TW201408438A - Super abrasive-grain grinding wheel using ceramic binder and wafer manufacturing method using the grinding wheel - Google Patents

Super abrasive-grain grinding wheel using ceramic binder and wafer manufacturing method using the grinding wheel Download PDF

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TW201408438A
TW201408438A TW102115375A TW102115375A TW201408438A TW 201408438 A TW201408438 A TW 201408438A TW 102115375 A TW102115375 A TW 102115375A TW 102115375 A TW102115375 A TW 102115375A TW 201408438 A TW201408438 A TW 201408438A
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superabrasive
ceramic
grinding wheel
layer
grains
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TW102115375A
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TWI589405B (en
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Akihiro Koike
Masanori Hoshika
Kenichiro Kimbara
Yoshihiko Hata
Hiroshi Tanaka
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Almt Corp
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Abstract

To provide a super abrasive-grain grinding wheel using ceramic binder which exhibits stable grinding performance. A super abrasive-grain grinding wheel using ceramic binder is produced by bonding layers of super abrasive grains 13 containing super abrasive grains 10 bonded with ceramic binders (20, 30), wherein the layers of super abrasive grains 13 contain a first layer of super abrasive grains 11 which comprise super abrasive grains 10 bonded with ceramic binder 20 and a second layer of super abrasive grains 12 formed by aggregating clusters of super abrasive grains that are made by bonding the super abrasive grains with the ceramic binder 30.

Description

使用陶瓷結合劑之超研磨粒砂輪及使用該砂輪之晶圓的製造方法 Ultra-abrasive grinding wheel using ceramic bonding agent and manufacturing method of wafer using the same

本發明,係關於藉由陶瓷結合劑而結合了超研磨粒之具有氣孔的使用陶瓷結合劑之超研磨粒砂輪。 The present invention relates to a superabrasive grinding wheel using a ceramic bonding agent having pores combined with superabrasive grains by a ceramic bonding agent.

已知以超研磨粒(鑽石研磨粒、CBN研磨粒)、一般研磨粒(SiC研磨粒、AL2O3研磨粒)等做為研磨粒,將其藉由陶瓷結合劑結合之使用陶瓷結合劑之超研磨粒砂輪。 It is known that superabrasive grains (diamond abrasive grains, CBN abrasive grains), general abrasive grains (SiC abrasive grains, AL2O3 abrasive grains), and the like are used as abrasive grains, and the ceramic bonding agent is used for superabrasive bonding by ceramic bonding agents. Grinding wheel.

【先前技術文獻】 [Previous Technical Literature] 【專利文獻】 [Patent Literature]

【專利文獻1】日本專利特開昭第54-39292號公報 [Patent Document 1] Japanese Patent Laid-Open No. 54-39292

【專利文獻2】日本專利特開昭第59-161269號公報 [Patent Document 2] Japanese Patent Laid-Open No. 59-161269

【專利文獻3】日本專利特開平第3-184771號公報 [Patent Document 3] Japanese Patent Laid-Open No. 3-187471

然而,若以以往之使用陶瓷結合劑之超研磨粒砂輪進行研磨加工,則隨著加工繼續,有發生研磨阻抗值變高,且研磨阻抗值不安定的問題之情況。 However, when the polishing process is performed by a superabrasive grinding wheel using a ceramic bond in the related art, there is a problem that the polishing resistance value becomes high and the polishing resistance value is unstable as the processing continues.

又,在使用平均粒徑為1μm以下之超微粒的超研 磨粒之使用陶瓷結合劑之超研磨粒砂輪中,由於超研磨粒層之磨耗速度很快,因此有發生研磨性能不安定之問題的情況。 Moreover, the use of ultrafine particles having an average particle diameter of 1 μm or less In the superabrasive grinding wheel using the ceramic bond of the abrasive grains, since the abrasion rate of the superabrasive layer is fast, there is a problem that the polishing performance is unstable.

為了解決上述問題點,本發明係具有藉由陶瓷結合劑而結合了超研磨粒之超研磨粒層之使用陶瓷結合劑之超研磨粒砂輪,其中,超研磨粒層係含有藉由陶瓷結合劑而將超研磨粒結合之第一超研磨粒層與超研磨粒係由於陶瓷結合劑而成為團之集合超研磨粒所形成之第二之超研磨粒層。 In order to solve the above problems, the present invention relates to a superabrasive grinding wheel using a ceramic binder in which a superabrasive layer of superabrasive grains is bonded by a ceramic binder, wherein the superabrasive layer contains a ceramic binder. The first superabrasive layer and the superabrasive layer combined with the superabrasive grains are the second superabrasive layer formed by the aggregate superabrasive grains due to the ceramic binder.

在如此之而構成之使用陶瓷結合劑之超研磨粒砂輪中,藉由第一及第二超研磨粒層之作用,而可發揮安定的研磨性能。 In the superabrasive grinding wheel using the ceramic bonding agent configured as described above, the first and second superabrasive grains can function to achieve stable polishing performance.

是否為團之判斷,係在超研磨粒層中,以陶瓷結合劑而包入之周圍的超研磨粒若接合了連續的10個以上之情況,則該結合被認為是團。但是,存在於團之外周的超研磨粒,並不一定會被陶瓷結合劑包入。 Whether or not the group is judged to be in the superabrasive layer, if the superabrasive grains surrounded by the ceramic binder are joined in a continuous ten or more cases, the bonding is considered to be a group. However, the superabrasive grains present in the outer periphery of the dough are not necessarily encased by the ceramic binder.

較佳的情況為,第一超研磨粒層之結合度較地二超研磨粒層結合度低。 Preferably, the degree of bonding of the first superabrasive layer is lower than that of the second superabrasive layer.

結合度,係表示超研磨粒與陶瓷結合劑之比率,其測定,係在剖面組織中,以超研磨粒與結合劑之面積比率代用。具體而言,從組織剖面之SEM(掃描式電子顯微鏡)觀察而得到之照片的電子資訊,藉由畫樣解析軟體而分類超研磨粒部、結合劑部以及氣孔部,藉由求得其分別的面積比率而可計算。 The degree of bonding is the ratio of the superabrasive particles to the ceramic binder, which is determined by the ratio of the area of the superabrasive particles to the binder in the cross-sectional structure. Specifically, the electronic information of the photograph obtained from the SEM (scanning electron microscope) of the tissue section is classified into the superabrasive portion, the binder portion, and the pore portion by the pattern analysis software, and the difference is obtained. The area ratio can be calculated.

較佳的情況為,在第一超研磨粒層中,超研磨粒之間係藉由較前述超研磨粒之粒徑還小的寬度之結合橋而結 合。 Preferably, in the first superabrasive layer, the superabrasive grains are joined by a bridge of a width smaller than the particle diameter of the superabrasive grain. Hehe.

關於結合橋之尺寸,係在相鄰之研磨粒間連結距離最近處而做為連接線,在此連接線之中間點對於連接線垂直之線在陶瓷結合劑內延伸的長度被做為結合橋之尺寸。 Regarding the size of the bonding bridge, it is a connecting line at the closest connection distance between adjacent abrasive grains, and the length extending in the ceramic bond at the middle point of the connecting line to the vertical line of the connecting line is used as a bonding bridge. The size.

較佳的情況為,在第二超研磨粒層中,前述研磨粒之間係藉由較前述超研磨粒之粒徑還大的寬度之結合橋而結合。 Preferably, in the second superabrasive layer, the abrasive grains are bonded by a bonding bridge having a width larger than that of the superabrasive grains.

較佳的情況為,第二超研磨粒層包入氣孔。 Preferably, the second superabrasive layer is encapsulated in the pores.

較佳的情況為,對於超研磨粒層全體之面積,在第一超研磨粒層中超研磨粒與陶瓷結合劑之合計所佔有之比率為10~50體積%,在前述第二超研磨粒層中,超研磨粒與前述陶瓷結合劑之合計佔有之比率為5~30體積%。 Preferably, for the entire area of the superabrasive layer, the ratio of the superabrasive particles to the total amount of the ceramic binder in the first superabrasive layer is 10 to 50% by volume, in the second superabrasive layer. The ratio of the superabrasive grains to the total amount of the above ceramic binder is 5 to 30% by volume.

關於這些的體積,在剖面組織中,將超研磨粒、陶瓷結合劑以及氣孔之面積比藉由畫像解析而求得,將該面積比做為體積比。 Regarding these volumes, in the cross-sectional structure, the area ratio of the superabrasive grains, the ceramic binder, and the pores was determined by image analysis, and the area ratio was made into a volume ratio.

較佳的情況為,陶瓷結合劑之軟化溫度為600~900℃。 Preferably, the ceramic bond has a softening temperature of from 600 to 900 °C.

較佳的情況為,使用於含有矽、藍寶石以及化合物半導體之至少一種之晶圓的研磨加工。 Preferably, it is used for polishing of a wafer containing at least one of ruthenium, sapphire, and a compound semiconductor.

較佳的情況為,晶圓之製造方法,係使用上述之任一隻使用陶瓷結合劑之超研磨粒砂輪,而將含有矽、藍寶石以及化合物半導體之至少一種之晶圓研磨加工。 Preferably, the method of manufacturing the wafer is to polish a wafer containing at least one of ruthenium, sapphire, and a compound semiconductor using any of the above-described superabrasive grinding wheels using only a ceramic bond.

