TW201903529A - Photosensitive composition, cured film, display device, and method for forming patterned cured film capable of forming a black cured film excellent in insulation and adhesion properties to a substrate despite its excellent light shielding property - Google Patents

Abstract

The subject of the present invention is to provide a photosensitive composition capable of forming a black cured film excellent in insulation and adhesion properties to a substrate despite its excellent light shielding property, a cured film formed by curing the photosensitive composition, a display device having the cured film, and a method of using the photosensitive composition to form a patterned cured film. To solve the problem, in the photosensitive composition containing a photo-polymerization initiator (B) and a carbon black (C) in an amount of 30 mass% or more in the total solid content, a siloxane compound having two or more polymerizable carbon-carbon double bonds in its structure is processed to serve as a crosslinking component (A).

Description

Photosensitive composition, cured film, display device, and patterned method of forming cured film

The present invention relates to a photosensitive composition, a cured film obtained by curing the photosensitive composition, a display device including the cured film, and a method of forming a patterned cured film using the photosensitive composition.

In a display panel of an image display device such as a liquid crystal display, a liquid crystal layer is interposed between two substrates on which electrodes opposed to each other are formed. Then, a color filter having pixels of respective colors such as red (R), green (G), and blue (B) is formed on the inner side of the substrate. Then, in the color filter, or in order to prevent color mixing of different colors in each pixel, or to hide the pattern of the electrodes, generally, a matrix is formed so as to distinguish pixels of R, G, and B colors. Black matrix.

In general, color filters are formed by lithography. Specifically, first, a black photosensitive composition is applied, exposed, and developed on a substrate to form a black matrix. Then, by repeating coating, exposure, and development for each of the red (R), green (G), and blue (B) color photosensitive compositions, a pattern of each color is formed at a predetermined position to form a color filter. Light film.

As a method of forming a black matrix when a color filter is formed, a method of using a negative photosensitive resin composition has been proposed. For example, Patent Document 1 discloses that a black photosensitive resin composition which can be used as a raw material of a black matrix having high light-shielding property and low reflectance at low cost is formed by blending carbon black and hydrophobic cerium oxide microparticles. A negative photosensitive resin composition. [Prior Technical Literature] [Patent Literature]

[Patent Document 1] Japanese Patent Laid-Open Publication No. 2015-161815

[Problems to be solved by the invention]

From the viewpoint of high image quality of the image display device, the black matrix is expected to have higher light blocking properties. As a method of improving the light-shielding property of the black matrix formed using the photosensitive resin composition of the patent document 1, the method of increasing the carbon black content in the photosensitive resin composition can be illustrated. However, when the content of the carbon black is increased in the photosensitive resin composition described in Patent Document 1, the cured film formed has a problem that the insulating property and the adhesion to the substrate are lowered.

The present invention has been made in view of the above problems, and an object of the invention is to provide a photosensitive composition which can form a black cured film which is excellent in light shielding property and excellent in insulation property and adhesion to a substrate, and a cured film. A photosensitive device is obtained by curing the photosensitive composition; a display device comprising the cured film; and a method for forming a patterned cured film, wherein the photosensitive composition is used. [Means for solving the problem]

The present inventors have found that a photosensitive composition containing (B) a photopolymerization initiator and 30% by mass or more of (C) carbon black in the total solid component is a (A) cross-linking component by blending The siloxane compound having two or more polymerizable carbon-carbon double bonds in the structure can solve the above problems, and the present invention has been completed. More specifically, the present invention provides the following.

A first aspect of the present invention is a photosensitive composition comprising (A) a crosslinking component, (B) a photopolymerization initiator, and (C) a photosensitive composition of carbon black, (A) a crosslinking component. A pyrithion compound containing one or more structural units selected from the group consisting of M units, D units, T units, and Q units represented by the following formulas (a1) to (a4): M unit: R ¹ R ² R ³ SiO _1/2・・・(a1) D unit: R ⁴ R ⁵ SiO _2/2・・・(a2) T unit: R ⁶ SiO _3/2・・・(a3) Q unit: SiO _4/2・・・(a4) (In the formulas (a1) to (a4), R ¹ to R ⁶ are each independently a group represented by R ⁷ - or R ⁷ -O-, and R ⁷ is a bond represented by a C-Si bond. a helium atom of the formula (a1) to (a3), or a monovalent organic group bonded to an oxygen atom in R ⁷ -O- by a CO bond, the cyclooxyl compound having 2 in its structure More than one carbon-carbon double bond, and the oxoxane compound contains two or more structural units selected from the group consisting of M unit, D unit, T unit, and Q unit, among all the solid components of the photosensitive composition (C) The carbon black content is 30% by mass or more, and the amount of ruthenium atom (% by mass) in the cured product of the photosensitive composition is measured under the following measurement conditions. In the case of the amount of carbon atoms (% by mass), the ratio of the amount of ruthenium atom (% by mass) / the amount of carbon atoms (% by mass) is 0.05 or more.

(Measurement conditions) The photosensitive composition was applied onto a glass substrate so as to have a thickness of 1 μm, and the ghi line was exposed at an exposure amount of 50 mJ/cm ² , followed by post-baking at 230 ° C for 20 minutes to form a hardening. membrane. XPS was measured on the surface of the cured film, and the peak area of each element was determined, and the mass ratio of each element was calculated.

A second aspect of the present invention is a cured film obtained by curing a photosensitive composition of a first aspect.

A third aspect of the invention is a display device comprising a cured film of a second aspect.

A fourth aspect of the present invention provides a method for forming a patterned cured film, comprising the steps of: forming a coating film by applying the photosensitive composition of the first aspect, and selectively and selectively The step of exposing the coating film and the step of developing the exposed coating film. [Effect of the invention]

According to the present invention, it is possible to provide a photosensitive composition which can form a black cured film which is excellent in light-shielding property, excellent in insulation property and adhesion to a substrate, and a cured film which is a photosensitive composition. A curing device; a display device comprising the cured film; and a method of forming a patterned cured film, wherein the photosensitive composition is used.

≪Photosensitive composition 感光 The photosensitive composition contains (A) a crosslinking component, (B) a photopolymerization initiator, and (C) carbon black. The content of the (C) carbon black in the photosensitive composition is 30% by mass or more based on the content of the (C) carbon black in the total solid content of the photosensitive composition. Therefore, by using a photosensitive composition, a cured film excellent in light-shielding property can be formed.

In addition, the crosslinking component (A) contained in the photosensitive composition contains one or more selected from the group consisting of M units, D units, T units, and Q units represented by the following formulas (a1) to (a4). The unit's oxane compound: M unit: R ¹ R ² R ³ SiO _1/2・・・(a1) D unit: R ⁴ R ⁵ SiO _2/2・・・(a2) T unit: R ⁶ SiO _{3 /2}・・・(a3) Q unit: SiO _4/2・・・(a4) (In the formulas (a1) to (a4), R ¹ to R ⁶ are independent, and are R ⁷ - or R ⁷ -O- The group shown, R ⁷ is a ruthenium atom bonded to the formula (a1) to the formula (a3) by a C-Si bond, or an oxygen atom bonded to the R ⁷ -O- by a CO bond. a valence organic group), then, the oxoxane compound has two or more carbon-carbon double bonds in its structure, and the oxoxane compound contains two or more selected from the group consisting of M unit, D unit, T unit, and Q unit. In the structural unit, the photosensitive composition contains the above-described oxoane compound as the (A) crosslinking component, and it is easy to form a cured film having excellent insulating properties and adhesion to the substrate.

Further, when the amount of ruthenium atom (% by mass) and the amount of carbon atoms (% by mass) in the cured product of the photosensitive composition are measured under the following measurement conditions, the ratio of the amount of ruthenium atom (% by mass) / the amount of carbon atom (% by mass) is 0.05 or more. The ratio is preferably 0.06 or more, more preferably 0.07 or more, still more preferably 0.08 or more, particularly preferably 0.09 or more, and most preferably 0.10 or more. (Measurement conditions) The photosensitive composition was applied onto a glass substrate so as to have a thickness of 1 μm, and exposed to an exposure amount of 50 mJ/cm ² on a ghi line, followed by post-baking at 230 ° C for 20 minutes. Become a hardened film. XPS was measured on the surface of the cured film, and the peak area of each element was determined, and the mass ratio of each element was calculated.

In order to improve the adhesion between the substrate and the cured film, (A) the amount of the oxoxane compound in the photosensitive composition of the crosslinking component and (C) carbon black or the (D) binder resin described later. The relationship is important. When the ratio of the amount of ruthenium atom (% by mass) / the amount of carbon atoms (% by mass) in the cured product of the photosensitive composition is 0.05 or more, the siloxane compound and (C) carbon black or (D) will be described later. The binder resin acts sufficiently to sufficiently enhance the adhesion between the substrate and the cured film. In addition, when the ratio of the atomic weight (% by mass) / the amount of carbon atoms (% by mass) is 0.05 or more, the surface of the (A) crosslinked component and the surface of the (C) carbon black sufficiently act to form insulation. Excellent hardened film.

<(A) Crosslinking component> (A) The crosslinking component is a component which has a carbon-carbon double bond which can be polymerized by the (B) photopolymerization initiator mentioned later. (A) The crosslinking component is a siloxane compound containing one or more structural units selected from the group consisting of M units, D units, T units, and Q units represented by the following formulas (a1) to (a4): M unit :R ¹ R ² R ³ SiO _1/2・・・(a1) D unit: R ⁴ R ⁵ SiO _2/2・・・(a2) T unit: R ⁶ SiO _3/2・・・(a3) Q Unit: SiO _4/2 (a4) (In the formulas (a1) to (a3), R ¹ to R ⁶ are each independently, and are a group represented by R ⁷ - or R ⁷ -O-, and R ⁷ is a borrowing a ruthenium atom bonded to a ruthenium atom in the formula (a1) to the formula (a3) by a C-Si bond, or a monovalent organic group bonded to an oxygen atom in R ⁷ -O- by a CO bond, The compound has two or more carbon-carbon double bonds in its structure. The photosensitive composition can be formed by combining 30% by mass or more of (C) carbon black containing the cross-linking component (A) and the total solid content of the photosensitive composition, and is excellent in light-shielding property and insulative property to the substrate. A black cured film that is still excellent in character.

In the above formulae (a1) to (a3), R ¹ to R ⁶ are each independently a group represented by R ⁷ - or R ⁷ -O-. Then, R ⁷ is a monovalent organic group, and is bonded to a halogen atom in the formula (a1) to the formula (a3) by a C-Si bond, or an oxygen bonded to the R ⁷ -O- by a CO bond. atom.

The organic group of R ⁷ is not particularly limited as long as the above conditions are satisfied. R ⁷ may also contain a hetero atom such as O, N, S, P, B or a halogen atom. A suitable example of the case where the organic group of R ⁷ is a carbon-carbon double bond which can be polymerized by the (B) photopolymerization initiator can be exemplified by an alkyl group having 1 or more carbon atoms and a carbon number. 3 or more and 20 or less cycloalkyl groups, an aromatic hydrocarbon group having 6 or more and 20 or less carbon atoms, an aralkyl group having 7 or more and 20 or less carbon atoms, a saturated aliphatic fluorenyl group having 2 or more and 20 or less carbon atoms, or a carbon atom An aromatic sulfhydryl group having a number of 7 or more and 20 or less. These groups may all have a substituent. The type and the number of the substituents are not particularly limited as long as they do not impair the object of the present invention.

A suitable example of the substituent is an alkyl group having 1 or more and 20 or less carbon atoms, an alkoxy group having 1 or more and 20 or less carbon atoms, a cycloalkyl group having 3 or more and 10 or less carbon atoms, and 3 or more carbon atoms. a cycloalkoxy group of 10 or less, a saturated aliphatic fluorenyl group having 2 or more and 20 or less carbon atoms, an alkoxycarbonyl group having 2 or more and 20 or less carbon atoms, a saturated aliphatic decyloxy group having 2 or more and 20 or less carbon atoms, a phenyl group which may have a substituent, a phenoxy group which may have a substituent, a phenylthio group which may have a substituent, a benzyl group which may have a substituent, a phenoxycarbonyl group which may have a substituent, may have a substitution a benzyl methoxy group, a phenylalkyl group having 7 or more and 20 or less carbon atoms which may have a substituent, a naphthyl group which may have a substituent, a naphthyloxy group which may have a substituent, and a naphthyl group which may have a substituent A mercapto group, a naphthyloxycarbonyl group which may have a substituent, a naphthylmethoxycarbonyl group which may have a substituent, a naphthylalkyl group having 11 or more and 20 or less carbon atoms which may have a substituent, and a heterocyclic group which may have a substituent a heterocyclic carbonyl group having an substituent, an amine group, substituted with 1 or 2 organic groups Group, a hydroxyl group, a mercapto group, a halogen atom, a nitro group, a cyano group and the like.

As a suitable specific example of the organic group of R ⁷ , a methyl group, an ethyl group, an n-propyl group, an isopropyl group, an n-butyl group, an isobutyl group, a sec-butyl group, a tertiary butyl group, and an n- An alkyl group having 1 or more and 6 or less carbon atoms such as a pentyl group or an n-hexyl group; a phenyl group, an o-tolyl group, an m-tolyl group, a p-tolyl group, a naphthalene-1-yl group, and a naphthalene-2-yl group; Aromatic hydrocarbon group; saturated aliphatic fluorenyl group having 2 or more and 6 or less carbon atoms; such as an ethyl fluorenyl group, a propyl fluorenyl group, a butyl fluorenyl group or a pentamidine group; a benzepidine group, a naphthalen-1-ylcarbonyl group, a naphthalen-2-yl group An aromatic fluorenyl group such as a carbonyl group. Among these, a methyl group, an ethyl group, a phenyl group, a methoxy group, an ethoxy group, and a phenoxy group are preferable.

As a suitable specific example of the M unit having no carbon-carbon double bond, (CH ₃ ) ₃ SiO _1/2 , (CH ₃ CH ₂ )(CH ₃ ) ₂ SiO _1/2 , (CH ₃ CH ₂ ) can be exemplified. a trialkyl unit of ₂ (CH ₃ )SiO _1/2 , (CH ₃ CH ₂ ) ₃ SiO _1/2 or the like; a triaryl unit of (C ₆ H ₅ ) ₃ SiO _1/2 or the like; (C ₆ H ₅ ) a _{diarylmonoalkyl unit of 2} (CH ₃ )SiO _1/2 , (C ₆ H ₅ ) ₂ (CH ₃ CH ₂ )SiO _1/2 or the like; (C ₆ H ₅ )(CH ₃ ) ₂ a monoaryldialkyl unit such as SiO _1/2 or (C ₆ H ₅ )(CH ₃ CH ₂ ) ₂ SiO _1/2 ; (CH ₃ O) ₃ SiO _1/2 , (CH ₃ CH ₂ O) _{(CH 3 O) 2 SiO 1/2} , (CH 3 CH 2 O) 2 (CH 3 O) SiO 1/2, (CH 3 CH 2 O) 3 SiO 1/2 units, etc. trialkoxy; ( C ₆ H ₅ O) ₃ SiO _1/2 or the like triaryloxy unit; (C ₆ H ₅ O) ₂ (CH ₃ O)SiO _1/2 , (C ₆ H ₅ O) ₂ (CH ₃ CH ₂ O a diaryloxymonoalkoxy unit of SiO _1/2 or the like; (C ₆ H ₅ O)(CH ₃ O) ₂ SiO _1/2 , (C ₆ H ₅ O)(CH ₃ CH ₂ O) ₂ a monoaryloxy dialkoxy unit of SiO _1/2 or the like; (CH ₃ O) ₂ (CH ₃ )SiO _1/2 , (CH ₃ O) ₂ (CH ₃ CH ₂ )SiO _1/2 , (CH _{3 CH 2 O) 2 (CH} 3) SiO 1/2, (CH 3 CH 2 O) 2 (CH 3 CH 2) SiO 1/2 , etc. dialkoxy monoalkoxy _{Unit; (CH 3 O) 2 (} C 6 H 5) SiO 1/2, (CH 3 CH 2 O) 2 (C 6 H 5) SiO 1/2 , etc. dialkoxy monoaryl units; (CH ₃ O) (C ₆ H ₅ ) ₂ SiO _1/2 , (CH ₃ CH ₂ O)(C ₆ H ₅ ) ₂ SiO _1/2 or the like monoalkoxy diaryl unit; (C ₆ H ₅ O (CH ₃ ) ₂ SiO _1/2 , (C ₆ H ₅ O)(CH ₃ CH ₂ ) ₂ SiO _1/2 or the like monoaryloxydialkyl unit; (C ₆ H ₅ O) ₂ (CH ₃ ) a diaryloxymonoalkyl unit such as SiO _1/2 or (C ₆ H ₅ O) ₂ (CH ₃ CH ₂ )SiO _1/2 ; (C ₆ H ₅ O)(C ₆ H ₅ ) ₂ a monoaryloxydiaryl unit of SiO _1/2 or the like; a diaryloxymonoaryl unit of (C ₆ H ₅ O) ₂ (C ₆ H ₅ )SiO _1/2 or the like.

As a suitable specific example of the D unit having no carbon-carbon double bond, (CH ₃ ) ₂ SiO _2/2 , (CH ₃ CH ₂ )(CH ₃ )SiO _2/2 , (CH ₃ CH ₂ ) can be exemplified. ₂ SiO _2/2 units, etc. _{dialkyl; (C 6 H 5) 2} SiO 2/2 units, etc. _{biaryl; (C 6 H 5) (} CH 3) SiO 2/2, (C 6 H 5 a _monoaryl monoalkyl unit of (CH ₃ CH ₂ )SiO _2/2 or the like; (CH ₃ O) ₂ SiO _2/2 , (CH ₃ CH ₂ O)(CH ₃ O)SiO _2/2 , ( CH ₃ CH ₂ O) _{2 diatomoxy} unit of SiO _2/2 ; diaryloxy unit of (C ₆ H ₅ O) ₂ SiO _2/2 ; (C ₆ H ₅ O) (CH ₃ O a monoaryloxymonoalkoxy unit such as SiO _2/2 or (C ₆ H ₅ O)(CH ₃ CH ₂ O)SiO _2/2 ; (CH ₃ O)(CH ₃ )SiO _2/2 , (CH ₃ O)(CH ₃ CH ₂ )SiO _2/2 , (CH ₃ CH ₂ O)(CH ₃ )SiO _2/2 , (CH ₃ CH ₂ O)(CH ₃ CH ₂ )SiO _2/2, etc. a monoalkoxy monoalkyl unit; a monoalkoxy group of (CH ₃ O)(C ₆ H ₅ )SiO _2/2 , (CH ₃ CH ₂ O)(C ₆ H ₅ )SiO _2/2 or the like An aryl unit; a monoaryloxymonoalkyl unit of (C ₆ H ₅ O)(CH ₃ )SiO _2/2 , (C ₆ H ₅ O)(CH ₃ CH ₂ )SiO _2/2 or the like; ₆ H ₅ O) (C ₆ H ₅ ) SiO _2/2 or the like _{monoaryloxymonoaryl} unit or the like.

