TW201351252A - Touch sensor - Google Patents

Abstract

The present invention is intended to provide a touch sensor having good electrical connection. The touch sensor according to the present invention has a plurality of transparent first electrode patterns and a plurality of transparent second electrode patterns, which are formed on a surface of a transparent substrate and extend in two directions that are perpendical cross to each other. The first electrode patterns have a plurality of first island-like electrode portions formed at an interval in a first direction on the substrate, and first bridge wiring portions forming an electrical connection between the neighboring first island-like electrode portions. The second electrode patterns have a plurality of second island-like electrode portions formed at an interval in a second direction crossing the first direction on the substrate. Further, a transparent insulation film is formed at least between the neighboring second island-like electrode portions of the second electrode patterns and on two shores thereof, and second bridge wiring portions are formed independent of the second electrode patterns to form an electrical connection between the neighboring second island-like electrode portions of the second electrode patterns via a pair of through holes of the insulation film positioning on the two shores.

Description

Touch sensor

The present invention relates to a projected capacitive touch sensor disposed in front of a display device or the like.

In the prior art, components such as a capacitive touch sensor used in a mobile phone or the like are combined in a layered manner as shown in Fig. 5 (Patent Document 1 below).

In the example of FIG. 5, the liquid crystal display device 70, the projected capacitive touch sensor 71 disposed in front of the liquid crystal display device 70, and the cover glass disposed in front of the capacitive touch sensor 71 are shown. ) 72 example. In the fifth drawing, the pair of transparent substrates 81 and 82 constituting the display device 70 sandwich the liquid crystal 83 in a space sealed by the sealing material 84. Further, liquid crystal display electrodes 85 are formed on the transparent substrates 81 and 82, and a polarizing plate 86 is disposed. Further, the reference numeral 87 is a driving IC, and the driving IC 87 is connected to a control substrate (not shown) as a source of image data transmission through a flexible substrate 88.

On the front surface of the liquid crystal display device 70 configured as described above, a capacitive touch sensor 71 including a transparent substrate 91 provided with a sensing application electrode 92 is disposed. The projected capacitive touch sensor 71 senses that a conductor such as a human finger is disposed close to the transparent substrate 91. The change in capacitance caused by the sensing electrode 92 detects the touch position. More specifically, the finger proximity application electrode 92 forms a capacitance between the finger and the sensing application electrode 92, and this change is detected by a projected capacitive sensing application IC (not shown) connected through the flexible substrate 95. Further, Fig. 5 shows an example in which the sensing application electrode 92 is formed as a series electrode extending in two directions crossing each other. Therefore, an insulating film 93 is provided between the first electrode pattern extending in one direction and the first electrode pattern extending in the other direction so that both of them are electrically non-contact. In addition, a protective layer 96 for protecting the sensing application electrode 92 is provided in the capacitive touch sensor 71.

Further, in the example of FIG. 5, an example in which the protective glass 72 is disposed on the capacitive touch sensor 71 via the optical adhesive layer 99 is shown. Most of the peripheral portion of the cover glass 72 is decorated with a black print 97 or a hole.

Further, Patent Document 1 discloses that a plurality of first electrode patterns extending in the first direction and a plurality of second electrode patterns extending in the second direction are formed on one side surface of the transparent substrate 1 as the sensing electrode 92, and are in the first The second electrode pattern is formed in an intersecting shape in the intersection region between the electrode pattern and the first electrode pattern (Fig. 6 and two or more first island-shaped electrode portions 201 _c and 201 _d formed at intervals in the first direction ₎ And a first bridge wiring portion 202 formed between the two, and two or more second island-shaped electrode portions 201 _a and 201 _b ) formed at intervals in the second direction, and further including an insulating film 9 and a second In the bridge wiring portion 4 (see FIG. 7), the insulating film 9 covers the first electrode pattern that is not formed in the intersection region in the intersection region, and the second bridge wiring portion 4 is used to break the intersection region. The wiring formed in the connection state between the second island-shaped electrode portions of the second electrode pattern formed in the open state is formed so as to straddle the insulating film 9, wherein the second bridge wiring portion 4 is made of metal. The material is formed, and the insulating film is made of a material having shielding properties and insulation properties. Formation.