1‧‧‧使用陶瓷結合劑之超研磨粒砂輪 1‧‧‧Super abrasive grinding wheel with ceramic bond

10‧‧‧超研磨粒 10‧‧‧Superabrasive

11‧‧‧第一超研磨粒層 11‧‧‧First superabrasive layer

12‧‧‧第二超研磨粒層 12‧‧‧Second superabrasive layer

20,30‧‧‧陶瓷結合劑 20,30‧‧‧Ceramic bonding agent

50‧‧‧氣孔 50‧‧‧ vent

51‧‧‧空孔 51‧‧‧ holes

第1圖係表示根據本發明之實施型態之使用陶瓷結合劑之超研磨粒砂輪之擴大超研磨粒之一部分之剖面圖。 Fig. 1 is a cross-sectional view showing a portion of an enlarged superabrasive grain of a superabrasive grinding wheel using a ceramic bond according to an embodiment of the present invention.

第2圖係第一超研磨粒層之剖面圖。 Figure 2 is a cross-sectional view of the first superabrasive layer.

第3圖係第二超研磨粒層之剖面圖。 Figure 3 is a cross-sectional view of the second superabrasive layer.

第4圖係表示為了說明結合橋之剖面圖。 Figure 4 is a cross-sectional view for explaining the bonding bridge.

第5圖係表示藉由平面研磨盤而研磨加工晶圓之方式的模式圖。 Fig. 5 is a schematic view showing a manner in which a wafer is polished by a flat grinding disc.

以下,對於本發明之實施形態,參照圖式而說明。在以下之實施型態中對於同樣或相當的部分賦予同一參照符號。 Hereinafter, embodiments of the present invention will be described with reference to the drawings. In the following embodiments, the same reference numerals are given to the same or corresponding parts.

第1圖,係表示根據本發明之實施型態之使用陶瓷結合劑之超研磨粒砂輪之擴大超研磨粒之一部分之剖面圖。第2圖係第一超研磨粒層之剖面圖。第3圖係第二超研磨粒層之剖面圖。第4圖係表示表示為了說明結合橋之剖面圖。 Fig. 1 is a cross-sectional view showing a portion of an enlarged superabrasive grain of a superabrasive grinding wheel using a ceramic bond according to an embodiment of the present invention. Figure 2 is a cross-sectional view of the first superabrasive layer. Figure 3 is a cross-sectional view of the second superabrasive layer. Figure 4 is a cross-sectional view showing the coupling bridge for illustration.

參照第1圖至第4圖,使用陶瓷結合劑之超研磨粒砂輪1,具有藉由陶瓷結合劑20、30而結合了超研磨粒10之超研磨粒層13,在超研磨粒13,分散配置了藉由陶瓷結合劑20而將超研磨粒10結合之第一超研磨粒層11與超研磨粒由於陶瓷結合劑而成為團之集合超研磨粒所形成之第二之超研磨粒層12。 Referring to Figs. 1 to 4, a superabrasive grinding wheel 1 using a ceramic bond having a superabrasive layer 13 in which superabrasive grains 10 are bonded by ceramic binders 20, 30 is dispersed in superabrasive grains 13, The first superabrasive layer 11 in which the superabrasive grains 10 are bonded by the ceramic binder 20 and the superabrasive layer 12 formed by the superabrasive grains in which the superabrasive grains are agglomerated by the ceramic binder are disposed. .

藉由分散配置第一超研磨粒11與超研磨粒10藉由陶瓷結合劑20而成為團之集合超研磨粒所形成之第二超研磨粒層12,而可使使用陶瓷結合劑之超研磨粒砂輪1之研磨特 性廣範圍地變化。因此,可選擇最適合工件之種類、研磨條件、以及研磨裝置等之種類之砂輪之仕樣。 By superposing the first superabrasive particles 11 and the superabrasive particles 10 to form the second superabrasive layer 12 formed by the superabrasive particles by the ceramic binder 20, the superabrasive using the ceramic binder can be used. Grinding wheel 1 Sexuality varies widely. Therefore, it is possible to select a type of grinding wheel that is most suitable for the type of the workpiece, the polishing conditions, and the type of the grinding device.

做為陶瓷結合劑20、30,可使用已知的組成之陶瓷結合劑。例如,可適用以下組成之陶瓷結合劑。 As the ceramic binders 20, 30, a ceramic bond of a known composition can be used. For example, a ceramic binder of the following composition can be applied.

SiO2:30~50質量%,Al2O3:2~10質量%,B2O3:40~60質量%,RO(RO係從CaO、MgO、BaO所選出之1種以上的氧化物):1~10質量%,R2O(R2O係從Li2O、Na2O以及K2O所選出之至少1種以上的氧化物):2~5質量%。 SiO2: 30 to 50% by mass, Al2O3: 2 to 10% by mass, B2O3: 40 to 60% by mass, RO (RO is one or more oxides selected from CaO, MgO, and BaO): 1 to 10% by mass R2O (R2O is at least one oxide selected from Li2O, Na2O, and K2O): 2 to 5% by mass.

又,當然本發明也可使用上述以外之陶瓷結合劑。 Further, of course, the ceramic binder other than the above may be used in the present invention.

在使用陶瓷結合劑之超研磨粒砂輪1中,較佳的情況為,第一超研磨粒層11之結合度較第二超研磨粒層12之結合度低。 In the superabrasive grinding wheel 1 using a ceramic binder, it is preferable that the degree of bonding of the first superabrasive layer 11 is lower than that of the second superabrasive layer 12.

第一超研磨粒層11之結合度,由於較第二超研磨粒層12低,第一超研磨粒層11可以在研磨加工時以較佳的速度而磨耗使其後退。因此,由於只有第二家超研磨粒層12突出而對研磨加工有貢獻,而可長期間地維持安定良好之切割感。 The degree of bonding of the first superabrasive layer 11 is lower than that of the second superabrasive layer 12, and the first superabrasive layer 11 can be worn back at a preferred speed during the grinding process. Therefore, since only the second superabrasive layer 12 is protruded and contributes to the grinding process, the stable cutting feeling can be maintained for a long period of time.

特別是,藉由杯形砂輪(例如JIS B4131所規定之6A2型等),在旋轉桌方式之縱軸平面研磨裝置中,將工件平面研磨加工時,可以選擇即使第一及第二超研磨粒層11、12與工件之接觸面積變大,也可長期間地持續良好的切割感之砂輪的仕樣。 In particular, in the vertical axis plane polishing apparatus of the rotary table type, a cup-shaped grinding wheel (for example, the 6A2 type specified in JIS B4131) can select even the first and second super-abrasive grains. The contact area between the layers 11 and 12 and the workpiece becomes large, and the grinding wheel of a good cutting feeling can be continued for a long period of time.

在使用陶瓷結合劑之超研磨粒砂輪1中,較佳的情況為,在第一超研磨粒層11中,超研磨粒10之間係藉由較 前述超研磨粒10之粒徑還小的寬度之結合橋而結合。 In the superabrasive grinding wheel 1 using a ceramic bonding agent, it is preferable that in the first superabrasive layer 11, the superabrasive grains 10 are passed between The superabrasive particles 10 are combined with a bridge having a small particle diameter.

如第4圖所示,關於結合橋之尺寸,係在相鄰之研磨粒10間連結距離最近處而做為連接線18,在此連接線18之中間點對於連接線18垂直之線在陶瓷結合劑20內延伸的長度L被做為結合橋之尺寸。 As shown in Fig. 4, regarding the size of the bonding bridge, the connection distance is the closest to the adjacent abrasive grains 10 as the connecting line 18, and the intermediate point of the connecting line 18 is perpendicular to the connecting line 18 in the ceramic. The length L extending within the bonding agent 20 is taken as the size of the bonding bridge.

對於第一超研磨粒層11,為了使其較第二超研磨粒層12結合度低,第一超研磨粒層11,超研磨粒10之間係藉由較超研磨粒10之粒徑還小的寬度之結合橋結合。 For the first superabrasive layer 11, in order to make the degree of bonding lower than that of the second superabrasive layer 12, the first superabrasive layer 11 and the superabrasive particles 10 are separated by the particle size of the superabrasive particles 10. A combination of small width bridges.

在使用陶瓷結合劑之超研磨粒砂輪1中,在第二超研磨粒層12中,超研磨粒10之間係藉由較前述超研磨粒10之粒徑還大的寬度之結合橋而結合。 In the superabrasive grinding wheel 1 using a ceramic binder, in the second superabrasive layer 12, the superabrasive grains 10 are bonded by a bonding bridge having a width larger than the particle diameter of the superabrasive grain 10 described above. .

第二超研磨粒層12,為了較第一超研磨粒層11提高結合度,超研磨粒10之間係藉由較前述超研磨粒10之粒徑還大的寬度之結合橋而結合。為了更提高結合度,係使超研磨粒之間之間隙不形成氣孔(空孔)而以陶瓷結合劑填滿間隙。 The second superabrasive layer 12 is bonded to the first superabrasive layer 11 by a bonding bridge having a width larger than the particle diameter of the superabrasive grain 10. In order to increase the degree of bonding, the gap between the superabrasive grains is not formed with pores (pores) and the gap is filled with the ceramic binder.

