TW201933947A - Mask, method for frabricating the same, and method for frabricating organic electro-luminancce device - Google Patents

Mask, method for frabricating the same, and method for frabricating organic electro-luminancce device Download PDF

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TW201933947A
TW201933947A TW107101758A TW107101758A TW201933947A TW 201933947 A TW201933947 A TW 201933947A TW 107101758 A TW107101758 A TW 107101758A TW 107101758 A TW107101758 A TW 107101758A TW 201933947 A TW201933947 A TW 201933947A
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masking
mask
colloid
openings
net
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TW107101758A
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TWI664876B (en
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江南輝
來漢中
陳信宏
賴敬權
鄧博文
蔡政樺
許哲銓
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友達光電股份有限公司
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Abstract

A mask includes a mask net and at least one covering glue. The mask net has a plurality of through openings. The covering glue covers part of surface of the mask net and part of the plurality of through openings. The hardness of the covering gel is less than the hardness of the mask net.

Description

遮罩、遮罩的製造方法及應用此遮罩之有機電激發光元件的蒸鍍方法Method for manufacturing mask and mask, and vapor deposition method for organic electroluminescent device using the same

本發明係關於一種蒸鍍技術,特別是一種遮罩、遮罩的製造方法及應用此遮罩之有機電激發光元件的蒸鍍方法。The present invention relates to an evaporation technique, and more particularly to a mask, a method of manufacturing a mask, and an evaporation method of an organic electroluminescent device using the mask.

目前常見的有機電致發光顯示器(Organic Light Emitting Display,OLED)的製作方法通常是透過遮罩將有機發光材料沉積在基板上。一般來說,遮罩係具有複數個微細開口,可供有機發光材料通過此些微細開口而附著於基板上。At present, a common organic light emitting display (OLED) is usually fabricated by depositing an organic light emitting material on a substrate through a mask. Generally, the mask has a plurality of fine openings for the organic light-emitting material to adhere to the substrate through the fine openings.

當遮罩應用於蒸鍍製程時,需將遮罩固定並對遮罩的四周施加張力,以使遮罩表面平整。然而,在施加張力時,遮罩所受之應力會受到微細開口的分布情形而不均勻,因此靠近施加張力的微細開口旁的遮罩之實心區域容易呈現皺褶形變。這樣一來,遮罩的微細開口的形狀及位置容易偏移,故容易產生鍍膜的厚度不均或是欲鍍膜位置偏離等情況。When the mask is applied to the evaporation process, the mask is fixed and tension is applied around the mask to flatten the surface of the mask. However, when tension is applied, the stress applied to the mask is unevenly distributed by the distribution of the fine openings, so that the solid region of the mask near the fine opening to which the tension is applied is likely to exhibit wrinkle deformation. As a result, the shape and position of the fine opening of the mask are easily shifted, so that the thickness unevenness of the plating film or the position of the coating film is likely to be deviated.

本發明一實施例提出一種遮罩,其包括罩網以及至少一遮蔽膠體。罩網具有複數個貫穿開口。遮蔽膠體覆蓋部分之罩網的表面及此些貫穿開口其中之複數者。其中,遮蔽膠體的硬度小於罩網的硬度。An embodiment of the invention provides a mask comprising a cover net and at least one masking gel. The cover mesh has a plurality of through openings. The surface of the cover mesh covering the colloid-covered portion and the plurality of such through-openings. Wherein, the hardness of the masking colloid is less than the hardness of the net.

本發明一實施例提出一種遮罩的製造方法,其包含:提供金屬薄板、於金屬薄板形成間隔配置的複數個貫穿開口以形成罩網以及固著至少一遮蔽膠體於罩網的開口區。於此,金屬薄板的實心區圍繞金屬薄板的開口區,且此些貫穿開口係形成於開口區,且遮蔽膠體覆蓋此些貫穿開口中之複數者,且遮蔽膠體的硬度小於罩網的硬度。An embodiment of the present invention provides a method of manufacturing a mask, comprising: providing a thin metal plate, forming a plurality of through openings in a spaced apart arrangement of the metal thin plates to form a cover mesh, and fixing at least one of the cover regions of the cover mesh. Here, the solid region of the metal thin plate surrounds the open area of the metal thin plate, and the through openings are formed in the open area, and the shielding gel covers a plurality of the through openings, and the hardness of the masking colloid is smaller than the hardness of the net.

本發明一實施例提出一種有機電激發光元件的蒸鍍方法,其包含:覆蓋遮罩於基板上以及透過遮罩進行基板的蒸鍍製程。於此,遮罩包括罩網及至少一遮蔽膠體。罩網具有複數個貫穿開口,且遮蔽膠體覆蓋此些貫穿開口中的複數者。透過遮罩使得蒸鍍材料經由未被遮蔽膠體覆蓋的複數個貫穿開口沉積於基板上。An embodiment of the present invention provides a vapor deposition method for an organic electroluminescent device, comprising: covering a mask on a substrate and performing a vapor deposition process of the substrate through the mask. Here, the mask includes a cover net and at least one masking colloid. The cover mesh has a plurality of through openings, and the masking gel covers a plurality of such through openings. The vapor deposition material is deposited on the substrate through a plurality of through openings that are not covered by the masking gel through the mask.

