TW201347673A - N-cycloalkyl-N-[(heterocyclylphenyl)methylene]-(thio)carboxamide derivatives - Google Patents

N-cycloalkyl-N-[(heterocyclylphenyl)methylene]-(thio)carboxamide derivatives Download PDF

Info

Publication number
TW201347673A
TW201347673A TW102114089A TW102114089A TW201347673A TW 201347673 A TW201347673 A TW 201347673A TW 102114089 A TW102114089 A TW 102114089A TW 102114089 A TW102114089 A TW 102114089A TW 201347673 A TW201347673 A TW 201347673A
Authority
TW
Taiwan
Prior art keywords
substituted
unsubstituted
group
different
halogen atoms
Prior art date
Application number
TW102114089A
Other languages
Chinese (zh)
Other versions
TWI594695B (en
Inventor
Christoph Braun
Pierre Cristau
Peter Dahmen
Philippe Desbordes
Mazen Es-Sayed
Helene Lachaise
Philippe Rinolfi
Jan-Peter Schmidt
Tomoki Tsuchiya
Jean-Pierre Vors
Ulrike Wachendorff-Neumann
Original Assignee
Bayer Cropscience Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Bayer Cropscience Ag filed Critical Bayer Cropscience Ag
Publication of TW201347673A publication Critical patent/TW201347673A/en
Application granted granted Critical
Publication of TWI594695B publication Critical patent/TWI594695B/en

Links

Abstract

The present invention relates to fungicidal N-cycloalkyl-N-[(heterocyclylphenyl)methylene] carboxamide derivatives and their thiocarbonyl derivatives, their process of preparation and intermediate compounds for their preparation, their use as fungicides, particularly in the form of fungicidal compositions and methods for the control of phytopathogenic fungi of plants using these compounds or their compositions.

Description

N-環烷基-N-[(雜環基苯基)亞甲基]-(硫代)甲醯胺衍生物N-CYCLOALKYL-N- N-cycloalkyl-N-[(heterocyclylphenyl)methylene]-(thio)carbamamine derivative N-CYCLOALKYL-N-

本發明係關於殺真菌N-環烷基-N-[(雜環基苯基)亞甲基]甲醯胺衍生物及其硫羰基衍生物、其製備方法及用於其製備之中間化合物,其作為殺真菌劑(尤其呈殺真菌組合物形式)之用途,及使用此等化合物或其組合物控制植物之植物病原性真菌的方法。 The present invention relates to fungicidal N-cycloalkyl-N-[(heterocyclylphenyl)methylene]carbamamine derivatives and thiocarbonyl derivatives thereof, processes for preparing the same, and intermediate compounds therefor, It is used as a fungicide, especially in the form of a fungicidal composition, and a method of controlling a phytopathogenic fungus of a plant using such a compound or a composition thereof.

在國際專利申請案WO-2007/087906中,某些N-環烷基-N-苄基-甲醯胺一般涵蓋於眾多下式化合物之廣泛揭示中: In the international patent application WO-2007/087906, certain N-cycloalkyl-N-benzyl-formamides are generally encompassed by a wide variety of compounds of the formula:

其中A表示碳連接之部分飽和或不飽和5員雜環基,Z1表示經取代或未經取代之C3-C7環烷基,n等於1至5,且X可表示各種取代基,其中有經取代或未經取代之吡啶基或吡啶氧基。然而,在此文獻中並未明確揭示或表明選擇X可表示經取代或未經取代之雜環基的任何此類衍生物。 Wherein A represents a partially saturated or unsaturated 5-membered heterocyclic group of a carbon linkage, Z 1 represents a substituted or unsubstituted C 3 -C 7 cycloalkyl group, n is equal to 1 to 5, and X may represent various substituents, There are substituted or unsubstituted pyridyl or pyridyloxy groups. However, any such derivative in which X is selected to represent a substituted or unsubstituted heterocyclic group is not explicitly disclosed or indicated in this document.

在國際專利申請案WO-2009/016220中,某些N-環烷基-N-苄基-硫代甲醯胺一般涵蓋於眾多下式化合物之廣泛揭示中: In the international patent application WO-2009/016220, certain N-cycloalkyl-N-benzyl-thiocarbamamines are generally encompassed by a wide variety of compounds of the formula:

其中A表示碳連接之部分飽和或不飽和5員雜環基,T可表示S,Z1表示經取代或未經取代之C3-C7環烷基,n等於1至5,且X可表示各種取代基,其中有經取代或未經取代之吡啶基或吡啶氧基。然而,在此文獻中並未明確揭示或表明選擇X可表示經取代或未經取代之雜環基的任何此類衍生物。 Wherein A represents a partially saturated or unsaturated 5-membered heterocyclic group of the carbon linkage, T represents S, Z 1 represents a substituted or unsubstituted C 3 -C 7 cycloalkyl group, n is equal to 1 to 5, and X is Represents various substituents having a substituted or unsubstituted pyridyl or pyridyloxy group. However, any such derivative in which X is selected to represent a substituted or unsubstituted heterocyclic group is not explicitly disclosed or indicated in this document.

在國際專利申請案WO-2010/130767中,某些N-環烷基-N-苄基-甲醯胺或硫代甲醯胺一般涵蓋於眾多下式化合物之廣泛揭示中: In the international patent application WO-2010/130767, certain N-cycloalkyl-N-benzyl-formamide or thioformamide are generally encompassed by a wide variety of compounds of the formula:

其中X1及X2表示氟或氯原子,T可表示O或S,Z1表示經取代或未經取代之C3-C7環烷基,Y可表示CR5,且R1、R2、R3、R4或R5可獨立地表示各種取代基,其中有經取代或未經取代之吡啶基或吡啶氧基。然而,在此文獻中並未明確揭示或表明選擇R1或R2或R3或R4或R5可表示經取代或未經取代之雜環基的任何此類衍生物。 Wherein X 1 and X 2 represent a fluorine or chlorine atom, T may represent O or S, Z 1 represents a substituted or unsubstituted C 3 -C 7 cycloalkyl group, Y may represent CR 5 , and R 1 , R 2 And R 3 , R 4 or R 5 may independently represent various substituents including a substituted or unsubstituted pyridyl or pyridyloxy group. However, any such derivative in which R 1 or R 2 or R 3 or R 4 or R 5 may represent a substituted or unsubstituted heterocyclic group is not explicitly disclosed or indicated in this document.

在國際專利申請案WO-2009/024342中,某些N-(經取代之苯基)亞甲基-甲醯胺一般涵蓋於眾多下式化合物之廣泛揭示中: In the international patent application WO-2009/024342, certain N-(substituted phenyl)methylene-formamides are generally encompassed by a wide variety of compounds of the formula:

其中R1表示C1-C4烷基,R2表示C1-C4鹵烷基,B可表示可經各種取代基取代之苯基,其中有經取代或未經取代之苯基或經取代或未經取代之苯氧基,且R15可表示氫或C3-C7環烷基,其限制條件為若R15表示C3-C7環烷基,則B不同於苯基。因此,在此文獻中並未揭示R15可表示C3-C7環烷基且B同時為經取代之苯基的任何此類衍生物。 Wherein R 1 represents a C 1 -C 4 alkyl group, R 2 represents a C 1 -C 4 haloalkyl group, and B represents a phenyl group which may be substituted with various substituents, wherein a substituted or unsubstituted phenyl group or a A substituted or unsubstituted phenoxy group, and R 15 may represent hydrogen or a C 3 -C 7 cycloalkyl group, with the proviso that if R 15 represents a C 3 -C 7 cycloalkyl group, then B is different from the phenyl group. Thus, any such derivatives in which R 15 may represent a C 3 -C 7 cycloalkyl group and B is a substituted phenyl group are not disclosed in this document.

因此,本發明提供一種式(I)之N-環烷基-N-[(雜環基苯基)亞甲基](硫代)甲醯胺 Accordingly, the present invention provides an N-cycloalkyl-N-[(heterocyclylphenyl)methylene](thio)carbamamine of the formula (I)

其中˙A表示碳連接之不飽和或部分飽和5員雜環基,其可經多至四個可相同或不同之基團R取代;˙T表示O或S;˙n表示0、1、2、3或4;˙L表示直接鍵、CZ4Z5、O、S、SO、SO2或NZ6;B表示包含1至4個選自由N、O、S組成之清單之雜原子的飽和、部分飽和或不飽和單環或稠合雙環3、4、5、6、7、8、9或10員環,其可經多至6個可相同或不同之基團Y取代;其限制條件為當L表示直接鍵或氧原子時,B不表示吡啶基環;˙Z1表示未經取代之C3-C7環烷基或經多至10個原子或基團取代之C3-C7環烷基,該等原子或基團可相同或不同且可選自由以下組成之清單:鹵素原子、氰基、C1-C8烷基、包含多至9個可相同或不同之鹵素原子之C1-C8鹵烷基、C1-C8烷氧基、包含多至9個可相同或不同之鹵素原子之C1-C8鹵烷氧基、C1-C8烷氧基羰基、包含多至9個可相同或不同之鹵素原子之C1-C8鹵烷氧基羰基、C1-C8烷基胺基羰基或二-C1-C8烷基胺基羰基;˙Z2及Z3可相同或不同且表示氫原子;經取代或未經取代之C1-C8烷基;經取代或未經取代之C2-C8烯基;經取代或未經取代之C2-C8炔基;氰基;異腈基;硝基;鹵素原子;經取代或未經取代之C1-C8 烷氧基;經取代或未經取代之C2-C8烯氧基;經取代或未經取代之C2-C8炔氧基;經取代或未經取代之C3-C7環烷基;經取代或未經取代之C1-C8烷基硫基;經取代或未經取代之C1-C8烷基磺醯基;經取代或未經取代之C1-C8烷基亞磺醯基;胺基;經取代或未經取代之C1-C8烷基胺基;經取代或未經取代之二-C1-C8烷基胺基;經取代或未經取代之C1-C8烷氧基羰基;經取代或未經取代之C1-C8烷基胺甲醯基;經取代或未經取代之二-C1-C8烷基胺甲醯基;或經取代或未經取代之N-C1-C8烷基-C1-C8烷氧基-胺甲醯基;或˙Z2及Z3與其所連接之碳原子一起可形成經取代或未經取代之C3-C7環烷基;或˙Z3及與苯基環之連接點相鄰之取代基X與Z3及X所連接之連續碳原子一起可形成包含多至3個雜原子之經取代或未經取代之5、6或7員部分飽和碳環或雜環且Z2如本文所述;Z4及Z5獨立地表示氫原子;鹵素原子;氰基;經取代或未經取代之C1-C8烷基;具有1至5個鹵素原子之C1-C8鹵烷基;經取代或未經取代之C1-C8烷氧基;經取代或未經取代之C1-C8烷基硫基;或經取代或未經取代之C1-C8烷氧基羰基;或˙Z4及Z5與其所連接之碳原子一起可形成C(=O)羰基;˙Z6表示氫原子;經取代或未經取代之C1-C8烷基;包含多至9個可相同或不同之鹵素原子之C1-C8鹵烷基;經取代或未經取代之C2-C8烯基;包含多至9個可相同或不同之鹵素原子之C2-C8鹵烯基;經取代或未經取代之C3-C8炔基;包含多至9個可相同或不同之鹵素原子之C3-C8鹵炔基;經取代或未經取代之C3-C7環烷基;包含多至9個可相同或不同之鹵素原子之C3-C7鹵環烷基;經取代或未經取代之C3-C7環烷基-C1-C8烷基;甲醯基;經取代或未經取代之C1-C8烷基羰基;包含多至9個可相同或不同之鹵素原子之C1-C8鹵烷基羰基;經取代或未經 取代之C1-C8烷氧基羰基;包含多至9個可相同或不同之鹵素原子之C1-C8鹵烷氧基羰基;經取代或未經取代之C1-C8烷基磺醯基;包含多至9個可相同或不同之鹵素原子之C1-C8鹵烷基磺醯基;經取代或未經取代之苄基;或經取代或未經取代之苯基磺醯基;X獨立地表示鹵素原子;硝基;氰基;異腈基;羥基;胺基;硫基;五氟-λ6-硫基;甲醯基;甲醯氧基;甲醯胺基;經取代或未經取代之(羥亞胺基)-C1-C8烷基;經取代或未經取代之(C1-C8烷氧基亞胺基)-C1-C8烷基;經取代或未經取代之(C2-C8烯氧基亞胺基)-C1-C8烷基;經取代或未經取代之(C2-C8炔氧基亞胺基)-C1-C8烷基;經取代或未經取代之(苄氧基亞胺基)-C1-C8烷基;羧基;胺甲醯基;N-羥基胺甲醯基;胺基甲酸酯基;經取代或未經取代之C1-C8烷基;具有1至9個鹵素原子之C1-C8鹵烷基;經取代或未經取代之C2-C8烯基;具有1至9個鹵素原子之C2-C8鹵烯基;經取代或未經取代之C2-C8炔基;具有1至9個鹵素原子之C2-C8鹵炔基;經取代或未經取代之C1-C8烷氧基;具有1至9個鹵素原子之C1-C8鹵烷氧基;經取代或未經取代之C1-C8烷基硫基;具有1至9個鹵素原子之C1-C8鹵烷基硫基;經取代或未經取代之C1-C8烷基亞磺醯基;具有1至9個鹵素原子之C1-C8鹵烷基亞磺醯基;經取代或未經取代之C1-C8烷基磺醯基;具有1至9個鹵素原子之C1-C8鹵烷基磺醯基;經取代或未經取代之C1-C8烷基胺基;經取代或未經取代之二-C1-C8烷基胺基;經取代或未經取代之C2-C8烯氧基;具有1至9個鹵素原子之C2-C8鹵烯氧基;經取代或未經取代之C3-C8炔氧基;具有1至9個鹵素原子之C2-C8鹵炔氧基;經取代或未經取代之C3-C7環烷基;具有1至9個鹵素原子之C3-C7鹵環烷基;經取代或未經取代之(C3-C7環烷基)-C1-C8烷基;經取代或未經取代之C4-C7環烯基;具有1至9個鹵素原子之C4-C7鹵環烯基;經取代或未經取代之(C3-C7環烷基)-C2-C8烯基;經取代或未經取代之(C3-C7環烷基)-C2-C8炔基;經取代或未經取代之三 (C1-C8)烷基矽烷基;經取代或未經取代之三(C1-C8)烷基矽烷基-C1-C8烷基;經取代或未經取代之C1-C8烷基羰基;具有1至9個鹵素原子之C1-C8鹵烷基羰基;經取代或未經取代之C1-C8烷基羰氧基;具有1至9個鹵素原子之C1-C8鹵烷基羰氧基;經取代或未經取代之C1-C8烷基羰基胺基;具有1至9個鹵素原子之C1-C8鹵烷基羰基胺基;經取代或未經取代之C1-C8烷氧基羰基;具有1至9個鹵素原子之C1-C8鹵烷氧基羰基;經取代或未經取代之C1-C8烷氧基羰氧基;具有1至9個鹵素原子之C1-C8鹵烷氧基羰氧基;經取代或未經取代之C1-C8烷基胺甲醯基;經取代或未經取代之二-C1-C8烷基胺甲醯基;經取代或未經取代之C1-C8烷基胺基羰氧基;經取代或未經取代之二-C1-C8烷基胺基羰氧基;經取代或未經取代之N-(C1-C8烷基)羥基胺甲醯基;經取代或未經取代之C1-C8烷氧基胺甲醯基;經取代或未經取代之N-(C1-C8烷基)-C1-C8烷氧基胺甲醯基;可經多至6個可相同或不同之基團Q取代之芳基;可經多至6個可相同或不同之基團Q取代之芳基-C1-C8烷基;可經多至6個可相同或不同之基團Q取代之芳基-C2-C8烯基;可經多至6個可相同或不同之基團Q取代之芳基-C2-C8炔基;可經多至6個可相同或不同之基團Q取代之芳氧基;可經多至6個可相同或不同之基團Q取代之芳基硫基;可經多至6個可相同或不同之基團Q取代之芳基胺基;可經多至6個可相同或不同之基團Q取代之芳基-C1-C8烷氧基;可經多至6個可相同或不同之基團Q取代之芳基-C1-C8烷基硫基;可經多至6個可相同或不同之基團Q取代之芳基-C1-C8烷基胺基;可經多至4個基團Q取代之吡啶基;或可經多至4個基團Q取代之吡啶氧基;˙Y獨立地表示鹵素原子;氰基;羥基;胺基;硫基;經取代或未經取代之C1-C8烷基;具有1至9個鹵素原子之C1-C8鹵烷基;經取代或未經取代之C1-C8烷氧基;具有1至9個鹵素原子之C1-C8鹵烷氧基;經取代或未經取代之C1-C8烷基硫基;具有1至9個鹵素原子之C1-C8鹵 烷基硫基;經取代或未經取代之C1-C8烷基亞磺醯基;具有1至9個鹵素原子之C1-C8鹵烷基亞磺醯基;經取代或未經取代之C1-C8烷基磺醯基;具有1至9個鹵素原子之C1-C8鹵烷基磺醯基;經取代或未經取代之C1-C8烷基胺基;經取代或未經取代之二-C1-C8烷基胺基;經取代或未經取代之C1-C8烷基羰基;具有1至9個鹵素原子之C1-C8鹵烷基羰基;經取代或未經取代之C1-C8烷氧基羰基;具有1至9個鹵素原子之C1-C8鹵烷氧基羰基;或可經多至6個可相同或不同之基團Q取代之芳基;˙Q獨立地表示鹵素原子、氰基、硝基、經取代或未經取代之C1-C8烷基、包含多至9個可相同或不同之鹵素原子之C1-C8鹵烷基、經取代或未經取代之C1-C8烷氧基、包含多至9個可相同或不同之鹵素原子之C1-C8鹵烷氧基、經取代或未經取代之C1-C8烷基硫基、包含多至9個可相同或不同之鹵素原子之C1-C8鹵烷基硫基、經取代或未經取代之三(C1-C8)烷基矽烷基、經取代或未經取代之三(C1-C8)烷基矽烷基-C1-C8烷基、經取代或未經取代之(C1-C8烷氧基亞胺基)-C1-C8烷基或經取代或未經取代之(苄氧基亞胺基)-C1-C8烷基;˙R獨立地表示氫原子;鹵素原子;硝基;氰基;羥基;胺基;硫基;五氟-λ6-硫基;經取代或未經取代之(C1-C8烷氧基亞胺基)-C1-C8烷基;經取代或未經取代之(苄氧基亞胺基)-C1-C8烷基;經取代或未經取代之C1-C8烷基;具有1至9個鹵素原子之C1-C8鹵烷基;經取代或未經取代之C2-C8烯基;具有1至9個鹵素原子之C2-C8鹵烯基;經取代或未經取代之C2-C8炔基;具有1至9個鹵素原子之C2-C8鹵炔基;經取代或未經取代之C1-C8烷氧基;具有1至9個鹵素原子之C1-C8鹵烷氧基;經取代或未經取代之C1-C8烷基硫基;具有1至9個鹵素原子之C1-C8鹵烷基硫基;經取代或未經取代之C1-C8烷基亞磺醯基;具有1至9個鹵素原子之C1-C8鹵烷基亞磺醯基;經取代或未經取代之C1-C8烷基 磺醯基;具有1至9個鹵素原子之C1-C8鹵烷基磺醯基;經取代或未經取代之C1-C8烷基胺基;經取代或未經取代之二-C1-C8烷基胺基;經取代或未經取代之C2-C8烯氧基;經取代或未經取代之C3-C8炔氧基;經取代或未經取代之C3-C7環烷基;具有1至9個鹵素原子之C3-C7鹵環烷基;經取代或未經取代之三(C1-C8)烷基矽烷基;經取代或未經取代之C1-C8烷基羰基;具有1至9個鹵素原子之C1-C8鹵烷基羰基;經取代或未經取代之C1-C8烷氧基羰基;具有1至9個鹵素原子之C1-C8鹵烷氧基羰基;經取代或未經取代之C1-C8烷基胺甲醯基;經取代或未經取代之二-C1-C8烷基胺甲醯基;苯氧基;苯基硫基;苯基胺基;苄氧基;苄基硫基;或苄基胺基;以及其鹽、N-氧化物、金屬錯合物、類金屬錯合物及其光學活性異構體或幾何異構體。 Wherein ̇A represents an unsaturated or partially saturated 5-membered heterocyclic group of a carbon linkage which may be substituted with up to four groups R which may be the same or different; ̇T represents O or S; ̇n represents 0, 1, 2 , 3 or 4; ̇L represents a direct bond, CZ 4 Z 5 , O, S, SO, SO 2 or NZ 6 ; B represents a saturation of 1 to 4 heteroatoms selected from the list consisting of N, O, S a partially saturated or unsaturated monocyclic or fused bicyclic 3, 4, 5, 6, 7, 8, 9 or 10 membered ring which may be substituted with up to 6 groups which may be the same or different, Y; when L is a direct bond or represents an oxygen atom, B represents a pyridyl ring not; ˙Z 1 represents a non-substituted C 3 -C 7 cycloalkyl or substituted alkyl of up to 10 atoms or groups C 3 -C a 7- cycloalkyl group, which may be the same or different and optionally a list of the following: a halogen atom, a cyano group, a C 1 -C 8 alkyl group, containing up to 9 halogen atoms which may be the same or different the C 1 -C 8 haloalkyl, C 1 -C 8 alkoxy group, may contain up to 9 identical or different halogen atoms C 1 -C 8 haloalkoxy, C 1 -C 8 alkoxy, a carbonyl group containing up to nine C atoms which may be the same or different a 1- C 8 haloalkoxycarbonyl group, a C 1 -C 8 alkylaminocarbonyl group or a di-C 1 -C 8 alkylaminocarbonyl group; ̇Z 2 and Z 3 may be the same or different and represent a hydrogen atom; Substituted or unsubstituted C 1 -C 8 alkyl; substituted or unsubstituted C 2 -C 8 alkenyl; substituted or unsubstituted C 2 -C 8 alkynyl; cyano; isonitrile Nitro; halogen atom; substituted or unsubstituted C 1 -C 8 alkoxy group; substituted or unsubstituted C 2 -C 8 alkenyloxy group; substituted or unsubstituted C 2 -C 8 alkynyloxy; substituted or unsubstituted C 3 -C 7 cycloalkyl; substituted or unsubstituted C 1 -C 8 alkylthio; substituted or unsubstituted C 1 -C 8 Alkylsulfonyl; substituted or unsubstituted C 1 -C 8 alkylsulfinyl; amine; substituted or unsubstituted C 1 -C 8 alkylamino; substituted or unsubstituted Substituted bis-C 1 -C 8 alkylamino; substituted or unsubstituted C 1 -C 8 alkoxycarbonyl; substituted or unsubstituted C 1 -C 8 alkylamine fluorenyl; a substituted or unsubstituted bis -C 1 -C 8 alkyl amine acyl; or substituted or non-substituted NC 1 -C 8 alkyl -C 1 -C 8 Group - carbamoyl acyl; ˙Z 2 and Z 3, or with the carbon atoms they are attached, may form a substituted or non-substituted C 3 -C 7 cycloalkyl; or ˙Z 3 and the phenyl ring The substituent X adjacent to the point of attachment together with the continuous carbon atom to which Z 3 and X are attached may form a substituted or unsubstituted 5, 6 or 7 member partially saturated carbocyclic or heterocyclic ring containing up to 3 heteroatoms. and Z 2 as described herein; Z 4 and Z 5 independently represent a hydrogen atom; a halogen atom; a cyano group; a substituted or unsubstituted of C 1 -C 8 alkyl; C 1 1 having to 5 halogen atoms -C 8 haloalkyl; substituted or unsubstituted C 1 -C 8 alkoxy; substituted or unsubstituted C 1 -C 8 alkylthio; or substituted or unsubstituted C 1 -C 8 alkoxycarbonyl; or ̇Z 4 and Z 5 together with the carbon atom to which they are attached form a C(=O)carbonyl group; ̇Z 6 represents a hydrogen atom; substituted or unsubstituted C 1 -C 8 An alkyl group; a C 1 -C 8 haloalkyl group containing up to 9 halogen atoms which may be the same or different; a substituted or unsubstituted C 2 -C 8 alkenyl group; containing up to 9 which may be the same or different C 2 -C 8 haloalkenyl group of a halogen atom; substituted or not a substituted C 3 -C 8 alkynyl group; a C 3 -C 8 haloalkynyl group containing up to 9 halogen atoms which may be the same or different; a substituted or unsubstituted C 3 -C 7 cycloalkyl group; Up to 9 C 3 -C 7 halocycloalkyl groups which may be the same or different halogen atoms; substituted or unsubstituted C 3 -C 7 cycloalkyl-C 1 -C 8 alkyl group; formazan group; substituted or non-substituted C 1 -C 8 alkylcarbonyl; can contain up to 9 identical or different halogen atoms C 1 -C 8 haloalkyl carbonyl group; substituted or non-substituted C 1 -C 8 Alkoxycarbonyl; C 1 -C 8 haloalkoxycarbonyl group containing up to 9 halogen atoms which may be the same or different; substituted or unsubstituted C 1 -C 8 alkylsulfonyl group; 9 C 1 -C 8 haloalkylsulfonyl groups which may be the same or different halogen atoms; substituted or unsubstituted benzyl groups; or substituted or unsubstituted phenylsulfonyl groups; X independently Halogen atom; nitro group; cyano group; isonitrile group; hydroxyl group; amine group; sulfur group; pentafluoro-λ 6 -thio group; formazan group; methyl methoxy group; formamidine group; substituted or unsubstituted (hydroxyimino)-C 1 -C 8 alkyl; substituted or not Substituted (C 1 -C 8 alkoxyimino)-C 1 -C 8 alkyl; substituted or unsubstituted (C 2 -C 8 oxyimino)-C 1 -C 8- alkyl; substituted or unsubstituted (C 2 -C 8 alkynyloxyimido)-C 1 -C 8 alkyl; substituted or unsubstituted (benzyloxyimino)-C 1 -C 8 alkyl; carboxy; amine carbenyl; N-hydroxylamine carbenyl; carbamate; substituted or unsubstituted C 1 -C 8 alkyl; having 1 to 9 halogens atoms C 1 -C 8 haloalkyl; substituted or non-substituted C 2 -C 8 alkenyl group; a C 1 to having halogen atoms. 9 2 -C 8 haloalkenyl; substituted or non-substituted C 2 -C 8 alkynyl; C 2 -C 8 haloalkynyl group having 1 to 9 halogen atoms; substituted or unsubstituted C 1 -C 8 alkoxy group; C having 1 to 9 halogen atoms 1 -C 8 haloalkoxy; substituted or non-substituted C 1 -C 8 alkylthio; having a C 1 to halogen atoms. 9 1 -C 8 haloalkyl group; substituted or non- Substituted C 1 -C 8 alkylsulfinyl; C 1 -C 8 haloalkylsulfinyl having 1 to 9 halogen atoms; substituted or unsubstituted C 1 -C 8 alkylsulfonate醯 base; with 1 to a C 1 -C 8 haloalkylsulfonyl group of 9 halogen atoms; a substituted or unsubstituted C 1 -C 8 alkylamino group; a substituted or unsubstituted di-C 1 -C 8 alkyl group amino; substituted or non-substituted C 2 -C 8 alkenyl group; a C 1 to having halogen atoms. 9 2 -C 8 alkenyl group, a halogen; substituted or non-substituted C 3 -C 8 alkynyl group; a C 1 to having halogen atoms. 9 2 -C 8 alkynyl group, a halogen; substituted or non-substituted C 3 -C 7 cycloalkyl group; a C 1 to having halogen atoms. 9 3 -C 7 Halocycloalkyl; substituted or unsubstituted (C 3 -C 7 cycloalkyl)-C 1 -C 8 alkyl; substituted or unsubstituted C 4 -C 7 cycloalkenyl; having 1 to a C 4 -C 7 halocycloalkenyl group of 9 halogen atoms; a substituted or unsubstituted (C 3 -C 7 cycloalkyl)-C 2 -C 8 alkenyl group; substituted or unsubstituted (C 3- C 7 cycloalkyl)-C 2 -C 8 alkynyl; substituted or unsubstituted tri(C 1 -C 8 )alkyldecylalkyl; substituted or unsubstituted tris(C 1 -C 8) alkyl silicon -C 1 -C 8 alkyl group; a substituted or unsubstituted of C 1 -C 8 alkylcarbonyl group; a C 1 to having halogen atoms. 9 1 -C 8 haloalkyl carbonyl group; by Replace or not take The C 1 -C 8 alkylcarbonyloxy group; a C 1 to having halogen atoms. 9 1 -C 8 alkylcarbonyloxy halogen; substituted or non-substituted C 1 -C 8 alkylcarbonyl group; having a C 1 to halogen atoms. 9 1 -C 8 haloalkyl carbonyl group; substituted or non-substituted C 1 -C 8 alkoxycarbonyl group; a C 1 to having halogen atoms. 9 1 -C 8 halo alkoxycarbonyl group; a substituted or unsubstituted of C 1 -C 8 alkoxycarbonyl group; a C 1 to having halogen atoms. 9 1 -C 8 haloalkoxy-carbonyl group; a substituted or unsubstituted by Substituted C 1 -C 8 alkylamine carbenyl; substituted or unsubstituted di-C 1 -C 8 alkylamine carbenyl; substituted or unsubstituted C 1 -C 8 alkyl Aminocarbonyloxy; substituted or unsubstituted bis-C 1 -C 8 alkylaminocarbonyloxy; substituted or unsubstituted N-(C 1 -C 8 alkyl)hydroxylamine formazan Substituted or unsubstituted C 1 -C 8 alkoxyamine indenyl; substituted or unsubstituted N-(C 1 -C 8 alkyl)-C 1 -C 8 alkoxyamine A fluorenyl group; an aryl group which may be substituted with up to 6 groups which may be the same or different Q; an aryl group-C 1 which may be substituted with up to 6 groups which may be the same or different. -C 8 alkyl; aryl-C 2 -C 8 alkenyl which may be substituted with up to 6 groups which may be the same or different; Q may be substituted with up to 6 groups which may be the same or different. a aryl-C 2 -C 8 alkynyl group; an aryloxy group which may be substituted with up to 6 groups which may be the same or different Q; an arylthio group which may be substituted with up to 6 groups Q which may be the same or different An arylamine group which may be substituted with up to 6 groups which may be the same or different, Q; an aryl-C 1 -C 8 alkoxy group which may be substituted with up to 6 groups which may be the same or different. may be up to 6 may be the same or different substituent groups of Q aryl -C 1 -C 8 alkylthio; may be up to 6 may be the same or different substituent groups of Q -C 1 aryl group a -C 8 alkylamino group; a pyridyl group which may be substituted with up to 4 groups of Q; or a pyridyloxy group which may be substituted with up to 4 groups of Q; ̇Y independently represents a halogen atom; a cyano group; ; amine; group; a substituted or unsubstituted of C 1 -C 8 alkyl group; a C 1 to having halogen atoms. 9 1 -C 8 haloalkyl; substituted or non-substituted C 1 -C 8 alkoxy; C 1 -C 8 haloalkoxy having 1 to 9 halogen atoms; substituted or unsubstituted C 1 a -C 8 alkylthio group; a C 1 -C 8 haloalkylthio group having 1 to 9 halogen atoms; a substituted or unsubstituted C 1 -C 8 alkylsulfinyl group; having 1 to 9 a C 1 -C 8 haloalkylsulfinyl group of a halogen atom; a substituted or unsubstituted C 1 -C 8 alkylsulfonyl group; a C 1 -C 8 haloalkyl having 1 to 9 halogen atoms A sulfonyl group; a substituted or unsubstituted C 1 -C 8 alkylamino group; a substituted or unsubstituted bis-C 1 -C 8 alkylamino group; a substituted or unsubstituted C 1 a -C 8 alkylcarbonyl group; a C 1 -C 8 haloalkylcarbonyl group having 1 to 9 halogen atoms; a substituted or unsubstituted C 1 -C 8 alkoxycarbonyl group; having 1 to 9 halogen atoms a C 1 -C 8 haloalkoxycarbonyl group; or an aryl group which may be substituted with up to 6 groups which may be the same or different Q; ̇Q independently represents a halogen atom, a cyano group, a nitro group, a substituted or an unsubstituted the substituted C 1 -C 8 alkyl group, may contain up to 9 identical or different halogen atoms C 1 -C 8 haloalkyl, a substituted or unsubstituted of C 1 -C 8 alkoxy, comprising multiple to 9 may be the same or different halogen atoms C 1 -C 8 haloalkoxy, substituted or non-take The C 1 -C 8 alkylthio group, comprising up to 9 halogen atoms may be the same or different C 1 -C 8 haloalkyl group, a substituted or unsubstituted ter (C 1 -C 8) Alkylalkyl, substituted or unsubstituted tri(C 1 -C 8 )alkyldecyl-C 1 -C 8 alkyl, substituted or unsubstituted (C 1 -C 8 alkoxy Amino)-C 1 -C 8 alkyl or substituted or unsubstituted (benzyloxyimino)-C 1 -C 8 alkyl; ̇R independently represents a hydrogen atom; a halogen atom; a nitro group; Cyano; hydroxy; amine; thio; pentafluoro-λ 6 -thio; substituted or unsubstituted (C 1 -C 8 alkoxyimino)-C 1 -C 8 alkyl; substituted or non-substituted (benzyloxyimino group) -C 1 -C 8 alkyl; substituted or non-substituted C 1 -C 8 alkyl group; a C 1 to having halogen atoms. 9 1 -C 8 haloalkyl; substituted or non-substituted C 2 -C 8 alkenyl group; a C 1 to having halogen atoms. 9 2 -C 8 haloalkenyl; substituted or non-substituted C 2 -C 8 alkynyl a C 2 -C 8 haloalkynyl group having 1 to 9 halogen atoms; a substituted or unsubstituted C 1 -C 8 alkoxy group; a C 1 -C 8 haloalkane having 1 to 9 halogen atoms; oxygen ; Substituted or non-substituted C 1 -C 8 alkylthio; 1 -C 8 haloalkyl group having a C 1 to. 9 halogen atoms; a substituted or unsubstituted alkyl of C 1 -C 8 a sulfinyl group; a C 1 -C 8 haloalkylsulfinyl group having 1 to 9 halogen atoms; a substituted or unsubstituted C 1 -C 8 alkylsulfonyl group; having 1 to 9 a C 1 -C 8 haloalkylsulfonyl group of a halogen atom; a substituted or unsubstituted C 1 -C 8 alkylamino group; a substituted or unsubstituted di-C 1 -C 8 alkylamino group Substituted or unsubstituted C 2 -C 8 alkenyloxy; substituted or unsubstituted C 3 -C 8 alkynyloxy; substituted or unsubstituted C 3 -C 7 cycloalkyl; a C 3 -C 7 halocycloalkyl group of 1 to 9 halogen atoms; a substituted or unsubstituted tri(C 1 -C 8 )alkyldecane group; a substituted or unsubstituted C 1 -C 8 alkane carbonyl group; a C 1 to having halogen atoms. 9 1 -C 8 haloalkyl carbonyl group; substituted or non-substituted C 1 -C 8 alkoxycarbonyl group; a C 1 to having halogen atoms. 9 1 -C 8 -haloalkoxycarbonyl; substituted or unsubstituted C 1 -C 8 alkylamine carbenyl; substituted or unsubstituted bis-C 1 -C 8 alkylamine carbenyl; phenoxy; phenylthio; phenylamino; benzyloxy; benzylthio; or benzylamino; and salts, N-oxides, metal Compounds, metalloid complexes and optically active isomers or geometric isomers thereof.

