TW201352052A - Support member, heating plate support device comprising the same, and heating device - Google Patents

Support member, heating plate support device comprising the same, and heating device Download PDF

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Publication number
TW201352052A
TW201352052A TW102101084A TW102101084A TW201352052A TW 201352052 A TW201352052 A TW 201352052A TW 102101084 A TW102101084 A TW 102101084A TW 102101084 A TW102101084 A TW 102101084A TW 201352052 A TW201352052 A TW 201352052A
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Taiwan
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plate
support
heating plate
heating
supporting
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TW102101084A
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Chinese (zh)
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TWI562671B (en
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Hideki Morimitsu
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Sintokogio Ltd
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    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05BELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B3/00Ohmic-resistance heating
    • H05B3/02Details
    • H05B3/06Heater elements structurally combined with coupling elements or holders
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05BELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B3/00Ohmic-resistance heating
    • H05B3/20Heating elements having extended surface area substantially in a two-dimensional plane, e.g. plate-heater
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05BELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B3/00Ohmic-resistance heating
    • H05B3/20Heating elements having extended surface area substantially in a two-dimensional plane, e.g. plate-heater
    • H05B3/22Heating elements having extended surface area substantially in a two-dimensional plane, e.g. plate-heater non-flexible

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  • Resistance Heating (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)

Abstract

The present invention provides a support member, a heating-plate support device and a heating device used in a bolster capable of inhibiting temperature difference and deformation caused by the part inside the heating plate. The support member 10 supporting the heating plate 20 is disposed on a plurality of parts of the bolster 30, and the support heating plate 20 is carried and supported by means of the upper surface 11a of the first supporting plate 11. The supporting member 10 includes: a first support plate 11, a support frame 12, and a second support plate 13. An upper surface 11a of the first support plate 11 works as a carrier surface S carrying the heating plate 20. The support frame 12 is the member as follows, which is disposed between the first support plate 11 and the second support plate 13, and becomes the heat resistance inhibitiing the heat flowing from the heating plate 20 through the support member 10 to the bolster 30. A horizontal contact surface area of the support frame 12 and the support plate 11 can be formed to be smaller than the carrier surface S.

Description

支持構件、包含其之加熱板支持裝置及加熱裝置 Support member, heating plate support device and heating device therewith

本發明係關於一種在用於抑制加熱板之變形的承板中使用之支持構件、包含其之加熱板支持裝置及加熱裝置。 The present invention relates to a support member used in a carrier for suppressing deformation of a heating plate, a heating plate supporting device including the same, and a heating device.

自先前以來,為了對平板狀被加熱物進行加熱,使用具備護套加熱器等加熱機構並形成為平板狀之加熱板。加熱板之材質為金屬製、陶瓷製等,但根據成本等理由,大多為金屬製。其中,銅或鋁由於熱傳導率大,故加熱面之溫度分佈易變得均勻,且易使功率密度變大,因此被廣泛用作加熱板之材料。 In order to heat the flat-shaped object to be heated, a heating plate having a heating means such as a sheath heater is used to form a flat plate. The material of the heating plate is made of metal, ceramics, etc., but it is mostly made of metal for reasons such as cost. Among them, since copper or aluminum has a large thermal conductivity, the temperature distribution of the heating surface tends to be uniform, and the power density is easily increased, so that it is widely used as a material for a heating plate.

然而,由於該等材料的楊氏模數低,因此由自重或外力產生之撓曲大,易在較低之使用溫度下產生蠕動變形,因此,有時利用剛性高之承板支持加熱板以抑制變形。此處,於利用承板支持加熱板之整個面之情形時,若存在面接觸不充分地發生接觸之部分與未發生接觸之部分,則有可能因導熱形態不同而產生大溫度分佈、撓曲。藉此,加熱板之加熱面之平面度有可能會降低。尤其於在真空中使用之情形時,非接觸部之導熱形態僅為輻射,因此,與接觸部之間的溫度差有可能會增大且產生更大之溫度差、撓曲。 However, since the Young's modulus of the materials is low, the deflection caused by the self-weight or the external force is large, and it is easy to generate creep deformation at a lower use temperature. Therefore, the support plate is sometimes supported by the rigid plate. Suppress deformation. Here, in the case where the support plate is used to support the entire surface of the heating plate, if there is a portion where the surface contact is insufficiently contacted and the portion where the contact is not made, there is a possibility that a large temperature distribution and deflection occur due to the difference in the heat conduction pattern. . Thereby, the flatness of the heating surface of the heating plate may be lowered. Especially in the case of use in a vacuum, the heat conduction form of the non-contact portion is only radiation, and therefore, the temperature difference with the contact portion may increase and cause a larger temperature difference and deflection.

作為改善溫度分佈之方法,可考慮如下兩種方法:如專利文獻1所記載之技術般,於承板與加熱板之間設置複數個圓柱狀支持構件, 並於兩者之間設置空間;或如專利文獻2所記載之技術般,使用前端形狀為圓錐等尖塔狀或半球狀之支持構件。 As a method of improving the temperature distribution, two methods can be considered: as in the technique described in Patent Document 1, a plurality of cylindrical support members are provided between the carrier plate and the heating plate, A space is provided between the two, or a support member having a pointed shape such as a cone or a hemispherical shape is used as in the technique described in Patent Document 2.

