TW201416133A - Cleaning method for showerhead - Google Patents

Cleaning method for showerhead Download PDF

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Publication number
TW201416133A
TW201416133A TW101138128A TW101138128A TW201416133A TW 201416133 A TW201416133 A TW 201416133A TW 101138128 A TW101138128 A TW 101138128A TW 101138128 A TW101138128 A TW 101138128A TW 201416133 A TW201416133 A TW 201416133A
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Taiwan
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shower
vibrator
reaction chamber
cleaning
mask
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TW101138128A
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Chinese (zh)
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Tsan-Hua Huang
Kian-Poh Wong
Miao-Chang Wu
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Hermes Epitek Corp
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Priority to TW101138128A priority Critical patent/TW201416133A/en
Publication of TW201416133A publication Critical patent/TW201416133A/en

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Abstract

The invention provides a cleaning method for showerhead. The method uses a vibrator to directly or indirectly vibrate a showerhead to provide in situ clean or off line clean so as to remove the undesired particles or residue attached on the showerhead.

Description

噴淋器之清潔方法Sprinkler cleaning method

本發明有關於一種噴淋器的清潔方法,特別是有關於一種標準化的噴淋器的清潔方法。This invention relates to a method of cleaning a shower, and more particularly to a method of cleaning a standardized shower.

在例如在具有噴淋器(showerhead)的反應腔體內進行的薄膜沉積製程或化學氣相沉積製程的半導體製程中,半導體晶圓係置於一具有加熱功能的晶圓載台,而噴淋器則噴淋製程所需的反應氣體進入反應腔體內以及晶圓載台上的半導體晶圓之上。當例如含有欲沉積材料之前驅物氣體的反應氣體透過噴淋器噴淋至半導體晶圓上,反應腔體內進行一化學反應,因此形成薄膜於半導體晶圓上。在化學反應過程中,反應腔體內必須維持高溫以進行化學反應。In a semiconductor process such as a thin film deposition process or a chemical vapor deposition process performed in a shower chamber having a showerhead, the semiconductor wafer is placed on a wafer stage having a heating function, and the shower is The reactive gas required for the spray process enters the reaction chamber and over the semiconductor wafer on the wafer stage. When, for example, a reaction gas containing a precursor gas to be deposited is sprayed onto the semiconductor wafer through a shower, a chemical reaction is performed in the reaction chamber, thereby forming a thin film on the semiconductor wafer. During the chemical reaction, the reaction chamber must maintain a high temperature for chemical reaction.

噴淋器表面及氣源通道出口於製程中非常容易沉積不想要的微粒及反應產物,使得噴淋器表面必須在製程後必須執行清潔動作,因而需佔用許多機台的上線時間。此外微粒沉積於氣源通道內表面會造成出口或開孔堵塞,影響氣體流量及流場的均勻性,因而降低薄膜厚度的均勻性以及製程良率。甚至在反應腔體抽真空時,氣源通道內表面沉積的微粒可能慢慢地或成團地掉落在晶片上,造成晶片良率的下降。The surface of the shower and the outlet of the gas source channel are very easy to deposit unwanted particles and reaction products during the process, so that the surface of the shower must be cleaned after the process, and thus it takes up a lot of time for the machine to go online. In addition, the deposition of particles on the inner surface of the gas source passage may cause the outlet or the opening to be clogged, affecting the gas flow rate and the uniformity of the flow field, thereby reducing the uniformity of the film thickness and the process yield. Even when the reaction chamber is evacuated, particles deposited on the inner surface of the gas source passage may fall slowly or agglomerate on the wafer, resulting in a decrease in wafer yield.

習知的噴淋器清潔方式是以操作人員於製程結束後以人工的方式清潔噴淋器的表面。實務上操作人員是手持真空吸塵器與清潔刷清潔噴淋器的表面,並以承盤收集微粒。另一種習知的噴淋器清潔方式是以化學藥劑清洗噴淋器。Conventional sprinkler cleaning methods are performed by the operator manually cleaning the surface of the sprinkler after the end of the process. In practice, the operator cleans the surface of the shower with a vacuum cleaner and a cleaning brush, and collects the particles by the retainer. Another conventional method of shower cleaner cleaning is to clean the shower with a chemical.

