TW201512252A - Method of recovering nanoparticles from a silicone material - Google Patents

Method of recovering nanoparticles from a silicone material Download PDF

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TW201512252A
TW201512252A TW103117215A TW103117215A TW201512252A TW 201512252 A TW201512252 A TW 201512252A TW 103117215 A TW103117215 A TW 103117215A TW 103117215 A TW103117215 A TW 103117215A TW 201512252 A TW201512252 A TW 201512252A
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nanoparticle
nanoparticles
plasma
decane
fluid
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TW103117215A
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Chinese (zh)
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James A Casey
Charles Serrano
David Witker
Bizhong Zhu
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Dow Corning
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    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J11/00Recovery or working-up of waste materials
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01BNON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00Silicon; Compounds thereof
    • C01B33/02Silicon
    • C01B33/021Preparation
    • C01B33/027Preparation by decomposition or reduction of gaseous or vaporised silicon compounds other than silica or silica-containing material
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J11/00Recovery or working-up of waste materials
    • C08J11/04Recovery or working-up of waste materials of polymers
    • C08J11/10Recovery or working-up of waste materials of polymers by chemically breaking down the molecular chains of polymers or breaking of crosslinks, e.g. devulcanisation
    • C08J11/12Recovery or working-up of waste materials of polymers by chemically breaking down the molecular chains of polymers or breaking of crosslinks, e.g. devulcanisation by dry-heat treatment only
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09KMATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K11/00Luminescent, e.g. electroluminescent, chemiluminescent materials
    • C09K11/08Luminescent, e.g. electroluminescent, chemiluminescent materials containing inorganic luminescent materials
    • C09K11/59Luminescent, e.g. electroluminescent, chemiluminescent materials containing inorganic luminescent materials containing silicon
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J2383/00Characterised by the use of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon with or without sulfur, nitrogen, oxygen, or carbon only; Derivatives of such polymers
    • C08J2383/04Polysiloxanes
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02WCLIMATE CHANGE MITIGATION TECHNOLOGIES RELATED TO WASTEWATER TREATMENT OR WASTE MANAGEMENT
    • Y02W30/00Technologies for solid waste management
    • Y02W30/50Reuse, recycling or recovery technologies
    • Y02W30/62Plastics recycling; Rubber recycling

Abstract

A method of recovering nanoparticles from a silicone material comprises providing a nanoparticle composition comprising a silicone material and nanoparticles. The method also comprises depolymerizing the silicone material of the nanoparticle composition to form volatile silicon compounds. Finally, the method comprises substantially separating the volatile silicon compounds and the nanoparticles to recover the nanoparticles.

Description

自矽氧烷材料回收奈米顆粒的方法 Method for recovering nano particles from decane materials

本發明大體上係關於一種回收奈米顆粒之方法,且更特定言之一種自矽氧烷材料回收奈米顆粒之方法。 The present invention is generally directed to a method of recovering nanoparticles, and more particularly to a method of recovering nanoparticles from a decane material.

奈米顆粒為此項技術中已知的且可藉助於各種方法進行製備。舉例而言,奈米顆粒通常定義為具有至少一個小於100奈米之尺寸之顆粒且係自塊狀材料(其起初大於奈米顆粒)或自小於奈米顆粒之顆粒,諸如離子及/或原子產生。奈米顆粒尤其獨特,因為其可具有與其所來源之塊狀材料或較小顆粒顯著不同之特性。舉例而言,充當絕緣體或半導體之塊狀材料在呈奈米顆粒形式時可導電。 Nanoparticles are known in the art and can be prepared by a variety of methods. By way of example, a nanoparticle is generally defined as a particle having at least one size less than 100 nanometers and is derived from a bulk material (which is initially larger than nanoparticle) or from particles smaller than nanoparticle, such as ions and/or atoms. produce. Nanoparticles are particularly unique because they can have properties that are significantly different from the bulk material or smaller particles from which they are derived. For example, a bulk material that acts as an insulator or semiconductor can conduct electricity when in the form of nanoparticle.

亦可藉助於電漿製程產生奈米顆粒。舉例而言,奈米顆粒可於電漿反應器中產生自前驅氣體。在某些電漿製程中,在諸如矽氧烷流體之流體中捕獲或收集產生於電漿反應器中之奈米顆粒。通常難以自矽氧烷流體回收或分離奈米顆粒。此外,即使在某些應用中利用包括奈米顆粒之矽氧烷流體,奈米顆粒通常可具有長使用壽命,其中該等奈米顆粒展現所需物理特性,但奈米顆粒通常在其初次使用之後丟棄。此為非所需的,因為產生奈米顆粒可為費時且昂貴的。 Nanoparticles can also be produced by means of a plasma process. For example, nanoparticle can be produced from a precursor gas in a plasma reactor. In certain plasma processes, nanoparticle produced in a plasma reactor is captured or collected in a fluid such as a helium oxide fluid. It is often difficult to recover or separate the nanoparticles from the decane fluid. Furthermore, even if a helium-containing fluid comprising nanoparticle is utilized in certain applications, the nanoparticle generally has a long service life, wherein the nanoparticle exhibits the desired physical properties, but the nanoparticle is usually used for the first time. Discard afterwards. This is undesirable because the production of nanoparticle can be time consuming and expensive.

本發明提供一種自矽氧烷材料回收奈米顆粒之方法。該方法包 含提供包含矽氧烷材料及奈米顆粒之奈米顆粒組合物。該方法亦包含對奈米顆粒組合物之矽氧烷材料進行解聚合以形成揮發性矽化合物。最後,該方法包含實質上分離揮發性矽化合物及奈米顆粒以回收奈米顆粒。 The present invention provides a method of recovering nanoparticles from a decyl alkane material. Method package A nanoparticle composition comprising a naphthenic material and nanoparticle is provided. The method also includes depolymerizing the rhodium oxide material of the nanoparticle composition to form a volatile rhodium compound. Finally, the method comprises substantially separating the volatile cerium compound and the nanoparticle to recover the nanoparticle.

本發明之方法允許自矽氧烷材料回收奈米顆粒,其允許再循環或再使用矽氧烷材料及/或奈米顆粒。該方法提供顯著益處且擴展矽氧烷材料及奈米顆粒二者之使用壽命。 The process of the present invention allows the recovery of nanoparticles from a decyl alkane material which allows the recycle or reuse of a decane material and/or nanoparticle. This method provides significant benefits and extends the useful life of both the siloxane material and the nanoparticle.

10‧‧‧變頻RF放大器/VHF射頻電源 10‧‧‧Variable RF Amplifier/VHF RF Power Supply

11‧‧‧介電放電管/介電管/放電管/電漿產生腔室 11‧‧‧Dielectric discharge tube/dielectric tube/discharge tube/plasma generation chamber

12‧‧‧輝光放電/電漿 12‧‧‧Glow discharge/plasma

13‧‧‧電極組態/電極/尖端/多孔電極板 13‧‧‧Electrode configuration / electrode / tip / porous electrode plate

14‧‧‧電極/VHF射頻供電環/接地環/多孔電極板 14‧‧‧Electrode/VHF RF Power Supply Ring/Grounding Ring/Porous Electrode Plate

15‧‧‧較大抽真空反應器 15‧‧‧ Large vacuum reactor

16‧‧‧固體基板 16‧‧‧Solid substrate

20‧‧‧電漿反應器系統/系統 20‧‧‧ Plasma Reactor System / System

21‧‧‧可變頻率RF放大器/可變頻率射頻功率放大器 21‧‧‧Variable Frequency RF Amplifier/Variable Frequency RF Power Amplifier

22‧‧‧電漿產生腔室/出口/腔室 22‧‧‧ Plasma generation chamber/outlet/chamber

23‧‧‧區域 23‧‧‧Area

24‧‧‧電極組態/電極/多孔電極板 24‧‧‧Electrode configuration / electrode / porous electrode plate

25‧‧‧第二電極組態/電極/多孔電極板 25‧‧‧Second electrode configuration / electrode / porous electrode plate

26‧‧‧顆粒收集腔室/收集腔室 26‧‧‧Particle collection chamber/collection chamber

27‧‧‧捕獲流體 27‧‧‧ Capture fluid

28‧‧‧真空源 28‧‧‧vacuum source

29‧‧‧反應物氣體入口 29‧‧‧Reaction gas inlet

30‧‧‧出口 30‧‧‧Export

31‧‧‧孔口/孔 31‧‧‧孔口/孔

32‧‧‧容器 32‧‧‧ Container

33‧‧‧真空源/真空泵 33‧‧‧Vacuum source/vacuum pump

50‧‧‧電漿反應器系統/系統 50‧‧‧ Plasma Reactor System / System

101‧‧‧腔室 101‧‧‧ chamber

103‧‧‧入口 103‧‧‧ entrance

105‧‧‧出口 105‧‧‧Export

107‧‧‧儲集器 107‧‧‧Reservoir

109‧‧‧加熱器 109‧‧‧heater

111‧‧‧噴射組件 111‧‧‧jet components

113‧‧‧噴嘴/冷卻系統 113‧‧‧Nozzle/Cooling System

120‧‧‧擴散泵 120‧‧‧Diffusion pump

可在與隨附圖式結合進行考慮時於以下實施方式中描述本發明之其他優勢及態樣,在該等隨附圖式中:圖1說明用於產生奈米顆粒之低壓高頻脈衝電漿反應器之一個實施例;圖2說明用於產生奈米顆粒之低壓高頻脈衝電漿反應器之另一實施例;圖3說明包括產生奈米顆粒之低壓脈衝電漿反應器及收集奈米顆粒之擴散泵之系統之實施例;且圖4說明用於收集藉助於反應器產生之奈米顆粒之擴散泵之一個實施例的示意圖。 Other advantages and aspects of the present invention are described in the following embodiments in consideration of the accompanying drawings in which: FIG. 1 illustrates low-voltage, high-frequency pulsed electrical power for producing nanoparticles. An embodiment of a slurry reactor; Figure 2 illustrates another embodiment of a low pressure high frequency pulsed plasma reactor for producing nanoparticle; Figure 3 illustrates a low pressure pulsed plasma reactor including nanoparticle generation and collection of nai An embodiment of a system of diffusion pumps for rice particles; and Figure 4 illustrates a schematic of one embodiment of a diffusion pump for collecting nanoparticles produced by means of a reactor.

本發明提供一種自矽氧烷材料回收奈米顆粒之方法。本發明之方法允許再循環矽氧烷材料及/或奈米顆粒。此擴展矽氧烷材料及奈米顆粒二者之使用壽命,且再循環矽氧烷材料及/或奈米顆粒可比丟棄矽氧烷材料及奈米顆粒且再產生該等矽氧烷材料及奈米顆粒更廉價且較不費時。 The present invention provides a method of recovering nanoparticles from a decyl alkane material. The process of the invention allows recycling of the oxoxane material and/or nanoparticle. This extends the service life of both the siloxane material and the nano granules, and the recycled siloxane material and/or the nano granules can discard the siloxane material and the nano granules and reproduce the oxane materials and Rice granules are cheaper and less time consuming.

該方法包含提供包含矽氧烷材料及奈米顆粒之奈米顆粒組合物。在下文中分別各自更詳細地描述奈米顆粒組合物之矽氧烷材料及 奈米顆粒。 The method comprises providing a nanoparticle composition comprising a oxoxane material and a nanoparticle. The helium oxide materials of the nanoparticle composition are each described in more detail below. Nano particles.

可以任何方式提供奈米顆粒組合物。舉例而言,可購買或製備奈米顆粒組合物。當製備奈米顆粒組合物時,可購買奈米顆粒及矽氧烷材料且將其合併以形成奈米顆粒組合物,或可在形成奈米顆粒組合物之前製備奈米顆粒及/或矽氧烷材料。 The nanoparticle composition can be provided in any manner. For example, a nanoparticle composition can be purchased or prepared. When preparing the nanoparticle composition, the nanoparticles and the siloxane material may be purchased and combined to form a nanoparticle composition, or the nanoparticles and/or oxime may be prepared prior to forming the nanoparticle composition. Alkane material.

矽氧烷材料可為任何矽氧烷材料。矽氧烷材料意謂該矽氧烷材料包括至少一個矽氧烷鍵,亦即Si-O-Si鍵。舉例而言,矽氧烷材料可包含固體矽氧烷、液體矽氧烷、矽氧烷之分散液、矽氧烷與有機及/或無機化合物之混合物或其組合。更特定言之,矽氧烷材料可包含矽氧烷液體、矽氧烷流體、矽氧烷膠、矽氧烷凝膠、矽氧烷固體、矽氧烷樹脂、固化矽氧烷聚合物、未固化矽氧烷膠、矽氧烷乳液、矽氧烷密封劑、聚矽氧橡膠、矽氧烷油、矽氧烷潤滑脂、矽氧烷管形材料、液體聚矽氧橡膠、矽氧烷彈性體、矽氧烷帶、矽氧烷管形材料、填充矽氧烷聚合物、纖維強化矽氧烷聚合物、矽氧烷片、矽氧烷墊、矽氧烷清漆、矽氧烷手套或其組合。矽氧烷材料可經交聯或未交聯且可經固化或未固化。 The siloxane material can be any siloxane material. The siloxane material means that the siloxane material comprises at least one siloxane chain, that is, a Si-O-Si bond. For example, the oxoxane material can comprise a solid decane, a liquid siloxane, a decane dispersion, a mixture of a decane and an organic and/or inorganic compound, or a combination thereof. More specifically, the oxoxane material may comprise a decane liquid, a decane fluid, a decane gel, a decane gel, a decane solid, a decane resin, a cured siloxane polymer, Curing oxyalkylene rubber, decane emulsion, decane sealant, polyoxyxene rubber, decane oil, decyl oxyhydroxide, decane tube material, liquid polyoxyethylene rubber, decane elasticity Body, decane band, decane tube material, filled siloxane polymer, fiber reinforced siloxane polymer, oxirane sheet, oxime mat, siloxane varnish, decane glove or combination. The decane materials can be crosslinked or uncrosslinked and can be cured or uncured.

矽氧烷材料可包含矽氧烷單元之任何組合,亦即矽氧烷材料包含R3SiO1/2單元(亦即M單元)、R2SiO2/2單元(亦即D單元)、RSiO3/2單元(亦即T單元)及SiO4/2單元(亦即Q單元)之任何組合,其中R通常為經取代或未經取代之烴基(如下文所定義)。舉例而言,當矽氧烷材料包含橡膠、彈性體或凝膠時,矽氧烷材料包含至少一種包括重複D單元之聚合物(亦即直鏈或部分分支鏈聚合物)或由其形成。或者,當矽氧烷材料為樹脂時,矽氧烷材料通常包括具有T及/或Q單元之矽氧烷樹脂。 The siloxane material may comprise any combination of siloxane units, that is, the siloxane material comprises R 3 SiO 1/2 units (ie, M units), R 2 SiO 2/2 units (ie, D units), RSiO. Any combination of 3/2 units (i.e., T units) and SiO 4/2 units (i.e., Q units), wherein R is typically a substituted or unsubstituted hydrocarbon group (as defined below). For example, when the oxoxane material comprises a rubber, elastomer or gel, the oxoxane material comprises or is formed from at least one polymer comprising repeating D units (ie, a linear or partially branched chain polymer). Alternatively, when the decane material is a resin, the siloxane material generally comprises a decane resin having T and/or Q units.

在矽氧烷材料為樹脂之實施例中,矽氧烷材料可包含DT樹脂、MT樹脂、MDT樹脂、DTQ樹脂、MTQ樹脂、MDTQ樹脂、DQ樹脂、 MQ樹脂、DTQ樹脂、MTQ樹脂或MDQ樹脂。不同樹脂之組合可存在於矽氧烷材料中。此外,矽氧烷材料可包含與聚合物組合之樹脂。 In the embodiment where the siloxane material is a resin, the siloxane material may include DT resin, MT resin, MDT resin, DTQ resin, MTQ resin, MDTQ resin, DQ resin, MQ resin, DTQ resin, MTQ resin or MDQ resin. Combinations of different resins may be present in the oxoxane material. Further, the siloxane material may comprise a resin in combination with a polymer.

當矽氧烷材料經固化或交聯時,矽材料可由多種反應機制形成。舉例而言,矽氧烷材料可由矽氫化-可固化矽氧烷組合物、輻射-可固化矽氧烷組合物、過氧化物-可固化矽氧烷組合物或縮合-可固化矽氧烷組合物形成。 When the siloxane material is cured or crosslinked, the ruthenium material can be formed by a variety of reaction mechanisms. For example, the oxoxane material can be composed of a ruthenium hydrogenation-curable decane composition, a radiation-curable siloxane composition, a peroxide-curable siloxane composition, or a condensation-curable oxirane combination. Object formation.

在各種實施例中,矽氧烷材料包含矽氧烷流體或聚合物。矽氧烷流體或聚合物可為直鏈、分支鏈、部分分支鏈或環狀的。此外,矽氧烷聚合物可經交聯以形成矽氧烷材料。 In various embodiments, the oxoxane material comprises a oxoxane fluid or polymer. The oxane fluid or polymer can be linear, branched, partially branched or cyclic. Additionally, the siloxane polymer can be crosslinked to form a decane material.

矽氧烷材料之特定實例包括聚二甲基矽氧烷(PDMS)、苯基甲基矽氧烷、甲基氫矽氧烷、二苯基矽氧烷、乙烯基甲基矽氧烷、氟烷基矽氧烷、甲基矽倍半氧烷、苯基倍半氧矽烷及其共聚物或組合。 Specific examples of the phthalic oxide material include polydimethyl methoxy oxane (PDMS), phenylmethyl fluorene oxide, methyl hydroquinone, diphenyl siloxane, vinyl methyl oxane, fluorine. Alkyl oxiranes, methyl sesquioxanes, phenyl sesquioxanes, and copolymers or combinations thereof.

在矽氧烷材料包含矽氧烷聚合物或流體之實施例中,矽氧烷聚合物包含重複R2SiO2/2單元,其中R為獨立選擇之經取代或未經取代烴基。舉例而言,R可為脂族、芳族、環狀、脂環族等。此外,R可包括烯系不飽和性。「經取代(substituted)」意謂烴之一或多個氫原子可藉由除氫以外之原子(例如鹵素原子,諸如氯、氟、溴等)置換,或R鏈內之碳原子可藉由除碳以外之原子置換,亦即R可於鏈內包括一或多個雜原子,諸如氧、硫、氮等。R通常具有1至10個碳原子,或者1至6個碳原子。含有至少3個碳原子之經取代或未經取代之烴基可具有分支或未分支結構。烴基之實例由R表示,其包括(但不限於)烷基,諸如甲基、乙基、丙基、1-甲基乙基、丁基、1-甲基丙基、2-甲基丙基、1,1-二甲基乙基、戊基、1-甲基丁基、1-乙基丙基、2-甲基丁基、3-甲基丁基、1,2-二甲基丙基、2,2-二甲基丙基、己基、庚基、辛基、壬基及癸基;烯基,諸如乙烯基;環烷基,諸如環戊基、環己基及甲基環己基;芳基,諸如苯基及萘基;烷芳基,諸如甲苯基及二 甲苯基;及芳烷基,諸如苄基及苯乙基。經鹵素取代之烴基之實例由R表示,其包括(但不限於)3,3,3-三氟丙基、3-氯丙基、氯苯基、二氯苯基、2,2,2-三氟乙基、2,2,3,3-四氟丙基及2,2,3,3,4,4,5,5-八氟戊基。 In embodiments where the oxoxane material comprises a siloxane polymer or fluid, the siloxane polymer comprises repeating R 2 SiO 2/2 units, wherein R is an independently selected substituted or unsubstituted hydrocarbon group. For example, R can be aliphatic, aromatic, cyclic, alicyclic, and the like. Further, R may include ethylenic unsaturation. "Substituted" means that one or more hydrogen atoms of a hydrocarbon may be replaced by an atom other than hydrogen (eg, a halogen atom such as chlorine, fluorine, bromine, etc.), or a carbon atom in the R chain may be used Atom substitutions other than carbon, i.e., R may include one or more heteroatoms within the chain, such as oxygen, sulfur, nitrogen, and the like. R usually has 1 to 10 carbon atoms, or 1 to 6 carbon atoms. The substituted or unsubstituted hydrocarbon group having at least 3 carbon atoms may have a branched or unbranched structure. Examples of hydrocarbyl groups are represented by R and include, but are not limited to, alkyl groups such as methyl, ethyl, propyl, 1-methylethyl, butyl, 1-methylpropyl, 2-methylpropyl 1,1-dimethylethyl, pentyl, 1-methylbutyl, 1-ethylpropyl, 2-methylbutyl, 3-methylbutyl, 1,2-dimethylpropane , 2,2-dimethylpropyl, hexyl, heptyl, octyl, decyl and decyl; alkenyl, such as ethenyl; cycloalkyl, such as cyclopentyl, cyclohexyl and methylcyclohexyl; Aryl groups such as phenyl and naphthyl; alkaryl groups such as tolyl and xylyl; and aralkyl groups such as benzyl and phenethyl. Examples of halogen-substituted hydrocarbyl groups are represented by R and include, but are not limited to, 3,3,3-trifluoropropyl, 3-chloropropyl, chlorophenyl, dichlorophenyl, 2,2,2- Trifluoroethyl, 2,2,3,3-tetrafluoropropyl and 2,2,3,3,4,4,5,5-octafluoropentyl.

