TW201533227A - Curable composition for sealing photo-semiconductor and photo-semiconductor device using same - Google Patents

Curable composition for sealing photo-semiconductor and photo-semiconductor device using same Download PDF

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TW201533227A
TW201533227A TW103137438A TW103137438A TW201533227A TW 201533227 A TW201533227 A TW 201533227A TW 103137438 A TW103137438 A TW 103137438A TW 103137438 A TW103137438 A TW 103137438A TW 201533227 A TW201533227 A TW 201533227A
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optical semiconductor
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curable composition
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TWI638040B (en
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Hidenori Koshikawa
Yasunori Sakano
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Shinetsu Chemical Co
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/44Structure, shape, material or disposition of the wire connectors prior to the connecting process
    • H01L2224/45Structure, shape, material or disposition of the wire connectors prior to the connecting process of an individual wire connector
    • H01L2224/45001Core members of the connector
    • H01L2224/45099Material
    • H01L2224/451Material with a principal constituent of the material being a metal or a metalloid, e.g. boron (B), silicon (Si), germanium (Ge), arsenic (As), antimony (Sb), tellurium (Te) and polonium (Po), and alloys thereof
    • H01L2224/45138Material with a principal constituent of the material being a metal or a metalloid, e.g. boron (B), silicon (Si), germanium (Ge), arsenic (As), antimony (Sb), tellurium (Te) and polonium (Po), and alloys thereof the principal constituent melting at a temperature of greater than or equal to 950°C and less than 1550°C
    • H01L2224/45144Gold (Au) as principal constituent
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/481Disposition
    • H01L2224/48151Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/48221Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/48245Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic
    • H01L2224/48247Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic connecting the wire to a bond pad of the item
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/481Disposition
    • H01L2224/48151Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/48221Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/48245Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic
    • H01L2224/48257Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic connecting the wire to a die pad of the item
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/49Structure, shape, material or disposition of the wire connectors after the connecting process of a plurality of wire connectors
    • H01L2224/491Disposition
    • H01L2224/49105Connecting at different heights
    • H01L2224/49107Connecting at different heights on the semiconductor or solid-state body
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/15Details of package parts other than the semiconductor or other solid state devices to be connected
    • H01L2924/181Encapsulation

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  • Structures Or Materials For Encapsulating Or Coating Semiconductor Devices Or Solid State Devices (AREA)
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Abstract

To provide curable composition for sealing photo-semiconductor endowed with the excellent impact resistance and anti-cracking property and containing the curing product of low gas permeability, and the photo-semiconductor device obtained by the photo-semiconductor element sealed by the curing product obtained by means of making the curable composition for sealing photo-semiconductor hardened. The curable composition for sealing photo-semiconductor is to comprise (A) the linear multi-fluorine compound containing above two vinyl groups in one molecule and perfluorine polyether structure in the main chain, (B) the organic hydrogen polysiloxane as shown by the below-mentioned general formula (1), (C) the catalyst of platinum family, (D) the cyclic organic polysiloxane as shown by the below-mentioned general formula (2), and (E) the carboxylic anhydride, wherein the hardness of curing product obtained by hardening the curable composition for sealing photo-semiconductor is 30-90 measured by the A-type rubber Durometer according to the standard of JIS K6253-3:2012.

Description

光半導體密封用硬化性組成物及使用其之光半導體裝置 Curable composition for optical semiconductor sealing and optical semiconductor device using the same

本發明係關於光半導體密封用硬化性組成物及使用其之光半導體裝置。 The present invention relates to a curable composition for sealing an optical semiconductor and an optical semiconductor device using the same.

以往,作為硬化性組成物,係提出了自1分子中具有2個以上之烯基,且主鏈中具有全氟聚醚構造之直鏈狀氟聚醚化合物、1分子中具有2個以上之直接鍵結於矽原子的氫原子之含氟有機氫聚矽氧烷及鉑族化合物所成之組成物,得到耐熱性、耐藥品性、耐溶劑性、脫模性、撥水性、撥油性、低溫特性等之性質平衡良好的,優良的硬化物(專利文獻1)。 Conventionally, as a curable composition, a linear fluoropolyether compound having two or more alkenyl groups in one molecule and having a perfluoropolyether structure in the main chain has been proposed, and two or more of them have one molecule. a composition obtained by directly bonding a fluorine-containing organic hydrogen polyoxane and a platinum group compound of a hydrogen atom of a halogen atom to obtain heat resistance, chemical resistance, solvent resistance, mold release property, water repellency, oil repellency, An excellent cured product having a good balance of properties such as low-temperature characteristics (Patent Document 1).

此外,提出了藉由於上述組成物中,添加具有氫矽烷基與環氧基及/或三烷氧基矽烷基之有機聚矽氧烷,而對金屬或塑膠基材賦予自我接著性之組成物(專利文獻2)。 Further, a composition in which a self-adhesive property is imparted to a metal or a plastic substrate by adding an organopolysiloxane having a hydroquinone group and an epoxy group and/or a trialkoxyalkyl group is proposed. (Patent Document 2).

進一步地,提出有藉由於上述組成物中添加羧酸酐,而提高對各種基材、特別是聚苯硫樹脂(PPS)或聚醯胺樹脂之接著性的組成物(專利文獻3)。又,專利文 獻4中,提出有即使於腐蝕性酸性氣體或鹼性氣體的存在下亦可防止輝度降低之組成物。 Further, there has been proposed a composition for improving the adhesion to various substrates, particularly polyphenylene sulfide (PPS) or polyamide resin, by adding a carboxylic anhydride to the above composition (Patent Document 3). Also, patent In the fourth aspect, a composition capable of preventing a decrease in luminance even in the presence of a corrosive acid gas or an alkaline gas has been proposed.

但是,將此等先前技術中實際配製之組成物硬化而得的硬化物中,將JIS K6253-3:2012規定之A型橡膠硬度計(type A durometer)硬度低達20左右者使用作為發光二極體(以下稱為「LED」)之密封材時,會有作為密封材之耐衝擊性不充分的情況。例如,將以上述硬化物密封LED之塊狀堆積(loading in bulk)的光半導體裝置,使用碗(bowl)型振動零件給料器排列為一定方向/姿勢時,常發生因光半導體裝置彼此衝撞的衝擊,使連結LED晶片與電極之接合引線(bonding wire)斷線的問題。 However, in the hardened material obtained by hardening the composition actually prepared in the prior art, the hardness of the type A durometer specified in JIS K6253-3:2012 is as low as about 20, and is used as the light-emitting two. In the case of a sealing material of a polar body (hereinafter referred to as "LED"), the impact resistance of the sealing material may be insufficient. For example, when the optical semiconductor device in which the LED is stacked in the hardened material is used, and the bowl type vibrating parts feeder is arranged in a certain direction/posture, the optical semiconductor devices collide with each other. The impact causes the problem of disconnecting the bonding wires connecting the LED chips and the electrodes.

另一方面,針對以上述A型橡膠硬度計硬度超過90之該硬化物來密封LED之光半導體裝置進行溫度循環試驗時,會有於該硬化物產生龜裂的情形。 On the other hand, when the optical semiconductor device in which the LED is sealed with the cured product having a hardness of 90 or more of the A-type rubber hardness meter is subjected to a temperature cycle test, cracking may occur in the cured product.

進一步地,密封了LED之光半導體裝置中,為了提高明亮度,會有於LED之周邊鍍銀的情況。將使用使以上述先前技術配製之組成物硬化而得的硬化物作為LED之密封材的該光半導體裝置,於暴露於硫系氣體之環境下使用時,因時間經過,硫系氣體會穿透該硬化物,使銀變色為黑色,因此常發生明亮度降低之不良狀況。因此,作為如此之組成物,當硬化而作為硬化物時,要求顯示更低之氣體穿透性者。 Further, in the optical semiconductor device in which the LED is sealed, in order to improve the brightness, silver may be plated around the LED. The optical semiconductor device using a cured product obtained by hardening a composition prepared by the above prior art as a sealing material for an LED is used in an environment exposed to a sulfur-based gas, and the sulfur-based gas penetrates due to passage of time. This hardened material discolors silver into black, so that the brightness is often lowered. Therefore, as such a composition, when it is hardened to be a cured product, it is required to exhibit a lower gas permeability.

[先前技術文獻] [Previous Technical Literature] [專利文獻] [Patent Literature]

[專利文獻1]日本特開平8-199070號公報 [Patent Document 1] Japanese Patent Laid-Open No. Hei 8-199070

[專利文獻2]日本特開平9-095615號公報 [Patent Document 2] Japanese Patent Laid-Open Publication No. Hei 9-095615

[專利文獻3]日本特開2001-072868號公報 [Patent Document 3] Japanese Patent Laid-Open Publication No. 2001-072868

[專利文獻4]日本特開2009-277887號公報 [Patent Document 4] Japanese Patent Laid-Open Publication No. 2009-277887

本發明係有鑑於上述實情而為者,其目的為提供賦予耐衝擊性及耐龜裂性優良、且具有低氣體穿透性之硬化物的光半導體密封用硬化性組成物、及藉由使該光半導體密封用硬化性組成物硬化而得的硬化物來密封光半導體元件之光半導體裝置。 The present invention has been made in view of the above circumstances, and an object of the present invention is to provide a curable composition for optical semiconductor sealing which provides a cured product having excellent impact resistance and crack resistance and having low gas permeability, and The cured product obtained by curing the curable composition for optical semiconductor sealing is used to seal the optical semiconductor device of the optical semiconductor element.

為了解決上述課題,本發明提供一種光半導體密封用硬化性組成物,其係含有(A)1分子中具有2個以上之烯基,於主鏈中進一步具有全氟聚醚構造,且烯基含量為0.0050~0.200mol/100g之直鏈狀多氟化合物:100質量份、(B)下述通式(1)表示之有機氫聚矽氧烷、【化1】 (式中,a為3~10之整數,A為包含全氟伸烷基、全氟氧基伸烷基、或其兩者之2價有機基,D係互相獨立地為可含有矽原子、氧原子或氮原子之取代或非取代的2價烴基,R1係互相獨立地為取代或非取代之1價烴基,R2係互相獨立地為氫原子、或隔著可含有矽原子、氧原子或氮原子之2價烴基而與矽原子鍵結之1價全氟烷基或1價全氟氧基烷基,R2當中之三個以上為氫原子)。 In order to solve the above problems, the present invention provides a curable composition for optical semiconductor sealing, which comprises (A) one molecule having two or more alkenyl groups, a main chain further having a perfluoropolyether structure, and an alkenyl group. A linear polyfluorinated compound having a content of 0.0050 to 0.200 mol/100 g: 100 parts by mass, (B) an organohydrogen polyoxyalkylene represented by the following formula (1), [Chemical 1] (wherein, a is an integer of from 3 to 10, and A is a divalent organic group containing a perfluoroalkylene group, a perfluoroalkylalkylene group, or both thereof, and D is independently of each other and may contain a halogen atom, oxygen a substituted or unsubstituted divalent hydrocarbon group of an atom or a nitrogen atom, R 1 is a substituted or unsubstituted monovalent hydrocarbon group independently of each other, and R 2 is independently a hydrogen atom or may contain a halogen atom or an oxygen atom. Or a monovalent perfluoroalkyl group or a monovalent perfluorooxyalkyl group bonded to a ruthenium atom by a divalent hydrocarbon group of a nitrogen atom, and three or more of R 2 are a hydrogen atom).

(C)鉑族金屬系觸媒:以鉑族金屬原子換算為0.1~500ppm、(D)下述通式(2)表示之環狀有機聚矽氧烷:0.10~10.0質量份、 (式中,b為1~6之整數,c為1~4之整數,d為1~4之整數,b+c+d為4~10之整數,R3係互相獨立地為取代或非取代之1價烴基,E係互相獨立地為隔著可含有矽原子、氧原子或氮原子之2價烴基而與矽原子鍵結之1價全氟烷 基或1價全氟氧基烷基,G係互相獨立地為隔著可含有氧原子之2價烴基而與矽原子鍵結之環氧基或三烷氧基矽烷基或其兩者。惟,-(SiO)(H)R3-、-(SiO)(E)R3-、及-(SiO)(G)R3-之鍵結順序並無限定)。 (C) a platinum group metal catalyst: 0.1 to 500 ppm in terms of a platinum group metal atom, and (D) a cyclic organopolyoxane represented by the following formula (2): 0.10 to 10.0 parts by mass, (wherein b is an integer from 1 to 6, c is an integer from 1 to 4, d is an integer from 1 to 4, b+c+d is an integer from 4 to 10, and R 3 is independently substituted or not The substituted monovalent hydrocarbon group, which is independently a monovalent perfluoroalkyl group or a monovalent perfluorooxyalkyl group bonded to a ruthenium atom via a divalent hydrocarbon group which may contain a halogen atom, an oxygen atom or a nitrogen atom. Further, G is independently an epoxy group or a trialkoxyalkyl group bonded to a ruthenium atom via a divalent hydrocarbon group which may contain an oxygen atom, or both. However, -(SiO)(H)R 3 -, - (SiO) (E) R 3 -, and - (SiO) (G) R 3 - bonding order is not limited).

(E)羧酸酐:0.010~10.0質量份 (E) carboxylic anhydride: 0.010 to 10.0 parts by mass

之光半導體密封用硬化性組成物,其中前述(B)成分之摻合量,相對於該組成物中所含有的烯基1莫耳而言,係直接鍵結於前述(B)成分中之矽原子的氫原子成為0.50~2.0莫耳之量,使該光半導體密封用硬化性組成物硬化而得到之硬化物的硬度,以JIS K6253-3:2012規定之A型橡膠硬度計測量係為30~90之值。 The curable composition for sealing a light semiconductor, wherein the blending amount of the component (B) is directly bonded to the component (B) with respect to the alkenyl group 1 mol contained in the composition. The hardness of the hardened material obtained by curing the photo-semiconductor sealing hardenable material is 0.50 to 2.0 mol, and the A-type rubber hardness meter specified in JIS K6253-3:2012 is The value of 30~90.

若為如此之含有上述(A)~(E)成分全部,且硬化物之硬度具有上述範圍之加成硬化型氟聚醚系硬化性組成物的光半導體密封用硬化性組成物,則可得到耐衝擊性及耐龜裂性優良,且具有低氣體穿透性之硬化物。 In the case of the curable composition for optical semiconductor sealing which contains all of the above-mentioned (A) to (E) components and the hardness of the cured product has the above-described range of the addition-curable fluoropolyether-based curable composition, A hardened material that is excellent in impact resistance and crack resistance and has low gas permeability.

進一步地,較佳為含有下述通式(3)表示之環狀有機聚矽氧烷0.10~50.0質量份作為(F)成分。 Further, it is preferred to contain 0.10 to 50.0 parts by mass of the cyclic organopolysiloxane represented by the following formula (3) as the component (F).

(式中,e為1~4之整數,f為3~6之整數,e+f為4~10之整數,R4係互相獨立地為取代或非取代之1價烴基,J係 互相獨立地為隔著可含有矽原子、氧原子或氮原子之2價烴基而與矽原子鍵結之1價全氟烷基或1價全氟氧基烷基,L係互相獨立地為直接鍵結於矽原子之烯基。惟,-(SiO)(J)R4-及-(SiO)(L)R4-之鍵結順序並無限定)。 (wherein e is an integer from 1 to 4, f is an integer from 3 to 6, e+f is an integer from 4 to 10, and R 4 is independently substituted or unsubstituted monovalent hydrocarbon group, and J is independent of each other The ground is a monovalent perfluoroalkyl group or a monovalent perfluoroalkyl group bonded to a ruthenium atom via a divalent hydrocarbon group which may contain a halogen atom, an oxygen atom or a nitrogen atom, and the L system is independently bonded directly to each other. The alkenyl group of the ruthenium atom. However, the order of bonding of -(SiO)(J)R 4 - and -(SiO)(L)R 4 - is not limited).

若為如此之含有前述(A)成分~(E)成分、且進一步依需要含有前述(F)成分之光半導體密封用硬化性組成物,則可得到耐衝擊性及耐龜裂性更優良,且具有低氣體穿透性之硬化物。因此,前述光半導體密封用硬化性組成物之硬化物,可適合使用於光半導體元件之密封材、特別是用以保護LED之密封材。 In the case of the curable composition for optical semiconductor sealing containing the component (A) and the component (F) as described above, the impact resistance and the crack resistance are more excellent. And has a low gas permeability hardened material. Therefore, the cured product of the curable composition for optical semiconductor sealing can be suitably used for a sealing material for an optical semiconductor element, particularly a sealing material for protecting an LED.

又,前述(A)成分較佳為下述通式(4)表示之直鏈狀多氟化合物。 Further, the component (A) is preferably a linear polyfluoro compound represented by the following formula (4).

(式中,R6及R7係互相獨立地為烯基、或取代或非取代之1價烴基,一者以上為烯基。R8係互相獨立地為氫原子、或取代或非取代之1價烴基,g及h係分別為1~150之整數,且g+h之平均值為2~300,i為0~6之整數)。 (wherein R 6 and R 7 are each independently an alkenyl group or a substituted or unsubstituted monovalent hydrocarbon group, and one or more of them are alkenyl groups. R 8 is independently a hydrogen atom, or a substituted or unsubstituted one. The monovalent hydrocarbon group, g and h are each an integer from 1 to 150, and the average value of g+h is 2 to 300, and i is an integer of 0 to 6).

進一步地,前述(A)成分較佳為選自由下述通式(5)、下述通式(6)、及下述通式(7)所成群組之1種以上的直鏈狀多氟化合物。 Furthermore, it is preferable that the component (A) is one or more types selected from the group consisting of the following general formula (5), the following general formula (6), and the following general formula (7). Fluorine compound.

(式中,R8係互相獨立地為氫原子、或取代或非取代之1價烴基,g及h係分別為1~150之整數,且g+h之平均值為2~300,i為0~6之整數,R9係互相獨立地為取代或非取代之1價烴基)。 (wherein R 8 is independently a hydrogen atom or a substituted or unsubstituted monovalent hydrocarbon group, and g and h are each an integer of from 1 to 150, and an average value of g + h is from 2 to 300, i is An integer of 0 to 6, R 9 is a substituted or unsubstituted monovalent hydrocarbon group independently of each other.

