TW201920697A - Silver powder and method for producing same - Google Patents

Silver powder and method for producing same Download PDF

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TW201920697A
TW201920697A TW107131880A TW107131880A TW201920697A TW 201920697 A TW201920697 A TW 201920697A TW 107131880 A TW107131880 A TW 107131880A TW 107131880 A TW107131880 A TW 107131880A TW 201920697 A TW201920697 A TW 201920697A
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particle size
silver powder
sem
cumulative
tap
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TW107131880A
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TWI755565B (en
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道明良幸
吉田昌弘
井上健一
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日商同和電子科技有限公司
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01BCABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B1/00Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors
    • H01B1/02Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors mainly consisting of metals or alloys
    • H01B1/026Alloys based on copper
    • B22F1/0003
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B22CASTING; POWDER METALLURGY
    • B22FWORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
    • B22F1/00Metallic powder; Treatment of metallic powder, e.g. to facilitate working or to improve properties
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B22CASTING; POWDER METALLURGY
    • B22FWORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
    • B22F1/00Metallic powder; Treatment of metallic powder, e.g. to facilitate working or to improve properties
    • B22F1/05Metallic powder characterised by the size or surface area of the particles
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B22CASTING; POWDER METALLURGY
    • B22FWORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
    • B22F7/00Manufacture of composite layers, workpieces, or articles, comprising metallic powder, by sintering the powder, with or without compacting wherein at least one part is obtained by sintering or compression
    • B22F7/02Manufacture of composite layers, workpieces, or articles, comprising metallic powder, by sintering the powder, with or without compacting wherein at least one part is obtained by sintering or compression of composite layers
    • B22F7/04Manufacture of composite layers, workpieces, or articles, comprising metallic powder, by sintering the powder, with or without compacting wherein at least one part is obtained by sintering or compression of composite layers with one or more layers not made from powder, e.g. made from solid metal
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B22CASTING; POWDER METALLURGY
    • B22FWORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
    • B22F9/00Making metallic powder or suspensions thereof
    • B22F9/02Making metallic powder or suspensions thereof using physical processes
    • B22F9/06Making metallic powder or suspensions thereof using physical processes starting from liquid material
    • B22F9/08Making metallic powder or suspensions thereof using physical processes starting from liquid material by casting, e.g. through sieves or in water, by atomising or spraying
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B22CASTING; POWDER METALLURGY
    • B22FWORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
    • B22F9/00Making metallic powder or suspensions thereof
    • B22F9/02Making metallic powder or suspensions thereof using physical processes
    • B22F9/06Making metallic powder or suspensions thereof using physical processes starting from liquid material
    • B22F9/08Making metallic powder or suspensions thereof using physical processes starting from liquid material by casting, e.g. through sieves or in water, by atomising or spraying
    • B22F9/082Making metallic powder or suspensions thereof using physical processes starting from liquid material by casting, e.g. through sieves or in water, by atomising or spraying atomising using a fluid
    • CCHEMISTRY; METALLURGY
    • C22METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22CALLOYS
    • C22C5/00Alloys based on noble metals
    • C22C5/06Alloys based on silver
    • CCHEMISTRY; METALLURGY
    • C22METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22CALLOYS
    • C22C5/00Alloys based on noble metals
    • C22C5/06Alloys based on silver
    • C22C5/08Alloys based on silver with copper as the next major constituent
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01BCABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B1/00Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors
    • H01B1/20Conductive material dispersed in non-conductive organic material
    • H01B1/22Conductive material dispersed in non-conductive organic material the conductive material comprising metals or alloys
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01BCABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B13/00Apparatus or processes specially adapted for manufacturing conductors or cables
    • H01B13/0026Apparatus for manufacturing conducting or semi-conducting layers, e.g. deposition of metal
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B22CASTING; POWDER METALLURGY
    • B22FWORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
    • B22F9/00Making metallic powder or suspensions thereof
    • B22F9/02Making metallic powder or suspensions thereof using physical processes
    • B22F9/06Making metallic powder or suspensions thereof using physical processes starting from liquid material
    • B22F9/08Making metallic powder or suspensions thereof using physical processes starting from liquid material by casting, e.g. through sieves or in water, by atomising or spraying
    • B22F2009/0804Dispersion in or on liquid, other than with sieves
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B22CASTING; POWDER METALLURGY
    • B22FWORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
    • B22F9/00Making metallic powder or suspensions thereof
    • B22F9/02Making metallic powder or suspensions thereof using physical processes
    • B22F9/06Making metallic powder or suspensions thereof using physical processes starting from liquid material
    • B22F9/08Making metallic powder or suspensions thereof using physical processes starting from liquid material by casting, e.g. through sieves or in water, by atomising or spraying
    • B22F9/082Making metallic powder or suspensions thereof using physical processes starting from liquid material by casting, e.g. through sieves or in water, by atomising or spraying atomising using a fluid
    • B22F2009/0824Making metallic powder or suspensions thereof using physical processes starting from liquid material by casting, e.g. through sieves or in water, by atomising or spraying atomising using a fluid with a specific atomising fluid
    • B22F2009/0828Making metallic powder or suspensions thereof using physical processes starting from liquid material by casting, e.g. through sieves or in water, by atomising or spraying atomising using a fluid with a specific atomising fluid with water
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B22CASTING; POWDER METALLURGY
    • B22FWORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
    • B22F2301/00Metallic composition of the powder or its coating
    • B22F2301/10Copper
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B22CASTING; POWDER METALLURGY
    • B22FWORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
    • B22F2301/00Metallic composition of the powder or its coating
    • B22F2301/25Noble metals, i.e. Ag Au, Ir, Os, Pd, Pt, Rh, Ru
    • B22F2301/255Silver or gold
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B22CASTING; POWDER METALLURGY
    • B22FWORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
    • B22F2304/00Physical aspects of the powder
    • B22F2304/10Micron size particles, i.e. above 1 micrometer up to 500 micrometer
    • CCHEMISTRY; METALLURGY
    • C22METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22CALLOYS
    • C22C1/00Making non-ferrous alloys
    • C22C1/04Making non-ferrous alloys by powder metallurgy
    • C22C1/0466Alloys based on noble metals

Abstract

There are provided a silver powder, which contains a small amount of carbon and which is difficult to aggregate. While a molten metal, which is prepared by melting silver to which 40 ppm or more of copper is added, is allowed to drop, a high-pressure water is sprayed onto the molten metal to rapidly cool and solidify the molten metal to produce a silver powder which contains 40 ppm or more of copper, 0.1 % by weight or less of carbon and 0.1 % by weight or less of oxygen and wherein the particle diameter (D50 diameter) corresponding to 50% of accumulation in volume-based cumulative distribution of the silver powder, which is measured by a laser diffraction particle size analyzer, is in the range of from 1 micrometer to 15 micrometers, the average particle diameter (SEM diameter) of a single particle being in the range of from 1 micrometer to 8 micrometers when it is measured by a field emission scanning electron microscope (SEM), the ratio (SEM diameter / D50 diameter) of the SEM diameter to the D50 diameter being in the range of from 0.3 to 1.0.

Description

銀粉及其製造方法Silver powder and its manufacturing method

發明領域
本發明係有關於銀粉及其製造方法,尤有關於適用於導電性糊材料之銀粉及其製造方法。
FIELD OF THE INVENTION The present invention relates to silver powder and its manufacturing method, and particularly to silver powder suitable for conductive paste materials and its manufacturing method.

發明背景
以往,作為用以形成太陽電池之電極、使用低溫共燒陶瓷(LTCC)之電子零件或積層陶瓷電感器(MLCI)等積層陶瓷電子零件之內部電極、積層陶瓷電容器或積層陶瓷電感器等之外部電極等的導電性糊材料,使用的是銀粉等金屬粉末。
BACKGROUND OF THE INVENTION Conventionally, as electrodes for forming solar cells, electronic parts using low-temperature co-fired ceramics (LTCC), multilayer ceramic electronic parts such as multilayer ceramic inductors (MLCI), multilayer ceramic capacitors or multilayer ceramic inductors, etc. For conductive paste materials such as external electrodes, metal powders such as silver powder are used.

就作為這種導電性糊材料使用之銀粉而言,已提出了一種銀粉之製造方法,係在銅等種粒子存在下於含銀離子之水性反應系統中添加還原劑以使銀粒子還原析出(可參照專利文獻1為例)。As for the silver powder used as this conductive paste material, a method for producing silver powder has been proposed, in which a reducing agent is added to an aqueous reaction system containing silver ions in the presence of copper and other particles to reduce and precipitate the silver particles ( (See Patent Document 1 as an example).

又提出了一種銀粉之製造方法,係於硝酸銀等銀水溶液中添加硬脂酸鹽等凝集抑制劑後,添加還原劑以使銀粒子還原析出(可參照專利文獻2為例)。In addition, a method for producing silver powder is proposed, in which an aggregation inhibitor such as stearate is added to a silver aqueous solution such as silver nitrate, and then a reducing agent is added to reduce and precipitate silver particles (see Patent Document 2 for an example).

先前技術文獻
專利文獻
專利文獻1:日本特開2009-235474號公報(段落編號0012-0014)
專利文獻2:日本特開2013-14790號公報(段落編號0023~0027)]
Prior Art Literature Patent Literature Patent Literature 1: Japanese Patent Laid-Open No. 2009-235474 (Paragraph No. 0012-0014)
Patent Document 2: Japanese Patent Laid-Open No. 2013-14790 (paragraph number 0023~0027)]

發明概要
發明欲解決之課題
但是,如專利文獻1~2所載之銀粉之製造方法這種利用濕式還原法製造銀粉的方法,製造過程中會在銀粉之粒子內部攝入視為雜質之含碳化合物。因此,若將利用這種方法製成之銀粉用作燒成型導電性糊之材料,並將該燒成型導電性糊塗佈於基板之後進行燒成而形成導電膜,則於燒成之際會自碳成分產生二氧化碳等氣體,將有導電膜因該氣體而產生裂痕以致導電膜與基板之密著性變差的問題。
SUMMARY OF THE INVENTION PROBLEMS TO BE SOLVED BY THE INVENTION However, such as the method of manufacturing silver powder as described in Patent Documents 1 to 2, the method of manufacturing silver powder by the wet reduction method, during the manufacturing process, the particles of silver powder are ingested as impurities. Carbon compounds. Therefore, if the silver powder produced by this method is used as a material for firing a conductive paste, and the firing conductive paste is applied to a substrate and fired to form a conductive film, the firing may When gas such as carbon dioxide is generated from the carbon component, there is a problem that the conductive film cracks due to the gas, so that the adhesion between the conductive film and the substrate becomes poor.

