TW201430162A - Method for producing pyrolytic boron nitride coated carbon base material - Google Patents

Method for producing pyrolytic boron nitride coated carbon base material Download PDF

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TW201430162A
TW201430162A TW102146452A TW102146452A TW201430162A TW 201430162 A TW201430162 A TW 201430162A TW 102146452 A TW102146452 A TW 102146452A TW 102146452 A TW102146452 A TW 102146452A TW 201430162 A TW201430162 A TW 201430162A
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boron nitride
carbon substrate
thermal expansion
pyrolytic boron
coating film
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TWI510666B (en
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Koji Kato
Waichi Yamamura
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Shinetsu Chemical Co
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    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/02Pretreatment of the material to be coated
    • C23C16/0254Physical treatment to alter the texture of the surface, e.g. scratching or polishing
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/34Nitrides
    • C23C16/342Boron nitride

Abstract

The invention provides a method for producing a pyrolytic boron nitride coated carbon base material which can inhibit peeling and the like between a pyrolytic boron nitride coated film and a carbon base material through a simple method. The invention is the method for producing the pyrolytic boron nitride coated carbon base material by using a pyrolytic boron nitride to coat a portion of or all of the carbon base material and is characterized in that a surface roughness of the carbon base material is preferably adjusted to 0.5 μ m or more and less than 7.0 μ m based on a calculation average roughness defined in JIS B 0601-2001, and a thermal expansion coefficient of the coated film comes close to a thermal expansion coefficient of the carbon base material.

Description

熱分解氮化硼被覆碳質基材的製造方法 Method for producing thermal decomposition boron nitride coated carbonaceous substrate

本發明是有關於一種用熱解氮化硼被覆的碳基材的製造方法,所述熱解氮化硼被覆碳基材通常用於譬如在半導體及太陽能電池製造裝置等中使用的加熱器(heater)、夾具(jig)等中。 The present invention relates to a method for producing a carbon substrate coated with pyrolytic boron nitride, which is generally used for a heater used in, for example, a semiconductor and a solar cell manufacturing apparatus ( Heater), jig, etc.

熱解氮化硼透過CVD法製備,是具有高絕緣性、高耐熱性、柔韌性的材料。其結構為與石墨相似的六方晶系,在與生長面平行的a方向和與生長面垂直的c方向上物理特性值有顯著差異。尤其是熱膨脹係數,在a方向上約為3.0×10-6〔1/℃〕,而在c方向上約為30×10-6〔1/℃〕,具有約10倍的差異。 The pyrolytic boron nitride is prepared by a CVD method and is a material having high insulation, high heat resistance, and flexibility. The structure is a hexagonal system similar to graphite, and the physical property values are significantly different in the a direction parallel to the growth surface and the c direction perpendicular to the growth surface. In particular, the coefficient of thermal expansion is about 3.0 × 10 -6 [1/°C] in the a direction and about 30 × 10 -6 [1/°C] in the c direction, and has a difference of about 10 times.

當把具有這種物理特性值的熱解氮化硼被覆於碳基材上時,碳基材與被覆膜的熱膨脹係數無差異的話更能夠抑制碳基材與被覆膜之間的剝離,因此,作為碳基材,通常選擇其熱膨脹係數與熱解氮化硼的熱膨脹係數相近的材料。 When the pyrolytic boron nitride having such a physical property value is coated on the carbon substrate, if there is no difference in the thermal expansion coefficient between the carbon substrate and the coating film, peeling between the carbon substrate and the coating film can be suppressed. Therefore, as the carbon substrate, a material whose thermal expansion coefficient is close to that of the pyrolytic boron nitride is usually selected.