綜上所述,本發明實施例之遮罩、遮罩的製造方法及有機電激發光元件的蒸鍍方法,藉由遮蔽膠體遮蔽罩網局部的蒸鍍開口(貫穿開口)以在罩網內部增設無蒸鍍開口的區域,且可降低罩網張網時產生皺摺(Wrinkle)。在一些實施例中,可藉由本發明實施例之遮罩來蒸鍍至少一種顏色的蒸鍍材料,故可藉由遮蔽膠體的位置及形狀調整有機薄膜顯示器的子畫素陣列的排列形式。In summary, the mask, the mask manufacturing method, and the vapor deposition method of the organic electroluminescent device according to the embodiment of the present invention are disposed inside the mask net by masking the vapor deposition opening (through opening) of the colloid mask net. An area where no vapor deposition opening is provided is added, and wrinkles are generated when the net is stretched. In some embodiments, the vapor deposition material of at least one color can be evaporated by the mask of the embodiment of the present invention, so that the arrangement of the sub-pixel arrays of the organic thin film display can be adjusted by the position and shape of the masking colloid.

圖1為本發明一實施例的遮罩的俯視概略示意圖。圖2為對應於圖1之A-A剖線的遮罩的截面示意圖。請參閱圖1及圖2,遮罩100包括罩網110以及至少一遮蔽膠體120。罩網110具有複數個貫穿開口H。遮蔽膠體120覆蓋罩網110的表面及其中一部份的貫穿開口H。遮蔽膠體120的硬度小於罩網110的硬度。1 is a schematic plan view of a mask according to an embodiment of the present invention. 2 is a schematic cross-sectional view of a mask corresponding to the line A-A of FIG. 1. Referring to FIGS. 1 and 2 , the mask 100 includes a cover net 110 and at least one masking colloid 120 . The cover net 110 has a plurality of through openings H. The masking colloid 120 covers the surface of the net 110 and a portion of the through opening H thereof. The hardness of the masking colloid 120 is less than the hardness of the net 110.

於一實施例中,罩網110具有實心區112以及開口區114。其中,實心區112圍繞開口區114。此些貫穿開口H實質上可以是呈現陣列形式配置的複數個網格,其係以一維陣列(圖未繪示)或二維陣列(如圖1所繪示)的陣列形式配置於開口區114。遮蔽膠體120位於開口區114並且覆蓋其中一些貫穿開口H。於一實施態樣中,如圖1所繪示,遮蔽膠體120可以覆蓋貫穿開口H陣列中之其中複數個行(column)或列(row)的複數個貫穿開口H。於另一實施態樣中,如圖1所繪示,遮蔽膠體120係與實心區112分離,也就是說,遮蔽膠體120僅位於開口區114而未延伸至實心區112。In one embodiment, the shroud 110 has a solid region 112 and an open region 114. The solid zone 112 surrounds the open area 114. The through openings H may be substantially a plurality of meshes arranged in an array form, and are arranged in an open area in an array of a one-dimensional array (not shown) or a two-dimensional array (as shown in FIG. 1 ). 114. The masking colloid 120 is located in the open area 114 and covers some of the through openings H. In an embodiment, as shown in FIG. 1 , the masking colloid 120 may cover a plurality of through openings H of a plurality of columns or rows passing through the array of openings H . In another embodiment, as shown in FIG. 1 , the masking colloid 120 is separated from the solid region 112 , that is, the masking colloid 120 is only located in the open region 114 and does not extend to the solid region 112 .

當遮罩100應用於有機電激發光元件的蒸鍍製程時,將遮罩100固定於欲進行蒸鍍的基板上,並且對遮罩100施加張力以使遮罩100表面平整。於此,由於位於開口區114內之遮蔽膠體120與貫穿開口H的強度對比相對於實心區112內之罩網110與貫穿開口H之間的強度對比來得低,使得罩網110的開口區114與實心區112所受應力的對比降低。依此,遮蔽膠體120可緩衝以及分散罩網110所接收的張力,改善應力分布不均的問題,進而改善罩網110產生皺褶的現象。When the mask 100 is applied to the vapor deposition process of the organic electroluminescent device, the mask 100 is fixed to the substrate to be vapor-deposited, and tension is applied to the mask 100 to flatten the surface of the mask 100. Here, since the contrast of the shadow colloid 120 located in the open area 114 and the through opening H is relatively low with respect to the strength between the net 110 and the through opening H in the solid area 112, the open area 114 of the net 110 The contrast with the stress applied to the solid region 112 is reduced. Accordingly, the masking colloid 120 can buffer and disperse the tension received by the net 110, improve the problem of uneven stress distribution, and thereby improve the wrinkles of the net 110.