As described above, by forming the insulating film 9 between the first bridge wiring portion 202 and the second bridge wiring portion 4 which are provided in the first electrode pattern which is not formed in the intersecting region by the shielding material, It is possible to suppress the deterioration of the visibility due to the reflection of the bridge wire 4 formed of a metal material, that is, to suppress the high-luminance portion of the dot-like or linear glare which is generated in the intersection region between the first electrode pattern and the second electrode. This causes the user to feel a bad or visually uncomfortable feeling when viewing the LCD screen.

Further, in Patent Document 1 described above, the capacitive sensor of the above configuration is manufactured in the following manner. First, a transparent electrode pattern is formed on one side surface of a transparent substrate by patterning of a transparent conductive film, and includes a first electrode pattern extending in the first direction and a second electrode in a direction crossing the first direction The second electrode pattern extending in the direction, that is, the transparent electrode pattern in which the second electrode pattern is formed in a disconnected shape at the intersection of the first electrode pattern and the second electrode pattern. Next, an insulating shielding layer formed of a material having shielding properties and insulating properties is provided in an intersection region between the first electrode pattern and the second electrode pattern, and the insulating shielding layer is formed as a cover that is formed in the intersection region without being separated. An insulating film of the first electrode pattern. Then, on the same surface of the transparent substrate on which the insulating shielding layer is formed, patterning of the metal film formed by forming a conductive material made of a metal is performed, thereby forming a second bridge wiring portion.

Patent Document 1: Japanese Laid-Open Patent Publication No. 2011-90443

However, in the invention described in Patent Document 1, the second bridge wiring portion 4 is formed so as to straddle the insulating film 9, and if the second bridge wiring portion 4 cannot be patterned with high precision, the second bridge portion 4 is used. The contact area with the second island-shaped electrode portion determined by the outer edge of the bridge wiring portion 4 is mutated, which has a problem of affecting the contact resistance.

Therefore, an object of the present invention is to provide a touch sensor which can solve the above problems and has excellent electrical connectivity.

According to a first aspect of the present invention, a touch sensor having a plurality of transparent first electrode patterns and a plurality of transparent second electrodes extending on one surface of a transparent substrate and extending in a direction intersecting each other is provided. a pattern, wherein the first electrode pattern has a plurality of first island-shaped electrode portions formed at intervals along a first direction on the substrate; and the first bridge wiring portion is adjacent to the first electrode An electrical connection is formed between the island-shaped electrode portions, and the second electrode pattern has a plurality of second island-shaped electrode portions which are formed on the substrate and are formed at intervals in a second direction crossing the first direction. Further, at least a transparent insulating film is formed between the second island-shaped electrode portions adjacent to each other in the second electrode pattern and on both sides thereof; Further, a second bridge wiring portion formed separately from the second electrode pattern is formed, and the second bridge wiring portion is formed in the second electrode pattern between the pair of through holes provided on the both banks via the insulating film. An electrical connection is formed between the adjacent second island electrode portions.

Further, according to a second aspect of the present invention, a touch sensor according to the first aspect, wherein the insulating film is formed over the entire input region.

Further, according to a third aspect of the present invention, a touch sensor according to the first aspect, wherein the insulating film is formed only between the second island-shaped electrode portions adjacent to each other in the second electrode pattern and It is on both sides.

Further, according to a fourth aspect of the present invention, a touch sensor according to any one of the first to third aspects, wherein the second bridge wiring portion is a blackened metal thin wire.

Further, according to a fifth aspect of the present invention, a touch sensor according to the fourth aspect, wherein the blackening of the metal thin wires is performed by a black plating process.

Further, according to a sixth aspect of the invention, there is provided a touch sensor according to the fourth aspect, wherein the blackening of the metal thin wires is performed by an electrodeposition coating process.

Further, according to a seventh aspect of the invention, there is provided a touch sensor according to the fourth aspect, wherein the blackening of the metal thin wires is performed by a chemical conversion process.

Further, according to an eighth aspect of the present invention, a touch sensor according to any one of the fourth to seventh aspects, wherein the metal thin wire is any one of copper, aluminum, and nickel.

Further, according to a ninth aspect of the present invention, a touch sensor according to any one of the first to eighth aspects is provided, further comprising a polarizing plate at the front.

As described above, in the touch sensor of the present invention, the second bridge wiring portion is formed between the pair of through holes provided in the insulating film between the second island electrode portions adjacent to each other in the second electrode pattern. Form an electrical connection. Therefore, even if the patterning accuracy of the second bridge wiring portion is not high, the second bridge wiring portion has a predetermined contact area with the second island-shaped electrode portion in the through hole of the insulating film, so that a constant contact resistance is formed. There is no need to rely on an indefinite contact area between the outer edge of the second bridge wiring portion 4 and the second island-shaped electrode portion. That is, a touch sensor having excellent electrical connectivity can be obtained.