[先前技術文獻] [Previous Technical Literature] [專利文獻] [Patent Literature]

[專利文獻1]日本專利特開平10-95637號公報 [Patent Document 1] Japanese Patent Laid-Open No. Hei 10-95637

[專利文獻2]日本專利特開2002-246286號公報 [Patent Document 2] Japanese Patent Laid-Open Publication No. 2002-246286

然而,專利文獻1所記載之技術存在如下問題:於設置有支持構件之部分,自加熱板朝承板移動的熱之移動量增多,溫度分佈局部地變得不均勻。 However, the technique described in Patent Document 1 has a problem in that the amount of heat movement from the heating plate toward the carrier plate is increased in the portion where the support member is provided, and the temperature distribution is locally uneven.

又,專利文獻2所記載之技術存在如下問題:利用加熱板與支持構件之接觸部分增大熱阻,藉此,可抑制熱移動,但由於支持加熱板之面壓升高,故支持構件前端會嵌入至加熱板,另外,會阻礙由承板與加熱板之熱膨脹差引起之相對移動,從而產生新的變形或應力。 Further, the technique described in Patent Document 2 has a problem that the thermal resistance is increased by the contact portion of the heating plate and the supporting member, whereby the heat transfer can be suppressed, but the front surface of the supporting member is raised because the surface pressure of the supporting heating plate is increased. Will be embedded in the heating plate, in addition, will hinder the relative movement caused by the difference in thermal expansion between the carrier and the heating plate, resulting in new deformation or stress.

因此,本發明之目的在於:提供一種在可抑制加熱板之溫度差及變形之承板中使用之支持構件、包含其之加熱板支持裝置及加熱裝置。 Accordingly, it is an object of the present invention to provide a support member for use in a support plate capable of suppressing temperature difference and deformation of a heating plate, a heating plate support device including the same, and a heating device.

為了實現上述目的,本發明使用如下技術手段,申請專利範圍第1項所記載之發明係一種支持構件,用於將載置被加熱物進行加熱之平板狀加熱板支持成與抑制上述加熱板變形之平板狀承板分離,其特徵在於,具備:1個以上之支持板,其形成為小於上述加熱板的平板狀;及1個 以上之支持框架,其支持上述支持板;上述支持板與上述支持框架係交替地積層1層以上而設置;將上述加熱板載置且支持於最上部之支持板之上表面,且使上述支持板與上述支持框架之接觸面積小於上述載置面的面積。 In order to achieve the above object, the present invention uses the following technical means, and the invention described in claim 1 is a supporting member for supporting a flat heating plate on which a heating object is placed and suppressing deformation of the heating plate. The flat plate is separated by one or more supporting plates, which are formed in a flat shape smaller than the heating plate; and one The above support frame supports the support plate; the support plate and the support frame are alternately laminated with one or more layers; the heating plate is placed and supported on the upper surface of the uppermost support plate, and the support is provided The contact area of the board with the support frame is smaller than the area of the mounting surface.

根據申請專利範圍第1項所記載之發明,由於藉由支持構件 而與承板隔開地支持加熱板,因此相較於加熱板直接與承板接觸之情形,可使由加熱板內之部位導致之溫度差減小,並可有效果地抑制變形。 According to the invention described in claim 1 of the patent application, by the support member The heating plate is supported separately from the carrier plate, so that the temperature difference caused by the portion inside the heating plate can be reduced as compared with the case where the heating plate directly contacts the carrier plate, and the deformation can be suppressed effectively.

由於藉由支持板對加熱板進行面支持,因此支持構件不會嵌入至加熱板,或不會阻礙由承板與加熱板之熱膨脹差引起之相對移動,可抑制加熱板之變形並進行支持。 Since the heating plate is surface-supported by the support plate, the supporting member is not embedded in the heating plate, or the relative movement caused by the difference in thermal expansion between the carrier plate and the heating plate is not hindered, and deformation and support of the heating plate can be suppressed.

進而,由於可藉由支持框架使支持構件產生大熱阻,因此可抑制自加熱板流向承板之熱量。 Further, since the support member can generate a large thermal resistance by the support frame, the heat flowing from the heating plate to the carrier can be suppressed.

藉此,可抑制由加熱板內之部位導致之溫度差及變形。 Thereby, the temperature difference and deformation caused by the portion in the heating plate can be suppressed.

如申請專利範圍第1項之發明所記載之支持構件,申請專利範圍第2項所記載之發明使用如下技術手段:對上述最上部之支持板之上表面的端部實施倒角加工。 In the invention described in the second aspect of the invention, the invention described in claim 2 uses the following technical means: chamfering the end portion of the upper surface of the uppermost support plate.

根據申請專利範圍第2項所記載之發明,即便於加熱板相對於支持板發生相對移動之情形時,亦不會於與加熱板接觸之支持板之上表面的端部產生過大之應力,故較佳。 According to the invention described in the second aspect of the patent application, even when the heating plate is relatively moved with respect to the support plate, excessive stress is not generated at the end portion of the upper surface of the support plate which is in contact with the heating plate. Preferably.

