TW201434802A - Tetraphenylene ethylene based compound and OLED device containing the same - Google Patents
Tetraphenylene ethylene based compound and OLED device containing the same Download PDFInfo
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- TW201434802A TW201434802A TW102146936A TW102146936A TW201434802A TW 201434802 A TW201434802 A TW 201434802A TW 102146936 A TW102146936 A TW 102146936A TW 102146936 A TW102146936 A TW 102146936A TW 201434802 A TW201434802 A TW 201434802A
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- QAEPQGCJWUAQQL-UHFFFAOYSA-N ethene;tetraphenylene Chemical group C=C.C1=CC=C2C3=CC=CC=C3C3=CC=CC=C3C3=CC=CC=C3C2=C1 QAEPQGCJWUAQQL-UHFFFAOYSA-N 0.000 title abstract 4
- 150000001875 compounds Chemical class 0.000 title description 8
- 239000000203 mixture Substances 0.000 claims abstract description 63
- 229930195733 hydrocarbon Natural products 0.000 claims abstract description 61
- 150000002430 hydrocarbons Chemical class 0.000 claims abstract description 61
- 239000004215 Carbon black (E152) Substances 0.000 claims abstract description 59
- 229910052739 hydrogen Inorganic materials 0.000 claims abstract description 29
- 239000001257 hydrogen Substances 0.000 claims abstract description 29
- 239000010410 layer Substances 0.000 claims description 59
- 125000004122 cyclic group Chemical group 0.000 claims description 44
- 150000002431 hydrogen Chemical class 0.000 claims description 24
- 238000004770 highest occupied molecular orbital Methods 0.000 claims description 16
- 125000003118 aryl group Chemical group 0.000 claims description 15
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 claims description 12
- 239000012044 organic layer Substances 0.000 claims description 11
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims description 10
- 238000002347 injection Methods 0.000 claims description 9
- 239000007924 injection Substances 0.000 claims description 9
- RDOXTESZEPMUJZ-UHFFFAOYSA-N anisole Chemical compound COC1=CC=CC=C1 RDOXTESZEPMUJZ-UHFFFAOYSA-N 0.000 claims description 8
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 claims description 6
- 230000005525 hole transport Effects 0.000 claims description 5
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims description 4
- 239000003849 aromatic solvent Substances 0.000 claims description 4
- UZKWTJUDCOPSNM-UHFFFAOYSA-N methoxybenzene Substances CCCCOC=C UZKWTJUDCOPSNM-UHFFFAOYSA-N 0.000 claims description 4
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 claims description 2
- 239000008096 xylene Substances 0.000 claims description 2
- 125000004435 hydrogen atom Chemical class [H]* 0.000 abstract 1
- 229920002725 thermoplastic elastomer Polymers 0.000 description 35
- 239000000463 material Substances 0.000 description 21
- 238000000034 method Methods 0.000 description 18
- 230000008569 process Effects 0.000 description 16
- 239000000243 solution Substances 0.000 description 15
- 239000002019 doping agent Substances 0.000 description 13
- 229940126214 compound 3 Drugs 0.000 description 11
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 10
- 238000002207 thermal evaporation Methods 0.000 description 9
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 8
- 125000004432 carbon atom Chemical group C* 0.000 description 8
- 230000000052 comparative effect Effects 0.000 description 8
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 6
- 238000004630 atomic force microscopy Methods 0.000 description 6
- 230000015572 biosynthetic process Effects 0.000 description 6
- 125000005842 heteroatom Chemical group 0.000 description 6
- 229910052757 nitrogen Inorganic materials 0.000 description 6
- -1 poly(3,4-ethylenedioxythiophene) Polymers 0.000 description 6
- 238000003786 synthesis reaction Methods 0.000 description 6
- BBSNJTOHVHUCRF-UHFFFAOYSA-N 1-bromo-4-[2-(4-bromophenyl)-1,2-diphenylethenyl]benzene Chemical class C1=CC(Br)=CC=C1C(C=1C=CC=CC=1)=C(C=1C=CC(Br)=CC=1)C1=CC=CC=C1 BBSNJTOHVHUCRF-UHFFFAOYSA-N 0.000 description 5
- 229920001609 Poly(3,4-ethylenedioxythiophene) Polymers 0.000 description 5
- 125000000217 alkyl group Chemical group 0.000 description 5
- 238000000151 deposition Methods 0.000 description 5
- 230000008021 deposition Effects 0.000 description 5
- 238000004128 high performance liquid chromatography Methods 0.000 description 5
- 125000002524 organometallic group Chemical group 0.000 description 5
- 238000004528 spin coating Methods 0.000 description 5
- 230000003746 surface roughness Effects 0.000 description 5
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 4
- 229910052782 aluminium Inorganic materials 0.000 description 4
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 4
- 238000004364 calculation method Methods 0.000 description 4
- 239000000460 chlorine Substances 0.000 description 4
- 239000011521 glass Substances 0.000 description 4
- 230000005283 ground state Effects 0.000 description 4
- 229920000123 polythiophene Polymers 0.000 description 4
- 239000000843 powder Substances 0.000 description 4
- 239000000758 substrate Substances 0.000 description 4
- 238000005160 1H NMR spectroscopy Methods 0.000 description 3
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 3
- 101100451713 Saccharomyces cerevisiae (strain ATCC 204508 / S288c) HTL1 gene Proteins 0.000 description 3
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 3
- 125000001183 hydrocarbyl group Chemical group 0.000 description 3
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Substances [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 3
- 239000000047 product Substances 0.000 description 3
- 239000002904 solvent Substances 0.000 description 3
- CZDYPVPMEAXLPK-UHFFFAOYSA-N tetramethylsilane Chemical compound C[Si](C)(C)C CZDYPVPMEAXLPK-UHFFFAOYSA-N 0.000 description 3
- 238000012546 transfer Methods 0.000 description 3
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 2
- PAYRUJLWNCNPSJ-UHFFFAOYSA-N Aniline Chemical compound NC1=CC=CC=C1 PAYRUJLWNCNPSJ-UHFFFAOYSA-N 0.000 description 2
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 2
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 2
- QUSNBJAOOMFDIB-UHFFFAOYSA-N Ethylamine Chemical compound CCN QUSNBJAOOMFDIB-UHFFFAOYSA-N 0.000 description 2
- 238000005481 NMR spectroscopy Methods 0.000 description 2
- 239000000654 additive Substances 0.000 description 2
- 230000000996 additive effect Effects 0.000 description 2
- 229910052787 antimony Inorganic materials 0.000 description 2
- WATWJIUSRGPENY-UHFFFAOYSA-N antimony atom Chemical compound [Sb] WATWJIUSRGPENY-UHFFFAOYSA-N 0.000 description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 2
- 239000004305 biphenyl Substances 0.000 description 2
- 229910052796 boron Inorganic materials 0.000 description 2
- 229910052799 carbon Inorganic materials 0.000 description 2
- 229910000420 cerium oxide Inorganic materials 0.000 description 2
- 238000005260 corrosion Methods 0.000 description 2
- 230000007797 corrosion Effects 0.000 description 2
- 238000002484 cyclic voltammetry Methods 0.000 description 2
- ZUOUZKKEUPVFJK-UHFFFAOYSA-N diphenyl Chemical compound C1=CC=CC=C1C1=CC=CC=C1 ZUOUZKKEUPVFJK-UHFFFAOYSA-N 0.000 description 2
- 238000001704 evaporation Methods 0.000 description 2
- 230000008020 evaporation Effects 0.000 description 2
- KTWOOEGAPBSYNW-UHFFFAOYSA-N ferrocene Chemical compound [Fe+2].C=1C=C[CH-]C=1.C=1C=C[CH-]C=1 KTWOOEGAPBSYNW-UHFFFAOYSA-N 0.000 description 2
- 239000005457 ice water Substances 0.000 description 2
- 125000000959 isobutyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 description 2
- 238000004895 liquid chromatography mass spectrometry Methods 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 125000001624 naphthyl group Chemical group 0.000 description 2
- 230000007935 neutral effect Effects 0.000 description 2
- 239000012299 nitrogen atmosphere Substances 0.000 description 2
- BMMGVYCKOGBVEV-UHFFFAOYSA-N oxo(oxoceriooxy)cerium Chemical compound [Ce]=O.O=[Ce]=O BMMGVYCKOGBVEV-UHFFFAOYSA-N 0.000 description 2
- 229910052760 oxygen Inorganic materials 0.000 description 2
- 239000001301 oxygen Substances 0.000 description 2
- 239000003208 petroleum Substances 0.000 description 2
- 239000000523 sample Substances 0.000 description 2
- 229920006395 saturated elastomer Polymers 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 238000000859 sublimation Methods 0.000 description 2
- 230000008022 sublimation Effects 0.000 description 2
- 125000001424 substituent group Chemical group 0.000 description 2
- 239000006228 supernatant Substances 0.000 description 2
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 2
- 238000012360 testing method Methods 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- KEOLYBMGRQYQTN-UHFFFAOYSA-N (4-bromophenyl)-phenylmethanone Chemical compound C1=CC(Br)=CC=C1C(=O)C1=CC=CC=C1 KEOLYBMGRQYQTN-UHFFFAOYSA-N 0.000 description 1
- 125000001637 1-naphthyl group Chemical group [H]C1=C([H])C([H])=C2C(*)=C([H])C([H])=C([H])C2=C1[H] 0.000 description 1
- 238000001644 13C nuclear magnetic resonance spectroscopy Methods 0.000 description 1
- VZMQDZFPQYMOKJ-UHFFFAOYSA-N 4-[2-(4-anilinophenyl)-1,2-diphenylethenyl]-N-phenylaniline Chemical class N(c1ccccc1)c1ccc(cc1)C(=C(c1ccccc1)c1ccc(Nc2ccccc2)cc1)c1ccccc1 VZMQDZFPQYMOKJ-UHFFFAOYSA-N 0.000 description 1
- KDOQMLIRFUVJNT-UHFFFAOYSA-N 4-n-naphthalen-2-yl-1-n,1-n-bis[4-(n-naphthalen-2-ylanilino)phenyl]-4-n-phenylbenzene-1,4-diamine Chemical compound C1=CC=CC=C1N(C=1C=C2C=CC=CC2=CC=1)C1=CC=C(N(C=2C=CC(=CC=2)N(C=2C=CC=CC=2)C=2C=C3C=CC=CC3=CC=2)C=2C=CC(=CC=2)N(C=2C=CC=CC=2)C=2C=C3C=CC=CC3=CC=2)C=C1 KDOQMLIRFUVJNT-UHFFFAOYSA-N 0.000 description 1
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical compound [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 1
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 1
- XDTMQSROBMDMFD-UHFFFAOYSA-N Cyclohexane Chemical compound C1CCCCC1 XDTMQSROBMDMFD-UHFFFAOYSA-N 0.000 description 1
- 238000004057 DFT-B3LYP calculation Methods 0.000 description 1
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N DMSO Substances CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 1
- VGGSQFUCUMXWEO-UHFFFAOYSA-N Ethene Chemical group C=C VGGSQFUCUMXWEO-UHFFFAOYSA-N 0.000 description 1
- 239000005977 Ethylene Chemical group 0.000 description 1
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 description 1
- BDAGIHXWWSANSR-UHFFFAOYSA-N Formic acid Chemical compound OC=O BDAGIHXWWSANSR-UHFFFAOYSA-N 0.000 description 1
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 1
- BUGBHKTXTAQXES-UHFFFAOYSA-N Selenium Chemical compound [Se] BUGBHKTXTAQXES-UHFFFAOYSA-N 0.000 description 1
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
- 125000002015 acyclic group Chemical group 0.000 description 1
