TW201409487A - Conductive compositions containing Li2RuO3 and ion-exchanged Li2RuO3 and their use in the manufacture of semiconductor devices - Google Patents

Conductive compositions containing Li2RuO3 and ion-exchanged Li2RuO3 and their use in the manufacture of semiconductor devices Download PDF

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TW201409487A
TW201409487A TW101130780A TW101130780A TW201409487A TW 201409487 A TW201409487 A TW 201409487A TW 101130780 A TW101130780 A TW 101130780A TW 101130780 A TW101130780 A TW 101130780A TW 201409487 A TW201409487 A TW 201409487A
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weight percent
paste
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Paul Douglas Vernooy
Chieko Kikuchi
Kazutaka Ozawa
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Du Pont
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Abstract

The present invention is directed to an electrically conductive composition comprising (i) an electrically conductive metal, (ii) a component selected from the group consisting of Li2RuO3, ion-exchanged Li2RuO3 and mixtures thereof, and (iii) a glass frit all dispersed in an organic medium. The present invention is further directed to an electrode formed from the composition and a semiconductor device and, in particular, a solar cell comprising such an electrode. The electrodes provide good adhesion and good electrical performance.

Description

含有Li 2 RuO 3 與經離子交換的Li 2 RuO 3 之導電組成物及其於製造半導體裝置之使用Conductive composition containing Li 2 RuO 3 and ion-exchanged Li 2 RuO 3 and use thereof in manufacturing a semiconductor device

本發明主要係關於一種導電組成物(例如厚膜膏或墨)以及由該導電組成物形成之電極。其進一步關於一種矽半導體裝置,尤其,其屬於將該導電組成物使用於形成太陽能電池之電極。 The present invention relates generally to a conductive composition (e.g., a thick film paste or ink) and an electrode formed from the conductive composition. It further relates to a germanium semiconductor device, in particular, to the electrode for use in forming a solar cell.

具有p型基極之習知的太陽電池結構具有典型位於電池前側或太陽側的負電極及位於背側的正電極。落在半導體主體的p-n接面上且具有適當波長的輻射係作為一外部能量來源,以便於該主體中產生電子-電洞對。由於存在p-n接面上的電位差之緣故,電洞和電子以相反方向橫跨該接面移動,從而引發能夠輸送電力至一外部電路的電流流動。大多數的太陽能電池為經過金屬化,亦即,設有導電的金屬電極之矽晶圓的形式。典型地,將厚膜膏或墨(以下有時簡稱為「膏」)網版印刷於基材上並燒製形成電極。 A conventional solar cell structure having a p-type base has a negative electrode typically located on the front side or the sun side of the cell and a positive electrode on the back side. A radiation system that falls on the p-n junction of the semiconductor body and has a suitable wavelength serves as an external source of energy to facilitate the generation of electron-hole pairs in the body. Due to the potential difference on the p-n junction, the holes and electrons move across the junction in opposite directions, thereby causing a current flow that can deliver power to an external circuit. Most solar cells are in the form of metallized, that is, tantalum wafers with conductive metal electrodes. Typically, a thick film paste or ink (hereinafter sometimes simply referred to as "paste") is screen printed on a substrate and fired to form an electrode.

矽晶圓的前側或太陽側常塗覆有抗反射塗層(ARC),以避免入射陽光的反射逸失,從而增加太陽能電池之效率。典型地,將二維之電極柵格圖形(亦即「前電極」)連接至矽之n側,並且將在對側(背電極)上之鋁塗層連接至矽之p側。這些接點為由該p-n接面至外側負載的電出口。 The front side or the sun side of the germanium wafer is often coated with an anti-reflective coating (ARC) to avoid reflection loss of incident sunlight, thereby increasing the efficiency of the solar cell. Typically, a two-dimensional electrode grid pattern (i.e., "front electrode") is attached to the n-side of the crucible, and an aluminum coating on the opposite side (back electrode) is attached to the p-side of the crucible. These contacts are electrical outlets from the p-n junction to the outside load.

矽太陽能電池的前電極通常是藉由網版印刷一種膏而形成。典型地,該膏含有導電微粒、玻璃熔塊以及 有機介質。在網版印刷後,使該晶圓與膏在空氣中燒製,典型為在爐設定溫度約650至1000℃燒製幾秒,以形成緻密固體的導電跡線。有機成分亦在此燒製步驟中被燒除。也是在此燒製步驟期間,該玻璃熔塊和任何添加的焊劑與該抗反射塗層反應並蝕刻穿透該抗反射塗層,以便形成緊密的矽至電極接觸。該玻璃熔塊與任何添加的焊劑亦提供對基材的黏著性以及有助於後續焊接引線對電極的黏著性。對基材有良好的黏著性以及引線對電極有高的焊接黏著性對於太陽能電池的性能以及太陽能模組的可製造性與可靠性是重要的。 The front electrode of a tantalum solar cell is usually formed by screen printing a paste. Typically, the paste contains conductive particles, glass frits, and Organic medium. After screen printing, the wafer and paste are fired in air, typically at a furnace set temperature of about 650 to 1000 ° C for a few seconds to form a conductive trace of dense solids. The organic component is also burned off in this firing step. Also during this firing step, the glass frit and any added flux react with the anti-reflective coating and etch through the anti-reflective coating to form a tight crucible-to-electrode contact. The glass frit and any added flux also provide adhesion to the substrate as well as adhesion to subsequent electrodes to the electrode. Good adhesion to the substrate and high solder adhesion to the leads are important for the performance of the solar cell and the manufacturability and reliability of the solar module.

有持續的努力來提供產生改善黏著性同時保持電性能之膏組合物。 There has been an ongoing effort to provide a paste composition that produces improved adhesion while maintaining electrical properties.

本發明提供一種導電組成物,該導電組成物包含:(a)一導電金屬;(b)一選自由Li2RuO3、經離子交換的Li2RuO3及其混合物所組成之群組之成分;(c)一玻璃熔塊;以及(d)一有機介質;其中該導電金屬、該選自由Li2RuO3、經離子交換的Li2RuO3及其混合物所組成之群組之成分以及該玻璃熔塊係分散於該有機介質中。 The present invention provides an electrically conductive composition comprising: (a) a conductive metal; (b) a component selected from the group consisting of Li 2 RuO 3 , ion exchanged Li 2 RuO 3 , and mixtures thereof (c) a glass frit; and (d) an organic medium; wherein the conductive metal, the component selected from the group consisting of Li 2 RuO 3 , ion exchanged Li 2 RuO 3 , and mixtures thereof, and The glass frit is dispersed in the organic medium.

本發明亦提供一種半導體裝置,特別是一種太陽能電池,其包含一由本組成物形成之電極,其中該組成物已經過燒製,以移除該有機介質並形成該電極。 The present invention also provides a semiconductor device, particularly a solar cell comprising an electrode formed from the composition, wherein the composition has been fired to remove the organic medium and form the electrode.

本發明之導電組成物同時提供形成電極的能力,其中該電極具有良好的電性質以及改善的黏著性質。典型地,該組成物將為厚膜膏或墨的形式,該厚膜膏或墨可被印刷或塗覆成需要的圖形,如藉由網版印刷、模板印刷、電鍍、噴墨印刷、射出、成型或多重印刷或帶狀物。 The electrically conductive composition of the present invention simultaneously provides the ability to form an electrode wherein the electrode has good electrical properties and improved adhesion properties. Typically, the composition will be in the form of a thick film paste or ink that can be printed or coated into a desired pattern, such as by screen printing, stencil printing, electroplating, ink jet printing, and ejection. , molding or multiple printing or ribbon.

該導電組成物包含導電金屬、選自由Li2RuO3、經離子交換的Li2RuO3及其混合物所組成之群組之成分、玻璃熔塊以及有機介質。在一實施例中,該組成物包含75至90重量百分比的導電金屬、0.03至5重量百分比的選自由Li2RuO3、經離子交換的Li2RuO3及其混合物所組成之群組之成分、0.5至5重量百分比的玻璃熔塊以及5至25重量百分比的有機介質,其中該導電金屬、該選自由Li2RuO3、經離子交換的Li2RuO3及其混合物所組成之群組之成分以及該玻璃熔塊係分散於該有機介質中,以及其中該重量百分比係基於該組成物之總重量。 The conductive composition comprises a conductive metal, a component selected from the group consisting of Li 2 RuO 3 , ion exchanged Li 2 RuO 3 , and mixtures thereof, a glass frit, and an organic medium. In one embodiment, the composition comprises 75 to 90 weight percent of a conductive metal, 0.03 to 5 weight percent of a component selected from the group consisting of Li 2 RuO 3 , ion exchanged Li 2 RuO 3 , and mixtures thereof a 0.5 to 5 weight percent glass frit and 5 to 25 weight percent organic medium, wherein the conductive metal, the group selected from the group consisting of Li 2 RuO 3 , ion exchanged Li 2 RuO 3 , and mixtures thereof The composition and the glass frit are dispersed in the organic medium, and wherein the weight percentage is based on the total weight of the composition.

以下詳細說明本發明的組成物之每個組分。 Each component of the composition of the present invention is explained in detail below.