如申請專利範圍第1或2項所記載之支持構件,申請專利範圍第3項所記載之發明使用如下技術手段:上述支持板與上述支持框架係一體地形成。 In the invention described in claim 3, the invention described in claim 3 uses the following technical means: the support plate is integrally formed with the support frame.

根據申請專利範圍第3項所記載之發明,可減少支持構件之 零件數,從而可在將支持構件配置於承板之步驟中實現省力化。 According to the invention described in claim 3 of the patent application, the support member can be reduced The number of parts makes it possible to save labor in the step of arranging the support member on the carrier.

如申請專利範圍第1或2項所記載之支持構件,申請專利範圍第4項所記載之發明使用如下技術手段:上述支持板與上述支持框架構成球座。 In the invention described in claim 4, the invention described in claim 4 uses the following technical means: the support plate and the support frame constitute a ball seat.

如申請專利範圍第4項所記載之發明般構成支持構件,藉此,當將加熱板載置於支持構件時會自動地調心,因此可穩定地進行支持。 The support member is configured as in the invention described in the fourth aspect of the invention, whereby the heating plate is automatically aligned when it is placed on the support member, so that the support can be stably performed.

申請專利範圍第5所記載之發明使用如下技術手段:該發明係具備複數個如申請專利範圍第1至4項中任一項所記載之支持構件、及承板之加熱板支持裝置,於各支持構件最上部之支持板的上表面構成載置上述加熱板且加以支持的載置面,上述載置面之大小及上述支持構件在上述承板中之配置係以可抑制上述加熱板之變形之方式構成。 The invention described in claim 5 uses the following technical means: the invention includes a plurality of support members and a support plate for a support plate according to any one of claims 1 to 4, The upper surface of the support plate at the uppermost portion of the support member constitutes a mounting surface on which the heating plate is placed and supported, and the size of the mounting surface and the arrangement of the support member in the carrier plate are such that deformation of the heating plate can be suppressed The way it is structured.

如申請專利範圍第5項所記載之發明般,將複數個支持構件適當地配置於承板,藉此,可構成可抑制加熱板之變形的加熱板支持裝置。 As in the invention described in the fifth aspect of the invention, a plurality of supporting members are appropriately disposed on the carrier, whereby a heating plate supporting device capable of suppressing deformation of the heating plate can be constructed.

如申請專利範圍第5項所記載之加熱板支持裝置,申請專利範圍第6所記載之發明使用如下技術手段:於上述加熱板由金屬材料構成之情形,將上述加熱板之重量除以上述載置面之面積所求得之面壓為使用溫度之0.2%安全限應力以下。 According to the heating plate supporting device of the fifth aspect of the invention, the invention described in claim 6 uses the following technical means: when the heating plate is made of a metal material, the weight of the heating plate is divided by the load. The surface pressure obtained by the area of the surface is below the safety limit of 0.2% of the service temperature.

如申請專利範圍第6項所記載之發明般,使面壓為使用溫度之0.2%安全限應力以下,藉此,可更有效果地抑制加熱板之與支持構件發生接觸之接觸部附近的變形。 According to the invention described in the sixth aspect of the invention, the surface pressure is equal to or less than 0.2% of the service temperature, whereby the deformation of the vicinity of the contact portion of the heating plate in contact with the support member can be more effectively suppressed. .

申請專利範圍第7所記載之發明使用如下加熱裝置這一技術手段,該加熱裝置具備申請專利範圍第5或6項所記載之加熱板支持裝 置、與上述加熱板。 The invention described in claim 7 uses the following technical means of a heating device having the heating plate support described in claim 5 or 6. Set and the above heating plate.

根據申請專利範圍第7項所記載之發明,由於可抑制加熱板之變形及溫度差,因此可形成加熱板之平面度高且可實現均勻加熱之加熱裝置。 According to the invention of the seventh aspect of the invention, since the deformation of the heating plate and the temperature difference can be suppressed, a heating device having a high flatness of the heating plate and uniform heating can be formed.

S‧‧‧載置面 S‧‧‧ mounting surface

1‧‧‧加熱裝置 1‧‧‧heating device

2‧‧‧加熱板支持裝置 2‧‧‧Heating plate support device

10‧‧‧支持構件 10‧‧‧Support components

11‧‧‧第1支持板 11‧‧‧1st support board

11a‧‧‧上表面 11a‧‧‧ upper surface

11b‧‧‧下表面 11b‧‧‧ lower surface

11c‧‧‧承接部 11c‧‧‧Receiving Department

11d‧‧‧端部 11d‧‧‧End

12‧‧‧支持框架 12‧‧‧Support framework

12a‧‧‧本體 12a‧‧‧ Ontology

12b‧‧‧突起部 12b‧‧‧Protruding

13‧‧‧第2支持板 13‧‧‧2nd support board

13a‧‧‧上表面 13a‧‧‧Upper surface

13b‧‧‧下表面 13b‧‧‧ lower surface

13c‧‧‧承接部 13c‧‧‧Receiving Department

20‧‧‧加熱板 20‧‧‧heating plate

20a‧‧‧上表面 20a‧‧‧ upper surface

30‧‧‧承板 30‧‧‧ board

30a‧‧‧上表面 30a‧‧‧ upper surface

30b‧‧‧固定部 30b‧‧‧Fixed Department

圖1係表示本發明之支持構件、包含其之加熱板支持裝置及加熱裝置的構造的剖面說明圖。 Fig. 1 is a cross-sectional explanatory view showing a structure of a supporting member, a heating plate supporting device and a heating device including the same according to the present invention.