除非另有指示,否則根據本發明經取代之基團或取代基可經一或多個下列基團或原子取代:鹵素原子;硝基;羥基;氰基;異腈基;胺基;硫基;五氟-λ6-硫基;甲醯基;甲醯氧基;甲醯胺基;胺甲醯基;N-羥基胺甲醯基;胺基甲酸酯基;(羥亞胺基)-C1-C6烷基;C1-C8烷基;三(C1-C8烷基)矽烷基;C3-C8環烷基;具有1至5個鹵素原子之C1-C8鹵烷基;具有1至5個鹵素原子之C3-C8鹵環烷基;C2-C8烯基;C2-C8炔基;C2-C8烯氧基;C2-C8炔氧基;C1-C8烷基胺基;二-C1-C8烷基胺基;C1-C8烷氧基;具有1至5個鹵素原子之C1-C8鹵烷氧基;C1-C8烷基硫基;具有1至5個鹵素原子之C1-C8鹵烷基硫基;C2-C8烯氧基;具有1至5個鹵素原子之C2-C8鹵烯氧基;C3-C8炔氧基;具有1至5個鹵素原子之C3-C8鹵炔氧基;C1-C8烷基羰基;具有1至5個鹵素原子之C1-C8鹵烷基羰基;C1-C8烷基胺甲醯基;二-C1-C8烷基胺甲醯基;N-C1-C8烷氧基胺甲醯基;C1-C8烷氧基胺甲醯基;N-C1-C8烷基-C1-C8烷氧基胺甲醯基;C1-C8烷氧基羰基;具有1至5個鹵素原子之C1-C8鹵 烷氧基羰基;C1-C8烷基羰氧基;具有1至5個鹵素原子之C1-C8鹵烷基羰氧基;C1-C8烷基羰基胺基;具有1至5個鹵素原子之C1-C8鹵烷基羰基胺基;C1-C8烷基胺基羰氧基;二-C1-C8烷基胺基羰氧基;C1-C8烷氧基羰氧基;C1-C8烷基硫基;具有1至5個鹵素原子之C1-C8鹵烷基硫基;C1-C8烷基亞磺醯基;具有1至5個鹵素原子之C1-C8鹵烷基亞磺醯基;C1-C8烷基磺醯基;具有1至5個鹵素原子之C1-C8鹵烷基磺醯基;C1-C8烷基胺基胺磺醯基;二-C1-C8烷基胺基胺磺醯基;(C1-C6烷氧基亞胺基)-C1-C6烷基;(C1-C6烯氧基亞胺基)-C1-C6烷基;(C1-C6-炔氧基亞胺基)-C1-C6烷基;2-側氧基吡咯啶-1-基;(苄氧基亞胺基)-C1-C6烷基;C1-C8烷氧基烷基;具有1至5個鹵素原子之C1-C8鹵烷氧基烷基;苄氧基;苄基硫基;苄基胺基;芳氧基;芳基硫基或芳基胺基。 Unless otherwise indicated, a substituted group or substituent according to the invention may be substituted with one or more of the following groups or atoms: a halogen atom; a nitro group; a hydroxyl group; a cyano group; an isonitrile group; an amine group; ; pentafluoro-λ 6 -thio; methyl sulfhydryl; methyl methoxy; methionine; amine carbhydryl; N-hydroxylamine decyl; urethane; (hydroxyimino) -C 1 -C 6 alkyl; C 1 -C 8 alkyl; tri(C 1 -C 8 alkyl)decylalkyl; C 3 -C 8 cycloalkyl; C 1 - having 1 to 5 halogen atoms C 8 haloalkyl; C 3 -C 8 halocycloalkyl having 1 to 5 halogen atoms; C 2 -C 8 alkenyl; C 2 -C 8 alkynyl; C 2 -C 8 alkenyl; 2 -C 8 alkynyloxy; C 1 -C 8 alkylamino group; di-C 1 -C 8 alkylamino group; C 1 -C 8 alkoxy group; C 1 - having 1 to 5 halogen atoms C 8 haloalkoxy; C 1 -C 8 alkylthio; having a C 1 to 5 halogen atoms, haloalkyl of 1 -C 8 alkylthio; C 2 -C 8 alkenyl group; having 1-5 halogen atoms C 2 -C 8 haloalkenyl group; C 3 -C 8 alkynyl group; having a C 1 to 5 halogen atoms 3 -C 8 haloalkynyl group; C 1 -C 8 alkylcarbonyl; having C 1 -C 8 haloalkyl having 1 to 5 halogen atoms Alkylcarbonyl; C 1 -C 8 alkylamine carbenyl; di-C 1 -C 8 alkylamine carbenyl; NC 1 -C 8 alkoxyamine carbenyl; C 1 -C 8 alkoxy carbamoyl acyl; the NC 1 -C 8 alkyl -C 1 -C 8 alkoxy, carbamoyl acyl; C 1 -C 8 alkoxycarbonyl; having a C 1 to 5 halogen atoms 1 -C 8 halogen alkoxycarbonyl; C 1 -C 8 alkylcarbonyloxy group; having a C 1 to 5 halogen atoms 1 -C 8 haloalkyl carbonyl group; C 1 -C 8 alkylcarbonyl group; having 1 to C 1 -C 8 haloalkylcarbonylamino group of 5 halogen atoms; C 1 -C 8 alkylaminocarbonyloxy group; di-C 1 -C 8 alkylaminocarbonyloxy group; C 1 -C 8 alkoxycarbonyloxy; C 1 -C 8 alkylthio; having a C 1 to 5 halogen atoms 1 -C 8 haloalkyl group; C 1 -C 8 alkylsulfinyl acyl; having a a C 1 -C 8 haloalkylsulfinyl group having 5 halogen atoms; a C 1 -C 8 alkylsulfonyl group; a C 1 -C 8 haloalkylsulfonyl group having 1 to 5 halogen atoms; C 1 -C 8 alkylaminoamine sulfonyl; di-C 1 -C 8 alkylaminoamine sulfonyl; (C 1 -C 6 alkoxyimino)-C 1 -C 6 alkane group; (C 1 -C 6 alkylene oxyalkylene amine) -C 1 -C 6 alkyl; (C 1 -C 6 - alkynyl oxyalkylene amine) -C 1 -C 6 Group; a 2-oxoalkyl pyrrolidin-1-yl; (benzyloxycarbonylamino imino) -C 1 -C 6 alkyl; C 1 -C 8 alkoxyalkyl; having 1 to 5 halogen atoms C 1 -C 8 haloalkoxyalkyl; benzyloxy; benzylthio; benzylamino; aryloxy; arylthio or arylamine.

根據本發明,以下通用術語一般按以下含義使用:˙鹵素意謂氟、氯、溴或碘;羧基意謂-C(=O)OH;羰基意謂-C(=O)-;胺甲醯基意謂-C(=O)NH2;N-羥基胺甲醯基意謂-C(=O)NHOH;SO表示亞碸基;SO2表示碸基;雜原子意謂硫、氮或氧;亞甲基意謂雙基-CH2-;˙烷基、烯基及炔基以及含有此等術語之部分可為直鏈或分支鏈;˙鹵化基團,尤其鹵烷基、鹵烷氧基及環烷基,可包含多至9個相同或不同鹵素原子;˙術語「芳基」意謂苯基或萘基; ˙在經兩個可相同或不同之取代基取代之胺基或任何其他含胺基基團之胺基部分的情況下,該兩個取代基與其所連接之氮原子一起可形成雜環基,較佳為5至7員雜環基,其可經取代或可包括其他雜原子,例如N-嗎啉基(morpholino group)或哌啶基。 According to the present invention, the following general terms are generally used in the following senses: ̇ halogen means fluorine, chlorine, bromine or iodine; carboxyl means -C(=O)OH; carbonyl means -C(=O)-; amine formazan The meaning is -C(=O)NH 2 ; N-hydroxylamine carbenyl means -C(=O)NHOH; SO means a fluorenylene group; SO 2 means a fluorenyl group; hetero atom means sulfur, nitrogen or oxygen Methylene means bis-CH 2 -; decyl, alkenyl and alkynyl and the moiety containing these terms may be straight or branched; hydrazine halide, especially haloalkyl, haloalkoxy And a cycloalkyl group which may contain up to 9 identical or different halogen atoms; ̇ the term "aryl" means phenyl or naphthyl; oxime is an amino group substituted by two substituents which may be the same or different or any In the case of other amine moiety containing an amine group, the two substituents together with the nitrogen atom to which they are attached may form a heterocyclic group, preferably a 5 to 7 membered heterocyclic group, which may be substituted or may include Other heteroatoms such as N-morpholino or piperidinyl.

˙當本發明化合物可依互變異構形式存在時,此種化合物在上文及下文中亦應理解為在適當時包括相應互變異構形式,甚至在各種情況下未特定提及此等互變異構形式時。 When the compounds of the invention may exist in tautomeric forms, such compounds are also to be understood above and in the following to include the corresponding tautomeric forms, as appropriate, even in each case without specifically mentioning such tautomers. When constructing the form.

視化合物中之不對稱中心數而定,本發明化合物中之任一者可依一或多種光學或對掌性異構體形式存在。因此,本發明同樣關於所有光學異構體及其外消旋或非外消旋(scalemic)混合物(術語「非外消旋」表示按不同比例之對映異構體之混合物)及按所有比例之所有可能立體異構體之混合物。非對映異構體及/或光學異構體可根據一般技術者本身已知之方法分離。 Depending on the number of asymmetric centers in the compound, any of the compounds of the invention may exist in one or more optical or palmical isomer forms. Thus, the present invention is also directed to all optical isomers and racemic or non-racemic mixtures thereof (the term "non-racemic" means mixtures of enantiomers in different ratios) and in all ratios. a mixture of all possible stereoisomers. The diastereomers and/or optical isomers can be separated according to methods known per se to the person skilled in the art.

視化合物中之雙鍵數而定,本發明化合物中之任一者亦可依一或多種幾何異構體形式存在。因此,本發明同樣關於所有幾何異構體及按所有比例之所有可能混合物。幾何異構體可根據一般技術者本身已知之通用方法分離。視鏈或環之取代基之相對位置(同側/反側或順式/反式)而定,本發明化合物中之任一者亦可依一或多種幾何異構體形式存在。因此,本發明同樣關於所有同側/反側(或順式/反式)異構體及按所有比例之所有可能同側/反側(或順式/反式)混合物。同側/反側(或順式/反式)異構體可根據一般技術者本身已知之通用方法分離。 Depending on the number of double bonds in the compound, any of the compounds of the invention may also exist in one or more geometric isomeric forms. Accordingly, the invention is also to all geometric isomers and all possible mixtures in all ratios. Geometric isomers can be separated according to the general methods known to those of ordinary skill in the art. Depending on the relative position of the substituents of the chain or ring (ipsilateral/reverse or cis/trans), any of the compounds of the invention may also exist in one or more geometric isomers. Thus, the invention is equally directed to all ipsilateral/reverse (or cis/trans) isomers and all possible ipsilateral/reverse (or cis/trans) mixtures in all ratios. The ipsilateral/reverse (or cis/trans) isomers can be separated according to the general methods known to those of ordinary skill in the art.