1, 81, 82, 91‧‧‧ transparent substrate

3‧‧‧Insulation film (transparent)

3a‧‧‧through hole

4‧‧‧2nd bridge wiring section (reflection)

5‧‧‧Wiring

9‧‧‧Insulation film (shadowing)

10‧‧‧First electrode pattern (X electrode pattern)

11, 202‧‧‧1st bridging wiring department

12, 201 _c , 201 _d ‧‧‧1st island electrode

13, 23‧‧‧ Connection Department

14, 92‧‧ ‧ application electrode

20‧‧‧2nd electrode pattern (Y electrode pattern)

22, 201 _a , 201 _b ‧‧‧2nd island electrode

30‧‧‧2nd bridging wiring department

70‧‧‧Liquid crystal display device

71, 101, 102‧‧‧ touch sensors

72‧‧‧protective glass

83‧‧‧LCD

84‧‧‧ Sealing material

85‧‧‧Liquid electrodes for liquid crystal display

86‧‧‧Polar plate

87‧‧‧Drive IC

88, 95‧‧‧Flexible substrate

93‧‧‧Insulation film

96‧‧‧Protective layer

97‧‧‧Black printing

99‧‧‧optical layer

Fig. 1 is a partial plan view showing the configuration of a touch sensor according to the first and third embodiments.

Figure 2 is a partial enlarged view of the vicinity of the intersection area.

Fig. 3 is a cross-sectional view taken along line A-A' in Fig. 2.

Fig. 4 is a partial plan view showing the configuration of the touch sensor of the second and fourth embodiments.

Fig. 5 is an explanatory view showing a configuration example of an electronic device including a capacitive touch sensor.

Fig. 6 is an explanatory view showing an example of patterning of a transparent electrode.

Figure 7 is an enlarged view showing a transparent substrate formed in the prior art. Explanation of the state of the bright electrode, the insulating film, and the bridge wiring.

[Formation of the Invention]

[Embodiment 1]

Hereinafter, embodiments of the present invention will be described with reference to the drawings. Fig. 1 is a schematic view showing an example of a touch sensor. Fig. 2 is a partial enlarged view of the vicinity of the intersection region. In addition, Fig. 3 is a partially enlarged view of the I-I line in Fig. 1 . The projected capacitive touch sensor 101 shown in FIG. 1 includes a transparent substrate 1 and a sensing application electrode 14 formed on the transparent substrate 1. The capacitive touch sensor 101 senses a change in capacitance caused by a conductor such as a human finger approaching the sensing application electrode 14 provided on the transparent substrate 1 to detect a touch position. Since the proximity of the finger is detected by the change in capacitance, the finger does not need to directly contact the sensing application electrode 14.

More specifically, the finger proximity sensing application electrode 14 forms a capacitance between the finger and the sensing application electrode 14, and this change is detected by a capacitive sensing application IC (not shown) connected through a flexible substrate (not shown). Knowing and detecting the touch position. The application electrode 14 and the flexible substrate are connected by a wiring 5. Further, the capacitive sensing application IC can be mounted on a flexible substrate or mounted on the transparent substrate 1.

In the example shown in FIG. 1, the sensing application electrode 14 has a plurality of X electrode patterns 10 as a first electrode pattern and a plurality of Y electrode patterns 20 as second electrode patterns on one side surface of the transparent substrate 1.

The X electrode pattern 10 extends in the X-axis direction as the first direction in the drawing, and has a plurality of columns arranged at intervals in the Y-axis direction. The Y electrode pattern 20 extends in the Y-axis direction as the second direction in the drawing, and along the X A plurality of rows are arranged in the axial direction at intervals. In addition, since the X electrode pattern 10 and the Y electrode pattern 20 intersect, the Y electrode pattern 20 is formed in a broken shape in the intersection region.

The X electrode pattern 10 has a plurality of first island-shaped electrode portions 12 arranged at intervals in the X-axis direction and a first bridge wiring portion 11 that connects adjacent first island-shaped electrode portions 12 in a single film. The first island-shaped electrode portion 12 is formed in a rectangular shape when viewed in plan, and is disposed such that one of the diagonal lines is parallel to the X-axis.

