TW201504215A - Method for producing pyridazine compound - Google Patents

Method for producing pyridazine compound Download PDF

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TW201504215A
TW201504215A TW103117275A TW103117275A TW201504215A TW 201504215 A TW201504215 A TW 201504215A TW 103117275 A TW103117275 A TW 103117275A TW 103117275 A TW103117275 A TW 103117275A TW 201504215 A TW201504215 A TW 201504215A
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TW103117275A
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Yasuyuki Nakae
Takayuki Wakamatsu
Takashi Miyamoto
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Sumitomo Chemical Co
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    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D237/00Heterocyclic compounds containing 1,2-diazine or hydrogenated 1,2-diazine rings
    • C07D237/02Heterocyclic compounds containing 1,2-diazine or hydrogenated 1,2-diazine rings not condensed with other rings
    • C07D237/06Heterocyclic compounds containing 1,2-diazine or hydrogenated 1,2-diazine rings not condensed with other rings having three double bonds between ring members or between ring members and non-ring members
    • C07D237/10Heterocyclic compounds containing 1,2-diazine or hydrogenated 1,2-diazine rings not condensed with other rings having three double bonds between ring members or between ring members and non-ring members with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached to ring carbon atoms
    • C07D237/12Halogen atoms or nitro radicals
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D237/00Heterocyclic compounds containing 1,2-diazine or hydrogenated 1,2-diazine rings
    • C07D237/02Heterocyclic compounds containing 1,2-diazine or hydrogenated 1,2-diazine rings not condensed with other rings
    • C07D237/06Heterocyclic compounds containing 1,2-diazine or hydrogenated 1,2-diazine rings not condensed with other rings having three double bonds between ring members or between ring members and non-ring members
    • C07D237/10Heterocyclic compounds containing 1,2-diazine or hydrogenated 1,2-diazine rings not condensed with other rings having three double bonds between ring members or between ring members and non-ring members with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached to ring carbon atoms
    • C07D237/14Oxygen atoms
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D237/00Heterocyclic compounds containing 1,2-diazine or hydrogenated 1,2-diazine rings
    • C07D237/02Heterocyclic compounds containing 1,2-diazine or hydrogenated 1,2-diazine rings not condensed with other rings
    • C07D237/06Heterocyclic compounds containing 1,2-diazine or hydrogenated 1,2-diazine rings not condensed with other rings having three double bonds between ring members or between ring members and non-ring members
    • C07D237/10Heterocyclic compounds containing 1,2-diazine or hydrogenated 1,2-diazine rings not condensed with other rings having three double bonds between ring members or between ring members and non-ring members with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached to ring carbon atoms
    • C07D237/18Sulfur atoms

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Low-Molecular Organic Synthesis Reactions Using Catalysts (AREA)
  • Plural Heterocyclic Compounds (AREA)

Abstract

A pyridazine compound represented by formula [1]: which is useful as an active ingredient of a plant disease control agent can be produced, by steps of obtaining a compound represented by formula [3]: by reacting a compound represented by formula [4]: with a compound represented by formula [5]: obtaining a compound represented by formula [2]: by deprotecting the compound [3]; and reacting the compound [2] with a chlorinating agent.

Description

嗒 化合物之製造方法嗒 How to make a compound

本發明是關於嗒化合物的製造方法,其製造中間產物,及該製造中間產物的製造方法 The present invention relates to 嗒 Method for producing compound, intermediate product thereof, and method for producing the intermediate product

在美國專利US7,569,518,記述式[1]表示的化合物等: 式中,X表示氫原子、氟原子、氯原子或甲基,及Y表示氫原子、氟原子、氯原子或甲基,該化合物有用於作為植物病害防治劑的活性成分,以及其有利的製造方法。 In U.S. Patent No. 7,569,518, the compound represented by the formula [1] is described: In the formula, X represents a hydrogen atom, a fluorine atom, a chlorine atom or a methyl group, and Y represents a hydrogen atom, a fluorine atom, a chlorine atom or a methyl group, and the compound has an active ingredient for use as a plant disease controlling agent, and an advantageous production thereof method.

再者,美國專利US2009/156608公開某類型的嗒化合物。 Furthermore, U.S. Patent No. 2009/156608 discloses certain types of defects. Compound.

本發明提供式[1]表示的嗒化合物的製造方法,其製造中間產物,及該製造中間產物的製造方法。 The present invention provides a crucible represented by the formula [1] A method for producing a compound, an intermediate product thereof, and a method for producing the intermediate product.

本發明更具體說明如下: The invention is more specifically described as follows:

«1»一種化合物[1]的製造方法,包含步驟:將式[4]表示的化合物與式[5]表示的化合物反應而得式[3]表示的化合物: 式中Q表示保護基其為視需要經鹵化之C1至C12烷基磺醯基、視需要經選自A群的至少一個原子或基團所取代的C6至C24芳基磺醯基、或其中在苯環上的至少一個氫原子視需要經選自B群的原子或基團所取代的苄基;X表示氫原子、鹵原子或甲基,及Y表示氫原子、鹵原子或甲基。(以下稱為化合物[3]);A群:視需要經鹵化的C1至C4烷氧基、鹵原子及硝基所成群組,B群:視需要經鹵化的C1至C4烷基、視需要經鹵化的C1至C4烷氧基、鹵原子及硝基所成群組; 式中R1表示視需要經鹵化的C1至C12烷基,或表示視需 要經選自A群之至少一個原子或基團所取代的C6至C24芳基,Q及Y有與上述相同的意義(以下稱為化合物[4]); 式中X與上述表示的相同意義,及Z表示氯原子或溴原子(以下稱為化合物[5]);由化合物[3]的脫保護而得式[2]表示的化合物: 式中X及Y有與上述相同的意義,(以下稱為化合物[2]);及化合物[2]與氯化劑反應而得式[1]表示的化合物: 式中X及Y有與上述相同的意義。(以下稱為化合物[1]) «1» A method for producing a compound [1], comprising the steps of: reacting a compound represented by the formula [4] with a compound represented by the formula [5] to obtain a compound represented by the formula [3]: Wherein Q represents a protecting group which is a C1 to C12 alkylsulfonyl group which is optionally halogenated, a C6 to C24 arylsulfonyl group which is optionally substituted with at least one atom or group selected from Group A, or At least one hydrogen atom on the benzene ring is optionally substituted with a benzyl group selected from an atom or group of the group B; X represents a hydrogen atom, a halogen atom or a methyl group, and Y represents a hydrogen atom, a halogen atom or a methyl group. (hereinafter referred to as compound [3]); Group A: a group of C1 to C4 alkoxy groups, a halogen atom and a nitro group which are halogenated as needed, Group B: C1 to C4 alkyl groups which are halogenated as needed, A halogenated C1 to C4 alkoxy group, a halogen atom and a nitro group are required; Wherein R 1 represents a C1 to C12 alkyl group which is optionally halogenated, or a C6 to C24 aryl group which is optionally substituted with at least one atom or group selected from Group A, and Q and Y have the same meanings as described above. (hereinafter referred to as compound [4]); Wherein X is the same as defined above, and Z represents a chlorine atom or a bromine atom (hereinafter referred to as compound [5]); and a compound represented by the formula [2] is obtained by deprotection of the compound [3]: In the formula, X and Y have the same meanings as described above (hereinafter referred to as the compound [2]); and the compound [2] is reacted with a chlorinating agent to obtain a compound represented by the formula [1]: In the formula, X and Y have the same meanings as described above. (hereinafter referred to as compound [1])

«2»一種製造化合物[1]的方法,包含下述步驟:將化合物[4]與化合物[5]反應而得化合物[3];及將化合物[3]與氧氯化磷混合並加熱混合物而得化合物[1]。 «2» A method for producing the compound [1], comprising the steps of: reacting the compound [4] with the compound [5] to obtain the compound [3]; and mixing the compound [3] with phosphorus oxychloride and heating the mixture And the compound [1].

«3»一種化合物[1]製造方法,包含下述步驟:係將式[4A]表示的化合物與化合物[5]反應而得式[3A]表示的化合物: 式中X及Y有與上述相同的意義,及Q1表示視需要經鹵化的C1至C12烷基磺醯基,或表示視需要經選自A群之至少一個原子或基團所取代的C6至C24芳基磺醯基,A群:視需要經鹵化的C1至C4烷氧基、鹵原子及硝基所成群組,(以下稱為化合物[3A]) 式中R1、Y及Q1有與上述相同的意義,(以下稱為化合物[4A]):及係將化合物[3A]與二級胺混合然後在該混合物添加氯化劑而得化合物[1]。 «3» A method for producing a compound [1], comprising the step of reacting a compound represented by the formula [4A] with a compound [5] to obtain a compound represented by the formula [3A]: Wherein X and Y have the same meanings as defined above, and Q 1 represents a C1 to C12 alkylsulfonyl group which is optionally halogenated, or a C6 which is optionally substituted with at least one atom or group selected from Group A. To C24 arylsulfonyl group, group A: a group of halogenated C1 to C4 alkoxy groups, a halogen atom and a nitro group as required (hereinafter referred to as compound [3A]) Wherein R 1 , Y and Q 1 have the same meanings as described above (hereinafter referred to as compound [4A]): and a compound [3A] is mixed with a secondary amine and then a chlorinating agent is added to the mixture to obtain a compound [ 1].

«4»化合物[3]。 «4» compound [3].

«5»一種化合物[3]的製造方法,係將化合物[4]與化合物[5]反應而得。 «5» A method for producing a compound [3] obtained by reacting a compound [4] with a compound [5].

«6»化合物[4]。 «6» compound [4].

第1圖是在參考例11所得型1的PXRD圖形。 Fig. 1 is a PXRD pattern of the type 1 obtained in Reference Example 11.

第2圖是在參考例11所得型1的DSC/TGA軌跡線。 Fig. 2 is a DSC/TGA trajectory of the type 1 obtained in Reference Example 11.

第3圖是在參考例12所得型2的PXRO圖形。 Fig. 3 is a PXRO pattern of the type 2 obtained in Reference Example 12.

第4圖是在參考例12所得型2的DSC/TGA軌跡線。 Fig. 4 is a DSC/TGA trajectory of the type 2 obtained in Reference Example 12.

第5圖是在參考例13所得型3的PXRO圖形。 Fig. 5 is a PXRO pattern of the type 3 obtained in Reference Example 13.

第6圖是在參考例13所得型3的OSC/TGA軌跡線。 Fig. 6 is an OSC/TGA trajectory of the type 3 obtained in Reference Example 13.

第7圖是型1至型3的PXRD圖形的重疊。 Figure 7 is an overlay of the PXRD patterns of Type 1 to Type 3.

以下,詳細說明本發明。 Hereinafter, the present invention will be described in detail.

本文中的鹵原子意指氟原子、氯原子、溴原子、以及碘原子而言。該等中,氯原子及氟原子為理想。 The halogen atom herein means a fluorine atom, a chlorine atom, a bromine atom, and an iodine atom. Among these, a chlorine atom and a fluorine atom are preferable.

本文中的視需要經鹵化的C1至C12烷基表示一基團,其中C1至C12烷基的至少一個氫原子視需要經鹵原子取代,且當有二個或更多的鹵原子取代時,該等鹵原子可以互不相同。視需要經鹵化的C1至C12烷基的實例包括甲基、乙基、丙基、異丙基、丁基、三級丁基、戊基、新戊基、1-乙基丙基、己基、庚基、辛基、壬基、癸基、十一基、十二基、異戊基、二級異戊基(1,2-二甲基丙基)、三級己基(2,3-二甲基-2-丁基)、環丙基、環己基、 2,2,2-三氯乙基、三氟甲基、五氟乙基、12-氯十二基、3,3-二氯-3-氟丙基,及二氯氟甲基。 The halogenated C1 to C12 alkyl group as used herein denotes a group in which at least one hydrogen atom of the C1 to C12 alkyl group is optionally substituted by a halogen atom, and when two or more halogen atoms are substituted, The halogen atoms may be different from each other. Examples of the C1 to C12 alkyl group which may be halogenated as needed include methyl group, ethyl group, propyl group, isopropyl group, butyl group, tert-butyl group, pentyl group, neopentyl group, 1-ethylpropyl group, hexyl group, Heptyl, octyl, decyl, decyl, undecyl, dodecyl, isopentyl, secondary isopentyl (1,2-dimethylpropyl), tertiary hexyl (2,3-di Methyl-2-butyl), cyclopropyl, cyclohexyl, 2,2,2-trichloroethyl, trifluoromethyl, pentafluoroethyl, 12-chlorododecyl, 3,3-dichloro-3-fluoropropyl, and dichlorofluoromethyl.

該等中,視需要經鹵化的C1至C4烷基為理想。 Among these, a halogenated C1 to C4 alkyl group is desirable as needed.

本文中的C1至C12烷基表示有1至12個碳原子的直鏈狀、支鏈狀或環狀烷基,該等的實例包括甲基、乙基、丙基、異丙基、丁基、三級丁基、戊基、新戊基、1-乙基丙基、己基、庚基、辛基、壬基、癸基、十一基、十二基、異戊基、二級異戊基(1,2-二甲基丙基)、三級己基、環丙基、環己基、環己基甲基、降莰基以及金剛烷基。該等中,C1至C4烷基為理想。 The C1 to C12 alkyl group herein represents a linear, branched or cyclic alkyl group having 1 to 12 carbon atoms, and examples thereof include a methyl group, an ethyl group, a propyl group, an isopropyl group, and a butyl group. , tertiary butyl, pentyl, neopentyl, 1-ethylpropyl, hexyl, heptyl, octyl, decyl, decyl, undecyl, dodecyl, isopentyl, secondary isoprene (1,2-dimethylpropyl), tertiary hexyl, cyclopropyl, cyclohexyl, cyclohexylmethyl, norbornyl and adamantyl. Among these, a C1 to C4 alkyl group is desirable.

本文中的視需要經鹵化的C1至C4烷基表示一基團其中C1至C4烷基的至少一個氫原子視需要經鹵原子取代,且當有二個或更多的鹵原子取代時,該鹵原子可以互不相同。視需要經鹵化的C1至C4烷基的實例包括甲基、乙基、丙基、異丙基、環丙基、丁基、三級丁基、2,2,2-三氯乙基、三氟甲基、五氟乙基、3,3-二氯-3-氟丙基、二氯氟甲基。 The halogenated C1 to C4 alkyl group as used herein denotes a group wherein at least one hydrogen atom of the C1 to C4 alkyl group is optionally substituted by a halogen atom, and when two or more halogen atoms are substituted, The halogen atoms can be different from each other. Examples of the C1 to C4 alkyl group which may be halogenated as needed include methyl group, ethyl group, propyl group, isopropyl group, cyclopropyl group, butyl group, tert-butyl group, 2,2,2-trichloroethyl group, and three groups. Fluoromethyl, pentafluoroethyl, 3,3-dichloro-3-fluoropropyl, dichlorofluoromethyl.

本文中的C1至C4烷基表示有1至4個碳原子的直鏈狀、支鏈狀或環狀烷基,該等的實例包括甲基、乙基、丙基、異丙基、環丙基、丁基及三級丁基。 The C1 to C4 alkyl group herein represents a linear, branched or cyclic alkyl group having 1 to 4 carbon atoms, and examples thereof include a methyl group, an ethyl group, a propyl group, an isopropyl group, and a cyclopropyl group. Base, butyl and tertiary butyl.

