TW201415740A - Composition for filling discharge gap and electrostatic discharge protector - Google Patents
Composition for filling discharge gap and electrostatic discharge protector Download PDFInfo
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- TW201415740A TW201415740A TW102105834A TW102105834A TW201415740A TW 201415740 A TW201415740 A TW 201415740A TW 102105834 A TW102105834 A TW 102105834A TW 102105834 A TW102105834 A TW 102105834A TW 201415740 A TW201415740 A TW 201415740A
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/02—Details
- H05K1/0213—Electrical arrangements not otherwise provided for
- H05K1/0254—High voltage adaptations; Electrical insulation details; Overvoltage or electrostatic discharge protection ; Arrangements for regulating voltages or for using plural voltages
- H05K1/0257—Overvoltage protection
- H05K1/0259—Electrostatic discharge [ESD] protection
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/02—Details
- H05K1/09—Use of materials for the conductive, e.g. metallic pattern
- H05K1/092—Dispersed materials, e.g. conductive pastes or inks
- H05K1/095—Dispersed materials, e.g. conductive pastes or inks for polymer thick films, i.e. having a permanent organic polymeric binder
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01C—RESISTORS
- H01C7/00—Non-adjustable resistors formed as one or more layers or coatings; Non-adjustable resistors made from powdered conducting material or powdered semi-conducting material with or without insulating material
- H01C7/10—Non-adjustable resistors formed as one or more layers or coatings; Non-adjustable resistors made from powdered conducting material or powdered semi-conducting material with or without insulating material voltage responsive, i.e. varistors
- H01C7/12—Overvoltage protection resistors
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Abstract
Description
本發明係關於放電間隙填充用組成物及靜電放電保護體,更詳細而言,係關於一種放電時之作動性優異,能夠小型化、低成本化的靜電放電保護體、及使用於此靜電放電保護體的放電間隙填充用組成物。 The present invention relates to a discharge gap filling composition and an electrostatic discharge protector, and more particularly to an electrostatic discharge protector which is excellent in actuation during discharge, can be reduced in size and cost, and is used for electrostatic discharge. A composition for filling the discharge gap of the protective body.
若帶電的導電性物體(例如人體)接觸到其他的導電性物體(例如電子機器),或十分靠近,則會產生激烈的放電。此現象被稱為靜電放電(electro-static discharge,以下亦記述為「ESD」),具有引起電子機器的錯誤動作或損傷等問題,或在爆炸性環境中成為爆炸的原因等。 If a charged conductive object (such as a human body) comes into contact with other conductive objects (such as electronic devices), or is in close proximity, a severe discharge will occur. This phenomenon is called electro-static discharge (hereinafter also referred to as "ESD"), and causes problems such as malfunction or damage of an electronic device, or causes an explosion in an explosive environment.
ESD係電系統及積體電路會遭受的破壞性且不可避免的現象之一。若由電性的觀點進行說明,則ESD係指具有數安培的峰值電流之高電流持續10n秒至300n秒之過渡性的高電流現象。因而,ESD發生時,若不在數十n秒以內將約略數安培的電流傳導至積體電路的外部,則該積體電路會受到難以修復的損傷,或造成缺陷或者劣 化,而變得不能正常地發揮功能。 ESD is one of the destructive and inevitable phenomena that electrical systems and integrated circuits can suffer. From the electrical point of view, ESD refers to a transitional high current phenomenon in which a high current having a peak current of several amps lasts for 10 n seconds to 300 n seconds. Therefore, when ESD occurs, if approximately a few amps of current is not conducted to the outside of the integrated circuit within tens of n seconds, the integrated circuit may be damaged by difficulty, or may be defective or inferior. And become unable to function properly.
近年來,電子零件或電子機器的輕量化、薄型化、小型化的趨勢迅速發展。伴隨於此,半導體的積體度或印刷配線基板之電子零件安裝密度的上昇顯著,而過度密集地積體,或者使經安裝的電子元件或訊號線變得彼此極為接近地存在。進而訊號處理速度也高速化了起來。其結果,使高頻輻射雜訊變成容易被引發的狀況。基於如此之狀況,進行有保護電路內之IC等以避免ESD損害之靜電放電保護元件的開發。 In recent years, the trend of weight reduction, thinning, and miniaturization of electronic components and electronic devices has rapidly progressed. Along with this, the degree of integration of the semiconductor or the mounting density of the electronic component of the printed wiring board is remarkably increased, and the integrated electronic component or the signal line is extremely close to each other. In addition, the signal processing speed is also speeded up. As a result, high-frequency radiation noise is caused to be easily triggered. Based on such a situation, development of an electrostatic discharge protection element having an IC or the like in a protection circuit to avoid ESD damage is performed.
以往,作為保護電路內之IC等以避免ESD損害之靜電放電保護元件,係有由金屬氧化物等之燒結體所構成的塊體結構之元件(例如,參照專利文獻1)。此元件係為由燒結體所構成之層合型晶片變阻器,且具備有層合體與一對的外部電極。變阻器,係具有若施加電壓到達某特定以上的值,則未流通到此處的電流會急速地流出之性質,且對於靜電放電具有優異的抑制力。但,燒結體之層合型晶片變阻器,係無法避免由薄片成型、內部電極印刷、薄片層合等所成之複雜的製造過程,且,有著在安裝步驟中亦容易引發層間剝離等缺陷發生的問題。 In the past, an electrostatic discharge protection element that protects an IC or the like in an IC to prevent ESD damage is an element having a bulk structure composed of a sintered body such as a metal oxide (see, for example, Patent Document 1). This device is a laminated wafer varistor composed of a sintered body, and is provided with a laminate and a pair of external electrodes. The varistor has a property that a current that does not flow therethrough rapidly flows out when a voltage is applied to a certain value or more, and has an excellent suppressing force against electrostatic discharge. However, the laminated wafer varistor of the sintered body cannot avoid complicated manufacturing processes caused by sheet molding, internal electrode printing, sheet lamination, etc., and has defects such as interlayer peeling easily occurring in the mounting step. problem.
其他之作為保護電路內之IC等以避免ESD損害之靜電放電保護元件,係有放電型元件。放電型元件係洩漏電流小,且原理性簡單,亦具有不易故障的優點。此外,放電電壓係可藉由放電間隙的寬度而進行調整。又,製成密封結構時係因應氣體的壓力、氣體的種類而決定放 電間隙的寬度。作為實際販售的放電型元件,係有:形成有圓柱狀的陶瓷表面導體皮膜,藉由雷射等將放電間隙設於此皮膜,而將此予以玻璃封管者。此市售之經玻璃封管的放電型元件,雖靜電放電保護特性為優異,但由於其形態複雜,因此作為小型的表面安裝用元件係在尺寸方面具有極限,再者會有難以降低成本的問題。 Other electrostatic discharge protection elements, such as ICs in a protection circuit to avoid ESD damage, are discharge type elements. The discharge type component has a small leakage current and is simple in principle, and has the advantage of being difficult to malfunction. In addition, the discharge voltage can be adjusted by the width of the discharge gap. Moreover, when the sealing structure is formed, it is determined according to the pressure of the gas and the type of the gas. The width of the gap. As a discharge type element which is actually sold, a cylindrical ceramic surface conductor film is formed, and a discharge gap is provided in the film by laser or the like, and this is sealed by a glass. This commercially available glass-sealed discharge type element is excellent in electrostatic discharge protection characteristics, but its shape is complicated, so that it is limited in size as a small surface mount element, and it is difficult to reduce the cost. problem.
進而,揭示有:直接將放電間隙配線形成於配線上,藉由其放電間隙的寬度而調整放電電壓的方法(例如,參照專利文獻2~4)。於專利文獻2中係例示有放電間隙的寬度為4mm,於專利文獻3中係例示有放電間隙的寬度為0.15mm。此外,於專利文獻4中係揭示有:一般為了保護電子元件,放電間隙係以5~60μm為佳,為了保護因靜電放電而敏感的IC或LSI,係以將放電間隙設為1~30μm為佳,尤其在只要是僅去除大的脈衝電壓部分即可的用途中係可增大至150μm左右。 Further, a method of directly forming the discharge gap wiring on the wiring and adjusting the discharge voltage by the width of the discharge gap is disclosed (for example, refer to Patent Documents 2 to 4). Patent Document 2 exemplifies that the width of the discharge gap is 4 mm, and Patent Document 3 exemplifies that the width of the discharge gap is 0.15 mm. Further, Patent Document 4 discloses that, in order to protect an electronic component, a discharge gap is preferably 5 to 60 μm, and in order to protect an IC or an LSI sensitive to electrostatic discharge, a discharge gap is set to 1 to 30 μm. Preferably, it can be increased to about 150 μm particularly in applications where only a large pulse voltage portion is removed.
但,若放電間隙部分無保護,則在高電壓的施加下會引起氣體放電,或因環境中的濕度或氣體而於導體的表面產生污染造成放電電壓變化,或因設置有電極的基板之碳化而有電極短路的可能性。 However, if the discharge gap portion is not protected, the gas discharge may be caused by application of a high voltage, or the discharge voltage may be changed due to contamination of the surface of the conductor due to humidity or gas in the environment, or carbonization of the substrate provided with the electrode. There is a possibility of short circuiting of the electrodes.
此外,於具有放電間隙的靜電放電保護體中,一般的作動電壓,例如一般而言於直流電流(DC)未達10V時,由於需要高的絕緣電阻性,因此將耐電壓性的絕緣性構件設於電極偶的放電間隙一事變得有效。若為了保護放電間隙,直接將一般作為絕緣性構件之阻劑類填 充於放電間隙,則會引起放電電壓的大幅上昇,而不具實用性。將一般的阻劑類填充於1~2μm左右或其以下之極狹窄的放電間隙時,雖可降低放電電壓,但會引起所填充的阻劑類微小的劣化,或降低絕緣電阻,或依據情況不同而有會導通的問題。 Further, in an electrostatic discharge protector having a discharge gap, a general operating voltage, for example, when a direct current (DC) is less than 10 V, an insulating member having a withstand voltage is required because of high insulation resistance. It is effective to set the discharge gap of the electrode couple. If the discharge gap is to be protected, it is generally used as a resisting agent for the insulating member. Filling the discharge gap causes a large increase in the discharge voltage, which is not practical. When a general resist is filled in a very narrow discharge gap of about 1 to 2 μm or less, the discharge voltage can be lowered, but the resisting agent can be slightly deteriorated or the insulation resistance can be lowered, or depending on the situation. There are different issues that can be turned on.
於專利文獻5中揭示有一種保護元件,其係於絕緣基板設有10~50μm之放電間隙,於端部為相對向的一對電極圖型之間,設有以ZnO作為主成分且含有碳化矽的機能膜。該保護元件,若與層合型晶片變阻器相比較,則為簡單的構造,且具有能作為基板上的厚膜元件而製造的優點。 Patent Document 5 discloses a protective element in which a discharge gap of 10 to 50 μm is provided on an insulating substrate, and a pair of electrode patterns having opposite ends is provided with ZnO as a main component and carbonization. A functional membrane of cockroaches. This protective element has a simple structure as compared with a laminated wafer varistor, and has an advantage that it can be manufactured as a thick film element on a substrate.
但,此等ESD對策元件,雖配合電子機器的進化,而謀求安裝面積的低減化,但由於形態畢竟是元件,因此需要藉由焊錫等來安裝於配線基板。因而,於電子機器中,設計的自由度減少,且,包含高度而於小型化方面具有極限。 However, these ESD countermeasure elements are required to reduce the mounting area in accordance with the evolution of electronic devices. However, since the form is an element after all, it needs to be mounted on the wiring board by solder or the like. Therefore, in an electronic device, the degree of freedom in design is reduced, and the height is included and the limit is small.
是故,期望能夠不僅是將元件固定,且以包含小型化之自由的形態,於必要的部位,且必要的面積份,採取ESD對策。 Therefore, it is desirable to take ESD measures not only to fix the components, but also to include the free form of miniaturization, the necessary parts, and the necessary area.
另一方面,揭示有使用樹脂組成物作為ESD保護材料(例如,參照專利文獻6)。在此樹脂組成物係以含有具有由絕緣黏合劑之混合物所構成的母材,且未達10μm之平均粒徑的導電性粒子、以及具有未達10μm之平均粒徑的半導體粒子為特徵。 On the other hand, the use of a resin composition as an ESD protection material has been disclosed (for example, refer to Patent Document 6). The resin composition is characterized by comprising conductive particles having a base material composed of a mixture of insulating binders and having an average particle diameter of less than 10 μm, and semiconductor particles having an average particle diameter of less than 10 μm.
此外,揭示有:藉由絕緣性結合劑而締結有表面被絕緣性氧化皮膜所被覆的導電性及半導體粒子的混合物之組成物材料、粒徑範圍被特定的組成物材料、導電性粒子間之面間隔被特定的組成物材料等作為ESD保護材料(例如,參照專利文獻7)。 Further, it is disclosed that a constituent material of a mixture of conductivity and semiconductor particles having a surface covered with an insulating oxide film, a composition material having a specific particle diameter range, and a conductive particle are formed by an insulating binder. The surface spacer is made of a specific composition material or the like as an ESD protection material (for example, refer to Patent Document 7).
然而,於專利文獻7所記載的方法中,由於導電性粒子或半導體粒子的分散方法並非最適化,因此於低電壓時無法得到高的電阻抗值,或者,於高電壓時無法得到低的電阻抗值等,存在技術性的不安定因素。 However, in the method described in Patent Document 7, since the method of dispersing the conductive particles or the semiconductor particles is not optimized, a high electric resistance value cannot be obtained at a low voltage, or a low electric power cannot be obtained at a high voltage. There are technical instability factors such as impedance values.
此外,此等組成物,由於放電時之作動電壓高,因此特別是在保護低電阻之積體電路的目的方面並不合適。尤其是若大量摻合半導電性粒子或絕緣性粒子,則使作動性降低,另一方面,於僅為金屬粒子的情況中,會有耐電壓性低的問題。 Further, these compositions are not suitable for the purpose of protecting a low-resistance integrated circuit because of the high operating voltage during discharge. In particular, when a large amount of semiconductive particles or insulating particles are blended, the operability is lowered. On the other hand, in the case of only metal particles, there is a problem that the withstand voltage is low.
為了解決前述問題,揭示有利用含有以金屬氧化物被覆金屬粉末的表面之化合物與黏合劑的組成物來填充放電間隙(例如,參照專利文獻8)。然而,前述組成物係設想有例如300μm以下左右的放電間隙者。若是即使更寬廣的放電間隙亦能夠適用,則配線的設計之自由度會顯著提昇。 In order to solve the above problems, it has been disclosed that a discharge gap is filled with a composition containing a compound containing a metal oxide-coated metal powder and a binder (for example, refer to Patent Document 8). However, the above-described composition is assumed to have a discharge gap of, for example, about 300 μm or less. If even a wider discharge gap can be applied, the degree of freedom in wiring design can be significantly improved.
若為了於更寬廣的放電間隙中亦成為作動性良好,而使用大量摻合有以前述金屬氧化物被覆寬廣的放電間隙之金屬粉末的組成物來進行填充,則會有靜電放電性能的安定性降低的傾向。此外,若以僅摻合有導電性粒 子的組成物填充更寬廣的放電間隙,則會有耐電壓性降低的傾向。 If the composition is filled with a large amount of a metal powder in which a wide discharge gap is coated with the metal oxide, the electrostatic discharge performance is stabilized in order to achieve good operability in a wider discharge gap. The tendency to decrease. In addition, if only conductive particles are blended When the composition of the sub-package is filled with a wider discharge gap, the withstand voltage tends to be lowered.
[專利文獻1]日本特開2005-353845號公報 [Patent Document 1] Japanese Patent Laid-Open Publication No. 2005-353845
[專利文獻2]日本特開平3-89588號公報 [Patent Document 2] Japanese Patent Laid-Open No. Hei 3-89588
[專利文獻3]日本特開平5-67851號公報 [Patent Document 3] Japanese Patent Laid-Open No. Hei 5-67851
[專利文獻4]日本特開平10-27668號公報 [Patent Document 4] Japanese Patent Laid-Open No. 10-27668
[專利文獻5]日本特開2007-266479號公報 [Patent Document 5] Japanese Patent Laid-Open Publication No. 2007-266479
[專利文獻6]日本特表2001-523040號公報 [Patent Document 6] Japanese Patent Publication No. 2001-523040
[專利文獻7]美國專利第4,726,991號 [Patent Document 7] U.S. Patent No. 4,726,991
[專利文獻8]國際公開第2010/147095號 [Patent Document 8] International Publication No. 2010/147095
本發明係為了解決前述之問題點而進行者,其目的為提供一種對於各種設計的電子電路基板等電子機器,可以自由的形狀且簡便地謀求ESD對策,且,即使於寬廣的放電間隙中,放電時之作動性亦優異,能夠小型化、低成本化的靜電放電保護體、以及提供一種可用於如此之靜電放電保護體之製造的放電間隙填充用組成物。 The present invention has been made to solve the above problems, and an object of the present invention is to provide an electronic device such as an electronic circuit board of various designs, which can easily and easily achieve ESD countermeasures, and even in a wide discharge gap. It is also excellent in the operability at the time of discharge, an electrostatic discharge protector which can be reduced in size and cost, and a discharge gap filling composition which can be used for the manufacture of such an electrostatic discharge protector.
本發明係關於例如以下之[1]~[19]。 The present invention relates to, for example, the following [1] to [19].
[1]一種放電間隙填充用組成物,其特徵為,含有金屬粉末(A1)、鋁粉末(A2)及黏合劑成分(B),且前述金屬粉末(A1)係金屬的一次粒子之表面的至少一部分被由金屬烷氧化物之水解生成物所構成的膜所被覆者,前述鋁粉末(A2)係鋁的一次粒子之表面未被由金屬烷氧化物之水解生成物所構成的膜所被覆者。 [1] A discharge gap filling composition comprising a metal powder (A1), an aluminum powder (A2), and a binder component (B), wherein the metal powder (A1) is a surface of a primary particle of a metal At least a part of the film is composed of a film composed of a hydrolyzed product of a metal alkoxide, and the surface of the aluminum powder (A2)-based primary particles of aluminum is not covered by a film composed of a hydrolyzed product of a metal alkoxide. By.
[2]如[1]之放電間隙填充用組成物,其中金屬粉末(A1)之金屬的一次粒子之形狀及鋁粉末(A2)的一次粒子之形狀係皆為薄片狀。 [2] The composition for discharge gap filling according to [1], wherein the shape of the primary particles of the metal of the metal powder (A1) and the shape of the primary particles of the aluminum powder (A2) are in the form of flakes.
[3]如[1]或[2]之放電間隙填充用組成物,其中金屬粉末(A1)之金屬的一次粒子之平均粒徑為1~15μm,且鋁粉末(A2)的一次粒子之平均粒徑為5~70μm。 [3] The composition for discharge gap filling according to [1] or [2], wherein the average particle diameter of the primary particles of the metal of the metal powder (A1) is 1 to 15 μm, and the average of the primary particles of the aluminum powder (A2) The particle size is 5 to 70 μm.
[4]如[1]~[3]中任一項之放電間隙填充用組成物,其中前述金屬粉末(A1)的金屬之金屬元素係由錳、鈮、鋯、鉿、鉭、鉬、釩、鎳、鈷、鉻、鎂、鈦或鋁中所選出之至少1種。 [4] The discharge gap filling composition according to any one of [1] to [3] wherein the metal element of the metal powder (A1) is manganese, cerium, zirconium, hafnium, tantalum, molybdenum or vanadium. At least one selected from the group consisting of nickel, cobalt, chromium, magnesium, titanium or aluminum.
[5]如[1]~[4]中任一項之放電間隙填充用組成物,其中前述金屬粉末(A1)的金屬之金屬元素為鋁。 [5] The discharge gap filling composition according to any one of [1] to [4] wherein the metal element of the metal of the metal powder (A1) is aluminum.
[6]如[1]~[5]中任一項之放電間隙填充用組成物,其中放電間隙填充用組成物中之金屬粉末(A1)與鋁粉末(A2)的質量比為98:2~20:80。 [6] The discharge gap filling composition according to any one of [1] to [5] wherein the mass ratio of the metal powder (A1) to the aluminum powder (A2) in the discharge gap filling composition is 98:2 ~20:80.
[7]如[1]~[6]中任一項之放電間隙填充用組成物,其中前述金屬烷氧化物係以下述一般式(1)所表示, [7] The discharge gap filling composition according to any one of [1] to [6] wherein the metal alkoxide is represented by the following general formula (1).
(式(1)中,M為金屬原子,O為氧原子,R各自獨立為碳數1~20之烷基,n為1~40之整數)。 (In the formula (1), M is a metal atom, O is an oxygen atom, R is each independently an alkyl group having 1 to 20 carbon atoms, and n is an integer of 1 to 40).
