°±0.2°、24.3°±0.2°、25.4°±0.2°、25.9°±0.2°及27.3°±0.2°。The compound according to claim 76, wherein the compound is the free base 1-butanol solvate polymorph Form I, which exhibits an XRPD pattern with at least three, at least four, or at least five expressed in 2θ degrees as follows Characteristic peaks at angles: 12.0°±0.2°, 12.4°±0.2°, 12.6°±0.2°, 13.3°±0.2°, 14.0°±0.2°, 15.1°±0.2°, 17.2°±0.2°, 17.9 °±0.2°, 18.3°±0.2°, 19.7°±0.2°, 19.9°±0.2°, 23.1°±0.2°, 24.3°±0.2°, 25.4°±0.2°, 25.9°±0.2° and 27.3°± 0.2°. 如請求項76或98之化合物,其中該化合物係具有根據圖44之粉末X射線繞射圖案之游離鹼1-丁醇溶劑合物多晶型物I型。A compound according to claim 76 or 98, wherein the compound is a free base 1-butanol solvate polymorph Form I having a powder X-ray diffraction pattern according to FIG. 44. 如請求項76、98或99中任一項之化合物,其中該化合物係根據圖45之熱重分析曲線及/或差示掃描熱量測定法曲線之游離鹼1-丁醇溶劑合物多晶型物I型。A compound according to any one of claims 76, 98 or 99, wherein the compound is the free base 1-butanol solvate polymorph according to the thermogravimetric analysis curve and/or the differential scanning calorimetry curve of FIG. 45物I型。 Type I. 如請求項76之化合物,其中該化合物係游離鹼2-甲基四氫呋喃溶劑合物多晶型物J型,其展現之XRPD圖案具有至少三個、至少四個或至少五個在如下以2θ度表示之角度處之特徵峰:11.8°±0.2°、13.1°±0.2°、14.5°±0.2°、16.8°±0.2°、18.4°±0.2°、19.4°±0.2°、20.7°±0.2°、21.8°±0.2°、24.3°±0.2°及26.4°±0.2°。The compound of claim 76, wherein the compound is the free base 2-methyltetrahydrofuran solvate polymorph Form J, which exhibits an XRPD pattern with at least three, at least four, or at least five at 2θ degrees as follows Characteristic peaks at the indicated angles: 11.8°±0.2°, 13.1°±0.2°, 14.5°±0.2°, 16.8°±0.2°, 18.4°±0.2°, 19.4°±0.2°, 20.7°±0.2°, 21.8°±0.2°, 24.3°±0.2° and 26.4°±0.2°. 如請求項76或101之化合物,其中該化合物係具有根據圖47之粉末X射線繞射圖案之游離鹼2-甲基四氫呋喃溶劑合物多晶型物J型。A compound according to claim 76 or 101, wherein the compound is a free base 2-methyltetrahydrofuran solvate polymorph Form J having a powder X-ray diffraction pattern according to FIG. 47. 如請求項76、101或102中任一項之化合物,其中該化合物係具有根據圖48之熱重分析曲線及/或差示掃描熱量測定法曲線之游離鹼2-甲基四氫呋喃溶劑合物多晶型物J型。The compound according to any one of claims 76, 101 or 102, wherein the compound is a free base 2-methyltetrahydrofuran solvate having a thermogravimetric analysis curve and/or a differential scanning calorimetry curve according to FIG. 48 Crystal type J. 如請求項76之化合物,其中該化合物係游離鹼四氫呋喃溶劑合物多晶型物K型,其展現之XRPD圖案具有至少三個、至少四個或至少五個在如下以2θ度表示之角度處之特徵峰:11.0°±0.2°、12.0°±0.2°、12.4°±0.2°、12.6°±0.2°、13.3°±0.2°、13.5°±0.2°、14.1°±0.2°、14.7°±0.2° 、17.2°±0.2°、18.5°±0.2°、19.5°±0.2°、20.9°±0.2°、21.4°±0.2°、21.6°±0.2°、22.0°±0.2°、22.2°±0.2°、22.9°±0.2°、24.8°±0.2°、27.1°±0.2°、27.4°±0.2°及28.3°±0.2°。A compound as claimed in claim 76, wherein the compound is the free base tetrahydrofuran solvate polymorph Form K, and exhibits an XRPD pattern having at least three, at least four, or at least five at an angle expressed as 2θ degrees as follows The characteristic peaks: 11.0°±0.2°, 12.0°±0.2°, 12.4°±0.2°, 12.6°±0.2°, 13.3°±0.2°, 13.5°±0.2°, 14.1°±0.2°, 14.7°±0.2 °, 17.2°±0.2°, 18.5°±0.2°, 19.5°±0.2°, 20.9°±0.2°, 21.4°±0.2°, 21.6°±0.2°, 22.0°±0.2°, 22.2°±0.2°, 22.9°±0.2°, 24.8°±0.2°, 27.1°±0.2°, 27.4°±0.2° and 28.3°±0.2°. 