TW201930316A - Heterocyclic benzosultams and analogues - Google Patents
Heterocyclic benzosultams and analogues Download PDFInfo
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- TW201930316A TW201930316A TW107146302A TW107146302A TW201930316A TW 201930316 A TW201930316 A TW 201930316A TW 107146302 A TW107146302 A TW 107146302A TW 107146302 A TW107146302 A TW 107146302A TW 201930316 A TW201930316 A TW 201930316A
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- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D513/00—Heterocyclic compounds containing in the condensed system at least one hetero ring having nitrogen and sulfur atoms as the only ring hetero atoms, not provided for in groups C07D463/00, C07D477/00 or C07D499/00 - C07D507/00
- C07D513/02—Heterocyclic compounds containing in the condensed system at least one hetero ring having nitrogen and sulfur atoms as the only ring hetero atoms, not provided for in groups C07D463/00, C07D477/00 or C07D499/00 - C07D507/00 in which the condensed system contains two hetero rings
- C07D513/04—Ortho-condensed systems
-
- A—HUMAN NECESSITIES
- A01—AGRICULTURE; FORESTRY; ANIMAL HUSBANDRY; HUNTING; TRAPPING; FISHING
- A01N—PRESERVATION OF BODIES OF HUMANS OR ANIMALS OR PLANTS OR PARTS THEREOF; BIOCIDES, e.g. AS DISINFECTANTS, AS PESTICIDES OR AS HERBICIDES; PEST REPELLANTS OR ATTRACTANTS; PLANT GROWTH REGULATORS
- A01N43/00—Biocides, pest repellants or attractants, or plant growth regulators containing heterocyclic compounds
- A01N43/90—Biocides, pest repellants or attractants, or plant growth regulators containing heterocyclic compounds having two or more relevant hetero rings, condensed among themselves or with a common carbocyclic ring system
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- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D417/00—Heterocyclic compounds containing two or more hetero rings, at least one ring having nitrogen and sulfur atoms as the only ring hetero atoms, not provided for by group C07D415/00
- C07D417/02—Heterocyclic compounds containing two or more hetero rings, at least one ring having nitrogen and sulfur atoms as the only ring hetero atoms, not provided for by group C07D415/00 containing two hetero rings
- C07D417/04—Heterocyclic compounds containing two or more hetero rings, at least one ring having nitrogen and sulfur atoms as the only ring hetero atoms, not provided for by group C07D415/00 containing two hetero rings directly linked by a ring-member-to-ring-member bond
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- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Life Sciences & Earth Sciences (AREA)
- Agronomy & Crop Science (AREA)
- Pest Control & Pesticides (AREA)
- Plant Pathology (AREA)
- Health & Medical Sciences (AREA)
- Engineering & Computer Science (AREA)
- Dentistry (AREA)
- General Health & Medical Sciences (AREA)
- Wood Science & Technology (AREA)
- Zoology (AREA)
- Environmental Sciences (AREA)
- Plural Heterocyclic Compounds (AREA)
- Agricultural Chemicals And Associated Chemicals (AREA)
Abstract
Description
本發明係關於殺真菌活性化合物,更具體言之,關於雜環的苯磺內醯胺及其類似物、用於其製備之方法及中間體以及其作為殺真菌活性化合物、尤其呈殺真菌劑組合物形式的用途。本發明亦關於使用此等化合物或包含其之組合物來控制植物病原性真菌之方法。The present invention relates to fungicidal active compounds, more particularly to benzene sulfonamide and analogs thereof, to methods and intermediates therefor, and to fungicidal active compounds, especially fungicides Use of the composition form. The invention also relates to methods of using such compounds or compositions comprising the same to control phytopathogenic fungi.
含氮雜環的化合物已知適用作對抗或防止微生物感染之作物保護劑。舉例而言,JP2014/221747及JP2008/088139揭示可用作殺真菌劑之經取代喹啉衍生物。JP 2017/001998揭示可用作殺真菌劑之其他經取代喹啉衍生物。詳言之,JP 2017/001998揭示具有鍵結至喹啉環之3-位置的1,4-苯并噻嗪-1,3-二酮或1,4-苯并噻嗪-1,1,3-三酮環之化合物。然而,其並未揭示具有包含兩個鍵結至喹啉環之3-位置之稠合雜環之雜環的化合物。因此,JP2017/001998中所揭示之化合物不僅僅係本發明化合物之異構體。Compounds containing nitrogen heterocycles are known to be useful as crop protection agents against or against microbial infections. For example, JP 2014/221747 and JP 2008/088139 disclose substituted quinoline derivatives useful as fungicides. JP 2017/001998 discloses other substituted quinoline derivatives which are useful as fungicides. In particular, JP 2017/001998 discloses 1,4-benzothiazin-1,3-dione or 1,4-benzothiazine-1,1 having a 3-position bonded to a quinoline ring, a compound of 3-trione ring. However, it does not disclose a compound having a heterocyclic ring containing two fused heterocyclic rings bonded to the 3-position of the quinoline ring. Therefore, the compounds disclosed in JP 2017/001998 are not only the isomers of the compounds of the present invention.
迄今為止已研發出多種殺真菌劑。然而,仍需要研發新穎殺真菌化合物本身,以便提供對廣譜真菌有效、具有較低毒性、較高選擇率、以較低劑量率使用之化合物,從而減少或避免不利的環境或毒理學效應同時仍允許有效有害生物控制。亦可能需要新穎化合物以防止出現殺真菌劑抗性。A variety of fungicides have been developed to date. However, there is still a need to develop novel fungicidal compounds per se in order to provide compounds that are effective against broad spectrum fungi, have lower toxicity, have higher selectivity, and are used at lower dosage rates, thereby reducing or avoiding adverse environmental or toxicological effects. At the same time, effective pest control is still allowed. Novel compounds may also be required to prevent fungicide resistance.
本發明提供在至少一些此等態樣中具有優於已知化合物及組合物之優勢之新穎殺真菌化合物。The present invention provides novel fungicidal compounds having advantages over known compounds and compositions in at least some of these aspects.
本發明係關於如申請專利範圍中所述且如本文所揭示之式(I)化合物,包含其之組合物,其用作殺真菌劑之用途及其製造方法。The present invention relates to a compound of formula (I) as described in the scope of the patent application and as disclosed herein, comprising a composition thereof for use as a fungicide and a process for its manufacture.
因此,本發明提供如下文所描述之雜環的苯磺內醯胺及其類似物,其可用作殺微生物劑,較佳用作殺真菌劑。Accordingly, the present invention provides a heterocyclic benzenesulfonamide and analogs thereof as described below, which are useful as microbicides, preferably as fungicides.
活性成分
本發明提供式(I)化合物
其中
● A係5員或6員不飽和雜環,其包含1、2或3個獨立地選自由N、O及S組成之清單的雜原子;
● Z選自由以下組成之群:氫原子、鹵素原子、C1
-C8
烷基、包含至多9個可相同或不同之鹵素原子之C1
-C8
鹵烷基、C2
-C8
烯基、包含至多9個可相同或不同之鹵素原子之C2
-C8
鹵代烯基、C2
-C8
炔基、包含至多9個可相同或不同之鹵素原子之C2
-C8
鹵代炔基、C3
-C7
環烷基、C4-
C7
環烯基、羥基、C1
-C8
烷氧基、包含至多9個可相同或不同之鹵素原子之C1
-C8
鹵代烷氧基、芳基、雜環基、甲醯基、C1
-C8
烷基羰基、(羥亞胺基)C1
-C8
烷基、(C1
-C8
烷氧基亞胺基)C1
-C8
烷基、羧基、C1
-C8
烷氧羰基、胺甲醯基、C1
-C8
烷基胺甲醯基、二C1
-C8
烷基胺甲醯基、胺基、C1
-C8
烷基胺基、二C1
-C8
烷基胺基、氫硫基、C1
-C8
烷基氫硫基、C1
-C8
烷基亞磺醯基、C1
-C8
烷基磺醯基、C1
-C6
三烷基矽基、氰基及硝基,其中Z中之各者視情況經取代;
● n係0、1、2或3;
● X係獨立地選自由以下組成之群:鹵素原子、C1
-C8
烷基、包含至多9個可相同或不同之鹵素原子之C1
-C8
鹵代烷基、C2
-C8
烯基、包含至多9個可相同或不同之鹵素原子之C2
-C8
鹵代烯基、C2
-C8
炔基、包含至多9個可相同或不同之鹵素原子之C2
-C8
鹵代炔基、C3
-C7
環烷基、包含至多9個可相同或不同之鹵素原子之C3
-C7
鹵代環烷基、C3
-C7
環烷基-C1
-C8
烷基、C4
-C7
環烯基、羥基、C1
-C8
烷氧基、包含至多9個可相同或不同之鹵素原子之C1
-C8
鹵代烷氧基、芳基、芳基-C1
-C8
烷基、雜環基、雜環基-C1
-C8
烷基、甲醯基、C1
-C8
烷基羰基、包含至多9個可相同或不同之鹵素原子之C1
-C8
鹵代烷基羰基、(羥亞胺基)C1
-C8
烷基、(C1
-C8
烷氧基亞胺基)C1
-C8
烷基、羧基、C1
-C8
烷氧羰基、包含至多9個可相同或不同之鹵素原子之C1
-C8
鹵代烷氧基羰基、胺甲醯基、C1
-C8
烷基胺甲醯基、二C1
-C8
烷基胺甲醯基、胺基、C1
-C8
烷基胺基、二C1
-C8
烷基胺基、氫硫基、C1
-C8
烷基氫硫基、C1
-C8
烷基亞磺醯基、C1
-C8
烷基磺醯基、C1
-C6
三烷基矽基、C1
-C6
三烷基矽基-C1
-C6
烷基、氰基及硝基,其中X中之各者視情況經取代;
● W係CY1
或N,其中:
- Y1
選自由以下組成之群:氫原子、鹵素原子、C1
-C8
烷基、包含至多9個可相同或不同之鹵素原子之C1
-C8
鹵代烷基、C2
-C8
烯基、包含至多9個可相同或不同之鹵素原子之C2
-C8
鹵代烯基、C2
-C8
炔基、包含至多9個可相同或不同之鹵素原子之C2
-C8
鹵代炔基、C3
-C7
環烷基、C4
-C7
環烯基、羥基、C1
-C8
烷氧基、包含至多9個可相同或不同之鹵素原子之C1
-C8
鹵代烷氧基、芳基、雜環基、甲醯基、C1
-C8
烷基羰基、(羥亞胺基)C1
-C8
烷基、羧基、(C1
-C8
烷氧基亞胺基)C1
-C8
烷基、C1
-C8
烷氧羰基、胺甲醯基、C1
-C8
烷基胺甲醯基、二C1
-C8
烷基胺甲醯基、胺基、C1
-C8
烷基胺基、二C1
-C8
烷基胺基、氫硫基、C1
-C8
烷基氫硫基、C1
-C8
烷基亞磺醯基、C1
-C8
烷基磺醯基、C1
-C6
三烷基矽基、氰基及硝基,其中Y中之各者視情況經取代;
● Y2
、Y3
、Y4
及Y5
係獨立地選自由以下組成之群:氫原子、鹵素原子、C1
-C8
烷基、包含至多9個可相同或不同之鹵素原子之C1
-C8
鹵代烷基、C2
-C8
烯基、包含至多9個可相同或不同之鹵素原子之C2
-C8
鹵代烯基、C2
-C8
炔基、包含至多9個可相同或不同之鹵素原子之C2
-C8
鹵代炔基、C3
-C7
環烷基、C4
-C7
環烯基、羥基、C1
-C8
烷氧基、包含至多9個可相同或不同之鹵素原子之C1
-C8
鹵代烷氧基、芳基、雜環基、甲醯基、C1
-C8
烷基羰基、(羥亞胺基)C1
-C8
烷基、羧基、(C1
-C8
烷氧基亞胺基)C1
-C8
烷基、C1
-C8
烷氧羰基、胺甲醯基、C1
-C8
烷基胺甲醯基、二C1
-C8
烷基胺甲醯基、胺基、C1
-C8
烷基胺基、二C1
-C8
烷基胺基、氫硫基、C1
-C8
烷基氫硫基、C1
-C8
烷基亞磺醯基、C1
-C8
烷基磺醯基、C1
-C6
三烷基矽基、氰基及硝基,其中Y中之各者視情況經取代;
● L1
係CR1a
R1b
,其中:
- R1a
及R1b
係獨立地選自由以下組成之群:氫原子、鹵素原子、C1
-C8
烷基、包含至多9個可相同或不同之鹵素原子之C1
-C8
鹵代烷基、C2
-C8
烯基、包含至多9個可相同或不同之鹵素原子之C2
-C8
鹵代烯基、C2
-C8
炔基、包含至多9個可相同或不同之鹵素原子之C2
-C8
鹵代炔基、C3
-C7
環烷基、包含至多9個可相同或不同之鹵素原子之C3
-C7
鹵代環烷基、C3
-C7
環烷基-C1
-C8
烷基、芳基、芳基-C1
-C8
烷基、雜環基、雜環基-C1
-C8
烷基、羥基、C1
-C8
烷氧基及包含至多9個可相同或不同之鹵素原子之C1
-C8
鹵代烷氧基,其中R1a
及R1b
中之各者視情況經取代,或
- R1a
及R1b
連同其所連接之碳原子一起形成3員、4員、5員或6員飽和或部分飽和的視情況經取代之碳環或雜環,其包含至少1個選自由N、O及S組成之清單的雜原子,或
- R1a
及R1b
連同其所連接之碳原子一起形成未經取代或經取代之飽和或部分不飽和的雙環[m1
,m2
,0]-C6
-C11
烷基,其中m2
≥ 1且m1
+ m2
= 4至9,或
- R1a
及R1b
連同其所連接之碳原子一起形成未經取代或經取代之飽和或部分不飽和的雜雙環[m1
,m2
,0]-C6
-C11
烷基,其包含1至4個獨立地選自由N、O及S組成之清單的雜原子,其中m2
≥ 1且m1
+ m2
= 4至9,或
- R1a
及R1b
連同其所連接之碳原子一起形成未經取代或經取代之飽和或部分不飽和的螺[n1
,n2
]-C5
-C11
烷基,其中n1
≥ 2且n1
+ n2
= 4至10,或
- R1a
及R1b
連同其所連接之碳原子一起形成未經取代或經取代之飽和或部分不飽和的雜螺[n1
,n2
]-C5
-C11
烷基,其包含1至4個獨立地選自由N、O及S組成之清單的雜原子,其中n1
≥ 2且n1
+ n2
= 4至10,或
- R1a
及R1b
連同其所連接之碳原子一起形成未經取代或經取代之亞甲基;
● L2
係直接鍵、CR2a
R2b
或C(=O),其中
- R2a
及R2b
係獨立地選自由以下組成之群:氫原子、鹵素原子、C1
-C8
烷基、包含至多9個可相同或不同之鹵素原子之C1
-C8
鹵代烷基、C2
-C8
烯基、包含至多9個可相同或不同之鹵素原子之C2
-C8
鹵代烯基、C2
-C8
炔基、包含至多9個可相同或不同之鹵素原子之C2
-C8
鹵代炔基、C3
-C7
環烷基、包含至多9個可相同或不同之鹵素原子之C3
-C7
鹵代環烷基、C3
-C7
環烷基-C1
-C8
烷基、芳基、芳基-C1
-C8
烷基、雜環基、雜環基-C1
-C8
烷基、羥基、C1
-C8
烷氧基、包含至多9個可相同或不同之鹵素原子之C1
-C8
鹵代烷氧基、C2
-C8
烯氧基、包含至多9個可相同或不同之鹵素原子之C2
-C8
鹵代烯氧基、C3
-C8
炔氧基、包含至多9個可相同或不同之鹵素原子之C3
-C8
鹵代炔氧基、C3
-C7
環烷氧基、包含至多9個可相同或不同之鹵素原子之C3
-C7
鹵代環烷氧基、C3
-C7
環烷基-C1
-C8
烷氧基、芳氧基、芳基-C1
-C8
烷氧基、雜環基氧基、雜環基-C1
-C8
烷氧基及包含1至5個獨立地選自由N、O及S組成之清單的雜原子之部分飽和或不飽和稠合雙環9員、10員或11員雜環基-C1
-C8
烷氧基,其中R2a
及R2b
中之各者視情況經取代,或
- R2a
及R2b
連同其所連接之碳原子一起形成未經取代或經取代之3員、4員、5員或6員飽和或部分飽和的碳環或雜環,其包含至少1個選自由N、O及S組成之清單的雜原子,或
- R2a
及R2b
連同其所連接之碳原子一起形成未經取代或經取代之飽和或部分不飽和的雙環[m1
,m2
,0]-C6
-C11
烷基,其中m2
≥1且m1
+ m2
= 4至9,或
- R2a
及R2b
連同其所連接之碳原子一起形成未經取代或經取代之飽和或部分不飽和的雜雙環[m1
,m2
,0]-C6
-C11
烷基,其包含1至4個獨立地選自由N、O及S組成之清單的雜原子,其中m2
≥ 1且m1
+ m2
= 4至9,或
- R2a
及R2b
連同其所連接之碳原子一起形成未經取代或經取代之飽和或部分不飽和的螺[n1
,n2
]-C5
-C11
烷基,其中n1
≥ 2且n1
+ n2
= 4至10,或
- R2a
及R2b
連同其所連接之碳原子一起形成未經取代或經取代之飽和或部分不飽和的雜螺[n1
,n2
]-C5
-C11
烷基,其包含1至4個獨立地選自由N、O及S組成之清單的雜原子,其中n1
≥ 2且n1
+ n2
= 4至10,或
- R2a
及R2b
連同其所連接之碳原子一起形成未經取代或經取代之亞甲基;
以及其鹽、N-氧化物、金屬錯合物、類金屬錯合物及光學活性異構體或幾何異構體。 Active ingredient The present invention provides a compound of formula (I)
Wherein A is a 5- or 6-membered unsaturated heterocyclic ring comprising 1, 2 or 3 heteroatoms independently selected from the list consisting of N, O and S;
● Group Z is selected from the group consisting of: a hydrogen atom, a halogen atom, C 1 -C 8 alkyl group, may contain up to 9 identical or different halogen atoms C 1 -C 8 haloalkyl, C 2 -C 8 alkenyl a C 2 -C 8 haloalkenyl group, a C 2 -C 8 alkynyl group containing up to 9 halogen atoms which may be the same or different, and a C 2 -C 8 halogen containing up to 9 halogen atoms which may be the same or different Generation alkynyl, C 3 -C 7 cycloalkyl, C 4- C 7 cycloalkenyl, hydroxy, C 1 -C 8 alkoxy group, may contain up to 9 identical or different halogen atoms C 1 -C 8 Haloalkoxy, aryl, heterocyclic, indolyl, C 1 -C 8 alkylcarbonyl, (hydroxyimino) C 1 -C 8 alkyl, (C 1 -C 8 alkoxyimino) a C 1 -C 8 alkyl group, a carboxyl group, a C 1 -C 8 alkoxycarbonyl group, an amine carbenyl group, a C 1 -C 8 alkylamine carbenyl group, a di C 1 -C 8 alkylamine carbenyl group, Amino, C 1 -C 8 alkylamino, di C 1 -C 8 alkylamino, thiol, C 1 -C 8 alkyl thiol, C 1 -C 8 alkyl sulfinyl a C 1 -C 8 alkylsulfonyl group, a C 1 -C 6 trialkylsulfonyl group, a cyano group and a nitro group, wherein each of Z is optionally substituted;
● n is 0, 1, 2 or 3;
● X is independently selected from the lines of the group consisting of: a halogen atom, C 1 -C 8 alkyl group, may contain up to 9 identical or different halogen atoms C 1 -C 8 -haloalkyl, C 2 -C 8 alkenyl group a C 2 -C 8 haloalkenyl group, a C 2 -C 8 alkynyl group containing up to 9 halogen atoms which may be the same or different, a C 2 -C 8 halogenated group containing up to 9 halogen atoms which may be the same or different alkynyl group, C 3 -C 7 cycloalkyl group, comprising up to 9 identical or different halogen atoms of C 3 -C 7 halocycloalkyl, C 3 -C 7 cycloalkyl, -C 1 -C 8 alkyl a C 4 -C 7 cycloalkenyl group, a hydroxyl group, a C 1 -C 8 alkoxy group, a C 1 -C 8 haloalkoxy group, an aryl group, an aryl group-C containing up to 9 halogen atoms which may be the same or different 1 -C 8 alkyl, heterocyclyl, heterocyclyl -C 1 -C 8 alkyl, methyl acyl, C 1 -C 8 alkylcarbonyl group, containing up to C 9 can be the same or different halogen atoms 1 -C 8 haloalkylcarbonyl, (hydroxyimino) C 1 -C 8 alkyl, (C 1 -C 8 alkoxyimino) C 1 -C 8 alkyl, carboxyl, C 1 -C 8 alkane Oxycarbonyl group, C 1 -C 8 haloalkoxycarbonyl group containing at most 9 halogen atoms which may be the same or different, amine mercapto group, C 1 -C 8 alkylamine methyl sulfonyl, di C 1 -C 8 alkylamine carbhydryl, amine, C 1 -C 8 alkylamino, di C 1 -C 8 alkylamino, thiol, C mercapto 1 -C 8 alkyl, C 1 -C 8 alkylsulfinyl acyl, C 1 -C 8 alkylsulfonyl group, C 1 -C 6 trialkyl silicon based, C 1 -C 6 three An alkylthio-C 1 -C 6 alkyl group, a cyano group and a nitro group, wherein each of X is optionally substituted;
● W is CY 1 or N, where:
- Y 1 is selected from the group consisting of: a hydrogen atom, a halogen atom, C 1 -C 8 alkyl group, may contain up to 9 identical or different halogen atoms C 1 -C 8 -haloalkyl, C 2 -C 8 alkenyl a C 2 -C 8 haloalkenyl group, a C 2 -C 8 alkynyl group containing up to 9 halogen atoms which may be the same or different, and a C 2 -C 8 halogen containing up to 9 halogen atoms which may be the same or different Generation alkynyl, C 3 -C 7 cycloalkyl, C 4 -C 7 cycloalkenyl, hydroxy, C 1 -C 8 alkoxy group, may contain up to 9 identical or different halogen atoms C 1 -C 8 Haloalkoxy, aryl, heterocyclic, indolyl, C 1 -C 8 alkylcarbonyl, (hydroxyimino) C 1 -C 8 alkyl, carboxy, (C 1 -C 8 alkoxy Amino)C 1 -C 8 alkyl, C 1 -C 8 alkoxycarbonyl, aminecarbamyl, C 1 -C 8 alkylaminecarbamyl, di C 1 -C 8 alkylaminecarbamyl, Amino, C 1 -C 8 alkylamino, di C 1 -C 8 alkylamino, thiol, C 1 -C 8 alkyl thiol, C 1 -C 8 alkyl sulfinyl a C 1 -C 8 alkylsulfonyl group, a C 1 -C 6 trialkylsulfonyl group, a cyano group and a nitro group, wherein each of Y is optionally substituted;
● Y 2, Y 3, Y 4 and Y 5 are independently selected from the system consisting of the group consisting of: a hydrogen atom, a halogen atom, C 1 -C 8 alkyl group, containing up to C 9 can be the same or different halogen atoms 1 -C 8 haloalkyl, C 2 -C 8 alkenyl, C 2 -C 8 haloalkenyl, C 2 -C 8 alkynyl containing up to 9 halogen atoms which may be the same or different, containing up to 9 may be the same Or a different halogen atom of C 2 -C 8 haloalkynyl, C 3 -C 7 cycloalkyl, C 4 -C 7 cycloalkenyl, hydroxy, C 1 -C 8 alkoxy, containing up to 9 identical or different halogen atoms C 1 -C 8 haloalkoxy group, an aryl group, a heterocyclic group, carboxylic acyl, C 1 -C 8 alkylcarbonyl group, (hydroxyimino) C 1 -C 8 alkyl, Carboxyl group, (C 1 -C 8 alkoxyimino)C 1 -C 8 alkyl group, C 1 -C 8 alkoxycarbonyl group, amine carbenyl group, C 1 -C 8 alkylamine carbenyl group, two C 1 -C 8 alkylaminecarbamyl, amine, C 1 -C 8 alkylamino, di C 1 -C 8 alkylamino, thiol, C 1 -C 8 alkyl thiol , C 1 -C 8 alkylsulfinyl, C 1 -C 8 alkylsulfonyl, C 1 -C 6 trialkylindolyl, cyano and nitro, wherein each of Y is optionally Replace
● L 1 is CR 1a R 1b , where:
- R 1a and R 1b are independently selected from the group consisting of a hydrogen atom, a halogen atom, a C 1 -C 8 alkyl group, a C 1 -C 8 haloalkyl group containing up to 9 halogen atoms which may be the same or different, C 2 -C 8 alkenyl group, may contain up to 9 identical or different halogen atoms C 2 -C 8 haloalkenyl, C 2 -C 8 alkynyl group, may contain up to 9 identical or different halogen atoms halo C 2 -C 8 alkynyl, C 3 -C 7 cycloalkyl group, comprising up to 9 identical or different halogen atoms of C 3 -C 7 halocycloalkyl, C 3 -C 7 cycloalkyl -C 1 -C 8 alkyl, aryl, aryl-C 1 -C 8 alkyl, heterocyclic, heterocyclyl-C 1 -C 8 alkyl, hydroxy, C 1 -C 8 alkoxy and a C 1 -C 8 haloalkoxy group containing up to 9 halogen atoms which may be the same or different, wherein each of R 1a and R 1b is optionally substituted, or
- R 1a and R 1b together with the carbon atom to which they are attached form a 3 member, 4 member, 5 member or 6 membered saturated or partially saturated optionally substituted carbocyclic or heterocyclic ring comprising at least one selected from the group consisting of N a hetero atom of the list of O and S, or
- R 1a and R 1b together with the carbon atom to which they are attached form an unsubstituted or substituted saturated or partially unsaturated bicyclo[m 1 , m 2 ,0]-C 6 -C 11 alkyl group, wherein m 2 ≥ 1 and m 1 + m 2 = 4 to 9, or
- R 1a and R 1b together with the carbon atoms they are attached together form the unsubstituted or substituted saturated or partially unsaturated bicyclic heteroaryl [m 1, m 2, 0 ] -C 6 -C 11 alkyl group, which comprises 1 to 4 heteroatoms independently selected from the list consisting of N, O and S, wherein m 2 ≥ 1 and m 1 + m 2 = 4 to 9, or
- R 1a and R 1b together with the carbon atom to which they are attached form an unsubstituted or substituted saturated or partially unsaturated spiro[n 1 ,n 2 ]-C 5 -C 11 alkyl group, wherein n 1 ≥ 2 And n 1 + n 2 = 4 to 10, or
- R 1a and R 1b together with the carbon atom to which they are attached form an unsubstituted or substituted saturated or partially unsaturated heterospiro[n 1 ,n 2 ]-C 5 -C 11 alkyl group, which comprises 1 to 4 heteroatoms independently selected from the list consisting of N, O and S, wherein n 1 ≥ 2 and n 1 + n 2 = 4 to 10, or
- R 1a and R 1b together with the carbon atom to which they are attached form an unsubstituted or substituted methylene group;
● L 2 is a direct key, CR 2a R 2b or C(=O), where
- R 2a and R 2b are independently selected from the group consisting of a hydrogen atom, a halogen atom, a C 1 -C 8 alkyl group, a C 1 -C 8 haloalkyl group containing up to 9 halogen atoms which may be the same or different, C 2 -C 8 alkenyl group, may contain up to 9 identical or different halogen atoms C 2 -C 8 haloalkenyl, C 2 -C 8 alkynyl group, may contain up to 9 identical or different halogen atoms halo C 2 -C 8 alkynyl, C 3 -C 7 cycloalkyl group, comprising up to 9 identical or different halogen atoms of C 3 -C 7 halocycloalkyl, C 3 -C 7 cycloalkyl -C 1 -C 8 alkyl, aryl, aryl-C 1 -C 8 alkyl, heterocyclic, heterocyclyl-C 1 -C 8 alkyl, hydroxy, C 1 -C 8 alkoxy, It may contain up to 9 identical or different halogen atoms C 1 -C 8 haloalkoxy, C 2 -C 8 alkenyl group, may contain up to 9 identical or different halogen atoms C 2 -C 8 haloalkenyl An oxy group, a C 3 -C 8 alkynyloxy group, a C 3 -C 8 haloalkynyloxy group containing up to 9 halogen atoms which may be the same or different, a C 3 -C 7 cycloalkoxy group, containing up to 9 C of the same or different halogen atoms, haloalkoxy of 3 -C 7 cycloalkoxy, C 3 -C 7 cycloalkyl, -C 1 -C 8 alkyl Group, an aryloxy group, an aryl group -C 1 -C 8 alkoxy, heterocyclyloxy, heterocyclyl -C 1 -C 8 alkoxy and contains 1 to 5 substituents independently selected from the group consisting of N, O and a partially saturated or unsaturated fused bicyclic 9 member, 10 member or 11 membered heterocyclyl-C 1 -C 8 alkoxy group of the list of S constituents, wherein each of R 2a and R 2b is optionally Replace, or
- R 2a and R 2b together with the carbon atom to which they are attached form an unsubstituted or substituted 3, 4, 5 or 6 membered saturated or partially saturated carbocyclic or heterocyclic ring comprising at least one selected a heteroatom of a list of free N, O and S, or
- R 2a and R 2b together with the carbon atom to which they are attached form an unsubstituted or substituted saturated or partially unsaturated bicyclo[m 1 , m 2 ,0]-C 6 -C 11 alkyl group, wherein m 2 ≥1 and m 1 + m 2 = 4 to 9, or
- R 2a and R 2b together with the carbon atoms they are attached together form the unsubstituted or substituted saturated or partially unsaturated bicyclic heteroaryl [m 1, m 2, 0 ] -C 6 -C 11 alkyl group, which comprises 1 to 4 heteroatoms independently selected from the list consisting of N, O and S, wherein m 2 ≥ 1 and m 1 + m 2 = 4 to 9, or
- R 2a and R 2b together with the carbon atom to which they are attached form an unsubstituted or substituted saturated or partially unsaturated spiro[n 1 ,n 2 ]-C 5 -C 11 alkyl group, wherein n 1 ≥ 2 And n 1 + n 2 = 4 to 10, or
- R 2a and R 2b together with the carbon atom to which they are attached form an unsubstituted or substituted saturated or partially unsaturated heterospiro[n 1 ,n 2 ]-C 5 -C 11 alkyl group, which comprises 1 to 4 heteroatoms independently selected from the list consisting of N, O and S, wherein n 1 ≥ 2 and n 1 + n 2 = 4 to 10, or
- R 2a and R 2b together with the carbon atom to which they are attached form an unsubstituted or substituted methylene group;
And salts thereof, N-oxides, metal complexes, metalloid complexes, and optically active isomers or geometric isomers.
如本文所用,當變數(例如X、Y1 、Y2 、Y3 、Y4 、Y5 或Z)稱為「視情況經取代」時,應瞭解此變數適用於含有碳-氫鍵之部分,其中氫原子經對應取代基取代,且不適用於諸如氫、鹵素、CN或其類似部分之部分。變數可經一或多個可相同或不同之取代基取代。表述「一或多個取代基」係指可能基於可用的鍵結位點之數目,在一個至最多個取代基範圍內之多個取代基,其限制條件為滿足穩定性及化學可行性之條件。經取代變數之一或多個取代基可獨立地選自由以下組成之群:鹵素原子、硝基、羥基、氰基、胺基、氫硫基、五氟-λ6 -硫基、甲醯基、胺甲醯基、胺基甲酸酯基、C1 -C8 烷基、三(C1 -C8 烷基)矽基、C3 -C7 環烷基、具有1至5個鹵素原子之C1 -C8 鹵代烷基、具有1至5個鹵素原子之C3 -C7 鹵代環烷基、C2 -C8 烯基、C2 -C8 炔基、C1 -C8 烷基胺基、二C1 -C8 烷基胺基、C1 -C8 烷氧基、具有1至5個鹵素原子之C1 -C8 鹵代烷氧基、C1 -C8 烷基羰基、具有1至5個鹵素原子之C1 -C8 鹵代烷基羰基、C1 -C8 烷基胺甲醯基、二C1 -C8 烷基胺甲醯基、C1 -C8 烷基羰基、具有1至5個鹵素原子之C1 -C8 鹵代烷氧基羰基、C1 -C8 烷基羰氧基、具有1至5個鹵素原子之C1 -C8 鹵代烷基羰氧基、C1 -C8 烷基羰基胺基、具有1至5個鹵素原子之C1 -C8 鹵代烷基羰基胺基、C1 -C8 烷基氫硫基、具有1至5個鹵素原子之C1 -C8 鹵代烷基硫基、C1 -C8 烷基亞磺醯基、具有1至5個鹵素原子之C1 -C8 鹵代烷基亞磺醯基、C1 -C8 烷基磺醯基及具有1至5個鹵素原子之C1 -C8 鹵代烷基磺醯基。As used herein, when a variable (eg, X, Y 1 , Y 2 , Y 3 , Y 4 , Y 5 , or Z) is referred to as "optionally substituted," it should be understood that this variable applies to a moiety containing a carbon-hydrogen bond. Wherein a hydrogen atom is substituted with a corresponding substituent and is not suitable for a moiety such as hydrogen, halogen, CN or the like. The variables may be substituted by one or more substituents which may be the same or different. The expression "one or more substituents" refers to a plurality of substituents within a range of one to a plurality of substituents, possibly based on the number of available bonding sites, subject to conditions that satisfy stability and chemical feasibility. . The one or more substituents of the substitution variable may be independently selected from the group consisting of a halogen atom, a nitro group, a hydroxyl group, a cyano group, an amine group, a thio group, a pentafluoro-λ 6 -thio group, a fluorenyl group. , amidyl, urethane, C 1 -C 8 alkyl, tri(C 1 -C 8 alkyl)indenyl, C 3 -C 7 cycloalkyl, having 1 to 5 halogen atoms C 1 -C 8 haloalkyl, C 3 -C 7 halocycloalkyl having 1 to 5 halogen atoms, C 2 -C 8 alkenyl, C 2 -C 8 alkynyl, C 1 -C 8 alkane amino group, di-C 1 -C 8 alkylamino, C 1 -C 8 alkoxy group having a C 1 to 5 halogen atoms 1 -C 8 haloalkoxy, C 1 -C 8 alkylcarbonyl, C 1 -C 8 haloalkylcarbonyl group having 1 to 5 halogen atoms, C 1 -C 8 alkylamine carbenyl group, di C 1 -C 8 alkylamine carbenyl group, C 1 -C 8 alkylcarbonyl group having a C 1 to 5 halogen atoms, haloalkoxy of 1 -C 8 alkoxycarbonyl, C 1 -C 8 alkylcarbonyloxy group having a C 1 to 5 halogen atoms, haloalkyl of 1 -C 8 alkylcarbonyloxy, C 1 -C 8 alkylcarbonyl group having a C 1 to 5 halogen atoms, haloalkyl of 1 -C 8 alkylcarbonyl group, C 1 -C 8 alkyl mercapto having 1 to 5 halogen atoms Haloalkyl of C 1 -C 8 alkylthio, C 1 -C 8 alkylsulfinyl acyl having a C 1 to 5 halogen atoms, haloalkyl of 1 -C 8 alkylsulfinyl acyl, C 1 -C 8 alkyl A sulfonyl group and a C 1 -C 8 haloalkylsulfonyl group having 1 to 5 halogen atoms.
如本文所用,鹵素意謂氟、氯、溴或碘;甲醯基意謂-C(=O)H;羧基意謂-C(=O)OH;羰基意謂-C(=O)-;胺甲醯基意謂-C(=O)NH2 ;三氟甲磺醯基意謂-SO2 -CF3 ;SO表示亞碸基團;SO2 表示碸基團;雜原子意謂硫、氮或氧;亞甲基意謂二價基團=CH2 ;芳基通常意謂苯基或萘基。As used herein, halogen means fluorine, chlorine, bromine or iodine; formazan means -C(=O)H; carboxyl means -C(=O)OH; carbonyl means -C(=O)-; Aminomethylidene means -C(=O)NH 2 ; trifluoromethanesulfonyl means -SO 2 -CF 3 ; SO means an anthracene group; SO 2 means an anthracene group; a hetero atom means sulfur, Nitrogen or oxygen; methylene means a divalent group = CH 2 ; aryl usually means phenyl or naphthyl.
除非另外提供,否則諸如表述「未經取代或經取代之雜環基」中所用之術語「雜環基」意謂不飽和、飽和或部分飽和的5員至7員環,較佳5員至6員環,其包含1至4個獨立地選自由N、O及S組成之清單的雜原子。如本文中所用之術語「雜環基」涵蓋雜芳基。The term "heterocyclyl" as used in the expression "unsubstituted or substituted heterocyclic group", unless otherwise provided, means an unsaturated, saturated or partially saturated 5- to 7-membered ring, preferably 5 members. A 6-membered ring comprising from 1 to 4 heteroatoms independently selected from the list consisting of N, O and S. The term "heterocyclyl" as used herein encompasses a heteroaryl group.
諸如本文例如在表述「5員至7員環」或「9員、10員或11員雜環基環」中所用之術語「員」表示構成環之骨架原子之數目。The term "member" as used herein, for example, in the expression "5 to 7 member ring" or "9 member, 10 member or 11 member heterocyclic ring" means the number of skeleton atoms constituting the ring.
如本文所使用,表述「部分飽和或不飽和稠合雙環的9員、10員或11員雜環基環」表示包含與不飽和環稠合之飽和環或兩個稠合不飽和環的稠合雙環系統,該雙環系統由9至11個骨架原子構成。As used herein, the expression "a 9-membered, 10-membered or 11-membered heterocyclyl ring of a partially saturated or unsaturated fused bicyclic ring" means a thickened saturated ring or two fused unsaturated rings fused to an unsaturated ring. In the double loop system, the double loop system consists of 9 to 11 skeleton atoms.
如本文所使用,含有此等術語之烷基、烯基及炔基以及部分,可為直鏈或分支鏈。As used herein, alkyl, alkenyl and alkynyl groups and moieties containing such terms may be straight or branched.
如本文所用,術語「碳環」表示烴環。As used herein, the term "carbocycle" means a hydrocarbon ring.
當胺基或任何其他含胺基基團之胺基部分經兩個可相同或不同之取代基取代時,該兩個取代基連同其所連接之氮原子一起可形成雜環基,較佳5員至7員雜環基,其可經取代或可包括其他雜原子,例如N-嗎啉基或哌啶基。When an amine group or any other amine group containing an amine group is substituted with two substituents which may be the same or different, the two substituents together with the nitrogen atom to which they are attached may form a heterocyclic group, preferably 5 A 7-membered heterocyclic group which may be substituted or may include other heteroatoms such as N-morpholinyl or piperidinyl.
視化合物中之不對稱中心數而定,本發明化合物中之任一者可以一或多種光學或對掌性異構體形式存在。因此,本發明同樣係關於其光學異構體及外消旋或非外消旋混合物(術語「非外消旋」指示不同比例之對映異構體之混合物)且關於呈各種比例之所有可能的混合物。非對映異構體及/或光學異構體可根據一般熟習此項技術者本身已知之方法來分離。Depending on the number of asymmetric centers in the compound, any of the compounds of the invention may exist in one or more optical or palmical isomer forms. Thus, the present invention is also concerned with optical isomers and racemic or non-racemic mixtures (the term "non-racemic" indicates mixtures of enantiomers in different ratios) and all possibilities in various ratios mixture. Diastereomers and/or optical isomers may be separated according to methods generally known per se to those skilled in the art.
視化合物中之雙鍵數而定,本發明化合物中之任一者亦可以一或多種幾何異構體形式存在。因此,本發明同樣係關於所有幾何異構體及呈所有比例之所有可能混合物。幾何異構體可根據一般熟習此項技術者本身已知之通用方法來分離。Depending on the number of double bonds in the compound, any of the compounds of the invention may also exist in one or more geometric isomers. Accordingly, the invention is also to all geometric isomers and all possible mixtures in all ratios. Geometric isomers can be separated according to general methods known per se to those skilled in the art.
視鏈或環之取代基之相對位置(同側/反側或順式/反式)而定,本發明化合物中之任一者亦可以一或多種幾何異構體形式存在。因此,本發明同樣係關於所有同側/反側(或順式/反式)異構體及呈所有比例之所有可能同側/反側(或順式/反式)混合物。同側/反側(或順式/反式)異構體可根據一般熟習此項技術者本身已知之通用方法來分離。Depending on the relative position of the substituents of the chain or ring (ipsilateral/reverse or cis/trans), any of the compounds of the invention may also exist in one or more geometric isomers. Thus, the invention is also directed to all ipsilateral/reverse (or cis/trans) isomers and all possible ipsilateral/reverse (or cis/trans) mixtures in all ratios. The ipsilateral/reverse (or cis/trans) isomers can be separated according to the general methods known per se to those skilled in the art.
當本發明化合物可以互變異構形式存在時,此類化合物在上文及下文中亦應理解為在適用情況下包括對應互變異構形式,甚至在各種情況下未特定提及此等互變異構形式時亦如此。When the compounds of the invention may exist in tautomeric forms, such compounds are also to be understood above and in the following to include the corresponding tautomeric forms, where appropriate, even in each case without specifically mentioning such tautomerism. The same is true for the form.
式(I)化合物在本文中稱為「活性成分」。The compound of formula (I) is referred to herein as the "active ingredient."
在以上式(I)中,Z較佳選自由以下組成之群:氫原子、鹵素原子、未經取代或經取代之C1 -C6 烷基、包含至多9個可相同或不同之鹵素原子之C1 -C6 鹵代烷基、未經取代或經取代之C1 -C6 烷氧基、包含至多9個可相同或不同之鹵素原子之C1 -C6 鹵代烷氧基及氰基,更佳地,Z係氫原子、未經取代或經取代之C1 -C6 烷基(例如甲基)或包含至多9個可相同或不同之鹵素原子之C1 -C6 鹵代烷基,甚至更佳地,Z係氫原子In the above formula (I), Z is preferably selected from the group consisting of a hydrogen atom, a halogen atom, an unsubstituted or substituted C 1 -C 6 alkyl group, and contains up to 9 halogen atoms which may be the same or different. the C 1 -C 6 haloalkyl, unsubstituted or substituted with of C 1 -C 6 alkoxy group, may contain up to 9 identical or different halogen atoms C 1 -C 6 haloalkyl alkoxy and cyano, more Preferably, a Z-based hydrogen atom, an unsubstituted or substituted C 1 -C 6 alkyl group (for example a methyl group) or a C 1 -C 6 haloalkyl group containing up to 9 halogen atoms which may be the same or different, even more Good place, Z series hydrogen atom
在以上式(I)中,X較佳獨立地選自由以下組成之群:鹵素原子、未經取代或經取代之C1 -C6 烷基、包含至多9個可相同或不同之鹵素原子之C1 -C6 鹵代烷基、未經取代或經取代之C2 -C8 烯基、未經取代或經取代之C2 -C8 炔基、未經取代或經取代之C3 -C7 環烷基、羥基、未經取代或經取代之C1 -C6 烷氧基、包含至多9個可相同或不同之鹵素原子之C1 -C6 鹵代烷氧基、未經取代或經取代之芳基、未經取代或經取代之雜環基、未經取代或經取代之C1 -C6 烷基羰基、未經取代或經取代之C1 -C6 三烷基矽基-C1 -C6 烷基及未經取代或經取代之C1 -C6 三烷基矽基,更佳地,X係鹵素原子(氯原子、溴原子或氟原子)、未經取代或經取代之C1 -C6 烷基(例如甲基)、包含至多9個可相同或不同之鹵素原子之C1 -C6 鹵代烷基(例如三氟甲基)、未經取代或經取代之C1 -C6 烷氧基(例如甲氧基)、未經取代或經取代之C1 -C6 鹵代烷氧基(例如三氟甲氧基)或三甲基矽基,甚至更佳地,X係鹵素原子(例如氯原子、溴原子或氟原子)、未經取代之C1 -C6 烷基(例如甲基)或未經取代之C1 -C6 烷氧基(例如甲氧基)。In the above formula (I), X is preferably independently selected from the group consisting of a halogen atom, an unsubstituted or substituted C 1 -C 6 alkyl group, and containing up to 9 halogen atoms which may be the same or different. C 1 -C 6 haloalkyl, unsubstituted or substituted C 2 -C 8 alkenyl, unsubstituted or substituted C 2 -C 8 alkynyl, unsubstituted or substituted C 3 -C 7 cycloalkyl, hydroxy, unsubstituted or substituted with of C 1 -C 6 alkoxy group, may contain up to 9 identical or different halogen atoms C 1 -C 6 haloalkyl alkoxy, unsubstituted or substituted with the Aryl, unsubstituted or substituted heterocyclic group, unsubstituted or substituted C 1 -C 6 alkylcarbonyl, unsubstituted or substituted C 1 -C 6 trialkylindenyl-C 1 -C 6 alkyl group and unsubstituted or substituted C 1 -C 6 trialkyl fluorenyl group, more preferably, X-type halogen atom (chlorine atom, bromine atom or fluorine atom), unsubstituted or substituted C 1 -C 6 alkyl (for example methyl), C 1 -C 6 haloalkyl (for example trifluoromethyl) containing up to 9 halogen atoms which may be the same or different, unsubstituted or substituted C 1 - C 6 alkoxy (e.g. methoxy), The unsubstituted or substituted by C 1 -C 6 haloalkoxy (e.g. trifluoromethoxy), or trimethyl silicon based, even more preferably, X is a halogen atom-based (e.g. a chlorine atom, a bromine atom or a fluorine atom), Unsubstituted C 1 -C 6 alkyl (for example methyl) or unsubstituted C 1 -C 6 alkoxy (for example methoxy).
在上式(I)中,n較佳係0、1、2,更佳係0或1。In the above formula (I), n is preferably 0, 1, 2, more preferably 0 or 1.
在以上式(I)中,W較佳係CY1 或N,其中Y1 較佳選自由以下組成之群:氫原子、鹵素原子、未經取代或經取代之C1 -C6 烷基、包含至多9個可相同或不同之鹵素原子之C1 -C6 鹵代烷基、未經取代或經取代之C3 -C7 環烷基、羥基、未經取代或經取代之C1 -C6 烷氧基、包含至多9個可相同或不同之鹵素原子之C1 -C6 鹵代烷氧基、未經取代或經取代之C1 -C6 烷氧羰基、甲醯基及氰基,更佳地,Y1 係氫原子。In the above formula (I), W is preferably CY 1 or N, wherein Y 1 is preferably selected from the group consisting of a hydrogen atom, a halogen atom, an unsubstituted or substituted C 1 -C 6 alkyl group, a C 1 -C 6 haloalkyl group containing up to 9 halogen atoms which may be the same or different, an unsubstituted or substituted C 3 -C 7 cycloalkyl group, a hydroxyl group, an unsubstituted or substituted C 1 -C 6 Alkoxy, C 1 -C 6 haloalkoxy containing up to 9 halogen atoms which may be the same or different, unsubstituted or substituted C 1 -C 6 alkoxycarbonyl, methyl ketone and cyano group, more preferably Ground, Y 1 is a hydrogen atom.
在以上式(I)中,W較佳係CY1 ,其中Y1 選自由以下組成之群:氫原子、鹵素原子、未經取代或經取代之C1 -C6 烷基、包含至多9個可相同或不同之鹵素原子之C1 -C6 鹵代烷基、未經取代或經取代之C3 -C7 環烷基、羥基、未經取代或經取代之C1 -C6 烷氧基、包含至多9個可相同或不同之鹵素原子之C1 -C6 鹵代烷氧基、未經取代或經取代之C1 -C6 烷氧羰基、甲醯基及氰基,更佳地,Y1 係氫原子。In the above formula (I), W is preferably CY 1 , wherein Y 1 is selected from the group consisting of a hydrogen atom, a halogen atom, an unsubstituted or substituted C 1 -C 6 alkyl group, and contains at most 9 C 1 -C 6 haloalkyl which may be the same or different halogen atom, unsubstituted or substituted C 3 -C 7 cycloalkyl, hydroxy group, unsubstituted or substituted C 1 -C 6 alkoxy group, a C 1 -C 6 haloalkoxy group having up to 9 halogen atoms which may be the same or different, an unsubstituted or substituted C 1 -C 6 alkoxycarbonyl group, a decyl group and a cyano group, more preferably, Y 1 Is a hydrogen atom.