As a suitable specific example of the T unit having no carbon-carbon double bond, a monoalkyl unit such as (CH ₃ )SiO _3/2 or (CH ₃ CH ₂ )SiO _3/2 can be exemplified; (C ₆ H ₅ a _monoaryl unit such as SiO _3/2 ; a monoalkoxy unit such as (CH ₃ O)SiO _3/2 or (CH ₃ CH ₂ O)SiO _3/2 ; (C ₆ H ₅ O)SiO _{3 /2} or the like of a mono-aryloxy unit or the like.

As a suitable example of the case where R ⁷ is a group having a carbon-carbon double bond, an alkenyl group having 2 or more and 10 or less carbon atoms, an aromatic hydrocarbon group substituted by an alkenyl group having 2 or more and 4 or less carbon atoms, and carbon can be exemplified. An alkenyl-substituted heterocyclic group having 2 or more and 4 or less atoms, an alkyl group having 2 or more and 10 or less carbon atoms substituted with an acryloxy group, and 2 or more and 10 or less carbon atoms substituted by a methacryloxy group. An alkyl group, an propyleneoxy group-substituted aromatic hydrocarbon group, a methacryloxy group-substituted aromatic hydrocarbon group, an acryloxy group-substituted heterocyclic group, a methacryloxy group-substituted heterocyclic group .

As a suitable specific example of the case where R ⁷ is a group having a carbon-carbon double bond, a vinyl group, an allyl group, a 3-butenyl group, a 4-pentenyl group, a 5-hexenyl group, a 4-ethylene group can be exemplified. Phenylphenyl, 3-vinylphenyl, 2-vinylphenyl, 2-propenyloxyethyl, 2-methylpropenyloxyethyl, 3-propenyloxy n-propyl, 3 - Methacryloxyloxy n-propyl. Among these, vinyl, allyl, 3-propenyloxy n-propyl and 3-methylpropenyloxy n-propyl are preferred.

The total amount of the M unit, the D unit, and the T unit including the group having a carbon-carbon double bond in the entire structural unit of the siloxane compound is preferably 5 mol% or more and 70 mol% or less, preferably 10 mol%. The above 50 mol% or less is more preferable, and 15 mol% or more and 30 mol% or less are particularly preferable.

As a suitable example of the M unit having a vinyl group as a group having a carbon-carbon double bond, a unit represented by the following formula can be exemplified.

As a suitable example of the M unit having an allyl group as a group having a carbon-carbon double bond, a unit represented by the following formula can be exemplified.

As a suitable example of the M unit having a 3-propenyloxyl n-propyl group as a group having a carbon-carbon double bond, a unit represented by the following formula can be exemplified.

As a suitable example of the M unit having a 3-methacryloxyl n-propyl group as a group having a carbon-carbon double bond, a unit represented by the following formula can be exemplified.

As a suitable example of the D unit having a vinyl group as a group having a carbon-carbon double bond, a unit represented by the following formula can be exemplified.

As a suitable example of the D unit having an allyl group as a group having a carbon-carbon double bond, a unit represented by the following formula can be exemplified.

As a suitable example of the M unit having a 3-propenyloxyl n-propyl group or a 3-methylpropenyloxy n-propyl group as a group having a carbon-carbon double bond, a unit represented by the following formula can be exemplified .

As a suitable example of a T unit having a vinyl group, an allyl group, a 3-propenyloxyl n-propyl group or a 3-methylpropenyloxy n-propyl group as a group having a carbon-carbon double bond, an example is exemplified. The unit shown by the following formula.

The above description has a unit selected from the group consisting of an M unit represented by the formula (a1), a D unit represented by the formula (a2), a T unit represented by the formula (a3), and a unit represented by the formula (a4). The oxane compound can be produced by subjecting a decane compound represented by the following formulas (aI) to (a-IV) to hydrolysis and condensation according to a conventional method.

The decane compound to which the M unit is added: R ¹ R ² R ³ SiR ⁸ (a) The decane compound to which the D unit is added: R ⁴ R ⁵ SiR ⁸ ₂ (a-II) The decane compound to which the T unit is added: R ⁶ SiR ⁸ ₃ (a-III) The decane compound to which the Q unit is added: SiR ⁸ ₄ (a-IV) In the above formulas (aI) to (a-IV), R ¹ to R ⁶ and R ¹ to R ⁶ in the formulae (a1) to (a4) are the same, and R ⁸ represents a group which forms a sterol group by hydrolysis.

The group which forms a sterol group by hydrolysis is not specifically limited, and can be suitably selected from well-known base. Examples of the group which forms a sterol group by hydrolysis include an alkoxy group such as a methoxy group, an ethoxy group, an n-propyloxy group or an isopropyloxy group; a phenoxy group; a chlorine atom, a bromine atom or the like. A halogen atom; an isocyanate group or the like.

The above-mentioned oxoxane compound is preferably one or more structural units I selected from the structural units represented by the following formula (a1a), formula (a2a), formula (a3a), and formula (a4): (R ⁷ O) ₃ SiO _1/2・・・(a1a) (R ⁷ O) ₂ SiO _2/2・(a2a) (R ⁷ O)SiO _3/2・・・(a3a) SiO _{4/ 2} (a4) (In the formula (a1a), the formula (a2a), and the formula (a3a), R ⁷ is a monovalent organic group bonded to an oxygen atom in R ⁷ -O- by a CO bond). By including the structural unit I, the siloxane compound can more easily form a black cured film having excellent insulating properties and adhesion to a substrate.

The above-mentioned oxoxane compound further contains one or more structural units II selected from the structural units represented by the following formula (a1b), formula (a2b) and formula (a3b), and/or is selected from the following It is preferable that one or more structural units III of the structural unit represented by the formula (a1c) and the formula (a2c) are: (R ⁷ O) ₂ R ⁷ SiO _1/2 (1) (a1b) (R ⁷ O) R ⁷ SiO _2/2・(a2b) R ⁷ SiO _3/2・(a3b) (In the formula (a1b), the formula (a2b), and the formula (a3b), R ⁷ is a C-Si bond. a ruthenium atom in the formula (a1b), the formula (a2b) and the formula (a3b), or a monovalent organic group bonded to an oxygen atom in R ⁷ -O- by a CO bond; (R ⁷ O) R ⁷ ₂ SiO _1/2・・・(a1c) R ⁷ ₂ SiO _2/2・(a2c) (In the formula (a1c) and the formula (a2c), R ⁷ is bonded to the C—Si bond. (a1c) and a halogen atom in the formula (a2c), or a monovalent organic group bonded to an oxygen atom in R ⁷ -O- by a CO bond). By including the structural unit II and/or the structural unit III, the siloxane compound furthermore can more easily form a black cured film having excellent insulating properties and adhesion to a substrate.

In the case where the structural unit I contains the structural unit II and/or the structural unit III, the oxoxane compound (the molar amount of the structural unit I) / (the structural unit I, the structural unit II and the structural unit) The sum of the molar amounts of III) is preferably 0.25 or more. The value of (the molar amount of the structural unit I) / (the sum of the molar amount of the structural unit I, the structural unit II, and the structural unit III) is 0.25 or more, and the insulating property and the adhesion to the substrate are particularly easily formed. Excellent black hardened film. The value of (the molar amount of the structural unit I) / (the sum of the molar amounts of the structural unit I, the structural unit II, and the structural unit III) is preferably 0.30 or more, more preferably 0.40 or more, and particularly preferably 0.50 or more. The upper limit of the value of (the molar amount of the structural unit I) / (the sum of the molar amounts of the structural unit I, the structural unit II, and the structural unit III) may be appropriately set, but may be, for example, 0.90 or less, preferably Below 0.85.

As a preferable example of the above-described alkoxysilane compound, (CH ₃ O)SiO _3/2 (T unit), (CH ₃ )SiO _3/2 (T unit), and a unit of the following formula can be exemplified ( T unit) is a oxane compound. Here, (CH ₃ O)SiO _3/2 (T unit) corresponds to the above structural unit 1. Further, (CH ₃ )SiO _3/2 (T unit) and a unit (T unit) of the following formula correspond to the above structural unit II.

In the oxane compound, the content of (CH ₃ O)SiO _3/2 (T unit) is preferably 25 mol% or more and 80 mol% or less in the total structural unit, and 30 mol% or more is 70 mol. More preferably, the ear is less than or equal to 40%, and more preferably 40% or more and 60% or less. Further, among the above-mentioned oxoxane compounds, the content of the structural unit of the above formula having a 3-methylpropenyloxy n-propyl group is preferably 5 mol% or more and 70 mol% or less in the total structural unit. 10 mol% or more and 50 mol% or less is more preferable, and 15 mol% or more is 30 mol% or less.

The molecular weight of the siloxane compound is not particularly limited as long as it does not impair the object of the present invention. The polystyrene-equivalent weight average molecular weight (Mw) of the siloxane compound is preferably 750 or more and 6000 or less, more preferably 800 or more and 5,000 or less, and still more preferably 1,000 or more and 3,000 or less.

The content of the oxoxane compound of the cross-linking component (A) in the photosensitive composition is preferably 5% by mass or more, more preferably 5% by mass or more and 30% by mass or less, based on the total solid content of the photosensitive composition. It is more preferably 20% by mass or more and more preferably 5% by mass or more and 15% by mass or less.

<(B) Photopolymerization initiator> The (B) photopolymerization initiator is not particularly limited, and a conventionally known photopolymerization initiator can be used.

As the (B) photopolymerization initiator, specifically, 1-hydroxycyclohexyl phenyl ketone, 2-hydroxy-2-methyl-1-phenylpropan-1-one, 1-[4-( 2-hydroxyethoxy)phenyl]-2-hydroxy-2-methyl-1-propan-1-one, 1-(4-isopropylphenyl)-2-hydroxy-2-methylpropane- 1-ketone, 1-(4-dodecylphenyl)-2-hydroxy-2-methylpropan-1-one, 2,2-dimethoxy-1,2-diphenylethane- 1-ketone, bis(4-dimethylaminophenyl)one, 2-methyl-1-[4-(methylthio)phenyl]-2-morpholinylpropan-1-one, 2-benzyl 2-dimethylamino-1-(4-morpholinylphenyl)-butan-1-one, ethyl ketone, 1-[9-ethyl-6-(2-methylbenzhydryl) )-9H-carbazol-3-yl], 1-(O-acetamidine), (9-ethyl-6-nitro-9H-carbazol-3-yl)[4-(2-methoxy -1-methylethoxy)-2-methylphenyl]methanone O-acetamidine, 2-(benzylideneoxyimino)-1-[4-(phenylthio) Phenyl]-1-octanone, 2,4,6-trimethylbenzimidyldiphenylphosphine oxide, 4-benzylidene-4'-methyldimethyl sulfide, 4-dimethyl Aminobenzoic acid, methyl 4-dimethylaminobenzoate, ethyl 4-dimethylaminobenzoate, butyl 4-dimethylaminobenzoate, 4-dimethylamino-2-ethylhexyl benzoic acid 4-dimethylamino-2-isopentylbenzoic acid, benzyl-β-methoxyethyl acetal, benzyldimethylketal, 1-phenyl-1,2-propanedione-2 -(O-ethoxycarbonyl)anthracene, methyl o-benzylidenebenzoate, 2,4-diethylthioxanthone, 2-chlorothioxanthone, 2,4-dimethylthioxanthone , 1-chloro-4-propoxythioxanthone, thioxanthene, 2-chlorothioxanthene, 2,4-diethylthioxanthene, 2-methylthioxanthene, 2-isopropylthioxanthene, 2- Ethyl hydrazine, octamethyl hydrazine, 1,2-benzopyrene, 2,3-diphenyl hydrazine, azobisisobutyronitrile, benzhydryl peroxide, isopropyl hydroperoxide Benzene, 2-mercaptobenzimidazole, 2-mercaptobenzoene Oxazole, 2-mercaptobenzothiazole, 2-(o-chlorophenyl)-4,5-di(m-methoxyphenyl)-imidazolyl dimer, benzophenone, 2-chlorodiphenyl Methyl ketone, p,p'-bisdimethylaminobenzophenone, 4,4'-bisdiethylaminobenzophenone, 4,4'-dichlorobenzophenone, 3,3-di Methyl-4-methoxybenzophenone, benzyl, benzoin, benzoin methyl ether, benzoin ethyl ether, benzoin isopropyl ether, benzoin-n-butyl ether, benzoin isobutyl ether, benzoin Ether, acetophenone, 2,2-diethoxyacetophenone, p-dimethylacetophenone, p-dimethylaminopropenylbenzene, dichloroacetophenone, trichloroacetophenone, P-tertiary butyl acetophenone, p-dimethylamino acetophenone, p-tertiary butyl trichloroacetophenone, p-tertiary butyl dichloroacetophenone, α,α-dichloro -4-phenoxyacetophenone, thioxanthone, 2-methylthioxanthone, 2-isopropylthioxanthone, dibenzocycloheptanone, pentyl-4-dimethylaminobenzoic acid Ester, 9-phenyl acridine, 1,7-bis-(9-acridinyl)heptane, 1,5-bis-(9-acridinyl)pentane, 1,3-bis-(9- Acridine)propane, p-methoxy three , 2,4,6-para (trichloromethyl)-s-three 2-methyl-4,6-bis(trichloromethyl)-s-three ,2-[2-(5-methylfuran-2-yl)vinyl]-4,6-bis(trichloromethyl)-s-three ,2-[2-(furan-2-yl)vinyl]-4,6-bis(trichloromethyl)-s-three ,2-[2-(4-diethylamino-2-methylphenyl)vinyl]-4,6-bis(trichloromethyl)-s-three ,2-[2-(3,4-dimethoxyphenyl)vinyl]-4,6-bis(trichloromethyl)-s-three , 2-(4-methoxyphenyl)-4,6-bis(trichloromethyl)-s-three , 2-(4-ethoxystyryl)-4,6-bis(trichloromethyl)-s-three , 2-(4-n-butoxyphenyl)-4,6-bis(trichloromethyl)-s-three 2,4-bis-trichloromethyl-6-(3-bromo-4-methoxy)phenyl-s-three 2,4-bis-trichloromethyl-6-(2-bromo-4-methoxy)phenyl-s-three 2,4-bis-trichloromethyl-6-(3-bromo-4-methoxy)styrylphenyl-s-three 2,4-bis-trichloromethyl-6-(2-bromo-4-methoxy)styrylphenyl-s-three Wait. These photopolymerization initiators can be used singly or in combination of two or more.

Among these, a lanthanide photopolymerization initiator is used, and the sensitivity is particularly added. Among the photopolymerization initiators of the lanthanoid series, as a particularly preferred one, O-acetamido-1-[6-(2-methylbenzylidene)-9-ethyl-9H-carbazole- 3-yl]ethanone oxime, ethyl ketone, 1-[9-ethyl-6-(pyrrol-2-ylcarbonyl)-9H-indazol-3-yl], 1-(O-acetyl), And 1,2-octanedione, 1-[4-(phenylthio)-, 2-(O-benzamide)].

Further, as the photopolymerization initiator, an anthracene compound represented by the following formula (b1) is also preferably used. (R ^b1 is a group selected from the group consisting of a monovalent organic group, an amine group, a halogen, a nitro group, and a cyano group, and n1 is an integer of 0 or more and 4 or less, n2 is 0 or 1, and R ^b2 is a substitutable group. a phenyl group, or a carbazolyl group which may have a substituent, and R ^b3 is a hydrogen atom or an alkyl group having 1 or more and 6 or less carbon atoms).

In the formula (b1), R ^b1 is not particularly limited as long as it does not impair the object of the present invention, and may be appropriately selected from various organic groups. As a suitable example when R ^b1 is an organic group, an alkyl group, an alkoxy group, a cycloalkyl group, a cycloalkoxy group, a saturated aliphatic fluorenyl group, a saturated aliphatic decyloxy group, an alkoxycarbonyl group, or a substituent may be exemplified. a phenyl group, a phenoxy group which may have a substituent, a benzinyl group which may have a substituent, a phenoxycarbonyl group which may have a substituent, a benzyl fluorenyloxy group which may have a substituent, may have a substituent a phenylalkyl group, a naphthyl group which may have a substituent, a naphthyloxy group which may have a substituent, a naphthylmethyl fluorenyl group which may have a substituent, a naphthyloxycarbonyl group which may have a substituent, a naphthoquinone which may have a substituent An oxy group, a naphthylalkyl group which may have a substituent, a heterocyclic group which may have a substituent, an amine group, an amine group substituted with 1 or 2 organic groups, a morpholin-1-yl group, and a piperidine -1-yl, halogen, nitro, and cyano. When n1 is an integer of 2 or more and 4 or less, R ^b1 may be the same or different. Further, the number of carbon atoms of the substituent does not include the number of carbon atoms of the substituent which the substituent further has.

When R ^b1 is an alkyl group, it is preferably 1 or more and 20 or less carbon atoms, and more preferably 1 or more and 6 or less carbon atoms. Further, when R ^b1 is an alkyl group, it may be a straight chain or a branched chain. Specific examples of the case where R ^b1 is an alkyl group include methyl, ethyl, n-propyl, isopropyl, n-butyl, isobutyl, sec-butyl, tertiary butyl, and n-pentyl. Base, isopentyl, sec-pentyl, tert-pentyl, n-hexyl, n-heptyl, n-octyl, isooctyl, sec-octyl, tert-octyl, n-fluorenyl, iso Sulfhydryl, n-fluorenyl, and isodecyl. Further, when R ^b1 is an alkyl group, the alkyl group may further contain an ether bond (-O-) in the carbon chain. As an example of the alkyl group having an ether bond in the carbon chain, a methoxyethyl group, an ethoxyethyl group, a methoxyethoxyethyl group, an ethoxyethoxyethyl group, a propyloxy group can be illustrated. Ethoxyethyl, methoxypropyl and the like.

When R ^b1 is an alkoxy group, it is preferably 1 or more and 20 or less carbon atoms, and more preferably 1 or more and 6 or less carbon atoms. Further, when R ^b1 is an alkoxy group, it may be a straight chain or a branched chain. Specific examples of the case where R ^b1 is an alkoxy group include a methoxy group, an ethoxy group, an n-propyloxy group, an isopropyloxy group, an n-butyloxy group, an isobutyloxy group, and a sec-. Butyloxy, tert-butyloxy, n-pentyloxy, isopentyloxy, sec-pentyloxy, tert-pentyloxy, n-hexyloxy, n-heptyloxy , n-octyloxy, isooctyloxy, sec-octyloxy, tert-octyloxy, n-nonyloxy, isodecyloxy, n-decyloxy, and Isodecyloxy and the like. Further, when R ^b1 is an alkoxy group, the alkoxy group may further contain an ether bond (-O-) in the carbon chain. Examples of the alkoxy group having an ether bond in the carbon chain include a methoxyethoxy group, an ethoxyethoxy group, a methoxyethoxyethoxy group, and an ethoxyethoxyethoxy group. Propyloxyethoxyethoxy, and methoxypropyloxy and the like.

When R ^b1 is a cycloalkyl group or a cycloalkoxy group, it is preferably 3 or more and 10 or less carbon atoms, and more preferably 3 or more and 6 or less carbon atoms. Specific examples of the case where R ^b1 is a cycloalkyl group include a cyclopropyl group, a cyclobutyl group, a cyclopentyl group, a cyclohexyl group, a cycloheptyl group, and a cyclooctyl group. Specific examples of the case where R ^b1 is a cycloalkoxy group include a cyclopropyloxy group, a cyclobutyloxy group, a cyclopentyloxy group, a cyclohexyloxy group, a cycloheptyloxy group, and a cyclooctyloxy group. Wait.

