TW201625354A - Methods for producing borylated arenes - Google Patents
Methods for producing borylated arenes Download PDFInfo
- Publication number
- TW201625354A TW201625354A TW104119247A TW104119247A TW201625354A TW 201625354 A TW201625354 A TW 201625354A TW 104119247 A TW104119247 A TW 104119247A TW 104119247 A TW104119247 A TW 104119247A TW 201625354 A TW201625354 A TW 201625354A
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- Taiwan
- Prior art keywords
- group
- independently
- alkyl
- occurrence
- hydrogen
- Prior art date
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- 238000000034 method Methods 0.000 title claims abstract description 87
- 150000004945 aromatic hydrocarbons Chemical class 0.000 title description 5
- 241001120493 Arene Species 0.000 title 1
- 150000001491 aromatic compounds Chemical class 0.000 claims abstract description 48
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 claims abstract description 27
- 125000003118 aryl group Chemical group 0.000 claims description 283
- 150000004700 cobalt complex Chemical class 0.000 claims description 187
- 125000004169 (C1-C6) alkyl group Chemical group 0.000 claims description 147
- 239000001257 hydrogen Substances 0.000 claims description 135
- 229910052739 hydrogen Inorganic materials 0.000 claims description 135
- 230000003197 catalytic effect Effects 0.000 claims description 131
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims description 101
- 229910052736 halogen Inorganic materials 0.000 claims description 96
- 150000002367 halogens Chemical class 0.000 claims description 96
- 125000000171 (C1-C6) haloalkyl group Chemical group 0.000 claims description 93
- 125000002560 nitrile group Chemical group 0.000 claims description 77
- 239000011159 matrix material Substances 0.000 claims description 69
- 239000003153 chemical reaction reagent Substances 0.000 claims description 64
- -1 aryl compound Chemical class 0.000 claims description 53
- 150000004820 halides Chemical class 0.000 claims description 47
- 229910052796 boron Inorganic materials 0.000 claims description 41
- 125000001424 substituent group Chemical group 0.000 claims description 41
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 claims description 40
- 150000001875 compounds Chemical class 0.000 claims description 35
- 125000004432 carbon atom Chemical group C* 0.000 claims description 34
- 150000002431 hydrogen Chemical class 0.000 claims description 33
- 239000003446 ligand Substances 0.000 claims description 32
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims description 32
- 150000001642 boronic acid derivatives Chemical class 0.000 claims description 29
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Natural products CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 claims description 26
- PXBRQCKWGAHEHS-UHFFFAOYSA-N dichlorodifluoromethane Chemical compound FC(F)(Cl)Cl PXBRQCKWGAHEHS-UHFFFAOYSA-N 0.000 claims description 24
- CYRMSUTZVYGINF-UHFFFAOYSA-N trichlorofluoromethane Chemical compound FC(Cl)(Cl)Cl CYRMSUTZVYGINF-UHFFFAOYSA-N 0.000 claims description 24
- 125000001072 heteroaryl group Chemical group 0.000 claims description 23
- 125000000217 alkyl group Chemical group 0.000 claims description 22
- 150000002825 nitriles Chemical class 0.000 claims description 18
- ZADPBFCGQRWHPN-UHFFFAOYSA-N boronic acid Chemical compound OBO ZADPBFCGQRWHPN-UHFFFAOYSA-N 0.000 claims description 17
- KGBXLFKZBHKPEV-UHFFFAOYSA-N boric acid Chemical class OB(O)O KGBXLFKZBHKPEV-UHFFFAOYSA-N 0.000 claims description 15
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims description 13
- 150000002390 heteroarenes Chemical class 0.000 claims description 12
- 229910052760 oxygen Inorganic materials 0.000 claims description 11
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 9
- PIGFYZPCRLYGLF-UHFFFAOYSA-N Aluminum nitride Chemical compound [Al]#N PIGFYZPCRLYGLF-UHFFFAOYSA-N 0.000 claims description 8
- 125000004076 pyridyl group Chemical group 0.000 claims description 8
- XLJKHNWPARRRJB-UHFFFAOYSA-N cobalt(2+) Chemical compound [Co+2] XLJKHNWPARRRJB-UHFFFAOYSA-N 0.000 claims description 7
- 230000015572 biosynthetic process Effects 0.000 claims description 5
- 238000006467 substitution reaction Methods 0.000 claims description 5
- 125000003107 substituted aryl group Chemical group 0.000 claims description 3
- 235000000621 Bidens tripartita Nutrition 0.000 claims 1
- 240000004082 Bidens tripartita Species 0.000 claims 1
- 208000006637 fused teeth Diseases 0.000 claims 1
- 239000003054 catalyst Substances 0.000 abstract description 30
- 229910017052 cobalt Inorganic materials 0.000 abstract description 14
- 239000010941 cobalt Substances 0.000 abstract description 13
- 238000006795 borylation reaction Methods 0.000 abstract description 3
- 238000006243 chemical reaction Methods 0.000 description 89
- IVSZLXZYQVIEFR-UHFFFAOYSA-N m-xylene Chemical group CC1=CC=CC(C)=C1 IVSZLXZYQVIEFR-UHFFFAOYSA-N 0.000 description 78
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 44
- 239000000047 product Substances 0.000 description 39
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 38
- LZPWAYBEOJRFAX-UHFFFAOYSA-N 4,4,5,5-tetramethyl-1,3,2$l^{2}-dioxaborolane Chemical compound CC1(C)O[B]OC1(C)C LZPWAYBEOJRFAX-UHFFFAOYSA-N 0.000 description 37
- 238000004817 gas chromatography Methods 0.000 description 30
- 229910052757 nitrogen Inorganic materials 0.000 description 23
- 239000000203 mixture Substances 0.000 description 18
- 239000011541 reaction mixture Substances 0.000 description 17
- 238000005481 NMR spectroscopy Methods 0.000 description 15
- 239000012190 activator Substances 0.000 description 12
- 238000006880 cross-coupling reaction Methods 0.000 description 11
- 239000004327 boric acid Substances 0.000 description 10
- 239000000758 substrate Substances 0.000 description 10
- YLQBMQCUIZJEEH-UHFFFAOYSA-N Furan Chemical compound C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 9
- 238000004458 analytical method Methods 0.000 description 9
- JUJWROOIHBZHMG-UHFFFAOYSA-N pyridine Substances C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 9
- 239000013522 chelant Substances 0.000 description 8
- 238000002474 experimental method Methods 0.000 description 8
- 239000011521 glass Substances 0.000 description 8
- 125000001188 haloalkyl group Chemical group 0.000 description 8
- 150000002894 organic compounds Chemical class 0.000 description 8
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 7
- 238000002290 gas chromatography-mass spectrometry Methods 0.000 description 7
- 125000005842 heteroatom Chemical group 0.000 description 7
- 239000011777 magnesium Substances 0.000 description 7
- UHOVQNZJYSORNB-UHFFFAOYSA-N monobenzene Natural products C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 7
- 239000001301 oxygen Substances 0.000 description 7
- 150000003254 radicals Chemical class 0.000 description 7
- 239000000376 reactant Substances 0.000 description 7
- OISVCGZHLKNMSJ-UHFFFAOYSA-N 2,6-dimethylpyridine Chemical compound CC1=CC=CC(C)=N1 OISVCGZHLKNMSJ-UHFFFAOYSA-N 0.000 description 6
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 6
- YTPLMLYBLZKORZ-UHFFFAOYSA-N Divinylene sulfide Natural products C=1C=CSC=1 YTPLMLYBLZKORZ-UHFFFAOYSA-N 0.000 description 6
- 150000001543 aryl boronic acids Chemical class 0.000 description 6
- IPWKHHSGDUIRAH-UHFFFAOYSA-N bis(pinacolato)diboron Chemical compound O1C(C)(C)C(C)(C)OB1B1OC(C)(C)C(C)(C)O1 IPWKHHSGDUIRAH-UHFFFAOYSA-N 0.000 description 6
- 239000003795 chemical substances by application Substances 0.000 description 6
- SNRUBQQJIBEYMU-UHFFFAOYSA-N dodecane Chemical compound CCCCCCCCCCCC SNRUBQQJIBEYMU-UHFFFAOYSA-N 0.000 description 6
- 150000002148 esters Chemical class 0.000 description 6
- AIGRXSNSLVJMEA-FQEVSTJZSA-N ethoxy-(4-nitrophenoxy)-phenyl-sulfanylidene-$l^{5}-phosphane Chemical compound O([P@@](=S)(OCC)C=1C=CC=CC=1)C1=CC=C([N+]([O-])=O)C=C1 AIGRXSNSLVJMEA-FQEVSTJZSA-N 0.000 description 6
- 238000010438 heat treatment Methods 0.000 description 6
- HFPZCAJZSCWRBC-UHFFFAOYSA-N p-cymene Chemical compound CC(C)C1=CC=C(C)C=C1 HFPZCAJZSCWRBC-UHFFFAOYSA-N 0.000 description 6
- LPNYRYFBWFDTMA-UHFFFAOYSA-N potassium tert-butoxide Chemical compound [K+].CC(C)(C)[O-] LPNYRYFBWFDTMA-UHFFFAOYSA-N 0.000 description 6
- 239000002904 solvent Substances 0.000 description 6
- 229920002554 vinyl polymer Polymers 0.000 description 6
- ADLVDYMTBOSDFE-UHFFFAOYSA-N 5-chloro-6-nitroisoindole-1,3-dione Chemical compound C1=C(Cl)C([N+](=O)[O-])=CC2=C1C(=O)NC2=O ADLVDYMTBOSDFE-UHFFFAOYSA-N 0.000 description 5
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 5
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 5
- 125000003545 alkoxy group Chemical group 0.000 description 5
- 125000003277 amino group Chemical group 0.000 description 5
- 125000005843 halogen group Chemical group 0.000 description 5
- 229910052751 metal Inorganic materials 0.000 description 5
- 239000002184 metal Substances 0.000 description 5
- 230000008569 process Effects 0.000 description 5
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 5
- 230000009257 reactivity Effects 0.000 description 5
- 238000003786 synthesis reaction Methods 0.000 description 5
- 239000011701 zinc Substances 0.000 description 5
- KWKAKUADMBZCLK-UHFFFAOYSA-N 1-octene Chemical compound CCCCCCC=C KWKAKUADMBZCLK-UHFFFAOYSA-N 0.000 description 4
- WEVYAHXRMPXWCK-UHFFFAOYSA-N Acetonitrile Chemical compound CC#N WEVYAHXRMPXWCK-UHFFFAOYSA-N 0.000 description 4
- OAKJQQAXSVQMHS-UHFFFAOYSA-N Hydrazine Chemical compound NN OAKJQQAXSVQMHS-UHFFFAOYSA-N 0.000 description 4
- 125000003282 alkyl amino group Chemical group 0.000 description 4
- 125000003943 azolyl group Chemical group 0.000 description 4
- 229910052799 carbon Inorganic materials 0.000 description 4
- 125000000753 cycloalkyl group Chemical group 0.000 description 4
- ZUOUZKKEUPVFJK-UHFFFAOYSA-N diphenyl Chemical compound C1=CC=CC=C1C1=CC=CC=C1 ZUOUZKKEUPVFJK-UHFFFAOYSA-N 0.000 description 4
- 150000004795 grignard reagents Chemical class 0.000 description 4
- 125000004438 haloalkoxy group Chemical group 0.000 description 4
- FRIJBUGBVQZNTB-UHFFFAOYSA-M magnesium;ethane;bromide Chemical compound [Mg+2].[Br-].[CH2-]C FRIJBUGBVQZNTB-UHFFFAOYSA-M 0.000 description 4
- 239000000463 material Substances 0.000 description 4
- 229930192474 thiophene Natural products 0.000 description 4
- WYBQOWXCLDXZNR-UHFFFAOYSA-N 2-(1,3,2-benzodioxaborol-2-yl)-1,3,2-benzodioxaborole Chemical compound O1C2=CC=CC=C2OB1B1OC2=CC=CC=C2O1 WYBQOWXCLDXZNR-UHFFFAOYSA-N 0.000 description 3
- MDNDJMCSXOXBFZ-UHFFFAOYSA-N 2-(5,5-dimethyl-1,3,2-dioxaborinan-2-yl)-5,5-dimethyl-1,3,2-dioxaborinane Chemical compound O1CC(C)(C)COB1B1OCC(C)(C)CO1 MDNDJMCSXOXBFZ-UHFFFAOYSA-N 0.000 description 3
- UEBSWKNVDRJVHN-UHFFFAOYSA-N 4,4,6-trimethyl-2-(4,4,6-trimethyl-1,3,2-dioxaborinan-2-yl)-1,3,2-dioxaborinane Chemical compound O1C(C)CC(C)(C)OB1B1OC(C)(C)CC(C)O1 UEBSWKNVDRJVHN-UHFFFAOYSA-N 0.000 description 3
- VHYFNPMBLIVWCW-UHFFFAOYSA-N 4-Dimethylaminopyridine Chemical compound CN(C)C1=CC=NC=C1 VHYFNPMBLIVWCW-UHFFFAOYSA-N 0.000 description 3
- WPDAVTSOEQEGMS-UHFFFAOYSA-N 9,10-dihydroanthracene Chemical compound C1=CC=C2CC3=CC=CC=C3CC2=C1 WPDAVTSOEQEGMS-UHFFFAOYSA-N 0.000 description 3
- PAYRUJLWNCNPSJ-UHFFFAOYSA-N Aniline Chemical compound NC1=CC=CC=C1 PAYRUJLWNCNPSJ-UHFFFAOYSA-N 0.000 description 3
- 239000007818 Grignard reagent Substances 0.000 description 3
- KJTLSVCANCCWHF-UHFFFAOYSA-N Ruthenium Chemical compound [Ru] KJTLSVCANCCWHF-UHFFFAOYSA-N 0.000 description 3
- 230000004913 activation Effects 0.000 description 3
- 125000004429 atom Chemical group 0.000 description 3
- ZDQWVKDDJDIVAL-UHFFFAOYSA-N catecholborane Chemical compound C1=CC=C2O[B]OC2=C1 ZDQWVKDDJDIVAL-UHFFFAOYSA-N 0.000 description 3
- 230000002860 competitive effect Effects 0.000 description 3
- 125000002541 furyl group Chemical group 0.000 description 3
- 238000011065 in-situ storage Methods 0.000 description 3
- SLCVBVWXLSEKPL-UHFFFAOYSA-N neopentyl glycol Chemical compound OCC(C)(C)CO SLCVBVWXLSEKPL-UHFFFAOYSA-N 0.000 description 3
- BWHMMNNQKKPAPP-UHFFFAOYSA-L potassium carbonate Chemical compound [K+].[K+].[O-]C([O-])=O BWHMMNNQKKPAPP-UHFFFAOYSA-L 0.000 description 3
- 239000002243 precursor Substances 0.000 description 3
- 229910052707 ruthenium Inorganic materials 0.000 description 3
- 238000012216 screening Methods 0.000 description 3
- 229910052717 sulfur Inorganic materials 0.000 description 3
- 238000012360 testing method Methods 0.000 description 3
- GETTZEONDQJALK-UHFFFAOYSA-N trifluorotoluene Substances FC(F)(F)C1=CC=CC=C1 GETTZEONDQJALK-UHFFFAOYSA-N 0.000 description 3
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 2
- OSIGJGFTADMDOB-UHFFFAOYSA-N 1-Methoxy-3-methylbenzene Chemical compound COC1=CC=CC(C)=C1 OSIGJGFTADMDOB-UHFFFAOYSA-N 0.000 description 2
- CHLICZRVGGXEOD-UHFFFAOYSA-N 1-Methoxy-4-methylbenzene Chemical compound COC1=CC=C(C)C=C1 CHLICZRVGGXEOD-UHFFFAOYSA-N 0.000 description 2
- FCEHBMOGCRZNNI-UHFFFAOYSA-N 1-benzothiophene Chemical compound C1=CC=C2SC=CC2=C1 FCEHBMOGCRZNNI-UHFFFAOYSA-N 0.000 description 2
- BTQZKHUEUDPRST-UHFFFAOYSA-N 1-fluoro-3-methylbenzene Chemical compound CC1=CC=CC(F)=C1 BTQZKHUEUDPRST-UHFFFAOYSA-N 0.000 description 2
- VJYXZJGDFJJDGF-UHFFFAOYSA-N 1-methyl-3-(trifluoromethyl)benzene Chemical compound CC1=CC=CC(C(F)(F)F)=C1 VJYXZJGDFJJDGF-UHFFFAOYSA-N 0.000 description 2
- KAESVJOAVNADME-UHFFFAOYSA-N 1H-pyrrole Natural products C=1C=CNC=1 KAESVJOAVNADME-UHFFFAOYSA-N 0.000 description 2
- JWUJQDFVADABEY-UHFFFAOYSA-N 2-methyltetrahydrofuran Chemical compound CC1CCCO1 JWUJQDFVADABEY-UHFFFAOYSA-N 0.000 description 2
- XQQBUAPQHNYYRS-UHFFFAOYSA-N 2-methylthiophene Chemical compound CC1=CC=CS1 XQQBUAPQHNYYRS-UHFFFAOYSA-N 0.000 description 2
- NPDACUSDTOMAMK-UHFFFAOYSA-N 4-Chlorotoluene Chemical compound CC1=CC=C(Cl)C=C1 NPDACUSDTOMAMK-UHFFFAOYSA-N 0.000 description 2
- BTBUEUYNUDRHOZ-UHFFFAOYSA-N Borate Chemical compound [O-]B([O-])[O-] BTBUEUYNUDRHOZ-UHFFFAOYSA-N 0.000 description 2
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical compound [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 2
- YNQLUTRBYVCPMQ-UHFFFAOYSA-N Ethylbenzene Chemical compound CCC1=CC=CC=C1 YNQLUTRBYVCPMQ-UHFFFAOYSA-N 0.000 description 2
- QIGBRXMKCJKVMJ-UHFFFAOYSA-N Hydroquinone Chemical compound OC1=CC=C(O)C=C1 QIGBRXMKCJKVMJ-UHFFFAOYSA-N 0.000 description 2
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 2
- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 description 2
- UIHCLUNTQKBZGK-UHFFFAOYSA-N Methyl isobutyl ketone Natural products CCC(C)C(C)=O UIHCLUNTQKBZGK-UHFFFAOYSA-N 0.000 description 2
- QENGPZGAWFQWCZ-UHFFFAOYSA-N Methylthiophene Natural products CC=1C=CSC=1 QENGPZGAWFQWCZ-UHFFFAOYSA-N 0.000 description 2
- UFWIBTONFRDIAS-UHFFFAOYSA-N Naphthalene Chemical compound C1=CC=CC2=CC=CC=C21 UFWIBTONFRDIAS-UHFFFAOYSA-N 0.000 description 2
- OFBQJSOFQDEBGM-UHFFFAOYSA-N Pentane Chemical compound CCCCC OFBQJSOFQDEBGM-UHFFFAOYSA-N 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 2
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 2
- 239000003905 agrochemical Substances 0.000 description 2
- MWPLVEDNUUSJAV-UHFFFAOYSA-N anthracene Chemical compound C1=CC=CC2=CC3=CC=CC=C3C=C21 MWPLVEDNUUSJAV-UHFFFAOYSA-N 0.000 description 2
- 150000001502 aryl halides Chemical class 0.000 description 2
- 230000008901 benefit Effects 0.000 description 2
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 2
- 239000004305 biphenyl Substances 0.000 description 2
- 235000010290 biphenyl Nutrition 0.000 description 2
- UORVGPXVDQYIDP-UHFFFAOYSA-N borane Chemical compound B UORVGPXVDQYIDP-UHFFFAOYSA-N 0.000 description 2
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 description 2
- 229910052794 bromium Inorganic materials 0.000 description 2
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 2
- 125000002837 carbocyclic group Chemical group 0.000 description 2
- 150000001721 carbon Chemical group 0.000 description 2
- 239000000460 chlorine Substances 0.000 description 2
- 125000004218 chloromethyl group Chemical group [H]C([H])(Cl)* 0.000 description 2
- GVPFVAHMJGGAJG-UHFFFAOYSA-L cobalt dichloride Chemical compound [Cl-].[Cl-].[Co+2] GVPFVAHMJGGAJG-UHFFFAOYSA-L 0.000 description 2
- 238000004440 column chromatography Methods 0.000 description 2
- 125000004093 cyano group Chemical group *C#N 0.000 description 2
- 125000004663 dialkyl amino group Chemical group 0.000 description 2
- 125000004772 dichloromethyl group Chemical group [H]C(Cl)(Cl)* 0.000 description 2
- 239000003814 drug Substances 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 235000019439 ethyl acetate Nutrition 0.000 description 2
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 2
- 238000011156 evaluation Methods 0.000 description 2
- NIHNNTQXNPWCJQ-UHFFFAOYSA-N fluorene Chemical compound C1=CC=C2CC3=CC=CC=C3C2=C1 NIHNNTQXNPWCJQ-UHFFFAOYSA-N 0.000 description 2
- 125000003983 fluorenyl group Chemical group C1(=CC=CC=2C3=CC=CC=C3CC12)* 0.000 description 2
- 238000000806 fluorine-19 nuclear magnetic resonance spectrum Methods 0.000 description 2
- 125000000524 functional group Chemical group 0.000 description 2
- 125000004440 haloalkylsulfinyl group Chemical group 0.000 description 2
- 125000002883 imidazolyl group Chemical group 0.000 description 2
- 239000000543 intermediate Substances 0.000 description 2
- 125000000959 isobutyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 description 2
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 2
- 125000005956 isoquinolyl group Chemical group 0.000 description 2
- 125000001786 isothiazolyl group Chemical group 0.000 description 2
- 229910052749 magnesium Inorganic materials 0.000 description 2
- CQRPUKWAZPZXTO-UHFFFAOYSA-M magnesium;2-methylpropane;chloride Chemical compound [Mg+2].[Cl-].C[C-](C)C CQRPUKWAZPZXTO-UHFFFAOYSA-M 0.000 description 2
- CCERQOYLJJULMD-UHFFFAOYSA-M magnesium;carbanide;chloride Chemical compound [CH3-].[Mg+2].[Cl-] CCERQOYLJJULMD-UHFFFAOYSA-M 0.000 description 2
- MBHQEXPGNCWWBP-UHFFFAOYSA-M magnesium;dodecane;bromide Chemical compound [Mg+2].[Br-].CCCCCCCCCCC[CH2-] MBHQEXPGNCWWBP-UHFFFAOYSA-M 0.000 description 2
- YCCXQARVHOPWFJ-UHFFFAOYSA-M magnesium;ethane;chloride Chemical compound [Mg+2].[Cl-].[CH2-]C YCCXQARVHOPWFJ-UHFFFAOYSA-M 0.000 description 2
- 238000002844 melting Methods 0.000 description 2
- 230000008018 melting Effects 0.000 description 2
- HZVOZRGWRWCICA-UHFFFAOYSA-N methanediyl Chemical compound [CH2] HZVOZRGWRWCICA-UHFFFAOYSA-N 0.000 description 2
- QQHNNQCWKYFNAC-UHFFFAOYSA-N methyl 3-(trifluoromethyl)benzoate Chemical compound COC(=O)C1=CC=CC(C(F)(F)F)=C1 QQHNNQCWKYFNAC-UHFFFAOYSA-N 0.000 description 2
- TVMXDCGIABBOFY-UHFFFAOYSA-N n-Octanol Natural products CCCCCCCC TVMXDCGIABBOFY-UHFFFAOYSA-N 0.000 description 2
- 125000001624 naphthyl group Chemical group 0.000 description 2
- 239000012299 nitrogen atmosphere Substances 0.000 description 2
- 125000002524 organometallic group Chemical group 0.000 description 2
- 229910052763 palladium Inorganic materials 0.000 description 2
- IVDFJHOHABJVEH-UHFFFAOYSA-N pinacol Chemical compound CC(C)(O)C(C)(C)O IVDFJHOHABJVEH-UHFFFAOYSA-N 0.000 description 2
- 238000002360 preparation method Methods 0.000 description 2
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 2
- 125000002577 pseudohalo group Chemical group 0.000 description 2
- 150000003222 pyridines Chemical class 0.000 description 2
- 125000000714 pyrimidinyl group Chemical group 0.000 description 2
- 150000003233 pyrroles Chemical class 0.000 description 2
- 125000000168 pyrrolyl group Chemical group 0.000 description 2
- 125000002294 quinazolinyl group Chemical group N1=C(N=CC2=CC=CC=C12)* 0.000 description 2
- 125000005493 quinolyl group Chemical group 0.000 description 2
- 125000001567 quinoxalinyl group Chemical group N1=C(C=NC2=CC=CC=C12)* 0.000 description 2
- 229910052703 rhodium Inorganic materials 0.000 description 2
- 239000010948 rhodium Substances 0.000 description 2
- MHOVAHRLVXNVSD-UHFFFAOYSA-N rhodium atom Chemical compound [Rh] MHOVAHRLVXNVSD-UHFFFAOYSA-N 0.000 description 2
- 125000002914 sec-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 125000001712 tetrahydronaphthyl group Chemical group C1(CCCC2=CC=CC=C12)* 0.000 description 2
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- 229910052723 transition metal Inorganic materials 0.000 description 2
- 150000003624 transition metals Chemical class 0.000 description 2
- 125000003866 trichloromethyl group Chemical group ClC(Cl)(Cl)* 0.000 description 2
- RIOQSEWOXXDEQQ-UHFFFAOYSA-N triphenylphosphine Chemical compound C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 RIOQSEWOXXDEQQ-UHFFFAOYSA-N 0.000 description 2
- 229910052725 zinc Inorganic materials 0.000 description 2
- MOILFCKRQFQVFS-BDNRQGISSA-N (1r,3s,4r,5r)-4,6,6-trimethylbicyclo[3.1.1]heptane-3,4-diol Chemical compound C1[C@@H]2C(C)(C)[C@H]1C[C@H](O)[C@@]2(O)C MOILFCKRQFQVFS-BDNRQGISSA-N 0.000 description 1
- XYCMBGCHHKSITB-UHFFFAOYSA-N (4-hydroxy-2,5-dimethylhexan-3-yl)oxyboronic acid Chemical compound B(O)(O)OC(C(C(C)C)O)C(C)C XYCMBGCHHKSITB-UHFFFAOYSA-N 0.000 description 1
- 125000004765 (C1-C4) haloalkyl group Chemical group 0.000 description 1
- 125000004737 (C1-C6) haloalkoxy group Chemical group 0.000 description 1
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- 125000006083 1-bromoethyl group Chemical group 0.000 description 1
- IBSQPLPBRSHTTG-UHFFFAOYSA-N 1-chloro-2-methylbenzene Chemical compound CC1=CC=CC=C1Cl IBSQPLPBRSHTTG-UHFFFAOYSA-N 0.000 description 1
- 125000001478 1-chloroethyl group Chemical group [H]C([H])([H])C([H])(Cl)* 0.000 description 1
- 125000006218 1-ethylbutyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000004776 1-fluoroethyl group Chemical group [H]C([H])([H])C([H])(F)* 0.000 description 1
- 238000004293 19F NMR spectroscopy Methods 0.000 description 1
- 238000005160 1H NMR spectroscopy Methods 0.000 description 1
- HYZJCKYKOHLVJF-UHFFFAOYSA-N 1H-benzimidazole Chemical compound C1=CC=C2NC=NC2=C1 HYZJCKYKOHLVJF-UHFFFAOYSA-N 0.000 description 1