在使用陶瓷結合劑之超研磨粒砂輪1中,團將氣孔50內包。在此團係指複數個之超研磨粒10藉由陶瓷結合劑30而塊狀化或簇狀化之集合研磨粒。由於團係構成對於研磨加工有貢獻之第二超研磨粒層12之物,在需要切割感之提升、冷卻材之冷卻效果之提升、以及切屑之排出性之提升等時,在團中內包氣孔50為佳。是否為團之判斷,係在超研磨粒層13中,以陶瓷結合劑30而包入之周圍的超研磨粒若接合了連續的10個以上之情況,則該結合被認為是團。但是,存在於團之外周的超研磨粒,並不一定會被陶瓷結合劑包入。 In the superabrasive grinding wheel 1 using a ceramic bond, the dough encloses the pores 50. In this group, a plurality of superabrasive particles 10 are agglomerated or clustered by a ceramic binder 30. Since the group constitutes the second superabrasive layer 12 which contributes to the grinding process, when the improvement of the cutting feeling, the improvement of the cooling effect of the cooling material, and the improvement of the discharge of the chips are required, the package is included in the group. The vent 50 is preferred. In the superabrasive layer 13, if the superabrasive grains surrounded by the ceramic bond 30 are joined in a continuous ten or more cases, the bonding is considered to be a mass. However, the superabrasive grains present in the outer periphery of the dough are not necessarily encased by the ceramic binder.

在第一研磨粒層11,存在多數的空孔51。具有同於空孔51之面積之面積的圓之直徑,含有較超研磨粒10之平均粒徑小者。相對於此,氣孔50具有較空孔51大之徑。與氣孔50之面積相同面積之圓的直徑,較超研磨粒10之平均粒徑大。 In the first abrasive grain layer 11, there are a plurality of voids 51. The diameter of a circle having the same area as the area of the void 51 contains a smaller average particle diameter than the superabrasive grain 10. On the other hand, the air hole 50 has a larger diameter than the air hole 51. The diameter of the circle having the same area as the area of the pores 50 is larger than the average particle diameter of the superabrasive grains 10.

第一超研磨粒層11中,由於存在多數的空孔51,因此存在著超研磨粒之間沒有藉由結合橋接合之處。對於此,第二超研磨粒層12由於不存在空孔,因此超研磨粒10連續接合10個以上。 In the first superabrasive layer 11, since there are a large number of voids 51, there is no place where the superabrasive grains are joined by the bonding bridge. In this regard, since the second superabrasive layer 12 does not have pores, the superabrasive grains 10 are continuously joined by 10 or more.

在使用陶瓷結合劑之超研磨粒砂輪1中,較佳的情況為,對於超研磨粒層13之全體的體積中,在第一超研磨粒層11中超研磨粒與陶瓷結合劑之合計所佔有之比率為10~50體積%,在前述第二超研磨粒層12中,超研磨粒與前述陶瓷結合劑之合計佔有之比率為5~30體積%。 In the superabrasive grinding wheel 1 using a ceramic binder, it is preferable that the total amount of superabrasive particles and ceramic binder in the first superabrasive layer 11 is occupied by the entire volume of the superabrasive layer 13. The ratio is 10 to 50% by volume, and in the second superabrasive layer 12, the ratio of the superabrasive grains to the total amount of the ceramic binder is 5 to 30% by volume.

在第一超研磨粒層11中,超研磨粒與陶瓷結合劑之合計所占比率為20~40體積%,在第二超研磨粒層12中,超研磨粒與陶瓷結合劑之所占比率為10~30體積%為佳,在第一超研磨粒層11中,超研磨粒與陶瓷結合劑之合計所占比率為30~40體積%,在第二超研磨粒層12中,超研磨粒與陶瓷結合劑之所占比率為15~25體積%最佳。 In the first superabrasive layer 11, the ratio of the superabrasive grains to the ceramic binder is 20 to 40% by volume, and in the second superabrasive layer 12, the ratio of the superabrasive grains to the ceramic binder is Preferably, it is 10 to 30% by volume. In the first superabrasive layer 11, the ratio of the superabrasive grains to the total amount of the ceramic binder is 30 to 40% by volume, and in the second superabrasive layer 12, superabrasive The ratio of the granules to the ceramic binder is preferably 15 to 25% by volume.

在本發明之使用陶瓷結合劑之超研磨粒砂輪1中,較佳的情況為,陶瓷結合劑20,30之軟化溫度為600~900℃。特別是在研磨加工矽、藍寶石以及化合物半導體等之各種晶圓時,陶瓷結合劑20,30之軟化溫度以600~800℃為佳, 600~700℃最佳。又,若陶瓷結合劑20,30之軟化溫度未滿600℃,則超研磨粒之保持力低下而不佳,若超過900℃,則超研磨粒會受到熱損傷而不佳。 In the superabrasive grinding wheel 1 using the ceramic bond of the present invention, it is preferred that the ceramic bonding agent 20, 30 has a softening temperature of 600 to 900 °C. In particular, when polishing various wafers such as tantalum, sapphire, and compound semiconductor, the softening temperature of the ceramic binders 20, 30 is preferably 600 to 800 ° C. 600~700 °C is the best. Further, if the softening temperature of the ceramic binders 20, 30 is less than 600 ° C, the holding strength of the superabrasive grains is lowered, and if it exceeds 900 ° C, the superabrasive grains may be thermally damaged.

陶瓷結合劑20與陶瓷結合劑30之組成可為相同也可不同。 The composition of the ceramic bond 20 and the ceramic bond 30 may be the same or different.

只要藉由使用陶瓷結合劑之超研磨粒砂輪1,即可使安定良好之切割感持續長期間。 As long as the superabrasive grinding wheel 1 using the ceramic bonding agent is used, the stable cutting feeling can be maintained for a long period of time.

(實施例1) (Example 1)

實施例1之使用陶瓷結合劑之超研磨粒砂輪之詳細係如下述。 The details of the superabrasive grinding wheel using the ceramic bond of Example 1 are as follows.

陶瓷結合劑之組成如下述。 The composition of the ceramic bond is as follows.

SiO2:40.5質量%、Al2O3:6.5質量%、B2O3:48.2質量% SiO2: 40.5 mass%, Al2O3: 6.5% by mass, B2O3: 48.2% by mass

RO(RO係從CaO、MgO、BaO所選出之1種以上的氧化物):1.8質量%,R2O(R2O係從Li2O、Na2O以及K2O所選出之至少1種以上的氧化物):3.0質量%。 RO (RO is one or more oxides selected from CaO, MgO, and BaO): 1.8% by mass, R2O (R2O is at least one oxide selected from Li2O, Na2O, and K2O): 3.0% by mass .

做為超研磨粒,係使用平均粒徑1μm之鑽石研磨粒,做為氣孔形成材,材質為澱粉、樹脂,形狀為塊狀或球狀,使用平均粒徑5μm者與20μm、100μm者。 As the superabrasive grain, a diamond abrasive grain having an average particle diameter of 1 μm was used as a pore-forming material, and the material was starch or resin, and the shape was a block shape or a spherical shape, and those having an average particle diameter of 5 μm and 20 μm and 100 μm were used.

首先,為了做成第一研磨粒層11,將陶瓷結合劑20%,與鑽石研磨粒40體積%,20μm之氣孔形成材40體積%,添加已知的黏結劑混合後,藉由乾燥粉碎而得到既定之造粒粉。 First, in order to form the first abrasive grain layer 11, 20% of the ceramic binder, 40% by volume of the diamond abrasive grains, and 40% by volume of the pore-forming material of 20 μm are mixed with a known binder, and then dried and pulverized. A given granulated powder is obtained.

接著,為了製作第二研磨粒層12,將陶瓷結合劑 30%,與鑽石研磨粒30體積%,5μm之氣孔形成材40體積%,添加已知的黏結劑混合後,藉由乾燥粉碎而得到既定之造粒粉。 Next, in order to fabricate the second abrasive grain layer 12, the ceramic bond is used. 30%, 30% by volume of the diamond abrasive grains, and 40% by volume of the pore-forming material of 5 μm, and after mixing with a known binder, a predetermined granulated powder was obtained by dry pulverization.

將如此所得到之第一超研磨粒層11之造粒粉60體積%與第二超研磨粒層12之造粒粉30體積%,與100μm之氣孔形成材10體積%乾式混合後,以加壓成形成片狀之成形體,進行脫黏結劑處理,接著在溫度750℃進行燒成。 60% by volume of the granulated powder of the first superabrasive layer 11 thus obtained and 30% by volume of the granulated powder of the second superabrasive layer 12 were dry-mixed with 10 μ% of the pore-forming material of 100 μm, and then added. The formed body was formed into a sheet shape, subjected to debonding treatment, and then fired at a temperature of 750 °C.

將燒成完了之成形片,使用接著劑,接著於鋁合金製之底座金屬,使用以往之磨石進行整型.修整,使實施例1之使用陶瓷結合劑之鑽石砂輪(使用陶瓷結合劑之超研磨粒砂輪1)完成。 The formed sheet is fired, and an adhesive is used, followed by a base metal made of an aluminum alloy, and the conventional grinding stone is used for shaping. The finishing was carried out by using the diamond grinding wheel of the ceramic bond of Example 1 (super abrasive abrasive wheel 1 using a ceramic bond).