但是傳統以人工清潔噴淋器卻有許多缺點。首先,手動清潔噴淋器表面需要花費較長時間,佔用機台的許多上線時間。其次,噴淋器表面清潔程度取決於操作人員的個人作業方式,缺乏一致的標準。另外噴淋器氣源通道出口及氣源通道內表面無法以人工的方式逐一清潔,未清除的沉積微粒可能於製程中或抽真空時掉落在晶片上,造成晶片良率的下降。最後,氣源通道出口及內表面沉積微粒可能對透過氣源通道偵測晶圓溫度的線上監測器造成干擾使其量測失準,導致製程參數變動飄移。However, the traditional manual cleaning of the shower has many disadvantages. First, it takes a long time to manually clean the shower surface, taking up a lot of time on the machine. Secondly, the degree of surface cleaning of the shower depends on the individual operating methods of the operator and lacks consistent standards. In addition, the outlets of the sprinkler gas source passage and the inner surface of the gas source passage cannot be cleaned one by one by manual means, and the unremoved deposited particles may fall on the wafer during the process or during vacuuming, resulting in a decrease in the yield of the wafer. Finally, the deposition of particles on the outlet and inner surface of the gas source channel may interfere with the on-line monitor that detects the temperature of the wafer through the gas source channel, causing the measurement to be out of alignment, resulting in drifting of process parameters.

而利用化學藥劑清洗噴淋器的清洗方式則有化學藥劑殘留污染及耗費時間等問題。However, the cleaning method of cleaning the shower by chemical agents has problems such as residual chemical contamination and time consuming.

因此,需要一種可提供標準化且有效能的氣體噴淋器的線上清潔方法與裝置,以解決上述習知技術的問題。Accordingly, there is a need for an in-line cleaning method and apparatus that provides a standardized and efficient gas shower to address the above-discussed problems.

在本發明的ㄧ實施例中提出一種噴淋器之線上清潔方法,包含以下步驟。首先提供一與ㄧ反應腔體及一遮罩結合之噴淋器,遮罩設置於噴淋器上,反應腔體內具有ㄧ承盤。接著將一振動器設置於噴淋器或遮罩上。然後使用振動器振動噴淋器與遮罩。若噴淋器與反應腔體呈閉合狀態,則可對反應腔體抽真空,並以清潔氣體氣流通過噴淋器,以及移除承盤。若噴淋器與反應腔體呈未完全閉合狀態,則先移除承盤,並將噴淋器與反應腔體閉合,再對反應腔體抽真空。In an embodiment of the invention, a method of cleaning a line of a shower is provided, comprising the following steps. First, a shower is provided in combination with the reaction chamber and a mask. The mask is disposed on the shower, and the reaction chamber has a bearing tray. A vibrator is then placed on the shower or mask. Then use a vibrator to vibrate the shower and the mask. If the shower is closed to the reaction chamber, the reaction chamber can be evacuated and the clean gas stream can be passed through the shower and the retainer removed. If the shower and the reaction chamber are not fully closed, the retainer is removed first, and the shower is closed with the reaction chamber, and then the reaction chamber is evacuated.

本發明的另ㄧ實施例提出一種噴淋器之離線清潔方法,包含以下步驟。首先提供一噴淋器並將噴淋器置於一清潔槽中。接著將一振動器設置於噴淋器或清潔槽上。然後使用振動器振動噴淋器或清潔槽。噴淋器可連接至一氣源,並以氣源對噴淋器進行噴氣。清潔槽可連接ㄧ抽氣幫浦並對清潔槽進行抽氣。Another embodiment of the present invention provides an off-line cleaning method for a shower, comprising the following steps. A sprinkler is first provided and the shower is placed in a cleaning tank. A vibrator is then placed on the shower or cleaning tank. Then use a vibrator to vibrate the shower or cleaning tank. The shower can be connected to a source of air and the jet can be jetted with a source of air. The cleaning tank can be connected to the pumping pump and pump the cleaning tank.