除由R表示之基團以外,矽氧烷聚合物可於任何末端或側接位置包括其他取代基或官能基。舉例而言,矽氧烷聚合物可包括矽鍵結羥基、氫原子、胺基、矽氮烷基、(甲基)丙烯酸酯基、環氧基等。該等基團或原子可存在於重複D單元(下文所述)或末端M單元(其通常具有式R3SiO1/3,除非R中之一或多者藉由此等其他取代基或官能基中之一者置換)中。最通常地,該等基團(若存在)在矽氧烷聚合物中為末端。 In addition to the groups represented by R, the siloxane polymer can include other substituents or functional groups at any terminal or pendant position. For example, the siloxane polymer may include a hydrazone-bonded hydroxyl group, a hydrogen atom, an amine group, a decylalkyl group, a (meth) acrylate group, an epoxy group, and the like. The groups or atoms may be present in a repeating D unit (described below) or a terminal M unit (which typically has the formula R 3 SiO 1/3 unless one or more of R is by other substituents or functionalities such as One of the bases is replaced by). Most commonly, such groups, if present, are terminal in the decane polymer.

由於矽氧烷聚合物包含重複R2SiO2/2單元,矽氧烷聚合物具有直鏈部分。然而,矽氧烷聚合物可視情況為分支鏈、部分分支鏈的及/或可包括具有三維網路化結構之樹脂部分。在該等實施例中,矽氧烷聚合物進一步包含RSiO3/2單元及/或SiO4/2單元。矽氧烷聚合物自身或矽氧烷聚合物之樹脂部分(若存在)之分支可歸因於T及/或Q單元之存在。 Since the siloxane polymer comprises repeating R 2 SiO 2/2 units, the siloxane polymer has a linear portion. However, the siloxane polymer may optionally be branched, partially branched, and/or may comprise a resin portion having a three-dimensional networked structure. In such embodiments, the siloxane polymer further comprises RSiO 3/2 units and/or SiO 4/2 units. The branching of the siloxane polymer itself or the resin portion of the siloxane polymer, if any, can be attributed to the presence of T and/or Q units.

矽氧烷聚合物可由矽氧烷聚合物主鏈內之矽氧烷鍵(Si-O-Si)組成。或者,矽氧烷聚合物可包括藉由一或多個二價基團例如CH2鍵聯基團分離之矽氧烷鍵,其中CH2可重複至多(例如)10次。該等二價基團之存在與否通常可歸因於形成矽氧烷聚合物之反應機制,由縮合形成由矽氧烷鍵組成之矽氧烷聚合物且由矽氫化形成包括一或多個二價基團之矽氧烷聚合物。 The siloxane polymer can be composed of a decane bond (Si-O-Si) in the main chain of the siloxane polymer. Alternatively, the decane polymer may comprise a decane linkage separated by one or more divalent groups such as a CH 2 linkage group, wherein CH 2 may be repeated up to, for example, 10 times. The presence or absence of such divalent groups is generally attributable to the reaction mechanism for the formation of the decane polymer, the formation of a decane polymer composed of a decane linkage by condensation and formation by hydrogenation of hydrazine including one or more A dioxane polymer of a divalent group.

矽氧烷聚合物可視情況具有官能基,諸如矽鍵結烯基、矽鍵結羥基、矽鍵結烷氧基等。在包括該等官能基之各種實施例中,官能基可為端基、側基或二者。通常,官能基為端基。舉例而言,矽氧烷聚合物可經二甲基乙烯基封端、二乙烯基甲基封端、二甲基羥基封端、二羥基甲基封端等。在某些實施例中,矽氧烷聚合物包括選自可水解 基團、烯基或其組合之端基。一般而言,當矽氧烷聚合物包括該端基時,由組合物形成之層之物理特性得以改良。 The siloxane polymer may optionally have a functional group such as a fluorenyl bond, a hydrazone bond, a hydrazone, and the like. In various embodiments including such functional groups, the functional groups can be end groups, pendant groups, or both. Typically, the functional group is a terminal group. For example, the siloxane polymer can be terminated with dimethylvinyl, divinylmethyl terminated, dimethyl hydroxy terminated, dihydroxymethyl terminated, and the like. In certain embodiments, the decane polymer comprises a hydrolyzable selected from the group consisting of hydrolyzable The end group of a group, an alkenyl group or a combination thereof. In general, when the siloxane polymer includes the end group, the physical properties of the layer formed from the composition are improved.

在矽氧烷材料包含矽氧烷聚合物之各種實施例中,矽氧烷聚合物具有以下通式(A):(X)3-a(R)a-Si-(CH2)b-(O)c-((SiR2-O)d-SiR2)e-(CH2)f-[((SiR2-O)g-SiR2)h-(CH2)i]j-((SiR2-O)k-SiR2)l-(O)m-(CH2)n-Si-(X)3-p(R)p;其中X為獨立選擇之可水解基團;R定義於上文中;a及p各自為獨立地選自0至3之整數;b、f、i及n各自為獨立地選自0至10之整數;c及m各獨立地為0或1;d、g,及k各自為獨立地選自0或1至200之整數,其限制條件為d、g,及k不同時為0;e、h及l各自為獨立地選自0及1之整數,其限制條件為e、h及l不同時為0;且j為選自0至5之整數;限制條件為當下標d為0時,下標e亦為0;當下標d大於0時,下標e為1;當下標g為0時,下標h、i及j亦為0;當下標g大於1時,下標h為1且下標j至少為1;當下標k為0時,下標l亦為0;及當下標k大於0時,下標l為1。 In various embodiments in which the oxoxane material comprises a siloxane polymer, the siloxane polymer has the following general formula (A): (X) 3-a (R) a -Si-(CH 2 ) b - ( O) c -((SiR 2 -O) d -SiR 2 ) e -(CH 2 ) f -[((SiR 2 -O) g -SiR 2 ) h -(CH 2 ) i ] j -((SiR 2 -O) k -SiR 2 ) l -(O) m -(CH 2 ) n -Si-(X) 3-p (R) p ; wherein X is an independently selected hydrolyzable group; R is defined above Wherein a and p are each independently selected from an integer from 0 to 3; b, f, i and n are each independently selected from an integer from 0 to 10; c and m are each independently 0 or 1; d, g And k are each independently selected from 0 or an integer from 1 to 200, the constraints being d, g, and k are not 0 at all; e, h and l are each an integer independently selected from 0 and 1, The constraint condition is that e, h, and l are not 0 at the same time; and j is an integer selected from 0 to 5; the constraint is that when the subscript d is 0, the subscript e is also 0; when the subscript d is greater than 0, the subscript e is 1; when the subscript g is 0, the subscripts h, i and j are also 0; when the subscript g is greater than 1, the subscript h is 1 and the subscript j is at least 1; when the subscript k is 0, the lower The index l is also 0; and when the subscript k is greater than 0, the subscript l is 1.

由通式(A)中之X表示之可水解基團可選自已知可水解基團,例如矽烷醇基、矽鍵結氫基、矽鍵結烷氧基、矽鍵結鹵素原子、矽氮烷基等。 The hydrolyzable group represented by X in the general formula (A) may be selected from known hydrolyzable groups, such as a decyl alcohol group, a hydrazine-bonded hydrogen group, a hydrazone-bonded alkoxy group, a hydrazine-bonded halogen atom, a hydrazine nitrogen. Alkyl and the like.

在以上通式(A)中,下標d、g及k代表矽氧烷聚合物之重複R2SiO2/2單元。 In the above formula (A), the subscripts d, g and k represent repeating R 2 SiO 2/2 units of the siloxane polymer.

在各種實施例中,下標c及m為0且下標b、d、e、f、g、h、i、j、k、l及n各自為1或1以上之整數。當下標j為1時,所得矽氧烷聚合物包括各自藉由二價鍵聯基團分離之重複矽氧烷鍵的三個片段,該等二價鍵聯基團分別由下標b、f、i及n表示。在此等實施例中,矽氧烷聚合物通常由矽氫化形成且可由以下通式表示:(X)3-a(R)a-Si-(CH2)b-((SiR2-O)d-SiR2)e-(CH2)f-[((SiR2-O)g-SiR2)h- (CH2)i]j-((SiR2-O)k-SiR2)l-(CH2)n-Si-(X)3-p(R)pIn various embodiments, the subscripts c and m are 0 and the subscripts b, d, e, f, g, h, i, j, k, l, and n are each an integer of 1 or more. When the subscript j is 1, the obtained decane polymer includes three fragments each of which is separated by a divalent linking group, and the divalent linking groups are respectively subscripts b and f. , i and n are indicated. In such embodiments, the siloxane polymer is typically formed by hydrogenation of hydrazine and can be represented by the formula: (X) 3-a (R) a -Si-(CH 2 ) b -((SiR 2 -O) d -SiR 2 ) e -(CH 2 ) f -[((SiR 2 -O) g -SiR 2 ) h - (CH 2 ) i ] j -((SiR 2 -O) k -SiR 2 ) l - (CH 2 ) n -Si-(X) 3-p (R) p .

通常,當下標d、g及k為1或1以上時,下標j為1(且如上文所定義,由於下標d大於0,下標e為1,且由於下標g大於0,下標h為1。在此等實施例中,矽氧烷聚合物具有以下通式:(X)3-a(R)a-Si-(CH2)b-(SiR2-O)d-SiR2-(CH2)f-(SiR2-O)g-SiR2-(CH2)i-(SiR2-O)k-SiR2-(CH2)n-Si-(X)3-p(R)pGenerally, when the subscripts d, g, and k are 1 or more, the subscript j is 1 (and as defined above, since the subscript d is greater than 0, the subscript e is 1, and since the subscript g is greater than 0, The standard h is 1. In these embodiments, the siloxane polymer has the general formula: (X) 3-a (R) a -Si-(CH 2 ) b -(SiR 2 -O) d -SiR 2 -(CH 2 ) f -(SiR 2 -O) g -SiR 2 -(CH 2 ) i -(SiR 2 -O) k -SiR 2 -(CH 2 ) n -Si-(X) 3-p (R) p .

最通常地,下標d及k各自為1且下標g為大於1之整數以使得由下標g表示之嵌段提供矽氧烷聚合物中之重複R2SiO2/2單元。在此等實施例中,矽氧烷聚合物具有以下通式:(X)3-a(R)a-Si-(CH2)b-SiR2-O-SiR2-(CH2)f-(SiR2-O)g-SiR2-(CH2)i-SiR2-O-SiR2-(CH2)n-Si-(X)3-p(R)pMost commonly, the subscripts d and k are each 1 and the subscript g is an integer greater than 1 such that the block represented by the subscript g provides a repeating R 2 SiO 2/2 unit in the siloxane polymer. In these embodiments, the siloxane polymer has the general formula: (X) 3-a (R) a -Si-(CH 2 ) b -SiR 2 -O-SiR 2 -(CH 2 ) f - (SiR 2 -O) g -SiR 2 -(CH 2 ) i -SiR 2 -O-SiR 2 -(CH 2 ) n -Si-(X) 3-p (R) p .

在其他實施例中,下標c及m為1且下標b、f、i及n各自為0。在此等實施例中,矽氧烷聚合物通常由縮合形成且可由以下通式表示:(X)3-a(R)a-Si-O-((SiR2-O)d-SiR2)e-[((SiR2-O)g-SiR2)h]j-((SiR2-O)k-SiR2)l-O-Si-(X)3-p(R)pIn other embodiments, the subscripts c and m are 1 and the subscripts b, f, i, and n are each zero. In such embodiments, the siloxane polymer is typically formed by condensation and can be represented by the formula: (X) 3-a (R) a -Si-O-((SiR 2 -O) d -SiR 2 ) e -[((SiR 2 -O) g -SiR 2 ) h ] j -((SiR 2 -O) k -SiR 2 ) l -O-Si-(X) 3-p (R) p .

由於R經獨立選擇且可在不同R2SiO2/2單元中變化,可重寫以上通式以不包括由下標e、h、j及l表示之嵌段中之任一者,只要並非所有此等下標同時為0。舉例而言,當在由下標d、下標h、下標j及/或下標l表示之嵌段內僅包括R2SiO2/2單元時,可重寫以上通式,因為此等式中之每一者將彼此重複,除了在矽氧烷聚合物包括大於200個重複R2SiO2/2單元之實施例中的分子量之潛在差異。作為一個實例,在下文中重寫上文介紹之通式,其中下標d、e、k及l為0,下標g為大於1之整數,且下標h及j為1:(X)3-a(R)a-Si-O-(SiR2-O)g-SiR2-O-Si-(X)3-p(R)pSince R is independently selected and can vary among different R 2 SiO 2/2 units, the above formula can be rewritten to exclude any of the blocks represented by subscripts e, h, j, and l as long as it is not All of these subscripts are also 0. For example, when only the R 2 SiO 2/2 unit is included in the block represented by the subscript d, the subscript h, the subscript j, and/or the subscript l, the above formula can be rewritten because such Each of the formulas will be repeated with respect to each other except for the potential difference in molecular weight in the examples where the oxane polymer comprises more than 200 repeating R 2 SiO 2/2 units. As an example, the above-described general formula is rewritten below, in which the subscripts d, e, k, and l are 0, the subscript g is an integer greater than 1, and the subscripts h and j are 1: (X) 3 -a (R) a -Si-O-(SiR 2 -O) g -SiR 2 -O-Si-(X) 3-p (R) p .

此外,由於R經獨立選擇,緊鄰之上文所介紹之通式可進一步如下縮合: (X)3-a(R)a-Si-O-(SiR2-O)g-Si-(X)3-p(R)pFurthermore, since R is independently selected, the formula described immediately above can be further condensed as follows: (X) 3-a (R) a -Si-O-(SiR 2 -O) g -Si-(X) 3-p (R) p .

下標a及p可各獨立地為0至3以使得此等實施例之矽氧烷聚合物不必具有任何矽鍵結可水解基團。僅為達成說明之目的而在下文中闡述緊鄰之上文之通式內之矽氧烷聚合物的特定物質: The subscripts a and p can each independently be from 0 to 3 such that the oxirane polymers of these embodiments do not have to have any hydrazine-bonded hydrolyzable groups. Specific substances of the azoxyalkyl polymer in the formula immediately above are set forth below for the purpose of illustration only:

在此等實例中之每一者中,下標g代表重複R2SiO2/2單元,且g係基於矽氧烷聚合物之所需分子量及黏度來選擇。 In each of these examples, the subscript g represents a repeating R 2 SiO 2/2 unit, and g is selected based on the desired molecular weight and viscosity of the siloxane polymer.

可在矽氧烷材料中利用矽氧烷聚合物之單一物質或可彼此共同利用矽氧烷聚合物之不同物質之各種組合。舉例而言,可彼此組合地利用兩種不同類型之矽氧烷聚合物,或可與矽氧烷樹脂,例如MQ樹脂組合來利用矽氧烷聚合物。 A single substance of a siloxane polymer or a combination of different substances of a siloxane polymer which can be used together with each other can be used in the siloxane material. For example, two different types of decane polymers can be utilized in combination with each other, or a decane polymer can be utilized in combination with a decyl olefin resin, such as an MQ resin.

在一個特定實施例中,奈米顆粒組合物可為同在申請中之申請案序號___________(H&H 071038.01249;DC11716)之奈米顆粒組合物,該申請案特此申請且以全文引用的方式併入本文中。 In a particular embodiment, the nanoparticle composition can be a nanoparticle composition of the same application number ___________ (H&H 071038.01249; DC11716), which is incorporated herein by reference in its entirety In this article.

如上文所介紹,奈米顆粒組合物進一步包含奈米顆粒。取決於利用奈米顆粒組合物之應用或最終用途,奈米顆粒可由任何方法形成且可包含任何類型之材料。在某些實施例中,奈米顆粒組合物之矽氧烷材料為液體以使得奈米顆粒組合物為矽氧烷材料中之奈米顆粒之懸浮液。一般而言,奈米顆粒具有至少一個小於100或者小於75或者小於50奈米之尺寸(如在下文中更詳細地描述)。或者,奈米顆粒具有小 於100或者小於75或者小於50奈米之平均最大尺寸。 As described above, the nanoparticle composition further comprises nanoparticle. Depending on the application or end use of the nanoparticle composition, the nanoparticles can be formed by any method and can comprise any type of material. In certain embodiments, the siloxane material of the nanoparticle composition is a liquid such that the nanoparticle composition is a suspension of nanoparticles in the oxoxane material. In general, the nanoparticles have at least one dimension that is less than 100 or less than 75 or less than 50 nanometers (as described in more detail below). Or, the nanoparticle has a small The average maximum size at 100 or less than 75 or less than 50 nanometers.

在某些實施例中,奈米顆粒組合物之奈米顆粒係藉助於電漿製程產生。如在此項技術中易於理解,產生奈米顆粒之製程通常影響奈米顆粒之物理特性。在下文中描述適合於產生奈米顆粒組合物之奈米顆粒之特定電漿製程及對應電漿反應器或系統。 In certain embodiments, the nanoparticle of the nanoparticle composition is produced by means of a plasma process. As is readily understood in the art, the process of producing nanoparticle typically affects the physical properties of the nanoparticle. Specific plasma processes and corresponding plasma reactors or systems suitable for producing nanoparticles of nanoparticle compositions are described below.

在各種實施例中,奈米顆粒組合物之奈米顆粒係藉助於基於RF電漿之製程產生。在此等實施例中,收縮RF電漿可用於產生奈米顆粒。更特定言之,此等製程利用以收縮模式操作之RF電漿以自前驅氣體產生奈米顆粒。 In various embodiments, the nanoparticles of the nanoparticle composition are produced by means of an RF plasma based process. In such embodiments, shrinking RF plasma can be used to produce nanoparticle. More specifically, such processes utilize RF plasma operated in a shrink mode to produce nanoparticle from the precursor gas.

在此等實施例中,可藉由將前驅氣體及視情況存在之緩衝氣體引入至電漿腔室中且於腔室中產生RF電容電漿來進行產生奈米顆粒之製程。可在促進形成電漿不穩定性(亦即在空間及時間上強烈不均勻之電漿)(其造成在腔室中形成收縮電漿)之壓力及射頻功率條件下產生RF電漿。收縮電漿(constricted plasma,有時亦被稱作contracted plasma)使得形成高電漿密度燈絲,有時亦被稱作電漿通道。電漿通道藉由相比於周圍電漿之劇烈提昇之電漿密度、電離速率及氣體溫度表徵。其可為固定或非固定的。可觀測到放電管中之燈絲之週期性旋轉,例如燈絲可無規變化其旋轉方向、軌跡及旋轉頻率。燈絲可呈現為縱向不均勻或條紋狀的。在其他情況下,燈絲可為縱向均勻的。 In such embodiments, the process of producing nanoparticle can be performed by introducing a precursor gas and optionally a buffer gas into the plasma chamber and generating an RF capacitor plasma in the chamber. RF plasma can be produced under conditions of pressure and RF power that promote the formation of plasma instability (i.e., plasma that is strongly heterogeneous in space and time) that causes the formation of a shrinking plasma in the chamber. Constricted plasma (also sometimes referred to as contracted plasma) results in the formation of high plasma density filaments, sometimes referred to as plasma channels. The plasma channel is characterized by a sharply elevated plasma density, ionization rate, and gas temperature compared to the surrounding plasma. It can be fixed or non-fixed. The periodic rotation of the filament in the discharge tube can be observed, for example, the filament can change its rotation direction, trajectory and rotation frequency randomly. The filaments may appear to be longitudinally uneven or striped. In other cases, the filaments may be longitudinally uniform.

可與前驅氣體一起合意地包括惰性緩衝或載體氣體,諸如氖氣、氬氣、氪氣或氙氣。在基於收縮電漿之方法中摻雜該等氣體為尤其所需的,因為此等氣體促進形成熱不穩定性以達成熱收縮。在RF電漿中,解離之前驅氣體物質(亦即由前驅體分子之解離產生之解離產物)成核及生長為奈米顆粒。 Desirably, an inert buffer or carrier gas such as helium, argon, helium or neon may be included with the precursor gas. Doping these gases in a method based on shrinking plasma is especially desirable because such gases promote the formation of thermal instability to achieve thermal shrinkage. In the RF plasma, the dissociated gas species (i.e., the dissociated product resulting from the dissociation of the precursor molecules) are nucleated and grown into nanoparticles.