The Y electrode pattern 20 has a plurality of second island-shaped electrode portions 22 arranged at intervals in the Y-axis direction. The second island-shaped electrode portion 22 is formed in a rectangular shape when viewed in plan, and is disposed such that one of the diagonal lines is parallel to the Y-axis. The first island-shaped electrode portion 12 and the second island-shaped electrode portion 22 are arranged to be staggered in the X-axis direction and the Y-axis direction (arranged in a staggered manner), and the first island-shaped electrode portion having a rectangular shape when viewed in plan 12. The second island-shaped electrode portions 22 are arranged in a matrix.

Further, a transparent insulating film 3 is formed only between the second island-shaped electrode portions 22 adjacent to each other in the second electrode pattern 20 and on both sides thereof. Further, a second bridge wiring portion 30 (see FIGS. 2 and 3) formed separately from the second electrode pattern 20 is formed, and the second bridge wiring portion 30 is formed on both banks via the insulating film 3. Between the pair of through holes 3a, the second island-shaped electrode portions 22 adjacent to each other in the second electrode pattern are electrically connected to each other. Further, in the present invention, the second bridge wiring portion 30 does not span (i.e., spans the entire upper surface) the insulating film 3, but is formed only between the pair of through holes 3a and the through holes 3a on the upper surface of the insulating film 3.

As described above, the second bridge wiring portion is formed to be insulated The second island-shaped electrode portions adjacent to each other in the second electrode pattern are electrically connected between the pair of through holes of the film, whereby the patterning accuracy of the second bridge wire portion is not high, because Since the bridged wiring portion has a predetermined contact area with the second island-shaped electrode portion through the through hole of the insulating film, a constant contact resistance is formed, and the outer edge of the second bridge wiring portion 4 and the second island electrode are not required to be used. Uncertain contact area. That is, a touch sensor having excellent electrical connectivity can be obtained.

Further, the wiring 5 is formed on the peripheral portion of the transparent substrate 1, and one end thereof is connected to the X electrode pattern 10 and the Y electrode pattern 20, so that the signals perceived by the X electrode pattern 10 and the Y electrode pattern 20 can be transmitted to the outside. The other end of the wiring 5 is connected to a driving unit and a telecommunication conversion/calculation unit (all not shown) provided in the internal or external device of the touch sensor.

The transparent substrate 1 is an electrically insulating substrate, and may be, for example, a glass substrate, a PET (Polyethylene Terephthalate) film, a PC (Polycarbonate) film, or a COP (Cyclo-olefin Polymer). Cycloolefin polymer) film, PVC (Polyvinyl Chloride) film, and the like. Among them, a COP film is preferable, and it not only has excellent performance in optical equivalence, but also excellent in dimensional stability and even in processing precision. Further, when the transparent substrate 1 is a glass substrate, the thickness may be from 0.3 mm (mm) to 3 mm. Further, when the resin film used for the transparent substrate 1 is used, the thickness may be 20 μm (micrometer) to 3 mm.

The material constituting the transparent X electrode pattern 10 and the Y electrode pattern 20 is a transparent conductive film such as a metal oxide such as indium tin oxide (ITO), aluminum zinc oxide (AZO) or indium zinc oxide (IZO). In addition, transparent The thickness of the conductive film is required to be tens of nanometers (nano) to several hundreds of nm, and it is necessary to be able to be etched by an etching liquid which is not easily used in the patterning of the two bridge wiring portions 30 to be described later. Further, it has a light transmittance of 80% or more and a surface resistance value of several mΩ to several hundredsΩ.

As the transparent electrically insulating material constituting the transparent insulating film 3, an organic material such as an inorganic material such as SiO 2 or a photolithography resin can be used. Further, the shape of the through hole 3a of the insulating film 3 is not limited to the circular shape shown in FIG. 2, and may be, for example, an oblong shape or a circular shape, or may be an elliptical shape, a rectangular shape, a square shape, a rhombus shape, or the like. shape.

In the present embodiment, the second bridge wiring portion 30 and the wiring 5 are metal thin wires. The material of the fine metal wires can be a metal such as copper, aluminum, nickel, iron, gold, silver, chromium or titanium or an alloy of these metals. Among them, copper, aluminum, nickel, and the like are preferably used from the viewpoint of good conductivity, easy processing, and low cost.

