TW201630480A - Circuit layout structure, circuit board and electronic assembly - Google Patents

Circuit layout structure, circuit board and electronic assembly Download PDF

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TW201630480A
TW201630480A TW105115130A TW105115130A TW201630480A TW 201630480 A TW201630480 A TW 201630480A TW 105115130 A TW105115130 A TW 105115130A TW 105115130 A TW105115130 A TW 105115130A TW 201630480 A TW201630480 A TW 201630480A
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differential pair
patterned conductive
conductive layer
layer
patterned
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TW105115130A
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TWI627878B (en
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李勝源
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威盛電子股份有限公司
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Abstract

A circuit layout structure is suitable for a circuit board and includes the following elements. A first differential pair and a second differential pair respectively extend from the inside of a chip area of the circuit board to the outside thereof through the first patterned conductive layer respectively, and extend between the chip area and a port area of the circuit board through the second patterned conductive layer respectively. The first ground plane is constructed by the first patterned conductive layer. Orthogonal projections of the first differential pair and the second differential pair relative to the first patterned conductive layer overlap the first ground plane.

Description

線路佈局結構、線路板及電子總成Line layout structure, circuit board and electronic assembly

本發明是有關於一種線路板,且特別是有關於一種線路佈局結構,適用於線路板,用以降低訊號干擾,以及採用此線路佈局結構的線路板及電子總成。The present invention relates to a circuit board, and more particularly to a circuit layout structure suitable for a circuit board for reducing signal interference, and a circuit board and an electronic assembly using the circuit layout structure.

在現今USB 3.0的應用相當大眾化,但在大約2.5 GHz的頻率可能會出現電磁干擾(EMI)/ 射頻干擾(RFI)的問題。這是由於USB 3.0具有5 Gbps的資料速率(data rate),其時脈頻率落在2.5 GHz。因此,操作頻率大約在2.5 GHz的裝置(例如無線滑鼠的無線模組)可能會被USB 3.0的訊號所干擾而失效。The application of USB 3.0 is quite popular today, but electromagnetic interference (EMI) / radio frequency interference (RFI) problems may occur at frequencies around 2.5 GHz. This is because USB 3.0 has a data rate of 5 Gbps and its clock frequency falls at 2.5 GHz. Therefore, devices operating at approximately 2.5 GHz (such as the wireless module of a wireless mouse) may be disabled by the USB 3.0 signal.

舉例而言, USB 3.0的集線器(hub)具有線路板及安裝在線路板上的USB 3.0晶片及USB 3.0電連接器,而USB 3.0晶片通常經由線路板的表層線路來電性連接USB 3.0電連接器。當USB 3.0的集線器(hub)的外殼採用塑膠材質且不具有適當的金屬屏蔽時,線路板的表層線路傳輸的USB 3.0訊號(時脈頻率為2.5 GHz)所發出的射頻干擾大約落在2.5 GHz。這樣的電磁干擾/ 射頻干擾可能影響操作頻率在2.4 GHz的無線滑鼠的無線模組。For example, a USB 3.0 hub has a circuit board and a USB 3.0 chip and a USB 3.0 electrical connector mounted on the circuit board, while a USB 3.0 chip typically connects the USB 3.0 electrical connector via a surface line of the circuit board. . When the USB 3.0 hub is made of plastic and does not have a proper metal shield, the RF interference from the USB 3.0 signal (2.5 GHz) transmitted by the surface line of the board falls to approximately 2.5 GHz. . Such electromagnetic interference/radio frequency interference may affect the wireless module of a wireless mouse operating at 2.4 GHz.

本發明提供一種線路佈局結構,適用於線路板,用以降低傳輸訊號時所產生對外的干擾。The invention provides a circuit layout structure, which is suitable for a circuit board, and is used for reducing external interference generated when transmitting signals.

本發明提供一種線路板,用以降低傳輸訊號時所產生對外的干擾。The invention provides a circuit board for reducing external interference generated when transmitting signals.

本發明提供一種電子總成,用以降低傳輸訊號時所產生對外的干擾。The invention provides an electronic assembly for reducing external interference generated when transmitting signals.

本發明的一種線路佈局結構,適用於一線路板。線路板具有一晶片區、一端口區、一第一圖案化導電層、一第二圖案化導電層、一介電層及多個導電通孔。第一圖案化導電層及第二圖案化導電層以介電層分隔。這些導電通孔電性連接第一圖案化導電層及第二圖案化導電層。線路佈局結構包括一第一差動對、一第二差動對、一第一接地平面及一第二接地平面。第一差動對經由第一圖案化導電層從晶片區內延伸至晶片區外,並經由第二圖案化導電層在晶片區與端口區之間延伸。第二差動對經由第一圖案化導電層從晶片區內延伸至晶片區外,並經由第二圖案化導電層在晶片區與端口區之間延伸。第一接地平面構成自第一圖案化導電層。第一差動對在第二圖案化導電層上的正投影重疊於第一接地平面。第二差動對在第二圖案化導電層上的正投影重疊於第一接地平面。第二接地平面構成自第二圖案化導電層,並具有一第一開口及一第二開口。第一差動對及第二差動對經由第二圖案化導電層分別在第一開口及第二開口內延伸。A circuit layout structure of the present invention is applicable to a circuit board. The circuit board has a wafer area, a port area, a first patterned conductive layer, a second patterned conductive layer, a dielectric layer and a plurality of conductive vias. The first patterned conductive layer and the second patterned conductive layer are separated by a dielectric layer. The conductive vias are electrically connected to the first patterned conductive layer and the second patterned conductive layer. The circuit layout structure includes a first differential pair, a second differential pair, a first ground plane, and a second ground plane. A first differential pair extends from the wafer region to the outside of the wafer region via the first patterned conductive layer and extends between the wafer region and the port region via the second patterned conductive layer. A second differential pair extends from the wafer region to the outside of the wafer region via the first patterned conductive layer and extends between the wafer region and the port region via the second patterned conductive layer. The first ground plane is formed from the first patterned conductive layer. An orthographic projection of the first differential pair on the second patterned conductive layer overlaps the first ground plane. An orthographic projection of the second differential pair on the second patterned conductive layer overlaps the first ground plane. The second ground plane is formed from the second patterned conductive layer and has a first opening and a second opening. The first differential pair and the second differential pair extend through the second patterned conductive layer in the first opening and the second opening, respectively.

本發明的一種線路板,其包括多個圖案化導電層、與這些圖案化導電層交替疊合的多個介電層以及穿過這些介電層以連接這些圖案化導電層。這些構件構成上述的線路佈局結構。A circuit board of the present invention includes a plurality of patterned conductive layers, a plurality of dielectric layers alternately stacked with the patterned conductive layers, and through the dielectric layers to connect the patterned conductive layers. These members constitute the above-described line layout structure.