較佳之本發明化合物為式(I)化合物,其中A係選自由以下組成之清單:- 式(A1)之雜環 The preferred compounds of the invention of formula (I), wherein A is selected from the list consisting of: - heterocycle of formula (A. 1) of

其中:R1至R3可相同或不同且表示氫原子;鹵素原子;經取代或未經取代之C1-C5烷基;包含多至9個可相同或不同之鹵素原子之C1-C5鹵烷基;經取代或未經取代之C1-C5烷氧基或包含多至9個可相同或不同之鹵素原子之C1-C5鹵烷氧基;- 式(A2)之雜環 Wherein: R 1 to R 3 may be the same or different and represent a hydrogen atom; a halogen atom; a substituted or unsubstituted of C 1 -C 5 alkyl; C comprising up to 9 identical or different halogen atoms 1-- C 5 haloalkyl group; a substituted or unsubstituted of C 1 -C 5 alkoxy group or may comprise up to nine identical or different a halogen atoms C 1 -C 5 haloalkoxy; - of formula (A 2 Heterocycle

其中:R4至R6可相同或不同且表示氫原子;鹵素原子;經取代或未經取代之C1-C5烷基;包含多至9個可相同或不同之鹵素原子之C1-C5鹵烷基;經取代或未經取代之C1-C5烷氧基或包含多至9個可相同或不同之鹵素原子之C1-C5鹵烷氧基;- 式(A3)之雜環 Wherein: R 4 to R 6 may be the same or different and represent a hydrogen atom; a halogen atom; a substituted or unsubstituted of C 1 -C 5 alkyl; C comprising up to 9 identical or different halogen atoms 1-- C 5 haloalkyl group; a substituted or unsubstituted of C 1 -C 5 alkoxy group or may comprise up to nine identical or different a halogen atoms C 1 -C 5 haloalkoxy; - of formula (A 3 Heterocycle

其中:R7表示氫原子;鹵素原子;經取代或未經取代之C1-C5烷基;包含多至9個可相同或不同之鹵素原子之C1-C5鹵烷基;經取代或未經取代之C1-C5烷氧基或包含多至9個可相同或不同之鹵素原子之C1-C5鹵烷氧基;R8表示氫原子或經取代或未經取代之C1-C5烷基; - 式(A4)之雜環 Wherein: R 7 represents a hydrogen atom; a halogen atom; a substituted or unsubstituted alkyl group of C 1 -C 5; may contain up to 9 identical or different halogen atoms C 1 -C 5 haloalkyl; substituted or unsubstituted of C 1 -C 5 alkoxy group or may comprise up to nine identical or different a halogen atoms C 1 -C 5 haloalkoxy; R 8 represents a hydrogen atom or a substituted or non-substituted C 1 -C 5 alkyl; - heterocyclic ring of formula (A 4 )

其中:R9至R11可相同或不同且表示氫原子;鹵素原子;經取代或未經取代之C1-C5烷基;胺基;經取代或未經取代之C1-C5烷氧基;經取代或未經取代之C1-C5烷基硫基;包含多至9個可相同或不同之鹵素原子之C1-C5鹵烷基或包含多至9個可相同或不同之鹵素原子之C1-C5鹵烷氧基;- 式(A5)之雜環 Wherein: R 9 to R 11 may be the same or different and represent a hydrogen atom; a halogen atom; a substituted or unsubstituted C 1 -C 5 alkyl group; an amine group; a substituted or unsubstituted C 1 -C 5 alkane group; substituted or non-substituted C 1 -C 5 alkylthio; it can contain up to 9 identical or different halogen atoms C 1 -C 5 haloalkyl, or comprising up to 9 may be the same or a C 1 -C 5 haloalkoxy group of a different halogen atom; - a heterocyclic ring of the formula (A 5 )

其中:R12及R13可相同或不同且表示氫原子;鹵素原子;經取代或未經取代之C1-C5烷基;經取代或未經取代之C1-C5烷氧基;胺基;包含多至9個可相同或不同之鹵素原子之C1-C5鹵烷基或包含多至9個可相同或不同之鹵素原子之C1-C5鹵烷氧基;R14表示氫原子;鹵素原子;經取代或未經取代之C1-C5烷基;經取代或未經取代之C1-C5烷氧基;胺基;包含多至9個可相同或不同之鹵素原子之C1-C5鹵烷基或包含多至9個可相同或不同之鹵素原子之C1-C5鹵烷氧基;- 式(A6)之雜環 Wherein: R 12 and R 13 may be the same or different and represent a hydrogen atom; a halogen atom; a substituted or unsubstituted C 1 -C 5 alkyl group; a substituted or unsubstituted C 1 -C 5 alkoxy group; Amino group; C 1 -C 5 haloalkyl group containing up to 9 halogen atoms which may be the same or different or C 1 -C 5 haloalkoxy group containing up to 9 halogen atoms which may be the same or different; R 14 a hydrogen atom; a halogen atom; a substituted or unsubstituted C 1 -C 5 alkyl group; a substituted or unsubstituted C 1 -C 5 alkoxy group; an amine group; containing up to 9 which may be the same or different the halogen atom of the C 1 -C 5 haloalkyl, or may contain up to 9 identical or different halogen atoms C 1 -C 5 haloalkoxy; - of formula (A 6) of the heterocycle

其中:R15表示氫原子;鹵素原子;氰基;經取代或未經取代之C1-C5烷基;經取代或未經取代之C1-C5烷氧基;包含多至9個可相同或不同之鹵素原子之C1-C5鹵烷氧基或包含多至9個可相同或不同之鹵素原子之C1-C5鹵烷基;R16及R18可相同或不同且表示氫原子;鹵素原子;經取代或未經取代之C1-C5烷氧基羰基;經取代或未經取代之C1-C5烷基;包含多至9個可相同或不同之鹵素原子之C1-C5鹵烷氧基或包含多至9個可相同或不同之鹵素原子之C1-C5鹵烷基;R17表示氫原子或經取代或未經取代之C1-C5烷基;- 式(A7)之雜環 Wherein: R 15 represents a hydrogen atom; a halogen atom; a cyano group; a substituted or unsubstituted C 1 -C 5 alkyl group; a substituted or unsubstituted C 1 -C 5 alkoxy group; containing up to 9 may be the same or different halogen atoms C 1 -C 5 alkoxy group or a halogen comprising up to 9 identical or different halogen atoms C 1 -C 5 haloalkyl group; R 16 and R 18 may be the same or different and a hydrogen atom; a halogen atom; a substituted or unsubstituted C 1 -C 5 alkoxycarbonyl group; a substituted or unsubstituted C 1 -C 5 alkyl group; containing up to 9 halogens which may be the same or different C 1 -C 5 atoms or haloalkoxy comprising up to 9 halogen atoms may be the same or different C 1 -C 5 haloalkyl group; R 17 represents a hydrogen atom or a substituted or unsubstituted of C 1 - C 5 alkyl; - heterocyclic ring of formula (A 7 )

其中:R19表示氫原子或C1-C5烷基;R20至R22可相同或不同且表示氫原子;鹵素原子;經取代或未經取代之C1-C5烷基或包含多至9個可相同或不同之鹵素原子之C1-C5鹵烷基;- 式(A8)之雜環 Wherein: R 19 represents a hydrogen atom or a C 1 -C 5 alkyl group; R 20 to R 22 may be the same or different and represent a hydrogen atom; a halogen atom; a substituted or unsubstituted C 1 -C 5 alkyl group or a plurality of To a C 1 -C 5 haloalkyl group which may be the same or different halogen atom; - a heterocyclic ring of the formula (A 8 )

其中:R23表示氫原子;鹵素原子;經取代或未經取代之C1-C5烷基或包含多至9個可相同或不同之鹵素原子之C1-C5鹵烷基;R24表示氫原子或經取代或未經取代之C1-C5烷基或包含多至9個可相同或不同之鹵素原子之C1-C5鹵烷基;- 式(A9)之雜環 Wherein: R 23 represents a hydrogen atom; a halogen atom; a substituted or unsubstituted alkyl group of C 1 -C 5 to 9 or a plurality may be the same or different halogen atoms C 1 -C 5 haloalkyl group; R 24 It represents a hydrogen atom or a substituted or unsubstituted alkyl group of C 1 -C 5 to 9 or a plurality may be the same or different halogen atoms C 1 -C 5 haloalkyl group; - of formula (A 9) of the heterocycle

其中:R25表示氫原子;鹵素原子;經取代或未經取代之C1-C5烷基或包含多至9個可相同或不同之鹵素原子之C1-C5鹵烷基;R26表示氫原子;經取代或未經取代之C1-C5烷基或包含多至9個可相同或不同之鹵素原子之C1-C5鹵烷基;- 式(A10)之雜環 Wherein: R 25 represents a hydrogen atom; a halogen atom; a substituted or unsubstituted alkyl group of C 1 -C 5 to 9 or a plurality may be the same or different halogen atoms C 1 -C 5 haloalkyl group; R 26 represents a hydrogen atom; a substituted or unsubstituted alkyl group of C 1 -C 5, or may contain up to 9 identical or different halogen atoms C 1 -C 5 haloalkyl group; - heterocycle of formula (A 10) of

其中:R27表示氫原子;鹵素原子;經取代或未經取代之C1-C5烷基或包含多至9個可相同或不同之鹵素原子之C1-C5鹵烷基;R28表示氫原子;鹵素原子;經取代或未經取代之C1-C5烷基;包含多至9個可相同或不同之鹵素原子之C1-C5鹵烷基;包含多至9個可 相同或不同之鹵素原子之C1-C5鹵烷氧基;胺基;經取代或未經取代之C1-C5烷基胺基或經取代或未經取代之二(C1-C5烷基)胺基;- 式(A11)之雜環 Wherein: R 27 represents a hydrogen atom; a halogen atom; a substituted or unsubstituted alkyl group of C 1 -C 5 or comprising up to 9 identical or different halogen atoms C 1 -C 5 haloalkyl group; R 28 a hydrogen atom; a halogen atom; a substituted or unsubstituted C 1 -C 5 alkyl group; a C 1 -C 5 haloalkyl group containing up to 9 halogen atoms which may be the same or different; containing up to 9 C 1 -C 5 haloalkoxy group of the same or different halogen atom; amine group; substituted or unsubstituted C 1 -C 5 alkylamino group or substituted or unsubstituted bis (C 1 -C 5- alkyl)amino group; - heterocyclic ring of formula (A 11 )

其中:R29表示氫原子;鹵素原子;經取代或未經取代之C1-C5烷基;經取代或未經取代之C1-C5烷氧基;包含多至9個可相同或不同之鹵素原子之C1-C5鹵烷氧基或包含多至9個可相同或不同之鹵素原子之C1-C5鹵烷基;R30表示氫原子;鹵素原子;經取代或未經取代之C1-C5烷基;包含多至9個可相同或不同之鹵素原子之C1-C5鹵烷基;包含多至9個可相同或不同之鹵素原子之C1-C5鹵烷氧基;胺基;經取代或未經取代之C1-C5烷基胺基或經取代或未經取代之二(C1-C5烷基)胺基;- 式(A12)之雜環 Wherein: R 29 represents a hydrogen atom; a halogen atom; a substituted or unsubstituted C 1 -C 5 alkyl group; a substituted or unsubstituted C 1 -C 5 alkoxy group; containing up to 9 may be the same or halogen atoms different from C 1 -C 5 alkoxy group or a halogen comprising up to 9 identical or different halogen atoms C 1 -C 5 haloalkyl group; R 30 represents a hydrogen atom; a halogen atom; a substituted or unsubstituted by the substituted C 1 -C 5 alkyl; may contain up to 9 identical or different halogen atoms C 1 -C 5 haloalkyl; can contain up to 9 identical or different halogen atoms C 1 -C 5 -haloalkoxy; amine; substituted or unsubstituted C 1 -C 5 alkylamino group or substituted or unsubstituted bis(C 1 -C 5 alkyl)amino group; - formula (A 12 ) heterocyclic ring

其中:R31表示氫原子或經取代或未經取代之C1-C5烷基;R32表示氫原子;鹵素原子;經取代或未經取代之C1-C5烷基或包含多至9個可相同或不同之鹵素原子之C1-C5鹵烷基;R33表示氫原子;鹵素原子;硝基;經取代或未經取代之C1-C5烷基;經取代或未經取代之C1-C5烷氧基;包含多至9個可相同或不同之 鹵素原子之C1-C5鹵烷氧基或包含多至9個可相同或不同之鹵素原子之C1-C5鹵烷基;- 式(A13)之雜環 Wherein: R 31 represents a hydrogen atom or a substituted or unsubstituted C 1 -C 5 alkyl group; R 32 represents a hydrogen atom; a halogen atom; a substituted or unsubstituted C 1 -C 5 alkyl group or contains up to 9 C 1 -C 5 haloalkyl groups which may be the same or different halogen atoms; R 33 represents a hydrogen atom; a halogen atom; a nitro group; a substituted or unsubstituted C 1 -C 5 alkyl group; the substituted C 1 -C 5 alkoxy; can contain up to 9 identical or different halogen atoms C 1 -C 5 alkoxy group or a halogen comprising up to 9 C may be the same or different halogen atoms 1 -C 5 haloalkyl; - heterocyclic ring of formula (A 13 )

其中:R34表示氫原子;鹵素原子;經取代或未經取代之C1-C5烷基;經取代或未經取代之C3-C5環烷基;包含多至9個可相同或不同之鹵素原子之C1-C5鹵烷基;經取代或未經取代之C1-C5烷氧基;經取代或未經取代之C2-C5炔氧基或包含多至9個可相同或不同之鹵素原子之C1-C5鹵烷氧基;R35表示氫原子;鹵素原子;經取代或未經取代之C1-C5烷基;氰基;經取代或未經取代之C1-C5烷氧基;經取代或未經取代之C1-C5烷基硫基;包含多至9個可相同或不同之鹵素原子之C1-C5鹵烷基;包含多至9個可相同或不同之鹵素原子之C1-C5鹵烷氧基;胺基;經取代或未經取代之C1-C5烷基胺基或經取代或未經取代之二(C1-C5烷基)胺基;R36表示氫原子或經取代或未經取代之C1-C5烷基;- 式(A14)之雜環 Wherein: R 34 represents a hydrogen atom; a halogen atom; a substituted or unsubstituted C 1 -C 5 alkyl group; a substituted or unsubstituted C 3 -C 5 cycloalkyl group; containing up to 9 may be the same or a C 1 -C 5 haloalkyl group of a different halogen atom; a substituted or unsubstituted C 1 -C 5 alkoxy group; a substituted or unsubstituted C 2 -C 5 alkynyloxy group or containing up to 9 a C 1 -C 5 haloalkoxy group which may be the same or different halogen atom; R 35 represents a hydrogen atom; a halogen atom; a substituted or unsubstituted C 1 -C 5 alkyl group; a cyano group; the substituted C 1 -C 5 alkoxy group; a substituted or unsubstituted of C 1 -C 5 alkylthio; can contain up to 9 identical or different halogen atoms C 1 -C 5 haloalkyl, a C 1 -C 5 haloalkoxy group containing up to 9 halogen atoms which may be the same or different; an amine group; a substituted or unsubstituted C 1 -C 5 alkylamino group or a substituted or unsubstituted a bis(C 1 -C 5 alkyl)amino group; R 36 represents a hydrogen atom or a substituted or unsubstituted C 1 -C 5 alkyl group; - a heterocyclic ring of the formula (A 14 )

其中: R37及R38可相同或不同且表示氫原子;鹵素原子;經取代或未經取代之C1-C5烷基;包含多至9個可相同或不同之鹵素原子之C1-C5鹵烷基;經取代或未經取代之C1-C5烷氧基或經取代或未經取代之C1-C5烷基硫基;R39表示氫原子或經取代或未經取代之C1-C5烷基;- 式(A15)之雜環 Wherein: R 37 and R 38 may be the same or different and represent a hydrogen atom; a halogen atom; a substituted or unsubstituted of C 1 -C 5 alkyl; C comprising up to 9 identical or different halogen atoms 1-- C 5 haloalkyl; substituted or unsubstituted C 1 -C 5 alkoxy or substituted or unsubstituted C 1 -C 5 alkylthio; R 39 represents a hydrogen atom or substituted or not Substituted C 1 -C 5 alkyl;-heterocyclic ring of formula (A 15 )

其中:R40及R41可相同或不同且表示氫原子;鹵素原子;經取代或未經取代之C1-C5烷基或包含多至9個可相同或不同之鹵素原子之C1-C5鹵烷基;- 式(A16)之雜環 Wherein: R 40 and R 41 may be the same or different and represent a hydrogen atom; a halogen atom; a substituted or unsubstituted alkyl group of C 1 -C 5 or C comprising up to 9 identical or different halogen atoms 1-- C 5 haloalkyl; - heterocyclic ring of formula (A 16 )

其中:R42及R43可相同或不同且表示氫原子;鹵素原子;經取代或未經取代之C1-C5烷基;包含多至9個可相同或不同之鹵素原子之C1-C5鹵烷基;或胺基;- 式(A17)之雜環 Wherein: R 42 and R 43 may be the same or different and represent a hydrogen atom; a halogen atom; a substituted or unsubstituted of C 1 -C 5 alkyl; C comprising up to 9 identical or different halogen atoms 1-- C 5 haloalkyl; or an amine group; - a heterocyclic ring of the formula (A 17 )

其中: R44及R45可相同或不同且表示氫原子;鹵素原子;經取代或未經取代之C1-C5烷基或包含多至9個可相同或不同之鹵素原子之C1-C5鹵烷基;- 式(A18)之雜環 Wherein: R 44 and R 45 may be the same or different and represent a hydrogen atom; a halogen atom; a substituted or unsubstituted alkyl group of C 1 -C 5 or C comprising up to 9 identical or different halogen atoms 1-- C 5 haloalkyl; - heterocyclic ring of formula (A 18 )

其中:R47表示氫原子;鹵素原子;經取代或未經取代之C1-C5烷基或包含多至9個可相同或不同之鹵素原子之C1-C5鹵烷基;R46表示氫原子;鹵素原子;經取代或未經取代之C1-C5烷基;包含多至9個可相同或不同之鹵素原子之C1-C5鹵烷基或經取代或未經取代之C1-C5烷基硫基;- 式(A19)之雜環 Wherein: R 47 represents a hydrogen atom; a halogen atom; a substituted or unsubstituted alkyl group of C 1 -C 5 to 9 or a plurality may be the same or different halogen atoms C 1 -C 5 haloalkyl group; R 46 represents a hydrogen atom; a halogen atom; a substituted or unsubstituted alkyl group of C 1 -C 5; may contain up to 9 identical or different halogen atoms C 1 -C 5 haloalkyl, or a substituted or unsubstituted a C 1 -C 5 alkylthio group; a heterocyclic ring of the formula (A 19 )

其中:R49及R48可相同或不同且表示氫原子;鹵素原子;經取代或未經取代之C1-C5烷基;經取代或未經取代之C1-C5烷氧基;包含多至9個可相同或不同之鹵素原子之C1-C5鹵烷氧基或包含多至9個可相同或不同之鹵素原子之C1-C5鹵烷基;- 式(A20)之雜環 Wherein: R 49 and R 48 may be the same or different and represent a hydrogen atom; a halogen atom; a substituted or unsubstituted C 1 -C 5 alkyl group; a substituted or unsubstituted C 1 -C 5 alkoxy group; It may comprise up to nine identical or different a halogen atoms C 1 -C 5 alkoxy group or a halogen comprising up to 9 identical or different halogen atoms C 1 -C 5 haloalkyl group; - of formula (A 20 Heterocycle

其中:R50及R51可相同或不同且表示氫原子;鹵素原子;經取代或未經取代之C1-C5烷基;經取代或未經取代之C1-C5烷氧基;包含多至9個可相同或不同之鹵素原子之C1-C5鹵烷氧基或包含多至9個可相同或不同之鹵素原子之C1-C5鹵烷基;- 式(A21)之雜環 Wherein: R 50 and R 51 may be the same or different and represent a hydrogen atom; a halogen atom; a substituted or unsubstituted C 1 -C 5 alkyl group; a substituted or unsubstituted C 1 -C 5 alkoxy group; It may comprise up to nine identical or different a halogen atoms C 1 -C 5 alkoxy group or a halogen comprising up to 9 identical or different halogen atoms C 1 -C 5 haloalkyl group; - of formula (A 21 Heterocycle

其中:R52表示氫原子;鹵素原子;經取代或未經取代之C1-C5烷基或包含多至9個可相同或不同之鹵素原子之C1-C5鹵烷基;- 式(A22)之雜環 Wherein: R 52 represents a hydrogen atom; a halogen atom; a substituted or unsubstituted alkyl group of C 1 -C 5 or comprising up to 9 halogen atoms may be the same or different C 1 -C 5 haloalkyl group; - of formula (A 22 ) heterocyclic ring

其中:R53表示氫原子;鹵素原子;經取代或未經取代之C1-C5烷基或包含多至9個可相同或不同之鹵素原子之C1-C5鹵烷基;- 式(A23)之雜環 Wherein: R 53 represents a hydrogen atom; a halogen atom; a substituted or unsubstituted alkyl group of C 1 -C 5 or comprising up to 9 halogen atoms may be the same or different C 1 -C 5 haloalkyl group; - of formula Heterocyclic ring of (A 23 )

其中: R54及R56可相同或不同且表示氫原子;鹵素原子;經取代或未經取代之C1-C5烷基或包含多至9個可相同或不同之鹵素原子之C1-C5鹵烷基;R55表示氫原子或經取代或未經取代之C1-C5烷基;- 式(A24)之雜環 Wherein: R 54 and R 56 may be the same or different and represent a hydrogen atom; a halogen atom; a substituted or unsubstituted alkyl group of C 1 -C 5 or C comprising up to 9 identical or different halogen atoms 1-- C 5 haloalkyl; R 55 represents a hydrogen atom or a substituted or unsubstituted C 1 -C 5 alkyl group; - a heterocyclic ring of the formula (A 24 )

其中:R57及R59可相同或不同且表示氫原子;鹵素原子;經取代或未經取代之C1-C5烷基或包含多至9個可相同或不同之鹵素原子之C1-C5鹵烷基;R58表示氫原子或經取代或未經取代之C1-C5烷基;- 式(A25)之雜環 Wherein: R 57 and R 59 may be the same or different and represent a hydrogen atom; a halogen atom; a substituted or unsubstituted alkyl group of C 1 -C 5 or C comprising up to 9 identical or different halogen atoms 1-- C 5 haloalkyl; R 58 represents a hydrogen atom or a substituted or unsubstituted C 1 -C 5 alkyl group; - a heterocyclic ring of the formula (A 25 )

其中:R60及R61可相同或不同且表示氫原子;鹵素原子;經取代或未經取代之C1-C5烷基或包含多至9個可相同或不同之鹵素原子之C1-C5鹵烷基;R62表示氫原子或經取代或未經取代之C1-C5烷基;- 式(A26)之雜環 Wherein: R 60 and R 61 may be the same or different and represent a hydrogen atom; a halogen atom; a substituted or unsubstituted alkyl group of C 1 -C 5 or C comprising up to 9 identical or different halogen atoms 1-- C 5 haloalkyl; R 62 represents a hydrogen atom or a substituted or unsubstituted C 1 -C 5 alkyl group; - a heterocyclic ring of the formula (A 26 )

其中:R65表示氫原子;鹵素原子;經取代或未經取代之C1-C5烷基;經取代或未經取代之C3-C5環烷基;包含多至9個可相同或不同之鹵素原子之C1-C5鹵烷基;經取代或未經取代之C1-C5烷氧基;經取代或未經取代之C2-C5炔氧基或包含多至9個可相同或不同之鹵素原子之C1-C5鹵烷氧基;R63表示氫原子;鹵素原子;經取代或未經取代之C1-C5烷基;氰基;經取代或未經取代之C1-C5烷氧基;經取代或未經取代之C1-C5烷基硫基;包含多至9個可相同或不同之鹵素原子之C1-C5鹵烷基;包含多至9個可相同或不同之鹵素原子之C1-C5鹵烷氧基;胺基;經取代或未經取代之C1-C5烷基胺基或二(C1-C5烷基)胺基;R64表示氫原子或經取代或未經取代之C1-C5烷基。 Wherein: R 65 represents a hydrogen atom; a halogen atom; a substituted or unsubstituted C 1 -C 5 alkyl group; a substituted or unsubstituted C 3 -C 5 cycloalkyl group; containing up to 9 may be the same or a C 1 -C 5 haloalkyl group of a different halogen atom; a substituted or unsubstituted C 1 -C 5 alkoxy group; a substituted or unsubstituted C 2 -C 5 alkynyloxy group or containing up to 9 a C 1 -C 5 haloalkoxy group which may be the same or different halogen atom; R 63 represents a hydrogen atom; a halogen atom; a substituted or unsubstituted C 1 -C 5 alkyl group; a cyano group; a substituted or not the substituted C 1 -C 5 alkoxy group; a substituted or unsubstituted of C 1 -C 5 alkylthio; can contain up to 9 identical or different halogen atoms C 1 -C 5 haloalkyl, a C 1 -C 5 haloalkoxy group containing up to 9 halogen atoms which may be the same or different; an amine group; a substituted or unsubstituted C 1 -C 5 alkylamino group or a di(C 1 -C A 5- alkyl)amino group; R 64 represents a hydrogen atom or a substituted or unsubstituted C 1 -C 5 alkyl group.

更佳之本發明化合物為式(I)化合物,其中A係選自由如本文所定義之A2、A5、A6、A10及A13組成之清單。 More preferably, the compound of the invention is a compound of formula (I) wherein A is selected from the list consisting of A 2 , A 5 , A 6 , A 10 and A 13 as defined herein.

甚至更佳之本發明化合物為式(I)化合物,其中A表示A13,其中R34表示經取代或未經取代之C1-C5烷基、包含多至9個可相同或不同之鹵素原子之C1-C5鹵烷基、經取代或未經取代之C1-C5烷氧基;R35表示氫原子或鹵素原子;且R36表示經取代或未經取代之C1-C5烷基。 Even more preferred compounds of the invention are compounds of formula (I) wherein A represents A 13 wherein R 34 represents substituted or unsubstituted C 1 -C 5 alkyl, containing up to 9 halogen atoms which may be the same or different a C 1 -C 5 haloalkyl group, a substituted or unsubstituted C 1 -C 5 alkoxy group; R 35 represents a hydrogen atom or a halogen atom; and R 36 represents a substituted or unsubstituted C 1 -C 5 alkyl.

甚至更佳之本發明化合物為式(I)化合物,其中A表示A13,其中R34表示C1-C5烷基、包含多至3個可相同或不同之鹵素原子之C1-C5鹵烷基;R35表示氫原子、氯原子或氟原子;且R36表示甲基。 Even more preferably the compounds of the invention of formula (I) compounds wherein A represents A 13 is wherein R 34 represents C 1 -C 5 alkyl group, may contain up to 3 identical or different halogen atoms C 1 -C 5 halogen An alkyl group; R 35 represents a hydrogen atom, a chlorine atom or a fluorine atom; and R 36 represents a methyl group.

其他較佳之本發明化合物為式(I)化合物,其中T表示O。 Other preferred compounds of the invention are those of formula (I) wherein T represents O.

其他較佳之本發明化合物為式(I)化合物,其中Z1表示經取代或未經取代之環丙基。 Other preferred compounds of the invention are those of formula (I) wherein Z 1 represents a substituted or unsubstituted cyclopropyl group.

其他更佳之本發明化合物為式(I)化合物,其中Z1表示未經取代之環丙基或2-C1-C5烷基環丙基。 Other more preferred compounds of the invention are those of formula (I) wherein Z 1 represents unsubstituted cyclopropyl or 2-C 1 -C 5 alkylcyclopropyl.