[8]如[7]之放電間隙填充用組成物,其中前述一般式(1)中之M為矽、鈦、鋯、鉭或鉿。 [8] The discharge gap filling composition according to [7], wherein M in the above general formula (1) is ruthenium, titanium, zirconium, hafnium or tantalum.
[9]如[1]~[8]中任一項之放電間隙填充用組成物,其中於前述金屬粉末(A1)及/或鋁粉末(A2)之金屬的一次粒子之表面形成有自氧化膜。 [9] The discharge gap filling composition according to any one of [1] to [8] wherein the surface of the primary particles of the metal of the metal powder (A1) and/or the aluminum powder (A2) is auto-oxidized. membrane.
[10]如[1]~[9]中任一項之放電間隙填充用組成物,其中前述黏合劑成分(B)係含有熱硬化性化合物或活性能量線硬化性化合物。 [10] The composition for discharge gap filling according to any one of [1] to [9] wherein the binder component (B) contains a thermosetting compound or an active energy ray-curable compound.
[11]如[10]之放電間隙填充用組成物,其中前述黏合劑成分(B)係含有熱硬化性胺甲酸酯樹脂。 [11] The composition for discharge gap filling according to [10], wherein the binder component (B) contains a thermosetting urethane resin.
[12]如[1]~[11]中任一項之放電間隙填充用組成物,其中放電間隙填充用組成物的固體成分中之金屬粉末(A1)及金屬粉末(A2)的合計之含量為3~95質量%,且黏合劑(B)之含量為5~97質量%。 [12] The discharge gap filling composition according to any one of [1] to [11] wherein the total content of the metal powder (A1) and the metal powder (A2) in the solid content of the discharge gap filling composition is It is 3 to 95% by mass, and the content of the binder (B) is 5 to 97% by mass.
[13]一種靜電放電保護體,其係具有至少2個電極、 與於前述2個電極間之放電間隙的靜電放電保護體,其特徵為,具有將如[1]~[12]中任一項之放電間隙填充用組成物填充於前述放電間隙所形成的放電間隙填充構件。 [13] An electrostatic discharge protector having at least two electrodes, The electrostatic discharge protector of the discharge gap between the two electrodes is characterized in that the discharge gap filling composition according to any one of [1] to [12] is filled in the discharge gap. Gap filling member.
[14]如[13]之靜電放電保護體,其中前述放電間隙的寬度為300μm以上且1mm以下。 [14] The electrostatic discharge protector according to [13], wherein the discharge gap has a width of 300 μm or more and 1 mm or less.
[15]如[13]或[14]之靜電放電保護體,其中於前述放電間隙填充構件的表面形成有保護層。 [15] The electrostatic discharge protector of [13] or [14], wherein a protective layer is formed on a surface of the discharge gap filling member.
[16]一種電子電路基板,其係具有如[13]~[15]中任一項之靜電放電保護體。 [16] An electronic circuit board comprising the electrostatic discharge protector according to any one of [13] to [15].
[17]一種可撓性電子電路基板,其係具有如[13]~[15]中任一項之靜電放電保護體。 [17] A flexible electronic circuit board having the electrostatic discharge protector according to any one of [13] to [15].
[18]一種IC晶片搭載用基板,其係具有如[13]~[15]中任一項之靜電放電保護體。 [18] An IC chip mounting substrate, comprising the electrostatic discharge protector according to any one of [13] to [15].
[19]一種電子機器,其係具有如[16]之電子電路基板、如[17]之可撓性電子電路基板或如[18]之IC晶片搭載用基板。 [19] An electronic device comprising the electronic circuit board of [16], the flexible electronic circuit board of [17], or the IC wafer mounting substrate of [18].
若使用本發明之放電間隙填充用組成物,則可製造成本低且即使用於寬廣的放電間隙,放電時之作動性亦優異的小型之靜電放電保護體,且可簡單地實現靜電放電保護。 When the composition for discharge gap filling of the present invention is used, it is possible to manufacture a small-sized electrostatic discharge protector which is low in cost and excellent in operability at the time of discharge even in a wide discharge gap, and can easily realize electrostatic discharge protection.
此外,若使用本發明之放電間隙填充用組成物,則藉由將放電間隙的寬度設定為特定間隔而能夠調整 作動電壓,因此可得到作動電壓之調整精確度優異的靜電放電保護體。 Further, when the discharge gap filling composition of the present invention is used, it is possible to adjust by setting the width of the discharge gap to a specific interval. Since the voltage is applied, an electrostatic discharge protector excellent in adjustment accuracy of the actuation voltage can be obtained.
若依據本發明,則即使前述放電間隙的寬度為例如超過300μm之廣寬度,靜電放電時電阻值也會降低,且能夠於電壓解除後恢復絕緣性。因而,無需將設有使放電間隙填充用組成物硬化所得到的放電間隙填充構件之放電間隙加工成特別狹窄,一般而言,即使對於焊接有變阻器元件等的空間,例如,0.5mm或1.0mm之放電間隙也能夠適用。 According to the present invention, even if the width of the discharge gap is, for example, a wide width exceeding 300 μm, the resistance value at the time of electrostatic discharge is lowered, and the insulation property can be restored after the voltage is released. Therefore, it is not necessary to process the discharge gap provided with the discharge gap filling member obtained by hardening the discharge gap filling composition to be particularly narrow, and generally, for example, a space of a varistor element or the like is welded, for example, 0.5 mm or 1.0 mm. The discharge gap can also be applied.
本發明之靜電放電保護體,係藉由於必要的電極間,形成對應於必要的作動電壓之放電間隙,且將前述放電間隙填充用組成物填充於該放電間隙,使其固化或硬化的方法,而能夠以自由的形狀且簡便地形成。因此,本發明之靜電放電保護體係可適用於以行動電話為首之數位機器或人的手部觸碰機會多而靜電容易積存的行動式裝置等所組入之IC晶片搭載用基板,更具體而言,係可適用於如球柵陣列(BGA;Ball grid array)、晶片尺寸封裝(CSP;Chip size package)、晶片直接封裝(COB;Chip on board)等所代表之類的稱為智慧卡或晶片卡的IC卡。 In the electrostatic discharge protector of the present invention, a discharge gap corresponding to a required operating voltage is formed between the electrodes, and the discharge gap filling composition is filled in the discharge gap to be cured or cured. It can be formed in a free shape and easily. Therefore, the electrostatic discharge protection system of the present invention can be applied to an IC chip mounting substrate incorporated in a digital device such as a mobile phone or a mobile device in which a hand touches a large amount of hands and is easily stored in static electricity, and more specifically In other words, it can be applied to a smart card or a representative such as a ball grid array (BGA), a chip size package (CSP), a chip on board (COB), or the like. IC card for the wafer card.
11‧‧‧:靜電放電保護體 11‧‧‧: Electrostatic discharge protection
12A‧‧‧電極 12A‧‧‧electrode
12B‧‧‧電極 12B‧‧‧electrode
13‧‧‧放電間隙填充構件 13‧‧‧Discharge gap filling member
14‧‧‧放電間隙 14‧‧‧discharge gap
21‧‧‧靜電放電保護體 21‧‧‧Electrostatic discharge protection
22A‧‧‧電極 22A‧‧‧electrode
22B‧‧‧電極 22B‧‧‧electrode
23‧‧‧放電間隙填充構件 23‧‧‧Discharge gap filling member
24‧‧‧放電間隙 24‧‧‧discharge gap
31‧‧‧靜電放電保護體 31‧‧‧Electrostatic discharge protection
32A‧‧‧電極 32A‧‧‧electrode
32B‧‧‧電極 32B‧‧‧electrode
33‧‧‧放電間隙填充構件 33‧‧‧Discharge gap filling member
34‧‧‧放電間隙 34‧‧‧discharge gap
35‧‧‧保護層 35‧‧‧Protective layer
41‧‧‧靜電放電保護體 41‧‧‧Electrostatic discharge protection
42A‧‧‧導電體(露出部為電極) 42A‧‧‧Electrical conductor (exposed part is electrode)
42B‧‧‧導電體(露出部為電極) 42B‧‧‧Electrical conductor (exposed part is electrode)
43‧‧‧絕緣基材 43‧‧‧Insulation substrate
44‧‧‧放電間隙填充構件 44‧‧‧Discharge gap filling member
45A‧‧‧絕緣基材的孔 45A‧‧‧ hole for insulating substrate
45B‧‧‧絕緣基材的孔 45B‧‧‧ hole for insulating substrate
46‧‧‧放電間隙的寬度 46‧‧‧Width of discharge gap
[第1圖]第1圖係作為本發明之靜電放電保護體之一具體例的靜電放電保護體11之縱剖面圖。 [Fig. 1] Fig. 1 is a longitudinal sectional view showing an electrostatic discharge protector 11 as a specific example of the electrostatic discharge protector of the present invention.
[第2圖]第2圖係作為本發明之靜電放電保護體之一具體例的靜電放電保護體21之縱剖面圖。 [Fig. 2] Fig. 2 is a longitudinal sectional view showing an electrostatic discharge protector 21 as a specific example of the electrostatic discharge protector of the present invention.
[第3圖]第3圖係作為本發明之靜電放電保護體之一具體例的靜電放電保護體31之縱剖面圖。 [Fig. 3] Fig. 3 is a longitudinal sectional view showing an electrostatic discharge protector 31 as a specific example of the electrostatic discharge protector of the present invention.
[第4圖]第4圖係由上方觀看作為本發明之靜電放電保護體之一具體例的靜電放電保護體41之圖。 [Fig. 4] Fig. 4 is a view of the electrostatic discharge protector 41 as a specific example of the electrostatic discharge protector of the present invention viewed from above.
[第5圖]第5圖係作為本發明之靜電放電保護體之一具體例的靜電放電保護體41之縱剖面圖。 [Fig. 5] Fig. 5 is a longitudinal sectional view showing an electrostatic discharge protector 41 as a specific example of the electrostatic discharge protector of the present invention.
[第6圖]第6圖係在調製例1所製作出之經表面被覆的氧化鋁粒子之掃描型電子顯微鏡(SEM)影像。以虛線的箭頭測量長軸方向,以實線的箭頭測量厚度方向。 [Fig. 6] Fig. 6 is a scanning electron microscope (SEM) image of the surface-coated alumina particles prepared in Preparation Example 1. The long axis direction is measured with a dotted arrow, and the thickness direction is measured with a solid arrow.
以下,詳細說明本發明。 Hereinafter, the present invention will be described in detail.
本發明之放電間隙填充用組成物,其特徵為,含有金屬粉末(A1)、鋁粉末(A2)及黏合劑成分(B),且前述金屬粉末(A1)係金屬的一次粒子之表面的至少一部分被由金屬烷氧化物之水解生成物所構成的膜所被覆者,前述鋁粉末(A2)係鋁的一次粒子之表面未被由金屬烷氧化物之水解生成物所構成的膜所被覆者。 The discharge gap filling composition of the present invention is characterized by comprising a metal powder (A1), an aluminum powder (A2), and a binder component (B), and at least the surface of the primary particles of the metal powder (A1)-based metal When a part of the aluminum powder (A2)-based primary particles of aluminum is not covered by a film composed of a hydrolyzed product of a metal alkoxide, the surface of the primary powder of the aluminum powder (A2) is not covered by a film composed of a hydrolyzed product of a metal alkoxide. .
於本發明中,放電間隙係指於一對的電極之間所形成的空間,放電間隙填充用組成物係指用來填充前 述放電間隙的組成物。一次粒子係指不與其他的粒子凝聚,單獨存在的粒子之狀態,且一次粒子為與能夠凝聚的二次粒子等對照性使用的用語。 In the present invention, the discharge gap refers to a space formed between a pair of electrodes, and the discharge gap filling composition is used to fill before The composition of the discharge gap. The primary particle refers to a state in which particles are not aggregated with other particles, and the primary particles are used in comparison with secondary particles capable of agglomeration.
本發明所使用的金屬粉末(A1)係金屬的一次粒子之表面的至少一部分被由金屬烷氧化物之水解生成物所構成的膜所被覆。 At least a part of the surface of the primary particles of the metal powder (A1)-based metal used in the present invention is coated with a film composed of a hydrolyzed product of a metal alkoxide.
前述金屬粉末(A1),其金屬的一次粒子之表面的至少一部分被由金屬烷氧化物之水解生成物所構成的膜所被覆,因此具有局部性適度的絕緣性與高耐電壓性。如此之含有金屬粉末(A1)的放電間隙填充用組成物,雖於一般作動時之電壓為絕緣性,但於靜電放電時之高電壓負載時係成為導電性,進而藉由高電壓解除而恢復絕緣性。結果被認為,使用有該放電間隙填充用組成物的靜電放電保護體係發揮有效的靜電放電保護特性,亦不易受到高電壓時之破壞。 In the metal powder (A1), at least a part of the surface of the primary particles of the metal is covered with a film composed of a hydrolyzed product of a metal alkoxide, and thus has a localized moderate insulating property and a high withstand voltage. The discharge gap filling composition containing the metal powder (A1) is electrically insulating at the time of normal operation, but is electrically conductive at a high voltage load during electrostatic discharge, and is restored by high voltage release. Insulation. As a result, it is considered that the electrostatic discharge protection system using the discharge gap filling composition exhibits an effective electrostatic discharge protection characteristic and is less susceptible to damage at a high voltage.
構成前述金屬烷氧化物的金屬原子係只要能與水單獨,或水及水解觸媒進行反應而形成水解生成物者則無特別限制。另外,於本申請案中,前述金屬原子亦設為含有矽、鍺、錫等半金屬者。前述金屬原子係以鎂、鋁、鎵、銦、鉈、矽、鍺、錫、鈦、鋯、鉿、鉭、鈮為佳。其中以矽、鈦、鋯、鉭或鉿為更佳,以矽又更佳。 The metal atom system constituting the metal alkoxide is not particularly limited as long as it can react with water alone or with water and a hydrolysis catalyst to form a hydrolysis product. Further, in the present application, the metal atom is also made to contain a semimetal such as ruthenium, osmium or tin. The metal atom system is preferably magnesium, aluminum, gallium, indium, lanthanum, cerium, lanthanum, tin, titanium, zirconium, hafnium, ytterbium or ytterbium. Among them, bismuth, titanium, zirconium, hafnium or tantalum is preferred, and bismuth is better.
矽的烷氧化物由於不易因空氣中的濕氣等進 行水解,且容易控制水解速度,因此將前述金屬粉末(A1)中之金屬的一次粒子之表面以由矽之烷氧化物的水解生成物所構成的膜進行被覆時會有製造安定性變得更高的傾向,故較佳。 The alkoxide of bismuth is not easy to enter due to moisture in the air. Since the hydrolysis is carried out and the hydrolysis rate is easily controlled, when the surface of the primary particles of the metal in the metal powder (A1) is coated with a film composed of a hydrolyzed product of alkoxide of cerium, the stability of the production becomes stable. It is better because it has a higher tendency.
前述金屬烷氧化物係以下述一般式(1)所表示者為佳。若為如此之金屬烷氧化物,則會有使該水解生成物的被膜形成變得容易的傾向。 The metal alkoxide is preferably represented by the following general formula (1). In the case of such a metal alkoxide, formation of a film of the hydrolyzate tends to be easy.
前述一般式(1)中,M為金屬原子,O為氧原子,R各自獨立為碳數1~20之烷基,n為1~40之整數。 In the above general formula (1), M is a metal atom, O is an oxygen atom, R is each independently an alkyl group having 1 to 20 carbon atoms, and n is an integer of 1 to 40.
於前述一般式(1)中之M係以矽、鈦、鋯、鉭或鉿者為佳。若M為如此之金屬原子,則會有最終所得到的靜電放電保護體之耐電壓性變得良好的傾向。 The M system in the above general formula (1) is preferably ruthenium, titanium, zirconium, hafnium or tantalum. When M is such a metal atom, the voltage resistance of the electrostatic discharge protector finally obtained tends to be good.
前述一般式(1)中,R係為碳數1~20之烷基,且以碳數1~12之烷基者為佳。如此之烷基係可列舉例如:甲基、乙基、n-丙基、異丙基、n-丁基、sec-丁基、tert-丁基、n-戊基、1-甲基丁基、2-甲基丁基、3-甲 基丁基、新戊基、1-乙基丙基、n-己基、1,1-二甲基丙基、1,2-二甲基丙基、1,2-二甲基丙基、1-甲基戊基、2-甲基戊基、3-甲基戊基、4-甲基戊基、1,1-二甲基丁基、1,2-二甲基丁基、1,3-二甲基丁基、2,2-二甲基丁基、2,3-二甲基丁基、3,3-二甲基丁基、1-乙基丁基、2-乙基丁基、1,1,2-三甲基丙基、1,2,2-三甲基丙基、1-乙基-1-甲基丙基、1-乙基-2-甲基丙基、n-庚基、n-辛基、n-壬基、n-癸基及n-十二基。其中,以甲基、乙基、n-丙基、異丙基、n-丁基、sec-丁基、異丙基及n-戊基為佳,以乙基、n-丙基、n-丁基為更佳。 In the above general formula (1), R is an alkyl group having 1 to 20 carbon atoms, and preferably an alkyl group having 1 to 12 carbon atoms. Examples of such an alkyl group include methyl group, ethyl group, n-propyl group, isopropyl group, n-butyl group, sec-butyl group, tert-butyl group, n-pentyl group, and 1-methylbutyl group. 2-methylbutyl, 3-methyl Butyl, neopentyl, 1-ethylpropyl, n-hexyl, 1,1-dimethylpropyl, 1,2-dimethylpropyl, 1,2-dimethylpropyl, 1 -methylpentyl, 2-methylpentyl, 3-methylpentyl, 4-methylpentyl, 1,1-dimethylbutyl, 1,2-dimethylbutyl, 1,3 - dimethylbutyl, 2,2-dimethylbutyl, 2,3-dimethylbutyl, 3,3-dimethylbutyl, 1-ethylbutyl, 2-ethylbutyl 1,1,2-trimethylpropyl, 1,2,2-trimethylpropyl, 1-ethyl-1-methylpropyl, 1-ethyl-2-methylpropyl, n - heptyl, n-octyl, n-fluorenyl, n-fluorenyl and n-dodecyl. Among them, methyl, ethyl, n-propyl, isopropyl, n-butyl, sec-butyl, isopropyl and n-pentyl are preferred, with ethyl, n-propyl, n- Butyl is preferred.
若前述烷基的碳數多,則前述一般式(1)所表示的金屬烷氧化物之水解會變得穩定,另一方面,若前述烷基的碳數過多,則會有以前述一般式(1)所表示的金屬烷氧化物變成蠟狀,而變得難以均勻地分散的傾向。 When the number of carbon atoms of the alkyl group is large, the hydrolysis of the metal alkoxide represented by the above general formula (1) is stabilized. On the other hand, if the carbon number of the alkyl group is too large, the general formula is (1) The metal alkoxide shown is in a waxy state, and it tends to be difficult to uniformly disperse.
此外,於前述一般式(1)所表示的金屬烷氧化物中,若n的數目過大則金屬烷氧化物自體的黏度會增大,而變得難以分散,因此n為1~4的整數較為理想。特別是單體(於一般式(1)中n=1)係有急遽引起反應,而大量生成浮游粒子的情況,因此以使用二聚物(於一般式(1)中n=2)、三聚物(於一般式(1)中n=3)、四聚物(於一般式(1)中n=4)等之縮合物較為理想。 Further, in the metal alkoxide represented by the above general formula (1), if the number of n is too large, the viscosity of the metal alkoxide itself increases, and it becomes difficult to disperse, so n is an integer of 1 to 4. More ideal. In particular, the monomer (n=1 in the general formula (1)) has a situation in which a rapid reaction is caused, and a large amount of floating particles are generated, so that a dimer (n=2 in the general formula (1)), three is used. A condensate of a polymer (n=3 in the general formula (1)) and a tetramer (n=4 in the general formula (1)) is preferred.
本發明所使用的金屬烷氧化物係可列舉例如:四甲氧矽烷、四乙氧矽烷、四乙基鈦酸酯、四異丙基 鈦酸酯、四-n-丁基鈦酸酯、四-sec-丁基鈦酸酯、四-tert-丁基鈦酸酯、四-2乙基己基鈦酸酯、四乙基鋯酸酯、四異丙基鋯酸酯、四-n-丁基鋯酸酯、四-sec-丁基鋯酸酯、四-tert-丁基鋯酸酯、四-2乙基己基鋯酸酯等及此等之縮合物,尤其就水解性及分散性的觀點而言以四乙氧矽烷為佳。此等金屬烷氧化物係可單獨使用,又亦可2種以上混合使用。 The metal alkoxide used in the present invention may, for example, be tetramethoxy decane, tetraethoxy decane, tetraethyl titanate or tetraisopropyl. Titanate, tetra-n-butyl titanate, tetra-sec-butyl titanate, tetra-tert-butyl titanate, tetra-2 ethylhexyl titanate, tetraethyl zirconate , tetraisopropyl zirconate, tetra-n-butyl zirconate, tetra-sec-butyl zirconate, tetra-tert-butyl zirconate, tetra-2 ethylhexyl zirconate, etc. The condensate is preferably tetraethoxy decane from the viewpoint of hydrolyzability and dispersibility. These metal alkoxides may be used singly or in combination of two or more.
