TW201931014A - Exposure assembly and exposure device - Google Patents
Exposure assembly and exposure device Download PDFInfo
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- TW201931014A TW201931014A TW107100203A TW107100203A TW201931014A TW 201931014 A TW201931014 A TW 201931014A TW 107100203 A TW107100203 A TW 107100203A TW 107100203 A TW107100203 A TW 107100203A TW 201931014 A TW201931014 A TW 201931014A
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Abstract
Description
本發明涉及一種曝光組件及曝光裝置,特別是一種透過抽氣模組吸附待曝光件的曝光組件及曝光裝置。 The invention relates to an exposure assembly and an exposure device, in particular to an exposure assembly and an exposure device for adsorbing an object to be exposed through a suction module.
現有的曝光裝置,依據待曝光件的不同,有各種不同的曝光方式。其中一種常見的樣式是,待曝光件設置於一玻璃板上,曝光光源設置於玻璃板上方,而進行曝光作業時,曝光光源將由待曝光件的上方投射曝光光束,以照射待曝光件。然,在實際應用中,此種樣式的曝光裝置,容易發生有部分區域過度曝光的問題,進而導致曝光良率低的問題。緣此,本發明人乃潛心研究並配合學理的運用,而提出一種設計合理且有效改善上述問題的本發明。 The existing exposure apparatus has various exposure modes depending on the member to be exposed. One of the common patterns is that the object to be exposed is disposed on a glass plate, and the exposure light source is disposed above the glass plate, and during the exposure operation, the exposure light source will project an exposure beam from above the object to be exposed to illuminate the object to be exposed. However, in practical applications, such an exposure apparatus is prone to the problem of overexposure in a partial area, which in turn leads to a problem of low exposure yield. Accordingly, the inventors have diligently studied and cooperated with the application of the theory, and proposed a present invention which is rational in design and effective in improving the above problems.
本發明的主要目的在於提供一種曝光組件及曝光裝置,用以改善現有技術中,曝光組件及曝光裝置容易發生待曝光件的部分區域過度曝光的問題。 SUMMARY OF THE INVENTION A primary object of the present invention is to provide an exposure assembly and an exposure apparatus for improving the prior art that the exposure unit and the exposure apparatus are prone to overexposure of a partial area of the member to be exposed.
為了實現上述目的,本發明提供一種曝光組件,其包含:一底座及一吸附板。底座用以與一抽氣模組連接。吸附板用以承載一待曝光件,吸附板設置於底座上,吸附板包含有多個穿孔,抽氣模組能透過穿孔使待曝光件貼附於吸附板;吸附板能吸收部份通過吸附板而由底座反射的曝光光束。 In order to achieve the above object, the present invention provides an exposure assembly comprising: a base and an adsorption plate. The base is used to connect with a suction module. The adsorption plate is used for carrying an object to be exposed, the adsorption plate is disposed on the base, the adsorption plate comprises a plurality of perforations, and the suction module can adhere the object to be exposed to the adsorption plate through the perforation; the adsorption plate can absorb the absorption part through the adsorption The exposure beam reflected by the base.
為了實現上述目的,本發明還提供一種曝光裝置,其包含:一曝光光源、一曝光組件及一抽氣模組。曝光光源用以產生曝光 光束。曝光組件包含:一底座及一吸附板。底座包含有多個氣體流道及至少一個抽氣孔。吸附板用以承載一待曝光件,吸附板設置於底座上,而多個氣體流道對應位於吸附板的下方,吸附板包含有多個穿孔,多個穿孔與多個氣體流道相連通;吸附板能吸收通過吸附板而由底座反射的曝光光束。抽氣模組與抽氣孔相連通,抽氣模組被控制作動時,能透過多個氣體流道及多個穿孔,而使待曝光件貼附於吸附板。 In order to achieve the above object, the present invention also provides an exposure apparatus comprising: an exposure light source, an exposure component, and an air extraction module. Exposure source to produce exposure beam. The exposure component comprises: a base and an adsorption plate. The base includes a plurality of gas flow channels and at least one air vent. The adsorption plate is configured to carry an object to be exposed, the adsorption plate is disposed on the base, and the plurality of gas flow channels are correspondingly located below the adsorption plate, the adsorption plate comprises a plurality of perforations, and the plurality of perforations are connected to the plurality of gas flow channels; The adsorption plate can absorb the exposure beam reflected by the substrate through the adsorption plate. The air suction module is connected to the air suction hole, and when the air suction module is controlled to be actuated, the gas to be exposed and the plurality of perforations are transmitted through the plurality of gas flow channels and the plurality of perforations, so that the object to be exposed is attached to the adsorption plate.