其他甚至更佳之本發明化合物為式(I)化合物,其中Z1表示未經取代之環丙基。 Other even more preferred compounds of the invention are those of formula (I) wherein Z 1 represents an unsubstituted cyclopropyl group.

其他甚至更佳之本發明化合物為式(I)化合物,其中Z1表示2-甲基環丙基。 Further and even more preferred compounds of the invention are compounds of formula (I) wherein Z 1 represents 2-methylcyclopropyl.

其他較佳之本發明化合物為式(I)化合物,其中Z2及Z3獨立地表示氫原子或甲基。 Other preferred compounds of the invention are those of formula (I) wherein Z 2 and Z 3 independently represent a hydrogen atom or a methyl group.

更佳之本發明化合物為式(I)化合物,其中Z2表示氫原子且Z3表示氫原子或甲基。 More preferably, the compound of the invention is a compound of formula (I) wherein Z 2 represents a hydrogen atom and Z 3 represents a hydrogen atom or a methyl group.

其他較佳之本發明化合物為式(I)化合物,其中n表示0、1或2。 Other preferred compounds of the invention are those of formula (I) wherein n represents 0, 1 or 2.

其他較佳之本發明化合物為式(I)化合物,其中L表示直接鍵。 Other preferred compounds of the invention are those of formula (I) wherein L represents a direct bond.

其他較佳之本發明化合物為式(I)化合物,其中L表示氧原子。 Other preferred compounds of the invention are compounds of formula (I) wherein L represents an oxygen atom.

其他較佳之本發明化合物為式(I)化合物,其中L表示亞甲基或羰基。 Other preferred compounds of the invention are those of formula (I) wherein L represents methylene or carbonyl.

其他較佳之本發明化合物為式(I)化合物,其中B表示經取代或未經取代之環氧乙烷基環;經取代或未經取代之吡咯基環;經取代或未經取代之吡唑基環;經取代或未經取代之噻吩基環;經取代或未經取代之苯并噻吩基環;經取代或未經取代之喹啉基環;經取代或未經取代之異喹啉基環;經取代或未經取代之呋喃環;或經取代或未經取代之苯并呋喃環。 Other preferred compounds of the invention are compounds of formula (I) wherein B represents substituted or unsubstituted oxiranyl ring; substituted or unsubstituted pyrrolyl ring; substituted or unsubstituted pyrazole Substituted or substituted thiophenyl ring; substituted or unsubstituted benzothienyl ring; substituted or unsubstituted quinolinyl ring; substituted or unsubstituted isoquinolyl Ring; substituted or unsubstituted furan ring; or substituted or unsubstituted benzofuran ring.

其他更佳之本發明化合物為式(I)化合物,其中B表示經取代或未經取代之噻吩基環。其他更佳之本發明化合物為式(I)化合物,其中B表示經取代或未經取代之苯并噻吩基環。 Other more preferred compounds of the invention are those of formula (I) wherein B represents a substituted or unsubstituted thienyl ring. Other more preferred compounds of the invention are those of formula (I) wherein B represents a substituted or unsubstituted benzothienyl ring.

其他較佳之本發明化合物為式(I)化合物,其中X獨立地表示鹵素原子;經取代或未經取代之C1-C8烷基;包含多至9個可相同或不同之鹵素原子之C1-C8鹵烷基;經取代或未經取代之C3-C7環烷基;三(C1-C8烷基)矽烷基;經取代或未經取代之C1-C8烷氧基;或經取代或未經取代之C1-C8烷基硫基。 Further preferred compounds of the invention are those of the formula (I), wherein X independently represents a halogen atom; a substituted or unsubstituted C 1 -C 8 alkyl group; C containing up to 9 halogen atoms which may be the same or different 1- C 8 haloalkyl; substituted or unsubstituted C 3 -C 7 cycloalkyl; tri(C 1 -C 8 alkyl)decyl; substituted or unsubstituted C 1 -C 8 alkane An oxy group; or a substituted or unsubstituted C 1 -C 8 alkylthio group.

其他較佳之本發明化合物為式(I)化合物,其中Y獨立地表示鹵素原子;經取代或未經取代之C1-C8烷基;包含多至9個可相同或不同之鹵素原子之C1-C8鹵烷基;經取代或未經取代之C1-C8烷氧基;包含多至9個可相同或不同之鹵素原子之C1-C8鹵烷氧基。 Other preferred compounds of the invention are those of formula (I) wherein Y independently represents a halogen atom; a substituted or unsubstituted C 1 -C 8 alkyl group; C containing up to 9 halogen atoms which may be the same or different 1 -C 8 haloalkyl; substituted or non-substituted C 1 -C 8 alkoxy; can contain up to 9 identical or different halogen atoms C 1 -C 8 haloalkoxy.

關於本發明化合物之取代基之上述偏好可依各種方式組合。因此,此等較佳特徵組合提供本發明化合物之子類。較佳本發明化合物之該等子類之實例為:- A之較佳特徵與T、Z1至Z3、n、X、L、B及Y之較佳特徵;- T之較佳特徵與A、Z1至Z3、n、X、L、B及Y之較佳特徵;- Z1之較佳特徵與A、T、Z2、Z3、n、X、L、B及Y之較佳特徵;- Z2之較佳特徵與A、T、Z1、Z3、n、X、L、B及Y之較佳特徵;- Z3之較佳特徵與A、T、Z1、Z2、n、X、L、B及Y之較佳特徵;- n之較佳特徵與A、T、Z1至Z3、X、L、B及Y之較佳特徵;- X之較佳特徵與A、T、Z1至Z3、n、L、B及Y之較佳特徵;- L之較佳特徵與A、T、Z1至Z3、n、X、B及Y之較佳特徵;- B之較佳特徵與A、T、Z1至Z3、n、X、L及Y之較佳特徵;- Y之較佳特徵與A、T、Z1至Z3、n、X、L及B之較佳特徵。 The above preferences regarding the substituents of the compounds of the invention can be combined in various ways. Accordingly, combinations of such preferred features provide a subclass of the compounds of the invention. Examples of such subclasses of preferred compounds of this invention are: - preferred features of A with 1 to Z 3, preferably wherein n, X, L, B and Y, or T, Z; - T preferred feature of the A, Z 1 to Z 3 , n, X, L, B and Y preferred features; - Z 1 preferred features and A, T, Z 2 , Z 3 , n, X, L, B and Y Preferred features; - preferred features of Z 2 and preferred features of A, T, Z 1 , Z 3 , n, X, L, B and Y; - preferred features of Z 3 and A, T, Z 1 Preferred features of Z 2 , n, X, L, B and Y; preferred features of -n and preferred features of A, T, Z 1 to Z 3 , X, L, B and Y; Preferred features and preferred features of A, T, Z 1 to Z 3 , n, L, B and Y; - preferred features of L and A, T, Z 1 to Z 3 , n, X, B and Y Preferred features; - preferred features of B and preferred features of A, T, Z 1 to Z 3 , n, X, L and Y; - preferred features of Y and A, T, Z 1 to Z 3 Preferred features of n, X, L and B.

在本發明化合物之取代基之此等較佳特徵組合中,該等較佳特徵亦可選自A、T、Z1至Z3、n、X、L、B及Y中之每一者之更佳特徵,以形式本發明化合物之最佳子類。 In such preferred combinations of features of the substituents of the compounds of the invention, the preferred features may also be selected from each of A, T, Z 1 to Z 3 , n, X, L, B and Y. More preferred features are in the form of the best subclass of the compounds of the invention.

本發明亦關於一種製備式(I)化合物之方法。 The invention also relates to a process for the preparation of a compound of formula (I).

因此,根據本發明之另一態樣,提供一種製備如本文所定義且其中T表示O之式(I)化合物的方法P1,且該方法包含使式(II)之胺或其鹽之一: Thus, according to another aspect of the present invention, there is provided a process P1 for the preparation of a compound of formula (I) as defined herein and wherein T represents O, and which comprises one of the amines of formula (II) or a salt thereof:

其中Z1、Z2、Z3、n、X、L及B如本文所定義;與式(III)之羧酸衍生物反應: Wherein Z 1 , Z 2 , Z 3 , n, X, L and B are as defined herein; reacted with a carboxylic acid derivative of formula (III):

其中A如本文所定義且U1表示選自由以下組成之清單的離去基:鹵素原子、羥基、-ORa、-OC(=O)Ra(Ra為經取代或未經取代之C1-C6烷基、經取代或未經取代之C1-C6鹵烷基、苄基、4-甲氧基苄基或五氟苯基)或式O-C(=O)A之基團;需要或適用時在催化劑存在下且若U1表示羥基則在縮合劑存在下,且若U1表示鹵素原子則在酸結合劑存在下。 Wherein A is as defined herein and U 1 represents a leaving group selected from the list consisting of a halogen atom, a hydroxyl group, -OR a , -OC(=O)R a (R a is substituted or unsubstituted C a group of 1 -C 6 alkyl, substituted or unsubstituted C 1 -C 6 haloalkyl, benzyl, 4-methoxybenzyl or pentafluorophenyl) or OC(=O)A If necessary or applicable in the presence of a catalyst and if U 1 represents a hydroxyl group, in the presence of a condensing agent, and if U 1 represents a halogen atom, it is in the presence of an acid binder.

式(II)之N-羥取代胺衍生物為已知的或可藉由已知方法製備,諸如醛或酮之還原胺化(Bioorganics and Medicinal Chemistry Letters(2006),16,2014)或亞胺之還原(Tetrahedron(2005),61,11689)或鹵素、甲磺酸酯或甲苯磺酸酯之親核取代(Journal of Medicinal Chemistry(2002),45,3887)。 The N-hydroxy substituted amine derivatives of formula (II) are known or can be prepared by known methods, such as reductive amination of aldehydes or ketones (Bioorganics and Medicinal Chemistry Letters (2006), 16 , 2014) or imines. Reduction (Tetrahedron (2005), 61 , 11689) or nucleophilic substitution of halogen, mesylate or tosylate (Journal of Medicinal Chemistry (2002), 45 , 3887).

式(III)之羧酸衍生物為已知的或可藉由已知方法製備。 The carboxylic acid derivative of the formula (III) is known or can be produced by a known method.

若U1表示羥基,則本發明方法P1係在縮合劑存在下進行。適合之縮合劑可選自由以下組成之非限制性清單:酸鹵化物形成劑,諸如光氣、三溴化磷、三氯化磷、五氯化磷、三氯氧磷或亞硫醯氯;酐形 成劑,諸如氯甲酸乙酯、氯甲酸甲酯、氯甲酸異丙酯、氯甲酸異丁酯或甲烷磺醯氯;碳化二亞胺,諸如N,N'-二環己基碳化二亞胺(DCC)或其他習用縮合劑,諸如五氧化磷、聚磷酸、N,N'-羰基-二咪唑、2-乙氧基-N-乙氧基羰基-1,2-二氫喹啉(EEDQ)、三苯基膦/四氯甲烷、水合氯化4-(4,6-二甲氧基[1.3.5]-三嗪-2-基)-4-甲基嗎啉鎓、六氟磷酸溴-三(N-吡咯啶基)鏻(bromo-tripyrrolidinophosphoniumhexafluorophosphate)或丙烷膦酸酐(T3P)。 If U 1 represents a hydroxyl group, the process P1 of the invention is carried out in the presence of a condensing agent. Suitable condensing agents may be selected from a non-limiting list of the following: acid halide formers such as phosgene, phosphorus tribromide, phosphorus trichloride, phosphorus pentachloride, phosphorus oxychloride or sulphide chloride; Anhydride forming agent such as ethyl chloroformate, methyl chloroformate, isopropyl chloroformate, isobutyl chloroformate or methanesulfonium chloride; carbodiimide such as N,N'-dicyclohexylcarbodiimide (DCC) or other conventional condensing agents such as phosphorus pentoxide, polyphosphoric acid, N,N'-carbonyl-diimidazole, 2-ethoxy-N-ethoxycarbonyl-1,2-dihydroquinoline (EEDQ) ), triphenylphosphine/tetrachloromethane, chlorinated 4-(4,6-dimethoxy[1.3.5]-triazin-2-yl)-4-methylmorpholinium, hexafluorophosphate Bromo-tripyrrolidinophosphonium hexafluorophosphate or propanephosphonic anhydride (T3P).

本發明方法P1可在催化劑存在下進行。適合之催化劑可選自由N,N-二甲基吡啶-4-胺、1-羥基-苯并三唑或N,N-二甲基甲醯胺組成之清單。 Process P1 according to the invention can be carried out in the presence of a catalyst. Suitable catalysts may be selected from the list consisting of N,N-dimethylpyridin-4-amine, 1-hydroxy-benzotriazole or N,N-dimethylformamide.

若U1表示鹵素原子,則本發明方法P1係在酸結合劑存在下進行。用於進行本發明方法P1之適合酸結合劑在各種情況下為習用於該等反應之所有無機及有機鹼。優先使用鹼土金屬、鹼金屬氫化物、鹼金屬氫氧化物或鹼金屬醇鹽,諸如氫氧化鈉、氫化鈉、氫氧化鈣、氫氧化鉀、第三丁醇鉀,或其他氫氧化銨;鹼金屬碳酸鹽,諸如碳酸銫、碳酸鈉、碳酸鉀、碳酸氫鉀、碳酸氫鈉;鹼金屬或鹼土金屬乙酸鹽,諸如乙酸鈉、乙酸鉀、乙酸鈣;以及三級胺,諸如三甲胺、三乙胺、二異丙基乙胺、三丁胺、N,N-二甲基苯胺、吡啶、N-甲基哌啶、N,N-二甲基吡啶-4-胺、二氮雜雙環辛烷(DABCO)、二氮雜雙環-壬烯(DBN)或二氮雜雙環十一烯(DBU)。 If U 1 represents a halogen atom, the process P1 of the invention is carried out in the presence of an acid binder. Suitable acid binders for carrying out the process P1 according to the invention are in each case all inorganic and organic bases customary for such reactions. Preference is given to using alkaline earth metals, alkali metal hydrides, alkali metal hydroxides or alkali metal alkoxides, such as sodium hydroxide, sodium hydride, calcium hydroxide, potassium hydroxide, potassium butoxide or other ammonium hydroxide; Metal carbonates such as cesium carbonate, sodium carbonate, potassium carbonate, potassium hydrogencarbonate, sodium hydrogencarbonate; alkali metal or alkaline earth metal acetates such as sodium acetate, potassium acetate, calcium acetate; and tertiary amines such as trimethylamine, three Ethylamine, diisopropylethylamine, tributylamine, N,N-dimethylaniline, pyridine, N-methylpiperidine, N,N-dimethylpyridin-4-amine, diazabicyclooctyl Alkane (DABCO), diazabicyclo-decene (DBN) or diazabicycloundecene (DBU).

亦有可能在不存在其他縮合劑之情況下操作或採用過量胺組分以使其同時充當酸結合劑。 It is also possible to operate or employ an excess of the amine component in the absence of other condensing agents to simultaneously act as an acid binder.

用於進行本發明方法P1之適合溶劑可為習用惰性有機溶劑。優先使用視情況鹵化之脂族、脂環族或芳族烴,諸如石油醚、己烷、庚烷、環己烷、甲基環己烷、苯、甲苯、二甲苯或十氫萘;氯苯、二氯苯、二氯甲烷、氯仿、四氯化碳、二氯乙烷或三氯乙烷;醚,諸如乙 醚、二異丙基醚、甲基第三丁基醚、甲基第三戊基醚、二噁烷、四氫呋喃、1,2-二甲氧基乙烷、1,2-二乙氧基乙烷或苯甲醚;腈,諸如乙腈、丙腈、正丁腈或異丁腈或苄腈;醯胺,諸如N,N-二甲基甲醯胺、N,N-二甲基乙醯胺、N-甲基甲醯苯胺、N-甲基吡咯啶酮或六甲基磷醯三胺;醇,諸如甲醇、乙醇、丙醇、異丙醇;酯,諸如乙酸甲酯或乙酸乙酯;亞碸,諸如二甲亞碸;或碸,諸如環丁碸。 Suitable solvents for carrying out the process P1 according to the invention may be customary inert organic solvents. Preference is given to using aliphatic, alicyclic or aromatic hydrocarbons which are optionally halogenated, such as petroleum ether, hexane, heptane, cyclohexane, methylcyclohexane, benzene, toluene, xylene or decahydronaphthalene; chlorobenzene , dichlorobenzene, dichloromethane, chloroform, carbon tetrachloride, dichloroethane or trichloroethane; ether, such as B Ether, diisopropyl ether, methyl tert-butyl ether, methyl third amyl ether, dioxane, tetrahydrofuran, 1,2-dimethoxyethane, 1,2-diethoxy B Alkane or anisole; nitrile such as acetonitrile, propionitrile, n-butyronitrile or isobutyronitrile or benzonitrile; decylamine such as N,N-dimethylformamide, N,N-dimethylacetamide , N-methylformanilide, N-methylpyrrolidone or hexamethylphosphonium triamine; alcohols such as methanol, ethanol, propanol, isopropanol; esters such as methyl acetate or ethyl acetate; Aachen, such as dimethyl hydrazine; or hydrazine, such as guanidine.

當進行本發明方法P1時,式(II)之胺衍生物可依其鹽形式使用,諸如鹽酸鹽或任何其他適宜鹽。 When carrying out the process P1 according to the invention, the amine derivatives of the formula (II) can be used in the form of their salts, such as the hydrochloride or any other suitable salt.

當進行本發明方法P1時,每莫耳式(III)之試劑可採用1莫耳或過量式(II)之胺衍生物及1至3莫耳酸結合劑。 When carrying out the process P1 according to the invention, the reagent of the formula (III) can be used in an amount of 1 mole or excess of the amine derivative of the formula (II) and a 1 to 3 molar acid binder.

亦有可能按其他比率採用反應組分。藉由已知方法進行處理。 It is also possible to use the reaction components in other ratios. Processing is performed by a known method.

根據本發明之另一態樣,提供一種製備其中L表示直接鍵或亞甲基之式(I)化合物的第二方法P2,如以下反應流程所說明: According to another aspect of the present invention, there is provided a second method P2 for preparing a compound of formula (I) wherein L represents a direct bond or a methylene group, as illustrated by the following reaction scheme:

方法P2 Method P2

其中A、T、Z1、Z2、Z3、n、X及B如本文所定義,L表示直接鍵或亞甲基,U2表示諸如氯、溴或碘之鹵素原子或三氟甲磺酸酯基,且W1表示硼衍生物,諸如酸、酸酯或三氟硼酸鉀衍生物。 Wherein A, T, Z 1 , Z 2 , Z 3 , n, X and B are as defined herein, L represents a direct bond or a methylene group, and U 2 represents a halogen atom such as chlorine, bromine or iodine or trifluoromethanesulfonate. An acid ester group, and W 1 represents a boron derivative, such as acid, An acid ester or a potassium trifluoroborate derivative.

因此,本發明涉及一種製備式(I)化合物之方法P2 Accordingly, the present invention relates to a process for the preparation of a compound of formula (I) P2

其中A、T、Z1、Z2、Z3、n、X及B如技術方案1至14中任一項所 定義,且L表示直接鍵或亞甲基,該方法P2之特徵在於使式(IV)化合物 Wherein A, T, Z 1 , Z 2 , Z 3 , n, X and B are as defined in any one of claims 1 to 14, and L represents a direct bond or a methylene group, and the method P2 is characterized by (IV) compound

其中A、T、Z1、Z2、Z3、n、X如上文所定義且U2表示諸如氯溴或碘之鹵素原子或三氟甲磺酸酯基,與式(V)化合物反應, Wherein A, T, Z 1 , Z 2 , Z 3 , n, X are as defined above and U 2 represents a halogen atom such as chlorobromo or iodine or a triflate group, reacted with a compound of formula (V),

其中L及B如上文所定義且W1表示硼衍生物,諸如酸、酸酯或三氟硼酸鉀衍生物。 Wherein L and B are as defined above and W 1 represents a boron derivative, such as acid, An acid ester or a potassium trifluoroborate derivative.

方法P2可在過渡金屬催化劑(諸如鈀)存在下且適當時在膦配位體或N-雜環碳烯配位體存在下且在鹼存在下且適當時在溶劑存在下進行。 Process P2 can be carried out in the presence of a transition metal catalyst such as palladium and, where appropriate, in the presence of a phosphine ligand or an N-heterocyclic carbene ligand and in the presence of a base and, where appropriate, in the presence of a solvent.

式(IV)化合物可藉由已知方法(WO-2007/087906及WO-2010/130767)製備且式(V)化合物之製備為熟知的。 The compound of the formula (IV) can be produced by a known method (WO-2007/087906 and WO-2010/130767) and the preparation of the compound of the formula (V) is well known.

本發明方法P2可在催化劑存在下進行,諸如金屬鹽或錯合物。出於此目的,適合之金屬衍生物為過渡金屬催化劑,諸如鈀。出於此目的,適合之金屬鹽或錯合物為例如氯化鈀、乙酸鈀、肆(三苯基膦)鈀、雙(二亞苄基丙酮)鈀、雙(三苯基膦)二氯化鈀或1,1'-雙(二苯基膦基)二茂鐵氯化鈀(II)。 Process P2 according to the invention can be carried out in the presence of a catalyst, such as a metal salt or a complex. Suitable metal derivatives for this purpose are transition metal catalysts such as palladium. Suitable metal salts or complexes for this purpose are, for example, palladium chloride, palladium acetate, ruthenium (triphenylphosphine) palladium, bis(dibenzylideneacetone)palladium, bis(triphenylphosphine)dichloride Palladium or 1,1'-bis(diphenylphosphino)ferrocene palladium(II) chloride.

亦有可能藉由各別添加以下物質至鈀鹽及配位體或鹽之反應物中而在反應混合物中產生鈀錯合物:諸如三乙基膦、三-第三丁基膦、四氟硼酸三-第三丁基鏻、三環己基膦、2-(二環己基膦)聯苯、2- (二-第三丁基膦)聯苯、2-(二環己基膦)-2'-(N,N-二甲基胺基)聯苯、三苯基-膦、參(鄰甲苯基)膦、3-(二苯基膦基)苯磺酸鈉、參-2-(甲氧基-苯基)膦、2,2'-雙(二苯基膦)-1,1'-聯萘、1,4-雙(二苯基膦)丁烷、1,2-雙(二苯基膦)乙烷、1,4-雙(二環己基膦)丁烷、1,2-雙(二環己基膦)-乙烷、2-(二環己基膦)-2'-(N,N-二甲基胺基)-聯苯、1,1'-雙(二苯基膦基)-二茂鐵、(R)-(-)-1-[(S)-2-二苯基膦基)二茂鐵基]乙基二環己基膦、亞磷酸參(2,4-第三丁基-苯基)酯或氯化1,3-雙(2,4,6-三甲基苯基)咪唑鎓。 It is also possible to produce a palladium complex in the reaction mixture by separately adding the following to the palladium salt and the ligand or salt reactant: such as triethylphosphine, tri-tert-butylphosphine, tetrafluoro Tri-tert-butyl borohydride, tricyclohexylphosphine, 2-(dicyclohexylphosphine)biphenyl, 2- (di-tert-butylphosphine)biphenyl, 2-(dicyclohexylphosphino)-2'-(N,N-dimethylamino)biphenyl, triphenyl-phosphine, ginseng (o-tolyl) Phosphine, sodium 3-(diphenylphosphino)benzenesulfonate, cis-2-(methoxy-phenyl)phosphine, 2,2'-bis(diphenylphosphino)-1,1'-binaphthyl , 1,4-bis(diphenylphosphino)butane, 1,2-bis(diphenylphosphino)ethane, 1,4-bis(dicyclohexylphosphine)butane, 1,2-double (two Cyclohexylphosphine)-ethane, 2-(dicyclohexylphosphine)-2'-(N,N-dimethylamino)-biphenyl, 1,1'-bis(diphenylphosphino)-di Ferrocene, (R)-(-)-1-[(S)-2-diphenylphosphino)ferrocenyl]ethyldicyclohexylphosphine, phosphite ginseng (2,4-t-butyl) -Phenyl) ester or 1,3-bis(2,4,6-trimethylphenyl)imidazolium chloride.

亦宜選擇來自商業目錄之適當催化劑及/或配位體,諸如Strem Chemicals之「有機合成之金屬催化劑(Metal Catalysts for Organic Synthesis)」或Strem Chemicals之「磷配位體及化合物(Phosphorous Ligands and Compounds)」。 It is also advisable to select suitable catalysts and/or ligands from the commercial catalogue, such as "Metal Catalysts for Organic Synthesis" by Strem Chemicals or "Phosphorous Ligands and Compounds" by Strem Chemicals. )".

