TW201348493A - Heating element and method of manufacturing the same - Google Patents

Abstract

The present invention relates to a heating element and a method of manufacturing the same. The heating element includes: a substrate; a diamond layer, over the substrate; and a nitrogen-doped diamond layer and/or a hybrid layer of nitrogen-doped diamond and graphene, over the diamond layer; and another diamond layer, over the nitrogen-doped diamond layer and/or a hybrid layer of nitrogen-doped diamond and graphene.

Description

Heating element and preparation method thereof

The present invention relates to a heating element, and more particularly to a heating element comprising a nitrogen-doped diamond layer.

Diamonds possess many excellent physical, chemical, optical, mechanical and electrical properties, such as high thermal conductivity, chemical inertness, highest hardness, high Young's modulus and low coefficient of friction, wide energy gap and wide optical wear. Transmission frequency domain, biocompatibility and other advantages. Therefore, polycrystalline diamond (PCD) is a material widely used in the industrial field in recent years, and its advantages are in addition to the excellent mechanical properties of a single crystal diamond, and can be processed into a desired shape in accordance with the purpose. The use of chemical vapor deposition (CVD) to grow polycrystalline diamond films is a well-established and common method, mainly using precursor materials such as hydrogen, oxygen, hydrocarbons and other carbonaceous materials. The polycrystalline diamond film is grown by using various forms of energy application to free and excite the mixed gas containing the precursor material.

In addition, diamonds have high acoustic velocity characteristics. For example, ultratrananocrystalline diamond (UNCD) can be measured up to ~15,700 m/s. Such high speed characteristics can be applied to GHz-rated resonator components, which are operating frequency ranges that are not achievable with the same size of the resonator. Because of this, the diamond thin film resonator has its research value and application surface, and it is introduced by the type of diamond film. Shao: Microcrystalline diamond (MCD) has a lattice size of about 1 to several hundred micrometers, nanocrystalline diamond (NCD) has a lattice size of about <100 nm and ultra-nano-crystalline diamond. , UNCD) The lattice size is about 3~5 nm. Most of the current diamond film growth methods are mainly by chemical vapor deposition (CVD).

Therefore, there is an urgent need in the industry to develop a new heating element for use in a semiconductor artificial diamond tool, which has the advantages of easy cleaning, corrosion resistance, high temperature resistance, and reusable cleaning to reduce cost.

The main object of the present invention is to provide a novel heating element and a method for preparing the same, wherein the heating element comprises a nitrogen-doped diamond layer having a conductive property, and the resistance value thereof changes with temperature, so that it can be matched with a suitable passing current. A temperature-controlled heating element.

In the following, in the description of relative spatial relationships, such as "below", "below", "lower", "above", "higher", and the like, may be used herein to describe one of the drawings. The relationship between an element or feature and another element or feature. For example, an element or feature that is "under" or "beneath" or "an" or "an" Therefore, the directions that may be covered when describing "below" include both "above" and "below". The above components may have other guiding modes (rotation 90 degrees or other directions), and the spatial relative relationship at this time can also be interpreted in the above manner.

1A-1B, in order to achieve the above object, the present invention provides a method for preparing a heating element, comprising: (A) providing a first mixed gas in a reaction chamber, wherein the first mixed gas comprises an inert gas and a a carbon-containing gas; (B) forming a plasma in the reaction chamber to form a diamond layer 110 on a substrate 100; (C) providing a second mixed gas in the reaction chamber, wherein The second mixed gas includes an inert gas, a carbon-containing gas, and nitrogen; and (D) forming a plasma in the reaction chamber to form the nitrogen-containing diamond on the diamond layer 110 by the carbon-containing gas and the nitrogen gas. Layer 120.

Referring to FIG. 1C, in a preferred embodiment of the present invention, the above step (D) may further comprise a step (D1) of forming a nitrogen-doped diamond-graphene hybrid 130.