為解決所述問體,就以低價來製造炭等雜質含量極少之銀粉的方法而言,已知有一種藉由使已將銀熔解之熔化液落下同時噴附高壓水以使該熔化液急速冷卻凝固、即所謂的水霧化法來製造銀粉的方法。In order to solve the above problem, as for a method of manufacturing silver powder with a very low impurity content such as carbon at a low price, there is known a method in which a molten liquid in which silver has been melted is dropped while spraying high-pressure water to make the molten liquid A method of producing silver powder by rapid cooling and solidification, a so-called water atomization method.

但是,過去利用水霧化法進行之銀粉製造方法所製成的銀粉,容易凝集而使二次粒徑變大,若將如此凝集而成之銀粉作為導電性糊材料使用,不易形成表面平滑且薄的導電膜。However, the silver powder produced by the silver powder manufacturing method using the water atomization method in the past is easy to agglomerate and make the secondary particle size larger. If the silver powder thus aggregated is used as a conductive paste material, it is difficult to form a smooth surface. Thin conductive film.

近年由於積層陶瓷電感器(MLCI)等電子零件之內部電極等的小型化,在用於導電性糊之銀粉方面,尤為需要粒徑小之銀粉,但若銀粉之粒徑變小,銀粉就容易凝集。In recent years, due to the miniaturization of internal electrodes of electronic components such as multilayer ceramic inductors (MLCI), silver powder with a small particle size is particularly needed for silver powder used for conductive paste, but if the particle size of the silver powder becomes smaller, the silver powder is easier Agglutination.

因此,有鑑於上述習知問題點,本發明之目的便在於提供一種碳含量少且難以凝集之銀粉及其製造方法。Therefore, in view of the above-mentioned conventional problems, an object of the present invention is to provide a silver powder having a small carbon content and difficult to aggregate and a method for manufacturing the same.

用以解決課題之手段
本發明人等為解決上述課題而著意鑽研,結果發現,藉由使含銅40ppm以上之銀熔解所得的熔化液落下同時噴附高壓水以使該熔化液急速冷卻凝固,會製造出含銅40ppm以上且碳含量為0.1質量%以下之銀粉,而得以製造碳含量少且難以凝集之銀粉,至此完成本發明。
Means for Solving the Problems The inventors deliberately studied to solve the above-mentioned problems. As a result, they found that the molten liquid obtained by melting silver containing copper at 40 ppm or more was dropped and sprayed with high-pressure water to rapidly cool and solidify the molten liquid. A silver powder containing 40 ppm or more of copper and having a carbon content of 0.1% by mass or less can be produced, and a silver powder having a small carbon content and difficult to aggregate can be produced, and the present invention has been completed.

即,本發明之銀粉之特徵在於:含銅40ppm以上且碳含量為0.1質量%以下。That is, the silver powder of the present invention is characterized by having a copper content of 40 ppm or more and a carbon content of 0.1% by mass or less.

該銀粉中之銅含量宜為40~10000ppm。又,利用雷射繞射式粒度分布測定裝置測定該銀粉所得之以體積為基準之累積50%粒徑(D50 粒徑)宜為1~15μm,以場發射型掃描電子顯微鏡觀測該銀粉所得之單體粒子平均粒徑(SEM粒徑)相對於該銀粉之累積50%粒徑(D50 粒徑)之比(SEM粒徑/D50 粒徑)宜為0.3~1.0。又,該銀粉之振實密度相對於累積50%粒徑(D50 粒徑)之比(振實密度/D50 粒徑)宜為0.45~3.0g/(cm3 ・μm)。又,銀粉中之氧含量宜為0.1質量%以下。進而,銀粉之BET比表面積宜為0.1~1.0m2 /g,且振實密度宜為2~6g/cm3The copper content in the silver powder is preferably 40 to 10000 ppm. Furthermore, the volume-based cumulative 50% particle size (D 50 particle size) obtained by measuring the silver powder with a laser diffraction particle size distribution measuring device is preferably 1 to 15 μm, obtained by observing the silver powder with a field emission scanning electron microscope The ratio of the average particle diameter (SEM particle diameter) of the monomer particles to the cumulative 50% particle diameter (D 50 particle diameter) of the silver powder (SEM particle diameter/D 50 particle diameter) is preferably 0.3 to 1.0. In addition, the ratio of the tap density of the silver powder to the cumulative 50% particle size (D 50 particle size) (tap density/D 50 particle size) is preferably 0.45 to 3.0 g/(cm 3 ·μm). In addition, the oxygen content in the silver powder is preferably 0.1% by mass or less. Furthermore, the BET specific surface area of the silver powder is preferably 0.1 to 1.0 m 2 /g, and the tap density is preferably 2 to 6 g/cm 3 .

又,本發明之銀粉之製造方法之特徵在於:使含銅40ppm以上之銀熔解所得的熔化液落下同時噴附高壓水以使該熔化液急速冷卻凝固。該銀粉之製造方法中,熔化液中之銅含量宜為40~10000ppm。In addition, the method for producing the silver powder of the present invention is characterized in that the molten liquid obtained by melting silver containing 40 ppm or more of copper is dropped while spraying high-pressure water to rapidly cool and solidify the molten liquid. In the method of manufacturing the silver powder, the copper content in the melt is preferably 40 to 10000 ppm.

又,本發明之導電性糊之特徵在於:係於有機成分中分散有上述銀粉者。In addition, the conductive paste of the present invention is characterized in that the above-mentioned silver powder is dispersed in the organic component.

進而,本發明之導電膜之製造方法之特徵在於:將上述導電性糊塗佈於基板上之後進行燒成而製造導電膜。Furthermore, the method for manufacturing a conductive film of the present invention is characterized in that the conductive paste is applied to a substrate and then fired to produce a conductive film.

發明之效果
藉由本發明,可製造碳含量少且難以凝集之銀粉。
Effects of the Invention With the present invention, it is possible to produce silver powder having a small carbon content and difficult to aggregate.

用以實施發明之形態
本發明之銀粉之實施形態係銅含量為40ppm以上且碳含量為0.1質量%以下。
[Mode for carrying out the invention] The embodiment of the silver powder of the present invention has a copper content of 40 ppm or more and a carbon content of 0.1% by mass or less.

該銀粉中之銅含量(從防止銀粉凝集之觀點而言)宜為40ppm以上,從提升銀粉之抗氧化性及導電性之觀點而言,則宜為40~10000ppm,且40~2000ppm更佳,40~800ppm尤佳,230~750ppm最佳。The copper content in the silver powder (from the viewpoint of preventing aggregation of the silver powder) is preferably 40 ppm or more, and from the viewpoint of improving the oxidation resistance and conductivity of the silver powder, it is preferably 40 to 10000 ppm, and 40 to 2000 ppm is better, 40~800ppm is better, 230~750ppm is the best.

該銀粉中之碳含量為0.1質量%以下,且宜為0.03質量%以下,0.007質量%以下更佳。若將使用這種碳含量低之銀粉作為材料的燒成型導電性糊塗佈於基板之後進行燒成而形成導電膜,則於燒成之際自碳成分產生之二氧化碳等氣體的量少,導電膜便難因氣體而產生裂痕,可形成與基板之密著性佳的導電膜。The carbon content in the silver powder is 0.1% by mass or less, and preferably 0.03% by mass or less, more preferably 0.007% by mass or less. If a firing conductive paste using such a low carbon content silver powder as a material is applied to a substrate and then fired to form a conductive film, the amount of gas such as carbon dioxide generated from the carbon component during firing is small, which is conductive The film is hard to crack due to gas, and a conductive film with good adhesion to the substrate can be formed.

又,銀粉中之氧含量宜為0.1質量%以下,且0.01~0.07質量%更佳。若銀粉中之氧含量如所述一般低,便可充分燒結而形成高導電性之導電膜。In addition, the oxygen content in the silver powder is preferably 0.1% by mass or less, and 0.01 to 0.07% by mass is more preferable. If the oxygen content in the silver powder is generally low as described, it can be fully sintered to form a highly conductive conductive film.

利用雷射繞射式粒度分布測定裝置(藉由HELOS法)測定該銀粉所得之以體積為基準之累積50%粒徑(D50 粒徑),宜為1~15μm,若於將銀粉用作形成更加小型化之電子零件之內部電極等的導電性糊材料的情形下,則以1~8μm更佳,且1.2~7μm最佳。又,利用場發射型掃描電子顯微鏡(SEM)觀測該銀粉所得之單體粒子平均粒徑(SEM粒徑),若於將銀粉用作形成更加小型化之電子零件之內部電極等的導電性糊材料的情形下,係以1~8μm為佳,且1~5μm更佳,1.2~4μm最佳。又,利用場發射型掃描電子顯微鏡觀測該銀粉所得之單體粒子平均粒徑(SEM粒徑)相對於該銀粉之累積50%粒徑(D50 粒徑)之比(SEM粒徑/D50 粒徑),宜為0.3~1.0,且0.35~1.0更佳,0.5~1.0又更佳,0.65~1.0最佳。可以說,該比(SEM粒徑/D50 粒徑)(一次粒徑/二次粒徑)越大,銀粉之凝集越少。The cumulative 50% particle size (D 50 particle size) obtained by measuring the silver powder with a laser diffraction particle size distribution measuring device (by the HELOS method) based on volume is preferably 1 to 15 μm. If the silver powder is used as In the case of forming conductive paste materials such as internal electrodes of more miniaturized electronic parts, 1 to 8 μm is more preferable, and 1.2 to 7 μm is optimal. In addition, the average particle size (SEM particle size) of the monomer particles obtained by observing the silver powder using a field emission scanning electron microscope (SEM), if the silver powder is used as a conductive paste for forming an internal electrode of a more compact electronic component, etc. In the case of materials, 1~8μm is better, and 1~5μm is better, and 1.2~4μm is the best. Furthermore, the ratio of the average particle diameter (SEM particle diameter) of the monomer particles obtained by observing the silver powder with a field emission scanning electron microscope to the cumulative 50% particle diameter (D 50 particle diameter) of the silver powder (SEM particle diameter/D 50 Particle size), preferably 0.3~1.0, and 0.35~1.0 is better, 0.5~1.0 is better, 0.65~1.0 is the best. It can be said that the larger the ratio (SEM particle diameter/D 50 particle diameter) (primary particle diameter/secondary particle diameter), the less aggregation of the silver powder.

