TW201713610A - Method for preparation of carboxylic acid chlorides from methyl ketones - Google Patents

Method for preparation of carboxylic acid chlorides from methyl ketones Download PDF

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TW201713610A
TW201713610A TW105118491A TW105118491A TW201713610A TW 201713610 A TW201713610 A TW 201713610A TW 105118491 A TW105118491 A TW 105118491A TW 105118491 A TW105118491 A TW 105118491A TW 201713610 A TW201713610 A TW 201713610A
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都爾瓦爾德 弗洛倫西奧 薩拉戈薩
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隆薩有限公司
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    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D333/00Heterocyclic compounds containing five-membered rings having one sulfur atom as the only ring hetero atom
    • C07D333/02Heterocyclic compounds containing five-membered rings having one sulfur atom as the only ring hetero atom not condensed with other rings
    • C07D333/04Heterocyclic compounds containing five-membered rings having one sulfur atom as the only ring hetero atom not condensed with other rings not substituted on the ring sulphur atom
    • C07D333/26Heterocyclic compounds containing five-membered rings having one sulfur atom as the only ring hetero atom not condensed with other rings not substituted on the ring sulphur atom with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached to ring carbon atoms
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    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C201/00Preparation of esters of nitric or nitrous acid or of compounds containing nitro or nitroso groups bound to a carbon skeleton
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    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C51/00Preparation of carboxylic acids or their salts, halides or anhydrides
    • C07C51/58Preparation of carboxylic acid halides
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    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D307/00Heterocyclic compounds containing five-membered rings having one oxygen atom as the only ring hetero atom
    • C07D307/02Heterocyclic compounds containing five-membered rings having one oxygen atom as the only ring hetero atom not condensed with other rings
    • C07D307/34Heterocyclic compounds containing five-membered rings having one oxygen atom as the only ring hetero atom not condensed with other rings having two or three double bonds between ring members or between ring members and non-ring members
    • C07D307/56Heterocyclic compounds containing five-membered rings having one oxygen atom as the only ring hetero atom not condensed with other rings having two or three double bonds between ring members or between ring members and non-ring members with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached to ring carbon atoms
    • C07D307/68Carbon atoms having three bonds to hetero atoms with at the most one bond to halogen
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    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D413/00Heterocyclic compounds containing two or more hetero rings, at least one ring having nitrogen and oxygen atoms as the only ring hetero atoms
    • C07D413/02Heterocyclic compounds containing two or more hetero rings, at least one ring having nitrogen and oxygen atoms as the only ring hetero atoms containing two hetero rings
    • C07D413/12Heterocyclic compounds containing two or more hetero rings, at least one ring having nitrogen and oxygen atoms as the only ring hetero atoms containing two hetero rings linked by a chain containing hetero atoms as chain links

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Abstract

The invention discloses a method for the preparation of carboxylic acid chlorides starting from methyl ketones with a sulfur chloride.

Description

一種由甲基酮製備羧酸氯化物的方法Method for preparing carboxylic acid chloride from methyl ketone

本發明公開了一種使用氯化硫由甲基酮起始製備羧酸氯化物的方法。The present invention discloses a process for preparing a carboxylic acid chloride starting from a methyl ketone using sulfur chloride.

羧酸氯化物是重要的合成中間體,其可用於醯胺、酯、酮和各種雜環的製備。醯氯通常是由羧酸製備,但在有些情況下,這些羧酸是不容易獲得的。Carboxylic acid chlorides are important synthetic intermediates useful in the preparation of guanamines, esters, ketones and various heterocycles. Neodymium chloride is usually prepared from carboxylic acids, but in some cases these carboxylic acids are not readily available.

用於將芳烴或雜芳烴直接轉化成芳醯氯的方法包括所述芳烴或雜芳烴與草醯氯的反應。US 2002/0062043 A1公開了一種通過在路易士酸的存在下使聯苯與草醯氯反應製備聯苯甲醯氯的方法。然而,草醯氯是相對昂貴的試劑。A process for the direct conversion of an aromatic or heteroaromatic hydrocarbon to aryl sulfonium chloride comprises the reaction of the aromatic or heteroaromatic hydrocarbon with oxalic acid chloride. US 2002/0062043 A1 discloses a process for the preparation of benzamidine chloride by reacting biphenyl with grass mash in the presence of Lewis acid. However, grass ash is a relatively expensive reagent.

Newman, M.S.,等人,Organic Syntheses 1937,17,65,公開了通過鹵仿反應由甲基-β-萘酮製備β-萘甲酸。為了獲得醯基氯,需要第二反應步驟。鹵仿反應需要在水以及稀釋的系統中完成,而且殘餘的次氯酸鹽需要在反應後被破壞,該破壞可以例如用亞硫酸鹽進行。所有這一切會產生顯著量的廢水和鹽,如氯化物、亞硫酸鹽和硫酸鹽。Newman, M.S., et al., Organic Syntheses 1937, 17, 65, discloses the preparation of beta-naphthoic acid from methyl-beta-naphthone by haloform reaction. In order to obtain mercapto chloride, a second reaction step is required. The haloform reaction needs to be carried out in water as well as in a dilute system, and the residual hypochlorite needs to be destroyed after the reaction, which can be carried out, for example, with sulfite. All of this produces significant amounts of wastewater and salts such as chlorides, sulfites and sulfates.

在路易士酸的存在下,用光氣、雙光氣或三光氣處理芳烴或雜芳烴通常產生顯著量的相應的對稱酮的副產物。Neubert, M.E.,等人,Organic Syntheses 1983, 61, 8,公開了用光氣製備苯甲醯氯並討論了可以通過尤其是使用過量的草醯氯減小酮的形成,這又是昂貴的。Treatment of aromatic or heteroaromatic hydrocarbons with phosgene, diphosgene or triphosgene in the presence of Lewis acid typically produces significant amounts of by-products of the corresponding symmetric ketones. Neubert, M.E., et al., Organic Syntheses 1983, 61, 8, discloses the preparation of benzamidine chloride from phosgene and discusses that the formation of ketones can be reduced by, inter alia, the use of an excess of grass mash, which is again expensive.

然而,芳烴或雜芳烴的弗裡德爾-克拉夫茨乙醯化,通常以各種各樣的不同的起始材料以高產率進行。如果使用富電子的芳烴或雜芳烴作為起始材料,則弗裡德爾-克拉夫茨乙醯化通常可以僅用催化量的酸並以環境友好的方式進行(參見,例如,G. Sartori, R. Maggi, Chem. Rev. 2006, 1077-1104)。因此,乙醯化的芳烴或雜芳烴是容易獲得的化合物。However, Friedel-Crafts acetylation of aromatic or heteroaromatic hydrocarbons is usually carried out in high yields from a wide variety of different starting materials. If an electron-rich aromatic or heteroaromatic hydrocarbon is used as the starting material, Friedel-Crafts acetylation can usually be carried out using only a catalytic amount of acid and in an environmentally friendly manner (see, for example, G. Sartori, R Maggi, Chem. Rev. 2006, 1077-1104). Therefore, an ethoxylated aromatic or heteroaromatic hydrocarbon is a readily available compound.

噻吩甲醯氯是重要的合成中間體,例如用於藥物和農用化學品的合成。它們可以通過許多不同的途徑製備,每種途徑都具有優點和缺點。特別感興趣的是僅需要廉價的起始材料和試劑、容易執行、並且僅產生少量廢物的那些方法。Thiophene chloride is an important synthetic intermediate, for example for the synthesis of pharmaceuticals and agrochemicals. They can be prepared in a number of different ways, each with advantages and disadvantages. Of particular interest are those methods that require only inexpensive starting materials and reagents, are easy to perform, and produce only a small amount of waste.

2-噻吩甲醯氯是用於製備Tioxazafen(殺線蟲劑)的中間體,其CAS號為330459-31-9以及其化學名稱為3-苯基-5-(噻吩-2-基)-1,2,4-惡二唑,並且其為式(THIOXA-1)化合物。 2-Thienylguanidinium chloride is an intermediate for the preparation of Tioxazafen (nematicidal), its CAS number is 330459-31-9 and its chemical name is 3-phenyl-5-(thiophen-2-yl)-1 , 2,4-oxadiazole, and which is a compound of the formula (THIOXA-1).

WO 2014/ 008257A2公開了式(THIOXA-1)化合物的製備。The preparation of compounds of the formula (THIOXA-1) is disclosed in WO 2014/008257 A2.

5-氯-2-噻吩甲醯氯是用於製備利伐沙班(抗血栓形成劑)的中間體,其CAS號為366789-02-8以及其化學名稱為(S)-5-氯-N-{2-氧代-3- [4-(3-氧代嗎啉-4-基)苯基] -1,3-惡唑啉-5-基甲基}噻吩-2-甲醯胺,並且其為式(RIVA-1)化合物。5-Chloro-2-thiophenecarboxamidine chloride is an intermediate for the preparation of rivaroxaban (antithrombotic agent) having a CAS number of 366789-02-8 and a chemical name of (S)-5-chloro- N-{2-oxo-3-[4-(3-oxomorpholin-4-yl)phenyl]-1,3-oxazolin-5-ylmethyl}thiophene-2-carboxamide And it is a compound of the formula (RIVA-1).

US 2003/0153610 A1公開了利伐沙班及其製備方法,US 2015/0133657 A1公開了它的另一種製備方法,美國專利6,107,519公開了在所述製備中使用的某些前驅物。A rivaroxaban and a process for its preparation are disclosed in US 2003/0153610 A1, which discloses another process for its preparation, US Patent No. 6,107,519, which discloses certain precursors used in the preparation.

Adiwidjaja 等人,Angew. Chem. Int. Ed. Engl. 1980, 19, 563-564,報導了亞硫醯氯與在吡啶中的苯乙酮的反應,該反應分別提供產率為36%和15%的苯甲醯氯和式(8b)化合物的混合物。 Adiwidjaja et al., Angew. Chem. Int. Ed. Engl. 1980, 19, 563-564, reported the reaction of sulfinium chloride with acetophenone in pyridine, which provides yields of 36% and 15 respectively. a mixture of % benzamidine chloride and a compound of formula (8b).

因此Adiwidjaja公開了由脂肪族甲基酮向芳族甲基酮的轉化降低了產量並且導致了所需產物與副產物的混合物。Thus Adiwidjaja discloses that the conversion of an aliphatic methyl ketone to an aromatic methyl ketone reduces yield and results in a mixture of the desired product and by-products.

Edwards 等人, J. Org. Chem. 1966, 31, 1283 to 1285,在1284頁右欄第二段公開了噻吩對酸敏感並且一旦用氯化鋁處理則聚合成焦油:“使用噻吩、氯化鋁和相同的酸酐,焦油的形成是如此之大,以致於結果是毫無意義的”。Edwards et al., J. Org. Chem. 1966, 31, 1283 to 1285, in the second paragraph of the right column on page 1284, discloses that thiophenes are acid sensitive and are polymerized to tar once treated with aluminum chloride: "Using thiophene, chlorination Aluminum and the same anhydride, the formation of tar is so great that the result is meaningless."

需要一種用於製備諸如苯甲醯氯或噻吩甲醯氯之類的羧酸氯化物的方法,該方法具有很少的步驟,具有高產率,允許該製備沒有副產物或者至少僅有少量的副產物,由相對廉價的物質起始,不強制需要昂貴的草醯氯,不強制需要氯化鋁或次氯酸鹽,不會產生大量的如例如氯化鋁、次氯酸鹽或亞硫酸鹽會產生的鹽那樣的鹽,甚至可以在沒有溶劑的情況下進行,並且當使其擴大以適應生產時不強制要求使用連續反應器裝置。There is a need for a process for the preparation of a carboxylic acid chloride such as benzamidine chloride or thiophene guanidine chloride which has few steps with high yields, allowing the preparation to be free of by-products or at least only minor amounts of The product, starting from a relatively inexpensive material, does not necessarily require expensive grassy chlorine, does not necessarily require aluminum chloride or hypochlorite, and does not produce large amounts such as, for example, aluminum chloride, hypochlorite or sulfite. Salts such as salts that can be produced can even be carried out without a solvent, and it is not mandatory to use a continuous reactor unit when it is expanded to accommodate production.

出乎意料地發現了一種滿足上述要求的製備諸如苯甲醯氯和噻吩甲醯氯之類的羧酸氯化物的方法,該方法是使用相當廉價的氯化硫由諸如苯乙酮和乙醯噻吩之類的相應的甲基酮前驅物起始的。與Adiwidjaja和Edwards所公開的內容相反,該方法的產率和純度都相當高,沒有如在Adiwidjaja的公開文本中所提到的顯著量的副產物形成,不需要氯化鋁、次氯酸鹽或亞硫酸鹽,該反應甚至可以在沒有溶劑的情況下進行,不強制需要連續反應器裝置,以及作為基質的甲基酮是容易獲得的(例如,在芳族甲基酮的情況下,通過弗裡德爾-克拉夫茨乙醯化獲得)並因此也是相對廉價的。有利的是不需要草醯氯,取而代之的是使用氯化硫,按照分子量其價格低於使用草醯氯的二十分之一。Unexpectedly, a method for preparing a carboxylic acid chloride such as benzamidine chloride and thiophene guanidine chloride which satisfies the above requirements is used, which is to use a relatively inexpensive sulfur chloride such as acetophenone and ethyl hydrazine. The corresponding methyl ketone precursor such as thiophene is initiated. Contrary to what is disclosed by Adiwidjaja and Edwards, the yield and purity of the process are quite high, without the formation of significant amounts of by-products as mentioned in the Adiwidjaja publication, without the need for aluminum chloride, hypochlorite Or sulfite, the reaction can be carried out even without a solvent, it is not mandatory to require a continuous reactor unit, and methyl ketone as a substrate is readily available (for example, in the case of aromatic methyl ketones, Friedel-Krafts is obtained and is therefore relatively inexpensive. It is advantageous not to use grass chlorinated chlorine, but instead use sulphur chloride, which is less than one-twentieth of the molecular weight of the grass.

出乎意料地,所要求保護的方法的產率,如在實施例7和實施例12中示出的產率遠遠超過70%,比Adiwidjaja所公開的方法的產率較高,Adiwidjaja報導了苯乙酮向苯甲醯氯的相應的轉化的產率為36%。Unexpectedly, the yield of the claimed method, as shown in Example 7 and Example 12, far exceeds 70%, which is higher than the yield of the method disclosed by Adiwidjaja, Adiwidjaja reported The yield of the corresponding conversion of acetophenone to benzamidine chloride was 36%.

在下面的文本, 環境壓強    通常指1巴,具體視天氣而定; 鹵化物     指F- 、Cl- 、Br- 或I- ,較佳Cl- 、Br- 或I- ,更佳Cl- 或Br- ; 鹵素            指F、Cl、Br或I,較佳Cl、Br或I,更佳Cl或Br; MeTHF      甲基四氫呋喃 MTBE        甲基叔丁基醚 THF            四氫呋喃; wt-%           重量百分比; 如果沒有另外說明。In the text below, the ambient pressure is usually 1 bar, depending on the weather; halide refers to F - , Cl - , Br - or I - , preferably Cl - , Br - or I - , more preferably Cl - or Br - Halogen means F, Cl, Br or I, preferably Cl, Br or I, more preferably Cl or Br; MeTHF methyltetrahydrofuran MTBE methyl tert-butyl ether THF tetrahydrofuran; wt-% by weight; if not stated otherwise .