導電金屬 Conductive metal

導電金屬係選自由銀、銅、鎳、鋁及鈀所組成之群組。導電金屬之來源可為片狀形態、球狀形態、粒狀形態、結晶形態、粉末或其他不規則形態及其混合物。該導電金屬可提供於一膠體懸浮液中。在一實施例中該組 成物含有75至90重量百分比的導電金屬,其中該重量百分比係基於該組成物之總重量。 The conductive metal is selected from the group consisting of silver, copper, nickel, aluminum, and palladium. The source of the conductive metal may be in the form of a sheet, a sphere, a granular form, a crystalline form, a powder or other irregular form, and a mixture thereof. The conductive metal can be provided in a colloidal suspension. In an embodiment the group The product contains from 75 to 90 weight percent of the conductive metal, wherein the weight percentage is based on the total weight of the composition.

在一實施例中,該導電金屬為銀(Ag)。該銀可為銀金屬、銀合金或其混合物之形式。典型地,在銀粉末中,銀粒子為片狀形態、球狀形態、粒狀形態、結晶形態、其他不規則形態及其混合物。可在一膠態懸浮液中提供銀。銀亦可為下列形式:氧化銀(Ag2O)、銀鹽(例如,AgCl、AgNO3、AgOOCCH3(乙酸銀)、AgOOCF3(三氟乙酸銀)、正磷酸銀(Ag3PO4)或其混合物)。也可以使用與其他組分相容的其他形式的銀。 In an embodiment, the conductive metal is silver (Ag). The silver may be in the form of a silver metal, a silver alloy or a mixture thereof. Typically, in silver powder, the silver particles are in the form of flakes, spheres, granules, crystals, other irregularities, and mixtures thereof. Silver can be provided in a colloidal suspension. Silver may also be in the form of silver oxide (Ag 2 O), silver salts (eg, AgCl, AgNO 3 , AgOOCCH 3 (silver acetate), AgOOCF 3 (silver trifluoroacetate), silver orthophosphate (Ag 3 PO 4 ). Or a mixture thereof). Other forms of silver that are compatible with the other components can also be used.

在一實施例中,該導電組成物包含經塗覆的導電銀粒子。合適之塗覆包括表面活性劑與含磷化合物。合適之表面活性劑包括聚乙烯氧化物(polyethyleneoxide)、聚乙二醇、苯并三唑、聚(乙二醇)乙酸、月桂酸、油酸、癸酸、肉豆蔻酸、亞麻油酸、硬脂酸、棕櫚酸、硬脂酸鹽、棕櫚酸鹽與其混合物。鹽類反離子可為銨、鈉、鉀及其混合物。 In an embodiment, the electrically conductive composition comprises coated electrically conductive silver particles. Suitable coatings include surfactants and phosphorus-containing compounds. Suitable surfactants include polyethylene oxide, polyethylene glycol, benzotriazole, poly(ethylene glycol) acetic acid, lauric acid, oleic acid, citric acid, myristic acid, linoleic acid, hard Fatty acid, palmitic acid, stearate, palmitate and mixtures thereof. The salt counterions can be ammonium, sodium, potassium, and mixtures thereof.

銀的粒度並未受到任何特別限制。在一實施例中,平均粒度小於10微米;在另一實施例中,平均粒度在1至6微米的範圍。 The particle size of silver is not subject to any particular restrictions. In one embodiment, the average particle size is less than 10 microns; in another embodiment, the average particle size is in the range of 1 to 6 microns.

在一實施例中,該導電金屬進一步包含一選自由鎳、鋁及其混合物所組成之群組之金屬。 In one embodiment, the conductive metal further comprises a metal selected from the group consisting of nickel, aluminum, and mixtures thereof.

基於該組成物的總重量,本組成物包含50至90重量百分比的導電金屬。 The composition contains 50 to 90% by weight of the conductive metal based on the total weight of the composition.

Li2RuO3、經離子交換的Li2RuO3及其混合物 Li 2 RuO 3 , ion exchanged Li 2 RuO 3 and mixtures thereof

該導電組成物含有選自由Li2RuO3、經離子交換的Li2RuO3及其混合物所組成之群組之成分。該成分產生由本組成物製成的電極之改善黏著性。在一實施例中,該組成物含有0.03至5重量百分比的該成分,其中該重量百分比係基於該組成物的總重量。在另一實施例中,該組成物含有0.06至3重量百分比的該成分。在又另一實施例中,該組成物含有0.1至1重量百分比的該成分。 The conductive composition contains a component selected from the group consisting of Li 2 RuO 3 , ion-exchanged Li 2 RuO 3 , and mixtures thereof. This component produces an improved adhesion of the electrode made of the composition. In one embodiment, the composition contains from 0.03 to 5 weight percent of the component, wherein the weight percentage is based on the total weight of the composition. In another embodiment, the composition contains from 0.06 to 3 weight percent of the ingredient. In yet another embodiment, the composition contains from 0.1 to 1 weight percent of the ingredient.

在一實施例中,該成分含有Li2RuO3。Li2RuO3的結構,如James與Goodenough在Journal of Solid State Chemistry 74第287至294頁(1988年)中所討論的,一般係由二個相鄰的交替層所組成,一層僅含有Li離子,而另一層含有Ru與Li離子(忽略氧原子)兩者。 In one embodiment, the composition contains Li 2 RuO 3 . The structure of Li 2 RuO 3 , as discussed by James and Goodenough in Journal of Solid State Chemistry 74, pp. 287-294 (1988), is generally composed of two adjacent alternating layers, one layer containing only Li ions. The other layer contains both Ru and Li ions (ignoring oxygen atoms).

在另一實施例中,該成分含有經離子交換的Li2RuO3。本文中「經離子交換的Li2RuO3」係用於描述Li2RuO3微粒,其中Li原子已經至少部分與Al、Ga、K、Ca、Mn、Fe、Mg、H、Na、Cr、Co、Ni、V、Cu、Zn、Ti或Zr原子或其組合交換。該經離子交換的Li2RuO3係以式M+1 xM+2 yM+3 zLi2-x-2y-3zRuO3描述,其中(x+2y+3z)1.5,以及其中M係選自由Al、Ga、K、Ca、Mn、Fe、Mg、Na、H、Cr、Co、Ni、V、Cu、Zn、Ti及Zr所組成之群組之一或多個組員。據信該Li2RuO3結構之唯Li層於該結構中含有約75莫耳%的鋁,而且可以經由離子交換立即移除該等鋰離子。雖然鋰離子可於Li2RuO3的唯Li層中移動,然而具有比Li更高價的陽離子(如Mg+2或Al+3),由於其較高的電荷與附隨的較強鍵結, 所以是較不易移動的。因此據信,交換的離子(如鎂)首先於微粒表面上或附近以及於該唯鋰層中取代鋰離子,並且實質上仍位於該位置。然而,可與鋰離子交換的鎂離子愈多,則鎂離子移動進入微粒的深度就愈深,而且會直到所有可交換的鋰已被移除或是溶液中的鎂離子被耗盡。當以數量不明顯多於該唯Li層中的Li離子之交換離子取代該唯Li層中的Li離子時,會傾向於製造具有表面殼層的微粒,該微粒含有在原始唯Li層中之經交換的離子以及內芯的剩餘鋰離子。 In another embodiment, the component contains ion exchanged Li 2 RuO 3 . "Ion-exchanged Li 2 RuO 3 " is used herein to describe Li 2 RuO 3 particles, wherein Li atoms have been at least partially associated with Al, Ga, K, Ca, Mn, Fe, Mg, H, Na, Cr, Co. , Ni, V, Cu, Zn, Ti or Zr atoms or a combination thereof. The ion-exchanged Li 2 RuO 3 system is described by the formula M +1 x M +2 y M +3 z Li 2-x-2y-3z RuO 3 , where (x+2y+3z) 1.5, and wherein the M system is selected from one or more of the group consisting of Al, Ga, K, Ca, Mn, Fe, Mg, Na, H, Cr, Co, Ni, V, Cu, Zn, Ti, and Zr Group members. It is believed that the Li layer of the Li 2 RuO 3 structure contains about 75 mole % of aluminum in the structure, and the lithium ions can be immediately removed via ion exchange. Although lithium ions can move in the Li-only layer of Li 2 RuO 3 , they have a higher cation than Li (such as Mg +2 or Al +3 ) due to their higher charge and accompanying stronger bonding. So it is not easy to move. It is therefore believed that the exchanged ions (e.g., magnesium) first replace the lithium ions on or near the surface of the particles and in the lithium-only layer, and are still substantially at that location. However, the more magnesium ions that can be exchanged with lithium ions, the deeper the magnesium ions move into the particles, and until all of the exchangeable lithium has been removed or the magnesium ions in the solution are depleted. When the Li ion in the Li-only layer is replaced by an exchange ion having an amount that is not significantly more than the Li ion in the Li-only layer, there is a tendency to produce a particle having a surface shell layer which is contained in the original Li-only layer. The exchanged ions and the remaining lithium ions of the inner core.