砂輪之尺寸為外徑200mm,超研磨粒層13之寬度為4mm,超研磨粒層13之厚度為5mm之片段型杯狀砂輪(JIS B4131 6A7S型)。 The size of the grinding wheel is 200 mm in outer diameter, the width of the superabrasive layer 13 is 4 mm, and the superabrasive layer 13 is a segment-shaped cup-shaped grinding wheel (JIS B4131 6A7S type) having a thickness of 5 mm.

完成之使用陶瓷結合劑之鑽石砂輪,可確認到在以5μm之氣孔與在其周邊以較研磨粒粒徑大之結合橋所構成之團之第二研磨粒層,適度的分散於藉由較粒徑小之結合橋所結合之第一研磨粒層內而存在。 The completed diamond grinding wheel using the ceramic bond can be confirmed to have a second abrasive grain layer composed of a combination of a pore of 5 μm and a bridge having a larger particle size than the abrasive grain at the periphery thereof, and is moderately dispersed. The first abrasive grain layer combined with the small bridge of the particle size exists.

在此,對於上述的內容,係藉由掃描式電子顯微鏡觀察預先準備之研磨粒層之切斷面之結果。 Here, the above contents are the results of observing the cut surface of the previously prepared abrasive grain layer by a scanning electron microscope.

將此實施例1之使用陶瓷結合劑之鑽石砂輪裝置在縱型旋轉桌方式之平面研磨盤,進行矽晶圓之研磨加工,確認本發明之效果。 The diamond grinding wheel using the ceramic bond of the first embodiment was placed on a flat grinding disc of a vertical rotary table type, and the enamel wafer was polished to confirm the effect of the present invention.

第5圖,係表示藉由平面研磨盤研磨加工晶圓之 方式的模式圖。參照第5圖,在研磨加工方式100中,在工作桌110上固定由矽所形成之做為工件之做為晶圓120。工作桌110可在箭號110R所示方向回轉。使用陶瓷結合劑之超研磨粒砂輪1,可在箭號1R所示方向回轉。更且,箭號1F所示方向為缺口方向。 Figure 5 shows the processing of wafers by planar grinding discs. Mode diagram of the way. Referring to Fig. 5, in the polishing processing method 100, a wafer 120 formed of a crucible as a workpiece is fixed on a work table 110. The work table 110 is rotatable in the direction indicated by the arrow 110R. The superabrasive grinding wheel 1 using a ceramic bond can be rotated in the direction indicated by the arrow 1R. Moreover, the direction indicated by the arrow 1F is the notch direction.

使用如第5圖所示之研磨加工方式100進行研磨加工,發現切割感良好且安定,而且,超研磨粒層13之厚度方向的磨耗量也少。在研磨加工結束後測定超研磨粒層13之厚度方向的磨耗量,為0.5μm。又,在研磨加工中之主軸馬達的負荷電流值為8.8A。更且,該負荷電流值之差異為0.1A。在工件之矽晶圓之加工後的表面上,高低差之最大值PV(試料內之最高點與最低點之間的高度差)為21.2nm,表面粗度Ra為2.1nm。 Polishing is performed using the polishing method 100 shown in Fig. 5, and it is found that the cutting feeling is good and stable, and the amount of abrasion in the thickness direction of the superabrasive layer 13 is also small. After the completion of the polishing process, the amount of abrasion in the thickness direction of the superabrasive layer 13 was measured and found to be 0.5 μm. Further, the load current value of the spindle motor during the grinding process was 8.8 A. Moreover, the difference in the load current values is 0.1A. On the surface after the processing of the wafer of the workpiece, the maximum value PV of the height difference (the height difference between the highest point and the lowest point in the sample) was 21.2 nm, and the surface roughness Ra was 2.1 nm.

(實施例2) (Example 2)

實施例2之使用陶瓷結合劑之超研磨粒砂輪之詳細如下述。 The details of the superabrasive grinding wheel using the ceramic bond of Example 2 are as follows.

陶瓷結合劑之組成同於實施例1。超研磨粒及氣孔形成材係使用同於實施例1者。首先,為了做成第一研磨粒層11,將陶瓷結合劑20%,與鑽石研磨粒40體積%,20μm之氣孔形成材40體積%,添加已知的黏結劑混合後,藉由乾燥粉碎而得到既定之造粒粉。 The composition of the ceramic bond was the same as in Example 1. The superabrasive particles and the pore-forming material were used in the same manner as in Example 1. First, in order to form the first abrasive grain layer 11, 20% of the ceramic binder, 40% by volume of the diamond abrasive grains, and 40% by volume of the pore-forming material of 20 μm are mixed with a known binder, and then dried and pulverized. A given granulated powder is obtained.

接著,為了做成第一研磨粒層12,將陶瓷結合劑30%,與鑽石研磨粒30體積%,5μm之氣孔形成材40體積%,添加已知的黏結劑混合後,藉由乾燥粉碎而得到既定之造粒 粉。 Next, in order to form the first abrasive grain layer 12, 30% of the ceramic binder, 30% by volume of the diamond abrasive grains, and 40% by volume of the pore-forming material of 5 μm are mixed with a known binder, and then dried and pulverized. Get the established granulation powder.

將如此所得到之第一超研磨粒層11之造粒粉50體積%與第二超研磨粒層12之造粒粉40體積%,與100μm之氣孔形成材10體積%乾式混合後,以加壓成形成片狀之成形體,進行脫黏結劑處理,接著在溫度750℃進行燒成。 50% by volume of the granulated powder of the first superabrasive layer 11 thus obtained and 40% by volume of the granulated powder of the second superabrasive layer 12 are dry-mixed with 10% by volume of the pore-forming material of 100 μm, and then added. The formed body was formed into a sheet shape, subjected to debonding treatment, and then fired at a temperature of 750 °C.

將燒成完了之成形片,使用接著劑,接著於鋁合金製之底座金屬,使用以往之磨石進行整型.修整,使實施例2之使用陶瓷結合劑之鑽石砂輪(使用陶瓷結合劑之超研磨粒砂輪1)完成。 The formed sheet is fired, and an adhesive is used, followed by a base metal made of an aluminum alloy, and the conventional grinding stone is used for shaping. The finishing was carried out by using the diamond grinding wheel of the ceramic bond of Example 2 (super abrasive abrasive wheel 1 using a ceramic bond).

砂輪之尺寸為外徑200mm,超研磨粒層13之寬度為4mm,超研磨粒層13之厚度為5mm之片段型杯狀砂輪(JIS B4131 6A7S型)。 The size of the grinding wheel is 200 mm in outer diameter, the width of the superabrasive layer 13 is 4 mm, and the superabrasive layer 13 is a segment-shaped cup-shaped grinding wheel (JIS B4131 6A7S type) having a thickness of 5 mm.

完成之使用陶瓷結合劑之鑽石砂輪,可確認到在以5μm之氣孔與在其周邊以較研磨粒粒徑大之結合橋所構成之團之第二研磨粒層,適度的分散於藉由較粒徑小之結合橋所結合之第一研磨粒層內而存在。 The completed diamond grinding wheel using the ceramic bond can be confirmed to have a second abrasive grain layer composed of a combination of a pore of 5 μm and a bridge having a larger particle size than the abrasive grain at the periphery thereof, and is moderately dispersed. The first abrasive grain layer combined with the small bridge of the particle size exists.

在此,對於上述的內容,係藉由掃描式電子顯微鏡觀察預先準備之研磨粒層之切斷面之結果。 Here, the above contents are the results of observing the cut surface of the previously prepared abrasive grain layer by a scanning electron microscope.

將此實施例2之使用陶瓷結合劑之鑽石砂輪裝置在縱型旋轉桌方式之平面研磨盤,進行矽晶圓之研磨加工,確認本發明之效果。 The diamond grinding wheel using the ceramic bond of the second embodiment was placed on a flat grinding disc of a vertical rotary table type, and the enamel wafer was polished to confirm the effect of the present invention.

使用如第5圖所示之研磨加工方式100進行研磨加工,發現切割感良好且安定,而且,超研磨粒層13之厚度方向的磨耗量也少。在研磨加工結束後測定超研磨粒層13之 厚度方向的磨耗量,為0.4μm。又,在研磨加工中之主軸馬達的負荷電流值為8.7A。更且,該負荷電流值之差異為0.2A。在工件之矽晶圓之加工後的表面上,高低差之最大值PV(試料內之最高點與最低點之間的高度差)為20.7nm,表面粗度Ra為2.2nm。 Polishing is performed using the polishing method 100 shown in Fig. 5, and it is found that the cutting feeling is good and stable, and the amount of abrasion in the thickness direction of the superabrasive layer 13 is also small. The superabrasive layer 13 is measured after the end of the grinding process The amount of wear in the thickness direction was 0.4 μm. Further, the load current value of the spindle motor during the grinding process was 8.7 A. Moreover, the difference in the load current values is 0.2A. On the surface after the processing of the wafer of the workpiece, the maximum value PV of the height difference (the height difference between the highest point and the lowest point in the sample) was 20.7 nm, and the surface roughness Ra was 2.2 nm.

(實施例3) (Example 3)

實施例3之使用陶瓷結合劑之超研磨粒砂輪之詳細如下述。 The details of the superabrasive grinding wheel using the ceramic bond of Example 3 are as follows.

