TW201938493A - Method for processing and recycling copper ion from copper etching (cupric acid) waste liquid comprising an extraction reaction, a regeneration reaction, an electrolysis treatment and a recycling treatment - Google Patents

Method for processing and recycling copper ion from copper etching (cupric acid) waste liquid comprising an extraction reaction, a regeneration reaction, an electrolysis treatment and a recycling treatment Download PDF

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TW201938493A
TW201938493A TW107108846A TW107108846A TW201938493A TW 201938493 A TW201938493 A TW 201938493A TW 107108846 A TW107108846 A TW 107108846A TW 107108846 A TW107108846 A TW 107108846A TW 201938493 A TW201938493 A TW 201938493A
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copper
treatment
waste liquid
reaction
electrolytic
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TWI658994B (en
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林世民
林文章
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衛司特科技股份有限公司
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    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
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    • Y02P10/20Recycling

Abstract

A method for processing and recycling copper ion from copper etching (cupric acid) waste liquid, the method for processing and recycling comprising an extraction reaction, a regeneration reaction, an electrolysis treatment and a recycling treatment. With the processes above, this invention can eliminate the interference of complex ingredients in the copper etching (cupric acid) waste liquid to the direct electrolytic recovery method, wherein copper ion in the waste liquid is first converted into regenerated cupric sulfate solution, followed by the electrolytic recovery method, so as to recycle the copper ion in the copper etching (cupric acid) waste liquid as valuable metal copper.

Description

銅蝕刻(銅酸)廢液銅離子處理回收方法 Copper etching (copper acid) waste liquid copper ion treatment and recovery method

本發明係關於一種廢液回收有價金屬之處理方法,尤指一種銅蝕刻(銅酸)廢液銅離子處理回收方法。 The invention relates to a treatment method for recovering valuable metals from a waste liquid, in particular to a copper ion etching (copper acid) waste liquid copper ion treatment and recovery method.

隨著環保法規對工業廢水的處理要求日趨嚴格,許多的工業廢水必須利用更高級的處理程序、高耗能處理程序或新發明之處理方法,方可達到其規定放流水標準。 With the increasingly strict requirements for the treatment of industrial waste water by environmental protection regulations, many industrial waste water must use more advanced treatment procedures, high energy consumption treatment procedures or new inventions of treatment methods in order to reach their prescribed discharge water standards.

其中光電業產生的銅蝕刻(銅酸)廢液,係近年來面板製造隨著影像解析度及附加功能的提升,而由原來的鋁製程,改進開發轉換成為銅製程,因而開始產生了銅蝕刻(銅酸)廢液。這是一種全新的廢液,由於面板製程的特殊需求,銅蝕刻藥液(銅酸藥液)成份極為複雜(過氧化氫/有機酸/碱基化合物/磷酸鹽/胺/亞氨基二乙酸/5-氨基四氮坐/氟化氫/機密添加劑…等成份,依照不同種類/不同比例混合而成),全世界幾家的銅蝕刻藥液(銅酸藥液)供應商皆有其各自的成份、比例,甚至於添加了幾種不公開的秘密配方。 Among them, the copper etching (copper acid) waste liquid produced by the optoelectronics industry has been developed in recent years. With the improvement of image resolution and additional functions, the original aluminum process has been improved and converted to a copper process. As a result, copper etching has begun. (Copper acid) waste liquid. This is a new type of waste liquid. Due to the special requirements of the panel process, the composition of copper etching solution (copper acid solution) is extremely complicated (hydrogen peroxide / organic acid / base compound / phosphate / amine / iminodiacetic acid / 5-aminotetrazolium / hydrogen fluoride / confidential additives ... and other ingredients, mixed according to different types / different ratios), several suppliers of copper etching solution (copper acid solution) all over the world have their own ingredients, Proportion, and even added several secret secret formulas.

因此,由於銅蝕刻藥液(銅酸藥液)主要功能是蝕刻線路板上的金屬銅,所以主要的金屬污染物是銅離子(目前光電業製程排放銅濃度約為5000~10000mg/L)。但銅蝕刻(銅酸)廢液複雜的成份,讓這股含銅廢液的處理或更進一步的銅處理回收,都變得更為棘手。 Therefore, since the main function of the copper etching solution (copper acid solution) is to etch metal copper on the circuit board, the main metal contaminant is copper ions (currently the concentration of copper emitted by the photovoltaic industry process is about 5000 ~ 10000mg / L). However, the complex composition of copper etching (copper acid) waste liquid makes the treatment of this copper-containing waste liquid or further copper treatment and recycling more difficult.