為了達成Li2RuO3中鋰離子的交換,較佳地將Li2RuO3微粒碾磨成直徑在介於約0.5與約5微米之間的範圍,其為例如一般適用於後續的網版印刷形成電極的大小範圍。可以使用任何濕式或乾式碾磨技術來達成Li2RuO3微粒的尺寸縮小,如振動碾磨、球碾磨、鎚碾磨、介質碾磨、珠碾磨、棒碾磨、噴射碾磨或盤碾磨。可依序於進行該離子交換步驟之前或同時進行該碾磨步驟。可以在個別的容器中或是在同一個容器中進行碾磨與離子交換步驟。 In order to achieve exchange of Li 2 RuO 3 of lithium ions, preferably the Li 2 RuO 3 milled particle diameter in a range between about 0.5 and about 5 microns, for example, which is generally applicable to the subsequent screen printing The size range of the electrodes is formed. Any wet or dry milling technique can be used to achieve size reduction of Li 2 RuO 3 particles, such as vibratory milling, ball milling, hammer milling, media milling, bead milling, rod milling, jet milling or Plate grinding. This milling step can be carried out before or at the same time as the ion exchange step. The milling and ion exchange steps can be carried out in individual containers or in the same container.

在一實施例中,為了保留實質上為芯至殼的配置,微粒的碾磨應於離子交換步驟之前完成或大致上完成。假使在離子交換製程完成之後持續進行碾磨,則預期未經離子交換的芯將會曝露出由於碾磨產生之未經處理的表面。此對於微粒的後續化學作用可能是或可能不是重要的。 In one embodiment, to maintain a substantially core-to-shell configuration, the milling of the particles should be completed or substantially completed prior to the ion exchange step. If milling is continued after the ion exchange process is completed, it is expected that the core that is not ion exchange will expose the untreated surface due to milling. This may or may not be important for subsequent chemical action of the microparticles.

在離子交換步驟期間,藉由攪拌或碾磨或其他適當的方式攪動溶液中的微粒,該溶液含有Al、Ga、K、 Ca、Mn、Fe、Na、H、Cr、Co、Ni、V、Cu、Zn、Ti、Zr或其混合物之離子。該等離子係藉由將所需元素的適當鹽類溶於適當的溶劑中而獲得,該溶劑較佳為水或水及可與水混溶的溶劑之混合物,該可與水混溶的溶劑如有機液體,該有機液體如甲醇。在曝露於鹽類溶液之後,Li2RuO3微粒內的鋰原子會被來自溶液的陽離子取代。經離子交換的Li2RuO3之製作於VerNooy等人的美國專利第7,608,206號中有進一步的討論。 During the ion exchange step, the particles in the solution are agitated by milling or milling or other suitable means, the solution containing Al, Ga, K, Ca, Mn, Fe, Na, H, Cr, Co, Ni, V, Ions of Cu, Zn, Ti, Zr or mixtures thereof. The plasma is obtained by dissolving a suitable salt of a desired element in a suitable solvent, preferably a mixture of water or water and a water-miscible solvent, such as a water-miscible solvent. An organic liquid such as methanol. After exposure to the salt solution, the lithium atoms in the Li 2 RuO 3 particles are replaced by cations from the solution. The ion exchanged Li 2 RuO 3 is further discussed in U.S. Patent No. 7,608,206 to VerNooy et al.

在又另一實施例中,該成分含有Li2RuO3與經離子交換的Li2RuO3之混合物。 In yet another embodiment, the composition comprises a mixture of Li 2 RuO 3 and ion exchanged Li 2 RuO 3 .

玻璃熔塊 Glass frit

有許多玻璃熔塊適用於形成本組成物。在一實施例中,該組成物含有0.5至5重量百分比的玻璃熔塊,其中該重量百分比係基於該組成物的總重量。 There are many glass frits that are suitable for forming the present composition. In one embodiment, the composition contains from 0.5 to 5 weight percent glass frit, wherein the weight percentage is based on the total weight of the composition.

在本文中所敘述的玻璃組成物(亦稱為玻璃熔塊)係包括特定的成分百分比。具體而言,該百分比為用在如本文所述的後續處理以形成一玻璃組合物之起始材料中的成分百分比。此類命名法對於熟習該項技術者來說早為已知。換言之,該組合物含有一些成分,且那些成分的百分比是表示為對應的氧化物形式之百分比。如玻璃化學這項技術中具有普通技能者所了解的,在玻璃的製造程序期間可能會釋放某一部分的揮發性物種。揮發性物種的一實例為氧。亦須了解雖然玻璃表現得像是非晶材料,其可能會含有微量的結晶材料。 The glass compositions (also known as glass frits) described herein include specific percentages of ingredients. In particular, the percentage is the percentage of the ingredients used in the starting materials used to form a glass composition as described herein. Such nomenclature has long been known to those skilled in the art. In other words, the composition contains some ingredients, and the percentage of those ingredients is expressed as a percentage of the corresponding oxide form. As is known to those of ordinary skill in the art of glass chemistry, a certain portion of the volatile species may be released during the glass manufacturing process. An example of a volatile species is oxygen. It is also important to understand that although glass behaves like an amorphous material, it may contain traces of crystalline material.

若始於經燒製的玻璃,在此項技術中具有通常知識者可使用熟悉此項技術者已知的方法計算本文所述之起始成分的百分比,該些方法包括,但不限於:感應耦合電漿質譜儀(ICP-MS)、感應耦合電漿原子放射光譜儀(ICP-AES)及類似者。此外,亦可使用下列例示性技術:X射線螢光光譜法(XRF)、芯磁共振光譜法(NMR)、電子順磁共振光譜法(EPR)、梅斯堡(Mössbauer)光譜法、電子微探針能量色散光譜法(EDS)、電子微探針波長色散光譜法(WDS)及陰極發光(CL)。 If starting with fired glass, one of ordinary skill in the art can calculate the percentage of the starting ingredients described herein using methods known to those skilled in the art, including, but not limited to, sensing. Coupled plasma mass spectrometer (ICP-MS), inductively coupled plasma atomic emission spectrometer (ICP-AES) and the like. In addition, the following exemplary techniques can also be used: X-ray fluorescence spectroscopy (XRF), core magnetic resonance spectroscopy (NMR), electron paramagnetic resonance spectroscopy (EPR), Mössbauer spectroscopy, electron micro Probe energy dispersive spectroscopy (EDS), electron microprobe wavelength dispersive spectroscopy (WDS), and cathodoluminescence (CL).

在此項技術中具有普通技能者將了解原料的選擇可在非故意的情況下包括可在處理期間併入玻璃中的雜質。例如,雜質可以數百至數千ppm的範圍存在。雜質的存在將不會改變玻璃、組成物例如厚膜組成物或燒製裝置的性質。例如,即使該厚膜組成物包括雜質,含有該厚膜組成物的一太陽能電池仍可具有本文所述的效率。本文所使用的「無鉛」意指未曾有意地添加鉛。 Those of ordinary skill in the art will appreciate that the choice of materials can unintentionally include impurities that can be incorporated into the glass during processing. For example, impurities may be present in the range of hundreds to thousands of ppm. The presence of impurities will not alter the properties of the glass, composition, such as a thick film composition or a firing device. For example, even if the thick film composition includes impurities, a solar cell containing the thick film composition can still have the efficiencies described herein. As used herein, "lead-free" means that lead has not been intentionally added.

該等各種玻璃熔塊可藉由使用一在此項技術中具有普通技藝者所了解的技術混合欲混入其中的氧化物(或其他在加熱時分解為所需氧化物的材料)來進行製備。這類製備技術可包括在空氣或含氧大氣中加熱該混合物,以形成一熔體;將該熔體淬火;及磨碎、輾磨及/或篩選該經淬火的材料,以提供一具有所需粒度的粉末。熔化鉍、碲及其他欲混入其中之氧化物的混合物典型實施達800至1200℃的峰值溫度。熔化的混合物可在例如不銹鋼壓板上或在反方向旋轉的不銹鋼輥間進行淬火,以形成一薄板。可碾磨所產生的薄板,以形成 粉末。典型地,經碾磨的粉末所具有的d50為0.1至3.0微米。一熟悉製造玻璃熔塊之技術者可利用替代的合成技術(例如,但不受限於,水淬火、溶膠至凝膠、噴霧熱解或其他適於製造粉末形式之玻璃的技術)。 The various glass frits can be prepared by mixing the oxides (or other materials which decompose to the desired oxide upon heating) to be mixed therein using techniques well known to those skilled in the art. Such preparation techniques can include heating the mixture in air or an oxygen-containing atmosphere to form a melt; quenching the melt; and grinding, honing, and/or screening the quenched material to provide a A powder of required particle size. The mixture of ruthenium, osmium and other oxides to be incorporated therein is typically subjected to a peak temperature of from 800 to 1200 °C. The molten mixture can be quenched, for example, on a stainless steel platen or a stainless steel roll rotating in the opposite direction to form a thin plate. The resulting sheet can be milled to form a powder. Typically, the milled powder having a d 50 of 0.1 to 3.0 microns. One skilled in the art of making glass frits may utilize alternative synthetic techniques (such as, but not limited to, water quenching, sol to gel, spray pyrolysis, or other techniques suitable for making glass in powder form).

上述程序的氧化物產物實質上典型為一非晶(無結晶)固態材料,亦即,玻璃。不過,在一些實施例中,所得的氧化物可為非晶、部分非晶、部分結晶、結晶或其組合。如本文所用,「玻璃熔塊」包括所有這類產物。 The oxide product of the above procedure is typically substantially an amorphous (no crystalline) solid material, i.e., glass. However, in some embodiments, the resulting oxide can be amorphous, partially amorphous, partially crystalline, crystalline, or a combination thereof. As used herein, "glass frit" includes all such products.