如請求項76或104之化合物,其中該化合物係具有根據圖50之粉末X射線繞射圖案之游離鹼四氫呋喃溶劑合物多晶型物K型。The compound according to claim 76 or 104, wherein the compound is a free base tetrahydrofuran solvate polymorph K form having a powder X-ray diffraction pattern according to FIG. 50. 如請求項76、104或105中任一項之化合物,其中該化合物係具有根據圖51之熱重分析曲線及/或差示掃描熱量測定法曲線之游離鹼四氫呋喃溶劑合物多晶型物K型。The compound according to any one of claims 76, 104, or 105, wherein the compound is a free base tetrahydrofuran solvate polymorph K having a thermogravimetric analysis curve and/or a differential scanning calorimetry curve according to FIG. 51 type. 如請求項76之化合物,其中該化合物係游離鹼異丁醇溶劑合物多晶型物L型,其展現之XRPD圖案具有至少三個、至少四個或至少五個在如下以2θ度表示之角度處之特徵峰:11.6°±0.2°、12.8°±0.2°、13.1°±0.2°、14.2°±0.2°、17.5°±0.2°、18.1°±0.2°、22.8°±0.2°、23.1°±0.2°、24.0°±0.2°及25.3°±0.2°。A compound as claimed in claim 76, wherein the compound is the free base isobutanol solvate polymorph L form, which exhibits at least three, at least four, or at least five XRPD patterns expressed as 2θ degrees below Characteristic peaks at angles: 11.6°±0.2°, 12.8°±0.2°, 13.1°±0.2°, 14.2°±0.2°, 17.5°±0.2°, 18.1°±0.2°, 22.8°±0.2°, 23.1° ±0.2°, 24.0°±0.2° and 25.3°±0.2°. 如請求項76或107之化合物,其中該化合物係具有根據圖53之粉末X射線繞射圖案之游離鹼異丁醇溶劑合物多晶型物L型。A compound according to claim 76 or 107, wherein the compound is a free base isobutanol solvate polymorph L form having a powder X-ray diffraction pattern according to FIG. 53. 如請求項76、107或108中任一項之化合物,其中該化合物係具有根據圖54之熱重分析曲線及/或差示掃描熱量測定法曲線之游離鹼異丁醇溶劑合物多晶型物L型。A compound according to any one of claims 76, 107 or 108, wherein the compound is a free base isobutanol solvate polymorph having a thermogravimetric analysis curve and/or a differential scanning calorimetry curve according to FIG. 54物L型。 Object L type. 如請求項76之化合物,其中該化合物係游離鹼二甲亞碸溶劑合物多晶型物M型,其展現之XRPD圖案具有至少三個、至少四個或至少五個在如下以2θ度表示之角度處之特徵峰:12.1°±0.2°、13.4°±0.2°、14.7°±0.2°、18.4°±0.2°、20.9°±0.2°、21.5°±0.2°、24.9°±0.2°、26.8°±0.2°及27.6°±0.2°。A compound as claimed in claim 76, wherein the compound is the free base dimethyl sulfoxide solvate polymorph Form M, which exhibits at least three, at least four, or at least five XRPD patterns expressed as 2θ degrees below Characteristic peaks at angles: 12.1°±0.2°, 13.4°±0.2°, 14.7°±0.2°, 18.4°±0.2°, 20.9°±0.2°, 21.5°±0.2°, 24.9°±0.2°, 26.8 °±0.2° and 27.6°±0.2°. 如請求項76或110之化合物,其中該化合物係具有根據圖56之粉末X射線繞射圖案之游離鹼二甲亞碸溶劑合物多晶型物M型。The compound of claim 76 or 110, wherein the compound is a free base dimethyl sulfoxide solvate polymorph M form having a powder X-ray diffraction pattern according to FIG. 56. 如請求項76、110或111中任一項之化合物,其中該化合物係具有根據圖57之熱重分析曲線及/或差示掃描熱量測定法曲線之游離鹼二甲亞碸溶劑合物多晶型物M型。The compound according to any one of claims 76, 110 or 111, wherein the compound is a free base dimethyl sulfoxide solvate polycrystal having a thermogravimetric analysis curve and/or a differential scanning calorimetry curve according to FIG. 57 Type M type. 如請求項76之化合物,其中該化合物係無水龍膽酸共晶體多晶型物A型,其展現之XRPD圖案具有至少三個、至少四個或至少五個在如下以2θ度表示之角度處之特徵峰:12.5°±0.2°、13.0°±0.2°、14.4°±0.2°、15.7°±0.2°、17.5°±0.2°、21.7°±0.2°、25.5°±0.2°及26.3°±0.2°。