用於進行本發明方法P2之適合鹼可為習用於該等反應之無機及有機鹼。優先使用鹼土金屬或鹼金屬氫氧化物,諸如氫氧化鈉、氫氧化鈣、氫氧化鉀,或其他氫氧化銨衍生物;鹼土金屬、鹼金屬或銨之氟化物,諸如氟化鉀、氟化銫或氟化四丁基銨;鹼土金屬或鹼金屬碳酸鹽,諸如碳酸鈉、碳酸鉀、碳酸氫鉀、碳酸氫鈉或碳酸銫;鹼金屬或鹼土金屬乙酸鹽,諸如乙酸鈉、乙酸鉀或乙酸鈣;鹼金屬醇鹽,諸如第三丁醇鉀或第三丁醇鈉;鹼金屬磷酸鹽,諸如磷酸三鉀;三級胺,諸如三甲胺、三乙胺、三丁胺、N,N-二甲基苯胺、N,N-二環己基甲胺、N-甲基哌啶、N,N-二甲基胺基吡啶、二氮雜雙環辛烷(DABCO)、二氮雜雙環壬烯(DBN)或二氮雜雙環十一烯(DBU);以及芳族鹼,諸如吡啶、甲基吡啶、二甲基吡啶或三甲基吡啶。 Suitable bases for carrying out the process P2 according to the invention may be inorganic and organic bases customary for such reactions. Preference is given to using alkaline earth or alkali metal hydroxides, such as sodium hydroxide, calcium hydroxide, potassium hydroxide or other ammonium hydroxide derivatives; alkaline earth metals, alkali metal or ammonium fluorides, such as potassium fluoride, fluorination铯 or tetrabutylammonium fluoride; alkaline earth metal or alkali metal carbonate such as sodium carbonate, potassium carbonate, potassium hydrogencarbonate, sodium hydrogencarbonate or cesium carbonate; alkali metal or alkaline earth metal acetate such as sodium acetate, potassium acetate or Calcium acetate; an alkali metal alkoxide such as potassium third butoxide or sodium butoxide; an alkali metal phosphate such as tripotassium phosphate; a tertiary amine such as trimethylamine, triethylamine, tributylamine, N, N - dimethylaniline, N,N-dicyclohexylmethylamine, N-methylpiperidine, N,N-dimethylaminopyridine, diazabicyclooctane (DABCO), diazabicyclononene (DBN) or diazabicycloundecene (DBU); and an aromatic base such as pyridine, picoline, lutidine or trimethylpyridine.

用於進行本發明方法P2之適合溶劑可為習用惰性有機溶劑。優先使用視情況鹵素原子化(halogen atomated)之脂族、脂環族或芳族烴,諸如石油醚、己烷、庚烷、環己烷、甲基環己烷、苯、甲苯、二 甲苯或十氫萘;氯苯、二氯苯、二氯甲烷、氯仿、四氯化碳、二氯乙烷或三氯乙烷;醚,諸如乙醚、二異丙基醚、甲基第三丁基醚、甲基第三戊基醚、二噁烷、四氫呋喃、1,2-二甲氧基乙烷、1,2-二乙氧基乙烷或苯甲醚;腈,諸如乙腈、丙腈、正丁腈或異丁腈或苄腈;醯胺,諸如N,N-二甲基甲醯胺、N,N-二甲基乙醯胺、N-甲基甲醯苯胺、N-甲基吡咯啶酮或六甲基磷醯三胺;酯,諸如乙酸甲酯或乙酸乙酯;亞碸,諸如二甲亞碸;或碸,諸如環丁碸。 Suitable solvents for carrying out the process P2 according to the invention may be customary inert organic solvents. Preferred use of halogen atomized aliphatic, alicyclic or aromatic hydrocarbons such as petroleum ether, hexane, heptane, cyclohexane, methylcyclohexane, benzene, toluene, Toluene or decahydronaphthalene; chlorobenzene, dichlorobenzene, dichloromethane, chloroform, carbon tetrachloride, dichloroethane or trichloroethane; ethers such as diethyl ether, diisopropyl ether, methyl tertidine Ether, methyl tertiary amyl ether, dioxane, tetrahydrofuran, 1,2-dimethoxyethane, 1,2-diethoxyethane or anisole; nitrile, such as acetonitrile, propionitrile , n-butyronitrile or isobutyronitrile or benzonitrile; decylamine, such as N,N-dimethylformamide, N,N-dimethylacetamide, N-methylformanilide, N-methyl Pyrrolidone or hexamethylphosphonium triamine; esters such as methyl acetate or ethyl acetate; hydrazine, such as dimethyl hydrazine; or hydrazine, such as cyclobutyl hydrazine.

亦宜使用共溶劑進行本發明方法P2,該共溶劑為諸如水或醇,諸如甲醇、乙醇、丙醇、異丙醇或第三丁醇。 It is also preferred to carry out the process P2 according to the invention using a cosolvent such as water or an alcohol such as methanol, ethanol, propanol, isopropanol or tert-butanol.

當進行本發明方法P2時,每莫耳式(IV)化合物可使用1莫耳或過量式(V)化合物及1至5莫耳鹼及0.01至20莫耳%鈀錯合物。 When carrying out the process P2 according to the invention, one mole or excess of the compound of the formula (V) and from 1 to 5 moles of base and from 0.01 to 20 moles of palladium complex can be used per mole of the compound of formula (IV).

亦有可能按其他比率採用反應組分。藉由已知方法進行處理。 It is also possible to use the reaction components in other ratios. Processing is performed by a known method.

根據本發明之另一態樣,提供一種製備其中L表示雜原子之式(I)化合物的第三方法P3,如以下反應流程所說明: According to another aspect of the present invention, there is provided a third method P3 for preparing a compound of formula (I) wherein L represents a hetero atom, as illustrated by the following reaction scheme:

方法P3 Method P3

其中A、T、Z1、Z2、Z3、n、X及B如本文所定義,U3表示鹵素原子且L表示氧原子、硫原子或經單取代或未經取代之氮原子。 Wherein A, T, Z 1 , Z 2 , Z 3 , n, X and B are as defined herein, U 3 represents a halogen atom and L represents an oxygen atom, a sulfur atom or a monosubstituted or unsubstituted nitrogen atom.

本發明方法P3係在鹼存在下進行。 The process P3 according to the invention is carried out in the presence of a base.

式(VI)化合物可藉由已知方法(WO-2007/087906及WO-2010/130767)製備且式(VII)化合物之製備為熟知的。 The compound of the formula (VI) can be produced by a known method (WO-2007/087906 and WO-2010/130767) and the preparation of the compound of the formula (VII) is well known.

用於進行本發明方法P3之適合鹼可為習用於該等反應之無機及有機鹼。優先使用鹼土金屬或鹼金屬氫氧化物,諸如氫氧化鈉、氫氧 化鈣、氫氧化鉀,或其他氫氧化銨衍生物;鹼土金屬、鹼金屬或銨之氟化物,諸如氟化鉀、氟化銫或氟化四丁基銨;鹼土金屬或鹼金屬碳酸鹽,諸如碳酸鈉、碳酸鉀、碳酸氫鉀、碳酸氫鈉或碳酸銫;鹼金屬或鹼土金屬乙酸鹽,諸如乙酸鈉、乙酸鉀或乙酸鈣;鹼金屬醇鹽,諸如第三丁醇鉀或第三丁醇鈉;鹼金屬磷酸鹽,諸如磷酸三鉀;三級胺,諸如三甲胺、三乙胺、三丁胺、N,N-二甲基苯胺、N,N-二環己基甲胺、N-甲基哌啶、N,N-二甲基胺基吡啶、二氮雜雙環辛烷(DABCO)、二氮雜雙環壬烯(DBN)或二氮雜雙環十一烯(DBU);以及芳族鹼,諸如吡啶、甲基吡啶、二甲基吡啶或三甲基吡啶。 Suitable bases for carrying out the process P3 according to the invention may be inorganic and organic bases customary for such reactions. Preferred use of alkaline earth metals or alkali metal hydroxides, such as sodium hydroxide, hydrogen and oxygen Calcium, potassium hydroxide, or other ammonium hydroxide derivative; alkaline earth metal, alkali metal or ammonium fluoride, such as potassium fluoride, barium fluoride or tetrabutylammonium fluoride; alkaline earth metal or alkali metal carbonate, Such as sodium carbonate, potassium carbonate, potassium hydrogencarbonate, sodium hydrogencarbonate or cesium carbonate; alkali metal or alkaline earth metal acetate such as sodium acetate, potassium acetate or calcium acetate; alkali metal alkoxide such as potassium third butoxide or third Sodium butoxide; alkali metal phosphates such as tripotassium phosphate; tertiary amines such as trimethylamine, triethylamine, tributylamine, N,N-dimethylaniline, N,N-dicyclohexylmethylamine, N -methylpiperidine, N,N-dimethylaminopyridine, diazabicyclooctane (DABCO), diazabicyclononene (DBN) or diazabicycloundecene (DBU); Alkaloids such as pyridine, picoline, lutidine or trimethylpyridine.

用於進行本發明方法P3之其他適合鹼可為胺化物或有機金屬衍生物。優先選擇鹼金屬胺化物,諸如胺化鈉或胺化鉀;有機胺化物,諸如二異丙胺鋰(LDA)、六甲基二矽氮烷鋰(LiHMDS)、六甲基二矽氮烷鉀(KHMDS)或六甲基二矽氮烷鈉(NaHMDS);有機鋰衍生物,諸如甲基鋰、苯基鋰、丁基鋰、第二丁基鋰、異丁基鋰或第三丁基鋰。 Other suitable bases for carrying out the process P3 according to the invention may be aminides or organometallic derivatives. Preferred are alkali metal amides such as sodium or potassium amide; organic amides such as lithium diisopropylamide (LDA), lithium hexamethyldiazepine (LiHMDS), potassium hexamethyldioxazone ( KHMDS) or sodium hexamethyldisilazane (NaHMDS); an organolithium derivative such as methyl lithium, phenyl lithium, butyl lithium, second butyl lithium, isobutyl lithium or tert-butyl lithium.

用於進行本發明方法P3之適合溶劑可為習用惰性有機溶劑。優先使用視情況鹵素原子化之脂族、脂環族或芳族烴,諸如石油醚、己烷、庚烷、環己烷、甲基環己烷、苯、甲苯、二甲苯或十氫萘;氯苯、二氯苯、二氯甲烷、氯仿、四氯化碳、二氯乙烷或三氯乙烷;醚,諸如乙醚、二異丙基醚、甲基第三丁基醚、甲基第三戊基醚、二噁烷、四氫呋喃、1,2-二甲氧基乙烷、1,2-二乙氧基乙烷或苯甲醚;腈,諸如乙腈、丙腈、正丁腈或異丁腈或苄腈;醯胺,諸如N,N-二甲基甲醯胺、N,N-二甲基乙醯胺、N-甲基甲醯苯胺、N-甲基吡咯啶酮或六甲基磷醯三胺;酯,諸如乙酸甲酯或乙酸乙酯;亞碸,諸如二甲亞碸;或碸,諸如環丁碸。 Suitable solvents for carrying out the process P3 according to the invention may be customary inert organic solvents. Preference is given to using aliphatic, alicyclic or aromatic hydrocarbons which are halogenated as appropriate, such as petroleum ether, hexane, heptane, cyclohexane, methylcyclohexane, benzene, toluene, xylene or decalin; Chlorobenzene, dichlorobenzene, dichloromethane, chloroform, carbon tetrachloride, dichloroethane or trichloroethane; ethers such as diethyl ether, diisopropyl ether, methyl tert-butyl ether, methyl Triamyl ether, dioxane, tetrahydrofuran, 1,2-dimethoxyethane, 1,2-diethoxyethane or anisole; nitrile such as acetonitrile, propionitrile, n-butyronitrile or different Butyronitrile or benzonitrile; decylamine, such as N,N-dimethylformamide, N,N-dimethylacetamide, N-methylformamide, N-methylpyrrolidone or hexamethyl An amino ester; an ester such as methyl acetate or ethyl acetate; an anthracene such as dimethyl hydrazine; or an anthracene such as cyclobutyl hydrazine.

當進行本發明方法P3時,每莫耳式(VI)化合物可採用1莫耳或過量式(VII)化合物及1至5莫耳鹼。 When carrying out the process P3 according to the invention, the compound of the formula (VI) can be used in an amount of 1 mole or excess of the compound of the formula (VII) and 1 to 5 moles of base per mole of the compound of the formula (VI).

亦有可能按其他比率採用反應組分。藉由已知方法進行處理。 It is also possible to use the reaction components in other ratios. Processing is performed by a known method.

根據本發明之另一態樣,提供一種根據以下反應流程製備式(I)化合物之第四方法P4: According to another aspect of the present invention, there is provided a fourth method P4 for preparing a compound of formula (I) according to the following reaction scheme:

方法P4 Method P4

其中A、Z1、Z2、Z3、n、X、L及B如本文所定義且當p為1時,W2表示硼衍生物,諸如酸、酸酯或三氟硼酸鉀衍生物;或當p為3時,W2表示Bi。 Wherein A, Z 1 , Z 2 , Z 3 , n, X, L and B are as defined herein and when p is 1, W 2 represents a boron derivative, such as acid, An acid ester or a potassium trifluoroborate derivative; or when p is 3, W 2 represents Bi.

式(IX)化合物可藉由已知方法製備。 The compound of the formula (IX) can be produced by a known method.

本發明方法P4係在乙酸銅(II)存在下進行。 The process P4 of the invention is carried out in the presence of copper (II) acetate.

用於進行本發明方法P4之適合鹼可為習用於該等反應之無機及有機鹼。優先使用鹼土金屬或鹼金屬碳酸鹽,諸如碳酸鈉、碳酸鉀、碳酸氫鉀、碳酸氫鈉或碳酸銫;鹼金屬磷酸鹽,諸如磷酸三鉀;三級胺,諸如三甲胺、三乙胺、三丁胺、N,N-二甲基苯胺、N,N-二環己基甲胺、N-甲基哌啶、N,N-二甲基胺基吡啶;以及芳族鹼,諸如吡啶、甲基吡啶、二甲基吡啶或三甲基吡啶。 Suitable bases for carrying out the process P4 according to the invention may be inorganic and organic bases customary for such reactions. Preference is given to using alkaline earth or alkali metal carbonates, such as sodium carbonate, potassium carbonate, potassium hydrogencarbonate, sodium hydrogencarbonate or cesium carbonate; alkali metal phosphates such as tripotassium phosphate; tertiary amines such as trimethylamine, triethylamine, Tributylamine, N,N-dimethylaniline, N,N-dicyclohexylmethylamine, N-methylpiperidine, N,N-dimethylaminopyridine; and aromatic bases such as pyridine, A Pyridine, lutidine or trimethylpyridine.

用於進行本發明方法P4之其他適合鹼可為習用於該等反應之有機鹼。優先使用有機胺化物,諸如二異丙胺鋰(LDA)、六甲基二矽氮烷鋰(LiHMDS)、六甲基二矽氮烷鉀(KHMDS)或六甲基二矽氮烷鈉(NaHMDS)。 Other suitable bases for carrying out the process P4 according to the invention may be the organic bases customary for such reactions. Preferential use of organic amides such as lithium diisopropylamide (LDA), lithium hexamethyldiazepine (LiHMDS), potassium hexamethyldioxane (KHMDS) or sodium hexamethyldisilazane (NaHMDS) .

用於進行本發明方法P4之適合配位體可為習用於該等反應之有機鹼。優先使用芳族鹼,諸如吡啶、甲基吡啶、二甲基吡啶、三甲基吡啶、2,2'-聯吡啶或1,10-啡啉;以及三級胺,諸如三甲胺、三乙胺、 三丁胺、N,N-二甲基苯胺、N,N-二環己基甲胺、N-甲基哌啶、N,N-二甲基胺基吡啶。 Suitable ligands for carrying out the process P4 according to the invention may be the organic bases customary for such reactions. Preference is given to using aromatic bases such as pyridine, picoline, lutidine, trimethylpyridine, 2,2'-bipyridine or 1,10-morpholine; and tertiary amines such as trimethylamine, triethylamine , Tributylamine, N,N-dimethylaniline, N,N-dicyclohexylmethylamine, N-methylpiperidine, N,N-dimethylaminopyridine.

用於進行本發明方法P4之適合溶劑可為習用惰性有機溶劑。優先使用視情況鹵素原子化之脂族、脂環族或芳族烴,諸如石油醚、己烷、庚烷、環己烷、甲基環己烷、苯、甲苯、二甲苯或十氫萘;氯苯、二氯苯、二氯甲烷、氯仿、四氯化碳、二氯乙烷或三氯乙烷;醚,諸如乙醚、二異丙基醚、甲基第三丁基醚、甲基第三戊基醚、二噁烷、四氫呋喃、1,2-二甲氧基乙烷、1,2-二乙氧基乙烷或苯甲醚;腈,諸如乙腈、丙腈、正丁腈或異丁腈或苄腈;醯胺,諸如N,N-二甲基甲醯胺、N,N-二甲基乙醯胺、N-甲基吡咯啶酮或六甲基磷醯三胺;酯,諸如乙酸甲酯或乙酸乙酯;亞碸,諸如二甲亞碸;或碸,諸如環丁碸。 Suitable solvents for carrying out the process P4 according to the invention may be customary inert organic solvents. Preference is given to using aliphatic, alicyclic or aromatic hydrocarbons which are halogenated as appropriate, such as petroleum ether, hexane, heptane, cyclohexane, methylcyclohexane, benzene, toluene, xylene or decalin; Chlorobenzene, dichlorobenzene, dichloromethane, chloroform, carbon tetrachloride, dichloroethane or trichloroethane; ethers such as diethyl ether, diisopropyl ether, methyl tert-butyl ether, methyl Triamyl ether, dioxane, tetrahydrofuran, 1,2-dimethoxyethane, 1,2-diethoxyethane or anisole; nitrile such as acetonitrile, propionitrile, n-butyronitrile or different Butyronitrile or benzonitrile; decylamine, such as N,N-dimethylformamide, N,N-dimethylacetamide, N-methylpyrrolidone or hexamethylphosphonium triamine; ester, Such as methyl acetate or ethyl acetate; anthraquinones such as dimethyl hydrazine; or hydrazine, such as cyclobutyl hydrazine.

當進行本發明方法P4時,每莫耳式(VIII)化合物可採用1莫耳或過量式(IX)化合物。 When carrying out the process P4 according to the invention, one mole or a mixture of the compound of the formula (IX) can be used per mole of the compound of the formula (VIII).

當進行本發明方法P4時,每莫耳式(VIII)化合物可採用1至3莫耳或過量鹼。適當時,亦可按各種比率採用鹼之組合。 When carrying out the process P4 according to the invention, from 1 to 3 moles or excess of base per mole of the compound of formula (VIII). A combination of bases may also be employed in various ratios as appropriate.

當進行本發明方法P4時,每莫耳式(VIII)化合物可不採用配位體或採用0.1至1莫耳配位體。 When carrying out the process P4 according to the invention, the compound of the formula (VIII) can be used without a ligand or with a 0.1 to 1 molar ligand.

當進行本發明方法P4時,每莫耳式(VIII)化合物可採用0.1至2.5莫耳或過量乙酸銅(II)。 When carrying out the process P4 according to the invention, from 0.1 to 2.5 moles or excess of copper (II) acetate per mole of the compound of formula (VIII).

亦有可能按其他比率採用反應組分。藉由已知方法進行處理。 It is also possible to use the reaction components in other ratios. Processing is performed by a known method.

式(VIII)之二級醯胺可例如根據以下反應流程製備: The secondary guanamine of formula (VIII) can be prepared, for example, according to the following reaction scheme:

其中A、T、Z1、Z2、Z3、n、X及B如本文所定義,且- 當U2表示諸如氯、溴或碘之鹵素原子或三氟甲磺酸酯基,且W1表示硼衍生物,諸如酸、酸酯或三氟硼酸鉀衍生物時,L表示直接鍵或亞甲基(步驟a);或- 當U3表示鹵素原子時,L表示氧原子、硫原子或經單取代或未經取代之氮原子(步驟b)。 Wherein A, T, Z 1 , Z 2 , Z 3 , n, X and B are as defined herein, and - when U 2 represents a halogen atom such as chlorine, bromine or iodine or a triflate group, and W 1 represents a boron derivative such as acid, In the case of an acid ester or a potassium trifluoroborate derivative, L represents a direct bond or a methylene group (step a); or - when U 3 represents a halogen atom, L represents an oxygen atom, a sulfur atom or a mono- or unsubstituted group. A nitrogen atom (step b).

式(IV)之三級醯胺可例如根據以下反應流程製備: The tertiary guanamine of formula (IV) can be prepared, for example, according to the following reaction scheme:

其中A、T、Z1、Z2、Z3、n及X如本文所定義,U2表示諸如氯、溴或碘之鹵素原子或三氟甲磺酸酯基,且- 當p為1時,W2表示硼衍生物,諸如酸、酸酯或三氟硼酸鉀衍生物;或- 當p為3時,W2表示Bi。 Wherein A, T, Z 1 , Z 2 , Z 3 , n and X are as defined herein, U 2 represents a halogen atom such as chlorine, bromine or iodine or a triflate group, and - when p is 1 W 2 represents a boron derivative such as acid, An acid ester or a potassium trifluoroborate derivative; or - when p is 3, W 2 represents Bi.

式(X)或式(XI)之衍生物為已知的或可藉由已知方法(WO-2012/052490)製備。 Derivatives of formula (X) or formula (XI) are known or can be prepared by known methods (WO-2012/052490).

步驟a可根據方法P2進行,步驟b可根據方法P3進行,且步驟c可根據方法P4進行。 Step a can be performed according to method P2, step b can be performed according to method P3, and step c can be performed according to method P4.

根據本發明之另一態樣,提供一種以其中T表示O之式(I)化合物為起始物且根據以下反應流程所說明來製備其中T表示S之式(I)化合物的第四方法P5: According to another aspect of the present invention, there is provided a fourth method P5 wherein the compound of the formula (I) wherein T represents O is used as a starting material and the compound of the formula (I) wherein T represents S is prepared according to the following reaction scheme. :

方法P5 Method P5

其中A、Z1、Z2、Z3、n、X、L及B如本文所定義。 Wherein A, Z 1 , Z 2 , Z 3 , n, X, L and B are as defined herein.

本發明方法P5係在硫化劑存在下進行。 The process P5 according to the invention is carried out in the presence of a vulcanizing agent.

其中T表示O之式(I)之起始醯胺衍生物可根據方法P1、P2、P3及P4製備。 The starting guanamine derivatives of formula (I) wherein T represents O can be prepared according to methods P1, P2, P3 and P4.

用於進行本發明方法P5之適合硫化劑可為硫(S)、氫硫酸(H2S)、硫化鈉(Na2S)、硫氫化鈉(NaHS)、三硫化硼(B2S3)、硫化雙(二乙基鋁)((AlEt2)2S)、硫化銨((NH4)2S)、五硫化磷(P2S5)、勞森試劑(Lawesson's reagent,2,4-雙(4-甲氧基苯基)-1,2,3,4-二硫雜二磷雜環丁烷2,4-二硫化物)或聚合物支撐之硫化試劑,諸如Journal of the Chemical Society,Perkin 1(2001),358中所述,視情況在催化量或化學計量或過量之鹼(諸如無機及有機鹼)存在下。優先使用鹼金屬碳酸鹽,諸如碳酸鈉、碳酸鉀、碳酸氫鉀、碳酸氫鈉;雜環芳族鹼,諸如吡啶、甲基吡啶、二甲基吡啶、三甲基吡啶;以及三級胺,諸如三甲胺、三乙胺、三丁胺、N,N-二甲基苯胺、N,N-二甲基吡啶-4-胺或N-甲基-哌啶。 Suitable vulcanizing agents for carrying out the process P5 according to the invention may be sulfur (S), hydrogen sulphate (H 2 S), sodium sulphide (Na 2 S), sodium hydrosulfide (NaHS), boron trisulfide (B 2 S 3 ) , bis(diethylaluminum) sulfide ((AlEt 2 ) 2 S), ammonium sulfide ((NH 4 ) 2 S), phosphorus pentasulfide (P 2 S 5 ), Lawesson's reagent, 2,4- Bis(4-methoxyphenyl)-1,2,3,4-dithiadiphosphetane 2,4-disulfide) or polymer supported vulcanizing agent, such as Journal of the Chemical Society , as described in Perkin 1 (2001), 358, in the presence of a catalytic amount or a stoichiometric or excess base such as inorganic and organic bases. Preference is given to using alkali metal carbonates such as sodium carbonate, potassium carbonate, potassium hydrogencarbonate, sodium hydrogencarbonate; heterocyclic aromatic bases such as pyridine, picoline, lutidine, trimethylpyridine; and tertiary amines, Such as trimethylamine, triethylamine, tributylamine, N,N-dimethylaniline, N,N-dimethylpyridin-4-amine or N-methyl-piperidine.