圖2係表示支持構件之構造的說明圖。圖2(A)係剖面說明圖,圖2(B)係圖2(A)之A-A箭視圖。 Fig. 2 is an explanatory view showing the configuration of a supporting member. Fig. 2(A) is a cross-sectional explanatory view, and Fig. 2(B) is an A-A arrow view of Fig. 2(A).

圖3係表示支持構件之配置之變更例的說明圖。圖3(A)係剖面說明圖,圖3(B)係圖3(A)之A-A箭視圖。 Fig. 3 is an explanatory view showing a modified example of the arrangement of the support members. Fig. 3(A) is a cross-sectional explanatory view, and Fig. 3(B) is an A-A arrow view of Fig. 3(A).

圖4係表示支持構件之構造之變更例的說明圖。圖4(A)中,上圖係交替地設置有複數層之第1支持板與支持框架之構成的剖面說明圖,下圖係上圖之A-A箭視圖。圖4(B)係將支持框架直接設置於承板上之構成的剖面說明圖。 4 is an explanatory view showing a modified example of the structure of the support member. In Fig. 4(A), the upper drawing is a cross-sectional explanatory view showing a configuration in which a plurality of first support plates and a support frame are alternately provided, and the lower view is an A-A arrow view of the above figure. Fig. 4(B) is a cross-sectional explanatory view showing a configuration in which the support frame is directly placed on the carrier.

圖5係表示支持構件之構造之變更例的剖面說明圖。 Fig. 5 is a cross-sectional explanatory view showing a modified example of the structure of the support member.

參照圖對本發明之支持構件、包含其之加熱板支持裝置及加熱裝置進行說明。 The supporting member of the present invention, the heating plate supporting device including the same, and the heating device will be described with reference to the drawings.

如圖1所示,加熱裝置1具備:加熱板20,其將被加熱物載置於作為加熱面之上表面20a並進行加熱;以及支持構件10,其支持用 於抑制加熱板20之變形的承板30及加熱板20。此處,承板30及支持構件10構成支持加熱板20之加熱板支持裝置2。加熱裝置1收容於腔室等,且亦可於環境控制下對被加熱物進行加熱。 As shown in Fig. 1, the heating device 1 includes a heating plate 20 that mounts the object to be heated as a heating surface upper surface 20a and heats it, and a support member 10 for supporting The carrier 30 and the heating plate 20 for suppressing deformation of the heating plate 20. Here, the carrier 30 and the support member 10 constitute a heating plate support device 2 that supports the heating plate 20. The heating device 1 is housed in a chamber or the like, and can also heat the object to be heated under environmental control.

加熱板20係形成為平板狀之加熱器單元,其於銅或鋁等之金屬板之內部埋入有護套加熱器,可進行均勻之面加熱。作為加熱方法,亦可採用利用經加熱之油等熱媒體之循環的方法、及藉由電磁感應而自加熱之方法等。 The heating plate 20 is formed into a flat heater unit, and a sheath heater is embedded in a metal plate such as copper or aluminum to perform uniform surface heating. As the heating method, a method of recycling by a heat medium such as heated oil, a method of self-heating by electromagnetic induction, or the like may be employed.

承板30係用於抑制加熱板20之蠕動變形等變形之平板狀構件。對於承板30而言,由自重、外力、溫度差等引起之撓曲必需小,且必需熱性穩定。具體而言,要求承板30具有楊氏模數大、比重輕、熱膨脹係數小且抗蠕變性優異之性質,且承板30較佳由陶瓷材料構成。本實施狀態中,使用氧化鋁製承板30,可考慮加熱板20之使用溫度或使用環境、材質等而適當地選定材質。例如,可較佳地使用陶瓷材料,尤其是氧化鋁、莫來石、氧化鋯、氮化矽、碳化矽、及氮化鋁等陶瓷材料中之具有楊氏模數較大、比重較輕、熱膨脹係數較小且抗蠕變性優異之性質的材料。又,亦可使用耐熱合金。 The carrier 30 is a flat member for suppressing deformation such as creep deformation of the heating plate 20. For the carrier 30, the deflection caused by its own weight, external force, temperature difference, etc., must be small and must be thermally stable. Specifically, the carrier 30 is required to have a large Young's modulus, a light specific gravity, a small thermal expansion coefficient, and excellent creep resistance, and the carrier 30 is preferably made of a ceramic material. In the present embodiment, the alumina carrier plate 30 is used, and the material can be appropriately selected in consideration of the use temperature of the heater plate 20, the use environment, the material, and the like. For example, a ceramic material, particularly a ceramic material such as alumina, mullite, zirconia, tantalum nitride, tantalum carbide, or aluminum nitride, has a large Young's modulus and a light specific gravity. A material having a small coefficient of thermal expansion and excellent creep resistance. Further, a heat resistant alloy can also be used.