在以上式(I)中,Y2 、Y3 、Y4 或Y5 較佳獨立地選自由以下組成之群:氫原子、鹵素原子、未經取代或經取代之C1 -C6 烷基、包含至多9個可相同或不同之鹵素原子之C1 -C6 鹵代烷基、未經取代或經取代之C3 -C7 環烷基、羥基、未經取代或經取代之C1 -C6 烷氧基、包含至多9個可相同或不同之鹵素原子之C1 -C6 鹵代烷氧基、未經取代或經取代之C1 -C6 烷氧羰基、甲醯基及氰基,更佳地,Y2 、Y3 、Y4 或Y5 獨立地係氫原子、鹵素原子、未經取代或經取代之C1 -C6 烷基、包含至多9個可相同或不同之鹵素原子之C1 -C6 鹵代烷基(例如三氟甲基)或氰基,甚至更佳地,Y2 、Y3 、Y4 或Y5 獨立地係氫原子或鹵素原子。在一些實施例中,Y2 、Y3 及Y4 係氫原子,且Y5 係氫原子或鹵素原子。In the above formula (I), Y 2 , Y 3 , Y 4 or Y 5 is preferably independently selected from the group consisting of a hydrogen atom, a halogen atom, an unsubstituted or substituted C 1 -C 6 alkyl group. a C 1 -C 6 haloalkyl group containing up to 9 halogen atoms which may be the same or different, an unsubstituted or substituted C 3 -C 7 cycloalkyl group, a hydroxyl group, an unsubstituted or substituted C 1 -C 6 alkoxy group, may contain up to 9 identical or different halogen atoms C 1 -C 6 haloalkyl alkoxy, unsubstituted or substituted with of C 1 -C 6 alkoxycarbonyl group, a cyano group and acyl methyl, more Preferably, Y 2 , Y 3 , Y 4 or Y 5 is independently a hydrogen atom, a halogen atom, an unsubstituted or substituted C 1 -C 6 alkyl group, and contains up to 9 halogen atoms which may be the same or different. C 1 -C 6 haloalkyl (for example, trifluoromethyl) or cyano, even more preferably, Y 2 , Y 3 , Y 4 or Y 5 is independently a hydrogen atom or a halogen atom. In some embodiments, Y 2 , Y 3 , and Y 4 are hydrogen atoms, and Y 5 is a hydrogen atom or a halogen atom.
在以上式(I)中,R1a 及R1b 、或R2a 及R2b 連同其所連接之碳原子一起可形成3員、4員、5員或6員飽和或部分飽和的視情況經取代之碳環或雜環,其包含至少1個選自由N、O及S組成之清單的雜原子。In the above formula (I), R 1a and R 1b , or R 2a and R 2b together with the carbon atom to which they are attached may form a three-member, four-member, five-member or six-member saturated or partially saturated, as appropriate. A carbocyclic or heterocyclic ring comprising at least one heteroatom selected from the list consisting of N, O and S.
3員、4員、5員或6員飽和或部分飽和的視情況經取代之碳環之實例包括環丙基、環戊基、環己基、環丙烯基、環戊烯基及環己烯基。Examples of optionally substituted carbocycles which are saturated or partially saturated with 3, 4, 5 or 6 members include cyclopropyl, cyclopentyl, cyclohexyl, cyclopropenyl, cyclopentenyl and cyclohexenyl. .
3員、4員、5員或6員飽和或部分飽和的視情況經取代之雜環之實例包括環氧乙烷基、氮丙啶基、四氫呋喃基、四氫噻吩基、吡咯啶基、二氫呋喃基、二氫噻吩基、吡咯啶基、哌啶基、二氧雜環己烷基、四氫哌喃基、六氫噠嗪基、六氫嘧啶基及哌嗪基。Examples of optionally substituted heterocyclic rings of 3, 4, 5 or 6 members which are saturated or partially saturated include oxiranyl, aziridine, tetrahydrofuranyl, tetrahydrothiophenyl, pyrrolidinyl, Hydrofuranyl, dihydrothienyl, pyrrolidinyl, piperidinyl, dioxanyl, tetrahydropyranyl, hexahydropyridazinyl, hexahydropyrimidinyl and piperazinyl.
在以上式(I)中,R1a 及R1b 、或R2a 及R2b 連同其所連接之碳原子一起可形成未經取代或經取代之飽和或部分不飽和的雙環[m1 ,m2 ,0]-C6 -C11 烷基,其中m2 ≥1且m1 + m2 = 4至9。此等物質之實例包括茚滿及十氫萘。In the above formula (I), R 1a and R 1b , or R 2a and R 2b together with the carbon atom to which they are attached may form an unsubstituted or substituted saturated or partially unsaturated bicyclic ring [m 1 , m 2 , 0]-C 6 -C 11 alkyl, wherein m 2 ≥ 1 and m 1 + m 2 = 4 to 9. Examples of such materials include indane and decalin.
在以上式(I)中,R1a 及R1b 、或R2a 及R2b 連同其所連接之碳原子一起可形成未經取代或經取代之飽和或部分不飽和的螺[n1 ,n2 ]-C5 -C11 烷基,其包含1至4個獨立地選自由N、O及S組成之清單的雜原子,其中n1 ≥ 2且n1 + n2 = 4至10。此等物質之實例包括螺[2,2]戊烷及螺[2,3]己烷。In the above formula (I), R 1a and R 1b , or R 2a and R 2b together with the carbon atom to which they are attached may form an unsubstituted or substituted saturated or partially unsaturated snail [n 1 , n 2 a -C 5 -C 11 alkyl group comprising from 1 to 4 heteroatoms independently selected from the list consisting of N, O and S, wherein n 1 ≥ 2 and n 1 + n 2 = 4 to 10. Examples of such materials include spiro[2,2]pentane and spiro[2,3]hexane.
在以上式(I)中,R1a 及R1b 、或R2a 及R2b 連同其所連接之碳原子一起可形成未經取代或經取代之飽和或部分不飽和的雜螺[n1 ,n2 ]-C5 -C11 烷基,其包含1至4個獨立地選自由N、O及S組成之清單的雜原子,其中n1 ≥ 2且n1 + n2 = 4至10。此等物質之實例包括2-氧雜螺[3,3]庚烷。In the above formula (I), R 1a and R 1b , or R 2a and R 2b together with the carbon atom to which they are attached may form an unsubstituted or substituted saturated or partially unsaturated heterospiro [n 1 , n 2 ]-C 5 -C 11 alkyl group, which comprises 1 to 4 heteroatoms independently selected from the list consisting of N, O and S, wherein n 1 ≥ 2 and n 1 + n 2 = 4 to 10. Examples of such materials include 2-oxaspiro[3,3]heptane.
在以上式(I)中,R1a
與R1b
較佳獨立地選自由以下組成之群:氫原子、鹵素原子、未經取代或經取代之C1
-C6
烷基、未經取代或經取代之C2
-C6
烯基、未經取代或經取代之C2
-C6
鹵代烯基、未經取代或經取代之C2
-C6
炔基、未經取代或經取代之C3
-C7
環烷基、未經取代或經取代之C3
-C7
環烷基-C1
-C6
烷基、未經取代或經取代之芳基、未經取代或經取代之雜環基-C1
-C6
烷基、未經取代或經取代之雜環基及未經取代或經取代之芳基-C1
-C8
烷基,或
R1a
及R1b
連同其所連接之碳原子一起可較佳
- 形成3員、4員、5員或6員飽和或部分飽和的視情況經取代之碳環或雜環,其包含至少1個選自由N、O及S組成之清單的雜原子,或
- 形成未經取代或經取代之飽和或部分不飽和的雙環[m1
,m2
,0]-C6
-C11
烷基,其中m2
≥1且m1
+ m2
= 4至9,或
- 形成未經取代或經取代之飽和或部分不飽和的雜雙環[m1
,m2
,0]-C6
-C11
烷基,其包含1至4個獨立地選自由N、O及S組成之清單的雜原子,其中m2
≥ 1且m1
+ m2
= 4至9,或
- 形成未經取代或經取代之飽和或部分不飽和的螺[n1
,n2
]-C5
-C11
烷基,其中n1
≥ 2且n1
+ n2
= 4至10,或
- 形成未經取代或經取代之飽和或部分不飽和的雜螺[n1
,n2
]-C5
-C11
烷基,其包含1至4個獨立地選自由N、O及S組成之清單的雜原子,其中n1
≥ 2且n1
+ n2
= 4至10。In the above formula (I), R 1a and R 1b are preferably independently selected from the group consisting of a hydrogen atom, a halogen atom, an unsubstituted or substituted C 1 -C 6 alkyl group, unsubstituted or via Substituted C 2 -C 6 alkenyl, unsubstituted or substituted C 2 -C 6 haloalkenyl, unsubstituted or substituted C 2 -C 6 alkynyl, unsubstituted or substituted C 3- C 7 cycloalkyl, unsubstituted or substituted C 3 -C 7 cycloalkyl-C 1 -C 6 alkyl, unsubstituted or substituted aryl, unsubstituted or substituted a cyclo-C 1 -C 6 alkyl group, an unsubstituted or substituted heterocyclic group, and an unsubstituted or substituted aryl-C 1 -C 8 alkyl group, or
R 1a and R 1b together with the carbon atom to which they are attached may preferably be preferred
Forming a suitably substituted carbocyclic or heterocyclic ring of 3, 4, 5 or 6 members which is saturated or partially saturated, comprising at least one heteroatom selected from the list consisting of N, O and S, or
- forming an unsubstituted or substituted saturated or partially unsaturated bicyclo[m 1 , m 2 ,0]-C 6 -C 11 alkyl group, wherein m 2 ≥1 and m 1 + m 2 = 4 to 9, or
- forming an unsubstituted or substituted saturated or partially unsaturated heterobicyclo[m 1 , m 2 ,0]-C 6 -C 11 alkyl group, which comprises from 1 to 4 independently selected from N, O and S a list of heteroatoms, where m 2 ≥ 1 and m 1 + m 2 = 4 to 9, or
Forming an unsubstituted or substituted saturated or partially unsaturated spiro[n 1 ,n 2 ]-C 5 -C 11 alkyl group, wherein n 1 ≥ 2 and n 1 + n 2 = 4 to 10, or
Forming an unsubstituted or substituted saturated or partially unsaturated heterospiro[n 1 ,n 2 ]-C 5 -C 11 alkyl group comprising from 1 to 4 independently selected from the group consisting of N, O and S List of heteroatoms where n 1 ≥ 2 and n 1 + n 2 = 4 to 10.
在以上式(I)中,更佳地,R1a 及R1b 各自獨立地係氫原子、未經取代或經取代之C1 -C6 烷基(例如甲基),或R1a 及R1b 一起形成3員、4員、5員或6員飽和或部分飽和的視情況經取代之碳環(例如環丙基、環丁基、環戊基、環己基、環戊烯基),或未經取代或經取代之飽和或部分不飽和的螺[n1 ,n2 ]-C5 -C11 烷基,其中n1 ≥ 2且n1 + n2 = 4至10 (例如螺[2,2]戊烷)。In the above formula (I), more preferably, R 1a and R 1b are each independently a hydrogen atom, an unsubstituted or substituted C 1 -C 6 alkyl group (e.g., methyl group), or R 1a and R 1b. Forming a substituted, partially saturated, optionally substituted carbocyclic ring (eg, cyclopropyl, cyclobutyl, cyclopentyl, cyclohexyl, cyclopentenyl), or not, 3, 4, 5, or 6 Substituted or substituted saturated or partially unsaturated spiro[n 1 ,n 2 ]-C 5 -C 11 alkyl, wherein n 1 ≥ 2 and n 1 + n 2 = 4 to 10 (eg, spiro[2, 2] pentane).
在以上式(I)中,L1 較佳係CR1a R1b ,其中R1a 及R1b 獨立地係氫原子或未經取代之C1 -C8 烷基。In the above formula (I), L 1 is preferably CR 1a R 1b , wherein R 1a and R 1b are independently a hydrogen atom or an unsubstituted C 1 -C 8 alkyl group.
在以上式(I)中,L2 較佳係C(=O)或CR2a R2b ,其中R2a 及R2b 如本文所述。In the above formula (I), L 2 is preferably C(=O) or CR 2a R 2b , wherein R 2a and R 2b are as described herein.
R2a 及R2b 若存在,則較佳獨立地係氫原子、鹵素原子、羥基、未經取代或經取代之C1 -C6 烷氧基、未經取代或經取代之C1 -C6 烷基、未經取代或經取代之芳基、羥基、未經取代或經取代之C2 -C8 烯氧基、未經取代或經取代之C3 -C8 炔氧基、未經取代或經取代之芳基C1 -C6 烷氧基、未經取代或經取代之雜環基-C1 -C6 烷氧基或包含1至5個獨立地選自由N、O及S組成之清單的雜原子之未經取代或經取代之部分飽和或不飽和稠合雙環9員、10員或11員雜環基-C1 -C6 烷氧基。在一些較佳實施例中,R2a 及R2b 連同其所連接之碳原子一起亦可形成未經取代或經取代之亞甲基。R 2a and R 2b, if present, are preferably independently a hydrogen atom, a halogen atom, a hydroxyl group, an unsubstituted or substituted C 1 -C 6 alkoxy group, an unsubstituted or substituted C 1 -C 6 Alkyl, unsubstituted or substituted aryl, hydroxy, unsubstituted or substituted C 2 -C 8 alkenyloxy, unsubstituted or substituted C 3 -C 8 alkynyloxy, unsubstituted Or substituted aryl C 1 -C 6 alkoxy, unsubstituted or substituted heterocyclyl-C 1 -C 6 alkoxy or consisting of 1 to 5 independently selected from N, O and S An unsubstituted or substituted partially saturated or unsaturated fused bicyclic 9 member, 10 member or 11 membered heterocyclyl-C 1 -C 6 alkoxy group of a hetero atom of the list. In some preferred embodiments, R 2a and R 2b together with the carbon atom to which they are attached may also form an unsubstituted or substituted methylene group.
未經取代或經取代之芳基-C1 -C6 烷氧基之實例包括未經取代或經取代之苯基-C1 -C6 烷氧基,其中苯基可經一或多個選自由以下組成之群的基團取代:未經取代或經取代之C1 -C6 烷基、包含至多9個可相同或不同之鹵素原子之C1 -C6 鹵代烷基、氰基、鹵素、未經取代或經取代之C1 -C6 烷基磺醯基、未經取代或經取代之C1 -C6 烷基硫基、未經取代或經取代之芳基(例如苯基、萘基)、未經取代或經取代之芳基羰基、未經取代或經取代之C1 -C6 烷氧基、包含至多9個可相同或不同之鹵素原子之C1 -C6 鹵代烷氧基、未經取代或經取代之芳氧基及未經取代或經取代之芳基-C1 -C6 烷氧基,較佳係未經取代之C1 -C6 烷基、包含至多9個可相同或不同之鹵素原子之C1 -C6 鹵代烷基、鹵素、未經取代之C1 -C6 烷氧基及包含至多9個可相同或不同之鹵素原子之C1 -C6 鹵代烷氧基。Examples of unsubstituted or substituted aryl-C 1 -C 6 alkoxy include unsubstituted or substituted phenyl-C 1 -C 6 alkoxy, wherein the phenyl group may be selected by one or more the group the group consisting of substituted: the unsubstituted or substituted C 1 -C 6 alkyl group, comprising up to 9 halogen atoms may be the same or different C 1 -C 6 haloalkyl group, a cyano group, a halogen, Unsubstituted or substituted C 1 -C 6 alkylsulfonyl, unsubstituted or substituted C 1 -C 6 alkylthio, unsubstituted or substituted aryl (eg phenyl, naphthalene) group), the substituted or unsubstituted arylcarbonyl group, the unsubstituted or substituted C 1 -C 6 alkoxy group, may contain up to 9 identical or different halogen atoms C 1 -C 6 haloalkyl alkoxy An unsubstituted or substituted aryloxy group and an unsubstituted or substituted aryl-C 1 -C 6 alkoxy group, preferably an unsubstituted C 1 -C 6 alkyl group, containing up to 9 may be the same or different halogen atoms C 1 -C 6 haloalkyl group, halogen, unsubstituted of C 1 -C 6 alkoxy and may contain up to 9 identical or different halogen atoms C 1 -C 6 haloalkyl alkoxy base.
未經取代或經取代之雜環基-C1 -C6 烷氧基之實例包括未經取代或經取代之噻唑基-C1 -C6 烷氧基及未經取代或經取代之呋喃基-C1 -C6 烷氧基。Examples of the unsubstituted or substituted heterocyclic-C 1 -C 6 alkoxy group include unsubstituted or substituted thiazolyl-C 1 -C 6 alkoxy group and unsubstituted or substituted furanyl group. -C 1 -C 6 alkoxy.
包含1至5個獨立地選自由N、O及S組成之清單的雜原子之未經取代或經取代之部分飽和或不飽和稠合雙環9員、10員或11員雜環基-C1 -C6 烷氧基之實例包括未經取代或經取代之吲唑基-C1 -C6 烷氧基及未經取代或經取代之苯并噁唑基-C1 -C6 烷氧基。An unsubstituted or substituted partially saturated or unsaturated fused bicyclic 9 member, 10 member or 11 membered heterocyclyl-C 1 containing from 1 to 5 heteroatoms independently selected from the list consisting of N, O and S Examples of the -C 6 alkoxy group include an unsubstituted or substituted carbazolyl-C 1 -C 6 alkoxy group and an unsubstituted or substituted benzoxazolyl-C 1 -C 6 alkoxy group. .
R2a 及R2b 若存在,則更佳獨立地係氫原子、鹵素原子(例如氟原子)、羥基、未經取代或經取代之C1 -C6 烷基(例如甲基)、未經取代或經取代之芳基(例如未經取代或經取代之苯基)、未經取代或經取代之C1 -C6 烷氧基(例如甲氧基)、未經取代或經取代之芳氧基、未經取代或經取代之芳基-C1 -C6 烷氧基(例如未經取代或經取代之苯甲氧基)、未經取代或經取代之C2 -C8 烯氧基(例如烯丙氧基)、未經取代或經取代之C3 -C8 炔氧基(例如丙炔基氧基)、未經取代或經取代之芳基-C1 -C6 烷氧基(例如未經取代或經取代之苯基-C1 -C6 烷氧基或未經取代或經取代之萘基-C1 -C6 烷氧基)、未經取代或經取代之雜環基-C1 -C6 烷氧基、包含1至5個獨立地選自由N、O及S組成之清單的雜原子之未經取代或經取代之部分飽和或不飽和稠合雙環9員、10員或11員雜環基-C1 -C6 烷氧基,或R2a 及R2b 連同其所連接之碳原子一起形成未經取代或經取代之亞甲基。R 2a and R 2b, if present, are more preferably independently a hydrogen atom, a halogen atom (e.g., a fluorine atom), a hydroxyl group, an unsubstituted or substituted C 1 -C 6 alkyl group (e.g., methyl group), unsubstituted. Or substituted aryl (eg unsubstituted or substituted phenyl), unsubstituted or substituted C 1 -C 6 alkoxy (eg methoxy), unsubstituted or substituted aryloxy An unsubstituted or substituted aryl-C 1 -C 6 alkoxy group (for example, an unsubstituted or substituted benzyloxy group), an unsubstituted or substituted C 2 -C 8 alkenyloxy group (eg allyloxy), unsubstituted or substituted C 3 -C 8 alkynyloxy (eg propynyloxy), unsubstituted or substituted aryl-C 1 -C 6 alkoxy (for example unsubstituted or substituted phenyl-C 1 -C 6 alkoxy or unsubstituted or substituted naphthyl-C 1 -C 6 alkoxy), unsubstituted or substituted heterocyclic ring a s-C 1 -C 6 alkoxy group, an unsubstituted or substituted partially saturated or unsaturated fused bicyclic 9 member comprising from 1 to 5 heteroatoms independently selected from the list consisting of N, O and S, 10 or 11-membered heterocyclic group -C 1 -C 6 alkoxy, or R 2a and R 2b connected Form an unsubstituted or substituted methylene group together with the carbon atoms they are attached.
在以上式(I)中,L2 更佳係CR2a R2b 或C(=O),其中R2a 及R2b 係獨立地選自由以下組成之群:氫原子、鹵素原子、未經取代或經取代之C1 -C6 烷基、羥基、未經取代或經取代之C1 -C6 烷氧基、未經取代或經取代之C2 -C6 烯氧基、未經取代或經取代之芳基-C1 -C6 烷氧基及未經取代或經取代之雜環基-C1 -C6 烷氧基。In the above formula (I), L 2 is more preferably CR 2a R 2b or C(=O), wherein R 2a and R 2b are independently selected from the group consisting of hydrogen atom, halogen atom, unsubstituted or Substituted C 1 -C 6 alkyl, hydroxy, unsubstituted or substituted C 1 -C 6 alkoxy, unsubstituted or substituted C 2 -C 6 alkenoxy, unsubstituted or via Substituted aryl-C 1 -C 6 alkoxy group and unsubstituted or substituted heterocyclic group -C 1 -C 6 alkoxy group.
在一些實施例中,活性成分係式(I)化合物,其中:
● W係CY1
或N,其中:
- Y1
選自由以下組成之群:氫原子、鹵素原子、未經取代或經取代之C1
-C6
烷基、包含至多9個可相同或不同之鹵素原子之C1
-C6
鹵代烷基、未經取代或經取代之C3
-C7
環烷基、羥基、未經取代或經取代之C1
-C6
烷氧基、包含至多9個可相同或不同之鹵素原子之C1
-C6
鹵代烷氧基、未經取代或經取代之C1
-C6
烷氧羰基、甲醯基及氰基;
● Y2
、Y3
、Y4
或Y5
係獨立地選自由以下組成之群:氫原子、鹵素原子、未經取代或經取代之C1
-C6
烷基、包含至多9個可相同或不同之鹵素原子之C1
-C6
鹵代烷基、未經取代或經取代之C3
-C7
環烷基、羥基、未經取代或經取代之C1
-C6
烷氧基、包含至多9個可相同或不同之鹵素原子之C1
-C6
鹵代烷氧基、未經取代或經取代之C1
-C6
烷氧羰基、甲醯基及氰基;
● Z選自由以下組成之群:氫原子、鹵素原子、未經取代或經取代之C1
-C6
烷基、包含至多9個可相同或不同之鹵素原子之C1
-C6
鹵代烷基、未經取代或經取代之C1
-C6
烷氧基、包含至多9個可相同或不同之鹵素原子之C1
-C6
鹵代烷氧基及氰基;
● A、L1
、L2
、X、W及n如上文所定義。In some embodiments, the active ingredient is a compound of formula (I) wherein:
● W is CY 1 or N, where:
- Y 1 is selected from the group consisting of a hydrogen atom, a halogen atom, an unsubstituted or substituted C 1 -C 6 alkyl group, a C 1 -C 6 haloalkyl group containing up to 9 halogen atoms which may be the same or different , of unsubstituted or substituted C 3 -C 7 cycloalkyl, hydroxy, unsubstituted or substituted with of C 1 -C 6 alkoxy group, containing up to C 9 can be the same or different halogen atoms 1-- a C 6 haloalkoxy group, an unsubstituted or substituted C 1 -C 6 alkoxycarbonyl group, a decyl group and a cyano group;
• Y 2 , Y 3 , Y 4 or Y 5 are independently selected from the group consisting of a hydrogen atom, a halogen atom, an unsubstituted or substituted C 1 -C 6 alkyl group, containing up to 9 may be the same or C 1 -C 6 haloalkyl, unsubstituted or substituted C 3 -C 7 cycloalkyl, hydroxy, unsubstituted or substituted C 1 -C 6 alkoxy, containing up to 9 a C 1 -C 6 haloalkoxy group which may be the same or different halogen atom, an unsubstituted or substituted C 1 -C 6 alkoxycarbonyl group, a decyl group and a cyano group;
Z is selected from the group consisting of a hydrogen atom, a halogen atom, an unsubstituted or substituted C 1 -C 6 alkyl group, a C 1 -C 6 haloalkyl group containing up to 9 halogen atoms which may be the same or different, Unsubstituted or substituted C 1 -C 6 alkoxy, C 1 -C 6 haloalkoxy and cyano group containing up to 9 halogen atoms which may be the same or different;
• A, L 1 , L 2 , X, W and n are as defined above.
在以上式(I)中,A例可選自由以下組成之群:吡咯基、呋喃基、噻吩基、噻唑基、異噻唑基、噁唑基、咪唑基、異噁唑基、吡唑基、三唑基、噻二唑基、噁二唑基、吡啶基、嘧啶基、吡嗪基、噠嗪炔基及三嗪基。In the above formula (I), the A group may be selected from the group consisting of pyrrolyl, furyl, thienyl, thiazolyl, isothiazolyl, oxazolyl, imidazolyl, isoxazolyl, pyrazolyl, Triazolyl, thiadiazolyl, oxadiazolyl, pyridyl, pyrimidinyl, pyrazinyl, pyridazinyl and triazinyl.
在一些其他實施例中,在以上式(I)中,A係5員或6員不飽和的雜環,其包含1或2個獨立地選自由N、O及S組成之清單的雜原子。In some other embodiments, in Formula (I) above, A is a 5-membered or 6-membered unsaturated heterocyclic ring comprising one or two heteroatoms independently selected from the list consisting of N, O, and S.
在以上式(I)中,A較佳係選自:
其中X及n如本文所定義(應瞭解n不可超過可用鍵結位點之數量),Xa
選自由以下組成之群:C1
-C8
烷基、包含至多9個可相同或不同之鹵素原子之C1
-C8
鹵代烷基、C2
-C8
烯基、包含至多9個可相同或不同之鹵素原子之C2
-C8
鹵代烯基、C2
-C8
炔基、包含至多9個可相同或不同之鹵素原子之C2
-C8
鹵代炔基、C3
-C7
環烷基、包含至多9個可相同或不同之鹵素原子之C3
-C7
鹵代環烷基、C3
-C7
環烷基-C1
-C8
烷基、C4
-C7
環烯基、芳基、芳基-C1
-C8
烷基、雜環基、雜環基-C1
-C8
烷基、甲醯基、C1
-C8
烷基羰基、包含至多9個可相同或不同之鹵素原子之C1
-C8
鹵代烷基羰基、C1
-C8
烷氧羰基、包含至多9個可相同或不同之鹵素原子之C1
-C8
鹵代烷氧基羰基、胺甲醯基、C1
-C8
烷基胺甲醯基、二C1
-C8
烷基胺甲醯基、C1
-C8
烷基磺醯基、C1
-C6
三烷基矽基及C1
-C6
三烷基矽基-C1
-C6
烷基,且A經由以「*」標識之鍵連接至式(I)之L2
,且A經由以「#」標識之鍵連接至式(I)之N-SO2
部分。In the above formula (I), A is preferably selected from the group consisting of:
Wherein X and n are as defined herein (it should be understood that n cannot exceed the number of available bonding sites), and X a is selected from the group consisting of C 1 -C 8 alkyl, containing up to 9 halogens which may be the same or different atoms C 1 -C 8 -haloalkyl, C 2 -C 8 alkenyl group, may contain up to 9 identical or different halogen atoms C 2 -C 8 haloalkenyl, C 2 -C 8 alkynyl group, containing up to 9 may be the same or different halogen atoms C 2 -C 8 haloalkynyl, C 3 -C 7 cycloalkyl group, comprising up to 9 identical or different halogen atoms of C 3 -C 7 halocycloalkyl , C 3 -C 7 cycloalkyl-C 1 -C 8 alkyl, C 4 -C 7 cycloalkenyl, aryl, aryl-C 1 -C 8 alkyl, heterocyclyl, heterocyclyl- C 1 -C 8 alkyl, methyl acyl, C 1 -C 8 alkylcarbonyl group, may contain up to 9 identical or different halogen atoms C 1 -C 8 -haloalkylcarbonyl, C 1 -C 8 alkoxycarbonyl a C 1 -C 8 haloalkoxycarbonyl group, an amine carbenyl group, a C 1 -C 8 alkylamine carbenyl group, a di C 1 -C 8 alkylamine group containing up to 9 halogen atoms which may be the same or different Sulfhydryl, C 1 -C 8 alkylsulfonyl, C 1 -C 6 trialkylsulfonyl and C 1 -C 6 trialkylsulfonyl-C 1 -C 6 Alkyl, and A is linked to L 2 of formula (I) via a bond identified by "*", and A is linked to the N-SO 2 moiety of formula (I) via a bond identified by "#".
在以上式(I)中,A可為吡啶基或噻吩基。In the above formula (I), A may be a pyridyl group or a thienyl group.
在以上式(I)中,A更佳選自:
其中X及n如本文所定義(應瞭解n不可超過可用鍵結位點之數量),
較佳地,n係0或1,且X選自由以下組成之群:氫、鹵素、未經取代之C1
-C8
烷基及未經取代之C1
-C8
烷氧基。In the above formula (I), A is more preferably selected from the group consisting of:
Where X and n are as defined herein (it should be understood that n cannot exceed the number of available bonding sites),
Preferably, n is 0 or 1, and X is selected from the group consisting of hydrogen, halogen, unsubstituted C 1 -C 8 alkyl, and unsubstituted C 1 -C 8 alkoxy.
在一些實施例中,根據本發明之化合物係式(I)化合物
其中
● A選自由以下組成之群:吡咯基、呋喃基、噻吩基、噻唑基、異噻唑基、噁唑基、咪唑基、異噁唑基、吡唑基、三唑基、噻二唑基、噁二唑基、吡啶基、嘧啶基、吡嗪基、噠嗪炔基及三嗪基;
● Z選自由以下組成之群:氫原子、鹵素原子、未經取代或經取代之C1
-C6
烷基、包含至多9個可相同或不同之鹵素原子之C1
-C6
鹵代烷基、未經取代或經取代之C1
-C6
烷氧基、包含至多9個可相同或不同之鹵素原子之C1
-C6
鹵代烷氧基及氰基,較佳地,Z係氫原子、未經取代或經取代之C1
-C6
烷基(例如甲基)或包含至多9個可相同或不同之鹵素原子之C1
-C6
鹵代烷基,更佳地,Z係氫原子;
● n係0、1、2,較佳係0或1;
● X係獨立地選自由以下組成之群:鹵素原子、未經取代或經取代之C1
-C6
烷基、包含至多9個可相同或不同之鹵素原子之C1
-C6
鹵代烷基、未經取代或經取代之C2
-C8
烯基、未經取代或經取代之C2
-C8
炔基、未經取代或經取代之C3
-C7
環烷基、羥基、未經取代或經取代之C1
-C6
烷氧基、包含至多9個可相同或不同之鹵素原子之C1
-C6
鹵代烷氧基、未經取代或經取代之芳基、未經取代或經取代之雜環基、未經取代或經取代之C1
-C6
烷基羰基、未經取代或經取代之C1
-C6
三烷基矽基-C1
-C6
烷基及未經取代或經取代之C1
-C6
三烷基矽基,較佳地,X係鹵素原子(氯原子、溴原子或氟原子)、未經取代或經取代之C1
-C6
烷基(例如甲基)、包含至多9個可相同或不同之鹵素原子之C1
-C6
鹵代烷基(例如三氟甲基)、未經取代或經取代之C1
-C6
烷氧基(例如甲氧基)、未經取代或經取代之C1
-C6
鹵代烷氧基(例如三氟甲氧基)或三甲基矽基,更佳地,X係鹵素原子(例如氯原子、溴原子或氟原子)、未經取代之C1
-C6
烷基(例如甲基)或未經取代之C1
-C6
烷氧基(例如甲氧基);
● W係CY1
或N,其中Y1
選自由以下組成之群:氫原子、鹵素原子、未經取代或經取代之C1
-C6
烷基、包含至多9個可相同或不同之鹵素原子之C1
-C6
鹵代烷基、未經取代或經取代之C3
-C7
環烷基、羥基、未經取代或經取代之C1
-C6
烷氧基、包含至多9個可相同或不同之鹵素原子之C1
-C6
鹵代烷氧基、未經取代或經取代之C1
-C6
烷氧羰基、甲醯基及氰基,較佳地,Y1
係氫原子;
● Y2
、Y3
、Y4
及Y5
係獨立地選自由以下組成之群:氫原子、鹵素原子、未經取代或經取代之C1
-C6
烷基、包含至多9個可相同或不同之鹵素原子之C1
-C6
鹵代烷基、未經取代或經取代之C3
-C7
環烷基、羥基、未經取代或經取代之C1
-C6
烷氧基、包含至多9個可相同或不同之鹵素原子之C1
-C6
鹵代烷氧基、未經取代或經取代之C1
-C6
烷氧羰基、甲醯基及氰基,較佳地,Y2
、Y3
、Y4
及Y5
獨立地係氫原子、鹵素原子、未經取代或經取代之C1
-C6
烷基、包含至多9個可相同或不同之鹵素原子之C1
-C6
鹵代烷基(例如三氟甲基)或氰基,更佳地,Y2
、Y3
、Y4
及Y5
獨立地係氫原子或鹵素原子;
● L1
係CR1a
R1b
,其中R1a
及R1b
獨立地係氫原子或未經取代之C1
-C8
烷基;
● L2
係CR2a
R2b
或C(=O),其中R2a
及R2b
係獨立地選自由以下組成之群:氫原子、鹵素原子、未經取代或經取代之C1
-C6
烷基、羥基、未經取代或經取代之C1
-C6
烷氧基、未經取代或經取代之C2
-C6
烯氧基、未經取代或經取代之芳基-C1
-C6
烷氧基及未經取代或經取代之雜環基-C1
-C6
烷氧基。In some embodiments, the compound according to the invention is a compound of formula (I)
Wherein A is selected from the group consisting of pyrrolyl, furyl, thienyl, thiazolyl, isothiazolyl, oxazolyl, imidazolyl, isoxazolyl, pyrazolyl, triazolyl, thiadiazolyl , oxadiazolyl, pyridyl, pyrimidinyl, pyrazinyl, pyridazinyl and triazinyl;
Z is selected from the group consisting of a hydrogen atom, a halogen atom, an unsubstituted or substituted C 1 -C 6 alkyl group, a C 1 -C 6 haloalkyl group containing up to 9 halogen atoms which may be the same or different, Unsubstituted or substituted C 1 -C 6 alkoxy, C 1 -C 6 haloalkoxy and cyano group containing up to 9 halogen atoms which may be the same or different, preferably Z-based hydrogen atom, not a substituted or substituted C 1 -C 6 alkyl group (for example, a methyl group) or a C 1 -C 6 haloalkyl group containing up to 9 halogen atoms which may be the same or different, more preferably a Z-based hydrogen atom;
● n is 0, 1, 2, preferably 0 or 1;
X is independently selected from the group consisting of a halogen atom, an unsubstituted or substituted C 1 -C 6 alkyl group, a C 1 -C 6 haloalkyl group containing up to 9 halogen atoms which may be the same or different, Unsubstituted or substituted C 2 -C 8 alkenyl, unsubstituted or substituted C 2 -C 8 alkynyl, unsubstituted or substituted C 3 -C 7 cycloalkyl, hydroxy, unsubstituted the unsubstituted or substituted C 1 -C 6 alkoxy group, may contain up to 9 identical or different halogen atoms C 1 -C 6 haloalkyl alkoxy, the unsubstituted or substituted aryl group, unsubstituted or Substituted heterocyclic group, unsubstituted or substituted C 1 -C 6 alkylcarbonyl group, unsubstituted or substituted C 1 -C 6 trialkylindenyl-C 1 -C 6 alkyl group and a substituted or substituted C 1 -C 6 trialkylsulfonyl group, preferably an X-based halogen atom (a chlorine atom, a bromine atom or a fluorine atom), an unsubstituted or substituted C 1 -C 6 alkyl group ( For example, methyl), a C 1 -C 6 haloalkyl group (for example, a trifluoromethyl group) containing up to 9 halogen atoms which may be the same or different, an unsubstituted or substituted C 1 -C 6 alkoxy group (for example, A) Oxyl), unsubstituted or taken Instead, a C 1 -C 6 haloalkoxy group (for example, a trifluoromethoxy group) or a trimethyl fluorenyl group, more preferably, an X-based halogen atom (for example, a chlorine atom, a bromine atom or a fluorine atom), an unsubstituted C 1- C 6 alkyl (eg methyl) or unsubstituted C 1 -C 6 alkoxy (eg methoxy);
• W is CY 1 or N, wherein Y 1 is selected from the group consisting of a hydrogen atom, a halogen atom, an unsubstituted or substituted C 1 -C 6 alkyl group, and contains up to 9 halogen atoms which may be the same or different. C 1 -C 6 haloalkyl, unsubstituted or substituted C 3 -C 7 cycloalkyl, hydroxy, unsubstituted or substituted C 1 -C 6 alkoxy, containing up to 9 may be the same or a C 1 -C 6 haloalkoxy group having an unsubstituted halogen atom, an unsubstituted or substituted C 1 -C 6 alkoxycarbonyl group, a decyl group and a cyano group, preferably a Y 1 -based hydrogen atom;
• Y 2 , Y 3 , Y 4 and Y 5 are independently selected from the group consisting of a hydrogen atom, a halogen atom, an unsubstituted or substituted C 1 -C 6 alkyl group, containing up to 9 may be the same or C 1 -C 6 haloalkyl, unsubstituted or substituted C 3 -C 7 cycloalkyl, hydroxy, unsubstituted or substituted C 1 -C 6 alkoxy, containing up to 9 a C 1 -C 6 haloalkoxy group which may be the same or different halogen atom, an unsubstituted or substituted C 1 -C 6 alkoxycarbonyl group, a decyl group and a cyano group, preferably, Y 2 , Y 3 And Y 4 and Y 5 are independently a hydrogen atom, a halogen atom, an unsubstituted or substituted C 1 -C 6 alkyl group, and a C 1 -C 6 haloalkyl group containing up to 9 halogen atoms which may be the same or different ( For example, trifluoromethyl) or cyano, more preferably, Y 2 , Y 3 , Y 4 and Y 5 are independently a hydrogen atom or a halogen atom;
L 1 is CR 1a R 1b , wherein R 1a and R 1b are independently a hydrogen atom or an unsubstituted C 1 -C 8 alkyl group;
• L 2 is CR 2a R 2b or C(=O), wherein R 2a and R 2b are independently selected from the group consisting of a hydrogen atom, a halogen atom, an unsubstituted or substituted C 1 -C 6 alkane Alkyl, hydroxy, unsubstituted or substituted C 1 -C 6 alkoxy, unsubstituted or substituted C 2 -C 6 alkenyloxy, unsubstituted or substituted aryl-C 1 -C 6 alkoxy and unsubstituted or substituted heterocyclic-C 1 -C 6 alkoxy.
在一些實施例中,根據本發明之化合物係式(I)化合物
其中
● A係吡啶基或噻吩基,較佳地,A選自
;
● Z選自由以下組成之群:氫原子、未經取代或經取代之C1
-C6
烷基(例如甲基)及包含至多9個可相同或不同之鹵素原子之C1
-C6
鹵代烷基,較佳地,Z係氫原子;
● n係0或1;
● X選自由以下組成之群:鹵素原子(例如氯原子、溴原子或氟原子)、未經取代或經取代之C1
-C6
烷基(例如甲基)、包含至多9個可相同或不同之鹵素原子之C1
-C6
鹵代烷基(例如三氟甲基)、未經取代或經取代之C1
-C6
烷氧基(例如甲氧基)、未經取代或經取代之C1
-C6
鹵代烷氧基(例如三氟甲氧基)及三甲基矽基,較佳地,X係鹵素原子(例如氯原子、溴原子或氟原子)、未經取代之C1
-C6
烷基(例如甲基)或未經取代之C1
-C6
烷氧基(例如甲氧基);
● W係CY1
,其中Y1
選自由以下組成之群:氫原子、鹵素原子、未經取代或經取代之C1
-C6
烷基、包含至多9個可相同或不同之鹵素原子之C1
-C6
鹵代烷基、未經取代或經取代之C3
-C7
環烷基、羥基、未經取代或經取代之C1
-C6
烷氧基、包含至多9個可相同或不同之鹵素原子之C1
-C6
鹵代烷氧基、未經取代或經取代之C1
-C6
烷氧羰基、甲醯基及氰基,較佳地,Y1
係氫原子;
● Y2
、Y3
、Y4
及Y5
係獨立地選自由以下組成之群:氫原子、鹵素原子、未經取代或經取代之C1
-C6
烷基、包含至多9個可相同或不同之鹵素原子之C1
-C6
鹵代烷基(例如三氟甲基)及氰基,較佳地,Y2
、Y3
、Y4
及Y5
獨立地係氫原子或鹵素原子,更佳地,Y2
、Y3
及Y4
係氫原子,且Y5
係氫原子或鹵素原子;
● L1
係CR1a
R1b
,其中R1a
及R1b
獨立地係氫原子或未經取代之C1
-C6
烷基;
● L2
係CR2a
R2b
或C(=O),其中R2a
及R2b
係獨立地選自由以下組成之群:氫原子、鹵素原子、未經取代或經取代之C1
-C6
烷基、羥基、未經取代或經取代之C1
-C6
烷氧基、未經取代或經取代之C2
-C6
烯氧基、未經取代或經取代之芳基-C1
-C6
烷氧基及未經取代或經取代之雜環基-C1
-C6
烷基;
以及其鹽、N-氧化物、金屬錯合物、類金屬錯合物及光學活性異構體或幾何異構體。In some embodiments, the compound according to the invention is a compound of formula (I)
Wherein A is a pyridyl or thienyl group, preferably, A is selected from
;
Z is selected from the group consisting of a hydrogen atom, an unsubstituted or substituted C 1 -C 6 alkyl group (such as a methyl group), and a C 1 -C 6 haloalkane containing up to 9 halogen atoms which may be the same or different. a base, preferably a Z-based hydrogen atom;
● n is 0 or 1;
X is selected from the group consisting of a halogen atom (for example, a chlorine atom, a bromine atom or a fluorine atom), an unsubstituted or substituted C 1 -C 6 alkyl group (for example, a methyl group), containing up to 9 or the same or C 1 -C 6 haloalkyl (for example trifluoromethyl), unsubstituted or substituted C 1 -C 6 alkoxy (eg methoxy), unsubstituted or substituted C, of a different halogen atom a 1- C 6 haloalkoxy group (for example, a trifluoromethoxy group) and a trimethyl fluorenyl group, preferably an X-based halogen atom (for example, a chlorine atom, a bromine atom or a fluorine atom), and an unsubstituted C 1 -C a 6 alkyl group (such as a methyl group) or an unsubstituted C 1 -C 6 alkoxy group (such as a methoxy group);
• W is CY 1 , wherein Y 1 is selected from the group consisting of a hydrogen atom, a halogen atom, an unsubstituted or substituted C 1 -C 6 alkyl group, and C containing up to 9 halogen atoms which may be the same or different 1- C 6 haloalkyl, unsubstituted or substituted C 3 -C 7 cycloalkyl, hydroxy, unsubstituted or substituted C 1 -C 6 alkoxy, containing up to 9 may be the same or different a C 1 -C 6 haloalkoxy group of a halogen atom, an unsubstituted or substituted C 1 -C 6 alkoxycarbonyl group, a decyl group and a cyano group, preferably a Y 1 -based hydrogen atom;
• Y 2 , Y 3 , Y 4 and Y 5 are independently selected from the group consisting of a hydrogen atom, a halogen atom, an unsubstituted or substituted C 1 -C 6 alkyl group, containing up to 9 may be the same or a C 1 -C 6 haloalkyl group (for example, a trifluoromethyl group) and a cyano group of different halogen atoms, preferably, Y 2 , Y 3 , Y 4 and Y 5 are each independently a hydrogen atom or a halogen atom, more preferably , Y 2 , Y 3 and Y 4 are hydrogen atoms, and Y 5 is a hydrogen atom or a halogen atom;
L 1 is CR 1a R 1b , wherein R 1a and R 1b are independently a hydrogen atom or an unsubstituted C 1 -C 6 alkyl group;
• L 2 is CR 2a R 2b or C(=O), wherein R 2a and R 2b are independently selected from the group consisting of a hydrogen atom, a halogen atom, an unsubstituted or substituted C 1 -C 6 alkane Alkyl, hydroxy, unsubstituted or substituted C 1 -C 6 alkoxy, unsubstituted or substituted C 2 -C 6 alkenyloxy, unsubstituted or substituted aryl-C 1 -C 6 alkoxy, and unsubstituted or substituted heterocyclyl group of -C 1 -C 6 alkyl;
And salts thereof, N-oxides, metal complexes, metalloid complexes, and optically active isomers or geometric isomers.
在一些實施例中,根據本發明之化合物係式(Ii)化合物(亦即式 (I) 化合物 , 其中 L2
係CR2a
R2b ,其中 R2b 係 -OR2c
)
:
其中
A、n、X、Y2
、Y3
、Y4
、Y5
、W、Z、L1
及R2a
如本文所定義,及
R2c
選自由以下組成之群:未經取代或經取代之C1
-C6
烷基、包含至多9個可相同或不同之鹵素原子之C1
-C6
鹵代烷基、未經取代或經取代之C2
-C8
烯基、包含至多9個可相同或不同之鹵素原子之C2
-C6
鹵代烯基、未經取代或經取代之C3
-C8
炔基、包含至多9個可相同或不同之鹵素原子之C3
-C8
鹵代炔基、未經取代或經取代之C3
-C7
環烷基、包含至多9個可相同或不同之鹵素原子之C3
-C7
鹵代環烷基、未經取代或經取代之芳基、未經取代或經取代之雜環基、未經取代或經取代之C3
-C7
環烷基-C1
-C8
烷基、未經取代或經取代之芳基-C1
-C6
烷基、未經取代或經取代之雜環基-C1
-C6
烷基及包含1至5個獨立地選自由N、O及S組成之清單的雜原子之未經取代或經取代之部分飽和或不飽和稠合雙環9員、10員或11員雜環基-C1
-C6
烷基,或R2a
及R2b
連同其所連接之碳原子一起形成未經取代或經取代之亞甲基,較佳地,R2c
選自由以下組成之群:未經取代或經取代之C1
-C6
烷基、未經取代或經取代之C2
-C8
烯基、未經取代或經取代之芳基C1
-C6
烷基及未經取代或經取代之雜環基-C1
-C6
烷基,
以及其鹽、N-氧化物、金屬錯合物、類金屬錯合物及光學活性異構體或幾何異構體。In some embodiments, the compound is a compound according to formula (Ii) according to the present invention (i.e., of formula (I) compounds in which line L 2 CR 2a R 2b, wherein R 2b based -OR 2c):
among them
A, n, X, Y 2 , Y 3 , Y 4 , Y 5 , W, Z, L 1 and R 2a are as defined herein, and
R 2c is selected from the group consisting of: unsubstituted or substituted with of C 1 -C 6 alkyl group, may contain up to 9 identical or different halogen atoms C 1 -C 6 haloalkyl group, unsubstituted or substituted the C 2 -C 8 alkenyl group, comprising up to 9 halogen atoms may be the same or different C 2 -C 6 haloalkenyl group, unsubstituted or substituted with of C 3 -C 8 alkynyl group containing up to 9 C may be the same or different halogen atoms 3 -C 8 haloalkynyl, unsubstituted or substituted with of C 3 -C cycloalkyl. 7, comprising up to C 9 can be the same or different halogen atoms 3 -C 7 halocycloalkyl, unsubstituted or substituted aryl, unsubstituted or substituted heterocyclic, unsubstituted or substituted C 3 -C 7 cycloalkyl-C 1 -C 8 alkane And unsubstituted or substituted aryl-C 1 -C 6 alkyl, unsubstituted or substituted heterocyclyl-C 1 -C 6 alkyl and containing from 1 to 5 independently selected from N, Unsubstituted or substituted partially saturated or unsaturated fused bicyclic 9 member, 10 member or 11 membered heterocyclic group -C 1 -C 6 alkyl group, or R 2a and R 2b together with the carbon atoms they are attached together form an The unsubstituted or substituted alkylene group, preferably, R 2c is selected from the group consisting of: unsubstituted or substituted with of C 1 -C 6 alkyl, unsubstituted or substituted C 2 -C 8 alkenyl of a aryl group, an unsubstituted or substituted aryl C 1 -C 6 alkyl group, and an unsubstituted or substituted heterocyclic group -C 1 -C 6 alkyl group,
And salts thereof, N-oxides, metal complexes, metalloid complexes, and optically active isomers or geometric isomers.
