TW201739004A - Semiconductor module and method of manufacturing the same - Google Patents
Semiconductor module and method of manufacturing the sameInfo
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Abstract
Description
本發明是有關於一種半導體模組,且具體而言是有關於一種模組基板及具有所述模組基板的半導體模組。The present invention relates to a semiconductor module, and in particular to a module substrate and a semiconductor module having the module substrate.
近來,對重量輕且尺寸小的電子裝置(例如蜂巢式電話(cellular phone)及筆記本電腦(notebook computer))的需求日益增加。欲設置於電子裝置中的半導體模組的尺寸及重量被減小以滿足此種需求。半導體模組可插入至電子裝置的連接器中。因此,半導體模組被製造成在形狀及尺寸(例如厚度或寬度)方面滿足國際標準。Recently, there is an increasing demand for lightweight and small-sized electronic devices such as cellular phones and notebook computers. The size and weight of the semiconductor module to be placed in the electronic device are reduced to meet such requirements. The semiconductor module can be inserted into a connector of the electronic device. Therefore, the semiconductor module is fabricated to meet international standards in terms of shape and size (e.g., thickness or width).
本發明概念的某些實施例提供一種小尺寸半導體模組及包括所述小尺寸半導體模組的模組基板。Certain embodiments of the inventive concept provide a small-sized semiconductor module and a module substrate including the small-sized semiconductor module.
至少一個實施例是有關於一種半導體模組。At least one embodiment is directed to a semiconductor module.
在一個實施例中,所述半導體模組包括:模組基板;以及第一基板,安裝於所述模組基板的第一表面上並電性連接至所述第一表面。所述第一基板具有所述半導體模組的一或多個第一電性連接器,且所述第一基板將所述第一電性連接器電性連接至所述模組基板。In one embodiment, the semiconductor module includes: a module substrate; and a first substrate mounted on the first surface of the module substrate and electrically connected to the first surface. The first substrate has one or more first electrical connectors of the semiconductor module, and the first substrate electrically connects the first electrical connector to the module substrate.
在一個實施例中,所述半導體模組包括主基板。連接基板及至少一個晶片安裝於所述主基板的第一表面上。所述連接基板經由所述主基板電性連接至所述晶片,且所述連接基板包括用於將所述半導體模組電性連接至外部裝置的一或多個分接頭。In one embodiment, the semiconductor module includes a main substrate. The connection substrate and the at least one wafer are mounted on the first surface of the main substrate. The connection substrate is electrically connected to the wafer via the main substrate, and the connection substrate includes one or more taps for electrically connecting the semiconductor module to an external device.
至少一個實施例是有關於一種系統。At least one embodiment is related to a system.
在一個實施例中,所述系統包括模組基板,所述模組基板具有連接區及系統區。所述模組基板具有第一表面及第二表面,且所述第二表面與所述第一表面相對。第一基板在所述連接區中安裝於所述模組基板的所述第一表面上並電性連接至所述第一表面。所述第一基板具有一或多個第一電性連接器,且所述第一基板將所述第一電性連接器電性連接至所述模組基板。至少一個第一系統結構在所述系統區中安裝於所述模組基板的所述第一表面上。In one embodiment, the system includes a module substrate having a connection region and a system region. The module substrate has a first surface and a second surface, and the second surface is opposite to the first surface. The first substrate is mounted on the first surface of the module substrate in the connection region and electrically connected to the first surface. The first substrate has one or more first electrical connectors, and the first substrate electrically connects the first electrical connector to the module substrate. At least one first system structure is mounted on the first surface of the module substrate in the system area.
一個實施例是有關於一種製造半導體模組的方法。One embodiment relates to a method of fabricating a semiconductor module.
在一個實施例中,所述方法包括將第一基板在模組基板的第一區中安裝於所述模組基板的第一表面上。所述第一基板在所述第一基板的外表面上包括用於所述半導體模組的至少一個第一電性連接器。所述方法更包括將第一裝置結構在所述模組基板的第二區中安裝於所述模組基板的所述第一表面上。所述模組基板將所述第一基板電性連接至所述第一裝置結構。所述模組更包括在所述模組基板的所述第一表面之上形成第一模具層,以覆蓋所述第一裝置結構及覆蓋所述第一基板的一部分,以使所述第一電性連接器保持被暴露出。In one embodiment, the method includes mounting a first substrate on a first surface of the module substrate in a first region of the module substrate. The first substrate includes at least one first electrical connector for the semiconductor module on an outer surface of the first substrate. The method further includes mounting a first device structure on the first surface of the module substrate in a second region of the module substrate. The module substrate electrically connects the first substrate to the first device structure. The module further includes forming a first mold layer over the first surface of the module substrate to cover the first device structure and cover a portion of the first substrate to enable the first The electrical connector remains exposed.
應理解,當稱一元件「連接」至或「耦合」至另一元件時,所述元件可直接連接至或直接耦合至所述另一元件抑或可存在中間元件。It will be understood that when an element is "connected" or "coupled" to another element, the element can be directly connected or directly coupled to the other element or the intermediate element can be present.
應理解,儘管本文中可能使用「第一」、「第二」等用語來闡述各種元件,然而該些元件不應受該些用語限制。該些用語僅用於區分各個元件。舉例而言,可將第一元件稱為第二元件,且相似地,可將第二元件稱為第一元件,而此並不背離示例性實施例的範圍。本文中所用用語「及/或」包括相關所列項其中一或多個項的任意及全部組合。It should be understood that, although the terms "first", "second", and the like may be used herein to describe various elements, these elements are not limited by the terms. These terms are only used to distinguish the individual components. The first element may be referred to as a second element, and the second element may be referred to as a first element, without departing from the scope of the exemplary embodiments. The term "and/or" as used herein includes any and all combinations of one or more of the items listed.
圖1A是說明根據本發明概念實施例的半導體模組的平面圖。圖1B是沿圖1A所示的線I-I’截取的剖視圖。圖1C是說明圖1B所示部分‘II’的放大剖視圖。FIG. 1A is a plan view illustrating a semiconductor module in accordance with an embodiment of the inventive concept. Fig. 1B is a cross-sectional view taken along line I-I' shown in Fig. 1A. Fig. 1C is an enlarged cross-sectional view showing a portion 'II' shown in Fig. 1B.
參照圖1A及圖1B,半導體模組1可包括模組基板100、第一基板210、第二基板220、第一電子組件410、第二電子組件420、一或多個第一半導體晶片510、一或多個第二半導體晶片520、第一模具層610及第二模具層620。模組基板100可包括第一區R1及第二區R2。模組基板100的第一區R1可鄰近於模組基板100的側邊100c。模組基板100可具有彼此背對(例如相對地面對)的第一表面100a與第二表面100b。如圖1B中所示,模組基板100的側邊100c可垂直於第一表面100a及第二表面100b。如圖1A中所示,當在平面圖中觀察時,模組基板100的側邊100c可平行於第二方向D2延伸。在本說明書中,第一方向D1與第二方向D2可平行於模組基板100的第一表面100a且可不彼此平行。模組基板100可為設置有電路圖案的印刷電路板(printed circuit board,PCB)。模組基板100可具有實質上均勻的厚度A2。此處,模組基板100的厚度A2可指第一表面100a與第二表面100b之間的距離。如圖1B中所示,在模組基板100的第二區R2上可設置有一或多個第一連接墊131及一或多個第二連接墊132。第一連接墊131及第二連接墊132可分別設置於第一表面100a及第二表面100b上。Referring to FIGS. 1A and 1B , the semiconductor module 1 may include a module substrate 100 , a first substrate 210 , a second substrate 220 , a first electronic component 410 , a second electronic component 420 , and one or more first semiconductor wafers 510 . One or more second semiconductor wafers 520, a first mold layer 610, and a second mold layer 620. The module substrate 100 may include a first region R1 and a second region R2. The first region R1 of the module substrate 100 may be adjacent to the side 100c of the module substrate 100. The module substrate 100 can have a first surface 100a and a second surface 100b that are opposite each other (eg, opposite each other). As shown in FIG. 1B, the side 100c of the module substrate 100 may be perpendicular to the first surface 100a and the second surface 100b. As shown in FIG. 1A, the side 100c of the module substrate 100 may extend parallel to the second direction D2 when viewed in a plan view. In the present specification, the first direction D1 and the second direction D2 may be parallel to the first surface 100a of the module substrate 100 and may not be parallel to each other. The module substrate 100 may be a printed circuit board (PCB) provided with a circuit pattern. The module substrate 100 can have a substantially uniform thickness A2. Here, the thickness A2 of the module substrate 100 may refer to the distance between the first surface 100a and the second surface 100b. As shown in FIG. 1B, one or more first connection pads 131 and one or more second connection pads 132 may be disposed on the second region R2 of the module substrate 100. The first connection pad 131 and the second connection pad 132 may be disposed on the first surface 100a and the second surface 100b, respectively.
第一基板210可安裝於模組基板100的第一表面100a的第一區R1上。當在平面圖中觀察時,第一基板210可具有平行於第二方向D2的縱軸。第一基板210可為印刷電路板(PCB)。在模組基板100與第一基板210之間可設置有一或多個第一連接部250。第一連接部250可耦合至模組基板100上的上部墊115及第一基板210上的墊。第一連接部250可被設置成凸塊(bump)或焊料球(solder ball)形式。第一基板210可具有兩個相對的表面(例如底表面210b與頂表面210a)。此處,第一基板210可被設置成使得底表面210b面對模組基板100。第一基板210的頂表面210a可定位於較模組基板100的第二區R2的第一表面100a高的水平高度(level)處。The first substrate 210 may be mounted on the first region R1 of the first surface 100a of the module substrate 100. The first substrate 210 may have a longitudinal axis parallel to the second direction D2 when viewed in a plan view. The first substrate 210 can be a printed circuit board (PCB). One or more first connecting portions 250 may be disposed between the module substrate 100 and the first substrate 210. The first connection portion 250 can be coupled to the upper pad 115 on the module substrate 100 and the pad on the first substrate 210. The first connection portion 250 may be provided in the form of a bump or a solder ball. The first substrate 210 can have two opposing surfaces (eg, a bottom surface 210b and a top surface 210a). Here, the first substrate 210 may be disposed such that the bottom surface 210b faces the module substrate 100. The top surface 210a of the first substrate 210 may be positioned at a higher level than the first surface 100a of the second region R2 of the module substrate 100.
在第一基板210的頂表面210a上可設置有第一分接頭310。第一分接頭310可鄰近於模組基板100的側邊100c。在某些實施例中,如圖1A中所示,在第一基板210的頂表面210a上可設置有多個第一分接頭310。各第一分接頭310可在第二方向D2上排列以形成平行於第二方向D2的行。當在平面圖中觀察時,第一分接頭310中的每一者可具有平行於第一方向D1的縱軸。第一分接頭310可由至少一種金屬(例如銅或鋁)形成或包含所述至少一種金屬。在某些實施例中,第一分接頭310中的每一者可為第一基板210的電路圖案的被第一保護層213暴露出的一部分。A first tap 310 may be disposed on the top surface 210a of the first substrate 210. The first tap 310 can be adjacent to the side 100c of the module substrate 100. In some embodiments, as shown in FIG. 1A, a plurality of first taps 310 may be disposed on the top surface 210a of the first substrate 210. Each of the first taps 310 may be arranged in the second direction D2 to form a row parallel to the second direction D2. Each of the first taps 310 can have a longitudinal axis that is parallel to the first direction D1 when viewed in plan view. The first tap 310 can be formed of or comprise at least one metal, such as copper or aluminum. In some embodiments, each of the first taps 310 can be a portion of the circuit pattern of the first substrate 210 that is exposed by the first protective layer 213.