又,銀粉之BET比表面積宜為0.1~1.0m2 /g,且0.2~0.8m2 /g更佳,0.3~0.5m2 /g最佳。又,為於使用銀粉作為導電性糊材料以形成導電膜時能提高銀粉之填充性而形成導電性良好之導電膜,銀粉之振實密度宜為2~6g/cm3 ,且2.5~5.5g/cm3 更佳,3.5~5.5g/cm3 最佳。進而,為於使用銀粉作為導電性糊材料以形成導電膜時能提高銀粉之填充性而形成導電性良好之導電膜,銀粉之振實密度相對於累積50%粒徑(D50 粒徑)之比(振實密度/D50 粒徑)宜為0.45~3.0g/(cm3 ・μm),且0.8~2.8g/(cm3 ・μm)更佳,1.1~2.5g/(cm3 ・μm)最佳。In addition, the BET specific surface area of the silver powder is preferably 0.1 to 1.0 m 2 /g, and 0.2 to 0.8 m 2 /g is better, and 0.3 to 0.5 m 2 /g is the best. In addition, in order to improve the filling of the silver powder and form a conductive film with good conductivity when using silver powder as the conductive paste material to form the conductive film, the tap density of the silver powder is preferably 2 to 6 g/cm 3 and 2.5 to 5.5 g /cm 3 is better, 3.5~5.5g/cm 3 is the best. Furthermore, in order to improve the filling of the silver powder and form a conductive film with good conductivity when using silver powder as the conductive paste material to form the conductive film, the tap density of the silver powder relative to the cumulative 50% particle size (D 50 particle size) The ratio (tap density/D 50 particle size) should be 0.45~3.0g/(cm 3 ·μm), and 0.8~2.8g/(cm 3 ·μm) is better, 1.1~2.5g/(cm 3 ·μm) )optimal.

另外,上述銀粉之形狀,可為球狀或小片狀等各種顆粒狀形狀之任何形狀,亦可為形狀不一的不定形狀。In addition, the shape of the silver powder may be any of various granular shapes such as a spherical shape or a platelet shape, or may be an indefinite shape with different shapes.

上述銀粉之實施形態可藉由本發明之銀粉之製造方法的實施形態來製造。The embodiment of the above-mentioned silver powder can be produced by the embodiment of the method for producing silver powder of the present invention.

本發明之銀粉之製造方法的實施形態,係使於銀中(宜以銅單體或Ag-Cu合金之形態)添加銅40ppm以上(較佳為40~10000ppm、更佳為40~2000ppm、尤宜為40~800ppm、最佳為230~750ppm)並經熔解所得(宜較銅熔點約962℃高300~720℃之溫度的)熔化液落下,同時於(最好是大氣環境中或(氫、一氧化碳、氬、氮等)非氧化性氣體環境中且水壓70~400MPa(更佳為90~280MPa))下噴附(屬純水或pH8~12鹼性水之)高壓水,以使該熔化液急速冷卻凝固。The embodiment of the production method of the silver powder of the present invention is to add 40 ppm or more of copper (preferably in the form of copper monomer or Ag-Cu alloy) to silver (preferably 40 to 10000 ppm, more preferably 40 to 2000 ppm, especially It should be 40~800ppm, the best is 230~750ppm) and melted (preferably 300~720°C higher than the melting point of copper of about 962°C). The melt falls at the same time (preferably in atmospheric environment or (hydrogen , Carbon monoxide, argon, nitrogen, etc.) in a non-oxidizing gas environment and under a water pressure of 70 to 400 MPa (more preferably 90 to 280 MPa)) spray high pressure water (of pure water or alkaline water with a pH of 8 to 12) to make The melt is rapidly cooled and solidified.

若藉由噴附高壓水之所謂水霧化法,由在銀中添加微量(如40ppm以上、較佳為40~10000ppm、更佳為40~2000ppm、尤宜為40~800ppm、最佳為230~750ppm)之銅的熔化液製造銀粉,可獲得粒徑小、碳含量少且難以凝集之銀粉。If by spraying high-pressure water, the so-called water atomization method, by adding traces of silver (such as 40ppm or more, preferably 40 ~ 10000ppm, more preferably 40 ~ 2000ppm, especially preferably 40 ~ 800ppm, the best is 230 ~750ppm) of molten copper to produce silver powder, silver powder with small particle size, low carbon content and difficult to agglomerate can be obtained.

又,利用水霧化法由熔化液製造銀粉時,藉由調整熔化液之溫度與高壓水之壓力,可調整銀粉之平均粒徑。舉例言之,可藉由提高熔化液之溫度或高壓水之壓力而縮小銀粉之平均粒徑。In addition, when the silver powder is produced from the melt by the water atomization method, the average particle size of the silver powder can be adjusted by adjusting the temperature of the melt and the pressure of high-pressure water. For example, the average particle size of silver powder can be reduced by increasing the temperature of the melt or the pressure of high-pressure water.

又,利用水霧化法由熔化液製造銀粉時,可對使熔化液落下同時噴附高壓水以使熔化液急速冷卻凝固所得的漿液進行固液分離,並將所得固形物乾燥而獲得銀粉。另外,必要時,可於經固液分離所得之固形物乾燥前進行水洗,亦可於乾燥後進行碎解或分級來調整粒度。In addition, when silver powder is produced from the melt by the water atomization method, the slurry obtained by spraying high pressure water while dropping the melt to rapidly cool and solidify the melt can be solid-liquid separated, and the resulting solid can be dried to obtain silver powder. In addition, if necessary, the solids obtained by the solid-liquid separation can be washed with water before drying, or can be broken or classified after drying to adjust the particle size.

使用本發明之銀粉之實施形態作為(燒成型導電性糊等)導電性糊之材料時,可將該銀粉分散於(飽和脂肪族烴類、不飽和脂肪族烴類、酮類、芳香族烴類、二醇謎類、酯類、醇類等)有機溶劑或(乙基纖維素及丙烯酸樹脂等)黏結劑樹脂等有機成分中來製造導電性糊。又,必要時,可於導電性糊添加玻璃料、無機氧化物、分散劑等。When the embodiment of the silver powder of the present invention is used as a material for (sintered conductive paste, etc.) conductive paste, the silver powder can be dispersed in (saturated aliphatic hydrocarbons, unsaturated aliphatic hydrocarbons, ketones, aromatic Conductive pastes are produced from organic components such as hydrocarbons, glycols, esters, alcohols, etc.) organic solvents or (ethyl cellulose, acrylic resins, etc.) binder resins. In addition, if necessary, a glass frit, an inorganic oxide, a dispersant, etc. may be added to the conductive paste.

從導電性糊之製造成本及導電膜之導電性的觀點而言,導電性糊中之銀粉含量宜為5~98質量%,且70~95質量%更佳。又,導電性糊中之銀粉可與1種以上其他金屬粉末(銀與錫之合金粉末、錫粉等金屬粉末)混合使用。該金屬粉末可以是與本發明之銀粉之實施形態為不同形狀或粒徑的金屬粉末。為了燒成導電性糊而形成薄的導電膜,該金屬粉末之利用雷射繞射式粒度分布測定裝置測得之以體積為基準之累積50%粒徑(D50 粒徑),宜為0.5~20μm。又,該金屬粉末於導電性糊中之含量宜為1~94質量%,且4~29質量%更佳。另外,導電性糊中之銀粉與金屬粉末的含量合計宜為60~99質量%。又,考慮到銀粉於導電性糊中之分散性及導電性糊之適切黏度,導電性糊中之有機溶劑含量宜為0.8~20質量%,且0.8~15質量%更佳。該有機溶劑可混合2種以上使用。又,從銀粉於導電性糊中之分散性及導電性糊之導電性的觀點而言,導電性糊中之黏結劑樹脂含量宜為0.1~10質量%,且0.1~6質量%更佳。該黏結劑樹脂可混合2種以上使用。又,從導電性糊之燒結性的觀點而言,導電性糊中之玻璃料含量宜為 0.1~20質量%,且0.1~10質量%更佳。該玻璃料可混合2種以上使用。From the viewpoint of the manufacturing cost of the conductive paste and the conductivity of the conductive film, the silver powder content in the conductive paste is preferably 5 to 98% by mass, and more preferably 70 to 95% by mass. In addition, the silver powder in the conductive paste can be mixed with one or more other metal powders (metal powder such as alloy powder of silver and tin, tin powder, etc.). The metal powder may be a metal powder having a shape or particle size different from the embodiment of the silver powder of the present invention. In order to fire a conductive paste to form a thin conductive film, the cumulative 50% particle size (D 50 particle size) of the metal powder measured by a laser diffraction particle size distribution measuring device based on volume is preferably 0.5 ~20μm. Moreover, the content of the metal powder in the conductive paste is preferably 1 to 94% by mass, and more preferably 4 to 29% by mass. In addition, the total content of silver powder and metal powder in the conductive paste is preferably 60 to 99% by mass. In addition, considering the dispersibility of the silver powder in the conductive paste and the appropriate viscosity of the conductive paste, the content of the organic solvent in the conductive paste is preferably 0.8 to 20% by mass, and 0.8 to 15% by mass is better. This organic solvent can be used by mixing two or more kinds. In addition, from the viewpoint of the dispersibility of silver powder in the conductive paste and the conductivity of the conductive paste, the content of the binder resin in the conductive paste is preferably 0.1 to 10% by mass, and more preferably 0.1 to 6% by mass. The binder resin can be used by mixing two or more kinds. In addition, from the viewpoint of the sinterability of the conductive paste, the glass frit content in the conductive paste is preferably 0.1 to 20% by mass, and more preferably 0.1 to 10% by mass. The glass frit can be used by mixing two or more kinds.

此種導電性糊,例如可藉由下述方式製作:計量各構成要素並放入預定容器中,利用臼式研磨機、萬能攪拌機、捏合機等進行預混練後,以三輥磨機進行正式混練。又,必要時,可在之後添加有機溶劑進行黏度調整。此外,亦可在將玻璃料或無機氧化物與有機溶劑或黏結劑樹脂混練使粒度下降後,最後追加銀粉以進行正式混練。Such a conductive paste can be produced, for example, by measuring each component and placing it in a predetermined container, pre-kneading it with a mortar mill, universal mixer, kneader, etc. Mixing. In addition, if necessary, an organic solvent can be added later to adjust the viscosity. In addition, after mixing glass frit or inorganic oxide with organic solvent or binder resin to reduce the particle size, finally add silver powder for formal mixing.