本發明的一種電子總成,其包括具有一晶片區及一端口區的一線路板、安裝至晶片區的一晶片以及安裝至端口區的一電連接器。線路板具有上述的線路佈局結構。An electronic assembly of the present invention includes a circuit board having a wafer area and a port area, a wafer mounted to the wafer area, and an electrical connector mounted to the port area. The circuit board has the above-described line layout structure.

基於上述,在本發明中,將原先設置在第一圖案化導電層的第一差動對及第二差動對下降至第二圖案化導電層,並藉由第一接地平面的垂直遮擋及第二接地平面的水平遮擋,以降低第一差動對及第二差動於傳輸訊號時所產生對外的干擾。Based on the above, in the present invention, the first differential pair and the second differential pair originally disposed on the first patterned conductive layer are lowered to the second patterned conductive layer, and are vertically blocked by the first ground plane and The horizontal occlusion of the second ground plane reduces the external interference generated by the first differential pair and the second differential when transmitting the signal.

為讓本發明的上述特徵和優點能更明顯易懂,下文特舉實施例,並配合所附圖式作詳細說明如下。The above described features and advantages of the invention will be apparent from the following description.

請參考圖1,在本實施例中,電子總成10包括一晶片12、一電連接器14及一線路板50。線路板50具有一晶片區50a及一端口區50b(port area)。晶片12(例如是USB 3.0或3.1晶片)安裝至晶片區50a。電連接器14(例如是USB 3.0或3.1電連接器)安裝至端口區50b。因此,位在晶片區50a的晶片12可經由線路板50來電性連接位在端口區50b的電連接器14。Referring to FIG. 1 , in the embodiment, the electronic assembly 10 includes a wafer 12 , an electrical connector 14 , and a circuit board 50 . The circuit board 50 has a wafer area 50a and a port area 50b. A wafer 12, such as a USB 3.0 or 3.1 wafer, is mounted to the wafer area 50a. An electrical connector 14 (such as a USB 3.0 or 3.1 electrical connector) is mounted to port area 50b. Thus, the wafer 12 positioned in the wafer region 50a can be electrically connected via the wiring board 50 to the electrical connector 14 located in the port region 50b.

請參考圖2,在本實施例中,線路板50包括多個圖案化導電層、多個介電層及多個導電通孔。這些圖案化導電層及這些介電層交替疊合,而這些導電通孔穿過該些介電層,以連接該些圖案化導電層。Referring to FIG. 2, in the embodiment, the circuit board 50 includes a plurality of patterned conductive layers, a plurality of dielectric layers, and a plurality of conductive vias. The patterned conductive layers and the dielectric layers are alternately stacked, and the conductive vias pass through the dielectric layers to connect the patterned conductive layers.

這些圖案化導電層包括第一圖案化導電層51-1、第二圖案化導電層51-2、第三圖案化導電層51-3及第四圖案化導電層51-4。這些介電層包括一介電核心層52-0、第一介電層52-1及一第二介電層52-2。這些導電孔包括多個導電通孔53-1、53-2及53-3。介電核心層52-0位於第二圖案化導電層51-2及第三圖案化導電層51-3之間,並以導電通孔53-1電性連接第二圖案化導電層51-2及第三圖案化導電層51-3。第一介電層52-1位於第一圖案化導電層51-1及第二圖案化導電層51-2之間,並以導電通孔53-2電性連接第一圖案化導電層51-1及第二圖案化導電層51-2。第二介電層52-2位於第三圖案化導電層51-3及第四圖案化導電層51-4之間,並以導電通孔53-3電性連接第三圖案化導電層51-3及第四圖案化導電層51-4。介電核心層52-0的厚度大於第一介電層52-1及第二介電層52-2的厚度。第一銲罩層52-3覆蓋第一圖案化導電層51-1。第二銲罩層52-4覆蓋第四圖案化導電層51-4。在本實施例中,第三圖案化導電層51-3實質上構成一電源平面(power plane),在另一實施例中,第三圖案化導電層51-3實質上構成一非接地平面,如訊號平面。在本實施例中,線路板50可視為一四層板。在本實施例中,多個導電通孔53-1、53-2及53-3為直接貫穿第一圖案化導電層51-1、第二圖案化導電層51-2、第三圖案化導電層51-3及第四圖案化導電層51-4。在其他實施例中,多個導電通孔為非直接貫穿這些圖案化導電層(未繪示)。The patterned conductive layers include a first patterned conductive layer 51-1, a second patterned conductive layer 51-2, a third patterned conductive layer 51-3, and a fourth patterned conductive layer 51-4. The dielectric layers include a dielectric core layer 52-0, a first dielectric layer 52-1, and a second dielectric layer 52-2. These conductive vias include a plurality of conductive vias 53-1, 53-2, and 53-3. The dielectric core layer 52-0 is located between the second patterned conductive layer 51-2 and the third patterned conductive layer 51-3, and is electrically connected to the second patterned conductive layer 51-2 by the conductive via 53-1. And a third patterned conductive layer 51-3. The first dielectric layer 52-1 is located between the first patterned conductive layer 51-1 and the second patterned conductive layer 51-2, and is electrically connected to the first patterned conductive layer 51 by conductive vias 53-2. 1 and a second patterned conductive layer 51-2. The second dielectric layer 52-2 is located between the third patterned conductive layer 51-3 and the fourth patterned conductive layer 51-4, and electrically connected to the third patterned conductive layer 51 by the conductive vias 53-3. 3 and a fourth patterned conductive layer 51-4. The thickness of the dielectric core layer 52-0 is greater than the thickness of the first dielectric layer 52-1 and the second dielectric layer 52-2. The first solder mask layer 52-3 covers the first patterned conductive layer 51-1. The second solder mask layer 52-4 covers the fourth patterned conductive layer 51-4. In this embodiment, the third patterned conductive layer 51-3 substantially constitutes a power plane. In another embodiment, the third patterned conductive layer 51-3 substantially constitutes a non-ground plane. Such as the signal plane. In the present embodiment, the circuit board 50 can be regarded as a four-layer board. In this embodiment, the plurality of conductive vias 53-1, 53-2, and 53-3 directly penetrate the first patterned conductive layer 51-1, the second patterned conductive layer 51-2, and the third patterned conductive Layer 51-3 and fourth patterned conductive layer 51-4. In other embodiments, the plurality of conductive vias are not directly through the patterned conductive layers (not shown).