The compound of claim 76, wherein the compound is an anhydrous gentisic acid eutectic polymorph Form A, and exhibits an XRPD pattern having at least three, at least four, or at least five at an angle expressed by 2θ degrees as follows The characteristic peaks: 12.5°±0.2°, 13.0°±0.2°, 14.4°±0.2°, 15.7°±0.2°, 17.5°±0.2°, 21.7°±0.2°, 25.5°±0.2° and 26.3°±0.2 °. 如請求項76或113之化合物,其中該化合物係具有根據圖66之粉末X射線繞射圖案之無水龍膽酸共晶體多晶型物A型。A compound as claimed in claim 76 or 113, wherein the compound is an anhydrous gentisic acid eutectic polymorph Form A having a powder X-ray diffraction pattern according to FIG. 66. 如請求項76、113或114中任一項之化合物,其中該化合物係具有根據圖67之熱重分析曲線及/或差示掃描熱量測定法曲線之無水龍膽酸共晶體多晶型物A型。The compound according to any one of claims 76, 113 or 114, wherein the compound is an anhydrous gentisic acid co-crystal polymorph A having a thermogravimetric analysis curve and/or a differential scanning calorimetry curve according to FIG. 67 type. 如請求項76之化合物,其中該化合物係無水龍膽酸共晶體多晶型物B型,其展現之XRPD圖案具有至少三個、至少四個或至少五個在如下以2θ度表示之角度處之特徵峰:6.6°±0.2°、7.9°±0.2°、12.2°±0.2°、12.4°±0.2°、14.0°±0.2°、15.1°±0.2°、16.3°±0.2°、21.1°±0.2°、25.3°±0.2°及25.6°±0.2°。The compound of claim 76, wherein the compound is an anhydrous gentisic acid eutectic polymorph Form B, and exhibits an XRPD pattern having at least three, at least four, or at least five at an angle expressed by 2θ degrees as follows Characteristic peaks: 6.6°±0.2°, 7.9°±0.2°, 12.2°±0.2°, 12.4°±0.2°, 14.0°±0.2°, 15.1°±0.2°, 16.3°±0.2°, 21.1°±0.2 °, 25.3°±0.2° and 25.6°±0.2°. 如請求項76或116之化合物,其中該化合物係具有根據圖69之粉末X射線繞射圖案之無水龍膽酸共晶體多晶型物B型。A compound as claimed in claim 76 or 116, wherein the compound is an anhydrous gentisic acid eutectic polymorph Form B having a powder X-ray diffraction pattern according to FIG. 69. 如請求項76之化合物,其中該化合物係水合吡啶甲醯胺共晶體多晶型物A型,其展現之XRPD圖案具有至少三個、至少四個或至少五個在如下以2θ度表示之角度處之特徵峰:12.1°±0.2°、12.4°±0.2°、14.5°±0.2°、15.8°±0.2°、18.1°±0.2°、19.1°±0.2°、22.0°±0.2°、24.5°±0.2°、25.6°±0.2°及26.6°±0.2°。A compound as claimed in claim 76, wherein the compound is hydrated pyridomethanamine co-crystal polymorph Form A, and exhibits an XRPD pattern having at least three, at least four, or at least five angles expressed in degrees 2θ as follows Characteristic peaks at: 12.1°±0.2°, 12.4°±0.2°, 14.5°±0.2°, 15.8°±0.2°, 18.1°±0.2°, 19.1°±0.2°, 22.0°±0.2°, 24.5°± 0.2°, 25.6°±0.2° and 26.6°±0.2°. 如請求項76或118之化合物,其中該化合物係具有根據圖78之粉末X射線繞射圖案之水合吡啶甲醯胺共晶體多晶型物A型。A compound as claimed in claim 76 or 118, wherein the compound is a form A hydrated pyridylcarboxamide eutectic polymorph having a powder X-ray diffraction pattern according to FIG. 78. 如請求項76、118或119中任一項之化合物,其中該化合物係具有根據圖79之熱重分析曲線及/或差示掃描熱量測定法曲線之水合吡啶甲醯胺共晶體多晶型物A型。The compound according to any one of claims 76, 118 or 119, wherein the compound is a pyridylformamide hydrate co-crystal polymorph having a thermogravimetric analysis curve and/or a differential scanning calorimetry curve according to FIG. 79 Type A. 如請求項76之化合物,其中該化合物係游離鹼無水物多晶型物AL型,其展現之XRPD圖案具有至少三個、至少四個或至少五個在如下以2θ度表示之角度處之特徵峰:7.6°±0.2°、8.4°±0.2°、13.2°±0.2°、13.8°±0.2°、14.8°±0.2°、15.2°±0.2°、15.6°±0.2°、15.9°±0.2°、16.9°±0.2°、18.1°±0.2°、20.5°±0.2°及21.3°±0.2°。