Next, an example of a method of manufacturing the touch sensor 101 of the present embodiment will be described.

First, a transparent conductive film is formed on one side surface of the transparent substrate 1 by a sputtering method or the like, and the formed transparent conductive film is patterned by a photolithography technique or the like to be processed into X. The X electrode pattern 10 having a continuous shape extending in the axial direction and the Y electrode pattern 20 having a broken shape extending in the Y-axis direction are thereby formed to form the sensing electrode 14.

Next, spin coating is applied to the same surface of the transparent substrate 1 on which the application electrode 14 is formed (the surface on which the application electrode 14 is formed) A transparent insulating material is formed by a method such as a spin coat method, and then patterned by photolithography, whereby the region where the X electrode pattern 10 of the application electrode 14 and the Y electrode pattern 20 intersect is covered to cover only the second. The transparent insulating film 3 is patterned in a pattern between the adjacent adjacent island-shaped electrode portions 22 of the electrode pattern 20 and on both sides thereof.

Next, on the same surface (surface on which the insulating film 3 is formed) of the transparent substrate 1 on which the transparent insulating film 3 is formed, a film of a whole surface is formed by using a conductive material of a metal material by a method such as a sputtering method, and then used. Light lithography forms a specific pattern shape. In other words, the wiring 5 and the second thin metal strips electrically connected between the adjacent second island-shaped electrode portions 22 in the second electrode pattern are formed by the wiring 5 and the pair of through holes 3a provided in the insulating film 3 2 Bridge the wiring portion 30. As described above, since the second bridge wiring portion 30 and the wiring 5 are simultaneously formed, it can be completed with a small number of steps.

[Embodiment 2]

In the touch sensor 102 of the second embodiment, the transparent insulating film 3 having the through holes 3a is formed only between the second island-shaped electrode portions 22 adjacent to each other in the second electrode pattern 20 as in the first embodiment. On the other side, it is formed in the entire input area (see Fig. 4), and the other configuration is the same as that in the first embodiment. With such a configuration, the surface of the transparent electrode can be protected and the reliability can be improved.

On the other hand, in the first embodiment, the transparent insulating film 3 having the through holes 3a is formed only between the second island-shaped electrode portions 22 adjacent to each other in the second electrode pattern 20, and on both sides thereof. At this time, there is an advantage that the visibility of the input area is excellent.

[Embodiment 3, 4]

In the third and fourth embodiments, the blackened metal thin wires are used as the second bridge wiring portion 30 and the wiring 5, and the other configurations are the same as those of the above-described first and second embodiments. At this time, even if the second bridge wiring portion 30 is made of a metal material, reflection does not occur due to the blackening, so that a dazzling dot-like or linear high-luminance portion does not occur in the intersection region of the transparent electrode pattern. Further, in Patent Document 1 proposed as a conventional technique, it is described that the insulating film 9 in the intersecting region has shielding properties as a countermeasure against metal reflection. However, a wide range of light shielding of the insulating film 9 having shielding properties may cause deterioration in visibility, that is, a dot-like or linear black portion that will lightly illuminate the pixels forever in the intersection of the transparent electrode patterns may become liquid crystal. The obstacles in the display of the screen have become new problems. On the other hand, in the third embodiment, the range of the light-shielding is the width of the blackened bridge wiring portion instead of the width of the insulating film, so that the liquid crystal screen display becomes difficult to see at the intersection of the transparent electrode patterns. The black portion of the dot or line is also not obvious.

The blackening of the fine metal wires can be performed by black plating. For example, it may be applied as a black nickel plating treatment, a black chrome plating treatment, or the like, or a ternary alloy black plating treatment using tin, nickel, or copper, and a ternary alloy black plating treatment using tin, nickel, and molybdenum.

In addition, the blackening of the metal thin wires can also be performed by an electrodeposition coating process. The black electrodeposition coating treatment uses a black paint which is doped with a black pigment in an electrodeposition resin. Examples of the black pigment include carbon black and the like, and a black pigment having conductivity is preferred. Further, the electrodeposited resin may be an anionic resin or a cationic resin, and specific examples thereof include an acrylate. A resin, a polyester resin, an epoxy resin, or the like, and these electrodeposition resins may be used singly or in combination of two or more.

Further, the blackening of the fine metal wires can also be carried out by a chemical conversion treatment such as a vulcanization treatment or an oxidation treatment. The vulcanization treatment and the oxidation treatment can be carried out in a known manner.

