TW201913225A - Target fuel generator and method for supplying target fuel - Google Patents

Abstract

A target fuel generator is provided according to some embodiments of the disclosure. The target fuel generator includes a storage assembly having a flow path. The target fuel generator also includes a nozzle assembly. The nozzle assembly is rotatably connected to the storage assembly from a first rotation angel to a second rotation angel. The nozzle assembly includes a first nozzle head and a second nozzle head. In the first rotation angel, the first nozzle head is connected to the flow path and the second is disengaged from the flow path, and in the second rotation angel, the second nozzle head is connected to the flow path and the first nozzle head is disengaged from the flow path.

Description

 Target fuel generator and method for supplying target fuel  

Embodiments of the present invention relate to a target fuel generator for supplying a target fuel to generate a radiation beam and a method of supplying a target fuel in a semiconductor wafer production apparatus.

The semiconductor integrated circuit industry has experienced a booming stage. Technological advances in integrated circuit fuels and designs have made the integrated circuits produced in each generation smaller and more complex than previously produced integrated circuits. In the development of integrated circuits, the functional density (for example, the number of interconnects in each wafer area) has generally increased, while the geometry (for example, the smallest component (or line) can be created in the process) It is a general decline. This process of miniaturization often provides many benefits by increasing production efficiency and reducing related expenses.

However, such miniaturization also increases the complexity of processing and manufacturing of integrated circuits. In order to achieve such progress, the same progress is required in the processing and manufacturing of integrated circuits.

The photolithography technique is a process of transferring a pattern onto a photosensitive fuel covered on a semiconductor substrate by irradiating a patterned main mask with light. In the history of the semiconductor industry, the minimum feature size of smaller integrated wafers has been achieved by reducing the exposure wavelength of the optical lithographic radiation source to improve optical lithography resolution. In higher resolution photolithography, Extreme ultraviolet (EUV) lithography uses extreme ultraviolet (EUV) light with an exposure wavelength between 10 nm and 130 nm, which is for emerging technology nodes (eg, 32 nm) , 22nm, 14nm, etc.) Promising next-generation photolithography solution.

Although existing photolithography techniques are generally sufficient for the intended purpose, they are not fully satisfactory in all respects.

Some embodiments of the present invention provide a target fuel generator. The target fuel generator includes a storage assembly. The storage components are superb. The target fuel generator further includes a nozzle assembly. The nozzle assembly couples the storage assembly in a manner rotatable to a first rotational position and a second rotational position. And, the nozzle assembly includes a first nozzle head and a second nozzle head. In the first rotational position, the first nozzle tip joins the flow channel and the second nozzle tip is separated from the flow channel, and in the second rotational position, the second nozzle tip communicates with the flow channel and the first nozzle tip is separated from the flow channel.

Some embodiments of the present invention provide a method of supplying a target fuel. The method includes joining a first nozzle head disposed in a turntable to a first-class track of a storage assembly. The method further includes supplying a target fuel into an excitation zone through the flow path of the storage assembly and the first nozzle tip. The method also includes monitoring the characteristics of the target fuel from the first nozzle tip in the excitation zone and generating a detection signal based on the monitoring result. Additionally, the method includes stopping supplying the target fuel from the first nozzle tip when the detection signal exceeds a threshold. The method further includes rotating the turntable to join a second nozzle head disposed on the turntable to the flow path of the storage assembly. The above method further includes supplying the target fuel into the excitation region through the flow path of the storage assembly and the second nozzle tip.

10‧‧‧Exposure system

12‧‧‧ Radioactive sources

14‧‧‧Focus optical components

16‧‧‧mask platform

18‧‧‧Photomask

20‧‧‧Projection optical box

22‧‧‧Semiconductor substrate

24‧‧‧Substrate platform

30‧‧‧Target fuel generator

31‧‧‧Storage components

310‧‧‧ flow path

32‧‧‧ Storage tank

321‧‧‧Open hole

322‧‧‧ opening

323‧‧‧ driving gas

33‧‧‧Filter

331‧‧‧Filter channel

332‧‧‧Porous film

334‧‧‧End

336‧‧‧End

34‧‧‧Guide

341‧‧‧ Guide channel

344‧‧‧End

346‧‧‧End

35‧‧‧Nozzle assembly

36‧‧‧ Turntable

365‧‧‧ bracket

370‧‧‧ tube body

371‧‧‧Nozzle head (first nozzle head)

372‧‧‧Nozzle head (second nozzle head)

373‧‧‧Nozzle head (third nozzle head)

374‧‧‧Nozzle head (fourth nozzle head)

375‧‧・Nozzle head (fifth nozzle head)

38‧‧‧Actuator

391‧‧‧Rotary drive

392‧‧‧ shaft

40‧‧‧First laser source

42‧‧‧Pre-pulse laser

44‧‧‧ window

50‧‧‧second laser source

52‧‧‧ main pulse laser

54‧‧‧ window

70‧‧‧Return device

71‧‧‧Analyzer

72‧‧‧Target fuel position detector

73‧‧‧Target fuel controller

80‧‧‧fuel substances

81‧‧‧Excitation zone

82‧‧‧Target fuel

83‧‧‧ radiation beam

100‧‧‧ method

101-107‧‧‧ operation

‧‧‧‧A fixed angle

C‧‧‧ Center

L‧‧‧ long axis

R‧‧‧Rotary axis

Figure 1 shows a schematic diagram of an exposure system in accordance with some embodiments of the present invention.