- 239000002671 adjuvant Substances 0.000 description 1
- 150000001412 amines Chemical class 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- 125000000129 anionic group Chemical group 0.000 description 1
- 125000002178 anthracenyl group Chemical group C1(=CC=CC2=CC3=CC=CC=C3C=C12)* 0.000 description 1
- 229910052785 arsenic Inorganic materials 0.000 description 1
- RQNWIZPPADIBDY-UHFFFAOYSA-N arsenic atom Chemical compound [As] RQNWIZPPADIBDY-UHFFFAOYSA-N 0.000 description 1
- 125000004429 atom Chemical group 0.000 description 1
- 238000000089 atomic force micrograph Methods 0.000 description 1
- 238000005284 basis set Methods 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- MUALRAIOVNYAIW-UHFFFAOYSA-N binap Chemical compound C1=CC=CC=C1P(C=1C(=C2C=CC=CC2=CC=1)C=1C2=CC=CC=C2C=CC=1P(C=1C=CC=CC=1)C=1C=CC=CC=1)C1=CC=CC=C1 MUALRAIOVNYAIW-UHFFFAOYSA-N 0.000 description 1
- 235000010290 biphenyl Nutrition 0.000 description 1
- 125000006267 biphenyl group Chemical group 0.000 description 1
- 229910052797 bismuth Inorganic materials 0.000 description 1
- JCXGWMGPZLAOME-UHFFFAOYSA-N bismuth atom Chemical compound [Bi] JCXGWMGPZLAOME-UHFFFAOYSA-N 0.000 description 1
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 description 1
- 229910052794 bromium Inorganic materials 0.000 description 1
- 238000012512 characterization method Methods 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 238000002425 crystallisation Methods 0.000 description 1
- 230000008025 crystallization Effects 0.000 description 1
- 239000011903 deuterated solvents Substances 0.000 description 1
- 238000001194 electroluminescence spectrum Methods 0.000 description 1
- 239000003480 eluent Substances 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 150000002118 epoxides Chemical class 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- 230000007717 exclusion Effects 0.000 description 1
- 238000000605 extraction Methods 0.000 description 1
- 239000000706 filtrate Substances 0.000 description 1
- 125000003983 fluorenyl group Chemical group C1(=CC=CC=2C3=CC=CC=C3CC12)* 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 125000004051 hexyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- AMGQUBHHOARCQH-UHFFFAOYSA-N indium;oxotin Chemical compound [In].[Sn]=O AMGQUBHHOARCQH-UHFFFAOYSA-N 0.000 description 1
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 238000004811 liquid chromatography Methods 0.000 description 1
- IMKMFBIYHXBKRX-UHFFFAOYSA-M lithium;quinoline-2-carboxylate Chemical compound [Li+].C1=CC=CC2=NC(C(=O)[O-])=CC=C21 IMKMFBIYHXBKRX-UHFFFAOYSA-M 0.000 description 1
- 238000004020 luminiscence type Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 230000000873 masking effect Effects 0.000 description 1
- 238000004949 mass spectrometry Methods 0.000 description 1
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 1
- 229910052753 mercury Inorganic materials 0.000 description 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
- 125000000325 methylidene group Chemical group [H]C([H])=* 0.000 description 1
- 238000013508 migration Methods 0.000 description 1
- 230000005012 migration Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000004776 molecular orbital Methods 0.000 description 1
- KLZHUQDVWUXWEZ-UHFFFAOYSA-N n-[4-[4-(n-naphthalen-1-ylanilino)phenyl]phenyl]-n-phenylnaphthalen-1-amine Chemical compound C1=CC=CC=C1N(C=1C2=CC=CC=C2C=CC=1)C1=CC=C(C=2C=CC(=CC=2)N(C=2C=CC=CC=2)C=2C3=CC=CC=C3C=CC=2)C=C1.C1=CC=CC=C1N(C=1C2=CC=CC=C2C=CC=1)C1=CC=C(C=2C=CC(=CC=2)N(C=2C=CC=CC=2)C=2C3=CC=CC=C3C=CC=2)C=C1 KLZHUQDVWUXWEZ-UHFFFAOYSA-N 0.000 description 1
- 125000004108 n-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000004123 n-propyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000002347 octyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 230000005693 optoelectronics Effects 0.000 description 1
- 150000002894 organic compounds Chemical class 0.000 description 1
- 239000011368 organic material Substances 0.000 description 1
- 150000002902 organometallic compounds Chemical group 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 229910052698 phosphorus Inorganic materials 0.000 description 1
- 239000011574 phosphorus Substances 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 229920000172 poly(styrenesulfonic acid) Polymers 0.000 description 1
- LPNYRYFBWFDTMA-UHFFFAOYSA-N potassium tert-butoxide Chemical compound [K+].CC(C)(C)[O-] LPNYRYFBWFDTMA-UHFFFAOYSA-N 0.000 description 1
- 239000011541 reaction mixture Substances 0.000 description 1
- 238000005215 recombination Methods 0.000 description 1
- 230000006798 recombination Effects 0.000 description 1
- 238000010992 reflux Methods 0.000 description 1
- 230000004044 response Effects 0.000 description 1
- 238000010079 rubber tapping Methods 0.000 description 1
- 239000012488 sample solution Substances 0.000 description 1
- 229930195734 saturated hydrocarbon Natural products 0.000 description 1
- 229910052711 selenium Inorganic materials 0.000 description 1
- 239000011669 selenium Substances 0.000 description 1
- 239000005361 soda-lime glass Substances 0.000 description 1
- 238000001179 sorption measurement Methods 0.000 description 1
- 230000003595 spectral effect Effects 0.000 description 1
- 238000001228 spectrum Methods 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 125000000547 substituted alkyl group Chemical group 0.000 description 1
- 125000003107 substituted aryl group Chemical group 0.000 description 1
- 229910052717 sulfur Inorganic materials 0.000 description 1
- 239000011593 sulfur Substances 0.000 description 1
- 239000003115 supporting electrolyte Substances 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
- 229910052718 tin Inorganic materials 0.000 description 1
- TVIVIEFSHFOWTE-UHFFFAOYSA-K tri(quinolin-8-yloxy)alumane Chemical compound [Al+3].C1=CN=C2C([O-])=CC=CC2=C1.C1=CN=C2C([O-])=CC=CC2=C1.C1=CN=C2C([O-])=CC=CC2=C1 TVIVIEFSHFOWTE-UHFFFAOYSA-K 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C211/00—Compounds containing amino groups bound to a carbon skeleton
- C07C211/43—Compounds containing amino groups bound to a carbon skeleton having amino groups bound to carbon atoms of six-membered aromatic rings of the carbon skeleton
- C07C211/54—Compounds containing amino groups bound to a carbon skeleton having amino groups bound to carbon atoms of six-membered aromatic rings of the carbon skeleton having amino groups bound to two or three six-membered aromatic rings
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K11/00—Luminescent, e.g. electroluminescent, chemiluminescent materials
- C09K11/06—Luminescent, e.g. electroluminescent, chemiluminescent materials containing organic luminescent materials
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C205/00—Compounds containing nitro groups bound to a carbon skeleton
- C07C205/06—Compounds containing nitro groups bound to a carbon skeleton having nitro groups bound to carbon atoms of six-membered aromatic rings
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C211/00—Compounds containing amino groups bound to a carbon skeleton
- C07C211/43—Compounds containing amino groups bound to a carbon skeleton having amino groups bound to carbon atoms of six-membered aromatic rings of the carbon skeleton
- C07C211/57—Compounds containing amino groups bound to a carbon skeleton having amino groups bound to carbon atoms of six-membered aromatic rings of the carbon skeleton having amino groups bound to carbon atoms of six-membered aromatic rings being part of condensed ring systems of the carbon skeleton
- C07C211/58—Naphthylamines; N-substituted derivatives thereof
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D209/00—Heterocyclic compounds containing five-membered rings, condensed with other rings, with one nitrogen atom as the only ring hetero atom
- C07D209/02—Heterocyclic compounds containing five-membered rings, condensed with other rings, with one nitrogen atom as the only ring hetero atom condensed with one carbocyclic ring
- C07D209/04—Indoles; Hydrogenated indoles
- C07D209/08—Indoles; Hydrogenated indoles with only hydrogen atoms or radicals containing only hydrogen and carbon atoms, directly attached to carbon atoms of the hetero ring
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D209/00—Heterocyclic compounds containing five-membered rings, condensed with other rings, with one nitrogen atom as the only ring hetero atom
- C07D209/56—Ring systems containing three or more rings
- C07D209/80—[b, c]- or [b, d]-condensed
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Abstract
Description
本發明對申請於2012年12月31號的PCT/CN2012/088034主張優先權,其全部內容以引用方式併入於此。 The present invention claims priority to PCT/CN2012/088034, filed on Dec. 31, 2012, the entire disclosure of which is hereby incorporated by reference.
本發明係有關於以四伸苯乙烯為主之化合物及包含該化合物之OLED裝置。 The present invention relates to a tetrastyrene-based compound and an OLED device comprising the same.
OLED(有機發光二極體,organic light-emitting diode)是一發光二極體(LED),其中,該電致發光層(emissive electroluminescent layer)是一種有機化合物的薄膜,它發出光以回應電流。典型的OLED具有多層結構,並且通常包括一銦錫氧化物(ITO)陽極及一金屬陰極。在ITO陽極和金屬陰極之間夾有幾個有機層,例如電洞注入層(HIL)、電洞傳輸層(HTL)、發光材料層(EML)、電子傳輸層(ETL),及一個電子注入層(EIL)。為了輔助電洞注入,並達成一個平滑的表面,一電動注入層(HIL),位於ITO陽極及一電洞傳輸層之間,是經常被期望的。最普遍 使用的HIL材料是聚(3,4-乙烯二氧噻吩)/聚(苯乙烯磺酸)錯合物(PEDOT/PSS)。然而,PEDOT/PSS製備的OLED因為腐蝕而展現了一個很短的使用期限,是由PEDOT/PSS的高酸度所引起。此外,PEDOT/PSS溶液經常是水基的。當用於OLED,殘留於薄膜中的微量濕氣對引起對電路的腐蝕並導致裝置衰變。因此,對於HIL材料存在持續的需求,特別是非水性的HIL組成物,對於OLED的應用。 An OLED (organic light-emitting diode) is a light emitting diode (LED), wherein the emissive electroluminescent layer is a film of an organic compound that emits light in response to a current. A typical OLED has a multilayer structure and typically includes an indium tin oxide (ITO) anode and a metal cathode. There are several organic layers sandwiched between the ITO anode and the metal cathode, such as a hole injection layer (HIL), a hole transport layer (HTL), an luminescent material layer (EML), an electron transport layer (ETL), and an electron injection. Layer (EIL). To aid in hole injection and achieve a smooth surface, a motorized injection layer (HIL), located between the ITO anode and a hole transport layer, is often desired. most common The HIL material used was poly(3,4-ethylenedioxythiophene)/poly(styrenesulfonic acid) complex (PEDOT/PSS). However, OLEDs prepared by PEDOT/PSS exhibit a very short life due to corrosion and are caused by the high acidity of PEDOT/PSS. In addition, PEDOT/PSS solutions are often water based. When used in OLEDs, the traces of moisture remaining in the film cause corrosion to the circuit and cause the device to decay. Therefore, there is a continuing need for HIL materials, particularly non-aqueous HIL compositions, for OLED applications.