- JDIIGWSSTNUWGK-UHFFFAOYSA-N 1h-imidazol-3-ium;chloride Chemical compound [Cl-].[NH2+]1C=CN=C1 JDIIGWSSTNUWGK-UHFFFAOYSA-N 0.000 description 1
- 125000000453 2,2,2-trichloroethyl group Chemical group [H]C([H])(*)C(Cl)(Cl)Cl 0.000 description 1
- 125000004206 2,2,2-trifluoroethyl group Chemical group [H]C([H])(*)C(F)(F)F 0.000 description 1
- 125000004781 2,2-dichloro-2-fluoroethyl group Chemical group [H]C([H])(*)C(F)(Cl)Cl 0.000 description 1
- 125000004778 2,2-difluoroethyl group Chemical group [H]C([H])(*)C([H])(F)F 0.000 description 1
- 125000004780 2-chloro-2,2-difluoroethyl group Chemical group [H]C([H])(*)C(F)(F)Cl 0.000 description 1
- 125000004779 2-chloro-2-fluoroethyl group Chemical group [H]C([H])(*)C([H])(F)Cl 0.000 description 1
- 125000006176 2-ethylbutyl group Chemical group [H]C([H])([H])C([H])([H])C([H])(C([H])([H])*)C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000004777 2-fluoroethyl group Chemical group [H]C([H])(F)C([H])([H])* 0.000 description 1
- CSDSSGBPEUDDEE-UHFFFAOYSA-N 2-formylpyridine Chemical compound O=CC1=CC=CC=N1 CSDSSGBPEUDDEE-UHFFFAOYSA-N 0.000 description 1
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- FKUWNBNXZWQATH-UHFFFAOYSA-N 3-hydroxybutan-2-yloxyboronic acid Chemical compound CC(O)C(C)OB(O)O FKUWNBNXZWQATH-UHFFFAOYSA-N 0.000 description 1
- IZNFUEVGPRVJHV-UHFFFAOYSA-N 3-hydroxypropoxyboronic acid Chemical compound OCCCOB(O)O IZNFUEVGPRVJHV-UHFFFAOYSA-N 0.000 description 1
- 125000003542 3-methylbutan-2-yl group Chemical group [H]C([H])([H])C([H])(*)C([H])(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- 125000005917 3-methylpentyl group Chemical group 0.000 description 1
- 229960000549 4-dimethylaminophenol Drugs 0.000 description 1
- UHGBKWYISOUYAE-UHFFFAOYSA-N 6-amino-2-chloropyrimidine-4-carboxylic acid Chemical compound NC1=CC(C(O)=O)=NC(Cl)=N1 UHGBKWYISOUYAE-UHFFFAOYSA-N 0.000 description 1
- ZCYVEMRRCGMTRW-UHFFFAOYSA-N 7553-56-2 Chemical group [I] ZCYVEMRRCGMTRW-UHFFFAOYSA-N 0.000 description 1
- 125000000041 C6-C10 aryl group Chemical group 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 239000004215 Carbon black (E152) Substances 0.000 description 1
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 1
- 238000010485 C−C bond formation reaction Methods 0.000 description 1
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- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
- YNPNZTXNASCQKK-UHFFFAOYSA-N Phenanthrene Natural products C1=CC=C2C3=CC=CC=C3C=CC2=C1 YNPNZTXNASCQKK-UHFFFAOYSA-N 0.000 description 1
- DGEZNRSVGBDHLK-UHFFFAOYSA-N [1,10]phenanthroline Chemical compound C1=CN=C2C3=NC=CC=C3C=CC2=C1 DGEZNRSVGBDHLK-UHFFFAOYSA-N 0.000 description 1
- FOFJHYAEYZMDQK-UHFFFAOYSA-N [B].CC=1C=CC=C(C1)C Chemical compound [B].CC=1C=CC=C(C1)C FOFJHYAEYZMDQK-UHFFFAOYSA-N 0.000 description 1
- KPSZQYZCNSCYGG-UHFFFAOYSA-N [B].[B] Chemical compound [B].[B] KPSZQYZCNSCYGG-UHFFFAOYSA-N 0.000 description 1
- GLFAEFVIKYUOJK-UHFFFAOYSA-N [B].[Cl] Chemical group [B].[Cl] GLFAEFVIKYUOJK-UHFFFAOYSA-N 0.000 description 1
- SYKNUAWMBRIEKB-UHFFFAOYSA-N [Cl].[Br] Chemical compound [Cl].[Br] SYKNUAWMBRIEKB-UHFFFAOYSA-N 0.000 description 1
- 150000001336 alkenes Chemical class 0.000 description 1
- 125000006323 alkenyl amino group Chemical group 0.000 description 1
- 125000003342 alkenyl group Chemical group 0.000 description 1
- 125000003302 alkenyloxy group Chemical group 0.000 description 1
- 125000005136 alkenylsulfinyl group Chemical group 0.000 description 1
- 125000005137 alkenylsulfonyl group Chemical group 0.000 description 1
- 125000004453 alkoxycarbonyl group Chemical group 0.000 description 1
- 125000004457 alkyl amino carbonyl group Chemical group 0.000 description 1
- 125000004448 alkyl carbonyl group Chemical group 0.000 description 1
- 125000004644 alkyl sulfinyl group Chemical group 0.000 description 1
- 125000004390 alkyl sulfonyl group Chemical group 0.000 description 1
- 125000004414 alkyl thio group Chemical group 0.000 description 1
- 125000006319 alkynyl amino group Chemical group 0.000 description 1
- 125000000304 alkynyl group Chemical group 0.000 description 1
- 125000005133 alkynyloxy group Chemical group 0.000 description 1
- 125000005134 alkynylsulfinyl group Chemical group 0.000 description 1
- 125000005139 alkynylsulfonyl group Chemical group 0.000 description 1
- 150000001412 amines Chemical class 0.000 description 1
- 125000004103 aminoalkyl group Chemical group 0.000 description 1
- YJXGADCZMLHGLV-UHFFFAOYSA-N aniline;pyridine Chemical compound C1=CC=NC=C1.NC1=CC=CC=C1 YJXGADCZMLHGLV-UHFFFAOYSA-N 0.000 description 1
- IVRMZWNICZWHMI-UHFFFAOYSA-N azide group Chemical group [N-]=[N+]=[N-] IVRMZWNICZWHMI-UHFFFAOYSA-N 0.000 description 1
- UHOVQNZJYSORNB-MZWXYZOWSA-N benzene-d6 Chemical compound [2H]C1=C([2H])C([2H])=C([2H])C([2H])=C1[2H] UHOVQNZJYSORNB-MZWXYZOWSA-N 0.000 description 1
- 125000000499 benzofuranyl group Chemical group O1C(=CC2=C1C=CC=C2)* 0.000 description 1
- RWCCWEUUXYIKHB-UHFFFAOYSA-N benzophenone Chemical compound C=1C=CC=CC=1C(=O)C1=CC=CC=C1 RWCCWEUUXYIKHB-UHFFFAOYSA-N 0.000 description 1
- 239000012965 benzophenone Substances 0.000 description 1
- KKAXNAVSOBXHTE-UHFFFAOYSA-N boranamine Chemical class NB KKAXNAVSOBXHTE-UHFFFAOYSA-N 0.000 description 1
- 229910000085 borane Inorganic materials 0.000 description 1
- HRXOXDAKKRLSMI-UHFFFAOYSA-N boric acid;2-(2-hydroxyethylamino)ethanol Chemical compound OB(O)O.OCCNCCO HRXOXDAKKRLSMI-UHFFFAOYSA-N 0.000 description 1
- YFMUPHJGWWRKLX-UHFFFAOYSA-N boric acid;propane-1,2-diol Chemical compound OB(O)O.CC(O)CO YFMUPHJGWWRKLX-UHFFFAOYSA-N 0.000 description 1
- 125000005620 boronic acid group Chemical group 0.000 description 1
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- 125000005997 bromomethyl group Chemical group 0.000 description 1
- 238000001460 carbon-13 nuclear magnetic resonance spectrum Methods 0.000 description 1
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 1
- 238000006555 catalytic reaction Methods 0.000 description 1
- 239000007795 chemical reaction product Substances 0.000 description 1
- 239000003638 chemical reducing agent Substances 0.000 description 1
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- 125000004775 chlorodifluoromethyl group Chemical group FC(F)(Cl)* 0.000 description 1
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- 238000009833 condensation Methods 0.000 description 1
- 230000005494 condensation Effects 0.000 description 1
- 208000012839 conversion disease Diseases 0.000 description 1
- 239000002178 crystalline material Substances 0.000 description 1
- 125000006165 cyclic alkyl group Chemical group 0.000 description 1
- 125000004122 cyclic group Chemical group 0.000 description 1
- 125000000392 cycloalkenyl group Chemical group 0.000 description 1
- 125000004465 cycloalkenyloxy group Chemical group 0.000 description 1
- 125000000000 cycloalkoxy group Chemical group 0.000 description 1
- 125000005366 cycloalkylthio group Chemical group 0.000 description 1
- 125000001995 cyclobutyl group Chemical group [H]C1([H])C([H])([H])C([H])(*)C1([H])[H] 0.000 description 1
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 1
- ZBCKWHYWPLHBOK-UHFFFAOYSA-N cyclohexylphosphane Chemical compound PC1CCCCC1 ZBCKWHYWPLHBOK-UHFFFAOYSA-N 0.000 description 1
- 125000001511 cyclopentyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C1([H])[H] 0.000 description 1
- 125000001559 cyclopropyl group Chemical group [H]C1([H])C([H])([H])C1([H])* 0.000 description 1
- 125000002704 decyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000006612 decyloxy group Chemical group 0.000 description 1
- 125000005265 dialkylamine group Chemical group 0.000 description 1
- 125000004473 dialkylaminocarbonyl group Chemical group 0.000 description 1
- JKWMSGQKBLHBQQ-UHFFFAOYSA-N diboron trioxide Chemical compound O=BOB=O JKWMSGQKBLHBQQ-UHFFFAOYSA-N 0.000 description 1
- 125000004774 dichlorofluoromethyl group Chemical group FC(Cl)(Cl)* 0.000 description 1
- HQWPLXHWEZZGKY-UHFFFAOYSA-N diethylzinc Chemical compound CC[Zn]CC HQWPLXHWEZZGKY-UHFFFAOYSA-N 0.000 description 1
- 125000001028 difluoromethyl group Chemical group [H]C(F)(F)* 0.000 description 1
- 239000000539 dimer Substances 0.000 description 1
- DLLJVQNYBYOKGS-UHFFFAOYSA-N ethoxyethane;pentane Chemical compound CCCCC.CCOCC DLLJVQNYBYOKGS-UHFFFAOYSA-N 0.000 description 1
- 239000000706 filtrate Substances 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 125000004216 fluoromethyl group Chemical group [H]C([H])(F)* 0.000 description 1
- 150000002240 furans Chemical class 0.000 description 1
- 125000000262 haloalkenyl group Chemical group 0.000 description 1
- 125000005291 haloalkenyloxy group Chemical group 0.000 description 1
- 125000004441 haloalkylsulfonyl group Chemical group 0.000 description 1
- 125000004995 haloalkylthio group Chemical group 0.000 description 1
- 125000000232 haloalkynyl group Chemical group 0.000 description 1
- 125000006769 halocycloalkoxy group Chemical group 0.000 description 1
- 125000005347 halocycloalkyl group Chemical group 0.000 description 1
- 125000004051 hexyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 238000006197 hydroboration reaction Methods 0.000 description 1
- 229930195733 hydrocarbon Natural products 0.000 description 1
- 150000002430 hydrocarbons Chemical group 0.000 description 1
- 125000000687 hydroquinonyl group Chemical group C1(O)=C(C=C(O)C=C1)* 0.000 description 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 1
- 150000002466 imines Chemical group 0.000 description 1
- 239000004615 ingredient Substances 0.000 description 1
- 238000013383 initial experiment Methods 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- GYCHYNMREWYSKH-UHFFFAOYSA-L iron(ii) bromide Chemical class [Fe+2].[Br-].[Br-] GYCHYNMREWYSKH-UHFFFAOYSA-L 0.000 description 1
- 125000004491 isohexyl group Chemical group C(CCC(C)C)* 0.000 description 1
- 238000002955 isolation Methods 0.000 description 1
- 125000001972 isopentyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])C([H])([H])* 0.000 description 1
- 239000012035 limiting reagent Substances 0.000 description 1
- 229910052744 lithium Inorganic materials 0.000 description 1
- LZWQNOHZMQIFBX-UHFFFAOYSA-N lithium;2-methylpropan-2-olate Chemical compound [Li+].CC(C)(C)[O-] LZWQNOHZMQIFBX-UHFFFAOYSA-N 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
- IWCVDCOJSPWGRW-UHFFFAOYSA-M magnesium;benzene;chloride Chemical compound [Mg+2].[Cl-].C1=CC=[C-]C=C1 IWCVDCOJSPWGRW-UHFFFAOYSA-M 0.000 description 1
- KJJBSBKRXUVBMX-UHFFFAOYSA-N magnesium;butane Chemical compound [Mg+2].CCC[CH2-].CCC[CH2-] KJJBSBKRXUVBMX-UHFFFAOYSA-N 0.000 description 1
- 238000003760 magnetic stirring Methods 0.000 description 1
- KZVKFNWNAYUYEU-UHFFFAOYSA-N methyl 6-acetamido-2-chloropyrimidine-4-carboxylate Chemical compound COC(=O)C1=CC(NC(C)=O)=NC(Cl)=N1 KZVKFNWNAYUYEU-UHFFFAOYSA-N 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 125000006606 n-butoxy group Chemical group 0.000 description 1
- 125000001971 neopentyl group Chemical group [H]C([*])([H])C(C([H])([H])[H])(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 description 1
- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical group [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 description 1
- 239000003921 oil Substances 0.000 description 1
- JRZJOMJEPLMPRA-UHFFFAOYSA-N olefin Natural products CCCCCCCC=C JRZJOMJEPLMPRA-UHFFFAOYSA-N 0.000 description 1
- YJVFFLUZDVXJQI-UHFFFAOYSA-L palladium(ii) acetate Chemical group [Pd+2].CC([O-])=O.CC([O-])=O YJVFFLUZDVXJQI-UHFFFAOYSA-L 0.000 description 1
- 125000006340 pentafluoro ethyl group Chemical group FC(F)(F)C(F)(F)* 0.000 description 1
- 125000003538 pentan-3-yl group Chemical group [H]C([H])([H])C([H])([H])C([H])(*)C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000001147 pentyl group Chemical group C(CCCC)* 0.000 description 1
- 238000000053 physical method Methods 0.000 description 1
- 239000002574 poison Substances 0.000 description 1
- 231100000614 poison Toxicity 0.000 description 1
- SCVFZCLFOSHCOH-UHFFFAOYSA-M potassium acetate Chemical compound [K+].CC([O-])=O SCVFZCLFOSHCOH-UHFFFAOYSA-M 0.000 description 1
- 229910000027 potassium carbonate Inorganic materials 0.000 description 1
- 235000015320 potassium carbonate Nutrition 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 239000012041 precatalyst Substances 0.000 description 1
- 125000006239 protecting group Chemical group 0.000 description 1
- 238000000425 proton nuclear magnetic resonance spectrum Methods 0.000 description 1
- 125000003226 pyrazolyl group Chemical group 0.000 description 1
- 238000011002 quantification Methods 0.000 description 1
- 239000002516 radical scavenger Substances 0.000 description 1
- 238000001953 recrystallisation Methods 0.000 description 1
- 238000009877 rendering Methods 0.000 description 1
- 229920006395 saturated elastomer Polymers 0.000 description 1
- 125000003548 sec-pentyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- 239000000741 silica gel Substances 0.000 description 1
- 229910002027 silica gel Inorganic materials 0.000 description 1
- 238000004467 single crystal X-ray diffraction Methods 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- MFRIHAYPQRLWNB-UHFFFAOYSA-N sodium tert-butoxide Chemical compound [Na+].CC(C)(C)[O-] MFRIHAYPQRLWNB-UHFFFAOYSA-N 0.000 description 1
- 239000007858 starting material Substances 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 239000011593 sulfur Substances 0.000 description 1
- 238000010189 synthetic method Methods 0.000 description 1
- 229910052715 tantalum Inorganic materials 0.000 description 1
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 description 1
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- 125000001973 tert-pentyl group Chemical group [H]C([H])([H])C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
- ITMCEJHCFYSIIV-UHFFFAOYSA-M triflate Chemical compound [O-]S(=O)(=O)C(F)(F)F ITMCEJHCFYSIIV-UHFFFAOYSA-M 0.000 description 1
- 125000002827 triflate group Chemical group FC(S(=O)(=O)O*)(F)F 0.000 description 1
- 125000002023 trifluoromethyl group Chemical group FC(F)(F)* 0.000 description 1
- LWIHDJKSTIGBAC-UHFFFAOYSA-K tripotassium phosphate Chemical compound [K+].[K+].[K+].[O-]P([O-])([O-])=O LWIHDJKSTIGBAC-UHFFFAOYSA-K 0.000 description 1
- 229910000404 tripotassium phosphate Inorganic materials 0.000 description 1
- 235000019798 tripotassium phosphate Nutrition 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F5/00—Compounds containing elements of Groups 3 or 13 of the Periodic Table
- C07F5/02—Boron compounds
- C07F5/025—Boronic and borinic acid compounds
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J31/00—Catalysts comprising hydrides, coordination complexes or organic compounds
- B01J31/16—Catalysts comprising hydrides, coordination complexes or organic compounds containing coordination complexes
- B01J31/22—Organic complexes
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J31/00—Catalysts comprising hydrides, coordination complexes or organic compounds
- B01J31/16—Catalysts comprising hydrides, coordination complexes or organic compounds containing coordination complexes
- B01J31/22—Organic complexes
- B01J31/2282—Unsaturated compounds used as ligands
- B01J31/2295—Cyclic compounds, e.g. cyclopentadienyls
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F15/00—Compounds containing elements of Groups 8, 9, 10 or 18 of the Periodic Table
- C07F15/06—Cobalt compounds
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J2231/00—Catalytic reactions performed with catalysts classified in B01J31/00
- B01J2231/40—Substitution reactions at carbon centres, e.g. C-C or C-X, i.e. carbon-hetero atom, cross-coupling, C-H activation or ring-opening reactions
- B01J2231/42—Catalytic cross-coupling, i.e. connection of previously not connected C-atoms or C- and X-atoms without rearrangement
- B01J2231/4205—C-C cross-coupling, e.g. metal catalyzed or Friedel-Crafts type
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J2531/00—Additional information regarding catalytic systems classified in B01J31/00
- B01J2531/02—Compositional aspects of complexes used, e.g. polynuclearity
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Abstract
Description
此申請案主張2014年6月16日提申之美國專利臨時申請案第62/012,681號之利益,其在此明確地併入以作為參考資料。 This application claims the benefit of U.S. Patent Provisional Application Serial No. 62/012,681, the entire disclosure of which is incorporated herein by reference.
此申請案一般而言係有關於形成氧硼基化芳烴之方法,以及使用其等之方法。 This application is generally directed to a method of forming an oxyborated aromatic hydrocarbon, and a method of using the same.
芳基硼酸及芳基硼酸酯為有機化學中多功能的試劑。尤其,芳基硼酸及芳基硼酸酯可以參與各種交叉偶合反應,例如鈴木(Suzuki)型交叉偶合反應,其能導致碳-碳鍵形成,如同以下概括地圖解。 Aryl boronic acid and aryl boronic acid esters are multifunctional reagents in organic chemistry. In particular, aryl boronic acids and aryl boronic esters can participate in various cross-coupling reactions, such as the Suzuki-type cross-coupling reaction, which can result in carbon-carbon bond formation, as outlined below.
因此,在合成高度官能化的有機化合物,包括藥品和農用化學品,方面芳基硼酸酯及芳基硼酸經常是關鍵的中間物。改良的芳基硼酸及芳基硼酸酯之製備方法,包 括製備經取代的芳基硼酸及經取代的芳基硼酸酯之區域選擇性(regioselective)方法,提供了改良重要種類的有機化合物,包括藥品和農用化學品,之合成的可能性。 Thus, aryl boronates and arylboronic acids are often key intermediates in the synthesis of highly functional organic compounds, including pharmaceuticals and agrochemicals. Modified arylboronic acid and aryl boronic acid ester preparation method, package The regioselective process for the preparation of substituted arylboronic acids and substituted arylborates provides the possibility of improving the synthesis of important classes of organic compounds, including pharmaceuticals and agrochemicals.
金屬催化的C-H活化氧硼基化可以從其等之前驅物以單一步驟而用來製備芳基硼酸及芳基硼酸酯。金屬催化的C-H活化氧硼基化,相對於任擇的氧硼基化方法,提供了許多優點。舉例而言,金屬催化的C-H活化氧硼基化不需要低溫的反應溫度,低溫的反應溫度為當使用古典的氫鋰交換反應來活化氧硼基化的C-H位置時典型需要的。然而,金屬催化的C-H活化氧硼基化典型地使用昂貴的銥及銠催化劑系統。本文提供使用鈷催化劑系統之用於芳香族化合物的C-H活化氧硼基化之方法。鈷催化劑系統顯著地會比的C-H活化氧硼基化典型地使用的昂貴的銥及銠催化劑系統更便宜。 Metal-catalyzed C-H-activated oxyborylation can be used to prepare aryl boronic acids and aryl boronic esters in a single step from their precursors. Metal catalyzed C-H activated oxyborylation provides a number of advantages over the optional oxyborylation process. For example, metal-catalyzed C-H-activated oxyborylation does not require a low temperature reaction temperature, which is typically required when a classical hydrogen-lithium exchange reaction is used to activate the oxyborylation C-H position. However, metal catalyzed C-H activated oxyborylation typically uses expensive rhodium and ruthenium catalyst systems. Provided herein are methods for C-H activated oxyborylation of aromatic compounds using a cobalt catalyst system. The cobalt catalyst system is significantly less expensive than the expensive rhodium and ruthenium catalyst systems typically used for C-H activated oxyborylation.
提供用於製備氧硼基化芳香族化合物之方法。用於製備氧硼基化芳香族化合物之方法可以包含於形成該氧硼基化芳香族化合物有效的條件下,使一種芳香族基質與一種催化性鈷錯合物及一種氧硼基化試劑接觸。 A method for preparing an oxyborylated aromatic compound is provided. The method for preparing an oxyborylated aromatic compound may comprise contacting an aromatic matrix with a catalytic cobalt complex and an oxyborylating agent under conditions effective to form the boroborylated aromatic compound .
芳香族基質可以為能經歷C-H活化氧硼基化之任何合適的芳香族化合物。舉例而言,芳香族基質可以為經取代的或未經取代的芳基化合物(例如,經取代的或未經取代的苯)、經取代的或未經取代的六員雜芳香族化合物(例 如,經取代的或未經取代的吡啶),或是經取代的或未經取代的五員雜芳香族化合物(例如,經取代的或未經取代的吡咯、經取代的或未經取代的呋喃,或經取代的或未經取代的噻吩)。 The aromatic matrix can be any suitable aromatic compound that can undergo C-H activated oxyborylation. For example, the aromatic matrix can be a substituted or unsubstituted aryl compound (eg, substituted or unsubstituted benzene), a substituted or unsubstituted six-membered heteroaromatic compound (eg, For example, substituted or unsubstituted pyridine), or substituted or unsubstituted five-membered heteroaromatic compound (eg, substituted or unsubstituted pyrrole, substituted or unsubstituted) Furan, or substituted or unsubstituted thiophene).
於此等方法中,催化性鈷錯合物可以為能夠催化芳香族基質的C-H活化氧硼基化之任何合適的鈷(I)或鈷(II)錯合物。在某些具體例中,該催化性鈷錯合物為一種鈷(I)錯合物。 In such processes, the catalytic cobalt complex can be any suitable cobalt (I) or cobalt (II) complex capable of catalyzing C-H activated oxyborylation of an aromatic matrix. In some embodiments, the catalytic cobalt complex is a cobalt (I) complex.
於一些具體例中,該催化性鈷錯合物可以包含一種含有三牙配位子之鈷鉗合錯合物。舉例而言,該催化性鈷錯合物可以為一種鈷螯錯合物。於一些例子中,該催化性鈷錯合物可以為一種鈷鉗合錯合物,其含有CCC、CNC、CNS、NNN、NCN、PCP、PNP、PCN、OCO、SCS、SNS,或是SPS螯配位子。於某些具體例中,該催化性鈷錯合物不是一種含有NNN或NPN螯配位子之鈷鉗合錯合物。於某些具體例中,該催化性鈷錯合物不是下列中之一者:
於某些具體例中,該催化性鈷錯合物不是一種鈷螯錯合物。舉例而言,該催化性鈷錯合物可以包含一種含有雙牙配位子之鈷鉗合錯合物,諸如由以下式所定義之錯合物
其中Z於每次出現時獨立地為,鹵化物、C1-C6烷基,或是芳基,n為2,R5於每次出現時獨立地為,鹵素、-OR7、-NR7R7、-C(=O)R8、腈基、C1-C6烷基、芳基,或是C1-C6鹵烷基,m為0、1、2、3,或4,R6係選自於下列中之一者:
R7於每次出現時獨立地為,氫或是C1-C6烷基,以及 R8於每次出現時獨立地為,氫、-OR7、-NR7R7,或是C1-C6烷基。 R 7 is independently at each occurrence, hydrogen or C 1 -C 6 alkyl, and R 8 is independently, on each occurrence, hydrogen, -OR 7 , -NR 7 R 7 , or C 1 -C 6 alkyl.
於一些具體例中,該催化性鈷錯合物可以包含一種只含有單牙配位子之鈷錯合物。舉例而言,該催化性鈷錯合物可以包含Py2Co(CH2SiMe3)2。 In some embodiments, the catalytic cobalt complex can comprise a cobalt complex containing only a single tooth ligand. For example, the catalytic cobalt complex can comprise Py 2 Co(CH 2 SiMe 3 ) 2 .
於一些具體例中,該催化性鈷錯合物可以包含一種多金屬鈷錯合物,諸如一種橋聯二鈷錯合物。舉例而言,該催化性鈷錯合物可以包含[(Cp*Co)2-μ-(η4:η4-甲苯)]。 In some embodiments, the catalytic cobalt complex can comprise a multimetallic cobalt complex, such as a bridged dicobalt complex. For example, the catalytic cobalt complex may comprise [(Cp*Co) 2 -μ-(η 4 :η 4 -toluene)].
亦提供用於具有一種環取代基之芳香族化合物之氧硼基化方法,該環取代基於對芳香族環之α位置上包括一個碳原子,其被至少一個氫原子(諸如,至少二個氫原子或三個氫原子)取代。該方法可以包括於氧硼基化對該芳香族環之該α位置上之該碳原子的有效條件下,使該芳香族基質與一種催化性鈷錯合物及一種氧硼基化試劑接觸。 Also provided is an oxyborylation process for an aromatic compound having a ring substituent comprising at least one hydrogen atom at the alpha position of the aromatic ring, such as at least two hydrogen atoms Substituted by an atom or three hydrogen atoms. The method can include contacting the aromatic matrix with a catalytic cobalt complex and an oxonylating agent under conditions effective for oxyborylation of the carbon atom at the alpha position of the aromatic ring.