Figure 2 shows a schematic diagram of a radiation source in accordance with some embodiments of the present invention.

Figure 3 shows a schematic diagram of a target fuel generator in accordance with some embodiments of the present invention.

Figure 4 shows a schematic diagram of some of the elements of a target fuel generator in accordance with some embodiments of the present invention.

Figure 5 shows a schematic view of a nozzle assembly in accordance with some embodiments of the present invention.

Figure 6 is a flow chart showing a method of supplying a target fuel in accordance with some embodiments of the present invention.

Figure 7 is a schematic illustration of one of the operations of a method of supplying a target fuel in accordance with some embodiments of the present invention, wherein the nozzle assembly is disposed in a first rotational position and the first nozzle head is coupled to the flow passage.

Figure 8 is a schematic illustration of one of the operations of a method of supplying a target fuel in accordance with some embodiments of the present invention, wherein the nozzle assembly is disposed in a second rotational position and the second nozzle head is coupled to the flow passage.

The following disclosure provides many different embodiments or examples to implement various features of the invention. The disclosure of the present specification is a specific example of the various components and their arrangement in order to simplify the description of the invention. Of course, these specific examples are not intended to limit the invention. For example, if the disclosure of the present specification describes forming a first feature on or above a second feature, that is, it includes an embodiment in which the formed first feature is in direct contact with the second feature. Also included is an embodiment in which additional features are formed between the first feature and the second feature described above, such that the first feature and the second feature may not be in direct contact. In addition, different examples in the description of the invention may use repeated reference symbols and/or words. These repeated symbols or words are not intended to limit the relationship between the various embodiments and/or the appearance structures for the purpose of simplicity and clarity.

Furthermore, for convenience of describing the relationship of one element or feature in the drawings to another (plural) element or (complex) feature, space-related terms such as "below", "below", "lower", "above", "upper" and similar terms. It will be understood that the spatially relative terms encompass different orientations of the device in use or operation, in addition to the orientation depicted in the drawings. The device may also be additionally positioned (eg, rotated 90 degrees or at other orientations) and the description of the spatially relevant terms used may be interpreted accordingly. It will be appreciated that additional operations may be provided before, during, and after the method, and in some method embodiments, some of the operations may be substituted or omitted.

It should be noted that the embodiments discussed herein may not necessarily describe every component or feature that may be present within the structure. For example, one or more components may be omitted from the drawings, such as may be omitted from the drawings when the description of the components may be sufficient to convey various aspects of the embodiments. Furthermore, the method embodiments discussed herein may be discussed in a particular order, but in other method embodiments, the order may be performed in any reasonable order.

The advanced lithography processes, methods, and materials described in the embodiments of the present invention can be applied to many applications, including fin-type field effect transistors (FinFETs). For example, fin structures may be patterned to create relatively small spacing between complex structures, and embodiments of the invention are suitable for use herein. Furthermore, embodiments of the present invention can be applied to a process for forming a spacer for a fin structure of a fin field effect transistor.

Figure 1 shows a schematic diagram of an exposure system 10 in accordance with some embodiments of the present invention. In some embodiments, exposure system 10 includes a radiation source 12, a focusing optics assembly 14, a reticle stage 16, a projection optics housing 20, and a substrate platform 24. The number of components of the exposure system 10 can be increased or decreased and is not limited by the embodiments of the present invention.

The source 12 is configured to generate a beam of high energy radiation. In some embodiments, the high energy radiation beam produced by the source 12 comprises a high energy radiation beam having a wavelength between about 1 nm and about 100 nm. In some embodiments, the high energy radiation beam produced by the source 12 comprises an extreme ultraviolet radiation beam having a wavelength of about 13.5 nm. Therefore, the source 12 can also be referred to as an extreme ultraviolet radiation source 12. In some embodiments, the source 12 utilizes a laser-produced plasma (LPP) mechanism to generate an extreme ultraviolet radiation beam, as will be further described below.

The focusing optics assembly 14 is configured to direct the high energy radiation beam of the source 12 to the reticle 18 that is affixed to the reticle stage 16. In some embodiments, the focusing optics assembly 14 includes various refractive optical elements, such as a single lens or a lens system having multiple lenses (band slices) or reflective optics (for extreme ultraviolet exposure systems), such as a single reflection. A mirror or a mirror system with multiple mirrors.

The reticle stage 16 is configured to secure the reticle 18. In some embodiments, the reticle stage 16 includes an electrostatic chuck (e-chuck) to secure the reticle 18. In some embodiments, the exposure system is maintained in a vacuum environment to avoid extreme intensity loss of extreme ultraviolet light due to absorption by gas molecules. Therefore, the electrostatic force generated by the electrostatic chuck can be stably applied to the reticle stage 16 without being affected by the vacuum environment.