遮蔽膠體120的位置可視有機薄膜顯示器的子畫素陣列的排列方式而定。於一實施態樣中,此些貫穿開口H的排列方式係對應有機薄膜顯示器的子畫素陣列。依此,當遮罩100應用於有機電激發光元件的蒸鍍製程時,可藉由將遮蔽膠體120遮蔽特定區域內的複數個貫穿開口H,以使蒸鍍後的有機薄膜顯示器的子畫素陣列可對應特定區域內的貫穿開口H的位置而呈現特定的子畫素陣列的排列方式。The position of the masking colloid 120 may depend on the arrangement of the sub-pixel arrays of the organic thin film display. In one embodiment, the arrangement of the through openings H corresponds to a sub-pixel array of the organic thin film display. Accordingly, when the mask 100 is applied to the vapor deposition process of the organic electroluminescent device, the masking body 120 can be shielded from the plurality of through openings H in the specific region to make the sub-paint of the vapor-deposited organic thin film display. The prime array can represent the arrangement of the particular sub-pixel arrays corresponding to the locations of the through openings H in a particular region.

在罩網110的垂直投影方向D1上,遮蔽膠體120的垂直投影範圍的形狀亦可以視有機薄膜顯示器的畫素陣列的排列而呈現不同的形狀,各遮蔽膠體120的垂直投影範圍的形狀可例如是但不限於點狀、條狀、多邊形或不規則形狀。In the vertical projection direction D1 of the cover net 110, the shape of the vertical projection range of the masking colloid 120 may also take a different shape depending on the arrangement of the pixel array of the organic thin film display, and the shape of the vertical projection range of each of the masking colloids 120 may be, for example, Yes, but not limited to, dots, strips, polygons, or irregular shapes.

舉一示例,如圖1所繪示,遮罩100包括複數個遮蔽膠體120(例如是遮蔽膠體120a、120b、120c),且此些遮蔽膠體120係彼此分離,亦即,此些遮蔽膠體120並未相連接。遮蔽膠體120a呈現長矩形且遮蔽膠體120a的長軸的一端耦接位於開口區114的第一側L1的實心區112,並且遮蔽膠體120a的長軸的另一端耦接位於開口區114相對第一側L1的第二側L2的實心區112。於此,遮蔽膠體120a可大致上將開口區114分為兩個區域,且此兩個區域皆各包括複數個貫穿開口H。另外,遮蔽膠體120b及遮蔽膠體120c都呈現點狀(圓形),且遮蔽膠體120b及遮蔽膠體120c分別遮蔽由遮蔽膠體120a於開口區114內所劃分出的兩個區域內的複數個貫穿開口H。As an example, as shown in FIG. 1 , the mask 100 includes a plurality of masking bodies 120 (eg, masking bodies 120a, 120b, and 120c), and the masking bodies 120 are separated from each other, that is, the masking bodies 120. Not connected. The masking body 120a has a long rectangular shape and one end of the long axis of the masking colloid 120a is coupled to the solid region 112 of the first side L1 of the opening region 114, and the other end of the long axis of the masking colloid 120a is coupled to the first region of the opening region 114. The solid region 112 of the second side L2 of the side L1. Here, the masking colloid 120a can substantially divide the open area 114 into two regions, and each of the two regions includes a plurality of through openings H. In addition, the masking colloid 120b and the shielding colloid 120c are all in a point shape (circular shape), and the shielding colloid 120b and the shielding colloid 120c respectively shield a plurality of through openings in the two regions defined by the shielding colloid 120a in the opening region 114. H.

舉另一示例,如圖3所繪示,遮罩100包括複數個彼此分離的遮蔽膠體120(例如是遮蔽膠體120d、120e、120f、120g)。遮蔽膠體120d及遮蔽膠體120e皆呈現長矩形且其長軸的兩端分別耦接位於開口區114之第一側L1及第二側L2的實心區112。於此,遮蔽膠體120d及遮蔽膠體120e可大致上將開口區114分為三個區域,且此三個區域皆各包括複數個貫穿開口H。另外,遮蔽膠體120f呈現不規則形,遮蔽膠體120g呈現點狀(圓形),且遮蔽膠體120f及遮蔽膠體120g分別遮蔽由遮蔽膠體120d及遮蔽膠體120e於開口區114內所劃分出的區域內的複數個貫穿開口H。As another example, as shown in FIG. 3, the mask 100 includes a plurality of masking colloids 120 (eg, masking bodies 120d, 120e, 120f, 120g) that are separated from each other. The masking body 120d and the masking body 120e each have a long rectangular shape, and both ends of the long axis are respectively coupled to the solid area 112 of the first side L1 and the second side L2 of the opening area 114. Here, the masking colloid 120d and the masking colloid 120e can substantially divide the open area 114 into three regions, and each of the three regions includes a plurality of through openings H. In addition, the masking colloid 120f is in an irregular shape, and the masking colloid 120g is in a dot shape (circular shape), and the masking colloid 120f and the masking colloid 120g respectively shield the region defined by the masking colloid 120d and the masking colloid 120e in the opening region 114. A plurality of through openings H.

須說明的是,圖1及圖3所繪示之遮蔽膠體120的位置、形狀及數量僅作為示例,其可以視是應用之有機薄膜顯示器的子畫素陣列的排列形式而定,而非對本發明實施例的限定。It should be noted that the position, shape and number of the masking bodies 120 illustrated in FIG. 1 and FIG. 3 are only examples, which may be determined by the arrangement of the sub-pixel arrays of the organic thin film display to be applied, instead of Definition of inventive embodiments.

