TW201634295A - Transfer apparatus and transfer method - Google Patents

Transfer apparatus and transfer method Download PDF

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Publication number
TW201634295A
TW201634295A TW105102101A TW105102101A TW201634295A TW 201634295 A TW201634295 A TW 201634295A TW 105102101 A TW105102101 A TW 105102101A TW 105102101 A TW105102101 A TW 105102101A TW 201634295 A TW201634295 A TW 201634295A
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Taiwan
Prior art keywords
plate
shaped body
roller
blanket
support
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TW105102101A
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Chinese (zh)
Inventor
正司和大
芝藤弥生
Original Assignee
思可林集團股份有限公司
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Publication of TW201634295A publication Critical patent/TW201634295A/en

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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41FPRINTING MACHINES OR PRESSES
    • B41F16/00Transfer printing apparatus
    • B41F16/0006Transfer printing apparatus for printing from an inked or preprinted foil or band
    • B41F16/006Arrangements for moving, supporting or positioning the printing foil or band
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41MPRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
    • B41M5/00Duplicating or marking methods; Sheet materials for use therein
    • B41M5/26Thermography ; Marking by high energetic means, e.g. laser otherwise than by burning, and characterised by the material used
    • B41M5/382Contact thermal transfer or sublimation processes

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  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Printing Methods (AREA)
  • Manufacturing Of Printed Wiring (AREA)

Abstract

This invention makes a first plate body SB abut a second plate body BL. Being installed with an upper end abutting a lower surface of the second plate body BL in a portion that is closer to a center of the second plate body BL than a portion where a roller component 431 initially abuts, a supporting component 441 supports the second plate body BL from below. The supporting component 441 enables separate abutting with respect to a lower surface of the second plate body BL. As the supporting component 441 supports the second plate body BL, the roller component 431 abuts the second plate body BL to push the second plate body BL against the first plate body SB. The roller component 431 pushes the second plate body BL against the first plate body SB while moving along the lower surface of the second plate body BL.

Description

轉印裝置及轉印方法 Transfer device and transfer method

本發明係關於一種轉印裝置及轉印方法,使2片板狀體抵接而自一個板狀體對另一個板狀體轉印被轉印物。 The present invention relates to a transfer device and a transfer method in which two sheet-like members are brought into contact with each other to transfer a transfer object from one plate-like body to the other plate-like body.

作為於玻璃基板或半導體基板等板狀體形成圖案或薄膜之技術,有以下技術:使2片板狀體相互抵接,而將擔載於一個板狀體之主面之圖案或薄膜等被轉印物轉印至另一個板狀體。例如於本案申請人之前所揭示之日本專利特開2014-144628號公報(專利文獻1)所記載之技術中,將表面擔載圖案之橡皮布(blanket)與基板對向配置,利用長條輥部件上推橡皮布使之抵接於基板。進而,一面上推橡皮布一面使輥部件沿著橡皮布移動,藉此橡皮布密接於基板,圖案自橡皮布轉印至基板。 As a technique for forming a pattern or a film on a plate-like body such as a glass substrate or a semiconductor substrate, there is a technique in which two plate-like bodies are brought into contact with each other, and a pattern or a film which is carried on a main surface of one plate-like body is The transfer material is transferred to another plate. For example, in the technique described in Japanese Laid-Open Patent Publication No. 2014-144628 (Patent Document 1), the blanket having a surface-supporting pattern is disposed opposite to the substrate, and the long roller is used. The component pushes up the blanket to abut the substrate. Further, while pushing the blanket, the roller member is moved along the blanket, whereby the blanket is in close contact with the substrate, and the pattern is transferred from the blanket to the substrate.

如此,於藉由利用輥部件之壓抵使保持為水平姿勢之2片板狀體抵接之技術中,為了使輥部件抵接,必須以位於下側之板狀體之下表面中央部開放之狀態保持。但,於此種保持態樣下,板狀體會因自重向下方撓曲,而與另一個板狀體之間產生位置偏移,難以精度良好地控制被轉印物之轉印位置。尤其是近年來,隨著板狀體尺寸大型化,其自重亦增大,此種問題越來越明顯。 In the technique of abutting the two plate-like members held in a horizontal posture by the pressing of the roller member, in order to contact the roller member, it is necessary to open the center portion of the lower surface of the lower plate-shaped body. The state remains. However, in such a holding state, the plate-like body is deflected downward by its own weight, and a positional displacement occurs between the plate-like body and the other plate-like body, and it is difficult to accurately control the transfer position of the transferred object. In particular, in recent years, as the size of the plate body has increased, its self-weight has also increased, and such a problem has become more and more obvious.

本發明係鑒於上述問題而完成者,其目的在於提供一種技術,於使2片板狀體抵接之轉印裝置及轉印方法中,能夠抑制因板狀體撓曲所導致之位置偏移,而使2個板狀體位置精度良好地抵接。 The present invention has been made in view of the above problems, and an object of the present invention is to provide a technique capable of suppressing a positional shift due to deflection of a plate-like body in a transfer device and a transfer method in which two plate-like members are in contact with each other. In addition, the position of the two plate-shaped bodies is accurately abutted.

為了達成上述目的,本發明之一態樣係一種轉印裝置,其包括:第1保持機構,其將第1板狀體以下表面開放之狀態保持為水平姿勢;第2保持機構,其以保持第2板狀體之周緣部且上述第2板狀體之上表面與上述第1板狀體之下表面接近且對向之方式,且以上述第2板狀體之下表面中於上表面側與上述第1板狀體對向之下表面中央部開放之水平姿勢,保持上述第2板狀體;輥部件,其具有沿著上述第2板狀體之下表面延伸設置之輥形狀,構成為能夠相對於上述第2板狀體之下表面分離抵接,一面抵接於上述第2板狀體之下表面而將上述第2板狀體壓抵於上述第1板狀體,一面沿著上述第2板狀體之下表面移動;及支持部件,其構成為能夠相對於上述第2板狀體之下表面分離抵接,且藉由上端抵接於上述第2板狀體之下表面而自下方支持上述第2板狀體;且於上述輥部件遠離上述第2板狀體之狀態下,於上述第2板狀體之下表面中較上述輥部件最初抵接之部分靠上述第2板狀體中心側之位置,上述支持部件抵接於上述第2板狀體之下表面而支持上述第2板狀體;上述輥部件對被上述支持部件支持之上述第2板狀體開始抵接,而沿著上述第2板狀體之下表面移動。 In order to achieve the above object, an aspect of the present invention provides a transfer device including: a first holding mechanism that maintains a state in which a surface of a first plate-shaped body is open to a horizontal posture; and a second holding mechanism that holds a peripheral portion of the second plate-shaped body and the upper surface of the second plate-shaped body is adjacent to the lower surface of the first plate-shaped body and facing the upper surface of the second plate-shaped body a horizontal posture in which the side is open to a central portion of the lower surface of the first plate-shaped body, and the second plate-shaped body is held; and the roller member has a roll shape extending along a lower surface of the second plate-shaped body. The second plate-shaped body is pressed against the lower surface of the second plate-shaped body while being in contact with the lower surface of the second plate-shaped body, and the second plate-shaped body is pressed against the first plate-shaped body. Moving along a lower surface of the second plate-shaped body; and a supporting member configured to be separable from the lower surface of the second plate-shaped body and abutting against the second plate-shaped body by the upper end Supporting the second plate-shaped body from below on the lower surface; and far from the roller member In the state of the second plate-shaped body, the support member is in contact with the first portion of the lower surface of the second plate-shaped member at a position closer to the center of the second plate-shaped body than the portion where the roller member first abuts. The second plate-shaped body is supported by the lower surface of the plate-like body, and the roller member starts to abut against the second plate-shaped body supported by the support member, and moves along the lower surface of the second plate-shaped body.

又,為了達成上述目的,本發明之另一態樣係一種轉印方法,其包括:保持步驟,其係將第1板狀體以下表面開放之狀態保持為水平姿勢,以保持第2板狀體之周緣部且上述第2板狀體之上表面與上述第1板狀體之下表面接近且對向之方式,且以上述第2板狀體之下表面中於上表面側與上述第1板狀體對向之下表面中央部開放之水平姿勢,保持上述第2板狀體;輥配置步驟,其係將輥部件配置於遠離上述第2板狀 體之位置,上述輥部件具有沿著上述第2板狀體之下表面延伸設置之輥形狀,且構成為能夠沿著上述第2板狀體之下表面移動;支持步驟,其係使支持部件之上端於較上述輥部件靠上述第2板狀體中心側之位置抵接於上述第2板狀體之下表面,而自下方支持上述第2板狀體,上述支持部件構成為能夠相對於上述第2板狀體之下表面分離抵接;及轉印步驟,其係上述輥部件對被上述支持部件支持之上述第2板狀體開始抵接,將上述第2板狀體壓抵於上述第1板狀體,並沿著上述第2板狀體之下表面移動。 Further, in order to achieve the above object, another aspect of the present invention is a transfer method comprising: a holding step of maintaining a state in which a surface of the first plate-shaped body is open to a horizontal posture to maintain a second plate shape a peripheral portion of the body and the upper surface of the second plate-shaped body is adjacent to and facing the lower surface of the first plate-shaped body, and the upper surface of the second plate-shaped body is on the upper surface side and the first surface a horizontal posture in which the plate-shaped body is open to the central portion of the lower surface to hold the second plate-shaped body; and a roller disposing step of disposing the roller member away from the second plate shape a position of the body, wherein the roller member has a roll shape extending along a lower surface of the second plate-shaped body, and is configured to be movable along a lower surface of the second plate-shaped body; and a supporting step for supporting the member The upper end abuts against the lower surface of the second plate-shaped body at a position closer to the center of the second plate-shaped body than the roller member, and supports the second plate-shaped body from below, and the support member is configured to be capable of being opposed to The lower surface of the second plate-shaped body is separated from the surface; and the transfer step is such that the roller member starts to abut against the second plate-shaped body supported by the support member, and the second plate-shaped body is pressed against The first plate-shaped body moves along the lower surface of the second plate-shaped body.

於如上述般構成之發明中,輥部件一面將第2板狀體壓抵於第1板狀體一面移動,藉此使第1板狀體與第2板狀體密接。此時,於輥部件抵接於第2板狀體之前,於較輥部件靠近第2板狀體中心之一側,支持部件抵接於第2板狀體之下表面,藉此支持第2板狀體。於該狀態下,輥部件抵接於第2板狀體而將第2板狀體壓抵於第1板狀體。 In the above-described configuration, the roller member is moved to the first plate-like body while the second plate-shaped body is pressed against the first plate-shaped body, whereby the first plate-shaped body and the second plate-shaped body are in close contact with each other. At this time, before the roller member abuts against the second plate-shaped body, the support member abuts against the lower surface of the second plate-shaped body at the side closer to the center of the second plate-shaped body than the roller member, thereby supporting the second Plate-like body. In this state, the roller member abuts against the second plate-shaped body and presses the second plate-shaped body against the first plate-shaped body.

周緣部被保持且下表面中央部開放之第2板狀體因自重而其中央部向下方撓曲。藉此,第2板狀體各部之水平方向位置與以平坦姿勢保持之狀態相比,有向第2板狀體中心側偏移之傾向。上述情形導致2個板狀體間產生位置偏移,被轉印物之轉印位置發生偏移。 The second plate-like body in which the peripheral edge portion is held and the central portion of the lower surface is opened is deflected downward by the central portion due to its own weight. As a result, the horizontal position of each of the second plate-shaped members tends to be shifted toward the center side of the second plate-shaped body as compared with the state of being held in the flat posture. In the above case, positional displacement occurs between the two plate-like bodies, and the transfer position of the transferred object is shifted.

根據本案之發明人等人之見解,該轉印位置之偏移量大致由第1板狀體與第2板狀體於最初抵接之區域之位置偏移量決定。換言之,藉由將第1板狀體與第2板狀體於最初抵接之區域之位置偏移抑制得充分小,能夠於整個轉印範圍內抑制位置偏移。 According to the inventors of the present invention, the amount of shift of the transfer position is substantially determined by the amount of positional deviation between the first plate-shaped body and the second plate-shaped body in the region where the first plate-shaped body abuts. In other words, the positional deviation of the first plate-shaped body and the second plate-shaped body in the region where the first plate-shaped body is in contact with each other is sufficiently suppressed, and the positional shift can be suppressed over the entire transfer range.

因此,本發明中,於輥部件對第2板狀體抵接之前,於較輥部件靠第2板狀體中心側,支持部件抵接於第2板狀體而自下方支持第2板狀體。因此,第2板狀體係由支持部件與支持第2板狀體之周緣部之第2保持機構以夾隔與輥部件最初抵接之位置之方式自其兩側支持。因此,於輥部件最初抵接之位置,第2板狀體之撓曲變小,水平方向上之 位置偏移亦得到抑制。該狀態下,輥部件抵接於第2板狀體,並將其壓抵並密接於第1板狀體,藉此,即使以後輥部件移行,亦可抑制第1板狀體與第2板狀體之水平方向之位置偏移增大。結果,能夠於整個轉印範圍內抑制轉印位置偏移。 Therefore, in the present invention, before the roller member abuts against the second plate-shaped body, the support member abuts against the second plate-like body on the center side of the second plate-shaped body with respect to the roller member, and supports the second plate shape from below. body. Therefore, the second plate-like system is supported by the support member from the second holding means that supports the peripheral edge portion of the second plate-like body so as to be spaced apart from the first position of the roller member. Therefore, at the position where the roller member first comes into contact, the deflection of the second plate-shaped body becomes small, and the horizontal direction The positional offset is also suppressed. In this state, the roller member abuts against the second plate-shaped body and presses against the first plate-like body, whereby the first plate-shaped body and the second plate can be suppressed even if the roller member moves later. The positional deviation of the horizontal direction of the shape increases. As a result, the transfer position shift can be suppressed over the entire transfer range.

根據本發明,關於第2板狀體中最初與輥部件抵接之部分,以夾隔該部分之方式由第2保持機構與支持部件予以支持,藉此抑制撓曲。如此,於因撓曲所導致之水平方向之位置偏移得到抑制之狀態下,輥部件將第2板狀體壓抵於第1板狀體,藉此亦可抑制以後輥部件移行時之位置偏移增大。結果,能夠使2個板狀體位置精度良好地抵接,能夠將被轉印物精度良好地轉印至特定之轉印位置。 According to the invention, the portion of the second plate-shaped body that is initially in contact with the roller member is supported by the second holding mechanism and the support member so as to sandwich the portion, thereby suppressing the deflection. In the state in which the positional deviation in the horizontal direction due to the deflection is suppressed, the roller member presses the second plate-shaped body against the first plate-shaped body, thereby suppressing the position of the subsequent roller member when the roller member is moved. The offset increases. As a result, the position of the two plate-like bodies can be accurately contacted, and the transferred object can be accurately transferred to a specific transfer position.