咸信形成收縮RF電漿促進結晶奈米顆粒形成,因為收縮電漿使得形成高電流密度電流通道(亦即燈絲),其中局部電離度、電漿密度 及氣體溫度比傾向於產生非晶奈米顆粒之一般擴散電漿之彼等高得多。舉例而言,在一些情況下,可於收縮電漿中達成至少約1000K之氣體溫度與至多約1013cm-3之電漿密度。加性效應可使得進一步加熱奈米顆粒至甚至高於氣體溫度之溫度。此等包括電漿電子及離子於奈米顆粒表面之再結合、顆粒表面之氫再結合及與奈米顆粒表面生長相關的冷凝熱釋放。在一些情況下,奈米顆粒可加熱至氣體溫度以上幾百克氏度之溫度。電漿可為連續而非脈衝電漿。 The formation of shrinking RF plasma promotes the formation of crystalline nanoparticles because shrinking plasma results in the formation of high current density current channels (ie, filaments) in which local ionization, plasma density, and gas temperature ratio tend to produce amorphous nanoparticles. They are generally much higher in diffusion plasma. For example, in some cases, a gas temperature of at least about 1000 K and a plasma density of up to about 10 13 cm -3 can be achieved in the shrink plasma. The additive effect can cause the nanoparticle to be further heated to a temperature even above the gas temperature. These include recombination of plasma electrons and ions on the surface of the nanoparticles, hydrogen recombination on the surface of the particles, and condensation heat release associated with surface growth of the nanoparticles. In some cases, the nanoparticles can be heated to a temperature of a few hundred degrees Celsius above the gas temperature. The plasma can be continuous rather than pulsed plasma.

因此,本發明製程之一些實施例使用RF電漿收縮以使用相對較低電漿頻率提供高氣體溫度。 Accordingly, some embodiments of the process of the present invention use RF plasma shrinkage to provide a high gas temperature using a relatively low plasma frequency.

可藉由在產生RF電漿時使用足夠高射頻功率及氣體壓力達成促進形成收縮電漿之條件。可採用使得形成能夠促進自解離之前驅氣體物質形成奈米顆粒之收縮RF電漿之任何射頻功率及氣體壓力。可取決於電漿反應器幾何形狀略微改變適當射頻功率及氣體壓力位準。然而,在本文提供之製程之一個例示性實施例中,用於啟動RF電漿之射頻功率為至少約100瓦特且在電漿存在下於電漿腔室中之總壓力(亦即總電漿壓力)為至少約1托。此包括射頻功率為至少約110瓦特之實施例且進一步包括射頻功率為至少約120瓦特之實施例。此亦包括在電漿存在下於電漿腔室中之總壓力為至少約5托之實施例且進一步包括在電漿存在下於電漿腔室中之總壓力為至少約10托(例如約10至15托)之實施例。 Conditions that promote the formation of shrinkage plasma can be achieved by using sufficiently high RF power and gas pressure in the production of RF plasma. Any RF power and gas pressure that results in the formation of a contracted RF plasma capable of promoting the formation of nanoparticles from the dissociated gas species prior to dissociation can be employed. The appropriate RF power and gas pressure levels may be slightly altered depending on the plasma reactor geometry. However, in an exemplary embodiment of the process provided herein, the RF power used to activate the RF plasma is at least about 100 watts and the total pressure in the plasma chamber in the presence of plasma (ie, total plasma) The pressure) is at least about 1 Torr. This includes embodiments in which the RF power is at least about 110 watts and further includes embodiments in which the RF power is at least about 120 watts. This also includes an embodiment wherein the total pressure in the plasma chamber in the presence of the plasma is at least about 5 Torr and further comprising a total pressure in the plasma chamber in the presence of the plasma of at least about 10 Torr (eg, about 10 to 15 Torr).

促進形成非收縮RF電漿之條件可與上文關於產生收縮電漿所述之彼等條件類似。然而,奈米顆粒通常在較低壓力、較高前驅氣體流動速率及較低緩衝氣體流動速率下於非收縮電漿中形成。舉例而言,在一些實施例中,在小於約5托且合意地,小於約3托之總壓力下於RF電漿中產生奈米顆粒。此包括在電漿存在下於電漿反應器中之總壓力為約1至3托之實施例。在此等實施例中之前驅氣體之典型流動速 率可為至少5sccm,包括前驅氣體之流動速率為至少約10sccm之實施例。在此等實施例中之緩衝氣體之典型流動速率可為約1至50sccm。 The conditions that promote the formation of non-shrinking RF plasma can be similar to those described above with respect to the generation of shrinkage plasma. However, nanoparticle is typically formed in non-shrink plasma at lower pressures, higher precursor gas flow rates, and lower buffer gas flow rates. For example, in some embodiments, the nanoparticles are produced in the RF plasma at a total pressure of less than about 5 Torr and desirably less than about 3 Torr. This includes embodiments in which the total pressure in the plasma reactor is about 1 to 3 Torr in the presence of plasma. Typical flow rate of the precursor gas in these embodiments The rate can be at least 5 sccm, including embodiments in which the flow rate of the precursor gas is at least about 10 sccm. Typical flow rates for buffer gases in such embodiments can range from about 1 to 50 sccm.

用於啟動射頻電漿之RF電壓之頻率可在RF範圍內變化。在某些實施例中,採用13.56MHz之頻率,其為用於RF電漿加工行業中之主要頻率。然而,頻率可合意地低於微波頻率範圍,亦即低於約1GHz。此包括頻率將合意地低於極高頻(VHF)範圍(例如低於約30MHz)之實施例。舉例而言,本發明方法可使用25MHz或25MHz以下之射頻產生射頻電漿。 The frequency of the RF voltage used to activate the RF plasma can vary within the RF range. In some embodiments, a frequency of 13.56 MHz is employed, which is the primary frequency used in the RF plasma processing industry. However, the frequency can desirably be below the microwave frequency range, i.e., below about 1 GHz. This includes embodiments in which the frequency will desirably be below the very high frequency (VHF) range (e.g., below about 30 MHz). For example, the method of the present invention can generate radio frequency plasma using a radio frequency of 25 MHz or less.

與此特定實施例(其中藉助於此電漿製程產生奈米顆粒)相關之其他態樣係描述於美國專利第7,446,335號及美國專利第8,016,944號中,該等專利各自分別以全文引用之方式併入本文中。 Other aspects associated with this particular embodiment, wherein the nanoparticle is produced by means of the plasma process, are described in U.S. Patent No. 7,446,335 and U.S. Patent No. 8,016,944 each incorporated by reference in its entirety. Into this article.

在其他實施例中,在低壓電漿反應器,諸如低壓高頻脈衝電漿反應器中製備矽氧烷組合物之奈米顆粒。 In other embodiments, the nanoparticle of the decane composition is prepared in a low pressure plasma reactor, such as a low pressure high frequency pulsed plasma reactor.

在此等實施例中,脈衝電漿使得操作者能夠直接設定顆粒成核之滯留時間且進而控制電漿中之粒度分佈及聚結動力學。舉例而言,可調節脈衝反應器之操作參數以形成結晶奈米顆粒或非晶奈米顆粒。含有半導體之前驅體進入介電放電管中,在該管中操作電容耦合電漿或電感耦合電漿。當前驅體分子於電漿中解離時,奈米顆粒開始成核。當在脈衝循環期間電漿斷開或在低離子能態下時,可將帶電奈米顆粒轉移至反應器腔室,該等奈米顆粒可在該腔室中沈積於基板上或經受進一步處理。 In such embodiments, the pulsed plasma allows the operator to directly set the residence time of the particle nucleation and thereby control the particle size distribution and coalescence kinetics in the plasma. For example, the operating parameters of the pulse reactor can be adjusted to form crystalline nanoparticle or amorphous nanoparticle. The precursor containing the semiconductor enters the dielectric discharge tube in which the capacitively coupled plasma or inductively coupled plasma is operated. When the current body molecules dissociate in the plasma, the nanoparticles begin to nucleate. When the plasma is broken or in a low ion state during the pulse cycle, the charged nanoparticle can be transferred to a reactor chamber where the nanoparticle can be deposited on the substrate or subjected to further processing .

可藉助於藉由任意函數發生器觸發之可變頻率射頻功率放大器供應電力以建立高頻脈衝電漿。在一個實施例中,使用環形電極、平行板或陽極/陰極裝置將射頻電源電容地耦合至氣體中之電漿中。或者,可於放電管周圍使用RF線圈裝置將射頻電源以電感耦合模式耦 合至電漿中。可藉助於質量流量控制器或校準之旋轉流量計控制前驅氣體。可經由可變接地或偏壓孔控制自放電管至反應器腔室之壓差。取決於孔尺寸及壓力,反應器腔室中之奈米顆粒分佈可變化,因此提供可用於調節所得奈米顆粒之特性之另一製程參數。 Power can be supplied by means of a variable frequency RF power amplifier triggered by an arbitrary function generator to establish high frequency pulsed plasma. In one embodiment, a radio frequency power source is capacitively coupled to the plasma in the gas using a ring electrode, a parallel plate, or an anode/cathode device. Alternatively, an RF coil device can be used around the discharge tube to couple the RF power source in an inductive coupling mode. Into the plasma. The precursor gas can be controlled by means of a mass flow controller or a calibrated rotary flow meter. The pressure differential from the discharge vessel to the reactor chamber can be controlled via a variable ground or biasing orifice. Depending on the pore size and pressure, the distribution of nanoparticles in the reactor chamber can vary, thus providing another process parameter that can be used to adjust the characteristics of the resulting nanoparticle.

在一個實施例中,可在放電管中於100毫托至10托之壓力下以10MHz至500MHz之頻率及5瓦特至100瓦特之功率操作電漿反應器。 In one embodiment, the plasma reactor can be operated at a frequency of 10 MHz to 500 MHz and a power of 5 watts to 100 watts in a discharge vessel at a pressure of 100 mTorr to 10 Torr.

現參看圖1,顯示低壓高頻脈衝電漿反應器之一個例示性實施例。在所說明之實施例中,前驅氣體可引入經抽真空之介電放電管11中。放電管11包括附接至變頻RF放大器10之電極組態13。電極14之另一部分接地、DC偏壓或相對於電極13以推拉方式操作。電極13、14用於將極高頻(VHF)電源耦合至前驅氣體中以啟動且維持輝光放電或電漿12。前驅氣體可隨後於電漿中解離且成核以形成奈米顆粒。 Referring now to Figure 1, an illustrative embodiment of a low pressure high frequency pulsed plasma reactor is shown. In the illustrated embodiment, the precursor gas can be introduced into the evacuated dielectric discharge tube 11. The discharge tube 11 includes an electrode configuration 13 attached to the variable frequency RF amplifier 10. Another portion of the electrode 14 is grounded, DC biased, or operated in a push-pull manner relative to the electrode 13. The electrodes 13, 14 are used to couple a very high frequency (VHF) power source to the precursor gas to initiate and maintain the glow discharge or plasma 12. The precursor gas can then be dissociated and nucleated in the plasma to form nanoparticle.

在一個實施例中,電極13、14用於介電管11(其為流通式噴頭設計)內部之電漿源,其中在多孔電極板13上游偏壓之VHF射頻與下游多孔電極板14分離,該等板之孔隙彼此對準。孔隙可為圓形、矩形或任何其他所需形狀。或者,介電管11可封閉耦合至VHF射頻電源10且具有尖端之電極13,該尖端在介電管11內部於尖端與接地環14之間具有可變距離。在此狀況下,在約10至500MHz之頻率範圍內操作VHF射頻電源10。在另一替代實施例中,尖端13可以尖端與以推拉模式(180°異相)操作之VHF射頻供電環14之間的可變距離安置。在又另一替代實施例中,電極13、14包括電感線圈,其耦合至VHF射頻電源以使得射頻電源藉由由電感線圈形成之電場傳遞至前驅氣體。部分介電管11可經抽空至1×10-7至500托之間的真空度。 In one embodiment, the electrodes 13, 14 are used in a plasma source within the dielectric tube 11 (which is a flow-through nozzle design) in which the VHF radio frequency biased upstream of the porous electrode plate 13 is separated from the downstream porous electrode plate 14, The apertures of the plates are aligned with one another. The apertures can be circular, rectangular or any other desired shape. Alternatively, the dielectric tube 11 can enclose an electrode 13 having a tip end coupled to the VHF RF power source 10, the tip having a variable distance between the tip end and the ground ring 14 inside the dielectric tube 11. In this case, the VHF RF power source 10 is operated in the frequency range of about 10 to 500 MHz. In another alternative embodiment, the tip 13 can be placed at a variable distance between the tip and the VHF RF power supply ring 14 operating in a push-pull mode (180° out of phase). In yet another alternative embodiment, the electrodes 13, 14 include an inductive coil coupled to the VHF radio frequency power source such that the radio frequency power source is transferred to the precursor gas by an electric field formed by the inductive coil. Part of the dielectric tube 11 can be evacuated to a vacuum of between 1 x 10 -7 and 500 Torr.

成核奈米顆粒可傳遞至較大抽真空反應器15中,可在該反應器中進行收集於固體基板16(包括夾盤)上或收集至適當液體基質/溶液中。舉例而言,奈米顆粒可收集於矽氧烷材料中以形成奈米顆粒組合 物。或者,奈米顆粒可收集於捕獲流體中且隨後引入至可固化矽氧烷組合物中以形成矽氧烷組合物。固體基板16可電接地、偏壓、溫度控制、旋轉、相對於產生奈米顆粒之電極安置或安置於卷軸式系統上。若沈積至基板上不為所選,則將顆粒疏散至適合之泵中以轉換為常壓。奈米顆粒可隨後發送至大氣分級系統,諸如差示遷移率分析器,且經收集以用於進一步功能化或其他加工。 The nucleated nanoparticle can be passed to a larger vacuum reactor 15 where it can be collected on a solid substrate 16 (including a chuck) or collected into a suitable liquid matrix/solution. For example, nanoparticle can be collected in a siloxane material to form a nanoparticle combination. Things. Alternatively, the nanoparticles can be collected in a capture fluid and subsequently introduced into the curable siloxane composition to form a decane composition. The solid substrate 16 can be electrically grounded, biased, temperature controlled, rotated, placed relative to the electrodes that produce the nanoparticles, or placed on a reel system. If deposition onto the substrate is not selected, the particles are evacuated to a suitable pump for conversion to atmospheric pressure. The nanoparticle can then be sent to an atmospheric grading system, such as a differential mobility analyzer, and collected for further functionalization or other processing.

在所說明之實施例中,藉助於諸如AR Worldwide型號KAA2040或Electronics and Innovation 3200L之射頻功率放大器以高頻電漿來引發電漿。放大器可藉由0.15至150MHz之任意函數發生器(例如Tektronix AFG3252函數發生器)(其能夠產生至多200瓦特電力)驅動(或脈衝)。在各種實施例中,任意函數可能夠藉由脈衝串、振幅調變、頻率調變或不同波形來驅動功率放大器。放大器與前驅氣體之間的電源耦合通常隨著射頻功率之頻率增加而增加。因此,在較高頻率下驅動電源之能力可允許供電與放電之間的更有效耦合。 In the illustrated embodiment, the plasma is induced with high frequency plasma by means of a radio frequency power amplifier such as the AR Worldwide model KAA2040 or Electronics and Innovation 3200L. The amplifier can be driven (or pulsed) by any function generator from 0.15 to 150 MHz, such as the Tektronix AFG3252 function generator, which is capable of generating up to 200 watts of power. In various embodiments, any function may be capable of driving the power amplifier by pulse train, amplitude modulation, frequency modulation, or a different waveform. The power coupling between the amplifier and the precursor gas generally increases as the frequency of the RF power increases. Therefore, the ability to drive a power supply at higher frequencies may allow for more efficient coupling between power and discharge.

必要時,可藉由使奈米顆粒以VHF射頻低壓電漿放電自至少一種前驅氣體成核且藉由控制氣溶膠形式之奈米顆粒之平均自由路徑(因此允許在收集之前的顆粒-顆粒相互作用)收集成核奈米顆粒來產生具有不同聚結長度之奈米顆粒。可在真空環境內於固體基板上收集成核奈米顆粒,真空環境中之收集距離大於藉助於壓力控制之顆粒之平均自由路徑。進而可控制奈米顆粒之聚結長度。或者,可在真空環境內於液體基質中收集成核奈米顆粒,真空環境中之收集距離大於藉助於壓力控制之顆粒之平均自由路徑,因此控制奈米顆粒之聚結長度。基板距成核區域(電漿放電)愈遠,恆定壓力下之聚結愈長。合成之奈米顆粒可以氣溶膠形式自低壓環境抽至大氣環境中以藉由氣溶膠之濃度至少部分控制聚結長度。 If necessary, the nanoparticle can be nucleated from at least one precursor gas by VHF RF low-pressure plasma discharge and by controlling the average free path of the nanoparticle in aerosol form (thus allowing particle-particle prior to collection) Interaction) Collecting nucleated nanoparticles to produce nanoparticles with different coalescence lengths. The nucleated nanoparticles can be collected on a solid substrate in a vacuum environment, the collection distance in a vacuum environment being greater than the mean free path of the particles controlled by pressure. In turn, the coalescence length of the nanoparticles can be controlled. Alternatively, the nucleated nanoparticles can be collected in a liquid matrix in a vacuum environment, the collection distance in a vacuum environment being greater than the mean free path of the particles controlled by pressure, thus controlling the coalescence length of the nanoparticles. The further the substrate is from the nucleation region (plasma discharge), the longer the coalescence at constant pressure. The synthetic nanoparticle can be pumped from the low pressure environment to the atmosphere in an aerosol form to at least partially control the coalescence length by the concentration of the aerosol.

在某些實施例中,可使用VHF射頻低壓電漿藉由合成結晶或非晶 核心奈米顆粒產生奈米顆粒,該電漿藉由脈衝放電以控制電漿滯留時間而在低壓環境中放電。舉例而言,可經由VHF射頻低壓電漿放電以相對於前驅氣體分子滯留時間增加之電漿滯留時間合成非晶核心奈米顆粒。或者,可在放電驅動頻率、驅動振幅、放電管壓力、腔室壓力、電漿功率密度、通過電漿之氣體分子滯留時間及距電漿源電極之收集距離之相同操作條件下以較低電漿滯留時間合成結晶核心奈米顆粒。 In some embodiments, VHF RF low pressure plasma can be used to synthesize crystalline or amorphous The core nanoparticles produce nanoparticles that are discharged in a low pressure environment by pulsed discharge to control plasma residence time. For example, amorphous core nanoparticle can be synthesized via VHF radio frequency low voltage plasma discharge with a plasma residence time that is increased relative to the residence time of the precursor gas molecules. Alternatively, it can be operated at the same operating conditions as the discharge drive frequency, the drive amplitude, the discharge tube pressure, the chamber pressure, the plasma power density, the gas molecule residence time through the plasma, and the collection distance from the plasma source electrode. The crystal core nanoparticle is synthesized by the slurry residence time.

與此特定實施例(其中藉助於此電漿製程產生奈米顆粒)相關之其他態樣係描述於中國際(PCT)公開案第WO 2010/027959(PCT/US2009/055587)號中,其以全文引用的方式併入本文中。 Other aspects associated with this particular embodiment in which nanoparticle is produced by means of this plasma process are described in the International Patent Publication No. WO 2010/027959 (PCT/US2009/055587), which is incorporated herein by reference. The manner of full reference is incorporated herein.

參看圖2,電漿反應器系統之替代實施例顯示於20。在此實施例中,電漿反應器系統20包含具有反應物氣體入口29及出口30(其中具有孔口或孔31)之電漿產生腔室22。顆粒收集腔室26與電漿產生腔室22連通。顆粒收集腔室26於容器32中含有捕獲流體27。容器32可經調適以進行攪動(藉由未圖示之工具)。舉例而言,容器32可安置於可旋轉支撐物(未圖示)上或可包括攪拌機構。較佳地,捕獲流體在系統之操作溫度下為液體。電漿反應器系統5亦包括與顆粒收集腔室26及電漿產生腔室22連通之真空源28。 Referring to Figure 2, an alternate embodiment of a plasma reactor system is shown at 20. In this embodiment, the plasma reactor system 20 includes a plasma generation chamber 22 having a reactant gas inlet 29 and an outlet 30 having orifices or holes 31 therein. The particle collection chamber 26 is in communication with the plasma generation chamber 22. The particle collection chamber 26 contains a capture fluid 27 in the container 32. The container 32 can be adapted for agitation (by means of a tool not shown). For example, the container 32 can be disposed on a rotatable support (not shown) or can include a stirring mechanism. Preferably, the capture fluid is a liquid at the operating temperature of the system. The plasma reactor system 5 also includes a vacuum source 28 in communication with the particle collection chamber 26 and the plasma generation chamber 22.