舉例而言,提供用於製備由式VII所定義之氧硼基化化合物的方法
其中X為經取代的或未經取代的芳基或是經取代的或未經取代的雜芳基,以及Y為硼酸或硼酸衍生物。該方法可以包括提供一種芳香族基質,其包含一種甲基取代的芳基或是一種甲基取代的雜芳基,以及於形成由式VII所定義之化合物有效的條件下,使該芳香族基質與一種催化性鈷錯合物及一種氧硼基化試劑接觸。 Wherein X is a substituted or unsubstituted aryl group or a substituted or unsubstituted heteroaryl group, and Y is a boric acid or a boronic acid derivative. The method can include providing an aromatic matrix comprising a methyl substituted aryl group or a methyl substituted heteroaryl group, and rendering the aromatic matrix under conditions effective to form a compound defined by formula VII Contact with a catalytic cobalt complex and an oxyborylation reagent.
該芳香族基質可以包含任何合適的甲基取代的芳基或是甲基取代的雜芳基。該芳基或是雜芳基可以選擇性地進一步包含除了甲基取代基之外的一個或更多個取代基。因此,X可以為任何合適的經取代的或未經取代的芳基或雜芳基基團。舉例而言,X可以為經取代的或未經取代的芳基基團(例如,經取代的或未經取代的苯基基團)。於其他的例子中,X可以為經取代的或未經取代的雜芳基基團(例如,經取代的或未經取代的吡啶基)。 The aromatic matrix can comprise any suitable methyl substituted aryl or methyl substituted heteroaryl. The aryl or heteroaryl group may optionally further comprise one or more substituents other than the methyl substituent. Thus, X can be any suitable substituted or unsubstituted aryl or heteroaryl group. For example, X can be a substituted or unsubstituted aryl group (eg, a substituted or unsubstituted phenyl group). In other examples, X can be a substituted or unsubstituted heteroaryl group (eg, a substituted or unsubstituted pyridyl group).
於某些具體例中,該芳香族基質可以包含由式VIII所定義之化合物
其中A於每次出現時獨立地為,氫、鹵素、-OR1、-NR2R3、-C(=O)R4、腈基、C1-C6烷基、C1-C6鹵烷基,或是硼酸或硼酸衍生物,R1、R2及R3於每次出現時各自獨立地為,氫或是C1-C6烷基,以及R4於每次出現時獨立地為,氫、-OR1、-NR2R3,或C1-C6烷基。 Wherein A is independently at each occurrence, hydrogen, halogen, -OR 1 , -NR 2 R 3 , -C(=O)R 4 , nitrile group, C 1 -C 6 alkyl group, C 1 -C 6 Haloalkyl, or a boronic acid or boronic acid derivative, each of R 1 , R 2 and R 3 being independently, hydrogen or C 1 -C 6 alkyl, and R 4 is independently present at each occurrence The ground is hydrogen, -OR 1 , -NR 2 R 3 , or C 1 -C 6 alkyl.
於此等具體例中,該氧硼基化芳香族化合物可以包含由式IX所定義之化合物
其中A於每次出現時係如上所述,以及Y為硼酸或硼酸衍生物。在某些例子中,該氧硼基化芳香族化合物可以包含由式IX所定義之化合物,其中Y為一種選自於下列中之一者的硼酸衍生物:
於此等方法中,該催化性鈷錯合物可以為能催化芳香族基質的C-H活化氧硼基化之任何合適的鈷(I)或鈷(II)錯合物。在某些具體例中,該催化性鈷錯合物為一種鈷(II)錯合物。 In such methods, the catalytic cobalt complex can be any suitable cobalt (I) or cobalt (II) complex that catalyzes the C-H activated oxyborylation of the aromatic matrix. In some embodiments, the catalytic cobalt complex is a cobalt (II) complex.
於一些具體例中,該催化性鈷錯合物可以包含一種含有三牙配位子之鈷鉗合錯合物。舉例而言,該催化性
鈷錯合物可以為一種鈷螯錯合物。於一些例子中,該催化性鈷錯合物可以為一種鈷鉗合錯合物,其含有CCC、CNC、CNS、NNN、NCN、PCP、PNP、PCN、OCO、SCS、SNS,或是SPS螯配位子。於某些具體例中,該催化性鈷錯合物不是一種含有NNN或NPN螯配位子之鈷鉗合錯合物。於某些具體例中,該催化性鈷錯合物不是下列中之一者:
於某些具體例中,該催化性鈷錯合物不是一種鈷螯錯合物。舉例而言,該催化性鈷錯合物可以包含一種含有雙牙配位子之鈷鉗合錯合物,諸如一種由以下式所定義之錯合物
其中Z於每次出現時獨立地為,鹵化物、C1-C6烷基,或芳基,
n為2,R5於每次出現時獨立地為,鹵素、-OR7、-NR7R7、-C(=O)R8、腈基、C1-C6烷基、芳基,或是C1-C6鹵烷基,m為0、1、2、3,或4,R6係選自於下列中之一者:
R7於每次出現時獨立地為,氫或是C1-C6烷基,以及R8於每次出現時獨立地為,氫、-OR7、-NR7R7,或是C1-C6烷基。 R 7 is independently at each occurrence, hydrogen or C 1 -C 6 alkyl, and R 8 is independently, on each occurrence, hydrogen, -OR 7 , -NR 7 R 7 , or C 1 -C 6 alkyl.
於一些具體例中,該催化性鈷錯合物可以包含一種只含有單牙配位子之鈷錯合物。舉例而言,該催化性鈷錯合物可以包含Py2Co(CH2SiMe3)2。 In some embodiments, the catalytic cobalt complex can comprise a cobalt complex containing only a single tooth ligand. For example, the catalytic cobalt complex can comprise Py 2 Co(CH 2 SiMe 3 ) 2 .
於一些具體例中,該催化性鈷錯合物可以包含一種多金屬鈷錯合物,諸如一種橋聯二鈷錯合物。舉例而言,該催化性鈷錯合物可以包含[(Cp*Co)2-μ-(η4:η4-甲苯)]。 In some embodiments, the catalytic cobalt complex can comprise a multimetallic cobalt complex, such as a bridged dicobalt complex. For example, the catalytic cobalt complex may comprise [(Cp*Co) 2 -μ-(η 4 :η 4 -toluene)].
如上所述之方法中使用的氧硼基化試劑可以為本技藝已知作為氧硼基化試劑之任何合適的HB或B-B有機化合物。合適的氧硼基化試劑可以考慮各種因素來選擇,包括考慮有關生成的氧硼基化芳烴所欲的反應性。例示性氧硼基化試劑包括以下所示之HB或是B-B有機化合物。 The oxyborylation reagent used in the method as described above may be any suitable HB or B-B organic compound known in the art as an oxyborylation reagent. Suitable oxyborylation reagents can be selected in consideration of various factors, including consideration of the desired reactivity with respect to the resulting oxyborated aromatic hydrocarbon. Exemplary oxyborylation reagents include the HB or B-B organic compounds shown below.
於一些具體例中,氧硼基化試劑係選自於品納可硼烷(pinacolborane)(HBPin)、鄰苯二酚硼烷(catecholborane)、雙(新戊基乙二醇)二硼酸酯(bis(neopentyl glycolato)diboron)、雙(品納醇)二硼酸酯(bis(pinacolato)diboron)(B2Pin2)、雙(乙烯基甘醇酸)二硼酸酯(bis(hexylene glycolato)diboron),以及雙(鄰苯二酚)二硼酸酯(bis(catecholato)diboron)。於某些具體例中,氧硼基化試劑為品納可硼烷(pinacolborane)(HBPin)或雙(品納醇)二硼酸酯(bis(pinacolato)diboron)(B2Pin2)。 In some embodiments, the oxyborylation reagent is selected from the group consisting of pinacolborane (HBPin), catecholborane, bis(neopentyl glycol) diborate. (bis(neopentyl glycolato)diboron), bis(pinacolato)diboron(B 2 Pin 2 ), bis(vinyl glycolic acid) diborate (bis(hexylene glycolato) Diboron), and bis(catecholato) diboron. In some embodiments, the boronylation reagent is pinacolborane (HBPin) or bis(pinacolato) diboron (B 2 Pin 2 ).
使用本文所述的方法所製備之氧硼基化化合物可以使用於額外的化學反應中,包括交叉偶合反應,例如鈴木(Suzuki)型交叉偶合反應。於一些具體例中,本文所述 的方法可以進一步包含使該氧硼基化芳香族化合物與一種反應物,及一種過渡金屬催化劑接觸,該反應物係選自於以下所構成的群組:芳基鹵化物、芳基擬鹵化物(aryl pseudohalide)、鹵乙烯及擬鹵乙烯(vinyl pseudohalide),以使該氧硼基化芳香族化合物與該反應物交叉偶合。 Oxyborylation compounds prepared using the methods described herein can be used in additional chemical reactions, including cross-coupling reactions, such as Suzuki-type cross-coupling reactions. In some specific examples, described herein The method may further comprise contacting the boroborylated aromatic compound with a reactant, and a transition metal catalyst, the reactant being selected from the group consisting of aryl halides, aryl pseudohalides (aryl pseudohalide), vinyl halide and vinyl pseudohalide to cross-couple the borolated aromatic compound with the reactant.
除非另外明確說明,否則本文使用的術語將具有其等於本技藝習用的意義。本文所述的化學式中變數的定義所提及之有機部分(moieties)-像是術語鹵素-為獨立基團成員之獨立名冊的集合術語。各個例子中字首的Cn-Cm表示基團中可能的碳原子數目。 Unless otherwise specifically stated, terms used herein will have their meaning equivalent to the art. The organic moieties referred to in the definitions of the variables in the formulas described herein - like the term halogen - are collective terms of the independent roster of independent group members. The C n -C m of the prefix in each example represents the number of possible carbon atoms in the group.
當使用於本文中,術語「烷基」係指為飽和的直鏈、分支、環狀、一級或二級或三級烴類,其包括具有1個至6個碳原子之該等。於一些具體例中,烷基會包括C1、C1-C2、C1-C3、C1-C4、C1-C5或C1-C6烷基。C1-C6烷基之實例包括,但不限於甲基、乙基、丙基、1-甲基乙基、丁基、1-甲基丙基、2-甲基丙基、1,1-二甲基乙基、戊基、1-甲基丁基、2-甲基丁基、3-甲基丁基、2,2-二甲基丙基、1-乙基丙基、己基、1,1-二甲基丙基、1,2-二甲基丙基、1-甲基戊基、2-甲基戊基、3-甲基戊基、4-甲基戊基、1,1-二甲基丁 基、1,2-二甲基丁基、1,3-二甲基丁基、2,2-二甲基丁基、2,3-二甲基丁基、3,3-二甲基丁基、1-乙基丁基、2-乙基丁基、1,1,2-三甲基丙基、1,2,2-三甲基丙基、1-乙基-1-甲基丙基、1-乙基-2-甲基丙基,以及其等之異構物。C1-C4-烷基可以包括,舉例而言,甲基、乙基、丙基、1-甲基乙基、丁基、1-甲基丙基、2-甲基丙基,以及1,1-二甲基乙基。 As used herein, the term "alkyl" refers to a straight, branched, cyclic, first or second or tertiary hydrocarbon that is saturated, including those having from 1 to 6 carbon atoms. In some embodiments, the alkyl group will include C 1 , C 1 -C 2 , C 1 -C 3 , C 1 -C 4 , C 1 -C 5 or C 1 -C 6 alkyl. Examples of C 1 -C 6 alkyl groups include, but are not limited to, methyl, ethyl, propyl, 1-methylethyl, butyl, 1-methylpropyl, 2-methylpropyl, 1,1 - dimethylethyl, pentyl, 1-methylbutyl, 2-methylbutyl, 3-methylbutyl, 2,2-dimethylpropyl, 1-ethylpropyl, hexyl, 1,1-dimethylpropyl, 1,2-dimethylpropyl, 1-methylpentyl, 2-methylpentyl, 3-methylpentyl, 4-methylpentyl, 1, 1-dimethylbutyl, 1,2-dimethylbutyl, 1,3-dimethylbutyl, 2,2-dimethylbutyl, 2,3-dimethylbutyl, 3, 3-dimethylbutyl, 1-ethylbutyl, 2-ethylbutyl, 1,1,2-trimethylpropyl, 1,2,2-trimethylpropyl, 1-ethyl 1-methylpropyl, 1-ethyl-2-methylpropyl, and the isomers thereof. C 1 -C 4 -alkyl may include, for example, methyl, ethyl, propyl, 1-methylethyl, butyl, 1-methylpropyl, 2-methylpropyl, and , 1-dimethylethyl.
烷基包含的環狀烷基(Cyclic alkyl group)或「環烷基(cycloalkyl)」基團,包括具有單一或多個縮合環、帶有3個至6個碳原子之該等。於一些具體例中,環烷基基團包括C4-C6或C3-C4環狀烷基基團。環烷基基團之非限制性實例包括環丙基、環丁基、環戊基,以及環己基。 The alkyl group contains a "cyclic alkyl group" or "cycloalkyl" group, including those having a single or multiple condensed rings with from 3 to 6 carbon atoms. In some embodiments, the cycloalkyl group comprises a C 4 -C 6 or C 3 -C 4 cyclic alkyl group. Non-limiting examples of cycloalkyl groups include cyclopropyl, cyclobutyl, cyclopentyl, and cyclohexyl.
烷基可以是未經取代的或是被一個或更多個部分(moieties)所取代,例如,烷基、鹵(halo)、鹵烷基、羥基、羧基、醯基、醯氧基、胺基、烷基-或二烷基胺基、醯胺基、硝基、氰基、疊氮基、硫醇,或是任何其他可實行的官能基,不排除本文所述的合成方法,不論是未經保護的還是視需要經保護的,如同熟悉此藝者會知曉者,舉例而言,如同Greene等人之Protective Groups in Organic Synthesis,John Wiley and Sons,第三版,1999之中所教示者,其併入以作為參考資料。 The alkyl group may be unsubstituted or substituted by one or more moieties, for example, an alkyl group, a halo group, a haloalkyl group, a hydroxyl group, a carboxyl group, a decyl group, a decyloxy group, an amine group. , an alkyl- or dialkylamino group, a decylamino group, a nitro group, a cyano group, an azide group, a thiol group, or any other practicable functional group, excluding the synthetic methods described herein, whether or not Protected is also protected as needed, as will be known to those skilled in the art, for example, as taught by Greene et al., Protective Groups in Organic Synthesis , John Wiley and Sons, Third Edition, 1999. It is incorporated by reference.
當使用於本文中,術語「鹵烷基」係指如上文中所定義之烷基,其被一個或更多個鹵素原子所取代。舉例而言,C1-C4鹵烷基包括,但不限於氯甲基、溴甲基、二氯甲基、三氯甲基、氟甲基、二氟甲基、三氟甲基、氯氟甲 基、二氯氟甲基、氯二氟甲基、1-氯乙基、1-溴乙基、1-氟乙基、2-氟乙基、2,2-二氟乙基、2,2,2-三氟乙基、2-氯-2-氟乙基、2-氯-2,2-di氟乙基、2,2-二氯-2-氟乙基、2,2,2-三氯乙基、五氟乙基及等等。 As used herein, the term "haloalkyl" refers to an alkyl group as defined above, which is substituted with one or more halogen atoms. For example, C 1 -C 4 haloalkyl includes, but is not limited to, chloromethyl, bromomethyl, dichloromethyl, trichloromethyl, fluoromethyl, difluoromethyl, trifluoromethyl, chloro Fluoromethyl, dichlorofluoromethyl, chlorodifluoromethyl, 1-chloroethyl, 1-bromoethyl, 1-fluoroethyl, 2-fluoroethyl, 2,2-difluoroethyl, 2 , 2,2-trifluoroethyl, 2-chloro-2-fluoroethyl, 2-chloro-2,2-difluoroethyl, 2,2-dichloro-2-fluoroethyl, 2,2, 2-trichloroethyl, pentafluoroethyl and the like.
術語「烷氧基」,亦定義為-OR,其中R為烷基,係指-O-烷基,其中烷基係如上文所定義。同樣地,術語鹵烷氧基可以用來指-O-鹵烷基,其中鹵烷基係如上文所定義。於一些具體例中,烷氧基可以包括1個至6個碳原子。C1-C6-烷氧基之實例包括,但不限於甲氧基、乙氧基、C2H5-CH2O-、(CH3)2CHO-、正丁氧基、C2H5-CH(CH3)O-、(CH3)2CH-CH2O-、(CH3)3CO-、正戊氧基、1-甲基丁氧基、2-甲基丁氧基、3-甲基丁氧基、1,1-二甲基丙氧基、1,2-二甲基丙氧基、2,2-二甲基丙氧基、1-乙基丙氧基、正己氧基、1-甲基戊氧基、2-甲基戊氧基、3-甲基戊氧基、4-甲基戊氧基、1,1-二甲基丁氧基、1,2-二甲基丁氧基、1,3-二甲基丁氧基、2,2-二甲基丁氧基、2,3-二甲基丁氧基、3,3-二甲基丁氧基、1-乙基丁氧基、2-乙基丁氧基、1,1,2-三甲基丙氧基、1,2,2-三甲基丙氧基、1-乙基-1-甲基丙氧基,以及1-乙基-2-甲基丙氧基。 The term "alkoxy", also defined as -OR, wherein R is alkyl, refers to -O-alkyl, wherein alkyl is as defined above. Likewise, the term haloalkoxy can be used to refer to -O-haloalkyl, wherein haloalkyl is as defined above. In some embodiments, the alkoxy group can include from 1 to 6 carbon atoms. Examples of C 1 -C 6 -alkoxy include, but are not limited to, methoxy, ethoxy, C 2 H 5 -CH 2 O-, (CH 3 ) 2 CHO-, n-butoxy, C 2 H 5- CH(CH 3 )O-, (CH 3 ) 2 CH-CH 2 O-, (CH 3 ) 3 CO-, n-pentyloxy, 1-methylbutoxy, 2-methylbutoxy , 3-methylbutoxy, 1,1-dimethylpropoxy, 1,2-dimethylpropoxy, 2,2-dimethylpropoxy, 1-ethylpropoxy, n-Hexyloxy, 1-methylpentyloxy, 2-methylpentyloxy, 3-methylpentyloxy, 4-methylpentyloxy, 1,1-dimethylbutoxy, 1,2 - dimethylbutoxy, 1,3-dimethylbutoxy, 2,2-dimethylbutoxy, 2,3-dimethylbutoxy, 3,3-dimethylbutoxy , 1-ethylbutoxy, 2-ethylbutoxy, 1,1,2-trimethylpropoxy, 1,2,2-trimethylpropoxy, 1-ethyl-1 -methylpropoxy, and 1-ethyl-2-methylpropoxy.
術語「烷胺基」及「二烷胺基」係指烷基-NH-及(烷基)2N-,其中烷基係如上文所定義。同樣地,術語鹵烷胺基及鹵二烷胺基係指鹵烷基-NH-及(鹵烷基)2-NH-,其中鹵烷基係如上文所定義。術語「胺烷基」係指如上文所定義之烷基,其以一個胺基予以取代。 The terms "alkylamino" and "dialkylamino" mean alkyl-NH- and (alkyl) 2 N-, wherein alkyl is as defined above. Similarly, the term haloalkoxy group means a dialkylamino halo and haloalkyl and -NH- (haloalkyl) 2 -NH-, wherein haloalkyl is as defined above system. The term "aminoalkyl" refers to an alkyl group as defined above which is substituted with an amine group.
術語「烷基羰基」、「烷氧基羰基」、「烷胺基羰基」 及「二烷胺基羰基」係指-C(=O)-烷基、-C(O)-烷氧基、-C(O)-烷胺基,及-C(O)-二烷胺基,其中烷基、烷氧基、烷胺基,及二烷胺基係如上文所定義。 The terms "alkylcarbonyl", "alkoxycarbonyl", "alkylaminocarbonyl" And "dialkylaminocarbonyl" means -C(=O)-alkyl, -C(O)-alkoxy, -C(O)-alkylamino, and -C(O)-dialkylamine. A group wherein the alkyl group, the alkoxy group, the alkylamino group, and the dialkylamine group are as defined above.
當使用於本文中,術語「硼酸」係指-B(OH)2部分。術語硼酸衍生物係指由於存在或缺少一個或更多個原子、官能基,或是次結構,而不同於硼酸之含硼的部分,以及其等可以為想像,至少在理論上,由硼酸經由化學或物理方法而形成的。硼酸衍生物之實例包括硼酸酯類(boronic acid esters),亦稱為硼酸酯類(boronate)、硼酸酯類(boronate esters),或硼酸酯類(boronic esters);胺基硼酸酯類(aminoboranes),包括環狀胺基硼酸酯類,例如1,3,2-二氮雜硼雜環戊烷基(1,3,2-diazaborolidyl)基團;以及硼酸酐。術語硼酸酯類(boronic acid esters)係指一種酯化的硼酸部分,例如-B(OR)2,其中R是一個如上文所定義的烷基,以及環狀硼酸部分由-B(OR)2表示,其中該二個R取代基係鏈接在一起以形成一個C2-C6環狀部分,其選擇性地包括一個或更多個額外的雜原子(例如,N、O、S,或其等之組合),以及選擇性地進一步被一個或更多個取代基所取代及/或與一個或更多個另外的碳環或雜碳環基團稠合(共享至少一個鍵)。環狀硼酸酯類之實例包括,但不限於松節烷二醇硼酸酯(pinanediol boronic esters)、品納可硼酸酯(pinacol boronic esters)、1,2-乙二醇硼酸酯、1,3-丙二醇硼酸酯、1,2-丙二醇硼酸酯、2,3-丁二醇硼酸酯、1,1,2,2-四甲基乙二醇硼酸酯、1,2-二異丙基乙二醇硼酸酯、5,6-癸二醇硼酸酯、 1,2-二環己基乙二醇硼酸酯、雙環己基-1,1’-二醇硼酸酯、二乙醇胺硼酸酯,以及1,2-二苯基-1,2-乙二醇硼酸酯。 As used herein, the term "boric acid" refers to the -B(OH) 2 moiety. The term boric acid derivative means a boron-containing moiety different from boric acid due to the presence or absence of one or more atoms, functional groups, or sub-structures, and the like may be imagined, at least in theory, via boric acid. Formed by chemical or physical methods. Examples of boric acid derivatives include boronic acid esters, also known as boronate, boronate esters, or boronic esters; aminoboranes And includes cyclic amino boronic esters such as 1,3,2-diazaborolidyl groups; and boric anhydride. The term boronic acid esters refers to an esterified boronic acid moiety, such as -B(OR) 2 , wherein R is an alkyl group as defined above, and the cyclic boronic acid moiety is derived from -B(OR) 2 Representing wherein the two R substituents are linked together to form a C 2 -C 6 cyclic moiety, which optionally includes one or more additional heteroatoms (eg, N, O, S, or And the like, and optionally further substituted with one or more substituents and/or fused to one or more additional carbocyclic or heterocarbocyclic groups (shared at least one bond). Examples of cyclic borate esters include, but are not limited to, pinanediol boronic esters, pinacol boronic esters, 1,2-ethaneborate, 1 , 3-propanediol borate, 1,2-propanediol borate, 2,3-butanediol borate, 1,1,2,2-tetramethylglycol borate, 1,2- Diisopropylethylene glycol borate, 5,6-nonanediol borate, 1,2-dicyclohexylethylene glycol borate, dicyclohexyl-1,1'-diol borate, Diethanolamine borate, and 1,2-diphenyl-1,2-ethaneborate.
當使用於本文中,術語「鹵素」係指氟、氯、溴及碘原子。字首的鹵-(halo-)(例如,當以術語鹵烷基來說明)係指全部程度的鹵取代,從單一取代到全鹵取代(例如,當以甲基來說明,如氯甲基(-CH2Cl)、二氯甲基(-CHCl2)、三氯甲基(-CCl3))。 As used herein, the term "halogen" refers to fluorine, chlorine, bromine and iodine atoms. The halo-(halo-) of the prefix (for example, as the term haloalkyl is used) refers to the full degree of halo substitution, from single substitution to perhalo substitution (for example, when stated as methyl, such as chloromethyl) (-CH 2 Cl), dichloromethyl (-CHCl 2 ), trichloromethyl (-CCl 3 )).
術語「芳香族化合物」使用於本文中一般係指一芳香族環或稠合在一起的多個芳香族環。芳香族化合物之實例包括,舉例而言,苯、萘、蒽及等等。術語芳香族化合物也包括雜芳香族化合物(亦即,芳香族環碳原子中的一者或多者業已被像是O、N或S之雜原子代替之芳香族化合物)。雜芳香族化合物之實例包括,舉例而言,吡啶、呋喃、吲哚、苯并咪唑、噻吩、苯并噻吩及等等。 The term "aromatic compound" as used herein generally refers to an aromatic ring or a plurality of aromatic rings fused together. Examples of the aromatic compound include, for example, benzene, naphthalene, anthracene, and the like. The term aromatic compound also includes heteroaromatic compounds (i.e., one or more of the aromatic ring carbon atoms have been replaced by an aromatic compound such as a hetero atom of O, N or S). Examples of the heteroaromatic compound include, for example, pyridine, furan, hydrazine, benzimidazole, thiophene, benzothiophene, and the like.
當使用於本文中,術語「芳基」係指一種6個至14個碳原子之單價芳香族碳環基團。芳基基團可包括一個單一環或多個縮合環。於一些具體例中,芳基基團包括C6-C10芳基基團。芳基包括,但不限於苯基、聯苯基、萘基、四氫萘基、苯環丙基,以及氫茚基。芳基基團可以為未經取代的或是被選自於以下之一個或更多個部分所取代:鹵素、氰基、硝基、羥基、氫硫基、胺基、烷基、烯基、炔基、環烷基、環烯基、鹵烷基、鹵烯基、鹵炔基、鹵環烷基、鹵環烯基、烷氧基、烯氧基、炔氧基、鹵烷氧基、鹵烯氧基、鹵炔氧基、環烷氧基、環烯氧基、鹵環烷氧基、 鹵環烯氧基、烷基硫基、鹵烷基硫基、環烷基硫基、鹵環烷基硫基、烷基亞磺醯基、烯基亞磺醯基、炔基亞磺醯基、鹵烷基亞磺醯基、鹵烯基亞磺醯基、鹵炔基亞磺醯基、烷基磺醯基、烯基磺醯基、炔基磺醯基、鹵烷基磺醯基、鹵烯基磺醯基、鹵炔基-磺醯基、烷基胺基、烯基胺基、炔基胺基、二(烷基)胺基、二(烯基)胺基、二(炔基)胺基,或三烷基矽烷基。 As used herein, the term "aryl" refers to a monovalent aromatic carbocyclic group of 6 to 14 carbon atoms. The aryl group can include a single ring or multiple condensed rings. In some embodiments, the aryl group includes a C 6 -C 10 aryl group. Aryl groups include, but are not limited to, phenyl, biphenyl, naphthyl, tetrahydronaphthyl, phenylcyclopropyl, and hydroquinone. The aryl group may be unsubstituted or substituted with one or more moieties selected from the group consisting of halogen, cyano, nitro, hydroxy, thiol, amine, alkyl, alkenyl, Alkynyl, cycloalkyl, cycloalkenyl, haloalkyl, haloalkenyl, haloalkynyl, halocycloalkyl, halocycloalkenyl, alkoxy, alkenyloxy, alkynyloxy, haloalkoxy, Haloalkenyloxy, haloalkoxy, cycloalkoxy, cycloalkenyloxy, halocycloalkoxy, halocycloalkenyloxy, alkylthio, haloalkylthio, cycloalkylthio, halo Cycloalkylthio, alkylsulfinyl, alkenylsulfinyl, alkynylsulfinyl, haloalkylsulfinyl, haloalkylsulfinyl, haloalkynylenesulfinyl Alkylsulfonyl, alkenylsulfonyl, alkynylsulfonyl, haloalkylsulfonyl, haloalylsulfonyl, haloalkynyl-sulfonyl, alkylamino, alkenylamino An alkynylamino group, a di(alkyl)amino group, a di(alkenyl)amino group, a bis(alkynyl)amino group, or a trialkyldecyl group.