本文中的視需要經選自A群之至少一個原子或基團取代的C6至C24芳基表示一基團其中C6至C24芳基的至少一個氫原子視需要經選自A群原子或基團所取 代,且當有二個或更多的原子或基團取代時,該原子或基團可以互不相同。視需要經取代的C6至C24芳基的實例包括苯基、甲苯基、硝苯基、氯苯基、茴香基,氯氟苯基、二甲氧基苯基、五氟苯基、三氟苯基、三氟甲基苯基、三氟甲氧基苯基及氯三苯基。該等中,視需要經取代的C6至C14芳基為理想,而特別是視需要經取代的苯基為理想。 The C6 to C24 aryl group as used herein, optionally substituted with at least one atom or group selected from Group A, represents a group wherein at least one hydrogen atom of the C6 to C24 aryl group is optionally selected from Group A atoms or groups. Take Generation, and when two or more atoms or groups are substituted, the atoms or groups may be different from each other. Examples of the C6 to C24 aryl group which may be optionally substituted include phenyl, tolyl, nitrophenyl, chlorophenyl, anisyl, chlorofluorophenyl, dimethoxyphenyl, pentafluorophenyl, trifluorobenzene. Base, trifluoromethylphenyl, trifluoromethoxyphenyl and chlorotriphenyl. Among these, a substituted C6 to C14 aryl group is desirable as desired, and a phenyl group which is optionally substituted, as desired, is preferred.

本文中的芳基表示由芳香烴的芳香環除去一個氫原子的取代基,且碳數表示包括直接鍵結至芳香環的烷基。 The aryl group herein means a substituent which removes one hydrogen atom from the aromatic ring of the aromatic hydrocarbon, and the carbon number means an alkyl group which is directly bonded to the aromatic ring.

本文中的C6至C24芳基表示有6至24個碳原子的單環型或多環型芳基,且這些環可以縮合(condensed)。C6至C24芳基的實例包括苯基、甲苯基、2,4,6-三甲苯基(mesityl group)、萘基、聯苯基、蒽基、芘基、三苯基、聯萘基、聯三苯基(terphenyl group)、聯四苯基、3',5'-二苯基聯苯基、二氫茚基(indanyl group)、及二-三級丁基苯基。該等中,C6至C14芳基為理想。 The C6 to C24 aryl group herein means a monocyclic or polycyclic aryl group having 6 to 24 carbon atoms, and these rings may be condensed. Examples of the C6 to C24 aryl group include a phenyl group, a tolyl group, a mesityl group, a naphthyl group, a biphenyl group, a fluorenyl group, a decyl group, a triphenyl group, a binaphthyl group, and a phenyl group. Terphenyl group, tetraphenylene, 3',5'-diphenylbiphenyl, indanyl group, and di-tertiary butylphenyl. Among these, the C6 to C14 aryl group is ideal.

本文中的其中至少一個氫原子視需要經選自A群的原子或基團所取代的C6至C14芳基表示一基團其中C6至C14芳基的至少一個氫原子視需要經選自A群的原子或基團所取代,當有二個或更多的原子或基團取代時,該等原子或基團可以互不相同。視需要經取代的C6至C14芳基的實例包括苯基、甲苯基、氯苯基、茴香基及氯氟苯基。 The C6 to C14 aryl group in which at least one hydrogen atom is optionally substituted with an atom or a group selected from the group A represents a group wherein at least one hydrogen atom of the C6 to C14 aryl group is optionally selected from the group A. Substituted by an atom or group, when two or more atoms or groups are substituted, the atoms or groups may be different from each other. Examples of the C6 to C14 aryl group which may be optionally substituted include a phenyl group, a tolyl group, a chlorophenyl group, an anisyl group, and a chlorofluorophenyl group.

本文中的C6至C14芳基表示有6至14個碳 原子的單環型或多環型芳基,且該等的環可以縮合。C6至C14芳基的實例包括苯基、甲苯基、萘基、聯苯基、二氫茚基(indanyl group),及二-三級丁基苯基。該等中,以苯基、4-甲苯基為理想。 The C6 to C14 aryl group herein means 6 to 14 carbons A monocyclic or polycyclic aryl group of atoms, and such rings may be condensed. Examples of the C6 to C14 aryl group include a phenyl group, a tolyl group, a naphthyl group, a biphenyl group, an indanyl group, and a di-tertiary butylphenyl group. Among these, a phenyl group and a 4-tolyl group are preferred.

本文中的視需要經鹵化的C1至C12烷基磺醯基表示一基團,其中C1至C12的烷基磺醯基的至少一個氫原子視需要經鹵原子取代,且當有二個或更多的鹵原子取代時,該鹵原子可以互不相同。視需要經鹵化的C1至C12烷基磺醯基的實例包括甲基磺醯基、環己基磺醯基、三氟甲基磺醯基、2,2,2-三氯乙基磺醯基、五氟乙基磺醯基、3,3-二氯-3-氟丙基磺醯基、12-氯十二基磺醯基。該等中,視需要經鹵化的C1至C4烷基磺醯基為理想。 The halogenated C1 to C12 alkylsulfonyl group as used herein denotes a group in which at least one hydrogen atom of the C1 to C12 alkylsulfonyl group is optionally substituted by a halogen atom, and when there are two or more When a plurality of halogen atoms are substituted, the halogen atoms may be different from each other. Examples of the C1 to C12 alkylsulfonyl group which may be halogenated as needed include methylsulfonyl, cyclohexylsulfonyl, trifluoromethylsulfonyl, 2,2,2-trichloroethylsulfonyl, Pentafluoroethylsulfonyl, 3,3-dichloro-3-fluoropropylsulfonyl, 12-chlorododecylsulfonyl. Among these, a halogenated C1 to C4 alkylsulfonyl group is desirable as needed.

本文中的C1至C12烷基磺醯基表示有1至12個碳原子的直鏈狀、支鏈狀或環狀烷基磺醯基,且該等的實例包括甲基磺醯基、乙基磺醯基、丙基磺醯基、三級丁基磺醯基、戊基磺醯基基、己基磺醯基、庚基磺醯基、辛基磺醯基、壬基磺醯基、癸基磺醯基、十一基磺醯基、十二基磺醯基、異戊基磺醯基、二級異戊基磺醯基、三級己基磺醯基、環丙基磺醯基、環己基磺醯基、環己基甲基磺醯基、降莰基磺醯基以及金剛烷基磺醯基。該等中,以C1至C4烷基磺醯基為理想。 The C1 to C12 alkylsulfonyl group herein means a linear, branched or cyclic alkylsulfonyl group having 1 to 12 carbon atoms, and examples thereof include a methylsulfonyl group and an ethyl group. Sulfonyl, propylsulfonyl, tert-butylsulfonyl, pentylsulfonyl, hexylsulfonyl, heptylsulfonyl, octylsulfonyl, fluorenylsulfonyl, fluorenyl Sulfonyl, eleven sulfonyl, dodecylsulfonyl, isopentylsulfonyl, second isopentylsulfonyl, tertiary hexylsulfonyl, cyclopropylsulfonyl, cyclohexyl Sulfonyl, cyclohexylmethylsulfonyl, norbornylsulfonyl and adamantylsulfonyl. Among these, a C1 to C4 alkylsulfonyl group is preferred.

本文中的視需要經鹵化的C1至C4烷基磺醯基表示一基團其中該C1至C4烷基磺醯基的至少一個氫原子視需要經鹵原子取代,且當有二個或更多的鹵原子取 代時,該等鹵原子可以互不相同。視需要經鹵化的C1至C4烷基磺醯基的實例包括甲基磺醯基、乙基磺醯基、環丙基磺醯基、三氟甲基磺醯基、2,2,2-三氯乙基磺醯基,及五氟乙基磺醯基。該等中,甲基磺醯基、乙基磺醯基及三氟甲基磺醯基為理想。 The halogenated C1 to C4 alkylsulfonyl group as used herein denotes a group wherein at least one hydrogen atom of the C1 to C4 alkylsulfonyl group is optionally substituted by a halogen atom, and when there are two or more Halogen atom In the meantime, the halogen atoms may be different from each other. Examples of the C1 to C4 alkylsulfonyl group which may be halogenated as needed include methylsulfonyl, ethylsulfonyl, cyclopropylsulfonyl, trifluoromethylsulfonyl, 2, 2, 2-tri Chloroethylsulfonyl, and pentafluoroethylsulfonyl. Among these, a methylsulfonyl group, an ethylsulfonyl group, and a trifluoromethylsulfonyl group are preferable.

本文中的C1至C4烷基磺醯基表示有1至4個碳原子的直鏈狀、支鏈狀或環狀烷基磺醯基,且該等的實例包括甲基磺醯基、乙基磺醯基、丙基磺醯基、環丙基磺醯基及三級丁基磺醯基。 The C1 to C4 alkylsulfonyl group herein means a linear, branched or cyclic alkylsulfonyl group having 1 to 4 carbon atoms, and examples thereof include a methylsulfonyl group and an ethyl group. Sulfosyl, propylsulfonyl, cyclopropylsulfonyl and tert-butylsulfonyl.

本文中的視需要經選自A群的至少一個原子或基團所取代的C6至C24芳基磺醯基,表示C6至C24芳基磺醯基其中該C6至C24芳基磺醯基之至少一個氫原子視需要經選自A群選的原子或基團所取代,當取代的原子或基團有二個或更多時,該等的原子或基團可以互不相同。視需要經取代的C6至C24芳基磺醯基的實例包括苯基磺醯基、甲苯基磺醯基、萘基磺醯基、2,4,6-三甲苯基(mesityl group)磺醯基、聯苯基磺醯基、蒽基磺醯基,芘基磺醯基、聯三苯基磺醯基,聯萘基磺醯基、聯四苯基磺醯基、3',5'-二苯基聯苯基磺醯基、硝苯基磺醯基、氯苯基磺醯基、茴香基磺醯基、氯氟苯基磺醯基、二甲氧基苯基磺醯基、五氟苯基磺醯基、三氟甲基苯基磺醯基、三氟甲氧基苯基磺醯基及氯聯三苯基磺醯基。該等中,視需要經取代的C6至C14芳基磺醯基為理想,而特別是視需要經取代的苯基磺醯基為理想。 The C6 to C24 arylsulfonyl group, optionally substituted by at least one atom or group selected from Group A, represents a C6 to C24 arylsulfonyl group, wherein the C6 to C24 arylsulfonyl group is at least A hydrogen atom may be optionally substituted with an atom or group selected from Group A. When two or more substituted atoms or groups are present, the atoms or groups may be different from each other. Examples of the C6 to C24 arylsulfonyl group which may be optionally substituted include a phenylsulfonyl group, a tolylsulfonyl group, a naphthylsulfonyl group, a 2,4,6-trimethylol group (mesityl group). , biphenylsulfonyl, fluorenylsulfonyl, fluorenylsulfonyl, triphenylsulfonyl, binaphthylsulfonyl, tetraphenylsulfonyl, 3', 5'-di Phenylbiphenylsulfonyl, nitrophenylsulfonyl, chlorophenylsulfonyl, anisylsulfonyl, chlorofluorophenylsulfonyl, dimethoxyphenylsulfonyl, pentafluorobenzene Sulfosyl, trifluoromethylphenylsulfonyl, trifluoromethoxyphenylsulfonyl and chlorotriphenylsulfonyl. Among these, a substituted C6 to C14 arylsulfonyl group is desirable as desired, and particularly a substituted phenylsulfonyl group is desirable.

本文中的C6至C24芳磺醯基表示有6至24個碳原子的單環型或多環型芳基磺醯基,而該等的環可以縮合。C6至C24芳基磺醯基的實例包括苯基磺醯基、甲苯基磺醯基、萘基磺醯基、聯苯基磺醯基、蒽磺醯基、芘基磺醯基、聯三苯基磺醯基、聯萘基磺醯基、聯四苯基磺醯基、3',5'-二苯基聯苯基磺醯基、二氫茚基(indanyl group)磺醯基及二-三級丁基苯基磺醯基。該等中,以C6至C14芳基磺醯基為理想。 The C6 to C24 arylsulfonyl group herein means a monocyclic or polycyclic arylsulfonyl group having 6 to 24 carbon atoms, and the rings may be condensed. Examples of the C6 to C24 arylsulfonyl group include a phenylsulfonyl group, a tolylsulfonyl group, a naphthylsulfonyl group, a biphenylsulfonyl group, a sulfonyl group, a mercaptosulfonyl group, a terphenyl group. Sulfosyl, dinaphthylsulfonyl, tetraphenylsulfonyl, 3',5'-diphenylbiphenylsulfonyl, indanyl group, sulfonyl and di- Tert-butyl phenyl sulfonyl. Among these, a C6 to C14 arylsulfonyl group is preferred.

本文中的視需要經選自A群的至少一個原子或基團所取代的C6至C14芳基磺醯基表示C6至C14芳基磺醯基其中該C6至C14芳基磺醯基之至少一個氫原子視需要經選自A群之原子或基團所取代,且當有二個或更多的原子或基團取代時,該等的原子或基團可以互不相同。 The C6 to C14 arylsulfonyl group as used herein, optionally substituted with at least one atom or group selected from Group A, represents a C6 to C14 arylsulfonyl group wherein at least one of the C6 to C14 arylsulfonyl groups The hydrogen atom may be optionally substituted with an atom or group selected from Group A, and when two or more atoms or groups are substituted, the atoms or groups may be different from each other.

視需要經取代的C6至C14芳基磺醯基的實例包括苯基磺醯基、甲苯基磺醯基、萘基磺醯基、硝苯基磺醯基、氯苯基磺醯基、茴香基磺醯基、氯氟苯基磺醯基、二甲氧基苯基磺醯基、五氟苯基磺醯基、三氟甲基苯基磺醯基及三氟甲氧基苯基磺醯基。該等中,以苯基磺醯基及4-甲苯基磺醯基為理想。 Examples of the C6 to C14 arylsulfonyl group which may be optionally substituted include a phenylsulfonyl group, a tolylsulfonyl group, a naphthylsulfonyl group, a nitrophenylsulfonyl group, a chlorophenylsulfonyl group, an anisyl group. Sulfonyl, chlorofluorophenylsulfonyl, dimethoxyphenylsulfonyl, pentafluorophenylsulfonyl, trifluoromethylphenylsulfonyl and trifluoromethoxyphenylsulfonyl . Among these, a phenylsulfonyl group and a 4-tolylsulfonyl group are preferred.

本文中的C6至C14芳基磺醯基表示有6至14個碳原子的單環型或多環型芳基磺醯基,且該等的環可以縮合。C6至C14芳基磺醯基的實例包括苯基磺醯基、甲苯基磺醯基、萘基磺醯基、聯苯基磺醯基、二氫茚基(indanyl group)磺醯基,及二-三級丁基苯基磺醯基。該等中,苯基 磺醯基及4-甲苯基磺醯基為理想。 The C6 to C14 arylsulfonyl group herein means a monocyclic or polycyclic arylsulfonyl group having 6 to 14 carbon atoms, and the rings may be condensed. Examples of the C6 to C14 arylsulfonyl group include a phenylsulfonyl group, a tolylsulfonyl group, a naphthylsulfonyl group, a biphenylsulfonyl group, an indanyl group, a sulfonyl group, and - Tert-butylphenylsulfonyl. Among these, phenyl Sulfonyl and 4-tolylsulfonyl are desirable.

本文中其中苯環的至少一個氫原子視需要經選自B群選出的原子或基團所取代的苄基,表示一苄基其中苯環的至少一個氫原子視需要經選自B群選出的原子或基團所取代,且當有二個或更多的原子或基團取代時,該等原子或基團可以互不相同。視需要經取代的苄基的實例包括苄基、甲苯基甲基(甲基苄基)、氯苯基甲基(氯苄基)、茴香基甲基(甲氧基苄基)、二甲氧基苯基甲基(二甲氧基苄基)、硝苯基甲基(硝苄基)、三氟甲基苯基甲基(三氟甲基苄基)、環丙氧基苯基甲基、(2,2-二氯環丙氧基)苯基甲基、及三氟甲氧基苯基甲基(三氟甲氧基苄基)。該等中,以苄基、甲苯基甲基、氯苯基甲基以及茴香基甲基為理想,且以苄基及4-茴香基甲基特別理想。 Herein, at least one hydrogen atom of the benzene ring is optionally substituted with a benzyl group selected from the group or group selected from the group B, and represents a benzyl group in which at least one hydrogen atom of the benzene ring is optionally selected from the group B. An atom or group is substituted, and when two or more atoms or groups are substituted, the atoms or groups may be different from each other. Examples of the optionally substituted benzyl group include a benzyl group, a tolylmethyl group (methylbenzyl group), a chlorophenylmethyl (chlorobenzyl group), an anisylmethyl group (methoxybenzyl group), and a dimethoxy group. Phenylmethyl (dimethoxybenzyl), nitrophenylmethyl (nitrobenzyl), trifluoromethylphenylmethyl (trifluoromethylbenzyl), cyclopropoxyphenylmethyl (2,2-Dichlorocyclopropoxy)phenylmethyl, and trifluoromethoxyphenylmethyl (trifluoromethoxybenzyl). Among these, benzyl, tolylmethyl, chlorophenylmethyl and anisylmethyl are preferred, and benzyl and 4-anisylmethyl are particularly preferred.