(式中,R8、R9、g、h、及i係與上述相同)。 (wherein R 8 , R 9 , g, h, and i are the same as described above).

(式中,R8、g、h、及i係與上述相同)。 (wherein R 8 , g, h, and i are the same as described above).

若為如此之(A)成分,則可得到耐熱性、耐藥品性、耐溶劑性、脫模性、撥水性、撥油性、低溫特性等 之性質平衡良好的,作為密封材更優良的硬化物。 When it is such a component (A), heat resistance, chemical resistance, solvent resistance, mold release property, water repellency, oil repellency, low temperature property, etc. are obtained. The property is well balanced and is a more excellent hardened material for the sealing material.

又,前述(B)成分之A中所含有的全氟氧基伸烷基,較佳係含有1~500個之下述通式(8)表示之重複單位的基。 In addition, the perfluoroalkylalkylene group contained in the component (B) preferably contains 1 to 500 groups of repeating units represented by the following formula (8).

-Ce’F2e’O- (8)(式中,e’係每單位獨立地為1~6之整數)。 -C e' F 2e' O- (8) (wherein e' is independently an integer from 1 to 6 per unit).

進一步地,前述(B)成分之A,較佳為選自由下述通式(9)、下述通式(10)、及下述通式(11)所成群組之基。 Further, A of the component (B) is preferably selected from the group consisting of the following general formula (9), the following general formula (10), and the following general formula (11).

(式中,R10係互相獨立地為氟原子或CF3基,j為1~4之整數,k及n各自為0~200之整數,k+n之平均值為0~400,l為2~6之整數。又,各重複單位之鍵結順序並無限定)。 (wherein R 10 is independently a fluorine atom or a CF 3 group, j is an integer of 1 to 4, and k and n are each an integer of 0 to 200, and an average value of k + n is 0 to 400, and l is An integer from 2 to 6. In addition, the order of bonding of each repeating unit is not limited).

(式中,p為1~200之整數,j係與上述相同)。 (wherein p is an integer from 1 to 200, and j is the same as above).

(式中,R10、j、k、及n係與上述相同。又,各重複單位之鍵結順序並無限定)。 (In the formula, R 10 , j, k, and n are the same as described above. Further, the order of bonding of each repeating unit is not limited).

若為如此之(B)成分,則可得到具有更低氣體穿透性之硬化物。 If it is such a component (B), a cured product having lower gas permeability can be obtained.

又,前述(E)成分較佳為選自由下述通式(12)及下述通式(13)所成群組之羧酸酐。 Further, the component (E) is preferably a carboxylic anhydride selected from the group consisting of the following general formula (12) and the following general formula (13).

(式中,q為1~6之整數、r為1~4之整數、s為1~4之整數、q+r+s為4~10之整數,R11係互相獨立地為取代或非取代之1價烴基,M係互相獨立地為隔著可含有矽原子、氧原子或氮原子之2價烴基而與矽原子鍵結之1價全氟烷基或1價全氟氧基烷基,Q係互相獨立地為隔著2價烴基而與矽原子鍵結之環狀羧酸酐殘基。惟,-(SiO)(H)R11-、-(SiO)(M)R11-及-(SiO)(Q)R11-之鍵結順序並無限定)。 (wherein q is an integer from 1 to 6, r is an integer from 1 to 4, s is an integer from 1 to 4, q+r+s is an integer from 4 to 10, and R 11 is independently substituted or not The substituted monovalent hydrocarbon group, which is independently a monovalent perfluoroalkyl group or a monovalent perfluorooxyalkyl group bonded to a ruthenium atom via a divalent hydrocarbon group which may contain a halogen atom, an oxygen atom or a nitrogen atom. And Q is a cyclic carboxylic acid anhydride residue which is bonded to a ruthenium atom via a divalent hydrocarbon group independently of each other. However, -(SiO)(H)R 11 -, -(SiO)(M)R 11 - and - (SiO) (Q) R 11 - The bonding sequence is not limited).

【化12】 (式中,R11、M、及Q係與上述相同,t為1~3之整數、u為0~2之整數、t+u為3)。 【化12】 (In the formula, R 11 , M, and Q are the same as described above, t is an integer of 1 to 3, u is an integer of 0 to 2, and t + u is 3).

若為如此之(E)成分,則可得到提高了對各種基材之接著性的硬化物。 According to the component (E), a cured product having improved adhesion to various substrates can be obtained.

又,前述1價全氟烷基或1價全氟氧基烷基,較佳係互相獨立地為下述通式(14)或通式(15)表示之基。 Further, the monovalent perfluoroalkyl group or the monovalent perfluorooxyalkyl group is preferably a group represented by the following formula (14) or formula (15) independently of each other.

CvF2v+1- (14)(式中,v為1~10之整數)。 C v F 2v+1 - (14) (where v is an integer from 1 to 10).

(式中,w為1~10之整數)。 (where w is an integer from 1 to 10).

若為如此之1價全氟烷基或1價全氟氧基烷基,則可成為與(A)成分之相溶性、分散性及硬化後之均勻性更優良的組成物。 When it is such a monovalent perfluoroalkyl group or a monovalent perfluorooxyalkyl group, it is a composition which is more excellent in compatibility with the (A) component, dispersibility, and uniformity after hardening.

又,使前述光半導體密封用硬化性組成物硬化而得到之1mm厚之硬化物的水蒸氣穿透率,較佳為 15.0g/m2.day以下。 Further, the water vapor transmission rate of the cured product having a thickness of 1 mm obtained by curing the curable composition for optical semiconductor sealing is preferably 15.0 g/m 2 . Below day.

如此地,水蒸氣穿透率若為15.0g/m2.day以下,於LED周邊被鍍銀的光半導體裝置中,使用使本發明之組成物硬化而得的硬化物作為LED之密封材時,即使暴露於硫系氣體,亦無銀因為該氣體而黑色化,使明亮度降低之虞,故較佳。 Thus, the water vapor transmission rate is 15.0 g/m 2 . In the case of using a cured product obtained by curing the composition of the present invention as a sealing material for an LED in an optical semiconductor device in which silver is coated around the LED, no silver is exposed to the sulfur-based gas. It is preferred to reduce the brightness.

進一步地,前述光半導體密封用硬化性組成物之以JIS K7117-1:1999規定之於23℃的黏度,較佳為50.0~50,000mPa‧s。 Further, the curable composition for optical semiconductor sealing has a viscosity of 23 ° C as defined in JIS K7117-1:1999, preferably 50.0 to 50,000 mPa‧s.

如此地,黏度若為50.0mPa.s以上,則無流動性過高,於LED封裝內裝填(potting)一定量之點膠機(dispenser)的控制困難之虞,故較佳;若為50,000mPa.s以下,則光半導體密封用硬化性組成物被裝填於LED封裝內後,並無調平耗費時間,生產性降低之虞,故較佳。 Thus, the viscosity is 50.0 mPa. Above s, the no-flowing property is too high, and it is preferable to pott a certain amount of the dispenser in the LED package, so it is preferable; if it is 50,000 mPa. In the case where the curable composition for optical semiconductor sealing is filled in the LED package, it is not necessary to adjust the time, and the productivity is lowered, which is preferable.

此外,使前述光半導體密封用硬化性組成物硬化而得之硬化物之於25℃、589nm(鈉之D線)之折射率較佳為1.30以上且未達1.40。 Further, the cured product obtained by curing the curable composition for optical semiconductor sealing has a refractive index of preferably 1.30 or more and less than 1.40 at 25 ° C and 589 nm (line of sodium).

如此地,若折射率為1.30以上且未達1.40,則於藉由使本發明之組成物硬化而得之硬化物來密封LED而得的光半導體裝置中,將由LED發出之光提取於外部之效率並無變得不充分之虞,故較佳。 When the refractive index is 1.30 or more and less than 1.40, the optical semiconductor device obtained by sealing the LED by the cured product obtained by curing the composition of the present invention extracts the light emitted from the LED to the outside. It is better if the efficiency does not become insufficient.

又,本發明提供光半導體裝置,其係具有光半導體元件、與用以密封該光半導體元件之使前述光半導體密封用硬化性組成物硬化而得的硬化物。 Moreover, the present invention provides an optical semiconductor device comprising an optical semiconductor element and a cured product obtained by curing the optical semiconductor element for curing the curable composition for optical semiconductor sealing.

本發明之光半導體密封用硬化性組成物,可賦予耐衝擊性及耐龜裂性優良,且具有低氣體穿透性之硬化物,因此藉由此硬化物來密封光半導體元件而得的光半導體裝置,即使該光半導體裝置彼此衝撞,亦不易產生構件之損傷,因此可提高良率及生產性。又,即使進行溫度循環試驗,亦不易於硬化物產生龜裂,因此可提高信賴性。進一步地,硫系氣體不易穿透硬化物,因此可抑制明亮度的降低。 The curable composition for sealing an optical semiconductor according to the present invention is excellent in impact resistance and crack resistance, and has a low gas permeability and a cured product. Therefore, the light obtained by sealing the optical semiconductor element with the cured product is obtained. In the semiconductor device, even if the optical semiconductor device collides with each other, damage of the member is less likely to occur, so that yield and productivity can be improved. Moreover, even if the temperature cycle test is performed, cracking of the cured product is not easily caused, so that reliability can be improved. Further, since the sulfur-based gas does not easily penetrate the cured product, the decrease in brightness can be suppressed.

又,前述光半導體元件,較佳為發光二極體。 Further, the optical semiconductor element is preferably a light emitting diode.

如此地,本發明之光半導體密封用硬化性組成物之硬化物,特別可適合使用作為用以保護發光二極體的密封材。 In this way, the cured product of the curable composition for optical semiconductor sealing of the present invention can be suitably used as a sealing material for protecting the light-emitting diode.

本發明之光半導體密封用硬化性組成物,藉由組合上述(A)~(E)成分、進而依需要之(F)成分,其硬化物具有良好的耐衝擊性及耐龜裂性、進而具有低氣體穿透性,因此藉由此硬化物來密封光半導體元件而得的光半導體裝置,可在不發生接合引線之斷線等損傷構件的情況之下來製造。又,即使進行溫度循環試驗,亦可抑制硬化物龜裂的產生。進一步地,即使將該光半導體裝置於暴露於硫系氣體的環境下使用,亦可抑制明亮度的降低,因此係適於作為保護LED之密封材。 In the curable composition for sealing an optical semiconductor of the present invention, by combining the above components (A) to (E) and further (F), the cured product has excellent impact resistance and crack resistance, and further Since it has low gas permeability, the optical semiconductor device obtained by sealing the optical semiconductor element with the cured product can be manufactured without causing damage to the member such as disconnection of the bonding wire. Further, even if the temperature cycle test is performed, the occurrence of cracks in the cured product can be suppressed. Further, even if the optical semiconductor device is used in an environment exposed to a sulfur-based gas, the reduction in brightness can be suppressed, and therefore it is suitable as a sealing material for protecting the LED.

1‧‧‧LED晶片 1‧‧‧LED chip

2‧‧‧第一引線框 2‧‧‧First lead frame

2a‧‧‧第一引線框之前端部 2a‧‧‧The front end of the first lead frame

2b‧‧‧第一引線框之端子部 2b‧‧‧ Terminal part of the first lead frame

2’‧‧‧凹部 2'‧‧‧ recess

3‧‧‧第二引線框 3‧‧‧Second lead frame

3a‧‧‧第二引線框之前端部 3a‧‧‧ front end of the second lead frame

3b‧‧‧第二引線框之端子部 3b‧‧‧ Terminal part of the second lead frame

4‧‧‧接合引線 4‧‧‧ Bonding leads

5‧‧‧密封材 5‧‧‧ Sealing material

6‧‧‧凸透鏡部 6‧‧‧ convex lens

7‧‧‧透光性樹脂部 7‧‧‧Transparent resin department

8‧‧‧封裝基板 8‧‧‧Package substrate

8’‧‧‧凹部 8’‧‧‧ recess

9‧‧‧電極 9‧‧‧Electrode

10、10’‧‧‧光半導體裝置 10, 10'‧‧‧Optical semiconductor devices

[圖1]顯示本發明之光半導體裝置的一例之概略截面圖。 Fig. 1 is a schematic cross-sectional view showing an example of an optical semiconductor device of the present invention.

[圖2]顯示本發明之光半導體裝置的其他一例之概略截面圖。 Fig. 2 is a schematic cross-sectional view showing another example of the optical semiconductor device of the present invention.

以下更詳細說明本發明。 The invention is described in more detail below.

如上述般,具有良好的耐衝擊性及耐龜裂性、進而具有低氣體穿透性之光半導體密封用硬化性組成物、及藉由使該組成物硬化而得到之硬化物來密封光半導體元件而得的光半導體裝置係被要求著。 As described above, the curable composition for optical semiconductor sealing having excellent impact resistance and crack resistance, and further having low gas permeability, and the cured product obtained by curing the composition to seal the optical semiconductor Optical semiconductor devices derived from components are required.

本發明者等人,為了達成上述目的進行努力探討的結果,發現若為含有下述(A)~(E)成分、進而依需要之(F)成分的組成物,則會成為賦予具有良好耐衝擊性及耐龜裂性、且具有低氣體穿透性之硬化物的光半導體密封用硬化性組成物,而完成了本發明。 As a result of intensive studies to achieve the above object, the present inventors have found that a composition containing the following components (A) to (E) and, if necessary, the component (F), is imparted with good resistance. The present invention has been completed in a curable composition for optical semiconductor sealing of a cured product having impact resistance and crack resistance and having low gas permeability.

以下、詳細說明本發明。再者,本說明書中,使用「~」來表示之數值範圍,意指包含作為下限值及上限值的「~」之前後所記載的數值之範圍。 Hereinafter, the present invention will be described in detail. In the present specification, the numerical range expressed by "~" means a range including numerical values described before and after "~" which is a lower limit and an upper limit.

[(A)成分] [(A) ingredient]

本發明之(A)成分,係1分子中具有2個以上之烯基,於主鏈中進一步具有全氟聚醚構造,且烯基含量為0.0050~0.200mol/100g之直鏈狀多氟化合物。 The component (A) of the present invention is a linear polyfluoro compound having two or more alkenyl groups in one molecule, a perfluoropolyether structure in the main chain, and an alkenyl group content of 0.0050 to 0.200 mol/100 g. .

上述(A)成分中所含有的烯基,較佳為碳數2~8、特佳為碳數2~6,且末端具有CH2=CH-構造者較佳,可列舉例如乙烯基、烯丙基、丙烯基、異丙烯基、丁烯基、己烯基等,其中尤以乙烯基或烯丙基特佳。 The alkenyl group contained in the component (A) is preferably a carbon number of 2 to 8, particularly preferably a carbon number of 2 to 6, and preferably has a CH 2 =CH- structure at the terminal, and examples thereof include a vinyl group and an alkene. A propyl group, a propenyl group, an isopropenyl group, a butenyl group, a hexenyl group or the like, and particularly preferably a vinyl group or an allyl group.

上述(A)成分中所含有的全氟聚醚構造,較佳為下述通式(16)或下述通式(17)表示之2價全氟聚醚基。 The perfluoropolyether structure contained in the component (A) is preferably a divalent perfluoropolyether group represented by the following formula (16) or the following formula (17).

上述通式(16)中,x為2或3,y及a’較佳係各為1~150之整數、更佳為1~100之整數,且y+a’之平均值較佳為2~300、更佳為5~200,z較佳為0~6之整數、更佳為0~4之整數。 In the above formula (16), x is 2 or 3, and y and a' are each preferably an integer of 1 to 150, more preferably an integer of 1 to 100, and the average value of y+a' is preferably 2 ~300, more preferably 5~200, z is preferably an integer of 0~6, more preferably an integer of 0~4.

又,上述通式(17)中,b’較佳為2或3,c’較佳為1~300之整數、更佳為1~200之整數,d’較佳為1~80之整數、更佳為1~50之整數,且c’+d’之平均值較 佳為2~380、更佳為2~250。 Further, in the above formula (17), b' is preferably 2 or 3, c' is preferably an integer of 1 to 300, more preferably an integer of 1 to 200, and d' is preferably an integer of 1 to 80. More preferably an integer from 1 to 50, and the average of c'+d' is Good for 2~380, better for 2~250.

上述(A)成分中所含有的烯基含量係0.0050~0.200mol/100g、較佳為0.0080~0.150mol/100g。烯基含量少於0.0050mol/100g時,交聯程度變得不充分,產生硬化不良,烯基含量超過0.200mol/100g時,該硬化物之作為橡膠彈性體的機械特性會有損害之虞。 The alkenyl group content in the component (A) is 0.0050 to 0.200 mol/100 g, preferably 0.0080 to 0.150 mol/100 g. When the alkenyl group content is less than 0.0050 mol/100 g, the degree of crosslinking becomes insufficient, and hardening failure occurs. When the alkenyl group content exceeds 0.200 mol/100 g, the mechanical properties of the cured product as a rubber elastomer may be impaired.

(A)成分之較佳例子,可列舉下述通式(4)表示之直鏈狀多氟化合物。 A preferred example of the component (A) is a linear polyfluoro compound represented by the following formula (4).

(式中,R6及R7係互相獨立地為烯基、或取代或非取代之1價烴基,一者以上為烯基。R8係互相獨立地為氫原子、或取代或非取代之1價烴基,g及h係分別為1~150之整數,且g+h之平均值為2~300,i為0~6之整數)。 (wherein R 6 and R 7 are each independently an alkenyl group or a substituted or unsubstituted monovalent hydrocarbon group, and one or more of them are alkenyl groups. R 8 is independently a hydrogen atom, or a substituted or unsubstituted one. The monovalent hydrocarbon group, g and h are each an integer from 1 to 150, and the average value of g+h is 2 to 300, and i is an integer of 0 to 6).

