TW201840964A - Method for determining an amount of sediment in a ceramic dispersion - Google Patents
Method for determining an amount of sediment in a ceramic dispersion Download PDFInfo
- Publication number
- TW201840964A TW201840964A TW106144710A TW106144710A TW201840964A TW 201840964 A TW201840964 A TW 201840964A TW 106144710 A TW106144710 A TW 106144710A TW 106144710 A TW106144710 A TW 106144710A TW 201840964 A TW201840964 A TW 201840964A
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- Prior art keywords
- dispersion
- acrylate
- ceramic
- meth
- deposit
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- 239000006185 dispersion Substances 0.000 title claims abstract description 126
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- 238000000034 method Methods 0.000 title claims abstract description 65
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- 238000012800 visualization Methods 0.000 claims abstract description 6
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- VYHBFRJRBHMIQZ-UHFFFAOYSA-N bis[4-(diethylamino)phenyl]methanone Chemical compound C1=CC(N(CC)CC)=CC=C1C(=O)C1=CC=C(N(CC)CC)C=C1 VYHBFRJRBHMIQZ-UHFFFAOYSA-N 0.000 description 5
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- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- ISXSCDLOGDJUNJ-UHFFFAOYSA-N tert-butyl prop-2-enoate Chemical compound CC(C)(C)OC(=O)C=C ISXSCDLOGDJUNJ-UHFFFAOYSA-N 0.000 description 1
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- 125000002889 tridecyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
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Classifications
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N33/00—Investigating or analysing materials by specific methods not covered by groups G01N1/00 - G01N31/00
- G01N33/26—Oils; Viscous liquids; Paints; Inks
- G01N33/32—Paints; Inks
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- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
- C04B35/01—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics
- C04B35/14—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics based on silica
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
- C04B35/622—Forming processes; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
- C04B35/626—Preparing or treating the powders individually or as batches ; preparing or treating macroscopic reinforcing agents for ceramic products, e.g. fibres; mechanical aspects section B
- C04B35/62605—Treating the starting powders individually or as mixtures
- C04B35/62625—Wet mixtures
- C04B35/6263—Wet mixtures characterised by their solids loadings, i.e. the percentage of solids
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- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
- C04B35/622—Forming processes; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
- C04B35/626—Preparing or treating the powders individually or as batches ; preparing or treating macroscopic reinforcing agents for ceramic products, e.g. fibres; mechanical aspects section B
- C04B35/63—Preparing or treating the powders individually or as batches ; preparing or treating macroscopic reinforcing agents for ceramic products, e.g. fibres; mechanical aspects section B using additives specially adapted for forming the products, e.g.. binder binders
- C04B35/632—Organic additives
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
- C04B35/622—Forming processes; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
- C04B35/626—Preparing or treating the powders individually or as batches ; preparing or treating macroscopic reinforcing agents for ceramic products, e.g. fibres; mechanical aspects section B
- C04B35/63—Preparing or treating the powders individually or as batches ; preparing or treating macroscopic reinforcing agents for ceramic products, e.g. fibres; mechanical aspects section B using additives specially adapted for forming the products, e.g.. binder binders
- C04B35/632—Organic additives
- C04B35/634—Polymers
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Abstract
Description
本發明大體上係關於一種測定陶瓷分散液中沉積物含量之方法。更特定言之,分散液包括金屬粒子以允許可視化。The present invention generally relates to a method of determining the amount of deposits in a ceramic dispersion. More specifically, the dispersion includes metal particles to allow visualization.
