TW201819564A - OLED package tape, method for producing the same and using the same for packaging OLED - Google Patents

OLED package tape, method for producing the same and using the same for packaging OLED Download PDF

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TW201819564A
TW201819564A TW105138421A TW105138421A TW201819564A TW 201819564 A TW201819564 A TW 201819564A TW 105138421 A TW105138421 A TW 105138421A TW 105138421 A TW105138421 A TW 105138421A TW 201819564 A TW201819564 A TW 201819564A
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oled
film
phr
barrier layer
epoxy resin
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TW105138421A
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TWI593778B (en
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鄭憲徽
伍得
顏銘佑
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武漢市三選科技有限公司
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Abstract

The present invention is an OLED package tape, comprising a first releasing film and a moisture barrier layer, wherein the moisture barrier layer is formed on the releasing side of the first releasing film and comprises modified nano-monmorillonite and epoxy resin. The OLED package tape of the present invention not only blocks water vapor and oxygen effectively, but also provides characteristics of high mechanical strength, high thermal stability, gas barrier and solvent resistance, for proving the efficacy of packaging OLED and elongating the service life of OLED.

Description

OLED封裝用膠片及其製造方法及使用其之封裝OLED方法  Film for OLED packaging, manufacturing method thereof and packaged OLED method using same  

本發明係關於一種OLED封裝用膠片,其可用於封裝OLED,特別係半導體裝置。 The present invention relates to a film for OLED packaging that can be used to package OLEDs, particularly semiconductor devices.

OLED(Organic Light Emitting Diode)因具有發光率高、亮度高、寬視角及螢幕反應速度快等優點,早已取代傳統CRT顯示器,作為顯示器之發光裝置,例如行動電話、電腦監視器、電視螢幕、其他手持裝置、或用於顯示資訊之其他裝置。 OLED (Organic Light Emitting Diode) has long replaced the traditional CRT display because of its high luminous efficiency, high brightness, wide viewing angle and fast screen response. It is used as a lighting device for displays, such as mobile phones, computer monitors, TV screens, and others. Handheld device, or other device used to display information.

現今,OLED產業一直致力於發展OLED之封裝技術。由於OLED的封裝良好與否,往往是影響OLED內部性能及使用壽命之關鍵因素,不佳的封裝會造成水氣及氧氣進入到OLED內部,產生電極氧化、發光層剝離或材質裂解等問題。 Today, the OLED industry has been committed to the development of OLED packaging technology. Due to the good packaging of OLED, it is often a key factor affecting the internal performance and service life of OLED. Poor packaging will cause moisture and oxygen to enter the OLED, causing problems such as electrode oxidation, delamination or material cracking.

常見的OLED封裝方法,包含UV膠和填充膠封裝、玻璃膠封裝或乾燥劑封裝等,其中,以UV膠和填充膠封裝最為常見。然而,使用UV膠和填充膠封裝時,由於液態填充膠具黏稠性,常常在倒入至密封條時會產生不易排除的氣泡存留於封裝層中,致使封裝層內有存留氣泡,而氣泡中存有水氣及氧氣,進而影響OLED效能及生命。 Common OLED packaging methods, including UV glue and filler package, glass glue package or desiccant package, etc., which are most commonly used in UV glue and filler. However, when using UV glue and filling glue, due to the viscosity of the liquid filling glue, bubbles that are difficult to be removed are often stored in the encapsulation layer when poured into the sealing strip, so that there are bubbles remaining in the encapsulating layer, and in the bubbles There are moisture and oxygen, which affects the performance and life of the OLED.

另外,也有使用乾燥劑搭配UV膠和填充膠來封裝,以解決氣泡中水氣及氧氣之問題,但部份的乾燥劑填充後帶有腐蝕性,造成OLED內材質裂解,特別係液態乾燥劑。 In addition, there is also a desiccant with UV glue and filler to package to solve the problem of water vapor and oxygen in the bubble, but some of the desiccant is corrosive after filling, causing cracking of the material in the OLED, especially the liquid desiccant. .

鑒於上述通用之OLED封裝方法會有產生氣泡等封裝效果不佳之問題,本發明者欲提供一種OLED封裝用膠片,其可直接貼覆於欲封裝的OLED後,經UV光硬化及/或熱硬化即完成封裝,並有效改善封裝有氣泡殘存之問題。 In view of the above-mentioned general OLED packaging method, there is a problem that packaging effect such as bubble generation is not good, and the inventors intend to provide a film for OLED packaging which can be directly attached to an OLED to be packaged, and then cured by UV light and/or thermally hardened. That is, the package is completed, and the problem of residual bubbles in the package is effectively improved.

由於本發明之OLED封裝用膠片包含一水氣阻隔層,該水氣阻隔層之材質為改質奈米蒙脫土,其除了具疏水性能有效阻絕水氣之外,還具有高機械強度、高熱穩定性、阻氣及阻溶劑之性質,提升OLED封裝之效能,延長OLED使用壽命。 Since the film for OLED encapsulation of the present invention comprises a water vapor barrier layer, the material of the water vapor barrier layer is modified nano montmorillonite, which has high hydrophobicity and high heat in addition to hydrophobic properties to effectively block moisture. The stability, gas barrier and solvent resistance properties enhance the performance of OLED packages and extend the life of OLEDs.

即,本發明提供一種OLED封裝用膠片,包括一第一離形片及一水氣阻絕層,該水氣阻絕層係形成於該第一離形片之可剝離面上,其中該水氣阻絕層包含改質奈米蒙脫土及環氧樹脂。 That is, the present invention provides a film for OLED packaging, comprising a first release sheet and a moisture barrier layer, the moisture barrier layer being formed on the peelable surface of the first release sheet, wherein the moisture resists The layer contains modified nano montmorillonite and epoxy resin.

於較佳實施例中,該改質奈米蒙脫土係經聚醚胺改質。 In a preferred embodiment, the modified nano-montmorillonite is modified with polyetheramine.