第一電子組件410可安裝於模組基板100的第二區R2的第一表面100a上。第一電子組件410可在第一方向D1上與第一基板210間隔開。第一電子組件410可包括電容器、電阻器或電感器。在模組基板100與第一電子組件410之前可內插有第一內插器415,且第一內插器415可耦合至第一連接墊131及第一電子組件410的連接墊。第一內插器415可被設置成焊料(solder)、焊料球或凸塊形式,但本發明概念並非僅限於此。The first electronic component 410 can be mounted on the first surface 100a of the second region R2 of the module substrate 100. The first electronic component 410 can be spaced apart from the first substrate 210 in the first direction D1. The first electronic component 410 can include a capacitor, a resistor, or an inductor. The first interposer 415 can be interposed before the module substrate 100 and the first electronic component 410, and the first interposer 415 can be coupled to the connection pads of the first connection pad 131 and the first electronic component 410. The first interposer 415 may be provided in the form of a solder, a solder ball or a bump, but the inventive concept is not limited thereto.
第一半導體晶片510可安裝於模組基板100的第二區R2的第一表面100a上且可在第一方向D1上與第一基板210間隔開。在某些實施例中,第一半導體晶片510可包括記憶體裝置(例如動態隨機存取記憶體(dynamic random access memory,DRAM)裝置、反及快閃(NAND Flash)裝置、反或快閃(NOR Flash)裝置、一體式反及(OneNAND)裝置、相變隨機存取記憶體(phase-change random access memory,PRAM)裝置、電阻式隨機存取記憶體(resistive random access memory,ReRAM)裝置或磁性隨機存取記憶體(magnetic random access memory,MRAM)裝置中的至少一者)。在某些實施例中,第一半導體晶片510可包括邏輯裝置(例如光電裝置(photoelectronic device)、通訊裝置、數位訊號處理器、控制器或系統晶片(system-on-chip))。在某些實施例中,第一半導體晶片510可包括記憶體裝置及邏輯裝置。出於簡化說明的目的,將闡述單個第一半導體晶片510的連接。在模組基板100與第一半導體晶片510之間可內插有一或多個第一端子515且所述一或多個第一端子515可耦合至相應第一連接墊131及第一半導體晶片510處的相應連接墊。第一端子515可被設置成焊料或凸塊形式。儘管圖中未示出,然而第一端子515可為設置於第一半導體晶片510的頂表面上的結合導線(bonding wire)。The first semiconductor wafer 510 may be mounted on the first surface 100a of the second region R2 of the module substrate 100 and may be spaced apart from the first substrate 210 in the first direction D1. In some embodiments, the first semiconductor wafer 510 can include a memory device (eg, a dynamic random access memory (DRAM) device, a NAND Flash device, a reverse or a flash ( NOR Flash device, OneNAND device, phase-change random access memory (PRAM) device, resistive random access memory (ReRAM) device or At least one of magnetic random access memory (MRAM) devices). In some embodiments, the first semiconductor wafer 510 can include logic devices (eg, photoelectronic devices, communication devices, digital signal processors, controllers, or system-on-chips). In some embodiments, the first semiconductor wafer 510 can include a memory device and a logic device. For the purpose of simplifying the description, the connection of a single first semiconductor wafer 510 will be explained. One or more first terminals 515 may be interposed between the module substrate 100 and the first semiconductor wafer 510 and the one or more first terminals 515 may be coupled to the corresponding first connection pads 131 and the first semiconductor wafer 510 The corresponding connection pad at the place. The first terminal 515 can be provided in the form of a solder or a bump. Although not shown in the drawings, the first terminal 515 may be a bonding wire disposed on a top surface of the first semiconductor wafer 510.
第一模具層610可設置於模組基板100的第一表面100a上以覆蓋第一電子組件410及第一半導體晶片510。舉例而言,第一模具層610可包括絕緣聚合物(例如環氧樹脂模製化合物(epoxy molding compound))。第一模具層610可延伸至模組基板100與第一基板210之間的間隙中以密閉地覆蓋第一連接部250。第一模具層610可被配置成減輕或防止第一連接部250自模組基板100或第一基板210脫離。此可使得半導體模組1的可靠性提高。第一模具層610可延伸至第一電子組件410與模組基板100之間的間隙區中及第一半導體晶片510與模組基板100之間的間隙區中以密閉地覆蓋第一內插器415及第一端子515。第一模具層610可被設置成暴露出第一分接頭310。第一模具層610可具有與第一保護層213的頂表面實質上共面的頂表面。The first mold layer 610 can be disposed on the first surface 100a of the module substrate 100 to cover the first electronic component 410 and the first semiconductor wafer 510. For example, the first mold layer 610 can include an insulating polymer (eg, an epoxy molding compound). The first mold layer 610 may extend into a gap between the module substrate 100 and the first substrate 210 to hermetically cover the first connection portion 250. The first mold layer 610 can be configured to relieve or prevent the first connection portion 250 from being detached from the module substrate 100 or the first substrate 210. This can improve the reliability of the semiconductor module 1. The first mold layer 610 may extend into a gap region between the first electronic component 410 and the module substrate 100 and a gap region between the first semiconductor wafer 510 and the module substrate 100 to hermetically cover the first interposer 415 and the first terminal 515. The first mold layer 610 can be configured to expose the first tap 310. The first mold layer 610 can have a top surface that is substantially coplanar with the top surface of the first protective layer 213.
第二半導體晶片520及第二電子組件420可安裝於模組基板100的第二區R2的第二表面100b上。第二半導體晶片520可包括與第一半導體晶片510的記憶體裝置或邏輯裝置相同或相似的記憶體裝置或邏輯裝置中的至少一者。第二電子組件420可包括與第一電子組件410的電容器、電阻器或電感器相同或相似的電容器、電阻器或電感器中的至少一者。第二電子組件420可經由第二內插器425及位於第二內插器425上的連接墊而耦合至第二連接墊132。第二半導體晶片520可經由第二端子525及位於第二端子525上的連接墊而耦合至第二連接墊132。The second semiconductor wafer 520 and the second electronic component 420 can be mounted on the second surface 100b of the second region R2 of the module substrate 100. The second semiconductor wafer 520 can include at least one of a memory device or a logic device that is the same as or similar to the memory device or logic device of the first semiconductor wafer 510. The second electronic component 420 can include at least one of a capacitor, a resistor, or an inductor that is the same as or similar to a capacitor, resistor, or inductor of the first electronic component 410. The second electronic component 420 can be coupled to the second connection pad 132 via the second interposer 425 and a connection pad on the second interposer 425. The second semiconductor wafer 520 can be coupled to the second connection pad 132 via the second terminal 525 and a connection pad on the second terminal 525.
第二基板220可設置於模組基板100的第一區R1的第二表面100b上。第二基板220可被設置成平行於第二方向D2。當在平面圖中觀察時,第二基板220可與第一基板210交疊。作為實例,可使用印刷電路板來作為第二基板220。在模組基板100與第二基板220之間可內插有一或多個第二連接部260且所述一或多個第二連接部260可耦合至第二基板220的相應連接墊及下部墊125。第二連接部260可被設置成凸塊或焊料形式。第二基板220可具有與模組基板100面對的頂表面220a及與頂表面220a相對的底表面220b。第二基板220的底表面220b可定位於較模組基板100的第二區R2的第二表面100b低的水平高度處。The second substrate 220 may be disposed on the second surface 100b of the first region R1 of the module substrate 100. The second substrate 220 may be disposed in parallel to the second direction D2. The second substrate 220 may overlap the first substrate 210 when viewed in a plan view. As an example, a printed circuit board can be used as the second substrate 220. One or more second connecting portions 260 may be interposed between the module substrate 100 and the second substrate 220 and the one or more second connecting portions 260 may be coupled to corresponding connecting pads and lower pads of the second substrate 220 125. The second connection portion 260 may be provided in the form of a bump or a solder. The second substrate 220 may have a top surface 220a facing the module substrate 100 and a bottom surface 220b opposite to the top surface 220a. The bottom surface 220b of the second substrate 220 may be positioned at a lower level than the second surface 100b of the second region R2 of the module substrate 100.
在第二基板220的底表面220b上可設置有第二分接頭320。第二分接頭320可鄰近於模組基板100的側邊100c。如圖1A中所示,各第二分接頭320可在第二方向D2上排列。當在平面圖中觀察時,第二分接頭320中的每一者可具有平行於第一方向D1的縱軸。第二分接頭320可由至少一種金屬(例如銅或鋁)形成或包含所述至少一種金屬。第二分接頭320中的每一者可為第二基板220的電路圖案的被第二保護層223暴露出的一部分。A second tap 320 may be disposed on the bottom surface 220b of the second substrate 220. The second tap 320 can be adjacent to the side 100c of the module substrate 100. As shown in FIG. 1A, each of the second taps 320 can be aligned in the second direction D2. Each of the second taps 320 may have a longitudinal axis that is parallel to the first direction D1 when viewed in plan view. The second tap 320 may be formed of or comprise at least one metal (eg, copper or aluminum). Each of the second taps 320 may be a portion of the circuit pattern of the second substrate 220 that is exposed by the second protective layer 223.
第二模具層620可設置於模組基板100的第二表面100b上以覆蓋第二電子組件420及第二半導體晶片520。第二模具層620可被設置成密閉地覆蓋第二連接部260、第二內插器425及第二端子525。第二模具層620可由環氧樹脂模製化合物形成或包含環氧樹脂模製化合物。第二模具層620可具有與第二保護層223的底表面實質上共面的底表面。第二模具層620可提供與第一模具層610相同的優點。The second mold layer 620 can be disposed on the second surface 100b of the module substrate 100 to cover the second electronic component 420 and the second semiconductor wafer 520. The second mold layer 620 may be disposed to hermetically cover the second connection portion 260, the second interposer 425, and the second terminal 525. The second mold layer 620 may be formed of an epoxy molding compound or comprise an epoxy molding compound. The second mold layer 620 can have a bottom surface that is substantially coplanar with the bottom surface of the second protective layer 223. The second mold layer 620 can provide the same advantages as the first mold layer 610.
作為實例,第一半導體晶片510及第二半導體晶片520可包括動態隨機存取記憶體晶片,且半導體模組1可被用作動態隨機存取記憶體模組。然而,半導體模組1的種類並非僅限於此。半導體晶片510、520以及電子組件410、420的數目、排列及平面形狀可有各種變化。在某些實施例中,可省略第一半導體晶片510、第二半導體晶片520、第一電子組件410及第二電子組件420中的至少一者。As an example, the first semiconductor wafer 510 and the second semiconductor wafer 520 may include a dynamic random access memory chip, and the semiconductor module 1 may be used as a dynamic random access memory module. However, the type of the semiconductor module 1 is not limited to this. The number, arrangement, and planar shape of the semiconductor wafers 510, 520 and electronic components 410, 420 can vary. In some embodiments, at least one of the first semiconductor wafer 510, the second semiconductor wafer 520, the first electronic component 410, and the second electronic component 420 can be omitted.
圖2是根據本發明概念實施例示出如何將半導體模組連接至電子裝置的剖視圖。為簡潔起見,可由相同的參考編號來辨識先前所述元件,而不再對其予以贅述。2 is a cross-sectional view showing how a semiconductor module is connected to an electronic device in accordance with an embodiment of the present invention. For the sake of brevity, the previously described elements may be identified by the same reference numerals and will not be described again.