When R ^b1 is a saturated aliphatic fluorenyl group or a saturated aliphatic fluorenyloxy group, it is preferably 2 or more and 20 or less carbon atoms, and more preferably 2 or more and 7 or less carbon atoms. Specific examples of the case where R ^b1 is a saturated aliphatic fluorenyl group include ethyl hydrazino group, propyl fluorenyl group, n-butyl fluorenyl group, 2-methyl propyl fluorenyl group, n-pentyl fluorenyl group, and 2,2-dimethyl propyl group. Sulfhydryl, n-hexyl, n-heptyl, n-octyl, n-fluorenyl, n-fluorenyl, n-undecyl, n-dodedecyl, n-tride Base, n-tetradecyl, n-pentadecanyl, and n-hexadecanyl. Specific examples of the case where R ^b1 is a saturated aliphatic oxime group include an ethoxy group, a propenyloxy group, an n-butenyloxy group, a 2-methylpropoxy group, and an n-pentamoxy group. 2,2-dimethylpropenyloxy, n-hexyloxy, n-heptyloxy, n-octyloxy, n-decyloxy, n-decyloxy, n-ten Monomethoxy, n-dodecyloxy, n-tridecanyloxy, n-tetradecyloxy, n-pentadecanyloxy, and n-hexadecyloxy.

When R ^b1 is an alkoxycarbonyl group, it is preferably 2 or more and 20 or less carbon atoms, and more preferably 2 or more and 7 or less carbon atoms. Specific examples of the case where R ^b1 is an alkoxycarbonyl group include a methoxycarbonyl group, an ethoxycarbonyl group, an n-propyloxycarbonyl group, an isopropyloxycarbonyl group, an n-butyloxycarbonyl group, and an isobutyl group. Alkoxycarbonyl, sec-butyloxycarbonyl, tert-butyloxycarbonyl, n-pentyloxycarbonyl, isopentyloxycarbonyl, sec-pentyloxycarbonyl, tert-pentyloxy Carbonyl, n-hexyloxycarbonyl, n-heptyloxycarbonyl, n-octyloxycarbonyl, isooctyloxycarbonyl, sec-octyloxycarbonyl, tert-octyloxycarbonyl, n- A mercaptooxycarbonyl group, an isodecyloxycarbonyl group, an n-fluorenyloxycarbonyl group, an isodecyloxycarbonyl group or the like.

When R ^b1 is a phenylalkyl group, it is preferably 7 or more and 20 or less carbon atoms, and more preferably 7 or more and 10 or less carbon atoms. Further, when R ^b1 is a naphthylalkyl group, the number of carbon atoms is preferably 11 or more and 20 or less, and more preferably 11 or more and 14 or less. Specific examples of the case where R ^b1 is a phenylalkyl group include a benzyl group, a 2-phenylethyl group, a 3-phenylpropyl group, and a 4-phenylbutyl group. Specific examples of the case where R ^b1 is a naphthylalkyl group include α-naphthylmethyl group, β-naphthylmethyl group, 2-(α-naphthyl)ethyl group, and 2-(β-naphthyl)ethyl group. base. When R ^b1 is a phenylalkyl group or a naphthylalkyl group, R ^b1 may further have a substituent on the phenyl group or a naphthyl group.

When R ^b1 is a heterocyclic group, the heterocyclic group is a 5-membered or 6-membered monocyclic ring containing one or more of N, S, and O, or a heterocyclic ring in which the single ring or the monocyclic ring is condensed with a benzene ring. base. When the heterocyclic group is a condensed ring, the number of rings is set to 3. Examples of the heterocyclic ring constituting the heterocyclic group include furan, thiophene, and pyrrole. Azole Oxazole, thiazole, thiadiazole, isothiazole, imidazole, pyrazole, triazole, pyridine, pyridyl Pyrimidine , benzofuran, benzothiophene, anthracene, isoindole, pyridazine, benzimidazole, benzotriazole, benzo Azole, benzothiazole, carbazole, anthracene, quinoline, isoquinoline, quinazoline, anthracene , porphyrins, and quinoxalines. When R ^b1 is a heterocyclic group, the heterocyclic group may further have a substituent.

When R ^b1 is an amine group substituted with one or two organic groups, examples of the organic group include an alkyl group having 1 or more and 20 or less carbon atoms, a cycloalkyl group having 3 or more and 10 or less carbon atoms, and a carbon number. a saturated aliphatic fluorenyl group having 2 or more and 20 or less, a phenyl group which may have a substituent, a benzamyl group which may have a substituent, a phenylalkyl group having 7 or more and 20 or less carbon atoms which may have a substituent, may have a substitution The naphthyl group, a naphthylmethyl group which may have a substituent, a naphthylalkyl group having 11 or more and 20 or less carbon atoms which may have a substituent, and a heterocyclic group. Specific examples of such suitable organic groups are the same as R ^b1 . Specific examples of the amine group substituted with 1 or 2 organic groups include methylamino group, ethylamino group, diethylamino group, n-propylamino group, di-n-propylamino group, isopropylamine group, and n-butyl group. Amino, di-n-butylamino, n-pentylamino, n-hexylamino, n-heptylamino, n-octylamino, n-nonylamino, n-nonylamino, phenylamine Base, naphthylamino group, ethyl hydrazino group, propyl decylamino group, n-butyl decylamino group, n-pentenylamino group, n-hexyl decylamino group, n-heptylamino group, n a octylamino group, an n-fluorenylamino group, a benzhydrylamino group, an α-naphthylmethylamino group, and a β-naphthylmethylamino group.

Examples of the substituent in the case where the phenyl group, the naphthyl group and the heterocyclic group contained in the R ^b1 further have a substituent include an alkyl group having 1 or more and 6 or less carbon atoms, an alkoxy group having 1 or more and 6 or less carbon atoms, and carbon. a saturated aliphatic fluorenyl group having 2 or more and 7 or less atoms, an alkoxycarbonyl group having 2 or more and 7 or less carbon atoms, a saturated aliphatic decyloxy group having 2 or more and 7 or less carbon atoms, and having 1 or more and 6 or less carbon atoms. a monoalkylamino group of an alkyl group, a dialkylamino group having an alkyl group having 1 or more and 6 or less carbon atoms, morpholin-1-yl group, and piperazine -1-yl, halogen, nitro, and cyano. When the phenyl group, the naphthyl group and the heterocyclic group contained in R ^b1 further have a substituent, the number of the substituents is not limited, but is preferably 1 or more and 4 or less, insofar as the object of the present invention is not inhibited. When the phenyl group, the naphthyl group and the heterocyclic group contained in R ^b1 have a plurality of substituents, the plural substituents may be the same or different.

Among the R ^b1 , the chemical stability or the steric hindrance is small, and the synthesis of the oxime ester compound is easy, etc., and is an alkoxy group selected from the group consisting of an alkyl group having 1 or more and 6 or less carbon atoms and a carbon number of 1 or more and 6 or less. Further, a group of a saturated aliphatic fluorenyl group having 2 or more and 7 or less carbon atoms is preferably a group, and an alkyl group having 1 or more and 6 or less carbon atoms is more preferable, and a methyl group is particularly preferable.

In the phenyl group bonded to R ^b1 , the position of the bond between the main skeleton of the phenyl group and the oxime ester compound is set to 1 position, and when the position of the methyl group is 2 position, the position of R ^b1 bonded to the phenyl group is 4 Bit or 5 is better, and 5 is better. Further, n1 is preferably an integer of 0 or more and 3 or less, and an integer of 0 or more and 2 or less is more preferable, and 0 or 1 is particularly preferable.

R ^b2 is a phenyl group which may have a substituent, or a carbazolyl group which may have a substituent. Further, when R ^b2 is a carbazole group which may have a substituent, the nitrogen atom on the carbazolyl group may be substituted with an alkyl group having 1 or more and 6 or less carbon atoms.

In R ^b2 , the substituent of the phenyl group or the carbazolyl group is not particularly limited as long as it does not impair the object of the present invention. Examples of suitable substituents which the phenyl group or the carbazolyl group may have on the carbon atom include an alkyl group having 1 or more and 20 or less carbon atoms, an alkoxy group having 1 or more and 20 or less carbon atoms, and 3 carbon atoms. The above 10 or less cycloalkyl group, a cycloalkyloxy group having 3 or more and 10 or less carbon atoms, a saturated aliphatic fluorenyl group having 2 or more and 20 or less carbon atoms, an alkoxycarbonyl group having 2 or more and 20 or less carbon atoms, or a carbon atom; a saturated aliphatic decyloxy group having 2 or more and 20 or less, a phenyl group which may have a substituent, a phenoxy group which may have a substituent, a phenylthio group which may have a substituent, a benzhydryl group which may have a substituent, a phenoxycarbonyl group which may have a substituent, a benzylideneoxy group which may have a substituent, a phenylalkyl group having 7 or more and 20 or less carbon atoms which may have a substituent, a naphthyl group which may have a substituent, may have a substitution a naphthyloxy group, a naphthylmethyl group which may have a substituent, a naphthyloxycarbonyl group which may have a substituent, a naphthylmethoxycarbonyl group which may have a substituent, and a number of carbon atoms which may have a substituent of 11 or more and 20 or less Naphthylalkyl group, heterocyclic group which may have a substituent, heterocyclic ring which may have a substituent a carbonyl group, an amine group, an amine group substituted with 1 or 2 organic groups, a morpholin-1-yl group, and a piperidine -1-yl, halogen, nitro, and cyano.

When R ^b2 is a carbazolyl group, examples of a suitable substituent which the carbazolyl group may have on the nitrogen atom may, for example, be an alkyl group having 1 or more and 20 or less carbon atoms or a cycloalkyl group having 3 or more and 10 or less carbon atoms. a saturated aliphatic fluorenyl group having 2 or more and 20 or less carbon atoms, an alkoxycarbonyl group having 2 or more and 20 or less carbon atoms, a phenyl group which may have a substituent, a benzamyl group which may have a substituent, and a substituent a phenoxycarbonyl group, a phenylalkyl group having 7 or more and 20 or less carbon atoms which may have a substituent, a naphthyl group which may have a substituent, a naphthylmethyl group which may have a substituent, and a naphthyloxy group which may have a substituent The carbonyl group, a naphthylalkyl group having 11 or more and 20 or less carbon atoms which may have a substituent, a heterocyclic group which may have a substituent, and a heterocyclic carbonyl group which may have a substituent. Among these substituents, an alkyl group having 1 or more and 20 or less carbon atoms is preferred, and an alkyl group having 1 or more and 6 or less carbon atoms is more preferable, and ethyl is particularly preferred.

Specific examples of the substituent which the phenyl group or the carbazolyl group may have, an alkyl group, an alkoxy group, a cycloalkyl group, a cycloalkoxy group, a saturated aliphatic fluorenyl group, an alkoxycarbonyl group, a saturated aliphatic decyloxy group, A phenylalkyl group which may have a substituent, a naphthylalkyl group which may have a substituent, a heterocyclic group which may have a substituent, and an amine group substituted with 1 or 2 organic groups are the same as R ^b1 .

In the case of R ^b2 , examples of the substituent when the phenyl group, the naphthyl group and the heterocyclic group which are contained in the substituent of the phenyl group or the carbazolyl group further have a substituent include an alkyl group having 1 or more and 6 or less carbon atoms. An alkoxy group having 1 or more and 6 or less carbon atoms; a saturated aliphatic fluorenyl group having 2 or more and 7 or less carbon atoms; an alkoxycarbonyl group having 2 or more and 7 or less carbon atoms; and a saturated fat having 2 or more and 7 or less carbon atoms; Alkyloxy; phenyl; naphthyl; benzhydryl; naphthylmethyl; alkyl, morpholin-1-yl, pipe selected from the group consisting of 1 or more and 6 or less carbon atoms a benzyl group substituted with a group in the group of phenyl groups and a group of phenyl groups; a monoalkylamino group having an alkyl group having 1 or more and 6 or less carbon atoms; and having a carbon number of 1 or more and 6 or less Alkyl dialkylamine; morpholin-1-yl; -1-yl; halogen; nitro; cyano. When the phenyl group, the naphthyl group and the heterocyclic group which are contained in the substituent of the phenyl or carbazolyl group further have a substituent, the number of the substituents is not limited insofar as it does not inhibit the object of the present invention, but It is preferably 1 or more and 4 or less. When the phenyl group, the naphthyl group and the heterocyclic group have a plurality of substituents, the plural substituents may be the same or different.

Among the R ^b2 , a group represented by the following formula (b2) or (b3) is preferred from the viewpoint of easily obtaining a photopolymerization initiator excellent in sensitivity, and the group represented by the following formula (b2) is more preferable. It is a group represented by the following formula (b2) and A is a group of S.

(R ^b4 is a group selected from the group consisting of a monovalent organic group, an amine group, a halogen, a nitro group, and a cyano group, and A is S or O, and n 3 is an integer of 0 or more and 4 or less).

(R ^b5 and R ^b6 are each a monovalent organic group).

When R ^b4 in the formula (b2) is an organic group, it can be selected from various organic groups within a range not inhibiting the object of the present invention. As a suitable example of the case where R ^b4 in the formula (b2) is an organic group, an alkyl group having 1 or more and 6 or less carbon atoms; an alkoxy group having 1 or more and 6 or less carbon atoms; and a saturated number of 2 or more and 7 or less carbon atoms can be exemplified. An aliphatic fluorenyl group; an alkoxycarbonyl group having 2 or more and 7 or less carbon atoms; a saturated aliphatic fluorenyloxy group having 2 or more and 7 or less carbon atoms; a phenyl group; a naphthyl group; a benzamidine group; a naphthylmethyl group; Selecting an alkyl group having a carbon number of 1 or more and 6 or less, morpholin-1-yl, and piperazine a benzyl group substituted with a group in the group of phenyl groups and a group of phenyl groups; a monoalkylamino group having an alkyl group having 1 or more and 6 or less carbon atoms; and having a carbon number of 1 or more and 6 or less Alkyl dialkylamine; morpholin-1-yl; -1-yl; halogen; nitro; cyano.

Among R ^b4 , a benzepidine group; a naphthylmethyl group; an alkyl group selected from a carbon number of 1 or more and 6 or less, a morpholin-1-yl group, a piperidine a benzyl group substituted with a group in the group of -1- group and a group of phenyl groups; a nitro group; a benzyl group; a naphthyl group; a 2-methylphenylcarbonyl group; 1-yl)phenylcarbonyl; 4-(phenyl)phenylcarbonyl is more preferred.

Further, in the formula (b2), n3 is preferably an integer of 0 or more and 3 or less, and an integer of 0 or more and 2 or less is more preferable, and 0 or 1 is particularly preferable. when n3 is 1, the bonding position of R ^b4, with respect to the phenyl group bonded to an oxygen atom or a sulfur atom bonded at the bonding R ^b4, the preferred position for the.

R ^b5 in the formula (b3) can be selected from various organic groups within a range not inhibiting the object of the present invention. A suitable example of R ^b5 is an alkyl group having 1 or more and 20 or less carbon atoms, a cycloalkyl group having 3 or more and 10 or less carbon atoms, a saturated aliphatic fluorenyl group having 2 or more and 20 or less carbon atoms, and 2 carbon atoms. The above 20 or less alkoxycarbonyl group, a phenyl group which may have a substituent, a benzylidene group which may have a substituent, a phenoxycarbonyl group which may have a substituent, and a carbon atom which may have a substituent have 7 or more and 20 or less. A phenylalkyl group, a naphthyl group which may have a substituent, a naphthylmethyl group which may have a substituent, a naphthyloxycarbonyl group which may have a substituent, a naphthylalkyl group which may have a substituent of 11 or more and 20 or less carbon atoms a heterocyclic group which may have a substituent, a heterocyclic carbonyl group which may have a substituent, and the like.

Among R ^b5 , an alkyl group having 1 or more and 20 or less carbon atoms is preferred, and an alkyl group having 1 or more and 6 or less carbon atoms is more preferable, and ethyl is particularly preferred.

R ^b6 in the formula (b3) is not particularly limited as long as it does not impair the object of the present invention, and can be selected from various organic groups. Specific examples of the suitable group of R ^b6 include an alkyl group having 1 or more and 20 or less carbon atoms, a phenyl group which may have a substituent, a naphthyl group which may have a substituent, and a heterocyclic group which may have a substituent. As R ^b6 , a phenyl group which may be a substituent among these groups is more preferable, and a 2-methylphenyl group is particularly preferable.

The substituent in the case where the phenyl group, the naphthyl group and the heterocyclic group contained in R ^b4 , R ^b5 or R ^b6 further have a substituent, and examples thereof include an alkyl group having 1 or more and 6 or less carbon atoms, and a carbon number of 1 or more and 6 or less. An alkoxy group, a saturated aliphatic fluorenyl group having 2 or more and 7 or less carbon atoms, an alkoxycarbonyl group having 2 or more and 7 or less carbon atoms, a saturated aliphatic decyloxy group having 2 or more and 7 or less carbon atoms, and a carbon atom; a monoalkylamino group having an alkyl group of 1 or more and 6 or less, a dialkylamino group having an alkyl group having 1 or more and 6 or less, morpholin-1-yl, and piperidin -1-yl, halogen, nitro, and cyano. When the phenyl group, the naphthyl group and the heterocyclic group contained in R ^b4 , R ^b5 or R ^b6 further have a substituent, the number of the substituents is not limited insofar as it does not inhibit the object of the present invention, but is 1 or more and 4 or less are preferable. When the phenyl group, the naphthyl group and the heterocyclic group contained in R ^b4 , R ^b5 or R ^b6 have a plurality of substituents, the plural substituents may be the same or different.

R ^b3 in the formula (b1) is a hydrogen atom or an alkyl group having 1 or more and 6 or less carbon atoms. As R ^b3 , a methyl group or an ethyl group is preferred, and a methyl group is more preferred.

As a particularly suitable compound among the oxime ester compounds represented by the formula (b1), the following PI-1 to PI-42 can be exemplified.

The compound of the following structure is also preferably used as the oxime ester compound represented by the formula (b1). The compound of the following structure is commercially available as NCI-831 (made by ADEKA Corporation).

Further, the oxime ester compound represented by the following formula (b4) is also preferably used as a photopolymerization initiator.

(R ^b7 is a hydrogen atom, a nitro group or a monovalent organic group, and each of R ^b8 and R ^b9 is a chain alkyl group which may have a substituent, a cyclic organic group which may have a substituent, or a hydrogen atom, or R ^b8 R ^{b 9 is} bonded to each other to form a ring, R ^b10 is a monovalent organic group, R ^b11 is a hydrogen atom, an alkyl group having 1 or more and 11 or less carbon atoms which may have a substituent, or an aryl group which may have a substituent, n 4 is An integer of 0 or more and 4 or less, and n5 is 0 or 1).

Here, as the hydrazine compound for producing the oxime ester compound of the formula (b4), a compound represented by the following formula (b5) is suitable.

(R ^b7 , R ^b8 , R ^b9 , R ^b10 , n4 and n5 are the same as in the formula (b4)).

