TW201521871A - Photocatalytic coating and method of making same - Google Patents

Photocatalytic coating and method of making same Download PDF

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TW201521871A
TW201521871A TW103138246A TW103138246A TW201521871A TW 201521871 A TW201521871 A TW 201521871A TW 103138246 A TW103138246 A TW 103138246A TW 103138246 A TW103138246 A TW 103138246A TW 201521871 A TW201521871 A TW 201521871A
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photocatalytic
binder
substrate
resin
photocatalytic material
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TW103138246A
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Chinese (zh)
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Guang Pan
Tao Gu
Ekambaram Sambandan
Brett T Harding
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Nitto Denko Corp
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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01JCHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J23/00Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00
    • B01J23/70Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00 of the iron group metals or copper
    • B01J23/72Copper
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01JCHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J21/00Catalysts comprising the elements, oxides, or hydroxides of magnesium, boron, aluminium, carbon, silicon, titanium, zirconium, or hafnium
    • B01J21/06Silicon, titanium, zirconium or hafnium; Oxides or hydroxides thereof
    • B01J21/063Titanium; Oxides or hydroxides thereof
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01JCHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J23/00Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00
    • B01J23/70Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00 of the iron group metals or copper
    • B01J23/76Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00 of the iron group metals or copper combined with metals, oxides or hydroxides provided for in groups B01J23/02 - B01J23/36
    • B01J23/835Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00 of the iron group metals or copper combined with metals, oxides or hydroxides provided for in groups B01J23/02 - B01J23/36 with germanium, tin or lead
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01JCHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J27/00Catalysts comprising the elements or compounds of halogens, sulfur, selenium, tellurium, phosphorus or nitrogen; Catalysts comprising carbon compounds
    • B01J27/20Carbon compounds
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01JCHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J27/00Catalysts comprising the elements or compounds of halogens, sulfur, selenium, tellurium, phosphorus or nitrogen; Catalysts comprising carbon compounds
    • B01J27/24Nitrogen compounds
    • B01J35/39
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01JCHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J37/00Processes, in general, for preparing catalysts; Processes, in general, for activation of catalysts
    • B01J37/02Impregnation, coating or precipitation
    • B01J37/0215Coating
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01JCHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J37/00Processes, in general, for preparing catalysts; Processes, in general, for activation of catalysts
    • B01J37/02Impregnation, coating or precipitation
    • B01J37/0215Coating
    • B01J37/0219Coating the coating containing organic compounds
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J7/00Chemical treatment or coating of shaped articles made of macromolecular substances
    • C08J7/04Coating
    • C08J7/0427Coating with only one layer of a composition containing a polymer binder
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J7/00Chemical treatment or coating of shaped articles made of macromolecular substances
    • C08J7/04Coating
    • C08J7/043Improving the adhesiveness of the coatings per se, e.g. forming primers
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J7/00Chemical treatment or coating of shaped articles made of macromolecular substances
    • C08J7/04Coating
    • C08J7/046Forming abrasion-resistant coatings; Forming surface-hardening coatings
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J7/00Chemical treatment or coating of shaped articles made of macromolecular substances
    • C08J7/04Coating
    • C08J7/056Forming hydrophilic coatings
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J7/00Chemical treatment or coating of shaped articles made of macromolecular substances
    • C08J7/12Chemical modification
    • C08J7/123Treatment by wave energy or particle radiation
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D175/00Coating compositions based on polyureas or polyurethanes; Coating compositions based on derivatives of such polymers
    • C09D175/04Polyurethanes
    • C09D175/14Polyurethanes having carbon-to-carbon unsaturated bonds
    • C09D175/16Polyurethanes having carbon-to-carbon unsaturated bonds having terminal carbon-to-carbon unsaturated bonds
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D5/00Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced; Filling pastes
    • C09D5/16Antifouling paints; Underwater paints
    • C09D5/1687Use of special additives
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D7/00Features of coating compositions, not provided for in group C09D5/00; Processes for incorporating ingredients in coating compositions
    • C09D7/40Additives
    • C09D7/60Additives non-macromolecular
    • C09D7/61Additives non-macromolecular inorganic
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J2367/00Characterised by the use of polyesters obtained by reactions forming a carboxylic ester link in the main chain; Derivatives of such polymers
    • C08J2367/02Polyesters derived from dicarboxylic acids and dihydroxy compounds
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J2475/00Characterised by the use of polyureas or polyurethanes; Derivatives of such polymers
    • C08J2475/04Polyurethanes
    • C08J2475/14Polyurethanes having carbon-to-carbon unsaturated bonds
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K3/00Use of inorganic substances as compounding ingredients
    • C08K3/18Oxygen-containing compounds, e.g. metal carbonyls
    • C08K3/20Oxides; Hydroxides
    • C08K3/22Oxides; Hydroxides of metals
    • C08K2003/2237Oxides; Hydroxides of metals of titanium
    • C08K2003/2241Titanium dioxide
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K3/00Use of inorganic substances as compounding ingredients
    • C08K3/18Oxygen-containing compounds, e.g. metal carbonyls
    • C08K3/20Oxides; Hydroxides
    • C08K3/22Oxides; Hydroxides of metals
    • C08K2003/2248Oxides; Hydroxides of metals of copper

Abstract

The present invention is aimed at improving the adhesion of a photocatalytic material to a substrate. An embodiment of the present invention relates to a method for making a photocatalytic element comprising: providing a suspension comprising a binder and a photocatalytic material, wherein the weight ratio of the binder to the photocatalytic material is about 0.5 to 2.0 parts binder to about 1 part photocatalytic material; and applying the suspension to a substrate surface.

Description

光催化塗層及其製造方法 Photocatalytic coating and method of manufacturing same

一些實施例係關於用於生產具備含有無機粒子之光催化薄膜之基板的製程。 Some embodiments relate to a process for producing a substrate having a photocatalytic film containing inorganic particles.

可見光活化之光催化劑可用於自動清潔、空氣及水純化及通常不具有任何部署後不可再生能量消耗的許多其他令人感興趣應用。此係因為光催化劑能夠使用在環境中可獲得之光(如太陽輻射或室內及戶外光照)來分解污染物(如染料、揮發性有機化合物及NOx)。隨著對無UV室內光照(如LED及OLED)之預期快速採用,尋找在室內應用(例如,在清潔家庭、公共及商業空間中、尤其在如飛機、公共建築物等之受限制區域中的室內空氣中)中部署可見光活化之光催化劑的方法係必不可少的。此外,抗菌表面及自動清潔材料可另外在食品服務、運輸、健康照護及招待(hospitality)部門中具有廣泛應用性。 Visible light activated photocatalysts can be used in automated cleaning, air and water purification, and many other interesting applications that typically do not have any non-renewable energy consumption after deployment. This system can be used as a photocatalyst of the available light in the environment (e.g., solar radiation, and indoor or outdoor light) to decompose pollutants (such as dyes, volatile organic compounds and NO x). With the rapid adoption of anti-UV indoor lighting (such as LEDs and OLEDs), look for indoor applications (eg, in clean homes, public and commercial spaces, especially in restricted areas such as airplanes, public buildings, etc.) A method of deploying a visible light activated photocatalyst in indoor air is essential. In addition, antimicrobial surfaces and automatic cleaning materials can be widely used in food service, transportation, health care and hospitality sectors.

已提議各種方法用來固定氧化鈦。參看(例如)專利文獻1至5。因此存在將氧化鈦貼附至基板表面之需要。 Various methods have been proposed for fixing titanium oxide. See, for example, Patent Documents 1 to 5. There is therefore a need to attach titanium oxide to the surface of the substrate.

引用清單 Reference list 專利文獻 Patent literature

PTL1:美國專利第5,897,958號 PTL 1: US Patent No. 5,897,958

PTL2:美國專利第6,228,480號 PTL2: US Patent No. 6,228,480

PTL3:美國專利第6,407,033號 PTL3: US Patent No. 6,407,033

PTL4:美國專利第7,510,595號 PTL4: US Patent No. 7,510,595

PTL5:美國再頒發專利第RE38,850號 PTL5: US Reissue Patent No. RE38, 850

本發明係針對改良光催化材料對基板之黏附。 The present invention is directed to improving the adhesion of a photocatalytic material to a substrate.

即,本發明之一些實施例係關於用於製造光催化元件之方法,其包含:提供包含黏合劑及光催化材料之懸浮液,其中該黏合劑對該光催化材料之重量比為約0.5至2.0份黏合劑對約1份光催化材料;及將該懸浮液應用於基板表面。 That is, some embodiments of the present invention relate to a method for fabricating a photocatalytic element, comprising: providing a suspension comprising a binder and a photocatalytic material, wherein the weight ratio of the binder to the photocatalytic material is about 0.5 to 2.0 parts of the adhesive to about 1 part of the photocatalytic material; and the suspension is applied to the surface of the substrate.

在一些實施例中,將該懸浮液應用於基板可進一步包含將該懸浮液澆注於該基板上。 In some embodiments, applying the suspension to the substrate can further comprise casting the suspension onto the substrate.

在一些實施例中,將該懸浮液應用於基板可進一步包含以每分鐘約500轉至每分鐘約3000轉歷時約5秒至約30秒之間將該懸浮液旋塗於該基板上。 In some embodiments, applying the suspension to the substrate can further comprise spin coating the suspension onto the substrate at between about 500 revolutions per minute to about 3000 revolutions per minute for between about 5 seconds and about 30 seconds.

在一些實施例中,該方法可進一步包含對該基板表面進行表面處理。 In some embodiments, the method can further comprise surface treating the surface of the substrate.

在一些實施例中,該方法可進一步包含將矽烷偶合劑應用於該基板表面。該矽烷偶合劑可為胺基丙基三乙氧基矽烷。 In some embodiments, the method can further comprise applying a decane coupling agent to the surface of the substrate. The decane coupling agent may be aminopropyltriethoxydecane.

在一些實施例中,該方法可進一步包含將黏合劑催化劑材料添加至該懸浮液。該黏合劑催化劑材料可為D25。 In some embodiments, the method can further comprise adding a binder catalyst material to the suspension. The binder catalyst material can be D25.

在一些實施例中,提供該懸浮液可進一步包含將聚矽氧樹脂溶解於丙二醇溶劑中。該丙二醇溶劑可為丙二醇甲醚乙酸酯。另外,該聚矽氧樹脂可為聚矽氧醇酸樹脂、聚矽氧環氧樹脂、聚矽氧丙烯酸系樹脂或聚矽氧聚酯樹脂。此外,該聚矽氧樹脂可為聚矽氧聚酯樹脂。此外,該聚矽氧聚酯樹脂可為KR5230。 In some embodiments, providing the suspension can further comprise dissolving the polyoxynoxy resin in a propylene glycol solvent. The propylene glycol solvent may be propylene glycol methyl ether acetate. Further, the polyoxynoxy resin may be a polyoxyl alkyd resin, a polyoxyl epoxy resin, a polyoxypropylene acrylic resin or a polyoxyethylene polyester resin. Further, the polyoxynoxy resin may be a polyoxymethylene polyester resin. Further, the polyoxyl polyester resin may be KR5230.

在一些實施例中,該光催化材料可包含填充銅氧化物之金屬氧 化物。 In some embodiments, the photocatalytic material may comprise a metal oxide filled with copper oxide. Compound.

在一些實施例中,該光催化材料可包含摻雜或未摻雜TiO2In some embodiments, the photocatalytic material can comprise doped or undoped TiO 2 .

在一些實施例中,提供一種用於製造光催化元件之方法,其包含:提供包含10%的KR5230及90%的丙二醇單甲醚乙酸酯(PGMEA)之溶液;以10:1(w/w)黏合劑:光催化材料之比將光催化性填充銅之多相氧化鈦材料粉末添加至該溶液;用電暈處理對PET表面進行預處理;及以約100至約2000rpm歷時約30至約60秒將該溶液旋塗於該經預處理之PET表面上。 In some embodiments, a method for making a photocatalytic element is provided, comprising: providing a solution comprising 10% KR5230 and 90% propylene glycol monomethyl ether acetate (PGMEA); at 10:1 (w/ w) binder: ratio of photocatalytic material to the solution of photocatalytic copper-filled multiphase titanium oxide material powder; pretreatment of the PET surface by corona treatment; and about 30 to about 2000 to about 2000 rpm The solution was spin coated onto the pretreated PET surface for about 60 seconds.

在一些實施例中,提供一種根據上述方法製造之光催化元件。 In some embodiments, a photocatalytic element fabricated in accordance with the above method is provided.

在一些實施例中,提供一種光催化元件,其包含聚矽氧聚酯樹脂及光催化材料,其中該樹脂與該光催化材料之重量比在約0.5至約2.0比約1之間(0.5至2份樹脂對1份光催化材料)。該聚矽氧聚酯樹脂可選自KR500、KR5230及KR5235。另外,該光催化材料可選自填充銅氧化物之多相氧化鈦、填充銅氧化物之Sn/C/N摻雜氧化鈦及未填充之摻雜氧化鈦。 In some embodiments, a photocatalytic element comprising a polyoxymethylene polyester resin and a photocatalytic material, wherein the weight ratio of the resin to the photocatalytic material is between about 0.5 and about 2.0 to about 1 (0.5 to 2 parts resin to 1 part photocatalytic material). The polyoxyl polyester resin may be selected from the group consisting of KR500, KR5230, and KR5235. Further, the photocatalytic material may be selected from the group consisting of a multi-phase titanium oxide filled with a copper oxide, a Sn/C/N-doped titanium oxide filled with a copper oxide, and an unfilled titanium oxide doped.

此外,本發明之一些實施例係關於用於製造光催化元件之方法,其包含:提供包含黏合劑、光催化材料、光引發劑及有機溶劑的懸浮液,其中該黏合劑對該光催化材料之重量比為約1.0至20份黏合劑對約1份光催化材料;及將該懸浮液應用於基板表面。 Further, some embodiments of the present invention relate to a method for fabricating a photocatalytic element, comprising: providing a suspension comprising a binder, a photocatalytic material, a photoinitiator, and an organic solvent, wherein the binder is the photocatalytic material The weight ratio is from about 1.0 to 20 parts of binder to about 1 part of the photocatalytic material; and the suspension is applied to the surface of the substrate.

此外,本發明之一些實施例係關於用於製造光催化元件之方法,其包含:提供包含黏合劑、光催化材料、光引發劑及有機溶劑之溶液;提供包含黏合劑、光催化材料、光引發劑及有機溶劑的懸浮液,其中該懸浮液中的該黏合劑對該光催化材料之重量比為約1.0至 20份黏合劑對約1份光催化材料;將該溶液應用於基板表面以在該基板表面上形成介入層;及將該懸浮液應用於該基板表面上之該介入層。 Furthermore, some embodiments of the present invention relate to a method for fabricating a photocatalytic element, comprising: providing a solution comprising a binder, a photocatalytic material, a photoinitiator, and an organic solvent; providing a binder, a photocatalytic material, and a light a suspension of an initiator and an organic solvent, wherein the weight ratio of the binder to the photocatalytic material in the suspension is about 1.0 to 20 parts of the adhesive to about 1 part of the photocatalytic material; the solution is applied to the surface of the substrate to form an intervening layer on the surface of the substrate; and the suspension is applied to the intervening layer on the surface of the substrate.

在一些實施例中,將該懸浮液應用於基板可進一步包含將該懸浮液澆注於該基板上。 In some embodiments, applying the suspension to the substrate can further comprise casting the suspension onto the substrate.

在一些實施例中,該方法可進一步包含對該基板表面進行表面處理。該黏合劑可包含紫外線可固化胺基甲酸酯樹脂。另外,該紫外線可固化胺基甲酸酯樹脂可包含丙烯酸胺基甲酸酯樹脂。 In some embodiments, the method can further comprise surface treating the surface of the substrate. The binder may comprise an ultraviolet curable urethane resin. Further, the ultraviolet curable urethane resin may contain an urethane urethane resin.

在一些實施例中,該有機溶劑可為C1-C7酮。 In some embodiments, the organic solvent can be a C 1 -C 7 ketone.

在一些實施例中,該有機溶劑可為C1-C7醇。 In some embodiments, the organic solvent can be a C 1 -C 7 alcohol.

在一些實施例中,該有機溶劑可選自環戊酮、丙二醇單甲醚乙酸酯(PGMEA)、N-甲基吡咯啶酮(NMP)、甲基乙基酮(MEK)、甲苯、乙酸乙酯及乙酸丁酯。 In some embodiments, the organic solvent may be selected from the group consisting of cyclopentanone, propylene glycol monomethyl ether acetate (PGMEA), N-methylpyrrolidone (NMP), methyl ethyl ketone (MEK), toluene, acetic acid. Ethyl ester and butyl acetate.

在一些實施例中,該懸浮液可進一步包含分散劑。該分散劑可選自陽離子分散劑、陰離子分散劑及非離子分散劑。 In some embodiments, the suspension may further comprise a dispersing agent. The dispersant may be selected from the group consisting of cationic dispersants, anionic dispersants, and nonionic dispersants.

在一些實施例中,該光引發劑可選自IRGACURE 907及IRGACURE 2022。 In some embodiments, the photoinitiator can be selected from the group consisting of IRGACURE 907 and IRGACURE 2022.

在一些實施例中,該光催化材料可包含填充銅氧化物之金屬氧化物。 In some embodiments, the photocatalytic material can comprise a metal oxide filled with a copper oxide.

在一些實施例中,該光催化材料可包含摻雜或未摻雜TiO2In some embodiments, the photocatalytic material can comprise doped or undoped TiO 2 .

在一些實施例中,提供一種用於製造光催化元件之方法,其包含:提供包含10wt%的丙烯酸胺基甲酸酯樹脂、低於1.0wt%的光引發劑及90wt%的環戊酮之溶液;以5:1(w/w)黏合劑:光催化材料之比將光催化性填充銅之多相氧化鈦材料粉末添加至該溶液。用電暈處理對PET表面進行預處理;及將該懸浮液帶式澆注於該經預處理之PET表面上。 In some embodiments, a method for fabricating a photocatalytic element is provided, comprising: providing 10% by weight of an urethane acrylate resin, less than 1.0% by weight of a photoinitiator, and 90% by weight of cyclopentanone Solution; a photocatalytic copper-filled heterogeneous titanium oxide material powder is added to the solution at a ratio of 5:1 (w/w) binder:photocatalytic material. The surface of the PET is pretreated by corona treatment; and the suspension is cast on the surface of the pretreated PET.

在一些實施例中,提供一種用於製造光催化元件之方法,其包含:提供包含10wt%的丙烯酸胺基甲酸酯樹脂、低於1.0wt%的光引發劑及90wt%的環戊酮之溶液;用電暈處理對PET表面進行預處理;將該溶液帶式澆注於該經預處理之PET表面上以在該PET表面上形成黏合劑塗層;以5:1(w/w)黏合劑:光催化材料之比將包含10wt%的丙烯酸胺基甲酸酯、低於1.0wt%的光引發劑、90wt%的環戊酮之溶液及光催化性填充銅之多相氧化鈦材料粉末提供至懸浮液;及將該懸浮液帶式澆注於該黏合劑塗層上。 In some embodiments, a method for fabricating a photocatalytic element is provided, comprising: providing 10% by weight of an urethane acrylate resin, less than 1.0% by weight of a photoinitiator, and 90% by weight of cyclopentanone Solution; pre-treating the PET surface by corona treatment; casting the solution onto the pretreated PET surface to form a binder coating on the PET surface; bonding at 5:1 (w/w) Agent: The ratio of photocatalytic material will comprise 10% by weight of urethane acrylate, less than 1.0% by weight of photoinitiator, 90% by weight of cyclopentanone solution and photocatalytic copper-filled multiphase titanium oxide material powder. Provided to the suspension; and the suspension is cast onto the adhesive coating.

在一些實施例中,提供一種根據上述方法製造之光催化元件。 In some embodiments, a photocatalytic element fabricated in accordance with the above method is provided.

在一些實施例中,提供一種包含丙烯酸胺基甲酸酯樹脂及光催化材料之光催化元件,其中該樹脂與該光催化材料之重量比在約0.5至約10比約1之間(0.5至10份丙烯酸胺基甲酸酯樹脂對1份光催化材料)、較佳在約1.5至約10比約1之間(1.5至10份丙烯酸胺基甲酸酯樹脂對1份光催化材料)。該丙烯酸胺基甲酸酯樹脂可選自UNIDIC 17806、EBECRYL 8701、EBECRYL 8301、EBECRYL 8405、OC-3021、OC-4021、OC-4122、HC-5619及UVHC3000。另外,該光催化材料可選自填充銅氧化物之多相氧化鈦、填充銅氧化物之Sn/C/N摻雜氧化鈦及未填充之摻雜氧化鈦。 In some embodiments, a photocatalytic element comprising an urethane urethane resin and a photocatalytic material is provided, wherein a weight ratio of the resin to the photocatalytic material is between about 0.5 and about 10 to about 1 (0.5 to 10 parts of the urethane acrylate resin to 1 part of the photocatalytic material), preferably about 1.5 to about 10 to about 1 (1.5 to 10 parts of the urethane acrylate resin to 1 part of the photocatalytic material). The urethane acrylate resin may be selected from the group consisting of UNIDIC 17806, EBECRYL 8701, EBECRYL 8301, EBECRYL 8405, OC-3021, OC-4021, OC-4122, HC-5619, and UVHC3000. Further, the photocatalytic material may be selected from the group consisting of a multi-phase titanium oxide filled with a copper oxide, a Sn/C/N-doped titanium oxide filled with a copper oxide, and an unfilled titanium oxide doped.

根據本發明,光催化材料對基板之黏附可得到改良。 According to the present invention, the adhesion of the photocatalytic material to the substrate can be improved.

8‧‧‧周圍環境 8‧‧‧ surroundings

10‧‧‧光催化元件 10‧‧‧Photocatalytic components

12‧‧‧基板 12‧‧‧Substrate

14‧‧‧光催化塗層 14‧‧‧Photocatalytic coating

14A‧‧‧第一光催化塗層 14A‧‧‧First Photocatalytic Coating

14B‧‧‧第二光催化塗層 14B‧‧‧Second photocatalytic coating

16‧‧‧底塗層 16‧‧‧Undercoat

18‧‧‧第一表面 18‧‧‧ first surface

20‧‧‧孔 20‧‧‧ hole

22‧‧‧表面 22‧‧‧ Surface

110‧‧‧光催化元件 110‧‧‧Photocatalytic components

112‧‧‧基板 112‧‧‧Substrate

114‧‧‧光催化塗層 114‧‧‧Photocatalytic coating

118‧‧‧基板之第一表面 118‧‧‧The first surface of the substrate

120‧‧‧光催化材料 120‧‧‧Photocatalytic materials

122‧‧‧黏合劑 122‧‧‧Binder

124‧‧‧介入層 124‧‧‧Intervention layer

126‧‧‧介入層之第一表面 126‧‧‧ first surface of the intervention layer

圖1係本文中所描述之實驗之實施例的示意圖。 Figure 1 is a schematic representation of an embodiment of the experiment described herein.

圖2A及圖2B係本文中所描述之光催化元件之實施例的示意圖。 2A and 2B are schematic illustrations of embodiments of photocatalytic elements described herein.

圖3係本文中所描述之光催化元件之實施例的示意圖。 3 is a schematic illustration of an embodiment of a photocatalytic element described herein.

圖4係本文中所描述之光催化元件之實施例的示意圖。 4 is a schematic illustration of an embodiment of a photocatalytic element described herein.

圖5係展示本文中所描述之實施例(實例A)之抗菌(大腸桿菌)活性的曲線圖。 Figure 5 is a graph showing the antibacterial (E. coli) activity of the examples (Example A) described herein.

圖6係展示本文中所描述之實施例(實例B)之抗菌(大腸桿菌)活性的曲線圖。 Figure 6 is a graph showing the antibacterial (E. coli) activity of the examples (Example B) described herein.

圖7係展示本文中所描述之實施例(實例C)之抗菌(大腸桿菌)活性的曲線圖。 Figure 7 is a graph showing the antibacterial (E. coli) activity of the examples (Example C) described herein.

圖8係展示本文中所描述之實施例(實例D)之抗菌(大腸桿菌)活性的曲線圖。 Figure 8 is a graph showing the antibacterial (E. coli) activity of the examples (Example D) described herein.

圖9係展示本文中所描述之實施例(實例E)之抗菌(大腸桿菌)活性的曲線圖。 Figure 9 is a graph showing the antibacterial (E. coli) activity of the examples (Example E) described herein.

圖10展示在PET基板上的實施例(實例A)的SEM表面及截面影像。 Figure 10 shows an SEM surface and cross-sectional image of an example (Example A) on a PET substrate.

圖11係展示本文中所描述之實施例(實例AA至實例AF)之抗菌(大腸桿菌)活性、以KR5230作為黏合劑的光催化(填充氧化銅(CuxO)之多相TiO2[87%銳鈦礦相TiO2/13%金紅石相TiO2])塗層之效能的曲線圖。(光催化填充=11.8vol%、21.1vol%及34.8vol%) Figure 11 is a graph showing the antibacterial (E. coli) activity of the examples described herein (Examples AA to AF), photocatalysis with KR5230 as a binder (filled copper oxide (Cu x O) multiphase TiO 2 [87] A graph of the effectiveness of the % anatase phase TiO 2 /13% rutile phase TiO 2 ] coating. (Photocatalytic filling = 11.8 vol%, 21.1 vol%, and 34.8 vol%)

圖12係本文中所描述之實驗之實施例的示意圖。 Figure 12 is a schematic illustration of an embodiment of the experiment described herein.

圖13係本文中所描述之實驗之實施例的示意圖。 Figure 13 is a schematic illustration of an embodiment of the experiment described herein.

圖14係本文中所描述之光催化元件之實施例的示意圖。 Figure 14 is a schematic illustration of an embodiment of a photocatalytic element described herein.

圖15係本文中所描述之光催化元件之實施例的示意圖。 Figure 15 is a schematic illustration of an embodiment of a photocatalytic element described herein.

圖16係展示本文中所描述之實施例(實例I及實例II)之抗菌(大腸桿菌)活性的曲線圖。 Figure 16 is a graph showing the antibacterial (E. coli) activity of the examples (Examples I and II) described herein.

圖17係展示本文中所描述之實施例(實例11至實例15)在明亮條件下之抗菌(大腸桿菌)活性的曲線圖。 Figure 17 is a graph showing the antibacterial (E. coli) activity of the examples (Examples 11 to 15) described herein under bright conditions.

圖18係展示本文中所描述之實施例(實例11至實例15)在黑暗條件下之抗菌(大腸桿菌)活性的曲線圖。 Figure 18 is a graph showing the antibacterial (E. coli) activity of the examples (Examples 11 to 15) described herein under dark conditions.

圖19係在PET基板上的實施例(實例11)之SEM表面影像。 Figure 19 is an SEM surface image of an example (Example 11) on a PET substrate.

圖20係在PET基板上的實施例(實例11)之SEM表面影像。 Figure 20 is an SEM surface image of an example (Example 11) on a PET substrate.

圖21係在PET基板上的實施例(實例15)之SEM表面影像。 Figure 21 is an SEM surface image of an example (Example 15) on a PET substrate.

圖22係在PET基板上的實施例(實例15)之SEM表面影像。 Figure 22 is an SEM surface image of an example (Example 15) on a PET substrate.

將在下文更詳細地描述本發明之實施例。 Embodiments of the invention are described in more detail below.

本文中所描述之光催化塗層可包含分散於聚合物樹脂中之奈米級無機粒子。聚合物樹脂可用作黏合劑以將奈米級粒子保持至基板表面從而具有增加之黏附性及抗刮擦性。聚合物樹脂可用作黏合劑以提供具有增加之硬度的塗層以抵抗由刮擦所引起之損害。可藉由將由聚合物黏合劑及光催化劑粒子製成之光催化懸浮液應用於基板上來形成光催化劑塗層。在一實施例中,光催化劑粒子包含具有與在可見光波長範圍中之吸收相關聯之一或多個帶隙的半導體奈米粒子。光催化劑粒子可經摻雜或填充有氧化銅(例如,複數種Cu1+及Cu2+氧化物),氧化銅為塗層提供去活化諸如細菌或病毒之微生物、分解VOC(揮發性有機化合物)或分解液體中的作為光催化劑活性之保持之指示符的染料之一或多個功能。多個塗層可形成於基板上以得到整合於一個基板上之多個功能。 The photocatalytic coating described herein may comprise nanoscale inorganic particles dispersed in a polymer resin. The polymer resin can be used as a binder to hold the nanoscale particles to the surface of the substrate to have increased adhesion and scratch resistance. The polymeric resin can be used as a binder to provide a coating with increased hardness to resist damage caused by scratching. The photocatalyst coating can be formed by applying a photocatalytic suspension made of a polymer binder and photocatalyst particles to a substrate. In an embodiment, the photocatalyst particles comprise semiconductor nanoparticles having one or more band gaps associated with absorption in the visible wavelength range. The photocatalyst particles may be doped or filled with copper oxide (for example, a plurality of Cu 1+ and Cu 2+ oxides), and the copper oxide provides a coating for deactivating microorganisms such as bacteria or viruses, and decomposing VOCs (volatile organic compounds). Or decomposing one or more functions of the dye in the liquid as an indicator of the retention of photocatalytic activity. A plurality of coatings can be formed on the substrate to provide multiple functions integrated on one substrate.