電漿產生腔室22包含附接至可變頻率RF放大器21之電極組態24。電漿產生腔室22亦包含第二電極組態25。第二電極組態25經接地、DC偏壓或相對於電極組態24以推拉方式操作。電極24、25用於將極高頻(VHF)電源耦合至反應物氣體混合物以於鑑定為23之區域內啟動及維持電漿之輝光放電。隨後在電漿中解離第一反應前驅氣體以提供帶電原子,該等原子經成核以形成奈米顆粒。然而,涵蓋其他放電管配置,且可用於進行本文中所揭示之方法。 The plasma generation chamber 22 includes an electrode configuration 24 that is attached to a variable frequency RF amplifier 21. The plasma generation chamber 22 also includes a second electrode configuration 25. The second electrode configuration 25 is operated in a push-pull manner via ground, DC bias or relative to the electrode configuration 24. Electrodes 24, 25 are used to couple a very high frequency (VHF) power source to the reactant gas mixture to initiate and maintain a glow glow of the plasma in a region identified as 23. The first reaction precursor gas is then dissociated in the plasma to provide charged atoms that are nucleated to form nanoparticle. However, other discharge tube configurations are contemplated and can be used to carry out the methods disclosed herein.

在圖2之實施例中,在顆粒收集腔室26中於捕獲流體中收集奈米 顆粒。為控制形成之奈米顆粒之直徑,電漿產生腔室22之出口22中之孔口31與捕獲流體之表面之間的距離在約5至約50孔口直徑之間的範圍內。已發現使捕獲流體之表面定位於太接近電漿產生腔室之出口可產生電漿與捕獲流體之非所需相互作用。相反地,捕獲流體之表面定位於距孔口太遠降低顆粒收集效率。由於收集距離為出口之孔口直徑及電漿產生腔室與收集腔室之間的壓降之函數,基於本文所述之操作條件,可接受收集距離為約1至約20、或者約5至約10cm。換言之,可接受收集距離為約5至約50孔口直徑。 In the embodiment of Figure 2, nanoparticles are collected in the capture fluid in the particle collection chamber 26. Particles. To control the diameter of the formed nanoparticle, the distance between the orifice 31 in the outlet 22 of the plasma generating chamber 22 and the surface of the trapping fluid is in the range of between about 5 and about 50 orifice diameters. It has been discovered that positioning the surface of the capture fluid too close to the outlet of the plasma generation chamber can create undesirable interactions of the plasma with the capture fluid. Conversely, the surface of the capture fluid is positioned too far from the orifice to reduce particle collection efficiency. Since the collection distance is a function of the diameter of the orifice of the outlet and the pressure drop between the plasma generating chamber and the collection chamber, an acceptable collection distance of from about 1 to about 20, or about 5 to about the operating conditions described herein. About 10cm. In other words, the acceptable collection distance is from about 5 to about 50 orifice diameters.

電漿產生腔室22亦包含電源供應器。藉助於可變頻率射頻功率放大器21供應電源,該功率放大器藉由任意函數發生器觸發以於區域23中建立高頻脈衝電漿。較佳地,使用氣體中之環形電極、平行板或陽極/陰極裝置將射頻電源電容地耦合至電漿中。或者,可於放電管周圍使用RF線圈裝置將射頻電源以電感耦合模式耦合至電漿中。 The plasma generation chamber 22 also includes a power supply. The power supply is supplied by means of a variable frequency RF power amplifier 21 which is triggered by an arbitrary function generator to establish a high frequency pulsed plasma in region 23. Preferably, the RF power source is capacitively coupled into the plasma using a ring electrode, a parallel plate or an anode/cathode device in the gas. Alternatively, the RF power source can be coupled to the plasma in an inductive coupling mode using an RF coil device around the discharge tube.

電漿產生腔室11亦可包含介電放電管。較佳地,反應物氣體混合物進入產生電漿之介電放電管。當第一反應前驅氣體分子於電漿中解離時,自反應物氣體混合物形成之奈米顆粒開始成核。 The plasma generating chamber 11 may also include a dielectric discharge tube. Preferably, the reactant gas mixture enters a dielectric discharge tube that produces a plasma. When the first reaction precursor gas molecules dissociate in the plasma, the nanoparticles formed from the reactant gas mixture begin to nucleate.

真空源28可包含真空泵。或者,真空源28可包含機械、渦輪分子或低溫泵。 Vacuum source 28 can include a vacuum pump. Alternatively, vacuum source 28 may comprise mechanical, turbo molecules or cryopumps.

在一個實施例中,用於電漿產生腔室22內部之電漿源之電極24、25包含流通式噴頭設計,其中在多孔電極板24上游偏壓之VHF射頻與下游多孔電極板25分離,該等板之孔隙彼此對準。孔隙可為環形、矩形或任何其他所需形狀。或者,電漿產生腔室22可封閉耦合至VHF射頻電源且具有尖端之電極24,該尖端在腔室22內部於尖端與接地環之間具有可變距離。 In one embodiment, the electrodes 24, 25 for the plasma source within the plasma generating chamber 22 comprise a flow-through nozzle design in which the VHF radio frequency biased upstream of the porous electrode plate 24 is separated from the downstream porous electrode plate 25, The apertures of the plates are aligned with one another. The pores can be annular, rectangular or any other desired shape. Alternatively, the plasma generation chamber 22 can enclose an electrode 24 having a tip end coupled to the VHF RF power source, the tip having a variable distance between the tip end and the ground ring within the chamber 22.

在一個實施例中,可以實質上類似於關於圖1之實施例在上文中所述之方式操作VHF射頻電源。可藉助於諸如AR Worldwide型號 KAA2040或Electronics and Innovation型號3200L或EM Power RF Systems,Inc.型號BBS2E3KUT之射頻功率放大器以高頻電漿引發區域23中之電漿。可藉由如上文關於圖1之實施例所述之任意函數發生器驅動(或脈衝)放大器。 In one embodiment, the VHF RF power source can be operated substantially in a manner similar to that described above with respect to the embodiment of FIG. Can be used with models such as AR Worldwide The RF power amplifier of KAA 2040 or Electronics and Innovation Model 3200L or EM Power RF Systems, Inc. Model BBS2E3KUT initiates the plasma in zone 23 with high frequency plasma. The amplifier can be driven (or pulsed) by any of the function generators as described above with respect to the embodiment of FIG.

在一個實施例中,預選電漿系統之電源及頻率以產生就形成奈米顆粒而言之最佳操作空間。較佳地,調諧電源及頻率二者於放電中產生適當離子及電子能量分佈以幫助解離反應前驅氣體之分子及使奈米顆粒成核。 In one embodiment, the power and frequency of the plasma system are preselected to produce the optimal operating space for the formation of nanoparticles. Preferably, both the tuned power source and the frequency produce a suitable ion and electron energy distribution in the discharge to help dissociate the molecules of the reaction precursor gas and nucleate the nanoparticles.

圖2中所說明之電漿反應器系統20可經脈衝以使得操作者能夠直接管理顆粒成核之駐留時間,且進而控制電漿中之粒度分佈及聚結動力學。系統20之脈衝函數允許電漿中之顆粒駐留時間之受控調諧,其影響奈米顆粒之尺寸。藉由減少電漿之「接通」時間,成核顆粒具有較少聚結時間,且因此可減小奈米顆粒之平均尺寸(亦即奈米顆粒分佈可移至較小直徑粒度)。 The plasma reactor system 20 illustrated in Figure 2 can be pulsed to enable an operator to directly manage the residence time of particle nucleation and thereby control the particle size distribution and coalescence kinetics in the plasma. The pulse function of system 20 allows for controlled tuning of the residence time of the particles in the plasma, which affects the size of the nanoparticles. By reducing the "on" time of the plasma, the nucleating particles have less coalescence time and thus reduce the average size of the nanoparticles (i.e., the nanoparticle distribution can be shifted to a smaller diameter particle size).

有利地,在較高頻率範圍內操作電漿反應器系統20及脈衝電漿提供與使用電漿不穩定性以產生高離子能量/密度之習知收縮/燈絲放電技術相同之條件,但具有使用者可控制操作條件以選擇及產生具有各種尺寸之奈米顆粒(其影響奈米顆粒之特徵物理特性,例如光致發光)之額外優勢。 Advantageously, operating the plasma reactor system 20 and pulsed plasma in a higher frequency range provides the same conditions as conventional shrinkage/filament discharge techniques using plasma instability to produce high ion energy/density, but with use Operating conditions can be controlled to select and produce additional advantages of nanoparticles of various sizes that affect the characteristic physical properties of the nanoparticle, such as photoluminescence.

對於脈衝注射,可藉由脈衝能量源,諸如脈衝極高頻RF電漿、高頻RF電漿或用於熱解之脈衝雷射進行奈米顆粒之合成。較佳地,在約1至約50kHz範圍內之頻率下脈衝VHF射頻。 For pulse injection, the synthesis of nanoparticles can be carried out by a pulsed energy source such as pulsed very high frequency RF plasma, high frequency RF plasma or pulsed laser for pyrolysis. Preferably, the VHF radio frequency is pulsed at a frequency in the range of about 1 to about 50 kHz.

另一種將奈米顆粒轉移至捕獲流體之方法為在啟動電漿時脈衝反應物氣體混合物之輸入。舉例而言,吾人可在存在至少一種維持放電之其他氣體,諸如惰性氣體之情況下啟動存在第一反應前驅氣體之電漿以合成奈米顆粒。當藉由質量流量控制器使第一反應前驅氣體之 流動停止時停止奈米顆粒合成。當第一反應前驅氣體再次開始流動時繼續奈米顆粒之合成。此產生奈米顆粒之脈衝流。若撞擊捕獲流體之奈米顆粒之通量大於吸收至捕獲流體中之奈米顆粒之吸收率,則此技術可用於增加捕獲流體中之奈米顆粒之濃度。 Another method of transferring nanoparticle to a capture fluid is the input of a pulsed reactant gas mixture upon activation of the plasma. For example, one may activate a plasma in which a first reaction precursor gas is present in the presence of at least one other gas that sustains the discharge, such as an inert gas, to synthesize the nanoparticles. When the first reaction precursor gas is made by the mass flow controller Stop the synthesis of nanoparticles when the flow stops. The synthesis of the nanoparticles is continued when the first reaction precursor gas begins to flow again. This produces a pulsed stream of nanoparticles. If the flux of the nanoparticle impacting the capture fluid is greater than the absorption of the nanoparticle absorbed into the capture fluid, this technique can be used to increase the concentration of the nanoparticle in the capture fluid.

在另一實施例中,藉助於產生壓差之孔口或孔31將成核奈米顆粒自電漿產生腔室22轉移至含有捕獲流體之顆粒收集腔室26。預期可經由多種方法控制電漿產生腔室22與顆粒收集腔室26之間的壓差。在一種組態中,電漿產生腔室22之放電管內徑比顆粒收集腔室26之內徑小得多,因此產生壓降。在另一種組態中,接地物理孔口或孔可置放於放電管與收集腔室26之間,該腔室迫使電漿基於電漿之德拜長度(Debye length)及腔室22之尺寸而部分滯留於孔內。另一組態包含使用不同靜電孔,在該靜電孔中產生正同心電荷,其迫使帶負電電漿通過孔口31。 In another embodiment, the nucleated nanoparticles are transferred from the plasma generation chamber 22 to the particle collection chamber 26 containing the capture fluid by means of orifices or holes 31 that create a pressure differential. It is contemplated that the pressure differential between the plasma generation chamber 22 and the particle collection chamber 26 can be controlled via a variety of methods. In one configuration, the inner diameter of the discharge tube of the plasma generation chamber 22 is much smaller than the inner diameter of the particle collection chamber 26, thus creating a pressure drop. In another configuration, a grounded physical aperture or aperture can be placed between the discharge tube and the collection chamber 26, which forces the plasma based on the Debye length of the plasma and the size of the chamber 22. Part of it stays in the hole. Another configuration involves the use of different electrostatic holes in which a positive concentric charge is generated which forces the negatively charged plasma through the orifice 31.

預期捕獲流體可用作材料處理及儲存媒體。在一個實施例中,選擇捕獲流體以允許在收集奈米顆粒時,奈米顆粒吸收及分散於流體中,因此於捕獲流體中形成奈米顆粒之分散液或懸浮液。若奈米顆粒與流體可混溶,則其將吸收於流體中。舉例而言,捕獲流體可包含矽氧烷材料以使得奈米顆粒可收集於矽氧烷材料中以形成奈米顆粒組合物。或者,奈米顆粒可收集於捕獲流體中且隨後引入至矽氧烷材料中以形成奈米顆粒組合物。 The capture fluid is expected to be useful as a material handling and storage medium. In one embodiment, the capture fluid is selected to allow the nanoparticles to absorb and disperse in the fluid as it is collected, thereby forming a dispersion or suspension of nanoparticles in the capture fluid. If the nanoparticle is miscible with the fluid, it will be absorbed into the fluid. For example, the capture fluid can comprise a siloxane material such that the nanoparticles can be collected in a siloxane material to form a nanoparticle composition. Alternatively, the nanoparticles can be collected in a capture fluid and subsequently introduced into a siloxane material to form a nanoparticle composition.

捕獲流體經選擇以具有就奈米顆粒捕獲及儲存而言所需之特性。在一特定實施例中,捕獲流體之蒸氣壓低於電漿反應器中之操作壓力。較佳地,反應器及收集腔室26中之操作壓力在約1至約5毫托範圍內。亦涵蓋其他操作壓力。捕獲流體可包含矽氧烷流體,諸如聚二甲基矽氧烷、苯基甲基-二甲基環矽氧烷、四甲基四苯基三矽氧烷及/或五苯基三甲基三矽氧烷。此等矽氧烷流體可構成奈米顆粒組合物之 矽氧烷材料,在此情況下,可在於矽氧烷流體中收集或捕獲奈米顆粒時製備奈米顆粒組合物。然而,通常,捕獲流體包含矽氧烷流體以使得一旦奈米顆粒捕獲或收集於捕獲流體中便形成奈米顆粒組合物。在此等實施例中,奈米顆粒組合物通常為矽氧烷材料(其為液體)中之奈米顆粒之懸浮液。 The capture fluid is selected to have the properties required for the capture and storage of the nanoparticles. In a particular embodiment, the vapor pressure of the capture fluid is lower than the operating pressure in the plasma reactor. Preferably, the operating pressure in the reactor and collection chamber 26 is in the range of from about 1 to about 5 milliTorr. Other operating pressures are also covered. The capture fluid may comprise a helium alkane fluid such as polydimethylsiloxane, phenylmethyl-dimethylcyclooxane, tetramethyltetraphenyltrioxane, and/or pentaphenyltrimethyl Trioxane. These helioxane fluids may constitute a nanoparticle composition A oxoxane material, in which case the nanoparticle composition can be prepared in the collection or capture of nanoparticles in a oxane fluid. Typically, however, the capture fluid comprises a oxane fluid to form a nanoparticle composition once the nanoparticles are captured or collected in the capture fluid. In such embodiments, the nanoparticulate composition is typically a suspension of nanoparticle in a oxoxane material which is a liquid.

可在直接捕獲奈米顆粒期間攪動捕獲流體,例如藉由攪拌、旋轉、反轉及提供攪動之其他適合之方法。若需要奈米顆粒吸收至捕獲液體中之較高吸收速率,則考慮更強烈的攪動形式,例如超音波處理。 The capture fluid can be agitated during direct capture of the nanoparticles, such as by agitation, rotation, inversion, and other suitable methods of providing agitation. If a higher absorption rate of nanoparticles absorbed into the capture liquid is desired, then a more aggressive form of agitation, such as ultrasonic treatment, is considered.

如首先在上文中所介紹,在圖2之實施例中,當在電漿產生腔室22中解離第一反應前驅氣體時,形成奈米顆粒且夾帶於氣相中。奈米顆粒合成位置與捕獲流體之表面之間的距離必須足夠短以使得在夾帶奈米顆粒時不發生非所需功能化。若奈米顆粒在氣相內相互作用,則將形成許多個別小奈米顆粒之聚結物且捕獲於捕獲流體中。若在氣相內發生過多相互作用,則奈米顆粒可結塊在一起且形成具有較大平均直徑之奈米顆粒。收集距離定義為自電漿產生腔室之出口至捕獲流體之表面之距離。 As first described above, in the embodiment of FIG. 2, when the first reaction precursor gas is dissociated in the plasma generation chamber 22, nanoparticle is formed and entrained in the gas phase. The distance between the nanoparticle synthesis site and the surface of the capture fluid must be short enough that no undesirable functionalization occurs when the nanoparticle is entrained. If the nanoparticles interact in the gas phase, agglomerates of many individual small nanoparticles will be formed and captured in the capture fluid. If too much interaction occurs in the gas phase, the nanoparticles can agglomerate together and form nanoparticles having a larger average diameter. The collection distance is defined as the distance from the exit of the plasma generation chamber to the surface of the capture fluid.

與此特定實施例(其中藉助於此電漿製程產生奈米顆粒)相關之其他態樣係描述於中國際(PCT)公開案第WO 2011/109299(PCT/US2011/026491)號中,其以全文引用的方式併入本文中。 Other aspects related to this particular embodiment in which nanoparticle is produced by means of this plasma process are described in the International Patent Publication No. WO 2011/109299 (PCT/US2011/026491), which is incorporated herein by reference. The manner of full reference is incorporated herein.

參看圖3,電漿反應器系統之替代實施例顯示於50。在此實施例中,在具有用於產生奈米顆粒氣溶膠(例如氣體中之奈米顆粒)之反應器及與反應器處於流體連通以收集氣溶膠之奈米顆粒之擴散泵的系統中製備矽氧烷組合物之奈米顆粒。舉例而言,可藉由將反應器(例如低壓電漿反應器)中產生之奈米顆粒氣溶膠引入至與反應器處於流體連通之擴散泵中、在來自擴散泵油、液體或流體(例如矽氧烷流體)之 冷凝物中捕獲氣溶膠之奈米顆粒及在儲集器中收集捕獲之奈米顆粒來製備各種尺寸分佈及特性之奈米顆粒。 Referring to Figure 3, an alternate embodiment of a plasma reactor system is shown at 50. In this embodiment, it is prepared in a system having a reactor for generating a nanoparticle aerosol (e.g., nanoparticle in a gas) and a diffusion pump in fluid communication with the reactor to collect aerosol nanoparticles. Nanoparticles of a decane composition. For example, a nanoparticle aerosol produced in a reactor (eg, a low pressure plasma reactor) can be introduced into a diffusion pump in fluid communication with the reactor, from a diffusion pump oil, liquid or fluid ( Such as a helium oxide fluid) Nanoparticles of various size distributions and characteristics are prepared by trapping aerosol nanoparticles in the condensate and collecting the captured nanoparticles in a reservoir.

例示性反應器係描述於WO 2010/027959及WO 2011/109229中,該等專利中之每一者為上文所述且以全文引用的方式併入本文中。該等反應器可為(但不限於)低壓高頻脈衝電漿反應器。舉例而言,圖3說明圖2之實施例之電漿反應器,但包括與反應器處於流體連通之擴散泵。為此目的,就圖3之實施例而言,不在本文中重複關於此特定電漿反應器之描述。 Exemplary reactors are described in WO 2010/027959 and WO 2011/109229, each of which is incorporated herein by reference in its entirety. The reactors can be, but are not limited to, low pressure high frequency pulsed plasma reactors. By way of example, Figure 3 illustrates a plasma reactor of the embodiment of Figure 2, but including a diffusion pump in fluid communication with the reactor. For this purpose, with respect to the embodiment of Figure 3, the description of this particular plasma reactor is not repeated herein.

在圖3之實施例中,電漿反應器系統50包括擴散泵120。因此,可藉由擴散泵120收集奈米顆粒。顆粒收集腔室26可與電漿產生腔室22處於流體連通。擴散泵120可與顆粒收集腔室26及電漿產生腔室22處於流體連通。在本發明之其他形式中,系統50可不包括顆粒收集腔室26。舉例而言,出口30可耦合至擴散泵120之入口103,或擴散泵120可與電漿產生腔室22實質上直接處於流體連通。 In the embodiment of FIG. 3, the plasma reactor system 50 includes a diffusion pump 120. Therefore, the nanoparticles can be collected by the diffusion pump 120. The particle collection chamber 26 can be in fluid communication with the plasma generation chamber 22. The diffusion pump 120 can be in fluid communication with the particle collection chamber 26 and the plasma generation chamber 22. In other forms of the invention, system 50 may not include particle collection chamber 26. For example, the outlet 30 can be coupled to the inlet 103 of the diffusion pump 120, or the diffusion pump 120 can be in substantially direct fluid communication with the plasma generation chamber 22.

圖4為適合於圖3之實施例之系統50之例示性擴散泵120之截面示意圖。擴散泵120可包括具有入口103及出口105之腔室101。入口103可具有約2至約55吋之直徑,且出口可具有約0.5至約8吋之直徑。腔室101之入口103與反應器20之出口30處於流體連通。擴散泵120可具有例如約65至約65,000公升/秒或約65,000公升/秒以上之泵送速度。 4 is a schematic cross-sectional view of an exemplary diffusion pump 120 suitable for system 50 of the embodiment of FIG. The diffusion pump 120 can include a chamber 101 having an inlet 103 and an outlet 105. The inlet 103 can have a diameter of from about 2 to about 55 inches, and the outlet can have a diameter of from about 0.5 to about 8 inches. The inlet 103 of the chamber 101 is in fluid communication with the outlet 30 of the reactor 20. The diffusion pump 120 can have a pumping speed of, for example, from about 65 to about 65,000 liters per second or greater than about 65,000 liters per second.