請參考圖2、圖3及圖4,線路板50更包括一線路佈局結構100,其包括一第一差動對110、一第二差動對120及一第三差動對130。第一差動對110包括一對訊號路徑,其例如是可相容於USB 3.0或USB 3.1的一傳送差動對Tx+及Tx-。第二差動對120包括一對訊號路徑,其例如是可相容於USB 3.0或USB 3.1的一接收差動對Rx+及Rx-。值得一提的是,圖4中的第一差動對110、第二差動對120彼此的位置僅為示例,並非用以限定本發明。第三差動對130包括一對訊號路徑,其例如是可相容於USB 1.0或USB 2.0的一傳送/接收差動對D+及D-。一般來說,傳送/接收差動訊號端(D+及D-)為一半雙功傳輸模式,亦即訊號的傳送或接收只能擇一進行。意即,當進行資料傳送時,就無法進行資料接收,而當進行資料接收時,就無法進行資料傳送。此外,在USB 3.0或USB 3.1架構中,傳送差動訊號端(Tx+及Tx-)與接收差動訊號端(Rx+及Rx-)為一全雙功傳輸模式,亦即訊號的傳送或接收可以直接進行。The circuit board 50 further includes a line layout structure 100 including a first differential pair 110, a second differential pair 120, and a third differential pair 130. The first differential pair 110 includes a pair of signal paths, such as a transmit differential pair Tx+ and Tx- that is compatible with USB 3.0 or USB 3.1. The second differential pair 120 includes a pair of signal paths, such as a receive differential pair Rx+ and Rx- that are compatible with USB 3.0 or USB 3.1. It should be noted that the positions of the first differential pair 110 and the second differential pair 120 in FIG. 4 are only examples, and are not intended to limit the present invention. The third differential pair 130 includes a pair of signal paths, such as a transmit/receive differential pair D+ and D- that are compatible with USB 1.0 or USB 2.0. In general, the transmit/receive differential signal terminals (D+ and D-) are half-duplex transmission mode, that is, the transmission or reception of signals can only be performed one by one. That is to say, when data transmission is performed, data reception cannot be performed, and when data reception is performed, data transmission cannot be performed. In addition, in the USB 3.0 or USB 3.1 architecture, the differential signal terminals (Tx+ and Tx-) and the receiving differential signal terminals (Rx+ and Rx-) are in a full-duplex transmission mode, that is, the transmission or reception of signals can be Directly.

值得注意的是,在目前已知的線路板,針對連接於USB 3.0晶片以及USB 3.0電連接器之間的線路佈局結構,這三對差動對都是配置在非接地的圖案化導電層(如:圖2的第一圖案化導電層51-1),而鄰近會有一接地平面(如:圖2的第二圖案化導電層51-2)。然而,位於非接地的圖案化導電層的USB 3.0或USB 3.1的傳送差動對或接收差動對卻可能在訊號傳送或接收的過程中,對其他元件(如:無線滑鼠的無線模組)造成電磁干擾(EMI)/ 射頻干擾(RFI)。因此,本發明提出一種新的線路佈局結構,來改善上述問題。It is worth noting that in the currently known circuit boards, for the line layout structure connected between the USB 3.0 chip and the USB 3.0 electrical connector, the three pairs of differential pairs are arranged in a non-ground patterned conductive layer ( For example, the first patterned conductive layer 51-1) of FIG. 2 has a ground plane adjacent thereto (eg, the second patterned conductive layer 51-2 of FIG. 2). However, the USB 3.0 or USB 3.1 transmission differential pair or receiving differential pair located in the ungrounded patterned conductive layer may be in the process of signal transmission or reception, for other components (eg wireless mouse wireless module) ) Causes electromagnetic interference (EMI) / radio frequency interference (RFI). Accordingly, the present invention proposes a new circuit layout structure to improve the above problems.

請繼續參考圖2、圖3、圖4及圖5,第一差動對110經由第一圖案化導電層51-1的一對走線T1從晶片區50a內延伸至晶片區50a外,並經由一對導電通孔53-2向下連接第二圖案化導電層51-2。接著,第一差動對110經由第二圖案化導電層51-2的一對走線T2在晶片區50a與端口區50b之間延伸,並經由另一對導電通孔53-2向上連接第一圖案化導電層51-1。最後,第一差動對110經由第一圖案化導電層51-1的另一對走線T1從端口區50b外(如:元件區)延伸至端口區50b內。在本實施例中,線路板50更具有一元件區50c,而第一差動對110可經由第一圖案化導電層51-1的至少一對走線T1延伸經過元件區50c,再從端口區50b外延伸至端口區50b內。上述元件區50c可配置電容、靜電放電保護裝置等。在另一實施例中,第一圖案化導電層51-1未配置有元件區50c,而第一差動對110經由第二圖案化導電層51-2的一對走線T2在晶片區50a與端口區50b之間延伸,並在端口區50b經由另一對導電通孔53-2向上連接第一圖案化導電層51-1。Referring to FIG. 2, FIG. 3, FIG. 4 and FIG. 5, the first differential pair 110 extends from the inside of the wafer region 50a to the outside of the wafer region 50a via a pair of traces T1 of the first patterned conductive layer 51-1, and The second patterned conductive layer 51-2 is connected downward via a pair of conductive vias 53-2. Next, the first differential pair 110 extends between the wafer region 50a and the port region 50b via a pair of traces T2 of the second patterned conductive layer 51-2, and is connected upward via another pair of conductive vias 53-2. A patterned conductive layer 51-1 is patterned. Finally, the first differential pair 110 extends from the outside of the port region 50b (eg, the component region) to the port region 50b via another pair of traces T1 of the first patterned conductive layer 51-1. In the present embodiment, the circuit board 50 further has an element region 50c, and the first differential pair 110 can extend through the element region 50c via the at least one pair of traces T1 of the first patterned conductive layer 51-1, and then from the port The area 50b extends outside the port area 50b. The element region 50c may be provided with a capacitor, an electrostatic discharge protection device, or the like. In another embodiment, the first patterned conductive layer 51-1 is not configured with the element region 50c, and the first differential pair 110 is in the wafer region 50a via a pair of traces T2 of the second patterned conductive layer 51-2. Extending from between the port region 50b, and connecting the first patterned conductive layer 51-1 upward through the other pair of conductive vias 53-2 in the port region 50b.