如圖1中所示,本發明提供用於製造光催化元件之方法(S10),其包含:提供黏合劑及光催化材料溶液,其中該黏合劑與光催化材料係以約0.5至2.0份黏合劑對約1份光催化材料之比(重量比[w/w])提供(S12);及將該混合物應用於基板(S16)。熟習此項技術者將認識到,0.5至2.0份黏合劑對1份光催化材料對應於如根據光催化材料及樹脂之密度計算的該塗層中之約5%至約35vol%的光催化材料。在一些實施例中,提供5至20份10%黏合劑(按重量計)溶液對1份光催化材料(按重量計)。在一些實施例中,該方法進一步包含處理該基板之表面(S14)。在一些實施例中,該方法進一步包含乾燥該基板表面上的該所應用黏合劑/光催化材料懸浮液以移除溶劑(S18)。在一些實施例 中,溶劑被實質上全部移除。 As shown in FIG. 1, the present invention provides a method (S10) for manufacturing a photocatalytic element, comprising: providing a binder and a photocatalytic material solution, wherein the binder is bonded to the photocatalytic material in an amount of about 0.5 to 2.0 parts. The ratio (weight ratio [w/w]) of the agent to about 1 part of the photocatalytic material is supplied (S12); and the mixture is applied to the substrate (S16). Those skilled in the art will recognize that from 0.5 to 2.0 parts of the binder to one part of the photocatalytic material corresponds to from about 5% to about 35 vol% of the photocatalytic material in the coating, as calculated from the density of the photocatalytic material and the resin. . In some embodiments, 5 to 20 parts of a 10% binder (by weight) solution is provided to 1 part of the photocatalytic material (by weight). In some embodiments, the method further includes processing the surface of the substrate (S14). In some embodiments, the method further comprises drying the applied binder/photocatalytic material suspension on the surface of the substrate to remove the solvent (S18). In some embodiments The solvent is removed substantially completely.

圖2A展示包括基板12及光催化塗層14之光催化元件10。在一些實施例中,底塗層16插入於基板12與光催化塗層14之間。在一些實施例中,底塗層包含矽烷偶合劑。在一些實施例中,底塗層係安置於基板12之第一表面18上。在一些實施例中,底塗層可為基板12之第一部分。在一些實施例中,第一部分與該基板成一體。在一些實施例中,光催化塗層14係安置於底塗層16上或接觸該底塗層。如圖2B中所示,在一些實施例中,光催化塗層14係安置於基板12上、接觸基板12或為基板12之一部分。在一些實施例中,底塗層可包含經處理之基板表面18。 2A shows a photocatalytic element 10 comprising a substrate 12 and a photocatalytic coating 14. In some embodiments, the undercoat layer 16 is interposed between the substrate 12 and the photocatalytic coating layer 14. In some embodiments, the primer layer comprises a decane coupling agent. In some embodiments, the undercoat layer is disposed on the first surface 18 of the substrate 12. In some embodiments, the undercoat layer can be the first portion of the substrate 12. In some embodiments, the first portion is integral with the substrate. In some embodiments, the photocatalytic coating 14 is disposed on or in contact with the undercoat layer 16. As shown in FIG. 2B, in some embodiments, the photocatalytic coating 14 is disposed on the substrate 12, in contact with the substrate 12, or as part of the substrate 12. In some embodiments, the undercoat layer can comprise the treated substrate surface 18.

在圖3中,展示了光催化元件10,其包括基板12、第一光催化塗層14A及第二光催化塗層14B。在一些實施例中,光催化塗層14A係安置於基板12上、接觸基板12或為基板12之一部分。在一些實施例中,第二光催化塗層14B係安置於第一光催化塗層14A上、接觸第一光催化塗層14A或為第一光催化塗層14A之一部分。在一些實施例中,複數個孔20經界定於光催化塗層14B內以使光催化塗層14A之表面22與周圍環境8連通。此提供與周圍環境8接觸的複數個光催化層(14A及14B)。 In FIG. 3, a photocatalytic element 10 is illustrated that includes a substrate 12, a first photocatalytic coating 14A, and a second photocatalytic coating 14B. In some embodiments, the photocatalytic coating 14A is disposed on the substrate 12, in contact with the substrate 12, or as part of the substrate 12. In some embodiments, the second photocatalytic coating 14B is disposed on the first photocatalytic coating 14A, in contact with the first photocatalytic coating 14A, or as part of the first photocatalytic coating 14A. In some embodiments, a plurality of holes 20 are defined within the photocatalytic coating 14B to communicate the surface 22 of the photocatalytic coating 14A with the surrounding environment 8. This provides a plurality of photocatalytic layers (14A and 14B) in contact with the surrounding environment 8.

在圖4中,展示了光催化元件10,其包括基板12、底塗層16及複數個光催化塗層(例如,第一光催化塗層14A及第二光催化塗層14B)。在一些實施例中,光催化塗層14A及14B可安置於底塗層16上、接觸該底塗層。如先前關於圖2A及圖2B所描述,在一些實施例中,第一光催化塗層14A及第二光催化塗層14B可安置於基板12上、接觸基板12或為基板12之一部分。在此實施例中,兩個光催化塗層均與環境8直接連通或接觸。 In FIG. 4, a photocatalytic element 10 is illustrated that includes a substrate 12, an undercoat layer 16, and a plurality of photocatalytic coatings (eg, a first photocatalytic coating 14A and a second photocatalytic coating 14B). In some embodiments, photocatalytic coatings 14A and 14B can be disposed on the undercoat layer 16 in contact with the undercoat layer. As previously described with respect to FIGS. 2A and 2B, in some embodiments, the first photocatalytic coating 14A and the second photocatalytic coating 14B can be disposed on the substrate 12, in contact with the substrate 12, or as part of the substrate 12. In this embodiment, both photocatalytic coatings are in direct communication or contact with the environment 8.

在一些實施例中,光催化材料可為包含可為(例如)鈦、鎢、鉭、 錫、鋅或鍶之元素的氧化物。在一些實施例中,氧化物可經摻雜或未摻雜及/或經填充或未填充。在一些實施例中,氧化物可具有比填充銅材料之價帶深的價帶。在一些實施例中,光催化材料可為光催化材料之多相複合物。在一些實施例中,光催化材料可為銳鈦礦、金紅石、纖維鋅礦、尖晶石、鈣鈦礦、燒綠石、石榴石、鋯石及/或鋁假板鈦礦(tialite)相材料或其混合物。此等選項中之每一者係以其如一般熟習半導體技術之人員所理解之一般含義給出。比較給定標準及製得樣本之X光繞射圖案係許多可用以判定樣本是否包含特定相之方法中之一者。例示性標準包括由美國標準技術局(National Institute of Standards and Technology,NIST)(Gaitherburg,MD,美國)及/或國際繞射資料中心(International Centre for Diffraction Data,ICDD,以前的粉末繞射標準聯合委員會[JCPDS])(Newtown Square,PA,美國)提供之彼等XRD光譜。 In some embodiments, the photocatalytic material can be comprised of, for example, titanium, tungsten, tantalum, An oxide of an element of tin, zinc or bismuth. In some embodiments, the oxide can be doped or undoped and/or filled or unfilled. In some embodiments, the oxide can have a valence band that is deeper than the valence band of the filled copper material. In some embodiments, the photocatalytic material can be a multiphase composite of photocatalytic materials. In some embodiments, the photocatalytic material can be anatase, rutile, wurtzite, spinel, perovskite, pyrochlore, garnet, zircon, and/or aluminum tialite. Phase material or a mixture thereof. Each of these options is given by its general meaning as understood by those of ordinary skill in the art. The X-ray diffraction pattern that compares a given standard and the resulting sample is one of many methods that can be used to determine if a sample contains a particular phase. Exemplary standards include by the National Institute of Standards and Technology (NIST) (Gaitherburg, MD, USA) and/or the International Centre for Diffraction Data (ICDD), a former powder diffraction standard. Their XRD spectra were provided by the Commission [JCPDS]) (Newtown Square, PA, USA).

在一些實施例中,多相光催化材料包含銳鈦礦相及金紅石相化合物。在一些實施例中,多相光催化材料可為氧化鈦。在一些實施例中,銳鈦礦相可為2.5%至約97.5%、5%至約95%及/或約10%至約90%;且金紅石相可為97.5%至約2.5%、95%至約5%及/或約10%至約90%。合適材料之非限制性實例包括(但不限於)由Evonik(Parissipany,NJ,美國)銷售的以商品名P25銷售之TiO2混合物(83%銳鈦礦TiO2+17%金紅石TiO2)。 In some embodiments, the heterogeneous photocatalytic material comprises an anatase phase and a rutile phase compound. In some embodiments, the heterogeneous photocatalytic material can be titanium oxide. In some embodiments, the anatase phase can range from 2.5% to about 97.5%, from 5% to about 95%, and/or from about 10% to about 90%; and the rutile phase can range from 97.5% to about 2.5%, 95. % to about 5% and/or about 10% to about 90%. Non-limiting examples of suitable materials include, but are not limited to, a TiO 2 mixture sold by Evonik (Parissipany, NJ, USA) under the trade name P25 (83% anatase TiO 2 + 17% rutile TiO 2 ).

在一些實施例中,光催化材料包含具有在約10nm至100nm之間的平均粒徑之化合物。在一些實施例中,平均粒徑可在約20nm至約60nm之間。 In some embodiments, the photocatalytic material comprises a compound having an average particle size between about 10 nm and 100 nm. In some embodiments, the average particle size can be between about 20 nm and about 60 nm.

在一些實施例中,光催化材料可為如描述於以下各者中的填充銅氧化物(氧化銅[CuxO],包含存在於氧化銅中之Cu1+及Cu2+價態原子)之光催化複合物:2013年3月15日申請之美國專利申請案 13/840,859(2014年9月18日公開之美國公開案第2014/0271,916號;及/或2013年6月14日申請之美國臨時申請案61/835,399;及2013年1月14日申請之美國專利申請案13/741,191(2013年8月1日公開之美國公開案第2013/0192976號),其中之每一者以全文引用的方式併入本文中。在一些實施例中,Cu2+之存在多於Cu1+(例如,Cu2+大於50%)。在一些實施例中,Cu2+可為約50%至約95%(例如,約79%),且Cu1+可為氧化銅之約50%至約5%(例如,約21%)。Cu2+及/或Cu1+之量可藉由X光吸收精細結構分析(XAFS)測定。 In some embodiments, the photocatalytic material can be a filled copper oxide (copper oxide [Cu x O], including Cu 1+ and Cu 2+ valence atoms present in the copper oxide) as described in the following) Photocatalytic composites: U.S. Patent Application Serial No. 13/840,859, filed on Mar. U.S. Patent Application Serial No. 61/835,399, filed on Jan. 14, s., and U.S. Patent Application Serial No. 13/741, 191, filed Jan. Incorporated herein by reference in its entirety. In some embodiments, Cu 2+ is present more than Cu 1+ (eg, Cu 2+ is greater than 50%). In some embodiments, Cu 2+ can be about 50 From about 95% (for example, about 79%), and Cu 1+ may be from about 50% to about 5% (for example, about 21%) of copper oxide. The amount of Cu 2+ and/or Cu 1+ may be borrowed. Determined by X-ray absorption fine structure analysis (XAFS).

在一些實施例中,作為光催化材料之光催化劑可為吸收紫外線或可見光之無機固體,諸如固體無機半導體。對於一些材料,光催化作用可歸因於由由於對電磁輻射之所述吸收而產生於光催化劑之塊體中的電子電洞對在光催化劑之表面上形成的反應性物質(能夠執行還原及氧化)。在一些實施例中,相比於標準氫電極,光催化劑具有能量為約1eV至約0eV、約0eV至約-1eV或約-1eV至約-2eV的傳導帶。相比於標準氫電極,一些光催化劑可具有能量為約3eV至約3.5eV、約2.5eV至約3eV或約2eV至約3.5eV或約3.5eV至約5.0eV的價帶。在一些實施例中,光催化劑包含填充銅的氧化物。合適的填充銅的氧化物描述於以下各者中:2013年3月15日申請之美國專利申請案13/840,859(2014年9月18日公開之美國公開案第2014/0271,916號);及2013年6月14日申請之美國臨時申請案61/835,399,該等申請案以全文引用的方式併入本文中。填充銅的氧化物可展現抗菌效應。 In some embodiments, the photocatalyst as the photocatalytic material may be an inorganic solid that absorbs ultraviolet or visible light, such as a solid inorganic semiconductor. For some materials, photocatalysis can be attributed to reactive species formed on the surface of the photocatalyst by electron holes generated in the bulk of the photocatalyst due to said absorption of electromagnetic radiation (capable of performing reduction and Oxidation). In some embodiments, the photocatalyst has a conduction band having an energy of from about 1 eV to about 0 eV, from about 0 eV to about -1 eV, or from about -1 eV to about -2 eV, as compared to a standard hydrogen electrode. Some photocatalysts can have a valence band of energy from about 3 eV to about 3.5 eV, from about 2.5 eV to about 3 eV, or from about 2 eV to about 3.5 eV, or from about 3.5 eV to about 5.0 eV, as compared to a standard hydrogen electrode. In some embodiments, the photocatalyst comprises an oxide filled with copper. Suitable copper-filled oxides are described in U.S. Patent Application Serial No. 13/840,859, filed on Mar. And U.S. Provisional Application Serial No. 61/835,399, filed on Jun. 14, 2013, which is hereby incorporated by reference. Copper-filled oxides exhibit an antibacterial effect.

一些光催化劑僅可由UV範圍中之光(亦即,小於380nm之波長)活化。此係因為大部分半導體之寬帶隙(>3eV)。然而,近年來,藉由恰當地選擇材料或修改現有光催化劑,已合成了可見光光催化劑(Asahi等人,Science,293:269-271,2001,及Abe等人,Journal of the American Chemical Society,130(25):7780-7781,2008)。可見光光催 化劑包括藉由可見光(例如,通常可由肉眼視覺偵測之光,諸如至少約380nm之波長)活化之光催化劑。在一些實施例中,除可見波長之外,可見光光催化劑亦可由波長在380nm以下之UV光活化。一些可見光光催化劑可具有對應於可見範圍中之光的帶隙,諸如大於約1.5eV、小於約3.5eV、約1.5eV至約3.5eV、約1.7eV至約3.3eV或1.77eV至3.27eV的帶隙。一些光催化劑可具有約1.2eV至約6.2eV、約1.2eV至約1.5eV或約3.5eV至約6.2電子eV的帶隙。 Some photocatalysts can only be activated by light in the UV range (i.e., wavelengths less than 380 nm). This is because of the wide band gap (>3eV) of most semiconductors. However, in recent years, visible light photocatalysts have been synthesized by appropriately selecting materials or modifying existing photocatalysts (Asahi et al., Science, 293: 269-271, 2001, and Abe et al., Journal of the American Chemical Society, 130 (25): 7780-7781, 2008). Visible light The catalyzing agent comprises a photocatalyst that is activated by visible light (e.g., light that is typically detectable by the naked eye, such as a wavelength of at least about 380 nm). In some embodiments, in addition to the visible wavelength, the visible light photocatalyst can also be activated by UV light having a wavelength below 380 nm. Some visible light photocatalysts can have a band gap corresponding to light in the visible range, such as greater than about 1.5 eV, less than about 3.5 eV, about 1.5 eV to about 3.5 eV, about 1.7 eV to about 3.3 eV, or 1.77 eV to 3.27 eV. Bandgap. Some photocatalysts can have a band gap of from about 1.2 eV to about 6.2 eV, from about 1.2 eV to about 1.5 eV, or from about 3.5 eV to about 6.2 electron eV.

較佳地,光催化劑含有金屬化合物(諸如氧化物、氮氧化物、氮氧碳化物或鹵化物),且更佳含有鈦化合物、錫化合物或鎢化合物。 Preferably, the photocatalyst contains a metal compound such as an oxide, an oxynitride, an oxynitride or a halide, and more preferably contains a titanium compound, a tin compound or a tungsten compound.

一些光催化劑包括氧化物半導體(諸如TiO2、ZnO、WO3、SnO2等)及其變體。預期改質包括摻雜及/或填充。如錯合氧化物(SrTiO3、BiVO4)及一些硫化物(CdS、ZnS)、氮化物(GaN)及一些氮氧化物(例如ZnO:GaN)之其他材料亦可顯示光催化性質。光催化劑可由熟習此項技術者藉由包括以下各者之多種方法來合成:固態反應、燃燒、溶劑熱合成、火焰熱解、電漿合成、化學氣相沈積、物理氣相沈積、球磨研磨及高能研磨。 Some photocatalysts include oxide semiconductors (such as TiO 2 , ZnO, WO 3 , SnO 2 , etc.) and variants thereof. The expected modifications include doping and/or filling. Other materials such as mis-oxides (SrTiO 3 , BiVO 4 ) and some sulfides (CdS, ZnS), nitrides (GaN), and some nitrogen oxides (such as ZnO: GaN) may also exhibit photocatalytic properties. Photocatalysts can be synthesized by those skilled in the art by various methods including solid state reaction, combustion, solvothermal synthesis, flame pyrolysis, plasma synthesis, chemical vapor deposition, physical vapor deposition, ball milling, and the like. High energy grinding.

鈦化合物中之鈦的平均氧化數或形式電荷較佳為+1至+6,更佳為+2至+4,進一步較佳為+1至+3。錫化合物中之錫的平均氧化數或形式電荷較佳為+2至+8,更佳為+1至+6,進一步較佳為+1至+4。鎢化合物中之鎢的平均氧化數或形式電荷較佳為+1至+8,更佳為+1至+6,進一步較佳為+1至+4。 The average oxidation number or form charge of titanium in the titanium compound is preferably from +1 to +6, more preferably from +2 to +4, still more preferably from +1 to +3. The average oxidation number or form charge of tin in the tin compound is preferably from +2 to +8, more preferably from +1 to +6, still more preferably from +1 to +4. The average oxidation number or form charge of tungsten in the tungsten compound is preferably +1 to +8, more preferably +1 to +6, still more preferably +1 to +4.

更具體言之,光催化劑較佳含有選自以下各者之至少一者:氧化鈦(IV)(TiO2)、氧化錫(IV)(SnO2)、氧化鎢(III)(W2O3)、氧化鎢(IV)(WO2)及氧化鎢(VI)(WO3)。氧化鈦(IV)(TiO2)較佳為銳鈦礦型氧化鈦(IV)(TiO2)。 More specifically, the photocatalyst preferably contains at least one selected from the group consisting of titanium oxide (IV) (TiO 2 ), tin (IV) oxide (SnO 2 ), and tungsten (III) oxide (W 2 O 3 ). ), tungsten (IV) oxide (WO 2 ) and tungsten (VI) oxide (WO 3 ). The titanium oxide (IV) (TiO 2 ) is preferably anatase-type titanium oxide (IV) (TiO 2 ).

附帶言之,在本說明書中,片語「光催化劑含有(或包含)氧化鎢 (VI)(WO3)」不僅包括光催化劑係純的氧化鎢(VI)(WO3)之情況,而且包括光催化劑含有摻雜有另一元素或化合物之氧化鎢(VI)(WO3)之情況。(相同解釋適用於除氧化鎢外的光催化劑及共催化劑。) Incidentally, in the present specification, the phrase "photocatalyst contains (or contains) tungsten oxide (VI) (WO 3 )" includes not only photocatalytic pure tungsten oxide (VI) (WO 3 ) but also includes The photocatalyst contains a case of tungsten (VI) oxide (WO 3 ) doped with another element or compound. (The same explanation applies to photocatalysts and co-catalysts other than tungsten oxide.)

特別言之,較佳地,光催化劑含有氧化鎢(VI)(WO3),此係因為氧化鎢(VI)使得可能形成在可見光下展示足夠光活性之光催化元件。 In particular, preferably, the photocatalyst contains tungsten (VI) oxide (WO 3 ) because tungsten oxide (VI) makes it possible to form a photocatalytic element which exhibits sufficient photoactivity under visible light.

在一些實施例中,各別Ti或W化合物可為各別氧化物、碳氧化物、氮氧化物、鹵氧化物、鹵化物、鹽、經摻雜或填充化合物。在一些實施例中,各別Ti或W化合物可為TiO2、WO3或Ti(O,C,N)2:Sn,諸如Ti(O,C,N)2:Sn,其中Ti:Sn之莫耳比為約90:10至約80:20、約85:15至約90:10或約87:13。合適的Ti(O,C,N)2:Sn化合物描述於2013年1月10日申請之美國專利申請案13/738,243(2013年7月18日公開之美國專利公開案US2013/0180932)中,該申請案以全文引用的方式併入本文中。在一些實施例中,各別Ti或W化合物可為奈米粉末、奈米粒子及或包含其之層。在一些實施例中,光催化劑之實例可包括:金屬氧化物,諸如氧化鎢(III)(W2O3)、氧化鎢(IV)(WO2)、氧化鎢(VI)(WO3)、氧化鋅(ZnO)、氧化鋯(ZrO2)、氧化錫(II)(SnO)、氧化錫(IV)(SnO2)、氧化錫(VI)(SnO3)、氧化鈰(II)(CeO)、氧化鈰(IV)(CeO2)、鈦酸鍶(SrTiO3)、鈦酸鋇(BaTiO3)、氧化銦(III)(In2O3)、釩酸鉍(BiVO4)、氧化鐵(III)(Fe2O3)、氧化鉍(III)(Bi2O3)、氧化銅(I)(Cu2O)、氧化銅(II)(CuO)、CuxO、鉭酸鉀(KTaO3)及鈮酸鉀(KNbO3);金屬硫化物,諸如硫化鎘(CdS)、硫化鋅(ZnS)及硫化銦(InS);金屬硒化物,諸如硒酸鎘(CdSeO4)及硒化鋅(ZnSe);及金屬氮化物,諸如氮化鎵(GaN)。CuxO描述於美國專利申請案13/840,859中,該申請案特此以全文引用的方式併入。在一些實施例中,光催化劑包含TiO2。在一些實施例中,光催化劑包含銳鈦礦及/或金紅石氧化鈦(IV)(TiO2)。在一些實施例中,光催化劑不包括TiOx。在一些實施例中,光催化劑不包括 TiO2。在一些實施例中,光催化劑包含WO3In some embodiments, the individual Ti or W compounds can be individual oxides, oxycarbides, oxynitrides, oxyhalides, halides, salts, doped or filled compounds. In some embodiments, the respective Ti or W compound may be TiO 2 , WO 3 or Ti(O,C,N) 2 :Sn, such as Ti(O,C,N) 2 :Sn, where Ti:Sn The molar ratio is from about 90:10 to about 80:20, from about 85:15 to about 90:10 or about 87:13. A suitable Ti(O,C,N) 2 :Sn compound is described in U.S. Patent Application Serial No. 13/738,243, filed on Jan. This application is incorporated herein by reference in its entirety. In some embodiments, the respective Ti or W compound can be a nanopowder, a nanoparticle, and or a layer comprising the same. In some embodiments, examples of the photocatalyst may include: a metal oxide such as tungsten (III) oxide (W 2 O 3 ), tungsten (IV) oxide (WO 2 ), tungsten (VI) oxide (WO 3 ), Zinc oxide (ZnO), zirconium oxide (ZrO 2 ), tin (II) oxide (SnO), tin (IV) oxide (SnO 2 ), tin (VI) oxide (SnO 3 ), cerium (II) oxide (CeO) , cerium (IV) oxide (CeO 2 ), strontium titanate (SrTiO 3 ), barium titanate (BaTiO 3 ), indium (III) oxide (In 2 O 3 ), bismuth vanadate (BiVO 4 ), iron oxide ( III) (Fe 2 O 3 ), bismuth (III) oxide (Bi 2 O 3 ), copper (I) oxide (Cu 2 O), copper (II) oxide (CuO), Cu x O, potassium citrate (KTaO) 3 ) and potassium citrate (KNbO 3 ); metal sulfides such as cadmium sulfide (CdS), zinc sulfide (ZnS) and indium sulfide (InS); metal selenides such as cadmium selenate (CdSeO 4 ) and zinc selenide (ZnSe); and metal nitrides such as gallium nitride (GaN). The Cu x O is described in U.S. Patent Application Serial No. 13/840,859, the disclosure of which is hereby incorporated by reference. In some embodiments, the photocatalyst comprises TiO 2 . In some embodiments, the photocatalyst comprises anatase and/or rutile titanium oxide (IV) (TiO 2 ). In some embodiments, the photocatalyst does not include TiO x . In some embodiments, the photocatalyst does not include TiO 2 . In some embodiments, the photocatalyst comprises WO 3.

可使用任何適用量之光催化劑。在一些實施例中,光催化劑材料係組合物的約0.01莫耳%至100莫耳%或至少約0.01莫耳%且小於100莫耳%。在一些實施例中,光催化劑材料係組合物的約20莫耳%至約80莫耳%、約30莫耳%至約70莫耳%、約40莫耳%至約60莫耳%或約50莫耳%。 Any suitable amount of photocatalyst can be used. In some embodiments, the photocatalyst material is from about 0.01 mol% to 100 mol% or at least about 0.01 mol% and less than 100 mol% of the composition. In some embodiments, the photocatalytic material is from about 20 mole percent to about 80 mole percent, from about 30 mole percent to about 70 mole percent, from about 40 mole percent to about 60 mole percent, or about 50% by mole.

諸如TiO2及WO3化合物之光催化劑(例如,奈米粉末)可藉由包括以下各者之許多不同方法來製備:電漿合成,諸如熱電漿(直流電及包括射頻電感耦合電漿(RF-ICP))、溶劑熱、固態反應、熱解(噴霧及火焰)及燃燒。如描述於美國專利8,003,563(其特此以全文引用的方式併入)中之射頻電感耦合電漿(例如,熱)方法可能有用,此係因為低污染(無電極)及高產率以及容易應用氣體、液體或固體形式之前驅體。因此,射頻電感耦合電漿製程係較佳的。舉例而言,當製備WO3奈米粉末時,可使用雙流體霧化器將偏鎢酸銨於水中之液體分散液(於水中之5wt%至20wt%固體)噴灑至電漿體積中。較佳地,前驅體的量可達水中之約20wt%固體。電漿可用氬氣、氮氣及/或氧氣以約25kW板功率操作。可接著在過濾器上收集由來自電漿之冷凝蒸氣形成的粒子。在一些實施例中,如使用BET所量測,粒子表面積的範圍為約1m2/g至約500m2/g、約15m2/g至30m2/g,或為約20m2/g。在一些實施例中,可將獲得之WO3自約200℃加熱至約700℃或自約300℃加熱至約500℃。 Photocatalysts such as TiO 2 and WO 3 compounds (eg, nanopowders) can be prepared by a number of different methods including plasma synthesis, such as thermal plasma (DC and including RF inductively coupled plasma (RF-) ICP)), solvothermal, solid state reaction, pyrolysis (spray and flame) and combustion. A radio frequency inductively coupled plasma (eg, thermal) method as described in U.S. Patent No. 8,003,563, the disclosure of which is hereby incorporated by reference in its entirety, may be Precursor in liquid or solid form. Therefore, the RF inductively coupled plasma process is preferred. For example, when preparing a WO 3 nanopowder, a liquid dispersion of ammonium metatungstate in water (5 wt% to 20 wt% solids in water) can be sprayed into the plasma volume using a two-fluid atomizer. Preferably, the amount of precursor is up to about 20% by weight solids in water. The plasma can be operated with argon, nitrogen and/or oxygen at a plate power of about 25 kW. The particles formed by the condensed vapor from the plasma can then be collected on the filter. In some embodiments, the particle surface area ranges from about 1 m 2 /g to about 500 m 2 /g, from about 15 m 2 /g to 30 m 2 /g, or about 20 m 2 /g, as measured using BET. In some embodiments, the obtained WO 3 can be heated from about 200 ° C to about 700 ° C or from about 300 ° C to about 500 ° C.

在一些實施例中,光催化劑可摻雜有至少一種天然產生之元素(例如非惰性氣體元素)以改良光催化劑之活性。此元素可被稱為「摻雜劑」。可提供所摻雜元素(摻雜劑)作為通常在合成期間所添加之前驅體。所摻雜元素(摻雜劑)可為併入至Ti或W化合物之晶格中(例如,在晶格內之經界定位置內經取代或以其他方式包括於晶體內的間隙 中)的元素。在一些實施例中,摻雜劑可選自包括以下各者之更多元素中之一者:鹼金屬,諸如鋰(Li)、鈉(Na)、鉀(K)及銫(Cs);鹼土金屬,諸如鎂(Mg)、鈣(Ca)、鍶(Sr)、鋇(Ba);貴金屬,諸如金(Au)、銀(Ag)、鉑(Pt)、銠(Rh)、銥(Ir)、鈀(Pd)及釕(Ru);過渡金屬,諸如鐵(Fe)、銅(Cu)、鋅(Zn)、釩(V)、鈦(Ti)(例如,對於基於W之化合物)、鎢(W)(例如,對於基於Ti之化合物)、錳(Mn)、Mo、鋯(Zr)、鈮(Nb)、鉻(Cr)、鈷(Co)、鈰(Ce)及鎳(Ni);鑭系及錒系金屬;鹵素;第III族元素(來自元素根據原子數遞增的次序配置的Dmitri Mendeleev/Lothar Meyer式樣現代元素週期表),包括B、Al、Ga、In及Tl;第IV族元素,包括Ca、Si、Ge、Sn;第V族元素,如N、P、As、Bi;及第VI族元素,如S及Se。在一些實施例中,光催化劑可摻雜有選自以下各者之至少一個元素:C、N、S、F、Sn、Zn、Mn、Al、Se、Nb、Ni、Zr、Ce及Fe。在一些實施例中,光催化劑可自摻雜,例如,在TiO2基質中Ti3+替代Ti4+。合適的經摻雜光催化材料之細節呈現在特此以全文引用的方式併入的美國臨時專利申請案第61/587,889號中。在本說明書中,摻雜有摻雜劑之光催化劑可被稱作「摻雜型光催化劑」。 In some embodiments, the photocatalyst can be doped with at least one naturally occurring element (eg, a non-inert gas element) to improve the activity of the photocatalyst. This element can be referred to as a "dopant." The doped element (dopant) can be provided as a precursor that is usually added during the synthesis. The doped element (dopant) can be an element incorporated into the crystal lattice of the Ti or W compound (eg, substituted or otherwise included in the interstices within the crystal at defined locations within the crystal lattice). In some embodiments, the dopant may be selected from one of more elements including: alkali metals such as lithium (Li), sodium (Na), potassium (K), and cesium (Cs); alkaline earth Metals such as magnesium (Mg), calcium (Ca), strontium (Sr), barium (Ba); noble metals such as gold (Au), silver (Ag), platinum (Pt), rhodium (Rh), iridium (Ir) , palladium (Pd) and ruthenium (Ru); transition metals such as iron (Fe), copper (Cu), zinc (Zn), vanadium (V), titanium (Ti) (for example, for W-based compounds), tungsten (W) (for example, for Ti-based compounds), manganese (Mn), Mo, zirconium (Zr), niobium (Nb), chromium (Cr), cobalt (Co), cerium (Ce), and nickel (Ni); Lanthanide and actinide metals; halogen; Group III elements (Dmitri Mendeleev/Lothar Meyer-style modern periodic table of elements arranged in order of increasing atomic number), including B, Al, Ga, In, and Tl; Elements, including Ca, Si, Ge, Sn; Group V elements such as N, P, As, Bi; and Group VI elements such as S and Se. In some embodiments, the photocatalyst may be doped with at least one element selected from the group consisting of C, N, S, F, Sn, Zn, Mn, Al, Se, Nb, Ni, Zr, Ce, and Fe. In some embodiments, the photocatalyst can be self-doped, for example, Ti 3+ replaces Ti 4+ in the TiO 2 matrix. The details of a suitable doped photocatalytic material are shown in U.S. Provisional Patent Application Serial No. 61/587,889, which is incorporated herein by reference. In the present specification, a photocatalyst doped with a dopant may be referred to as a "doped photocatalyst".

