TW201613211A - Light source apparatus and light irradiating method - Google Patents

Light source apparatus and light irradiating method

Info

Publication number
TW201613211A
TW201613211A TW104108975A TW104108975A TW201613211A TW 201613211 A TW201613211 A TW 201613211A TW 104108975 A TW104108975 A TW 104108975A TW 104108975 A TW104108975 A TW 104108975A TW 201613211 A TW201613211 A TW 201613211A
Authority
TW
Taiwan
Prior art keywords
irradiating
irradiation section
light
elements
source apparatus
Prior art date
Application number
TW104108975A
Other languages
Chinese (zh)
Other versions
TWI652866B (en
Inventor
Koki Hino
Atsushi Fujioka
Takeo Kato
Syohei Maeda
Original Assignee
Toshiba Lighting & Technology
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP2014195825A external-priority patent/JP2016066754A/en
Priority claimed from JP2014195824A external-priority patent/JP2016064378A/en
Application filed by Toshiba Lighting & Technology filed Critical Toshiba Lighting & Technology
Publication of TW201613211A publication Critical patent/TW201613211A/en
Application granted granted Critical
Publication of TWI652866B publication Critical patent/TWI652866B/en

Links

Classifications

    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/09Beam shaping, e.g. changing the cross-sectional area, not otherwise provided for
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/28Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for polarising
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L33/00Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/02Constructional details
    • H01S3/04Arrangements for thermal management
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/09Processes or apparatus for excitation, e.g. pumping

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Electromagnetism (AREA)
  • Optics & Photonics (AREA)
  • Plasma & Fusion (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Led Device Packages (AREA)
  • Heating, Cooling, Or Curing Plastics Or The Like In General (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

Abstract

The invention provides a light source apparatus and a light irradiating method. The light source apparatus 1 of one embodiment includes an irradiation section 20, a control unit 50 and a diffusion board 41. The irradiation section has a plurality of first irradiating elements 21 and a plurality of second irradiating elements 22. The first irradiating element irradiates ultraviolet light having a first peak wavelength. The second irradiating element irradiates ultraviolet light having a second peak wavelength different from the first peak wavelength. With at least one of the second irradiating elements located in a periphery of the first irradiating elements, the plurality of first irradiating elements and the plurality of second irradiating elements are arranged in a plane shape or a straight line shape. The control unit causes a relative light intensity of the irradiation section at an edge of the irradiation section to be larger than a relative light intensity in a center of the irradiation section. The diffusion board diffuses ultraviolet light irradiated by the first irradiating element and the second irradiating element and irradiates the same on an object W.
TW104108975A 2014-09-25 2015-03-20 Light source device and light irradiation method TWI652866B (en)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP2014195825A JP2016066754A (en) 2014-09-25 2014-09-25 Light source device
JP2014-195824 2014-09-25
JP2014195824A JP2016064378A (en) 2014-09-25 2014-09-25 Light irradiation device and light irradiation method
JP2014-195825 2014-09-25

Publications (2)

Publication Number Publication Date
TW201613211A true TW201613211A (en) 2016-04-01
TWI652866B TWI652866B (en) 2019-03-01

Family

ID=53713249

Family Applications (1)

Application Number Title Priority Date Filing Date
TW104108975A TWI652866B (en) 2014-09-25 2015-03-20 Light source device and light irradiation method

Country Status (3)

Country Link
KR (1) KR20160036460A (en)
CN (1) CN204515295U (en)
TW (1) TWI652866B (en)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN106773549B (en) * 2017-01-21 2024-02-27 南京新趋势光电有限公司 High-uniformity LED parallel light ultraviolet exposure machine light source system
JP6825956B2 (en) * 2017-03-28 2021-02-03 株式会社Screenホールディングス Selection method of substrate processing equipment, substrate processing method and ultraviolet irradiation means
KR102566424B1 (en) * 2018-01-22 2023-08-14 엘지이노텍 주식회사 Curing apparatus
JP2021067874A (en) * 2019-10-25 2021-04-30 株式会社ジャパンディスプレイ Manufacturing apparatus and manufacturing method for display panel
KR102643109B1 (en) * 2021-09-01 2024-02-29 에이피시스템 주식회사 Ultraviolet curing apparatus, bending protect layer forming system and method for ultraviolet curing
CN114237063B (en) * 2021-12-16 2024-10-11 深圳绿米联创科技有限公司 Scene control method, device and system, electronic equipment and medium
KR102533685B1 (en) 2022-02-25 2023-05-17 주식회사 씨티랩 Light source device

Also Published As

Publication number Publication date
KR20160036460A (en) 2016-04-04
CN204515295U (en) 2015-07-29
TWI652866B (en) 2019-03-01

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