In the example where the exposure system 10 is an extreme ultraviolet exposure system, the reticle 18 is a reflective reticle. Photomask 18 includes a substrate having a suitable material, such as low thermal expansion fuel (LTEM) or fused silica. In some embodiments, the low thermal expansion fuel comprises TiO ₂ doped SiO ₂ , or other suitable fuel of low expansion. In some embodiments, the reticle 18 includes a composite reflective composite layer (ML) deposited on the substrate. The composite layer comprises a plurality of film pairs, such as molybdenum-niobium (Mo/Si) film pairs. For example, in each film pair, the molybdenum layer is above or below the ruthenium layer. Alternatively, the composite layer may comprise a Mo/Be film pair or other suitable fuel to highly reflect extreme ultraviolet light.

The mask 18 may further include a cover layer disposed on the composite layer to provide protection, such as ruthenium (Ru). The photomask 18 may further include an absorbing layer disposed on the composite layer, such as a boron nitride boron nitride (TaBN) layer. The absorber layer is patterned to define a layer of integrated circuitry. Alternatively, another reflective layer can be deposited on the composite layer and patterned to define a layer of integrated circuitry to form an extreme ultraviolet phase shift mask.

Projection optics box 20 (POB) is configured to direct a high energy beam from reticle 18 to substrate platform 24 on which semiconductor substrate 22 is placed to form a pattern of reticle 18 over semiconductor substrate 22. In some embodiments, the projection optics 20 has refractive optics (eg, in an ultraviolet light exposure system) or other reflective optics (eg, in an extreme ultraviolet exposure system). The focusing optics assembly 14 and the projection optics housing 20 are collectively referred to as an optical module of the exposure system 10.

The exposure system 10 also includes a substrate platform 24 to secure the semiconductor substrate 22. According to some embodiments, the semiconductor substrate 22 is made of tantalum, niobium or other semiconductor material. According to some embodiments, the semiconductor substrate 22 is made of a composite semiconductor such as SiC, GaAs, InAs, or InP. According to some embodiments, the semiconductor substrate 22 is made of an alloy semiconductor such as germanium (SiGe), germanium carbon (SiGeC), gallium arsenide (GaAsP) or indium gallium phosphide (GaInP). According to some embodiments, the semiconductor substrate 22 includes a crystalline film layer. For example, the semiconductor substrate 22 has a crystalline film layer overlying a bulk semiconductor. According to some embodiments, the semiconductor substrate 22 may be a silicon-on-insulator (SOI) or a germanium-on-insulator (GOI) substrate.

A plurality of device elements can be included on the semiconductor substrate 22. For example, the device component formed on the semiconductor substrate 22 may include a transistor such as a metal oxide semiconductor field effect transistor (MOSFET) or a complementary metal oxide semiconductor transistor (complementary metal). Oxide semiconductor (CMOS) transistor, bipolar junction transistor (BJT), high voltage transistor, high frequency transistor, P-type field effect transistor (p-channel and/or n-channel) Field-effect transistors (PFET) or n-channel field-effect transistors (NFETs), etc., or other components. Multiple device components on the semiconductor substrate 22 may undergo multiple processing processes, such as Deposition, etching, ion implantation, photolithography, annealing, and or other processes. The semiconductor substrate 22 is coated with a photoresist layer that is sensitive to high energy radiation beams, such as the extreme ultraviolet light in this embodiment.

Figure 2 shows a schematic diagram of a radiation source 12 in accordance with some embodiments of the present invention. In some embodiments, the radiation source 12 includes a target fuel generator 30, a first laser source 40, a second laser source 50, a concentrating mirror 60, and a control device 70. The number of components of the source 12 can be increased or decreased and is not limited by the embodiments of the present invention.

The target fuel generator 30 is configured to store a fuel substance 80 (Fig. 3) and convert the fuel material 80 into a target fuel 82 having a suitable form. The fuel substance 80 may include any fuel that emits a radiation beam having a wavelength in the EUV range in a plasma state, for example, elemental tin (Sn), a tin compound (eg, SnBr4, SnBr2, SnH4), a tin alloy (eg, : tin-gallium alloy, tin-indium alloy, tin-indium-gallium alloy, or any combination of these alloys. Fuel material 80 may also include impurities, such as non-target particles. The structural features of the target fuel generator 30 will be further detailed later in the description of Figures 3-5.

The first laser source 40 is configured to generate a pre-pulse laser 42. The second laser source 50 is configured to generate a main pulse laser 52. According to the current embodiment, the pre-pulse laser 42 has a lower energy than the main pulse laser 52. The energy of the pre-pulse laser 42 is not sufficient to convert the target fuel 82 to a plasma (eg, less than 11.9 MeV), but can deform the target fuel 82 (eg, increase the target size/diameter of the tin droplets), thereby increasing The amount of high-intensity light emitted by the target fuel 82 after being irradiated by the main pulse laser 52.

In some embodiments, the first laser source 40 includes a carbon dioxide (CO2) laser source, but embodiments of the invention are not limited thereto. In another embodiment, the first laser source 40 comprises a neodymium-doped yttrium aluminum Yttrium aluminum garnet garnet (Nd: YAG) laser source. In some embodiments, the second laser source 50 includes a carbon dioxide (CO2) laser source.