本發明的主題是一種用於製備式(III)化合物的方法;所述方法包括步驟ST2; ST2包括式(Ⅱ)化合物與化合物SULFCHLO的反應REAC2;SULFCHLO是S2 Cl2 、SCl2 、或它們的混合物; 其中 R100選自由以下組成的組 苯基, 經由1、2、3、4或5個相同的或不同的彼此獨立地選自由鹵素、C1-6 烷基、C3-8 環烷基、C1-4 烷氧基、NO2 、CF3 、CN、N(R13)(R14)R15、苄基、苯基和經取代的苯基組成的組的取代基取代的苯基,其中該經取代的苯基由1、2、3、4或5個相同的或不同的彼此獨立地選自由鹵素、C1-6 烷基、C3-8 環烷基、C1-4 烷氧基、NO2 、CF3 、CN和N(R16)(R17)R18組成的組的取代基取代, 萘基, 經由1、2、3、4、5、6或7個相同的或不同的彼此獨立地選自由鹵素、C1-6 烷基、C3-8 環烷基、C1-4 烷氧基、NO2 、CF3 、CN、N(R13)(R14)R15、苄基、苯基和經取代的苯基組成的組的取代基取代的萘基,其中該經取代的苯基由1、2、3、4或5個相同的或不同的彼此獨立地選自由鹵素、C1-6 烷基、C3-8 環烷基、C1-4 烷氧基、NO2 、CF3 、CN和N(R16)(R17)R18組成的組的取代基取代, 以及式(RES-I) 殘基;式(RES-I)中的該(*) 表示分別連接到式(III)中的C(O)Cl殘基和式(II)中的C(O)CH3 殘基的鍵; X1是O、S或N-R110; R13、R14、R15、R16、R17和R18是相同的或不同的且彼此獨立地選自由H和C1-8 烷基組成的組; R1、R2 和R3    是相同的或不同的且彼此獨立地選自由H、鹵素、CO2 R4、C(O)Cl、苯基、2-吡啶基、NO2 、CN、CF3 、C1-8 烷基和C1-8 烷氧基組成的組; 或 R1和R2一起表示-CH=CH-CH=CH-並與噻吩環一起形成苯並噻吩,以及 R3選自由H、鹵素、CO2 R4、C(O)Cl、苯基、2-吡啶基、NO2 、CN、CF3 、C1-8 烷基和C1-8 烷氧基組成的組; R4是C1-6 烷基 R101、R102和R103    是相同的或不同的且彼此獨立地為C1-10 烷基、鹵素或苯基; R110是C1-6 烷基或苯基。The subject of the invention is a process for the preparation of a compound of formula (III); The method comprises the step ST2; ST2 comprises the reaction REAC2 of the compound of the formula (II) and the compound SULFCHLO; SULFCHLO is S 2 Cl 2 , SCl 2 , or a mixture thereof; wherein R100 is selected from the group consisting of phenyl groups, which are independently selected from halogen, C via 1, 2, 3, 4 or 5 identical or different 1-6 alkyl, C 3-8 cycloalkyl, C 1-4 alkoxy, NO 2 , CF 3 , CN, N(R13)(R14)R15, benzyl, phenyl and substituted phenyl a substituted group of substituted phenyl groups, wherein the substituted phenyl group is selected from 1, 2, 3, 4 or 5 identical or different independently of each other selected from the group consisting of halogen, C 1-6 alkyl, C 3 Substituted by a group consisting of -8 cycloalkyl, C 1-4 alkoxy, NO 2 , CF 3 , CN and N(R16)(R17)R18, naphthyl, via 1, 2, 3, 4, 5, 6 or 7 identical or different independently of each other selected from the group consisting of halogen, C 1-6 alkyl, C 3-8 cycloalkyl, C 1-4 alkoxy, NO 2 , CF 3 , CN, N (R13) (R14) a substituted naphthyl group of a group consisting of R15, a benzyl group, a phenyl group and a substituted phenyl group, wherein the substituted phenyl group is the same as 1, 2, 3, 4 or 5 Or different from each other independently selected from halogen, C 1-6 alkyl, C 3-8 cycloalkyl, C 1-4 alkoxy, NO 2 , CF 3 , C Substituent substitution of the group consisting of N and N(R16)(R17)R18, and a residue of the formula (RES-I); The (*) in the formula (RES-I) represents a bond respectively bonded to the C(O)Cl residue in the formula (III) and the C(O)CH 3 residue in the formula (II); X1 is O , S or N-R110; R13, R14, R15, R16, R17 and R18 are the same or different and are independently selected from the group consisting of H and C 1-8 alkyl; R1, R2 and R3 are the same Or different and independently selected from H, halogen, CO 2 R 4 , C(O)Cl, phenyl, 2-pyridyl, NO 2 , CN, CF 3 , C 1-8 alkyl and C 1-8 a group consisting of alkoxy groups; or R1 and R2 together represent -CH=CH-CH=CH- and together with the thiophene ring form benzothiophene, and R3 is selected from H, halogen, CO 2 R 4 , C(O)Cl, a group consisting of phenyl, 2-pyridyl, NO 2 , CN, CF 3 , C 1-8 alkyl and C 1-8 alkoxy; R 4 is C 1-6 alkyl R101, R102 and R103 are the same Or different and independently of each other, C 1-10 alkyl, halogen or phenyl; R110 is C 1-6 alkyl or phenyl.

較佳地,在R100為經取代的苯基的情況下,則該苯基經由1、2、3、4或5個相同的或不同的彼此獨立地選自由鹵素、C1-6 烷基、C3-6 環烷基、C1-4 烷氧基、NO2 、CF3 、CN、苄基、苯基和經取代的苯基組成的組的取代基取代,該經取代的苯基由1、2、3、4或5個相同的或不同的彼此獨立地選自由鹵素、C1-6 烷基、C3-6 環烷基、C1-4 烷氧基、NO2 、CF3 和CN組成的組的取代基取代;      更佳地,該苯基經由1、2或3個相同的或不同的彼此獨立地選自由F、Cl、Br、C1-4 烷基、C3 環烷基、C5 環烷基、C6 環烷基、C1-2 烷氧基、NO2 、CF3 、苯基和經取代的苯基組成的組的取代基取代,其中該經取代的苯基由1個選自由F、Cl、Br、C1-4 烷基、C3 環烷基、C5 環烷基、C6 環烷基、C1-2 烷氧基、NO2 和CF3 組成的組的取代基取代;     甚至更佳地,該苯基經由1或2個相同的或不同的彼此獨立地選自由F、Cl、Br、C1-4 烷基、C3 環烷基、C5 環烷基、C6 環烷基、C1-2 烷氧基、NO2 、CF3 、苯基和經取代的苯基組成的組的取代基取代,其中該經取代的苯基由1個選自由F、Cl、Br、C1-4 烷基、C3 環烷基、C5 環烷基、C6 環烷基、C1-2 烷氧基、NO2 和CF3 組成的組的取代基取代;     特別是,該苯基經由1或2個相同的或不同的彼此獨立地選自由F、Cl、Br、甲基、乙基、叔丁基、C6 環烷基、C1-2 烷氧基、NO2 、CF3 、苯基、和經取代的苯基組成的組的取代基取代,該經取代的苯基由1個選自由F、Cl、Br、甲基、乙基、叔丁基、C6 環烷基、C1-2 烷氧基、NO2 和CF3 組成的組的取代基取代。Preferably, in the case where R100 is a substituted phenyl group, the phenyl group is selected from 1, 2, 3, 4 or 5 identical or different independently of each other from a halogen, a C 1-6 alkyl group, Substituted by a substituent of the group consisting of C 3-6 cycloalkyl, C 1-4 alkoxy, NO 2 , CF 3 , CN, benzyl, phenyl, and substituted phenyl, substituted phenyl 1, 2, 3, 4 or 5 identical or different independently of each other selected from the group consisting of halogen, C 1-6 alkyl, C 3-6 cycloalkyl, C 1-4 alkoxy, NO 2 , CF 3 Substituted with a substituent of the group consisting of CN; more preferably, the phenyl group is independently selected from F, Cl, Br, C 1-4 alkyl, C 3 ring via 1, 2 or 3 identical or different a substituent substituted with a group consisting of an alkyl group, a C 5 cycloalkyl group, a C 6 cycloalkyl group, a C 1-2 alkoxy group, a NO 2 , a CF 3 group, a phenyl group, and a substituted phenyl group, wherein the substituted group The phenyl group is selected from the group consisting of F, Cl, Br, C 1-4 alkyl, C 3 cycloalkyl, C 5 cycloalkyl, C 6 cycloalkyl, C 1-2 alkoxy, NO 2 and CF. Substituting a substituent of the group consisting of 3 ; even more preferably, the phenyl group is independently selected from each other via 1 or 2 identical or different Of F, Cl, Br, C 1-4 alkyl, C 3 cycloalkyl, C 5 cycloalkyl, C 6 cycloalkyl, C 1-2 alkoxy, NO 2, CF 3, phenyl, and by Substituted by a substituent consisting of a substituted phenyl group, wherein the substituted phenyl group is selected from the group consisting of F, Cl, Br, C 1-4 alkyl, C 3 cycloalkyl, C 5 cycloalkyl, C Substituent substitution of a group consisting of 6 cycloalkyl, C 1-2 alkoxy, NO 2 and CF 3 ; in particular, the phenyl group is independently selected from F, Cl via 1 or 2 identical or different Substituted by a group consisting of Br, methyl, ethyl, tert-butyl, C 6 cycloalkyl, C 1-2 alkoxy, NO 2 , CF 3 , phenyl, and substituted phenyl, The substituted phenyl group is composed of one selected from the group consisting of F, Cl, Br, methyl, ethyl, t-butyl, C 6 cycloalkyl, C 1-2 alkoxy, NO 2 and CF 3 . Substituent substitution.

較佳地,在R100為經取代的萘基的情況下,則該萘基經由1、2、3、4或5個相同的或不同的彼此獨立地選自由鹵素、C1-6 烷基、C3-6 環烷基、C1-4 烷氧基、NO2 、CF3 、CN、苄基、苯基和經取代的苯基組成的組的取代基取代,其中該經取代的苯基由1、2、3、4或5個相同的或不同的彼此獨立地選自由鹵素、C1-6 烷基、C3-6 環烷基、C1-4 烷氧基、NO2 、CF3 和CN組成的組的取代基取代; 更佳地,該萘基經由1或2個相同的或不同的彼此獨立地選自由F、Cl、Br、C1-4 烷基、C3 環烷基、C5 環烷基、C6 環烷基、C1-2 烷氧基、NO2 、CF3 、苯基和經取代的苯基組成的組的取代基取代,該經取代的苯基由1個選自由F、Cl、Br、C1-4 烷基、C3 環烷基、C5 環烷基、C6 環烷基、C1-2 烷氧基、NO2 和CF3 組成的組的取代基取代; 甚至更佳地,該萘基經由1或2個相同的或不同的彼此獨立地選自由F、Cl、Br、C1-4 烷基、C3 環烷基、C5 環烷基、C6 環烷基、C1-2 烷氧基、NO2 、CF3 、苯基和經取代的苯基組成的組的取代基取代,其中該經取代的苯基由1個選自由F、Cl、Br、C1-4 烷基、C3 環烷基、C5 環烷基、C6 環烷基、C1-2 烷氧基、NO2 和CF3 組成的組的取代基取代; 特別是,該萘基經由1或2個相同的或不同的彼此獨立地選自由F、Cl、Br、甲基、乙基、叔丁基、C6 環烷基、C1-2 烷氧基、NO2 、CF3 、苯基、經取代的苯基組成的組的取代基取代,該經取代的苯基由1個選自由F、Cl、Br、甲基、乙基、叔丁基、C6 環烷基、C1-2 烷氧基、NO2 和CF3 組成的組的取代基取代。Preferably, in the case where R100 is a substituted naphthyl group, the naphthyl group is selected from 1, 2, 3, 4 or 5 identical or different independently of each other from a halogen, a C 1-6 alkyl group, Substituted by a substituent of the group consisting of C 3-6 cycloalkyl, C 1-4 alkoxy, NO 2 , CF 3 , CN, benzyl, phenyl, and substituted phenyl, wherein the substituted phenyl group of 3, 4 or 5 identical or different are independently selected from the group consisting of halo, C 1-6 alkyl, C 3-6 cycloalkyl, C 1-4 alkoxy, NO 2, CF Substituting a substituent of the group consisting of 3 and CN; more preferably, the naphthyl group is independently selected from F, Cl, Br, C 1-4 alkyl, C 3 naphthenic groups via 1 or 2 identical or different independently of each other. Substituted by a substituent of the group consisting of C 5 cycloalkyl, C 6 cycloalkyl, C 1-2 alkoxy, NO 2 , CF 3 , phenyl and substituted phenyl, substituted phenyl Consists of one selected from the group consisting of F, Cl, Br, C 1-4 alkyl, C 3 cycloalkyl, C 5 cycloalkyl, C 6 cycloalkyl, C 1-2 alkoxy, NO 2 and CF 3 Substituted substituents; even more preferably, the naphthyl group is independently selected from F or Cl via 1 or 2 identical or different Br, C 1-4 alkyl, C 3 cycloalkyl, C 5 cycloalkyl, C 6 cycloalkyl, C 1-2 alkoxy, NO 2, CF 3, phenyl and substituted phenyl groups Substituted substituents of the group wherein the substituted phenyl group is selected from the group consisting of F, Cl, Br, C 1-4 alkyl, C 3 cycloalkyl, C 5 cycloalkyl, C 6 cycloalkyl, Substituent substitution of a group consisting of C 1-2 alkoxy, NO 2 and CF 3 ; in particular, the naphthyl group is independently selected from F, Cl, Br, methyl via 1 or 2 identical or different Substituted by a substituent of the group consisting of ethyl, tert-butyl, C 6 cycloalkyl, C 1-2 alkoxy, NO 2 , CF 3 , phenyl, substituted phenyl, substituted phenyl Substituted by a substituent selected from the group consisting of F, Cl, Br, methyl, ethyl, t-butyl, C 6 cycloalkyl, C 1-2 alkoxy, NO 2 and CF 3 .

較佳地,並在R100為式(RES-I) 殘基的情況下,式(III)化合物中的C(O)Cl殘基和式(II)化合物的C(O)CH3 殘基都在式(RES-I) 殘基的2位上。Preferably, and in the case where R100 is a residue of the formula (RES-I), the C(O)Cl residue in the compound of formula (III) and the C(O)CH 3 residue of the compound of formula (II) are both At the 2 position of the residue of the formula (RES-I).

較佳地,R1、R2 和R3是相同的或不同的且彼此獨立地選自由H、F、Cl、Br、CO2 R4、C(O)Cl、苯基、2-吡啶基、NO2 、CN、CF3 、C1-4 烷基和C1-2 烷氧基組成的組;或者 R1和R2一起表示-CH=CH-CH=CH-並與噻吩環一起形成苯並噻吩,以及 R3選自由H、F、Cl、Br、CO2 R4、C(O)Cl、苯基、2-吡啶基、NO2 、CN、CF3 、C1-4 烷基和C1-2 烷氧基組成的組; R4是C1-4 烷基; 在另一個較佳的實施方式中,R1、R2 和R3是相同的或不同的且彼此獨立地選自由H、Cl、Br、CO2 R4、NO2 、CN、CF3 、C1-4 烷基和C1-2 烷氧基組成的組;以及 R4  是C1-4 烷基; 更佳地,R1、R2 和R3    是相同的或不同的且彼此獨立地選自由H、F、Cl、Br、CO2 R4、C(O)Cl、苯基、2-吡啶基、NO2 、CF3 、甲基和甲氧基組成的組;或者 R1和R2一起表示-CH=CH-CH=CH-並與噻吩環一起形成苯並噻吩,以及 R3選自由H、F、Cl、Br、CO2 R4、C(O)Cl、苯基、2-吡啶基、NO2 、CF3 、甲基和甲氧基組成的組; R4是C1-2 烷基; 在另一個較佳的實施方式中,R1、R2 和R3是相同的或不同的且彼此獨立地選自由H、Cl、Br、CO2 R4、C(O)Cl 、苯基、NO2 、CN、CF3 、C1-2 烷基和C1-2 烷氧基組成的組;以及 R4 是C1-2 烷基。Preferably, R1, R2 and R3 are the same or different and are independently selected from H, F, Cl, Br, CO 2 R 4 , C(O)Cl, phenyl, 2-pyridyl, NO 2 , a group consisting of CN, CF 3 , C 1-4 alkyl and C 1-2 alkoxy; or R 1 and R 2 together represent -CH=CH-CH=CH- and together with the thiophene ring form benzothiophene, and R3 Free choice of H, F, Cl, Br, CO 2 R 4 , C (O) Cl, phenyl, 2-pyridyl, NO 2 , CN, CF 3 , C 1-4 alkyl and C 1-2 alkoxy a group consisting of; R 4 is a C 1-4 alkyl group; in another preferred embodiment, R 1 , R 2 and R 3 are the same or different and are independently selected from H, Cl, Br, CO 2 R 4 , a group consisting of NO 2 , CN, CF 3 , C 1-4 alkyl and C 1-2 alkoxy; and R 4 is a C 1-4 alkyl group; more preferably, R 1 , R 2 and R 3 are the same or different And independently of each other selected from the group consisting of H, F, Cl, Br, CO 2 R 4 , C(O)Cl, phenyl, 2-pyridyl, NO 2 , CF 3 , methyl and methoxy; R1 and R2 together represent -CH=CH-CH=CH- and form a benzothiophene together with the thiophene ring, and R3 is selected from the group consisting of H, F, Cl, Br, CO 2 R 4 , C(O)Cl, phenyl, 2 -pyridine Group NO 2, CF 3, methyl and methoxy group consisting of; R4 is C 1-2 alkyl; In another preferred embodiment, R1, R2 and R3 are the same or different and independently of one another Selected from the group consisting of H, Cl, Br, CO 2 R4, C(O)Cl, phenyl, NO 2 , CN, CF 3 , C 1-2 alkyl and C 1-2 alkoxy; and R 4 It is a C 1-2 alkyl group.

特別是,式(RES-I) 殘基選自由以下組成的組In particular, the residue of the formula (RES-I) is selected from the group consisting of , , , , , , , , , , , , , , , , , , , , .

更特別是,R1是H或Cl,以及R2和R3為H。More particularly, R1 is H or Cl, and R2 and R3 are H.

更特別地,式(RES-I) 殘基為式(RES-I-1-X1)殘基或式(RES-I-2-X)殘基; 甚至更特別地,式(RES-I) 殘基為式(RES-I-1)殘基或式(RES-I-2)殘基。 More particularly, the residue of the formula (RES-I) is a residue of the formula (RES-I-1-X1) or a residue of the formula (RES-I-2-X); Even more particularly, the residue of formula (RES-I) is a residue of formula (RES-I-1) or a residue of formula (RES-I-2).