未經取代或經取代之芳基-C1 -C6 烷基之實例包括苯甲基及苯基-C1 -C6 烷基,其中苯基可經一或多個選自由以下組成之群的基團取代:未經取代或經取代之C1 -C6 烷基、包含至多9個可相同或不同之鹵素原子之C1 -C6 鹵代烷基、氰基、鹵素、未經取代或經取代之C1 -C6 烷基磺醯基、未經取代或經取代之C1 -C6 烷基硫基、未經取代或經取代之芳基(例如苯基、萘基)、未經取代或經取代之芳基羰基、未經取代或經取代之C1 -C6 烷氧基、包含至多9個可相同或不同之鹵素原子之C1 -C6 鹵代烷氧基、未經取代或經取代之芳氧基及未經取代或經取代之芳基-C1 -C6 烷氧基,較佳係未經取代之C1 -C6 烷基、包含至多9個可相同或不同之鹵素原子之C1 -C6 鹵代烷基、鹵素、未經取代之C1 -C6 烷氧基及包含至多9個可相同或不同之鹵素原子之C1 -C6 鹵代烷氧基。Examples of the unsubstituted or substituted aryl-C 1 -C 6 alkyl group include a benzyl group and a phenyl-C 1 -C 6 alkyl group, wherein the phenyl group may be selected from the group consisting of one or more selected from the group consisting of substituted groups: unsubstituted or substituted alkyl group of C 1 -C 6, can comprise up to nine identical or different a halogen atoms C 1 -C 6 haloalkyl group, a cyano group, halo, unsubstituted or Substituted C 1 -C 6 alkylsulfonyl, unsubstituted or substituted C 1 -C 6 alkylthio, unsubstituted or substituted aryl (eg phenyl, naphthyl), unsubstituted the unsubstituted or substituted arylcarbonyl, unsubstituted or substituted with of C 1 -C 6 alkoxy group, may contain up to 9 identical or different halogen atoms C 1 -C 6 haloalkyl alkoxy, unsubstituted or Substituted aryloxy and unsubstituted or substituted aryl-C 1 -C 6 alkoxy, preferably unsubstituted C 1 -C 6 alkyl, containing up to 9 which may be the same or different a halogen atoms C 1 -C 6 haloalkyl group, halogen, unsubstituted of C 1 -C 6 alkoxy group and a C 9 containing up can be the same or different halogen atoms, alkoxy of 1 -C 6 haloalkyl group.
未經取代或經取代之雜環基-C1 -C6 烷基之實例包括呋喃基-C1 -C6 烷基,其中呋喃基可經一或多個選自由以下組成之群的基團取代:未經取代或經取代之C1 -C6 烷基、包含至多9個可相同或不同之鹵素原子之C1 -C6 鹵代烷基、氰基、鹵素、未經取代或經取代之C1 -C6 烷基磺醯基、未經取代或經取代之C1 -C6 烷基硫基、未經取代或經取代之芳基(例如苯基、萘基)、未經取代或經取代之芳基羰基、未經取代或經取代之C1 -C6 烷氧基、包含至多9個可相同或不同之鹵素原子之C1 -C6 鹵代烷氧基、未經取代或經取代之芳氧基及未經取代或經取代之芳基-C1 -C6 烷氧基,較佳係未經取代之C1 -C6 烷基、包含至多9個可相同或不同之鹵素原子之C1 -C6 鹵代烷基、鹵素未經取代之C1 -C6 烷氧基及包含至多9個可相同或不同之鹵素原子之C1 -C6 鹵代烷氧基。Examples of the unsubstituted or substituted heterocyclic-C 1 -C 6 alkyl group include a furyl-C 1 -C 6 alkyl group wherein the furyl group may be via one or more groups selected from the group consisting of substituted: the unsubstituted or substituted C 1 -C 6 alkyl group, may contain up to 9 identical or different halogen atoms C 1 -C 6 haloalkyl group, a cyano group, halo, unsubstituted or substituted with the C 1- C 6 alkylsulfonyl, unsubstituted or substituted C 1 -C 6 alkylthio, unsubstituted or substituted aryl (eg phenyl, naphthyl), unsubstituted or via the substituted arylcarbonyl, unsubstituted or substituted with of C 1 -C 6 alkoxy group, may contain up to 9 identical or different halogen atoms C 1 -C 6 haloalkyl alkoxy, unsubstituted or substituted with the An aryloxy group and an unsubstituted or substituted aryl-C 1 -C 6 alkoxy group, preferably an unsubstituted C 1 -C 6 alkyl group, containing up to 9 halogen atoms which may be the same or different C 1 -C 6 haloalkyl, halo non-substituted C 1 -C 6 alkoxy group and a C 9 containing up can be the same or different halogen atoms, alkoxy of 1 -C 6 haloalkyl group.
在一些實施例中,根據本發明之化合物係式(Ii)化合物(亦即式 (I) 化合物 , 其中 L2 係 CR2a
R2b ,其中 R2b 係 -OR2c
):
其中
● A係吡啶基或噻吩基,較佳地,A選自
,更佳地;
● Z選自由以下組成之群:氫原子、未經取代或經取代之C1
-C6
烷基(例如甲基)及包含至多9個可相同或不同之鹵素原子之C1
-C6
鹵代烷基,較佳地,Z係氫原子;
● n係0或1;
● X選自由以下組成之群:鹵素原子(例如氯原子、溴原子或氟原子)、未經取代或經取代之C1
-C6
烷基(例如甲基)、包含至多9個可相同或不同之鹵素原子之C1
-C6
鹵代烷基(例如三氟甲基)、未經取代或經取代之C1
-C6
烷氧基(例如甲氧基)、未經取代或經取代之C1
-C6
鹵代烷氧基(例如三氟甲氧基)及三甲基矽基,較佳地,X係鹵素原子(例如氯原子、溴原子或氟原子)、未經取代之C1
-C6
烷基(例如甲基)或未經取代之C1
-C6
烷氧基(例如甲氧基);
● W係CY1
,其中Y1
選自由以下組成之群:氫原子、鹵素原子、未經取代或經取代之C1
-C6
烷基、包含至多9個可相同或不同之鹵素原子之C1
-C6
鹵代烷基、未經取代或經取代之C3
-C7
環烷基、羥基、未經取代或經取代之C1
-C6
烷氧基、包含至多9個可相同或不同之鹵素原子之C1
-C6
鹵代烷氧基、未經取代或經取代之C1
-C6
烷氧羰基、甲醯基及氰基,較佳地,Y1
係氫原子;
● Y2
、Y3
、Y4
及Y5
係獨立地選自由以下組成之群:氫原子、鹵素原子、未經取代或經取代之C1
-C6
烷基、包含至多9個可相同或不同之鹵素原子之C1
-C6
鹵代烷基(例如三氟甲基)及氰基,較佳地,Y2
、Y3
、Y4
及Y5
獨立地係氫原子或鹵素原子,更佳地,Y2
、Y3
及Y4
係氫原子,且Y5
係氫原子或鹵素原子;
● L1
係CR1a
R1b
,其中R1a
及R1b
獨立地係氫原子或C1
-C8
烷基;
● R2a
係C1
-C8
烷基;
● R2c
選自由以下組成之群:未經取代或經取代之C1
-C6
烷基、包含至多9個可相同或不同之鹵素原子之C1
-C6
鹵代烷基、未經取代或經取代之C2
-C8
烯基、包含至多9個可相同或不同之鹵素原子之C2
-C6
鹵代烯基、未經取代或經取代之C3
-C8
炔基、包含至多9個可相同或不同之鹵素原子之C3
-C8
鹵代炔基、未經取代或經取代之C3
-C7
環烷基、包含至多9個可相同或不同之鹵素原子之C3
-C7
鹵代環烷基、未經取代或經取代之芳基、未經取代或經取代之雜環基、未經取代或經取代之C3
-C7
環烷基-C1
-C8
烷基、未經取代或經取代之芳基-C1
-C6
烷基、未經取代或經取代之雜環基-C1
-C6
烷基及包含1至5個獨立地選自由N、O及S組成之清單的雜原子之未經取代或經取代之部分飽和或不飽和稠合雙環9員、10員或11員雜環基-C1
-C6
烷基,或R2a
及R2b
連同其所連接之碳原子一起形成未經取代或經取代之亞甲基,較佳地,R2c
選自由以下組成之群:未經取代或經取代之C1
-C6
烷基、未經取代或經取代之C2
-C8
烯基、未經取代或經取代之芳基-C1
-C6
烷基及未經取代或經取代之雜環基-C1
-C6
烷基,
以及其鹽、N-氧化物、金屬錯合物、類金屬錯合物及光學活性異構體或幾何異構體。In some embodiments, the compound is a compound according to formula (Ii) according to the present invention (i.e., of formula (I) compounds in which line L 2 CR 2a R 2b, wherein R 2b based -OR 2c):
Wherein A is a pyridyl or thienyl group, preferably, A is selected from
More preferably ;
Z is selected from the group consisting of a hydrogen atom, an unsubstituted or substituted C 1 -C 6 alkyl group (such as a methyl group), and a C 1 -C 6 haloalkane containing up to 9 halogen atoms which may be the same or different. a base, preferably a Z-based hydrogen atom;
● n is 0 or 1;
X is selected from the group consisting of a halogen atom (for example, a chlorine atom, a bromine atom or a fluorine atom), an unsubstituted or substituted C 1 -C 6 alkyl group (for example, a methyl group), containing up to 9 or the same or C 1 -C 6 haloalkyl (for example trifluoromethyl), unsubstituted or substituted C 1 -C 6 alkoxy (eg methoxy), unsubstituted or substituted C, of a different halogen atom a 1- C 6 haloalkoxy group (for example, a trifluoromethoxy group) and a trimethyl fluorenyl group, preferably an X-based halogen atom (for example, a chlorine atom, a bromine atom or a fluorine atom), and an unsubstituted C 1 -C a 6 alkyl group (such as a methyl group) or an unsubstituted C 1 -C 6 alkoxy group (such as a methoxy group);
• W is CY 1 , wherein Y 1 is selected from the group consisting of a hydrogen atom, a halogen atom, an unsubstituted or substituted C 1 -C 6 alkyl group, and C containing up to 9 halogen atoms which may be the same or different 1- C 6 haloalkyl, unsubstituted or substituted C 3 -C 7 cycloalkyl, hydroxy, unsubstituted or substituted C 1 -C 6 alkoxy, containing up to 9 may be the same or different a C 1 -C 6 haloalkoxy group of a halogen atom, an unsubstituted or substituted C 1 -C 6 alkoxycarbonyl group, a decyl group and a cyano group, preferably a Y 1 -based hydrogen atom;
• Y 2 , Y 3 , Y 4 and Y 5 are independently selected from the group consisting of a hydrogen atom, a halogen atom, an unsubstituted or substituted C 1 -C 6 alkyl group, containing up to 9 may be the same or a C 1 -C 6 haloalkyl group (for example, a trifluoromethyl group) and a cyano group of different halogen atoms, preferably, Y 2 , Y 3 , Y 4 and Y 5 are each independently a hydrogen atom or a halogen atom, more preferably , Y 2 , Y 3 and Y 4 are hydrogen atoms, and Y 5 is a hydrogen atom or a halogen atom;
L 1 is CR 1a R 1b , wherein R 1a and R 1b are independently a hydrogen atom or a C 1 -C 8 alkyl group;
• R 2a is a C 1 -C 8 alkyl group;
● the group consisting of the following composition of R 2c is selected from: unsubstituted or substituted with of C 1 -C 6 alkyl group, may contain up to 9 identical or different halogen atoms C 1 -C 6 haloalkyl group, unsubstituted or the substituted C 2 -C 8 alkenyl, C may contain up to 9 identical or different halogen atoms 2 -C 6 haloalkenyl group, unsubstituted or substituted with of C 3 -C 8 alkynyl group, containing up to 9 C may be the same or different halogen atoms 3 -C 8 haloalkynyl, unsubstituted or substituted with of C 3 -C 7 cycloalkyl group, containing up to C 9 can be the same or different halogen atoms 3 - C 7 halocycloalkyl, unsubstituted or substituted aryl, unsubstituted or substituted heterocyclic, unsubstituted or substituted C 3 -C 7 cycloalkyl-C 1 -C 8 Alkyl, unsubstituted or substituted aryl-C 1 -C 6 alkyl, unsubstituted or substituted heterocyclyl-C 1 -C 6 alkyl and containing from 1 to 5 independently selected from N An unsubstituted or substituted partially saturated or unsaturated fused bicyclic 9 member, 10 member or 11 membered heterocyclyl-C 1 -C 6 alkyl group of a hetero atom of the list consisting of O and S, or R 2a and R 2b taken together with the carbon atom they are attached The group consisting of substituted or substituted alkylene group, preferably, R 2c is selected from: unsubstituted or substituted with of C 1 -C 6 alkyl, the unsubstituted or substituted C 2 -C 8 Alkenyl, unsubstituted or substituted aryl-C 1 -C 6 alkyl and unsubstituted or substituted heterocyclyl-C 1 -C 6 alkyl,
And salts thereof, N-oxides, metal complexes, metalloid complexes, and optically active isomers or geometric isomers.
R2c 之非限制性實例包括表1c中所揭示之R2c 基團中之任一者。Non-limiting examples of R 2c include any of the R 2c groups disclosed in Table 1c.
上文提及之較佳A、L1
、L2
、n、X、W、Y2
、Y3
、Y4
、Y5
及Z可以多種方式組合。因此,較佳特徵之此等組合提供根據本發明之化合物的子類。根據本發明之較佳化合物之此類子類之實例係:
- A之較佳特徵與L1
、L2
、n、X、W、Y2
、Y3
、Y4
、Y5
及Z之一或多個較佳特徵;
- L1
之較佳特徵與A、L2
、n、X、W、Y2
、Y3
、Y4
、Y5
及Z之一或多個較佳特徵;
- L2
之較佳特徵與A、L1
、n、X、W、Y2
、Y3
、Y4
、Y5
及Z之一或多個較佳特徵;
- n之較佳特徵與A、L1
、L2
、X、W、Y2
、Y3
、Y4
、Y5
及Z之一或多個較佳特徵;
- X之較佳特徵與A、L1
、L2
、n、W、Y2
、Y3
、Y4
、Y5
及Z之一或多個較佳特徵;
- W之較佳特徵與A、L1
、L2
、n、X、Y2
、Y3
、Y4
、Y5
及Z之一或多個較佳特徵;
- Y2
之較佳特徵與A、L1
、L2
、n、X、W、Y3
、Y4
、Y5
及Z之一或多個較佳特徵;
- Y3
之較佳特徵與A、L1
、L2
、n、X、W、Y2
、Y4
、Y5
及Z之一或多個較佳特徵;
- Y4
之較佳特徵與A、L1
、L2
、n、X、W、Y2
、Y3
、Y5
及Z之一或多個較佳特徵;
- Y5
之較佳特徵與A、L1
、L2
、n、X、W、Y2
、Y3
、Y4
及Z之一或多個較佳特徵;
- Z之較佳特徵與A、L1
、L2
、n、X、W、Y2
、Y3
、Y4
及Y5
之一或多個較佳特徵。Preferred A, L 1 , L 2 , n, X, W, Y 2 , Y 3 , Y 4 , Y 5 and Z mentioned above may be combined in various ways. Thus, such combinations of preferred features provide a subclass of the compounds according to the invention. Examples of such subclasses of preferred compounds according to the invention are:
a preferred feature of A and one or more preferred features of L 1 , L 2 , n, X, W, Y 2 , Y 3 , Y 4 , Y 5 and Z;
a preferred feature of L 1 and one or more preferred features of A, L 2 , n, X, W, Y 2 , Y 3 , Y 4 , Y 5 and Z;
a preferred feature of L 2 and one or more preferred features of A, L 1 , n, X, W, Y 2 , Y 3 , Y 4 , Y 5 and Z;
a preferred feature of -n and one or more preferred features of A, L 1 , L 2 , X, W, Y 2 , Y 3 , Y 4 , Y 5 and Z;
a preferred feature of X and one or more preferred features of A, L 1 , L 2 , n, W, Y 2 , Y 3 , Y 4 , Y 5 and Z;
a preferred feature of W and one or more preferred features of A, L 1 , L 2 , n, X, Y 2 , Y 3 , Y 4 , Y 5 and Z;
a preferred feature of Y 2 and one or more preferred features of A, L 1 , L 2 , n, X, W, Y 3 , Y 4 , Y 5 and Z;
a preferred feature of Y 3 and one or more preferred features of A, L 1 , L 2 , n, X, W, Y 2 , Y 4 , Y 5 and Z;
- Y 4 and wherein the preferred A, L 1, L 2, n, X, W, Y 2, Y 3, Y 5 and one or more of the preferred features of Z;
- Y 5 and wherein the preferred A, L 1, L 2, n, X, W, Y 2, Y 3, Y 4 and one or more of the preferred features of Z;
- a preferred feature of Z and one or more preferred features of A, L 1 , L 2 , n, X, W, Y 2 , Y 3 , Y 4 and Y 5 .
在本發明化合物之取代基之較佳特徵之此等組合中,該等較佳特徵亦可選自A、L1 、L2 、n、X、W、Y2 、Y3 、Y4 、Y5 及Z中之各者之更佳特徵,以便形成根據本發明之化合物之最佳子類。In such combinations of preferred features of the substituents of the compounds of the invention, such preferred features may also be selected from the group consisting of A, L 1 , L 2 , n, X, W, Y 2 , Y 3 , Y 4 , Y The preferred features of each of 5 and Z are such that a preferred subclass of the compound according to the invention is formed.
用於製備活性成分之方法
本發明亦關於用於製備式(I)化合物之方法。 Process for the preparation of active ingredients The invention also relates to a process for the preparation of a compound of formula (I).
除非另外指明,否則A、Z、n、X、W、Y1 、Y2 、Y3 、Y4 、Y5 、L1 、L2 、R1a 、R2a 、R1b 、R2b 具有上文針對式(I)化合物所給出之含義。此等定義不僅應用於式(I)之最終產物,但亦應用於所有中間體。Unless otherwise indicated, A, Z, n, X, W, Y 1 , Y 2 , Y 3 , Y 4 , Y 5 , L 1 , L 2 , R 1a , R 2a , R 1b , R 2b have the above The meaning given for the compound of formula (I). These definitions apply not only to the final product of formula (I) but also to all intermediates.
式(Ia) - (I)之化合物係多種式(I)之子組。除非另外說明,否則式(Ia) - (I)之所有取代基如上文針對式(I)所定義。The compounds of formula (Ia) - (I) are a plurality of subgroups of formula (I). Unless otherwise stated, all substituents of formula (Ia) - (I) are as defined above for formula (I).
式(I)化合物可藉由類似於已知方法之多種途徑製備(參見例如及其中之參考文獻)。本文中描述適合的方法之非限制性實例。Compounds of formula (I) can be prepared by a variety of routes analogous to known methods (see, for example, the references therein). Non-limiting examples of suitable methods are described herein.
式(I)化合物可直接藉由執行方法P1、P3、P5或P8獲得,或可藉由根據本文所述之方法製備之另一式(I)化合物之轉化或衍生獲得。舉例而言,式(I)化合物可藉由用其他取代基替代式(I)之起始化合物之一或多個取代基而轉化為另一式(I)化合物。下文描述此類轉化或衍生之非限制性實例(方法P6、P7、P11、P12)。Compounds of formula (I) may be obtained directly by carrying out process P1, P3, P5 or P8, or may be obtained by conversion or derivatization of another compound of formula (I) prepared according to the methods described herein. For example, a compound of formula (I) can be converted to another compound of formula (I) by substituting one or more substituents of the starting compound of formula (I) with another substituent. Non-limiting examples of such transformations or derivatives are described below (Methods P6, P7, P11, P12).
如本文所定義之式(I)化合物或其鹽中之一者可藉由方法P1製備,該方法包括如以下反應方案所示使式(II)化合物或其鹽中之一者與式(III)化合物反應之步驟:
方法P1
其中A、n、X、Y2
、Y3
、Y4
、Y5
、W、Z、L1
及L2
如本文所定義,且U1
係氟原子、溴原子、氯原子、碘原子、甲磺醯基、甲苯磺醯基、三氟甲磺醯基或硼衍生物,諸如酸、酸酯或三氟酸鹽鉀衍生物。One of the compounds of formula (I), or a salt thereof, as defined herein, may be prepared by Process P1, which comprises reacting one of the compounds of Formula (II) or a salt thereof with Formula (III) as shown in the following reaction scheme The steps of the compound reaction:
Method P1
Wherein A, n, X, Y 2 , Y 3 , Y 4 , Y 5 , W, Z, L 1 and L 2 are as defined herein, and U 1 is a fluorine atom, a bromine atom, a chlorine atom, an iodine atom, A Sulfosyl, toluenesulfonyl, trifluoromethanesulfonyl or boron derivatives, such as acid, Acid ester or trifluoro Potassium salt derivatives.
方法P1可在諸如金屬鹽或錯合物之過渡金屬催化劑存在下,且適當時在配體存在下;適當時在鹼存在下且適當時在溶劑存在下執行。Process P1 can be carried out in the presence of a transition metal catalyst such as a metal salt or a complex, and optionally in the presence of a ligand; suitably in the presence of a base and, where appropriate, in the presence of a solvent.
出於此目的,適合的金屬衍生物係過渡金屬,諸如鈀或銅。Suitable metal derivatives for this purpose are transition metals such as palladium or copper.
出於此目的,合適的鈀鹽或錯合物係例如氯化鈀、乙酸鈀、肆(三苯基膦)鈀出於此目的,合適的鈀鹽或錯合物係例如氯化鈀、乙酸鈀、肆(三苯基膦)鈀(0)、雙(二亞苄基丙酮)鈀(0)、參(二亞苄基丙酮)二鈀(0)、雙(三苯基膦)二氯化鈀(II)、[1,1'-雙(二苯基膦基)二茂鐵]二氯化鈀(II)、雙(苯烯丙基)二氯化鈀(II)、雙(烯丙基)-二氯化鈀(II)或[1,1'-雙(二-第三丁基膦基)二茂鐵]二氯化鈀(II)。For this purpose, suitable palladium salts or complexes are, for example, palladium chloride, palladium acetate, ruthenium (triphenylphosphine) palladium. For this purpose, suitable palladium salts or complexes such as palladium chloride, acetic acid Palladium, ruthenium (triphenylphosphine) palladium (0), bis(dibenzylideneacetone)palladium (0), ginseng (dibenzylideneacetone) dipalladium (0), bis(triphenylphosphine)dichloride Palladium (II), [1,1'-bis(diphenylphosphino)ferrocene]palladium(II) dichloride, bis(phenylallyl)palladium(II) chloride, bis(ene) Propyl)-palladium(II) dichloride or [1,1'-bis(di-tert-butylphosphino)ferrocene]palladium(II) chloride.
亦有可能藉由向反應物中單獨添加諸如以下之鈀鹽及配體或鹽而在反應混合物中產生鈀錯合物:三乙基膦、三第三丁基膦、四氟硼酸三第三丁基鏻、三環己基膦、2-(二環已基膦基)聯苯、2-(二-第三丁基膦)聯苯、2-(二環已基膦基)-2'-(N,N-二甲胺基)聯苯、2-(第三丁基膦)-2'-(N,N-二甲胺基)聯苯、2-二-第三丁基膦-2',4',6'-三異丙基聯苯、2-二環己基膦基-2',4',6'-三異丙基聯苯、2-二環己基膦基-2,6'-二甲氧基聯苯、2-二環己基膦基-2',6'-二異丙氧基聯苯、聯三苯-膦、參-(鄰甲苯基)膦、3-(二苯膦基)苯磺酸鈉、參-2-(甲氧基-苯基)膦、2,2'-雙(二苯膦基)-1,1'-聯萘、1,4-雙(二苯膦基)丁烷、1,2-雙(二苯膦基)乙烷、1,4-雙(二環已基膦基)丁烷、1,2-雙(二環已基膦基)-乙烷、2-(二環已基膦基)-2'-(N,N-二甲胺基)-聯苯、1,1'-雙(二苯膦基)-二茂鐵、(R)-(-)-1-[(S)-2-二苯膦基)二茂鐵基]乙基二環己基膦、參-(2,4-第三丁基-苯基)亞磷酸酯、二(1-金剛烷基)-2-嗎啉基苯基膦或氯化1,3-雙(2,4,6-三甲基苯基)咪唑鎓。It is also possible to produce a palladium complex in the reaction mixture by separately adding a palladium salt such as the following to a ligand or a salt: triethylphosphine, tri-tert-butylphosphine, tetrafluoroborate, third, third Butyl hydrazine, tricyclohexylphosphine, 2-(bicyclohexylphosphino)biphenyl, 2-(di-tert-butylphosphine)biphenyl, 2-(dicyclohexylphosphino)-2'- (N,N-dimethylamino)biphenyl, 2-(t-butylphosphino)-2'-(N,N-dimethylamino)biphenyl, 2-di-t-butylphosphine-2 ',4',6'-Triisopropylbiphenyl, 2-dicyclohexylphosphino-2',4',6'-triisopropylbiphenyl, 2-dicyclohexylphosphino-2,6 '-Dimethoxybiphenyl, 2-dicyclohexylphosphino-2',6'-diisopropoxybiphenyl, tert-triphenyl-phosphine, gins-(o-tolyl)phosphine, 3-(two Sodium phenylphosphine), benzene-2-(methoxy-phenyl)phosphine, 2,2'-bis(diphenylphosphino)-1,1'-binaphthyl, 1,4-double ( Diphenylphosphino)butane, 1,2-bis(diphenylphosphino)ethane, 1,4-bis(bicyclohexylphosphino)butane, 1,2-bis(bicyclohexylphosphino) - ethane, 2-(bicyclohexylphosphino)-2'-(N,N-dimethylamino)-biphenyl, 1,1'-bis(diphenylphosphino)-ferrocene, (R)-(-)-1-[(S)-2-diphenylphosphino)ferrocenyl]ethylbicyclohexane Phosphine, ginseng-(2,4-t-butyl-phenyl)phosphite, bis(1-adamantyl)-2-morpholinylphenylphosphine or 1,3-bis(2,4) , 6-trimethylphenyl)imidazolium.
亦宜從商業目錄(諸如Strem Chemicals之「Metal Catalysts for Organic Synthesis」)或Strem Chemicals之「Phosphorous Ligands and Compounds」)選擇適當的催化劑及/或配體。It is also preferred to select a suitable catalyst and/or ligand from a commercial catalog (such as "Metal Catalysts for Organic Synthesis" by Strem Chemicals) or "Phosphorous Ligands and Compounds" by Strem Chemicals.
出於此目的,合適的銅鹽或錯合物及其水合物為(例如):銅金屬、碘化出於此目的,適合的銅鹽或錯合物及其水合物係例如銅金屬、碘化亞銅(I)、氯化亞銅(I)、溴化亞銅(I)、氯化銅(II)、溴化銅(II)、氧化銅(II)、氧化亞銅(I)、乙酸銅(II)、乙酸亞銅(I)、噻吩-2-甲酸亞銅(I)、氰化亞銅(I)、硫酸銅(II)、雙(2,2,6,6-四甲基-3,5-庚二酮酸)銅(II)、三氟甲烷磺酸銅(II)、六氟磷酸肆(乙腈)亞銅(I)、四氟硼酸肆(乙腈)亞銅(I)。Suitable copper salts or complexes and hydrates thereof for this purpose are, for example: copper metal, iodide for this purpose, suitable copper salts or complexes and hydrates thereof such as copper metal, iodine Cuprous (I), cuprous chloride (I), cuprous bromide (I), copper (II) chloride, copper (II) bromide, copper (II) oxide, cuprous oxide (I), Copper (II) acetate, copper (I) acetate, copper (I) thiophene-2-carboxylate, copper (I) cyanide, copper (II) sulfate, double (2,2,6,6-tetramethyl) Base-3,5-heptanedionate) copper (II), copper (II) trifluoromethanesulfonate, copper (I) hexafluorophosphate (acetonitrile), bismuth tetrafluoroborate (acetonitrile) copper (I ).
亦有可能藉由向反應中單獨添加諸如以下之銅鹽及配體或鹽而在反應混合物中產生銅錯合物:乙二胺、N,N-二甲基乙二胺、N,N'-二甲基乙二胺、外消旋-反式-1,2-二胺基環己烷、外消旋-反式-N,N'-二甲基環己烷-1,2-二胺、1,1'-聯萘-2,2'-二胺、N,N,N',N'-四甲基乙二胺、脯胺酸、N,N-二甲基甘胺酸、喹啉-8-醇、吡啶、2-胺基吡啶、4-(二甲胺基)吡啶、2,2'-聯吡啶、2,6-二(2-吡啶基)吡啶、2-吡啶甲酸、2-(二甲胺基甲基)-3-羥基吡啶、1,10-啡啉、3,4,7,8-四甲基-1,10-啡啉、2,9-二甲基-1,10-啡啉、4,7-二甲氧基-1,10-啡啉、N,N'-雙[(E)-吡啶-2-基亞甲基]環己烷-1,2-二胺、N-[(E)-苯基亞甲基]、N-[(E)-苯基亞甲基]-環己胺、1,1,1-參(羥基甲基)乙烷、乙二醇、2,2,6,6-四甲基庚烷-3,5-二酮、2-(2,2-二甲基丙醯基)環己酮、乙醯基丙酮、二苯甲基甲烷、2-(2-甲基丙醯基)環己酮、聯苯-2-基(二-第三丁基)膦、伸乙基雙-(二苯基膦)、N,N-二乙基水楊醯胺、2-羥基苯甲醛肟、側氧基[(2,4,6-三甲基苯基)胺基]乙酸或1H-吡咯-2-甲酸。It is also possible to produce a copper complex in the reaction mixture by separately adding a copper salt such as the following and a ligand or salt to the reaction: ethylenediamine, N,N-dimethylethylenediamine, N,N' - dimethylethylenediamine, racemic-trans-1,2-diaminocyclohexane, racemic-trans-N,N'-dimethylcyclohexane-1,2-di Amine, 1,1'-binaphthyl-2,2'-diamine, N,N,N',N'-tetramethylethylenediamine, valine acid, N,N-dimethylglycine, Quinoline-8-ol, pyridine, 2-aminopyridine, 4-(dimethylamino)pyridine, 2,2'-bipyridine, 2,6-bis(2-pyridyl)pyridine, 2-picolinic acid , 2-(dimethylaminomethyl)-3-hydroxypyridine, 1,10-morpholine, 3,4,7,8-tetramethyl-1,10-morpholine, 2,9-dimethyl -1,10-morpholine, 4,7-dimethoxy-1,10-morpholine, N,N'-bis[(E)-pyridin-2-ylmethylene]cyclohexane-1, 2-diamine, N-[(E)-phenylmethylene], N-[(E)-phenylmethylene]-cyclohexylamine, 1,1,1-paraxyl (hydroxymethyl) Alkane, ethylene glycol, 2,2,6,6-tetramethylheptane-3,5-dione, 2-(2,2-dimethylpropenyl)cyclohexanone, etidylacetone, Diphenylmethylmethane, 2-(2-methylpropenyl)cyclohexanone, biphenyl-2-yl(di-tert-butyl)phosphine, extens Ethyl bis-(diphenylphosphine), N,N-diethyl salicylamine, 2-hydroxybenzaldehyde oxime, pendant oxy[(2,4,6-trimethylphenyl)amino] Acetic acid or 1H-pyrrole-2-carboxylic acid.
亦宜從商業目錄(諸如Strem Chemicals之「Metal Catalysts for Organic Synthesis」)或綜述(Chemical Society Reviews (2014),43 , 3525;Coordination Chemistry Reviews (2004),248 , 2337及其中之參考文獻)選擇適當的催化劑及/或配體。It is also appropriate to select an appropriate one from a commercial catalog (such as "Metal Catalysts for Organic Synthesis" by Strem Chemicals) or a review (Chemical Society Reviews (2014), 43 , 3525; Coordination Chemistry Reviews (2004), 248 , 2337 and references therein). Catalyst and / or ligand.
適用於進行方法P1之鹼可為此類反應習用之無機鹼及有機鹼。較佳使用鹼土金屬或鹼金屬之氫氧化物,諸如氫氧化鈉、氫氧化鈣、氫氧化鉀或其他氫氧化銨衍生物;鹼土金屬、鹼金屬或銨之氟化物,諸如氟化鉀、氟化銫或氟化四丁銨;鹼土金屬或鹼金屬之碳酸鹽,諸如碳酸鈉、碳酸鉀、碳酸氫鉀、碳酸氫鈉或碳酸銫;鹼金屬或鹼土金屬之乙酸鹽,諸如乙酸鈉、乙酸鋰、乙酸鉀或乙酸鈣;鹼金屬醇化物,諸如第三丁醇鉀或第三丁醇鈉;鹼金屬磷酸鹽,諸如磷酸三鉀;三級胺,諸如三甲胺、三乙胺、三丁胺、N,N-二甲基苯胺、N,N-二環己基甲胺、N,N-二異丙基乙胺、N-甲基哌啶、N,N-二甲胺基吡啶、二氮雜二環辛烷(DABCO)、二氮雜二環壬烯(DBN)或二氮雜雙環十一烯(DBU);以及芳族鹼,諸如吡啶、甲基吡啶、二甲基吡啶或三甲基吡啶。Suitable bases for carrying out process P1 are the inorganic bases and organic bases customary for such reactions. Preferably, an alkaline earth metal or an alkali metal hydroxide such as sodium hydroxide, calcium hydroxide, potassium hydroxide or other ammonium hydroxide derivative; an alkaline earth metal, an alkali metal or ammonium fluoride such as potassium fluoride or fluorine is preferably used. Barium oxide or tetrabutylammonium fluoride; alkaline earth metal or alkali metal carbonate such as sodium carbonate, potassium carbonate, potassium hydrogencarbonate, sodium hydrogencarbonate or barium carbonate; alkali metal or alkaline earth metal acetate such as sodium acetate, acetic acid Lithium, potassium acetate or calcium acetate; alkali metal alkoxides such as potassium butoxide or sodium butoxide; alkali metal phosphates such as tripotassium phosphate; tertiary amines such as trimethylamine, triethylamine, tributyl Amine, N,N-dimethylaniline, N,N-dicyclohexylmethylamine, N,N-diisopropylethylamine, N-methylpiperidine, N,N-dimethylaminopyridine, two Azabicyclooctane (DABCO), diazabicyclononene (DBN) or diazabicycloundecene (DBU); and aromatic bases such as pyridine, picoline, lutidine or tri Methyl pyridine.
適用於進行方法P1之溶劑可為習用惰性有機溶劑。較佳使用視情況鹵化、脂族、脂環族或芳族烴,諸如石油醚、戊烷、己烷、庚烷、環己烷、甲基環己烷、苯、甲苯、二甲苯或十氫萘;氯苯、二氯苯、二氯甲烷、氯仿、四氯化碳、1,2-二氯乙烷或三氯乙烷;醚,諸如二乙醚、二異丙基醚、甲基第三丁基醚、甲基第三戊基醚、二噁烷、四氫呋喃、2-甲基四氫呋喃、1,2-二甲氧基乙烷、1,2-二乙氧基乙烷或苯甲醚;腈,諸如乙腈、丙腈、正丁腈或異丁腈或苯甲腈;醯胺,諸如N,N-二甲基甲醯胺、N,N-二甲基乙醯胺、N-甲基甲醯苯胺、N-甲基吡咯啶酮或六甲基磷醯三胺;脲,諸如1,3-二甲基-3,4,5,6-四氫-2(1H)-嘧啶酮;酯,諸如乙酸甲酯或乙酸乙酯;亞碸,諸如二甲亞碸;或碸,諸如環丁碸;及其混合物。The solvent suitable for carrying out the process P1 may be a conventional inert organic solvent. It is preferred to use halogenated, aliphatic, alicyclic or aromatic hydrocarbons as appropriate, such as petroleum ether, pentane, hexane, heptane, cyclohexane, methylcyclohexane, benzene, toluene, xylene or decahydro Naphthalene; chlorobenzene, dichlorobenzene, dichloromethane, chloroform, carbon tetrachloride, 1,2-dichloroethane or trichloroethane; ethers such as diethyl ether, diisopropyl ether, methyl third Butyl ether, methyl tertiary amyl ether, dioxane, tetrahydrofuran, 2-methyltetrahydrofuran, 1,2-dimethoxyethane, 1,2-diethoxyethane or anisole; Nitrile such as acetonitrile, propionitrile, n-butyronitrile or isobutyronitrile or benzonitrile; decylamine such as N,N-dimethylformamide, N,N-dimethylacetamide, N-methyl Toluene aniline, N-methylpyrrolidone or hexamethylphosphonium triamine; urea, such as 1,3-dimethyl-3,4,5,6-tetrahydro-2(1H)-pyrimidinone; An ester such as methyl acetate or ethyl acetate; an anthracene such as dimethyl hydrazine; or an anthracene such as cyclobutyl hydrazine; and mixtures thereof.
方法P1可在諸如氬氣或氮氣氛圍之惰性氛圍中進行。當進行方法P1時,每莫耳式(II)化合物可採用1莫耳或過量之式(III)化合物及1至5莫耳之鹼。當使用鈀鹽或錯合物時,每莫耳式(II)化合物可採用0.01至20莫耳百分比之鈀錯合物。當使用銅鹽或錯合物時,每莫耳式(II)化合物可採用0.01至200莫耳百分比之銅錯合物。亦有可能採用其他比率之反應組分。藉由已知方法進行處理。Process P1 can be carried out in an inert atmosphere such as an argon or nitrogen atmosphere. When the method P1 is carried out, a compound of the formula (III) and a base of 1 to 5 moles per mole of the compound of the formula (II) can be used. When a palladium salt or a complex is used, a palladium complex of 0.01 to 20 mole percent may be employed per mole of the compound of the formula (II). When a copper salt or a complex is used, a copper complex of 0.01 to 200 mole percent can be used per mole of the compound of the formula (II). It is also possible to use other ratios of reaction components. Processing is performed by a known method.
式(III)之衍生物或其鹽中之一者可藉由方法P2製備,該方法包含如以下反應方案所示使式(IV)之衍生物脫除保護基:
方法P2
其中A、n、X、L1
及L2
如本文所定義,且V表示苯甲基、4-甲氧基苯甲基、烯丙基、未經取代或經取代之C1
-C6
烷基磺醯基(諸如三氟甲磺醯基)、未經取代或經取代之苯磺醯基(諸如甲苯基磺醯基)、未經取代或經取代之C1
-C6
烷氧羰基(諸如第三丁氧羰基)、未經取代或經取代之苯甲氧羰基、烯丙氧基羰基或2-三甲基矽基乙氧基甲基。One of the derivatives of formula (III) or a salt thereof can be prepared by Process P2 which comprises removing the protecting group of the derivative of formula (IV) as shown in the following reaction scheme:
Method P2
Wherein A, n, X, L 1 and L 2 are as defined herein, and V represents benzyl, 4-methoxybenzyl, allyl, unsubstituted or substituted C 1 -C 6 alkane Alkylsulfonyl (such as trifluoromethanesulfonyl), unsubstituted or substituted benzenesulfonyl (such as tolylsulfonyl), unsubstituted or substituted C 1 -C 6 alkoxycarbonyl ( For example, a third butoxycarbonyl group, an unsubstituted or substituted benzyloxycarbonyl group, an allyloxycarbonyl group or a 2-trimethyldecylethoxymethyl group.
方法P2可根據移除保護基之已知方法進行(Greene's Protective Groups in Organic Synthesis; Peter G. M. Wuts; Wiley; 第五版; 2014; 895-1194)。舉例而言,可在酸性介質中(例如用鹽酸或三氟乙酸)移除第三丁氧羰基保護基。苯甲基及苯甲氧羰基保護基可在催化劑(例如鈀/活性碳)存在下以氫解方式用氫移除。The method P2 can be carried out according to a known method of removing a protecting group (Greene's Protective Groups in Organic Synthesis; Peter G. M. Wuts; Wiley; Fifth Edition; 2014; 895-1194). For example, the third butoxycarbonyl protecting group can be removed in an acidic medium (eg, with hydrochloric acid or trifluoroacetic acid). The benzyl and benzyloxycarbonyl protecting groups can be removed by hydrogen in the presence of a catalyst such as palladium on carbon.
式(IV)化合物可根據已知方法來製備(The Chemistry of Functional Groups - The Chemistry of sulphonic acids, esters and their derivatives; Saul Patai, Avi Rappoport; Wiley-Interscience; 1991; 851-878)。The compound of the formula (IV) can be produced according to a known method (The Chemistry of Functional Groups - The Chemistry of sulphonic acids, esters and their derivatives; Saul Patai, Avi Rappoport; Wiley-Interscience; 1991; 851-878).
如本文所定義之式(I)化合物或其鹽中之一者可如以下反應方案所示藉由方法P3由式(V)化合物或其鹽中之一者藉由分子間環化反應來製備:
方法P3
其中A、n、X、Y2
、Y3
、Y4
、Y5
、W、Z、L1
及L2
如本文所定義且U2
係氯原子或氟原子。One of the compounds of formula (I) or a salt thereof as defined herein may be prepared by intermolecular cyclization from one of the compounds of formula (V) or a salt thereof by Method P3 as shown in the following reaction scheme. :
Method P3
Wherein A, n, X, Y 2 , Y 3 , Y 4 , Y 5 , W, Z, L 1 and L 2 are as defined herein and U 2 is a chlorine atom or a fluorine atom.
適當時,方法P3可在鹼存在下,且適當時在溶劑存在下,較佳在無水條件下執行。When appropriate, the method P3 can be carried out in the presence of a base and, where appropriate, in the presence of a solvent, preferably under anhydrous conditions.
適用於進行方法P3之溶劑不受特別限制。其可為習用惰性有機溶劑,只要其不溶解與其反應之化合物或展現與其之任何特定相互作用即可。較佳使用視情況鹵化、脂族、脂環族或芳族烴,諸如石油醚、戊烷、己烷、庚烷、環己烷、甲基環己烷、苯、甲苯、二甲苯或十氫萘、ISOPARTM E或ISOPARTM G、氯苯、二氯苯、二氯甲烷、氯仿、四氯化碳、1,2-二氯乙烷或三氯乙烷;醚,諸如二乙醚、二異丙基醚、甲基第三丁基醚、甲基第三戊基醚、二噁烷、四氫呋喃、2-甲基四氫呋喃、1,2-二甲氧基乙烷、1,2-二乙氧基乙烷或苯甲醚;腈,諸如乙腈、丙腈、正丁腈或異丁腈或苯甲腈;醯胺,諸如N,N-二甲基甲醯胺、N,N-二甲基乙醯胺、N-甲基甲醯苯胺、N-甲基吡咯啶酮或六甲基磷醯三胺;脲,諸如1,3-二甲基-3,4,5,6-四氫-2(1H )-嘧啶酮;酯,諸如乙酸甲酯或乙酸乙酯;亞碸,諸如二甲亞碸;或碸,諸如環丁碸;及其混合物。The solvent suitable for carrying out the process P3 is not particularly limited. It may be a conventional inert organic solvent as long as it does not dissolve the compound with which it reacts or exhibits any specific interaction therewith. It is preferred to use halogenated, aliphatic, alicyclic or aromatic hydrocarbons as appropriate, such as petroleum ether, pentane, hexane, heptane, cyclohexane, methylcyclohexane, benzene, toluene, xylene or decahydro naphthalene, ISOPAR TM E or ISOPAR TM G, chlorobenzene, dichlorobenzene, dichloromethane, chloroform, carbon tetrachloride, 1,2-dichloroethane or trichloroethane; ethers, such as diethyl ether, diisopropyl Propyl ether, methyl tert-butyl ether, methyl third amyl ether, dioxane, tetrahydrofuran, 2-methyltetrahydrofuran, 1,2-dimethoxyethane, 1,2-diethoxy Ethyl or anisole; nitrile such as acetonitrile, propionitrile, n-butyronitrile or isobutyronitrile or benzonitrile; decylamine such as N,N-dimethylformamide, N,N-dimethyl Acetamide, N-methylformanilide, N-methylpyrrolidone or hexamethylphosphonium triamine; urea, such as 1,3-dimethyl-3,4,5,6-tetrahydro- 2(1 H )-pyrimidinone; an ester such as methyl acetate or ethyl acetate; an anthracene such as dimethyl hydrazine; or an anthracene such as cyclobutyl hydrazine; and mixtures thereof.
適用於進行方法P3之鹼可為習用於此類反應之無機及有機鹼,諸如關於方法P1所揭示之鹼。適用於進行根據本發明之方法P3之其他鹼可為醯胺或有機金屬衍生物。較佳係鹼金屬醯胺,諸如胺化鈉或胺化鉀;有機醯胺,諸如二異丙基胺基鋰(LDA)、四甲基哌啶鋰、六甲基二矽氮烷鋰(LiHMDS)、六甲基二矽氮烷鉀(KHMDS)或六甲基二矽氮烷鈉(NaHMDS);有機鋰衍生物,諸如甲基鋰、苯基鋰、正丁基鋰、第二丁基鋰、異丁基鋰或第三丁基鋰。Suitable bases for carrying out process P3 may be inorganic and organic bases customary for such reactions, such as the bases disclosed in relation to process P1. Other bases suitable for carrying out the process P3 according to the invention may be indoleamine or organometallic derivatives. Preferred are alkali metal guanamines such as sodium or potassium amide; organic guanamines such as lithium diisopropylamide (LDA), lithium tetramethylpiperidine, lithium hexamethyldiazepine (LiHMDS) ), hexamethyldiazepine potassium (KHMDS) or sodium hexamethyldisilazane (NaHMDS); organolithium derivatives such as methyl lithium, phenyl lithium, n-butyl lithium, second butyl lithium , isobutyl lithium or tert-butyl lithium.
當進行方法P3時,每莫耳式(V)化合物可採用1至5莫耳之鹼。亦有可能採用其他比率之反應組分。藉由已知方法進行處理。When the method P3 is carried out, 1 to 5 moles of a base may be used per mole of the (V) compound. It is also possible to use other ratios of reaction components. Processing is performed by a known method.
如本文所定義之式(V)化合物或其鹽中之一者可如以下反應方案所示藉由方法P4由式(VI)化合物或其鹽中之一者藉由鹵化反應製備:
方法P4
其中A、L1
、L2
、L3
、n、p、X、Y、Z如本文所定義且U2
係氯原子或氟原子,k係0、1或2。當k = 0時,U3
係氫原子、羥基、氯原子、未經取代或經取代之C1
-C6
烷基羰基或未經取代或經取代之C1
-C6
烷基硫基,當k = 1時,U3
係羥基、氯原子或氟原子,且當k = 2時,U3
係羥基。One of the compounds of the formula (V) or a salt thereof as defined herein may be prepared by halogenation of one of the compounds of the formula (VI) or a salt thereof by the method P4 as shown in the following reaction scheme:
Method P4
Wherein A, L 1 , L 2 , L 3 , n, p, X, Y, Z are as defined herein and U 2 is a chlorine atom or a fluorine atom, and k is 0, 1 or 2. When k = 0, U 3 is a hydrogen atom, a hydroxyl group, a chlorine atom, an unsubstituted or substituted C 1 -C 6 alkylcarbonyl group or an unsubstituted or substituted C 1 -C 6 alkylthio group, When k = 1, U 3 is a hydroxyl group, a chlorine atom or a fluorine atom, and when k = 2, U 3 is a hydroxyl group.
方法P4可根據已知方法進行(The Chemistry of Functional Groups - The Chemistry of sulphonic acids, esters and their derivatives; Saul Patai, Avi Rappoport; Wiley-Interscience; 1991; 351-399)。Process P4 can be carried out according to known methods (The Chemistry of Functional Groups - The Chemistry of sulphonic acids, esters and their derivatives; Saul Patai, Avi Rappoport; Wiley-Interscience; 1991; 351-399).
一旦遵循方法P4獲得,即可根據方法P3將式(V)化合物直接環化以得到式(I)化合物。Once the procedure P4 is followed, the compound of formula (V) can be directly cyclized according to method P3 to give the compound of formula (I).
式(VI)化合物可根據已知方法製備(The Chemistry of Functional Groups - The Chemistry of sulphonic acids, esters and their derivatives; Saul Patai, Avi Rappoport; Wiley-Interscience; 1991; 351-399;The Chemistry of Functional Groups - The Chemistry of sulphenic acids, esters and their derivatives; Saul Patai; Wiley-Interscience; 1990; 187-292;The Chemistry of Functional Groups - The Chemistry of the thiol group, 第1部分; Saul Patai; Wiley-Interscience; 1974; 163-270;The Chemistry of Functional Groups - The Chemistry of sulphinic acids, esters and their derivatives; Saul Patai; Wiley-Interscience; 1990; 185-216及577-602)。The compound of formula (VI) can be prepared according to known methods (The Chemistry of Functional Groups - The Chemistry of sulphonic acids, esters and their derivatives; Saul Patai, Avi Rappoport; Wiley-Interscience; 1991; 351-399; The Chemistry of Functional Groups - The Chemistry of sulphenic acids, esters and their derivatives; Saul Patai; Wiley-Interscience; 1990; 187-292; The Chemistry of Functional Groups - The Chemistry of the thiol group, Part 1; Saul Patai; Wiley-Interscience; 163-270; The Chemistry of Functional Groups - The Chemistry of sulphinic acids, esters and their derivatives; Saul Patai; Wiley-Interscience; 1990; 185-216 and 577-602).