In various embodiments, the beam size of the pre-pulse laser 42 is about 100 [mu]m or less, and the beam size of the main pulse laser 52 is about 200-300 [mu]m, such as 225 [mu]m. The pre-pulse laser 42 and the main pulse laser 52 have specific drive energies to meet the demand for mass production of the semiconductor substrate. For example, the pre-pulse laser 42 has a drive energy of 2 kilowatts (kW) and the main pulse laser 52 has a drive energy of 19 kilowatts. In various embodiments, the total drive energy of the pre-pulse laser 42 and the main pulse laser 52 is at least 20 kilowatts, such as 27 kilowatts. However, it should be understood that the embodiments of the invention are not limited thereto.

The concentrating mirror 60 is configured to reflect the high-energy radiation beam 83 generated after the target fuel 82 is excited to a position at which the reticle 18 (Fig. 1) is placed. In some embodiments, concentrating mirror 60 includes windows (or lenses) 44, 54 for passage of pre-pulse laser 42 and main pulsed laser 52 and into excitation zone 81. The windows 44, 54 can be made of a suitable material that is substantially transparent to facilitate passage of the pre-pulse laser 42 and the main pulsed laser 52. The concentrating mirror 60 can include an ellipsoidal mirror having a first focus at the excitation zone 81 and a second focus at a location where the reticle 18 (Fig. 1) is placed (also referred to as an intermediate focus).

The feedback device 70 is configured to control the actuation of the target fuel generator 30. In some embodiments, the feedback device 70 includes an analyzer 71, a target fuel position detector 72, and a target fuel controller 73. In some embodiments, the target fuel position detector 72 is configured to monitor the position or trajectory of the target fuel 82 and generate a monitoring image corresponding to the position or trajectory of the target fuel 82 to the analyzer 71 based on the result of the monitoring. .

For example, the target fuel position detector 72 includes an image sensor, such as a charge coupled device (CCD) or a complementary metal oxide semiconductor sensor (CMOS sensor). Wait. The target fuel position detector 72 generates a photo or image of the target fuel 82 and transmits the monitored image of the photo or image back to the analyzer 71.

The analyzer 71 is configured to analyze the monitoring image from the target fuel position detector 72 and output a detection signal to the target fuel controller 73 based on the analysis result of the monitoring image. For example, the analyzer 71 includes an image analysis processor that receives the monitored image from the target fuel position detector 72 and compares it with a reference photo or a reference image. The analyzer 71 can calculate the position and trajectory of the droplets of the target fuel 82, and can calculate each droplet position error drop by drop, thereby determining the position error or trajectory error of the target fuel 82.

The target fuel controller 73 is configured to control the actuation of the target fuel generator 30 based on the detection signal from the analyzer 71 to vary the supply error of the target fuel 82. For example, the target fuel controller 73 modifies the release time point of the droplets when the target fuel generator 30 releases the target fuel 82 to correct the position error or trajectory error of the target fuel 82. Alternatively, the target fuel controller 73 pre-adjusts the path of the target fuel generator 30 to supply the target fuel 82 to correct the position error or trajectory error of the target fuel 82 before the target fuel generator 30 releases the target fuel 82. . The method of adjusting the target fuel generator 30 will be further described in the following description.

Figure 3 shows a schematic diagram of a target fuel generator 30 in accordance with an embodiment of the present invention. The target fuel generator 30 includes a storage assembly 31 and a nozzle assembly 35 in accordance with some embodiments of the present invention. The storage assembly 31 is configured to supply a fuel substance 80 to a nozzle assembly 35 that is configured to convert fuel material 80 from the storage assembly 31 to a target fuel 82.

In some embodiments, the storage assembly 31 includes a storage tank 32, a filter 33, and a guide member 34. The storage tank 32 is configured to store the fuel substance 80 and has an upper opening 321 and a lower opening 322. The upper opening 321 is used for a driving gas 323 (for example, argon gas) to enter the inside of the storage tank 32 to form a high pressure to push the fuel substance 80 in the storage tank 32 out of the storage tank 32 via the lower opening 322.

The filter 33 is coupled to the storage tank 32 with respect to the lower opening 322 and is configured to filter impurities in the fuel substance 80 from the storage tank 32. The guide member 34 is coupled to the storage tank 32 through the filter 33 and configured to define the shape of the fuel substance 80.

Figure 4 shows a schematic view of a filter 33 and a guide 34 of some embodiments of the present invention. The filter 33 extends along a long axis L, and a filter passage 331 is formed in the filter 33 along the long axis L. One of the openings of the filter passage 331 is located at the end 334 of the filter 33 that connects the storage tank 32 (Fig. 3) and directly connects the lower opening 322 of the storage tank 32. Also, the other opening of the filter passage 331 is located at the end 336 of the filter 33 joining the guide member 34. In some embodiments, a porous membrane 332 is disposed within the filtration passage 331 and configured to filter impurities in the fuel material 80 from the storage tank 32. In some embodiments, the porous membrane 332 has a substantially U-shaped cross-section on the plane parallel to the major axis L to enhance filtration efficiency.