用於產生三維物體之積層製造(additive fabrication)過程已為所熟知。積層製造過程利用物體之電腦輔助設計(CAD)資料來建立三維零件。此等三維零件可由液體樹脂、粉末或其他材料形成。 在立體微影(SL)中,物體之CAD資料轉化成三維物體之薄橫截面。將資料加載至控制雷射之電腦中,該雷射穿過缸中之液體輻射可固化樹脂組合物描繪截面之圖案,對應於該截面固化樹脂組合物之薄層。固化層藉由樹脂組合物再塗佈且雷射描繪另一截面以在前一層的頂部上硬化樹脂組合物之另一層。逐層重複該過程直至完成三維物體。當最初形成時,三維物體一般未完全固化,且稱作「生坯模型」。此過程亦稱為三維(3D)打印。 存在若干類型的用於立體微影之雷射,其波長傳統地介於193 nm至355 nm範圍內,儘管存在其他波長變化形式。使用氣體雷射固化液體輻射可固化樹脂組合物為熟知的。在立體微影系統中傳遞雷射能量的可為連續波(Continuous Wave;CW)或調Q脈衝。CW雷射提供連續雷射能量且可用於高速掃描方法。然而,其輸出功率受到限制,降低了在物體產生期間出現之固化的量。積層製造之其他方法利用燈或發光二極體(LED)。LED為利用電致發光現象來產生光之半導體裝置。目前,LED UV光源普遍地在300與475 nm之間的波長處發光,其中365 nm、390 nm、395 nm、405 nm及415 nm為常用尖峰頻譜輸出。 許多積層製造應用需要生坯模型具有高機械強度(例如彈性模量、斷裂強度等)。通常稱為「生強度」之此特性通常藉由液體輻射可固化樹脂組合物測定。一些組合物包括二氧化矽,例如以提高熱變形溫度及模數或製造陶瓷零件。然而,此類組合物傾向於具有(1)高初始黏度,(2)不佳黏度穩定性,(3)相分離之傾向,導致稱為「軟包裝」或「硬包裝」之現象,及(4)導致打印部分之畸變的高固化收縮。 隨著此類組合物中之二氧化矽的量增加,組合物之黏度增加,導致可加工性及處理速度降低。同時,組合物必須具有足夠隨時間推移之黏度穩定性。黏度不應隨時間推移而顯著增加,否則可產生額外加工問題。 此外,此類組合物傾向於在儲存時隨時間推移而相分離。舉例而言,二氧化矽可聚集於儲存容器底部,產生相分離之組合物。組合物之頂部部分可為低黏度、很大程度上未填充的部分,亦即不包括足夠二氧化矽負載之部分。底部部分可為二氧化矽過飽和及高黏度。頂部部分中之組合物無法用於產生具有足夠強度及硬度之生坯模型且任何所得零件將由於二氧化矽耗盡而在黏合劑燃盡及燒結期間遭受高收縮及裂解。底部部分中之組合物無法使用,因為其過於黏滯且具有使得最終零件不可用之二氧化矽濃度。因此,整個容器可變得不可用,或在最低限度下,必須經歷另外的昂貴且費時的處理以能夠使用。 在一種情境下,二氧化矽在儲存容器之底部沉降且形成軟包裝。沉降之二氧化矽可由部分聚合之樹脂包圍,產生蠟樣稠度。儘管可能再同化為可使用組合物,但此類方法需要頻繁且通常劇烈的再循環。此為耗費時間及能量之維護過程,且仍不除去組合物之有問題的黏度。 在另一情境下,二氧化矽在儲存容器之底部沉降且形成硬包裝。在此類情境下,二氧化矽形成極硬的岩石樣結構。此類結構必須藉由鑽孔機或類似裝置破碎,隨後可能再同化。同樣,此為耗費時間及能量的。 許多組合物必須進行測試以達成穩定分散液且此可能需要許多天或許多週以測試各配方。測定穩定性之度量通常僅使用主觀觀測來界定何時出現沉積且隨後使用沉積物之進一步定性評估。然而,即使此等方法亦為不精確且費時的。因此,仍存在改良之機會。The additive fabrication process for producing three-dimensional objects is well known. The laminate manufacturing process uses computer-aided design (CAD) data from objects to create three-dimensional parts. These three-dimensional parts can be formed from liquid resins, powders or other materials. In stereo lithography (SL), the CAD data of an object is transformed into a thin cross section of a three-dimensional object. The data is loaded into a computer that controls the laser that passes through the liquid radiation curable resin composition in the cylinder to draw a pattern of cross-sections corresponding to a thin layer of the cross-section cured resin composition. The cured layer is recoated by the resin composition and the laser depicts another cross section to harden another layer of the resin composition on top of the previous layer. This process is repeated layer by layer until the three-dimensional object is completed. When initially formed, the three-dimensional object is generally not fully cured and is referred to as a "green model." This process is also known as three-dimensional (3D) printing. There are several types of lasers for stereo lithography whose wavelengths are traditionally in the range of 193 nm to 355 nm, although other wavelength variations exist. The use of a gas laser-curable liquid radiation curable resin composition is well known. The laser energy transmitted in the stereo lithography system may be a continuous wave (CW) or a Q-switched pulse. CW lasers provide continuous laser energy and can be used in high speed scanning methods. However, its output power is limited, reducing the amount of solidification that occurs during the creation of an object. Other methods of laminate manufacturing utilize lamps or light emitting diodes (LEDs). An LED is a semiconductor device that generates light using an electroluminescence phenomenon. Currently, LED UV sources generally emit light at wavelengths between 300 and 475 nm, with 365 nm, 390 nm, 395 nm, 405 nm, and 415 nm being common peak spectral outputs. Many laminate manufacturing applications require green molds with high mechanical strength (eg, modulus of elasticity, breaking strength, etc.). This property, commonly referred to as "green strength", is typically determined by a liquid radiation curable resin composition. Some compositions include cerium oxide, for example to increase heat distortion temperature and modulus or to make ceramic parts. However, such compositions tend to have (1) high initial viscosity, (2) poor viscosity stability, and (3) a tendency to phase separation, resulting in a phenomenon known as "soft packaging" or "hard packaging", and (4) A high cure shrinkage that causes distortion of the printed portion. As the amount of cerium oxide in