式(III)化合物的具體實施方式選自由式(III-1)化合物、式(III-2) 化合物和式(III-3)化合物組成的組。 A specific embodiment of the compound of formula (III) is selected from the group consisting of a compound of formula (III-1), a compound of formula (III-2) and a compound of formula (III-3).

較佳地,R101、R102和R103是相同的或不同的且彼此獨立地為C1-10 烷基、F、Cl或苯基; 更佳地,R101、R102和R103為甲基、F、Cl或苯基。Preferably, R101, R102 and R103 are the same or different and independently of each other are C1-10 alkyl, F, Cl or phenyl; more preferably, R101, R102 and R103 are methyl, F, Cl Or phenyl.

較佳地,R 110 是甲基或苯基。Preferably, R 110 is methyl or phenyl.

較佳地,X1是O或S,更較佳地,X1是S。Preferably, X1 is O or S, and more preferably, X1 is S.

較佳地,R100選自由苯基、經取代的苯基、萘基、經取代的萘基和其中X1 為 O 或S的式(RES-I)殘基組成的組, 更佳地,R100選自由苯基、經取代的苯基、萘基、經取代的萘基和其中X1 為 S的式(RES-I)殘基組成的組; 以及本文所述的所有的它們的實施方式。Preferably, R100 is selected from the group consisting of a phenyl group, a substituted phenyl group, a naphthyl group, a substituted naphthyl group, and a residue of the formula (RES-I) wherein X1 is O or S, more preferably, R100 is selected. Free phenyl, substituted phenyl, naphthyl, substituted naphthyl, and the group of formula (RES-I) wherein X1 is S; and all of their embodiments described herein.

較佳地,SULFCHLO的摩爾量是基於式(II)化合物的摩爾量的2至50倍,更佳2至35倍,甚至更佳2至25倍,特別​​是2至15倍,更特別是2到10倍,甚至更特別是2到7倍。Preferably, the molar amount of SULFCHLO is 2 to 50 times, more preferably 2 to 35 times, even more preferably 2 to 25 times, particularly 2 to 15 times, more particularly based on the molar amount of the compound of the formula (II). It is 2 to 10 times, and even more especially 2 to 7 times.

較佳地,重複利用任意過量的SULFCHLO。Preferably, any excess of SULFCHLO is reused.

已知S2 Cl2 ,也稱為二氯化二硫或者甚至被稱為一氯化硫,一旦接觸水(例如,空氣的水分)則分解成HCl、SO2 和硫。還已知S2 Cl2 一旦加熱則分解成SCl2 ,也稱為二氯化硫,並分解成其它硫氯化物。此外,S2 Cl2 通過硫的氯化製備,並且具體取決於所用的精確反應條件和純化方法,可商購的S2 Cl2 可能含有不同量的氯氣和SCl2 。因此SULFCHLO,即在REAC2中使用的,較佳以化合物COMPSULFCHLO的形式使用,COMPSULFCHLO可以具有各種性質、各種雜質含量和各種雜質分佈。 因此COMPSULFCHLO可能包含例如高達5%、10%、20%、30%或甚至高達50%的氯氣、氯化氫、SO2 、硫,或在SULFCHLO為S2 Cl2 的情況下為SCl2 ,或者所述雜質的混合物,該%為基於COMPSULFCHLO的總重量計的重量%。It is known that S 2 Cl 2 , also known as disulfide dichloride or even known as sulfur monochloride, decomposes into HCl, SO 2 and sulfur upon contact with water (for example, moisture in air). It is also known that upon heating, S 2 Cl 2 decomposes into SCl 2 , also known as sulfur dichloride, and decomposes into other sulphur chlorides. Furthermore, S 2 Cl 2 is prepared by chlorination of sulfur, and depending on the precise reaction conditions and purification methods used, commercially available S 2 Cl 2 may contain varying amounts of chlorine and SCl 2 . Thus SULFCHLO, ie used in REAC2, is preferably used in the form of the compound COMPSULFCHLO, which can have various properties, various impurity levels and various impurity distributions. Thus COMPSULFCHLO may contain, for example, up to 5%, 10%, 20%, 30% or even up to 50% chlorine, hydrogen chloride, SO 2 , sulfur, or SCl 2 in the case of SULFCHLO as S 2 Cl 2 , or A mixture of impurities, this % is % by weight based on the total weight of COMPSULFCHLO.

因此較佳地,COMPSULFCHLO包含50至100%、更佳為70至100%、甚至更佳80至100%、特別是90至100%、更特別是95至100%的SULFCHLO,該%為基於COMPSULFCHLO的總重量計的重量%。Preferably, however, COMPSULFCHLO comprises from 50 to 100%, more preferably from 70 to 100%, even more preferably from 80 to 100%, especially from 90 to 100%, more particularly from 95 to 100%, of SULFCHLO, which is based on COMPSULFCHLO % by weight of the total weight.

S2 Cl2 和SCl2 是REAC2的等價試劑。S2 Cl2 是市售的。S 2 Cl 2 and SCl 2 are equivalent reagents for REAC2. S 2 Cl 2 is commercially available.

較佳地,SULFCHLO是S2 Cl2Preferably, SULFCHLO is S 2 Cl 2 .

較佳地,REAC2在溫度TEMP2 下進行,該溫度TEMP2為-20℃至250℃、更佳-10℃至200℃,甚至更佳0℃至175℃,特別是40℃至175℃。Preferably, REAC2 is carried out at a temperature TEMP2 of from -20 ° C to 250 ° C, more preferably from -10 ° C to 200 ° C, even more preferably from 0 ° C to 175 ° C, especially from 40 ° C to 175 ° C.

TEMP2在反應過程中可以改變,以便反應在溫度分佈下進行。TEMP2 can be changed during the reaction so that the reaction proceeds under a temperature distribution.

較佳地,REAC2在以下壓強下進行:環境壓強至100巴、更佳環境壓強至75巴、甚至更佳環境壓強至50巴、特別是環境壓強至30巴、更特別是環境壓強至25巴、甚至更特別是環境壓強至20巴。Preferably, REAC2 is carried out at a pressure of from ambient to 100 bar, more preferably from ambient pressure to 75 bar, even more preferably from ambient pressure to 50 bar, especially from ambient pressure to 30 bar, more particularly from ambient pressure to 25 bar. Even more particularly the environmental pressure is 20 bar.

REAC2的壓強可以根據所選擇的REAC2溫度和SULFCHLO的沸點進行調整。The pressure of REAC2 can be adjusted according to the selected REAC2 temperature and the boiling point of SULFCHLO.

較佳地,REAC2的反應時間TIME2為1h至96 h、更佳2h至60 h、甚至更佳3h至48 h。Preferably, the reaction time TIME2 of REAC2 is from 1 h to 96 h, more preferably from 2 h to 60 h, even more preferably from 3 h to 48 h.

較佳地,REAC2在鹼或鹼的鹽的存在下進行。Preferably, REAC2 is carried out in the presence of a salt of a base or a base.

較佳地,鹼是BAS2,而鹼的鹽是BAS2的鹽; BAS2選自由吡啶、甲基吡啶,氯吡啶、甲基乙基吡啶、4-(二甲基氨基)吡啶、N(R10)(R11)R12、1,4-二氮雜雙環[2.2.2]辛烷、Phe-N(R20)R21、及其混合物組成的組; R10、R11和R12  是相同的或不同的,並且彼此獨立地為C1-8 烷基; R20和R21   是相同的或不同的,並且彼此獨立地為C1-8 烷基; 以及BAS2的鹽選自由鹽酸鹽、氫溴酸鹽、乙酸鹽和三氟乙酸鹽組成的組。Preferably, the base is BAS2 and the base salt is a salt of BAS2; BAS2 is selected from the group consisting of pyridine, picoline, chloropyridine, methylethylpyridine, 4-(dimethylamino)pyridine, N(R10) ( R11) a group consisting of R12, 1,4-diazabicyclo[2.2.2]octane, Phe-N(R20)R21, and mixtures thereof; R10, R11 and R12 are the same or different and independent of each other Is a C 1-8 alkyl group; R 20 and R 21 are the same or different and are independently C 1-8 alkyl; and the salt of BAS 2 is selected from the group consisting of hydrochloride, hydrobromide, acetate and a group consisting of fluoroacetates.

較佳地,R10、R11和R12  是相同的或不同的,並且彼此獨立地為C1-4 烷基; R20和R21   是相同的或不同的,並且彼此獨立地為Cl-2 烷基。Preferably, R10, R11 and R12 are the same or different and independently from each other C 1-4 alkyl; R20 and R21 are the same or different and independently of one another C l-2 alkyl.

更佳地,BAS2選自由吡啶、2-甲基吡啶、3-甲基吡啶、4-甲基吡啶、2-氯吡啶、2-甲基-5-乙基吡啶、三乙胺、三丁胺、1,4-二氮雜雙環 [2.2.2]辛烷、N,N-二甲基苯胺、以及它們的混合物組成的組; 甚至更佳地,BAS2選自由吡啶、3-甲基吡啶、2-氯吡啶、2-甲基-5-乙基吡啶、三乙胺、三丁胺、以及它們的混合物組成的組; 特別是,BAS2選自由吡啶、3-甲基吡啶、2-氯吡啶、2-甲基-5-乙基吡啶、以及它們的混合物組成的組。More preferably, BAS2 is selected from the group consisting of pyridine, 2-methylpyridine, 3-methylpyridine, 4-methylpyridine, 2-chloropyridine, 2-methyl-5-ethylpyridine, triethylamine, tributylamine a group consisting of 1,4-diazabicyclo[2.2.2]octane, N,N-dimethylaniline, and mixtures thereof; even more preferably, BAS2 is selected from the group consisting of pyridine, 3-methylpyridine, a group consisting of 2-chloropyridine, 2-methyl-5-ethylpyridine, triethylamine, tributylamine, and mixtures thereof; in particular, BAS2 is selected from the group consisting of pyridine, 3-methylpyridine, 2-chloropyridine a group consisting of 2-methyl-5-ethylpyridine, and mixtures thereof.

較佳地,BAS2的鹽選自由鹽酸鹽、乙酸鹽和三氟乙酸鹽組成的組; 更佳地,BAS2的鹽選自由鹽酸鹽和乙酸鹽組成的組。Preferably, the salt of BAS2 is selected from the group consisting of hydrochloride, acetate and trifluoroacetate; more preferably, the salt of BAS2 is selected from the group consisting of hydrochloride and acetate.

較佳地,BAS2的摩爾量是基於式(II)化合物的摩爾量的0.001至1倍,更佳0.005至0.5倍,以及甚至更佳0.01至0.3倍。Preferably, the molar amount of BAS2 is 0.001 to 1 times, more preferably 0.005 to 0.5 times, and even more preferably 0.01 to 0.3 times the molar amount of the compound of the formula (II).

REAC2可以不摻水進行,即在沒有溶劑的情況下,或者REAC2可以在溶劑SOLV2中進行,SOLV2選自由苯、甲苯、二甲苯、氯苯、硝基苯、苯甲醚、二氯苯、二氯乙烷、三氯乙烷、以及它們的混合物組成的組; 較佳地,SOLV2選自由甲苯、鄰二甲苯、間二甲苯、對二甲苯、氯苯、硝基苯、苯甲醚、1,2-二氯苯、1,3-二氯苯、1,4-二氯苯、1,2-二氯乙烷、以及它們的混合物組成的組; 更佳地,SOLV2選自由甲苯、鄰二甲苯、間二甲苯、對二甲苯、氯苯、1,2-二氯乙烷、以及它們的混合物組成的組。REAC2 can be carried out without water, that is, in the absence of a solvent, or REAC2 can be carried out in a solvent SOLV2 selected from the group consisting of benzene, toluene, xylene, chlorobenzene, nitrobenzene, anisole, dichlorobenzene, a group consisting of ethyl chloride, trichloroethane, and mixtures thereof; preferably, SOLV2 is selected from the group consisting of toluene, o-xylene, m-xylene, p-xylene, chlorobenzene, nitrobenzene, anisole, 1 a group consisting of 2-dichlorobenzene, 1,3-dichlorobenzene, 1,4-dichlorobenzene, 1,2-dichloroethane, and mixtures thereof; more preferably, SOLV2 is selected from toluene, ortho A group consisting of xylene, m-xylene, p-xylene, chlorobenzene, 1,2-dichloroethane, and mixtures thereof.

較佳地,SOLV2的重量為式(II)化合物的重量的0.5至100倍、更佳為1至50倍。Preferably, the weight of SOLV2 is from 0.5 to 100 times, more preferably from 1 to 50 times the weight of the compound of formula (II).

較佳地,重複利用任意的SOLV2。Preferably, any SOLV2 is reused.

較佳地,在REAC2中不使用溶劑。Preferably, no solvent is used in REAC2.

ST2在REAC2之後可以包括步驟ST-HEAT2,在ST-HEAT2中,使來自REAC2的反應混合物經受升高的溫度TEMP-HEAT2,TEMP-HEAT2較佳為80 ℃至250 ℃、更佳為100 ℃ 至200 ℃、甚至更佳為120 ℃ 至175 ℃。ST2 may include step ST-HEAT2 after REAC2, and in ST-HEAT2, the reaction mixture from REAC2 is subjected to elevated temperature TEMP-HEAT2, preferably TEMP-HEAT2 is from 80 °C to 250 °C, more preferably 100 °C 200 ° C, even more preferably 120 ° C to 175 ° C.

該反應混合物經受TEMP-HEAT2的時間TIME-HEAT2較佳為30 min 至96 h、更佳為1h至60 h、甚至更佳為2 h至48 h。The time TIME-HEAT2 of the reaction mixture subjected to TEMP-HEAT2 is preferably from 30 min to 96 h, more preferably from 1 h to 60 h, even more preferably from 2 h to 48 h.

在較佳的實施方式中,REAC2首先在溫度TEMP1下進行時間TIME1,然後在溫度TEMP2下進行時間TIME2; TEMP1為40至85℃, TIME1為2至60 h, TEMP2為135至145℃,以及 TIME2為10 至25 h; 更佳地, TEMP2為50至80℃, TIME2為3至10 h, TEMP-HEAT2為135至145℃,以及 TIME-HEAT2為10 至25 h。In a preferred embodiment, REAC2 first performs time TIME1 at temperature TEMP1 and then TIME2 at temperature TEMP2; TEMP1 is 40 to 85 °C, TIME1 is 2 to 60 h, TEMP2 is 135 to 145 °C, and TIME2 More preferably, TEMP2 is 50 to 80 ° C, TIME 2 is 3 to 10 h, TEMP-HEAT 2 is 135 to 145 ° C, and TIME-HEAT 2 is 10 to 25 h.

在另一個較佳的實施方式中,REAC2首先在溫度TEMP1下進行時間TIME1,然後在溫度TEMP2下進行時間TIME2; TEMP2-1為-20℃至100℃, TIME2-1為0.1 h 至 48 h, TEMP2-2為85℃至250℃,以及 TIME2-2為0.9 h至48 h; 更特別是, TEMP2-1為‑10℃至95℃, TIME2-1為0.5 h至30 h, TEMP2-2為90℃至200℃,以及 TIME2-2為1.5 h 至30 h; 甚至更特別是, TEMP2-1為0℃至90℃, TIME2-1為1 h 至24 h, TEMP2-2為100 ℃至175 ℃,以及 TIME2-2為2 h至24 h。In another preferred embodiment, REAC2 first performs time TIME1 at temperature TEMP1 and then TIME2 at temperature TEMP2; TEMP2-1 is -20 °C to 100 °C, and TIME2-1 is 0.1 h to 48 h, TEMP2-2 is 85 ° C to 250 ° C, and TIME 2-2 is 0.9 h to 48 h; more specifically, TEMP2-1 is ‐10 ° C to 95 ° C, TIME 2-1 is 0.5 h to 30 h, TEMP 2-2 is 90 ° C to 200 ° C, and TIME 2-2 is 1.5 h to 30 h; even more specifically, TEMP2-1 is 0 ° C to 90 ° C, TIME2-1 is 1 h to 24 h, and TEMP 2-2 is 100 ° C to 175 °C, and TIME2-2 is 2 h to 24 h.

ST-HEAT2可以在溶劑SOLV-HEAT2中進行,SOLV-HEAT2選自由苯、甲苯、二甲苯、氯苯、硝基苯、苯甲醚、二氯苯、二氯乙烷、以及它們的混合物組成的組; 較佳地,SOLV-HEAT2選自由甲苯、鄰二甲苯、間二甲苯、對二甲苯、氯苯、硝基苯、苯甲醚、1,2-二氯苯、1,3-二氯苯、1,4-二氯苯、1,2-二氯乙烷、以及它們的混合物組成的組; 更佳地,SOLV-HEAT2選自由甲苯、鄰二甲苯、間二甲苯、對二甲苯、氯苯、1,2-二氯乙烷、以及它們的混合物組成的組。ST-HEAT2 can be carried out in a solvent SOLV-HEAT2 selected from the group consisting of benzene, toluene, xylene, chlorobenzene, nitrobenzene, anisole, dichlorobenzene, dichloroethane, and mixtures thereof. Preferably, SOLV-HEAT2 is selected from the group consisting of toluene, o-xylene, m-xylene, p-xylene, chlorobenzene, nitrobenzene, anisole, 1,2-dichlorobenzene, 1,3-dichloro a group consisting of benzene, 1,4-dichlorobenzene, 1,2-dichloroethane, and mixtures thereof; more preferably, SOLV-HEAT2 is selected from the group consisting of toluene, o-xylene, m-xylene, p-xylene, a group consisting of chlorobenzene, 1,2-dichloroethane, and mixtures thereof.