The guide member 34 extends along the long axis L, and a guide passage 341 is formed in the guide member 34 along the long axis L. One of the openings of the guide passage 341 is located at the end portion 344 of the guide member 34 that connects the filter 33 and directly connects the filter passage 331 of the filter 33 to receive the fuel substance 80 from the filter 33 (Fig. 3). Also, the other opening of the guide passage 341 is located at the end portion 346 of the guide member 34 that is coupled to the nozzle assembly 35 to supply the fuel substance 80 (Fig. 3) to the nozzle assembly 35.

In some embodiments, the guide channel 341 is tapered in width in a direction away from the reservoir 32. For example, the guide channel 341 has a tapered cross-section on a plane parallel to the major axis L, wherein the width of the guide channel 341 at the end 346 can be equal to or slightly larger than the nozzle tips 371, 372 of the nozzle assembly 35. The width of the fuel material 80 (Fig. 3) enters the nozzle assembly 35 without causing excessive pressure to be forced against the nozzle assembly 35.

Referring also to FIGS. 3 and 4, the storage assembly 31 discharges the fuel substance 80 from the storage tank 32 via the main flow path 310 and supplies it to the nozzle assembly 35. In one embodiment, the flow path 310 is formed by the lower opening 322 of the storage tank 32, the filter passage 331 of the filter 33, and the guide passage 341 of the guide member 34. That is, the fuel substance 80 from the storage tank 32 sequentially passes through the lower opening 322 of the storage tank 32, the filter passage 331 of the filter 33, and the guide passage 341 of the guide member 34, and is then supplied into the nozzle assembly 35.

It should be understood that, in the above embodiment, the nozzle assembly 35 is coupled to the lower opening 322 of the storage tank 32 through the filter 33 and the guide member 34 to receive the fuel substance 80 from the storage tank 32 (third Fig.), but the embodiment of the invention is not limited thereto.

In the remaining embodiments, the filter 33 is omitted and the guide 34 is directly coupled to the reservoir 32. The nozzle assembly 35 is coupled to the lower opening 322 of the storage tank 32 through the guide member 34 to receive the fuel substance 80 from the storage tank 32 (Fig. 3). At this time, the flow path 310 is constituted by the lower opening 322 of the storage tank 32 and the guide passage 341 of the guide 34. The fuel substance 80 from the storage tank 32 is sequentially supplied to the nozzle assembly 35 through the lower opening 322 of the storage tank 32 and the guide passage 341 of the guide member 34.

In other embodiments, the guide 34 and the filter 33 are omitted. The nozzle assembly 35 is directly coupled to the lower opening 322 of the reservoir 32 to receive the fuel material 80 from the reservoir 32 (Fig. 3). At this time, the flow path 310 is constituted only by the lower opening 322 of the storage tank 32. Fuel material 80 from storage tank 32 is supplied directly into nozzle assembly 35 after exiting lower opening 322 of storage tank 32.

With continued reference to FIG. 3, nozzle assembly 35 is configured to dispense fuel material 80 from storage assembly 31 and convert fuel material 80 to target material 82 in a suitable form. For example, the target fuel 82 supplied by the target fuel generator 30 may be in the form of liquid droplets; the target fuel 82 may be in the form of a liquid stream; the target fuel 82 may be in the form of solid particles, target fuel 82 may be in the form of a liquid droplet containing solid particles; alternatively, the target fuel 82 may be in the form of a liquid stream comprising solid particles.

Figure 5 shows a bottom view of a nozzle assembly 35 in accordance with some embodiments of the present invention. In some embodiments, the nozzle assembly 35 includes a turntable 36, a plurality of nozzle heads, such as a first nozzle head 371, a second nozzle head 372, a third nozzle head 373, a fourth nozzle head 374, and a fifth nozzle head 375.

The turntable 36 is substantially a circular plate body, and an opening having a corresponding number of nozzle heads is formed thereon. For example, in the embodiment shown in Fig. 5, there are five nozzle heads, and the turntable 36 has five openings 360 corresponding to the nozzle heads. The first nozzle head 371, the second nozzle head 372, the third nozzle head 373, the fourth nozzle head 374, and the fifth nozzle head 375 respectively connect one of the openings of the turntable 36 and extend away from the turntable 36.

In some embodiments, the first nozzle head 371, the second nozzle head 372, the third nozzle head 373, the fourth nozzle head 374, and the fifth nozzle head 375 are disposed around the center C of the turntable 36, and in the circumferential direction of the turntable 36. The directions are the same at the same angle. That is, the first nozzle head 371, the second nozzle head 372, the third nozzle head 373, the fourth nozzle head 374, and the fifth nozzle head 375 are spaced apart from each other with respect to the center C of the turntable 36 by an angle α. The angle of the angle α can satisfy the formula: α = 360 ° / n, where n is the number of nozzle heads. In the embodiment shown in Fig. 5, the angle α between the first nozzle head 371, the second nozzle head 372, the third nozzle head 373, the fourth nozzle head 374, and the fifth nozzle head 375 is approximately equal to 72 degrees. .