該玻璃熔塊可為含鉛或無鉛的。 The glass frit can be lead or lead free.

典型的用於該組成物之無鉛玻璃熔塊的實例包括鉍矽酸鹽、鉍硼矽酸鹽、鉍-碲氧化物及其混合物。 Examples of typical lead-free glass frits for the composition include phthalates, barium borate, barium-strontium oxides, and mixtures thereof.

在無鉛玻璃熔塊的一個實施例中,該氧化物組分之組成範圍基於該玻璃組成物的總重量為55至90重量百分比的Bi2O3、0.5至35重量百分比的SiO2、0至5重量百分比的B2O3、0至5重量百分比的Al2O3以及0至15重量百分比的ZnO。在另一實施例中,該氧化物組分之組成範圍為28至85重量百分比的Bi2O3、0.1至18重量百分比的SiO2、1至25重量百分比的B2O3、0至6重量百分比的Al2O3、0至1重量百分比的CaO、0至42重量百分比的ZnO、0至4重量百分比的Na2O、0至3.5重量百分比的Li2O、0至3重量百分比的Ag2O、0至4.5重量百分比的CeO2、0至3.5重量百分比的SnO2以及0至15重量百分比的BiF3In one embodiment of the lead-free glass frit, the composition of the oxide component ranges from 55 to 90 weight percent Bi 2 O 3 , 0.5 to 35 weight percent SiO 2 , 0 to 0 based on the total weight of the glass composition. 5 wt% B 2 O 3 , 0 to 5 wt% Al 2 O 3 and 0 to 15 wt% ZnO. In another embodiment, the composition of the oxide component ranges from 28 to 85 weight percent Bi 2 O 3 , 0.1 to 18 weight percent SiO 2 , 1 to 25 weight percent B 2 O 3 , 0 to 6 Weight percent Al 2 O 3 , 0 to 1 weight percent CaO, 0 to 42 weight percent ZnO, 0 to 4 weight percent Na 2 O, 0 to 3.5 weight percent Li 2 O, 0 to 3 weight percent Ag 2 O, 0 to 4.5 weight percent of CeO 2 , 0 to 3.5 weight percent of SnO 2 , and 0 to 15 weight percent of BiF 3 .

以Bi-Te-O之起始混合物的總重量為基礎,用來製造Bi-Te-O玻璃熔塊的起始混合物包括22至42重量百分比的Bi2O3及58至78重量百分比的TeO2。在另一實 施例中,除了Bi2O3及TeO2之外,以Bi-Te-O之起始混合物的總重量為基礎,用來製造Bi-Te-O的起始混合物包括0.1至7重量百分比的Li2O及0.1至4重量百分比的TiO2。在一更進一步的實施例中,再次以Bi-Te-O之起始混合物的總重量為基礎,起始混合物包括0.1至8重量百分比的B2O3、0.1至3重量百分比的ZnO及0.3至2重量百分比的P2O5The starting mixture used to make the Bi-Te-O glass frit comprises 22 to 42 weight percent Bi 2 O 3 and 58 to 78 weight percent TeO based on the total weight of the starting mixture of Bi-Te-O. 2 . In another embodiment, in addition to Bi 2 O 3 and TeO 2 , the starting mixture used to make Bi-Te-O comprises 0.1 to 7 based on the total weight of the starting mixture of Bi-Te-O. Percent by weight of Li 2 O and 0.1 to 4 weight percent of TiO 2 . In a still further embodiment, the starting mixture comprises from 0.1 to 8 weight percent B 2 O 3 , from 0.1 to 3 weight percent ZnO and 0.3 based on the total weight of the initial mixture of Bi-Te-O. Up to 2% by weight of P 2 O 5 .

典型的用於該組成物之含鉛玻璃熔塊的實例包括鉛矽酸鹽、鉛硼矽酸鹽以及鉛-碲氧化物。 Examples of typical lead-containing glass frits for the composition include lead citrate, lead borosilicate, and lead-antimony oxide.

在含鉛玻璃熔塊的一個實施例中,該氧化物組分之組成範圍基於該玻璃組成物的總重量為20至83重量百分比的PbO、1至35重量百分比的SiO2、01.5至19重量百分比的B2O3、0至35重量百分比的Bi2O3、0至7重量百分比的Al2O3、0至12重量百分比的ZnO、0至4重量百分比的CuO、0至7重量百分比的TiO2、0至5重量百分比的CdO以及0至30的PbF2In one embodiment of the leaded glass frit, the composition of the oxide component ranges from 20 to 83 weight percent PbO, from 1 to 35 weight percent SiO 2 , from 01.5 to 19 weight, based on the total weight of the glass composition. Percent B 2 O 3 , 0 to 35 weight percent Bi 2 O 3 , 0 to 7 weight percent Al 2 O 3 , 0 to 12 weight percent ZnO, 0 to 4 weight percent CuO, 0 to 7 weight percent TiO 2 , 0 to 5 weight percent CdO, and 0 to 30 PbF 2 .

用以製作Pb-Te-O玻璃熔塊的起始混合物包括25至65重量百分比的PbO以及35至75重量百分比的TeO2,其係基於Pb-Te-O的起始混合物之總重量。在進一步的實施例中,除了PbO及TeO2之外,用以製作Pb-Te-O的起始混合物包括0.1至5重量百分比的Li2O及0.1至5重量百分比的TiO2,其係基於Pb-Te-O的起始混合物之總重量。此Pb-Te-O可被表示為Pb-Te-Li-Ti-O。在又進一步的實施例中,用以製作Pb-Te-O與Pb-Te-Li-Ti-O的起始混合物包括0.1至3重量百分比的B2O3以及0.5至5重量百分比的Bi2O3The starting mixture used to make the Pb-Te-O glass frit includes 25 to 65 weight percent PbO and 35 to 75 weight percent TeO 2 based on the total weight of the starting mixture of Pb-Te-O. In a further embodiment, the starting mixture for making Pb-Te-O, in addition to PbO and TeO 2 , comprises 0.1 to 5 weight percent Li 2 O and 0.1 to 5 weight percent TiO 2 based on The total weight of the starting mixture of Pb-Te-O. This Pb-Te-O can be expressed as Pb-Te-Li-Ti-O. In still further embodiments, the starting mixture used to make Pb-Te-O and Pb-Te-Li-Ti-O comprises 0.1 to 3 weight percent B 2 O 3 and 0.5 to 5 weight percent Bi 2 O 3 .

有機介質 Organic medium

將該組成物之無機成分與有機介質混合,以形成對印刷具適當稠度及流變性的黏稠厚膜膏或較不黏稠的墨。多種惰性粘稠材料可當做有機介質使用。有機介質可為無機成分在膏或墨之製造、運送及儲存期間以及在網版印刷製程期間於印刷篩網上可以適當穩定度分散在其中者。 The inorganic component of the composition is mixed with an organic medium to form a thick thick film paste or a less viscous ink having a suitable consistency and rheology for printing. A variety of inert viscous materials can be used as organic media. The organic medium can be one in which the inorganic component can be suitably stabilized on the printing screen during the manufacture, transportation and storage of the paste or ink and during the screen printing process.

適用的有機介質具有提供固體穩定分散、用於印刷之適當黏度及搖變性、適當的基材及膏固體之可濕性、良好的乾燥速率及良好燒製性質的流變性質。該有機介質可包括增稠劑、安定劑、表面活性劑及/或其他常見的添加劑。一種該搖變增稠劑為Thixatrol®(Elementis plc,London,UK)。該有機介質可為一種聚合物溶於溶劑中的溶液。適合的聚合物包括乙基纖維素、乙基羥乙基纖維素、木松香、乙基纖維素及苯酚樹脂之混合物、低級醇之聚甲基丙烯酸酯以及乙二醇單乙酸酯之單丁醚。適用的溶劑包括萜烯,例如,α-或β-松脂醇或其與其他溶劑(例如,煤油、鄰苯二甲酸二丁酯、丁基卡必醇、丁基卡必醇醋酸鹽、己二醇及沸點高於150℃的醇)的混合物以及醇酯。其他適當的有機介質成分包括:己二酸雙(2-(2-丁氧乙氧)乙酯、雙鹼性酯(dibasic esters)如DBE、DBE-2、DBE-3、DBE-4、DBE-5、DBE-6、DBE-9以及DBE 1B、環氧化妥兒油脂肪酸辛酯(octyl epoxy tallate)、異四癸醇(isotetradecanol)以及氫化松香之新戊四醇酯(pentaerythritol ester)。有機介質亦可 包含揮發性液體,以在基材上塗覆該膏組成物後促進快速硬化。 Suitable organic media have rheological properties that provide stable dispersion of the solid, suitable viscosity and texturation for printing, proper wettability of the substrate and paste solids, good drying rate, and good firing properties. The organic medium can include thickeners, stabilizers, surfactants, and/or other common additives. One such shaker thickener is Thixatrol® (Elementis plc, London, UK). The organic medium can be a solution in which a polymer is dissolved in a solvent. Suitable polymers include ethyl cellulose, ethyl hydroxyethyl cellulose, wood rosin, mixtures of ethyl cellulose and phenolic resins, polymethacrylates of lower alcohols, and mono-glycols of ethylene glycol monoacetate. ether. Suitable solvents include terpenes, for example, alpha- or beta-rosinol or other solvents (eg, kerosene, dibutyl phthalate, butyl carbitol, butyl carbitol acetate, hexa A mixture of an alcohol and an alcohol having a boiling point above 150 ° C and an alcohol ester. Other suitable organic media components include: bis(2-(2-butoxyethoxy)ethyl adipate, dibasic esters such as DBE, DBE-2, DBE-3, DBE-4, DBE -5, DBE-6, DBE-9 and DBE 1B, octyl epoxy tallate, isotetradecanol and hydrogenated rosin pentaerythritol ester. Media can also A volatile liquid is included to promote rapid hardening after application of the paste composition on a substrate.