於較佳實施例中,該聚醚胺之分子量為200至5000,並具有如下式(I)之重複單元: 其中n為2至50之整數。 In a preferred embodiment, the polyetheramine has a molecular weight of from 200 to 5,000 and has repeating units of the following formula (I): Wherein n is an integer from 2 to 50.

於較佳實施例中,該改質奈米蒙脫土之添加量為以100wt% 計之環氧樹脂,添加1~10phr。 In a preferred embodiment, the modified nano montmorillonite is added in an amount of 100% by weight of the epoxy resin, and 1 to 10 phr is added.

於較佳實施例中,該水氣阻絕層之相對於該第一離形片之一側進一步包含一第二離形片。 In a preferred embodiment, the moisture barrier layer further comprises a second release sheet on a side of the first release sheet.

本發明提供一種製備上述之OLED封裝用膠片之方法,其包含下列步驟:(a)提供一第一離形片;(b)混合改質奈米蒙脫土及環氧樹脂,獲得一環氧樹脂-改質奈米蒙脫土漿液;(c)將該環氧樹脂-改質奈米蒙脫土漿液塗覆於該第一離形片之可剝離面上,形成一濕膜,並烘烤形成一水氣阻絕層。 The invention provides a method for preparing the above-mentioned film for OLED packaging, which comprises the following steps: (a) providing a first release sheet; (b) mixing modified nano montmorillonite and epoxy resin to obtain an epoxy a resin-modified nano montmorillonite slurry; (c) applying the epoxy resin-modified nano montmorillonite slurry to the peelable surface of the first release sheet to form a wet film and baking Bake to form a moisture barrier.

於較佳實施例中,該烘烤條件之溫度為70~120℃,時間為5~12分鐘。 In a preferred embodiment, the baking conditions are at a temperature of from 70 to 120 ° C for a period of from 5 to 12 minutes.

於較佳實施例中,進一步包含將一第二離形片之可剝離面附於該水氣阻絕層上。 In a preferred embodiment, the method further comprises attaching a peelable surface of a second release sheet to the moisture barrier layer.

本發明提供一種封裝OLED之方法,包含上述之OLED封裝用膠片,以水氣阻絕層貼覆於一第一基板上之OLED元件上,撕除該離形片,並將一第二基板貼覆於該水氣阻絕層上,再經UV光硬化及/或熱硬化。 The invention provides a method for packaging an OLED, comprising the above OLED packaging film, which is attached with a moisture barrier layer on an OLED component on a first substrate, tearing off the release sheet, and attaching a second substrate. On the moisture barrier layer, it is cured by UV light and/or thermally cured.

本發明提供一種經封裝之OLED,其係經請求項9之封裝所得。 The present invention provides a packaged OLED obtained by encapsulation of claim 9.

1‧‧‧OLED封裝膠片 1‧‧‧OLED packaging film

1’‧‧‧OLED封裝膠片 1'‧‧‧OLED packaging film

3‧‧‧水氣阻隔層 3‧‧‧Water and gas barrier

5‧‧‧第一離形片 5‧‧‧The first release piece

5’‧‧‧第二離形片 5'‧‧‧Second release piece

7‧‧‧環氧樹脂-改質奈米蒙脫土漿液 7‧‧‧Epoxy resin-modified nano-montmorillonite slurry

7’‧‧‧濕膜 7'‧‧‧ wet film

9‧‧‧改質奈米蒙脫土 9‧‧‧Modified Nano-montmorillonite

11‧‧‧環氧樹脂 11‧‧‧Epoxy resin

13‧‧‧第一基板 13‧‧‧First substrate

13’‧‧‧第二基板 13'‧‧‧second substrate

15‧‧‧OLED 15‧‧‧OLED

圖1為本發明之OLED封裝用膠片示意圖1。 1 is a schematic view 1 of a film for OLED packaging according to the present invention.

圖2為本發明之OLED封裝用膠片示意圖2。 2 is a schematic view 2 of a film for OLED packaging according to the present invention.

圖3為本發明之製備OLED封裝用膠片之方法流程圖。 3 is a flow chart of a method for preparing a film for OLED packaging according to the present invention.

圖4為本發明之封裝OLED之方法流程圖。 4 is a flow chart of a method of packaging an OLED of the present invention.

圖5為本發明之OLED封裝用膠片經預先切割所需形狀示意圖。 FIG. 5 is a schematic view showing the shape required for pre-cutting the film for OLED packaging of the present invention.

本發明之OLED封裝用膠片,其包括一第一離形片及一水氣阻絕層,該水氣阻絕層係形成於該第一離形片之可剝離面上,其中該水氣阻絕層包含改質奈米蒙脫土及環氧樹脂;其實例如圖1所示,OLED封裝用膠片1包括一第一離形片5及一水氣阻絕層3,該水氣阻絕層3係形成於該第一離形片5之可剝離面上。 The OLED encapsulating film of the present invention comprises a first release sheet and a moisture barrier layer formed on the peelable surface of the first release sheet, wherein the moisture barrier layer comprises Modified nano montmorillonite and epoxy resin; in fact, as shown in FIG. 1, the film 1 for OLED packaging includes a first release sheet 5 and a moisture barrier layer 3, and the moisture barrier layer 3 is formed thereon. The peelable surface of the first release sheet 5.

上述之改質奈米蒙脫土係可經聚醚胺、聚醯胺醯亞胺、聚亞醯胺等具有胺基之聚合物改質。其中,該改質奈米蒙脫土之奈米蒙脫土可使用鈉基奈米蒙脫土或鋰基奈米蒙脫土。該改質之方法係利用陽離子交換法,將奈米蒙脫土之陽離子置換為具有胺基之聚合物,如以下反應式所示(MMT為蒙脫土,陽離子可為Na+或Li+):MMT-陽離子+聚合物-NH3 +→MMT-NH3 +-聚合物+陽離子。 The above-mentioned modified nano montmorillonite system can be modified by an amine group-containing polymer such as polyetheramine, polyamidolimine or polyamidamine. Among them, the modified nano-montmorillonite can be used for sodium montmorillonite or lithium-based nano-montmorillonite. The modification method uses a cation exchange method to replace the cation of the nano montmorillonite with a polymer having an amine group, as shown by the following reaction formula (MMT is montmorillonite, and the cation may be Na + or Li + ). : MMT-cation + polymer - NH 3 + → MMT-NH 3 + - polymer + cation.