可藉由浸漬或(金屬模板印刷、網版印刷、噴墨印刷等之)印刷等,將該導電性糊於(陶瓷基板或介電體層等之)基板上塗佈成預定圖案形狀之後進行燒成而形成導電膜。藉由浸漬來塗佈導電性糊時,係將基板浸漬於導電性糊中而形成塗膜,再對該塗膜進行燒成然後將所得之導電膜中不需要的部分去除,便可於基板上形成預定圖案形狀之導電膜。The conductive paste can be applied on the substrate (ceramic substrate or dielectric layer, etc.) to a predetermined pattern shape by dipping or printing (metal stencil printing, screen printing, inkjet printing, etc.) and then fired. To form a conductive film. When the conductive paste is applied by dipping, the substrate is immersed in the conductive paste to form a coating film, and then the coating film is fired, and then unnecessary parts of the resulting conductive film are removed to be applied to the substrate A conductive film with a predetermined pattern shape is formed thereon.

塗佈於基板上之導電性糊的燒成,可於氮、氬、氫、一氧化碳等非氧化性氣體環境下進行,但銀粉卻難以氧化,因此出於成本面的考量,宜於大氣環境下進行。另外,導電性糊之燒成溫度宜為600~1000℃左右,且700~900℃左右更佳。又,於導電性糊之燒成前,可利用真空乾燥等進行預乾燥藉以去除導電性糊中之有機溶劑等揮發成分。此外,導電性糊含黏結劑樹脂之情形下,宜於導電性糊之燒成前以250~400℃之低溫進行加熱,作為降低黏結劑樹脂含量之脫除黏結劑步驟。The firing of the conductive paste coated on the substrate can be carried out in a non-oxidizing gas environment such as nitrogen, argon, hydrogen, carbon monoxide, etc., but the silver powder is difficult to oxidize, so it is suitable for atmospheric environment due to cost considerations get on. In addition, the firing temperature of the conductive paste is preferably about 600 to 1000°C, and more preferably about 700 to 900°C. In addition, before firing the conductive paste, vacuum drying or the like may be used for pre-drying to remove volatile components such as organic solvents in the conductive paste. In addition, in the case where the conductive paste contains a binder resin, it is appropriate to heat the conductive paste at a low temperature of 250 to 400°C before firing, as a binder removal step to reduce the content of the binder resin.

實施例
以下,就本發明之銀粉及其製造方法之實施例詳細說明。
EXAMPLES Hereinafter, examples of the silver powder of the present invention and its production method will be described in detail.

實施例1
於大氣環境中將純度99.99質量%之銀珠23.96kg與(含銅228ppm之)Ag-Cu合金6.04kg加熱至1600℃熔解成熔化液(含銅46ppm之銀熔化液)並令該熔化液從餵槽下部落下,同時於大氣環境中藉由水霧化裝置在水壓150MPa且水量160L/分鐘下噴附鹼性水(對純水21.6m3 添加苛性鈉157.55g而成之鹼性水溶液(pH10.7))以使該熔化液急速冷卻凝固,再對所得漿液進行固液分離,並將固形物進行水洗、乾燥而獲得(含微量銅之)銀粉。
Example 1
In an atmospheric environment, 23.96 kg of silver beads with a purity of 99.99% by mass and 6.04 kg of Ag-Cu alloy (containing 228 ppm of copper) were heated to 1600°C to melt into a molten solution (a silver molten solution containing 46 ppm of copper) and the molten solution was removed from Feed the trough under the tribe, at the same time in the atmospheric environment by the water atomization device at a water pressure of 150MPa and a water volume of 160L/min, spray alkaline water (addition of caustic soda 157.55g to pure water 21.6m 3 ( pH 10.7)) to rapidly cool and solidify the molten liquid, and then solid-liquid separation of the resulting slurry, and washing and drying the solid matter to obtain silver powder (containing trace copper).

關於經上述方式獲得之銀粉的單體粒徑(一次粒徑),係以場發射型掃描電子顯微鏡(SEM)(Hitachi High-Technologies Corporation製之S-4700)在倍率5000倍下觀測,然後從任意30個粒子之菲烈直徑(Feret's diameter)的平均值求出單體粒子之平均粒徑(SEM粒徑)。結果得出銀粉之SEM粒徑(一次粒徑)為2.35μm。又,關於銀粉之凝集粒徑(二次粒徑),係使用雷射繞射式粒度分布測定裝置(SYMPATEC公司製之HELOS粒度分布測定裝置(HELOS&RODOS(氣流式分散模式)))在分散壓5bar下測定以體積為基準之累積50%粒徑(D50 粒徑),然後得出銀粉之累積50%粒徑(D50 粒徑)為6.0μm。另外,算出SEM粒徑(一次粒徑)相對於累積50%粒徑(D50 粒徑)(二次粒徑)之比(一次粒徑/二次粒徑)為0.39。The monomer particle size (primary particle size) of the silver powder obtained in the above manner was observed with a field emission scanning electron microscope (SEM) (S-4700 manufactured by Hitachi High-Technologies Corporation) at a magnification of 5000 times, and then from The average particle size (SEM particle size) of the monomer particles is determined from the average value of the Feret's diameter of any 30 particles. As a result, the SEM particle size (primary particle size) of the silver powder was 2.35 μm. As for the aggregated particle size (secondary particle size) of silver powder, a laser diffraction particle size distribution measuring device (HELOS particle size distribution measuring device (HELOS & RODOS (air flow dispersion mode)) manufactured by SYMPATEC) was used at a dispersion pressure of 5 bar Next, the cumulative 50% particle size (D 50 particle size) based on volume is measured, and then the cumulative 50% particle size (D 50 particle size) of the silver powder is 6.0 μm. In addition, the ratio (primary particle diameter/secondary particle diameter) of the SEM particle diameter (primary particle diameter) to the cumulative 50% particle diameter (D 50 particle diameter) (secondary particle diameter) was calculated to be 0.39.

又,利用感應耦合電漿(ICP)發射光譜分析裝置(Hitachi High-Tech Science Corporation製之SPS3520V)進行銀粉之組成分析,然後得出銀粉中之銅含量為熔化液中之銅含量的±10%範圍內。Furthermore, the composition analysis of the silver powder was performed using an inductively coupled plasma (ICP) emission spectrometer (SPS3520V manufactured by Hitachi High-Tech Science Corporation), and then the copper content in the silver powder was ±10% of the copper content in the melt Within range.

又,利用碳・硫分析裝置((股)堀場製作所製之EMIA-920V2)測定銀粉中之碳含量,得出碳含量為0.004質量%,並利用氧・氮・氫分析裝置((股)堀場製作所製之EMGA-920)測定氧含量,得出氧含量為0.040質量%。In addition, the carbon content in the silver powder was measured using a carbon/sulfur analyzer (EMIA-920V2 manufactured by Horiba Manufacturing Co., Ltd.), and the carbon content was 0.004% by mass, and an oxygen, nitrogen, and hydrogen analyzer (Horiba) was used. The EMGA-920 produced by the company was used to measure the oxygen content and found that the oxygen content was 0.040% by mass.

又,使用BET比表面積測定器(MOUNTECH Co., Ltd.製之Macsorb),於測定器內在105℃下通入氮氣20分鐘以進行除氣,然後通入氮與氦之混合氣體(N2 :30體積%,He:70體積%),與此同時,藉由BET單點法測定銀粉之BET比表面積,然後得出BET比表面積為0.34m2 /g。Furthermore, using a BET specific surface area measuring instrument (Macsorb manufactured by MOUNTECH Co., Ltd.), nitrogen gas was passed through the measuring instrument at 105° C. for 20 minutes for degassing, and then a mixed gas of nitrogen and helium (N 2 : 30% by volume, He: 70% by volume), at the same time, the BET specific surface area of the silver powder was measured by the BET single-point method, and then the BET specific surface area was 0.34 m 2 /g.

進而,關於銀粉之振實密度(TAP),以與日本專利特開2007-263860號公報所載方法相同之方式,於內徑6mm×高度11.9mm之有底圓筒形模具中填充銀粉直到容積之80%而形成銀粉層,並對該銀粉層之上面均勻施加0.160N/m2 之壓力,於該壓力下壓縮銀粉直到無法再更密實後,測定銀粉層之高度,且由該銀粉層高度之測定值與所填充之銀粉重量求得銀粉之密度。結果得出振實密度為3.0g/cm3 。另外,算出銀粉之振實密度(TAP)相對於累積50%粒徑(D50 粒徑)之比(TAP/D50 粒徑)為0.50g/(cm3 ・μm)。Furthermore, regarding the tap density (TAP) of silver powder, in the same manner as the method described in Japanese Patent Laid-Open No. 2007-263860, a cylindrical mold with a bottom of 6 mm in inner diameter × 11.9 mm in height is filled with silver powder up to the volume 80% to form a silver powder layer, and uniformly apply a pressure of 0.160 N/m 2 on the top of the silver powder layer, compress the silver powder under this pressure until it can no longer be denser, measure the height of the silver powder layer, and determine the height of the silver powder layer The measured value and the weight of the silver powder filled to obtain the density of the silver powder. As a result, the tap density was 3.0 g/cm 3 . In addition, the ratio of the tap density (TAP) of the silver powder to the cumulative 50% particle size (D 50 particle size) (TAP/D 50 particle size) was 0.50 g/(cm 3 ·μm).

實施例2
除了使用熔解銀珠25kg與(含銅581ppm之)Ag-Cu合金15kg而成之熔化液(含銅218ppm之銀熔化液)外,以與實施例1相同之方法製得(含微量銅之)銀粉。
Example 2
It was prepared in the same manner as in Example 1 (with trace copper), except that a molten solution of 25 kg of silver beads and 15 kg of Ag-Cu alloy (containing 581 ppm of copper) was used (a silver molten solution containing 218 ppm of copper). Silver powder.

針對依所述方法製得之銀粉求算SEM粒徑(一次粒徑),並測定累積50%粒徑(D50 粒徑)(二次粒徑),且求算SEM粒徑(一次粒徑)相對於累積50%粒徑(D50 粒徑)(二次粒徑)之比(SEM粒徑/D50 粒徑)(一次粒徑/二次粒徑),然後得出:銀粉之SEM粒徑(一次粒徑)為2.34μm,累積50%粒徑(D50 粒徑)為4.1μm,且SEM粒徑/D50 粒徑(一次粒徑/二次粒徑)為0.57。Calculate the SEM particle size (primary particle size) of the silver powder produced according to the above method, and measure the cumulative 50% particle size (D 50 particle size) (secondary particle size), and calculate the SEM particle size (primary particle size) ) Relative to the cumulative 50% particle size (D 50 particle size) (secondary particle size) ratio (SEM particle size/D 50 particle size) (primary particle size/secondary particle size), and then: SEM of silver powder The particle size (primary particle size) is 2.34 μm, the cumulative 50% particle size (D 50 particle size) is 4.1 μm, and the SEM particle size/D 50 particle size (primary particle size/secondary particle size) is 0.57.