於一實施例中,罩網110的材料與遮蔽膠體120的材料不同。於一實施態樣中,罩網110的材料為金屬。遮蔽膠體120的材料為聚合物(Polymer)。在另一實施態樣中,罩網110的材料可以是單一金屬材料或是合金材料,而遮蔽膠體120係具有黏性及彈性的高分子聚合材料。在又一實施態樣中,遮蔽膠體120的楊氏係數(Young's modulus)小於罩網110的楊氏係數,於此,罩網110相較於遮蔽膠體120來說較具剛性(不易變形),而遮蔽膠體120相較於罩網110來說較具彈性(較易變形)。於此,遮蔽膠體120可進一步緩衝及分散張力,進而改善罩網110產生皺褶的現象。In an embodiment, the material of the net 110 is different from the material of the masking body 120. In one embodiment, the material of the net 110 is metal. The material of the masking colloid 120 is a polymer. In another embodiment, the material of the net 110 may be a single metal material or an alloy material, and the masking colloid 120 is a polymer material having adhesiveness and elasticity. In still another embodiment, the Young's modulus of the masking colloid 120 is smaller than the Young's modulus of the net 110. Here, the net 110 is more rigid (not easily deformed) than the masking colloid 120. The masking colloid 120 is more elastic (relatively deformable) than the shroud 110. Here, the masking colloid 120 can further buffer and disperse the tension, thereby improving the wrinkles of the net 110.

圖4為本發明一實施例的遮罩的製造方法的流程圖。圖5至圖7分別是本發明一實施例的遮罩的製造方法於各步驟所形成的剖面示意圖。遮罩的製造方法包括提供金屬薄板111(步驟S12)、形成間隔配置的複數個貫穿開口H於金屬薄板111的開口區114以形成罩網110(步驟S14)及固著至少一遮蔽膠體120於罩網的開口區114(步驟S16)。4 is a flow chart of a method of fabricating a mask in accordance with an embodiment of the present invention. 5 to 7 are schematic cross-sectional views showing a method of manufacturing a mask in each step according to an embodiment of the present invention. The manufacturing method of the mask includes providing the metal thin plate 111 (step S12), forming a plurality of through openings H in the spaced arrangement to the opening region 114 of the metal thin plate 111 to form the cover mesh 110 (step S14), and fixing at least one masking colloid 120 The open area 114 of the cover net (step S16).

於步驟S12中,如圖5所繪示,金屬薄板111係一板材,其可預先規劃待圖案化之區域。於一實施態樣中,金屬薄板111可預先規劃實心區112以及開口區114,且實心區112圍繞開口區114。金屬薄板111的材料可以是單一金屬材料或是合金材料。In step S12, as shown in FIG. 5, the thin metal plate 111 is a plate which can pre-plan the area to be patterned. In one embodiment, the thin metal plate 111 may pre-plan the solid region 112 and the open region 114, and the solid region 112 surrounds the open region 114. The material of the metal thin plate 111 may be a single metal material or an alloy material.

於步驟S14中,如圖6所繪示,經由微影蝕刻製程,於金屬薄板111所預先規劃的開口區114內進行開孔,以於金屬薄板111的開口區114之內形成間隔配置的複數個貫穿開口H。於此,以形成罩網110。In step S14, as shown in FIG. 6, through the lithography process, openings are formed in the pre-planned opening region 114 of the thin metal plate 111 to form a plurality of spaced-apart arrangements in the open region 114 of the thin metal plate 111. Through the opening H. Here, the cover net 110 is formed.

於步驟S16中,如圖7所繪示,於此實施態樣中,將複數個遮蔽膠體120固著於罩網110的開口區114。不過,於其他實施態樣中,可以將一個遮蔽膠體120固著於罩網110的開口區114。遮蔽膠體120覆蓋其中一些貫穿開口H,且遮蔽膠體120的位置可視有機薄膜顯示器的畫素陣列的排列而對應特定貫穿開口H的位置。舉例而言,遮蔽膠體120可以覆蓋貫穿開口H陣列中之其中一行、其中一列或其中一特定區域的複數個貫穿開口H。於此實施態樣中,遮蔽膠體120的硬度小於罩網110的硬度。In step S16, as shown in FIG. 7, in this embodiment, a plurality of masking bodies 120 are fixed to the opening area 114 of the net 110. However, in other embodiments, a masking colloid 120 can be affixed to the open area 114 of the shroud 110. The masking colloid 120 covers some of the through openings H, and the position of the masking colloid 120 may correspond to the position of the specific through opening H depending on the arrangement of the pixel array of the organic thin film display. For example, the masking colloid 120 may cover a plurality of through openings H through one of the rows, one of the columns, or one of the specific regions. In this embodiment, the hardness of the masking colloid 120 is less than the hardness of the mask web 110.

圖8為本發明一實施例的有機電激發光元件的蒸鍍方法的流程圖。圖9至圖10分別是本發明一實施例的有機電激發光元件的蒸鍍方法於各步驟所形成的剖面示意圖。有機電激發光元件的蒸鍍方法包括覆蓋遮罩100於基板200上(步驟S22)及透過遮罩100進行基板200的蒸鍍製程(步驟S24)。Fig. 8 is a flow chart showing a vapor deposition method of an organic electroluminescent device according to an embodiment of the present invention. 9 to 10 are schematic cross-sectional views showing a vapor deposition method of an organic electroluminescent device according to an embodiment of the present invention, in each step. The vapor deposition method of the organic electroluminescence device includes covering the mask 100 on the substrate 200 (step S22) and performing a vapor deposition process of the substrate 200 through the mask 100 (step S24).