A compound as claimed in claim 76, wherein the compound is the free base anhydrous polymorph AL, and exhibits an XRPD pattern having at least three, at least four, or at least five features at an angle expressed by 2θ degrees as follows Peak: 7.6°±0.2°, 8.4°±0.2°, 13.2°±0.2°, 13.8°±0.2°, 14.8°±0.2°, 15.2°±0.2°, 15.6°±0.2°, 15.9°±0.2°, 16.9°±0.2°, 18.1°±0.2°, 20.5°±0.2° and 21.3°±0.2°. 如請求項76或121之化合物,其中該化合物係具有根據圖81之粉末X射線繞射圖案之游離鹼無水物多晶型物AL型。A compound according to claim 76 or 121, wherein the compound is a free base anhydrous polymorph AL form having a powder X-ray diffraction pattern according to FIG. 81. 如請求項76、121或122中任一項之化合物,其中該化合物係具有根據圖82之熱重分析曲線及/或差示掃描熱量測定法曲線之游離鹼無水物多晶型物AL型。The compound according to any one of claims 76, 121, or 122, wherein the compound is a free base anhydrous polymorph AL form having a thermogravimetric analysis curve and/or a differential scanning calorimetry curve according to FIG. 82. 如請求項76之化合物,其中該化合物係游離鹼水合物多晶型物BO型,其展現之XRPD圖案具有至少三個、至少四個或至少五個在如下以2θ度表示之角度處之特徵峰:12.1°±0.2°、12.4°±0.2°、13.9°±0.2°、15.0°±0.2°、15.4°±0.2°、17.1°±0.2°、18.3°±0.2°、21.5°±0.2°、22.1°±0.2°、24.4°±0.2°、25.1°±0.2°、26.2°±0.2°及26.3°±0.2°。A compound as claimed in claim 76, wherein the compound is the free base hydrate polymorph BO form, which exhibits an XRPD pattern having at least three, at least four, or at least five features at an angle expressed by 2θ degrees as follows Peak: 12.1°±0.2°, 12.4°±0.2°, 13.9°±0.2°, 15.0°±0.2°, 15.4°±0.2°, 17.1°±0.2°, 18.3°±0.2°, 21.5°±0.2°, 22.1°±0.2°, 24.4°±0.2°, 25.1°±0.2°, 26.2°±0.2° and 26.3°±0.2°. 如請求項76或124之化合物,其中該化合物係具有根據圖84之粉末X射線繞射圖案之游離鹼水合物多晶型物BO型。A compound according to claim 76 or 124, wherein the compound is a free base hydrate polymorph BO form having a powder X-ray diffraction pattern according to FIG. 84. 如請求項76、124或125中任一項之化合物,其中該化合物係具有根據圖85之熱重分析曲線及/或差示掃描熱量測定法曲線之游離鹼水合物多晶型物BO型。The compound of any one of claims 76, 124, or 125, wherein the compound is a free base hydrate polymorph BO form having a thermogravimetric analysis curve and/or a differential scanning calorimetry curve according to FIG. 85. 如請求項76之化合物,其中該化合物係游離鹼正庚烷溶劑合物多晶型物BP型,其展現之XRPD圖案具有至少三個、至少四個或至少五個在如下以2θ度表示之角度處之特徵峰:8.5°±0.2°、12.9°±0.2°、17.6°±0.2°、18.1°±0.2°、19.4°±0.2°、20.8°±0.2°、21.2°±0.2°、22.9°±0.2°及24.0°±0.2°。A compound according to claim 76, wherein the compound is the free base n-heptane solvate polymorph BP form, which exhibits an XRPD pattern having at least three, at least four, or at least five expressed as 2θ degrees as follows Characteristic peaks at angles: 8.5°±0.2°, 12.9°±0.2°, 17.6°±0.2°, 18.1°±0.2°, 19.4°±0.2°, 20.8°±0.2°, 21.2°±0.2°, 22.9° ±0.2° and 24.0°±0.2°. 如請求項76或127之化合物,其中該化合物係具有根據圖87之粉末X射線繞射圖案之游離鹼正庚烷溶劑合物多晶型物BP型。The compound according to claim 76 or 127, wherein the compound is a free base n-heptane solvate polymorph BP form having a powder X-ray diffraction pattern according to FIG. 87. 如請求項76、127或128中任一項之化合物,其中該化合物係具有根據圖88之熱重分析曲線及/或差示掃描熱量測定法曲線之游離鹼正庚烷溶劑合物多晶型物BP型。