術語「摻雜」意味著在基本上不改變光催化劑之基本晶體結構的範圍內將任意選擇之元素(摻雜劑)添加至主體化合物晶體。光催化劑是否經摻雜可藉由(例如)XPS(X光光電子光譜分析)中之峰值偏移來確認。用於形成摻雜型光催化劑之方法並無特定限制,且可為(例如)溶膠-凝膠方法、固相反應方法及離子植入方法。 The term "doping" means that an arbitrarily selected element (dopant) is added to the host compound crystal within a range that does not substantially change the basic crystal structure of the photocatalyst. Whether or not the photocatalyst is doped can be confirmed by, for example, peak shift in XPS (X-ray photoelectron spectroscopy). The method for forming the doped photocatalyst is not particularly limited, and may be, for example, a sol-gel method, a solid phase reaction method, and an ion implantation method.

當光催化劑係摻雜型光催化劑時,光催化劑中的主體化合物(經受摻雜之化合物)與摻雜劑之莫耳比並無特定限制,且較佳為99.9:0.1至80:20,更佳為99.9:0.1至85:15,進一步較佳為99.9:0.1至87:13。 When the photocatalyst is a doped photocatalyst, the molar ratio of the host compound (compound to be doped) to the dopant in the photocatalyst is not particularly limited, and is preferably 99.9:0.1 to 80:20, more Preferably, it is 99.9: 0.1 to 85:15, further preferably 99.9: 0.1 to 87:13.

較佳地,摻雜型光催化劑摻雜有選自以下各者中之至少一者: 碳(C)、氮(N)、硫(S)、氟(F)、錫(Sn)、鋅(Zn)、錳(Mn)、鋁(Al)、硒(Se)、鈮(Nb)、鎳(Ni)、鋯(Zr)、鈰(Ce)及鐵(Fe)。 Preferably, the doped photocatalyst is doped with at least one selected from the group consisting of: Carbon (C), nitrogen (N), sulfur (S), fluorine (F), tin (Sn), zinc (Zn), manganese (Mn), aluminum (Al), selenium (Se), niobium (Nb), Nickel (Ni), zirconium (Zr), cerium (Ce) and iron (Fe).

光催化劑可為p型或n型。p型光催化劑可(例如)藉由用高價元素(例如,諸如砷(As))摻雜光催化劑來獲得。n型光催化劑可(例如)藉由用低價元素(例如,諸如硼(B))摻雜光催化劑來獲得。 The photocatalyst can be p-type or n-type. The p-type photocatalyst can be obtained, for example, by doping a photocatalyst with a high-valent element such as, for example, arsenic (As). The n-type photocatalyst can be obtained, for example, by doping a photocatalyst with a low-valent element such as, for example, boron (B).

在一些實施例中,光催化材料可包含以下各者中之一或多者:n型UV光催化材料、n型可見光光催化材料、p型UV光催化材料及/或p型可見光催化材料。在一些實施例中,n型可見帶隙半導體可視情況為WO3、Ti(O,C,N)2:Sn或CeO2。在一些實施例中,n型UV光催化材料可視情況為CeO2、TiO2、SnO2、SrTiO3、ATaO3、ANbO3等;A=鹼金屬離子,其中A可為Ca、Ba及/或Sr。在一些實施例中,p型可見帶隙半導體可視情況為SiC、CuMO2、M=Al、Cr。在一些實施例中,p型UV光催化材料可視情況為ZnIrO2、ZnRhO2、CuO、SnO、NiO、Mn2O3、Co3O4及/或Fe2O3In some embodiments, the photocatalytic material may comprise one or more of the following: an n-type UV photocatalytic material, an n-type visible light photocatalytic material, a p-type UV photocatalytic material, and/or a p-type visible light catalytic material. In some embodiments, the n-type visible bandgap semiconductor can be viewed as WO 3 , Ti(O, C, N) 2 :Sn or CeO 2 . In some embodiments, the n-type UV photocatalytic material may be CeO 2 , TiO 2 , SnO 2 , SrTiO 3 , ATaO 3 , ANbO 3 , etc.; A = alkali metal ions, wherein A may be Ca, Ba, and/or Sr. In some embodiments, the p-type visible bandgap semiconductor can be viewed as SiC, CuMO 2 , M=Al, Cr. In some embodiments, the p-type UV photocatalytic material may be ZnIrO 2 , ZnRhO 2 , CuO, SnO, NiO, Mn 2 O 3 , Co 3 O 4 , and/or Fe 2 O 3 .

在一些實施例中,光催化劑可填充有至少一種金屬。所填充元素可藉由如浸漬(Liu,M.、Qiu,X.、Miyauchi,M及Hashimoto,K的在2011年線上公開的Cu(II)Oxide Amorphous Nanoclusters Grafted Ti3+ Self-Doped TiO2;An Efficient Visible Light Photocatalyst(材料化學(Chemistry of Materials))、光還原(Abe等人,美國化學學會期刊(Journal of the American Chemical Society),130(25):7780-7781,2008)及濺鍍的合成後方法來提供。在光催化劑上填充金屬可如以全文引用的方式併入本文中之美國專利公開案第US2008/0241542號中所描述地進行。在一些實施例中,所填充元素係選自貴重元素。在一些實施例中,所填充元素可選自至少一種貴重元素、氧化物及/或氫氧化物。在一些實施例中,貴重元素可選自Au、Ag、Pt、Pd、Ir、Ru、Rh或其氧化物及/或氫氧化物。在一些實施例中,所填充元素係 選自過渡金屬、其氧化物及/或氫氧化物。在一些實施例中,所填充元素係選自Fe及Cu及Ni或其氧化物及氫氧化物。在一些實施例中,所填充元素可選自包括至少一種過渡金屬及至少一種貴金屬的不同組之元素或其各別氧化物及氫氧化物。在一些實施例中,合適的所填充金屬氧化物係描述於2013年3月15日申請之美國專利申請案13/840,859及2013年6月14日申請之美國臨時申請案61/835,399中,該等申請案係以全文引用的方式併入。 In some embodiments, the photocatalyst can be filled with at least one metal. The filled element can be obtained by impregnation (Liu, M., Qiu, X., Miyauchi, M and Hashimoto, K. Cu(II) Oxide Amorphous Nanoclusters Grafted Ti 3+ Self-Doped TiO 2 published in 2011; An Efficient Visible Light Photocatalyst (Chemistry of Materials), photoreduction (Abe et al., Journal of the American Chemical Society, 130 (25): 7780-7781, 2008) and sputtered The post-synthesis method is provided. The filling of the metal on the photocatalyst can be carried out as described in US Patent Publication No. US 2008/0241542, which is incorporated herein by reference in its entirety. From the precious element. In some embodiments, the filled element may be selected from at least one precious element, an oxide, and/or a hydroxide. In some embodiments, the valuable element may be selected from the group consisting of Au, Ag, Pt, Pd, Ir , Ru, Rh or an oxide thereof and/or a hydroxide. In some embodiments, the filler element is selected from the group consisting of transition metals, oxides and/or hydroxides thereof. In some embodiments, the filler elements are Selected from Fe and Cu and Ni or Oxides and hydroxides. In some embodiments, the filler element can be selected from the group consisting of at least one transition metal and at least one noble metal element or individual oxides and hydroxides thereof. In some embodiments, Suitable filled metal oxides are described in U.S. Patent Application Serial No. 13/840,859, filed on Mar. The manner of reference is incorporated.

在一些實施例中,光催化劑在589nm之波長下較佳具有1.0至4.0、更佳1.0至3.0、尤其較佳1.5至2.5之折射率(R1)。當光催化劑折射率(R1)落在1.0至4.0之範圍中時,減小與共催化劑之折射率差變得更容易,且因此形成半透明層變得更容易。應注意,光催化劑之折射率值係用阿貝折射計根據由JIS K 0062指定之「固體樣本量測方法」獲得之量測值。 In some embodiments, the photocatalyst preferably has a refractive index (R1) of from 1.0 to 4.0, more preferably from 1.0 to 3.0, particularly preferably from 1.5 to 2.5, at a wavelength of 589 nm. When the refractive index (R1) of the photocatalyst falls within the range of 1.0 to 4.0, it becomes easier to reduce the refractive index difference from the cocatalyst, and thus it becomes easier to form a translucent layer. It should be noted that the refractive index value of the photocatalyst is a measurement value obtained by an Abbe refractometer according to the "solid sample measurement method" specified by JIS K 0062.

光催化劑之形狀並無特定限制,且光催化劑較佳為顆粒形狀。許多種光催化劑不可充分地溶解於溶劑中。利用顆粒形狀,光催化劑可分散於分散介質中以產生分散液體,其接著可用以藉由塗佈及乾燥而容易地形成層。 The shape of the photocatalyst is not particularly limited, and the photocatalyst is preferably in the form of particles. Many kinds of photocatalysts are not sufficiently soluble in a solvent. With the particle shape, the photocatalyst can be dispersed in a dispersion medium to produce a dispersion liquid, which can then be used to easily form a layer by coating and drying.

當光催化劑係顆粒形狀時,光催化劑之平均粒度並無特定限制,且較佳為5nm至1,000nm、更佳為5nm至100nm、進一步較佳為5nm至30nm。當光催化劑之平均粒度超過1,000nm時,光催化劑之總表面積變得較小,且可能不展示足夠光催化活性。另一方面,當光催化劑之平均粒度降低到5nm以下時,粒子聚集往往會發生,且含有光催化劑之層之半透明性可受損。 When the photocatalyst is in the form of particles, the average particle size of the photocatalyst is not particularly limited, and is preferably from 5 nm to 1,000 nm, more preferably from 5 nm to 100 nm, still more preferably from 5 nm to 30 nm. When the average particle size of the photocatalyst exceeds 1,000 nm, the total surface area of the photocatalyst becomes small and may not exhibit sufficient photocatalytic activity. On the other hand, when the average particle size of the photocatalyst is lowered to 5 nm or less, particle aggregation tends to occur, and the translucency of the layer containing the photocatalyst may be impaired.

應注意,光催化劑之平均粒度係如藉由動態光散射頻率分析(FFT-外差方法)判定的分散於任意分散液體中之光催化劑粒子的基於體積之50%累積分佈直徑(D50)。 It should be noted that the average particle size of the photocatalyst is a volume-based cumulative distribution diameter (D50) of the photocatalyst particles dispersed in an arbitrary dispersion liquid as determined by dynamic light scattering frequency analysis (FFT-heterodyne method).

共催化劑係加速光催化劑之光催化活性之物質。共催化劑可按需要與光催化劑組合使用。共催化劑可為本身展示或不展示光催化活性之共催化劑。與光催化劑合作,共催化劑可使光催化劑之反應速率與獨自使用光催化劑時的反應速率相比增加1.2倍或以上、較佳1.5倍或以上、進一步較佳2.0倍或以上、尤其較佳3.0倍或以上。光催化劑之反應速率可基於(例如)乙醛(一種揮發性有機化合物(VOC))之分解速率。在此文件全文中,共催化劑亦可一般被稱作T黏合劑。 The cocatalyst is a substance that accelerates the photocatalytic activity of the photocatalyst. The cocatalyst can be used in combination with the photocatalyst as needed. The cocatalyst can be a cocatalyst that exhibits or does not exhibit photocatalytic activity. In cooperation with the photocatalyst, the cocatalyst can increase the reaction rate of the photocatalyst by 1.2 times or more, preferably 1.5 times or more, further preferably 2.0 times or more, and particularly preferably 3.0, compared with the reaction rate when the photocatalyst is used alone. Multiple or more. The reaction rate of the photocatalyst can be based, for example, on the rate of decomposition of acetaldehyde, a volatile organic compound (VOC). In this document as a whole, the cocatalyst can also be generally referred to as a T binder.

具體言之,將光催化劑,單獨地或具有與光催化劑混合或由光催化劑支撐之共催化劑,置於裝有一定量之壓縮空氣及乙醛(校準氣體)的封閉空間中,並用可見光(波長455nm、照射強度200mW/cm2)照射歷時1小時。接著比較照射前後的封閉空間中之乙醛濃度以計算光催化劑之反應速率增加之倍數。舉例而言,相比於當僅裝有光催化劑之封閉空間中之乙醛濃度在照射含有80ppm乙醛之封閉空間之後變為60ppm(亦即,20ppm乙醛已分解)時,當裝有光催化劑及共催化劑(與光催化劑混合或支撐於光催化劑上)之封閉空間中之乙醛濃度在照射含有80ppm乙醛之封閉空間之後變為20ppm(亦即,60ppm乙醛已分解)時,乙醛分解速率可被說成已增加3倍(光催化活性之3倍增加)。 Specifically, the photocatalyst, either alone or with a cocatalyst mixed with or supported by a photocatalyst, is placed in a closed space containing a certain amount of compressed air and acetaldehyde (calibration gas), and is visible light (wavelength 455 nm). Irradiation intensity 200 mW/cm 2 ) Irradiation for 1 hour. Next, the acetaldehyde concentration in the closed space before and after the irradiation was compared to calculate a multiple of the increase in the reaction rate of the photocatalyst. For example, when the concentration of acetaldehyde in the enclosed space containing only the photocatalyst becomes 60 ppm after irradiation of the enclosed space containing 80 ppm of acetaldehyde (that is, 20 ppm of acetaldehyde has been decomposed), when the light is filled The acetaldehyde concentration in the closed space of the catalyst and the cocatalyst (mixed with or supported on the photocatalyst) becomes 20 ppm after irradiation with a closed space containing 80 ppm of acetaldehyde (that is, 60 ppm of acetaldehyde has been decomposed), The rate of aldehyde decomposition can be said to have increased by a factor of 3 (a 3-fold increase in photocatalytic activity).

某一共催化劑可為能夠藉由來自光催化劑之傳導帶之電子轉移而還原之化合物或半導體。舉例而言,共催化劑可具有能量低於光催化劑之傳導帶的傳導帶,或共催化劑可具有能量低於光催化劑之傳導帶的最低未佔用分子軌域。當使用諸如「較低能量」及「較高能量」之術語來比較半導體之帶或分子軌域與另一帶或分子軌域時,其意味著電子在轉移至較低能量之帶或分子軌域時失去能量,及電子在轉移至較高能量之分子軌域之帶時得到能量。 A co-catalyst can be a compound or semiconductor that can be reduced by electron transfer from a conduction band of a photocatalyst. For example, the cocatalyst can have a conduction band with a lower energy than the conduction band of the photocatalyst, or the cocatalyst can have a lowest unoccupied molecular orbital domain with a lower energy than the conduction band of the photocatalyst. When terms such as "lower energy" and "higher energy" are used to compare a semiconductor band or molecular orbital with another band or molecular orbital, it means that the electron is moving to a lower energy band or molecular orbital domain. When energy is lost, and electrons gain energy when they are transferred to a higher energy molecular orbital zone.

共催化劑可簡單地與光催化劑混合,或可支撐於光催化劑上。 在本說明書中,支撐共催化劑之光催化劑被稱作「支撐型光催化劑」。如本文所用,術語「支撐」係指不同於光催化劑之物質黏附至光催化劑表面的狀態。此黏附狀態可(例如)藉由掃描電子顯微鏡檢查觀察到。用於形成支撐型光催化劑之方法並無特定限制,且可為(例如)浸漬方法、光還原方法或濺鍍。支撐型光催化劑可藉由使用(例如)美國專利申請案2008/0241542中所描述之方法來形成。共催化劑可摻雜有摻雜劑。摻雜有摻雜劑之共催化劑將被稱作摻雜型共催化劑。用以摻雜共催化劑之化合物及元素係如上文結合光催化劑所例示的。 The cocatalyst can be simply mixed with the photocatalyst or can be supported on the photocatalyst. In the present specification, a photocatalyst supporting a cocatalyst is referred to as a "supported photocatalyst". As used herein, the term "support" refers to a state in which a substance other than a photocatalyst adheres to a surface of a photocatalyst. This state of adhesion can be observed, for example, by scanning electron microscopy. The method for forming the supported photocatalyst is not particularly limited, and may be, for example, a dipping method, a photoreduction method, or a sputtering. Supported photocatalysts can be formed by the methods described in, for example, U.S. Patent Application Serial No. 2008/0241542. The cocatalyst can be doped with a dopant. The co-catalyst doped with a dopant will be referred to as a doped co-catalyst. The compounds and elements used to dope the cocatalyst are as exemplified above in connection with the photocatalyst.

咸信,作為共催化劑之一些金屬氧化物能夠還原O2。舉例而言,咸信,CeO2可藉由電子轉移來還原O2氣。在此情況下,咸信Ce3+將電子轉移至O2且結果被轉化成Ce4+。在光催化劑組合物中,光催化劑可將電子轉移至CeO2,從而將Ce4+轉化成Ce3+,且Ce3+可接著還原O2。Ce3+亦可作為涉及CeO2及O2及超氧化自由基離子(O2 -)之平衡過程之結果而存在。此平衡過程中之O2及超氧化自由基離子可被吸附至固體CeO2之表面或存在於大氣中。Ce 3+亦可作為與可能有意添加或作為雜質存在之不同氧化態之鈰物質的氧化及還原反應之結果而存在。 It is believed that some metal oxides as co-catalysts are capable of reducing O 2 . For example, it is believed that CeO 2 can reduce O 2 gas by electron transfer. In this case, the letter Ce 3+ transfers electrons to O 2 and the result is converted to Ce 4+ . In the photocatalyst composition, the photocatalyst can transfer electrons to CeO 2 to convert Ce 4+ to Ce 3+ , and Ce 3+ can then reduce O 2 . Ce 3+ may also exist as a result of an equilibrium process involving CeO 2 and O 2 and superoxide radical ions (O 2 - ). The O 2 and superoxide radical ions in this equilibrium process can be adsorbed to the surface of the solid CeO 2 or present in the atmosphere. C e 3+ may also be present as a result of oxidation and reduction reactions of the ruthenium species in different oxidation states which may be intentionally added or present as impurities.

咸信,一些共催化劑可能能夠實現氧之多電子還原。舉例而言,一些共催化劑可實現氧之兩電子、四電子、6電子及/或直至8電子還原。咸信,共催化劑可將電子儲存於共催化劑之傳導帶中,此等所儲存電子可接著用於氧還原。 Xianxin, some co-catalysts may be able to achieve multiple electron reduction of oxygen. For example, some cocatalysts can achieve two electrons, four electrons, six electrons, and/or up to eight electron reductions of oxygen. The co-catalyst stores electrons in the conduction band of the cocatalyst, which can then be used for oxygen reduction.

一些共催化劑可能能夠將大氣O2轉化成超氧化自由基離子。舉例而言,CeO2能夠將大氣氧轉化成超氧化自由基離子。咸信,上文所描述之平衡及/或電子轉移過程中之一些可有助於CeO2之此性質。此轉化可在諸如環境條件之多種條件下發生,該等條件包括(例如):正常大氣氧濃度,諸如約10%至約30%、約15%至約25%或約20%氧之莫耳濃度;環境溫度,諸如約0℃至約1000℃、約0℃至約100℃、約 10℃至約50℃或約20℃至約30℃;及壓力,諸如約0.5至約2atm、約0.8atm至約1.2atm或約1atm。此轉化亦可在升高或降低溫度、壓力或氧濃度下發生。可能能夠還原O2或將大氣O2轉化成超氧化自由基離子之其他材料包括各種其他材料,諸如CexZryO2(其中x/y=0.99-0.01)、BaYMn2O5+δ,及摻雜鑭系元素之CeO2,包括CexZryLazO2、CexZryPrzO2及CexSmyO2Some cocatalysts may be capable of converting atmospheric O 2 to superoxide radical ions. For example, CeO 2 is capable of converting atmospheric oxygen into superoxide radical ions. It is believed that some of the balance and/or electron transfer processes described above may contribute to this property of CeO 2 . This conversion can occur under a variety of conditions, such as environmental conditions, including, for example, normal atmospheric oxygen concentrations, such as from about 10% to about 30%, from about 15% to about 25%, or from about 20% oxygen. Concentration; ambient temperature, such as from about 0 ° C to about 1000 ° C, from about 0 ° C to about 100 ° C, from about 10 ° C to about 50 ° C or from about 20 ° C to about 30 ° C; and pressure, such as from about 0.5 to about 2 atm, about 0.8 Atm to about 1.2 atm or about 1 atm. This conversion can also occur at elevated or reduced temperatures, pressures or oxygen concentrations. Other materials that may be capable of reducing O 2 or converting atmospheric O 2 to superoxide radical ions include various other materials such as Ce x Zr y O 2 (where x/y = 0.99-0.01), BaYMn 2 O 5+δ , And CeO 2 doped with a lanthanide element, including Ce x Zr y La z O 2 , Ce x Zr y Pr z O 2 and Ce x Sm y O 2 .

一些共催化劑可具有能量高於光催化劑之價帶的價帶或最高佔用分子軌域。此可允許光催化劑之價帶中之電洞轉移至共催化劑之最高佔用分子軌域或價帶。共催化劑之價帶或最高佔用分子軌域中之電洞可接著將H2O或OH-氧化成OH.。舉例而言,若選擇WO3作為光催化劑,則此共催化劑之實例可包括銳鈦礦TiO2、SrTiO3、KTaO3、SiC或KNbO3Some cocatalysts may have a valence band or a highest occupied molecular orbital domain with a higher energy band than the photocatalyst. This allows the holes in the valence band of the photocatalyst to be transferred to the highest occupied molecular orbital or valence band of the cocatalyst. The valence band of the cocatalyst or the hole in the highest occupied molecular orbital domain can then oxidize H 2 O or OH - to OH. . For example, if WO 3 is selected as the photocatalyst, examples of the cocatalyst may include anatase TiO 2 , SrTiO 3 , KTaO 3 , SiC, or KNbO 3 .

在一些實施例中,共催化劑可為無機的。在一些實施例中,無機共催化劑可為黏合劑。在一些實施例中,共催化劑可為氧化物,諸如金屬二氧化物,包括CeO2、TiO2或類似者。合適的共催化劑描述於2013年1月10日申請之美國專利申請案13/738,243(2013年7月18日公開之美國專利公開案US2013/0180932)中,該申請案以全文引用的方式併入本文中。 In some embodiments, the cocatalyst can be inorganic. In some embodiments, the inorganic cocatalyst can be a binder. In some embodiments, the cocatalyst can be an oxide, such as a metal dioxide, including CeO 2 , TiO 2 , or the like. A suitable co-catalyst is described in U.S. Patent Application Serial No. 13/738,243, filed on Jan. <RTIgt; In this article.

在一些實施例中,共催化劑之實例可包括氧化銅(I)(Cu2O)、氧化銅(II)(CuO)、氧化鉬(VI)(MoO3)、氧化錳(III)(Mn2O3)、氧化釔(III)(Y2O3)、氧化釓(III)(Gd2O3)、銳鈦礦型及/或金紅石型氧化鈦(IV)(TiO2)、鈦酸鍶(SrTiO3)、鉭酸鉀(KTaO3)、碳化矽(SiC)、鈮酸鉀(KNbO3)、氧化矽(SiO2)、氧化錫(IV)(SnO2)、氧化鋁(III)(Al2O3)、氧化鋯(ZrO2)、氧化鐵(III)(Fe2O3)、氧化鐵(II,III)(Fe3O4)、氧化鎳(II)(NiO)、氧化鈮(V)(Nb2O5)、氧化銦(In2O5)、氧化鉭(Ta2O5)、氧化鈰(II)(CeO)、氧化鈰(IV)(CeO2)、ArXtOs(其中A係稀土元素,X係除稀 土元素外的元素或除稀土元素外的元素之組合,r為1至2,t為0至3,且s為2至3)、三水合磷鉬酸銨((NH4)3[PMo12O40])、12-鎢磷酸(PW12O40)、矽化鎢(H4[SiW12O40])、磷鉬酸(12MoO3.H3PO4)及鈰-鋯複合氧化物(CexZryO2)(y/x=0.001至0.999)。在一些實施例中,共催化劑包含In2O5、Ta2O5、銳鈦礦TiO2、金紅石TiO2、銳鈦礦及金紅石TiO2之組合或CeO2。在一些實施例中,共催化劑包含TiO2。在一些實施例中,共催化劑包含銳鈦礦TiO2。在一些實施例中,共催化劑不包括Cr2O3、CeO2、Al2O3或SiO2。在一些實施例中,共催化劑不包括Cr2O3。在一些實施例中,共催化劑不包括CeO2。在一些實施例中,共催化劑不包括Al2O3。在一些實施例中,共催化劑不包括SiO2In some embodiments, examples of the cocatalyst may include copper (I) oxide (Cu 2 O), copper (II) oxide (CuO), molybdenum (VI) oxide (MoO 3 ), manganese (III) oxide (Mn 2 ) O 3 ), cerium (III) oxide (Y 2 O 3 ), cerium (III) oxide (Gd 2 O 3 ), anatase and/or rutile titanium oxide (IV) (TiO 2 ), titanic acid SrTiO 3 , potassium silicate ( KTaO 3 ), lanthanum carbide (SiC), potassium citrate (KNbO 3 ), yttrium oxide (SiO 2 ), tin (IV) oxide (SnO 2 ), aluminum oxide (III) (Al 2 O 3 ), zirconia (ZrO 2 ), iron (III) oxide (Fe 2 O 3 ), iron (II, III) (Fe 3 O 4 ), nickel (II) oxide (NiO), oxidation铌(V)(Nb 2 O 5 ), indium oxide (In 2 O 5 ), lanthanum oxide (Ta 2 O 5 ), cerium (II) oxide (CeO), cerium (IV) oxide (CeO 2 ), A r X t O s (wherein A is a rare earth element, X is a combination of elements other than rare earth elements or elements other than rare earth elements, r is 1 to 2, t is 0 to 3, and s is 2 to 3), three Hydrated ammonium phosphomolybdate ((NH 4 ) 3 [PMo 12 O 40 ]), 12-tungstophosphoric acid (PW 12 O 40 ), tungsten telluride (H 4 [SiW 12 O 40 ]), phosphomolybdic acid (12MoO 3 . H 3 PO 4 ) and cerium-zirconium composite oxide (Ce x Zr y O 2 ) (y/x = 0.001 to 0.999). In some embodiments, the cocatalyst comprises In 2 O 5 , Ta 2 O 5 , anatase TiO 2 , rutile TiO 2 , a combination of anatase and rutile TiO 2 , or CeO 2 . In some embodiments, the cocatalyst comprises TiO 2 . In some embodiments, the cocatalyst comprises anatase TiO 2 . In some embodiments, the cocatalyst does not include Cr 2 O 3 , CeO 2 , Al 2 O 3 , or SiO 2 . In some embodiments, the cocatalyst does not include Cr 2 O 3 . In some embodiments, the cocatalyst does not include CeO 2 . In some embodiments, the cocatalyst does not include Al 2 O 3 . In some embodiments, the cocatalyst does not include SiO 2 .

在一些實施例中,共催化劑可為RerEtOs、RerEtO或RerEtO2,其中Re係稀土元素,E係元素或元素之組合,且O係氧;且r為1至2,諸如約1至約1.5或約1.5至約2;s為2至3,諸如約2或約3;且t為0至3,諸如約0.01至約1、約1至約2或約2至約3。在一些實施例中,共催化劑可為RerOs,其中Re可為稀土金屬,且r可大於或等於1且小於或等於2,或可在1與2之間,且s可大於或等於2且小於或等於3,或可在2與3之間。合適稀土元素之實例包括鈧、釔及鑭系及錒系元素。鑭系元素包括具有原子序數57至71之元素。錒系元素包括具有原子序數89至103之元素。在一些實施例中,共催化劑可為CexZryO2,其中y/x比=0.001至0.999。 In some embodiments, the cocatalyst can be Re r E t O s , Re r E t O or Re r E t O 2 , wherein Re is a rare earth element, a combination of E-type elements or elements, and O is oxygen; r is from 1 to 2, such as from about 1 to about 1.5 or from about 1.5 to about 2; s is from 2 to 3, such as from about 2 or about 3; and t is from 0 to 3, such as from about 0.01 to about 1, from about 1 to about 2 or about 2 to about 3. In some embodiments, the cocatalyst can be Re r O s , where Re can be a rare earth metal, and r can be greater than or equal to 1 and less than or equal to 2, or can be between 1 and 2, and s can be greater than or equal to 2 and less than or equal to 3, or may be between 2 and 3. Examples of suitable rare earth elements include lanthanum, cerium and lanthanides and actinides. The lanthanide element includes an element having an atomic number of 57 to 71. The lanthanide element includes an element having an atomic number of 89 to 103. In some embodiments, the cocatalyst can be Ce x Zr y O 2 with y/x ratio = 0.001 to 0.999.