本發明的有益效果可以在於:透過吸附板能吸收部分通過吸附板而由底座反射的曝光光束的設計,可以大幅降低待曝光件受由底座反射的曝光光束照射,而發生部分區域過度曝光的問題。 The beneficial effects of the present invention may be that the design of the exposure beam reflected by the base through the adsorption plate can be absorbed by the adsorption plate, and the exposure of the exposure beam reflected by the base can be greatly reduced, and the partial exposure of the partial region occurs. .
為使能更進一步瞭解本發明的特徵及技術內容,請參閱以下有關本發明的詳細說明與附圖,然而所附圖式僅提供參考與說明用,並非用來對本發明加以限制者。 For a better understanding of the features and technical aspects of the present invention, reference should be made to the accompanying drawings.
100‧‧‧曝光裝置 100‧‧‧Exposure device
1‧‧‧曝光組件 1‧‧‧Exposure components
10‧‧‧吸附板 10‧‧‧Adsorption plate
10A、10B、10C‧‧‧空區域 10A, 10B, 10C‧‧‧ empty area
101‧‧‧穿孔 101‧‧‧Perforation
20、20”‧‧‧底座 20, 20" ‧ ‧ base
201‧‧‧凹槽 201‧‧‧ Groove
202‧‧‧抽氣孔 202‧‧‧Pumping holes
203、203’‧‧‧支撐凸條 203, 203'‧‧‧ support ribs
204‧‧‧支撐凸塊 204‧‧‧Support bumps
201B、201C、201D‧‧‧氣體流道 201B, 201C, 201D‧‧‧ gas flow channels
201B1、201B2‧‧‧氣體流道 201B1, 201B2‧‧‧ gas flow channel
201C1、201C2‧‧‧氣體流道 201C1, 201C2‧‧‧ gas flow channel
201D1、201D2‧‧‧氣體流道 201D1, 201D2‧‧‧ gas flow path
21‧‧‧吸光層 21‧‧‧Light absorbing layer
30‧‧‧基座 30‧‧‧Base
2‧‧‧曝光光源 2‧‧‧Exposure source
3‧‧‧抽氣模組 3‧‧‧Exhaust module
4‧‧‧輸送裝置 4‧‧‧Conveyor
41‧‧‧輸送單元 41‧‧‧Conveying unit
A‧‧‧待曝光件 A‧‧‧To be exposed
圖1為本發明的曝光裝置的示意圖。 Figure 1 is a schematic view of an exposure apparatus of the present invention.
圖2為本發明的曝光組件的分解示意圖。 2 is an exploded perspective view of the exposure assembly of the present invention.
圖3為本發明的曝光組件的組合示意圖。 Figure 3 is a schematic view showing the combination of the exposure assembly of the present invention.
圖4為本發明的曝光組件的底座的第一實施態樣的示意圖。 4 is a schematic view of a first embodiment of a base of an exposure assembly of the present invention.
圖5為圖3沿剖面線Ⅳ剖開的剖面示意圖。 Figure 5 is a cross-sectional view taken along line IV of Figure 3;
圖6為本發明的曝光組件的底座具有吸光層的剖面示意圖。 Figure 6 is a schematic cross-sectional view showing the base of the exposure module of the present invention having a light absorbing layer.
圖7為圖4的上視圖。 Figure 7 is a top view of Figure 4.
圖8為本發明的曝光組件的底座的第二實施態樣的示意圖。 Figure 8 is a schematic illustration of a second embodiment of the base of the exposure assembly of the present invention.
圖9為本發明的曝光組件的底座的第三實施態樣的示意圖。 Figure 9 is a schematic illustration of a third embodiment of the base of the exposure assembly of the present invention.