如本文所定義式(I)化合物或其鹽中之一者可藉由方法P5由式(VII)化合物或其鹽中之一者藉由分子內環化反應製備:
方法P5
其中A、n、X、Y2
、Y3
、Y4
、Y5
、W、Z、L1
及L2
如本文所定義,且U4
係溴原子、氯原子、碘原子、甲磺醯基、甲苯磺醯基、三氟甲磺醯基或氟原子。One of the compounds of formula (I) or a salt thereof as defined herein may be prepared by intramolecular cyclization from one of the compounds of formula (VII) or a salt thereof by method P5:
Method P5
Wherein A, n, X, Y 2 , Y 3 , Y 4 , Y 5 , W, Z, L 1 and L 2 are as defined herein, and U 4 is a bromine atom, a chlorine atom, an iodine atom or a methanesulfonyl group. , toluenesulfonyl, trifluoromethanesulfonyl or fluorine atom.
方法P5可在諸如鈀之過渡金屬催化劑存在下,及適當時在膦配體或N-雜環碳烯配位體;或銅存在下,及適當時在配體存在下;及適當時在鹼存在下,及適當時在溶劑存在下執行。Process P5 can be in the presence of a transition metal catalyst such as palladium, and optionally in the presence of a phosphine ligand or an N-heterocyclic carbene ligand; or copper, and optionally in the presence of a ligand; and, where appropriate, a base Exist in the presence and/or where appropriate in the presence of a solvent.
當U4 係溴原子、氯原子、碘原子、甲磺醯基、甲苯磺醯基或三氟甲磺醯基時,方法P5可在諸如金屬鹽或錯合物之催化劑存在下進行。出於此目的,適合的金屬衍生物係過渡金屬,諸如鈀或銅。When U 4 is a bromine atom, a chlorine atom, an iodine atom, a methanesulfonyl group, a toluenesulfonyl group or a trifluoromethanesulfonyl group, the process P5 can be carried out in the presence of a catalyst such as a metal salt or a complex. Suitable metal derivatives for this purpose are transition metals such as palladium or copper.
當U4 係氯原子或氟原子時,方法P5可在僅存在鹼下進行。When U 4 is a chlorine atom or a fluorine atom, the method P5 can be carried out in the presence of only a base.
合適的金屬鹽或錯合物可如關於方法P1所揭示。Suitable metal salts or complexes can be as disclosed in relation to method P1.
適用於進行方法P5之鹼可為習用於此類反應之無機及有機鹼,諸如關於方法P1所揭示之鹼。Suitable bases for carrying out process P5 can be inorganic and organic bases customary for such reactions, such as the bases disclosed in relation to process P1.
適用於進行方法P5之溶劑可為習用惰性有機溶劑,諸如關於方法P1所揭示之溶劑。Suitable solvents for carrying out process P5 may be customary inert organic solvents, such as those disclosed in relation to process P1.
方法P5可在諸如氬氣或氮氣氛圍之惰性氛圍中進行。當進行方法P5時,每莫耳式(VII)化合物可採用1至5莫耳鹼。當使用鈀鹽或錯合物時,每莫耳式(VII)化合物可採用0.01至20莫耳百分比之鈀錯合物。當使用銅鹽或錯合物時,每莫耳式(VII)化合物可採用0.01至200莫耳百分比之銅錯合物。亦有可能採用其他比率之反應組分。藉由已知方法進行處理。Process P5 can be carried out in an inert atmosphere such as an argon or nitrogen atmosphere. When the method P5 is carried out, 1 to 5 moles of a base per mole of the compound of the formula (VII) can be used. When a palladium salt or a complex is used, a palladium complex of 0.01 to 20 mole percent can be used per mole of the compound of the formula (VII). When a copper salt or a complex is used, a copper complex of 0.01 to 200 mole percent can be used per mole of the compound of the formula (VII). It is also possible to use other ratios of reaction components. Processing is performed by a known method.
式(VII)化合物可根據已知方法來製備(The Chemistry of Functional Groups - The Chemistry of sulphonic acids, esters and their derivatives; Saul Patai, Avi Rappoport; Wiley-Interscience; 1991; 351-399)。The compound of the formula (VII) can be produced according to a known method (The Chemistry of Functional Groups - The Chemistry of sulphonic acids, esters and their derivatives; Saul Patai, Avi Rappoport; Wiley-Interscience; 1991; 351-399).
如本文所定義之式(Ib)化合物或其鹽中之一者(亦即式 (I) , 其中 R1b 不氫
)可藉由方法P6製備,該方法包含如以下反應方案所示使式(IA)化合物或其鹽中之一者(亦即式 (I) , 其中 R1b 為氫
)與式(VIII)化合物反應之步驟:
方法P6
其中A、n、X、Y2
、Y3
、Y4
、Y5
、W、Z、L2
、R1a
及R1b
如本文所定義,其限制條件為R1b
不係氫原子,且U5
係溴原子、氯原子、碘原子、甲磺醯基或甲苯磺醯基。The formula (Ib) as defined herein, of one of those compound or a salt thereof (i.e., formula (I), wherein R 1b is not hydrogen) can be prepared by the method P6, the method comprising the following reaction scheme represented by formula ( IA), or a salt thereof by one (i.e., formula (I), wherein the step of the reaction of R 1b is hydrogen) of formula (VIII):
Method P6
Wherein A, n, X, Y 2 , Y 3 , Y 4 , Y 5 , W, Z, L 2 , R 1a and R 1b are as defined herein, the limitation is that R 1b is not a hydrogen atom, and U 5 A bromine atom, a chlorine atom, an iodine atom, a methanesulfonyl group or a toluenesulfonyl group.
適當時,方法P6可在鹼存在下及在適當時在溶劑存在下進行。When appropriate, the process P6 can be carried out in the presence of a base and, where appropriate, in the presence of a solvent.
適用於進行方法P6之溶劑不受特別限制。其可為習用惰性有機溶劑,只要其不溶解與其反應之化合物或展現與其之任何特定相互作用即可。適合的溶劑可為例如關於方法P3所揭示之溶劑。The solvent suitable for carrying out the process P6 is not particularly limited. It may be a conventional inert organic solvent as long as it does not dissolve the compound with which it reacts or exhibits any specific interaction therewith. Suitable solvents can be, for example, the solvents disclosed in relation to process P3.
適用於進行方法P6之鹼可為習用於此類反應之無機及有機鹼,諸如關於方法P1及P3所揭示之鹼。Suitable bases for carrying out process P6 may be the inorganic and organic bases customary for such reactions, such as the bases disclosed with respect to processes P1 and P3.
當進行製程P6時,每莫耳式(IA)化合物可採用1莫耳或過量之式(VIII)化合物及1至5莫耳鹼。亦有可能採用其他比率之反應組分。藉由已知方法進行處理。When the process P6 is carried out, a compound of the formula (VIII) and 1 to 5 moles of a base may be used per mole of the compound of the formula (IA). It is also possible to use other ratios of reaction components. Processing is performed by a known method.
式(Ia)化合物或其鹽中之一者可根據方法P1、P3或P5製備。
如本文所定義之式(Id)化合物或其鹽中之一者(亦即式 (I) , 其中 L1 係 CH2 且 R1a 係 R1a ' 且 R2a 係 R2a '
)可藉由方法P7製備,該方法包含如以下反應方案所示使式(Ic)化合物或其鹽中之一者與式(IX)化合物反應之步驟:
方法P7
其中A、n、X、Y2
、Y3
、Y4
、Y5
、W、Z、L2
如本文所定義,R1a '
及R1b '
連同其所連接之碳原子一起形成3員、4員、5員或6員飽和或部分飽和的視情況經取代之碳環或雜環,其包含至少1個選自由N、O及S組成之清單的雜原子,或形成未經取代或經取代之飽和或部分不飽和的雙環[m1
,m2
,0]-C6
-C11
烷基,其中m2
≥1且m1
+ m2
= 4至9,或形成未經取代或經取代之飽和或部分不飽和的雜雙環[m1
,m2
,0]-C6
-C11
烷基,其包含1至4個獨立地選自由N、O及S組成之清單的雜原子,其中m2
≥ 1且m1
+ m2
= 4至9,或形成未經取代或經取代之飽和或部分不飽和的螺[n1
,n2
]-C5
-C11
烷基,其中n1
≥ 2且n1
+ n2
= 4至10,或形成未經取代或經取代之飽和或部分不飽和的雜螺[n1
,n2
]-C5
-C11
烷基,其包含1至4個獨立地選自由N、O及S組成之清單的雜原子,其中n1
≥ 2且n1
+ n2
= 4至10,且U5
及U5
,包含獨立地係溴原子、氯原子、碘原子、甲磺醯基或甲苯磺醯基。One of the compounds of the formula (Ia) or a salt thereof can be prepared according to the method P1, P3 or P5.
The formula (Id) as defined herein, of one of those compound or a salt thereof (i.e., formula (I), wherein L 1 CH 2 and R 1a-based system R 1a 'and R 2a R 2a based') prepared by the method Prepared by P7, the process comprising the step of reacting one of the compounds of formula (Ic) or a salt thereof with a compound of formula (IX) as shown in the following reaction scheme:
Method P7
Wherein A, n, X, Y 2 , Y 3 , Y 4 , Y 5 , W, Z, L 2 are as defined herein, and R 1a ' and R 1b ' together with the carbon atom to which they are attached form 3 members, 4 Optionally, 5 or 6 membered saturated or partially saturated, optionally substituted carbocyclic or heterocyclic ring containing at least one heteroatom selected from the list consisting of N, O and S, or formed as unsubstituted or substituted a saturated or partially unsaturated bicyclo[m 1 , m 2 ,0]-C 6 -C 11 alkyl group, wherein m 2 ≥1 and m 1 + m 2 = 4 to 9, or formed unsubstituted or substituted a saturated or partially unsaturated heterobicyclo[m 1 , m 2 ,0]-C 6 -C 11 alkyl group comprising from 1 to 4 heteroatoms independently selected from the list consisting of N, O and S, wherein m 2 ≥ 1 and m 1 + m 2 = 4 to 9, or an unsubstituted or substituted saturated or partially unsaturated spiro[n 1 ,n 2 ]-C 5 -C 11 alkyl group, wherein n 1 ≥ 2 and n 1 + n 2 = 4 to 10, or an unsubstituted or substituted saturated or partially unsaturated heterospiro[n 1 ,n 2 ]-C 5 -C 11 alkyl group, which comprises 1 to 4 heteroatoms independently selected from the list consisting of N, O and S, wherein n 1 ≥ 2 and n 1 + n 2 = 4 to 10, and U 5 and U 5 , which independently contains a bromine atom, a chlorine atom, an iodine atom, a methanesulfonyl group or a toluenesulfonyl group.
方法P7可在與方法P6中所揭示之條件類似的反應條件下進行。Process P7 can be carried out under reaction conditions similar to those disclosed in Method P6.
如本文所定義之式(Ie)化合物或其鹽中之一者(亦即式(I) ,
其中L2
C(=O)
)可如以下反應方案所示藉由方法P8由式(X)化合物或其鹽中之一者藉由分子內環化反應製備:
方法P8
其中A、n、X、Y2
、Y3
、Y4
、Y5
、W、Z、R1a
及R1b
如本文所定義,且U6
係離去基,諸如未經取代或經取代之C1
-C6
烷氧基、未經取代或經取代之二C1
-C8
烷基胺基或未經取代或經取代之N-[C1
-C6
烷氧基]-C1
-C6
烷基胺基。As defined herein, the formula (Ie) or a salt thereof by one of (i.e., formula (I), wherein L 2 C (= O)) may be illustrated by the following reaction scheme by the method of P8 formula (X) One of the compounds or their salts is prepared by intramolecular cyclization:
Method P8
Wherein A, n, X, Y 2 , Y 3 , Y 4 , Y 5 , W, Z, R 1a and R 1b are as defined herein, and the U 6 is a leaving group such as unsubstituted or substituted C. 1- C 6 alkoxy, unsubstituted or substituted di C 1 -C 8 alkylamino group or unsubstituted or substituted N-[C 1 -C 6 alkoxy]-C 1 -C 6 alkylamino group.
適當時,方法P8可在鹼存在下,且適當時在溶劑存在下,較佳在無水條件下執行。When appropriate, the method P8 can be carried out in the presence of a base and, where appropriate, in the presence of a solvent, preferably under anhydrous conditions.
適用於進行方法P8之溶劑不受特別限制。其可為習用惰性有機溶劑,只要其不溶解與其反應之化合物或展現與其之任何特定相互作用即可,諸如關於方法P3所揭示之溶劑。The solvent suitable for carrying out the process P8 is not particularly limited. It may be a conventional inert organic solvent as long as it does not dissolve the compound with which it reacts or exhibits any specific interaction therewith, such as the solvent disclosed in the method P3.
適用於進行方法P8之鹼可為習用於此類反應之無機及有機鹼,諸如關於方法P1及P3所揭示之鹼。Suitable bases for carrying out process P8 may be inorganic and organic bases customary for such reactions, such as the bases disclosed with respect to processes P1 and P3.
當進行方法P8時,每莫耳式(X)化合物可採用1至5莫耳鹼。亦有可能採用其他比率之反應組分。藉由已知方法進行處理。When the method P8 is carried out, 1 to 5 moles of a base per mole of the (X) compound can be used. It is also possible to use other ratios of reaction components. Processing is performed by a known method.
如本文所定義之式(X)化合物或其鹽中之一者可藉由方法P9製備,該方法包含使式(XI)化合物與其鹽中之一者:
其中A、n、X、Y2
、Y3
、Y4
、Y5
、W及Z如本文所定義,且U6
表示離去基,諸如未經取代或經取代之C1
-C6
烷氧基、未經取代或經取代之二C1
-C8
烷基胺基或未經取代或經取代之N-[C1
-C6
烷氧基]-C1
-C6
烷基胺基;與式(XIa)之衍生物或式(XIb)之衍生物反應之步驟:
其中R1a
及R1b
如本文所定義,且U7
係氟原子或氯原子。One of the compounds of formula (X) or a salt thereof as defined herein may be prepared by Process P9 which comprises one of the compounds of formula (XI) and a salt thereof:
Wherein A, n, X, Y 2 , Y 3 , Y 4 , Y 5 , W and Z are as defined herein, and U 6 represents a leaving group such as unsubstituted or substituted C 1 -C 6 alkoxy a substituted, unsubstituted or substituted di-C 1 -C 8 alkylamino group or an unsubstituted or substituted N-[C 1 -C 6 alkoxy]-C 1 -C 6 alkylamino group; Step of reacting with a derivative of formula (XIa) or a derivative of formula (XIb):
Wherein R 1a and R 1b are as defined herein, and U 7 is a fluorine atom or a chlorine atom.
適當時,方法P9可在鹼存在下,且適當時在溶劑存在下,較佳在無水條件下執行。When appropriate, the method P9 can be carried out in the presence of a base and, where appropriate, in the presence of a solvent, preferably under anhydrous conditions.
適用於進行方法P9之溶劑不受特別限制。其可為習用惰性有機溶劑,只要其不溶解與其反應之化合物或展現與其之任何特定相互作用即可,諸如關於方法P3所揭示之溶劑。The solvent suitable for carrying out the process P9 is not particularly limited. It may be a conventional inert organic solvent as long as it does not dissolve the compound with which it reacts or exhibits any specific interaction therewith, such as the solvent disclosed in the method P3.
適用於進行方法P9之鹼可為習用於此類反應之無機及有機鹼,諸如關於方法P1及P3所揭示之鹼。Suitable bases for carrying out process P9 may be the inorganic and organic bases customary for such reactions, such as the bases disclosed with respect to processes P1 and P3.
當進行方法P9時,每莫耳式(XI)化合物可採用1莫耳或過量之式(XIIa)或(XIIb)之化合物及1至5莫耳之鹼。亦有可能採用其他比率之反應組分。藉由已知方法進行處理。When the method P9 is carried out, a compound of the formula (XIIa) or (XIIb) and a base of 1 to 5 moles per mole of the compound of the formula (XI) can be used. It is also possible to use other ratios of reaction components. Processing is performed by a known method.
如本文所定義之式(XI)化合物或其鹽中之一者可藉由方法P10a製備,該方法包含如以下反應方案所示使式(II)化合物或其鹽中之一者與式(XIII)化合物反應之步驟:
方法P10a
其中A、n、X、Y2
、Y3
、Y4
、Y5
、W及Z如本文所定義,U1
係氟原子、溴原子、氯原子、碘原子、甲磺醯基、甲苯磺醯基或三氟甲磺醯基,且U6
表示離去基,諸如未經取代或經取代之C1
-C6
烷氧基、未經取代或經取代之二C1
-C8
烷基胺基或未經取代或經取代之N-[C1
-C6
-烷氧基]-C1
-C6
烷基胺基。One of the compounds of formula (XI) or a salt thereof, as defined herein, may be prepared by the method P10a which comprises reacting one of the compounds of formula (II) or a salt thereof with the formula (XIII) as shown in the following reaction scheme The steps of the compound reaction:
Method P10a
Wherein A, n, X, Y 2 , Y 3 , Y 4 , Y 5 , W and Z are as defined herein, U 1 is a fluorine atom, a bromine atom, a chlorine atom, an iodine atom, a methanesulfonyl group, a toluenesulfonate Or a trifluoromethanesulfonyl group, and U 6 represents a leaving group such as an unsubstituted or substituted C 1 -C 6 alkoxy group, an unsubstituted or substituted di C 1 -C 8 alkylamine Alkyl or unsubstituted or substituted N-[C 1 -C 6 -alkoxy]-C 1 -C 6 alkylamino group.
方法P10a可在與方法P1中所揭示之條件類似的反應條件下進行。Process P10a can be carried out under reaction conditions similar to those disclosed in Method P1.
如本文所定義之式(XI)化合物或其鹽中之一者可藉由方法P10b製備,該方法包含如以下反應方案所示使式(XIV)化合物或其鹽中之一者與式(XV)化合物反應之步驟:
方法P10b
其中A、n、X、Y2
、Y3
、Y4
、Y5
、W及Z如本文所定義,U1
係氟原子、溴原子、氯原子、碘原子、甲磺醯基、甲苯磺醯基或三氟甲磺醯基,且U6
表示離去基,諸如未經取代或經取代之C1
-C6
烷氧基、未經取代或經取代之二C1
-C8
烷基胺基或未經取代或經取代之N-[C1
-C6
-烷氧基]-C1
-C6
烷基胺基。One of the compounds of the formula (XI) or a salt thereof as defined herein may be prepared by the method P10b, which comprises one of the compounds of the formula (XIV) or a salt thereof, as shown in the following reaction scheme (XV) The steps of the compound reaction:
Method P10b
Wherein A, n, X, Y 2 , Y 3 , Y 4 , Y 5 , W and Z are as defined herein, U 1 is a fluorine atom, a bromine atom, a chlorine atom, an iodine atom, a methanesulfonyl group, a toluenesulfonate Or a trifluoromethanesulfonyl group, and U 6 represents a leaving group such as an unsubstituted or substituted C 1 -C 6 alkoxy group, an unsubstituted or substituted di C 1 -C 8 alkylamine Alkyl or unsubstituted or substituted N-[C 1 -C 6 -alkoxy]-C 1 -C 6 alkylamino group.
方法P10b可在與方法P1中所揭示之條件類似的反應條件下進行。Process P10b can be carried out under reaction conditions similar to those disclosed in Method P1.
如本文所定義式(If)化合物或其鹽中之一者(亦即式 (I) , 其中 L2 係 CF2
)可如以下反應方案所示藉由方法P11由式(Ie)化合物或其鹽中之一者(亦即式 (I) , 其中 L2 係 C(=O)
)藉由氟化反應製備:
方法P11
其中A、n、X、Y2
、Y3
、Y4
、Y5
、W、Z、R1a
及R1b
如本文所定義。As defined herein, the formula (If) or a salt thereof by one of (i.e., formula (I), wherein L 2 based CF 2) prepared by the method P11 by the formula (Ie) as a compound represented by the following reaction scheme, or one salt prepared by the fluorination reaction (i.e., formula (I), wherein L 2 based C (= O)) by:
Method P11
Wherein A, n, X, Y 2 , Y 3 , Y 4 , Y 5 , W, Z, R 1a and R 1b are as defined herein.
方法P11可在氟化劑存在下及適當時在溶劑存在下執行。Process P11 can be carried out in the presence of a fluorinating agent and, where appropriate, in the presence of a solvent.
適用於進行方法P11之氟化劑不受特別限制,限制條件為將其用於氟化。氟化劑之實例包括氟化硫,諸如四氟化硫、三氟化二乙基胺基硫、三氟化(N-嗎啉基)硫、三氟化雙(2-甲氧基乙基)胺基硫、2,2-二氟-1,3-二甲基咪唑啶或三氟化4-第三丁基-2,6-二甲基苯基硫。The fluorinating agent suitable for carrying out the process P11 is not particularly limited, and the limitation is that it is used for fluorination. Examples of the fluorinating agent include sulfur fluoride such as sulfur tetrafluoride, diethylaminosulfur trifluoride, (N-morpholinyl)sulfur trifluoride, and bis(2-methoxyethyl) trifluoride. Aminothio, 2,2-difluoro-1,3-dimethylimidazolium or 4-tert-butyl-2,6-dimethylphenylsulfide.
適用於進行方法P11之溶劑不受特別限制。其可為習用惰性有機溶劑,只要其不溶解與其反應之化合物或展現與其之任何特定相互作用即可。適合的溶劑可為例如關於方法P3所揭示之溶劑。The solvent suitable for carrying out the process P11 is not particularly limited. It may be a conventional inert organic solvent as long as it does not dissolve the compound with which it reacts or exhibits any specific interaction therewith. Suitable solvents can be, for example, the solvents disclosed in relation to process P3.
當進行方法P11時,每莫耳式(Ie)化合物可採用1至20莫耳氟化劑。亦有可能採用其他比率之反應組分。藉由已知方法進行處理。When the method P11 is carried out, 1 to 20 moles of a fluorinating agent may be used per mole of the (Ie) compound. It is also possible to use other ratios of reaction components. Processing is performed by a known method.
如本文所定義式(Ih)化合物或其鹽中之一者(亦即 式 (I) , 其中 L2 係 CFR2a
)可如以下反應方案所示藉由方法P12由式(Ig)化合物(亦即 式 (I) , 其中 L2 係 C(OH)R2a
)或其鹽中之一者藉由氟化反應製備:
方法P12
其中A、n、X、Y2
、Y3
、Y4
、Y5
、W、Z、R2a
及L1
如本文所定義。As defined herein formula (Ih) or a salt thereof by one of (i.e., formula (I), wherein L 2 based CFR 2a) may be illustrated by the following reaction scheme as P12 by the method of formula (Ig) compound (also i.e. of formula (I), wherein L 2 based C (OH) R 2a) or a salt thereof, one prepared by a fluorination reaction by:
Method P12
Wherein A, n, X, Y 2 , Y 3 , Y 4 , Y 5 , W, Z, R 2a and L 1 are as defined herein.
方法P12可在與方法P11中所揭示之條件類似的反應條件下進行。Process P12 can be carried out under reaction conditions similar to those disclosed in Method P11.
式(Ig)化合物或其鹽中之一者可由式(Ie)化合物或其鹽中之一者用熟習此項技術者已知之經典官能基互變方法(諸如減少或添加有機金屬試劑)來製備。One of the compounds of formula (Ig) or a salt thereof can be prepared from one of the compounds of formula (Ie) or a salt thereof by classical functional interconversion methods known to those skilled in the art, such as reduction or addition of organometallic reagents. .
如本文所定義式(Ii)化合物或其鹽中之一者(亦即 式 (I) , 其中 L2 係 CR2a
R2b 且 R2b 係 OR2C
)可由式(Ig)化合物或其鹽中之一者(亦即 式 (I) , 其中 L2 係 C(OH)R2a
)藉由熟習此項技術者已知之經典方法(諸如烷基化、親核性芳族基取代或過渡金屬催化之反應)製備:
其中A、n、X、Y2
、Y3
、Y4
、Y5
、W、Z、L1
及R2a
如本文所定義,且R2c
係C1
-C8
烷基、包含至多9個可相同或不同之鹵素原子之C1
-C8
鹵代烷基、C2
-C8
烯基、包含至多9個可相同或不同之鹵素原子之C2
-C8
鹵代烯基、C3
-C8
炔基、包含至多9個可相同或不同之鹵素原子之C3
-C8
鹵代炔基、C3
-C7
環烷基、包含至多9個可相同或不同之鹵素原子之C3
-C7
鹵代環烷基、C3
-C7
環烷基-C1
-C8
烷基、芳基、芳基-C1
-C8
烷基、雜環基、雜環基-C1
-C8
烷基及包含1至5個獨立地選自由N、O及S組成之清單的雜原子之部分飽和或不飽和稠合雙環9員、10員或11員雜環基-C1
-C8
烷基。The compounds as defined herein of formula (Ii) or a salt thereof by one of (i.e., formula (I), wherein L 2 CR 2a R 2b based and R 2b based OR 2C) by the formula (Ig) or a salt of one (i.e., formula (the I), wherein L 2 based C (OH) R 2a) known by those skilled in the art of classical methods (such as alkylation, nucleophilic aromatic substitution or transition metal catalyzed the Reaction) preparation:
Wherein A, n, X, Y 2 , Y 3 , Y 4 , Y 5 , W, Z, L 1 and R 2a are as defined herein, and R 2c is C 1 -C 8 alkyl, comprising up to 9 identical or different halogen atoms C 1 -C 8 -haloalkyl, C 2 -C 8 alkenyl group, may contain up to 9 identical or different halogen atoms C 2 -C 8 haloalkenyl, C 3 -C 8 alkynyl group, may contain up to 9 identical or different halogen atoms C 3 -C 8 haloalkynyl, C 3 -C cycloalkyl. 7, comprising up to 9 C may be the same or different halogen atoms 3 -C 7 halocycloalkyl, C 3 -C 7 cycloalkyl-C 1 -C 8 alkyl, aryl, aryl-C 1 -C 8 alkyl, heterocyclyl, heterocyclyl-C 1 -C 8 and alkyl contains 1 to 5 substituents independently selected from the group consisting of N, the heteroatom O, and S list consisting of a saturated or unsaturated fused bicyclic 9, 10 or 11-membered heterocyclic group -C 1 -C 8 alkyl.
式(I)化合物之對應N-氧化物可藉由熟習此項技術者已知之經典氧化方法製備。The corresponding N-oxides of the compounds of formula (I) can be prepared by classical oxidation methods known to those skilled in the art.
方法P1、P2、P3、P4、P5、P6、P7、P8、P9、P10、P11及P12一般在大氣壓下進行。亦有可能在高壓或減壓下操作。The methods P1, P2, P3, P4, P5, P6, P7, P8, P9, P10, P11 and P12 are generally carried out under atmospheric pressure. It is also possible to operate under high pressure or reduced pressure.
當進行方法P1、P2、P3、P4、P5、P6、P7、P8、P9、P10、P11及P12時,反應溫度可在相對較寬之範圍內變化。一般而言,此等方法係在-78℃至200℃、較佳-78℃至150℃之溫度下進行。控制方法之溫度的方式係使用微波技術。When the methods P1, P2, P3, P4, P5, P6, P7, P8, P9, P10, P11 and P12 are carried out, the reaction temperature can be varied within a relatively wide range. Generally, such processes are carried out at temperatures ranging from -78 ° C to 200 ° C, preferably from -78 ° C to 150 ° C. The method of controlling the temperature of the method uses microwave technology.
藉由習用方法進行處理。一般而言,用水處理反應混合物,且分離出有機相,且在乾燥後減壓濃縮。適當時,剩餘的殘餘物可藉由諸如層析、結晶或蒸餾之習用方法自仍可存在之任何雜質釋放。It is processed by a conventional method. In general, the reaction mixture is treated with water, and the organic phase is separated and concentrated under reduced pressure. Where appropriate, the remaining residue may be released from any impurities that may still be present by conventional methods such as chromatography, crystallization or distillation.
式(I)化合物可根據上文所述之通用製備方法且藉由熟習此項技術者已知的經典官能基互變方法製備。然而應理解,基於其常識及可用之公開案,熟習此相關技藝之人士將能夠根據合成所需的各化合物之特殊性來調整該等方法。Compounds of formula (I) can be prepared according to the general preparation methods described above and by classical functional interconversion methods known to those skilled in the art. However, it should be understood that those skilled in the art will be able to adapt the methods to the particularity of each compound required for the synthesis based on their common knowledge and available disclosure.
用於製備活性成分之中間體
本發明亦關於用於製備式(I)化合物之中間體。 Intermediates for the preparation of active ingredients The invention also relates to intermediates useful in the preparation of compounds of formula (I).
因此,本發明係關於式(IIIa)及(IVa)之化合物以及其可接受之鹽:
其中:
A、n及L2
如本文所定義;
Xb
係獨立地選自由以下組成之群:鹵素原子、C1
-C8
烷基、包含至多9個可相同或不同之鹵素原子之C1
-C8
鹵代烷基、C2
-C8
烯基、包含至多9個可相同或不同之鹵素原子之C2
-C8
鹵代烯基、C2
-C8
炔基、包含至多9個可相同或不同之鹵素原子之C2
-C8
鹵代炔基、C3
-C7
環烷基、C4
-C7
環烯基、羥基、C1
-C8
烷氧基、包含至多9個可相同或不同之鹵素原子之C1
-C8
鹵代烷氧基、甲醯基、C1
-C8
烷基羰基、(羥亞胺基)C1
-C8
烷基、(C1
-C8
烷氧基亞胺基)C1
-C8
烷基、羧基、C1
-C8
烷氧羰基、氫硫基、C1
-C8
烷基氫硫基、C1
-C8
烷基亞磺醯基、C1
-C8
烷基磺醯基、C1
-C6
三烷基矽基、C1
-C6
三烷基矽基-C1
-C6
烷基、氰基及硝基,其中各X視情況經取代;
L1a
表示CR1a
R1b
,其中R1a
及R1b
如本文所定義,其限制條件為R1a
或R1b
不為芳基、芳基-C1
-C8
烷基、雜環基、雜環基-C1
-C8
烷基,及
V係苯甲基、4-甲氧基苯甲基、烯丙基、未經取代或經取代之C1
-C6
烷基磺醯基、三氟甲磺醯基、未經取代或經取代之苯磺醯基、未經取代或經取代之C1
-C6
烷氧羰基、未經取代或經取代之苯甲氧羰基、烯丙氧基羰基或2-三甲基矽基乙氧基甲基;
其限制條件為式(IIIa)或(IVa)之化合物不表示:
- 3,4-二氫-1H
-吡啶并[3,2-c][1,2]噻嗪2,2-二氧化物[412338-54-6],
- 4-溴-7-硝基-1,3-二氫[1,2]噻唑并[3,4-c]吡啶2,2-二氧化物[263887-69-0]及
- 1-烯丙基-1H
-吡啶并[2,3-c][1,2]噻嗪-4(3H
)-酮2,2-二氧化物[1418315-90-8]。Accordingly, the present invention relates to compounds of formula (IIIa) and (IVa) and acceptable salts thereof:
among them:
A, n and L 2 are as defined herein;
X b is independently selected from the system consisting of the group consisting of: a halogen atom, C 1 -C 8 alkyl group, may contain up to 9 identical or different halogen atoms C 1 -C 8 -haloalkyl, C 2 -C 8 alkenyl group a C 2 -C 8 haloalkenyl group, a C 2 -C 8 alkynyl group containing up to 9 halogen atoms which may be the same or different, a C 2 -C 8 halogenated group containing up to 9 halogen atoms which may be the same or different Alkynyl, C 3 -C 7 cycloalkyl, C 4 -C 7 cycloalkenyl, hydroxy, C 1 -C 8 alkoxy, C 1 -C 8 haloalkane containing up to 9 halogen atoms which may be the same or different Oxyl, decyl, C 1 -C 8 alkylcarbonyl, (hydroxyimino) C 1 -C 8 alkyl, (C 1 -C 8 alkoxyimino) C 1 -C 8 alkyl a carboxyl group, a C 1 -C 8 alkoxycarbonyl group, a thiol group, a C 1 -C 8 alkylthio group, a C 1 -C 8 alkylsulfinyl group, a C 1 -C 8 alkylsulfonyl group, a C 1 -C 6 trialkyl fluorenyl group, a C 1 -C 6 trialkyl fluorenyl-C 1 -C 6 alkyl group, a cyano group and a nitro group, wherein each X is optionally substituted;
L 1a represents CR 1a R 1b , wherein R 1a and R 1b are as defined herein, and the restriction is that R 1a or R 1b is not aryl, aryl-C 1 -C 8 alkyl, heterocyclic, heterocyclic a base-C 1 -C 8 alkyl group, and
V-benzyl, 4-methoxybenzyl, allyl, unsubstituted or substituted C 1 -C 6 alkylsulfonyl, trifluoromethanesulfonyl, unsubstituted or substituted Benzosulfonyl, unsubstituted or substituted C 1 -C 6 alkoxycarbonyl, unsubstituted or substituted benzyloxycarbonyl, allyloxycarbonyl or 2-trimethyldecylethoxy methyl;
A compound whose condition is that formula (IIIa) or (IVa) does not mean:
- 3,4-Dihydro-1 H -pyrido[3,2-c][1,2]thiazine 2,2-dioxide [412338-54-6],
4- 4-bromo-7-nitro-1,3-dihydro[1,2]thiazolo[3,4-c]pyridine 2,2-dioxide [263887-69-0] and
1-Allyl-1 H -pyrido[2,3-c][1,2]thiazine-4( 3H )-one 2,2-dioxide [1418315-90-8].
在化學資料庫及/或供應商資料庫中亦提及以下式(IIIa)或(IVa)之化合物,但無使得此等化合物能夠製備及分離之任何參考或資訊:
- 7-甲基-1,7-二氫吡唑并[3,4-c][1,2]噻嗪-4(3H
)-酮2,2-二氧化物[2137593-81-6],
- 1H
-噻吩并[3,2-c][1,2]噻嗪-4(3H
)-酮2,2-二氧化物[1710195-44-0],
- 苯甲基-1H
-噻吩并[3,2-c][1,2]噻嗪-4(3H
)-酮2,2-二氧化物[950277-11-9],
- (2E)-(2,2-二氧離子基-1H-噻吩并[3,2-c][1,2]噻嗪-4(3H)-亞基)乙酸乙酯[2172611-23-1]及
- (2E)-(2,2-二氧離子基-1H-噻吩并[3,2-c][1,2]噻嗪-4(3H)-亞基)乙酸甲酯[2169695-13-8]。The following compounds of formula (IIIa) or (IVa) are also mentioned in the chemical database and/or supplier database, but do not contain any references or information that enable the preparation and isolation of such compounds:
- 7-Methyl-1,7-dihydropyrazolo[3,4-c][1,2]thiazine-4(3 H )-one 2,2-dioxide [2137593-81-6 ],
- 1 H -thieno[3,2-c][1,2]thiazin-4(3 H )-one 2,2-dioxide [1710195-44-0],
- Benzyl-1 H -thieno[3,2-c][1,2]thiazin-4(3 H )-one 2,2-dioxide [950277-11-9],
- (2E)-(2,2-Dioxylyl-1H-thieno[3,2-c][1,2]thiazin-4(3H)-ylidene)ethyl acetate [2172611-23- 1] and
- (2E)-(2,2-Dioxylyl-1H-thieno[3,2-c][1,2]thiazin-4(3H)-ylidene)acetate [2169695-13- 8].
本發明亦關於式(V)及(VI)之化合物以及其鹽:
其中:
A、n、X、Y2
、Y3
、Y4
、Y5
、W、Z、L1
及L2
如本文所定義;
k係0、1或2;
U2
係氯原子或氟原子;及
當k = 0時,U3
係氫原子、羥基、氯原子、未經取代或經取代之C1
-C6
烷基羰基或未經取代或經取代之C1
-C6
烷基硫基,當k = 1時,係羥基、氯原子或氟原子,且當k = 2時,係羥基。The invention also relates to compounds of formula (V) and (VI) and salts thereof:
among them:
A, n, X, Y 2 , Y 3 , Y 4 , Y 5 , W, Z, L 1 and L 2 are as defined herein;
k is 0, 1 or 2;
U 2 is a chlorine atom or a fluorine atom; and when k = 0, a U 3 -based hydrogen atom, a hydroxyl group, a chlorine atom, an unsubstituted or substituted C 1 -C 6 alkylcarbonyl group or unsubstituted or substituted A C 1 -C 6 alkylthio group, when k = 1, is a hydroxyl group, a chlorine atom or a fluorine atom, and when k = 2, it is a hydroxyl group.
本發明亦關於式(VII)化合物以及其鹽:
其中:
A、n、X、Y2
、Y3
、Y4
、Y5
、W、Z、L1
及L2
如本文所定義;及
U4
係氟原子、氯原子、溴原子、碘原子、甲磺醯基、甲苯磺醯基、甲磺醯基或三氟甲磺醯基。The invention also relates to compounds of formula (VII) and salts thereof:
among them:
A, n, X, Y 2 , Y 3 , Y 4 , Y 5 , W, Z, L 1 and L 2 are as defined herein;
U 4 is a fluorine atom, a chlorine atom, a bromine atom, an iodine atom, a methanesulfonyl group, a toluenesulfonyl group, a methanesulfonyl group or a trifluoromethanesulfonyl group.
本發明亦關於式(X)化合物以及其鹽:
其中:
A、n、X、Y2
、Y3
、Y4
、Y5
、W、Z、R1a
及R1b
如本文所定義;及
U6
係未經取代或經取代之C1
-C6
烷氧基、未經取代或經取代之二C1
-C8
烷基胺基或未經取代或經取代之N-[C1
-C6
烷氧基]-C1
-C6
烷基胺基。The invention also relates to compounds of formula (X) and salts thereof:
among them:
A, n, X, Y 2 , Y 3, Y 4, Y 5, W, Z, R 1a and R 1b as defined herein; and
U 6 is an unsubstituted or substituted C 1 -C 6 alkoxy group, an unsubstituted or substituted di C 1 -C 8 alkylamino group or an unsubstituted or substituted N-[C 1 - C 6 alkoxy]-C 1 -C 6 alkylamino group.
本發明亦關於式(XIa)化合物以及其鹽:
其中:
A、n、Y2
、Y3
、Y4
、Y5
及W如本文所定義;
Xb
係獨立地選自由以下組成之群:鹵素原子、C1
-C8
烷基、包含至多9個可相同或不同之鹵素原子之C1
-C8
鹵代烷基、C2
-C8
烯基、包含至多9個可相同或不同之鹵素原子之C2
-C8
鹵代烯基、C2
-C8
炔基、包含至多9個可相同或不同之鹵素原子之C2
-C8
鹵代炔基、C3
-C7
環烷基、C4
-C7
環烯基、羥基、C1
-C8
烷氧基、包含至多9個可相同或不同之鹵素原子之C1
-C8
鹵代烷氧基、甲醯基、C1
-C8
烷基羰基、(羥亞胺基)C1
-C8
烷基、(C1
-C8
烷氧基亞胺基)C1
-C8
烷基、羧基、C1
-C8
烷氧羰基、氫硫基、C1
-C8
烷基氫硫基、C1
-C8
烷基亞磺醯基、C1
-C8
烷基磺醯基、C1
-C6
三烷基矽基、C1
-C6
三烷基矽基-C1
-C6
烷基、氰基及硝基,其中各X視情況經取代;
Za
選自由以下組成之群:氫原子、C1
-C8
烷基、包含至多9個可相同或不同之鹵素原子之C1
-C8
鹵代烷基、C2
-C8
烯基、包含至多9個可相同或不同之鹵素原子之C2
-C8
鹵代烯基、C2
-C8
炔基、包含至多9個可相同或不同之鹵素原子之C2
-C8
鹵代炔基、C3
-C7
環烷基、C4
-C7
環烯基、芳基、雜環基、甲醯基、C1
-C8
烷基羰基、(羥亞胺基)C1
-C8
烷基、(C1
-C8
烷氧基亞胺基)C1
-C8
烷基、羧基、C1
-C8
烷氧羰基、胺甲醯基、C1
-C8
烷基胺甲醯基、二C1
-C8
烷基胺甲醯基;及
U6
係未經取代或經取代之C1
-C6
烷氧基、未經取代或經取代之二C1
-C8
烷基胺基或未經取代或經取代之N-[C1
-C6
烷氧基]-C1
-C6
烷基胺基;
其限制條件為式(X)化合物不表示:
- 4-甲基-2-(甲基硫基)-6-(喹啉-3-基胺基)嘧啶-5-甲酸甲酯[1586744-10-6]。The invention also relates to compounds of formula (XIa) and salts thereof:
among them:
A, n, Y 2 , Y 3 , Y 4 , Y 5 and W are as defined herein;
X b is independently selected from the system consisting of the group consisting of: a halogen atom, C 1 -C 8 alkyl group, may contain up to 9 identical or different halogen atoms C 1 -C 8 -haloalkyl, C 2 -C 8 alkenyl group a C 2 -C 8 haloalkenyl group, a C 2 -C 8 alkynyl group containing up to 9 halogen atoms which may be the same or different, a C 2 -C 8 halogenated group containing up to 9 halogen atoms which may be the same or different Alkynyl, C 3 -C 7 cycloalkyl, C 4 -C 7 cycloalkenyl, hydroxy, C 1 -C 8 alkoxy, C 1 -C 8 haloalkane containing up to 9 halogen atoms which may be the same or different Oxyl, decyl, C 1 -C 8 alkylcarbonyl, (hydroxyimino) C 1 -C 8 alkyl, (C 1 -C 8 alkoxyimino) C 1 -C 8 alkyl a carboxyl group, a C 1 -C 8 alkoxycarbonyl group, a thiol group, a C 1 -C 8 alkylthio group, a C 1 -C 8 alkylsulfinyl group, a C 1 -C 8 alkylsulfonyl group, a C 1 -C 6 trialkyl fluorenyl group, a C 1 -C 6 trialkyl fluorenyl-C 1 -C 6 alkyl group, a cyano group and a nitro group, wherein each X is optionally substituted;
The composition consisting of the following groups Z a is selected from: a hydrogen atom, C 1 -C 8 alkyl group, may contain up to 9 identical or different halogen atoms C 1 -C 8 -haloalkyl, C 2 -C 8 alkenyl group, containing up to 9 C 2 -C 8 haloalkenyl groups, C 2 -C 8 alkynyl groups which may be the same or different halogen atoms, C 2 -C 8 haloalkynyl groups containing up to 9 halogen atoms which may be the same or different, C 3 -C 7 cycloalkyl, C 4 -C 7 cycloalkenyl, aryl, heterocyclic, indolyl, C 1 -C 8 alkylcarbonyl, (hydroxyimino) C 1 -C 8 alkane , (C 1 -C 8 alkoxyimino)C 1 -C 8 alkyl, carboxy, C 1 -C 8 alkoxycarbonyl, amine carbhydryl, C 1 -C 8 alkylamine fluorenyl , a di C 1 -C 8 alkylamine carbenyl group;
U 6 is an unsubstituted or substituted C 1 -C 6 alkoxy group, an unsubstituted or substituted di C 1 -C 8 alkylamino group or an unsubstituted or substituted N-[C 1 - C 6 alkoxy]-C 1 -C 6 alkylamino group;
The restriction is that the compound of formula (X) does not mean:
- Methyl 4-methyl-2-(methylthio)-6-(quinolin-3-ylamino)pyrimidine-5-carboxylate [1586744-10-6].
在化學資料庫及/或供應商資料庫中提及下式(X)化合物,但無使得此等化合物能夠製備及分離之任何參考文獻或資訊:
- 4-乙醯基-5-甲基-2-[(3-甲基喹喏啉-2-基)胺基]-3-糠酸乙酯[1908892-99-8],
- 2-甲基-5-(喹喏啉-2-基胺基)呋喃-3,4-二甲酸二乙酯[1908488-18-5],
- 1-甲基-5-(喹喏啉-2-基胺基)-1H
-吡唑-4-甲酸乙酯[1905396-34-0],
- 2-甲基-5-[(3-甲基喹喏啉-2-基)胺基]呋喃-3,4-二甲酸二乙酯[1900900-95-9],
- 1-甲基-5-[(3-甲基喹喏啉-2-基)胺基]-1H
-吡唑-4-甲酸乙酯[1900401-91-3],
- 4-乙醯基-5-甲基-2-(喹喏啉-2-基胺基)-3-糠酸乙酯[1898509-52-8],及
- 5-(喹啉-3-基胺基)-1,3-噻唑-4-甲酸乙酯[1410431-43-4]。References to compounds of formula (X) below in the chemical database and/or supplier database, but without any references or information enabling the preparation and isolation of such compounds:
- 4-Ethyl-5-methyl-2-[(3-methylquinoxalin-2-yl)amino]-3-decanoic acid ethyl ester [1908892-99-8],
2-Dimethyl-5-(quinoxalin-2-ylamino)furan-3,4-dicarboxylic acid diethyl ester [1908488-18-5],
- 1-methyl-5-(quinoxalin-2-ylamino)-1 H -pyrazole-4-carboxylic acid ethyl ester [1905396-34-0],
2-Diethyl 2-methyl-5-[(3-methylquinoxalin-2-yl)amino]furan-3,4-dicarboxylate [1900900-95-9],
1-ethyl-5-[(3-methylquinoxalin-2-yl)amino]-1 H -pyrazole-4-carboxylic acid ethyl ester [1900401-91-3],
4-ethyl 4-mercapto-5-methyl-2-(quinoxalin-2-ylamino)-3-decanoate [1898509-52-8], and
- 5-(quinolin-3-ylamino)-1,3-thiazole-4-carboxylic acid ethyl ester [1410431-43-4].
組合物及調配物 本發明進一步係關於組合物,尤其用於控制不合需要之微生物之組合物,其包含一或多種式(I)化合物。組合物較佳係殺真菌組合物。Compositions and Formulations The present invention is further directed to compositions, particularly compositions for controlling undesirable microorganisms, comprising one or more compounds of formula (I). The composition is preferably a fungicidal composition.
組合物通常包含一或多種式(I)化合物及一或多種可接受之載劑,尤其一或多種農業上可接受之載劑。The compositions typically comprise one or more compounds of formula (I) and one or more acceptable carriers, especially one or more agriculturally acceptable carriers.
載劑係固體或液體、天然或合成的、有機或無機物質,其一般係惰性的。該載劑一般改良化合物向例如植物、植物部分或種子之施加。適合的固體載劑之實例包括(但不限於)銨鹽;天然石粉,諸如高嶺土、黏土、滑石、白堊、石英、綠坡縷石(attapulgite)、蒙脫石或矽藻土;及合成石粉,諸如細粉狀二氧化矽、氧化鋁及矽酸鹽。通常適用於製備顆粒之固體載劑之實例包括(但不限於):碾碎且分級之天然岩石,諸如方解石、大理石、浮石、海泡石及白雲石;合成的無機及有機粉末顆粒;及有機材料(諸如紙張、鋸屑、椰子殼、玉米穗軸及菸草梗)之顆粒。適合的液體載劑之實例包括(但不限於)水、有機溶劑及其組合。適合的溶劑之實例包括來自以下類別之極性及非極性有機化學液體:例如芳族及非芳族烴(諸如環己烷、石蠟、烷基苯、二甲苯、甲苯烷基萘、氯化芳族化合物或氯化脂族烴,諸如氯苯、氯乙烯或二氯甲烷)、乙醇及多元醇(其亦可視情況經取代、醚化及/或酯化,諸如丁醇或乙二醇)、酮(諸如丙酮、甲基乙基酮、甲基異丁基酮或環己酮)、酯(包括脂肪及油狀物)及(聚)醚、未經取代及經取代之胺、醯胺(諸如二甲基甲醯胺)、內醯胺(諸如N-烷基咯啶酮)及內酯、碸及亞碸(諸如二甲基亞碸)。載劑亦可為液化氣態填充劑(亦即在標準溫度下及在標準壓力下係氣態的液體),例如氣溶膠推進劑,諸如鹵代烴、丁烷、丙烷、氮氣及二氧化碳。按組合物之重量計,載劑之量通常在1至99.99%,較佳5至99.9%,更佳10至99.5%,且最佳20至99%範圍內。The carrier is a solid or liquid, natural or synthetic, organic or inorganic material which is generally inert. The carrier generally improves the application of the compound to, for example, plants, plant parts or seeds. Examples of suitable solid carriers include, but are not limited to, ammonium salts; natural stone powders such as kaolin, clay, talc, chalk, quartz, attapulgite, montmorillonite or diatomaceous earth; and synthetic stone powder, Such as fine powdered ceria, alumina and citrate. Examples of solid carriers generally suitable for the preparation of granules include, but are not limited to, ground and graded natural rocks such as calcite, marble, pumice, sepiolite and dolomite; synthetic inorganic and organic powder granules; Particles of materials such as paper, sawdust, coconut shells, corn cobs and tobacco stems. Examples of suitable liquid carriers include, but are not limited to, water, organic solvents, and combinations thereof. Examples of suitable solvents include polar and non-polar organic chemical liquids from the following classes: for example, aromatic and non-aromatic hydrocarbons (such as cyclohexane, paraffin, alkylbenzene, xylene, tolyl naphthalene, chlorinated aromatics) a compound or a chlorinated aliphatic hydrocarbon such as chlorobenzene, vinyl chloride or dichloromethane), ethanol and a polyol (which may also be substituted, etherified and/or esterified, such as butanol or ethylene glycol), ketone (such as acetone, methyl ethyl ketone, methyl isobutyl ketone or cyclohexanone), esters (including fats and oils) and (poly) ethers, unsubstituted and substituted amines, guanamines (such as Dimethylcarbendamine), indoleamine (such as N-alkylrrolidone) and lactones, hydrazine and hydrazine (such as dimethyl hydrazine). The carrier may also be a liquefied gaseous filler (i.e., a liquid that is gaseous at standard temperature and at standard pressure), such as an aerosol propellant such as a halogenated hydrocarbon, butane, propane, nitrogen, and carbon dioxide. The amount of the carrier is usually in the range of 1 to 99.99%, preferably 5 to 99.9%, more preferably 10 to 99.5%, and most preferably 20 to 99% by weight of the composition.