另外,就碳基材而言,通常採用成型材、擠壓材、CIP 材等,不過,由於在製備成型材、CIP材等的塊坯(block)時,無法避免在混合、成形、燒成等製造步驟中的不確定因素的影響,因此,實際上在所製造的各批塊坯之間無論如何會產生物理特性值的差異,這個問題對於熱膨脹係數也不例外。如上所述,若每批碳基材的熱膨脹係數不同,則即便能均勻地製做出熱解氮化硼膜的膜質,但由於製做後的碳基材與被覆膜的熱膨脹係數產生差異,也會發生變形或剝離。 In addition, in the case of a carbon substrate, a molding material, an extruded material, and a CIP are usually used. However, when a block of a molding material, a CIP material, or the like is prepared, the influence of uncertain factors in the manufacturing steps such as mixing, molding, and baking cannot be avoided, and thus, it is actually manufactured. There is no difference in physical property values between batches of blanks, and this problem is no exception to the coefficient of thermal expansion. As described above, if the thermal expansion coefficient of each batch of the carbon substrate is different, even if the film quality of the pyrolytic boron nitride film can be uniformly formed, the difference in thermal expansion coefficient between the carbon substrate and the coating film after the production is made , deformation or peeling will also occur.

作為上述剝離的對策,專利文獻1中記載了一種增加碳基材的表面粗糙度,透過錨固作用來迴避剝離的被覆方法。然而,這個被覆方法的問題在於,由於碳基材的熱膨脹係數存在差異,當使用與熱解氮化硼膜的膨脹率差異較大的基材時無法抑制剝離。 As a measure against the peeling, Patent Document 1 describes a coating method in which the surface roughness of the carbon substrate is increased and the peeling is avoided by the anchoring action. However, this coating method has a problem in that peeling cannot be suppressed when a substrate having a large difference in expansion ratio from the pyrolytic boron nitride film is used because of a difference in thermal expansion coefficient of the carbon substrate.

此外,專利文獻2記載了一種方法,在碳基材上被覆與碳基材的熱膨脹係數相近的低熱膨脹係數的熱解氮化硼膜,從而形成無裂縫的被覆膜。不過,這個被覆方法也存在如下的問題,即,因碳基材的熱膨脹係數存在差異,從而使與熱解氮化硼膜的熱膨脹係數產生差異的情況下,將出現剝離。專利文獻2並沒有對調整該膨脹率差異的方法做任何描述。 Further, Patent Document 2 describes a method of forming a crack-free coating film on a carbon substrate by coating a pyrolytic boron nitride film having a low thermal expansion coefficient close to that of a carbon substrate. However, this coating method also has a problem that peeling occurs when there is a difference in thermal expansion coefficient of the carbon substrate and a difference in thermal expansion coefficient from the pyrolytic boron nitride film. Patent Document 2 does not describe any method of adjusting the difference in the expansion ratio.

綜上所述,現有技術文獻中所記載的被覆方法存在的問題在於,盡管每批碳基材的熱膨脹係數不相同,但均未對熱解氮化硼膜的熱膨脹係數進行調整以使其與碳基材的熱膨脹係數相匹配,所以在膨脹率差異較大的情況下會發生剝離。 In summary, the coating method described in the prior art documents has a problem in that although the thermal expansion coefficients of each batch of carbon substrates are different, the thermal expansion coefficients of the pyrolytic boron nitride film are not adjusted to Since the coefficient of thermal expansion of the carbon substrate is matched, peeling occurs when the difference in expansion ratio is large.

[現有技術文獻] [Prior Art Literature] [專利文獻] [Patent Literature]

[專利文獻1]日本專利 特開平3-10076號公報 [Patent Document 1] Japanese Patent Laid-Open No. Hei 3-10076

[專利文獻2]日本專利 第2729289號 [Patent Document 2] Japanese Patent No. 2729289

因此,本發明人就即使在使用每批(lot)的熱膨脹係數存在差異的碳基材塊坯的情況下是否也能夠透過比較簡單的方法抑制碳基材與被覆膜間的剝離這一問題進行了深入的研究,結果發現,在所被覆的材質為在a方向和c方向上的熱膨脹係數不同的各向異性的熱解氮化硼的情況下,若為配向性紊亂的所謂紊亂層構造時,具有c軸方向的膨脹係數的貢獻變大,而與生長面平行的a方向上的膨脹係數發生變化的傾向。 Therefore, the inventors of the present invention can suppress the peeling between the carbon substrate and the coating film by a relatively simple method even when a carbon substrate block having a difference in thermal expansion coefficient per lot is used. As a result of intensive studies, it has been found that when the material to be coated is anisotropic pyrolytic boron nitride having different thermal expansion coefficients in the a direction and the c direction, the so-called disorder layer structure which is an alignment disorder At the time, the contribution of the expansion coefficient in the c-axis direction is increased, and the expansion coefficient in the a direction parallel to the growth surface tends to change.