擴散泵120包括與腔室101處於流體連通之儲集器107。儲集器107負載或含有擴散泵流體。儲集器可具有約30cc至約15公升之體積。擴散泵中之擴散泵流體之體積可為約30cc至約15公升。 The diffusion pump 120 includes a reservoir 107 in fluid communication with the chamber 101. The reservoir 107 is loaded or contains a diffusion pump fluid. The reservoir can have a volume of from about 30 cc to about 15 liters. The volume of the diffusion pump fluid in the diffusion pump can range from about 30 cc to about 15 liters.

擴散泵120可進一步包括加熱器109以用於將儲集器107中之擴散泵流體汽化為蒸氣。加熱器109加熱擴散泵流體且汽化擴散泵流體以形成蒸氣(例如液相至氣相轉換)。舉例而言,擴散泵流體可加熱至約100至約400℃或約180至約250℃。 The diffusion pump 120 can further include a heater 109 for vaporizing the diffusion pump fluid in the reservoir 107 into a vapor. The heater 109 heats the diffusion pump fluid and vaporizes the diffusion pump fluid to form a vapor (eg, liquid to gas phase conversion). For example, the diffusion pump fluid can be heated to from about 100 to about 400 °C or from about 180 to about 250 °C.

噴射組件111可與儲集器107處於流體連通,其包含噴嘴113以將汽化之擴散泵流體排放至腔室101中。汽化之擴散泵流體經由噴射組件111流動及上升且自噴嘴113發射出。在圖4中藉由箭頭說明汽化之擴散泵流體之流動。汽化之擴散泵流體冷凝且流回至儲集器107。舉例而言,噴嘴113可相對於腔室101之壁排放汽化之擴散泵流體。可藉由冷卻系統113(諸如水冷卻系統)冷卻腔室101之壁。腔室101之經冷卻之壁可使得汽化之擴散泵流體冷凝。經冷凝之擴散泵流體可隨後沿腔室101之壁流動且流下該等壁且流回至儲集器107。可經由擴散泵120持續循環擴散泵流體。擴散泵流體之流動使得進入入口103之氣體自腔室101之入口103擴散至出口105。真空源33可與腔室101之出口105處於流體連通以幫助自出口105移除氣體。 The jetting assembly 111 can be in fluid communication with the reservoir 107 that includes a nozzle 113 to discharge vaporized diffusion pump fluid into the chamber 101. The vaporized diffusion pump fluid flows and rises through the jetting assembly 111 and is emitted from the nozzle 113. The flow of the vaporized diffusion pump fluid is illustrated by arrows in Figure 4. The vaporized diffusion pump fluid condenses and flows back to the reservoir 107. For example, the nozzle 113 can discharge vaporized diffusion pump fluid relative to the wall of the chamber 101. The wall of the chamber 101 can be cooled by a cooling system 113, such as a water cooling system. The cooled wall of chamber 101 allows the vaporized diffusion pump fluid to condense. The condensed diffusion pump fluid can then flow along the walls of the chamber 101 and flow down the walls and back to the reservoir 107. The diffusion pump fluid can be continuously circulated via the diffusion pump 120. The flow of the diffusion pump fluid causes gas entering the inlet 103 to diffuse from the inlet 103 of the chamber 101 to the outlet 105. Vacuum source 33 may be in fluid communication with outlet 105 of chamber 101 to assist in the removal of gas from outlet 105.

當氣體流經腔室101時,可藉由擴散泵流體吸收氣體中之奈米顆粒,進而自氣體收集奈米顆粒。舉例而言,可藉由經汽化及/或冷凝之擴散泵流體潤濕奈米顆粒之表面。此外,循環之擴散泵流體之攪拌可相比於靜態流體而另外改良奈米顆粒之吸收率。腔室101內之壓力可小於約1毫托。 When the gas flows through the chamber 101, the nanoparticle in the gas can be absorbed by the diffusion pump fluid, thereby collecting the nanoparticle from the gas. For example, the surface of the nanoparticle can be wetted by a vaporized and/or condensed diffusion pump fluid. In addition, the agitation of the circulating diffusion pump fluid can additionally improve the absorption rate of the nanoparticles compared to the static fluid. The pressure within chamber 101 can be less than about 1 mTorr.

可隨後自擴散泵120移除具有奈米顆粒之擴散泵流體。舉例而言,可藉由實質上不具有奈米顆粒之擴散泵流體持續移除及置換具有奈米顆粒之擴散泵流體。 The diffusion pump fluid with nanoparticle can then be removed from the diffusion pump 120. For example, the diffusion pump fluid with nanoparticle can be continuously removed and replaced by a diffusion pump fluid that is substantially free of nanoparticle.

有利地,擴散泵120不僅可用於收集奈米顆粒且亦可用於抽空反應器20(及收集腔室26)。舉例而言,反應器20中之操作壓力可為低壓力,例如小於常壓、小於760托或在約1與約760托之間。收集腔室26可例如在約1至約5毫托範圍內。亦涵蓋其他操作壓力。 Advantageously, the diffusion pump 120 can be used not only to collect nanoparticles but also to evacuate the reactor 20 (and the collection chamber 26). For example, the operating pressure in reactor 20 can be a low pressure, such as less than atmospheric pressure, less than 760 Torr, or between about 1 and about 760 Torr. Collection chamber 26 can be, for example, in the range of from about 1 to about 5 millitorr. Other operating pressures are also covered.

可選擇擴散泵流體以具有就奈米顆粒捕獲及儲存而言所需之特性。擴散泵流體可與上文關於圖2之實施例所述之捕獲流體相同。類似地,擴散泵流體可包含矽氧烷材料,例如上文所述之矽氧烷流體中 之任一者,使得當奈米顆粒捕獲於擴散泵流體中時便形成奈米顆粒組合物。或者,奈米顆粒可與擴散泵流體分離或隔離且與矽氧烷材料合併以形成奈米顆粒組合物。舉例而言,擴散泵流體可經離心及/或傾析以濃縮或分離其中之奈米顆粒。其他擴散泵流體及油可包括烴、苯基醚、氟化聚苯醚及離子流體。流體可在23±3℃下具有0.001至1、0.005至0.5或0.01至0.1Pa.s之黏度。此外,流體可具有小於約1×10-4托之蒸氣壓。通常,擴散泵流體包含矽氧烷擴散泵流體以使得一旦奈米顆粒捕獲或收集於矽氧烷擴散泵流體中(一旦經冷凝)便形成奈米顆粒組合物。在此等實施例中,奈米顆粒組合物通常為矽氧烷材料(其為液體)中之奈米顆粒之懸浮液。 The diffusion pump fluid can be selected to have the characteristics required for nanoparticle capture and storage. The diffusion pump fluid can be the same as the capture fluid described above with respect to the embodiment of FIG. 2. Similarly, the diffusion pump fluid can comprise a oxoxane material, such as any of the oxane fluids described above, such that when the nanoparticles are captured in a diffusion pump fluid, a nanoparticle composition is formed. Alternatively, the nanoparticles can be separated or isolated from the diffusion pump fluid and combined with the siloxane material to form a nanoparticle composition. For example, the diffusion pump fluid can be centrifuged and/or decanted to concentrate or separate the nanoparticles therein. Other diffusion pump fluids and oils may include hydrocarbons, phenyl ethers, fluorinated polyphenylene ethers, and ionic fluids. The fluid may have 0.001 to 1, 0.005 to 0.5 or 0.01 to 0.1 Pa at 23 ± 3 °C. s viscosity. Additionally, the fluid can have a vapor pressure of less than about 1 x 10 -4 Torr. Typically, the diffusion pump fluid comprises a helium oxide diffusion pump fluid such that once the nanoparticles are captured or collected in the helium diffusion pump fluid (once condensed) a nanoparticle composition is formed. In such embodiments, the nanoparticulate composition is typically a suspension of nanoparticle in a oxoxane material which is a liquid.

系統50亦可包括與擴散泵120之出口105處於流體連通之真空泵或真空源33。可選擇真空源33以便恰當地操作擴散泵120。在本發明之一種形式中,真空源33包含真空泵(例如輔助泵)。真空源33可包含機械、渦輪分子或低溫泵。然而,亦涵蓋其他真空源。 System 50 can also include a vacuum pump or vacuum source 33 in fluid communication with outlet 105 of diffusion pump 120. Vacuum source 33 can be selected to properly operate diffusion pump 120. In one form of the invention, vacuum source 33 includes a vacuum pump (e.g., an auxiliary pump). Vacuum source 33 can include mechanical, turbo molecules, or cryopumps. However, other vacuum sources are also covered.

一種藉由圖3之系統50產生奈米顆粒之方法可包括在反應器20中形成奈米顆粒氣溶膠。奈米顆粒氣溶膠可於氣體中包含奈米顆粒,且該方法進一步包括將奈米顆粒氣溶膠自反應器5引入至擴散泵120中。該方法亦可包括在儲集器107中加熱擴散泵流體以形成蒸氣、經由噴射組件111傳送蒸氣、經由噴嘴113將蒸氣發射至擴散泵120之腔室101中、冷凝蒸氣以形成冷凝物及使冷凝物流回儲集器107。此外,該方法可進一步包括在冷凝物中捕獲氣溶膠之奈米顆粒且在儲集器107中收集捕獲之奈米顆粒。該方法可進一步包括藉由真空泵自擴散泵移除氣體。 A method of producing nanoparticle by system 50 of FIG. 3 can include forming a nanoparticle aerosol in reactor 20. The nanoparticle aerosol can comprise nanoparticle in a gas, and the method further comprises introducing a nanoparticle aerosol from the reactor 5 into the diffusion pump 120. The method may also include heating the diffusion pump fluid in the reservoir 107 to form a vapor, transferring the vapor via the injection assembly 111, emitting vapor through the nozzle 113 into the chamber 101 of the diffusion pump 120, condensing the vapor to form a condensate, and The condensate is returned to the reservoir 107. Additionally, the method can further include capturing the aerosolized nanoparticles in the condensate and collecting the captured nanoparticles in the reservoir 107. The method can further include removing the gas from the diffusion pump by a vacuum pump.

與此特定實施例(其中藉助於此電漿製程產生奈米顆粒)相關之其他態樣係描述於中美國申請案序號61/655,635中,其以全文引用的方式併入本文中。 Other aspects associated with this particular embodiment, wherein the nanoparticle is produced by means of this plasma process, are described in the Chinese Patent Application Serial No. 61/655,635, which is incorporated herein in its entirety by reference.

如在上文各種實施例中所介紹,不管用於產生矽氧烷組合物之奈米顆粒之特定電漿系統及製程,電漿系統通常依賴於前驅氣體。前驅氣體可替代地被稱作反應物氣體混合物或氣體混合物。如參考奈米顆粒在下文中更詳細地描述,通常基於奈米顆粒之所需組成來選擇前驅氣體。舉例而言,當奈米顆粒包含矽奈米顆粒時,前驅氣體可含有矽,且當奈米顆粒包含鍺時,前驅氣體可含有鍺。此外,前驅氣體可選自矽烷、二矽烷、鹵素取代之矽烷、鹵素取代之二矽烷、C1-C4烷基矽烷、C1-C4烷基二矽烷及其混合物。在本發明之一種形式中,前驅氣體可包含矽烷,其佔總氣體混合物之約0.1%至約2%。然而,氣體混合物亦可包含矽烷及/或其他或替代前驅氣體之其他百分比(如參考自其形成之奈米顆粒在下文中所述)。 As described in the various embodiments above, plasma systems typically rely on precursor gases, regardless of the particular plasma system and process used to produce the nanoparticles of the decane composition. The precursor gas may alternatively be referred to as a reactant gas mixture or a gas mixture. As described in more detail below with reference to nanoparticles, the precursor gas is typically selected based on the desired composition of the nanoparticles. For example, when the nanoparticle contains the nanoparticle, the precursor gas may contain cerium, and when the nanoparticle contains cerium, the precursor gas may contain cerium. Further, the precursor gas may be selected from the group consisting of decane, dioxane, halogen-substituted decane, halogen-substituted dioxane, C 1 -C 4 alkyldecane, C 1 -C 4 alkyldioxane, and mixtures thereof. In one form of the invention, the precursor gas may comprise decane which comprises from about 0.1% to about 2% of the total gas mixture. However, the gas mixture may also contain other percentages of decane and/or other or alternative precursor gases (as described below with respect to the nanoparticles formed therefrom).

前驅氣體可與諸如惰性氣體之其他氣體混合以形成氣體混合物。可包括於氣體混合物中之惰性氣體之實例包括氬、氙、氖或惰性氣體之混合物。當存在於氣體混合物中時,惰性氣體可佔氣體混合物之總體積之約1%至約99%。前驅氣體可具有氣體混合物之總體積之約0.1%至約50%。然而,亦預期前驅氣體可佔其他體積百分比,諸如氣體混合物之總體積之約1%至約50%。 The precursor gas can be mixed with other gases such as an inert gas to form a gas mixture. Examples of the inert gas which may be included in the gas mixture include a mixture of argon, helium, neon or inert gas. When present in the gas mixture, the inert gas can comprise from about 1% to about 99% of the total volume of the gas mixture. The precursor gas can have from about 0.1% to about 50% of the total volume of the gas mixture. However, precursor gases are also expected to account for other volume percentages, such as from about 1% to about 50% of the total volume of the gas mixture.

在本發明之一種形式中,反應物氣體混合物亦包含第二前驅氣體,該氣體自身可佔反應物氣體混合物之約0.1至約49.9體積%。第二前驅氣體可包含BCl3、B2H6、PH3、GeH4或GeCl4。第二前驅氣體亦可包含其他氣體,該等氣體含有碳、鍺、硼、磷或氮。第一前驅氣體及第二前驅氣體在一起之組合可佔反應物氣體混合物之總體積之約0.1%至約50%。 In one form of the invention, the reactant gas mixture also contains a second precursor gas which may itself comprise from about 0.1 to about 49.9% by volume of the reactant gas mixture. The second precursor gas may comprise BCl 3 , B 2 H 6 , PH 3 , GeH 4 or GeCl 4 . The second precursor gas may also contain other gases containing carbon, helium, boron, phosphorus or nitrogen. The combination of the first precursor gas and the second precursor gas may comprise from about 0.1% to about 50% of the total volume of the reactant gas mixture.

在本發明之另一形式中,反應物氣體混合物進一步包含氫氣。氫氣可以反應物氣體混合物之總體積之約1%至約10%之量存在。然而,亦預期反應物氣體混合物可包含氫氣之其他百分比。 In another form of the invention, the reactant gas mixture further comprises hydrogen. Hydrogen may be present in an amount from about 1% to about 10% by total volume of the reactant gas mixture. However, it is also contemplated that the reactant gas mixture may comprise other percentages of hydrogen.

可藉由上文所述之方法中之任一者製備用於奈米顆粒組合物之奈米顆粒。取決於電漿製程中所用之前驅氣體及分子,可產生各種組成之奈米顆粒。舉例而言,奈米顆粒可為包含至少一種選自第IV族、第IV-IV族、第II-IV族及第III-V族之元素之半導電奈米顆粒。或者,奈米顆粒可為包含至少一種選自第IIA族、第IIIA族、第IVA族、第VA族、第IB族、第IIB族、第IVB族、第VB族、第VIB族、第VIIB族及第VIIIB族金屬之元素之金屬奈米顆粒。週期表之此等族名稱通常來自CAS或舊的IUPAC命名法,儘管第IV族元素根據現代IUPAC系統被稱作第14族元素(如在此項技術中易於理解)。又或者,奈米顆粒可為金屬合金奈米顆粒、金屬氧化物奈米顆粒、金屬氮化物奈米顆粒、陶瓷奈米顆粒等。 Nanoparticles for the nanoparticle composition can be prepared by any of the methods described above. Nanoparticles of various compositions can be produced depending on the precursor gases and molecules used in the plasma process. For example, the nanoparticle may be a semiconducting nanoparticle comprising at least one element selected from the group consisting of Group IV, Group IV-IV, Group II-IV, and Group III-V. Alternatively, the nanoparticle may comprise at least one member selected from the group consisting of Group IIA, Group IIIA, Group IVA, Group VA, Group IB, Group IIB, Group IVB, Group VB, Group VIB, and VIIB. Metal nanoparticles of the family and elements of Group VIIIB metals. These family names of the periodic table are usually derived from CAS or the old IUPAC nomenclature, although the Group IV elements are referred to as Group 14 elements according to the modern IUPAC system (as is readily understood in the art). Alternatively, the nanoparticles may be metal alloy nanoparticles, metal oxide nanoparticles, metal nitride nanoparticles, ceramic nanoparticles or the like.

本文中所揭示之製程尤其適用於自含有第IV族半導體(包括矽、鍺及錫)之前驅體分子產生單晶且包含此等元素之奈米顆粒。矽烷及鍺烷為分別可用於產生包含矽及鍺之奈米顆粒之前驅體分子之實例。亦可使用有機金屬前驅體分子。此等分子包括第IV族金屬及有機基團。有機金屬第IV族前驅體包括(但不限於)有機矽、有機鍺及有機錫化合物。第IV族前驅體之一些實例包括(但不限於)烷基鍺、烷基矽烷、烷基錫烷、氯矽烷、氯鍺、氯錫烷、芳族矽烷、芳族鍺及芳族錫烷。矽前驅體之其他實例包括(但不限於)二矽烷(Si2H6)、四氯化矽(SiCl4)、三氯矽烷(HSiCl3)及二氯矽烷(H2SiCl2)。用於形成晶體矽奈米顆粒之又其他適合之前驅體分子包括烷基及芳族矽烷,諸如二甲基矽烷(H3C--SiH2--CH3)、四乙基矽烷((CH3CH2)4Si)及二苯基矽烷(Ph-SiH2-Ph)。除鍺烷以外,可用於形成結晶Ge奈米顆粒之鍺前驅體分子之特定實例包括(但不限於)四氯化鍺(GeCl4)、四乙基鍺烷((CH3CH2)4Ge)及二苯基鍺烷(Ph-GeH2-Ph)。 The processes disclosed herein are particularly useful for producing nanocrystals from a precursor molecule containing a Group IV semiconductor (including ruthenium, osmium, and tin) and comprising such elements. Oxane and decane are examples of precursor molecules that can be used to produce nanoparticles comprising ruthenium and osmium, respectively. Organometallic precursor molecules can also be used. These molecules include Group IV metals and organic groups. Organometallic Group IV precursors include, but are not limited to, organic germanium, organic germanium, and organotin compounds. Some examples of Group IV precursors include, but are not limited to, alkyl hydrazines, alkyl decanes, alkyl stannanes, chlorodecanes, chloranil, chlorostannane, aromatic decanes, aromatic hydrazines, and aromatic stannanes. Other examples of ruthenium precursors include, but are not limited to, dioxane (Si 2 H 6 ), hafnium tetrachloride (SiCl 4 ), trichlorodecane (HSiCl 3 ), and dichlorodecane (H 2 SiCl 2 ). Still other suitable precursor molecules for forming crystalline cerium nanoparticles include alkyl and aromatic decanes such as dimethyl decane (H 3 C--SiH 2 -CH 3 ), tetraethyl decane (CH 3 CH 2 ) 4 Si) and diphenyl decane (Ph-SiH 2 -Ph). Specific examples of the ruthenium precursor molecule which can be used to form the crystalline Ge nanoparticle in addition to decane include, but are not limited to, ruthenium tetrachloride (GeCl 4 ), tetraethyl decane ((CH 3 CH 2 ) 4 Ge And diphenyl decane (Ph-GeH 2 -Ph).

在某些實施例中,奈米顆粒包含矽及鍺中之至少一者。此外, 奈米顆粒可包含矽合金及/或鍺合金。可形成之矽合金包括(但不限於)碳化矽、矽鍺、矽硼、矽磷及氮化矽。矽合金可由混合至少一種第一前驅氣體與第二前驅氣體或使用含有不同元素之前驅氣體形成。然而,亦涵蓋形成合金化奈米顆粒之其他方法。 In certain embodiments, the nanoparticle comprises at least one of ruthenium and osmium. In addition, The nanoparticle may comprise a niobium alloy and/or a niobium alloy. The alloys that can be formed include, but are not limited to, tantalum carbide, niobium, tantalum boron, hafnium phosphorus, and tantalum nitride. The niobium alloy may be formed by mixing at least one first precursor gas with a second precursor gas or using a precursor gas containing a different element. However, other methods of forming alloyed nanoparticle are also contemplated.