組合物可進一步包含習用於調配組合物(例如農用化學組合物)之一或多種可接受之助劑,諸如一或多種界面活性劑。The composition may further comprise one or more acceptable auxiliaries conventionally used in formulating compositions (e.g., agrochemical compositions), such as one or more surfactants.
界面活性劑可為離子(陽離子或陰離子)或非離子界面活性劑,諸如離子或非離子乳化劑、泡沫形成劑、分散劑、濕潤劑及其任何混合物。適合的界面活性劑之實例包括(但不限於)聚丙烯酸之鹽、木素磺酸之鹽、酚磺酸或萘磺酸之鹽、乙烯及/或環氧丙烷與脂肪醇、脂肪酸或脂肪胺之聚縮合物(聚氧化乙烯脂肪酸酯、聚氧化乙烯脂肪醇醚,例如烷芳基聚乙二醇醚)、經取代酚(較佳為烷基酚或芳基酚)、磺基丁二酸酯之鹽、牛磺酸衍生物(較佳為牛磺酸烷基酯)、聚乙氧基化醇或酚之磷酸酯、多元醇之脂肪酯及含有硫酸酯、磺酸酯及磷酸酯之化合物之衍生物(例如烷基磺酸酯、硫酸烷基酯、芳基磺酸酯)及蛋白質水解產物、木素亞硫酸鹽廢液及甲基纖維素。界面活性劑通常在式(I)化合物及/或載劑不溶於水且用水進行施加時使用。接著,表面活性劑之量通常在組合物之5至40重量%範圍內。The surfactant can be an ionic (cationic or anionic) or nonionic surfactant such as an ionic or nonionic emulsifier, a foam former, a dispersant, a humectant, and any mixture thereof. Examples of suitable surfactants include, but are not limited to, salts of polyacrylic acid, salts of lignosulfonic acid, salts of phenolsulfonic acid or naphthalenesulfonic acid, ethylene and/or propylene oxide with fatty alcohols, fatty acids or fatty amines Polycondensate (polyoxyethylene fatty acid ester, polyoxyethylene fatty alcohol ether, such as alkylaryl polyglycol ether), substituted phenol (preferably alkyl phenol or aryl phenol), sulfobutane a salt of an acid ester, a taurine derivative (preferably an alkyl taurate), a polyethoxylated alcohol or a phosphate of a phenol, a fatty ester of a polyhydric alcohol, and a sulfate, a sulfonate and a phosphate Derivatives of the compounds (for example, alkyl sulfonates, alkyl sulfates, aryl sulfonates) and protein hydrolysates, lignin sulfite waste liquids and methyl cellulose. The surfactant is generally used when the compound of formula (I) and/or the carrier is insoluble in water and applied with water. The amount of surfactant is then typically in the range of from 5 to 40% by weight of the composition.
習用於調配農用化學組合物之助劑之其他實例包括拒水劑、乾燥劑、黏合劑(黏著劑(adhesive)、增黏劑、固定劑,諸如羧甲基纖維素,呈粉末、顆粒或膠乳形式之天然及合成聚合物,諸如阿拉伯膠(gum arabic)、聚乙烯醇及聚乙酸乙烯酯,天然磷脂,諸如腦磷脂及卵磷脂及合成磷脂,聚乙烯吡咯啶酮、聚乙酸乙烯酯、聚乙烯醇及泰勒纖維素(tylose))、增稠劑、穩定劑(例如低溫穩定劑、防腐劑、抗氧化劑、光穩定劑或改良化學及/或物理穩定性之其他藥劑)、染料或顏料(諸如無機顏料,例如氧化鐵、氧化鈦及普魯士藍(Prussian Blue);有機染料,例如茜素(alizarin)、偶氮及金屬酞菁染料)、消泡劑(例如聚矽氧消泡劑及硬脂酸鎂)、防腐劑(例如二氯吩(dichlorophene)及苯甲醇半縮甲醛)、二次增稠劑(纖維素衍生物、丙烯酸衍生物、三仙膠、經改質之黏土及細粉狀二氧化矽)、黏著劑(sticker)、赤黴素(gibberellin)及加工助劑、礦物油及植物油、香料、蠟及營養素(包括痕量營養素,諸如鐵鹽、錳鹽、硼鹽、銅鹽、鈷鹽、鉬鹽及鋅鹽)、保護性膠體、搖溶性物質、滲透劑、螯合劑及錯合物形成劑。Other examples of auxiliaries useful in the formulation of agrochemical compositions include water repellents, desiccants, adhesives (adhesives, tackifiers, fixatives, such as carboxymethylcellulose, in the form of powders, granules or latexes). Forms of natural and synthetic polymers such as gum arabic, polyvinyl alcohol and polyvinyl acetate, natural phospholipids such as cephalin and lecithin and synthetic phospholipids, polyvinylpyrrolidone, polyvinyl acetate, poly Vinyl alcohol and tylose, thickeners, stabilizers (such as low temperature stabilizers, preservatives, antioxidants, light stabilizers or other agents that improve chemical and/or physical stability), dyes or pigments ( Such as inorganic pigments, such as iron oxide, titanium oxide and Prussian Blue; organic dyes such as alicarin, azo and metal phthalocyanine dyes, defoamers (such as polyfluorene defoamers and hard Magnesium sulphate), preservatives (such as dichlorophene and benzyl alcohol hemiformal), secondary thickeners (cellulose derivatives, acrylic acid derivatives, Sanxian gum, modified clay and fine powder) Chelated cerium oxide), Stickers, gibberellin and processing aids, mineral oils and vegetable oils, spices, waxes and nutrients (including trace nutrients such as iron salts, manganese salts, boron salts, copper salts, cobalt salts, molybdenum Salts and zinc salts), protective colloids, thixotropic substances, penetrants, chelating agents and complex forming agents.
助劑之選擇與式(I)化合物之預期應用模式及/或其物理特性有關。此外,助劑可經選擇以向組合物或自其製備之使用形式賦予特定特性(工業、物理及/或生物特性)。助劑之選擇可允許針對特定需求定製組合物。The choice of adjuvant is related to the intended mode of application of the compound of formula (I) and/or its physical properties. In addition, the adjuvants can be selected to impart specific characteristics (industrial, physical, and/or biological properties) to the composition or the form of use from which it is prepared. The choice of adjuvants allows the composition to be tailored to specific needs.
本發明之組合物可呈任何習用形式,諸如溶液(例如水溶液)、乳液、可濕潤粉末、水基及油基懸浮液、粉末、粉塵、糊狀物、可溶性粉末、可溶性顆粒、用於散佈之顆粒、懸乳劑濃縮物、用本發明化合物浸漬之天然或合成產物、肥料以及於聚合物質中之微膠囊。本發明化合物可以懸浮、乳化或溶解形式存在。The composition of the present invention may be in any conventional form such as a solution (for example, an aqueous solution), an emulsion, a wettable powder, a water-based and oil-based suspension, a powder, a dust, a paste, a soluble powder, a soluble granule, and a dispersion. Granules, suspoemulsion concentrates, natural or synthetic products impregnated with the compounds of the invention, fertilizers, and microcapsules in polymeric materials. The compounds of the invention may exist in suspended, emulsified or dissolved form.
可將本發明組合物作為即用調配物提供至終端使用者,亦即組合物可藉由適合的裝置(諸如噴灑或撒粉裝置)直接施加至植物或種子。或者,可將呈濃縮物形式之組合物提供至終端使用者,其在使用之前必須經稀釋,較佳用水稀釋。The compositions of the present invention can be provided as ready-to-use formulations to end users, i.e., the compositions can be applied directly to plants or seeds by suitable means such as spraying or dusting means. Alternatively, the composition in the form of a concentrate can be provided to the end user, which must be diluted prior to use, preferably diluted with water.
本發明組合物可以習知方式製備,例如藉由混合本發明化合物與一或多種適合的助劑,諸如上文所揭示的助劑。The compositions of the present invention can be prepared in a conventional manner, for example by mixing a compound of the invention with one or more suitable auxiliaries, such as the adjuvants disclosed above.
根據本發明之組合物一般含有0.01至99重量%、0.05至98重量%,較佳0.1至95重量%,更佳0.5至90重量%,最佳1至80重量%之本發明化合物。The compositions according to the invention generally comprise from 0.01 to 99% by weight, from 0.05 to 98% by weight, preferably from 0.1 to 95% by weight, more preferably from 0.5 to 90% by weight, most preferably from 1 to 80% by weight of the compound of the invention.
本發明之化合物及組合物可與如殺真菌劑、殺菌劑、殺蟎劑、殺線蟲劑、殺蟲劑、除草劑、肥料、生長調節劑、安全劑或訊息化合物之其他活性成分混合。此可使活性範圍變寬或防止出現耐藥性。已知殺真菌劑、殺蟲劑、殺蟎劑、殺線蟲劑及殺菌劑之實例揭示於Pesticide Manual,第17版中。The compounds and compositions of the present invention can be combined with other active ingredients such as fungicides, bactericides, acaricides, nematicides, insecticides, herbicides, fertilizers, growth regulators, safeners or message compounds. This can broaden the range of activity or prevent drug resistance. Examples of known fungicides, insecticides, acaricides, nematicides and bactericides are disclosed in the Pesticide Manual, 17th Edition.
可與本發明之化合物及組合物混合之尤其較佳殺真菌劑之實例係:
1)麥角固醇生物合成之抑制劑,例如(1.001)環克座(cyproconazole)、(1.002)待克利(difenoconazole)、(1.003)依普座(epoxiconazole)、(1.004)環醯菌胺(fenhexamid)、(1.005)苯鏽啶(fenpropidin)、(1.006)芬普福(fenpropimorph)、(1.007)胺苯吡菌酮(fenpyrazamine)、(1.008)氟喹唑(fluquinconazole)、(1.009)護汰芬(flutriafol)、(1.010)依滅列(imazalil)、(1.011)依滅列硫酸鹽(imazalil sulfate)、(1.012)種菌唑(ipconazole)、(1.013)滅特座(metconazole)、(1.014)邁克尼(myclobutanil)、(1.015)巴克素(paclobutrazol)、(1.016)撲克拉(prochloraz)、(1.017)普克利(propiconazole)、(1.018)丙硫菌唑(prothioconazole)、(1.019)啶菌噁唑(Pyrisoxazole)、(1.020)螺環菌胺(spiroxamine)、(1.021)得克利(tebuconazole)、(1.022)四克利(tetraconazole)、(1.023)三泰隆(triadimenol)、(1.024)三得芬(tridemorph)、(1.025)滅菌唑(triticonazole)、(1.026) (1R,2S,5S)-5-(4-氯苯甲基)-2-(氯甲基)-2-甲基-1-(1H-1,2,4-三唑-1-基甲基)環戊醇、(1.027) (1S,2R,5R)-5-(4-氯苯甲基)-2-(氯甲基)-2-甲基-1-(1H-1,2,4-三唑-1-基甲基)環戊醇、(1.028) (2R)-2-(1-氯環丙基)-4-[(1R)-2,2-二氯環丙基]-1-(1H-1,2,4-三唑-1-基)丁-2-醇、(1.029) (2R)-2-(1-氯環丙基)-4-[(1S)-2,2-二氯環丙基]-1-(1H-1,2,4-三唑-1-基)丁-2-醇、(1.030) (2R)-2-[4-(4-氯苯氧基)-2-(三氟甲基)苯基]-1-(1H-1,2,4-三唑-1-基)丙-2-醇、(1.031) (2S)-2-(1-氯環丙基)-4-[(1R)-2,2-二氯環丙基]-1-(1H-1,2,4-三唑-1-基)丁-2-醇、(1.032) (2S)-2-(1-氯環丙基)-4-[(1S)-2,2-二氯環丙基]-1-(1H-1,2,4-三唑-1-基)丁-2-醇、(1.033) (2S)-2-[4-(4-氯苯氧基)-2-(三氟甲基)苯基]-1-(1H-1,2,4-三唑-1-基)丙-2-醇、(1.034) (R)-[3-(4-氯-2-氟苯基)-5-(2,4-二氟苯基)-1,2-噁唑-4-基](吡啶-3-基)甲醇、(1.035) (S)-[3-(4-氯-2-氟苯基)-5-(2,4-二氟苯基)-1,2-噁唑-4-基](吡啶-3-基)甲醇、(1.036) [3-(4-氯-2-氟苯基)-5-(2,4-二氟苯基)-1,2-噁唑-4-基](吡啶-3-基)甲醇、(1.037) 1-({(2R,4S)-2-[2-氯-4-(4-氯苯氧基)苯基]-4-甲基-1,3-二氧雜環戊烷-2-基}甲基)-1H-1,2,4-三唑、(1.038) 1-({(2S,4S)-2-[2-氯-4-(4-氯苯氧基)苯基]-4-甲基-1,3-二氧雜環戊烷-2-基}甲基)-1H-1,2,4-三唑、(1.039) 硫氰酸1-{[3-(2-氯苯基)-2-(2,4-二氟苯基)環氧乙烷-2-基]甲基}-1H-1,2,4-三唑-5-酯、(1.040) 硫氰酸1-{[rel(2R,3R)-3-(2-氯苯基)-2-(2,4-二氟苯基)環氧乙烷-2-基]甲基}-1H-1,2,4-三唑-5-酯、(1.041) 硫氰酸1-{[rel(2R,3S)-3-(2-氯苯基)-2-(2,4-二氟苯基)環氧乙烷-2-基]甲基}-1H-1,2,4-三唑-5-酯、(1.042) 2-[(2R,4R,5R)-1-(2,4-二氯苯基)-5-羥基-2,6,6-三甲基庚-4-基]-2,4-二氫-3H-1,2,4-三唑-3-硫酮、(1.043) 2-[(2R,4R,5S)-1-(2,4-二氯苯基)-5-羥基-2,6,6-三甲基庚-4-基]-2,4-二氫-3H-1,2,4-三唑-3-硫酮、(1.044) 2-[(2R,4S,5R)-1-(2,4-二氯苯基)-5-羥基-2,6,6-三甲基庚-4-基]-2,4-二氫-3H-1,2,4-三唑-3-硫酮、(1.045) 2-[(2R,4S,5S)-1-(2,4-二氯苯基)-5-羥基-2,6,6-三甲基庚-4-基]-2,4-二氫-3H-1,2,4-三唑-3-硫酮、(1.046) 2-[(2S,4R,5R)-1-(2,4-二氯苯基)-5-羥基-2,6,6-三甲基庚-4-基]-2,4-二氫-3H-1,2,4-三唑-3-硫酮、(1.047) 2-[(2S,4R,5S)-1-(2,4-二氯苯基)-5-羥基-2,6,6-三甲基庚-4-基]-2,4-二氫-3H-1,2,4-三唑-3-硫酮、(1.048) 2-[(2S,4S,5R)-1-(2,4-二氯苯基)-5-羥基-2,6,6-三甲基庚-4-基]-2,4-二氫-3H-1,2,4-三唑-3-硫酮、(1.049) 2-[(2S,4S,5S)-1-(2,4-二氯苯基)-5-羥基-2,6,6-三甲基庚-4-基]-2,4-二氫-3H-1,2,4-三唑-3-硫酮、(1.050) 2-[1-(2,4-二氯苯基)-5-羥基-2,6,6-三甲基庚-4-基]-2,4-二氫-3H-1,2,4-三唑-3-硫酮、(1.051) 2-[2-氯-4-(2,4-二氯苯氧基)苯基]-1-(1H-1,2,4-三唑-1-基)丙-2-醇、(1.052) 2-[2-氯-4-(4-氯苯氧基)苯基]-1-(1H-1,2,4-三唑-1-基)丁-2-醇、(1.053) 2-[4-(4-氯苯氧基)-2-(三氟甲基)苯基]-1-(1H-1,2,4-三唑-1-基)丁-2-醇、(1.054) 2-[4-(4-氯苯氧基)-2-(三氟甲基)苯基]-1-(1H-1,2,4-三唑-1-基)戊-2-醇、(1.055) 2-[4-(4-氯苯氧基)-2-(三氟甲基)苯基]-1-(1H-1,2,4-三唑-1-基)丙-2-醇、(1.056) 2-{[3-(2-氯苯基)-2-(2,4-二氟苯基)環氧乙烷-2-基]甲基}-2,4-二氫-3H-1,2,4-三唑-3-硫酮、(1.057) 2-{[rel(2R,3R)-3-(2-氯苯基)-2-(2,4-二氟苯基)環氧乙烷-2-基]甲基}-2,4-二氫-3H-1,2,4-三唑-3-硫酮、(1.058) 2-{[rel(2R,3S)-3-(2-氯苯基)-2-(2,4-二氟苯基)環氧乙烷-2-基]甲基}-2,4-二氫-3H-1,2,4-三唑-3-硫酮、(1.059) 5-(4-氯苯甲基)-2-(氯甲基)-2-甲基-1-(1H-1,2,4-三唑-1-基甲基)環戊醇、(1.060) 5-(烯丙基磺醯基)-1-{[3-(2-氯苯基)-2-(2,4-二氟苯基)環氧乙烷-2-基]甲基}-1H-1,2,4-三唑、(1.061) 5-(烯丙基磺醯基)-1-{[rel(2R,3R)-3-(2-氯苯基)-2-(2,4-二氟苯基)環氧乙烷-2-基]甲基}-1H-1,2,4-三唑、(1.062) 5-(烯丙基磺醯基)-1-{[rel(2R,3S)-3-(2-氯苯基)-2-(2,4-二氟苯基)環氧乙烷-2-基]甲基}-1H-1,2,4-三唑、(1.063) N'-(2,5-二甲基-4-{[3-(1,1,2,2-四氟乙氧基)苯基]磺醯基}苯基)-N-乙基-N-甲基亞胺基甲醯胺、(1.064) N'-(2,5-二甲基-4-{[3-(2,2,2-三氟乙氧基)苯基]磺醯基}苯基)-N-乙基-N-甲基亞胺基甲醯胺、(1.065) N'-(2,5-二甲基-4-{[3-(2,2,3,3-四氟丙氧基)苯基]磺醯基}苯基)-N-乙基-N-甲基亞胺基甲醯胺、(1.066) N'-(2,5-二甲基-4-{[3-(五氟乙氧基)苯基]磺醯基}苯基)-N-乙基-N-甲基亞胺基甲醯胺、(1.067) N'-(2,5-二甲基-4-{3-[(1,1,2,2-四氟乙基)硫基]苯氧基}苯基)-N-乙基-N-甲基亞胺基甲醯胺、(1.068) N'-(2,5-二甲基-4-{3-[((2,2,2-三氟乙基)硫基]苯氧基}苯基)-N-乙基-N-甲基亞胺基甲醯胺、(1.069) N'-(2,5-二甲基-4-{3-[(2,2,3,3-四氟丙基)硫基]苯氧基}苯基)-N-乙基-N-甲基亞胺基甲醯胺、(1.070) N'-(2,5-二甲基-4-{3-[(五氟乙基)硫基]苯氧基}苯基)-N-乙基-N-甲基亞胺基甲醯胺、(1.071) N'-(2,5-二甲基-4-苯氧基苯基)-N-乙基-N-甲基亞胺基甲醯胺、(1.072) N'-(4-{[3-(二氟甲氧基)苯基]磺醯基}-2,5-二甲基苯基)-N-乙基-N-甲基亞胺基甲醯胺、(1.073) N'-(4-{3-[(二氟甲基)硫基]苯氧基}-2,5-二甲基苯基)-N-乙基-N-甲基亞胺基甲醯胺、(1.074) N'-[5-溴-6-(2,3-二氫-1H-茚-2-基氧基)-2-甲基吡啶-3-基]-N-乙基-N-甲基亞胺基甲醯胺、(1.075) N'-{4-[(4,5-二氯-1,3-噻唑-2-基)氧基]-2,5-二甲基苯基}-N-乙基-N-甲基亞胺基甲醯胺、(1.076) N'-{5-溴-6-[(1R)-1-(3,5-二氟苯基)乙氧基]-2-甲基吡啶-3-基}-N-乙基-N-甲基亞胺基甲醯胺、(1.077) N'-{5-溴-6-[(1S)-1-(3,5-二氟苯基)乙氧基]-2-甲基吡啶-3-基}-N-乙基-N-甲基亞胺基甲醯胺、(1.078) N'-{5-溴-6-[(順式-4-異丙基環己基)氧基]-2-甲基吡啶-3-基}-N-乙基-N-甲基亞胺基甲醯胺、(1.079) N'-{5-溴-6-[(反式-4-異丙基環己基)氧基]-2-甲基吡啶-3-基}-N-乙基-N-甲基亞胺基甲醯胺、(1.080) N'-{5-溴-6-[1-(3,5-二氟苯基)乙氧基]-2-甲基吡啶-3-基}-N-乙基-N-甲基亞胺基甲醯胺、(1.081)甲分三康唑、(1.082)伊分三康唑。
2)錯合物I或II處之呼吸鏈之抑制劑,例如(2.001)苯丙烯氟菌唑(benzovindiflupyr)、(2.002)必殺吩(bixafen)、(2.003)白可列(boscalid)、(2.004)萎鏽靈(carboxin)、(2.005)氟吡菌醯胺(fluopyram)、(2.006)福多寧(flutolanil)、(2.007)氟唑菌醯胺(fluxapyroxad)、(2.008)福拉比(furametpyr)、(2.009)艾索非他米(Isofetamid)、(2.010)吡唑萘菌胺(isopyrazam)(抗差向異構對映異構體1R,4S,9S)、(2.011)吡唑萘菌胺(抗差向異構對映異構體1S,4R,9R)、(2.012)吡唑萘菌胺(抗差向異構外消旋體1RS,4SR,9SR)、(2.013)吡唑萘菌胺(同側差向異構外消旋體1RS,4SR,9RS及抗差向異構外消旋體1RS,4SR,9SR之混合物)、(2.014)吡唑萘菌胺(同側差向異構對映異構體1R,4S,9R)、(2.015)吡唑萘菌胺(同側差向異構對映異構體1S,4R,9S)、(2.016)吡唑萘菌胺(同側差向異構外消旋體1RS,4SR,9RS)、(2.017)噴福芬(penflufen)、(2.018)吡噻菌胺(penthiopyrad)、(2.019)吡二氟甲多芬(pydiflumetofen)、(2.020)吡瑞氟密得(Pyraziflumid)、(2.021)氟唑環菌胺(sedaxane)、(2.022) 1,3-二甲基-N-(1,1,3-三甲基-2,3-二氫-1H-茚-4-基)-1H-吡唑-4-甲醯胺、(2.023) 1,3-二甲基-N-[(3R)-1,1,3-三甲基-2,3-二氫-1H-茚-4-基]-1H-吡唑-4-甲醯胺、(2.024) 1,3-二甲基-N-[(3S)-1,1,3-三甲基-2,3-二氫-1H-茚-4-基]-1H-吡唑-4-甲醯胺、(2.025) 1-甲基-3-(三氟甲基)-N-[2'-(三氟甲基)聯苯-2-基]-1H-吡唑-4-甲醯胺、(2.026) 2-氟-6-(三氟甲基)-N-(1,1,3-三甲基-2,3-二氫-1H-茚-4-基))苯甲醯胺、(2.027) 3-(二氟甲基)-1-甲基-N-(1,1,3-三甲基-2,3-二氫-1H-茚-4-基)-1H-吡唑-4-甲醯胺、(2.028) 3-(二氟甲基)-1-甲基-N-[(3R)-1,1,3-三甲基-2,3-二氫-1H-茚-4-基]-1H-吡唑-4-甲醯胺、(2.029) 3-(二氟甲基)-1-甲基-N-[(3S)-1,1,3-三甲基-2,3-二氫-1H-茚-4-基]-1H-吡唑-4-甲醯胺、(2.030) 3-(二氟甲基)-N-(7-氟-1,1,3-三甲基-2,3-二氫-1H-茚-4-基)-1-甲基-1H-吡唑-4-甲醯胺、(2.031) 3-(二氟甲基)-N-[(3R)-7-氟-1,1,3-三甲基-2,3-二氫-1H-茚-4-基]-1-甲基-1H-吡唑-4-甲醯胺、 (2.032) 3-(二氟甲基)-N-[(3S)-7-氟-1,1,3-三甲基-2,3-二氫-1H-茚-4-基]-1-甲基-1H-吡唑-4-甲醯胺、(2.033) 5,8-二氟-N-[2-(2-氟-4-{[4-(三氟甲基)吡啶-2-基])乙基]喹唑啉-4-胺、(2.034) N-(2-環戊基-5-氟苯甲基)-N-環丙基-3-(二氟甲基)-5-氟-1-甲基-1H-吡唑-4-甲醯胺、 (2.035) N-(2-第三丁基-5-甲基苯甲基)-N-環丙基-3-(二氟甲基)-5-氟-1-甲基-1H-吡唑-4-甲醯胺、(2.036) N-(2-第三丁基苯甲基)-N-環丙基-3-(二氟甲基)-5-氟-1-甲基-1H-吡唑-4-甲醯胺、(2.037) N-(5-氯-2-乙基苯甲基)-N-環丙基-3-(二氟甲基)-5-氟-1-甲基-1H-吡唑-4-甲醯胺、(2.038) N-(5-氯-2-異丙苯甲基)-N-環丙基-3-(二氟甲基)-5-氟-1-甲基-1H-吡唑-4-甲醯胺、(2.039) N-[(1R,4S)-9-(二氯亞甲基)-1,2,3,4-四氫-1,4-甲橋萘-5-基]-3-(二氟甲基)-1-甲基-1H-吡唑-4-甲醯胺、(2.040) N-[(1S,4R)-9-(二氯亞甲基)-1,2,3,4-四氫-1,4-甲橋萘-5-基]-3-(二氟甲基)-1-甲基-1H-吡唑-4-甲醯胺、(2.041) N-[1-(2,4-二氯苯基)-1-甲氧基丙-2-基]-3-(二氟甲基)-1-甲基-1H-吡唑-4-甲醯胺、(2.042) N-[2-氯-6-(三氟甲基)苯甲基]-N-環丙基-3-(二氟甲基)-5-氟-1-甲基-1H-吡唑-4-甲醯胺、(2.043) N-[3-氯-2-氟-6-(三氟甲基)苯甲基]-N-環丙基-3-(二氟甲基)-5-氟-1-甲基-1H-吡唑-4-甲醯胺、(2.044) N-[5-氯-2-(三氟甲基)苯甲基]-N-環丙基-3-(二氟甲基)-5-氟-1-甲基-1H-吡唑-4-甲醯胺、(2.045) N-環丙基-3-(二氟甲基)-5-氟-1-甲基-N-[5-甲基-2-(三氟甲基)苯甲基]-1H-吡唑-4-甲醯胺、(2.046) N-環丙基-3-(二氟甲基)-5-氟-N-(2-氟-6-異丙基苯甲基)-1-甲基-1H-吡唑-4-甲醯胺、(2.047) N-環丙基-3-(二氟甲基)-5-氟-N-(2-異丙基-5-甲基苯甲基)-1-甲基-1H-吡唑-4-甲醯胺、(2.048) N-環丙基-3-(二氟甲基)-5-氟-N-(2-異丙苯甲基)-1-甲基-1H-吡唑-4-硫代碳醯胺、(2.049) N-環丙基-3-(二氟甲基)-5-氟-N-(2-異丙基苯甲基)-1-甲基-1H-吡唑-4-甲醯胺、(2.050) N-環丙基-3-(二氟甲基)-5-氟-N-(5-氟-2-異丙基苯甲基)-1-甲基-1H-吡唑-4-甲醯胺、(2.051) N-環丙基-3-(二氟甲基)-N-(2-乙基-4,5-二甲基苯甲基)-5-氟-1-甲基-1H-吡唑-4-甲醯胺、(2.052) N-環丙基-3-(二氟甲基)-N-(2-乙基-5-氟苯甲基)-5-氟-1-甲基-1H-吡唑-4-甲醯胺、(2.053) N-環丙基-3-(二氟甲基)-N-(2-乙基-5-甲基苯甲基)-5-氟-1-甲基-1H-吡唑-4-甲醯胺、(2.054) N-環丙基-N-(2-環丙基-5-氟苯甲基)-3-(二氟甲基)-5-氟-1-甲基-1H-吡唑-4-甲醯胺、(2.055) N-環丙基-N-(2-環丙基-5-甲基苯甲基)-3-(二氟甲基)-5-氟-1-甲基-1H-吡唑-4-甲醯胺、(2.056) N-環丙基-N-(2-環丙基苯甲基)-3-(二氟甲基)-5-氟-1-甲基-1H-吡唑-4-甲醯胺。
3)錯合物III處之呼吸鏈之抑制劑,例如(3.001)辛唑嘧菌胺(ametoctradin)、(3.002)吲唑磺菌胺(amisulbrom)、(3.003)亞托敏(azoxystrobin)、(3.004)甲香菌酯(coumethoxystrobin)、(3.005)丁香菌酯(coumoxystrobin)、(3.006)賽座滅(cyazofamid)、(3.007)地莫菌胺(dimoxystrobin)、(3.008)亞烷基嘧菌酯(enoxastrobin)、(3.009)凡殺同(famoxadone)、(3.010)咪唑菌酮(fenamidone)、(3.011)氟菌蟎酯(flufenoxystrobin)、(3.012)氟嘧菌酯(fluoxastrobin)、(3.013)克收欣(kresoxim-methyl)、(3.014)苯氧菌胺(metominostrobin)、(3.015)肟醚菌胺(orysastrobin)、(3.016)啶氧菌酯(picoxystrobin)、(3.017)百克敏(pyraclostrobin)、(3.018)唑胺菌酯(pyrametostrobin)、(3.019)唑菌酯(pyraoxystrobin)、(3.020)三氟敏(trifloxystrobin)、(3.021) (2E)-2-{2-[({[(1E)-1-(3-{[(E)-1-氟-2-苯基乙烯基]氧基}苯基)亞乙基]胺基}氧基)甲基]苯基}-2-(甲氧亞胺基)-N-甲基乙醯胺、(3.022) (2E,3Z)-5-{[1-(4-氯苯基)-1H-吡唑-3-基]氧基}-2-(甲氧亞胺基)-N,3-二甲基戊-3-烯醯胺、(3.023) (2R)-2-{2-[(2,5-二甲基苯氧基)甲基]苯基}-2-甲氧基-N-甲基乙醯胺、(3.024) (2S)-2-{2-[(2,5-二甲基苯氧基)甲基]苯基}-2-甲氧基-N-甲基乙醯胺、(3.025) (3S,6S,7R,8R)-8-苯甲基-3-[({3-[(異丁醯氧基)甲氧基]-4-甲氧基吡啶-2-基}羰基)胺基]-6-甲基-4,9-二側氧基-1,5-二氧雜環壬-7-基2-甲基丙酸酯、(3.026) 2-{2-[(2,5-二甲基苯氧基)甲基]苯基}}-2-甲氧基-N-甲基乙醯胺、(3.027) N-(3-乙基-3,5,5-三甲基環己基)-3-甲醯胺基-2-羥苯甲醯胺、(3.028) (2E,3Z)-5-{[1-(4-氯-2-氟苯基)-1H-吡唑-3-基]氧基}-2-(甲氧亞胺基)-N,3-二甲基戊-3-烯醯胺、(3.029){5-[3-(2,4-二甲基苯基)-1H-吡唑-1-基]-2-甲基苯甲基}胺基甲酸甲酯。
4)有絲分裂及細胞分裂之抑制劑例如(4.001)貝芬替(carbendazim)、(4.002)乙黴威(diethofencarb)、(4.003)噻唑菌胺(ethaboxam)、(4.004) 氟吡菌胺、(4.005)賓克隆(pencycuron)、(4.006)腐絕、(4.007)甲基托布津(thiophanate-methyl)、(4.008)座賽胺(zoxamide)、(4.009) 3-氯-4-(2,6-二氟苯基)-6-甲基-5-苯基噠嗪、(4.010) 3-氯-5-(4-氯苯基)-4-(2,6-二氟苯基)-6-甲基噠嗪、(4.011) 3-氯-5-(6-氯吡啶-3-基)-6-甲基-4-(2,4,6-三氟苯基)噠嗪、(4.012) 4-(2-溴-4-氟苯基)-N-(2,6-二氟苯基)-1,3-二甲基-1H-吡唑-5-胺、(4.013) 4-(2-溴-4-氟苯基)-N-(2-溴-6-氟苯基)-1,3-二甲基-1H-吡唑-5-胺, (4.014) 4-(2-溴-4-氟苯基)-N-(2-溴苯基)-1,3-二甲基-1H-吡唑-5-胺、(4.015) 4-(2-溴-4-氟苯基)-N-(2-氯-6-氟苯基)-1,3-二甲基-1H-吡唑-5-胺、(4.016) 4-(2-溴-4-氟苯基)-N-(2-氯苯基)-1,3-二甲基-1H-吡唑-5-胺、(4.017) 4-(2-溴-4-氟苯基)-N-(2-氟苯基)-1,3-二甲基-1H-吡唑-5-胺、(4.018) 4-(2-氯-4-氟苯基)-N-(2,6-二氟苯基)-1,3-二甲基-1H-吡唑-5-胺、(4.019) 4-(2-氯-4-氟苯基)-N-(2-氯-6-氟苯基)-1,3-二甲基-1H-吡唑-5-胺、(4.020) 4-(2-氯-4-氟苯基)-N-(2-氯苯基)-1,3-二甲基-1H-吡唑-5-胺、(4.021) 4-(2-氯-4-氟苯基)-N-(2-氟苯基)-1,3-二甲基-1H-吡唑-5-胺、(4.022) 4-(4-氯苯基)-5-(2,6-二氟苯基)-3,6-二甲基噠嗪、(4.023) N-(2-溴-6-氟苯基)-4-(2-氯-4-氟苯基))-1,3-二甲基-1H-吡唑-5-胺、(4.024) N-(2-溴苯基)-4-(2-氯-4-氟苯基)-1,3-二甲基-1H-吡唑-5-胺、(4.025) N-(4-氯-2,6-二氟苯基)-4-(2-氯-4-氟苯基))-1,3-二甲基-1H-吡唑-5-胺。
5)能夠具有多位點作用之化合物,例如(5.001)紫紅混合物、(5.002)四氯丹、(5.003)蓋普丹(captan)、(5.004)四氯異苯腈、(5.005)氫氧化銅、(5.006)環烷酸銅、(5.007)銅氧化物、(5.008)鹼性氯氧化銅、(5.009)硫酸銅(2+)、(5.010)腈硫醌、(5.011)多寧(dodine)、(5.012)福爾培(folpet)、(5.013)鋅錳乃浦(mancozeb)、(5.014)錳乃浦(maneb)、(5.015)免得爛(metiram)、(5.016)免得爛鋅、(5.017)咢辛-銅(oxine-copper)、(5.018)甲基鋅乃浦、(5.019)包括鈣聚硫化物之硫及硫製劑、(5.020)得恩地(thiram)、(5.021)鋅乃浦(zineb)、(5.022)益穗(ziram)、(5.023)6-乙基-5,7-二側氧基-6,7-二氫-5H-吡咯并[3',4':5,6][1,4]二噻𠯤并[2,3-c][1,2]噻唑-3-甲腈。
6)能夠引發宿主防護之化合物,例如(6.001)活化酯-S-甲基、(6.002)異噻菌胺(isotianil)、(6.003)撲殺熱(probenazole)、(6.004)汰敵寧(tiadinil)。
7)胺基酸及/或蛋白質生物合成之抑制劑,例如(7.001)嘧菌環胺(cyprodinil)、(7.002)春日黴素(kasugamycin)、(7.003)水合春日黴素鹽酸鹽、(7.004)土黴素(oxytetracycline)、(7.005)嘧黴胺(pyrimethanil)、(7.006) 3-(5-氟-3,3,4,4-四甲基-3,4-二氫異喹啉-1-基)喹啉。
8)ATP產生之抑制劑,例如(8.001)矽硫芬(silthiofam)。
9)細胞壁合成之抑制劑,例如(9.001)苯噻菌胺(benthiavalicarb)、(9.002)達滅芬(dimethomorph)、(9.003)氟嗎啉(flumorph)、(9.004)纈黴威(iprovalicarb)、(9.005)雙炔醯菌胺(mandipropamid)、(9.006)丁吡嗎啉(pyrimorph)、(9.007)威利芬那雷特(valifenalate)、(9.008)(2E)-3-(4-第三丁基苯基)-3-(2-氯吡啶-4-基)-1-(嗎啉-4-基)丙-2-烯-1-酮、(9.009)(2Z)-3-(4-第三丁基苯基)-3-(2-氯吡啶-4-基)-1-(嗎啉-4-基)丙-2-烯-1-酮。
10)脂質及膜合成之抑制劑,例如(10.001)霜黴威(propamocarb)、(10.002)霜黴威鹽酸鹽、(10.003)甲基脫克松(tolclofos-methyl)。
11)黑色素生物合成之抑制劑,例如(11.001)三賽唑(tricyclazole)、(11.002) {3-甲基-1-[(4-甲基苯甲醯基)胺基]丁-2-基}胺基甲酸2,2,2-三氟乙酯。
12)核酸合成之抑制劑,例如(12.001)本達樂(benalaxyl)、(12.002)本達樂-M (精苯霜靈(kiralaxyl))、(12.003)滅達樂(metalaxyl)、(12.004)滅達樂-M (右滅達樂(mefenoxam))。
13)信號轉導之抑制劑,例如(13.001)護汰寧(fludioxonil)、(13.002)依普同(iprodione)、(13.003)撲滅寧(procymidone)、(13.004)丙氧喹啉(proquinazid)、(13.005)快諾芬(quinoxyfen)、(13.006)免克寧(vinclozolin)。
14)能夠充當解偶聯劑之化合物,例如(14.001)扶吉胺(fluazinam)、(14.002)敵蟎普(meptyldinocap)。
15)其他化合物,例如(15.001)脫落酸(Abscisic acid)、(15.002)苯噻硫氰(benthiazole)、(15.003)吡托沙嗪(bethoxazin)、(15.004)卡巴西黴素(capsimycin)、(15.005)香芹酮(carvone)、(15.006)蟎離丹(chinomethionat)、(15.007)硫雜靈(cufraneb)、(15.008)環氟菌胺(cyflufenamid)、(15.009)克絕(cymoxanil)、(15.010)環丙磺醯胺(cyprosulfamide)、(15.011)氟替尼(flutianil)、(15.012)福賽得鋁(fosetyl-aluminium)、(15.013)福賽得鈣(fosetyl-calcium)、(15.014)福賽得鈉(fosetyl-sodium)、(15.015)異硫氰酸甲酯、(15.016)滅芬農(metrafenone)、(15.017)米多黴素(mildiomycin)、(15.018)遊黴素(natamycin)、(15.019)二甲基二硫代胺基甲酸鎳(nickel dimethyldithiocarbamate)、(15.020)滅鏽胺-異丙基(nitrothal-isopropyl)、(15.021)奧克斯莫卡賓(oxamocarb)、(15.022)奧賽普林(Oxathiapiprolin)、(15.023)奧克斯芬塞林(oxyfenthiin)、(15.024)五氯苯酚及鹽、(15.025)亞磷酸及其鹽、(15.026霜黴威-乙膦酸鹽(propamocarb-fosetylate)、(15.027)甲氧苯唳菌(pyriofenone) (氯芬酮(chlazafenone))、(15.028)特普弗洛奎(tebufloquin)、(15.029)克枯爛(tecloftalam)、(15.030)甲磺菌胺(tolnifanide)、(15.031) 1-(4-{4-[(5R)-5-(2,6-二氟苯基)-4,5-二氫-1,2-噁唑-3-基]-1,3-噻唑-2-基}哌啶-1-基)-2-[5-甲基-3-(三氟甲基)-1H-吡唑-1-基]乙酮、(15.032) 1-(4-{4-[(5S)-5-(2,6-二氟苯基)-4,5-二氫-1,2-噁唑-3-基]-1,3-噻唑-2-基}哌啶-1-基)-2-[5-甲基-3-(三氟甲基)-1H-吡唑-1-基]乙酮、(15.033) 2-(6-苯甲基吡啶-2-基)喹唑啉、(15.034) 2,6-二甲基-1H,5H-[1,4]二噻𠯤并[2,3-c:5,6-c']二吡咯-1,3,5,7(2H,6H)-四酮、(15.035) 2-[3,5-雙(二氟甲基)-1H-吡唑-1-基]-1-[4-(4-{5-[2-(丙-2-炔-1-基氧基)苯基]-4,5-二氫-1,2-噁唑-3-基}-1,3-噻唑-2-基)哌啶-1-基]乙酮、(15.036) 2-[3,5-雙(二氟甲基)-1H-吡唑-1-基]-1-[4-(4-{5-[2-氯-6-(丙-2-炔-1-基氧基)苯基]-4,5-二氫-1,2-噁唑-3-基}-1,3-噻唑-2-基)哌啶-1-基]乙酮、(15.037) 2-[3,5-雙(二氟甲基)-1H-吡唑-1-基]-1-[4-(4-{5-[2-氟-6-(丙-2-炔-1-基氧基)苯基]-4,5-二氫-1,2-噁唑-3-基}-1,3-噻唑-2-基)哌啶-1-基]乙酮、(15.038) 2-[6-(3-氟-4-甲氧基苯基)-5-甲基吡啶-2-基]喹唑啉、(15.039) 2-{(5R)-3-[2-(1-{[3,5-雙(二氟甲基)-1H-吡唑-1-基]乙醯基}哌啶-4-基)-1,3-噻唑-4-基]-4,5-二氫-1,2-噁唑-5-基}-3-氯苯基甲烷磺酸酯、(15.040) 2-{(5S)-3-[2-(1-{[3,5-雙(二氟甲基)-1H-吡唑-1-基]乙醯基}哌啶-4-基)-1,3-噻唑-4-基]-4,5-二氫-1,2-噁唑-5-基}-3-氯苯基甲烷磺酸酯、(15.041) 2-{2-[(7,8-二氟-2-甲基喹啉-3-基)氧基]-6-氟苯基}丙-2-醇、(15.042) 2-{2-氟-6-[(8-氟-2-甲基喹啉-3-基)氧基]苯基}丙-2-醇、(15.043) 2-{3-[2-(1-{[3,5-雙(二氟甲基)-1H-吡唑-1-基]乙醯基}哌啶-4-基)-1,3-噻唑-4-基]-4,5-二氫-1,2-噁唑-5-基}-3-氯苯基甲烷磺酸酯、(15.044) 2-{3-[2-(1-{[3,5-雙(二氟甲基)-1H-吡唑-1-基]乙醯基}哌啶-4-基)-1,3-噻唑-4-基]-4,5-二氫-1,2-噁唑-5-基}苯基甲烷磺酸酯、(15.045) 2-苯基苯酚及鹽、(15.046) 3-(4,4,5-三氟-3,3-二甲基-3,4-二氫異喹啉-1-基)喹啉、(15.047) 3-(4,4-二氟-3,3-二甲基-3,4-二氫異喹啉-1-基)喹啉、(15.048) 4-胺基-5-氟嘧啶-2-醇(互變異構形式:4-胺基-5-氟嘧啶-2(1H)-酮)、(15.049) 4-側氧基-4-[(2-苯乙基)胺基]丁酸、(15.050) 5-胺基-1,3,4-噻二唑-2-硫醇、(15.051) 5-氯-N'-苯基-N'-(丙-2-炔-1-基)噻吩-2-苯磺醯肼、(15.052) 5-氟-2-[(4-氟苯甲基)氧基]嘧啶-4-胺、(15.053) 5-氟-2-[(4-甲基苯甲基)氧基]嘧啶-4-胺、(15.054) 9-氟-2,2-二甲基-5-(喹啉-3-基)-2,3-二氫-1,4-苯并噁氮呯、(15.055){6-[({[(Z)-(1-甲基-1H-四唑-5-基)(苯基)亞甲基]胺基}氧基甲基]吡啶-2-基}胺基甲酸丁-3-炔-1-酯、(15.056) (2Z)-3-胺基-2-氰基-3-苯基丙烯酸乙酯、(15.057)吩嗪-1-甲酸、(15.058) 3,4,5-三羥基苯甲酸丙酯、(15.059)喹啉-8-醇、(15.060)喹啉-8-醇硫酸酯(2:1)、(15.061) {6-[({[(1-甲基-1H-四唑-5-基)(基)亞甲基]胺基}氧基)甲基]吡啶-2-基}胺基甲酸第三丁酯、(15.062) 5-氟-4-亞胺基-3-甲基-1-[(4-甲基苯基)磺醯基]-3,4-二氫嘧啶-2(1H)-酮。Examples of particularly preferred fungicides which may be admixed with the compounds and compositions of the invention are:
1) Inhibitors of ergosterol biosynthesis, for example (1.001) cyproconazole, (1.002) difenoconazole, (1.003) epoxiconazole, (1.004) cycloheximide ( Fenhexamid), (1.005) fenpropidin, (1.006) fenpropimorph, (1.007) fenpyrazamine, (1.008) fluquinconazole, (1.009) Flutriafol, (1.010) imazalil, (1.011) imazalil sulfate, (1.012) ipconazole, (1.013) metconazole, (1.014) Myclobutanil, (1.015) paclobutrazol, (1.016) prochloraz, (1.017) propiconazole, (1.018) prothioconazole, (1.019) pyridoxine Pyrosoxazole, (1.020) spiroxamine, (1.021) tebuconazole, (1.022) tetraconazole, (1.023) triadimenol, (1.024) darfuren ( Tridemorph), (1.025) triticonazole, (1.026) (1R, 2S, 5S)-5-(4-chlorobenzyl)-2-(chloromethyl)-2-methyl-1-( 1H-1,2,4-triazol-1-ylmethyl)cyclopentyl , (1.027) (1S, 2R, 5R)-5-(4-chlorobenzyl)-2-(chloromethyl)-2-methyl-1-(1H-1,2,4-triazole- 1-ylmethyl)cyclopentanol, (1.028) (2R)-2-(1-chlorocyclopropyl)-4-[(1R)-2,2-dichlorocyclopropyl]-1-(1H -1,2,4-triazol-1-yl)butan-2-ol, (1.029) (2R)-2-(1-chlorocyclopropyl)-4-[(1S)-2,2-di Chlorocyclopropyl]-1-(1H-1,2,4-triazol-1-yl)butan-2-ol, (1.030) (2R)-2-[4-(4-chlorophenoxy) -2-(Trifluoromethyl)phenyl]-1-(1H-1,2,4-triazol-1-yl)propan-2-ol, (1.031) (2S)-2-(1-chloro Cyclopropyl)-4-[(1R)-2,2-dichlorocyclopropyl]-1-(1H-1,2,4-triazol-1-yl)butan-2-ol, (1.032) (2S)-2-(1-chlorocyclopropyl)-4-[(1S)-2,2-dichlorocyclopropyl]-1-(1H-1,2,4-triazol-1-yl ) butan-2-ol, (1.033) (2S)-2-[4-(4-chlorophenoxy)-2-(trifluoromethyl)phenyl]-1-(1H-1,2,4 -triazol-1-yl)propan-2-ol, (1.034) (R)-[3-(4-chloro-2-fluorophenyl)-5-(2,4-difluorophenyl)-1 , 2-oxazol-4-yl](pyridin-3-yl)methanol, (1.035) (S)-[3-(4-chloro-2-fluorophenyl)-5-(2,4-difluoro Phenyl)-1,2-oxazol-4-yl](pyridin-3-yl)methanol, (1.036) [3-(4-chloro-2-fluorophenyl)-5-(2,4-di Fluorophenyl)-1,2-oxazol-4-yl](pyridin-3-yl)methanol, (1.037) 1-({(2R,4S)-2-[ 2-Chloro-4-(4-chlorophenoxy)phenyl]-4-methyl-1,3-dioxolan-2-yl}methyl)-1H-1,2,4- Triazole, (1.038) 1-({(2S,4S)-2-[2-chloro-4-(4-chlorophenoxy)phenyl]-4-methyl-1,3-dioxolane Pentane-2-yl}methyl)-1H-1,2,4-triazole, (1.039) 1-{[3-(2-chlorophenyl)-2-(2,4-di) Fluorophenyl)oxiran-2-yl]methyl}-1H-1,2,4-triazole-5-ester, (1.040) 1-{[rel(2R,3R)-3 thiocyanate -(2-chlorophenyl)-2-(2,4-difluorophenyl)oxiran-2-yl]methyl}-1H-1,2,4-triazole-5-ester, ( 1.041) 1-{[rel(2R,3S)-3-(2-chlorophenyl)-2-(2,4-difluorophenyl)oxiran-2-yl]methyl} thiocyanate -1H-1,2,4-triazole-5-ester, (1.042) 2-[(2R,4R,5R)-1-(2,4-dichlorophenyl)-5-hydroxy-2,6 ,6-trimethylhept-4-yl]-2,4-dihydro-3H-1,2,4-triazole-3-thione, (1.043) 2-[(2R,4R,5S)- 1-(2,4-Dichlorophenyl)-5-hydroxy-2,6,6-trimethylhept-4-yl]-2,4-dihydro-3H-1,2,4-triazole -3-thione, (1.044) 2-[(2R,4S,5R)-1-(2,4-dichlorophenyl)-5-hydroxy-2,6,6-trimethylhept-4- 2,4-dihydro-3H-1,2,4-triazole-3-thione, (1.045) 2-[(2R,4S,5S)-1-(2,4-dichlorobenzene 5-)-5-hydroxy-2,6,6-trimethylhept-4-yl]-2,4-dihydro-3H -1,2,4-triazole-3-thione, (1.046) 2-[(2S,4R,5R)-1-(2,4-dichlorophenyl)-5-hydroxy-2,6, 6-trimethylhept-4-yl]-2,4-dihydro-3H-1,2,4-triazole-3-thione, (1.047) 2-[(2S,4R,5S)-1 -(2,4-dichlorophenyl)-5-hydroxy-2,6,6-trimethylhept-4-yl]-2,4-dihydro-3H-1,2,4-triazole- 3-thione, (1.048) 2-[(2S,4S,5R)-1-(2,4-dichlorophenyl)-5-hydroxy-2,6,6-trimethylheptan-4-yl -2,4-Dihydro-3H-1,2,4-triazole-3-thione, (1.049) 2-[(2S,4S,5S)-1-(2,4-dichlorophenyl) )-5-hydroxy-2,6,6-trimethylhept-4-yl]-2,4-dihydro-3H-1,2,4-triazole-3-thione, (1.050) 2- [1-(2,4-Dichlorophenyl)-5-hydroxy-2,6,6-trimethylhept-4-yl]-2,4-dihydro-3H-1,2,4-tri Oxazole-3-thione, (1.051) 2-[2-chloro-4-(2,4-dichlorophenoxy)phenyl]-1-(1H-1,2,4-triazole-1- Propyl-2-ol, (1.052) 2-[2-chloro-4-(4-chlorophenoxy)phenyl]-1-(1H-1,2,4-triazol-1-yl) Butan-2-ol, (1.053) 2-[4-(4-chlorophenoxy)-2-(trifluoromethyl)phenyl]-1-(1H-1,2,4-triazole-1 -yl)butan-2-ol, (1.054) 2-[4-(4-chlorophenoxy)-2-(trifluoromethyl)phenyl]-1-(1H-1,2,4-tri Zin-1-yl)pentan-2-ol, (1.055) 2-[4-(4-chlorophenoxy)-2-(trifluoromethyl)phenyl]-1-(1H -1,2,4-triazol-1-yl)propan-2-ol, (1.056) 2-{[3-(2-chlorophenyl)-2-(2,4-difluorophenyl) ring Oxyethane-2-yl]methyl}-2,4-dihydro-3H-1,2,4-triazole-3-thione, (1.057) 2-{[rel(2R,3R)-3 -(2-chlorophenyl)-2-(2,4-difluorophenyl)oxiran-2-yl]methyl}-2,4-dihydro-3H-1,2,4-tri Oxazole-3-thione, (1.058) 2-{[rel(2R,3S)-3-(2-chlorophenyl)-2-(2,4-difluorophenyl)oxirane-2- Methyl}-2,4-dihydro-3H-1,2,4-triazole-3-thione, (1.059) 5-(4-chlorobenzyl)-2-(chloromethyl) -2-methyl-1-(1H-1,2,4-triazol-1-ylmethyl)cyclopentanol, (1.060) 5-(allylsulfonyl)-1-{[3- (2-Chlorophenyl)-2-(2,4-difluorophenyl)oxiran-2-yl]methyl}-1H-1,2,4-triazole, (1.061) 5-( Allylsulfonyl)-1-{[rel(2R,3R)-3-(2-chlorophenyl)-2-(2,4-difluorophenyl)oxiran-2-yl] Methyl}-1H-1,2,4-triazole, (1.062) 5-(allylsulfonyl)-1-{[rel(2R,3S)-3-(2-chlorophenyl)- 2-(2,4-difluorophenyl)oxiran-2-yl]methyl}-1H-1,2,4-triazole, (1.063) N'-(2,5-dimethyl 4-{[3-(1,1,2,2-tetrafluoroethoxy)phenyl]sulfonyl}phenyl)-N-ethyl-N-methyliminocarbamidine, 1.064) N'-(2,5-dimethyl -4-{[3-(2,2,2-Trifluoroethoxy)phenyl]sulfonyl}phenyl)-N-ethyl-N-methyliminocarbamidine, (1.065) N'-(2,5-Dimethyl-4-{[3-(2,2,3,3-tetrafluoropropoxy)phenyl]sulfonyl}phenyl)-N-ethyl-N -methylimidocarbamide, (1.066) N'-(2,5-dimethyl-4-{[3-(pentafluoroethoxy)phenyl]sulfonyl}phenyl)-N -ethyl-N-methyliminocarbamamine, (1.067) N'-(2,5-dimethyl-4-{3-[(1,1,2,2-tetrafluoroethyl) Thio]phenoxy}phenyl)-N-ethyl-N-methyliminocarbamidine, (1.068) N'-(2,5-dimethyl-4-{3-[(( 2,2,2-Trifluoroethyl)thio]phenoxy}phenyl)-N-ethyl-N-methyliminocarbamidine, (1.069) N'-(2,5-di Methyl-4-{3-[(2,2,3,3-tetrafluoropropyl)thio]phenoxy}phenyl)-N-ethyl-N-methyliminocarbamidine, (1.070) N'-(2,5-Dimethyl-4-{3-[(pentafluoroethyl)thio]phenoxy}phenyl)-N-ethyl-N-methylimino Formamide, (1.071) N'-(2,5-dimethyl-4-phenoxyphenyl)-N-ethyl-N-methyliminocarbamidine, (1.072) N'- (4-{[3-(Difluoromethoxy)phenyl]sulfonyl}-2,5-dimethylphenyl)-N-ethyl-N-methyliminocarbamidine, ( 1.073) N'-(4-{3-[( Fluoromethyl)thio]phenoxy}-2,5-dimethylphenyl)-N-ethyl-N-methyliminocarbamidine, (1.074) N'-[5-bromo- 6-(2,3-Dihydro-1H-indol-2-yloxy)-2-methylpyridin-3-yl]-N-ethyl-N-methyliminocarbamidine, (1.075 N'-{4-[(4,5-Dichloro-1,3-thiazol-2-yl)oxy]-2,5-dimethylphenyl}-N-ethyl-N-methyl Iminocarbamide, (1.076) N'-{5-bromo-6-[(1R)-1-(3,5-difluorophenyl)ethoxy]-2-methylpyridine-3- }-N-ethyl-N-methyliminocarbamamine, (1.077) N'-{5-bromo-6-[(1S)-1-(3,5-difluorophenyl) Oxy]-2-methylpyridin-3-yl}-N-ethyl-N-methyliminocarbamidine, (1.078) N'-{5-bromo-6-[(cis-4 -isopropylcyclohexyl)oxy]-2-methylpyridin-3-yl}-N-ethyl-N-methyliminocarbamidine, (1.079) N'-{5-bromo-6 -[(trans-4-isopropylcyclohexyl)oxy]-2-methylpyridin-3-yl}-N-ethyl-N-methyliminocarbamidine, (1.080) N' -{5-Bromo-6-[1-(3,5-difluorophenyl)ethoxy]-2-methylpyridin-3-yl}-N-ethyl-N-methylimidocarba Indoleamine, (1.081) methyl triconazole, (1.082) yttrium triconazole.