以下係藉由特定的具體實例說明本發明之曝光組件及曝光裝置的實施方式,熟悉此技術之人士可由本說明書所揭示之內容輕易地瞭解本發明之其他優點與功效。本發明亦可藉由其他不同的具體實例加以施行或應用,本說明書中的各項細節亦可基於不同 觀點與應用,在不悖離本發明之精神下進行各種修飾與變更。又本發明之圖式僅為簡單說明,並非依實際尺寸描繪,亦即未反應出相關構成之實際尺寸,先予敘明。以下之實施方式係進一步詳細說明本發明之觀點,但並非以任何觀點限制本發明之範疇。 The embodiments of the exposure module and the exposure apparatus of the present invention are described below by way of specific specific examples, and those skilled in the art can easily understand other advantages and effects of the present invention from the disclosure of the present specification. The present invention may also be implemented or applied by other different specific examples, and the details in this specification may also be based on different Various modifications and changes can be made without departing from the spirit and scope of the invention. Further, the drawings of the present invention are merely illustrative, and are not depicted in actual dimensions, that is, the actual dimensions of the related structures are not reflected, which will be described first. The following embodiments are intended to describe the present invention in further detail, but are not intended to limit the scope of the invention.
請參閱圖1,其為本發明的曝光裝置的示意圖。曝光裝置100包含有一曝光組件1、一曝光光源2及一抽氣模組3。曝光光源2固定設置於曝光組件1上,曝光組件1及抽氣模組3則固定設置於一機台設備(圖未標示)中。曝光光源2能發出曝光光束,以對設置於曝光組件1上的待曝光件進行曝光作業;其中曝光光束的波長例如可以是介於365~435奈米,即為紫外光,但不以此為限。抽氣模組3用以對曝光組件1進行抽氣作業,以使待曝光件A能於曝光作業時,緊密地貼附於曝光組件1上。曝光裝置100還可以是包含有一輸送裝置4,其可以是鄰近設置於曝光組件1及抽氣模組3所設的機台設備旁。輸送裝置4還可以是包含有一輸送單元41(例如是多個滾輪),而輸送裝置4可以是透過輸送單元41將待曝光件A移動至曝光組件1上;當然,所述輸送裝置4可以是履帶、滾輪組、機械手臂等,於此不加以限制,或者輸送裝置4也可以是配合機械手臂,以進行待曝光件A的搬運。於不同的應用中,曝光裝置100可以是包含有多個輸送裝置4,或者是包含有一個輸送裝置4及一機械手臂,以將待曝光件A送入曝光組件1中,並對完成曝光的待曝光件A進行搬運作業。 Please refer to FIG. 1, which is a schematic view of an exposure apparatus of the present invention. The exposure device 100 includes an exposure component 1, an exposure light source 2, and an air extraction module 3. The exposure light source 2 is fixedly disposed on the exposure unit 1. The exposure unit 1 and the air extraction module 3 are fixedly disposed in a machine unit (not shown). The exposure light source 2 can emit an exposure beam to expose the object to be exposed disposed on the exposure component 1; wherein the wavelength of the exposure beam can be, for example, between 365 and 435 nm, that is, ultraviolet light, but not limit. The air suction module 3 is configured to perform a pumping operation on the exposure unit 1 so that the object to be exposed A can be closely attached to the exposure unit 1 during the exposure operation. The exposure device 100 may further include a conveying device 4, which may be adjacent to the machine equipment provided in the exposure unit 1 and the air suction module 3. The conveying device 4 may further include a conveying unit 41 (for example, a plurality of rollers), and the conveying device 4 may move the member A to be exposed to the exposure unit 1 through the conveying unit 41; of course, the conveying device 4 may be The crawler belt, the roller group, the robot arm, and the like are not limited thereto, or the conveying device 4 may be equipped with a mechanical arm to carry the conveyance of the member to be exposed A. In different applications, the exposure device 100 may include a plurality of transport devices 4, or include a transport device 4 and a robot arm to feed the member to be exposed A into the exposure assembly 1 and complete the exposure. The object to be exposed A is subjected to a carrying operation.