such compositions increases, the viscosity of the composition increases, resulting in reduced processability and processing speed. At the same time, the composition must have sufficient viscosity stability over time. Viscosity should not increase significantly over time, otherwise additional processing problems can arise. Moreover, such compositions tend to phase separate over time during storage. For example, cerium oxide can be concentrated at the bottom of the storage vessel to produce a phase separated composition. The top portion of the composition can be a low viscosity, largely unfilled portion, i.e., a portion that does not include sufficient cerium oxide loading. The bottom portion can be super-saturated and highly viscous. The composition in the top portion cannot be used to produce a green mold of sufficient strength and hardness and any resulting part will suffer from high shrinkage and cracking during burnout and sintering of the binder due to the depletion of cerium oxide. The composition in the bottom portion cannot be used because it is too viscous and has a concentration of cerium oxide that renders the final part unusable. Thus, the entire container may become unavailable or, at a minimum, must undergo additional expensive and time consuming processing to enable use. In one scenario, the cerium oxide settles at the bottom of the storage container and forms a flexible package. The precipitated cerium oxide can be surrounded by a partially polymerized resin to produce a waxy consistency. Although it is possible to assimilate into a usable composition, such methods require frequent and often severe recycling. This is a time and energy maintenance process and still does not remove the problematic viscosity of the composition. In another scenario, the cerium oxide settles at the bottom of the storage container and forms a rigid package. In such situations, cerium oxide forms an extremely hard rock-like structure. Such structures must be broken by a drill or similar device and may then be assimilated. Again, this is time consuming and energy intensive. Many compositions must be tested to achieve a stable dispersion and this may take many days or weeks to test each formulation. Metrics for determining stability typically use only subjective observations to define when deposition occurs and then use a further qualitative assessment of the deposit. However, even these methods are inaccurate and time consuming. Therefore, there are still opportunities for improvement.
本發明提供一種測定用於積層製造之陶瓷分散液中沉積物含量之方法。陶瓷分散液包括(a)作為連續相之自由基可固化單體,(b)作為分散相之二氧化矽,該分散相分散於連續相中且以按陶瓷分散液之總體積計55至70體積百分比之量存在,及(c)金屬粒子。該方法包括提供離心機以向陶瓷分散液施加重力及將陶瓷分散液樣品置於離心機中之樣品容器中的步驟。該方法亦包括向離心機中之陶瓷分散液施加25G至2000G之重力以自連續相沉澱一定量之二氧化矽,藉此形成沉積物,其包含安置於沉積物上之最頂層,其中最頂層包含金屬粒子以允許可視化。方法進一步包括量測陶瓷分散液中沉積物含量之步驟。量測步驟可如下進行:經由以分散液之總高度之百分比計算沉積物之高度,及/或傾析連續相且量測沉積物之質量以基於施加重力之前的分散液之總質量測定沉積物之質量百分比。The present invention provides a method of determining the amount of deposits in a ceramic dispersion for multilayer manufacturing. The ceramic dispersion comprises (a) a radically curable monomer as a continuous phase, (b) as a dispersed phase of cerium oxide, the dispersed phase being dispersed in the continuous phase and being 55 to 70 in terms of the total volume of the ceramic dispersion. The volume percentage is present, and (c) the metal particles. The method includes the steps of providing a centrifuge to apply gravity to the ceramic dispersion and placing the ceramic dispersion sample in a sample container in the centrifuge. The method also includes applying a gravity of 25G to 2000G to the ceramic dispersion in the centrifuge to precipitate a quantity of cerium oxide from the continuous phase, thereby forming a deposit comprising the topmost layer disposed on the deposit, wherein the topmost layer Contains metal particles to allow visualization. The method further includes the step of measuring the amount of deposits in the ceramic dispersion. The measuring step can be carried out by calculating the height of the deposit by a percentage of the total height of the dispersion, and/or decanting the continuous phase and measuring the mass of the deposit to determine the deposit based on the total mass of the dispersion before gravity is applied. Percentage of mass.