本文中的視需要經鹵化的C1至C4烷氧基表示具有1至4個碳原子的直鏈狀、支鏈狀或環狀烷氧基的至少一個氫原子視需要經鹵原子所取代,且當有二個或更多的鹵原子取代時,該等鹵原子可以互不相同。具有1至4個碳原子的直鏈狀、支鏈狀或環狀烷氧基的實例包括甲氧基、乙氧基、丙氧基、異丙氧基、環丙氧基、丁氧基及三級丁氧基,視需要經鹵化的C1至C4烷氧基的實例包括甲氧基、2,2,2-三氯乙氧基、三氟甲氧基、乙氧基、丙氧基、異丙氧基、2,2-二氯環丙氧基、丁氧基、三級-丁氧基、五氟乙氧基及3,3-二氯-3-氟丙氧基。 The halogenated C1 to C4 alkoxy group as used herein means that at least one hydrogen atom of a linear, branched or cyclic alkoxy group having 1 to 4 carbon atoms is optionally substituted by a halogen atom, and When two or more halogen atoms are substituted, the halogen atoms may be different from each other. Examples of the linear, branched or cyclic alkoxy group having 1 to 4 carbon atoms include a methoxy group, an ethoxy group, a propoxy group, an isopropoxy group, a cyclopropoxy group, a butoxy group, and Examples of the tertiary butoxy group, optionally halogenated C1 to C4 alkoxy groups include methoxy, 2,2,2-trichloroethoxy, trifluoromethoxy, ethoxy, propoxy, Isopropoxy, 2,2-dichlorocyclopropoxy, butoxy, tert-butoxy, pentafluoroethoxy and 3,3-dichloro-3-fluoropropoxy.

氯化劑的實例包括氧氯化磷、三氯化磷、 五氯化磷、硫醯氯、亞硫醯氯、光氣及該等的混合物,而該等中以氧氯化磷為理想。 Examples of the chlorinating agent include phosphorus oxychloride, phosphorus trichloride, Phosphorus pentachloride, sulphur sulphur chloride, sulphur sulphur chloride, phosgene and mixtures thereof, and phosphorus oxychloride is preferred.

本文中的二級胺表示二級鏈胺及二級環胺,而二級鏈胺包括二甲胺、二乙胺、二異丙胺等,而二級環胺包括吡咯啶、哌啶、嗎啉,及在氮原子上未經取代的唑咯(例如,咪唑、1,2,4-三唑)。該等中,以二級環胺為理想,而哌啶及嗎啉特別理想。 The secondary amine herein refers to a secondary chain amine and a secondary cyclic amine, while the secondary chain amine includes dimethylamine, diethylamine, diisopropylamine, etc., and the secondary cyclic amine includes pyrrolidine, piperidine, morpholine. And an azole (e.g., imidazole, 1,2,4-triazole) which is unsubstituted on a nitrogen atom. Among these, a secondary cyclic amine is preferred, and piperidine and morpholine are particularly preferred.

化合物[1]的具體例包括下述化合物:式[1]的化合物,其中的X及Y各為氫原子。 Specific examples of the compound [1] include the following compounds: a compound of the formula [1] wherein each of X and Y is a hydrogen atom.

化合物[2]的具體例包括下述化合物:式[2]的化合物,其中的X及Y各為氫原子。 Specific examples of the compound [2] include the following compounds: a compound of the formula [2] wherein each of X and Y is a hydrogen atom.

化合物[3]的具體例包括下述化合物:式[3]的化合物,其中的X及Y各為氫原子;式[3]的化合物,其中Q是C6至C24芳基磺醯基,其中至少一個氫原子視需要經選自A群的原子或基團所取代,或苄基,其中苯環的至少一個氫原子視需要經選自B群原子或基團所取代;式[3]的化合物,其中的Q是C6至C24芳基磺醯基或苄基;式[3]的化合物,其中的Q是C6至C14芳基磺醯基或苄基;式[3]的化合物,其中的Q是4-甲苯基磺醯基,苯基磺醯基或苄基;式[3]的化合物,其中的Q是4-甲苯基磺醯 基或苯基磺醯基;式[3]的化合物,其中的Q是4-甲苯基磺醯基;式[3]的化合物,其中的Q是苯基磺醯基;式[3]的化合物,其中的Q是苄基;式[3]的化合物,其中的X及Y各為氫原子,而Q是C6至C24芳基磺醯基,其中至少一個氫原子視需要經選自A群的原子或基團所取代,或苄基,其中在苯環的至少一個氫原子視需要經選自B群的原子或基團所取代;式[3]的化合物,其中的X及Y各為氫原子,而Q是C6至C24芳基磺醯基或苄基;式[3]的化合物,其中的X及Y各為氫原子,而Q是C6至C14芳基磺醯基或苄基;式[3]的化合物,其中的X及Y各為氫原子,而Q是4-甲苯基磺醯基、苯基磺醯基或苄基;式[3]的化合物,其中的X及Y各為氫原子,而Q是4-甲苯基磺醯基或苯基磺醯基;式[3]的化合物,其中的X及Y各為氫原子,而Q是苯基磺醯基;式[3]的化合物,其中的X及Y各為氫原子,而Q是4-甲苯基磺醯基;式[3]的化合物,其中的X及Y各為氫原子,而Q是苄基;式[3]的化合物,其中的X是氟原子,Y是氫原子,而Q是苯基磺醯基; 式[3]的化合物,其中的X是氟原子,Y是氫原子,而Q是4-甲苯基磺醯基;式[3]的化合物,其中的X是氟原子,Y是氫原子,而Q是苄基;式[3]的化合物,其中的X是氟原子,Y是氯原子,而Q是4-甲苯基磺醯基;式[3]的化合物,其中的X是氫原子,Y是氯原子,而Q是苄基;化合物[4]的具體例包括下述化合物:式[4]的化合物,其中的Y是氫原子;式[4]的化合物,其中的R1是C1至C12烷基,其中至少一個氫原子視需要經鹵原子取代,或C6至C24芳基,其中至少一個氫原子視需要經選自A群的原子或基團所取代;式[4]的化合物,其中的R1是C1至C12烷基或C6至C24;式[4]的化合物,其中的R1是C1至C6烷基,其中至少一個氫原子視需要經鹵原子取代,或C6至C14芳基,其中至少一個氫原子視需要經選自A群的原子或基團所取代;式[4]的化合物,其中的R1是C1至C6烷基或C6至C14芳基;式[4]的化合物,其中的R1是甲基、苯基或4-甲苯基; 式[4]的化合物,其中的R1是甲基;式[4]的化合物,其中的Q是4-甲苯基磺醯基;式[4]的化合物,其中的R1是甲基,而Q是苯基磺醯基;式[4]的化合物,其中的R1是甲基,而Q是4-甲苯基磺醯基;式[4]的化合物,其中的Y是氫原子,Q是C6至C24芳基磺醯基,其中至少一個氫原子視需要經選自A群的原子或基團所取代,或苄基,其中在苯環的至少一個氫原子視需要經選自B群的原子或基團所取代,而R1是視需要經鹵化的C1至C6烷基,或C6至C24芳基,其中至少一個氫原子視需要經選A群的原子或基團所取代;式[4]的化合物,其中的Y是氫原子,Q是C6至C24芳基磺醯基或苄基,而R1是C1至C6烷基或C6至C24芳基;式[4]的化合物,其中的Y是氫原子,Q是C6至C14芳基磺醯基或苄基,而R1是C1至C6烷基或C6至C14芳基;式[4]的化合物,其中的Y是氫原子,Q是4-甲苯基磺醯基或苄基,而R1是甲基,苯基或4-甲苯基;式[4]的化合物,其中的Y是氫原子,Q是C6至C24芳基磺醯基,其中至少一個氫原子視需要經選自A群的原子或基團所取代,而R1是視需要經鹵化的C1至C6烷基;式[4]的化合物,其中的Y是氫原子,Q是C6至C24 芳基磺醯基,而R1是C1至C6烷基;式[4]的化合物,其中的Y是氫原子,Q是C6至C14芳基磺醯基,而R1是C1至C6烷基;式[4]的化合物,其中的Y是氫原子,Q是4-甲苯基磺醯基,而R1是甲基;式[4]的化合物,其中的Y是氫原子,Q是苄基,其中的苯環上的至少一個氫原子視需要經選自B群的原子或基團所取代,而R1是C6至C24芳基,其中至少一個氫原子視需要經選自A群的原子或基團所取代;式[4]的化合物,其中的Y是氫原子,Q是苄基,而R1是C6至C24芳基;式[4]的化合物,其中的Y是氫原子,Q是苄基,而R1是C6至C14芳基;式[4]的化合物,其中的Y是氫原子,Q是苄基,而R1是苯基或4-甲苯基;式[4]的化合物化合物,其中的R1是苯基;式[4]的化合物,其中的R1是苯基,而Q是4-甲苯基磺醯基;式[4]的化合物,其中的R1是苯基或4-甲苯基,而Q是苄基;式[4]的化合物,其中的R1是苯基,而Q是苄基;式[4]的化合物,其中的Y是氫原子,而Q是苄基;式[4]的化合物,其中的Y是氫原子,Q是4-甲苯基磺 醯基,而R1是苯基;式[4]的化合物,其中的R1是甲基,Y是氯原子,而Q是4-甲苯基磺醯基;式[4]的化合物,其中的R1是甲基,Y是氫原子,而Q是苄基;式[4]的化合物,其中的R1是甲基,Y是氫原子,而Q是苯基磺醯基;式[4]的化合物,其中的R1是甲基,Y是氫原子,而Q是4-甲苯基磺醯基;式[4]的化合物,其中的R1是苯基,Y是氯原子,而Q是4-甲苯基磺醯基;式[4]的化合物,其中的R1是苯基,Y是氫原子,而Q是苄基;式[4]的化合物,其中的R1是苯基,Y是氫原子,而Q是苯基磺醯基;式[4]的化合物,其中的R1是苯基,Y是氫原子,而Q是4-甲苯基磺醯基;化合物[5]的具體例包括下述化合物:式[5]的化合物,其中的X是氫原子;其次,說明本發明的方法的各步驟。在各式中的代號都具有與上述相同的意義。 Specific examples of the compound [3] include the following compounds: a compound of the formula [3] wherein each of X and Y is a hydrogen atom; a compound of the formula [3], wherein Q is a C6 to C24 arylsulfonyl group, at least A hydrogen atom is optionally substituted with an atom or group selected from Group A, or a benzyl group, wherein at least one hydrogen atom of the benzene ring is optionally substituted with a group of atoms or groups selected from Group B; a compound of the formula [3] Wherein Q is a C6 to C24 arylsulfonyl or benzyl group; a compound of the formula [3] wherein Q is a C6 to C14 arylsulfonyl or benzyl group; a compound of the formula [3] wherein Q Is a 4-tolylsulfonyl group, a phenylsulfonyl group or a benzyl group; a compound of the formula [3] wherein Q is a 4-tolylsulfonyl group or a phenylsulfonyl group; a compound of the formula [3], Wherein Q is a 4-tolylsulfonyl group; a compound of the formula [3], wherein Q is a phenylsulfonyl group; a compound of the formula [3], wherein Q is a benzyl group; a compound of the formula [3], Wherein X and Y are each a hydrogen atom, and Q is a C6 to C24 arylsulfonyl group, wherein at least one hydrogen atom is optionally substituted with an atom or group selected from Group A, or a benzyl group, wherein the benzene ring At least one hydrogen atom It is required to be substituted with an atom or a group selected from Group B; wherein the X and Y are each a hydrogen atom, and Q is a C6 to C24 arylsulfonyl or benzyl group; And a compound of the formula [3] wherein X and Y are each a hydrogen atom, and Q is 4- A tolylsulfonyl group, a phenylsulfonyl group or a benzyl group; a compound of the formula [3] wherein each of X and Y is a hydrogen atom, and Q is a 4-tolylsulfonyl group or a phenylsulfonyl group; A compound according to [3], wherein X and Y are each a hydrogen atom, and Q is a phenylsulfonyl group; a compound of the formula [3] wherein X and Y are each a hydrogen atom, and Q is a 4-tolylsulfonate. A compound of the formula [3], wherein X and Y are each a hydrogen atom, and Q is a benzyl group; a compound of the formula [3] wherein X is a fluorine atom, Y is a hydrogen atom, and Q is a phenyl group. A sulfonyl group; a compound of the formula [3], wherein X is a fluorine atom, Y is a hydrogen atom, and Q is a 4-tolylsulfonyl group; a compound of the formula [3], wherein X is a fluorine atom, and Y is a hydrogen atom, and Q is a benzyl group; a compound of the formula [3] wherein X is a fluorine atom and Y is a chlorine atom And Q is a 4-tolylsulfonyl group; a compound of the formula [3] wherein X is a hydrogen atom, Y is a chlorine atom, and Q is a benzyl group; and specific examples of the compound [4] include the following compounds: a compound of 4, wherein Y is a hydrogen atom; a compound of the formula [4], wherein R 1 is a C1 to C12 alkyl group, wherein at least one hydrogen atom is optionally substituted by a halogen atom, or a C6 to C24 aryl group, wherein At least one hydrogen atom is optionally substituted with an atom or group selected from Group A; wherein R 1 is a C1 to C12 alkyl group or C6 to C24; a compound of the formula [4], wherein R 1 is a C1 to C6 alkyl group, wherein at least one hydrogen atom is optionally substituted by a halogen atom, or a C6 to C14 aryl group, wherein at least one hydrogen atom is optionally substituted with an atom or group selected from Group A; a compound according to 4, wherein R 1 is a C1 to C6 alkyl group or a C6 to C14 aryl group; a compound of the formula [4], wherein R 1 is a methyl group, a phenyl group or a 4-tolyl group; A compound wherein R 1 is methyl; a compound of the formula [4], wherein Q is 4-tolylsulfonyl; a compound of the formula [4], wherein R 1 is methyl and Q is phenylsulfonate.醯基;式[4 a compound wherein R 1 is a methyl group, and Q is a 4-tolylsulfonyl group; a compound of the formula [4], wherein Y is a hydrogen atom, and Q is a C6 to C24 arylsulfonyl group, wherein at least A hydrogen atom is optionally substituted with an atom or group selected from Group A, or a benzyl group, wherein at least one hydrogen atom of the benzene ring is optionally substituted with an atom or group selected from Group B, and R 1 is If desired, a halogenated C1 to C6 alkyl group, or a C6 to C24 aryl group, wherein at least one hydrogen atom is optionally substituted with an atom or group of the selected Group A; a compound of the formula [4] wherein Y is a hydrogen atom , Q is a C6 to C24 arylsulfonyl or benzyl group, and R 1 is a C1 to C6 alkyl group or a C6 to C24 aryl group; a compound of the formula [4] wherein Y is a hydrogen atom and Q is a C6 to C14 group. Arylsulfonyl or benzyl, and R 1 is C1 to C6 alkyl or C6 to C14 aryl; a compound of the formula [4] wherein Y is a hydrogen atom and Q is 4-tolylsulfonyl or benzyl And R 1 is a methyl group, a phenyl group or a 4-tolyl group; a compound of the formula [4], wherein Y is a hydrogen atom, and Q is a C6 to C24 arylsulfonyl group, wherein at least one hydrogen atom is optionally Substituted by an atom or group selected from group A And R 1 is an optionally halogenated C1 to C6 alkyl group; a compound of the formula [4], wherein Y is a hydrogen atom, Q is a C6 to C24 aryl sulfonic acyl group, and R 1 is C1 to C6 alkyl; A compound of the formula [4], wherein Y is a hydrogen atom, Q is a C6 to C14 arylsulfonyl group, and R 1 is a C1 to C6 alkyl group; a compound of the formula [4], wherein Y is a hydrogen atom, Q Is a 4-tolylsulfonyl group, and R 1 is a methyl group; a compound of the formula [4], wherein Y is a hydrogen atom, and Q is a benzyl group, wherein at least one hydrogen atom on the benzene ring is optionally selected from the group consisting of Substituted by a group or group of groups B, and R 1 is a C6 to C24 aryl group, wherein at least one hydrogen atom is optionally substituted with an atom or group selected from group A; a compound of formula [4], wherein Y Is a hydrogen atom, Q is a benzyl group, and R 1 is a C6 to C24 aryl group; a compound of the formula [4] wherein Y is a hydrogen atom, Q is a benzyl group, and R 1 is a C6 to C14 aryl group; a compound according to 4, wherein Y is a hydrogen atom, Q is a benzyl group, and R 1 is a phenyl group or a 4-tolyl group; a compound compound of the formula [4], wherein R 1 is a phenyl group; compound, wherein R 1 is phenyl, 4-methylphenyl and Q is sulfo acyl group; the formula [4] Thereof, wherein R 1 is phenyl or 4-methylphenyl group, and Q is benzyl; the formula [4] with a compound, wherein R 1 is phenyl, and Q is benzyl; the formula [4] the compound, Wherein Y is a hydrogen atom and Q is a benzyl group; a compound of the formula [4] wherein Y is a hydrogen atom, Q is a 4-tolylsulfonyl group, and R 1 is a phenyl group; a compound of the formula [4] Wherein R 1 is a methyl group, Y is a chlorine atom, and Q is a 4-tolylsulfonyl group; a compound of the formula [4] wherein R 1 is a methyl group, Y is a hydrogen atom, and Q is a benzyl group. A compound of the formula [4], wherein R 1 is a methyl group, Y is a hydrogen atom, and Q is a phenylsulfonyl group; a compound of the formula [4], wherein R 1 is a methyl group, and Y is a hydrogen atom, And Q is a 4-tolylsulfonyl group; a compound of the formula [4], wherein R 1 is a phenyl group, Y is a chlorine atom, and Q is a 4-tolylsulfonyl group; a compound of the formula [4], wherein R 1 is phenyl, Y is a hydrogen atom, and Q is a benzyl group; a compound of the formula [4] wherein R 1 is a phenyl group, Y is a hydrogen atom, and Q is a phenylsulfonyl group; ] compounds, wherein R 1 is phenyl, Y is a hydrogen atom, and Q is 4-toluene sulfonic acyl group; the compound [5] specific examples include Compound: compound of formula [5], wherein X is a hydrogen atom; Next, the steps of the method of the present invention. The code numbers in the various formulas have the same meanings as described above.