本發明人進一步得到了如下見解從而促成了本發明。即,由於熱解氮化硼的a軸、c軸的配向性的紊亂也受碳基材的表面粗糙度的變化影響,因此,如果使基材的表面粗糙度發生變化,則熱解氮化硼被覆膜的a軸、c軸的配向性將會產生紊亂,其結果,能夠透過這種配向性的紊亂使被覆膜的熱膨脹係數發生變化。 The inventors have further obtained the following findings to facilitate the present invention. That is, since the disorder of the alignment of the a-axis and the c-axis of the pyrolytic boron nitride is also affected by the change in the surface roughness of the carbon substrate, if the surface roughness of the substrate is changed, the thermal nitridation is performed. The alignment of the a-axis and the c-axis of the boron coating film is disturbed, and as a result, the thermal expansion coefficient of the coating film can be changed by such an alignment disorder.

即,本發明的目的是提供一種熱解氮化硼被覆碳基材的製造方法,該製造方法透過調整碳基材的表面粗糙度這樣簡單的方法使被覆膜的熱膨脹係數接近碳基材的熱膨脹係數,從而能夠 抑制剝離等。 That is, an object of the present invention is to provide a method for producing a pyrolytic boron nitride-coated carbon substrate, which has a thermal expansion coefficient close to that of a carbon substrate by a simple method of adjusting the surface roughness of the carbon substrate. Thermal expansion coefficient Inhibition of peeling and the like.

本發明是一種熱解氮化硼被覆碳基材的製造方法,用熱解氮化硼被覆碳基材的一部分或全部,其特徵在於,透過調整上述碳基材的表面粗糙度來控制上述熱解氮化硼被覆膜的熱膨脹係數。 The present invention relates to a method for producing a pyrolytic boron nitride-coated carbon substrate, which comprises coating a part or all of a carbon substrate with pyrolytic boron nitride, wherein the heat is controlled by adjusting a surface roughness of the carbon substrate. The thermal expansion coefficient of the boron nitride coating film.

並且,本發明的上述碳基材的表面粗糙度較佳為以JIS B 0601-2001定義的算術平均粗糙度計調整為0.5μm以上且小於7.0μm;上述熱解氮化硼被覆膜較佳為透過源自於晶面(002)的峰(peak)強度I(002)和源自於晶面(100)的峰強度I(100)計算的峰強度比I(002)/I(100)為10以上且小於500。 Further, the surface roughness of the carbon substrate of the present invention is preferably adjusted to 0.5 μm or more and less than 7.0 μm in terms of arithmetic mean roughness as defined in JIS B 0601-2001; and the above-described pyrolytic boron nitride coating film is preferably used. The peak intensity ratio I(002)/I(100) calculated by the peak intensity I(002) derived from the crystal plane (002) and the peak intensity I(100) derived from the crystal plane (100) It is 10 or more and less than 500.

根據本發明,透過調整碳基材的表面粗糙度,能夠控制熱解氮化硼被覆膜的熱膨脹係數使其接近碳基材的熱膨脹係數,所以能夠透過比較簡單的方法抑制由熱膨脹係數的差異所引起的被覆膜與碳基材之間的剝離,同時,也能夠抑制熱解氮化硼被覆碳基材的彎曲、變形、翹曲。 According to the present invention, by adjusting the surface roughness of the carbon substrate, the thermal expansion coefficient of the pyrolytic boron nitride coating film can be controlled to be close to the thermal expansion coefficient of the carbon substrate, so that the difference in thermal expansion coefficient can be suppressed by a relatively simple method. The peeling between the coating film and the carbon substrate causes the bending, deformation, and warpage of the pyrolytic boron nitride-coated carbon substrate.