其中,上述之改質奈米蒙脫土以聚醚胺改質為佳,該聚醚胺可為具有如下式(I)之重複單元,其分子量為200至5000: 其中n為2至50之整數,例如2、3、5、6、10、15、20、25、30、33、35、40、45或50。 Wherein, the above-mentioned modified nano montmorillonite is preferably modified with polyetheramine, and the polyetheramine may be a repeating unit having the following formula (I), and the molecular weight thereof is 200 to 5000: Wherein n is an integer from 2 to 50, such as 2, 3, 5, 6, 10, 15, 20, 25, 30, 33, 35, 40, 45 or 50.

其中,上述之改質之奈米蒙脫土之奈米蒙脫土的粒徑大小可為1~1000nm,例如1nm、5nm、10nm、30nm、50nm、100nm、150nm、 200nm、250nm、300nm、350nm、400nm、450nm、500nm、550nm、600nm、650nm、700nm、750nm、800nm、850nm、900nm、950nm或1000nm。 The nanometer montmorillonite of the modified nano-montmorillonite may have a particle size of 1 to 1000 nm, for example, 1 nm, 5 nm, 10 nm, 30 nm, 50 nm, 100 nm, 150 nm, 200 nm, 250 nm, 300 nm, 350 nm. 400 nm, 450 nm, 500 nm, 550 nm, 600 nm, 650 nm, 700 nm, 750 nm, 800 nm, 850 nm, 900 nm, 950 nm or 1000 nm.

上述之改質奈米蒙脫土之添加量為以100wt%計之環氧樹脂,添加1~10phr,例如1phr、1.5phr、2phr、2.5phr、3phr、3.5phr、4phr、4.5phr、5phr、5.5phr、6phr、6.5phr、7pbr、7.5phr、8phr、8.5phr、9phr、9.5phr或10phr The modified nano montmorillonite is added in an amount of 100% by weight of the epoxy resin, and is added in an amount of 1 to 10 phr, for example, 1 phr, 1.5 phr, 2 phr, 2.5 phr, 3 phr, 3.5 phr, 4 phr, 4.5 phr, 5 phr, 5.5 phr, 6 phr, 6.5 phr, 7 pbr, 7.5 phr, 8 phr, 8.5 phr, 9 phr, 9.5 phr or 10 phr

上述之環氧樹脂可為通用之環氧樹脂,例如三環氧丙基異氰脲酸酯、丁二烯-丙烯腈環氧樹脂、苯氧基樹脂、雙酚A型環氧樹脂、溴化環氧樹脂、酚醛清漆型環氧樹脂、雙酚F型環氧樹脂、氫化雙酚A型環氧樹脂、縮水甘油基胺型環氧樹脂、乙內醯脲型環氧樹脂、脂環式環氧樹脂、三羥基苯基甲烷型環氧樹脂、雙-二甲酚型或雙酚型環氧樹脂或該些之混合物、雙酚S型環氧樹脂、雙酚A酚醛清漆型環氧樹脂、四苯基酚醇(PHENYLOL)乙烷型環氧樹脂、雜環式環氧樹脂、二縮水甘油基苯甲酸脂樹脂、四縮水甘油基二甲酚基乙烷樹脂、含有萘基之環氧樹脂、含氮之環氧樹脂、具有二環戊二烯骨架之環氧樹脂、縮水甘油基甲基丙烯酸酯共聚合系環氧樹脂、環己基馬來醯亞胺與縮水甘油基甲基丙烯酸酯之共聚合環氧樹脂、CTBN改質環氧樹脂等,但不侷限於此等,該些環氧樹脂可單獨使用或者將2種以上組合使用。 The above epoxy resin may be a general-purpose epoxy resin such as triethoxypropyl isocyanurate, butadiene-acrylonitrile epoxy resin, phenoxy resin, bisphenol A epoxy resin, bromination Epoxy resin, novolak type epoxy resin, bisphenol F type epoxy resin, hydrogenated bisphenol A type epoxy resin, glycidyl amine type epoxy resin, ethyl urex type epoxy resin, alicyclic ring Oxygen resin, trishydroxyphenylmethane type epoxy resin, bis-xylenol type or bisphenol type epoxy resin or a mixture thereof, bisphenol S type epoxy resin, bisphenol A novolak type epoxy resin, Tetraphenylphenol (PHENYLOL) ethane type epoxy resin, heterocyclic epoxy resin, diglycidyl benzoate resin, tetraglycidyl xylenyl ethane resin, epoxy resin containing naphthyl , nitrogen-containing epoxy resin, epoxy resin having a dicyclopentadiene skeleton, glycidyl methacrylate copolymerized epoxy resin, cyclohexylmaleimide and glycidyl methacrylate Copolymerized epoxy resin, CTBN modified epoxy resin, etc., but not limited to these, the epoxy trees It may be used alone or in combination of two or more.