再者,由於光電業銅蝕刻(銅酸)廢液中含有複雜的成份,如果以直接電解回收法來進行銅回收,其中許多成份(過氧化氫/有機酸…)不但會干擾直接電解回收法的銅還原反應,並會損壞電解設備,所以把銅蝕刻(銅酸)廢液直接進行電解處理回收的方法,並無法順利達到將銅離子高效率去除並處理回收成為有價金屬銅之目的。 In addition, due to the complex components contained in the copper etching (copper acid) waste liquid of the photovoltaic industry, if the direct electrolytic recovery method is used for copper recovery, many of the components (hydrogen peroxide / organic acid ...) will not only interfere with the direct electrolytic recovery method. The copper reduction reaction will damage the electrolytic equipment. Therefore, the method of directly recycling copper etching (copper acid) waste liquid by electrolytic treatment and recovery cannot successfully achieve the purpose of efficiently removing copper ions and treating and recycling them into valuable metal copper.

有鑑於此,本發明人於多年從事相關產品之製造開發與設計經驗,針對上述之目標,詳加設計與審慎評估後,終得一確具實用性之本發明。 In view of this, the present inventors have engaged in the manufacturing, development and design of related products for many years. After careful design and careful evaluation of the above-mentioned goals, they finally have a practical invention.

本發明所欲解決之技術問題在於針對現有技術存在的上述缺失,提供一種銅蝕刻(銅酸)廢液銅離子處理回收方法。 The technical problem to be solved by the present invention is to provide a method for treating and recovering copper ions from copper etching (copper acid) waste liquid in view of the above-mentioned defects existing in the prior art.

上述處理回收方法包含萃取反應、再生反應、電解處理以及回收處理,其中:萃取反應係將欲處理之廢液先集中於一廢液集中槽內,再輸送至一萃取反應槽內,該萃取反應槽係導入萃取劑,利用該萃取劑將廢液中之銅離子吸附分離,該吸附有銅離子之萃取劑進行再生反應處理,已經去除銅離子之廢液則會被排出該萃取反應槽外;再生反應係將吸附有銅離子之萃取劑轉移至一再生反應槽內,再導入硫酸溶液,經硫酸溶液將銅離子再生出來並混合成再生硫酸銅溶液,同時間萃取劑會被分離出,並回收以供萃取反應使用,而該再生硫酸銅溶液則再進行電解處理;電解處理係將硫酸銅溶液中經由一電解系統進行電解處理,使硫酸銅溶液之離子銅被電解還原成金屬銅並回收處理,而該電解處理後之硫酸溶液則再回收以供再生反應使用,藉此完成廢液處理並回收有價金屬銅之流程者。 The above-mentioned treatment and recovery method includes an extraction reaction, a regeneration reaction, an electrolytic treatment, and a recovery treatment. Among them: the extraction reaction is to concentrate the waste liquid to be treated in a waste liquid concentration tank and then transfer it to an extraction reaction tank. The extraction reaction An extraction agent is introduced into the tank system, and the copper ions in the waste liquid are adsorbed and separated by the extractant. The extraction agent having the copper ions adsorbed is subjected to regeneration reaction treatment, and the waste liquid from which copper ions have been removed will be discharged out of the extraction reaction tank; The regeneration reaction is to transfer the extractant with the adsorbed copper ions into a regeneration reaction tank, and then introduce the sulfuric acid solution. The copper ions are regenerated by the sulfuric acid solution and mixed into a regenerated copper sulfate solution. At the same time, the extractant will be separated out, and Recovered for extraction reaction, and the regenerated copper sulfate solution is further subjected to electrolytic treatment; the electrolytic treatment is electrolytic treatment of the copper sulfate solution through an electrolytic system, so that the ionic copper of the copper sulfate solution is electrolytically reduced to metallic copper and recovered Treatment, and the sulfuric acid solution after the electrolytic treatment is recovered for regeneration reaction, thereby completing the waste liquid treatment and returning Valuable metals are copper process.

較佳地,萃取劑為一種可有效吸附銅離子之樹脂,進而將銅離子從廢液中吸附分離。 Preferably, the extractant is a resin capable of effectively adsorbing copper ions, and further adsorbing and separating copper ions from the waste liquid.

較佳地,萃取反應更包括一萃取劑儲槽以及一低銅廢液儲槽,該萃取劑儲槽係將萃取劑導入至萃取反應槽內,同時回收再生反應後之萃取劑。 Preferably, the extraction reaction further includes an extractant storage tank and a low copper waste liquid storage tank. The extractant storage tank introduces the extractant into the extraction reaction tank and recovers the extractant after the regeneration reaction.