以由前述金屬烷氧化物之水解生成物所構成的膜來被覆金屬粉末(A1)中之金屬的一次粒子之表面的方法,係可列舉例如:藉由以使金屬粉末(A1)於溶劑中懸浮的狀態緩緩地添加金屬烷氧化物及能夠將其水解之量以上的水而進行的方法。藉由該方法,而可由金屬烷氧化物生成含有金屬氧化物等之水解物,並以該水解生成物來被覆前述金屬粉末(A1)中之金屬的一次粒子之表面。 A method of coating the surface of the primary particles of the metal in the metal powder (A1) with a film composed of the hydrolysis product of the metal alkoxide, for example, by using the metal powder (A1) in a solvent A method in which a metal alkoxide and a water which can be hydrolyzed by the amount thereof are gradually added in a suspended state. According to this method, a hydrolyzate containing a metal oxide or the like can be formed from the metal alkoxide, and the surface of the primary particles of the metal in the metal powder (A1) can be coated with the hydrolyzate.
一般認為:於前述一般式(1)所表示之金屬烷氧化物中,例如M為矽時,藉由水解而生成二氧化矽、或矽醇基為脫水縮合後的形態之寡聚物或聚合物及此等之混合物,由二氧化矽等之金屬氧化物所構成的膜會被覆前述金屬粉末(A1)中之金屬的一次粒子之表面。 In the metal alkoxide represented by the above general formula (1), for example, when M is ruthenium, an oligo which is formed by hydrolysis to form cerium oxide or a decyl alcohol group in a form of dehydration condensation or polymerization is used. A mixture of the material and the like, a film made of a metal oxide such as cerium oxide, coats the surface of the primary particles of the metal in the metal powder (A1).
金屬烷氧化物及水的添加法係可為一次添加的方式,亦可為每次少量分割成多階段來進行添加的方式。各個添加順序係可為先將金屬烷氧化物溶解或懸浮於溶劑中之後再添加水,或者先將水溶解或懸浮於溶劑中之後再添加金屬烷氧化物,此外,亦可每次少量交錯地添 加。但,一般而言,由於反應穩定進行者會有浮游粒子之生成較少的傾向,因此以每次少量分割成多階段來進行添加的方式為佳,以因應需要而在溶劑中使濃度降低後的狀態進行添加為更佳。 The method of adding the metal alkoxide and water may be one-time addition, or may be added in a small amount in a plurality of stages. The order of addition may be that the metal alkoxide is dissolved or suspended in a solvent before adding water, or the metal alkoxide is added after dissolving or suspending the water in the solvent, or may be interlaced at a time. add plus. However, in general, since the reaction is stable, there is a tendency for the generation of floating particles to be small. Therefore, it is preferable to carry out the addition in a small amount in a plurality of stages, and to reduce the concentration in the solvent as needed. The state is added as better.
前述溶劑雖以溶解醇類、礦油精、溶劑石腦油、苯、甲苯、二甲苯、石油醚、醚等、金屬烷氧化物者較為理想,但因以懸浮狀進行反應故無特別限定。此外,此等係可單獨亦可2種以上混合使用。此外,於金屬烷氧化物之水解反應中,藉由水的添加會副生成醇因此能夠使用醇作為聚合速度之調節劑。 The solvent is preferably a metal alkoxide which dissolves alcohol, mineral spirits, solvent naphtha, benzene, toluene, xylene, petroleum ether, ether, etc., but is not particularly limited because it is reacted in suspension. Further, these may be used alone or in combination of two or more. Further, in the hydrolysis reaction of the metal alkoxide, alcohol is added as a by-product of the addition of water, so that alcohol can be used as a regulator of the polymerization rate.
本發明使用的金屬粉末(A1)之金屬,雖可使用一般周知的金屬之粉末,但前述金屬粉末(A1)之金屬係以成為所謂鈍態的金屬為佳,該金屬儘管離子化的傾向較大,但仍可於一次粒子的金屬之表面完成緻密的自氧化膜,而保護內部。如此之金屬的金屬元素雖可列舉:錳、鈮、鋯、鉿、鉭、鉬、釩、鎳、鈷、鉻、鎂、鈦、鋁,但其中就容易低價取得的觀點而言以鋁、鎳、鉭、鈦為佳,鋁為更佳。 The metal of the metal powder (A1) used in the present invention may be a generally known metal powder, but the metal of the metal powder (A1) is preferably a so-called passive state, and the metal tends to ionize. Large, but still able to complete the dense self-oxidation film on the surface of the metal of the primary particles, while protecting the interior. Examples of the metal element of such a metal include manganese, cerium, zirconium, hafnium, tantalum, molybdenum, vanadium, nickel, cobalt, chromium, magnesium, titanium, and aluminum, but aluminum is used in view of the fact that it is easy to obtain at a low price. Nickel, niobium and titanium are preferred, and aluminum is preferred.
前述金屬係可各自單獨亦可2種以上混合使用。 These metal systems may be used alone or in combination of two or more.
藉由金屬烷氧化物之水解生成物所被覆的金屬之一次粒子的表面,亦可預先具有金屬之自氧化膜。此時,自氧化膜會存在於金屬的一次粒子之金屬烷氧化物的水解生成物之被覆的內側。 The surface of the primary particles of the metal coated with the hydrolyzate of the metal alkoxide may also have a metal oxide film in advance. At this time, the self-oxidation film is present inside the coating of the hydrolyzed product of the metal alkoxide of the primary particles of the metal.
使自氧化膜形成於金屬的一次粒子之表面的方法,雖可列舉例如在氧存在下將金屬加熱而使自氧化膜形成的方法,但藉由以下的方法,可形成具有更安定的結構之自氧化膜。亦即,若以丙酮之類的有機溶劑來將金屬之一次粒子的表面予以清淨化後,利用稀鹽酸對金屬之一次粒子的表面略微進行蝕刻,在由20%之氫氣及80%之氬氣所構成的混合氣體環境下,以比金屬自體之熔點更低的溫度,例如於鋁以外之金屬的情況中為750℃,又於鋁的情況中為例如600℃,加熱約1小時,進一步在高純度氧環境下加熱30分鐘,則可於金屬之一次粒子的表面形成高控制性且再現性良好之均勻的自氧化膜。 The method of forming the self-oxidation film on the surface of the primary particles of the metal may, for example, be a method of heating the metal in the presence of oxygen to form the self-oxidation film, but a more stable structure can be formed by the following method. Self-oxidizing film. That is, if the surface of the primary particles of the metal is cleaned with an organic solvent such as acetone, the surface of the primary particles of the metal is slightly etched with dilute hydrochloric acid, and 20% of hydrogen and 80% of argon are used. In the mixed gas atmosphere, the temperature is lower than the melting point of the metal itself, for example, 750 ° C in the case of a metal other than aluminum, and in the case of aluminum, for example, 600 ° C, heating for about 1 hour, further When heated in a high-purity oxygen atmosphere for 30 minutes, a uniform self-oxidizing film having high controllability and good reproducibility can be formed on the surface of the primary particles of the metal.
如上所述將金屬粉末(A1)中之金屬的一次粒子之表面以由金屬烷氧化物之水解生成物所構成的膜來進行被覆的方法中,可使被覆膜的膜厚成為10nm~2μm左右。被覆膜的膜厚係可使用例如透過型電子顯微鏡而求得。被覆區域雖可為金屬粉末(A1)中之金屬的一次粒子之表面的一部分被由金屬烷氧化物之水解生成物所構成的膜所被覆之程度,但以金屬的一次粒子之全表面皆被由金屬烷氧化物之水解生成物所構成的膜所被覆為佳。 In the method of coating the surface of the primary particles of the metal in the metal powder (A1) with a film composed of a hydrolyzed product of a metal alkoxide as described above, the film thickness of the coating film can be made 10 nm to 2 μm. about. The film thickness of the coating film can be obtained by, for example, a transmission electron microscope. The coated region may be such that a part of the surface of the primary particle of the metal in the metal powder (A1) is covered by a film composed of a hydrolyzed product of a metal alkoxide, but the entire surface of the primary particle of the metal is It is preferred that the film composed of the hydrolyzate of the metal alkoxide is coated.
此外,本發明使用的金屬粉末(A1)中之金屬的一次粒子之形狀係以薄片狀為佳。 Further, the shape of the primary particles of the metal in the metal powder (A1) used in the present invention is preferably in the form of a sheet.
於本發明中,薄片狀係指厚度薄,且面具有寬廣的形狀者,包含例如:鱗片狀、圓盤狀、長條狀、層狀等形狀,並不包含球狀等形狀。具體而言,針對金屬粉 末(A1)中之金屬的一次粒子之厚度及面,將面的最大長為平均厚度的2倍以上者作為薄片狀。 In the present invention, the sheet-like shape means a shape having a small thickness and a wide surface, and includes, for example, a shape such as a scaly shape, a disk shape, a long shape, or a layer shape, and does not include a spherical shape or the like. Specifically, for metal powder The thickness and surface of the primary particles of the metal in the last (A1) are in the form of flakes when the maximum length of the surface is twice or more the average thickness.
前述金屬粉末(A1)中之金屬的一次粒子之最短的軸(短邊)之長度(d)係以使用1μm以下且0.05μm以上者為佳,較佳為0.5μm以下,最佳為0.3μm以下。 The length (d) of the shortest axis (short side) of the primary particles of the metal in the metal powder (A1) is preferably 1 μm or less and 0.05 μm or more, preferably 0.5 μm or less, and most preferably 0.3 μm. the following.
本發明之放電間隙填充用組成物,係藉由前述金屬粉末(A1)中之金屬的一次粒子之形狀為薄片狀,而有使用有該放電間隙填充用組成物的靜電放電保護體之放電時的作動性變成良好的傾向。 In the discharge gap filling composition of the present invention, the shape of the primary particles of the metal in the metal powder (A1) is in the form of a sheet, and the discharge of the electrostatic discharge protector using the discharge gap filling composition is used. The motility becomes a good tendency.
前述金屬粉末(A1)中之金屬的一次粒子之較佳的形狀,係能夠以將粒子的厚度,亦即於金屬之一次粒子中最短的軸(短邊)之長度設為「d」,及將面的最大長,亦即於金屬之一次粒子中最長的軸(長邊)之長度設為「L」時之平均長寬比(L/d)來表示特徵。 The preferred shape of the primary particles of the metal in the metal powder (A1) is such that the thickness of the particles, that is, the length of the shortest axis (short side) of the primary particles of the metal, is "d", and The maximum length of the face, that is, the average aspect ratio (L/d) when the length of the longest axis (long side) of the primary particles of the metal is "L" is expressed.
此外,前述金屬粉末(A1)中之金屬的一次粒子,係以平均長寬比(L/d)為3以上且1000以下為佳,以5以上且500以下為更佳,以9以上且100以下又更佳。作為前述薄片狀之粒子係於前述長寬比之範圍內。 Further, the primary particles of the metal in the metal powder (A1) have an average aspect ratio (L/d) of preferably 3 or more and 1,000 or less, more preferably 5 or more and 500 or less, and more preferably 9 or more and 100 or more. The following is even better. The flaky particles are within the range of the aspect ratio described above.
本發明之放電間隙填充用組成物,若前述金屬粉末(A1)中之金屬的一次粒子為具有前述範圍之平均長寬比(L/d),則變得更容易對於放電方向順利地放電。其結果,使用有該放電間隙填充用組成物的靜電放電保護體,係作動電壓、耐電壓性會變得良好。也就是說被 認為:作為保護體之作動性變得良好,並且對於更低的電壓之放電,也發揮能夠對應之作為保護體的特性者。 In the discharge gap filling composition of the present invention, when the primary particles of the metal in the metal powder (A1) have an average aspect ratio (L/d) within the above range, it is easier to discharge the discharge direction smoothly. As a result, the electrostatic discharge protector using the discharge gap filling composition is excellent in the operating voltage and the withstand voltage. That is to say It is considered that the operability as a protective body is good, and for a discharge of a lower voltage, a characteristic that can serve as a protective body is also exhibited.
另外,金屬粉末(A1)中之金屬的一次粒子之長寬比(L/d)係如以下的方式進行測量。在掃描型電子顯微鏡下以1000~2000倍來觀察經剖面形成的金屬粉末(A1)。由所觀察的金屬粉末(A1)中之金屬的一次粒子當中,任意地選擇10個一次粒子,於所選出的各一次粒子中,計測最長的軸(長邊)之長度「L」、以及與此對應之最短的軸(短邊)之長度「d」。可由此等之L及d之平均值來求得平均長寬比(L/d)。 Further, the aspect ratio (L/d) of the primary particles of the metal in the metal powder (A1) was measured in the following manner. The metal powder (A1) formed by the cross section was observed under a scanning electron microscope at 1000 to 2000 times. Ten primary particles are arbitrarily selected from among the primary particles of the metal in the observed metal powder (A1), and the length "L" of the longest axis (long side) is measured among the selected primary particles, and This corresponds to the length "d" of the shortest axis (short side). The average aspect ratio (L/d) can be obtained by the average of L and d thus obtained.
金屬粉末(A1)中之金屬的一次粒子之平均粒徑,較佳為1μm以上且15μm以下,更佳為3μm以上且11μm以下。若金屬粉末(A1)中之金屬的一次粒子之平均粒徑超過前述範圍,則表面能量會變小,因此金屬烷氧化物之水解生成物附著於金屬粉末表面的力會變小。其結果,會有在放電間隙填充用組成物中,多數存在不附著於金屬粉末而浮游的金屬烷氧化物之水解生成物的粒,而使靜電放電保護體形成後之作動性降低的情況。若金屬粒子(A1)中之金屬的一次粒子之平均粒徑未達前述範圍,則會觀察到由於粒子彼此之凝聚劇烈因此與金屬烷氧化物反應時會形成分散不良且不均勻的被覆之現象,此外由於對於被覆層之絕緣的芯之導電部分的比例會變得極小因此靜電放電時之電阻不易降低。 The average particle diameter of the primary particles of the metal in the metal powder (A1) is preferably 1 μm or more and 15 μm or less, more preferably 3 μm or more and 11 μm or less. When the average particle diameter of the primary particles of the metal in the metal powder (A1) exceeds the above range, the surface energy becomes small, and therefore the force of the hydrolyzed product of the metal alkoxide adhered to the surface of the metal powder becomes small. As a result, in the discharge gap-filling composition, there are many cases in which the hydrolyzate of the metal alkoxide which does not adhere to the metal powder floats, and the operability after the formation of the electrostatic discharge protector is lowered. If the average particle diameter of the primary particles of the metal in the metal particles (A1) does not reach the above range, it is observed that the particles are strongly agglomerated with each other, so that a poor dispersion and uneven coating phenomenon are formed when reacting with the metal alkoxide. Further, since the ratio of the conductive portion of the core to the insulating layer of the coating layer becomes extremely small, the electric resistance at the time of electrostatic discharge is not easily lowered.
另外,於本說明書中平均粒徑只要無特別記 載,則為以累積50質量%徑所評估出的值,該累積50質量%徑係秤量50mg之樣品,添加於50mL之蒸餾水,進一步加入2%之Triton(GE Healthcare Bio-Sciences股份有限公司製之界面活性劑的商品名)水溶液0.2ml,以輸出150W之超音波均質機進行分散3分鐘後,利用雷射繞射式粒度分布計,例如雷射繞射式光散射粒度分布計(商標:MICROTRACK MT3300、日機裝公司製)進行測量所得。 In addition, the average particle size in this specification is as long as there is no special record. The load is a value estimated by accumulating 50% by mass. The 50% by mass cumulative sample is weighed in 50 mg of the sample, added to 50 mL of distilled water, and further added with 2% Triton (GE Healthcare Bio-Sciences, Inc.) The surfactant of the surfactant is 0.2 ml of an aqueous solution, and after dispersing for 3 minutes with a 150 W ultrasonic homogenizer, a laser diffraction type particle size distribution meter such as a laser diffraction type light scattering particle size distribution meter (trademark: MICROTRACK MT3300, manufactured by Nikkiso Co., Ltd.) was measured.
鋁粉末(A2)係鋁的一次粒子之表面未被金屬烷氧化物之水解生成物所被覆者。一次粒子之表面未被金屬烷氧化物之水解生成物所被覆,係指一次粒子之表面全體並未被金屬烷氧化物之水解生成物所被覆,可列舉例如鋁本身,於鋁的一次粒子表面形成自氧化膜者等。於鋁的一次粒子表面形成自氧化膜的方法雖可列舉與金屬粉末(A1)所陳述者相同的方法,但亦可列舉將鋁粉末放置於空氣中。 The surface of the primary particles of the aluminum powder (A2)-based aluminum is not covered by the hydrolyzate of the metal alkoxide. The surface of the primary particle is not covered by the hydrolyzate of the metal alkoxide, and the entire surface of the primary particle is not covered by the hydrolyzate of the metal alkoxide, and for example, aluminum itself is used on the surface of the primary particle of aluminum. Forming an oxide film or the like. The method of forming the self-oxidation film on the surface of the primary particles of aluminum includes the same method as that described for the metal powder (A1), but it is also possible to place the aluminum powder in the air.
鋁粉末(A2)係成為導電性之接地部,實質上於寬廣的放電間隙內,由一些放電間隙填充用組成物所形成的放電間隙填充構件會形成並聯電路或串聯電路。 The aluminum powder (A2) serves as a conductive ground portion, and substantially forms a parallel circuit or a series circuit in the discharge gap filling member formed by the discharge gap filling composition in a wide discharge gap.
此外,前述鋁粉末(A2)中之一次粒子,係以平均長寬比(L/d)為3以上且1000以下為佳,以5以上且500以下為更佳,以10以上且100以下又更佳。針 對長寬比的定義及測量方法,係與在金屬粉末(A1)之項目所陳述的內容相同。 Further, the primary particles in the aluminum powder (A2) have an average aspect ratio (L/d) of preferably 3 or more and 1,000 or less, more preferably 5 or more and 500 or less, and more preferably 10 or more and 100 or less. Better. needle The definition and measurement method of the aspect ratio are the same as those stated in the item of metal powder (A1).
本發明所使用的鋁粉末(A2)中之一次粒子的形狀係以薄片狀為佳。本發明之放電間隙填充用組成物,係藉由前述鋁粉末(A2)中之一次粒子的形狀為薄片狀,而有使用有該放電間隙填充用組成物的靜電放電保護體之放電時的作動性變成良好的傾向。針對薄片狀的定義及平均長寬比,係與在金屬粉末(A1)之項目所陳述的內容相同。 The shape of the primary particles in the aluminum powder (A2) used in the present invention is preferably in the form of flakes. In the discharge gap filling composition of the present invention, the shape of the primary particles in the aluminum powder (A2) is in the form of a sheet, and the discharge of the electrostatic discharge protector using the discharge gap filling composition is activated. Sex becomes a good tendency. The definition of the flake shape and the average aspect ratio are the same as those stated in the item of the metal powder (A1).
前述鋁粉末(A2)中之一次粒子,係可使用最短的軸(短邊)之長度(d)為5μm以下,較佳為3μm以下,最佳為1μm以下。 The primary particle in the aluminum powder (A2) may have a length (d) of the shortest axis (short side) of 5 μm or less, preferably 3 μm or less, and most preferably 1 μm or less.
本發明之放電間隙填充用組成物,若前述鋁粉末(A2)中之一次粒子為具有前述範圍之平均長寬比(L/d),則變得更容易對於放電方向順利地放電。其結果,使用有該放電間隙填充用組成物的靜電放電保護體,係作動電壓、耐電壓性會變得良好。也就是說被認為:作為保護體之作動性變得良好,並且對於更低的電壓之放電,也發揮能夠對應之作為保護體的特性者。 In the discharge gap filling composition of the present invention, when the primary particles in the aluminum powder (A2) have an average aspect ratio (L/d) within the above range, it is easier to discharge the discharge direction smoothly. As a result, the electrostatic discharge protector using the discharge gap filling composition is excellent in the operating voltage and the withstand voltage. In other words, it is considered that the operability as a protective body is good, and for a discharge of a lower voltage, a characteristic that can serve as a protective body is also exhibited.