陶瓷結合劑之組成同於實施例1。超研磨粒及氣孔形成材係使用同於實施例1者。首先,為了做成第一研磨粒層11,將陶瓷結合劑20%,與鑽石研磨粒40體積%,20μm之氣孔形成材40體積%,添加已知的黏結劑混合後,藉由乾燥粉碎而得到既定之造粒粉。 The composition of the ceramic bond was the same as in Example 1. The superabrasive particles and the pore-forming material were used in the same manner as in Example 1. First, in order to form the first abrasive grain layer 11, 20% of the ceramic binder, 40% by volume of the diamond abrasive grains, and 40% by volume of the pore-forming material of 20 μm are mixed with a known binder, and then dried and pulverized. A given granulated powder is obtained.

接著,為了做成第一研磨粒層12,將陶瓷結合劑40%,與鑽石研磨粒20體積%,5μm之氣孔形成材40體積%,添加已知的黏結劑混合後,藉由乾燥粉碎而得到既定之造粒粉。 Next, in order to form the first abrasive grain layer 12, 40% of the ceramic binder, 20% by volume of the diamond abrasive grains, and 40% by volume of the pore-forming material of 5 μm are mixed with a known binder, and then dried and pulverized. A given granulated powder is obtained.

將如此所得到之第一超研磨粒層11之造粒粉60體積%與第二超研磨粒層12之造粒粉30體積%,與100μm之氣孔形成材10體積%乾式混合後,以加壓成形成片狀之成形體,進行脫黏結劑處理,接著在溫度750℃進行燒成。 60% by volume of the granulated powder of the first superabrasive layer 11 thus obtained and 30% by volume of the granulated powder of the second superabrasive layer 12 were dry-mixed with 10 μ% of the pore-forming material of 100 μm, and then added. The formed body was formed into a sheet shape, subjected to debonding treatment, and then fired at a temperature of 750 °C.

將燒成完了之成形片,使用接著劑,接著於鋁合金製之底座金屬,使用以往之磨石進行整型.修整,使實施例3之使用陶瓷結合劑之鑽石砂輪(使用陶瓷結合劑之超研磨粒 砂輪1)完成。 The formed sheet is fired, and an adhesive is used, followed by a base metal made of an aluminum alloy, and the conventional grinding stone is used for shaping. Trimming, the diamond grinding wheel using ceramic bond of Example 3 (super abrasive grain using ceramic bonding agent) Grinding wheel 1) is completed.

砂輪之尺寸為外徑200mm,超研磨粒層13之寬度為4mm,超研磨粒層13之厚度為5mm之片段型杯狀砂輪(JIS B4131 6A7S型)。 The size of the grinding wheel is 200 mm in outer diameter, the width of the superabrasive layer 13 is 4 mm, and the superabrasive layer 13 is a segment-shaped cup-shaped grinding wheel (JIS B4131 6A7S type) having a thickness of 5 mm.

完成之使用陶瓷結合劑之鑽石砂輪,可確認到在以5μm之氣孔與在其周邊以較研磨粒粒徑大之結合橋所構成之團之第二研磨粒層,適度的分散於藉由較粒徑小之結合橋所結合之第一研磨粒層內而存在。 The completed diamond grinding wheel using the ceramic bond can be confirmed to have a second abrasive grain layer composed of a combination of a pore of 5 μm and a bridge having a larger particle size than the abrasive grain at the periphery thereof, and is moderately dispersed. The first abrasive grain layer combined with the small bridge of the particle size exists.

在此,對於上述的內容,係藉由掃描式電子顯微鏡觀察預先準備之研磨粒層之切斷面之結果。 Here, the above contents are the results of observing the cut surface of the previously prepared abrasive grain layer by a scanning electron microscope.

將此實施例3之使用陶瓷結合劑之鑽石砂輪裝置在縱型旋轉桌方式之平面研磨盤,進行矽晶圓之研磨加工,確認本發明之效果。 The diamond grinding wheel using the ceramic bond of the third embodiment was placed on a flat grinding disc of a vertical rotary table type, and the enamel wafer was polished to confirm the effect of the present invention.

使用如第5圖所示之研磨加工方式100進行研磨加工,發現切割感良好且安定,而且,超研磨粒層13之厚度方向的磨耗量也少。在研磨加工結束後測定超研磨粒層13之厚度方向的磨耗量,為0.2μm。又,在研磨加工中之主軸馬達的負荷電流值為8.7A。更且,該負荷電流值之差異為0.1A。在工件之矽晶圓之加工後的表面上,高低差之最大值PV(試料內之最高點與最低點之間的高度差)為21nm,表面粗度Ra為2nm。 Polishing is performed using the polishing method 100 shown in Fig. 5, and it is found that the cutting feeling is good and stable, and the amount of abrasion in the thickness direction of the superabrasive layer 13 is also small. After the completion of the polishing process, the amount of abrasion in the thickness direction of the superabrasive layer 13 was measured and found to be 0.2 μm. Further, the load current value of the spindle motor during the grinding process was 8.7 A. Moreover, the difference in the load current values is 0.1A. On the surface after the processing of the wafer on the workpiece, the maximum value PV of the height difference (the height difference between the highest point and the lowest point in the sample) was 21 nm, and the surface roughness Ra was 2 nm.

(實施例4) (Example 4)

實施例4之使用陶瓷結合劑之超研磨粒砂輪之詳細如下述。 The details of the superabrasive grinding wheel using the ceramic bond of Example 4 are as follows.

陶瓷結合劑之組成同於實施例1。超研磨粒及氣孔形成材係使用同於實施例1者。首先,為了做成第一研磨粒層11,將陶瓷結合劑10%,與鑽石研磨粒50體積%,20μm之氣孔形成材40體積%,添加已知的黏結劑混合後,藉由乾燥粉碎而得到既定之造粒粉。 The composition of the ceramic bond was the same as in Example 1. The superabrasive particles and the pore-forming material were used in the same manner as in Example 1. First, in order to form the first abrasive grain layer 11, 10% of the ceramic binder, 40% by volume of the diamond abrasive grains, and 40% by volume of the pore-forming material of 20 μm are mixed with a known binder, and then dried and pulverized. A given granulated powder is obtained.

接著,為了做成第一研磨粒層12,將陶瓷結合劑30%,與鑽石研磨粒30體積%,5μm之氣孔形成材40體積%,添加已知的黏結劑混合後,藉由乾燥粉碎而得到既定之造粒粉。 Next, in order to form the first abrasive grain layer 12, 30% of the ceramic binder, 30% by volume of the diamond abrasive grains, and 40% by volume of the pore-forming material of 5 μm are mixed with a known binder, and then dried and pulverized. A given granulated powder is obtained.

將如此所得到之第一超研磨粒層11之造粒粉60體積%與第二超研磨粒層12之造粒粉30體積%,與100μm之氣孔形成材10體積%乾式混合後,以加壓成形成片狀之成形體,進行脫黏結劑處理,接著在溫度750℃進行燒成。 60% by volume of the granulated powder of the first superabrasive layer 11 thus obtained and 30% by volume of the granulated powder of the second superabrasive layer 12 were dry-mixed with 10 μ% of the pore-forming material of 100 μm, and then added. The formed body was formed into a sheet shape, subjected to debonding treatment, and then fired at a temperature of 750 °C.

將燒成完了之成形片,使用接著劑,接著於鋁合金製之底座金屬,使用以往之磨石進行整型.修整,使實施例4之使用陶瓷結合劑之鑽石砂輪(使用陶瓷結合劑之超研磨粒砂輪1)完成。 The formed sheet is fired, and an adhesive is used, followed by a base metal made of an aluminum alloy, and the conventional grinding stone is used for shaping. The finishing was carried out by using the diamond grinding wheel of the ceramic bond of Example 4 (super abrasive grinding wheel 1 using a ceramic bond).

砂輪之尺寸為外徑200mm,超研磨粒層13之寬度為4mm,超研磨粒層13之厚度為5mm之片段型杯狀砂輪(JIS B4131 6A7S型)。 The size of the grinding wheel is 200 mm in outer diameter, the width of the superabrasive layer 13 is 4 mm, and the superabrasive layer 13 is a segment-shaped cup-shaped grinding wheel (JIS B4131 6A7S type) having a thickness of 5 mm.

完成之使用陶瓷結合劑之鑽石砂輪,可確認到在以5μm之氣孔與在其周邊以較研磨粒粒徑大之結合橋所構成之團之第二研磨粒層,適度的分散於藉由較粒徑小之結合橋所結合之第一研磨粒層內而存在。 The completed diamond grinding wheel using the ceramic bond can be confirmed to have a second abrasive grain layer composed of a combination of a pore of 5 μm and a bridge having a larger particle size than the abrasive grain at the periphery thereof, and is moderately dispersed. The first abrasive grain layer combined with the small bridge of the particle size exists.

在此,對於上述的內容,係藉由掃描式電子顯微鏡觀察預先準備之研磨粒層之切斷面之結果。 Here, the above contents are the results of observing the cut surface of the previously prepared abrasive grain layer by a scanning electron microscope.

將此實施例4之使用陶瓷結合劑之鑽石砂輪裝置在縱型旋轉桌方式之平面研磨盤,進行矽晶圓之研磨加工,確認本發明之效果。 The diamond grinding wheel using the ceramic bond of the fourth embodiment was placed on a flat grinding disc of a vertical rotary table type, and the enamel wafer was polished to confirm the effect of the present invention.