支持構件10係設置於承板30之複數個部位,藉由第1支持板11之上表面11a構成載置面S,該載置面S載置且支持加熱板20。藉此,承板30可於在複數個部位經由複數個支持構件10而與加熱板20隔開之狀態下支持加熱板20。藉此,於自加熱板20朝向承板30之熱傳遞中,輻射及對流佔支配地位,因此相較於加熱板20直接與承板30接觸之情形,可使由加熱板內之部位導致之溫度差減小,並可更有效果地抑制變形。 The support member 10 is provided at a plurality of portions of the carrier 30, and the mounting surface S is formed by the upper surface 11a of the first support plate 11, and the mounting surface S is placed and supported by the heating plate 20. Thereby, the carrier 30 can support the heating plate 20 in a state where it is separated from the heating plate 20 via a plurality of supporting members 10 at a plurality of locations. Thereby, in the heat transfer from the heating plate 20 toward the carrier 30, the radiation and the convection dominate, so that the contact between the heating plate 20 and the carrier 30 can be caused by the portion inside the heating plate. The temperature difference is reduced, and deformation can be suppressed more effectively.

支持構件10係以可使加熱板20之上表面20a之平面度維持既定精度之個數配置於承板30。此處,根據改善溫度分佈且維持加熱板20之上表面20a之平面度的觀點,較佳為無大偏移地配置盡可能少之數量的支持構件10。於本實施形態中,對稱地配置有4個支持構件10,但並不限定於此。 The support member 10 is disposed on the carrier 30 such that the flatness of the upper surface 20a of the heating plate 20 is maintained at a predetermined accuracy. Here, from the viewpoint of improving the temperature distribution and maintaining the flatness of the upper surface 20a of the heater board 20, it is preferable to dispose the support members 10 as small as possible without a large offset. In the present embodiment, the four support members 10 are symmetrically arranged, but the present invention is not limited thereto.

為了減少朝外部釋放之熱量並抑制溫度差,加熱板20與承板30之間隙較佳為設置得盡可能小。例如,於將兩板間的間隙設置得較大之情形時,由自處於兩板側面全周之間隙朝向其周邊之對流、輻射所致的散熱量增多,側面全周的溫度降低,兩板均易產生由溫度分佈導致之變形。藉此,間隙越小,則越可抑制變形。又,當根據構造或組裝上之原因而必需將間隙設定得較大時,亦可將陶瓷棉等隔熱材料填充至加熱板20與承板30之間,抑制自間隙朝周邊散熱。 In order to reduce the amount of heat released to the outside and suppress the temperature difference, the gap between the heating plate 20 and the carrier 30 is preferably set as small as possible. For example, when the gap between the two plates is set to be large, the amount of heat dissipation due to convection and radiation from the gap around the entire circumference of the two plates toward the periphery thereof increases, and the temperature of the entire side of the side is lowered, and the two plates are lowered. Both are prone to deformation caused by temperature distribution. Thereby, the smaller the gap, the more the deformation can be suppressed. Further, when it is necessary to set the gap to be large depending on the structure or assembly, a heat insulating material such as ceramic wool may be filled between the heating plate 20 and the carrier 30 to suppress heat dissipation from the gap toward the periphery.

圖2表示支持構件10之構造。支持構件10係以如下方式被定位並被配置,即,於形成於承板30之既定位置且由具有凹部或段差構成之貫通孔的固定部30b處,上表面11a自承板30之上表面30a略微突出。 FIG. 2 shows the configuration of the support member 10. The support member 10 is positioned and configured in such a manner that the upper surface 11a is on the upper surface of the self-supporting plate 30 at the fixing portion 30b formed at a predetermined position of the carrier 30 and having a through hole having a recess or a step. 30a is slightly protruding.

支持構件10具備:第1支持板11、支持框架12及第2支持板13。構成支持構件10之材料可使用與承板30相同之材料,於本實施形態中使用氧化鋁。 The support member 10 includes a first support plate 11 , a support frame 12 , and a second support plate 13 . The material constituting the support member 10 can be made of the same material as the carrier 30, and alumina is used in the present embodiment.

第1支持板11形成為圓板狀,且上表面11a成為載置加熱板20之載置面S。於下表面11b上形成有用於對支持框架12進行定位之承接部11c。 The first support plate 11 is formed in a disk shape, and the upper surface 11a serves as a mounting surface S on which the heating plate 20 is placed. A receiving portion 11c for positioning the support frame 12 is formed on the lower surface 11b.

為了使自加熱板20經由支持構件10傳遞至承板30之熱量 減少,較佳為減小第1支持板11之上表面11a之面積,為了抑制加熱板20產生變形之情形例如第1支持板11嵌入至因高溫而軟化之加熱板20,必需不使面壓升高。例如,只要以使如下面壓為使用溫度之0.2%安全限應力以下之方式進行設定即可,上述面壓係將加熱板20之重量除以載置面S之合計面積所求得之面壓。藉此,可更有效果地抑制加熱板20之變形。 In order to transfer heat from the heating plate 20 to the carrier 30 via the support member 10 It is preferable to reduce the area of the upper surface 11a of the first support plate 11, and to suppress deformation of the heating plate 20, for example, the first support plate 11 is embedded in the heating plate 20 softened by high temperature, and it is necessary to prevent surface pressure. Raise. For example, the surface pressure is determined by dividing the weight of the heating plate 20 by the total area of the mounting surface S by setting the pressure to be lower than the safety limit of 0.2% of the use temperature. . Thereby, the deformation of the heating plate 20 can be suppressed more effectively.