於步驟S22中,如圖1及圖9所繪示,遮罩100係包括罩網110及遮蔽膠體120,罩網110具有複數個貫穿開口H,而遮蔽膠體120覆蓋其中一些貫穿開口H。基板200可以是一欲進行蒸鍍製程的基板。於一實施態樣中,基板200係欲進行有機材料蒸鍍製程的基板,基板200的蒸鍍面已設有主動元件陣列層、畫素定義層及暴露於畫素定義層所界定的子畫素區域P內的電極圖案層(例如是陽極層)、電洞注入層、及/或電洞傳輸層(圖未繪示)。將基板200的蒸鍍面朝下面對蒸鍍源S設置,遮罩100位於於基板200與蒸鍍源S之間。透過一固定載具(圖未繪示)而將遮罩100定位於基板200的蒸鍍面上。於一實施態樣中,遮罩100的各貫穿開口H可以是對應畫素定義層所界定的各子畫素區域P。In step S22, as shown in FIG. 1 and FIG. 9, the mask 100 includes a cover net 110 and a masking colloid 120. The cover net 110 has a plurality of through openings H, and the masking colloid 120 covers some of the through openings H. The substrate 200 may be a substrate on which an evaporation process is to be performed. In one embodiment, the substrate 200 is a substrate for performing an organic material evaporation process, and the vapor deposition surface of the substrate 200 has an active device array layer, a pixel definition layer, and a sub-picture defined by the pixel definition layer. An electrode pattern layer (for example, an anode layer), a hole injection layer, and/or a hole transport layer (not shown) in the prime region P. The vapor deposition surface of the substrate 200 is placed facing the vapor deposition source S downward, and the mask 100 is positioned between the substrate 200 and the vapor deposition source S. The mask 100 is positioned on the vapor deposition surface of the substrate 200 through a fixed carrier (not shown). In one embodiment, each through opening H of the mask 100 may be each sub-pixel area P defined by a corresponding pixel definition layer.

接著,於步驟S24中,如圖10所繪示,蒸鍍源S加熱後,蒸鍍材料受熱蒸發而以遮罩100為罩幕經由未被遮蔽膠體120覆蓋的貫穿開口H而沉積於基板200上。於一實施態樣中,蒸鍍材料可以是分別具有不同顏色的有機發光材料,例如是但不限於、紅色、藍色及/或綠色的有機發光材料。蒸鍍源S可先將其中一種顏色的有機發光材料蒸鍍到未被遮蔽膠體120覆蓋的貫穿開口H內,之後遮罩100及/或基板200可以視蒸鍍條件而移位或不移位,再繼續蒸鍍有機發光材料。依此,基板200的子畫素區域P內形成適於發出紅光之有機發光薄膜R、適於發出綠光之有機發光薄膜G及適於發出藍光之有機發光薄膜B,而此些有機發光薄膜即構成有機薄膜顯示器的子畫素陣列。Next, in step S24, as shown in FIG. 10, after the evaporation source S is heated, the evaporation material is evaporated by heat, and the mask 100 is deposited as a mask through the through opening H covered by the unmasked colloid 120. on. In one embodiment, the evaporation material may be an organic light-emitting material having different colors, such as, but not limited to, red, blue, and/or green organic light-emitting materials. The vapor deposition source S may first vaporize one of the organic light-emitting materials into the through-opening H covered by the masking colloid 120, and then the mask 100 and/or the substrate 200 may be displaced or not displaced depending on the evaporation conditions. Then continue to vaporize the organic light-emitting material. Accordingly, an organic light-emitting film R suitable for emitting red light, an organic light-emitting film G suitable for emitting green light, and an organic light-emitting film B suitable for emitting blue light are formed in the sub-pixel region P of the substrate 200, and the organic light-emitting films B are formed. The film constitutes a sub-pixel array of an organic thin film display.