Referring to FIGS. 1D-1F, in the method of fabricating the heating element of the present invention, the steps of forming the diamond layer 110, the nitrogen-doped diamond layer 120, and/or the nitrogen-doped diamond-graphene hybrid layer 130 may be repeated, thereby forming the diamond layer. 110. The nitrogen-doped diamond layer 120, and/or the nitrogen-doped diamond-graphene hybrid layer 130 may be a single layer or multiple layers, wherein the diamond layer 110 and the nitrogen-doped diamond layer 120, and/or the diamond layer and the nitrogen-doped diamond-graphene The hybrid layers 130 may be alternately arranged with each other. Due to the high chemical activity of graphene, if it is directly in contact with corrosive chemicals, the heating element composed of exposed graphene will be more susceptible to damage. Therefore, the nitrogen-doped diamond-graphene mixed layer can be packaged as needed. Covered or sandwiched between two insulating diamond layers 110.

In the method for producing a heating element of the present invention, the above step (D1) is carried out at a temperature of from 900 ° C to 1200 ° C for 20 to 300 minutes at a pressure of from 80 Torr to 500 Torr.

In the present invention, the inert gas is preferably argon gas, helium gas, neon gas or a mixed gas thereof, and more preferably argon gas. In a preferred embodiment, the carbon-containing gas is methane, and the inert gas is argon, which may contain a small amount of hydrogen or an oxygen-containing gas, but is not limited thereto.

In an embodiment of the present invention, the above step (B) can be carried out at a temperature of 200 ° C to 900 ° C at a pressure of 50 Torr to 300 Torr for 40-90 minutes, preferably at a temperature of 600-800 ° C. The pressure is 50-70 minutes at 50-110 Torr.

In the embodiment of the present invention, the above step (D) is carried out at a temperature of 700 ° C to 1200 ° C and a pressure of 80 Torr to 300 Torr for 40-90 minutes, preferably at a temperature of 1000-1100 ° C. The pressure is 50-70 minutes at 80-100 Torr.

In one embodiment, the diamond layer and/or the nitrogen-doped diamond layer may be formed in a microwave plasma chemical vapor deposition system, wherein the microwave plasma chemical vapor deposition system has a microwave power of 200W to 1550W. And the total flow rate of the above mixed gas is from 1 sccm to 100 sccm based on the volume per liter of the above reaction chamber. In addition, in the present invention, those skilled in the art can adjust the appropriate microwave power according to the microwave frequency and the size of the reactor. For example, if a substrate of 5 cm to 7 cm diameter and a microwave of 2.45 GHz are used, the microwave The power is preferably from 200W to 1500W.

In the method for producing a heating element of the present invention, the volume percentage of the carbon-containing gas in the first mixed gas is 0.05% to 50%, preferably 0.1% to 80%, and the carbon-containing gas is in the second mixture. The volume percentage in the gas is from 0.05% to 50%, preferably from 0.1% to 3%. Further, the volume percentage of the above nitrogen in the second mixed gas is from 10% to 50%, preferably from 20% to 50%. In one embodiment of the invention, methane is used as the carbonaceous gas, and the content thereof is preferably from 0.1% to 10%. In one embodiment, the present invention preferably controls the total flow rate of the mixed gas from 1 sccm to 200 sccm (based on the volume per liter of the reaction chamber) at 1000 watts of microwave power and 100 Torr deposition pressure, more preferably 10 sccm. Up to 100 sccm to improve the quality of the diamond layer and the nitrogen-doped diamond layer.

The diamond layer, nitrogen-doped diamond layer, and/or nitrogen-doped diamond-graphene hybrid layer of the present invention may be mutually nucleated with each other, as compared to a diamond layer, a nitrogen-doped diamond layer, and/or a nitrogen-doped diamond. The graphene hybrid layer is formed on the substrate, and the rate at which the diamond layer, the nitrogen-doped diamond layer, and/or the nitrogen-doped diamond-graphene hybrid layer are formed on the seed crystal can be accelerated by about two times. For example, in one embodiment of the present invention, a 77% Ar/3% CH ₄ /20% N ₂ mixed gas is provided and the reaction is carried out for 3 hours at 885 ° C and 100 Torr using a microwave of 1000 W. Rice crystal diamond (NDD) is formed on nanocrystalline diamond (NCD) at a rate of up to 5 μm/hr; additionally provides 98.5% Ar/1.5% CH ₄ mixed gas and utilizes 760 W microwave at 750 ° C 110 Torr The reaction was carried out for 1 hour in an environment, and the rate of formation of nanocrystalline diamond (NCD) on nitrogen-doped nanocrystalline diamond (NDD) was 2.8 μm/hr.