上表面11a被精加工至不阻礙加熱板20之水平方向之移動的表面粗糙度。又,較佳為藉由角圓化加工對上表面11a之端部11d實施倒角加工。藉此,即便於加熱板20相對於第1支持板11發生相對移動之情形時,亦不會於上表面11a之端部產生過大之應力。亦可代替角圓化加工,藉由去角加工實施倒角加工。 The upper surface 11a is finished to a surface roughness that does not hinder the movement of the heating plate 20 in the horizontal direction. Further, it is preferable that chamfering is performed on the end portion 11d of the upper surface 11a by corner rounding. Thereby, even when the heating plate 20 is relatively moved with respect to the first support plate 11, the excessive stress is not generated at the end portion of the upper surface 11a. Instead of corner rounding, chamfering can be performed by chamfering.

此處,只要上表面11a為平面,則第1支持板11之外周形狀可為圓板狀以外之形狀,亦可設為橢圓或多邊形等。 Here, as long as the upper surface 11a is a flat surface, the outer peripheral shape of the first support plate 11 may have a shape other than a disk shape, and may be an ellipse or a polygon.

第2支持板13係與第1支持板11同樣地形成為圓形平板狀,且下表面13b由承板30支持。於上表面13a上形成有用於對支持框架12進行定位的承接部13c。於本實施形態中,雖設為與第1支持板11相同之形狀,但只要可經由支持框架12適當地支持第1支持板11,則形狀任意。然而,若形狀較大,則必需使承板30之固定部30b變大,有可能會導致承板30之強度降低,因此,若設為過大之形狀則不佳。此處,較佳為以不於第2支持板13與承板30之間產生由熱膨脹差引起之應力之方式,利用與承板30相同之材料構成第2支持板13。 The second support plate 13 is formed into a circular flat plate shape similarly to the first support plate 11, and the lower surface 13b is supported by the carrier plate 30. A receiving portion 13c for positioning the support frame 12 is formed on the upper surface 13a. In the present embodiment, the shape is the same as that of the first support plate 11. However, the shape of the first support plate 11 can be appropriately supported via the support frame 12. However, if the shape is large, the fixing portion 30b of the receiving plate 30 must be made large, and the strength of the receiving plate 30 may be lowered. Therefore, it is not preferable if the shape is too large. Here, it is preferable that the second support plate 13 is made of the same material as the carrier plate 30 so that the stress caused by the difference in thermal expansion does not occur between the second support plate 13 and the carrier plate 30.

支持框架12為如下構件,其介於第1支持板11與第2支持板13之間,且成為抑制經由支持構件10自加熱板20流向承板30之熱量的 熱阻。於本實施形態中,支持框架12於圓柱狀之本體12a之兩端部具有突起部12b,且該突起部12b分別嵌合於第1支持板11之承接部11c及第2支持板13之承接部13c,從而被定位且配置於第1支持板11與第2支持板13之間。 The support frame 12 is a member interposed between the first support plate 11 and the second support plate 13 and is configured to suppress heat flowing from the heating plate 20 to the carrier plate 30 via the support member 10. Thermal resistance. In the present embodiment, the support frame 12 has projections 12b at both end portions of the cylindrical body 12a, and the projections 12b are fitted to the receiving portions 11c of the first support plate 11 and the second support plate 13 respectively. The portion 13c is positioned and disposed between the first support plate 11 and the second support plate 13.

支持框架12係以使支持框架12與第1支持板11之水平面之接觸面積小於第1支持板11之上表面11a即載置面S之面積的方式形成。支持框架12對於自加熱板20朝第1支持板11傳遞且朝向承板30之熱流而言,作為大熱阻而發揮作用,因此可減少經由支持構件10自加熱板20流向承板30之熱量。藉此,可抑制由加熱板20內之部位導致之溫度差及變形。 The support frame 12 is formed such that the contact area between the support frame 12 and the horizontal surface of the first support plate 11 is smaller than the area of the upper surface 11a of the first support plate 11, that is, the mounting surface S. The support frame 12 functions as a large heat resistance for the heat flow transmitted from the heating plate 20 toward the first support plate 11 and toward the carrier plate 30, so that heat flowing from the heating plate 20 to the carrier plate 30 via the support member 10 can be reduced. . Thereby, the temperature difference and deformation caused by the portion in the heating plate 20 can be suppressed.

於加熱裝置1之使用環境中,若支持框架12作為支持構件10之構件具有充分之構造強度,則較佳為以使水平方向之剖面形狀盡可能減小之方式形成支持框架12,以增大熱阻。此處,於本實施形態中,支持框架12之剖面形狀形成為圓形,但並不限定於此,可採用各種形狀。 In the environment in which the heating device 1 is used, if the support frame 12 has sufficient structural strength as a member of the support member 10, it is preferable to form the support frame 12 in such a manner that the cross-sectional shape in the horizontal direction is as small as possible to increase Thermal resistance. Here, in the present embodiment, the cross-sectional shape of the support frame 12 is formed in a circular shape, but the shape is not limited thereto, and various shapes may be employed.