請一併參閱圖2及圖3,其為本發明的曝光組件的分解及組合示意圖。如圖所示,曝光組件1包含有一吸附板10、一底座20及一基座30,吸附板10固定設置於底座20,底座20則固定設置於基座30上。吸附板10用以承載待曝光件A,吸附板10包含有多個穿孔101;底座20與一抽氣模組3連接,抽氣模組3作動時,抽氣模組3透過多個穿孔101,可以使設置於吸附板10上的待曝光件A貼附於吸附板10上。在實際應用中,吸附板10的穿孔101 個數及各穿孔101的外型,可以是依據需求加以變化,不以圖中所示為限。 Please refer to FIG. 2 and FIG. 3 together, which are schematic exploded and combined views of the exposure assembly of the present invention. As shown in the figure, the exposure unit 1 includes an adsorption plate 10, a base 20 and a base 30. The adsorption plate 10 is fixedly disposed on the base 20, and the base 20 is fixedly disposed on the base 30. The suction plate 10 is used to carry the to-be-exposed part A, and the adsorption plate 10 includes a plurality of perforations 101. The base 20 is connected to a pumping module 3, and when the pumping module 3 is actuated, the pumping module 3 passes through the plurality of perforations 101. The member to be exposed A disposed on the adsorption plate 10 can be attached to the adsorption plate 10. In practical applications, the perforation 101 of the adsorption plate 10 The number and the appearance of each of the perforations 101 may be varied according to requirements, and are not limited to those shown in the drawings.
在具體的應用中,吸附板10可以是玻璃材質,底座20可以是壓克力材質,而基座30則可以是鋁製結構,基座30是用以加強底座20的結構強度。具體來說,抽氣模組3進行抽氣作業時,底座20可能發生微幅的變形,進行影響待曝光件A的曝光結果,因此,透過將底座20固定設置於基座30的設計,可以加強底座20的結構強度,進而改善底座20在抽氣模組進行抽氣作業時發生微幅變形的問題。當然,依據實際對待曝光件A的品質要求,曝光組件1也可以是不包含有基座30,或者曝光組件1的底座20可以是由相對較硬的材質製作,於此不加以限制。 In a specific application, the adsorption plate 10 may be made of glass, the base 20 may be made of acrylic material, and the base 30 may be made of aluminum, and the base 30 is used to strengthen the structural strength of the base 20. Specifically, when the pumping module 3 performs the pumping operation, the base 20 may be slightly deformed to affect the exposure result of the member A to be exposed. Therefore, by designing the base 20 to be fixed to the base 30, The structural strength of the base 20 is strengthened, thereby improving the problem that the base 20 is slightly deformed when the air suction module performs the pumping operation. Of course, depending on the quality requirements of the actual exposure member A, the exposure unit 1 may not include the susceptor 30, or the base 20 of the exposure unit 1 may be made of a relatively hard material, which is not limited herein.
特別說明的是,本發明的曝光組件1的吸附板10能吸收部份通過吸附板10,而被底座20反射的曝光光束,如此,將可大幅降低待曝光件A的部份區域發生過度曝光的問題。在實際應用中,所述吸附板10可以是參有顏色的板材,據以可吸附部份通過底座20反射的曝光光束;所述參有顏色的板材例如是玻璃、壓克力或是任何複合材料。另外,在不同的實施例中也可以是透過改變吸附板10的材質,例如是玻璃、壓克力與其他材料共同製成的複合材料,或者是於玻璃、壓克力材料中參入特定的能吸收曝光光束的材料,以使吸附板10能吸附被底座20反射的曝光光束。 Specifically, the adsorption plate 10 of the exposure module 1 of the present invention can absorb an exposure beam partially reflected by the adsorption plate 10 and reflected by the base 20, so that the partial exposure of the portion A to be exposed can be greatly reduced. The problem. In practical applications, the adsorption plate 10 may be a colored plate, according to which an exposure beam partially reflected by the base 20 may be adsorbed; the colored plate is, for example, glass, acrylic or any composite. material. In addition, in different embodiments, it is also possible to change the material of the adsorption plate 10, for example, a composite material made of glass, acrylic and other materials, or to participate in a specific glass or acrylic material. The material of the exposure beam can be absorbed to enable the adsorption plate 10 to adsorb the exposure beam reflected by the base 20.