較佳地,SOLV-HEAT2的重量為式(II)化合物的重量的0.5至100倍、更優選為1至50倍。Preferably, the weight of SOLV-HEAT2 is from 0.5 to 100 times, more preferably from 1 to 50 times the weight of the compound of formula (II).

較佳地,重複利用任意的SOLV-HEAT2。Preferably, any SOLV-HEAT2 is reused.

取決於SOLV-HEAT2的沸點和所需的TEMP-HEAT2,ST-HEAT2可以在相應的必要的或較高的壓強下進行。Depending on the boiling point of SOLV-HEAT2 and the desired TEMP-HEAT2, ST-HEAT2 can be carried out at the corresponding necessary or higher pressure.

如果同時使用SOLV2和SOLV-HEAT2兩者,則較佳SOLV2和SOLV-HEAT2是相同的。If both SOLV2 and SOLV-HEAT2 are used at the same time, preferably SOLV2 and SOLV-HEAT2 are the same.

在ST2後,式(III)化合物可以通過本領域技術人員公知的方法分離並純化。這些方法包括,例如,蒸餾(較佳可以在減壓下進行的分餾)、結晶、萃取、或這些方法的組合。After ST2, the compound of formula (III) can be isolated and purified by methods well known to those skilled in the art. These methods include, for example, distillation (preferably fractionation under reduced pressure), crystallization, extraction, or a combination of these methods.

較佳地,在REAC2 之後或者在ST2之後,蒸發掉任意的SOLV2,得到與醚混合的第一殘餘物。該醚較佳為醚ETH,ETH較佳選自由二乙醚、THF、甲基四氫呋喃、甲基叔丁基醚和二惡烷組成的組。將所得的混合物過濾並濃縮,較佳在減壓條件下,得到第二殘餘物。該第二殘餘物與烷烴ALK混合, ALK較佳選自由C5-8 烷烴、C5-8 環烷烴及其混合物組成的組; 更佳地,ALK選自由己烷、庚烷、辛烷、環己烷、甲基環己烷及其混合物組成的組; 更佳地更佳地,ALK選自由正己烷、正庚烷、環己烷、甲基環己烷及其混合物組成的組; 任選在加熱條件下,形成包含溶於烷烴中的產物溶液和不溶於烷烴的殘餘物的混合物。從不溶殘餘物中分離出溶於烷烴中的產物溶液,這可以通過常規方法來進行,例如傾析、過濾或相分離。通常一經冷卻,產物就已經從溶液中結晶,或者烷烴被蒸發掉,較佳在減壓條件下。Preferably, any SOLV 2 is evaporated after REAC 2 or after ST 2 to obtain a first residue mixed with ether. The ether is preferably ether ETH, and ETH is preferably selected from the group consisting of diethyl ether, THF, methyltetrahydrofuran, methyl tert-butyl ether and dioxane. The resulting mixture is filtered and concentrated, preferably under reduced pressure, to give a second residue. The second residue is mixed with an alkane ALK, which is preferably selected from the group consisting of C 5-8 alkanes, C 5-8 cycloalkanes, and mixtures thereof; more preferably, ALK is selected from the group consisting of hexane, heptane, octane, a group consisting of cyclohexane, methylcyclohexane, and mixtures thereof; more preferably, ALK is selected from the group consisting of n-hexane, n-heptane, cyclohexane, methylcyclohexane, and mixtures thereof; A mixture comprising a product solution dissolved in an alkane and a residue insoluble in an alkane is formed under heating. The product solution dissolved in the alkane is separated from the insoluble residue, which can be carried out by a conventional method such as decantation, filtration or phase separation. Typically, once cooled, the product has crystallized from the solution, or the alkane is evaporated, preferably under reduced pressure.

在R100為所述苯基、所述經取代的苯基、所述萘基、所述經取代的萘基或所述式(RES-I)殘基的情況下,式(II)化合物可以在步驟ST1中製備,在這種情況下,該方法則包括ST1和ST2; ST1在ST2之前進行; ST1包括式(I)化合物與化合物ACET的反應REAC1;其中, R100如本文所定義,也包括其所有實施方式,並且式(RES-I)殘基中的該(*)表示連接到式(I) 中的H的鍵; ACET選自由乙醯氯、乙酸酐、乙酸、乙烯酮及其混合物組成的組。In the case where R100 is the phenyl group, the substituted phenyl group, the naphthyl group, the substituted naphthyl group or the residue of the formula (RES-I), the compound of the formula (II) may be Prepared in step ST1, in this case, the method comprises ST1 and ST2; ST1 is carried out before ST2; ST1 comprises the reaction REAC1 of the compound of formula (I) and the compound ACET; Wherein R100, as defined herein, also includes all embodiments thereof, and wherein (*) in the residue of formula (RES-I) represents a bond to H in formula (I); ACET is selected from ethyl chloroform, A group consisting of acetic anhydride, acetic acid, ketene, and mixtures thereof.

當式(RES-I)殘基中的該(*)表示連接到式(I) 中的H的鍵時,則式(I)化合物是式(RES-I-H)化合物;其中R1、R2、R3和X1如本文所定義,也包括其所有實施方式。When the (*) in the residue of the formula (RES-I) represents a bond to H in the formula (I), the compound of the formula (I) is a compound of the formula (RES-IH); Wherein R1, R2, R3 and X1 are as defined herein, and all embodiments thereof are also included.

較佳地,ACET選自由乙醯氯、乙酸酐、及其混合物組成的組。Preferably, the ACET is selected from the group consisting of ethyl chloroform, acetic anhydride, and mixtures thereof.

較佳地,ACET的摩爾量為式(I) 化合物的摩爾量的1至50倍、更佳為1至35倍、且甚至更佳為1至20倍。Preferably, the molar amount of ACET is from 1 to 50 times, more preferably from 1 to 35 times, and even more preferably from 1 to 20 times the molar amount of the compound of formula (I).

在ACET為乙酸酐的情況下,所指定的基於式(I) 化合物的摩爾量的1倍的ACET最小量可以降低到式(I) 化合物的摩爾量的0.5倍。In the case where ACET is acetic anhydride, the specified minimum amount of ACET based on 1 mole of the molar amount of the compound of formula (I) can be reduced to 0.5 times the molar amount of the compound of formula (I).

較佳地,重複利用任意過量的ACET。Preferably, any excess of ACET is reused.

較佳地,REAC1在以下溫度下進行:-10℃至200℃、更佳0℃至150℃、甚至更佳20℃至125℃。Preferably, REAC1 is carried out at a temperature of from -10 ° C to 200 ° C, more preferably from 0 ° C to 150 ° C, even more preferably from 20 ° C to 125 ° C.

較佳地,REAC1在以下壓強下進行:環境壓強至25巴、更佳環境壓強至20巴 。Preferably, REAC1 is carried out at a pressure of from ambient to 25 bar and more preferably from ambient pressure to 20 bar.

REAC1的壓強可以根據REAC1所選擇的溫度和ACET的沸點進行調整。The pressure of REAC1 can be adjusted according to the temperature selected by REAC1 and the boiling point of ACET.

較佳地,REAC1的反應時間為30min 至24h、更佳1h至12h。Preferably, the reaction time of REAC1 is from 30 min to 24 h, more preferably from 1 h to 12 h.

較佳地,REAC1在酸ACI1的存在下進行,ACI1選自由亞硫醯氯、BF3-OEt2、高氯酸、AlCl3、聚合磺酸樹脂、甲苯磺酸、HCl、H2SO4、H3PO4、SiO2、檸檬酸、酒石酸、草酸、沸石、以及它們的混合物組成的組。Preferably, REAC1 is carried out in the presence of acid ACI1 selected from the group consisting of sulfoxide, BF3-OEt2, perchloric acid, AlCl3, polymeric sulfonic acid resins, toluenesulfonic acid, HCl, H2SO4, H3PO4, SiO2, citric acid a group consisting of tartaric acid, oxalic acid, zeolite, and mixtures thereof.

沸石可以是任意沸石,較佳蒙脫石或膨潤土、更佳蒙脫石、甚至更佳選蒙脫石K10®,BASF,德國(也可從Sigma Aldrich公司獲得,CAS號1318-93-0)。The zeolite may be any zeolite, preferably montmorillonite or bentonite, more preferably montmorillonite, or even better selected smectite K10®, BASF, Germany (also available from Sigma Aldrich, CAS No. 1318-93-0) .

較佳地,ACI1選自由亞硫醯氯、BF3 -OEt2 、高氯酸、AlCl3 、聚合磺酸樹脂、甲苯磺酸、HCl、H2SO4、H3PO4、SiO2、沸石、以及它們的混合物組成的組; 更佳地,ACI1選自由亞硫醯氯、高氯酸、AlCl3 、聚合磺酸樹脂、蒙脫石、H3 PO4 、以及它們的混合物組成的組; 特別是,ACI1為亞硫醯氯、高氯酸、AlCl3 或H3 PO4Preferably, ACI1 alkylene selected from the group consisting of sulfuryl chloride, BF 3 -OEt 2, perchloric acid, AlCl 3, polymeric sulfonic acid resin, toluenesulfonic acid, HCl, H2SO4, H3PO4, SiO2 , zeolites, and mixtures thereof More preferably, ACI1 is selected from the group consisting of sulfinium chloride, perchloric acid, AlCl 3 , polymeric sulfonic acid resins, montmorillonite, H 3 PO 4 , and mixtures thereof; in particular, ACI1 is a sulfurous group; Chlorine, perchloric acid, AlCl 3 or H 3 PO 4 .

較佳地,ACI1的摩爾量為式(I) 化合物的摩爾量的0.001至1倍、更佳為0.005至0.5倍,且甚至更佳為0.01至0.20倍。Preferably, the molar amount of ACI1 is from 0.001 to 1 times, more preferably from 0.005 to 0.5 times, and even more preferably from 0.01 to 0.20 times the molar amount of the compound of the formula (I).

REAC1可以在溶劑SOLV1中進行,SOLV1選自由苯、甲苯、二甲苯、氯苯、硝基苯、二氯苯、二氯甲烷、二氯乙烷、二硫化碳、以及它們的混合物組成的組; 較佳地,SOLV1選自由甲苯、鄰二甲苯、間二甲苯、對二甲苯、氯苯、硝基苯、1,2-二氯苯、1,3-二氯苯、1,4-二氯苯、二氯甲烷、1,2-二氯乙烷、二硫化碳、以及它們的混合物組成的組; 更佳地,SOLV1選自由甲苯、鄰二甲苯、間二甲苯、對二甲苯、氯苯、二氯甲烷、1,2-二氯乙烷、以及它們的混合物組成的組。REAC1 can be carried out in a solvent SOLV1 selected from the group consisting of benzene, toluene, xylene, chlorobenzene, nitrobenzene, dichlorobenzene, dichloromethane, dichloroethane, carbon disulfide, and mixtures thereof; SOLV1 is selected from the group consisting of toluene, o-xylene, m-xylene, p-xylene, chlorobenzene, nitrobenzene, 1,2-dichlorobenzene, 1,3-dichlorobenzene, 1,4-dichlorobenzene, a group consisting of dichloromethane, 1,2-dichloroethane, carbon disulfide, and mixtures thereof; more preferably, SOLV1 is selected from the group consisting of toluene, o-xylene, m-xylene, p-xylene, chlorobenzene, dichloromethane a group consisting of 1,2-dichloroethane, and mixtures thereof.

較佳地,SOLV1的重量為式(I) 化合物的重量的0.5至100倍、更佳為1至50倍。Preferably, the weight of SOLV1 is from 0.5 to 100 times, more preferably from 1 to 50 times the weight of the compound of formula (I).

較佳地,重複利用任意的SOLV1。Preferably, any SOLV1 is reused.

在ST1後,式(II)化合物可以通過本領域技術人員公知的方法分離並純化。這些方法包括,例如,水解、蒸餾(較佳可以在減壓下進行的分餾)、結晶、萃取、或這些方法的組合。After ST1, the compound of formula (II) can be isolated and purified by methods well known to those skilled in the art. These methods include, for example, hydrolysis, distillation (preferably fractionation under reduced pressure), crystallization, extraction, or a combination of these methods.

較佳地,該溶劑SOLV1和SOLV2是相同的。Preferably, the solvents SOLV1 and SOLV2 are identical.

ST1和ST2可以在一個釜中進行。ST1 and ST2 can be carried out in one kettle.

本發明的另一主題是一種用於製備式(THIOXA)化合物的方法;其中所述方法包括步驟ST2; R30、R31、R32、R33和R34   是相同的或不同的並且彼此獨立地選自由H、鹵素、CF3 、CH3 、OCF3 、OCH3 、CN和C(H)O組成的組; 其中, ST2、R1、R2和R3如本文所定義,也包括其所有實施方式;以及 R100是式(RES-I) 殘基,其中X1為S; 本發明的另一個主題是一種用於製備式(THIOXA)化合物的方法, 其中所述方法除了步驟ST2之外,還包括步驟ST1; ST1在ST2之前進行; 其中ST1如本文所定義,也包括其所有實施方式; 還包括任何單獨的實施方式或包括兩個或多個實施方式的任意組合,這些步驟中任何一個的實施方式如本文所描述; 特別是,R30、R31、R32、R33和R34為H; 在另一個特別實施方式中,R1、R2和R3為H; 更特別是,R1、R2、R3、R30、R31、R32、R33和R34為H。Another subject of the invention is a process for the preparation of a compound of the formula (THIOXA); Wherein said method comprises the step ST2; R30, R31, R32, R33 and R34 are the same or different and are independently selected from the group consisting of H, halo, CF 3, CH 3 from each other, OCF 3, OCH 3, CN and C (H a group consisting of O; wherein, ST2, R1, R2 and R3 are as defined herein, including all embodiments thereof; and R100 is a residue of formula (RES-I) wherein X1 is S; another subject of the invention Is a method for preparing a compound of the formula (THIOXA), wherein the method comprises, in addition to step ST2, step ST1; ST1 is performed before ST2; wherein ST1 is as defined herein, including all embodiments thereof; Any individual embodiment or any combination of two or more embodiments, embodiments of any of these steps are as described herein; in particular, R30, R31, R32, R33 and R34 are H; In an embodiment, R1, R2 and R3 are H; more particularly, R1, R2, R3, R30, R31, R32, R33 and R34 are H.

較佳地,由其中R100為式(RES-I) 殘基且X1為S的式(III)化合物起始的用於製備式(THIOXA)化合物的該方法具有步驟ST3; ST3在ST2之後進行; ST3包括反應REAC3,在REAC3中,使其中R100為式(RES-I) 殘基且X1為S的式(III)化合物與式(IV) 化合物反應。 Preferably, the method for preparing a compound of the formula (THIOXA) starting from a compound of the formula (III) wherein R100 is a residue of the formula (RES-I) and X1 is S has the step ST3; ST3 is carried out after ST2; ST3 includes a reaction REAC3 in which a compound of formula (III) wherein R100 is a residue of formula (RES-I) and X1 is S is reacted with a compound of formula (IV).

ST3的詳細描述公開在WO 2014/008257 A2中。A detailed description of ST3 is disclosed in WO 2014/008257 A2.

ST3的具體實施方式公開在WO 2014/008257 A2的實施例2、3、7、9、10、11和12中。A specific embodiment of ST3 is disclosed in Examples 2, 3, 7, 9, 10, 11 and 12 of WO 2014/008257 A2.

較佳地,在用於製備式(THIOXA)化合物的方法中的ST2和ST3中的式(Ⅲ)化合物為式(Ⅲ-1)化合物或式(III-2)化合物;Preferably, the compound of formula (III) in ST2 and ST3 in the process for the preparation of a compound of formula (THIOXA) is a compound of formula (III-1) or a compound of formula (III-2);

更佳地,式(III)化合物是式(Ⅲ-1)化合物。More preferably, the compound of formula (III) is a compound of formula (III-1).

較佳地,式(IV)化合物選自由式(IV-1) 化合物、式(IV-2)化合物、式(IV-3)化合物、式(IV-4)化合物、式(IV-5) 化合物、式(IV-6)化合物和式(IV-7)化合物組成的組; 更佳地,式(IV)化合物為式(IV-1) 化合物或式(IV-2)化合物。Preferably, the compound of formula (IV) is selected from the group consisting of a compound of formula (IV-1), a compound of formula (IV-2), a compound of formula (IV-3), a compound of formula (IV-4), a compound of formula (IV-5) a group consisting of a compound of the formula (IV-6) and a compound of the formula (IV-7); More preferably, the compound of formula (IV) is a compound of formula (IV-1) or a compound of formula (IV-2).