現有的多層OLED裝置是以熱沉積的方式製備。 熱沉積,然而,有其缺點。熱沉積需要在高真空下熱蒸發,這增加了製造的複雜性並使得昂貴的OLED材料的利用率非常低效率(通常小於20%)。此外,使用蒸鍍(evaporation)遮罩像素化限制了OLED裝置的擴充性和解析度。 Existing multilayer OLED devices are prepared by thermal deposition. Thermal deposition, however, has its drawbacks. Thermal deposition requires thermal evaporation under high vacuum, which increases manufacturing complexity and makes the utilization of expensive OLED materials very inefficient (typically less than 20%). Furthermore, the use of evaporation masking pixelation limits the scalability and resolution of OLED devices.
溶液製程,例如例如噴墨及噴嘴印刷,成為可行 的製備OLED裝置的熱沉積製程技術的替代方案。不幸的是,現有的OLED材料,例如N,N'-二-[(1-萘基)-N,N'-二苯基]-1,1'-聯苯)-4,4'-二胺(NPB),及4,4',4'-三[2-萘基(苯基)胺基]三苯基胺(2-TNATA),由於不良的薄膜形態和旋轉鑄塗時的結晶是不適合溶液製程的。 Solution processes such as, for example, inkjet and nozzle printing, become feasible An alternative to the thermal deposition process technology for preparing OLED devices. Unfortunately, existing OLED materials such as N,N'-di-[(1-naphthyl)-N,N'-diphenyl]-1,1'-biphenyl)-4,4'-di Amine (NPB), and 4,4',4'-tris[2-naphthyl(phenyl)amino]triphenylamine (2-TNATA), due to poor film morphology and crystallization during spin casting Not suitable for solution process.
因此,存在一種對於可用於溶液製程以製備OLED裝置的OLED材料的需求。還存在一種對於通用於熱沉積及溶液製程以製備OLED裝置的OLED材料的需求。 Therefore, there is a need for an OLED material that can be used in a solution process to prepare an OLED device. There is also a need for OLED materials that are commonly used in thermal deposition and solution processes to make OLED devices.
本發明揭露提供一種組成物,其包含一具有表2 實施例1-25中任一種結構的四伸苯乙烯(TPE)。 The present invention provides a composition comprising one having a table 2 Tetrastyrene (TPE) of any of the structures of Examples 1-25.
在一實施方案中,本發明揭露提供一種組成物,其包含一結構(I)的四伸苯乙烯、一結構(IA)的四伸苯乙烯,或其等之組合,如下所示。 In one embodiment, the present invention provides a composition comprising a tetra-styrene of structure (I), a tetra-styrene of structure (IA), or combinations thereof, as shown below.
對於每一結構(I)及(IA),R1、R2、R3及R4為相同 或不同。R1、R2、R3及R4是各自獨立地選自於氫、烴、經取代的烴,或其等之組合;或R1及R2是各自獨立地選自於氫、烴、經取代的烴,或其等之組合;及R3及R4形成一環狀結構;或R3及R4是各自獨立地選自於氫、烴、經取代的烴,或其等之組合;及R1及R2形成一環狀結構;或R1及R2形成一環狀結構,及R3及R4形成一環狀結構。 For each of the structures (I) and (IA), R 1 , R 2 , R 3 and R 4 are the same or different. R 1 , R 2 , R 3 and R 4 are each independently selected from hydrogen, a hydrocarbon, a substituted hydrocarbon, or a combination thereof; or R 1 and R 2 are each independently selected from hydrogen, hydrocarbon, and a substituted hydrocarbon, or a combination thereof, and R 3 and R 4 form a cyclic structure; or R 3 and R 4 are each independently selected from hydrogen, a hydrocarbon, a substituted hydrocarbon, or the like; And R 1 and R 2 form a cyclic structure; or R 1 and R 2 form a cyclic structure, and R 3 and R 4 form a cyclic structure.
本發明揭露亦提供一種由本發明之組成物所形成之薄膜,該組成物包含該結構(I)的四伸苯乙烯、該結構(IA)的四伸苯乙烯,或其等之組合。 The present invention also provides a film formed from the composition of the present invention comprising the tetra-styrene of the structure (I), the tetra-styrene of the structure (IA), or a combination thereof.
本發明揭露亦提供一種電子裝置,其包含至少一由本發明組成物所形成的組件,該組成物包含該結構(I)的四伸苯乙烯、該結構(IA)的四伸苯乙烯,或其等之組合。 The present invention also provides an electronic device comprising at least one component formed from the composition of the present invention, the composition comprising the tetra-styrene of the structure (I), the tetra-styrene of the structure (IA), or A combination of the same.
本發明組成物的優點在於,它可以用於熱蒸鍍及溶液製程兩種製程。 An advantage of the composition of the present invention is that it can be used in both thermal evaporation and solution processes.
圖1是根據本發明的實施方案的OLED裝置的一電流-電壓曲線圖。 1 is a current-voltage graph of an OLED device in accordance with an embodiment of the present invention.
圖2是一曲線圖顯示根據本發明的實施方案的OLED裝置的發光效率。 2 is a graph showing luminous efficiency of an OLED device according to an embodiment of the present invention.
圖3是一曲線圖顯示根據本發明的實施方案的OLED裝置的亮度強度隨著時間的衰減。 3 is a graph showing attenuation of luminance intensity over time of an OLED device in accordance with an embodiment of the present invention.
本發明揭露提供一種組成物,其包含一具有表2實施例1-25中任一種結構的四伸苯乙烯(TPE)。 The present invention provides a composition comprising a tetra-styrene (TPE) having the structure of any of Embodiments 1-25 of Table 2.
在一實施方案中,本發明揭露提供一種組成物,其包含下述:一結構(I)的四伸苯乙烯、一結構(IA)的四伸苯乙烯,或其等之組合,如下所示。 In one embodiment, the present invention provides a composition comprising the following: a tetra-styrene of structure (I), a tetra-styrene of structure (IA), or combinations thereof, as shown below .
對於每一結構(I)及(IA),R1、R2、R3及R4為相同 或不同。R1、R2、R3及R4是各自獨立地選自於氫、烴、經取代的烴,或其等之組合;或R1及R2是各自獨立地選自於氫、烴、經取代的烴,或其等之組合;及R3及R4形成一環狀結構;或R3及R4是各自獨立地選自於氫、烴、經取代的烴,或其等之組合;及R1及R2形成一環狀結構;或R1及R2形成一環狀結構,及R3及R4形成一環狀結構。 For each of the structures (I) and (IA), R 1 , R 2 , R 3 and R 4 are the same or different. R 1, R 2, R 3 and R 4 are each independently selected from hydrogen, a hydrocarbon, substituted hydrocarbon, or a combination of the like; or R 1 and R 2 are each independently selected from hydrogen, a hydrocarbon, a substituted hydrocarbon, or a combination thereof, and R 3 and R 4 form a cyclic structure; or R 3 and R 4 are each independently selected from hydrogen, a hydrocarbon, a substituted hydrocarbon, or a combination thereof. And R 1 and R 2 form a cyclic structure; or R 1 and R 2 form a cyclic structure, and R 3 and R 4 form a cyclic structure.
在一實施方案中,R1及R2是各自獨立地選自於 氫、烴、經取代的烴,或其等之組合;及R3及R4形成一環狀結構。 In one embodiment, R 1 and R 2 are each independently selected from hydrogen, a hydrocarbon, a substituted hydrocarbon, or combinations thereof; and R 3 and R 4 form a cyclic structure.
在一實施方案中,R3及R4是各自獨立地選自於 氫、烴、經取代的烴,或其等之組合;及R1及R2形成一環狀結構。 In one embodiment, R 3 and R 4 are each independently selected from hydrogen, a hydrocarbon, a substituted hydrocarbon, or combinations thereof; and R 1 and R 2 form a cyclic structure.
在一實施方案中,R1及R2形成一環狀結構,及 R3及R4形成一環狀結構。 In one embodiment, R 1 and R 2 form a cyclic structure, and R 3 and R 4 form a cyclic structure.
結構(I)及和結構(IA)的非標識的取代基可以選 自於氫、烴、經取代的烴、環狀結構例如苯基、萘基、蒽基,和聯苯基,或其等之組合。在一實施方案中,結構(I)及和結構(IA)的非標識的取代基是氫。 Non-identifying substituents of structure (I) and structure (IA) may be selected From hydrogen, hydrocarbons, substituted hydrocarbons, cyclic structures such as phenyl, naphthyl, anthracenyl, and biphenyl, or combinations thereof. In one embodiment, the non-identifying substituents of structures (I) and (IA) are hydrogen.
「烴(hydrocarbon)」,如用於此的,是指僅包含 氫和碳的化合物。該烴包含1至50個碳原子。該烴可以是(i)有支鏈或無支鏈的、(ii)飽和或不飽和或芳族的、(iii)環狀或非環狀的,及(iv)(i)至(iii)的任意組合。該術語「烴」包含「一烴基(hydrocarbyl group)」(或「氫羰基(hydrocarbonyl group)」),這是一種具有價數(通常為一價)的烴基取代基。在一實施方案中,該烴包含1至30個碳原 子,或1至24個碳原子,或1至20個碳原子,或1至12個碳原子,或1至6個碳原子。 "hydrocarbon", as used herein, means only a compound of hydrogen and carbon. The hydrocarbon contains from 1 to 50 carbon atoms. The hydrocarbon may be (i) branched or unbranched, (ii) saturated or unsaturated or aromatic, (iii) cyclic or acyclic, and (iv) (i) to (iii) Any combination. The term "hydrocarbon" encompasses "hydrocarbyl group" (or "hydrocarbonyl group"), which is a valence (usually monovalent) hydrocarbyl substituent. In one embodiment, the hydrocarbon comprises from 1 to 30 carbon atoms a sub, or 1 to 24 carbon atoms, or 1 to 20 carbon atoms, or 1 to 12 carbon atoms, or 1 to 6 carbon atoms.