更進一步來說,請一併參閱圖3至圖5,圖5顯示為圖3沿剖面線Ⅳ剖開的剖視圖。在實際應用中,吸附板10為了與底座20相互固定,因此,吸附板10所包含的穿孔101是不佈滿整個吸附板10,而吸附板10於多個穿孔101的周圍則會對應形成有至少三個空區域10A、10B、10C,該些空區域10A、10B、10C則可以包含有多個鎖固孔,而吸附板10則可利用鎖固孔配合鎖固件(例如螺絲),以與底座20相互固定。如圖1及圖5所示,當曝光光源2所發出的曝光光束,由吸附板10的上方向待曝光件A照射時,部 份的曝光光束將會通過吸附板10未被待曝光件A遮蔽的區域及任一個空區域10A(10B、10C),而被底座20反射,進而反射至吸附板10,此時,吸附板10將可以吸附被底座20反射的曝光光束,因此,被底座20反射的曝光光束,將不容易再次通過吸附板10,而可大幅降低待曝光件A受底座20反射的曝光光束影響而發生部份區域過度曝光的問題。 Furthermore, please refer to FIG. 3 to FIG. 5 together. FIG. 5 is a cross-sectional view taken along line IV of FIG. 3 . In practical applications, in order to fix the adsorption plate 10 to the base 20, the perforation 101 included in the adsorption plate 10 does not cover the entire adsorption plate 10, and the adsorption plate 10 is formed correspondingly around the plurality of perforations 101. At least three empty areas 10A, 10B, 10C, the empty areas 10A, 10B, 10C may include a plurality of locking holes, and the adsorption plate 10 may be matched with a locking hole (such as a screw) to The bases 20 are fixed to each other. As shown in FIG. 1 and FIG. 5, when the exposure light beam emitted from the exposure light source 2 is irradiated from the upper side of the adsorption plate 10 to the exposure member A, the portion The portion of the exposure beam will be reflected by the substrate 20 and reflected to the adsorption plate 10 through the region where the adsorption plate 10 is not blocked by the member A to be exposed and any of the empty regions 10A (10B, 10C). At this time, the adsorption plate 10 The exposure beam reflected by the base 20 can be adsorbed, so that the exposure beam reflected by the base 20 will not easily pass through the adsorption plate 10 again, and the exposure beam A to be exposed by the base 20 can be greatly reduced. The problem of overexposed areas.
如圖6所示,在不同的實施例中,底座20面對於吸附板10的一側,可以是具有一吸光層21,其能吸附通過吸附板10的曝光光束,如此,通過吸附板10的曝光光束,大部份將被吸光層21吸收,而不容易被反射回吸附板10。所述吸光層21可以是利用塗佈的方式固定形成於吸附板10上,或者吸光層21可以是獨立結構,透過任何方式固定設置於吸附板10上。另外,也可以是於吸附板10的部份位置填充、摻入特定的能吸收曝光光束的粒子、材料,以形成所述吸光層21。當然,在另一實施例中,底座20也可以是整體利用可吸附曝光光束的材質製成,如此,亦可大幅降低底座20反射通過吸附板10的曝光光束的機率。 As shown in FIG. 6, in different embodiments, the base 20 faces one side of the adsorption plate 10, and may have a light absorbing layer 21 capable of adsorbing an exposure beam passing through the adsorption plate 10, thus passing through the adsorption plate 10. The exposure beam is mostly absorbed by the light absorbing layer 21 and is not easily reflected back to the adsorption plate 10. The light absorbing layer 21 may be fixedly formed on the adsorption plate 10 by coating, or the light absorbing layer 21 may be a separate structure and fixedly disposed on the adsorption plate 10 by any means. In addition, it is also possible to fill and incorporate a specific particle or material capable of absorbing an exposure beam at a portion of the adsorption plate 10 to form the light absorbing layer 21. Of course, in another embodiment, the base 20 may also be made of a material that can absorb the exposure beam as a whole, and thus the probability of the exposure beam reflected by the base 20 through the adsorption plate 10 can be greatly reduced.