鋁粉末(A2)中之一次粒子的平均粒徑,係以5μm以上且70μm以下為佳,以15μm以上且50μm以下為更佳。若平均粒徑未達前述範圍,則無絕緣皮膜的數微米尺寸之鋁粉末(A2)的個數會變多,靜電放電被施加時鋁粉末(A2)的粒子容易移動使粒子彼此相連繫而變得 容易短路。此外,若平均粒徑超過前述範圍,則即使在例如300μm~1mm左右之廣的電極間,也會有以少數的鋁粉末(A2)之粒子相連繫,而不保有一般作動時之電阻的傾向。 The average particle diameter of the primary particles in the aluminum powder (A2) is preferably 5 μm or more and 70 μm or less, and more preferably 15 μm or more and 50 μm or less. When the average particle diameter is less than the above range, the number of aluminum powders (A2) having a small number of micrometers without an insulating film is increased, and when the electrostatic discharge is applied, the particles of the aluminum powder (A2) are easily moved to connect the particles to each other. Become Easy to short circuit. Further, when the average particle diameter exceeds the above range, even if it is between a wide electrode of, for example, about 300 μm to 1 mm, a small amount of aluminum powder (A2) particles are connected, and the tendency of electric resistance during general operation is not retained. .
鋁粉末(A2)之一次粒子的形狀之特徵,係除平均長寬比、平均粒徑以外可以水面擴散面積WCA(m2/g)來表示。一般,薄片狀鋁粉末之WCA雖為0.1~2m2/g之範圍,但本發明較佳的薄片狀鋁粉末之WCA為0.5m2/g以上,較佳為0.9m2/g以上。 The shape of the primary particles of the aluminum powder (A2) is represented by a water surface diffusion area WCA (m 2 /g) in addition to the average aspect ratio and the average particle diameter. In general, the WCA of the flaky aluminum powder is in the range of 0.1 to 2 m 2 /g, but the WCA of the preferred flaky aluminum powder of the present invention is 0.5 m 2 /g or more, preferably 0.9 m 2 /g or more.
另外,WCA之評估,係使用丙酮來將薄片狀鋁粉末予以粉末化,根據JISK5906-1998而求出。 Further, in the evaluation of WCA, flaky aluminum powder was powdered using acetone, and it was determined according to JIS K5906-1998.
金屬粉末(A1)之絕緣性係比鋁粉末(A2)之絕緣性更大。如上所述,使用有絕緣性不同的2種金屬粉末之本發明的放電間隙填充用組成物,係即使使用於例如300μm以上之寬廣的放電間隙間之填充,放電時之作動性亦優異,並且於一般作動時之電壓方面展現絕緣性。 The insulating property of the metal powder (A1) is greater than that of the aluminum powder (A2). As described above, the discharge gap-filling composition of the present invention which uses two kinds of metal powders having different insulating properties is excellent in the operability at the time of discharge even when it is used for filling between a wide discharge gap of, for example, 300 μm or more. It exhibits insulation in terms of voltage during normal operation.
於本發明之放電間隙填充用組成物不含有鋁粉末(A2)之情況中,於形成具有例如300μm以上之寬廣的放電間隙間之靜電放電保護體後,會產生性能不均,而難以得到必要的作動性。此外,於放電間隙填充用組成物不含有金屬粉末(A1)之情況中,可列舉出不保有一般動作時之絕緣性,或於高電壓解除時難以使絕緣性恢復的 缺點。放電間隙之寬度為超過例如300μm之類的廣寬度時,藉由摻合金屬粉末(A1)與鋁粉末(A2),而能夠控制作動性。 In the case where the discharge gap filling composition of the present invention does not contain the aluminum powder (A2), it is difficult to obtain a performance unevenness after forming an electrostatic discharge protector having a wide discharge gap of, for example, 300 μm or more. Activism. In addition, in the case where the discharge gap filling composition does not contain the metal powder (A1), the insulation property in the case of the general operation is not maintained, or the insulation property is hard to be restored when the high voltage is released. Disadvantages. When the width of the discharge gap is wider than, for example, 300 μm, the mobility can be controlled by blending the metal powder (A1) with the aluminum powder (A2).
本發明之放電間隙填充用組成物中金屬粉末(A1)與鋁粉末(A2)的質量比,金屬粉末(A1):鋁粉末(A2)較佳為98:2~20:80,更佳為95:5~35:65。金屬粉末(A1)的質量比超過前述比例時,放電作動時之電壓會變成與無添加鋁粉末(A2)時相同程度。此外,金屬粉末(A1)的質量比未達前述比例時,會有一般作動時之絕緣性不足,或者因高電壓施加而短路的機率提高之情況。 In the mass ratio of the metal powder (A1) to the aluminum powder (A2) in the discharge gap filling composition of the present invention, the metal powder (A1): aluminum powder (A2) is preferably 98:2 to 20:80, more preferably 95:5~35:65. When the mass ratio of the metal powder (A1) exceeds the above ratio, the voltage at the time of discharge operation becomes the same as that in the case where no aluminum powder (A2) is added. Further, when the mass ratio of the metal powder (A1) is less than the above ratio, there is a case where the insulation at the time of normal operation is insufficient, or the probability of short-circuiting due to application of a high voltage is increased.
前述金屬粉末(A1)係被金屬烷氧化物之水解生成物所被覆,由於表面適度展現高絕緣性,因此即使前述金屬粉末(A1)與鋁粉末(A2),或者(A1)彼此接觸,於一般作動時之絕緣性亦無問題。此外,於放電間隙的寬度為超過例如300μm之廣的寬度之情況中,即使絕緣性低的鋁粉末(A2)彼此接觸,也不可能將放電間隙間完全連繫。是故就作動性的觀點而言,放電間隙填充用組成物中之金屬粉末(A1)與鋁粉末(A2)的含量,係被認為並無上限規定。但,於組成物中之黏合劑成分(B)之含量少的情況中,會有落粉等之問題發生的情況。因此,當比起作動性之觀點不如考慮實用性時,金屬粉末(A1)及鋁粉末(A2)之合計的含量,係以放電間隙填充用組成物之固體成分中為95質量%以下為佳。 The metal powder (A1) is coated with a hydrolyzed product of a metal alkoxide, and since the surface exhibits high insulating properties, even if the metal powder (A1) and the aluminum powder (A2) or (A1) are in contact with each other, There is no problem with the insulation during normal operation. Further, in the case where the width of the discharge gap is wider than a width of, for example, 300 μm, even if the aluminum powders (A2) having low insulating properties are in contact with each other, it is impossible to completely connect the discharge gaps. Therefore, from the viewpoint of the operability, the content of the metal powder (A1) and the aluminum powder (A2) in the discharge gap filling composition is considered to have no upper limit. However, when the content of the binder component (B) in the composition is small, problems such as falling powder may occur. Therefore, when the practicality is not considered as compared with the viewpoint of the activism, the total content of the metal powder (A1) and the aluminum powder (A2) is preferably 95% by mass or less based on the solid content of the discharge gap filling composition. .
此外,由於在ESD發生時,靜電放電保護體必須展現整體性的導電性,因此金屬粉末(A1)及鋁粉末(A2)之合計的含量,係以放電間隙填充用組成物之固體成分中為3質量%以上為佳。 In addition, since the electrostatic discharge protector must exhibit overall conductivity when ESD occurs, the total content of the metal powder (A1) and the aluminum powder (A2) is determined by the solid content of the discharge gap filling composition. More than 3 mass% is preferred.
因而,將本發明之放電間隙填充用組成物使用於靜電放電保護體時,放電間隙填充用組成物的固體成分中之金屬粉末(A1)及鋁粉末(A2)之合計的含量,係以放電間隙填充用組成物之固體成分中為3質量%以上且95質量%以下為佳,以30質量%以上且80質量%以下為更佳。 Therefore, when the discharge gap filling composition of the present invention is used for an electrostatic discharge protector, the total content of the metal powder (A1) and the aluminum powder (A2) in the solid content of the discharge gap filling composition is discharged. The solid content of the gap-filling composition is preferably 3% by mass or more and 95% by mass or less, more preferably 30% by mass or more and 80% by mass or less.
此外,由前述觀點而言,本發明之放電間隙 填充用組成物的固體成分中之金屬粉末(A1)與鋁粉末(A2)的合計之質量與後述之黏合劑成分(B)的質量比(A/B),係以3/97~95/5為佳,以30/70~80/20為更佳。 Further, from the foregoing point of view, the discharge gap of the present invention The mass ratio (A/B) of the total mass of the metal powder (A1) and the aluminum powder (A2) in the solid content of the filling composition to the binder component (B) to be described later is 3/97 to 95/ 5 is better, with 30/70~80/20 being better.
於本發明中,黏合劑成分(B)係指用以使上述之金屬粉末(A1)及鋁粉末(A2)分散的絕緣體物質。黏合劑成分(B)係可列舉例如:有機系聚合物、無機系聚合物或此等之複合聚合物。 In the present invention, the binder component (B) means an insulator material for dispersing the above metal powder (A1) and aluminum powder (A2). Examples of the binder component (B) include an organic polymer, an inorganic polymer, or a composite polymer thereof.
黏合劑成分(B)之具體例係可列舉:聚矽氧烷化合物、胺甲酸酯樹脂、聚亞醯胺、聚烯烴、聚丁二烯、環氧樹脂、酚樹脂、丙烯酸樹脂、氫化聚丁二烯、聚 酯、聚碳酸酯、聚醚、聚碸、聚四氟樹脂、三聚氰胺樹脂、聚醯胺、聚醯胺醯亞胺、酚樹脂、不飽和聚酯樹脂、乙烯基酯樹脂、醇酸樹脂、乙烯基酯樹脂、醇酸樹脂、苯二甲酸二烯丙酯樹脂、烯丙酯樹脂、呋喃樹脂、松香、松香衍生物、橡膠衍生物等。 Specific examples of the binder component (B) include a polyoxyalkylene compound, a urethane resin, a polyamidene, a polyolefin, a polybutadiene, an epoxy resin, a phenol resin, an acrylic resin, and a hydrogenation polymerization. Butadiene, poly Ester, polycarbonate, polyether, polyfluorene, polytetrafluoro resin, melamine resin, polyamide, polyamidimide, phenolic resin, unsaturated polyester resin, vinyl ester resin, alkyd resin, ethylene A base resin, an alkyd resin, a diallyl phthalate resin, an allyl ester resin, a furan resin, a rosin, a rosin derivative, a rubber derivative or the like.
此外,就力學安定性、熱安定性、化學安定性或經時性的安定性之觀點而言,黏合劑成分(B)係以含有熱硬化性化合物或活性能量線硬化性化合物者為佳。前述熱硬化性化合物當中,就絕緣電阻值高,與基材之密著性良好,且金屬粉末(A1)及鋁粉末(A2)之分散性良好的觀點而言,以熱硬化性胺甲酸酯樹脂特別理想。 Further, the binder component (B) is preferably a thermosetting compound or an active energy ray-curable compound from the viewpoint of mechanical stability, thermal stability, chemical stability, or stability over time. Among the thermosetting compounds, a thermosetting uric acid is used because the insulating resistance is high, the adhesion to the substrate is good, and the dispersibility of the metal powder (A1) and the aluminum powder (A2) is good. Ester resins are particularly desirable.
此等黏合劑成分(B)所含有的化合物係可1種單獨使用,亦可2種以上合併使用。 The compound contained in the binder component (B) may be used alone or in combination of two or more.
前述熱硬化性胺甲酸酯樹脂係可列舉例如:具有使含有碳酸酯二醇化合物之多元醇化合物與異氰酸酯化合物反應所形成之胺甲酸酯鍵的聚合物。其中,較佳為含有含羧基之聚胺甲酸酯樹脂、環氧基、酸酐基、羧基、醇性基或胺基的胺甲酸酯化合物與環氧化合物之組合;含有羧基、醇性基或胺基的胺甲酸酯化合物與含有碳二醯亞胺的化合物之組合。上述環氧化合物可列舉:雙酚A型環氧樹脂、氫化雙酚A型環氧樹脂、溴化雙酚A型環氧樹脂、雙酚F型環氧樹脂、酚醛清漆型環氧樹脂、苯酚酚醛清漆型環氧樹脂、甲酚酚醛清漆型環氧樹脂、脂環式環氧樹脂、N-縮水甘油型環氧樹脂、雙酚A之酚醛清漆型環 氧樹脂、螯合型環氧樹脂、乙二醛型環氧樹脂、含胺基環氧樹脂、橡膠改質環氧樹脂、己內酯改質環氧樹脂等之於1分子中具有2個以上環氧基的化合物。此外,為了賦予難燃性,亦可使用於該結構中導入有氯、溴等鹵素或磷等之原子的環氧化合物。 The thermosetting urethane resin may, for example, be a polymer having a urethane bond formed by reacting a polyol compound containing a carbonate diol compound with an isocyanate compound. Among them, a combination of a carbamate compound containing a carboxyl group-containing polyurethane resin, an epoxy group, an acid anhydride group, a carboxyl group, an alcohol group or an amine group, and an epoxy compound; and a carboxyl group and an alcohol group are preferable. Or a combination of an amine-based carbamate compound and a carbodiimide-containing compound. Examples of the epoxy compound include bisphenol A type epoxy resin, hydrogenated bisphenol A type epoxy resin, brominated bisphenol A type epoxy resin, bisphenol F type epoxy resin, novolak type epoxy resin, and phenol. Novolak type epoxy resin, cresol novolac type epoxy resin, alicyclic epoxy resin, N-glycidyl epoxy resin, phenolic varnish type ring of bisphenol A Oxygen resin, chelating epoxy resin, glyoxal type epoxy resin, amine-containing epoxy resin, rubber modified epoxy resin, caprolactone modified epoxy resin, etc., having two or more in one molecule An epoxy group compound. Further, in order to impart flame retardancy, an epoxy compound in which a halogen such as chlorine or bromine or an atom such as phosphorus is introduced into the structure may be used.
再者,就持有與其他的硬化成分之硬化反應功能的觀點而言,進一步以於分子中具有羧基之含羧基熱硬化性胺甲酸酯樹脂、或於分子末端具有酸酐基之含酸酐基熱硬化性胺甲酸酯樹脂為佳。 Further, from the viewpoint of having a hardening reaction function with other hardening components, a carboxyl group-containing thermosetting urethane resin having a carboxyl group in a molecule or an acid anhydride group having an acid anhydride group at a molecular terminal is further used. A thermosetting urethane resin is preferred.
此外,前述其他的硬化成分係可例示環氧樹脂硬化劑等,可作為黏合劑成分(B)之一使用。 Further, the other hardening component may be an epoxy resin curing agent or the like, and may be used as one of the binder components (B).
前述碳酸酯二醇化合物係可列舉:含有1種或2種以上來自直鏈狀脂肪族二醇的重複單元作為構造單元之碳酸酯二醇化合物、含有1種或2種以上來自脂環式二醇的重複單元作為構造單元之碳酸酯二醇化合物、或者含有此等來自兩者之二醇的重複單元作為構造單元之碳酸酯二醇化合物。 The carbonate diol compound may be a carbonate diol compound containing one or more kinds of repeating units derived from a linear aliphatic diol as a structural unit, and one or more kinds derived from an alicyclic formula. The repeating unit of the alcohol is a carbonate diol compound of a structural unit or a carbonate diol compound containing a repeating unit of the diol derived from the two as a structural unit.
含有來自直鏈狀脂肪族二醇的重複單元作為構造單元之碳酸酯二醇化合物,係可列舉具有以碳酸酯鍵鍵結有1,3-丙二醇、1,4-丁二醇、1,5-戊二醇、1,6-己二醇、3-甲基-1,5-戊二醇、2-甲基-1,8-辛二醇、1,9-壬二醇等之二醇成分的結構之聚碳酸酯二醇。 A carbonate diol compound containing a repeating unit derived from a linear aliphatic diol as a structural unit, which is exemplified by having a carbonate bond-bonded 1,3-propanediol, 1,4-butanediol, 1,5 - diols such as pentanediol, 1,6-hexanediol, 3-methyl-1,5-pentanediol, 2-methyl-1,8-octanediol, 1,9-nonanediol A polycarbonate diol having the structure of the composition.
含有來自脂環式二醇的重複單元作為構造單元之碳酸酯二醇化合物,係可列舉具有以碳酸酯鍵鍵結有 1,4-環己烷二甲醇、1,3-環己烷二甲醇、1,4-環己烷二醇、1,3-環己烷二醇、三環己烷二甲醇、五環十五烷二醇等之二醇成分的結構之聚碳酸酯二醇。此等二醇成分亦可組合2種以上。 A carbonate diol compound containing a repeating unit derived from an alicyclic diol as a structural unit, which may be exemplified by having a carbonate bond 1,4-cyclohexanedimethanol, 1,3-cyclohexanedimethanol, 1,4-cyclohexanediol, 1,3-cyclohexanediol, tricyclohexanedimethanol, pentacyclic ten A polycarbonate diol having a structure of a diol component such as pentacyclodiol. These diol components may be combined in two or more types.
前述碳酸酯二醇化合物,市售者係可列舉:Daicel化學(股)製之商品名PLACCEL、CD-205,205PL,205HL、210、210PL,210HL,220、220PL,220HL、宇部興產(股)製之商品名UC-CARB100、UM-CARB90、UH-CARB100、股份有限公司KURARAY製之商品名C-1065N、C-2015N、C-1015N、C-2065N等。 The carbonate diol compound is commercially available from Daicel Chemical Co., Ltd. under the trade names PLACCEL, CD-205, 205PL, 205HL, 210, 210PL, 210HL, 220, 220PL, 220HL, and Ube Industries. The trade names of UC-CARB100, UM-CARB90, UH-CARB100, and Kuraray Co., Ltd. are trade names C-1065N, C-2015N, C-1015N, C-2065N, etc.
此等之碳酸酯二醇化合物係可單獨或組合2種以上而使用。此等當中,特別是含有來自直鏈狀脂肪族二醇的重複單元作為構造單元之碳酸酯二醇化合物,係有低翹曲性或可撓性優異的傾向。因而,使用含有該聚碳酸酯二醇的黏合劑成分(B)時,於可撓性配線基板設置後述之靜電放電保護體一事會變得容易。 These carbonate diol compounds can be used singly or in combination of two or more. Among these, in particular, a carbonate diol compound containing a repeating unit derived from a linear aliphatic diol as a structural unit tends to be excellent in low warpage and flexibility. Therefore, when the binder component (B) containing the polycarbonate diol is used, it is easy to provide an electrostatic discharge protector to be described later on the flexible wiring board.
此外,含有來自脂環式二醇的重複單元作為構造單元之碳酸酯二醇化合物,係有結晶性提高而耐熱性優異的傾向。基於以上觀點,此等聚碳酸酯二醇係以組合2種以上而使用,或者使用含有來自直鏈狀脂肪族二醇與來自脂環式二醇兩者的重複單元作為構造單元之聚碳酸酯二醇為佳。為了平衡佳地發揮可撓性與耐熱性,以使用直鏈狀脂肪族二醇與脂環式二醇之共聚合比例為質量比計3:7~7:3之聚碳酸酯二醇者較為適合。 In addition, the carbonate diol compound containing a repeating unit derived from an alicyclic diol as a structural unit tends to have improved crystallinity and excellent heat resistance. In view of the above, these polycarbonate diols are used in combination of two or more kinds, or a polycarbonate containing a repeating unit derived from both a linear aliphatic diol and an alicyclic diol as a structural unit. A diol is preferred. In order to balance the flexibility and heat resistance, the ratio of the copolymerization ratio of the linear aliphatic diol to the alicyclic diol is 3:7 to 7:3. Suitable for.
此外,碳酸酯二醇化合物之數量平均分子量係以5000以下為佳。若數量平均分子量超過5000則相對性的胺甲酸酯鍵之量會減少,因此會有靜電放電保護體的作動電壓上昇,或耐電壓性降低的情況。 Further, the number average molecular weight of the carbonate diol compound is preferably 5,000 or less. When the number average molecular weight exceeds 5,000, the amount of the relative urethane bond decreases, and thus the operating voltage of the electrostatic discharge protector rises or the withstand voltage decreases.