較佳地,萃取反應後可再進行清洗處理,將萃取劑內之微量廢液清洗排出,之後再進行再生反應處理。 Preferably, after the extraction reaction, a washing treatment may be performed, and a trace of waste liquid in the extractant may be washed and discharged, and then a regeneration reaction treatment may be performed.

較佳地,清洗處理係利用乾淨的水或含量5%以下之硫酸溶液進行清洗。 Preferably, the cleaning treatment is performed by using clean water or a sulfuric acid solution containing less than 5% sulfur.

較佳地,再生反應更包括一電解循環槽,該電解循環槽內係容設有硫酸溶液,係導入再生反應槽內進行再生反應,而該再生反應後之再生硫酸銅溶液會再導入電解循環槽內,經由電解循環槽將硫酸銅溶液導入電解系統內進行電解處理,且經電解處理後之硫酸溶液則會再回收集中至電解循環槽,以供再生反應使用。 Preferably, the regeneration reaction further includes an electrolytic circulation tank. A sulfuric acid solution is contained in the electrolytic circulation tank, which is introduced into the regeneration reaction tank for the regeneration reaction, and the regenerated copper sulfate solution after the regeneration reaction is re-introduced into the electrolytic cycle. In the tank, the copper sulfate solution is introduced into the electrolytic system through the electrolytic circulation tank for electrolytic treatment, and the sulfuric acid solution after the electrolytic treatment is recovered and concentrated in the electrolytic circulation tank for use in the regeneration reaction.

較佳地,再生反應所使用的硫酸溶液濃度介於5~50%間。 Preferably, the concentration of the sulfuric acid solution used in the regeneration reaction is between 5-50%.

較佳地,萃取反應、再生反應以及電解處理為批次搭配處理或連續式搭配處理。 Preferably, the extraction reaction, the regeneration reaction, and the electrolytic treatment are a batch matching process or a continuous matching process.

較佳地,萃取反應的萃取劑導入之水力停留時間為0.1~60分鐘。 Preferably, the hydraulic retention time of the introduction of the extractant in the extraction reaction is 0.1 to 60 minutes.

較佳地,再生反應的硫酸溶液導入之水力停留時間為0.1~60分鐘。 Preferably, the hydraulic retention time of the sulfuric acid solution introduced during the regeneration reaction is 0.1 to 60 minutes.

較佳地,電解系統可視計畫回收銅量設計為多組串連或並 聯,且電解系統的操作電流密度介於10~1000A/m2Preferably, the visual recovery plan of the electrolytic system is designed as multiple groups connected in series or in parallel, and the operating current density of the electrolytic system is between 10 and 1000 A / m 2 .

對照先前技術之功效:本處理回收方法的主要目的,就是排除銅蝕刻(銅酸)廢液複雜成份對於直接電解回收法的干擾,先把廢液中的銅離子轉換成為再生硫酸銅溶液,再進行電解回收法,將銅蝕刻(銅酸)廢液中的銅離子處理回收成為有價金屬銅。 Contrast with the efficacy of the prior art: The main purpose of this treatment and recovery method is to eliminate the interference of the complex components of copper etching (copper acid) waste liquid on the direct electrolytic recovery method. The copper ions in the waste liquid are first converted into regenerated copper sulfate solution, and then An electrolytic recovery method is performed to treat and recover copper ions in the copper etching (copper acid) waste liquid into valuable metal copper.

本處理回收方法之次要目的,可將銅蝕刻(銅酸)廢液之銅離子污染物處理回收成為有價金屬銅,達成將工業污染物回收再利用,還可將電解回收之金屬銅販售得利。 The secondary purpose of this treatment and recovery method is to treat and recover the copper ion pollutants of copper etching (copper acid) waste liquid into valuable metal copper, to achieve the recovery and reuse of industrial pollutants, and to sell the electrolytically recovered metal copper. Profit.

本處理回收方法之次要目的,採用本發明之處理方法,較其它方法(濃縮後委外處理/混凝沉澱壓濾成含銅污泥...等),節省了大筆委外處理費用或銅污泥委外處理費用。 The secondary purpose of this treatment and recovery method, using the treatment method of the present invention, saves a large amount of outsourcing treatment costs compared to other methods (concentrated outsourcing treatment / coagulation sedimentation pressure filtration to copper-containing sludge, etc.) Or copper sludge outsourcing treatment costs.