參照圖2,電子裝置1000可包括連接器1100。電子裝置1000可為資訊裝置(例如可攜式電腦或智慧型電視(smart TV))、家用電器(例如視訊播放機或數位視訊光碟播放機(DVD player))或行動裝置(例如可攜式多媒體播放機(portable multimedia player,PMP)、可攜式數位視訊光碟播放機或蜂巢式電話)。Referring to FIG. 2, the electronic device 1000 may include a connector 1100. The electronic device 1000 can be an information device (such as a portable computer or a smart TV), a household appliance (such as a video player or a digital video disc player (DVD player)), or a mobile device (such as a portable multimedia device). Portable multimedia player (PMP), portable digital video disc player or cellular phone).
可將半導體模組1的第一區R1插入至電子裝置1000的連接器1100中。此處,半導體模組1的第一區R1可指半導體模組1的與模組基板100的第一區R1對應的一部分。連接器1100可包括第一導電墊1111及第二導電墊1112,且若將半導體模組1插入至連接器1100中,則第一分接頭310及第二分接頭320可分別耦合至第一導電墊1111及第二導電墊1112。亦即,可經由第一分接頭310及第二分接頭320以及第一導電墊1111及第二導電墊1112而將半導體模組1電性連接至電子裝置1000。大體而言,可將半導體模組1設置成滿足連接器1100的標準。舉例而言,可將半導體模組1設置成使得第一區R1能夠具有與連接器1100的間隙距離B對應的厚度A,其中厚度A1是指第一分接頭310的頂表面與第二分接頭320的底表面之間的距離,且間隙距離B是指第一導電墊1111與第二導電墊1112之間的距離。半導體模組1的第一區R1的厚度A1可實質上等於或厚於模組基板100的第二區R2的厚度A2、第一基板210的厚度A3及第二基板220的厚度A4之和。可將第一基板210及第二基板220安裝於模組基板100的第一區R1上以使得半導體模組1的第一區R1的厚度A1能夠處於滿足半導體模組1的標準的範圍內。The first region R1 of the semiconductor module 1 can be inserted into the connector 1100 of the electronic device 1000. Here, the first region R1 of the semiconductor module 1 may refer to a portion of the semiconductor module 1 corresponding to the first region R1 of the module substrate 100. The connector 1100 can include a first conductive pad 1111 and a second conductive pad 1112. If the semiconductor module 1 is inserted into the connector 1100, the first tap 310 and the second tap 320 can be respectively coupled to the first conductive Pad 1111 and second conductive pad 1112. That is, the semiconductor module 1 can be electrically connected to the electronic device 1000 via the first tap 310 and the second tap 320 and the first conductive pad 1111 and the second conductive pad 1112 . In general, the semiconductor module 1 can be set to meet the standards of the connector 1100. For example, the semiconductor module 1 can be disposed such that the first region R1 can have a thickness A corresponding to the gap distance B of the connector 1100, wherein the thickness A1 refers to the top surface of the first tap 310 and the second tap The distance between the bottom surfaces of 320, and the gap distance B refers to the distance between the first conductive pad 1111 and the second conductive pad 1112. The thickness A1 of the first region R1 of the semiconductor module 1 may be substantially equal to or thicker than the sum of the thickness A2 of the second region R2 of the module substrate 100, the thickness A3 of the first substrate 210, and the thickness A4 of the second substrate 220. The first substrate 210 and the second substrate 220 may be mounted on the first region R1 of the module substrate 100 such that the thickness A1 of the first region R1 of the semiconductor module 1 can be within a range satisfying the standard of the semiconductor module 1.
在將第一分接頭310及第二分接頭320直接設置於模組基板100的第一表面100a及第二表面100b上的情形中,模組基板100的第二區R2的厚度A1可與半導體模組1的第一區R1的厚度相同或相似。在某些實施例中,模組基板100的第二區R2的厚度A2可小於半導體模組1的第一區R1的厚度A1。舉例而言,可將模組基板100的第一表面100a定位於較第一基板210的頂表面210a低的水平高度處。可將模組基板100的第二表面100b定位於較第二基板220的底表面220b高的水平高度處。可將半導體晶片510、520以及電子組件410、420安裝於模組基板100的第二區R2上。因此,半導體模組1的第二區R2可具有薄的厚度(例如厚度A5),且因此,可減小半導體模組1的尺寸。In the case where the first tap 310 and the second tap 320 are directly disposed on the first surface 100a and the second surface 100b of the module substrate 100, the thickness A1 of the second region R2 of the module substrate 100 can be combined with the semiconductor. The thickness of the first region R1 of the module 1 is the same or similar. In some embodiments, the thickness A2 of the second region R2 of the module substrate 100 may be smaller than the thickness A1 of the first region R1 of the semiconductor module 1. For example, the first surface 100a of the module substrate 100 can be positioned at a lower level than the top surface 210a of the first substrate 210. The second surface 100b of the module substrate 100 can be positioned at a higher level than the bottom surface 220b of the second substrate 220. The semiconductor wafers 510, 520 and the electronic components 410, 420 can be mounted on the second region R2 of the module substrate 100. Therefore, the second region R2 of the semiconductor module 1 can have a thin thickness (for example, the thickness A5), and thus, the size of the semiconductor module 1 can be reduced.
圖1C是根據本發明概念實施例說明分接頭與模組基板之間的電連接的放大剖視圖。圖1C所示剖視圖可對應於圖1B所示部分‘II’。為簡潔起見,可由相同的參考編號來辨識先前所述元件,而不再對其予以贅述。1C is an enlarged cross-sectional view illustrating an electrical connection between a tap and a module substrate in accordance with an embodiment of the present invention. The cross-sectional view shown in Fig. 1C may correspond to the portion 'II' shown in Fig. 1B. For the sake of brevity, the previously described elements may be identified by the same reference numerals and will not be described again.
結合圖1B來參照圖1C,第一基板210可包括第一基礎層211及第一導電圖案。第一基礎層211可包含絕緣材料。第一導電圖案可為或可包括穿透第一基礎層211的第一通孔212。第一導電圖案亦可設置於第一基礎層211的頂表面及底表面上。第一保護層213可被設置成覆蓋第一基板210的頂表面210a。作為實例,第一基板210可為印刷電路板。第一基板210中的電路圖案(例如位於頂表面210a上)可被第一保護層213暴露出,且此種電路圖案可用作第一分接頭310。第一分接頭310可經由第一導電圖案的第一通孔212而電性連接至模組基板100的一或多個金屬圖案109。本發明中的通孔及導電圖案可由任意眾所習知的導電材料(例如銅或鋁)形成。Referring to FIG. 1C in conjunction with FIG. 1B, the first substrate 210 may include a first base layer 211 and a first conductive pattern. The first base layer 211 may include an insulating material. The first conductive pattern may be or may include a first via 212 penetrating the first base layer 211. The first conductive pattern may also be disposed on the top surface and the bottom surface of the first base layer 211. The first protective layer 213 may be disposed to cover the top surface 210a of the first substrate 210. As an example, the first substrate 210 can be a printed circuit board. The circuit pattern in the first substrate 210 (eg, on the top surface 210a) may be exposed by the first protective layer 213, and such a circuit pattern may be used as the first tap 310. The first tap 310 can be electrically connected to the one or more metal patterns 109 of the module substrate 100 via the first via 212 of the first conductive pattern. The vias and conductive patterns in the present invention may be formed of any of the well-known conductive materials such as copper or aluminum.
第二基板220可包括第二基礎層221及第二導電圖案。第二導電圖案可為或可包括穿透過第二基礎層221的第二通孔222。第二保護層223可被設置成覆蓋第二基板220的底表面220b。第二基板220中的電路圖案(例如位於底表面220b上)可被第一保護層213暴露出,且此類電路圖案可用作第二分接頭320。第二分接頭320可經由第二導電圖案的第二通孔222而電性連接至模組基板100的金屬圖案109中的一或多者。以上闡述並說明模組基板100的絕緣層及金屬圖案109的某些實例,但本發明概念並非僅限於此。The second substrate 220 may include a second base layer 221 and a second conductive pattern. The second conductive pattern may be or may include a second via 222 that penetrates through the second base layer 221. The second protective layer 223 may be disposed to cover the bottom surface 220b of the second substrate 220. The circuit pattern in the second substrate 220 (eg, on the bottom surface 220b) may be exposed by the first protective layer 213, and such a circuit pattern may be used as the second tap 320. The second tap 320 may be electrically connected to one or more of the metal patterns 109 of the module substrate 100 via the second via 222 of the second conductive pattern. Some examples of the insulating layer of the module substrate 100 and the metal pattern 109 are explained and explained above, but the inventive concept is not limited thereto.
圖1D是根據本發明概念實施例說明分接頭與模組基板之間的電連接的放大剖視圖。圖1D所示剖視圖可對應於圖1B所示部分‘II’。為簡潔起見,可由相同的參考編號來辨識先前所述元件,而不再對其予以贅述。1D is an enlarged cross-sectional view illustrating an electrical connection between a tap and a module substrate in accordance with an embodiment of the present invention. The cross-sectional view shown in Fig. 1D may correspond to the portion 'II' shown in Fig. 1B. For the sake of brevity, the previously described elements may be identified by the same reference numerals and will not be described again.
參照圖1D,第一基板210及第二基板220可安裝於模組基板100的第一區R1上。模組基板100可被配置成具有與上述特徵相同或實質上相同的特徵。可設置多個第一基礎層211來作為第一基板210,且第一導電圖案可包括一或多個第一導電層214及多個第一通孔212。每一第一導電層214可內插於相應一對堆疊的第一基礎層211之間。第一基板210中的電路圖案(例如位於頂表面210a上)可被第一保護層213暴露出,且此類電路圖案可用作第一分接頭310。第一分接頭310可經由第一通孔212、第一導電層214及第一連接部250而電性連接至模組基板100。Referring to FIG. 1D, the first substrate 210 and the second substrate 220 may be mounted on the first region R1 of the module substrate 100. The module substrate 100 can be configured to have the same or substantially the same features as described above. A plurality of first base layers 211 may be disposed as the first substrate 210, and the first conductive patterns may include one or more first conductive layers 214 and a plurality of first through holes 212. Each of the first conductive layers 214 may be interposed between the respective pair of stacked first base layers 211. The circuit pattern in the first substrate 210 (eg, on the top surface 210a) may be exposed by the first protective layer 213, and such a circuit pattern may be used as the first tap 310. The first tap 310 can be electrically connected to the module substrate 100 via the first via 212 , the first conductive layer 214 , and the first connection portion 250 .
第二基板220可被設置成具有與圖1C所示結構相同或實質上相同的結構。可設置多個第二基礎層221,且第二導電圖案可包括一或多個第二導電層224s及多個第二通孔222。每一第二導電層224可內插於相應一對堆疊的第二基礎層221之間。第二基板220中的電路圖案可被第二保護層223暴露出,且此類電路圖案可用作第二分接頭320。第二分接頭320可經由第二通孔222及第二導電層224而電性連接至模組基板100。The second substrate 220 may be disposed to have the same or substantially the same structure as that shown in FIG. 1C. A plurality of second base layers 221 may be disposed, and the second conductive patterns may include one or more second conductive layers 224s and a plurality of second through holes 222. Each of the second conductive layers 224 may be interposed between the respective pair of stacked second base layers 221. The circuit pattern in the second substrate 220 may be exposed by the second protective layer 223, and such a circuit pattern may be used as the second tap 320. The second tap 320 can be electrically connected to the module substrate 100 via the second via 222 and the second conductive layer 224 .
閱讀圖1C及圖1D將進一步理解,模組基板100可為包括多個堆疊層的印刷電路板,且模組基板100使用包括通孔及導電層的導電圖案來提供電性連接。1C and FIG. 1D, it will be further understood that the module substrate 100 can be a printed circuit board including a plurality of stacked layers, and the module substrate 100 provides an electrical connection using a conductive pattern including vias and conductive layers.