一「經取代的烴(substituted hydrocarbon)」,如本文所用的,是指一種烴,其包含一個或多個雜原子。「雜原子」是指非為碳或氫的原子。雜原子的非限制性實例包含:氟、氯、溴、氮、氧、磷、硼、硫、矽、銻、鋁、錫、砷、硒,及鍺。 A "substituted hydrocarbon", as used herein, refers to a hydrocarbon containing one or more heteroatoms. "Hetero atom" means an atom other than carbon or hydrogen. Non-limiting examples of heteroatoms include: fluorine, chlorine, bromine, nitrogen, oxygen, phosphorus, boron, sulfur, antimony, bismuth, aluminum, tin, arsenic, selenium, and antimony.
一「未經取代的烴」是指一種不包含雜原子的烴。 An "unsubstituted hydrocarbon" means a hydrocarbon that does not contain a hetero atom.
一「環狀結構」,如本文所用的,是一種由一烴或一經取代的烴組成的環,且該環狀結構可以是飽和的或不飽和的,且該環狀結構可包含一個、或兩個,或兩個以上的環。 A "cyclic structure", as used herein, is a ring composed of a hydrocarbon or a substituted hydrocarbon, and the cyclic structure may be saturated or unsaturated, and the cyclic structure may comprise one, or Two, or more than two rings.
在一實施方案中,該組成物包含一具有結構(I)的四伸苯乙烯及其異構物。結構(I)提供如下。 In one embodiment, the composition comprises a tetra-styrene having the structure (I) and isomers thereof. Structure (I) is provided below.
R1、R2、R3及R4為相同或不同。R1-R4是各自獨立地選自於氫、烴、經取代的烴,或其等之組合。 R 1 , R 2 , R 3 and R 4 are the same or different. R 1 -R 4 are each independently selected from hydrogen, a hydrocarbon, a substituted hydrocarbon, or a combination thereof.
在一實施方案中,R1-R4是各自獨立地選自於 氫、經取代的或未經取代的烷基、經取代的或未經取代的芳基,及其等之組合。 In one embodiment, R 1 -R 4 are each independently selected from hydrogen, substituted or unsubstituted alkyl, substituted or unsubstituted aryl, and combinations thereof.
一「烷基」是直鏈、有支鏈或無支鏈的、飽和的 烴基團。合適的烷基包括,例如,甲基、乙基、正丙基、異丙基、正丁基、叔丁基、異丁基(或2-甲基丙基)、己基、辛基等。在一實施方案中,該烷基具有介於1至30,或介於1至24,或介於1至20,或介於1至12,或介於1至6個碳原子。 An "alkyl group" is linear, branched or unbranched, saturated Hydrocarbon group. Suitable alkyl groups include, for example, methyl, ethyl, n-propyl, isopropyl, n-butyl, t-butyl, isobutyl (or 2-methylpropyl), hexyl, octyl and the like. In one embodiment, the alkyl group has from 1 to 30, or from 1 to 24, or from 1 to 20, or from 1 to 12, or from 1 to 6 carbon atoms.
術語「經取代的烷基」,如本文所用的,是指如 剛才所述的烷基其中該烴基團包括一個或多個雜原子。 The term "substituted alkyl" as used herein refers to The alkyl group just described wherein the hydrocarbon group comprises one or more heteroatoms.
一「芳基」是芳族取代基,其可以是單個芳香環 或多個芳香環稠合在一起、共價連接,或連接到一個共同的基團如亞甲基部分或亞乙基部分。該(等)芳香環可以包括苯基、萘基、蒽基,及聯苯基等。在特定的實施方案中,該芳基具有介於6至50,或介於6至30,或介於6至24,或介於6至20,或介於6至12個碳原子。 An "aryl group" is an aromatic substituent which may be a single aromatic ring Or a plurality of aromatic rings are fused together, covalently linked, or linked to a common group such as a methylene moiety or an ethylene moiety. The (equal) aromatic ring may include a phenyl group, a naphthyl group, a fluorenyl group, a biphenyl group, and the like. In a particular embodiment, the aryl group has from 6 to 50, or from 6 to 30, or from 6 to 24, or from 6 to 20, or from 6 to 12 carbon atoms.
術語「經取代的芳基」,如本文所用的,是指如 剛才所述的芳基其芳香族取代基包括一個或多個雜原子。 The term "substituted aryl", as used herein, means The aryl group just described has an aromatic substituent comprising one or more heteroatoms.
在一實施方案中,本發明組成物包含結構(I)的 異構物。該結構(I)的TPE包括Z-異構物、E-異構物,及其等之組合。 In one embodiment, the composition of the invention comprises structure (I) Isomer. The TPE of structure (I) includes Z-isomers, E-isomers, and combinations thereof.
該Z-異構物具有如下所示的結構(I)。在一實施 方案中,該組成物包含結構(I),其中R1、R2、R3及R4的定義如上。 This Z-isomer has the structure (I) shown below. In one embodiment, the composition comprises structure (I) wherein R 1 , R 2 , R 3 and R 4 are as defined above.
該E-異構物具有如下所示的結構(IA)。在一實 施方案中,該組成物包含結構(IA),其中R1、R2、R3及R4的定義如上。 This E-isomer has the structure (IA) shown below. In one embodiment, the composition comprises structure (IA) wherein R 1 , R 2 , R 3 and R 4 are as defined above.
本發明組成物可以包含由大於零,或1wt%至99 wt% Z-異構物(結構I)及由少於100wt%,或99wt%至1wt% E-異構物(結構IA)。 Compositions of the invention may comprise from greater than zero, or from 1 wt% to 99 Wt% Z-isomer (Structure I) and from less than 100 wt%, or 99 wt% to 1 wt% E-isomer (Structure IA).
在一實施方案中,該組成物包含由大於零,或 1wt%,或10wt%,或25wt%,或50wt%,或75wt%,或90wt%,或99wt% Z-異構物;及由少於100wt%,或99 wt%,或90wt%,或75wt%,或50wt%,或25wt%,或10wt%,或1wt% E-異構物。重量百分比是基於該組成物的總重量。 In one embodiment, the composition comprises greater than zero, or 1 wt%, or 10 wt%, or 25 wt%, or 50 wt%, or 75 wt%, or 90 wt%, or 99 wt% Z-isomer; and from less than 100 wt%, or 99 Wt%, or 90 wt%, or 75 wt%, or 50 wt%, or 25 wt%, or 10 wt%, or 1 wt% E-isomer. The weight percentage is based on the total weight of the composition.
在一實施方案中,一個、一些,或全部的R1至 R4包含一或多個芳基。在一進一步的實施方案中,每個R1-R4包含至少一或多個芳基。 In one embodiment, one, some, or all of R 1 to R 4 comprise one or more aryl groups. In a further embodiment, each R 1 -R 4 comprises at least one or more aryl groups.
在一實施方案中,R1及R2形成一環狀結構。在 一進一步的實施方案中,每個R1及R2包括一芳基,且R1及R2形成一環狀結構。 In one embodiment, R 1 and R 2 form a cyclic structure. In a further embodiment, each of R 1 and R 2 includes an aryl group, and R 1 and R 2 form a cyclic structure.
在一實施方案中,R3及R4形成一環狀結構。在 一進一步的實施方案中,每個R3及R4包括一芳基,且R3及R4形成一環狀結構。 In one embodiment, R 3 and R 4 form a cyclic structure. In a further embodiment, each of R 3 and R 4 includes an aryl group, and R 3 and R 4 form a cyclic structure.
在一實施方案中,R1及R2形成一環狀結構,且 R3及R4形成另一環狀結構。在一進一步的實施方案中,每個R1及R2包括一芳基,且R1及R2形成一環狀結構,且每個R3及R4包括一芳基,且R3及R4形成一環狀結構。 In one embodiment, R 1 and R 2 form a cyclic structure, and R 3 and R 4 form another cyclic structure. In a further embodiment, each of R 1 and R 2 includes an aryl group, and R 1 and R 2 form a cyclic structure, and each of R 3 and R 4 includes an aryl group, and R 3 and R 4 forms a ring structure.
在一實施方案中,該TPE具有選自於表2的結構 1-25之結構。 In one embodiment, the TPE has a structure selected from Table 2 Structure of 1-25.
在一實施方案中,該TPE具有選自於表2的結構 1-5、7-8、10-11,及13-25之結構。 In one embodiment, the TPE has a structure selected from Table 2 Structures of 1-5, 7-8, 10-11, and 13-25.
在一實施方案中,該TPE具有選自於表2的結構 1、2,及3之結構。 In one embodiment, the TPE has a structure selected from Table 2 The structure of 1, 2, and 3.
在一實施方案中,該TPE具有選自於表2的結構 1-3,及6-25之結構。 In one embodiment, the TPE has a structure selected from Table 2 Structures 1-3, and 6-25.
在一實施方案中,該TPE具有選自於表2的結構 1-3、7-8、10-11,及13-25之結構。 In one embodiment, the TPE has a structure selected from Table 2 Structures of 1-3, 7-8, 10-11, and 13-25.
在一實施方案中,每個R1至R4是苯基。在一進 一步的實施方案中,該TPE具有下面的結構(II)。 In one embodiment, each of R 1 to R 4 is phenyl. In a further embodiment, the TPE has the following structure (II).
在一實施方案中,該TPE之每個R1至R4是苯 基。在一進一步的實施方案中,該TPE是如下所示的Z-異構物(II)及E-異構物(IIA)的混合物。 In one embodiment, each of the TPE of R 1 to R 4 is phenyl. In a further embodiment, the TPE is a mixture of Z-isomer (II) and E-isomer (IIA) as shown below.
在一實施方案中,結構(I)、結構(IA),或其等 之組合的TPE,具有由-4.30電子伏特,eV)至-5.20eV,或由 -4.3eV至-4.9eV之一經計算的最高佔有分子軌域(Highest Occupied Molecular Orbital,HOMO)能階。 In one embodiment, structure (I), structure (IA), or the like a combination of TPE, having from -4.30 eV, eV) to -5.20 eV, or by Highest Occupied Molecular Orbital (HOMO) energy level calculated from -4.3eV to -4.9eV.
在一實施方案中,結構(I)、結構(IA),或其等 之組合的TPE,具有由-4.3eV至-4.6eV之經計算的HOMO能階。 In one embodiment, structure (I), structure (IA), or the like The combined TPE has a calculated HOMO energy level from -4.3 eV to -4.6 eV.
在一實施方案中,結構(I)的TPE,具有由700至 1300g/莫耳之分子量(MW)。在一進一步的實施方案中,結構(I)的TPE,具有由800至1200g/莫耳之分子量。 In one embodiment, the TPE of structure (I) has from 700 to Molecular weight (MW) of 1300 g/mole. In a further embodiment, the TPE of structure (I) has a molecular weight of from 800 to 1200 g/mole.
在一實施方案中,包含結構(I)、結構(IA),或其 等之組合的TPE具有由500至1500g/莫耳之重量平均分子量(Mw)。 In one embodiment, comprising structure (I), structure (IA), or The TPE of the combination has a weight average molecular weight (Mw) of from 500 to 1500 g/mole.