於一實施態樣中,遮罩100可以係對應其中一種顏色的蒸鍍材料的遮罩,於此,對應被遮蔽膠體120所遮蔽的複數個貫穿開口H的複數個子畫素區域P,即不會沉積對應該顏色的有機發光薄膜。舉例而言,圖11為有機薄膜顯示器的子畫素陣列300,而圖11之子畫素陣列300係利用圖1之遮罩100蒸鍍綠色有機發光材料。於此,圖11之子畫素陣列300的範圍係對應圖1之遮罩100的範圍。也就是說,圖11之子畫素陣列300的區域M1內的複數個子畫素區域P係對應圖1之遮罩100的遮蔽膠體120b所遮蔽的複數個貫穿開口H;而,圖11之子畫素陣列300的區域M2內的複數個子畫素區域P係對應圖1之遮罩100的遮蔽膠體120a所遮蔽的複數個貫穿開口H;而,圖11之子畫素陣列300的區域M3內的複數個子畫素區域P係對應圖1之遮罩100的遮蔽膠體120c所遮蔽的複數個貫穿開口H。In one embodiment, the mask 100 may be a mask corresponding to the vapor deposition material of one of the colors, and corresponding to the plurality of sub-pixel regions P of the plurality of through openings H covered by the masking colloid 120, ie, An organic light-emitting film corresponding to the color is deposited. For example, FIG. 11 is a sub-pixel array 300 of an organic thin film display, and the sub-pixel array 300 of FIG. 11 is a vapor-deposited green organic light-emitting material using the mask 100 of FIG. Here, the range of the sub-pixel array 300 of FIG. 11 corresponds to the range of the mask 100 of FIG. That is, the plurality of sub-pixel regions P in the region M1 of the sub-pixel array 300 of FIG. 11 correspond to the plurality of through-openings H blocked by the masking colloid 120b of the mask 100 of FIG. 1; and the sub-pixels of FIG. The plurality of sub-pixel regions P in the region M2 of the array 300 correspond to a plurality of through openings H corresponding to the masking colloid 120a of the mask 100 of FIG. 1; and the plurality of sub-pixels in the region M3 of the sub-pixel array 300 of FIG. The pixel region P corresponds to a plurality of through openings H that are shielded by the masking colloid 120c of the mask 100 of Fig. 1 .

用來蒸鍍紅色有機發光材料及藍色有機發光材料之遮罩的遮蔽膠體(圖未繪示)的位置與蒸鍍綠色有機發光材料之遮罩100(圖1所繪示)的遮蔽膠體120的位置不同,且紅色有機發光材料及藍色有機發光材料之遮罩的對應於區域M1及M3之處並無被遮蔽膠體120所遮蔽,而紅色有機發光材料及藍色有機發光材料之遮罩的對應於區域M2之處被遮蔽膠體120所遮蔽。於此,於子畫素陣列300的區域M1及M3中,子畫素陣列300之對應被遮蔽膠體120b及120c遮蔽的貫穿開口H之複數個子畫素區域P,並無沉積對應適於發出綠光的有機發光薄膜G,而僅只有適於發出紅光之有機發光薄膜R及適於發出藍光之有機發光薄膜B。於子畫素陣列300的區域M2中,子畫素陣列300之對應被遮蔽膠體120a遮蔽的貫穿開口H之複數個子畫素區域P,並無沉積對應適於發出紅光之有機發光薄膜R、適於發出藍光之有機發光薄膜B及適於發出綠光的有機發光薄膜G。The masking colloid 120 (shown in FIG. 1) of the mask 100 for evaporating the green organic light-emitting material (not shown) for evaporating the mask of the red organic light-emitting material and the blue organic light-emitting material The positions of the red organic light-emitting material and the blue organic light-emitting material corresponding to the regions M1 and M3 are not covered by the masking colloid 120, and the masks of the red organic light-emitting material and the blue organic light-emitting material are different. Corresponding to the area M2 is covered by the masking colloid 120. Here, in the regions M1 and M3 of the sub-pixel array 300, the plurality of sub-pixel regions P of the sub-pixel array 300 corresponding to the through-opening H covered by the masking colloids 120b and 120c are not deposited to be suitable for emitting green. The organic light-emitting film G of the light has only the organic light-emitting film R suitable for emitting red light and the organic light-emitting film B suitable for emitting blue light. In the region M2 of the sub-pixel array 300, the plurality of sub-pixel regions P of the sub-pixel array 300 corresponding to the through-opening H covered by the masking colloid 120a are not deposited with the organic light-emitting film R suitable for emitting red light. An organic light-emitting film B suitable for emitting blue light and an organic light-emitting film G suitable for emitting green light.

於另一實施態樣中,遮罩100係對應每種顏色的蒸鍍材料的遮罩,於此,對應被遮蔽膠體120遮蔽的貫穿開口H之複數個子畫素區域P,即不會沉積有機發光材料。舉例而言,圖12為有機薄膜顯示器的子畫素陣列400,而圖12之子畫素陣列400係利用圖1之遮罩100蒸鍍紅色有機發光材料、藍色有機發光材料及綠色有機發光材料。於此,圖12之子畫素陣列400的範圍係對應圖1之遮罩100的範圍。也就是說,圖12之子畫素陣列400的區域M1內的複數個子畫素區域P係對應圖1之遮罩100的遮蔽膠體120b所遮蔽的複數個貫穿開口H;而,圖12之子畫素陣列400的區域M2內的複數個子畫素區域P係對應圖1之遮罩100的遮蔽膠體120a所遮蔽的複數個貫穿開口H;而,圖12之子畫素陣列400的區域M3內的複數個子畫素區域P係對應圖1之遮罩100的遮蔽膠體120c所遮蔽的複數個貫穿開口H。於此,於子畫素陣列400的區域M1、M2及M3中,子畫素陣列400之對應被遮蔽膠體120a、120b、120c遮蔽的貫穿開口H之複數個子畫素區域P,並無沉積對應適於發出紅光之有機發光薄膜R、適於發出藍光之有機發光薄膜B及適於發出綠光的有機發光薄膜G。In another embodiment, the mask 100 is a mask corresponding to the vapor deposition material of each color, and the plurality of sub-pixel regions P corresponding to the through opening H covered by the masking colloid 120 are not deposited organically. Luminescent material. For example, FIG. 12 is a sub-pixel array 400 of an organic thin film display, and the sub-pixel array 400 of FIG. 12 is used to evaporate a red organic light-emitting material, a blue organic light-emitting material, and a green organic light-emitting material using the mask 100 of FIG. . Here, the range of the sub-pixel array 400 of FIG. 12 corresponds to the range of the mask 100 of FIG. That is, the plurality of sub-pixel regions P in the region M1 of the sub-pixel array 400 of FIG. 12 correspond to the plurality of through-openings H covered by the masking colloid 120b of the mask 100 of FIG. 1; and, the sub-pixels of FIG. The plurality of sub-pixel regions P in the region M2 of the array 400 correspond to a plurality of through openings H corresponding to the masking colloid 120a of the mask 100 of FIG. 1; and the plurality of sub-pixels in the region M3 of the sub-pixel array 400 of FIG. The pixel region P corresponds to a plurality of through openings H that are shielded by the masking colloid 120c of the mask 100 of Fig. 1 . Here, in the regions M1, M2, and M3 of the sub-pixel array 400, the plurality of sub-pixel regions P of the sub-pixel array 400 corresponding to the through-holes H covered by the masking colloids 120a, 120b, and 120c are not deposited. An organic light-emitting film R suitable for emitting red light, an organic light-emitting film B suitable for emitting blue light, and an organic light-emitting film G suitable for emitting green light.

