TW201622953A - Micro/nano imprinting assembly, method for fabricating the same, apparatus for making decorative material with seamless micro/nano surface structure, and decorative material with seamless micro/nano surface structure thereof - Google Patents

Abstract

The instant disclosure relates to a micro/nano imprinting assembly, a method for fabricating the same, a device for making decorative material with seamless micro/nano surface structure, and a decorative material with seamless micro/nano surface structure thereof. The micro/nano imprinting assembly is configured to imprint textures/patterns on a decorative material. The micro/nano imprinting assembly includes a track-type imprinting mold and two guide-rollers which are opposite to each other. The track-type imprinting mold has seamless textures/patterns on its outer surface. The track-type imprinting mold, applied to an imprinting process, can scroll through the guide-rollers that act as supporting points. Therefore, the yield-cost optimization can be achieved.

Description

Micro-nano imprinting device, manufacturing method and manufacturing equipment of non-sewn micro-structured decorative material and Non-stitched micro-structured material

The invention relates to a nano-patterning technology, in particular to a micro-nano imprinting device suitable for transferring a continuous large-area micro-nano structure without gaps to a surface of a decorative material, and a manufacturing method of the non-sewn micro-structured decorative material And manufacturing equipment and its non-stitched microstructured decorative materials.

Micro/nano-imprint Technology (micro/nano-imprint Technology) is a very popular micro-nano-scale fine pattern production technology, which has a wide range of applications, such as in optical, semiconductor and optoelectronic components. The advantage of the pattern is that it is possible to produce a large number of components or objects with a micron-level transfer pattern at low cost. Therefore, micro-nano imprint technology is regarded as an important lithography technology for the next generation, and various circles in the country have recently invested in this research field.

In general, to transfer the micro-nano structure pattern by imprinting, there are three basic requirements: First, an imprinting mold having a micro/nano scale pattern, which is usually utilized. Oriented by an optical or electron beam lithography process; second, a layer of a polymer material for forming an embossed pattern, wherein the polymer material also needs to have a suitable glass transition temperature (Tg) and molecular weight, and such The polymer material layer is usually pre-coated on a solid substrate; and thirdly, an imprinting device capable of appropriately controlling the temperature, pressure, and parallelism between the stamp and the substrate. Embossing molds today Combined with the outer surface of the roller, the process developed by the Roll to Roll system, with its advantages of low cost, large area, low equipment cost, low energy consumption, high productivity, etc., has become a micro One of the most promising and competitive mass production technologies for components or objects of the nanoscale transfer pattern.

Referring to Fig. 1, a conventional Roller-type imprinting mold 1' includes a roller 11' and a template 12' having an embossed pattern on the surface. Here, the template 12' is mounted and fixed to the roller 11' by a locking member such as a screw, and a gap 13' is formed at the joint of both ends of the template 12'. Please refer to FIG. 2, it should be noted that, due to the inevitable existence of the gap 13', when the imprinting mold 1' is applied to the fabrication of a large-area continuous fine pattern, the substrate 2' after being rolled thereon The polymer material layer 21' will leave a corresponding seam 22'.

That is to say, although the conventional roll-type imprinting mold 1' can produce a large-area continuous fine pattern, the seam 22' appears every fixed pitch (for example, 30 to 60 cm), and is particularly noticeable in the latter stage. Therefore, the degree of freedom in designing the product is limited. Further, in practice, even if the subsequent modification process can be used to improve the appearance quality of the product, for example, by manually picking up the seams and avoiding the seam line, this is undoubtedly another additional material and labor cost.

Please refer to FIG. 3 and FIG. 4 separately. In view of the above problems, the industry uses the imprinting mold 1' together with a pair of pressing wheels 3' (such as a pressure wheel disposed on the left and right sides), and in this way Transfer on the material 2' to form a large area continuous fine pattern. However, the imprinting mold 1' is subjected to a 180-degree rolling (also referred to as secondary imprinting) in the forward and counterclockwise directions, so that the two adjacent transfers are performed. An overlapping block 23' is formed between the patterns, resulting in poor embossing quality.

In addition, the above-mentioned secondary imprinting method is not only time-consuming and labor-intensive in operation, but also causes mechanical impact to cause damage to the roller 11' and the stencil 12', so that the replacement rate of the imprinting machine is relatively high. .