上述之水氣阻隔層可添加通用之光起始劑,包含鎓鹽類、有機金屬鹽類、有機矽烷類、潛在磺酸類、二苯甲酮類、安息香醚類、苄基縮酮類、苯乙酮類、噻吨酮類或蒽醌類等,但不侷限於此等,例如二芳基 碘鎓鹽、三芳基鋶鹽、芳基重氮鹽、鐵芳烴、磷硝基苯甲基三芳基矽基醚、過氧化三芳基矽基、醯基矽烷、α-磺醯氧基酮、α-羥基甲基安息香磺酸酯、二苯甲酮、N,N'-四甲基-4,4'-二胺基二苯甲酮、N,N'-四乙基-4,4'-二胺基二苯甲酮、安息香甲醚、安息香乙醚、安息香丙醚、安息香異丁醚、安息香苯醚、異丙基噻吨酮、2-氯基噻吨酮、2,4-二甲基噻噸酮、2,4-二異丙基噻噸酮、2-乙基蒽醌等,該些光起始劑可單獨使用或者將2種以上組合使用;該光起始劑之添加量為以100wt%計之環氧樹脂,添加1~10phr,例如1phr、1.5phr、2phr、2.5phr、3phr、3.5phr、4phr、4.5phr、5phr、5.5phr、6phr、6.5phr、7phr、7.5phr、8phr、8.5phr、9phr、9.5phr或10phr。 The above-mentioned water gas barrier layer may be added with a common photoinitiator, including barium salts, organic metal salts, organic decanes, latent sulfonic acids, benzophenones, benzoin ethers, benzyl ketals, benzene. But not limited to, such as diaryl iodonium salts, triaryl sulfonium salts, aryl diazonium salts, iron aromatic hydrocarbons, phosphorus nitrobenzyl triaryl Base mercapto ether, triarylsulfonyl peroxide, mercaptodecane, α-sulfonyloxy ketone, α-hydroxymethylbenzoin sulfonate, benzophenone, N,N'-tetramethyl-4, 4'-Diaminobenzophenone, N,N'-tetraethyl-4,4'-diaminobenzophenone, benzoin methyl ether, benzoin ethyl ether, benzoin propyl ether, benzoin isobutyl ether, benzoin Phenyl ether, isopropyl thioxanthone, 2-chlorothioxanthone, 2,4-dimethylthioxanthone, 2,4-diisopropylthioxanthone, 2-ethylhydrazine, etc. The photoinitiators may be used singly or in combination of two or more; the photoinitiator is added in an amount of 100% by weight of the epoxy resin, and added in an amount of 1 to 10 phr, for example, 1 phr, 1.5 phr, 2 phr, 2.5 phr, 3phr, 3.5phr, 4phr, 4.5phr, 5phr, 5 .5 phr, 6 phr, 6.5 phr, 7 phr, 7.5 phr, 8 phr, 8.5 phr, 9 phr, 9.5 phr or 10 phr.

上述之水氣阻隔層可添加通用之熱硬化劑,包含多胺類、多硫醇類、咪唑類等,但不侷限於此等,例如二亞乙基三胺、三亞乙基四胺、N-氨基-乙基呱嗪、二氨基-二苯基甲烷、己二酸二醯腁、三噁烷三亞甲基硫醇、苄基-二甲胺、2,4,6-三(二甲氨基甲基)苯酚、2-甲基咪唑、2-乙基-4-甲基咪唑、1-苄基-2-甲基咪唑、2-苯基咪唑、2-苯基-4-甲基咪唑、2-十七烷基咪唑、2-苯基-4,5-二羥甲基咪唑、2,4-二胺基-6(2'-甲基咪唑基-(1'))乙基-s-三嗪、2,4-二胺基-6(2'-甲基咪唑基-(1'))乙基-s-三嗪、異氰脲酸、三苯基膦、雙氰胺、3-苯基-1,1-二甲基脲、5-胺基-1-萘酚或8-羥基喹啉等,該熱硬化劑可單獨使用或者將2種以上組合使用;該熱硬化劑之添加量為以100wt%計之環氧樹脂,添加1~10phr,例如1phr、1.5phr、2phr、2.5phr、3phr、3.5phr、4phr、4.5phr、5phr、5.5phr、6phr、6.5phr、7phr、7.5phr、8phr、8.5phr、9phr、9.5phr或10phr。 The above-mentioned water vapor barrier layer may be added with a general thermal hardener, and includes, but is not limited to, polyamines, polythiols, imidazoles, etc., such as diethylenetriamine, triethylenetetramine, N -amino-ethylpyridazine, diamino-diphenylmethane, diammonium adipate, trioxane trimethylene thiol, benzyl-dimethylamine, 2,4,6-tris(dimethylamino) Methyl)phenol, 2-methylimidazole, 2-ethyl-4-methylimidazole, 1-benzyl-2-methylimidazole, 2-phenylimidazole, 2-phenyl-4-methylimidazole, 2-heptadecylimidazole, 2-phenyl-4,5-dimethylolimidazole, 2,4-diamino-6(2'-methylimidazolyl-(1'))ethyl-s -triazine, 2,4-diamino-6(2'-methylimidazolyl-(1'))ethyl-s-triazine, isocyanuric acid, triphenylphosphine, dicyandiamide, 3 -Phenyl-1,1-dimethylurea, 5-amino-1-naphthol or 8-hydroxyquinoline, etc., the thermosetting agent may be used singly or in combination of two or more kinds; The amount added is 100% by weight of epoxy resin, adding 1 to 10 phr, for example 1 phr, 1.5 phr, 2 phr, 2.5 phr, 3 phr, 3.5 phr, 4 phr, 4.5 phr, 5 phr, 5.5 phr, 6 phr, 6.5 phr, 7 phr, 7.5 phr, 8 phr, 8.5 Ph, 9 phr, 9.5 phr or 10 phr.

上述之水氣阻隔層可添加通用之熱硬化促進劑,包含二甲基 脲類或咪唑類等,但不侷限於此等並可單獨或2種以上混合使用;該熱硬化促進劑之添加量為以100wt%計之環氧樹脂,添加1~10phr,例如1phr、1.5phr、2phr、2.5phr、3phr、3.5phr、4phr、4.5phr、5phr、5.5phr、6phr、6.5phr、7phr、7.5phr、8phr、8.5phr、9phr、9.5phr或10phr。 The above-mentioned water vapor barrier layer may be added with a general heat hardening accelerator, and may include dimethylurea or imidazole, but is not limited thereto and may be used alone or in combination of two or more kinds; the amount of the heat hardening accelerator added For 100% by weight of epoxy resin, 1 to 10 phr, for example 1 phr, 1.5 phr, 2 phr, 2.5 phr, 3 phr, 3.5 phr, 4 phr, 4.5 phr, 5 phr, 5.5 phr, 6 phr, 6.5 phr, 7 phr, 7.5 phr are added. , 8 phr, 8.5 phr, 9 phr, 9.5 phr or 10 phr.