此處、R6及R7中所含有的烯基,可列舉與上述相同者,作為其以外之取代或非取代之1價烴基者,較佳為碳數1~12者、特佳為碳數1~10者,具體而言,可列舉甲基、乙基、丙基、丁基、己基、環己基、辛基等之烷基;苯基、甲苯基等之芳基;苄基、苯基乙基等之芳烷基等,或此等之基的氫原子之一部分或全部經氟等之鹵素原子取代的1價烴基等。其中尤以甲基及乙基特佳。 Here, the alkenyl group contained in R 6 and R 7 may be the same as the above, and the substituted or unsubstituted monovalent hydrocarbon group other than the above may preferably be a carbon number of 1 to 12, particularly preferably carbon. The number of 1 to 10, specifically, an alkyl group such as a methyl group, an ethyl group, a propyl group, a butyl group, a hexyl group, a cyclohexyl group or an octyl group; an aryl group such as a phenyl group or a tolyl group; a benzyl group and a benzene group; An aralkyl group such as a benzyl group or the like, or a monovalent hydrocarbon group in which one or all of the hydrogen atoms of the group are substituted with a halogen atom such as fluorine. Among them, methyl and ethyl are particularly preferred.

R8中所含有的取代或非取代之1價烴基,可列舉與上述R6及R7之取代或非取代的1價烴基之例示相同之基。 The substituted or unsubstituted monovalent hydrocarbon group contained in R 8 may be the same as those exemplified as the substituted or unsubstituted monovalent hydrocarbon group of the above R 6 and R 7 .

又,g及h較佳係各為1~150之整數、更佳為1~100之整數,且g+h之平均值較佳為2~300、更佳為2~200。又,i較佳為0~6之整數、更佳為0~4之整數。 Further, g and h are each preferably an integer of from 1 to 150, more preferably an integer of from 1 to 100, and the average value of g+h is preferably from 2 to 300, more preferably from 2 to 200. Further, i is preferably an integer of 0 to 6, more preferably an integer of 0 to 4.

(A)成分之更佳例子,可列舉下述通式(5)~(7)表示之直鏈狀多氟化合物。 A more preferable example of the component (A) is a linear polyfluoro compound represented by the following general formulae (5) to (7).

上述通式(5)~(7)中,R8係與上述相同之基, g、h及i係與上述相同。又,R9係互相獨立地為取代或非取代之1價烴基,可列舉與上述R6之取代或非取代的1價烴基相同之基。 In the above formulae (5) to (7), R 8 is the same as the above, and g, h and i are the same as described above. Further, R 9 is a substituted or unsubstituted monovalent hydrocarbon group independently of each other, and examples thereof include the same as the substituted or unsubstituted monovalent hydrocarbon group of the above R 6 .

上述通式(5)表示之直鏈狀多氟化合物之具體例子,可列舉下述之化合物。以下,Me表示甲基、Et表示乙基。 Specific examples of the linear polyfluoro compound represented by the above formula (5) include the following compounds. Hereinafter, Me represents a methyl group, and Et represents an ethyl group.

(式中,g及h係與上述相同)。 (wherein g and h are the same as described above).

又,上述通式(6)表示之直鏈狀多氟化合物之具體例子,可列舉下述式表示者。 Further, specific examples of the linear polyfluoro compound represented by the above formula (6) include the following formulas.

(式中,g及h係與上述相同)。 (wherein g and h are the same as described above).

進一步地,上述通式(7)表示之直鏈狀多氟化合物之具體例子,可列舉下述式表示者。 Further, specific examples of the linear polyfluoro compound represented by the above formula (7) include the following formulas.

(式中,g及h係與上述相同)。 (wherein g and h are the same as described above).

又,欲使用本發明之組成物作為LED之密封材,上述(A)成分之於23℃之黏度,於JIS K7117-1:1999所規定之黏度測定,較佳為500~100,000mPa.s、更佳為1,000~50,000mPa.s之範圍內。 Further, in order to use the composition of the present invention as a sealing material for an LED, the viscosity of the component (A) at 23 ° C is preferably 500 to 100,000 mPa as determined by JIS K7117-1:1999. s, more preferably 1,000 to 50,000 mPa. Within the scope of s.

上述(A)成分之直鏈狀多氟化合物,可1種單獨或組合2種以上使用。亦即,上述通式(5)~(7)表示之直鏈狀多氟化合物之中,可1種單獨使用、亦可組合2種以上使用。 The linear polyfluorinated compound of the above-mentioned (A) component may be used alone or in combination of two or more. In other words, one type of the linear polyfluoro compound represented by the above-mentioned general formulae (5) to (7) may be used alone or in combination of two or more.

[(B)成分] [(B) ingredients]

(B)成分係下述通式(1)表示之有機氫聚矽氧烷,其係發揮作為上述(A)成分之交聯劑的功能者。又,該(B)成分 係對使本發明之組成物硬化而得之硬化物的低氣體穿透性作出貢獻。 The component (B) is an organohydrogenpolyoxyalkylene represented by the following formula (1), which functions as a crosslinking agent of the component (A). Also, the component (B) It contributes to the low gas permeability of the cured product obtained by hardening the composition of the present invention.

(式中,a為3~10之整數,A為包含全氟伸烷基、全氟氧基伸烷基、或其兩者之2價有機基,D係互相獨立地為可含有矽原子、氧原子或氮原子之取代或非取代的2價烴基,R1係互相獨立地為取代或非取代之1價烴基,R2係互相獨立地為氫原子、或隔著可含有矽原子、氧原子或氮原子之2價烴基而與矽原子鍵結之1價全氟烷基或1價全氟氧基烷基,R2當中之三個以上為氫原子)。 (wherein, a is an integer of from 3 to 10, and A is a divalent organic group containing a perfluoroalkylene group, a perfluoroalkylalkylene group, or both thereof, and D is independently of each other and may contain a halogen atom, oxygen a substituted or unsubstituted divalent hydrocarbon group of an atom or a nitrogen atom, R 1 is a substituted or unsubstituted monovalent hydrocarbon group independently of each other, and R 2 is independently a hydrogen atom or may contain a halogen atom or an oxygen atom. Or a monovalent perfluoroalkyl group or a monovalent perfluorooxyalkyl group bonded to a ruthenium atom by a divalent hydrocarbon group of a nitrogen atom, and three or more of R 2 are a hydrogen atom).

上述通式(1)中,a為3~10之整數、較佳為3~6之整數。 In the above formula (1), a is an integer of from 3 to 10, preferably an integer of from 3 to 6.

又,A為全氟伸烷基、全氟氧基伸烷基、或含有其兩者的2價有機基,作為如此之全氟伸烷基,可列舉下述通式(8’)表示之基。 Further, A is a perfluoroalkylene group, a perfluoroalkylalkylene group, or a divalent organic group containing both of them. Examples of the perfluoroalkylene group include a group represented by the following formula (8'). .

-CmF2m- (8’) (式中,m較佳為1~10之整數、更佳為1~5之整數)。 -C m F 2m - (8') (wherein m is preferably an integer of 1 to 10, more preferably an integer of 1 to 5).

另一方面,該全氟氧基伸烷基,較佳為含有 1~500個、更佳為2~300個、又更佳為5~200個之下述通式(8):-Ce’F2e’O- (8)(式中,e’係每單位獨立地為1~6之整數) On the other hand, the perfluoroalkylalkylene group preferably has from 1 to 500, more preferably from 2 to 300, more preferably from 5 to 200, of the following formula (8): -C e' F 2e' O- (8) (wherein e' is independently an integer from 1 to 6 per unit)

表示之重複單位。 Represents the repeating unit.

又,e’可為隨每個重複單位相異地為1~6之整數、較佳為1~4之整數。 Further, e' may be an integer of 1 to 6 different from each repeating unit, preferably an integer of 1 to 4.

上述通式(8)表示之重複單位之具體例子,可列舉-CF2O-、-CF2CF2O-、-CF2CF2CF2O-、-CF(CF3)CF2O-、-CF2CF2CF2CF2O-、-CF(CF3)CF(CF3)O-、等。再者,上述全氟氧基伸烷基,可由此等重複單位之1種單獨構成、亦可為2種以上之組合。 Specific examples of the repeating unit represented by the above formula (8) include -CF 2 O-, -CF 2 CF 2 O-, -CF 2 CF 2 CF 2 O-, -CF(CF 3 )CF 2 O- -CF 2 CF 2 CF 2 CF 2 O-, -CF(CF 3 )CF(CF 3 )O-, and the like. Further, the perfluoroalkylalkylene group may be composed of one type of the above-mentioned repeating unit or a combination of two or more types.

由上述通式(8’)表示之全氟伸烷基與上述通式(8)表示之全氟氧基伸烷基所構成之A,較佳為下述通式(9)~(11)表示之2價基。 A composed of the perfluoroalkylene group represented by the above formula (8') and the perfluoroalkylalkylene group represented by the above formula (8) is preferably represented by the following formulas (9) to (11). The 2 price base.

(式中,R10係互相獨立地為氟原子或CF3基,j為1~4之整數,k及n各自為0~200之整數,k+n之平均值為0~400,l為2~6之整數。又,各重複單位之鍵結順序並無限定)。 (wherein R 10 is independently a fluorine atom or a CF 3 group, j is an integer of 1 to 4, and k and n are each an integer of 0 to 200, and an average value of k + n is 0 to 400, and l is An integer from 2 to 6. In addition, the order of bonding of each repeating unit is not limited).

(式中,p為1~200之整數,j係與上述相同)。 (wherein p is an integer from 1 to 200, and j is the same as above).

(式中,R10、j、k、及n係與上述相同。又,各重複單位之鍵結順序並無限定)。 (In the formula, R 10 , j, k, and n are the same as described above. Further, the order of bonding of each repeating unit is not limited).

上述通式(9)中,R10係獨立地為氟原子或CF3基,j為1~4之整數、較佳為1~3,k及n係各為0~200之整數、較佳為1~150,k+n之平均值為0~400、較佳為2~300,l為2~6之整數、較佳為2~5之整數。惟,上述通式(9)中之各重複單位之鍵結順序並無限定。 In the above formula (9), R 10 is independently a fluorine atom or a CF 3 group, j is an integer of 1 to 4, preferably 1 to 3, and k and n are each an integer of 0 to 200, preferably The average value of k+n is from 0 to 400, preferably from 2 to 300, and l is an integer from 2 to 6, preferably from 2 to 5. However, the bonding order of each repeating unit in the above formula (9) is not limited.

上述通式(10)中,p為1~200之整數、較佳為 1~150之整數,j係與上述相同。 In the above formula (10), p is an integer of from 1 to 200, preferably An integer from 1 to 150, j is the same as above.

又,上述通式(11)中,R10、j、k及n係與上述相同。惟,上述通式(11)中之各重複單位之鍵結順序並無限定。 Further, in the above formula (11), R 10 , j, k and n are the same as described above. However, the bonding order of each repeating unit in the above formula (11) is not limited.

接著,上述通式(1)中,D係互相獨立地為可含有矽原子、氧原子或氮原子之取代或非取代之2價烴基,具體而言,可列舉碳原子數2~12之伸烷基、或該伸烷基之氫原子的一部分或全部經氟等之鹵素原子取代之基、或該伸烷基中間存在有醚鍵、酯鍵、醯胺鍵、2價芳香族烴基等者。具體而言可舉例以下所示之基。再者,以下之各基中,較佳係左側與A鍵結、右側與矽原子鍵結。 In the above formula (1), D is independently a substituted or unsubstituted divalent hydrocarbon group which may contain a halogen atom, an oxygen atom or a nitrogen atom, and specifically, a stretching of 2 to 12 carbon atoms is exemplified. a group in which an alkyl group or a hydrogen atom of the alkylene group is substituted with a halogen atom such as fluorine, or an ether bond, an ester bond, a guanamine bond or a divalent aromatic hydrocarbon group is present in the alkyl group. . Specifically, the bases shown below can be exemplified. Further, among the following groups, it is preferred that the left side is bonded to the A bond and the right side is bonded to the ruthenium atom.

【化28】 【化28】

又,上述通式(1)中,R1係互相獨立地為取代或非取代之1價烴基,可列舉與上述R6、R7、及R8之取代或非取代之1價烴基的例示相同之基。 Further, in the above formula (1), R 1 is a substituted or unsubstituted monovalent hydrocarbon group independently of each other, and examples of the substituted or unsubstituted monovalent hydrocarbon group of the above R 6 , R 7 and R 8 are exemplified. The same base.

進一步地,上述通式(1)中,R2係互相獨立地為氫原子、或隔著可含有矽原子、氧原子或氮原子之2價烴基而與矽原子鍵結之1價全氟烷基或1價全氟氧基烷基,式中所示之全R2當中之三個以上為氫原子。 Further, in the above formula (1), R 2 is independently a hydrogen atom or a monovalent perfluoroalkane bonded to a ruthenium atom via a divalent hydrocarbon group which may contain a ruthenium atom, an oxygen atom or a nitrogen atom. Or a monovalent perfluorooxyalkyl group, and three or more of all R 2 shown in the formula are a hydrogen atom.

該1價全氟烷基或1價全氟氧基烷基,可列舉下述通式(14)及(15)表示之基。 Examples of the monovalent perfluoroalkyl group or the monovalent perfluorooxyalkyl group include the groups represented by the following formulas (14) and (15).

CvF2v+1- (14) (式中,v為1~10之整數、較佳為3~7之整數)。 C v F 2v+1 - (14) (wherein v is an integer of 1 to 10, preferably an integer of 3 to 7).

(式中,w為1~10之整數、較佳為2~8之整數)。 (wherein w is an integer of 1 to 10, preferably an integer of 2 to 8).

又,連結上述1價全氟烷基或1價全氟氧基烷基與矽原子的可含有矽原子、氧原子或氮原子之2價烴基,可列舉碳數2~12之伸烷基;或該基中間存在有醚鍵、矽原子、醯胺鍵、2價芳香族烴基、羰基鍵等者,具體而言可舉例以下所示之基。 Further, a divalent hydrocarbon group which may contain a halogen atom, an oxygen atom or a nitrogen atom, which is a monovalent perfluoroalkyl group or a monovalent perfluorooxyalkyl group and a halogen atom, may be an alkylene group having 2 to 12 carbon atoms; Further, an ether bond, a ruthenium atom, a guanamine bond, a divalent aromatic hydrocarbon group, a carbonyl bond or the like may be present in the middle of the group, and specific examples thereof include the groups shown below.

如此之(B)成分,例如可舉例以下通式所示之化合物。再者,式中之k及n係與上述相同。 As such a component (B), for example, a compound represented by the following formula can be exemplified. Further, k and n in the formula are the same as described above.

【化31】 【化31】

【化32】 【化32】

【化33】 【化33】

該(B)成分,可1種單獨使用、亦可合併使用2種以上者。上述(B)成分之摻合量,相對於本發明之組成物中所含有的烯基1莫耳而言,係直接鍵結於該(B)成分中之矽原子的氫原子(SiH基)成為0.50~2.0莫耳、更佳成為0.70~1.6莫耳之量。SiH基少於0.50莫耳時,交聯程度變得不充分,另一方面,多於2.0莫耳時,會有損及保存性、或硬化後所得硬化物之物性降低之虞。 The component (B) may be used alone or in combination of two or more. The blending amount of the above component (B) is a hydrogen atom (SiH group) of a halogen atom directly bonded to the component (B) with respect to the alkenyl group 1 mole contained in the composition of the present invention. It becomes 0.50~2.0 moules, and more preferably becomes 0.70~1.6 moules. When the SiH group is less than 0.50 mol, the degree of crosslinking is insufficient. On the other hand, when it is more than 2.0 mol, the storage property or the physical properties of the cured product obtained after curing may be impaired.

[(C)成分] [(C) ingredient]

本發明之(C)成分之鉑族金屬系觸媒,係氫矽烷基化反應觸媒。氫矽烷基化反應觸媒,係促進組成物中含有的烯基、特別是(A)成分中之烯基及(F)成分之烯基,與組成 物中含有的SiH基、(B)成分中之SiH基的加成反應之觸媒。該氫矽烷基化反應觸媒,一般而言係貴金屬或其化合物,由高價格而言,常使用獲得比較容易的鉑或鉑化合物。 The platinum group metal catalyst of the component (C) of the present invention is a hydroquinone alkylation reaction catalyst. The hydroquinone alkylation reaction catalyst promotes an alkenyl group contained in the composition, particularly an alkenyl group in the component (A) and an alkenyl group (F) component, and a composition thereof. A catalyst for the addition reaction of the SiH group in the SiH group and the (B) component. The hydroquinone alkylation reaction catalyst is generally a noble metal or a compound thereof, and a platinum or platinum compound which is relatively easy to obtain is often used at a high price.

鉑化合物,可列舉例如氯化鉑酸或氯化鉑酸與乙烯等之烯烴之錯合物、與醇或乙烯基矽氧烷之錯合物、載持於二氧化矽、氧化鋁、碳等之金屬鉑等。作為鉑或其化合物以外之鉑族金屬系觸媒,亦已知有銠、釕、銥、鈀系化合物,例如可舉例RhCl(PPh3)3、RhCl(CO)(PPh3)2、Ru3(CO)12、IrCl(CO)(PPh3)2、Pd(PPh3)4等。再者,前述式中,Ph表示苯基。 Examples of the platinum compound include a complex of chloroplatinic acid or chloroplatinic acid and an olefin such as ethylene, a complex with an alcohol or a vinyl siloxane, and a carrier of cerium oxide, aluminum oxide, carbon, or the like. Metal platinum, etc. As the platinum group metal catalyst other than platinum or a compound thereof, ruthenium, rhodium, iridium, and palladium compounds are also known, and examples thereof include RhCl(PPh 3 ) 3 , RhCl(CO)(PPh 3 ) 2 , and Ru 3 . (CO) 12 , IrCl(CO)(PPh 3 ) 2 , Pd(PPh 3 ) 4 and the like. Further, in the above formula, Ph represents a phenyl group.

此等觸媒之使用時,其為固體觸媒時雖亦能夠以固體狀來使用,但為了得到更均勻的硬化物,較佳為將使氯化鉑酸或錯合物溶解於例如甲苯或乙醇等之適切溶劑者,與(A)成分之直鏈狀多氟化合物相溶來使用。 When such a catalyst is used, it can be used as a solid catalyst. However, in order to obtain a more uniform cured product, it is preferred to dissolve chloroplatinic acid or a complex compound in, for example, toluene or A suitable solvent such as ethanol is used in combination with a linear polyfluoro compound of the component (A).