該組成物中之有機介質的最佳量取決於施加該組成物的方法及所用的特定有機介質。基於組成物的總重量,本組成物含有5至50重量百分比的有機介質。 The optimum amount of organic medium in the composition depends on the method of applying the composition and the particular organic medium employed. The composition contains 5 to 50% by weight of the organic medium based on the total weight of the composition.

若有機介質包含一聚合物,則該聚合物典型包含8至15 wt%的有機組成物。 If the organic medium comprises a polymer, the polymer typically comprises from 8 to 15% by weight of the organic composition.

組成物之製備 Preparation of composition

在一實施例中,該組成物可以藉由以任意順序混合該導電金屬、該選自由Li2RuO3、經離子交換的Li2RuO3及其混合物所組成之群組之成分、該玻璃熔塊以及該有機介質而製備。在某些實施例中,係先混合該無機材料,而後將它們加入該有機介質中。在其他實施例中,將作為無機物之主要部分的該導電金屬緩慢加至該有機介質。需要時可藉由加入溶劑而調整其黏度。提供高切力的混合方法有益於分散介質中的微粒。 In one embodiment, the composition may be melted by mixing the conductive metal, the group selected from the group consisting of Li 2 RuO 3 , ion-exchanged Li 2 RuO 3 , and mixtures thereof in any order. The block and the organic medium are prepared. In certain embodiments, the inorganic materials are first mixed and then added to the organic medium. In other embodiments, the conductive metal, which is a major portion of the inorganic material, is slowly added to the organic medium. The viscosity can be adjusted by adding a solvent as needed. A high shear mixing method is beneficial for dispersing particles in the medium.

電極之形成 Electrode formation

可以藉由例如網版印刷、模板印刷、電鍍、射出、噴墨印刷、成型或多重印刷或帶狀物沉積該組成物。 The composition can be deposited by, for example, screen printing, stencil printing, electroplating, injection, ink jet printing, molding or multiple printing or ribbon.

於此電極形成製程中,首先乾燥該組成物並接著加熱,以移除該有機介質並燒結該無機材料。加熱可在空氣或含氧大氣中進行。此步驟通常稱為「燒製」。燒製溫度曲線典型地經過設定,以便能夠從經乾燥的膏組成物燃毀有機黏合劑材料以及所存在的任何其他有機材 料。在一實施例中,燒製溫度為700至950℃。該燒製可在一利用高輸送速率(例如100至500 cm/min)之帶式爐中進行,而所得之滯留時間為0.03至5分鐘。可使用多個溫度區(例如,3至11個區)來控制所需的熱曲線。 In this electrode formation process, the composition is first dried and then heated to remove the organic medium and to sinter the inorganic material. Heating can be carried out in air or an oxygen-containing atmosphere. This step is often referred to as "burning." The firing temperature profile is typically set so that the organic binder material can be destroyed from the dried paste composition as well as any other organic materials present. material. In one embodiment, the firing temperature is from 700 to 950 °C. The firing can be carried out in a belt furnace using a high conveying rate (e.g., 100 to 500 cm/min), and the resulting residence time is 0.03 to 5 minutes. Multiple temperature zones (eg, 3 to 11 zones) can be used to control the desired thermal profile.

在一實施例中,一半導體裝置係由一物件製成,該物件包含一帶有接面之半導體基材與一形成於該基材之主要表面上的氮化矽絕緣膜。將本組成物以預訂形狀與厚度以及於預定位置施加(例如塗覆或網版印刷)於絕緣膜上。本組成物具有部分或完全穿過絕緣層的能力。之後進行燒製,並且該組成物與該絕緣膜反應並穿過該絕緣膜,藉以產生與矽基材的電接觸,因而形成電極。 In one embodiment, a semiconductor device is fabricated from an article comprising a semiconductor substrate with a junction and a tantalum nitride insulating film formed on a major surface of the substrate. The composition is applied (for example, coated or screen printed) on the insulating film in a predetermined shape and thickness and at a predetermined position. The composition has the ability to partially or completely pass through the insulating layer. Thereafter, firing is performed, and the composition reacts with the insulating film and passes through the insulating film, thereby generating electrical contact with the ruthenium substrate, thereby forming an electrode.

以下結合圖1A至1F說明這個形成電極的方法之實例。 An example of this method of forming an electrode will be described below with reference to Figs. 1A to 1F.

圖1A顯示單晶或多晶p型矽基材10。 FIG. 1A shows a single crystal or polycrystalline p-type tantalum substrate 10.

在圖1B中,相反導電型的n型擴散層20係使用氧氯化磷作為磷來源並藉由磷的熱擴散形成。在不作任何特定修改之下,在矽p型基材10的整個表面上方形成擴散層20。擴散層的深度可藉由控制擴散溫度及時間來使之變化,且通常形成約0.3至0.5微米的厚度範圍。n型擴散層可具有每平方數十歐姆上至每平方約120歐姆的薄片電阻率。 In FIG. 1B, the opposite conductivity type n-type diffusion layer 20 is formed using phosphorus oxychloride as a phosphorus source and thermally diffused by phosphorus. The diffusion layer 20 is formed over the entire surface of the 矽p-type substrate 10 without any specific modification. The depth of the diffusion layer can be varied by controlling the diffusion temperature and time, and typically forms a thickness range of about 0.3 to 0.5 microns. The n-type diffusion layer may have a sheet resistivity of from about 10 ohms per square to about 120 ohms per square.

如圖1C所示,在以一光阻劑或類似物保護此擴散層之正面後,藉由蝕刻從剩餘表面移除擴散層20,以 致擴散層20僅殘留在正面上。而後使用一有機溶劑或類似者移除該光阻。 As shown in FIG. 1C, after protecting the front side of the diffusion layer with a photoresist or the like, the diffusion layer 20 is removed from the remaining surface by etching to The diffusion-promoting layer 20 remains only on the front side. The photoresist is then removed using an organic solvent or the like.

之後,如圖1D所示,在n型擴散層20上形成亦作用如一抗反射塗層(ARC)的絕緣層30。絕緣層通常為氮化矽,但亦可為SiNx:H薄膜(亦即,絕緣薄膜包含用於在後續燒製處理期間鈍化的氫)、氧化鈦薄膜、氧化矽薄膜或氧化矽/氧化鈦薄膜。厚度約為700至900 Å的氮化矽薄膜適用於約1.9至2.0的折射率。絕緣層30的沈積可藉由濺射、化學氣相沈積或其他方法。 Thereafter, as shown in FIG. 1D, an insulating layer 30 which also acts as an anti-reflective coating (ARC) is formed on the n-type diffusion layer 20. The insulating layer is usually tantalum nitride, but may also be a SiN x :H film (that is, the insulating film contains hydrogen for passivation during the subsequent firing process), a titanium oxide film, a hafnium oxide film or a hafnium oxide/titanium oxide. film. A tantalum nitride film having a thickness of about 700 to 900 Å is suitable for a refractive index of about 1.9 to 2.0. The deposition of the insulating layer 30 can be by sputtering, chemical vapor deposition, or other methods.

接下來,形成電極。如圖1E所示,網版印刷本發明之組成物500,以於絕緣膜30上產生前電極,然後乾燥之。此外,將背側銀或銀/鋁膏70及鋁膏60隨後網版印刷至基材背側,接著進行乾燥。在紅外線帶式爐中以接近750至950℃的溫度範圍持續進行從數秒至數十分鐘週期的燒製。 Next, an electrode is formed. As shown in Fig. 1E, the composition 500 of the present invention is screen printed to produce a front electrode on the insulating film 30 and then dried. Further, the back side silver or silver/aluminum paste 70 and the aluminum paste 60 are subsequently screen-printed to the back side of the substrate, followed by drying. The firing from a few seconds to several tens of minutes is continued in an infrared belt furnace at a temperature range of approximately 750 to 950 °C.

結果,如圖1F所示,在燒製期間,鋁在背側上從鋁膏60擴散進入矽基材10,從而形成含有高濃度鋁摻質的p+層40。此層通常被稱為背面電場(back surface field,BSF)層,並且有助於改善該太陽能電池之能量轉換效率。 As a result, as shown in FIG. 1F, during firing, aluminum diffuses from the aluminum paste 60 onto the tantalum substrate 10 on the back side, thereby forming a p+ layer 40 containing a high concentration of aluminum dopant. This layer is often referred to as a back surface field (BSF) layer and contributes to improving the energy conversion efficiency of the solar cell.