Referring again to FIG. 3, in some embodiments, the first nozzle head 371, the second nozzle head 372, the third nozzle head 373, the fourth nozzle head 374, and the fifth nozzle head 375 (Fig. 3 only shows the first nozzle The head 371 and the second nozzle head 372) each include a hollow tubular body 370 and an actuator 38. The tubular body 370 extends in the direction parallel to the major axis L, and the actuator 38 is wrapped around the periphery of the tubular body 370. In some embodiments, the actuator 38 includes a piezoelectric material and is electrically coupled to the target fuel controller 73 and varies the pressure applied to the tubular body 370 in accordance with the voltage provided by the target fuel controller 73.

In some embodiments, the nozzle assembly 35 further includes a plurality of brackets 365 to reinforce the first nozzle head 371, the second nozzle head 372, the third nozzle head 373, the fourth nozzle head 374, and the fifth nozzle head 375 (third The figure only shows the structural strength of the nozzle head 371 and the second nozzle head 372). For example, in the embodiment shown in FIG. 5, the nozzle assembly 35 includes a total of five brackets 365, a first nozzle head 371, a second nozzle head 372, a third nozzle head 373, a fourth nozzle head 374, and a The five nozzle heads 375 are connected by a bracket 365.

Referring again to FIG. 3, in some embodiments, the target fuel generator 30 further includes a rotary drive 391 and a rotating shaft 392. The rotating shaft 392 is coupled to the center C of the turntable 36. The rotary actuator 391 connects the turntable 36 via the rotating shaft 392 and is configured to rotate the rotary turntable 36 about a rotation axis R. The rotation axis R may overlap the center C of the turntable 36, and the rotation axis R may be disposed in parallel with the long axis L of the storage assembly 31 and spaced apart from the long axis L without overlapping.

In some embodiments, the rotary drive 391 is electrically coupled to the target fuel controller 73 and rotates the turntable 36 according to the voltage provided by the target fuel controller 73 to position the turntable 36 in different rotational positions. Rotary drive 391 can be any motor that can drive rotation of turntable 36, such as a DC motor, stepper motor, or other suitable drive element. In some embodiments, the rotary actuator 391 is omitted and the rotational position of the turntable 36 is manually adjusted.

Figure 6 shows a flow diagram of a method 100 of supplying a target fuel 82 in accordance with some embodiments of the present invention. For the sake of example, the flow is illustrated by the schematic diagrams of Figures 7 and 8. In different embodiments, some of the stages can be replaced or eliminated. Additional features can be added to the semiconductor device structure. In various embodiments, some of the above characteristics may be replaced or eliminated.

The method 100 includes an operation 101 of joining the first nozzle tip 371 of the nozzle assembly 35 to the flow channel 310 of the storage assembly 31. In some embodiments, as shown in Fig. 7, the turntable 36 of the nozzle assembly 35 is disposed in the first rotational position to fluidly couple the first nozzle head 371 to the flow channel 310 of the storage assembly 31. At this time, the remaining nozzle heads provided on the turntable 36, for example, the second nozzle heads 372 are separated from the flow path 310.

The method 100 includes an operation 102 of supplying the target fuel 82 through the flow path 310 of the storage assembly 31 and the first nozzle head 371 into the excitation zone 81. In some embodiments, after operation 101 is completed, the driving gas 323 begins to be supplied into the interior of the storage tank 32 through the upper opening 321 and forms a high pressure to push the fuel substance 80 in the storage tank 32 through the lower opening 322 via the flow path. 310 enters the first nozzle tip 371. After the fuel substance 80 enters the first nozzle head 371, the actuator 38 of the first nozzle head 371 changes the pressure applied to the tube body 370 according to the electronic signal supplied from the target fuel controller 73, thereby converting the fuel substance 80 into The target fuel 82 has a predetermined form.

For example, the target fuel controller 73 continues to supply a voltage to the actuator 38 at a predetermined frequency, causing the actuator 38 to compress the tube 370 when receiving the voltage and to stop pressing the tube 370 when no voltage is received. Thus, the first nozzle tip 371 can supply a plurality of target fuels 82 in the form of microdroplets into the excitation zone 81. The predetermined frequency can be adjusted according to the frequency at which the first laser source 40 and the second laser source 50 (Fig. 1) generate the laser beam and the pressure of the driving gas 323 that pushes the fuel substance 80 to flow, so that the first laser source 40 and the laser beam emitted by the second laser source 50 can be irradiated onto each of the target fuels 82, thereby increasing the efficiency of use of the fuel substance 80 and increasing the energy value of the high energy radiation beam.

In some embodiments, after the target fuel 82 is illuminated by the first laser source 40 and the second laser source 50, the target fuel 82 absorbs the thermal energy of the laser beam and is heated to a critical temperature. At this critical temperature, the target fuel 82 is excited to transition to a plasma state and emit a radiation beam. This radiation beam can include extreme ultraviolet radiation. The exposure system 10 can perform a lithographic exposure process on the semiconductor substrate 22 using the radiation beam.

In some embodiments, after the target nozzle 82 is continuously supplied with the first nozzle head 371 for a period of time, impurities in the target fuel 82 may be stuck in the tube body 370 of the first nozzle head 371, thereby causing the target fuel. The reduction in flow of 82 causes the target fuel 82 to deviate from the intended orbit. If the first nozzle head 371 is continuously used to supply the target fuel 82, the laser beam may be out of focus with some of the target fuel 82. If the laser beam is not successfully focused (i.e., the laser beam does not impinge on the target fuel), the power of the resulting radiation will be reduced to cause uneven exposure of the photoresist across the surface of the semiconductor substrate 22.

