TW201636881A - Layout resetting method for modified layout processing - Google Patents

Abstract

A layout resetting method for implementing a modified layout processing is provided, and the modified layout processing is performed by at least one a processor. First, an electronic design is received by the processer. Then, a first block and one or more first rules for first mandrels in the first block in the electronic design are identified. A second block and one or more second rules for second mandrels in the second block in the electronic design are identified, wherein the second block is adjacent to the first block. Then, at least a first group of the first mandrels is determined based on the one or more first rules, and at least a second group of the second mandrels is determined based on the one or more second rules and the one or more first rules. Afterwards, the first group of the first mandrels is matched with the second group of the second mandrels, and a modified layout of the electronic design is generated by aligning at least parts of the first group of the first mandrels with at least parts of the second group of the second mandrels.

Description

Layout change processing layout reset method

The present invention relates to a layout reset method, and more particularly to a layout reset method for performing layout change processing by a processor.

The size of semiconductor devices has been decreasing in recent years. For semiconductor technology, continuing to shrink semiconductor structure size, improve speed, increase performance, increase density, and reduce the cost per unit of integrated circuit are important development goals. As the size of semiconductor devices shrinks, the electronic characteristics of the devices must also be maintained or even improved to meet the requirements of the market for applied electronic products. For example, if the layers of the semiconductor device and the associated components are defective or damaged, the electronic characteristics of the device may be ignored, and thus it is one of the important issues to be paid attention to in manufacturing the semiconductor device. In general, semiconductor devices with excellent electrical performance must have internal components of good nature, such as internal components with a complete surface profile.

Taking a FinFET process as an example, a sidewall image transfer (SIT) process is usually used to fabricate the fin structure. The mandrel is laid out according to the design of the active area, and also defines the position of the fin in the structure. Existing mandrel layout design, for example, applied to static Static Random Access Memory (SRAM) or logic components, different layout areas will have different pattern density, and there are graphic density loads (ISO/dense loading), which may lead to lithography and There is a significant variation in the etching process control, thereby forming a semiconductor component having a defect in configuration.

The present invention relates to a layout reset method for performing layout change processing, which can greatly reduce the process load, thereby improving the uniformity of forming components and improving the electronic characteristics of the fabricated components.

According to an embodiment, a layout resetting method is proposed, which is performed by a processor (modified layout processing). First, the processor receives an electronic layout; then, identifying one of the first blocks of the electronic layout and confirming one or more first design rules for the plurality of first mandrels in the first block. Identifying a second block of the electronic layout and confirming one or more second design rules of the plurality of second mandrels in the second block, wherein the second block is adjacent to the first block . According to the first design rule, at least a first group of the first mandrels is determined. According to the second design rule and the first design rule, at least a second group of the second mandrels is determined. Thereafter, comparing the first group and the second group, aligning at least a portion of the first mandrel of the first group with at least a portion of the second mandrel of the second group to generate a layout of one of the electronic layouts (modified layout).

In order to better understand the above and other aspects of the present invention, the following detailed description of the embodiments and the accompanying drawings are set forth below. However, this issue The scope of protection of the Ming Dynasty shall be subject to the definition of the scope of the patent application attached.

100‧‧‧ processor

10‧‧‧Exposure area

11‧‧‧First block

111‧‧‧First mandrel

12‧‧‧Second block

121‧‧‧Second mandrel

G1‧‧‧First Group

G _D1 ‧‧‧The first densely distributed mandrel group

G _L1 ‧‧‧First loose distribution mandrel group

D _P11 , D _P12 , D _P13 , D _P14 , D _P15 , D _P16 , D _P17 , D _P18 , D _P20 , D _P21 ‧ ‧ first spacing

D _{P1m ‧‧‧first} minimum mandrel spacing

D _P19 ‧‧‧ Minimum mandrel spacing of all first mandrels in the first block

_D PD1m ‧‧‧ first mandrel densely distributed population of first mandrel pitch

G2‧‧‧ second group

G _D2 ‧‧‧Second densely distributed mandrel group

G _L2 ‧‧‧Second loose distribution mandrel group

D _P21 , D _P22 , D _P23 , D _P24 , D _P25 , D _P26 , D _P28 , D _P29 ‧‧‧Second spacing