在一實施方案中,該組成物是一溶液。該溶液 包括一芳香族溶劑及本發明TPE組成物。該TPE具有結構(I)、結構(IA),或其等之一組合。該TPE是溶解於該溶劑。在一實施方案中,該芳香族溶劑是選自於二甲苯、甲苯、苯、苯甲醚(anisole),或其等之組合。 In one embodiment, the composition is a solution. The solution An aromatic solvent and a TPE composition of the invention are included. The TPE has a combination of structure (I), structure (IA), or the like. The TPE is dissolved in the solvent. In one embodiment, the aromatic solvent is selected from the group consisting of xylene, toluene, benzene, anisole, or combinations thereof.
本發明組成物可以包含此處揭露的兩種或更多 種實施方式。 Compositions of the invention may comprise two or more of the groups disclosed herein An embodiment.
本發明提供了一由包括以下的組成物所形成的薄膜:具有實施例1-25的任何一結構之該TEP、結構(I)的該TEP、結構(IA)的該TEP,或其等之組合。結構(I)的該TEP及結構(IA)的該TEP可以是如上所述的任何相應的TEP。 The present invention provides a film formed from a composition comprising: the TEP having any of the structures of Examples 1-25, the TEP of the structure (I), the TEP of the structure (IA), or the like combination. The TEP of structure (I) and the TEP of structure (IA) may be any corresponding TEP as described above.
在一實施方案中,該薄膜包括一結構(I)的該 TEP、一結構(IA)的該TEP,或其等之一組合,具有如下的結構。 In one embodiment, the film comprises a structure (I) of the The TEP, the TEP of a structure (IA), or a combination thereof, has the following structure.
對於各結構(I)及結構(IA),R1、R2、R3及R4為相 同或不同。R1、R2、R3及R4是各自獨立地選自於氫、烴、經取代的烴,或其等之組合;或R1及R2是各自獨立地選自於氫、烴、經取代的烴,或其等之組合;及R3及R4形成一環狀結構;或R3及R4是各自獨立地選自於氫、烴、經取代的烴,或其等之組合;及R1及R2形成一環狀結構;或R1及R2形成一環狀結構,及R3及R4形成一環狀結構。 For each structure (I) and structure (IA), R 1 , R 2 , R 3 and R 4 are the same or different. R 1, R 2, R 3 and R 4 are each independently selected from hydrogen, a hydrocarbon, substituted hydrocarbon, or a combination of the like; or R 1 and R 2 are each independently selected from hydrogen, a hydrocarbon, a substituted hydrocarbon, or a combination thereof, and R 3 and R 4 form a cyclic structure; or R 3 and R 4 are each independently selected from hydrogen, a hydrocarbon, a substituted hydrocarbon, or a combination thereof. And R 1 and R 2 form a cyclic structure; or R 1 and R 2 form a cyclic structure, and R 3 and R 4 form a cyclic structure.
在一實施方案中,R1及R2是各自獨立地選自於 氫、烴、經取代的烴,或其等之組合;及R3及R4形成一環狀結構。 In one embodiment, R 1 and R 2 are each independently selected from hydrogen, a hydrocarbon, a substituted hydrocarbon, or combinations thereof; and R 3 and R 4 form a cyclic structure.
在一實施方案中,R3及R4是各自獨立地選自於 氫、烴、經取代的烴,或其等之組合;及R1及R2形成一環狀結構。 In one embodiment, R 3 and R 4 are each independently selected from hydrogen, a hydrocarbon, a substituted hydrocarbon, or combinations thereof; and R 1 and R 2 form a cyclic structure.
在一實施方案中,R1及R2形成一環狀結構,及 R3及R4形成一環狀結構。 In one embodiment, R 1 and R 2 form a cyclic structure, and R 3 and R 4 form a cyclic structure.
在一實施方案中,該薄膜包含至少兩層,A層 及B層。A層包括本發明TPE組成物或是另外由一組成物所形成者,該組成物包含結構(I)的該TPE、結構(IA)的該TPE,或其等之組合。在一進一步的實施方案中,R1至R4是各自獨立地選自於氫、烴、經取代的烴,及其等之組合。 In one embodiment, the film comprises at least two layers, layer A and layer B. The A layer comprises or alternatively is formed from a TPE composition of the invention comprising the TPE of structure (I), the TPE of structure (IA), or a combination thereof. In a further embodiment, R 1 to R 4 are each independently selected from the group consisting of hydrogen, a hydrocarbon, a substituted hydrocarbon, and the like.
在一實施方案中,A層是一電洞注入層。在一 進一步的實施方案中,該A層是由一組成物所形成的電動注入層,該組成物包含結構(I)的該TEP、結構(IA)的該TEP,或其等之組合,且該組成物具有一由-4.3eV至-4.6eV的HOMO能階。 In one embodiment, the A layer is a hole injection layer. In a In a further embodiment, the A layer is an electrospray layer formed of a composition comprising the TEP of structure (I), the TEP of structure (IA), or a combination thereof, and the composition The object has a HOMO energy level from -4.3 eV to -4.6 eV.
在一實施方案中,B層是一電洞傳輸層。 In one embodiment, layer B is a hole transport layer.
在一實施方案中,A層的厚度是由5nm至 500nm,或由5nm至100nm,或由5nm至50nm,以及B層的厚度是由5nm至500nm,或由5nm至100nm,或由5nm至50nm。 In one embodiment, the thickness of layer A is from 5 nm to 500 nm, or from 5 nm to 100 nm, or from 5 nm to 50 nm, and the thickness of the B layer is from 5 nm to 500 nm, or from 5 nm to 100 nm, or from 5 nm to 50 nm.
在一實施方案中,A層更包含一p型摻雜劑 (p-type dopant)。在一進一步的實施方案中,該p型摻雜劑是一有機金屬化合物或一有機金屬鹽。 In one embodiment, the A layer further comprises a p-type dopant (p-type dopant). In a further embodiment, the p-type dopant is an organometallic compound or an organometallic salt.
在一實施方案中,該p型摻雜劑是一包含至少一
苯基之有機金屬鹽。在一進一步的實施方案中,該有機金屬鹽的陰離子組分包含一硼原子。在另一進一步的實施方
案中,該有機金屬鹽具有選自於下列其中一種的結構:
在一實施方案中,該有機金屬鹽具有該結構:
在一實施方案中,A層中摻雜劑的含量是由1重量百分比(wt%)至99wt%,或由1wt%至50wt%,或由1wt%至30wt%,基於該組成物的重量。 In one embodiment, the amount of dopant in layer A is from 1 weight percent (wt%) to 99 wt%, or from 1 wt% to 50 wt%, or from 1 wt% to 30 wt%, based on the weight of the composition.
本發明薄膜可以包含此處揭露的兩種或更多種實施方式。 The films of the present invention may comprise two or more embodiments as disclosed herein.
本發明揭露提供一電子裝置包含至少一由一組成物所形成的組件,該組成物包含具有實施例1-25中任一種結構的四伸苯乙烯、結構(I)的四伸苯乙烯、結構(IA)的四伸苯乙烯,或其等之組合。結構(I)的該TEP及結構(IA)的該TEP可以是如上所述的任何相應的TEP。 The present invention provides an electronic device comprising at least one component formed of a composition comprising tetra-styrene having the structure of any of embodiments 1-25, tetra-styrene of structure (I), structure (IA) Tetrastyrene, or a combination thereof. The TEP of structure (I) and the TEP of structure (IA) may be any corresponding TEP as described above.
在一實施方案中,該電子裝置包括一結構(I)的該TEP、一結構(IA)的該TEP,或其等之組合,具有如下的 結構。 In one embodiment, the electronic device includes the TEP of the structure (I), the TEP of a structure (IA), or a combination thereof, and has the following structure.
對於每一結構(I)及結構(IA),R1、R2、R3及R4為 相同或不同。R1、R2、R3及R4是各自獨立地選自於氫、烴、經取代的烴,或其等之組合;或R1及R2是各自獨立地選自於氫、烴、經取代的烴,或其等之組合;及R3及R4形成一環狀結構;或R3及R4是各自獨立地選自於氫、烴、經取代的烴,或其等之組合;及R1及R2形成一環狀結構;或R1及R2形成一環狀結構,及R3及R4形成一環狀結構。 For each structure (I) and structure (IA), R 1 , R 2 , R 3 and R 4 are the same or different. R 1, R 2, R 3 and R 4 are each independently selected from hydrogen, a hydrocarbon, substituted hydrocarbon, or a combination of the like; or R 1 and R 2 are each independently selected from hydrogen, a hydrocarbon, a substituted hydrocarbon, or a combination thereof, and R 3 and R 4 form a cyclic structure; or R 3 and R 4 are each independently selected from hydrogen, a hydrocarbon, a substituted hydrocarbon, or a combination thereof. And R 1 and R 2 form a cyclic structure; or R 1 and R 2 form a cyclic structure, and R 3 and R 4 form a cyclic structure.
在一實施方案中,R1及R2是各自獨立地選自於 氫、烴、經取代的烴,或其等之組合;及R3及R4形成一環狀結構。 In one embodiment, R 1 and R 2 are each independently selected from hydrogen, a hydrocarbon, a substituted hydrocarbon, or combinations thereof; and R 3 and R 4 form a cyclic structure.
在一實施方案中,R3及R4是各自獨立地選自於 氫、烴、經取代的烴,或其等之組合;及R1及R2形成一環狀結構。 In one embodiment, R 3 and R 4 are each independently selected from hydrogen, a hydrocarbon, a substituted hydrocarbon, or combinations thereof; and R 1 and R 2 form a cyclic structure.
在一實施方案中,R1及R2形成一環狀結構,及 R3及R4形成一環狀結構。 In one embodiment, R 1 and R 2 form a cyclic structure, and R 3 and R 4 form a cyclic structure.
在一實施方案中,該電子裝置包含至少一包含 本發明組成物之層,該組成物含有具有結構(I)的該TPE、結構(IA)的該TPE,或其等之組合。 In an embodiment, the electronic device includes at least one A layer of a composition of the invention comprising the TPE of structure (I), the TPE of structure (IA), or a combination thereof.
在一實施方案中,該電子裝置包括一第一電 極。 In an embodiment, the electronic device includes a first electrical pole.
在一實施方案中,該電子裝置包括一設置在該 第一電極上的第二電極。 In an embodiment, the electronic device includes a a second electrode on the first electrode.
在一實施方案中,該電子裝置包括一設置在該 第一電極與該第二電極之間的有機層。該有機層包括本發明包含結構(I)的該TPE、結構(IA)的該TPE,或其等之組合的組成物。 In an embodiment, the electronic device includes a An organic layer between the first electrode and the second electrode. The organic layer comprises a composition comprising the TPE of structure (I), the TPE of structure (IA), or a combination thereof, according to the invention.
在一實施方案中,該有機層是A層且A層是一電 洞注入層。 In one embodiment, the organic layer is an A layer and the A layer is an electric Hole injection layer.