使用如第5圖所示之研磨加工方式100進行研磨加工,發現切割感良好且安定,而且,超研磨粒層13之厚度方向的磨耗量也少。在研磨加工結束後測定超研磨粒層13之厚度方向的磨耗量,為0.7μm。又,在研磨加工中之主軸馬達的負荷電流值為8.5A。更且,該負荷電流值之差異為0.2A。在工件之矽晶圓之加工後的表面上,高低差之最大值PV(試料內之最高點與最低點之間的高度差)為22.3nm,表面粗度Ra為2.3nm。 Polishing is performed using the polishing method 100 shown in Fig. 5, and it is found that the cutting feeling is good and stable, and the amount of abrasion in the thickness direction of the superabrasive layer 13 is also small. After the completion of the polishing process, the amount of abrasion in the thickness direction of the superabrasive layer 13 was measured and found to be 0.7 μm. Further, the load current value of the spindle motor during the grinding process was 8.5 A. Moreover, the difference in the load current values is 0.2A. On the surface after the processing of the wafer of the workpiece, the maximum value PV of the height difference (the height difference between the highest point and the lowest point in the sample) was 22.3 nm, and the surface roughness Ra was 2.3 nm.

(比較例1) (Comparative Example 1)

另一方面,比較例1之使用陶瓷結合劑之超研磨粒砂輪,係混合了實施例1之第二超研磨粒層12之造粒粉90體積%與100μm之氣孔成形材10體積%。 On the other hand, the superabrasive grinding wheel using the ceramic bond of Comparative Example 1 was obtained by mixing 90% by volume of the granulated powder of the second superabrasive layer 12 of Example 1 and 10% by volume of the pore-forming material of 100 μm.

然後,進行同於實施例1之研磨加工,發現切割感良好,而且,超研磨粒層13之厚度方向的磨耗量也少。在研磨加工結束後測定超研磨粒層13之厚度方向的磨耗量,為0.1μm。又,在研磨加工中之主軸馬達的負荷電流值為7.8A。更且,該負荷電流值之差異為0.8A。在工件之矽晶圓之加工後的表面上,高低差之最大值PV(試料內之最高點與最低點之間的高度差)為39.1nm,表面粗度Ra為4.1nm。 Then, the polishing process in the same manner as in Example 1 was carried out, and it was found that the cutting feeling was good, and the amount of abrasion in the thickness direction of the superabrasive layer 13 was also small. After the completion of the polishing process, the amount of abrasion in the thickness direction of the superabrasive layer 13 was measured and found to be 0.1 μm. Further, the load current value of the spindle motor during the grinding process was 7.8 A. Moreover, the difference in the load current value is 0.8A. On the surface after the processing of the wafer of the workpiece, the maximum value PV of the height difference (the height difference between the highest point and the lowest point in the sample) was 39.1 nm, and the surface roughness Ra was 4.1 nm.

(比較例2) (Comparative Example 2)

更且,比較例2之使用陶瓷結合劑之超研磨粒砂輪,係混合了實施例1之第一超研磨粒層11之造粒粉90體積%與100μm之氣孔成形材10體積%。 Further, the superabrasive grinding wheel using the ceramic bond of Comparative Example 2 was obtained by mixing 90% by volume of the granulated powder of the first superabrasive layer 11 of Example 1 and 10% by volume of the pore-forming material of 100 μm.

然後,進行同於實施例1之研磨加工,發現在研磨粒層13之厚度方向的磨耗大,切割感不安定。在研磨加工結束後測定超研磨粒層13之厚度方向的磨耗量,為3μm,在研磨加工中之主軸馬達的負荷電流值為8.4A。更且,該負荷電流值之差異為0.5A。在工件之矽晶圓之加工後的表面上,高低差之最大值PV(試料內之最高點與最低點之間的高度差)為20.6nm,表面粗度Ra為2.2nm。 Then, the polishing process in the same manner as in Example 1 was carried out, and it was found that the abrasion in the thickness direction of the abrasive grain layer 13 was large, and the cutting feeling was not stable. After the completion of the polishing process, the amount of abrasion in the thickness direction of the superabrasive layer 13 was measured to be 3 μm, and the load current value of the spindle motor during the polishing process was 8.4 A. Moreover, the difference in load current values is 0.5A. On the surface after processing of the wafer on the workpiece, the maximum value PV of the height difference (the height difference between the highest point and the lowest point in the sample) was 20.6 nm, and the surface roughness Ra was 2.2 nm.

(比較例3) (Comparative Example 3)

比較例3之使用陶瓷結合劑之超研磨粒砂輪之詳細如下述。 The details of the superabrasive grinding wheel using the ceramic bond of Comparative Example 3 are as follows.

陶瓷結合劑之組成同於實施例1。超研磨粒及氣孔形成材係使用同於實施例1者。首先,為了做成第一研磨粒層11,將陶瓷結合劑20%,與鑽石研磨粒40體積%,20μm之氣孔形成材40體積%,添加已知的黏結劑混合後,藉由乾燥粉碎而得到既定之造粒粉。 The composition of the ceramic bond was the same as in Example 1. The superabrasive particles and the pore-forming material were used in the same manner as in Example 1. First, in order to form the first abrasive grain layer 11, 20% of the ceramic binder, 40% by volume of the diamond abrasive grains, and 40% by volume of the pore-forming material of 20 μm are mixed with a known binder, and then dried and pulverized. A given granulated powder is obtained.

接著,為了做成第一研磨粒層12,將陶瓷結合劑50%,與鑽石研磨粒50體積%,添加已知的黏結劑混合後,藉由乾燥粉碎而得到既定之造粒粉。沒有使用氣孔成形材。 Next, in order to form the first abrasive grain layer 12, 50% of the ceramic binder and 50% by volume of the diamond abrasive grains are mixed with a known binder, and then dried and pulverized to obtain a predetermined granulated powder. No pore forming material was used.

將如此所得到之第一超研磨粒層11之造粒粉60體積%與第二超研磨粒層12之造粒粉30體積%,與100μm之 氣孔形成材10體積%乾式混合後,以加壓成形成片狀之成形體,進行脫黏結劑處理,接著在溫度750℃進行燒成。 60 vol% of the granulated powder of the first superabrasive layer 11 thus obtained and 30 vol% of the granulated powder of the second superabrasive layer 12, and 100 μm After 10% by volume of the pore-forming material was dry-mixed, the formed body was formed into a sheet shape by pressurization, and debonding treatment was performed, followed by firing at a temperature of 750 °C.

將燒成完了之成形片,使用接著劑,接著於鋁合金製之底座金屬,使用以往之磨石進行整型.修整,使比較例3之使用陶瓷結合劑之鑽石砂輪(使用陶瓷結合劑之超研磨粒砂輪1)完成。 The formed sheet is fired, and an adhesive is used, followed by a base metal made of an aluminum alloy, and the conventional grinding stone is used for shaping. Trimming was carried out to make a diamond grinding wheel (super abrasive abrasive wheel 1 using a ceramic bond) of Comparative Example 3 using a ceramic bond.

砂輪之尺寸為外徑200mm,超研磨粒層13之寬度為4mm,超研磨粒層13之厚度為5mm之片段型杯狀砂輪(JIS B4131 6A7S型)。 The size of the grinding wheel is 200 mm in outer diameter, the width of the superabrasive layer 13 is 4 mm, and the superabrasive layer 13 is a segment-shaped cup-shaped grinding wheel (JIS B4131 6A7S type) having a thickness of 5 mm.

完成之使用陶瓷結合劑之鑽石砂輪,可確認到較研磨粒粒徑大之結合橋所構成之團之第二研磨粒層,適度的分散於藉由較粒徑小之結合橋所結合之第一研磨粒層內而存在。在第二超研磨粒層中沒有設置起因於氣孔成形材之平均粒徑5μm程度之氣孔。 The completed diamond grinding wheel using the ceramic bond can confirm the second abrasive grain layer formed by the combination bridge which is larger than the abrasive grain size, and is moderately dispersed in the combination of the smaller bridge by the smaller particle size. Exist in an abrasive layer. No pores due to the average particle diameter of the pore-forming material of 5 μm were provided in the second superabrasive layer.

在此,對於上述的內容,係藉由掃描式電子顯微鏡觀察預先準備之研磨粒層之切斷面之結果。 Here, the above contents are the results of observing the cut surface of the previously prepared abrasive grain layer by a scanning electron microscope.

將此比較例3之使用陶瓷結合劑之鑽石砂輪裝置在縱型旋轉桌方式之平面研磨盤,進行矽晶圓之研磨加工,確認本發明之效果。 The diamond grinding wheel using the ceramic bond of Comparative Example 3 was placed on a flat grinding disc of a vertical rotary table type, and the enamel wafer was polished to confirm the effect of the present invention.