燒製將乾燥的鋁膏60轉換為鋁背電極61。同時燒製背側銀或銀/鋁膏70,使其變為銀或銀/鋁背電極71。在燒製期間,背側鋁和背側銀或銀/鋁之間的界線呈現合金狀態,從而達成電連接。背電極的大部分面積係由鋁電極61佔據,部分是因為要形成p+層40的緣故。因為不可能焊接至一鋁電極,銀或銀/鋁背電極71遂形 成在部分的背側上方,以作為用於經由銅條或其類似物互連太陽能電池的電極。此外,本發明的前側組成物500在燒製期間燒結並穿過絕緣膜30,藉以達成與n型層20的電接觸。此類型的程序通常稱為「燒穿」。圖1F之經燒製的電極501明顯呈現出燒穿的結果。 The dry aluminum paste 60 is converted into an aluminum back electrode 61 by firing. The back side silver or silver/aluminum paste 70 is simultaneously fired to become a silver or silver/aluminum back electrode 71. During firing, the boundary between the backside aluminum and the backside silver or silver/aluminum exhibits an alloyed state, thereby achieving electrical connection. Most of the area of the back electrode is occupied by the aluminum electrode 61, in part because of the formation of the p+ layer 40. Because it is impossible to solder to an aluminum electrode, silver or silver/aluminum back electrode 71 Above the back side of the portion, as an electrode for interconnecting solar cells via copper strips or the like. Further, the front side composition 500 of the present invention is sintered and passes through the insulating film 30 during firing, thereby achieving electrical contact with the n-type layer 20. This type of program is often referred to as "burn through." The fired electrode 501 of Figure 1F clearly shows the result of burn through.

實例 Instance

太陽能電池之電量測 Solar cell power measurement

使用一商用電流-電壓(JV)測試機ST-1000(俄羅斯莫斯科的Telecom-STV公司(Telecom-STV Ltd.,Moscow,Russia))以進行該多晶矽光伏打電池之效率及填充因子量測。兩個電性連接(一個用於電壓而一個用於電流)係連接至各個光伏打電池的頂部與底部。使用瞬時光激發以避免加熱該矽光伏打電池,並且在標準溫度條件(25℃)下獲得JV曲線。具有一類似於太陽光譜之光譜輸出的閃光燈從1 m之垂直距離照射該光伏打電池。該閃光燈之功率維持恆定14微秒。在此段期間,在樣品表面之強度(對外部太陽能電池作校正)為1000 W/m2(或1 Sun)。在此14微秒期間,該JV測試機使該樣品上的人工電負載從短路變成開路。該JV測試機記錄由光引發而通過該光伏打電池之電流以及該光伏打電池之電壓,同時負載在所述負載範圍間變化。藉由以電流乘上在各個電壓位準之電壓而得到之乘積,即由此數據得到一功率對電壓之曲線。採用功率對電壓曲線之最大值作為該太陽能電池之特徵輸出功率,以計算太陽能電池效率。使此最大功率除以樣品面積以得到在1 Sun強度下之最大功率密度。而後使此值除以1000 W/m2的輸入強度以得到效率,而後此效率再乘以100而用百分比效率呈現結果。其他相關參數亦由此相同的電流-電壓曲線獲得。一個該種參數為填充因子(fill factor,FF),其可藉由計算太陽能電池的最大功率與斷路電壓和短路電流的積之比率而獲得。該FF係定義為太陽能電池的最大功率與Voc和Isc的積之比率再乘以100。 A commercial current-voltage (JV) tester ST-1000 (Telecom-STV Ltd., Moscow, Russia) was used to perform the efficiency and fill factor measurement of the polycrystalline germanium photovoltaic cell. Two electrical connections (one for voltage and one for current) are connected to the top and bottom of each photovoltaic cell. Instantaneous light excitation was used to avoid heating the tantalum photovoltaic cell and the JV curve was obtained under standard temperature conditions (25 °C). A flash lamp having a spectral output similar to the solar spectrum illuminates the photovoltaic cell from a vertical distance of 1 m. The power of the flash is maintained constant for 14 microseconds. During this period, the strength at the surface of the sample (corrected for external solar cells) was 1000 W/m 2 (or 1 Sun). During this 14 microsecond period, the JV tester changed the artificial electrical load on the sample from a short circuit to an open circuit. The JV tester records the current induced by the light through the photovoltaic cell and the voltage of the photovoltaic cell while the load varies between the load ranges. By multiplying the current by the voltage at each voltage level, a curve of power versus voltage is obtained from this data. The maximum value of the power versus voltage curve is used as the characteristic output power of the solar cell to calculate the solar cell efficiency. This maximum power is divided by the sample area to obtain the maximum power density at 1 Sun intensity. This value is then divided by the input intensity of 1000 W/m 2 to obtain efficiency, and this efficiency is then multiplied by 100 to present the result as a percentage efficiency. Other relevant parameters are also obtained from this same current-voltage curve. One such parameter is a fill factor (FF), which can be obtained by calculating the ratio of the maximum power of the solar cell to the product of the open circuit voltage and the short circuit current. The FF is defined as the ratio of the maximum power of the solar cell to the product of V oc and I sc multiplied by 100.

黏著性量測 Adhesion measurement

藉由以下程序測量電極的黏著性。將塗覆有Sn/Pb焊料的銅帶(奧博銳不銹鋼及特種金屬公司(Ulbrich Stainless Steels&Special Metals,Inc.))浸泡於軟焊劑中(Kester公司的Kester-952s),然後在空氣中乾燥五秒鐘。將一半塗覆有焊料的銅帶放置於電極上並以軟焊系統(SEMTEK公司(SEMTEK Corporation Co.,Ltd.)的SCB-160)進行軟焊。軟焊鐵設定溫度為220至240℃,而且在尖端的軟焊鐵實際溫度為195℃至215℃,如以K型電熱偶測量。 The adhesion of the electrodes was measured by the following procedure. The copper strip coated with Sn/Pb solder (Ulbrich Stainless Steels & Special Metals, Inc.) was immersed in a soft solder (Kester-952s from Kester) and then dried in air. Seconds. A half of the solder-coated copper strip was placed on the electrode and soldered by a soldering system (SEMBK Corporation (SEMBK Corporation Co., Ltd.) SCB-160). The soldering iron is set at a temperature of 220 to 240 ° C, and the actual temperature of the soldering iron at the tip is 195 ° C to 215 ° C, as measured by a K-type thermocouple.

將未黏附於電極的銅帶部分水平地彎折並藉由機器(MOGRL Technology公司(MOGRL Technology Co.,Ltd.)的Peel Force 606)以120 mm/min拉動。將使銅帶脫離的力量(牛頓,N)紀錄為焊料黏著性。 The copper strip portion which was not adhered to the electrode was horizontally bent and pulled by a machine (Peel Force 606 of MOGRL Technology Co., MOGRL Technology Co., Ltd.) at 120 mm/min. The force that forces the copper strip away (Newton, N) is recorded as solder adhesion.

Li2RuO3之合成與碾磨 Synthesis and milling of Li 2 RuO 3

實例1 Example 1

將18.85 g的Li2CO3與33.33 g的RuO2粉末充分混合並於1000℃在空氣中鍛燒12小時。所得材料的X射線粉末繞射圖形顯示僅有Li2RuO3,沒有雜質相。 18.85 g of Li 2 CO 3 was thoroughly mixed with 33.33 g of RuO 2 powder and calcined in air at 1000 ° C for 12 hours. The X-ray powder diffraction pattern of the resulting material showed only Li 2 RuO 3 with no impurity phase.

將此材料於異丙醇中碾磨至d90為0.87微米。將粉末從漿料分離、乾燥並過篩至-230篩目。 This material was milled in isopropanol to a d 90 of 0.87 microns. The powder was separated from the slurry, dried and sieved to -230 mesh.

厚膜膏之製備 Preparation of thick film paste

實例2 Example 2

於Thinky混合器(美國加州拉古納希爾斯的Thinky公司(Thinky Corp.,Laguna Hills,CA))中以表I中指示的量混合顯示的成分來製作主批的厚膜膏,並以三輥碾磨產生的膏,且以漸增的壓力進行多個回合,最後以250 psi進行2個回合。 The main batch of thick film paste was prepared by mixing the displayed ingredients in the amount indicated in Table I in a Thinky Mixer (Thinky Corp., Laguna Hills, Calif.). The resulting roll was milled in three rolls and subjected to multiple passes at increasing pressure and finally at 2 rounds at 250 psi.

藉由將7重量百分比的N200 Aqualon乙基纖維素(肯塔基州卡溫頓的Ashland公司(Ashland,Inc.,Covington,KY))溶於成膜助劑(Texanol)中而製備介 質。藉由熔化並淬火表II中顯示量的氧化物來製備玻璃熔塊,接著將玻璃碾磨成細微粉末。 Preparation was carried out by dissolving 7 weight percent of N200 Aqualon ethylcellulose (Ashland, Inc., Covington, KY) of Cawinton, Kentucky, in a film forming aid (Texanol). quality. A glass frit was prepared by melting and quenching the amount of oxide shown in Table II, followed by milling the glass into a fine powder.