D _{P2m ‧‧‧Second} minimum mandrel spacing

D _P27 ‧‧‧ second block all second minimum spacing mandrel spindle

D _{PD2m ‧‧‧The} distance between the second _{mandrels of the} second densely distributed mandrel group

13‧‧‧ Third block

131‧‧‧third mandrel

G3‧‧‧ third group

_{D P35, D P36, D P37} ‧‧‧ third interval

D _P3m ‧‧‧ third minimum mandrel spacing

S301~S306, S601~S606, S801~S808‧‧‧ steps

FIG. 1A is a schematic diagram of a wafer according to an embodiment of the present disclosure. The wafer has a predetermined plurality of exposed regions 10 thereon.

Figure 1B is an enlarged schematic view of an exposed region of the wafer of Figure 1A.

FIG. 2 is a schematic diagram showing the arrangement of a plurality of mandrels of two adjacent blocks in one of the modified layouts according to the first embodiment of the present disclosure.

FIG. 3 is a flow chart showing the layout reset method of the first embodiment for performing the layout change processing.

FIG. 4 is a schematic diagram showing the arrangement of a plurality of mandrels of two adjacent blocks in another modified layout according to the first embodiment of the present disclosure.

FIG. 5 is a schematic diagram showing the arrangement of a plurality of mandrels of two adjacent blocks in one of the modified layouts according to the second embodiment of the present disclosure.

Fig. 6 is a flow chart showing the layout resetting method of the second embodiment for performing the layout change processing.

Figure 7 is a schematic view showing the arrangement of a modified layout of a plurality of mandrels of adjacent three blocks in the third embodiment of the present disclosure.

FIG. 8 is a flowchart of the layout reset method of the third embodiment for performing the layout change processing.

In the following disclosure, the implementation is described in detail with the illustration. A layout reset method proposed by the example performs modified layout processing. The layout change processing of the embodiment is processed, for example, by a processor of an electronic computing system. The layout reset method of the present disclosure is applied, for example, to a FinFET process, in which the mandrels of adjacent blocks in the layout design can be at least partially or fully aligned with each other. When performing a yellow or etch process, the same process environment with aligned areas can significantly reduce process load, such as reducing the variation in pattern density and improving the problem of ISO/dense loading, thereby increasing the formation in these areas. The uniformity of the components (such as the fins) and the reduction of the fin pitch (minimize Fin pitch shift), resulting in good critical dimension (CD) control, improve the electronic properties of the block. Furthermore, the method proposed in the embodiment performs the layout change processing in a simplified and efficient step, so that the process can greatly reduce the load.

The embodiments are presented below in conjunction with the drawings to illustrate the related methods of the present disclosure. Identical and/or similar elements follow the same and/or similar element symbols. However, the disclosure is not limited thereto, and the disclosure does not show all possible embodiments. It is noted that other implementations not presented in this disclosure may also be applicable. The details and steps that may be implemented may vary, and may be varied and modified depending on the needs of the actual application without departing from the spirit and scope of the disclosure. Furthermore, the scale ratios on the drawings are not drawn to scale in kind. Therefore, the description and illustration are for illustrative purposes only and are not intended to be limiting.

<First Embodiment>

FIG. 1A is a schematic diagram of a wafer according to an embodiment of the present disclosure. The wafer has a predetermined plurality of exposed regions 10 thereon. Figure 1B is an enlarged schematic view of an exposed region of the wafer of Figure 1A. An exposed area 10 includes a plurality of blocks, each of which has its corresponding circuit layout and design according to the needs of the actual application, so that the semiconductor elements fabricated corresponding to the respective blocks can have their intended functions. In the first embodiment, an electronic layout design of two adjacent blocks (such as 11 and 12) is taken as an example, and a layout reset method is proposed to perform the layout change processing.