前述異氰酸酯化合物之具體例係可列舉:2,4-甲苯二異氰酸酯、2,6-甲苯二異氰酸酯、異佛酮二異氰酸酯、六亞甲基二異氰酸酯、二苯基亞甲基二異氰酸酯、(o、m、或p)-二甲苯二異氰酸酯、(o、m、或p)-氫化二甲苯二異氰酸酯、亞甲基雙(環己基異氰酸酯)、三甲基六亞甲基二異氰酸酯、環己烷-1,3-二亞甲基二異氰酸酯、環己烷-1,4-二亞甲基二異氰酸酯、1,3-三亞甲基二異氰酸酯、1,4-四亞甲基二異氰酸酯、2,2,4-三甲基六亞甲基二異氰酸酯、2,4,4-三甲基六亞甲基二異氰酸酯、1,9-九亞甲基二異氰酸酯、1,10-十亞甲基二異氰酸酯、1,4-環己烷二異氰酸酯、2,2’-二乙基醚二異氰酸酯、環己烷-1,4-二亞甲基二異氰酸酯、1,5-萘二異氰酸酯、p-伸苯基二異氰酸酯、3,3’-亞甲基二甲伸苯基-4,4’-二異氰酸酯、4,4’-二苯基醚二異氰酸酯、四氯伸苯基二異氰酸酯、降莰烷二異氰酸酯及1,5-萘二異氰酸酯等之二異氰酸酯。此等異氰酸酯化合物係可1種或將2種以上組合使用。 Specific examples of the above isocyanate compound include 2,4-toluene diisocyanate, 2,6-toluene diisocyanate, isophorone diisocyanate, hexamethylene diisocyanate, and diphenylmethylene diisocyanate. , m, or p)-xylene diisocyanate, (o, m, or p)-hydroxylene diisocyanate, methylene bis(cyclohexyl isocyanate), trimethylhexamethylene diisocyanate, cyclohexane -1,3-dimethylene diisocyanate, cyclohexane-1,4-dimethylene diisocyanate, 1,3-trimethylene diisocyanate, 1,4-tetramethylene diisocyanate, 2, 2,4-trimethylhexamethylene diisocyanate, 2,4,4-trimethylhexamethylene diisocyanate, 1,9-nonamethylene diisocyanate, 1,10-decamethylene Isocyanate, 1,4-cyclohexane diisocyanate, 2,2'-diethyl ether diisocyanate, cyclohexane-1,4-dimethylene diisocyanate, 1,5-naphthalene diisocyanate, p-stretch Phenyl diisocyanate, 3,3'-methylenedimethylphenylene-4,4'-diisocyanate, 4,4'-diphenyl ether diisocyanate, tetrachlorophenylene diisocyanate, norbornane Diisocyanate And 1,5-naphthalene diisocyanate, etc. diisocyanate. These isocyanate compounds may be used alone or in combination of two or more.
此等當中較佳為由脂環式二胺所衍生的脂環式二異氰酸酯,具體而言係異佛酮二異氰酸酯或(o、m、或p)-氫化二甲苯二異氰酸酯。使用此等二異氰酸酯時,可得到耐電壓性優異的硬化物。 Among these, an alicyclic diisocyanate derived from an alicyclic diamine, specifically, isophorone diisocyanate or (o, m, or p)-hydroxylene diisocyanate is preferred. When such a diisocyanate is used, a cured product excellent in withstand voltage can be obtained.
本發明所使用之熱硬化性胺甲酸酯樹脂,尤其是為了得到前述含羧基之熱硬化性胺甲酸酯樹脂,只要使具有羧基之多元醇與例如前述碳酸酯二醇化合物及前述異氰酸酯化合物一起反應即可。 In the thermosetting urethane resin used in the present invention, in particular, in order to obtain the carboxyl group-containing thermosetting urethane resin, a polyol having a carboxyl group and, for example, the above-described carbonate diol compound and the aforementioned isocyanate compound may be used. Just react together.
具有羧基之多元醇,特別是以使用具有羧基之二羥基脂肪族羧酸為佳。如此之二羥基化合物係可列舉:二羥甲基丙酸、二羥甲基丁酸。藉由使用具有羧基之二羥基脂肪族羧酸,而可使羧基容易存在胺甲酸酯樹脂中。 The polyol having a carboxyl group is particularly preferably a dihydroxy aliphatic carboxylic acid having a carboxyl group. Examples of such a dihydroxy compound include dimethylolpropionic acid and dimethylolbutanoic acid. The carboxyl group can be easily present in the urethane resin by using a dihydroxy aliphatic carboxylic acid having a carboxyl group.
本發明所使用之熱硬化性胺甲酸酯樹脂,尤其是為了得到前述含酸酐基之熱硬化性胺甲酸酯樹脂,例如可使第2二異氰酸酯化合物與具有酸酐基的多元羧酸或其衍生物反應而得到,該第2二異氰酸酯化合物係以使羥基數與異氰酸酯基數的比率成為異氰酸酯基/羥基=1.0以上的方式使前述碳酸酯二醇化合物與前述異氰酸酯化合物反應而得到。 The thermosetting urethane resin used in the present invention, in particular, in order to obtain the above-mentioned acid anhydride group-containing thermosetting urethane resin, for example, a second diisocyanate compound and a polycarboxylic acid having an acid anhydride group or The second diisocyanate compound is obtained by reacting the above-described carbonate diol compound with the above isocyanate compound so that the ratio of the number of hydroxyl groups to the number of isocyanate groups is such that the ratio of the number of hydroxyl groups to the number of isocyanate groups is 1.0 or more.
前述具有酸酐基之多元羧酸及其衍生物係可列舉:具有酸酐基之3價多元羧酸及其衍生物,以及具有酸酐基之4價多元羧酸。 The polyvalent carboxylic acid having an acid anhydride group and a derivative thereof may, for example, be a trivalent polycarboxylic acid having an acid anhydride group and a derivative thereof, and a tetravalent polycarboxylic acid having an acid anhydride group.
具有酸酐基之3價多元羧酸及其衍生物雖無特別限定但可列舉例如:以下述式(2)及下述式(3)所表示的化合物。 The trivalent polycarboxylic acid having an acid anhydride group and a derivative thereof are not particularly limited, and examples thereof include a compound represented by the following formula (2) and the following formula (3).
(式中,R’係表示氫、碳數1~10之烷基或苯基,Y1為-CH2-、-CO-、-SO2-、或O-)。 (wherein R' represents hydrogen, an alkyl group having 1 to 10 carbon atoms or a phenyl group, and Y 1 is -CH 2 -, -CO-, -SO 2 -, or O-).
具有酸酐基之3價羧酸及其衍生物,就耐熱性、成本的觀點等而言,以偏苯三甲酸酐特別理想。 The trivalent carboxylic acid having an acid anhydride group and a derivative thereof are particularly preferred from the viewpoint of heat resistance and cost, and trimellitic anhydride.
此外,可因應需要而使用前述多元羧酸及其衍生物以外之四羧酸二酐、脂肪族二羧酸、芳香族二羧酸。 Further, a tetracarboxylic dianhydride, an aliphatic dicarboxylic acid or an aromatic dicarboxylic acid other than the above polyvalent carboxylic acid and its derivative may be used as needed.
四羧酸二酐係可列舉例如:苯均四酸二酐、3,3’,4,4’-二苯基酮四羧酸二酐、3,3’,4,4’-聯苯四羧酸二酐、3,3’,4,4’-二苯碸四羧酸二酐、1,2,5,6-萘四羧酸二酐、2,3,5,6-吡啶四羧酸二酐、1,4,5,8-萘四羧酸二酐、3,4,9,10-苝四羧酸二酐、4,4’-磺醯基二鄰苯二甲酸二酐、m-tert-苯基-3,3’,4,4’-四羧酸二酐、4,4’-氧二鄰苯二甲酸 二酐、1,1,1,3,3,3-六氟-2,2-雙(2,3-或3,4-二羧苯基)丙烷二酐、2,2-雙(2,3-或3,4-二羧苯基)丙烷二酐、2,2-雙[4-(2,3-或3,4-二羧苯氧基)苯基]丙烷二酐、1,1,1,3,3,3-六氟-2,2-雙[4-(2,3-或3,4-二羧苯氧基)苯基]丙烷二酐、1,3-雙(3,4-二羧苯基)-1,1,3,3-四甲基二矽氧烷二酐、丁烷四羧酸二酐、雙環-[2,2,2]-辛-7-烯-2:3:5:6-四羧酸二酐等。 Examples of the tetracarboxylic dianhydride include pyromellitic dianhydride, 3,3', 4,4'-diphenyl ketone tetracarboxylic dianhydride, and 3,3',4,4'-biphenyl tetra Carboxylic dianhydride, 3,3',4,4'-diphenyltetracarboxylic dianhydride, 1,2,5,6-naphthalenetetracarboxylic dianhydride, 2,3,5,6-pyridinetetracarboxylic acid Acid dianhydride, 1,4,5,8-naphthalenetetracarboxylic dianhydride, 3,4,9,10-decanetetracarboxylic dianhydride, 4,4'-sulfonyldiphthalic dianhydride, M-tert-phenyl-3,3',4,4'-tetracarboxylic dianhydride, 4,4'-oxydiphthalic acid Dihydride, 1,1,1,3,3,3-hexafluoro-2,2-bis(2,3- or 3,4-dicarboxyphenyl)propane dianhydride, 2,2-bis (2, 3- or 3,4-dicarboxyphenyl)propane dianhydride, 2,2-bis[4-(2,3- or 3,4-dicarboxyphenoxy)phenyl]propane dianhydride, 1,1 , 1,3,3,3-hexafluoro-2,2-bis[4-(2,3- or 3,4-dicarboxyphenoxy)phenyl]propane dianhydride, 1,3-double (3 ,4-dicarboxyphenyl)-1,1,3,3-tetramethyldioxanane dianhydride, butane tetracarboxylic dianhydride, bicyclo-[2,2,2]-oct-7-ene -2:3:5:6-tetracarboxylic dianhydride or the like.
脂肪族二羧酸係可列舉:琥珀酸、戊二酸、己二酸、壬二酸、辛二酸、泌脂酸(sebacylic acid)、癸二酸、十二烷二酸、二聚物酸等。 Examples of the aliphatic dicarboxylic acid include succinic acid, glutaric acid, adipic acid, sebacic acid, suberic acid, sebacylic acid, sebacic acid, dodecanedioic acid, and dimer acid. Wait.
芳香族二羧酸係可列舉:間苯二甲酸、對苯二甲酸、鄰苯二甲酸、萘二羧酸、氧代二苯甲酸(Oxydibenzoic acid)等。 Examples of the aromatic dicarboxylic acid include isophthalic acid, terephthalic acid, phthalic acid, naphthalene dicarboxylic acid, and oxydibenzoic acid.
進而,較佳為使用製造前述熱硬化性胺甲酸酯樹脂時成為末端封止劑的單羥基化合物。單羥基化合物係只要於分子中具有一個羥基的化合物即可,可列舉:脂肪族醇、單羥基單(甲基)丙烯酸酯化合物等。在此,(甲基)丙烯酸酯係意味著丙烯酸酯及/或甲基丙烯酸酯,且以下相同。 Further, a monohydroxy compound which is an end-blocking agent when the thermosetting urethane resin is produced is preferably used. The monohydroxy compound is not particularly limited as long as it has a hydroxyl group in the molecule, and examples thereof include an aliphatic alcohol and a monohydroxy mono(meth)acrylate compound. Here, the (meth) acrylate means acrylate and/or methacrylate, and is the same as the following.
脂肪族醇的例子係可列舉:甲醇、乙醇、丙醇、異丁醇等,單羥基單(甲基)丙烯酸酯化合物的例子係可列舉:2-羥基乙基丙烯酸酯等。藉由使用此等而可避免熱硬化性胺甲酸酯樹脂中殘存異氰酸酯基。 Examples of the aliphatic alcohols include methanol, ethanol, propanol, and isobutanol, and examples of the monohydroxy mono(meth)acrylate compound include 2-hydroxyethyl acrylate. By using this, it is possible to avoid the residual isocyanate group in the thermosetting urethane resin.
於熱硬化性胺甲酸酯樹脂中,亦可進一步為 了賦予難燃性,而將氯、溴等鹵素或磷等之原子導入該結構中。 In the thermosetting urethane resin, it may further In order to impart flame retardancy, atoms such as halogen or phosphorus such as chlorine or bromine are introduced into the structure.
於前述碳酸酯二醇化合物與前述異氰酸酯化合物之反應中兩者的摻合比例,排除得到前述含酸酐基之熱硬化性胺甲酸酯樹脂時,較佳係莫耳比為50:100~150:100,更佳為80:100~120:100。 In the case where the blending ratio of the carbonate diol compound and the isocyanate compound is the same, the thermosetting urethane resin containing the acid anhydride group is excluded, preferably a molar ratio of 50:100 to 150. :100, more preferably 80:100~120:100.
特別是得到含羧基之熱硬化性胺甲酸酯樹脂時,使具有羧基之多元醇與前述碳酸酯二醇化合物及前述異氰酸酯化合物一起反應時之摻合比例,若表記為碳酸酯二醇化合物(a)、異氰酸酯化合物(b)、具有羧基之多元醇(c),則莫耳比為(a)+(c):(b)=50:100~150:100,更佳為(a)+(c):(b)=80:100~120:100。 In particular, when a carboxyl group-containing thermosetting urethane resin is obtained, a blend ratio when a polyol having a carboxyl group is reacted with the carbonate diol compound and the isocyanate compound is referred to as a carbonate diol compound ( a), isocyanate compound (b), polyol (c) having a carboxyl group, the molar ratio is (a) + (c): (b) = 50: 100 to 150: 100, more preferably (a) + (c): (b) = 80: 100 ~ 120: 100.
可於含有前述碳酸酯二醇化合物之多元醇化合物與前述異氰酸酯化合物之反應中所使用的溶劑,係以醚系溶劑、含硫系溶劑、酯系溶劑、酮系溶劑、芳香族烴系溶劑等之非含氮系極性溶劑為佳。 The solvent used in the reaction between the polyol compound containing the carbonate diol compound and the isocyanate compound is an ether solvent, a sulfur-containing solvent, an ester solvent, a ketone solvent, an aromatic hydrocarbon solvent, or the like. Non-nitrogen-based polar solvents are preferred.
例如,醚系溶劑係可列舉:二乙二醇二甲基醚、二乙二醇二乙基醚、三乙二醇二甲基醚、三乙二醇二乙基醚。 For example, examples of the ether solvent include diethylene glycol dimethyl ether, diethylene glycol diethyl ether, triethylene glycol dimethyl ether, and triethylene glycol diethyl ether.
含硫系溶劑係可列舉:二甲基亞碸、二乙基亞碸、二甲基碸、環丁碸。 Examples of the sulfur-containing solvent include dimethyl hydrazine, diethyl hydrazine, dimethyl hydrazine, and cyclobutyl hydrazine.
酯系溶劑係可列舉:γ-丁內酯、二乙二醇單甲基醚乙酸酯、乙二醇單甲基醚乙酸酯、丙二醇單甲基醚 乙酸酯、二乙二醇單乙基醚乙酸酯、乙二醇單乙基醚乙酸酯、丙二醇單乙基醚乙酸酯。 Examples of the ester solvent include γ-butyrolactone, diethylene glycol monomethyl ether acetate, ethylene glycol monomethyl ether acetate, and propylene glycol monomethyl ether. Acetate, diethylene glycol monoethyl ether acetate, ethylene glycol monoethyl ether acetate, propylene glycol monoethyl ether acetate.
酮系溶劑係可列舉:環己酮、甲基乙基酮。 Examples of the ketone solvent include cyclohexanone and methyl ethyl ketone.
芳香族烴系溶劑係可列舉:甲苯、二甲苯、石腦油等。 Examples of the aromatic hydrocarbon solvent include toluene, xylene, and naphtha.
此等溶劑係可單獨或組合2種以上使用。 These solvents may be used alone or in combination of two or more.
此等當中,為高揮發性且可賦予低溫硬化性的溶劑更佳可列舉:γ-丁內酯、二乙二醇單甲基醚乙酸酯、乙二醇單甲基醚乙酸酯、丙二醇單甲基醚乙酸酯、二乙二醇單乙基醚乙酸酯、乙二醇單乙基醚乙酸酯、丙二醇單乙基醚乙酸酯等。 Among these, a solvent which is highly volatile and can impart low-temperature hardenability is more preferably γ-butyrolactone, diethylene glycol monomethyl ether acetate, ethylene glycol monomethyl ether acetate, Propylene glycol monomethyl ether acetate, diethylene glycol monoethyl ether acetate, ethylene glycol monoethyl ether acetate, propylene glycol monoethyl ether acetate, and the like.
含有前述碳酸酯二醇化合物之多元醇化合物與前述異氰酸酯化合物的反應溫度,較佳為30~180℃,更佳為50~160℃。溫度低於30℃時反應會變得過長,若超過180℃則容易產生凝膠化。 The reaction temperature of the polyol compound containing the above carbonate diol compound and the above isocyanate compound is preferably from 30 to 180 ° C, more preferably from 50 to 160 ° C. When the temperature is lower than 30 ° C, the reaction becomes too long, and if it exceeds 180 ° C, gelation tends to occur.
反應時間,雖依據反應溫度而異,但較佳為2~36小時,更佳為8~16小時。於未達2小時的情況中,為了得到所期望的數量平均分子量即使提高反應溫度也難以控制。此外,於超過36小時的情況中,係不具實用性。 The reaction time varies depending on the reaction temperature, but is preferably from 2 to 36 hours, more preferably from 8 to 16 hours. In the case of less than 2 hours, it is difficult to control even if the reaction temperature is raised in order to obtain a desired number average molecular weight. In addition, in the case of more than 36 hours, it is not practical.
前述之熱硬化性胺甲酸酯樹脂的數量平均分子量係以500~100,000為佳,以8,000~50,000為更佳。在此,數量平均分子量係以凝膠滲透層析法所測量出的聚苯乙烯換算之值。熱硬化性胺甲酸酯樹脂之數量平均分子 量未達500時,會損及硬化膜之延伸度、可撓性、以及強度,若超過1000,000則會變硬,恐有降低可撓性之虞。 The above-mentioned thermosetting urethane resin preferably has a number average molecular weight of 500 to 100,000 and more preferably 8,000 to 50,000. Here, the number average molecular weight is a value in terms of polystyrene measured by gel permeation chromatography. Number average molecule of thermosetting urethane resin When the amount is less than 500, the elongation, flexibility, and strength of the cured film may be impaired, and if it exceeds 1000,000, it may become hard, which may reduce the flexibility.
特別是含羧基之熱硬化性胺甲酸酯樹脂之酸價係以5~150mgKOH/g為佳,以30~120mgKOH/g為更佳。酸價未達5mgKOH/g時,與硬化性成分之反應性會降低,而無法得到所期望的耐熱性或長期信賴性。若酸價超過150mgKOH/g,則會有可撓性容易消失,且長期絕緣特性等降低的情況。另外,樹脂的酸價係依據JISK5407所測量出之值。 In particular, the acid value of the carboxyl group-containing thermosetting urethane resin is preferably 5 to 150 mgKOH/g, more preferably 30 to 120 mgKOH/g. When the acid value is less than 5 mgKOH/g, the reactivity with the curable component is lowered, and the desired heat resistance or long-term reliability cannot be obtained. When the acid value exceeds 150 mgKOH/g, flexibility may easily disappear, and long-term insulation properties and the like may be lowered. Further, the acid value of the resin is a value measured in accordance with JIS K5407.
活性能量線硬化性化合物係可列舉:含有2個以上之乙烯性不飽和基的化合物之丙烯酸系共聚物、環氧(甲基)丙烯酸酯樹脂、胺甲酸酯(甲基)丙烯酸酯樹脂。 Examples of the active energy ray-curable compound include an acrylic copolymer containing a compound of two or more ethylenically unsaturated groups, an epoxy (meth) acrylate resin, and a urethane (meth) acrylate resin.
黏合劑(B)的含量係成為從放電間隙填充用組成物全體排除(A1)成分、(A2)成分、及因應需要而添加之其他成分的含量後之值,放電間隙填充用組成物固體成分中,較佳為5質量%以上且97質量%以下,更佳為20質量%以上且70質量%以下。 The content of the binder (B) is a value obtained by removing the content of the component (A1), the component (A2), and other components added as needed from the entire discharge gap filling composition, and the solid content of the discharge gap filling composition. In particular, it is preferably 5% by mass or more and 97% by mass or less, more preferably 20% by mass or more and 70% by mass or less.
本發明之放電間隙填充用組成物,係含有上述金屬粉末(A1)、鋁粉末(A2)、黏合劑成分(B)、可因應需要而含有層狀物質、硬化觸媒、硬化促進劑、填充劑、溶劑、發泡劑、消泡劑、整平劑、滑劑、可塑劑、防鏽劑、 黏度調整劑、著色劑等。此外,可含有二氧化矽粒子等之絕緣性粒子。 The discharge gap filling composition of the present invention contains the metal powder (A1), aluminum powder (A2), and binder component (B), and may contain a layered substance, a curing catalyst, a hardening accelerator, and a filler as needed. Agent, solvent, foaming agent, antifoaming agent, leveling agent, slip agent, plasticizer, rust inhibitor, Viscosity adjusters, colorants, etc. Further, insulating particles such as cerium oxide particles may be contained.