在一實施方案中,該電子裝置包括一第二B 層。 In an embodiment, the electronic device includes a second B Floor.
在一實施方案中,B層是一電洞傳輸層。 In one embodiment, layer B is a hole transport layer.
在一實施方案中,A層與B層接觸。 In one embodiment, layer A is in contact with layer B.
在一實施方案中,該電子裝置包括一發光層 (emitting layer)。 In an embodiment, the electronic device includes a light emitting layer (emitting layer).
在一實施方案中,A層的厚度是由1nm至 1000nm,或由2nm至500nm,或由5nm至200nm。B層的厚度是由1nm至1000nm,或由2nm至500nm,或由5nm至200nm。 In one embodiment, the thickness of layer A is from 1 nm to 1000 nm, or from 2 nm to 500 nm, or from 5 nm to 200 nm. The thickness of the B layer is from 1 nm to 1000 nm, or from 2 nm to 500 nm, or from 5 nm to 200 nm.
在一實施方案中,該電子裝置是一OLED(有機 發光二極體)。 In one embodiment, the electronic device is an OLED (organic Light-emitting diode).
在一實施方案中,該電子裝置包括一是一ITO 層的第一電極。該電子裝置還包括一HIL層,A層,是含有本發明具有結構(I)的該TPE、結構(II)的該TPE,或其等之組合的TPE組成物。該電子裝置還包括一HTL層,B層。該A層的TPE組成物具有一介於ITO層之HOMO能階及HTL材料之HOMO能階之間HOMO能階。在一實施方案中,A層的TPE組成物具有由-4.3eV至-4.6eV的經計算之HOMO值。 In one embodiment, the electronic device includes an ITO The first electrode of the layer. The electronic device further includes an HIL layer, the A layer, which is a TPE composition comprising the TPE of the structure (I) of the invention, the TPE of the structure (II), or a combination thereof. The electronic device further includes an HTL layer and a B layer. The TPE composition of the A layer has a HOMO energy level between the HOMO energy level of the ITO layer and the HOMO energy level of the HTL material. In one embodiment, the A layer TPE composition has a calculated HOMO value from -4.3 eV to -4.6 eV.
本發明電子裝置可以包含此處揭露的兩種或更 多種實施方式的組合。 The electronic device of the present invention may comprise two or more of the above disclosed A combination of various embodiments.
除非有相反的教示、上下文的暗示,或本領域中慣用的,所有份(part)及百分比是以重量為基準。針對美國專利實踐的目的,任何涉及的專利、專利申請或公開的內容在此全部引入做為參考(或其均等的US版本也引入作為參考),特別是關於本領域的合成技術、定義(不與本申請具體提供的任何定義不一致),及通常知識的揭露。 All parts and percentages are by weight unless otherwise indicated by the contrary, implied by context, or customary in the art. For the purposes of the U.S. Patent Practice, the disclosure of any of the patents, patent applications, or disclosures herein is hereby incorporated by reference in its entirety in its entirety in its entirety in its entirety in its entirety in its entirety in particular in its Inconsistent with any definition specifically provided by this application, and the disclosure of general knowledge.
術語「包含」、「包括」、「具有」及他們的衍生詞,是不排除任何另外的組分、步驟或製程的存在,不論本申請是否特別揭露過他們。為了避免任何疑慮,除非有相反的教示,否則透過使用術語”包含”的所有組成物是包括任何附加的添加劑、助劑,或化合物,不論是聚合的或其他的。相反地,除了對於操作性能不必要的那些,術 語「基本上由...組成」是將任何另外的組分、步驟或製程由範圍中排除在任何以下敘述的範圍之外。術語「由...組成」排除任何未特別描述或列出的組分、步驟或製程。 The terms "including", "comprising", "having" and their derivatives are used without the exclusion of any additional components, steps or processes, whether or not they are specifically disclosed. In order to avoid any doubt, the use of the term "comprising", unless otherwise indicated, includes any additional additive, adjuvant, or compound, whether polymeric or otherwise. Conversely, except those that are not necessary for operational performance, The phrase "consisting essentially of" excludes any additional components, steps or processes from the scope of any of the following. The term "consisting of" excludes any component, step or process not specifically described or listed.
「摻雜劑」及其類似術語,指的是當電子受體或 供體加入該有機層作為添加劑,增加有機電子裝置的有機層的導電性。關於有機半導體的導電性,通過摻雜,也可以同樣地被影響。這樣的有機半導體基質材料可以由任何具有電子供體特性的化合物或具有電子受體特性的化合物製成。 "Doping agent" and the like, when referring to an electron acceptor or The donor is added to the organic layer as an additive to increase the conductivity of the organic layer of the organic electronic device. The conductivity of the organic semiconductor can be similarly affected by doping. Such an organic semiconductor host material can be made of any compound having electron donor characteristics or a compound having electron acceptor properties.
「發光層」及其類似術語,指的是一個由主體和 摻雜劑組成的層。該主體材料可以是雙極性或單極性,並且可以單獨使用或以兩種或多種主體材料組合使用。該主體材料的光電特性可能依所使用的摻雜劑的種類(磷光或螢光)而有所不同。對於螢光摻雜劑,輔助主體材料應具有介於摻雜劑的吸附及主體的發光之間的光譜重疊以誘發良好的Foester轉移到摻雜劑。對於磷光摻雜劑,輔助主體材料應具有高的三重態能量(triplet energy)來限制摻雜劑的三重態(triplet)。 "Lighting layer" and similar terms refer to a subject and A layer composed of a dopant. The host material can be bipolar or unipolar and can be used alone or in combination of two or more host materials. The optoelectronic properties of the host material may vary depending on the type of dopant used (phosphorescence or fluorescence). For fluorescent dopants, the auxiliary host material should have a spectral overlap between the adsorption of the dopant and the emission of the host to induce good Foester transfer to the dopant. For phosphorescent dopants, the auxiliary host material should have a high triplet energy to limit the triplet of the dopant.
「電動轉移層(HTL)」及其類似術語,是指一由 轉移電洞的材料製成的層。高的電洞遷移率被推薦用於OLED裝置。該HTL是用於幫助阻擋藉由發光層傳輸之電子的通路。通常需要小的電子親和力以阻擋電子。該HTL應當理想地具有較大的三重態以阻止來自相鄰EML層的激子的遷移。HTL的化合物的例子包括,但不限於,二(對甲 苯基)胺基苯基]環己烷(di(p-tolyl)aminophenyl]cyclohexane)(TPAC),N,N-二苯基-N,N-雙(3-甲基苯基)-1,1'-聯苯-4,4-二胺(N,N-diphenyl-N,N-bis(3-methylphenyl)-1,1-biphenyl-4,4-diamine)(TPD)及N,N'-二苯基-N,N'-雙(1-萘基)-(1,1'-聯苯)-4,4'-二胺(N,N'-diphenyl-N,N'-bis(1-naphthyl)-(1,1'-biphenyl)-4,4'-diamine)(NPB)。 "Electrical Transfer Layer (HTL)" and similar terms mean a A layer made of material that transfers holes. High hole mobility is recommended for OLED devices. The HTL is a path for helping to block electrons transmitted through the light-emitting layer. Small electron affinities are often required to block electrons. The HTL should ideally have a larger triplet to prevent migration of excitons from adjacent EML layers. Examples of HTL compounds include, but are not limited to, two (pairs) Di(p-tolyl)aminophenyl]cyclohexane) (TPAC), N,N-diphenyl-N,N-bis(3-methylphenyl)-1, 1'-Biphenyl-4,4-diamine (N,N-diphenyl-N,N-bis(3-methylphenyl)-1,1-biphenyl-4,4-diamine) (TPD) and N,N' -diphenyl-N,N'-bis(1-naphthyl)-(1,1'-biphenyl)-4,4'-diamine (N,N'-diphenyl-N, N'-bis ( 1-naphthyl)-(1,1'-biphenyl)-4,4'-diamine) (NPB).
現在在下列實施例中詳細描述本發明的一些實施方案。 Some embodiments of the invention are now described in detail in the following examples.
用於下列實施例的材料顯示於表1。 The materials used in the following examples are shown in Table 1.
核磁共振(1H及13C NMR):該等試樣以濃度為10mg/mL溶解於合適的氘代溶劑中。磁核共振光譜記錄在Varian Mercury Plus 400MHz光譜儀。化學位移是相對於四甲基矽烷(tetramethylsilane)而報告。 Nuclear Magnetic Resonance ( 1 H and 13 C NMR): These samples were dissolved in a suitable deuterated solvent at a concentration of 10 mg/mL. Magnetic resonance spectra were recorded on a Varian Mercury Plus 400 MHz spectrometer. Chemical shifts are reported relative to tetramethylsilane.
液相層析/質譜儀(LC/MS):試樣以約1mg/mL溶解在THF中。注射1μL溶液進行LC/MS分析。 Liquid chromatography/mass spectrometry (LC/MS): The sample was dissolved in THF at about 1 mg/mL. 1 μL of the solution was injected for LC/MS analysis.
儀器:Agilent 1220 HPLC/G6224A TOF質譜儀 Instrument: Agilent 1220 HPLC/G6224A TOF mass spectrometer
管柱:Agilent eclipse-C18 4.6*50mm,1.7μm Column: Agilent eclipse-C18 4.6*50mm, 1.7μm
管柱加熱器溫度:30℃ Column heater temperature: 30 ° C
溶劑:A:THF;B:0.1%FA在水/THF 95/5中 Solvent: A: THF; B: 0.1% FA in water / THF 95/5
梯度:0-6分鐘40-80% A,維持9分鐘 Gradient: 0-6 minutes 40-80% A, maintained for 9 minutes
流速:0.3mL/min Flow rate: 0.3mL/min
UV偵測器:Diode Array 254nm UV detector: Diode Array 254nm
MS條件:毛細管電壓:3900kV(Neg),3500kV(Pos) MS conditions: capillary voltage: 3900kV (Neg), 3500kV (Pos)
模式:Neg及Pos Mode: Neg and Pos
掃描:100-2000amu Scan: 100-2000 amu
速率:1s/掃描 Rate: 1s/scan
脫溶劑溫度:300℃ Desolvent temperature: 300 ° C
高壓液相層析法(HPLC):秤量約50mg的試樣並以10g的四氫呋喃稀釋。將試樣溶液以0.45μm的注射過濾器過濾並將5μl的濾液注入HPLC系統中。 High pressure liquid chromatography (HPLC): A sample of about 50 mg was weighed and diluted with 10 g of tetrahydrofuran. The sample solution was filtered through a 0.45 μm syringe filter and 5 μl of the filtrate was injected into the HPLC system.