1‧‧‧由碳基材構成的加熱器 1‧‧‧Heat heater consisting of carbon substrate

2‧‧‧加熱器的電連接部 2‧‧‧Electrical connection of the heater

圖1是表示碳基材的表面粗糙度與熱解氮化硼被覆膜的熱膨脹係數之間的關係的圖。 Fig. 1 is a graph showing the relationship between the surface roughness of a carbon substrate and the thermal expansion coefficient of a pyrolytic boron nitride coating film.

圖2是表示碳基材的表面粗糙度與熱解氮化硼被覆膜的峰強 度比之間的關係的圖。 Figure 2 is a graph showing the surface roughness of a carbon substrate and the peak intensity of a pyrolytic boron nitride coating film. A graph of the relationship between degrees.

圖3是表示熱解氮化硼被覆膜的峰強度比與熱膨脹係數之間的關係的圖。 3 is a view showing a relationship between a peak intensity ratio and a thermal expansion coefficient of a pyrolytic boron nitride coating film.

圖4是表示採用熱解氮化硼被覆碳基材的加熱器的概要的圖。 4 is a view showing an outline of a heater in which a carbon substrate is coated with pyrolytic boron nitride.

以下,對本發明的一實施方式進行具體說明,首先,對促成了本發明的實驗例進行說明。 Hereinafter, an embodiment of the present invention will be specifically described. First, an experimental example that facilitates the present invention will be described.

<實驗例> <Experimental example>

在實驗例中,準備了A-1至D-2共8種□50×3mm的碳基材(各向同性的石墨材料)樣本,透過噴砂(sand blasting)處理將這些樣本分別調整成表1所示的表面粗糙度。噴砂處理採用不二製作所製PNEUMA-BLASTER SG-5A,並使用不二製作所製的FUJI RANDOM WA(氧化鋁)#60磨粒,以0.4、0.7、1.0、1.5MPa的噴射壓力進行表面處理,並用小阪研究所製的表面粗糙度測定器SURFCORDER SEF580-M50對這些樣本的表面粗糙度進行了測量。然後,將分別進行了表面處理的8種碳基材的樣本放入真空爐,在1800℃、50Pa的條件下,透過BCl3和NH3氣體,分別往碳基材上實施150μm的熱解氮化硼膜表面塗層。之後,從如上塗層的8種樣本上剝下熱解氮化硼被覆膜,對於各被覆膜進行了X-射線衍射和熱膨脹係數α2測量。此時的X-射線衍射是透過理學 (Rigaku)公司製X-射線衍射RINT-2500VHF,在管電壓30kv、管電流30mA、掃描速度6.0°/min、取樣寬度0.05°、2 θ=20~60°的條件下進行的。 In the experimental example, a total of 8 kinds of carbon substrates (isotropic graphite materials) of □50×3 mm from A-1 to D-2 were prepared, and these samples were individually adjusted to Table 1 by sand blasting treatment. The surface roughness shown. The blasting treatment was carried out using PNEUMA-BLASTER SG-5A manufactured by Fujisawa Seisakusho Co., Ltd., and the surface treatment was carried out at a spray pressure of 0.4, 0.7, 1.0, 1.5 MPa using FUJI RANDOM WA (alumina) #60 abrasive grains manufactured by Fujifilm Co., Ltd. The surface roughness of these samples was measured by SURFCORDER SEF580-M50, a surface roughness tester manufactured by Kosaka Research Institute. Then, a sample of eight kinds of carbon substrates which were surface-treated separately was placed in a vacuum furnace, and 150 μm of pyrolytic nitrogen was respectively applied to the carbon substrate by passing BCl 3 and NH 3 gas at 1800 ° C and 50 Pa. Boron film surface coating. Thereafter, the pyrolytic boron nitride coating film was peeled off from the eight kinds of samples coated as described above, and X-ray diffraction and thermal expansion coefficient α 2 were measured for each of the coating films. The X-ray diffraction at this time was obtained by Rigaku Corporation's X-ray diffraction RINT-2500 VHF at a tube voltage of 30 kV, a tube current of 30 mA, a scanning speed of 6.0 °/min, a sampling width of 0.05 °, and 2 θ = 20 to 60. Under the conditions of °.