In the formulae (b4) and (b5), R ^b7 is a hydrogen atom, a nitro group or a monovalent organic group. The R ^b7 is a 6-membered aromatic ring bonded to a group represented by -(CO) _n5 - on the anthracene ring in the formula (b4), and bonded to a different 6-membered aromatic ring. In the formula (b4), the bonding position of R ^b7 to the anthracene ring is not particularly limited. When the compound represented by the formula (b4) has one or more R ^b7 , the synthesis of the compound represented by the formula (b4) is easy, and one of the one or more R ^b7 is bonded to each other. Two of the rings are preferred. When R ^b7 is a complex number, the plural R ^b7 may be the same or different.

When R ^b7 is an organic group, R ^b7 is not particularly limited as long as it does not impair the object of the present invention, and can be appropriately selected from various organic groups. As a suitable example when R ^b7 is an organic group, an alkyl group, an alkoxy group, a cycloalkyl group, a cycloalkoxy group, a saturated aliphatic fluorenyl group, a saturated aliphatic decyloxy group, an alkoxycarbonyl group, or a substituent may be exemplified. a phenyl group, a phenoxy group which may have a substituent, a benzinyl group which may have a substituent, a phenoxycarbonyl group which may have a substituent, a benzyl fluorenyloxy group which may have a substituent, may have a substituent a phenylalkyl group, a naphthyl group which may have a substituent, a naphthyloxy group which may have a substituent, a naphthylmethyl fluorenyl group which may have a substituent, a naphthyloxycarbonyl group which may have a substituent, a naphthoquinone which may have a substituent An oxy group, a naphthylalkyl group which may have a substituent, a heterocyclic group which may have a substituent, a heterocyclic carbonyl group which may have a substituent, an amine group substituted with 1 or 2 organic groups, a morpholin-1-yl group, And piperazine -1- base and so on.

When R ^b7 is an alkyl group, the number of carbon atoms of the alkyl group is preferably 1 or more and 20 or less, more preferably 1 or more and 6 or less. Further, when R ^b7 is an alkyl group, it may be a straight chain or a branched chain. Specific examples of the case where R ^b7 is an alkyl group include methyl, ethyl, n-propyl, isopropyl, n-butyl, isobutyl, sec-butyl, tert-butyl, n-pentyl. Base, isopentyl, sec-pentyl, tert-pentyl, n-hexyl, n-heptyl, n-octyl, isooctyl, sec-octyl, tert-octyl, n-fluorenyl, iso Sulfhydryl, n-fluorenyl, and isodecyl. Further, when R ^b7 is an alkyl group, the alkyl group may further contain an ether bond (-O-) in the carbon chain. As an example of the alkyl group having an ether bond in the carbon chain, a methoxyethyl group, an ethoxyethyl group, a methoxyethoxyethyl group, an ethoxyethoxyethyl group, a propyloxy group can be illustrated. Ethoxyethyl, methoxypropyl and the like.

When R ^b7 is an alkoxy group, the number of carbon atoms of the alkoxy group is preferably 1 or more and 20 or less, more preferably 1 or more and 6 or less. Further, when R ^b7 is an alkoxy group, it may be a straight chain or a branched chain. Specific examples of the case where R ^b7 is an alkoxy group include a methoxy group, an ethoxy group, an n-propyloxy group, an isopropyloxy group, an n-butyloxy group, an isobutyloxy group, and a sec-. Butyloxy, tert-butyloxy, n-pentyloxy, isopentyloxy, sec-pentyloxy, tert-pentyloxy, n-hexyloxy, n-heptyloxy , n-octyloxy, isooctyloxy, sec-octyloxy, tert-octyloxy, n-nonyloxy, isodecyloxy, n-decyloxy, and Isodecyloxy and the like. Further, when R ^b7 is an alkoxy group, the alkoxy group may further contain an ether bond (-O-) in the carbon chain. Examples of the alkoxy group having an ether bond in the carbon chain include a methoxyethoxy group, an ethoxyethoxy group, a methoxyethoxyethoxy group, and an ethoxyethoxyethoxy group. Propyloxyethoxyethoxy, and methoxypropyloxy and the like.

When R ^b7 is a cycloalkyl group or a cycloalkoxy group, the number of carbon atoms of the cycloalkyl group or the cycloalkoxy group is preferably 3 or more and 10 or less, more preferably 3 or more and 6 or less. Specific examples of the case where R ^b7 is a cycloalkyl group include a cyclopropyl group, a cyclobutyl group, a cyclopentyl group, a cyclohexyl group, a cycloheptyl group, and a cyclooctyl group. Specific examples of the case where R ^b7 is a cycloalkoxy group include a cyclopropyloxy group, a cyclobutyloxy group, a cyclopentyloxy group, a cyclohexyloxy group, a cycloheptyloxy group, and a cyclooctyloxy group. Wait.

When R ^b7 is a saturated aliphatic fluorenyl group or a saturated aliphatic fluorenyloxy group, the number of carbon atoms of the saturated aliphatic fluorenyl group or the saturated aliphatic fluorenyloxy group is preferably 2 or more and 21 or less, more preferably 2 or more and 7 or less. Specific examples of the case where R ^b7 is a saturated aliphatic fluorenyl group include ethyl hydrazino group, propyl fluorenyl group, n-butyl fluorenyl group, 2-methyl propyl fluorenyl group, n-pentyl fluorenyl group, and 2,2-dimethyl propyl group. Sulfhydryl, n-hexyl, n-heptyl, n-octyl, n-fluorenyl, n-fluorenyl, n-undecyl, n-dodedecyl, n-tride Base, n-tetradecyl, n-pentadecanyl, and n-hexadecanyl. Specific examples of the case where R ^b7 is a saturated aliphatic oxime group include an ethoxy group, a propenyloxy group, an n-butenyloxy group, a 2-methylpropoxy group, and an n-pentyloxy group. 2,2-dimethylpropenyloxy, n-hexyloxy, n-heptyloxy, n-octyloxy, n-decyloxy, n-decyloxy, n-ten Monomethoxy, n-dodecyloxy, n-tridecanyloxy, n-tetradecyloxy, n-pentadecanyloxy, and n-hexadecyloxy.

When R ^b7 is an alkoxycarbonyl group, the number of carbon atoms of the alkoxycarbonyl group is preferably 2 or more and 20 or less, more preferably 2 or more and 7 or less. Specific examples of the case where R ^b7 is an alkoxycarbonyl group include a methoxycarbonyl group, an ethoxycarbonyl group, an n-propyloxycarbonyl group, an isopropyloxycarbonyl group, an n-butyloxycarbonyl group, and an isobutyl group. Alkoxycarbonyl, sec-butyloxycarbonyl, tert-butyloxycarbonyl, n-pentyloxycarbonyl, isopentyloxycarbonyl, sec-pentyloxycarbonyl, tert-pentyloxy Carbonyl, n-hexyloxycarbonyl, n-heptyloxycarbonyl, n-octyloxycarbonyl, isooctyloxycarbonyl, sec-octyloxycarbonyl, tert-octyloxycarbonyl, n- A mercaptooxycarbonyl group, an isodecyloxycarbonyl group, an n-fluorenyloxycarbonyl group, an isodecyloxycarbonyl group or the like.

When R ^b7 is a phenylalkyl group, the number of carbon atoms of the phenylalkyl group is preferably 7 or more and 20 or less, more preferably 7 or more and 10 or less. Further, when R ^b7 is a naphthylalkyl group, the number of carbon atoms of the naphthylalkyl group is preferably 11 or more and 20 or less, more preferably 11 or more and 14 or less. Specific examples of the case where R ^b7 is a phenylalkyl group include a benzyl group, a 2-phenylethyl group, a 3-phenylpropyl group, and a 4-phenylbutyl group. Specific examples of the case where R ^b7 is a naphthylalkyl group include α-naphthylmethyl group, β-naphthylmethyl group, 2-(α-naphthyl)ethyl group, and 2-(β-naphthyl)ethyl group. base. When R ^b7 is a phenylalkyl group or a naphthylalkyl group, R ^b7 may further have a substituent on the phenyl group or a naphthyl group.

When R ^b7 is a heterocyclic group, the heterocyclic group is a single ring of 5 or 6 members containing one or more of N, S, and O, or a heterocyclic ring or a mixture of the monocyclic ring and the benzene ring. Ring base. When the heterocyclic group is a condensed ring, the number of rings is set to 3. The heterocyclic group may be an aromatic group (heteroaryl group) or a non-aromatic group. As the heterocyclic ring constituting the heterocyclic group, furan, thiophene, pyrrole, Azole Oxazole, thiazole, thiadiazole, isothiazole, imidazole, pyrazole, triazole, pyridine, pyridyl Pyrimidine , benzofuran, benzothiophene, anthracene, isoindole, pyridazine, benzimidazole, benzotriazole, benzo Azole, benzothiazole, carbazole, anthracene, quinoline, isoquinoline, quinazoline, anthracene , porphyrin, quinoxaline, piperidine, piperidine , morpholine, piperidine, tetrahydropyran, and tetrahydrofuran. When R ^b7 is a heterocyclic group, the heterocyclic group may further have a substituent.

When R ^b7 is a heterocyclic carbonyl group, the heterocyclic group contained in the heterocyclic carbonyl group is the same as when R ^b7 is a heterocyclic group.

When R ^b7 is an amine group substituted with one or two organic groups, a suitable example of the organic group is an alkyl group having 1 or more and 20 or less carbon atoms, a cycloalkyl group having 3 or more and 10 or less carbon atoms, and a carbon number. a saturated aliphatic fluorenyl group having 2 or more and 21 or less, a phenyl group which may have a substituent, a benzamyl group which may have a substituent, a phenylalkyl group having 7 or more and 20 or less carbon atoms which may have a substituent, may have a substitution The naphthyl group, a naphthylmethyl group which may have a substituent, a naphthylalkyl group having 11 or more and 20 or less carbon atoms which may have a substituent, and a heterocyclic group. Specific examples of such suitable organic groups are the same as R ^b7 . Specific examples of the amine group substituted with 1 or 2 organic groups include a methylamino group, an ethylamino group, a diethylamino group, an n-propylamino group, a di-n-propylamino group, an isopropylamine group, and an n-butyl group. Amino, di-n-butylamino, n-pentylamino, n-hexylamino, n-heptylamino, n-octylamino, n-nonylamino, n-nonylamino, phenylamine Base, naphthylamino group, ethyl hydrazino group, propyl decylamino group, n-butyl decylamino group, n-pentenylamino group, n-hexyl decylamino group, n-heptylamino group, n a octylamino group, an n-fluorenylamino group, a benzhydrylamino group, an α-naphthylmethylamino group, and a β-naphthylmethylamino group.

Examples of the substituent in the case where the phenyl group, the naphthyl group and the heterocyclic group contained in the R ^b7 further have a substituent include an alkyl group having 1 or more and 6 or less carbon atoms, an alkoxy group having 1 or more and 6 or less carbon atoms, and carbon. a saturated aliphatic fluorenyl group having 2 or more and 7 or less atoms, an alkoxycarbonyl group having 2 or more and 7 or less carbon atoms, a saturated aliphatic decyloxy group having 2 or more and 7 or less carbon atoms, and having 1 or more and 6 or less carbon atoms. a monoalkylamino group of an alkyl group, a dialkylamino group having an alkyl group having 1 or more and 6 or less carbon atoms, morpholin-1-yl group, and piperazine -1-yl, halogen, nitro, and cyano. When the phenyl group, the naphthyl group and the heterocyclic group contained in R ^b7 further have a substituent, the number of the substituents is not limited, but is preferably 1 or more and 4 or less, insofar as the object of the present invention is not inhibited. When the phenyl group, the naphthyl group and the heterocyclic group contained in R ^b7 have a plurality of substituents, the plural substituents may be the same or different.

Among the above-described examples, as R ^b7 , a group represented by a nitro group or R ^b12 -CO- tends to have a high sensitivity. R ^b12 is not particularly limited ^insofar as it does not impair the object of the present invention, and can be selected from various organic groups. Examples of a suitable group of R ^b12 include an alkyl group having 1 or more and 20 or less carbon atoms, a phenyl group which may have a substituent, a naphthyl group which may have a substituent, and a heterocyclic group which may have a substituent. As R ^b12 , among these groups, 2-methylphenyl, thiophen-2-yl, and α-naphthyl are particularly preferred. Further, when R ^b7 is a hydrogen atom, the transparency tends to be good. In addition, when R ^b7 is a hydrogen atom and R ^b10 is a group represented by the formula (b4a) or (b4b) which will be described later, the transparency tends to be further improved.

In the formula (b4), each of R ^b8 and R ^b9 is a chain alkyl group which may have a substituent, a cyclic organic group which may have a substituent, or a hydrogen atom. R ^b8 and R ^b9 may also be bonded to each other to form a ring. Among these groups, R ^b8 and R ^b9 are preferably a chain alkyl group which may have a substituent. When R ^b8 and R ^b9 are a chain alkyl group which may have a substituent, the chain alkyl group may be a linear alkyl group or a branched alkyl group.

When R ^b8 and R ^b9 are a chain alkyl group having no substituent, the number of carbon atoms of the chain alkyl group is preferably 1 or more and 20 or less, more preferably 1 or more and 10 or less, and particularly preferably 1 or more and 6 or less. Specific examples of the case where R ^b8 and R ^b9 are a chain alkyl group include methyl, ethyl, n-propyl, isopropyl, n-butyl, isobutyl, sec-butyl, and tertiary butyl. Base, n-pentyl, isopentyl, sec-pentyl, tert-pentyl, n-hexyl, n-heptyl, n-octyl, isooctyl, sec-octyl, tert-octyl, n - mercapto, isoindolyl, n-fluorenyl, and isodecyl. Further, when R ^b8 and R ^b9 are an alkyl group, the alkyl group may further contain an ether bond (-O-) in the carbon chain. As an example of the alkyl group having an ether bond in the carbon chain, a methoxyethyl group, an ethoxyethyl group, a methoxyethoxyethyl group, an ethoxyethoxyethyl group, a propyloxy group can be illustrated. Ethoxyethyl, methoxypropyl and the like.

When R ^b8 and R ^b9 are a chain alkyl group having a substituent, the number of carbon atoms of the chain alkyl group is preferably 1 or more and 20 or less, more preferably 1 or more and 10 or less, and particularly preferably 1 or more and 6 or less. In this case, the number of carbon atoms of the substituent does not include the number of carbon atoms of the chain alkyl group. The chain alkyl group having a substituent is preferably a linear one. The substituent which the alkyl group may have is not particularly limited insofar as it does not impair the object of the present invention. As a suitable example of the substituent, a cyano group, a halogen atom, a cyclic organic group, and an alkoxycarbonyl group can be exemplified. The halogen atom may, for example, be a fluorine atom, a chlorine atom, a bromine atom or an iodine atom. Among these, a fluorine atom, a chlorine atom, and a bromine atom are preferred. The cyclic organic group may, for example, be a cycloalkyl group, an aromatic hydrocarbon group or a heterocyclic group. Specific examples of the cycloalkyl group are the same as those in the case where R ^b7 is a cycloalkyl group. Specific examples of the aromatic hydrocarbon group include a phenyl group, a naphthyl group, a biphenyl group, a fluorenyl group, and a phenanthryl group. Specific examples of the heterocyclic group are the same as those in the case where R ^b7 is a heterocyclic group. When R ^b7 is an alkoxycarbonyl group, the alkoxy group contained in the alkoxycarbonyl group may be linear or branched, and is preferably linear. The alkoxy group contained in the alkoxycarbonyl group is preferably 1 or more and 10 or less, more preferably 1 or more and 6 or less.

When the chain alkyl group has a substituent, the number of the substituents is not particularly limited. The number of preferred substituents varies depending on the number of carbon atoms of the chain alkyl group. The number of the substituents is typically 1 or more and 20 or less, more preferably 1 or more and 10 or less, and still more preferably 1 or more and 6 or less.

When R ^b8 and R ^b9 are a cyclic organic group, the cyclic organic group may be an alicyclic group or an aromatic group. The cyclic organic group may, for example, be an aliphatic cyclic hydrocarbon group, an aromatic hydrocarbon group or a heterocyclic group. When R ^b8 and R ^b9 are a cyclic organic group, the cyclic organic group may have a substituent, and is the same as when R ^b8 and R ^b9 are a chain alkyl group.

When R ^b8 and R ^b9 are an aromatic hydrocarbon group, the aromatic hydrocarbon group is a phenyl group, or a plurality of benzene rings are bonded through a carbon-carbon bond, or a group formed by condensation of a plurality of benzene rings is preferred. When the aromatic hydrocarbon group is a phenyl group or a benzene ring bond or a condensed group, the number of rings of the benzene ring contained in the aromatic hydrocarbon group is not particularly limited, and is preferably 3 or less, more preferably 2 or less, and 1 is preferable. Very good. Preferable specific examples of the aromatic hydrocarbon group include a phenyl group, a naphthyl group, a biphenyl group, a fluorenyl group, and a phenanthryl group.

When R ^b8 and R ^b9 are aliphatic cyclic hydrocarbon groups, the aliphatic cyclic hydrocarbon group may be monocyclic or polycyclic. The number of carbon atoms of the aliphatic cyclic hydrocarbon group is not particularly limited, but is preferably 3 or more and 20 or less, more preferably 3 or more and 10 or less. Examples of the monocyclic cyclic hydrocarbon group include a cyclopropyl group, a cyclobutyl group, a cyclopentyl group, a cyclohexyl group, a cycloheptyl group, a cyclooctyl group, a decyl group, an isodecyl group, a tricyclodecyl group, and a trisole. Cyclodecyl, tetracyclododecyl, and adamantyl.

When R ^b8 and R ^b9 are a heterocyclic group, the heterocyclic group is a single ring of 5 or 6 members containing one or more of N, S, and O, or the monocyclic ring or the monocyclic ring is condensed with the benzene ring. a heterocyclic group. When the heterocyclic group is a condensed ring, the number of rings is set to 3. The heterocyclic group may be an aromatic group (heteroaryl group) or a non-aromatic group. As the heterocyclic ring constituting the heterocyclic group, furan, thiophene, pyrrole, Azole Oxazole, thiazole, thiadiazole, isothiazole, imidazole, pyrazole, triazole, pyridine, pyridyl Pyrimidine , benzofuran, benzothiophene, anthracene, isoindole, pyridazine, benzimidazole, benzotriazole, benzo Azole, benzothiazole, carbazole, anthracene, quinoline, isoquinoline, quinazoline, anthracene , porphyrin, quinoxaline, piperidine, piperidine , morpholine, piperidine, tetrahydropyran, and tetrahydrofuran.

R ^b8 and R ^b9 may also be bonded to each other to form a ring. The group formed by the ring formation of R ^b8 and R ^b9 is preferably a cycloalkylene group. When R ^b8 and R ^{b9 are} bonded to form a cycloalkylene group, the ring constituting the cycloalkylene group is preferably a 5-membered ring to a 6-membered ring, and a 5-membered ring is more preferable.

When the group formed by the bonding of R ^b8 and R ^b9 is a cycloalkylene group, the cycloalkylene group may be condensed with one or more other rings. Examples of the ring condensable with the cycloalkylene group include a benzene ring, a naphthalene ring, a cyclobutane ring, a cyclopentane ring, a cyclohexane ring, a cycloheptane ring, a cyclooctane ring, a furan ring, and a thiophene group. Ring, pyrrole ring, pyridine ring, pyridyl Ring, and pyrimidine ring.