本發明的又ㄧ實施例提出一種噴淋器之離線清潔方法,包含以下步驟。首先提供一與一遮罩結合之噴淋器並將噴淋器與遮罩置於一清潔槽中。接著將一振動器設置於噴淋器或遮罩或清潔槽上。然後使用振動器振動噴淋器遮罩或清潔槽。噴淋器與遮罩可連接至一氣源,並以氣源對噴淋器進行噴氣。清潔槽可連接ㄧ抽氣幫浦並對清潔槽進行抽氣。Still another embodiment of the present invention provides an off-line cleaning method for a shower, comprising the following steps. First, a shower is combined with a mask and the shower and the cover are placed in a cleaning tank. A vibrator is then placed on the shower or on the mask or cleaning tank. Then use a vibrator to vibrate the shower to cover or clean the tank. The shower and the cover can be connected to a source of air and the jet can be jetted with a source of air. The cleaning tank can be connected to the pumping pump and pump the cleaning tank.

以下將完成針對本發明的特定實施例參考內容。本發明的一些實施例將詳細描述如下。這些實施例的範例係伴隨著圖式以進行說明。然而,除了如下描述外,本發明還可以廣泛地在其他的實施例施行,且本發明的範圍並不受實施例之限定。相反地,本發明的範圍實包含符合本發明實施例的替換、修改及等效實施例並以之後的本發明的申請專利範圍為準。在以下的說明敘述中,提出的許多特定細節以使本發明能更被透徹了解。但本發明仍可在沒有部分或全部特定細節的情況下實施。此外習知的製程步驟及元件在此並不詳細描述以避免不必要混淆本發明焦點。Reference will be made to specific embodiments of the invention below. Some embodiments of the invention are described in detail below. Examples of these embodiments are illustrated with the accompanying drawings. However, the present invention can be widely practiced in other embodiments except as described below, and the scope of the present invention is not limited by the embodiments. On the contrary, the scope of the invention is intended to be In the following description, numerous specific details are set forth to provide a further understanding of the invention. However, the invention may be practiced without some or all of the specific details. Furthermore, conventional process steps and components are not described in detail herein to avoid obscuring the scope of the present invention.

於本發明之實施例中,噴淋器係應用於一沉積系統,例如一化學氣相沉積系統,但不限於一化學氣相沉積系統。一典型沉積系統通常包含一包圍一製程空間的反應腔體、一氣體輸送裝置及噴淋器。噴淋器係設置於製程空間之上,而一基板載台則設置於製程空間之下。基板載台係用於承載至少一置於其上以進行製程的基板。典型載入沉積系統以進行製程的基板包含矽晶圓、藍寶石基板、碳化矽基板或氮化鎵或三五族半導體基板等。必須了解的是其他種類的基板,例如玻璃基板亦可載入沉積系統以進行製程。沉積系統可進一步包含其他對於本領域具一般技藝者而言係顯而易見的所需的元件。In an embodiment of the invention, the shower is applied to a deposition system, such as a chemical vapor deposition system, but is not limited to a chemical vapor deposition system. A typical deposition system typically includes a reaction chamber surrounding a process space, a gas delivery device, and a shower. The shower is disposed above the process space, and a substrate carrier is disposed below the process space. The substrate stage is for carrying at least one substrate disposed thereon for processing. A substrate that is typically loaded into a deposition system for processing includes a germanium wafer, a sapphire substrate, a tantalum carbide substrate, or a gallium nitride or a tri-five semiconductor substrate. It must be understood that other types of substrates, such as glass substrates, can also be loaded into the deposition system for processing. The deposition system may further comprise other components that are apparent to those of ordinary skill in the art.