FIG. 2 is a schematic diagram showing the arrangement of a plurality of mandrels of two adjacent blocks in one of the modified layouts according to the first embodiment of the present disclosure. In the first embodiment, an adjacent first block 11 and a second block 12 are taken as an example, and the first block 11 includes a plurality of first mandrels (first The layout of the mandrels 111, the second block 12 includes a layout of a plurality of second mandrels 121. As shown in Fig. 2, the first mandrel 111 of the first block 11 and the second mandrel 121 of the second block 12 extend in a first direction (e.g., the x direction). FIG. 3 is a flow chart showing the layout reset method of the first embodiment for performing the layout change processing. The layout change processing of the first embodiment is processed, for example, by a processor 100 of an electronic computing system.

Please also refer to Figures 1A, 1B, 2 and 3. First, as shown in step S301, the processor 100 receives an electronic design. Next, as shown in step S302, the first block 11 of the electronic layout is identified, and one or more of the first plurality of first mandrels 111 in the first block 11 are confirmed. One or more first design rules.

In an embodiment, the first design rule of the plurality of first mandrels 111 in the first block 11 is confirmed to include: confirming a first pitch of the first mandrel 111 of the first block 11 The first pitches D _P11 , D _P12 and D _P13 as illustrated in FIG. 2 . Wherein, the first pitches may be partially the same or identical (for example, D _P11 , D _P12 and D _P13 may be equal or unequal).

Next, as shown in step S303, identifying the second block 12 of the electronic layout and confirming one or more second design rules of the plurality of second mandrels 121 in the second block (one or more second Rules), wherein the second block 12 is adjacent to the first block 11.

In one embodiment, the second design rule for confirming the plurality of second mandrels 121 in the second block 12 includes: confirming the second pitches of the plurality of second mandrels 121 in the second block 12. The second pitches D _P21 , D _P22 and D _P23 as illustrated in FIG. 2 . Wherein, the second pitches may be partially the same or identical (for example, D _P21 , D _P22 and D _P23 may be equal or unequal).

As shown in step S304, at least one first group of the plurality of first mandrels 111 in the first block 11 is determined according to one or more first design rules (eg, according to the size of the first pitch) (a first Group of the first mandrels)G1.

As shown in step S305, a plurality of second mandrels 121 in the second block 12 are determined according to one or more second design rules (for example, according to the size of the second pitch) and one or more first design rules. At least a second group of the second mandrels G2.

As shown in step S306, the first group G1 and the second group G2 are aligned, and at least a portion of the first mandrel 111 in the first group G1 (ie, may be part or all of the first group G1) The first mandrel 111) is aligned with at least a portion of the second mandrel 121 of the second group G2 (ie, possibly some or all of the second mandrel 121 of the second group G2) to produce an electronic layout A modified layout.

For example, if a portion of the first mandrel 111 in the first block 11 has the same pitch, the first pitch D _P11 as shown in FIG. 2 is equal to D _P12 equal to D _P13 (D _P11 = D _P12 = D _P13 ) The first mandrels 111 corresponding to the equal spacing are determined as the first group G1. And a portion of the second mandrel 121 in the second block 12 has the same pitch, as shown in FIG. 2, the second pitch D _P22 is equal to D _P23 but not equal to D _P21 , and the second pitch D _P22 and D _P23 Corresponding to the first pitch D _P11 (D _P11 = D _P12 = D _P13 ), so according to the second and first design rules (ie, the second pitch and the first pitch), corresponding to the second pitches D _P22 and D _P23 The second mandrel 121 is then determined to be the second group G2. After comparing the first group G1 and the second group G2, the first mandrel 111 and the second mandrel 121 having the same pitch in the first group G1 and the second group G2 are aligned to generate a modified layout. (modified layout).

Furthermore, although the first group G1 illustrated in FIG. 2 is the first mandrel 111 including the same pitch, the second group G2 is the second mandrel 121 including the same pitch, and is in the first group. All of the first mandrels 111 in G1 are aligned with all of the second mandrels 121 in the second group G2, but the disclosure is not limited thereto. It is also possible that the first group G1 and the second group G2 of the embodiment respectively include the first mandrel 111 and the second mandrel 121 having different pitches. When the first group G1 and the second group G2 are compared, the root is According to the first pitches and the second pitches, the first mandrel 111 and the second mandrel 121 having the same pitch in the first group G1 and the second group G2 are aligned correspondingly to Produce a change layout.