(C)成分之摻合量,係作為氫矽烷基化反應觸媒的有效量,相對於(A)成分100質量份而言,為0.1~500ppm、特佳為0.5~200ppm(以鉑族金屬原子之質量換算),但可依照所希望之硬化速度來適當增減。 The blending amount of the component (C) is an effective amount of the hydroquinone alkylation reaction catalyst, and is 0.1 to 500 ppm, particularly preferably 0.5 to 200 ppm, based on 100 parts by mass of the component (A). The atomic mass is converted, but it can be appropriately increased or decreased according to the desired hardening speed.

[(D)成分] [(D) ingredient]

本發明之(D)成分,為下述通式(2)表示之環狀有機聚矽氧烷,其具有作為對使本發明之組成物硬化而得之硬化物賦予自我接著性之接著賦予的功能。 The component (D) of the present invention is a cyclic organopolyoxane represented by the following formula (2), which has a self-adhesive property imparted to the cured product obtained by curing the composition of the present invention. Features.

(式中,b為1~6之整數,c為1~4之整數,d為1~4之整數,b+c+d為4~10之整數,R3係互相獨立地為取代或非取代之1價烴基,E係互相獨立地為隔著可含有矽原子、氧原子或氮原子之2價烴基而與矽原子鍵結之1價全氟烷基或1價全氟氧基烷基,G係互相獨立地為隔著可含有氧原子之2價烴基而與矽原子鍵結之環氧基或三烷氧基矽烷基或其兩者。惟,-(SiO)(H)R3-、-(SiO)(E)R3-、及-(SiO)(G)R3-之鍵結順序並無限定)。 (wherein b is an integer from 1 to 6, c is an integer from 1 to 4, d is an integer from 1 to 4, b+c+d is an integer from 4 to 10, and R 3 is independently substituted or not The substituted monovalent hydrocarbon group, which is independently a monovalent perfluoroalkyl group or a monovalent perfluorooxyalkyl group bonded to a ruthenium atom via a divalent hydrocarbon group which may contain a halogen atom, an oxygen atom or a nitrogen atom. Further, G is independently an epoxy group or a trialkoxyalkyl group bonded to a ruthenium atom via a divalent hydrocarbon group which may contain an oxygen atom, or both. However, -(SiO)(H)R 3 -, - (SiO) (E) R 3 -, and - (SiO) (G) R 3 - bonding order is not limited).

上述通式(2)中,b為1~6之整數、較佳為2~5之整數,c為1~4之整數、較佳為1~3之整數,d為1~4之整數、較佳為1~3之整數,b+c+d為4~10之整數、較佳為4~8之整數。惟,-(SiO)(H)R3-、-(SiO)(E)R3-及-(SiO)(G)R3-之鍵結順序並無限定。 In the above formula (2), b is an integer of 1 to 6, preferably an integer of 2 to 5, c is an integer of 1 to 4, preferably an integer of 1 to 3, and d is an integer of 1 to 4, Preferably, it is an integer of 1 to 3, and b+c+d is an integer of 4 to 10, preferably an integer of 4 to 8. However, the bonding order of -(SiO)(H)R 3 -, -(SiO)(E)R 3 -, and -(SiO)(G)R 3 - is not limited.

又,R3係互相獨立地為取代或非取代之1價烴基,可列舉與上述R1、R6、R7、及R8之取代或非取代之1價烴基的例示相同之基。 Further, R 3 is a substituted or unsubstituted monovalent hydrocarbon group independently of each other, and examples thereof are the same as those exemplified as the above-mentioned substituted or unsubstituted monovalent hydrocarbon group of R 1 , R 6 , R 7 and R 8 .

進一步地,E係互相獨立地為隔著可含有矽原子、氧原子或氮原子之2價烴基而與矽原子鍵結之1價全氟烷基或1價全氟氧基烷基,可舉例與上述R2所用之1 價全氟烷基或1價全氟氧基烷基相同之基。該E係由與(A)成分之相溶性、分散性及硬化後之均勻性等之觀點而言被適當導入之基。 Further, E is independently a monovalent perfluoroalkyl group or a monovalent perfluoroalkyl group bonded to a ruthenium atom via a divalent hydrocarbon group which may contain a halogen atom, an oxygen atom or a nitrogen atom, and is exemplified. The same group as the monovalent perfluoroalkyl group or the monovalent perfluorooxyalkyl group used for the above R 2 . This E is a group which is appropriately introduced from the viewpoints of compatibility with the component (A), dispersibility, uniformity after curing, and the like.

又,G係互相獨立地為透過可含有氧原子之2價烴基而與矽原子鍵結的環氧基及/或三烷氧基矽烷基。如此之環氧基可列舉例如下述通式(18)表示者。 Further, G is an epoxy group and/or a trialkoxyalkylene group which are bonded to a ruthenium atom by a divalent hydrocarbon group which may contain an oxygen atom, independently of each other. Examples of such an epoxy group include those represented by the following formula (18).

上述通式(18)中,R12中可存在有氧原子,其較佳為碳數1~10、更佳為1~5之2價烴基,具體而言,可列舉亞甲基、伸乙基、伸丙基、伸丁基、伸己基、伸辛基等之伸烷基;伸環己基等之伸環烷基、氧基伸乙基、氧基伸丙基、氧基伸丁基等之氧基伸烷基等。 In the above formula (18), an oxygen atom may be present in R 12 , and it is preferably a divalent hydrocarbon group having 1 to 10 carbon atoms, more preferably 1 to 5 carbon atoms, and specific examples thereof include a methylene group and a stretching group. An alkyl group such as a propyl group, a butyl group, a butyl group, a hexyl group or a octyl group; an alkylene group such as a cycloalkyl group, an oxyethyl group, an oxypropyl group or an oxybutyl group; Alkyl and the like.

如此之環氧基之具體例子,可列舉下述所示者。 Specific examples of such an epoxy group include the following.

另一方面,上述三烷氧基矽烷基,可列舉例如下述通式(19)表示者。 On the other hand, the above trialkoxysulfanyl group is, for example, represented by the following formula (19).

上述通式(19)中,R13係較佳為碳數1~10、更佳為1~5之2價烴基,具體而言,可列舉亞甲基、伸乙基、伸丙基、伸丁基、伸己基、伸環己基、伸辛基等之伸烷基等。又,R14係較佳為碳數1~8、更佳為1~4之1價烴基,具體而言,可列舉甲基、乙基、n-丙基等之烷基等。 In the above formula (19), R 13 is preferably a divalent hydrocarbon group having 1 to 10 carbon atoms, more preferably 1 to 5 carbon atoms, and specific examples thereof include a methylene group, an exoethyl group, a stretching group, and a stretching group. a butyl group, a hexyl group, a cyclohexyl group, an extended alkyl group, and the like. In addition, R 14 is preferably a monovalent hydrocarbon group having 1 to 8 carbon atoms, more preferably 1 to 4 carbon atoms, and specific examples thereof include an alkyl group such as a methyl group, an ethyl group or an n-propyl group.

如此之三烷氧基矽烷基之具體例子,可列舉下述所示者。 Specific examples of such a trialkoxyalkylene group include the following.

如此之(D)成分,可列舉例如下述之化合物。 Examples of the component (D) include the following compounds.

【化39】 【化39】

【化42】 【化42】

【化44】 【化44】

該(D)成分,可1種單獨使用、亦可合併使用2種以上者。又,(D)成分之使用量,相對於(A)成分100質量份而言,係0.10~10.0質量份、較佳為0.50~8.0質量份之範圍。未達0.10質量份時,無法得到充分之接著性,超過10.0質量份時,會有組成物之流動性變差,且使本發明之組成物硬化而得之硬化物的物理強度降低之虞。 The component (D) may be used alone or in combination of two or more. In addition, the amount of the component (D) is in the range of 0.10 to 10.0 parts by mass, preferably 0.50 to 8.0 parts by mass, per 100 parts by mass of the component (A). When the amount is less than 0.10 parts by mass, sufficient adhesiveness cannot be obtained. When the amount is more than 10.0 parts by mass, the fluidity of the composition is deteriorated, and the physical strength of the cured product obtained by curing the composition of the present invention is lowered.

[(E)成分] [(E) component]

本發明之(E)成分係羧酸酐,其係用以提高上述(D)成分之接著賦予能力,且促進使本發明之組成物硬化而得之硬化物的自我接著性表現者。作為該(E)成分,只要使用作為環氧基樹脂用之硬化劑者則不論何者均可使用。 The component (E) of the present invention is a carboxylic acid anhydride for improving the adhesion ability of the component (D) and promoting the self-adhesiveness of the cured product obtained by curing the composition of the present invention. As the component (E), any one which can be used as a curing agent for an epoxy resin can be used.

如此之(E)成分,較佳為下述通式(12)或下述 通式(13)表示之羧酸酐。 Such a component (E) is preferably the following formula (12) or the following A carboxylic anhydride represented by the formula (13).

(式中,q為1~6之整數、r為1~4之整數、s為1~4之整數、q+r+s為4~10之整數、R11係互相獨立地為取代或非取代之1價烴基,M係互相獨立地為隔著可含有矽原子、氧原子或氮原子之2價烴基而與矽原子鍵結之1價全氟烷基或1價全氟氧基烷基,Q係互相獨立地為隔著2價烴基而與矽原子鍵結之環狀羧酸酐殘基。惟,-(SiO)(H)R11-、-(SiO)(M)R11-及-(SiO)(Q)R11-之鍵結順序並無限定)。 (wherein q is an integer from 1 to 6, r is an integer from 1 to 4, s is an integer from 1 to 4, q+r+s is an integer from 4 to 10, and R 11 is independently substituted or non-substituted. The substituted monovalent hydrocarbon group, which is independently a monovalent perfluoroalkyl group or a monovalent perfluorooxyalkyl group bonded to a ruthenium atom via a divalent hydrocarbon group which may contain a halogen atom, an oxygen atom or a nitrogen atom. And Q is a cyclic carboxylic acid anhydride residue which is bonded to a ruthenium atom via a divalent hydrocarbon group independently of each other. However, -(SiO)(H)R 11 -, -(SiO)(M)R 11 - and - (SiO) (Q) R 11 - The bonding sequence is not limited).

(式中,R11、M、及Q係與上述相同,t為1~3之整數、u為0~2之整數、t+u為3)。 (wherein R 11 , M, and Q are the same as described above, t is an integer of 1 to 3, u is an integer of 0 to 2, and t + u is 3).

上述通式(12)中,q為1~6之整數、較佳為2~5之整數,r為1~4之整數、較佳為1~3之整數,s為1~4之整數、較佳為1~3之整數,q、r與s之和為4~10之整數、較佳為4~8之整數。惟,-(SiO)(H)R11-、 -(SiO)(M)R11-及-(SiO)(Q)R11-之鍵結順序並無限定。 In the above formula (12), q is an integer of 1 to 6, preferably an integer of 2 to 5, r is an integer of 1 to 4, preferably an integer of 1 to 3, and s is an integer of 1 to 4, Preferably, it is an integer of 1 to 3, and the sum of q, r and s is an integer of 4 to 10, preferably an integer of 4 to 8. However, the bonding order of -(SiO)(H)R 11 -, -(SiO)(M)R 11 - and -(SiO)(Q)R 11 - is not limited.

又,R11係互相獨立地為取代或非取代之1價烴基,可列舉與上述R1、R3、R6、R7、及R8之取代或非取代的1價烴基之例示相同之基。 Further, R 11 is a substituted or unsubstituted monovalent hydrocarbon group independently of each other, and examples thereof are the same as those of the above-mentioned substituted or unsubstituted monovalent hydrocarbon group of R 1 , R 3 , R 6 , R 7 and R 8 . base.

進一步地,M係互相獨立地為透過可含有矽原子、氧原子或氮原子之2價烴基而與矽原子鍵結的1價全氟烷基或1價全氟氧基烷基,可列舉與上述R2及E所用之1價全氟烷基或1價全氟氧基烷基相同之基。該M係由與(A)成分之相溶性、分散性及硬化後之均勻性等之觀點而被適當導入之基。 Further, M is independently a monovalent perfluoroalkyl group or a monovalent perfluoroalkyl group bonded to a ruthenium atom by a divalent hydrocarbon group which may contain a ruthenium atom, an oxygen atom or a nitrogen atom, and is exemplified by The above-mentioned R 2 and E are the same groups as the monovalent perfluoroalkyl group or the monovalent perfluorooxyalkyl group. This M is a group which is suitably introduced from the viewpoint of compatibility with the component (A), dispersibility, uniformity after curing, and the like.

又,Q係互相獨立地為透過2價烴基而與矽原子鍵結之環狀羧酸酐殘基,具體而言可列舉下述通式(20)表示之基。 In addition, the Q-based cyclic carboxylic anhydride residue which is bonded to the ruthenium atom by a divalent hydrocarbon group is specifically a group represented by the following formula (20).

上述通式(20)中,R15較佳為碳數1~15之2價烴基,具體而言可列舉亞甲基、伸乙基、伸丙基、伸丁基等,其中尤以伸乙基或伸丙基特佳。 In the above formula (20), R 15 is preferably a divalent hydrocarbon group having 1 to 15 carbon atoms, and specific examples thereof include a methylene group, an exoethyl group, a propyl group, a butyl group, and the like. Base or propyl is excellent.

如此之上述通式(12)表示之(E)成分,可列舉例如下述之化合物。 Examples of the component (E) represented by the above formula (12) include the following compounds.

【化49】 【化49】

接著,上述通式(13)中,t為1~3之整數、u為0~2之整數、t+u為3,R11、M及Q係為與上述相同之基。 Next, in the above formula (13), t is an integer of 1 to 3, u is an integer of 0 to 2, t+u is 3, and R 11 , M and Q are the same groups as described above.

如此之上述通式(13)表示之(E)成分,可列舉例如下述之化合物。 Examples of the component (E) represented by the above formula (13) include the following compounds.

該(E)成分可1種單獨使用、亦可合併使用2種以上者。 These (E) components may be used alone or in combination of two or more.

上述(E)成分之摻合量,相對於(A)成分100質量份而言,係0.010~10.0質量份、較佳為0.10~5.0質量份之範圍。未達0.010質量份時,無法得到欲促進本發明之組成物的接著性表現的充分效果,超過10.0質量份時,會有 組成物之流動性變差,且損及組成物之保存安定性之虞。 The blending amount of the component (E) is in the range of 0.010 to 10.0 parts by mass, preferably 0.10 to 5.0 parts by mass, per 100 parts by mass of the component (A). When it is less than 0.010 parts by mass, sufficient effects for promoting the adhesiveness of the composition of the present invention are not obtained, and when it exceeds 10.0 parts by mass, there will be The fluidity of the composition deteriorates and the preservation stability of the composition is impaired.

本發明之光半導體密封用硬化性組成物,較佳為含有下述(F)成分作為任意成分者。 The curable composition for sealing an optical semiconductor of the present invention preferably contains the following component (F) as an optional component.

[(F)成分] [(F) ingredient]

本發明之(F)成分,較佳可使用下述通式(3)表示之環狀有機聚矽氧烷,其係對使本發明之組成物硬化而得之硬化物,賦予更加良好之耐衝擊性者。 In the component (F) of the present invention, a cyclic organopolysiloxane represented by the following formula (3), which is a cured product obtained by curing the composition of the present invention, is preferably used to impart a better resistance. Impact person.

(式中,e為1~4之整數,f為3~6之整數,e+f為4~10之整數,R4係互相獨立地為取代或非取代之1價烴基,J係互相獨立地為隔著可含有矽原子、氧原子或氮原子之2價烴基而與矽原子鍵結之1價全氟烷基或1價全氟氧基烷基,L係互相獨立地為直接鍵結於矽原子之烯基。惟,-(SiO)(J)R4-及-(SiO)(L)R4-之鍵結順序並無限定)。 (wherein e is an integer from 1 to 4, f is an integer from 3 to 6, e+f is an integer from 4 to 10, and R 4 is independently substituted or unsubstituted monovalent hydrocarbon group, and J is independent of each other The ground is a monovalent perfluoroalkyl group or a monovalent perfluoroalkyl group bonded to a ruthenium atom via a divalent hydrocarbon group which may contain a halogen atom, an oxygen atom or a nitrogen atom, and the L system is independently bonded directly to each other. The alkenyl group of the ruthenium atom. However, the order of bonding of -(SiO)(J)R 4 - and -(SiO)(L)R 4 - is not limited).

上述通式(3)中,e為1~4之整數、較佳為1~3之整數,f為3~6之整數、較佳為3~5之整數,e+f為4~10之整數、較佳為4~8之整數。惟,-(SiO)(J)R4-及-(SiO)(L)R4-之鍵結順序並無限定。 In the above formula (3), e is an integer of 1 to 4, preferably an integer of 1 to 3, f is an integer of 3 to 6, preferably an integer of 3 to 5, and e+f is 4 to 10 An integer, preferably an integer from 4 to 8. However, the bonding order of -(SiO)(J)R 4 - and -(SiO)(L)R 4 - is not limited.

又,R4係取代或非取代之1價烴基,可列舉 與上述R1、R3、R6、R7、R8、及R11之取代或非取代之1價烴基的例示相同之基。 Further, examples of the R 4 -substituted or unsubstituted monovalent hydrocarbon group include the same examples as the above-mentioned substituted or unsubstituted monovalent hydrocarbon group of R 1 , R 3 , R 6 , R 7 , R 8 and R 11 . .

進一步地,J係互相獨立地為透過可含有矽原子、氧原子或氮原子之2價烴基而與矽原子鍵結之1價全氟烷基或1價全氟氧基烷基,可列舉與上述R2、E、及M所用之1價全氟烷基或1價全氟氧基烷基相同之基。該J係由與(A)成分之相溶性、分散性及硬化後之均勻性等之觀點而被適當導入之基。 Further, J is independently a monovalent perfluoroalkyl group or a monovalent perfluoroalkyl group bonded to a ruthenium atom by a divalent hydrocarbon group which may contain a ruthenium atom, an oxygen atom or a nitrogen atom, and is exemplified by The same group as the monovalent perfluoroalkyl group or the monovalent perfluorooxyalkyl group used for the above R 2 , E, and M. This J is a group which is suitably introduced from the viewpoint of compatibility with the component (A), dispersibility, uniformity after curing, and the like.