Further, in the present specification, the blackened "black" is preferably 1 to 20 in brightness L*, and +5 to -5 in chromaticity a* and b*. The brightness and chromaticity can be measured by a color difference meter. In this specification, the L*a*b* color system (also used in JIS Z 8729) specified by the International Commission on Illumination (CIE) is used to specify the brightness and chromaticity. The smaller the value of the brightness is, the darker it is. The less the light is reflected, the harder it is to see. The theoretical minimum is 0. Chroma represents the coordinates on the chromaticity diagram, indicating hue and chroma. In the L*a*b* color system, the coordinates of a*b* having a value of 0 indicate a theoretical achromatic color. In the range where the lightness L* is from 1 to 20, the surface of the fine metal wires is black, and it is difficult to distinguish the difference by the naked eye. The lower the value of the brightness L*, the better, but generally 10 to 20 can achieve the target effect. On the other hand, if the chromaticities a* and b* are each +5 to -5, it is difficult to distinguish the hue with the naked eye. If a* exceeds +5, the thin metal wire looks red. If it is less than -5, it looks green. If b* exceeds +5, the thin metal wire looks yellow. If it is less than -5, it looks It is blue. The preferred range of a* is +4 to -2, and the preferred range of b* is +2 to -5.

As described above, the second bridge wiring portion 30 and the wiring 5 which are formed of thin metal wires are formed of blackened metal thin wires, whereby the second bridge wiring portion 30 made of thin metal wires does not cause reflection, and therefore does not The intersection of the X electrode pattern 10 and the Y electrode pattern 20 produces a dazzling dot shape Or a linear high-luminance part. Further, as shown in FIG. 2, the range of the light-shielding is the width of the second bridge wiring portion 30 composed of the thin metal wires instead of the width of the insulating film, so that the liquid crystal screen is provided at the intersection of the X electrode pattern 10 and the Y electrode pattern 20. The dotted or linear black portion that becomes difficult to see is also not noticeable.

Further, in the manufacturing steps of the touch sensor according to the third and fourth embodiments, the blackening of the thin metal wires can be on the same surface (the surface on which the insulating film 3 is formed) on the transparent substrate 1 on which the transparent insulating film 3 is formed. The film is formed by a method such as sputtering using a conductive material of a metal material, and then the blackened metal film is formed into a predetermined pattern shape by photolithography.

[Embodiment 5]

In the fifth embodiment, the material of the wiring 5 is not the same as that of the second bridge wiring portion 30 made of a thin metal wire in each of the above embodiments, but other materials are used. For example, the wiring 5 can be formed by screen printing such as silver paste. At this time, compared with the first to fourth embodiments, the material which is not suitable for the second bridge wiring portion 30 can be used for the wiring 5, and therefore has an advantage that the material selection range is wide. In addition, the thickness can be adjusted, for example, to be thicker.

[variation]

Further, the present invention is not limited to the above embodiments. For example, when the transparent substrate 1 is a resin film, it may be provided with a λ/4 phase difference. Here, providing a λ/4 phase difference means that the λ/4 phase difference is ideally provided for all wavelengths of the visible light band. As long as the phase difference of 550 nm is λ/4, the phase difference of other wavelengths is slightly deviated from λ/4, and in practical applications. There will be no problems. The retardation value (Δnd) at a wavelength of 550 nm is preferably from 125 nm to 150 nm, more preferably from 131 nm to 145 nm.

Further, the resin film of the transparent substrate 1 is not limited to a single layer of only λ/4 retardation film. For example, it may be a laminate of a λ/4 retardation film and an optical isotropic film. The optical isotropic film is, for example, a hysteresis value (Δnd) of 30 nm or less. Further, a laminate of a λ/2 retardation film and a λ/4 retardation film may be used as the resin film of the transparent substrate 1.

Further, the transparent conductive film may be a conductive film such as PEDOT:poly(3,4-ethylenedioxythiophene) formed by various methods such as a printing method, a coating method, or an inkjet method, in addition to the film formed by sputtering the metal oxide. Polymer film and ultrafine conductive carbon fiber such as carbon nanotube, carbon nanohorn, carbon nanowire, carbon nanofiber, graphite fibril or ultrafine conductive fiber composed of silver material A film made from a polymer material that functions as a binder. These films have excellent flexibility, and when the transparent substrate 1 is a resin film, the capacitive touch sensor 10 can be attached along a 2.5-dimensional curved surface or a 3-dimensional curved surface.