As an example of a suitable group among R ^b8 and R ^b9 described above, a group represented by the formula -A ¹ -A ² can be exemplified. In the formula, A ¹ is a linear alkylene group, and A ² is an alkoxy group, a cyano group, a halogen atom, a halogenated alkyl group, a cyclic organic group, or an alkoxycarbonyl group.

The number of carbon atoms of the linear alkyl group of A ¹ is preferably 1 or more and 10 or less, more preferably 1 or more and 6 or less. When A ² is an alkoxy group, the alkoxy group may be linear or branched, and is preferably linear. The number of carbon atoms of the alkoxy group is preferably 1 or more and 10 or less, more preferably 1 or more and 6 or less. When A ² is a halogen atom, a fluorine atom, a chlorine atom, a bromine atom or an iodine atom is preferred, and a fluorine atom, a chlorine atom or a bromine atom is more preferable. When A ² is a halogenated alkyl group, the halogen atom contained in the halogenated alkyl group is preferably a fluorine atom, a chlorine atom, a bromine atom or an iodine atom, and a fluorine atom, a chlorine atom or a bromine atom is more preferable. The halogenated alkyl group may be linear or branched, and is preferably linear. When A ² is a cyclic organic group, an example of the cyclic organic group is the same as the cyclic organic group which R ^b8 and R ^{b9 have} as a substituent. When A ² is an alkoxycarbonyl group, an alkoxycarbonyl group is the same as the alkoxycarbonyl group which R ^b8 and R ^{b9 have} as a substituent.

Specific examples of R ^b8 and R ^b9 include ethyl, n-propyl, n-butyl, n-hexyl, n-heptyl, and n-octyl and the like; 2-methoxy Ethyl ethyl, 3-methoxy-n-propyl, 4-methoxy-n-butyl, 5-methoxy-n-pentyl, 6-methoxy-n-hexyl, 7-A Oxy-n-heptyl, 8-methoxy-n-octyl, 2-ethoxyethyl, 3-ethoxy-n-propyl, 4-ethoxy-n-butyl, 5 An alkoxyalkyl group such as ethoxy-n-pentyl, 6-ethoxy-n-hexyl, 7-ethoxy-n-heptyl, and 8-ethoxy-n-octyl; 2-cyanoethyl, 3-cyano-n-propyl, 4-cyano-n-butyl, 5-cyano-n-pentyl, 6-cyano-n-hexyl, 7-cyano -n-heptyl, and cyanoalkyl such as 8-cyano-n-octyl; 2-phenylethyl, 3-phenyl-n-propyl, 4-phenyl-n-butyl, Phenylalkyl 5-phenyl-n-pentyl, 6-phenyl-n-hexyl, 7-phenyl-n-heptyl, and 8-phenyl-n-octyl; 2-cyclohexyl Ethyl, 3-cyclohexyl-n-propyl, 4-cyclohexyl-n-butyl, 5-cyclohexyl-n-pentyl, 6-cyclohexyl-n-hexyl, 7-cyclohexyl-n-g , 8-cyclohexyl-n-octyl, 2-cyclopentylethyl, 3-cyclopentyl-n-propyl, 4-cyclopentyl-n- Butyl, 5-cyclopentyl-n-pentyl, 6-cyclopentyl-n-hexyl, 7-cyclopentyl-n-heptyl, and cyclohexane of 8-cyclopentyl-n-octyl Alkylalkyl; 2-methoxycarbonylethyl, 3-methoxycarbonyl-n-propyl, 4-methoxycarbonyl-n-butyl, 5-methoxycarbonyl-n-pentyl, 6 -methoxycarbonyl-n-hexyl, 7-methoxycarbonyl-n-heptyl, 8-methoxycarbonyl-n-octyl, 2-ethoxycarbonylethyl, 3-ethoxycarbonyl- N-propyl, 4-ethoxycarbonyl-n-butyl, 5-ethoxycarbonyl-n-pentyl, 6-ethoxycarbonyl-n-hexyl, 7-ethoxycarbonyl-n-g And alkoxycarbonylalkyl groups such as 8-ethoxycarbonyl-n-octyl; 2-chloroethyl, 3-chloro-n-propyl, 4-chloro-n-butyl, 5-chloro -n-pentyl, 6-chloro-n-hexyl, 7-chloro-n-heptyl, 8-chloro-n-octyl, 2-bromoethyl, 3-bromo-n-propyl, 4-bromo -n-butyl, 5-bromo-n-pentyl, 6-bromo-n-hexyl, 7-bromo-n-heptyl, 8-bromo-n-octyl, 3,3,3-trifluoropropene And a halogenated alkyl group such as 3,3,4,4,5,5,5-heptafluoro-n-pentyl.

As R ^b8 and R ^b9 , suitable ones among the above are ethyl, n-propyl, n-butyl, n-pentyl, 2-methoxyethyl, 2-cyanoethyl, 2- Phenylethyl, 2-cyclohexylethyl, 2-methoxycarbonylethyl, 2-chloroethyl, 2-bromoethyl, 3,3,3-trifluoropropyl, and 3,3,4 , 4,5,5,5-heptafluoro-n-pentyl.

As an example of a suitable organic group of R ^b10 , as with R ^b7 , an alkyl group, an alkoxy group, a cycloalkyl group, a cycloalkoxy group, a saturated aliphatic fluorenyl group, an alkoxycarbonyl group, a saturated aliphatic oxime can be exemplified. a phenyl group which may have a substituent, a phenoxy group which may have a substituent, a benzyl group which may have a substituent, a phenoxycarbonyl group which may have a substituent, a benzyl methoxy group which may have a substituent, a phenylalkyl group which may have a substituent, a naphthyl group which may have a substituent, a naphthyloxy group which may have a substituent, a naphthylmethyl fluorenyl group which may have a substituent, a naphthyloxycarbonyl group which may have a substituent, may have a substitution A naphthylmethoxy group, a naphthylalkyl group which may have a substituent, a heterocyclic group which may have a substituent, a heterocyclic carbonyl group which may have a substituent, an amine group substituted with 1 or 2 organic groups, morpholine -1-yl, and piperazine -1- base and so on. Specific examples of such bases are the same as those described in R ^b7 . Further, R ^b10 is preferably a cycloalkylalkyl group, a phenoxyalkyl group which may have a substituent on the aromatic ring, and a phenylsulfanyl group which may have a substituent on the aromatic ring. The phenoxyalkyl group and the phenylsulfanyl group may have a substituent which is the same as the substituent which the phenyl group contained in R ^b7 may have.

Among the organic groups, R ^{b10 is} preferably an alkyl group, a cycloalkyl group, a phenyl group which may have a substituent, or a cycloalkylalkyl group, and a phenylsulfanyl group which may have a substituent on the aromatic ring. The alkyl group is preferably an alkyl group having 1 or more and 20 or less carbon atoms, more preferably an alkyl group having 1 or more and 8 or less carbon atoms, and most preferably an alkyl group having 1 or more and 4 or less carbon atoms, and the methyl group is most preferable. Among the phenyl groups which may have a substituent, a methylphenyl group is preferred, and a 2-methylphenyl group is more preferred. The number of carbon atoms of the cycloalkyl group contained in the cycloalkylalkyl group is preferably 5 or more and 10 or less, more preferably 5 or more and 8 or less, and particularly preferably 5 or 6. The number of carbon atoms of the alkylene group contained in the cycloalkylalkyl group is preferably 1 or more and 8 or less, more preferably 1 or more and 4 or less, and particularly preferably 2. Among the cycloalkylalkyl groups, a cyclopentylethyl group is preferred. The number of carbon atoms of the alkylene group contained in the phenylsulfanyl group having a substituent on the aromatic ring is preferably 1 or more and 8 or less, more preferably 1 or more and 4 or less, and particularly preferably 2. Among the phenylsulfanyl groups having a substituent on the aromatic ring, 2-(4-chlorophenylthio)ethyl is preferred.

Further, as R ^b10 , a group represented by -A ³ -CO-OA ^{4 is} also preferable. A ³ is a divalent organic group, preferably a divalent hydrocarbon group, and an alkyl group is preferred. A ⁴ is a monovalent organic group, and a monovalent hydrocarbon group is preferred.

When A ³ is an alkylene group, the alkyl group may be linear or branched, and is preferably a linear chain. When A ³ is an alkylene group, the number of carbon atoms of the alkyl group is preferably 1 or more and 10 or less, more preferably 1 or more and 6 or less, and particularly preferably 1 or more and 4 or less.

A suitable example of A ⁴ is an alkyl group having 1 or more and 10 or less carbon atoms, an aralkyl group having 7 or more and 20 or less carbon atoms, and an aromatic hydrocarbon group having 6 or more and 20 or less carbon atoms. Specific examples of suitable A ⁴ include methyl, ethyl, n-propyl, isopropyl, n-butyl, isobutyl, sec-butyl, tert-butyl, n-pentyl, N-hexyl, phenyl, naphthyl, benzyl, phenethyl, α-naphthylmethyl, and β-naphthylmethyl.

As a suitable specific example of the group represented by -A ³ -CO-OA ⁴ , 2-methoxycarbonylethyl, 2-ethoxycarbonylethyl, 2-n-propyloxycarbonylethyl can be exemplified. , 2-n-butyloxycarbonylethyl, 2-n-pentyloxycarbonylethyl, 2-n-hexyloxycarbonylethyl, 2-benzyloxycarbonylethyl, 2-phenoxy Carbonylethyl, 3-methoxycarbonyl-n-propyl, 3-ethoxycarbonyl-n-propyl, 3-n-propyloxycarbonyl-n-propyl, 3-n-butyloxy Carbocarbonyl-n-propyl, 3-n-pentyloxycarbonyl-n-propyl, 3-n-hexyloxycarbonyl-n-propyl, 3-benzyloxycarbonyl-n-propyl, and 3-phenoxycarbonyl-n-propyl and the like.

Above, Although description of R ^b10, but as R ^b10, the following formula (B4A) or (B4B) of the group represented by are preferred. (In the formulae (b4a) and (b4b), R ^b13 and R ^b14 are each an organic group, and n6 is an integer of 0 or more and 4 or less. When R ^b13 and R ^b14 are adjacent to each other on the benzene ring, R ^b13 and R ^B14 may be bonded to each other to form a ring, n7 is an integer of 1 or more and 8 or less, n8 is an integer of 1 or more and 5 or less, n9 is an integer of 0 or more (n8+3) or less, and ^Rb15 is an organic group).

Examples of the organic group of R ^b13 and R ^b14 in the formula (b4a) are the same as those of R ^b7 . As R ^b13 , an alkyl group or a phenyl group is preferred. When R ^b13 is an alkyl group, the number of carbon atoms is preferably 1 or more and 10 or less, more preferably 1 or more and 5 or less, and most preferably 1 or more and 3 or less, and 1 is most preferable. That is, R ^b13 is the methyl group most. When R ^b13 and R ^{b14 are} bonded to form a ring, the ring may be an aromatic ring or an aliphatic ring. As a suitable example of the group represented by the formula (b4a) and which is a group in which R ^b13 and R ^{b14 are} formed, a naphthalen-1-yl group, a 1,2,3,4-tetrahydronaphthalen-5-yl group or the like can be exemplified. In the above formula (b4a), n6 is an integer of 0 or more and 4 or less, 0 or 1 is preferable, and 0 is more preferable.

In the above formula (b4b), R ^b15 is an organic group. As the organic group, the same ones as those exemplified for R ^b7 can be exemplified. Among the organic groups, an alkyl group is preferred. The alkyl group may be linear or branched. The number of carbon atoms of the alkyl group is preferably 1 or more and 10 or less, more preferably 1 or more and 5 or less, and particularly preferably 1 or more and 3 or less. As R ^b15 , a methyl group, an ethyl group, a propyl group, an isopropyl group, a butyl group or the like is preferably exemplified, and among these, a methyl group is more preferable.

In the above formula (b4b), n8 is an integer of 1 or more and 5 or less, and an integer of 1 or more and 3 or less is more preferable, and 1 or 2 is more preferable. In the above formula (b4b), n9 is 0 or more (n8+3) or less, and an integer of 0 or more and 3 or less is preferable, and an integer of 0 or more and 2 or less is more preferable, and 0 is particularly preferable. In the above formula (b4b), n7 is an integer of 1 or more and 8 or less, and an integer of 1 or more and 5 or less is preferable, and an integer of 1 or more and 3 or less is more preferable, and 1 or 2 is particularly preferable.

In the formula (b4), R ^b11 is a hydrogen atom, an alkyl group having 1 to 11 or less carbon atoms which may have a substituent, or an aryl group which may have a substituent. The substituent which may be possessed when R ^b11 is an alkyl group is preferably a phenyl group, a naphthyl group or the like. In addition, as the substituent which may be contained when R ^b7 is an aryl group, an alkyl group having 1 to 5 or less carbon atoms, an alkoxy group, a halogen atom or the like is preferably exemplified.

In the formula (b4), as R ^b11 , a hydrogen atom, a methyl group, an ethyl group, an n-propyl group, an isopropyl group, an n-butyl group, a phenyl group, a benzyl group, a methylphenyl group or a naphthyl group are preferably exemplified. Etc. Among these, methyl or phenyl is preferred.

As a specific specific example of the compound represented by the formula (b4), the following PI-43 to PI-83 can be exemplified.

(B) The content of the photopolymerization initiator is preferably 0.5% by mass or more and 30% by mass or less based on the mass of the photosensitive composition (the entire solid content) of the mass of the organic solvent (S) to be described later. More preferably, the mass% is more than 20% by mass. When the content of the (B) photopolymerization initiator is set to the above range, a photosensitive composition which is less likely to cause a pattern shape defect can be obtained.

Further, in the (B) photopolymerization initiator, a photoinitiating aid may be combined. As the photoinitiator, triethanolamine, methyldiethanolamine, triisopropanolamine, methyl 4-dimethylaminobenzoate, ethyl 4-dimethylaminobenzoate, 4-dimethylamine can be exemplified. Isoamyl benzoate, 2-ethylhexyl 4-dimethylaminobenzoate, 2-dimethylaminoethyl benzoate, N,N-dimethyl-p-toluidine, 4,4'-double (dimethylamino)benzophenone, 9,10-dimethoxyanthracene, 2-ethyl-9,10-dimethoxyanthracene, 9,10-diethoxyanthracene, 2-ethyl -9,10-diethoxyanthracene, 2-mercaptobenzothiazole, 2-mercaptobenzoene Oxazole, 2-mercaptobenzimidazole, 2-mercapto-5-methoxybenzothiazole, 3-mercaptopropionic acid, methyl 3-mercaptopropionate, pentaerythritol tetradecyl acetate, 3-mercaptopropionate, etc. a thiol compound or the like. These photoinitiating aids can be used singly or in combination of two or more.

<(C) Carbon Black> The photosensitive composition contains (C) carbon black as a light-shielding material. The content of the (C) carbon black in the photosensitive composition is preferably 30% by mass or more, more preferably 40% by mass or more, and more preferably 50% by mass or more, based on the total solid content of the photosensitive composition. The photosensitive composition can form a cured film excellent in light-shielding property by containing (C) carbon black in an amount of this range. (C) The upper limit of the content of the carbon black is not particularly limited, but is preferably 75% by mass or less, more preferably 70% by mass or less, and particularly preferably 60% by mass or less, based on the total solid content of the photosensitive composition.

The type of carbon black is not particularly limited. As the carbon black, a known carbon black such as channel black, furnace black, hot carbon black, or lamp black can be used. Further, carbon black may be coated with a resin.

As the carbon black, carbon black to which an acidic group is introduced is also preferred. The acidic group introduced into the carbon black is an acidic functional group which is defined by Bronsted. Specific examples of the acidic group include a carboxyl group, a sulfonic acid group, a phosphoric acid group, and the like. It is introduced into the acidic group of carbon black to form a salt. The cation which forms a salt with an acidic group is not specifically limited in the range which does not impair the objective of this invention. Examples of the cation include various metal ions, cations of nitrogen-containing compounds, ammonium ions, and the like, and alkali metal ions such as sodium ions, potassium ions, and lithium ions, or ammonium ions are preferred.

The carbon black to which the acidic group is introduced as described above is selected from a carboxylic acid group and a carboxylate group from the viewpoint of achieving high resistance of the light-shielding cured film formed by using the photosensitive composition. Carbon black having one or more functional groups in the group of the sulfonic acid group and the sulfonic acid salt group is preferred.

The method of introducing an acidic group into carbon black is not particularly limited. As a method of introducing an acidic group, the following methods are mentioned, for example. 1) A method of introducing a sulfonic acid group into carbon black by a direct substitution method using concentrated sulfuric acid, fuming sulfuric acid, chlorosulfonic acid or the like, or an indirect substitution method using a sulfite or a hydrogensulfite. 2) A method of coupling an organic compound having an amine group and an acidic group to a carbon black diazo. 3) A method of reacting an organic compound having a halogen atom and an acidic group with a carbon black having a hydroxyl group by an etherification method of Williamson. 4) A method of reacting an organic compound having a halogenic carbonyl group and an acidic group protected by a protective group with a carbon black having a hydroxyl group. 5) A method of deprotecting a carbon black after performing a Friedel-Zraft reaction using an organic compound having a halogenic carbonyl group and an acidic group protected by a protective group.

Among these methods, the introduction of the acidic group is easy and safe, and the method 2) is preferred. The organic compound having an amine group and an acidic group used in the method 2) is preferably a compound having an amine group and an acidic group bonded to the aromatic group. As an example of such a compound, for example, an aminobenzenesulfonic acid of sulfamic acid or an aminobenzoic acid such as 4-aminobenzoic acid can be mentioned.

The number of moles introduced into the acidic group of carbon black is not particularly limited insofar as it does not impair the object of the present invention. The number of moles of the acidic group introduced into the carbon black is preferably 1 mmol or more and 200 mmol or less, and more preferably 5 mmol or more and 100 mmol or less, based on 100 g of carbon black.

The carbon black to which the acidic group is introduced may be subjected to a coating treatment of the resin. When a photosensitive composition containing the resin-coated carbon black is used, it is excellent in light-shielding property and insulating property, and it is easy to form a cured film having a light-shielding property having a low surface reflectance. Further, the coating treatment of the resin does not particularly adversely affect the electric conductivity of the cured film having a light-shielding property formed by using the photosensitive composition. As an example of a resin which can be used for coating of carbon black, heat hardening of a phenol resin, a melamine resin, a xylene resin, a diallyl phthalate resin, a glycerin resin, an epoxy resin, an alkylbenzene resin, or the like can be exemplified. Resin, or polystyrene, polycarbonate, polyethylene terephthalate, polybutylene terephthalate, modified polyphenylene oxide, polyfluorene, polyparaphenylene terephthalate A thermoplastic resin such as an amine, a polyamidimide, a polyimine, a polyamine bismaleimide, a polyether sulfopolyphenylene phthalate, a polyarylate, or a polyetheretherketone. The coating amount of the carbon black resin is preferably 1% by mass or more and 30% by mass or less based on the total mass of the carbon black and the mass of the resin.

In order to uniformly disperse the carbon black (C) described above in the photosensitive composition, a dispersing agent may be further used. As such a dispersing agent, a polyethyleneimine-based, urethane-based resin or acrylic resin-based polymer dispersing agent is preferably used. Among these, an acrylic resin-based dispersant is preferably used. Further, there is also a case where a self-hardening film generates a corrosive gas due to a dispersant. Therefore, (C) carbon black is one in which a dispersion treatment is not used without using a dispersant.