共催化劑較佳含有選自以下各者中之至少一者:鈰化合物、銅化合物、鉀化合物、鍶化合物、鉭化合物、鈮化合物及鈦化合物。更佳地,共催化劑含有鈰化合物或銅化合物。鈰化合物之平均氧化數或形式電荷較佳為+2至+4。銅化合物之平均氧化數或形式電荷較佳為+1至+2。在一些實施例中,共催化劑可為CeOa(a2)。在一些實施例中,共催化劑可為CeO。在一些實施例中,共催化劑可為氧化鈰 (CeO2)。 The cocatalyst preferably contains at least one selected from the group consisting of ruthenium compounds, copper compounds, potassium compounds, ruthenium compounds, ruthenium compounds, ruthenium compounds, and titanium compounds. More preferably, the cocatalyst contains a ruthenium compound or a copper compound. The average oxidation number or form charge of the ruthenium compound is preferably from +2 to +4. The average oxidation number or form charge of the copper compound is preferably from +1 to +2. In some embodiments, the cocatalyst can be CeO a (a 2). In some embodiments, the cocatalyst can be CeO. In some embodiments, the cocatalyst can be cerium oxide (CeO 2 ).

在一些實施例中,共催化劑含有氧化鈰,更佳為氧化鈰(IV)(CeO2)。此實施例適合用於揮發性有機化合物(VOC)之分解。當共催化劑含有氧化鈰(IV)(CeO2)時,較佳對氧化鈰(IV)進行摻雜,較佳摻雜錫(Sn)。在錫(Sn)摻雜氧化鈰(IV)(CeO2:Sn)中,錫(Sn)占全部共催化劑(CeO2:Sn)的較佳1mol%至50mol%、更佳1.5mol%至10mol%、進一步較佳1.5mol%至10mol%、尤其較佳1.5mol%至4.5mol%。 In some embodiments, the cocatalyst contains cerium oxide, more preferably cerium (IV) oxide (CeO 2 ). This embodiment is suitable for the decomposition of volatile organic compounds (VOCs). When the cocatalyst contains cerium (IV) oxide (CeO 2 ), it is preferred to dope cerium (IV), preferably tin (Sn). In tin (Sn) doped cerium oxide (IV) (CeO 2 :Sn), tin (Sn) accounts for preferably 1 mol% to 50 mol%, more preferably 1.5 mol% to 10 mol of the total cocatalyst (CeO 2 :Sn). %, further preferably from 1.5 mol% to 10 mol%, particularly preferably from 1.5 mol% to 4.5 mol%.

在一些實施例中,光催化劑可為WO3且共催化劑可為CeOa(a2)。 In some embodiments, the photocatalyst can be WO 3 and the cocatalyst can be CeO a (a 2).

在一些實施例中,共催化劑可為Keggin單元,例如磷鉬酸銨((NH4)3[PMo12O40])、12-磷鎢酸、矽鎢酸及磷鉬酸。Keggin單元之總體穩定性允許陰離子中之金屬容易被還原。視溶劑、溶液之酸性及α-Keggin陰離子上之電荷而定,陰離子可以可逆地在一個或多個電子步中還原。 In some embodiments, the cocatalyst can be a Keggin unit, such as ammonium phosphomolybdate ((NH 4 ) 3 [PMo 12 O 40 ]), 12-phosphoric acid, tungstic acid, and phosphomolybdic acid. The overall stability of the Keggin unit allows the metal in the anion to be easily reduced. Depending on the solvent, the acidity of the solution and the charge on the a-Keggin anion, the anion can be reversibly reduced in one or more electron steps.

儘管不希望受理論限制,但本發明人咸信,CeO2在與氧化鎢結合時可因為此等材料之相對譜帶位置而有用。此外,值得注意的是CeO2之折射率與氧化鎢實質上相同,約90%至約110%。在另一實施例中,約95%至約105%。在一些實施例中,光催化組合物之高透明度可提供透明度大於約50%、60%、65%及/或70%之組合物/層/元件。由匹配折射率引起的低散射損失直接有助於產生透明組合物。 While not wishing to be bound by theory, it is believed the present invention, CeO 2 may be useful because of the relative position of the band of such material in combination with tungsten oxide. Furthermore, it is worth noting that the refractive index of CeO 2 is substantially the same as that of tungsten oxide, from about 90% to about 110%. In another embodiment, from about 95% to about 105%. In some embodiments, the high transparency of the photocatalytic composition can provide a composition/layer/element having a clarity greater than about 50%, 60%, 65%, and/or 70%. The low scattering loss caused by the matching refractive index directly contributes to the production of a transparent composition.

在一些實施例中,共催化劑含有氧化銅,更佳地氧化銅(I)(Cu2O)及/或氧化銅(II)(CuO)。此實施例適合於抗微生物應用。當共催化劑含有氧化銅(I)(Cu2O)及/或氧化銅(II)(CuO)時,較佳地,氧化銅(I)(Cu2O)及/或氧化銅(II)(CuO)係支撐於光催化劑上。 In some embodiments, the cocatalyst contains copper oxide, more preferably copper (I) (Cu 2 O) and/or copper (II) oxide (CuO). This embodiment is suitable for antimicrobial applications. When the cocatalyst contains copper (I) oxide (Cu 2 O) and/or copper (II) oxide (CuO), preferably copper (I) oxide (Cu 2 O) and/or copper (II) oxide ( CuO) is supported on the photocatalyst.

共催化劑之形狀並無特定限制,且出於針對光催化劑所描述之 相同原因,共催化劑之形狀較佳為顆粒。當共催化劑之形狀係顆粒時,共催化劑之平均粒度並無特定限制,且較佳為1nm至1,000nm、更佳為1nm至100nm、進一步較佳為1nm至30nm。 The shape of the cocatalyst is not particularly limited and is described for the photocatalyst. For the same reason, the shape of the cocatalyst is preferably a particle. When the shape of the cocatalyst is a particle, the average particle size of the cocatalyst is not particularly limited, and is preferably from 1 nm to 1,000 nm, more preferably from 1 nm to 100 nm, still more preferably from 1 nm to 30 nm.

共催化劑在589nm波長下具有較佳1.0至4.0、更佳1.0至3.0、尤其較佳1.5至2.5之折射率(R2)。當共催化劑折射率(R2)落在1.0至4.0之範圍中時,減小與光催化劑之折射率差且形成理想半透明層變得更容易。 The cocatalyst has a refractive index (R2) of preferably from 1.0 to 4.0, more preferably from 1.0 to 3.0, particularly preferably from 1.5 to 2.5, at a wavelength of 589 nm. When the refractive index (R2) of the cocatalyst falls within the range of 1.0 to 4.0, it becomes easier to reduce the refractive index difference from the photocatalyst and form an ideal translucent layer.

上述光催化劑之實例包括僅對小於380nm波長之紫外線光線展示光催化活性的UV回應光催化劑,及亦對380nm至780nm波長之可見光展示光催化活性的可見光回應光催化劑。在本發明中,光催化劑可為UV回應光催化劑或可見光回應光催化劑,且較佳為可見光回應光催化劑。可見光回應光催化劑即使在無共催化劑之情況下亦展示對可見光之某種光活性。與共催化劑合作,可見光回應光催化劑可因此展示對可見光之甚至更高光活性。當光催化劑為可見光回應光催化劑時,帶隙為(例如)1.5eV至3.5eV、較佳為1.7eV至3.3eV、更佳為1.77eV至3.27eV。應注意,即使當光催化劑為UV回應光催化劑時,光催化劑亦可在特定光催化劑及共催化劑組合中展示可見光回應性。 Examples of the above photocatalyst include a UV-responsive photocatalyst exhibiting photocatalytic activity only for ultraviolet light having a wavelength of less than 380 nm, and a visible light-responsive photocatalyst exhibiting photocatalytic activity also for visible light having a wavelength of 380 nm to 780 nm. In the present invention, the photocatalyst may be a UV-responsive photocatalyst or a visible light-responsive photocatalyst, and is preferably a visible light-responsive photocatalyst. The visible light responsive photocatalyst exhibits some photoactivity to visible light even in the absence of a cocatalyst. In cooperation with the cocatalyst, the visible light responsive photocatalyst can thus exhibit even higher photoactivity to visible light. When the photocatalyst is a visible light responsive photocatalyst, the band gap is, for example, 1.5 eV to 3.5 eV, preferably 1.7 eV to 3.3 eV, more preferably 1.77 eV to 3.27 eV. It should be noted that even when the photocatalyst is a UV-responsive photocatalyst, the photocatalyst can exhibit visible light responsiveness in a particular photocatalyst and co-catalyst combination.

在一些實施例中,光催化劑較佳為展示可見光回應性之光催化劑。可見光回應光催化劑亦可對諸如螢光燈及LED之發射可見光的光源展示光催化活性,且使得能夠避免使用可對人體有害之紫外光。 In some embodiments, the photocatalyst is preferably a photocatalyst exhibiting visible light responsiveness. The visible light responsive photocatalyst can also exhibit photocatalytic activity for light sources such as fluorescent lamps and LEDs that emit visible light, and can avoid the use of ultraviolet light that is harmful to the human body.

光催化劑可單獨使用或作為兩或兩者以上之混合物使用。當使用兩種或兩種以上光催化劑作為混合物時,光催化劑中之一者可充當另一光催化劑之共催化劑。共催化劑亦可單獨使用或作為兩或兩者以上之混合物使用。 The photocatalyst may be used singly or as a mixture of two or more. When two or more photocatalysts are used as a mixture, one of the photocatalysts can serve as a cocatalyst for the other photocatalyst. The cocatalyst may also be used singly or as a mixture of two or more.

當組合使用光催化劑及共催化劑時,可使用光催化劑與共催化劑之任何有用比。總光催化劑與總共催化劑之比(莫耳比)較佳為 99.5:0.5至16.7:83.3、更佳為99.5:0.5至20:80、進一步較佳為99.5:0.5至50:50。 When a photocatalyst and a cocatalyst are used in combination, any useful ratio of the photocatalyst to the cocatalyst can be used. The ratio of the total photocatalyst to the total catalyst (mole ratio) is preferably 99.5: 0.5 to 16.7: 83.3, more preferably 99.5: 0.5 to 20: 80, further preferably 99.5: 0.5 to 50: 50.

當光催化劑含量小於前述範圍之下限時,共催化劑將超過光催化劑量,且可不能發揮充分光催化活性。另一方面,當光催化劑含量超過前述範圍之上限時,共催化劑將相對於光催化劑量不足,且可不能發揮充分光催化活性。 When the photocatalyst content is less than the lower limit of the aforementioned range, the cocatalyst will exceed the amount of the photocatalyst and may not exhibit sufficient photocatalytic activity. On the other hand, when the photocatalyst content exceeds the upper limit of the above range, the amount of the cocatalyst will be insufficient relative to the amount of the photocatalyst, and sufficient photocatalytic activity may not be exhibited.

在本發明中,當組合使用光催化劑及共催化劑時,光催化劑與共催化劑之組合並無特定限制。 In the present invention, when a photocatalyst and a cocatalyst are used in combination, the combination of the photocatalyst and the cocatalyst is not particularly limited.

在一些實施例中,光催化材料可以約0.5:1至2:1或約1:1(氧化鎢:稀土氧化物)之莫耳比包含氧化鎢及稀土氧化物。在一些實施例中,稀土氧化物係氧化鈰(CeO2)。在一些實施例中,光催化組合物可包括WO3及CeO2,具有約1:5至約5:1、約1:3至約3:1、約1:2至約2:1或約1:1之莫耳比(WO3:CeO2)。 In some embodiments, the photocatalytic material may comprise tungsten oxide and a rare earth oxide in a molar ratio of from about 0.5:1 to 2:1 or about 1:1 (tungsten oxide: rare earth oxide). In some embodiments, the rare earth oxide is cerium oxide (CeO 2 ). In some embodiments, the photocatalytic composition can include WO 3 and CeO 2 having from about 1:5 to about 5:1, from about 1:3 to about 3:1, from about 1:2 to about 2:1, or about Mohr ratio of 1:1 (WO 3 :CeO 2 ).

在一較佳實施例中,光催化劑含有氧化鎢(VI)(WO3),且共催化劑含有氧化鈰(IY)(CeO2)。可藉由使用氧化鎢(VI)(WO3)作為光催化劑且使用氧化鈰(IV)(CeO2)作為共催化劑來形成在可見光回應性及光催化活性上極好且在分解揮發性有機化合物(VOC)的能力上亦尤其好的光催化元件。 In a preferred embodiment, the photocatalyst contains tungsten (VI) oxide (WO 3 ) and the cocatalyst contains cerium oxide (IY) (CeO 2 ). It is excellent in visible light responsiveness and photocatalytic activity and decomposes volatile organic compounds by using tungsten (VI) oxide (WO 3 ) as a photocatalyst and cerium (IV) oxide (CeO 2 ) as a cocatalyst. (VOC) is also a particularly good photocatalytic component.

在另一較佳實施例中,光催化劑含有氧化鈦(IV)(TiO2)或氧化錫(IV)(SnO2),且共催化劑含有氧化銅(I)(Cu2O)及/或氧化銅(II)(CuO)。在此情況下,含有氧化銅(I)(Cu2O)及/或氧化銅(II)(CuO)之共催化劑較佳支撐於含有氧化鈦(IV)(TiO2)或氧化錫(IV)(SnO2)之光催化劑上。可藉由使用氧化鈦(IV)(TiO2)或氧化錫(IV)(SnO2)作為光催化劑且使用氧化銅(I)(Cu2O)及/或氧化銅(II)(CuO)作為共催化劑來形成在可見光回應性及光催化活性上極好且在抗微生物性質上亦尤其好的光催化元件。在本說明書中,將共催化劑CuxO支撐於光催化劑TiO2上的共催化 劑支撐型光催化劑可由CuxO-TiO2來表示。類似地,將共催化劑CuxO支撐於光催化劑SnO2上的共催化劑支撐型光催化劑可由CuxO-SnO2來表示。此處,「CuxO」欲意謂存在兩個類型的氧化銅CuO(X=1;氧化銅(II))及Cu2O(X=2;氧化銅(I))的狀態。 In another preferred embodiment, the photocatalyst contains titanium oxide (IV) (TiO 2 ) or tin (IV) oxide (SnO 2 ), and the cocatalyst contains copper (I) oxide (Cu 2 O) and/or oxidation. Copper (II) (CuO). In this case, the cocatalyst containing copper (I) oxide (Cu 2 O) and/or copper (II) oxide (CuO) is preferably supported to contain titanium oxide (IV) (TiO 2 ) or tin oxide (IV). On the photocatalyst of (SnO 2 ). It is possible to use titanium oxide (IV) (TiO 2 ) or tin (IV) oxide (SnO 2 ) as a photocatalyst and copper (I) (Cu 2 O) and/or copper (II) oxide (CuO) as The cocatalyst forms a photocatalytic element which is excellent in visible light responsiveness and photocatalytic activity and is also particularly excellent in antimicrobial properties. In the present specification, the co-catalyst is supported on a Cu x O type cocatalyst supported on the photocatalyst TiO 2 photocatalyst by Cu x O-TiO 2 is represented. Similarly, the cocatalyst-supporting type photocatalyst supporting the cocatalyst Cu x O on the photocatalyst SnO 2 can be represented by Cu x O-SnO 2 . Here, "Cu x O" is intended to mean a state in which two types of copper oxide CuO (X = 1; copper (II) oxide) and Cu 2 O (X = 2; copper (I) oxide) are present.

在一些實施例中,黏合劑材料可為聚矽氧樹脂。在一些實施例中,聚矽氧樹脂可為(例如)聚矽氧醇酸樹脂、聚矽氧環氧樹脂、聚矽氧丙烯酸系樹脂或聚矽氧聚酯樹脂。在一些實施例中,聚矽氧樹脂為聚矽氧聚酯樹脂。在一些實施例中,合適的聚矽氧聚酯樹脂可為市售產品,例如,KR5230及/或KR5235(Shin-Etsu Chemical Co.,Ltd,Tokyo,Japan)。KR5230可為具有約4%至約44%或約6%至約46%或約8%至約48%或約10%至約50%或約12%至約52%或約14%至約54%或約16%至約56%或類似者之聚矽氧含量的聚矽氧聚酯樹脂。 In some embodiments, the binder material can be a polyoxynoxy resin. In some embodiments, the polyoxynoxy resin can be, for example, a polyoxyl alkyd resin, a polyoxyxa epoxy resin, a polyoxypropylene acrylic resin, or a polyoxymethylene polyester resin. In some embodiments, the polyoxyxene resin is a polyoxymethylene polyester resin. In some embodiments, a suitable polyoxymethylene polyester resin may be a commercially available product, for example, KR5230 and/or KR5235 (Shin-Etsu Chemical Co., Ltd, Tokyo, Japan). KR5230 can be from about 4% to about 44% or from about 6% to about 46% or from about 8% to about 48% or from about 10% to about 50% or from about 12% to about 52% or from about 14% to about 54. Poly orthopolyoxyl resin having a poly ortho-oxygen content of about 1% or about 16% to about 56% or the like.

在一些實施例中,黏合劑材料可為矽烷化合物。在一些實施例中,矽烷化合物可為以下各物中之至少一者:四氯矽烷、四甲氧基矽烷、四乙氧基矽烷、四正丙氧基矽烷、四異丙氧基矽烷、四正丁氧基矽烷及四第二丁氧基矽烷;三氯矽烷、三甲氧基矽烷、三乙氧基矽烷、三正丙氧基矽烷、三異丙氧基矽烷、三正丁氧基矽烷、三第二丁氧基矽烷、氟三氯矽烷、氟三甲氧基矽烷、氟三乙氧基矽烷、氟三正丙氧基矽烷、氟三異丙氧基矽烷、氟三正丁氧基矽烷、氟三第二丁氧基矽烷、甲基三氯矽烷、甲基三甲氧基矽烷、甲基三乙氧基矽烷、甲基三正丙氧基矽烷、甲基三異丙氧基矽烷、甲基三正丁氧基矽烷、甲基三第二丁氧基矽烷、2-(三氟甲基)乙基三氯矽烷、2-(三氟甲基)乙基三甲氧基矽烷、2-(三氟甲基)乙基三乙氧基矽烷、2-(三氟甲基)乙基三正丙氧基矽烷、2-(三氟甲基)乙基三異丙氧基矽烷、2-(三氟甲基)乙基三正丁氧基矽烷、2-(三氟甲基)乙基三第二丁氧基矽烷、2-(全氟正己基)乙基三氯矽烷、2-(全氟正己基)乙基三甲氧基矽烷、2- (全氟正己基)乙基三乙氧基矽烷、2-(全氟正己基)乙基三正丙氧基矽烷、2-(全氟正己基)乙基三異丙氧基矽烷、2-(全氟正己基)乙基三正丁氧基矽烷、2-(全氟正己基)乙基三第二丁氧基矽烷、2-(全氟正辛基)乙基三氯矽烷、2-(全氟正辛基)乙基三甲氧基矽烷、2-(全氟正辛基)乙基三乙氧基矽烷、2-(全氟正辛基)乙基三正丙氧基矽烷、2-(全氟正辛基)乙基三異丙氧基矽烷、2-(全氟正辛基)乙基三正丁氧基矽烷、2-(全氟正辛基)乙基三第二丁氧基矽烷、羥甲基三氯矽烷、羥甲基三甲氧基矽烷、羥乙基三甲氧基矽烷、羥甲基三正丙氧基矽烷、羥甲基三異丙氧基矽烷、羥甲基三正丁氧基矽烷、羥甲基三第二丁氧基矽烷、3-(甲基)丙烯醯氧基丙基三氯矽烷、3-(甲基)丙烯醯氧基丙基三甲氧基矽烷、3-(甲基)丙烯醯氧基丙基三乙氧基矽烷、3-(甲基)丙烯醯氧基丙基三正丙氧基矽烷、3-(甲基)丙烯醯氧基丙基三異丙氧基矽烷、3-(甲基)丙烯醯氧基丙基三正丁氧基矽烷、3-(甲基)丙烯醯氧基丙基三第二丁氧基矽烷、3-巰基丙基三氯矽烷、3-巰基丙基三甲氧基矽烷、3-巰基丙基三乙氧基矽烷、3-巰基丙基三正丙氧基矽烷、3-巰基丙基三異丙氧基矽烷、3-巰基丙基三正丁氧基矽烷、3-巰基丙基三第二丁氧基矽烷、乙烯基三氯矽烷、乙烯基三甲氧基矽烷、乙烯基三乙氧基矽烷、乙烯基三正丙氧基矽烷、乙烯基三異丙氧基矽烷、乙烯基三正丁氧基矽烷、乙烯基三第二丁氧基矽烷、烯丙基三氯矽烷、烯丙基三甲氧基矽烷、烯丙基三乙氧基矽烷、烯丙基三正丙氧基矽烷、烯丙基三異丙氧基矽烷、烯丙基三正丁氧基矽烷、烯丙基三第二丁氧基矽烷、苯基三氯矽烷、苯基三甲氧基矽烷、苯基三乙氧基矽烷、苯基三正丙氧基矽烷、苯基三異丙氧基矽烷、苯基三正丁氧基矽烷及苯基三第二丁氧基矽烷;m係2的式(1)化合物,諸如甲基二氯矽烷、甲基二甲氧基矽烷、甲基二乙氧基矽烷、甲基二正丙氧基矽烷、甲基二異丙氧基矽烷、甲基二正丁氧基矽烷、甲基二第二丁氧基矽 烷、二甲基二氯矽烷、二甲基二甲氧基矽烷、二甲基二乙氧基矽烷、二甲基二正丙氧基矽烷、二甲基二異丙氧基矽烷、二甲基二正丁氧基矽烷、二甲基二第二丁氧基矽烷、(甲基)[2-(全氟正辛基)乙基]二氯矽烷、(甲基)[2-(全氟正辛基)乙基]二甲氧基矽烷、(甲基)[2-(全氟正辛基)乙基]二乙氧基矽烷、(甲基)[2-(全氟正辛基)乙基]二正丙氧基矽烷、(甲基)[2-(全氟正辛基)乙基]二異丙氧基矽烷、(甲基)[2-(全氟正辛基)乙基]二正丁氧基矽烷、(甲基)[2-(全氟正辛基)乙基]二第二丁氧基矽烷、(甲基)(γ-縮水甘油氧基丙基)二氯矽烷、(甲基)(γ-縮水甘油氧基丙基)二甲氧基矽烷、(甲基)(γ-縮水甘油氧基丙基)二乙氧基矽烷、(甲基)(γ-縮水甘油氧基丙基)二正丙氧基矽烷、(甲基))(γ-縮水甘油氧基丙基)二異丙氧基矽烷、(甲基)(γ-縮水甘油氧基丙基)二正丁氧基矽烷、(甲基)(γ-縮水甘油氧基丙基)二第二丁氧基矽烷、(甲基)(3-巰基丙基)二氯矽烷、(甲基)(3-巰基丙基)二甲氧基矽烷、(甲基)(3-巰基丙基)二乙氧基矽烷、(甲基)(3-巰基丙基)二正丙氧基矽烷、(甲基)(3-巰基丙基)二異丙氧基矽烷、(甲基)(3-巰基丙基)二正丁氧基矽烷、(甲基)(3-巰基丙基)二第二丁氧基矽烷、(甲基)(乙烯基)二氯矽烷、(甲基)(乙烯基)二甲氧基矽烷、(甲基)(乙烯基)二乙氧基矽烷、(甲基)(乙烯基)二正丙氧基矽烷、(甲基)(乙烯基)二異丙氧基矽烷、(甲基)(乙烯基)二正丁氧基矽烷、(甲基)(乙烯基)二第二丁氧基矽烷、二乙烯基二氯矽烷、二乙烯基二甲氧基矽烷、二乙烯基二乙氧基矽烷、二乙烯基二正丙氧基矽烷、二乙烯基二異丙氧基矽烷、二乙烯基二正丁氧基矽烷、二乙烯基二第二丁氧基矽烷、二苯基二氯矽烷、二苯基二甲氧基矽烷、二苯基二乙氧基矽烷、二苯基二正丙氧基矽烷、二苯基二異丙氧基矽烷、二苯基二正丁氧基矽烷及二苯基二第二丁氧基矽烷;及m係3的式(1)化合物,諸如氯二甲基矽烷、甲氧基二甲基矽烷、乙氧基二甲基矽烷、氯三甲基矽烷、溴三甲基矽烷、碘三甲基矽烷、甲氧基 三甲基矽烷、乙氧基三甲基矽烷、正丙氧基三甲基矽烷、異丙氧基三甲基矽烷、正丁氧基三甲基矽烷、第二丁氧基三甲基矽烷、第三丁氧基三甲基矽烷、(氯)(乙烯基)二甲基矽烷、(甲氧基)(乙烯基)二甲基矽烷、(乙氧基)(乙烯基)二甲基矽烷、(氯)(甲基)二苯基矽烷、(甲氧基)(甲基)二苯基矽烷及(乙氧基)(甲基)二苯基矽烷。 In some embodiments, the binder material can be a decane compound. In some embodiments, the decane compound can be at least one of the following: tetrachlorodecane, tetramethoxy decane, tetraethoxy decane, tetra-n-propoxy decane, tetraisopropoxy decane, four N-butoxy decane and tetra-butoxy decane; trichlorodecane, trimethoxy decane, triethoxy decane, tri-n-propoxy decane, triisopropoxy decane, tri-n-butoxy decane, Three second butoxy decane, fluorotrichloro decane, fluorotrimethoxy decane, fluorotriethoxy decane, fluorotri-n-propoxy decane, fluorotriisopropoxy decane, fluorotri-n-butoxy decane, Fluorinated tributoxybutane, methyltrichlorodecane, methyltrimethoxydecane, methyltriethoxydecane, methyltri-n-propoxydecane, methyltriisopropoxydecane, methyl Tri-n-butoxy decane, methyl tri-tert-butoxy decane, 2-(trifluoromethyl)ethyltrichlorodecane, 2-(trifluoromethyl)ethyltrimethoxynonane, 2-(three Fluoromethyl)ethyltriethoxydecane, 2-(trifluoromethyl)ethyltri-n-propoxydecane, 2-(trifluoromethyl)ethyltriisopropoxydecane, 2-(three Fluoromethyl) Tri-n-butoxy decane, 2-(trifluoromethyl)ethyltri-n-butoxy decane, 2-(perfluoro-n-hexyl)ethyltrichlorodecane, 2-(perfluoro-n-hexyl)ethyltrimethyl Oxydecane, 2- (Perfluoro-n-hexyl)ethyltriethoxydecane, 2-(perfluoro-n-hexyl)ethyltri-n-propoxydecane, 2-(perfluoro-n-hexyl)ethyltriisopropoxydecane, 2- (Perfluoro-n-hexyl)ethyltri-n-butoxydecane, 2-(perfluoro-n-hexyl)ethyltri-t-butoxydecane, 2-(perfluoro-n-octyl)ethyltrichloromethane, 2- (Perfluoro-n-octyl)ethyltrimethoxydecane, 2-(perfluoro-n-octyl)ethyltriethoxydecane, 2-(perfluoro-n-octyl)ethyltri-n-propoxydecane, 2 -(perfluoro-n-octyl)ethyltriisopropoxydecane, 2-(perfluoro-n-octyl)ethyltri-n-butoxydecane, 2-(perfluoro-n-octyl)ethyltri-second Oxydecane, hydroxymethyltrichlorodecane, hydroxymethyltrimethoxydecane, hydroxyethyltrimethoxydecane, hydroxymethyltri-n-propoxydecane, hydroxymethyltriisopropoxydecane, hydroxymethyl Tri-n-butoxy decane, hydroxymethyl three-butoxy decane, 3-(methyl) propylene methoxy propyl trichloro decane, 3-(methyl) propylene methoxy propyl trimethoxy decane , 3-(methyl)propenyloxypropyltriethoxydecane, 3-(methyl)propenyloxypropyltri-n-propoxydecane, 3- (Meth) propylene methoxy propyl triisopropoxy decane, 3-(methyl) propylene methoxy propyl tri-n-butoxy decane, 3-(methyl) propylene methoxy propyl tri Dibutoxydecane, 3-mercaptopropyltrichlorodecane, 3-mercaptopropyltrimethoxydecane, 3-mercaptopropyltriethoxydecane, 3-mercaptopropyltri-n-propoxydecane, 3- Mercaptopropyl triisopropoxy decane, 3-mercaptopropyl tri-n-butoxy decane, 3-mercaptopropyl tri-tert-butoxy decane, vinyl trichloro decane, vinyl trimethoxy decane, vinyl Triethoxy decane, vinyl tri-n-propoxy decane, vinyl triisopropoxy decane, vinyl tri-n-butoxy decane, vinyl tri-tert-butoxy decane, allyl trichloro decane, Allyl trimethoxy decane, allyl triethoxy decane, allyl tri-n-propoxy decane, allyl triisopropoxy decane, allyl tri-n-butoxy decane, allyl Three second butoxy decane, phenyl trichloro decane, phenyl trimethoxy decane, phenyl triethoxy decane, phenyl tri-n-propoxy decane, phenyl triisopropoxy decane, phenyl a compound of the formula (1), such as methyl dichlorodecane, methyl dimethoxy decane, methyl diethoxy decane, a methyl 2-butoxy decane and a phenyl tri-butoxy decane; Di-n-propoxy decane, methyl diisopropoxy decane, methyl di-n-butoxy decane, methyl di-n-butoxy fluorene Alkane, dimethyl dichlorodecane, dimethyl dimethoxy decane, dimethyl diethoxy decane, dimethyl di-n-propoxy decane, dimethyl diisopropoxy decane, dimethyl Di-n-butoxy decane, dimethyldi-second butoxy decane, (methyl)[2-(perfluoro-n-octyl)ethyl]dichlorodecane, (methyl)[2-(perfluoro-positive Octyl)ethyl]dimethoxydecane, (methyl)[2-(perfluoro-n-octyl)ethyl]diethoxydecane, (methyl)[2-(perfluoro-n-octyl) Di-n-propoxy decane, (methyl)[2-(perfluoro-n-octyl)ethyl]diisopropoxy decane, (methyl)[2-(perfluoro-n-octyl)ethyl] Di-n-butoxy decane, (methyl) [2-(perfluoro-n-octyl)ethyl] bis-butoxy decane, (methyl) (γ-glycidoxypropyl) dichloro decane, (methyl)(γ-glycidoxypropyl)dimethoxydecane, (methyl)(γ-glycidoxypropyl)diethoxydecane, (methyl)(γ-glycidoxy Propyl) di-n-propoxy decane, (methyl)) (γ-glycidoxypropyl) diisopropoxy decane, (methyl) (γ-glycidoxypropyl) di-n-butyl Oxydecane, (methyl) (gamma-glycoside) Oxypropyl)di-butoxybutane, (methyl)(3-mercaptopropyl)dichlorodecane, (methyl)(3-mercaptopropyl)dimethoxydecane, (methyl) ( 3-mercaptopropyl)diethoxydecane, (methyl)(3-mercaptopropyl)di-n-propoxydecane, (methyl)(3-mercaptopropyl)diisopropoxydecane, (A (3-mercaptopropyl)di-n-butoxydecane, (methyl)(3-mercaptopropyl)di-butoxybutane, (methyl)(vinyl)dichlorodecane, (methyl (vinyl)dimethoxydecane, (meth)(vinyl)diethoxydecane, (methyl)(vinyl)di-n-propoxydecane, (methyl)(vinyl) diiso Propoxy decane, (methyl) (vinyl) di-n-butoxy decane, (methyl) (vinyl) di-butoxy decane, divinyl dichloro decane, divinyl dimethoxy Decane, divinyldiethoxydecane, divinyldi-n-propoxydecane, divinyldiisopropoxydecane, divinyldi-n-butoxydecane, divinyldi-butoxy Decane, diphenyldichlorodecane, diphenyldimethoxydecane, diphenyldiethoxydecane, diphenyldi-n-propoxy a compound of formula (1), such as chlorodimethyl, of decane, diphenyl diisopropoxy decane, diphenyl di-n-butoxy decane, and diphenyl bis second butoxy decane; Decane, methoxy dimethyl decane, ethoxy dimethyl decane, chlorotrimethyl decane, bromotrimethyl decane, iodine trimethyl decane, methoxy Trimethyl decane, ethoxy trimethyl decane, n-propoxy trimethyl decane, isopropoxy trimethyl decane, n-butoxy trimethyl decane, second butoxy trimethyl decane, Third butoxy trimethyl decane, (chloro) (vinyl) dimethyl decane, (methoxy) (vinyl) dimethyl decane, (ethoxy) (vinyl) dimethyl decane, (Chloro) (methyl) diphenyl decane, (methoxy) (methyl) diphenyl decane and (ethoxy) (methyl) diphenyl decane.