1‧‧‧轉印裝置 1‧‧‧Transfer device

2‧‧‧上平台塊 2‧‧‧Upper platform block

3‧‧‧下平台塊 3‧‧‧ Lower platform block

4‧‧‧轉印輥塊 4‧‧‧Transfer roller block

5‧‧‧輥移行驅動部 5‧‧‧ Roller Drive Department

9‧‧‧控制單元 9‧‧‧Control unit

21‧‧‧上平台(第1保持機構) 21‧‧‧Upper platform (1st holding institution)

21a‧‧‧(上平台之)下表面(抵接面) 21a‧‧‧ (on the platform) lower surface (abutment surface)

22‧‧‧樑部件 22‧‧‧ beam parts

23‧‧‧平台升降機構 23‧‧‧ platform lifting mechanism

31‧‧‧下平台(第2保持機構、支持台) 31‧‧‧Under platform (2nd holding institution, support desk)

31a‧‧‧(下平台之)上表面(支持面) 31a‧‧‧ (lower platform) upper surface (support surface)

32‧‧‧支柱 32‧‧‧ pillar

33、34‧‧‧升降手單元(輔助支持機構) 33, 34‧‧‧ Lifting hand unit (auxiliary support organization)

36‧‧‧對準平台 36‧‧‧Alignment platform

37‧‧‧對準機構(對準機構) 37‧‧‧Alignment mechanism (alignment mechanism)

43‧‧‧輥單元 43‧‧‧roll unit

44‧‧‧升降器單元 44‧‧‧ Lifter unit

45‧‧‧板部件(移動部件) 45‧‧‧Board parts (moving parts)

46‧‧‧升降器單元 46‧‧‧lift unit

51‧‧‧導軌 51‧‧‧rails

52‧‧‧滾珠螺桿機構 52‧‧‧Rolling screw mechanism

91‧‧‧平台升降控制部 91‧‧‧ Platform Lift Control Department

92‧‧‧吸附控制部 92‧‧‧Adsorption Control Department

93‧‧‧手升降控制部 93‧‧‧Hand Lift Control Department

94‧‧‧對準控制部(對準機構) 94‧‧‧Alignment control unit (alignment mechanism)

95‧‧‧輥升降控制部 95‧‧‧Roller Lift Control Department

96‧‧‧升降器升降控制部 96‧‧‧ Lifter Lift Control Department

97‧‧‧輥移行控制部 97‧‧‧Rolling shift control department

231‧‧‧支持部件 231‧‧‧Support parts

232‧‧‧支持部件 232‧‧‧Support parts

233‧‧‧滾珠螺桿 233‧‧‧Rolling screw

234‧‧‧馬達 234‧‧‧Motor

235‧‧‧螺母部 235‧‧‧ Nut Department

236‧‧‧聯軸器 236‧‧‧Coupling

311‧‧‧開口部 311‧‧‧ openings

312‧‧‧吸附槽 312‧‧‧Adsorption tank

331~334、341~344‧‧‧升降手(輔助支持部件) 331~334, 341~344‧‧‧ Lifting hand (auxiliary support parts)

335‧‧‧驅動部 335‧‧‧ Drive Department

345‧‧‧驅動部 345‧‧‧ Drive Department

431‧‧‧轉印輥(輥部件) 431‧‧‧Transfer roller (roller part)

441‧‧‧升降片(支持部件) 441‧‧‧ Lifting piece (supporting parts)

441a‧‧‧(升降片之)上表面(抵接部位) 441a‧‧‧ (lifting piece) upper surface (abutment part)

442‧‧‧框架 442‧‧‧Frame

443‧‧‧滾珠螺桿 443‧‧‧Rolling screw

444‧‧‧螺母部 444‧‧‧ Nut Department

445‧‧‧馬達 445‧‧ ‧motor

446‧‧‧間隙感測器(間隙檢測機構) 446‧‧‧Gap sensor (gap detection mechanism)

461‧‧‧升降片 461‧‧‧ Lifting film

462‧‧‧臂 462‧‧‧ Arm

463‧‧‧升降器升降機構 463‧‧‧ Lifter lifting mechanism

471‧‧‧升降輥(支持部件) 471‧‧‧ Lifting roller (supporting parts)

521‧‧‧支持部件 521‧‧‧Support parts

522‧‧‧支持部件 522‧‧‧Support parts

523‧‧‧滾珠螺桿 523‧‧‧Ball screw

524‧‧‧馬達 524‧‧ ‧motor

525‧‧‧螺母部 525‧‧‧ Nut Department

526‧‧‧聯軸器 526‧‧‧Coupling

BL‧‧‧橡皮布(第2板狀體) BL‧‧‧ blanket (2nd plate)

L1‧‧‧直線 L1‧‧‧ Straight line

L2‧‧‧直線 L2‧‧‧ Straight line

PT‧‧‧圖案 PT‧‧‧ pattern

PP‧‧‧版 PP‧‧ version

R1‧‧‧區域 R1‧‧‧ area

SB‧‧‧基板(第l板狀體) SB‧‧‧Substrate (1st plate)

X、Y、Z‧‧‧座標軸 X, Y, Z‧‧‧ coordinate axis

Z1‧‧‧撓曲量 Z1‧‧‧ deflection

Z2‧‧‧撓曲量 Z2‧‧‧ deflection

△Z‧‧‧撓曲量 △Z‧‧‧ deflection

圖1係模式性地表示本發明之轉印裝置之一實施形態之側視圖。 Fig. 1 is a side view schematically showing an embodiment of a transfer device of the present invention.

圖2係表示該轉印裝置之主要部之構成之圖。 Fig. 2 is a view showing the configuration of a main portion of the transfer device.

圖3A、圖3B係表示轉印輥塊之圖。 3A and 3B are views showing a transfer roller block.

圖4A、圖4B係表示轉印輥塊與升降手單元之位置關係之圖。 4A and 4B are views showing the positional relationship between the transfer roller block and the elevator unit.

圖5A、圖5B係用來說明橡皮布之撓曲問題之圖。 5A and 5B are views for explaining the problem of the deflection of the blanket.

圖6A至圖6C係表示橡皮布撓曲與轉印位置偏移之關係之圖。 6A to 6C are views showing the relationship between the flexing of the blanket and the shift of the transfer position.

圖7係表示利用該轉印裝置進行之轉印處理之流程圖。 Fig. 7 is a flow chart showing a transfer process by the transfer device.

圖8A至圖8D係模式性地表示轉印處理過程中之各部位置之第1至第4圖。 8A to 8D schematically show first to fourth views of the positions of the respective portions during the transfer process.

圖9A至圖9D係模式性地表示轉印處理過程中之各部位置之第5至第8圖。 9A to 9D schematically show fifth to eighth views of the positions of the respective portions in the transfer process.

圖10A、圖10B係表示升降器單元之變化例之圖。 10A and 10B are views showing a modified example of the lifter unit.

圖11A至圖11C係表示升降器單元之另一變化例之圖。 11A to 11C are views showing another modification of the lifter unit.

圖1係模式性地表示本發明之轉印裝置之一實施形態之側視圖。又,圖2係表示該轉印裝置之主要部之構成之圖。為了統一表示各圖中之方向,如圖1所示,設定XYZ正交座標軸。此處,XY平面表示水平面,Z軸表示鉛垂軸。更詳細來說,(+Z)方向表示鉛垂向上方向。 Fig. 1 is a side view schematically showing an embodiment of a transfer device of the present invention. 2 is a view showing the configuration of a main portion of the transfer device. In order to uniformly represent the directions in the respective figures, as shown in Fig. 1, the XYZ orthogonal coordinate axes are set. Here, the XY plane represents a horizontal plane, and the Z axis represents a vertical axis. In more detail, the (+Z) direction indicates the vertical direction.

該轉印裝置1具有於未圖示之主框架安裝有上平台塊2、下平台塊3及轉印輥塊4之構造。又,轉印裝置1具有控制單元9,上述控制單元9按照預先儲存之處理程式控制裝置各部而執行特定動作。 This transfer device 1 has a structure in which an upper deck block 2, a lower deck block 3, and a transfer roller block 4 are attached to a main frame (not shown). Further, the transfer device 1 has a control unit 9, and the control unit 9 controls a specific operation of each unit in accordance with a processing program stored in advance.

首先,對裝置1之整體構成進行說明。再者,關於上平台塊2及下平台塊3之細部之構造,例如可使用上述專利文獻1(日本專利特開2014-144628號公報)所記載之上平台塊及下平台塊,於此僅對其概要進行說明。 First, the overall configuration of the device 1 will be described. In addition, as for the structure of the detail of the upper platform block 2 and the lower platform block 3, for example, the upper platform block and the lower platform block described in the above-mentioned Patent Document 1 (Japanese Patent Laid-Open Publication No. 2014-144628) can be used. Explain its outline.

轉印裝置1係藉由使由下平台塊3保持之橡皮布BL與由上平台塊2保持之版PP或基板SB相互抵接而進行圖案形成之裝置。利用該裝置1之圖案形成工藝更具體而言如下所述。首先,藉由對均勻地塗佈了圖案形成材料之橡皮布BL抵接對應於應形成之圖案而製成之版PP,而使擔載於橡皮布BL之塗佈層圖案化(圖案化處理)。然後,藉由使此種經圖案化之橡皮布BL與基板SB抵接,而將擔載於橡皮布BL之圖案轉印至基板SB(轉印處理)。藉此,於基板SB形成所需圖案。 The transfer device 1 is a device for patterning by abutting the blanket BL held by the lower deck block 3 and the plate PP or the substrate SB held by the upper deck block 2 against each other. The pattern forming process using the apparatus 1 is more specifically described below. First, the coating layer carried on the blanket BL is patterned by patterning the blanket PP which is uniformly coated with the pattern forming material against the pattern to be formed (patterning treatment) ). Then, by patterning the patterned blanket BL and the substrate SB, the pattern carried on the blanket BL is transferred to the substrate SB (transfer processing). Thereby, a desired pattern is formed on the substrate SB.

如此,該轉印裝置1能夠用於於基板SB形成特定圖案之圖案形成工藝中之圖案化處理及轉印處理這兩種處理。但,亦可用於僅負責該等處理中之一種處理之態樣。又,亦可用於將擔載於橡皮布BL之薄膜轉印至基板SB之目的。以下,以將形成於橡皮布BL表面之圖案或薄膜轉印至基板SB之轉印處理作為前提,對裝置之構成及動作進行說明。但,藉由將基板SB換成版PP,亦能說明圖案化處理中之動作。 As described above, the transfer device 1 can be used for both the patterning process and the transfer process in the pattern forming process of forming a specific pattern on the substrate SB. However, it can also be used to take care of only one of these processes. Moreover, it can also be used for the purpose of transferring the film carried on the blanket BL to the substrate SB. Hereinafter, the configuration and operation of the apparatus will be described on the premise that the pattern or film formed on the surface of the blanket BL is transferred to the substrate SB. However, the operation in the patterning process can also be explained by replacing the substrate SB with the plate PP.

上平台塊2具備下表面成為平坦之基板保持面21a之上平台21。上平台21安裝於沿著Y方向延伸之樑部件22之下部,利用樑部件22將基 板保持面21a保持為水平姿勢。樑部件22藉由於Y方向上隔離配置之1對平台升降機構23、23而升降自如地保持於鉛垂方向(Z方向)。藉此,上平台21能夠沿著Z方向進行移動。 The upper stage block 2 is provided with a stage 21 above the substrate holding surface 21a whose lower surface is flat. The upper platform 21 is mounted on the lower portion of the beam member 22 extending in the Y direction, and the base member 22 is used. The board holding surface 21a is maintained in a horizontal posture. The beam member 22 is held up and down in the vertical direction (Z direction) by the pair of platform lifting mechanisms 23 and 23 disposed in the Y direction. Thereby, the upper platform 21 can move in the Z direction.

本實施形態中,使用滾珠螺桿機構作為平台升降機構23之一例,但並不限定於此。平台升降機構23具備:滾珠螺桿233,其藉由支持部件231、232而旋轉自如地支持於主框架;馬達234,其使滾珠螺桿233旋轉;及螺母部235,其安裝於滾珠螺桿233。滾珠螺桿233與馬達234經由聯軸器236而連結。馬達234由設置於控制單元9之平台升降控制部91控制,馬達234根據來自平台升降控制部91之控制信號而旋轉,藉此上平台21進行升降。 In the present embodiment, a ball screw mechanism is used as an example of the platform lifting mechanism 23, but the invention is not limited thereto. The platform lifting mechanism 23 includes a ball screw 233 that is rotatably supported by the main frame by the support members 231 and 232, a motor 234 that rotates the ball screw 233, and a nut portion 235 that is attached to the ball screw 233. The ball screw 233 and the motor 234 are coupled via a coupling 236. The motor 234 is controlled by a platform elevation control unit 91 provided in the control unit 9, and the motor 234 is rotated in accordance with a control signal from the platform elevation control unit 91, whereby the upper platform 21 is moved up and down.

雖然圖中沒有出現,但於上平台21之下表面(基板保持面)21a設有吸附槽或吸附孔。視需要自設置於控制單元9之吸附控制部92對吸附槽或吸附孔供給負壓。藉此,上平台21能夠吸附保持抵接於基板保持面21a之基板SB之上表面。基板保持面21a之平面尺寸形成為較應保持之基板SB之尺寸略小。 Although not shown in the drawing, an adsorption groove or an adsorption hole is provided on the lower surface (substrate holding surface) 21a of the upper stage 21. The adsorption control unit 92 provided in the control unit 9 supplies a negative pressure to the adsorption tank or the adsorption hole as needed. Thereby, the upper stage 21 can adsorb and hold the upper surface of the substrate SB which is in contact with the substrate holding surface 21a. The planar size of the substrate holding surface 21a is formed to be slightly smaller than the size of the substrate SB to be held.