用於進行本發明方法P5之適合溶劑可為習用惰性有機溶劑。優 先使用視情況鹵化之脂族、脂環族或芳族烴,諸如石油醚、己烷、庚烷、環己烷、甲基環己烷、苯、甲苯、二甲苯或十氫萘;氯苯、二氯苯、二氯甲烷、氯仿、四氯化碳、二氯乙烷或三氯乙烷;醚,諸如乙醚、二異丙基醚、甲基第三丁基醚、甲基第三戊基醚、二噁烷、四氫呋喃、1,2-二甲氧基乙烷或1,2-二乙氧基乙烷;腈,諸如乙腈、丙腈、正丁腈或異丁腈或苄腈;含硫溶劑,諸如環丁碸或二硫化碳。 Suitable solvents for carrying out the process P5 according to the invention may be customary inert organic solvents. excellent First using aliphatic, alicyclic or aromatic hydrocarbons which are halogenated as appropriate, such as petroleum ether, hexane, heptane, cyclohexane, methylcyclohexane, benzene, toluene, xylene or decahydronaphthalene; chlorobenzene , dichlorobenzene, dichloromethane, chloroform, carbon tetrachloride, dichloroethane or trichloroethane; ethers such as diethyl ether, diisopropyl ether, methyl tert-butyl ether, methyl third An ether, dioxane, tetrahydrofuran, 1,2-dimethoxyethane or 1,2-diethoxyethane; a nitrile such as acetonitrile, propionitrile, n-butyronitrile or isobutyronitrile or benzonitrile; A sulfur-containing solvent such as cyclobutyl hydrazine or carbon disulfide.

當進行本發明方法P5時,每莫耳醯胺反應物(I)可採用1莫耳或過量硫化劑之硫等效物及1至3莫耳鹼。 When carrying out the process P5 according to the invention, a sulfur equivalent of 1 mole or excess vulcanizing agent and 1 to 3 moles of base per mole of the melamine reaction (I) can be used.

亦有可能按其他比率採用反應組分。藉由已知方法進行處理。 It is also possible to use the reaction components in other ratios. Processing is performed by a known method.

本發明方法P1、P2、P3、P4及P5一般係在大氣壓下進行。亦有可能在加壓或減壓下操作。 The processes P1, P2, P3, P4 and P5 according to the invention are generally carried out under atmospheric pressure. It is also possible to operate under pressure or reduced pressure.

當進行本發明方法P1、P2、P3、P4及P5時,反應溫度可在相對寬之範圍內變化。一般而言,此等方法係在-75℃至200℃、較佳10℃至150℃之溫度下進行。控制本發明方法之溫度的方式為使用微波技術。 When carrying out the processes P1, P2, P3, P4 and P5 according to the invention, the reaction temperature can be varied within a relatively wide range. Generally, such processes are carried out at temperatures ranging from -75 ° C to 200 ° C, preferably from 10 ° C to 150 ° C. The manner in which the temperature of the process of the invention is controlled is the use of microwave technology.

一般而言,反應混合物係在減壓下濃縮。剩餘之殘餘物可藉由諸如層析或結晶之已知方法自仍可能存在之任何雜質中釋放。 In general, the reaction mixture is concentrated under reduced pressure. The remaining residue can be released from any impurities that may still be present by known methods such as chromatography or crystallization.

藉由習用方法進行處理。一般而言,用水處理反應混合物,且分離出有機相且在乾燥後於減壓下濃縮。適當時,剩餘殘餘物可藉由諸如層析、結晶或蒸餾之習用方法自仍可能存在之任何雜質中釋放。 It is processed by a conventional method. In general, the reaction mixture is treated with water, and the organic phase is separated and concentrated under reduced pressure. Where appropriate, the remaining residue can be released from any impurities that may still be present by conventional methods such as chromatography, crystallization or distillation.

本發明化合物可根據上文所述之通用製備方法製備。儘管如此,應瞭解,基於一般知識及可得到之公開案,習此相關技藝之人士將能夠根據需要合成之各化合物之特殊性來修改此方法。 The compounds of the invention can be prepared according to the general preparation methods described above. Nonetheless, it should be understood that based on the general knowledge and available disclosures, those skilled in the art will be able to modify this method depending on the particularity of each compound to be synthesized.

在另一態樣中,本發明係關於適用作本發明製備方法之中間化合物或物質之式(II)化合物。 In another aspect, the invention relates to a compound of formula (II) which is useful as an intermediate compound or substance in the process of the invention.

因此,本發明提供式(IIa)化合物以及其可接受之鹽: Accordingly, the present invention provides a compound of formula (IIa) and an acceptable salt thereof:

其中Z2、Z3、n及X如本文所定義,且L為直接鍵且B1為經取代或未經取代之環氧乙烷基環、經取代或未經取代之噻吩基環、經取代或未經取代之苯并噻吩基環、經取代或未經取代之呋喃環或經取代或未經取代之苯并呋喃環,其限制條件為(IIa)不表示: Wherein Z 2 , Z 3 , n and X are as defined herein, and L is a direct bond and B 1 is a substituted or unsubstituted oxiranyl ring, a substituted or unsubstituted thiophene ring, A substituted or unsubstituted benzothienyl ring, a substituted or unsubstituted furan ring or a substituted or unsubstituted benzofuran ring, with the limitation that (IIa) does not mean:

- N-[2-(2-呋喃基)苄基]環丙胺 - N-[2-(2-furyl)benzyl]cyclopropylamine

- N-[2-(2-呋喃基)-4,5-二甲氧基苄基]環丙胺 - N-[2-(2-furyl)-4,5-dimethoxybenzyl]cyclopropylamine

- N-[2-(3-溴-2-呋喃基)-4,5-二甲氧基苄基]環丙胺 - N-[2-(3-Bromo-2-furyl)-4,5-dimethoxybenzyl]cyclopropylamine

- N-[2-(3-溴-2-呋喃基)苄基]環丙胺 - N-[2-(3-Bromo-2-furyl)benzyl]cyclopropylamine

- N-[2-(3-呋喃基)苄基]環丙胺 - N-[2-(3-furyl)benzyl]cyclopropylamine

- N-[2-(2-噻吩基)苄基]環丙胺 - N-[2-(2-Thienyl)benzyl]cyclopropylamine

- N-[4,5-二甲氧基-2-(2-噻吩基)苄基]環丙胺。 - N-[4,5-Dimethoxy-2-(2-thienyl)benzyl]cyclopropylamine.

因此,本發明提供式(IIb)化合物以及其可接受之鹽: Accordingly, the present invention provides a compound of formula (IIb) and an acceptable salt thereof:

其中Z2、Z3、n及X如本文所定義,且L為直接鍵且B1為經取代或未經取代之環氧乙烷基環、經取代或未經取代之噻吩基環、經取代或未經取代之苯并噻吩基環、經取代或未經取代之呋喃環或經取代或未經取代之苯并呋喃環,其限制條件為(IIb)不表示: Wherein Z 2 , Z 3 , n and X are as defined herein, and L is a direct bond and B 1 is a substituted or unsubstituted oxiranyl ring, a substituted or unsubstituted thiophene ring, A substituted or unsubstituted benzothienyl ring, a substituted or unsubstituted furan ring or a substituted or unsubstituted benzofuran ring, with the limitation that (IIb) does not mean:

- N-[3-(2-呋喃基)苄基]環丙胺 - N-[3-(2-furyl)benzyl]cyclopropylamine

- N-[5-(2-呋喃基)-2-甲氧基苄基]環丙胺 - N-[5-(2-furyl)-2-methoxybenzyl]cyclopropylamine

- N-[4-氟-3-(2-呋喃基)苄基]環丙胺 - N-[4-Fluoro-3-(2-furyl)benzyl]cyclopropylamine

- N-[2-氟-5-(2-呋喃基)苄基]環丙胺 - N-[2-Fluoro-5-(2-furyl)benzyl]cyclopropylamine

- N-[2-氟-5-(3-呋喃基)苄基]環丙胺 - N-[2-Fluoro-5-(3-furyl)benzyl]cyclopropylamine

- N-[3-(3-溴-2-呋喃基)-4-氟苄基]環丙胺 - N-[3-(3-Bromo-2-furyl)-4-fluorobenzyl]cyclopropylamine

- N-[3-(3-溴-2-呋喃基)苄基]環丙胺 - N-[3-(3-Bromo-2-furyl)benzyl]cyclopropylamine

- N-[5-(3-溴-2-呋喃基)-2-氟苄基]環丙胺 - N-[5-(3-Bromo-2-furyl)-2-fluorobenzyl]cyclopropylamine

- N-[5-(3-溴-2-呋喃基)-2-甲氧基苄基]環丙胺 - N-[5-(3-Bromo-2-furyl)-2-methoxybenzyl]cyclopropylamine

- N-[3-(3-呋喃基)苄基]環丙胺 - N-[3-(3-furyl)benzyl]cyclopropylamine

- N-[3-(2-噻吩基)苄基]環丙胺 - N-[3-(2-Thienyl)benzyl]cyclopropylamine

- N-[4-氟-3-(2-噻吩基)苄基]環丙胺 - N-[4-Fluoro-3-(2-thienyl)benzyl]cyclopropylamine

- N-[2-氟-5-(2-噻吩基)苄基]環丙胺 - N-[2-Fluoro-5-(2-thienyl)benzyl]cyclopropylamine

- N-[2-甲氧基-5-(2-噻吩基)苄基]環丙胺 - N-[2-methoxy-5-(2-thienyl)benzyl]cyclopropylamine

- 5-{5-[(環丙基胺基)甲基]-2-氟苯基}噻吩-2-甲腈。 5-{5-[(Cyclopropylamino)methyl]-2-fluorophenyl}thiophene-2-carbonitrile.

式(IIa)或式(IIb)之N-環丙基衍生物可根據已知方法製備。 The N-cyclopropyl derivative of the formula (IIa) or the formula (IIb) can be produced according to a known method.

較佳之本發明式(IIa)化合物為: Preferably, the compound of formula (IIa) of the present invention is:

- N-[5-氯-2-(2-呋喃基)苄基]環丙胺 - N-[5-Chloro-2-(2-furyl)benzyl]cyclopropylamine

- N-[5-氯-2-(2-噻吩基)苄基]環丙胺 - N-[5-Chloro-2-(2-thienyl)benzyl]cyclopropylamine

- N-[2-(3-噻吩基)苄基]環丙胺 - N-[2-(3-Thienyl)benzyl]cyclopropylamine

- N-{1-[2-(3-噻吩基)苯基]乙基}環丙胺 - N-{1-[2-(3-Thienyl)phenyl]ethyl}cyclopropylamine

- N-[5-氯-2-(3-噻吩基)苄基]環丙胺 - N-[5-Chloro-2-(3-thienyl)benzyl]cyclopropylamine

- N-[2-(5-氯-2-噻吩基)苄基]環丙胺 - N-[2-(5-Chloro-2-thienyl)benzyl]cyclopropylamine

- N-[5-氯-2-(5-氯-2-噻吩基)苄基]環丙胺。 - N-[5-Chloro-2-(5-chloro-2-thienyl)benzyl]cyclopropylamine.

較佳之本發明式(IIb)化合物為: Preferably, the compound of formula (IIb) of the present invention is:

- N-[2-氯-5-(2-呋喃基)苄基]環丙胺 - N-[2-chloro-5-(2-furyl)benzyl]cyclopropylamine

- N-[2-氯-5-(2-噻吩基)苄基]環丙胺 - N-[2-chloro-5-(2-thienyl)benzyl]cyclopropylamine

- N-[2-氯-5-(3-噻吩基)苄基]環丙胺 - N-[2-chloro-5-(3-thienyl)benzyl]cyclopropylamine

- N-[2-氯-5-(5-氯-2-噻吩基)苄基]環丙胺。 - N-[2-chloro-5-(5-chloro-2-thienyl)benzyl]cyclopropylamine.

在另一態樣中,本發明係關於適用作本發明製備方法之中間化合物或物質之式(X)化合物。 In another aspect, the invention relates to a compound of formula (X) which is useful as an intermediate compound or substance in the process of the invention.

因此,本發明提供式(Xa)化合物: Accordingly, the present invention provides a compound of formula (Xa):

其中Z2及Z3如本文所定義,A表示A13,Xa1表示鹵素原子;經取代或未經取代之C1-C8烷基;包含多至9個可相同或不同之鹵素原子之C1-C8鹵烷基;經取代或未經取代之C3-C7環烷基;三(C1-C8烷基)矽烷基;經取代或未經取代之C1-C8烷氧基;或經取代或未經取代之C1-C8烷基硫基,Xa2表示氫或Xa1,且U2表示諸如氯、溴或碘之鹵素原子或三氟甲磺酸酯基,其限制條件為(Xa)不表示: Wherein Z 2 and Z 3 are as defined herein, A represents A 13 , X a1 represents a halogen atom; substituted or unsubstituted C 1 -C 8 alkyl; contains up to 9 halogen atoms which may be the same or different. C 1 -C 8 haloalkyl; substituted or unsubstituted C 3 -C 7 cycloalkyl; tri(C 1 -C 8 alkyl)decyl; substituted or unsubstituted C 1 -C 8 Alkoxy; or substituted or unsubstituted C 1 -C 8 alkylthio, X a2 represents hydrogen or X a1 , and U 2 represents a halogen atom such as chlorine, bromine or iodine or a triflate Base, whose constraint is (Xa) does not mean:

- N-(2,5-二氯苄基)-3-(二氟甲基)-5-氟-1-甲基-1H-吡唑-4-甲醯胺 - N-(2,5-Dichlorobenzyl)-3-(difluoromethyl)-5-fluoro-1-methyl-1H-pyrazole-4-carboxamide

- N-[1-(2,5-二氯苯基)乙基]-3-(二氟甲基)-5-氟-1-甲基-1H-吡唑-4-甲醯胺 - N-[1-(2,5-Dichlorophenyl)ethyl]-3-(difluoromethyl)-5-fluoro-1-methyl-1H-pyrazole-4-carboxamide

- N-[2-(2,5-二氯苯基)丙-2-基]-3-(二氟甲基)-5-氟-1-甲基-1H-吡唑-4-甲醯胺 - N-[2-(2,5-Dichlorophenyl)propan-2-yl]-3-(difluoromethyl)-5-fluoro-1-methyl-1H-pyrazole-4-carboxamidine amine

- N-[1-(2,5-二氯苯基)環丙基]-3-(二氟甲基)-5-氟-1-甲基-1H-吡唑-4-甲醯胺 - N-[1-(2,5-Dichlorophenyl)cyclopropyl]-3-(difluoromethyl)-5-fluoro-1-methyl-1H-pyrazole-4-carboxamide

- 5-氯-N-[1-(2,5-二氯苯基)乙基]-3-(二氟甲基)-1-甲基-1H-吡唑-4-甲醯胺 - 5-Chloro-N-[1-(2,5-dichlorophenyl)ethyl]-3-(difluoromethyl)-1-methyl-1H-pyrazole-4-carboxamide

- 5-氯-N-[2-(2,5-二氯苯基)丙-2-基]-3-(二氟甲基)-1-甲基-1H-吡 唑-4-甲醯胺 - 5-Chloro-N-[2-(2,5-dichlorophenyl)propan-2-yl]-3-(difluoromethyl)-1-methyl-1H-pyridyl Oxazol-4-carboxamide

- 5-氯-N-[1-(2,5-二氯苯基)環丙基]-3-(二氟甲基)-1-甲基-1H-吡唑-4-甲醯胺 - 5-Chloro-N-[1-(2,5-dichlorophenyl)cyclopropyl]-3-(difluoromethyl)-1-methyl-1H-pyrazole-4-carboxamide

- 5-氯-N-(2,5-二氯苄基)-3-(二氟甲基)-1-甲基-1H-吡唑-4-甲醯胺 - 5-Chloro-N-(2,5-dichlorobenzyl)-3-(difluoromethyl)-1-methyl-1H-pyrazole-4-carboxamide

- N-(5-溴-2-氟苄基)-1,3,5-三甲基-1H-吡唑-4-甲醯胺 - N-(5-Bromo-2-fluorobenzyl)-1,3,5-trimethyl-1H-pyrazole-4-carboxamide

- N-(5-溴-2-氟苄基)-3,5-二甲基-1H-吡唑-4-甲醯胺 - N-(5-bromo-2-fluorobenzyl)-3,5-dimethyl-1H-pyrazole-4-carboxamide

- 1-甲基-N-[1-(2,4,5-三氯苯基)乙基]-3-(三氟甲基)-1H-吡唑-4-甲醯胺 - 1-Methyl-N-[1-(2,4,5-trichlorophenyl)ethyl]-3-(trifluoromethyl)-1H-pyrazole-4-carboxamide

- 3-(二氟甲基)-1-甲基-N-[1-(2,4,5-三氯苯基)乙基]-1H-吡唑-4-甲醯胺 - 3-(Difluoromethyl)-1-methyl-N-[1-(2,4,5-trichlorophenyl)ethyl]-1H-pyrazole-4-carboxamide

- N-(5-氯-2-氟苄基)-1-甲基-5-丙氧基-3-(三氟甲基)-1H-吡唑-4-甲醯胺 - N-(5-Chloro-2-fluorobenzyl)-1-methyl-5-propoxy-3-(trifluoromethyl)-1H-pyrazole-4-carboxamide

- N-(2,5-二氯苄基)-1-甲基-5-丙氧基-3-(三氟甲基)-1H-吡唑-4-甲醯胺。 - N-(2,5-Dichlorobenzyl)-1-methyl-5-propoxy-3-(trifluoromethyl)-1H-pyrazole-4-carboxamide.

較佳之本發明式(Xa)化合物為: Preferably, the compound of formula (Xa) of the present invention is:

- N-(5-氯-2-乙基苄基)-3-(二氟甲基)-5-氟-1-甲基-1H-吡唑-4-甲醯胺 - N-(5-Chloro-2-ethylbenzyl)-3-(difluoromethyl)-5-fluoro-1-methyl-1H-pyrazole-4-carboxamide

- N-(5-氯-2-異丙基苄基)-3-(二氟甲基)-5-氟-1-甲基-1H-吡唑-4-甲醯胺 - N-(5-Chloro-2-isopropylbenzyl)-3-(difluoromethyl)-5-fluoro-1-methyl-1H-pyrazole-4-carboxamide

- N-[5-氯-2-(三氟甲基)苄基]-3-(二氟甲基)-5-氟-1-甲基-1H-吡唑-4-甲醯胺 - N-[5-Chloro-2-(trifluoromethyl)benzyl]-3-(difluoromethyl)-5-fluoro-1-methyl-1H-pyrazole-4-carboxamide

- N-[3-氯-2-氟-6-(三氟甲基)苄基]-3-(二氟甲基)-5-氟-1-甲基-1H-吡唑-4-甲醯胺。 - N-[3-chloro-2-fluoro-6-(trifluoromethyl)benzyl]-3-(difluoromethyl)-5-fluoro-1-methyl-1H-pyrazole-4-methyl Guanamine.

最佳之本發明式(Xa)化合物為: The most preferred compound of the formula (Xa) of the present invention is:

- N-(5-氯-2-異丙基苄基)-3-(二氟甲基)-5-氟-1-甲基-1H-吡唑-4-甲醯胺。 - N-(5-Chloro-2-isopropylbenzyl)-3-(difluoromethyl)-5-fluoro-1-methyl-1H-pyrazole-4-carboxamide.

在另一態樣中,本發明亦關於一種殺真菌劑組合物,其包含有效且非植物毒性量之式(I)活性化合物。 In another aspect, the invention is also directed to a fungicide composition comprising an effective and non-phytotoxic amount of an active compound of formula (I).

表述「有效且非植物毒性量」意謂本發明組合物之足以控制或破壞在作物上存在或容易出現之真菌且不引起該等作物之任何明顯植物毒性症狀的量。視待控制之真菌、作物類型、氣候條件及本發明之殺真菌劑組合物中所包括之化合物而定,此種量可在寬範圍內變化。 此量可藉由熟習此項技術者能力範圍內之系統田間試驗來確定。 The expression "effective and non-phytotoxic amount" means an amount of the composition of the invention sufficient to control or destroy the fungus present or readily occurring on the crop without causing any significant phytotoxic symptoms of the crop. Depending on the fungus to be controlled, the type of crop, the climatic conditions and the compounds included in the fungicide composition of the invention, such amounts may vary within wide limits. This amount can be determined by systematic field trials within the skill of the art.

因此,根據本發明,提供一種殺真菌劑組合物,其包含作為活性成分之有效量之如本文所定義之式(I)化合物及農業上可接受之載體、載劑或填充劑。 Thus, according to the present invention there is provided a fungicide composition comprising as an active ingredient an effective amount of a compound of formula (I) as defined herein and an agriculturally acceptable carrier, carrier or filler.

根據本發明,術語「載體」表示與式(I)之活性化合物組合或締合以使其更易於施用、尤其施用於植物部分之天然或合成有機或無機化合物。因此,此載體一般為惰性的且應為農業上可接受的。載體可為固體或液體。適合載體之實例包括黏土、天然或合成矽酸鹽、二氧化矽、樹脂、蠟、固體肥料、水、醇(尤其丁醇)、有機溶劑、礦物油及植物油及其衍生物。亦可使用該等載體之混合物。 According to the invention, the term "carrier" denotes a natural or synthetic organic or inorganic compound which is combined or associated with an active compound of formula (I) to make it easier to apply, in particular to a plant part. Therefore, the carrier is generally inert and should be agriculturally acceptable. The carrier can be a solid or a liquid. Examples of suitable carriers include clay, natural or synthetic silicates, cerium oxide, resins, waxes, solid fertilizers, water, alcohols (especially butanol), organic solvents, mineral oils, and vegetable oils and derivatives thereof. Mixtures of such carriers can also be used.

本發明組合物亦可包含其他組分。詳言之,組合物可另外包含界面活性劑。界面活性劑可為離子型或非離子型乳化劑、分散劑或濕潤劑,或該等界面活性劑之混合物。可提及例如聚丙烯酸鹽、木質磺酸鹽、酚磺酸或萘磺酸鹽、環氧乙烷與脂肪醇或與脂肪酸或與脂肪胺之聚縮合物、經取代之酚(尤其烷基酚或芳基酚)、磺化丁二酸酯之鹽、牛磺酸衍生物(尤其牛磺酸烷酯)、聚氧乙基化醇或酚之磷酸酯、多元醇之脂肪酸酯及含有硫酸鹽、磺酸鹽及磷酸鹽功能之上述化合物之衍生物。當活性化合物及/或惰性載體不溶於水時且當施用之媒劑(vector agent)為水時,一般必需存在至少一種界面活性劑。較佳地,界面活性劑含量可佔組合物之5重量%至40重量%。 The compositions of the present invention may also contain other components. In particular, the composition may additionally comprise a surfactant. The surfactant can be an ionic or nonionic emulsifier, dispersant or wetting agent, or a mixture of such surfactants. Mention may be made, for example, of polyacrylates, lignosulfonates, phenolsulfonic acids or naphthalenesulfonates, polyethylene oxides with fatty alcohols or polycondensates with fatty acids or with fatty amines, substituted phenols (especially alkylphenols) Or aryl phenol), a salt of a sulfonated succinate, a taurine derivative (especially an alkyl taurate), a polyoxyethylated alcohol or a phosphate of a phenol, a fatty acid ester of a polyhydric alcohol, and a sulfuric acid containing Derivatives of the above compounds having a salt, sulfonate and phosphate function. When the active compound and/or the inert carrier are insoluble in water and when the vector agent applied is water, it is generally necessary to have at least one surfactant. Preferably, the surfactant level can range from 5% to 40% by weight of the composition.

視情況,亦可包括其他組分,例如保護性膠體、黏著劑、增稠劑、觸變劑、滲透劑、穩定劑、螯合劑。更一般而言,活性化合物可與任何固體或液體添加劑組合,此遵照常用調配技術。 Other components may also be included, such as protective colloids, adhesives, thickeners, thixotropic agents, penetrants, stabilizers, chelating agents, as appropriate. More generally, the active compound can be combined with any solid or liquid additive, following conventional formulation techniques.

一般而言,本發明組合物可含有0.05重量%至99重量%、較佳10重量%至70重量%之活性化合物。 In general, the compositions of the invention may contain from 0.05% to 99% by weight, preferably from 10% to 70% by weight, of the active compound.