請參考圖2、圖3、圖4及圖5,相似於第一差動對110,第二差動對120經由第一圖案化導電層51-1的一對走線T1從晶片區50a內延伸至晶片區50a外,並經由一對導電通孔53-2連接第二圖案化導電層51-2。接著,第二差動對120經由第二圖案化導電層51-2的一對走線T2在晶片區50a與端口區50b之間延伸,並經由另一對導電通孔53-2向上連接第一圖案化導電層51-1。最後,第二差動對120經由第一圖案化導電層51-1的另一對走線T1從端口區50b外(如:元件區)延伸至端口區50b內。在本實施例中,第二差動對120可經由第一圖案化導電層51-1的至少一對走線T1延伸經過元件區50c,再從端口區50b外延伸至端口區50b內。上述元件區50c可配置電容、靜電放電保護裝置等。在另一實施例中,第一圖案化導電層51-1未配置有元件區50c,而第二差動對120經由第二圖案化導電層51-2的一對走線T2在晶片區50a與端口區50b之間延伸,並在端口區50b經由另一對導電通孔53-2向上連接第一圖案化導電層51-1。Referring to FIG. 2, FIG. 3, FIG. 4 and FIG. 5, similar to the first differential pair 110, the second differential pair 120 is from the wafer region 50a via a pair of traces T1 of the first patterned conductive layer 51-1. The film region 50a is extended outside and connected to the second patterned conductive layer 51-2 via a pair of conductive vias 53-2. Next, the second differential pair 120 extends between the wafer region 50a and the port region 50b via a pair of traces T2 of the second patterned conductive layer 51-2, and is connected upward via another pair of conductive vias 53-2. A patterned conductive layer 51-1 is patterned. Finally, the second differential pair 120 extends from the outside of the port region 50b (eg, the component region) to the port region 50b via the other pair of traces T1 of the first patterned conductive layer 51-1. In the present embodiment, the second differential pair 120 may extend through the element region 50c via at least one pair of traces T1 of the first patterned conductive layer 51-1 and extend from the outside of the port region 50b into the port region 50b. The element region 50c may be provided with a capacitor, an electrostatic discharge protection device, or the like. In another embodiment, the first patterned conductive layer 51-1 is not configured with the element region 50c, and the second differential pair 120 is in the wafer region 50a via the pair of traces T2 of the second patterned conductive layer 51-2. Extending from between the port region 50b, and connecting the first patterned conductive layer 51-1 upward through the other pair of conductive vias 53-2 in the port region 50b.

請參考圖3、圖4及圖5,第一差動對110經由第一圖案化導電層51-1的一部分(即一對走線T1)延伸至晶片區50a外,再經由第二圖案化導電層51-2的一部分(即一對走線T2)繼續延伸,最後再經由第一圖案化導電層51-1的一部分(即另一對走線T1)延伸至端口區50b。第二差動對120有類似第一差動對110的延伸方式。請再參考圖3、圖4及圖6,不同於第一差動對110及第二差動對120,第三差動對130經由第一圖案化導電層51-1的一部分(即一對走線T1)從晶片區50a直接延伸至端口區50b。第一差動對110及第二差動對120的主要延伸部分從第一圖案化導電層51-1移至第二圖案化導電層51-2,除可降低走線的擁擠程度外,更可受到第一圖案化導電層51-1的接地平面G所屏蔽,而降低於傳輸訊號時所產生對外的干擾,例如電磁干擾/射頻干擾。關於接地平面G更詳細的說明可參考以下的說明。Referring to FIG. 3, FIG. 4 and FIG. 5, the first differential pair 110 extends to a portion of the first patterned conductive layer 51-1 (ie, a pair of traces T1) to the outside of the wafer region 50a, and then through the second patterning. A portion of the conductive layer 51-2 (i.e., a pair of traces T2) continues to extend, and finally extends to a port region 50b via a portion of the first patterned conductive layer 51-1 (i.e., another pair of traces T1). The second differential pair 120 has an extension similar to the first differential pair 110. Referring to FIG. 3, FIG. 4 and FIG. 6, different from the first differential pair 110 and the second differential pair 120, the third differential pair 130 passes through a portion of the first patterned conductive layer 51-1 (ie, a pair) The trace T1) extends directly from the wafer region 50a to the port region 50b. The main extension of the first differential pair 110 and the second differential pair 120 is moved from the first patterned conductive layer 51-1 to the second patterned conductive layer 51-2, in addition to reducing the congestion of the traces, It can be shielded by the ground plane G of the first patterned conductive layer 51-1, and is reduced by external interference generated when the signal is transmitted, such as electromagnetic interference/radio frequency interference. For a more detailed description of the ground plane G, refer to the following description.

請參考圖2、圖3及圖4,線路佈局結構100還包括一第一接地平面150及一第二接地平面160。第一接地平面150構成自第一圖案化導電層51-1。第一差動對110在第二圖案化導電層51-2上的正投影重疊於第一接地平面150。第二差動對120在第二圖案化導電層51-2上的正投影重疊於第一接地平面150。第二接地平面160構成自第二圖案化導電層51-2,並具有一第一開口160a及一第二開口160b。第一差動對110經由第二圖案化導電層51-2在第一開口160a內延伸。第二差動對120經由第二圖案化導電層51-2在第二開口160b內延伸。換言之,每一開口160a、160b,僅通過一對差動對110或120,而非兩對差動對共用同一開口。第二接地平面160的一部分更位於第一差動對110與第二差動對120之間。換言之,第一開口160a及第二開口160b之間配置第二接地平面160的一部分。因此,本發明之實施例,將用於傳遞訊號的差動對110、120配置於接地平面,而第一差動對110及第二差動對120受到第一接地平面150的垂直遮擋及第二接地平面160的水平遮擋,可降低於傳輸訊號時所產生對外的干擾,例如電磁干擾/射頻干擾。Referring to FIG. 2 , FIG. 3 and FIG. 4 , the circuit layout structure 100 further includes a first ground plane 150 and a second ground plane 160 . The first ground plane 150 is formed from the first patterned conductive layer 51-1. The orthographic projection of the first differential pair 110 on the second patterned conductive layer 51-2 overlaps the first ground plane 150. The orthographic projection of the second differential pair 120 on the second patterned conductive layer 51-2 overlaps the first ground plane 150. The second ground plane 160 is formed from the second patterned conductive layer 51-2 and has a first opening 160a and a second opening 160b. The first differential pair 110 extends within the first opening 160a via the second patterned conductive layer 51-2. The second differential pair 120 extends within the second opening 160b via the second patterned conductive layer 51-2. In other words, each opening 160a, 160b passes through only one pair of differential pairs 110 or 120, rather than two pairs of differential pairs sharing the same opening. A portion of the second ground plane 160 is further located between the first differential pair 110 and the second differential pair 120. In other words, a portion of the second ground plane 160 is disposed between the first opening 160a and the second opening 160b. Therefore, in the embodiment of the present invention, the differential pairs 110 and 120 for transmitting signals are disposed on the ground plane, and the first differential pair 110 and the second differential pair 120 are vertically blocked by the first ground plane 150 and The horizontal occlusion of the two ground planes 160 can reduce the external interference generated when transmitting signals, such as electromagnetic interference/radio frequency interference.

請參考圖3及圖4,有些導電通孔53-2位於第一差動對110及第二差動對120旁。此外,有些導電通孔53-2位於第一差動對110及第二差動對120之間。換言之,這些導電通孔53-2沿著第一差動對110於第二圖案化導電層51-2的第一開口160a內延伸方向,延伸配置;這些導電通孔53-2沿著第二差動對120於第二圖案化導電層51-2的第二開口160b內延伸方向,延伸配置。值得一提的是,這些導電通孔53-2位在第一差動對110及第二差動對120旁,或位在第一差動對110及第二差動對120之間,將有助於提升第一接地平面150及第二接地平面160的屏蔽效果。Referring to FIG. 3 and FIG. 4 , some conductive vias 53 - 2 are located beside the first differential pair 110 and the second differential pair 120 . In addition, some of the conductive vias 53-2 are located between the first differential pair 110 and the second differential pair 120. In other words, the conductive vias 53-2 extend along the extending direction of the first differential pair 110 in the first opening 160a of the second patterned conductive layer 51-2; the conductive vias 53-2 are along the second The differential pair 120 extends in a direction extending in the second opening 160b of the second patterned conductive layer 51-2. It is worth mentioning that the conductive vias 53-2 are located beside the first differential pair 110 and the second differential pair 120, or between the first differential pair 110 and the second differential pair 120, It helps to improve the shielding effect of the first ground plane 150 and the second ground plane 160.