2) Inhibitors of the respiratory chain at complex I or II, for example (2.001) benzovindiflupyr, (2.002) bixafen, (2.003) boscalid, (2.004) ) carboxin, (2.005) floopyram, (2.006) flutanil, (2.007) flumapyyroxad, (2.008) foraby (furametpyr ), (2.009) Isofetamid, (2.010) isopyrazam (anti-episomeric enantiomer 1R, 4S, 9S), (2.011) pyrazol Amine (anti-episomeric enantiomer 1S, 4R, 9R), (2.012) pyrazolamide (anti-isomeric racemate 1RS, 4SR, 9SR), (2.013) pyrazol naphthalene Insecticidal (Isotopic epimer race 1RS, 4SR, 9RS and anti-episomeric racemate 1RS, 4SR, 9SR mixture), (2.014) pyrazolamide (isolateral differential) Isomer Enantiomers 1R, 4S, 9R), (2.015) Pyrazolamide (Ipsilateral Epimerization Enantiomers 1S, 4R, 9S), (2.016) Pyrazolidine ( Ipsilateral epimer races 1RS, 4SR, 9RS), (2.017) penflufen, (2.018) penthiopyrad, (2.019) pydiflumetofen (2.020) Pyraziflumid, (2.021) sedaxane, (2.022) 1,3-dimethyl-N-(1,1,3-trimethyl-2, 3-Dihydro-1H-indol-4-yl)-1H-pyrazole-4-carboxamide, (2.023) 1,3-dimethyl-N-[(3R)-1,1,3-three Methyl-2,3-dihydro-1H-indol-4-yl]-1H-pyrazole-4-carboxamide, (2.024) 1,3-dimethyl-N-[(3S)-1, 1,3-trimethyl-2,3-dihydro-1H-indol-4-yl]-1H-pyrazole-4-carboxamide, (2.025) 1-methyl-3-(trifluoromethyl )-N-[2'-(trifluoromethyl)biphenyl-2-yl]-1H-pyrazole-4-carboxamide, (2.026) 2-fluoro-6-(trifluoromethyl)-N -(1,1,3-trimethyl-2,3-dihydro-1H-indol-4-yl))benzamide, (2.027) 3-(difluoromethyl)-1-methyl- N-(1,1,3-trimethyl-2,3-dihydro-1H-indol-4-yl)-1H-pyrazole-4-carboxamide, (2.028) 3-(difluoromethyl )-1-methyl-N-[(3R)-1,1,3-trimethyl-2,3-dihydro-1H-indol-4-yl]-1H-pyrazole-4-carboxamide , (2.029) 3-(Difluoromethyl)-1-methyl-N-[(3S)-1,1,3-trimethyl-2,3-dihydro-1H-indol-4-yl] -1H-pyrazole-4-carboxamide, (2.030) 3-(difluoromethyl)-N-(7-fluoro-1,1,3-trimethyl-2,3-dihydro-1H-茚-4-yl)-1-methyl-1H-pyrazole-4-carboxamide, (2.031) 3-(difluoromethyl)-N-[(3R)-7-fluoro- 1,1,3-trimethyl-2,3-dihydro-1H-indol-4-yl]-1-methyl-1H-pyrazole-4-carboxamide, (2.032) 3-(difluoro Methyl)-N-[(3S)-7-fluoro-1,1,3-trimethyl-2,3-dihydro-1H-indol-4-yl]-1-methyl-1H-pyrazole 4-carbamamine, (2.033) 5,8-difluoro-N-[2-(2-fluoro-4-{[4-(trifluoromethyl)pyridin-2-yl])ethyl]quina Oxazolin-4-amine, (2.034) N-(2-cyclopentyl-5-fluorobenzyl)-N-cyclopropyl-3-(difluoromethyl)-5-fluoro-1-methyl -1H-pyrazole-4-carbamide, (2.035) N-(2-tert-butyl-5-methylbenzyl)-N-cyclopropyl-3-(difluoromethyl)-5 -fluoro-1-methyl-1H-pyrazole-4-carboxamide, (2.036) N-(2-t-butylbenzyl)-N-cyclopropyl-3-(difluoromethyl) -5-fluoro-1-methyl-1H-pyrazole-4-carboxamide, (2.037) N-(5-chloro-2-ethylbenzyl)-N-cyclopropyl-3-(di) Fluoromethyl)-5-fluoro-1-methyl-1H-pyrazole-4-carboxamide, (2.038) N-(5-chloro-2-isopropylbenzyl)-N-cyclopropyl- 3-(Difluoromethyl)-5-fluoro-1-methyl-1H-pyrazole-4-carboxamide, (2.039) N-[(1R,4S)-9-(dichloromethylene) -1,2,3,4-tetrahydro-1,4-methylnaphthalen-5-yl]-3-(difluoromethyl)-1-methyl-1H-pyrazole-4-carboxamide, (2.040) N-[(1S,4R)-9-(Dichloromethylene)-1,2,3,4-tetrahydro-1,4-methyl bridge Naphthalen-5-yl]-3-(difluoromethyl)-1-methyl-1H-pyrazole-4-carboxamide, (2.041) N-[1-(2,4-dichlorophenyl) 1-methoxypropan-2-yl]-3-(difluoromethyl)-1-methyl-1H-pyrazole-4-carboxamide, (2.042) N-[2-chloro-6- (trifluoromethyl)benzyl]-N-cyclopropyl-3-(difluoromethyl)-5-fluoro-1-methyl-1H-pyrazole-4-carboxamide, (2.043) N -[3-chloro-2-fluoro-6-(trifluoromethyl)benzyl]-N-cyclopropyl-3-(difluoromethyl)-5-fluoro-1-methyl-1H-pyridyl Oxazole-4-carboxamide, (2.044) N-[5-chloro-2-(trifluoromethyl)benzyl]-N-cyclopropyl-3-(difluoromethyl)-5-fluoro- 1-methyl-1H-pyrazole-4-carboxamide, (2.045) N-cyclopropyl-3-(difluoromethyl)-5-fluoro-1-methyl-N-[5-methyl -2-(Trifluoromethyl)benzyl]-1H-pyrazole-4-carbamide, (2.046) N-cyclopropyl-3-(difluoromethyl)-5-fluoro-N-( 2-fluoro-6-isopropylbenzyl)-1-methyl-1H-pyrazole-4-carboxamide, (2.047) N-cyclopropyl-3-(difluoromethyl)-5- Fluorine-N-(2-isopropyl-5-methylbenzyl)-1-methyl-1H-pyrazole-4-carboxamide, (2.048) N-cyclopropyl-3-(difluoro Methyl)-5-fluoro-N-(2-isopropylbenzyl)-1-methyl-1H-pyrazole-4-thiocarbamine, (2.049) N-cyclopropyl-3-( Difluoromethyl)-5-fluoro-N-(2-isopropyl Benzyl)-1-methyl-1H-pyrazole-4-carboxamide, (2.050) N-cyclopropyl-3-(difluoromethyl)-5-fluoro-N-(5-fluoro- 2-isopropylbenzyl)-1-methyl-1H-pyrazole-4-carboxamide, (2.051) N-cyclopropyl-3-(difluoromethyl)-N-(2-B 4-,5-dimethylbenzyl)-5-fluoro-1-methyl-1H-pyrazole-4-carboxamide, (2.052) N-cyclopropyl-3-(difluoromethyl -N-(2-ethyl-5-fluorobenzyl)-5-fluoro-1-methyl-1H-pyrazole-4-carboxamide, (2.053) N-cyclopropyl-3-( Difluoromethyl)-N-(2-ethyl-5-methylbenzyl)-5-fluoro-1-methyl-1H-pyrazole-4-carboxamide, (2.054) N-cyclopropane -N-(2-cyclopropyl-5-fluorobenzyl)-3-(difluoromethyl)-5-fluoro-1-methyl-1H-pyrazole-4-carboxamide, (2.055 N-cyclopropyl-N-(2-cyclopropyl-5-methylbenzyl)-3-(difluoromethyl)-5-fluoro-1-methyl-1H-pyrazole-4- Formamide, (2.056) N-cyclopropyl-N-(2-cyclopropylbenzyl)-3-(difluoromethyl)-5-fluoro-1-methyl-1H-pyrazole-4 - formamide.
3) Inhibitors of the respiratory chain at the complex III, for example (3.001) ametoctradin, (3.002) oxasulbrom, (3.003) azoxystrobin, ( 3.004) coumethoxystrobin, (3.005) coumoxystrobin, (3.006) cyazofamid, (3.007) dimoxystrobin, (3.008) alkyl azoxystrobin (enoxastrobin), (3.009) 凡同同 (famoxadone), (3.010) imidacloprid (fenamidone), (3.011) flufenoxystrobin, (3.012) fluoxastrobin, (3.013) g Kresoxim-methyl, (3.014) metominostrobin, (3.015) oressastrobin, (3.016) picoxystrobin, (3.017) pyraclostrobin, (3.018) pyramitostrobin, (3.019) pyraoxystrobin, (3.020) trifloxystrobin, (3.021) (2E)-2-{2-[({[(1E)) 1-(3-{[(E)-1-fluoro-2-phenylvinyl]oxy}phenyl)ethylidene]amino}oxy)methyl]phenyl}-2-(A Ominoimido)-N-methylacetamide, (3.022) (2E,3Z)-5-{[1-(4-chlorophenyl)-1H-pyrazol-3-yl]oxy}- 2- (methoxyimido)-N,3-dimethylpent-3-enylamine, (3.023) (2R)-2-{2-[(2,5-dimethylphenoxy)methyl Phenyl}-2-methoxy-N-methylacetamide, (3.024) (2S)-2-{2-[(2,5-dimethylphenoxy)methyl]phenyl} -2-methoxy-N-methylacetamide, (3.025) (3S,6S,7R,8R)-8-benzyl-3-[({3-[(isobutyloxy))) Oxy]-4-methoxypyridin-2-yl}carbonyl)amino]-6-methyl-4,9-di-oxy-1,5-dioxan-7-yl 2- Methyl propionate, (3.026) 2-{2-[(2,5-dimethylphenoxy)methyl]phenyl}}-2-methoxy-N-methylacetamide, 3.027) N-(3-ethyl-3,5,5-trimethylcyclohexyl)-3-carboxamido-2-hydroxybenzamide, (3.028) (2E,3Z)-5-{ [1-(4-Chloro-2-fluorophenyl)-1H-pyrazol-3-yl]oxy}-2-(methoxyimino)-N,3-dimethylpent-3-ene Indoleamine, (3.029) methyl {5-[3-(2,4-dimethylphenyl)-1H-pyrazol-1-yl]-2-methylbenzyl}carbamate.
4) Inhibitors of mitosis and cell division such as (4.001) carbendazim, (4.002) diehofencarb, (4.003) ethaboxam, (4.004) fluopyram, (4.005) ) pencycuron, (4.006) rot, (4.007) thiophanate-methyl, (4.008) zoxamide, (4.009) 3-chloro-4-(2,6- Difluorophenyl)-6-methyl-5-phenylpyridazine, (4.010) 3-chloro-5-(4-chlorophenyl)-4-(2,6-difluorophenyl)-6- Methylpyridazine, (4.011) 3-chloro-5-(6-chloropyridin-3-yl)-6-methyl-4-(2,4,6-trifluorophenyl)pyridazine, (4.012) 4-(2-Bromo-4-fluorophenyl)-N-(2,6-difluorophenyl)-1,3-dimethyl-1H-pyrazole-5-amine, (4.013) 4-( 2-Bromo-4-fluorophenyl)-N-(2-bromo-6-fluorophenyl)-1,3-dimethyl-1H-pyrazole-5-amine, (4.014) 4-(2- Bromo-4-fluorophenyl)-N-(2-bromophenyl)-1,3-dimethyl-1H-pyrazole-5-amine, (4.015) 4-(2-bromo-4-fluorobenzene -N-(2-chloro-6-fluorophenyl)-1,3-dimethyl-1H-pyrazole-5-amine, (4.016) 4-(2-bromo-4-fluorophenyl) -N-(2-chlorophenyl)-1,3-dimethyl-1H-pyrazole-5-amine, (4.017) 4-(2-bromo-4-fluorophenyl)-N-(2- Fluorophenyl)-1,3-dimethyl-1H-pyrazole-5-amine, (4.018) 4-(2-chloro-4- Phenyl)-N-(2,6-difluorophenyl)-1,3-dimethyl-1H-pyrazole-5-amine, (4.019) 4-(2-chloro-4-fluorophenyl) -N-(2-chloro-6-fluorophenyl)-1,3-dimethyl-1H-pyrazole-5-amine, (4.020) 4-(2-chloro-4-fluorophenyl)-N -(2-chlorophenyl)-1,3-dimethyl-1H-pyrazole-5-amine, (4.021) 4-(2-chloro-4-fluorophenyl)-N-(2-fluorobenzene ))-1,3-dimethyl-1H-pyrazole-5-amine, (4.022) 4-(4-chlorophenyl)-5-(2,6-difluorophenyl)-3,6- Dimethylpyridazine, (4.023) N-(2-bromo-6-fluorophenyl)-4-(2-chloro-4-fluorophenyl))-1,3-dimethyl-1H-pyrazole -5-amine, (4.024) N-(2-bromophenyl)-4-(2-chloro-4-fluorophenyl)-1,3-dimethyl-1H-pyrazole-5-amine, ( 4.025) N-(4-Chloro-2,6-difluorophenyl)-4-(2-chloro-4-fluorophenyl))-1,3-dimethyl-1H-pyrazole-5-amine .
5) Compounds capable of multi-site action, such as (5.001) purplish red mixture, (5.002) tetrachlordane, (5.003) captan, (5.004) tetrachloroisophthalonitrile, (5.005) copper hydroxide , (5.006) copper naphthenate, (5.007) copper oxide, (5.008) basic copper oxychloride, (5.009) copper (2+) sulfate, (5.010) nitrile sulfonium, (5.011) dodine (dodine) , (5.012) folfet, (5.013) zinc-manganese (mancozeb), (5.014) manganese peripur (maneb), (5.015) from ruin (metiram), (5.016) to avoid rotten zinc, (5.017 ) oxine-copper, (5.018) methyl zinc Naipu, (5.019) sulfur and sulfur preparations including calcium polysulfide, (5.020) thiram, (5.021) zinc napu ( Zineb), (5.022) Yisui (ziram), (5.023) 6-ethyl-5,7-di-oxy-6,7-dihydro-5H-pyrrolo[3',4':5,6 ][1,4]dithiazepine[2,3-c][1,2]thiazole-3-carbonitrile.
6) Compounds capable of inducing host protection, such as (6.001) activated ester-S-methyl, (6.002) isotianil, (6.003) probenazole, (6.004) tiadinil .
7) Inhibitors of amino acid and/or protein biosynthesis, for example, (7.001) cyprodinil, (7.002) kasugamycin, (7.003) hydrated kasugamycin hydrochloride, (7.004) Oxytetracycline, (7.005) pyrimethanil, (7.006) 3-(5-fluoro-3,3,4,4-tetramethyl-3,4-dihydroisoquinoline- 1-yl)quinoline.
8) Inhibitors of ATP production, such as (8.001) silthiofam.
9) Inhibitors of cell wall synthesis, such as (9.001) benthiavalicarb, (9.002) dimethomorph, (9.003) flumorph, (9.004) iprovalicarb, (9.005) mandipropamid, (9.006) pyrimorph, (9.007) valifenalate, (9.008) (2E)-3-(4-third Butylphenyl)-3-(2-chloropyridin-4-yl)-1-(morpholin-4-yl)prop-2-en-1-one, (9.009)(2Z)-3-(4 -T-butylphenyl)-3-(2-chloropyridin-4-yl)-1-(morpholin-4-yl)prop-2-en-1-one.
10) Inhibitors of lipid and membrane synthesis, for example (10.001) propamocarb, (10.002) propamoxine hydrochloride, (10.003) tolclofos-methyl.
11) Inhibitors of melanin biosynthesis, such as (11.001) tricyclazole, (11.002) {3-methyl-1-[(4-methylbenzylidene)amino]butan-2-yl } 2,2,2-trifluoroethyl carbamic acid.
12) Inhibitors of nucleic acid synthesis, such as (12.001) benalaxyl, (12.002) Bendall-M (kiralaxyl), (12.003) metalaxyl, (12.004) Destroy-M (mefenoxam).
13) Inhibitors of signal transduction, such as (13.001) fludioxonil, (13.002) iprodione, (13.003) procymidone, (13.004) propoxyquinoline (proquinazid), (13.005) quinoxyfen, (13.006) vinclozolin.
14) A compound capable of acting as an uncoupler, such as (14.001) fluazinam, (14.002) meptyldinocap.
15) Other compounds, such as (15.001) Abscisic acid, (15.002) benthiazole, (15.003) piroxazin, (15.004) capsimycin, (15.004) 15.005) carvone, (15.006) chinomethionat, (15.007) cufraneb, (15.008) cyflufenamid, (15.009) cymoxanil, ( 15.010) cyprosulfamide, (15.011) flutianil, (15.012) fosetyl-aluminium, (15.013) fosetyl-calcium, (15.014) Fosetyl-sodium, (15.015) methyl isothiocyanate, (15.016) metrafenone, (15.017) mildiomycin, (15.018) natamycin , (15.019) nickel dimethyldithiocarbamate, (15.020) nitrothal-isopropyl, (15.021) oxamocarb, (15.022) Osip Oxathiapiprolin, (15.023) oxyfenthiin, (15.024) pentachlorophenol and salt, (15.025) phosphorous acid and its salt, (15.026 propamocarb-ethylphosphonate (propamoca) Rb-fosetylate), (15.027) pyriofenone (chlazafenone), (15.028) tebufloquin, (15.029) gram of tecloftalam, (15.030) Tolnifanide, (15.031) 1-(4-{4-[(5R)-5-(2,6-difluorophenyl)-4,5-dihydro-1,2-oxazole -3-yl]-1,3-thiazol-2-yl}piperidin-1-yl)-2-[5-methyl-3-(trifluoromethyl)-1H-pyrazol-1-yl] Ethyl ketone, (15.032) 1-(4-{4-[(5S)-5-(2,6-difluorophenyl)-4,5-dihydro-1,2-oxazol-3-yl] -1,3-thiazol-2-yl}piperidin-1-yl)-2-[5-methyl-3-(trifluoromethyl)-1H-pyrazol-1-yl]ethanone, (15.033 2-(6-Benzylpyridin-2-yl)quinazoline, (15.034) 2,6-dimethyl-1H,5H-[1,4]dithiazino[2,3-c: 5,6-c']dipyrrole-1,3,5,7(2H,6H)-tetraone, (15.035) 2-[3,5-bis(difluoromethyl)-1H-pyrazole-1 -yl]-1-[4-(4-{5-[2-(prop-2-yn-1-yloxy)phenyl]-4,5-dihydro-1,2-oxazole-3 -yl}-1,3-thiazol-2-yl)piperidin-1-yl]ethanone, (15.036) 2-[3,5-bis(difluoromethyl)-1H-pyrazol-1-yl ]-1-[4-(4-{5-[2-chloro-6-(prop-2-yn-1-yloxy)phenyl]-4,5-dihydro-1,2-oxazole -3-yl}-1,3-thiazol-2-yl)piperidin-1-yl]ethanone, (15.037) 2-[3,5- (difluoromethyl)-1H-pyrazol-1-yl]-1-[4-(4-{5-[2-fluoro-6-(prop-2-yn-1-yloxy)phenyl) ]-4,5-Dihydro-1,2-oxazol-3-yl}-1,3-thiazol-2-yl)piperidin-1-yl]ethanone, (15.038) 2-[6-( 3-fluoro-4-methoxyphenyl)-5-methylpyridin-2-yl]quinazoline, (15.039) 2-{(5R)-3-[2-(1-{[3,5 -Bis(difluoromethyl)-1H-pyrazol-1-yl]ethenyl}piperidin-4-yl)-1,3-thiazol-4-yl]-4,5-dihydro-1, 2-oxazol-5-yl}-3-chlorophenylmethanesulfonate, (15.040) 2-{(5S)-3-[2-(1-{[3,5-bis(difluoromethyl) -1H-pyrazol-1-yl]ethenyl}piperidin-4-yl)-1,3-thiazol-4-yl]-4,5-dihydro-1,2-oxazole-5- -3--3-chlorophenylmethanesulfonate, (15.041) 2-{2-[(7,8-difluoro-2-methylquinolin-3-yl)oxy]-6-fluorophenyl }propan-2-ol, (15.042) 2-{2-fluoro-6-[(8-fluoro-2-methylquinolin-3-yl)oxy]phenyl}propan-2-ol, (15.043 2-{3-[2-(1-{[3,5-bis(difluoromethyl)-1H-pyrazol-1-yl]ethenyl}piperidin-4-yl)-1,3 -thiazol-4-yl]-4,5-dihydro-1,2-oxazol-5-yl}-3-chlorophenylmethanesulfonate, (15.044) 2-{3-[2-(1) -{[3,5-bis(difluoromethyl)-1H-pyrazol-1-yl]ethenyl}piperidin-4-yl)-1,3-thiazol-4-yl]-4,5 -dihydro-1,2-oxazol-5-yl }Phenylmethanesulfonate, (15.045) 2-phenylphenol and salt, (15.046) 3-(4,4,5-trifluoro-3,3-dimethyl-3,4-dihydroisoquine Polin-1-yl)quinoline, (15.047) 3-(4,4-difluoro-3,3-dimethyl-3,4-dihydroisoquinolin-1-yl)quinoline, (15.048) 4-Amino-5-fluoropyrimidin-2-ol (tautomeric form: 4-amino-5-fluoropyrimidine-2(1H)-one), (15.049) 4-sided oxy-4-[( 2-Phenylethyl)amino]butyric acid, (15.050) 5-amino-1,3,4-thiadiazole-2-thiol, (15.051) 5-chloro-N'-phenyl-N' -(prop-2-yn-1-yl)thiophene-2-benzenesulfonate, (15.052) 5-fluoro-2-[(4-fluorobenzyl)oxy]pyrimidine-4-amine, (15.053 5-fluoro-2-[(4-methylbenzyl)oxy]pyrimidine-4-amine, (15.054) 9-fluoro-2,2-dimethyl-5-(quinolin-3-yl) )-2,3-dihydro-1,4-benzoxazepine, (15.055) {6-[({[(Z)-(1-methyl-1H-tetrazol-5-yl))) Methyl]methylene]amino}oxymethyl]pyridin-2-yl}aminocarbamic acid but-3-yne-1-ester, (15.056) (2Z)-3-amino-2-cyano- Ethyl 3-phenylacrylate, (15.057) phenazine-1-carboxylic acid, (15.058) propyl 3,4,5-trihydroxybenzoate, (15.059) quinoline-8-ol, (15.060) quinoline- 8-alcohol sulfate (2:1), (15.061) {6-[({[(1-methyl-1H-four) -5-yl)(yl)methylene]amino}oxy)methyl]pyridin-2-yl}carbamic acid tert-butyl ester, (15.062) 5-fluoro-4-imino-3- Methyl-1-[(4-methylphenyl)sulfonyl]-3,4-dihydropyrimidin-2(1H)-one.
如本文上文所描述之類別(1)至(15)之所有提出的混合搭配物均可以游離化合物形式及/或(若其官能基致能此)其農業上可接受之鹽形式存在。All of the proposed mixing partners of categories (1) to (15) as described herein above may be present in the form of free compounds and/or (if their functional groups enable) their agriculturally acceptable salt forms.
方法及用途 本發明之化合物及組合物具有有效殺微生物活性。其可用於控制不合需要之微生物,諸如不合需要之真菌及細菌。如本文下文中更詳細地描述,其可尤其適用於作物保護(其控制引起植物病害之微生物)或尤其適用於保護材料(例如工業材料、木材、儲存貨物)。更特定言之,本發明之化合物及組合物可用於保護種子、發芽種子、萌出的幼苗、植物、植物部分、果實、收穫貨物及/或植物生長之土壤免受不合需要之微生物影響。Methods and Uses The compounds and compositions of the present invention have potent microbicidal activity. It can be used to control undesirable microorganisms such as undesirable fungi and bacteria. As described in more detail herein below, it may be particularly useful for crop protection (which controls microorganisms that cause plant diseases) or particularly for protecting materials (eg, industrial materials, wood, storage goods). More specifically, the compounds and compositions of the present invention are useful for protecting seeds, germinating seeds, emerged seedlings, plants, plant parts, fruits, harvested goods, and/or soil from which plants are grown from undesirable microbes.
如本文所用,控制(control/controlling)涵蓋不合需要之微生物之保護性、治癒性及根除性處理。不合需要之微生物可為病原性細菌、病原性病毒、病原性卵菌或病原性真菌,更特定言之可為植物病原性細菌、植物病原性病毒、植物病原性卵菌或植物病原性真菌。如本文下文中所詳細描述,此等植物病原性微生物係廣泛範圍之植物病害之致病原因。As used herein, control/controlling covers the protective, curative, and eradicative treatment of undesirable microorganisms. The undesirable microorganism may be a pathogenic bacterium, a pathogenic virus, a pathogenic oomycete or a pathogenic fungus, more specifically a phytopathogenic bacterium, a phytopathogenic virus, a phytopathogenic oomycete or a phytopathogenic fungus. As described in detail herein below, such phytopathogenic microorganisms are the causative cause of a wide range of plant diseases.
更特定言之,本發明之化合物及組合物可用作殺真菌劑。出於本說明書之目的,術語「殺真菌劑」係指可用於作物保護以供控制不合需要之真菌(諸如根腫菌(Plasmodiophoromycetes)、壺菌(Chytridiomycetes)、接合菌(Zygomycetes)、子囊菌(Ascomycetes)、擔子菌(Basidiomycetes)及半知菌(Deuteromycetes))及/或控制卵菌(Oomycetes)的化合物或組合物。More specifically, the compounds and compositions of the invention are useful as fungicides. For the purposes of this specification, the term "fungicide" refers to fungi that can be used for crop protection for controlling undesirable (such as Plasmodiophoromycetes, Chytridiomycetes, Zygomycetes, Ascomycetes). Ascomycetes), Basidiomycetes and Deuteromycetes and/or compounds or compositions that control Oomycetes.
本發明亦關於一種用於控制不合需要之微生物,諸如不合需要之真菌、卵菌及細菌之方法,該方法包含以下步驟:將至少一種本發明之化合物或至少一種本發明之組合物施加至微生物及/或其生境(施加至植物、植物部分、種子、果實或施加至植物生長的土壤)。The invention also relates to a method for controlling undesirable microorganisms, such as undesirable fungi, oomycetes and bacteria, the method comprising the steps of: applying at least one compound of the invention or at least one composition of the invention to a microorganism And/or its habitat (applied to plants, plant parts, seeds, fruits or soil applied to plant growth).
通常,當本發明之化合物及組合物用於治癒性或保護性方法以控制植物病原性真菌及/或植物病原性卵菌時,將其有效量及植物可相容之量施加至植物、植物部分、果實、種子或施加至植物生長的土壤或基質。可用於培育植物之適合基質包括基於無機物之基質,諸如礦棉,尤其岩棉、珍珠岩、砂或礫石;有機基質,諸如泥炭、松樹皮或鋸屑;及基於石油之基質,諸如聚合泡沫或塑料珠粒。有效量及植物可相容量意謂足以控制或毀壞耕地上存在或易在耕地上出現的真菌,且不會引起該等作物之任何顯著的植物毒性症狀。視待控制之真菌、作物類型、作物生長階段、氣候條件及所用本發明之各別化合物或組合物而定,此類量可在廣泛圍內變化。此量可藉由熟習此項技術者能力範圍內之系統田間試驗來測定。In general, when the compounds and compositions of the present invention are used in curative or protective methods to control phytopathogenic fungi and/or phytopathogenic oomycetes, their effective amounts and plant compatible amounts are applied to plants, plants. Part, fruit, seed or soil or substrate applied to the growth of the plant. Suitable substrates for cultivating plants include inorganic based substrates such as mineral wool, especially rock wool, perlite, sand or gravel; organic substrates such as peat, pine bark or sawdust; and petroleum based substrates such as polymeric foam or plastic Beads. An effective amount and plant phase capacity means sufficient to control or destroy fungi present on or cultivated on the cultivated land without causing any significant phytotoxic symptoms of the crop. Depending on the fungus to be controlled, the type of crop, the stage of crop growth, the climatic conditions and the individual compounds or compositions of the invention used, such amounts may vary widely. This amount can be determined by systematic field trials within the skill of the art.
植物及植物部分 可將本發明之化合物及組合物施加至任何植物或植物部分。Plants and Plant Parts The compounds and compositions of the invention can be applied to any plant or plant part.
植物意謂所有植物及植物群體,諸如所需及不合需要之野生植物或作物植物(包括天然產生之作物植物)。作物植物可為藉由習知育種及最佳化方法或藉由生物技術及基因工程方法或此等方法之組合可獲得的植物,包括經遺傳修飾之植物(GMO或轉殖基因植物)及可受及不受植物育種者權利保護達植物栽培品種。By plant is meant all plants and plant populations, such as desired and undesirable wild plants or crop plants (including naturally occurring crop plants). The crop plant may be a plant obtainable by conventional breeding and optimization methods or by biotechnological and genetic engineering methods or a combination of such methods, including genetically modified plants (GMO or transgenic plants) and Protected by plant breeders from plant cultivars.
植物部分應理解為意謂植物在地面上方及下方的所有部分及器官,諸如芽、葉片、花及根,其之實例包括葉片、針葉、梗、莖幹、花、果實體、果實及種子、以及根、塊莖與根莖。植物部分亦包括收穫之物質及無性與有性繁殖物質,例如插條、塊莖、根莖、幼枝及種子。Plant parts are understood to mean all parts and organs of plants above and below the ground, such as buds, leaves, flowers and roots, examples of which include leaves, needles, stems, stems, flowers, fruit bodies, fruits and seeds. And roots, tubers and rhizomes. Plant parts also include harvested material and asexual and sexually propagated materials such as cuttings, tubers, rhizomes, young shoots and seeds.
可根據本發明之方法處理之植物包括以下:棉花、亞麻、葡萄藤、果實、蔬菜,諸如薔薇科(Rosaceae sp. ) (例如仁果,諸如蘋果及梨,以及核果,諸如杏、櫻桃、杏仁及桃,及柔軟果實,諸如草莓)、茶藨子科(Ribesioidae sp.) 、 胡桃科(Juglandaceae sp.) 、 樺科(Betulaceae sp.) 、 漆樹科(Anacardiaceae sp.) 、 山毛櫸科(Fagaceae sp.) 、 桑科(Moraceae sp.) 、 木樨科(Oleaceae sp.) 、 獼猴桃科(Actinidaceae sp.) 、 樟科(Lauraceae sp.) 、 芭蕉科(Musaceae sp.) (例如香蕉樹及人造林)、茜草科(Rubiaceae sp.) (例如咖啡)、茶科(Theaceae sp.) 、 梧桐科(Sterculiceae sp.) 、 芸香科(Rutaceae sp.) (例如檸檬、橙及葡萄柚);茄科(Solanaceae sp.) (例如蕃茄)、百合科(Liliaceae sp.) 、 菊科(Asteraceae sp.) (例如萵苣)、傘形科(Umbelliferae sp.) 、 十字花科(Cruciferae sp.) 、 藜科(Chenopodiaceae sp.) 、 葫蘆科(Cucurbitaceae sp.) (例如胡瓜)、蔥科(Alliaceae sp.) (例如韭菜、洋蔥)、蝶形花科(Papilionaceae sp.) (例如豌豆);主要作物植物,諸如禾本科(Gramineae sp.) (例如玉米、草皮、穀物,諸如小麥、粗麥、大米、大麥、燕麥、栗及黑小麥)、菊科(Asteraceae sp.) (例如向日葵)、十字花科(Brassicaceae sp.) (例如白色甘藍菜、紅色甘藍菜、椰菜、花椰菜、孢子甘藍、白菜、球莖甘藍、蘿蔔及油菜、氮芥、辣根及水芹)、豆科(Fabacae sp.) (例如菜豆、花生)、蝶形花科(Papilionaceae sp.) (例如大豆)、茄科(Solanaceae sp.) (例如馬鈴薯)、藜科(Chenopodiaceae sp.) (例如糖用甜菜、飼料甜菜、紅頭菜、甜菜);適用用於園林及森林領域之植物及觀賞植物;及此等植物中之各者之遺傳修飾之品種。Plants which can be treated according to the method of the invention include the following: cotton, flax, vine, fruit, vegetable, such as Rosaceae sp. (eg, pome fruit, such as apples and pears, and stone fruit, such as apricot, cherry, almond) And peaches, and soft fruits such as strawberries), Ribesioidae sp. , Juglandaceae sp. , Betulaceae sp. , Anacardiaceae sp. , Fagaceae sp .) , Moraceae sp. , Oleaceae sp. , Actinidaceae sp. , Lauraceae sp. , Musaceae sp. (eg banana tree and planted forest) Rubiaceae sp. (eg coffee), theaceae ( Theaceae sp.) , the genus Sterculiceae sp. , Rutaceae sp. (eg lemon, orange and grapefruit); Solanaceae Sp.) (eg tomato), Liliaceae sp. , Asteraceae sp. (eg lettuce), Umbelliferae sp. , Cruciferae sp. , Chenopodiaceae Sp.) , Cucurbitaceae sp. (eg courgette), onion ( Alliac Eae sp.) (eg leek, onion), Papilionaceae sp. (eg pea); main crop plant, such as Gramineae sp. (eg corn, turf, grain, such as wheat, rye) , rice, barley, oats, chestnut and triticale), Asteraceae sp. (eg sunflower), Brassicaceae sp. (eg white cabbage, red cabbage, broccoli, broccoli, spore cabbage) , cabbage, broccoli, radish and rapeseed, nitrogen mustard, horseradish and cress), Fabacae sp. (eg, kidney beans, peanuts), Papilionaceae sp. (eg soybean), Solanaceae ( Solanaceae sp.) (eg potato), Chenopodiaceae sp. (eg sugar beet, fodder beet, red cabbage, beet); suitable for plants and ornamental plants used in gardens and forests; and in such plants The genetically modified variety of each.
在一些較佳實施例中,野生型植物物種及植物栽培品種、或藉由習知生物學育種方法(諸如雜交或原生質體融合)獲得之彼等植物以及其部分,根據本發明之方法來處理。In some preferred embodiments, wild-type plant species and plant cultivars, or plants obtained by conventional biological breeding methods (such as hybridization or protoplast fusion), and portions thereof, are treated according to the methods of the present invention. .
在一些其他較佳實施例中,藉由基因工程改造法在適當時結合習知方法(遺傳修飾生物體)獲得之轉殖基因植物及植物栽培品種及其部分根據本發明之方法處理。更佳地,可商購的或在使用中之植物栽培品種之植物根據本發明來處理。植物栽培品種應理解為意謂具有新穎特性(「性狀」)且已藉由習知育種、藉由誘變或藉由重組DNA技術獲得的植物。其可為栽培品種、變種、生物型或基因型。In some other preferred embodiments, the transgenic plants and plant cultivars obtained by genetic engineering, in combination with conventional methods (genetically modified organisms), and portions thereof, are treated according to the methods of the present invention. More preferably, plants of commercially available or plant cultivars in use are treated in accordance with the present invention. Plant cultivars are understood to mean plants which have novel properties ("traits") and which have been obtained by conventional breeding, by mutagenesis or by recombinant DNA techniques. It can be a cultivar, a variety, a biotype or a genotype.
根據本發明之方法可用於處理經遺傳修飾之生物體(GMO),例如植物或種子。經遺傳修飾之植物(或轉殖基因植物)係異源基因已穩定整合入基因組中之植物。表述「異源基因」基本上意謂,在植物外部提供或組合且當引入細胞核、葉綠體或粒線體基因組中時,基因藉由表現所關注之蛋白質或多肽或藉由(使用例如反義技術、共抑制技術、RNA干擾-RNAi技術或微RNA-miRNA技術)下調或靜默植物中所存在之其他基因而賦予經轉型植物新穎或改良之農藝學特性或其他特性。位於基因組中之異源基因亦稱為轉殖基因。由在植物基因組中之特定位置定義之轉殖基因稱為轉型或轉殖基因事件。The method according to the invention can be used to treat genetically modified organisms (GMOs), such as plants or seeds. A genetically modified plant (or a transgenic plant) is a plant in which the heterologous gene has been stably integrated into the genome. The expression "heterologous gene" basically means that a gene is provided or combined outside the plant and when introduced into the nucleus, chloroplast or mitochondrial genome, the gene is expressed by expressing the protein or polypeptide of interest or by using, for example, antisense technology The co-suppression technique, RNA interference-RNAi technology or microRNA-miRNA technology) down-regulates or silences other genes present in the plant to confer novel or improved agronomic or other properties to the transformed plant. A heterologous gene located in the genome is also referred to as a transgenic gene. A transgenic gene defined by a specific location in the plant genome is referred to as a transformation or transgenic gene event.
可藉由上文所揭示之方法處理之植物及植物栽培品種包括具有賦予此等植物尤其有利、適用之性狀之遺傳物質的所有植物(不論藉由育種及/或生物技術方式獲得)。Plants and plant cultivars which can be treated by the methods disclosed above include all plants (whether obtained by breeding and/or biotechnological means) having genetic material which confers particularly advantageous and suitable traits on such plants.
可藉由上文所揭示之方法處理之植物及植物栽培品種包括抗一或多種生物性逆境的植物及植物栽培品種,亦即,該等植物展示對動物及微生物有害生物更佳防衛,諸如抗線蟲、昆蟲、蟎、植物病原性真菌、細菌、病毒及/或類病毒。Plants and plant cultivars which can be treated by the methods disclosed above include plants and plant cultivars which are resistant to one or more biological stresses, that is, such plants exhibit better defense against animal and microbial pests, such as resistance Nematodes, insects, mites, phytopathogenic fungi, bacteria, viruses and/or viroids.
亦藉由上文所揭示之方法處理之植物及植物栽培品種包括抗一或多種非生物性脅迫的彼等植物。非生物性逆境條件可包括例如乾旱、低溫暴露、熱暴露、滲透壓力、洪水、增加之土壤鹽度、增加之礦物質暴露、臭氧暴露、高光暴露、氮養分之有限可用性、磷養分之有限可用性、避蔭。Plants and plant cultivars also treated by the methods disclosed above include those plants that are resistant to one or more abiotic stresses. Abiotic stress conditions can include, for example, drought, low temperature exposure, heat exposure, osmotic pressure, flooding, increased soil salinity, increased mineral exposure, ozone exposure, high light exposure, limited availability of nitrogen nutrients, limited availability of phosphorus nutrients Avoid the shade.
可藉由上文所揭示之方法處理之植物及植物栽培品種包括特徵為產量特徵增強之彼等植物。該等植物之產量增加可為例如改良植物生理學、生長及發育(諸如水利用效率、水保持效率、改良氮使用、增強碳同化、改良光合成、增加發芽效率及加快成熟)之結果。產量可另外受改良之植物株型影響(在逆境及非逆境條件下),該改良之植物株型包括(但不限於)早期開花、對雜交種子生產之開花控制、幼苗活力、植物大小、節間數目及距離、根生長、種子大小、果實大小、豆莢大小、豆莢或穗數目、每個豆莢或穗之種子數目、種子質量、增強之種子填充、降低之種子散佈度、降低之豆莢開裂性及抗倒伏性。另外產量性狀包括種子組合物,諸如碳水化合物含量及例如棉或澱粉之組合物、蛋白質含量、油含量及組合物、營養值、抗營養化合物之還原、經改良可加工性及更佳儲存穩定性。Plants and plant cultivars which can be treated by the methods disclosed above include those plants which are characterized by enhanced yield characteristics. Increases in the yield of such plants can be the result, for example, of improved plant physiology, growth and development (such as water use efficiency, water retention efficiency, improved nitrogen use, enhanced carbon assimilation, improved photosynthetic synthesis, increased germination efficiency, and accelerated maturation). Yield can be additionally influenced by improved plant type (under adverse and non-adversive conditions) including, but not limited to, early flowering, flowering control of hybrid seed production, seedling vigor, plant size, and Number and distance, root growth, seed size, fruit size, pod size, number of pods or ears, number of seeds per pod or ear, seed quality, enhanced seed filling, reduced seed dispersibility, reduced pod cracking And lodging resistance. Additional yield traits include seed compositions such as carbohydrate content and compositions such as cotton or starch, protein content, oil content and composition, nutritional value, reduction of anti-nutritional compounds, improved processability, and better storage stability. .