第一A圖顯示根據本發明一實施例之遮罩、噴淋器與反應腔體的剖面圖。第一A圖中之噴淋器100係裝置於反應腔體200上結合,遮罩(dome)400則設置於噴淋器100之上,氣壓式振動器(pneumatic vibrator)300則設置於噴淋器100本體上,承盤210置於反應腔體200內之承盤支架211上。氣壓式振動器300可設置於噴淋器100外表面或圓周處,或遮罩400之外表面或圓周處。承盤210與反應腔體200內壁之間可具有ㄧ間隙以利於真空抽氣。氣壓式振動器300包含一使用氮氣壓力的氣壓式振動器,壓力為約6 bar,振動頻率為約37000 赫茲(Hz),振動力為約2100 牛頓(N),無須使用潤滑劑。氣壓式振動器300僅為ㄧ範例,並非限制,任何其他適合的振動器亦可應用於本發明之實施例中。Figure 1A shows a cross-sectional view of a mask, shower and reaction chamber in accordance with an embodiment of the present invention. The shower 100 in the first A diagram is coupled to the reaction chamber 200, the dome 400 is disposed on the shower 100, and the pneumatic vibrator 300 is disposed on the shower. On the body of the device 100, the retainer 210 is placed on the retainer bracket 211 in the reaction chamber 200. The pneumatic vibrator 300 may be disposed at an outer surface or circumference of the shower 100, or at an outer surface or circumference of the mask 400. There may be a gap between the retainer 210 and the inner wall of the reaction chamber 200 to facilitate vacuum pumping. The pneumatic vibrator 300 includes a pneumatic vibrator using nitrogen pressure at a pressure of about 6 bar, a vibration frequency of about 37,000 Hertz (Hz), and a vibration force of about 2100 Newtons (N) without the use of a lubricant. The pneumatic vibrator 300 is merely an example of a crucible, and is not limiting, and any other suitable vibrator may be employed in embodiments of the present invention.

第一B圖顯示根據本發明一實施例之遮罩與噴淋器的局部剖面圖。遮罩400設置於噴淋器100之上,第一B圖中同時可見噴淋器100之噴淋器表面110、氣源通道出口130及氣源通道內表面140。氣源通道係連接至氣體輸送裝置(未圖示),氣源通道則連接氣源通道出口130。氣體輸送裝置包含多種取決所進行的製程所需的氣源。各種氣體,例如前驅氣體、載送氣體、清潔氣體或其他可自氣體輸送裝置供應至噴淋器,並經氣源通道與氣源通道出口130噴出。Figure 1B shows a partial cross-sectional view of a mask and shower in accordance with an embodiment of the present invention. The mask 400 is disposed above the shower 100. The shower surface 110 of the shower 100, the air source passage outlet 130, and the air source passage inner surface 140 are simultaneously visible in the first B. The gas source channel is connected to a gas delivery device (not shown), and the gas source channel is connected to the gas source channel outlet 130. The gas delivery device contains a variety of gas sources that are required for the process to be performed. Various gases, such as a precursor gas, a carrier gas, a cleaning gas, or the like, may be supplied to the shower from the gas delivery device and ejected through the gas source passage and the gas source passage outlet 130.

線上清潔本發明之線上清潔噴淋器的方法係將氣壓式振動器加裝於噴淋器本體上,以特定頻率振動,同時配合幫浦抽真空之氣流衝力以及氮氣清潔(purge)氣流,使沉積在噴淋器表面、氣源通道出口及氣源通道內表面的微粒直接掉落,並以承盤接收移除。經清潔之後的噴淋器於後續製程中可避免累積的沉積微粒或殘留物掉落在晶片上,造成晶片良率的下降。The method of online cleaning shower cleaning line according to the present invention will be based on the pneumatic vibrators installed sprinkler body vibration at a particular frequency, in conjunction with a vacuum pump extraction flow momentum and nitrogen purge (purge) gas flow, so that The particles deposited on the surface of the shower, the outlet of the gas source passage, and the inner surface of the gas source passage are directly dropped and received and removed by the retainer. The cleaned shower can prevent accumulated deposited particles or residues from falling on the wafer during subsequent processes, resulting in a decrease in wafer yield.