(製造方法1) (Manufacturing method 1)

將製造化合物[3]的步驟說明如下。 The procedure for producing the compound [3] will be explained below.

化合物[3]可由化合物[4]與化合物[5]的反應而製造。 The compound [3] can be produced by reacting the compound [4] with the compound [5].

其中的代號有與上述相同的意義。 The code name has the same meaning as above.

反應通常是在溶媒中實施。溶媒的實例包括烴類例如甲苯及二甲苯,醚類例如四氫呋喃、環戊基甲基醚及乙二醇二甲基醚,以及該等的混合物。 The reaction is usually carried out in a solvent. Examples of the solvent include hydrocarbons such as toluene and xylene, ethers such as tetrahydrofuran, cyclopentyl methyl ether, and ethylene glycol dimethyl ether, and mixtures thereof.

反應溫度通常是在-20至30℃的範圍,而更理想是在0至5℃的範圍。反應時間通常是在1至100小時的範圍。 The reaction temperature is usually in the range of -20 to 30 ° C, and more desirably in the range of 0 to 5 ° C. The reaction time is usually in the range of 1 to 100 hours.

用於反應的化合物[5]的量基於1莫耳的化合物[4]通常是1至10莫耳,理想是1至1.2莫耳的比率。 The amount of the compound [5] used for the reaction is usually from 1 to 10 moles, preferably from 1 to 1.2 moles, based on 1 mole of the compound [4].

反應完成之後,例如,將反應混合物與鹽酸或硫酸混合,然後將沉澱過濾收集,或以有機溶媒萃取,而將所得的有機層例如以乾燥及濃縮操作,而可將化合物[3]單離。所單離的化合物[3]可以管柱層析法、再結晶法等進一步純化。 After completion of the reaction, for example, the reaction mixture is mixed with hydrochloric acid or sulfuric acid, and then the precipitate is collected by filtration or extracted with an organic solvent, and the obtained organic layer is operated, for example, by drying and concentration, and the compound [3] can be isolated. The isolated compound [3] can be further purified by column chromatography, recrystallization, or the like.

(製造方法2) (Manufacturing method 2)

下面說明由化合物[3]製造化合物[2]的步驟。 The procedure for producing the compound [2] from the compound [3] will be described below.

化合物[2]可以由化合物[3]的脫保護製造。 Compound [2] can be produced by deprotection of compound [3].

其中的代號有與上述相同的意義。 The code name has the same meaning as above.

化合物[2]可以將化合物[3]依照已知的方法脫保護而製造,例如,Greene et al.,Protective Groups in Organic Chemistry,4th.WILEY INSTERSCIENCE,及Journal of Heterocyclic Chemistryi.2003,203,等所述的方法。 Compound [2] may be the compound [3] is deprotected according to known methods to manufacture, e.g., Greene et al., Protective Groups in Organic Chemistry, 4 th .WILEY INSTERSCIENCE, and Journal of Heterocyclic Chemistryi.2003,203, etc. Said method.

(製造方法3) (Manufacturing method 3)

下面說明由化合物[2]製造化合物[1]的步驟。 The procedure for producing the compound [1] from the compound [2] will be described below.

化合物[1]可以由化合物[2]與氯化劑的反應而製造。 The compound [1] can be produced by reacting the compound [2] with a chlorinating agent.

其中的代號有與上述相同的意義. The code name has the same meaning as above.

反應可以依照在US7,569,518所述的方法實施。 The reaction can be carried out in accordance with the method described in US 7,569,518.

(製造方法4) (Manufacturing method 4)

下面說明由化合物[3]製造化合物[1]的步驟。 The procedure for producing the compound [1] from the compound [3] will be described below.

化合物[1]可以將化合物[3]與氧氯化磷混合並將該混合物加熱而製造。 The compound [1] can be produced by mixing the compound [3] with phosphorus oxychloride and heating the mixture.

其中的代號有與上述相同的意義。 The code name has the same meaning as above.

反應通常是在溶媒中實施。溶媒的實例包括烴類例如甲苯及二甲苯,以及鹵化烴類例如三氯甲烷及氯苯,氧氯化磷也可做為溶媒而使用。 The reaction is usually carried out in a solvent. Examples of the solvent include hydrocarbons such as toluene and xylene, and halogenated hydrocarbons such as chloroform and chlorobenzene, and phosphorus oxychloride can also be used as a solvent.

反應溫度通常是在60至180℃的範圍,而反應時間通常是在1至100小時的範圍。 The reaction temperature is usually in the range of 60 to 180 ° C, and the reaction time is usually in the range of 1 to 100 hours.

氧氯化磷的使用量基於1莫耳的化合物[3]通常是1至20莫耳,理想是1至5莫耳的比率。 The amount of phosphorus oxychloride used is usually from 1 to 20 moles, preferably from 1 to 5 moles, based on 1 mole of the compound [3].

反應完成之後,例如,將反應混合物與水或鹼性水溶液例如氫氧化鈉水溶液混合,然後將沉澱以過濾收集,或以有機溶媒萃取,將所得的有機層以例如乾燥及濃縮操作,而可單離化合物[1]。單離所得的化合物[1]也可再以管柱層析法,再結晶法等進一步純化。 After the reaction is completed, for example, the reaction mixture is mixed with water or an aqueous alkaline solution such as an aqueous sodium hydroxide solution, and then the precipitate is collected by filtration or extracted with an organic solvent, and the obtained organic layer is operated, for example, by drying and concentration, and can be used as a single From the compound [1]. The obtained compound [1] can be further purified by column chromatography, recrystallization or the like.

(製造方法5) (Manufacturing method 5)

下面說明由化合物[4A]製造化合物[3A]的步驟。 The procedure for producing the compound [3A] from the compound [4A] will be described below.

化合物[3A]可以由化合物[4A]與化合物[5]反應而製造。 The compound [3A] can be produced by reacting the compound [4A] with the compound [5].

其中的代號有與上述相同的意義。 The code name has the same meaning as above.

化合物[3A]可以由化合物[4A]代替化合物[4]而依照製造方法1製造。 The compound [3A] can be produced according to the production method 1 by substituting the compound [4A] for the compound [4].

(製造方法6) (Manufacturing method 6)

下面說明由化合物[3A]製造化合物[1]的步驟。 The procedure for producing the compound [1] from the compound [3A] will be described below.

化合物[1]可以將化合物[3A]與二級胺混合而使Q1脫保護,然後在所得的混合物添加氯化劑而製造。 The compound [1] can be produced by mixing the compound [3A] with a secondary amine to deprotect the Q 1 and then adding a chlorinating agent to the resulting mixture.

其中的代號有與上述相同的意義。 The code name has the same meaning as above.

反應通常是在溶媒中實施。溶媒的實例包括烴類例如甲苯及二甲苯,鹵化烴類例如氯苯,醚類例如四氫呋喃、環戊基甲基醚及乙二醇二甲基醚,以及該等的混合物。 The reaction is usually carried out in a solvent. Examples of the solvent include hydrocarbons such as toluene and xylene, halogenated hydrocarbons such as chlorobenzene, ethers such as tetrahydrofuran, cyclopentyl methyl ether and ethylene glycol dimethyl ether, and mixtures thereof.

反應溫度通常是在20至150℃的範圍,而反應時間通常是在1至100小時的範圍。 The reaction temperature is usually in the range of 20 to 150 ° C, and the reaction time is usually in the range of 1 to 100 hours.

二級胺的實例包括鏈胺例如二甲胺、二乙 胺及二異丙胺,以及環胺例如吡咯啶、哌啶、嗎啉、咪唑及1,2,4-三唑,而該等中,以環胺為理想,而以哌啶及嗎啉特別理想。 Examples of secondary amines include chain amines such as dimethylamine, diethyl Amines and diisopropylamines, and cyclic amines such as pyrrolidine, piperidine, morpholine, imidazole and 1,2,4-triazole, among which cycloamine is preferred, and piperidine and morpholine are particularly desirable. .

二級胺的使用量基於1莫耳的化合物[3A]通常是1至2莫耳,而理想是1至1.2莫耳的比率。 The amount of the secondary amine used is usually 1 to 2 moles based on 1 mole of the compound [3A], and is desirably a ratio of 1 to 1.2 moles.

氯化劑的實例包括氧氯化磷、三氯化磷、五氯化磷、光氣以及該等的混合物,而以氧氯化磷為理想。 Examples of the chlorinating agent include phosphorus oxychloride, phosphorus trichloride, phosphorus pentachloride, phosgene, and mixtures thereof, and phosphorus oxychloride is preferred.

氯化劑的使用量基於1莫耳的化合物[3A]通常是5至10莫耳,理想是1至3莫耳,而更理想是1至1.1莫耳的比率。 The chlorinating agent is used in an amount of usually 5 to 10 moles, preferably 1 to 3 moles, and more desirably 1 to 1.1 moles, based on 1 mole of the compound [3A].

反應完成之後,例如,將反應混合物與水或鹼性水溶液例如氫氧化鈉水溶液混合,然後以過濾收集沉澱,或以有機溶媒萃取,並將萃取所得的有機層例如以乾燥及濃縮操作,而可單離化合物[1]。單離所得的化合物[1]也可以管柱層析法、再結晶法等進一步純化。 After the reaction is completed, for example, the reaction mixture is mixed with water or an aqueous alkaline solution such as an aqueous solution of sodium hydroxide, and then the precipitate is collected by filtration or extracted with an organic solvent, and the obtained organic layer is subjected to, for example, drying and concentration. Isolation of the compound [1]. The compound [1] obtained by isolation may be further purified by column chromatography, recrystallization, or the like.

(參考製造方法1) (Refer to Manufacturing Method 1)

其次,下面說明化合物[4]的製造步驟。 Next, the production steps of the compound [4] will be described below.

化合物[4]可以由保護式[6]表示的化合物的氮原子而製造。 The compound [4] can be produced by protecting the nitrogen atom of the compound represented by the formula [6].

其中的Y及R1具有與上述相同的意義, (以下稱為化合物[6]) Wherein Y and R 1 have the same meaning as described above (hereinafter referred to as compound [6])

其中的代號具有與上述相同的意義. The code name has the same meaning as above.

當製造的化合物的Q是化合物[4]的Q1(亦即,化合物[4A])時,化合物[4A]可以由式[7]表示的化合物與式[6]表示的化合物反應而製造。 When Q of the compound to be produced is Q 1 of the compound [4] (that is, the compound [4A]), the compound [4A] can be produced by reacting a compound represented by the formula [7] with a compound represented by the formula [6].

Q1-C1 [7] Q 1 -C1 [7]

其中的代號具有與上述相同的意義。 The code number therein has the same meaning as described above.

(以下稱為化合物[7]) (hereinafter referred to as compound [7])

化合物[7]的實例包括甲基磺醯氯、乙基磺醯氯、丙基磺醯氯、三級丁基磺醯氯、戊基磺醯氯、己基磺醯氯、庚基磺醯氯、辛基磺醯氯、壬基磺醯氯、癸基磺醯氯、十一基磺醯氯、十二基磺醯氯、異戊基磺醯氯、三級己基磺醯氯、環丙基磺醯氯、環己基磺醯氯、環己基甲基磺醯氯、降莰基磺醯氯、金剛烷基磺醯氯、對甲基苯基磺醯氯、苯基磺醯氯、萘基磺醯氯、2,4,6-三甲苯基磺醯氯(mesitylsulfonyl chloride)、聯苯基磺醯氯、蒽基磺醯氯、芘基磺醯氯、聯三苯基磺醯氯、聯萘基磺醯氯、聯四苯基磺醯氯、3',5'-二苯基聯苯基磺醯氯、硝苯基磺醯氯、氯苯基磺醯氯、茴香基磺醯氯、氯氟苯基磺醯氯、二甲氧基苯 基磺醯氯以及五氟苯基磺醯氯。 Examples of the compound [7] include methylsulfonium chloride, ethylsulfonium chloride, propylsulfonium chloride, tertiary butylsulfonium chloride, pentylsulfonium chloride, hexylsulfonium chloride, heptylsulfonium chloride, Octylsulfonium chloride, mercaptosulfonium chloride, mercaptosulfonium chloride, eleven alkylsulfonium chloride, dodecylsulfonium chloride, isoamylsulfonium chloride, tertiary hexylsulfonyl chloride, cyclopropylsulfonate醯Chlorine, cyclohexylsulfonium chloride, cyclohexylmethylsulfonium chloride, sulfhydrylsulfonium chloride, adamantylsulfonium chloride, p-methylphenylsulfonium chloride, phenylsulfonyl chloride, naphthylsulfonate Chlorine, 2,4,6-trimethylsulfonyl chloride, biphenylsulfonyl chloride, mercaptosulfonyl chloride, mercaptosulfonyl chloride, triphenylsulfonium chloride, binaphthylsulfonate Neodymium chloride, tetraphenylsulfonium chloride, 3',5'-diphenylbiphenylsulfonium chloride, nitrophenylsulfonium chloride, chlorophenylsulfonium chloride, anisylsulfonium chloride, chlorofluorobenzene Sulfonyl chloride, dimethoxybenzene Alkyl sulfonium chloride and pentafluorophenyl sulfonium chloride.