另外,熱膨脹係數的測量是利用ULVAC真空理工DL7000熱膨脹計(thermo-dilatometer)在50~800℃的溫度條件下進行的。 In addition, the coefficient of thermal expansion was measured using a ULVAC vacuum DL7000 thermo-dilatometer at a temperature of 50 to 800 °C.

表1給出了上述8種樣本的表面處理的噴射壓力、表面粗糙度、根據由實驗得到的源自於X-射線衍射晶面(002)的峰強度I(002)與源自於晶面(100)峰強度I(100)的數據而求出的峰強度比I(002)/I(100)的值、由實驗得到的被覆膜的熱膨脹係數α2的值。 Table 1 shows the spray pressure, surface roughness of the surface treatment of the above eight samples, the peak intensity I (002) derived from the X-ray diffraction crystal plane (002) obtained from the experiment, and the crystal plane derived from the crystal plane. (100) The peak intensity ratio I (002) / I (100) obtained from the peak intensity I (100) data, and the value of the thermal expansion coefficient α 2 of the coating film obtained by the experiment.

圖2基於表1的數值示出了碳基材的表面粗糙度與被覆膜的峰強度比之間的關係,圖3示出了被覆膜的峰強度比與熱膨脹係數α2的關係。從圖2及圖3可知,碳基材的表面粗糙度與被覆膜的峰強度比之間以及峰強度比與熱膨脹係數α2之間,分別具有某種一定規則性的關係。 2 shows the relationship between the surface roughness of the carbon substrate and the peak intensity ratio of the coating film based on the numerical values of Table 1, and FIG. 3 shows the relationship between the peak intensity ratio of the coating film and the thermal expansion coefficient α 2 . 2 and 3, the surface roughness of the carbon substrate and the peak intensity ratio of the coating film and the peak intensity ratio and the thermal expansion coefficient α 2 have a certain regular relationship.

即,根據圖2,若改變碳基材的表面粗糙度,則被覆膜的 峰強度比的值有隨著該變化而規則性減小的傾向;另一方面,根據圖3,如果峰強度比的值變小,則隨著該變化被覆膜的熱膨脹係數有規則性增大的傾向。因此,如果根據這些測定結果圖示出碳基材的表面粗糙度與被覆膜的熱膨脹係數α2的關係的話,則如圖1所示。從圖1清楚地說明了隨著表面粗糙度的增大,熱膨脹係數α2的值也有規則性增大的傾向。 That is, according to Fig. 2, when the surface roughness of the carbon substrate is changed, the value of the peak intensity ratio of the coating film tends to decrease regularly with the change; on the other hand, according to Fig. 3, if the peak intensity is When the value of the ratio is small, the coefficient of thermal expansion of the coating film tends to increase with the change. Therefore, if the relationship between the surface roughness of the carbon substrate and the thermal expansion coefficient α 2 of the coating film is shown based on these measurement results, it is as shown in FIG. 1 . It is clearly illustrated from Fig. 1 that as the surface roughness increases, the value of the coefficient of thermal expansion α 2 also tends to increase regularly.

因此,本發明人著眼於這種規則性的傾向,得到了只要使碳基材的表面粗糙度變化,即可以改變被覆膜的峰強度比和熱膨脹係數α2的見解,從而促成了本發明。因此,本發明根據以上見解,在被覆處理之前預先對碳基材的表面粗糙度進行調整,從而控制被覆後的熱解氮化硼膜的熱膨脹係數α2Therefore, the inventors of the present invention have focused on such a regular tendency, and have obtained the knowledge that the peak intensity ratio of the coating film and the thermal expansion coefficient α 2 can be changed as long as the surface roughness of the carbon substrate is changed, thereby contributing to the present invention. . Therefore, according to the above findings, the present invention adjusts the surface roughness of the carbon substrate before the coating treatment to control the thermal expansion coefficient α 2 of the coated pyrolytic boron nitride film.