本處理回收方法之次要目的,可有效降低銅污泥量,銅離子去除率高達99%以上,相對的,後續的廢水處理產生之銅污泥量只剩下原來的1%以下。 The secondary purpose of this treatment and recovery method can effectively reduce the amount of copper sludge. The removal rate of copper ions is over 99%. In contrast, the amount of copper sludge produced by subsequent wastewater treatment is less than 1% of the original.

本處理回收方法之次要目的,可大幅度減少廢水處理去除銅離子之藥品用量及後續的銅污泥壓濾作業/銅污泥庫存。 The secondary purpose of this treatment and recovery method can greatly reduce the amount of drugs used to remove copper ions in wastewater treatment and the subsequent copper sludge filter press operation / copper sludge inventory.

本處理回收方法之次要目的,可將銅蝕刻(銅酸)廢液之銅離子污染物處理回收成為金屬銅,避免了二次污染的可能性。 The secondary purpose of this treatment and recovery method is to treat and recover copper ion pollutants of copper etching (copper acid) waste liquid into metallic copper, thereby avoiding the possibility of secondary pollution.

〔本發明〕 〔this invention〕

10‧‧‧萃取反應 10‧‧‧ Extraction reaction

11‧‧‧廢液集中槽 11‧‧‧Waste liquid concentration tank

12‧‧‧萃取反應槽 12‧‧‧extraction reaction tank

13‧‧‧萃取劑儲槽 13‧‧‧Extractant tank

14‧‧‧低銅廢液儲槽 14‧‧‧Low copper waste liquid storage tank

20‧‧‧再生反應 20‧‧‧Regeneration reaction

21‧‧‧再生反應槽 21‧‧‧ regeneration reaction tank

22‧‧‧電解循環槽 22‧‧‧Electrolytic circulation tank

30‧‧‧電解處理 30‧‧‧ Electrolytic treatment

31‧‧‧電解系統 31‧‧‧electrolysis system

40‧‧‧回收處理 40‧‧‧Recycling

A‧‧‧廢液 A‧‧‧waste liquid

B‧‧‧金屬銅 B‧‧‧Metal Copper

第1圖:係為本發明之處理回收方法流程方塊圖。 FIG. 1 is a block diagram showing the flow of the processing and recycling method of the present invention.

第2圖:係為本發明之處理回收方法流程示意圖。 FIG. 2 is a schematic flow chart of the processing and recycling method of the present invention.