反應通常是在溶媒中實施。溶媒的實例包括醚類例如四氫呋喃、環戊基甲基醚及乙二醇二甲基醚,烴類例如甲苯、及二甲苯,鹵化烴類例如氯苯,非質子極性溶媒例如二甲基甲醯胺、N-甲基吡咯啶-2-酮、乙酸乙酯、乙酸丁酯、乙腈、丙酮及2-丁酮,以及該等的混合物。 The reaction is usually carried out in a solvent. Examples of the solvent include ethers such as tetrahydrofuran, cyclopentyl methyl ether and ethylene glycol dimethyl ether, hydrocarbons such as toluene, and xylene, halogenated hydrocarbons such as chlorobenzene, and aprotic polar solvents such as dimethylformamidine. Amine, N-methylpyrrolidin-2-one, ethyl acetate, butyl acetate, acetonitrile, acetone and 2-butanone, and mixtures thereof.

反應通常是在鹼的存在下實施,例如,無機鹼。鹼的實例包括鹼金屬氫化物例如氫化鈉、鹼金屬的氫氧化物例如氫氧化鈉及氫氧化鉀,鹼金屬碳酸鹽例如碳酸鉀及碳酸鈉,有機鹽例如三乙胺、吡啶、二甲基苯胺及N,N-二甲胺基吡啶(DMAP)以及該等的混合物。 The reaction is usually carried out in the presence of a base, for example, an inorganic base. Examples of the base include alkali metal hydrides such as sodium hydride, alkali metal hydroxides such as sodium hydroxide and potassium hydroxide, alkali metal carbonates such as potassium carbonate and sodium carbonate, and organic salts such as triethylamine, pyridine, dimethyl Aniline and N,N-dimethylaminopyridine (DMAP) and mixtures of these.

反應溫度通常是在-20至100℃的範圍,而反應時間通常是在1至100小時的範圍。 The reaction temperature is usually in the range of from -20 to 100 ° C, and the reaction time is usually in the range of from 1 to 100 hours.

化合物[7]的使用量基於1莫耳的化合物[6]通常是1至2莫耳,以及由成本的考量理想是1至1.2莫耳的比率。 The compound [7] is used in an amount of usually 1 to 2 moles based on 1 mole of the compound [6], and is preferably a ratio of 1 to 1.2 moles by cost.

鹼的使用量基於1莫耳的化合物[6]通常是1至100莫耳,而理想是1至1.2莫耳的比率。 The amount of base used is usually from 1 to 100 moles, and desirably from 1 to 1.2 moles, based on 1 mole of compound [6].

反應完成之後,例如,將反應混合物與水混合或與鹽酸或硫酸混合並中和,然後以有機溶媒萃取,而將所得的有機層加以例如乾燥及濃縮操作,而可單離化合物[4]。單離所得的化合物[4]可以管柱層析法、再結晶法等進一步純化。 After completion of the reaction, for example, the reaction mixture is mixed with water or mixed with hydrochloric acid or sulfuric acid and neutralized, and then extracted with an organic solvent, and the resulting organic layer is subjected to, for example, drying and concentration, and the compound [4] can be isolated. The obtained compound [4] can be further purified by column chromatography, recrystallization, or the like.

在化合物[4]中的Q是苄基,而其苯環的至 少一個氫原子視需要經選自B群的原子或基團所取代的化合物,可以將苄基氯例如苄基氯、甲基苄基氯,甲氧基苄基氯、二甲氧基苄基氯或硝基苄基氯,或苄基溴例如苄基溴、甲基苄基溴、甲氧基苄基溴、二甲氧基苄基溴或硝基苄基溴,與化合物[6]反應而製造。 Q in the compound [4] is a benzyl group, and the benzene ring thereof A hydroxy group such as benzyl chloride, methylbenzyl chloride, methoxybenzyl chloride or dimethoxybenzyl may be added to the compound which is substituted with an atom or a group selected from the group B. Chlorine or nitrobenzyl chloride, or benzyl bromide such as benzyl bromide, methylbenzyl bromide, methoxybenzyl bromide, dimethoxybenzyl bromide or nitrobenzyl bromide, reacted with compound [6] And manufacturing.

反應通常是在溶媒中實施。溶媒的實例包括烴類例如甲苯及二甲苯,鹵化烴類例如氯苯及三氯甲烷,醚類例如四氫呋喃、環戊基甲基醚及乙二醇二甲基醚,非質子極性溶媒例如二甲基甲醯胺,N-甲基吡咯啶-2-酮、乙酸乙酯、乙酸丁酯、乙腈、丙酮及2-丁烷-酮,醇類例如甲醇,以及該等的混合物。 The reaction is usually carried out in a solvent. Examples of the solvent include hydrocarbons such as toluene and xylene, halogenated hydrocarbons such as chlorobenzene and chloroform, ethers such as tetrahydrofuran, cyclopentyl methyl ether and ethylene glycol dimethyl ether, and aprotic polar solvents such as dimethyl. Mercaptoamine, N-methylpyrrolidin-2-one, ethyl acetate, butyl acetate, acetonitrile, acetone and 2-butane-one, alcohols such as methanol, and mixtures thereof.

反應通常是在鹼的存在下實施。 The reaction is usually carried out in the presence of a base.

鹼的實例包括鹼金屬氫化物例如氫化鈉,鹼金屬氫氧化物例如氫氧化鈉及氫氧化鉀,無機鹽類例如鹼金屬的碳酸鹽例如碳酸鉀及碳酸鈉,以及有機鹽類例如三乙胺、吡啶及二甲基苯胺。 Examples of the base include alkali metal hydrides such as sodium hydride, alkali metal hydroxides such as sodium hydroxide and potassium hydroxide, inorganic salts such as alkali metal carbonates such as potassium carbonate and sodium carbonate, and organic salts such as triethylamine. , pyridine and dimethylaniline.

反應溫度通常是在-20℃至溶媒的沸點的範圍,而反應時間通常是在1至100小時。 The reaction temperature is usually in the range of from -20 ° C to the boiling point of the solvent, and the reaction time is usually from 1 to 100 hours.

苄基氯或苄基溴的使用量基於1莫耳的化合物[6]通常是1至10莫耳,而理想是1至1.2莫耳的比率。 The amount of benzyl chloride or benzyl bromide used is usually from 1 to 10 moles, and desirably from 1 to 1.2 moles, based on 1 mole of the compound [6].

鹼的使用量基於1莫耳的化合物[6]通常是1至100莫耳,而理想是1至1.2莫耳的比率。 The amount of base used is usually from 1 to 100 moles, and desirably from 1 to 1.2 moles, based on 1 mole of compound [6].

反應完成之後,例如,將反應混合物與水 混合或與鹽酸或硫酸混合並中和,然後以有機溶媒萃取,而將所得的有機層以例如乾燥及濃縮操作,而可單離化合物[6]。單離所得的化合物[6]可以管柱層析法、再結晶法等進一步純化。 After the reaction is completed, for example, the reaction mixture and water The mixture is mixed or neutralized with hydrochloric acid or sulfuric acid, and then extracted with an organic solvent, and the obtained organic layer is operated, for example, by drying and concentration, and can be isolated from the compound [6]. The obtained compound [6] can be further purified by column chromatography, recrystallization, or the like.

化合物[6]可以依照已知的方法,例如,在US 2009/156608所述的方法製造。 Compound [6] can be produced according to a known method, for example, the method described in US 2009/156608.

(參考製造方法2) (Refer to Manufacturing Method 2)

其次,下面說明製造化合物[5]的步驟。 Next, the procedure for producing the compound [5] will be described below.

化合物[5]可以由已知的方法,例如,將式[8]表示的化合物(以下稱為化合物[8])與鎂(Mg)或異丙基鎂氯(iPrMgCl)反應而製造。 The compound [5] can be produced by a known method, for example, by reacting a compound represented by the formula [8] (hereinafter referred to as the compound [8]) with magnesium (Mg) or isopropylmagnesium chloride (iPrMgCl).

其中的i-Pr表示異丙基,而Z與上述的意義相同。 Wherein i-Pr represents an isopropyl group, and Z has the same meaning as described above.

化合物[5]不經過單離及精製而可用於下一步驟。 Compound [5] was used in the next step without isolation and purification.

反應通常是在溶媒中實施。溶媒的例包括醚類例如四氫呋喃、環戊基甲基醚及乙二醇二甲基醚,烴類例如甲苯及二甲苯,以及該等的混合物。 The reaction is usually carried out in a solvent. Examples of the solvent include ethers such as tetrahydrofuran, cyclopentyl methyl ether and ethylene glycol dimethyl ether, hydrocarbons such as toluene and xylene, and mixtures thereof.

反應溫度通常是在-20至30℃的範圍,而理想是0至5℃,而反應時間通常是在1至100小時的範圍。 The reaction temperature is usually in the range of from -20 to 30 ° C, and desirably from 0 to 5 ° C, and the reaction time is usually in the range of from 1 to 100 hours.

Mg的使用量基於1莫耳的化合物[8]通常是 1至1.5莫耳,而理想是1至1.05莫耳的比率。 The amount of Mg used is based on 1 mole of compound [8] which is usually 1 to 1.5 moles, and ideally a ratio of 1 to 1.05 moles.

當使用Mg於反應時,理想是添加1,2-二溴甲烷等做為反應起始劑,而該等的使用量理想基於1莫耳的化合物[8]通常是0.001至0.01莫耳的比率。 When Mg is used in the reaction, it is desirable to add 1,2-dibromomethane or the like as a reaction initiator, and these amounts are preferably used in a ratio of 0.001 to 0.01 mol based on 1 mol of the compound [8].

當使用Mg於反應時,溶媒理想是醚類例如四氫呋喃。 When Mg is used in the reaction, the solvent is desirably an ether such as tetrahydrofuran.

異丙基鎂氯的使用量基於1莫耳的化合物[8]通常是1至1.5莫耳的範圍,而更理想是在1至1.05莫耳的範圍。 The amount of isopropyl magnesium chloride used is usually in the range of 1 to 1.5 moles based on 1 mole of the compound [8], and more desirably in the range of 1 to 1.05 moles.

實施例 Example

下面,將以實施例更詳細說明本發明,但本發明不限於這些實施例。 Hereinafter, the present invention will be described in more detail by way of examples, but the invention is not limited thereto.

本文中的代號表示下述的意義。 The code numbers in this document indicate the following meanings.

Ms表示甲烷基磺醯基。 Ms represents a methylalkylsulfonyl group.

Ts表示4-甲苯基磺醯基。 Ts represents 4-tolylsulfonyl.

Ph表示苯基。 Ph represents a phenyl group.

Bn表示苄基。 Bn represents a benzyl group.

MTBE表示三級丁基甲基醚。 MTBE represents a tertiary butyl methyl ether.

THF表示四氫呋喃。 THF represents tetrahydrofuran.

例1 example 1

氮環境下,將0.3g的Mg及15mL的THF在0℃混合並攪拌。在混合物添加全量的0.08g的1,2-二溴甲烷在0.5mL的THF的溶液及1.5mL的2.0g的1-溴-2,6-二氟苯在10.0mL的THF溶液(以下稱為化合物(8-1))。5分鐘之後,再添加2.5mL的化合物(8-1)溶液。將混合物攪拌一陣子後,滴入剩下的化合物(8-1)溶液的量,並將混合物在0℃攪拌2小時。將如上述製備的溴化2,6-二氟苯基鎂(以下稱為化合物(5-1))溶液移到保持在0℃的滴下漏斗。 Under a nitrogen atmosphere, 0.3 g of Mg and 15 mL of THF were mixed and stirred at 0 °C. Add a total amount of 0.08 g of 1,2-dibromomethane in 0.5 mL of THF and 1.5 mL of 2.0 g of 1-bromo-2,6-difluorobenzene in 10.0 mL of THF (hereinafter referred to as compound) (8-1)). After 5 minutes, another 2.5 mL of the compound (8-1) solution was added. After the mixture was stirred for a while, the amount of the remaining compound (8-1) solution was added dropwise, and the mixture was stirred at 0 ° C for 2 hours. The solution of 2,6-difluorophenylmagnesium bromide (hereinafter referred to as compound (5-1)) prepared as described above was transferred to a dropping funnel maintained at 0 °C.

在另一反應容器,將4.0g的4-甲烷基磺醯基-6-甲基-5-苯基-2-{4-甲苯基磺醯基)-2H-嗒-3-酮(以下稱為化合物(4-1))及10.0mL的THF混合並在0℃攪拌。在其中歷時約15分鐘滴入添加化合物(5-1)溶液,並將混合物在0℃再攪拌6小時。將反應混合物回升到室溫,而添加10%鹽酸及己烷。將混合物激烈攪拌後過濾。將在濾紙上的物質依序以水、MTBE及己烷清洗,而將濾紙上的物質在50℃減壓下乾燥,而得4.0g(收率92%)的4-(2,6-二氟苯基)-6-甲基-5-苯基-2-(4-甲苯基磺醯基)-2H-嗒-3-酮(以下稱為化合物 (3-1))的白色固體。 In a separate reaction vessel, 4.0 g of 4-methylalkylsulfonyl-6-methyl-5-phenyl-2-{4-methylsulfonyl)-2H-oxime 3-ketone (hereinafter referred to as compound (4-1)) and 10.0 mL of THF were mixed and stirred at 0 °C. The compound (5-1) solution was added dropwise thereto over about 15 minutes, and the mixture was further stirred at 0 ° C for 6 hours. The reaction mixture was allowed to warm to room temperature and 10% hydrochloric acid and hexane were added. The mixture was stirred vigorously and filtered. The material on the filter paper was washed successively with water, MTBE and hexane, and the material on the filter paper was dried under reduced pressure at 50 ° C to obtain 4.0 g (yield 92%) of 4-(2,6-di). Fluorophenyl)-6-methyl-5-phenyl-2-(4-methylsulfonyl)-2H-indole A white solid of -3-ketone (hereinafter referred to as compound (3-1)).

化合物(3-1) Compound (3-1)

1H-NMR(CDCl3,TMS)δ(ppm):8.12(2H,d,J=8.3Hz),7.36(2H,d,J=8.1Hz),7.29-7.24(3H,m),7.19-7.11(1H,m),7.07-7.03(2H,m),6.70(2H,dd,J=8.3,7.3Hz),2.45(3H,s),2.23(3H,s). 1 H-NMR (CDCl 3 , TMS) δ (ppm): 8.12 (2H, d, J = 8.3 Hz), 7.36 (2H, d, J = 8.1 Hz), 7.29-7.24 (3H, m), 7.19- 7.11 (1H, m), 7.07-7.03 (2H, m), 6.70 (2H, dd, J = 8.3, 7.3 Hz), 2.45 (3H, s), 2.23 (3H, s).

實施例2 Example 2

實驗1:將105mg的化合物(8-1)在1.0mL的THF溶液在0℃氮環境下攪拌,添加0.3mL的2M氯化異丙基鎂-THF溶液,而將混合物在同一溫度攪拌1小時而製備氯化2,6-二氟苯基鎂(以下稱為化合物(5-2))溶液,然後將溶液保持在0℃。 Experiment 1: 105 mg of the compound (8-1) was stirred in a 1.0 mL THF solution under a nitrogen atmosphere at 0 ° C, and 0.3 mL of a 2M isopropylmagnesium chloride-THF solution was added thereto, and the mixture was stirred at the same temperature for 1 hour. Instead, a solution of 2,6-difluorophenylmagnesium chloride (hereinafter referred to as the compound (5-2)) was prepared, and then the solution was kept at 0 °C.