又,L係直接鍵結於矽原子之烯基,具體而言,可列舉乙烯基、烯丙基、丁烯基、己烯基、癸烯基等。其中尤以乙烯基或烯丙基特佳。 Further, L is directly bonded to an alkenyl group of a halogen atom, and specific examples thereof include a vinyl group, an allyl group, a butenyl group, a hexenyl group, and a nonenyl group. Among them, vinyl or allyl is particularly preferred.

如此之(F)成分可列舉例如下述化合物。 Examples of such a component (F) include the following compounds.

【化54】 【化54】

該(F)成分,可1種單獨使用、亦可合併使用2種以上者。又,含有(F)成分之情況時的使用量,相對於(A)成分100質量份而言,較佳為0.10~50.0質量份、更佳為1.0~40.0質量份之範圍。0.10質量份以上時,對使本發明之組成物硬化而得之硬化物賦予適度的耐衝擊性之效果變得充分,50.0質量份以下時,並無損及使本發明之組成物硬化而得之硬化物的耐龜裂性或低氣體穿透性之虞。 The component (F) may be used alone or in combination of two or more. In addition, the amount of the component (F) is preferably in the range of 0.10 to 50.0 parts by mass, more preferably 1.0 to 40.0 parts by mass, per 100 parts by mass of the component (A). When the amount is 0.10 parts by mass or more, the effect of imparting appropriate impact resistance to the cured product obtained by curing the composition of the present invention is sufficient, and when it is 50.0 parts by mass or less, the composition of the present invention is hardened and hardened. The crack resistance or low gas permeability of the hardened material.

[其他成分] [Other ingredients]

本發明之光半導體密封用硬化性組成物中,為了提高 其實用性,於上述(A)~(E)成分、及(F)成分以外,亦可依需要添加可塑劑、黏度調節劑、可撓性賦予劑、無機質填充劑、反應控制劑、(E)成分以外之接著促進劑等之各種摻合劑。此等添加劑之摻合量係為任意。 In the curable composition for sealing an optical semiconductor of the present invention, in order to improve In addition to the above components (A) to (E) and (F), a plasticizer, a viscosity modifier, a flexibility imparting agent, an inorganic filler, a reaction control agent, and (E) may be added as needed. Any of various admixtures such as a promoter other than the component. The blending amount of these additives is arbitrary.

作為可塑劑、黏度調節劑、可撓性賦予劑,可合併使用下述通式(21)表示之多氟單烯基化合物及/或下述通式(22)、(23)表示之直鏈狀多氟化合物。Rf-(T)f’-CH=CH2 (21)[式中,Rf為下述通式(24)所示之基,F-[CF(CF3)CF2O]g’-Ch’F2h’- (24)(式中,g’較佳為1~200、更佳為1~150之整數,h’較佳為1~3之整數)。T為-CH2-、-OCH2-、-CH2OCH2-或-CO-NR16-X-(惟,R16為氫原子、甲基、苯基或烯丙基,X為-CH2-、下述構造式(25)所示之基或下述構造式(26)所示之基)。 As the plasticizer, the viscosity modifier, and the flexibility imparting agent, a polyfluoromonoalkenyl compound represented by the following formula (21) and/or a linear chain represented by the following formulas (22) and (23) may be used in combination. Polyfluoro compound. Rf-(T) f' -CH=CH 2 (21) wherein Rf is a group represented by the following formula (24), F-[CF(CF 3 )CF 2 O] g' -C h ' F 2h' - (24) (wherein g' is preferably from 1 to 200, more preferably from 1 to 150, and h' is preferably an integer from 1 to 3). T is -CH 2 -, -OCH 2 -, -CH 2 OCH 2 - or -CO-NR 16 -X- (except that R 16 is a hydrogen atom, a methyl group, a phenyl group or an allyl group, and X is -CH) 2 - a group represented by the following structural formula (25) or a group represented by the following structural formula (26).

f’為0或1]。 f' is 0 or 1].

X’-O-(CF2CF2CF2O)i’-X’ (22)(式中,X’為Cj’F2j’+1-(j’為1~3)表示之基,i’較佳為1~200之整數、更佳為2~100之整數)。 X'-O-(CF 2 CF 2 CF 2 O) i' -X' (22) (wherein X' is a base represented by C j' F 2j'+1 - (j' is 1 to 3), i' is preferably an integer from 1 to 200, more preferably an integer from 2 to 100).

X’-O-(CF2O)k’(CF2CF2O)l’-X’ (23)(式中,X’係與上述相同,k’及l’較佳係分別為1~200之整數、更佳為1~100之整數,且k’+l’之平均值較佳為2~400、更佳為2~300)。 X'-O-(CF 2 O) k' (CF 2 CF 2 O) l' -X' (23) (wherein X' is the same as above, and k' and l' are preferably 1~ An integer of 200, more preferably an integer of 1 to 100, and an average value of k'+l' is preferably 2 to 400, more preferably 2 to 300).

上述通式(21)表示之多氟單烯基化合物之具體例子,可列舉例如下述者。再者,下述式中,Me表示甲基。 Specific examples of the polyfluoromonoalkenyl compound represented by the above formula (21) include the following. Further, in the following formula, Me represents a methyl group.

【化57】 (此處、m’=1~100)。 【化57】 (here, m'=1~100).

上述通式(22)及(23)表示之直鏈狀多氟化合物之具體例子,可列舉例如下述者。 Specific examples of the linear polyfluoro compound represented by the above formulas (22) and (23) include the following.

CF3O-(CF2CF2CF2O)n’-CF2CF3 CF 3 O-(CF 2 CF 2 CF 2 O) n' -CF 2 CF 3

CF3-[(OCF2CF2)o’(OCF2)p’]-O-CF3(此處,n’、o’及p’較佳係各自為1~200之整數、更佳為1~150之整數,o+p’之平均值較佳為2~400之整數、更佳為2~300之整數)。 CF 3 -[(OCF 2 CF 2 ) o' (OCF 2 ) p' ]-O-CF 3 (wherein n', o' and p' are preferably each an integer from 1 to 200, more preferably The integer of 1 to 150, the average value of o + p' is preferably an integer of 2 to 400, more preferably an integer of 2 to 300).

又,上述通式(21)~(23)表示之多氟化合物之黏度(23℃),以與(A)成分相同之測定方法,係5.00~100,000mPa.s、特別期望為50.0~50,000mPa.s之範圍。 Further, the viscosity (23 ° C) of the polyfluoro compound represented by the above formulas (21) to (23) is the same as that of the component (A), and is 5.00 to 100,000 mPa. s, the special expectation is 50.0~50,000mPa. The range of s.

無機質填充劑之例子,可列舉煙霧質二氧化矽、沈降性二氧化矽、球狀二氧化矽、二氧化矽氣凝膠等之二氧化矽粉末;或將該二氧化矽粉末表面以各種有機氯矽烷、有機二矽氮烷、環狀有機聚矽氮烷等處理而成的二氧化矽粉末;進而將該表面處理二氧化矽粉末,以具有上述通式(14)表示之1價全氟烷基或上述通式(15)表示之1價全氟氧基烷基的有機矽烷或有機矽氧烷再處理而成的二氧化矽粉末等之二氧化矽系補強性填充劑;石英粉末、熔融石英粉末、矽藻土、碳酸鈣等之補強性或準補強性填充劑;氧化鈦、氧化鐵、碳黑、鋁酸鈷等之無機顏料;氧化鈦、氧化鐵、碳黑、氧化鈰、氫氧化鈰、碳酸鋅、碳酸鎂、碳酸錳等之耐熱提昇劑;氧化鋁、氮化硼、碳化矽、金屬粉末等之熱傳導性賦予劑;碳黑、銀粉末、導電性鋅華等之導電性賦予劑等。又,氟化鎂、氟化鋁、氟化鈣、氟化鋰、氟化鈉、氟化釷、氧化矽等之於25℃、589nm(鈉之D線)的折射率為1.50以下之無機微粒子亦有用作為補強性填充劑。 Examples of the inorganic fillers include cerium oxide powders such as aerosol-type cerium oxide, sedimentary cerium oxide, spherical cerium oxide, cerium oxide aerogel, or the like, or the surface of the cerium oxide powder is various organic a cerium oxide powder obtained by treating chlorosilane, an organic diazoxide or a cyclic organopolyazane; and further treating the surface of the cerium oxide powder with the monovalent perfluoro group represented by the above formula (14) a cerium oxide-based reinforcing filler such as an alkyl group or a cerium oxide powder obtained by reprocessing an organic decane or an organic decane having a monovalent perfluorooxyalkyl group represented by the above formula (15); Reinforcing or quasi-reinforcing fillers of fused silica powder, diatomaceous earth, calcium carbonate, etc.; inorganic pigments such as titanium oxide, iron oxide, carbon black, cobalt aluminate; titanium oxide, iron oxide, carbon black, cerium oxide, A heat-resistant enhancer such as barium hydroxide, zinc carbonate, magnesium carbonate or manganese carbonate; a heat conductivity imparting agent such as alumina, boron nitride, tantalum carbide or metal powder; and conductive materials such as carbon black, silver powder and conductive zinc Sexual imparting agent, etc. Further, inorganic fine particles having a refractive index of 1.50 or less at 25 ° C and 589 nm (D line of sodium) such as magnesium fluoride, aluminum fluoride, calcium fluoride, lithium fluoride, sodium fluoride, cesium fluoride or cerium oxide are used. Also useful as a reinforcing filler.

氫矽烷基化反應觸媒的控制劑之例子,可列舉1-乙炔基-1-羥基環己烷、3-甲基-1-丁炔-3-醇、3,5-二甲基-1-己炔-3-醇、3-甲基-1-戊炔-3-醇、苯基丁炔醇等之 乙炔性醇;或具有與上述G相同之1價全氟烷基或1價全氟氧基烷基的氯矽烷與乙炔性醇之反應物;3-甲基-3-戊烯-1-炔、3,5-二甲基-3-己烯-1-炔、三烯丙基三聚異氰酸酯等;或者聚乙烯基矽氧烷、有機磷化合物等,藉由該添加,可適度保持硬化反應性與保存安定性。 Examples of the control agent for the hydroquinone alkylation reaction catalyst include 1-ethynyl-1-hydroxycyclohexane, 3-methyl-1-butyn-3-ol, and 3,5-dimethyl-1. -hexyn-3-ol, 3-methyl-1-pentyn-3-ol, phenylbutynol, etc. An acetylene alcohol; or a reactant of a chlorodecane having an identical monovalent perfluoroalkyl group or a monovalent perfluorooxyalkyl group as the above G, and an ethynyl alcohol; 3-methyl-3-pentene-1-yne , 3,5-dimethyl-3-hexene-1-yne, triallyl isocyanurate, etc.; or polyvinyl siloxane, organophosphorus compound, etc., by this addition, moderately maintain the hardening reaction Sex and preservation stability.

(E)成分以外之接著促進劑的例子,可列舉烷氧化鋯或鋯鉗合物等之有機鋯化合物、或者鈦烷氧化物或鈦鉗合物等之有機鈦化合物等。 Examples of the adhesion promoter other than the component (E) include an organic zirconium compound such as azirconium oxide or zirconium sulphate, or an organic titanium compound such as a titanium alkoxide or a titanium tong.

本發明之光半導體密封用硬化性組成物之製造方法並無特殊限制,可列由將上述(A)~(E)成分、(F)成分及其他任意成分捏合來製造。此時,可依需要使用行星式混合器(planetary mixer)、Ross混合器、Hobart混合器等之混合裝置;捏合機、三輥等之混練裝置。 The method for producing the curable composition for sealing an optical semiconductor of the present invention is not particularly limited, and it can be produced by kneading the components (A) to (E) and (F) and other optional components. In this case, a mixing device such as a planetary mixer, a Ross mixer, a Hobart mixer, or the like, or a kneading device such as a kneader or a three-roller may be used as needed.

關於本發明之光半導體密封用硬化性組成物之構成,可依用途,將上述(A)~(E)成分、(F)成分及其他任意成分全部作為1個組成物來操作的所謂1液型構成、或作為2液型,使用時將兩者混合亦可。 In the configuration of the curable composition for optical semiconductor sealing of the present invention, the so-called one liquid in which all of the above components (A) to (E), (F), and other optional components are used as one composition can be used depending on the application. The composition may be either a two-component type or a mixture of the two when used.

本發明之光半導體密封用硬化性組成物,藉由加熱而硬化,而賦予具有良好耐衝擊性及耐龜裂性、進而低氣體穿透性之硬化物,因此有用於作為保護LED、IC、LSI及有機EL等之光半導體元件等之密封材。該光半導體密封用硬化性組成物之硬化溫度並無特殊限制,通常係20~250℃、較佳為40~200℃。又,此時的硬化時間,可適當選擇交聯反應及與各種半導體封裝材料之接著 反應結束的時間,但一般而言較佳為10分鐘~10小時、更佳為30分鐘~8小時。 The curable composition for sealing an optical semiconductor of the present invention is cured by heating, and is provided with a cured product having good impact resistance, crack resistance, and low gas permeability. Therefore, it is useful as a protective LED, an IC, or the like. A sealing material such as an optical semiconductor element such as LSI or organic EL. The curing temperature of the curable composition for optical semiconductor sealing is not particularly limited, and is usually 20 to 250 ° C, preferably 40 to 200 ° C. Moreover, the curing time at this time can be appropriately selected for the crosslinking reaction and subsequent to various semiconductor packaging materials. The time at which the reaction is completed is generally preferably from 10 minutes to 10 hours, more preferably from 30 minutes to 8 hours.

使本發明之組成物硬化而得之硬化物之於JIS K6253-3:2012所規定的A型橡膠硬度計硬度,係30~90、較佳為35~85。未達30時,會有作為LED密封材之耐衝擊性不佳之虞。另一方面,高於90時,會有作為LED密封材之耐龜裂性不佳之虞。 The cured product obtained by curing the composition of the present invention has a hardness of a type A rubber hardness meter defined by JIS K6253-3:2012, and is 30 to 90, preferably 35 to 85. When it is less than 30, there is a problem that the impact resistance of the LED sealing material is not good. On the other hand, when it is higher than 90, there is a problem that the crack resistance of the LED sealing material is not good.

又,使本發明之組成物硬化而得之1mm厚硬化物的水蒸氣穿透率,較佳為15.0g/m2.day以下、更佳為13.0g/m2.day以下。若為15.0g/m2.day以下,則於LED周邊被鍍銀的光半導體裝置中,使用使本發明之組成物硬化而得之硬化物作為LED之密封材時,即使暴露於硫系氣體,亦無銀因為該氣體而黑色化,降低明亮度之虞,故較佳。再者,上述水蒸氣穿透率,係使用根據JIS K7129:2008之Lyssy公司製L80-5000型水蒸氣穿透度計來測定之值。 Further, the water vapor permeability of the cured product of 1 mm thick obtained by curing the composition of the present invention is preferably 15.0 g/m 2 . Below day, more preferably 13.0 g/m 2 . Below day. If it is 15.0g/m 2 . When the cured product obtained by curing the composition of the present invention is used as a sealing material for LEDs in an optical semiconductor device in which silver is coated around the LED, the silver is not exposed to the sulfur-based gas. It is better to blacken and reduce the brightness. In addition, the water vapor transmission rate is a value measured by a water vapor permeability meter L80-5000 manufactured by Lyssy Co., Ltd. according to JIS K7129:2008.

進一步地,JIS K7117-1:1999所規定之於23℃的本發明之組成物之黏度,由操作作業性觀點而言,較佳為50.0~50,000mPa.s、更佳為100~30,000mPa.s。若為50.0mPa.s以上,則無流動性過高,於LED封裝內裝填一定量之點膠機的控制變得困難之虞,故較佳,若為50,000mPa.s以下,則無該組成物被裝填於LED封裝內後,調平需要過度的時間,使生產性降低之虞,故較佳。 Further, the viscosity of the composition of the present invention specified in JIS K7117-1:1999 at 23 ° C is preferably from 50.0 to 50,000 mPa from the viewpoint of handling workability. s, more preferably 100~30,000mPa. s. If it is 50.0mPa. Above s, the no-flowing property is too high, and it is difficult to control the filling of a certain amount of the dispenser in the LED package, so it is preferably 50,000 mPa. In the case of s or less, it is preferable that the composition is not filled in the LED package, and the leveling time is excessive, and the productivity is lowered.

又,使本發明之組成物硬化而得之硬化物於 25℃、589nm(鈉之D線)的折射率,較佳為1.30以上且未達1.40。該折射率在此範圍內時,藉由使本發明之組成物硬化而得之硬化物來密封上述光半導體元件而得的光半導體裝置中,並無將自LED發出之光取出於外部之效率因該光半導體裝置的設計而降低之虞,故較佳。 Moreover, the cured product obtained by hardening the composition of the present invention is The refractive index at 25 ° C and 589 nm (the D line of sodium) is preferably 1.30 or more and less than 1.40. When the refractive index is in this range, the optical semiconductor device obtained by sealing the optical semiconductor element by curing the cured product of the present invention does not have the efficiency of taking out light emitted from the LED to the outside. It is preferable because the design of the optical semiconductor device is lowered.

再者,使用本發明之組成物時,可依其用途、目的,將該組成物以所期望之濃度溶解於適當的氟系溶劑,例如1,3-雙(三氟甲基)苯、Fluorinert(3M公司製)、全氟丁基甲基醚、全氟丁基乙基醚等來使用。 Further, when the composition of the present invention is used, the composition can be dissolved in a suitable fluorine-based solvent at a desired concentration depending on the use and purpose, for example, 1,3-bis(trifluoromethyl)benzene, Fluorinert. (manufactured by 3M Company), perfluorobutyl methyl ether, perfluorobutyl ethyl ether or the like.