在本發明之另一形式中,奈米顆粒可經歷另一摻雜步驟。舉例而言,奈米顆粒可於電漿中經歷氣相摻雜,其中第二前驅氣體經解離且在奈米顆粒成核時併入奈米顆粒中。奈米顆粒亦可在產生奈米顆粒下游,但在奈米顆粒捕獲於液體中之前經歷在氣相中之摻雜。此外,亦可在擴散泵流體中產生摻雜奈米顆粒,其中將摻雜物預負載至擴散泵流體中且在捕獲奈米顆粒之後與奈米顆粒相互作用。摻雜奈米顆粒可由與有機矽氣體或液體,包括(但不限於)三甲基矽烷、二矽烷及三矽烷接觸形成。氣相摻雜物可包括(但不限於)BCl3、B2H6、PH3、GeH4或GeCl4In another form of the invention, the nanoparticles can undergo another doping step. For example, the nanoparticles can undergo gas phase doping in the plasma, wherein the second precursor gas is dissociated and incorporated into the nanoparticles during nucleation of the nanoparticle. The nanoparticle can also be downstream of the production of the nanoparticle, but undergoes doping in the gas phase before the nanoparticle is captured in the liquid. In addition, doped nanoparticles can also be produced in the diffusion pump fluid, wherein the dopant is preloaded into the diffusion pump fluid and interacts with the nanoparticle after capturing the nanoparticle. The doped nanoparticles can be formed by contact with an organic hydrazine gas or liquid, including but not limited to trimethyl decane, dioxane, and trioxane. Gas phase dopants can include, but are not limited to, BCl 3 , B 2 H 6 , PH 3 , GeH 4 , or GeCl 4 .

由於量子限制效應,奈米顆粒可展現多種獨特電子、磁力、催化、物理、光電及光學特性。舉例而言,許多半導體奈米顆粒展現顯著大於具有相同組成之宏觀材料之光致發光效應的光致發光效應。 Due to quantum confinement effects, nanoparticles exhibit a variety of unique electronic, magnetic, catalytic, physical, optoelectronic, and optical properties. For example, many semiconductor nanoparticles exhibit a photoluminescence effect that is significantly greater than the photoluminescence effect of macroscopic materials having the same composition.

奈米顆粒可具有小於50、小於20、小於10或小於5nm之最大尺寸或平均最大尺寸。此外,奈米顆粒之最大尺寸或平均最大尺寸可在1與50之間、2與50之間、2與20之間、2與10之間或約2.2與約4.7nm之間。可藉由多種方法,諸如藉由穿透式電子顯微鏡(TEM)量測奈米顆粒。舉例而言,如在此項技術中所理解,通常藉助於數百不同奈米顆粒之TEM影像分析計算粒度分佈。在各種實施例中,奈米顆粒可包含量子點,通常為矽量子點。量子點具有在所有三個空間維度受限之激子且可包含個別晶體,亦即各量子點為單晶體。 The nanoparticles can have a largest dimension or an average maximum dimension of less than 50, less than 20, less than 10, or less than 5 nm. Further, the largest or average maximum size of the nanoparticles may be between 1 and 50, between 2 and 50, between 2 and 20, between 2 and 10, or between about 2.2 and about 4.7 nm. Nanoparticles can be measured by a variety of methods, such as by transmission electron microscopy (TEM). For example, as understood in the art, the particle size distribution is typically calculated by TEM image analysis of hundreds of different nanoparticles. In various embodiments, the nanoparticles can comprise quantum dots, typically germanium quantum dots. Quantum dots have excitons that are constrained in all three spatial dimensions and may contain individual crystals, ie, each quantum dot is a single crystal.

在各種實施例中,奈米顆粒可在藉由曝露於UV光激發時光致發光。取決於奈米顆粒之平均直徑,其可在可見光譜中之任一波長下光 致發光且可在視覺上呈現為紅色、橙色、綠色、藍色、紫色或可見光譜中之任何其他顏色。舉例而言,具有小於約5nm之平均直徑之奈米顆粒可產生可見光致發光,且具有小於約10nm之平均直徑之奈米顆粒可產生近紅外(IR)發光。在本發明之一種形式中,光致發光矽奈米顆粒在約365nm之激發波長下具有至少1×106之光致發光強度。可藉由具有450W Xe激發源、激發單色器、試樣夾、邊帶濾光片(400nm)、發射單色器及矽偵測器光電倍增管之Fluorolog3光譜螢光計(可購自Edison,NJ之Horiba)量測光致發光強度。為量測光致發光強度,將激發及發射狹縫寬度設定為2nm且積分時間設定為0.1s。在此等或其他實施例中,如藉助於耦合至累計球及分光光度計(具有>10%之入射光子吸收)之1000微米光纖在HR400分光光度計(可購自Dunedin,Florida之Ocean Optics)上所量測,光致發光矽奈米顆粒在約395nm之激發波長下可具有至少4%之量子效率。藉由將樣品置放至累計球中且藉助於藉由Ocean Optics LED驅動器驅動之395nm LED激發樣品來計算量子效率。藉由已知燈源校準系統以量測來自累計球之絕對輻照度。隨後藉由奈米顆粒發射之總光子與奈米顆粒吸收之總光子之比計算量子效率。此外,在此等或其他實施例中,奈米顆粒在270-500nm之激發波長下可具有20至250之半高全寬發射。 In various embodiments, the nanoparticles can be photoluminescent upon exposure to UV light. Depending on the average diameter of the nanoparticles, it can be photoluminescent at any wavelength in the visible spectrum and can appear visually as any other color in red, orange, green, blue, violet or visible spectrum. For example, nanoparticles having an average diameter of less than about 5 nm can produce visible light luminescence, and nanoparticles having an average diameter of less than about 10 nm can produce near infrared (IR) luminescence. In one form of the present invention, the photoluminescent silicon nano-particles having at least 1 × 10 6 light of photoluminescence intensity at an excitation wavelength of about 365nm. Fluorolog3 Spectrofluorometer with 450W Xe excitation source, excitation monochromator, sample holder, sideband filter (400nm), emission monochromator and xenon detector photomultiplier tube (available from Edison) , NJ's Horiba) measures the photoluminescence intensity. To measure the photoluminescence intensity, the excitation and emission slit widths were set to 2 nm and the integration time was set to 0.1 s. In this or other embodiments, the HR400 spectrophotometer (available from Ocean Optics, Dunedin, Florida) by means of a 1000 micron fiber coupled to a cumulative sphere and spectrophotometer (with >10% incident photon absorption) As measured above, the photoluminescent nanoparticle can have a quantum efficiency of at least 4% at an excitation wavelength of about 395 nm. Quantum efficiency was calculated by placing the sample into a cumulative sphere and exciting the sample by means of a 395 nm LED driven by an Ocean Optics LED driver. The absolute irradiance from the cumulative sphere is measured by a known light source calibration system. The quantum efficiency is then calculated by the ratio of the total photons emitted by the nanoparticles to the total photons absorbed by the nanoparticles. Moreover, in this or other embodiments, the nanoparticles may have a full width at half maximum of 20 to 250 at an excitation wavelength of 270-500 nm.

此外,當奈米顆粒(視情況存在捕獲流體、擴散泵流體或矽氧烷材料中)曝露於空氣時,光致發光強度及發光量子效率二者可隨時間推移繼續增加。在本發明之另一形式中,當曝露於氧氣時,奈米顆粒之最大發射波長隨時間推移而位移至較短波長。當曝露於氧氣時,奈米顆粒組合物之發光量子效率可增加約200%至約2500%。然而,亦涵蓋發光量子效率之其他增加。取決於曝露於氧氣之時間及奈米顆粒於矽氧烷材料(或捕獲流體(若不同於矽氧烷材料))中之濃度,光致發光強度可增加400%至4500%。然而,亦涵蓋光致發光強度之其他增加。 自直接捕獲組合物發射之波長亦經歷發射光譜之藍移。在本發明之一種形式中,取決於曝露於氧氣之時間,最大發射波長基於奈米顆粒核心尺寸減小約1nm而位移約100nm。然而,亦涵蓋其他最大發射波長位移。 Furthermore, both photoluminescence intensity and luminescence quantum efficiency may continue to increase over time as the nanoparticles (as the case may be in the capture fluid, diffusion pump fluid or helium oxide material) are exposed to air. In another form of the invention, the maximum emission wavelength of the nanoparticles is shifted to shorter wavelengths over time when exposed to oxygen. The luminescence quantum efficiency of the nanoparticle composition can be increased by about 200% to about 2500% when exposed to oxygen. However, other increases in luminescence quantum efficiency are also covered. The photoluminescence intensity can be increased by 400% to 4500% depending on the time of exposure to oxygen and the concentration of nanoparticles in the oxane material (or capture fluid (if different from the oxane material)). However, other increases in photoluminescence intensity are also covered. The wavelength emitted from the direct capture composition also undergoes a blue shift in the emission spectrum. In one form of the invention, the maximum emission wavelength is reduced by about 1 nm based on the core size of the nanoparticle and displaced by about 100 nm, depending on the time of exposure to oxygen. However, other maximum emission wavelength shifts are also covered.

獨立於奈米顆粒組合物中使用之特定矽氧烷材料奈米顆粒,該方法進一步包含解聚合奈米顆粒組合物之矽氧烷材料以形成揮發性矽化合物。解聚合矽氧烷材料可包含解聚合矽氧烷材料之任何已知方法且可為連續、半連續或分批法。 Independent of the particular nanopellet material nanoparticle used in the nanoparticulate composition, the method further comprises depolymerizing the rhodium oxide material of the nanoparticle composition to form a volatile rhodium compound. The depolymerized siloxane material can comprise any known method of depolymerizing a siloxane material and can be a continuous, semi-continuous or batch process.

在一個實施例中,矽氧烷材料在碳酸二烷基酯存在下解聚合。在此實施例中,矽氧烷材料可,或者可不在除碳酸二烷基酯以外的催化劑存在下解聚合。適合於解聚合之催化劑之特定實例包括無機鹽、金屬氧化物、金屬氫氧化物、無機鹼及有機路易斯鹼(Lewis base)(視情況與醇組合)。催化劑可增加矽氧烷材料之解聚合速率。催化劑之各種組合可視情況用於解聚合中。舉例而言,兩種不同類型之無機鹽可彼此組合來使用,及/或無機鹽可與金屬氧化物組合來使用等。藉助於此解聚合方法產生之揮發性矽化合物通常為如下所述之烷氧矽烷。 In one embodiment, the decane material is depolymerized in the presence of a dialkyl carbonate. In this embodiment, the decane material may or may not be depolymerized in the presence of a catalyst other than the dialkyl carbonate. Specific examples of catalysts suitable for depolymerization include inorganic salts, metal oxides, metal hydroxides, inorganic bases, and organic Lewis bases (as appropriate, in combination with alcohols). The catalyst can increase the rate of depolymerization of the siloxane material. Various combinations of catalysts may be used in the depolymerization as appropriate. For example, two different types of inorganic salts can be used in combination with each other, and/or inorganic salts can be used in combination with metal oxides, and the like. The volatile hydrazine compound produced by this depolymerization process is generally an alkoxy decane as described below.

碳酸二烷基酯在此項技術中已知且通常係指碳酸酯(亦即有機碳酸酯)。碳酸二烷基酯通常為碳酸之酯。為此目的,在某些實施例中,用於解聚合矽氧烷材料之碳酸二烷基酯通常具有以下通式:(R1O)2C=O,其中R1為獨立選擇之C1-C12烷基。在某些實施例中,R1獨立地選自甲基、乙基及丙基。適合於解聚合矽氧烷材料之碳酸二烷基酯之特定實例包括碳酸二甲酯、碳酸二乙酯及碳酸二丙酯,儘管在碳酸二烷基酯中烷基不必相同。 Dialkyl carbonates are known in the art and generally refer to carbonates (i.e., organic carbonates). The dialkyl carbonate is usually an ester of carbonic acid. For this purpose, in certain embodiments, the dialkyl carbonate used to depolymerize the oxoxane material typically has the general formula: (R 1 O) 2 C=O, wherein R 1 is independently selected C 1 -C 12 alkyl. In certain embodiments, R 1 is independently selected from the group consisting of methyl, ethyl, and propyl. Specific examples of dialkyl carbonates suitable for the depolymerization of a oxoxane material include dimethyl carbonate, diethyl carbonate and dipropyl carbonate, although the alkyl groups are not necessarily the same in the dialkyl carbonate.

可以不同量來使用碳酸二烷基酯,儘管所用量通常足以解聚合矽氧烷材料。在一個實施例中,以矽氧烷材料中之每莫耳矽至少 0.1、或者至少0.2、或者至少0.5、或者至少1、或者至少2、或者至少5、或者至多10莫耳碳酸二烷基酯之量使用碳酸二烷基酯。 The dialkyl carbonate can be used in varying amounts, although usually in an amount sufficient to depolymerize the rhodium alkane material. In one embodiment, each of the molybdenum materials is at least Dialkyl carbonate is used in an amount of 0.1, or at least 0.2, or at least 0.5, or at least 1, or at least 2, or at least 5, or at most 10 moles of dialkyl carbonate.

如以上所介紹,可在催化劑存在下解聚合矽氧烷。適合於催化劑之無機鹽之特定實例包括鹼金屬鹽,諸如KF、NaF、NaCl、LiCl、KI、KCl及CsCl。適合於催化劑之金屬氧化物之特定實例包括包含鹼金屬或鹼土金屬之彼等催化劑,諸如CaO、Na2O、K2O及MgO。適合於催化劑之金屬氫氧化物之特定實例同樣包括包含鹼金屬或鹼土金屬之彼等催化劑,諸如KOH、NaOH、CsOH、LiOH及Ca(OH)2As described above, the deoxygenated alkane can be depolymerized in the presence of a catalyst. Specific examples of inorganic salts suitable for the catalyst include alkali metal salts such as KF, NaF, NaCl, LiCl, KI, KCl and CsCl. Specific examples of metal oxides suitable for the catalyst include those comprising an alkali metal or an alkaline earth metal such as CaO, Na 2 O, K 2 O and MgO. Specific examples of metal hydroxides suitable for the catalyst also include those catalysts comprising an alkali metal or an alkaline earth metal such as KOH, NaOH, CsOH, LiOH and Ca(OH) 2 .

或者或另外,催化劑可包含有機路易斯鹼。有機路易斯鹼可選自已知有機路易斯鹼。有機路易斯鹼通常具有孤電子對,其可供給至路易斯酸以形成路易斯加合物。有機路易斯鹼在大氣壓下可為液體或固體。或者,有機路易斯鹼可為均質催化劑或異質催化劑。均質催化劑為通常共溶解於溶劑中以使得有機路易斯鹼與反應物在相同相中之一種催化劑。異質催化劑為與反應物在不同相(例如固體對氣體)中之一種催化劑。不同相亦可為液體-液體,其中該等液體彼此不可混溶。通常,選擇有機路易斯鹼以使得其在大氣壓下可溶以與碳酸二烷基酯可混溶。 Alternatively or additionally, the catalyst may comprise an organic Lewis base. The organic Lewis base can be selected from known organic Lewis bases. Organic Lewis bases typically have a lone pair of electrons that can be supplied to a Lewis acid to form a Lewis adduct. The organic Lewis base can be a liquid or a solid at atmospheric pressure. Alternatively, the organic Lewis base can be a homogeneous catalyst or a heterogeneous catalyst. A homogeneous catalyst is one that is generally co-dissolved in a solvent such that the organic Lewis base is in the same phase as the reactant. The heterogeneous catalyst is one of the catalysts in a different phase (e.g., solid to gas) to the reactants. The different phases may also be liquid-liquids in which the liquids are immiscible with each other. Typically, the organic Lewis base is selected such that it is soluble at atmospheric pressure to be miscible with the dialkyl carbonate.

有機路易斯鹼可包含例如氮、磷、硫、氧、硒及/或碲。舉例而言,當有機路易斯鹼含氮時,有機路易斯鹼可包括一級胺、二級胺、三級胺、雜環胺、雙環胺或其組合。或者,當有機路易斯鹼含磷時,有機路易斯鹼可包括一級膦、二級膦、三級膦、磷氮烯、環磷氮烯或其組合。 The organic Lewis base can comprise, for example, nitrogen, phosphorus, sulfur, oxygen, selenium, and/or cesium. For example, when the organic Lewis base contains nitrogen, the organic Lewis base can include a primary amine, a secondary amine, a tertiary amine, a heterocyclic amine, a bicyclic amine, or a combination thereof. Alternatively, when the organic Lewis base contains phosphorus, the organic Lewis base can include a primary phosphine, a secondary phosphine, a tertiary phosphine, a phosphazene, a cyclophosphazene or a combination thereof.

在特定實施例中,有機路易斯鹼包含1,4-二氮雜雙環[2.2.2]辛烷(DABCO)、啶、N,N-二甲基苯甲胺及嗎啉中之至少一者。 In a particular embodiment, the organic Lewis base comprises 1,4-diazabicyclo[2.2.2]octane (DABCO), At least one of pyridine, N,N-dimethylbenzylamine and morpholine.

可以不同量來使用有機路易斯鹼,儘管所用量通常足以解聚合矽氧烷材料。在一個實施例中,以1:1,000至5:1;或者1:100至約1:1之 有機路易斯鹼與矽氧烷材料之重量比使用有機路易斯鹼。 The organic Lewis base can be used in varying amounts, although usually in an amount sufficient to depolymerize the rhodium alkane material. In one embodiment, from 1:1,000 to 5:1; or from 1:100 to about 1:1 The weight ratio of the organic Lewis base to the oxoxane material is an organic Lewis base.

當解聚合矽氧烷材料包括醇時,醇通常為具有單一羥基官能基之有機化合物,儘管醇可具有兩個或兩個以上羥基官能基。通常,羥基官能基在醇中位於末端,儘管羥基官能基可替代地位於距有機化合物之鏈之側位。有機化合物可為C1-C12有機化合物。醇之特定實例包括甲醇、乙醇、異丙醇、丁醇等。 When the depolymerized oxoxane material comprises an alcohol, the alcohol is typically an organic compound having a single hydroxy functional group, although the alcohol may have two or more hydroxy functional groups. Typically, the hydroxy functional group is at the end in the alcohol, although the hydroxy functional group may alternatively be located on the side of the chain from the organic compound. The organic compound may be a C 1 -C 12 organic compound. Specific examples of the alcohol include methanol, ethanol, isopropanol, butanol and the like.

若使用,則可以各種量來使用醇。在某些實施例中,以1:50至5:1、或者1:30至4:1、或者1:20至3:1、或者至少2:10、3:10、4:10、5:10、6:10、7:10、8:10、9:10、1:1、1.5:1、2:1或2.5:1之醇與碳酸二烷基酯之體積比使用該醇。 If used, alcohol can be used in various amounts. In some embodiments, from 1:50 to 5:1, or 1:30 to 4:1, or 1:20 to 3:1, or at least 2:10, 3:10, 4:10, 5: The alcohol is used in the volume ratio of 10:6, 7:10, 8:10, 9:10, 1:1, 1.5:1, 2:1 or 2.5:1 alcohol to dialkyl carbonate.

必要時,矽氧烷材料可在存在酸催化劑之情況下或在不存在酸催化劑之情況下解聚合。 If necessary, the oxoxane material can be depolymerized in the presence of an acid catalyst or in the absence of an acid catalyst.

解聚合矽氧烷材料通常包含加熱包含奈米顆粒組合物、碳酸二烷基酯、催化劑及視情況存在之醇之混合物。可在常壓以上或以下之壓力下進行加熱混合物。在某些實施例中,加熱混合物至小於275、或者小於225、或者小於175℃之溫度。舉例而言,混合物可在各種實施例中加熱至75至250℃之溫度。然而,由於催化劑及醇在解聚合中為視情況存在的,熟習此項技術者可使該方法之參數(例如溫度、壓力及碳酸二烷基酯之相對量)最優化以排除對於催化劑及/或醇之需要。 The depolymerized siloxane material typically comprises heating a mixture comprising a nanoparticle composition, a dialkyl carbonate, a catalyst, and optionally an alcohol. The mixture can be heated at a pressure above or below atmospheric pressure. In certain embodiments, the mixture is heated to a temperature of less than 275, or less than 225, or less than 175 °C. For example, the mixture can be heated to a temperature of from 75 to 250 ° C in various embodiments. However, since the catalyst and the alcohol are optionally present in the depolymerization, those skilled in the art can optimize the parameters of the process (e.g., temperature, pressure, and relative amount of dialkyl carbonate) to exclude the catalyst and/or Or the need for alcohol.

解聚合矽氧烷材料可視情況在惰性氛圍,例如包含氮(N2)及/或氬(Ar)之大氣中進行。 The depolymerized oxymethane material may optionally be carried out in an inert atmosphere such as an atmosphere comprising nitrogen (N 2 ) and/or argon (Ar).