實驗2:將105mg的化合物(8-1)在1.0mL的THF的溶液在0℃氮環境下攪拌,添加0.3mL的2M氯化異丙基鎂-THF溶液,將混合物在同一溫度攪拌1小時而製備化合物(5-2)的溶液,然後將溶液保持在0℃。 Experiment 2: A solution of 105 mg of the compound (8-1) in 1.0 mL of THF was stirred under a nitrogen atmosphere at 0 ° C, and 0.3 mL of a 2M solution of isopropylmagnesium chloride-THF was added, and the mixture was stirred at the same temperature for one hour. A solution of the compound (5-2) was prepared, and then the solution was kept at 0 °C.

在另一反應容器中,將200mg的6-甲基-5-苯基-4-苯基磺醯基-2-(4-甲苯基磺醯基)-2H-嗒-3-酮(以下稱為化合物(4-3))及1.0mL的THF的混合物在0℃的氮環境下攪拌,而添加在實驗1製備的化合物(5-2)溶液的全量。將混合物在同一溫度攪拌1.5小時,添加在實驗2製備的化合物(5-2)的溶液的全量,將混合物再攪拌1小時。在該混合物添加鹽酸、MTBE及乙酸乙酯,而將分離的有機層以飽和鹽水清洗。將有機層在無水硫酸鈉上乾燥,所得的化合物(3-1)以LC-IS(Internal Standard)定量的收率為約100%。 In a separate reaction vessel, 200 mg of 6-methyl-5-phenyl-4-phenylsulfonyl-2-(4-methylsulfonyl)-2H-indole A mixture of 3-ketone (hereinafter referred to as compound (4-3)) and 1.0 mL of THF was stirred under a nitrogen atmosphere at 0 ° C, and the total amount of the compound (5-2) solution prepared in Experiment 1 was added. The mixture was stirred at the same temperature for 1.5 hours, and the total amount of the solution of the compound (5-2) prepared in Experiment 2 was added, and the mixture was further stirred for 1 hour. Hydrochloric acid, MTBE and ethyl acetate were added to the mixture, and the separated organic layer was washed with saturated brine. The organic layer was dried over anhydrous sodium sulfate, and the obtained compound (3-1) was obtained by LC-IS (Internal Standard).

實施例3 Example 3

實驗1:將108mg的化合物(8-1)在1.0mL的THF溶液在0℃氮環境下攪拌,添加0.3mL的2M氯化異丙基鎂-THF溶液,將混合物在同一溫度攪拌1小時而製備化合物(5-2)的溶液,並將該溶液保持在0℃。 Experiment 1: 108 mg of the compound (8-1) was stirred in a 1.0 mL THF solution at 0 ° C under nitrogen, 0.3 mL of a 2M isopropylmagnesium chloride-THF solution was added, and the mixture was stirred at the same temperature for 1 hour. A solution of the compound (5-2) was prepared, and the solution was kept at 0 °C.

實驗2:將108mg的化合物(8-1)在1.0mL THF溶液在0℃的氮環境下攪拌,添加0.3mL的2M氯化異丙基鎂-THF的溶液而將混合物在同一溫度攪拌1小時而製備化合物 (5-2)溶液,然後將該溶液保持在0℃。 Experiment 2: 108 mg of the compound (8-1) was stirred in a 1.0 mL THF solution under a nitrogen atmosphere at 0 ° C, and 0.3 mL of a 2M solution of isopropylmagnesium chloride-THF was added thereto, and the mixture was stirred at the same temperature for 1 hour. Preparation of compounds (5-2) The solution was then kept at 0 °C.

在另一反應容器中,將200mg的2-苄基-6-甲基-5-苯基-4-苯基磺醯基-2H-嗒-3-酮(以下稱為化合物(4-4))及1.0mL的THF的混合物在0℃的氮環境下攪拌,添加在實驗1製備的化合物(5-2)溶液的全量。將混合物在同一溫度攪拌1.5小時,然後添加在實驗2製備的化合物(5-2)溶液的全量,並將混合物再攪拌1小時。添加鹽酸及乙酸乙酯於混合物,將分離的水層以乙酸乙酯萃取,然後將有機層混合,而以飽和鹽水清洗。將有機層在無水硫酸鈉上乾燥,所得的2-苄基-4-(2,6-二氟苯基1-6-甲基-5-苯基-2H-嗒-3-酮(以下稱為化合物(3-2))的收率以LC-IS定量為96%。 In a separate reaction vessel, 200 mg of 2-benzyl-6-methyl-5-phenyl-4-phenylsulfonyl-2H-indole A mixture of 3-ketone (hereinafter referred to as compound (4-4)) and 1.0 mL of THF was stirred under a nitrogen atmosphere at 0 ° C, and the total amount of the compound (5-2) solution prepared in Experiment 1 was added. The mixture was stirred at the same temperature for 1.5 hours, then the total amount of the solution of the compound (5-2) prepared in Experiment 2 was added, and the mixture was further stirred for 1 hour. Hydrochloric acid and ethyl acetate were added to the mixture, and the separated aqueous layer was extracted with ethyl acetate, and then the organic layer was mixed and washed with saturated brine. The organic layer was dried over anhydrous sodium sulfate to give 2-benzyl-4-(2,6-difluorophenyl 1-6-methyl-5-phenyl-2H-indole The yield of 3-ketone (hereinafter referred to as compound (3-2)) was 96% by LC-IS.

化合物(3-2) Compound (3-2)

1H-NMR(COCl3,TMS)δ(ppm):7.55(2H,d,J=6.6Hz),7.39-7.31(3H,m},7.26-7.25(3H,m),7.16-7.14(1H,m),7.08-7.07(2H,m),6.73(2H,dd,J=8.3,7.3Hz),5.39(2H,s),2.12(3H,5). 1 H-NMR (COCl 3 , TMS) δ (ppm): 7.55 (2H, d, J = 6.6 Hz), 7.39-7.31 (3H, m}, 7.26-7.25 (3H, m), 7.16-7.14 (1H , m), 7.08-7.07 (2H, m), 6.73 (2H, dd, J = 8.3, 7.3 Hz), 5.39 (2H, s), 2.12 (3H, 5).

實施例4 Example 4

將0.3g的化合物(8-1)在4.0mL的THF溶液在0℃的氮環境下攪拌,添加0.8mL的2.0M氯化異丙基鎂-THF溶液,然後將混合物在同一溫度攪拌1小時。然後,添加0.5g的2-苄基-4-甲烷基磺醯基-6-甲基-5-苯基-2H-嗒-3-酮(以下稱為化合物(4-2),將混合物再攪拌16小時。在混合物添加1N鹽酸,將混合物回升到室溫度,添加20mL的1N鹽酸及30mL的水,將混合物以60mL的乙酸乙酯萃取二次。將萃取液混合,並在減壓下濃縮,然後將殘渣以矽膠管柱層析法(洗出溶媒:己烷-乙酸乙酯)純化而得309mg的化合物(3-2)(收率60%)。 0.3 g of the compound (8-1) was stirred in a 4.0 mL THF solution under a nitrogen atmosphere at 0 ° C, and 0.8 mL of a 2.0 M isopropylmagnesium chloride-THF solution was added, and then the mixture was stirred at the same temperature for 1 hour. . Then, 0.5 g of 2-benzyl-4-methylalkylsulfonyl-6-methyl-5-phenyl-2H-indole was added. 3-ketone (hereinafter referred to as compound (4-2), the mixture was stirred for further 16 hours. 1N hydrochloric acid was added to the mixture, the mixture was brought back to room temperature, 20 mL of 1N hydrochloric acid and 30 mL of water were added, and the mixture was made up to 60 mL. The ethyl acetate was extracted twice. The extract was combined and concentrated under reduced pressure, and then the residue was purified by silica gel column chromatography (solvent solvent: hexane-ethyl acetate) 2) (yield 60%).

實施例5 Example 5

將235mg的化合物(3-1),56mg的嗎啉及856mg的甲苯的混合物加熱並在50℃攪拌2.5小時,在80℃攪拌4小時,在100℃攪拌2.5小時。將反應混合物冷卻至室溫,然後添加1.0mL的己烷,且將混合物過濾。將殘渣以己烷清洗,然後在減壓下乾燥,而得227mg的白色固體。根據1H-NMR,化合物(2-1)的收率是74%。 A mixture of 235 mg of the compound (3-1), 56 mg of morpholine and 856 mg of toluene was heated and stirred at 50 ° C for 2.5 hours, at 80 ° C for 4 hours, and at 100 ° C for 2.5 hours. The reaction mixture was cooled to room temperature, then 1.0 mL of hexane was added, and the mixture was filtered. The residue was washed with hexane and dried under reduced pressure to give 227 g of white solid. The yield of the compound (2-1) was 74% based on 1 H-NMR.

實施例6 Example 6

將136mg的4-(2,6-二氟苯基)-6-甲基-5-苯基-2H-嗒-3-酮(以下稱為化合物(2-1))及865mg的甲苯的混合物加熱並在100℃的氮環境下攪拌,而添加0.1mL的氧氯化磷。將混合物加熱並再攪拌4.5小時,然後冷卻至室溫,在混合物添加10%氫氧化鈉的水溶液及乙酸乙酯。將分離的水層以乙酸乙酯萃取二次。合併有機層並以LC-IS定量法處理,而得化合物(1-1)的收率為85%。 136 mg of 4-(2,6-difluorophenyl)-6-methyl-5-phenyl-2H-indole A mixture of 3-ketone (hereinafter referred to as compound (2-1)) and 865 mg of toluene was heated and stirred under a nitrogen atmosphere at 100 ° C, and 0.1 mL of phosphorus oxychloride was added. The mixture was heated and stirred for a further 4.5 hours, then cooled to room temperature and a 10% aqueous solution of sodium hydroxide and ethyl acetate were added to the mixture. The separated aqueous layer was extracted twice with ethyl acetate. The organic layers were combined and treated by LC-IS quantitative method to give a compound (1-1) yield of 85%.

實施例7 Example 7

將2.0g的化合物(3-1),399mg的哌啶及10.0g的甲苯的混合物加熱在100℃的氮環境下攪拌5小時,然後冷卻至室溫。對其添加0.4mL的氧氯化磷,並將混合物於100℃加熱及攪拌9小時。於100℃在混合物添加0.1mL的氧氯化磷,將混合物於100℃加熱及攪拌4小時,冷卻至室溫,添加9.4g的10%氫氧化鈉水溶液而將混合物分離。將水層以甲苯萃取,而將水層再以乙酸乙酯萃取。將有機層合併,而3-氯-4-(2,6-二氟苯基)-6-甲基-5-苯基嗒(以下稱為化合物(1-1))以LC-IS定量法所得的收率是80%。將有機層在 無水硫酸鈉上乾燥,然後在減壓下濃縮而得2.5g的粗產物。將粗產物由甲醇-MTBE再結晶而得0.7g的目標物。收率:51%。再度將濾液在減壓下濃縮而得1.6g的殘渣。(收率29%,LC-IS定量法) A mixture of 2.0 g of the compound (3-1), 399 mg of piperidine and 10.0 g of toluene was heated under a nitrogen atmosphere at 100 ° C for 5 hours, and then cooled to room temperature. 0.4 mL of phosphorus oxychloride was added thereto, and the mixture was heated and stirred at 100 ° C for 9 hours. 0.1 mL of phosphorus oxychloride was added to the mixture at 100 ° C, and the mixture was heated and stirred at 100 ° C for 4 hours, cooled to room temperature, and 9.4 g of a 10% aqueous sodium hydroxide solution was added to separate the mixture. The aqueous layer was extracted with toluene and the aqueous layer was extracted with ethyl acetate. The organic layers were combined and 3-chloro-4-(2,6-difluorophenyl)-6-methyl-5-phenylindole The yield (hereinafter referred to as the compound (1-1)) by the LC-IS quantitative method was 80%. The organic layer was dried over anhydrous sodium sulfate and then concentrated under reduced The crude product was recrystallized from methanol-MTBE to give 0.7 g of object. Yield: 51%. The filtrate was again concentrated under reduced pressure to give 1.6 g of residue. (Yield 29%, LC-IS quantitative method)

實施例8 Example 8

將202mg的化合物(3-1),41mg的嗎啉及1.0g的甲苯的混合物在100℃的氮環境下加熱及攪拌8小時,然後添加0.2mL的3%嗎啉/甲苯溶液,而將混合物再於100℃加熱及攪拌4.5小時。將混合物冷卻至室溫,添加0.05mL的氧氯化磷。將混合物再於100℃加熱及攪拌7小時,然後冷卻至室溫。在反應混合物添加乙腈,然後將反應混合物以LC-IS定量法處理。化合物(1-1)的收率為80%. A mixture of 202 mg of the compound (3-1), 41 mg of morpholine and 1.0 g of toluene was heated and stirred under a nitrogen atmosphere at 100 ° C for 8 hours, and then 0.2 mL of a 3% morpholine/toluene solution was added, and the mixture was added. It was further heated and stirred at 100 ° C for 4.5 hours. The mixture was cooled to room temperature and 0.05 mL of phosphorus oxychloride was added. The mixture was further heated and stirred at 100 ° C for 7 hours and then cooled to room temperature. Acetonitrile was added to the reaction mixture, and the reaction mixture was then subjected to LC-IS quantification. The yield of the compound (1-1) is 80%.

參考例1 Reference example 1

在氮環境下,將16g的55%氫化鈉及870g的THF混合在氮環境下攪拌。將混合物冷卻至0℃,添加87g的4-甲烷基磺醯基-6-甲基-5-苯基-2H-嗒-3-酮(以下稱為化合物(6-1)),接著添加73g的對甲苯磺醯氯(tosyl chloride),然 後將混合物在同一溫度攪拌2小時。在反應混合物添加88g的1N鹽酸,然後將混合物在減壓下濃縮。在殘渣添加2kg的水及7kg的乙酸乙酯而分離混合物,將有機層以1kg的飽和鹽水清洗。將有機層在減壓下濃縮,對其添加412g的乙醇,將混合物攪拌然後過濾,然後在濾紙上的物質以412g的乙醇清洗。將所得的殘渣在減壓下乾燥而得131g的化合物(4-1)(收率95%)。 Under a nitrogen atmosphere, 16 g of 55% sodium hydride and 870 g of THF were mixed and stirred under a nitrogen atmosphere. The mixture was cooled to 0 ° C and 87 g of 4-methylalkylsulfonyl-6-methyl-5-phenyl-2H-indole was added. 3-ketone (hereinafter referred to as compound (6-1)), followed by addition of 73 g of tosyl chloride, and the mixture was stirred at the same temperature for 2 hours. 88 g of 1N hydrochloric acid was added to the reaction mixture, and the mixture was concentrated under reduced pressure. The mixture was separated by adding 2 kg of water and 7 kg of ethyl acetate to the residue, and the organic layer was washed with 1 kg of saturated brine. The organic layer was concentrated under reduced pressure, 412 g of ethanol was added thereto, the mixture was stirred and then filtered, and then the material on the filter paper was washed with 412 g of ethanol. The obtained residue was dried under reduced pressure to give 131 g of Compound (4-1) (yield: 95%).

化合物(4-1) Compound (4-1)

1H-NMR(CDCl3,TMS)δ(ppm):8.11(2H,d,J=7.9Hz),7.47-7.45(3H,m),7.40(2H,d,J=8.0Hz),7.16-7.14(2H,m),3.28(3H,s),2.48(3H,s),2.09(3H,s). 1 H-NMR (CDCl 3 , TMS) δ (ppm): 8.11 (2H, d, J = 7.9 Hz), 7.47-7.45 (3H, m), 7.40 (2H, d, J = 8.0 Hz), 7.16- 7.14 (2H, m), 3.28 (3H, s), 2.48 (3H, s), 2.09 (3H, s).