在此,將上文所提及之式(1)展示如下。 Here, the formula (1) mentioned above is shown below.

(R2)m-Si-(Y2)4-m (1) (R 2 ) m -Si-(Y 2 ) 4-m (1)

(其中Y2係氯原子、溴原子、碘原子,或具有1至20個碳原子的直鏈、分支或環狀烷氧基,R2係氫原子、氟原子、具有1至20個碳原子的直鏈、分支或環狀烷基、具有1至20個碳原子的直鏈、分支或環狀經取代烷基、具有2至20個碳原子的直鏈、分支或環狀烯基、具有6至20個碳原子的芳基或具有7至20個碳原子的芳烷基,且m為0至3的整數)。 (wherein Y 2 is a chlorine atom, a bromine atom, an iodine atom, or a linear, branched or cyclic alkoxy group having 1 to 20 carbon atoms, and the R 2 -based hydrogen atom, a fluorine atom, having 1 to 20 carbon atoms a straight chain, branched or cyclic alkyl group, a linear, branched or cyclic substituted alkyl group having 1 to 20 carbon atoms, a linear, branched or cyclic alkenyl group having 2 to 20 carbon atoms, An aryl group of 6 to 20 carbon atoms or an aralkyl group having 7 to 20 carbon atoms, and m is an integer of 0 to 3).

在一些實施例中,矽烷化合物可為以下各物中之至少一者:四甲氧基矽烷、四乙氧基矽烷、甲基三甲氧基矽烷、甲基三乙氧基矽烷、3-(甲基)丙烯醯氧基丙基三甲氧基矽烷、3-(甲基)丙烯醯氧基丙基三乙氧基矽烷、乙烯基三甲氧基矽烷、乙烯基三乙氧基矽烷、烯丙基三甲氧基矽烷、烯丙基三乙氧基矽烷、苯基三甲氧基矽烷、苯基三乙氧基矽烷、二甲基二甲氧基矽烷及二甲基二乙氧基矽烷。 In some embodiments, the decane compound can be at least one of the following: tetramethoxy decane, tetraethoxy decane, methyl trimethoxy decane, methyl triethoxy decane, 3- (A) Acryloxypropyltrimethoxydecane, 3-(meth)acryloxypropyltriethoxydecane, vinyltrimethoxydecane, vinyltriethoxydecane,allyltrimethyl Oxy decane, allyl triethoxy decane, phenyl trimethoxy decane, phenyl triethoxy decane, dimethyl dimethoxy decane, and dimethyl diethoxy decane.

矽烷化合物的部分縮合物的市售產品包括(例如)(Shin-Etsu Silicones KK的)KC-89、KC-89S、X-21-3153、X-21-5841、X-21-5842、X-21-5843、X-21-5844、X-21-5845、X-21-5846、X-21-5847、X-21-5848、X-22-160AS、X-22-170B、X-22-170BX、X-22-170D、X-22-170DX、X-22-176B、X-22-176D、X-22-176DX、X-22-176F、X-40-2308、X-40-2651、X-40-2655A、X-40-2671、X-40-2672、X-40-9220、X-40-9225、X-40-9227、X-40-9246、X-40-9247、X-40-9250、 X-40-9323、X-41-1053、X-41-1056、X-41-1805、X-41-1810、KF6001、KF6002、KF6003、KR212、KR-213、KR-217、KR220L、KR242A、KR271、KR282、KR300、KR311、KR401N、KR500、KR510、KR5206、KR5230、KR5235、KR9218及KR9706;(Showa Denko K.K.的)玻璃樹脂(Glass Resin);(Toray Dow Corning Silicone Co.,Ltd.的)SH804、SH805、SH806A、SH840、SR2400、SR2402、SR2405、SR2406、SR2410、SR2411、SR2416及SR2420;(Nippon Unicar Co.,Ltd.的)FZ3711及FZ3722;(Chisso Corporation的)DMS-S12、DMS-S15、DMS-S21、DMS-S27、DMS-S31、DMS-S32、DMS-S33、DMS-S35、DMS-S38、DMS-S42、DMS-S45、DMS-S51、DMS-227、PDS-0332、PDS-1615、PDS-9931及XMS-5025;(Mitsubishi Chemical Corporation的)矽酸甲酯MS51及矽酸甲酯MS56;(Colcoat Co.,Ltd.的)矽酸乙酯28、矽酸乙酯40及矽酸乙酯48;及(Showa Denko K.K.的)GR100、GR650、GR908及GR950、(Wacker Chemie AG的)SMP100。在本實施例中,以上矽烷化合物及其部分縮合物可單獨使用或以兩種或兩種以上之組合使用。 Commercially available products of partial condensates of decane compounds include, for example, (Shin-Etsu Silicones KK) KC-89, KC-89S, X-21-3153, X-21-5841, X-21-5842, X- 21-5843, X-21-5844, X-21-5845, X-21-5846, X-21-5847, X-21-5848, X-22-160AS, X-22-170B, X-22- 170BX, X-22-170D, X-22-170DX, X-22-176B, X-22-176D, X-22-176DX, X-22-176F, X-40-2308, X-40-2651, X-40-2655A, X-40-2671, X-40-2672, X-40-9220, X-40-9225, X-40-9227, X-40-9246, X-40-9247, X- 40-9250, X-40-9323, X-41-1053, X-41-1056, X-41-1805, X-41-1810, KF6001, KF6002, KF6003, KR212, KR-213, KR-217, KR220L, KR242A, KR271, KR282, KR300, KR311, KR401N, KR500, KR510, KR5206, KR5230, KR5235, KR9218 and KR9706; (Showa Denko KK) glass resin (Glass Resin); (Toray Dow Corning Silicone Co., Ltd.) SH804 , SH805, SH806A, SH840, SR2400, SR2402, SR2405, SR2406, SR2410, SR2411, SR2416 and SR2420; (Nippon Unicar Co., Ltd.) FZ3711 and FZ3722; (Chisso Corporation) DMS-S12, DMS-S15, DMS-S21, DMS-S27, DMS-S31, DMS-S32, DMS-S33, DMS-S35, DMS-S38, DMS-S42, DMS-S45, DMS-S51, DMS-227, PDS-0332, PDS- 1615, PDS-9931 and XMS-5025; (Mitsubishi Chemical Corporation) methyl citrate MS51 and methyl decanoate MS56; (Colcoat Co., Ltd.) ethyl citrate 28, ethyl citrate 40 and hydrazine Acid ethyl ester 48; and (Showa Denko KK) GR100, GR650, GR908 and GR950, (Wacker Chemie AG) SMP100. In the present embodiment, the above decane compound and a partial condensate thereof may be used singly or in combination of two or more kinds.

在一些實施例中,可將黏合劑催化劑添加至黏合劑/光催化懸浮液。在一些實施例中,黏合劑催化劑可為鈦醇鹽。一個合適實例可為可購自Shin-Etsu Chemical Co.,Ltd.之鈦醇鹽(D25)。 In some embodiments, a binder catalyst can be added to the binder/photocatalytic suspension. In some embodiments, the binder catalyst can be a titanium alkoxide. A suitable example may be a titanium alkoxide (D25) commercially available from Shin-Etsu Chemical Co., Ltd.

在一些實施例中,提供光催化懸浮液,其包含光催化材料、黏合劑及有機溶劑。在一些實施例中,黏合劑可溶解於有機溶劑中。在一些實施例中,光催化材料實質上不溶解於有機溶劑中。在一些實施例中,有機溶劑可為(例如)烴、酮、酯、醚或醇。 In some embodiments, a photocatalytic suspension comprising a photocatalytic material, a binder, and an organic solvent is provided. In some embodiments, the binder can be dissolved in an organic solvent. In some embodiments, the photocatalytic material is substantially insoluble in the organic solvent. In some embodiments, the organic solvent can be, for example, a hydrocarbon, a ketone, an ester, an ether, or an alcohol.

以上烴之實例包括甲苯及茬;以上酮之實例包括甲基乙基酮、甲基異丁基酮、甲基正戊基酮、二乙基酮及環己酮;以上酯之實例包括乙酸乙酯、乙酸正丁酯、乙酸異戊酯、丙二醇單甲醚乙酸酯、3-甲 氧基丁基乙酸酯及乳酸乙酯;以上醚之實例包括乙二醇二甲醚、乙二醇二乙醚、四氫呋喃及二噁烷;且以上醇之實例包括1-己醇、4-甲基-2-戊醇、乙二醇單甲醚、乙二醇單乙醚、乙二醇單正丙醚、乙二醇單正丁醚、丙二醇單甲醚、丙二醇單乙醚及丙二醇單正丙醚。在一些實施例中,提供黏合劑及光催化材料懸浮液進一步包含將聚矽氧改性之聚酯樹脂溶解於丙二醇溶劑中。在一些實施例中,丙二醇溶劑可為丙二醇甲基醚乙酸酯。在一些實施例中,丙二醇溶劑係丙二醇甲基醚乙酸酯。 Examples of the above hydrocarbons include toluene and hydrazine; examples of the above ketones include methyl ethyl ketone, methyl isobutyl ketone, methyl n-pentyl ketone, diethyl ketone, and cyclohexanone; examples of the above esters include ethyl acetate Ester, n-butyl acetate, isoamyl acetate, propylene glycol monomethyl ether acetate, 3-methyl Oxybutyl butyl acetate and ethyl lactate; examples of the above ether include ethylene glycol dimethyl ether, ethylene glycol diethyl ether, tetrahydrofuran and dioxane; and examples of the above alcohol include 1-hexanol, 4-methyl Base-2-pentanol, ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, ethylene glycol mono-n-propyl ether, ethylene glycol mono-n-butyl ether, propylene glycol monomethyl ether, propylene glycol monoethyl ether and propylene glycol mono-n-propyl ether . In some embodiments, providing the binder and the photocatalytic material suspension further comprises dissolving the polyfluorene-modified polyester resin in a propylene glycol solvent. In some embodiments, the propylene glycol solvent can be propylene glycol methyl ether acetate. In some embodiments, the propylene glycol solvent is propylene glycol methyl ether acetate.

此等有機溶劑可單獨使用或以兩種或兩種以上之組合使用。 These organic solvents may be used singly or in combination of two or more kinds.

在一些實施例中,以約0.5至2.0份黏合劑(重量比)對約1份(重量比)光催化材料之比提供黏合劑對光催化材料。熟習此項技術者應認識到,1:5重量比可為約34.8vol%;且1:20wt%可為約11.8vol%。在一些實施例中,以約0.5至2.0份黏合劑對約1份光催化材料(按重量計)之比提供黏合劑對光催化材料。在一些實施例中,以按重量計約8至12份黏合劑(10%溶液中之黏合劑)對約1份光催化材料(例如,約0.5份黏合劑對約1份光催化材料)之比提供黏合劑對光催化材料。儘管不希望受理論限制,但具有小於0.5份黏合劑對約1份光催化材料之比可導致光催化材料對基板之表面的不充分黏附。熟習此項技術者可認識到,用於評估黏附性之合適方法可藉由(但不限於)ASTM D3359。儘管不希望受理論限制,但具有大於2.0份黏合劑對1.0份光催化材料(重量%)之比可導致曝露在塗層之表面以外的光催化材料的量不足。 In some embodiments, the binder-to-photocatalytic material is provided in a ratio of from about 0.5 to about 2.0 parts by weight of the binder (by weight) to about 1 part by weight of the photocatalytic material. Those skilled in the art will recognize that a 1:5 weight ratio can be about 34.8 vol%; and a 1:20 wt% can be about 11.8 vol%. In some embodiments, the binder-to-photocatalytic material is provided in a ratio of from about 0.5 to about 2.0 parts of the binder to about 1 part of the photocatalytic material (by weight). In some embodiments, from about 8 to 12 parts by weight of binder (10% solution binder) to about 1 part of photocatalytic material (eg, about 0.5 parts of binder to about 1 part of photocatalytic material) Provides a binder to the photocatalytic material. Although not wishing to be bound by theory, having a ratio of less than 0.5 parts of binder to about 1 part of the photocatalytic material can result in insufficient adhesion of the photocatalytic material to the surface of the substrate. Those skilled in the art will recognize that suitable methods for assessing adhesion can be by, but not limited to, ASTM D3359. Although not wishing to be bound by theory, having a ratio of greater than 2.0 parts of binder to 1.0 part of photocatalytic material (% by weight) may result in insufficient amount of photocatalytic material to be exposed outside of the surface of the coating.

在一些實施例中,將光催化/黏合劑材料應用於基板。在一些實施例中,基板可為熱塑性聚合物。在一些實施例中,基板可為熱固性聚合物。在一些實施例中,基板可為以下各物中之任一者:聚乙烯、聚丙烯、聚酯、聚苯乙烯、聚醯胺、聚醯亞胺、聚碸、聚醚碸(PES)、聚丙烯酸酯、聚丙烯腈、聚碳酸酯(PC)、聚甲基丙烯酸甲酯 (PMMA)、聚氯乙烯(PVC)、乙烯乙酸乙烯酯(EVA)、聚偏二氟乙烯(PVDF)、聚醚醚酮(PEEK)及/或其混合物。在一些實施例中,基板可包含聚酯。在一些實施例中,聚酯可為(例如)聚對苯二甲酸伸乙酯(PET)、聚對苯二甲酸丁二酯(PBT)、聚萘二甲酸伸乙酯(PEN)。 In some embodiments, a photocatalytic/adhesive material is applied to the substrate. In some embodiments, the substrate can be a thermoplastic polymer. In some embodiments, the substrate can be a thermoset polymer. In some embodiments, the substrate can be any of the following: polyethylene, polypropylene, polyester, polystyrene, polyamido, polyimine, polyfluorene, polyether oxime (PES), Polyacrylate, polyacrylonitrile, polycarbonate (PC), polymethyl methacrylate (PMMA), polyvinyl chloride (PVC), ethylene vinyl acetate (EVA), polyvinylidene fluoride (PVDF), polyetheretherketone (PEEK), and/or mixtures thereof. In some embodiments, the substrate can comprise a polyester. In some embodiments, the polyester can be, for example, polyethylene terephthalate (PET), polybutylene terephthalate (PBT), polyethylene naphthalate (PEN).

在一些實施例中,基板可包含熱固性樹脂。在一些實施例中,熱固性樹脂可包含酚醛樹脂。在一些實施例中,熱固性樹脂可包含聚氧苄基亞甲基乙二醇酸酐(膠木)、環氧/玻璃纖維、環氧/碳纖維及任何纖維加強之塑膠材料。在一些實施例中,環氧-玻璃纖維複合物可為聽診器隔膜(例如,由Littman[3M,Minneapolis,MN]銷售之市售實施例)之形式。 In some embodiments, the substrate can comprise a thermoset resin. In some embodiments, the thermosetting resin may comprise a phenolic resin. In some embodiments, the thermosetting resin may comprise polyoxybenzylidene glycol anhydride (bakelite), epoxy/glass fiber, epoxy/carbon fiber, and any fiber reinforced plastic material. In some embodiments, the epoxy-glass fiber composite can be in the form of a stethoscope diaphragm (eg, a commercially available embodiment sold by Littman [3M, Minneapolis, MN]).

在一些實施例中,基板包含經受預處理以增加塗層與基板之間的黏附之聚合物薄膜。在一些實施例中,經預處理之薄膜及或基板係經化學處理、電暈處理或加熱處理以增加塗層至基板之黏附。合適的經化學處理薄膜之市售產品包括(但不限於)3SAB/3SAC;3LD4;4407/4507;2SABN/2SACN(Mitsubishi Polyester Films,Greer,SC,美國)。在一些實施例中,基板係用偶合劑預處理以增進聚合物黏合劑與基板之間的黏附。在一些實施例中,偶合劑可為先前所列之偶合劑中之任一者。在一些實施例中,偶合劑可為胺基丙基三乙氧基矽烷、烯丙基三甲氧基矽烷、(3-胺丙基)三乙氧基矽烷、3-胺丙基(二乙氧基)甲基矽烷、(3-胺基)三甲氧基矽烷胺基丙基三乙氧基矽烷(APTES)。偶合劑的合適量已描述於「A Study of Adhesion of Silicon Dioxide on Polymeric Substrates for Optoelectronic Applications」(Optoelectronic Devices & Properties,ed.,Sergiyuenko,Oleg.InTech Europe,Rijeka,Croatia(2011),第2章,23-40頁,26)中。在一些實施例中,將混合物應用於基板進一步包含以每分鐘約500轉至每分鐘約3000轉將黏合劑-光催化材料溶液旋塗於基板上歷時約5秒至約30秒之 間。在一個實施例中,旋塗可為約1200RPM歷時約20秒。 In some embodiments, the substrate comprises a polymeric film that is subjected to a pretreatment to increase adhesion between the coating and the substrate. In some embodiments, the pretreated film and or substrate is chemically treated, corona treated, or heat treated to increase adhesion of the coating to the substrate. Commercially available products of suitable chemically treated films include, but are not limited to, 3SAB/3SAC; 3LD4; 4407/4507; 2SABN/2SACN (Mitsubishi Polyester Films, Greer, SC, USA). In some embodiments, the substrate is pretreated with a coupling agent to promote adhesion between the polymer binder and the substrate. In some embodiments, the coupling agent can be any of the previously listed coupling agents. In some embodiments, the coupling agent can be aminopropyl triethoxy decane, allyl trimethoxy decane, (3-aminopropyl) triethoxy decane, 3-aminopropyl (diethoxy) Methyl decane, (3-amino)trimethoxydecylaminopropyltriethoxydecane (APTES). Suitable amounts of coupling agents are described in "A Study of Adhesion of Silicon Dioxide on Polymeric Substrates for Optoelectronic Applications" (Optoelectronic Devices & Properties, ed., Sergiyuenko, Oleg. InTech Europe, Rijeka, Croatia (2011), Chapter 2, 23-40 pages, 26). In some embodiments, applying the mixture to the substrate further comprises spin coating the adhesive-photocatalytic material solution onto the substrate at about 500 revolutions per minute to about 3000 revolutions per minute for about 5 seconds to about 30 seconds. between. In one embodiment, the spin coating can be about 1200 RPM for about 20 seconds.

在一些實施例中,將混合物應用於基板進一步包含在基板上澆注混合物。合適澆注程序已描述於2012年10月9日頒予之美國專利第8,283,843號中,該美國專利以全文引用的方式併入。在一些實施例中,刀片間隙可在0.5密耳至約50密耳之間、在約2.0密耳至約35密耳之間;或在約3.5密耳至約20密耳之間。在一些實施例中,可藉由用線大小在0.003吋至0.020吋之範圍中的繞線實驗室棒(Paul N.Gardner Inc.)在基板上塗覆光催化懸浮液來形成光催化塗層。 In some embodiments, applying the mixture to the substrate further comprises casting the mixture on the substrate. A suitable casting procedure is described in U.S. Patent No. 8,283,843 issued toK. In some embodiments, the blade gap can be between 0.5 mils to about 50 mils, between about 2.0 mils to about 35 mils; or between about 3.5 mils to about 20 mils. In some embodiments, the photocatalytic coating can be formed by coating a photocatalytic suspension on a substrate with a wound laboratory rod (Paul N. Gardner Inc.) having a wire size in the range of 0.003 Å to 0.020 。.

在一些實施例中,方法進一步包含處理基板之表面。在一些實施例中,表面之處理進一步包括將額外黏附材料添加至基板表面及/或添加至光催化層,及/或在基板表面與光催化層之間安置額外的黏附材料層。在一些實施例中,該額外層可為基板與光催化塗層之間的底塗層。在一些實施例中,底塗層係安置於基板表面上或與基板表面接觸。在一些實施例中,底塗層包含有機溶劑及矽烷偶合劑。在一些實施例中,矽烷偶合劑可包括以下各物中之任一者:胺丙基三乙氧基矽烷、烯丙基三甲氧基矽烷、(3-胺丙基)三乙氧基矽烷、3-胺丙基(二乙氧基)甲基矽烷、(3-胺基)三甲氧基矽烷、乙烯基三甲氧基矽烷、乙烯基三乙氧基矽烷、2-(3,4-環氧環己基)乙基三甲氧基矽烷、3-縮水甘油氧基丙基三甲氧基矽烷、3-縮水甘油氧基丙基甲基二乙氧基矽烷、3-縮水甘油氧基丙基三乙氧基矽烷、對苯乙烯基三甲氧基矽烷、3-甲基丙烯醯氧基丙基甲基二甲氧基矽烷、3-甲基丙烯醯氧基丙基三甲氧基矽烷、3-甲基丙烯醯氧基丙基甲基二乙氧基矽烷、3-甲基丙烯醯氧基丙基三乙氧基矽烷、3-丙烯醯氧基丙基三甲氧基矽烷、N-2-(胺基乙基)-3-胺丙基甲基二甲氧基矽烷、N-2-(胺基乙基)-3-胺丙基三甲氧基矽烷、N-苯基-3-胺丙基三甲氧基矽烷、N-(乙烯基苄基)-2-胺基乙基-3-胺丙基三甲氧基矽烷氫氯化物、3-脲基丙基三乙氧基矽烷、3-巰基 丙基甲基二甲氧基矽烷、3-巰基丙基三甲氧基矽烷、雙(三乙氧基矽烷基丙基)四硫化物及/或3-異氰酸酯丙基三乙氧基矽烷。在一些實施例中,偶合劑可為胺丙基三乙氧基矽烷(APTES)。 In some embodiments, the method further comprises processing the surface of the substrate. In some embodiments, the treatment of the surface further comprises adding additional adhesion material to the surface of the substrate and/or to the photocatalytic layer, and/or placing an additional layer of adhesion material between the surface of the substrate and the photocatalytic layer. In some embodiments, the additional layer can be an undercoat layer between the substrate and the photocatalytic coating. In some embodiments, the primer layer is disposed on or in contact with the surface of the substrate. In some embodiments, the undercoat layer comprises an organic solvent and a decane coupling agent. In some embodiments, the decane coupling agent can include any of the following: amine propyl triethoxy decane, allyl trimethoxy decane, (3-aminopropyl) triethoxy decane, 3-aminopropyl(diethoxy)methylnonane, (3-amino)trimethoxydecane, vinyltrimethoxydecane, vinyltriethoxydecane, 2-(3,4-epoxy Cyclohexyl)ethyltrimethoxydecane, 3-glycidoxypropyltrimethoxydecane, 3-glycidoxypropylmethyldiethoxydecane, 3-glycidoxypropyltriethoxylate Baseline, p-styryltrimethoxydecane, 3-methylpropenyloxypropylmethyldimethoxydecane, 3-methylpropenyloxypropyltrimethoxydecane, 3-methylpropene醯oxypropylmethyldiethoxydecane, 3-methylpropenyloxypropyltriethoxydecane, 3-propenyloxypropyltrimethoxydecane, N-2-(Amino B) 3-aminopropylmethyldimethoxydecane, N-2-(aminoethyl)-3-aminopropyltrimethoxydecane, N-phenyl-3-aminopropyltrimethoxy Decane, N-(vinylbenzyl)-2-aminoethyl-3-aminopropyltrimethoxy Alkoxy hydrochloride, 3-ureido-propyl triethoxy Silane, 3-mercaptopropionic Propylmethyldimethoxydecane, 3-mercaptopropyltrimethoxydecane, bis(triethoxydecylpropyl)tetrasulfide and/or 3-isocyanatepropyltriethoxydecane. In some embodiments, the coupling agent can be amine propyl triethoxy decane (APTES).

在一些實施例中,表面之處理可為藉由(但不限於)化學處理(例如,酸處理、鹼處理、溶劑處理表面)、臭氧處理、電暈處理及/或熱處理基板表面以使塗層至基板之黏附增加。亦藉由使用硫酸(10wt%至60wt%)來應用基板之表面處理。合適的經化學處理薄膜包括經電暈電漿處理之聚酯薄膜。在一些實施例中,光催化材料包含填充至多相氧化鈦上之CuxO,例如,可購自Evonik之P25。在一些實施例中,光催化材料可為Ti:Sn(C,N,O)2、CuxO、P25、SnO2中之任一者或全部。 In some embodiments, the surface treatment may be by, but not limited to, chemical treatment (eg, acid treatment, alkali treatment, solvent treatment of the surface), ozone treatment, corona treatment, and/or heat treatment of the substrate surface to render the coating Adhesion to the substrate increases. The surface treatment of the substrate is also applied by using sulfuric acid (10 wt% to 60 wt%). Suitable chemically treated films include corona-treated polyester films. In some embodiments, the photocatalytic material comprises Cu x O that is packed onto the multiphase titanium oxide, for example, P25, available from Evonik. In some embodiments, the photocatalytic material can be any or all of Ti:Sn(C,N,O) 2 , Cu x O, P25, SnO 2 .

在一些實施例中,方法包含以足以移除實質上全部溶劑之時間及溫度乾燥基板表面上之黏合劑/光催化懸浮液。在一些實施例中,乾燥係在一溫度下執行且持續一時間,以使黏合劑部分固化但不使基板變形。舉例而言,在一個實施例中,PET基板(其上具有光催化塗層)可在環境氣氛中在110℃下乾燥歷時約1小時。 In some embodiments, the method comprises drying the binder/photocatalytic suspension on the surface of the substrate at a time and temperature sufficient to remove substantially all of the solvent. In some embodiments, the drying is performed at a temperature for a period of time to partially cure the adhesive without deforming the substrate. For example, in one embodiment, a PET substrate having a photocatalytic coating thereon can be dried at 110 ° C for about 1 hour in an ambient atmosphere.

在一些實施例中,用於製造光催化元件之方法包含:提供KR-5230(10wt%)/PGMEA(90wt%)溶液;以10:1(w/w)黏合劑:光催化之比將光催化CuxO/多相TiO2混合粉末添加至溶液;用電暈處理對PET表面進行預處理;及以約20至80rps將該溶液旋塗於該經預處理之PET表面上歷時約30至60秒。 In some embodiments, a method for fabricating a photocatalytic element comprises: providing a KR-5230 (10 wt%) / PGMEA (90 wt%) solution; and using a 10: 1 (w/w) binder: photocatalytic ratio to light Catalyzing the Cu x O/heterogeneous TiO 2 mixed powder to the solution; pretreating the PET surface by corona treatment; and spin coating the solution onto the pretreated PET surface at about 20 to 80 rps for about 30 to 60 seconds.