本發明之放電間隙填充用組成物,例如,可藉由使用散佈機(diaper)、捏合機、三輥式輥軋機、珠磨機、自轉公轉型攪拌機等來將金屬粉末(A1)、鋁粉末(A2)、及前述黏合劑成分(B)以外、作為其他成分之溶劑、填充劑、硬化觸媒等進行分散、混合而製造。混合時,為了使相溶性成為良好亦可加溫至充分的溫度。前述之分散、混合之後,可因應需要進一步添加硬化促進劑予以混合,而進行調製。 The discharge gap filling composition of the present invention can be, for example, a metal powder (A1) or an aluminum powder by using a diaper, a kneader, a three-roll mill, a bead mill, a self-rotating mixer, or the like. (A2) and the binder component (B) are produced by dispersing and mixing a solvent, a filler, a curing catalyst, or the like as another component. At the time of mixing, in order to make compatibility favorable, it can heat to a sufficient temperature. After the above dispersion and mixing, it may be prepared by further adding a hardening accelerator as needed to be mixed.
本發明之靜電放電保護體,係具有至少2個電極、與於前述2個電極間之放電間隙的靜電放電保護體,其特徵為,具有將上述之放電間隙填充用組成物填充於前述放電間隙所形成的放電間隙填充構件。 The electrostatic discharge protector of the present invention is an electrostatic discharge protector having at least two electrodes and a discharge gap between the two electrodes, and is characterized in that the discharge gap filling composition is filled in the discharge gap. The formed discharge gap filling member.
前述2個電極係隔著一定的距離地作配置。此2個電極間的空間係成為放電間隙。前述放電間隙填充構件係形成於此放電間隙。也就是說,前述2個電極係透過放電間隙填充構件而被連結。前述放電間隙填充構件係藉由上述放電間隙填充用組成物而形成。 The two electrodes are arranged at a constant distance. The space between the two electrodes is a discharge gap. The discharge gap filling member is formed in the discharge gap. That is, the two electrodes are connected to each other through the discharge gap filling member. The discharge gap filling member is formed by the above-described discharge gap filling composition.
本發明之靜電放電保護體之其中一個樣態係 具有:隔著特定間隔而被配置的2個導電體、具有2個孔,且以使1個孔及另1個孔於前述各導電體上相面對的方式被配置的板狀之絕緣基材、以及以覆蓋前述絕緣基材之至少一部分的方式被填充的放電間隙填充構件之靜電放電保護體, One of the states of the electrostatic discharge protector of the present invention A plate-shaped insulating base having two conductors disposed at a predetermined interval and having two holes and having one hole and the other hole facing each other on the respective conductors And an electrostatic discharge protector of the discharge gap filling member filled to cover at least a portion of the insulating substrate,
前述絕緣基材係被配置成至少使成為前述各導電體之電極的部分露出之樣態且跨前述2個導電體,且,前述絕緣基材的前述2個孔係以前述放電間隙填充構件所覆蓋,於兩者最接近的部位形成放電間隙。 The insulating base material is disposed such that at least a portion of the electrode of each of the conductors is exposed and extends across the two conductors, and the two holes of the insulating base material are filled by the discharge gap filling member Covering, forming a discharge gap in the closest part of the two.
於上述樣態中之電極,係於上述2個導電體之絕緣基材所未覆蓋的部分。此外,上述2個孔彼此最為接近的地方之導電體間的距離,也就是說2個孔間之最短距離加上絕緣基材之厚度的2倍後之距離係成為放電間隙的寬度。前述放電間隙填充構件係形成於此放電間隙。也就是說,前述2個導電體係透過放電間隙填充構件而被連結。前述放電間隙填充構件係藉由上述放電間隙填充用組成物而形成。 The electrode in the above-described state is a portion which is not covered by the insulating base material of the above two conductors. Further, the distance between the conductors in the place where the two holes are closest to each other, that is, the distance between the shortest distance between the two holes and the thickness of the insulating base material is twice the width of the discharge gap. The discharge gap filling member is formed in the discharge gap. That is, the two conductive systems are connected to each other through the discharge gap filling member. The discharge gap filling member is formed by the above-described discharge gap filling composition.
本發明之靜電放電保護體係被使用來作為保護電路,該保護電路係用以使過電流流至接地以於靜電放電時保護裝置。 The electrostatic discharge protection system of the present invention is used as a protection circuit for flowing an overcurrent to the ground to protect the device during electrostatic discharge.
本發明之靜電放電保護體,由於具有將上述放電間隙填充用組成物填充於前述放電間隙所形成的放電間隙填充構件,因此一般作動時之絕緣性、作動電壓、耐電壓性優異。亦即,本發明之靜電放電保護體係可於一般 作動時之低的電壓時,展現高的電性電阻值,且不使電流流至接地而供給至裝置。另一方面,靜電放電產生後,係可立刻展現低的電阻抗值,使過電流流至接地,而阻止過電流被供給至裝置。靜電放電之過渡現象消除後,係可返回高的電阻值,而將電流供給至裝置。 Since the electrostatic discharge protector of the present invention has a discharge gap filling member formed by filling the discharge gap filling composition in the discharge gap, it is excellent in insulation, operating voltage, and withstand voltage at the time of normal operation. That is, the electrostatic discharge protection system of the present invention can be used in general When the voltage is low at the time of actuation, a high electrical resistance value is exhibited, and the current is not supplied to the ground and supplied to the device. On the other hand, after the electrostatic discharge is generated, the low electrical resistance value can be immediately exhibited, so that the overcurrent flows to the ground, and the overcurrent is prevented from being supplied to the device. After the transient phenomenon of electrostatic discharge is eliminated, the high resistance value can be returned and the current is supplied to the device.
此外,本發明之靜電放電保護體,係於2個電極間的放電間隙填充具有絕緣性之黏合劑成分(B)的放電間隙填充用組成物,因此於一般作動時不會發生洩漏電流。例如,變得能夠將於2個電極間施加DC 10V以下的電壓後之電阻抗值設為1010Ω以上,而可實現靜電放電保護。 Further, in the electrostatic discharge protector of the present invention, the discharge gap between the two electrodes is filled with the discharge gap filling composition of the insulating binder component (B), so that leakage current does not occur during normal operation. For example, it is possible to set an electrical impedance value of 10 10 Ω or more after applying a voltage of DC 10 V or less between two electrodes, thereby achieving electrostatic discharge protection.
本發明之靜電放電保護體,係可藉由使用上述之放電間隙填充用組成物,以下述的方式形成放電間隙填充構件而進行製造。 The electrostatic discharge protector of the present invention can be produced by forming the discharge gap filling member in the following manner by using the above-described discharge gap filling composition.
亦即,首先利用上述方法來調製放電間隙填充用組成物。以使覆蓋成為放電間隙的2個電極間或2個孔間的方式,利用灌封或網版印刷等方法來塗佈該放電間隙填充用組成物,並因應需要進行加熱,使其固化或硬化而形成放電間隙填充構件。 That is, first, the discharge gap filling composition is prepared by the above method. The discharge gap filling composition is applied by a method such as potting or screen printing so as to cover between the two electrodes or the two holes which are the discharge gaps, and is heated or hardened as necessary. A discharge gap filling member is formed.
前述放電間隙的寬度係以300μm以上且1mm以下者為佳,以400μm以上且1mm以下為更佳,600μm以上且800μm以下又更佳。放電間隙的寬度超過1mm時,會有靜電放電時之作動性降低的傾向。此外,未達300μm時,會有難以恢復靜電放電後之絕緣性的情況,而 有性能不均的傾向。在此,放電間隙的寬度係意味著電極間之最短距離,於放電間隙間存在本申請案之放電間隙填充用組成物的情況係意味著電流經由此流動時之最短的距離。此外,於放電間隙間介存有導電性不同者,且僅將導電性相對良好的部分導通的情況中,放電間隙的寬度係意味著此導通之路徑的最短距離。 The width of the discharge gap is preferably 300 μm or more and 1 mm or less, more preferably 400 μm or more and 1 mm or less, and still more preferably 600 μm or more and 800 μm or less. When the width of the discharge gap exceeds 1 mm, the operability at the time of electrostatic discharge tends to decrease. In addition, when it is less than 300 μm, it may be difficult to restore the insulation after electrostatic discharge, and There is a tendency to have uneven performance. Here, the width of the discharge gap means the shortest distance between the electrodes, and the case where the discharge gap filling composition of the present application exists between the discharge gaps means the shortest distance through which the current flows. Further, in the case where a difference in conductivity exists between the discharge gaps and only a portion having a relatively good conductivity is turned on, the width of the discharge gap means the shortest distance of the path of the conduction.
靜電放電保護體之較佳的電極形狀,雖可與電路基板的狀態相配合而任意地設定,但於考慮到小型化的情況中,可例示剖面形狀為矩形型的膜狀,且例如厚度20~200μm的形狀。 The preferred electrode shape of the electrostatic discharge protector can be arbitrarily set in accordance with the state of the circuit board. However, in consideration of miniaturization, a cross-sectional shape of a rectangular film may be exemplified, for example, a thickness of 20 ~200μm shape.
靜電放電保護體之較佳的電極寬度係300μm以上。若為前述範圍則可分散靜電放電時之損害。 A preferred electrode width of the electrostatic discharge protector is 300 μm or more. If it is in the above range, the damage at the time of electrostatic discharge can be dispersed.
本發明之靜電放電保護體係以於前述放電間隙填充構件的表面形成有保護層者為佳。 It is preferable that the electrostatic discharge protection system of the present invention has a protective layer formed on the surface of the discharge gap filling member.
上述之放電間隙填充用組成物,係依據設有放電間隙的基材之材質而有與基材之密著性不充分,或靜電放電為非常高能量的情況,或有金屬粉末(A1)及鋁粉末(A2)的含量為高的情況。 The above-described discharge gap filling composition may have insufficient adhesion to the substrate depending on the material of the substrate having the discharge gap, or the electrostatic discharge may be extremely high energy, or may have metal powder (A1) and The content of the aluminum powder (A2) is high.
即使於上述的情況中,本發明之靜電放電保護體若於形成放電間隙填充構件之後,以覆蓋此放電間隙填充構件的方式來設置後述之樹脂組成物等之保護層,也可賦予更高電壓耐性,維持優異的反覆耐性。 In the above-described case, the electrostatic discharge protector of the present invention can provide a higher voltage by providing a protective layer such as a resin composition to be described later so as to cover the discharge gap filling member after forming the discharge gap filling member. Resist and maintain excellent resistance to repeated resistance.
作為保護層使用的樹脂係可列舉:天然樹脂、改質樹脂或寡聚物合成樹脂等。 Examples of the resin used as the protective layer include a natural resin, a modified resin, and an oligomer synthetic resin.
天然樹脂係以松香為代表。改質樹脂係可列舉:松香衍生物、橡膠衍生物等。寡聚物合成樹脂係可列舉矽樹脂等,可列舉如與靜電放電保護體之聚矽氧烷化合物併用般之例如:環氧樹脂、丙烯酸樹脂、馬來酸衍生物、聚酯樹脂、三聚氰胺樹脂、胺甲酸酯樹脂、醯亞胺樹脂、醯胺酸樹脂、醯亞胺/醯胺樹脂等。 The natural resin is represented by rosin. Examples of the modified resin include rosin derivatives, rubber derivatives, and the like. Examples of the oligomer-based synthetic resin include an anthracene resin and the like, and examples thereof include an epoxy resin, an acrylic resin, a maleic acid derivative, a polyester resin, and a melamine resin in combination with a polyoxyalkylene compound of an electrostatic discharge protector. A urethane resin, a quinone imine resin, a phthalic acid resin, a quinone imine/melamine resin, or the like.
此外,可使用樹脂組成物作為保護層。 Further, a resin composition can be used as the protective layer.
前述樹脂組成物,為了保有其塗膜強度,以含有能夠利用熱或紫外線來硬化的硬化性樹脂為佳。 In order to retain the coating film strength, the resin composition preferably contains a curable resin which can be cured by heat or ultraviolet rays.
熱硬化性樹脂係可列舉:含有含羧基之胺甲酸酯樹脂、環氧化合物、或酸酐基、羧基、醇性基、胺基的化合物與環氧化合物之組合;含有羧基、醇性基、胺基的化合物與含有碳二醯亞胺的化合物之組合。 Examples of the thermosetting resin include a combination of a compound containing a carboxyl group-containing urethane resin, an epoxy compound, or an acid anhydride group, a carboxyl group, an alcohol group, and an amine group, and an epoxy compound; and a carboxyl group or an alcohol group; A combination of an amine group compound and a carbodiimide containing compound.
環氧化合物係可列舉雙酚A型環氧樹脂、氫化雙酚A型環氧樹脂、溴化雙酚A型環氧樹脂、雙酚F型環氧樹脂、酚醛清漆型環氧樹脂、苯酚酚醛清漆型環氧樹脂、甲酚酚醛清漆型環氧樹脂、脂環式環氧樹脂、N-縮水甘油型環氧樹脂、雙酚A之酚醛清漆型環氧樹脂、螯合型環氧樹脂、乙二醛型環氧樹脂、含胺基環氧樹脂、橡膠改質環氧樹脂、雙環戊二烯酚醛型環氧樹脂、聚矽氧改質環氧樹脂、ε-己內酯改質環氧樹脂等之一分子中具有2個以上環氧基之環氧化合物。 Examples of the epoxy compound include bisphenol A type epoxy resin, hydrogenated bisphenol A type epoxy resin, brominated bisphenol A type epoxy resin, bisphenol F type epoxy resin, novolac type epoxy resin, and phenol novolac. Varnish type epoxy resin, cresol novolac type epoxy resin, alicyclic epoxy resin, N-glycidyl epoxy resin, bisphenol A novolak type epoxy resin, chelating epoxy resin, B Dialdehyde type epoxy resin, amine-containing epoxy resin, rubber modified epoxy resin, dicyclopentadiene novolac type epoxy resin, polyfluorene modified epoxy resin, ε-caprolactone modified epoxy resin An epoxy compound having two or more epoxy groups in one molecule.
此外,為了賦予難燃性,亦可使用於該結構中導入有氯、溴等鹵素或磷等之原子的環氧化合物。進 而,亦可使用雙酚S型環氧樹脂、二縮水甘油丙二甲酸酯樹脂、雜環環氧樹脂、聯茬酚(bixylenol)型環氧樹脂、雙酚型環氧樹脂及四縮水甘油茬酚乙烷(xylenol ethane)樹脂等。 Further, in order to impart flame retardancy, an epoxy compound in which a halogen such as chlorine or bromine or an atom such as phosphorus is introduced into the structure may be used. Enter Alternatively, a bisphenol S type epoxy resin, a diglycidyl malonate resin, a heterocyclic epoxy resin, a bixylenol type epoxy resin, a bisphenol type epoxy resin, and a tetraglycidyl acid can also be used. An xylenol ethane resin or the like.
紫外線硬化性樹脂係可列舉:含有2個以上之乙烯性不飽和基的化合物之丙烯酸系共聚物、環氧(甲基)丙烯酸酯樹脂、胺甲酸酯(甲基)丙烯酸酯樹脂。 Examples of the ultraviolet curable resin include an acrylic copolymer containing a compound of two or more ethylenically unsaturated groups, an epoxy (meth) acrylate resin, and a urethane (meth) acrylate resin.
形成保護層之樹脂組成物,係可因應需要而含有硬化促進劑、填充劑、溶劑、發泡劑、消泡劑、整平劑、滑劑、可塑劑、防鏽劑、黏度調整劑、著色劑等。 The resin composition forming the protective layer may contain a hardening accelerator, a filler, a solvent, a foaming agent, an antifoaming agent, a leveling agent, a slip agent, a plasticizer, a rust preventive agent, a viscosity adjuster, and a coloring as needed. Agents, etc.
保護層的厚度雖無特別限定,但以0.1μm~1mm為佳。此外,保護層係以完全覆蓋藉由放電間隙填充用組成物所形成的放電間隙填充構件為佳。若於保護層有缺損,則在靜電放電時之高的能量下發生龜裂的可能性會提高。 The thickness of the protective layer is not particularly limited, but is preferably 0.1 μm to 1 mm. Further, the protective layer is preferably a discharge gap filling member formed by completely covering the composition for filling the gap gap. If the protective layer is defective, the possibility of cracking at high energy at the time of electrostatic discharge increases.
第1圖係顯示作為本發明之靜電放電保護體之一具體例的靜電放電保護體11之縱剖面圖。靜電放電保護體11係由電極12A、電極12B及放電間隙填充構件13所形成。電極12A及電極12B,係以使該軸方向一致,並使各別的前端面相對向的方式被配置。於電極12A及電極12B之相對向的端面間係形成有放電間隙14。放電間隙填充構件13,係形成於放電間隙14,進一步以使從上側覆蓋電極12A之與電極12B的前端面相對向之部分的前端面、及電極12B之與電極12A的前端面相對向 之部分的前端面之方式,接觸此等之前端部地作設置。放電間隙14的寬度,亦即彼此相對向的電極12A與電極12B之前端面間的距離,係以300μm以上且1mm以下為佳。 Fig. 1 is a longitudinal sectional view showing an electrostatic discharge protector 11 as a specific example of the electrostatic discharge protector of the present invention. The electrostatic discharge protector 11 is formed of the electrode 12A, the electrode 12B, and the discharge gap filling member 13. The electrode 12A and the electrode 12B are arranged such that the axial directions are aligned and the respective distal end faces are opposed to each other. A discharge gap 14 is formed between the opposing end faces of the electrode 12A and the electrode 12B. The discharge gap filling member 13 is formed in the discharge gap 14, and further faces the front end surface of the electrode 12A facing the front end surface of the electrode 12B and the front end surface of the electrode 12B facing the electrode 12A. The front end face of the part is placed in contact with the front end. The width of the discharge gap 14, that is, the distance between the electrode 12A facing each other and the front end surface of the electrode 12B is preferably 300 μm or more and 1 mm or less.
第2圖係顯示作為本發明之靜電放電保護體之其他具體例的靜電放電保護體21之縱剖面圖。靜電放電保護體21係由電極22A、電極22B及放電間隙填充構件23所形成。電極22A及電極22B,係以使彼此平行地在垂直方向重疊各別的前端面之方式被配置。於電極22A及電極22B在垂直方向重疊的部分係形成有放電間隙24。放電間隙填充構件23係為剖面矩形狀,且形成於放電間隙24。放電間隙24的寬度,亦即電極22A及電極22B在垂直方向重疊的部分之電極22A與電極22B之距離,係以300μm以上且1mm以下為佳。 Fig. 2 is a longitudinal sectional view showing an electrostatic discharge protector 21 as another specific example of the electrostatic discharge protector of the present invention. The electrostatic discharge protector 21 is formed of an electrode 22A, an electrode 22B, and a discharge gap filling member 23. The electrode 22A and the electrode 22B are disposed so as to overlap the respective distal end faces in the vertical direction in parallel with each other. A discharge gap 24 is formed in a portion where the electrode 22A and the electrode 22B overlap in the vertical direction. The discharge gap filling member 23 has a rectangular cross section and is formed in the discharge gap 24 . The width of the discharge gap 24, that is, the distance between the electrode 22A and the electrode 22B in the portion where the electrode 22A and the electrode 22B overlap in the vertical direction is preferably 300 μm or more and 1 mm or less.
第3圖係顯示作為本發明之靜電放電保護體之一具體例的靜電放電保護體31之縱剖面圖。靜電放電保護體31係形成於例如由聚醯亞胺薄膜所構成的基材上,且由電極32A、電極32B、放電間隙填充構件33及保護層35所形成。電極32A及電極32B,係以使該軸方向一致,並使各別的前端面相對向的方式被配置。於電極32A及電極32B之相對向的端面間係形成有放電間隙34。放電間隙填充構件33,係形成於放電間隙34,進一步以使從上側覆蓋電極32A之與電極32B的前端面相對向之部分的前端面、及電極32B之與電極32A的前端面 相對向之部分的前端面之方式,接觸此等之前端部地作設置。放電間隙34的寬度,亦即彼此相對向的電極32A與電極32B之前端面間的距離,係以300μm以上且1mm以下為佳。 Fig. 3 is a longitudinal sectional view showing an electrostatic discharge protector 31 as a specific example of the electrostatic discharge protector of the present invention. The electrostatic discharge protector 31 is formed, for example, on a substrate made of a polyimide film, and is formed of an electrode 32A, an electrode 32B, a discharge gap filling member 33, and a protective layer 35. The electrode 32A and the electrode 32B are arranged such that the axial directions are aligned and the respective distal end faces are opposed to each other. A discharge gap 34 is formed between the opposing end faces of the electrode 32A and the electrode 32B. The discharge gap filling member 33 is formed in the discharge gap 34, and further has a front end surface which is opposed to the front end surface of the electrode 32B from the upper side cover electrode 32A, and a front end surface of the electrode 32B and the electrode 32A. The way to the front end face of the part is made to contact the front end. The width of the discharge gap 34, that is, the distance between the electrode 32A facing each other and the front end surface of the electrode 32B is preferably 300 μm or more and 1 mm or less.