綜上所述,本發明實施例之遮罩、遮罩的製造方法及有機電激發光元件的蒸鍍方法,藉由遮蔽膠體遮蔽罩網局部的蒸鍍開口(貫穿開口)以在罩網內部增設無蒸鍍開口的區域,且可降低罩網張網時產生皺摺(Wrinkle)。在一些實施例中,可藉由本發明實施例之遮罩來蒸鍍至少一種顏色的蒸鍍材料,故可藉由遮蔽膠體的位置及形狀調整有機薄膜顯示器的子畫素陣列的排列形式。In summary, the mask, the mask manufacturing method, and the vapor deposition method of the organic electroluminescent device according to the embodiment of the present invention are disposed inside the mask net by masking the vapor deposition opening (through opening) of the colloid mask net. An area where no vapor deposition opening is provided is added, and wrinkles are generated when the net is stretched. In some embodiments, the vapor deposition material of at least one color can be evaporated by the mask of the embodiment of the present invention, so that the arrangement of the sub-pixel arrays of the organic thin film display can be adjusted by the position and shape of the masking colloid.

雖然本發明的技術內容已經以較佳實施例揭露如上,然其並非用以限定本發明,任何熟習此技藝者,在不脫離本發明之精神所作些許之更動與潤飾,皆應涵蓋於本發明的範疇內,因此本發明之保護範圍當視後附之申請專利範圍所界定者為準。Although the technical content of the present invention has been disclosed in the above preferred embodiments, it is not intended to limit the present invention, and any modifications and refinements made by those skilled in the art without departing from the spirit of the present invention are encompassed by the present invention. The scope of protection of the present invention is therefore defined by the scope of the appended claims.

100‧‧‧遮罩100‧‧‧ mask

110‧‧‧罩網110‧‧‧ Cover net

111‧‧‧金屬薄板111‧‧‧Metal sheet

112‧‧‧實心區112‧‧‧solid area

114‧‧‧開口區114‧‧‧Open area

120、120a、120b、120c、120d、120e、120f、120g‧‧‧遮蔽膠體120, 120a, 120b, 120c, 120d, 120e, 120f, 120g ‧ ‧ masking colloid