本發明提供一種測定用於積層製造之陶瓷分散液中沉積物含量之方法。陶瓷分散液在下文中描述為「分散液」。術語「積層製造」描述層中之建立部分,如此項技術中所熟知且如上文所述。術語「陶瓷」描述該分散液用於形成陶瓷製品,亦在下文更詳細地描述。術語「分散液」描述包括連續相及分散於連續相中之分散相之組合物。術語「沉積物」通常描述自連續相沉澱出之分散相的量。 分散液包括作為連續相之自由基可固化單體、作為分散相之二氧化矽及金屬粒子,該分散相分散於連續相中且以按陶瓷分散液之總體積計55至70體積百分比之量存在。各自描述於下文。 在各種實施例中,分散液為自由基可固化單體、二氧化矽及金屬粒子,基本上由其組成或由其組成。舉例而言,在「基本上由」上述組分「組成」之實施例中,分散液可不含不可藉由自由基機制聚合之單體、其他聚合物、此項技術中已知之任何類型之添加劑(包括本文所述之任何添加劑)、任何不為自由基引發劑之聚合引發劑及/或除二氧化矽以外之填充劑等,及/或其組合。或者,此等組分中之任何一或多者可以按分散液之總重量計小於25、20、15、10、5、4、3、2、1、0.1、0.05、0.01等,或其任何範圍之量存在。在各種非限制性實施例中,特此明確地涵蓋上述值之間的所有值及值範圍。自由基可固化單體:
分散液包括自由基可固化單體。此單體能夠經由自由基聚合與自身及/或與其他丙烯酸酯單體聚合,例如藉由暴露於UV光/能量、過氧化物或如此項技術中已知之其他自由基引發劑而引發。此單體充當分散液之連續(例如液體)相。自由基可固化單體可為丙烯酸酯或甲基丙烯酸酯。丙烯酸酯單體可為多官能性丙烯酸酯。可使用單一類型或大於一種類型之UV可固化丙烯酸酯單體。 適合之非限制性實例包括(甲基)丙烯酸異冰片酯、(甲基)丙烯酸莰酯、(甲基)丙烯酸三環癸酯、(甲基)丙烯酸二環戊酯、(甲基)丙烯酸二環戊烯酯、(甲基)丙烯酸環己酯、(甲基)丙烯酸苯甲酯、(甲基)丙烯酸4-丁基環己酯、丙烯醯基嗎啉、(甲基)丙烯酸、(甲基)丙烯酸2-羥乙酯、(甲基)丙烯酸2-羥丙酯、(甲基)丙烯酸2-羥丁酯、(甲基)丙烯酸甲酯、(甲基)丙烯酸乙酯、(甲基)丙烯酸丙酯、(甲基)丙烯酸異丙酯、(甲基)丙烯酸丁酯、(甲基)丙烯酸戊酯、(甲基)丙烯酸異丁酯、(甲基)丙烯酸第三丁酯、(甲基)丙烯酸戊酯、己內酯丙烯酸酯、(甲基)丙烯酸異戊酯、(甲基)丙烯酸己酯、(甲基)丙烯酸庚酯、(甲基)丙烯酸辛酯、(甲基)丙烯酸異辛酯、(甲基)丙烯酸2-乙基己酯、(甲基)丙烯酸壬酯、(甲基)丙烯酸癸酯、(甲基)丙烯酸異癸酯、(甲基)丙烯酸十三烷酯、(甲基)丙烯酸十一烷酯、(甲基)丙烯酸月桂酯、(甲基)丙烯酸硬脂酯、(甲基)丙烯酸異硬脂酯、(甲基)丙烯酸四氫呋喃酯、(甲基)丙烯酸丁氧基乙酯、乙氧基二乙醇(甲基)丙烯酸酯、(甲基)丙烯酸苯甲酯、(甲基)丙烯酸苯氧基乙酯、聚乙二醇單(甲基)丙烯酸酯、聚丙二醇單(甲基)丙烯酸酯、甲氧基乙二醇(甲基)丙烯酸酯、(甲基)丙烯酸乙氧基乙酯、甲氧基聚乙二醇(甲基)丙烯酸酯、甲氧基聚丙二醇(甲基)丙烯酸酯、二丙酮(甲基)丙烯醯胺、(甲基)丙烯酸β-羧乙酯、鄰苯二甲酸(甲基)丙烯酸酯、(甲基)丙烯酸二甲胺基乙酯、(甲基)丙烯酸二乙胺基乙酯、(甲基)丙烯酸丁基胺甲醯酯、(甲基)丙烯醯胺氟化(甲基)丙烯酸正-異丙酯、(甲基)丙烯酸7-胺基-3,7-二甲基辛酯、三羥甲基丙烷三(甲基)丙烯酸酯、(甲基)丙烯酸異戊四醇酯、二(甲基)丙烯酸乙二醇酯、雙酚A二縮水甘油醚二(甲基)丙烯酸酯、二環戊二烯二甲醇二(甲基)丙烯酸酯、[2-[1,1-二甲基-2-[(1-側氧基烯丙基)氧基]乙基]-5-乙基-1,3-二噁烷-5-基] 甲基丙烯酸酯;3,9-雙(1,1-二甲基-2-羥乙基)-2,4,8,10-四氧雜螺[5.5-]十一烷二(甲基)丙烯酸酯;二異戊四醇單羥基五(甲基)丙烯酸酯、丙氧基化三羥甲基丙烷(甲基)丙烯酸酯、丙氧基化新戊二醇二(甲基)丙烯酸酯、四乙二醇二(甲基)丙烯酸酯、聚乙二醇二(甲基)丙烯酸酯、1,4-丁二醇二(甲基)丙烯酸酯、1,6-己二醇二(甲基)丙烯酸酯、新戊二醇二(甲基)丙烯酸酯、聚丁二醇二(甲基)丙烯酸酯、三丙二醇二(甲基)丙烯酸酯、三(甲基)丙烯酸甘油酯、磷酸單(甲基)丙烯酸酯及二(甲基)丙烯酸酯、二(甲基)丙烯酸C7-C20烷基酯、三(2-羥乙基)異氰尿酸酯三(甲基)丙烯酸酯、三(2-羥乙基)異氰尿酸酯二(甲基)丙烯酸酯、三環癸烷二基二甲基二(甲基)丙烯酸酯及其烷氧基化(例如乙氧基化及/或丙氧基化)型式,及三乙二醇二乙烯醚、丙烯酸羥乙酯之加合物及其組合。 