支持框架12較佳為如第1支持板11之承接部11c及第2支持板13之承接部13c等般,將彼此設置之凸凹加以組合等而進行定位,定位方法並無特別限定。亦可將支持框架12設為無突起部12b之圓柱形狀,且將承接部11c及承接部13c形成為與該圓柱形狀相匹配之形狀。又,只要可利用支持框架12穩定地支持第1支持板11,則亦不一定設置承接部等。 The support frame 12 is preferably positioned such that the receiving portion 11c of the first support plate 11 and the receiving portion 13c of the second support plate 13 are combined with each other, and the positioning method is not particularly limited. The support frame 12 may be formed in a cylindrical shape without the protruding portion 12b, and the receiving portion 11c and the receiving portion 13c may be formed in a shape matching the cylindrical shape. Moreover, as long as the first support plate 11 can be stably supported by the support frame 12, the receiving portion or the like is not necessarily provided.

為了增大熱阻,支持1個第1支持板11之支持框架12的個數越少越佳,但為了獲得穩定之支持狀態,較佳為使用複數個支持框架12,如圖3所示,更佳為利用3個支持框架進行支持。此處,複數個支持框架12與第1支持板11在水平面上發生接觸之面積係小於第1支持板11與加 熱板20發生接觸之面積。 In order to increase the thermal resistance, the number of the support frames 12 supporting one first support board 11 is preferably as small as possible, but in order to obtain a stable support state, it is preferable to use a plurality of support frames 12, as shown in FIG. Better to support with 3 support frameworks. Here, the area in which the plurality of support frames 12 and the first support plate 11 are in contact with each other on the horizontal surface is smaller than that of the first support plate 11 and The area in which the hot plate 20 contacts.

為了進一步抑制自加熱板20朝承板30導熱,如圖4(A)所示,亦可交替地重疊複數層地設置第1支持板11與支持框架12。此處,第1層之3個支持框架12與第2層之3個支持框架12係以連結第1支持板與第2支持板之各圓柱之中心線之線上的一點作為中點,呈點對稱地配置。 In order to further suppress heat conduction from the heating plate 20 toward the carrier 30, as shown in FIG. 4(A), the first support plate 11 and the support frame 12 may be alternately stacked in a plurality of layers. Here, the three support frames 12 of the first layer and the three support frames 12 of the second layer are connected at a point on the line connecting the center lines of the respective columns of the first support plate and the second support plate as a midpoint. Symmetrically configured.

又,亦可採用如下構成:如圖4(B)所示,將支持框架12直接設置於承板30上,以支持第1支持板11。 Further, as shown in FIG. 4(B), the support frame 12 may be directly provided on the carrier 30 to support the first support plate 11.

支持構件10如圖5所示,可以由第1支持板11及第2支持板13與支持框架12構成球座之方式形成。藉此,當將加熱板20載置於支持構件10時,藉由球座而自動地調心,因此可穩定地支持加熱板20。 As shown in FIG. 5, the support member 10 can be formed by the first support plate 11 and the second support plate 13 and the support frame 12 forming a ball seat. Thereby, when the heating plate 20 is placed on the support member 10, the core is automatically aligned by the ball seat, so that the heating plate 20 can be stably supported.

亦可一體地形成第1支持板11或第2支持板13與支持框架12。藉此,可減少支持構件10的零件數,從而可在將支持構件10配置於承板30之步驟中實現省力化。 The first support plate 11 or the second support plate 13 and the support frame 12 may be integrally formed. Thereby, the number of parts of the support member 10 can be reduced, and labor saving can be achieved in the step of disposing the support member 10 on the carrier 30.

(實施形態之效果) (Effects of the embodiment)

根據本發明之支持構件10,由於與承板30隔開地支持加熱板20,因此相較於加熱板20直接與承板30接觸之情形,可使由加熱板內之部位導致之溫度差減小,並可有效果地抑制變形。 According to the support member 10 of the present invention, since the heating plate 20 is supported spaced apart from the carrier 30, the temperature difference caused by the portion inside the heating plate can be reduced as compared with the case where the heating plate 20 is directly in contact with the carrier 30. Small, and can effectively suppress deformation.

由於藉由支持板11對加熱板20進行面支持,因此支持構件10不會嵌入至加熱板20,或不會阻礙由承板30與加熱板20之熱膨脹差引起之相對移動,可抑制加熱板20之變形並進行支持。 Since the heating plate 20 is surface-supported by the support plate 11, the support member 10 is not embedded in the heating plate 20, or the relative movement caused by the difference in thermal expansion between the carrier 30 and the heating plate 20 is not hindered, and the heating plate can be suppressed. 20 deformation and support.

進而,由於可藉由支持框架12使支持構件10產生大熱阻,因此可抑制自加熱板20流向承板30之熱量。 Further, since the support member 10 can be made to have a large thermal resistance by the support frame 12, the amount of heat flowing from the heating plate 20 to the carrier 30 can be suppressed.