The invention aims at providing a non-stitched decorative material, and the main purpose is to provide A micro-nano embossing device capable of repeatedly and continuously pressing a texture pattern of seamless chromatic aberration on a decorative substrate, and a manufacturing method thereof, wherein the decorative material film made by the micro-nano embossing device of the invention is bright The color is good and the color is uniform, which greatly enhances the aesthetics of the decorative material.

Another object of the present invention is to provide a manufacturing apparatus for a stencil-free decorative material having a micro-nano surface, which can be widely applied to various specifications of decorative design and process conditions, and can save process time, labor, and material cost.

For the above purposes, the present invention employs the following technical means: a micro-nano imprinting apparatus comprising two guide wheels and at least one track-like working plate. Wherein, the two guide wheels are disposed oppositely; the outer peripheral surface of the crawler-shaped working plate forms a seamless pattern, and the crawler-shaped working plate is disposed around the two guide wheels and can Scrolling with the two guide wheels as a fulcrum for repeatedly and continuously transferring the seamless pattern to a decorative material, so that the surface of the decorative material has a seam corresponding to the seam A gap-free micro-nano structure pattern of the grain pattern.

The invention further provides a method for manufacturing a micro-nano imprinting apparatus, comprising the steps of: firstly providing a carrier and forming a surface layer on the carrier; and then recording an optical interference pattern on the surface layer; And performing a developing process to form a specific image pattern on the surface layer; thereafter, performing electroforming to form a seamless texture pattern corresponding to the image pattern on the surface layer; and finally, The surface layer is removed as a working plate, and is disposed around the two guide wheels so that the working plate can be scrolled with the two guide wheels as fulcrums.

According to the above micro-nano imprinting apparatus, the present invention further provides a manufacturing apparatus for a non-sewn micro-structured decorative material, comprising a feeding device, a receiving device and a micro-nano imprinting device. Wherein the feeding device is configured to convey a belt-shaped decorative material, the receiving device is configured to recover the strip-shaped decorative material, and a feeding processing path is provided between the feeding device and the receiving device; The micro-nano imprinting device is disposed on the conveying processing path, and includes two guiding wheels and at least one crawler-shaped working plate, wherein the two guiding wheels are oppositely disposed, and the crawler-shaped working plate is The outer peripheral surface forms a seamless joint a track pattern, the track-shaped working plate is disposed around the two guide wheels, and can be scrolled with the two guide wheels as a fulcrum for repeatedly and continuously repeating the seamless pattern Transfer to a decorative material such that the surface of the decorative material has a gap-free micro-nano structure pattern corresponding to the seamless pattern.

According to the above-described manufacturing apparatus for a stencil-free microstructured decorative material, the present invention further provides a stencil-free microstructured decorative material produced by the above-described manufacturing apparatus for a stencil-free microstructured decorative material.

The invention has at least the following technical effects: the micro-nano imprinting device of the invention can not only repeatedly and continuously press out the seamless micro-nano structure pattern on the surface layer of the decorative substrate, but also the film surface of the decorative material produced. The color is good and the color is uniform, which greatly improves the aesthetics of the decorative material and solves the problem of the color difference of the joint.

For a better understanding of the features and technical aspects of the present invention, reference should be made to the accompanying drawings.

(previous technology)

1'‧‧‧ Imprinting mold

11’‧‧‧Roller

12’‧‧·Template

13’‧‧‧ gap

2'‧‧‧Substrate

21’‧‧‧ grain pattern

22’‧‧‧Seam

23’‧‧‧ overlapping blocks

3’‧‧‧pressure wheel

(this invention)

A1, A2‧‧‧ manufacturing equipment

1‧‧‧Micron nano imprinting device

11‧‧‧guide wheel

111‧‧‧ shaft

112‧‧‧guide wheel body

113‧‧‧heating unit

12‧‧‧ Tracked Work Edition

13‧‧‧pressure wheel

2‧‧‧Feeding device

3‧‧‧ Receiving device

4‧‧‧ Coating device

40‧‧‧ resin tank

41, 42‧‧‧ Wheels

43‧‧‧Scrapping components

5‧‧‧Curing device

R‧‧‧Resin

P‧‧‧Transportation path

Figure 1 is a schematic view of a conventional roll stamping die.