In order for the supply of target fuel 82 to meet manufacturing requirements to increase product yield, method 100 continues to operations 103 and 104.

In operation 103, the characteristics of the target fuel 82 from the first nozzle tip 371 in the excitation region 81 are monitored, and a detection signal is generated based on the monitoring result. In some embodiments, the target fuel 82 located in the excitation zone 81 is monitored by the target fuel position detector 72. The target fuel position detector 72 monitors the position and trajectory of the target fuel 82 located in the excitation zone 81 and produces a photo or image back to the analyzer 71. The analyzer 71 analyzes the monitoring image from the target fuel position detector 72 and outputs a detection signal to the target fuel controller 73 based on the analysis result of the monitoring image.

For example, analyzer 71 receives a photo or image from target fuel position detector 72 and compares it to a reference photo or a reference image. The analyzer 71 can calculate the position and trajectory of the droplets of the target fuel 82, and can calculate each droplet position error drop by drop, thereby determining the position error or the track error of the target fuel 82. Then, the detection signal is transmitted to the target fuel controller 73 according to the position error or the track error.

The method 100 includes an operation 104 of determining whether the detected signal exceeds a threshold. In some embodiments, the target fuel controller 73 receives the detection signal from the analyzer 71 and compares it with a threshold value. The threshold value described above can be determined based on the position error or the maximum value that the trajectory error can withstand. When the detection signal does not exceed the threshold value, the method 100 repeats operations 103, 104 until the process of the exposure system 10 ends. If the detection signal exceeds the threshold, then the method 100 continues to operations 105-107.

In operation 105, supply of the target fuel 82 from the first nozzle tip 371 is stopped. In some embodiments, once the target fuel controller 73 determines that the detection signal is greater than the threshold value, the target fuel controller 73 sends a drive signal to the actuator 38 to stop the target fuel 82 from the first nozzle tip. 371 outflow. Alternatively, the target fuel controller 73 sends a drive signal to a regulating valve (not shown) that controls the flow of the driving gas 323 to stop supplying the driving gas 323 to the storage tank. Thus, the fuel substance 80 no longer flows out of the storage tank 32 to stop the target fuel 82 from flowing out of the first nozzle head 371.

In operation 106, the turntable 36 is rotated to couple the second nozzle head 372 disposed on the turntable 36 to the flow path 310 of the storage assembly 31. In some embodiments, after the end of operation 105, the target fuel controller 73 further issues another drive signal to the rotary drive 391, causing the rotary drive 391 to drive the turntable 36 to rotate by a predetermined angle to rotate the turntable 36 to the second rotational position. As shown in Figure 8. When the turntable 36 is in the second rotational position, the second nozzle head 372 is coupled to the flow path 310 of the storage assembly 31, and the first nozzle head 371 is separated from the flow path 310. The predetermined angle may be equal to the angle α between the first nozzle head 371 and the second nozzle head 372 (Fig. 5).

In operation 107, the target fuel 82 is supplied to the excitation zone through the flow path 310 of the storage assembly 31 and the second nozzle head 372. Operation 107 is similar to operation 102, but the target fuel 82 is supplied with a normal second nozzle tip 372, which is not repeated here for simplicity of illustration. While operation 107 is being performed, a procedure similar to operations 103 and 104 may be performed to monitor the characteristics of the target fuel 82 from the second nozzle tip 372 in the excitation zone 81 and to generate a position error or trajectory error in the target fuel 82, The supply of the target fuel 82 is stopped, and another nozzle head, such as the third nozzle head 373 shown in Fig. 5, is used to supply the target fuel 82.

The target fuel generator in various embodiments of the present invention can continue to supply the target fuel in accordance with a predetermined parameter by changing the nozzle head to which the target fuel is supplied when the supply of the target fuel is abnormal. Since the target fuel generator can stably supply the target fuel, each target fuel can be excited by the laser beam to emit a preset energy to expose the photoresist above the surface of the semiconductor substrate. Thus, the product yield of the semiconductor substrate can be improved. On the other hand, since the exposure system using the target fuel generator does not require frequent shutdowns for maintenance or repair, the number of products that the exposure system can produce per unit time can also be increased.

Some embodiments of the present invention provide a target fuel generator. The target fuel generator includes a storage assembly. The storage components are superb. The target fuel generator further includes a nozzle assembly. The nozzle assembly couples the storage assembly in a manner rotatable to a first rotational position and a second rotational position. And, the nozzle assembly includes a first nozzle head and a second nozzle head. In the first rotational position, the first nozzle tip joins the flow channel and the second nozzle tip is separated from the flow channel, and in the second rotational position, the second nozzle tip communicates with the flow channel and the first nozzle tip is separated from the flow channel.

In some embodiments, the flow path extends along a long axis and the nozzle assembly is rotatable about a rotational axis, wherein the rotational axis is separated from the long axis without overlapping.