上述之水氣阻隔層之厚度可為5~300μm,例如5μm、10μm、15μm、20μm、25μm、30μm、35μm、40μm、45μm、50μm、70μm、100μm、130μm、150μm、180μm、200μm、230μm、250μm、280μm或300μm。 The water vapor barrier layer may have a thickness of 5 to 300 μm, for example, 5 μm, 10 μm, 15 μm, 20 μm, 25 μm, 30 μm, 35 μm, 40 μm, 45 μm, 50 μm, 70 μm, 100 μm, 130 μm, 150 μm, 180 μm, 200 μm, 230 μm, 250 μm. , 280 μm or 300 μm.

上述之第一離型片可為捲狀、片裝或膠狀之結構,材質可由下列材料製成之薄膜組成,例如聚乙烯、聚丙烯、聚丁烯、聚丁二烯、聚甲基戊烯、聚乙烯基氯、乙烯基氯共聚物、聚對苯二甲酸乙二醇酯、聚萘二甲酸乙二醇酯、聚對苯二甲酸丁二酸酯、聚胺基甲酸酯、乙烯-乙酸乙烯酯、離子交聯聚合物樹脂、乙烯/(甲烯)丙烯酸共聚物、乙烯/(甲烯)丙烯酸酯共聚物、聚苯乙烯、聚碳酸酯、醋酸纖維素、三醋酸纖維素、聚醯亞胺及含氟樹脂。其中,以聚甲基戊烯、聚萘二甲酸乙二醇酯、三醋酸纖維素及聚醯亞胺薄膜為較佳,原因在於其具較佳耐熱性;該第一離形片具有表面張力400毫牛頓/米或以下,較好為250毫牛頓/米或以下,更佳為150毫牛頓/米或以下,其低表面張力可經由選擇適當材質的片材而達成。離型片1之厚度通常為5~300μm,較好為10~200μm,更佳為20~150μm。 The first release sheet may be in the form of a roll, a sheet or a gel. The material may be composed of a film made of the following materials, such as polyethylene, polypropylene, polybutene, polybutadiene, polymethyl pentane. Alkene, polyvinyl chloride, vinyl chloride copolymer, polyethylene terephthalate, polyethylene naphthalate, polybutylene terephthalate, polyurethane, ethylene - vinyl acetate, ionomer resin, ethylene / (methene) acrylic copolymer, ethylene / (methene) acrylate copolymer, polystyrene, polycarbonate, cellulose acetate, cellulose triacetate, Polyimine and fluorine resin. Among them, polymethylpentene, polyethylene naphthalate, cellulose triacetate and polyimide film are preferred because they have better heat resistance; the first release sheet has surface tension 400 millinewtons/meter or less, preferably 250 millinewtons/meter or less, more preferably 150 millinewtons/meter or less, the low surface tension can be achieved by selecting a sheet of a suitable material. The thickness of the release sheet 1 is usually 5 to 300 μm, preferably 10 to 200 μm, more preferably 20 to 150 μm.

上述之水氣阻絕層相對於該第一離形片之一側進一步包含一第二離形片,如圖2所示之第二離形片5’,該第二離形片之特徵同上述之第一離形片。 The water vapor barrier layer further comprises a second release sheet with respect to one side of the first release sheet, and a second release sheet 5' as shown in FIG. 2, the second release sheet having the same characteristics as described above The first release piece.

本發明之製備如上述之OLED封裝用膠片之方法,其包含下列步驟:(a)提供一第一離形片;(b)混合改質奈米蒙脫土及環氧樹脂,獲得一環氧樹脂-改質奈米蒙脫土漿液;(c)將該環氧樹脂-改質奈米蒙脫土漿液液塗覆於該第一離形片之可剝離面上,形成一濕膜,並烘烤形成一水氣阻絕層;其實例如圖3所示,提供一第一離形片5,混合改質奈米蒙脫土9及環氧樹脂11,獲得一環氧樹脂-改質奈米蒙脫土漿液7,將該環氧樹脂-改質奈米蒙脫土漿液7塗覆於該第一離形片5之可剝離面上,形成一濕膜7’,並烘烤形成一水氣阻絕層3。 The method for preparing a film for OLED packaging according to the present invention comprises the steps of: (a) providing a first release sheet; (b) mixing modified nano montmorillonite and epoxy resin to obtain an epoxy a resin-modified nano montmorillonite slurry; (c) applying the epoxy resin-modified nano montmorillonite slurry to the peelable surface of the first release sheet to form a wet film, and Baking to form a moisture barrier layer; in fact, as shown in FIG. 3, a first release sheet 5 is provided, and the modified modified nano montmorillonite 9 and epoxy resin 11 are mixed to obtain an epoxy resin-modified nanometer. The montmorillonite slurry 7, the epoxy resin-modified nano montmorillonite slurry 7 is applied to the peelable surface of the first release sheet 5 to form a wet film 7', and baked to form a water. Gas barrier layer 3.

上述之方法中,步驟(c)之塗覆可為通用之塗覆方法,例如旋轉塗覆、狹縫塗覆、流延塗覆、輥式塗覆、棒式塗覆或噴墨塗覆,通用之塗覆機,例如塗覆機包含輥刀塗覆機、凹版塗覆機或壓模塗覆機。 In the above method, the coating of the step (c) may be a general coating method such as spin coating, slit coating, cast coating, roll coating, rod coating or inkjet coating, A general coating machine, such as a coater, includes a roll coater, a gravure coater or a die coater.