Fig. 2 is a schematic view (1) of a decorative material made by a conventional imprinting mold.

Fig. 3 is a view showing the state of use of a conventional roll type imprint mold.

Figure 4 is a schematic view (2) of a decorative material made by a conventional imprinting mold.

FIG. 5A is a schematic perspective view of a micro-nanoimprinting apparatus of the present invention.

FIG. 5B is a perspective exploded view of the micro-nanoimprinting apparatus of the present invention.

Fig. 6 is a flow chart showing the method of manufacturing the micro-nanoimprinting apparatus of the present invention.

Fig. 7A is a structural diagram (1) of a manufacturing apparatus for a stencil-free microstructured decorative material of the present invention.

7B is a structural diagram (2) of a manufacturing apparatus for a stencil-free microstructured decorative material of the present invention.

The disclosure of the present invention mainly relates to a technical means for "making a micro-nano-imprinted material through a micro-nano imprinting technique", and the technical means can be based on the micro-nano imprinting device developed by the present invention. To achieve, and thereby enhance the nature of the end product Price ratio to improve product competitiveness.

In the following, the innovative features of the micro-nanoimprinting device, its method of manufacture, and its subsequent applications will be described by way of specific embodiments, in conjunction with the accompanying drawings, which can be disclosed by those skilled in the art. The content is easy to understand the main innovations of the present invention. It is to be understood that modifications and alterations made by those skilled in the art without departing from the spirit of the invention are intended to be within the scope of the invention.

5A and 5B are perspective views of different states of a micro-nanoimprinting apparatus according to a preferred embodiment of the present invention. The micro-nano imprint apparatus 1 of the present embodiment mainly includes two guide wheels 11 and a crawler-shaped working plate 12. In general, the two guide wheels 11 are disposed opposite to each other, and the crawler-shaped working plate 12 is provided. It is disposed around the two guide wheels 11.

In the present embodiment, the two guide wheels 11 have the same configuration, wherein each of the guide wheels 11 has a rotating shaft 111, a guiding wheel body 112 and a heating unit 113. Preferably, the guiding wheel body 112 is a cylinder. Shaped and made of metal or plastic material. The two guide wheels 11 can be mounted on a fixed base (not shown) by the rotating shaft 111 when in use, and the optimal design is that the two guide wheel bodies 112 are arranged parallel to each other, and both An appropriate spacing is maintained therebetween, whereby the operability of the track-like working plate 12 can be maintained. Moreover, each of the two guide wheels 11 is provided with a heating unit 113 for heating the surface layer of the resin to be embossed, and the heating unit 113 may be disposed inside the wheel body 112, but the invention is not limited thereto. .

In other embodiments, the two guide wheels 11 can also be of different configurations and types, for example, one of the outer diameters of the guide wheel body 112 can be larger than the outer diameter of the other guide wheel body 112.

The crawler-shaped working plate 12 is disposed on the outer sides of the two guide wheels 11 along the outer circumferential surfaces of the two guide wheel bodies 112, and the outer surface of the crawler-shaped working plate 12 is formed with a fine pattern of micron grade, for example, There is no gap and continuous texture pattern (not shown), but the invention is not limited thereto.

It is worth noting that the micro-nano imprinting device 1 is in use, the track-like working version 12 can be rolled with two guide wheels 11 as fulcrums (that is, bypassed on the outer sides of the two guide wheels 11), and when a substrate coated with a resin surface layer (not shown) runs through, two The heating unit 113 inside the guide wheel 11 is heated, and with the supporting force provided by a pressure roller, a large-area repeated and continuous fine pattern is embossed on the surface of the resin, wherein the pattern of the resin surface layer and the track-shaped working version The pattern of 12 is reversed and has no traces of overlap or overlap.

Referring to FIG. 6, the present invention further provides a manufacturing method of the micro-nano imprint apparatus 1 according to the above, comprising the following steps:

Step S100: providing a carrier and forming a surface layer on the carrier. In actual practice, a suitable cylindrical carrier may be selected according to the size of the track-shaped working plate 12, and then the photoresist material is uniformly coated on the surface of the cylindrical carrier to form a surrounding cylindrical carrier. surface layer.