當使用於本文中,術語「雜芳基」係指一種1個至15個碳原子之單價芳香族基團(例如,1個至10個碳原子,2個至8個碳原子,3個至6個碳原子,或是4個至6個碳原子),環內具有一個或多個雜原子。雜芳基基團可以包括1至4個雜原子,1至3個雜原子,或是1至2個雜原子。於一些例子中,環內包含的雜原子為氧、氮、硫,或其等之組合。當存在時,氮或硫雜原子可以選擇性地被氧化。雜芳基基團可以具有一個單一環(例如,吡啶基或呋喃基)或是多個縮合環,但有條件是附接之處係通過雜芳基環原子。較佳的雜芳基包括吡啶基、嗒基、嘧啶基、吡基、三基、吡咯基、吲哚基、喹啉基、異喹啉基、喹唑啉基、喹喏啉基、呋喃基、苯硫基、呋喃基、咪唑基、唑基、異唑基、異噻唑基、吡唑基、苯并呋喃基,以及苯并苯硫基。雜芳基環可以為未經取代的或是被如上所述芳基之一個或更多個部分所取代。 As used herein, the term "heteroaryl" refers to a monovalent aromatic group of from 1 to 15 carbon atoms (eg, from 1 to 10 carbon atoms, from 2 to 8 carbon atoms, 3 to 6 carbon atoms, or 4 to 6 carbon atoms), having one or more heteroatoms in the ring. The heteroaryl group may include from 1 to 4 heteroatoms, from 1 to 3 heteroatoms, or from 1 to 2 heteroatoms. In some examples, the heteroatoms contained within the ring are oxygen, nitrogen, sulfur, or combinations thereof. When present, nitrogen or sulfur heteroatoms can be selectively oxidized. The heteroaryl group can have a single ring (e.g., pyridyl or furyl) or multiple fused rings, provided that the attachment is through a heteroaryl ring atom. Preferred heteroaryl groups include pyridyl, fluorene Base, pyrimidinyl, pyridyl Base, three Base, pyrrolyl, fluorenyl, quinolyl, isoquinolyl, quinazolinyl, quinoxalinyl, furyl, phenylthio, furyl, imidazolyl, Azolyl, different Azolyl, isothiazolyl, pyrazolyl, benzofuranyl, and benzophenylthio. The heteroaryl ring can be unsubstituted or substituted with one or more moieties of an aryl group as described above.
提供用於製備氧硼基化芳香族化合物之方法。用 於製備氧硼基化芳香族化合物之方法可以包含於形成該氧硼基化芳香族化合物有效的條件下,使一種芳香族基質與一種催化性鈷錯合物及一種氧硼基化試劑接觸。 A method for preparing an oxyborylated aromatic compound is provided. use The method for preparing an oxyborylated aromatic compound may comprise contacting an aromatic matrix with a catalytic cobalt complex and an oxyborylating agent under conditions effective to form the borolated aromatic compound.
芳香族基質可以為能經歷C-H活化氧硼基化之任何合適的芳香族基質。舉例而言,芳香族基質可以為經取代的或未經取代的芳基化合物(例如,經取代的或未經取代的苯)、經取代的或未經取代的六員雜芳香族基質(例如,經取代的或未經取代的吡啶),或是經取代的或未經取代的五員雜芳香族基質(例如,經取代的或未經取代的吡咯、經取代的或未經取代的呋喃,或是經取代的或未經取代的噻吩)。 The aromatic matrix can be any suitable aromatic matrix capable of undergoing C-H activated oxyborylation. For example, the aromatic matrix can be a substituted or unsubstituted aryl compound (eg, substituted or unsubstituted benzene), a substituted or unsubstituted six-membered heteroaromatic matrix (eg, , substituted or unsubstituted pyridine), or substituted or unsubstituted five-membered heteroaromatic matrix (eg, substituted or unsubstituted pyrrole, substituted or unsubstituted furan) Or a substituted or unsubstituted thiophene).
於一些例子中,該芳香族基質可以包含一個苯環。舉例而言,該芳香族基質可以包含一種由式I所定義之化合物
其中A於每次出現時獨立地為,氫、鹵素、-OR1、-NR2R3、-C(=O)R4、腈基、C1-C6烷基、C1-C6鹵烷基,或是硼酸或硼酸衍生物,R1、R2及R3於每次出現時各自獨立地為,氫或是C1-C6烷基,以及 R4於每次出現時獨立地為,氫、-OR1、-NR2R3,或C1-C6烷基。 Wherein A is independently at each occurrence, hydrogen, halogen, -OR 1 , -NR 2 R 3 , -C(=O)R 4 , nitrile group, C 1 -C 6 alkyl group, C 1 -C 6 Haloalkyl, or a boronic acid or boronic acid derivative, each of R 1 , R 2 and R 3 being independently, hydrogen or C 1 -C 6 alkyl, and R 4 is independently present at each occurrence The ground is hydrogen, -OR 1 , -NR 2 R 3 , or C 1 -C 6 alkyl.
於此等具體例中,該氧硼基化芳香族化合物可以包含由式II所定義之化合物
其中A於每次出現時係如上所述,以及Y為硼酸或硼酸衍生物。在某些例子中,該氧硼基化芳香族化合物可以包含一種由式II所定義之化合物,其中Y為一種選自於下列中之一者的硼酸衍生物:
於一些例子中,該芳香族基質可以包含一種六員雜芳香族化合物。於某些例子中,該芳香族基質可以包含
一種由式IIIa、式IIIb,或式IIIc中之一者所定義之六員雜芳香族
其中A於每次出現時獨立地為,氫、鹵素、-OR1、-NR2R3、-C(=O)R4、腈基、C1-C6烷基、C1-C6鹵烷基,或是硼酸或硼酸衍生物,R1、R2及R3於每次出現時各自獨立地為,氫或是C1-C6烷基,以及R4於每次出現時獨立地為,氫、-OR1、-NR2R3,或C1-C6烷基。 Wherein A is independently at each occurrence, hydrogen, halogen, -OR 1 , -NR 2 R 3 , -C(=O)R 4 , nitrile group, C 1 -C 6 alkyl group, C 1 -C 6 Haloalkyl, or a boronic acid or boronic acid derivative, each of R 1 , R 2 and R 3 being independently, hydrogen or C 1 -C 6 alkyl, and R 4 is independently present at each occurrence The ground is hydrogen, -OR 1 , -NR 2 R 3 , or C 1 -C 6 alkyl.
於此等具體例中,該氧硼基化芳香族化合物可以包含一種由式IVa、式IVb,或式IVc中之一者所定義之化合物
其中A於每次出現時係如上所述,以及Y為硼酸或硼酸衍生物。在某些例子中,該氧硼基化芳香族化合物可以包含一種由式IVa、式IVb,或式IVc所定義之化合物,其中Y
為一種選自於下列中之一者的硼酸衍生物:
於一些例子中,該芳香族基質可以包含一種五員雜芳香族化合物。於某些例子中,該芳香族基質可以包含一種由式Va或式Vb中之一者所定義之五員雜芳香族
其中X為NH、O,或S;A於每次出現時獨立地為,氫、鹵素、-OR1、-NR2R3、-C(=O)R4、腈基、C1-C6烷基、C1-C6鹵烷基,或是硼酸或硼酸衍生物,R1、R2及R3於每次出現時各自獨立地為,氫或是C1-C6烷基,以及 R4於每次出現時獨立地為,氫、-OR1、-NR2R3,或C1-C6烷基。 Wherein X is NH, O, or S; A is independently at each occurrence, hydrogen, halogen, -OR 1 , -NR 2 R 3 , -C(=O)R 4 , nitrile group, C 1 -C a 6 alkyl group, a C 1 -C 6 haloalkyl group, or a boronic acid or a boronic acid derivative, each of which R 1 , R 2 and R 3 are independently, hydrogen or C 1 -C 6 alkyl, And R 4 is independently, on each occurrence, hydrogen, -OR 1 , -NR 2 R 3 , or C 1 -C 6 alkyl.
於此等具體例中,該氧硼基化芳香族化合物可以包含一種由式VIa或式VIb中之一者所定義之化合物
其中A於每次出現時係如上所述,以及Y為一種硼酸或硼酸衍生物。在某些例子中,該氧硼基化芳香族化合物可以包含一種由式VIa或式VIb所定義之化合物,其中Y為一種選自於下列中之一者的硼酸衍生物:
芳香族基質對氧硼基化芳香族化合物之轉化百分率會取決於一些因素而變化,包括芳香族基質的反應性、催化性鈷錯合物的本體,以及氧硼基化試劑的本體。於一 些具體例中,芳香族基質對氧硼基化芳香族化合物之轉化百分率可以為至少30%(例如,至少35%,至少40%,至少45%,至少50%,至少55%,至少60%,至少65%,至少70%,至少75%,至少80%,至少85%,至少90%,或是至少95%)。 The percent conversion of the aromatic matrix to the boron boronated aromatic compound will vary depending on a number of factors, including the reactivity of the aromatic matrix, the bulk of the catalytic cobalt complex, and the bulk of the boron boronation reagent. Yu Yi In some embodiments, the percent conversion of the aromatic matrix to the oxyborylated aromatic compound can be at least 30% (eg, at least 35%, at least 40%, at least 45%, at least 50%, at least 55%, at least 60%). , at least 65%, at least 70%, at least 75%, at least 80%, at least 85%, at least 90%, or at least 95%).
以上所述之形成氧硼基化芳香族化合物之方法可以包含,使待反應之該芳香族基質與一種催化性鈷錯合物及一種氧硼基化試劑接觸。該芳香族基質可以以任何合適的方式與該催化性鈷錯合物及該氧硼基化試劑接觸,以使得該芳香族基質及該氧硼基化試劑係以催化有效量的該催化性鈷錯合物之組合存在。舉例而言,可以藉由以任何順序或方式來組合該芳香族基質、該催化性鈷錯合物及該氧硼基化試劑於單一反應容器或溶液中(例如,藉由循序的或同時添加該芳香族基質、該催化性鈷錯合物及該氧硼基化試劑至反應容器),而使該芳香族基質與該催化性鈷錯合物及該氧硼基化試劑接觸。於一些具體例中,該芳香族基質可以於大於25℃至85℃的溫度下,與該催化性鈷錯合物及該氧硼基化試劑接觸。 The above method for forming an oxyborylated aromatic compound may comprise contacting the aromatic substrate to be reacted with a catalytic cobalt complex and an oxyborylating agent. The aromatic matrix can be contacted with the catalytic cobalt complex and the boron boronation reagent in any suitable manner such that the aromatic matrix and the boronylation reagent are catalytically effective amounts of the catalytic cobalt. A combination of complex compounds is present. For example, the aromatic matrix, the catalytic cobalt complex, and the borolylation reagent can be combined in a single reaction vessel or solution by any order or manner (eg, by sequential or simultaneous addition) The aromatic matrix, the catalytic cobalt complex and the borohydride reagent are introduced into a reaction vessel, and the aromatic matrix is contacted with the catalytic cobalt complex and the borohydride reagent. In some embodiments, the aromatic matrix can be contacted with the catalytic cobalt complex and the borohydride reagent at a temperature greater than 25 ° C to 85 ° C.
催化性鈷錯合物可以為能催化芳香族基質的C-H活化氧硼基化之任何合適的鈷(I)或鈷(II)錯合物。在某些具體例中,該催化性鈷錯合物為一種鈷(I)錯合物。 The catalytic cobalt complex can be any suitable cobalt (I) or cobalt (II) complex that catalyzes the C-H activated oxyborylation of the aromatic matrix. In some embodiments, the catalytic cobalt complex is a cobalt (I) complex.
於一些具體例中,該催化性鈷錯合物可以包含一種含有三牙配位子之鈷鉗合錯合物。舉例而言,該催化性鈷錯合物可以為一種鈷螯錯合物。於一些例子中,該催化性鈷錯合物可以為一種鈷鉗合錯合物,其含有CCC、CNC、
CNS、NNN、NCN、PCP、PNP、PCN、OCO、SCS、SNS,或是SPS螯配位子。於某些具體例中,該催化性鈷錯合物不是一種含有NNN或NPN螯配位子之鈷鉗合錯合物。於某些具體例中,該催化性鈷錯合物不是下列中之一者:
於某些具體例中,該催化性鈷錯合物不是一種鈷螯錯合物。 In some embodiments, the catalytic cobalt complex is not a cobalt chelate complex.
於一些具體例中,該催化性鈷錯合物可以包含一種由以下式所定義之錯合物
其中Z於每次出現時獨立地為,鹵化物、C1-C6烷基,或芳基,_ n為0、1、2,或3,E為-CH2-、-C(R10)2-、-NR7-、-S-,或-O-,R5於每次出現時獨立地為,鹵素、-OR7、-NR7R7、-C(=O)R8、腈基、C1-C6烷基、芳基,或是C1-C6鹵烷基,m為0、1、2,或3,R7於每次出現時獨立地為,氫或是C1-C6烷基,R8於每次出現時獨立地為,氫、-OR7、-NR7R7,或是C1-C6烷基,R9於每次出現時獨立地為,C1-C6烷基、芳基,或是-OR10,以及R10於每次出現時獨立地為,C1-C6烷基或芳基。 Wherein Z is independently, at each occurrence, a halide, a C 1 -C 6 alkyl group, or an aryl group, _ n is 0, 1, 2, or 3, and E is -CH 2 -, -C (R 10 2 -, -NR 7 -, -S-, or -O-, R 5 is independently, each occurrence, halogen, -OR 7 , -NR 7 R 7 , -C(=O)R 8 , a nitrile group, a C 1 -C 6 alkyl group, an aryl group, or a C 1 -C 6 haloalkyl group, m is 0, 1, 2, or 3, and R 7 is independently, in each occurrence, hydrogen or C 1 -C 6 alkyl, R 8 is independently, on each occurrence, hydrogen, -OR 7 , -NR 7 R 7 , or C 1 -C 6 alkyl, R 9 independently at each occurrence That is, C 1 -C 6 alkyl, aryl, or -OR 10 , and R 10 are , independently of each occurrence, a C 1 -C 6 alkyl or aryl group.
於此等具體例的一些之中,E可以選自於-CH2-及-C(R10)2-,其中R10係如以上所定義。 In some of these specific examples, E may be selected from -CH 2 - and -C(R 10 ) 2 -, wherein R 10 is as defined above.
於一些具體例中,該催化性鈷錯合物可以包含一種由以下式所定義之錯合物
其中Z於每次出現時獨立地為,鹵化物、C1-C6烷基,或芳基,_n為0、1、2,或3,E為-CH2-、-C(R10)2-、-NR7-、-S-,或-O-, R5於每次出現時獨立地為,鹵素、-OR7、-NR7R7、-C(=O)R8、腈基、C1-C6烷基、芳基,或是C1-C6鹵烷基,m為0、1、2,或3,L為-OR10或-NR10R10,R7於每次出現時獨立地為,氫或是C1-C6烷基,R8於每次出現時獨立地為,氫、-OR7、-NR7R7,或是C1-C6烷基,R9於每次出現時獨立地為,C1-C6烷基、芳基,或是-OR10,以及R10於每次出現時獨立地為,C1-C6烷基,或芳基。 Wherein Z is independently, at each occurrence, a halide, a C 1 -C 6 alkyl group, or an aryl group, _n is 0, 1, 2, or 3, and E is -CH 2 -, -C(R 10 ) 2 -, -NR 7 -, -S-, or -O-, R 5 is independently at each occurrence, halogen, -OR 7 , -NR 7 R 7 , -C(=O)R 8 , nitrile a C 1 -C 6 alkyl group, an aryl group, or a C 1 -C 6 haloalkyl group, m is 0, 1, 2, or 3, and L is -OR 10 or -NR 10 R 10 , R 7 is Each occurrence is independently hydrogen or C 1 -C 6 alkyl, and R 8 is independently at each occurrence, hydrogen, -OR 7 , -NR 7 R 7 , or C 1 -C 6 alkane a radical, R 9 , at each occurrence, is independently C 1 -C 6 alkyl, aryl, or -OR 10 , and R 10 is independently, in each occurrence, C 1 -C 6 alkyl, Or aryl.
於一些具體例中,該催化性鈷錯合物可以包含一種由以下式所定義之錯合物
其中Z於每次出現時獨立地為,鹵化物、C1-C6烷基,或芳基,n為0、1、2,或3,E為-CH2-、-C(R10)2-、-NR7-、-S-,或-O-,R5於每次出現時獨立地為,鹵素、-OR7、-NR7R7、-C(=O)R8、腈基、C1-C6烷基、芳基, 或是C1-C6鹵烷基,m為0、1、2,或3,R7於每次出現時獨立地為,氫或是C1-C6烷基,R8於每次出現時獨立地為,氫、-OR7、-NR7R7,或是C1-C6烷基,R9於每次出現時獨立地為,C1-C6烷基、芳基,或是-OR10,以及R10於每次出現時獨立地為,C1-C6烷基或芳基。 Wherein Z is independently, at each occurrence, a halide, a C 1 -C 6 alkyl group, or an aryl group, n is 0, 1, 2, or 3, and E is -CH 2 -, -C(R 10 ) 2 -, -NR 7 -, -S-, or -O-, R 5 is independently at each occurrence, halogen, -OR 7 , -NR 7 R 7 , -C(=O)R 8 , nitrile a C 1 -C 6 alkyl group, an aryl group, or a C 1 -C 6 haloalkyl group, m is 0, 1, 2, or 3, and R 7 is independently, in each occurrence, hydrogen or C. 1 -C 6 alkyl, R 8 is independently, on each occurrence, hydrogen, -OR 7 , -NR 7 R 7 , or C 1 -C 6 alkyl, R 9 is independently , C 1 -C 6 alkyl, aryl, or -OR 10 , and R 10 is independently, on each occurrence, a C 1 -C 6 alkyl or aryl group.
於此等具體例的一些之中,E可以選自於-CH2-及-C(R10)2-,其中R10係如以上所定義。 In some of these specific examples, E may be selected from -CH 2 - and -C(R 10 ) 2 -, wherein R 10 is as defined above.
於一些具體例中,該催化性鈷錯合物可以包含一種由以下式所定義之錯合物
其中Z於每次出現時獨立地為,鹵化物、C1-C6烷基,或芳基,_n為0、1、2,或3,R5於每次出現時獨立地為,鹵素、-OR7、-NR7R7、-C(=O)R8、腈基、C1-C6烷基、芳基,或是C1-C6鹵烷基,m為0、1、2,或3,L為-OR10或-NR10R10, R7於每次出現時獨立地為,氫或是C1-C6烷基,R8於每次出現時獨立地為,氫、-OR7、-NR7R7,或是C1-C6烷基,以及R10於每次出現時獨立地為,C1-C6烷基或芳基。 Wherein Z is independently, at each occurrence, a halide, a C 1 -C 6 alkyl group, or an aryl group, _n is 0, 1, 2, or 3, and R 5 is independently, in each occurrence, halogen, -OR 7 , -NR 7 R 7 , -C(=O)R 8 , nitrile group, C 1 -C 6 alkyl group, aryl group, or C 1 -C 6 haloalkyl group, m is 0, 1, 2, or 3, L is -OR 10 or -NR 10 R 10 , R 7 is independently, on each occurrence, hydrogen or C 1 -C 6 alkyl, and R 8 is independently, on each occurrence, Hydrogen, -OR 7 , -NR 7 R 7 , or C 1 -C 6 alkyl, and R 10 is independently, on each occurrence, a C 1 -C 6 alkyl or aryl group.
於一些具體例中,該催化性鈷錯合物可以包含一種由以下式所定義之錯合物
其中Z於每次出現時獨立地為,鹵化物、C1-C6烷基,或芳基,_n為0、1、2,或3,E為-CH2-、-C(R10)2-、-NR7-、-S-,或-O-,R5於每次出現時獨立地為,鹵素、-OR7、-NR7R7、-C(=O)R8、腈基、C1-C6烷基、芳基,或是C1-C6鹵烷基,m為0、1、2,或3,R7於每次出現時獨立地為,氫或是C1-C6烷基,R8於每次出現時獨立地為,氫、-OR7、-NR7R7,或是C1-C6烷基,R9於每次出現時獨立地為,C1-C6烷基、芳基,或是-OR10,以及R10於每次出現時獨立地為,C1-C6烷基或芳基。 Wherein Z is independently, at each occurrence, a halide, a C 1 -C 6 alkyl group, or an aryl group, _n is 0, 1, 2, or 3, and E is -CH 2 -, -C(R 10 ) 2 -, -NR 7 -, -S-, or -O-, R 5 is independently at each occurrence, halogen, -OR 7 , -NR 7 R 7 , -C(=O)R 8 , nitrile a C 1 -C 6 alkyl group, an aryl group, or a C 1 -C 6 haloalkyl group, m is 0, 1, 2, or 3, and R 7 is independently, in each occurrence, hydrogen or C. 1 -C 6 alkyl, when R 8 at each occurrence is independently, hydrogen, -OR 7, -NR 7 R 7 , or C 1 -C 6 alkyl, R 9 at each occurrence is independently , C 1 -C 6 alkyl, aryl, or -OR 10 , and R 10 is independently, on each occurrence, a C 1 -C 6 alkyl or aryl group.
於此等具體例的一些之中,E可以選自於-CH2-及-C(R10)2-,其中R10係如以上所定義。 In some of these specific examples, E may be selected from -CH 2 - and -C(R 10 ) 2 -, wherein R 10 is as defined above.
於一些具體例中,該催化性鈷錯合物可以包含一種由以下式所定義之錯合物
其中Z於每次出現時獨立地為,鹵化物、C1-C6烷基,或芳基,n為0、1、2,或3,E為-CH2-、-C(R10)2-、-NR7-、-S-,或-O-,R5於每次出現時獨立地為,鹵素、-OR7、-NR7R7、-C(=O)R8、腈基、C1-C6烷基、芳基,或是C1-C6鹵烷基,m為0、1、2,或3,L為-OR10或-NR10R10,R7於每次出現時獨立地為,氫或是C1-C6烷基,R8於每次出現時獨立地為,氫、-OR7、-NR7R7,或是C1-C6烷基,以及R10於每次出現時獨立地為,C1-C6烷基或芳基。 Wherein Z is independently, at each occurrence, a halide, a C 1 -C 6 alkyl group, or an aryl group, n is 0, 1, 2, or 3, and E is -CH 2 -, -C(R 10 ) 2 -, -NR 7 -, -S-, or -O-, R 5 is independently at each occurrence, halogen, -OR 7 , -NR 7 R 7 , -C(=O)R 8 , nitrile a C 1 -C 6 alkyl group, an aryl group, or a C 1 -C 6 haloalkyl group, m is 0, 1, 2, or 3, and L is -OR 10 or -NR 10 R 10 , R 7 is Each occurrence is independently hydrogen or C 1 -C 6 alkyl, and R 8 is independently at each occurrence, hydrogen, -OR 7 , -NR 7 R 7 , or C 1 -C 6 alkane group, and R 10 at each occurrence is independently, C 1 -C 6 alkyl or aryl.
於此等具體例的一些之中,E可以選自於-CH2-及-C(R10)2-,其中R10係如以上所定義。 In some of these specific examples, E may be selected from -CH 2 - and -C(R 10 ) 2 -, wherein R 10 is as defined above.
於一些具體例中,該催化性鈷錯合物可以包含一
種由以下式所定義之錯合物
其中Z於每次出現時獨立地為,鹵化物、C1-C6烷基,或芳基,n為0、1、2,或3,R5於每次出現時獨立地為,鹵素、-OR7、-NR7R7、-C(=O)R8、腈基、C1-C6烷基、芳基,或是C1-C6鹵烷基,m為0、1、2、3,或4,R7於每次出現時獨立地為,氫或是C1-C6烷基,R8於每次出現時獨立地為,氫、-OR7、-NR7R7,或是C1-C6烷基,以及R11及R12係各自獨立選自於,氫、鹵素、-OR7、-NR7R7、-C(=O)R8、腈基、C1-C6烷基、芳基,或C1-C6鹵烷基,或是R11及R12和其等附接之碳原子一起形成一個苯環,其選擇性地被1個至4個取代基所取代,該取代基係獨立選自於鹵素、-OR7、-NR7R7、-C(=O)R8、腈基、C1-C6烷基、芳基,或C1-C6鹵烷基。 Wherein at each occurrence Z is independently, a halide, C 1 -C 6 alkyl group, or aryl group, n is 0, 1, or 3, R 5 at each occurrence is independently, halo, -OR 7 , -NR 7 R 7 , -C(=O)R 8 , nitrile group, C 1 -C 6 alkyl group, aryl group, or C 1 -C 6 haloalkyl group, m is 0, 1, 2, 3, or 4, R 7 is independently at each occurrence, hydrogen or C 1 -C 6 alkyl, R 8 is independently at each occurrence, hydrogen, -OR 7 , -NR 7 R 7 or C 1 -C 6 alkyl, and R 11 and R 12 are each independently selected from, hydrogen, halogen, -OR 7 , -NR 7 R 7 , -C(=O)R 8 , nitrile group a C 1 -C 6 alkyl group, an aryl group, or a C 1 -C 6 haloalkyl group, or R 11 and R 12 and their attached carbon atoms together form a benzene ring, which is selectively 1 Substituted to 4 substituents independently selected from halogen, -OR 7 , -NR 7 R 7 , -C(=O)R 8 , nitrile group, C 1 -C 6 alkyl group, aryl group , or a C 1 -C 6 haloalkyl group.