藉由此種構成之上平台塊2,基板SB保持為水平姿勢。基板SB以應被轉印圖案或薄膜之被轉印面朝下之方式搬入到裝置1。又,藉由平台升降機構23升降上平台21,保持於接下來要說明之下平台之橡皮布BL與基板SB之間之間隙被調整為規定值。 With the above-described upper platform block 2, the substrate SB is maintained in a horizontal posture. The substrate SB is carried into the apparatus 1 so that the transfer surface to be transferred or the transfer surface of the film faces downward. Further, the platform 21 is lifted and lowered by the platform elevating mechanism 23, and the gap between the blanket BL and the substrate SB held by the platform to be described next is adjusted to a predetermined value.

下平台塊3具備下平台31,上述下平台31於中央部設有開口部311,且上表面成為平坦且水平之橡皮布保持面31a。下平台31被複數個支柱32支持,配置於上平台21之下方。下平台31之平面尺寸較應保持之橡皮布BL之尺寸大,且開口部311之開口尺寸較基板SB之平面尺寸大。藉此,橡皮布BL僅下表面之周緣部抵接於下平台31,中央部於下表面開放之狀態下保持於下平台31。於下平台31之上表面(橡皮布保持面)31a中與橡皮布BL抵接之區域,設有吸附槽312。視需要,自控制 單元9之吸附控制部92對吸附槽312供給負壓。藉此,橡皮布BL被吸附保持於下平台31上。橡皮布BL以擔載應轉印至基板SB之圖案或薄膜之擔載面朝上之方式保持為水平姿勢。 The lower deck block 3 includes a lower deck 31, and the lower deck 31 is provided with an opening 311 at the center, and the upper surface is a flat and horizontal blanket holding surface 31a. The lower platform 31 is supported by a plurality of struts 32 and is disposed below the upper platform 21. The plane size of the lower stage 31 is larger than the size of the blanket BL to be held, and the opening size of the opening 311 is larger than the plane size of the substrate SB. Thereby, the blanket BL is only in contact with the lower stage 31 at the peripheral edge portion of the lower surface, and the center portion is held by the lower stage 31 while the lower surface is open. An adsorption groove 312 is provided in a region of the upper surface (rubber holding surface) 31a of the lower stage 31 that abuts against the blanket BL. Self-control as needed The adsorption control unit 92 of the unit 9 supplies a negative pressure to the adsorption tank 312. Thereby, the blanket BL is adsorbed and held on the lower stage 31. The blanket BL is held in a horizontal posture so that the pattern to be transferred onto the substrate SB or the supporting surface of the film faces upward.

保持下平台31之支柱32安裝於對準平台36。對準平台36經由複數個對準機構37而安裝於主框架。對準機構37具有例如交叉滾子軸承機構,根據來自設置於控制單元9之對準控制部94之控制信號,使對準平台36沿著水平方向(XY方向)及繞Z軸之θ方向移動。藉此,下平台31於水平面(XY平面)內移動,保持於上平台21之基板SB與保持於下平台31之橡皮布BL之水平方向上之相對位置最佳化。 The struts 32 that hold the lower platform 31 are mounted to the alignment platform 36. The alignment platform 36 is mounted to the main frame via a plurality of alignment mechanisms 37. The alignment mechanism 37 has, for example, a crossed roller bearing mechanism that moves the alignment stage 36 in the horizontal direction (XY direction) and in the θ direction around the Z axis in accordance with a control signal from the alignment control portion 94 provided in the control unit 9. . Thereby, the lower stage 31 moves in the horizontal plane (XY plane), and the relative position of the substrate SB held by the upper stage 21 and the blanket BL held by the lower stage 31 is optimized.

下平台塊3進而具備1對升降手單元33、34,上述1對升降手單元33、34以於X方向上隔開間隔而相面對之方式設置。升降手單元33與升降手單元34具有相對於YZ平面而相互對稱之形狀,其等之構造基本上相同。 The lower deck block 3 further includes a pair of lifter units 33 and 34, and the pair of lifter units 33 and 34 are disposed to face each other with an interval in the X direction. The lifter unit 33 and the lifter unit 34 have shapes that are symmetrical with respect to the YZ plane, and the configurations thereof are substantially the same.

升降手單元33具備:多根(於此,作為一例為4根)升降手331、332、333、334,其等面向下平台31之開口部311而沿著Y方向依序設置;及驅動部335,其使該等升降手個別地升降。同樣地,升降手單元34具備:升降手341、342、343、344,其等面向下平台31之開口部311而沿著Y方向依序設置;及驅動部345,其使該等升降手個別地升降。驅動部335、345由設置於控制單元9之手升降控制部93控制。根據來自手升降控制部93之控制信號,驅動部335、345個別地控制各升降手之鉛垂方向位置。 The lifter unit 33 includes a plurality of (four, for example, four) lifters 331, 332, 333, and 334 that are disposed in the Y direction in order to face the opening 311 of the lower stage 31; and the drive unit 335, which causes the lifters to lift and lower individually. Similarly, the lifter unit 34 includes lifters 341, 342, 343, and 344 which are disposed in the Y direction in the opening portion 311 facing the lower platform 31, and a drive unit 345 which causes the lifters to individually Lifting and lowering. The drive units 335 and 345 are controlled by a hand lift control unit 93 provided in the control unit 9. The drive units 335 and 345 individually control the position in the vertical direction of each of the lifters based on the control signal from the hand lift control unit 93.

各升降手藉由將上表面定位於與下平台31之基板保持面31a為同一平面之位置,而輔助地支持以下表面開放之狀態保持於下平台31之橡皮布BL之中央部下表面。藉此,能夠抑制橡皮布BL之撓曲而平坦地支持。又,藉由視需要退避到下方,避免與接下來要說明之轉印輥之移行之干涉。 Each of the lifters is held at a position on the same plane as the substrate holding surface 31a of the lower stage 31, and is additionally supported by the lower surface of the central portion of the blanket BL of the lower stage 31 while the lower surface is supported. Thereby, it is possible to suppress the deflection of the blanket BL and to support it flat. Further, by retreating to the lower side as needed, interference with the migration of the transfer roller to be described later is avoided.

轉印輥塊4具備輥單元43及升降器單元44。該等單元43、44安裝於板部件45之上表面。板部件45經由輥移行驅動部5而安裝於主框架。輥移行驅動部5具備:導軌51,其於下平台31之下方固定於主框架,沿著Y方向延伸;及滾珠螺桿機構52,其沿著導軌51設置。於滾珠螺桿機構52之螺母部525安裝有板部件45。 The transfer roller block 4 is provided with a roller unit 43 and a lifter unit 44. These units 43, 44 are mounted on the upper surface of the plate member 45. The plate member 45 is attached to the main frame via the roller transfer drive unit 5. The roller shift drive unit 5 includes a guide rail 51 that is fixed to the main frame below the lower stage 31 and extends in the Y direction, and a ball screw mechanism 52 that is provided along the guide rail 51. A plate member 45 is attached to the nut portion 525 of the ball screw mechanism 52.

圖3A及圖3B係表示轉印輥塊之圖。更具體而言,圖3A係表示轉印輥塊4及輥移行驅動部5之構造之立體圖,圖3B係表示轉印輥塊4與橡皮布BL之位置關係之圖。於支持轉印輥塊4之輥移行驅動部5中,沿著導軌51設有滾珠螺桿機構52。更具體而言,藉由設置於導軌51之兩端附近之支持部件521、522支持滾珠螺桿523,滾珠螺桿523經由聯軸器526藉由馬達524進行旋轉。於滾珠螺桿523安裝有螺母部525。藉由使馬達524旋轉,螺母部525沿著導軌51於Y方向上水平移動。隨之,由螺母部525支持之轉印輥塊4於Y方向上水平移動。 3A and 3B are views showing a transfer roller block. More specifically, FIG. 3A is a perspective view showing the structure of the transfer roller block 4 and the roller shift driving portion 5, and FIG. 3B is a view showing the positional relationship between the transfer roller block 4 and the blanket BL. In the roller travel drive unit 5 that supports the transfer roller block 4, a ball screw mechanism 52 is provided along the guide rail 51. More specifically, the ball screw 523 is supported by the support members 521, 522 provided near the both ends of the guide rail 51, and the ball screw 523 is rotated by the motor 524 via the coupling 526. A nut portion 525 is attached to the ball screw 523. By rotating the motor 524, the nut portion 525 is horizontally moved in the Y direction along the guide rail 51. Accordingly, the transfer roller block 4 supported by the nut portion 525 is horizontally moved in the Y direction.

設置於轉印輥塊4之輥單元43具備形成為以X方向作為長度方向之輥形狀之轉印輥431。轉印輥431係由支持部件432支持,圍繞與X方向平行之旋轉軸而旋轉自如。轉印輥431之表面由彈性體、例如由橡膠原材料形成,X方向上之轉印輥431之長度較基板SB之X方向長度長。 The roller unit 43 provided in the transfer roller block 4 is provided with a transfer roller 431 formed in a roll shape having a longitudinal direction in the X direction. The transfer roller 431 is supported by the support member 432 and is rotatable about a rotation axis parallel to the X direction. The surface of the transfer roller 431 is formed of an elastic body, for example, a rubber material, and the length of the transfer roller 431 in the X direction is longer than the length of the substrate SB in the X direction.

臂433自支持部件432之X方向上之中央部向下方延伸。臂433安裝於使轉印輥431升降之輥升降機構434。輥升降機構434之構造並無特別限定,例如可使用氣缸、螺線管或滾珠螺桿機構等。輥升降機構434係由設置於控制單元9之輥升降控制部95控制。輥升降機構434根據來自輥升降控制部95之控制信號而作動,藉此,轉印輥431相對於板部件45沿著鉛垂方向(Z方向)進行升降。 The arm 433 extends downward from the central portion of the support member 432 in the X direction. The arm 433 is attached to a roller elevating mechanism 434 that elevates and lowers the transfer roller 431. The structure of the roller elevating mechanism 434 is not particularly limited, and for example, a cylinder, a solenoid, a ball screw mechanism, or the like can be used. The roller elevating mechanism 434 is controlled by a roller elevating control unit 95 provided in the control unit 9. The roller elevating mechanism 434 is actuated by the control signal from the roller elevating control unit 95, whereby the transfer roller 431 moves up and down in the vertical direction (Z direction) with respect to the plate member 45.

如圖3B所示,轉印輥431藉由輥升降機構434之作動,能夠於實線所表示之退避位置與虛線所表示之按壓位置之間進行升降移動。退避位置係退避到保持於下平台31之橡皮布BL下方且輥上端遠離橡皮布 BL之位置。另一方面,於按壓位置,輥上端抵接於橡皮布BL下表面而將橡皮布BL上推。 As shown in FIG. 3B, the transfer roller 431 is moved by the roller elevating mechanism 434, and can be moved up and down between the retracted position indicated by the solid line and the pressed position indicated by the broken line. The retracted position is retracted to be held under the blanket BL of the lower platform 31 and the upper end of the roller is away from the blanket The location of BL. On the other hand, at the pressing position, the upper end of the roller abuts against the lower surface of the blanket BL to push up the blanket BL.

升降器單元44具備平板狀升降片(blade)441,上述升降片441與XZ平面平行且以X方向作為長度方向而延伸。關於升降片441,其上表面441a被精加工成平坦,且由安裝於板部件45之升降器升降機構而升降自如地支持。具體而言,於豎立設置於板部件45之框架442安裝滾珠螺桿443,於安裝於滾珠螺桿443之螺母部444固定升降片441。滾珠螺桿443藉由經由聯軸器447連結之馬達445之作動而旋轉。藉此,螺母部444沿著鉛垂方向(Z方向)升降,而使升降片441升降。 The lifter unit 44 includes a flat plate lifter 441 which extends in parallel with the XZ plane and has a longitudinal direction in the X direction. Regarding the lifter piece 441, the upper surface 441a is finished to be flat, and is supported by the lifter lifting mechanism attached to the plate member 45 to be lifted and lowered. Specifically, the ball screw 443 is attached to the frame 442 which is erected on the plate member 45, and the lift piece 441 is fixed to the nut portion 444 attached to the ball screw 443. The ball screw 443 is rotated by the operation of the motor 445 coupled via the coupling 447. Thereby, the nut portion 444 is moved up and down along the vertical direction (Z direction), and the lifter piece 441 is moved up and down.

馬達445由設置於控制單元9之升降器升降控制部96控制。馬達445根據來自升降器升降控制部96之控制信號而旋轉,藉此,升降片441進行升降移動。如此,框架442、滾珠螺桿443、螺母部444、馬達445及聯軸器447構成滾珠螺桿機構,該滾珠螺桿機構作為升降器升降機構發揮功能。再者,作為升降器升降機構,並不限定於此種滾珠螺桿機構,可使用各種方式之驅動機構。 The motor 445 is controlled by a lifter lifting control unit 96 provided in the control unit 9. The motor 445 is rotated in accordance with a control signal from the lifter elevation control unit 96, whereby the lifter 441 is moved up and down. Thus, the frame 442, the ball screw 443, the nut portion 444, the motor 445, and the coupling 447 constitute a ball screw mechanism that functions as a lifter lifting mechanism. Further, the lifter lifting mechanism is not limited to such a ball screw mechanism, and various types of drive mechanisms can be used.

如圖3B所示,升降片441藉由升降器升降機構之作動,能夠於退避到保持於下平台31之橡皮布BL之下方且遠離橡皮布BL之退避位置(實線)與上表面441a抵接於橡皮布BL下表面之抵接位置(虛線)之間進行升降移動。升降片441能夠與轉印輥431獨立地進行升降。於抵接位置,升降片441之上表面441a被定位於與下平台31之上表面31a大致相同之Z方向高度。因此,當升降片441位於抵接位置時,升降片441之上表面441a與下平台31之上表面31a位於同一水平面內。藉此,下平台31與升降片441抵接於下表面之橡皮布BL被支持為水平姿勢。 As shown in FIG. 3B, the lifting piece 441 can be retracted to the retracted position (solid line) which is held below the blanket BL of the lower stage 31 and away from the blanket BL, and the upper surface 441a by the action of the lifter lifting mechanism. The lifting and lowering movement is performed between the abutting positions (dotted lines) of the lower surface of the blanket BL. The lifter 441 can be lifted and lowered independently of the transfer roller 431. In the abutting position, the upper surface 441a of the lifting piece 441 is positioned at substantially the same Z-direction height as the upper surface 31a of the lower stage 31. Therefore, when the lifting piece 441 is in the abutting position, the upper surface 441a of the lifting piece 441 is located in the same horizontal plane as the upper surface 31a of the lower stage 31. Thereby, the blanket BL in which the lower stage 31 and the lifting piece 441 abuts on the lower surface is supported in a horizontal posture.