又,以與實施例1相同之方法進行銀粉之組成分析,測定銀粉中之碳含量及氧含量,並求算銀粉之BET比表面積及振實密度(TAP),且求算銀粉之振實密度(TAP)相對於累積50%粒徑(D50 粒徑)之比(TAP/D50 粒徑),然後得出:銀粉中之銅含量為熔化液中之銅含量的±10%範圍內,碳含量為0.002質量%,氧含量為0.041質量%,BET比表面積為0.36m2 /g,振實密度為4.1g/cm3 ,且銀粉之振實密度(TAP)相對於累積50%粒徑(D50 粒徑)之比(TAP/D50 粒徑)為1.00g/(cm3 ・μm)。In addition, the composition analysis of the silver powder was performed in the same manner as in Example 1, the carbon content and oxygen content in the silver powder were measured, and the BET specific surface area and tap density (TAP) of the silver powder were calculated, and the tap density of the silver powder was calculated (TAP) relative to the cumulative 50% particle size (D 50 particle size) ratio (TAP/D 50 particle size), and then obtained: the copper content in the silver powder is within ±10% of the copper content in the melt, The carbon content is 0.002% by mass, the oxygen content is 0.041% by mass, the BET specific surface area is 0.36 m 2 /g, the tap density is 4.1 g/cm 3 , and the tap density (TAP) of the silver powder is relative to the cumulative 50% particle size The ratio (D 50 particle size) (TAP/D 50 particle size) is 1.00 g/(cm 3 ·μm).

實施例3
除了使用熔解銀珠24kg與(含銅595ppm之)Ag-Cu合金16kg而成之熔化液(含銅238ppm之銀熔化液)外,以與實施例1相同之方法製得(含微量銅之)銀粉。
Example 3
It was prepared in the same manner as in Example 1 (with trace copper), except for using a molten solution of 24kg of silver beads and 16kg of Ag-Cu alloy containing 595ppm of copper (a silver molten solution containing 238ppm of copper). Silver powder.

針對依所述方法製得之銀粉求算SEM粒徑(一次粒徑),並測定累積50%粒徑(D50 粒徑)(二次粒徑),且求算SEM粒徑(一次粒徑)相對於累積50%粒徑(D50 粒徑)(二次粒徑)之比(SEM粒徑/D50 粒徑)(一次粒徑/二次粒徑),然後得出:銀粉之SEM粒徑(一次粒徑)為2.19μm,累積50%粒徑(D50 粒徑)為2.9μm,且SEM粒徑/D50 粒徑(一次粒徑/二次粒徑)為0.75。Calculate the SEM particle size (primary particle size) of the silver powder produced according to the above method, and measure the cumulative 50% particle size (D 50 particle size) (secondary particle size), and calculate the SEM particle size (primary particle size) ) Relative to the cumulative 50% particle size (D 50 particle size) (secondary particle size) ratio (SEM particle size/D 50 particle size) (primary particle size/secondary particle size), and then: SEM of silver powder The particle diameter (primary particle diameter) is 2.19 μm, the cumulative 50% particle diameter (D 50 particle diameter) is 2.9 μm, and the SEM particle diameter/D 50 particle diameter (primary particle diameter/secondary particle diameter) is 0.75.

又,以與實施例1相同之方法進行銀粉之組成分析,測定銀粉中之碳含量及氧含量,並求算銀粉之BET比表面積及振實密度(TAP),且求算銀粉之振實密度(TAP)相對於累積50%粒徑(D50 粒徑)之比(TAP/D50 粒徑),然後得出:銀粉中之銅含量為熔化液中之銅含量的±10%範圍內,碳含量為0.004質量%,氧含量為0.051質量%,BET比表面積為0.42m2 /g,振實密度為4.2g/cm3 ,且銀粉之振實密度(TAP)相對於累積50%粒徑(D50 粒徑)之比(TAP/D50 粒徑)為1.45g/(cm3 ・μm)。In addition, the composition analysis of the silver powder was performed in the same manner as in Example 1, the carbon content and oxygen content in the silver powder were measured, and the BET specific surface area and tap density (TAP) of the silver powder were calculated, and the tap density of the silver powder was calculated (TAP) relative to the cumulative 50% particle size (D 50 particle size) ratio (TAP/D 50 particle size), and then obtained: the copper content in the silver powder is within ±10% of the copper content in the melt, The carbon content is 0.004% by mass, the oxygen content is 0.051% by mass, the BET specific surface area is 0.42m 2 /g, the tap density is 4.2g/cm 3 , and the tap density (TAP) of the silver powder is relative to the cumulative 50% particle size The ratio (D 50 particle size) (TAP/D 50 particle size) is 1.45 g/(cm 3 ·μm).

實施例4
除了使用熔解銀珠25kg與(含銅675ppm之)Ag-Cu合金15kg而成之熔化液(含銅253ppm之銀熔化液)外,以與實施例1相同之方法製得(含微量銅之)銀粉。
Example 4
It was prepared in the same manner as in Example 1 (with trace copper), except for using a molten solution of 25 kg of silver beads and 15 kg of Ag-Cu alloy containing 675 ppm of copper (a silver molten solution containing 253 ppm of copper). Silver powder.

針對依所述方法製得之銀粉求算SEM粒徑(一次粒徑),並測定累積50%粒徑(D50 粒徑)(二次粒徑),且求算SEM粒徑(一次粒徑)相對於累積50%粒徑(D50 粒徑)(二次粒徑)之比(SEM粒徑/D50 粒徑)(一次粒徑/二次粒徑),然後得出:銀粉之SEM粒徑(一次粒徑)為2.51μm,累積50%粒徑(D50 粒徑)為3.1μm,SEM粒徑/D50 粒徑(一次粒徑/二次粒徑)為0.81。Calculate the SEM particle size (primary particle size) of the silver powder produced according to the above method, and measure the cumulative 50% particle size (D 50 particle size) (secondary particle size), and calculate the SEM particle size (primary particle size) ) Relative to the cumulative 50% particle size (D 50 particle size) (secondary particle size) ratio (SEM particle size/D 50 particle size) (primary particle size/secondary particle size), and then: SEM of silver powder The particle diameter (primary particle diameter) was 2.51 μm, the cumulative 50% particle diameter (D 50 particle diameter) was 3.1 μm, and the SEM particle diameter/D 50 particle diameter (primary particle diameter/secondary particle diameter) was 0.81.

又,以與實施例1相同之方法進行銀粉之組成分析,測定銀粉中之碳含量及氧含量,並求算銀粉之BET比表面積及振實密度(TAP),且求算銀粉之振實密度(TAP)相對於累積50%粒徑(D50 粒徑)之比(TAP/D50 粒徑),然後得出:銀粉中之銅含量為熔化液中之銅含量的±10%範圍內,碳含量為0.003質量%,氧含量為0.036質量%,BET比表面積為0.36m2 /g,振實密度為5.0g/cm3 ,且銀粉之振實密度(TAP)相對於累積50%粒徑(D50 粒徑)之比(TAP/D50 粒徑)為1.61g/(cm3 ・μm)。In addition, the composition analysis of the silver powder was performed in the same manner as in Example 1, the carbon content and oxygen content in the silver powder were measured, and the BET specific surface area and tap density (TAP) of the silver powder were calculated, and the tap density of the silver powder was calculated (TAP) relative to the cumulative 50% particle size (D 50 particle size) ratio (TAP/D 50 particle size), and then obtained: the copper content in the silver powder is within ±10% of the copper content in the melt, The carbon content is 0.003% by mass, the oxygen content is 0.036% by mass, the BET specific surface area is 0.36 m 2 /g, the tap density is 5.0 g/cm 3 , and the tap density (TAP) of the silver powder is relative to the cumulative 50% particle size The ratio (D 50 particle size) (TAP/D 50 particle size) is 1.61 g/(cm 3 ·μm).

實施例5
除了使用熔解銀珠18.62kg與(含銅975ppm之)Ag-Cu合金11.38kg而成之熔化液(含銅370ppm之銀熔化液)外,以與實施例1相同之方法製得(含微量銅之)銀粉。
Example 5
It was prepared in the same manner as in Example 1 (except for trace copper), except for using a molten solution of 18.62 kg of silver beads and 11.38 kg of Ag-Cu alloy (containing 975 ppm of copper) (a silver molten solution containing 370 ppm of copper). Of) silver powder.

針對依所述方法製得之銀粉求算SEM粒徑(一次粒徑),並測定累積50%粒徑(D50 粒徑)(二次粒徑),且求算SEM粒徑(一次粒徑)相對於累積50%粒徑(D50 粒徑)(二次粒徑)之比(SEM粒徑/D50 粒徑)(一次粒徑/二次粒徑),然後得出:銀粉之SEM粒徑(一次粒徑)為2.54μm,累積50%粒徑(D50 粒徑)為2.8μm,且SEM粒徑/D50 粒徑(一次粒徑/二次粒徑)為0.90。Calculate the SEM particle size (primary particle size) of the silver powder produced according to the above method, and measure the cumulative 50% particle size (D 50 particle size) (secondary particle size), and calculate the SEM particle size (primary particle size) ) Relative to the cumulative 50% particle size (D 50 particle size) (secondary particle size) ratio (SEM particle size/D 50 particle size) (primary particle size/secondary particle size), and then: SEM of silver powder The particle diameter (primary particle diameter) was 2.54 μm, the cumulative 50% particle diameter (D 50 particle diameter) was 2.8 μm, and the SEM particle diameter/D 50 particle diameter (primary particle diameter/secondary particle diameter) was 0.90.