在一些實施例中,多相TiO2包含銳鈦礦相TiO2及金紅石相TiO2。在一些實施例中,多相TiO2包含約50%至約90%的銳鈦礦相TiO2及約50%至約10%的金紅石相TiO2。在一些實施例中,多相TiO2包含(例如)可自Evonik購得之約83%的銳鈦礦相TiO2及約17%的金紅石相TiO2(P25)。 In some embodiments, the heterogeneous TiO 2 comprises anatase phase TiO 2 and rutile phase TiO 2 . In some embodiments, the heterogeneous TiO 2 comprises from about 50% to about 90% anatase phase TiO 2 and from about 50% to about 10% rutile phase TiO 2 . In some embodiments, the heterogeneous TiO 2 comprises, for example, about 83% anatase phase TiO 2 available from Evonik and about 17% rutile phase TiO 2 (P25).

在一些實施例中,可根據上文所述之方法製造光催化元件。在一些實施例中,光催化元件包含聚矽氧聚酯樹脂及光催化材料,其中樹脂與光催化材料之比在約0.5至約2.0比約1之間(例如,1:2)。在一些實施例中,聚矽氧聚酯樹脂係選自KR500、KR5230及KR5235。在一些實施例中,光催化材料可選自摻雜或未摻雜、填充或未填充的先前所述氧化物。在一些實施例中,光催化材料可為填充氧化銅(CuxO)之多相氧化鈦(例如,P25)、填充氧化銅(CuxO)之Sn/C/N摻雜氧化鈦(Ti:Sn(CNO)2)及/或未填充的Ti:Sn(C,N,O)2In some embodiments, the photocatalytic element can be fabricated according to the methods described above. In some embodiments, the photocatalytic element comprises a polyoxymethylene polyester resin and a photocatalytic material, wherein the ratio of resin to photocatalytic material is between about 0.5 and about 2.0 to about 1 (eg, 1:2). In some embodiments, the polyoxymethylene polyester resin is selected from the group consisting of KR500, KR5230, and KR5235. In some embodiments, the photocatalytic material can be selected from the previously described oxides that are doped or undoped, filled or unfilled. In some embodiments, the photocatalytic material may be filled with copper oxide (Cu x O) of the multi-phase titanium oxide (e.g., P25), filled with copper oxide (Cu x O) of Sn / C / N-doped titanium oxide (Ti :Sn(CNO) 2 ) and/or unfilled Ti:Sn(C,N,O) 2 .

在一些實施例中,安置於經塗佈表面中或上的多種光催化材料之標稱厚度可藉由石英晶體微天平(其量測沈積至其上之質量)來量測,且可為約0.0001nm至約2nm或約0.001nm至約0.75nm。在一些實施例中,光催化塗層包含黏合劑基質及光催化材料。在一些實施例中,光催化塗層可為界定光催化材料之島狀物之間的孔或空隙的不連續層。 In some embodiments, the nominal thickness of the plurality of photocatalytic materials disposed in or on the coated surface can be measured by a quartz crystal microbalance that measures the mass deposited thereon, and can be about 0.0001 nm to about 2 nm or from about 0.001 nm to about 0.75 nm. In some embodiments, the photocatalytic coating comprises a binder matrix and a photocatalytic material. In some embodiments, the photocatalytic coating can be a discontinuous layer that defines pores or voids between islands of photocatalytic material.

在一些實施例中,基板上之塗層的標稱厚度可在約0.01μm至約1000μm(1mm)之間。標稱厚度可藉由記錄針表面剖面儀(Dektek)來量測。在一些實施例中,光催化塗層可為界定光催化材料之島狀物之間的孔或空隙的不連續層(參見例如圖10)。在一些實施例中,針對發光層之表面之每平方公分的面積,多種光催化奈米材料可具有約1ng至約500ng、約10ng至約100ng或約20ng至約60ng的總質量。 In some embodiments, the nominal thickness of the coating on the substrate can be between about 0.01 [mu]m and about 1000 [mu]m (1 mm). The nominal thickness can be measured by a stylus surface profiler (Dektek). In some embodiments, the photocatalytic coating can be a discontinuous layer that defines pores or voids between islands of photocatalytic material (see, eg, Figure 10). In some embodiments, the plurality of photocatalytic nanomaterials can have a total mass of from about 1 ng to about 500 ng, from about 10 ng to about 100 ng, or from about 20 ng to about 60 ng, for an area per square centimeter of the surface of the luminescent layer.

在一些實施例中,提供用於製造光催化元件之方法,該方法包含提供包含黏合劑、光催化材料、光引發劑及有機溶劑之懸浮液,其中黏合劑與光催化材料之重量比為約1.0至20份黏合劑對約1份光催化材料;及將該懸浮液應用於第一表面。在一些實施例中,該第一表面可為基板表面。在一些實施例中,該第一表面可為至少一個介入層之表面。在一些實施例中,該至少一個介入層係安置於基板上。在一些 實施例中,該介入層可包含黏合劑。在一些實施例中,該黏合劑為有機黏合劑。在一些實施例中,該黏合劑可為有機聚合物。在一些實施例中,該介入層可進一步包含光引發劑及/或有機溶劑。 In some embodiments, a method for fabricating a photocatalytic element is provided, the method comprising providing a suspension comprising a binder, a photocatalytic material, a photoinitiator, and an organic solvent, wherein the weight ratio of the binder to the photocatalytic material is about 1.0 to 20 parts of the binder to about 1 part of the photocatalytic material; and applying the suspension to the first surface. In some embodiments, the first surface can be a substrate surface. In some embodiments, the first surface can be the surface of at least one intervening layer. In some embodiments, the at least one intervening layer is disposed on the substrate. In some In embodiments, the intervening layer can comprise a binder. In some embodiments, the binder is an organic binder. In some embodiments, the binder can be an organic polymer. In some embodiments, the intervening layer can further comprise a photoinitiator and/or an organic solvent.

在一些實施例中,提供用於製造光催化元件之方法,該方法包含提供包含黏合劑、光催化材料、光引發劑及有機溶劑之懸浮液,其中黏合劑與光催化材料之重量比為約1.0至20份黏合劑對約1份光催化材料;及將該懸浮液應用於基板表面。 In some embodiments, a method for fabricating a photocatalytic element is provided, the method comprising providing a suspension comprising a binder, a photocatalytic material, a photoinitiator, and an organic solvent, wherein the weight ratio of the binder to the photocatalytic material is about 1.0 to 20 parts of the binder to about 1 part of the photocatalytic material; and the suspension is applied to the surface of the substrate.

在一些實施例中,提供用於製造光催化元件之方法,該方法包含:提供包含黏合劑、光催化材料、光引發劑及有機溶劑之溶液;提供包含黏合劑、光催化材料、光引發劑及有機溶劑的懸浮液,其中黏合劑與光催化材料之重量比為約1.0至20份黏合劑對約1份光催化材料;將該溶液應用於基板表面以在該基板表面上形成介入層(諸如,例如,黏合劑塗層);及將該懸浮液應用於該基板表面上之該介入層(諸如,例如,黏合劑塗層)。 In some embodiments, a method for fabricating a photocatalytic element is provided, the method comprising: providing a solution comprising a binder, a photocatalytic material, a photoinitiator, and an organic solvent; providing a binder, a photocatalytic material, a photoinitiator And a suspension of the organic solvent, wherein the weight ratio of the binder to the photocatalytic material is from about 1.0 to 20 parts of the binder to about 1 part of the photocatalytic material; the solution is applied to the surface of the substrate to form an intervening layer on the surface of the substrate ( Such as, for example, a binder coating; and applying the suspension to the intervening layer (such as, for example, a binder coating) on the surface of the substrate.

如圖12中所示,本發明提供用於製造光催化元件之方法(S10'),其包含:提供黏合劑及光催化材料溶液,其中該黏合劑與光催化材料係以約1.0至20.0份黏合劑對約1份光催化材料之比(重量比[w/w])提供(S12')。在一些實施例中,提供1至20份10%黏合劑(按重量計)溶液對1份光催化材料(按重量計)。在一些實施例中,該方法進一步包含處理該基板之表面(S14')。在一些實施例中,方法包含將該懸浮液應用於該基板表面(S16')。在一些實施例中,該方法包含加熱該基板表面上的該所應用黏合劑/光催化材料懸浮液以移除溶劑(S18')。在一些實施例中,該方法包含固化該基板表面上之該所應用黏合劑/光催化材料懸浮液(S20')。 As shown in FIG. 12, the present invention provides a method (S10') for manufacturing a photocatalytic element, comprising: providing a binder and a photocatalytic material solution, wherein the binder and the photocatalytic material are about 1.0 to 20.0 parts. The ratio (weight ratio [w/w]) of the binder to about 1 part of the photocatalytic material is provided (S12'). In some embodiments, 1 to 20 parts of a 10% binder (by weight) solution is provided to 1 part of the photocatalytic material (by weight). In some embodiments, the method further includes processing the surface of the substrate (S14'). In some embodiments, the method comprises applying the suspension to the substrate surface (S16'). In some embodiments, the method includes heating the applied binder/photocatalytic material suspension on the surface of the substrate to remove solvent (S18'). In some embodiments, the method comprises curing the applied binder/photocatalytic material suspension (S20') on the surface of the substrate.

如圖13中所示,本發明提供用於製造光催化元件之方法(S110),其可包含提供黏合劑溶液(S112)。在一些實施例中,該方法可包含提 供黏合劑及光催化材料懸浮液,其中黏合劑與光催化材料可以約1.0至20.0份黏合劑對約1份光催化材料之比(重量比[w/w])提供(S114)。在一些實施例中,提供1至20份10%黏合劑(按重量計)溶液對1份光催化材料(按重量計)。在一些實施例中,該方法可包含處理基板表面(S116)。在一些實施例中,該方法可包含將介入層應用於基板表面(S118)。在一些實施例中,該介入層可為包含黏合劑之層。在一些實施例中,該介入層中之黏合劑與該光催化懸浮液中之黏合劑相同。在一些實施例中,該方法可包含加熱該基板表面上之該所應用黏合劑溶液及/或該介入層表面上之該所應用黏合劑/光催化材料懸浮液以移除溶劑(S120)。在一些實施例中,該方法包含固化該基板表面上之該黏合劑溶液及/或該介入層表面上之該所應用黏合劑/光催化材料懸浮液(S122)。在一些實施例中,該介入層可在添加該光催化懸浮液之前固化。在一些實施例中,該介入層及該光催化懸浮液可同時/一起固化。 As shown in FIG. 13, the present invention provides a method (S110) for manufacturing a photocatalytic element, which may include providing a binder solution (S112). In some embodiments, the method can include For the adhesive and the photocatalytic material suspension, wherein the binder and the photocatalytic material may provide (S114) a ratio (weight ratio [w/w]) of about 1.0 to 20.0 parts of the binder to about 1 part of the photocatalytic material. In some embodiments, 1 to 20 parts of a 10% binder (by weight) solution is provided to 1 part of the photocatalytic material (by weight). In some embodiments, the method can include processing the substrate surface (S116). In some embodiments, the method can include applying an intervening layer to the substrate surface (S118). In some embodiments, the intervening layer can be a layer comprising a binder. In some embodiments, the binder in the intervening layer is the same as the binder in the photocatalytic suspension. In some embodiments, the method can include heating the applied adhesive solution on the surface of the substrate and/or the applied adhesive/photocatalytic material suspension on the surface of the intervening layer to remove the solvent (S120). In some embodiments, the method comprises curing the binder solution on the surface of the substrate and/or the applied binder/photocatalytic material suspension on the surface of the intervening layer (S122). In some embodiments, the intervening layer can be cured prior to the addition of the photocatalytic suspension. In some embodiments, the intervening layer and the photocatalytic suspension can be cured simultaneously/together.

如圖14中所示,展示了包括基板112及光催化塗層114之光催化元件110。在一些實施例中,光催化塗層係安置於基板112之第一表面118上、與基板112之第一表面118接觸或為基板112之第一表面118之一部分。在一些實施例中,基板112可包含經處理基板表面118。在一些實施例中,光催化塗層114包括安置於黏合劑122中及/或黏合劑122上之光催化材料120。在一些實施例中,足夠量之光催化材料120曝露於光催化塗層之表面上以提供所要抗菌效應。 As shown in FIG. 14, a photocatalytic element 110 comprising a substrate 112 and a photocatalytic coating 114 is shown. In some embodiments, the photocatalytic coating is disposed on the first surface 118 of the substrate 112, in contact with the first surface 118 of the substrate 112, or as part of the first surface 118 of the substrate 112. In some embodiments, the substrate 112 can include a processed substrate surface 118. In some embodiments, the photocatalytic coating 114 includes a photocatalytic material 120 disposed in the binder 122 and/or on the binder 122. In some embodiments, a sufficient amount of photocatalytic material 120 is exposed on the surface of the photocatalytic coating to provide the desired antimicrobial effect.

圖15展示包括基板112、光催化塗層114及介入層124之光催化元件110。在一些實施例中,介入層124係安置於基板112之第一表面118上、與基板112之第一表面118接觸或為基板112之第一表面118之一部分。在一些實施例中,光催化塗層係安置於介入層124之第一表面126上、與介入層124之第一表面126接觸或為介入層124之第一表面126之 一部分。在一些實施例中,介入層的黏合劑、光引發劑及/或溶劑可與光催化塗層的相同。在一些實施例中,基板112可包含經處理基板表面118。在一些實施例中,光催化塗層114包括安置於黏合劑122中及/或黏合劑122上之光催化材料120。在一些實施例中,足夠量之光催化材料120曝露於光催化塗層之表面上以提供所要抗菌效應。 15 shows a photocatalytic element 110 that includes a substrate 112, a photocatalytic coating 114, and an intervening layer 124. In some embodiments, the intervening layer 124 is disposed on the first surface 118 of the substrate 112, in contact with the first surface 118 of the substrate 112, or as part of the first surface 118 of the substrate 112. In some embodiments, the photocatalytic coating is disposed on the first surface 126 of the intervening layer 124, in contact with the first surface 126 of the intervening layer 124, or is the first surface 126 of the intervening layer 124. portion. In some embodiments, the adhesive, photoinitiator, and/or solvent of the intervening layer can be the same as the photocatalytic coating. In some embodiments, the substrate 112 can include a processed substrate surface 118. In some embodiments, the photocatalytic coating 114 includes a photocatalytic material 120 disposed in the binder 122 and/or on the binder 122. In some embodiments, a sufficient amount of photocatalytic material 120 is exposed on the surface of the photocatalytic coating to provide the desired antimicrobial effect.

在一些實施例中,提供光催化懸浮液,其包含至少一種光催化材料、至少一種黏合劑、至少一種光引發劑及至少一種有機溶劑。在一些實施例中,提供黏合劑溶液,其包含至少一種黏合劑、至少一種光引發劑及至少一種有機溶劑。 In some embodiments, a photocatalytic suspension is provided comprising at least one photocatalytic material, at least one binder, at least one photoinitiator, and at least one organic solvent. In some embodiments, a binder solution is provided comprising at least one binder, at least one photoinitiator, and at least one organic solvent.

在一些實施例中,該光催化材料可為如上所述之彼等光催化材料。 In some embodiments, the photocatalytic material can be a photocatalytic material as described above.

在一些實施例中,黏合劑材料可為有機黏合劑/材料。在一些實施例中,黏合劑材料可為有機聚合物。在一些實施例中,黏合劑材料可為UV可固化樹脂。在一些實施例中,UV可固化樹脂可為胺基甲酸酯樹脂。在一些實施例中,UV可固化樹脂不包括矽。在一些實施例中,胺基甲酸酯樹脂可為胺基甲酸酯丙烯酸系樹脂。在一些實施例中,胺基甲酸酯樹脂可為丙烯酸胺基甲酸酯樹脂。在一些實施例中,丙烯酸胺基甲酸酯樹脂包含每個分子至少2個、至少3個及/或至少5個丙烯醯基。在一些實施例中,合適的胺基甲酸酯樹脂可為市售產品,例如,UNIDIC 17-806(80質量%的非揮發性含量;DIC International(美國),LLC,Parsippany,NJ,美國生產的多官能丙烯酸胺基甲酸酯);Ebecryl 8701(脂族胺基甲酸酯三丙烯酸酯)、Ebecryl 8301-R(脂族胺基甲酸酯六丙烯酸酯)、Ebecryl 8405(脂族胺基甲酸酯四丙烯酸酯)(Allnex USA,Smyrna,GA,美國)、OC-3021、OC-4021、OC-4122(Dymax Oligomers and Coatings,Torrington,CT,美國);HC-5619(Addison Clearwave Coatings,Inc.,St.Charles,IL,美國);及Silfort UVHC3000(Momentive Performance Materials,Inc.,Albany,NY,美國)。 In some embodiments, the binder material can be an organic binder/material. In some embodiments, the binder material can be an organic polymer. In some embodiments, the binder material can be a UV curable resin. In some embodiments, the UV curable resin can be a urethane resin. In some embodiments, the UV curable resin does not include ruthenium. In some embodiments, the urethane resin can be a urethane acrylic resin. In some embodiments, the urethane resin can be an urethane urethane resin. In some embodiments, the urethane acrylate resin comprises at least 2, at least 3, and/or at least 5 propylene groups per molecule. In some embodiments, suitable urethane resins can be commercially available products, for example, UNIDIC 17-806 (80% by mass non-volatile content; DIC International (USA), LLC, Parsippany, NJ, USA) Polyfunctional urethane amide); Ebecryl 8701 (aliphatic urethane triacrylate), Ebecryl 8301-R (aliphatic urethane hexaacrylate), Ebecryl 8405 (aliphatic amine group) Formate tetraacrylate) (Allnex USA, Smyrna, GA, USA), OC-3021, OC-4021, OC-4122 (Dymax Oligomers and Coatings, Torrington, CT, USA); HC-5619 (Addison Clearwave Coatings, Inc., St. Charles, IL, USA); and Silfort UVHC3000 (Momentive Performance Materials, Inc., Albany, NY, USA).

在一些實施例中,以約1.0至約20.0份黏合劑(重量%)、較佳約1.5至約10.0份黏合劑(重量%)對約1份(重量%)光催化材料之比來提供黏合劑對光催化材料。熟習此項技術者應認識到1:5wt%可為約34.8vol%;且1:20wt%可為約11.8vol%。在一些實施例中,以約1.0至20.0份黏合劑對約1份光催化材料之比(按重量計)來提供黏合劑對光催化材料。在一些實施例中,以約1.7、2.5、5.0及/或10.0份黏合劑對約1份光催化材料之比(按重量計)來提供黏合劑對光催化材料。在一些實施例中,以約1.5至12份黏合劑(10%溶液中之黏合劑)對約1份光催化材料(例如,約5份黏合劑對約1份光催化材料)之比(按重量計)來提供黏合劑對光催化材料。儘管不希望受理論限制,但具有小於1.0份黏合劑對約1份光催化材料之比可導致光催化材料對基板之表面的不充分黏附。熟習此項技術者可認識到,用於評估黏附性之合適方法可藉由(但不限於)ASTM D3359。儘管不希望受理論限制,但具有大於20.0份黏合劑對1.0份光催化材料之比(重量%)可導致曝露在塗層之表面以外的光催化材料的量不足。 In some embodiments, the adhesion is provided in a ratio of from about 1.0 to about 20.0 parts of binder (% by weight), preferably from about 1.5 to about 10.0 parts of binder (% by weight) to about 1 part by weight of photocatalytic material. Agent for photocatalytic materials. Those skilled in the art will recognize that 1:5 wt% can be about 34.8 vol%; and 1:20 wt% can be about 11.8 vol%. In some embodiments, the binder to photocatalytic material is provided in a ratio (by weight) of from about 1.0 to 20.0 parts of binder to about 1 part of the photocatalytic material. In some embodiments, the binder to photocatalytic material is provided at a ratio (by weight) of about 1.7, 2.5, 5.0, and/or 10.0 parts of binder to about 1 part of the photocatalytic material. In some embodiments, the ratio of about 1 to about 12 parts of the photocatalytic material (for example, about 5 parts of the binder to about 1 part of the photocatalytic material) is about 1.5 to 12 parts of the binder (10% of the binder in the solution). Weight gauge) to provide a binder to the photocatalytic material. Although not wishing to be bound by theory, having a ratio of less than 1.0 part binder to about 1 part photocatalytic material can result in insufficient adhesion of the photocatalytic material to the surface of the substrate. Those skilled in the art will recognize that suitable methods for assessing adhesion can be by, but not limited to, ASTM D3359. Although not wishing to be bound by theory, having a ratio (% by weight) of more than 20.0 parts of binder to 1.0 part of the photocatalytic material may result in an insufficient amount of photocatalytic material exposed outside the surface of the coating.

在一些實施例中,光催化懸浮液進一步包括分散劑。在一些實施例中,分散劑可為陽離子、陰離子、非離子分散劑。在一些實施例中,合適分散劑可為市售產品,例如,Additol XL 203(陽離子分散劑,Allnex USA,Smyrna,GA,美國)、Additol XL 251(陰離子分散劑,Allnex USA,Smyrna,GA,美國)、Additol VWX 6208/60(聚合非離子分散劑,Allnex USA,Smyrna,GA,美國)及Flowlen G700(以聚羧酸為主,分子量Mw=230,KYOEISHA CHEMICAL Co.,LTD,Osaka,JP)。在一些實施例中,合適分散劑可為Disperbyk-110(與酸基之共聚物)及/或Disperbyk-118(與高極性之不同親和基團的直鏈共聚物)(BYK USA,Inc.,Wallingford,CT,美國)。 In some embodiments, the photocatalytic suspension further comprises a dispersing agent. In some embodiments, the dispersing agent can be a cationic, anionic, nonionic dispersing agent. In some embodiments, suitable dispersing agents can be commercially available products, for example, Additol XL 203 (cationic dispersant, Allnex USA, Smyrna, GA, USA), Additol XL 251 (anionic dispersant, Allnex USA, Smyrna, GA, US), Additol VWX 6208/60 (polymerized nonionic dispersant, Allnex USA, Smyrna, GA, USA) and Flowlen G700 (mainly polycarboxylic acid, molecular weight M w = 230, KYOEISHA CHEMICAL Co., LTD, Osaka, JP). In some embodiments, a suitable dispersant can be Disperbyk-110 (copolymer with acid groups) and/or Disperbyk-118 (straight chain copolymer with different polar affinity groups) (BYK USA, Inc., Wallingford, CT, USA).

在一些實施例中,光引發劑可為α胺酮、雙醯基膦(BAPO)、α羥酮及/或其組合及/或混合物。在一些實施例中,合適的光引發劑可為2-甲基-1-[4-(甲硫基)苯基]-2-(4-嗎啉基)-1-丙酮(IRGACURE 907)、氧化膦(苯基雙(2,4,6-三甲基苯甲醯基)[IRGACURE 819])及/或2-羥基-2-甲基-1-苯基-1-丙酮[DAROCUR 1173]。在一些實施例中,合適光引發劑可為市售產品,例如,IRGACURE 907及/或IRGACURE 2022(20wt% IRGACURE 819/80%DAROCUR 1173])。 In some embodiments, the photoinitiator can be alpha ketone, bis-decyl phosphine (BAPO), alpha ketone, and/or combinations and/or mixtures thereof. In some embodiments, a suitable photoinitiator can be 2-methyl-1-[4-(methylthio)phenyl]-2-(4-morpholinyl)-1-propanone (IRGACURE 907), Phosphine oxide (phenylbis(2,4,6-trimethylbenzylidene)[IRGACURE 819]) and/or 2-hydroxy-2-methyl-1-phenyl-1-propanone [DAROCUR 1173] . In some embodiments, suitable photoinitiators can be commercially available products, for example, IRGACURE 907 and/or IRGACURE 2022 (20 wt% IRGACURE 819/80% DAROCUR 1173).

在一些實施例中,黏合劑可溶解於有機溶劑中。在一些實施例中,光催化材料實質上不溶於有機溶劑中。在一些實施例中,有機溶劑可為(例如)烴、酮、酯、醚或醇。 In some embodiments, the binder can be dissolved in an organic solvent. In some embodiments, the photocatalytic material is substantially insoluble in the organic solvent. In some embodiments, the organic solvent can be, for example, a hydrocarbon, a ketone, an ester, an ether, or an alcohol.

以上烴、酮、酯、醚及醇之實例可為如上文所提及之各物。在一些實施例中,有機溶劑可為C1-C7醇。在一些實施例中,有機溶劑可為C1-C7酮。在一些實施例中,有機溶劑可為環戊酮、丙二醇單甲醚乙酸酯(PGMEA)、N-甲基吡咯啶酮(NMP)、甲基乙基酮(MEK)、甲苯、乙酸乙酯及/或乙酸丁酯。在一些實施例中,提供黏合劑及光催化材料懸浮液進一步包含將胺基甲酸酯樹脂溶解於環戊酮溶劑中。此等有機溶劑可單獨使用或以兩種或兩種以上之組合使用。 Examples of the above hydrocarbons, ketones, esters, ethers and alcohols may be each as mentioned above. In some embodiments, the organic solvent may be a C 1 -C 7 alcohols. In some embodiments, the organic solvent can be a C 1 -C 7 ketone. In some embodiments, the organic solvent may be cyclopentanone, propylene glycol monomethyl ether acetate (PGMEA), N-methylpyrrolidone (NMP), methyl ethyl ketone (MEK), toluene, ethyl acetate. And / or butyl acetate. In some embodiments, providing the binder and the photocatalytic material suspension further comprises dissolving the urethane resin in a cyclopentanone solvent. These organic solvents may be used singly or in combination of two or more kinds.

在一些實施例中,光催化/黏合劑材料可應用於第一表面。在一些實施例中,光催化/黏合劑材料可應用於至少一個介入層之表面。在一些實施例中,介入層可包含除光催化材料外的光催化/黏合劑懸浮液之前述材料之任一者或全部,例如如較早所描述之黏合劑、溶劑、光引發劑等。在一些實施例中,介入層及光催化黏合劑層可包含相同及/或不同材料。在一些實施例中,光催化/黏合劑材料可應用於基板之表面。在一些實施例中,基板可為熱塑性聚合物。在一些實施例中,基板可為熱固性聚合物。在一些實施例中,基板可為以下各物中之任一者:聚乙烯、聚丙烯、聚酯、聚苯乙烯、聚醯胺、聚醯亞 胺、聚碸、聚醚碸(PES)、聚丙烯酸酯、聚丙烯腈、聚碳酸酯(PC)、聚甲基丙烯酸甲酯(PMMA)、聚氯乙烯(PVC)及/或其混合物。在一些實施例中,基板可包含聚酯。在一些實施例中,聚酯可為(例如)聚對苯二甲酸伸乙酯(PET)、聚對苯二甲酸丁二酯(PBT)、聚萘二甲酸伸乙酯(PEN)。 In some embodiments, a photocatalytic/adhesive material can be applied to the first surface. In some embodiments, a photocatalytic/adhesive material can be applied to the surface of at least one of the intervening layers. In some embodiments, the intervening layer can comprise any or all of the foregoing materials of the photocatalytic/adhesive suspension other than the photocatalytic material, such as binders, solvents, photoinitiators, and the like, as described earlier. In some embodiments, the intervening layer and the photocatalytic adhesive layer can comprise the same and/or different materials. In some embodiments, the photocatalytic/adhesive material can be applied to the surface of the substrate. In some embodiments, the substrate can be a thermoplastic polymer. In some embodiments, the substrate can be a thermoset polymer. In some embodiments, the substrate can be any of the following: polyethylene, polypropylene, polyester, polystyrene, polyamine, polyphthalamide Amine, polyfluorene, polyether oxime (PES), polyacrylate, polyacrylonitrile, polycarbonate (PC), polymethyl methacrylate (PMMA), polyvinyl chloride (PVC) and/or mixtures thereof. In some embodiments, the substrate can comprise a polyester. In some embodiments, the polyester can be, for example, polyethylene terephthalate (PET), polybutylene terephthalate (PBT), polyethylene naphthalate (PEN).

在一些實施例中,基板可包含熱固性聚合物。在一些實施例中,熱固性樹脂可包含酚醛樹脂。在一些實施例中,熱固性樹脂可包含聚氧苄基亞甲基乙二醇酸酐(膠木)、環氧/碳纖維及任何纖維加強之塑膠薄片。在一些實施例中,環氧玻璃纖維複合物可為聽診器隔膜(例如,由Littman[3M,Minneapolis,MN]銷售之市售實施例)之形式。 In some embodiments, the substrate can comprise a thermoset polymer. In some embodiments, the thermosetting resin may comprise a phenolic resin. In some embodiments, the thermosetting resin may comprise polyoxybenzylidene glycol anhydride (bakelite), epoxy/carbon fibers, and any fiber reinforced plastic sheet. In some embodiments, the epoxy fiberglass composite can be in the form of a stethoscope diaphragm (eg, a commercially available embodiment sold by Littman [3M, Minneapolis, MN]).

在一些實施例中,基板可包含經受預處理以增加塗層與基板之間的黏附之聚合物薄膜。在一些實施例中,經預處理之薄膜及或基板係經化學處理、電暈處理或加熱處理以增加塗層至基板之黏附。合適的經化學處理薄膜之市售產品包括(但不限於)3SAB/3SAC;3LD4;4407/4507;2SABN/2SACN(Mitsubishi Polyester films,Greer,SC,美國)。在一些實施例中,基板係用偶合劑預處理以增進聚合物黏合劑與基板之間的黏附。在一些實施例中,偶合劑可為胺丙基三乙氧基矽烷、烯丙基三甲氧基矽烷、(3-胺丙基)三乙氧基矽烷、3-胺丙基(二乙氧基)甲基矽烷及/或(3-胺基)三甲氧基矽烷。 In some embodiments, the substrate can comprise a polymeric film that is subjected to a pretreatment to increase adhesion between the coating and the substrate. In some embodiments, the pretreated film and or substrate is chemically treated, corona treated, or heat treated to increase adhesion of the coating to the substrate. Commercially available products of suitable chemically treated films include, but are not limited to, 3SAB/3SAC; 3LD4; 4407/4507; 2SABN/2SACN (Mitsubishi Polyester films, Greer, SC, USA). In some embodiments, the substrate is pretreated with a coupling agent to promote adhesion between the polymer binder and the substrate. In some embodiments, the coupling agent can be amine propyl triethoxy decane, allyl trimethoxy decane, (3-aminopropyl) triethoxy decane, 3-aminopropyl (diethoxy) ) methyl decane and / or (3-amino) trimethoxy decane.