於升降片441之側面之X方向上之中央附近安裝有間隙感測器446。間隙感測器446對基板SB之下表面與橡皮布BL之上表面之間之間隙進行測定,例如可使用光干涉式距離檢測器。再者,於該例中,間 隙感測器446與升降片441一併升降。但,上述升降並非必須,只要能於轉印輥431之附近對基板SB之下表面與橡皮布BL之上表面之間之間隙進行測定便可。因此,例如可於板部件45或框架442安裝間隙感測器,又,亦可設置於上平台21。 A gap sensor 446 is attached to the vicinity of the center in the X direction of the side surface of the lifter 441. The gap sensor 446 measures the gap between the lower surface of the substrate SB and the upper surface of the blanket BL, and for example, an optical interference type distance detector can be used. Furthermore, in this case, The gap sensor 446 is raised and lowered together with the lifter 441. However, the above-described lifting and lowering is not essential as long as the gap between the lower surface of the substrate SB and the upper surface of the blanket BL can be measured in the vicinity of the transfer roller 431. Therefore, for example, a gap sensor can be attached to the plate member 45 or the frame 442, or it can be provided to the upper stage 21.

具有上述構成之輥單元43及升降器單元44都係安裝於板部件45,藉由馬達524之旋轉而一體地沿著Y方向移動。馬達524由設置於控制單元9之輥移行控制部97控制。當馬達524根據來自輥移行控制部97之控制信號而旋轉時,滾珠螺桿機構52之螺母部525沿著導軌51向Y方向移動。因此,隨著螺母部525移動,輥單元43及升降器單元44進行移動。結果,設置於輥單元43之轉印輥431沿著橡皮布BL下表面向Y方向移行。如此,導軌51及滾珠螺桿機構52具有使轉印輥431向Y方向移行之作為輥移行機構之功能。再者,如下所述,當轉印輥塊4向Y方向移動時,轉印輥431抵接於橡皮布BL之下表面,另一方面,升降片441自橡皮布BL之下表面離開。 The roller unit 43 and the lifter unit 44 having the above configuration are attached to the plate member 45, and are integrally moved in the Y direction by the rotation of the motor 524. The motor 524 is controlled by a roller shift control unit 97 provided in the control unit 9. When the motor 524 is rotated in accordance with a control signal from the roller shift control unit 97, the nut portion 525 of the ball screw mechanism 52 moves in the Y direction along the guide rail 51. Therefore, as the nut portion 525 moves, the roller unit 43 and the lifter unit 44 move. As a result, the transfer roller 431 provided on the roller unit 43 travels in the Y direction along the lower surface of the blanket BL. As described above, the guide rail 51 and the ball screw mechanism 52 have a function of moving the transfer roller 431 in the Y direction as a roller transfer mechanism. Further, as described below, when the transfer roller block 4 is moved in the Y direction, the transfer roller 431 abuts against the lower surface of the blanket BL, and on the other hand, the lifter 441 is separated from the lower surface of the blanket BL.

如此,轉印輥431能夠進行利用輥升降機構之Z方向之升降動作與利用輥移行機構之Y方向之移行動作。又,升降片441能夠進行利用升降器升降機構之Z方向之升降動作與利用輥移行機構之Y方向之移行動作。當轉印輥431(輥單元43)及升降片441(升降器單元44)向Y方向移行時,設置於升降手單元33、34之各升降手331等與輥單元43、升降器單元44之干涉如下所述般得以避免。再者,以下,以設置於升降手單元33、34之1對升降手331、341與輥單元43之位置關係為例進行說明,其他升降手亦同樣。 In this way, the transfer roller 431 can perform the lifting operation in the Z direction by the roller lifting mechanism and the moving operation in the Y direction by the roller moving mechanism. Further, the lifting and lowering piece 441 can perform the lifting operation in the Z direction by the lifter lifting mechanism and the moving operation in the Y direction by the roller moving mechanism. When the transfer roller 431 (roller unit 43) and the lifter 441 (lifter unit 44) are moved in the Y direction, the lifter 331 and the like of the lifter units 33 and 34 and the roller unit 43 and the lifter unit 44 are provided. Interference is avoided as described below. In the following description, the positional relationship between the pair of lifters 331, 341 and the roller unit 43 provided in the lifter units 33 and 34 will be described as an example, and the other lifters are also the same.

圖4A及圖4B係表示轉印輥塊與升降手單元之位置關係之圖。更具體而言,圖4A及圖4B係分別沿著Y方向及X方向觀察轉印輥塊4及升降手單元33、34之圖。如圖所示,輥單元43及升降器單元44以轉印輥431沿著保持於下平台31之橡皮布BL之下表面之方式向Y方向移動。於X 方向上,對向配置之升降手331、341之前端彼此隔離。進而,輥單元43之臂433、輥升降機構434及升降器單元44之升降器升降機構(框架442、滾珠螺桿443、螺母部444、馬達445及聯軸器447)通過該等間隙而移行。因此,於構造上避免了輥升降機構434與升降手331、341之干涉。 4A and 4B are views showing the positional relationship between the transfer roller block and the lifter unit. More specifically, FIGS. 4A and 4B are views of the transfer roller block 4 and the lifter units 33 and 34 viewed in the Y direction and the X direction, respectively. As shown in the figure, the roller unit 43 and the lifter unit 44 are moved in the Y direction so that the transfer roller 431 is held along the lower surface of the blanket BL held by the lower stage 31. At X In the direction, the front ends of the oppositely disposed lifting hands 331, 341 are isolated from each other. Further, the arm 433 of the roller unit 43, the roller elevating mechanism 434, and the lifter lifting mechanism (the frame 442, the ball screw 443, the nut portion 444, the motor 445, and the coupling 447) of the lifter unit 44 are moved by the gaps. Therefore, the interference of the roller elevating mechanism 434 with the elevating hands 331, 341 is avoided in construction.

另一方面,於升降手331、341抵接或接近於橡皮布BL下表面之狀態下,該等升降手331、341與轉印輥431、支持部件432及升降片441有可能產生接觸。該問題藉由以下方式避免,升降手331、341一體地下降至上表面較升降片441及支持部件432之下表面靠下方位置為止。即,與輥單元43向Y方向之移行同步地,升降手單元33、34使各升降手331(341)、332(342)等依序退避到下方。藉此,轉印輥431、支持部件432及升降片441通過升降手331等之上部,避免輥單元43及升降器單元44與升降手331等之干涉。 On the other hand, in a state in which the lifters 331, 341 abut or approach the lower surface of the blanket BL, the lifters 331, 341 may be in contact with the transfer roller 431, the support member 432, and the lifter 441. This problem is avoided by the fact that the lifting hands 331, 341 are integrally lowered to the upper surface below the lower surface of the lifting piece 441 and the support member 432. That is, in synchronization with the movement of the roller unit 43 in the Y direction, the lifter units 33 and 34 sequentially evacuate the lift hands 331 (341), 332 (342), and the like to the lower side. Thereby, the transfer roller 431, the support member 432, and the lifter 441 pass through the upper portion such as the lifter 331, and the roller unit 43 and the lifter unit 44 are prevented from interfering with the lifter 331 or the like.

與先前技術(日本專利特開2014-144628號公報)之轉印裝置相比,本實施形態中新設有升降器單元44。設為此種構成之原因在於,如以下所說明,藉由抑制轉印輥431最初抵接於橡皮布BL時橡皮布BL之撓曲,而精度良好地控制圖案等之轉印位置。 In the present embodiment, the lifter unit 44 is newly provided as compared with the transfer device of the prior art (Japanese Laid-Open Patent Publication No. 2014-144628). The reason for this configuration is that, as described below, the transfer position of the pattern or the like is accurately controlled by suppressing the deflection of the blanket BL when the transfer roller 431 first comes into contact with the blanket BL.

圖5A及圖5B係用來說明橡皮布之撓曲問題之圖。更具體而言,圖5A係表示由下平台31及升降手331等支持之橡皮布BL之俯視圖,圖5B係模式性地表示橡皮布BL之撓曲量之圖。如圖5A所示,該轉印裝置1中,於中央部成為與基板SB對應之開口部311之邊框狀下平台31之上表面31a載置橡皮布BL。橡皮布BL之下表面周緣部抵接並吸附保持於下平台31之上表面31a。 5A and 5B are views for explaining the problem of flexing of the blanket. More specifically, FIG. 5A is a plan view showing the blanket BL supported by the lower stage 31, the lifter 331, and the like, and FIG. 5B is a view schematically showing the amount of deflection of the blanket BL. As shown in FIG. 5A, in the transfer device 1, a blanket BL is placed on the upper surface 31a of the frame-like lower stage 31 of the frame portion SB corresponding to the opening 311 corresponding to the substrate SB. The peripheral portion of the lower surface of the blanket BL abuts and is adsorbed and held on the upper surface 31a of the lower stage 31.

進而,升降手331~334、341~344自下表面對較周緣部靠內側之中央部之下表面成為開放狀態之橡皮布BL進行抵接,藉此,橡皮布BL被支持為水平姿勢。但,橡皮布BL之中央部只不過係由支持手331等 局部地支持,因此不可避免地產生未被支持之部分向下方撓曲之情形。尤其,應對大型基板之平面尺寸大之橡皮布BL中,上述問題明顯。其原因在於,於轉印處理之原理上,雖然橡皮布BL之平面尺寸增大但厚度不易增加。 Further, the lifters 331 to 334 and 341 to 344 are brought into contact with the blanket BL having the lower surface of the center portion on the inner side of the peripheral portion from the lower surface, whereby the blanket BL is supported in a horizontal posture. However, the central portion of the blanket BL is only supported by the support hand 331, etc. Supported locally, so inevitably, the unsupported portion is deflected downward. In particular, in the blanket BL having a large planar size of a large substrate, the above problems are remarkable. The reason for this is that, on the principle of the transfer process, although the planar size of the blanket BL is increased, the thickness is not easily increased.

本案之發明人於Y方向之各種位置上測量由下平台31及升降手331等支持之橡皮布BL之鉛垂方向(Z方向)之移位量。結果,明白以下內容。即,於局部受到升降手331~334之支持之圖5A之直線L1上,如圖5B中實線所示,於升降手331等之位置未觀察到移位,但於遠離升降手331等之位置,移位變大,表示橡皮布BL向下方撓曲。但,移位量相對較小。 The inventors of the present invention measured the shift amount in the vertical direction (Z direction) of the blanket BL supported by the lower stage 31, the lifter 331, and the like at various positions in the Y direction. As a result, the following is understood. That is, on the straight line L1 of FIG. 5A partially supported by the lifters 331 to 334, as shown by the solid line in FIG. 5B, no displacement is observed at the position of the lifter 331 or the like, but away from the lifter 331 or the like. The position, the shift becomes larger, indicating that the blanket BL is deflected downward. However, the amount of shift is relatively small.

另一方面,於通過X方向上之橡皮布BL之大致中心之圖5A之直線L2上,撓曲量朝向橡皮布BL之中央部逐漸變大。此時,與轉印輥431最初抵接之橡皮布BL之區域R1對應之位置Y1之撓曲量Z1相對較小,但中央部分之撓曲量Z2尤其大。 On the other hand, on the straight line L2 of FIG. 5A passing through the approximate center of the blanket BL in the X direction, the amount of deflection gradually increases toward the center portion of the blanket BL. At this time, the deflection amount Z1 at the position Y1 corresponding to the region R1 of the blanket BL that the transfer roller 431 initially abuts is relatively small, but the deflection amount Z2 of the central portion is particularly large.

實驗中,將沿著X方向排列且成對之升降手331、341等分別一體形成並利用X方向上連續之手進行支持,於直線L2上測量撓曲,上述情形時,如圖5B中虛線所示,撓曲量大幅降低。 In the experiment, the pair of lifting hands 331, 341 and the like are integrally formed along the X direction and supported by a continuous hand in the X direction, and the deflection is measured on the straight line L2. In the above case, the dotted line in Fig. 5B As shown, the amount of deflection is greatly reduced.

但,即使係上述支持態樣,直線L2上之移位量亦較直線L1上之測量結果大。推斷其原因在於,由於直線L1之位置接近下平台31之(+X)側之邊,因此橡皮布BL能夠受到升降手331~334之支持與下平台31(更具體而言為其1邊)之支持,相對於此,於橡皮布BL中央部未受到下平台31之支持。 However, even with the above-described support pattern, the shift amount on the straight line L2 is larger than the measurement result on the straight line L1. It is presumed that the reason is that since the position of the straight line L1 is close to the side of the (+X) side of the lower stage 31, the blanket BL can be supported by the lifting hands 331 to 334 and the lower stage 31 (more specifically, one side) In contrast, the central portion of the blanket BL is not supported by the lower platform 31.

如此,即使於設有分別局部地抵接於橡皮布BL之下表面之複數個升降手331等之情形時,於未受到上述部件之支持之部分亦會產生橡皮布BL之撓曲。尤其,為了使轉印輥431抵接而必須預先開放橡皮布BL下表面,因此無法支持轉印輥431之正上方位置,難以減少該部分之撓 曲。 Thus, even in the case where a plurality of lifters 331 and the like which partially abut against the lower surface of the blanket BL are provided, the flexure of the blanket BL is generated in a portion not supported by the above-mentioned members. In particular, in order to make the transfer roller 431 abut, the lower surface of the blanket BL must be opened in advance, so that the position directly above the transfer roller 431 cannot be supported, and it is difficult to reduce the scratch of the portion. song.

圖6A至圖6C係表示橡皮布撓曲與轉印位置偏移之關係之圖。該轉印裝置1中,如圖6A所示,於使基板SB與橡皮布BL平行地接近且對向之狀態下,轉印輥431上推橡皮布BL,將其壓抵於基板SB,藉此,將橡皮布BL上之圖案PT轉印至基板SB。為了保證向基板SB之圖案轉印位置適當,執行利用對準機構37進行之對準動作。 6A to 6C are views showing the relationship between the flexing of the blanket and the shift of the transfer position. In the transfer device 1, as shown in FIG. 6A, in a state where the substrate SB is brought close to and in parallel with the blanket BL, the transfer roller 431 pushes up the blanket BL and presses it against the substrate SB. Thereby, the pattern PT on the blanket BL is transferred to the substrate SB. In order to ensure that the pattern transfer position to the substrate SB is appropriate, the alignment operation by the alignment mechanism 37 is performed.