當使式(III)化合物與式(IV)化合物接觸,則形成反應混合物。When a compound of formula (III) is contacted with a compound of formula (IV), a reaction mixture is formed.

較佳地,REAC3在溶劑SOLV3的存在下進行。Preferably, REAC3 is carried out in the presence of solvent SOLV3.

較佳地,SOLV3是與水不混溶的有機溶劑。Preferably, SOLV3 is an organic solvent that is immiscible with water.

較佳地,SOLV3溶解式(IV) 化合物和式 (THIOXA) 化合物。Preferably, SOLV3 dissolves the compound of formula (IV) and the compound of formula (THIOXA).

較佳地,SOLV3與水形成共沸混合物。Preferably, SOLV3 forms an azeotrope with water.

較佳地,SOLV3選自由2-甲基四氫呋喃和乙酸丁酯組成的組; 更佳地,SOLV3為2-甲基四氫呋喃。Preferably, SOLV3 is selected from the group consisting of 2-methyltetrahydrofuran and butyl acetate; more preferably, SOLV3 is 2-methyltetrahydrofuran.

較佳地,REAC3在鹼BAS3的存在下進行。Preferably, REAC3 is carried out in the presence of a base BAS3.

較佳地,BAS3是鹼的水溶液。Preferably, BAS3 is an aqueous solution of a base.

較佳地,BAS3選自由氫氧化鈉、氫氧化鉀、氫氧化鋰和氫氧化鈣組成的組。Preferably, BAS3 is selected from the group consisting of sodium hydroxide, potassium hydroxide, lithium hydroxide and calcium hydroxide.

較佳地,REAC3的反應混合物包含有機相和水相。Preferably, the reaction mixture of REAC3 comprises an organic phase and an aqueous phase.

較佳地,水相的pH值大於8、更佳大於10。Preferably, the pH of the aqueous phase is greater than 8, more preferably greater than 10.

較佳地,通過添加額外的BAS3到反應混合物或REAC3中來增加或保持水相的pH值。Preferably, the pH of the aqueous phase is increased or maintained by the addition of additional BAS3 to the reaction mixture or REAC3.

較佳地,REAC3的溫度不超過85℃; 更佳地,使REAC3的溫度保持在55℃至75℃。Preferably, the temperature of the REAC 3 does not exceed 85 ° C; more preferably, the temperature of the REAC 3 is maintained between 55 ° C and 75 ° C.

較佳地,REAC3在相轉移催化劑PTC3的存在下進行。Preferably, REAC3 is carried out in the presence of phase transfer catalyst PTC3.

較佳地,PTC3選自由季銨鹽、鏻鹽、和冠醚組成的組; 更佳地,PTC3選自由四丁基氫氧化銨、四丁基溴化銨、四丁基氟化銨、四丁基碘化銨、四丁基溴化鏻、四丁基鏻氯化物、和苄基三甲基氫氧化銨組成的組; 甚至更佳地,PTC3為四丁基氫氧化銨。Preferably, PTC3 is selected from the group consisting of quaternary ammonium salts, phosphonium salts, and crown ethers; more preferably, PTC3 is selected from the group consisting of tetrabutylammonium hydroxide, tetrabutylammonium bromide, tetrabutylammonium fluoride, and tetra A group consisting of butyl ammonium iodide, tetrabutylphosphonium bromide, tetrabutylphosphonium chloride, and benzyltrimethylammonium hydroxide; even more preferably, PTC3 is tetrabutylammonium hydroxide.

較佳地,在加入式(Ⅲ)化合物之前,式(IV)化合物溶解於SOLV3中,以形成REAC3的反應混合物。Preferably, the compound of formula (IV) is dissolved in SOLV3 prior to the addition of the compound of formula (III) to form a reaction mixture of REAC3.

較佳地,REAC3在水的存在下進行。Preferably, REAC3 is carried out in the presence of water.

本發明的另一主題是一種用於製備式(RIVA-I)化合物的方法;R50、R51、R52和R53    是相同的或不同的並且彼此獨立地選自由H、鹵素、CF3 、CN、NO2 、C(O)‑NH2 、C(O)‑C1 6 烷基、O‑R60、N(R60)R61 和 C1-6 烷基組成的組; R60和R61是相同的或不同的並且彼此獨立地選自由H、C1-4 烷基和C(O)R63組成的組; R63選自由C1-4 烷基-NH2 、NH2 、NH-C1-4 烷基、N(C1 4 烷基)C1-4 烷基 和 C1 8 烷基組成的組; R43、R44、R45、R46、R47和R48是相同的或不同的並且彼此獨立地表示H或C1 6 烷基; 其中所述方法包括步驟ST2; 其中 ST2、R1、R2和R3如本文所定義,也包括其所有實施方式;以及 R100是式(RES-I)殘基,其中X1為S; 本發明的另一主題是一種用於製備式(RIVA-I)化合物的方法, 其中所述方法除了步驟ST2之外,還包括步驟ST1; ST1在ST2之前進行; 其中ST1如本文所定義,也包括其所有實施方式; 還包括任何單獨的實施方式或包括兩個或多個實施方式的任意組合,這些步驟中任何一個的實施方式如本文所描述; 特別是,其中式(RIVA-I)化合物為式(RIVA‑II)化合物;更特別的是,其中式(RIVA-I)化合物為式(RIVA-1)化合物。 Another subject of the invention is a process for the preparation of a compound of the formula (RIVA-I); R50, R51, R52 and R53 are the same or different and are independently selected from the consisting of H, halo, CF 3, CN, NO 2 , C (O) -NH 2, C (O) -C 1 - 6 alkyl a group consisting of O‐R60, N(R60)R61 and C 1-6 alkyl; R60 and R61 are the same or different and are independently selected from H, C 1-4 alkyl and C(O)R63 the group consisting of; R63 selected from the group consisting of C 1-4 alkyl -NH 2, NH 2, NH- C 1-4 alkyl, N (C 1 - 4 alkyl) C 1-4 alkyl, and C 1 - 8 alkoxy group consisting of the group; R43, R44, R45, R46 , R47 and R48 are the same or different and independently of one another, denote H or C 1 - 6 alkyl; wherein said method comprises the step ST2; wherein ST2, R1, R2 And R3 as defined herein, including all embodiments thereof; and R100 is a residue of formula (RES-I) wherein X1 is S; another subject of the invention is a compound for the preparation of a compound of formula (RIVA-I) a method, wherein the method comprises, in addition to step ST2, step ST1; ST1 is performed before ST2; wherein ST1 is as defined herein, including all of its embodiments; further comprising any separate embodiment or comprising two or more Implementation Any combination of these steps in any one of embodiments as described herein; in particular, the compound of formula (RIVA-I) is a compound of formula (RIVA-II); More particularly, the compound of formula (RIVA-I) is a compound of formula (RIVA-1).

較佳地,由其中R100為式(RES-I) 殘基且X1為S的式(III)化合物起始的用於製備式(RIVA-I)化合物的該方法具有步驟ST4; ST4在ST2之後進行; ST4包括反應REAC4,在REAC4中,使其中R100為式(RES-I) 殘基且X1為S的式(III)化合物與式(RIVA-Ia)化合物反應;較佳地,式(RES-I)殘基為式(RES-I-2)殘基; 更佳地,式(RES-I) 殘基是式(RES-I-2)殘基且式(RIVA-Ia)化合物是式(RIVA-1a)化合物。 Preferably, the method for preparing a compound of formula (RIVA-I) starting from a compound of formula (III) wherein R100 is a residue of formula (RES-I) and X1 is S has step ST4; ST4 is after ST2 Carrying out; ST4 includes the reaction REAC4, in REAC4, reacting a compound of formula (III) wherein R100 is a residue of formula (RES-I) and X1 is S with a compound of formula (RIVA-Ia); Preferably, the residue of formula (RES-I) is a residue of formula (RES-I-2); more preferably, the residue of formula (RES-I) is a residue of formula (RES-I-2) and formula ( The RIVA-Ia) compound is a compound of the formula (RIVA-1a).

ST4的詳細描述公開在US 2003/0153610 A1中。A detailed description of ST4 is disclosed in US 2003/0153610 A1.

較佳地,在用於製備式(RIVA-I)化合物的方法中的ST2和ST4中的式(Ⅲ)化合物為式(Ⅲ-1)化合物或式(III-2)化合物; 更佳地,式(III)化合物為式(Ⅲ-2)化合物。Preferably, the compound of the formula (III) in ST2 and ST4 in the process for producing the compound of the formula (RIVA-I) is a compound of the formula (III-1) or a compound of the formula (III-2); more preferably, The compound of formula (III) is a compound of formula (III-2).

較佳地,REAC4在溶劑SOLV4中進行,SOLV4選自由鹵代烴、醚、醇、烴、二甲基甲醯胺、二甲亞碸、乙腈、吡啶,六甲基磷醯三胺、水及其混合物組成的組。Preferably, REAC4 is carried out in a solvent SOLV4 selected from the group consisting of halogenated hydrocarbons, ethers, alcohols, hydrocarbons, dimethylformamide, dimethyl hydrazine, acetonitrile, pyridine, hexamethylphosphonium triamine, water and a group consisting of its mixture.

鹵代烴較佳選自由二氯甲烷、三氯甲烷、四氯化碳、1,2-二氯乙烷、三氯乙烷、四氯乙烷、1,2-二氯乙烯和三氯乙烯組成的組。The halogenated hydrocarbon is preferably selected from the group consisting of dichloromethane, chloroform, carbon tetrachloride, 1,2-dichloroethane, trichloroethane, tetrachloroethane, 1,2-dichloroethylene and trichloroethylene. The group consisting of.

醚較佳選自由二乙醚、甲基叔丁基醚、二惡烷、四氫呋喃、乙二醇二甲醚和二甘醇二甲醚組成的組。The ether is preferably selected from the group consisting of diethyl ether, methyl tert-butyl ether, dioxane, tetrahydrofuran, ethylene glycol dimethyl ether and diglyme.

醇較佳選自由甲醇、乙醇、丙醇、丁醇組成的組。The alcohol is preferably selected from the group consisting of methanol, ethanol, propanol, and butanol.

烴較佳選自由苯、二甲苯、甲苯、己烷和環己烷組成的組。The hydrocarbon is preferably selected from the group consisting of benzene, xylene, toluene, hexane and cyclohexane.

REAC4可以在鹼BAS4的存在下進行,BAS4可以是任何慣用的無機鹼或有機鹼。REAC4 can be carried out in the presence of a base BAS4 which can be any conventional inorganic or organic base.

BAS4較佳選自由鹼金屬氫氧化物、鹼金屬碳酸鹽、甲醇鈉、甲醇鉀、乙醇鈉、乙醇鉀、叔丁醇鉀、醯胺、胺、以及它們的混合物組成的組; 鹼金屬氫氧化物較佳為氫氧化鈉或氫氧化鉀; 鹼金屬碳酸鹽較佳為碳酸鈉或碳酸鉀; 醯胺較佳選自由氨基鈉、二(三甲基矽基)氨基鋰和二異丙基氨基鋰組成的組; 胺較佳選自由三乙胺、二異丙基乙胺、二異丙胺、4- N,N-二甲基氨基吡啶和吡啶組成的組。BAS4 is preferably selected from the group consisting of alkali metal hydroxides, alkali metal carbonates, sodium methoxide, potassium methoxide, sodium ethoxide, potassium ethoxide, potassium t-butoxide, decylamine, amines, and mixtures thereof; alkali metal hydroxide Preferably, the object is sodium hydroxide or potassium hydroxide; the alkali metal carbonate is preferably sodium carbonate or potassium carbonate; the guanamine is preferably selected from the group consisting of sodium amide, lithium bis(trimethylmethyl)amide and diisopropylamino. The group consisting of lithium; the amine is preferably selected from the group consisting of triethylamine, diisopropylethylamine, diisopropylamine, 4-N,N-dimethylaminopyridine and pyridine.

BAS4可以以以下的量使用:1至5 mol、較佳1至2 mol,基於1 mol的式(RIVA-Ia)化合物計。BAS4 can be used in the following amounts: 1 to 5 mol, preferably 1 to 2 mol, based on 1 mol of the compound of the formula (RIVA-Ia).

較佳地,REAC4在以下的溫度下進行:-78℃至回流溫度、更佳0 ℃至回流溫度,其中回流溫度為相應的壓強下的回流溫度。Preferably, REAC4 is carried out at a temperature of from -78 ° C to reflux temperature, more preferably from 0 ° C to reflux temperature, wherein the reflux temperature is the reflux temperature at the corresponding pressure.

較佳地,REAC4在0.5至5巴的壓強下進行,更佳在大氣壓下進行。Preferably, the REAC 4 is carried out at a pressure of from 0.5 to 5 bar, more preferably at atmospheric pressure.

在式(RIVA-I)化合物為式(RIVA-1)化合物且式(RES-I)殘基為式(RES-I-2)殘基的情況下, 在另一個較佳實施方式中,由其中式(RES-I)殘基為式(RES-I-2)殘基的式(III)化合物起始的式(RIVA-1)化合物的製備具有步驟ST5; ST5的詳細描述公開在US 2015/0133657 A1中; ST5在ST2之後進行; ST5包括反應REAC5,在REAC5中,使式(RES-I)殘基為式(RES-I-2)殘基的式(III)化合物與式(RIVA-10)化合物反應;REAC5的反應產物是式(RIVA-11)化合物;較佳地,在ST5之後進行步驟ST6; ST6包括反應REAC6,在REAC6中,在光氣或光氣等價物的存在下,使式(RIVA-11)化合物與式(RIVA-12) 化合物反應;REAC6的反應產物是式(RIVA-13)化合物;較佳地,在ST6之後進行步驟ST7; ST7包括反應REAC7,在REAC7中,使式(RIVA-13)化合物環化以得到式(RIVA-1)化合物。In the case where the compound of the formula (RIVA-I) is a compound of the formula (RIVA-1) and the residue of the formula (RES-I) is a residue of the formula (RES-I-2), in another preferred embodiment, The preparation of the compound of the formula (RIVA-1) starting from the compound of the formula (III) wherein the residue of the formula (RES-I) is a residue of the formula (RES-I-2) has the step ST5; the detailed description of ST5 is disclosed in US 2015 /0133657 A1; ST5 is carried out after ST2; ST5 includes reaction REAC5, and in REAC5, a compound of formula (III) with formula (RES-I) residue is a residue of formula (RES-I-2) and formula (RIVA) -10) compound reaction; The reaction product of REAC5 is a compound of formula (RIVA-11); Preferably, step ST6 is performed after ST5; ST6 comprises a reaction REAC6 in which a compound of formula (RIVA-11) is reacted with a compound of formula (RIVA-12) in the presence of phosgene or phosgene equivalent; The reaction product of REAC6 is a compound of formula (RIVA-13); Preferably, step ST7 is carried out after ST6; ST7 comprises the reaction REAC7, and in the REAC7, the compound of the formula (RIVA-13) is cyclized to give the compound of the formula (RIVA-1).

光氣等價物較佳為雙光氣或三光氣或一氧化碳等價物。The phosgene equivalent is preferably diphosgene or triphosgene or carbon monoxide equivalent.

一氧化碳等價物較佳羰二咪唑或二琥珀醯亞胺基碳酸酯。The carbon monoxide equivalent is preferably carbonyldiimidazole or disuccinimide carbonate.

式(RIVA-10)化合物也可以以它們的鹽的形式使用,較佳為鹽酸鹽。式(RIVA-10)化合物是已知的化合物並可以根據已知的方法製備,例如,如在美國專利6,107,519或US 2015/0133657 A1中所公開的。The compound of the formula (RIVA-10) can also be used in the form of their salts, preferably the hydrochloride. The compound of the formula (RIVA-10) is a known compound and can be prepared according to known methods, for example, as disclosed in U.S. Patent No. 6,107,519 or US 2015/0133657 A1.

較佳地,REAC5在鹼的存在下進行,例如碳酸氫鈉。Preferably, REAC5 is carried out in the presence of a base such as sodium bicarbonate.

較佳地,REAC5在溶劑中進行,該溶劑可以是乙酸乙酯、己烷、水、甲苯或它們的混合物。Preferably, REAC5 is carried out in a solvent which may be ethyl acetate, hexane, water, toluene or a mixture thereof.

較佳地,REAC5的反應溫度為0至40℃。Preferably, the reaction temperature of REAC5 is from 0 to 40 °C.

較佳地,REAC5的反應時間為0.5至10h。Preferably, the reaction time of REAC5 is from 0.5 to 10 h.

在REAC5之後,可以通過包括以下的方法從反應混合物中分離式(RIVA-11)化合物:層分離、濃縮、蒸餾、傾析、過濾、蒸發、離心、或它們的組合,而且可以進一步乾燥式(RIVA-11)化合物。After REAC5, the compound of formula (RIVA-11) can be isolated from the reaction mixture by the following methods: layer separation, concentration, distillation, decantation, filtration, evaporation, centrifugation, or a combination thereof, and can be further dried ( RIVA-11) compound.