In some embodiments, the first nozzle head and the second nozzle head respectively include a tube body and an actuator. An actuator is disposed on the tubular body and varies the pressure applied to the tubular body in accordance with the received voltage.

In some embodiments, the nozzle assembly further includes a bracket. The bracket is coupled between the first nozzle head and the second nozzle head.

In some embodiments, the target fuel generator further includes a rotary drive. The rotary drive is configured to rotate the nozzle assembly. In addition, the nozzle assembly further includes a turntable coupled to the rotary drive, the first nozzle head and the second nozzle head are disposed on the turntable and are circumferentially spaced apart from the center of the turntable by a predetermined angle, the predetermined angle being equal to the second rotational position and the first The difference in rotational position. The rotary drive configuration is used to control the turntable to rotate a given angle.

In some embodiments, the flow channel of the storage assembly includes a guide channel disposed adjacent the first nozzle tip or the second nozzle tip. The width of the guide channel is gradually reduced in the direction toward the nozzle assembly.

Some embodiments of the present invention provide a method of supplying a target fuel. The method includes joining a first nozzle head disposed in a turntable to a first-class track of a storage assembly. The method further includes supplying a target fuel into an excitation zone through the flow path of the storage assembly and the first nozzle tip. The method also includes monitoring the characteristics of the target fuel from the first nozzle tip in the excitation zone and generating a detection signal based on the monitoring result. Additionally, the method includes stopping supplying the target fuel from the first nozzle tip when the detection signal exceeds a threshold. The method further includes rotating the turntable to join a second nozzle head disposed on the turntable to the flow path of the storage assembly. The above method further includes supplying the target fuel into the excitation region through the flow path of the storage assembly and the second nozzle tip.

In some embodiments, the method further includes applying a varying voltage to the actuator of the first nozzle tip to vary the pressure applied by the actuator to a body of the first nozzle tip.

In some embodiments, the flow path extends along a long axis and the turntable is rotated about a rotational axis that is separated from the long axis and does not overlap.

In some embodiments, the fuel supplied by the first nozzle tip is characterized by an image generated by an image sensor and the detection signal is determined according to the content of the image.

The above summary of the features of the various embodiments of the invention are in the It will be appreciated by those of ordinary skill in the art that the present disclosure may be readily utilized as a variation or design basis for other structures or processes to achieve the same objectives and/or advantages of the embodiments of the invention. It is to be understood by those of ordinary skill in the art that the invention may be modified or substituted without departing from the spirit and scope of the invention. With retouching.

Claims (10)

 A target fuel generator includes: a storage assembly having a first-class track; and a nozzle assembly coupled to the storage assembly for rotation at a first rotational position and a second rotational position, and including a first nozzle a head and a second nozzle head, the first nozzle head joining the flow path and the second nozzle head being separated from the flow path in the first rotational position, and in the second rotational position, the second nozzle A head communicates with the flow path and the first nozzle tip is separated from the flow path.    The target fuel generator of claim 1, wherein the flow path extends along a long axis, and the nozzle assembly is rotatable about a rotational axis, wherein the rotational axis does not overlap with the long axis.    The target fuel generator of claim 1, wherein the first nozzle head and the second nozzle head respectively comprise: a tube body; and an actuator disposed on the tube body and received according to the The voltage changes the pressure applied to the tube.    The target fuel generator of claim 1, wherein the nozzle assembly further comprises a bracket coupled between the first nozzle head and the second nozzle head.    The target fuel generator of claim 1, further comprising a rotary drive configured to rotate the nozzle assembly; wherein the nozzle assembly further comprises a turntable coupled to the rotary drive, the first nozzle head And the second nozzle head is disposed on the turntable and is circumferentially spaced apart from a center of the turntable by a predetermined angle, the predetermined angle being equal to a difference between the second rotational position and the first rotational position; wherein the rotary drive configuration It is used to control the turntable to rotate the predetermined angle.    The target fuel generator of claim 1, wherein the flow path of the storage assembly comprises a guiding passage adjacent to the first nozzle head or the second nozzle head; wherein The width of the guide channel is gradually reduced in the direction toward the nozzle assembly.    A method of supplying a target fuel, comprising: joining a first nozzle head disposed in a turntable to a first-class track of a storage assembly; supplying the target fuel through the flow path of the storage assembly and the first nozzle head An excitation region; monitoring characteristics of the target fuel from the first nozzle head in the excitation region, and generating a detection signal according to the monitoring result; when the detection signal exceeds a threshold, stopping the supply from the first a target fuel of a nozzle head; rotating the turntable to connect a second nozzle head disposed on the turntable to the flow path of the storage assembly; and the flow path through the storage assembly and the second nozzle head The target fuel should enter the excitation zone.    The method of claim 7, further comprising applying a varying voltage to the actuator of the first nozzle tip to vary the pressure applied by the actuator to a body of the first nozzle tip.    The method of claim 7, wherein the flow path extends along a long axis, and the turntable is rotated about an axis of rotation that is separated from the long axis and does not overlap.    The method of claim 7, wherein monitoring the characteristic of the fuel supplied from the first nozzle head is to generate a monitoring image through an image sensor and compare the monitoring image with a reference image. Then, the detection signal is determined according to the comparison result.