但,當橡皮布BL向下方撓曲時,如圖6B所示,橡皮布BL之周緣部以朝向中央部被拉入之方式發生移位。藉此,橡皮布BL表面之某一點P位於與圖6B中虛線所示之無撓曲之狀態相比向Y方向移位△Y之位置。由於轉印輥431將橡皮布BL向正上方上推,因此於點P以自本來之位置偏移△Y之狀態與基板SB抵接。根據本案之發明人之見解,基板SB與橡皮布BL一旦抵接,則兩者隔著圖案PT而較強地密接,因此即使轉印輥431向水平方向移動,基板SB與橡皮布BL之水平方向之相對位置亦幾乎不會發生變化。 However, when the blanket BL is deflected downward, as shown in FIG. 6B, the peripheral portion of the blanket BL is displaced so as to be pulled toward the center portion. Thereby, a certain point P of the surface of the blanket BL is located at a position shifted by ΔY in the Y direction as compared with the state of no deflection shown by a broken line in Fig. 6B. Since the transfer roller 431 pushes the blanket BL upward, it is in contact with the substrate SB in a state where the point P is shifted by ΔY from the original position. According to the findings of the inventors of the present invention, when the substrate SB and the blanket BL abut each other, the two are strongly adhered to each other via the pattern PT. Therefore, even if the transfer roller 431 moves in the horizontal direction, the level of the substrate SB and the blanket BL The relative position of the direction will hardly change.

因此可說,轉印位置之偏移量、即因橡皮布BL撓曲引起之與基板SB之間之位置偏移量大致係由轉印輥431最初抵接之位置之橡皮布BL之位置偏移量決定。換言之,只要能夠抑制轉印輥431最初抵接時之橡皮布BL之位置偏移,即能夠抑制基板SB整體之轉印位置偏移。於轉印輥431最初抵接之轉印輥431之正上方位置,藉由減小橡皮布BL之撓曲量△Z,亦可減小水平方向之位置偏移。 Therefore, it can be said that the offset amount of the transfer position, that is, the positional deviation from the substrate SB due to the deflection of the blanket BL is substantially the position of the blanket BL which is initially abutted by the transfer roller 431. The shift is determined. In other words, as long as the positional shift of the blanket BL when the transfer roller 431 is initially contacted can be suppressed, it is possible to suppress the shift of the transfer position of the entire substrate SB. At a position directly above the transfer roller 431 where the transfer roller 431 initially abuts, by reducing the amount of deflection ΔZ of the blanket BL, the positional shift in the horizontal direction can be reduced.

如上所述,根據橡皮布BL之中央部之支持態樣,撓曲量會發生變化。因此,本實施形態中,如圖6C所示,於轉印輥431抵接於橡皮布BL之前,於較轉印輥431靠近橡皮布BL中央部之(+Y)側之位置使升降片441抵接於橡皮布BL下表面。藉此,將向下方撓曲之橡皮布BL上推而維持為水平姿勢。藉此,能夠減小轉印輥431抵接於橡皮布BL時橡皮布BL之撓曲,而減小基板SB與橡皮布BL之抵接位置之Y方向上之偏 移。 As described above, the amount of deflection changes depending on the support state of the center portion of the blanket BL. Therefore, in the present embodiment, as shown in FIG. 6C, before the transfer roller 431 abuts on the blanket BL, the lifter 441 is placed closer to the (+Y) side of the central portion of the blanket BL than the transfer roller 431. Abuts against the lower surface of the blanket BL. Thereby, the blanket BL which is flexed downward is pushed up and maintained in a horizontal posture. Thereby, it is possible to reduce the deflection of the blanket BL when the transfer roller 431 abuts against the blanket BL, and to reduce the deviation in the Y direction of the abutment position of the substrate SB and the blanket BL. shift.

藉由於由升降片441支持橡皮布BL之狀態下使轉印輥431抵接於橡皮布BL,與未設置升降器單元44之先前技術相比,能夠將基板SB之圖案PT之轉印位置偏移抑制為一半以下。 By causing the transfer roller 431 to abut against the blanket BL in a state where the blanket BL is supported by the lifter 441, the transfer position of the pattern PT of the substrate SB can be offset from the prior art in which the lifter unit 44 is not provided. The shift suppression is less than half.

升降片441係用來將向下方撓曲之橡皮布BL維持為水平狀態之部件,並非使橡皮布BL超出水平狀態地上升。因此,升降片441於支持橡皮布BL時,其上表面441a成為與下平台31之上表面31a大致同一水平面,而被定位於抵接於橡皮布BL下表面之抵接位置。 The lifter piece 441 is a member for maintaining the blanket BL that is deflected downward in a horizontal state, and does not raise the blanket BL beyond the horizontal state. Therefore, when the lifting piece 441 supports the blanket BL, the upper surface 441a is substantially flush with the upper surface 31a of the lower stage 31, and is positioned to abut against the lower surface of the blanket BL.

關於鉛垂方向上之升降片441之定位控制,亦可藉由機械碰觸或預先之示教作業等,以上表面441a成為與下平台31之上表面31a相同高度之方式進行位置設定。又,上平台21與下平台31以基板SB與橡皮布BL隔著特定間隙而對向之方式進行間隔調整。藉此,以由間隙感測器446檢測到之轉印輥431附近位置之基板SB與橡皮布BL之間隙成為特定間隙量之方式,升降器升降控制部96控制升降片441之高度,藉此亦可間接地進行升降片441與下平台31之高度方向上之位置對準。以下說明之動作中,使用間隙感測器446之輸出。 The positioning control of the lifter 441 in the vertical direction may be set such that the upper surface 441a has the same height as the upper surface 31a of the lower stage 31 by mechanical contact or a teaching operation in advance. Further, the upper stage 21 and the lower stage 31 are adjusted in such a manner that the substrate SB and the blanket BL are opposed to each other with a certain gap therebetween. Thereby, the lifter elevation control unit 96 controls the height of the lifter 441 so that the gap between the substrate SB and the blanket BL at the position near the transfer roller 431 detected by the gap sensor 446 becomes a specific gap amount. The positional alignment of the lifter piece 441 and the lower stage 31 in the height direction can also be performed indirectly. In the operation described below, the output of the gap sensor 446 is used.

其次,對利用如上述般構成之轉印裝置1之轉印處理進行說明。如上所述,於此係對自橡皮布BL向基板SB轉印圖案或薄膜之轉印處理進行說明,但藉由將基板SB換成版PP,亦能說明圖案化處理中之動作。 Next, a transfer process using the transfer device 1 configured as described above will be described. As described above, the transfer process of transferring a pattern or a film from the blanket BL to the substrate SB will be described here. However, the operation in the patterning process can also be explained by replacing the substrate SB with the plate PP.

圖7係表示利用該轉印裝置之轉印處理之流程圖。又,圖8A至圖8D及圖9A至圖9D係模式性地表示轉印處理過程中之各部位置之圖。轉印處理中,首先,將應被轉印圖案或薄膜之基板SB搬入到裝置,設置於上平台21(步驟S101)。上平台21以應被轉印圖案或薄膜之被轉印面朝下之方式吸附保持基板SB。然後,將擔載應轉印至基板SB之圖案或薄膜之橡皮布BL搬入到裝置,設置於下平台31(步驟S102)。下平台31以擔載圖案或薄膜之擔載面朝上之方式吸附保持橡皮布BL。 Fig. 7 is a flow chart showing the transfer process by the transfer device. 8A to 8D and 9A to 9D schematically show the positions of the respective portions during the transfer process. In the transfer process, first, the substrate SB to be transferred or the film is carried into the apparatus, and is placed on the upper stage 21 (step S101). The upper stage 21 adsorbs and holds the substrate SB in such a manner that the transferred pattern or the transferred surface of the film faces downward. Then, the blanket BL carrying the pattern or film to be transferred to the substrate SB is carried into the apparatus and placed on the lower stage 31 (step S102). The lower stage 31 sucks and holds the blanket BL so that the supporting pattern or the supporting surface of the film faces upward.

然後,裝置各部被定位於特定之初始位置(步驟S103)。圖8A表示出各部之初始位置。上平台21及下平台31以基板SB與橡皮布BL隔著特定間隙而平行對向之方式相互接近且對向。又,升降手331、341等上升至上表面成為與下平台31之上表面為同一平面之位置,抵接於橡皮布BL之下表面而將橡皮布BL支持為水平姿勢。轉印輥431被定位於Y方向上之基板SB之一端部之正下方位置且為自橡皮布BL之下表面向下方隔開距離之退避位置。升降片441亦位於與轉印輥431之(+Y)側鄰接之位置且為自橡皮布BL下表面隔開距離之退避位置。然後,進行對準處理,調整基板SB與橡皮布BL之水平方向位置(步驟S104)。即,以擔載於橡皮布BL之圖案PT或薄膜與基板SB於水平方向上成為預先特定之位置關係之方式,對準機構37視需要使對準平台36於水平面內移動。 Then, each part of the apparatus is positioned at a specific initial position (step S103). Fig. 8A shows the initial positions of the respective parts. The upper stage 21 and the lower stage 31 are close to each other and opposed to each other in such a manner that the substrate SB and the blanket BL are parallel to each other with a certain gap interposed therebetween. Further, the lifters 331, 341 and the like rise to a position where the upper surface is flush with the upper surface of the lower deck 31, and abuts against the lower surface of the blanket BL to support the blanket BL in a horizontal posture. The transfer roller 431 is positioned at a position directly below one end of the substrate SB in the Y direction and is a retracted position spaced downward from the lower surface of the blanket BL. The lifter 441 is also located adjacent to the (+Y) side of the transfer roller 431 and is a retracted position spaced apart from the lower surface of the blanket BL. Then, alignment processing is performed to adjust the horizontal position of the substrate SB and the blanket BL (step S104). That is, the alignment mechanism 37 moves the alignment stage 36 in the horizontal plane as needed, such that the pattern PT carried on the blanket BL or the film and the substrate SB have a predetermined positional relationship in the horizontal direction.

於該狀態下,如圖8B所示,升降片441上升至抵接位置,抵接於橡皮布BL之下表面而支持該橡皮布BL(步驟S105)。然後,轉印輥431上升而抵接於橡皮布BL下表面後進一步上升,將橡皮布BL向上按壓(步驟S106)。於由升降片441支持橡皮布BL之狀態下,轉印輥431按壓橡皮布BL,藉此,將橡皮布BL與基板SB之水平方向上之位置偏移抑制得小。 In this state, as shown in FIG. 8B, the lifter piece 441 is raised to the abutment position, and abuts against the lower surface of the blanket BL to support the blanket BL (step S105). Then, the transfer roller 431 is raised to abut against the lower surface of the blanket BL, and then further raised, and the blanket BL is pressed upward (step S106). In a state in which the blanket BL is supported by the lifter 441, the transfer roller 431 presses the blanket BL, thereby suppressing the positional shift of the blanket BL and the substrate SB in the horizontal direction.

藉由使轉印輥431於抵接於橡皮布BL下表面後亦繼續上升,如圖8C所示,橡皮布BL被轉印輥431上推,最終橡皮布BL上表面抵接於基板SB之下表面。藉此,擔載於橡皮布BL上表面之圖案或薄膜PT密接於基板SB。藉由此種轉印輥431上推橡皮布BL,圖案或薄膜PT壓抵於基板SB。藉此,圖案或薄膜PT被轉印至基板SB。由於藉由升降片441之支持來抑制橡皮布BL之水平方向之位置偏移,因此圖案或薄膜PT被適當轉印至基板SB之特定位置。 By causing the transfer roller 431 to continue to rise after abutting against the lower surface of the blanket BL, as shown in FIG. 8C, the blanket BL is pushed up by the transfer roller 431, and finally the upper surface of the blanket BL abuts against the substrate SB. lower surface. Thereby, the pattern or film PT carried on the upper surface of the blanket BL is in close contact with the substrate SB. The pattern or film PT is pressed against the substrate SB by pushing the blanket BL up by the transfer roller 431. Thereby, the pattern or film PT is transferred to the substrate SB. Since the positional shift of the blanket BL in the horizontal direction is suppressed by the support of the lifter 441, the pattern or film PT is appropriately transferred to a specific position of the substrate SB.

當藉由轉印輥431之按壓使基板SB與橡皮布BL抵接時,如圖8D所 示,升降片441向下方移動而自橡皮布BL離開(步驟S107)。然後,轉印輥431開始向(+Y)方向移行(步驟S108)。如圖9A及圖9B所示,轉印輥431一邊將橡皮布BL壓抵於基板SB一面沿著Y方向移動,藉此橡皮布BL與基板SB隔著圖案或薄膜PT而密接之區域於Y方向上逐漸擴展。如此,圖案或薄膜PT被依序轉印至基板SB(轉印處理)。轉印輥431上升至能夠以固定按壓力按壓橡皮布BL之按壓位置,於該狀態下沿著Y方向移行。 When the substrate SB is brought into contact with the blanket BL by the pressing of the transfer roller 431, as shown in FIG. 8D The lifter piece 441 is moved downward and is separated from the blanket BL (step S107). Then, the transfer roller 431 starts to move in the (+Y) direction (step S108). As shown in FIG. 9A and FIG. 9B, the transfer roller 431 moves in the Y direction while pressing the blanket BL against the substrate SB, whereby the region where the blanket BL and the substrate SB are in close contact with each other via the pattern or the film PT is Y. The direction gradually expands. Thus, the pattern or film PT is sequentially transferred to the substrate SB (transfer process). The transfer roller 431 is raised to a pressing position at which the blanket BL can be pressed with a fixed pressing force, and is moved in the Y direction in this state.

此時,為了避免升降手機構33、34與移行之輥單元43之干涉,使升降手331(341)、332(342)、333(343)、334(344)隨著輥單元43之移動而依序下降。又,升降器單元44由於與輥單元43一併向Y方向移行,因此不會與輥單元43相干涉。 At this time, in order to avoid interference between the lifter mechanisms 33, 34 and the traveling roller unit 43, the lifters 331 (341), 332 (342), 333 (343), and 334 (344) are moved along with the roller unit 43. Decrease in sequence. Further, since the lifter unit 44 moves in the Y direction together with the roller unit 43, it does not interfere with the roller unit 43.