在一些實施例中,將混合物應用於介入層及/或基板進一步包含以每分鐘約500轉至每分鐘約3000轉將黏合劑-光催化材料溶液旋塗於基板上歷時約5秒至約30秒之間。在一個實施例中,旋塗可為約1200rpm歷時約20秒。 In some embodiments, applying the mixture to the intervening layer and/or the substrate further comprises spin coating the adhesive-photocatalytic material solution onto the substrate at about 500 revolutions per minute to about 3000 revolutions per minute for about 5 seconds to about 30 seconds. Between seconds. In one embodiment, the spin coating can be about 1200 rpm for about 20 seconds.

在一些實施例中,將混合物應用於介入層及/或基板進一步包含在基板上澆注混合物。合適的澆注程序已在上文提及。 In some embodiments, applying the mixture to the intervening layer and/or the substrate further comprises casting the mixture on the substrate. A suitable casting procedure has been mentioned above.

在一些實施例中,方法進一步包含處理基板之表面以增加塗層 至基板之黏附。在一些實施例中,表面之處理可為藉由(但不限於)化學處理(例如,酸處理、鹼處理、溶劑處理表面)、臭氧處理、電暈處理及/或熱處理基板表面以使塗層至基板之黏附增加。合適的經化學處理薄膜包括經電暈電漿處理之聚酯薄膜。在一些實施例中,光催化材料包含填充至P25混合相光催化材料上之CuxO。在一些實施例中,光催化材料可為Ti:Sn(C,N,O)2、CuxO、P25、SnO2中之任一者或全部。 In some embodiments, the method further comprises treating the surface of the substrate to increase adhesion of the coating to the substrate. In some embodiments, the surface treatment may be by, but not limited to, chemical treatment (eg, acid treatment, alkali treatment, solvent treatment of the surface), ozone treatment, corona treatment, and/or heat treatment of the substrate surface to render the coating Adhesion to the substrate increases. Suitable chemically treated films include corona-treated polyester films. In some embodiments, the photocatalytic material comprises Cu x O that is filled onto the P25 mixed phase photocatalytic material. In some embodiments, the photocatalytic material can be any or all of Ti:Sn(C,N,O) 2 , Cu x O, P25, SnO 2 .

在一些實施例中,方法包含以足以移除實質上全部溶劑之時間及溫度乾燥基板表面上之黏合劑/光催化懸浮液及/或介入層。在一些實施例中,乾燥係在一溫度下執行且持續一時間,以使黏合劑部分固化但不使基板變形。在一些實施例中,介入層係在將光催化/黏合劑懸浮液應用於其之前部分地固化。在一些實施例中,介入層係在將光催化/黏合劑懸浮液應用於其之前實質上完全地固化。舉例而言,在一個實施例中,PET基板(其上具有光催化塗層)可在環境氣氛中在90℃下乾燥歷時約2分鐘。 In some embodiments, the method comprises drying the binder/photocatalytic suspension and/or the intervening layer on the surface of the substrate at a time and temperature sufficient to remove substantially all of the solvent. In some embodiments, the drying is performed at a temperature for a period of time to partially cure the adhesive without deforming the substrate. In some embodiments, the intervening layer is partially cured prior to applying the photocatalytic/adhesive suspension to it. In some embodiments, the intervening layer is substantially completely cured prior to applying the photocatalytic/adhesive suspension to it. For example, in one embodiment, a PET substrate having a photocatalytic coating thereon can be dried at 90 ° C for about 2 minutes in an ambient atmosphere.

在一些實施例中,方法包含用足以固化懸浮液之UV照射使基板表面上之黏合劑/光催化懸浮液及/或介入層固化。在一些實施例中,方法包含用足以固化介入層之UV照射使基板表面上之介入層固化。在一些實施例中,固化係以使黏合劑部分固化但不使UV可固化材料降級的紫外線強度及時間執行。在某些實施例中,具有0.2至20J/cm2之能量及在100至400mn、較佳200至400nm之範圍中之波長的UV可用於交聯及固化基板表面上之黏合劑/光催化懸浮液。舉例而言,在一個實施例中,UV能量為約0.5J/cm2至約1.5J/cm2。可藉由使用超高壓水銀燈、高壓水銀燈、低壓水銀燈、碳弧、金屬鹵化物燈或類似者來施加此UV。舉例而言,在一個實施例中,PET基板(其上具有胺基甲酸酯黏合劑/光催化劑/光引發劑複合塗層)可在約25mW/cm2下經照 射歷時約5分鐘。舉例而言,在另一個實施例中,PET基板(其上具有胺基甲酸酯黏合劑/光催化劑/光引發劑複合塗層)可在約225mW/cm2下經照射歷時約5分鐘。舉例而言,可用Loctite® Zeta® 7411 UV溢流固化(Flood Curing)系統或Dymax UV輸送機系統來照射基板。 In some embodiments, the method comprises curing the adhesive/photocatalytic suspension and/or the intervening layer on the surface of the substrate with UV radiation sufficient to cure the suspension. In some embodiments, the method comprises curing the intervening layer on the surface of the substrate with UV radiation sufficient to cure the intervening layer. In some embodiments, the curing is performed at a UV intensity and time that partially cures the adhesive but does not degrade the UV curable material. In certain embodiments, UV having an energy of 0.2 to 20 J/cm 2 and a wavelength in the range of 100 to 400 mn, preferably 200 to 400 nm, can be used to crosslink and cure the adhesive/photocatalytic suspension on the surface of the substrate. liquid. For example, in one embodiment, the UV energy is from about 0.5 J/cm 2 to about 1.5 J/cm 2 . This UV can be applied by using an ultrahigh pressure mercury lamp, a high pressure mercury lamp, a low pressure mercury lamp, a carbon arc, a metal halide lamp or the like. For example, in one embodiment, a PET substrate having a urethane binder/photocatalyst/photoinitiator composite coating thereon can be irradiated at about 25 mW/cm 2 for about 5 minutes. For example, in another embodiment, a PET substrate having a urethane binder/photocatalyst/photoinitiator composite coating thereon can be irradiated at about 225 mW/cm 2 for about 5 minutes. For example, the substrate can be illuminated with a Loctite® Zeta® 7411 UV Flood Curing system or a Dymax UV conveyor system.

在一些實施例中,用於製造光催化元件之方法包含:提供丙烯酸胺基甲酸酯樹脂(例如,UNIDEC 17 806)(按重量計10%)/有機溶劑(環戊酮)(按重量計90%)/0.24wt%光引發劑(IRGACURE 907)溶液;以5比1(w/w)黏合劑:光催化材料之比將光催化CuxO/多相TiO2混合粉末添加至該溶液;用電暈處理對PET表面進行預處理;將溶液/懸浮液澆注於經預處理之PET表面上;及固化該PET表面上之黏合劑/光催化溶液/懸浮液。在一些實施例中,將分散劑添加至黏合劑/溶劑/光引發劑溶液/懸浮液。在一些實施例中,澆注溶液係在經預處理之PET表面上固化。 In some embodiments, a method for making a photocatalytic element comprises: providing an urethane urethane resin (eg, UNIDEC 17 806) (10% by weight) / organic solvent (cyclopentanone) (by weight) 90%) / 0.24wt% photoinitiator (IRGACURE 907) solution; photocatalytic Cu x O / heterogeneous TiO 2 mixed powder was added to the solution at a ratio of 5 to 1 (w/w) binder: photocatalytic material The surface of the PET is pretreated by corona treatment; the solution/suspension is cast onto the surface of the pretreated PET; and the adhesive/photocatalytic solution/suspension on the surface of the PET is cured. In some embodiments, a dispersant is added to the binder/solvent/photoinitiator solution/suspension. In some embodiments, the casting solution is cured on the surface of the pretreated PET.

在一些實施例中,多相TiO2可為如上所述之各物。 In some embodiments, the heterogeneous TiO 2 can be each of the materials described above.

在一些實施例中,可根據上文所述之方法來製造光催化元件。在一些實施例中,光催化元件包含丙烯酸胺基甲酸酯樹脂及光催化材料,其中樹脂與光催化材料之比在約1.0至約20.0比約1之間,例如,20份樹脂:一份光催化材料。在一些實施例中,丙烯酸胺基甲酸酯樹脂可選自UNIDIC 17806、EBECRYL 8701、EBECRYL 8301、EBECRYL 8405、OC-3021、OC-4021、OC-4122、HC-5619及/或UVHC3000。在一些實施例中,光催化材料可選自摻雜或無摻雜、填充或未填充的先前所述氧化物。在一些實施例中,光催化材料可為填充銅(CuxO)P25、填充銅(CuxO)Ti:Sn(CNO)2及/或未填充Ti:Sn(C,N,O)2In some embodiments, the photocatalytic element can be fabricated according to the methods described above. In some embodiments, the photocatalytic element comprises an urethane urethane resin and a photocatalytic material, wherein the ratio of resin to photocatalytic material is between about 1.0 and about 20.0 to about 1, for example, 20 parts of resin: one part Photocatalytic material. In some embodiments, the urethane acrylate resin may be selected from the group consisting of UNIDIC 17806, EBECRYL 8701, EBECRYL 8301, EBECRYL 8405, OC-3021, OC-4021, OC-4122, HC-5619, and/or UVHC3000. In some embodiments, the photocatalytic material can be selected from the previously described oxides that are doped or undoped, filled or unfilled. In some embodiments, the photocatalytic material can be filled with copper (Cu x O) P25, filled with copper (Cu x O) Ti:Sn(CNO) 2 and/or unfilled with Ti:Sn(C,N,O) 2 .

在一些實施例中,安置於經塗佈表面中或上的多種光催化材料之標稱厚度可藉由石英晶體微天平(其量測沈積至其上之質量)來量 測,可為約0.0001nm至約2nm或約0.001nm至約0.75nm。在一些實施例中,光催化塗層包含黏合劑基質及光催化材料。在一些實施例中,光催化塗層可為界定光催化材料之島狀物之間的孔或空隙之不連續層。 In some embodiments, the nominal thickness of the plurality of photocatalytic materials disposed in or on the coated surface can be quantified by a quartz crystal microbalance that measures the mass deposited thereon It can range from about 0.0001 nm to about 2 nm or from about 0.001 nm to about 0.75 nm. In some embodiments, the photocatalytic coating comprises a binder matrix and a photocatalytic material. In some embodiments, the photocatalytic coating can be a discontinuous layer that defines pores or voids between islands of photocatalytic material.

在一些實施例中,針對發光層之表面之每平方公分的面積,多種光催化奈米材料可具有約1ng至約500ng、約10ng至約100ng或約20ng至約60ng的總質量。 In some embodiments, the plurality of photocatalytic nanomaterials can have a total mass of from about 1 ng to about 500 ng, from about 10 ng to about 100 ng, or from about 20 ng to about 60 ng, for an area per square centimeter of the surface of the luminescent layer.

在一些實施例中,光催化塗層可具有在約100nm至約10微米之間的厚度。在催化層係安置於基板表面上的一些實施例中,光催化塗層可具有在約100nm至約10微米之間的厚度。 In some embodiments, the photocatalytic coating can have a thickness of between about 100 nm to about 10 microns. In some embodiments in which the catalytic layer is disposed on the surface of the substrate, the photocatalytic coating can have a thickness of between about 100 nm to about 10 microns.

在光催化材料/黏合劑層係與黏合劑層結合使用的一些實施例中,黏合劑層實質上不含光催化材料,介入黏合劑層安置於光催化材料/黏合劑與基板之間,光催化/黏合劑層可更薄。在一些實施例中,光催化/黏合劑層可在約50nm、75nm、100nm至約250nm、300nm、400nm及/或約500nm之間。 In some embodiments in which the photocatalytic material/adhesive layer is used in combination with the adhesive layer, the adhesive layer is substantially free of photocatalytic material, and the intervening adhesive layer is disposed between the photocatalytic material/adhesive and the substrate. The catalyzed/adhesive layer can be thinner. In some embodiments, the photocatalytic/adhesive layer can be between about 50 nm, 75 nm, 100 nm to about 250 nm, 300 nm, 400 nm, and/or about 500 nm.

在一些實施例中,光催化塗層之特性在於約至少35%、至少45%、至少55%、至少65%、至少75%、至少80%、至少90%、至少95%、至少97%或至少99%黏附性的黏附性。在一些實施例中,大於65%(0B);在約35%至約65%之間(1B);在約15%至35%之間(2B);在約5%至15%之間(3B);小於約5%(4B);及實質上無光催化材料被自薄膜塗層移除(5B)。術語黏附性係指在用於量測黏附性之標準帶移除測試方法之後在基板上剩餘之塗層的百分比。確定黏附性之一個方法係藉由ASTM-D3359中所描述之程序。在一些實施例中,層之特性在於至少2H、至少3H、至少4H的硬度測試。確定表面硬度(抗刮擦性)之一個方法係藉由ASTM-3363中所描述之程序。 In some embodiments, the photocatalytic coating is characterized by about at least 35%, at least 45%, at least 55%, at least 65%, at least 75%, at least 80%, at least 90%, at least 95%, at least 97% or At least 99% adhesive adhesion. In some embodiments, greater than 65% (0B); between about 35% to about 65% (1B); between about 15% and 35% (2B); between about 5% and 15% ( 3B); less than about 5% (4B); and substantially no photocatalytic material is removed from the thin film coating (5B). The term adhesive refers to the percentage of coating remaining on the substrate after the standard tape removal test method for measuring adhesion. One method of determining adhesion is by the procedure described in ASTM-D3359. In some embodiments, the layer is characterized by a hardness test of at least 2H, at least 3H, at least 4H. One method of determining surface hardness (scratch resistance) is by the procedure described in ASTM-3363.

實例 Instance

本文中所描述之光催化元件之實施例改良光催化材料對基板之黏附。藉由如下實例來進一步展示此等益處,該等實例意欲為本發明之實施例的說明,但不欲以任何方式限制範疇或基礎原理。 Embodiments of the photocatalytic elements described herein improve adhesion of the photocatalytic material to the substrate. The benefits are further illustrated by the following examples, which are intended to be illustrative of the embodiments of the invention, but are not intended to limit the scope or the basic principles.

實例1(PET基板上之P-CAT(CuxO/TiO2:Sn)塗層) Example 1 (P-CAT (Cu x O/TiO 2 :Sn) coating on PET substrate)

使用具有約120微米之厚度的市售PET(聚對苯二甲酸伸乙酯)薄膜(Eplastics Inc.San Diego,CA美國)作為光催化塗層之基板。將基板切割成尺寸為7.5cm乘以5cm之塊。按照肥皂及水、丙酮及甲醇之順序清潔經切割PET基板,且接著進行乾燥。 A commercially available PET (polybutylene terephthalate) film (Eplastics Inc. San Diego, CA USA) having a thickness of about 120 μm was used as a substrate for the photocatalytic coating. The substrate was cut into pieces having a size of 7.5 cm by 5 cm. The cut PET substrate was cleaned in the order of soap and water, acetone and methanol, and then dried.

藉由混合改性聚矽氧聚醚樹脂(由ShinEtsu Silicones,JAPAN以商標名稱KR5230或「KR-5230」銷售)與PGMEA(丙二醇單甲醚乙酸酯,試劑>99.5%,Sigma-Aldrich)來製得含有10wt%聚矽氧改性之聚酯樹脂的黏合劑溶液。混合係用行星離心混合器(THINKY AR-310)以約2000rpm進行歷時2分鐘以用於混合,接著以約2200rpm歷時約1分鐘以用於消泡。 By mixing modified polyoxyl polyether resin (sold by ShinEtsu Silicones, JAPAN under the trade name KR5230 or "KR-5230") and PGMEA (propylene glycol monomethyl ether acetate, reagent >99.5%, Sigma-Aldrich) A binder solution containing 10% by weight of a polyfluorene-modified polyester resin was obtained. The mixing was carried out with a planetary centrifugal mixer (THINKY AR-310) at about 2000 rpm for 2 minutes for mixing, followed by about 2200 rpm for about 1 minute for defoaming.

為了製備塗佈懸浮液,將按重量計的一份IiSn(CNO)2光催化粉末與按重量計的10份黏合劑溶液(溶解於PGMEA中之10wt%聚矽氧改性之聚酯樹脂(KR-5230))混合。根據以下各者中所描述來製備光催化粉末:2013年3月15日申請之美國專利申請案13/840,859;及2013年6月14日申請之美國臨時申請案61/835,399;及2013年1月14日申請之美國專利申請案13/741,191(2013年8月1日公開之美國公開案第2013/0192976號),該等申請案中之每一者係以全文引用的方式併入。光催化催化劑(P催化劑)粉末包含填充氧化銅之氧化鈦,其摻雜有碳、氮及錫以增加可見光範圍中之光吸收。P催化劑中之標稱銅含量為1wt%。藉由將含有混合物之玻璃瓶保持在音波處理浴槽中歷時約一小時而將1gm的光催化粉末分散在黏合劑溶液(約10gm,10%溶液)中。使所獲得懸浮液通過具有30微米之開口之不鏽鋼篩的同軸過 濾器。 To prepare a coating suspension, one part by weight of IiSn(CNO) 2 photocatalytic powder and 10 parts by weight of a binder solution (10% by weight of polyfluorene-modified polyester resin dissolved in PGMEA) KR-5230)) mixed. Photocatalytic powders are prepared as described in the following: US Patent Application No. 13/840,859, filed on March 15, 2013; and US Provisional Application No. 61/835,399, filed on Jun. 14, 2013; U.S. Patent Application Serial No. 13/741, 191, filed on Aug. 1, the entire disclosure of which is hereby incorporated by reference. The photocatalytic catalyst (P catalyst) powder comprises titanium oxide filled with copper oxide doped with carbon, nitrogen and tin to increase light absorption in the visible range. The nominal copper content in the P catalyst was 1 wt%. 1 gm of the photocatalytic powder was dispersed in a binder solution (about 10 gm, 10% solution) by holding the glass bottle containing the mixture in the sonication bath for about one hour. The resulting suspension was passed through a coaxial filter with a stainless steel screen having an opening of 30 microns.

在塗佈之前,使經清潔PET基板經受電暈放電處理以增加基板表面之親水性以達成塗佈懸浮液之良好可潤濕性。以100W之放電功率及0.5m/秒之掃描速度進行兩次掃描來使用電暈處理裝置(TEWC-4AX,KASUGA DENKI Inc.JAPAN)。 Prior to coating, the cleaned PET substrate is subjected to a corona discharge treatment to increase the hydrophilicity of the substrate surface to achieve good wettability of the coating suspension. A corona treatment apparatus (TEWC-4AX, KASUGA DENKI Inc. JAPAN) was used by performing two scans at a discharge power of 100 W and a scan speed of 0.5 m/sec.

藉由用旋塗器(SCS 6800 series,Specialty Coating System)以約1200rpm進行旋塗歷時約20秒而在所製備PET基板上執行基板(Ex-1)之塗佈。 Coating of the substrate (Ex-1) was performed on the prepared PET substrate by spin coating at about 1200 rpm for about 20 seconds using a spin coater (SCS 6800 series, Specialty Coating System).

額外實例(Ex-1')係以類似於Ex-1之方式製備,惟以下除外:根據2011年1月28日申請、2012年10月9日頒予的美國專利8,283,843中所描述之方法使用刮漿刀及帶式澆注器(AFA-II,MTI Corporation)藉由帶式澆注而在所製備PET基板上形成光催化塗層。刮漿刀的間隙保持在3密耳至20密耳(一密耳等於1/1000吋或25.4微米)之範圍中。在環境氣氛中於110℃乾燥具有光催化塗層之PET基板歷時約1小時。額外實例(Ex-A至Ex-F)係以類似於Ex-1之方式製備,惟以下除外:黏合劑溶液wt%及光催化材料對黏合劑溶液之比將如表1中所指示地變化。 Additional examples (Ex-1') were prepared in a manner similar to that of Ex-1 except for the following: the method described in U.S. Patent No. 8,283,843, issued Jan. A doctor blade and a belt caster (AFA-II, MTI Corporation) formed a photocatalytic coating on the prepared PET substrate by tape casting. The gap of the doctor blade is maintained in the range of 3 mils to 20 mils (one mil equals 1/1000 inch or 25.4 micrometers). The PET substrate having the photocatalytic coating was dried at 110 ° C for about 1 hour in an ambient atmosphere. Additional examples (Ex-A to Ex-F) were prepared in a manner similar to Ex-1 except that the wt% of the binder solution and the ratio of photocatalytic material to binder solution will vary as indicated in Table 1. .

額外實例(Ex-G)係以類似於Ex-1之方式製備,惟以下除外:基板為聽診器隔膜基板之2.5cm直徑圓盤。使用市售聽診器隔膜(3M,Minneapolis,MN,美國,LittmannTM)作為用於光催化劑塗佈之基板。懸浮液係由填充氧化銅之多相TiO2(P25)製成,且藉由以1000rpm旋塗歷時20秒而將PGMEA中之10wt% KR5230的黏合劑溶液應用於隔膜上,接著在環境氣氛中於110℃乾燥歷時1小時。 An additional example (Ex-G) was prepared in a manner similar to Ex-1 except that the substrate was a 2.5 cm diameter disc of the stethoscope diaphragm substrate. Stethoscope commercially available membrane (3M, Minneapolis, MN, USA, Littmann TM) as the substrate for the photocatalytic coating. The suspension was made of multi-phase TiO 2 (P25) filled with copper oxide, and a 10 wt% KR5230 binder solution in PGMEA was applied to the separator by spin coating at 1000 rpm for 20 seconds, followed by ambient atmosphere. Dry at 110 ° C for 1 hour.

黏附性 Adhesion

藉由遵循ASM-D3359中所描述之程序來評估光催化塗層之黏附性。 The adhesion of the photocatalytic coating was evaluated by following the procedure described in ASM-D3359.

藉由遵循ASTM-3363中所描述之程序來評估塗層硬度。 The coating hardness was evaluated by following the procedure described in ASTM-3363.

移除百分比:0B>65%;1B:35%至65%;2B:15%至35%;3B:5%至15%;4B<5%;5B:0% Percentage of removal: 0B>65%; 1B: 35% to 65%; 2B: 15% to 35%; 3B: 5% to 15%; 4B<5%; 5B: 0%

抗菌效能 Antibacterial efficacy

藉由遵循程序來評估抗菌效能。 Antibacterial efficacy was assessed by following procedures.

藉由順序應用70%IPA(異丙醇)、100%乙醇(EtOH)來預備基板(1"×2"玻璃載片),接著在空氣中乾燥。將Ex-1以2mg/mL濃度分散於100% EtOH中,接著將約100μL的該懸浮液應用於基板,接著乾燥。將應用製程重複5次以在基板上得到約1mg的Ex-1。接著在室溫下乾燥基板。將經塗佈基板置放於具有用於維持潮濕之浸水濾紙的玻璃盤中,且將玻璃隔片插入於基板與濾紙之間以將其分開。 The substrate (1" x 2" glass slide) was prepared by sequential application of 70% IPA (isopropyl alcohol), 100% ethanol (EtOH), followed by drying in air. Ex-1 was dispersed in 100% EtOH at a concentration of 2 mg/mL, and then about 100 μL of this suspension was applied to the substrate, followed by drying. The application process was repeated 5 times to obtain about 1 mg of Ex-1 on the substrate. The substrate was then dried at room temperature. The coated substrate was placed in a glass dish having a water immersion filter paper for maintaining moisture, and a glass spacer was inserted between the substrate and the filter paper to separate them.

將大腸桿菌(ATCC 8739)劃線至含有約20ml的LB(潛溶型培養液/魯利亞培養液)瓊脂的10cm直徑皮氏培養皿上且在約37℃下保溫隔夜。對於每一實驗,拾取單一菌落以接種約3mL營養培養液,且將經接種培養物在約37℃下保溫歷時約16小時以產生隔夜培養物(~109細胞/mL)。藉由將隔夜培養物稀釋100倍、接種具有LB瓊脂之另一5cm皮氏培養皿且在約37℃下保溫歷時約2.5小時來獲得隔夜培養物之新鮮對數期培養物。用於0.85%生理食鹽水將新鮮培養物稀釋50倍,此得到約2×106細胞/mL之細胞懸浮液。將50μL的該細胞懸浮液移液 至每一沈積玻璃基板上。將滅菌(在70%、接著在100% EtOH中)塑膠薄膜(20mm×40mm)置放於懸浮液上方以在該薄膜下均勻分散。將試樣保持在暗處(CuxO-暗)或接著在藍LED光(455nm,10mW/cm2)(CuxO-亮)下照射。在所選時間點,例如,30分鐘/60分鐘增量,將試樣置放於10mL的0.85%生理食鹽水中且經渦旋以洗去細菌。保留該洗去懸浮液,接著使用0.85%生理食鹽水對其連續稀釋,且接著將該懸浮液塗在LB瓊脂上並在約37℃下保溫隔夜以判定依據菌落形成單位/試樣的活細胞之數目。 Escherichia coli (ATCC 8739) was streaked onto a 10 cm diameter Petri dish containing about 20 ml of LB (latent culture medium/Luria medium) agar and incubated overnight at about 37 °C. For each experiment, a single colony was picked to inoculate approximately 3 mL of nutrient medium and the inoculated culture was incubated at approximately 37 °C for approximately 16 hours to produce an overnight culture (~10 9 cells/mL). Fresh log phase cultures of overnight cultures were obtained by diluting overnight cultures 100-fold, inoculating another 5 cm Petri dish with LB agar and incubating at about 37 °C for about 2.5 hours. The fresh culture was diluted 50-fold with 0.85% physiological saline, which gave a cell suspension of about 2 x 10 6 cells/mL. 50 μL of this cell suspension was pipetted onto each of the deposited glass substrates. A plastic film (20 mm x 40 mm) sterilized (in 70%, followed by 100% EtOH) was placed over the suspension to evenly disperse under the film. The sample was kept in the dark (Cu x O-dark) or then irradiated under blue LED light (455 nm, 10 mW/cm 2 ) (Cu x O-bright). At selected time points, for example, 30 minute/60 minute increments, the samples were placed in 10 mL of 0.85% physiological saline and vortexed to wash away the bacteria. The rinse-off suspension was retained, and then serially diluted with 0.85% physiological saline, and then the suspension was spread on LB agar and incubated overnight at about 37 ° C to determine living cells according to colony forming units/samples. The number.

圖5至圖9展示PET基板上的具有如表1中所描述之變化P催化劑填充的光催化塗層的抗菌(大腸桿菌)效能(圖5-樣本實例A,圖6-樣本實例B等)。趨勢如下:隨黏合劑含量增加,黏附性增加,及抗菌效能並無顯著改變。為了在維持光催化塗層至基板之良好黏附的同時得到良好抗菌效能,75vol%以上之黏合劑填充係有利的。 Figures 5 to 9 show the antibacterial (E. coli) efficacy of a photocatalytic coating filled with a P-catalyst as described in Table 1 on a PET substrate (Figure 5 - Sample Example A, Figure 6 - Sample Example B, etc.) . The trend is as follows: as the binder content increases, the adhesion increases, and the antibacterial efficacy does not change significantly. In order to obtain good antibacterial performance while maintaining good adhesion of the photocatalytic coating to the substrate, more than 75 vol% of the binder filling is advantageous.

圖10展示以聚矽氧改性之聚酯樹脂作為黏合劑的PET基板上之光催化塗層之表面及橫截面形態。塗層厚度為約10微米。 Figure 10 shows the surface and cross-sectional morphology of a photocatalytic coating on a PET substrate using a polyoxymethylene-modified polyester resin as a binder. The coating thickness is about 10 microns.

實例2(PET基板上之P催化劑(CuxO/TiO2)塗層) Example 2 (P catalyst (Cu x O/TiO 2 ) coating on PET substrate)

藉由遵循相同處理程序而在PET基板上形成包含填充銅氧化鈦及作為黏合劑的聚矽氧改性之聚酯的光催化塗層(實例AA、AB、AC、AD、AE、AF)。使用1公克的填充有1wt%之CuxO的氧化鈦粉末P25(Evonik Deggusa Corp,Parissipany,NJ,美國)而非上文所述之實例1之光催化材料。表2展示黏附性、硬度及作為對大腸桿菌之完全殺滅時間的抗菌效能。圖11展示細菌數對與具有變化之光催化材料填充之光催化塗層的接觸時間。 A photocatalytic coating (Examples AA, AB, AC, AD, AE, AF) comprising a filled copper-titanium oxide and a polyfluorene-modified polyester as a binder was formed on the PET substrate by following the same processing procedure. One gram of titanium oxide powder P25 (Evonik Deggusa Corp, Parischipany, NJ, USA) filled with 1 wt% of Cu x O was used instead of the photocatalytic material of Example 1 described above. Table 2 shows the adhesion, hardness and antibacterial efficacy as a complete kill time for E. coli. Figure 11 shows the contact time of the bacterial number versus the photocatalytic coating with varying photocatalytic material filling.