在本發明中,對碳基材的表面粗糙度進行調整時,具體來講,較佳為以JIS B 0601-2001定義的算術平均粗糙度計調整為0.5μm以上且小於7.0μm,更佳為2.0μm以上且小於5.0μm。如果表面粗糙度小於下限值0.5μm,雖然能夠使基材和被覆膜的熱膨脹係數接近,但由於碳基材表面的錨固效果變小,被覆膜變得易於剝離,故不佳。另外,當表面粗糙度大於上限值7.0μm時,由於為了將表面粗糙度提高到7.0μm以上的噴射壓力過大,使在碳基材表面形成損傷層的可能性增大,故不佳。作為調整該表面粗糙度的方法,可以採用噴砂處理、砂紙研磨處理、蝕刻處理等。 In the present invention, when the surface roughness of the carbon substrate is adjusted, it is preferably adjusted to an arithmetic mean roughness meter defined by JIS B 0601-2001 to be 0.5 μm or more and less than 7.0 μm, more preferably 2.0 μm or more and less than 5.0 μm. When the surface roughness is less than the lower limit of 0.5 μm, the thermal expansion coefficient of the substrate and the coating film can be made close to each other. However, since the anchoring effect on the surface of the carbon substrate is small, the coating film is easily peeled off, which is not preferable. In addition, when the surface roughness is greater than the upper limit of 7.0 μm, the possibility of forming a damaged layer on the surface of the carbon substrate is increased because the injection pressure for increasing the surface roughness to 7.0 μm or more is excessive, which is not preferable. As a method of adjusting the surface roughness, a sandblasting treatment, a sandpaper polishing treatment, an etching treatment, or the like can be employed.

另外,如圖3所示,本發明能夠透過以使上述峰強度比I(002)/I(100)為10以上且小於500的範圍內的方式調整配向性, 來調整熱解氮化硼膜的熱膨脹係數α2Further, as shown in FIG. 3, the present invention can adjust the orientation of the pyroconductivity boron nitride film by adjusting the alignment property so that the peak intensity ratio I(002)/I(100) is in the range of 10 or more and less than 500. The coefficient of thermal expansion α 2 .

在製造本發明的碳基材時,較佳為使所被覆的熱解氮化硼膜的厚度為50μm以上且300μm以下。如果被覆膜的厚度比50μm薄,則腐蝕性氣體等會在被覆膜中擴散,容易與基底的碳基材發生反應,故不佳。另外,如果比300μm厚,則與被覆膜與碳基材之間的界面的殘留應力變大,變得容易剝離,故不佳。 In the production of the carbon substrate of the present invention, the thickness of the pyrolytic boron nitride film to be coated is preferably 50 μm or more and 300 μm or less. When the thickness of the coating film is thinner than 50 μm, a corrosive gas or the like diffuses in the coating film and easily reacts with the carbon substrate of the substrate, which is not preferable. In addition, when it is thicker than 300 μm, the residual stress at the interface with the coating film and the carbon substrate becomes large, and it is easy to peel off, which is not preferable.

另外,碳基材的製造多使用透過各向同性CIP成形而製造的碳基材,這種各向同性碳基材的熱膨脹係數雖然依存於其製造方法,但大約為3.0×10-6~8.0×10-6〔1/℃〕的範圍。而被覆於碳基材的熱解氮化硼被覆膜的熱膨脹係數α2一般大約在2.5×10-6~4.0×10-6〔1/℃〕的範圍內,因此,在實施本發明的製造方法時,參考這些熱膨脹係數的值,較佳為使兩者的熱膨脹係數接近的碳基材。 Further, in the production of a carbon substrate, a carbon substrate produced by forming an isotropic CIP is often used. The coefficient of thermal expansion of such an isotropic carbon substrate depends on the production method thereof, but is about 3.0×10 -6 to 8.0. ×10 -6 [1/°C] range. The thermal expansion coefficient α 2 of the pyrolytic boron nitride coating film coated on the carbon substrate is generally in the range of about 2.5×10 -6 to 4.0×10 -6 [1/° C], and therefore, in carrying out the invention In the production method, referring to the values of these thermal expansion coefficients, a carbon substrate having a thermal expansion coefficient close to each other is preferable.