In another embodiment, the mandrels corresponding to the minimum mandrel spacing in two adjacent blocks are aligned. FIG. 4 is a schematic diagram showing the arrangement of a plurality of mandrels of two adjacent blocks in another modified layout according to the first embodiment of the present disclosure. In this embodiment, the minimum mandrel spacing among all the mandrels of the first block 11 and the second block 12 is confirmed. If the minimum mandrel spacing is equal, the spacing between the two blocks corresponding to the minimum mandrel spacing can be made. The mandrel is aligned to reduce process burden.

For example, as shown in FIG. 4, confirming the first design rule of the plurality of first mandrels 111 in the first block 11 includes: confirming the first minimum mandrel spacing of the first mandrel 111 of the first block 11 (first minimum mandrel pitch) D _P1m . Confirming the second design rule of the plurality of second mandrels 121 in the second block 12 includes: confirming a second minimum mandrel pitch of the plurality of second mandrels 121 in the second block 12 D _P2m . The distance between the other first mandrels 111 in the first block, such as D _P11 , D _P14 , D _P15 , D _{P16 ,} etc., may be equal or unequal, but greater than the first minimum mandrel spacing D _P1m ; the second block The distance between the other 12 second mandrels 121 may be equal or unequal, such as D _P21 , D _P24 , D _P25 , D _{P26 ,} etc., but both are greater than the second minimum mandrel spacing D _P2m . The first group G1 of the plurality of first _mandrels 111 in the first block 11 is determined according to the first minimum mandrel pitch D _P1m . _Determining , according to the second minimum mandrel pitch D _P2m and the first minimum mandrel pitch D _P1m , a second group G2 of the plurality of second _mandrels 121 in the second block 12, wherein the first group G1 the minimum spacing D _P1m a mandrel equal to a second minimum line spacing D _P2m mandrel in the second group G2. After that, comparing the first group G1 and the second group G2, the first mandrel 111 corresponding to the first minimum mandrel 111 pitch D _P1m in the first group G1 is aligned with the corresponding second minimum in the second group G2 a second mandrel spacing D _P2m mandrel 121, to generate one of an electronic layout change layout. After the change layout is completed, it can be stored in the processor 100.

<Second embodiment>

In the second embodiment, in the received electronic layout, two adjacent blocks for changing and adjusting the position of the mandrel are identified, and a densely distributed mandrel group is identified, and then a densely distributed mandrel group is designed according to the design rule. The alignment is performed, for example, by identifying the minimum mandrel spacing in two adjacent blocks and aligning the mandrels corresponding to the minimum mandrel spacing to produce a modified layout.

FIG. 5 is a schematic diagram showing the arrangement of a plurality of mandrels of two adjacent blocks in one of the modified layouts according to the second embodiment of the present disclosure. Please also refer to Figures 1A and 1B. In the second embodiment, the adjacent first block 11 and second block 12 are, for example, a layout including a plurality of first mandrel 111 and second mandrel 121, respectively. Furthermore, in the second embodiment, the plurality of first mandrels 111 of the first block 11 include a first set of dense-arranged mandrels G _D1 , and the second block 12 The plurality of second mandrels 121 include a second set of dense-arranged mandrels G _D2 . In an embodiment, the first mandrel 111 of the first block 11 further includes a first set of loose-arranged mandrels G _L1 , and a plurality of second mandrels of the second block 12 . 121 further includes a second set of loose-arranged mandrels G _L2 .