在其他實施例中,丙烯酸酯單體為可包括所有甲基丙烯醯基、所有丙烯醯基或甲基丙烯醯基及丙烯醯基之任何組合的多官能性(甲基)丙烯酸酯。在一個實施例中,丙烯酸酯單體係選自丙氧基化三羥甲基丙烷三(甲基)丙烯酸酯、及丙氧基化新戊二醇二(甲基)丙烯酸酯及其組合。 在其他實施例中,丙烯酸酯單體具有大於2個、大於3個或大於4個官能團。或者,丙烯酸酯單體可恰好具有1、2、3、4、5、6、7、8、9或10個官能團。在一個實施例中,丙烯酸酯單體僅由單一多官能性(甲基)丙烯酸酯組分組成。在其他實施例中,丙烯酸酯單體係選自二環戊二烯二甲醇二丙烯酸酯、[2-[1,1-二甲基-2-[(1-側氧基烯丙基)氧基]乙基]-5-乙基-1,3-二噁烷-5-基]甲基丙烯酸酯、丙氧基化三羥甲基丙烷三丙烯酸酯及丙氧基化新戊二醇二丙烯酸酯,及其組合。在各種非限制性實施例中,特此明確地涵蓋上述值之間的所有值及值範圍。 或者,丙烯酸酯單體可為二環戊二烯二甲醇二(甲基)丙烯酸酯、丙氧基化三羥甲基丙烷三(甲基)丙烯酸酯及/或丙氧基化新戊二醇二(甲基)丙烯酸酯,且更特定言之,二環戊二烯二甲醇二丙烯酸酯、丙氧基化三羥甲基丙烷三丙烯酸酯及/或丙氧基化新戊二醇二丙烯酸酯中之一或多者。 可單獨或以兩種或大於兩種之組合使用上文所提及之丙烯酸酯單體。分散液可包括任何適合量之丙烯酸酯單體,只要二氧化矽以按分散液及自由基引發劑之總體積計55至70體積百分比之量存在且剪切稀化添加劑亦存在於分散液中即可。 在各種實施例中,自由基可固化單體經另外定義為(甲基)丙烯酸酯單體,其可為具有至少一個丙烯酸酯官能團及/或至少一個甲基丙烯酸酯官能團之任何單體。換言之,術語「(甲基)」描述「甲基」係視情況存在且非必需。因此,單體可為「丙烯酸酯」單體(無甲基)或包括甲基之「甲基丙烯酸酯」單體。典型的是本文所用之(甲基)丙烯酸酯單體為選自脂族丙烯酸酯、脂族甲基丙烯酸酯、環脂族丙烯酸酯、環脂族甲基丙烯酸酯及其組合之群的化合物。應理解,化合物、脂族丙烯酸酯、脂族甲基丙烯酸酯、環脂族丙烯酸酯及環脂族甲基丙烯酸酯中之每一者包括烷基。此等化合物中之烷基可包括至多20個碳原子。 可選擇為(甲基)丙烯酸酯單體中之一者的脂族丙烯酸酯係選自由以下組成之群:丙烯酸甲酯、丙烯酸乙酯、丙烯酸丙酯、丙烯酸正丁酯、丙烯酸異丁酯、丙烯酸叔丁酯、丙烯酸己酯、丙烯酸2-乙基己酯、丙烯酸異辛酯、丙烯酸異壬酯、丙烯酸異戊酯、丙烯酸十三烷酯、丙烯酸硬脂酯、丙烯酸月桂酯及其混合物。可選擇為(甲基)丙烯酸酯單體中之一者的脂族甲基丙烯酸酯係選自由以下組成之群:甲基丙烯酸甲酯、甲基丙烯酸乙酯、甲基丙烯酸丙酯、甲基丙烯酸正丁酯、甲基丙烯酸異丁酯、甲基丙烯酸第三丁酯、甲基丙烯酸己酯、甲基丙烯酸2-乙基己酯、甲基丙烯酸異辛酯、甲基丙烯酸異壬酯、甲基丙烯酸異戊酯、甲基丙烯酸十三烷酯、甲基丙烯酸硬脂酯、甲基丙烯酸月桂酯及其混合物。可選擇為(甲基)丙烯酸酯單體中之一者的環脂族丙烯酸酯為丙烯酸環己酯,且可選擇為(甲基)丙烯酸酯單體中之一者的環脂族甲基丙烯酸酯為甲基丙烯酸環己酯。 在各種實施例中,丙烯酸酯單體以大於零且至多分散液之約40體積%之量存在。在其他實施例中,丙烯酸酯單體以按分散液之總體積重量計2至40、5至40、5至35、5至30、10至30、10至25、10至20、15至30、15至25、15至20或1、2、3、4或5體積百分比之量存在。在各種非限制性實施例中,特此明確地涵蓋上述值之間的所有值及值範圍。 亦可使用不為丙烯酸酯之自由基可固化單體。此等單體可包括此項技術中已知之任何單體,諸如包括碳-碳雙鍵(例如烯系不飽和化合物)、碳-碳三鍵及/或任何其他可經由自由基聚合機制聚合之化合物之彼等。在各種替代實施例中,分散液不含不為(甲基)丙烯酸酯之單體。二氧化矽 :
分散液亦包括二氧化矽。二氧化矽為分散於上文所述之連續相中之分散相。舉例而言,二氧化矽粒子可分散於丙烯酸酯單體中,該單體通常為液體或液體樣。二氧化矽以按分散液之總體積計55至70體積百分比之量存在。在各種實施例中,二氧化矽以按分散液之總體積計的55、56、57、58、59、60、61、62、63、64、65、66、67、68、69或70體積百分比存在。在各種非限制性實施例中,特此明確地涵蓋上述值之間的所有值及值範圍。 在各種實施例中,二氧化矽另外定義為二氧化矽粒子,例如微米粒子及/或奈米粒子。舉例而言,二氧化矽(粒子)可為90、95、99或大致100重量%的微米粒子、奈米粒子或微米粒子及奈米粒子之組合。