In addition, the present invention can improve the purity and quality of the synthetic diamond layer and the nitrogen-doped diamond layer by controlling the flow rate of the mixed gas and avoiding excessive carbon-containing gas in the reaction chamber to form carbon soots. In detail, the conventional method often causes the plasma to form an unstable orange-red plasma region due to gas phase synthesis of carbon particles, thereby affecting the purity and quality of the diamond, resulting in process failure. However, the present invention can vary with the size of the reaction chamber. The amount of microwave power, the deposition pressure, and the content of carbon-containing gas in the mixed gas, lowering the total flow rate of the mixed gas to prolong the residence time of the reaction gas in the reaction chamber, thereby making the amount of carbon in the reaction chamber It is slightly lower than the amount required for the synthesis of carbon particles in the gas phase to avoid the instability of the plasma caused by the gas phase synthesis of carbon particles, thereby improving the quality of the diamond layer and the nitrogen-doped diamond layer. Specifically, in actual operation, the operator can adjust the total mixed gas flow rate by observing whether an unstable orange-red plasma region is formed in the plasma; that is, in the present invention, preferably, By adjusting the total flow rate of the first and second mixed gases, the plasma is prevented from forming an orange-red plasma region.

Referring to Figures 1A-1B, the present invention further provides a heating element comprising a substrate 100; a diamond layer 110 on top of the substrate 100; and a nitrogen-doped diamond layer 120 over the diamond layer. The diamond layer may have a thickness of 0.1 to 2 μm, preferably 0.3 to 1 μm. In addition, the heating element of the present invention may further comprise a graphene layer mixed with the nitrogen-doped diamond layer to form a nitrogen-doped diamond-graphene hybrid 130, as shown in FIG. 1C. The nitrogen-doped diamond layer may have a thickness of 0.5 to 5 μm, preferably 1-3 μm.

Referring to Figures 1D-1F, in a preferred embodiment, the heating element of the present invention may optionally include a plurality of the diamond layers 110, a plurality of the nitrogen-doped diamond layers 120, and/or a plurality of the nitrogen-doped diamond-graphene blends. The layer 130, wherein each of the plurality of diamond layers 110 and each of the plurality of nitrogen-doped diamond layers 120 may be staggered with each other, and/or the plurality of diamond layers 110 and each of the plurality of nitrogen-doped diamond-graphene mixed layers 130 may be Interlaced with each other. The diamond layer 110 of the present invention may have an insulating property, and the nitrogen-doped diamond layer 120 and/or the nitrogen-doped diamond-graphene mixed layer 130 having semiconductor conductive properties may be sandwiched between, on, and/or over the diamond layer 110. The nitrogen-doped diamond layer 120 and/or the nitrogen-doped diamond-graphene hybrid layer 130 is made a thermal resistance material.

In the above heating element of the present invention, when an applied current or voltage is applied to the heating element, particularly when applied to a nitrogen-doped diamond layer or a nitrogen-doped diamond-graphene mixed layer, the heating element can be turned on to make the temperature Rise to achieve the purpose of heating.

In an embodiment of the invention, the nitrogen content in the nitrogen-doped diamond layer is from 10 to 50% by weight, preferably from 15 to 25% by weight, based on the weight of the nitrogen-doped diamond layer.

In other embodiments of the present invention, the thickness ratio of the nitrogen-doped diamond layer to the graphene in the nitrogen-doped diamond-graphene hybrid may be between 1:0.5 and 10.