Further, as the material of the second bridge wiring portion 30, a transparent material can also be used. For example, a conductive polymer film such as thiophene or a conductive fiber film containing a metal nanowire or a carbon nanotube is formed by various methods such as a printing method, a coating method, and an inkjet method. Not only the sensible application electrode 14 and the insulating film 3 of the transparent substrate 1 are transparent, but also the second bridge wiring portion 30 is transparent, thereby greatly improving the visibility of the input region.

Further, the wiring 5 may be made of the same material as the sensing application electrode 14, and in this case, the sensing application electrode 14 and the wiring 5 can be simultaneously formed. In addition The wiring 5 may be a multilayer film composed of a layer made of the same material as the sensing application electrode 14 and a layer composed of other materials.

Further, a protective layer (not shown) may be further formed on the surface of the transparent substrate 1 on which the application electrode 14, the insulating film 3, the second bridge wiring portion 30, and the wiring 5 are formed. For example, a film of a SiO 2 material may be formed by a sputtering method using a mask. The SiO 2 film is formed integrally, for example, in addition to the connection portion where the wiring 5 is connected to the flexible substrate.

In addition, the projected capacitive touch sensor of the present invention may be any of a Self Capacitance mode or a Mutual Capacitance mode. In the touch sensors 101 and 102 of the above-described embodiments, the X electrode pattern 10 as the first electrode pattern and the Y electrode pattern 20 as the second electrode pattern are provided, but the reverse configuration may be reversed. A Y electrode pattern as the first electrode pattern and an X electrode pattern 20 as the second electrode pattern.

In addition, the projected capacitive touch sensor of the present invention may further have a polarizing plate in front. As long as the touch sensor is configured on a color filter, the so-called "On-Cell type" liquid crystal having a touch panel function between the polarizing plate and the color filter can be realized. Display device.

The technical content and the technical features of the present invention have been disclosed as above, and those skilled in the art to which the present invention pertains can be variously substituted and added without departing from the technical idea of the present invention. Therefore, the scope of the invention is not limited by the scope of the invention, but is intended to cover various alternatives and additions of the invention and the scope of the appended claims.

3‧‧‧Insulation film (transparent)

3a‧‧‧through hole

10‧‧‧First electrode pattern (X electrode pattern)

11‧‧‧1st bridging wiring department

12‧‧‧1st island electrode

13, 23‧‧‧ Connection Department

20‧‧‧2nd electrode pattern (Y electrode pattern)

22‧‧‧2nd island electrode

30‧‧‧2nd bridging wiring department

Claims (9)

A touch sensor having a plurality of transparent first electrode patterns and a plurality of transparent second electrode patterns formed on one surface of a transparent substrate and extending in a direction intersecting each other, wherein the touch sensor is characterized by The first electrode pattern includes a plurality of first island-shaped electrode portions formed at intervals along a first direction on the substrate, and a first bridge wiring portion that is adjacent to the first island shape An electrical connection is formed between the electrode portions, and the second electrode pattern has a plurality of second island-shaped electrode portions which are formed on the substrate and are formed at intervals in a second direction intersecting the first direction; a transparent insulating film is formed between the second island-shaped electrode portions adjacent to each other in the second electrode pattern and at both sides thereof, and a second bridge wiring portion formed separately from the second electrode pattern is formed. The bridged wiring portion is formed to electrically connect the second island-shaped electrode portions adjacent to each other in the second electrode pattern between the pair of through holes provided on the both sides via the insulating film. The touch sensor of claim 1, wherein the insulating film is formed over the entire input area. The touch sensor according to claim 1, wherein the insulating film is formed only between the second island-shaped electrode portions adjacent to each other in the second electrode pattern and on both sides thereof. A touch sensor according to any one of claims 1 to 3, wherein The second bridge wiring portion is a black metal thin wire. The touch sensor of claim 4, wherein the blackening of the aforementioned metal thin wires is performed by a black plating process. The touch sensor of claim 4, wherein the blackening of the aforementioned metal thin wires is performed by an electrodeposition coating process. The touch sensor of claim 4, wherein the blackening of the metal thin wires is performed by a chemical conversion process. The touch sensor according to any one of claims 4 to 7, wherein the metal thin wire is any one of copper, aluminum, and nickel. The touch sensor according to any one of claims 1 to 8, further comprising a polarizing plate on the front side.