TW201624139A - Organic vacuum coating system and thin-film formation method - Google Patents
Organic vacuum coating system and thin-film formation method Download PDFInfo
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- TW201624139A TW201624139A TW103146377A TW103146377A TW201624139A TW 201624139 A TW201624139 A TW 201624139A TW 103146377 A TW103146377 A TW 103146377A TW 103146377 A TW103146377 A TW 103146377A TW 201624139 A TW201624139 A TW 201624139A
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/12—Organic material
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
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- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
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- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
Abstract
Description
本發明係與薄膜成型有關,特別是指一種有機真空塗佈系統與薄膜形成方法。 The present invention relates to film formation, and more particularly to an organic vacuum coating system and a film forming method.
習知塗佈系統及薄膜形成方法,若在大氣中實施會造成溶液揮發浪費的情形;為解決這種問題,有的使用無塵室設備,然而其成本甚高。 Conventional coating systems and film forming methods, if implemented in the atmosphere, cause a waste of solution volatilization; in order to solve such problems, some use clean room equipment, however, the cost is very high.
再者,以上的塗佈系統及薄膜形成方法為求表面平整,通常須要將膜厚增加才能達成,尤其是在不平整的表面。 Furthermore, the above coating system and film forming method are required to achieve a flat surface, which is usually required to increase the film thickness, especially on uneven surfaces.
另外,其有機液體不易均勻混合噴塗,因此塗膜的機能性較無法提昇。 In addition, the organic liquid is not easily mixed and sprayed, so the performance of the coating film cannot be improved.
因此,已知有機真空塗佈系統及薄膜形成方法的缺失仍然有待改進。 Therefore, the lack of an organic vacuum coating system and a film forming method is known to be improved.
有鑑於此,本發明之主要目的在於提供一種有機真空塗佈系統及薄膜形成方法,其可減少溶液使用,減少針孔現象,薄膜平滑的效果,提高親疏水性及硬度,及加強素材表面不平整處之覆蓋能力。 In view of the above, the main object of the present invention is to provide an organic vacuum coating system and a film forming method, which can reduce the use of a solution, reduce the pinhole phenomenon, smooth the film, improve the hydrophobicity and hardness, and enhance the surface unevenness of the material. Coverage ability.
為達成上述目的,本發明提供一種有機真空塗佈系統,包含有一腔體,具有一容室可抽真空;一載台,設於該腔體的容室,供裝設被鍍物;一蒸發源,設於該腔體的容室;一有機單體供應裝置,係對該蒸 發源噴射有機單體使蒸發到被鍍物上;一硬化裝置,對該被鍍物成形的薄膜加以硬化。 In order to achieve the above object, the present invention provides an organic vacuum coating system comprising a cavity having a chamber for vacuuming; a stage disposed in the chamber of the chamber for mounting a plated object; a source, disposed in a chamber of the chamber; an organic monomer supply device The organic monomer is sprayed to evaporate onto the object to be plated; and a hardening device hardens the film formed by the object to be plated.
本發明亦提供一種使用所述有機真空塗佈系統的薄膜形 成方法,其步驟如下:承載;抽真空;壓力控制;成膜;硬化;開啟;取出。 The invention also provides a film shape using the organic vacuum coating system The method is as follows: carrying; vacuuming; pressure control; film formation; hardening; opening;
較佳地,該腔體的容室抽真空使真空度界於在 10-1torr~106torr之間。 Preferably, the chamber of the chamber is evacuated such that the degree of vacuum is between 10 -1 torr and 10 6 torr.
較佳地,該蒸發源的溫度設定在攝氏200~450度之間。 Preferably, the temperature of the evaporation source is set between 200 and 450 degrees Celsius.
較佳地,可重覆該成膜步驟及硬化步驟。 Preferably, the film forming step and the hardening step are repeated.
藉此,本發明該蒸發源與有機單體供應裝置均設在腔體內,可使被鍍物無須移出移進該腔體,以確保塗層不受到外界影響,達到更好的品質。 Thereby, the evaporation source and the organic monomer supply device of the invention are all disposed in the cavity, so that the object to be plated does not need to be removed and moved into the cavity, so as to ensure that the coating is not affected by the outside and achieve better quality.