In the present invention, the above substrate is not particularly limited except for temperature resistance, and may be any target for depositing a diamond film. The substrate can also be etched away after the heater is formed, leaving only the heater that is fully carbonized and covered by the diamond film. Here, the present invention can nucleate on a conductive substrate or an insulating substrate with or without an applied bias (such as a DC bias or an RF bias); in particular, compared to A conventional technique of additionally forming a carbon coating as a transition layer, the present invention can perform diamond nucleation directly on the surface of the non-carbon phase without additionally forming a carbon coating as a transition layer, that is, the present invention can be directly applied to a carbon coating. The nucleation of the non-diamond substrate of the layer (such as a germanium substrate or a germanium dioxide substrate), however, the present invention may also indirectly perform diamond nucleation on the surface of the non-carbon phase, and select an appropriate method only as needed, and is not limited thereto. . For example, the substrate used in the present invention may be, but not limited to, a glass substrate, a quartz substrate, a germanium substrate, or a metal substrate such as a molybdenum high temperature resistant metal.

In summary, the present invention uses a plasma-assisted chemical vapor deposition (MPCVD) method to apply a uniform, high-density plasma to optimize the inclusion of Ar/C/H/O. In the mixed reaction gas, the diamond nanoparticles on the pre-planted substrate are grown to form a continuous film, and the diamond deposition process is continued to produce high-quality diamond films of various grain sizes, including super nano diamonds and nano diamonds. , polycrystalline micron diamonds, and single crystal diamonds. Pure diamonds are good electrical insulators at room temperature, and non-carbon elements (nitrogen) can be added to the selected sites to replace the carbon of the diamonds to produce semiconductor diamonds. The resistance value of a semiconductor diamond changes with temperature, so the resistance value can be measured to know its temperature; and the moderate current can also make it an electric heater. The addition of non-carbon elements (nitrogen elements) to selected sites can also produce a mixture of highly conductive multilayer graphene and semiconductor diamonds to achieve higher electrical conductivity and higher heating power at low voltages.

The embodiments of the present invention are described by way of specific examples, and those skilled in the art can readily appreciate the other advantages and advantages of the present invention. The present invention may be embodied or applied in various other specific embodiments, and various modifications and changes can be made without departing from the spirit and scope of the invention.

Example 1

This embodiment uses a quartz bell-type SEKI 1.5 kW microwave plasma chemical vapor deposition system for diamond nucleation and growth to form the diamond layer, nitrogen-doped diamond layer, and/or nitrogen-doped diamond-graphene hybrid layer of the present invention. .

First, a substrate was immersed in a suspension of 10 wt% diamond nanoparticle in DMSO for 30 minutes to pre-synthesize diamond nanoparticle onto the substrate. Next, at a microwave power of 760 W and a deposition pressure of 110 Torr, the total flow rate of the mixed gas is controlled to 100 sccm (based on the volume per liter of the reaction chamber), and a mixed gas of 98.5% Ar/1.5% CH ₄ is applied to the substrate. The reaction was carried out at a temperature of 605-800 ° C for 1 hour to form an electrically insulating nanocrystalline diamond (NCD) layer on the substrate.

Control the total flow of the mixed gas at 100 sccm (based on the volume per liter of the reaction chamber) at a microwave power of 1000 watts and a deposition pressure of 90 Torr, with a mixture of 77% Ar/3% CH ₄ /20% N ₂ , The reaction was carried out at a substrate temperature of 950 to 1150 ° C for 1 hour to form a nitrogen-doped nanocrystalline diamond (NDD) layer on the nanocrystalline diamond (NCD) layer.

The nitrogen-doped nanocrystalline diamond (NDD) of this embodiment is formed on a nanocrystalline diamond (NCD) at a rate of up to 5 μm/hr; the nanocrystalline diamond (NCD) is formed on a nitrogen-doped nanocrystalline diamond (NDD). The rate is up to 2.7 μm/hr.

Referring to FIG. 1A, the heating element produced in this embodiment includes a substrate 100; a diamond layer 110 on the substrate 100; and a nitrogen-doped diamond layer 120 on the diamond layer 110.