It is preferred to add a dispersion liquid in which (C) carbon black is dispersed at an appropriate concentration in the presence or absence of a dispersant, and then add it to the photosensitive composition. Further, in the present specification, the amount of use of the above (C) carbon black may be defined as a value which also includes the dispersing agent present therein.

<(C') Other light-shielding agent> The photosensitive composition may contain (C) other light-shielding agents other than (C) carbon black together with (C) carbon black.

As the (C') other light-shielding agent, for example, an anthraquinone-based pigment can be used. Specific examples of the fluorene-based pigments include an anthraquinone-based pigment represented by the following formula (c-1), an anthracene-based pigment represented by the following formula (c-2), and the following formula (c-3); The bismuth pigments are shown. In the commercial product, as the fluorene-based pigment, product names K0084 and K0086 manufactured by BASF, or pigment blacks 21, 30, 31, 32, 33, and 34 can be preferably used.

In the formula (c-1), R ^c1 and R ^c2 each independently represent an alkylene group having 1 or more and 3 or less carbon atoms, and R ^c3 and R ^c4 each independently represent a hydrogen atom, a hydroxyl group, a methoxy group or an ethenyl group.

In the formula (c-2), R ^c5 and R ^c6 each independently represent an alkylene group having 1 or more and 7 or less carbon atoms.

In the formula (c-3), R ^c7 and R ^c8 are each independently a hydrogen atom, an alkyl group having 1 or more and 22 or less carbon atoms, and may contain a hetero atom of N, O, S or P. When R ^c7 and R ^c8 are alkyl groups, the alkyl group may be linear or branched.

For the compound represented by the above formula (c-1), the compound represented by the formula (c-2), and the compound of the formula (c-3), for example, JP-A-62-21753, JP-A The method described in Japanese Patent Publication No. 63-26784 is synthesized. That is, hydrazine-3,5,9,10-tetracarboxylic acid or its dianhydride and an amine are used as a raw material, and it heat-processes in water or an organic solvent. Then, the target product can be obtained by reprecipitating the obtained crude product in sulfuric acid or by recrystallizing it in water, an organic solvent or a mixed solvent of these.

In order to disperse the quinone-based pigment well in the photosensitive composition, the average particle diameter of the quinone-based pigment is preferably 10 nm or more and 1000 nm or less.

Further, as the (C') other light-shielding agent, an indoleamine-based pigment may be contained. The intrinsic amine-based pigment may, for example, be a compound represented by the following formula (c-4).

In the formula (c-4), X ^c represents a double bond, and each of the geometric isomers is independently an E body or a Z body, and R ^{c9 is} independent of each other, and represents a hydrogen atom, a methyl group, a nitro group, a methoxy group, a bromine atom, A chlorine atom, a fluorine atom, a carboxyl group or a sulfonic acid group, and each of R ^c10 independently represents a hydrogen atom, a methyl group or a phenyl group, and R ^c11 each independently represents a hydrogen atom, a methyl group or a chlorine atom. The compound represented by the formula (c-4) may be used alone or in combination of two or more. R ^c9 , from the viewpoint of easy production of the compound represented by the formula (c-4), preferably bonded to the 6-position of the ^indanone ring, and R ^c11 is bonded to the indoline. The 4-bit of the ketone ring is preferred. From the same viewpoint, R ^c9 , R ^c10 and R ^{c11 are} preferably a hydrogen atom. The compound represented by the formula (c-4), which has an EE body, a ZZ body, and an EZ body as a geometric isomer, may be a single compound of any of these, or may be a geometric isomer thereof. mixture. The compound of the formula (c-4) can be produced, for example, by the method described in International Publication No. 2000/24736 and International Publication No. 2010/081624.

In order to disperse the indoleamine-based pigment well in the photosensitive composition, the average particle diameter of the indoleamine-based pigment is preferably 10 nm or more and 1000 nm or less.

Further, as the (C') other light-shielding agent, fine particles containing a silver-tin (AgSn) alloy as a main component (hereinafter referred to as "AgSn alloy fine particles") may be used. The AgSn alloy fine particles may contain, for example, Ni, Pd, Au or the like as other metal components as long as the AgSn alloy is a main component. The average particle diameter of the AgSn alloy fine particles is preferably 1 nm or more and 300 nm or less.

When the AgSn alloy is represented by the chemical formula AgxSn, the range of x of the chemically stabilized AgSn alloy is 1 ≦ x ≦ 10, and the range of chemical stability and blackness x is 3 ≦ x ≦ 4 at the same time. Here, when the mass ratio of Ag in the AgSn alloy is determined by the range of x described above, Therefore, in the AgSn alloy, when Ag is contained in an amount of 47.6% by mass or more and 90% by mass or less, it is chemically stable, and when Ag is contained in an amount of 73.17% by mass or more and 78.43% by mass or less, the chemical stability and the degree of blackness can be effectively obtained with respect to the amount of Ag.

This AgSn alloy fine particle can be produced by a usual microparticle synthesis method. Examples of the fine particle synthesis method include a gas phase reaction method, a spray pyrolysis method, an atomization method, a liquid phase reaction method, a freeze drying method, and a hydrothermal synthesis method.

Although the AgSn alloy fine particles are highly insulating, depending on the use of the photosensitive composition, it is not necessary to cover the surface with an insulating film in order to further improve the insulating property. As a material of such an insulating film, a metal oxide or an organic polymer compound is suitable. As the metal oxide, an insulating metal oxide such as silica, alumina, zirconia, yttria, titania or the like is suitably used. Further, as the organic polymer compound, an insulating resin such as polyimide, polyether, polyacrylate, polyamine compound or the like is suitably used.

The film of the insulating film is preferably 1 nm or more and 100 nm or less in thickness in order to sufficiently improve the insulating property of the surface of the AgSn alloy fine particles, and more preferably 5 nm or more and 50 nm or less. The insulating film can be easily formed by surface modification techniques or surface coating techniques. In particular, when an alkoxide such as tetraethoxysilane or aluminum triethoxylate is used, an insulating film having a uniform thickness can be formed at a relatively low temperature, which is preferable.

The (C') other light-shielding agent may be used singly or in combination with the above-mentioned anthraquinone-based pigment, an indoleamine-based pigment, or AgSn-based fine particles. Further, the black pigment may contain a hue of red, blue, green, yellow or the like under the purpose of adjusting the color tone or the like. The pigment of the hue other than the black pigment can be appropriately selected from known pigments. For example, as the coloring matter other than the black pigment, various kinds of the above pigments can be used. The amount of the coloring matter of the hue other than the black pigment is preferably 15% by mass or less, more preferably 10% by mass or less, based on the total mass of the black pigment.

Further, in the photosensitive composition, a dye may be further used in combination with (C) carbon black or (C) carbon black and (C') other sunscreen. This dye may be appropriately selected from known materials. As the dye which can be used as the photosensitive composition, for example, an azo dye, a metal salt azo dye, an anthraquinone dye, a triphenylmethane dye, a dibenzopyran dye, a cyanine dye, a naphthoquinone can be exemplified. Dyes, quinone imine dyes, methine dyes, anthraquinone dyes, and the like. Further, these dyes are dispersed in an organic solvent or the like by lake formation (salification), and this is used as the (D) colorant. In addition to the above-mentioned dyes, for example, JP-A-2013-225132, JP-A-2014-178477, JP-A-2013-137543, JP-A-2011-38085, and JP-A-2011-38085 A dye or the like described in JP-A-2014-197206 or the like is disclosed.

The content of the (C') other sunscreen agent is not particularly limited insofar as it does not impair the object of the present invention. (C') The content of the other light-shielding agent is preferably (C) carbon black and (C') the total amount of the other light-shielding agent is preferably 75% by mass or less, and 70% by mass or less of the total solid content of the photosensitive composition. The amount is better, and the amount below 60% by mass is particularly good.

<(D) Adhesive Resin> The photosensitive composition may also contain (D) a binder resin. (D) The binder resin may be an alkali-soluble resin which is soluble in an alkaline solution, or a resin which is insoluble to an alkaline solution, and preferably contains an alkali-soluble resin.

The resin which is insoluble in the alkaline solution which can be used as the (D) binder resin is not particularly limited as long as it does not impair the object of the present invention. As a suitable example of the resin insoluble to the alkaline solution, for example, a homopolymer or a copolymer of an acrylate represented by methyl (meth) acrylate is exemplified.

The alkali-soluble resin which is preferably used as the (D) binder resin is described. Here, in the present specification, the alkali-soluble resin refers to a resin having a functional group (for example, a phenolic hydroxyl group, a carboxyl group, a sulfonic acid group, or the like) having an alkali solubility in the molecule.

As a resin suitable for the alkali-soluble resin, (D1) a resin having a cardo structure (hereinafter also referred to as "(D1) cardo resin") can be exemplified. When (D1) a resin having a cardo structure is used as the alkali-soluble resin, a photosensitive composition excellent in resolution is easily obtained, and a cured film which is less likely to flow excessively by heating is easily formed using the photosensitive composition.

[(D1) Resin having a Cardo Structure] As the resin having a cardo structure (D1), a resin having a cardo skeleton in its structure and having a specific alkali solubility can be used. The cardo skeleton refers to a skeleton in which a second cyclic structure and a third cyclic structure are bonded to one ring carbon atom constituting the first cyclic structure. Further, the second annular structure and the third annular structure may have the same structure or different structures. As an example of the representative of the cardo skeleton, a skeleton in which two carbon atoms (for example, a benzene ring) are bonded to a carbon atom at the 9-position of the anthracene ring can be exemplified.

The (D1) cardo resin is not particularly limited, and a conventionally known resin can be used. Among them, a resin represented by the following formula (d-1) is preferred.

In the formula (d-1), X ^d represents a group represented by the following formula (d-2). M1 represents an integer of 0 or more and 20 or less.

In the above formula (d-2), R ^d1 each independently represents a hydrogen atom, a hydrocarbon group having 1 or more and 6 or less carbon atoms, or a halogen atom, and R ^d2 each independently represents a hydrogen atom or a methyl group, and R ^d3 each independently represents a straight chain or A branched alkyl group, m2 represents 0 or 1, and W ^d represents a group represented by the following formula (d-3).

In the formula (d-2), R ^{d3 is} preferably an alkyl group having 1 or more and 20 or less carbon atoms, and an alkyl group having 1 or more and 10 or less carbon atoms is more preferable, and the number of carbon atoms is 1 or more and 6 or less. The alkyl group is particularly preferred, and the ethane-1,2-diyl group, the propane-1,2-diyl group and the propane 1,3-diyl group are most preferred.

The ring A ^d in the formula (d-3) represents an aliphatic ring which is condensable with an aromatic ring and which may have a substituent. The aliphatic ring may be an aliphatic hydrocarbon ring or an aliphatic heterocyclic ring. As the aliphatic ring, a monocycloalkane, a bicycloalkane, a tricycloalkane, a tetracycloalkane or the like can be exemplified. Specifically, a monocycloalkane such as cyclopentane, cyclohexane, cycloheptane or cyclooctane, or adamantane, norbornane, isodecane, tricyclodecane or tetracyclododecane can be exemplified. The aromatic ring which may be condensed in the aliphatic ring may be an aromatic hydrocarbon ring or an aromatic hetero ring, and an aromatic hydrocarbon ring is preferred. Specifically, a benzene ring and a naphthalene ring are preferred.

As a suitable example of the divalent group represented by the formula (d-3), the following groups can be exemplified.

The divalent group X ^d in the formula (d-1) is introduced into the (D1) by reacting a tetracarboxylic dianhydride imparting the residue Z ^d with a diol compound represented by the following formula (d-2a). Cardo resin.

In the formula (d-2a), R ^d1 , R ^d2 , R ^d3 and m2 are as described in the formula (d-2). Regarding the ring A ^d in the formula (d-2a), it is as described in the formula (d-3).

The diol compound represented by the formula (d-2a) can be produced, for example, by the following method. First, a diol compound represented by the following formula (d-2b) has a hydrogen atom in a phenolic hydroxyl group, and if necessary, it is substituted with a group represented by -R ^d3 -OH according to a conventional method, and epichlorohydrin is used. Epoxypropylation is carried out to obtain an epoxy compound represented by the following formula (d-2c). Next, the epoxy compound represented by the formula (d-2c) is reacted with acrylic acid or methacrylic acid to obtain a diol compound represented by the formula (d-2a). In the formula (d-2b) and the formula (d-2c), R ^d1 , R ^d3 and m2 are as described in the formula (d-2). The ring A ^d in the formula (d-2b) and the formula (d-2c) is as described in the formula (d-3). Further, the method for producing the diol compound represented by the formula (d-2a) is not limited to the above method.

As a suitable example of the diol compound represented by the formula (d-2b), the following diol compounds can be exemplified.

In the above formula (d-1), R ^d0 is a hydrogen atom or a group represented by -CO-Y ^d -COOH. Here, Y ^d represents a residue obtained by removing an acid anhydride group (-CO-O-CO-) from a dicarboxylic acid anhydride. Examples of the dicarboxylic anhydride include maleic anhydride, succinic anhydride, itaconic anhydride, decanoic anhydride, tetrahydrophthalic anhydride, hexahydrophthalic anhydride, methyl endomethylenetetrahydrophthalic anhydride, chloro bridge anhydride, and methyl group. Tetrahydrophthalic anhydride, glutaric anhydride, and the like.

Further, in the above formula (d-1), Z ^d represents a residue obtained by removing two acid anhydride groups from the tetracarboxylic dianhydride. Examples of the tetracarboxylic dianhydride include tetracarboxylic dianhydride, pyromellitic dianhydride, benzophenone tetracarboxylic dianhydride, and biphenyltetracarboxylic acid represented by the following formula (d-4). Di-anhydride, diphenyl ether tetracarboxylic dianhydride, and the like. Further, in the above formula (d-1), m1 represents an integer of 0 or more and 20 or less.

(In the formula (d-4), R ^d4 , R ^d5 and R ^d6 are each independently represented by one selected from the group consisting of a hydrogen atom, an alkyl group having 1 or more and 10 or less carbon atoms, and a fluorine atom, and m3 represents 0 or more and 12 or less integers).

The alkyl group which may be selected as R ^d4 in the formula (d-4) is an alkyl group having 1 or more and 10 or less carbon atoms. By setting the carbon number of the alkyl group to this range, the heat resistance of the obtained carboxylic acid ester can be further improved. When R ^d4 is an alkyl group, the number of carbon atoms is preferably 1 or more and 6 or less, more preferably 1 or more and 5 or less, and more preferably 1 or more and 4 or less, from the viewpoint of easily obtaining a cardo resin excellent in heat resistance. Above 3 is especially good. When R ^d4 is an alkyl group, the alkyl group may be linear or branched.

R ^d4 in the formula (d-4) is preferably a hydrogen atom or an alkyl group having 1 or more and 10 or less carbon atoms, from the viewpoint of easily obtaining a cardo resin excellent in heat resistance. R ^d4 in the formula (d-4) is more preferably a hydrogen atom, a methyl group, an ethyl group, an n-propyl group or an isopropyl group, and particularly preferably a hydrogen atom or a methyl group. The plural R ^d4 in the formula (d-4) is preferably the same group in view of the ease of preparation of a high-purity tetracarboxylic dianhydride.

M3 in the formula (d-4) represents an integer of 0 or more and 12 or less. By setting the value of m3 to 12 or less, purification of tetracarboxylic dianhydride can be facilitated. From the viewpoint of ease of purification of tetracarboxylic dianhydride, the upper limit of m3 is preferably 5, and more preferably 3. From the viewpoint of the chemical stability of the tetracarboxylic dianhydride, the lower limit of m3 is preferably 1 and more preferably 2. The m3 in the formula (d-4) is preferably 2 or 3.

The alkyl group having 1 or more and 10 or less carbon atoms which may be selected as R ^d5 and R ^d6 in the formula (d-4) is the same as the alkyl group having 1 or more and 10 or less carbon atoms which may be selected as R ^d4 . R ^d5 and R ^d6 are hydrogen atoms or carbon atoms of 1 or more and 10 or less (preferably 1 or more and 6 or less, more preferably 1 or more and 5 or less), and further preferably 1 or more and 5 or less. More preferably, it is preferably 1 or more and 4 or less, particularly preferably 1 or more and 3 or less. The alkyl group is preferably a hydrogen atom or a methyl group.

As the tetracarboxylic dianhydride represented by the formula (d-4), for example, norbornane-2-spiro-α-cyclopentanone-α'-spiro-2''-norbornane-5,5' can be exemplified. ',6,6''-tetracarboxylic dianhydride (alias "norbornane-2-spiro-2'-cyclopentanone-5'-spiro-2''-norbornane-5,5'', 6,6''-tetracarboxylic dianhydride"), methylnorbornane-2-spiro-α-cyclopentanone-α'-spiro-2''-(methylnorbornane)-5,5 '',6,6''-tetracarboxylic dianhydride, norbornane-2-spiro-α-cyclohexanone-α'-spiro-2''-norbornane-5,5'',6, 6''-tetracarboxylic dianhydride (alias "norbornane-2-spiro-2'-cyclohexanone-6'-spiro-2''-norbornane-5,5'',6,6' '-tetracarboxylic dianhydride'), methylnorbornane-2-spiro-α-cyclohexanone-α'-spiro-2''-(methylnorbornane)-5,5'',6 ,6''-tetracarboxylic dianhydride, norbornane-2-spiro-α-cyclopropanone-α'-spiro-2''-norbornane-5,5'',6,6''-four Carboxylic dianhydride, norbornane-2-spiro-α-cyclobutanone-α'-spiro-2''-norbornane-5,5'',6,6''-tetracarboxylic dianhydride, Cyclodecane-2-spiro-α-cycloheptanone-α'-spiro-2''-norbornane-5,5'',6,6''-tetracarboxylic dianhydride, norbornane-2 -spiro-α-cyclooctanone-α'- -2''-norbornane-5,5'',6,6''-tetracarboxylic dianhydride, norbornane-2-spiro-α-cyclononanone-α'-spiro-2''- Cyclodecane-5,5'',6,6''-tetracarboxylic dianhydride, norbornane-2-spiro-α-cyclononanone-α'-spiro-2''-norbornane-5 , 5'',6,6''-tetracarboxylic dianhydride, norbornane-2-spiro-α-cycloundecenone-α'-spiro-2''-norbornane-5,5'' ,6,6''-tetracarboxylic dianhydride, norbornane-2-spiro-α-cyclododecanone-α'-spiro-2''-norbornane-5,5'',6,6 ''-Tetracarboxylic dianhydride, norbornane-2-spiro-α-cyclotridecyl-α'-spiro-2''-norbornane-5,5'',6,6''-four Carboxylic dianhydride, norbornane-2-spiro-α-cyclotetradecyl-α'-spiro-2''-norbornane-5,5'',6,6''-tetracarboxylic dianhydride , decane-2-spiro-α-cyclopentadecanone-α'-spiro-2''-norbornane-5,5'',6,6''-tetracarboxylic dianhydride, norbornane -2-spiro-α-(methylcyclopentanone)-α'-spiro-2''-norbornane-5,5'',6,6''-tetracarboxylic dianhydride, norbornane- 2-spiro-α-(methylcyclohexanone)-α'-spiro-2''-norbornane-5,5'', 6,6''-tetracarboxylic dianhydride, and the like.