有關本發明所提供之有機真空塗佈系統及薄膜形成方法的詳細構造及特點,將於後續的實施方式中予以詳盡描述。然而,本技術領域中具有通常知識者理應瞭解,該等詳細說明以及實施本發明所列舉的特定實施例,僅用於說明本發明,並非用以限制本發明的專利申請範圍。 Detailed construction and features of the organic vacuum coating system and film forming method provided by the present invention will be described in detail in the following embodiments. However, it should be understood by those of ordinary skill in the art that the particular embodiments of the invention are described herein.
(10)‧‧‧腔體 (10) ‧‧‧ cavity
(11)‧‧‧容室 (11) ‧ ‧ ‧ room
(20)‧‧‧載台 (20) ‧‧‧ stage
(30)‧‧‧蒸發源 (30) ‧ ‧ evaporation source
(40)‧‧‧有機單體供應裝置 (40) ‧‧‧Organic monomer supply unit
(50)‧‧‧硬化裝置 (50)‧‧‧ Hardening device
第1圖係本發明一較佳實施例的結構示意圖。 BRIEF DESCRIPTION OF THE DRAWINGS Figure 1 is a schematic view showing the structure of a preferred embodiment of the present invention.
第2圖係本發明薄膜形成方法之一流程圖。 Fig. 2 is a flow chart showing a method of forming a film of the present invention.
第3圖係本發明薄膜形成方法另一流程圖。 Figure 3 is another flow chart of the method of forming a film of the present invention.
申請人首先在此說明,於通篇說明書中所指之內、外、上、下等有關方向性的形容詞,皆是以本發明圖式中的方向為基準。 The Applicant first describes here that the adjectives relating to directionality, such as inside, outside, up, and down, as referred to throughout the specification, are based on the directions in the drawings of the present invention.
以下將藉由所列舉之實施例配合隨附之圖式,詳細說明本發明的技術內容及特徵,其中:如第1圖所示,本發明一較佳實施例之有機真空塗佈系統,包含有:一腔體(10),具有一容室(11)可抽真空。 The technical contents and features of the present invention will be described in detail below with reference to the accompanying drawings, in which: FIG. 1 shows an organic vacuum coating system according to a preferred embodiment of the present invention, including There is: a cavity (10) having a chamber (11) for evacuation.
一載台(20),設於該腔體(10)的容室(11),供裝設被鍍物。其中,該載台(20)係可位移及/或旋轉。 A loading stage (20) is disposed in the chamber (11) of the cavity (10) for mounting the object to be plated. The stage (20) is displaceable and/or rotatable.
一蒸發源(30),設於該腔體(10)的容室(11)底部。 An evaporation source (30) is disposed at the bottom of the chamber (11) of the cavity (10).
一有機單體供應裝置(40),對該蒸發源(30)噴射有機單體使蒸發到被鍍物上。 An organic monomer supply device (40) ejects the organic monomer to the evaporation source (30) to evaporate onto the object to be plated.
一硬化裝置(50),對該被鍍物成形的薄膜加以硬化。本實施例中,該硬化裝置(50)係設於該腔體(10)的容室(11)環周,該硬化裝置(50)係為一紫外光燈。 A curing device (50) hardens the film formed by the object to be plated. In this embodiment, the curing device (50) is disposed around the circumference of the chamber (11) of the cavity (10), and the curing device (50) is an ultraviolet lamp.
如第2圖所示,使用所述有機真空塗佈系統的薄膜形成方法,即膜層鍍製程,其步驟及說明如下:承載:將被鍍物設置於該載台(20)。 As shown in Fig. 2, the film forming method of the organic vacuum coating system, that is, the film plating process, is described and illustrated as follows: Bearing: The object to be plated is placed on the stage (20).
抽真空:將該腔體(10)的容室(11)抽真空使真空度界於在10-1torr~10-6torr之間。 Vacuuming: The chamber (11) of the chamber (10) is evacuated so that the degree of vacuum is between 10 -1 torr and 10 -6 torr.
壓力控制:維持前述真空度。 Pressure Control: Maintain the aforementioned vacuum.
成膜:以該有機單體供應裝置(40)對該蒸發源(30)噴射有機單體使蒸發到被鍍物上,使形成一塗層。 Film formation: The organic monomer is supplied to the evaporation source (30) by the organic monomer supply device (40) to evaporate onto the object to be plated to form a coating.