循環伏安法(CV):對化合物之CV是在一CHI伏 安分析儀,具有Pt反電極、Hg/Hg2Cl2參考電極、及一鉑電極板的三電極電池中進行,掃描速率為10mV/s並以0.1M的四丁基銨六氟磷酸鹽作為支持電解質。加入二茂鐵(ferrocene)作為內標準品(internal standard)。電位值是根據電洞注入材料及二茂鐵標準品的氧化峰的峰值差來計算。 Cyclic voltammetry (CV): The CV of the compound is carried out in a CHI voltammetric analyzer with a Pt counter electrode, a Hg/Hg 2 Cl 2 reference electrode, and a platinum electrode plate in a three-electrode cell at a scan rate of 10 mV/s and 0.1 M tetrabutylammonium hexafluorophosphate as a supporting electrolyte. Ferrocene was added as an internal standard. The potential value is calculated based on the peak difference of the oxidation peak of the hole injection material and the ferrocene standard.
原子力顯微鏡(AFM):AFM應用於圖像化表面 形態和決定旋塗的HIL膜的表面粗糙度及膜厚度。AFM的測量是於一由Veeco公司生產的Dimension V儀器以輕敲模式(tapping mode)執行。 Atomic Force Microscopy (AFM): AFM applied to imaged surfaces Morphology and determination of the surface roughness and film thickness of the spin-coated HIL film. The AFM measurement was performed in a tapping mode by a Dimension V instrument manufactured by Veeco.
垂直偏離的振幅(A)被用來計算該表面的粗糙
度。振幅常數Ra和Rq是用來描述表面粗糙度。Ra是絕對振幅值的算術平均值,和Rq是振幅值得均方根,它們被描述為:
其中Ai是AFM圖像中一個像素i(指表面上的點)的振幅(高度或深度),及n是圖像中像素的總數。 Where A i is the amplitude (height or depth) of one pixel i (point on the surface) in the AFM image, and n is the total number of pixels in the image.
為了確定旋轉塗佈膜的厚度,膜的一部分以鋒 利的刀片從ITO基板除去,然後以懸臂掃描。該膜的厚度由兩部分之間差距得知。 In order to determine the thickness of the spin coating film, a part of the film is used as a front The blade is removed from the ITO substrate and then scanned in a cantilever. The thickness of the film is known from the difference between the two parts.
A.合成1,2-雙(4-溴苯基)-1,2-二伸苯乙烯(1,2-bis(4-bromophenyl)-1,2-diphenylethenes)(1)A. Synthesis of 1,2-bis(4-bromophenyl)-1,2-diphenylethenes (1)
4-溴二苯酮(4-Bromobenzophenone)(5g,19.2mmol) 及鋅粉(2.5g,38.2mmol)置於配有回流冷凝器的250mL兩頸圓底燒瓶。在真空下抽真空並用乾燥氮氣沖洗三次之後,加入100mL的THF。在一冰水浴中將該混合物降溫至0-5℃,並使用注射器將2.1mL(19.2mmol)TiCl4緩慢加入。 將該混合物緩慢的加溫至室溫,並攪拌0.5小時後,將其回流12小時。冷卻至室溫後,將該反應混合物傾入冰水中 並用二氯甲烷萃取三次。將溶劑在真空下蒸發,殘餘物用乙醇洗滌而得到白色粉末(產率70%)。 4-Bromobenzophenone (5 g, 19.2 mmol) and zinc powder (2.5 g, 38.2 mmol) were placed in a 250 mL two-necked round bottom flask equipped with a reflux condenser. After evacuating under vacuum and rinsing three times with dry nitrogen, 100 mL of THF was added. The mixture was cooled to 0-5 ° C in an ice water bath, and 2.1 mL (19.2 mmol) of TiCl 4 was slowly added using a syringe. The mixture was slowly warmed to room temperature, and after stirring for 0.5 hour, it was refluxed for 12 hours. After cooling to room temperature, the reaction mixture was poured into ice water and extracted three times with dichloromethane. The solvent was evaporated under vacuum and the residue was washed with ethylamine to afford white powder (yield 70%).
1H-NMR(CDCl3,400MHz):7.19-7.25(m,3H),7.06-7.13(m,7H),6.96-7.03(m,5H),6.85-6.90(m,3H)。 1 H-NMR (CDCl 3 , 400 MHz): 7.19-7.25 (m, 3H), 7.06-7.13 (m, 7H), 6.96-7.03 (m, 5H), 6.85-6.90 (m, 3H).
B.合成1,2-雙[4-(N-苯基)胺基苯基]-1,2-二伸苯乙烯(1,2-bis[4-(N-phenyl)aminophenyl]-1,2-diphenylethenes)(2)B. Synthesis of 1,2-bis[4-(N-phenyl)aminophenyl]-1,2-di-stilbene (1,2-bis[4-(N-phenyl)aminophenyl]-1, 2-diphenylethenes)(2)
在一氮氣氣氛下,於250ml三頸圓底燒瓶中加入(1)(4.90g,10mmol),Pd2(dba)3(0.549g,0.6mmol),t-BuOK(4.49g,40mmol)及BINAP(0.747g,1.2mmol)。在真空下抽真空並用乾燥氮氣沖洗三次之後,用注射器依序加入苯胺(2.32g,25mmol)及60mL無水甲苯。將混合物加熱至80℃過夜並使其冷卻至室溫。將該混合物離心,並用石油醚和乙酸乙酯(10:1)的混合物作為洗滌液將其上清液濃縮並純化於二氧化矽管柱。產物(2)為淺黃色粉末(產率40%)。 (1) (4.90 g, 10 mmol), Pd 2 (dba) 3 (0.549 g, 0.6 mmol), t-BuOK (4.49 g, 40 mmol) and BINAP were placed in a 250 ml 3-neck round bottom flask under a nitrogen atmosphere. (0.747 g, 1.2 mmol). After evacuating under vacuum and rinsing three times with dry nitrogen, aniline (2.32 g, 25 mmol) and 60 mL of anhydrous tolu. The mixture was heated to 80 ° C overnight and allowed to cool to room temperature. The mixture was centrifuged, and the supernatant was concentrated and purified on a cerium oxide column using a mixture of petroleum ether and ethyl acetate (10:1) as a washing liquid. The product (2) was a pale yellow powder (yield 40%).
1H-NMR(d6-DMSO,400MHz),δ(TMS,ppm):8.10-8.18(d,2H),7.15-7.23(m,6 H),7.05-7.15(m,4H),6.95-7.07(m,6H),6.75-6.88(m,10 H)。 1 H-NMR (d 6 -DMSO , 400MHz), δ (TMS, ppm): 8.10-8.18 (d, 2H), 7.15-7.23 (m, 6 H), 7.05-7.15 (m, 4H), 6.95- 7.07 (m, 6H), 6.75-6.88 (m, 10 H).
C.合成1,2-雙(4-{N,N-[4-(N,N-二苯基胺基)苯基]C. Synthesis of 1,2-bis(4-{N,N-[4-(N,N-diphenylamino)phenyl]
苯基}氨基)-1,2-二伸苯乙烯[1,2-bis(4-{N,N-[4-(N,N-diphenylamino)phenyl]phenyl}amino)-1,2-diphenylethene](3)Phenyl}amino)-1,2-diphenylene [1,2-bis(4-{N,N-[4-(N,N-diphenylamino)phenyl]phenyl}amino)-1,2-diphenylethene ](3)
在一氮氣氣氛下,於250ml三頸圓底燒瓶中加入 (2)(1.54g,3mmol),Pd2(dba)3(0.137g,0.15mmol)及t-BuOK(1.35g,12mmol)。在真空下抽真空並用乾燥氮氣沖洗三次之後,用注射器依序加入P(t-Bu)3的甲苯溶液(100mg/mL)(0.9mL,0.45mmol)及20mL無水甲苯。將混合物加熱至80℃過夜並使其冷卻至室溫。將該混合物離心,並用石油醚和二氯甲烷(2:1)的混合物作為洗脫劑將其上清液濃縮並純化於二氧化矽管柱。產物(3)為亮黃色粉末(產率60%)。該黃色粉末透過在360℃下進行昇華使其純化,得到具有99.4%(Z異構物:55.7%,E異構物:46.7%)的HPLC純度的純產物。 (2) (1.54 g, 3 mmol), Pd 2 (dba) 3 (0.137 g, 0.15 mmol) and t- BuOK (1.35 g, 12 mmol) were added to a 250 ml 3-neck round bottom flask under a nitrogen atmosphere. After evacuating under vacuum and rinsing three times with dry nitrogen, a toluene solution of P(t-Bu) 3 (100 mg/mL) (0.9 mL, 0.45 mmol) and 20 mL of anhydrous toluene were sequentially added by syringe. The mixture was heated to 80 ° C overnight and allowed to cool to room temperature. The mixture was centrifuged and the supernatant was concentrated and purified on a cerium oxide column using a mixture of petroleum ether and dichloromethane (2:1) as eluent. The product (3) was a bright yellow powder (yield 60%). The yellow powder was purified by sublimation at 360 ° C to obtain a pure product having an HPLC purity of 99.4% (Z isomer: 55.7%, E isomer: 46.7%).
1H-NMR(CD2Cl2,400MHz),δ(TMS,ppm):6.5-7.5(m)13C-NMR(CD2Cl2,100MHz),δ(ppm):122.27、122.41、123.78、123.95、125.34、125.46、126.34、127.62、129.20、131.46、132.21 1 H-NMR (CD 2 Cl 2 , 400 MHz), δ (TMS, ppm): 6.5-7.5 (m) 13 C-NMR (CD 2 Cl 2 , 100 MHz), δ (ppm): 122.27, 122.41, 123.78, 123.95, 125.34, 125.46, 126.34, 127.62, 129.20, 131.46, 132.21
HRMS(ESI,m/z):1001.45(M+H+) HRMS (ESI, m/z ): 1001.45 (M+H + )
本發明具有結構(I)、結構(IA)的TPE的非限制性實例是提供於以下表2。 Non-limiting examples of TPEs having structure (I), structure (IA) of the present invention are provided in Table 2 below.
HOMO的計算 HOMO calculation
密度泛函計算均用Gaussian09程式組。各分子的基態幾何結構分別使用混成B3LYP功能與6-31G(d)基 組,從其中以電子伏特(eV)為單位的HOMO分子軌域值提取來進行最佳化。 Density functional calculations are performed using the Gaussian09 program group. The ground state geometry of each molecule uses the B3LYP function and the 6-31G(d) basis, respectively. The group is optimized from HOMO molecular orbital value extraction in units of electron volts (eV).
每個分子在中性和三重態的的幾何結構以如同 其在基態時的計算之相同方法及基組進行了最佳化,由此及基態的計算,由中性三重態和基態能量之間的能量差來計算三重態能量。 The geometry of each molecule in the neutral and triplet states is like The same method and the basis set for the calculation in the ground state are optimized, and thus the calculation of the ground state, the triplet energy is calculated from the energy difference between the neutral triplet state and the ground state energy.
一個文獻(J.Phys.Chem.A,2003,107, 5241-5251)中描述的程序被用於計算每個分子的重組能,該重組能係作為電子和電洞遷移率的指標。 The procedure described in one document ( J. Phys. Chem. A, 2003 , 107, 5241-5251) was used to calculate the recombination energy of each molecule as an indicator of electron and hole mobility.