請一併參閱圖4、圖5及圖7,圖7顯示為本發明的曝光組件1的底座20的第一實施例的上視圖。如圖所示,底座20面對吸附板10的一側可以是內凹形成有一凹槽201,且底座20的三個抽氣孔202的至少一部份可以是對應位於凹槽201中,三個抽氣孔202用以與抽氣模組3(如圖1所示)相互連接。其中,凹槽201及三個抽氣孔202是對應位於吸附板10下方,且凹槽201的面積及三個抽氣孔202的位置可以是大致位於吸附板10形成有多個穿孔101的下方,而吸附板10的多個穿孔101、凹槽201及三個抽氣孔202則是彼此相互連通。如此,當抽氣模組3作動時,抽氣模組3將可以通過抽氣孔202、凹槽201及多個穿孔101,而使設置於吸附板10上方的待曝光件A,緊密地貼附於吸附板10。 Referring to FIG. 4, FIG. 5 and FIG. 7, FIG. 7 is a top view showing the first embodiment of the base 20 of the exposure module 1 of the present invention. As shown in the figure, a side of the base 20 facing the adsorption plate 10 may be concavely formed with a recess 201, and at least a portion of the three air suction holes 202 of the base 20 may be correspondingly located in the recess 201, three The air vent 202 is used to interconnect with the air extraction module 3 (shown in FIG. 1). The groove 201 and the three air venting holes 202 are correspondingly located below the adsorption plate 10, and the area of the groove 201 and the position of the three air venting holes 202 may be substantially below the plurality of perforations 101 formed by the adsorption plate 10, and The plurality of perforations 101, the grooves 201, and the three suction holes 202 of the adsorption plate 10 are in communication with each other. Thus, when the air suction module 3 is actuated, the air suction module 3 can pass through the air vent 202, the recess 201 and the plurality of through holes 101, so that the member A to be exposed disposed above the adsorption plate 10 is closely attached. On the adsorption plate 10.
在實際應用中,底座20於凹槽201中還可以是形成有三個氣 體流道201B、201C、201D,三個氣體流道201B、201C、201D用以導引及限制氣體的流動方向。舉例來說,凹槽201的底壁可以是向吸附板10方向凸設有兩個支撐凸條203,而兩個支撐凸條203則能對應將凹槽201區隔為三個氣體流道201B、201C、201D,透過三個氣體流道201B、201C、201D的設置,可以使抽氣模組3作動時,於吸附板10的各區域形成有大致均等的吸附力,而可避免因為吸附板10的各區域吸附力不同,而導致設置於吸附板10上的待曝光件A(如圖3所示)產生微小變形,進而可能影響曝光的品質。另外,各個支撐凸條203還可以用以支撐吸附板10,以避免吸附板10在抽氣模組3作動時發生微小變形,而影響曝光的品質。 In practical applications, the base 20 may also be formed with three gas in the groove 201. The body flow paths 201B, 201C, and 201D and the three gas flow paths 201B, 201C, and 201D are used to guide and restrict the flow direction of the gas. For example, the bottom wall of the groove 201 may be provided with two supporting ribs 203 protruding toward the adsorption plate 10, and the two supporting ribs 203 correspondingly partition the groove 201 into three gas flow paths 201B. 201C and 201D, through the arrangement of the three gas flow passages 201B, 201C, and 201D, when the air suction module 3 is actuated, substantially equal adsorption force is formed in each region of the adsorption plate 10, and the adsorption plate can be avoided. The adsorption force of each region of 10 is different, and the member A to be exposed (shown in FIG. 3) disposed on the adsorption plate 10 is slightly deformed, which may affect the quality of exposure. In addition, each of the supporting ribs 203 can also be used to support the adsorption plate 10 to prevent the adsorption plate 10 from being slightly deformed when the suction module 3 is actuated, thereby affecting the quality of the exposure.