於一些具體例中,該催化性鈷錯合物可以包含一種由以下式所定義之錯合物
其中Z於每次出現時獨立地為,鹵化物、C1-C6烷基,或芳基,n為0、1、2,或3,R5於每次出現時獨立地為,鹵素、-OR7、-NR7R7、-C(=O)R8、腈基、C1-C6烷基、芳基,或是C1-C6鹵烷基,m為0、1、2、3,或4,B為-P(R9)2、-OR10或-NR10R10,R7於每次出現時獨立地為,氫或是C1-C6烷基,R8於每次出現時獨立地為,氫、-OR7、-NR7R7,或是C1-C6烷基,R9於每次出現時獨立地為,C1-C6烷基、芳基,或是-OR10,R10於每次出現時獨立地為,C1-C6烷基或芳基,R11及R12係各自獨立選自於,氫、鹵素、-OR7、-NR7R7、-C(=O)R8、腈基、C1-C6烷基、芳基,或C1-C6鹵烷基,或是R11及R12和其等附接之碳原子一起形成一個苯環,其選擇性地被1個至4個取代基所取代,該取代基係獨立選自於鹵素、 -OR7、-NR7R7、-C(=O)R8、腈基、C1-C6烷基、芳基,或C1-C6鹵烷基,以及R13及R14係各自獨立選自於,氫、鹵素、-OR7、-NR7R7、-C(=O)R8、腈基、C1-C6烷基、芳基,或C1-C6鹵烷基,或是R13及R14和其等附接之碳原子一起形成一個苯環,其選擇性地被1個至4個取代基所取代,該取代基係獨立選自於鹵素、-OR7、-NR7R7、-C(=O)R8、腈基、C1-C6烷基、芳基,或C1-C6鹵烷基。 Wherein Z is independently, at each occurrence, a halide, a C 1 -C 6 alkyl group, or an aryl group, n being 0, 1, 2, or 3, and R 5 is independently, in each occurrence, halogen, -OR 7, -NR 7 R 7, -C (= O) R 8, nitrile, C 1 -C 6 alkyl group, an aryl group, or a C 1 -C 6 haloalkyl, m is 0, 2, 3, or 4, B is -P(R 9 ) 2 , -OR 10 or -NR 10 R 10 , R 7 is independently, on each occurrence, hydrogen or C 1 -C 6 alkyl, R 8 at each occurrence is independently hydrogen, -OR 7 , -NR 7 R 7 , or C 1 -C 6 alkyl, R 9 is independently at each occurrence, C 1 -C 6 alkyl , aryl, or -OR 10 , R 10 is independently, in each occurrence, a C 1 -C 6 alkyl or aryl group, and R 11 and R 12 are each independently selected from, hydrogen, halogen, -OR 7 , -NR 7 R 7 , -C(=O)R 8 , a nitrile group, a C 1 -C 6 alkyl group, an aryl group, or a C 1 -C 6 haloalkyl group, or R 11 and R 12 and The attached carbon atoms together form a benzene ring which is optionally substituted with from 1 to 4 substituents independently selected from halogen, -OR 7 , -NR 7 R 7 , -C( = O) R 8, nitrile, C 1 -C 6 alkyl group, an aryl group, or a C 1 -C 6 haloalkoxy , And R 13 and R 14 are each independently selected from the Department, hydrogen, halogen, -OR 7, -NR 7 R 7 , -C (= O) R 8, nitrile, C 1 -C 6 alkyl group, an aryl group Or a C 1 -C 6 haloalkyl group, or R 13 and R 14 and their attached carbon atoms together form a benzene ring which is optionally substituted with from 1 to 4 substituents, the substituent Department independently selected from halo, -OR 7, -NR 7 R 7 , -C (= O) R 8, nitrile, C 1 -C 6 alkyl group, an aryl group, or a C 1 -C 6 haloalkyl.
於一些具體例中,該催化性鈷錯合物可以包含一種由以下式所定義之錯合物
其中Z於每次出現時獨立地為,鹵化物、C1-C6烷基,或芳基,n為0、1、2,或3,B為-P(R9)2、-OR10或-NR10R10,R9於每次出現時獨立地為,C1-C6烷基、芳基,或是-OR10,R10於每次出現時獨立地為,C1-C6烷基或芳基,R11及R12係各自獨立選自於,氫、鹵 素、-OR7、-NR7R7、-C(=O)R8、腈基、C1-C6烷基、芳基,或C1-C6鹵烷基,或是R11及R12和其等附接之碳原子一起形成一個苯環,其選擇性地被1個至4個取代基所取代,該取代基係獨立選自於鹵素、-OR7、-NR7R7、-C(=O)R8、腈基、C1-C6烷基、芳基,或C1-C6鹵烷基,以及R13及R14係各自獨立選自於,氫、鹵素、-OR7、-NR7R7、-C(=O)R8、腈基、C1-C6烷基、芳基,或C1-C6鹵烷基,或是R13及R14和其等附接之碳原子一起形成一個苯環,其選擇性地被1個至4個取代基所取代,該取代基係獨立選自於鹵素、-OR7、-NR7R7、-C(=O)R8、腈基、C1-C6烷基、芳基,或C1-C6鹵烷基,R15及R16係各自獨立選自於,氫、鹵素、-OR7、-NR7R7、-C(=O)R8、腈基、C1-C6烷基、芳基,或C1-C6鹵烷基,或是R15及R16和其等附接之碳原子一起形成一個苯環,其選擇性地被1個至4個取代基所取代,該取代基係獨立選自於鹵素、-OR7、-NR7R7、-C(=O)R8、腈基、C1-C6烷基、芳基,或C1-C6鹵烷基,R7於每次出現時獨立地為,氫或是C1-C6烷基,以及R8於每次出現時獨立地為,氫、-OR7、-NR7R7,或是C1-C6烷基。 Wherein at each occurrence Z is independently, a halide, C 1 -C 6 alkyl group, or aryl group, n is 0, 1, or 3, B is -P (R 9) 2, -OR 10 Or -NR 10 R 10 , R 9 is independently at each occurrence, C 1 -C 6 alkyl, aryl, or -OR 10 , R 10 is independently, on each occurrence, C 1 -C 6 alkyl or aryl, R 11 and R 12 are each independently selected from, hydrogen, halogen, -OR 7 , -NR 7 R 7 , -C(=O)R 8 , nitrile group, C 1 -C 6 An alkyl group, an aryl group, or a C 1 -C 6 haloalkyl group, or R 11 and R 12 and their attached carbon atoms together form a benzene ring which is optionally substituted by 1 to 4 substituents Substituted, the substituent is independently selected from halogen, -OR 7 , -NR 7 R 7 , -C(=O)R 8 , nitrile group, C 1 -C 6 alkyl group, aryl group, or C 1 -C 6 haloalkyl, and R 13 and R 14 are each independently selected from, hydrogen, halogen, -OR 7 , -NR 7 R 7 , -C(=O)R 8 , nitrile group, C 1 -C 6 alkane a aryl group, an aryl group, or a C 1 -C 6 haloalkyl group, or R 13 and R 14 and their attached carbon atoms together form a benzene ring which is optionally substituted by from 1 to 4 substituents The substituent is independently selected from halogen, -O R 7 , -NR 7 R 7 , -C(=O)R 8 , nitrile group, C 1 -C 6 alkyl group, aryl group, or C 1 -C 6 haloalkyl group, R 15 and R 16 systems are each independently Selected from, hydrogen, halogen, -OR 7 , -NR 7 R 7 , -C(=O)R 8 , nitrile group, C 1 -C 6 alkyl group, aryl group, or C 1 -C 6 haloalkyl group Or R 15 and R 16 together with their attached carbon atoms form a benzene ring which is optionally substituted by from 1 to 4 substituents independently selected from halogen, -OR 7 , -NR 7 R 7, when -C (= O) R 8, nitrile, C 1 -C 6 alkyl group, an aryl group, or a C 1 -C 6 haloalkyl, R 7 is independently in each occurrence, , hydrogen or C 1 -C 6 alkyl, and R 8 is, independently of each occurrence, hydrogen, -OR 7 , -NR 7 R 7 , or C 1 -C 6 alkyl.
於一些具體例中,該催化性鈷錯合物可以包含一種含有雙牙配位子之鈷鉗合錯合物。舉例而言,於一些具
體例中,該催化性鈷錯合物可以包含一種由以下式所定義之錯合物
其中Z於每次出現時獨立地為,鹵化物、C1-C6烷基,或芳基,n為2,R5於每次出現時獨立地為,鹵素、-OR7、-NR7R7、-C(=O)R8、腈基、C1-C6烷基、芳基,或是C1-C6鹵烷基,m為0、1、2、3,或4,R6係選自於下列中之一者:
R7於每次出現時獨立地為,氫或是C1-C6烷基,以及R8於每次出現時獨立地為,氫、-OR7、-NR7R7,或是C1-C6烷基。 R 7 is independently at each occurrence, hydrogen or C 1 -C 6 alkyl, and R 8 is independently, on each occurrence, hydrogen, -OR 7 , -NR 7 R 7 , or C 1 -C 6 alkyl.
於一些具體例中,該催化性鈷錯合物可以包含一種只含有單牙配位子之鈷錯合物。舉例而言,該催化性鈷錯合物可以包含Py2Co(CH2SiMe3)2。於一些具體例中,該催化性鈷錯合物可以包含一種N-雜環碳烯連接的(carbene-ligated)鈷錯合物。 In some embodiments, the catalytic cobalt complex can comprise a cobalt complex containing only a single tooth ligand. For example, the catalytic cobalt complex can comprise Py 2 Co(CH 2 SiMe 3 ) 2 . In some embodiments, the catalytic cobalt complex can comprise an N-heterocyclic carbene-ligated cobalt complex.
於一些具體例中,該催化性鈷錯合物可以包含一 種多金屬鈷錯合物,諸如一種橋聯二鈷錯合物。舉例而言,該催化性鈷錯合物可以包含[(Cp*Co)2-μ-(η4:η4-甲苯)]。 In some embodiments, the catalytic cobalt complex can comprise a multimetallic cobalt complex, such as a bridged dicobalt complex. For example, the catalytic cobalt complex may comprise [(Cp*Co) 2 -μ-(η 4 :η 4 -toluene)].
方法可以涉及使芳香族基質與任何催化有效量的該催化性鈷錯合物接觸。於一些例子中,以氧硼基化反應中存在的該芳香族基質之莫耳數為基準,該芳香族基質可以與0.5莫耳百分率(mol%)至5.0mol%的該催化性鈷錯合物(例如,1.0mol%至3.0mol%)接觸。 The method can involve contacting the aromatic matrix with any catalytically effective amount of the catalytic cobalt complex. In some examples, the aromatic matrix may be mismatched from 0.5 mole percent (mol%) to 5.0 mole percent of the catalytic cobalt based on the number of moles of the aromatic matrix present in the boron boronation reaction. The material (for example, 1.0 mol% to 3.0 mol%) is contacted.
氧硼基化試劑可以為本技藝已知作為氧硼基化試劑之任何合適的HB或B-B有機化合物。合適的氧硼基化試劑可以考慮各種因素來選擇,包括考慮有關生成的氧硼基化芳烴所欲的反應性。例示性氧硼基化試劑包括以下所示之HB或B-B有機化合物。 The oxyborylation reagent can be any suitable HB or B-B organic compound known in the art as an oxyborylation reagent. Suitable oxyborylation reagents can be selected in consideration of various factors, including consideration of the desired reactivity with respect to the resulting oxyborated aromatic hydrocarbon. Exemplary oxyborylation reagents include the HB or B-B organic compounds shown below.
於一些具體例中,氧硼基化試劑係選自於品納可 硼烷(pinacolborane)(HBPin)、鄰苯二酚硼烷(catecholborane)、雙(新戊基乙二醇)二硼酸酯(bis(neopentyl glycolato)diboron)、雙(品納醇)二硼酸酯(bis(pinacolato)diboron)(B2Pin2)、雙(乙烯基甘醇酸)二硼酸酯(bis(hexylene glycolato)diboron),以及雙(鄰苯二酚)二硼酸酯(bis(catecholato)diboron)。於某些具體例中,氧硼基化試劑為品納可硼烷(pinacolborane)(HBPin)或雙(品納醇)二硼酸酯(bis(pinacolato)diboron)(B2Pin2)。 In some embodiments, the oxyborylation reagent is selected from the group consisting of pinacolborane (HBPin), catecholborane, bis(neopentyl glycol) diborate. (bis(neopentyl glycolato)diboron), bis(pinacolato)diboron(B 2 Pin 2 ), bis(vinyl glycolic acid) diborate (bis(hexylene glycolato) Diboron), and bis(catecholato) diboron. In some embodiments, the boronylation reagent is pinacolborane (HBPin) or bis(pinacolato) diboron (B 2 Pin 2 ).
氧硼基化試劑可以以任何合適數量併入氧硼基化反應中。舉例而言,於一些具體例中,氧硼基化反應中存在的氧硼基化試劑的量範圍可以落在,由氧硼基化反應中存在之每莫耳的芳香族基質為1莫耳當量之氧硼基化試劑,至氧硼基化反應中存在之每莫耳的芳香族基質為5莫耳當量之氧硼基化試劑(例如,由氧硼基化反應中存在之每莫耳的芳香族基質為1莫耳當量之氧硼基化試劑,至氧硼基化反應中存在之每莫耳的芳香族基質為3莫耳當量之氧硼基化試劑)。 The boron boronation reagent can be incorporated into the boron boronation reaction in any suitable amount. For example, in some embodiments, the amount of the oxyborylation reagent present in the oxyborylation reaction may fall within a range of 1 mole per mole of aromatic matrix present in the oxyborylation reaction. An equivalent of an oxyborylation reagent, the molar base per mole of the aromatic matrix present in the boron boronation reaction is 5 molar equivalents of an oxyborylation reagent (eg, per mole present in the oxonylation reaction) The aromatic matrix is a 1 molar equivalent of oxyborylation reagent, and the molar base per mole of aromatic matrix present in the oxyborylation reaction is 3 mole equivalents of oxyborylation reagent).
亦提供用於具有一種環取代基之芳香族化合物之氧硼基化方法,該環取代基於對芳香族環之α位置上包括一個碳原子,其被至少一個氫原子(諸如,至少二個氫原子或三個氫原子)取代。該方法可以包括於氧硼基化對該芳香族環之該α位置上之該碳原子的有效條件下,使該芳香族基質與一種催化性鈷錯合物及一種氧硼基化試劑接觸。 Also provided is an oxyborylation process for an aromatic compound having a ring substituent comprising at least one hydrogen atom at the alpha position of the aromatic ring, such as at least two hydrogen atoms Substituted by an atom or three hydrogen atoms. The method can include contacting the aromatic matrix with a catalytic cobalt complex and an oxonylating agent under conditions effective for oxyborylation of the carbon atom at the alpha position of the aromatic ring.
舉例而言,提供用於製備由式VII所定義之氧硼
基化化合物的方法
其中X為一種經取代的或未經取代的芳基或是經取代的或未經取代的雜芳基,以及Y為一種硼酸或硼酸衍生物。該方法可以包括提供一種芳香族基質,其包含一種甲基取代的芳基或是一種甲基取代的雜芳基;以及於形成一種式VII所定義之化合物有效的條件下,使該芳香族基質與一種催化性鈷錯合物及一種氧硼基化試劑接觸。 Wherein X is a substituted or unsubstituted aryl group or a substituted or unsubstituted heteroaryl group, and Y is a boric acid or a boronic acid derivative. The method can include providing an aromatic matrix comprising a methyl substituted aryl group or a methyl substituted heteroaryl group; and allowing the aromatic matrix to be formed under conditions effective to form a compound of formula VII Contact with a catalytic cobalt complex and an oxyborylation reagent.
該芳香族基質可以包含任何合適的甲基取代的芳基或是甲基取代的雜芳基。該芳基或是雜芳基可以選擇性地進一步包含除了甲基取代基之外的一個或更多個取代基。因此,X可以為任何合適的經取代的或未經取代的芳基或雜芳基基團。舉例而言,X可以為一種經取代的或未經取代的芳基基團,例如經取代的或未經取代的苯基、聯苯、萘基、四氫萘基、苯基環丙基或是氫茚基。於其他的例子中,X可以為一種經取代的或未經取代的雜芳基基團,例如經取代的或未經取代的吡啶基、嗒基、嘧啶基、吡基、三基、吡咯基、吲哚基、喹啉基、異喹啉基、喹唑啉基、喹喏啉基、呋喃基、苯硫基、呋喃基、咪唑基、唑基、異唑基、異噻唑基、吡唑基苯并呋喃基,或是苯并苯硫基。在某些具體例中,X為經取代的或未經取代的苯基或是經取代的或未經取代的吡啶基。 The aromatic matrix can comprise any suitable methyl substituted aryl or methyl substituted heteroaryl. The aryl or heteroaryl group may optionally further comprise one or more substituents other than the methyl substituent. Thus, X can be any suitable substituted or unsubstituted aryl or heteroaryl group. For example, X may be a substituted or unsubstituted aryl group such as substituted or unsubstituted phenyl, biphenyl, naphthyl, tetrahydronaphthyl, phenylcyclopropyl or It is a hydroquinone group. In other examples, X may be a substituted or unsubstituted heteroaryl group, such as a substituted or unsubstituted pyridyl group, hydrazine. Base, pyrimidinyl, pyridyl Base, three Base, pyrrolyl, fluorenyl, quinolyl, isoquinolyl, quinazolinyl, quinoxalinyl, furyl, phenylthio, furyl, imidazolyl, Azolyl, different Azolyl, isothiazolyl, pyrazolylbenzofuranyl, or benzophenylthio. In certain embodiments, X is a substituted or unsubstituted phenyl group or a substituted or unsubstituted pyridyl group.
於某些具體例中,該芳香族基質為一種甲基取代
的芳基化合物。該甲基取代的芳基化合物可以選擇性地進一步包含除了甲基取代基之外的一個或是更多個取代基。舉例而言,該芳香族基質可以包含一種由式VIII所定義之化合物
其中A於每次出現時獨立地為,氫、鹵素、-OR1、-NR2R3、-C(=O)R4、腈基、C1-C6烷基、C1-C6鹵烷基,或是硼酸或硼酸衍生物,R1、R2及R3於每次出現時各自獨立地為,氫或是C1-C6烷基,以及R4於每次出現時獨立地為,氫、-OR1、-NR2R3,或C1-C6烷基。 Wherein A is independently at each occurrence, hydrogen, halogen, -OR 1 , -NR 2 R 3 , -C(=O)R 4 , nitrile group, C 1 -C 6 alkyl group, C 1 -C 6 Haloalkyl, or a boronic acid or boronic acid derivative, each of R 1 , R 2 and R 3 being independently, hydrogen or C 1 -C 6 alkyl, and R 4 is independently present at each occurrence The ground is hydrogen, -OR 1 , -NR 2 R 3 , or C 1 -C 6 alkyl.
於此等具體例中,該氧硼基化芳香族化合物可以包含由式IX所定義之化合物,
其中A於每次出現時係如上所述,以及Y為一種硼酸或硼酸衍生物。在某些例子中,該氧硼基化芳香族化合物可
以包含一種由式IX所定義之化合物,其中Y為一種選自於下列中之一者的硼酸衍生物:
芳香族基質對氧硼基化芳香族化合物之轉化百分率會取決於一些因素而變化,包括芳香族基質的反應性、催化性鈷錯合物的本體,以及氧硼基化試劑的本體。於一些具體例中,芳香族基質對氧硼基化芳香族化合物之轉化百分率可以為至少30%(例如,至少35%,至少40%,至少45%,至少50%,至少55%,至少60%,至少65%,至少70%,至少75%,至少80%,至少85%,至少90%,或是至少95%)。 The percent conversion of the aromatic matrix to the boron boronated aromatic compound will vary depending on a number of factors, including the reactivity of the aromatic matrix, the bulk of the catalytic cobalt complex, and the bulk of the boron boronation reagent. In some embodiments, the percent conversion of the aromatic matrix to the oxyborylated aromatic compound can be at least 30% (eg, at least 35%, at least 40%, at least 45%, at least 50%, at least 55%, at least 60%) %, at least 65%, at least 70%, at least 75%, at least 80%, at least 85%, at least 90%, or at least 95%).
以上所述之形成氧硼基化芳香族化合物之方法可以包含,使待反應之該芳香族基質與一種催化性鈷錯合物及一種氧硼基化試劑接觸。該芳香族基質可以以任何合適的方式與該催化性鈷錯合物及該氧硼基化試劑接觸,以使得該芳香族基質及該氧硼基化試劑係組合以催化有效量 的該催化性鈷錯合物存在。舉例而言,可以藉由以任何順序或方式來組合該芳香族基質、該催化性鈷錯合物及該氧硼基化試劑於單一反應容器或溶液中(例如,藉由循序的或同時添加該芳香族基質、該催化性鈷錯合物及該氧硼基化試劑至反應容器),而使該芳香族基質與該催化性鈷錯合物及該氧硼基化試劑接觸。於一些具體例中,該芳香族基質可以於大於25℃至85℃的溫度下,與該催化性鈷錯合物及該氧硼基化試劑接觸。 The above method for forming an oxyborylated aromatic compound may comprise contacting the aromatic substrate to be reacted with a catalytic cobalt complex and an oxyborylating agent. The aromatic matrix can be contacted with the catalytic cobalt complex and the boron boronation reagent in any suitable manner such that the aromatic matrix and the boron boronation reagent are combined to catalyze an effective amount The catalytic cobalt complex is present. For example, the aromatic matrix, the catalytic cobalt complex, and the borolylation reagent can be combined in a single reaction vessel or solution by any order or manner (eg, by sequential or simultaneous addition) The aromatic matrix, the catalytic cobalt complex and the borohydride reagent are introduced into a reaction vessel, and the aromatic matrix is contacted with the catalytic cobalt complex and the borohydride reagent. In some embodiments, the aromatic matrix can be contacted with the catalytic cobalt complex and the borohydride reagent at a temperature greater than 25 ° C to 85 ° C.
催化性鈷錯合物可以為能催化芳香族基質的C-H活化氧硼基化之任何合適的鈷(I)或鈷(II)錯合物。在某些具體例中,該催化性鈷錯合物為一種鈷(II)錯合物。 The catalytic cobalt complex can be any suitable cobalt (I) or cobalt (II) complex that catalyzes the C-H activated oxyborylation of the aromatic matrix. In some embodiments, the catalytic cobalt complex is a cobalt (II) complex.
於一些具體例中,該催化性鈷錯合物可以包含一種含有三牙配位子之鈷鉗合錯合物。舉例而言,該催化性鈷錯合物可以為一種鈷螯錯合物。於一些例子中,該催化性鈷錯合物可以為一種鈷鉗合錯合物,其含有CCC、CNC、CNS、NNN、NCN、PCP、PNP、PCN、OCO、SCS、SNS,或是SPS螯配位子。於某些具體例中,該催化性鈷錯合物不是一種含有NNN或NPN螯配位子之鈷鉗合錯合物。於某些具體例中,該催化性鈷錯合物不是下列中之一者:
於某些具體例中,該催化性鈷錯合物不是一種鈷螯錯合物。 In some embodiments, the catalytic cobalt complex is not a cobalt chelate complex.
於一些具體例中,該催化性鈷錯合物可以包含一種由以下式所定義之錯合物
其中Z於每次出現時獨立地為,鹵化物、C1-C6烷基,或芳基,n為0、1、2,或3,E為-CH2-、-C(R10)2-、-NR7-、-S-,或-O-,R5於每次出現時獨立地為,鹵素、-OR7、-NR7R7、-C(=O)R8、腈基、C1-C6烷基、芳基,或是C1-C6鹵烷基,m為0、1、2,或3,R7於每次出現時獨立地為,氫或是C1-C6烷基,R8於每次出現時獨立地為,氫、-OR7、-NR7R7,或是C1-C6烷基,R9於每次出現時獨立地為,C1-C6烷基、芳基,或是-OR10, 以及R10於每次出現時獨立地為,C1-C6烷基或芳基。 Wherein Z is independently, at each occurrence, a halide, a C 1 -C 6 alkyl group, or an aryl group, n is 0, 1, 2, or 3, and E is -CH 2 -, -C(R 10 ) 2 -, -NR 7 -, -S-, or -O-, R 5 is independently at each occurrence, halogen, -OR 7 , -NR 7 R 7 , -C(=O)R 8 , nitrile group, C 1 -C 6 alkyl group, an aryl group, or a C 1 -C 6 haloalkyl, m is 0, 1, or 3, R 7 for each occurrence is independently, hydrogen or C 1 -C 6 alkyl, R 8 is independently, on each occurrence, hydrogen, -OR 7 , -NR 7 R 7 , or C 1 -C 6 alkyl, R 9 is independently C 1 -C 6 alkyl, aryl, or -OR 10 , and R 10 are , independently of each occurrence, C 1 -C 6 alkyl or aryl.
於此等具體例的一些之中,E可以選自於-CH2-及-C(R10)2-,其中R10係如以上所定義。 In some of these specific examples, E may be selected from -CH 2 - and -C(R 10 ) 2 -, wherein R 10 is as defined above.
於一些具體例中,該催化性鈷錯合物可以包含一種由以下式所定義之錯合物
其中Z於每次出現時獨立地為,鹵化物、C1-C6烷基,或芳基,n為0、1、2,或3,E為-CH2-、-C(R10)2-、-NR7-、-S-,或-O-,R5於每次出現時獨立地為,鹵素、-OR7、-NR7R7、-C(=O)R8、腈基、C1-C6烷基、芳基,或是C1-C6鹵烷基,m為0、1、2,或3,L為-OR10或-NR10R10,R7於每次出現時獨立地為,氫或是C1-C6烷基,R8於每次出現時獨立地為,氫、-OR7、-NR7R7,或是C1-C6烷基,R9於每次出現時獨立地為,C1-C6烷基、芳基,或是-OR10,以及 R10於每次出現時獨立地為,C1-C6烷基或芳基。 Wherein Z is independently, at each occurrence, a halide, a C 1 -C 6 alkyl group, or an aryl group, n is 0, 1, 2, or 3, and E is -CH 2 -, -C(R 10 ) 2 -, -NR 7 -, -S-, or -O-, R 5 is independently at each occurrence, halogen, -OR 7 , -NR 7 R 7 , -C(=O)R 8 , nitrile a C 1 -C 6 alkyl group, an aryl group, or a C 1 -C 6 haloalkyl group, m is 0, 1, 2, or 3, and L is -OR 10 or -NR 10 R 10 , R 7 is Each occurrence is independently hydrogen or C 1 -C 6 alkyl, and R 8 is independently at each occurrence, hydrogen, -OR 7 , -NR 7 R 7 , or C 1 -C 6 alkane group, R 9 at each occurrence is independently, C 1 -C 6 alkyl group, an aryl group, or -OR 10, and R 10 at each occurrence is independently, C 1 -C 6 alkyl, or Aryl.
於一些具體例中,該催化性鈷錯合物可以包含一種由以下式所定義之錯合物
其中Z於每次出現時獨立地為,鹵化物、C1-C6烷基,或芳基,n為0、1、2,或3,E為-CH2-、-C(R10)2-、-NR7-、-S-,或-O-,R5於每次出現時獨立地為,鹵素、-OR7、-NR7R7、-C(=O)R8、腈基、C1-C6烷基、芳基,或是C1-C6鹵烷基,m為0、1、2,或3,R7於每次出現時獨立地為,氫或是C1-C6烷基,R8於每次出現時獨立地為,氫、-OR7、-NR7R7,或是C1-C6烷基,R9於每次出現時獨立地為,C1-C6烷基、芳基,或是-OR10,以及R10於每次出現時獨立地為,C1-C6烷基或芳基。 Wherein Z is independently, at each occurrence, a halide, a C 1 -C 6 alkyl group, or an aryl group, n is 0, 1, 2, or 3, and E is -CH 2 -, -C(R 10 ) 2 -, -NR 7 -, -S-, or -O-, R 5 is independently at each occurrence, halogen, -OR 7 , -NR 7 R 7 , -C(=O)R 8 , nitrile a C 1 -C 6 alkyl group, an aryl group, or a C 1 -C 6 haloalkyl group, m is 0, 1, 2, or 3, and R 7 is independently, in each occurrence, hydrogen or C. 1 -C 6 alkyl, R 8 is independently, on each occurrence, hydrogen, -OR 7 , -NR 7 R 7 , or C 1 -C 6 alkyl, R 9 is independently , C 1 -C 6 alkyl, aryl, or -OR 10 , and R 10 is independently, on each occurrence, a C 1 -C 6 alkyl or aryl group.