實施例1 Example 1

接下來,對本發明的實施例進行詳細說明。在實施例1中,準備熱膨脹係數為3.5×10-6〔1/℃〕的碳基材,將表面粗糙度調整為3.9μm,並實施與上述實驗例同樣的熱解氮化硼膜的表面塗層。從該塗層後的碳基材剝下熱解氮化硼被覆膜,測定被覆膜的熱膨脹係數α2,結果為3.6×10-6〔1/℃〕。因為這個α2值是與碳基材的熱膨脹係數3.5×10-6〔1/℃〕相當接近的值,故該實施例1驗證了本發明的方法。 Next, an embodiment of the present invention will be described in detail. In Example 1, a carbon substrate having a thermal expansion coefficient of 3.5 × 10 -6 [1/°C] was prepared, and the surface roughness was adjusted to 3.9 μm, and the surface of the pyrolytic boron nitride film similar to the above experimental example was applied. coating. The pyrolytic boron nitride coating film was peeled off from the carbon substrate after the coating, and the thermal expansion coefficient α 2 of the coating film was measured and found to be 3.6 × 10 -6 [1/°C]. Since this α 2 value is a value which is quite close to the thermal expansion coefficient of the carbon substrate of 3.5 × 10 -6 [1/°C], this Example 1 verified the method of the present invention.

實施例2 Example 2

接下來,為了確認本發明的製造方法對抑制剝離等是否有效,準備了E至J的6種樣本進行實施。在本實施例2中,使用將其概要表示於圖4的加熱器1作為碳基材。6種加熱器1的兩端備有電極連接部2,製成全長600mm、寬20mm、厚5mm的形狀。表2示出了6種樣本各自的表面粗糙度和熱膨脹係數α1的值。 Next, in order to confirm whether the manufacturing method of the present invention is effective in suppressing peeling or the like, six kinds of samples of E to J are prepared and carried out. In the second embodiment, the heater 1 schematically shown in Fig. 4 is used as a carbon substrate. The electrode connection portion 2 is provided at both ends of the six types of heaters 1, and has a shape of a total length of 600 mm, a width of 20 mm, and a thickness of 5 mm. Table 2 shows the values of the surface roughness and the coefficient of thermal expansion α1 of each of the six samples.

在實施例2中,為了剝下被覆後的被覆膜測定被覆膜的熱膨脹係數α2,除了這6種樣本以外,還準備了各樣本的假樣本(dummy sample)。各假樣本被調整為分別與6種樣本的物性值等相同,與各樣本一起放入真空爐。然後,在1800℃、50Pa的條件下,透過BCl3和NH3氣體,在樣本加熱器1和假樣本加熱器1的基材表面實施了150μm的熱解氮化硼膜的表面塗層。表面塗層後從各自的假樣本的基材剝下熱解氮化硼被覆膜,對於該被覆膜, 進行與實施例1同樣的X-射線衍射和熱膨脹係數α2測定,將測定結果表示於表2。 In Example 2, in order to measure the thermal expansion coefficient α 2 of the coating film after peeling off the coating film, a dummy sample of each sample was prepared in addition to the six kinds of samples. Each of the dummy samples was adjusted to be the same as the physical property values of the six samples, and placed in a vacuum furnace together with each sample. Then, a surface coating of a 150 μm pyrolytic boron nitride film was applied to the surface of the substrate of the sample heater 1 and the dummy sample heater 1 through BCl 3 and NH 3 gas at 1800 ° C and 50 Pa. After the surface coating, the pyrolytic boron nitride coating film was peeled off from the base material of each of the dummy samples, and the same X-ray diffraction and thermal expansion coefficient α 2 as in Example 1 were measured for the coating film, and the measurement results were measured. Shown in Table 2.