Step S102: Record an optical interference pattern on the surface layer. In the actual implementation, the full-image interference method (Holographic Interferometry) can be used to achieve this purpose. Furthermore, the laser beam can be emitted by the laser generator and transmitted through the lens or the lens group to generate a point or line of laser light to be projected onto the surface of the surface layer, thereby capturing a line pattern laser. On the surface.

Step S104: Perform a developing process to form a specific image pattern on the surface layer.

Step S106: performing electroforming to form a seamless texture pattern corresponding to the image pattern on the surface layer.

Step S108: The surface layer is removed as a working plate, and is disposed around the two guide wheels, so that the working plate can be scrolled with the two guide wheels as fulcrums. The surface layer may be detached by a change in the coefficient of thermal expansion during actual application, but the invention is not limited thereto.

The structural features, applications, and achievable effects of the micro-nanoimprinting apparatus 1 of the present invention have been described in detail above, and the micronanoimprinting apparatus 1 will be further described for the continuous roll-to-roll process. Specific implementation.

Please refer to FIG. 7A and FIG. 7B, which are schematic diagrams showing different states of use of the manufacturing apparatus of the micro-nano imprint apparatus according to the above. The manufacturing apparatus A1, A2 can produce a stencil-free microstructured decorative material, such as a packaging material, a security label, or an advertising slogan, but the invention is not limited thereto.

First, as shown in FIG. 7A, a manufacturing apparatus A1 includes a micro-nano imprinting apparatus 1, a feeding device 2, a receiving device 3, a coating device 4, and a curing device 5.

The feeding device 2 is used for conveying a belt-shaped decorative sheet substrate, and the receiving device 3 is for recovering the embossed surface-treated belt-shaped decorative sheet substrate, wherein a conveying process is arranged between the feeding device 2 and the receiving device 3 Path P. The micro-nano imprint apparatus 1 is disposed on the transport processing path P, and the optimal design is that the micro-nano imprint apparatus 1 is disposed at the middle of the transport processing path P, but is not limited thereto. In other embodiments, the micro-nano imprint apparatus 1 may also be disposed at the front or rear stage of the conveyance processing path P according to the manufacturing flow plan. The micro-nano imprinting device 1 can be heated by the heating unit 113 inside the two guide wheels 11 in use, and with the supporting force provided by a pressing wheel, the large-area repeated and continuous fine pattern is transferred to the belt decoration. On the sheet substrate.

The coating device 4 is disposed on the conveying processing path P and located between the feeding device 2 and the micro-nano imprinting device 1. The coating device 4 includes a resin tank 40, a pair of rollers 41, 42 and a scraping member 43. . The rollers 41 and 42 are disposed in the resin groove 40. The roller 42 is adhered to the molding resin R in the resin groove 40 when the roller 42 is rolled. The scraping member 43 is disposed on the rolling path of the roller 42 for scraping and attaching to the roller. The molding resin R on the surface 42 is coated with a uniform molding resin R on the surface of the decorative sheet substrate. It should be noted that the molding resin R may be a photocurable resin (such as a UV light curing resin) or a thermosetting resin depending on the process requirements, and the present invention is not limited thereto. The micro-nano imprinting apparatus 1 can be heated by the heating unit 113 inside the two guide wheels 11 in use, and the large-area repeated and continuous fine pattern is transferred to the strip shape by the supporting force provided by the pressing wheel. Decorative sheet on the substrate.

The curing device 5 can be disposed at any suitable position on the conveying processing path P according to the manufacturing process plan, and the optimal design is located above the micro-nano imprinting device 1. The aging of the molding resin R subjected to the embossed surface treatment is cured.

As shown in FIG. 7B, another manufacturing apparatus A2 includes: a micro-nano imprinting apparatus 1, a feeding device 2, and a receiving device 3. It is worth noting that the feeding device 2 and the receiving device 3 are respectively used for conveying and recycling one. The surface is coated with a strip of decorative sheet substrate of a resin surface layer (not shown), and a conveying processing path P is disposed between the feeding device 2 and the receiving device 3. The micro-nano imprint apparatus 1 can be disposed at any suitable position on the transport processing path P according to the manufacturing process plan, and can be heated by the heating unit 113 inside the two guide wheels 11 in use, and matched with the support provided by a press wheel. Force, transferring a large area of repeated and continuous fine patterns onto the decorative sheet substrate. In summary, the present invention has at least the following advantages over conventional roll-on nanoimprint dies and their applications:

1. The decorative film made by the micro-nano imprinting device of the invention has good brightness and uniform color, which greatly improves the aesthetic appearance of the decorative material and solves the problem of joint color difference.