When an applied current is applied to the heating element of the present embodiment, particularly when applied to a nitrogen-doped diamond layer, the heating element can be turned on. The temperature of the heating element of the present embodiment can be improved by applying an applied current through an infrared detection result display (not shown).

2A and 2B respectively show the light emission spectrum of the nanocrystalline diamond (NCD) and the nitrogen-doped nanocrystalline diamond (NDD) deposited plasma of the present embodiment, wherein the main difference between FIG. 2A and FIG. 2B is observable in FIG. 2B. To the apparent CN signal peak, the appearance of this signal peak confirmed the presence of nitrogen doping.

Example 2

The process conditions of this embodiment are substantially the same as those of the first embodiment except that the coating film and the carrier gas used for forming the nitrogen-doped nanocrystalline diamond (NDD) of the present embodiment are 67% Ar/3% CH ₄ /30. The %N ₂ mixed gas is increased in nitrogen content by 10% to increase the nitrogen doping amount.

Example 3

The process conditions of this embodiment are substantially the same as those of the first embodiment except that the coating film and the carrier gas used for forming the nitrogen-doped nanocrystalline diamond (NDD) of the present embodiment are 72% Ar/3% CH ₄ /25. The %N ₂ mixed gas has a nitrogen content of 5%.

Example 4

A nanocrystalline diamond (NCD) layer was formed on the substrate/nanocrystalline diamond (NCD)/azene-doped nanocrystalline diamond (NDD) structure obtained in Examples 1-3. The above process conditions are: under the microwave power of 760 W and the deposition pressure of 110 Torr, the total flow rate of the mixed gas is controlled to be 100 sccm (based on the volume per liter of the reaction chamber), and the mixed gas of 98.5% Ar/1.5% CH ₄ is used. The reaction was carried out at a substrate temperature of 600 to 800 ° C for 1 hour.

Accordingly, as shown in FIG. 1D, the heating element produced in this embodiment includes: a substrate 100; a plurality of diamond layers 110 on the substrate 100; and a nitrogen-doped diamond layer 120 sandwiched between Between a plurality of diamond layers 110.

Example 5

On the substrate/nanocrystalline diamond (NCD)/azide-doped nanocrystalline diamond (NDD) structure obtained in Examples 1-3, a graphene layer was formed, and the graphene layer and the nitrogen-doped nanocrystalline diamond (NDD) were formed. Mixing to form a nitrogen-doped diamond-graphene mixed layer. The above process conditions are: under the microwave power of 1150 watts and the deposition pressure of 84 Torr, the total flow rate of the mixed gas is controlled to be 100 sccm (based on the volume per liter of the reaction chamber), which is 72% Ar/3% CH ₄ /25% N. _{2 The} mixed gas was subjected to a reaction at a substrate temperature of 950 to 1150 ° C for 60 minutes.

Accordingly, as shown in FIG. 1C, the heating element produced in this embodiment includes: a substrate 100; a diamond layer 110 on the substrate 100; And a nitrogen-doped diamond-graphene hybrid layer 130 is disposed on the diamond layer 110.

Example 6

On the substrate/nanocrystalline diamond (NCD) structure obtained in Examples 1-3, a nitrogen-doped nanocrystalline diamond (NDD)-nitrogenated graphene layer mixed layer as shown in FIG. 3 was formed, and the nitrogen-doped graphene was formed. It is formed by mixing with nitrogen-doped nanocrystalline diamond (NDD). The above process conditions are as follows: (1) The total flow rate of the mixed gas is controlled to be 50 sccm (based on the volume per liter of the reaction chamber) at a microwave power of 700 watts and a deposition pressure of 50 Torr, and is 67% Ar/3% CH ₄ / 30% N ₂ mixed gas, substrate temperature 745 ° C for 10-15 minutes; at 1150 watts microwave power and 84 Torr deposition pressure, control the total flow of the mixed gas 50 sccm (based on the reaction chamber per liter volume), The reaction was carried out for 60-65 minutes at a substrate temperature of 1,150 ° C by a 67% Ar/3% CH ₄ /30% N ₂ mixed gas.