上述之方法中,該烘烤條件之溫度為70~120℃,時間為5~12分鐘。其中,該溫度可例如70℃、75℃、80℃、85℃、90℃、95℃、100℃、105℃、110℃、115℃或120℃;該時間可例如5分、6分、7分、8分、9分、10分、11分或12分。 In the above method, the baking condition has a temperature of 70 to 120 ° C and a time of 5 to 12 minutes. Wherein, the temperature may be, for example, 70 ° C, 75 ° C, 80 ° C, 85 ° C, 90 ° C, 95 ° C, 100 ° C, 105 ° C, 110 ° C, 115 ° C or 120 ° C; the time may be, for example, 5 minutes, 6 minutes, 7 Points, 8 points, 9 points, 10 points, 11 points or 12 points.

上述之方法中,進一步包含將一第二離形片之可剝離面附於該水氣阻絕層上,該第二離形片之特徵同上述之第一離形片。 In the above method, the method further comprises attaching a peelable surface of a second release sheet to the moisture barrier layer, the second release sheet having the same characteristics as the first release sheet.

本發明之封裝OLED之方法,包含提供上述之OLED封裝用膠片,以水氣阻絕層貼覆於一第一基板上之OLED上,撕除該離形片,並將一第二基板貼覆於該水氣阻絕層上,再經UV光硬化及/或熱硬化;其實例如圖4所示,將OLED封裝用膠片1’先撕除該第二離形片5’後,以水氣阻絕層3貼附於該第一基板13上之OLED15,撕除第一離形片5,並將第二基板13’貼 附於該水氣阻隔層3上,再經UV光硬化及/或熱硬化,即完成封裝。 The method for packaging an OLED of the present invention comprises providing the film for OLED packaging described above, attaching a water vapor barrier layer to an OLED on a first substrate, tearing off the release sheet, and attaching a second substrate to the film. The water vapor barrier layer is further cured by UV light and/or thermally hardened; in fact, as shown in FIG. 4, the OLED encapsulating film 1' is first peeled off the second release sheet 5', and then the water vapor barrier layer is removed. 3 OLED 15 attached to the first substrate 13, tearing off the first release sheet 5, and attaching the second substrate 13' to the moisture barrier layer 3, and then curing by UV light and/or heat hardening That is, the package is completed.

上述之方法中,該OLED封裝用膠片可經預先切割成所需形狀後再使用,例如圖5所示,該水氣阻隔層3可先經過預先切割。 In the above method, the OLED encapsulating film can be used after being pre-cut into a desired shape. For example, as shown in FIG. 5, the moisture barrier layer 3 can be pre-cut.

上述之方法中,該OLED封裝用膠片於貼覆前會先經過預加熱處理,該預加熱溫度約70~100℃(例如70℃、75℃、80℃、85℃、90℃、95℃或100℃),加熱時間為20~60秒(例如20秒、25秒、30秒、35秒、40秒、45秒、50秒、55秒或60秒)。 In the above method, the OLED encapsulating film is preheated before being applied, and the preheating temperature is about 70 to 100 ° C (for example, 70 ° C, 75 ° C, 80 ° C, 85 ° C, 90 ° C, 95 ° C or 100 ° C), heating time is 20 to 60 seconds (for example, 20 seconds, 25 seconds, 30 seconds, 35 seconds, 40 seconds, 45 seconds, 50 seconds, 55 seconds or 60 seconds).

上述之方法中,該UV光硬化之照射波長及時間、以及熱硬化之溫度及時間,會依所使用之光起始劑及熱硬化劑而調整之;一般情況下,該UV光硬化之照射波長約330~400nm(例如330nm、350nm、380nm、或400nm),照射時間約30~60秒(例如30秒、35秒、40秒、45秒、50秒、55秒或60秒),而該熱硬化之溫度及時間分別為110~200℃(例如110℃、130℃、150℃、180℃或200℃)及20分至2.5小時(20分、30分、50分、1小時、2小時或2.5小時)。 In the above method, the irradiation wavelength and time of the UV curing, and the temperature and time of the thermal curing are adjusted according to the photoinitiator and the thermosetting agent to be used; in general, the UV curing is irradiated. The wavelength is about 330~400nm (for example, 330nm, 350nm, 380nm, or 400nm), and the irradiation time is about 30~60 seconds (for example, 30 seconds, 35 seconds, 40 seconds, 45 seconds, 50 seconds, 55 seconds, or 60 seconds), and the The temperature and time of heat hardening are 110~200°C (such as 110°C, 130°C, 150°C, 180°C or 200°C) and 20 minutes to 2.5 hours (20 minutes, 30 minutes, 50 minutes, 1 hour, 2 hours). Or 2.5 hours).

本發明之封裝OLED之方法可設置在有抽氣排氣裝置的環境下進行封裝,其可減少貼覆時封裝環境的空氣氣流阻力,以增加本發明之OLED封裝膠片貼覆至OLED時的密合性。 The method for packaging the OLED of the present invention can be disposed in an environment with an exhausting and exhausting device, which can reduce the airflow resistance of the packaging environment when the coating is applied, so as to increase the density of the OLED packaging film of the present invention when attached to the OLED. Synergy.

本發明之經封裝之OLED,其係使用本發明之OLED封裝用膠片及經上述之OLED封裝方法所得。本發明之經封裝之OLED可用於顯示裝置,例如手機、電腦、電視或大型螢幕等通用之顯示裝置。 The packaged OLED of the present invention is obtained by using the film for OLED packaging of the present invention and the above OLED packaging method. The packaged OLED of the present invention can be used in display devices such as general purpose display devices such as cell phones, computers, televisions, or large screens.

[具體實施例][Specific embodiment]

在下文中,將利用具體實施例特別描寫本發明所揭示之內 容。然而,本發明所揭示之內容不限制於下列範例。 In the following, the contents disclosed in the present invention will be specifically described using specific embodiments. However, the disclosure of the present invention is not limited to the following examples.