參考例2 Reference example 2

在氮環境下,將18g的55%氫化鈉及950g的DMF(N,N-二甲基甲醯胺)混合並攪拌。將混合物冷卻至0℃,將97g的化合物(6-1)分少量多次慢慢添加,繼而將72g的苄基溴緩緩滴入,然後將混合物攪拌2小時。在反應混合物添加73g的1N鹽酸,再添加1.7kg的乙酸乙酯及1.0kg的水而分離混合物。將水層以1L的乙酸乙酯萃取二次,而將有機層混合,以1L的飽和鹽水清洗,在無水硫酸鎂上乾燥,而在減壓下濃縮。在濃縮的殘渣添加524g的乙醇及53g的三氯甲烷,將混合物加熱至80℃,然後冷卻至室溫。將沉 澱的固體過濾,而在濾紙上的物質以128g的乙醇清洗二次,然後將濾紙上的物質在減壓下乾燥而得112g的化合物(4-2)(收率86%)。 Under a nitrogen atmosphere, 18 g of 55% sodium hydride and 950 g of DMF (N,N-dimethylformamide) were mixed and stirred. The mixture was cooled to 0 ° C, and 97 g of the compound (6-1) was slowly added in small portions, followed by 72 g of benzyl bromide, and the mixture was stirred for 2 hours. 73 g of 1N hydrochloric acid was added to the reaction mixture, and 1.7 kg of ethyl acetate and 1.0 kg of water were further added to separate the mixture. The aqueous layer was extracted twice with 1 L of ethyl acetate, and the organic layer was combined, washed with 1 L of saturated brine, dried over anhydrous magnesium sulfate and evaporated. 524 g of ethanol and 53 g of chloroform were added to the concentrated residue, and the mixture was heated to 80 ° C, and then cooled to room temperature. Will sink The precipitated solid was filtered, and the substance on the filter paper was washed twice with 128 g of ethanol, and then the material on the filter paper was dried under reduced pressure to give 112 g of the compound (4-2) (yield: 86%).

化合物(4-2) Compound (4-2)

1H-NMR(CDCl3,TMS)δ(ppm):7.53(2H,d,J=7.1Hz),7.46-7.44(3H,m),7.40-7.34(3H,m},7.17-7.14(2H,m},5.37(2H,s),3.33(3H,s),2.02(3H,s). 1 H-NMR (CDCl 3 , TMS) δ (ppm): 7.53 (2H, d, J = 7.1 Hz), 7.46-7.44 (3H, m), 7.40-7.34 (3H, m), 7.17-7.14 (2H , m}, 5.37 (2H, s), 3.33 (3H, s), 2.02 (3H, s).

參考例3 Reference example 3

將2.0g的6-甲基-5-苯基-4-苯基磺醯基-2H-嗒-3-酮(以下稱為化合物(6-2)),1.4g的對甲苯磺醯基氯,1.1g的碳酸鉀及10g的乙腈的混合物在氮環境下於80℃加熱及攪拌4小時後,冷卻至室溫,且在混合物添加水及MTBE。將分離的有機層以飽和鹽水清洗,在無水硫酸鈉上乾燥,然後在減壓下濃縮而得2.6g的化合物(4-3)。收率:89% 2.0 g of 6-methyl-5-phenyl-4-phenylsulfonyl-2H-indole A mixture of 3-ketone (hereinafter referred to as compound (6-2)), 1.4 g of p-toluenesulfonyl chloride, 1.1 g of potassium carbonate and 10 g of acetonitrile was heated and stirred at 80 ° C for 4 hours under a nitrogen atmosphere. Cool to room temperature and add water and MTBE to the mixture. The separated organic layer was washed with saturated brine, dried over anhydrous sodium sulfate, and then concentrated under reduced pressure to give 2.6 g of Compound (4-3). Yield: 89%

化合物(4-3) Compound (4-3)

1H-NMR(CDCl3,TMS)δ(ppm):8.03(2H,d,J=7.8Hz),7.89(2H,d,J=8.1Hz),7.59(1H,t,J=7.1Hz),7.53-7.49(3H,m),7.46(2H,t,J=7.6Hz),7.34(2H,d,J=8.1Hz),7.20-7.16(2H,m),2.46(3H,5),2.04(3H,s). 1 H-NMR (CDCl 3 , TMS) δ (ppm): 8.03 (2H, d, J = 7.8 Hz), 7.89 (2H, d, J = 8.1 Hz), 7.59 (1H, t, J = 7.1 Hz) , 7.53-7.49 (3H, m), 7.46 (2H, t, J = 7.6 Hz), 7.34 (2H, d, J = 8.1 Hz), 7.20-7.16 (2H, m), 2.46 (3H, 5), 2.04 (3H, s).

參考例4 Reference example 4

將2.0g的化合物(6-2),1.0g的碳酸鉀,10g的甲醇及1.4g的苄基溴的混合物在室溫攪拌4.5小時,然後在混合物添加MTBE、水及乙酸乙酯而分離有機層。將分離的水層以乙酸乙酯萃取。將有機層合併,以飽和鹽水清洗,在無水硫酸鈉上乾燥,然後在減壓下濃縮而得2.9g的粗產物。將粗產物以矽膠管柱層析法(洗出溶媒:己烷-MTBE)處理而得1.5g的化合物(4-4)(收率43%). A mixture of 2.0 g of the compound (6-2), 1.0 g of potassium carbonate, 10 g of methanol and 1.4 g of benzyl bromide was stirred at room temperature for 4.5 hours, and then the mixture was separated by adding MTBE, water and ethyl acetate. Floor. The separated aqueous layer was extracted with ethyl acetate. The organic layer was combined, washed with saturated brine, dried over anhydrous sodium sulfate The crude product was treated by silica gel column chromatography (washing solvent: hexane-MTBE) to give 1.5 g of compound (4-4) (yield: 43%).

化合物(4-4) Compound (4-4)

1H-NMR(CDCl3,TMS)δ(ppm):8.00-7.97(2H,m),7.60(1H,t,J=7.3Hz),7.52-7.47(5H,m),7.41-7.37(2H,m),7.32-7.27(3H,m),7.22(2H,dd,J=7.8,1.5Hz),5.25(2H,s),1.97(3H,s). 1 H-NMR (CDCl 3 , TMS) δ (ppm): 8.00-7.97 (2H, m), 7.60 (1H, t, J = 7.3 Hz), 7.52-7.47 (5H, m), 7.41-7.37 (2H , m), 7.32 - 7.27 (3H, m), 7.22 (2H, dd, J = 7.8, 1.5 Hz), 5.25 (2H, s), 1.97 (3H, s).

參考例5 Reference example 5

在190mL的乙醇,30.0g的2-甲烷基磺醯基乙醯肼(2-methanesulfonylacetylhydrazide)及32.1g的1-苯基丙烷-1,2-二酮,23.7g的的混合物在室溫於氮環境下添加乙酸。將混合物在室溫攪拌6小時,然後將沉澱的固體過濾收集。將過濾的殘渣以乙醇清洗,而得50.5g(收率90%)的2- 甲烷基磺醯基乙酸1-甲基-2-側氧-2-苯基亞乙基醯肼(以下稱為化合物(7-1))。 In 190 mL of ethanol, 30.0 g of 2-methanesulfonylacetylhydrazide and 32.1 g of 1-phenylpropane-1,2-dione, 23.7 g of a mixture at room temperature in nitrogen Acetic acid is added under the environment. The mixture was stirred at room temperature for 6 hours and then the precipitated solid was collected by filtration. The filtered residue was washed with ethanol to obtain 50.5 g (yield 90%) of 2- Methylalkylsulfonyl acetic acid 1-methyl-2-oxo-2-phenylethylidene oxime (hereinafter referred to as compound (7-1)).

化合物(7-1) Compound (7-1)

1H-NMR(CDCl3,TMS)δ(ppm):2.23(3H,s),3.11(3H,s),4.35(2H,s),7.46-7.50(2H,m),7.56-7.58(1H,m),7.94-7.61(2H,m),9.23(1H,m). 1 H-NMR (CDCl 3 , TMS) δ (ppm): 2.23 (3H, s), 3.11 (3H, s), 4.35 (2H, s), 7.46-7.50 (2H, m), 7.56-7.58 (1H , m), 7.94-7.61 (2H, m), 9.23 (1H, m).

參考例6 Reference example 6

在4.6mL的甲苯及564mg的化合物(7-1)的混合物,在室溫氮環境下添加85mg的哌啶。將混合物在110℃攪拌12小時,然後冷卻。對其添加稀鹽酸,然後將混合物以乙酸乙酯萃取二次。將有機層合併,在無水硫酸鈉上乾燥,然後在減壓下濃縮。將所得的殘渣以矽膠管柱層析法(洗出溶媒:己烷-乙酸乙酯)處理而得481mg的化合物(6-1)(收率91%)。 In a mixture of 4.6 mL of toluene and 564 mg of compound (7-1), 85 mg of piperidine was added under a nitrogen atmosphere at room temperature. The mixture was stirred at 110 ° C for 12 hours and then cooled. Dilute hydrochloric acid was added thereto, and the mixture was extracted twice with ethyl acetate. The organic layers were combined, dried over anhydrous sodium sulfate and evaporated. The obtained residue was subjected to silica gel column chromatography (washing solvent: hexane-ethyl acetate) to give 481 mg of Compound (6-1) (yield: 91%).

化合物(6-1) Compound (6-1)

1H-NMR(CDCl3,TMS)δ(ppm):2.04(3H,s),3.36(3H,s),7.18-7.21(2H,m),7.46-7.52(3H,m),11.61(1H,br). 1 H-NMR (CDCl 3 , TMS) δ (ppm): 2.04 (3H, s), 3.36 (3H, s), 7.18-7.21 (2H, m), 7.46-7.52 (3H, m), 11.61 (1H) , br).

參考例7 Reference example 7

實驗1:將321mg的2-苯基磺醯基乙酸醯肼,206mg的1-苯基丙烷-1,2-二酮,186mg的乙酸及1.0g的甲醇的混合物在室溫攪拌6小時。 Experiment 1: A mixture of 321 mg of hydrazine 2-phenylsulfonylacetate, 206 mg of 1-phenylpropane-1,2-dione, 186 mg of acetic acid and 1.0 g of methanol was stirred at room temperature for 6 hours.

實驗2:將322mg的2-苯基磺醯基乙酸醯肼,201mg的1-苯基丙烷-1,2-二酮,11mg的乙酸及1.0g的甲醇的混合物在室溫攪拌6小時。 Experiment 2: A mixture of 322 mg of hydrazine 2-phenylsulfonylacetate, 201 mg of 1-phenylpropane-1,2-dione, 11 mg of acetic acid and 1.0 g of methanol was stirred at room temperature for 6 hours.

將實驗1及實驗2反應混合物合併,且將乙酸以與甲苯的共沸除去(添加甲苯且將混合物在減壓下濃縮的操作實施三次),然後將混合物在減壓下濃縮而得0.95g(LC純度88%)的2-苯基磺醯基乙酸1-甲基-2-側氧-2-苯基亞乙基醯肼(以下稱為化合物(7-2))。收率:89%包含LC純度內容。 The reaction mixtures of Experiment 1 and Experiment 2 were combined, and acetic acid was removed by azeotropy with toluene (addition of toluene and concentration of the mixture under reduced pressure), and then the mixture was concentrated under reduced pressure to give 0.95 g ( LC-purity 88%) 2-phenylsulfonyl acetic acid 1-methyl-2-oxo-2-phenylethylidene hydride (hereinafter referred to as compound (7-2)). Yield: 89% contains LC purity content.

化合物(7-2) Compound (7-2)

1H-NMR(CDCl3,TMS)δ:8.95(1H,s),7.98(2H,d,J=7.6Hz),7.82(2H,d,J=7.8Hz),7.68-7.60(2H,m},7.51(4H,td,J=7.5,3.7Hz),4.48(2H,s),2.14(3H,s). 1 H-NMR (CDCl 3 , TMS) δ: 8.95 (1H, s), 7.98 (2H, d, J = 7.6 Hz), 7.82 (2H, d, J = 7.8 Hz), 7.68-7.60 (2H, m }, 7.51 (4H, td, J = 7.5, 3.7 Hz), 4.48 (2H, s), 2.14 (3H, s).

參考例8 Reference Example 8

將10g的化合物(7-2),2.7g的哌啶及31g的甲苯的混 合物在90℃攪拌5小時。將混合物冷卻至40℃,添加20mL的水,20mL的10%氫氧化鈉水溶液,20mL的甲苯而分離混合物。將有機層以20mL的10%氫氧化鈉水溶液萃取,將水層合併,然後在攪拌中添加濃鹽酸。將沉澱的固體過濾收集,而將殘渣依序以水及己烷清洗,在減壓下乾燥而得9.35g的化合物(6-2)。收率:98% Mixing 10g of compound (7-2), 2.7g of piperidine and 31g of toluene The mixture was stirred at 90 ° C for 5 hours. The mixture was cooled to 40 ° C, and 20 mL of water, 20 mL of a 10% aqueous sodium hydroxide solution and 20 mL of toluene were added to separate the mixture. The organic layer was extracted with 20 mL of a 10% aqueous sodium hydroxide solution, and the aqueous layers were combined, and then concentrated hydrochloric acid was added with stirring. The precipitated solid was collected by filtration, and the residue was washed sequentially with water and hexane, and dried under reduced pressure to give 9.35 g of Compound (6-2). Yield: 98%

化合物(6-2) Compound (6-2)

1H-NMR(COCl3,TMS)δ:10.62(1H,brs),8.01-7.98(2H,m),7.61(1H,t,J=7.5Hz),7.55-7.48(5H,m),7.24(2H,dd,J=7.8,1.8Hz),1.99(3H,s). 1 H-NMR (COCl 3 , TMS) δ: 10.62 (1H, brs), 8.01-7.98 (2H, m), 7.61 (1H, t, J = 7.5 Hz), 7.55-7.48 (5H, m), 7.24 (2H, dd, J = 7.8, 1.8 Hz), 1.99 (3H, s).

參考例9 Reference Example 9

將化合物(1-1)(15g)的甲苯(35g)溶液添加於水(48g)並加熱至90℃以水及甲苯成為共沸混合物而除去甲苯。完全除去甲苯後,將漿料過濾並將殘渣以水清洗,在40℃減壓下乾燥。沉澱的固體的PXRD分析顯示相純度型1。 A solution of the compound (1-1) (15 g) in toluene (35 g) was added to water (48 g) and heated to 90 ° C to remove toluene with water and toluene as an azeotrope. After completely removing toluene, the slurry was filtered and the residue was washed with water and dried under reduced pressure at 40 °C. PXRD analysis of the precipitated solid showed phase purity type 1.

參考例10 Reference example 10

將化合物(1-1)(15g)的二甲苯(45g)溶液加熱至100℃而形成溶液,並將正庚烷(30g)在100℃緩緩添加。將溶液冷卻至5℃並攪拌1小時。將漿料過濾並以正庚烷在二甲苯(50wt%)溶液清洗。將沉澱在40℃減壓乾燥。沉澱的固體的PXRD分析顯示其為相純度型1。 A solution of the compound (1-1) (15 g) in xylene (45 g) was heated to 100 ° C to form a solution, and n-heptane (30 g) was gradually added at 100 ° C. The solution was cooled to 5 ° C and stirred for 1 hour. The slurry was filtered and washed with n-heptane in a solution of xylene (50 wt%). The precipitate was dried under reduced pressure at 40 °C. PXRD analysis of the precipitated solid showed it to be of phase purity type 1.