可藉由上文所揭示之方法處理之植物及植物栽培品種包括為雜交植物之植物及植物栽培品種,該等雜交植物已表現一般大體上引起較高產量、活力、健康及抗生物及非生物逆境之雜種優勢或雜交活力的特徵。Plants and plant cultivars which can be treated by the methods disclosed above include plant and plant cultivars which are hybrid plants which have generally exhibited generally high yield, vigor, health and resistance to abiotics and abiotics. The heterosis of adversity or the characteristics of hybrid vigor.
可藉由上文所揭示之方法處理之植物及植物栽培品種(藉由諸如遺傳工程改造之植物生物技術方法獲得)包括為除草劑耐受性植物之植物及植物栽培品種,亦即使得對一或多種既定除草劑耐受的植物。此類植物可藉由遺傳轉型或藉由選擇含有賦予此類除草劑耐受性之突變之植物獲得。Plants and plant cultivars (obtained by genetically engineered plant biotechnology methods) which can be treated by the methods disclosed above include plant and plant cultivars which are herbicide tolerant plants, ie Or a variety of plants that are tolerant to established herbicides. Such plants can be obtained by genetic transformation or by selection of plants containing mutations conferring tolerance to such herbicides.
可藉由上文所揭示之方法處理之植物及植物栽培品種(藉由諸如遺傳工程改造之植物生物技術方法獲得)包括為昆蟲抗性轉殖基因植物之植物及植物栽培品種,亦即使得對某些靶標昆蟲之攻擊具有抗性的植物。此類植物可藉由遺傳轉型或藉由選擇含有賦予此類昆蟲抗性之突變之植物獲得。Plants and plant cultivars (obtained by genetic engineering engineering plant biotechnology methods) which can be treated by the methods disclosed above include plants and plant cultivars which are insect resistant transgenic plants, ie Some target insects attack plants that are resistant. Such plants can be obtained by genetic transformation or by selection of plants containing mutations conferring resistance to such insects.
可藉由上文所揭示之方法處理之植物及植物栽培品種(藉由諸如遺傳工程改造之植物生物技術獲得)包括對非生物逆境耐受之植物及植物栽培品種。此類植物可藉由遺傳轉型或藉由選擇含有賦予此類逆境抗性之突變之植物來獲得。Plants and plant cultivars (obtained by genetic engineering engineering plant biotechnology) that can be treated by the methods disclosed above include plants and plant cultivars that are resistant to abiotic stresses. Such plants can be obtained by genetic transformation or by selection of plants containing mutations conferring resistance to such stress.
可藉由上文所揭示之方法處理之植物及植物栽培品種(藉由諸如遺傳工程改造之生物技術方法獲得)包括展示更改所收集產物之數量數目、品質及/或儲存穩定性及/或更改所收集產物之特定成分之特性的植物及植物栽培品種。Plants and plant cultivars (obtained by biotechnological methods such as genetic engineering) that can be treated by the methods disclosed above include displaying the number, quality and/or storage stability and/or alteration of the products collected. Plant and plant cultivars that characterize the specific components of the product collected.
可藉由上文所揭示之方法處理之植物及植物栽培品種(藉由諸如遺傳工程改造之植物生物技術方法獲得)包括具有經更改彈性纖維特徵之植物及植物栽培品種(諸如棉植物)。此類植物可藉由遺傳轉型或藉由選擇含有賦予此類經更改纖維特徵之突變之植物獲得。Plants and plant cultivars (obtained by genetically engineered plant biotechnology methods) that can be treated by the methods disclosed above include plants and plant cultivars (such as cotton plants) having altered elastic fiber characteristics. Such plants can be obtained by genetic transformation or by selection of plants containing mutations that confer such altered fiber characteristics.
可藉由上文所揭示之方法處理之植物或植物栽培品種(藉由諸如遺傳工程改造之植物生物技術方法獲得)包括具有經更改油型態特徵之植物及植物栽培品種,諸如油菜或相關甘藍型植物。此類植物可藉由遺傳轉型或藉由選擇含有賦予此類經更改油型態特徵之突變之植物來獲得。Plant or plant cultivars (obtained by genetic engineering engineering plant biotechnology methods) which can be treated by the methods disclosed above, include plants and plant cultivars having altered oil profile characteristics, such as canola or related cabbage Type of plant. Such plants can be obtained by genetic transformation or by selection of plants containing mutations that confer such altered oil profile characteristics.
可藉由上文所揭示之方法處理之植物或植物栽培品種(可藉由諸如遺傳工程改造之植物生物技術方法獲得)包括具有經更改落粒特徵之植物及植物栽培品種,諸如油菜或相關甘藍型植物。此類植物可藉由遺傳轉型或藉由選擇含有賦予此類經更改落粒性特徵之突變之植物來獲得,且包括具有延時或經降低落粒性之植物,諸如油菜植物。Plants or plant cultivars which can be treated by the methods disclosed above (obtainable by means of genetic engineering engineering such as plant biotechnology) include plants and plant cultivars having altered grain size characteristics, such as canola or related cabbage Type of plant. Such plants can be obtained by genetic transformation or by selection of plants containing mutations that confer such altered shattering characteristics, and include plants having a delayed or reduced shredding property, such as a canola plant.
可藉由上文所揭示之方法處理之植物及植物栽培品種(藉由諸如遺傳工程改造之植物生物技術方法獲得)包括具有經更改轉譯後蛋白質修飾模式之植物及植物栽培品種,諸如菸草植物。Plants and plant cultivars (obtained by genetic engineering engineering plant biotechnology methods) that can be treated by the methods disclosed above include plants and plant cultivars, such as tobacco plants, having altered post-translational protein modification patterns.
病原體及病害
上文所揭示之方法可用於控制引起病害之微生物,尤其植物病原性微生物,諸如植物病原性真菌,諸如:
由白粉病病原體引起之病害,該等白粉病病原體係諸如:白粉病菌(Blumeria)屬(例如禾本科布氏白粉菌(Blumeria graminis))、叉絲單囊殼(Podosphaera)屬(例如白叉絲單囊殼(Podosphaera leucotricha))、單絲殼(Sphaerotheca)屬(例如單絲殼白粉菌(Sphaerotheca fuliginea))、鉤絲殼(Uncinula)屬(例如葡萄白粉病菌(Uncinula necator));
由銹病病原體引起之病害,該等銹病病原體為諸如膠鏽菌(Gymnosporangium)屬(例如褐色膠鏽菌(Gymnosporangium sabinae))、駝孢鏽菌(Hemileia)屬(例如咖啡駝孢鏽菌(Hemileia vastatrix))、層鏽菌(Phakopsora)屬(例如大豆鏽菌(Phakopsora pachyrhizi)或層鏽層假尾孢菌(Phakopsora meibomiae))、柄鏽菌(Puccinia)屬(例如麥類葉銹病菌(Puccinia recondita)、禾柄鏽菌(Puccinia graminis)或條形柄鏽菌(Puccinia striiformis))、單孢鏽菌(Uromyces)屬(例如菜豆銹病菌Uromyces appendiculatus));
由自卵菌群組之病原體引起之病害,該等病原體係諸如白鏽菌(Albugo)屬(例如白鏽菌(Albugo candida))、萵苣露菌病菌(Bremia)屬(例如萵苣露菌(Bremia lactucae))、霜黴菌(Peronospora)屬(例如豌豆霜黴菌(Peronospora pisi)或甘藍霜黴菌(P. brassicae))、疫黴菌(Phytophthora)屬(例如致病疫黴菌(Phytophthora infestans))、單軸黴(Plasmopara)屬(例如葡萄生單軸黴(Plasmopara viticola))、假霜黴(Pseudoperonospora)屬(例如葎草假霜黴(Pseudoperonospora humuli)或黃瓜假霜黴(Pseudoperonospora cubensis))、腐黴菌(Pythium)屬(例如終極腐黴菌(Pythium ultimum));
由例如以下引起之葉斑病病害及葉片萎蔫病害:交鏈孢(Alternaria)屬(例如立枯交鏈孢菌(Alternaria solani))、尾孢菌(Cercospora)屬(例如甜菜尾孢菌(Cercospora beticola))、黑星病菌(Cladiosporium)屬(例如黃瓜黑星病菌(Cladiosporium cucumerinum))、旋孢腔菌(Cochliobolus)屬(例如禾旋孢腔菌(Cochliobolus sativus) (分身孢子形式:內臍蠕孢(Drechslera),同義:長蠕孢(Helminthosporium))或水稻旋孢腔菌(Cochliobolus miyabeanus))、刺盤孢(Colletotrichum)屬(例如菜豆炭疽病菌(Colletotrichum lindemuthanium))、孔雀斑菌(Cycloconium)屬(例如油橄欖孔雀斑菌(Cycloconium oleaginum))、大豆北莖潰瘍菌(Diaporthe)屬(例如柑橘大豆北莖潰瘍菌(Diaporthe citri))、痂囊腔菌(Elsinoe)屬(例如柑桔痂囊腔菌(Elsinoe))、炭疽病菌(Gloeosporium)屬(例如桃炭疽病菌(Gloeosporium laeticolor))、小叢殼(Glomerella)屬(例如蘋果小叢殼(Glomerella cingulate))、球座菌(Guignardia)屬(例如葡萄球座菌(Guignardia bidwelli))、小球腔菌(Leptosphaeria)屬(例如十字花科小球腔菌(Leptosphaeria maculans))、稻瘟菌(Magnaporthe)屬(例如稻瘟菌(Magnaporthe grisea))、微結節菌(Microdochium)屬(例如雪黴葉枯病(Microdochium nivale))、球腔菌(Mycosphaerella)屬(例如禾生炭疽菌球腔菌屬(Mycosphaerella graminicola)、落花生球腔菌(Mycosphaerella arachidicola)或斐濟球腔菌(Mycosphaerella fijiensis))、葉枯病菌(Phaeosphaeria)屬(例如小麥葉枯病菌(Phaeosphaeria nodorum))、核腔菌(Pyrenophora)屬(例如大麥網斑病菌(Pyrenophora teres)或偃麥草核腔菌(Pyrenophora tritici repentis))、柱隔孢(Ramularia)屬(例如柱隔孢(Ramularia collo-cygni)或白斑柱隔孢(Ramularia areola))、雲紋病菌(Pyrenophora)屬(例如大麥雲紋病菌(Rhynchosporium secalis))、殼針孢(Septoria)屬(例如芹菜小殼針孢(Septoria apii)或番茄小殼針孢(Septoria lycopersici))、殼多孢(Stagonospora)屬(例如穎枯殼針孢(Stagonospora nodorum))、核瑚菌(Typhula)屬(例如肉孢核瑚菌(Typhula incarnate))、黑星菌(Venturia)屬(例如蘋果黑星病菌(Venturia inaequalis)),
由例如以下引起之根及莖幹病害:伏革菌(Corticium)屬(例如禾穀鐮刀菌伏革菌(Corticium graminearum))、鐮刀菌(Fusarium)屬(例如尖孢鐮刀菌(Fusarium oxysporum))、頂囊殼(Gaeumannomyces)屬(例如頂囊殼菌(Gaeumannomyces graminis))、根腫菌(Plasmodiophora)屬(例如甘藍根腫菌(Plasmodiophora brassicae))、絲核菌(Rhizoctonia)屬(例如立枯絲核菌(Rhizoctonia solani))、帚枝黴(Sarocladium)屬(例如稻帚枝黴屬(Sarocladium oryzae))、小核菌(Sclerotium)屬(例如稻小核菌(Sclerotium oryzae))、塔普斯菌(Tapesia)屬(例如,塔普斯梭狀芽胞桿菌(Tapesia acuformis))、根串珠黴(Thielaviopsis)屬(例如菸草根串珠黴屬(Thielaviopsis basicola));
由例如以下引起之穗及圓錐花序病害(包括玉米穗軸):交鏈孢屬(例如交鏈孢菌(Alternaria spp.))、麴菌(Aspergillus)屬(例如黃麴黴(Aspergillus flavus))、分枝孢子菌(Cladosporium)屬(例如枝狀分枝孢子菌(Cladosporium cladosporioides))、麥角菌(Claviceps)屬(例如菊麥角菌(Claviceps purpurea))、鐮刀菌(Fusarium)屬(例如黃色鐮刀菌(Fusarium culmorum))、赤黴菌(Gibberella)屬(例如玉米赤黴菌(Gibberella zeae))、小畫線殼(Monographella)屬(例如雪腐小畫線殼(Monographella nivalis))、殼針孢菌(Stagnospora)屬(例如穎枯殼針孢菌(Stagnospora nodorum));
由黑穗病真菌引起之病害,該等黑穗病真菌係例如蜀黍小黑穗病菌(Sphacelotheca)屬(例如玉米小黑穗病菌(Sphacelotheca reiliana))、腥黑粉菌(Tilletia)屬(例如齲齒腥黑粉菌(Tilletia caries)或小麥矮腥黑粉菌(Tilletia controversa))、條黑粉菌(Urocystis)屬(例如隱性條黑粉菌(Urocystis occulta))、黑粉菌(Ustilago)屬(例如大麥黑粉菌(Ustilago nuda));
由例如以下引起之果腐病:麴菌屬(例如黃麴黴)、葡萄孢(Botrytis)屬(例如灰葡萄孢菌(Botrytis cinerea))、青黴菌屬(例如擴展青黴(Penicillium expansum)或產紫青黴菌(Penicillium purpurogenum))、根黴菌(Rhizopus)屬(例如匍莖根黴菌(Rhizopus stolonifer))、核盤菌(Sclerotinia)屬(例如向日葵核盤菌(Sclerotinia sclerotiorum))、輪枝孢(Verticilium)屬(例如黃萎輪枝黴(Verticilium alboatrum));
例如由以下引起之種子及土壤媒介枯病及萎蔫病病害,以及幼苗之病害:交鏈孢屬(例如甘藍交鏈孢菌(Alternaria brassicicola))、絲囊黴(Aphanomyces)屬(例如兵豆絲囊黴(Aphanomyces euteiches))、殼二孢(Ascochyta)屬(例如扁豆麯黴(Ascochyta lentis))、麴菌(Aspergillus)屬(例如黃麴黴(Aspergillus flavus))、分枝孢子菌(Cladosporium)屬(例如多主枝孢黴(Cladosporium herbarum))、旋孢腔菌(Cochliobolus)屬(例如禾旋孢腔菌(Cochliobolus sativus) (分生孢子形式:內臍蠕孢、平臍蠕孢(Bipolaris)同義:長蠕孢))、刺盤孢(Colletotrichum)屬(例如粒狀刺盤孢(Colletotrichum coccodes))、鐮刀菌(Fusarium)屬(例如黃色鐮孢菌(Fusarium culmorum))、赤黴菌(Gibberella)屬(例如玉米赤黴菌(Gibberella zeae))、殼球孢(Macrophomina)屬(例如萊豆殼球孢(Macrophomina phaseolina))、微結節菌(Microdochium)屬(例如雪黴葉枯病(Microdochium nivale))、小畫線殼(Monographella)屬(例如雪腐小畫線殼(Monographella nivalis))、青黴菌屬(例如擴展青黴)、莖點黴(Phoma)屬(例如甘藍莖點黴(Phoma lingam))、莢稈枯腐(Phomopsis)屬(例如大豆莢稈枯腐病(Phomopsis sojae))、疫黴菌(Phytophthora)屬(例如三七疫黴菌(Phytophthora cactorum))、核腔菌(Pyrenophora)屬(例如大麥核腔菌(Pyrenophora graminea))、梨孢(Pyricularia)屬(例如稻梨孢(Pyricularia oryzae))、腐黴菌(Pythium)屬(例如終極腐黴(Pythium ultimum))、絲核菌(Rhizoctonia)屬(例如立枯絲核菌(Rhizoctonia solani))、根黴菌(Rhizopus)屬(例如米根黴(Rhizopus oryzae))、小核菌(Sclerotium)屬(例如莖腐病(Sclerotium rolfsii))、殼針孢(Septoria)屬(例如穎枯殼針孢(Septoria nodorum))、核瑚菌(Typhula)屬(例如小麥核瑚菌(Typhula incarnate))、輪枝菌(Verticillium)屬(例如大麗輪枝菌(Verticillium dahlia));
由例如叢赤殼(Nectria)屬(例如仁果幹癌叢赤殼菌(Nectria galligena))引起之癌症、蟲癭及叢枝病;
由例如鏈核盤菌(Monilinia)屬(例如核果鏈核盤菌(Monilinia laxa))引起之萎蔫病病害;
由例如外擔菌(Exobasidium)屬(例如壞損外擔菌(Exobasidium vexans))、外囊菌(Taphrina)屬(例如畸形外囊菌(Taphrina deformans))引起之葉片、花及果實之畸形;
由例如以下引起之木本植物之退化性病害;埃斯卡(Esca)屬(例如根黴格孢菌(Phaeomoniella chlamydospora)、褐枝頂孢黴(Phaeoacremonium aleophilum)或地中海嗜藍孢孔菌(Fomitiporia mediterranea))、靈芝(Ganoderma)屬(例如島靈芝(Ganoderma boninense));
由例如葡萄孢屬(例如灰葡萄孢菌)引起之花及種子之病害;
由例如以下引起之植物塊莖之病害:絲核菌(Rhizoctonia)屬(例如立枯絲核菌(Rhizoctonia solani))、長蠕孢(Helminthosporium)屬(例如立枯長蠕孢菌(Helminthosporium solani));
由細菌性病原體引起之病害,該等細菌性病原體係例如:黃單孢菌(Xanthomonas)屬(例如稻野油菜黃單胞菌(Xanthomonas campestris pv. Oryzae))、假單胞菌(Pseudomonas)屬(例如甜瓜丁香假單胞菌(Pseudomonas syringae pv. Lachrymans))、歐文菌(Erwinia)屬(例如解澱粉歐文菌(Erwinia amylovora))。 Pathogens and Diseases The methods disclosed above can be used to control disease-causing microorganisms, particularly phytopathogenic microorganisms, such as phytopathogenic fungi, such as:
A disease caused by a powdery mildew pathogen such as: Blumeria genus (eg, Blumeria graminis), Podosphaera genus (eg, white crosshair) a monocapsule (Podosphaera leucotricha), a genus of the genus Sphaerotheca (for example, Sphaerotheca fuliginea), a genus of Uncinula (for example, Uncinula necator);
A disease caused by a rust pathogen such as the genus Gymnosporangium (for example, Gymnosporangium sabinae) or the genus Hemileia (for example, Hemileia vastatrix) )), Phakopsora genus (such as Phakopsora pachyrhizi or Phakopsora meibomiae), Puccinia genus (such as Puccinia recondita) ), Puccinia graminis or Puccinia striiformis, Uromyces (eg Uromyces appendiculatus);
Diseases caused by pathogens from the oomycete group, such as the genus Albugo (such as Albugo candida), the genus of the genus Bremia (such as the lettuce bacterium (Bremia) Lactucae)), genus Peronospora (such as Peronospora pisi or P. brassicae), Phytophthora (such as Phytophthora infestans), uniaxial Plasmopara genus (eg Plasmopara viticola), Pseudoperonospora genus (eg Pseudoperonospora humuli or Pseudoperonospora cubensis), Pythium (Pyudoperonospora humuli) Pythium) (eg Pythium ultimum);
Leaf spot disease and leaf wilting diseases caused by, for example, Alternaria (such as Alternaria solani) and Cercospora (such as Cercospora) Beticola)), genus Cladiosporium (eg Cladiosporium cucumerinum), genus Cochliobolus (eg Cochliobolus sativus) (spore form: inner umbilical Drechslera, synonymous: Helminthosporium or Cochliobolus miyabeanus, Colletotrichum (such as Colletotrichum lindemuthanium), Cycloconium Genus (such as Cycloconium oleaginum), genus Diaporthe (such as Diaporthe citri), Elsinoe (such as citrus sac) Elsinoe, Gloeosporium (eg Gloeosporium laeticolor), Glomerella (eg Glomerella cingulate), Guignardia (eg Guignardia bidwelli), genus Leptosphaeria (eg Leptosphaeria maculans), Magnaporthe genus (eg Magnaporthe grisea) )), Microdochium genus (such as Microdochium nivale), Mycosphaerella genus (such as Mycosphaerella graminicola, Mycosphaerella) Arachidicola) or Mycosphaerella fijiensis, Phaeosphaeria (eg Phaeosphaeria nodorum), Pyrenophora genus (eg Pyrenophora teres or Pyrenophora tritici repentis, Ramularia genus (eg, Ramularia collo-cygni or Ramularia areola), Pyrenophora genus (eg Rhynchosporium secalis, Septoria genus (eg Septoria apii or Septoria lycopersici), Stagonospora genus (eg Ying) Stagonospora nodorum, Typhula genus (eg Typhula incarnate), Venturia genus (eg Venturia inaequalis),
Root and stem diseases caused by, for example, the genus Corticium (for example, Corticium graminearum) and the genus Fusarium (for example, Fusarium oxysporum) , the genus of the genus Gaeumannomyces (eg, Gaeumannomyces graminis), the genus Plasmodiophora (such as Plasmodiophora brassicae), the genus Rhizoctonia (eg, Rhizoctonia solani, Sarocladium genus (such as Sarocladium oryzae), Sclerotium genus (such as Sclerotium oryzae), Tap a genus of Tapesia (for example, Tapesia acuformis), a genus Thielaviopsis (for example, Thielaviopsis basicola);
Ear and panicle diseases (including corn cobs) caused by, for example, the following species: Alternaria (such as Alternaria spp.), Aspergillus (such as Aspergillus flavus) , Cladosporium genus (such as Cladosporium cladosporioides), Claviceps genus (such as Claviceps purpurea), Fusarium genus (for example) Fusarium culmorum), Gibberella genus (eg Gibberella zeae), Monographella genus (eg Monographella nivalis), shell needle Stagnospora genus (eg Stagnospora nodorum);
A disease caused by smut fungi, such as the genus Sphacelotheca (such as Sphacelotheca reiliana) and the genus Tilletia (such as caries) Tilletia caries or Tilletia controversa, Urocystis genus (eg Urocystis occulta), Ustilago genus (eg, Ustilago nuda);
Fruit rot caused by, for example, the genus Fusarium (such as Aspergillus), the genus Botrytis (such as Botrytis cinerea), the genus Penicillium (such as Penicillium expansum) Penicillium purpurogenum, Rhizopus genus (eg Rhizopus stolonifer), Sclerotinia genus (eg Sclerotinia sclerotiorum), Verticillium sp. Verticilium) (eg Verticilium alboatrum);
For example, seed and soil vector blight and wilt disease caused by the following diseases, as well as seedling diseases: Alternaria (such as Alternaria brassicicola), Aphanomyces (such as Beans) Aphanomyces euteiches, Ascochyta genus (eg Ascochyta lentis), Aspergillus genus (eg Aspergillus flavus), Cladosporium genus (eg Cladosporium herbarum), genus Cochliobolus (eg Cochliobolus sativus (conidial form: Helminthosporium, Bipolaris) Synonymous: Helminthosporium)), Colletotrichum (such as Colletotrichum coccodes), Fusarium (such as Fusarium culmorum), Gibberella Genus (eg Gibberella zeae), Macrophomina (eg Macrophomina phaseolina), Microdochium genus (eg, Microdochium nivale) )), small line shell (Monographella) genus (example Such as Monographella nivalis, Penicillium (such as Penicillium expansum), Phoma genus (such as Phoma lingam), Phomopsis genus (Phomopsis) For example, Phomopsis sojae, Phytophthora (such as Phytophthora cactorum), Pyrenophora (such as Pyrenophora graminea), Pyricularia (such as Pyricularia oryzae), Pythium (Pythium ultimum), Rhizoctonia (such as Rhizoctonia) Solani)), Rhizopus genus (eg Rhizopus oryzae), Sclerotium genus (eg Sclerotium rolfsii), Septoria genus (eg sage) Septoria nodorum, Typhula genus (eg Typhula incarnate), Verticillium genus (eg Verticillium dahlia);
A cancer, worm, and arbuscular disease caused by, for example, the genus Nectria (for example, Nectria galligena);
a wilt disease caused by, for example, the genus Monilinia (for example, Monilinia laxa);
Deformation of leaves, flowers and fruits caused by, for example, the genus Exobasidium (e.g., Exobasidium vexans), the genus of Taphrina (e.g., Taphrina deformans);
Degenerative diseases of woody plants caused by, for example, Esca (eg Phaeomoniella chlamydospora, Phaeeocremonium aleophilum or Fomitiporia) Mediterranea)), Ganoderma genus (eg Ganoderma boninense);
a disease caused by flowers and seeds caused by, for example, Botrytis (such as Botrytis cinerea);
A disease caused by, for example, plant tubers of the following species: Rhizoctonia genus (eg Rhizoctonia solani), Helminthosporium genus (eg Helminthosporium solani) ;
A disease caused by a bacterial pathogen such as Xanthomonas (such as Xanthomonas campestris pv. Oryzae) or Pseudomonas (eg, Pseudomonas syringae pv. Lachrymans), Erwinia (eg, Erwinia amylovora).
種子處理 用於控制不合需要之微生物之方法可用以保護種子免受植物病原性微生物,諸如真菌影響。Seed Treatment Methods for controlling undesirable microorganisms can be used to protect seeds from phytopathogenic microorganisms, such as fungi.
如本文所使用,術語「種子」包括休眠種子、滲調的種子(primed seed)、預發芽種子及具有萌出的根及葉片之種子。As used herein, the term "seed" includes dormant seeds, primed seeds, pre-germinated seeds, and seeds having erupted roots and leaves.
因此,本發明亦關於用於保護種子及/或作物免受不合需要之微生物(諸如細菌或真菌)影響之方法,其包含用一或多種式(I)化合物或包含其之組合物處理該等種子之步驟。用一或多種式(I)化合物或包含其之組合物處理種子,不僅保護種子免受植物病原性微生物影響,且亦保護發芽植物、所萌出的幼苗及出苗後之植物。Accordingly, the present invention also relates to a method for protecting seeds and/or crops from undesirable microorganisms, such as bacteria or fungi, comprising treating the compounds with one or more compounds of formula (I) or compositions comprising the same The steps of the seed. Treatment of the seed with one or more compounds of formula (I) or compositions comprising the same not only protects the seed from phytopathogenic microorganisms, but also protects the germinating plants, the erupted seedlings and the plants after emergence.
種子處理可在播種之前、播種時或播種不久後進行。Seed treatment can be carried out before sowing, at the time of sowing or shortly after sowing.
當種子處理在播種之前進行(例如所謂的種子上施加)時,種子處理可如下執行:種子可置放於具有所需量之一或多種式(I)化合物或包含其之組合物(按原樣或在稀釋之後)的混合器中,將種子與該一或多種式(I)化合物或包含其之組合物混合,直至達成種子上之均質分佈。適當時,則可將種子乾燥。When the seed treatment is carried out prior to sowing (for example on a so-called seed application), the seed treatment can be carried out as follows: the seed can be placed in a desired amount of one or more compounds of the formula (I) or a composition comprising the same (as is Or in a mixer after dilution, the seed is mixed with the one or more compounds of formula (I) or a composition comprising the same until a homogeneous distribution on the seed is achieved. The seeds can be dried as appropriate.
本發明亦關於用一或多種式(I)化合物或包含其之組合物處理的種子。如上文所述,使用經處理種子使得不僅保護播種之前及之後之種子免受不合需要之微生物(諸如植物病原性真菌)影響,而且亦使得保護自該等經處理種子萌出之發芽植物及幼小幼苗。由有害生物體引起之對農作物的較大部分損害係藉由種子在播種之前或植物發芽之後的感染來觸發。由於生長中的植物之根及芽特別地敏感,所以此階段特別地關鍵,且甚至較小損害亦可引起植物死亡。The invention also relates to seeds treated with one or more compounds of formula (I) or compositions comprising the same. As described above, the use of treated seeds not only protects the seeds before and after sowing from undesirable microorganisms (such as phytopathogenic fungi), but also protects the germinating plants and young seedlings elicited from the treated seeds. . A large part of the damage to the crop caused by the harmful organism is triggered by the infection of the seed before sowing or after the plant has sprouted. Since the roots and shoots of growing plants are particularly sensitive, this stage is particularly critical and even minor damage can cause plant death.
因此,本發明亦關於用於保護種子、發芽植物及所萌出的幼苗之方法,更一般而言關於用於保護作物免受植物病原性微生物影響之方法,該方法包含使用藉由一或多種式(I)化合物或包含其之組合物處理之種子的步驟。Accordingly, the present invention also relates to methods for protecting seeds, germinating plants, and erupted seedlings, and more generally to methods for protecting crops from phytopathogenic microorganisms, the method comprising using one or more (I) a step of a compound or a seed treated with a composition thereof.
較佳地,種子在處理過程中不出現損害之足夠穩定之狀態下處理。一般而言,種子可在收穫與播種後不久之間的任何時間進行處理。習用使用已自植物分離且自穗軸、殼、梗、外皮、毛或果實之果肉釋放的種子。舉例而言,有可能使用已收穫、清潔及經乾燥至水分含量降至小於15重量%的種子。或者,亦有可能使用在乾燥之後例如已用水處理且隨後再次乾燥的種子、或剛好滲調後之種子、或儲存於滲調條件下之種子或預發芽種子、或在育苗盤、條帶或紙張上播種之種子。Preferably, the seed is treated in a state where the damage is not sufficiently stable during the treatment. In general, the seed can be processed at any time between harvesting and shortly after sowing. Seeds that have been isolated from plants and released from the flesh of the cob, shell, stem, rind, hair or fruit are used conventionally. For example, it is possible to use seeds that have been harvested, cleaned and dried to a moisture content of less than 15% by weight. Alternatively, it is also possible to use seeds which have been treated after drying, for example, have been treated with water and subsequently dried again, or seeds which have just been conditioned, or seeds or pre-germinated seeds stored under osmotic conditions, or in seedling trays, strips or Seeds sowed on paper.
施加至種子之一或多種式(I)化合物或包含其之組合物之量,通常為使得種子發芽不減弱或所得植物不損害之量。此必須特別地確定,以防活性成分在某些施加量下將呈現植物毒性效應。當確定待施加至種子之一或多種式(I)化合物或包含其之組合物之量,以便以最小量之正採用的一或多種式(I)化合物或包含其之組合物達成最佳種子及發芽植物保護時,亦應考量轉殖基因植物之固有表現型。The amount applied to one or more of the compounds of formula (I) or a composition comprising the same is generally such that the germination of the seed does not diminish or the resulting plant does not. This must be specifically determined to prevent the active ingredient from exhibiting a phytotoxic effect at certain applied levels. When determining the amount of one or more compounds of formula (I) to be applied to the seed or a composition comprising the same, in order to achieve optimal seed with a minimum amount of one or more compounds of formula (I) or compositions comprising the same In the protection of germinating plants, the intrinsic phenotype of the transgenic plants should also be considered.
如上文所示,式(I)化合物可按原樣直接施加於種子,亦即不使用任何其他組分且尚未稀釋,或可施加包含式(I)化合物之組合物。較佳地,將呈任何適合形式之組合物施加至種子。合適的調配物之實例包括溶液、乳化液、懸浮液、粉末、泡沫、漿料或與種子之其他披衣組合物(coating composition)組合,該等披衣組合物係諸如成膜材料、粒化材料、精細鐵或其他金屬粉末、顆粒、用於使種子不活化之披衣材料以及ULV調配物。調配物可為即用調配物或可為需要在使用之前稀釋之濃縮物。As indicated above, the compound of formula (I) can be applied directly to the seed as it is, i.e. without any other components and without dilution, or a composition comprising a compound of formula (I) can be applied. Preferably, the composition in any suitable form is applied to the seed. Examples of suitable formulations include solutions, emulsions, suspensions, powders, foams, slurries or other coating compositions in combination with such coating compositions, such as film forming materials, granulation Materials, fine iron or other metal powders, granules, drapes for inactivation of seeds, and ULV formulations. The formulation may be a ready-to-use formulation or may be a concentrate that needs to be diluted prior to use.
此等調配物以已知方式來製備,例如藉由將活性成分或其混合物與習用添加劑混合,該等添加劑例如:習用增量劑及溶劑或稀釋劑、染料、潤濕劑、分散劑、乳化劑、消泡劑、防腐劑、二次增稠劑、黏性劑、赤黴素以及水。These formulations are prepared in a known manner, for example by mixing the active ingredient or mixtures thereof with conventional additives such as conventional extenders and solvents or diluents, dyes, wetting agents, dispersing agents, emulsifications. Agents, defoamers, preservatives, secondary thickeners, viscosifiers, gibberellins and water.
此等調配物以已知方式來製備,藉由將活性成分或活性成分組合與習用添加劑混合,該等添加劑係例如:習用增量劑及溶劑或稀釋劑、染料、潤濕劑、分散劑、乳化劑、消泡劑、防腐劑、二次增稠劑、黏性劑、赤黴素以及水。These formulations are prepared in a known manner by combining the active ingredient or active ingredient in admixture with conventional additives such as conventional extenders and solvents or diluents, dyes, wetting agents, dispersing agents, Emulsifiers, defoamers, preservatives, secondary thickeners, viscosifiers, gibberellins and water.
可以種子拌藥調配物形式存在之適用染料係此類目的習用之所有染料。有可能使用微溶於水之顏料或可溶於水之染料。實例包括已知名稱為玫瑰紅B(Rhodamine B)、C.I.顏料紅112及C.I.溶劑紅1之染料。可以種子拌藥調配物形式存在之適用濕潤劑係促使濕潤且習知地用於活性農用化學成分之調配物的所有物質。較佳可使用的係萘磺酸烷酯,諸如萘磺酸二異丙酯或萘磺酸二異丁酯。可以種子拌藥調配物形式存在之有用分散劑及/或乳化劑係習知地用於活性農用化學成分之調配物的非離子分散劑、陰離子分散劑及陽離子分散劑。較佳可使用的係非離子分散劑或陰離子分散劑或非離子分散劑或陰離子分散劑之混合物。適用的非離子分散劑尤其包括環氧乙烷/環氧丙烷嵌段共聚物、烷基苯酚聚二醇醚及三苯乙烯基苯酚聚二醇醚及其磷酸鹽化或硫酸鹽化的衍生物。合適的陰離子分散劑尤其係木素磺酸鹽、聚丙烯酸鹽及芳基磺酸鹽/甲醛縮合物。可以種子拌藥調配物形式存在之消泡劑係習知地用於活性農用化學成分之調配物的所有泡沫抑制物質。較佳地可使用聚矽氧消泡劑及硬脂酸鎂。可以種子拌藥調配物形式存在之防腐劑係可用於農用化學組合物之此類目的之所有物質。實例包括二氯酚及苯甲醇半縮甲醛。可以種子拌藥調配物形式存在之二次增稠劑係可用於農用化學組合物之此類目的之所有物質。較佳實例包括纖維素衍生物、丙烯酸衍生物、黃原膠、改質的黏土及經細微粉碎二氧化矽。可以種子拌藥調配物形式存在之黏性劑係可用於種子拌藥產品之所有習用黏合劑。較佳實例包括聚乙烯吡咯啶酮、聚乙酸乙烯酯、聚乙烯醇及甲基纖維素。Suitable dyes which may be present in the form of a seed dressing formulation are all dyes customary for such purposes. It is possible to use a slightly water-soluble pigment or a water-soluble dye. Examples include dyes known under the names Rhodamine B, C.I. Pigment Red 112, and C.I. Solvent Red 1. Suitable humectants which may be present in the form of a seed cocktail formulation are those which promote moist and conventional use in the formulation of active agrochemical ingredients. An alkyl naphthalenesulfonate such as diisopropyl naphthalenesulfonate or diisobutyl naphthalenesulfonate can be preferably used. Useful dispersing agents and/or emulsifiers which may be present in the form of a seed-mixing formulation are conventionally employed as nonionic dispersing agents, anionic dispersing agents and cationic dispersing agents for the formulation of active agrochemical ingredients. A nonionic dispersant or an anionic dispersant or a mixture of a nonionic dispersant or an anionic dispersant may preferably be used. Suitable nonionic dispersants include, in particular, ethylene oxide/propylene oxide block copolymers, alkylphenol polyglycol ethers and tristyrylphenol polyglycol ethers and their phosphated or sulfated derivatives. . Suitable anionic dispersants are, in particular, lignosulfonates, polyacrylates and arylsulfonate/formaldehyde condensates. Defoamers which may be present in the form of a seed cocktail formulation are conventionally used in all foam inhibiting substances of formulations of active agrochemical ingredients. Preferably, a polydecane defoamer and magnesium stearate can be used. Preservatives which may be in the form of a seed dressing formulation are all materials which can be used for such purposes of agrochemical compositions. Examples include dichlorophenol and benzyl alcohol hemiformal. Secondary thickeners which may be present in the form of a seed dressing formulation are all materials which are useful for such purposes of agrochemical compositions. Preferred examples include cellulose derivatives, acrylic acid derivatives, xanthan gum, modified clay, and finely divided cerium oxide. The viscous agent which can be present in the form of a seed dressing formulation can be used in all conventional adhesives for seed dressing products. Preferred examples include polyvinylpyrrolidone, polyvinyl acetate, polyvinyl alcohol, and methyl cellulose.
式(I)化合物及包含其之組合物適用於保護用於農業、溫室、森林或園藝中之任何植物種類的種子。更特定言之,種子係穀類(諸如小麥、大麥、粗麥、栗、黑小麥及燕麥)、油菜、玉米、棉、大豆、水稻、馬鈴薯、向日葵、菜豆、咖啡、豌豆、甜菜(例如糖用甜菜及飼料甜菜)、花生、蔬菜(諸如番茄、胡瓜、洋蔥及萵苣)、草坪及觀賞植物。特別重要的係小麥、大豆、油菜、玉米及水稻之種子的處理。The compounds of formula (I) and compositions comprising the same are suitable for use in protecting seeds of any plant species used in agriculture, in greenhouses, in forests or in horticulture. More specifically, seeds are cereals (such as wheat, barley, rye, chestnut, triticale, and oats), canola, corn, cotton, soybeans, rice, potatoes, sunflowers, kidney beans, coffee, peas, and beets (such as sugar). Beets and fodder beets), peanuts, vegetables (such as tomatoes, courgettes, onions and lettuce), lawns and ornamental plants. Of particular importance are the treatment of seeds of wheat, soybeans, canola, corn and rice.
式(I)化合物或包含其之組合物可用於處理轉殖基因種子,尤其能夠表現蛋白質之植物的種子,該蛋白質針對有害生物、除草損害或非生物性逆境起作用,由此增加保護作用。協同效應亦可出現於與藉由表現形成之物質之相互作用中。The compounds of formula (I) or compositions comprising the same can be used to treat seed of a transgenic gene, in particular a plant capable of expressing a protein, which acts against pests, herbicidal damage or abiotic stresses, thereby increasing protection. Synergistic effects can also occur in interactions with substances formed by expression.
施加 本發明化合物可按原樣或例如以以下形式施加:即用溶液、乳液、水基或油基懸浮液、粉末、可濕潤粉末、糊狀物、可溶粉末、粉塵、可溶顆粒、用於散佈之顆粒、懸乳劑濃縮物、用本發明化合物浸漬之天然產物、用本發明化合物浸漬之合成物質、肥料或聚合物質中之微膠囊劑。The application of the compounds of the invention can be carried out as such or, for example, in the form of solutions, emulsions, aqueous or oil-based suspensions, powders, wettable powders, pastes, soluble powders, dusts, soluble granules, Dispersed granules, suspoemulsion concentrates, natural products impregnated with the compounds of the invention, synthetic materials impregnated with the compounds of the invention, fertilizers or microcapsules in polymeric materials.
以習用方式,例如藉由澆水、噴灑、霧化、散佈、撒粉、發泡、塗抹及其類似方式實現施加。亦可藉由超低量方法經由滴灌系統或灌溉施加來部署本發明化合物,以沿溝施加或將其噴射至田埂或土埂中。另外可藉助於傷口密封、塗層或其他傷口敷裹來施加本發明化合物。The application is effected in a conventional manner, for example by watering, spraying, atomizing, spreading, dusting, foaming, smearing and the like. The compounds of the invention may also be deployed by ultra-low volume methods via a drip irrigation system or irrigation application to apply or spray them along the furrow into the field or soil. In addition, the compounds of the invention may be applied by means of wound seals, coatings or other wound dressings.
施加至植物、植物部分、果實、種子或土壤之本發明化合物之有效量及植物可相容之量將視各種因素而定,諸如所採用化合物/組合物、處理對象(植物、植物部分、果實、種子或土壤)、處理類型(撒粉、噴灑、種子拌藥)、處理目的(治癒性及保護性)、微生物類型、微生物發展階段、微生物敏感性、作物生長階段及環境條件。The effective amount and plant compatible amount of the compound of the present invention applied to plants, plant parts, fruits, seeds or soil will depend on various factors such as the compound/composition employed, the treated subject (plant, plant part, fruit) , seed or soil), type of treatment (dusting, spraying, seed mixing), treatment purpose (curative and protective), microbial type, microbial development stage, microbial sensitivity, crop growth stage and environmental conditions.
當本發明化合物用作殺真菌劑時,施加量可在相對廣範圍內變化,該範圍視施加種類而定。對於處理植物部分(諸如葉片),施加量可在0.1至10 000 g/ha,較佳10至1000 g/ha,更佳50至300 g/ha範圍內(在藉由澆水或滴注施加之情況下,甚至可降低施加量,尤其在使用諸如石棉或珍珠岩之惰性基質時)。對於處理種子,施加量可在0.1至200公克/100公斤種子,較佳1至150公克/100公斤種子,更佳2.5至25公克/100公斤種子,甚至更佳2.5至12.5公克/100公斤種子範圍內。對於處理土壤,施加量可在0.1至10 000 g/ha,較佳1至5000 g/ha範圍內。When the compound of the present invention is used as a fungicide, the amount applied can vary within a relatively wide range depending on the type of application. For treating plant parts such as leaves, the application amount may be in the range of 0.1 to 10 000 g/ha, preferably 10 to 1000 g/ha, more preferably 50 to 300 g/ha (applied by watering or dripping) In this case, the amount applied can be even reduced, especially when using an inert substrate such as asbestos or perlite. For the treatment of seeds, the application amount may be from 0.1 to 200 g/100 kg of seed, preferably from 1 to 150 g/100 kg of seed, more preferably from 2.5 to 25 g/100 kg of seed, even more preferably from 2.5 to 12.5 g/100 kg of seed. Within the scope. For treating the soil, the amount applied may be in the range of 0.1 to 10 000 g/ha, preferably 1 to 5000 g/ha.
此等施加量僅係實例且並不意欲限制本發明之範疇。The amounts applied are merely examples and are not intended to limit the scope of the invention.
材料保護 本發明之化合物及組合物亦可用於保護材料,尤其用於保護以避免不合需要之微生物之攻擊及破壞的工業材料。Material Protection The compounds and compositions of the present invention can also be used to protect materials, particularly industrial materials that are protected from attack and damage by undesirable microorganisms.
另外,本發明之化合物及組合物可單獨或與其他活性成分組合用作防污組合物。Additionally, the compounds and compositions of the present invention can be used as antifouling compositions, either alone or in combination with other active ingredients.
本上下文中之工業材料應理解為意謂已經製備以用於工業中的非生物材料。舉例而言,待保護以免受微生物改變或破壞影響之工業材料可為黏著劑、膠、紙張、牆紙及紙板/卡紙板、紡織物、地毯、皮革、原木、纖維及紙巾、塗料及塑膠製品、冷卻潤滑劑及可受微生物影響或破環之其他材料。亦可在待保護之材料的範疇內提及會因微生物之增殖而受損的生產設備及建築物之部分(例如水冷卻電路、冷卻及加熱系統以及通風及空調單元)。本發明範疇內之工業材料較佳包括黏著劑、膠料、紙張及卡片、皮革、原木、塗料、冷卻潤滑劑及熱傳遞流體,更佳原木。Industrial materials in this context are understood to mean non-biological materials that have been prepared for use in the industry. For example, industrial materials to be protected from microbial changes or damage can be adhesives, glues, paper, wallpaper and cardboard/cardboard, textiles, carpets, leather, logs, fibers and paper towels, paints and plastics, Cooling lubricants and other materials that can be affected or broken by microorganisms. It is also possible to mention in the context of the material to be protected the production equipment and parts of the building that are damaged by the proliferation of microorganisms (eg water cooling circuits, cooling and heating systems, and ventilation and air conditioning units). Industrial materials within the scope of the present invention preferably include adhesives, sizes, papers and cards, leather, logs, paints, cooling lubricants and heat transfer fluids, and better logs.
本發明之化合物及組合物可防止副作用,諸如腐敗、腐爛、脫色或黴菌形成。The compounds and compositions of the present invention prevent side effects such as spoilage, rot, discoloration or mold formation.
在處理原木之情況下,亦可使用本發明之化合物及組合物對抗易在木材上或內部生長之真菌性病害。In the case of processing logs, the compounds and compositions of the invention may also be used to combat fungal diseases that are susceptible to growth on or in wood.
木材意謂所有類型之原木物種,及欲用於建築之此原木之所有加工類型,例如實心原木、高密度原木、層壓原木板及膠合板。另外,本發明之化合物及組合物可用以保護與鹽水或微咸水形成接觸之物件(尤其為皮、螢幕、網、構造、系泊船及傳信系統)免於積垢。Wood means all types of logs, and all types of processing of the logs to be used in construction, such as solid logs, high-density logs, laminated logs and plywood. Additionally, the compounds and compositions of the present invention can be used to protect articles (especially skins, screens, nets, construction, mooring boats, and signaling systems) that come into contact with saline or brackish water from fouling.
本發明之化合物及組合物亦可用於保護儲存貨物。應將儲存貨物理解為意謂蔬菜或動物來源之天然物質或其經處理產品,其具有天然來源且需要長期保護。蔬菜來源之儲存貨物(例如植物或植物部分,諸如莖稈、葉片、塊莖、種子、果實、穀粒)可在剛收穫後或在藉由(預)乾燥、濕潤、粉碎、研磨、按壓或焙烤之處理後受到保護。儲存貨物亦包括木材,其未經處理(諸如建築木材、電線桿及障壁)或呈成品形式(諸如傢俱)。動物來源之儲存貨物係例如獸皮、皮革、皮草及毛髮。本發明之化合物及組合物可防止副作用,諸如腐敗、腐爛、脫色或黴菌形成。The compounds and compositions of the invention may also be used to protect stored goods. A stored good should be understood to mean a natural substance of vegetable or animal origin or a processed product thereof that has a natural source and requires long-term protection. Storage goods from vegetable sources (eg plant or plant parts such as stalks, leaves, tubers, seeds, fruits, grains) may be dried, wetted, comminuted, ground, pressed or baked just after harvesting or by (pre) drying It is protected after treatment. The stored goods also include wood, which is untreated (such as construction timber, utility poles and barriers) or in finished form (such as furniture). Storage goods of animal origin are, for example, hides, leather, fur and hair. The compounds and compositions of the present invention prevent side effects such as spoilage, rot, discoloration or mold formation.