又,以與實施例1相同之方法進行銀粉之組成分析,測定銀粉中之碳含量及氧含量,並求算銀粉之BET比表面積及振實密度(TAP),且求算銀粉之振實密度(TAP)相對於累積50%粒徑(D50 粒徑)之比(TAP/D50 粒徑),然後得出:銀粉中之銅含量為熔化液中之銅含量的±10%範圍內,碳含量為0.004質量%,氧含量為0.049質量%,BET比表面積為0.37m2 /g,振實密度為4.7g/cm3 ,且銀粉之振實密度(TAP)相對於累積50%粒徑(D50 粒徑)之比(TAP/D50 粒徑)為1.68g/(cm3 ・μm)。In addition, the composition analysis of the silver powder was performed in the same manner as in Example 1, the carbon content and oxygen content in the silver powder were measured, and the BET specific surface area and tap density (TAP) of the silver powder were calculated, and the tap density of the silver powder was calculated (TAP) relative to the cumulative 50% particle size (D 50 particle size) ratio (TAP/D 50 particle size), and then obtained: the copper content in the silver powder is within ±10% of the copper content in the melt, The carbon content is 0.004% by mass, the oxygen content is 0.049% by mass, the BET specific surface area is 0.37m 2 /g, the tap density is 4.7g/cm 3 , and the tap density (TAP) of the silver powder is relative to the cumulative 50% particle size The ratio (D 50 particle size) (TAP/D 50 particle size) was 1.68 g/(cm 3 ·μm).

實施例6
除了使用熔解銀珠6.27kg與(含銅1343ppm之)Ag-Cu合金2.43kg而成之熔化液(含銅375ppm之銀熔化液)外,以與實施例1相同之方法製得(含微量銅之)銀粉。
Example 6
Except for using 6.27kg of melted silver beads and 2.43kg of Ag-Cu alloy (containing 1343ppm of copper) (a silver melting solution containing 375ppm of copper), it was prepared in the same manner as in Example 1 (containing trace copper Of) silver powder.

針對依所述方法製得之銀粉求算SEM粒徑(一次粒徑),並測定累積50%粒徑(D50 粒徑)(二次粒徑),且求算SEM粒徑(一次粒徑)相對於累積50%粒徑(D50 粒徑)(二次粒徑)之比(SEM粒徑/D50 粒徑)(一次粒徑/二次粒徑),然後得出:銀粉之SEM粒徑(一次粒徑)為2.83μm,累積50%粒徑(D50 粒徑)為3.1μm,且SEM粒徑/D50 粒徑(一次粒徑/二次粒徑)為0.91。Calculate the SEM particle size (primary particle size) of the silver powder produced according to the above method, and measure the cumulative 50% particle size (D 50 particle size) (secondary particle size), and calculate the SEM particle size (primary particle size) ) Relative to the cumulative 50% particle size (D 50 particle size) (secondary particle size) ratio (SEM particle size/D 50 particle size) (primary particle size/secondary particle size), and then: SEM of silver powder The particle diameter (primary particle diameter) was 2.83 μm, the cumulative 50% particle diameter (D 50 particle diameter) was 3.1 μm, and the SEM particle diameter/D 50 particle diameter (primary particle diameter/secondary particle diameter) was 0.91.

又,以與實施例1相同之方法進行銀粉之組成分析,測定銀粉中之碳含量及氧含量,並求算銀粉之BET比表面積及振實密度(TAP),且求算銀粉之振實密度(TAP)相對於累積50%粒徑(D50 粒徑)之比(TAP/D50 粒徑),然後得出:銀粉中之銅含量為熔化液中之銅含量的±10%範圍內,碳含量為0.006質量%,氧含量為0.069質量%,BET比表面積為0.35m2 /g,振實密度為4.7g/cm3 ,銀粉之振實密度(TAP)相對於累積50%粒徑(D50 粒徑)之比(TAP/D50 粒徑)為1.52g/(cm3 ・μm)。In addition, the composition analysis of the silver powder was performed in the same manner as in Example 1, the carbon content and oxygen content in the silver powder were measured, and the BET specific surface area and tap density (TAP) of the silver powder were calculated, and the tap density of the silver powder was calculated (TAP) relative to the cumulative 50% particle size (D 50 particle size) ratio (TAP/D 50 particle size), and then obtained: the copper content in the silver powder is within ±10% of the copper content in the melt, The carbon content is 0.006% by mass, the oxygen content is 0.069% by mass, the BET specific surface area is 0.35 m 2 /g, the tap density is 4.7 g/cm 3 , and the tap density (TAP) of the silver powder is relative to the cumulative 50% particle size ( The ratio of D 50 particle size) (TAP/D 50 particle size) is 1.52 g/(cm 3 ·μm).

實施例7
除了使用熔解銀珠29.79kg與(含銅1508ppm之)Ag-Cu合金10.21kg而成之熔化液(含銅385ppm之銀熔化液)外,以與實施例1相同之方法製得(含微量銅之)銀粉。
Example 7
It was prepared in the same manner as in Example 1 (with trace copper), except that 29.79 kg of melted silver beads and 10.21 kg of Ag-Cu alloy (containing 1508 ppm of copper) were used (containing 385 ppm of silver melt). Of) silver powder.

針對依所述方法製得之銀粉求算SEM粒徑(一次粒徑),並測定累積50%粒徑(D50 粒徑)(二次粒徑),且求算SEM粒徑(一次粒徑)相對於累積50%粒徑(D50 粒徑)(二次粒徑)之比(SEM粒徑/D50 粒徑)(一次粒徑/二次粒徑),然後得出:銀粉之SEM粒徑(一次粒徑)為2.57μm,累積50%粒徑(D50 粒徑)為2.9μm,且SEM粒徑/D50 粒徑(一次粒徑/二次粒徑)為0.89。Calculate the SEM particle size (primary particle size) of the silver powder produced according to the above method, and measure the cumulative 50% particle size (D 50 particle size) (secondary particle size), and calculate the SEM particle size (primary particle size) ) Relative to the cumulative 50% particle size (D 50 particle size) (secondary particle size) ratio (SEM particle size/D 50 particle size) (primary particle size/secondary particle size), and then: SEM of silver powder The particle size (primary particle size) was 2.57 μm, the cumulative 50% particle size (D 50 particle size) was 2.9 μm, and the SEM particle size/D 50 particle size (primary particle size/secondary particle size) was 0.89.

又,以與實施例1相同之方法進行銀粉之組成分析,測定銀粉中之碳含量及氧含量,並求算銀粉之BET比表面積及振實密度(TAP),且求算銀粉之振實密度(TAP)相對於累積50%粒徑(D50 粒徑)之比(TAP/D50 粒徑),然後得出:銀粉中之銅含量為熔化液中之銅含量的±10%範圍內,碳含量為0.002質量%,氧含量為0.046質量%,BET比表面積為0.36m2 /g,振實密度為4.3g/cm3 ,且銀粉之振實密度(TAP)相對於累積50%粒徑(D50 粒徑)之比(TAP/D50 粒徑)為1.48g/(cm3 ・μm)。In addition, the composition analysis of the silver powder was performed in the same manner as in Example 1, the carbon content and oxygen content in the silver powder were measured, and the BET specific surface area and tap density (TAP) of the silver powder were calculated, and the tap density of the silver powder was calculated (TAP) relative to the cumulative 50% particle size (D 50 particle size) ratio (TAP/D 50 particle size), and then obtained: the copper content in the silver powder is within ±10% of the copper content in the melt, The carbon content is 0.002% by mass, the oxygen content is 0.046% by mass, the BET specific surface area is 0.36 m 2 /g, the tap density is 4.3 g/cm 3 , and the tap density (TAP) of the silver powder is relative to the cumulative 50% particle size The ratio (D 50 particle size) (TAP/D 50 particle size) is 1.48 g/(cm 3 ·μm).

實施例8
除了使用熔解銀珠39.97kg與(含銅28質量%之)Ag-Cu合金0.031kg而成之熔化液(含銅218ppm之銀熔化液)外,以與實施例1相同之方法製得(含銅220ppm之)銀粉。
Example 8
It was prepared in the same manner as in Example 1 (except for using a molten solution of molten silver beads 39.97 kg and 0.031 kg of Ag-Cu alloy containing 28% by mass of copper) (a silver molten solution containing 218 ppm of copper). Copper 220ppm) silver powder.

針對依所述方法製得之銀粉求算SEM粒徑(一次粒徑),並測定累積50%粒徑(D50 粒徑)(二次粒徑),且求算SEM粒徑(一次粒徑)相對於累積50%粒徑(D50 粒徑)(二次粒徑)之比(SEM粒徑/D50 粒徑)(一次粒徑/二次粒徑),然後得出:銀粉之SEM粒徑(一次粒徑)為2.33μm,累積50%粒徑(D50 粒徑)為4.3μm,且SEM粒徑/D50 粒徑(一次粒徑/二次粒徑)為0.54。Calculate the SEM particle size (primary particle size) of the silver powder produced according to the above method, and measure the cumulative 50% particle size (D 50 particle size) (secondary particle size), and calculate the SEM particle size (primary particle size) ) Relative to the cumulative 50% particle size (D 50 particle size) (secondary particle size) ratio (SEM particle size/D 50 particle size) (primary particle size/secondary particle size), and then: SEM of silver powder The particle diameter (primary particle diameter) is 2.33 μm, the cumulative 50% particle diameter (D 50 particle diameter) is 4.3 μm, and the SEM particle diameter/D 50 particle diameter (primary particle diameter/secondary particle diameter) is 0.54.

又,以與實施例1相同之方法進行銀粉之組成分析,測定銀粉中之碳含量及氧含量,並求算銀粉之BET比表面積及振實密度(TAP),且求算銀粉之振實密度(TAP)相對於累積50%粒徑(D50 粒徑)之比(TAP/D50 粒徑),然後得出:銀粉中之銅含量為220ppm,碳含量為0.005質量%,氧含量為0.046質量%,BET比表面積為0.34m2 /g,振實密度為3.7g/cm3 ,且銀粉之振實密度(TAP)相對於累積50%粒徑(D50 粒徑)之比(TAP/D50 粒徑)為0.84g/(cm3 ・μm)。In addition, the composition analysis of the silver powder was performed in the same manner as in Example 1, the carbon content and oxygen content in the silver powder were measured, and the BET specific surface area and tap density (TAP) of the silver powder were calculated, and the tap density of the silver powder was calculated (TAP) relative to the cumulative 50% particle size (D 50 particle size) ratio (TAP/D 50 particle size), and then it is obtained: the copper content in the silver powder is 220 ppm, the carbon content is 0.005 mass%, and the oxygen content is 0.046 Mass%, BET specific surface area is 0.34m 2 /g, tap density is 3.7g/cm 3 , and the ratio of tap density (TAP) of silver powder to cumulative 50% particle size (D 50 particle size) (TAP/ D 50 particle size) is 0.84 g/(cm 3 ·μm).