硬化:以該硬化裝置(50)對前述塗層烘乾。 Hardening: The aforementioned coating is dried with the hardening device (50).
開啟:該腔體(10)的容室(11)。 Open: the chamber (11) of the cavity (10).
取出:拿被鍍物。 Take out: Take the object to be plated.
其中,該蒸發源(30)的溫度設定在攝氏200~450度之間。 Wherein, the temperature of the evaporation source (30) is set between 200 and 450 degrees Celsius.
如第3圖所示,使用所述有機真空塗佈系統的薄膜形成方法,與前述大致相同,不同處在於重覆該成膜與硬化步驟一次或一次以上。 As shown in Fig. 3, the film forming method using the organic vacuum coating system is substantially the same as described above except that the film forming and hardening steps are repeated once or more.
其中,各次的有機單體可相同或不同;藉此,本實施例對於多個塗層可使被鍍物無須移出移進該腔體(10),以確保塗層不受到外界影響,達到更好的品質。 Wherein, the organic monomers of each time may be the same or different; thereby, the embodiment can prevent the object to be plated from moving into the cavity (10) for multiple coatings to ensure that the coating is not affected by external influences. Better quality.
因此,利用本發明可達成以下各項: Therefore, the following items can be achieved by the present invention:
1.取代目前大氣噴塗系統,減少溶液使用。 1. Replace the current atmospheric spray system to reduce solution usage.
2.不需要無塵室設備來減少粉塵可減少營運成本。 2. No need for clean room equipment to reduce dust can reduce operating costs.
3.由於真空中有抽氣可以減少針孔現象。 3. The pinhole phenomenon can be reduced due to pumping in the vacuum.
4.可以減少薄膜厚度就達到保護平滑的效果。 4. It can reduce the thickness of the film to achieve a smooth and protective effect.
5.可增加有機液體種類混合,提高親疏水性及硬度。 5. It can increase the mixing of organic liquid types and improve the hydrophobicity and hardness.
6.膜面平坦化功用可加強素材表面不平整處之覆蓋能力。 6. The film surface flattening function can enhance the coverage of the uneven surface of the material.
綜合前述,本發明有機真空塗佈系統及薄膜形成方法,確實達成本發明之目的。 In summary, the organic vacuum coating system and film forming method of the present invention achieve the object of the present invention.
(10)‧‧‧腔體 (10) ‧‧‧ cavity
(11)‧‧‧容室 (11) ‧ ‧ ‧ room
(20)‧‧‧載台 (20) ‧‧‧ stage
(30)‧‧‧蒸發源 (30) ‧ ‧ evaporation source
(40)‧‧‧有機單體供應裝置 (40) ‧‧‧Organic monomer supply unit
(50)‧‧‧硬化裝置 (50)‧‧‧ Hardening device
Claims (10)
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TW103146377A TWI541612B (en) | 2014-12-30 | 2014-12-30 | Organic vacuum coating system and film forming method |
CN201511022437.6A CN105734496A (en) | 2014-12-30 | 2015-12-30 | organic vacuum coating system and thin film forming method |
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TW103146377A TWI541612B (en) | 2014-12-30 | 2014-12-30 | Organic vacuum coating system and film forming method |
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TW201624139A true TW201624139A (en) | 2016-07-01 |
TWI541612B TWI541612B (en) | 2016-07-11 |
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JPH0734332B2 (en) * | 1986-03-12 | 1995-04-12 | 株式会社ト−ビ | Method for producing transparent conductive film |
KR20030038689A (en) * | 2000-08-10 | 2003-05-16 | 신닛테츠가가쿠 가부시키가이샤 | Method and device for producing organic EL elements |
KR101071605B1 (en) * | 2006-05-19 | 2011-10-10 | 가부시키가이샤 알박 | Vapor deposition apparatus for organic vapor deposition material and process for producing organic thin film |
CN101877072B (en) * | 2009-04-28 | 2013-02-13 | 吴军华 | Manufacturing method and system of radio frequency self-adhesive label |
CN103128038A (en) * | 2011-11-22 | 2013-06-05 | 东莞星晖真空镀膜塑胶制品有限公司 | Infrared ultraviolet combined curing machine and curing method |
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TWI541612B (en) | 2016-07-11 |
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