下方表3比較實施例1的HOMO能階(由表2)與其 他四伸苯乙烯化合物的HOMO能階(Inv-發明及Comp=比較的)。 Table 3 below compares the HOMO energy level of Example 1 (from Table 2) with He extended the HOMO level of the styrene compound (Inv-invention and Comp=comparative).
ITO玻璃(鈉鈣玻璃:2cm*2cm)依序在肥皂水、丙酮、乙醇和異丙醇中施加超聲波進行預處理,並在空氣中徹底乾燥。該組成物(3)是依合成例(前述)製備,並溶解在濃度為5mg/mL的苯甲醚中。之後將該溶液旋轉塗佈於乾淨的ITO上。化合物3在ITO上的旋轉塗佈膜的表面粗糙度是用原子力顯微鏡(AFM)(顯示於表4)定性。相對於原來的ITO,其具有5.3nm的表面粗糙度,旋轉塗佈化合物3在ITO上之後,在旋轉塗佈化合物3在ITO上之後,表面粗糙度(Rq)降低到0.5nm。 ITO glass (soda lime glass: 2 cm * 2 cm) was pretreated by applying ultrasonic waves in soapy water, acetone, ethanol, and isopropyl alcohol, and thoroughly dried in the air. This composition (3) was prepared according to the synthesis example (described above) and dissolved in anisole at a concentration of 5 mg/mL. The solution was then spin coated onto clean ITO. The surface roughness of the spin-coated film of Compound 3 on ITO was characterized by atomic force microscopy (AFM) (shown in Table 4). It has a surface roughness of 5.3 nm with respect to the original ITO, and after the spin coating of the compound 3 on the ITO, the surface roughness (R q ) is reduced to 0.5 nm after spin coating of the compound 3 on the ITO.
所有的有機材料在被沉積之前藉由昇華來純化。OLED(有機發光二極體)是製備到有ITO塗佈的玻璃基材上作為陽極,並蓋上鋁陰極。所有的有機層是在一真空腔中以小於1 x 10-7Torr的基礎壓力以化學氣相沉積進行熱沉積。有機層的沉積速率是維持在0.1~0.05nm/s。該鋁陰極是以0.5nm/s被沉積。該OLED裝置的有效區(active area)為「3mm x 3mm」是透過陰極沉積的陰影遮罩而定義。該 具有厚度為1500埃的ITO層的玻璃基材(20mm x 20mm)是購自於三星康寧(Samsung Corning)。 All organic materials were purified by sublimation before being deposited. The OLED (Organic Light Emitting Diode) was prepared as an anode on an ITO coated glass substrate and covered with an aluminum cathode. All of the organic layers were thermally deposited by chemical vapor deposition at a base pressure of less than 1 x 10 -7 Torr in a vacuum chamber. The deposition rate of the organic layer is maintained at 0.1 to 0.05 nm/s. The aluminum cathode was deposited at 0.5 nm/s. The active area of the OLED device is "3 mm x 3 mm" which is defined by a cathodic deposited shadow mask. The glass substrate (20 mm x 20 mm) having an ITO layer having a thickness of 1500 angstroms was purchased from Samsung Corning.
ITO玻璃(2cm×2cm)是如上述的薄膜實施例所述 而清洗,且係以氧氣電漿處理。化合物3係於合成例(前述)中被製備,且溶解在濃度約為20mg/ML的苯甲醚中。該化合物3之溶液在手套式操作箱中旋轉塗佈於ITO上作為HIL。該薄膜在80℃進行退火20分鐘。之後該等薄膜基板被轉移到熱蒸發器中,約在1×10-7Torr的真空下。依序沉積以下幾層:HTL1、HTL2、Fl藍EML、鋁8-羥基喹啉(Aluminum 8-Hydroxyquinolinate)(Alq3)及喹啉鋰(Lithium quinolate)(Liq),厚度分別為:5nm、25nm、20nm、30nm及2nm。有機層的沉積速率是維持在0.1~0.05nm/s。 有機層的沉積速率是維持在0.1~0.05nm/s。該鋁陰極是以0.5nm/s沉積。該OLED裝置的有校區為「3mm x 3mm」,如是透過陰極沉積的陰影遮罩定義。 The ITO glass (2 cm x 2 cm) was cleaned as described in the film examples above and treated with oxygen plasma. Compound 3 was prepared in the synthesis example (previously described) and dissolved in anisole at a concentration of about 20 mg/ML. The solution of Compound 3 was spin-coated on ITO as a HIL in a glove box. The film was annealed at 80 ° C for 20 minutes. The film substrates were then transferred to a thermal evaporator at a vacuum of about 1 x 10 -7 Torr. The following layers were deposited in sequence: HTL1, HTL2, Fl blue EML, Aluminum 8-Hydroxyquinolinate (Alq 3 ) and Lithium quinolate (Liq), thickness: 5 nm, 25 nm 20 nm, 30 nm and 2 nm. The deposition rate of the organic layer is maintained at 0.1 to 0.05 nm/s. The deposition rate of the organic layer is maintained at 0.1 to 0.05 nm/s. The aluminum cathode was deposited at 0.5 nm/s. The OLED device has a campus area of "3mm x 3mm" as defined by the shadow mask of the cathode deposition.
最後該裝置在測試前以環氧化物進行加封。該裝置的結構是如下:化合物3(40nm)/HTL1(5nm)/HTL2(25nm)/Fl藍ML(20nm)/Alq3(30nm)/Liq(2nm) Finally the device was sealed with epoxide prior to testing. The structure of the device is as follows: Compound 3 (40 nm) / HTL1 (5 nm) / HTL 2 (25 nm) / Fl Blue ML (20 nm) / Alq 3 (30 nm) / Liq (2 nm)
該製程是與裝置例1所述的相同,除了該組成物(3)是真空沉積於ITO上而不是旋轉塗佈。該裝置的結構是如下:化合物3(40nm)/HTL1(5nm)/HTL2(25nm)/Fl藍 ML(20nm)/Alq3(30nm)/Liq(2nm) The process was the same as described in Device Example 1, except that the composition (3) was vacuum deposited on ITO instead of spin coating. The structure of the device is as follows: Compound 3 (40 nm) / HTL1 (5 nm) / HTL 2 (25 nm) / Fl Blue ML (20 nm) / Alq 3 (30 nm) / Liq (2 nm)
C.比較例3-裝置C. Comparative Example 3 - Device
該製程是與裝置例1所述的相同,除了將2-TNATA真空蒸鍍作為HIL而不是化合物3。 This process was the same as described in Device Example 1, except that 2-TNATA was vacuum evaporated as HIL instead of Compound 3.
D.比較例4-裝置D. Comparative Example 4 - Device
該製程是與裝置例1所述的相同,除了將聚噻吩(Plextronics公司)旋轉塗佈作為HIL而不是化合物3。 This process was the same as that described in Example 1, except that polythiophene (Plextronics) was spin coated as HIL instead of Compound 3.
E.測試E. Testing
對於OLED的電流-電壓-亮度(J-V-L)特性化是透過一個源測量單元(KEITHLY 238)發光計(MINOLTA CS-100A)進行。該等OLED裝置的EL光譜是由一個校準的CCD攝譜儀收集。 The current-voltage-luminance (J-V-L) characterization of the OLED is performed by a source measurement unit (KEITHLY 238) luminometer (MINOLTA CS-100A). The EL spectra of these OLED devices are collected by a calibrated CCD spectrograph.
本發明的裝置例1和2,以及比較試樣3和4的電流-電壓曲線、發光效率曲線和發光衰減曲線是分別顯示於圖1、2及3。這些裝置的驅動電壓(於1000Cd/m2)、電流效率(於1000Cd/m2)及使用壽命(4000Cd/m2,600min之後)的資料是編列於表5。 The current-voltage curves, luminous efficiency curves, and luminescence decay curves of the apparatus examples 1 and 2 of the present invention, and the comparative samples 3 and 4 are shown in Figs. 1, 2, and 3, respectively. The data for the drive voltage (at 1000 Cd/ m2 ), current efficiency (at 1000 Cd/ m2 ) and service life (4000 Cd/ m2 , after 600 min) for these devices are listed in Table 5.
圖1-3及表5顯示使用發明的組成物(3)作為HIL 的發明裝置1和2(不論以熱蒸鍍沉積或溶液製程),和比較例3和4展現出可相比的的驅動電壓和效率。然而,相較於比較例,裝置例1及2展現出較佳的使用壽命。使用4000Cd/m2的起始亮度600分鐘後,包含以蒸鍍製程施加之化合物3的裝置(裝置例1)維持和起始一樣(100%)的亮度,且包含以溶液製程施加之化合物3的裝置(裝置例2)的亮度相較於起始亮度變得稍微更亮(102.3%)。然而,對於包含以聚噻吩(比較例3)及2-TNATA(比較例4)作為HIL的裝置,在一樣的期間後分別降低至91.3%及97.3%。 Figures 1-3 and Table 5 show inventive devices 1 and 2 using the inventive composition (3) as HIL (whether in thermal evaporation deposition or solution processes), and Comparative Examples 3 and 4 exhibit comparable drive Voltage and efficiency. However, Device Examples 1 and 2 exhibited a better service life than the comparative examples. After using the initial luminance of 4000 Cd/m 2 for 600 minutes, the device (device example 1) containing the compound 3 applied by the evaporation process maintained the same brightness (100%) as the start, and contained the compound 3 applied by the solution process. The brightness of the device (device example 2) became slightly brighter (102.3%) than the initial brightness. However, the apparatus containing the polythiophene (Comparative Example 3) and 2-TNATA (Comparative Example 4) as the HIL was reduced to 91.3% and 97.3%, respectively, after the same period.
在本發明中,申請人已經開發了由包含結構(I) 的TPE、結構(IA)的TPE,或其等之組合的該組成物所形成的電洞注入材料。本發明TPE組成物均適用於熱蒸鍍及溶液製程。包含該材料作為HIL的裝置展現與使用聚噻吩和2-TNATA為HIL者可相比的驅動電壓和效率,但比這些使用聚噻吩和2-TNATA為HIL者有更長的使用壽命。 In the present invention, the applicant has developed the inclusion structure (I) A hole injecting material formed by the composition of the TPE, the TPE of the structure (IA), or a combination thereof. The TPE compositions of the present invention are all suitable for thermal evaporation and solution processes. The device containing this material as the HIL exhibits a driving voltage and efficiency comparable to those of the polythiophene and 2-TNATA for the HIL, but has a longer lifetime than those using the polythiophene and 2-TNATA for the HIL.
要特別指出本發明並不限於本文所包含的實施方案及圖示,而是包括那些實施方案的修改形式,包括本實施方案中的各部分和不同實施方案的元件的組合,如落入以下申請專利範圍的範圍之內。 It is to be noted that the invention is not limited to the embodiments and illustrations contained herein, but includes modifications of those embodiments, including combinations of elements in the embodiments and elements of different embodiments, such as falling into the following application Within the scope of the patent.
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