圖3A是說明根據本發明概念實施例的半導體模組的剖視圖。舉例而言,圖3A說明沿圖1A所示的線I-I’截取的半導體模組的垂直剖面。FIG. 3A is a cross-sectional view illustrating a semiconductor module in accordance with an embodiment of the present invention. For example, Figure 3A illustrates a vertical cross section of the semiconductor module taken along line I-I' shown in Figure 1A.
結合圖1A來參照圖3A,半導體模組2可包括模組基板100、第一基板210、第一分接頭310、第一電子組件410、所述一或多個第一半導體晶片510及第一模具層610。與圖1B中所示實施例不同,可不設置第二基板220、第二半導體晶片520、第二電子組件420、第二模具層620及第二分接頭320。Referring to FIG. 3A, the semiconductor module 2 may include a module substrate 100, a first substrate 210, a first tap 310, a first electronic component 410, the one or more first semiconductor wafers 510, and a first Mold layer 610. Unlike the embodiment shown in FIG. 1B, the second substrate 220, the second semiconductor wafer 520, the second electronic component 420, the second mold layer 620, and the second tap 320 may not be disposed.
第一基板210可被設置成使得半導體模組2的第一區R1的厚度A1能夠處於滿足半導體模組的標準的範圍內。模組基板100的第二區R2的厚度A2可小於半導體模組2的第一區R1的厚度A1。模組基板100的第二區R2的第一表面100a可定位於較第一基板210的頂表面210a低的水平高度處。第一電子組件410及第一半導體晶片510可安裝於模組基板100的第二區R2的第一表面100a上。The first substrate 210 may be disposed such that the thickness A1 of the first region R1 of the semiconductor module 2 can be within a range satisfying the standard of the semiconductor module. The thickness A2 of the second region R2 of the module substrate 100 may be smaller than the thickness A1 of the first region R1 of the semiconductor module 2. The first surface 100a of the second region R2 of the module substrate 100 may be positioned at a lower level than the top surface 210a of the first substrate 210. The first electronic component 410 and the first semiconductor wafer 510 may be mounted on the first surface 100a of the second region R2 of the module substrate 100.
圖3B是說明根據本發明概念實施例的半導體模組的剖視圖。舉例而言,圖3B說明沿圖1A所示的線I-I’截取的半導體模組的垂直剖面。FIG. 3B is a cross-sectional view illustrating a semiconductor module in accordance with an embodiment of the present invention. For example, Figure 3B illustrates a vertical cross section of the semiconductor module taken along line I-I' shown in Figure 1A.
結合圖1A來參照圖3B,半導體模組3可包括模組基板100、第一分接頭310、第二分接頭320、一或多個第一半導體晶片510、一或多個第二半導體晶片520、第一電子組件410、第二電子組件420、第一模具層610及第二模具層620。模組基板100、第一分接頭310及第二分接頭320、電子組件410及電子組件420、半導體晶片510及半導體晶片520以及模具層610及模具層620可被配置成具有與參照圖1A及圖1B所述的特徵相同或實質上相同的特徵。Referring to FIG. 3B , the semiconductor module 3 may include a module substrate 100 , a first tap 310 , a second tap 320 , one or more first semiconductor wafers 510 , and one or more second semiconductor wafers 520 . The first electronic component 410, the second electronic component 420, the first mold layer 610, and the second mold layer 620. The module substrate 100, the first tap 310 and the second tap 320, the electronic component 410 and the electronic component 420, the semiconductor wafer 510 and the semiconductor wafer 520, and the mold layer 610 and the mold layer 620 can be configured to have the same reference to FIG. 1A. Features of Figure 1B that are identical or substantially identical.
在模組基板100與第一基板210之間可內插有第三基板218。在模組基板100與第三基板218之間可設置有一或多個第三連接部258。在第三基板218與第一基板210之間可設置有一或多個第一連接部259。第一分接頭310可設置於第一基板210的頂表面210a上。第一分接頭310可經由第一基板210、第一連接部259、第三基板218及第三連接部258而電性連接至模組基板100。第一連接部259可在第三方向D3上對齊至第三連接部258。第一連接部259及第三連接部258可為焊料或焊料球。A third substrate 218 may be interposed between the module substrate 100 and the first substrate 210. One or more third connecting portions 258 may be disposed between the module substrate 100 and the third substrate 218. One or more first connecting portions 259 may be disposed between the third substrate 218 and the first substrate 210. The first tap 310 may be disposed on the top surface 210a of the first substrate 210. The first tap 310 can be electrically connected to the module substrate 100 via the first substrate 210 , the first connecting portion 259 , the third substrate 218 , and the third connecting portion 258 . The first connection portion 259 may be aligned to the third connection portion 258 in the third direction D3. The first connection portion 259 and the third connection portion 258 may be solder or solder balls.
在模組基板100與第二基板220之間可內插有第四基板228。第二分接頭320可設置於第二基板220的底表面220b上。第二分接頭320可經由第二基板220、第二連接部269、第四基板228及第四連接部268而電性連接至模組基板100。第二連接部269可不在第三方向D3上對齊至第四連接部268。舉例而言,第二連接部269可在第一方向D1上相對於第四連接部268位移且可經由設置於第四基板228中的通孔及電路圖案而電性耦接至第四連接部268。第一連接部至第四連接部259、269、258、268之間的垂直對齊以及第一基板至第四基板210、220、218、228中的電路及通孔圖案的排列可有各種變化。第二連接部269及第四連接部268可為焊料或焊料球。A fourth substrate 228 is interposed between the module substrate 100 and the second substrate 220. The second tap 320 may be disposed on the bottom surface 220b of the second substrate 220. The second tap 320 is electrically connected to the module substrate 100 via the second substrate 220 , the second connecting portion 269 , the fourth substrate 228 , and the fourth connecting portion 268 . The second connection portion 269 may not be aligned to the fourth connection portion 268 in the third direction D3. For example, the second connecting portion 269 can be displaced relative to the fourth connecting portion 268 in the first direction D1 and can be electrically coupled to the fourth connecting portion via the through hole and the circuit pattern disposed in the fourth substrate 228 . 268. The vertical alignment between the first to fourth connection portions 259, 269, 258, 268 and the arrangement of the circuits and via patterns in the first to fourth substrates 210, 220, 218, 228 are variously variable. The second connection portion 269 and the fourth connection portion 268 may be solder or solder balls.
第一基板至第四基板210、220、218、228可設置於模組基板100的第一區R1上以使得半導體模組3的第一區R1的厚度A1能夠處於滿足半導體模組的標準的範圍內。堆疊於模組基板100上的第一基板至第四基板210、220、218、228的數目可不僅限於圖3B中所示者。模組基板100的第二區R2的厚度A2可小於半導體模組3的第一區R1的厚度A1。此外,模組基板100的厚度、第一基板210的厚度、第二基板220的厚度、第三基板218的厚度及/或第四基板228的厚度可為相同的。The first to fourth substrates 210, 220, 218, and 228 may be disposed on the first region R1 of the module substrate 100 such that the thickness A1 of the first region R1 of the semiconductor module 3 can meet the standard of the semiconductor module. Within the scope. The number of the first to fourth substrates 210, 220, 218, 228 stacked on the module substrate 100 may not be limited to those shown in FIG. 3B. The thickness A2 of the second region R2 of the module substrate 100 may be smaller than the thickness A1 of the first region R1 of the semiconductor module 3. Further, the thickness of the module substrate 100, the thickness of the first substrate 210, the thickness of the second substrate 220, the thickness of the third substrate 218, and/or the thickness of the fourth substrate 228 may be the same.
圖3C是說明根據本發明概念實施例的半導體模組的剖視圖。舉例而言,圖3說明沿圖1A所示的線I-I’截取的半導體模組的垂直剖面。為簡潔起見,可由相同的參考編號來辨識先前所述元件,而不再對其予以贅述。FIG. 3C is a cross-sectional view illustrating a semiconductor module in accordance with an embodiment of the inventive concept. For example, Figure 3 illustrates a vertical cross section of the semiconductor module taken along line I-I' shown in Figure 1A. For the sake of brevity, the previously described elements may be identified by the same reference numerals and will not be described again.
參照圖3C,半導體模組4可包括模組基板100、第一基板210、第二基板220、第一電子組件410、第二電子組件420、第一半導體晶片510、第二半導體晶片520、第一模具層610及第二模具層620。半導體模組4的第一區R1的厚度A1可處於滿足半導體模組的標準的範圍內。在第一基板210的底表面210b上可設置有第一墊215。在第二基板220的頂表面220a上可設置有第二墊225。Referring to FIG. 3C, the semiconductor module 4 may include a module substrate 100, a first substrate 210, a second substrate 220, a first electronic component 410, a second electronic component 420, a first semiconductor wafer 510, a second semiconductor wafer 520, and a A mold layer 610 and a second mold layer 620. The thickness A1 of the first region R1 of the semiconductor module 4 may be within a range that satisfies the standard of the semiconductor module. A first pad 215 may be disposed on the bottom surface 210b of the first substrate 210. A second pad 225 may be disposed on the top surface 220a of the second substrate 220.
在模組基板100與第一基板210之間可內插有第一連接部251。可使用各向異性導電膜(anisotropic conductive film)來作為第一連接部251。舉例而言,第一連接部251可包含第一絕緣聚合物251i及第一導電顆粒251c,且第一導電顆粒251c可設置於絕緣聚合物251i中。第一導電顆粒251c可耦合至第一墊215及上部墊115。模組基板100可經由第一導電顆粒251c而電性連接至第一分接頭310。A first connection portion 251 is interposed between the module substrate 100 and the first substrate 210. An anisotropic conductive film can be used as the first connecting portion 251. For example, the first connection portion 251 may include the first insulating polymer 251i and the first conductive particles 251c, and the first conductive particles 251c may be disposed in the insulating polymer 251i. The first conductive particles 251c may be coupled to the first pad 215 and the upper pad 115. The module substrate 100 can be electrically connected to the first tap 310 via the first conductive particles 251c.
在模組基板100與第二基板220之間可內插有第二連接部261。第二連接部261可包括各向異性導電膜。舉例而言,第二連接部261可包括第二絕緣聚合物261i及第二導電顆粒261c。第二導電顆粒261c可耦合至第二墊225及下部墊125,且因此,第二分接頭320可電性連接至模組基板100。A second connecting portion 261 may be interposed between the module substrate 100 and the second substrate 220. The second connection portion 261 may include an anisotropic conductive film. For example, the second connection portion 261 may include a second insulating polymer 261i and second conductive particles 261c. The second conductive particles 261c can be coupled to the second pad 225 and the lower pad 125, and thus, the second tap 320 can be electrically connected to the module substrate 100.
圖3D是說明根據本發明概念實施例的半導體模組的剖視圖。舉例而言,圖3D說明沿圖1A所示的線I-I’截取的半導體模組的垂直剖面。為簡潔起見,可由相同的參考編號來辨識先前所述元件,而不再對其予以贅述。FIG. 3D is a cross-sectional view illustrating a semiconductor module in accordance with an embodiment of the inventive concept. For example, Figure 3D illustrates a vertical cross section of the semiconductor module taken along line I-I' shown in Figure 1A. For the sake of brevity, the previously described elements may be identified by the same reference numerals and will not be described again.