為使 貴審查委員對本發明之目的、特徵及功效能夠有更進一步之瞭解與認識,以下茲請配合【圖式簡單說明】詳述如後:首先,先請參閱第1圖所示,一種銅蝕刻(銅酸)廢液銅離子處理回收方法,該處理回收方法包含萃取反應10、再生反應20、電解處理30以及回收處理40,其中:萃取反應10包括一廢液集中槽11、一萃取反應槽12、一萃取劑儲槽13以及一低銅廢液儲槽14,其欲處理之廢液A先集中於一廢液集中槽11內,再輸送至一萃取反應槽12內,該萃取劑儲槽13係供萃取劑的容置,並將萃取劑導入至萃取反應槽12內,該萃取劑為一種可有效吸附銅離子之樹脂(如液態或固態樹脂),且萃取劑導入之水力停留時間為0.1~60分鐘,利用該萃取劑將廢液A中之銅離子吸附分離,該吸附有銅離子之萃取劑會持續進行再生反應20處理,已經去除銅離子之廢液A則會被排出該萃取反應槽12外,並集收至低銅廢液儲槽14進行其他再處理作業;再生反應20包括一再生反應槽21以及一電解循環槽22,其吸附有銅離子之萃取劑係被轉移至該再生反應槽21內,該電解循環槽22內係容設有硫酸溶液,該硫酸溶液濃度介於5~50%間並導入再生反應槽21內進行再生反應,其硫酸溶液導入之水力停留時間為0.1~60分鐘,經硫酸溶液將銅離子再生出來並混合成再生硫酸銅溶液,同時間萃取劑會被分離出,且該萃取劑會再回收至萃取劑儲槽13內以供萃取反應使用,而再生反應後之再生硫酸銅溶液則再導入電解循環槽22內,經由電解循環槽22將硫酸銅溶液導出並進行電解處理;電解處理30係將硫酸銅溶液經由一電解系統31進行電解處理,該電解系統31可視計畫回收金屬銅B量設計為多組串連或並聯,並將電解系統的操作電流密度設定介於10~1000 A/m2,使硫酸銅溶液之離子銅被電解還原成金屬銅B並進行回收處理40,而該經過電解處理30後之硫酸溶液會再回收集中至電解循環槽22以供再生反應使用,藉此完成廢液處理並回收有價金屬銅B之流程者。 In order for your reviewers to have a better understanding and understanding of the purpose, features and effects of the present invention, the following please cooperate with [Simplified Description of the Drawings] as detailed below: First, please refer to Figure 1 first, a copper Etching (copper acid) waste liquid copper ion treatment and recovery method, the treatment and recovery method includes extraction reaction 10, regeneration reaction 20, electrolytic treatment 30, and recovery treatment 40, wherein: extraction reaction 10 includes a waste liquid concentration tank 11, an extraction reaction Tank 12, an extractant storage tank 13, and a low-copper waste liquid storage tank 14. The waste liquid A to be processed is first concentrated in a waste liquid concentration tank 11 and then transferred to an extraction reaction tank 12, and the extractant The storage tank 13 is used for containing the extractant, and the extractant is introduced into the extraction reaction tank 12. The extractant is a resin (such as a liquid or solid resin) that can effectively adsorb copper ions, and the hydraulic force of the extractant is retained. The time is from 0.1 to 60 minutes. The copper ion in the waste liquid A is adsorbed and separated by the extractant. The copper ion-containing extractant will continue to perform the regeneration reaction 20, and the waste liquid A from which copper ions have been removed will be discharged. The extraction reaction Outside the tank 12, it is collected to the low copper waste liquid storage tank 14 for other reprocessing operations; the regeneration reaction 20 includes a regeneration reaction tank 21 and an electrolytic circulation tank 22, and the extractant system adsorbing copper ions is transferred to the In the regeneration reaction tank 21, a sulfuric acid solution is contained in the electrolytic circulation tank 22. The concentration of the sulfuric acid solution ranges from 5 to 50% and is introduced into the regeneration reaction tank 21 for the regeneration reaction. The hydraulic retention time for the introduction of the sulfuric acid solution is In 0.1 ~ 60 minutes, the copper ions are regenerated and mixed into a regenerated copper sulfate solution through a sulfuric acid solution. At the same time, the extractant will be separated out, and the extractant will be recovered into the extractant storage tank 13 for the extraction reaction. The regenerated copper sulfate solution after the regeneration reaction is re-introduced into the electrolytic circulation tank 22, and the copper sulfate solution is led out through the electrolytic circulation tank 22 and subjected to electrolytic treatment. The electrolytic treatment 30 is an electrolytic treatment of the copper sulfate solution through an electrolytic system 31. the electrolysis system 31 visualization program designed to recover metal copper, an amount B of a plurality of groups in series or in parallel, and the operating current density electrolysis system is between 10 ~ 1000 a / m 2, the copper sulfate solution The copper is electrolytically reduced to metallic copper B and subjected to recovery treatment 40, and the sulfuric acid solution after the electrolytic treatment 30 will be recovered and concentrated in the electrolytic circulation tank 22 for regeneration reaction, thereby completing waste liquid treatment and recovering valuable metals Processer of copper B.

上述方法於萃取反應10後可先進行清洗處理,將萃取劑內之微量廢液清洗排出,之後再進行再生反應20處理,而該清洗處理係利用乾淨的水或含量5%以下之硫酸溶液進行清洗。 In the above method, after the extraction reaction 10, a cleaning treatment may be performed first, and a small amount of waste liquid in the extractant may be cleaned and discharged, and then the regeneration reaction 20 treatment may be performed. The cleaning treatment is performed by using clean water or a sulfuric acid solution containing less than 5%. Cleaning.

上述方法之萃取反應、再生反應以及電解處理可視廢液量進行批次搭配處理或連續式搭配處理。 The extraction reaction, regeneration reaction, and electrolytic treatment of the above method can be performed in batch or continuous processing depending on the amount of waste liquid.

上述方法之萃取反應方程式為:Cu2++2HR(O)→CuR2(O)+2H+ The extraction reaction equation of the above method is: Cu 2+ + 2HR (O) → CuR 2 (O) + 2H +

上述方法之再生反應方程式為:CuR2(O)+H2SO4→CuSO4+2HR(O) The regeneration reaction equation of the above method is: CuR 2 (O) + H 2 SO 4 → CuSO 4 + 2HR (O)

上述方法之電解處理反應為: The electrolytic treatment reaction of the above method is:

陽極處理: Anodizing:

在酸性溶液中,陽極只有電解水反應,其反應如下:H2O→2H++1/2O2+2e In an acidic solution, the anode reacts only with electrolyzed water. The reaction is as follows: H 2 O → 2H + + 1 / 2O 2 + 2e

陰極反應: Cathode reaction:

主反應:CuSO4+2e-→Cu(金屬銅)+SO4 2 Main reaction: CuSO 4 + 2e - → Cu ( copper) + SO 4 2

副反應:2H++2e-→H2 Side reaction: 2H + + 2e - → H 2

其方法處理之實施例一,是MGC的銅蝕刻(銅酸)廢液,採取本發明之處理回收方法,將廢液中的銅離子處理回收成為有價金屬銅。其詳細的操作條件和處理結果如下列表格所示: The first embodiment of the method is a copper etching (copper acid) waste liquid of MGC. By adopting the processing and recovery method of the present invention, copper ions in the waste liquid are processed and recovered into valuable metal copper. The detailed operating conditions and processing results are shown in the following list:

其方法處理之實施例二,是PPC的銅蝕刻(銅酸)廢液,採取本發明之處理回收方法,將廢液中的銅離子處理回收成為有價金屬銅。其詳細的操作條件和處理結果如下列表格所示: The second embodiment of the method is a copper etching (copper acid) waste liquid of PPC. By adopting the treatment and recovery method of the present invention, copper ions in the waste liquid are treated and recovered into valuable metal copper. The detailed operating conditions and processing results are shown in the following list:

其方法處理之實施例三,是ENF的銅蝕刻(銅酸)廢液,採取本發明之處理回收方法,將廢液中的銅離子處理回收成為有價金屬銅。其詳細的操作條件和處理結果如下列表格所示: The third embodiment of the method is a copper etching (copper acid) waste liquid of ENF. By adopting the treatment recovery method of the present invention, the copper ions in the waste liquid are treated and recovered into valuable metal copper. The detailed operating conditions and processing results are shown in the following list:

其方法處理之實施例四,是DAXIN的銅蝕刻(銅酸)廢液,採取本發明之處理回收方法,將廢液中的銅離子處理回收成為有價金屬銅。其詳細的操作條件和處理結果如下列表格所示: The fourth embodiment of the method is a copper etching (copper acid) waste liquid of DAXIN. The treatment and recovery method of the present invention is adopted to treat and recover copper ions in the waste liquid into valuable metal copper. The detailed operating conditions and processing results are shown in the following list:

由上述實施例及其表格所示可知,本發明之處理回收方法確實可高效率的去除多種光電業銅蝕刻(銅酸)廢液A中的銅離子(平均去除率高達99%以上),並且能將萃取去除的銅離子再生轉換成為再生硫酸銅溶液,再生硫酸銅溶液進一步電解處理回收成為有價金屬銅B。因此本發明處理回收方法非常適合應用在銅蝕刻(銅酸)廢液A之銅離子去除處理回收應用。 As can be seen from the above examples and their tables, the treatment and recovery method of the present invention can indeed efficiently remove copper ions in a variety of copper etching (copper acid) waste liquid A of the photovoltaic industry (the average removal rate is over 99%), and The copper ions extracted and removed can be regenerated into regenerated copper sulfate solution, and the regenerated copper sulfate solution can be further electrolyzed and recovered to become valuable metal copper B. Therefore, the treatment and recovery method of the present invention is very suitable for the copper ion removal treatment and recovery application of copper etching (copper acid) waste liquid A.

藉上述具體實施例之結構,可得到下述之效益: By the structure of the above specific embodiment, the following benefits can be obtained:

(一)、可將銅蝕刻(銅酸)廢液A之銅離子污染物處理回收成為有價金屬銅B,達成將工業污染物回收再利用,還可將電解回收之金屬銅B販售得利。 (1) The copper ion pollutants of copper etching (copper acid) waste liquid A can be processed and recovered into valuable metal copper B, and industrial pollutants can be recovered and reused. The electrolytic copper metal B can also be sold for profit. .

(二)、採用本發明之處理回收方法,較其它方法(濃縮後委外處理/混凝沉澱壓濾成含銅污泥...等),節省了大筆委外處理費用或銅污泥委外處理費用。 (2) By adopting the treatment and recovery method of the present invention, compared with other methods (concentrated outsourcing treatment / coagulation sedimentation, pressure filtration to copper-containing sludge, etc.), a large outsourcing treatment cost or copper sludge is saved. Outsourced processing costs.

(三)、有效降低銅污泥量,銅離子去除率高達99%以上,相對的,後續 的廢水處理產生之銅污泥量只剩下原來的1%以下。 (3) Effectively reduce the amount of copper sludge. The removal rate of copper ions is as high as 99% or higher. The amount of copper sludge produced by wastewater treatment is only less than 1% of the original.