The compound according to any one of claims 76, 127, or 128, wherein the compound is a free base n-heptane solvate polymorph having a thermogravimetric analysis curve and/or a differential scanning calorimetry curve according to FIG. 88 BP type. 如請求項76之化合物,其中該化合物係游離鹼2-戊醇溶劑合物多晶型物BK型,其展現之XRPD圖案具有至少三個、至少四個或至少五個在如下以2θ度表示之角度處之特徵峰:11.9°±0.2°、13.0°±0.2°、14.4°±0.2°、14.7°±0.2°、16.9°±0.2°、17.9°±0.2°、19.3°±0.2°、21.8°±0.2°、22.7°±0.2°、23.9°±0.2°、24.6°±0.2°及26.1°±0.2°。A compound as claimed in claim 76, wherein the compound is the free base 2-pentanol solvate polymorph form BK, which exhibits an XRPD pattern with at least three, at least four, or at least five expressed in 2θ degrees as follows Characteristic peaks at angles: 11.9°±0.2°, 13.0°±0.2°, 14.4°±0.2°, 14.7°±0.2°, 16.9°±0.2°, 17.9°±0.2°, 19.3°±0.2°, 21.8 °±0.2°, 22.7°±0.2°, 23.9°±0.2°, 24.6°±0.2° and 26.1°±0.2°. 如請求項76或130之化合物,其中該化合物係具有根據圖90之粉末X射線繞射圖案之游離鹼2-戊醇溶劑合物多晶型物BK型。A compound according to claim 76 or 130, wherein the compound is a free base 2-pentanol solvate polymorph BK form having a powder X-ray diffraction pattern according to FIG. 90. 如請求項76、130或131中任一項之化合物,其中該化合物係具有根據圖91之熱重分析曲線及/或差示掃描熱量測定法曲線之游離鹼2-戊醇溶劑合物多晶型物BK型。The compound according to any one of claims 76, 130, or 131, wherein the compound is a free base 2-pentanol solvate polycrystal having a thermogravimetric analysis curve and/or a differential scanning calorimetry curve according to FIG. 91 Type BK type. 如請求項76之化合物,其中該化合物係游離鹼正戊醇溶劑合物多晶型物AX型,其展現之XRPD圖案具有至少三個、至少四個或至少五個在如下以2θ度表示之角度處之特徵峰:11.5°±0.2°、12.9°±0.2°、13.1°±0.2°、17.4°±0.2°、18.2°±0.2°、23.1°±0.2°、23.9°±0.2°及25.9°±0.2°。A compound as claimed in claim 76, wherein the compound is the free base n-amyl alcohol solvate polymorph Form AX, which exhibits at least three, at least four, or at least five XRPD patterns expressed in 2θ degrees as follows Characteristic peaks at angles: 11.5°±0.2°, 12.9°±0.2°, 13.1°±0.2°, 17.4°±0.2°, 18.2°±0.2°, 23.1°±0.2°, 23.9°±0.2° and 25.9° ±0.2°. 如請求項76或133之化合物,其中該化合物係具有根據圖93之粉末X射線繞射圖案之游離鹼正戊醇溶劑合物多晶型物AX型。A compound according to claim 76 or 133, wherein the compound is a free base n-amyl alcohol solvate polymorph AX form having a powder X-ray diffraction pattern according to FIG. 93. 如請求項76、133或134中任一項之化合物,其中該化合物係具有根據圖94之熱重分析曲線及/或差示掃描熱量測定法曲線之游離鹼正戊醇溶劑合物多晶型物AX型。The compound according to any one of claims 76, 133, or 134, wherein the compound is a free base n-amyl alcohol solvate polymorph having a thermogravimetric analysis curve and/or a differential scanning calorimetry curve according to FIG. 94 AX type. 如請求項76之化合物,其中該化合物係游離鹼間二甲苯溶劑合物多晶型物Q型,其展現之XRPD圖案具有至少三個、至少四個或至少五個在如下以2θ度表示之角度處之特徵峰:5.5°±0.2°、12.5°±0.2°、15.0°±0.2°、17.6°±0.2°、20.2°±0.2°、22.1°±0.2°、22.8°±0.2°及26.6°±0.2°。A compound as claimed in claim 76, wherein the compound is the free base meta-xylene solvate polymorph Form Q, which exhibits an XRPD pattern with at least three, at least four, or at least five expressed as 2θ degrees as follows Characteristic peaks at angles: 5.5°±0.2°, 12.5°±0.2°, 15.0°±0.2°, 17.6°±0.2°, 20.2°±0.2°, 22.1°±0.2°, 22.8°±0.2° and 26.6° ±0.2°. 