此外,在本實施例中,第一差動對110可為相容於USB 3.0或USB 3.1的一傳送差動對Tx+及Tx-。第二差動對120可為相容於USB 3.0或USB 3.1的一接收差動對Rx+及Rx-,且第三差動對130可為相容於USB 1.0或USB 2.0的一傳送/接收差動對D+及D-。並且,將第一差動對110、第二差動對120的主要延伸走線T2配置在第二圖案化導電層51-2,將第三差動對130的主要延伸走線T1配置在第一圖案化導電層51-1。換言之,第一差動對110、第二差動對120位在作為接地的同一層,第一差動對110或第二差動對120與第三差動對130位在不同層。因此,當第一差動對110及第二差動對120於傳輸USB 3.0或USB 3.1的訊號(時脈頻率約2.5GHz)時,所產生對外的干擾(例如電磁干擾/射頻干擾)可受到第一接地平面150的垂直遮擋及第二接地平面160的水平遮擋而降低。此外,第三差動對130由於傳輸USB 1.0或USB 2.0的訊號,較無特定頻率干擾的問題,因此可以如同現有技術配置於最上層(如:本案的第一圖案化導電層51-1)。Moreover, in the present embodiment, the first differential pair 110 can be a transmit differential pair Tx+ and Tx- compatible with USB 3.0 or USB 3.1. The second differential pair 120 can be a receiving differential pair Rx+ and Rx- compatible with USB 3.0 or USB 3.1, and the third differential pair 130 can be a transmission/reception difference compatible with USB 1.0 or USB 2.0. Move to D+ and D-. Further, the first extension pair 110 and the main extension trace T2 of the second differential pair 120 are disposed on the second patterned conductive layer 51-2, and the main extension trace T1 of the third differential pair 130 is disposed in the first A patterned conductive layer 51-1 is patterned. In other words, the first differential pair 110 and the second differential pair 120 are in the same layer as the ground, and the first differential pair 110 or the second differential pair 120 and the third differential pair 130 are in different layers. Therefore, when the first differential pair 110 and the second differential pair 120 transmit a USB 3.0 or USB 3.1 signal (a clock frequency of about 2.5 GHz), external interference (such as electromagnetic interference/radio frequency interference) may be received. The vertical occlusion of the first ground plane 150 and the horizontal occlusion of the second ground plane 160 are reduced. In addition, the third differential pair 130 has a problem of no specific frequency interference due to the transmission of the USB 1.0 or USB 2.0 signal, and thus can be configured on the uppermost layer as in the prior art (eg, the first patterned conductive layer 51-1 of the present case). .

請再參考圖1、圖3及圖4,在本實施例中,電連接器14可插接對應於一無線滑鼠30的一無線模組20。無線模組20與無線滑鼠30之間以無線方式來傳輸訊號。當圖4之第一差動對110及該第二差動對120所傳輸訊號的時脈頻率(2.5 GHz)實質上等於或接近無線模組20的操作頻率(2.4 GHz)時,第一差動對110及該第二差動對120所產生的電磁波將可受到第一接地平面150的垂直遮擋及第二接地平面160的水平遮擋,以降低對無線模組20的射頻干擾,使得無線滑鼠30能正常運作。Referring to FIG. 1 , FIG. 3 and FIG. 4 , in the embodiment, the electrical connector 14 can be plugged into a wireless module 20 corresponding to a wireless mouse 30 . The wireless module 20 and the wireless mouse 30 wirelessly transmit signals. When the clock frequency (2.5 GHz) of the signal transmitted by the first differential pair 110 and the second differential pair 120 of FIG. 4 is substantially equal to or close to the operating frequency (2.4 GHz) of the wireless module 20, the first difference is The electromagnetic waves generated by the movable pair 110 and the second differential pair 120 may be vertically blocked by the first ground plane 150 and horizontally blocked by the second ground plane 160 to reduce radio frequency interference to the wireless module 20, so that the wireless sliding Rat 30 can function normally.

綜上所述,在本發明中,將原先設置在非接地的圖案化導電層的第一差動對及第二差動調整至用於接地的圖案化導電層,並藉由第一接地平面的垂直遮擋及第二接地平面的水平遮擋,以降低第一差動對及第二差動於傳輸訊號時所產生對外的干擾。In summary, in the present invention, the first differential pair and the second differential originally disposed on the ungrounded patterned conductive layer are adjusted to the patterned conductive layer for grounding, and by the first ground plane The vertical occlusion and the horizontal occlusion of the second ground plane reduce the external interference caused by the first differential pair and the second differential when transmitting the signal.

對於採用USB 3.0(時脈頻率在2.5 GHz)作為傳輸協定的裝置(例如集線器)及現行操作頻率在2.5 GHz的裝置而言,本發明可降低裝置本身所產生對外的干擾,以降低對操作頻率在2.4 GHz(接近2.5 GHz)的無線裝置(例如無線滑鼠的無線模組)的射頻干擾。For devices using USB 3.0 (clock frequency at 2.5 GHz) as a transport protocol (such as a hub) and devices with a current operating frequency of 2.5 GHz, the present invention can reduce the external interference generated by the device itself to reduce the operating frequency. Radio frequency interference at 2.4 GHz (close to 2.5 GHz) wireless devices (such as wireless modules for wireless mice).

雖然本發明已以實施例揭露如上,然其並非用以限定本發明,任何所屬技術領域中具有通常知識者,在不脫離本發明的精神和範圍內,當可作些許的更動與潤飾,故本發明的保護範圍當視後附的申請專利範圍所界定者為準。Although the present invention has been disclosed in the above embodiments, it is not intended to limit the present invention, and any one of ordinary skill in the art can make some changes and refinements without departing from the spirit and scope of the present invention. The scope of the invention is defined by the scope of the appended claims.