(四)、可大幅度減少廢水處理去除銅離子之藥品用量及後續的銅污泥壓濾作業/銅污泥庫存。 (4) It can greatly reduce the amount of drugs used to remove copper ions in wastewater treatment and subsequent copper sludge filter press operations / copper sludge inventory.

(五)、將銅蝕刻(銅酸)廢液A之銅離子污染物處理回收成為金屬銅B,避免了二次污染的可能性。 (5) Treatment and recovery of copper ion pollutants of copper etching (copper acid) waste liquid A into metallic copper B, avoiding the possibility of secondary pollution.

綜上所述,本發明確實已達突破性之結構設計,而具有改良之發明內容,同時又能夠達到產業上之利用性與進步性,且本發明未見於任何刊物,亦具新穎性,當符合專利法相關法條之規定,爰依法提出發明專利申請,懇請 鈞局審查委員授予合法專利權,至為感禱。 To sum up, the present invention has indeed achieved a breakthrough structural design, with improved content of the invention, and at the same time, it can achieve industrial applicability and progress, and the present invention is not seen in any publications, and it is also novel. In accordance with the relevant provisions of the Patent Law, I filed an application for an invention patent in accordance with the law.

唯以上所述者,僅為本發明之一較佳實施例而已,當不能以之限定本發明實施之範圍;即大凡依本發明申請專利範圍所作之均等變化與修飾,皆應仍屬本發明專利涵蓋之範圍內。 The above is only one of the preferred embodiments of the present invention. When it cannot be used to limit the scope of the present invention; that is, all equal changes and modifications made in accordance with the scope of the patent application for the present invention should still belong to the present invention. Within the scope of the patent.

Claims (10)