如請求項76或136之化合物,其中該化合物係具有根據圖96之粉末X射線繞射圖案之游離鹼間二甲苯溶劑合物多晶型物Q型。The compound as claimed in claim 76 or 136, wherein the compound is a free form meta-xylene solvate polymorph Form Q having a powder X-ray diffraction pattern according to FIG. 96. 如請求項76、136或137中任一項之化合物,其中該化合物係具有根據圖97之熱重分析曲線及/或差示掃描熱量測定法曲線之游離鹼間二甲苯溶劑合物多晶型物Q型。The compound according to any one of claims 76, 136, or 137, wherein the compound is a free base metaxylene solvate polymorph having a thermogravimetric analysis curve and/or a differential scanning calorimetry curve according to FIG. 97 Type Q. 如請求項76之化合物,其中該化合物係游離鹼2-甲氧基乙醇溶劑合物多晶型物P型,其展現之XRPD圖案具有至少三個、至少四個或至少五個在如下以2θ度表示之角度處之特徵峰:11.9°±0.2°、12.3°±0.2°、12.7°±0.2°、14.0°±0.2°、17.1°±0.2°、20.0°±0.2°、23.9°±0.2°、24.1°±0.2°、25.5°±0.2°、25.8°±0.2°及27.2°±0.2°。The compound according to claim 76, wherein the compound is the free base 2-methoxyethanol solvate polymorph Form P, which exhibits an XRPD pattern having at least three, at least four, or at least five in the following 2θ Characteristic peaks at angles expressed in degrees: 11.9°±0.2°, 12.3°±0.2°, 12.7°±0.2°, 14.0°±0.2°, 17.1°±0.2°, 20.0°±0.2°, 23.9°±0.2° , 24.1°±0.2°, 25.5°±0.2°, 25.8°±0.2° and 27.2°±0.2°. 如請求項76或139之化合物,其中該化合物係具有根據圖99之粉末X射線繞射圖案之游離鹼2-甲氧基乙醇溶劑合物多晶型物P型。The compound according to claim 76 or 139, wherein the compound is a free base 2-methoxyethanol solvate polymorph P form having a powder X-ray diffraction pattern according to FIG. 99. 如請求項76、139或140中任一項之化合物,其中該化合物係具有根據圖100之熱重分析曲線及/或差示掃描熱量測定法曲線之游離鹼2-甲氧基乙醇溶劑合物多晶型物P型。The compound according to any one of claims 76, 139, or 140, wherein the compound is a free base 2-methoxyethanol solvate having a thermogravimetric analysis curve and/or a differential scanning calorimetry curve according to FIG. 100 Polymorph P type. 如請求項76之化合物,其中該化合物係游離鹼第二丁醇溶劑合物多晶型物AQ型,其展現之XRPD圖案具有至少三個、至少四個或至少五個在如下以2θ度表示之角度處之特徵峰:11.5°±0.2°、12.7°±0.2°、12.9°±0.2°、14.1°±0.2°、17.4°±0.2°、17.9°±0.2°、21.9°±0.2°、22.7°±0.2°、23.1°±0.2°、23.5°±0.2°、23.9°±0.2°、25.5°±0.2°及27.6°±0.2°。A compound as claimed in claim 76, wherein the compound is the free base second butanol solvate polymorph AQ form, which exhibits an XRPD pattern having at least three, at least four, or at least five expressed in 2θ degrees as follows Characteristic peaks at angles: 11.5°±0.2°, 12.7°±0.2°, 12.9°±0.2°, 14.1°±0.2°, 17.4°±0.2°, 17.9°±0.2°, 21.9°±0.2°, 22.7 °±0.2°, 23.1°±0.2°, 23.5°±0.2°, 23.9°±0.2°, 25.5°±0.2° and 27.6°±0.2°. 如請求項76或142之化合物,其中該化合物係具有根據圖102之粉末X射線繞射圖案之游離鹼第二丁醇溶劑合物多晶型物AQ型。The compound according to claim 76 or 142, wherein the compound is a free base second butanol solvate polymorph AQ form having a powder X-ray diffraction pattern according to FIG. 102. 如請求項76、142或143中任一項之化合物,其中該化合物係具有根據圖103之熱重分析曲線及/或差示掃描熱量測定法曲線之游離鹼第二丁醇溶劑合物多晶型物AQ型。The compound according to any one of claims 76, 142, or 143, wherein the compound is a free base second butanol solvate polycrystal having a thermogravimetric analysis curve and/or a differential scanning calorimetry curve according to FIG. 103 Type AQ type. 