如下所述,矽氧烷材料解聚合之時段通常對於矽氧烷材料之實質性解聚合為充足的。該時段可為5至72或者6至64小時。 As described below, the period of depolymerization of the decane material is generally sufficient for substantial depolymerization of the siloxane material. This period can be 5 to 72 or 6 to 64 hours.

如在上文中首先介紹,在此實施例中,藉由解聚合矽氧烷材料產生之揮發性矽化合物通常為烷氧基矽烷及/或烷氧基矽氧烷。烷氧 基矽烷可為不同烷氧基矽烷之混合物或包含複數個相同烷氧基矽烷之混合物。烷氧基矽烷通常包括0至3個經取代或未經取代烴基及1-4個烷氧基,限制條件為烷氧基矽烷包括第二矽原子。然而,烷氧基矽烷可為單體或寡聚的,儘管後者通常為烷氧基矽氧烷。 As first introduced above, in this embodiment, the volatile oxime compound produced by depolymerizing the siloxane material is typically an alkoxy decane and/or an alkoxy decane. Alkoxy The decane can be a mixture of different alkoxy decanes or a mixture comprising a plurality of identical alkoxy decanes. The alkoxydecane typically comprises from 0 to 3 substituted or unsubstituted hydrocarbyl groups and from 1 to 4 alkoxy groups, with the proviso that the alkoxydecane comprises a second deuterium atom. However, the alkoxydecane may be monomeric or oligomeric, although the latter is typically an alkoxy oxirane.

揮發性矽化合物(亦即烷氧基矽烷)通常具有以下通式:(R2)w(R3)xSi(OR4)y(OR5)z,其中R2-R5獨立地選自以上R,亦即R2-R5獨立地選自經取代或未經取代之烴基;y+z1;且w+x+y+z=4。R2-R5之特定實例包括烷基、芳基、芳烷基及烷芳基。 The volatile hydrazine compound (i.e., alkoxy decane) generally has the general formula: (R 2 ) w (R 3 ) x Si(OR 4 ) y (OR 5 ) z , wherein R 2 - R 5 are independently selected from The above R, that is, R 2 - R 5 are independently selected from a substituted or unsubstituted hydrocarbon group; y + z 1; and w+x+y+z=4. Specific examples of R 2 to R 5 include an alkyl group, an aryl group, an aralkyl group, and an alkylaryl group.

一般而言,所用烷基碳酸酯之類型影響所得烷氧基矽烷。舉例而言,烷基碳酸酯之R1通常與烷氧基矽烷之R4及/或R5相同。 In general, the type of alkyl carbonate used affects the resulting alkoxydecane. For example, R 1 of the alkyl carbonate is generally the same as R 4 and/or R 5 of the alkoxy decane.

可藉助於解聚合形成之烷氧基矽烷之特定實例包括Me2Si(OMe)2、PhMeSi(OMe)2、Me2Si(OEt)2、(MeO)2SiMe(CH2CH2CF3)、MeSi(OMe)3、PhSi(OMe)3、Ph2Si(OMe)2及Me2(OMe)Si-O-SiMe2(OMe)。 Specific examples of the alkoxydecane which can be formed by means of depolymerization include Me 2 Si(OMe) 2 , PhMeSi(OMe) 2 , Me 2 Si(OEt) 2 , (MeO) 2 SiMe(CH 2 CH 2 CF 3 ) MeSi(OMe) 3 , PhSi(OMe) 3 , Ph 2 Si(OMe) 2 and Me 2 (OMe)Si-O-SiMe 2 (OMe).

在特定實施例中,以相對於矽氧烷材料之矽氧烷含量之至少約40、或者至少50、或者至少75、或者至少90、或者至少95、或者至少98重量%之產率獲得烷氧基矽烷。 In a particular embodiment, the alkoxy is obtained in a yield of at least about 40, or at least 50, or at least 75, or at least 90, or at least 95, or at least 98% by weight relative to the decane content of the siloxane material. Base decane.

與此特定解聚合技術相關之其他資訊可發現於美國專利申請案序號61/768,709中,其以全文引用的方式併入本文中。 Additional information relating to this particular depolymerization technique can be found in U.S. Patent Application Serial No. 61/768,709, which is incorporated herein in its entirety by reference.

在替代實施例中,矽氧烷材料在除上文所述之碳酸二烷基酯以外之解聚合催化劑存在下解聚合。在此等實施例中,揮發性矽化合物通常包含環矽氧烷化合物。 In an alternate embodiment, the decane material is depolymerized in the presence of a depolymerization catalyst other than the dialkyl carbonate described above. In these embodiments, the volatile rhodium compound typically comprises a cyclodecane compound.

在此替代實施例中,解聚合催化劑可選自適合於解聚合矽氧烷材料之任何解聚合催化劑。在某些實施例中,解聚合催化劑包含有機或無機鹼。在其他實施例中,解聚合催化劑包含有機或無機酸。 In this alternative embodiment, the depolymerization catalyst can be selected from any depolymerization catalyst suitable for depolymerizing a decane material. In certain embodiments, the depolymerization catalyst comprises an organic or inorganic base. In other embodiments, the depolymerization catalyst comprises an organic or inorganic acid.

可用作解聚合催化劑之固體酸之特定實例包括鋁矽酸鹽、酸處 理之鋁矽酸鹽、沸石、混合金屬氧化物、雜多酸、硫酸化金屬氧化物、基於碳之固體酸、離子交換樹脂、磺化聚合物、高分子量羧酸、酸性金屬鹽及其組合。 Specific examples of the solid acid which can be used as the depolymerization catalyst include aluminosilicate, acid Aluminate, zeolite, mixed metal oxide, heteropoly acid, sulfated metal oxide, carbon-based solid acid, ion exchange resin, sulfonated polymer, high molecular weight carboxylic acid, acidic metal salt, and combinations thereof .

或者,解聚合催化劑可包含黏土、混合金屬氧化物、磺化金屬氧化物或其組合。或者,解聚合催化劑可包含高嶺土、膨潤石、伊利石(illite)、綠泥石、坡縷石海泡石或其組合。黏土可經酸洗,亦即黏土可包含酸洗黏土。解聚合催化劑之其他實例包括蒙脫石、皂石、綠脫石(鐵蒙脫石)、貝得石、膨潤土、鋰皂石及其組合。 Alternatively, the depolymerization catalyst can comprise clay, mixed metal oxides, sulfonated metal oxides, or a combination thereof. Alternatively, the depolymerization catalyst may comprise kaolin, bentonite, illite, chlorite, palygorskite or a combination thereof. The clay can be pickled, that is, the clay can contain pickled clay. Other examples of depolymerization catalysts include montmorillonite, saponite, nontronite (iron montmorillonite), beidellite, bentonite, laponite, and combinations thereof.

在各種實施例中,在除上文所述之解聚合催化劑以外之有機聚合物存在下進行解聚合矽氧烷材料。有機聚合物可為另外適合於再循環之廢產物。有機聚合物可為熱塑性有機聚合物,例如聚烯烴。 In various embodiments, the depolymerization of the oxoxane material is carried out in the presence of an organic polymer other than the depolymerization catalyst described above. The organic polymer can be a waste product that is otherwise suitable for recycling. The organic polymer can be a thermoplastic organic polymer such as a polyolefin.

在特定實施例中,有機聚合物包括以下中之至少一者:直鏈聚烯烴或共聚物聚烯烴、分支鏈聚烯烴或共聚物聚烯烴、接枝聚烯烴或共聚物聚烯烴、硼烷接枝之聚烯烴、具有側羥基之聚烯烴、經另一聚合物接枝之聚烯烴、聚烯烴與另一聚合物之摻合物及填充有無機材料之聚烯烴。 In a particular embodiment, the organic polymer comprises at least one of: a linear polyolefin or copolymer polyolefin, a branched polyolefin or copolymer polyolefin, a grafted polyolefin or copolymer polyolefin, a borane A polyolefin of a branch, a polyolefin having a side hydroxyl group, a polyolefin grafted with another polymer, a blend of a polyolefin with another polymer, and a polyolefin filled with an inorganic material.

在特定實施例中,有機聚合物包含以下中之至少一者:聚乙烯(PE)、聚丙烯(PP)、聚甲基戊烯(PMP)、聚丁烯-1(PB-1)、聚異丁烯、聚(乙烯-共-丙烯)、聚(丙烯-共-1,4-己二烯)、聚(異丁烯-共-異戊二烯)、聚(乙烯-共-丙烯-共-1,4-己二烯、PE-g-PVA、PP-g-PMMA、PP-g-PVA、PE-g-PCL、PP-g-PCL、EP-g-PMMA、丁基-g-PMMA、PMMA、PVA、PS、PVC、PVAC及填充有雲母、碳酸鈣、二氧化矽、玻璃、氧化鎂、氧化鋁及黏土中之至少一者之聚烯烴。聚乙烯可例如為低密度聚乙烯(LDPE)、中密度聚乙烯(MDPE)及/或高密度聚乙烯(HDPE)。 In a particular embodiment, the organic polymer comprises at least one of polyethylene (PE), polypropylene (PP), polymethylpentene (PMP), polybutene-1 (PB-1), poly Isobutylene, poly(ethylene-co-propylene), poly(propylene-co-1,4-hexadiene), poly(isobutylene-co-isoprene), poly(ethylene-co-propylene-total-1, 4-hexadiene, PE-g-PVA, PP-g-PMMA, PP-g-PVA, PE-g-PCL, PP-g-PCL, EP-g-PMMA, butyl-g-PMMA, PMMA , PVA, PS, PVC, PVAC, and a polyolefin filled with at least one of mica, calcium carbonate, cerium oxide, glass, magnesia, alumina, and clay. The polyethylene may be, for example, low density polyethylene (LDPE). Medium density polyethylene (MDPE) and / or high density polyethylene (HDPE).

在特定實施例中,有機聚合物為包括以下中之至少一者之熱塑 性有機聚合物:聚甲醛、具有氧伸乙基及視情況存在之其他結構單元之聚甲醛共聚物、聚甲基丙烯酸甲酯(PMMA)、PMMA共聚物、聚苯乙烯、聚苯乙烯共聚物、賽璐璐(celluloid)、賽璐璐乙酸酯、環狀烯烴共聚物、乙烯-乙酸乙烯酯(EVA)、伸乙基乙烯醇(EVOH)、氟塑膠、PTFE、丙烯腈-丁二烯-苯乙烯(ABS)、聚丙烯酸酯、聚醯胺、聚醯胺-醯亞胺、聚醯亞胺、聚醚醯亞胺、聚碸、聚醚碸、聚酮、聚醚醚酮(PEEK)、聚碳酸酯、聚酯、聚己內酯、聚對苯二甲酸伸丁酯、聚對苯二甲酸伸乙酯、聚乳酸、聚苯醚、聚苯硫醚、熱塑性聚胺基甲酸酯、聚乙酸乙烯酯(PVA)、聚氯乙烯(PVC)、聚二氯亞乙烯(PVDC)及苯乙烯-丙烯腈(SAN)共聚物。 In a particular embodiment, the organic polymer is a thermoplastic comprising at least one of the following Organic polymer: polyoxymethylene, polyoxymethylene copolymer with oxygen extended ethyl group and other structural units as the case exists, polymethyl methacrylate (PMMA), PMMA copolymer, polystyrene, polystyrene copolymer , celluloid, celluloid acetate, cyclic olefin copolymer, ethylene vinyl acetate (EVA), ethylene vinyl alcohol (EVOH), fluoroplastic, PTFE, acrylonitrile-butadiene -styrene (ABS), polyacrylate, polyamine, polyamido-imide, polyimine, polyetherimide, polyfluorene, polyether oxime, polyketone, polyetheretherketone (PEEK ), polycarbonate, polyester, polycaprolactone, polybutylene terephthalate, polyethylene terephthalate, polylactic acid, polyphenylene ether, polyphenylene sulfide, thermoplastic polyurethane Ester, polyvinyl acetate (PVA), polyvinyl chloride (PVC), polydichloroethylene (PVDC) and styrene-acrylonitrile (SAN) copolymers.

當在有機聚合物存在下進行奈米顆粒組合物之矽氧烷材料之解聚合時,預期奈米顆粒可視情況在矽氧烷材料之解聚合期間及/或在其之後直接併入至有機聚合物中。可在揮發性矽化合物與奈米顆粒/有機聚合物混合物之任何分離之前、在其期間或在其之後進行將奈米顆粒併入至有機聚合物中。 When the depolymerization of the decane material of the nanoparticle composition is carried out in the presence of an organic polymer, it is expected that the nanoparticle may be directly incorporated into the organic polymerization during and/or after the depolymerization of the siloxane material. In. The incorporation of nanoparticle into the organic polymer can be carried out before, during or after any separation of the volatile rhodium compound from the nanoparticle/organic polymer mixture.

一般而言,奈米顆粒組合物、解聚合催化劑及視情況存在之有機聚合物經合併以形成混合物。混合物可以0.01至25、或者0.01至20、或者0.01至15、或者0.01至10重量%(以混合物之總重量計)之量包含解聚合催化劑。在此等實施例中,混合物可以以混合物之總重量計0.1至99重量%之量包含有機聚合物(若存在)。在某些實施例中,混合物可以以混合物之總重量計至少90或者至少95重量%之量包含有機聚合物(若存在)。在其他實施例中,混合物以以混合物之總重量計1至25重量%之量包含有機聚合物(若存在)。 In general, the nanoparticle composition, the depolymerization catalyst, and optionally the organic polymer are combined to form a mixture. The mixture may comprise a depolymerization catalyst in an amount of 0.01 to 25, or 0.01 to 20, or 0.01 to 15, or 0.01 to 10% by weight, based on the total weight of the mixture. In such embodiments, the mixture may comprise an organic polymer, if present, in an amount from 0.1 to 99% by weight based on the total weight of the mixture. In certain embodiments, the mixture may comprise an organic polymer, if present, in an amount of at least 90 or at least 95% by weight, based on the total weight of the mixture. In other embodiments, the mixture comprises an organic polymer, if present, in an amount from 1 to 25% by weight based on the total weight of the mixture.

混合物可視情況經受剪切以形成均質或半均質混合物。舉例而言,奈米顆粒組合物、視情況存在之有機聚合物及解聚合催化劑可經合併及混合以於高剪切機械裝置、擠壓機、雙螺桿擠壓機等(視情況 具有除氣端口)中形成混合物。 The mixture can optionally be sheared to form a homogeneous or semi-homogenous mixture. For example, the nanoparticle composition, optionally the organic polymer and the depolymerization catalyst can be combined and mixed for high shear mechanical devices, extruders, twin screw extruders, etc. (as appropriate) A mixture is formed in the degassing port).

儘管混合物可不含溶劑,混合物亦可包括有機溶劑。然而,通常,混合物以以混合物之總重量計小於20、或者小於10、或者小於1、或者小於0.5、或者小於0.1、或者小於0.05重量%之量包含有機溶劑。 Although the mixture may be free of solvents, the mixture may also include organic solvents. However, usually, the mixture contains the organic solvent in an amount of less than 20, or less than 10, or less than 1, or less than 0.5, or less than 0.1, or less than 0.05% by weight based on the total weight of the mixture.

在此實施例中通常藉由加熱上文所述之混合物來解聚合矽氧烷材料。可進行加熱足以解聚合矽氧烷材料之時段以形成揮發性矽化合物。在某些實施例中,加熱混合物至少0.1、或者至少1、或者至少5、或者至少10、或者至少30、或者至少60分鐘。可持續比60分鐘長得多的時段,例如24小時來進行加熱。 The oxirane material is typically depolymerized in this embodiment by heating the mixture described above. Heating may be performed for a period of time sufficient to depolymerize the siloxane material to form a volatile hydrazine compound. In certain embodiments, the mixture is heated at least 0.1, or at least 1, or at least 5, or at least 10, or at least 30, or at least 60 minutes. It can last for a much longer period of time than 60 minutes, for example 24 hours for heating.

加熱混合物之溫度通常小於350℃。當在有機聚合物存在下進行解聚合時,溫度通常小於有機聚合物之分解溫度,例如低於有機聚合物之分解溫度至少5或者至少10℃。為此目的,加熱混合物之溫度取決於混合物中使用之有機聚合物。溫度通常為60至340℃。即使在混合物不包括有機聚合物時亦通常使用此溫度範圍。 The temperature of the heated mixture is typically less than 350 °C. When the depolymerization is carried out in the presence of an organic polymer, the temperature is usually less than the decomposition temperature of the organic polymer, for example, at least 5 or at least 10 ° C below the decomposition temperature of the organic polymer. For this purpose, the temperature of the heated mixture depends on the organic polymer used in the mixture. The temperature is usually from 60 to 340 °C. This temperature range is usually used even when the mixture does not include an organic polymer.

如上文所介紹,在此特定實施例中產生之揮發性矽化合物包含環矽氧烷。環矽氧烷在此項技術中已知且包含重複D矽烷氧基單元。舉例而言,當揮發性矽化合物包含環矽氧烷時,環矽氧烷可具有通式:(R6R7SiO2)n',其中R6及R7獨立地選自R,其為上文所定義。下標n'表示環矽氧烷中之矽烷氧基單元之數目。藉助於解聚合矽氧烷材料產生之環矽氧烷可包含混合物,其中環矽氧烷可就其取代基及/或矽烷氧基單元之數目而言進行改變。一般而言,n'為3至25、或者3至20、或者3至12、或者3至7之整數。當n'小於3時,環矽氧烷在本質上無法為環狀的。 As described above, the volatile rhodium compound produced in this particular embodiment comprises a cyclodecane. Cyclodecane is known in the art and comprises repeating D decyloxy units. For example, when the volatile ruthenium compound comprises a cyclodecane, the cyclodecane can have the formula: (R 6 R 7 SiO 2 ) n ' , wherein R 6 and R 7 are independently selected from R, which is As defined above. The subscript n' represents the number of decyloxy units in the cyclodecane. The cyclodecane produced by means of the depolymerized oxoxane material may comprise a mixture wherein the cyclodecane may be varied in terms of the number of substituents and/or decyloxy units. In general, n' is an integer from 3 to 25, or from 3 to 20, or from 3 to 12, or from 3 to 7. When n' is less than 3, the cyclodecane is not substantially cyclic in nature.

可藉助於解聚合矽氧烷材料產生除環矽氧烷以外的揮發性矽化合物(不包括及包括環矽氧烷)。舉例而言,揮發性矽化合物可另外包 含非環狀矽氧烷寡聚物及/或單體。此外,揮發性矽化合物可另外包含直鏈矽氧烷寡聚物或單體。 Volatile ruthenium compounds other than cyclodecane can be produced by means of the depolymerized siloxane material (excluding and including cyclodecane). For example, volatile bismuth compounds can be additionally packaged Containing acyclic alkoxysilane oligomers and/or monomers. Further, the volatile hydrazine compound may additionally comprise a linear siloxane alkane oligomer or monomer.

與此特定解聚合技術相關之其他資訊可發現於美國專利申請案序號61/768,710中,其以全文引用的方式併入本文中。 Additional information relating to this particular depolymerization technique can be found in U.S. Patent Application Serial No. 61/768,710, which is incorporated herein in its entirety by reference.

獨立於用於解聚合奈米顆粒組合物之矽氧烷材料之技術,該方法進一步包含自揮發性矽化合物實質上分離奈米顆粒之步驟。當在奈米顆粒組合物存在於混合物中時解聚合矽氧烷材料時,該方法可包含自混合物實質上分離奈米顆粒之步驟。此可替代地被稱作實質上分離奈米顆粒。實質上分離或分離奈米顆粒允許將其併入或用於其他組合物或應用中,因此增加奈米顆粒之使用壽命。 Independent of the technique for depolymerizing a naphthenic material of a nanoparticulate composition, the method further comprises the step of substantially separating the nanoparticle from the volatile rhodium compound. When the rhodium alkane material is depolymerized while the nanoparticulate composition is present in the mixture, the method can comprise the step of substantially separating the nanoparticles from the mixture. This may alternatively be referred to as substantially separating the nanoparticles. Separating or separating the nanoparticle substantially allows for incorporation or use in other compositions or applications, thereby increasing the useful life of the nanoparticle.