輥單元43繼續移行,直至轉印輥431到達基板SB之另一端部正下方之結束位置(步驟S109)。藉此,如圖9C所示,基板SB整體抵接於橡皮布BL,圖案或薄膜PT向基板SB之轉印完成。於該時間點,使輥單元43停止移動,如圖9D所示,輥單元43自橡皮布BL離開而退避到下方(步驟S110)。將此種密接之橡皮布BL與基板SB一體地搬出(步驟S111),該轉印裝置1之轉印處理結束。 The roller unit 43 continues to move until the transfer roller 431 reaches the end position directly below the other end portion of the substrate SB (step S109). Thereby, as shown in FIG. 9C, the substrate SB as a whole is in contact with the blanket BL, and the transfer of the pattern or the film PT to the substrate SB is completed. At this point of time, the roller unit 43 is stopped from moving, and as shown in FIG. 9D, the roller unit 43 is separated from the blanket BL and retracted to the lower side (step S110). The adhered blanket BL is carried out integrally with the substrate SB (step S111), and the transfer process of the transfer device 1 is completed.

如上,本實施形態之轉印裝置1中,一面藉由轉印輥431將橡皮布BL上推使之抵接於基板SB,一面使轉印輥431向Y方向移行,藉此,將橡皮布BL上之圖案或薄膜PT轉印至基板SB。此時,於轉印輥431最初抵接於橡皮布BL之前,於較轉印輥431靠橡皮布BL之中央之位置,升降片441抵接於橡皮布BL下表面。藉此,修正橡皮布BL之撓曲,使之接近水平姿勢。因此,能夠抑制轉印輥431最初抵接於橡皮布BL時與基板SB之位置偏移,從而良好地維持對基板SB之圖案轉印位置精度。 As described above, in the transfer device 1 of the present embodiment, the blanket roller 431 is pushed up against the substrate SB by the transfer roller 431, and the transfer roller 431 is moved in the Y direction, whereby the blanket is used. The pattern or film PT on the BL is transferred to the substrate SB. At this time, before the transfer roller 431 first comes into contact with the blanket BL, the lifter 441 abuts against the lower surface of the blanket BL at a position closer to the center of the blanket BL than the transfer roller 431. Thereby, the deflection of the blanket BL is corrected to bring it close to the horizontal posture. Therefore, it is possible to suppress the position of the transfer roller 431 from being displaced from the position of the substrate SB when it first comes into contact with the blanket BL, thereby maintaining the pattern transfer position accuracy of the substrate SB favorably.

如以上所說明,於上述實施形態中,基板SB相當於本發明之「第1板狀體」,橡皮布BL相當於本發明之「第2板狀體」。又,上述實施形 態中,上平台21作為本發明之「第1保持機構」發揮功能,其下表面21a相當於本發明之「抵接面」。又,下平台31作為本發明之「第2保持機構」及「支持台」發揮功能,下平台31之上表面31a相當於本發明之「支持面」。 As described above, in the above embodiment, the substrate SB corresponds to the "first plate-shaped body" of the present invention, and the blanket BL corresponds to the "second plate-shaped body" of the present invention. Again, the above embodiment In the state, the upper stage 21 functions as the "first holding means" of the present invention, and the lower surface 21a corresponds to the "abutment surface" of the present invention. Further, the lower stage 31 functions as the "second holding means" and the "supporting table" of the present invention, and the upper surface 31a of the lower stage 31 corresponds to the "supporting surface" of the present invention.

又,轉印輥431作為本發明之「輥部件」發揮功能,升降片441作為本發明之「支持部件」發揮功能。進而,升降片441之上表面441a相當於本發明之「抵接部位」。又,板部件45作為本發明之「移動部件」發揮功能,間隙感測器446作為本發明之「間隙檢測機構」發揮功能。 Further, the transfer roller 431 functions as a "roller member" of the present invention, and the lifter 441 functions as a "support member" of the present invention. Further, the upper surface 441a of the lifter 441 corresponds to the "contact portion" of the present invention. Further, the plate member 45 functions as a "moving member" of the present invention, and the gap sensor 446 functions as a "gap detecting mechanism" of the present invention.

又,上述實施形態中,升降手單元33、34作為本發明之「輔助支持機構」發揮功能,升降手331~334、341~344分別作為本發明之「輔助支持部件」發揮功能。又,對準控制部94及對準機構37以一體之形式作為本發明之「對準機構」發揮功能。 Further, in the above-described embodiment, the lifter units 33 and 34 function as the "auxiliary support means" of the present invention, and the lifters 331 to 334 and 341 to 344 each function as the "auxiliary support member" of the present invention. Further, the alignment control unit 94 and the alignment mechanism 37 function as an "alignment mechanism" of the present invention in an integrated manner.

再者,本發明並不限定於上述實施形態,能夠於不脫離其主旨之範圍內對上述實施形態以外進行各種變更。例如,上述實施形態之轉印裝置1中,升降器單元44與輥單元43一體地移行。但,升降器單元44係修正轉印輥431最初抵接於橡皮布BL時橡皮布BL之撓曲之機構,於橡皮布BL抵接於基板SB後並不會發揮特別之作用。於這層含義上,升降器單元無需與輥單元43一體地移行。例如亦可設為如下構成。 The present invention is not limited to the above-described embodiments, and various modifications may be made in addition to the above embodiments without departing from the scope of the invention. For example, in the transfer device 1 of the above embodiment, the lifter unit 44 moves integrally with the roller unit 43. However, the lifter unit 44 is a mechanism for correcting the deflection of the blanket BL when the transfer roller 431 first comes into contact with the blanket BL, and does not play a special role after the blanket BL abuts against the substrate SB. In this sense, the elevator unit does not need to move integrally with the roller unit 43. For example, it may be configured as follows.

圖10A及圖10B係表示升降器單元之變化例之圖。更具體而言,圖10A係自X方向觀察包含變化例之升降器單元之轉印輥塊之圖,圖10B係自Y方向觀察包含變化例之升降器單元之轉印輥塊之圖。圖10A及圖10B中,對與上述實施形態實質上相同之構成標註相同符號,並省略說明。該變化例之升降器單元46係以2組於X方向上位置不同且相互面對之方式配置。各升降器單元46具備:升降片461,其X方向長度為轉印輥431之約一半且沿著X方向延伸設置;臂462,其自升降片461向斜下方延伸;及升降器升降機構463,其使臂462沿著斜方向升降。升降 器升降機構463被固定於主框架,不與輥單元43一併移行。 10A and 10B are views showing a modification of the lifter unit. More specifically, FIG. 10A is a view of the transfer roller block including the lifter unit of the modified example viewed from the X direction, and FIG. 10B is a view of the transfer roller block including the lifter unit of the modified example viewed from the Y direction. In FIGS. 10A and 10B, the same components as those in the above-described embodiment are denoted by the same reference numerals, and their description is omitted. The lifter unit 46 of this modification is arranged such that the two sets are different in position in the X direction and face each other. Each of the lifter units 46 includes a lifter 461 having a length in the X direction of about half of the transfer roller 431 and extending in the X direction, an arm 462 extending obliquely downward from the lifter 461, and a lifter lifting mechanism 463. It causes the arm 462 to move up and down in an oblique direction. Lifting The lifter mechanism 463 is fixed to the main frame and does not move together with the roller unit 43.

如圖10A及圖10B中實線所示,於利用升降器升降機構463將升降片461定位於下方位置之狀態下,升降片461之上端位於較轉印輥431之支持部件432之下表面更下方。又,於X方向上,兩升降片461、461間相對較大地隔開距離。因此,升降器單元46不會干涉到輥單元43之移行。 As shown by the solid line in FIGS. 10A and 10B, in the state where the lifter 461 is positioned at the lower position by the lifter lifting mechanism 463, the upper end of the lifter 461 is located on the lower surface of the support member 432 of the transfer roller 431. Below. Further, in the X direction, the two lifters 461, 461 are relatively spaced apart from each other. Therefore, the lifter unit 46 does not interfere with the movement of the roller unit 43.

另一方面,當升降器升降機構463作動時,如圖10A及圖10B中虛線所示,升降片461向具有X方向成分及Z方向成分之斜上方上升,最終上端抵接於橡皮布BL之下表面。此時,以兩升降片461、461之上端高度相同,且於X方向上,兩升降片461、461間之間隔變得極小之方式,設定升降片461、461之形狀。藉此,利用下平台31與升降片461、461支持轉印輥431抵接之前之橡皮布BL,能夠抑制橡皮布BL撓曲。如此,即使使用不與轉印輥431一併移行之升降器單元,亦可獲得與上述相同之效果。 On the other hand, when the lifter lifting mechanism 463 is actuated, as shown by the broken line in FIGS. 10A and 10B, the lifter 461 rises obliquely upward with the X-direction component and the Z-direction component, and finally the upper end abuts against the blanket BL. lower surface. At this time, the shape of the lifters 461 and 461 is set such that the heights of the upper ends of the two lifters 461 and 461 are the same, and the interval between the lifters 461 and 461 is extremely small in the X direction. Thereby, the lower stage 31 and the lifting pieces 461 and 461 support the blanket BL before the transfer roller 431 abuts, and the flexure of the blanket BL can be suppressed. Thus, even if a lifter unit that does not move together with the transfer roller 431 is used, the same effects as described above can be obtained.

又,上述實施形態之升降器單元46具有上表面成為抵接面之片狀部件即升降片461。進而,於升降片461自下方支持橡皮布BL之狀態下,執行利用轉印輥431進行之橡皮布BL之上推。為了避免升降片461滑動摩擦橡皮布BL下表面,於利用轉印輥431上推橡皮布BL後,升降片461自橡皮布BL離開。亦可取而代之地設為如下構成。 Further, the lifter unit 46 of the above-described embodiment has a lifter piece 461 which is a sheet member whose upper surface serves as a contact surface. Further, in a state where the lifting sheet 461 supports the blanket BL from below, the blanket BL by the transfer roller 431 is pushed up. In order to prevent the lifting piece 461 from sliding against the lower surface of the blanket BL, the lifting piece 461 is separated from the blanket BL after the blanket BL is pushed up by the transfer roller 431. Alternatively, it may be configured as follows.

圖11A至圖11C係表示升降器單元之另一變化例之圖。更具體而言,圖11A係自X方向觀察包含該變化例之升降器單元之轉印輥塊之圖。又,圖11B及圖11C係表示該變化例中之轉印輥塊之動作之圖。再者,於該變化例之說明中,對與上述實施形態相同之構成標註相同之符號,並省略其說明。 11A to 11C are views showing another modification of the lifter unit. More specifically, FIG. 11A is a view in which the transfer roller block including the lifter unit of the modification is viewed from the X direction. 11B and 11C are views showing the operation of the transfer roller block in the modification. In the description of the modifications, the same components as those in the above-described embodiments are denoted by the same reference numerals, and their description is omitted.

如圖11A所示,該變化例之升降器單元47具備圓筒輥形狀之升降輥471,上述升降輥471與XZ平面平行且以X方向作為長度方向而延 伸。升降輥471係由支持框架474支持而圍繞與X方向平行之旋轉軸旋轉自如,且由安裝於板部件45之升降器升降機構支持而升降自如。具體而言,於豎立設置於板部件45之框架472安裝滾珠螺桿473,安裝於滾珠螺桿473之螺母部與支持框架474一體化。滾珠螺桿473藉由經由聯軸器477連結之馬達475之作動而旋轉,藉此,支持框架474沿著鉛垂方向(Z方向)升降,使升降輥471升降。 As shown in Fig. 11A, the lifter unit 47 of this modification is provided with a cylindrical roll-shaped lift roller 471 which is parallel to the XZ plane and extends in the X direction as a length direction. Stretch. The lift roller 471 is rotatably supported by the support frame 474 around a rotation axis parallel to the X direction, and is lifted and lowered by the lifter lifting mechanism attached to the plate member 45. Specifically, the ball screw 473 is attached to the frame 472 which is erected on the plate member 45, and the nut portion attached to the ball screw 473 is integrated with the support frame 474. The ball screw 473 is rotated by the operation of the motor 475 coupled via the coupling 477, whereby the support frame 474 is moved up and down in the vertical direction (Z direction) to raise and lower the lift roller 471.

馬達475由設置於控制單元9之升降器升降控制部96控制。馬達475根據來自升降器升降控制部96之控制信號而旋轉,藉此,升降輥471進行升降移動。如此,框架472、滾珠螺桿473、支持框架474、馬達475及聯軸器477構成滾珠螺桿機構,該滾珠螺桿機構作為升降器升降機構發揮功能。再者,作為升降器升降機構,並不限定於上述滾珠螺桿機構,可使用各種方式之驅動機構。 The motor 475 is controlled by a lifter lifting control unit 96 provided in the control unit 9. The motor 475 is rotated in accordance with a control signal from the lifter elevation control unit 96, whereby the lift roller 471 moves up and down. As described above, the frame 472, the ball screw 473, the support frame 474, the motor 475, and the coupling 477 constitute a ball screw mechanism that functions as a lifter lifting mechanism. Further, the lifter lifting mechanism is not limited to the above-described ball screw mechanism, and various types of drive mechanisms can be used.

與上述實施形態中之升降片441同樣地,藉由升降器升降機構之作動,升降輥471能夠於退避到保持於下平台31之橡皮布BL之下方且遠離橡皮布BL之退避位置與上端部抵接於橡皮布BL下表面之抵接位置之間進行升降移動。升降輥471能夠與轉印輥431獨立地進行升降。於抵接位置,升降輥471之上端部被定位於與下平台31之上表面31a大致相同之Z方向高度。因此,當升降輥471位於抵接位置時,升降輥471之上端部與下平台31之上表面31a位於同一水平面內。藉此,下平台31與升降輥471抵接於下表面之橡皮布BL被支持為水平姿勢。 Similarly to the lifter 441 in the above embodiment, the lift roller 471 can be retracted to the retracted position and the upper end portion of the blanket BL held by the lower deck 31 and away from the blanket BL by the operation of the lifter lifting mechanism 441. Lifting and moving between the abutting positions of the lower surface of the blanket BL. The lift roller 471 can be lifted and lowered independently of the transfer roller 431. In the abutment position, the upper end portion of the elevation roller 471 is positioned at substantially the same Z-direction height as the upper surface 31a of the lower platform 31. Therefore, when the elevation roller 471 is in the abutment position, the upper end portion of the elevation roller 471 is located in the same horizontal plane as the upper surface 31a of the lower platform 31. Thereby, the blanket BL in which the lower stage 31 and the elevation roller 471 abuts on the lower surface is supported in a horizontal posture.

如圖11B所示,該變化例中,於升降輥471抵接於橡皮布BL下表面之狀態下,轉印輥431執行橡皮布BL之上推。升降輥471與上述實施形態中之升降片441同樣地,具有於轉印輥431上推橡皮布BL時將橡皮布BL保持為水平姿勢之功能,藉此防止橡皮布BL之位置偏移。 As shown in FIG. 11B, in the modified example, the transfer roller 431 performs the push-up of the blanket BL in a state where the lift roller 471 abuts against the lower surface of the blanket BL. Similarly to the lifter piece 441 in the above-described embodiment, the lift roller 471 has a function of holding the blanket BL in a horizontal posture when the blanket roller 431 pushes the blanket BL, thereby preventing the position of the blanket BL from shifting.