如此地,若為含有上述(A)~(E)成分、(F)成分及其他任意成分、且具有上述特性之光半導體密封用硬化性組成物,則可得到耐衝擊性及耐龜裂性優良,且具有低氣體穿透性之硬化物。 In this manner, when it is a curable composition for optical semiconductor sealing which contains the above-mentioned components (A) to (E), (F) and other optional components, and has the above characteristics, impact resistance and crack resistance can be obtained. A hardened material that is excellent and has low gas permeability.

可使用本發明之光半導體密封用硬化性組成物之光半導體裝置的構造,並無特殊限定。本發明之光半導體裝置,係具有光半導體元件、及用以密封光半導體元件之使上述本發明之光半導體密封用硬化性組成物硬化而得到之硬化物者,代表的截面構造示於圖1及圖2。 The structure of the optical semiconductor device in which the curable composition for optical semiconductor sealing of the present invention can be used is not particularly limited. The optical semiconductor device of the present invention has an optical semiconductor element and a cured product obtained by curing the above-described optical semiconductor sealing curable composition of the present invention for sealing the optical semiconductor element. The representative cross-sectional structure is shown in FIG. And Figure 2.

圖1之光半導體裝置(發光裝置)10中,係於第一引線框2之前端部2a,設置自其底面起朝向上方設置孔徑慢慢擴大的研缽狀的凹部2’,於該凹部2’之底面上將LED晶片1透過銀糊等,以黏晶(die bond)予以連接固定,藉此,將第一引線框2與LED晶片1底面之一方的電極(未圖示)予以電性連接。再者,該凹部2’之底面係 鍍銀。又,將第二引線框3之前端部3a、與該LED晶片1上側面之另一方的電極(未圖示)透過接合引線4予以電性連接而成。 In the optical semiconductor device (light-emitting device) 10 of FIG. 1, the end portion 2a of the first lead frame 2 is provided with a mortar-shaped concave portion 2' whose opening diameter is gradually increased from the bottom surface thereof, and the concave portion 2' is formed in the concave portion 2 On the bottom surface, the LED chip 1 is passed through a silver paste or the like and bonded and fixed by a die bond, whereby the first lead frame 2 and an electrode (not shown) on one side of the bottom surface of the LED chip 1 are electrically connected. connection. Furthermore, the bottom surface of the recess 2' is silver. Further, the front end portion 3a of the second lead frame 3 and the other electrode (not shown) on the upper side surface of the LED chip 1 are electrically connected to each other through the bonding wires 4.

進一步地,前述凹部2’中,LED晶片1係經由使上述本發明之光半導體密封用硬化性組成物硬化而得之硬化物所構成之密封材5被覆。 Further, in the recessed portion 2', the LED wafer 1 is covered with a sealing material 5 composed of a cured product obtained by curing the curable composition for optical semiconductor sealing of the present invention.

又,LED晶片1、第一引線框2之前端部2a及端子部2b之上端、第二引線框3之前端部3a及端子部3b之上端,係經於前端具有凸透鏡部6的透光性樹脂部7被覆/密封。又,第一引線框2之端子部2b的下端及第二引線框3之端子部3b的下端,係貫通透光性樹脂部7之下端部而朝外部突出。 Further, the LED chip 1, the upper end portion 2a of the first lead frame 2, the upper end of the terminal portion 2b, the front end portion 3a of the second lead frame 3, and the upper end of the terminal portion 3b are translucent with the convex lens portion 6 at the tip end. The resin portion 7 is covered/sealed. Further, the lower end of the terminal portion 2b of the first lead frame 2 and the lower end of the terminal portion 3b of the second lead frame 3 penetrate the lower end portion of the translucent resin portion 7 and protrude outward.

圖2之光半導體裝置(發光裝置)10’中,於封裝基板8之上部,設置自其底面起朝向上方設置孔徑慢慢擴大的研缽狀的凹部8’,於該凹部8’之底面上將LED晶片1以黏晶材予以接著固定,又,將LED晶片1之電極藉由接合引線4與設於封裝基板8之電極9進行電性連接。再者,該凹部8’之底面係鍍銀。 In the optical semiconductor device (light-emitting device) 10' of FIG. 2, a mortar-shaped recessed portion 8' whose opening diameter is gradually increased from the bottom surface is provided on the upper surface of the package substrate 8, and is placed on the bottom surface of the recessed portion 8'. The LED wafer 1 is then fixed by a die bond, and the electrodes of the LED chip 1 are electrically connected to the electrodes 9 provided on the package substrate 8 by bonding wires 4. Further, the bottom surface of the concave portion 8' is plated with silver.

進一步地,凹部8’中,LED晶片1係經由使上述本發明之光半導體密封用硬化性組成物硬化而得之硬化物所構成之密封材5被覆。 Further, in the recessed portion 8', the LED wafer 1 is covered with a sealing material 5 composed of a cured product obtained by curing the curable composition for optical semiconductor sealing of the present invention.

此處,於上述LED晶片1,並無特殊限定地,可使用以往周知之LED晶片所用的發光元件。作為如此之發光元件,可列舉例如藉由MOCVD法、HDVPE 法、液相成長法等之各種方法,依需要於設有GaN、AlN等之緩衝層的基板上層合半導體材料所製作者。作為此時之基板,可使用各種材料,可列舉例如藍寶石、尖晶石、SiC、Si、ZnO、GaN單結晶等。此等之中,由可容易地形成結晶性良好的GaN,且工業上利用價值高的觀點而言,較佳為使用藍寶石。 Here, the LED chip 1 is not particularly limited, and a light-emitting element used in a conventionally known LED chip can be used. As such a light-emitting element, for example, by MOCVD method, HDVPE Various methods such as a method and a liquid phase growth method are required to laminate a semiconductor material on a substrate provided with a buffer layer of GaN or AlN. As the substrate at this time, various materials can be used, and examples thereof include sapphire, spinel, SiC, Si, ZnO, and GaN single crystal. Among these, sapphire is preferably used from the viewpoint that GaN having good crystallinity can be easily formed and industrial use value is high.

所層合之半導體材料,可列舉GaAs、GaP、GaAlAs、GaAsP、AlGaInP、GaN、InN、AlN、InGaN、InGaAlN、SiC等。此等之中,就可得到高輝度之觀點而言,較佳為氮化物系化合物半導體(InxGayAlzN)。如此材料中亦可含有活化劑等。 Examples of the semiconductor material to be laminated include GaAs, GaP, GaAlAs, GaAsP, AlGaInP, GaN, InN, AlN, InGaN, InGaAlN, SiC, and the like. Among these, from the viewpoint of obtaining high luminance, a nitride-based compound semiconductor (In x Ga y Al z N) is preferable. Such materials may also contain an activator or the like.

發光元件之構造,可列舉具有MIS接合、pn接合、PIN接合之同質接合;異質接合或雙異質構造等。又,亦可為單一或多重量子井構造。 Examples of the structure of the light-emitting element include homojunction with MIS bonding, pn bonding, and PIN bonding; heterojunction or double heterostructure. Also, it can be a single or multiple quantum well structure.

亦可於發光元件設置鈍化層(passivation layer)、亦可不設置。 A passivation layer may or may not be provided in the light-emitting element.

發光元件之發光波長可使用由紫外區域至紅外區域之各種者,然使用主發光峰值波長為550nm以下者,本發明之效果特別顯著。 The light-emitting wavelength of the light-emitting element can be used from the ultraviolet region to the infrared region. However, when the main emission peak wavelength is 550 nm or less, the effect of the present invention is particularly remarkable.

所使用之發光元件能夠以1種類使其單色發光、亦可使用複數種使其單色或多色發光。 The light-emitting element to be used can emit light in a single color in one type, or can emit light in a single color or a plurality of colors using a plurality of types.

可藉由以往已知之方法於發光元件形成電極。 The electrode can be formed on the light-emitting element by a conventionally known method.

發光元件上之電極能夠以各種方法與引線端 子等進行電性連接。電性連接構件較佳為與發光元件之電極的歐姆性機械連接性等良好者,可列舉例如圖1及圖2記載之使用了金、銀、銅、鉑、鋁或該等之合金等的接合引線4。又,亦可使用將銀、碳等之導電性填料以樹脂填充之導電性接著劑等。此等之中,就作業性良好之觀點而言,較佳為使用鋁線或金線。 The electrode on the light-emitting element can be connected to the lead end in various ways The child is electrically connected. The electrical connection member preferably has good ohmic mechanical connectivity with the electrode of the light-emitting element, and examples thereof include gold, silver, copper, platinum, aluminum, or the like, as described in FIGS. 1 and 2 . Bonding leads 4. Further, a conductive adhesive or the like in which a conductive filler such as silver or carbon is filled with a resin can be used. Among these, it is preferable to use an aluminum wire or a gold wire from the viewpoint of good workability.

再者,上述第一引線框2及第二引線框3,係由銅、銅鋅合金、鐵鎳合金等所構成。 Further, the first lead frame 2 and the second lead frame 3 are made of copper, a copper-zinc alloy, an iron-nickel alloy or the like.

進一步地,作為形成上述透光性樹脂部7之材料,只要係具有透光性之材料則無特殊限定,主要使用環氧基樹脂或聚矽氧樹脂。 Further, the material for forming the light-transmitting resin portion 7 is not particularly limited as long as it is a material having light transmissivity, and an epoxy resin or a polyoxymethylene resin is mainly used.

又,上述封裝基板8可使用各種材料來製作,可列舉例如聚鄰苯二甲酸醯胺(PPA)、聚碳酸酯樹脂、聚苯硫樹脂、聚對苯二甲酸丁二酯樹脂、聚醯胺樹脂、液晶聚合物、環氧樹脂、丙烯酸樹脂、聚矽氧樹脂、改質聚矽氧樹脂、ABS樹脂、BT樹脂、陶瓷等。此等之中,就耐熱性、強度及成本的觀點而言,特佳為聚鄰苯二甲酸醯胺(PPA)。進一步地,較佳為於上述封裝基板8混合鈦酸鋇、氧化鈦、氧化鋅、硫酸鋇等之白色顏料等,來提高光的反射率。 Further, the package substrate 8 can be produced using various materials, and examples thereof include polyphthalic acid phthalamide (PPA), polycarbonate resin, polyphenylene sulfide resin, polybutylene terephthalate resin, and polyamine. Resin, liquid crystal polymer, epoxy resin, acrylic resin, polyoxynoxy resin, modified polyoxynoxy resin, ABS resin, BT resin, ceramics, and the like. Among these, polybutylphthalate (PPA) is particularly preferred from the viewpoint of heat resistance, strength, and cost. Further, it is preferable to mix a white pigment such as barium titanate, titanium oxide, zinc oxide or barium sulfate on the package substrate 8 to improve the reflectance of light.

接著,被覆LED晶片1之密封材5,係使來自上述LED晶片1之光效率良好地穿透至外部,而且保護上述LED晶片1或接合引線4等免受外力、塵埃等影響者。作為密封材5,係使用本發明之組成物之硬化物。 密封材5亦可含有螢光物質或光擴散構件等。 Then, the sealing material 5 of the LED wafer 1 is coated so that the light from the LED chip 1 is efficiently penetrated to the outside, and the LED chip 1 or the bonding leads 4 are protected from external force, dust, or the like. As the sealing material 5, a cured product of the composition of the present invention is used. The sealing material 5 may also contain a fluorescent substance, a light diffusing member, or the like.

如前述般,本發明之光半導體密封用硬化性組成物,其硬化物具有良好的耐衝擊性,因此使用該組成物來密封光半導體元件之本發明之光半導體裝置10、10’,可在不損傷其構件之下來製造。 As described above, the curable composition for sealing an optical semiconductor of the present invention has excellent impact resistance, and therefore the optical semiconductor device 10, 10' of the present invention for sealing the optical semiconductor element using the composition can be It is manufactured without damaging its components.

本發明之光半導體密封用硬化性組成物,可賦予耐衝擊性及耐龜裂性優良,且具有低氣體穿透性之硬化物,因此藉由該硬化物密封光半導體元件而得的光半導體裝置,例如在其製造步驟中使用碗型振動零件給料器排列為一定方向/姿勢時,即使該光半導體裝置彼此衝撞,亦不易產生接合引線的斷線等之構件的損傷,因此可提高良率及生產性。又,即使進行溫度循環試驗,於硬化物亦不易產生龜裂,因此可提高信賴性。進一步地,即使於暴露於硫系氣體之環境下使用,硫系氣體亦不易穿透硬化物,因此可抑制明亮度之降低。 The curable composition for optical semiconductor sealing of the present invention is excellent in impact resistance and crack resistance, and has a low gas permeability and a cured product. Therefore, the optical semiconductor obtained by sealing the optical semiconductor element with the cured product is obtained. When the device is arranged in a certain direction/posture using the bowl-shaped vibrating part feeder in the manufacturing step, for example, even if the optical semiconductor devices collide with each other, damage to members such as disconnected wires of the bonding wires is less likely to occur, so that the yield can be improved. And productive. Further, even if the temperature cycle test is performed, cracks are less likely to occur in the cured product, so that reliability can be improved. Further, even if it is used in an environment exposed to a sulfur-based gas, the sulfur-based gas does not easily penetrate the cured product, so that the decrease in brightness can be suppressed.

又,本發明之光半導體密封用硬化性組成物,由硬化物所具有之上述般的特性來看,可適合使用作為用以保護LED之密封材。 Moreover, the curable composition for optical semiconductor sealing of the present invention can be suitably used as a sealing material for protecting an LED from the above-described characteristics of the cured product.

[實施例] [Examples]

以下,顯示實施例及比較例以具體地說明本發明,但本發明不受下述實施例限制。再者,黏度係表示以JIS K7117-1:1999規定之於23℃的測定值。 Hereinafter, the present invention will be specifically described by showing examples and comparative examples, but the present invention is not limited by the following examples. In addition, the viscosity is a measured value specified by JIS K7117-1:1999 at 23 °C.

(實施例1) (Example 1)

於下述式(27)所示之直鏈狀多氟化合物(黏度10,900mPa.s、乙烯基量0.0123莫耳/100g)100質量份中,依次添加鉑-二乙烯基四甲基二矽氧烷錯合物之甲苯溶液(鉑濃度0.5質量%)0.15質量份、1-乙炔基-1-羥基環己烷之60%甲苯溶液0.20質量份、下述式(28)所示之有機氫聚矽氧烷(SiH基量0.00109莫耳/g)11.3質量份、下述式(29)所示之環狀有機聚矽氧烷2.0質量份、下述式(30)所示之羧酸酐0.50質量份,混合至成為均勻。之後,藉由進行脫泡操作來配製組成物。 To 100 parts by mass of a linear polyfluoro compound (viscosity 10,900 mPa·s, vinyl group amount: 0.0123 mol/100 g) represented by the following formula (27), platinum-divinyltetramethyldifluorene is sequentially added. 0.15 parts by mass of a toluene solution of alkane complex (platinum concentration: 0.5% by mass), 0.20 parts by mass of a 60% toluene solution of 1-ethynyl-1-hydroxycyclohexane, and organic hydrogen polymerization represented by the following formula (28) 11.3 parts by mass of a siloxane (the amount of the SiH group is 0.00109 mol/g), 2.0 parts by mass of the cyclic organopolyoxane represented by the following formula (29), and 0.50 by mass of the carboxylic anhydride represented by the following formula (30). Mix and mix until uniform. Thereafter, the composition was prepared by performing a defoaming operation.

【化59】 【化59】

(實施例2) (Example 2)

於下述式(31)所示之直鏈狀多氟化合物(黏度4,010mPa.s、乙烯基量0.0299莫耳/100g)100質量份中,依次添加鉑-二乙烯基四甲基二矽氧烷錯合物之甲苯溶液(鉑濃度0.5質量%)0.15質量份、1-乙炔基-1-羥基環己烷之60%甲苯溶液0.20質量份、下述式(32)所示之含氟有機氫聚矽氧烷(SiH基量0.00190莫耳/g)15.7質量份、下述式(33)所示之環狀有機聚矽氧烷2.5質量份、下述式(34)所示之羧酸酐0.30質量份,混合至成為均勻。之後,藉由進行脫泡操作來配製組成物。 To 100 parts by mass of a linear polyfluoro compound (viscosity 4,010 mPa·s, vinyl group 0.0299 mol/100 g) represented by the following formula (31), platinum-divinyltetramethyl dioxane is sequentially added. 0.15 parts by mass of a toluene solution of alkane complex (platinum concentration: 0.5% by mass), 0.20 parts by mass of a 60% toluene solution of 1-ethynyl-1-hydroxycyclohexane, and a fluorine-containing organic compound represented by the following formula (32) Hydrogen polyoxyalkylene (SiH group amount: 0.0090 mol/g) 15.7 parts by mass, 2.5 parts by mass of a cyclic organopolyoxane represented by the following formula (33), and a carboxylic anhydride represented by the following formula (34) 0.30 parts by mass, mixed until homogeneous. Thereafter, the composition was prepared by performing a defoaming operation.

【化60】 【化60】

(實施例3) (Example 3)

於下述式(35)所示之直鏈狀多氟化合物(黏度4,150mPa.s、乙烯基量0.0603莫耳/100g)100質量份中,依次添加鉑-二乙烯基四甲基二矽氧烷錯合物之甲苯溶液(鉑濃度0.5質量%)0.15質量份、1-乙炔基-1-羥基環己烷之60%甲苯溶液0.20質量份、下述式(36)所示之有機氫聚矽氧烷(SiH基量0.00193莫耳/g)31.2質量份、下述式(37)所示之環狀有機聚矽氧烷3.0質量份、下述式(38)所示之羧酸酐0.40質量份,混合至成為均勻。之後,藉由進行脫泡操作來配製組成物。 To 100 parts by mass of a linear polyfluoro compound (viscosity: 4,150 mPa·s, a vinyl group of 0.0603 mol/100 g) represented by the following formula (35), platinum-divinyltetramethyldioxane is sequentially added. 0.15 parts by mass of a toluene solution of alkane complex (platinum concentration: 0.5% by mass), 0.20 parts by mass of a 60% toluene solution of 1-ethynyl-1-hydroxycyclohexane, and organic hydrogen polymerization represented by the following formula (36) 31.2 parts by mass of a siloxane (the amount of the SiH group is 0.00193 mol/g), 3.0 parts by mass of the cyclic organopolyoxane represented by the following formula (37), and a carboxylic acid anhydride of 0.40 by the following formula (38). Mix and mix until uniform. Thereafter, the composition was prepared by performing a defoaming operation.