在本發明的一實施例中,如第一A圖所示,噴淋器100係與反應腔體200結合,由氣壓式振動器300振動噴淋器100。將氣壓式振動器300設置於噴淋器100。將承盤210置於反應腔體200內的承盤支架211上,噴淋器100與反應腔體200呈閉合狀態。以氣壓式振動器300以特定頻率振動噴淋器100,使沉積在噴淋器表面110、氣源通道出口130及氣源通道內表面140的微粒直接掉落承盤210上。氣壓式振動器300振動時,真空幫浦同時啟動並以氮氣進行清潔(purge)。利用氣壓式振動器300以特定頻率振動,同時配合幫浦抽真空之氣流衝力以及氮氣清潔氣流,以振動及氣流衝力清潔沉積在噴淋器表面110、氣源通道出口130及氣源通道內表面140的微粒。將反應腔體200內的承盤支架211上的承盤210移除。In an embodiment of the invention, as shown in FIG. A, the shower 100 is coupled to the reaction chamber 200, and the shower 100 is vibrated by the pneumatic vibrator 300. The pneumatic vibrator 300 is placed in the shower 100. The retainer 210 is placed on the retainer bracket 211 in the reaction chamber 200, and the shower 100 and the reaction chamber 200 are in a closed state. The shower 100 is vibrated at a specific frequency by the pneumatic vibrator 300, so that particles deposited on the shower surface 110, the air source passage outlet 130, and the air source passage inner surface 140 are directly dropped onto the retainer 210. When the pneumatic vibrator 300 vibrates, the vacuum pump is simultaneously activated and purged with nitrogen. The pneumatic vibrator 300 is vibrated at a specific frequency, and is combined with the pumping vacuum and the nitrogen cleaning airflow, and is cleanly deposited by the vibration and the airflow force on the shower surface 110, the air source passage outlet 130, and the inner surface of the air source passage. 140 particles. The retainer 210 on the retainer bracket 211 within the reaction chamber 200 is removed.

在本發明的另一實施例中,如第一C圖所示,在噴淋器100與反應腔體200並未完全閉合的情況下,由氣壓式振動器300振動噴淋器100。將氣壓式振動器300裝置在噴淋器100。將承盤210置於反應腔體200內的承盤支架211上,噴淋器100與反應腔體200成開啟狀態或幾近閉合狀態。以氣壓式振動器300以特定頻率振動噴淋器100,使沉積在噴淋器表面110、氣源通道出口130及氣源通道內表面140的微粒直接掉落承盤210上。將反應腔體200內的承盤支架211上的承盤210移除。使噴淋器100與反應腔體200成閉合狀態。啟動真空幫浦,將未掉落於承盤210上的殘餘微粒吸除,而由反應腔體200後方的微粒捕集(particle trap)設備移除。In another embodiment of the present invention, as shown in FIG. C, the shower 100 is vibrated by the pneumatic vibrator 300 in the event that the shower 100 and the reaction chamber 200 are not fully closed. The pneumatic vibrator 300 is installed in the shower 100. The retainer 210 is placed on the retainer bracket 211 in the reaction chamber 200, and the shower 100 is in an open state or a nearly closed state with the reaction chamber 200. The shower 100 is vibrated at a specific frequency by the pneumatic vibrator 300, so that particles deposited on the shower surface 110, the air source passage outlet 130, and the air source passage inner surface 140 are directly dropped onto the retainer 210. The retainer 210 on the retainer bracket 211 within the reaction chamber 200 is removed. The shower 100 is brought into a closed state with the reaction chamber 200. The vacuum pump is activated to remove residual particles that have not fallen onto the retainer 210 and are removed by a particle trap device behind the reaction chamber 200.

上述線上清潔噴淋器的方式不需以人工手動的方式清潔噴淋器表面,可同時清潔噴淋器表面、噴淋器之氣源通道出口及氣源通道內表面,並可縮短清潔所需要花費的時間,增加機台的上線時間。此外,使用自動化與標準化的清潔方式,可避免人工清潔方式缺乏一致標準的缺點。氣壓式振動器的頻率與振動力可藉由調整氣體壓力而達成。The above method of cleaning the shower on the line does not need to manually clean the surface of the shower, and can simultaneously clean the surface of the shower, the outlet of the air source passage of the shower and the inner surface of the air source passage, and can shorten the cleaning requirements. The time spent increases the on-line time of the machine. In addition, the use of automated and standardized cleaning methods avoids the shortcomings of manual cleaning methods that lack consistent standards. The frequency and vibration force of the pneumatic vibrator can be achieved by adjusting the gas pressure.