奈米粒子可描述為平均粒度在1奈米(nm)至999 nm之間的彼等粒子。微米粒子可替代地描述為平均粒度為1微米(µm)至999 µm之彼等粒子。在各種實施例中,二氧化矽具有介於0.04微米至90微米範圍之粒度(分佈)。在各種實施例中,二氧化矽之粒度為1微米至90微米且包括5、4、3、2、1、0.5、0.1、0.05或0.01重量或體積百分比或更少的粒度為10奈米至999奈米之奈米粒子。在各種非限制性實施例中,特此明確地涵蓋所有上述值之間的所有值及值範圍(包括端點)以供使用。 在各種實施例中,二氧化矽包含粒度為1至90微米之微米粒子及粒度為10至500奈米之奈米粒子之組合,微米粒子:奈米粒子之平均粒度比率為1:2至1:200。在其他實施例中,二氧化矽包含粒度為1至90微米之微米粒子及粒度為10至1000奈米之奈米粒子之組合,微米粒子:奈米粒子之平均粒度比率為1:2至1:200。在其他非限制性實施例中,此等比率可反轉。在各種非限制性實施例中,特此明確地涵蓋1與90微米、10與500奈米以及1:2與1:200之間的所有值及值範圍(包括端點)以供使用。 或者,奈米粒子可描述為平均粒度在1奈米(nm)至999 nm之間的彼等粒子。微米粒子可替代地描述為平均粒度為1微米(µm)至999 µm之彼等粒子。在各種實施例中,二氧化矽具有介於0.04微米至90微米範圍之粒度(分佈)。在各種非限制性實施例中,特此明確地涵蓋所有上述值之間的所有值及值範圍(包括端點)以供使用。 可根據ISO13320:2009使用雷射繞射粒度分析來量測粒度。用於量測奈米粒子之平均粒徑的適合裝置為購自Horiba Instruments, Inc之LB-550機器,其藉由動態光散射量測粒徑。在各種非限制性實施例中,特此明確地涵蓋上述值之間的所有值及值範圍。 二氧化矽可包括大於85重量%、90重量%或95重量%之二氧化矽(SiO2
)。市售二氧化矽之某些非限制性實例包括Crystallite 3K-S、Crystallite NX-7、Crystallite MCC-4、Crystallite CMC-12、Crystallite A-1、Crystallite AA、Crystallite C、Crystallite D、Crystallite CMC-1、Crystallite C-66、Crystallite 5X、Crystallite 2A-2、Crystallite VX-S2、Crystallite VX-SR、Crystallite VX-X、Crystallite VX-S、Huselex RD-8、Huselex RD-120、Huselex MCF-4、Huselex GP-200T、Huselex ZA-30、Huselex RD-8、Huselex Y-40、Huselex E-2、Huselex Y-60、Huselex E-1、Huselex E-2、Huselex FF、Huselex X、Huselex ZA-20、IMSIL A-25、IMSIL A-15、IMSIL A-10及IMSIL A-8 (Ryushin Co., Ltd.);ORGANOSILICASOL MEK-EC-2102、Organosilicasol MEK-EC-2104、Organosilicasol MEK-AC-2202、Organosilicasol MEK-AC-4101、Organosilicasol MEK-AC-5101、Organosilicasol MIBK-SD、Organosilicasol MIBK-SD-L、Organosilicasol DMAC-ST、Organosilicasol EG-ST、Organosilicasol IPA-ST、Organosilicasol IPA-ST-L、Organosilicasol IPA-ST-L-UP、Organosilicasol IPA-ST-ZL、Organosilicasol MA-ST-M、Organosilicasol MEK-ST、Organosilicasol MEK-ST-L、Organosilicasol MEK-ST-UP、Organosilicasol MIBK-ST、Organosilicasol MT-ST、Organosilicasol NPC-ST-30、Organosilicasol PMA-ST、Sunsphere