10‧‧‧電子總成
12‧‧‧晶片
14‧‧‧電連接器
20‧‧‧無線模組
30‧‧‧無線滑鼠
50‧‧‧線路板
50a‧‧‧晶片區
50b‧‧‧端口區
50c‧‧‧元件區
51-1‧‧‧第一圖案化導電層
51-2‧‧‧第二圖案化導電層
51-3‧‧‧第三圖案化導電層
51-4‧‧‧第四圖案化導電層
52-0‧‧‧介電核心層
52-1‧‧‧第一介電層
52-2‧‧‧第二介電層
52-3‧‧‧第一銲罩層
52-4‧‧‧第二銲罩層
53-1‧‧‧導電通孔
53-2‧‧‧導電通孔
53-3‧‧‧導電通孔
100‧‧‧線路佈局結構
110‧‧‧第一差動對
120‧‧‧第二差動對
130‧‧‧第三差動對
150‧‧‧第一接地平面
160‧‧‧第二接地平面
160a‧‧‧第一開口
160b‧‧‧第二開口
G‧‧‧接地平面
T1、T2‧‧‧走線
10‧‧‧Electronic assembly
12‧‧‧ wafer
14‧‧‧Electrical connector
20‧‧‧Wireless Module
30‧‧‧Wireless mouse
50‧‧‧ circuit board
50a‧‧‧ wafer area
50b‧‧‧Port Area
50c‧‧‧Component area
51-1‧‧‧First patterned conductive layer
51-2‧‧‧Second patterned conductive layer
51-3‧‧‧ Third patterned conductive layer
51-4‧‧‧The fourth patterned conductive layer
52-0‧‧‧ dielectric core layer
52-1‧‧‧First dielectric layer
52-2‧‧‧Second dielectric layer
52-3‧‧‧First welding cap layer
52-4‧‧‧Second welding cap
53-1‧‧‧ conductive through hole
53-2‧‧‧ conductive through hole
53-3‧‧‧Electrical through hole
100‧‧‧Line layout structure
110‧‧‧First differential pair
120‧‧‧Second differential pair
130‧‧‧ third differential pair
150‧‧‧First ground plane
160‧‧‧Second ground plane
160a‧‧‧first opening
160b‧‧‧ second opening
G‧‧‧ Ground plane
T1, T2‧‧‧ trace

圖1是本發明的一實施例的一種電子總成的示意圖。 圖2是圖1的線路板的剖面示意圖。 圖3是圖2的第一圖案化導電層的局部平面示意圖。 圖4是圖2的第二圖案化導電層的局部平面示意圖。 圖5是圖1的第一差動對之一訊號路徑的局部平面示意圖。 圖6是圖1的第三差動對之一訊號路徑的局部平面示意圖。1 is a schematic diagram of an electronic assembly in accordance with an embodiment of the present invention. 2 is a schematic cross-sectional view of the wiring board of FIG. 1. 3 is a partial plan view of the first patterned conductive layer of FIG. 2. 4 is a partial plan view of the second patterned conductive layer of FIG. 2. FIG. 5 is a partial plan view showing a signal path of the first differential pair of FIG. 1. FIG. 6 is a partial plan view showing a signal path of the third differential pair of FIG. 1.

50a‧‧‧晶片區 50a‧‧‧ wafer area

50b‧‧‧端口區 50b‧‧‧Port Area

50c‧‧‧元件區 50c‧‧‧Component area

51-1‧‧‧第一圖案化導電層 51-1‧‧‧First patterned conductive layer

53-2‧‧‧導電通孔 53-2‧‧‧ conductive through hole

100‧‧‧線路佈局結構 100‧‧‧Line layout structure

110‧‧‧第一差動對 110‧‧‧First differential pair

120‧‧‧第二差動對 120‧‧‧Second differential pair

130‧‧‧第三差動對 130‧‧‧ third differential pair

150‧‧‧第一接地平面 150‧‧‧First ground plane

T1‧‧‧走線 T1‧‧‧Wiring

Claims (22)