於此等具體例的一些之中,E可以選自於-CH2-及-C(R10)2-,其中R10係如以上所定義。 In some of these specific examples, E may be selected from -CH 2 - and -C(R 10 ) 2 -, wherein R 10 is as defined above.
於一些具體例中,該催化性鈷錯合物可以包含一種由以下式所定義之錯合物
其中Z於每次出現時獨立地為,鹵化物、C1-C6烷基,或芳基,n為0、1、2,或3,R5於每次出現時獨立地為,鹵素、-OR7、-NR7R7、-C(=O)R8、腈基、C1-C6烷基、芳基,或是C1-C6鹵烷基,m為0、1、2,或3,L為-OR10或-NR10R10,R7於每次出現時獨立地為,氫或是C1-C6烷基,R8於每次出現時獨立地為,氫、-OR7、-NR7R7,或是C1-C6烷基,以及R10於每次出現時獨立地為,C1-C6烷基或芳基。 Wherein Z is independently, at each occurrence, a halide, a C 1 -C 6 alkyl group, or an aryl group, n being 0, 1, 2, or 3, and R 5 is independently, in each occurrence, halogen, -OR 7 , -NR 7 R 7 , -C(=O)R 8 , nitrile group, C 1 -C 6 alkyl group, aryl group, or C 1 -C 6 haloalkyl group, m is 0, 1, 2, or 3, L is -OR 10 or -NR 10 R 10 , R 7 is independently, on each occurrence, hydrogen or C 1 -C 6 alkyl, and R 8 is independently, on each occurrence, Hydrogen, -OR 7 , -NR 7 R 7 , or C 1 -C 6 alkyl, and R 10 is independently, on each occurrence, a C 1 -C 6 alkyl or aryl group.
於一些具體例中,該催化性鈷錯合物可以包含一種由以下式所定義之錯合物
其中Z於每次出現時獨立地為,鹵化物、C1-C6烷基,或芳基,n為0、1、2,或3,E為-CH2-、-C(R10)2-、-NR7-、-S-,或-O-,R5於每次出現時獨立地為,鹵素、-OR7、-NR7R7、-C(=O)R8、腈基、C1-C6烷基、芳基,或是C1-C6鹵烷基,m為0、1、2,或3,R7於每次出現時獨立地為,氫或是C1-C6烷基,R8於每次出現時獨立地為,氫、-OR7、-NR7R7,或是C1-C6烷基,R9於每次出現時獨立地為,C1-C6烷基、芳基,或是-OR10,以及R10於每次出現時獨立地為,C1-C6烷基或芳基。 Wherein Z is independently, at each occurrence, a halide, a C 1 -C 6 alkyl group, or an aryl group, n is 0, 1, 2, or 3, and E is -CH 2 -, -C(R 10 ) 2 -, -NR 7 -, -S-, or -O-, R 5 is independently at each occurrence, halogen, -OR 7 , -NR 7 R 7 , -C(=O)R 8 , nitrile group, C 1 -C 6 alkyl group, an aryl group, or a C 1 -C 6 haloalkyl, m is 0, 1, or 3, R 7 for each occurrence is independently, hydrogen or C 1 -C 6 alkyl, R 8 is independently, on each occurrence, hydrogen, -OR 7 , -NR 7 R 7 , or C 1 -C 6 alkyl, R 9 is independently , C 1 -C 6 alkyl, aryl, or -OR 10 , and R 10 is independently, on each occurrence, a C 1 -C 6 alkyl or aryl group.
於此等具體例的一些之中,E可以選自於-CH2-及-C(R10)2-,其中R10係如以上所定義。 In some of these specific examples, E may be selected from -CH 2 - and -C(R 10 ) 2 -, wherein R 10 is as defined above.
於一些具體例中,該催化性鈷錯合物可以包含一種由以下式所定義之錯合物
其中 Z於每次出現時獨立地為,鹵化物、C1-C6烷基,或芳基,n為0、1、2,或3,E為-CH2-、-C(R10)2-、-NR7-、-S-,或-O-,R5於每次出現時獨立地為,鹵素、-OR7、-NR7R7、-C(=O)R8、腈基、C1-C6烷基、芳基,或是C1-C6鹵烷基,m為0、1、2,或3,L為-OR10或-NR10R10,R7於每次出現時獨立地為,氫或是C1-C6烷基,R8於每次出現時獨立地為,氫、-OR7、-NR7R7,或是C1-C6烷基,以及R10於每次出現時獨立地為,C1-C6烷基或芳基。 Wherein Z is independently, at each occurrence, a halide, a C 1 -C 6 alkyl group, or an aryl group, n is 0, 1, 2, or 3, and E is -CH 2 -, -C(R 10 ) 2 -, -NR 7 -, -S-, or -O-, R 5 is independently at each occurrence, halogen, -OR 7 , -NR 7 R 7 , -C(=O)R 8 , nitrile a C 1 -C 6 alkyl group, an aryl group, or a C 1 -C 6 haloalkyl group, m is 0, 1, 2, or 3, and L is -OR 10 or -NR 10 R 10 , R 7 is Each occurrence is independently hydrogen or C 1 -C 6 alkyl, and R 8 is independently at each occurrence, hydrogen, -OR 7 , -NR 7 R 7 , or C 1 -C 6 alkane group, and R 10 at each occurrence is independently, C 1 -C 6 alkyl or aryl.
於此等具體例的一些之中,E可以選自於-CH2-及-C(R10)2-,其中R10係如以上所定義。 In some of these specific examples, E may be selected from -CH 2 - and -C(R 10 ) 2 -, wherein R 10 is as defined above.
於一些具體例中,該催化性鈷錯合物可以包含一種由以下式所定義之錯合物
其中Z於每次出現時獨立地為,鹵化物、C1-C6烷基,或芳 基,n為0、1、2,或3,R5於每次出現時獨立地為,鹵素、-OR7、-NR7R7、-C(=O)R8、腈基、C1-C6烷基、芳基,或是C1-C6鹵烷基,m為0、1、2、3,或4,R7於每次出現時獨立地為,氫或是C1-C6烷基,R8於每次出現時獨立地為,氫、-OR7、-NR7R7,或是C1-C6烷基,以及R11及R12係各自獨立選自於,氫、鹵素、-OR7、-NR7R7、-C(=O)R8、腈基、C1-C6烷基、芳基,或C1-C6鹵烷基,或是R11及R12和其等附接之碳原子一起形成一個苯環,其選擇性地被1個至4個取代基所取代,該取代基係獨立選自於鹵素、-OR7、-NR7R7、-C(=O)R8、腈基、C1-C6烷基、芳基,或C1-C6鹵烷基。 Wherein Z is independently, at each occurrence, a halide, a C 1 -C 6 alkyl group, or an aryl group, n being 0, 1, 2, or 3, and R 5 is independently, in each occurrence, halogen, -OR 7 , -NR 7 R 7 , -C(=O)R 8 , nitrile group, C 1 -C 6 alkyl group, aryl group, or C 1 -C 6 haloalkyl group, m is 0, 1, 2, 3, or 4, R 7 is independently at each occurrence, hydrogen or C 1 -C 6 alkyl, R 8 is independently at each occurrence, hydrogen, -OR 7 , -NR 7 R 7 or C 1 -C 6 alkyl, and R 11 and R 12 are each independently selected from, hydrogen, halogen, -OR 7 , -NR 7 R 7 , -C(=O)R 8 , nitrile group a C 1 -C 6 alkyl group, an aryl group, or a C 1 -C 6 haloalkyl group, or R 11 and R 12 and their attached carbon atoms together form a benzene ring, which is selectively 1 Substituted to 4 substituents independently selected from halogen, -OR 7 , -NR 7 R 7 , -C(=O)R 8 , nitrile group, C 1 -C 6 alkyl group, aryl group , or a C 1 -C 6 haloalkyl group.
於一些具體例中,該催化性鈷錯合物可以包含一種由以下式所定義之錯合物
其中 Z於每次出現時獨立地為,鹵化物、C1-C6烷基,或芳基,n為0、1、2,或3,R5於每次出現時獨立地為,鹵素、-OR7、-NR7R7、-C(=O)R8、腈基、C1-C6烷基、芳基,或是C1-C6鹵烷基,m為0、1、2、3,或4,B為-P(R9)2、-OR10或-NR10R10,R7於每次出現時獨立地為,氫或是C1-C6烷基,R8於每次出現時獨立地為,氫、-OR7、-NR7R7,或是C1-C6烷基,R9於每次出現時獨立地為,C1-C6烷基、芳基,或是-OR10,R10於每次出現時獨立地為,C1-C6烷基,或芳基,R11及R12係各自獨立選自於,氫、鹵素、-OR7、-NR7R7、-C(=O)R8、腈基、C1-C6烷基、芳基,或C1-C6鹵烷基,或是R11及R12和其等附接之碳原子一起形成一個苯環,其選擇性地被1個至4個取代基所取代,該取代基係獨立選自於鹵素、-OR7、-NR7R7、-C(=O)R8、腈基、C1-C6烷基、芳基,或C1-C6鹵烷基,以及R13及R14係各自獨立選自於,氫、鹵素、-OR7、-NR7R7、-C(=O)R8、腈基、C1-C6烷基、芳基,或C1-C6鹵烷基,或是R13及R14和其等附接之碳原子一起形 成一個苯環,其選擇性地被1個至4個取代基所取代,該取代基係獨立選自於鹵素、-OR7、-NR7R7、-C(=O)R8、腈基、C1-C6烷基、芳基,或C1-C6鹵烷基。 Wherein Z is independently, at each occurrence, a halide, a C 1 -C 6 alkyl group, or an aryl group, n being 0, 1, 2, or 3, and R 5 is independently, in each occurrence, halogen, -OR 7 , -NR 7 R 7 , -C(=O)R 8 , nitrile group, C 1 -C 6 alkyl group, aryl group, or C 1 -C 6 haloalkyl group, m is 0, 1, 2, 3, or 4, B is -P(R 9 ) 2 , -OR 10 or -NR 10 R 10 , R 7 is independently, on each occurrence, hydrogen or C 1 -C 6 alkyl, R 8 at each occurrence is independently hydrogen, -OR 7 , -NR 7 R 7 , or C 1 -C 6 alkyl, R 9 is independently at each occurrence, C 1 -C 6 alkyl , aryl, or -OR 10 , R 10 is independently at each occurrence, C 1 -C 6 alkyl, or aryl, R 11 and R 12 are each independently selected from, hydrogen, halogen, - OR 7 , -NR 7 R 7 , -C(=O)R 8 , nitrile group, C 1 -C 6 alkyl group, aryl group, or C 1 -C 6 haloalkyl group, or R 11 and R 12 and The attached carbon atoms together form a benzene ring which is optionally substituted with from 1 to 4 substituents independently selected from halogen, -OR 7 , -NR 7 R 7 , -C (=O)R 8 , nitrile group, C 1 -C 6 alkyl group, aryl group, or C 1 -C 6 haloalkyl And the R 13 and R 14 are each independently selected from the group consisting of hydrogen, halogen, -OR 7 , -NR 7 R 7 , -C(=O)R 8 , nitrile group, C 1 -C 6 alkyl group, aromatic a group, or a C 1 -C 6 haloalkyl group, or R 13 and R 14 and their attached carbon atoms together form a benzene ring which is optionally substituted with from 1 to 4 substituents, the substitution The base is independently selected from the group consisting of halogen, -OR 7 , -NR 7 R 7 , -C(=O)R 8 , nitrile group, C 1 -C 6 alkyl group, aryl group, or C 1 -C 6 haloalkyl group. .
於一些具體例中,該催化性鈷錯合物可以包含一種由以下式所定義之錯合物
其中Z於每次出現時獨立地為,鹵化物、C1-C6烷基,或芳基,n為0、1、2,或3,B為-P(R9)2、-OR10或-NR10R10,R9於每次出現時獨立地為,C1-C6烷基、芳基,或是-OR10,R10於每次出現時獨立地為,C1-C6烷基或芳基,R11及R12係各自獨立選自於,氫、鹵素、-OR7、-NR7R7、-C(=O)R8、腈基、C1-C6烷基、芳基,或C1-C6鹵烷基,或是R11及R12和其等附接之碳原子一起形成一個苯環,其選擇性地被1個至4個取代基所取代,該取代基係獨立選自於鹵素、 -OR7、-NR7R7、-C(=O)R8、腈基、C1-C6烷基、芳基,或C1-C6鹵烷基,以及R13及R14係各自獨立選自於,氫、鹵素、-OR7、-NR7R7、-C(=O)R8、腈基、C1-C6烷基、芳基,或C1-C6鹵烷基,或是R13及R14和其等附接之碳原子一起形成一個苯環,其選擇性地被1個至4個取代基所取代,該取代基係獨立選自於鹵素、-OR7、-NR7R7、-C(=O)R8、腈基、C1-C6烷基、芳基,或C1-C6鹵烷基,R15及R16係各自獨立選自於,氫、鹵素、-OR7、-NR7R7、-C(=O)R8、腈基、C1-C6烷基、芳基,或C1-C6鹵烷基,或是R15及R16和其等附接之碳原子一起形成一個苯環,其選擇性地被1個至4個取代基所取代,該取代基係獨立選自於鹵素、-OR7、-NR7R7、-C(=O)R8、腈基、C1-C6烷基、芳基,或C1-C6鹵烷基,R7於每次出現時獨立地為,氫或是C1-C6烷基,以及R8於每次出現時獨立地為,氫、-OR7、-NR7R7,或是C1-C6烷基。 Wherein Z is independently, at each occurrence, a halide, a C 1 -C 6 alkyl group, or an aryl group, n is 0, 1, 2, or 3, and B is -P(R 9 ) 2 , -OR 10 Or -NR 10 R 10 , R 9 is independently at each occurrence, C 1 -C 6 alkyl, aryl, or -OR 10 , R 10 is independently, on each occurrence, C 1 -C 6 alkyl or aryl, R 11 and R 12 are each independently selected from, hydrogen, halogen, -OR 7 , -NR 7 R 7 , -C(=O)R 8 , nitrile group, C 1 -C 6 An alkyl group, an aryl group, or a C 1 -C 6 haloalkyl group, or R 11 and R 12 and their attached carbon atoms together form a benzene ring which is optionally substituted by 1 to 4 substituents Substituted, the substituent is independently selected from halogen, -OR 7 , -NR 7 R 7 , -C(=O)R 8 , nitrile group, C 1 -C 6 alkyl group, aryl group, or C 1 -C 6 haloalkyl, and R 13 and R 14 are each independently selected from, hydrogen, halogen, -OR 7 , -NR 7 R 7 , -C(=O)R 8 , nitrile group, C 1 -C 6 alkane a aryl group, an aryl group, or a C 1 -C 6 haloalkyl group, or R 13 and R 14 and their attached carbon atoms together form a benzene ring which is optionally substituted by from 1 to 4 substituents The substituent is independently selected from halogen, - OR 7 , -NR 7 R 7 , -C(=O)R 8 , nitrile group, C 1 -C 6 alkyl group, aryl group, or C 1 -C 6 haloalkyl group, R 15 and R 16 systems are each independently Selected from, hydrogen, halogen, -OR 7 , -NR 7 R 7 , -C(=O)R 8 , nitrile group, C 1 -C 6 alkyl group, aryl group, or C 1 -C 6 haloalkyl group Or R 15 and R 16 together with their attached carbon atoms form a benzene ring which is optionally substituted by from 1 to 4 substituents independently selected from halogen, -OR 7 , -NR 7 R 7 , -C(=O)R 8 , nitrile group, C 1 -C 6 alkyl group, aryl group, or C 1 -C 6 haloalkyl group, R 7 is independently , hydrogen or C 1 -C 6 alkyl, and R 8 is, independently of each occurrence, hydrogen, -OR 7 , -NR 7 R 7 , or C 1 -C 6 alkyl.
於一些具體例中,該催化性鈷錯合物可以包含一種含有雙牙配位子之鈷鉗合錯合物。舉例而言,於一些具體例中,該催化性鈷錯合物可以包含一種由以下式所定義之錯合物
其中Z於每次出現時獨立地為,鹵化物、C1-C6烷基,或芳基,n為2,R5於每次出現時獨立地為,鹵素、-OR7、-NR7R7、-C(=O)R8、腈基、C1-C6烷基、芳基,或是C1-C6鹵烷基,m為0、1、2、3,或4,R6係選自於下列中之一者:
R7於每次出現時獨立地為,氫或是C1-C6烷基,以及R8於每次出現時獨立地為,氫、-OR7、-NR7R7,或是C1-C6烷基。 R 7 is independently at each occurrence, hydrogen or C 1 -C 6 alkyl, and R 8 is independently, on each occurrence, hydrogen, -OR 7 , -NR 7 R 7 , or C 1 -C 6 alkyl.
於一些具體例中,該催化性鈷錯合物可以包含一種只含有單牙配位子之鈷錯合物。舉例而言,該催化性鈷錯合物可以包含Py2Co(CH2SiMe3)2。 In some embodiments, the catalytic cobalt complex can comprise a cobalt complex containing only a single tooth ligand. For example, the catalytic complexes may comprise cobalt Py 2 Co (CH 2 SiMe 3 ) 2.
於一些具體例中,該催化性鈷錯合物可以包含一種橋聯二鈷錯合物。舉例而言,該催化性鈷錯合物可以包含[(Cp*Co)2-μ-(η4:η4-甲苯)]。 In some embodiments, the catalytic cobalt complex can comprise a bridged dicobalt complex. For example, the catalytic cobalt complex may comprise [(Cp*Co) 2 -μ-(η 4 :η 4 -toluene)].
方法可以涉及使芳香族化合物與任何催化有效 量的該催化性鈷錯合物接觸。於一些例子中,以氧硼基化反應中存在的該芳香族化合物之莫耳數為基準,該芳香族化合物可以與0.5mol%至5.0mol%的該催化性鈷錯合物(例如,1.0mol%至3.0mol%)接觸。 The method can involve making the aromatic compound effective with any catalyst The amount of the catalytic cobalt complex is contacted. In some examples, the aromatic compound may be from 0.5 mol% to 5.0 mol% of the catalytic cobalt complex (for example, 1.0) based on the molar number of the aromatic compound present in the boron boronation reaction. Mol% to 3.0 mol%) contact.
氧硼基化試劑可以為本技藝已知作為氧硼基化試劑之任何合適的HB或B-B有機化合物。合適的氧硼基化試劑可以考慮各種因素來選擇,包括考慮有關生成的氧硼基化芳烴所欲的反應性。例示性氧硼基化試劑包括以下所示之HB或B-B有機化合物。 The oxyborylation reagent can be any suitable HB or B-B organic compound known in the art as an oxyborylation reagent. Suitable oxyborylation reagents can be selected in consideration of various factors, including consideration of the desired reactivity with respect to the resulting oxyborated aromatic hydrocarbon. Exemplary oxyborylation reagents include the HB or B-B organic compounds shown below.
於一些具體例中,氧硼基化試劑係選自於品納可硼烷(pinacolborane)(HBPin)、鄰苯二酚硼烷(catecholborane)、 雙(新戊基乙二醇)二硼酸酯(bis(neopentyl glycolato)diboron)、雙(品納醇)二硼酸酯(bis(pinacolato)diboron)(B2Pin2)、雙(乙烯基甘醇酸)二硼酸酯(bis(hexylene glycolato)diboron),以及雙(鄰苯二酚)二硼酸酯(bis(catecholato)diboron)。於某些具體例中,氧硼基化試劑為品納可硼烷(pinacolborane)(HBPin)或雙(品納醇)二硼酸酯(bis(pinacolato)diboron)(B2Pin2)。 In some embodiments, the boronylation reagent is selected from the group consisting of pinacolborane (HBPin), catecholborane, bis(neopentyl glycol) diborate. (bis(neopentyl glycolato)diboron), bis(pinacolato)diboron(B 2 Pin 2 ), bis(vinyl glycolic acid) diborate (bis(hexylene glycolato) Diboron), and bis(catecholato) diboron. In certain embodiments, the reagent is a boron-based oxide materials can be satisfied borane (pinacolborane) (HBPin) or bis (Perpignan alcohol) diboronate (bis (pinacolato) diboron) ( B 2 Pin 2).
氧硼基化試劑可以以任何合適數量併入氧硼基化反應中。舉例而言,於一些具體例中,氧硼基化反應中存在的氧硼基化試劑的量範圍可以落在,由氧硼基化反應中存在之每莫耳的芳香族基質為1莫耳當量之氧硼基化試劑,至氧硼基化反應中存在之每莫耳的芳香族基質為5莫耳當量之氧硼基化試劑(例如,由氧硼基化反應中存在之每莫耳的芳香族基質為1莫耳當量之氧硼基化試劑,至氧硼基化反應中存在之每莫耳的芳香族基質為3莫耳當量之氧硼基化試劑)。 The boron boronation reagent can be incorporated into the boron boronation reaction in any suitable amount. For example, in some embodiments, the amount of the oxyborylation reagent present in the oxyborylation reaction may fall within a range of 1 mole per mole of aromatic matrix present in the oxyborylation reaction. An equivalent of an oxyborylation reagent, the molar base per mole of the aromatic matrix present in the boron boronation reaction is 5 molar equivalents of an oxyborylation reagent (eg, per mole present in the oxonylation reaction) The aromatic matrix is a 1 molar equivalent of oxyborylation reagent, and the molar base per mole of aromatic matrix present in the oxyborylation reaction is 3 mole equivalents of oxyborylation reagent).
使用本文所述的方法所製備之氧硼基化芳烴可以使用於額外的化學反應中,包括交叉偶合反應,例如鈴木(Suzuki)型交叉偶合反應。鈴木(Suzuki)型交叉偶合反應為本技藝已知的,以及可以於一種鹼和合適的催化劑存在下,使用來交叉偶合一種有機鹵化物及有機硼烷。參見,舉例而言,Miyaura,N.and Suzuki,A.Chem.Rev. 1995,95,2457,Stanforth,S.P.Tetrahedron 1998,54,263,Lipshutz等人之Synthesis 2005,2989,以及Lipshutz等人之Organic Letters 2008,10,4279。有機鹵化物可以為不飽和的鹵化物或擬鹵化物(pseudohalid)(例如,三氟甲磺酸酯(OTf)),譬例芳基鹵化物或擬鹵化物或是鹵乙烯或擬鹵乙烯(vinyl halide or pseudohalide)。 The oxyborylated aromatics prepared using the methods described herein can be used in additional chemical reactions, including cross-coupling reactions, such as the Suzuki-type cross-coupling reaction. Suzuki type cross-coupling reactions are known in the art and can be used to cross-couple an organic halide and organoborane in the presence of a base and a suitable catalyst. See, for example, Miyaura, N.and Suzuki, A.Chem.Rev. 1995, 95, 2457, Stanforth, SP Tetrahedron 1998, 54, 263, Lipshutz et al., The Synthesis 2005, 2989, and the Organic Lipshutz et al. Letters 2008 , 10 , 4279. The organic halide may be an unsaturated halide or pseudohalid (for example, triflate (OTf)), an aryl halide or a pseudohalide, or a vinyl halide or a pseudohaloethylene ( Vinyl halide or pseudohalide).
於一些具體例中,本文所述的方法可以進一步包含使該氧硼基化芳香族化合物與一種反應物,及一種過渡金屬催化劑接觸,該反應物係選自於以下所構成的群組:芳基鹵化物、芳基擬鹵化物(aryl pseudohalid)、鹵乙烯及n擬鹵乙烯(n vinyl pseudohalide),以使該反應物與該氧硼基化芳香族化合物交叉偶合。作為實例,(4-氯-2-氟-3-取代的)硼酸酯可以與甲基4-乙醯胺基-3,6-二氯甲吡啶酯(methyl 4-acetamido-3,6-dichloropicolinate)進行一種交叉偶合反應,以製備或形成6-(4-氯-2-氟-3-取代的-苯基)-4-胺基甲吡啶酯。於另一個實例中,(4-氯-2-氟-3-取代的)硼酸酯可以與甲基6-乙醯胺基-2-氯嘧啶-4-甲酸酯或其之未經保護的類似物6-胺基-2-氯嘧啶-4-甲酸,進行一種交叉偶合反應。 In some embodiments, the methods described herein can further comprise contacting the boroborylated aromatic compound with a reactant, and a transition metal catalyst, the reactant being selected from the group consisting of: a base halide, an aryl pseudohalid, a vinyl halide, and an n vinyl pseudohalide to cross-couple the reactant with the boron boronated aromatic compound. As an example, (4-chloro-2-fluoro-3-substituted) borate can be combined with methyl 4-acetamido-3,6-dichloropyridinium (methyl 4-acetamido-3,6- Dichloropicolinate) A cross-coupling reaction is carried out to prepare or form 6-(4-chloro-2-fluoro-3-substituted-phenyl)-4-aminomethylpyridyl ester. In another example, the (4-chloro-2-fluoro-3-substituted) boronate can be combined with methyl 6-acetamido-2-chloropyrimidine-4-carboxylate or its unprotected The analog 6-amino-2-chloropyrimidine-4-carboxylic acid undergoes a cross-coupling reaction.
鈴木(Suzuki)型交叉偶合反應可以在鈀催化劑、配位子及一種鹼存在下發生。於至少一些具體例中,鈀催化劑為乙酸鈀(II)(Pd(OAc)2),鹼為含水碳酸鉀(K2CO3),以及配位子為三苯膦(PPh3)。交叉偶合反應可以在一種溶劑中進行,像是甲基異丁基酮(MIBK)、乙腈(MeCN)、乙酸乙酯(EtOAc)、水,或其等之組合。 The Suzuki type cross-coupling reaction can occur in the presence of a palladium catalyst, a ligand, and a base. At least some embodiments, the palladium catalyst is palladium acetate (II) (Pd (OAc) 2), the base is aqueous potassium carbonate (K 2 CO 3), and a seat with triphenylphosphine (PPh 3). The cross-coupling reaction can be carried out in a solvent such as methyl isobutyl ketone (MIBK), acetonitrile (MeCN), ethyl acetate (EtOAc), water, or a combination thereof.
以下提供之本揭示的某些具體例之實例,係作為非限制性的說明。 Examples of certain specific examples of the disclosure provided below are provided as non-limiting illustrations.