離線清潔本發明之離線清潔噴淋器的方法係將噴淋器本體拆下置於一清潔槽中,接著將氣壓式振動器裝設於噴淋器本體上,並以特定頻率振動,使沉積在噴淋器表面、氣源通道出口及氣源通道內表面的微粒直接掉落於清潔槽中,如此可避免使用化學濕式清洗方式的化學藥劑殘留污染及時間耗費等問題。Off-line off-line cleaning shower cleaning system of the present invention to remove shower body is placed in a cleaning bath, and then the pneumatic vibrator is mounted on the sprinkler body, and the vibration at a particular frequency, the deposited The particles on the surface of the shower, the outlet of the gas source passage and the inner surface of the gas source passage are directly dropped into the cleaning tank, thereby avoiding problems such as residual chemical contamination and time consumption of the chemical wet cleaning method.

在本發明的一實施例中,如第二圖所示,噴淋器100與反應腔體200及遮罩400分離,將噴淋器100置於清潔槽500中,並將氣壓式振動器300裝置在噴淋器100,利用氣壓式振動器300以特定頻率振動噴淋器100,使沉積在噴淋器表面110、氣源通道出口130及氣源通道內表面140的微粒直接掉落清潔槽500中。噴淋器100亦可連同遮罩400一起與反應腔體200分離,並置於清潔槽500中,並將氣壓式振動器300裝置在噴淋器100或遮罩400上,以氣壓式振動器300以特定頻率振動噴淋器100或遮罩400。In an embodiment of the present invention, as shown in the second figure, the shower 100 is separated from the reaction chamber 200 and the mask 400, the shower 100 is placed in the cleaning tank 500, and the pneumatic vibrator 300 is placed. The device is in the shower 100, and the shower 100 is vibrated at a specific frequency by the pneumatic vibrator 300, so that the particles deposited on the shower surface 110, the air source passage outlet 130 and the inner surface 140 of the air source passage are directly dropped into the cleaning tank. 500. The shower 100 can also be separated from the reaction chamber 200 together with the mask 400 and placed in the cleaning tank 500, and the pneumatic vibrator 300 can be placed on the shower 100 or the mask 400 to the pneumatic vibrator 300. The shower 100 or mask 400 is vibrated at a particular frequency.

在本發明的另一實施例中,氣壓式振動器300裝置在清潔槽500之上,將噴淋器100或噴淋器100連同遮罩400置入清潔槽500中,利用氣壓式振動器300以特定頻率振動噴淋器100或遮罩400,使沉積在噴淋器表面110、氣源通道出口130及氣源通道內表面140的微粒直接掉落清潔槽500中。In another embodiment of the present invention, the pneumatic vibrator 300 is disposed above the cleaning tank 500, and the shower 100 or the shower 100 is placed in the cleaning tank 500 together with the mask 400, using the pneumatic vibrator 300. The shower 100 or the mask 400 is vibrated at a specific frequency such that particles deposited on the shower surface 110, the air source passage outlet 130, and the air source passage inner surface 140 are directly dropped into the cleaning tank 500.

此外在本發明的一實施例中,上述噴淋器100或噴淋器100連同遮罩400亦可連接氣源進行噴氣以輔助清潔噴淋器。清潔槽500可連接ㄧ抽氣幫浦並進行抽氣以抽離掉落清潔槽500中的微粒。In addition, in an embodiment of the invention, the shower 100 or the shower 100 together with the mask 400 may also be connected to a source of air for jetting to assist in cleaning the shower. The cleaning tank 500 can be connected to the helium pump and pumped to evacuate the particles in the cleaning tank 500.