藉此,可抑制由加熱板20內之部位導致之溫度差及變形。又,具備複數個支持構件10與承板30之加熱板支持裝置2係將複數個支持構件10適當地配置於承板30,藉此,構成為可抑制加熱板20之變形的加熱板支持裝置。而且,由於具備加熱板支持裝置2及加熱板20之加熱裝置1可抑制加熱板20之變形及由加熱板內之部位導致之溫度差,因此可形成加熱板20之平面度高且可實現均勻加熱之加熱裝置。 Thereby, the temperature difference and deformation caused by the portion in the heating plate 20 can be suppressed. Further, the hot plate supporting device 2 including the plurality of supporting members 10 and the carrier 30 is configured to appropriately arrange the plurality of supporting members 10 on the carrier 30, thereby configuring the heating plate supporting device capable of suppressing deformation of the heating plate 20. . Further, since the heating device 1 including the heating plate supporting device 2 and the heating plate 20 can suppress the deformation of the heating plate 20 and the temperature difference caused by the portion inside the heating plate, the flatness of the heating plate 20 can be formed and uniform Heating device for heating.

S‧‧‧載置面 S‧‧‧ mounting surface

11‧‧‧第1支持板 11‧‧‧1st support board

11a‧‧‧上表面 11a‧‧‧ upper surface

11b‧‧‧下表面 11b‧‧‧ lower surface

11c‧‧‧承接部 11c‧‧‧Receiving Department

11d‧‧‧端部 11d‧‧‧End

12‧‧‧支持框架 12‧‧‧Support framework

12a‧‧‧本體 12a‧‧‧ Ontology

12b‧‧‧突起部 12b‧‧‧Protruding

13‧‧‧第2支持板 13‧‧‧2nd support board

13a‧‧‧上表面 13a‧‧‧Upper surface

13b‧‧‧下表面 13b‧‧‧ lower surface

13c‧‧‧承接部 13c‧‧‧Receiving Department

20‧‧‧加熱板 20‧‧‧heating plate

30‧‧‧承板 30‧‧‧ board

30a‧‧‧上表面 30a‧‧‧ upper surface

30b‧‧‧固定部 30b‧‧‧Fixed Department

Claims (7)

一種支持構件,用於將載置被加熱物進行加熱之平板狀加熱板支持成與抑制上述加熱板變形之平板狀承板分離,其特徵在於,具備:1個以上之支持板,其形成為小於上述加熱板的平板狀;及1個以上之支持框架,其支持上述支持板;上述支持板與上述支持框架係交替地積層1層以上而設置;將上述加熱板載置且支持於最上部之支持板之上表面,且使上述支持板與上述支持框架之接觸面積小於上述載置面的面積。 A support member for supporting a flat heating plate on which a heating object is placed is supported and separated from a flat plate that suppresses deformation of the heating plate, and is characterized in that: one or more support plates are formed, and the support member is formed as a flat plate shape smaller than the heating plate; and one or more support frames supporting the support plate; the support plate and the support frame are alternately laminated one or more layers; and the heating plate is placed on the uppermost plate and supported on the uppermost portion The upper surface of the support plate is such that the contact area between the support plate and the support frame is smaller than the area of the mounting surface. 如申請專利範圍第1項之支持構件,其中對上述最上部之支持板之上表面的端部實施倒角加工。 A support member according to claim 1, wherein the end portion of the upper surface of the uppermost support plate is chamfered. 如申請專利範圍第1或2項之支持構件,其中上述支持板與上述支持框架係一體地形成。 A support member according to claim 1 or 2, wherein the support plate is integrally formed with the support frame. 如申請專利範圍第1或2項之支持構件,其中上述支持板與上述支持框架構成球座。 A support member according to claim 1 or 2, wherein the support plate and the support frame constitute a ball seat. 一種加熱板支持裝置,具備複數個如申請專利範圍第1至4項中任一項之支持構件及承板,其特徵在於:於各支持構件最上部之支持板的上表面構成載置上述加熱板且加以支持的載置面,上述載置面之大小及上述支持構件在上述承板中之配置係以可抑制上述加熱板之變形之方式構成。 A heating plate supporting device comprising a plurality of supporting members and a supporting plate according to any one of claims 1 to 4, wherein the upper surface of the supporting plate at the uppermost portion of each supporting member is configured to mount the heating The mounting surface supported by the plate, the size of the mounting surface, and the arrangement of the support member in the carrier are configured to suppress deformation of the heating plate. 如申請專利範圍第5項之加熱板支持裝置,其中於上述加熱板由金屬材料構成之情形,將上述加熱板之重量除以上述載置面之面積所求得 之面壓為使用溫度之0.2%安全限應力以下。 The heating plate supporting device of claim 5, wherein the heating plate is made of a metal material, and the weight of the heating plate is divided by the area of the mounting surface. The surface pressure is below the safety limit of 0.2% of the service temperature. 一種加熱裝置,其特徵在於具備:如申請專利範圍第5或6項之加熱板支持裝置、及上述加熱板。 A heating device comprising: a heating plate supporting device according to claim 5 or 6 of the patent application; and the heating plate.
TW102101084A 2012-05-31 2013-01-11 Support member, heating plate support device comprising the same, and heating device TW201352052A (en)

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