參照圖3D,半導體模組5可包括模組基板100、第一基板210、第二基板220、第一電子組件410、第二電子組件420、第一半導體晶片510、第二半導體晶片520、第一模具層610及第二模具層620。Referring to FIG. 3D, the semiconductor module 5 may include a module substrate 100, a first substrate 210, a second substrate 220, a first electronic component 410, a second electronic component 420, a first semiconductor wafer 510, a second semiconductor wafer 520, and a second A mold layer 610 and a second mold layer 620.
第一連接部252可為或可包括結合導線。第一墊215可設置於第一基板210的頂表面210a上。第一分接頭310可經由以虛線繪示的第一基板210而耦合至第一墊215。第一連接部252可設置於第一基板210的頂表面210a上且可電性耦合至第一墊215及上部墊115。第一模具層610可自模組基板100的第二區R2的第一表面100a延伸以覆蓋第一基板210的頂表面210a的至少一部分。第一模具層610可被設置成密閉地覆蓋或密封第一墊215及第一連接部252並暴露出第一分接頭310。The first connection portion 252 can be or can include a bond wire. The first pad 215 may be disposed on the top surface 210a of the first substrate 210. The first tap 310 can be coupled to the first pad 215 via a first substrate 210, shown in dashed lines. The first connecting portion 252 can be disposed on the top surface 210 a of the first substrate 210 and can be electrically coupled to the first pad 215 and the upper pad 115 . The first mold layer 610 can extend from the first surface 100a of the second region R2 of the module substrate 100 to cover at least a portion of the top surface 210a of the first substrate 210. The first mold layer 610 can be configured to hermetically cover or seal the first pad 215 and the first connection portion 252 and expose the first tap 310.
第二連接部262可為或可包括結合導線。第二墊225可設置於第二基板220的底表面220b上。第二分接頭320可經由以虛線繪示的第二基板220而耦合至第二墊225。第二連接部262可設置於第二基板220的底表面220b上且可電性耦合至第二墊225及下部墊125。第二模具層620可延伸以覆蓋第二基板220的底表面220b的一部分並密閉地覆蓋或密封第二墊225及第二連接部262。第二分接頭320可被第二模具層620暴露出。The second connection portion 262 can be or can include a bond wire. The second pad 225 may be disposed on the bottom surface 220b of the second substrate 220. The second tap 320 can be coupled to the second pad 225 via a second substrate 220, shown in dashed lines. The second connecting portion 262 can be disposed on the bottom surface 220b of the second substrate 220 and can be electrically coupled to the second pad 225 and the lower pad 125. The second mold layer 620 may extend to cover a portion of the bottom surface 220b of the second substrate 220 and hermetically cover or seal the second pad 225 and the second connection portion 262. The second tap 320 can be exposed by the second mold layer 620.
圖4A是說明根據本發明概念實施例的半導體模組的剖視圖。舉例而言,圖4A說明沿圖1A所示的線I-I’截取的半導體模組的垂直剖面。為簡潔起見,可由相似或相同的參考編號來辨識先前所述元件,而不再對其予以贅述。4A is a cross-sectional view illustrating a semiconductor module in accordance with an embodiment of the present invention. For example, Figure 4A illustrates a vertical cross section of the semiconductor module taken along line I-I' shown in Figure 1A. For the sake of brevity, the previously described elements may be identified by similar or identical reference numerals and will not be described again.
參照圖4A,半導體模組6可除模組基板100、第一基板210、第一分接頭310、第二分接頭320、第二基板220、第一電子組件410、第二電子組件420、第一半導體晶片510、第二半導體晶片520、第一模具層610及第二模具層620以外亦包括第三半導體晶片530及記憶體晶片540。模組基板100、基板210及基板220、分接頭310及分接頭320、電子組件410及電子組件420、半導體晶片510及半導體晶片520以及模具層610及模具層620可被配置成具有與參照圖1A及圖1B所述的特徵相同或實質上相同的特徵。Referring to FIG. 4A, the semiconductor module 6 can be divided by the module substrate 100, the first substrate 210, the first tap 310, the second tap 320, the second substrate 220, the first electronic component 410, the second electronic component 420, and the A third semiconductor wafer 530 and a memory wafer 540 are also included in addition to the semiconductor wafer 510, the second semiconductor wafer 520, the first mold layer 610, and the second mold layer 620. The module substrate 100, the substrate 210 and the substrate 220, the tap 310 and the tap 320, the electronic component 410 and the electronic component 420, the semiconductor wafer 510 and the semiconductor wafer 520, and the mold layer 610 and the mold layer 620 may be configured to have a reference pattern. 1A and 1B have the same or substantially the same features.
半導體模組6可為固態驅動機(solid state drive,SSD)模組。舉例而言,半導體模組6可被配置成因應於來自外部電子裝置(例如圖2所示1000)的讀取/寫入請求自記憶體晶片540讀取資料或向記憶體晶片540寫入資料。第一分接頭310及第二分接頭320可用作將半導體模組6電性連接至電子裝置1000的訊號路徑。The semiconductor module 6 can be a solid state drive (SSD) module. For example, the semiconductor module 6 can be configured to read data from or write data to the memory chip 540 in response to a read/write request from an external electronic device (eg, 1000 shown in FIG. 2). . The first tap 310 and the second tap 320 can be used as a signal path for electrically connecting the semiconductor module 6 to the electronic device 1000.
記憶體晶片540可堆疊於模組基板100的第二區R2的第一表面100a上。如所示,記憶體晶片540可錯列堆疊,以使得結合導線可電性連接各記憶體晶片540。記憶體晶片540可為非揮發性記憶體晶片。舉例而言,記憶體晶片540可包括反及快閃記憶體裝置。作為另一選擇,記憶體晶片540可包括PRAM記憶體裝置、MRAM記憶體裝置、ReRAM記憶體裝置、鐵電式隨機存取記憶體(ferroelectric random access memory,FRAM)記憶體裝置或反或快閃記憶體裝置。記憶體晶片540的數目及排列可不僅限於圖4A中所示者。The memory chip 540 may be stacked on the first surface 100a of the second region R2 of the module substrate 100. As shown, the memory wafers 540 can be staggered in a stack such that the bond wires can be electrically connected to the respective memory wafers 540. Memory chip 540 can be a non-volatile memory chip. For example, memory chip 540 can include a reverse flash memory device. Alternatively, the memory chip 540 may include a PRAM memory device, an MRAM memory device, a ReRAM memory device, a ferroelectric random access memory (FRAM) memory device, or an anti-flash or flash Memory device. The number and arrangement of the memory chips 540 may not be limited to those shown in FIG. 4A.
第一半導體晶片510、第二半導體晶片520及第三半導體晶片530中的一者可充當介面,另一者可充當控制器,而其餘一者可充當緩衝記憶體晶片(buffer memory chip)。為簡明起見,以下說明將提及第一半導體晶片510、第二半導體晶片520及第三半導體晶片530分別用作介面、控制器及緩衝記憶體晶片的實例;但本發明概念可並非僅限於此。One of the first semiconductor wafer 510, the second semiconductor wafer 520, and the third semiconductor wafer 530 may serve as an interface, the other may serve as a controller, and the other may serve as a buffer memory chip. For the sake of brevity, the following description will refer to the first semiconductor wafer 510, the second semiconductor wafer 520, and the third semiconductor wafer 530 as examples of interfaces, controllers, and buffer memory wafers, respectively; however, the inventive concept may not be limited to this.
第一半導體晶片510可包括輸入/輸出介面電路。舉例而言,第一半導體晶片510可被配置成根據主機(host)的匯流排格式在電子裝置1000與半導體模組6之間執行介面操作。The first semiconductor wafer 510 can include an input/output interface circuit. For example, the first semiconductor wafer 510 can be configured to perform an interface operation between the electronic device 1000 and the semiconductor module 6 in accordance with a bus bar format of a host.
第二半導體晶片520可被配置成控制經由第一半導體晶片510將記憶體晶片540連接至外部裝置(例如電子裝置1000)的操作。第二半導體晶片520可因應於來自電子裝置1000的命令自記憶體晶片540讀取資料或向記憶體晶片540寫入資料。第三半導體晶片530可用作緩衝記憶體晶片。舉例而言,第三半導體晶片530可暫時儲存欲在第二半導體晶片520與記憶體晶片540之間及/或第二半導體晶片520與電子裝置1000之間傳輸的資料。第三半導體晶片530可由至少一個隨機存取記憶體裝置(例如DRAM或靜態隨機存取記憶體(static random access memory,SRAM))組成或包括所述至少一個隨機存取記憶體裝置。The second semiconductor wafer 520 can be configured to control the operation of connecting the memory wafer 540 to an external device (eg, the electronic device 1000) via the first semiconductor wafer 510. The second semiconductor wafer 520 can read data from or write data to the memory wafer 540 in response to a command from the electronic device 1000. The third semiconductor wafer 530 can be used as a buffer memory wafer. For example, the third semiconductor wafer 530 can temporarily store material to be transferred between the second semiconductor wafer 520 and the memory wafer 540 and/or between the second semiconductor wafer 520 and the electronic device 1000. The third semiconductor wafer 530 can be comprised of or include at least one random access memory device (eg, DRAM or static random access memory (SRAM)).
作為另一實例,可省略第一半導體晶片至第三半導體晶片510、520、530中的至少一者。舉例而言,可省略第二半導體晶片520。在此種情形中,第一半導體晶片510或第三半導體晶片530可被配置成充當控制器。在某些實施例中,可省略第二半導體晶片520及第三半導體晶片530,且第一半導體晶片510可被配置成充當介面、控制器及緩衝記憶體晶片。As another example, at least one of the first to third semiconductor wafers 510, 520, 530 may be omitted. For example, the second semiconductor wafer 520 can be omitted. In this case, the first semiconductor wafer 510 or the third semiconductor wafer 530 may be configured to function as a controller. In some embodiments, the second semiconductor wafer 520 and the third semiconductor wafer 530 can be omitted, and the first semiconductor wafer 510 can be configured to function as an interface, a controller, and a buffer memory wafer.
圖4B是說明根據本發明概念實施例的半導體模組的剖視圖。舉例而言,圖4B說明沿圖1A所示的線I-I’截取的半導體模組的垂直剖面。為簡潔起見,可由相同的參考編號來辨識先前所述元件,而不再對其予以贅述。4B is a cross-sectional view illustrating a semiconductor module in accordance with an embodiment of the present invention. For example, Figure 4B illustrates a vertical cross section of the semiconductor module taken along line I-I' shown in Figure 1A. For the sake of brevity, the previously described elements may be identified by the same reference numerals and will not be described again.
參照圖4B,半導體模組7可除模組基板100、第一基板210、第二基板220、第一分接頭310、第二分接頭320、第一電子組件410、第二電子組件420、第一模具層610及第二模具層620以外更包括第一封裝550、第二封裝560及第三封裝570。Referring to FIG. 4B, the semiconductor module 7 can be removed from the module substrate 100, the first substrate 210, the second substrate 220, the first tap 310, the second tap 320, the first electronic component 410, the second electronic component 420, and the A die layer 610 and a second die layer 620 further include a first package 550, a second package 560, and a third package 570.