除非另外聲明,反應係用磁性攪拌、於烤箱乾燥的玻璃器皿內,於氮氣氛圍下進行,以及以質子核磁共振(1H-NMR)光譜法監控。四氫呋喃係於氮氣氛圍下從鈉/二苯甲酮新蒸餾出。Py2Co(CH2SiMe3)2及(Cp*Co)2(η4:η4-甲苯)係根據已建立的文獻程序來合成。急速或管柱層析法係用從Silicycle(Quebec City,加拿大)購得的矽膠(230-400篩孔)來執行。1H NMR、13C NMR及19F NMR光譜係使用一種裝備有VnmrJ 3.2A運作之7600AS 96樣本自動抽樣儀,Agilent DirectDrive2 500MHz NMR光譜儀(1H NMR方面為500MHz,13C NMR方面為125MHz,19F NMR方面為470MHz,以及11B NMR方面為160MHz)來記錄。熔點係在Thomas-Hoover毛細管熔點儀上測得。 Unless otherwise stated, the reaction was carried out in a glass oven under magnetic stirring in an oven, under a nitrogen atmosphere, and monitored by proton nuclear magnetic resonance ( 1 H-NMR) spectroscopy. Tetrahydrofuran was newly distilled from sodium/benzophenone under a nitrogen atmosphere. Py 2 Co(CH 2 SiMe 3 ) 2 and (Cp*Co) 2 (η 4 :η 4 -toluene) were synthesized according to established literature procedures. Rapid or column chromatography was performed using tantalum (230-400 mesh) available from Silicycle (Quebec City, Canada). 1 H NMR, 13 C NMR and 19 F NMR spectra were obtained using a 7600AS 96 sample autosampler equipped with VnmrJ 3.2A, Agilent DirectDrive 2 500 MHz NMR spectrometer (500 MHz for 1 H NMR, 125 MHz for 13 C NMR, 19 The F NMR aspect was 470 MHz, and the 11 B NMR aspect was 160 MHz) was recorded. The melting point was measured on a Thomas-Hoover capillary melting point apparatus.
於充滿氮氣的手套箱內,將Py2Co(CH2SiMe3)2(9.8毫克(mg),0.025毫莫耳(mmol),5mol%)及間二甲苯(306微升(μL),2.5mmol)裝入3毫升(mL)Wheaton®小玻璃瓶中。相繼地添加合適的溶劑(1.0mL)和HBPin(73μL,0.5mmol)。合上小玻璃瓶,放置於手套箱外部50℃的油浴中,以及加熱歷時24小時(h)。將反應冷卻至室溫,以及移出一樣本並以氣相層析術(GC)來分析。結果表示於表1中。 Py 2 Co(CH 2 SiMe 3 ) 2 (9.8 mg (mg), 0.025 mmol (mmol), 5 mol%) and m-xylene (306 μL (μL), 2.5) in a nitrogen-filled glove box Ment) Load into a 3 ml (mL) Wheaton® vial. A suitable solvent (1.0 mL) and HBPin (73 μL, 0.5 mmol) were added sequentially. The vial was closed and placed in an oil bath at 50 ° C outside the glove box and heated for 24 hours (h). The reaction was cooled to room temperature and the same was removed and analyzed by gas chromatography (GC). The results are shown in Table 1.
於充滿氮氣的手套箱內,將Py2Co(CH2SiMe3)2(9.8mg,0.025mmol,5mol%)、3-三氟甲基甲苯(349μL,2.5mmol)及HBPin(73μL,0.5mmol)相繼地裝入3mL Wheaton®小玻璃瓶中。將小玻璃瓶合上,取出手套箱外,以及於室溫下攪拌。於16h之後,從反應混合物取出樣本,以及以GC來分析。觀察到沒有氧硼基化產物。 Py 2 Co(CH 2 SiMe 3 ) 2 (9.8 mg, 0.025 mmol, 5 mol%), 3-trifluoromethyltoluene (349 μL, 2.5 mmol) and HBPin (73 μL, 0.5 mmol) in a nitrogen-filled glove box ) Loaded sequentially into a 3 mL Wheaton® vial. The vial was closed, removed from the glove box, and stirred at room temperature. After 16 h, the sample was taken from the reaction mixture and analyzed by GC. No oxygen boronation product was observed.
於充滿氮氣的手套箱內,將Py2Co(CH2SiMe3)2(9.8mg,0.025mmol,5mol%)、3-三溴甲苯(303μL,2.5mmol),及HBPin(73μL,0.5mmol)相繼地裝入3mL Wheaton®小玻璃瓶中。將小玻璃瓶合上,取出手套箱外,以及於50℃下加熱。於24h之後,從反應混合物取出樣本,以及樣本之氣相層析術-質譜法(GC-MS)分析顯示出由於溴和硼交換,而依鈷裝載量出現化學計量上的量之氧硼基化產物。當使用2-氯甲苯作為基質時,GC-MS觀察到粗反應混合物內的氯-硼交換產物。 Py 2 Co(CH 2 SiMe 3 ) 2 (9.8 mg, 0.025 mmol, 5 mol%), 3-tribromotoluene (303 μL, 2.5 mmol), and HBPin (73 μL, 0.5 mmol) in a nitrogen-filled glove box. Loaded into 3 mL Wheaton® vials in succession. The vial was closed, removed from the glove box, and heated at 50 °C. After 24 h, the sample was taken from the reaction mixture, and the gas chromatography-mass spectrometry (GC-MS) analysis of the sample showed a stoichiometric amount of boron boron based on the exchange of bromine and boron. Chemical product. When 2-chlorotoluene was used as the substrate, the chlorine-boron exchange product in the crude reaction mixture was observed by GC-MS.
於充滿氮氣的手套箱內,將(Cp*Co)2(η4:η4-甲苯)(12mg,0.025mmol,5mol%)及B2Pin2(127mg,0.5mmol)裝入3mL Wheaton®小玻璃瓶中。相繼地添加合適的溶劑(1.0mL)和間二甲苯(306μL,2.5mmol)。合上小玻璃瓶,加蓋,取出手套箱外,以及於80℃下加熱歷時24h。之後,將反應冷卻至室溫,以及從反應混合物取出樣本用於GC分析。結果表示於表2中。發現到透過增加反應物的濃度會使轉化作用增高,然而,會使芳香族的氧硼基化選擇性降低。 (Cp*Co) 2 (η 4 :η 4 -toluene) (12 mg, 0.025 mmol, 5 mol%) and B 2 Pin 2 (127 mg, 0.5 mmol) were charged into 3 mL of Wheaton® in a nitrogen-filled glove box. In the glass bottle. A suitable solvent (1.0 mL) and m-xylene (306 μL, 2.5 mmol) were added sequentially. The small glass bottle was closed, capped, taken out of the glove box, and heated at 80 ° C for 24 h. Thereafter, the reaction was cooled to room temperature, and a sample was taken from the reaction mixture for GC analysis. The results are shown in Table 2. It has been found that by increasing the concentration of the reactants, the conversion is increased, however, the selectivity to aromatic boronylation is lowered.
於充滿氮氣的手套箱內,將(Cp*Co)2(η4:η4-甲 苯)(12mg,0.025mmol,5mol%)、B2Pin2(127mg,0.5mmol)以及下列配位子中之一者裝入3mL Wheaton®小玻璃瓶中:Ph3P(6.6mg,0.025mmol,5mol%)、4-(二甲胺基)吡啶(DMAP;3.0mg,0.025mmol,5mol%)、1,10-啡啉(phen;2.2mg,0.0125mmol,2.5mol%)、參環己基膦(Cy3P;7.0mg,0.025mmol,5mol%),或是吡啶(Py;2.0μL,0.025mmol,5mol%)。相繼地添加四氫呋喃(1.0mL)和間二甲苯(306μL,2.5mmol)。合上小玻璃瓶,加蓋,取出手套箱外,以及於80℃下加熱歷時24h。加熱完成之後,將反應小玻璃瓶冷卻至室溫,以及從反應混合物取出樣本用於GC分析。結果表示於表3中。 (Cp*Co) 2 (η 4 :η 4 -toluene) (12 mg, 0.025 mmol, 5 mol%), B 2 Pin 2 (127 mg, 0.5 mmol) and the following ligands in a nitrogen-filled glove box One of them was charged into a 3 mL Wheaton® vial: Ph 3 P (6.6 mg, 0.025 mmol, 5 mol%), 4-(dimethylamino)pyridine (DMAP; 3.0 mg, 0.025 mmol, 5 mol%), 1 , 10-phenoline (phen; 2.2 mg, 0.0125 mmol, 2.5 mol%), Cyclohexylphosphine (Cy 3 P; 7.0 mg, 0.025 mmol, 5 mol%), or pyridine (Py; 2.0 μL, 0.025 mmol, 5 mol%). Tetrahydrofuran (1.0 mL) and m-xylene (306 μL, 2.5 mmol) were successively added. The small glass bottle was closed, capped, taken out of the glove box, and heated at 80 ° C for 24 h. After the heating was completed, the reaction vial was cooled to room temperature, and the sample was taken out from the reaction mixture for GC analysis. The results are shown in Table 3.
於充滿氮氣的手套箱內,將(Cp*Co)2(η4:η4-甲苯)(12mg,0.025mmol,5mol%)及B2Pin2(127mg,0.5mmol)裝入3mL Wheaton®小玻璃瓶中。相繼地添加四氫呋喃(0.5 mL)和甲基3-三氟甲基苯甲酸酯(236μL,1.5mmol)。合上小玻璃瓶,加蓋,取出手套箱外,以及於80℃下加熱歷時17h。加熱完成之後,將反應小玻璃瓶冷卻至室溫,以及取出樣本用於分析。GC分析顯示不存在氧硼基化產物。 (Cp*Co) 2 (η 4 :η 4 -toluene) (12 mg, 0.025 mmol, 5 mol%) and B 2 Pin 2 (127 mg, 0.5 mmol) were charged into 3 mL of Wheaton® in a nitrogen-filled glove box. In the glass bottle. Tetrahydrofuran (0.5 mL) and methyl 3-trifluoromethylbenzoate (236 μL, 1.5 mmol) were added sequentially. The small glass bottle was closed, capped, taken out of the glove box, and heated at 80 ° C for 17 h. After the heating was completed, the reaction vial was cooled to room temperature, and the sample was taken for analysis. GC analysis showed the absence of the boron boronation product.
於充滿氮氣的手套箱內,將(Cp*Co)2(η4:η4-甲苯)(12mg,0.025mmol,5mol%)及B2Pin2(127mg,0.5mmol)裝入3mL Wheaton®小玻璃瓶中。相繼地添加四氫呋喃(0.5mL)和3-三氟甲苯(167μL,1.5mmol)。小玻璃瓶加蓋,取出手套箱外,以及於80℃下加熱歷時21h。加熱完成之後,將反應小玻璃瓶冷卻至室溫,以及取出樣本用於分析。由19F NMR光譜判斷,觀察到25%之轉化(以B2Pin2為基準)。由19F NMR光譜判定,2-(3-氟-5-甲苯基)-4,4,5,5-四甲基-1,3,2-二戊硼烷對2-(2-氟-4-甲苯基)-4,4,5,5-四甲基-1,3,2-二戊硼烷之比率為1.4:1。2-(3-氟-5-甲苯基)-4,4,5,5-四甲基-1,3,2-二戊硼烷:19F NMR(283MHz,CDCl3)δ -115.4。2-(2-氟-4-甲苯基)-4,4,5,5-四甲-1,3,2-二戊硼烷:19F NMR(283MHz,CDCl3)δ -103.8 - -103.9。 (Cp*Co) 2 (η 4 :η 4 -toluene) (12 mg, 0.025 mmol, 5 mol%) and B 2 Pin 2 (127 mg, 0.5 mmol) were charged into 3 mL of Wheaton® in a nitrogen-filled glove box. In the glass bottle. Tetrahydrofuran (0.5 mL) and 3-trifluorotoluene (167 μL, 1.5 mmol) were successively added. The vial was capped, removed from the glove box, and heated at 80 ° C for 21 h. After the heating was completed, the reaction vial was cooled to room temperature, and the sample was taken for analysis. From the 19 F NMR spectrum, a 25% conversion (based on B 2 Pin 2 ) was observed. Determined by 19 F NMR spectroscopy, 2-(3-fluoro-5-methylphenyl)-4,4,5,5-tetramethyl-1,3,2-di Pentaborane to 2-(2-fluoro-4-methylphenyl)-4,4,5,5-tetramethyl-1,3,2-di The ratio of pentaborane is 1.4:1. 2-(3-Fluoro-5-tolyl)-4,4,5,5-tetramethyl-1,3,2-di Pentaborane: 19 F NMR (283MHz, CDCl 3 ) δ -115.4. 2-(2-Fluoro-4-methylphenyl)-4,4,5,5-tetramethyl-1,3,2-di Pentaborane: 19 F NMR (283 MHz, CDCl 3 ) δ -103.8 - -103.9.
評估包括各種含膦或含氮配位子之鈷基系統係使用流程圖1中概述的一般程序用於氧硼基化間二甲苯氧硼基化。於充滿氮氣的手套箱內,將CoCl2(6.5mg,0.05mmol,10mol%)、配位子(0.05mmol,10mol%)及Zn粉(9.8mg,0.15mmol,30mol%)裝入3mL Wheaton®小玻璃瓶中。 接而添加1.0mL的THF。相繼地添加間二甲苯(183μL,1.5mmol)和硼來源(0.5mmol)至生成的溶液。接而將小玻璃瓶加蓋,且取出手套箱外。反應混合物係於80℃下加熱歷時16-20h。加熱之後,移出等分試樣,以及經由以氣相層析術來分析。於全部的例子中,沒有偵測到氧硼基化的產物。 The evaluation of various cobalt-based systems including phosphine- or nitrogen-containing ligands was carried out using the general procedure outlined in Scheme 1 for the oxyborylation of m-xylene oxyborylation. CoCl 2 (6.5 mg, 0.05 mmol, 10 mol%), ligand (0.05 mmol, 10 mol%) and Zn powder (9.8 mg, 0.15 mmol, 30 mol%) were charged into 3 mL Wheaton® in a nitrogen-filled glove box. In a small glass bottle. Then 1.0 mL of THF was added. Meta-xylene (183 μL, 1.5 mmol) and boron source (0.5 mmol) were successively added to the resulting solution. The vial is then capped and removed from the glove box. The reaction mixture was heated at 80 ° C for 16-20 h. After heating, an aliquot was removed and analyzed by gas chromatography. In all of the examples, no products of oxyborylation were detected.
對含括包含吡啶部分和亞胺部分二者的雙牙配位子之鈷錯合物作為氧硼基化之催化劑進行評估。此類型的配位子可以經由2-吡啶甲醛與合適的苯胺之縮合作用而得到。吡啶苯胺-連接的氯化鈷錯合物1-4係使用文獻的程序來製備。參見,舉例而言,Zhu,D.等人之Organometallics 2010,29,1897。所有的錯合物係單離為氯化物橋聯的二聚物。氯化物配位子能被取代來活化此等錯合物用於氧硼基化。 A cobalt complex comprising a bidentate ligand comprising both a pyridine moiety and an imine moiety was evaluated as a catalyst for oxyborylation. This type of ligand can be obtained by condensation of 2-pyridinecarboxaldehyde with a suitable aniline. Pyridine aniline-linked cobalt chloride complex 1-4 was prepared using the procedures of the literature. See, for example, Zhu, D. et al., Organometallics 2010 , 29 , 1897. All complexes are isolated as chloride bridged dimers. Chloride ligands can be substituted to activate these complexes for oxyborylation.
於第一個實驗中,鈷錯合物1上之氯化物配位子係藉由與LiCH2TMS反應而被取代,形成錯合物5。接而對錯合物5作為間二甲苯之氧硼基化的催化劑進行評估。於充滿氮氣的手套箱內,將錯合物5(11.1mg,0.025mmol,5mol%)及間二甲苯(183μL,1.5mmol)裝入3mL Wheaton®小玻璃瓶中。接而添加HBPin(73μL,0.5mmol)。將小玻璃瓶加蓋,且取出手套箱外。接而反應混合物係於50℃下加熱歷時15h。氣相層析術之分析顯示以HBpin為基準為29%的轉化。雖然錯合物5於催化上是活性的,但是長期儲存是不穩定的。 In the first experiment, the chloride ligand on cobalt complex 1 was substituted by reaction with LiCH 2 TMS to form complex 5 . The complex 5 was then evaluated as a catalyst for the oxyborylation of meta-xylene. Complex 5 (11.1 mg, 0.025 mmol, 5 mol%) and m-xylene (183 μL, 1.5 mmol) were placed in a 3 mL Wheaton® vial in a nitrogen-filled glove box. HBPin (73 μL, 0.5 mmol) was added. The vial is capped and removed from the glove box. The reaction mixture was then heated at 50 ° C for 15 h. Analysis by gas chromatography showed a 29% conversion based on HBpin. Although complex 5 is catalytically active, long term storage is unstable.
錯合物1-4之活化亦可以使用還原性金屬(例如,鎂或鋅)來還原鈷中心,並且移除氯化物配位子之一者或二者而完成。 Activation of complex 1-4 can also be accomplished using a reducing metal (eg, magnesium or zinc) to reduce the cobalt center and remove one or both of the chloride ligands.
於起始的實驗中,使用2.5mol%的1,12mol%的芮氏(Rieke’s)Mg,3eqiuv的間二甲苯以及HBpin(1equiv) 於50℃下進行,觀察到沒有氧硼基化產物。然而,於80℃下、在THF內進行反應,獲得48%的總轉化,41%為化合物6。觀察到的苄基對金屬氧硼基化(meta borylation)比率為27:1。 In the initial experiments, the use of 2.5mol% of 1, 12mol% of Richter (Rieke's) Mg, and m-xylene 3eqiuv HBpin (1equiv) carried out at 50 ℃, no product was observed boryl group. However, the reaction was carried out in THF at 80 ° C to obtain 48% total conversion, and 41% was compound 6 . The observed ratio of benzyl to metal boron borylation was 27:1.
當於同樣條件下使用錯合物3作為催化劑時,GC偵測到稍微低的總轉化(38%)(流程圖3)。明確地,於充滿氮氣的手套箱內,將鈷錯合物3(19.8mg,0.025mmol,2.5mol%)及活性的Mg(2.4mg,0.1mmol,10mol%)裝入3mL Wheaton®小玻璃瓶中。接而添加0.5mL的THF。生成的混合物係予以攪拌5min。接而相繼地添加間二甲苯(367μL,3.0mmol)和HBpin(145μL,1.0mmol)。將小玻璃瓶加蓋,且取出手套箱外。反應混合物係於80℃下加熱歷時16h。GC之分析顯示以HBpin為基準為38%的轉化,且34%被確認為苄基氧硼基化產物6。 When the complex 3 was used as a catalyst under the same conditions, the GC detected a slightly lower total conversion (38%) (Scheme 3). Specifically, cobalt complex 3 (19.8 mg, 0.025 mmol, 2.5 mol%) and active Mg (2.4 mg, 0.1 mmol, 10 mol%) were charged into a 3 mL Wheaton® vial in a nitrogen-filled glove box. in. Then 0.5 mL of THF was added. The resulting mixture was stirred for 5 min. Meta-xylene (367 μL, 3.0 mmol) and HBpin (145 μL, 1.0 mmol) were successively added. The vial is capped and removed from the glove box. The reaction mixture was heated at 80 ° C for 16 h. Analysis by GC showed 38% conversion on a HBpin basis and 34% was identified as a benzyloxyboronation product 6 .
當使用鋅或Super-Hydride®(LiHBEt3 1.0M配於THF)代替鎂時,觀察到沒有氧硼基化產物。亦製備鈷錯合物3之溴化鐵(II)類似物,以及使用芮氏(Rieke’s)Mg來測試氧硼基化反應中的活性。當使用間二甲苯或3-三氟甲苯基質時,偵測到沒有氧硼基化產物。 When zinc or Super-Hydride® (LiHBEt 3 1.0M in THF) was used instead of magnesium, no oxygen boronation product was observed. An iron (II) bromide analog of cobalt complex 3 was also prepared, and Rieke's Mg was used to test the activity in the boron boronation reaction. When a meta-xylene or 3-trifluorotoluene substrate was used, no oxygen boronation product was detected.
流程圖3. 間二甲苯使用芮氏(Rieke’s)Mg作為活化劑之氧硼基化Flowchart 3. Oxyborylation of m-xylene using Rieke's Mg as an activator
亦使用格任亞試劑(Grignard reagent)來研究錯合物1-4之活化。於第一個實驗中,對錯合物1及EtMgBr作為催化系統進行評估。間二甲苯係以42%的總轉化被氧硼基化。再者,苄基氧硼基化產物6為主要的產物,以及以GC偵測到37%(流程圖4)。不幸地,在3次運作期間轉化率從0變化到42%。 The activation of complexes 1-4 was also investigated using a Grignard reagent. In the first experiment, the complex 1 and EtMgBr were evaluated as catalytic systems. The meta-xylene system was oxyborylated with a total conversion of 42%. Furthermore, the benzyloxyboronation product 6 was the major product and was detected by GC at 37% (Scheme 4). Unfortunately, the conversion rate changed from 0 to 42% during 3 operations.
使用相似的條件來研究鈷錯合物3與各種格任亞試劑(Grignard reagent)之活化。於充滿氮氣的手套箱內,將鈷錯合物3(19.8mg,0.025mmol,2.5mol%)裝入3mL Wheaton®小玻璃瓶中。相繼地添加THF(0.5mL)和間二甲苯(367μL,3.0mmol)。然後,逐滴地添加格任亞試劑(Grignard reagent)(0.1mmol,10mol%)。生成的混合物繼而予以攪拌大約5min。接而添加HBpin(145μL,1.0mmol)。將小玻璃瓶加蓋,且取出手套箱外。反應混合物係於80℃ 下加熱歷時21h。加熱之後,移出等分試樣,以及經由以氣相層析術來分析。結果含括於以下的表1中。 Similar conditions were used to study the activation of cobalt complex 3 with various Grignard reagents. Cobalt Complex 3 (19.8 mg, 0.025 mmol, 2.5 mol%) was placed in a 3 mL Wheaton® vial in a nitrogen filled glove box. THF (0.5 mL) and m-xylene (367 μL, 3.0 mmol) were successively added. Then, a Grignard reagent (0.1 mmol, 10 mol%) was added dropwise. The resulting mixture was then stirred for approximately 5 min. Then HBpin (145 μL, 1.0 mmol) was added. The vial is capped and removed from the glove box. The reaction mixture was heated at 80 ° C for 21 h. After heating, an aliquot was removed and analyzed by gas chromatography. The results are included in Table 1 below.
當使用EtMgBr作為活化劑時,氧硼基化反應的結果觀察到顯著的變異。在6次運作期間,得到轉化率在31-92%的範圍內變動(表1,項目2)。CyMgCl在5次運作期間提供79-92%之轉化率(表1,項目4)。於使用MeMgCl作為活化劑所執行的二個試驗中,觀察到57-84%之轉化率(表1,項目1)。大型的tBuMgCl(bulky tBuMgCl)達成低的轉化,以及當使用PhMgCl作為催化劑活化劑時,沒有觀察到氧硼基化的產物。 When EtMgBr was used as the activator, significant variation was observed as a result of the boron boronation reaction. During the six operations, the conversion rate was varied from 31-92% (Table 1, item 2). CyMgCl provided a conversion rate of 79-92% during 5 runs (Table 1, item 4). In the two tests performed using MeMgCl as the activator, a conversion of 57-84% was observed (Table 1, item 1). The large tBuMgCl (bulky tBuMgCl) achieved low conversion, and when PhMgCl was used as the catalyst activator, no product of the boron boronation was observed.
亦篩選其他的有機金屬試劑,例如Bu2Mg或Et2Zn作為潛在的還原劑供使用作為鈷錯合物3之活化劑。當使用二乙基鋅作為催化劑活化劑時,GC沒有偵測到氧硼基化的產物。然而,用二正丁基鎂觀察到間二甲苯有75%的轉化(62%苄基氧硼基化產物6)成氧硼基化的產物。 Other organometallic reagents, such as Bu 2 Mg or Et 2 Zn, are also screened as potential reducing agents for use as activators of cobalt complex 3 . When diethylzinc was used as the catalyst activator, the product of the boron boronation was not detected by the GC. However, a 75% conversion of meta-xylene (62% benzyloxyboronated product 6 ) to the product of the oxyborylation was observed with di-n-butylmagnesium.
比較鈷錯合物4(帶有更大型的吡啶苯胺配位子)對鈷錯合物3於間二甲苯之氧硼基化的活性。使用鈷錯合物4所執行的氧硼基化反應導致63%的總轉化,以及偵測到57%(流程圖5)氧硼基化的化合物6。然而,與催化劑3相比,鈷錯合物4提供較低的轉化。選擇性方面觀察到沒有顯著差異。 The activity of cobalt complex 4 (with a larger pyridyl aniline ligand) for the boron boronation of cobalt complex 3 in m-xylene was compared. The boron boronation reaction performed using Cobalt Complex 4 resulted in 63% total conversion, and 57% (Scheme 5) oxyborylation of Compound 6 was detected. However, cobalt complex 4 provides a lower conversion than Catalyst 3 . No significant differences were observed in terms of selectivity.
發現活化劑(例如,格任亞試劑(Grignard reagent))的量及添加試劑的順序會影響氧硼基化反應。設若使用5或20mol%的格任亞試劑(例如,EtMgBr及CyMgCl),則GC不會發現氧硼基化產物。試劑添加的順序也會影響反應的結果。於表1所述的反應例子中,催化劑是先懸浮於THF及間二甲苯中。接而將格任亞試劑緩慢地添加至混合物。生成的混合物予以攪拌大約5min;接而添加HBpin至反應。然 而,設若修改添加試劑的順序以使最後添加至反應的試劑為格任亞試劑(於Hbpin之後),則整體的反應轉化會顯著減少(EtMgBr為34%;CyMgCl為13%)。也發現添加吡啶作為外部配位子會使反應停止。 The amount of activator (e.g., Grignard reagent) and the order in which the reagent is added are found to affect the boron boronation reaction. It is assumed that if 5 or 20 mol% of a Grenadi reagent (for example, EtMgBr and CyMgCl) is used, the GC does not find an oxyborylation product. The order in which the reagents are added also affects the results of the reaction. In the reaction examples described in Table 1, the catalyst was first suspended in THF and m-xylene. The Grena reagent is then slowly added to the mixture. The resulting mixture was stirred for about 5 min; then HBpin was added to the reaction. Of course However, if the order of addition of the reagents is modified so that the reagent finally added to the reaction is a genomic reagent (after Hbpin), the overall reaction conversion is remarkably reduced (EtMgBr is 34%; CyMgCl is 13%). It has also been found that the addition of pyridine as an external ligand stops the reaction.
假設氧硼基化反應會透過自由基(radical)或離子機轉而進行。設若氧硼基化反應係透過自由基機轉進行,吾人預期添加自由基清除劑至氧硼基化反應應該會使反應變慢或停止。 It is assumed that the boron boronation reaction proceeds by radical or ion machine. It is expected that the addition of a radical scavenger to the boronylation reaction should slow or stop the reaction if the boronylation reaction is carried out by a free radical machine.