200‧‧‧基板200‧‧‧Substrate

300、400‧‧‧子畫素陣列300, 400‧‧ ‧ subpixel array

A-A‧‧‧剖線A-A‧‧‧ cut line

D1‧‧‧垂直投影方向D1‧‧‧Vertical projection direction

H‧‧‧貫穿開口H‧‧‧through opening

L1‧‧‧第一側L1‧‧‧ first side

L2‧‧‧第二側L2‧‧‧ second side

M1、M2、M3‧‧‧區域M1, M2, M3‧‧‧ areas

P‧‧‧子畫素區域P‧‧‧ sub-pixel area

R、G、B‧‧‧有機發光薄膜R, G, B‧‧‧ organic light-emitting film

S‧‧‧蒸鍍源S‧‧‧ evaporation source

S12、S14、S16、S22、S24‧‧‧步驟S12, S14, S16, S22, S24‧‧‧ steps

圖1為本發明一實施例的遮罩的俯視概略示意圖。 圖2為對應於圖1之A-A剖線的遮罩的截面示意圖。 圖3為本發明另一實施例的遮罩的俯視概略示意圖。 圖4為本發明一實施例的遮罩的製造方法的流程圖。 圖5至圖7分別是本發明一實施例的遮罩的製造方法於各步驟所形成的剖面示意圖。 圖8為本發明一實施例的有機電激發光元件的蒸鍍方法的流程圖。 圖9至圖10分別是本發明一實施例的有機電激發光元件的蒸鍍方法於各步驟所形成的剖面示意圖。 圖11係利用圖1之遮罩蒸鍍的有機薄膜顯示器的子畫素陣列。 圖12係利用圖1之遮罩蒸鍍的另一有機薄膜顯示器的子畫素陣列。1 is a schematic plan view of a mask according to an embodiment of the present invention. 2 is a schematic cross-sectional view of a mask corresponding to the line A-A of FIG. 1. 3 is a schematic top plan view of a mask according to another embodiment of the present invention. 4 is a flow chart of a method of fabricating a mask in accordance with an embodiment of the present invention. 5 to 7 are schematic cross-sectional views showing a method of manufacturing a mask in each step according to an embodiment of the present invention. Fig. 8 is a flow chart showing a vapor deposition method of an organic electroluminescent device according to an embodiment of the present invention. 9 to 10 are schematic cross-sectional views showing a vapor deposition method of an organic electroluminescent device according to an embodiment of the present invention, in each step. Figure 11 is a sub-pixel array of an organic thin film display vapor-deposited using the mask of Figure 1. Figure 12 is a sub-pixel array of another organic thin film display that is vapor deposited using the mask of Figure 1.

Claims (10)

一種遮罩,包括: 一罩網,具有複數個貫穿開口;以及 至少一遮蔽膠體,覆蓋部分之該罩網的表面及該些貫穿開口其中之複數者,其中該至少一遮蔽膠體的硬度小於該罩網的硬度。A mask comprising: a cover net having a plurality of through openings; and at least one masking gel covering a portion of the surface of the net and the plurality of through openings, wherein the at least one masking colloid has a hardness less than the The hardness of the net. 如請求項1所述之遮罩,其中在該罩網的一垂直投影方向上,該至少一遮蔽膠體的垂直投影範圍為點狀、條狀、多邊形或不規則形狀。The mask of claim 1, wherein the vertical projection range of the at least one masking colloid is a dot shape, a strip shape, a polygonal shape or an irregular shape in a vertical projection direction of the cover net. 如請求項1所述之遮罩,其中該至少一遮蔽膠體有複數個,且該些遮蔽膠體彼此分離。The mask of claim 1, wherein the at least one masking colloid has a plurality of layers, and the masking colloids are separated from each other. 如請求項1所述之遮罩,其中該罩網具有一實心區以及一開口區,該實心區圍繞該開口區,該些貫穿開口以陣列形式配置於該開口區,且該至少一遮蔽膠體位於該開口區。The mask of claim 1, wherein the cover net has a solid area and an open area, the solid area surrounds the open area, the through openings are arranged in an array in the open area, and the at least one masking body Located in the open area. 如請求項4所述之遮罩,其中該至少一遮蔽膠體的一端耦接位於該開口區的第一側的該實心區,並且該至少一遮蔽膠體的另一端耦接位於該開口區相對該第一側的第二側的該實心區。The mask of claim 4, wherein one end of the at least one masking gel is coupled to the solid region on the first side of the open area, and the other end of the at least one masking body is coupled to the open area. The solid area on the second side of the first side. 如請求項4所述之遮罩,其中該至少一遮蔽膠體與該實心區分離。The mask of claim 4, wherein the at least one masking colloid is separated from the solid region. 如請求項1所述之遮罩,其中該罩網的材料為金屬,且該至少一遮蔽膠體的材料為聚合物。The mask of claim 1, wherein the material of the mask mesh is metal, and the material of the at least one masking gel is a polymer. 如請求項1所述之遮罩,其中該至少一遮蔽膠體的楊氏係數(Young's modulus)小於該罩網的楊氏係數。The mask of claim 1, wherein the Young's modulus of the at least one masking colloid is less than the Young's modulus of the net. 一種遮罩的製造方法,包括: 提供一金屬薄板,其中該金屬薄板具有一實心區以及一開口區,且該實心區圍繞該開口區; 形成間隔配置的複數個貫穿開口於該金屬薄板的該開口區,以形成一罩網;以及 固著至少一遮蔽膠體於該罩網的該開口區,其中該至少一遮蔽膠體覆蓋該些貫穿開口中之複數者,且該至少一遮蔽膠體的硬度小於該罩網的硬度。A manufacturing method of a mask, comprising: providing a metal thin plate, wherein the metal thin plate has a solid area and an open area, and the solid area surrounds the open area; forming a plurality of through openings opening in the metal sheet Opening area to form a cover net; and fixing at least one masking gel to the open area of the cover net, wherein the at least one masking body covers a plurality of the through openings, and the at least one masking colloid has a hardness less than The hardness of the net. 一種有機電激發光元件的蒸鍍方法,包括: 覆蓋一遮罩於一基板上,其中該遮罩包括一罩網及至少一遮蔽膠體,該罩網具有複數個貫穿開口,該至少一遮蔽膠體覆蓋該些貫穿開口中的複數者;以及 透過該遮罩進行該基板的一蒸鍍製程,以使一蒸鍍材料經由未被該至少一遮蔽膠體覆蓋的該些貫穿開口沉積於該基板上。An evaporation method of an organic electroluminescent device, comprising: covering a mask on a substrate, wherein the mask comprises a cover net and at least one masking colloid, the cover net having a plurality of through openings, the at least one masking colloid Covering a plurality of the through openings; and performing an evaporation process of the substrate through the mask to deposit an evaporation material on the substrate via the through openings not covered by the at least one masking paste.
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