The mandrel is dense or loosely distributed, depending on the spacing between the mandrels and the number of mandrels corresponding to the smaller spacing. The minimum mandrel spacing of all mandrels in the block does not necessarily appear to be closely distributed and has a certain amount of density. Distributed among the mandrel groups. As shown in FIG. 5, it is assumed that the minimum mandrel spacing of all mandrels 111 in the first block 11 is D _P19 , but the adjacent spacings such as D _P17 , D _P18 , D _P20 , D _{P21 are} larger, and the remaining regions have A certain number of densely distributed first _mandrels 111 having a pitch of D _PD1m determines that the first densely distributed mandrel group G _D1 is a first region for alignment and layout change (wherein the spacing of the mandrels 111) The size relationship may be: D _P19 <D _PD1m <D _P17 /D _P18 /D _P20 /D _P21 ). Similarly, it is assumed that the minimum mandrel spacing of all mandrels 121 in the second block 12 is D _P27 , but the adjacent spacings such as D _P28 , D _P29 , D _P26 , D _P25 , D _{P24 are} larger, and the rest of the area has a certain The number of closely spaced _mandrels 121 with a spacing of D _PD2m determines that the second densely distributed mandrel group G _{D2 is} used for comparison and the second region of the layout change (wherein the spacing relationship between the mandrels 121 may be _{: D P27 <D PD2m <D} P28 / D P29 / D P26 / D P25 / D P24).

Fig. 6 is a flow chart showing the layout resetting method of the second embodiment for performing the layout change processing. The layout change processing of the second embodiment is processed, for example, by a processor 100 (shown in FIG. 1A) of an electronic computing system. Please also refer to Figures 5 and 6.

First, as shown in step S601, the processor 100 receives an electronic design. Next, as shown in step S602, the first block 11 of the electronic layout is identified, and a plurality of first mandrels 111 in the first block 11 are confirmed. One or more first design rules. In the second embodiment, the first design rule for confirming the plurality of first mandrels 111 in the first block 11 includes, for example, confirming the spacing and size between all of the first mandrels 111 in the first block 11.

Next, as shown in step S603, the second block 12 of the electronic layout is identified and one or more second design rules for confirming the plurality of second mandrels 121 in the second block, wherein the second block 12 is associated with The first block 11 is adjacent. In the second embodiment, the second design rule for confirming the plurality of second mandrels 121 in the second block 12 includes, for example, confirming the spacing and size between all of the second mandrels 121 in the second block 12.

As shown in step S604, at least a first group of the plurality of first mandrels 111 in the first block 11 is determined according to one or more first design rules (eg, according to the size of the first pitch). For example, the first densely distributed mandrel group G _D1 in the first block 11 is identified and determined according to the determined spacing and size between all the first mandrels 111 in the first block 11 (as the first group) group), and recognizes that the first minimum distance _D PD1m mandrel first group G _D1 dense distribution of the mandrel.

As shown in step S605, a plurality of second mandrels 121 in the second block 12 are determined according to one or more second design rules (for example, according to the size of the second pitch) and one or more first design rules. At least one second group G2. For example, the second densely distributed mandrel group G _D2 in the second block 12 is identified and determined according to the determined spacing and size between all the second mandrels 121 of the second block 12 (as a second group) And identifying the second minimum mandrel spacing D _PD2m of the second densely distributed mandrel group G _D2 .

As shown in step S606, comparing the first group and the second group, that is, the first densely distributed mandrel group G _D1 and the second densely distributed mandrel group G _D2 , and at least part of the first group G1 The first mandrel 111 (ie, the first mandrel 111, which may be part or all of the first densely distributed mandrel group G _D1 ) is aligned with at least a portion of the second mandrel 121 of the second group G2 (ie, possibly It is the second mandrel 121) which is part or all of the second densely distributed mandrel group G _D2 , and produces a modified layout of the electronic layout. The layout of the changes resulting from the alignment adjustment is shown in Figure 5.

Although the distance between the first densely distributed mandrel group G _D1 of the first block 11 as illustrated in FIG. 5 is the same (ex: D _PD1m ), the actual application may be different as long as it is adjacent to the adjacent second zone. The distance between the second densely distributed mandrel groups G _D2 of the block 12 may correspond, and the first mandrel 111 and the second dense one of the first densely distributed mandrel groups G _D1 when the mandrel clusters are densely distributed subsequently the second group G _D2 distribution mandrel mandrel 121 can be accomplished at least partially, or even fully aligned, the method according to the application for changing the layout embodiment. After the change layout is completed, it can be stored in the processor 100.