使用5.4692 g的主批厚膜膏來製備本發明的組成物,並於Thinky混合器中混合本發明的組成物與0.0439 g的Li2RuO3(來自實例1)。也混入0.0361 g的額外Texanol以調整黏度。基於該組成物的總重量,Li2RuO3於本發明膏組成物中之量為0.8重量百分比。 The composition of the present invention was prepared using 5.4692 g of a master batch thick film paste, and the composition of the present invention was mixed with 0.0439 g of Li 2 RuO 3 (from Example 1) in a Thinky mixer. Also add 0.0361 g of extra Texanol to adjust the viscosity. The amount of Li 2 RuO 3 in the paste composition of the present invention was 0.8% by weight based on the total weight of the composition.

在Hoover M-5自動平底研缽(維吉尼亞州希瓦瑟(Hiwassee,VA))上將混合物弄碎以完全混入Li2RuO3。將本發明的膏組成物網版印刷於1"×1"矽晶片上(以晶圓切割器從6"×6" 65歐姆多晶矽晶圓切割出,在前側上具有約70奈米的SiNx抗反射塗層)。其圖形由11個手指(100微米寬)與1個匯流排(1.25 mm寬)組成。每個晶片的背側印有市售鋁膏製的完全接地平面。在150℃乾燥10分鐘之後,以一系列的值峰溫度在Radiant Technology公司的PV-614 6區帶式爐中燒製晶片(每個溫度5個晶片),且帶速為每分鐘457 cm。報告最終區設定溫度(值峰設定溫度)。值峰平均效率 在865℃為13.99%,而值峰平均FF在865℃為75.14。藉由比較,沒有添加任何Li2RuO3的主批膏效率非常差(<4%)。 The mixture was crushed on a Hoover M-5 automatic flat bottom mortar (Hiwassee, Va.) to completely mix Li 2 RuO 3 . The paste composition of the present invention was screen printed on a 1" x 1" wafer (cut from a 6" x 6" 65 ohm polysilicon wafer by a wafer cutter with a SiNx resistance of about 70 nm on the front side. Reflective coating). The graphic consists of 11 fingers (100 microns wide) and 1 bus bar (1.25 mm wide). A fully grounded plane made of commercially available aluminum paste is printed on the back side of each wafer. After drying at 150 ° C for 10 minutes, wafers (5 wafers per temperature) were fired in a PV-614 6 zone belt furnace of Radiant Technology at a series of peak temperatures, and the belt speed was 457 cm per minute. Report the final zone set temperature (value peak set temperature). The average peak efficiency was 13.99% at 865 °C, while the average peak FF was 75.14 at 865 °C. By comparison, the main batch paste without any addition of Li 2 RuO 3 was very inefficient (<4%).

實例3 Example 3

如實例2中所述製備並測試本發明的組成物,不同之處僅在於將0.0908 g的Li2RuO3弄碎加入5.4816 g的主批膏中,並加入0.0611 g額外的Texanol以調整黏度。基於該組成物的總重量,Li2RuO3於本發明膏組成物中的量為1.6重量百分比。值峰平均效率在890℃為14.41%,而值峰平均FF在890℃為75.90。藉由比較,沒有添加任何Li2RuO3的主批膏效率非常差(<4%)。 The compositions of the present invention were prepared and tested as described in Example 2 except that 0.0908 g of Li 2 RuO 3 was crushed into 5.4816 g of the master batch paste and 0.0611 g of additional Texanol was added to adjust the viscosity. The amount of Li 2 RuO 3 in the paste composition of the present invention was 1.6% by weight based on the total weight of the composition. The average peak value efficiency was 14.41% at 890 ° C, while the value peak average FF was 75.90 at 890 ° C. By comparison, the main batch paste without any addition of Li 2 RuO 3 was very inefficient (<4%).

實例4 Example 4

如實例2中所述製備並測試本發明的組成物,不同之處僅在於將0.1793 g的Li2RuO3弄碎加入5.6127 g的主批膏中,並加入0.0386 g額外的Texanol以調整黏度。基於該組成物的總重量,Li2RuO3於本發明膏組成物中的量為3.2重量百分比。值峰平均效率在890℃為14.53%,而值峰平均FF在890℃為76.68。藉由比較,沒有添加任何Li2RuO3的主批膏效率非常差(<4%)。 The compositions of the present invention were prepared and tested as described in Example 2 except that 0.1793 g of Li 2 RuO 3 was crushed into 5.6127 g of the master batch paste and 0.0386 g of additional Texanol was added to adjust the viscosity. The amount of Li 2 RuO 3 in the paste composition of the present invention was 3.2% by weight based on the total weight of the composition. The average peak value efficiency was 14.53% at 890 °C, while the value peak average FF was 76.68 at 890 °C. By comparison, the main batch paste without any addition of Li 2 RuO 3 was very inefficient (<4%).

實例5 Example 5

如實例2中所述製備並測試本發明的組成物,不同之處僅在於將0.2437 g的Li2RuO3弄碎加入5.0770 g的主批膏中,並加入0.0399 g額外的Texanol以調整黏 度。基於該組成物的總重量,Li2RuO3於本發明膏組成物中的量為4.8重量百分比。值峰平均效率在940℃為13.99%,而值峰平均FF在940℃為74.44。藉由比較,沒有添加任何Li2RuO3的主批膏效率非常差(<4%)。 The compositions of the present invention were prepared and tested as described in Example 2 except that 0.2437 g of Li 2 RuO 3 was broken up into 5.0770 g of the master batch paste and 0.0399 g of additional Texanol was added to adjust the viscosity. The amount of Li 2 RuO 3 in the paste composition of the present invention was 4.8 weight percent based on the total weight of the composition. The average peak value efficiency was 13.99% at 940 °C, while the value peak average FF was 74.44 at 940 °C. By comparison, the main batch paste without any addition of Li 2 RuO 3 was very inefficient (<4%).

實例6 Example 6

在Thinky混合器中混合0.0757 g的Li2RuO3(來自實例1)與28.5446 g的PV16A膏(美國德拉威州威明頓的杜邦微電路材料(DuPont Microcircuit Materials,Wilmington DE))以製備組成物。加入0.1751 g的Texanol以調整黏度。基於該組成物的總重量,Li2RuO3於本發明膏組成物中的量為0.263重量百分比。 0.0757 g of Li 2 RuO 3 (from Example 1) and 28.5446 g of PV16A paste (DuPont Microcircuit Materials, Wilmington DE) were mixed in a Thinky mixer to prepare a composition. . 0.1751 g of Texanol was added to adjust the viscosity. The amount of Li 2 RuO 3 in the paste composition of the present invention was 0.263% by weight based on the total weight of the composition.

以三輥碾磨產生之本發明膏組成物(在0 psi進行3回合以及在100 psi進行3回合)。以類似於實例2中描述的方式印刷測試晶片。於4區BTU國際IR帶式爐中燒製晶片,且帶速為每分鐘221 cm。值峰平均效率在910℃為15.41%,而值峰平均FF在910℃為79.08。 The inventive paste composition produced by three-roll milling (3 rounds at 0 psi and 3 rounds at 100 psi). The test wafer was printed in a manner similar to that described in Example 2. The wafer was fired in a BTU International IR belt furnace in Zone 4 with a belt speed of 221 cm per minute. The average peak value efficiency was 15.41% at 910 ° C, while the value peak average FF was 79.08 at 910 ° C.

實例7 Example 7

如實例6中所述製備並測試組成物,不同之處僅在於將0.1133 g的Li2RuO3與28.1699 g的PV16A膏混合,並加入0.1455 g的Texanol以調整黏度。基於該組成物的總重量,Li2RuO3於本發明膏組成物中的量為0.398重量百分比。值峰平均效率在920℃為15.17%,而值峰平均FF在920℃為77.86。 The composition was prepared and tested as described in Example 6, except that 0.1133 g of Li 2 RuO 3 was mixed with 28.1699 g of PV16A paste and 0.1455 g of Texanol was added to adjust the viscosity. The amount of Li 2 RuO 3 in the paste composition of the present invention was 0.398% by weight based on the total weight of the composition. The average peak value efficiency was 15.17% at 920 ° C, while the value peak average FF was 77.86 at 920 ° C.

實例8 Example 8

如實例6中所述製備並測試組成物,不同之處僅在於將0.1373 g的Li2RuO3與25.9434 g的PV16A膏混合,並加入0.2372 g的Texanol以調整黏度。基於該組成物的總重量,Li2RuO3於本發明膏組成物中的量為0.522重量百分比。值峰平均效率在910℃為15.26%,而值峰平均FF在910℃為78.42。 The composition was prepared and tested as described in Example 6, except that 0.1373 g of Li 2 RuO 3 was mixed with 25.9434 g of PV16A paste and 0.2372 g of Texanol was added to adjust the viscosity. The amount of Li 2 RuO 3 in the paste composition of the present invention was 0.522% by weight based on the total weight of the composition. The average peak value efficiency was 15.26% at 910 ° C, while the value peak average FF was 78.42 at 910 ° C.