(D1) The weight average molecular weight of the cardo resin is preferably 1,000 or more and 40,000 or less, more preferably 1,500 or more and 30,000 or less, and still more preferably 2,000 or more and 10,000 or less. By having the above range, good developability and sufficient heat resistance and film strength can be obtained.

[(D2) Acrylic Resin] As the alkali-soluble resin, (D2) an acrylic resin can be suitably used in addition to the (D1) cardo resin. As the (D2) acrylic resin, a structural unit containing a structural unit derived from (meth)acrylic acid and/or another monomer derived from (meth)acrylate or the like can be used. (Meth)acrylic acid is acrylic acid or methacrylic acid. The (meth) acrylate is represented by the following formula (d-5), and is not particularly limited as long as it does not inhibit the object of the present invention.

In the above formula (d-5), R ^d7 is a hydrogen atom or a methyl group, and R ^d8 is a monovalent organic group. The organic group may further contain a bond or a substituent other than a hydrocarbon group such as a hetero atom in the organic group. Further, the organic group may be any of a linear chain, a branched chain, and a cyclic chain.

The substituent other than the hydrocarbon group in the organic group of R ^d8 is not particularly limited as long as the effects of the present invention are not impaired, and examples thereof include a halogen atom, a hydroxyl group, a thiol group, a thioether group, a cyano group, an isocyano group, and a cyanooxy group. Isocyanate, thiocyanooxy, isothiocyanato, decyl, decyl, alkoxy, alkoxycarbonyl, aminemethanyl, thiamine, nitro, nitroso, Carboxyl, carboxylate, sulfhydryl, decyloxy, sulfinate, sulfonate, sulfonate, phosphino, phosphinyl, phosphonium, phosphonato , hydroxyimino group, alkyl ether group, alkyl sulfide group, aryl ether group, aryl sulfide group, amine group (-NH ₂ , -NHR, -NRR': R and R' each independently represent a hydrocarbon group) Wait. The hydrogen atom contained in the above substituent may be substituted by a hydrocarbon group. Further, the hydrocarbon group contained in the substituent may be any of a linear chain, a branched chain, and a cyclic group.

As R ^d8 , an alkyl group, an aryl group, an arylalkyl group or a heterocyclic group is preferred, and such groups may also be substituted by a halogen atom, a hydroxyl group, an alkyl group or a heterocyclic group. Further, when the groups include an alkyl group, the alkyl group may be interrupted by an ether bond, a thioether bond or an ester bond.

When the alkyl group is linear or branched, the number of carbon atoms is preferably 1 or more and 20 or less, more preferably 1 or more and 15 or less, and particularly preferably 1 or more and 10 or less. As examples of suitable alkyl groups, methyl, ethyl, n-propyl, isopropyl, n-butyl, isobutyl, sec-butyl, tert-butyl, n-pentyl, and iso are illustrated. Pentyl, sec-pentyl, tert-pentyl, n-hexyl, n-heptyl, n-octyl, isooctyl, sec-octyl, tert-octyl, n-fluorenyl, isodecyl, N-fluorenyl, isodecyl, and the like.

When the alkyl group is an alicyclic group or a group containing an alicyclic group, as a suitable alicyclic group contained in the alkyl group, a monocyclic alicyclic group such as a cyclopentyl group or a cyclohexyl group, or a diamond can be exemplified. a polycyclic alicyclic group such as an alkyl group, a thiol group, an isodecyl group, a tricyclodecyl group, a tricyclodecyl group or a tetracyclododecyl group.

Further, the (D2) acrylic resin may be one obtained by polymerizing a monomer other than (meth) acrylate. As such a monomer, a (meth) acrylamide, an unsaturated carboxylic acid, an allyl compound, a vinyl ether, a vinyl ester, a styrene, etc. are mentioned. These monomers may be used alone or in combination of two or more.

As the (meth) acrylamide, (meth) acrylamide, N-alkyl (meth) acrylamide, N-aryl (meth) acrylamide, N, N-dioxane can be exemplified. (meth)acrylamide, N,N-aryl(meth)acrylamide, N-methyl-N-phenyl(meth)acrylamide, N-hydroxyethyl-N-methyl (Methyl) acrylamide and the like.

Examples of the unsaturated carboxylic acid include monocarboxylic acids such as crotonic acid; dicarboxylic acids such as maleic acid, fumaric acid, citraconic acid, mesaconic acid, and itaconic acid; and anhydrides of such dicarboxylic acids; .

Examples of the allyl compound include allyl acetate, allyl hexanoate, allyl octanoate, allyl laurate, allyl palmitate, allyl stearate, allyl benzoate, and B. Allyl acetate, allyl lactate, etc.; allyloxyethanol; and the like.

Examples of the vinyl ethers include hexyl vinyl ether, octyl vinyl ether, mercapto vinyl ether, ethylhexyl vinyl ether, methoxyethyl vinyl ether, and ethoxyethyl vinyl ether. Chloroethyl vinyl ether, 1-methyl-2,2-dimethylpropyl vinyl ether, 2-ethylbutyl vinyl ether, hydroxyethyl vinyl ether, diethylene glycol vinyl ether, An alkyl vinyl ether of dimethylaminoethyl vinyl ether, diethylaminoethyl vinyl ether, butylaminoethyl vinyl ether, benzyl vinyl ether, tetrahydrofurfuryl vinyl ether or the like; Vinyl phenyl ether, vinyl tolyl ether, vinyl chlorophenyl ether, vinyl-2,4-dichlorophenyl ether, vinyl naphthyl ether, vinyl decyl ether, etc. ;Wait.

Examples of the vinyl esters include vinyl butyrate, vinyl isobutyrate, trimethyl vinyl acetate, diethyl vinyl acetate, vinyl valerate, vinyl hexanoate, vinyl chloroacetate, and dichloroacetic acid. Vinyl ester, vinyl methoxy acetate, vinyl butoxide, vinyl acetate, vinyl acetate, vinyl lactate, vinyl β-phenylbutyrate, vinyl benzoate, salicylic acid Vinyl ester, vinyl chlorobenzoate, vinyl tetrachlorobenzoate, vinyl naphthalate, and the like.

As the styrene, styrene; methyl styrene, dimethyl styrene, trimethyl styrene, ethyl styrene, diethyl styrene, isopropyl styrene, butyl styrene, hexyl group can be exemplified. An alkane such as styrene, cyclohexyl styrene, mercapto styrene, benzyl styrene, chloromethyl styrene, trifluoromethyl styrene, ethoxymethyl styrene, ethoxymethyl methyl styrene Alkoxystyrene, methoxystyrene, 4-methoxy-3-methylstyrene, dimethoxystyrene, etc.; chlorostyrene, dichlorostyrene, trichlorostyrene , tetrachlorostyrene, pentachlorostyrene, bromostyrene, dibromostyrene, iodine styrene, fluorostyrene, trifluorostyrene, 2-bromo-4-trifluoromethylstyrene, 4-fluoro- a halogenated styrene such as 3-trifluoromethylstyrene;

(D2) The amount of the structural unit derived from (meth)acrylic acid in the acrylic resin and the amount of the structural unit derived from the other monomer are not particularly limited as long as the object of the present invention is not impaired. (D2) The amount of the structural unit derived from (meth)acrylic acid in the acrylic resin is preferably 5% by mass or more and 50% by mass or less based on the mass of the acrylic resin, and more preferably 10% by mass or more and 30% by mass or less. .

The weight average molecular weight of the (D2) acrylic resin is preferably 2,000 or more and 50,000 or less, more preferably 5,000 or more and 30,000 or less. By the above range, it is easy to obtain a balance between the film forming ability of the photosensitive composition and the developability after exposure.

[(D3) Novolak Resin]] As the alkali-soluble resin, (D3) novolak resin can also be preferably used. As the (D3) novolac resin, various novolac resins formulated from conventional photosensitive resin compositions can be used. The (D3) novolac resin is preferably obtained by addition-condensation of an aromatic compound having a phenolic hydroxyl group (hereinafter simply referred to as "phenol") and an aldehyde under an acid catalyst.

(Phenols) Examples of the phenols used in the production of the (D3) novolac resin include phenols such as phenol, o-cresol, m-cresol, and p-cresol; 2,3-indolylphenol, 2,4-nonanol, 2,5-nonanol, 2,6-nonanol, 3,4-nonanol, 3,5-nonanol, etc.; o-ethylphenol, m-ethyl Ethylphenols such as phenol and p-ethylphenol; 2-isopropylphenol, 3-isopropylphenol, 4-isopropylphenol, o-butylphenol, m-butylphenol, p-butyl Alkylphenols and alkylphenols such as p-tertiary butylphenol; 2,3,5-trimethylphenol; and trialkylphenols such as 3,4,5-trimethylphenol; Polyphenols such as phenol, catechol, hydroquinone, hydroquinone monomethyl ether, gallicol and phloroglucin; alkyls such as alkyl resorcinol, alkyl catechol and alkyl hydroquinone Polyhydric phenols (any alkyl group having 1 or more and 4 or less carbon atoms); α-naphthol; β-naphthol; hydroxydiphenyl; and bisphenol A. These phenols may be used singly or in combination of two or more.

Among these phenols, m-cresol and p-cresol are preferred, and m-cresol and p-cresol are more preferred. At this time, by adjusting the blending ratio of the two, it is possible to adjust various properties such as heat resistance of the cured film formed using the photosensitive composition. The ratio of the mixing ratio of m-cresol to p-cresol is not particularly limited, but is preferably 3/7 or more and 8/2 or less in terms of the molar ratio of m-cresol/p-cresol. By using m-cresol and p-cresol in a ratio of this range, it is easy to obtain a photosensitive composition which can form a cured film excellent in heat resistance.

Further, a novolac resin produced by using m-cresol and 2,3,5-trimethylphenol is also preferred. When the novolak resin is used, it is particularly easy to obtain a photosensitive composition which can form a cured film which is hard to excessively flow by heating at the time of post-baking. The ratio of the ratio of m-cresol to 2,3,5-trimethylphenol is not particularly limited, but the molar ratio of m-cresol/2,3,5-trimethylphenol is 70/30 or more. 95/5 or less is preferred.

(Aldehyde) Examples of the aldehyde used in the production of the (D3) novolak resin include formaldehyde, polyoxymethylene, furfural, benzaldehyde, nitrobenzaldehyde, and acetaldehyde. These aldehydes may be used singly or in combination of two or more.

(Acid Catalyst) The acid catalyst used in the production of the (D3) novolak resin may, for example, be an inorganic acid such as hydrochloric acid, sulfuric acid, nitric acid, phosphoric acid or phosphorous acid; formic acid, oxalic acid, acetic acid, diethyl sulfuric acid and An organic acid such as toluenesulfonic acid; or a metal salt such as zinc acetate. These acid catalysts may be used singly or in combination of two or more.

(Molecular weight) (D3) The weight average molecular weight (Mw; hereinafter simply referred to as "weight average molecular weight") in terms of polystyrene in the novolak resin, and the flow due to heating of the cured film formed using the photosensitive composition From the viewpoint of patience, the lower limit is preferably 2,000, 5,000 is better, 10000 is better, 15000 is better, and 20,000 is the best, and the upper limit is preferably 50,000, 45000 is better, 40,000 is better, and 35000 is better. optimal.

As the (D3) novolak resin, at least two kinds of weight average molecular weights in terms of polystyrene may be used in combination. By using a combination of different weight average molecular weights, the balance between the developability of the photosensitive composition and the heat resistance of the cured film formed using the photosensitive composition can be obtained.

(D) The content of the binder resin is preferably 10% by mass or more and 65% by mass or less based on the total mass of the solid content of the photosensitive composition, and more preferably 15% by mass or more and 50% by mass or less. By the above range, a resin composition excellent in developability can be easily obtained.

<(E) Photopolymerizable monomer> The photosensitive composition may further contain (E) a photopolymerizable monomer. (E) The photopolymerizable monomer is a compound having a carbon-carbon double bond polymerizable by the action of the (B) photopolymerization initiator, and there is no particular compound as long as it is a compound other than the above (A) cross-linking component. limited. Among the (E) photopolymerizable monomers, there are monofunctional monomers and polyfunctional monomers.

As the monofunctional monomer, (meth) acrylamide, hydroxymethyl (meth) acrylamide, methoxymethyl (meth) acrylamide, ethoxymethyl (meth) propylene can be exemplified. Indoleamine, propoxymethyl (meth) acrylamide, butoxymethoxymethyl (meth) acrylamide, N-hydroxymethyl (meth) acrylamide, N-hydroxymethyl (Meth) acrylamide, (meth)acrylic acid, fumaric acid, maleic acid, maleic anhydride, itaconic acid, itaconic anhydride, citraconic acid, citraconic anhydride, crotonic acid, 2-propenylamine 2-methylpropane sulfonic acid, tertiary butyl acrylamide sulfonic acid, methyl (meth) acrylate, ethyl (meth) acrylate, butyl (meth) acrylate, 2-ethyl Hexyl (meth) acrylate, cyclohexyl (meth) acrylate, 2-hydroxyethyl (meth) acrylate, 2-hydroxypropyl (meth) acrylate, 2-hydroxybutyl (methyl) Acrylate, 2-phenoxy-2-hydroxypropyl (meth) acrylate, 2-(meth) propylene oxy-2-hydroxypropyl phthalate, glycerol mono (meth) acrylate, Tetrahydroindenyl (meth) acrylate, dimethylaminoethyl (meth) acrylate, epoxy Base (meth) acrylate, 2,2,2-trifluoroethyl (meth) acrylate, 2,2,3,3-tetrafluoropropyl (meth) acrylate, half of decanoic acid derivative (Meth) acrylate, etc. These monofunctional monomers can be used singly or in combination of two or more.

On the other hand, as the polyfunctional monomer, ethylene glycol di(meth)acrylate, diethylene glycol di(meth)acrylate, tetraethylene glycol di(meth)acrylate, propylene glycol II can be exemplified. Methyl) acrylate, polypropylene glycol di(meth) acrylate, butane diol di(meth) acrylate, neopentyl glycol di(meth) acrylate, 1,6-hexane glycol di(a) Acrylate, trimethylolpropane tri(meth)acrylate, glycerol di(meth)acrylate, pentaerythritol triacrylate, pentaerythritol tetraacrylate, dipentaerythritol pentaacrylate, dipentaerythritol hexaacrylate, pentaerythritol Di(meth)acrylate, pentaerythritol tri(meth)acrylate, pentaerythritol tetra(meth)acrylate, dipentaerythritol penta(meth)acrylate, dipentaerythritol hexa(meth)acrylate, 2,2- Bis(4-(methyl)propenyloxydiethoxyphenyl)propane, 2,2-bis(4-(methyl)propenyloxypolyethoxyphenyl)propane, 2-hydroxy- 3-(Methyl)acryloxypropyl (meth) acrylate, ethylene glycol diepoxypropyl ether di(meth) acrylate, diethylene glycol II Oxypropyl propyl di(meth) acrylate, diepoxy propyl phthalate di(meth) acrylate, glycerol triacrylate, glycerol polyepoxypropyl ether poly(meth) acrylate, amine A Acid (meth) acrylate (ie, reaction of 2-hydroxyethyl (meth) acrylate, such as benzylidene diisocyanate, trimethylhexamethylene diisocyanate or hexamethylene diisocyanate a polyfunctional monomer such as methylene bis(meth) acrylamide, (meth) acrylamide benzyl ether, a condensate of a polyol and N-methylol (meth) acrylamide , or 1,3,5-tripropylene decyl hexahydro-1,3,5-three (triacrylformal) and the like. These polyfunctional monomers can be used singly or in combination of two or more.

As the (E) photopolymerizable monomer, a trifunctional or higher polyfunctional monomer can be used from the viewpoint of improving the adhesion of the cured product to the substrate and the strength of the cured product. As the polyfunctional monomer having 4 or more functional groups, a polyfunctional monomer having 5 or more functional groups can be used. Specifically, when a polyfunctional monomer having five or more functional groups is used, the adhesion of the substrate can be improved. Typically, dipentaerythritol penta (meth) acrylate, and/or dipentaerythritol hexa (meth) acrylate is used.

The content of the photosensitive composition of the (E) photopolymerizable monomer is not particularly limited as long as it does not impair the object of the present invention. However, the content of the (E) photopolymerizable monomer in the photosensitive composition is preferably 50% by mass or less based on the mass of the (A) cross-linking component, from the viewpoint of the effect of the present invention being more remarkable. 30% by mass or less is more preferably 10% by mass or less, particularly preferably 5% by mass or less, and most preferably 0% by mass.

<(S) Organic Solvent> The photosensitive composition preferably contains (S) an organic solvent for improvement in coatability or viscosity adjustment.

Specific examples of the (S) organic solvent include ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, ethylene glycol mono-n-propyl ether, and ethylene glycol mono-n-butyl ether. Diethylene glycol monomethyl ether, diethylene glycol monoethyl ether, diethylene glycol mono-n-propyl ether, diethylene glycol mono-n-butyl ether, triethylene glycol monomethyl ether , triethylene glycol monoethyl ether, propylene glycol monomethyl ether, propylene glycol monoethyl ether, propylene glycol mono-n-propyl ether, propylene glycol mono-n-butyl ether, dipropylene glycol monomethyl ether, dipropylene glycol single (poly)alkylene glycol monoalkyl ethers such as ethyl ether, dipropylene glycol mono-n-propyl ether, dipropylene glycol mono-n-butyl ether, tripropylene glycol monomethyl ether, tripropylene glycol monoethyl ether Ethylene glycol monomethyl ether acetate, ethylene glycol monoethyl ether acetate, diethylene glycol monomethyl ether acetate, diethylene glycol monoethyl ether acetate, propylene glycol monomethyl (poly)alkylene glycol monoalkyl ether acetates such as phenyl ether acetate (PGMEA), propylene glycol monoethyl ether acetate, etc.; diethylene glycol dimethyl ether, diethylene glycol methyl ethyl Other ethers such as ether, diethylene glycol diethyl ether, tetrahydrofuran; methyl Ketones such as ketone, cyclohexanone, 2-heptanone, 3-heptanone, etc.; alkyl lactate such as methyl 2-hydroxypropionate, ethyl 2-hydroxypropionate; 2-hydroxy-2- Ethyl methacrylate, methyl 3-methoxypropionate, ethyl 3-methoxypropionate, methyl 3-ethoxypropionate, ethyl 3-ethoxypropionate, ethoxylate Ethyl acetate, ethyl hydroxyacetate, methyl 2-hydroxy-3-methylbutanoate, 3-methoxybutyl acetate, 3-methyl-3-methoxybutyl acetate, 3 -methyl-3-methoxybutylpropionate, ethyl acetate, n-propyl acetate, i-propyl acetate, n-butyl acetate, i-butyl acetate, n-amyl formate, acetic acid I-amyl ester, benzyl acetate, n-butyl propionate, ethyl butyrate, n-propyl butyrate, i-propyl butyrate, n-butyl butyrate, methyl pyruvate, ethyl pyruvate, pyruvic acid Other esters such as n-propyl ester, ethyl acetoacetate, ethyl acetate, ethyl 2-oxobutanoate; aromatic hydrocarbons such as toluene and xylene; N-methyl-2-pyrrole Pyridone, N,N-dimethylformamide, N,N-dimethylacetamide, N,N-dimethylisobutylguanamine, N,N-diethylacetamide, N , N-diethylformamide, N- Caprolactam-yl, 1,3-dimethyl-2-piperidone imidazole, pyridine and N, N, N ', N'- tetramethyl urea and other nitrogen-containing polar organic solvent; and the like.