H-31、Sunsphere H-32、Sunsphere H-51、Sunsphere H-52、Sunsphere H-121、Sunsphere H-122、Sunsphere L-31、Sunsphere L-51、Sunsphere L-121、Sunsphere NP-30、Sunsphere NP-100及Sunsphere NP-200 (Asahi Glass Co., Ltd.);Silstar MK-08及MK-15 (Nippon Chemical Industrial Co., Ltd.);FB-48 (Denki Kagaku Kogyo K.K.);Nipsil SS-10、Nipsi:L SS-15、Nipsil SS-10A、Nipsil SS-20、Nipsil SS-30P、Nipsil SS-30S、Nipsil SS-40、Nipsil SS-50、Nipsil SS-50A、Nipsil SS-70、Nipsil SS-100、Nipsil SS-10F、Nipsil SS-50F、Nipsil SS-50B、Nipsil SS-50C、Nipsil SS-72F、Nipsil SS-170X、Nipsil SS-178B、Nipsil E150K、Nipsil E-150J、Nipsil E-1030、Nipsil ST-4、Nipsil E-170、Nipsil E-200、Nipsil E-220、Nipsil E-200A、Nipsil E-1009、Nipsil E-220A、Nipsil E-1011、Nipsil E-K300、Nipsil HD、Nipsil HD-2、Nipsil N-300A、Nipsil L-250、Nipsil G-300、Nipsil E-75、Nipsil E-743及Nipsil E-74P (Nippon Silica Industry, Ltd.)。在其他實施例中,二氧化矽為如美國專利第6,013,714號中所述,其在與二氧化矽相關之各種非限制性實施例中明確以引用之方式併入本文中。 二氧化矽可用矽烷偶合劑表面處理。可用於此目的之矽烷偶合劑包括乙烯基三氯矽烷、乙烯基參(β-甲氧基乙氧基)矽烷、乙烯基三乙氧基矽烷、乙烯基三甲氧基矽烷、γ-(甲基丙烯醯氧基丙基)三甲氧基矽烷、β-(3,4-環氧環己基)乙基三甲氧基矽烷、γ-甘胺醯氧基丙基三甲氧基矽烷、γ-甘胺醯氧基丙基甲基二乙氧基矽烷、N-β(胺乙基)胺丙基三甲氧基矽烷、N-β-(胺乙基)-γ-胺基丙基甲基二甲氧基矽烷、γ-胺基丙基三乙氧基矽烷、N-苯基-γ-胺基丙基三甲氧基矽烷、γ-巰基丙基三甲氧基矽烷及γ-氯丙基三甲氧基矽烷。 在各種實施例中,適合於打印100 µm層之典型二氧化矽調配物闡述於下表中。
20‧‧‧沉澱物20‧‧ ‧ sediment
25‧‧‧最頂層;金屬粒子25‧‧‧ top layer; metal particles
30‧‧‧分散液30‧‧‧Dispersion
本發明之其他優勢將易於瞭解,因為在結合隨附圖式考慮時參考以下實施方式將更好地理解該等優勢,在該等隨附圖式中: 圖1A為用於離心機中之試管的透視圖,其顯示沉積物、金屬粒子及一定量的未自其傾析之連續相。 圖1B為用於離心機中之試管的透視圖,其顯示沉積物、金屬粒子及自其傾析之連續相。 圖2A為呈總分散液高度之百分比之沉澱物高度之量測結果的相片。 圖2B為隨離心時間而變的沉積物管柱高度之線圖。 圖3A為隨離心時間而變的沉降高度之第二線圖。 圖3B為使分散液在不離心之情況下沉降的隨時間而變之沉降高度之線圖。 圖4A為顯示隨重複而變的沉降高度之條形圖。 圖4B為圖4A之放大圖。 圖4C為顯示隨重複而變的沉澱物質量之條形圖。Other advantages of the present invention will be readily appreciated, as the advantages will be better understood by reference to the following embodiments in conjunction with the accompanying drawings in which: Figure 1A is a test tube for use in a centrifuge A perspective view showing deposits, metal