一種線路佈局結構,適用於一線路板,該線路板具有一晶片區、一端口區、一第一圖案化導電層、一第二圖案化導電層、一介電層及多個導電通孔,該第一圖案化導電層及該第二圖案化導電層以該介電層分隔,該些導電通孔電性連接該第一圖案化導電層及該第二圖案化導電層,該線路佈局結構包括: 一第一差動對,經由該第一圖案化導電層從該晶片區內延伸至該晶片區外,該第一差動對經由該第二圖案化導電層在該晶片區與該端口區之間延伸; 一第二差動對,經由該第一圖案化導電層從該晶片區內延伸至該晶片區外,該第二差動對經由該第二圖案化導電層在該晶片區與該端口區之間延伸; 一第一接地平面,構成自該第一圖案化導電層,該第一差動對在該第二圖案化導電層上的正投影重疊於該第一接地平面,且該第二差動對在該第二圖案化導電層上的正投影重疊於該第一接地平面;以及 一第二接地平面,構成自該第二圖案化導電層,並具有一第一開口及一第二開口,該第一差動對及該第二差動對經由該第二圖案化導電層分別在該第一開口及該第二開口內延伸。A circuit layout structure is applicable to a circuit board having a wafer area, a port area, a first patterned conductive layer, a second patterned conductive layer, a dielectric layer and a plurality of conductive vias. The first patterned conductive layer and the second patterned conductive layer are separated by the dielectric layer, and the conductive vias are electrically connected to the first patterned conductive layer and the second patterned conductive layer, and the circuit layout structure The method includes: a first differential pair extending from the wafer region to the outside of the wafer region via the first patterned conductive layer, the first differential pair being in the wafer region and the port via the second patterned conductive layer Extending between the regions; a second differential pair extending from the wafer region to the outside of the wafer region via the first patterned conductive layer, the second differential pair being in the wafer region via the second patterned conductive layer Extending from the port region; a first ground plane formed from the first patterned conductive layer, an orthographic projection of the first differential pair on the second patterned conductive layer overlapping the first ground plane, And the second differential pair is on the second patterned conductive layer The front projection overlaps the first ground plane; and a second ground plane is formed from the second patterned conductive layer and has a first opening and a second opening, the first differential pair and the second The differential pair extends within the first opening and the second opening via the second patterned conductive layer. 如申請專利範圍第1項所述的線路佈局結構,更包括一第三差動對,該第三差動對與該第一差動對及/或第二差動對分別配置在不同層。The circuit layout structure of claim 1, further comprising a third differential pair, wherein the third differential pair and the first differential pair and/or the second differential pair are respectively disposed in different layers. 如申請專利範圍第2項所述的線路佈局結構,其中該第一差動對為相容於USB 3.0或USB 3.1的一傳送差動對Tx+及Tx-,該第二差動對為相容於USB 3.0或USB 3.1的一接收差動對Rx+及Rx-,且該第三差動對為相容於USB 1.0或USB 2.0的一傳送/接收差動對D+及D-。The line layout structure according to claim 2, wherein the first differential pair is a transmission differential pair Tx+ and Tx- compatible with USB 3.0 or USB 3.1, and the second differential pair is compatible. A differential pair Rx+ and Rx- is received in USB 3.0 or USB 3.1, and the third differential pair is a transmit/receive differential pair D+ and D- compatible with USB 1.0 or USB 2.0. 如申請專利範圍第1項所述的線路佈局結構,其中該些導電通孔位於該第一差動對及該第二差動對旁、該些導電通孔位於該第一差動對及該第二差動對之間或二者之組合。The circuit layout structure of claim 1, wherein the conductive vias are located adjacent to the first differential pair and the second differential pair, the conductive vias are located in the first differential pair and the A combination of the second differential pair or a combination of the two. 如申請專利範圍第1項所述的線路佈局結構,其中該第一差動對經由該第一圖案化導線層從該端口區外延伸至該端口區內,且該第二差動對經由該第一圖案化導線層從該端口區外延伸至該端口區內。The circuit layout structure of claim 1, wherein the first differential pair extends from outside the port area to the port area via the first patterned wire layer, and the second differential pair passes through the A first patterned wire layer extends from outside the port region to the port region. 如申請專利範圍第1項所述的線路佈局結構,其中該第二接地平面的一部分位於該第一差動對與該第二差動對之間。The circuit layout structure of claim 1, wherein a portion of the second ground plane is between the first differential pair and the second differential pair. 一種線路板,適用於安裝一晶片及一電連接器,該線路板具有安裝該晶片的一晶片區及安裝該電連接器的一端口區,該線路板包括: 多個圖案化導電層,包括一第一圖案化導電層及一第二圖案化導電層,其中該第一圖案化導電層位在該些圖案化導電層的最外側,且該第二圖案化導電層與該第一圖案化導電層相鄰; 多個介電層,與該些圖案化導電層交替疊合; 多個導電通孔,穿過該些介電層,以連接該些圖案化導電層;以及 一線路佈局結構,包括: 一第一差動對,經由該第一圖案化導電層從該晶片區內延伸至該晶片區外,該第一差動對經由該第二圖案化導電層在該晶片區與該端口區之間延伸; 一第二差動對,經由該第一圖案化導電層從該晶片區內延伸至該晶片區外,該第二差動對經由該第二圖案化導電層在該晶片區與該端口區之間延伸; 一第一接地平面,構成自該第一圖案化導電層,該第一差動對在該第二圖案化導電層上的正投影重疊於該第一接地平面,且該第二差動對在該第二圖案化導電層上的正投影重疊於該第一接地平面;以及 一第二接地平面,構成自該第二圖案化導電層,並具有一第一開口及一第二開口,該第一差動對及該第二差動對經由該第二圖案化導電層分別在該第一開口及該第二開口內延伸。A circuit board suitable for mounting a chip and an electrical connector, the circuit board having a wafer area on which the wafer is mounted and a port area on which the electrical connector is mounted, the circuit board comprising: a plurality of patterned conductive layers, including a first patterned conductive layer and a second patterned conductive layer, wherein the first patterned conductive layer is located at an outermost side of the patterned conductive layers, and the second patterned conductive layer and the first patterned Adjacent to the conductive layer; a plurality of dielectric layers alternately overlapping the patterned conductive layers; a plurality of conductive vias passing through the dielectric layers to connect the patterned conductive layers; and a line layout structure The method includes: a first differential pair extending from the wafer region to the outside of the wafer region via the first patterned conductive layer, the first differential pair being in the wafer region via the second patterned conductive layer Extending between the port regions; a second differential pair extending from the wafer region to the outside of the wafer region via the first patterned conductive layer, the second differential pair being on the wafer via the second patterned conductive layer Extending between the zone and the port zone; a ground plane formed from the first patterned conductive layer, an orthographic projection of the first differential pair on the second patterned conductive layer is overlapped with the first ground plane, and the second differential pair is at the second An orthographic projection on the patterned conductive layer is overlapped with the first ground plane; and a second ground plane is formed from the second patterned conductive layer and has a first opening and a second opening, the first differential And the second differential pair extends through the second patterned conductive layer in the first opening and the second opening, respectively. 如申請專利範圍第7項所述的線路板,該線路佈局結構更包括一第三差動對,該第三差動對與該第一差動對及/或第二差動對分別配置在不同層。The circuit board structure of claim 7 further comprising a third differential pair, wherein the third differential pair and the first differential pair and/or the second differential pair are respectively disposed at Different layers. 如申請專利範圍第8項所述的線路板,其中該第一差動對為相容於USB 3.0或USB 3.1的一傳送差動對Tx+及Tx-,該第二差動對為相容於USB 3.0或USB 3.1的一接收差動對Rx+及Rx-,且該第三差動對為相容於USB 1.0或USB 2.0的一傳送/接收差動對D+及D-。The circuit board of claim 8, wherein the first differential pair is a transmission differential pair Tx+ and Tx- compatible with USB 3.0 or USB 3.1, and the second differential pair is compatible with A receiving differential pair Rx+ and Rx- of USB 3.0 or USB 3.1, and the third differential pair is a transmit/receive differential pair D+ and D- compatible with USB 1.0 or USB 2.0. 如申請專利範圍第7項所述的線路板,其中該些導電通孔位於該第一差動對及該第二差動對旁、該些導電通孔位於該第一差動對及該第二差動對之間或二者之組合。The circuit board of claim 7, wherein the conductive vias are located adjacent to the first differential pair and the second differential pair, and the conductive vias are located in the first differential pair and the first A combination of two differential pairs or a combination of the two. 如申請專利範圍第7項所述的線路板,其中該第一差動對經由該第一圖案化導線層從該端口區外延伸至該端口區內,且該第二差動對經由該第一圖案化導線層從該端口區外延伸至該端口區內。