3A shows an SEM image of a nitrogen-doped nanocrystalline diamond (NDD)-nitrogen-filled graphene layer mixed layer, and FIG. 3B shows a Raman spectrum of a nitrogen-doped nanocrystalline diamond (NDD)-nitrogen-doped graphene layer mixed layer. Figure. As shown in FIG. 3A and FIG. 3B, when the appropriate process parameters are adjusted, a mixed layer of the nitrogen-doped nanocrystalline diamond and the nitrogen-doped graphene layer can be simultaneously formed in a single process step.

Accordingly, the heating element prepared in this embodiment includes: a substrate 100; a nitrogen-doped diamond-nitrogen-filled graphene mixed layer 130 on the diamond layer 100; and a substrate 100 located in the above nitrogen-doped diamond- Above the nitrogen-doped graphene mixed layer 130.

When an applied current is applied to the heating element of the present embodiment, particularly when applied to a nitrogen-doped diamond-graphene hybrid layer, the heating element can be turned on. The temperature of the heating element of the present embodiment can be improved by applying an applied current through an infrared detection result display (not shown).

Example 7

4A and 4B are views showing a heating element of the present embodiment and a manufacturing process thereof, and Fig. 4B is a schematic cross-sectional view taken along line A-A' of Fig. 4A.

The heating element manufacturing process of this embodiment is the same as that of Embodiment 1, except that after the nitrogen-doped diamond layer 120 is deposited, a patterning process is further performed to define an electrode region. Then, an electrode 200, which is a titanium electrode, is formed on the electrode region of the nitrogen-doped diamond layer 120, and the heating element of this embodiment can be completed. Here, the electrode 200 material may be an electrode material known in the art, and is not limited to a titanium electrode.

When an applied current is applied to the heating element of the present embodiment, particularly when applied to the electrode 200, the heating element can be turned on for heating purposes.

Example 8

The heating element and structure of this embodiment are the same as in Embodiment 7, except that the nitrogen-doped diamond layer is the nitrogen-doped diamond-graphene mixed layer of Example 5.

Based on the diamond thin film technology, the plasma-assisted chemical vapor deposition (MPCVD) method is applied to the uniform mixed high-density plasma in the mixed reaction gas containing Ar/C/H/O. A high-quality diamond film of various grain sizes formed by growing diamond nano-particles on a pre-planted substrate to form a continuous film, and continuing the diamond deposition process, which may include nano-diamonds, polycrystalline micro-diamonds, and single crystals. diamond. In addition, the present invention can be further Control the flow of mixed gas to avoid excessive carbon-containing gas in the reaction chamber to form carbon soots to improve the purity and quality of the synthetic diamond layer and the nitrogen-doped diamond layer. Pure diamonds are good electrical insulators at room temperature, and non-carbon elements (nitrogen) can be added to the selected sites to replace the carbon of the diamonds to produce semiconductor diamonds. The resistance value of the semiconductor diamond changes with temperature, so the resistance value can be measured to know its temperature; the nitrogen doped at the grain boundary can also increase the conductivity; and the moderate current can also make it an electric heater.

While the invention has been described above in terms of several preferred embodiments, it is not intended to limit the scope of the present invention, and any one of ordinary skill in the art can make any changes without departing from the spirit and scope of the invention. And the scope of the present invention is defined by the scope of the appended claims.

100‧‧‧Substrate

110‧‧‧Diamond layer

120‧‧‧Nitrogen-doped diamond layer

130‧‧‧Nitrogen-doped diamond-graphene mixed layer

200‧‧‧electrode

1A-1F are schematic cross-sectional views showing a heating element in accordance with a preferred embodiment of the present invention.

2A and 2B show the light emission spectra of the nanocrystalline diamond (NCD) and the nitrogen-doped nanocrystalline diamond (NDD) deposited plasma of the present embodiment, respectively.

3A shows an SEM image of the nitrogen-doped diamond-nitrogen-filled graphene mixed layer of Example 6.