實施例9
除了使用熔解銀珠31.79kg與(含銅1252ppm之)Ag-Cu合金8.21kg而成之熔化液(含銅257ppm之銀熔化液)外,以與實施例1相同之方法製得(含銅270ppm之)銀粉。
Example 9
Except for using 31.79kg of molten silver beads and 8.21kg of Ag-Cu alloy (containing 1252ppm of copper) (a silver melting solution containing 257ppm of copper), it was prepared in the same manner as in Example 1 (containing 270ppm of copper) Of) silver powder.

針對依所述方法製得之銀粉求算SEM粒徑(一次粒徑),並測定累積50%粒徑(D50 粒徑)(二次粒徑),且求算SEM粒徑(一次粒徑)相對於累積50%粒徑(D50 粒徑)(二次粒徑)之比(SEM粒徑/D50 粒徑)(一次粒徑/二次粒徑),然後得出:銀粉之SEM粒徑(一次粒徑)為2.60μm,累積50%粒徑(D50 粒徑)為2.9μm,且SEM粒徑/D50 粒徑(一次粒徑/二次粒徑)為0.89。Calculate the SEM particle size (primary particle size) of the silver powder produced according to the above method, and measure the cumulative 50% particle size (D 50 particle size) (secondary particle size), and calculate the SEM particle size (primary particle size) ) Relative to the cumulative 50% particle size (D 50 particle size) (secondary particle size) ratio (SEM particle size/D 50 particle size) (primary particle size/secondary particle size), and then: SEM of silver powder The particle diameter (primary particle diameter) is 2.60 μm, the cumulative 50% particle diameter (D 50 particle diameter) is 2.9 μm, and the SEM particle diameter/D 50 particle diameter (primary particle diameter/secondary particle diameter) is 0.89.

又,以與實施例1相同之方法進行銀粉之組成分析,測定銀粉中之碳含量及氧含量,並求算銀粉之BET比表面積及振實密度(TAP),且求算銀粉之振實密度(TAP)相對於累積50%粒徑(D50 粒徑)之比(TAP/D50 粒徑),然後得出:銀粉中之銅含量為270ppm,碳含量為0.001質量%,氧含量為0.042質量%,BET比表面積為0.37m2 /g,振實密度為4.7g/cm3 ,且銀粉之振實密度(TAP)相對於累積50%粒徑(D50 粒徑)之比(TAP/D50 粒徑)為1.60g/(cm3 ・μm)。In addition, the composition analysis of the silver powder was performed in the same manner as in Example 1, the carbon content and oxygen content in the silver powder were measured, and the BET specific surface area and tap density (TAP) of the silver powder were calculated, and the tap density of the silver powder was calculated (TAP) relative to the cumulative 50% particle size (D 50 particle size) ratio (TAP/D 50 particle size), and then obtained: the copper content in the silver powder is 270ppm, the carbon content is 0.001% by mass, and the oxygen content is 0.042 Mass%, BET specific surface area is 0.37m 2 /g, tap density is 4.7g/cm 3 , and the ratio of tap density (TAP) of silver powder to cumulative 50% particle size (D 50 particle size) (TAP/ D 50 particle size) is 1.60 g/(cm 3 ·μm).

實施例10
除了使用熔解銀珠48.00kg與(含銅757ppm之)Ag-Cu合金32.00kg而成之熔化液(含銅303ppm之銀熔化液)外,以與實施例1相同之方法製得(含銅310ppm之)銀粉。
Example 10
It was prepared in the same manner as in Example 1 (with a copper content of 310 ppm) except that a molten solution (silver solution containing 303 ppm of copper) containing 48.00 kg of melted silver beads and 32.00 kg of Ag-Cu alloy containing 757 ppm of copper was used. Of) silver powder.

針對依所述方法製得之銀粉求算SEM粒徑(一次粒徑),並測定累積50%粒徑(D50 粒徑)(二次粒徑),且求算SEM粒徑(一次粒徑)相對於累積50%粒徑(D50 粒徑)(二次粒徑)之比(SEM粒徑/D50 粒徑)(一次粒徑/二次粒徑),然後得出:銀粉之SEM粒徑(一次粒徑)為2.73μm,累積50%粒徑(D50 粒徑)為3.6μm,且SEM粒徑/D50 粒徑(一次粒徑/二次粒徑)為0.76。Calculate the SEM particle size (primary particle size) of the silver powder produced according to the above method, and measure the cumulative 50% particle size (D 50 particle size) (secondary particle size), and calculate the SEM particle size (primary particle size) ) Relative to the cumulative 50% particle size (D 50 particle size) (secondary particle size) ratio (SEM particle size/D 50 particle size) (primary particle size/secondary particle size), and then: SEM of silver powder The particle diameter (primary particle diameter) is 2.73 μm, the cumulative 50% particle diameter (D 50 particle diameter) is 3.6 μm, and the SEM particle diameter/D 50 particle diameter (primary particle diameter/secondary particle diameter) is 0.76.

又,以與實施例1相同之方法進行銀粉之組成分析,測定銀粉中之碳含量及氧含量,並求算銀粉之BET比表面積及振實密度(TAP),且求算銀粉之振實密度(TAP)相對於累積50%粒徑(D50 粒徑)之比(TAP/D50 粒徑),然後得出:銀粉中之銅含量為310ppm,碳含量為0.003質量%,氧含量為0.042質量%,BET比表面積為0.35m2 /g,振實密度為4.1g/cm3 ,且銀粉之振實密度(TAP)相對於累積50%粒徑(D50 粒徑)之比(TAP/D50 粒徑)為1.14g/(cm3 ・μm)。In addition, the composition analysis of the silver powder was performed in the same manner as in Example 1, the carbon content and oxygen content in the silver powder were measured, and the BET specific surface area and tap density (TAP) of the silver powder were calculated, and the tap density of the silver powder was calculated (TAP) relative to the cumulative 50% particle size (D 50 particle size) ratio (TAP/D 50 particle size), and then it is obtained: the copper content in the silver powder is 310 ppm, the carbon content is 0.003 mass%, and the oxygen content is 0.042 Mass%, BET specific surface area is 0.35m 2 /g, tap density is 4.1g/cm 3 , and the ratio of tap density (TAP) of silver powder to cumulative 50% particle size (D 50 particle size) (TAP/ D 50 particle size) was 1.14 g/(cm 3 ·μm).

實施例11
除了使用熔解銀珠20.69kg與(含銅723ppm之)Ag-Cu合金19.31kg而成之熔化液(含銅349ppm之銀熔化液)外,以與實施例1相同之方法製得(含銅360ppm之)銀粉。
Example 11
It was prepared in the same manner as in Example 1 (with 360 ppm copper content), except that 20.69 kg of molten silver beads and 19.31 kg of Ag-Cu alloy (containing 723 ppm of copper) were used (a silver molten solution containing 349 ppm of copper). Of) silver powder.

針對依所述方法製得之銀粉求算SEM粒徑(一次粒徑),並測定累積50%粒徑(D50 粒徑)(二次粒徑),且求算SEM粒徑(一次粒徑)相對於累積50%粒徑(D50 粒徑)(二次粒徑)之比(SEM粒徑/D50 粒徑)(一次粒徑/二次粒徑),然後得出:銀粉之SEM粒徑(一次粒徑)為3.15μm,累積50%粒徑(D50 粒徑)為3.3μm,且SEM粒徑/D50 粒徑(一次粒徑/二次粒徑)為0.97。Calculate the SEM particle size (primary particle size) of the silver powder produced according to the above method, and measure the cumulative 50% particle size (D 50 particle size) (secondary particle size), and calculate the SEM particle size (primary particle size) ) Relative to the cumulative 50% particle size (D 50 particle size) (secondary particle size) ratio (SEM particle size/D 50 particle size) (primary particle size/secondary particle size), and then: SEM of silver powder The particle diameter (primary particle diameter) was 3.15 μm, the cumulative 50% particle diameter (D 50 particle diameter) was 3.3 μm, and the SEM particle diameter/D 50 particle diameter (primary particle diameter/secondary particle diameter) was 0.97.

又,以與實施例1相同之方法進行銀粉之組成分析,測定銀粉中之碳含量及氧含量,並求算銀粉之BET比表面積及振實密度(TAP),且求算銀粉之振實密度(TAP)相對於累積50%粒徑(D50 粒徑)之比(TAP/D50 粒徑),然後得出:銀粉中之銅含量為360ppm,碳含量為0.003質量%,氧含量為0.043質量%,BET比表面積為0.38m2 /g,振實密度為3.8g/cm3 ,且銀粉之振實密度(TAP)相對於累積50%粒徑(D50 粒徑)之比(TAP/D50 粒徑)為1.16g/(cm3 ・μm)。In addition, the composition analysis of the silver powder was performed in the same manner as in Example 1, the carbon content and oxygen content in the silver powder were measured, and the BET specific surface area and tap density (TAP) of the silver powder were calculated, and the tap density of the silver powder was calculated (TAP) relative to the cumulative 50% particle size (D 50 particle size) ratio (TAP/D 50 particle size), and then obtained: the copper content in the silver powder is 360ppm, the carbon content is 0.003% by mass, and the oxygen content is 0.043 Mass%, BET specific surface area is 0.38m 2 /g, tap density is 3.8g/cm 3 , and the ratio of tap density of silver powder (TAP) to cumulative 50% particle size (D 50 particle size) (TAP/ D 50 particle size) is 1.16 g/(cm 3 ·μm).

實施例12
除了使用熔解銀珠6.00kg與(含銅800ppm之)Ag-Cu合金14.00kg而成之熔化液(含銅560ppm之銀熔化液)外,以與實施例1相同之方法製得(含銅620ppm之)銀粉。
Example 12
It was prepared in the same manner as in Example 1 (620 ppm containing copper), except that 6.00 kg of melted silver beads and 14.00 kg of Ag-Cu alloy (containing 800 ppm of copper) were used (a silver melt containing 560 ppm of copper). Of) silver powder.

針對依所述方法製得之銀粉求算SEM粒徑(一次粒徑),並測定累積50%粒徑(D50 粒徑)(二次粒徑),且求算SEM粒徑(一次粒徑)相對於累積50%粒徑(D50 粒徑)(二次粒徑)之比(SEM粒徑/D50 粒徑)(一次粒徑/二次粒徑),然後得出:銀粉之SEM粒徑(一次粒徑)為2.32μm,累積50%粒徑(D50 粒徑)為2.8μm,且SEM粒徑/D50 粒徑(一次粒徑/二次粒徑)為0.84。Calculate the SEM particle size (primary particle size) of the silver powder produced according to the above method, and measure the cumulative 50% particle size (D 50 particle size) (secondary particle size), and calculate the SEM particle size (primary particle size) ) Relative to the cumulative 50% particle size (D 50 particle size) (secondary particle size) ratio (SEM particle size/D 50 particle size) (primary particle size/secondary particle size), and then: SEM of silver powder The particle diameter (primary particle diameter) was 2.32 μm, the cumulative 50% particle diameter (D 50 particle diameter) was 2.8 μm, and the SEM particle diameter/D 50 particle diameter (primary particle diameter/secondary particle diameter) was 0.84.