較佳地,REAC6在溶劑中進行。在REAC6中的溶劑可以是二氯甲烷、二氯乙烷、或它們的混合物。Preferably, REAC6 is carried out in a solvent. The solvent in REAC6 may be dichloromethane, dichloroethane, or a mixture thereof.

REAC6可以在鹼的存在下進行,在REAC6中的鹼可以是吡啶、二甲氨基吡啶、三乙胺、碳酸鈉、碳酸鉀、或它們的混合物;更佳吡啶、三乙胺、碳酸鈉、碳酸鉀、或它們的混合物。REAC6 can be carried out in the presence of a base, and the base in REAC6 can be pyridine, dimethylaminopyridine, triethylamine, sodium carbonate, potassium carbonate, or a mixture thereof; more preferably pyridine, triethylamine, sodium carbonate, carbonic acid Potassium, or a mixture thereof.

較佳地,REAC6的反應時間為0.5至10h。Preferably, the reaction time of REAC6 is from 0.5 to 10 h.

較佳地,REAC6的反應溫度為0至35℃。Preferably, the reaction temperature of REAC6 is from 0 to 35 °C.

較佳地,在REAC6的第一步驟中,使光氣或光氣等價物與式(RIVA-11)化合物混合,任選地還與REAC6的鹼混合,任選地在REAC6的溶劑中,然後在REAC6的第二步驟中加入式(RIVA-12) 化合物。Preferably, in the first step of REAC 6, the phosgene or phosgene equivalent is mixed with a compound of formula (RIVA-11), optionally also with a base of REAC6, optionally in a solvent of REAC6, and then A compound of the formula (RIVA-12) is added to the second step of REAC6.

較佳地,REAC6的第一步驟的反應時間為0.5至4h。Preferably, the reaction time of the first step of REAC6 is from 0.5 to 4 h.

較佳地,REAC6的第一步驟的反應溫度為5至25℃。Preferably, the first step of REAC6 has a reaction temperature of 5 to 25 °C.

較佳地,REAC6的第二步驟的反應時間為0.5至6h。Preferably, the reaction time of the second step of REAC6 is from 0.5 to 6 h.

較佳地,REAC6的第二步驟的反應溫度為10至35℃。Preferably, the second step of REAC6 has a reaction temperature of 10 to 35 °C.

在REAC6之後,可以通過包括以下的方法從反應混合物中分離式(RIVA-13)化合物:層分離、濃縮、蒸餾、傾析、過濾、蒸發、離心、或它們的組合,而且可以進一步乾燥式(RIVA-13)化合物。After REAC6, the compound of formula (RIVA-13) can be separated from the reaction mixture by the following methods: layer separation, concentration, distillation, decantation, filtration, evaporation, centrifugation, or a combination thereof, and can be further dried ( RIVA-13) compound.

較佳地,REAC7的環化在溶劑中進行。在REAC7中的溶劑可以是丙酮、乙腈、甲醇、乙醇、異丙醇、二惡烷、四氫呋喃、水或它們的混合物。Preferably, the cyclization of REAC7 is carried out in a solvent. The solvent in REAC7 may be acetone, acetonitrile, methanol, ethanol, isopropanol, dioxane, tetrahydrofuran, water or a mixture thereof.

REAC7可以在鹼的存在下進行。在REAC7中的鹼可以是碳酸鉀、碳酸氫鉀、氫氧化鉀、氫氧化鈉、碳酸鈉、碳酸氫鈉、氫化鈉、或它們的混合物。REAC7 can be carried out in the presence of a base. The base in REAC7 may be potassium carbonate, potassium hydrogencarbonate, potassium hydroxide, sodium hydroxide, sodium carbonate, sodium hydrogencarbonate, sodium hydride, or a mixture thereof.

在REAC7中的鹼可以加入到含有式(RIVA-13)化合物和REAC7的溶劑的混合物中或者加入到含有在REAC6中形成的式(RIVA-13)化合物的混合物中。The base in REAC7 may be added to a mixture containing a solvent of the compound of the formula (RIVA-13) and REAC7 or to a mixture containing a compound of the formula (RIVA-13) formed in REAC6.

較佳地,REAC7的反應溫度為10至40℃。Preferably, the reaction temperature of REAC7 is from 10 to 40 °C.

較佳地,REAC7的反應時間為2至15h。Preferably, the reaction time of REAC7 is from 2 to 15 h.

可以通過包括以下的方法從任何反應混合物中分離式(RIVA-I)化合物、式(RIVA-II)化合物和式(RIVA-1)化合物:層分離、濃縮、蒸餾、傾析、過濾、蒸發、離心、或它們的組合,而且可以進一步乾燥這些化合物。   實施例 實施例1:2-噻吩碳醯氯The compound of the formula (RIVA-I), the compound of the formula (RIVA-II) and the compound of the formula (RIVA-1) can be separated from any reaction mixture by the following methods: layer separation, concentration, distillation, decantation, filtration, evaporation, Centrifugation, or a combination thereof, and these compounds can be further dried. EXAMPLES Example 1: 2-Thiophenium Carbonium Chloride

將2-乙醯噻吩(0.108 ml, 1.0 mmol)、吡啶(0.008 ml, 0.1 mmol)和二氯化二硫(0.240 ml, 3.0 mmol)的混合物在137℃下攪拌18 h。用CDCl3 (2 ml)稀釋該混合物,加入內標(iBu3 PO4 , 0.0552 ml, 0.20 mmol),並對該混合物進行分析。1 H NMR表明已經形成了2-噻吩碳醯氯(產率為78%)。1 H NMR (CDCl3 , 400 MHz) δ = 7.99 (d, br, J = 4 Hz, 1H), 7.83 (d, br, J = 4 Hz, 1H), 7.20 (t, J = 4 Hz, 1H)。13 C NMR (CDCl3 , 100 MHz) δ = 159.5, 137.9, 137.7, 137.1, 128.6。   實施例2:5-氯-2-噻吩碳醯氯A mixture of 2-ethenylthiophene (0.108 ml, 1.0 mmol), pyridine (0.008 ml, 0.1 mmol) and dithiodichloride (0.240 ml, 3.0 mmol) was stirred at 137 ° C for 18 h. The mixture was diluted with CDCl 3 (2 ml), and an internal standard (iBu 3 PO 4 , 0.0552 ml, 0.20 mmol) was added and the mixture was analyzed. 1 H NMR indicated that 2-thiophenecarbenium chloride had been formed (yield 78%). 1 H NMR (CDCl 3 , 400 MHz) δ = 7.99 (d, br, J = 4 Hz, 1H), 7.83 (d, br, J = 4 Hz, 1H), 7.20 (t, J = 4 Hz, 1H ). 13 C NMR (CDCl 3 , 100 MHz) δ = 159.5, 137.9, 137.7, 137.1, 128.6. Example 2: 5-Chloro-2-thiophene carbonium chloride

將2-乙醯基-5-氯噻吩(0.163 g, 1.0 mmol)、吡啶(0.008 ml, 0.1 mmol)和二氯化二硫(0.240 ml, 3.0 mmol)的混合物在137℃下攪拌20 h。用CDCl3 (2 ml)稀釋該混合物,加入內標(iBu3 PO4 , 0.0552 ml, 0.20 mmol),並對該混合物進行分析。1 H NMR表明已經形成了5-氯-2-噻吩碳醯氯(產率為68%)。1 H NMR (CDCl3 , 400 MHz) δ = 7.80 (d, J = 4 Hz, 1H), 7.06 (d, J = 4 Hz, 1H)。13 C NMR (CDCl3 , 100 MHz) δ = 158.5, 143.1, 137.5, 134.9, 128.3。   實施例3:4-氟苯甲醯氯A mixture of 2-ethinyl-5-chlorothiophene (0.163 g, 1.0 mmol), pyridine (0.008 ml, 0.1 mmol) and dithiodichloride (0.240 ml, 3.0 mmol) was stirred at 137 ° C for 20 h. The mixture was diluted with CDCl 3 (2 ml), and an internal standard (iBu 3 PO 4 , 0.0552 ml, 0.20 mmol) was added and the mixture was analyzed. 1 H NMR indicated that 5-chloro-2-thiophenecarbenium chloride had been formed (yield 68%). 1 H NMR (CDCl 3 , 400 MHz) δ = 7.80 (d, J = 4 Hz, 1H), 7.06 (d, J = 4 Hz, 1H). 13 C NMR (CDCl 3 , 100 MHz) δ = 158.5, 143.1, 137.5, 134.9, 128.3. Example 3: 4-fluorobenzhydrazide chloride

將4-氟苯乙酮(0.138 g, 1.0 mmol)、吡啶(0.008 ml, 0.1 mmol)和二氯化二硫(0.240 ml, 3.0 mmol)的混合物在137℃下攪拌20 h。用CDCl3 (2 ml)稀釋該混合物,加入內標(iBu3 PO4 , 0.0552 ml, 0.20 mmol),並對該混合物進行分析。1 H NMR表明已經形成了4-氟苯甲醯氯(產率為81%)。1 H NMR (CDCl3 , 400 MHz) δ = 8.15 (m, 2H), 7.20 (m, 2H)。13 C NMR (CDCl3 , 100 MHz) δ = 168.3, 166.8, 165.7, 134.1, 134.0, 129.3, 116.3, 116.1。   實施例4:4-甲氧基苯甲醯氯A mixture of 4-fluoroacetophenone (0.138 g, 1.0 mmol), pyridine (0.008 ml, 0.1 mmol) and dithiodichloride (0.240 ml, 3.0 mmol) was stirred at 137 ° C for 20 h. The mixture was diluted with CDCl 3 (2 ml), and an internal standard (iBu 3 PO 4 , 0.0552 ml, 0.20 mmol) was added and the mixture was analyzed. 1 H NMR indicated that 4-fluorobenzimid chloride had formed (yield 81%). 1 H NMR (CDCl 3 , 400 MHz) δ = 8.15 (m, 2H), 7.20 (m, 2H). 13 C NMR (CDCl 3 , 100 MHz) δ = 168.3, 166.8, 165.7, 134.1, 134.0, 129.3, 116.3, 116.1. Example 4: 4-methoxybenzhydryl chloride

將4-甲氧基苯乙酮(0.150 g, 1.0 mmol)、吡啶(0.008 ml, 0.1 mmol)和二氯化二硫(0.240 ml, 3.0 mmol)的混合物在137℃下攪拌20 h。用CDCl3 (2 ml)稀釋該混合物,加入內標(iBu3 PO4 , 0.0552 ml, 0.20 mmol),並對該混合物進行分析。1 H NMR表明已經形成了4-甲氧基苯甲醯氯(產率為91%)。1 H NMR (CDCl3 , 400 MHz) δ = 7.96 (d, J = 8 Hz, 2H), 6.86 (d, J = 8 Hz, 2H), 3.80 (s, 3H)。13 C NMR (CDCl3 , 100 MHz) δ = 166.0, 164.4, 132.9, 124.3, 113.2, 54.8。   實施例5:3-(三氟甲基)苯甲醯氯A mixture of 4-methoxyacetophenone (0.150 g, 1.0 mmol), pyridine (0.008 ml, 0.1 mmol) and dithiodichloride (0.240 ml, 3.0 mmol) was stirred at 137 ° C for 20 h. The mixture was diluted with CDCl 3 (2 ml), and an internal standard (iBu 3 PO 4 , 0.0552 ml, 0.20 mmol) was added and the mixture was analyzed. 1 H NMR indicated that 4-methoxybenzimid chloride had formed (yield: 91%). 1 H NMR (CDCl 3 , 400 MHz) δ = 7.96 (d, J = 8 Hz, 2H), 6.86 (d, J = 8 Hz, 2H), 3.80 (s, 3H). 13 C NMR (CDCl 3 , 100 MHz) δ = 166.0, 164.4, 132.9, 124.3, 113.2, 54.8. Example 5: 3-(Trifluoromethyl)benzhydryl chloride

將3-(三氟甲基)苯乙酮(0.188 g, 1.0 mmol)、吡啶(0.008 ml, 0.1 mmol)和二氯化二硫(0.240 ml, 3.0 mmol)的混合物在137℃下攪拌20 h。用CDCl3 (2 ml)稀釋該混合物,加入內標(iBu3 PO4 , 0.0552 ml, 0.20 mmol),並對該混合物進行分析。1 H NMR表明已經形成了3-(三氟甲基)苯甲醯氯(產率為76%)。1 H NMR (CDCl3 , 400 MHz) δ = 8.37 (s, 1H), 8.32 (d, J = 8 Hz, 1H), 7.96 (d, J = 8 Hz, 1H), 7.71 (t, J = 8 Hz, 1H)。13 C NMR (CDCl3 , 100 MHz) δ = 167.2, 134.2, 134.0, 131.74 (四重峰(quartett), J = 32 Hz), 131.6 (四重峰, J = 3 Hz), 129.8, 127.9 (四重峰, J = 3 Hz), 123.1 (四重峰, J = 270 Hz, CF3 )。   實施例6:2-噻吩碳醯氯A mixture of 3-(trifluoromethyl)acetophenone (0.188 g, 1.0 mmol), pyridine (0.008 ml, 0.1 mmol) and disulfide dichloride (0.240 ml, 3.0 mmol) was stirred at 137 ° C for 20 h . The mixture was diluted with CDCl 3 (2 ml), and an internal standard (iBu 3 PO 4 , 0.0552 ml, 0.20 mmol) was added and the mixture was analyzed. 1 H NMR indicated that 3-(trifluoromethyl)benzimidium chloride had formed (yield 76%). 1 H NMR (CDCl 3 , 400 MHz) δ = 8.37 (s, 1H), 8.32 (d, J = 8 Hz, 1H), 7.96 (d, J = 8 Hz, 1H), 7.71 (t, J = 8 Hz, 1H). 13 C NMR (CDCl 3 , 100 MHz) δ = 167.2, 134.2, 134.0, 131.74 (quartett, J = 32 Hz), 131.6 (quadruple, J = 3 Hz), 129.8, 127.9 (four Heavy peak, J = 3 Hz), 123.1 (quadruple peak, J = 270 Hz, CF 3 ). Example 6: 2-Thiophenium Carbonium Chloride

將2-乙醯噻吩(0.108 ml, 1.0 mmol)、吡啶(0.008 ml, 0.1 mmol)和二氯化二硫(0.320 ml, 4.0 mmol)的混合物在70℃下攪拌3.5h。然後在137℃下攪拌18h。用CDCl3 (2 ml)稀釋該混合物,加入內標(iBu3 PO4 , 0.0552 ml, 0.20 mmol),並對該混合物進行分析。1 H NMR表明已經形成了2-噻吩碳醯氯(產率為86%)。   實施例7:苯甲醯氯A mixture of 2-ethenylthiophene (0.108 ml, 1.0 mmol), pyridine (0.008 ml, 0.1 mmol) and dithiodichloride (0.320 ml, 4.0 mmol) was stirred at 70 ° C for 3.5 h. It was then stirred at 137 ° C for 18 h. The mixture was diluted with CDCl 3 (2 ml), and an internal standard (iBu 3 PO 4 , 0.0552 ml, 0.20 mmol) was added and the mixture was analyzed. 1 H NMR indicated that 2-thiophenecarbenium chloride had been formed (yield 86%). Example 7: Benzamidine chloride

將苯乙酮(0.117 ml, 1.0 mmol)、吡啶(0.008 ml, 0.1 mmol)和二氯化二硫(0.320 ml, 4.0 mmol)的混合物在70℃下攪拌3.5h。然後在137℃下攪拌18h。用CDCl3 (2 ml)稀釋該混合物,加入內標(iBu3 PO4 , 0.0552 ml, 0.20 mmol),並對該混合物進行分析。1 H NMR表明已經形成了苯甲醯氯(產率為82%)。1 H NMR (CDCl3 , 400 MHz) δ = 8.10 (d, J = 8 Hz, 2H), 7.68 (t, J = 8 Hz, 1H), 7.51 (t, J = 8 Hz, 2H)。13 C NMR (CDCl3 , 100 MHz) δ = 168.2, 135.2, 134.2, 131.2, 128.8。   實施例8:呋喃-2-碳醯氯A mixture of acetophenone (0.117 ml, 1.0 mmol), pyridine (0.008 ml, 0.1 mmol) and dithiodichloride (0.320 ml, 4.0 mmol) was stirred at 70 ° C for 3.5 h. It was then stirred at 137 ° C for 18 h. The mixture was diluted with CDCl 3 (2 ml), and an internal standard (iBu 3 PO 4 , 0.0552 ml, 0.20 mmol) was added and the mixture was analyzed. 1 H NMR indicated that benzamidine chloride had formed (yield 82%). 1 H NMR (CDCl 3 , 400 MHz) δ = 8.10 (d, J = 8 Hz, 2H), 7.68 (t, J = 8 Hz, 1H), 7.51 (t, J = 8 Hz, 2H). 13 C NMR (CDCl 3 , 100 MHz) δ = 168.2, 135.2, 134.2, 131.2, 128.8. Example 8: Furan-2-carbon ruthenium chloride