與上述實施形態同樣地,轉印輥431上推橡皮布BL而將其壓抵於基板SB後,轉印輥431向Y方向移行。此時,由與轉印輥431相同之板 部件45支持之升降輥471亦與轉印輥431一體地向Y方向移行。於移行之前使升降輥471遠離橡皮布BL之情形時,僅升降輥471對橡皮布BL之抵接部位之形狀不同,其作用與上述實施形態中之升降片441之作用並無任何變化。 Similarly to the above-described embodiment, the transfer roller 431 pushes the blanket BL and presses it against the substrate SB, and then the transfer roller 431 moves in the Y direction. At this time, the same plate as the transfer roller 431 The elevation roller 471 supported by the member 45 also moves integrally with the transfer roller 431 in the Y direction. When the lifting roller 471 is moved away from the blanket BL before the transition, only the shape of the abutting portion of the lifting roller 471 to the blanket BL is different, and the action of the lifting roller 471 does not change in any manner as in the above-described embodiment.

另一方面,該變化例中,如圖11C所示,升降輥471能夠抵接於橡皮布BL之下表面而直接向Y方向移行。藉由使升降輥471旋轉來防止對橡皮布BL之滑動摩擦。又,藉由使升降輥471支持橡皮布BL,即使於為了進行輥移行而使升降手331等退避到下方後,亦可抑制橡皮布BL之撓曲而保持其姿勢。只要一面將升降輥471之上端部高度維持為與下平台31之上表面31a相同之高度一面移行,則能夠更穩定地維持轉印輥431移行時之橡皮布BL之水平姿勢。 On the other hand, in this modification, as shown in FIG. 11C, the elevation roller 471 can abut against the lower surface of the blanket BL and directly move in the Y direction. The sliding friction against the blanket BL is prevented by rotating the lift roller 471. Further, by supporting the blanket BL in the lift roller 471, even if the lifter 331 or the like is retracted to the lower side in order to perform the roller shift, the flexure of the blanket BL can be suppressed and the posture can be maintained. When the height of the upper end portion of the elevation roller 471 is maintained at the same height as the upper surface 31a of the lower stage 31, the horizontal posture of the blanket BL when the transfer roller 431 is moved can be more stably maintained.

升降輥471之上端部亦可較下平台31之上表面31a略微向上方突出,但為了良好地進行轉印,理想為避免藉由利用升降輥471之上推使橡皮布BL抵接於基板SB。因此,升降輥471之上端部至少位於較上推橡皮布BL之狀態之轉印輥431之上端部更下方,優選升降輥471於較轉印輥431靠下方位置抵接於橡皮布BL。 The upper end portion of the elevation roller 471 may protrude slightly upward from the upper surface 31a of the lower stage 31. However, in order to perform the transfer well, it is preferable to prevent the blanket BL from abutting against the substrate SB by pushing up the elevation roller 471. . Therefore, the upper end portion of the elevation roller 471 is located at least below the upper end portion of the transfer roller 431 in the state of the upper push blanket BL, and preferably the elevation roller 471 abuts against the blanket BL at a position lower than the transfer roller 431.

如此,作為本發明之「支持部件」,除片狀支持部件以外,例如可使用輥狀支持部件。於設有上述輥狀支持部件之情形時,於使支持部件抵接於橡皮布BL下表面後,無需進一步升降。藉此,無需單獨使支持部件升降之機構。因此,例如利用藉由使板部件45升降而使轉印輥431與升降輥471一體地升降之機構和使轉印輥431相對於板部件45及升降輥471進行升降之機構之組合,亦可構成轉印輥塊。 As described above, the "support member" of the present invention may be, for example, a roll-shaped support member in addition to the sheet-shaped support member. In the case where the above-described roll-shaped support member is provided, after the support member is brought into contact with the lower surface of the blanket BL, it is not necessary to further ascend and descend. Thereby, there is no need to separately lift the support member. Therefore, for example, a combination of a mechanism for elevating and lowering the transfer roller 431 and the elevating roller 471 by moving the plate member 45 up and down, and a mechanism for elevating and lowering the transfer roller 431 with respect to the plate member 45 and the elevating roller 471 may be used. Forming a transfer roller block.

又,上述實施形態中,輥單元43及升降器單元44(或升降器單元47)係由設置於單一之板部件45上之輥升降機構及升降器升降機構而分別升降自如地支持,藉此,轉印輥431與升降片441(或升降輥471)能夠獨立地進行升降。亦可取而代之而構成為,例如將輥單元與不具有升降 器升降機構之升降片(或升降輥)安裝於能夠升降移動之板部件上,於特定之Z方向範圍,轉印輥431與升降片441(或升降輥471)一體地升降。 Further, in the above embodiment, the roller unit 43 and the lifter unit 44 (or the lifter unit 47) are supported by the roll elevating mechanism and the lifter elevating mechanism provided on the single plate member 45, respectively. The transfer roller 431 and the lifter 441 (or the lift roller 471) can be lifted and lowered independently. Alternatively, it may be constructed such that the roller unit does not have a lift The elevating piece (or the elevating roller) of the elevating mechanism is attached to a plate member that can be moved up and down, and the transfer roller 431 and the elevating piece 441 (or the elevating roller 471) are integrally moved up and down in a specific Z direction range.

又,上述實施形態中設有間隙感測器446,但如上所述,升降片441之定位亦可藉由機械碰觸或預先之示教作業進行控制,該情形時亦可省去間隙感測器446。 Further, in the above embodiment, the gap sensor 446 is provided. However, as described above, the positioning of the lifter 441 can also be controlled by mechanical touch or a predetermined teaching operation, in which case the gap sensing can be omitted. 446.

又,上述實施形態之升降片441係X方向長度與轉印輥431大致相同之平板狀部件,且係覆蓋X方向之下平台31之開口長度大部分之部件。但,由於橡皮布BL之撓曲大之部分係橡皮布BL之X方向之中央部分,因此只要至少支持該部分便可。因此,升降片441之X方向長度亦可較轉印輥431短。但,就防止對向之1對升降手331、341間之撓曲之觀點而言,優選升降片441之長度大於升降手331、341間之X方向上之間隔。 Further, the lifter piece 441 of the above-described embodiment is a flat member having substantially the same length in the X direction as the transfer roller 431, and is a member covering the opening length of the platform 31 below the X direction. However, since the portion where the deflection of the blanket BL is large is the central portion of the X direction of the blanket BL, it is sufficient to support at least the portion. Therefore, the length of the lift piece 441 in the X direction can also be shorter than that of the transfer roller 431. However, from the viewpoint of preventing deflection between the pair of lifters 331, 341, it is preferable that the length of the lifter 441 is larger than the interval between the lifters 331, 341 in the X direction.

又,上述實施形態係將擔載於橡皮布BL之圖案等被轉印物轉印至基板SB之轉印裝置。但,本發明之技術思想並不限定於上述轉印圖案等之轉印裝置,例如亦可適用於不隔著圖案等而貼合2片板狀體之技術。 Further, in the above embodiment, the transfer device that transfers the transfer material such as the pattern of the blanket BL to the substrate SB is transferred. However, the technical idea of the present invention is not limited to the transfer device such as the transfer pattern described above, and may be applied to, for example, a technique in which two plate-like members are bonded without a pattern or the like.

以上,例示具體實施形態進行了說明,於該發明中,例如亦可構成為,第2保持機構具有與第2板狀體之下表面中央部對應之中央部開口之邊框狀支持台,支持台之上表面抵接於第2板狀體之周緣部下表面而成為支持第2板狀體之平坦支持面,支持部件之上表面位於與支持台之支持面相同之高度而支持第2板狀體。根據上述構成,於隔著輥部件最初抵接之部位之兩側,第2板狀體被支持於同一高度,因此,於此期間能夠保持第2板狀體之水平姿勢,使撓曲最小化。 In the above-described embodiment, the second holding mechanism has a frame-shaped support table that is open at the center portion corresponding to the central portion of the lower surface of the second plate-shaped body, and the support table is provided. The upper surface abuts against the lower surface of the peripheral edge portion of the second plate-shaped body to serve as a flat support surface for supporting the second plate-shaped body, and the upper surface of the support member is located at the same height as the support surface of the support table to support the second plate-shaped body. . According to the above configuration, since the second plate-shaped body is supported at the same height on both sides of the portion where the roller member first contacts, the horizontal posture of the second plate-shaped body can be maintained during this period, and the deflection can be minimized. .

又,例如亦可構成為,於輥部件對第2板狀體開始抵接,將第2板狀體壓抵於第1板狀體後,支持部件自第2板狀體離開,之後輥部件沿著第2板狀體之下表面移動。支持部件係於輥部件抵接於第2板狀體時 維持第2板狀體之姿勢之部件,並非必須於輥部件抵接於第2板狀體後亦抵接於第2板狀體。於支持部件自第2板狀體離開後使輥部件進行移動,藉此,能夠使支持部件退避到不與輥部件干涉之位置。 Further, for example, the roller member may be brought into contact with the second plate-shaped body, and the second plate-shaped body may be pressed against the first plate-shaped body, and then the support member may be separated from the second plate-shaped body, and then the roller member may be configured. Moves along the lower surface of the second plate. The support member is when the roller member abuts against the second plate member The member that maintains the posture of the second plate-shaped body does not have to be in contact with the second plate-shaped body after the roller member abuts against the second plate-shaped body. After the support member is moved away from the second plate-shaped body, the roller member is moved, whereby the support member can be retracted to a position where it does not interfere with the roller member.

又,例如亦可構成為輥部件與支持部件一體地移動。於輥部件之移動方向上位於輥部件前方之支持部件於輥部件移行時有可能會成為障礙物。藉由使支持部件與輥部件一體地移動,而不會產生上述問題。此時,只要支持部件自第2板狀體離開,則能夠避免支持部件滑動摩擦第2板狀體之表面。 Further, for example, the roller member may be integrally moved with the support member. The support member located in front of the roller member in the moving direction of the roller member may become an obstacle when the roller member moves. The above problem does not occur by integrally moving the support member and the roller member. At this time, as long as the support member is separated from the second plate-shaped body, it is possible to prevent the support member from slidingly rubbing against the surface of the second plate-shaped body.

或者,例如亦可構成為,支持部件具有具備與輥部件之軸平行之軸之輥形狀,且一面於較輥部件靠下方位置抵接於第2板狀體之下表面,一面與支持部件一體地沿著第2板狀體之下表面進行移動。上述構成中,藉由使輥部件轉動來避免對第2板狀體滑動摩擦。又,即使於輥部件之移動中,支持部件亦會支持第2板狀體,藉此,能夠更穩定地維持第2板狀體之姿勢。 Alternatively, for example, the support member may have a roll shape including an axis parallel to the axis of the roller member, and may be in contact with the support member while being in contact with the lower surface of the second plate-like body at a position lower than the roller member. The ground moves along the lower surface of the second plate-shaped body. In the above configuration, the second plate-shaped body is prevented from sliding friction by rotating the roller member. Further, even when the roller member moves, the support member supports the second plate-shaped body, whereby the posture of the second plate-shaped body can be more stably maintained.

於該等情形時,例如輥部件與支持部件亦可安裝於沿著第2板狀體之下表面移動之同一移動部件,並且高度方向上之位置能夠相互獨立地進行變更。根據上述構成,藉由使單一之移動部件進行移動,而能夠使輥部件與支持部件一併移動,又,藉由兩者之高度方向位置相互獨立地進行變更,而能夠實現上述順序之抵接、分離。 In such a case, for example, the roller member and the support member may be attached to the same moving member that moves along the lower surface of the second plate-shaped body, and the positions in the height direction can be changed independently of each other. According to the above configuration, by moving the single moving member, the roller member and the supporting member can be moved together, and the height direction positions of the two can be changed independently of each other, whereby the order can be achieved. Separation.

又,例如於本發明中,支持部件亦可於上端具有沿著與輥部件之延伸設置方向平行之方向延伸之抵接部位。根據上述構成,能夠有效地抑制沿著輥部件之延伸設置方向之撓曲,能夠進一步提高位置精度。 Further, for example, in the present invention, the support member may have an abutting portion extending at a direction parallel to a direction in which the roller member extends in the upper end. According to the above configuration, it is possible to effectively suppress the deflection along the extending direction of the roller member, and it is possible to further improve the positional accuracy.

又,例如亦可構成為,具備相對於第2板狀體之下表面中央部而分離抵接自如地設置之輔助支持機構,輔助支持機構於沿著第2板狀體之下表面之輥部件之移動方向上,於輥部件之前方位置抵接於第2板狀體之下表面中央部而自下方支持第2板狀體,且隨著輥部件移動而自第 2板狀體離開,從而使輥部件通過。根據上述構成,維持第2板狀體之姿勢之作用進一步提高,因此能夠更有效地抑制因第2板狀體撓曲所導致之位置偏移。 Further, for example, the auxiliary support mechanism may be provided to be detachably provided to the central portion of the lower surface of the second plate-shaped body, and the auxiliary support mechanism may be a roller member along the lower surface of the second plate-shaped body. In the moving direction, the second plate-shaped body is supported from the lower side at the center of the lower surface of the second plate-shaped body in front of the roller member, and the roller member moves from the second member. 2 The plate-like body is separated to pass the roller member. According to the above configuration, the action of maintaining the posture of the second plate-shaped body is further improved, so that the positional deviation due to the deflection of the second plate-shaped body can be more effectively suppressed.

該情形時,輔助支持機構亦可進而具有複數個輔助支持部件,上述輔助支持部件分別局部地抵接於第2板狀體之下表面而支持第2板狀體。藉由此種配置輔助支持部件,能夠維持第2板狀體整體之姿勢,但於未受到支持之部分無法避免略微之撓曲。上述情形時,藉由應用本發明,能夠減少第2板狀體之撓曲。 In this case, the auxiliary support mechanism may further include a plurality of auxiliary support members, and the auxiliary support members partially abut against the lower surface of the second plate-shaped body to support the second plate-shaped body. With such an arrangement assisting support member, the posture of the entire second plate-shaped body can be maintained, but slight deflection cannot be avoided in the unsupported portion. In the above case, by applying the present invention, the deflection of the second plate-shaped body can be reduced.