又,以與實施例1相同之方法進行銀粉之組成分析,測定銀粉中之碳含量及氧含量,並求算銀粉之BET比表面積及振實密度(TAP),且求算銀粉之振實密度(TAP)相對於累積50%粒徑(D50 粒徑)之比(TAP/D50 粒徑),然後得出:銀粉中之銅含量為620ppm,碳含量為0.003質量%,氧含量為0.057質量%,BET比表面積為0.38m2 /g,振實密度為4.4g/cm3 ,銀粉之振實密度(TAP)相對於累積50%粒徑(D50 粒徑)之比(TAP/D50 粒徑)為1.59g/(cm3 ・μm)。In addition, the composition analysis of the silver powder was performed in the same manner as in Example 1, the carbon content and oxygen content in the silver powder were measured, and the BET specific surface area and tap density (TAP) of the silver powder were calculated, and the tap density of the silver powder was calculated (TAP) relative to the cumulative 50% particle size (D 50 particle size) ratio (TAP/D 50 particle size), and then obtained: the copper content in the silver powder is 620ppm, the carbon content is 0.003% by mass, and the oxygen content is 0.057 Mass%, BET specific surface area is 0.38m 2 /g, tap density is 4.4g/cm 3 , the ratio of tap density of silver powder (TAP) to cumulative 50% particle size (D 50 particle size) (TAP/D 50 particle size) is 1.59g/(cm 3 ·μm).

比較例
除了使用熔解銀珠5kg而成之熔化液外,以與實施例1相同之方法製得銀粉。
In the comparative example, silver powder was prepared in the same manner as in Example 1, except that 5 kg of melted silver beads was used.

針對依所述方法製得之銀粉求算SEM粒徑(一次粒徑),並測定累積50%粒徑(D50 粒徑)(二次粒徑),且求算SEM粒徑(一次粒徑)相對於累積50%粒徑(D50 粒徑)(二次粒徑)之比(SEM粒徑/D50 粒徑)(一次粒徑/二次粒徑),然後得出:銀粉之SEM粒徑(一次粒徑)為2.33μm,累積50%粒徑(D50 粒徑)為9.6μm,且SEM粒徑/D50 粒徑(一次粒徑/二次粒徑)為0.24。Calculate the SEM particle size (primary particle size) of the silver powder produced according to the above method, and measure the cumulative 50% particle size (D 50 particle size) (secondary particle size), and calculate the SEM particle size (primary particle size) ) Relative to the cumulative 50% particle size (D 50 particle size) (secondary particle size) ratio (SEM particle size/D 50 particle size) (primary particle size/secondary particle size), and then: SEM of silver powder The particle diameter (primary particle diameter) was 2.33 μm, the cumulative 50% particle diameter (D 50 particle diameter) was 9.6 μm, and the SEM particle diameter/D 50 particle diameter (primary particle diameter/secondary particle diameter) was 0.24.

又,以與實施例1相同之方法進行銀粉之組成分析,測定銀粉中之碳含量及氧含量,並求算銀粉之BET比表面積及振實密度(TAP),且求算銀粉之振實密度(TAP)相對於累積50%粒徑(D50 粒徑)之比(TAP/D50 粒徑),然後得出:所得銀粉為不含Cu之銀粉,碳含量為0.004質量%,氧含量為0.038質量%,BET比表面積為0.35m2 /g,振實密度為2.3g/cm3 ,且銀粉之振實密度(TAP)相對於累積50%粒徑(D50 粒徑)之比(TAP/D50 粒徑)為0.24g/(cm3 ・μm)。In addition, the composition analysis of the silver powder was performed in the same manner as in Example 1, the carbon content and oxygen content in the silver powder were measured, and the BET specific surface area and tap density (TAP) of the silver powder were calculated, and the tap density of the silver powder was calculated (TAP) relative to the cumulative 50% particle size (D 50 particle size) ratio (TAP/D 50 particle size), and then obtained: The resulting silver powder is silver powder without Cu, the carbon content is 0.004% by mass, the oxygen content is 0.038% by mass, BET specific surface area is 0.35m 2 /g, tap density is 2.3g/cm 3 , and the ratio of tap density (TAP) of silver powder to cumulative 50% particle size (D 50 particle size) (TAP /D 50 particle size) is 0.24 g/(cm 3 ·μm).

將該等實施例及比較例之銀粉原料中之銅量與特性示於表1及表2。又,以5000倍觀察實施例8~12製得之銀粉的場發射型掃描電子顯微鏡(FE-SEM)照片示於圖1~圖5。Table 1 and Table 2 show the amounts and characteristics of copper in the silver powder raw materials of these examples and comparative examples. In addition, a field emission scanning electron microscope (FE-SEM) photograph of the silver powder produced in Examples 8 to 12 was observed at 5000 times as shown in FIGS. 1 to 5.

表1
Table 1

表2
Table 2

產業上之可利用性
本發明之銀粉可用作燒成型導電性糊之材料來製得高導電性之導電膜,以供形成太陽電池之電極、使用低溫共燒陶瓷(LTCC)之電子零件或積層陶瓷電感器等積層陶瓷電子零件之內部電極、積層陶瓷電容器或積層陶瓷電感器等之外部電極等。
INDUSTRIAL APPLICABILITY The silver powder of the present invention can be used as a material for firing a conductive paste to produce a highly conductive conductive film for forming solar cell electrodes and electronic parts using low temperature co-fired ceramics (LTCC) Or internal electrodes of multilayer ceramic electronic parts such as multilayer ceramic inductors, external electrodes of multilayer ceramic capacitors or multilayer ceramic inductors, etc.

圖1所示者係以5000倍觀察實施例8所得銀粉的場發射型掃描電子顯微鏡(FE-SEM)照片。The one shown in FIG. 1 is a field emission scanning electron microscope (FE-SEM) photograph of the silver powder obtained in Example 8 at 5000 times.

圖2所示者係以5000倍觀察實施例9所得銀粉的FE-SEM照片。 The one shown in FIG. 2 is a FE-SEM photograph of the silver powder obtained in Example 9 at 5000 times.

圖3所示者係以5000倍觀察實施例10所得銀粉的FE-SEM照片。 The one shown in FIG. 3 is an FE-SEM photograph of the silver powder obtained in Example 10 at 5000 times.

圖4所示者係以5000倍觀察實施例11所得銀粉的FE-SEM照片。 The one shown in FIG. 4 is a FE-SEM photograph of the silver powder obtained in Example 11 at 5000 times.

圖5所示者係以5000倍觀察實施例12所得銀粉的FE-SEM照片。 The one shown in FIG. 5 is a FE-SEM photograph of the silver powder obtained in Example 12 at 5000 times.

Claims (12)

一種銀粉,其特徵在於:含銅40ppm以上且碳含量為0.1質量%以下。A silver powder characterized by having a copper content of 40 ppm or more and a carbon content of 0.1% by mass or less. 如請求項1之銀粉,前述銀粉中之銅含量為40~10000ppm。If the silver powder of claim 1, the copper content in the aforementioned silver powder is 40 to 10000 ppm. 如請求項1之銀粉,其利用雷射繞射式粒度分布測定裝置測得之以體積為基準之累積50%粒徑為1~15μm。For the silver powder according to claim 1, its cumulative 50% particle size measured by a laser diffraction particle size distribution measuring device based on volume is 1 to 15 μm. 如請求項3之銀粉,其中以場發射型掃描電子顯微鏡觀測前述銀粉所得之單體粒子平均粒徑(SEM粒徑)相對於前述銀粉之累積50%粒徑(D50 粒徑)之比(SEM粒徑/D50 粒徑)為0.3~1.0。The silver powder according to claim 3, wherein the ratio of the average particle size (SEM particle size) of the monomer particles obtained by observing the aforementioned silver powder with a field emission scanning electron microscope to the cumulative 50% particle size (D 50 particle size) of the aforementioned silver powder ( SEM particle size/D 50 particle size) is 0.3 to 1.0. 如請求項3之銀粉,其中前述銀粉之振實密度相對於累積50%粒徑(D50 粒徑)之比(振實密度/D50 粒徑)為0.45~3.0g/(cm3 ・μm)。The silver powder according to claim 3, wherein the ratio of the tap density of the aforementioned silver powder to the cumulative 50% particle size (D 50 particle size) (tap density/D 50 particle size) is 0.45 to 3.0 g/(cm 3 ·μm ). 如請求項1之銀粉,前述銀粉中之氧含量為0.1質量%以下。If the silver powder of claim 1, the oxygen content in the aforementioned silver powder is 0.1% by mass or less. 如請求項1之銀粉,前述銀粉之BET比表面積為0.1~1.0m2 /g。For the silver powder of claim 1, the BET specific surface area of the aforementioned silver powder is 0.1 to 1.0 m 2 /g. 如請求項1之銀粉,前述銀粉之振實密度為2~6g/cm3If the silver powder of claim 1, the tap density of the aforementioned silver powder is 2~6g/cm 3 . 一種銀粉之製造方法,其特徵在於:係使含銅40ppm以上之銀熔解所得的熔化液落下同時噴附高壓水以使該熔化液急速冷卻凝固。A method for manufacturing silver powder is characterized in that the molten liquid obtained by melting silver containing copper at 40 ppm or more is dropped and high-pressure water is sprayed to rapidly cool and solidify the molten liquid. 如請求項9之銀粉之製造方法,其中前述熔化液中之銅含量為40~10000ppm。The method for manufacturing silver powder according to claim 9, wherein the copper content in the melt is 40 to 10000 ppm. 一種導電性糊,其特徵在於:係於有機成分中分散有如請求項1之銀粉者。A conductive paste characterized in that silver powder as described in claim 1 is dispersed in an organic component. 一種導電膜之製造方法,其特徵在於:將如請求項11之導電性糊塗佈於基板上之後進行燒成而製造導電膜。A method for manufacturing a conductive film, characterized in that the conductive paste according to claim 11 is applied to a substrate and then fired to produce a conductive film.
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