對照實驗A Control experiment A

為了與實例6至8比較,如實例6中所述印刷並燒製未添加Li2RuO3的PV16A膏。值峰平均效率在910℃為15.16%,而值峰平均FF在910℃為78.00。 For comparison with Examples 6 to 8, a PV16A paste to which Li 2 RuO 3 was not added was printed and fired as described in Example 6. The average peak value efficiency was 15.16% at 910 ° C, while the value peak average FF was 78.00 at 910 ° C.

實例9 Example 9

以表III中所顯示的組成物製備玻璃熔塊: Glass frits were prepared from the compositions shown in Table III:

使用此玻璃熔塊製備二種膏。膏A具有1.60重量百分比的熔塊、無釕酸鋰、88.83%的銀粉末以及由溶劑、黏合劑、搖變劑以及表面活性劑所組成之有機介質。膏B與膏A相似,兩者不同之處僅在於膏B含有 0.13重量百分比的釕酸鋰。在印刷與燒製之後,由該二種膏製成的電池具有類似的效率與填充因子。然而,膏A的中位數黏著性為1.28 N,且匯流排厚度為11.5微米。而膏B的中位數黏著性為3.16 N,且匯流排厚度為10.35微米,其黏著性增加247%。 Two pastes were prepared using this glass frit. Paste A has a 1.60 weight percent frit, no lithium niobate, 88.83% silver powder, and an organic medium consisting of a solvent, a binder, a shaker, and a surfactant. Paste B is similar to Paste A, the only difference between which is that paste B contains 0.13 weight percent lithium niobate. After printing and firing, the batteries made from the two pastes have similar efficiencies and fill factors. However, paste A has a median adhesion of 1.28 N and a bus bar thickness of 11.5 microns. The paste has a median adhesion of 3.16 N and a bus bar thickness of 10.35 μm, which increases adhesion by 247%.

實例10 Example 10

使用實例9的玻璃熔塊製備二種膏。膏C具有1.69%的熔塊、無釕酸鋰、88.73%的銀粉末以及由溶劑、黏合劑、搖變劑以及表面活性劑所組成之有機介質。膏D具有1.69%的熔塊、0.100重量百分比的釕酸鋰、88.63%的銀粉末以及與膏C相同的有機介質。藉由摻合膏C與膏D來製備三種另外的膏,以完成分別具有0.010重量百分比、0.025重量百分比及0.050重量百分比的中間釕酸鋰量之膏。在印刷與燒製該五種膏之後,測量黏著性與匯流排厚度。這些量測的結果顯示於表IV中。 Two pastes were prepared using the glass frit of Example 9. Paste C has 1.69% frit, no lithium niobate, 88.73% silver powder, and an organic medium composed of a solvent, a binder, a shaker, and a surfactant. Paste D had 1.69% frit, 0.100 weight percent lithium niobate, 88.63% silver powder, and the same organic medium as paste C. Three additional pastes were prepared by blending paste C with paste D to complete a paste having an amount of intermediate lithium niobate of 0.010 weight percent, 0.025 weight percent, and 0.050 weight percent, respectively. After printing and firing the five pastes, the adhesion and the thickness of the bus bar were measured. The results of these measurements are shown in Table IV.

10‧‧‧p型矽基材 10‧‧‧p-type substrate

20‧‧‧n型擴散層 20‧‧‧n type diffusion layer

30‧‧‧ARC 30‧‧‧ARC

40‧‧‧p+層 40‧‧‧p+ layer

60‧‧‧鋁膏 60‧‧‧Aluminum paste

61‧‧‧鋁背側電極 61‧‧‧Aluminum backside electrode

70‧‧‧銀/鋁膏 70‧‧‧Silver/Aluminum Cream

71‧‧‧銀/鋁背側電極 71‧‧‧Silver/aluminum backside electrode

500‧‧‧本發明之膏 500‧‧‧The paste of the invention

501‧‧‧前電極 501‧‧‧ front electrode

圖1A至1F繪示一半導體裝置之製造。圖1中所示的參考數字說明如下。 1A to 1F illustrate the fabrication of a semiconductor device. The reference numerals shown in Fig. 1 are explained below.

10:p型矽基材 10: p type germanium substrate

20:n型擴散層 20: n type diffusion layer

30:ARC(例如氮化矽膜、氧化鈦膜或氧化矽膜) 30: ARC (such as tantalum nitride film, titanium oxide film or hafnium oxide film)

40:p+層(背面場,BSF) 40: p+ layer (back field, BSF)

60:沉積在背側上的鋁膏 60: aluminum paste deposited on the back side

61:鋁背側電極(由燒製背側鋁膏所得到的) 61: Aluminum back side electrode (obtained by firing the back side aluminum paste)

70:沉積在背側上的銀/鋁膏 70: Silver/aluminum paste deposited on the back side

71:銀/鋁背側電極(經燒製背側銀/鋁膏而得) 71: Silver/aluminum backside electrode (fired back silver/aluminum paste)

500:沉積在前側上的本發明之膏 500: a paste of the invention deposited on the front side

501:前電極(藉由燒製前側膏500而形成) 501: front electrode (formed by firing the front side paste 500)

Claims (10)

一種導電組成物,包含:(a)一導電金屬;(b)一選自由Li2RuO3、經離子交換的Li2RuO3及其混合物所組成之群組之成分;(c)一玻璃熔塊;以及(d)一有機介質;其中該導電金屬、該選自由Li2RuO3、經離子交換的Li2RuO3及其混合物所組成之群組之成分以及該玻璃熔塊係分散於該有機介質中。 A conductive composition comprising: (a) a conductive metal; (b) a component selected from the group consisting of Li 2 RuO 3 , ion exchanged Li 2 RuO 3 , and mixtures thereof; (c) a glass melting And (d) an organic medium; wherein the conductive metal, the component selected from the group consisting of Li 2 RuO 3 , ion exchanged Li 2 RuO 3 , and mixtures thereof, and the glass frit system are dispersed therein In organic media. 如請求項1所述之組成物,該組成物包含50至90重量百分比的導電金屬、0.03至5重量百分比的選自由Li2RuO3、經離子交換的Li2RuO3及其混合物所組成之群組之成分、0.5至5重量百分比的玻璃熔塊以及5至50重量百分比的有機介質,其中該重量百分比係基於該組成物之總重量。 The composition of claim 1, the composition comprising 50 to 90 weight percent of a conductive metal, 0.03 to 5 weight percent of a composition selected from the group consisting of Li 2 RuO 3 , ion exchanged Li 2 RuO 3 , and mixtures thereof The composition of the group, 0.5 to 5 weight percent of the glass frit, and 5 to 50 weight percent of the organic medium, wherein the weight percentage is based on the total weight of the composition. 如請求項1所述之組成物,其中該成分為Li2RuO3The composition of claim 1, wherein the component is Li 2 RuO 3 . 如請求項1所述之組成物,其中該成分為經離子交換的Li2RuO3,其中Li原子已經至少部分經Al、Ga、K、Ca、Mn、Fe、Mg、H、Na、Cr、Co、Ni、V、Cu、Zn、Ti或Zr原子或其組合交換。 The composition of claim 1, wherein the component is ion-exchanged Li 2 RuO 3 , wherein the Li atom has been at least partially passed through Al, Ga, K, Ca, Mn, Fe, Mg, H, Na, Cr, Co, Ni, V, Cu, Zn, Ti or Zr atoms or a combination thereof are exchanged. 如請求項1所述之組成物,該導電金屬包含一選自由銀、銅、鈀及其混合物所組成之群組之金屬。 The composition of claim 1, the conductive metal comprising a metal selected from the group consisting of silver, copper, palladium, and mixtures thereof. 如請求項5所述之組成物,該導電金屬進一步包含一選自由鎳、鋁及其混合物所組成之群組之金屬。 The composition of claim 5, the conductive metal further comprising a metal selected from the group consisting of nickel, aluminum, and mixtures thereof. 如請求項1所述之組成物,該玻璃熔塊包含一選自由鉛矽酸鹽、鉛硼矽酸鹽、鉛-碲氧化物及其混合物所組成之群組之含鉛玻璃熔塊。 The composition of claim 1, wherein the glass frit comprises a lead-containing glass frit selected from the group consisting of lead citrate, lead borosilicate, lead-antimony oxide, and mixtures thereof. 如請求項1所述之組成物,該玻璃熔塊包含一選自由鉍矽酸鹽、鉍硼矽酸鹽、鉍-碲氧化物及其混合物所組成之群組之無鉛玻璃熔塊。 The composition of claim 1, wherein the glass frit comprises a lead-free glass frit selected from the group consisting of citrate, barium borate, barium-strontium oxide, and mixtures thereof. 一種半導體裝置,包含一由請求項1所述之組成物形成之電極,其中該組成物已經過燒製來移除該有機介質並形成該電極。 A semiconductor device comprising an electrode formed from the composition of claim 1 wherein the composition has been fired to remove the organic medium and form the electrode. 一種太陽能電池,包含一由請求項1至8中任一項所述之組成物形成之電極,其中該組成物已經過燒製來移除該有機介質並形成該電極。 A solar cell comprising an electrode formed from the composition of any one of claims 1 to 8, wherein the composition has been fired to remove the organic medium and form the electrode.
TW101130780A 2012-08-24 2012-08-24 Conductive compositions containing Li2RuO3 and ion-exchanged Li2RuO3 and their use in the manufacture of semiconductor devices TW201409487A (en)

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