能夠降解或更改工業材料之微生物包括(例如)細菌、真菌、酵母、藻類及黏液生物體。本發明之化合物及組合物較佳對真菌、尤其黴菌、原木脫色及原木毀壞真菌(子囊菌(Ascomycetes )、擔子菌(Basidiomycetes )、半知菌(Deuteromycetes )及接合菌(Zygomycetes ))且對黏液生物體及藻類起作用。實例包括以下屬之微生物:交鏈孢屬,諸如美洲留蘭香交鏈孢屬(Alternaria tenuis );麴菌屬,諸如黑麯黴(Aspergillus niger );毛殼菌屬(Chaetomium ),諸如球毛殼菌屬(Chaetomium globosum );粉孢革菌屬(Coniophora ),諸如單純粉孢革菌屬(Coniophora puetana );香菇屬(Lentinus ),諸如虎皮香菇屬(Lentinus tigrinus );青黴菌屬,諸如灰綠青黴菌(Penicillium glaucum );多孔菌屬(Polyporus ),諸如變色多孔菌(Polyporus versicolor );短梗黴屬(Aureobasidium ),諸如出芽短梗黴菌(Aureobasidium pullulans );核莖點黴屬(Sclerophoma ),諸如綠頂核莖點黴(Sclerophoma pityophila );木黴菌屬(Trichoderma ),諸如綠色木黴菌屬(Trichoderma viride );長喙殼菌(Ophiostoma spp. );長喙殼屬(Ceratocystis spp. );腐殖菌屬(Humicola spp. );石座菌屬(Petriella spp. );毛束黴屬(Trichurus spp.) ;革蓋菌屬(Coriolus spp. );黏褶菌屬(Gloeophyllum spp. );側耳屬(Pleurotus spp. );臥孔菌屬(Poria spp. );蟠龍介屬(Serpula spp. )及乾酪菌屬(Tyromyces spp. );分枝孢子菌屬(Cladosporium spp. );擬青黴菌屬(Paecilomyces spp. );白黴菌屬(Mucor spp. );埃希氏桿菌屬(Escherichia ),諸如大腸桿菌(Escherichia coli );假單胞菌屬(Pseudomonas ),諸如綠膿桿菌(Pseudomonas aeruginosa );葡萄球菌屬(Staphylococcus ),諸如金黃色葡萄球菌(Staphylococcus aureus );念珠菌屬(Candida spp. )及酵母屬(Saccharomyces spp .),諸如釀酒酵母(Saccharomyces cerevisae )。Microorganisms capable of degrading or modifying industrial materials include, for example, bacteria, fungi, yeast, algae, and mucous organisms. Compounds and compositions of the present invention is preferred to fungi, in particular molds, wood and wood destroying fungi bleaching (aurantiacus (Ascomycetes), Basidiomycetes (Basidiomycetes), fungi imperfecti (, Deuteromycetes) and Zygomycetes (Zygomycetes)) and for mucus Organisms and algae work. Examples include microorganisms of the genus: the genus Alternaria, such as Alternaria tenuis ; the genus Fusarium, such as Aspergillus niger ; Chaetomium , such as Chaetomium Genus ( Ceatomium globosum ); Coniophora , such as Coniophora puetana ; Lentinus , such as Lentinus tigrinus ; Penicillium, such as gray-green Penicillium glaucum ; Polyporus , such as Polyporus versicolor ; Aureobasidium , such as Aureobasidium pullulans ; Sclerophoma , such as a green roof nuclear Phoma (Sclerophoma pityophila); Trichoderma sp. (Trichoderma), such as Trichoderma viride sp. (Trichoderma viride); fungus Ceratocystis (Ophiostoma spp.); Ceratocystis (Ceratocystis spp.); rot Humicola spp .; Petriella spp .; Trichurus spp .; Coriolus spp .; Gloeophyl Lum spp. ); Pleurotus spp .; Poria spp .; Serpula spp. and Tyromyces spp .; Cladosporium spp. ); the genus Paecilomyces (Paecilomyces spp);. white Streptomyces (Mucor spp);. genus Escherichia (Escherichia), such as E. coli (Escherichia coli); Pseudomonas (Pseudomonas), such as Pseudomonas aeruginosa bacillus (Pseudomonas aeruginosa); Staphylococcus (Staphylococcus), such as Staphylococcus aureus (Staphylococcus aureus); (. Candida spp) Candida and Saccharomyces, such as Saccharomyces cerevisiae (Saccharomyces cerevisae) (Saccharomyces spp. ).
可根據以下實例來進一步理解本發明教示之態樣,該等實例不應視為以任何方式限制本發明教示之範疇。
實例 The teachings of the present invention are further understood by the following examples, which are not to be construed as limiting the scope of the teachings of the present invention.
Instance
與本文下文所揭示且根據本文所揭示方法之通用描述之實例類似,已獲得表1a中所示之式(I)化合物。
Similar to the examples disclosed herein below and in accordance with the general description of the methods disclosed herein, the compounds of formula (I) shown in Table 1a have been obtained.
在表1a中,logP值係根據EEC Directive 79/831 Annex V.A8,藉由HPLC (高效液相層析)在逆相管柱(C 18)上,使用下文所述方法測定:In Table 1a, the logP values were determined by HPLC (High Performance Liquid Chromatography) on a reverse phase column (C18) using the method described below according to EEC Directive 79/831 Annex V.A8:
[a] 方法A:溫度:40℃;移動相:0.1%甲酸水溶液及乙腈水溶液;線性梯度:10%乙腈至95%乙腈; [a] Method A: temperature: 40 ° C; mobile phase: 0.1% aqueous formic acid and aqueous acetonitrile; linear gradient: 10% acetonitrile to 95% acetonitrile;
校準係使用具有已知logP值(logP值之測定藉由在兩個連續烷酮之間使用線性內插法之滯留時間)之未分支烷-2-酮(包含3至16個碳原子)執行。使用200 nm至400 nm之UV光譜及層析信號之峰值測定最大λ值。Calibration is performed using unbranched alkan-2-ones (containing from 3 to 16 carbon atoms) with known logP values (the determination of the logP value by the linear interpolation method between two consecutive alkanones) . The maximum lambda value was determined using a UV spectrum from 200 nm to 400 nm and the peak of the chromatographic signal.
在表1a中,A經由以「*」標識之鍵連接至式(I)之L2
,且A經由以「#」標識之鍵連接至式(I)之N-SO2
部分。
表 1a :
Table 1a :
表1b以非限制性方式說明根據本發明之式(I)之N-氧化物化合物之實例:
Table 1b illustrates, by way of non-limiting example, an example of an N-oxide compound of formula (I) according to the invention:
在表1b中,logP如針對表1a所定義。In Table 1b, logP is as defined for Table 1a.
在表1b中,A經由以「*」標識之鍵連接至式(I)之L2
,且A經由以「#」標識之鍵連接至式(I)之N-SO2
部分。
表 1b :
Table 1b :
表1c以非限制性方式說明根據本發明之式(II)化合物之實例:
Table 1c illustrates, by way of non-limiting example, an example of a compound of formula (II) according to the invention:
在表1c中,logP如針對表1a所定義。In Table 1c, logP is as defined for Table 1a.
在表1c中,A經由以「*」標識之鍵連接至式(Ii)之C(OR2c
)(R2a
),且A經由以「#」標識之鍵連接至式(Ii)之N-SO2部分。
表 1c
:
Table 1c :
表1d以非限制性方式說明根據本發明之式(II)之N-氧化物化合物之實例:
在表1d中,logP如針對表1a所定義。Table 1d illustrates, in a non-limiting manner, an example of an N-oxide compound of formula (II) according to the invention:
In Table 1d, logP is as defined for Table 1a.
在表1d中,A經由以「*」標識之鍵連接至式(Ii)之C(OR2c
)(R2a
),且A經由以「#」標識之鍵連接至式(Ii)之N-SO2
部分。
表 1d
:
Table 1d :
表2以非限制性方式說明根據本發明之式(IIIa)化合物之實例:
Table 2 illustrates, by way of non-limiting example, an example of a compound of formula (IIIa) according to the invention:
在表2中,GCMS滯留時間經DB17ms (15m×0.25µm×0.25µm)管柱使用30℃/min之由40℃至310℃之梯度及1.5 mL/min He氣體流速測定。In Table 2, the GCMS residence time was determined by a DB17ms (15m x 0.25μm x 0.25μm) column using a gradient of 40 ° C / min from 40 ° C to 310 ° C and a flow rate of 1.5 mL / min He gas.
在表2中,A經由以「*」標識之鍵連接至式(IIIa)之L2
,且A經由以「#」標識之鍵連接至式(IIIa)之N-SO2
部分。
表 2
:
Table 2 :
表3以非限制性方式說明根據本發明之式(VII)化合物之實例:
Table 3 illustrates, by way of non-limiting example, an example of a compound of formula (VII) according to the invention:
在表3中,logP如針對表1a所定義。In Table 3, logP is as defined for Table 1a.
在表3中,A經由以「*」標識之鍵連接至式(VII)之L2
。
表 3 :
Table 3 :
表4以非限制性方式說明根據本發明之式(X)化合物之實例:
Table 4 illustrates, by way of non-limiting example, an example of a compound of formula (X) according to the invention:
在表4中,logP如針對表1a所定義。In Table 4, logP is as defined for Table 1a.
在表4中,A經由以「*」標識之鍵連接至式(X)之C=O部分,且A經由以「#」標識之鍵連接至式(X)之N-SO2
部分。
表 4
:
Table 4 :
表5以非限制性方式說明根據本發明之式(XIa)化合物之實例:
Table 5 illustrates, by way of non-limiting example, an example of a compound of formula (XIa) according to the invention:
在表5中,logP如針對表1a所定義。In Table 5, logP is as defined for Table 1a.
在表5中,A經由以「*」標識之鍵連接至式(XIa)之C=O部分,且A經由以「#」標識之鍵連接至式(XIa)之NH部分。
表 5
:
Table 5 :
表6提供表1a、1b、1c、1d、2、3、4及5中所揭示之一些化合物之NMR資料(1 H)。Table 6 provides NMR data ( 1 H) for some of the compounds disclosed in Tables 1a, 1b, 1c, 1d, 2, 3, 4 and 5.
所選實例之1 H-NMR資料以1 H-NMR峰清單之形式陳述。對於各信號峰,列舉以ppm計之δ值及於方括號中之信號強度。The 1 H-NMR data of the selected examples are presented in the form of a list of 1 H-NMR peaks. For each signal peak, the delta value in ppm and the signal intensity in square brackets are listed.
在所印刷之NMR譜實例中,尖銳信號之強度與信號高度(cm)相關且顯示信號強度之實際關係。自寬信號,可顯示信號之若干峰值或中間值及其相比於光譜中之最密集信號之相對強度。In the printed NMR spectrum example, the intensity of the sharp signal is related to the signal height (cm) and shows the actual relationship of the signal strength. The self-wide signal can show several peaks or intermediate values of the signal and its relative intensity compared to the densest signal in the spectrum.
1 H-NMR峰清單類似於經典1 H-NMR印刷,且因此通常含有列於經典NMR解釋中之所有峰。另外,其可如古典1 H-NMR印刷一樣顯示溶劑信號、目標化合物之立體異構體(其亦為本發明之目的)及/或雜質之峰。為了在溶劑及/或水之德耳塔範圍(delta-range)中顯示化合物信號,常用溶劑之峰(例如DMSO於DMSO-d6中之峰)及水之峰顯示在吾人之1 H-NMR峰清單中且通常平均具有較高強度。 The 1 H-NMR peak list is similar to classical 1 H-NMR printing and therefore typically contains all of the peaks listed in the classical NMR interpretation. Further, it can exhibit a solvent signal, a stereoisomer of the target compound (which is also the object of the present invention), and/or a peak of impurities as in classical 1 H-NMR printing. In order to display the compound signal in the delta-range of solvent and/or water, the peak of the commonly used solvent (for example, the peak of DMSO in DMSO-d6) and the peak of water are shown in the 1 H-NMR peak of ours. It is usually in the list and usually has a higher intensity.
目標化合物之立體異構體之峰及/或雜質之峰通常平均具有比目標化合物(例如具有大於90%之純度)之峰低的強度。此類立體異構體及/或雜質對於特定製備方法可為典型的。因此,其峰可經由「副產物指紋」幫助辨認製備製程之再現。The peaks of the stereoisomers of the target compound and/or the peaks of the impurities generally have an average lower intensity than the peak of the target compound (for example, having a purity greater than 90%). Such stereoisomers and/or impurities may be typical for a particular method of preparation. Therefore, its peak can help identify the reproduction of the preparation process via the "by-product fingerprint".
用已知方法(MestreC、ACD模擬以及用憑經驗評價之期望值)計算靶標化合物之峰之專家,可視情況使用額外強度過濾器按需要分離靶標化合物之峰。此分離將類似於經典的1 H-NMR解譯處釋中之相關峰挑選。An expert who calculates the peak of the target compound by known methods (MestreC, ACD simulation, and empirically evaluated expected values) can optionally separate the peak of the target compound as needed using an additional intensity filter. This separation will be selected similar to the correlation peaks in the classical 1 H-NMR interpretation.
具有峰清單之NMR資料描述之其他細節可見於研究揭示資料庫編號(Research Disclosure Database Number) 564025之公開案「Citation of NMR Peaklist Data within Patent Applications」中。
表 6 :
NMR峰清單
Table 6 : NMR Peak List
以下實施例以非限制性方式說明根據本發明之式(I)化合物功效製備及功效。The following examples illustrate, in a non-limiting manner, the efficacy and efficacy of the compounds of formula (I) according to the present invention.
製備實例 1
:製備3-(2,2-二氧離子基[1,2]噻唑并[4,3-b]吡啶-1(3H
)-基)-8-氟喹啉((化合物I.01)
向100 mg (0.52 mmol)之(8-氟喹啉-3-基)酸及89 mg (0.52 mmol)之1,3-二氫[1,2]噻唑并[4,3-b]吡啶2,2-二氧化物於10 mL二氯甲烷中之溶液中依序添加0.29 mL (2.09 mmol)之三乙胺、190 mg(1.04 mmol)之乙酸銅(II)及260 mg 4 Å分子篩。在室溫下攪拌反應混合物4小時,接著藉由乙酸乙酯稀釋且經由Celite®545塞過濾。減壓濃縮有機相且藉由矽膠管柱層析(庚烷/乙酸乙酯梯度)純化殘餘物,得到5 mg(純度89%,產率3%)呈固體狀之3-(2,2-二氧離子基[1,2]噻唑并[4,3-b]吡啶-1(3H
)-基)-8-氟喹啉。LogP = 1.86 [方法A]。(M+H) = 316。 Preparation Example 1 : Preparation of 3-(2,2-dioxal[1,2]thiazolo[4,3-b]pyridine-1( 3H )-yl)-8-fluoroquinoline ((Compound I) .01)
To 100 mg (0.52 mmol) of (8-fluoroquinolin-3-yl) Add acid and 89 mg (0.52 mmol) of 1,3-dihydro[1,2]thiazolo[4,3-b]pyridine 2,2-dioxide in 10 mL of dichloromethane 0.29 mL (2.09 mmol) of triethylamine, 190 mg (1.04 mmol) of copper (II) acetate and 260 mg of 4 Å molecular sieve. The reaction mixture was stirred at rt for 4 h then diluted with EtOAc EtOAc &EtOAc The organic phase was concentrated under reduced pressure and purified mjjjjjjjjjjjj Dioxyl[1,2]thiazolo[4,3-b]pyridine-1(3 H )-yl)-8-fluoroquinoline. LogP = 1.86 [Method A]. (M+H) = 316.
製備實例 2
:製備4,4-二氟-1-(8-氟喹啉-3-基)-3,3-二甲基-3,4-二氫-1H
-吡啶并[3,2-c][1,2]噻嗪2,2-二氧化物(化合物I.08)
步驟 1 :
製備3-[(8-氟喹啉-3-基)胺基]吡啶-2-甲酸甲酯 Preparation Example 2 : Preparation of 4,4-difluoro-1-(8-fluoroquinolin-3-yl)-3,3-dimethyl-3,4-dihydro-1 H -pyrido[3,2 -c][1,2]thiazine 2,2-dioxide (compound I.08)
Step 1 : Preparation of methyl 3-[(8-fluoroquinolin-3-yl)amino]pyridine-2-carboxylate
在100 mL圓底燒瓶中,於氬氣氛圍中添加45 mg (0.04 mmol)之參(二亞苄基丙酮)二鈀(0)、85 mg (0.14 mmol)之4,5-雙(二苯膦基)-9,9-二甲基二苯并哌喃及0.75 g (2.30 mmol)之碳酸銫。依序添加34 mL之1,4-二噁烷、250 mg (1.64 mmol)之3-胺基吡啶-2-甲酸甲酯及1.35 g (4.92 mmol)之8-氟-3-碘喹啉。在回流下攪拌反應混合物20小時。使反應混合物冷卻至室溫,藉由二氯甲烷稀釋,且經由Celite®545塞過濾。減壓濃縮有機相且藉由矽膠管柱層析(庚烷/乙酸乙酯梯度)純化殘餘物,得到445 mg(純度88%,產率80%)之呈淺黃色固體狀之2-(喹啉-3-基胺基)苯甲酸甲酯LogP = 1.94 [方法A]。(M+H) = 298。Add 45 mg (0.04 mmol) of ginseng (dibenzylideneacetone) dipalladium (0), 85 mg (0.14 mmol) of 4,5-bis(diphenyl) in a 100 mL round bottom flask under argon. Phosphyl)-9,9-dimethyldibenzopyran and 0.75 g (2.30 mmol) of cesium carbonate. 34 mL of 1,4-dioxane, 250 mg (1.64 mmol) of methyl 3-aminopyridine-2-carboxylate and 1.35 g (4.92 mmol) of 8-fluoro-3-iodoquinoline were added in that order. The reaction mixture was stirred under reflux for 20 hours. The reaction mixture was cooled to room temperature, diluted with dichloromethane and filtered over Celite® 545. The organic phase was concentrated under EtOAcqqqHHHHHHHHHHHHHHHHHHHHHHHHHHHHHHHHHHHHHHHHHHHHHHHHHHHHHHHHHHH Methyl morpho-3-ylamino)benzoate LogP = 1.94 [Method A]. (M+H) = 298.
步驟 2
:製備3-[(8-氟喹啉-3-基)(甲磺醯基)胺基]吡啶-2-甲酸甲酯
在0℃下將雙(三甲基矽基)胺基鋰之溶液(6.73 mL,1.0 M四氫呋喃溶液,6.73 mmol)添加至2.0 g (6.72 mmol)之3-[(8-氟喹啉-3-基)胺基]吡啶-2-甲酸甲酯於37 mL四氫呋喃中之溶液中。將混合物攪拌10 min,產生橙色溶液,且在0℃下添加0.78 mL (10.00 mmol)之甲磺醯氯。在0℃下攪拌所得淡黃色溶液4小時,至藉由飽和氯化銨水溶液淬滅。用乙酸乙酯萃取粗混合物。用鹽水洗滌合併之有機層,經硫酸鈉乾燥,過濾且減壓濃縮。殘餘物藉由矽膠管柱層析(庚烷/乙酸乙酯梯度)純化,得到739 mg(純度99%,產率29%)呈固體狀之3-[(8-氟喹啉-3-基)(甲磺醯基)胺基]吡啶2-甲酸甲酯。LogP = 1.69 [方法A]。(M+Na) = 398。 Step 2 : Preparation of methyl 3-[(8-fluoroquinolin-3-yl)(methylsulfonyl)amino]pyridine-2-carboxylate Lithium bis(trimethylsulfonyl)amine at 0 ° C The solution (6.73 mL, 1.0 M tetrahydrofuran solution, 6.73 mmol) was added to 2.0 g (6.72 mmol) of methyl 3-[(8-fluoroquinolin-3-yl)amino]pyridine-2-carboxylate in 37 mL In a solution in tetrahydrofuran. The mixture was stirred for 10 min to give an orange solution, and 0.78 mL (10.00 mmol) of methanesulfonium chloride was added at 0 °C. The resulting pale yellow solution was stirred at 0<0>C for 4 h then quenched with saturated aqueous ammonium chloride. The crude mixture was extracted with ethyl acetate. The combined organic layers were washed with EtOAc EtOAc m. The residue was purified by EtOAc EtOAc EtOAc (EtOAc (EtOAc) (Methanesulfonyl)amino]pyridine 2-carboxylic acid methyl ester. LogP = 1.69 [Method A]. (M+Na) = 398.
步驟 3 :製備1-(8-氟喹啉-3-基)-1H -吡啶并[3,2-c][1,2]噻嗪-4(3H )-酮2,2-二氧化物(化合物I.02) Step 3 : Preparation of 1-(8-fluoroquinolin-3-yl)-1 H -pyrido[3,2-c][1,2]thiazin-4(3 H )-one 2,2-di Oxide (Compound I.02)
在0℃下向15 mg (60% (w/w)於礦物油中之分散液,0.38 mmol)之氫化鈉於0.53 mL之N,N-二甲基甲醯胺中之懸浮液中逐滴添加100 mg (0.26 mmol)之3-[(8-氟喹啉-3-基)(甲磺醯基)胺基]吡啶-2-甲酸甲酯於0.53 mL之N,N-二甲基甲醯胺中之溶液。使反應混合物升溫至室溫且攪拌1.5小時。用1 M鹽酸水溶液淬滅反應混合物且藉由乙酸乙酯稀釋。分離各層。水相用飽和碳酸氫鈉水溶液中和至pH 7,且用用乙酸乙酯萃取兩次。合併之有機層用水、鹽水洗滌,經硫酸鎂乾燥,過濾且減壓濃縮。殘餘物藉由矽膠管柱層析(庚烷/乙酸乙酯梯度)純化,得到62 mg (純度97%,產率65%)呈橙色固體之1-(8-氟喹啉-3-基)-1H -吡啶并[3,2-c][1,2]噻嗪-4(3H )-酮2,2-二氧化物。LogP = 1.72 [方法A]。(M+H) = 344。To a suspension of 15 mg (60% (w/w) dispersion in mineral oil, 0.38 mmol) of sodium hydride in 0.53 mL of N,N-dimethylformamide at 0 °C Add 100 mg (0.26 mmol) of methyl 3-[(8-fluoroquinolin-3-yl)(methylsulfonyl)amino]pyridine-2-carboxylate to 0.53 mL of N,N-dimethylmethyl A solution in guanamine. The reaction mixture was allowed to warm to rt and stirred for 1.5 h. The reaction mixture was quenched with 1 M aqueous HCI and diluted withEtOAc. Separate the layers. The aqueous phase was neutralized to pH 7 with a saturated aqueous solution of sodium bicarbonate and extracted twice with ethyl acetate. The combined organic layers were washed with EtOAcq. The residue was purified by EtOAc EtOAc EtOAc (EtOAc) -1 H -pyrido[3,2-c][1,2]thiazin-4(3 H )-one 2,2-dioxide. LogP = 1.72 [Method A]. (M+H) = 344.
步驟 4
:製備1-(8-氟喹啉-3-基)-3,3-二甲基-1H
-吡啶并[3,2-c][1,2]噻嗪-4(3H
)-酮2,2-二氧化物(化合物I.05)
向3.20 g (純度83%,5.86 mmol)之1-(8-氟喹啉-3-基)-1H
-吡啶并[3,2-c][1,2]噻嗪-4(3H
)-酮2,2-二氧化物於207 mL之N,N-二甲基甲醯胺之溶液中添加2.14 g (15.4 mmol)之碳酸鉀及1.11 mL (17.7 mmol)之碘甲烷。在室溫下攪拌所得懸浮液3小時。藉由乙酸乙酯及水稀釋反應混合物。分離各層,且將水層中和至pH 7,且用乙酸乙酯萃取兩次。合併之有機層用鹽水洗滌,經硫酸鎂乾燥,且減壓濃縮。殘餘物藉由矽膠管柱層析(庚烷/乙酸乙酯梯度)純化,得到1.14 g (純度96%,產率38%)呈固體狀之1-(8-氟喹啉-3-基)-3,3-二甲基-1H-吡啶并[3,2-c][1,2]噻嗪-4(3H
)-酮2,2-二氧化物。LogP = 2.11 [方法A]。(M+H) = 374。 Step 4 : Preparation of 1-(8-fluoroquinolin-3-yl)-3,3-dimethyl-1 H -pyrido[3,2-c][1,2]thiazine-4 (3 H )-keto 2,2-dioxide (compound I.05)
To 3.20 g (purity 83%, 5.86 mmol) of 1-(8-fluoroquinolin-3-yl)-1 H -pyrido[3,2-c][1,2]thiazine-4 (3 H )-keto 2,2-dioxide In a solution of 207 mL of N,N-dimethylformamide, 2.14 g (15.4 mmol) of potassium carbonate and 1.11 mL (17.7 mmol) of methyl iodide were added. The resulting suspension was stirred at room temperature for 3 hours. The reaction mixture was diluted with ethyl acetate and water. The layers were separated and the aqueous layer was neutralized to pH 7 and extracted twice with ethyl acetate. The combined organic layers were washed with EtOAc EtOAc m. The residue was purified by EtOAc EtOAc EtOAc EtOAc (EtOAc) -3,3-Dimethyl-1H-pyrido[3,2-c][1,2]thiazine-4( 3H )-one 2,2-dioxide. LogP = 2.11 [Method A]. (M+H) = 374.
步驟 5
:製備4,4-二氟-1-(8-氟喹啉-3-基)-3,3-二甲基-3,4-二氫-1H
-吡啶并[3,2-c][1,2]噻嗪2,2-二氧化物(化合物I.08)
在室溫下向150 mg (0.35 mmol)之1-(8-氟喹啉-3-基)-3,3-二甲基-1H-吡啶并[3,2-c][1,2]噻嗪-4(3H
)-酮2,2-二氧化物於0.7 mL甲苯中之溶液中添加0.52 mL (1.42 mmol)之三氟化雙(2-甲氧基乙基)胺基硫。在80℃下攪拌反應混合物72小時。將反應混合物冷卻至室溫且添加0.26 mL (0.71 mmol)之三氟化雙(2-甲氧基乙基)胺基硫。在80℃下攪拌反應混合物24小時。使反應混合物冷卻至0℃,藉由乙酸乙酯稀釋且用緩慢添加飽和碳酸氫鈉水溶液來淬滅。用乙酸乙酯萃取水相兩次。合併之有機萃取物用水、鹽水洗滌,經硫酸鎂乾燥,且減壓濃縮。殘餘物藉由矽膠管柱層析(庚烷/乙酸乙酯梯度)純化,得到32 mg(純度96%,產率21%)呈白色固體狀之4,4-二氟-1-(8-氟喹啉-3-基)-3,3-二甲基-3,4-二氟-1H
-吡啶并[3,2-c][1,2]噻嗪2,2-二氧化物。LogP = 2.57 [方法A]。(M+H) = 394。 Step 5 : Preparation of 4,4-difluoro-1-(8-fluoroquinolin-3-yl)-3,3-dimethyl-3,4-dihydro-1 H -pyrido[3,2- c][1,2]thiazine 2,2-dioxide (compound I.08)
To 150 mg (0.35 mmol) of 1-(8-fluoroquinolin-3-yl)-3,3-dimethyl-1H-pyrido[3,2-c][1,2] at room temperature To a solution of thiazide-4( 3H )-one 2,2-dioxide in 0.7 mL of toluene was added 0.52 mL (1.42 mmol) of bis(2-methoxyethyl)aminosulfur trifluoride. The reaction mixture was stirred at 80 ° C for 72 hours. The reaction mixture was cooled to room temperature and 0.26 mL (0.71 mmol) of bis(2-methoxyethyl)amine sulphur trifluoride was added. The reaction mixture was stirred at 80 ° C for 24 hours. The reaction mixture was cooled to 0.degree. C., diluted with EtOAc EtOAc. The aqueous phase was extracted twice with ethyl acetate. The combined organic extracts were washed with EtOAcq. The residue was purified by EtOAc EtOAc EtOAc EtOAc (EtOAc) Fluoroquinolin-3-yl)-3,3-dimethyl-3,4-difluoro-1 H -pyrido[3,2-c][1,2]thiazine 2,2-dioxide . LogP = 2.57 [Method A]. (M+H) = 394.
製備實例 3 :製備4-(苯甲氧基)-1-(8-氟喹啉-3-基)-3,3,4-三甲基-3,4-二氫-1H -吡啶并[3,2-c][1,2]噻嗪2,2-二氧化物(化合物I.28) Preparation Example 3 : Preparation of 4-(benzyloxy)-1-(8-fluoroquinolin-3-yl)-3,3,4-trimethyl-3,4-dihydro-1 H -pyridine [3,2-c][1,2]thiazine 2,2-dioxide (compound I.28)
步驟 1
:製備1-(8-氟喹啉-3-基)-3,3,4-三甲基-3,4-二氫-1H
-吡啶并[3,2-c][1,2]噻嗪-4-醇2,2-二氧化物(化合物I.10)
在0℃下向50 mg (0.13 mmol)之1-(8-氟喹啉-3-基)-3,3-二甲基-1H
-吡啶并[3,2-c][1,2]噻嗪-4(3H
)-酮2,2-二氧化物於1.4 mL四氫呋喃之溶液中逐滴添加0.16 mL氯化甲基鎂(3 M四氫呋喃溶液,0.47 mmol)之溶液。使反應混合物升溫至室溫且攪拌1小時。使反應混合物冷卻至0℃且藉由緩慢添加飽和氯化銨水溶液淬滅。分離各層且用乙酸乙酯萃取水層兩次。合併之有機層用鹽水洗滌,經硫酸鎂乾燥,且減壓濃縮。殘餘物藉由矽膠管柱層析(庚烷/乙酸乙酯梯度)純化,得到14 mg(純度100%,產率25%)呈白色固體狀之1-(8-氟喹啉-3-基)-3,3,4-三甲基-3,4-二氫-1H
-吡啶并[3,2-c][1,2]噻嗪-4-醇2,2-二氧化物。LogP = 2.18 [方法A]。(M+H) = 388。 Step 1 : Preparation of 1-(8-fluoroquinolin-3-yl)-3,3,4-trimethyl-3,4-dihydro-1 H -pyrido[3,2-c][1, 2] thiazin-4-ol 2,2-dioxide (compound I.10)
50 mg (0.13 mmol) of 1-(8-fluoroquinolin-3-yl)-3,3-dimethyl-1 H -pyrido[3,2-c][1,2 at 0 °C A solution of 0.16 mL of methylmagnesium chloride (3 M tetrahydrofuran solution, 0.47 mmol) was added dropwise to a solution of thiazol-4( 3H )-one 2,2-dioxide in 1.4 mL of tetrahydrofuran. The reaction mixture was allowed to warm to room temperature and stirred for 1 hour. The reaction mixture was cooled to 0.degree. C. and was quenched with aq. The layers were separated and the aqueous layer was extracted twice with ethyl acetate. The combined organic layers were washed with EtOAc EtOAc m. The residue was purified by EtOAc EtOAc EtOAc (EtOAc) -3,3,4-Trimethyl-3,4-dihydro-1 H -pyrido[3,2-c][1,2]thiazin-4-ol 2,2-dioxide. LogP = 2.18 [Method A]. (M+H) = 388.
步驟 2
:製備4-(苯甲氧基)-1-(8-氟喹啉-3-基)-3,3,4-三甲基-3,4-二氫-1H
-吡啶并[3,2-c][1,2]噻嗪2,2-二氧化物(化合物I.28)
在0℃下向70 mg (0.18 mmol)之1-(8-氟喹啉-3-基)-3,3,4-三甲基-3,4-二氫-1H
-吡啶并[3,2-c][1,2]噻嗪-4-醇2,2-二氧化物於4.5 mL之N,N-二甲基甲醯胺中之溶液中添加10 mg (60% (w/w)於礦物油中之分散液,0.25 mmol)之氫化鈉及32 μL (0.27 mmol)之苯甲基溴。使反應混合物升溫至室溫且攪拌2小時。用飽和氯化銨水溶液淬滅反應物,且用乙酸乙酯萃取混合物。合併之有機萃取物用鹽水洗滌,經硫酸鎂乾燥,過濾且減壓濃縮。殘餘物藉由矽膠管柱層析(庚烷/乙酸乙酯梯度)純化,得到12 mg(純度94%,產率12%)呈白色固體狀之4-(苯甲氧基)-1-(8-氟喹啉-3-基)-3,3,4-三甲基-3,4-二氫-1H
-吡啶并[3,2-c][1,2]噻嗪2,2-二氧化物。LogP = 3.94 [方法A]。(M+Na) = 500。 Step 2 : Preparation of 4-(benzyloxy)-1-(8-fluoroquinolin-3-yl)-3,3,4-trimethyl-3,4-dihydro-1 H -pyridine and [ 3,2-c][1,2]thiazine 2,2-dioxide (compound I.28)
70 mg (0.18 mmol) of 1-(8-fluoroquinolin-3-yl)-3,3,4-trimethyl-3,4-dihydro-1 H -pyrido[3] at 0 °C , 2-c][1,2]thiazin-4-ol 2,2-dioxide added to a solution of 4.5 mL of N,N-dimethylformamide 10 mg (60% (w/ w) a dispersion in mineral oil, 0.25 mmol) of sodium hydride and 32 μL (0.27 mmol) of benzyl bromide. The reaction mixture was allowed to warm to room temperature and stirred for 2 h. The reaction was quenched with aq. aq. The combined organic extracts were washed with EtOAc EtOAc m. The residue was purified by EtOAc EtOAc EtOAc (EtOAc) 8-fluoroquinolin-3-yl)-3,3,4-trimethyl-3,4-dihydro-1 H -pyrido[3,2-c][1,2]thiazine 2,2 - dioxide. LogP = 3.94 [Method A]. (M+Na) = 500.
製備實例4:製備1-(8-氟-1-氧離子基喹啉-3-基)-4-甲氧基-3,3,4-三甲基-3,4-二氫-1H-吡啶并[3,2-c][1,2]噻嗪2,2-二氧化物(化合物I.40)及1-(8-氟喹啉-3-基)-4-甲氧基-3,3,4-三甲基-3,4-二氫-1H-吡啶并[3,2-c][1,2]噻嗪2,2,5-三氧化物(化合物I.38)Preparation Example 4: Preparation of 1-(8-fluoro-1-oxo-ylquinolin-3-yl)-4-methoxy-3,3,4-trimethyl-3,4-dihydro-1H- Pyrido[3,2-c][1,2]thiazine 2,2-dioxide (compound I.40) and 1-(8-fluoroquinolin-3-yl)-4-methoxy- 3,3,4-trimethyl-3,4-dihydro-1H-pyrido[3,2-c][1,2]thiazine 2,2,5-trioxide (Compound I.38)
在0℃下向126 mg (0.31 mmol)之1-(8-氟喹啉-3-基)-4-甲氧基-3,3,4-三甲基-3,4-二氫-1H-吡啶并[3,2-c][1,2]噻嗪2,2-二氧化物於5 mL之二氯甲烷中之溶液中添加90 mg (純度60%,0.31 mmol)之間氯過苯甲酸於5 mL之二氯甲烷中之溶液。在室溫下攪拌反應物11天。反應混合物用1 M硫代硫酸鈉水溶液、飽和碳酸氫鈉水溶液及鹽水洗滌,經硫酸鈉乾燥,過濾且減壓濃縮。殘餘物藉由矽膠管柱層析(乙酸乙酯/庚烷梯度)純化,得到18 mg (純度80%,產率11%)呈油狀之1-(8-氟喹啉-3-基)-4-甲氧基-3,3,4-三甲基-3,4-二氫-1H-吡啶并[3,2-c][1,2]噻嗪2,2,5-三氧化物。LogP = 1.94 [方法A]。藉由製備型HPLC (乙腈/水+0.1% HCO2H之梯度)進一步純化第二溶離份產生9 mg(純度95%,產率6%)呈油狀之1-(8-氟-1-氧離子基喹啉-3-基)-4-甲氧基-3,3,4-三甲基-3,4-二氫-1H-吡啶并[3,2-c][1,2]噻嗪2,2-二氧化物。LogP = 1.87 [方法A]。126 mg (0.31 mmol) of 1-(8-fluoroquinolin-3-yl)-4-methoxy-3,3,4-trimethyl-3,4-dihydro-1H at 0 °C - a solution of pyridyl[3,2-c][1,2]thiazine 2,2-dioxide in 5 mL of dichloromethane, 90 mg (purity 60%, 0.31 mmol) A solution of benzoic acid in 5 mL of dichloromethane. The reaction was stirred at room temperature for 11 days. The reaction mixture was washed with EtOAc EtOAc. The residue was purified by EtOAc EtOAc EtOAc (EtOAc (EtOAc) 4-methoxy-3,3,4-trimethyl-3,4-dihydro-1H-pyrido[3,2-c][1,2]thiazine 2,2,5-trioxide Things. LogP = 1.94 [Method A]. The second fraction was further purified by preparative HPLC (gradient of acetonitrile / water + 0.1% HCO2H) to yield 9 mg (purity 95%, yield 6%) oily 1-(8-fluoro-1-oxo Quinolin-3-yl)-4-methoxy-3,3,4-trimethyl-3,4-dihydro-1H-pyrido[3,2-c][1,2]thiazine 2,2-dioxide. LogP = 1.87 [Method A].
生物資料
實例 : 對芸苔鏈格孢 (Alternaria brassicae
) ( 蘿蔔或甘藍菜之葉斑病 ) 之活體內預防性測試
溶劑: 5體積%之二甲亞碸
10體積%之丙酮
乳化劑: 每毫克所測試化合物1 µl Tween®
80 Biological data
Example: live on Alternaria brassicae (Alternaria brassicae) (carrot or cabbage, leaf spot of) the <br/> vivo preventive test Solvent: 5% by volume of dimethyl sulfoxide
10% by volume of acetone emulsifier: 1 μl of Tween ® 80 per mg of test compound
使所測試化合物在二甲亞碸/丙酮/Tween® 80之混合物中可溶且均質化,且接著用水稀釋至所需濃度。So that the test compound in dimethyl sulfoxide / acetone / Tween ® 80 mixture of soluble and homogenized, and then diluted with water to the desired concentration.
藉由噴灑如上文所述製備之所測試化合物處理蘿蔔或甘藍菜之幼株。僅用丙酮/二甲亞碸/Tween® 80之水溶液處理對照植物。Young plants of radish or kale are treated by spraying the test compound prepared as described above. Only acetone / dimethyl sulfoxide / Tween ® 80 solution of the untreated control plants.
在24小時之後,藉由用芸苔鏈格孢孢子之水性懸浮液噴灑葉片來污染植物。在20℃下且在100%相對濕度下將受污染之蘿蔔或甘藍菜植物培育6天。After 24 hours, the plants were contaminated by spraying the leaves with an aqueous suspension of Alternaria alternata. The contaminated radish or cabbage plants were incubated for 6 days at 20 ° C and at 100% relative humidity.
在接種之後6天評估測試。0%意謂對應於對照植株之功效的功效,而100%之功效意謂未觀測到病害。The test was evaluated 6 days after the inoculation. 0% means efficacy corresponding to the efficacy of the control plants, while 100% efficacy means no disease is observed.
在此測試中,以下根據本發明之化合物在500 ppm所測試化合物之濃度下展示70%與79%之間的功效:I.27;I.29In this test, the following compounds according to the invention exhibited an efficacy between 70% and 79% at a concentration of 500 ppm of the tested compound: I.27; I.29
在此測試中,以下根據本發明之化合物在500 ppm所測試化合物之濃度下展示80%與89%之間的功效:I.06In this test, the following compounds according to the invention exhibited an efficacy between 80% and 89% at a concentration of 500 ppm of the tested compound: I.06
在此測試中,以下根據本發明之化合物在500 ppm所測試化合物之濃度下展示90%與100%之間的功效:I.03In this test, the following compounds according to the invention exhibited an efficacy between 90% and 100% at a concentration of 500 ppm of the tested compound: I.03
實例 : 對 灰葡萄孢菌 ( 灰黴 ) 之活體內預防性測試
溶劑: 5體積%之二甲亞碸
10體積%之丙酮
乳化劑: 每毫克所測試化合物1 µL Tween®
80 Example : In vivo prophylactic test against Botrytis cinerea ( Gold mold ) Solvent: 5 vol% dimethyl hydrazine
10% by volume of acetone emulsifier: 1 μL of Tween ® 80 per mg of test compound
使所測試化合物在二甲亞碸/丙酮/Tween® 80之混合物中可溶且均質化,且接著用水稀釋至所需濃度。So that the test compound in dimethyl sulfoxide / acetone / Tween ® 80 mixture of soluble and homogenized, and then diluted with water to the desired concentration.
藉由噴灑如上文所述製備之所測試化合物處理小黃瓜之幼株。僅用丙酮/二甲亞碸/Tween® 80之水溶液處理對照植物。Young plants of cucumbers were treated by spraying the test compounds prepared as described above. Only acetone / dimethyl sulfoxide / Tween ® 80 solution of the untreated control plants.
在24小時之後,植物因用灰葡萄孢菌孢子之水性懸浮液噴灑葉片而受到污染。在17℃下且在90%相對濕度下將受污染之小黃瓜植物培育4至5天。After 24 hours, the plants were contaminated by spraying the leaves with an aqueous suspension of Botrytis cinerea spores. The contaminated cucumber plants were incubated for 4 to 5 days at 17 ° C and at 90% relative humidity.
在接種後4至5天對測試進行評估。0%意謂對應於對照植株之功效的功效,而100%之功效意謂未觀測到病害。The test was evaluated 4 to 5 days after inoculation. 0% means efficacy corresponding to the efficacy of the control plants, while 100% efficacy means no disease is observed.
在此測試中,以下根據本發明之化合物在500 ppm所測試化合物之濃度下展示70%與79%之間的功效:I.06;I.08;I.32In this test, the following compounds according to the invention exhibited efficacy between 70% and 79% at a concentration of 500 ppm of the tested compound: I.06; I.08; I.32
在此測試中,以下根據本發明之化合物在500 ppm所測試化合物之濃度下展示80%與89%之間的功效:I.20;I.21;I.22In this test, the following compounds according to the invention exhibited an efficacy between 80% and 89% at a concentration of 500 ppm of the tested compound: I.20; I.21; I.22
在此測試中,以下根據本發明之化合物在500 ppm所測試化合物之濃度下展示90%與100%之間的功效:I.09;I.11;I.25;I.27;I.28;I.29;I.30;I.31;I.37In this test, the following compounds according to the invention exhibited an efficacy between 90% and 100% at a concentration of 500 ppm of the tested compound: I.09; I.11; I.25; I.27; I.28 ;I.29; I.30; I.31; I.37
實例 : 對單絲殼白粉菌 ( 葫蘆白粉病 ) 之活體內預防性測試
溶劑: 5體積%之二甲亞碸
10體積%之丙酮
乳化劑: 每毫克所測試化合物1 µL Tween®
80 Example : In vivo prophylactic test for powdery mildew of the monofilament shell ( Gourd powdery mildew ) Solvent: 5 vol% of dimethyl hydrazine
10% by volume of acetone emulsifier: 1 μL of Tween ® 80 per mg of test compound
使所測試化合物在二甲亞碸/丙酮/Tween® 80之混合物中可溶且均質化,且接著用水稀釋至所需濃度。So that the test compound in dimethyl sulfoxide / acetone / Tween ® 80 mixture of soluble and homogenized, and then diluted with water to the desired concentration.
藉由噴灑如上文所述製備之所測試化合物處理小黃瓜之幼株。僅用丙酮/二甲亞碸/Tween® 80之水溶液處理對照植物。Young plants of cucumbers were treated by spraying the test compounds prepared as described above. Only acetone / dimethyl sulfoxide / Tween ® 80 solution of the untreated control plants.
在24小時之後,藉由用單絲殼白粉菌孢子之水性懸浮液噴灑葉片來污染植物。在20℃下且在70-80%相對濕度下將受污染之小黃瓜植物培育8天。After 24 hours, the plants were contaminated by spraying the leaves with an aqueous suspension of spores of the genus Aspergillus. The contaminated cucumber plants were incubated for 8 days at 20 ° C and at 70-80% relative humidity.
在接種後8天對測試進行評估。0%意謂對應於對照植株之功效的功效,而100%之功效意謂未觀測到病害。The test was evaluated 8 days after inoculation. 0% means efficacy corresponding to the efficacy of the control plants, while 100% efficacy means no disease is observed.
在此測試中,以下根據本發明之化合物在500 ppm所測試化合物之濃度下展示70%與79%之間的功效:I.18;I.23;I.25In this test, the following compounds according to the invention exhibited an efficacy between 70% and 79% at a concentration of 500 ppm of the tested compound: I.18; I.23; I.25
在此測試中,以下根據本發明之化合物在500 ppm所測試化合物之濃度下展示90%與100%之間的功效: I.17;I.27;I.35In this test, the following compounds according to the invention exhibit efficacy between 90% and 100% at a concentration of 500 ppm of the tested compound: I.17; I.27; I.35
實例:菜豆炭疽病菌
活體外細胞測試
溶劑: DMSO
培養基: 14.6 g無水D-葡萄糖(VWR)、7.1 g真菌蛋白腖(Oxoid)、1.4 g顆粒狀酵母提取物(Merck)、QSP 1公升
接種物: 孢子懸浮液Example: Kidney bean anthracnose In vitro cell test solvent: DMSO
Medium: 14.6 g anhydrous D-glucose (VWR), 7.1 g fungal peptone (Oxoid), 1.4 g granular yeast extract (Merck), QSP 1 liter inoculum: spore suspension
將待測試化合物溶解於DMSO及用於製備所需濃度範圍之溶液中。分析中所用之DMSO的最終濃度係≤ 1%。The compound to be tested is dissolved in DMSO and used to prepare a solution of the desired concentration range. The final concentration of DMSO used in the analysis was < 1%.
製備菜豆炭疽病菌之孢子懸浮液且稀釋至所需孢子密度。A spore suspension of the bean anthracnose is prepared and diluted to the desired spore density.
評估化合物抑制液體培養基分析中孢子發芽及菌絲體生長的能力。以所需濃度將化合物添加至具有孢子之培養基。在培育6天之後,藉由菌絲體生長之光譜量測來測定化合物之真菌毒性。藉由比較含有所測試化合物之孔中之吸光度值與無所測試化合物之對照孔中之吸光度來測定真菌生長之抑制。The ability of the compounds to inhibit spore germination and mycelial growth in liquid media assays was assessed. The compound is added to the medium with spores at the desired concentration. After 6 days of incubation, the fungal toxicity of the compounds was determined by spectroscopic measurements of mycelial growth. Inhibition of fungal growth was determined by comparing the absorbance values in wells containing the test compound to the absorbance in control wells without the test compound.
在此測試中,以下根據本發明之化合物在20 ppm所測試化合物之濃度下展示70%與79%之間的功效:I.13;I.32In this test, the following compounds according to the invention exhibited an efficacy between 70% and 79% at a concentration of 20 ppm of the tested compound: I.13; I.32
在此測試中,以下根據本發明之化合物在20 ppm所測試化合物之濃度下展示80%與89%之間的功效:I.02;I.14;I.25In this test, the following compounds according to the invention exhibited an efficacy between 80% and 89% at a concentration of 20 ppm of the tested compound: I.02; I.14; I.25
在此測試中,以下根據本發明之化合物在20 ppm所測試化合物之濃度下展示90%與100%之間的功效:I.06;I.09;I.11;I.27;I.28;I.29; I.30;I.31In this test, the following compounds according to the invention exhibited an efficacy between 90% and 100% at a concentration of 20 ppm of the tested compound: I.06; I.09; I.11; I.27; I.28 ;I.29; I.30; I.31
實例:稻梨孢
之活體外細胞測試
溶劑: DMSO
培養基: 14.6 g無水D-葡萄糖(VWR)、7.1 g真菌蛋白腖(Oxoid)、1.4 g顆粒狀酵母提取物(Merck)、QSP 1公升
接種物: 孢子懸浮液Example: In vitro cell test of P. sinensis Solvent: DMSO
Medium: 14.6 g anhydrous D-glucose (VWR), 7.1 g fungal peptone (Oxoid), 1.4 g granular yeast extract (Merck), QSP 1 liter inoculum: spore suspension
將待測試化合物溶解於DMSO及用於製備所需濃度範圍之溶液中。分析中所用之DMSO的最終濃度係≤ 1%。The compound to be tested is dissolved in DMSO and used to prepare a solution of the desired concentration range. The final concentration of DMSO used in the analysis was < 1%.
製備稻梨孢之孢子懸浮液且稀釋至所需孢子密度。A spore suspension of P. oryzae was prepared and diluted to the desired spore density.
評估化合物抑制液體培養基分析中孢子發芽及菌絲體生長的能力。以所需濃度將化合物添加至具有孢子之培養基。在培育5天之後,藉由菌絲體生長之光譜量測來測定化合物之真菌毒性。藉由比較含有所測試化合物之孔中之吸光度值與無待測試化合物之對照孔中之吸光度來測定真菌生長之抑制。The ability of the compounds to inhibit spore germination and mycelial growth in liquid media assays was assessed. The compound is added to the medium with spores at the desired concentration. After 5 days of incubation, the fungal toxicity of the compounds was determined by spectroscopic measurements of mycelial growth. Inhibition of fungal growth was determined by comparing the absorbance values in wells containing the test compound to the absorbance in control wells without the compound to be tested.
在此測試中,以下根據本發明之化合物在20 ppm所測試化合物之濃度下展示70%與79%之間的功效:I.19;I.25;I.29;I.36;I.37In this test, the following compounds according to the invention exhibited an efficacy between 70% and 79% at a concentration of 20 ppm of the tested compound: I.19; I.25; I.29; I.36; I.37
在此測試中,以下根據本發明之化合物在20 ppm所測試化合物之濃度下展示80%與89%之間的功效:I.09;I.22;I.34;I.38;I.39;I.40In this test, the following compounds according to the invention exhibited an efficacy between 80% and 89% at a concentration of 20 ppm of the tested compound: I.09; I.22; I.34; I.38; I.39 ;I.40
在此測試中,以下根據本發明之化合物在20 ppm所測試化合物之濃度下展示90%與100%之間的功效:I.06;I.11;I.32;I.35。In this test, the following compounds according to the invention exhibited an efficacy between 90% and 100% at a concentration of 20 ppm of the tested compound: I.06; I.11; I.32; I.35.
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