第一封裝550可設置於模組基板100的第二區R2的第一表面100a上。第一封裝550可包括第一封裝基板551、第一晶片552及第一模製圖案553。第一封裝550可經由第一連接端子555而電性連接至模組基板100。更具體而言,第一晶片552可經由第一封裝基板551而電性連接至模組基板100。第二封裝560可設置於模組基板100的第二區R2的第一表面100a上。第二封裝560可包括第二封裝基板561、第二晶片562及第二模製圖案563。在第二封裝基板561上可堆疊有多個第二晶片562。第二封裝560可經由第二連接端子565而耦合至模組基板100。更具體而言,各第二晶片562可彼此電性連接,並經由第二封裝基板561而電性連接至模組基板100。The first package 550 may be disposed on the first surface 100a of the second region R2 of the module substrate 100. The first package 550 may include a first package substrate 551, a first wafer 552, and a first molding pattern 553. The first package 550 can be electrically connected to the module substrate 100 via the first connection terminal 555 . More specifically, the first wafer 552 can be electrically connected to the module substrate 100 via the first package substrate 551. The second package 560 can be disposed on the first surface 100a of the second region R2 of the module substrate 100. The second package 560 can include a second package substrate 561, a second wafer 562, and a second molding pattern 563. A plurality of second wafers 562 may be stacked on the second package substrate 561. The second package 560 can be coupled to the module substrate 100 via the second connection terminal 565. More specifically, each of the second wafers 562 can be electrically connected to each other and electrically connected to the module substrate 100 via the second package substrate 561 .
在模組基板100與第一基板210之間可內插有第一底部填充層611以密閉地覆蓋或密封第一連接部250。在模組基板100與第一電子組件410之間可內插有第一裝置底部填充層612。在模組基板100與第一封裝550之間及模組基板100與第二封裝560之間可分別內插有第一封裝底部填充層613及第二封裝底部填充層614。所述底部填充層在本發明中可為插入材料的底部填充層。第一模具層610可設置於模組基板100的第一表面100a上以覆蓋第一電子組件410、第一封裝550及第二封裝560。儘管未示出,然而可省略第一底部填充層611、第一裝置底部填充層612、第一封裝底部填充層613及第二封裝底部填充層614,且第一模具層610可被設置成密閉地覆蓋或密封第一連接部250、第一內插器415、第一連接端子555及第二連接端子565。在某些實施例中,可省略第一模具層610。A first underfill layer 611 may be interposed between the module substrate 100 and the first substrate 210 to hermetically cover or seal the first connection portion 250. A first device underfill layer 612 may be interposed between the module substrate 100 and the first electronic component 410. A first package underfill layer 613 and a second package underfill layer 614 may be interposed between the module substrate 100 and the first package 550 and between the module substrate 100 and the second package 560, respectively. The underfill layer may be an underfill layer of the intercalation material in the present invention. The first mold layer 610 can be disposed on the first surface 100a of the module substrate 100 to cover the first electronic component 410, the first package 550, and the second package 560. Although not shown, the first underfill layer 611, the first device underfill layer 612, the first package underfill layer 613, and the second package underfill layer 614 may be omitted, and the first mold layer 610 may be disposed to be hermetically sealed. The first connecting portion 250, the first interposer 415, the first connecting terminal 555, and the second connecting terminal 565 are covered or sealed. In some embodiments, the first mold layer 610 can be omitted.
第三封裝570可安裝於模組基板100的第二區R2的第一表面100a上。第三封裝570可包括下部封裝571及位於下部封裝571上的上部封裝575。下部封裝571可包括下部基板572、下部晶片573及下部模製圖案574。上部封裝575可包括上部基板576、上部晶片577及上部模製圖案578。在下部基板572與上部基板576之間可設置有連接凸塊579且連接凸塊579耦合至下部基板572及上部基板576。第三封裝570可經由第三連接端子585而耦合至模組基板100。下部基板572及上部基板576將上部晶片577電性連接至模組基板100,且下部基板572將下部晶片573電性連接至模組基板100。The third package 570 can be mounted on the first surface 100a of the second region R2 of the module substrate 100. The third package 570 can include a lower package 571 and an upper package 575 on the lower package 571. The lower package 571 may include a lower substrate 572, a lower wafer 573, and a lower molding pattern 574. The upper package 575 can include an upper substrate 576, an upper wafer 577, and an upper molding pattern 578. A connection bump 579 may be disposed between the lower substrate 572 and the upper substrate 576 and the connection bump 579 is coupled to the lower substrate 572 and the upper substrate 576. The third package 570 can be coupled to the module substrate 100 via the third connection terminal 585. The lower substrate 572 and the upper substrate 576 electrically connect the upper wafer 577 to the module substrate 100 , and the lower substrate 572 electrically connects the lower wafer 573 to the module substrate 100 .
在模組基板100與第二基板220之間可內插有第二底部填充層621以密閉地覆蓋或密封第二連接部260。在模組基板100與第二電子組件420之間可設置有第二裝置底部填充層622。在模組基板100與第三封裝570之間可設置有第三封裝底部填充層623。第二模具層620可設置於模組基板100的第二表面100b上以覆蓋第二電子組件420及第三封裝570。作為實例,可省略第二底部填充層621、第二裝置底部填充層622、第三封裝底部填充層623,且第二模具層620可被設置成密閉地覆蓋或密封第一連接部250、第二內插器425及第三連接端子585。在某些實施例中,可省略第二模具層620。A second underfill layer 621 may be interposed between the module substrate 100 and the second substrate 220 to hermetically cover or seal the second connection portion 260. A second device underfill layer 622 may be disposed between the module substrate 100 and the second electronic component 420. A third package underfill layer 623 may be disposed between the module substrate 100 and the third package 570. The second mold layer 620 can be disposed on the second surface 100b of the module substrate 100 to cover the second electronic component 420 and the third package 570. As an example, the second underfill layer 621, the second device underfill layer 622, and the third package underfill layer 623 may be omitted, and the second mold layer 620 may be disposed to hermetically cover or seal the first connection portion 250, The second interposer 425 and the third connection terminal 585. In some embodiments, the second mold layer 620 can be omitted.
在以上實施例中,第一封裝550可為記憶體控制器,第二封裝560可為非揮發性記憶體裝置,且第三封裝570可為應用處理器。In the above embodiment, the first package 550 can be a memory controller, the second package 560 can be a non-volatile memory device, and the third package 570 can be an application processor.
在下文中,將闡述製造半導體模組的製程。Hereinafter, a process for manufacturing a semiconductor module will be explained.
圖5A、圖6A及圖7A是根據本發明概念實施例說明製造半導體模組的製程的平面圖。圖5B、圖6B及圖7B是沿圖5A、圖6A及圖7A所示的線III-III’分別截取的剖面。為簡潔起見,可由相同的參考編號來辨識先前所述元件,而不再對其予以贅述。5A, 6A, and 7A are plan views illustrating a process of fabricating a semiconductor module in accordance with an embodiment of the present invention. 5B, 6B, and 7B are cross sections taken along lines III-III' shown in Figs. 5A, 6A, and 7A, respectively. For the sake of brevity, the previously described elements may be identified by the same reference numerals and will not be described again.
參照圖5A及圖5B,可提供包括多個模組區102的模組條帶(module strip)101。如圖5A中所示,當在平面圖中觀察時,模組區102可在第一方向D1及第二方向D2上排列。可由切割道(scribe line)151及切割道152界定模組區102。如圖5B中所示,切割道151及切割道152可為形成於模組條帶101的第一表面100a及第二表面100b上的凹陷區。模組區102中的每一者可包括第一區R1及第二區R2。在某些實施例中,可將模組條帶101配置成包括多個第一區R1。可將第一區R1設置成相鄰於模組條帶101的側邊101c。Referring to FIGS. 5A and 5B, a module strip 101 including a plurality of module regions 102 may be provided. As shown in FIG. 5A, the module area 102 can be arranged in the first direction D1 and the second direction D2 when viewed in a plan view. The module area 102 can be defined by a scribe line 151 and a scribe line 152. As shown in FIG. 5B, the scribe line 151 and the scribe line 152 may be recessed regions formed on the first surface 100a and the second surface 100b of the module strip 101. Each of the module areas 102 can include a first zone R1 and a second zone R2. In some embodiments, the module strip 101 can be configured to include a plurality of first regions R1. The first zone R1 can be disposed adjacent to the side 101c of the module strip 101.
可將第一連接墊131及第二連接墊132設置於模組條帶101的第二區R2上。可將第一連接墊131及第二連接墊132分別設置於模組條帶101的第一表面100a及第二表面100b上。模組條帶101可具有均勻厚度。舉例而言,模組條帶101的第二區R2的厚度A2可與第一區R1的厚度相同或實質上相同。The first connection pad 131 and the second connection pad 132 may be disposed on the second region R2 of the module strip 101. The first connection pad 131 and the second connection pad 132 may be respectively disposed on the first surface 100a and the second surface 100b of the module strip 101. The module strip 101 can have a uniform thickness. For example, the thickness A2 of the second region R2 of the module strip 101 may be the same as or substantially the same as the thickness of the first region R1.
參照圖6A及圖6B,可將第一基板210及第二基板220安裝於模組條帶101上。在某些實施例中,可準備設置有第一分接頭310的第一基板210。舉例而言,可使用印刷電路板來作為第一基板210,且第一分接頭310可為設置於第一基板210中的電路圖案中的某些電路圖案。可將第一基板210設置於模組條帶101的第一表面100a上。可將第一基板210設置於模組基板100的第一表面100a上且可將第一基板210設置成在第二方向D2上延伸並與多個模組區102交叉。當在平面圖中觀察時,第一基板210可與所述多個第一區R1重疊。第一基板210可不覆蓋第二區R2。Referring to FIGS. 6A and 6B, the first substrate 210 and the second substrate 220 may be mounted on the module strip 101. In some embodiments, the first substrate 210 provided with the first tap 310 can be prepared. For example, a printed circuit board can be used as the first substrate 210, and the first tap 310 can be some of the circuit patterns disposed in the first substrate 210. The first substrate 210 may be disposed on the first surface 100a of the module strip 101. The first substrate 210 may be disposed on the first surface 100a of the module substrate 100 and may be disposed to extend in the second direction D2 and intersect the plurality of module regions 102. The first substrate 210 may overlap the plurality of first regions R1 when viewed in a plan view. The first substrate 210 may not cover the second region R2.
可準備設置有第二分接頭320的第二基板220。可將第二基板220設置於模組條帶101的第二表面100b上。如圖6A中所示,可將第二基板220設置成在第二方向D2上延伸並與多個模組區102交叉。當在平面圖中觀察時,第二基板220可與第一區R1重疊。A second substrate 220 provided with a second tap 320 can be prepared. The second substrate 220 can be disposed on the second surface 100b of the module strip 101. As shown in FIG. 6A, the second substrate 220 may be disposed to extend in the second direction D2 and intersect the plurality of module regions 102. The second substrate 220 may overlap the first region R1 when viewed in a plan view.
模組條帶101的第一區R1可具有厚度A1,厚度A1被定義為第一分接頭310的頂表面與第二分接頭320的底表面之間的距離。模組條帶101的第一區R1的厚度A1可實質上等於或大於模組區102的第二區R2的厚度A2、第一基板210的厚度A3及第二基板220的厚度A4之和。可將第一基板210及第二基板220設置成使得模組條帶101的第一區R1的厚度A1能夠處於滿足半導體模組的標準的範圍內。模組條帶101的第二區R2的厚度A2可小於模組條帶101的第一區R1的厚度A1。The first zone R1 of the module strip 101 may have a thickness A1 defined as the distance between the top surface of the first tap 310 and the bottom surface of the second tap 320. The thickness A1 of the first region R1 of the module strip 101 may be substantially equal to or greater than the sum of the thickness A2 of the second region R2 of the module region 102, the thickness A3 of the first substrate 210, and the thickness A4 of the second substrate 220. The first substrate 210 and the second substrate 220 may be disposed such that the thickness A1 of the first region R1 of the module strip 101 can be within a range satisfying the standard of the semiconductor module. The thickness A2 of the second region R2 of the module strip 101 may be less than the thickness A1 of the first region R1 of the module strip 101.