氧硼基化反應係於存在1-辛烯及9,10-二氫蒽(流程圖6)的條件下執行。當烯存在時,GC-MS偵測到1-辛烯之加成性硼氫化作用,以及觀察到間二甲苯沒有產生氧硼基化產物。同樣地,當存在9,10-二氫蒽時,觀察到間二甲苯沒有產生氧硼基化產物。然而,在此情況下,GC或GC-MS均沒有偵測到蒽(9,10-二氫蒽與自由基物種預期的反應產物)。 The boronylation reaction is carried out in the presence of 1-octene and 9,10-dihydroanthracene (Scheme 6). When the olefin was present, GC-MS detected the addition hydroboration of 1-octene, and it was observed that the meta-xylene did not produce the boron boronation product. Likewise, when 9,10-dihydroanthracene was present, it was observed that meta-xylene did not produce an oxyborylation product. However, in this case, neither ruthenium (9,10-dihydroanthracene and the expected reaction product of the radical species) was detected by GC or GC-MS.
為了更佳地闡明反應機轉,使用對蒔蘿烴(p-cymene)作為氧硼基化的基質。設若對蒔蘿烴的氧硼基化係通過自由基(radical)中間物來進行,吾人會預期在反應期間要建立一級和三級自由基的平衡。吾人將預期此會導致 形成二種氧硼基化的產物。 In order to better illustrate the reaction of the reactor, p-cymene is used as a substrate for oxyborylation. It is assumed that if the oxyborylation of dihydrocarbons is carried out by radical intermediates, we would expect to establish a balance of primary and tertiary radicals during the reaction. We will expect this to lead to Two oxyborylated products are formed.
於第一個實驗中,對時蘿烴(p-cymene)之氧硼基化係使用鈷錯合物3及EtMgCl作為活化劑來執行。於充滿氮氣的手套箱內,將鈷錯合物3(19.8mg,0.025mmol,2.5mol%)裝入3mL Wheaton®小玻璃瓶中。然後,添加THF(0.5mL)和對蒔蘿烴(468μL,3.0mmol)。繼而逐滴地添加EtMgCl(2.0M配於MeTHF)(50μL,0.1mmol)。生成的混合物繼而予以攪拌大約5min。接而添加HBpin(145μL,1.0mmol)。將小玻璃瓶加蓋,且取出手套箱之外。反應混合物係於80℃下加熱歷時21h。GC之分析顯示以HBpin為基準,19%的轉化成單一異構物(流程圖7)。使用CyMgCl或是MeMgCl作為活化劑來執行此反應沒有提供氧硼基化產物。 In the first experiment, the oxyborylation of p-cymene was carried out using cobalt complex 3 and EtMgCl as activators. Cobalt Complex 3 (19.8 mg, 0.025 mmol, 2.5 mol%) was placed in a 3 mL Wheaton® vial in a nitrogen filled glove box. Then, THF (0.5 mL) and dihydrocarbene (468 μL, 3.0 mmol) were added. Then EtMgCl (2.0 M in MeTHF) (50 μL, 0.1 mmol) was added dropwise. The resulting mixture was then stirred for approximately 5 min. Then HBpin (145 μL, 1.0 mmol) was added. The vial is capped and removed from the glove box. The reaction mixture was heated at 80 ° C for 21 h. GC analysis showed that 19% was converted to a single isomer based on HBpin (Scheme 7). Performing this reaction using CyMgCl or MeMgCl as the activator did not provide the boron boronation product.
然後,執行競爭性實驗,等莫耳量的間二甲苯及對蒔蘿烴(p-cymene)於競爭性實驗中經歷氧硼基化作用(流程圖8)。於充滿氮氣的手套箱內,將鈷錯合物3(19.8mg,0.025mmol,2.5mol%)裝入3mL Wheaton®小玻璃瓶中。 添加THF(0.5mL)、間二甲苯(367μL,3.0mmol)及對蒔蘿烴(468μL,3.0mmol)。繼而逐滴地添加CyMgCl(1.0M配於MeTHF)(100μL,0.1mmol)。生成的混合物繼而予以攪拌大約5min。接而添加HBpin(145μL,1.0mmol)。將小玻璃瓶加蓋,且取出手套箱外。反應混合物係於80℃下加熱歷時21h。GC之分析顯示間二甲苯72%的轉化(以HBpin為基準),以及對蒔蘿烴7%的轉化(以HBpin為基準)。 Then, a competitive experiment was performed, and the molar amount of meta-xylene and p-cymene were subjected to oxygen boronation in a competitive experiment (Scheme 8). Cobalt Complex 3 (19.8 mg, 0.025 mmol, 2.5 mol%) was placed in a 3 mL Wheaton® vial in a nitrogen filled glove box. THF (0.5 mL), m-xylene (367 μL, 3.0 mmol) and dioxane (468 μL, 3.0 mmol) were added. Then CyMgCl (1.0 M in MeTHF) (100 μL, 0.1 mmol) was added dropwise. The resulting mixture was then stirred for approximately 5 min. Then HBpin (145 μL, 1.0 mmol) was added. The vial is capped and removed from the glove box. The reaction mixture was heated at 80 ° C for 21 h. GC analysis showed 72% conversion of meta-xylene (based on HBpin) and 7% conversion of dihydrocarbon (based on HBpin).
對蒔蘿烴為一種良好的氫原子予體,其能經由氫原子轉移而形成穩定的三級苄基自由基的平衡。鑑於對蒔蘿烴於競爭性實驗中不會使間二甲苯的氧硼基化停止,很可能此等鈷催化的氧硼基化不是經由自由基途徑來進行。 The dihydrocarbon is a good hydrogen atom precursor which can be transferred via a hydrogen atom to form a stable equilibrium of the tertiary benzyl radical. In view of the fact that dioxane does not stop the oxyborylation of meta-xylene in competitive experiments, it is likely that such cobalt-catalyzed oxyborylation is not via a free radical route.
來自格任亞試劑之烷基殘基的命運係使用十二烷基溴化鎂作為活化劑來研究。於催化反應的條件下,十二烷的痕量係透過GC和GC-MS來偵測。透過GC分析來自 鈷錯合物3和十二烷基溴化鎂之化學計量反應的等分試樣,來執行十二烷的定量。此化學計量反應生成70%產量的十二烷;然而,GC-MS也偵測到其他未鑑定之含C12的產物。 The fate of the alkyl residue from the Grena reagent was investigated using dodecylmagnesium bromide as the activator. Under the conditions of the catalytic reaction, traces of dodecane were detected by GC and GC-MS. An aliquot of the stoichiometric reaction from Cobalt Complex 3 and Dodecylmagnesium bromide was analyzed by GC to perform dodecane quantification. This stoichiometric reaction yield of 70% dodecane; however, GC-MS is also aware of other unidentified C 12 of the product-containing.
也嘗試了數種其他的氧硼基化的基質。當使用4-甲氧基甲苯作為基質時,GC觀察到產物痕量的量。用3-氟甲苯或2,6-二甲吡啶沒有看見氧硼基化產物。 Several other oxyborylated substrates have also been tried. When 4-methoxytoluene was used as the substrate, a trace amount of the product was observed by GC. No boron boronation product was observed with 3-fluorotoluene or 2,6-dimethylpyridine.
假設氧硼基化反應會涉及具有烷氧基基團之鈷錯合物中鹵化物配位子的交換。為了探討此種可能性,間二甲苯係使用鈷錯合物3及KOtBu作為活化劑來經歷氧硼基化。於充滿氮氣的手套箱內,將鈷錯合物3(19.8mg,0.025mmol,2.5mol%)及KOtBu(17mg,0.15mmol)裝入3mL Wheaton®小玻璃瓶中。接而添加THF(0.5mL)。生成的混合物繼而予以攪拌大約5min。接而添加間二甲苯(367μL,3.0mmol)及B2pin2(254mg,1.0mmol)。將小玻璃瓶加蓋,且取出手套箱外。反應混合物係於80℃下加熱歷時17h。GC之分析顯示以B2pin2為基準,間二甲苯8%的轉化,且苄基對金屬氧硼基化(meta borylation)產物的比率為1:2(流程圖9)。觀察到HBpin沒有反應。NaOtBu達到的轉化是類似的。其他的鹼,例如LiOtBu、K2CO3、K3PO4及KOAc是無效率的。 It is assumed that the boron boronation reaction involves the exchange of halide ligands in a cobalt complex having an alkoxy group. To investigate this possibility, meta-xylene was subjected to oxyborylation using cobalt complex 3 and KOtBu as activators. Cobalt Complex 3 (19.8 mg, 0.025 mmol, 2.5 mol%) and KOtBu (17 mg, 0.15 mmol) were placed in a 3 mL Wheaton® vial in a nitrogen-filled glove box. Then THF (0.5 mL) was added. The resulting mixture was then stirred for approximately 5 min. Then m-xylene (367 μL, 3.0 mmol) and B 2 pin 2 (254 mg, 1.0 mmol) were added. The vial is capped and removed from the glove box. The reaction mixture was heated at 80 ° C for 17 h. Analysis by GC showed 8% conversion of meta-xylene based on B 2 pin 2 and a ratio of benzyl to metal boronation product of 1:2 (Scheme 9). It was observed that HBpin did not respond. The conversion achieved by NaOtBu is similar. Other bases such as LiOtBu, K2CO3, K3PO4 and KOAc are inefficient.
流程圖9. 間二甲苯使用鈷錯合物3及KOtBu作為活化劑之氧硼基化Scheme 9. Oxyborylation of m-xylene using cobalt complex 3 and KOtBu as activator
對含括N-雜環碳烯(NHC)作為配位子之鈷錯合物進行作為氧硼基化催化劑之評估。使用CoCl2作為鈷的來源,NHC-1作為碳烯之前驅物,及一種鹼(KOtBu),活性的鈷催化劑可以於原位形成,以及可以達到成功的間二甲苯之氧硼基化(流程圖10)。 Evaluation of a cobalt complex containing a N-heterocyclic carbene (NHC) as a ligand as an oxygen boronation catalyst was carried out. Using CoCl 2 as a source of cobalt, NHC-1 as a carbene precursor, and a base (KOtBu), an active cobalt catalyst can be formed in situ, and successful m-boroxylation of meta-xylene can be achieved (flow Figure 10).
於充滿氮氣的手套箱內,將氯化鈷(6.5mg,0.05mmol,5mol%)、1,3-二異丙基-1H-咪唑-3-鎓氯化物(1,3-diisopropyl-1H-imidazol-3-ium chloride)(18.9mg,0.1mmol)及KOtBu(22.4mg,0.2mmol)裝入3mL Wheaton®小玻璃瓶中。添加THF(0.5mL),以及生成的混合物予以攪拌大約10min。形成紫色的溶液。接而,添加間二甲苯(367μL,3.0mmol)及HBpin(145μL,3.0mmol)。將小玻璃瓶加蓋,且取出手套箱外。反應混合物接而係於80℃下加熱歷時16h。GC之分析顯示以HBpin為基準,間二甲苯40%的轉化。於相同的反應條件下,B2pin2沒有提供任何氧硼基化的產物。於相同的反應條件下,乙苯提供起始材料的56%之轉化(45%轉化成苄基氧硼基化產物)。 Cobalt chloride (6.5 mg, 0.05 mmol, 5 mol%), 1,3-diisopropyl-1H-imidazol-3-indene chloride (1,3-diisopropyl-1H- in a glove box filled with nitrogen) Imidazol-3-ium chloride) (18.9 mg, 0.1 mmol) and KOtBu (22.4 mg, 0.2 mmol) were placed in a 3 mL Wheaton® vial. THF (0.5 mL) was added and the resulting mixture was stirred for approximately 10 min. A purple solution is formed. Next, m-xylene (367 μL, 3.0 mmol) and HBpin (145 μL, 3.0 mmol) were added. The vial is capped and removed from the glove box. The reaction mixture was then heated at 80 ° C for 16 h. GC analysis showed 40% conversion of meta-xylene based on HBpin. Under the same reaction conditions, B 2 pin 2 did not provide any product of boron boronation. Under the same reaction conditions, ethylbenzene provided 56% conversion of the starting material (45% conversion to benzyloxyboronated product).
流程圖10. 間二甲苯使用原位形成的碳烯連接的鈷錯合物Scheme 10. Meta-xylene using in situ formed carbene-linked cobalt complex
假設以上反應中的活性的氧硼基化催化劑為氧硼基化反應期間,於原位形成的NHC-連接的鈷烷氧化物。為了測試此種假設,假定的活性的氧硼基化催化劑(NHC-1)被合成且單離。簡言之,於KotBu鹼存在下,使CoCl2與NHC-1反應,以提供再結晶後產量為88%的鈷催化劑8(流程圖11)。 It is assumed that the active oxyborylation catalyst in the above reaction is an NHC-linked cobalt alkoxide formed in situ during the oxyborylation reaction. To test this hypothesis, the putative active oxyborylation catalyst ( NHC-1 ) was synthesized and isolated. Briefly, CoCl 2 was reacted with NHC-1 in the presence of a KotBu base to provide a cobalt catalyst 8 having a yield of 88% after recrystallization (Scheme 11).
將具有CoCl2(168mg,1.3mmol)及1,3-二異丙基-1H-咪唑-3-鎓氯化物(490mg,2.6mmol),充滿氮氣的手套箱裝入烤箱乾燥的玻璃器皿內。接而相繼地添加THF(8mL)和KOtBu(583mg,5.2mmol)。生成的混合物係於手套箱內攪拌歷時1h。接而,於真空下移除溶劑,以及將殘餘物懸浮於甲苯中且過濾通過Celite®。收集濾液,以及於真空下移除溶劑,提供635mg的深紫色晶形物質。於-35℃下從戊烷再結晶提供582mg(88%)的鈷錯合物8。單晶X射線繞射確認結構。1H NMR(500MHz,苯-d6,ppm)δ 41.70(s,4H)39.00(br s,4H)8.76(br s,18H)2.31(br s,24H)。 A glove box filled with nitrogen, containing CoCl 2 (168 mg, 1.3 mmol) and 1,3-diisopropyl-1H-imidazole-3-indene chloride (490 mg, 2.6 mmol), was placed in an oven-dried glassware. Then THF (8 mL) and KOtBu (583 mg, 5.2 mmol) were successively added. The resulting mixture was stirred in a glove box for 1 h. The solvent was then removed under vacuum and the residue was suspended in toluene and filtered through Celite®. The filtrate was collected and the solvent was removed in vacuo to afford 635 mg of dark purple crystalline material. At -35 ℃ recrystallized from pentane to provide 582mg (88%) of 8-cobalt complexes. Single crystal X-ray diffraction confirms the structure. 1 H NMR (500 MHz, benzene-d6, ppm) δ 41.70 (s, 4H) 39.00 (br s, 4H) 8.76 (br s, 18H) 2.31 (br s, 24H).
流程圖11. 鈷催化劑8的合成Flowchart 11. Synthesis of Cobalt Catalyst 8
接而對鈷錯合物8作為氧硼基化催化劑進行評估。於充滿氮氣的手套箱內,將鈷錯合物8(5.1mg,0.01mmol,2mol%)裝入3mL Wheaton®小玻璃瓶中。接而相繼地添加THF(0.25mL)和間二甲苯(183μL,1.5mmol)。然後添加HBpin(73μL,0.5mmol)。將小玻璃瓶加蓋,且取出手套箱外。反應混合物接而係於80℃下加熱歷時16h。GC之分析顯示以HBpin為基準,間二甲苯80%的轉化。62%的單氧硼基化(monoborylated)產物6與13%的偕-diBpin(gem-diBpin)產物9一起形成。 Cobalt complex 8 was then evaluated as an oxyborylation catalyst. Cobalt Complex 8 (5.1 mg, 0.01 mmol, 2 mol%) was placed in a 3 mL Wheaton® vial in a nitrogen filled glove box. Then THF (0.25 mL) and m-xylene (183 μL, 1.5 mmol) were added successively. Then HBpin (73 μL, 0.5 mmol) was added. The vial is capped and removed from the glove box. The reaction mixture was then heated at 80 ° C for 16 h. GC analysis showed 80% conversion of meta-xylene based on HBpin. 62% of the monoborylated product 6 was formed with 13% of the 偕-diBpin (gem-diBpin) product 9 .
於另一個實驗中,氧硼基化反應係使用基質作為限量試劑來執行。於充滿氮氣的手套箱內,將鈷錯合物 8(10.2mg,0.02mmol,2mol%)裝入3mL Wheaton®小玻璃瓶中。接而添加THF(0.25mL)和間二甲苯(122μL,1.0mmol)。然後,添加HBpin(290μL,2.0mmol)。將小玻璃瓶加蓋,且取出手套箱外。反應混合物接而係於80℃下加熱歷時17h。GC之分析顯示間二甲苯71%的轉化:37%的單氧硼基化(monoborylated)產物6係與29%的偕-diBpin(gem-diBpin)產物9及5%未鑑定的diBpin產物一起形成。 In another experiment, the oxyborylation reaction was carried out using a substrate as a limiting reagent. Cobalt Complex 8 (10.2 mg, 0.02 mmol, 2 mol%) was placed in a 3 mL Wheaton® vial in a nitrogen-filled glove box. Then THF (0.25 mL) and m-xylene (122 μL, 1.0 mmol) were added. Then, HBpin (290 μL, 2.0 mmol) was added. The vial is capped and removed from the glove box. The reaction mixture was then heated at 80 ° C for 17 h. Analysis by GC showed 71% conversion of meta-xylene: 37% of the monoborylated product 6 was formed with 29% of the 偕-diBpin (gem-diBpin) product 9 and 5% of the unidentified diBpin product. .
亦發現到設若添加催化量的Hbpin來活化鈷預催化劑8,就可以使用B2pin2作為主要的硼來源。於充滿氮氣的手套箱內,將鈷錯合物8(10.2mg,0.02mmol,2mol%)裝入3mL Wheaton®小玻璃瓶中。添加THF(0.5mL)和間二甲苯(122μL,1.0mmol)。然後,添加HBpin(11.6μL,0.08mmol,8mol%)和B2pin2(381mg,1.5mmol)。將小玻璃瓶加蓋,且取出手套箱外。反應混合物接而係於80℃下加熱歷時16h。GC之分析顯示間二甲苯77%的轉化:31%的單氧硼基化(monoborylated)產物6係與40%的gem-diBpin產物9及6%未鑑定的diBpin產物一起形成。延長高達40小時的加熱不會改善轉化及產物比率。產物的單離係於使用戊烷-二乙基醚混合物作為沖提液之急速管柱層析法之矽膠上進行。4,4,5,5-四甲基-2-(3-甲苯基)-1,3,2-二 戊硼烷係單離為19%產量的無色油。1H NMR(500MHz,CDCl3,ppm)δ 7.14(dd,1H,J=7.2,7.2Hz)7.02-6.98(m,2H)6.95(d,1H,J=7.5Hz)2.32(s,3H)2.27(s,2H)1.25(s,12H)。13C NMR(125 MHz,CDCl3,ppm)δ 138.4,137.7,129.8,128.1,125.9,125.6,83.4,24.7,21.4。未找出一個碳的信號。11B NMR(160MHz,CDCl3,ppm)δ 33.0。2,2’-(間 基亞甲基)-雙(4,4,5,5-四甲基-1,3,2-二 戊硼烷)係單離為21%產量。1H NMR(500MHz,CDCl3,ppm)δ 7.14-7.09(m,2H)7.05(s,1H)6.92-6.88(m,1H)2.30(s,3H)2.27(s,1H)1.24(s,12H)1.23(s,12H)。11B NMR(160MHz,CDCl3,ppm)δ 32.9。 It has also been found that if a catalytic amount of Hbpin is added to activate the cobalt precatalyst 8, B 2 pin 2 can be used as the primary source of boron. Cobalt Complex 8 (10.2 mg, 0.02 mmol, 2 mol%) was placed in a 3 mL Wheaton® vial in a nitrogen-filled glove box. THF (0.5 mL) and m-xylene (122 μL, 1.0 mmol) were added. Then, HBpin (11.6 μL, 0.08 mmol, 8 mol%) and B 2 pin 2 (381 mg, 1.5 mmol) were added. The vial is capped and removed from the glove box. The reaction mixture was then heated at 80 ° C for 16 h. Analysis by GC showed 77% conversion of meta-xylene: 31% of the monoborylated product 6 was formed with 40% of the gem-diBpin product 9 and 6% of the unidentified diBpin product. Extending the heating for up to 40 hours does not improve the conversion and product ratio. The isolation of the product was carried out on a silica gel using a pentane-diethyl ether mixture as a flash column for rapid column chromatography. 4,4,5,5-tetramethyl-2-(3-tolyl)-1,3,2-di The pentaborane was isolated as a colorless oil with a yield of 19%. 1 H NMR (500MHz, CDCl 3 , ppm) δ 7.14 (dd, 1H, J = 7.2,7.2Hz) 7.02-6.98 (m, 2H) 6.95 (d, 1H, J = 7.5Hz) 2.32 (s, 3H) 2.27 (s, 2H) 1.25 (s, 12H). 13 C NMR (125 MHz, CDCl 3 , ppm) δ 138.4, 137.7, 129.8, 128.1, 125.9, 125.6, 83.4, 24.7, 21.4. No signal was found for a carbon. 11 B NMR (160 MHz, CDCl 3 , ppm) δ 33.0. 2,2'-(between Benzylmethyl)-bis(4,4,5,5-tetramethyl-1,3,2-di The pentaborane) is 21% yield. 1 H NMR (500MHz, CDCl 3 , ppm) δ 7.14-7.09 (m, 2H) 7.05 (s, 1H) 6.92-6.88 (m, 1H) 2.30 (s, 3H) 2.27 (s, 1H) 1.24 (s, 12H) 1.23 (s, 12H). 11 B NMR (160 MHz, CDCl 3 , ppm) δ 32.9.
亦評估額外的基質。4-氯甲苯之氧硼基化提供微量的鹵素-硼交換產物。沒有偵測到其他的氧硼基化的產物。3-氟甲苯於反應的條件下予以去氟。於11B-NMR中觀察到只有微量的氧硼基化物質。2-甲噻吩於反應的條件下為無反應的。於獨立的實驗中,使用等莫耳(equivimolar)量的2-甲噻吩及間二甲苯,確認噻吩會作用為催化劑毒,因間二甲苯沒有觀察到氧硼基化。GC和GC-MS亦觀察到2,6-二甲吡啶微量的氧硼基化。 Additional matrices were also evaluated. Oxyborylation of 4-chlorotoluene provides a trace amount of halogen-boron exchange product. No other products of oxyborylation were detected. The 3-fluorotoluene is defluorinated under the conditions of the reaction. Only a trace amount of the boron boronated material was observed in the 11 B-NMR. 2-Methylthiophene is unreactive under the conditions of the reaction. In an independent experiment, using an equivimolar amount of 2-methylthiophene and m-xylene, it was confirmed that thiophene acts as a catalyst poison, and no oxyborylation was observed due to meta-xylene. A slight amount of oxyborylation of 2,6-dimethylpyridine was also observed by GC and GC-MS.
使用3-甲基苯甲醚所執行的反應提供由於還原-氧硼基化順序(reduction-borylation sequence)所產生的產物 混合物。於充滿氮氣的手套箱內,將鈷錯合物8(10.2mg,0.02mmol,2mol%)裝入3mL Wheaton®小玻璃瓶中。接著添加0THF(0.24mL)和3-甲基苯甲醚(126μL,1.0mmol)。然後,添加HBpin(290μL,2.0mmol)。將小玻璃瓶加蓋,且取出手套箱外。反應混合物接而係於80℃下加熱歷時18h。GC之分析顯示11%的α-Bpin-甲苯,25%的α,α-diBpin-甲苯,以及16%的甲苯。 The reaction carried out using 3-methylanisole provides a product mixture resulting from a reduction-borylation sequence. Cobalt Complex 8 (10.2 mg, 0.02 mmol, 2 mol%) was placed in a 3 mL Wheaton® vial in a nitrogen-filled glove box. Then 0 THF (0.24 mL) and 3-methylanisole (126 [mu]L, 1.0 mmol) were added. Then, HBpin (290 μL, 2.0 mmol) was added. The vial is capped and removed from the glove box. The reaction mixture was then heated at 80 ° C for 18 h. Analysis by GC showed 11% alpha-Bpin-toluene, 25% alpha, alpha-diBpin-toluene, and 16% toluene.
所附申請專利範圍內之組成物及方法不受限於本文所述之特定組成物及方法的範疇,本文所述之特定組成物及方法係打算作為一些申請專利範圍態樣的說明。任何功能上均等的組成物及方法均意欲落在申請專利範圍的範疇內。本文顯示及說明的該等以外之組成物及方法的各種修飾,也意欲落在所附申請專利範圍的範疇內。再者,雖然只有具體說明本文揭示的某些代表性組成物及方法步驟,但是組成物及方法步驟之其他的組合也意欲落在所附申請專利範圍的範疇內,即使沒有具體列舉。因而,步驟、元件、組分或成分之組合可能於此明白地提及或沒有,可是,其他的步驟、元件、組分或成分之組合也被含括,即使沒有明白陳述。 The compositions and methods within the scope of the appended claims are not limited to the particular compositions and methods described herein. The specific compositions and methods described herein are intended to be illustrative of the scope of the invention. Any functionally equivalent composition and method are intended to fall within the scope of the claimed patent. Various modifications of the compositions and methods other than those shown and described herein are also intended to fall within the scope of the appended claims. Furthermore, although certain representative compositions and method steps disclosed herein are specifically described, other combinations of the compositions and method steps are also intended to fall within the scope of the appended claims, even if not specifically recited. Thus, a combination of steps, elements, components or components may be mentioned or not explicitly mentioned herein, however, other steps, elements, components or combinations of ingredients are also included, even if not stated.
當使用於本文中,術語「包含(comprising)」及其變形,與術語「包括(including)」及其變形是同義的,以及為開放式(open)、非限制性的術語。縱然本文中業已使用術語「包含(comprising)」及「包括(including)」來描述各種具體例,但是可以使用術語「實質由…組成(consisting essentially of)」及「由…組成(consisting of)」來代替「包含(comprising)」及「包括(including)」,以提供本發明之更特定的具體例,以及亦被揭示。除了有指明之處,否則本說明書及申請專利範圍中用來表示幾何學、維度等等之所有的數字,要瞭解到最起碼,且不企圖限制均等論對申請專利範圍範疇之應用,係根據有效數字的數字及普通四捨五入方法來解釋。 As used herein, the term "comprising" and variations thereof are synonymous with the terms "including" and variations thereof, and are open, non-limiting terms. Although the terms "comprising" and "including" have been used herein to describe various specific examples, the term "substantially consists of" (consisting) The "consisting of" and "comprising" are intended to provide a more specific embodiment of the invention and are also disclosed. Except where specified, all numbers used in this specification and the scope of patent application to represent geometry, dimensions, etc., should be understood at the very least, and are not intended to limit the application of the scope of application to the scope of the patent application. The number of significant figures and the usual rounding method are explained.
除非另外定義,否則本文中所使用的所有的技術與科學術語均具有被在本揭示發明所屬之技藝具有通常技術者所普遍瞭解相同的意義。本文中列舉出的出版物與其等列舉出材料係明確地併入以作為參考資料。 All technical and scientific terms used herein have the same meaning as commonly understood by one of ordinary skill in the art to which the present invention pertains, unless otherwise defined. The publications listed herein, and the like, are hereby incorporated by reference.
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