RT:室溫 RT: room temperature

實例3(PET基板上之P催化劑(CuxO/SnO2)塗層) Example 3 (P catalyst (Cu x O/SnO 2 ) coating on PET substrate)

藉由遵循前述之相同處理程序在PET基板上形成包含填充銅氧化錫及作為黏合劑之聚矽氧改性之聚酯的光催化塗層。光催化粉末中之銅含量係氧化錫之1wt%。圖11展示PET基板上之光催化塗層之抗菌效能。 A photocatalytic coating comprising a copper-filled tin oxide and a polyfluorene-modified polyester as a binder was formed on the PET substrate by following the same procedure as described above. The copper content in the photocatalytic powder is 1% by weight of tin oxide. Figure 11 shows the antimicrobial efficacy of a photocatalytic coating on a PET substrate.

實例4(聚合物瓶上之以聚矽氧寡聚物作為黏合劑的P催化劑(CuxO/TiO2)塗層) Example 4 (P catalyst (Cu x O/TiO 2 ) coating with a polyoxyl oligomer as a binder on a polymer bottle)

實施水瓶上的包含填充銅氧化鈦之光催化塗層。塗佈懸浮液由分散於聚矽氧寡聚物(KR-500,ShinEtshu Silicones,JAPAN)中的填充氧化銅之多相氧化鈦(CuxO/P25)粉末及相對於KR-500為2wt%之催化劑(D-25)組成,該懸浮液係藉由遵循實例1中之程序製得。首先對由PMMA製成之水瓶塗佈由矽烷偶合劑組成之底塗層以用於促進PMMA與KR-500之間的黏附。矽烷偶合劑之合成列出如下。 A photocatalytic coating comprising copper titanate filled on the water bottle is implemented. The coating suspension consists of a multi-phase titanium oxide (Cu x O/P25) powder filled with copper oxide dispersed in a polyoxyxene oligomer (KR-500, ShinEtshu Silicones, JAPAN) and 2% by weight relative to KR-500. A catalyst (D-25) consisting of the procedure of Example 1 was followed. First, a water bottle made of PMMA was coated with an undercoat layer composed of a decane coupling agent for promoting adhesion between PMMA and KR-500. The synthesis of decane coupling agents is listed below.

矽烷化程序:製備70:30vol%的乙醇與MiliQ(MQ)水之混合物以作為矽烷反應之溶劑。自此,製得胺丙基三乙氧基矽烷(APTES)之7.5wt%溶液。藉由添加濃乙酸將該溶液之pH調整至5.5。在水解同時攪拌該反應歷時1 小時。 Decaneization procedure: A 70:30 vol% mixture of ethanol and MiliQ (MQ) water was prepared as a solvent for the decane reaction. From this, a 7.5 wt% solution of aminopropyltriethoxydecane (APTES) was prepared. The pH of the solution was adjusted to 5.5 by the addition of concentrated acetic acid. Stirring the reaction while hydrolyzing 1 hour.

容器之內部充滿矽烷化混合物且使其靜置30分鐘。接著用大量的MQ水沖洗容器且在後續塗佈之前使容器乾燥。 The interior of the vessel was filled with the decane mixture and allowed to stand for 30 minutes. The container is then rinsed with a large amount of MQ water and the container is allowed to dry before subsequent coating.

(APTES) (APTES)

藉由用懸浮液浸塗且接著以約400rpm自旋歷時約5分鐘以除去額外塗佈懸浮液從而得到均勻塗層而將P催化劑塗層應用在塗佈有底塗劑之PMMA瓶上。將經塗佈之瓶在環境氣氛及溫度下固化歷時約12小時。 The P catalyst coating was applied to a PMMA bottle coated with a primer by dip coating with a suspension and then spinning at about 400 rpm for about 5 minutes to remove the additional coating suspension to obtain a uniform coating. The coated bottle was cured under ambient atmosphere and temperature for about 12 hours.

實例5(具有無機黏合劑之光催化塗層) Example 5 (Photocatalytic coating with inorganic binder)

使用市售無機溶膠作為黏合劑以替換包括矽石、氧化鋁、氧化鋯及二氧化鈦溶膠之聚矽氧樹脂。藉由音波處理探針(sonication probe)將矽石溶膠(SNOWTEX-O,Nissan Chemicals,JAPAN)與由如實例2中所提到之填充銅氧化鈦組成的光催化粉末混合歷時30分鐘。光催化材料填充在5.6至37.4vol%之範圍中變化。藉由以1200rpm之自旋速率旋塗而將光催化懸浮液應用在PET基板上。將塗層在110℃下乾燥歷時1小時以移除矽石溶膠中之溶劑及水從而得到具有至PET基板之良好黏附的塗層。 A commercially available inorganic sol is used as a binder to replace a polyoxyl resin including vermiculite, alumina, zirconia, and titania sol. The vermiculite sol (SNOWTEX-O, Nissan Chemicals, JAPAN) was mixed with a photocatalytic powder consisting of the filled copper titania as mentioned in Example 2 by a sonication probe for 30 minutes. The photocatalytic material filling varies in the range of 5.6 to 37.4 vol%. The photocatalytic suspension was applied to a PET substrate by spin coating at a spin rate of 1200 rpm. The coating was dried at 110 ° C for 1 hour to remove the solvent and water in the vermiculite sol to obtain a coating having good adhesion to the PET substrate.

實例I(PET基板上之P催化劑(CuxO/TiO2)塗層) Example I (P catalyst (Cu x O/TiO 2 ) coating on PET substrate)

使用具有約120微米之厚度的市售PET(聚對苯二甲酸伸乙酯)薄膜(Eplastics Inc.San Diego,CA美國)作為光催化塗層之基板。將基板切割成紙張大小。用丙酮來清潔經切割PET基板且接著乾燥。 A commercially available PET (polybutylene terephthalate) film (Eplastics Inc. San Diego, CA USA) having a thickness of about 120 μm was used as a substrate for the photocatalytic coating. Cut the substrate into a paper size. The cut PET substrate was cleaned with acetone and then dried.

藉由混合約1g的UV可固化丙烯酸酯黏合劑(由DIC corporation,JAPAN以商標名稱Unidic17806銷售)、約24mg的光引發劑 (以商標名稱Irgacure 907銷售)及約10g的環戊酮(試劑>99.5%,Sigma-Aldrich)來製得含有10wt% UV可固化硬塗層之黏合劑溶液。混合係用行星離心混合器(THINKY AR-310)以約2000rpm進行歷時2分鐘以用於混合,接著以約2200rpm進行歷時約1分鐘以用於消泡。 By mixing about 1 g of UV curable acrylate adhesive (sold by DIC corporation, JAPAN under the trade name Unidic 17806), about 24 mg of photoinitiator A binder solution containing 10% by weight of a UV curable hard coat layer was prepared (sold under the trade name Irgacure 907) and about 10 g of cyclopentanone (reagent > 99.5%, Sigma-Aldrich). The mixing was carried out with a planetary centrifugal mixer (THINKY AR-310) at about 2000 rpm for 2 minutes for mixing, followed by about 2200 rpm for about 1 minute for defoaming.

為了製作塗佈懸浮液,將按重量計的一份CuxO/P25光催化粉末(約0.2g)與按重量計的5份黏合劑溶液(溶解於環戊酮中之10wt%丙烯酸胺基甲酸酯)混合。光催化粉末係根據如下各者中所描述地製得:2013年3月15日申請之美國專利申請案13/840,859;及2013年6月14日申請之美國臨時申請案61/835,399;及2013年1月14日申請之美國專利申請案13/741,191(2013年8月1日公開之美國公開案第2013/0192976號)。光催化催化劑(P催化劑)粉末包含填充氧化銅之氧化鈦,其摻雜有碳、氮及錫以增加可見光範圍中之光吸收。P催化劑中之標稱銅含量為1wt%。藉由將含有混合物之玻璃瓶保持在音波處理浴槽中歷時約半小時、繼之以探針音波處理歷時約20至30分鐘而將0.2gm的光催化粉末分散在黏合劑溶液(約1gm,10%溶液)中。使所獲得懸浮液通過具有5微米之開口的過濾器。 To make a coating suspension, one part by weight of Cu x O/P25 photocatalytic powder (about 0.2 g) and 5 parts by weight of binder solution (10 wt% of acrylamide in cyclopentanone) Formate) mixed. Photocatalytic powders are prepared as described in each of the following: US Patent Application No. 13/840,859, filed on March 15, 2013; and US Provisional Application No. 61/835,399, filed on Jun. 14, 2013; U.S. Patent Application Serial No. 13/741,191, filed Jan. The photocatalytic catalyst (P catalyst) powder comprises titanium oxide filled with copper oxide doped with carbon, nitrogen and tin to increase light absorption in the visible range. The nominal copper content in the P catalyst was 1 wt%. The 0.2 gm photocatalytic powder is dispersed in the binder solution (about 1 gm, 10) by holding the glass bottle containing the mixture in the sonication bath for about half an hour, followed by probe sonication for about 20 to 30 minutes. % solution). The resulting suspension was passed through a filter with an opening of 5 microns.

在塗佈之前,使經清潔PET基板經受電暈放電處理以增加基板表面之親水性以達成塗佈懸浮液之良好可潤濕性。以100W之放電功率及0.5m/秒之掃描速度進行兩次掃描來使用電暈處理裝置(TEWC-4AX,KASUGA DENKI Inc.JAPAN)。 Prior to coating, the cleaned PET substrate is subjected to a corona discharge treatment to increase the hydrophilicity of the substrate surface to achieve good wettability of the coating suspension. A corona treatment apparatus (TEWC-4AX, KASUGA DENKI Inc. JAPAN) was used by performing two scans at a discharge power of 100 W and a scan speed of 0.5 m/sec.

根據2011年1月28日申請、2012年10月9日頒予的美國專利8,283,843中所描述之方法使用刮漿刀及帶式澆注器(AFA-II,MTI Corporation)藉由帶式澆注而在所製備PET基板上執行基板(Ex-I)之塗佈。刮漿刀的間隙保持在3密耳至20密耳(一密耳等於1/1000吋或25.4微米)之範圍中。在環境氣氛下將具有光催化塗層之PET基板乾燥,接著在90℃至100℃下預熱歷時約2分鐘,接著在Loctite® Zeta® 7411 UV溢流固化系統下UV固化。藉由具有約25mw/cm2之能量強度的ZETA 7011-A劑量計-輻射計來監視UV光能量。額外實例(Ex-II、Ex-III及Ex-IV)係以類似於Ex-I之方式製備,惟以下除外:黏合劑對P催化劑之比不同且如表4中所指示地變化。 The method described in U.S. Patent No. 8,283,843, issued to theU. Coating of the substrate (Ex-I) was performed on the prepared PET substrate. The gap of the doctor blade is maintained in the range of 3 mils to 20 mils (one mil equals 1/1000 inch or 25.4 micrometers). The PET substrate with the photocatalytic coating was dried under ambient atmosphere, followed by preheating at 90 ° C to 100 ° C for about 2 minutes, followed by UV curing under a Loctite® Zeta® 7411 UV overflow curing system. The UV light energy was monitored by a ZETA 7011-A dosimeter-radiometer with an energy intensity of about 25 mw/cm 2 . Additional examples (Ex-II, Ex-III, and Ex-IV) were prepared in a manner similar to Ex-I except that the ratio of binder to P catalyst was different and varied as indicated in Table 4.

額外實例(Ex-11至Ex-15)係以類似於Ex-I之方式製備,惟以下除外:不同分散劑被添加至黏合劑/光引發劑/環戊酮且以如表6中所指示的量變化。 Additional examples (Ex-11 to Ex-15) were prepared in a manner similar to Ex-I except that the following dispersants were added to the binder/photoinitiator/cyclopentanone and as indicated in Table 6. The amount of change.

實例V(P催化劑(CuxO/TiO2)塗層/介入層/PET基板實施例) Example V (P Catalyst (Cu x O/TiO 2 ) Coating / Interposer / PET Substrate Example)

如上文之實例I中所描述地製備實例V中之基板。 The substrate of Example V was prepared as described in Example I above.

介入第一層及光催化劑/黏合劑第二層之黏合劑溶液係以類似於實例I中所描述之黏合劑層的方式製得,下文表3中所描述的除外。 The adhesive solution intervening in the first layer and the second layer of photocatalyst/adhesive was prepared in a manner similar to the adhesive layer described in Example I, except as described in Table 3 below.

以類似於上文實例I中所描述之方式的方式將第一或介入層應用於所製備基板。 The first or intervening layer is applied to the prepared substrate in a manner similar to that described in Example I above.

接著將第二或光催化層安置於第一層塗層上。刮漿刀的間隙保持在1密耳至3密耳之範圍中。在環境氣氛中將具有第一聚合塗層及第二聚合塗層之PET基板乾燥,接著在90℃至100℃下預熱歷時約2分鐘。接著在Loctite® Zeta® 7411 UV溢流固化系統下將經乾燥的雙塗佈基板UV固化。藉由具有約25mw/cm2之能量強度的ZETA 7011-A劑量計-輻射計來監視UV光能量。 A second or photocatalytic layer is then placed over the first layer of coating. The gap of the doctor blade is maintained in the range of 1 mil to 3 mils. The PET substrate having the first polymeric coating and the second polymeric coating is dried in an ambient atmosphere and then preheated at 90 ° C to 100 ° C for about 2 minutes. The dried dual coated substrate was then UV cured under a Loctite® Zeta® 7411 UV Overflow Curing System. The UV light energy was monitored by a ZETA 7011-A dosimeter-radiometer with an energy intensity of about 25 mw/cm 2 .

混濁度及透光度 Turbidity and transparency

在UltrascanPro上評估混濁度及透光度,該評估遵循ASTM-D1003標準中所描述之程序。 The turbidity and transmittance were evaluated on an Ultrascan Pro following the procedure described in the ASTM-D1003 standard.

黏附性 Adhesion

藉由遵循ASM-D3359中所描述之程序來評估光催化塗層之黏附性。 The adhesion of the photocatalytic coating was evaluated by following the procedure described in ASM-D3359.

移除百分比:0B>65%;1B:35%至65%;2B:15%至35%;3B:5%至15%;4B<5%;5B:0% Percentage of removal: 0B>65%; 1B: 35% to 65%; 2B: 15% to 35%; 3B: 5% to 15%; 4B<5%; 5B: 0%

硬度 hardness

藉由遵循ASTM-3363中所描述之程序來評估塗層硬度。 The coating hardness was evaluated by following the procedure described in ASTM-3363.

耐溶劑性(摩擦測試) Solvent resistance (friction test)

藉由遵循ASTM-D5402中所描述之程序來評估摩擦測試,所使用之溶劑包括IPA、EtOH及漂白劑。布係無塵室合成抹布。執行來回摩擦(double rub),直至200次之最大值。 The friction test was evaluated by following the procedure described in ASTM-D5402, using solvents including IPA, EtOH, and bleach. Cloth clean room synthetic rag. Perform a double rub until the maximum of 200 times.

圖16係展示本文中所描述之實施例(實例I及實例II)之抗菌(大腸桿菌)活性的曲線圖。 Figure 16 is a graph showing the antibacterial (E. coli) activity of the examples (Examples I and II) described herein.

圖17係展示本文中所描述之實施例(實例11至實例15)在明亮條件下之抗菌(大腸桿菌)活性的曲線圖。 Figure 17 is a graph showing the antibacterial (E. coli) activity of the examples (Examples 11 to 15) described herein under bright conditions.

圖18係展示本文中所描述之實施例(實例11至實例15)在黑暗條件下之抗菌(大腸桿菌)活性的曲線圖。 Figure 18 is a graph showing the antibacterial (E. coli) activity of the examples (Examples 11 to 15) described herein under dark conditions.

測試前與測試後資料之間的差異可能歸因於測試點不相同。 The difference between pre-test and post-test data may be due to different test points.

圖19及圖20係實例11之SEM相片。圖21及圖22係實例15之SEM相片。該等SEM相片描繪光催化材料在固化的黏合劑/光催化劑表面中或上的分散均勻性。 19 and 20 are SEM photographs of Example 11. 21 and 22 are SEM photographs of Example 15. These SEM photographs depict the uniformity of dispersion of the photocatalytic material in or on the surface of the cured binder/photocatalyst.

除非另外指出,否則說明書及申請專利範圍中所使用之表示成分之量,諸如分子量、反應條件等之性質的所有數字應理解為在所有情況下均由術語「約」修飾。因此,除非有相反指示,否則本說明書及附加申請專利範圍中所闡述之數值參數係可視設法獲得之所要性質而變化的近似值。最低限度地,且不試圖限制等效物原則對申請專利範圍之範疇的應用,每一數值參數至少應根據所報導之有效數位的數目且藉由應用一般捨入技術來解釋。 Unless otherwise indicated, all numbers expressing quantities of ingredients, such as molecular weight, reaction conditions, and the like, used in the specification and claims are to be understood as being modified by the term "about" in all instances. Accordingly, the numerical parameters set forth in the specification and the appended claims are to be construed as an At the very least, and not as an attempt to limit the application of the scope of the invention to the scope of the claims, each numerical parameter should be construed in the

除非本文另外指示或明顯與上下文相矛盾,否則在描述實施例 之上下文中(尤其在以下申請專利範圍之上下文中)所使用的術語「一」及「該」及類似指示物應解釋為涵蓋單數與複數兩種情況。除非本文另外指出或明顯與上下文矛盾,否則本文所述之所有方法可以任何適合次序進行。使用本文中所提供之任何及所有實例或例示性語言(例如「諸如」)僅意欲較好地闡明實施例,而不對任何技術方案之範疇造成限制。本說明書中之語言不應解釋為指示任何未主張之要素對於實踐實施例而言必不可少。 In the description of the embodiments, unless otherwise indicated herein or clearly contradicted by context The terms "a" and "the" and the like are used in the context of the singular and plural. All methods described herein can be performed in any suitable order unless otherwise indicated herein or otherwise clearly contradicted. The use of any and all examples or exemplary language, such as "such as" The language in the specification should not be construed as indicating that any non-claimed elements are essential to the embodiments.

本文中所揭示的替代元件或實施例之分組不應解釋為限制。可個別地或以與群組之其他成員或本文中所發現的其他元件的任何組合來參考及主張每一群組成員。預期可出於便利性及/或可專利性的原因而將群組之一或多個成員包括於群組中或自群組刪除。當任何此包括或刪除發生時,本說明書被認為含有如所修飾的群組,因此滿足附加之申請專利範圍中所使用之所有馬庫什(Markush)群組的書面描述。 The grouping of alternative elements or embodiments disclosed herein is not to be construed as limiting. Each group member can be referred to and claimed individually or in any combination with other members of the group or other elements found herein. It is contemplated that one or more members of a group may be included in or deleted from the group for reasons of convenience and/or patentability. When any such inclusion or deletion occurs, the specification is considered to contain the group as modified, thus satisfying the written description of all Markush groups used in the scope of the appended claims.

特定實施例係描述於本文中,包括本發明人已知之進行本發明的最佳模式。當然,此等所描述實施例之變化在一般熟習此項技術者在閱讀先前描述後隨即將變得顯而易見。本發明人預期熟習此項技術者會適當採用此等變化,且本發明人意欲以不同於本文中特定所述之方式來實踐實施例。因此,技術方案包括如可適用法律所准許的申請專利範圍中所述之標的物的所有修改及等效物。此外,除非本文另外指示或明顯與上下文相矛盾,否則預期上述元件的所有可能變化之任何組合。 Specific embodiments are described herein, including the best mode known to the inventors to carry out the invention. Of course, variations of the described embodiments will become apparent to those skilled in the art upon reading the description. The inventors intend for the skilled artisan to employ such variations as appropriate, and the inventors intend to practice the embodiments in a manner different from those specifically described herein. Accordingly, the technical solution includes all modifications and equivalents of the subject matter described in the scope of the claims. Further, any combination of all possible variations of the above-described elements is contemplated unless otherwise indicated herein or otherwise clearly contradicted.

總之,應理解,本文中所揭示之實施例說明申請專利範圍之原理。可使用之其他修改在申請專利範圍之範疇內。因此,舉例而言,但非限制,可根據本文中之教示利用替代實施例。因此,申請專利範圍不僅限於如所示及描述之實施例。 In sum, it should be understood that the embodiments disclosed herein are illustrative of the principles of the claims. Other modifications that may be used are within the scope of the patent application. Thus, by way of example, and not limitation, Therefore, the scope of the patent application is not limited to the embodiments as shown and described.

本申請案係基於2013年11月4日申請之美國臨時申請案第61/899,423號、2014年1月24日申請之美國臨時申請案第61/931,387號及2014年6月4日申請之美國臨時申請案第62/007,489號,該等申請案之全部內容以引用的方式併入本文中。 The present application is based on U.S. Provisional Application No. 61/899,423, filed on Nov. 4, 2013, U.S. Provisional Application No. 61/931,387, filed on Jan. 24, 2014, and U.S. Provisional Application No. 62/007,489, the entire contents of each of which is incorporated herein by reference.

另外,上文所提及的美國專利第5,897,958號、美國專利第6,228,480號、美國專利第6,407,033號、美國專利第7,510,595號及美國再頒發專利第RE38,850號中之每一者亦以全文引用的方式併入本文中。 In addition, each of the above-mentioned U.S. Patent No. 5,897,958, U.S. Patent No. 6,228,480, U.S. Patent No. 6,407,033, U.S. Patent No. 7,510,595, and U.S. Reissue Patent No. RE38,850 are also incorporated by reference in their entirety. The way is incorporated in this article.

Claims (24)

一種用於製造光催化元件之方法,其包含:提供包含黏合劑及光催化材料之懸浮液,其中該黏合劑對該光催化材料之重量比為約0.5至2.0份黏合劑對約1份光催化材料;及將該懸浮液應用於基板表面。 A method for fabricating a photocatalytic element, comprising: providing a suspension comprising a binder and a photocatalytic material, wherein the weight ratio of the binder to the photocatalytic material is from about 0.5 to 2.0 parts of binder to about 1 part of light a catalytic material; and applying the suspension to the surface of the substrate. 如請求項1之方法,其進一步包含將矽烷偶合劑應用於該基板表面。 The method of claim 1, further comprising applying a decane coupling agent to the surface of the substrate. 如請求項2之方法,其中該矽烷偶合劑係胺基丙基三乙氧基矽烷。 The method of claim 2, wherein the decane coupling agent is aminopropyltriethoxydecane. 如請求項1至3中任一項之方法,其進一步包含將黏合劑催化劑材料添加至該懸浮液。 The method of any one of claims 1 to 3, further comprising adding a binder catalyst material to the suspension. 如請求項4之方法,其中該黏合劑催化劑材料係D25。 The method of claim 4, wherein the binder catalyst material is D25. 如請求項1至5中任一項之方法,其中提供該懸浮液進一步包含將聚矽氧樹脂溶解於丙二醇溶劑中。 The method of any one of claims 1 to 5, wherein providing the suspension further comprises dissolving the polyoxyxylene resin in a propylene glycol solvent. 如請求項6之方法,其中該聚矽氧樹脂係聚矽氧醇酸樹脂、聚矽氧環氧樹脂、聚矽氧丙烯酸系樹脂或聚矽氧聚酯樹脂。 The method of claim 6, wherein the polyoxynoxy resin is a polyoxyl alkyd resin, a polyoxymethylene epoxy resin, a polyoxypropylene acrylic resin or a polyoxyethylene polyester resin. 如請求項7之方法,其中該聚矽氧樹脂係聚矽氧聚酯樹脂。 The method of claim 7, wherein the polyoxyxylene resin is a polyoxymethylene polyester resin. 如請求項1至8中任一項之方法,其中該光催化材料包含填充氧化銅之金屬氧化物。 The method of any one of claims 1 to 8, wherein the photocatalytic material comprises a metal oxide filled with copper oxide. 一種用於製造光催化元件之方法,其包含:提供包含10%的KR5230及90%的丙二醇單甲醚乙酸酯(PGMEA)之溶液;以10:1(w/w)黏合劑:光催化材料之比將光催化性填充銅之多相氧化鈦材料粉末添加至該溶液; 用電暈處理對PET表面進行預處理;及以約100至約2000rpm歷時約30至約60秒將該溶液旋塗於該經預處理之PET表面上。 A method for producing a photocatalytic element, comprising: providing a solution comprising 10% KR5230 and 90% propylene glycol monomethyl ether acetate (PGMEA); 10:1 (w/w) binder: photocatalysis a ratio of materials to the photocatalytic copper-filled multiphase titanium oxide material powder is added to the solution; The PET surface is pretreated by corona treatment; and the solution is spin coated onto the pretreated PET surface at about 100 to about 2000 rpm for about 30 to about 60 seconds. 一種包含聚矽氧聚酯樹脂及光催化材料之光催化元件,其中該樹脂對該光催化材料之重量比係在約0.5至約2.0比約1之間。 A photocatalytic element comprising a polyoxymethylene polyester resin and a photocatalytic material, wherein the weight ratio of the resin to the photocatalytic material is between about 0.5 and about 2.0 to about 1. 如請求項11之光催化元件,其中該聚矽氧聚酯樹脂係選自KR500、KR5230及KR5235。 The photocatalytic element of claim 11, wherein the polyoxymethylene polyester resin is selected from the group consisting of KR500, KR5230, and KR5235. 一種用於製造光催化元件之方法,其包含:提供包含黏合劑、光催化材料、光引發劑及有機溶劑的懸浮液,其中該黏合劑對該光催化材料之重量比為約1.0至20份黏合劑對約1份光催化材料;及將該懸浮液應用於基板表面。 A method for producing a photocatalytic element, comprising: providing a suspension comprising a binder, a photocatalytic material, a photoinitiator, and an organic solvent, wherein the weight ratio of the binder to the photocatalytic material is about 1.0 to 20 parts by weight The binder is applied to about 1 part of the photocatalytic material; and the suspension is applied to the surface of the substrate. 如請求項13之方法,其中該黏合劑包含紫外線可固化胺基甲酸酯樹脂。 The method of claim 13, wherein the binder comprises an ultraviolet curable urethane resin. 如請求項13或14之方法,其中該有機溶劑係C1-C7酮。 The method of claim 13 or 14, wherein the organic solvent is a C 1 -C 7 ketone. 如請求項13或14之方法,其中該有機溶劑係C1-C7醇。 The method of claim 13 or 14, wherein the organic solvent is a C 1 -C 7 alcohol. 如請求項13或14之方法,其中該有機溶劑係選自環戊酮、丙二醇單甲醚乙酸酯(PGMEA)、N-甲基吡咯啶酮(NMP)、甲基乙基酮(MEK)、甲苯、乙酸乙酯及乙酸丁酯。 The method of claim 13 or 14, wherein the organic solvent is selected from the group consisting of cyclopentanone, propylene glycol monomethyl ether acetate (PGMEA), N-methylpyrrolidone (NMP), methyl ethyl ketone (MEK) , toluene, ethyl acetate and butyl acetate. 如請求項13至17中任一項之方法,其中該懸浮液進一步包含分散劑。 The method of any one of claims 13 to 17, wherein the suspension further comprises a dispersing agent. 如請求項18之方法,其中該分散劑係選自陽離子分散劑、陰離子分散劑及非離子分散劑。 The method of claim 18, wherein the dispersing agent is selected from the group consisting of a cationic dispersing agent, an anionic dispersing agent, and a nonionic dispersing agent. 如請求項13至19中任一項之方法,其中該光引發劑係選自IRGACURE 907及IRGACURE 2022。 The method of any one of claims 13 to 19, wherein the photoinitiator is selected from the group consisting of IRGACURE 907 and IRGACURE 2022. 如請求項13至20中任一項之方法,其中該光催化材料包含填充 氧化銅之金屬氧化物。 The method of any one of claims 13 to 20, wherein the photocatalytic material comprises a fill A metal oxide of copper oxide. 一種用於製造光催化元件之方法,其包含:提供包含10wt%的丙烯酸胺基甲酸酯樹脂、低於1.0wt%的光引發劑及90wt%的環戊酮之溶液;以5:1(w/w)黏合劑:光催化材料之比將光催化性填充銅之多相氧化鈦材料粉末添加至該溶液;用電暈處理對PET表面進行預處理;及將該懸浮液帶式澆注於該經預處理之PET表面上。 A method for producing a photocatalytic element, comprising: providing a solution comprising 10% by weight of urethane acrylate resin, less than 1.0% by weight of photoinitiator, and 90% by weight of cyclopentanone; w/w) binder: ratio of photocatalytic material, a photocatalytic copper-filled multiphase titanium oxide material powder is added to the solution; the surface of the PET is pretreated by corona treatment; and the suspension is cast in a belt The pretreated PET surface. 一種包含丙烯酸胺基甲酸酯樹脂及光催化材料之光催化元件,其中該樹脂對該光催化材料之重量比係在約0.5至約10比約1之間。 A photocatalytic element comprising an urethane urethane resin and a photocatalytic material, wherein the weight ratio of the resin to the photocatalytic material is between about 0.5 and about 10 to about 1. 如請求項23之光催化元件,其中該丙烯酸胺基甲酸酯樹脂係選自UNIDIC 17806、EBECRYL 8701、EBECRYL 8301、EBECRYL 8405、OC-3021、OC-4021、OC-4122、HC-5619及UVHC3000。 The photocatalytic element according to claim 23, wherein the urethane acrylate resin is selected from the group consisting of UNIDIC 17806, EBECRYL 8701, EBECRYL 8301, EBECRYL 8405, OC-3021, OC-4021, OC-4122, HC-5619, and UVHC3000. .
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Publication number Priority date Publication date Assignee Title
CN111514937A (en) * 2020-05-13 2020-08-11 中国石油大学(华东) Preparation method of porphyrin-based metal organic framework material sensitized oxide catalyst

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WO2017051537A1 (en) * 2015-09-22 2017-03-30 Nitto Denko Corporation Reticulated polymer photocatalytic air filter element
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US9987621B2 (en) * 2012-01-12 2018-06-05 Nitto Denko Corporation Transparent photocatalyst coating

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
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