如參考奈米顆粒自揮發性矽化合物實質上分離在本文中所用之「實質上」意謂藉助於實質上分離奈米顆粒與揮發性矽化合物移除(減小)奈米顆粒組合物之初始重量之至少10、或者至少20、或者至少30、或者至少40、或者至少50、或者至少60、或者至少70、或者至少75、或者至少80、或者至少85、或者至少90重量%。舉例而言,假定質量為100kg之奈米顆粒組合物,在解聚合矽氧烷材料及實質上分離奈米顆粒與揮發性矽化合物及其他副產物,包括矽(氧烷)單體、寡聚物或聚合物之後,所得組合物具有小於100kg之質量,例如以僅10kg之量,其對應於90%質量減小。此可藉由量測奈米顆粒組合物之初始質量及在實質上分離奈米顆粒與揮發性矽化合物及任何其他副產物之後奈米顆粒之所得質量容易地量測。該減小亦取決於奈米顆粒組合物中之奈米顆粒之含量,該含量可改變。舉例而言,若奈米顆粒組合物以以奈米顆粒組合物之總重量計50重量%之量包含奈米顆粒,則質量減小通常將不超過50%。 "Substantially" as used herein with reference to substantially separating a nanoparticle from a volatile oxime compound means the initial removal (reduction) of the nanoparticle composition by substantially separating the nanoparticle with the volatile cerium compound. At least 10, or at least 20, or at least 30, or at least 40, or at least 50, or at least 60, or at least 70, or at least 75, or at least 80, or at least 85, or at least 90% by weight. For example, a nanoparticle composition having a mass of 100 kg is assumed to depolymerize the siloxane material and substantially separate the nanoparticle with volatile hydrazine compounds and other by-products, including oxime monomers, oligomerization. After the article or polymer, the resulting composition has a mass of less than 100 kg, for example in an amount of only 10 kg, which corresponds to a 90% mass reduction. This can be readily measured by measuring the initial mass of the nanoparticle composition and the quality of the nanoparticle after substantially separating the nanoparticle from the volatile anthraquinone compound and any other by-products. This reduction also depends on the amount of nanoparticle in the nanoparticle composition, which can vary. For example, if the nanoparticulate composition comprises nanoparticles in an amount of 50% by weight based on the total weight of the nanoparticulate composition, the mass reduction will generally not exceed 50%.

可自已知方法實質上分離揮發性矽化合物與奈米顆粒。舉例而言,可藉助於蒸餾及/或除氣分離揮發性矽化合物與奈米顆粒。蒸餾 溫度及條件通常取決於藉助於解聚合矽氧烷材料產生之揮發性矽化合物及其沸點。 The volatile cerium compound and the nanoparticle can be substantially separated from known methods. For example, the volatile cerium compound and the nanoparticle can be separated by means of distillation and/or degassing. Distillation The temperature and conditions generally depend on the volatile rhodium compound produced by the depolymerization of the rhodium alkane material and its boiling point.

一旦奈米顆粒及揮發性矽化合物實質上分離,奈米顆粒及/或揮發性矽化合物可再用於或再循環於其他最終用途及應用中。舉例而言,奈米顆粒可取決於物理特性而包括於其他組合物中及用於許多最終用途中。揮發性矽化合物可經聚合以形成矽氧烷。 Once the nanoparticles and volatile hydrazine compounds are substantially separated, the nanoparticles and/or volatile hydrazine compounds can be reused or recycled for other end uses and applications. For example, nanoparticles can be included in other compositions and used in many end uses depending on physical properties. The volatile hydrazine compound can be polymerized to form a decane.

應理解所附申請專利範圍不限於表現描述於實施方式中之特定 化合物、組合物或方法(其可在屬於所附申請專利範圍之範疇之特定實施例之間改變)。就描述各種實施例之特定特徵或態樣在本文中所依賴之任何馬庫西組(Markush group)而言,可自獨立於所有其他馬庫西成員之各別馬庫西組之各成員獲得不同、特殊及/或出人意料的結果。可個別及/或組合地依賴馬庫西組之各成員且對屬於隨附申請專利範圍之範疇內的特定實施例提供足夠支持。 It should be understood that the scope of the appended claims is not limited to the particulars described in the embodiments. A compound, composition or method (which may vary between specific embodiments within the scope of the appended claims). For any Markush group on which the various features or aspects of the various embodiments are described, it can be obtained from each member of the respective Marcuse group independent of all other Markusi members. Different, special and/or unexpected results. Each member of the Markush group may be relied upon individually and/or in combination to provide sufficient support for a particular embodiment within the scope of the appended claims.

此外,在描述本發明之各種實施例中依賴的任何範圍及子範圍獨立地及共同地屬於所附申請專利範圍之範疇內,且理解為描述且涵蓋所有範圍,包括其中的整數值及/或分數值,即使該等值在本文中未明確寫出。熟習此項技術者易於識別所列舉之範圍及子範圍充分地描述並使得本發明之各種實施例能夠進行,且該等範圍及子範圍可進一步描述成相關的一半、三分之一、四分之一、五分之一等。僅舉一例而言,「0.1至0.9之(of from 0.1 to 0.9)」範圍可進一步描述為下三分之一(亦即0.1至0.3)、中三分之一(亦即0.4至0.6)及上三分之一(亦即0.7至0.9),其個別地且共同地屬於所附申請專利範圍之範疇內,且可單獨地及/或共同地依賴且對屬於所附申請專利範圍之範疇內的特定實施例提供足夠支持。另外,關於界定或修飾一個範圍之語言,諸如「至少」、「大於」、「小於」、「不超過」及其類似語言,應瞭解該等語言包括子範圍及/或上限或下限。作為另一實例,「至少10」之範圍本 質上包括至少10至35之子範圍、至少10至25之子範圍、25至35之子範圍等,且各子範圍可單獨地及/或共同地依賴且對所附申請專利範圍之範疇內的特定實施例提供足夠支持。最後,可依賴所揭示之範圍內之個別數目且對所附申請專利範圍之範疇內的特定實施例提供足夠支持。舉例而言,「1至9之」範圍包括各種個別整數,諸如3,以及包括小數點(或分率)之個別數字,諸如4.1,可依賴該等數字且對所附申請專利範圍之範疇內的特定實施例提供足夠支持。 In addition, any range and sub-ranges that are relied upon in the various embodiments of the present invention are intended to be within the scope of the appended claims. The fractional value, even if the equivalent is not explicitly written in this article. The scope and sub-ranges of the present invention are readily described and enabled by the skilled artisan, and the various embodiments of the invention can be practiced, and the scope and sub-ranges can be further described as related half, one third, and four. One, one fifth, etc. As an example, the "0.1 to 0.9" range can be further described as the lower third (ie 0.1 to 0.3), the middle third (ie 0.4 to 0.6) and The upper third (ie, 0.7 to 0.9), which is individually and collectively within the scope of the appended claims, and which may be individually and/or collectively dependent and within the scope of the appended claims Particular embodiments provide sufficient support. In addition, with respect to languages that define or modify a range, such as "at least", "greater than", "less than", "not exceeding", and the like, it is understood that the language includes sub-ranges and/or upper or lower limits. As another example, the scope of "at least 10" Qualitatively includes at least a range of 10 to 35 sub-ranges, a sub-range of at least 10 to 25, a sub-range of 25 to 35, etc., and each sub-range can be individually and/or collectively dependent and specific implementation within the scope of the appended claims The example provides sufficient support. Finally, it is possible to rely on individual numbers within the scope of the disclosure and to provide sufficient support for the specific embodiments within the scope of the appended claims. For example, the "1 to 9" range includes various individual integers, such as 3, and individual numbers including decimal points (or fractions), such as 4.1, which may depend on such numbers and are within the scope of the appended claims. Particular embodiments provide sufficient support.

以下實例意欲說明本發明且不以任何方式視為限制本發明之範疇。 The following examples are intended to illustrate the invention and are not intended to limit the scope of the invention in any way.

實例 Instance 實例1:Example 1:

藉由藉助於電漿製程產生奈米顆粒且直接捕獲或收集矽氧烷材料中之奈米顆粒而就地製備奈米顆粒組合物。特定言之,在前驅氣體中之額外Ar及H2之情況下,藉助於電漿反應器系統自以16sccm包含SiH4(Ar中之2體積%)之前驅氣體製備奈米顆粒。藉助於質量流量控制器將前驅氣體傳遞至反應器。 The nanoparticle composition is prepared in situ by producing nanoparticle by means of a plasma process and directly capturing or collecting the nanoparticles in the siloxane material. Specifically, in the case of additional Ar and H 2 in the precursor gas, nanoparticle was prepared by means of a plasma reactor system containing 16 % by volume of SiH 4 (2 vol% in Ar) precursor gas. The precursor gas is delivered to the reactor by means of a mass flow controller.

產生矽奈米顆粒且捕獲或收集於矽氧烷材料中以產生奈米顆粒組合物。矽氧烷材料包含聚二甲基矽氧烷流體。自電漿反應器系統移出奈米顆粒組合物且在潮濕烘箱中進行老化以增加奈米顆粒組合物之矽奈米顆粒之光致發光強度。 The nanoparticle is produced and captured or collected in a siloxane material to produce a nanoparticle composition. The oxoxane material comprises a polydimethyloxane fluid. The nanoparticle composition was removed from the plasma reactor system and aged in a humid oven to increase the photoluminescence intensity of the nanoparticle of the nanoparticle composition.

將5g奈米顆粒組合物及0.25g解聚合催化劑安置於圓底燒瓶中且經音波處理5分鐘。解聚合催化劑包含酸化黏土(蒙脫石)。燒瓶附接至旋轉蒸發器且在大氣壓下於85℃至90℃下旋轉2小時。施用真空且將溫度增加至145℃以蒸餾燒瓶之內容物約1小時。經一小時將溫度增加至約180℃,且於此溫度下再蒸餾燒瓶之內容物約15分鐘。蒸餾造成由矽氧烷材料,亦即聚二甲基矽氧烷流體之解聚合形成之揮發性矽 化合物與奈米顆粒之實質性分離。冷卻燒瓶之內容物且將甲苯安置於燒瓶中。使燒瓶之內容物經受音波浴且在用額外甲苯沖洗時藉助於細玻璃過濾器過濾。藉由旋轉蒸發移除甲苯以分離奈米顆粒。相比於初始奈米顆粒組合物,分離之奈米顆粒具有約90%之質量減小,其可歸因於矽氧烷材料之解聚合及奈米顆粒與揮發性矽化合物之實質性分離。當藉由UV輻射照射時,分離之奈米顆粒展示明亮的紅色光致發光。 5 g of the nanoparticle composition and 0.25 g of the depolymerization catalyst were placed in a round bottom flask and sonicated for 5 minutes. The depolymerization catalyst comprises acidified clay (montmorillonite). The flask was attached to a rotary evaporator and spun at 85 ° C to 90 ° C for 2 hours under atmospheric pressure. Vacuum was applied and the temperature was increased to 145 ° C to distill the contents of the flask for about 1 hour. The temperature was increased to about 180 ° C over one hour, and the contents of the flask were again distilled at this temperature for about 15 minutes. Distillation results in a volatile oxime formed by the depolymerization of a oxoxane material, ie a polydimethyl methoxy alkane fluid Substantial separation of the compound from the nanoparticles. The contents of the flask were cooled and toluene was placed in the flask. The contents of the flask were subjected to a sonic bath and filtered through a fine glass filter while flushing with additional toluene. The toluene particles were separated by removing the toluene by rotary evaporation. The isolated nanoparticle has a mass reduction of about 90% compared to the initial nanoparticle composition, which can be attributed to the depolymerization of the siloxane material and the substantial separation of the nanoparticle from the volatile cerium compound. When irradiated by UV radiation, the separated nanoparticles exhibit bright red photoluminescence.

實例2:Example 2:

以與實例1之奈米顆粒組合物相同之方式製備奈米顆粒組合物。 A nanoparticle composition was prepared in the same manner as the nanoparticle composition of Example 1.

5g奈米顆粒組合物、8.5g碳酸二甲酯、20g甲醇、17g均三甲苯及0.25g NaCl係安置於100mL巴爾(Parr)反應器容器中,隨後密封該反應器容器。將容器在600rpm下設定為固定且以N2淨化約10分鐘,在其之後重新密封容器。在攪拌下持續16小時加熱容器至約180℃以解聚合奈米顆粒組合物之矽氧烷材料以形成揮發性矽化合物。一旦容器冷卻且壓力減小至接近常壓,在容器上打開通氣閥且施用真空。將容器緩慢加熱至80℃且在乾冰冷阱下於燒瓶中收集包含揮發性矽化合物之餾出物。在蒸餾之後,量測容器之內容物,且經測定,藉助於蒸餾解聚合及移除約50重量%之液相,亦即矽氧烷材料。換言之,奈米顆粒實質上與由解聚合矽氧烷材料,亦即聚二甲基矽氧烷流體形成之揮發性矽化合物分離。 A 5 g nanoparticle composition, 8.5 g of dimethyl carbonate, 20 g of methanol, 17 g of mesitylene, and 0.25 g of NaCl were placed in a 100 mL Parr reactor vessel, and then the reactor vessel was sealed. The vessel was set at 600rpm and at a fixed N 2 purge for about 10 minutes, after which the container resealed. The vessel was heated to about 180 ° C for 16 hours with stirring to depolymerize the rhodium oxide material of the nanoparticle composition to form a volatile rhodium compound. Once the container is cooled and the pressure is reduced to near normal pressure, the vent valve is opened on the container and a vacuum is applied. The vessel was slowly heated to 80 ° C and a distillate containing volatile rhodium compounds was collected in a flask under a dry ice cold trap. After distillation, the contents of the vessel were measured and, by measurement, about 50% by weight of the liquid phase, i.e., the decane material, was depolymerized by distillation. In other words, the nanoparticles are substantially separated from the volatile ruthenium compound formed from the depolymerized siloxane material, i.e., the polydimethyl siloxane fluid.

已以說明方式描述本發明,且應瞭解已使用之術語意欲具有字語之描述而非限制性質。顯然,根據以上教示,本發明之許多修改及變化為可能的。可以與特定描述不同之方式來實踐本發明。 The present invention has been described in an illustrative manner, and it is understood that the terms that have been used are intended to have a Obviously many modifications and variations of the present invention are possible in the light of the teaching. The invention may be practiced otherwise than as specifically described.

10‧‧‧變頻RF放大器/VHF射頻電源 10‧‧‧Variable RF Amplifier/VHF RF Power Supply

11‧‧‧介電放電管/介電管/放電管/電漿產生腔室 11‧‧‧Dielectric discharge tube/dielectric tube/discharge tube/plasma generation chamber

12‧‧‧輝光放電/電漿 12‧‧‧Glow discharge/plasma

13‧‧‧電極組態/電極/尖端/多孔電極板 13‧‧‧Electrode configuration / electrode / tip / porous electrode plate

14‧‧‧電極/VHF射頻供電環/接地環/多孔電極板 14‧‧‧Electrode/VHF RF Power Supply Ring/Grounding Ring/Porous Electrode Plate

15‧‧‧較大抽真空反應器 15‧‧‧ Large vacuum reactor

16‧‧‧固體基板 16‧‧‧Solid substrate

Claims (15)

一種自矽氧烷材料回收奈米顆粒之方法,該方法包含:提供包含矽氧烷材料及奈米顆粒之奈米顆粒組合物;解聚合該奈米顆粒組合物之該矽氧烷材料以形成揮發性矽化合物;及實質上分離該等揮發性矽化合物與該等奈米顆粒以回收該等奈米顆粒。 A method for recovering nanoparticle from a decyl alkane material, the method comprising: providing a nanoparticle composition comprising a siloxane material and a nanoparticle; and depolymerizing the siloxane material of the nanoparticle composition to form Volatile hydrazine compound; and substantially separating the volatile hydrazine compounds from the nanoparticles to recover the nanoparticles. 如請求項1之方法,其中該矽氧烷材料係選自矽氧烷流體、矽氧烷凝膠、矽氧烷樹脂及矽氧烷彈性體。 The method of claim 1, wherein the oxoxane material is selected from the group consisting of a decane fluid, a decane gel, a decane resin, and a decane elastomer. 如請求項1之方法,其中該矽氧烷材料為矽氧烷流體。 The method of claim 1, wherein the decane material is a decane fluid. 如請求項1之方法,其中該奈米顆粒組合物之該等奈米顆粒係藉由電漿製程產生。 The method of claim 1, wherein the nanoparticles of the nanoparticle composition are produced by a plasma process. 如請求項1之方法,其中該奈米顆粒組合物係藉由以下方式來產生:在低壓反應器中形成奈米顆粒氣溶膠,其中該奈米顆粒氣溶膠包含存於氣體中之奈米顆粒,及將該奈米顆粒氣溶膠之該等奈米顆粒收集於矽氧烷流體中來產生該奈米顆粒組合物。 The method of claim 1, wherein the nanoparticle composition is produced by forming a nanoparticle aerosol in a low pressure reactor, wherein the nanoparticle aerosol comprises nanoparticle present in a gas And collecting the nanoparticle of the nanoparticle aerosol in a oxoxane fluid to produce the nanoparticle composition. 如請求項5之方法,其中該奈米顆粒組合物係藉由包含以下步驟之方法產生:在具有反應物氣體入口及其中具有孔口之出口之電漿反應器中,施用具有在約10至約500MHz範圍內之連續頻率及在約5至約1000W範圍內之耦合功率之預選VHF射頻至反應物氣體混合物以產生電漿,持續足以形成該奈米顆粒氣溶膠之時間,其中該反應物氣體混合物包含約0.1至約50體積%之第一前驅氣體及至少一種惰性氣體;及將該奈米顆粒氣溶膠之該等奈米顆粒收集於矽氧烷流體中以 產生該奈米顆粒組合物。 The method of claim 5, wherein the nanoparticle composition is produced by a process comprising the steps of: in a plasma reactor having a reactant gas inlet and an outlet having an orifice therein, the application has a ratio of about 10 to a preselected VHF radio frequency to reactant gas mixture having a continuous frequency in the range of about 500 MHz and a coupling power in the range of from about 5 to about 1000 W to produce a plasma for a time sufficient to form the nanoparticle aerosol, wherein the reactant gas The mixture comprises from about 0.1 to about 50% by volume of the first precursor gas and at least one inert gas; and the nanoparticles of the nanoparticle aerosol are collected in a helium alkane fluid The nanoparticle composition is produced. 如請求項5之方法,其中該奈米顆粒組合物係藉由包含以下步驟之方法產生:在該反應器中形成該奈米顆粒氣溶膠;將該奈米顆粒氣溶膠自該反應器引入至擴散泵中;在儲集器中加熱矽氧烷擴散泵流體以形成蒸氣且經由噴射組件傳送該蒸氣;經由噴嘴將該蒸氣發射至該擴散泵之腔室中且冷凝該蒸氣以形成冷凝物;使該冷凝物流回至該儲集器;將該氣溶膠之該等奈米顆粒捕獲於該冷凝物中;及將該等捕獲之奈米顆粒收集於該儲集器中以產生該奈米顆粒組合物。 The method of claim 5, wherein the nanoparticle composition is produced by a method comprising the steps of: forming the nanoparticle aerosol in the reactor; introducing the nanoparticle aerosol from the reactor to the reactor a diffusion pump in which a helium oxide diffusion pump fluid is heated to form a vapor and is delivered via a jetting assembly; the vapor is emitted into a chamber of the diffusion pump via a nozzle and the vapor is condensed to form a condensate; Returning the condensate stream to the reservoir; capturing the nanoparticles of the aerosol in the condensate; and collecting the captured nanoparticles in the reservoir to produce the nanoparticle combination. 如請求項1至7中任一項之方法,其中解聚合該矽氧烷材料包含在酸化黏土存在下加熱該矽氧烷材料。 The method of any one of claims 1 to 7, wherein depolymerizing the siloxane material comprises heating the oxoxane material in the presence of acidified clay. 如請求項1至7中任一項之方法,其中解聚合該矽氧烷材料包含在碳酸二烷基酯存在下加熱該矽氧烷材料。 The method of any one of claims 1 to 7, wherein the depolymerizing the siloxane material comprises heating the oxoxane material in the presence of a dialkyl carbonate. 如請求項1至7中任一項之方法,其中實質上分離該等揮發性矽化合物與該等奈米顆粒包含蒸餾該等揮發性矽化合物及該等奈米顆粒。 The method of any one of claims 1 to 7, wherein substantially separating the volatile cerium compounds from the nano sized particles comprises distilling the volatile cerium compounds and the nano sized particles. 如請求項1至7中任一項之方法,其中該奈米顆粒組合物之該等奈米顆粒為光致發光的。 The method of any one of claims 1 to 7, wherein the nanoparticles of the nanoparticle composition are photoluminescent. 如請求項11之方法,其中該等奈米顆粒具有小於5nm之平均直徑。 The method of claim 11, wherein the nanoparticles have an average diameter of less than 5 nm. 如請求項11之方法,其中該奈米顆粒組合物在約365nm之激發波長下具有至少1×106之光致發光強度。 The method according to item 11 of the request, wherein the nano particle composition has at least 1 × 10 6 of the optical luminescence intensity at an excitation wavelength of about 365nm. 如請求項11之方法,其中該奈米顆粒組合物在約365nm之激發波長下具有至少4%之量子效率。 The method of claim 11, wherein the nanoparticle composition has a quantum efficiency of at least 4% at an excitation wavelength of about 365 nm. 如請求項11之方法,其中該奈米顆粒組合物在270-500nm之激發波長下具有20至250之半高全寬發射。 The method of claim 11, wherein the nanoparticle composition has a full width at half maximum of 20 to 250 at an excitation wavelength of 270-500 nm.
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