<Third embodiment>

In the third embodiment, the electronic layout design of the adjacent first block 11, the second block 12, and the third block 13 is taken as an example, and a layout reset method is proposed to perform the layout change processing. . Figure 7 is a schematic view showing the arrangement of a modified layout of a plurality of mandrels of adjacent three blocks in the third embodiment of the present disclosure. Please also refer to Figures 1A and 1B. In the third embodiment, the third block 13 is adjacent to the second block 12, and the first block 11, the second block 12, and the third block 13 respectively include, for example, a plurality of first mandrels respectively. 111. The layout of the second mandrel 121 and the third mandrel 131. Wherein the first mandrel 111, the second mandrel 121 and the third mandrel 131 For example, it extends in a first direction (for example, the x direction). FIG. 8 is a flowchart of the layout reset method of the third embodiment for performing the layout change processing.

Please also refer to Figures 1A, 1B, 7 and 8. First, as shown in step S801, the processor 100 receives an electronic layout. Next, as shown in step S802, the first block 11 of the electronic layout is identified, and one or more first design rules of the plurality of first mandrels 111 in the first block 11 are confirmed. Next, as shown in step S803, the second block 12 of the electronic layout is identified and one or more second design rules for confirming the plurality of second mandrels 121 in the second block, wherein the second block 12 is associated with The first block 11 is adjacent. Step S802 is the same as step S302, and step S803 is the same as step S303. For details of the related content, refer to the foregoing embodiment, and details are not described herein again.

Next, as shown in step S804, one of the third block 13 of the electronic layout and one or more third of the third mandrels 131 in the third block 13 are identified. One or more third rules, wherein the third block 13 is adjacent to the second block 12. In one embodiment, the third design rule for confirming the plurality of third mandrels 131 in the third block 13 includes: confirming the third pitches of the plurality of second mandrels 131 in the third block 13. The third pitches may be partially identical or identical (eg, D _P35 , D _P36 , D _P37 , D _P3m may be equal or unequal). In one embodiment, the third pitches, such as D _P35 , D _P36 , D _{P37 ,} are all greater than the third minimum mandrel pitch D _{P3m , for example} .

Next, as shown in step S805, at least one first group G1 of the plurality of first mandrels 111 in the first block 11 is determined according to one or more first design rules (eg, according to the size of the first pitch) . And, as shown in step S305, according to one Or a plurality of second design rules (eg, according to the size of the second pitch) and one or more first design rules, determining at least a second group G2 of the plurality of second mandrels 121 in the second block 12. Step S805 is the same as step S304, and step S806 is the same as step S305. For details of the related content, refer to the foregoing embodiment, and details are not described herein again.

As shown in step S807, at least one third group G3 of the plurality of third mandrels 131 in the third block 13 is determined according to one or more third design rules and second design rules. Embodiment, the third mandrel 131 as the mandrel of a third minimum distance D _{P3m P2m} equal to the second minimum distance D mandrel a second embodiment of the mandrel 121, the mandrel corresponding to the minimum distance D of the third to _P3m The three-core shaft 131 is determined to be the third group G3.

As shown in step S808, the first group G1 and the second group G2 are aligned, and at least part (ie, part or all) of the first mandrel 111 of the first group G1 is aligned with the second group G2. At least a portion (ie, partially or wholly) of the second mandrel 121, and aligning the second group G2 and the third group G3, and aligning at least a portion of the third mandrel 131 of the third group G3 with the second At least a portion of the second mandrel 121 in the group G2, resulting in a change in layout of one of the electronic layouts.