另一方面,對於各樣本E至J的加熱器1,除去附著於其電極連接部2的被覆膜,在其兩端連接電源之後,在氨氣氣氛、室溫~1400℃下進行了自發熱熱循環試驗,其結果,樣本E及J發生了剝離,其他的樣本未發現剝離,得到了良好的結果。將其結果示於上述表2中。 On the other hand, in the heater 1 of each of the samples E to J, the coating film adhering to the electrode connecting portion 2 was removed, and after the power supply was connected to both ends, the gas was applied in an ammonia gas atmosphere at room temperature to 1400 ° C. In the heat cycle test, the samples E and J were peeled off, and no peeling was observed in the other samples, and good results were obtained. The results are shown in Table 2 above.

對於樣本E及J剝離的原因進行了考察,樣品E可認為是由於表面粗糙度小,錨固效果變小了,因此發生了剝離。而樣本J可認為是由於表面粗糙度大於上限值7.5μm,過大的負荷力作用於碳基材的表面而形成了損傷層,表面粒子脫落而導致剝離。 The reason for the peeling of the samples E and J was examined. The sample E was considered to be because the surface roughness was small and the anchoring effect was small, so that peeling occurred. On the other hand, the sample J is considered to have a surface roughness larger than the upper limit of 7.5 μm, and an excessive load force acts on the surface of the carbon substrate to form a damaged layer, and the surface particles fall off to cause peeling.

綜上所述,根據本發明,在製造用於加熱器及夾具等的熱解氮化硼被覆碳基材時,即使從各碳材料製造廠家得到的的碳基材存在熱膨脹係數的差異,也能夠透過預先調整所得到的碳基材的表面粗糙度來控制熱解氮化硼被覆膜的配向性和熱膨脹係數,因為能夠減小所塗敷的被覆膜與碳基材的熱膨脹係數的差異,因此能夠抑制由兩者的熱膨脹係數的差異而引起的剝離、變形等。 As described above, according to the present invention, when a pyrolytic boron nitride-coated carbon substrate for a heater, a jig or the like is produced, even if a carbon substrate obtained from each carbon material manufacturer has a difference in thermal expansion coefficient, The orientation and thermal expansion coefficient of the pyrolytic boron nitride coating film can be controlled by adjusting the surface roughness of the obtained carbon substrate in advance, because the coefficient of thermal expansion of the coated coating film and the carbon substrate can be reduced. Since the difference is made, it is possible to suppress peeling, deformation, and the like caused by the difference in thermal expansion coefficients of both.

Claims (3)

一種熱解氮化硼被覆碳基材的製造方法,用熱解氮化硼被覆碳基材的一部分或全部,其特徵在於,透過調整上述碳基材的表面粗糙度來控制上述熱解氮化硼被覆膜的熱膨脹係數。 A method for producing a pyrolytic boron nitride-coated carbon substrate, wherein a part or all of the carbon substrate is coated with pyrolytic boron nitride, wherein the thermal nitriding is controlled by adjusting a surface roughness of the carbon substrate The coefficient of thermal expansion of the boron coating film. 如申請專利範圍第1項所述的熱解氮化硼被覆碳基材的製造方法,其中,上述碳基材的表面粗糙度以JIS B 0601-2001定義的算術平均粗糙度計調整為0.5μm以上且小於7.0μm。 The method for producing a boron nitride-coated carbon substrate according to the first aspect of the invention, wherein the surface roughness of the carbon substrate is adjusted to 0.5 μm by an arithmetic mean roughness meter defined in JIS B 0601-2001. Above and less than 7.0 μm. 如申請專利範圍第1項或第2項所述的熱解氮化硼被覆碳基材的製造方法,其中,在上述熱解氮化硼被覆膜中,透過源自於晶面(002)的峰強度I(002)和源自於晶面(100)的峰強度I(100)計算的峰強度比I(002)/I(100)為10以上且小於500。 The method for producing a pyrolytic boron nitride-coated carbon substrate according to the first or second aspect of the invention, wherein, in the pyrolytic boron nitride coating film, the transmission is derived from a crystal plane (002) The peak intensity I (002) and the peak intensity ratio I (100) calculated from the peak intensity I (100) of the crystal plane (100) are 10 or more and less than 500.
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