一種醫藥組合物,其包含如請求項76至144中任一項之化合物及至少一種醫藥學上可接受之賦形劑、稀釋劑及/或載劑。A pharmaceutical composition comprising the compound according to any one of claims 76 to 144 and at least one pharmaceutically acceptable excipient, diluent and/or carrier. 一種呈游離鹼無水物結晶E型之化合物(2S ,4R ,5S )-4-氟-1-(4-氟苯磺醯基)-5-甲基-N -((5-(三氟甲基)-2-(2-(三氟甲基)嘧啶-5-基)吡啶-4-基)甲基)吡咯啶-2-甲醯胺,其特徵為X射線粉末繞射峰含有三、四或五個選自以下之峰:7.5°±0.2°、8.2°±0.2°、12.6°±0.2°、13.1°±0.2°、13.4°±0.2°、14.7°±0.2°、15.1°±0.2°、15.5°±0.2°、16.1°±0.2°、16.6°±0.2°、18.2°±0.2°、18.9°±0.2°、19.9°±0.2°、20.4°±0.2°、21.0°±0.2°、21.5°±0.2°、21.8°±0.2°、22.4°±0.2°、22.7°±0.2°、24.3°±0.2°、25.0°±0.2°、25.4°±0.2°及28.4°±0.2°。An E-type compound (2 S ,4 R ,5 S )-4-fluoro-1-(4-fluorobenzenesulfonyl)-5-methyl- N -((5-( Trifluoromethyl)-2-(2-(trifluoromethyl)pyrimidin-5-yl)pyridin-4-yl)methyl)pyrrolidin-2-carboxamide, characterized by X-ray powder diffraction peaks Contains three, four or five peaks selected from 7.5°±0.2°, 8.2°±0.2°, 12.6°±0.2°, 13.1°±0.2°, 13.4°±0.2°, 14.7°±0.2°, 15.1 °±0.2°, 15.5°±0.2°, 16.1°±0.2°, 16.6°±0.2°, 18.2°±0.2°, 18.9°±0.2°, 19.9°±0.2°, 20.4°±0.2°, 21.0°± 0.2°, 21.5°±0.2°, 21.8°±0.2°, 22.4°±0.2°, 22.7°±0.2°, 24.3°±0.2°, 25.0°±0.2°, 25.4°±0.2° and 28.4°±0.2° . 如請求項146之化合物,其特徵為根據圖10之粉末X射線繞射圖案。The compound of claim 146 is characterized by a powder X-ray diffraction pattern according to FIG. 如請求項146或147之化合物,其特徵為根據圖11之熱重分析曲線及/或差示掃描熱量測定法曲線。The compound of claim 146 or 147 is characterized by the thermogravimetric analysis curve and/or the differential scanning calorimetry curve according to FIG. 11. 一種醫藥組合物,其包含如請求項146至148中任一項之化合物及至少一種醫藥學上可接受之賦形劑、稀釋劑及/或載劑。A pharmaceutical composition comprising the compound according to any one of claims 146 to 148 and at least one pharmaceutically acceptable excipient, diluent and/or carrier. 一種製備呈游離鹼無水物結晶E型之(2S ,4R ,5S )-4-氟-1-(4-氟苯磺醯基)-5-甲基-N -((5-(三氟甲基)-2-(2-(三氟甲基)嘧啶-5-基)吡啶-4-基)甲基)吡咯啶-2-甲醯胺之方法,其包含: (1) 混合(2S ,4R ,5S )-4-氟-1-(4-氟苯磺醯基)-5-甲基-N -((5-(三氟甲基)-2-(2-(三氟甲基)嘧啶-5-基)吡啶-4-基)甲基)吡咯啶-2-甲醯胺游離鹼起始物質與二氯甲烷以形成含有(2S ,4R ,5S )-4-氟-1-(4-氟苯磺醯基)-5-甲基-N -((5-(三氟甲基)-2-(2-(三氟甲基)嘧啶-5-基)吡啶-4-基)甲基)吡咯啶-2-甲醯胺濃度係至少50 mg/mL之溶液; (2) 使該(2S ,4R ,5S )-4-氟-1-(4-氟苯磺醯基)-5-甲基-N -((5-(三氟甲基)-2-(2-(三氟甲基)嘧啶-5-基)吡啶-4-基)甲基)吡咯啶-2-甲醯胺之溶液與具有小於2之介電常數之非極性反溶劑組合,達到二氯甲烷與反溶劑之總體積比率係約1:1.5至約1:10,以形成包含游離鹼無水物結晶E型(2S ,4R ,5S )-4-氟-1-(4-氟苯磺醯基)-5-甲基-N -((5-(三氟甲基)-2-(2-(三氟甲基)嘧啶-5-基)吡啶-4-基)甲基)吡咯啶-2-甲醯胺之漿料;及 (3) 自該漿料分離該游離鹼無水物結晶E型(2S ,4R ,5S )-4-氟-1-(4-氟苯磺醯基)-5-甲基-N -((5-(三氟甲基)-2-(2-(三氟甲基)嘧啶-5-基)吡啶-4-基)甲基)吡咯啶-2-甲醯胺。Preparation of (2 S ,4 R ,5 S )-4-fluoro-1-(4-fluorobenzenesulfonyl)-5-methyl- N -((5-( A method of trifluoromethyl)-2-(2-(trifluoromethyl)pyrimidin-5-yl)pyridin-4-yl)methyl)pyrrolidin-2-carboxamide, which includes: (1) mixing (2 S ,4 R ,5 S )-4-fluoro-1-(4-fluorobenzenesulfonyl)-5-methyl- N -((5-(trifluoromethyl)-2-(2- (Trifluoromethyl)pyrimidin-5-yl)pyridin-4-yl)methyl)pyrrolidin-2-carboxamide free base starting material and dichloromethane to form containing (2 S ,4 R ,5 S )-4-fluoro-1-(4-fluorobenzenesulfonyl)-5-methyl- N -((5-(trifluoromethyl)-2-(2-(trifluoromethyl)pyrimidine-5 -Yl)pyridin-4-yl)methyl)pyrrolidine-2-carboxamide concentration is at least 50 mg/mL solution; (2) make the (2 S ,4 R ,5 S )-4-fluoro- 1-(4-fluorobenzenesulfonyl)-5-methyl- N -((5-(trifluoromethyl)-2-(2-(trifluoromethyl)pyrimidin-5-yl)pyridine-4 -Yl)methyl)pyrrolidine-2-carboxamide solution combined with a non-polar antisolvent having a dielectric constant of less than 2 to achieve a total volume ratio of methylene chloride to antisolvent of about 1:1.5 to about 1 :10, to form an E-type (2 S ,4 R ,5 S )-4-fluoro-1-(4-fluorobenzenesulfonyl)-5-methyl- N -((5 -(Trifluoromethyl)-2-(2-(trifluoromethyl)pyrimidin-5-yl)pyridin-4-yl)methyl)pyrrolidin-2-carboxamide slurry; and (3) The free base anhydrous crystalline E-type (2 S ,4 R ,5 S )-4-fluoro-1-(4-fluorobenzenesulfonyl)-5-methyl- N -((5 -(Trifluoromethyl)-2-(2-(trifluoromethyl)pyrimidin-5-yl)pyridin-4-yl)methyl)pyrrolidin-2-carboxamide. 如請求項150之方法,其中該反溶劑係正庚烷。The method of claim 150, wherein the anti-solvent is n-heptane. 如請求項150或151之方法,其中混合步驟(1)及組合步驟(2)在約15℃至約35℃下進行。The method of claim 150 or 151, wherein the mixing step (1) and the combining step (2) are performed at about 15°C to about 35°C. 如請求項150至152中任一項之方法,其中二氯甲烷與反溶劑之體積比係約1:2至約1:4,或約1:3。The method of any one of claims 150 to 152, wherein the volume ratio of dichloromethane to antisolvent is about 1:2 to about 1:4, or about 1:3. 如請求項150至153中任一項之方法,其中步驟(2)進一步包含將游離鹼無水物結晶E型(2S ,4R ,5S )-4-氟-1-(4-氟苯磺醯基)-5-甲基-N -((5-(三氟甲基)-2-(2-(三氟甲基)嘧啶-5-基)吡啶-4-基)甲基)吡咯啶-2-甲醯胺晶種添加至(2S ,4R ,5S )-4-氟-1-(4-氟苯磺醯基)-5-甲基-N -((5-(三氟甲基)-2-(2-(三氟甲基)嘧啶-5-基)吡啶-4-基)甲基)吡咯啶-2-甲醯胺之組合溶液中。The method according to any one of claims 150 to 153, wherein step (2) further comprises crystallizing the free base anhydrous E-type (2 S ,4 R ,5 S )-4-fluoro-1-(4-fluorobenzene Sulfonyl)-5-methyl- N -((5-(trifluoromethyl)-2-(2-(trifluoromethyl)pyrimidin-5-yl)pyridin-4-yl)methyl)pyrrole Seed crystals of pyridin-2-carboxamide added to (2 S ,4 R ,5 S )-4-fluoro-1-(4-fluorobenzenesulfonyl)-5-methyl- N -((5-( Trifluoromethyl)-2-(2-(trifluoromethyl)pyrimidin-5-yl)pyridin-4-yl)methyl)pyrrolidin-2-carboxamide in the combined solution. 如請求項150至154中任一項之方法,其中該起始物質係非晶固體(2S ,4R ,5S )-4-氟-1-(4-氟苯磺醯基)-5-甲基-N -((5-(三氟甲基)-2-(2-(三氟甲基)嘧啶-5-基)吡啶-4-基)甲基)吡咯啶-2-甲醯胺游離鹼。The method according to any one of claims 150 to 154, wherein the starting material is an amorphous solid (2 S ,4 R ,5 S )-4-fluoro-1-(4-fluorobenzenesulfonyl)-5 -Methyl- N -((5-(trifluoromethyl)-2-(2-(trifluoromethyl)pyrimidin-5-yl)pyridin-4-yl)methyl)pyrrolidine-2-carboxamide Amine free base. 如請求項150至155中任一項之方法,其中該起始物質係F型(2S ,4R ,5S )-4-氟-1-(4-氟苯磺醯基)-5-甲基-N -((5-(三氟甲基)-2-(2-(三氟甲基)嘧啶-5-基)吡啶-4-基)甲基)吡咯啶-2-甲醯胺游離鹼。The method according to any one of claims 150 to 155, wherein the starting material is type F (2 S ,4 R ,5 S )-4-fluoro-1-(4-fluorobenzenesulfonyl)-5- Methyl- N -((5-(trifluoromethyl)-2-(2-(trifluoromethyl)pyrimidin-5-yl)pyridin-4-yl)methyl)pyrrolidine-2-carboxamide Free base.
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