Among these, alkanediol monoalkyl ethers, alkylene glycol monoalkyl ether acetates, the above other ethers, alkyl lactates, and the above other esters are preferred, alkanediol monoalkyl groups. The above other esters such as an ether acetate, the above other ethers, and a benzyl acetate are more preferable. Further, the (S) organic solvent is preferably a nitrogen-containing polar organic solvent, depending on the solubility of each component or the dispersibility of (C) a pigment such as carbon black. As the nitrogen-containing polar organic solvent, N, N, N', N'-tetramethyluron or the like can be used. These solvents may be used alone or in combination of two or more.

The content of the (S) organic solvent is not particularly limited, and is appropriately set depending on the coating film thickness at a concentration that can be applied to a substrate or the like. The viscosity of the photosensitive composition is preferably 5 cp or more and 500 cp or less, more preferably 10 cp or more and 50 cp or less, and more preferably 20 cp or more and 30 cp or less. Further, the solid content concentration is preferably 5% by mass or more and 100% by mass or less, more preferably 15% by mass or more and 50% by mass or less.

<Other Components> The photosensitive composition may contain an additive such as a surfactant, an adhesion promoter, a thermal polymerization inhibitor, an antifoaming agent, or an epoxy compound, as needed. Any of the additives can be used in the past. Examples of the surfactant include compounds such as anionic, cationic, and nonionic. Examples of the thermal polymerization inhibitor include hydroquinone and hydroquinone monoethyl ether. Examples of the antifoaming agent include polyoxyn , fluorine-based compounds, and the like.

<Preparation Method of Photosensitive Composition> The photosensitive composition described above can be obtained by uniformly mixing the above components with a predetermined amount and then uniformly mixing them with a stirrer. In addition, filtration can also be carried out using a filter to make the resulting mixture more uniform.

The cured film formed using the photosensitive composition described above is excellent in light-shielding property and excellent in insulation property and adhesion to a substrate. Therefore, the photosensitive composition described above is suitably used for forming a black matrix in a color filter provided in various display panels for display devices.

The cured film formed using the above-described photosensitive composition is excellent in insulating properties and light-shielding properties, and is preferably used as a light-shielding material for a lead in a touch panel. In the lead wire of the touch panel, by using the above-described photosensitive composition to form a cured film as a light-shielding material, it is difficult to visually recognize the lead from the user side of the touch panel. Therefore, the above-mentioned photosensitive composition is suitable for use in forming a light-shielding material for a lead wire in a touch panel.

In addition, it is preferable that the surface resistivity of the photosensitive composition when the cured film is formed under the following conditions is 1.0 × 10 ¹² Ω/□ or more. The hardening conditions described below are conditions in which the cured film is exposed to a relatively high temperature for a long period of time. By using the above-mentioned photosensitive composition, even under such severe conditions, a cured film having a high resistance value and having high reliability with respect to insulation performance can be formed. (Curing the curing condition) The photosensitive composition was applied onto a glass substrate so as to have a thickness of 1 μm, and exposed to an exposure amount of 50 mJ/cm ² on a ghi line, followed by post-baking at 250 ° C for 300 minutes. Become a hardened film. Further, the surface resistivity when the cured film is formed under the same conditions is preferably 1.0 × 10 ¹³ Ω / □ or more, more preferably 1.0 × 10 ¹⁴ Ω / □ or more. The upper limit is not particularly limited, but is, for example, 1.0 × 10 ¹⁸ Ω / □ or less.

Further, in the photosensitive composition, the optical density when the cured film is formed under the following conditions is preferably 2.8/μm or more. Thereby, a cured film having a higher light blocking property can be realized. (Curing the curing condition) The photosensitive composition was applied onto a glass substrate so as to have a thickness of 1 μm, and exposed to an exposure amount of 50 mJ/cm ² on a ghi line, followed by post-baking at 230 ° C for 20 minutes. Become a hardened film. Further, when the cured film is formed under the same conditions, the optical density is preferably 3.0/μm or more, and more preferably 3.2/μm or more. The upper limit is not particularly limited, but is, for example, 5.0/μm or less.

(Manufacturing Method of the Cured Film) As a method of producing the cured film, a conventionally known method for producing a cured film using a photosensitive composition containing a photopolymerizable compound can be used without particular limitation.

As a suitable manufacturing method of the cured film, there may be mentioned, for example, a step of forming a coating film by coating a photosensitive composition, a step of selectively exposing the coating film, and developing the exposed coating film. The method of the step. By this method, a cured film patterned into a desired shape can be formed. The patterned cured film formed by development can be further baked.

Further, although a method of forming the patterned cured film is described here, of course, it is also possible to form a cured film which is not patterned by exposing the coating film to the entire surface.

In order to form a cured film using a photosensitive product, first, a photosensitive film is applied onto a substrate selected for use in a cured film to form a coating film. The method for forming the coating film is not particularly limited, but a contact transfer type coating device or a spin coater (rotary coating device) such as a roll coater, a reverse coater, or a bar coater, and a curtain are used. It is carried out by a non-contact type coating device such as a flow coater.

The applied photosensitive composition is dried as needed to form a coating film. The drying method is not particularly limited, and for example, (1) a method of drying the hot plate at a temperature of 80 ° C or more and 120 ° C or less, preferably 90 ° C or more and 100 ° C or less, for 60 seconds or more and 120 seconds or less ( 2) A method of leaving at room temperature for several hours to several days, and (3) a method of removing the solvent in a warm air heater or an infrared heater for several tens of minutes to several hours.

The coated film is then exposed. The exposure is performed by irradiating an active energy ray such as ultraviolet rays or excimer laser light. The exposure is performed selectively by a method such as exposure through a negative mask. The amount of the energy ray to be irradiated differs depending on the composition of the photosensitive composition, but is preferably, for example, 40 mJ/cm ² or more and 200 mJ/cm ² or less. Further, when the coating film is entirely exposed, a cured film having a shape corresponding to the shape of the coating film is formed.

When the position of the coating film is selectively exposed, the exposed film is developed by a developing solution, and the unexposed portion is dissolved in the developing solution to be removed, thereby forming a patterned cured film. The development method is not particularly limited, and for example, a dipping method, a spray method, or the like can be used. The developer is appropriately selected depending on the composition of the photosensitive composition. As the developer, an alkaline aqueous solution such as sodium hydroxide, potassium hydroxide, sodium carbonate, ammonia or a quaternary ammonium salt can be used.

Next, baking (post-baking) of the patterned cured film is carried out as desired. The baking temperature is not particularly limited, but is preferably 180° C. or higher and 250° C. or lower, and more preferably 220° C. or higher and 230° C. or lower. The baking time is typically 10 minutes or more and 90 minutes or less, and preferably 20 minutes or more and 60 minutes or less. A cured film of the photosensitive composition can be obtained by baking as described above.

The cured film formed in this manner is excellent in light-shielding property and excellent in insulating property and adhesion to a substrate. Therefore, it is suitable to use a black matrix in a color filter included in a display panel for various display devices. Moreover, since the cured film formed using the above-mentioned photosensitive composition is excellent in insulation property and light-shielding property, it is preferable to use a light-shielding material as a lead wire in a touch panel. By forming a cured film as a light-shielding material on the lead in the touch panel using the above-described photosensitive composition, it is difficult to visually recognize the lead from the user side of the touch panel. [Examples]

Hereinafter, the present invention will be specifically described by showing examples, but the scope of the present invention is not limited to the examples.

In the examples, as the (A) crosslinking component (component (A)), (CH ₃ O)SiO _3/2 (T unit) 57 mol%, (CH ₃ )SiO _3/2 (T unit) was used. 21 mole % and a unit of the following formula (T unit) 22 mole % of a decane compound (weight average molecular weight: 1900). Here, (CH ₃ O)SiO _3/2 (T unit) corresponds to the above-mentioned structural unit I. Further, (CH ₃ )SiO _3/2 (T unit) and a unit (T unit) of the following formula correspond to the above-mentioned structural unit II. That is, the value of (the molar amount of the structural unit I) / (the sum of the molar amounts of the structural unit I, the structural unit II, and the structural unit III) of the (A) cross-linking component is 0.57.

In the comparative example, (A) a crosslinking component was changed, and dipentaerythritol hexaacrylate was used as (E) photopolymerizable monomer ((E) component).

In the examples and the comparative examples, as the (B) photopolymerizable compound (component (B)), NCI-831 (manufactured by ADEKA CORPORATION) having the following structure was used.

In the examples and the comparative examples, as the (C) carbon black (component (C)), a carbon black dispersion (manufactured by Daisei Chemical Industries Co., Ltd.) was used. Further, in Table 1 of the present Example, the numerical value of the solid content of the pigment and the dispersing agent is described.

In the examples and the comparative examples, as the (D) binder resin (component (D)), the resin D-1 obtained in the following Preparation Example 1 and the acrylic binder resin D-2 were used.

[Preparation Example 1] First, 235 g of bisphenol fluorene type epoxy resin (epoxy equivalent 235), 110 mg of tetramethylammonium chloride, and 2,6-di-tertiary butyl-4- are added to a 500 ml four-necked flask. 100 mg of methylphenol and 72.0 g of acrylic acid were dissolved by heating at 90 to 100 ° C while blowing air at a rate of 25 ml/min. Next, the solution was slowly warmed up in a white turbid state, and heated to 120 ° C to be completely dissolved. At this time, the solution gradually became transparent and viscous, and the state was maintained while stirring. During this period, the acid value was measured, and heating and stirring were continued until it was less than 1.0 mgKOH/g. It takes 12 hours for the acid price to reach the target value. Then, it was cooled to room temperature to obtain a bisphenolphthalein type epoxy acrylate represented by the following formula which was colorless, transparent and solid.

Next, after dissolving 600 g of 3-methoxybutyl acetate in 307.0 g of the above-mentioned bisphenol fluorene-type epoxy acrylate, 80.5 g of benzophenone tetracarboxylic dianhydride and brominated tetra were mixed. 1 g of ethylammonium was gradually heated to 110 to 115 ° C for 4 hours. After confirming the disappearance of the acid anhydride group, 38.0 g of 1,2,3,6-tetrahydrophthalic anhydride was mixed, and the mixture was reacted at 90 ° C for 6 hours to obtain a resin D-1. The disappearance of the acid anhydride group was confirmed by IR spectroscopy.

[Example 1 and Comparative Example 1] Each component of the amount of Table 1 and 0.1 part by mass of the fluorine-based surfactant were dissolved and dispersed in the organic solvent (S) to have a solid concentration of 19% by mass. And the photosensitive composition of the comparative example. As the (S) organic solvent, a mixed solvent of 30% by mass of 3-methoxybutyl acetate, 20% by mass of cyclohexanone, and 50% by mass of propylene glycol monomethyl ether acetate was used.

With respect to the photosensitive composition of Example 1, a cured film was formed according to the following measurement conditions, and the amount of ruthenium atom (% by mass) and the amount of carbon atoms (% by mass) in the surface of the cured film were analyzed. As a result of the analysis, the ratio of the amount of ruthenium atom (% by mass) / the amount of carbon atoms (% by mass) in the surface of the cured film was 0.11 (the average value of the three measurements was performed). (Measurement conditions) The photosensitive composition was applied onto a glass substrate so as to have a thickness of 1 μm, and exposed to an exposure amount of 50 mJ/cm ² on a ghi line, followed by post-baking at 230 ° C for 20 minutes. Hardened film. XPS was measured on the surface of the cured film, and the peak area of each element was determined, and the mass ratio of each element was calculated.

Using the obtained photosensitive resin composition, the surface resistance value, the optical density (OD value), and the adhesion were evaluated by the following methods, respectively. The results of these evaluations are shown in Table 1. (Measurement of surface resistance value) The photosensitive composition was applied onto a glass substrate so as to have a thickness of 1 μm, and exposed to an exposure amount of 50 mJ/cm ² on a ghi line, followed by post-baking at 250 ° C for 300 minutes. , a cured film is obtained. The surface resistivity was measured about the obtained cured film. (Measurement of optical density) The photosensitive composition was applied onto a glass substrate so as to have a thickness of 1 μm, and exposed to an exposure amount of 50 mJ/cm ² on a ghi line, followed by post-baking at 230 ° C for 20 minutes. A cured film is obtained. The optical density of the obtained cured film was measured. (Adhesion evaluation) The photosensitive composition was applied onto a glass substrate so as to have a thickness of 1 μm, and exposed to an exposure amount of 50 mJ/cm ² on a ghi line, followed by post-baking at 230 ° C for 20 minutes. , a cured film is obtained. The obtained cured film was allowed to stand at a temperature of 121 ° C, a humidity of 100%, and a pressure of 2 atmospheres for 2 hours, and the adhesion was evaluated by a cross-cut method (tape test). For this assessment, an assessment of 0B~5B was conducted in accordance with ASTM D-3359.

According to the first embodiment, the content of the (C) carbon black in the total solid content of the photosensitive composition is 30% by mass or more, and the amount of germanium in the cured product of the photosensitive composition (% by mass) / The ratio of the atomic weight of carbon atoms (% by mass) is 0.05 or more, and a siloxane compound having a predetermined structure is used as a photosensitive composition of (A) a crosslinking component, which can form an optical density and a high surface resistance, and is densely bonded to a substrate. Excellent hardening film. On the other hand, in Comparative Example 1, it is understood that the (C) carbon black content in the total solid content of the photosensitive composition is 30% by mass or more, and (E) photopolymerizable monomer is contained, and the specified structure is not contained. As a photosensitive composition of the crosslinked component (A), the siloxane compound can form a cured film having a low surface resistance and a poor adhesion to a substrate, even if a cured film having a high optical density can be formed.

Claims (12)

A photosensitive composition comprising (A) a crosslinking component, (B) a photopolymerization initiator, and (C) a carbon black photosensitive composition, wherein the crosslinking component (A) comprises a formula selected from the group consisting of a siloxane compound of one or more kinds of structural units of M unit, D unit, T unit, and Q unit represented by (a1) to (a4): M unit: R ¹ R ² R ³ SiO _1/2 ·・・(a1) D unit: R ⁴ R ⁵ SiO _2/2・・・(a2) T unit: R ⁶ SiO _3/2・・・(a3) Q unit: SiO _4/2・・・(a4) ( In the formulae (a1) to (a4), R ¹ to R ⁶ are each independently a group represented by R ⁷ - or R ⁷ -O-, and R ⁷ is bonded to the formula (a1) by a C-Si bond. a monovalent organic group of a ruthenium atom in (a3) or a monovalent organic group bonded to an oxygen atom in R ⁷ -O- by a CO bond, and the above siloxane compound has two or more in its structure a carbon-carbon double bond, wherein the oxoxane compound contains two or more structural units selected from the group consisting of M unit, D unit, T unit, and Q unit, and the foregoing all of the total solid components of the photosensitive composition C) The content of the carbon black is 30% by mass or more, and the cured product of the photosensitive composition is measured under the following measurement conditions. When the amount of argon atoms (% by mass) and the amount of carbon atoms (% by mass), the ratio of the amount of argon atoms (% by mass) / the amount of carbon atoms (% by mass) is 0.05 or more; (Measurement conditions) The photosensitive composition has a thickness of 1 μm. The film was coated on a glass substrate, exposed to an exposure amount of 50 mJ/cm ² on a ghi line, and then post-baked at 230 ° C for 20 minutes to form a cured film. The surface of the cured film was measured for XPS. The peak area of each element is used to calculate the mass ratio of each element. The photosensitive composition of claim 1, wherein the content of the above-mentioned siloxane compound in the total solid content of the photosensitive composition is 5% by mass or more. The photosensitive composition of claim 1 or 2, which further comprises (D) a binder resin. The photosensitive composition according to any one of claims 1 to 3, wherein the oxoxane compound comprises a structure selected from the group consisting of the following formula (a1a), formula (a2a), formula (a3a), and formula (a4). One or more structural units in the unit: I(R ⁷ O) ₃ SiO _1/2・・・(a1a) (R ⁷ O) ₂ SiO _2/2・・・(a2a) (R ⁷ O)SiO _{3 /2}・・・(a3a) SiO _4/2・(a4) (In the formula (a1a), the formula (a2a), and the formula (a3a), R ⁷ is bonded to R ⁷ -O- by a CO bond. a monovalent organic group of an oxygen atom). The photosensitive composition of claim 4, wherein the oxoxane compound further comprises one or more structural units selected from the structural units represented by the following formula (a1b), formula (a2b), and formula (a3b) And/or one or more structural units selected from the structural units represented by the following formulas (a1c) and (a2c): (R ⁷ O) ₂ R ⁷ SiO _1/2 (a1b) (R ⁷ O)R ⁷ SiO _2/2・(a2b) R ⁷ SiO _3/2・(a3b) (In the formula (a1b), the formula (a2b), and the formula (a3b), R ⁷ is a C-Si bond bonded to a monovalent organic group of a halogen atom in the formula (a1b), the formula (a2b), and the formula (a3b), or an oxygen atom bonded to a carbon atom in R ⁷ -O- by a CO bond monovalent organic ^{group); (R 7 O) R} 7 2 SiO 1/2 · · · (a1c) R 7 2 SiO 2/2 · · · (a2c) ( formula (A1c) and formula (A2C), R ^{7 is} a monovalent organic group bonded to a ruthenium atom in the formula (a1c) and the formula (a2c) by a C-Si bond, or a monovalent organic group bonded to an oxygen atom in R ⁷ -O- by a CO bond The value of (the molar amount of the structural unit I) / (the sum of the molar amounts of the structural unit I, the structural unit II, and the structural unit III) in the siloxane compound is 0.25 or more. The photosensitive composition according to any one of claims 1 to 5, which is used to form a black matrix. The photosensitive composition according to any one of claims 1 to 5, which is used for forming a light-shielding material for a lead in a touch panel. The photosensitive composition according to any one of claims 1 to 7, wherein the surface resistivity when the cured film is formed under the following conditions is 1.0 × 10 ¹² Ω/□ or more, (hardening condition), the photosensitive composition is made to have a thickness The film was applied to a glass substrate in a manner of 1 μm, and exposed to an exposure amount of 50 mJ/cm ² on a ghi line, followed by post-baking at 250 ° C for 300 minutes to form a cured film. The photosensitive composition according to any one of the above-mentioned items 1 to 8, wherein the optical density when the cured film is formed under the following conditions is 2.8/μm or more (curing condition), and the photosensitive composition is coated to have a thickness of 1 μm. The cloth was placed on a glass substrate and exposed to an exposure amount of 50 mJ/cm ² on a ghi line, and then post-baked at 230 ° C for 20 minutes to form a cured film. A cured film obtained by curing the photosensitive composition according to any one of claims 1 to 9. A display device having a cured film as claimed in claim 10. A method of forming a patterned cured film, comprising the steps of: forming a coating film by applying a photosensitive composition according to any one of claims 1 to 9, and selectively exposing the foregoing The step of coating the film and the step of developing the exposed coating film.