particles and a certain amount of continuous phase not decanted therefrom. Figure 1B is a perspective view of a test tube for use in a centrifuge showing deposits, metal particles, and a continuous phase decanted therefrom. Figure 2A is a photograph of the measurement of the height of the precipitate as a percentage of the total dispersion height. Figure 2B is a line graph of the height of the sediment string as a function of centrifugation time. Figure 3A is a second line graph of settling height as a function of centrifugation time. Figure 3B is a line graph of the settling height over time as the dispersion settles without centrifugation. Figure 4A is a bar graph showing the settling height as a function of repetition. Fig. 4B is an enlarged view of Fig. 4A. Figure 4C is a bar graph showing the mass of the precipitate as a function of repetition.
Claims (15)
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US201662436806P | 2016-12-20 | 2016-12-20 | |
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US4093017A (en) | 1975-12-29 | 1978-06-06 | Sherwood Refractories, Inc. | Cores for investment casting process |
US5665792A (en) | 1995-06-07 | 1997-09-09 | E. I. Du Pont De Nemours And Company | Stabilizers for use with photoacid precursor formulations |
WO1998006560A1 (en) * | 1996-08-08 | 1998-02-19 | Sri International | Apparatus for automated fabrication of three-dimensional objects, and associated methods of use |
JPH1087963A (en) | 1996-09-20 | 1998-04-07 | Japan Synthetic Rubber Co Ltd | Resin composition and mold for forming fibrous material |
EP0998696A2 (en) | 1997-07-21 | 2000-05-10 | Ciba SC Holding AG | Viscosity stabilization of radiation-curable filled compositions |
KR20160112495A (en) * | 2015-03-19 | 2016-09-28 | 한국과학기술연구원 | Ink Compositions for a Powder Bed and Inkjet Head-Based 3D Printer |
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