The circuit board of claim 7, wherein the first differential pair extends from outside the port area to the port area via the first patterned wire layer, and the second differential pair is via the first A patterned wire layer extends from outside the port region to the port region. 如申請專利範圍第7項所述的線路板,其中該第二接地平面的一部分位於該第一差動對與該第二差動對之間。The circuit board of claim 7, wherein a portion of the second ground plane is between the first differential pair and the second differential pair. 如申請專利範圍第7項所述的線路板,其中該些圖案化導電層更包括一第三圖案化導電層及一第四圖案化導電層,該些介電層包括一介電核心層、一第一介電層及一第二介電層,該第一介電層位於該第一圖案化導電層與該第二圖案化導電層之間,該介電核心層位於該第二圖案化導電層與該第三圖案化導電層之間,該第二介電層位於該第三圖案化導電層之間與該第四圖案化導電層之間,且該介電核心層的厚度大於該第一介電層及該第二介電層的厚度。The circuit board of claim 7, wherein the patterned conductive layer further comprises a third patterned conductive layer and a fourth patterned conductive layer, the dielectric layers comprising a dielectric core layer, a first dielectric layer and a second dielectric layer, the first dielectric layer is between the first patterned conductive layer and the second patterned conductive layer, and the dielectric core layer is located in the second patterned Between the conductive layer and the third patterned conductive layer, the second dielectric layer is located between the third patterned conductive layer and the fourth patterned conductive layer, and the thickness of the dielectric core layer is greater than the The thickness of the first dielectric layer and the second dielectric layer. 如申請專利範圍第13項所述的線路板,其中該第三圖案化導電層實質上構成一電源平面。The circuit board of claim 13, wherein the third patterned conductive layer substantially constitutes a power plane. 一種電子總成,包括: 一線路板,具有一晶片區及一端口區,該線路板包括: 多個圖案化導電層,包括一第一圖案化導電層及一第二圖案化導電層,其中該第一圖案化導電層位在該些圖案化導電層的最外側,且該第二圖案化導電層與該第一圖案化導電層相鄰; 多個介電層,與該些圖案化導電層交替疊合; 多個導電通孔,穿過該些介電層,以連接該些圖案化導電層;以及 一線路佈局結構,包括: 一第一差動對,經由該第一圖案化導電層從該晶片區內延伸至該晶片區外,該第一差動對經由該第二圖案化導電層在該晶片區與該端口區之間延伸,且該第一差動對經由該第一圖案化導線層從該端口區外延伸至該端口區內; 一第二差動對,經由該第一圖案化導電層從該晶片區內延伸至該晶片區外,該第二差動對經由該第二圖案化導電層在該晶片區與該端口區之間延伸,且該第二差動對經由該第一圖案化導線層從該端口區外延伸至該端口區內; 一第一接地平面,構成自該第一圖案化導電層,該第一差動對在該第二圖案化導電層上的正投影重疊於該第一接地平面,且該第二差動對在該第二圖案化導電層上的正投影重疊於該第一接地平面;以及 一第二接地平面,構成自該第二圖案化導電層,並具有一第一開口及一第二開口,該第一差動對及該第二差動對經由該第二圖案化導電層分別在該第一開口及該第二開口內延伸; 一晶片,安裝在該線路板的該晶片區;以及 一電連接器,安裝在該線路板的該端口區。An electronic assembly comprising: a circuit board having a wafer area and a port area, the circuit board comprising: a plurality of patterned conductive layers, including a first patterned conductive layer and a second patterned conductive layer, wherein The first patterned conductive layer is located at an outermost side of the patterned conductive layers, and the second patterned conductive layer is adjacent to the first patterned conductive layer; a plurality of dielectric layers, and the patterned conductive layers The layers are alternately stacked; a plurality of conductive vias passing through the dielectric layers to connect the patterned conductive layers; and a line layout structure comprising: a first differential pair via which the first patterned conductive a layer extending from the wafer region to outside the wafer region, the first differential pair extending between the wafer region and the port region via the second patterned conductive layer, and the first differential pair is via the first a patterned wire layer extending from outside the port region to the port region; a second differential pair extending from the wafer region to the outside of the wafer region via the first patterned conductive layer, the second differential pair being The second patterned conductive layer is in the wafer area and the port Extending between the regions, and the second differential pair extends from outside the port region to the port region via the first patterned wire layer; a first ground plane formed from the first patterned conductive layer, the first An orthographic projection of a differential pair on the second patterned conductive layer overlaps the first ground plane, and an orthographic projection of the second differential pair on the second patterned conductive layer overlaps the first ground plane And a second ground plane formed from the second patterned conductive layer and having a first opening and a second opening, the first differential pair and the second differential pair being electrically conductive via the second pattern Layers extend in the first opening and the second opening, respectively; a wafer mounted on the wafer area of the circuit board; and an electrical connector mounted in the port area of the circuit board. 如申請專利範圍第15項所述的電子總成,其中該線路佈局結構更包括一第三差動對,該第三差動對與該第一差動對及/或第二差動對分別配置在不同層。The electronic assembly of claim 15, wherein the line layout structure further comprises a third differential pair, the third differential pair and the first differential pair and/or the second differential pair respectively Configured at different layers. 如申請專利範圍第16項所述的電子總成,其中該第一差動對為相容於USB 3.0或USB 3.1的一傳送差動對Tx+及Tx-,該第二差動對為相容於USB 3.0或USB 3.1的一接收差動對Rx+及Rx-,且該第三差動對為相容於USB 1.0或USB 2.0的一傳送/接收差動對D+及D-。The electronic assembly of claim 16, wherein the first differential pair is a transmission differential pair Tx+ and Tx- compatible with USB 3.0 or USB 3.1, the second differential pair being compatible A differential pair Rx+ and Rx- is received in USB 3.0 or USB 3.1, and the third differential pair is a transmit/receive differential pair D+ and D- compatible with USB 1.0 or USB 2.0. 如申請專利範圍第15項所述的電子總成,其中該些導電通孔位於該第一差動對及該第二差動對旁、該些導電通孔位於該第一差動對及該第二差動對之間或二者之組合。The electronic assembly of claim 15, wherein the conductive vias are located adjacent to the first differential pair and the second differential pair, the conductive vias are located at the first differential pair and A combination of the second differential pair or a combination of the two. 如申請專利範圍第15項所述的電子總成,其中該第一差動對經由該第一圖案化導線層從該端口區外延伸至該端口區內,且該第二差動對經由該第一圖案化導線層從該端口區外延伸至該端口區內。The electronic assembly of claim 15, wherein the first differential pair extends from outside the port region to the port region via the first patterned wire layer, and the second differential pair passes through the port A first patterned wire layer extends from outside the port region to the port region. 如申請專利範圍第15項所述的電子總成,其中該第二接地平面的一部分位於該第一差動對與該第二差動對之間。The electronic assembly of claim 15, wherein a portion of the second ground plane is between the first differential pair and the second differential pair. 如申請專利範圍第15項所述的電子總成,其中該些圖案化導電層更包括一第三圖案化導電層及一第四圖案化導電層,該些介電層包括一介電核心層、一第一介電層及一第二介電層,該第一介電層位於該第一圖案化導電層與該第二圖案化導電層之間,該介電核心層位於該第二圖案化導電層與該第三圖案化導電層之間,該第二介電層位於該第三圖案化導電層之間與該第四圖案化導電層之間,且該介電核心層的厚度大於該第一介電層及該第二介電層的厚度。The electronic assembly of claim 15, wherein the patterned conductive layer further comprises a third patterned conductive layer and a fourth patterned conductive layer, the dielectric layers comprising a dielectric core layer a first dielectric layer and a second dielectric layer, the first dielectric layer is between the first patterned conductive layer and the second patterned conductive layer, and the dielectric core layer is located in the second pattern Between the conductive layer and the third patterned conductive layer, the second dielectric layer is located between the third patterned conductive layer and the fourth patterned conductive layer, and the thickness of the dielectric core layer is greater than The thickness of the first dielectric layer and the second dielectric layer. 如申請專利範圍第15項所述的電子總成,其中該電連接器適於插接一無線模組,且該無線模組的操作頻率實質上相同於該第一差動對或該第二差動對所傳輸訊號的時脈頻率。The electronic assembly of claim 15, wherein the electrical connector is adapted to be plugged into a wireless module, and the operating frequency of the wireless module is substantially the same as the first differential pair or the second The clock frequency of the transmitted signal.
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