使用如第5圖所示之研磨加工方式100進行研磨加工,發現切割感不安定。超研磨粒層13之厚度方向的磨耗量少。在研磨加工結束後測定超研磨粒層13之厚度方向的磨耗量,為0.4μm。又,在研磨加工中之主軸馬達的負荷電流值為9A。更且,該負荷電流值之差異為0.4A。在工件之矽晶圓 之加工後的表面上,高低差之最大值PV(試料內之最高點與最低點之間的高度差)為29.8nm,表面粗度Ra為3.1nm。 Polishing was performed using the polishing method 100 shown in Fig. 5, and it was found that the cutting feeling was unstable. The amount of wear of the superabrasive layer 13 in the thickness direction is small. After the completion of the polishing process, the amount of abrasion in the thickness direction of the superabrasive layer 13 was measured and found to be 0.4 μm. Further, the load current value of the spindle motor during the grinding process was 9 A. Moreover, the difference in the load current values is 0.4A. Wafer wafer On the surface after the processing, the maximum value PV of the height difference (the height difference between the highest point and the lowest point in the sample) was 29.8 nm, and the surface roughness Ra was 3.1 nm.

(比較例4) (Comparative Example 4)

比較例4之使用陶瓷結合劑之超研磨粒砂輪之詳細如下述。 The details of the superabrasive grinding wheel using the ceramic bond of Comparative Example 4 are as follows.

陶瓷結合劑之組成同於實施例1。超研磨粒及氣孔形成材係使用同於實施例1者。首先,為了做成第一研磨粒層11,將陶瓷結合劑33%,與鑽石研磨粒67體積%,添加已知的黏結劑混合後,藉由乾燥粉碎而得到既定之造粒粉。沒有使用氣孔成形材。 The composition of the ceramic bond was the same as in Example 1. The superabrasive particles and the pore-forming material were used in the same manner as in Example 1. First, in order to form the first abrasive grain layer 11, 33% of the ceramic binder and 67% by volume of the diamond abrasive grains are mixed with a known binder, and then dried and pulverized to obtain a predetermined granulated powder. No pore forming material was used.

接著,為了做成第一研磨粒層12,將陶瓷結合劑30%,與鑽石研磨粒30體積%,5μm之氣孔形成材40體積%,添加已知的黏結劑混合後,藉由乾燥粉碎而得到既定之造粒粉。 Next, in order to form the first abrasive grain layer 12, 30% of the ceramic binder, 30% by volume of the diamond abrasive grains, and 40% by volume of the pore-forming material of 5 μm are mixed with a known binder, and then dried and pulverized. A given granulated powder is obtained.

將如此所得到之第一超研磨粒層11之造粒粉60體積%與第二超研磨粒層12之造粒粉30體積%,與100μm之氣孔形成材10體積%乾式混合後,以加壓成形成片狀之成形體,進行脫黏結劑處理,接著在溫度750℃進行燒成。 60% by volume of the granulated powder of the first superabrasive layer 11 thus obtained and 30% by volume of the granulated powder of the second superabrasive layer 12 were dry-mixed with 10 μ% of the pore-forming material of 100 μm, and then added. The formed body was formed into a sheet shape, subjected to debonding treatment, and then fired at a temperature of 750 °C.

將燒成完了之成形片,使用接著劑,接著於鋁合金製之底座金屬,使用以往之磨石進行整型.修整,使比較例4之使用陶瓷結合劑之鑽石砂輪(使用陶瓷結合劑之超研磨粒砂輪1)完成。 The formed sheet is fired, and an adhesive is used, followed by a base metal made of an aluminum alloy, and the conventional grinding stone is used for shaping. Trimming was carried out to make a diamond grinding wheel (superabrasive grinding wheel 1 using a ceramic bond) of Comparative Example 4 using a ceramic bond.

砂輪之尺寸為外徑200mm,超研磨粒層13之寬度為4mm,超研磨粒層13之厚度為5mm之片段型杯狀砂輪(JIS B4131 6A7S型)。 The size of the grinding wheel is 200 mm in outer diameter, the width of the superabrasive layer 13 is 4 mm, and the segment of the superabrasive layer 13 is 5 mm. The cup-shaped grinding wheel (JIS) B4131 6A7S type).

完成之使用陶瓷結合劑之鑽石砂輪,可確認到在以5μm之氣孔與在其周邊以較研磨粒粒徑大之結合橋所構成之團之第二研磨粒層,適度的分散於藉由較粒徑小之結合橋所結合之第一研磨粒層內而存在。在第一超研磨粒層中沒有設置起因於氣孔形成材之平均粒徑20μm程度之氣孔。 The completed diamond grinding wheel using the ceramic bond can be confirmed to have a second abrasive grain layer composed of a combination of a pore of 5 μm and a bridge having a larger particle size than the abrasive grain at the periphery thereof, and is moderately dispersed. The first abrasive grain layer combined with the small bridge of the particle size exists. No pores due to the average particle diameter of the pore-forming material of 20 μm were provided in the first superabrasive layer.

在此,對於上述的內容,係藉由掃描式電子顯微鏡觀察預先準備之研磨粒層之切斷面之結果。 Here, the above contents are the results of observing the cut surface of the previously prepared abrasive grain layer by a scanning electron microscope.

將此比較例4之使用陶瓷結合劑之鑽石砂輪裝置在縱型旋轉桌方式之平面研磨盤,進行矽晶圓之研磨加工,確認本發明之效果。 The diamond grinding wheel using the ceramic bond of Comparative Example 4 was placed on a flat grinding disc of a vertical rotary table type, and the enamel wafer was polished to confirm the effect of the present invention.

使用如第5圖所示之研磨加工方式100進行研磨加工,發現切割感不安定。超研磨粒層13之厚度方向的磨耗量少。在研磨加工結束後測定超研磨粒層13之厚度方向的磨耗量,為0.3μm。又,在研磨加工中之主軸馬達的負荷電流值為9.2A。更且,該負荷電流值之差異為0.5A。在工件之矽晶圓之加工後的表面上,高低差之最大值PV(試料內之最高點與最低點之間的高度差)為25.2nm,表面粗度Ra為2.8nm。 Polishing was performed using the polishing method 100 shown in Fig. 5, and it was found that the cutting feeling was unstable. The amount of wear of the superabrasive layer 13 in the thickness direction is small. After the completion of the polishing process, the amount of abrasion in the thickness direction of the superabrasive layer 13 was measured and found to be 0.3 μm. Further, the load current value of the spindle motor during the grinding process was 9.2 A. Moreover, the difference in load current values is 0.5A. On the surface after the processing of the wafer of the workpiece, the maximum value PV of the height difference (the height difference between the highest point and the lowest point in the sample) was 25.2 nm, and the surface roughness Ra was 2.8 nm.

(比較例5) (Comparative Example 5)

比較例5之使用陶瓷結合劑之超研磨粒砂輪之詳細如下述。 The details of the superabrasive grinding wheel using the ceramic bond of Comparative Example 5 are as follows.

陶瓷結合劑之組成同於實施例1。超研磨粒及氣孔形成材係使用同於實施例1者。首先,為了做成第一研磨粒層11,將陶瓷結合劑20%,與鑽石研磨粒40體積%,20μm之氣 孔形成材40體積%,添加已知的黏結劑混合後,藉由乾燥粉碎而得到既定之造粒粉。 The composition of the ceramic bond was the same as in Example 1. The superabrasive particles and the pore-forming material were used in the same manner as in Example 1. First, in order to form the first abrasive grain layer 11, 20% of the ceramic binder, 40% by volume of the diamond abrasive grains, and 20 μm of gas The pore-forming material was 40% by volume, and after mixing with a known binder, it was dried and pulverized to obtain a predetermined granulated powder.

接著,為了做成第一研磨粒層12,將陶瓷結合劑30%,與鑽石研磨粒30體積%,5μm之氣孔形成材40體積%,添加已知的黏結劑混合後,藉由乾燥粉碎而得到既定之造粒粉。 Next, in order to form the first abrasive grain layer 12, 30% of the ceramic binder, 30% by volume of the diamond abrasive grains, and 40% by volume of the pore-forming material of 5 μm are mixed with a known binder, and then dried and pulverized. A given granulated powder is obtained.

將如此所得到之第一超研磨粒層11之造粒粉65體積%與第二超研磨粒層12之造粒粉35體積%乾式混合後。沒有添加氣孔形成材。之後,以加壓成形成片狀之成形體,進行脫黏結劑處理,接著在溫度750℃進行燒成。 65 mol% of the granulated powder of the first superabrasive layer 11 thus obtained and 35 vol% of the granulated powder of the second superabrasive layer 12 were dry-mixed. No pore forming material was added. Thereafter, the formed body was formed into a sheet shape by pressurization, and debonding treatment was performed, followed by firing at a temperature of 750 °C.

將燒成完了之成形片,使用接著劑,接著於鋁合金製之底座金屬,使用以往之磨石進行整型.修整,使實施例3之使用陶瓷結合劑之鑽石砂輪(使用陶瓷結合劑之超研磨粒砂輪1)完成。 The formed sheet is fired, and an adhesive is used, followed by a base metal made of an aluminum alloy, and the conventional grinding stone is used for shaping. The dressing was carried out by using the diamond grinding wheel of the ceramic bond of Example 3 (super abrasive abrasive wheel 1 using a ceramic bond).

砂輪之尺寸為外徑200mm,超研磨粒層13之寬度為4mm,超研磨粒層13之厚度為5mm之片段型杯狀砂輪(JIS B4131 6A7S型)。 The size of the grinding wheel is 200 mm in outer diameter, the width of the superabrasive layer 13 is 4 mm, and the superabrasive layer 13 is a segment-shaped cup-shaped grinding wheel (JIS B4131 6A7S type) having a thickness of 5 mm.