【化63】 【化63】

(實施例4) (Example 4)

於下述式(39)所示之直鏈狀多氟化合物(黏度4,310mPa.s、乙烯基量0.0909莫耳/100g)100質量份中,依次添加鉑-二乙烯基四甲基二矽氧烷錯合物之甲苯溶液(鉑濃度0.5質量%)0.15質量份、1-乙炔基-1-羥基環己烷之60%甲苯溶液0.20質量份、下述式(40)所示之有機氫聚矽氧烷(SiH基量0.00196莫耳/g)46.4質量份、下述式(41)所示之環狀有機聚矽氧烷3.0質量份、下述式(42)所示之羧酸酐0.30質量份,混合至成為均勻。之後,藉由進行脫泡操作 來配製組成物。 To 100 parts by mass of a linear polyfluoro compound (viscosity of 4,310 mPa·s, a vinyl group of 0.0909 mol/100 g) represented by the following formula (39), platinum-divinyltetramethyl dioxane is sequentially added. 0.15 parts by mass of a toluene solution of alkane complex (platinum concentration: 0.5% by mass), 0.20 parts by mass of a 60% toluene solution of 1-ethynyl-1-hydroxycyclohexane, and organic hydrogen polymerization represented by the following formula (40) 46.4 parts by mass of a siloxane (the amount of SiH is 0.00196 mol/g), 3.0 parts by mass of the cyclic organopolyoxane represented by the following formula (41), and 0.30 mass of the carboxylic anhydride represented by the following formula (42). Mix and mix until uniform. After that, by performing a defoaming operation To formulate the composition.

(實施例5) (Example 5)

於上述式(31)所示之直鏈狀多氟化合物50.0質量份,依次添加鉑-二乙烯基四甲基二矽氧烷錯合物之甲苯溶液(鉑濃度0.5質量%)0.15質量份、1-乙炔基-1-羥基環己烷之60%甲苯溶液0.20質量份、上述式(35)所示之直鏈狀多氟化合物50.0質量份、下述式(45)所示之有機氫聚矽氧烷(SiH基量0.00150莫耳/g)30.1質量份、上述式(41)所示之環狀有機聚矽氧烷3.0質量份、上述式(42)所示之羧酸酐0.30質量份,混合至成為均勻。之後,藉由進行脫泡操作來配製組成物。 To 50.0 parts by mass of the linear polyfluoro compound represented by the above formula (31), 0.15 parts by mass of a toluene solution (platinum concentration: 0.5% by mass) of platinum-divinyltetramethyldioxane complex was sequentially added, 0.20 parts by mass of a 60% toluene solution of 1-ethynyl-1-hydroxycyclohexane, 50.0 parts by mass of a linear polyfluoro compound represented by the above formula (35), and an organic hydrogen group represented by the following formula (45) 30.1 parts by mass of a siloxane (the amount of the SiH group is 0.0150 mol/g), 3.0 parts by mass of the cyclic organopolyoxane represented by the above formula (41), and 0.30 parts by mass of the carboxylic anhydride represented by the above formula (42). Mix until it becomes homogeneous. Thereafter, the composition was prepared by performing a defoaming operation.

(實施例6) (Example 6)

於上述式(31)所示之直鏈狀多氟化合物25.0質量份中,依次添加鉑-二乙烯基四甲基二矽氧烷錯合物之甲苯溶液(鉑濃度0.5質量%)0.15質量份、1-乙炔基-1-羥基環己烷之60%甲苯溶液0.20質量份、上述式(39)所示之直鏈狀多氟化合物75.0質量份、上述式(32)所示之有機氫聚矽氧烷39.8質量份、上述式(41)所示之環狀有機聚矽氧烷3.0質量份、上述式(42)所示之羧酸酐0.30質量份,混合 至成為均勻。之後,藉由進行脫泡操作來配製組成物。 To 25.0 parts by mass of the linear polyfluoro compound represented by the above formula (31), a toluene solution (platinum concentration: 0.5% by mass) of platinum-divinyltetramethyldioxane complex was added in order of 0.15 parts by mass. 0.20 parts by mass of a 60% toluene solution of 1-ethynyl-1-hydroxycyclohexane, 75.0 parts by mass of a linear polyfluoro compound represented by the above formula (39), and an organic hydrogen group represented by the above formula (32) 39.8 parts by mass of a siloxane, 3.0 parts by mass of a cyclic organopolyoxane represented by the above formula (41), and 0.30 parts by mass of a carboxylic anhydride represented by the above formula (42), mixed To become even. Thereafter, the composition was prepared by performing a defoaming operation.

(實施例7) (Example 7)

於上述式(31)所示之直鏈狀多氟化合物100質量份中,依次添加鉑-二乙烯基四甲基二矽氧烷錯合物之甲苯溶液(鉑濃度0.5質量%)0.20質量份、1-乙炔基-1-羥基環己烷之60%甲苯溶液0.25質量份、上述式(32)所示之有機氫聚矽氧烷53.3質量份、上述式(33)所示之環狀有機聚矽氧烷3.5質量份、上述式(34)所示之羧酸酐0.50質量份、下述式(43)所示之環狀有機聚矽氧烷(乙烯基量0.357莫耳/100g)20.0質量份,混合至成為均勻。之後,藉由進行脫泡操作來配製組成物。 To 100 parts by mass of the linear polyfluoro compound represented by the above formula (31), a toluene solution (platinum concentration: 0.5% by mass) of 0.20 parts by mass of platinum-divinyltetramethyldioxane complex is sequentially added. 0.25 parts by mass of a 60% toluene solution of 1-ethynyl-1-hydroxycyclohexane, 53.3 parts by mass of an organic hydrogen polyoxyalkylene represented by the above formula (32), and a cyclic organic compound represented by the above formula (33) 3.5 parts by mass of polysiloxane, 0.50 parts by mass of the carboxylic acid anhydride represented by the above formula (34), and a cyclic organopolyoxane (vinyl group amount: 0.357 mol/100 g) 20.0 mass represented by the following formula (43) Mix and mix until uniform. Thereafter, the composition was prepared by performing a defoaming operation.

(實施例8) (Example 8)

於上述式(35)所示之直鏈狀多氟化合物100質量份中,依次添加鉑-二乙烯基四甲基二矽氧烷錯合物之甲苯 溶液(鉑濃度0.5質量%)0.20質量份、1-乙炔基-1-羥基環己烷之60%甲苯溶液0.25質量份、上述式(36)所示之有機氫聚矽氧烷89.7質量份、上述式(37)所示之環狀有機聚矽氧烷3.5質量份、上述式(38)所示之羧酸酐0.60質量份、下述式(44)所示之環狀有機聚矽氧烷(乙烯基量0.451莫耳/100g)25.0質量份,混合至成為均勻。之後,藉由進行脫泡操作來配製組成物。 To 100 parts by mass of the linear polyfluoro compound represented by the above formula (35), platinum-divinyltetramethyldioxane complex toluene is sequentially added. 0.20 parts by mass of a solution (platinum concentration: 0.5% by mass), 0.25 parts by mass of a 60% toluene solution of 1-ethynyl-1-hydroxycyclohexane, and 89.7 parts by mass of an organohydrogenpolyoxyalkylene represented by the above formula (36). 3.5 parts by mass of the cyclic organopolyoxane represented by the above formula (37), 0.60 parts by mass of the carboxylic anhydride represented by the above formula (38), and a cyclic organopolyoxane represented by the following formula (44) ( The amount of vinyl group was 0.451 mol/100 g) 25.0 parts by mass, and it was mixed until it became uniform. Thereafter, the composition was prepared by performing a defoaming operation.

(實施例9) (Example 9)

於上述式(39)所示之直鏈狀多氟化合物100質量份中,依次添加鉑-二乙烯基四甲基二矽氧烷錯合物之甲苯溶液(鉑濃度0.5質量%)0.25質量份、1-乙炔基-1-羥基環己烷之60%甲苯溶液0.30質量份、上述式(40)所示之有機氫聚矽氧烷115質量份、上述式(41)所示之環狀有機聚矽氧烷4.0質量份、上述式(42)所示之羧酸酐0.60質量份、上述式(44)所示之環狀有機聚矽氧烷30.0質量份,混合至成為均勻。之後,藉由進行脫泡操作來配製組成物。 To 100 parts by mass of the linear polyfluoro compound represented by the above formula (39), a toluene solution (platinum concentration: 0.5% by mass) of 0.25 parts by mass of platinum-divinyltetramethyldioxane complex is sequentially added. 0.30 parts by mass of a 60% toluene solution of 1-ethynyl-1-hydroxycyclohexane, 115 parts by mass of an organohydrogenpolyoxyalkylene represented by the above formula (40), and a cyclic organic compound represented by the above formula (41) 4.0 parts by mass of polysiloxane, 0.60 parts by mass of the carboxylic acid anhydride represented by the above formula (42), and 30.0 parts by mass of the cyclic organopolyoxane represented by the above formula (44) were mixed until uniform. Thereafter, the composition was prepared by performing a defoaming operation.

(實施例10) (Embodiment 10)

於上述式(31)所示之直鏈狀多氟化合物25.0質量份中,依次添加鉑-二乙烯基四甲基二矽氧烷錯合物之甲苯溶液(鉑濃度0.5質量%)0.25質量份、1-乙炔基-1-羥基環己烷之60%甲苯溶液0.30質量份、上述式(39)所示之直鏈狀多氟化合物75.0質量份、上述式(32)所示之有機氫聚矽氧烷111質量份、上述式(41)所示之環狀有機聚矽氧烷4.0質量份、上述式(34)所示之羧酸酐0.60質量份、上述式(44)所示之環狀有機聚矽氧烷30.0質量份,混合至成為均勻。之後,藉由進行脫泡操作來配製組成物。 To 25.0 parts by mass of the linear polyfluoro compound represented by the above formula (31), a toluene solution (platinum concentration: 0.5% by mass) of 0.25 parts by mass of platinum-divinyltetramethyldioxane complex was sequentially added. 0.30 parts by mass of a 60% toluene solution of 1-ethynyl-1-hydroxycyclohexane, 75.0 parts by mass of a linear polyfluoro compound represented by the above formula (39), and an organic hydrogen group represented by the above formula (32) 111 parts by mass of the oxirane, 4.0 parts by mass of the cyclic organopolyoxane represented by the above formula (41), 0.60 parts by mass of the carboxylic anhydride represented by the above formula (34), and a ring represented by the above formula (44) 30.0 parts by mass of the organic polyoxyalkylene was mixed until it became homogeneous. Thereafter, the composition was prepared by performing a defoaming operation.

(比較例1) (Comparative Example 1)

除了於上述實施例2中,將上述式(32)所示之有機氫聚矽氧烷之添加量變更為128質量份,且添加上述式(43)所示之環狀有機聚矽氧烷60.0質量份以外,係與實施例2同樣地配製組成物。 In addition to the above-described Example 2, the amount of the organohydrogenpolyoxane shown in the above formula (32) was changed to 128 parts by mass, and the cyclic organopolyoxane 60.0 represented by the above formula (43) was added. A composition was prepared in the same manner as in Example 2 except for the mass portion.

(比較例2) (Comparative Example 2)

除了於上述實施例2中,將上述式(32)所示之有機氫聚矽氧烷變更為下述式(46)所示之有機氫聚矽氧烷(SiH基量0.00499莫耳/g)5.99質量份以外,係與實施例2同樣地配製組成物。 In addition to the above Example 2, the organohydrogen polyoxyalkylene represented by the above formula (32) was changed to an organohydrogenpolyoxyalkylene represented by the following formula (46) (the amount of SiH was 0.00499 mol/g). A composition was prepared in the same manner as in Example 2 except for 5.99 parts by mass.

【化69】 【化69】

(比較例3) (Comparative Example 3)

除了於上述實施例2中,將上述式(32)所示之有機氫聚矽氧烷變更為下述式(47)所示之有機氫聚矽氧烷(SiH基量0.00210莫耳/g)14.2質量份以外,係與實施例2同樣地配製組成物。 In addition to the above Example 2, the organohydrogen polyoxyalkylene represented by the above formula (32) was changed to an organohydrogenpolyoxyalkylene represented by the following formula (47) (the amount of SiH was 0.00210 mol/g). A composition was prepared in the same manner as in Example 2 except for 14.2 parts by mass.

(比較例4) (Comparative Example 4)

除了於上述實施例2中,將上述式(32)所示之有機氫 聚矽氧烷變更為上述式(46)所示之有機氫聚矽氧烷24.1質量份,且添加上述式(44)所示之環狀有機聚矽氧烷20.0質量份以外,係與實施例2同樣地配製組成物。 In addition to the above embodiment 2, the organic hydrogen represented by the above formula (32) The polyoxyalkylene is changed to 24.1 parts by mass of the organohydrogen polyoxyalkylene represented by the above formula (46), and 20.0 parts by mass of the cyclic organopolyoxane represented by the above formula (44) is added, and examples and examples are given. 2 The composition was prepared in the same manner.

(比較例5) (Comparative Example 5)

除了於上述實施例2中,將上述式(32)所示之有機氫聚矽氧烷變更為上述式(47)所示之有機氫聚矽氧烷57.2質量份,且添加上述式(44)所示之環狀有機聚矽氧烷20.0質量份以外,係與實施例2同樣地配製組成物。 In addition to the above Example 2, the organic hydrogen polyoxyalkylene represented by the above formula (32) was changed to 57.2 parts by mass of the organohydrogen polyoxyalkylene represented by the above formula (47), and the above formula (44) was added. A composition was prepared in the same manner as in Example 2 except that 20.0 parts by mass of the cyclic organopolyoxane shown was used.

針對各組成物進行以下項目之評估。再者,硬化條件係150℃×5小時。結果歸納示於表1、表2。 The following items were evaluated for each composition. Further, the curing conditions were 150 ° C × 5 hours. The results are summarized in Tables 1 and 2.

1.組成物之黏度:根據JIS K7117-1:1999於23℃測定。 1. Viscosity of composition: Measured at 23 ° C according to JIS K7117-1:1999.

2.硬度:製作2mm厚之薄片狀硬化物,根據JIS K6253-3:2012來測定。 2. Hardness: A sheet-like cured product having a thickness of 2 mm was produced and measured in accordance with JIS K6253-3:2012.

3.折射率:製作2mm厚之薄片狀硬化物,使用多波長阿貝折射計DR-M2/1550(Atago股份有限公司製)測定於25℃、589nm(鈉之D線)之折射率。 3. Refractive index: A sheet-like cured product having a thickness of 2 mm was produced, and the refractive index at 25 ° C and 589 nm (D line of sodium) was measured using a multi-wavelength Abbe refractometer DR-M2/1550 (manufactured by Atago Co., Ltd.).

4.水蒸氣穿透率:製作1mm厚之薄片狀硬化物,使用根據JIS K7129:2008之Lyssy公司製L80-5000型水蒸氣穿透度計來測定。再者,測定溫度為40℃、測定所使用之該硬化物的面積為50cm24. Water Vapor Transmission Rate: A sheet-like cured product having a thickness of 1 mm was prepared and measured using a water vapor permeability meter of L80-5000 manufactured by Lyssy Co., Ltd. according to JIS K7129:2008. Further, the measurement temperature was 40 ° C, and the area of the cured product used for the measurement was 50 cm 2 .

5.硬化物之耐衝擊性:於具備與圖2之形態相同構成的光半導體裝置中,為了形成密封材5,將上述所 得之組成物,以浸漬LED晶片1的方式,注入於凹部8’,於150℃加熱5小時,藉以製作將LED晶片1以該組成物之硬化物密封的光半導體裝置。然後將該光半導體裝置1,000個設置於碗型振動零件給料器使其排列後,計數接合引線斷線的個數。 5. Impact resistance of the cured product: In the optical semiconductor device having the same configuration as that of the embodiment of Fig. 2, in order to form the sealing material 5, the above-mentioned The obtained composition was poured into the concave portion 8' so as to be immersed in the recessed portion 8', and heated at 150 ° C for 5 hours to prepare an optical semiconductor device in which the LED wafer 1 was sealed with a cured product of the composition. Then, 1,000 of the optical semiconductor devices were placed in a bowl-shaped vibrating part feeder and arranged, and the number of broken leads of the bonding leads was counted.

6.硬化物之耐龜裂性:使用以與上述相同方式製作的光半導體裝置10個,於-40℃下放置10分鐘,接著於100℃下放置10分鐘,以其為1循環,重複其500循環來進行溫度循環試驗。試驗後,以目視觀察硬化物之外觀,計數龜裂發生的個數。 6. Crack resistance of cured product: 10 optical semiconductor devices fabricated in the same manner as described above were placed at -40 ° C for 10 minutes, and then placed at 100 ° C for 10 minutes, which was repeated for 1 cycle. 500 cycles were used for the temperature cycle test. After the test, the appearance of the cured product was visually observed, and the number of crack occurrences was counted.

7.硬化物之氣體穿透性:將以與上述相同方式製作的光半導體裝置,放置於100℃下10ppm之硫化氫氣體環境下100小時後,以目視確認於凹部8’之底面的銀之變色程度。 7. Gas permeability of the cured product: The optical semiconductor device fabricated in the same manner as described above was placed in a hydrogen sulfide gas atmosphere at 10 ° C for 10 hours at 100 ° C, and visually confirmed by silver on the bottom surface of the concave portion 8'. The degree of discoloration.

由表1及表2結果,可知使本發明之光半導體密封用硬化性組成物(實施例1~10)硬化而得的硬化物,相較於比較例1~5,具有良好的耐衝擊性、耐龜裂性及低氣體穿透性,因此未見接合引線之斷線或龜裂的發生,亦未見銀的變色。 As a result of the results of Tables 1 and 2, it is understood that the cured product obtained by curing the curable composition for optical semiconductor sealing of the present invention (Examples 1 to 10) has good impact resistance as compared with Comparative Examples 1 to 5. , crack resistance and low gas permeability, so no breakage or cracking of the bonding wire was observed, and no discoloration of silver was observed.