又,例如亦可構成為,進而設有對第1板狀體與第2板狀體之間之間隙量進行檢測之間隙檢測機構,且支持部件之高度係基於由間隙檢測機構檢測之間隙量進行設定。實際測定第1板狀體與第2板狀體之間之間隙量,並基於其結果而設定支持部件之高度,藉此,能夠更確實地維持第2板狀體之姿勢。 Further, for example, a gap detecting mechanism for detecting the amount of gap between the first plate-shaped body and the second plate-shaped body may be further provided, and the height of the supporting member is based on the amount of the gap detected by the gap detecting mechanism. Make settings. The amount of the gap between the first plate-shaped body and the second plate-shaped body is actually measured, and the height of the support member is set based on the result, whereby the posture of the second plate-shaped body can be more reliably maintained.

又,例如亦可構成為,第1保持機構具有抵接於第1板狀體之上表面之平坦抵接面。第1板狀體隔著第2板狀體而自輥部件受到按壓。藉由預先使第1板狀體抵接於平坦面,能夠防止因來自輥部件之按壓而導致第1板狀體撓曲,從而良好地進行轉印。 Further, for example, the first holding mechanism may have a flat abutting surface that abuts against the upper surface of the first plate-shaped body. The first plate-shaped body is pressed from the roller member via the second plate-shaped body. By bringing the first plate-shaped body into contact with the flat surface in advance, it is possible to prevent the first plate-shaped body from being deflected by the pressing from the roller member, and the transfer can be favorably performed.

又,例如亦可進一步設置對準機構,上述對準機構使水平方向上之第1保持機構與第2保持機構之相對位置發生變化。藉由設置上述對準機構,能夠調整第1板狀體與第2板狀體之水平位置。但,如果自進行對準後之狀態到第1板狀體與第2板狀體實際抵接為止產生新之位置偏移,則會削弱該效果。藉由對上述構成應用本發明,能夠精度更好地控制轉印位置。 Further, for example, an alignment mechanism may be further provided, and the alignment mechanism changes a relative position of the first holding mechanism and the second holding mechanism in the horizontal direction. By providing the alignment mechanism described above, the horizontal position of the first plate-shaped body and the second plate-shaped body can be adjusted. However, if a new positional shift occurs after the alignment is performed until the first plate-shaped body and the second plate-like body actually come into contact with each other, the effect is weakened. By applying the present invention to the above configuration, the transfer position can be controlled with higher precision.

[產業上之可利用性] [Industrial availability]

本發明能夠適宜地應用於對玻璃基板或半導體基板等各種基板轉印圖案或薄膜等被轉印物之處理。又,於不隔著圖案等而使2片板狀 體直接抵接之情形時,亦可應用本發明之技術思想。 The present invention can be suitably applied to the treatment of a transfer material such as a transfer pattern or a film on various substrates such as a glass substrate or a semiconductor substrate. Moreover, two sheets are not formed without a pattern or the like. The technical idea of the present invention can also be applied when the body directly abuts.

21‧‧‧上平台(第1保持機構) 21‧‧‧Upper platform (1st holding institution)

31‧‧‧下平台(第2保持機構、支持台) 31‧‧‧Under platform (2nd holding institution, support desk)

331~334、341~344‧‧‧升降手(輔助支持部件) 331~334, 341~344‧‧‧ Lifting hand (auxiliary support parts)

431‧‧‧轉印輥(輥部件) 431‧‧‧Transfer roller (roller part)

441‧‧‧升降片(支持部件) 441‧‧‧ Lifting piece (supporting parts)

BL‧‧‧橡皮布(第2板狀體) BL‧‧‧ blanket (2nd plate)

PT‧‧‧圖案 PT‧‧‧ pattern

SB‧‧‧基板(第1板狀體) SB‧‧‧ substrate (1st plate)

X、Y、Z‧‧‧座標軸 X, Y, Z‧‧‧ coordinate axis

Claims (15)

一種轉印裝置,其包括:第1保持機構,其將第1板狀體以下表面開放之狀態保持為水平姿勢;第2保持機構,其以保持第2板狀體之周緣部且上述第2板狀體之上表面與上述第1板狀體之下表面接近且對向之方式,且以上述第2板狀體之下表面中於上表面側與上述第1板狀體對向之下表面中央部開放之水平姿勢,保持上述第2板狀體;輥部件,其具有沿著上述第2板狀體之下表面延伸設置之輥形狀,且構成為能夠相對於上述第2板狀體之下表面分離抵接,一面抵接於上述第2板狀體之下表面而將上述第2板狀體壓抵於上述第1板狀體一面沿著上述第2板狀體之下表面移動;及支持部件,其構成為能夠相對於上述第2板狀體之下表面分離抵接,且藉由上端抵接於上述第2板狀體之下表面而自下方支持上述第2板狀體;且於上述輥部件遠離上述第2板狀體之狀態下,於上述第2板狀體之下表面中較上述輥部件最初抵接之部分更靠上述第2板狀體中心側之位置,上述支持部件抵接於上述第2板狀體之下表面而支持上述第2板狀體;上述輥部件對由上述支持部件支持之上述第2板狀體抵接開始,係沿著上述第2板狀體之下表面移動。 A transfer device comprising: a first holding mechanism that holds a lower surface of a first plate-shaped body in a horizontal posture; and a second holding mechanism that holds a peripheral edge portion of the second plate-shaped body and the second The upper surface of the plate-shaped body is adjacent to and opposite to the lower surface of the first plate-shaped body, and the lower surface of the second plate-shaped body is opposed to the first plate-shaped body on the upper surface side. The second plate-shaped body is held in a horizontal posture in which the center portion of the surface is open, and the roller member has a roll shape extending along a lower surface of the second plate-shaped body, and is configured to be movable with respect to the second plate-shaped body The lower surface is abutted against the lower surface of the second plate-shaped body, and the second plate-shaped body is pressed against the lower surface of the second plate-shaped body while being pressed against the first plate-shaped body. And a supporting member configured to be separable from the lower surface of the second plate-shaped body, and to support the second plate-shaped body from below by the upper end abutting against the lower surface of the second plate-shaped body And in the state in which the roller member is apart from the second plate-shaped body, the second a portion of the lower surface of the body that is closer to the center of the second plate-shaped body than the portion where the roller member first abuts, the support member abuts against the lower surface of the second plate-shaped body to support the second plate shape The roller member moves along the lower surface of the second plate-shaped body when the second plate-shaped body supported by the support member abuts. 如請求項1之轉印裝置,其中上述第2保持機構具有與上述第2板狀體之上述下表面中央部對應之中央部開口之邊框狀支持台,上述支持台之上表面形成為抵接於上述第2板狀體之周緣部下表面而支持上述第2板狀體之平坦支持面,且上述支持部件之上表面位於與上述支持台之上述支持面相同 之高度而支持上述第2板狀體。 The transfer device according to claim 1, wherein the second holding mechanism has a frame-shaped support base that is open at a central portion corresponding to a central portion of the lower surface of the second plate-shaped body, and the upper surface of the support base is formed to abut Supporting the flat support surface of the second plate-shaped body on the lower surface of the peripheral portion of the second plate-shaped body, and the upper surface of the support member is located on the support surface of the support base The second plate-shaped body is supported by the height. 如請求項1之轉印裝置,其中上述輥部件對上述第2板狀體開始抵接而將上述第2板狀體壓抵於上述第1板狀體後,上述支持部件自上述第2板狀體離開,之後,上述輥部件沿著上述第2板狀體之下表面移動。 The transfer device of claim 1, wherein the roller member starts to abut against the second plate-shaped body and presses the second plate-shaped body against the first plate-shaped body, and the support member is from the second plate. After the body is separated, the roller member moves along the lower surface of the second plate-shaped body. 如請求項1之轉印裝置,其中上述輥部件與上述支持部件一體地沿著上述第2板狀體之下表面移動。 The transfer device of claim 1, wherein the roller member and the support member move integrally along a lower surface of the second plate-shaped body. 如請求項1之轉印裝置,其中上述支持部件具有具備與上述輥部件之軸平行之軸之輥形狀,一面於較上述輥部件更靠下方位置抵接於上述第2板狀體之下表面,一面與上述輥部件一體地沿著上述第2板狀體之下表面移動。 The transfer device of claim 1, wherein the support member has a roll shape having an axis parallel to an axis of the roll member, and abuts against a lower surface of the second plate member at a position lower than the roll member And moving along the lower surface of the second plate-shaped body integrally with the roller member. 如請求項4或5之轉印裝置,其中上述輥部件與上述支持部件安裝於沿著上述第2板狀體之下表面移動之同一移動部件,並且高度方向上之位置能夠相互獨立地進行變更。 The transfer device according to claim 4 or 5, wherein the roller member and the support member are attached to the same moving member that moves along a lower surface of the second plate-like body, and the positions in the height direction can be changed independently of each other. . 如請求項1至3中任一項之轉印裝置,其中上述支持部件於上端具有沿著與上述輥部件之延伸設置方向平行之方向延伸之抵接部位。 The transfer device according to any one of claims 1 to 3, wherein the support member has an abutting portion extending in a direction parallel to an extending direction of the roller member at an upper end. 如請求項1至5中任一項之轉印裝置,其具備輔助支持機構,上述輔助支持機構相對於上述第2板狀體之上述下表面中央部而分離抵接自如地設置,上述輔助支持機構於沿著上述第2板狀體之下表面之上述輥部件之移動方向上,於上述輥部件之前方位置抵接於上述第2板狀體之上述下表面中央部而自下方支持上述第2板狀體,且隨著上述輥部件移動而自上述第2板狀體離開,從而使上述輥部件通過。 The transfer device according to any one of claims 1 to 5, further comprising an auxiliary support mechanism, wherein the auxiliary support mechanism is provided separately from the central portion of the lower surface of the second plate-shaped body, and the auxiliary support The mechanism abuts the central portion of the lower surface of the second plate-shaped body at a position in front of the roller member in a moving direction of the roller member along a lower surface of the second plate-shaped member, and supports the first portion from below The plate-like body is separated from the second plate-shaped body as the roller member moves, and the roller member is passed. 如請求項8之轉印裝置,其中上述輔助支持機構具有複數個輔助支持部件,上述複數個輔助支持部件分別局部地抵接於上述第2 板狀體之下表面而支持上述第2板狀體。 The transfer device of claim 8, wherein the auxiliary support mechanism has a plurality of auxiliary support members, and the plurality of auxiliary support members partially abut the second portion The second plate-shaped body is supported by the lower surface of the plate-like body. 如請求項1至5中任一項之轉印裝置,其具備間隙檢測機構,上述間隙檢測機構係對上述第1板狀體與上述第2板狀體之間之間隙量進行檢測,基於由上述間隙檢測機構檢測之上述間隙量,設定上述支持部件之高度。 The transfer device according to any one of claims 1 to 5, further comprising: a gap detecting mechanism that detects a gap amount between the first plate-shaped body and the second plate-shaped body, based on The gap amount detected by the gap detecting means sets the height of the support member. 如請求項1至5中任一項之轉印裝置,其中上述第1保持機構具有抵接於上述第1板狀體之上表面之平坦抵接面。 The transfer device according to any one of claims 1 to 5, wherein the first holding means has a flat abutting surface that abuts against an upper surface of the first plate-shaped body. 如請求項1至5中任一項之轉印裝置,其具備對準機構,上述對準機構使水平方向上之上述第1保持機構與上述第2保持機構之相對位置變化。 The transfer device according to any one of claims 1 to 5, further comprising: an alignment mechanism that changes a relative position of the first holding mechanism and the second holding mechanism in a horizontal direction. 一種轉印方法,其包括:保持步驟,其係將第1板狀體以下表面開放之狀態保持為水平姿勢,以保持第2板狀體之周緣部且上述第2板狀體之上表面與上述第1板狀體之下表面接近且對向之方式,且以上述第2板狀體之下表面中於上表面側與上述第1板狀體對向之下表面中央部開放之水平姿勢,保持上述第2板狀體;輥配置步驟,其係將輥部件配置於遠離上述第2板狀體之位置,上述輥部件具有沿著上述第2板狀體之下表面延伸設置之輥形狀,且構成為能夠沿著上述第2板狀體之下表面移動;支持步驟,其係使支持部件之上端於較上述輥部件更靠上述第2板狀體中心側之位置抵接於上述第2板狀體之下表面,而自下方支持上述第2板狀體,上述支持部件構成為能夠相對於上述第2板狀體之下表面分離抵接;及轉印步驟,其係上述輥部件對由上述支持部件支持之上述第2板狀體抵接開始,將上述第2板狀體壓抵於上述第1板狀體,並沿著上述第2板狀體之下表面移動。 A transfer method comprising: a holding step of maintaining a state in which a surface of the first plate-shaped body is open to a horizontal position, and holding a peripheral portion of the second plate-shaped body and a surface of the second plate-shaped body and The lower surface of the first plate-shaped body is close to and opposed to each other, and is horizontally opened on the upper surface side of the lower surface of the second plate-shaped body and the lower surface of the lower surface of the first plate-shaped body. Holding the second plate-shaped body; the roller disposing step of disposing the roller member at a position away from the second plate-shaped body, wherein the roller member has a roller shape extending along a lower surface of the second plate-shaped body And being configured to be movable along a lower surface of the second plate-shaped body; and a supporting step of abutting the upper end of the support member at a position closer to a center side of the second plate-shaped body than the roller member a lower surface of the plate-like body, and supporting the second plate-shaped body from below, wherein the support member is configured to be separable from the lower surface of the second plate-shaped body; and a transfer step of the roller member The above second support by the above support components Shaped abuts Initially, the second plate-shaped body is pressed against to the first plate member, and is moved along under the surface of the second plate-like member. 如請求項13之轉印方法,其中上述轉印步驟中,於上述輥部件抵接於上述第2板狀體而將上述第2板狀體壓抵於上述第1板狀體後,上述支持部件自上述第2板狀體離開,之後上述輥部件沿著上述第2板狀體之下表面移動。 The transfer method of claim 13, wherein in the transferring step, after the roller member abuts against the second plate-shaped body and presses the second plate-shaped body against the first plate-shaped body, the support The member is separated from the second plate-shaped body, and then the roller member moves along the lower surface of the second plate-shaped body. 如請求項13或14之轉印方法,其中上述轉印步驟中,上述支持部件與上述輥部件一體地沿著上述第2板狀體之下表面移動。 The transfer method according to claim 13 or 14, wherein in the transferring step, the support member and the roller member integrally move along a lower surface of the second plate-shaped body.
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