製備例. 經改質之奈米蒙脫土D2000/MMTPreparation example. Modified nano-montmorillonite D2000/MMT

將30g鈉基奈米蒙脫土(購自百康奈米科技)溶於90℃的100ml去離水中膨潤四小時,可配製出1.15毫克當量的鈉基奈米蒙脫土水溶液;將14.4g Jeffamine D2000聚醚胺(結構同式(I),n為33)溶於0.26g(1.15毫克當量)鹽酸配製出1.15莫耳的酸化Jeffamine D2000聚醚胺溶液;混合該鈉基奈米蒙脫土水溶液及酸化Jeffamine D2000聚醚胺溶液,使其在溫度為80℃進行陽離子交換反應30分鐘,以得到改質奈米蒙脫土D2000/MMT。 30g of sodium-nano-nine montmorillonite (purchased from Baikang Nai Technology) was dissolved in 100ml of deionized water at 90 ° C for four hours to prepare 1.15 milliequivalent aqueous solution of sodium-nine montmorillonite; 14.4g Jeffamine D2000 polyetheramine (structure of the formula (I), n is 33) is dissolved in 0.26 g (1.15 meq) of hydrochloric acid to prepare a 1.15 mol acidified Jeffamine D2000 polyetheramine solution; mixing the sodium-based montmorillonite The aqueous solution and the acidified Jeffamine D2000 polyetheramine solution were subjected to a cation exchange reaction at a temperature of 80 ° C for 30 minutes to obtain a modified nano montmorillonite D2000/MMT.

實施例1. OLED封裝膠片1Example 1. OLED package film 1

將68g的三環氧丙基異氰脲酸酯(日本日產化學所售TEPIC-S)、24g的環氧基封端的丁二烯-丙烯腈環氧樹脂(美國Emerald Performance Material所售Hypro 1300×44 ETBN)、8g的苯氧基樹脂(日本油墨化學工業株式會社DIC所售H360)、6g的雙氰胺(德國Degussa所售)、雙(二甲脲)化合物(日本SANAPRO公司所售U-CAT 3513N)、光起始劑(日本SANAPRO公司所售CPI-200S)及1g製備例之改質奈米蒙脫土D2000/MMT混合均勻,該混合物即為環氧樹脂-改質奈米蒙脫土漿液。 68 g of triepoxypropyl isocyanurate (TEPIC-S sold by Nissan Chemical Co., Ltd.), 24 g of epoxy-terminated butadiene-acrylonitrile epoxy resin (Hypro 1300× sold by Emerald Performance Material, USA) 44 ETBN), 8 g of phenoxy resin (H360 sold by DIC, Japan Ink Chemical Industry Co., Ltd.), 6 g of dicyandiamide (sold by Degussa, Germany), and bis (dimethylurea) compound (U- sold by SANAPRO, Japan) CAT 3513N), photoinitiator (CPI-200S sold by SANAPRO, Japan) and 1g of modified nano-montmorillonite D2000/MMT of the preparation example are uniformly mixed, and the mixture is epoxy resin-modified nanometer Earth slurry.

將該環氧樹脂-改質奈米蒙脫土漿液精密塗佈至聚對苯二甲酸乙二醇酯之離形片,形成厚度為60μm的濕膜,以連續式烘箱烘烤90℃、10分鐘,且可同時使用紫外光照射輔助至少30秒(波長365nm),形成水氣阻絕層,並完成OLED封裝膠片1,如表1所示。 The epoxy resin-modified nano montmorillonite slurry was precision coated onto a release sheet of polyethylene terephthalate to form a wet film having a thickness of 60 μm, and baked in a continuous oven at 90 ° C, 10 Minutes, and can be simultaneously assisted by ultraviolet light irradiation for at least 30 seconds (wavelength 365 nm) to form a water vapor barrier layer, and the OLED package film 1 is completed, as shown in Table 1.

實施例2. OLED封裝膠片2Example 2. OLED package film 2

同實施例1之製造步驟,如表1所示,差異僅在於該環氧樹脂 /改質奈米蒙脫土漿液所添加之製備例之改質奈米蒙脫土D2000/MMT為2g。 The manufacturing procedure of the same as in Example 1 is as shown in Table 1, except that the modified nano-montmorillonite D2000/MMT of the preparation example added by the epoxy resin/modified nano montmorillonite slurry was 2 g.

實施例3. OLED封裝膠片3Example 3. OLED package film 3

同實施例1之製造步驟,如表1所示,差異僅在於該環氧樹脂/改質奈米蒙脫土漿液所添加之製備例之改質奈米蒙脫土D2000/MMT為4g。 The manufacturing procedure of Example 1 was as shown in Table 1, except that the modified nano-montmorillonite D2000/MMT of the preparation example added by the epoxy resin/modified nano-montmorillonite slurry was 4 g.

比較例1. 不含有改質奈米蒙脫土之OLED封裝膠片Comparative Example 1. OLED package film without modified nano-montmorillonite

同實施例1之製造步驟,如表1所示,差異僅混合物中並未添加製備例之改質奈米蒙脫土D2000/MMT,而所完成之封裝膠片並不具有水氣阻隔層,僅為一般的封裝膠片。 The manufacturing steps of Example 1 are as shown in Table 1. The difference is that only the modified nano-montmorillonite D2000/MMT of the preparation example is not added to the mixture, and the completed packaged film does not have a moisture barrier layer, only For general packaging film.