本發明組合物可依以下各種形式及調配物使用:諸如氣霧劑分配器、膠囊懸浮液、冷霧濃縮物、可撒佈粉末、可乳化濃縮物、水包油乳液、油包水乳液、囊封顆粒、精細顆粒、用於種子處理之可流動濃縮物、氣體(在壓力下)、產氣製品、顆粒、熱霧濃縮物、大粒劑、微粒劑、油分散性粉末、可與油混溶之可流動濃縮物、可與油混溶之液體、糊劑、植物桿型劑(plant rodlet)、用於乾式種子處理之粉末、塗有殺蟲劑之種子、可溶性濃縮物、可溶性粉末、用於種子處理之溶液、懸浮液濃縮物(可流動濃縮物)、超低容量(ULV)液體、超低容量(ULV)懸浮液、水分散性顆粒或錠劑、用於漿料處理之水分散性粉末、水溶性顆粒或錠劑、用於種子處理之水溶性粉末及可濕性粉末。 此等組合物不僅包括準備藉助於適合裝置(諸如噴霧或撒粉裝置)施用於待處理之植物或種子的組合物,而且包括在施用於作物之前必須加以稀釋之濃縮商業組合物。 The compositions of the present invention can be used in a variety of forms and formulations, such as aerosol dispensers, capsule suspensions, cold mist concentrates, spreadable powders, emulsifiable concentrates, oil-in-water emulsions, water-in-oil emulsions, Encapsulated granules, fine granules, flowable concentrate for seed treatment, gas (under pressure), gas producing products, granules, hot mist concentrate, large granules, granules, oil dispersible powder, can be mixed with oil Dissolvable flowable concentrate, oil miscible liquid, paste, plant rodlet, powder for dry seed treatment, seed coated with insecticide, soluble concentrate, soluble powder, Solution for seed treatment, suspension concentrate (flowable concentrate), ultra low volume (ULV) liquid, ultra low volume (ULV) suspension, water dispersible granule or lozenge, water for slurry treatment Dispersible powder, water-soluble granules or troches, water-soluble powders for seed treatment, and wettable powders. Such compositions include not only compositions that are intended to be applied to the plant or seed to be treated by means of a suitable device, such as a spray or dusting device, but also a concentrated commercial composition that must be diluted prior to application to the crop.

調配物可依本身已知之方式製備,例如藉由將活性成分與以下物質混合:至少一種習用增量劑、溶劑或稀釋劑、佐劑、乳化劑、分散劑及/或黏合劑或固定劑、濕潤劑、拒水劑、適當時乾燥劑及UV穩定劑及適當時染料及顏料、消泡劑、防腐劑、無機及有機增稠劑、黏著劑、赤黴素(gibberellin)以及其他加工助劑以及水。視待製備之調配物類型而定,需要其他處理步驟,例如濕式研磨、乾式研磨及造粒。 Formulations may be prepared in a manner known per se, for example by mixing the active ingredient with at least one conventional extender, solvent or diluent, adjuvant, emulsifier, dispersant and/or binder or fixative, Wetting agents, water repellents, desiccants and UV stabilizers, and, where appropriate, dyes and pigments, defoamers, preservatives, inorganic and organic thickeners, adhesives, gibberellin and other processing aids And water. Depending on the type of formulation to be prepared, additional processing steps such as wet milling, dry milling and granulation are required.

本發明活性成分可按原樣存在或以其(商業)調配物形式及以由呈 與其他(已知)活性成分之混合物形式之此等調配物製備的使用形式存在,該等活性成分為諸如殺昆蟲劑、引誘劑、滅菌劑、殺細菌劑、殺蟎劑、殺線蟲劑、殺真菌劑、生長調節劑、除草劑、肥料、安全劑及/或化學訊息傳遞素(semiochemical)。 The active ingredient of the present invention may be present as it is or in the form of its (commercial) formulation and The use of such formulations in the form of a mixture with other (known) active ingredients, such as insecticides, attractants, sterilants, bactericides, acaricides, nematicides, Fungicides, growth regulators, herbicides, fertilizers, safeners and/or semiochemicals.

本發明之式(I)化合物及殺真菌劑組合物可用於治療性或預防性控制植物或作物之植物病原性真菌。 The compounds of the formula (I) according to the invention and the fungicide compositions are useful for the phytopathogenic fungi for the therapeutic or prophylactic control of plants or crops.

因此,根據本發明之另一態樣,提供一種治療性或預防性控制植物或作物之植物病原性真菌的方法,其特徵在於將本發明之式(I)化合物或殺真菌劑組合物施用於種子、植物或施用於植物之果實或施用於植物生長或需要生長植物之土壤。 According to another aspect of the present invention, there is provided a method for the therapeutic or prophylactic control of a phytopathogenic fungus of a plant or crop, characterized in that a compound of the formula (I) or a fungicide composition of the invention is applied to Seeds, plants or fruits applied to plants or applied to plants where plants are grown or where plants need to be grown.

本發明之處理方法亦可適用於處理繁殖材料,諸如塊莖或根莖,以及種子、幼苗或移植之幼苗及植物或移植之植物。此處理方法亦可適用於處理根。本發明之處理方法亦可適用於處理植物之地上部分,諸如相關植物之軀幹、莖或梗、葉、花及果實。 The treatment method of the present invention can also be applied to the treatment of propagation material, such as tubers or rhizomes, as well as seeds, seedlings or transplanted seedlings and plants or transplanted plants. This processing method can also be applied to processing roots. The treatment method of the present invention can also be applied to the treatment of aerial parts of plants, such as the trunk, stem or stem, leaves, flowers and fruits of related plants.

根據本發明,可處理所有植物及植物部分。植物意謂所有植物及植物群體,諸如需要及不合需要之野生植物、栽培品種及植物品種(不論是否可受植物品種或植物育種家之權利保護)。栽培品種及植物品種可為藉由習知繁殖及育種方法獲得之植物,該等方法可藉由一或多種生物技術方法輔助或補充,諸如藉由使用雙單倍體、原生質體融合、無規及定向突變誘發、分子或遺傳標記或藉由生物工程改造及遺傳工程改造方法。植物部分意謂植物之所有地上及地下部分及器官,諸如芽、葉、花及根,其中列舉例如葉、針葉、莖、分枝、花、子實體、果實及種子以及根、球莖及根莖。作物以及無性及有性繁殖材料(例如插條、球莖、根莖、長匐莖及種子)亦屬於植物部分。 According to the invention, all plants and plant parts can be treated. Plant means all plants and plant populations, such as wild plants, cultivars and plant varieties that are needed and undesirable (whether or not protected by the plant variety or the rights of the plant breeder). Cultivars and plant varieties may be plants obtained by conventional breeding and breeding methods, which may be supplemented or supplemented by one or more biotechnological methods, such as by using double haploid, protoplast fusion, random And directed mutation induction, molecular or genetic markers or by bioengineering and genetic engineering methods. Plant parts mean all above-ground and underground parts and organs of plants, such as buds, leaves, flowers and roots, such as leaves, needles, stems, branches, flowers, fruit bodies, fruits and seeds, as well as roots, bulbs and rhizomes. . Crops as well as vegetative and sexually propagated materials (such as cuttings, bulbs, rhizomes, long stalks and seeds) are also part of the plant.

在可受本發明方法保護之植物中,可提及主要田間作物,如玉米、大豆、棉花、甘藍型油籽(諸如甘藍型油菜(Brassica napus)(例如 芥花)、蕪菁(Brassica rapa)、芥菜(B.juncea)(例如芥子)及阿比西尼亞芥菜(Brassica carinata))、水稻、小麥、甜菜、甘蔗、燕麥、黑麥、大麥、粟、黑小麥、亞麻、蔓藤以及各種植物學分類群之各種水果及蔬菜,諸如薔薇科種(Rosaceae sp.)(例如仁果類水果,諸如蘋果及梨;以及核果類水果,諸如杏、櫻桃、杏仁及桃;漿果類水果,諸如草莓)、虎耳草亞科種(Ribesioidae sp.)、胡桃科種(Juglandaceae sp.)、樺科種(Betulaceae sp.)、漆樹科種(Anacardiaceae sp.)、山毛櫸科種(Fagaceae sp.)、桑科種(Moraceae sp.)、木樨科種(Oleaceae sp.)、獼猴桃科種(Actinidaceae sp.)、樟科種(Lauraceae sp.)、芭蕉科種(Musaceae sp.)(例如香蕉樹及種植林)、茜草科種(Rubiaceae sp.)(例如咖啡)、茶科種(Theaceae sp.)、梧桐科種(Sterculiceae sp.)、芸香科種(Rutaceae sp.)(例如檸檬、柑橘及葡萄柚);茄科種(Solanaceae sp.)(例如蕃茄、馬鈴薯、胡椒、茄子)、百合科種(Liliaceae sp.)、菊科種(Compositiae sp.)(例如萵苣、朝鮮薊及菊苣,包括根菊苣、苦苣或常見菊苣)、傘形科種(Umbelliferae sp.)(例如胡蘿蔔、香芹、旱芹及根芹菜)、葫蘆科種(Cucurbitaceae sp.)(例如黃瓜(包括醃漬黃瓜)、南瓜、西瓜、葫蘆及甜瓜)、蔥科種(Alliaceae sp.)(例如洋蔥及韭菜)、十字花科種(Cruciferae sp.)(例如白球甘藍、紅球甘藍、椰菜、花椰菜、抱子甘藍、白菜、球莖甘藍、蘿蔔、辣根、水芹、大白菜)、豆科種(Leguminosae sp.)(例如花生、豌豆及豆子,豆子諸如蔓菜豆及蠶豆)、藜科種(Chenopodiaceae sp.)(例如飼料甜菜、葉甜菜、菠菜、甜菜根)、錦葵科(Malvaceae)(例如秋葵)、天門冬科(Asparagaceae)(例如蘆筍);園藝及森林作物;觀賞植物;以及此等作物之經遺傳修飾之同源物。 Among the plants which can be protected by the method of the invention, mention may be made of major field crops such as corn, soybean, cotton, and kale oilseeds (such as Brassica napus (for example, mustard), phthalocyanine ( Brassis rapa ), Brassica ( B.juncea ) (such as mustard) and Brassica carinata (), rice, wheat, sugar beet, sugar cane, oats, rye, barley, millet, triticale, flax, vine and various plants A variety of fruits and vegetables, such as Rosaceae sp. (such as pome fruit, such as apples and pears; and stone fruit, such as apricots, cherries, almonds, and peaches; berry fruits, such as strawberries) ), Ribesioidae sp. , Juglandaceae sp. , Betulaceae sp. , Anacardiaceae sp. , Fagaceae sp. , Moraceae sp. , Oleaceae sp. , Actinidaceae sp. , Lauraceae sp. , Musaceae sp. (eg banana tree and planting) Lin), Rubiaceae sp. ( Rubiaceae sp. (eg coffee), Theaceae sp. , Sterculiceae sp. , Rutaceae sp. (eg lemon, citrus and grapefruit); Solanaceae sp. (eg tomato, potato, pepper, eggplant), Liliaceae sp. , Compositiae sp. (eg lettuce, artichoke and chicory, including root chicory, chicory or common chicory), umbrella Umbelliferae sp. (eg carrot, parsley, celery and root celery), Cucurbitaceae sp. (eg cucumber (including pickled cucumber), pumpkin, watermelon, gourd and melon), onion species ( Alliaceae sp.) (such as onion and leeks), Cruciferae sp. (such as white cabbage, red cabbage, broccoli, broccoli, Brussels sprouts, cabbage, broccoli, radish, horseradish, water Parsley, Chinese cabbage, Leguminosae sp. (such as peanuts, peas and beans, beans such as vine and broad beans), Chenopodiaceae sp. (eg fodder beet, leaf beet, spinach, beetroot) ), Malvaceae (Malvaceae) (such as okra), aspartate (Asparagaceae) (e.g. asparagus); horticultural and forest crops; ornamental plants; and such genetically modified crops of the homologs.

本發明之處理方法可用於處理經遺傳修飾之生物體(GMO),例如植物或種子。經遺傳修飾之植物(或轉殖基因植物)為異源基因已穩定 整合於基因組中之植物。表述「異源基因」基本上意謂在植物外部提供或組裝且當引入細胞核、葉綠體或線粒體基因組中時藉由表現相關蛋白質或多肽或藉由(使用例如反義技術、共抑制技術或RNA干擾-RNAi技術)下調或靜默植物中所存在之其他基因而賦予經轉化植物新穎或改良之農藝學特性或其他特性的基因。位於基因組中之異源基因亦稱作轉殖基因。由其在植物基因組中之特定位置而定義之轉殖基因稱作轉化或轉殖基因事件。 The treatment methods of the invention can be used to treat genetically modified organisms (GMOs), such as plants or seeds. Genetically modified plants (or transgenic plants) have been stabilized as heterologous genes A plant integrated into the genome. The expression "heterologous gene" basically means providing or assembling outside the plant and when introduced into the nucleus, chloroplast or mitochondrial genome by expressing a related protein or polypeptide or by using, for example, antisense technology, cosuppression technology or RNA interference -RNAi technology) A gene that down-regulates or silences other genes present in a plant to confer novel or improved agronomic or other properties to the transformed plant. A heterologous gene located in the genome is also referred to as a transgenic gene. A transgene that is defined by its specific location in the plant genome is referred to as a transformation or transgenic event.

視植物物種或植物栽培品種、其位置及生長條件(土壤、氣候、營養期、食料)而定,本發明之處理亦可產生超加性(「協同」)效應。 因此,舉例而言,有可能達成施用量降低及/或活性範圍拓寬及/或可根據本發明使用之活性化合物及組合物之活性增強、植物生長較好、對高溫或低溫之耐受性增強、對乾旱或水或土壤鹽含量之耐受性增強、開花效能增強、較易收穫、加速成熟、收穫產量較高、果實較大、植物高度較高、葉片顏色較綠、開花較早、收穫產物之品質較高及/或營養價值較高、果實內之糖濃度較高、收穫產物之儲存穩定性及/或可加工性較好,該等效果超過實際預期之效果。 The treatment of the present invention may also produce a superadditive ("synergistic") effect depending on the plant species or plant cultivar, its location and growth conditions (soil, climate, nutrient period, foodstuff). Thus, for example, it is possible to achieve a reduction in the amount of application and/or broadening of the range of activity and/or enhanced activity of the active compounds and compositions which can be used according to the invention, better plant growth, enhanced tolerance to high or low temperatures. Tolerance to drought or water or soil salt content, enhanced flowering efficiency, easier harvesting, accelerated maturation, higher harvest yield, larger fruit, higher plant height, greener leaf color, early flowering, harvest The product has higher quality and/or higher nutritional value, higher sugar concentration in the fruit, better storage stability and/or processability of the harvested product, and these effects exceed the actual expected effect.

在特定施用量下,本發明之活性化合物組合亦可在植物中具有增強效應。因此,其亦適用於動員植物之防禦系統對抗不當微生物之侵襲。適當時,此可為本發明組合例如對抗真菌之活性增強的原因之一。在本發明之背景下,植物增強(抗性誘導)物質應理解為意謂能夠以如下方式刺激植物之防禦系統的彼等物質或物質組合:當隨後接種不當微生物時,經處理之植物顯示對此等微生物實質上具抗性之程度。在本發明之情況下,不當微生物應理解為意謂植物病原性真菌、細菌及病毒。因此,本發明之物質可用於保護植物在處理後一定時間段內免受上述病原體侵襲。實現保護之時間段一般在植物經活性化合物處理後自1天延至10天,較佳自1天延至7天。 The active compound combination of the invention may also have a potentiating effect in plants at a particular application rate. Therefore, it is also suitable for mobilizing plant defense systems against the invasion of inappropriate microorganisms. This may be one of the reasons for the enhanced activity of the combination of the invention, for example against fungi, where appropriate. In the context of the present invention, a plant-enhancing (resistance-inducing) substance is understood to mean a substance or combination of substances capable of stimulating a plant's defense system in such a way that when subsequently inoculated with an inappropriate microorganism, the treated plant shows a pair These microorganisms are substantially resistant to the extent. In the context of the present invention, an inappropriate microorganism is understood to mean a phytopathogenic fungus, a bacterium and a virus. Thus, the materials of the invention can be used to protect plants from attack by the aforementioned pathogens for a certain period of time after treatment. The period of time to achieve protection is generally extended from one day to ten days after the treatment of the active compound by the plant, preferably from one day to seven days.

較佳根據本發明處理之植物及植物栽培品種包括具有向此等植物賦予尤其有利且有用之性狀之遺傳物質的所有植物(不論藉由育種及/或生物技術方式獲得)。 Plants and plant cultivars which are preferably treated according to the invention include all plants (whether obtained by breeding and/or biotechnological means) having genetic material which confers particularly advantageous and useful traits on such plants.

亦較佳根據本發明處理之植物及植物栽培品種對一或多種生物壓力具抗性,亦即該等植物顯示對動物及微生物害蟲(諸如對線蟲、昆蟲、蟎蟲、植物病原性真菌、細菌、病毒及/或類病毒)之較佳防禦。 It is also preferred that the plants and plant cultivars treated in accordance with the present invention are resistant to one or more biological stresses, that is, the plants exhibit animal and microbial pests (such as against nematodes, insects, mites, phytopathogenic fungi, bacteria, Better defense against viruses and/or viruses.

抗線蟲植物之實例描述於例如美國專利申請案第11/765,491號、第11/765,494號、第10/926,819號、第10/782,020號、第12/032,479號、第10/783,417號、第10/782,096號、第11/657,964號、第12/192,904號、第11/396,808號、第12/166,253號、第12/166,239號、第12/166,124號、第12/166,209號、第11/762,886號、第12/364,335號、第11/763,947號、第12/252,453號、第12/209,354號、第12/491,396號或第12/497,221號中。 Examples of nematode-resistant plants are described, for example, in U.S. Patent Application Serial Nos. 11/765,491, 11/765,494, 10/926,819, 10/782,020, 12/032,479, 10/783,417, 10 /782,096, 11/657,964, 12/192,904, 11/396,808, 12/166,253, 12/166,239, 12/166,124, 12/166,209, 11/762,886 No. 12/364,335, 11/763,947, 12/252,453, 12/209,354, 12/491,396 or 12/497,221.

亦可根據本發明處理之植物及植物栽培品種為對一或多種非生物壓力具抗性之彼等植物。非生物壓力條件可包括例如乾旱、低溫暴露、熱暴露、滲透壓力、洪水、高土壤鹽度、高礦物質暴露、臭氧暴露、高光暴露、氮養分之可用性有限、磷養分之可用性有限、避蔭。 Plants and plant cultivars which may also be treated according to the invention are those plants which are resistant to one or more abiotic stresses. Abiotic stress conditions can include, for example, drought, low temperature exposure, heat exposure, osmotic pressure, flooding, high soil salinity, high mineral exposure, ozone exposure, high light exposure, limited availability of nitrogen nutrients, limited availability of phosphorus nutrients, and shade avoidance .

亦可根據本發明處理之植物及植物栽培品種為特徵在於產量特徵提高之彼等植物。該等植物之產量增加可為例如改良植物生理學、生長及發育(諸如水利用效率、水保持效率、改良氮使用、增強碳同化、改良光合成、增加萌芽效率及加快成熟)之結果。此外,產量可受改良之植物株型所影響(在壓力及非壓力條件下),包括(但不限於)早期開花、對雜交種子生產之開花控制、幼苗活力、植物大小、節間數目及距離、根生長、種子大小、果實大小、豆莢大小、豆莢或穗數目、每個豆莢或穗之種子數目、種子質量、較高種子填充、較低種子 散佈度、較低豆莢開裂性,及抗倒伏性。其他產量性狀包括種子組成,諸如碳水化合物含量、蛋白質含量、油含量及組成、營養價值、抗營養化合物之減少、改良之可加工性及較佳之儲存穩定性。 Plants and plant cultivars which may also be treated according to the invention are characterized by their plants having improved yield characteristics. Increases in the yield of such plants can be the result, for example, of improved plant physiology, growth and development (such as water use efficiency, water retention efficiency, improved nitrogen use, enhanced carbon assimilation, improved photosynthetic synthesis, increased germination efficiency, and accelerated maturation). In addition, yield can be affected by improved plant line types (under stress and non-stress conditions), including (but not limited to) early flowering, flowering control of hybrid seed production, seedling vigor, plant size, internode number and distance Root growth, seed size, fruit size, pod size, number of pods or ears, number of seeds per pod or ear, seed quality, higher seed filling, lower seed Dispersion, lower pod cracking, and lodging resistance. Other yield traits include seed composition such as carbohydrate content, protein content, oil content and composition, nutritional value, reduction in anti-nutritional compounds, improved processability, and better storage stability.

具有上述性狀之植物的實例非詳盡地列於表A中。 Examples of plants having the above traits are not listed in detail in Table A.

可根據本發明處理之植物為已表現雜種優勢或雜交活力特徵的雜交植物,該特徵一般產生較高之產量、活力、健康狀況及對生物及非生物壓力之抗性。該等植物通常係由近親配種之雄性不育親本系(母本)與另一近親配種之雄性可育親本系(父本)雜交產生。雜交種子通常自雄性不育植物收穫且出售給種植者。雄性不育植物有時(例如在玉米中)可由去雄花穗(亦即機械移除雄性生殖器官(或雄性花))產生,但雄性不育更通常為植物基因組中遺傳決定子的結果。在該情況下,且尤其當種子為自雜交植物收穫之所要產物時,通常可用於確保雜交植物之雄性可育性完全恢復。此可藉由確保雄性親本具有適當可育性恢復基因而達成,該等基因能夠恢復含有造成雄性不育之遺傳決定子之雜交植物之雄性可育性。雄性不育之遺傳決定子可位於細胞質中。細胞質雄性不育(CMS)之實例例如描述於蕓薹屬物種(WO 92/05251、WO 95/09910、WO 98/27806、WO 05/002324、WO 06/021972及US 6,229,072)中。然而,雄性不育之遺傳決定子亦可位於細胞核基因組中。雄性不育植物亦可藉由植物生物技術方法(諸如遺傳工程改造)獲得。獲得雄性不育植物之尤其有用之方式描述於WO 89/10396中,其中例如核糖核酸酶(諸如barnase)選擇性地表現於雄蕊之絨氈層細胞(tapetum cells)中。隨後可藉由在絨氈層細胞中表現核糖核酸酶抑制劑(諸如barstar)來恢復可育性(例如WO 91/02069)。 Plants which can be treated according to the invention are hybrid plants which have exhibited heterosis or hybrid viability characteristics which generally result in higher yield, vigor, health and resistance to biotic and abiotic stresses. Such plants are usually produced by crossing a male sterile male parental line (parent) of another inbreeding with a male fertile parental line (parent) of another close relative. Hybrid seeds are typically harvested from male sterile plants and sold to growers. Male sterile plants are sometimes produced (eg, in corn) from emasculated spikes (ie, mechanically removed male reproductive organs (or male flowers)), but male sterility is more often the result of genetic determinants in the plant genome. In this case, and especially when the seed is the desired product harvested from the hybrid plant, it is generally useful to ensure that the male fertility of the hybrid plant is fully restored. This can be achieved by ensuring that the male parents have appropriate fertility restorer genes that are capable of restoring the male fertility of the hybrid plants containing the genetic determinants responsible for male sterility. The genetic determinant of male sterility can be located in the cytoplasm. Examples of cytoplasmic male sterility (CMS) are described, for example, in the genus Amaranthus (WO 92/05251, WO 95/09910, WO 98/27806, WO 05/002324, WO 06/021972 and US 6,229,072). However, the genetic determinant of male sterility can also be located in the nuclear genome. Male sterile plants can also be obtained by plant biotechnology methods such as genetic engineering. A particularly useful way of obtaining male sterile plants is described in WO 89/10396, wherein, for example, ribonuclease (such as barnase) is selectively expressed in the stapum cells of the stamens. Fertility can then be restored by expressing a ribonuclease inhibitor such as barstar in the tapetum cells (e.g., WO 91/02069).

可根據本發明處理之植物或植物栽培品種(藉由植物生物技術方法(諸如遺傳工程改造)獲得)為耐除草劑植物,亦即對一或多種既定除草劑具耐受性之植物。該等植物可藉由遺傳轉化或藉由選擇含有賦予 該除草劑耐受性之突變的植物而獲得。 Plants or plant cultivars (obtained by plant biotechnology methods (such as genetic engineering)) which can be treated according to the invention are herbicide tolerant plants, i.e. plants which are tolerant to one or more established herbicides. Such plants may be conferred by genetic transformation or by selection This herbicide tolerance is obtained by mutating plants.