將2-乙醯基呋喃(0.100 ml, 1.0 mmol)、吡啶(0.008 ml, 0.1 mmol)和二氯化二硫(0.280 ml, 3.5 mmol)的混合物在70℃下攪拌2.5h,然後在138℃下攪拌19h。用CDCl3 (2 ml)稀釋該混合物,加入內標(iBu3 PO4 , 0.0552 ml, 0.20 mmol),並對該混合物進行分析。1 H NMR表明已經形成了呋喃-2-碳醯氯(產率為44%)。1 H NMR (CDCl3 , 400 MHz) δ = 7.77 (s, 1H), 7.51 (m, 1H), 6.65 (m, 1H)。   實施例9:4-硝基苯甲醯氯A mixture of 2-ethylmercaptofuran (0.100 ml, 1.0 mmol), pyridine (0.008 ml, 0.1 mmol) and disulfide dichloride (0.280 ml, 3.5 mmol) was stirred at 70 ° C for 2.5 h then at 138 ° C Stir under 19h. The mixture was diluted with CDCl 3 (2 ml), and an internal standard (iBu 3 PO 4 , 0.0552 ml, 0.20 mmol) was added and the mixture was analyzed. 1 H NMR indicated that furan-2-carbonium chloride had formed (yield: 44%). 1 H NMR (CDCl 3 , 400 MHz) δ = 7.77 (s, 1H), 7.51 (m, 1H), 6.65 (m, 1H). Example 9: 4-Nitrobenzidine chloride

將4'-硝基苯乙酮(165 mg, 1.0 mmol)、吡啶(0.008 ml, 0.1 mmol)和二氯化二硫(0.280 ml, 3.5 mmol)的混合物在70℃下攪拌2.5h,然後在138℃下攪拌19h。用CDCl3 (2 ml)稀釋該混合物,加入內標(iBu3 PO4 , 0.0552 ml, 0.20 mmol),並對該混合物進行分析。1 H NMR表明已經形成了4-硝基苯甲醯氯(產率為83%)。1 H NMR (CDCl3 , 400 MHz) δ = 8.38 (d, J = 8 Hz, 2H), 8.33 (d, J = 8 Hz, 2H)。13 C NMR (CDCl3 , 100 MHz) δ = 167.0, 151.6, 138.0, 132.3, 124.1。   實施例10:2-萘碳醯氯A mixture of 4'-nitroacetophenone (165 mg, 1.0 mmol), pyridine (0.008 ml, 0.1 mmol) and disulfide dichloride (0.280 ml, 3.5 mmol) was stirred at 70 ° C for 2.5 h then Stir at 138 ° C for 19 h. The mixture was diluted with CDCl 3 (2 ml), and an internal standard (iBu 3 PO 4 , 0.0552 ml, 0.20 mmol) was added and the mixture was analyzed. 1 H NMR indicated that 4-nitrobenzhydryl chloride had formed (yield: 83%). 1 H NMR (CDCl 3 , 400 MHz) δ = 8.38 (d, J = 8 Hz, 2H), 8.33 (d, J = 8 Hz, 2H). 13 C NMR (CDCl 3 , 100 MHz) δ = 167.0, 151.6, 138.0, 132.3, 124.1. Example 10: 2-naphthylcarbonium chloride

將2-乙醯萘(170 mg, 1.0 mmol)、吡啶(0.008 ml, 0.1 mmol)和二氯化二硫(0.280 ml, 3.5 mmol)的混合物在70℃下攪拌2.5h,然後在138℃下攪拌19h。用CDCl3 (2 ml)稀釋該混合物,加入內標(iBu3 PO4 , 0.0552 ml, 0.20 mmol),並對該混合物進行分析。1 H NMR表明已經形成了2-萘碳醯氯(產率為82%)。1 H NMR (CDCl3 , 400 MHz) δ = 8.69 (s, 1H), 8.04 to 7.94 (m, 2H), 7.87 (d, J = 8 Hz, 2H), 7.66 (t, J = 8 Hz, 1H), 7.58 (t, J = 8 Hz, 1H)。13 C NMR (CDCl3 , 100 MHz) δ = 168.4, 136.4, 134.8, 132.3, 130.3, 130.0, 129.9, 128.8, 127.9, 127.5, 125.3。   實施例11:4-苯基苯甲醯氯A mixture of 2-acetamidine (170 mg, 1.0 mmol), pyridine (0.008 ml, 0.1 mmol) and disulfide dichloride (0.280 ml, 3.5 mmol) was stirred at 70 ° C for 2.5 h then at 138 ° C Stir for 19 h. The mixture was diluted with CDCl 3 (2 ml), and an internal standard (iBu 3 PO 4 , 0.0552 ml, 0.20 mmol) was added and the mixture was analyzed. 1 H NMR indicated that 2-naphthylcarbonium chloride had been formed (yield: 82%). 1 H NMR (CDCl 3 , 400 MHz) δ = 8.69 (s, 1H), 8.04 to 7.94 (m, 2H), 7.87 (d, J = 8 Hz, 2H), 7.66 (t, J = 8 Hz, 1H ), 7.58 (t, J = 8 Hz, 1H). 13 C NMR (CDCl 3 , 100 MHz) δ = 168.4, 136.4, 134.8, 132.3, 130.3, 130.0, 129.9, 128.8, 127.9, 127.5, 125.3. Example 11: 4-Phenylbenzylidene chloride

將4'-苯基苯乙酮(196 mg, 1.0 mmol)、吡啶(0.008 ml, 0.1 mmol)和二氯化二硫(0.280 ml, 3.5 mmol)的混合物在70℃下攪拌2.5h,然後在138℃下攪拌19h。用CDCl3 (2 ml)稀釋該混合物,加入內標(iBu3 PO4 , 0.0552 ml, 0.20 mmol),並對該混合物進行分析。1 H NMR表明已經形成了4-苯基苯甲醯氯(產率為83%)。1 H NMR (CDCl3 , 400 MHz) δ = 8.16 (d, J = 8 Hz, 2H), 7.70 (d, J = 8 Hz, 2H), 7.62 (d, J = 8 Hz, 2H), 7.50-7.39 (m, 3H)。13 C NMR (CDCl3 , 100 MHz) δ = 168.0, 148.1, 139.1, 132.1, 131.8, 129.2, 128.9, 127.5, 127.4。   實施例12:苯甲醯氯A mixture of 4'-phenylacetophenone (196 mg, 1.0 mmol), pyridine (0.008 ml, 0.1 mmol) and disulfide dichloride (0.280 ml, 3.5 mmol) was stirred at 70 ° C for 2.5 h then Stir at 138 ° C for 19 h. The mixture was diluted with CDCl 3 (2 ml), and an internal standard (iBu 3 PO 4 , 0.0552 ml, 0.20 mmol) was added and the mixture was analyzed. 1 H NMR indicated that 4-phenyl benzamidine chloride had formed (yield: 83%). 1 H NMR (CDCl 3 , 400 MHz) δ = 8.16 (d, J = 8 Hz, 2H), 7.70 (d, J = 8 Hz, 2H), 7.62 (d, J = 8 Hz, 2H), 7.50- 7.39 (m, 3H). 13 C NMR (CDCl 3 , 100 MHz) δ = 168.0, 148.1, 139.1, 132.1, 131.8, 129.2, 128.9, 127.5, 127.4. Example 12: Benzamidine chloride

將苯乙酮(1.618 ml, 15.0 mmol)、3-甲基吡啶(0.08 ml, 0.82 mmol)和二氯化二硫(4.80 ml, 60 mmol)的混合物在70℃下攪拌3小時40分鐘,然後在137℃下攪拌17h。球對球(Bulb-to-bulb)蒸餾(10 mbar, 90 to 130 °C)得到苯甲醯氯和二氯化二硫的混合物。使用iBu3 PO4 作為內標,如通過1 H NMR所測定的,苯甲醯氯的產率為78%。   實施例13:4-苯基苯甲醯氯A mixture of acetophenone (1.618 ml, 15.0 mmol), 3-methylpyridine (0.08 ml, 0.82 mmol) and disulfide dichloride (4.80 ml, 60 mmol) was stirred at 70 ° C for 3 h 40 min then Stir at 137 ° C for 17 h. Bulb-to-bulb distillation (10 mbar, 90 to 130 °C) gives a mixture of benzamidine chloride and disulfide dichloride. Using iBu 3 PO 4 as an internal standard, the yield of benzamidine chloride was 78% as determined by 1 H NMR. Example 13: 4-Phenylbenzimidyl Chloride

將4'-苯基苯乙酮(1.96 g, 9.94 mmol)、3-甲基吡啶(0.146 ml, 1.5 mmol)和二氯化二硫(2.40 ml, 30.0 mmol)的混合物在60℃下攪拌2.5h,然後在138℃下攪拌15h。將混合物冷卻至室溫,用THF(3.0 ml)稀釋,用棉花過濾,並在室溫下在減壓條件下從濾液中蒸發掉THF。將殘餘物與己烷(15 ml)混合,加熱至回流,趁熱從深色(dark)沉澱中傾析。使己烷溶液在4℃下結晶過夜。將結晶過濾出來並在室溫下在減壓條件下乾燥。固體稱重為1.65 g。使用內標,通過1 H NMR測定含量,表明固體純度為82%。4-苯基苯甲醯氯的產率為62%。   實施例14:4-甲氧基苯甲醯氯A mixture of 4'-phenylacetophenone (1.96 g, 9.94 mmol), 3-methylpyridine (0.146 ml, 1.5 mmol) and disulfide dichloride (2.40 ml, 30.0 mmol) was stirred at 60 ° C. h, then stirred at 138 ° C for 15 h. The mixture was cooled to room temperature, diluted with THF (3.sub.3 mL), filtered, and then evaporated. The residue was mixed with hexane (15 ml), heated to reflux and evaporated from a dark darkness. The hexane solution was crystallized overnight at 4 °C. The crystals were filtered off and dried under reduced pressure at room temperature. The solid weighed 1.65 g. The content was determined by 1 H NMR using an internal standard, indicating a solid purity of 82%. The yield of 4-phenylbenzimid chloride was 62%. Example 14: 4-methoxybenzhydryl chloride

在75℃下,在0.5h內以HCl的形成不會太猛烈的速率向一氯化硫(3.60 ml, 45.0 mmol)中分批添加4-甲氧基苯乙酮(2.25 g, 15.0 mmol)和吡啶(0.121 ml, 1.5 mmol) 於氯苯(2.0 ml) 中的溶液。當該添加完成後,將混合物在75℃下攪拌0.5 h,然後在回流 (油浴:137℃)下攪拌15h。添加己烷(40 ml),並在室溫下將該混合物攪拌1h。從溶液傾析掉沉澱的硫和吡啶鹽酸鹽,並將固體用己烷(5 ml)沖洗。在減壓(30 mbar, 40℃)下濃縮經合併的液相,並且將殘餘物蒸餾(球對球)。在160-165℃(8 mbar)下煮沸4-甲氧基苯甲醯氯。產率為72%。   實施例15:4-苯基苯甲醯氯4-methoxyacetophenone (2.25 g, 15.0 mmol) was added in portions to sulphur monochloride (3.60 ml, 45.0 mmol) at a rate that was not too violent at 0.5 °C within 0.5 h. And a solution of pyridine (0.121 ml, 1.5 mmol) in chlorobenzene (2.0 ml). When the addition was completed, the mixture was stirred at 75 ° C for 0.5 h and then stirred under reflux (oil bath: 137 ° C) for 15 h. Hexane (40 ml) was added and the mixture was stirred at room temperature for 1 h. The precipitated sulfur and pyridine hydrochloride were decanted from the solution, and the solid was washed with hexane (5 ml). The combined liquid phases were concentrated under reduced pressure (30 mbar, 40 ° C) and the residue was distilled (ball-to-ball). The 4-methoxybenzimid chloride was boiled at 160-165 ° C (8 mbar). The yield was 72%. Example 15: 4-Phenylbenzimidyl Chloride

在室溫下,向一氯化硫(4.80 ml, 60.0 mmol)中添加4-苯基苯乙酮(716 mg, 3.31 mmol)和吡啶(0.081 ml, 1.00 mmol),並將該混合物在80-90℃下攪拌接近10min,此時HCl開始形成。然後用水浴將該混合物冷卻至室溫,然後在20 min內將剩餘的4-苯基苯乙酮(總共: 3.85 g, 19.6 mmol)和吡啶(總共: 0.32 ml, 4.0 mmol)分三部分加入。該混合物變得越來越粘稠。在室溫下保持1h之後,將該混合物加熱到140℃(油浴溫度),並在140℃下攪拌16h。然後將該混合物冷卻下來,並通過添加己烷(每次50 ml)將該產物萃取兩次,加熱至回流並傾析。將該經合併的己烷相在-30℃下保持3h,傾析,將固體從己烷(150 ml)中重結晶。得到黃色針狀的4-苯基苯甲醯氯(3.06 g, 純度:95%, 產率: 68%)。   實施例16:3,4-二甲氧基苯甲醯氯To the sulfur monochloride (4.80 ml, 60.0 mmol) was added 4-phenylacetophenone (716 mg, 3.31 mmol) and pyridine (0.081 ml, 1.00 mmol) at room temperature, and the mixture was at 80- Stirring was continued at 90 ° C for approximately 10 min at which time HCl began to form. The mixture was then cooled to room temperature with a water bath, then the remaining 4-phenylacetophenone (total: 3.85 g, 19.6 mmol) and pyridine (total: 0.32 ml, 4.0 mmol) were added in three portions over 20 min. . The mixture becomes more and more viscous. After 1 h at room temperature, the mixture was heated to 140 ° C (oil bath temperature) and stirred at 140 ° C for 16 h. The mixture was then cooled down and the product was extracted twice with hexane (50 mL each), warmed to reflux and decanted. The combined hexanes were maintained at -30 °C for 3 h, decanted and the solid was recrystallised from hexane (150 ml). 4-Phenylbenzoguanidine chloride (3.06 g, purity: 95%, yield: 68%) was obtained as a yellow needle. Example 16: 3,4-dimethoxybenzhydrazide chloride

將3,4-二甲氧基苯乙酮(0.182 g, 1.00 mmol)、一氯化硫(0.320 ml, 4.0 mmol)和吡啶(0.008 ml, 0.1 mmol)的混合物在70℃下攪拌4h,然後在136℃下攪拌18h。向該混合物中加入iBu3 PO4 (0.0552 ml, 0.20 mmol) 和 CDCl3 ,並通過1 H NMR分析表明,已經以79%的產率形成了3,4-二甲氧基苯甲醯氯。1 H NMR (CDCl3 , 400 MHz) δ 7.83 (dd, J = 8 Hz, 1 Hz, 1H), 7.53 (d, J = 1 Hz, 1H), 6.94 (d, J = 8 Hz, 1H), 3.98 (s, 3H), 3.94 (s, 3H)13 C NMR (CDCl3 , 100 MHz) δ 167.2, 155.2, 149.0, 127.2, 125.5, 112.8, 110.4, 56.3, 56.1A mixture of 3,4-dimethoxyacetophenone (0.182 g, 1.00 mmol), sulfur monochloride (0.320 ml, 4.0 mmol) and pyridine (0.008 ml, 0.1 mmol) was stirred at 70 ° C for 4 h then Stir at 136 ° C for 18 h. iBu 3 PO 4 (0.0552 ml, 0.20 mmol) and CDCl 3 were added to the mixture, and analysis by 1 H NMR indicated that 3,4-dimethoxybenzhydrin chloride was formed in a yield of 79%. 1 H NMR (CDCl 3 , 400 MHz) δ 7.83 (dd, J = 8 Hz, 1 Hz, 1H), 7.53 (d, J = 1 Hz, 1H), 6.94 (d, J = 8 Hz, 1H), 3.98 (s, 3H), 3.94 (s, 3H) 13 C NMR (CDCl 3 , 100 MHz) δ 167.2, 155.2, 149.0, 127.2, 125.5, 112.8, 110.4, 56.3, 56.1

no

no

no

Claims (21)