第4圖係表示本發明之靜電放電保護體41的一具體例,第5圖係顯示於第4圖之本發明之靜電放電保護體41的虛線部位之靜電縱剖面圖。靜電放電保護體41,係由例如銅等之導電體42A及42B、例如玻璃環氧基板等之絕緣基材43、放電間隙填充構件44所構成。導電體42A與42B係隔開特定的間隔地被配置。絕緣基材43,係隔開特定的間隔地設置2個孔,以如第5圖所示般地跨導電體42A及42B,且以不覆蓋導電體42A及42B各自之整面的方式,且以使2個孔45A及45B分別載置於導電體42A及42B上的方式被配置。放電間隙填充構件44,係阻塞絕緣基材43之2個孔45A及45B,且形成於絕緣基材43上,通過該2個孔而來與導電體42A及42B連接。從導電體42A及42B之絕緣基材43所溢出的部分會成為電極。於絕緣基材43的2個孔中彼此最為接近的部位之間隔加上絕緣基材之厚度的2倍後之距離46係成為此時之放電間隙的寬度,此係以300μm以上且1mm以下者為佳。 Fig. 4 is a view showing a specific example of the electrostatic discharge protector 41 of the present invention, and Fig. 5 is an electrostatic longitudinal sectional view showing a broken line portion of the electrostatic discharge protector 41 of the present invention shown in Fig. 4. The electrostatic discharge protector 41 is composed of, for example, conductors 42A and 42B such as copper, an insulating base material 43 such as a glass epoxy substrate, and a discharge gap filling member 44. The conductors 42A and 42B are arranged at a specific interval. The insulating base material 43 is provided with two holes at a predetermined interval, and spans the conductors 42A and 42B as shown in FIG. 5, and does not cover the entire surfaces of the conductors 42A and 42B, and The two holes 45A and 45B are placed on the conductors 42A and 42B, respectively. The discharge gap filling member 44 blocks the two holes 45A and 45B of the insulating base material 43 and is formed on the insulating base material 43 and is connected to the conductors 42A and 42B through the two holes. The portion overflowing from the insulating base material 43 of the conductors 42A and 42B becomes an electrode. The distance between the portions closest to each other in the two holes of the insulating base material 43 and the distance 46 between the thicknesses of the insulating base materials are the widths of the discharge gaps at this time, and the thickness is 300 μm or more and 1 mm or less. It is better.
如上所述,由放電間隙與放電間隙填充用組成物所形成的放電間隙填充構件,係可並不一定要存在於同一的基板。例如,如IC晶片搭載用基板般,即使於絕 緣性基材以300μm~1000μm的間隔製成2個孔,以使阻塞各孔的方式來將2枚銅箔板接著的情況中,若如跨2個孔般地於絕緣性基材填充放電間隙填充用組成物亦會成為靜電放電保護體。 As described above, the discharge gap filling member formed of the discharge gap and the discharge gap filling composition does not necessarily have to be present on the same substrate. For example, if the substrate for IC chip mounting is used, even if it is absolutely The edge substrate is formed into two holes at intervals of 300 μm to 1000 μm so that two copper foil sheets are subsequently joined in such a manner as to block the respective holes, and if the insulating substrate is filled and discharged as in the case of two holes, The gap filling composition also becomes an electrostatic discharge protector.
本發明之電子電路基板係具有上述之靜電放電保護體。因而,本發明之電子電路基板,係即使受到靜電放電,也會有變得不易受到因靜電所導致的破壞之傾向。 The electronic circuit board of the present invention has the above-described electrostatic discharge protector. Therefore, the electronic circuit board of the present invention tends to be less susceptible to damage due to static electricity even when subjected to electrostatic discharge.
此外,本發明之可撓性電子電路基板係具有上述之靜電放電保護體。因而,本發明之可撓性電子電路基板,係即使受到靜電放電,也會有變得不易受到因靜電所導致的破壞之傾向。本發明之IC晶片搭載用基板係具有上述之靜電放電保護體。因而,本發明之IC晶片搭載用基板,係即使受到靜電放電,也會有變得不易受到因靜電所導致的破壞之傾向,因此可適用於智慧卡、BGA、CSP、COB。 Further, the flexible electronic circuit board of the present invention has the above-described electrostatic discharge protector. Therefore, the flexible electronic circuit board of the present invention tends to be less susceptible to damage due to static electricity even when subjected to electrostatic discharge. The IC wafer mounting substrate of the present invention has the above-described electrostatic discharge protector. Therefore, the IC wafer mounting substrate of the present invention tends to be less susceptible to damage due to static electricity even when subjected to electrostatic discharge, and thus can be applied to smart cards, BGAs, CSPs, and COBs.
本發明之電子機器,係具有前述電子電路基板、前述可撓性電子電路基板或IC晶片搭載用基板。因而,本發明之電子機器,係即使受到靜電放電,也會有變得不易受到因靜電所導致的破壞之傾向。 The electronic device of the present invention includes the electronic circuit board, the flexible electronic circuit board, or the IC chip mounting board. Therefore, the electronic device of the present invention tends to be less susceptible to damage due to static electricity even when subjected to electrostatic discharge.
接著針對本發明雖顯示實施例來進一步具體 地說明,但本發明並不因此等而受到限定。 Next, the embodiment of the present invention is shown to further detail It is to be noted that the invention is not limited thereby.
如下所述般地評估本實施例所得到的靜電放電保護體之各特性。 The respective characteristics of the electrostatic discharge protector obtained in the present example were evaluated as described below.
針對靜電放電保護體之兩端的電極部,使用絕緣電阻計「MEGOHMMETER SM-8220」(DKK-TOA CORPORATION製),來測量出施加DC 10V時之電阻作為「一般作動時之電阻」。依據該測量值,利用以下的基準來評估出靜電放電保護體之一般作動電壓時的絕緣性。 For the electrode portions at both ends of the electrostatic discharge protector, an electric resistance meter "MEGOHMMETER SM-8220" (manufactured by DKK-TOA CORPORATION) was used to measure the electric resistance when DC 10 V was applied as "resistance during normal operation". Based on the measured value, the insulation at the normal operating voltage of the electrostatic discharge protector was evaluated using the following criteria.
A:表示電阻抗值為1010Ω以上 A: indicates that the electrical impedance is 10 10 Ω or more.
B:表示電阻抗值未達1010Ω B: indicates that the electrical impedance value is less than 10 10 Ω
使用半導體靜電測試器ESS-6008(NOISE LABORATORY公司製),對於所得到的靜電放電保護體,最初進行500V之施加,每次提高50V施加電壓進行電流測量,測量出放電電流流通後的施加電壓作為「作動電壓」。以最初的500V之施加計測出放電電流後,將作動電壓設為500V。 Using the semiconductor electrostatic tester ESS-6008 (manufactured by NOISE LABORATORY Co., Ltd.), the obtained electrostatic discharge protector was first applied at 500 V, and the applied voltage was increased by 50 V every time, and the applied voltage after the discharge current was passed was measured. "Operation voltage". After the discharge current was measured by the first 500 V application, the actuation voltage was set to 500V.
將靜電放電保護體安裝於半導體用靜電測試器ESS-6008(NOISE LABORATORY公司製),賦予8kV的施加電壓後,使用絕緣電阻計MEGOHMMETER SM-8220,來測量出施加DC 10V時之電阻值。利用以下的基準評估該電阻值作為「耐電壓性」。 The electrostatic discharge protector was attached to a semiconductor static tester ESS-6008 (manufactured by NOISE LABORATORY Co., Ltd.), and after applying an applied voltage of 8 kV, an insulation resistance meter MEGOHMMETER SM-8220 was used to measure the resistance value when DC 10 V was applied. The resistance value was evaluated as "withstand voltage" by the following criteria.
A:即使施加10次以上之後亦顯示1010Ω以上 A: 10 10 Ω or more is displayed even after 10 or more applications
B:若施加5~9次,則顯示未達105Ω B: If it is applied 5~9 times, it shows that it is less than 10 5 Ω.
B:若施加2~4次,則顯示未達108Ω B: If it is applied 2~4 times, it shows that it is less than 10 8 Ω.
B:若施加1次,則顯示未達108Ω B: If applied once, the display is less than 10 8 Ω
於本實施例中之測量值係利用以下的方法來測量。 The measured values in this embodiment were measured by the following methods.
於本說明書中之各數值係依據下述測量方法所求出的值。 Each numerical value in the present specification is a value obtained by the following measurement method.
利用累積50質量%徑來評估,該累積50質量%徑係秤量50mg之樣品,添加於50mL之蒸餾水,進一步加入2%之Triton(GE Healthcare Bio-Sciences股份有限公司製之界面活性劑的商品名)水溶液0.2ml,以輸出150W之超音波均質機進行分散3分鐘後,利用雷射繞射式粒度分布計,例如雷射繞射式光散射粒度分布計(商標:MICROTRACK MT3300、日機裝公司製)進行測量所得。 The accumulated 50% by mass diameter was used to evaluate 50 mg of the sample, and 50 mg of the sample was added to 50 mL of distilled water, and 2% of Triton (trade name of surfactant prepared by GE Healthcare Bio-Sciences Co., Ltd.) was further added. 0.2ml of aqueous solution, dispersed by a 150W ultrasonic homogenizer for 3 minutes, using a laser diffraction type particle size distribution meter, such as a laser diffraction type light scattering particle size distribution meter (trademark: MICROTRACK MT3300, Nikkiso Co., Ltd. Measured.
以凝膠滲透層析法來進行測量,且以聚苯乙烯換算所得之值來表示。 The measurement was carried out by gel permeation chromatography and expressed in terms of polystyrene.
依據JISK5407進行測量。 The measurement was performed in accordance with JIS K5407.
秤量1g之樣品,添加3g之丙二醇單甲基醚,以輸出150W之超音波均質機進行分散3分鐘後,添加10g之丙烯酸樹脂(商品名ACRIC # 2000 KANSAI PAINT CO.,LTD.製)進行攪拌,塗佈於醯亞胺薄膜,在150℃下5分鐘使其硬化。利用掃描型電子顯微鏡(商標:JSM-5500LV、日本電子製)以1000~2000倍觀察該硬化物的剖面,測量任意選出的10個一次粒子之最長軸(長邊)的長度(L)與最短軸(短邊)的長度(d),而評估出平均長寬比(L/d)。 A sample of 1 g was weighed, and 3 g of propylene glycol monomethyl ether was added thereto, and the mixture was dispersed for 3 minutes in an ultrasonic homogenizer outputting 150 W, and then 10 g of an acrylic resin (trade name: ACRIC #2000 KANSAI PAINT CO., LTD.) was added for stirring. It was coated on a quinone film and hardened at 150 ° C for 5 minutes. The cross section of the cured product was observed by a scanning electron microscope (trademark: JSM-5500LV, manufactured by JEOL Ltd.) at 1000 to 2000 times, and the length (L) and the shortest length (L) of the longest axis (long side) of any of the selected 10 primary particles were measured. The length (d) of the axis (short side) is evaluated for the average aspect ratio (L/d).
實施例所使用的靜電放電保護體C1~C11係以下述方式製造。 The electrostatic discharge protectors C1 to C11 used in the examples were produced in the following manner.
於在膜厚25μm之聚醯亞胺薄膜上形成有一對的電極圖型(膜厚12μm、電極寬度2mm)的配線基板,使用針頭尖端直徑2mm且平坦的針來塗佈實施例所得到 的各放電間隙填充用組成物,跨電極圖型地填充於放電間隙,在150℃之恆溫器內保持60分鐘而形成放電間隙填充構件以製成靜電放電保護體。 A wiring board having a pair of electrode patterns (film thickness: 12 μm, electrode width: 2 mm) was formed on a polyimide film having a thickness of 25 μm, and was coated with a needle having a needle tip diameter of 2 mm and a flat needle. Each of the discharge gap filling compositions was filled in the discharge gap pattern across the electrode pattern, and held in a thermostat at 150 ° C for 60 minutes to form a discharge gap filling member to form an electrostatic discharge protector.
作動電壓的評估所使用的靜電放電保護體,係製造出電極圖型之放電間隙的寬度為300μm、500μm及1mm者。 The electrostatic discharge protector used for the evaluation of the operating voltage was such that the width of the discharge gap of the electrode pattern was 300 μm, 500 μm, and 1 mm.
實施例所使用的靜電放電保護體D1~D11係以下述方式製造。 The electrostatic discharge protectors D1 to D11 used in the examples were produced in the following manner.
於約15mm平方、厚度75μm的聚醯亞胺薄膜「UPILEX 75S宇部興產(股)製」,以0.5mm的間隔開設2個約3mm平方之四角的孔。準備2枚裁成約10mm平方的貼銅層合板,以使貼銅側朝向孔的方式,對於1個孔貼附1枚。2枚貼銅層合板係以彼此不接觸的方式設置。以跨聚醯亞胺薄膜的2個孔之方式,使用針頭尖端直徑2mm且平坦的針來塗佈實施例所得到的各放電間隙填充用組成物,在150℃之恆溫器內保持60分鐘而形成放電間隙填充構件,以製成具有第4圖或第5圖所顯示的結構之靜電放電保護體。 A polyimine film "UPILEX 75S Ube Industries, Ltd." having a thickness of about 15 mm and a thickness of 75 μm was provided with two holes of about 4 mm square at intervals of 0.5 mm. Two sheets of copper-clad laminates having a size of about 10 mm square were prepared so that one side of the hole was attached to one hole so that the copper-plated side faces the hole. Two copper-clad laminates are placed in such a way that they do not touch each other. Each of the discharge gap-filling compositions obtained in the examples was applied by using a needle having a needle tip diameter of 2 mm and a flat needle across the two holes of the polyimide film, and held in a thermostat at 150 ° C for 60 minutes. A discharge gap filling member is formed to form an electrostatic discharge protector having the structure shown in Fig. 4 or Fig. 5.
以如下所述之金屬烷氧化物之水解生成物所構成的膜來被覆該鋁粒子之表面。金屬烷氧化物係使用四乙氧矽 烷。 The surface of the aluminum particles is coated with a film composed of a hydrolysis product of a metal alkoxide as described below. Metal alkoxide is tetraethoxy oxime alkyl.
取76g之Showa Aluminum Powder公司製之薄片狀的鋁粒子(商品名:2173、固體成分65%、平均長寬比:68、平均粒徑:9μm),分散於724g之丙二醇單甲基醚。於此分散液中添加169g之離子交換水及32g之25質量%氨水,進行攪拌而得到鋁粉末漿體。將此鋁粉末漿體之液溫保持在30℃。 76 g of flaky aluminum particles (trade name: 2173, solid content: 65%, average aspect ratio: 68, average particle diameter: 9 μm) manufactured by Showa Aluminum Powder Co., Ltd. were dispersed in 724 g of propylene glycol monomethyl ether. To the dispersion, 169 g of ion-exchanged water and 32 g of 25 mass% aqueous ammonia were added and stirred to obtain an aluminum powder slurry. The liquid temperature of this aluminum powder slurry was maintained at 30 °C.
接著,以13.2g之丙二醇單甲基醚來稀釋13.2g之四乙氧矽烷。耗費12小時以特定速度將此稀釋液滴下至前述鋁粉末漿體中,進行以四乙氧矽烷之水解生成物所致之鋁粒子的表面被覆。 Next, 13.2 g of tetraethoxyoxane was diluted with 13.2 g of propylene glycol monomethyl ether. The dilution was dropped to the aluminum powder slurry at a specific speed for 12 hours to carry out surface coating of the aluminum particles by the hydrolysis product of tetraethoxyoxane.
滴下後係持續攪拌12小時,溫度係保持在30℃。其後,將該反應液過濾而得到鋁餅,進而,利用丙二醇單甲基醚來將所得到的鋁餅洗淨。將洗淨後的鋁餅再度分散於500g之丙二醇單甲基醚乙酸酯中,以110℃加熱90分鐘之後,放冷至室溫。然後,過濾該反應液而得到鋁餅。之後,在40℃下使溶劑飛散,作出鋁固體成分為含有41質量%之丙二醇單甲基醚乙酸酯的糊料(以下稱為「含鋁粉末糊料A1-1」)。 After the dropping, stirring was continued for 12 hours, and the temperature was maintained at 30 °C. Thereafter, the reaction liquid was filtered to obtain an aluminum cake, and the obtained aluminum cake was washed with propylene glycol monomethyl ether. The washed aluminum cake was again dispersed in 500 g of propylene glycol monomethyl ether acetate, and heated at 110 ° C for 90 minutes, and then allowed to cool to room temperature. Then, the reaction liquid was filtered to obtain an aluminum cake. Thereafter, the solvent was dispersed at 40 ° C to obtain a paste containing aluminum propylene glycol monomethyl ether acetate (hereinafter referred to as "aluminum-containing powder paste A1-1") having an aluminum solid content of 41% by mass.
針對固體成分的計算,係將以120℃經1小時讓1g所取出的糊料乾燥後的殘量除以乾燥前之糊料量者作為固體成分。另外,在40℃時之溶劑的飛散操作係確認固體成分成為41質量%後結束。 For the calculation of the solid content, the residue after drying 1 g of the removed paste at 120 ° C for 1 hour was divided by the amount of the paste before drying as a solid component. In addition, the scattering operation of the solvent at 40 ° C was completed after confirming that the solid content was 41% by mass.
使76g之Showa Aluminum Powder公司製之薄片狀的鋁粒子(商品名:2173、固體成分65%、平均長寬比:68、平均粒徑:9μm),及16.5g之四乙氧矽烷分散於400g之丙二醇單甲基醚,以110℃加熱2小時。將此分散液放冷至室溫後,添加180g之離子交換水及12g之25質量%氨水進行攪拌1小時。進而,添加360g之離子交換水與20g之氨水進行攪拌1小時後,將該反應液過濾而得到鋁餅,進一步,利用丙二醇單甲基醚來將所得到的鋁餅進行洗淨3次。將洗淨後的鋁餅再度分散於500g之三乙酸甘油酯,以110℃加熱90分鐘之後,放冷至室溫。其後,將該反應液過濾而得到鋁餅,進而,利用丙二醇單甲基醚乙酸酯來將所得到的鋁餅進行洗淨3次。之後,在40℃下使溶劑飛散,作出鋁固體成分為含有41質量%之丙二醇單甲基醚及水的糊料(以下稱為「含鋁粉末糊料A1-2」)。 76 g of flaky aluminum particles (trade name: 2173, solid content: 65%, average aspect ratio: 68, average particle diameter: 9 μm) manufactured by Showa Aluminum Powder Co., Ltd., and 16.5 g of tetraethoxy decane dispersed in 400 g Propylene glycol monomethyl ether was heated at 110 ° C for 2 hours. After the dispersion was allowed to cool to room temperature, 180 g of ion-exchanged water and 12 g of 25% by mass aqueous ammonia were added and stirred for 1 hour. Further, 360 g of ion-exchanged water and 20 g of aqueous ammonia were added and stirred for 1 hour, and then the reaction liquid was filtered to obtain an aluminum cake. Further, the obtained aluminum cake was washed three times with propylene glycol monomethyl ether. The washed aluminum cake was again dispersed in 500 g of triacetin, heated at 110 ° C for 90 minutes, and then allowed to cool to room temperature. Thereafter, the reaction liquid was filtered to obtain an aluminum cake, and the obtained aluminum cake was washed three times with propylene glycol monomethyl ether acetate. After that, the solvent was dispersed at 40 ° C to obtain a paste containing aluminum propylene glycol monomethyl ether and water (hereinafter referred to as "aluminum-containing powder paste A1-2") having an aluminum solid content of 41% by mass.
硬化劑添加前之黏合劑成分(B)係以下述的方式來合成熱硬化性胺甲酸酯樹脂。 The binder component (B) before the addition of the curing agent is a thermosetting urethane resin synthesized in the following manner.
於具備有攪拌裝置、溫度計、冷凝器的反應容器中,裝入718.2g之C-1015N(KURARAY CO.,LTD製聚碳酸酯二醇、原材料二醇莫耳比:1,9-壬二醇:2-甲基-1,8-辛二醇=15:85、分子量964)作為聚碳酸酯二 醇、136.6g之2,2-二羥甲基鄰苯二甲酸(日本化成股份有限公司製)作為具有羧基之二羥基化合物、以及1293g之二乙二醇乙基醚乙酸酯(DAICEL化學股份有限公司製)作為溶劑,以90℃來將所有的原料溶解。 In a reaction vessel equipped with a stirring device, a thermometer, and a condenser, 718.2 g of C-1015N (polycarbonate diol manufactured by KURARAY CO., LTD, raw material diol molar ratio: 1,9-nonanediol) was charged. : 2-methyl-1,8-octanediol = 15:85, molecular weight 964) as polycarbonate II Alcohol, 136.6 g of 2,2-dimethylol phthalic acid (manufactured by Nippon Kasei Co., Ltd.) as a dihydroxy compound having a carboxyl group, and 1293 g of diethylene glycol ethyl ether acetate (DAICEL Chemical Co., Ltd.) As a solvent, all the raw materials were dissolved at 90 °C.