由上述結果,明顯可知若使用本發明之光半導體密封用硬化性組成物,則可得到耐衝擊性及耐龜裂性優良,且具有低氣體穿透性之硬化物,顯示了如此之光半導體密封用硬化性組成物,適於作為光半導體元件之密封材。 From the above results, it is apparent that when the curable composition for optical semiconductor sealing of the present invention is used, a cured product having excellent impact resistance and crack resistance and having low gas permeability can be obtained, and such an optical semiconductor is exhibited. The curable composition for sealing is suitable as a sealing material for an optical semiconductor element.

再者,本發明並不限定於上述實施形態。上述實施形態係為例示,具有與本發明之申請專利範圍記載的技術思想實質上相同的構成,發揮同樣作用效果者,不管何者均包含於本發明之技術範圍。 Furthermore, the present invention is not limited to the above embodiment. The above-described embodiments are exemplified, and have substantially the same configuration as the technical idea described in the patent application scope of the present invention, and the same effects are exhibited, and any of them are included in the technical scope of the present invention.

1‧‧‧LED晶片 1‧‧‧LED chip

2‧‧‧第一引線框 2‧‧‧First lead frame

2a‧‧‧第一引線框之前端部 2a‧‧‧The front end of the first lead frame

2b‧‧‧第一引線框之端子部 2b‧‧‧ Terminal part of the first lead frame

2’‧‧‧凹部 2'‧‧‧ recess

3‧‧‧第二引線框 3‧‧‧Second lead frame

3a‧‧‧第二引線框之前端部 3a‧‧‧ front end of the second lead frame

3b‧‧‧第二引線框之端子部 3b‧‧‧ Terminal part of the second lead frame

4‧‧‧接合引線 4‧‧‧ Bonding leads

5‧‧‧密封材 5‧‧‧ Sealing material

6‧‧‧凸透鏡部 6‧‧‧ convex lens

7‧‧‧透光性樹脂部 7‧‧‧Transparent resin department

10‧‧‧光半導體裝置 10‧‧‧Optical semiconductor devices

Claims (15)

一種光半導體密封用硬化性組成物,其係含有(A)1分子中具有2個以上之烯基,於主鏈中進一步具有全氟聚醚構造,且烯基含量為0.0050~0.200mol/100g之直鏈狀多氟化合物:100質量份、(B)下述通式(1)表示之有機氫聚矽氧烷、 (式中,a為3~10之整數,A為包含全氟伸烷基、全氟氧基伸烷基、或其兩者之2價有機基,D係互相獨立地為可含有矽原子、氧原子或氮原子之取代或非取代的2價烴基,R1係互相獨立地為取代或非取代之1價烴基,R2係互相獨立地為氫原子、或隔著可含有矽原子、氧原子或氮原子之2價烴基而與矽原子鍵結之1價全氟烷基或1價全氟氧基烷基,R2當中之三個以上為氫原子);(C)鉑族金屬系觸媒:以鉑族金屬原子換算為0.1~500ppm、(D)下述通式(2)表示之環狀有機聚矽氧烷:0.10~10.0質量份、【化2】 (式中,b為1~6之整數,c為1~4之整數,d為1~4之整數,b+c+d為4~10之整數,R3係互相獨立地為取代或非取代之1價烴基,E係互相獨立地為隔著可含有矽原子、氧原子或氮原子之2價烴基而與矽原子鍵結之1價全氟烷基或1價全氟氧基烷基,G係互相獨立地為隔著可含有氧原子之2價烴基而與矽原子鍵結之環氧基或三烷氧基矽烷基或其兩者,惟,-(SiO)(H)R3-、-(SiO)(E)R3-、及-(SiO)(G)R3-之鍵結順序並無限定);(E)羧酸酐:0.010~10.0質量份之光半導體密封用硬化性組成物,其特徵在於,前述(B)成分之摻合量,相對於該組成物中所含有的烯基1莫耳而言,係直接鍵結於前述(B)成分中之矽原子的氫原子成為0.50~2.0莫耳之量,且使該光半導體密封用硬化性組成物硬化而得到之硬化物的硬度,以JIS K6253-3:2012規定之A型橡膠硬度計係為30~90之值者。 A curable composition for sealing a photo-semiconductor comprising (A) one molecule having two or more alkenyl groups, further having a perfluoropolyether structure in the main chain, and an alkenyl group content of 0.0050 to 0.200 mol/100 g The linear polyfluorinated compound: 100 parts by mass, (B) an organohydrogen polyoxyalkylene represented by the following formula (1), (wherein, a is an integer of from 3 to 10, and A is a divalent organic group containing a perfluoroalkylene group, a perfluoroalkylalkylene group, or both thereof, and D is independently of each other and may contain a halogen atom, oxygen a substituted or unsubstituted divalent hydrocarbon group of an atom or a nitrogen atom, R 1 is a substituted or unsubstituted monovalent hydrocarbon group independently of each other, and R 2 is independently a hydrogen atom or may contain a halogen atom or an oxygen atom. Or a monovalent perfluoroalkyl group bonded to a ruthenium atom or a monovalent perfluoroalkyl group bonded to a ruthenium atom, and three or more of R 2 are a hydrogen atom; (C) a platinum group metal contact Medium: 0.1 to 500 ppm in terms of a platinum group metal atom, (D) a cyclic organopolyoxane represented by the following formula (2): 0.10 to 10.0 parts by mass, [Chemical 2] (wherein b is an integer from 1 to 6, c is an integer from 1 to 4, d is an integer from 1 to 4, b+c+d is an integer from 4 to 10, and R 3 is independently substituted or not The substituted monovalent hydrocarbon group, which is independently a monovalent perfluoroalkyl group or a monovalent perfluorooxyalkyl group bonded to a ruthenium atom via a divalent hydrocarbon group which may contain a halogen atom, an oxygen atom or a nitrogen atom. Further, G is an epoxy group or a trialkoxyalkyl group bonded to a halogen atom independently of each other via a divalent hydrocarbon group which may contain an oxygen atom, or both, but -(SiO)(H)R 3 -, - (SiO) (E) R 3 -, and - (SiO) (G) R 3 - bonding order is not limited); (E) carboxylic anhydride: 0.010 ~ 10.0 parts by mass of optical semiconductor sealing hardening And a blending amount of the component (B), which is directly bonded to the ruthenium atom in the component (B), relative to the alkenyl group 1 mole contained in the composition. The hardness of the cured product obtained by curing the curable composition for sealing an optical semiconductor seal is 0.50 to 2.0 mol, and the hardness of the A-type rubber according to JIS K6253-3:2012 is 30 to 90. The value of the person. 如請求項1之光半導體密封用硬化性組成物,其中進一步含有下述通式(3)表示之環狀有機聚矽氧烷0.10~50.0質量份,作為(F)成分,【化3】 (式中,e為1~4之整數,f為3~6之整數,e+f為4~10之整數,R4係互相獨立地為取代或非取代之1價烴基,J係互相獨立地為隔著可含有矽原子、氧原子或氮原子之2價烴基而與矽原子鍵結之1價全氟烷基或1價全氟氧基烷基,L係互相獨立地為直接鍵結於矽原子之烯基,惟,-(SiO)(J)R4-及-(SiO)(L)R4-之鍵結順序並無限定)。 The curable composition for sealing an optical semiconductor according to claim 1, which further comprises 0.10 to 50.0 parts by mass of the cyclic organopolyoxane represented by the following formula (3) as a component (F). (wherein e is an integer from 1 to 4, f is an integer from 3 to 6, e+f is an integer from 4 to 10, and R 4 is independently substituted or unsubstituted monovalent hydrocarbon group, and J is independent of each other The ground is a monovalent perfluoroalkyl group or a monovalent perfluoroalkyl group bonded to a ruthenium atom via a divalent hydrocarbon group which may contain a halogen atom, an oxygen atom or a nitrogen atom, and the L system is independently bonded directly to each other. In the alkenyl group of the ruthenium atom, the order of bonding of -(SiO)(J)R 4 - and -(SiO)(L)R 4 - is not limited). 如請求項1之光半導體密封用硬化性組成物,其中,前述(A)成分,係下述通式(4)表示之直鏈狀多氟化合物, (式中,R6及R7係互相獨立地為烯基、或取代或非取代之1價烴基,一者以上為烯基。R8係互相獨立地為氫原子、或取代或非取代之1價烴基,g及h係分別為1~150之整數,且g+h之平均值為2~300,i為0~6之整數)。 The curable composition for sealing an optical semiconductor according to claim 1, wherein the component (A) is a linear polyfluoro compound represented by the following formula (4). (wherein R 6 and R 7 are each independently an alkenyl group or a substituted or unsubstituted monovalent hydrocarbon group, and one or more of them are alkenyl groups. R 8 is independently a hydrogen atom, or a substituted or unsubstituted one. The monovalent hydrocarbon group, g and h are each an integer from 1 to 150, and the average value of g+h is 2 to 300, and i is an integer of 0 to 6). 如請求項1之光半導體密封用硬化性組成物,其中,前述(A)成分係選自由下述通式(5)、下述通式(6)、及下述通式(7)所成群組之1種以上的直鏈狀多氟化合物, (式中,R8係互相獨立地為氫原子、或取代或非取代之1價烴基,g及h係分別為1~150之整數,且g+h之平均值為2~300,i為0~6之整數,R9係互相獨立地為取代或非取代之1價烴基); (式中,R8、R9、g、h、及i係與上述相同); (式中,R8、g、h、及i係與上述相同)。 The curable composition for sealing an optical semiconductor according to claim 1, wherein the component (A) is selected from the group consisting of the following general formula (5), the following general formula (6), and the following general formula (7); One or more linear polyfluoro compounds in the group, (wherein R 8 is independently a hydrogen atom or a substituted or unsubstituted monovalent hydrocarbon group, and g and h are each an integer of from 1 to 150, and an average value of g + h is from 2 to 300, i is An integer of 0 to 6, wherein R 9 is independently a substituted or unsubstituted monovalent hydrocarbon group; (wherein R 8 , R 9 , g, h, and i are the same as described above); (wherein R 8 , g, h, and i are the same as described above). 如請求項1之光半導體密封用硬化性組成物,其中,前述(B)成分之A中所含有的全氟氧基伸烷基,係含有1~500個下述通式(8)表示之重複單位之基,-Ce’F2e’O- (8) (式中,e’係每單位獨立地為1~6之整數)。 The curable composition for sealing an optical semiconductor according to claim 1, wherein the perfluoroalkylalkylene group contained in the component (B) contains 1 to 500 repeats represented by the following formula (8). The basis of the unit, -C e' F 2e' O- (8) (wherein e' is an integer of 1 to 6 per unit independently). 如請求項1之光半導體密封用硬化性組成物,其中,前述(B)成分之A,係選自由下述通式(9)、下述通式(10)、及下述通式(11)所成群組之基, (式中,R10係互相獨立地為氟原子或CF3基,j為1~4之整數,k及n各自為0~200之整數,k+n之平均值為0~400,l為2~6之整數,又,各重複單位之鍵結順序並無限定); (式中,p為1~200之整數,j係與上述相同); (式中,R10、j、k、及n係與上述相同,又,各重複單位之鍵結順序並無限定)。 The curable composition for sealing an optical semiconductor according to claim 1, wherein the component (B) is selected from the group consisting of the following general formula (9), the following general formula (10), and the following general formula (11). ) the basis of the group, (wherein R 10 is independently a fluorine atom or a CF 3 group, j is an integer of 1 to 4, and k and n are each an integer of 0 to 200, and an average value of k + n is 0 to 400, and l is An integer from 2 to 6, in addition, the order of bonding of each repeating unit is not limited); (where p is an integer from 1 to 200, and j is the same as above); (In the formula, R 10 , j, k, and n are the same as described above, and the order of bonding of each repeating unit is not limited). 如請求項1之光半導體密封用硬化性組成物,其中,前述(E)成分係選自由下述通式(12)及下述通式(13)所成群組之羧酸酐,【化11】 (式中,q為1~6之整數、r為1~4之整數、s為1~4之整數、q+r+s為4~10之整數,R11係互相獨立地為取代或非取代之1價烴基,M係互相獨立地為隔著可含有矽原子、氧原子或氮原子之2價烴基而與矽原子鍵結之1價全氟烷基或1價全氟氧基烷基,Q係互相獨立地為隔著2價烴基而與矽原子鍵結之環狀羧酸酐殘基,惟,-(SiO)(H)R11-、-(SiO)(M)R11-及-(SiO)(Q)R11-之鍵結順序並無限定); (式中,R11、M、及Q係與上述相同,t為1~3之整數、u為0~2之整數、t+u為3)。 The curable composition for sealing an optical semiconductor according to claim 1, wherein the component (E) is selected from the group consisting of carboxylic anhydrides of the following formula (12) and the following formula (13); 】 (wherein q is an integer from 1 to 6, r is an integer from 1 to 4, s is an integer from 1 to 4, q+r+s is an integer from 4 to 10, and R 11 is independently substituted or not The substituted monovalent hydrocarbon group, which is independently a monovalent perfluoroalkyl group or a monovalent perfluorooxyalkyl group bonded to a ruthenium atom via a divalent hydrocarbon group which may contain a halogen atom, an oxygen atom or a nitrogen atom. , Q is independently a cyclic carboxylic anhydride residue bonded to a ruthenium atom via a divalent hydrocarbon group, but -(SiO)(H)R 11 -, -(SiO)(M)R 11 - and - (SiO) (Q) R 11 - bonding order is not limited); (wherein R 11 , M, and Q are the same as described above, t is an integer of 1 to 3, u is an integer of 0 to 2, and t + u is 3). 如請求項1之光半導體密封用硬化性組成物,其中,上述通式(1)中之R2及上述通式(2)中之E中所含有的1價全氟烷基或1價全氟氧基烷基,係互相獨立地為下述通式(14)或通式(15)表示之基,CvF2v+1- (14) (式中,v為1~10之整數); (式中,w為1~10之整數)。 The curable composition for sealing an optical semiconductor according to claim 1, wherein the monovalent perfluoroalkyl group or the monovalent group contained in R 2 in the above formula (1) and E in the above formula (2) The fluorooxyalkyl group is a group represented by the following formula (14) or formula (15) independently of each other, and C v F 2v+1 - (14) (wherein v is an integer of 1 to 10) ; (where w is an integer from 1 to 10). 如請求項2之光半導體密封用硬化性組成物,其中,上述通式(3)中之J中所含有的1價全氟烷基或1價全氟氧基烷基,係互相獨立地為下述通式(14)或通式(15)表示之基,CvF2v+1- (14)(式中,v為1~10之整數); (式中,w為1~10之整數)。 The curable composition for sealing an optical semiconductor according to claim 2, wherein the monovalent perfluoroalkyl group or the monovalent perfluorooxyalkyl group contained in J in the above formula (3) is independently of each other a group represented by the following formula (14) or formula (15), C v F 2v+1 - (14) (wherein v is an integer of 1 to 10); (where w is an integer from 1 to 10). 如請求項7之光半導體密封用硬化性組成物,其中,上述通式(12)中之M中所含有的1價全氟烷基或1價全氟氧基烷基,係互相獨立地為下述通式(14)或通式(15)表示之基,CvF2v+1- (14)(式中,v為1~10之整數);【化13】 (式中,w為1~10之整數)。 The curable composition for sealing an optical semiconductor according to claim 7, wherein the monovalent perfluoroalkyl group or the monovalent perfluorooxyalkyl group contained in M in the above formula (12) is independently of each other a group represented by the following formula (14) or formula (15), C v F 2v+1 - (14) (wherein v is an integer of 1 to 10); (where w is an integer from 1 to 10). 如請求項1之光半導體密封用硬化性組成物,其中,使前述光半導體密封用硬化性組成物硬化而得到之1mm厚之硬化物的水蒸氣穿透率,為15.0g/m2.day以下。 The curable composition for sealing an optical semiconductor according to claim 1, wherein the cured product having a thickness of 1 mm obtained by curing the curable composition for optical semiconductor sealing has a water vapor transmission rate of 15.0 g/m 2 . Below day. 如請求項1之光半導體密封用硬化性組成物,其中,前述光半導體密封用硬化性組成物之於JIS K7117-1:1999所規定之於23℃的黏度,為50.0~50,000mPa.s。 The curable composition for sealing an optical semiconductor according to claim 1, wherein the curable composition for optical semiconductor sealing has a viscosity at 23 ° C as defined in JIS K7117-1:1999, and is 50.0 to 50,000 mPa. s. 如請求項1至請求項12中任一項之光半導體密封用硬化性組成物,其中,使前述光半導體密封用硬化性組成物硬化而得到之硬化物於25℃、589nm(鈉之D線)之折射率為1.30以上且未達1.40。 The curable composition for sealing an optical semiconductor according to any one of Claims 1 to 12, wherein the cured product obtained by curing the curable composition for optical semiconductor sealing is cured at 25 ° C and 589 nm (D line of sodium) The refractive index is 1.30 or more and less than 1.40. 一種光半導體裝置,其特徵為具有光半導體元件、與用以密封該光半導體元件之使如請求項1至請求項13中任一項之光半導體密封用硬化性組成物硬化而得到之硬化物。 An optical semiconductor device characterized by having an optical semiconductor element and a cured product obtained by curing the curable composition for sealing an optical semiconductor according to any one of claims 1 to 13 in order to seal the optical semiconductor element . 如請求項14之光半導體裝置,其中,前述光半導體元件為發光二極體。 The optical semiconductor device of claim 14, wherein the optical semiconductor component is a light emitting diode.
TW103137438A 2013-10-30 2014-10-29 Curable composition for optical semiconductor sealing and optical semiconductor device using the same TWI638040B (en)

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KR102255081B1 (en) * 2016-12-30 2021-05-21 엘켐 실리콘즈 상하이 컴퍼니 리미티드 Curable silicone composition
CN114269874B (en) * 2019-08-21 2024-03-08 信越化学工业株式会社 Curable fluoropolyether adhesive composition and optical member

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