As described above, according to a processing method of the modified layout of the third embodiment, the first group G1 of the plurality of first _mandrels 111 in the first block 11 can be determined according to the first minimum mandrel pitch D _P1m ; The second minimum mandrel pitch D _P2m and the first minimum mandrel pitch D _P1m determine a second group G2 of the plurality of second _mandrels 121 in the second block 12; according to the third minimum mandrel pitch D _P3m and second minimum spacing mandrel D _P2m, a third decision block 13 a plurality of third group G3 of the third spindle 131. Wherein the second group G2 in the second minimum distance D _P2m mandrel equal to the first line of the first group G1, the smallest mandrel pitch D _P1m, and equal to the minimum third group G3, the third mandrel The pitch D _P3m is generated, and the resulting modified layout is such that the third mandrel 131 of D _P3m corresponding to the minimum third mandrel pitch is aligned with the second mandrel 121 of D _P2m corresponding to the minimum second mandrel pitch, such as Figure 7 shows. The resulting changed layout can be stored in the processor 100 (Fig. 1A).

It should be noted that although the flowchart shown in FIG. 8 recognizes the third block 131 and the step 804 of confirming the third rule is before the step 805 of determining the first group G1, the disclosure does not For this reason, step 804 may also be performed after step 806, that is, after the second group G2 is determined, the step 804 of identifying the third block 131 and confirming the third rule is performed, and the third group is determined. Step 807 of G3.

Furthermore, although the flow chart of the third block 131 and the third group G3 for determining the third mandrel 131 is identified as the flowchart shown in FIG. 8, the first mandrel is in the first group G1. 111 is performed before the step of aligning the second mandrel 121 in the second group G2, but the disclosure is not limited thereto, and part of the first mandrel 111 may be aligned with the second group in the first group G1. The steps of the third block 121 are performed after the step of the partial second mandrel 121 in the group G2, such as the step 804 of identifying the third block 131 and confirming the third rule, and the step 807 of determining the third group G3, Produce a change layout for the electronic layout.

According to the above, the layout reset method proposed by the embodiment performs the layout change processing, for example, by a processor of an electronic computing system, so that the core of the adjacent different blocks in the layout design can be reached. At least part Or a comprehensive alignment of each other. For example, the adjacent blocks have the same mandrel spacing as the alignment of the mandrel (as in the first embodiment, FIG. 2); or the minimum mandrel spacing of all the mandrels in the block is identified, and the corresponding minimum core is selected. The mandrel of the shaft spacing is aligned (as in the first embodiment, FIG. 4); or the densely distributed area of the adjacent block is first identified, and then the mandrel corresponding to the minimum mandrel spacing inside the densely distributed area is made Aligned (as in the second embodiment, Figure 5). And the method of the embodiment can be applied to the layout change of a plurality of adjacent blocks (such as the third embodiment, FIG. 7). By applying the method of the embodiment, the same process environment with aligned areas can greatly reduce the process load during the yellow light or etching process, such as reducing the variation of pattern density and improving the problem of pattern dense load, and improving component formation in the regions. The uniformity of the uniformity and the reduction of the pitch are offset, which in turn results in a component having a good critical dimension (CD) and improved electronic properties.

Other embodiments, such as the positional arrangement and arrangement of different blocks and mandrels on the electronic layout, may also be applicable, and the actual condition of the core of each block in the electronic layout and the degree of load caused by the process can be applied. Appropriate choices and changes. Therefore, the structures shown in Figures 2, 4, 5, and 7 are for illustrative purposes only and are not intended to limit the scope of the disclosure. For example, related changes may be made to the layout of a plurality of adjacent blocks (such as four, five, ... or more blocks) by referring to the method as described in the third embodiment. In addition, it is to be understood by those skilled in the art that the shapes and positions of the constituent elements in the embodiments are not limited to those illustrated in the drawings, but are adjusted accordingly according to the requirements and/or manufacturing steps of the actual application.

In summary, although the invention has been disclosed above by way of example, It is not intended to limit the invention. A person skilled in the art can make various changes and modifications without departing from the spirit and scope of the invention. Therefore, the scope of the invention is defined by the scope of the appended claims.