上述離線清潔噴淋器的方式亦不需以人工手動的方式清潔噴淋器表面,可同時清潔噴淋器表面、噴淋器之氣源通道出口及氣源通道內表面。此外,使用自動化與標準化的清潔方式,可避免人工清潔方式缺乏一致標準的缺點。利用氣壓式振動器振動噴淋器可避免使用化學濕式清洗方式的化學藥劑殘留污染及時間耗費等問題。The above-mentioned offline cleaning sprayer does not need to manually clean the surface of the shower, and can simultaneously clean the surface of the shower, the outlet of the air source passage of the shower, and the inner surface of the air source passage. In addition, the use of automated and standardized cleaning methods avoids the shortcomings of manual cleaning methods that lack consistent standards. The use of a pneumatic vibrator to vibrate the sprinkler avoids problems such as chemical contamination and time consumption of the chemical wet cleaning method.

本發明經由對照所屬實施例進行說明與敘述,但上述之實施例僅係為說明本發明之技術思想及特點,其目的在使熟悉此技藝之人士能了解本發明之內容並據以實施,不應據以限定本發明之專利範圍,即凡其他未脫離本發明所揭示精神所完成之各種等效改變或修飾都涵蓋在本發明所揭露的範圍內,均應包含在以下之申請專利範圍內。The present invention has been described and described with respect to the embodiments of the present invention. However, the embodiments described above are merely illustrative of the technical spirit and features of the present invention, and the purpose of the present invention is to enable those skilled in the art to understand the contents of the present invention and implement them. The scope of the invention is defined by the scope of the invention, which is intended to be included within the scope of the invention as disclosed in the following claims. .

100...噴淋器100. . . Sprinkler

110...噴淋器表面110. . . Sprinkler surface

130...氣源通道出口130. . . Air source outlet

140...氣源通道內表面140. . . Air source channel inner surface

200...反應腔體200. . . Reaction chamber

210...承盤210. . . Bearing

211...承盤支架211. . . Shelf bracket

300...氣壓式振動器300. . . Pneumatic vibrator

400...遮罩400. . . Mask

500...清潔槽500. . . Cleaning tank

本發明上述的特徵可藉由更詳細的描述、前述的簡單說明以及參照實施例說明而得到更深入的了解,實施例均伴隨所附圖式。值得注意的是,儘管所附圖式僅顯示本發明代表性的實施例,但並不限制本發明的範圍,而本發明包含其他等效實施例。本發明上述的特徵及優點將可因施例詳細的描述及所附圖式更易於了解。The above-described features of the present invention will become more fully understood from the detailed description of the invention. It is to be understood that the scope of the invention is not intended to The above described features and advantages of the present invention will be more readily understood from the detailed description of the embodiments.

第一A圖為本發明一實施例中噴淋器與反應腔體結合並以振動器進行清潔之示意圖。 第一B圖為本發明一實施例之遮罩與噴淋器的局部剖面圖。 第一C圖為本發明一實施例中噴淋器與反應腔體未完全閉合並以振動器進行清潔之示意圖。 第二圖為本發明一實施例中將噴淋器置於清潔槽中並以振動器進行清潔之示意圖。The first A is a schematic view of a shower in which a shower is combined with a reaction chamber and cleaned by a vibrator. Figure B is a partial cross-sectional view of a mask and shower of an embodiment of the present invention. The first C is a schematic view of the shower and the reaction chamber not completely closed and cleaned by a vibrator according to an embodiment of the invention. The second figure is a schematic view of a shower in which a shower is placed in a cleaning tank and cleaned with a vibrator.