實施例4至6及比較例2.封裝OLEDExamples 4 to 6 and Comparative Example 2. Packaging OLED

分別將實施例1至3之OLED封裝膠片、及比較例1之封裝膠片於90℃下預加熱處理30秒後,貼覆至設有OLED的玻璃基板上並壓合使其密封OLED後,撕除該OLED封裝膠片之離形片,將另一玻璃基板貼覆於該水氣阻隔層之上壓合,並經365nm波長UV光照射40秒後於120℃加熱2小時,使該水氣阻隔層硬化即完成封裝,分別為實施例4至6及比較例2之封裝 OLED;封裝後,使用透氧儀測試該實施例4至6之水氣阻隔層、及比較例2之封裝膠片之氧氣透氣率,其結果如表2所示。 The OLED package film of Examples 1 to 3 and the package film of Comparative Example 1 were preheated at 90 ° C for 30 seconds, respectively, and then attached to a glass substrate provided with an OLED and pressed to seal the OLED, and then torn. In addition to the release sheet of the OLED package film, another glass substrate is pasted on the moisture barrier layer and pressed by UV light at 365 nm for 40 seconds and then heated at 120 ° C for 2 hours to block the moisture. The layer hardening was completed, and the packaged OLEDs of Examples 4 to 6 and Comparative Example 2 were respectively packaged; after packaging, the moisture barrier layers of Examples 4 to 6 and the oxygen of the package film of Comparative Example 2 were tested using an oxygen permeability meter. The air permeability was measured as shown in Table 2.

如表1及2所示,由於實施例1至3之OLED封裝膠片之水氣阻絕層包含有改質奈米蒙脫土,比起比較例1之一般封裝膠片,其水氣阻絕層之氧氣透氣率都較低,即代表可有效阻絕氣體進入OLED封裝內部。且,隨著改質奈米蒙脫土之含量增加時,其氧氣透氣率也隨之下降。 As shown in Tables 1 and 2, since the moisture barrier layer of the OLED package film of Examples 1 to 3 contains modified nano montmorillonite, the moisture of the moisture barrier layer is lower than that of the general package film of Comparative Example 1. The low gas permeability means that the gas can be effectively blocked from entering the interior of the OLED package. Moreover, as the content of the modified nano montmorillonite increases, the oxygen permeability thereof also decreases.

是以,本發明之OLED封裝膠片,其水氣阻絕層因具有改質奈米蒙脫土,即可有效阻絕氣體通過,以減少水氣及氧氣進入到OLED內部,有效降低發生如電極氧化、發光層剝離或材質裂解等問題,進而提升OLED封裝之效能,延長OLED使用壽命。 Therefore, the OLED encapsulating film of the present invention can effectively block the passage of gas due to the modified nano-montmorillonite to reduce the entry of moisture and oxygen into the OLED, thereby effectively reducing the occurrence of oxidation such as electrodes. Problems such as peeling of the luminescent layer or cracking of the material, thereby improving the performance of the OLED package and prolonging the service life of the OLED.

Claims (10)

一種OLED封裝用膠片,包括一第一離形片及一水氣阻絕層,該水氣阻絕層係形成於該第一離形片之可剝離面上,其中該水氣阻絕層包含改質奈米蒙脫土及環氧樹脂。  An OLED encapsulating film comprising a first release sheet and a moisture barrier layer formed on the peelable surface of the first release sheet, wherein the moisture barrier layer comprises a modified naphthalene Mimontite and epoxy resin.   如請求項1之OLED封裝用膠片,其中該改質奈米蒙脫土係經聚醚胺改質。  The film for OLED encapsulation of claim 1, wherein the modified nano montmorillonite is modified with polyetheramine.   如請求項2之OLED封裝用膠片,其中該聚醚胺之分子量為200至5000,並具有如下式(I)之重複單元: 其中n為2至50之整數。 The film for OLED encapsulation of claim 2, wherein the polyetheramine has a molecular weight of 200 to 5000 and has a repeating unit of the following formula (I): Wherein n is an integer from 2 to 50. 如請求項1之OLED封裝用膠片,其中該含改質奈米蒙脫土之添加量為以100wt%計之環氧樹脂,添加1~10phr。  The film for OLED packaging according to claim 1, wherein the modified nano montmorillonite is added in an amount of 100% by weight of the epoxy resin, and 1 to 10 phr is added.   如請求項1之OLED封裝用膠片,其中該水氣阻絕層相對於該第一離形片之一側進一步包含一第二離形片。  The OLED encapsulating film of claim 1, wherein the moisture barrier layer further comprises a second release sheet with respect to one side of the first release sheet.   一種製備如請求項1至5項任一項之OLED封裝用膠片之方法,其包含下列步驟:(a)提供一第一離形片;(b)混合改質奈米蒙脫土及環氧樹脂,獲得一環氧樹脂-改質奈米蒙脫土漿液;(c)將該環氧樹脂-改質奈米蒙脫土漿液塗覆於該第一離形片之可剝離面上,形成一濕膜,並烘烤形成一水氣阻絕層。  A method of preparing a film for OLED encapsulation according to any one of claims 1 to 5, comprising the steps of: (a) providing a first release sheet; (b) mixing modified nano montmorillonite and epoxy Resin, obtaining an epoxy resin-modified nano montmorillonite slurry; (c) applying the epoxy resin-modified nano montmorillonite slurry to the peelable surface of the first release sheet to form A wet film is baked and formed into a moisture barrier layer.   如請求項6之方法,其中該烘烤條件之溫度70~120℃,時間為5~12分鐘。  The method of claim 6, wherein the baking condition has a temperature of 70 to 120 ° C and a time of 5 to 12 minutes.   如請求項7之方法,其進一步包含將一第二離形片之可剝離面附於該水氣阻絕層上。  The method of claim 7, further comprising attaching a peelable surface of a second release sheet to the moisture barrier layer.   一種封裝OLED之方法,包含提供一如請求項1至5任一項之OLED封裝用膠片,以水氣阻絕層貼覆於一第一基板上之OLED元件上,撕除該離形片,並將一第二基板貼覆於該水氣阻絕層上,再經UV光硬化及/或熱硬化。  A method of packaging an OLED, comprising: providing a film for OLED packaging according to any one of claims 1 to 5, attaching a moisture barrier layer to an OLED element on a first substrate, and tearing off the release sheet, and A second substrate is attached to the moisture barrier layer and then cured by UV light and/or thermally cured.   一種經封裝之OLED,其係經請求項9之封裝方法所得。  A packaged OLED obtained by the encapsulation method of claim 9.  
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