將此原料溶解後之液的溫度降低至70℃,藉由滴下漏斗,耗費30分鐘滴下237.5g之亞甲基雙(4-環己基異氰酸酯)(Sumika Bayer Urethane Co.,Ltd.製、商品名「Desmodur-W」)作為聚異氰酸酯。 The temperature of the liquid in which the raw material was dissolved was lowered to 70 ° C, and 237.5 g of methylene bis(4-cyclohexyl isocyanate) (trade name, manufactured by Sumika Bayer Urethane Co., Ltd.) was dropped over 30 minutes by dropping the funnel. "Desmodur-W") as a polyisocyanate.
滴下結束後,以80℃進行反應1小時、以90℃進行反應1小時、以100℃進行反應1.5小時,確認了異氰酸酯約略消失後,滴下2.13g之異丁醇(和光純藥股份有限公司製),進一步以105℃進行反應1小時,得到含羧基胺甲酸酯樹脂(以下亦記述為「熱硬化性胺甲酸酯樹脂」)。 After the completion of the dropwise addition, the reaction was carried out at 80 ° C for 1 hour, at 90 ° C for 1 hour, and at 100 ° C for 1.5 hours. After the isocyanate was almost eliminated, 2.13 g of isobutanol was dropped (manufactured by Wako Pure Chemical Industries, Ltd.). Further, the reaction was further carried out at 105 ° C for 1 hour to obtain a carboxyl group-containing urethane resin (hereinafter also referred to as "thermosetting urethane resin").
所得到的熱硬化性胺甲酸酯樹脂之數量平均分子量為6090,固體成分酸價為40.0mgKOH/g。於所得到的熱硬化性胺甲酸酯樹脂中添加γ-丁內酯進行稀釋以使固體成分成為45質量%而得到溶液(以下亦記述為「熱硬化性胺甲酸酯樹脂溶液」)。 The thermosetting urethane resin obtained had a number average molecular weight of 6090 and a solid content acid value of 40.0 mgKOH/g. To the obtained thermosetting urethane resin, γ-butyrolactone was added and diluted to obtain a solid content of 45% by mass to obtain a solution (hereinafter also referred to as "thermosetting urethane resin solution").
添加48.8g之所調製出的含鋁粉末糊料A1-1(固體成分41質量%)、13.2g之Showa Aluminum Powder公司製 的薄片狀鋁粉末A2-1(商品名:576PS、平均粒徑:20μm、固體成分65質量%、平均長寬比:23)、37.8g之合成例所調製出的熱硬化性胺甲酸酯樹脂溶液(固體成分45質量%)、1.9g之作為硬化劑的Japan epoxy rasin公司製環氧樹脂(商品名:JER604),使用超音波均質機以2000rpm進行攪拌15分鐘,得到放電間隙填充用組成物1。 48.8 g of the aluminum-containing powder paste A1-1 (solid content: 41% by mass) and 13.2 g of Showa Aluminum Powder Co., Ltd. were prepared. The thermosetting urethane prepared by the synthesis example of the flaky aluminum powder A2-1 (trade name: 576PS, average particle diameter: 20 μm, solid content: 65 mass%, average aspect ratio: 23) and 37.8 g A resin solution (solid content: 45 mass%) and 1.9 g of an epoxy resin (trade name: JER604) manufactured by Japan epoxy rasin Co., Ltd. as a curing agent were stirred at 2000 rpm for 15 minutes using an ultrasonic homogenizer to obtain a discharge gap filling composition. Matter 1.
使用放電間隙填充用組成物1並以前述方法得到靜電放電保護體C1及靜電放電保護體D1,而評估出一般作動時之絕緣性、作動電壓、耐電壓性。將結果顯示於表1。 The discharge gap-filling composition 1 was used, and the electrostatic discharge protector C1 and the electrostatic discharge protector D1 were obtained by the above-described method, and the insulation, the operating voltage, and the withstand voltage at the time of normal operation were evaluated. The results are shown in Table 1.
添加48.8g之所調製出的含鋁粉末糊料A1-1(固體成分41質量%)、20.2g之Toyo Aluminum Powder公司製的球狀鋁粉末A2-2(商品名:08-0076、平均粒徑:6.8μm、固體成分99質量%、平均長寬比:1)、43.3g之合成例所調製出的熱硬化性胺甲酸酯樹脂溶液(固體成分45質量%)、及40g之丙二醇單甲基醚乙酸酯,並添加2.0g之JER604作為硬化劑,使用超音波均質機以2000rpm進行攪拌15分鐘,得到放電間隙填充用組成物2。 48.8 g of the aluminum-containing powder paste A1-1 (solid content: 41% by mass) and 20.2 g of spherical aluminum powder A2-2 manufactured by Toyo Aluminum Powder Co., Ltd. (trade name: 08-0076, average particle) were added. Diameter: 6.8 μm, solid content: 99% by mass, average aspect ratio: 1), 43.3 g of a thermosetting urethane resin solution prepared by a synthesis example (solid content: 45 mass%), and 40 g of propylene glycol Methyl ether acetate was added, and 2.0 g of JER604 was added as a curing agent, and the mixture was stirred at 2000 rpm for 15 minutes using an ultrasonic homogenizer to obtain a discharge gap filling composition 2.
添加48.8g之所調製出的含鋁粉末糊料A1-2(固體成分41質量%)、5.1g之大和金屬粉工業公司製的薄片狀鋁粉末A2-3(商品名:40、平均粒徑:65μm、固體成分99質量%、平均長寬比:10)、33.3g之合成例所調製出的熱硬化性胺甲酸酯樹脂溶液(固體成分45質量%)、及45g之三乙酸甘油酯,並添加1.7g之JER604作為硬化劑,使用超音波均質機以2000rpm進行攪拌15分鐘,得到放電間隙填充用組成物3。 48.8 g of the aluminum-containing powder paste A1-2 (solid content: 41% by mass), 5.1 g of the flaky aluminum powder A2-3 (trade name: 40, average particle diameter) 65 μm, solid content: 99% by mass, average aspect ratio: 10), 33.3 g of a thermosetting urethane resin solution prepared by a synthesis example (solid content: 45 mass%), and 45 g of triacetin 1.7 g of JER604 was added as a curing agent, and the mixture was stirred at 2000 rpm for 15 minutes using an ultrasonic homogenizer to obtain a discharge gap filling composition 3.
使用放電間隙填充用組成物3並以前述方法得到靜電放電保護體C3及靜電放電保護體D3,而評估出一般作動時之絕緣性、作動電壓、耐電壓性。將結果顯示於表1。 The discharge gap-filling composition 3 was used to obtain the electrostatic discharge protector C3 and the electrostatic discharge protector D3 by the above-described method, and the insulation, the operating voltage, and the withstand voltage at the time of normal operation were evaluated. The results are shown in Table 1.
添加48.8g之所調製出的含鋁粉末糊料A1-2(固體成分41質量%)、13.2g之Showa Aluminum Powder公司製的薄片狀鋁粉末A2-4(商品名:552N、平均粒徑:24μm、固體成分65質量%、平均長寬比:31)、37.8g之合成例所調製出的熱硬化性胺甲酸酯樹脂溶液(固體成分45質量%)、1.9g之作為硬化劑的JER604,使用超音波均質機以2000rpm進行攪拌15分鐘,得到放電間隙填充用組成物4。 48.8 g of the aluminum-containing powder paste A1-2 (solid content: 41% by mass) and 13.2 g of flaky aluminum powder A2-4 manufactured by Showa Aluminum Powder Co., Ltd. (trade name: 552 N, average particle diameter: 24 μm, solid content: 65 mass%, average aspect ratio: 31), 37.8 g of a thermosetting urethane resin solution prepared by a synthesis example (solid content: 45 mass%), and 1.9 g of JER604 as a curing agent The mixture was stirred at 2000 rpm for 15 minutes using an ultrasonic homogenizer to obtain a discharge gap filling composition 4.
使用放電間隙填充用組成物4並以前述方法得到靜電放電保護體C4及靜電放電保護體D4,而評估出一般作動時之絕緣性、作動電壓、耐電壓性。將結果顯示於表1。 The discharge gap filling composition 4 was used, and the electrostatic discharge protector C4 and the electrostatic discharge protector D4 were obtained by the above-described method, and the insulation, the operating voltage, and the withstand voltage at the time of normal operation were evaluated. The results are shown in Table 1.
添加48.8g之所調製出的含鋁粉末糊料A1-1(固體成分41質量%)、13.2g之Showa Aluminum Powder公司製的薄片狀鋁粉末A2-5(商品名:205N、平均粒徑:6μm、固體成分65質量%、平均長寬比:17)、37.8g之合成例所調製出的熱硬化性胺甲酸酯樹脂溶液(固體成分45質量%)、1.9g之作為硬化劑的JER604,使用超音波均質機以2000rpm進行攪拌15分鐘,得到放電間隙填充用組成物5。 48.8 g of the aluminum-containing powder paste A1-1 (solid content: 41% by mass) and 13.2 g of flaky aluminum powder A2-5 manufactured by Showa Aluminum Powder Co., Ltd. (trade name: 205 N, average particle diameter: 6 μm, solid content: 65 mass%, average aspect ratio: 17), 37.8 g of a thermosetting urethane resin solution prepared by a synthesis example (solid content: 45 mass%), and 1.9 g of JER604 as a curing agent The mixture was stirred at 2000 rpm for 15 minutes using an ultrasonic homogenizer to obtain a discharge gap filling composition 5.
使用放電間隙填充用組成物5並以前述方法得到靜電放電保護體C5及靜電放電保護體D5,而評估出一般作動時之絕緣性、作動電壓、耐電壓性。將結果顯示於表1。 The discharge gap-filling composition 5 was used, and the electrostatic discharge protector C5 and the electrostatic discharge protector D5 were obtained by the above-described method, and the insulation, the operating voltage, and the withstand voltage at the time of normal operation were evaluated. The results are shown in Table 1.
添加48.8g之所調製出的含鋁粉末糊料A1-1(固體成分41質量%)、13.2g之Showa Aluminum Powder公司製的薄片狀鋁粉末A2-6(商品名:SL850、平均粒徑:23μm、固體成分65質量%、平均長寬比:28)、37.8g之合成例所調製出的熱硬化性胺甲酸酯樹脂溶液(固體成分45質量%)、1.9g之作為硬化劑的JER604,使用超音波均質機以2000rpm進行攪拌15分鐘,得到放電間隙填充用組成物6。 48.8 g of the aluminum-containing powder paste A1-1 (solid content: 41% by mass) and 13.2 g of flaky aluminum powder A2-6 manufactured by Showa Aluminum Powder Co., Ltd. (trade name: SL850, average particle diameter: 23 μm, solid content: 65 mass%, average aspect ratio: 28), 37.8 g of a thermosetting urethane resin solution prepared by a synthesis example (solid content: 45 mass%), and 1.9 g of JER604 as a curing agent The mixture was stirred at 2000 rpm for 15 minutes using an ultrasonic homogenizer to obtain a discharge gap filling composition 6.
使用放電間隙填充用組成物6並以前述方法得到靜電放電保護體C6及靜電放電保護體D6,而評估出一般作動時之絕緣性、作動電壓、耐電壓性。將結果顯示於表1。 The discharge gap-filling composition 6 was used to obtain the electrostatic discharge protector C6 and the electrostatic discharge protector D6 by the above-described method, and the insulation, the operating voltage, and the withstand voltage at the time of normal operation were evaluated. The results are shown in Table 1.
添加48.8g之所調製出的含鋁粉末糊料A1-1(固體成分41質量%)、13.2g之Showa Aluminum Powder公司製的薄片狀鋁粉末A2-7(商品名:LB582、平均粒徑:23μm、固體成分65質量%、平均長寬比:9)、37.8g之合成例所調製出的熱硬化性胺甲酸酯樹脂溶液(固體成分45質量%)、1.9g之作為硬化劑的JER604,使用超音波均質機以2000rpm進行攪拌15分鐘,得到放電間隙填充用組成物7。 48.8 g of the aluminum-containing powder paste A1-1 (solid content: 41% by mass) and 13.2 g of flaky aluminum powder A2-7 manufactured by Showa Aluminum Powder Co., Ltd. (trade name: LB582, average particle diameter: 23 μm, solid content: 65 mass%, average aspect ratio: 9), 37.8 g of a thermosetting urethane resin solution prepared by a synthesis example (solid content: 45 mass%), and 1.9 g of JER604 as a curing agent The mixture was stirred at 2000 rpm for 15 minutes using an ultrasonic homogenizer to obtain a discharge gap filling composition 7.
使用放電間隙填充用組成物7並以前述方法得到靜電放電保護體C7及靜電放電保護體D7,而評估出一般作動時之絕緣性、作動電壓、耐電壓性。將結果顯示於表1。 The discharge gap-filling composition 7 was used to obtain the electrostatic discharge protector C7 and the electrostatic discharge protector D7 by the above-described method, and the insulation, the operating voltage, and the withstand voltage at the time of normal operation were evaluated. The results are shown in Table 1.
不添加Showa Aluminum Powder公司製的薄片狀鋁粉末(商品名:576PS、平均粒徑:20μm、固體成分65質量%、平均長寬比:23),僅使用有69.7g之含鋁粉末糊料A1-1,除此之外,以與實施例1相同的方式得到放電間隙填充用組成物8。 No flaky aluminum powder (trade name: 576PS, average particle diameter: 20 μm, solid content: 65 mass%, average aspect ratio: 23) manufactured by Showa Aluminum Powder Co., Ltd. was used, and only 69.7 g of the aluminum-containing powder paste A1 was used. A discharge gap filling composition 8 was obtained in the same manner as in Example 1 except for the above.
使用放電間隙填充用組成物8並以前述方法得到靜電 放電保護體C8及靜電放電保護體D8,而評估出一般作動時之絕緣性、作動電壓、耐電壓性。將結果顯示於表1。 The composition 8 is filled with a discharge gap and static electricity is obtained by the aforementioned method. The discharge protector C8 and the electrostatic discharge protector D8 were used to evaluate the insulation, the operating voltage, and the withstand voltage at the time of normal operation. The results are shown in Table 1.
不添加含鋁粉末糊料A1-1,僅使用有44.4g之Showa Aluminum Powder公司製的薄片狀鋁粉末A2-1(商品名:576PS、平均粒徑:20μm、固體成分65質量%、平均長寬比:23),除此之外,以與實施例1相同的方式得到放電間隙填充用組成物9。 No aluminum powder paste A1-1 was added, and only 44.4 g of flaky aluminum powder A2-1 manufactured by Showa Aluminum Powder Co., Ltd. (trade name: 576 PS, average particle diameter: 20 μm, solid content: 65 mass%, average length) was used. A discharge gap filling composition 9 was obtained in the same manner as in Example 1 except that the width ratio: 23).
使用放電間隙填充用組成物9並以前述方法得到靜電放電保護體C9及靜電放電保護體D9,而評估出一般作動時之絕緣性、作動電壓、耐電壓性。將結果顯示於表1。 The discharge gap-filling composition 9 was used, and the electrostatic discharge protector C9 and the electrostatic discharge protector D9 were obtained by the above-described method, and the insulation, the operating voltage, and the withstand voltage at the time of normal operation were evaluated. The results are shown in Table 1.
使用有17.2g之NIKKO RICA(股)製之釘狀鎳粉末A2-8(商品名:鎳粉末# 123、平均粒徑:5μm、固體成分99質量%、平均長寬比:1)取代薄片狀鋁粉末,除此之外,以與實施例1相同的方式得到放電間隙填充用組成物10。 In place of the flaky shape, a nail-shaped nickel powder A2-8 (trade name: nickel powder #123, average particle diameter: 5 μm, solid content 99% by mass, average aspect ratio: 1) made of 17.2 g of NIKKO RICA (stock) was used. A discharge gap filling composition 10 was obtained in the same manner as in Example 1 except for the aluminum powder.
使用放電間隙填充用組成物10並以前述方法得到靜電放電保護體C10及靜電放電保護體D10,而評估出一般作動時之絕緣性、作動電壓、耐電壓性。將結果顯示於表1。 The electrostatic discharge protector C10 and the electrostatic discharge protector D10 were obtained by the above-described method using the discharge gap-filling composition 10, and the insulation, the operating voltage, and the withstand voltage at the time of normal operation were evaluated. The results are shown in Table 1.
得到不將放電間隙填充用組成物填充於放電間隙的靜電放電保護體C11及靜電放電保護體D11,而評估出一般作動時之絕緣性、作動電壓、耐電壓性。將結果顯示於表1。 The electrostatic discharge protector C11 and the electrostatic discharge protector D11 in which the discharge gap filling composition was not filled in the discharge gap were obtained, and the insulation, the operating voltage, and the withstand voltage at the time of normal operation were evaluated. The results are shown in Table 1.
表中之A1/A2及(A1+A2)/黏合劑成分(B)係表示質量比。另外,黏合劑成分(B)係含有硬化劑。 The A1/A2 and (A1+A2)/binder components (B) in the table represent the mass ratio. Further, the binder component (B) contains a curing agent.
依據表1的結果可知:若摻合金屬的一次粒子之表面被金屬烷氧化物之水解生成物所被覆的金屬粉末(A1)作為放電間隙填充用組成物,則保有一般作動時之絕緣性(參照實施例1~7、比較例1及比較例3)。實施例1~7係藉由於以金屬烷氧化物之水解生成物所被覆的金屬粒子(A1)中混合鋁粉末(A2),即使形成具有300μm以上的放電間隙距離之靜電放電保護體作動性亦優 異,特別是於實施例1與實施例3~7中,由於鋁粉末(A2)的形狀為薄片狀,因此能夠更提昇作動性,且降低作動電壓。此外,鋁粉末(A2)之平均粒徑為更佳的範圍之實施例1、實施例4、實施例6及實施例7,係可進一步賦予耐電壓性。 According to the results of Table 1, it is understood that the metal powder (A1) coated with the metal alkoxide hydrolyzed product on the surface of the metal-doped primary particles serves as a discharge gap-filling composition, and the insulation during general operation is maintained ( Reference Examples 1 to 7, Comparative Example 1, and Comparative Example 3). In the examples 1 to 7, the aluminum powder (A2) is mixed with the metal particles (A1) coated with the hydrolyzate of the metal alkoxide, and the electrostatic discharge protector having a discharge gap distance of 300 μm or more is also actuated. excellent In particular, in the first embodiment and the third to seventh embodiments, since the aluminum powder (A2) has a sheet shape, the actuation efficiency can be further improved and the operating voltage can be lowered. Further, in Example 1, Example 4, Example 6, and Example 7 in which the average particle diameter of the aluminum powder (A2) is in a more preferable range, the withstand voltage can be further imparted.
可得知:不含有鋁粉末(A2)的比較例1及比較例3,雖保有一般作動時之絕緣性,但於放電間隙的寬度為1mm的情況中,變成與不形成靜電放電保護體的比較例4之情況相同的作動電壓,無法發揮效果。判斷出:比較例2,由於不含有金屬的一次粒子之表面被金屬烷氧化物之水解生成物所絕緣被覆的金屬粉末(A1),因此不僅一般作動時之絕緣性降低,耐電壓性亦顯著劣化,而不發揮作為靜電放電保護體的功能。 It can be seen that Comparative Example 1 and Comparative Example 3, which do not contain the aluminum powder (A2), have insulation properties during normal operation, but when the width of the discharge gap is 1 mm, the electrostatic discharge protector is not formed. In the case of Comparative Example 4, the same operating voltage was not effective. It is judged that, in Comparative Example 2, since the surface of the primary particle which does not contain a metal is covered with the metal powder (A1) which is infiltrated by the hydrolyzed product of the metal alkoxide, the insulation is not deteriorated in general operation, and the withstand voltage is remarkable. Degraded without functioning as an electrostatic discharge protector.
藉由使用含有:金屬的一次粒子之表面被以由金屬烷氧化物之水解生成物所構成的膜所被覆之金屬粉末(A1)、未被由金屬烷氧化物之水解生成物所構成的膜所被覆的鋁粉末(A2)、以及黏合劑成分(B)的放電間隙填充用組成物,而可得到以低成本且自由度高、作動性優異的靜電放電保護體。 A metal powder (A1) coated with a film composed of a metal alkoxide hydrolyzate, and a film not composed of a metal alkoxide hydrolyzed product, by using a surface of a primary particle containing a metal: The discharge gap filling composition of the coated aluminum powder (A2) and the binder component (B) can provide an electrostatic discharge protector which is low in cost, high in freedom, and excellent in workability.
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