其中,兩個支撐凸條203可以是呈現為環狀,呈現為環狀的兩個支撐凸條203則可對應將凹槽201區隔為不相互連通的三個氣體流道201B、201C、201D,而三個所述抽氣孔202則可以是對應位於不相互連通的三個氣體流道201B、201C、201D中。如此,將可使抽氣模組3對吸附板10的各區域產生大致均等的吸附力。在另外的實施中,凹槽201中還可以是凸設有多個支撐凸塊204,其用以輔助支撐吸附板10。當然,在實際應用中,依據吸附板10的大小不同,抽氣孔202的數量、支撐凸條203的數量及氣體流道201B、201C、201D的數量將可對應增減,同樣地,支撐凸塊204的數量及其外型亦可依據需求加以變化,不以圖中所示為限。 The two supporting ribs 203 may be in a ring shape, and the two supporting ribs 203 appearing in a ring shape may correspondingly divide the grooves 201 into three gas flow paths 201B, 201C, and 201D that are not in communication with each other. And the three exhaust holes 202 may be correspondingly located in the three gas flow passages 201B, 201C, and 201D that are not in communication with each other. In this way, the suction module 3 can cause substantially equal adsorption force to each region of the adsorption plate 10. In other implementations, a plurality of support protrusions 204 may be protruded in the groove 201 for assisting in supporting the adsorption plate 10. Of course, in practical applications, depending on the size of the adsorption plate 10, the number of the suction holes 202, the number of the support ribs 203, and the number of the gas flow paths 201B, 201C, and 201D can be correspondingly increased or decreased, and similarly, the support bumps are supported. The number of 204 and its appearance can also be varied according to requirements, not limited to the one shown in the figure.
如圖8所示,其顯示為底座20的第二實施例的上視圖。底座20可以是除了包含呈現為環狀的兩個支撐凸條203外,還可以包含有多個非呈現為環狀的支撐凸條203,而非呈現為環狀的支撐凸條203及多個支撐凸塊204則可以是散佈於三個氣體流道201B、201C、201D中。其中,非呈現為環狀的支撐凸條203同樣可以是用以支撐吸附板10;當然,在特殊的應用中,部份的支撐凸條203也可以是不用以支撐吸附板10,而僅作為導引及限制氣體流動方 向的構件。值得一提得是,非呈現為環狀的支撐凸條203設置於三個氣體流道201B、201C、201D中時,可以是再將氣體流道201B、201C、201D區隔為流道更小的氣體流道201B1、201B2、201C1、201C2、201D1、201D2,如此,將可使抽氣模組3對吸附板10的各區域產生大致均等的吸附力。如圖9所示,其顯示為本發明的曝光組件的底座20的另一實施例。底座20的各個呈現環狀的支撐凸條203中,可以是密集地設置有多個非呈現為環狀的支撐凸條203,如此,將可使抽氣模組3對吸附板10的各區域產生大致均等的吸附力。當然,非呈現為環狀的支撐凸條203,其外型、彼此間的距離及數量可以是依據需求加以變化,不以圖中所示為限。 As shown in FIG. 8, it is shown as a top view of a second embodiment of the base 20. The base 20 may include a plurality of support ribs 203 that are not annular, but not a ring-shaped support rib 203 and a plurality of support ribs 203 that are formed in a ring shape. The support bumps 204 may then be interspersed among the three gas flow paths 201B, 201C, 201D. The support ribs 203, which are not annular, may also be used to support the adsorption plate 10; of course, in special applications, some of the support ribs 203 may not be used to support the adsorption plate 10, but only Guide and limit gas flow Component to. It is worth mentioning that when the support ribs 203 which are not formed in a ring shape are disposed in the three gas flow paths 201B, 201C, and 201D, the gas flow paths 201B, 201C, and 201D may be further divided into smaller flow paths. In this way, the gas flow paths 201B1, 201B2, 201C1, 201C2, 201D1, and 201D2 can cause the suction module 3 to generate substantially equal adsorption force to each region of the adsorption plate 10. As shown in Figure 9, another embodiment of the base 20 of the exposure assembly of the present invention is shown. In each of the annular support ribs 203 of the base 20, a plurality of support ribs 203 which are not annularly formed may be densely arranged, so that the pumping module 3 can be applied to each area of the adsorption plate 10. Produces a roughly equal adsorption force. Of course, the shape, the distance and the number of the support ribs 203 that are not in the form of a ring may be changed according to requirements, and are not limited to those shown in the drawings.
以上所述僅為本發明的較佳可行實施例,非因此侷限本發明的專利範圍,故舉凡運用本發明說明書及圖式內容所做的等效技術變化,均包含於本發明的保護範圍內。 The above description is only a preferred embodiment of the present invention, and is not intended to limit the scope of the present invention. Therefore, equivalent technical changes made by using the present specification and the contents of the drawings are included in the protection scope of the present invention. .
Claims (12)
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