3B shows a Raman spectrum of the nitrogen-doped diamond-nitrogen-filled graphene mixed layer of Example 6.

Fig. 4A is a schematic view showing a heating element of Embodiment 7 of the present invention.

Fig. 4B is a flow chart showing the manufacture of the heating element shown in section line of Fig. 4A.

100‧‧‧Substrate

110‧‧‧Diamond layer

120‧‧‧Nitrogen-doped diamond layer

130‧‧‧Nitrogen-doped diamond-graphene mixed layer

Claims (20)

A heating element includes a substrate; a diamond layer on the substrate; and a nitrogen-doped diamond layer on the diamond layer. The heating element of claim 1, wherein the substrate is a glass substrate, a quartz substrate, a germanium substrate, or a metal substrate. The heating element of claim 1, further comprising a plurality of the diamond layers and/or a plurality of the nitrogen-doped diamond layers. The heating element of claim 3, wherein each of the plurality of diamond layers and each of the plurality of nitrogen-doped diamond layers are staggered with each other. The heating element of claim 1, wherein the nitrogen content of the nitrogen-doped diamond layer is 15-25% by weight based on the weight of the nitrogen-doped diamond layer. The heating element of claim 1, further comprising a graphene layer mixed with the nitrogen-doped diamond layer to form a nitrogen-doped diamond-graphene hybrid. A method for preparing a heating element, comprising: (A) providing a first mixed gas in a reaction chamber, wherein the first mixed gas comprises an inert gas and a carbon-containing gas; and (B) forming a gas in the reaction chamber a plasma that causes the carbon-containing gas to form a diamond layer on a substrate; (C) providing a second mixed gas in the reaction chamber, wherein the second mixed gas comprises an inert gas, a carbonaceous gas, and nitrogen; and (D) forming a plasma in the reaction chamber, A carbonaceous gas and the nitrogen form a nitrogen-doped diamond layer on the diamond layer. The method for producing a heating element according to claim 7, wherein the carbon-containing gas is methane, and the inert gas is argon. The method for preparing a heating element according to claim 7, wherein the volume percentage of the carbon-containing gas in the first mixed gas is 0.1% to 80%. The method for preparing a heating element according to claim 7, wherein the volume percentage of the carbon-containing gas in the second mixed gas is 0.1 to 5%. The method for producing a heating element according to claim 7, wherein the volume percentage of the nitrogen in the second mixed gas is 10% to 50%. The method for producing a heating element according to claim 7, wherein the volume percentage of the nitrogen in the second mixed gas is 20% to 50%. The method for producing a heating element according to claim 7, wherein the step (B) is carried out at a temperature of 200 ° C to 900 ° C for 20 to 300 minutes at a pressure of 50 Torr to 300 Torr. The method for producing a heating element according to claim 7, wherein the step (D) is carried out at a temperature of from 700 ° C to 1200 ° C for 20 to 300 minutes at a pressure of from 80 Torr to 300 Torr. The method for preparing a heating element according to claim 7, wherein the diamond layer and/or the nitrogen-doped diamond layer is formed in a microwave plasma chemical vapor deposition system. The method for preparing a heating element according to claim 15, wherein the microwave plasma chemical vapor deposition system has a microwave power of 100 W to 1500 W, and the mixing is based on the volume per liter of the reaction chamber. The total flow rate of the gas is from 1 sccm to 200 sccm. The method for preparing a heating element according to claim 7, wherein the step (D) further comprises a step (D1) of forming a nitrogen-doped diamond-graphene hybrid. The method for producing a heating element according to claim 17, wherein the step (D1) is carried out at a temperature of from 900 ° C to 1200 ° C for 20 to 300 minutes at a pressure of from 80 Torr to 300 Torr. The method for preparing a heating element according to claim 10, wherein the substrate is a glass substrate, a quartz substrate, a germanium substrate, or a metal substrate. The method for preparing a heating element according to claim 10, wherein the nitrogen-containing diamond layer is made to have a gas nitrogen content of 10 to 50% by volume of the mixed gas.