一種銅蝕刻(銅酸)廢液銅離子處理回收方法,該處理回收方法包含萃取反應、再生反應、電解處理以及回收處理,其中:萃取反應,係將欲處理之廢液先集中於一廢液集中槽內,再輸送至一萃取反應槽內,該萃取反應槽係導入萃取劑,利用該萃取劑將廢液中之銅離子吸附分離,該吸附有銅離子之萃取劑進行再生反應處理,已經去除銅離子之廢液則會被排出該萃取反應槽外;再生反應,係將吸附有銅離子之萃取劑轉移至一再生反應槽內,再導入硫酸溶液,經硫酸溶液將銅離子再生出來並混合成再生硫酸銅溶液,同時間萃取劑會被分離出,並回收以供萃取反應使用,而該再生硫酸銅溶液則再進行電解處理;電解處理,係將硫酸銅溶液經由一電解系統進行電解處理,使硫酸銅溶液之離子銅被電解還原成金屬銅並回收處理,而該電解處理後之硫酸溶液則再回收以供再生反應使用,藉此完成廢液處理並回收有價金屬銅之流程者。 A copper ion etching (copper acid) waste liquid copper ion treatment and recovery method. The treatment and recovery method includes extraction reaction, regeneration reaction, electrolytic treatment, and recovery treatment. Among them, the extraction reaction is to concentrate the waste liquid to be treated in a waste liquid first. The concentration tank is then transported to an extraction reaction tank. The extraction reaction tank is introduced with an extractant, and the copper ion in the waste liquid is adsorbed and separated by the extractant. The copper ion-absorbing extractant is subjected to regeneration reaction treatment. The waste liquid from which copper ions are removed will be discharged out of the extraction reaction tank; the regeneration reaction is to transfer the extractant that has adsorbed copper ions to a regeneration reaction tank, and then introduce a sulfuric acid solution, and the copper ions are regenerated by the sulfuric acid solution and Mixed into a regenerated copper sulfate solution, the extractant will be separated at the same time and recovered for use in the extraction reaction, and the regenerated copper sulfate solution is further subjected to electrolytic treatment; the electrolytic treatment is to electrolyze the copper sulfate solution through an electrolytic system Treatment, the ionic copper of the copper sulfate solution is electrolytically reduced to metallic copper and recovered, and the sulfuric acid solution after the electrolytic treatment is Receiving the reaction used for regeneration, thereby completing waste water treatment and recovery of valuable metals as copper by the process. 根據申請專利範圍第1項所述之銅蝕刻(銅酸)廢液銅離子處理回收方法,其中,萃取劑為一種可有效吸附銅離子之樹脂,進而將銅離子從廢液中吸附分離。 According to the method for treating and recovering copper ions from copper etching (copper acid) waste liquid according to item 1 of the scope of the patent application, wherein the extraction agent is a resin that can effectively adsorb copper ions, and then the copper ions are separated from the waste liquid by adsorption. 根據申請專利範圍第1項所述之銅蝕刻(銅酸)廢液銅離子處理回收方法,其中,萃取反應更包括一萃取劑儲槽以及一低銅廢液儲槽,該萃取劑儲槽係將萃取劑導入至萃取反應槽內,同時回收再生反應後之萃取劑。 According to the copper ion etching (copper acid) waste liquid copper ion treatment and recovery method according to item 1 of the scope of the patent application, the extraction reaction further includes an extractant storage tank and a low copper waste liquid storage tank. The extractant storage tank is The extractant is introduced into the extraction reaction tank, and the extractant after the regeneration reaction is recovered at the same time. 根據申請專利範圍第1項所述之銅蝕刻(銅酸)廢液銅離子處理回收方法,其中,萃取反應後可再進行清洗處理,將萃取劑內之微量廢液清洗排出,之後再進行再生反應處理。 According to the copper ion etching (copper acid) waste liquid copper ion treatment and recovery method described in the scope of the patent application, the cleaning process can be performed after the extraction reaction, and the trace waste liquid in the extractant can be washed out and then regenerated. Reactive treatment. 根據申請專利範圍第4項所述之銅蝕刻(銅酸)廢液銅離子處理回收方法,其中,清洗處理係利用乾淨的水或含量5%以下之硫酸溶液進行清洗。 According to the copper ion etching (copper acid) waste liquid copper ion treatment and recovery method according to item 4 of the scope of the patent application, the cleaning treatment is performed by using clean water or a sulfuric acid solution containing less than 5% sulfuric acid. 根據申請專利範圍第1項所述之銅蝕刻(銅酸)廢液銅離子處理回收方法,其中,再生反應更包括一電解循環槽,該電解循環槽內係容設有硫酸溶液,係導入再生反應槽內進行再生反應,而該再生反應後之再生硫酸銅溶液會再導入電解循環槽內,經由電解循環槽將硫酸銅溶液導入電解系統內進行電解處理,且經電解處理後之硫酸溶液則會再回收集中至電解循環槽,以供再生反應使用。 According to the copper ion etching (copper acid) waste liquid copper ion treatment and recovery method according to item 1 of the scope of the patent application, the regeneration reaction further includes an electrolytic circulation tank, which contains a sulfuric acid solution and is introduced into the regeneration A regeneration reaction is performed in the reaction tank, and the regenerated copper sulfate solution after the regeneration reaction is re-introduced into the electrolytic circulation tank. The copper sulfate solution is introduced into the electrolytic system for electrolytic treatment through the electrolytic circulation tank, and the sulfuric acid solution after electrolytic treatment is Recycling will be concentrated in the electrolytic circulation tank for regeneration reaction. 根據申請專利範圍第1或6項所述之銅蝕刻(銅酸)廢液銅離子處理回收方法,其中,再生反應所使用的硫酸溶液濃度介於5~50%間。 According to the copper ion etching (copper acid) waste liquid copper ion treatment and recovery method according to item 1 or 6 of the scope of the patent application, the concentration of the sulfuric acid solution used in the regeneration reaction is between 5-50%. 根據申請專利範圍第1項所述之銅蝕刻(銅酸)廢液銅離子處理回收方法,其中,萃取反應、再生反應以及電解處理為批次搭配處理或連續式搭配處理。 According to the copper etching (copper acid) waste liquid copper ion treatment and recovery method according to item 1 of the scope of the patent application, the extraction reaction, the regeneration reaction, and the electrolytic treatment are batch matching processing or continuous matching processing. 根據申請專利範圍第1項所述之銅蝕刻(銅酸)廢液銅離子處理回收方法,其中,萃取反應的萃取劑導入萃取反應槽之水力停留時間以及再生反應的硫酸溶液導入再生反應槽之水力停留時間皆介於0.1~60分鐘間。 According to the copper etching (copper acid) waste liquid copper ion treatment and recovery method according to item 1 of the scope of the patent application, wherein the hydraulic retention time of the extraction reaction introduction of the extraction agent into the extraction reaction tank and the sulfuric acid solution of the regeneration reaction are introduced into the regeneration reaction tank. The hydraulic retention time is between 0.1 and 60 minutes. 根據申請專利範圍第1項所述之銅蝕刻(銅酸)廢液銅離子處理回收方法,其中,電解系統可視計畫回收銅量設計為多組串連或並聯,且電解系統的操作電流密度介於10~1000A/m2According to the copper etching (copper acid) waste liquid copper ion treatment and recovery method according to item 1 of the scope of the patent application, the electrolytic system can be designed according to the plan to recover the amount of copper in series or parallel, and the operating current density of the electrolytic system Between 10 ~ 1000A / m 2 .
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