完成之使用陶瓷結合劑之鑽石砂輪,可確認到在以5μm之氣孔與在其周邊以較研磨粒粒徑大之結合橋所構成之團之第二研磨粒層,適度的分散於藉由較粒徑小之結合橋所結合之第一研磨粒層內而存在。沒有設置起因於氣孔形成材之平均粒徑100μm程度之大的氣孔。 The completed diamond grinding wheel using the ceramic bond can be confirmed to have a second abrasive grain layer composed of a combination of a pore of 5 μm and a bridge having a larger particle size than the abrasive grain at the periphery thereof, and is moderately dispersed. The first abrasive grain layer combined with the small bridge of the particle size exists. No pores due to the average particle diameter of the pore-forming material of about 100 μm were provided.

在此,對於上述的內容,係藉由掃描式電子顯微鏡觀察預先準備之研磨粒層之切斷面之結果。 Here, the above contents are the results of observing the cut surface of the previously prepared abrasive grain layer by a scanning electron microscope.

將此實施例3之使用陶瓷結合劑之鑽石砂輪裝置在縱型旋轉桌方式之平面研磨盤,進行矽晶圓之研磨加工,確認本發明之效果。 The diamond grinding wheel using the ceramic bond of the third embodiment was placed on a flat grinding disc of a vertical rotary table type, and the enamel wafer was polished to confirm the effect of the present invention.

使用如第5圖所示之研磨加工方式100進行研磨加工,發現切割感在早期即變得不安定,有停止加工的必要。 Polishing was performed using the polishing method 100 shown in Fig. 5, and it was found that the cutting feeling became unstable at an early stage, and it was necessary to stop the processing.

實施例及比較例之結果示於表1。 The results of the examples and comparative examples are shown in Table 1.

在表1之判定欄中「○」表示良好的結果,「×」表示不好的結果。更且,「氣孔(20μm)」係表示平均粒徑20μm之氣孔形成材之比率,「氣孔(5μm)」係表示平均粒徑5μm之氣孔形成材之比率,「氣孔(100μm)」係表示平均粒100μm之氣孔形成材之比率。 In the judgment column of Table 1, "○" indicates a good result, and "X" indicates a bad result. In addition, "porosity (20 μm)" indicates the ratio of the pore-forming material having an average particle diameter of 20 μm, and "porosity (5 μm)" indicates the ratio of the pore-forming material having an average particle diameter of 5 μm, and "porosity (100 μm)" indicates the average. The ratio of the pore-forming material of 100 μm.

本次所開示之實施形態及實施例在任一點上皆應考量為例示而非限制的內容。本發明之範圍並非由於上述而是藉由申請專利之範圍而表示,意味著包含與專利申請範圍均等之意義以及範圍內之所有變更。 The embodiments and examples disclosed herein are to be considered as illustrative and not restrictive. The scope of the present invention is defined by the scope of the claims, and is intended to be

1‧‧‧使用陶瓷結合劑之超研磨粒砂輪 1‧‧‧Super abrasive grinding wheel with ceramic bond

10‧‧‧超研磨粒 10‧‧‧Superabrasive

11‧‧‧第一超研磨粒層 11‧‧‧First superabrasive layer

12‧‧‧第二超研磨粒層 12‧‧‧Second superabrasive layer

13‧‧‧超研磨粒層 13‧‧‧Superabrasive layer

20,30‧‧‧陶瓷結合劑 20,30‧‧‧Ceramic bonding agent

50‧‧‧氣孔 50‧‧‧ vent

51‧‧‧空孔 51‧‧‧ holes

Claims (9)

一種使用陶瓷結合劑之超研磨粒砂輪,具有藉由陶瓷結合劑而結合了超研磨粒之超研磨粒層,其中,前述超研磨粒層,係含有藉由前述陶瓷結合劑而將前述超研磨粒結合之第一超研磨粒層與前述超研磨粒係由於前述陶瓷結合劑而成為團之集合超研磨粒所形成之第二之超研磨粒層。 A superabrasive grinding wheel using a ceramic bond, comprising a superabrasive layer in which superabrasive grains are combined by a ceramic binder, wherein the superabrasive layer contains the superabrasive by the ceramic binder The first superabrasive layer combined with the granules and the superabrasive granules formed as a second superabrasive granule formed by the aggregate superabrasive grains due to the ceramic binder. 如申請專利範圍第1項之使用陶瓷結合劑之超研磨粒砂輪,其中,前述第一超研磨粒層之結合度,較前述第二超研磨粒層結合度低。 The superabrasive grinding wheel using the ceramic bonding agent according to the first aspect of the invention, wherein the first superabrasive layer has a lower degree of bonding than the second superabrasive layer. 如申請專利範圍第1或第2項之使用陶瓷結合劑之超研磨粒砂輪,其中,在前述第一超研磨粒層中,前述研磨粒之間係藉由較前述超研磨粒之粒徑還小的寬度之結合橋而結合。 A superabrasive grinding wheel using a ceramic bond according to the first or second aspect of the patent application, wherein in the first superabrasive layer, the abrasive grains are further separated by a particle diameter of the superabrasive grain A combination of small widths combined with bridges. 如申請專利範圍第1至第3項中任一項之使用陶瓷結合劑之超研磨粒砂輪,其中,在前述第二超研磨粒層中,前述研磨粒之間係藉由較前述超研磨粒之粒徑還大的寬度之結合橋而結合。 The superabrasive grinding wheel using a ceramic bonding agent according to any one of claims 1 to 3, wherein in the second superabrasive layer, the abrasive grains are separated by the super abrasive grains. The combination of the width and the width of the bridge is combined. 如申請專利範圍第1至4項中任一項之使用陶瓷結合劑之超研磨粒砂輪,其中,前述第二超研磨粒層包入了氣孔。 A superabrasive grinding wheel using a ceramic bond according to any one of claims 1 to 4, wherein the second superabrasive layer is coated with pores. 如申請專利範圍第1至5項中任一項之使用陶瓷結合劑之超研磨粒砂輪,其中,對於前述超研磨粒層全體之面積,在前述第一超研磨粒層中前述超研磨粒與前述陶瓷結合劑之合計所佔有之比率為10~50體積%,在前述第二超研磨 粒層中,超研磨粒與前述陶瓷結合劑之合計佔有之比率為5~30體積%。 A superabrasive grinding wheel using a ceramic bonding agent according to any one of claims 1 to 5, wherein the superabrasive grain and the superabrasive grain in the first superabrasive layer are The total amount of the ceramic binders is 10 to 50% by volume, in the second super-grinding In the granule layer, the ratio of the superabrasive grains to the total amount of the above-mentioned ceramic binder is 5 to 30% by volume. 如申請專利範圍第1至6項中任一項之使用陶瓷結合劑之超研磨粒砂輪,其中,前述陶瓷結合劑之軟化溫度為600~900℃。 The superabrasive grinding wheel using a ceramic bond according to any one of claims 1 to 6, wherein the ceramic bonding agent has a softening temperature of 600 to 900 °C. 如申請專利範圍第1至7項中任一項之使用陶瓷結合劑之超研磨粒砂輪,其中,係使用於含有矽、藍寶石以及化合物半導體之至少一種之晶圓的研磨加工。 A superabrasive grinding wheel using a ceramic bond according to any one of claims 1 to 7, which is used for polishing a wafer containing at least one of ruthenium, sapphire, and a compound semiconductor. 一種晶圓之製造方法,使用如申請專利範圍第1至7項中任一項之使用陶瓷結合劑之超研磨粒砂輪,而研磨加工含有矽、藍寶石以及化合物半導體之至少一種之晶圓的研磨加工。 A method of manufacturing a wafer using a superabrasive grinding wheel using a ceramic bond as disclosed in any one of claims 1 to 7, and grinding a wafer containing at least one of tantalum, sapphire, and a compound semiconductor machining.
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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI782178B (en) * 2018-02-08 2022-11-01 日商迪思科股份有限公司 Grinding method of holding surface

Families Citing this family (2)

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WO2019073753A1 (en) * 2017-10-11 2019-04-18 株式会社アライドマテリアル Vitrified bonded superabrasive wheel
CN113146487B (en) * 2021-01-21 2023-07-14 郑州伯利森新材料科技有限公司 Grinding wheel for precisely grinding monocrystalline silicon piece and preparation method thereof

Family Cites Families (8)

* Cited by examiner, † Cited by third party
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JPH03184771A (en) * 1989-12-13 1991-08-12 Kurenooton Kk Porous vitrified grinding wheel and manufacture thereof
JPH0716880B2 (en) * 1990-03-09 1995-03-01 株式会社ノリタケカンパニーリミテド Porous whetstone with huge pores
JPH06262528A (en) * 1993-03-05 1994-09-20 Honda Motor Co Ltd Manufacture of porous vitrified grinding wheel
JPH07108462A (en) * 1993-10-08 1995-04-25 Mitsubishi Materials Corp Vitrified bond grinding wheel with high grinding ratio
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JP4854132B2 (en) * 2001-05-10 2012-01-18 株式会社ミズホ Super finishing whetstone
JP4264869B2 (en) * 2002-01-22 2009-05-20 山口県 Grinding wheel
JP5316053B2 (en) * 2009-02-12 2013-10-16 日立工機株式会社 Porous vitrified bond whetstone and method for manufacturing the same

Cited By (1)

* Cited by examiner, † Cited by third party
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