參照圖7A及圖7B,可將第一半導體晶片510、第一電子組件410及第一模具層610安裝於模組條帶101的第一表面100a上。可將第二半導體晶片520、第二電子組件420及第二模具層620安裝於模組條帶101的第二表面100b上。結合圖1A及圖1B來參照圖7A及圖7B,可在模組條帶101上沿切割道151及152執行鋸切製程(sawing process),且因此,模組條帶101可被劃分成多個模組區102。在鋸切製程之後,可使用模組條帶101的模組區102中的每一者作為圖1A及圖1B所示模組基板100。在某些實施例中,可藉由鋸切製程將第一基板210、第二基板220以及模具層610及模具層620與模組條帶101一起進行劃分。所得結構可具有與參照圖1A及圖1B所述的半導體模組1相同的結構。Referring to FIGS. 7A and 7B, the first semiconductor wafer 510, the first electronic component 410, and the first mold layer 610 may be mounted on the first surface 100a of the module strip 101. The second semiconductor wafer 520, the second electronic component 420, and the second mold layer 620 can be mounted on the second surface 100b of the module strip 101. Referring to FIGS. 7A and 1B in conjunction with FIGS. 1A and 1B, a sawing process can be performed along the dicing streets 151 and 152 on the module strip 101, and thus, the module strip 101 can be divided into many Module area 102. After the sawing process, each of the module areas 102 of the module strip 101 can be used as the module substrate 100 shown in FIGS. 1A and 1B. In some embodiments, the first substrate 210, the second substrate 220, and the mold layer 610 and the mold layer 620 can be divided together with the module strip 101 by a sawing process. The resultant structure may have the same structure as the semiconductor module 1 described with reference to FIGS. 1A and 1B.
圖8A、圖8B及圖8C是根據本發明概念實施例,說明形成半導體模組的製程的剖視圖。為簡潔起見,可由相同的參考編號來辨識先前所述元件,而不再對其予以贅述。8A, 8B, and 8C are cross-sectional views illustrating a process of forming a semiconductor module, in accordance with an embodiment of the present invention. For the sake of brevity, the previously described elements may be identified by the same reference numerals and will not be described again.
參照圖8A,可準備第一基板210及模組基板100。舉例而言,第一基板210及模組基板100可由半導體材料(例如矽)形成或包含所述半導體材料。可在模組基板100的第一區R1上將第一基板210設置成使得第一基板210的第一墊215對齊至模組基板100的上部墊115。在沈積第一基板210之前,可在第一基板210的底表面210b及模組基板100的第一表面100a的第一區R1上執行電漿蝕刻製程(plasma etching process)及使用化學溶液的處理製程(treatment process)。可使用氧、氬、氮、CF4 或NH3 中的至少一者來執行電漿蝕刻製程。可使用氫氧化銨、NH4 F或HF作為化學溶液來執行處理製程。可執行所述電漿蝕刻製程及處理製程以在第一基板210的底表面210b及模組基板100的第一區R1的第一表面100a上形成活性官能基(activated functional group)。所述活性官能基可為Si-NH2 或Si-F。Referring to FIG. 8A, the first substrate 210 and the module substrate 100 can be prepared. For example, the first substrate 210 and the module substrate 100 may be formed of or comprise a semiconductor material such as germanium. The first substrate 210 may be disposed on the first region R1 of the module substrate 100 such that the first pad 215 of the first substrate 210 is aligned to the upper pad 115 of the module substrate 100. Before the deposition of the first substrate 210, a plasma etching process and a treatment using a chemical solution may be performed on the bottom surface 210b of the first substrate 210 and the first region R1 of the first surface 100a of the module substrate 100. Treatment process. The plasma etching process can be performed using at least one of oxygen, argon, nitrogen, CF 4 or NH 3 . The treatment process can be performed using ammonium hydroxide, NH 4 F or HF as a chemical solution. The plasma etching process and processing process may be performed to form an activated functional group on the bottom surface 210b of the first substrate 210 and the first surface 100a of the first region R1 of the module substrate 100. The reactive functional group can be Si-NH 2 or Si-F.
參照圖8B,可將第一基板210直接結合於模組基板100上。舉例而言,第一基板210的底表面210b上的活性官能基可與模組基板100的第一表面100a上的活性官能基反應,且因此,第一基板210可附接至模組基板100。可將第一墊215耦合至上部墊115,且因此,第一基板210可電性連接至模組基板100。可在室溫(例如約25℃)下對第一基板210執行直接結合(direct bonding)。作為另一實例,在將第一基板210附接至模組基板100的過程期間,可進一步在第一基板210上執行退火製程(annealing process)。可在為200℃或低於200℃的溫度下執行所述退火製程。Referring to FIG. 8B, the first substrate 210 may be directly bonded to the module substrate 100. For example, the reactive functional groups on the bottom surface 210b of the first substrate 210 can react with the reactive functional groups on the first surface 100a of the module substrate 100, and thus, the first substrate 210 can be attached to the module substrate 100. . The first pad 215 can be coupled to the upper pad 115, and thus, the first substrate 210 can be electrically connected to the module substrate 100. Direct bonding to the first substrate 210 can be performed at room temperature (for example, about 25 ° C). As another example, during the process of attaching the first substrate 210 to the module substrate 100, an annealing process may be further performed on the first substrate 210. The annealing process can be performed at a temperature of 200 ° C or less.
參照圖8C,可將第二基板220直接結合於模組基板100的第二表面100b上。第二基板220可由半導體材料(例如矽)形成或包含所述半導體材料。可使用與用於圖8A及圖8B所示第一基板210的方法相同的方法來對第二基板220執行直接結合。可將第一電子組件410、第一半導體晶片510及第一模具層610、第二電子組件420、第二半導體晶片520及第二模具層620安裝於模組基板100上。作為以上製程的結果,可製造出半導體模組8。Referring to FIG. 8C, the second substrate 220 may be directly bonded to the second surface 100b of the module substrate 100. The second substrate 220 may be formed of or comprise a semiconductor material such as germanium. Direct bonding can be performed on the second substrate 220 using the same method as that used for the first substrate 210 shown in FIGS. 8A and 8B. The first electronic component 410, the first semiconductor wafer 510 and the first mold layer 610, the second electronic component 420, the second semiconductor wafer 520, and the second mold layer 620 may be mounted on the module substrate 100. As a result of the above process, the semiconductor module 8 can be fabricated.
圖9A及圖9B是根據本發明概念實施例說明形成半導體模組的製程的剖視圖。舉例而言,圖9A及圖9B中的每一者說明沿圖1A所示的線I-I’截取的半導體模組的垂直剖面。為簡潔起見,可由相同的參考編號來辨識先前所述元件,而不再對其予以贅述。9A and 9B are cross-sectional views illustrating a process of forming a semiconductor module in accordance with an embodiment of the present invention. For example, each of FIGS. 9A and 9B illustrates a vertical cross section of the semiconductor module taken along line I-I' shown in FIG. 1A. For the sake of brevity, the previously described elements may be identified by the same reference numerals and will not be described again.
參照圖9A,可製造包括第一基板210及第二基板220的模組基板100。舉例而言,可準備具有第一分接頭310及第二分接頭320的模組基板100。此處,模組基板100可為印刷電路板。此後,可移除(例如藉由蝕刻、研磨(grinding)等)模組基板100的某些部分,以如由虛線繪示在模組基板100的頂表面及底表面上分別形成第一凹陷區121及第二凹陷區122。可將第一凹陷區121形成為界定第一基板210。模組基板100的第二區R2的第一表面100a可對應於第一凹陷區121的底表面且可定位於較第一基板210的頂表面210a低的水平高度處。可將第二凹陷區122形成為界定第二基板220。模組基板100的第二區R2的第二表面100b可對應於第二凹陷區122的底表面且可定位於較第二基板220的底表面220b低的水平高度處。結合圖1C及圖1D來參照圖9A,可以與參照圖1C或圖1D所述的方式相似的方式在第一基板210及第二基板220與模組基板100之間建立電連接。在某些實施例中,可省略圖1C及圖1D所示連接部250及連接部260,且可將第一基板201及第二基板220的第一導電圖案及第二導電圖案直接耦合至模組基板100的金屬圖案109。Referring to FIG. 9A, a module substrate 100 including a first substrate 210 and a second substrate 220 can be fabricated. For example, the module substrate 100 having the first tap 310 and the second tap 320 can be prepared. Here, the module substrate 100 may be a printed circuit board. Thereafter, certain portions of the module substrate 100 may be removed (eg, by etching, grinding, etc.) to form a first recessed region on the top and bottom surfaces of the module substrate 100 as indicated by dashed lines, respectively. 121 and the second recessed area 122. The first recessed region 121 may be formed to define the first substrate 210. The first surface 100a of the second region R2 of the module substrate 100 may correspond to a bottom surface of the first recess region 121 and may be positioned at a lower level than the top surface 210a of the first substrate 210. The second recessed region 122 may be formed to define the second substrate 220. The second surface 100b of the second region R2 of the module substrate 100 may correspond to a bottom surface of the second recess region 122 and may be positioned at a lower level than the bottom surface 220b of the second substrate 220. Referring to FIG. 9A in conjunction with FIG. 1C and FIG. 1D, an electrical connection can be established between the first substrate 210 and the second substrate 220 and the module substrate 100 in a manner similar to that described with reference to FIG. 1C or FIG. In some embodiments, the connecting portion 250 and the connecting portion 260 shown in FIG. 1C and FIG. 1D may be omitted, and the first conductive pattern and the second conductive pattern of the first substrate 201 and the second substrate 220 may be directly coupled to the module. The metal pattern 109 of the group substrate 100.
參照圖9B,可在第一凹陷區121中安裝第一電子組件410、第一半導體晶片510及第一模具層610,且可在第二凹陷區122中安裝第二電子組件420、第二半導體晶片520及第二模具層620。半導體模組9的第一區R1的厚度A1可大於模組基板100的第二區R2的厚度A2。因此,可製造出半導體模組9。Referring to FIG. 9B, the first electronic component 410, the first semiconductor wafer 510, and the first mold layer 610 may be mounted in the first recessed region 121, and the second electronic component 420 and the second semiconductor may be mounted in the second recessed region 122. Wafer 520 and second mold layer 620. The thickness A1 of the first region R1 of the semiconductor module 9 may be greater than the thickness A2 of the second region R2 of the module substrate 100. Therefore, the semiconductor module 9 can be manufactured.
根據本發明概念的某些實施例,半導體模組的第一區可插入至電子裝置中。第一基板及第二基板可安裝於模組基板的第一區上。第一基板及第二基板可被設置成使得半導體模組的第一區的厚度能夠處於滿足半導體模組的厚度的標準的範圍內。模組基板的第二區的厚度可小於半導體模組的第一區的厚度。半導體晶片可安裝於模組基板的第二區上。因此,可減小半導體封裝的尺寸。According to some embodiments of the inventive concept, a first region of a semiconductor module can be inserted into an electronic device. The first substrate and the second substrate may be mounted on the first region of the module substrate. The first substrate and the second substrate may be disposed such that the thickness of the first region of the semiconductor module can be within a range that satisfies the standard of the thickness of the semiconductor module. The thickness of the second region of the module substrate may be less than the thickness of the first region of the semiconductor module. The semiconductor wafer can be mounted on the second region of the module substrate. Therefore, the size of the semiconductor package can be reduced.
儘管已具體示出並闡述了本發明概念的示例性實施例,然而此項技術中具有通常知識者應理解,在不背離隨附申請專利範圍的精神及範圍的條件下,可作出形式及細節上的變化。While the exemplary embodiments of the present invention have been shown and described, it will be understood by those of ordinary skill in the art that the form and details can be made without departing from the spirit and scope of the appended claims. The change on.