一種用於製備式(Ⅲ)化合物的方法;所述方法包括步驟ST2; ST2包括式(Ⅱ) 化合物與化合物SULFCHLO的反應REAC2; SULFCHLO為S2 Cl2 、SCl2 、或它們的混合物;其中, R100選自由以下組成的組 苯基, 經由1、2、3、4或5個相同的或不同的彼此獨立地選自由鹵素、C1-6 烷基、C3-8 環烷基、C1-4 烷氧基、NO2 、CF3 、CN、N(R13)(R14)R15、苄基、苯基和經取代的苯基組成的組的取代基取代的苯基,其中所述經取代的苯基由1、2、3、4或5個相同的或不同的彼此獨立地選自由鹵素、C1-6 烷基、C3-8 環烷基、C1-4 烷氧基、NO2 、CF3 、CN和N(R16)(R17)R18組成的組的取代基取代, 萘基, 經由1、2、3、4、5、6或7個相同的或不同的彼此獨立地選自由鹵素、C1-6 烷基、C3-8 環烷基、C1-4 烷氧基、NO2 、CF3 、CN、N(R13)(R14)R15、苄基、苯基和經取代的苯基組成的組的取代基取代的萘基,其中所述經取代的苯基由1、2、3、4或5個相同的或不同的彼此獨立地選自由鹵素、C1-6 烷基、C3-8 環烷基、C1-4 烷氧基、NO2 、CF3 、CN和N(R16)(R17)R18組成的組的取代基取代, 以及式(RES-I) 殘基;式(RES-I)中的所述(*) 表示分別連接到式(III)中的C(O)Cl殘基和式(II)中的C(O)CH3 殘基的鍵; X1是O、S或N-R110; R13、R14、R15、R16、R17和R18是相同的或不同的,且彼此獨立地選自由H和C1-8 烷基組成的組; R1、R2 和R3是相同的或不同的,且彼此獨立地選自由H、鹵素、CO2 R4、C(O)Cl、苯基、2-吡啶基、NO2 、CN、CF3 、C1-8 烷基和C1-8 烷氧基組成的組; 或 R1和R2一起表示-CH=CH-CH=CH-並與噻吩環一起形成苯並噻吩,以及 R3選自由H、鹵素、CO2 R4、C(O)Cl、苯基、2-吡啶基、NO2 、CN、CF3 、C1-8 烷基和C1-8 烷氧基組成的組; R4是C1-6 烷基 R101、R102和R103是相同的或不同的,且彼此獨立地為C1-10 烷基、鹵素或苯基; R110是C1-6 烷基或苯基。a method for preparing a compound of formula (III); The method comprises the step ST2; ST2 comprises the reaction REAC2 of the compound of the formula (II) with the compound SULFCHLO; the SULFCHLO is S 2 Cl 2 , SCl 2 , or a mixture thereof; Wherein R100 is selected from the group consisting of phenyl groups, which are selected from 1, 2, 3, 4 or 5 identical or different independently of each other from halogen, C 1-6 alkyl, C 3-8 cycloalkyl, a phenyl group substituted with a substituent of a group consisting of C 1-4 alkoxy, NO 2 , CF 3 , CN, N(R13)(R14)R15, benzyl, phenyl and substituted phenyl, wherein The substituted phenyl group is selected from 1, 2, 3, 4 or 5 identical or different independently of each other from halogen, C 1-6 alkyl, C 3-8 cycloalkyl, C 1-4 alkoxy. , substituted NO 2, CF 3 groups, CN, and N (R16) (R17) R18 group consisting of substituents, a naphthyl group, 1,2,3,4,5,6, or 7 via the same or different each independently Selected from halogen, C 1-6 alkyl, C 3-8 cycloalkyl, C 1-4 alkoxy, NO 2 , CF 3 , CN, N(R13)(R14)R15, benzyl, phenyl And a substituted naphthyl group of the group consisting of substituted phenyl groups, wherein the substituted phenyl group is selected from 1, 2, 3, 4 or 5 identical or different from each other independently from halogen, C 1 substituents taken from the group consisting of 1-6 alkyl, C 3-8 cycloalkyl, C 1-4 alkoxy, NO 2, CF 3, CN, and N (R16) (R17) R18 And the formula (RES-I) residue; The (*) in the formula (RES-I) represents a bond respectively bonded to the C(O)Cl residue in the formula (III) and the C(O)CH 3 residue in the formula (II); X1 is O, S or N-R110; R13, R14, R15, R16, R17 and R18 are the same or different and are independently selected from the group consisting of H and C1-8 alkyl; R1, R2 and R3 are The same or different and independently selected from H, halogen, CO 2 R 4 , C(O)Cl, phenyl, 2-pyridyl, NO 2 , CN, CF 3 , C 1-8 alkyl and C a group consisting of 1-8 alkoxy groups; or R1 and R2 together represent -CH=CH-CH=CH- and together with the thiophene ring form benzothiophene, and R3 is selected from H, halogen, CO 2 R4, C(O a group consisting of Cl, phenyl, 2-pyridyl, NO 2 , CN, CF 3 , C 1-8 alkyl and C 1-8 alkoxy; R 4 is C 1-6 alkyl R101, R102 and R103 They are the same or different and are independently of each other a C 1-10 alkyl group, a halogen or a phenyl group; R110 is a C 1-6 alkyl group or a phenyl group. 根據請求項1所述的方法,其中     在R100為經取代的苯基的情況下,則所述苯基經由1、2、3、4或5個相同的或不同的彼此獨立地選自由鹵素、C1-6 烷基、C3-6 環烷基、C1-4 烷氧基、NO2 、CF3 、CN、苄基、苯基和經取代的苯基組成的組的取代基取代,其中 所述經取代的苯基由1、2、3、4或5個相同的或不同的彼此獨立地選自由鹵素、C1-6 烷基、C3-6 環烷基、C1-4 烷氧基、NO2 、CF3 和CN組成的組的取代基取代。The method according to claim 1, wherein, in the case where R100 is a substituted phenyl group, the phenyl group is selected from the group consisting of halogen, via 1, 2, 3, 4 or 5 identical or different independently of each other. Substituted by a group consisting of C 1-6 alkyl, C 3-6 cycloalkyl, C 1-4 alkoxy, NO 2 , CF 3 , CN, benzyl, phenyl, and substituted phenyl, Wherein the substituted phenyl group is selected from 1, 2, 3, 4 or 5 identical or different from each other independently from halogen, C 1-6 alkyl, C 3-6 cycloalkyl, C 1-4 Substituents of the group consisting of alkoxy, NO 2 , CF 3 and CN are substituted. 根據請求項1或2所述的方法,其中     在R100為經取代的萘基的情況下,則所述萘基經由1、2、3、4或5個相同的或不同的彼此獨立地選自由鹵素、C1-6 烷基、C3-6 環烷基、C1-4 烷氧基、NO2 、CF3 、CN、苄基、苯基和經取代的苯基組成的組的取代基取代,其中所述經取代的苯基由1、2、3、4或5個相同的或不同的彼此獨立地選自由鹵素、C1-6 烷基、C3-6 環烷基、C1-4 烷氧基、NO2 、CF3 和CN組成的組的取代基取代。The method according to claim 1 or 2, wherein, in the case where R100 is a substituted naphthyl group, the naphthyl group is independently selected from each other by 1, 2, 3, 4 or 5 identical or different Substituents of the group consisting of halogen, C 1-6 alkyl, C 3-6 cycloalkyl, C 1-4 alkoxy, NO 2 , CF 3 , CN, benzyl, phenyl and substituted phenyl Substituted wherein the substituted phenyl group is selected from 1, 2, 3, 4 or 5 identical or different independently of each other from halogen, C 1-6 alkyl, C 3-6 cycloalkyl, C 1 Substituents of the group consisting of -4 alkoxy, NO 2 , CF 3 and CN are substituted. 根據請求項1至3中一項或多項所述的方法,其中 在R100為式(RES-I) 殘基的情況下,式(III)化合物中的C(O)Cl殘基和式(II)化合物的C(O)CH3 殘基都在式(RES-I) 殘基的2位上。The method according to one or more of claims 1 to 3, wherein, in the case where R100 is a residue of the formula (RES-I), the C(O)Cl residue in the compound of the formula (III) and the formula (II) The C(O)CH 3 residue of the compound is at the 2-position of the residue of the formula (RES-I). 根據請求項1至4中一項或多項所述的方法,其中 R1、R2 和R3是相同的或不同的且彼此獨立地選自由H、F、Cl、Br、CO2 R4、C(O)Cl、苯基、2-吡啶基、NO2 、CN、CF3 、C1-4 烷基和C1-2 烷氧基組成的組;或者 R1和R2一起表示-CH=CH-CH=CH-並與噻吩環一起形成苯並噻吩,以及 R3選自由H、F、Cl、Br、CO2 R4、C(O)Cl、苯基、2-吡啶基、NO2 、CN、CF3 、C1-4 烷基和C1-2 烷氧基組成的組; R4是C1-4 烷基。The method of one or more of claims 1 to 4, wherein R1, R2 and R3 are the same or different and are independently selected from H, F, Cl, Br, CO 2 R4, C(O) a group consisting of Cl, phenyl, 2-pyridyl, NO 2 , CN, CF 3 , C 1-4 alkyl and C 1-2 alkoxy; or R 1 and R 2 together represent -CH=CH-CH=CH And forming a benzothiophene together with a thiophene ring, and R3 is selected from the group consisting of H, F, Cl, Br, CO 2 R 4 , C(O)Cl, phenyl, 2-pyridyl, NO 2 , CN, CF 3 , C a group consisting of 1-4 alkyl and C 1-2 alkoxy; R 4 is C 1-4 alkyl. 根據請求項1至5中一項或多項所述的方法,其中 式(RES-I) 殘基選自由以下組成的組The method of one or more of claims 1 to 5, wherein the residue of formula (RES-I) is selected from the group consisting of , , , , , , , , , , , , , , , , , , , , . 根據請求項1至6中一項或多項所述的方法,其中 R1為H或Cl,以及R2和R3為H。The method of one or more of claims 1 to 6, wherein R1 is H or Cl, and R2 and R3 are H. 根據請求項1至7中一項或多項所述的方法,其中 R101、R102和R103是相同的或不同的且彼此獨立地為C1-10 烷基、F、Cl或苯基。The method of one or more of claims 1 to 7, wherein R101, R102 and R103 are the same or different and independently of each other are C1-10 alkyl, F, Cl or phenyl. 根據請求項1至8中一項或多項所述的方法,其中 X1為O或S。The method of one or more of claims 1 to 8, wherein X1 is O or S. 根據請求項1至9中一項或多項所述的方法,其中 R100選自由苯基、經取代的苯基、萘基、經取代的萘基和其中X1 為 O 或S的式(RES-I)殘基組成的組。The method of one or more of claims 1 to 9, wherein R100 is selected from the group consisting of a phenyl group, a substituted phenyl group, a naphthyl group, a substituted naphthyl group, and a formula wherein X1 is O or S (RES-I a group consisting of residues. 根據請求項1至10中一項或多項所述的方法,其中 REAC2在鹼或鹼的鹽的存在下進行。The method of one or more of claims 1 to 10, wherein REAC2 is carried out in the presence of a salt of a base or a base. 根據請求項11所述的方法,其中 所述鹼是BAS2以及所述鹼的鹽是BAS2的鹽; BAS2選自由吡啶、甲基吡啶,氯吡啶、甲基乙基吡啶、N(R10)(R11)R12、1,4-二氮雜雙環[2.2.2]辛烷、苯丙氨酸- N(R20)R21、及其混合物組成的組; R10、R11和R12  是相同的或不同的並且彼此獨立地為C1-8 烷基; R20和R21是相同的或不同的並且彼此獨立地為C1-8 烷基; 以及所述BAS2的鹽選自由鹽酸鹽、氫溴酸鹽、乙酸鹽和三氟乙酸鹽組成的組。The method according to claim 11, wherein the base is BAS2 and the salt of the base is a salt of BAS2; BAS2 is selected from the group consisting of pyridine, picoline, chloropyridine, methylethylpyridine, N(R10) (R11) a group consisting of R12, 1,4-diazabicyclo[2.2.2]octane, phenylalanine-N(R20)R21, and mixtures thereof; R10, R11 and R12 are the same or different and are each other Independently C 1-8 alkyl; R 20 and R 21 are the same or different and independently of each other are C 1-8 alkyl; and the salt of BAS 2 is selected from the group consisting of hydrochloride, hydrobromide, acetate And a group consisting of trifluoroacetate. 根據請求項1至12中一項或多項所述的方法,其中 式(II)化合物在步驟ST1中製備; ST1在ST2之前進行; ST1包括式(I)化合物與化合物ACET的反應REAC1;其中, R100如請求項1所定義,並且式(RES-I)殘基中的所述(*)表示連接到式(I) 中的H的鍵; ACET選自由乙醯氯、乙酸酐、乙酸、乙烯酮及其混合物組成的組。The method of one or more of claims 1 to 12, wherein the compound of formula (II) is prepared in step ST1; ST1 is carried out before ST2; ST1 comprises the reaction REAC1 of the compound of formula (I) with compound ACET; Wherein R100 is as defined in claim 1, and said (*) in the residue of formula (RES-I) represents a bond to H in formula (I); ACET is selected from the group consisting of acetonitrile, acetic anhydride, acetic acid a group consisting of ketene and mixtures thereof. 根據請求項13所述的方法,其中 REAC1在酸ACI1的存在下進行,ACI1選自由亞硫醯氯、BF3 -OEt2 、高氯酸、AlCl3 、聚合磺酸樹脂、甲苯磺酸、HCl、H2 SO4 、H3 PO4 、SiO2 、檸檬酸、酒石酸、草酸、沸石、以及它們的混合物組成的組。The method according to claim 13, wherein the REAC1 is carried out in the presence of acid ACI1 selected from the group consisting of sulfoxide, BF 3 -OEt 2 , perchloric acid, AlCl 3 , polysulfonic acid resin, toluenesulfonic acid, HCl a group consisting of H 2 SO 4 , H 3 PO 4 , SiO 2 , citric acid, tartaric acid, oxalic acid, zeolite, and mixtures thereof. 一種用於製備式(THIOXA)化合物的方法;其中所述方法包括步驟ST2; R30、R31、R32、R33和R34   是相同的或不同的,並且彼此獨立地選自由H、鹵素、CF3 、CH3 、OCF3 、OCH3 、CN和C(H)O組成的組; 其中, ST2、R1、R2和R3如請求項1所定義;以及 R100是如請求項1所定義的式(RES-I) 殘基,其中X1為S。A method for preparing a compound of the formula (THIOXA); Wherein said method comprises the step ST2; R30, R31, R32, R33 and R34 are the same or different, and are independently selected from the group consisting of H, halo, CF 3, CH 3 from each other, OCF 3, OCH 3, CN and C ( H) a group consisting of O; wherein, ST2, R1, R2 and R3 are as defined in claim 1; and R100 is a residue of the formula (RES-I) as defined in claim 1, wherein X1 is S. 根據請求項15所述的方法,其中 所述方法除了步驟ST2之外,還包括步驟ST1; ST1在ST2之前進行; 其中ST1如請求項13或14所定義。The method of claim 15, wherein the method comprises, in addition to step ST2, step ST1; ST1 is performed before ST2; wherein ST1 is as defined by request item 13 or 14. 根據請求項15或16所述的方法,其中 R1、R2、R3、R30、R31、R32、R33和R34為H。The method of claim 15 or 16, wherein R1, R2, R3, R30, R31, R32, R33 and R34 are H. 一種用於製備式(RIVA-I)化合物的方法;R50、R51、R52和R53 是相同的或不同的,並且彼此獨立地選自由H、鹵素、CF3 、CN、NO2 、C(O)‑NH2 、C(O)‑C1 6 烷基、O‑R60、N(R60)R61 和 C1-6 烷基組成的組; R60和R61   是相同的或不同的並且彼此獨立地選自由H、C1-4 烷基和C(O)R63組成的組; R63選自由C1-4 烷基-NH2 、NH2 、NH-C1-4 烷基、N(C1 4 烷基)C1-4 烷基 和 C1 8 烷基組成的組; R43、R44、R45、R46、R47和R48是相同的或不同的,並且彼此獨立地表示H或C1 6 烷基; 其中所述方法包括步驟ST2; 其中 ST2、R1、R2和R3如請求項1所定義;以及 R100是如請求項1所定義的式(RES-I)殘基,其中X1為S。a method for preparing a compound of the formula (RIVA-I); R50, R51, R52 and R53 are the same or different and are independently selected from the consisting of H, halo, CF 3, CN, NO 2 , C (O) -NH 2, C (O) -C 1 - 6 alkyl a group consisting of O, R60, N(R60)R61 and C1-6 alkyl; R60 and R61 are the same or different and are independently selected from H, C 1-4 alkyl and C(O) the group consisting of R63; R63 selected from the group consisting of C 1-4 alkyl -NH 2, NH 2, NH- C 1-4 alkyl, N (C 1 - 4 alkyl) C 1-4 alkyl, and C 1 - 8 the group consisting of alkyl; R43, R44, R45, R46 , R47 and R48 are the same or different and independently from each other represent H or a C 1 - 6 alkyl; wherein said method comprises the step ST2; wherein ST2, R1 R2 and R3 are as defined in claim 1; and R100 is a residue of the formula (RES-I) as defined in claim 1, wherein X1 is S. 根據請求項18所述的方法,其中 其中所述方法除了步驟ST2之外,還包括步驟ST1; ST1在ST2之前進行; 其中ST1如請求項13或14所定義。The method of claim 18, wherein the method comprises, in addition to step ST2, step ST1; ST1 is performed before ST2; wherein ST1 is as defined by request item 13 or 14. 根據請求項18或19所述的方法,其中 所述式(RIVA-I)化合物為式(RIVA‑II)化合物;其中R50、R51、R52、R53、R43、R44、R45、R46、R47和R48如請求項18所定義。The method of claim 18 or 19, wherein the compound of the formula (RIVA-I) is a compound of the formula (RIVA-II); Wherein R50, R51, R52, R53, R43, R44, R45, R46, R47 and R48 are as defined in claim 18. 根據請求項18至20中一項或多項所述的方法,其中 所述式(RIVA-I)化合物為式(RIVA-1)化合物The method of one or more of claims 18 to 20, wherein the compound of the formula (RIVA-I) is a compound of the formula (RIVA-1) .
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