2. According to the first point, the micro-nano imprinting device further solves the limitation in the past in order to avoid the seam line, and improves the degree of freedom in design and printing of the back-end product. Moreover, the micro-nano imprinting device can be widely applied to various specifications of packaging design and process conditions, and only needs a single specification to meet customer needs, and greatly reduces inventory costs.

3. The manufacturing equipment of the micro-nano imprinting apparatus of the invention can be combined with the continuous roll-to-roll process to reduce the loss of material and labor costs, thereby improving the yield of the latter stage application and improving the cost performance of the end product.

The above is only an embodiment of the present invention, and is not intended to limit the scope of the invention. It is within the scope of the patent protection of the present invention to make any substitutions and modifications of the modifications made by those skilled in the art without departing from the spirit and scope of the invention.

11‧‧‧guide wheel

111‧‧‧ shaft

112‧‧‧guide wheel body

12‧‧‧ Tracked Work Edition

Claims (10)

A micro-nano imprint apparatus comprising: two guide wheels, the two guide wheels are disposed oppositely; and at least one crawler-shaped working plate, the outer peripheral surface of which forms a seamless pattern of the tracks, the track a working plate is disposed around the two guide wheels, and the crawler-shaped working plate can be rolled with the two guide wheels as a fulcrum for repeating and continuously the seamless pattern Transfer to a decorative material such that the surface of the decorative material has a gap-free micro-nano structure pattern corresponding to the seamless pattern. The micro-nano imprint apparatus of claim 1, wherein each of the guide wheels has a rotating shaft and a guide wheel body disposed coaxially, the two guide wheel bodies are disposed in parallel with each other, and the two Maintain a proper spacing between the guide wheel bodies. The micro-nano imprint apparatus of claim 2, wherein each of the guide wheels is provided with a heating unit. The micro-nano imprint apparatus of claim 2, wherein each of the heating units is disposed inside a corresponding one of the guide wheel bodies. The micro-nano imprinting apparatus according to claim 2, wherein each of the guide wheel bodies is made of metal or plastic. A method of manufacturing a micro-nano imprinting apparatus, comprising the steps of: providing a carrier and forming a surface layer on the carrier; recording an optical interference pattern on the surface layer; performing a developing process to Forming a specific image pattern on the surface layer; performing electroforming to form a seamless texture pattern corresponding to the image pattern on the surface layer; and removing the surface layer as a working version and surrounding the setting The two guide wheels are arranged to enable the working plate to be scrolled with the two guide wheels as fulcrums. A manufacturing device for a non-sewn micro-structured decorative material, comprising: a feeding device for conveying a belt-shaped decorative material; a receiving device for recovering the strip-shaped decorative material, wherein the feeding device and the receiving device have a conveying processing path; and a micro-nano imprinting device disposed on the conveying processing path The micro-nano imprint apparatus includes at least one crawler-shaped working plate and two oppositely disposed guide wheels, wherein the outer peripheral surface of the crawler-shaped working plate forms a seamless texture pattern, a crawler-shaped working plate is disposed around the two guide wheels, and the crawler-shaped working plate can be rolled with the two guide wheels as a fulcrum for repeating the seamless pattern The material is continuously transferred to a decorative material such that the surface of the decorative material has a gap-free micro-nano structure pattern corresponding to the seamless pattern. The apparatus for manufacturing a non-stitched microstructured material according to claim 7, further comprising a coating device disposed on the conveying processing path and located at the feeding device and the micro-negative Between the embossing devices. The apparatus for manufacturing a non-stitched microstructured article according to claim 8, further comprising a curing device disposed above the micro-nanoimprinting device. A stencil-free microstructured article made using the manufacturing apparatus of the stencil-free microstructured article of claim 7.