1、2、3、4、5、6、7、8、9‧‧‧半導體模組
100‧‧‧模組基板
100a‧‧‧第一表面
100b‧‧‧第二表面
100c、101c‧‧‧側邊
101‧‧‧模組條帶
102‧‧‧模組區
109‧‧‧金屬圖案
115‧‧‧上部墊
121‧‧‧第一凹陷區
122‧‧‧第二凹陷區
125‧‧‧下部墊
131‧‧‧第一連接墊
132‧‧‧第二連接墊
151、152‧‧‧切割道
210‧‧‧基板/第一基板
210a、220a‧‧‧頂表面
210b、220b‧‧‧底表面
211‧‧‧第一基礎層
212‧‧‧第一通孔
213‧‧‧第一保護層
215‧‧‧第一墊
218‧‧‧第三基板
220‧‧‧基板/第二基板
221‧‧‧第二基礎層
222‧‧‧第二通孔
223‧‧‧第二保護層
224‧‧‧第二導電層
225‧‧‧第二墊
228‧‧‧第四基板
250‧‧‧連接部/第一連接部
251、252、259‧‧‧第一連接部
251c‧‧‧第一導電顆粒
251i‧‧‧絕緣聚合物/第一絕緣聚合物
258‧‧‧第三連接部
260‧‧‧連接部/第二連接部
261、262、269‧‧‧第二連接部
261c‧‧‧第二導電顆粒
261i‧‧‧第二絕緣聚合物
268‧‧‧第四連接部
310‧‧‧分接頭/第一分接頭
320‧‧‧分接頭/第二分接頭
410‧‧‧電子組件/第一電子組件
415‧‧‧第一內插器
420‧‧‧電子組件/第二電子組件
425‧‧‧第二內插器
510‧‧‧半導體晶片/第一半導體晶片
515‧‧‧第一端子
520‧‧‧半導體晶片/第二半導體晶片
525‧‧‧第二端子
530‧‧‧第三半導體晶片
540‧‧‧記憶體晶片
550‧‧‧第一封裝
551‧‧‧第一封裝基板
552‧‧‧第一晶片
553‧‧‧第一模製圖案
555‧‧‧第一連接端子
560‧‧‧第二封裝
561‧‧‧第二封裝基板
562‧‧‧第二晶片
563‧‧‧第二模製圖案
565‧‧‧第二連接端子
570‧‧‧第三封裝
571‧‧‧下部封裝
572‧‧‧下部基板
573‧‧‧下部晶片
574‧‧‧下部模製圖案
575‧‧‧上部封裝
576‧‧‧上部基板
577‧‧‧上部晶片
578‧‧‧上部模製圖案
579‧‧‧連接凸塊
585‧‧‧第三連接端子
610‧‧‧模具層/第一模具層
611‧‧‧第一底部填充層
612‧‧‧第一裝置底部填充層
613‧‧‧第一封裝底部填充層
614‧‧‧第二封裝底部填充層
620‧‧‧模具層/第二模具層
621‧‧‧第二底部填充層
622‧‧‧第二裝置底部填充層
623‧‧‧第三封裝底部填充層
1000‧‧‧電子裝置
1100‧‧‧連接器
1111‧‧‧第一導電墊
1112‧‧‧第二導電墊
A1、A2、A3、A4、A5‧‧‧厚度
B‧‧‧間隙距離
D1‧‧‧第一方向
D2‧‧‧第二方向
D3‧‧‧第三方向
I-I’、III-III’‧‧‧線
II‧‧‧部分
R1‧‧‧第一區
R2‧‧‧第二區1, 2, 3, 4, 5, 6, 7, 8, 9‧‧‧ semiconductor modules
100‧‧‧Module substrate
100a‧‧‧ first surface
100b‧‧‧ second surface
100c, 101c‧‧‧ side
101‧‧‧Modular strips
102‧‧‧Modular area
109‧‧‧Metal pattern
115‧‧‧Upper mat
121‧‧‧First recessed area
122‧‧‧Second depression
125‧‧‧lower pad
131‧‧‧First connection pad
132‧‧‧Second connection pad
151, 152‧‧ ‧ cutting road
210‧‧‧Substrate/first substrate
210a, 220a‧‧‧ top surface
210b, 220b‧‧‧ bottom surface
211‧‧‧ first base layer
212‧‧‧First through hole
213‧‧‧ first protective layer
215‧‧‧First pad
218‧‧‧ third substrate
220‧‧‧Substrate/second substrate
221‧‧‧Second base layer
222‧‧‧Second through hole
223‧‧‧Second protective layer
224‧‧‧Second conductive layer
225‧‧‧second pad
228‧‧‧fourth substrate
250‧‧‧Connection/First Connection
251, 252, 259‧‧‧ first connection
251c‧‧‧First conductive particles
251i‧‧‧Insulating Polymer / First Insulation Polymer
258‧‧‧ Third connection
260‧‧‧Connection/Second Connection
261, 262, 269‧ ‧ second connection
261c‧‧‧Second conductive particles
261i‧‧‧Second insulating polymer
268‧‧‧fourth connection
310‧‧‧ tap/first tap
320‧‧‧ tap/second tap
410‧‧‧Electronic components/first electronic components
415‧‧‧First interposer
420‧‧‧Electronic components/second electronic components
425‧‧‧Second interpolator
510‧‧‧Semiconductor wafer/first semiconductor wafer
515‧‧‧First terminal
520‧‧‧Semiconductor wafer/second semiconductor wafer
525‧‧‧second terminal
530‧‧‧ Third semiconductor wafer
540‧‧‧ memory chip
550‧‧‧first package
551‧‧‧First package substrate
552‧‧‧First chip
553‧‧‧First molded pattern
555‧‧‧First connection terminal
560‧‧‧second package
561‧‧‧Second package substrate
562‧‧‧second chip
563‧‧‧Second molding pattern
565‧‧‧Second connection terminal
570‧‧‧ Third package
571‧‧‧Lower package
572‧‧‧lower substrate
573‧‧‧lower wafer
574‧‧‧Lower molding pattern
575‧‧‧Upper package
576‧‧‧Upper substrate
577‧‧‧Upper wafer
578‧‧‧Upper moulding pattern
579‧‧‧connection bumps
585‧‧‧third connection terminal
610‧‧‧Mold layer/first mold layer
611‧‧‧First underfill layer
612‧‧‧The bottom layer of the first device
613‧‧‧First package underfill
614‧‧‧Second package underfill
620‧‧‧Mold layer / second mold layer
621‧‧‧Second underfill layer
622‧‧‧Second device underfill
623‧‧‧ Third package underfill
1000‧‧‧Electronic devices
1100‧‧‧Connector
1111‧‧‧First conductive pad
1112‧‧‧Second conductive pad
A1, A2, A3, A4, A5‧‧ thickness
B‧‧‧ clearance distance
D1‧‧‧ first direction
D2‧‧‧ second direction
D3‧‧‧ third direction
I-I', III-III'‧‧‧ line
Section II‧‧‧
R1‧‧‧ first district
R2‧‧‧Second District
藉由結合附圖閱讀以下簡要說明將更清楚地理解各示例性實施例。附圖代表本文所述各非限制性示例性實施例。 圖1A是說明根據本發明概念實施例的半導體模組的平面圖。 圖1B是沿圖1A所示的線I-I’截取的剖視圖。 圖1C是根據本發明概念實施例說明圖1B所示部分‘II’的放大剖視圖。 圖1D是根據本發明概念實施例說明圖1B所示部分‘II’的放大剖視圖。 圖2是根據本發明概念實施例示出如何將半導體模組連接至電子裝置的剖視圖。 圖3A是說明根據本發明概念實施例的半導體模組的剖視圖。 圖3B是說明根據本發明概念實施例的半導體模組的剖視圖。 圖3C是說明根據本發明概念實施例的半導體模組的剖視圖。 圖3D是說明根據本發明概念實施例的半導體模組的剖視圖。 圖4A是說明根據本發明概念實施例的半導體模組的剖視圖。 圖4B是說明根據本發明概念實施例的半導體模組的剖視圖。 圖5A、圖6A及圖7A是根據本發明概念實施例說明製造半導體模組的製程的平面圖。 圖5B、圖6B及圖7B是沿圖5A、圖6A及圖7A所示的線III-III’分別截取的剖面。 圖8A、圖8B及圖8C是根據本發明概念實施例說明形成半導體模組的製程的剖視圖。 圖9A及圖9B是根據本發明概念實施例說明形成半導體模組的製程的剖視圖。The exemplary embodiments will be more clearly understood from the following description of the appended claims. The drawings represent various non-limiting exemplary embodiments described herein. FIG. 1A is a plan view illustrating a semiconductor module in accordance with an embodiment of the inventive concept. Fig. 1B is a cross-sectional view taken along line I-I' shown in Fig. 1A. 1C is an enlarged cross-sectional view showing a portion 'II' of FIG. 1B according to an embodiment of the present invention. FIG. 1D is an enlarged cross-sectional view showing a portion 'II' of FIG. 1B according to an embodiment of the present invention. 2 is a cross-sectional view showing how a semiconductor module is connected to an electronic device in accordance with an embodiment of the present invention. FIG. 3A is a cross-sectional view illustrating a semiconductor module in accordance with an embodiment of the present invention. FIG. 3B is a cross-sectional view illustrating a semiconductor module in accordance with an embodiment of the present invention. FIG. 3C is a cross-sectional view illustrating a semiconductor module in accordance with an embodiment of the inventive concept. FIG. 3D is a cross-sectional view illustrating a semiconductor module in accordance with an embodiment of the inventive concept. 4A is a cross-sectional view illustrating a semiconductor module in accordance with an embodiment of the present invention. 4B is a cross-sectional view illustrating a semiconductor module in accordance with an embodiment of the present invention. 5A, 6A, and 7A are plan views illustrating a process of fabricating a semiconductor module in accordance with an embodiment of the present invention. 5B, 6B, and 7B are cross sections taken along lines III-III' shown in Figs. 5A, 6A, and 7A, respectively. 8A, 8B, and 8C are cross-sectional views illustrating a process of forming a semiconductor module in accordance with an embodiment of the present invention. 9A and 9B are cross-sectional views illustrating a process of forming a semiconductor module in accordance with an embodiment of the present invention.
1‧‧‧半導體模組 1‧‧‧Semiconductor Module
100‧‧‧模組基板 100‧‧‧Module substrate
100c‧‧‧側邊 100c‧‧‧ side
210‧‧‧基板/第一基板 210‧‧‧Substrate/first substrate
220‧‧‧基板/第二基板 220‧‧‧Substrate/second substrate
310‧‧‧分接頭/第一分接頭 310‧‧‧ tap/first tap
320‧‧‧分接頭/第二分接頭 320‧‧‧ tap/second tap
410‧‧‧電子組件/第一電子組件 410‧‧‧Electronic components/first electronic components
420‧‧‧電子組件/第二電子組件 420‧‧‧Electronic components/second electronic components
510‧‧‧半導體晶片/第一半導體晶片 510‧‧‧Semiconductor wafer/first semiconductor wafer
520‧‧‧半導體晶片/第二半導體晶片 520‧‧‧Semiconductor wafer/second semiconductor wafer
D1‧‧‧第一方向 D1‧‧‧ first direction
D2‧‧‧第二方向 D2‧‧‧ second direction
I-I’‧‧‧線 I-I’‧‧‧ line
R1‧‧‧第一區 R1‧‧‧ first district
R2‧‧‧第二區 R2‧‧‧Second District
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US15/465,072 | 2017-03-21 |
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