S301~S306‧‧‧Steps

Claims (16)

A layout resetting method is performed by a processor (process layout), the method comprising: the processor receiving an electronic design; identifying the electronic layout a first block and one or more first rules for confirming a plurality of first mandrels in the first block; identifying the electronic layout a second block and one or more second rules confirming a plurality of second mandrels in the second block, wherein the second block a block adjacent to the first block; determining, according to the one or the first design rules, at least a first group of the first mandrels; Or the second design rule and the one or the first design rules, determining a second group of the second mandrels; and comparing the first group Group and the second group to make at least the first group The plurality of first mandrel aligned with the plurality of points of the second group in a second mandrel at least partially to produce one of the electronic layout change layout (modified layout). The layout reset method of claim 1, wherein the one or the first design rules include the first mandrels in the first block First pitches. The layout reset method of claim 2, wherein the one or the second design rules include second pitches of the second mandrels in the second block. The layout reset method of claim 3, wherein at least some of the first pitches are equal to at least a portion of the second pitches, and the step of generating the changed layout comprises: according to the equal first intervals And the second spacings, the first and second core axes of the first group and the second group respectively corresponding to the first group and the second groups Align to produce the change layout. The layout reset method of claim 1, wherein the one or the first design rules comprise a first minimum mandrel pitch, the second design rule or the second design rule The system includes a second minimum mandrel pitch. The layout reset method of claim 5, wherein the first minimum mandrel pitch is equal to the second mandrel pitches, and is determined according to the second mandrel pitch and the first minimum mandrel pitch The second group, the step of generating the change layout includes: comparing the first group and the second group to the first group and the second group respectively corresponding to the same The first mandrel and the second mandrel of a minimum mandrel pitch and the second minimum mandrel pitch are aligned with one another to create the modified layout. Such as the layout reset method described in claim 1 of the patent scope, wherein the The first mandrel includes a first set of dense-arranged mandrels, and the second mandrel includes a second set of dense-arranged mandrels. The layout reset method of claim 7, wherein the one or the first design rules comprise: determining a spacing and a size between all of the first mandrels in the first block; The one or the second design rules include: confirming the spacing and size between all of the second mandrels in the second block. The method for resetting the layout according to claim 8 , wherein the determining the at least the first group of the first mandrels comprises: confirming all of the first ones in the first block The spacing and size between the mandrels, identifying and determining the first densely distributed mandrel group in the first block and the corresponding first mandrels, and identifying the first densely distributed mandrel group a first minimum mandrel spacing; determining at least the second group of the second mandrels includes: determining a spacing and size between all of the second mandrels in the second block Identifying and determining the second densely distributed mandrel group in the second block and the corresponding second mandrels, and identifying a second minimum mandrel spacing of the second densely distributed mandrel group. The first and the second densely distributed mandrel groups are the first group and the second group, respectively. The layout reset method of claim 9, wherein the first minimum mandrel pitch is equal to the second mandrel pitch, and the step of changing the layout is generated. The method includes: comparing the first and the second densely distributed mandrel groups such that the first and second densely distributed mandrel groups respectively correspond to the first minimum mandrel spacing and the second minimum The first mandrels and the second mandrels of the mandrel spacing are aligned with each other to create the modified layout. The layout reset method of claim 1, wherein the first mandrels in the first block and the second mandrels in the second block extend in a first direction . The layout reset method of claim 1, further comprising: identifying a third block of the electronic layout and confirming a plurality of third mandrels in the third block (third mandrels) One or more third rules, wherein the third block is adjacent to the second block; according to the one or the third design rule and the one or the a second design rule, determining a third group of the third mandrels; and comparing the second group and the third group, and making the third group At least a portion of the third mandrels in the set are aligned with at least a portion of the second mandrels of the second group to produce the altered layout of the electronic layout. The layout reset method of claim 12, wherein the first mandrels in the first block, the second mandrels in the second block, and the third block are The third mandrels extend in a first direction. The layout reset method of claim 12, wherein the step of identifying the third block and determining the third group of the third mandrels is The steps of the first group of the first group in the first group are aligned with the portions of the second mandrels in the second group. The layout reset method of claim 12, wherein the step of identifying the third block and determining the third group of the third mandrels is partially in the first group The step of aligning the first mandrel with a portion of the second mandrels in the second group is performed to produce the altered layout of the electronic layout. The method for resetting a layout as described in claim 1, further comprising: storing the change layout in the processor.