參考例11 Reference example 11

將化合物(1-1)與其5倍重的甲醇合併並在63℃混合0.3小時而形成溶液。將溶液冷卻至10℃並攪拌1.5小時。 將漿料過濾並以甲醇清洗。將沉澱在50℃乾燥。沉澱的固體的DSC/TGA及PXRD分析顯示其為相純度型1。第1圖及第2圖表示型1的物理性質數據圖。下述表示型1的PXRD圖形的峰列表。 Compound (1-1) was combined with 5 times by weight of methanol and mixed at 63 ° C for 0.3 hours to form a solution. The solution was cooled to 10 ° C and stirred for 1.5 hours. The slurry was filtered and washed with methanol. The precipitate was dried at 50 °C. DSC/TGA and PXRD analysis of the precipitated solid showed a phase purity type of 1. Fig. 1 and Fig. 2 are diagrams showing physical property data of the type 1. The peak list of the PXRD pattern of the type 1 is shown below.

參考例12 Reference example 12

將化合物(1-1)(76.2mg)與2mL甲醇在12mL小瓶中合併並在25℃混合0.5小時而形成溶液。將溶液通過0.2μm PTFE過濾器於乾淨的12mL小瓶。將小瓶不加蓋而放在50℃金屬塊上,而使溶媒蒸發2日。沉澱的固體的DSC/TGA及PXRD分析顯示相純度型2。第3圖及第4圖是型2的物理性質數據圖。下表示型2的PXRD圖形的峰列表。 Compound (1-1) (76.2 mg) was combined with 2 mL of methanol in a 12 mL vial and mixed at 25 ° C for 0.5 hour to form a solution. Pass the solution through 0.2μm The PTFE filter is in a clean 12 mL vial. The vial was placed on a 50 ° C metal block without being capped, and the solvent was allowed to evaporate for 2 days. DSC/TGA and PXRD analysis of the precipitated solid showed phase purity type 2. Fig. 3 and Fig. 4 are diagrams showing the physical property data of the type 2. The lower part indicates the peak list of the PXRD pattern of the type 2.

參考例13 Reference example 13

將化合物(1-1)(260.6mg)與8mL甲醇合併於12mL小瓶並在25℃混合0.5小時而成溶液。將溶液通過0.2μmPTFE過濾器過濾。將該溶液(約1mL)在50℃金屬塊上鬆鬆加蓋的12mL小瓶中任其蒸發3日。沉澱的固體的DSC及PXRD分析顯示為新型,表示為型3。第5圖及第6圖為型3的物理性質數據圖。下述表示型3的PXRD圖形的峰列表。 Compound (1-1) (260.6 mg) was combined with 8 mL of methanol in a 12 mL vial and mixed at 25 ° C for 0.5 hour to form a solution. The solution was filtered through a 0.2 μm PTFE filter. The solution (about 1 mL) was allowed to evaporate for 3 days in a 12 mL vial loosely capped on a 50 ° C metal block. The DSC and PXRD analyses of the precipitated solids showed a novel, expressed as Form 3. Fig. 5 and Fig. 6 are graphs showing the physical property data of the type 3. The peak list of the PXRD pattern of the type 3 is shown below.

第7圖示固體型1至型3係分別不相同的PXRD圖形。 In the seventh embodiment, the solid type 1 to type 3 are different PXRD patterns.

儀器方法: Instrument method:

粉末X光繞射圖(PXRD)。PXRD繞射圖是使用PANalytlcal X'Pert Pro繞射儀器,使用Ni-過濾Cu Kα(45kV/40mA)放射線及步進幅度0.02°2θ及X'celeratorTM RTMS(Real Time Multi-Step)檢出器。 Powder X-ray diffraction pattern (PXRD). PXRD diffraction pattern using PANalytlcal X'Pert Pro diffraction instrument using Ni- filtered Cu Kα (45kV / 40mA) radiation and step magnitude and 0.02 ° 2θ X'celerator TM RTMS (Real Time Multi- Step) detector .

入射光線側配置,固定放散狹縫(0.25°),0.04雷德索勒狹縫(rad Soller slit),抗散射狹縫(0.25°),及10mm光罩(beam mask)。 The incident light side is configured with a fixed release slit (0.25°), a 0.04 rad Soller slit, an anti-scatter slit (0.25°), and a 10mm beam mask.

繞射光線側配置:固定放散狹縫(0.25°)及0.04雷德索勒狹縫。將試樣平面固定於0背景矽晶圓上。 Diffraction side configuration: fixed release slit (0.25°) and 0.04 Redsole slit. The sample plane is fixed on a 0 background wafer.

示差掃描熱量計(DSC)。DSC是以配備以40mL/min N2吹掃的自動取樣器及冷凍冷卻系統的TA Instruments Q100示差掃描熱量計。用皺縮(crimped)Al盤以15℃/min而得DSC熱分析圖。 Differential Scanning Calorimeter (DSC). DSC is equipped with at 40mL / min N 2 purged autosampler and a refrigerated cooling system TA Instruments Q100 differential scanning calorimeter. A DSC thermogram was obtained at 15 ° C/min using a crimped Al disk.

熱重量分析(TGA):TGA熱分析圖是以TA Instruments Q500熱重量分析儀,用Pt或Al盤以40mL/min N2吹掃下所得。 Thermogravimetric Analysis (TGA): The TGA thermogram was obtained by purging with a Pt or Al disk at 40 mL/min N 2 using a TA Instruments Q500 thermogravimetric analyzer.

產業上的應用可能性 Industrial application possibilities

有用於做為植物病害防治劑的活性成分的式[1]表示的嗒化合物可以依照本發明所述的方法實施而製造。 嗒 represented by the formula [1] used as an active ingredient of a plant disease control agent The compounds can be made according to the methods described in the present invention.

Claims (6)

一種式[1]表示的化合物的製造方法,包含下列步驟:將式[4]表示的化合物與式[5]表示的化合物反應而得式[3]表示的化合物: 式中Q表示視需要經鹵化的C1至C12烷基磺醯基,視需要經選自A群的至少一個原子或基團所取代的C6至C24芳基磺醯基,或其中在苯環上的至少一個氫原子視需要經選自B群的原子或基團所取代的苄基,X表示氫原子、鹵原子或甲基,及Y表示氫原子、鹵原子或甲基; 式中Q表示視需要經鹵化的C1至C12烷基,或表示視需要經選自A群的至少一個原子或基團所取代的C6至C24芳基,及Q及Y具有與上述相同的意義,A群:視需要經鹵化的C1至C4烷氧基、鹵原子及 硝基所成群組,B群:視需要經鹵化的C1至C4烷基、視需要經鹵化的C1至C4烷氧基、鹵原子及硝基所成群組: 式中X具有與上述表示的相同意義,及Z表示氯原子或溴原子;由化合物[3]脫保護而得式[2]表示的化合物: 式中X及Y具有與上述表示的相同意義;將式[2]表示的化合物與鹵化劑反應而得式[1]表示的化合物: 式中X及Y具有與上述相同的意義。 A method for producing a compound represented by the formula [1], which comprises the step of reacting a compound represented by the formula [4] with a compound represented by the formula [5] to obtain a compound represented by the formula [3]: Wherein Q represents a C1 to C12 alkylsulfonyl group which is optionally halogenated, and optionally a C6 to C24 arylsulfonyl group substituted with at least one atom or group selected from Group A, or a benzene ring thereof At least one hydrogen atom is optionally substituted with a benzyl group selected from an atom or group of Group B, X represents a hydrogen atom, a halogen atom or a methyl group, and Y represents a hydrogen atom, a halogen atom or a methyl group; Wherein Q represents a C1 to C12 alkyl group which is halogenated as desired, or a C6 to C24 aryl group which is optionally substituted with at least one atom or group selected from Group A, and Q and Y have the same meanings as described above. , Group A: Groups of halogenated C1 to C4 alkoxy groups, halogen atoms and nitro groups as desired, Group B: C1 to C4 alkyl groups which are halogenated as needed, and C1 to C4 alkoxy groups which are halogenated as needed Group of groups, halogen atoms and nitro groups: Wherein X has the same meaning as defined above, and Z represents a chlorine atom or a bromine atom; and the compound represented by the formula [2] is deprotected from the compound [3]: In the formula, X and Y have the same meanings as defined above; the compound represented by the formula [2] is reacted with a halogenating agent to obtain a compound represented by the formula [1]: Wherein X and Y have the same meanings as described above. 一種式[1]表示的化合物的製造方法,包含下列步驟:將式[4]表示的化合物與式[5]表示的化合物的反應而得式[3]表示的化合物: 式中Q表示視需要經鹵化的C1至C12烷基磺醯基,視需要經選自A群的至少一個原子或基團所取代的C6至C24芳基磺醯基,或在苯環上的至少一個氫原子視需要經選自B群的原子或基團所取代的苄基,X表示氫原子、鹵原子或甲基,及Y表示氫原子、鹵原子或甲基, 式中R1表示視需要經鹵化的C1至C12烷基,或表示視需要經選自A群的至少一個原子或基團取代的C6至C24芳基,及Q及Y具有與上述相同的意義,A群:視需要經鹵化的C1至C4烷氧基、鹵原子及硝基所成群組,B群:視需要經鹵化的C1至C4烷基、視需要經鹵化的C1至C4烷氧基、鹵原子及硝基所成群組, 式中X具有與上述相同的意義,及Z表示氯原子或溴原子;及將化合物[3]與氧氯化磷混合並加熱該混合物而得式[1]表示的化合物: 式中X及Y具有與上述相同的意義。 A process for producing a compound represented by the formula [1], which comprises the step of reacting a compound represented by the formula [4] with a compound represented by the formula [5] to obtain a compound represented by the formula [3]: Wherein Q represents a C1 to C12 alkylsulfonyl group which is optionally halogenated, optionally substituted with a C6 to C24 arylsulfonyl group selected from at least one atom or group of Group A, or on a benzene ring. At least one hydrogen atom is optionally substituted with a benzyl group selected from an atom or group of Group B, X represents a hydrogen atom, a halogen atom or a methyl group, and Y represents a hydrogen atom, a halogen atom or a methyl group. Wherein R 1 represents a C1 to C12 alkyl group which is optionally halogenated, or a C6 to C24 aryl group which is optionally substituted with at least one atom or group selected from the group A, and Q and Y have the same meanings as described above. , Group A: Groups of halogenated C1 to C4 alkoxy groups, halogen atoms and nitro groups as desired, Group B: C1 to C4 alkyl groups which are halogenated as needed, and C1 to C4 alkoxy groups which are halogenated as needed Group of groups, halogen atoms and nitro groups, Wherein X has the same meaning as described above, and Z represents a chlorine atom or a bromine atom; and a compound represented by the formula [1] is obtained by mixing the compound [3] with phosphorus oxychloride and heating the mixture: Wherein X and Y have the same meanings as described above. 一種式[1]表示的化合物的製造方法,包含下列步驟:將式[4A]表示的化合物與式[5]表示的化合物反應而得式[3A]表示的化合物: 式中X及Y具有與上述相同的意義,及Q1表示視需要經鹵化的C1至C12烷基磺醯基,或表示視需要經選自A群的至少一個原子或基團所取代的C6至C24芳基磺醯基,A群:視需要經鹵化的C1至C4烷氧基、鹵原子及硝基所成群組, 式中R1、Y及Q1具有與上述相同的意義,及 式中X具有與上述相同的意義,及Z表示氯原子或溴原子;以及將式[3A]表示的化合物與二級胺混合然後添加氯化劑於該混合物而得化合物[1]。 A method for producing a compound represented by the formula [1], which comprises the step of reacting a compound represented by the formula [4A] with a compound represented by the formula [5] to obtain a compound represented by the formula [3A]: Wherein X and Y have the same meanings as defined above, and Q 1 represents a C1 to C12 alkylsulfonyl group which is optionally halogenated, or a C6 which is optionally substituted with at least one atom or group selected from Group A. To C24 arylsulfonyl, Group A: if desired, a halogenated C1 to C4 alkoxy group, a halogen atom and a nitro group, Wherein R 1 , Y and Q 1 have the same meaning as described above, and Wherein X has the same meaning as described above, and Z represents a chlorine atom or a bromine atom; and a compound represented by the formula [3A] is mixed with a secondary amine and then a chlorinating agent is added to the mixture to obtain a compound [1]. 一種式[3]表示的化合物: 式中Q表示視需要經鹵化的C1至C12烷基磺醯基、視需要經選自A群的至少一個原子或基團所取代的6至C24芳磺醯基,或其中在苯環的至少一個氫原子視需要經選自B群的原子或基團取代的苄基,X表示氫原子、鹵原子或甲基,及Y表示氫原子、鹵原子或甲基,A群:視需要經鹵化的C1至C4烷氧基、鹵原子及硝基所成群組, B群:視需要經鹵化的C1至C4烷基、視需要經鹵化的C1至C4烷氧基、鹵原子及硝基所成群組。 A compound represented by the formula [3]: Wherein Q represents a C1 to C12 alkylsulfonyl group which is optionally halogenated, a 6 to C24 arylsulfonyl group which is optionally substituted with at least one atom or group selected from Group A, or at least a benzene ring thereof A hydrogen atom is optionally substituted with a benzyl group selected from an atom or group of Group B, X represents a hydrogen atom, a halogen atom or a methyl group, and Y represents a hydrogen atom, a halogen atom or a methyl group, Group A: halogenated as needed a group of C1 to C4 alkoxy groups, a halogen atom and a nitro group, Group B: a C1 to C4 alkyl group which is halogenated as needed, a halogenated C1 to C4 alkoxy group, a halogen atom and a nitro group, if necessary In groups. 一種式[3]表示的化合物的製造方法,係將式[4]表示的化合物與式[5]表示的化合物反應而得: 式中Q表示視需要經鹵化的C1至C12烷基磺醯基,視需要經選自A群的至少一個原子或基團取代的C6至C24芳基磺醯基,或其中在苯環上的至少一個氫原子視需要經選自B群的原子或基團所取代的苄基,X表示氫原子、鹵原子或甲基,及Y表示氫原子、鹵原子或甲基,A群:視需要經鹵化的C1至C4烷氧基、鹵原子及硝基所成群組,B群:視需要經鹵化的C1至C4烷基、視需要經鹵化的C1至C4烷氧基、鹵原子及硝基所成群組, 式中R1表示視需要經鹵化的C1至C12烷基,或表示視需要經選自A群的至少一個原子或基團取代的C6至 C24芳基,及Q及Y具有與上述表示的相同意義, 式中X具有與上述同樣的意義,及Z表示氯原子或溴原子。 A method for producing a compound represented by the formula [3], which comprises reacting a compound represented by the formula [4] with a compound represented by the formula [5]: Wherein Q represents a C1 to C12 alkylsulfonyl group which is optionally halogenated, optionally substituted with a C6 to C24 arylsulfonyl group substituted with at least one atom or group selected from Group A, or a benzene ring thereof At least one hydrogen atom is optionally substituted with a benzyl group selected from an atom or group of Group B, X represents a hydrogen atom, a halogen atom or a methyl group, and Y represents a hydrogen atom, a halogen atom or a methyl group, Group A: as needed a group of halogenated C1 to C4 alkoxy groups, a halogen atom and a nitro group, Group B: a C1 to C4 alkyl group optionally halogenated, a C1 to C4 alkoxy group optionally halogenated, a halogen atom and a nitrate Foundation group, Wherein R 1 represents a C1 to C12 alkyl group optionally halogenated, or a C6 to C24 aryl group optionally substituted with at least one atom or group selected from the group A, and Q and Y have the same meaning as defined above. significance, Wherein X has the same meaning as described above, and Z represents a chlorine atom or a bromine atom. 一種式[4]表示的化合物: 式中R1表示視需要經鹵化的C1至C12烷基,或表示視需要經選自A群的至少一個原子或基團取代的C6至C24芳基,及Q及Y具有與上述相同的意義,A群:視需要經鹵化的C1至C4烷氧基、鹵原子及硝基所成群組。 A compound represented by the formula [4]: Wherein R 1 represents a C1 to C12 alkyl group which is optionally halogenated, or a C6 to C24 aryl group which is optionally substituted with at least one atom or group selected from the group A, and Q and Y have the same meanings as described above. Group A: a group of a halogenated C1 to C4 alkoxy group, a halogen atom and a nitro group as needed.
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