100...噴淋器100. . . Sprinkler

200...反應腔體200. . . Reaction chamber

210...承盤210. . . Bearing

211...承盤支架211. . . Shelf bracket

300...氣壓式振動器300. . . Pneumatic vibrator

400...遮罩400. . . Mask

Claims (14)

一種噴淋器之線上清潔方法,包含: 提供一與ㄧ反應腔體及一遮罩結合之噴淋器,該遮罩設置於該噴淋器上,該反應腔體內具有ㄧ承盤; 將一振動器設置於該噴淋器或該遮罩上;及 使用該振動器振動該噴淋器與該遮罩。A method for cleaning a line of a shower, comprising: providing a shower combined with a reaction chamber and a mask, the cover being disposed on the shower, the reaction chamber having a bearing tray; a vibrator is disposed on the shower or the mask; and the vibrator is used to vibrate the shower and the mask. 如[請求項1]所述之方法,其中該噴淋器與該反應腔體呈閉合狀態。The method of claim 1 wherein the shower is in a closed state with the reaction chamber. 如[請求項2]所述之方法,更包含:對該反應腔體抽真空;以清潔氣體氣流通過該噴淋器;及移除該承盤。The method of claim 2, further comprising: evacuating the reaction chamber; passing the clean gas stream through the shower; and removing the retainer. 如[請求項1]所述之方法,其中該振動器為一種氣壓式振動器。The method of [Recommendation 1], wherein the vibrator is a pneumatic vibrator. 如[請求項4]所述之方法,其中該氣壓式振動器為一種使用氮氣壓力的氣壓式振動器。The method of claim 4, wherein the pneumatic vibrator is a pneumatic vibrator using nitrogen pressure. 如[請求項1]所述之方法,其中該噴淋器與該反應腔體呈未完全閉合狀態。The method of claim 1, wherein the shower is in an incompletely closed state with the reaction chamber. 如[請求項6]所述之方法,更包含: 移除該承盤;將該噴淋器與該反應腔體閉合;及對該反應腔體抽真空。The method of claim 6, further comprising: removing the retainer; closing the shower with the reaction chamber; and evacuating the reaction chamber. 一種噴淋器之離線清潔方法,包含: 提供一噴淋器並將該噴淋器置於一清潔槽中; 將一振動器設置於該噴淋器或該清潔槽上;及 使用該振動器振動該噴淋器或該清潔槽。An off-line cleaning method for a shower, comprising: providing a shower and placing the shower in a cleaning tank; placing a vibrator on the shower or the cleaning tank; and using the vibrator Vibrate the shower or the cleaning tank. 如[請求項8]所述之方法,其中該振動器為一種氣壓式振動器。The method of [Recommendation 8], wherein the vibrator is a pneumatic vibrator. 如[請求項8]所述之方法,更包含 連接一氣源至該噴淋器並對該噴淋器進行噴氣。The method of [Recommendation 8], further comprising connecting a gas source to the shower and ejecting the shower. 如[請求項8]所述之方法,更包含連接ㄧ抽氣幫浦至該清潔槽並進行抽氣。The method according to [Recommendation 8], further comprising connecting the pumping pump to the cleaning tank and performing pumping. 一種噴淋器之離線清潔方法,包含: 提供一與一遮罩結合之噴淋器並將該噴淋器與該遮罩置於一清潔槽中; 將一振動器設置於該噴淋器或該遮罩或該清潔槽上;及 使用該振動器振動該噴淋器該遮罩或該清潔槽。An off-line cleaning method for a shower, comprising: providing a shower combined with a mask and placing the shower and the mask in a cleaning tank; placing a vibrator in the shower or The mask or the cleaning tank; and the vibrator is used to vibrate the shower or the cleaning tank. 如[請求項12]所述之方法,更包含連接一氣源至該噴淋器與該遮罩並對該噴淋器進行噴氣。The method of claim 12, further comprising connecting a gas source to the shower and the mask and jetting the shower. 如[請求項12]所述之方法,更包含連接ㄧ抽氣幫浦至該清潔槽並進行抽氣。The method according to [Recommendation 12], further comprising connecting the pumping pump to the cleaning tank and performing pumping.
TW101138128A 2012-10-16 2012-10-16 Cleaning method for showerhead TW201416133A (en)

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN110931384A (en) * 2018-09-20 2020-03-27 广东众元半导体科技有限公司 Non-contact type spraying cleaning device

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN110931384A (en) * 2018-09-20 2020-03-27 广东众元半导体科技有限公司 Non-contact type spraying cleaning device

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