抗除草劑植物為例如耐草甘膦(glyphosate)植物,亦即對除草劑草甘膦或其鹽具耐受性之植物。可經不同方式使植物對草甘膦具耐受性。舉例而言,耐草甘膦植物可由編碼5-烯醇丙酮醯莽草酸-3-磷酸合成酶(EPSPS)之基因使植物轉化而獲得。該等EPSPS基因之實例為鼠傷寒沙門桿菌(Salmonella typhimurium)之AroA基因(突變CT7)(Comai等人,1983,Science 221,370-371)、土壤桿菌(Agrobacterium sp.)之CP4基因(Barry等人,1992,Curr.Topics Plant Physiol.7,139-145),編碼矮牽牛(Petunia)EPSPS(Shah等人,1986,Science 233,478-481)、番茄EPSPS(Gasser等人,1988,J.Biol.Chem.263,4280-4289)或龍爪稷(Eleusine)EPSPS(WO 01/66704)之基因。其亦可為例如EP 0837944、WO 00/66746、WO 00/66747或WO 02/26995中所述之突變EPSPS。耐草甘膦植物亦可藉由表現編碼草甘膦氧化還原酶之基因而獲得,如美國專利第5,776,760及第5,463,175號中所述。耐草甘膦植物亦可藉由表現編碼草甘膦乙醯轉移酶之基因而獲得,例如WO 02/36782、WO 03/092360、WO 05/012515及WO 07/024782中所述。耐草甘膦植物亦可藉由選擇含有上述基因之天然發生突變的植物而獲得,例如WO 01/024615或WO 03/013226中所述。表現賦予草甘膦耐受性之EPSPS基因之植物描述於例如美國專利申請案第11/517,991號、第10/739,610號、第12/139,408號、第12/352,532號、第11/312,866號、第11/315,678號、第12/421,292號、第11/400,598號、第11/651,752號、第11/681,285號、第11/605,824號、第12/468,205號、第11/760,570號、第11/762,526號、第11/769,327號、第11/769,255號、第11/943801號或第12/362,774號中。包含賦予草甘膦耐受性之其他基因(諸如去羧酶基因)之植物描述於例如美國專利申請案11/588,811、11/185,342、12/364,724、11/185,560或12/423,926中。 Herbicide-tolerant plants are, for example, glyphosate-tolerant plants, i.e. plants which are tolerant to the herbicide glyphosate or a salt thereof. Plants can be tolerant to glyphosate in different ways. For example, a glyphosate resistant plant can be obtained by transforming a plant with a gene encoding 5-enolpyruvylshikimate-3-phosphate synthase (EPSPS). Examples of such EPSPS genes are the AroA gene of Salmonella typhimurium (mutant CT7) (Comai et al., 1983, Science 221, 370-371), and the CP4 gene of Agrobacterium sp. (Barry et al., 1992, Curr. Topics Plant Physiol. 7, 139-145), encoding Petunia EPSPS (Shah et al., 1986, Science 233, 478-481), tomato EPSPS (Gasser et al., 1988, J. Biol. Chem. 263, 4280-4289) or the gene of Eleusine EPSPS (WO 01/66704). It can also be a mutant EPSPS as described in, for example, EP 0837944, WO 00/66746, WO 00/66747 or WO 02/26995. Glyphosate-tolerant plants can also be obtained by the expression of a gene encoding a glyphosate oxidoreductase, as described in U.S. Patent Nos. 5,776,760 and 5,463,175. Glyphosate-tolerant plants can also be obtained by the expression of a gene encoding a glyphosate acetyltransferase, as described in WO 02/36782, WO 03/092360, WO 05/012515 and WO 07/024782. Glyphosate-tolerant plants can also be obtained by selecting plants containing naturally occurring mutations of the above genes, for example as described in WO 01/024615 or WO 03/013226. Plants that exhibit an EPSPS gene that confers glyphosate tolerance are described, for example, in U.S. Patent Application Serial Nos. 11/517,991, 10/739,610, 12/139,408, 12/352,532, and 11/312,866. Nos. 11/315,678, 12/421,292, 11/400,598, 11/651,752, 11/681,285, 11/605,824, 12/468,205, 11/760,570, 11 /762,526, 11/769,327, 11/769,255, 11/943801 or 12/362,774. Plants comprising other genes that confer tolerance to glyphosate, such as decarboxylase genes, are described in, for example, U.S. Patent Application Serial Nos. 11/588,811, 11/185,342, 12/364,724, 11/185,560, or 12/423,926.

其他抗除草劑植物為例如對抑制麩醯胺酸合成酶之除草劑(諸如畢拉草(bialaphos)、草胺膦(phosphinothricin)或固殺草(glufosinate))具耐受性之植物。該等植物可藉由表現使除草劑解毒之酶或對抑制具抗性之突變麩醯胺酸合成酶而獲得,例如美國專利申請案第11/760,602號中所述。一此種有效解毒酶為編碼草胺膦乙醯轉移酶之酶(諸如鏈黴菌物種之bar或pat蛋白質)。表現外源性草胺膦乙醯轉移酶之植物例如描述於美國專利第5,561,236號、第5,648,477號、第5,646,024號、第5,273,894號、第5,637,489號、第5,276,268號、第5,739,082號、第5,908,810號及第7,112,665號中。 Other herbicide resistant plants are, for example, plants which are tolerant to herbicides which inhibit branylamine synthase, such as bialaphos, phosphinothricin or glufosinate. Such plants can be obtained by expressing an enzyme which detoxifies the herbicide or a mutant glutamate synthase which is resistant to inhibition, as described in U.S. Patent Application Serial No. 11/760,602. One such effective detoxifying enzyme is an enzyme encoding a glufosinate acetyltransferase (such as a bar or pat protein of a Streptomy species). Plants which exhibit exogenous phosphinothricin acetyltransferase are described, for example, in U.S. Patent Nos. 5,561,236, 5,648,477, 5,646,024, 5,273,894, 5,637,489, 5,276,268, 5,739,082, 5,908,810 and No. 7,112,665.

其他耐除草劑植物亦為對抑制羥基苯基丙酮酸二加氧酶(HPPD)之除草劑具耐受性之植物。羥基苯基丙酮酸二加氧酶為催化對羥基苯基丙酮酸(HPP)轉化為尿黑酸之反應的酶。可用編碼天然存在之抗HPPD酶之基因或編碼突變或嵌合HPPD酶之基因使對HPPD抑制劑具耐受性之植物轉化,如WO 96/38567、WO 99/24585、WO 99/24586、WO 2009/144079、WO 2002/046387或US 6,768,044中所述。儘管HPPD抑制劑抑制原生HPPD酶,但對HPPD抑制劑之耐受性亦可藉由用編碼某些使得能夠形成尿黑酸之酶的基因使植物轉化來獲得。該等植物及基因描述於WO 99/34008及WO 02/36787中。植物對HPPD抑制劑之耐受性亦可藉由用編碼具有預苯酸去氫酶(PDH)活性之酶的基因加上編碼耐HPPD酶之基因使植物轉化來改良,如WO 2004/024928中所述。另外,可藉由將編碼能夠使HPPD抑制劑代謝或降解之酶(諸如WO 2007/103567及WO 2008/150473中所示之CYP450酶)的基因添加至植物基因組中而使植物對HPPD抑制劑除草劑更具耐受性。 Other herbicide tolerant plants are also plants which are tolerant to herbicides which inhibit hydroxyphenylpyruvate dioxygenase (HPPD). Hydroxyphenylpyruvate dioxygenase is an enzyme that catalyzes the conversion of p-hydroxyphenylpyruvate (HPP) to homogentisate. Plants that are tolerant to HPPD inhibitors can be transformed with a gene encoding a naturally occurring anti-HPPD enzyme or a gene encoding a mutant or chimeric HPPD enzyme, as described in WO 96/38567, WO 99/24585, WO 99/24586, WO. It is described in 2009/144079, WO 2002/046387 or US 6,768,044. Although HPPD inhibitors inhibit native HPPD enzymes, tolerance to HPPD inhibitors can also be obtained by transforming plants with genes encoding certain enzymes that enable the formation of homogentisate. Such plants and genes are described in WO 99/34008 and WO 02/36787. Plant tolerance to HPPD inhibitors can also be improved by transforming plants with a gene encoding an enzyme having prephenate dehydrogenase (PDH) activity plus a gene encoding a HPPD-resistant enzyme, as in WO 2004/024928 Said. In addition, plants can be weeded against HPPD inhibitors by adding genes encoding enzymes capable of metabolizing or degrading HPPD inhibitors, such as the CYP450 enzymes shown in WO 2007/103567 and WO 2008/150473, to the plant genome. The agent is more tolerant.

其他抗除草劑植物為對乙醯乳酸合成酶(ALS)抑制劑具耐受性之植物。已知ALS抑制劑包括例如磺醯脲、咪唑啉酮、三唑并嘧啶、嘧啶氧基(硫代)苯甲酸鹽及/或磺醯胺基羰基三唑啉酮除草劑。已知ALS 酶(亦稱為乙醯羥基酸合成酶,AHAS)之不同突變向不同除草劑及除草劑組賦予耐受性,如例如Tranel及Wright(2002,Weed Science 50:700-712)中以及在美國專利第5,605,011號、第5,378,824號、第5,141,870號及第5,013,659號中所述。耐磺醯脲植物及耐咪唑啉酮植物之產生描述於美國專利第5,605,011號、第5,013,659號、第5,141,870號、第5,767,361號、第5,731,180號、第5,304,732號、第4,761,373號、第5,331,107號、第5,928,937號及第5,378,824號及國際公開案WO 96/33270號中。其他耐咪唑啉酮植物亦描述於例如WO 2004/040012、WO 2004/106529、WO 2005/020673、WO 2005/093093、WO 2006/007373、WO 2006/015376、WO 2006/024351及WO 2006/060634中。其他耐磺醯脲及耐咪唑啉酮植物亦描述於例如WO 07/024782及美國專利申請案第61/288958號中。 Other herbicide resistant plants are plants that are tolerant to acetate lactate synthase (ALS) inhibitors. ALS inhibitors are known to include, for example, sulfonylurea, imidazolinone, triazolopyrimidine, pyrimidinyloxy(thio)benzoate and/or sulfonylaminocarbonyltriazolinone herbicide. Known ALS Different mutations of the enzyme (also known as acetamidine hydroxyacid synthase, AHAS) confer tolerance to different herbicide and herbicide groups, such as, for example, Tranel and Wright (2002, Weed Science 50: 700-712) and in the United States. Patent Nos. 5,605,011, 5,378,824, 5,141,870 and 5,013,659. The sulphate-resistant urethrazole plant and the imidazolinone-resistant plant are described in U.S. Patent Nos. 5,605,011, 5,013,659, 5,141,870, 5,767,361, 5,731,180, 5,304,732, 4,761,373, 5,331,107, 5,928,937 and 5,378,824 and International Publication No. WO 96/33270. Other imidazolinone-resistant plants are also described in, for example, WO 2004/040012, WO 2004/106529, WO 2005/020673, WO 2005/093093, WO 2006/007373, WO 2006/015376, WO 2006/024351, and WO 2006/060634 . Other sulfonylurea-resistant and imidazolinone-resistant plants are also described in, for example, WO 07/024782 and U.S. Patent Application Serial No. 61/288,958.

對咪唑啉酮及/或磺醯脲具耐受性之其他植物可藉由誘導突變誘發、在除草劑存在下於細胞培養物中進行選擇、或突變育種而獲得,如例如關於大豆之美國專利5,084,082、關於水稻之WO 97/41218、關於甜菜之美國專利5,773,702及WO 99/057965、關於萵苣之美國專利5,198,599或關於向日葵之WO 01/065922中所述。 Other plants that are tolerant to imidazolinones and/or sulfonylureas can be obtained by induction of mutations, selection in cell culture in the presence of herbicides, or mutation breeding, such as, for example, US patents on soybeans. 5, 084, 082, WO 97/41218 to rice, U.S. Patent No. 5,773,702, to WO 99/057965, to U.S. Pat.

亦可根據本發明處理之植物或植物栽培品種(藉由諸如遺傳工程改造之植物生物技術方法而獲得)為抗昆蟲轉殖基因植物,亦即對某些目標昆蟲之侵襲具抗性之植物。該等植物可藉由遺傳轉化或藉由選擇含有賦予該抗昆蟲性之突變的植物來獲得。 Plants or plant cultivars (obtained by genetic engineering engineering plant biotechnology methods) which can also be treated according to the invention are plants which are resistant to insect transfer genes, i.e. plants which are resistant to attack by certain target insects. Such plants can be obtained by genetic transformation or by selection of plants containing mutations conferring such insect resistance.

如本文所用之「抗昆蟲轉殖基因植物」包括含有至少一個包含編碼以下之編碼序列之轉殖基因的任何植物: An "insect-resistant transgenic plant" as used herein includes any plant comprising at least one transgene comprising a coding sequence encoding:

1)來自蘇雲金桿菌(Bacillus thuringiensis)之殺昆蟲晶體蛋白質或其殺昆蟲部分,諸如由Crickmore等人(1998,Microbiology and Molecular Biology Reviews,62:807-813)列出且由Crickmore等人 (2005)在蘇雲金桿菌毒素命名法中(線上:http://www.lifesci.sussex.ac.uk/Home/Neil_Crickmore/Bt/)更新之殺昆蟲晶體蛋白質或其殺昆蟲部分,例如Cry蛋白質類別之蛋白質Cry1Ab、Cry1Ac、Cry1B、Cry1C、Cry1D、Cry1F、Cry2Ab、Cry3Aa或Cry3Bb或其殺昆蟲部分(例如EP 1999141及WO 2007/107302),或由合成基因編碼之該等蛋白質,例如美國專利申請案第12/249,016號中所述;或 1) Insecticidally crystalline proteins from Bacillus thuringiensis or insecticidal fractions thereof, such as those listed by Crickmore et al. (1998, Microbiology and Molecular Biology Reviews, 62: 807-813) and by Crickmore et al. (2005) An insecticidal crystal protein or an insecticidal part thereof, such as the Cry protein class Cry1Ab, which is updated in the B. thuringiensis nomenclature (online: http://www.lifesci.sussex.ac.uk/Home/Neil_Crickmore/Bt/) , Cry1Ac, Cry1B, Cry1C, Cry1D, Cry1F, Cry2Ab, Cry3Aa or Cry3Bb or an insecticidal moiety thereof (e.g., EP 1999141 and WO 2007/107302), or such proteins encoded by synthetic genes, such as U.S. Patent Application Serial No. 12/ As described in 249,016; or

2)來自蘇雲金桿菌之晶體蛋白質或其部分,其在來自蘇雲金桿菌之第二其他晶體蛋白質或其部分存在下具殺昆蟲性,諸如由Cry34及Cry35晶體蛋白質構成之二元毒素(Moellenbeck等人2001,Nat.Biotechnol.19:668-72;Schnepf等人2006,Applied Environm.Microbiol.71,1765-1774)或由Cry1A或Cry1F蛋白質及Cry2Aa或Cry2Ab或Cry2Ae蛋白質構成之二元毒素(美國專利申請案第12/214,022號及EP 08010791.5);或 2) a crystal protein or a part thereof from Bacillus thuringiensis which is insecticidal in the presence of a second other crystal protein or a part thereof from Bacillus thuringiensis, such as a binary toxin composed of Cry34 and Cry35 crystal proteins (Moellenbeck et al. 2001). , Nat. Biotechnol. 19: 668-72; Schnepf et al. 2006, Applied Environm. Microbiol. 71, 1765-1774) or a binary toxin consisting of Cry1A or Cry1F protein and Cry2Aa or Cry2Ab or Cry2Ae protein (US Patent Application) 12/214,022 and EP 08010791.5); or

3)包含來自蘇雲金桿菌之不同殺昆蟲晶體蛋白質之部分的雜交殺昆蟲蛋白質,諸如上述1)之蛋白質之雜交體或上述2)之蛋白質之雜交體,例如由玉米事件MON98034產生之Cry1A.105蛋白質(WO 2007/027777);或 3) a hybrid insecticidal protein comprising a portion of a different insecticidal crystal protein from Bacillus thuringiensis, such as a hybrid of the protein of 1) above or a hybrid of the protein of 2) above, such as the Cry1A.105 protein produced by the corn event MON98034 (WO 2007/027777); or

4)上述1)至3)中任一項之蛋白質,其中一些(尤其1至10個)胺基酸已由另一胺基酸置換以獲得對目標昆蟲物種之較高殺昆蟲活性及/或擴大受影響之目標昆蟲物種之範圍,及/或此係由於在選殖或轉化期間引入編碼DNA中之變化,諸如玉米事件MON863或MON88017中之Cry3Bb1蛋白質,或玉米事件MIR604中之Cry3A蛋白質;或 4) The protein of any one of the above 1) to 3), wherein some (especially 1 to 10) amino acids have been replaced by another amino acid to obtain higher insecticidal activity against the target insect species and/or Expanding the range of affected target insect species, and/or this is due to changes introduced into the coding DNA during selection or transformation, such as the Cry3Bb1 protein in maize event MON863 or MON88017, or the Cry3A protein in maize event MIR604;

5)來自蘇雲金桿菌或仙人掌桿菌(Bacillus cereus)之殺昆蟲分泌蛋白質或其殺昆蟲部分,諸如http://www.lifesci.sussex.ac.uk/home/Neil_Crickmore/Bt/vip.html列出 之營養期殺昆蟲(VIP)蛋白質,例如來自VIP3Aa蛋白質類別之蛋白質;或 5) Insect-secreting proteins or insecticidal parts from Bacillus thuringiensis or Bacillus cereus , such as http://www.lifesci.sussex.ac.uk/home/Neil_Crickmore/Bt/vip.html a vegetative insecticidal (VIP) protein, such as a protein from the VIP3Aa protein class; or

6)來自蘇雲金桿菌或仙人掌桿菌之分泌蛋白質,其在來自蘇雲金桿菌或仙人掌桿菌之第二分泌蛋白質存在下具殺昆蟲性,諸如由VIP1A及VIP2A蛋白質構成之二元毒素(WO 94/21795);或 6) a secreted protein from Bacillus thuringiensis or Cactus bacillus, which is insecticidal in the presence of a second secreted protein from Bacillus thuringiensis or Cactus bacillus, such as a binary toxin composed of VIP1A and VIP2A proteins (WO 94/21795); or

7)包含來自蘇雲金桿菌或仙人掌桿菌之不同分泌蛋白質之部分的雜交殺昆蟲蛋白質,諸如上述1)中之蛋白質之雜交體或上述2)中之蛋白質之雜交體;或 7) a hybrid insecticidal protein comprising a portion derived from a different secreted protein of Bacillus thuringiensis or Cactus, such as a hybrid of the proteins of 1) above or a hybrid of the proteins of 2) above;

8)上述5)至7)中任一項之蛋白質,其中一些(尤其1至10個)胺基酸已由另一胺基酸置換以獲得對目標昆蟲物種之較高殺昆蟲活性及/或擴大受影響之目標昆蟲物種之範圍,及/或此係由於在選殖或轉化期間引入編碼DNA中之變化(同時仍編碼殺昆蟲蛋白質),諸如棉花事件COT102中之VIP3Aa蛋白質;或 8) The protein of any of the above 5) to 7), wherein some (especially 1 to 10) amino acids have been replaced by another amino acid to obtain higher insecticidal activity against the target insect species and/or Expanding the range of affected target insect species, and/or this is due to changes in the coding DNA introduced during selection or transformation (while still encoding insecticidal proteins), such as the VIP3Aa protein in cotton event COT102; or

9)來自蘇雲金桿菌或仙人掌桿菌之分泌蛋白質,其在來自蘇雲金桿菌之晶體蛋白質存在下具殺昆蟲性,諸如由VIP3及Cry1A或Cry1F構成之二元毒素(美國專利申請案第61/126083號及第61/195019號),或由VIP3蛋白質及Cry2Aa或Cry2Ab或Cry2Ae蛋白質構成之二元毒素(美國專利申請案第12/214,022號及EP 08010791.5)。 9) a secreted protein from Bacillus thuringiensis or Cactus bacterium, which is insecticidal in the presence of a crystal protein from Bacillus thuringiensis, such as a binary toxin composed of VIP3 and Cry1A or Cry1F (US Patent Application No. 61/126083 and No. 61/195019), or a binary toxin composed of a VIP3 protein and a Cry2Aa or Cry2Ab or Cry2Ae protein (U.S. Patent Application Serial No. 12/214,022 and EP 08010791.5).

10)上述9)之蛋白質,其中一些(尤其1至10個)胺基酸已由另一胺基酸置換以獲得對目標昆蟲物種之較高殺昆蟲活性及/或擴大受影響之目標昆蟲物種之範圍,及/或此係由於在選殖或轉化期間引入編碼DNA中之變化(同時仍編碼殺昆蟲蛋白質)。 10) The protein of the above 9), wherein some (especially 1 to 10) amino acids have been replaced by another amino acid to obtain higher insecticidal activity against the target insect species and/or to expand the affected target insect species The scope, and/or this is due to the introduction of changes in the coding DNA during selection or transformation (while still encoding insecticidal proteins).

當然,如本文所用之抗昆蟲轉殖基因植物亦包括包含編碼上述類別1至10中任一項之蛋白質之基因組合的任何植物。在一個實施例中,抗昆蟲植物含有一種以上編碼上述類別1至10中任一項之蛋白質的轉殖基因,以當使用針對不同目標昆蟲物種之不同蛋白質時擴大受 影響之目標昆蟲物種之範圍,或藉由使用對相同目標昆蟲物種具殺昆蟲性但具有不同作用模式(諸如結合於昆蟲體內之不同受體結合位點)之不同蛋白質來延遲植物之抗昆蟲性發展。 Of course, an insect-resistant transgenic plant as used herein also includes any plant comprising a combination of genes encoding a protein of any of the above categories 1 to 10. In one embodiment, the insect-resistant plant contains more than one transgene encoding a protein of any of the above categories 1 to 10 to expand upon the use of different proteins for different target insect species Delaying the insect resistance of plants by affecting the range of target insect species, or by using different proteins that are insecticidal to the same target insect species but have different modes of action, such as different receptor binding sites that bind to insects. development of.

如本文所用之「抗昆蟲轉殖基因植物」另外包括含有至少一種包含在表現時產生雙股RNA(在由植物害蟲攝入時其抑制此害蟲之生長)之序列之轉殖基因的任何植物,如例如WO 2007/080126、WO 2006/129204、WO 2007/074405、WO 2007/080127及WO 2007/035650中所述。 An "insect-resistant transgenic plant" as used herein additionally includes any plant comprising at least one of a transgenic gene comprising a sequence which produces a double-stranded RNA (which inhibits the growth of the pest when ingested by a plant pest). It is described, for example, in WO 2007/080126, WO 2006/129204, WO 2007/074405, WO 2007/080127 and WO 2007/035650.

亦可根據本發明處理之植物或植物栽培品種(藉由諸如遺傳工程改造之植物生物技術方法而獲得)對非生物壓力具耐受性。該等植物可藉由遺傳轉化或藉由選擇含有賦予該抗壓力性之突變的植物而獲得。尤其適用之耐壓力植物包括: Plants or plant cultivars (obtained by genetically engineered plant biotechnology methods) that are also treated according to the invention are also tolerant to abiotic stresses. Such plants can be obtained by genetic transformation or by selection of plants containing mutations conferring such resistance to stress. Particularly suitable pressure-resistant plants include:

1)含有能夠降低植物細胞或植物中之聚(ADP-核糖)聚合酶(PARP)基因之表現及/或活性之轉殖基因的植物,如WO 00/04173、WO/2006/045633、EP 04077984.5或EP 06009836.5中所述。 1) Plants containing a transgenic gene capable of reducing the expression and/or activity of a poly(ADP-ribose) polymerase (PARP) gene in a plant cell or plant, such as WO 00/04173, WO/2006/045633, EP 04077984.5 Or as described in EP 06009836.5.

2)含有能夠降低植物或植物細胞之PARG編碼基因之表現及/或活性之耐壓力性增強轉殖基因的植物,如例如WO 2004/090140中所述。 2) A plant comprising a stress-tolerant transgenic gene capable of reducing the expression and/or activity of a PARG-encoding gene of a plant or plant cell, as described, for example, in WO 2004/090140.

3)含有編碼菸鹼醯胺腺嘌呤二核苷酸補救合成路徑之植物功能性酶(包括菸醯胺酶、菸鹼酸磷酸核糖轉移酶、菸鹼酸單核苷酸腺苷醯轉移酶、菸鹼醯胺腺嘌呤二核苷酸合成酶或菸鹼醯胺磷酸核糖轉移酶)之耐壓力性增強轉殖基因的植物,如例如EP 04077624.7、WO 2006/133827、PCT/EP07/002433、EP 1999263或WO 2007/107326中所述。 3) Plant functional enzymes (including nicotinamide, nicotinic acid phosphoribosyltransferase, nicotinic acid mononucleotide adenosine transferase, containing a nicotine indoleamine adenine dinucleotide rescue synthesis pathway, Plants that are resistant to stress-enhancing transgenic genes, such as, for example, EP 04077624.7, WO 2006/133827, PCT/EP07/002433, EP, of nicotine indoleamine adenine dinucleotide synthase or nicotine indole phosphoribosyltransferase) Said in 1999263 or WO 2007/107326.

亦可根據本發明處理之植物或植物栽培品種(藉由諸如遺傳工程改造之植物生物技術方法而獲得)顯示收穫產物之數量、品質及/或儲 存穩定性改變及/或收穫產物之特定成分之特性改變,諸如: Plants or plant cultivars (obtained by genetically engineered plant biotechnology methods) which can also be treated according to the invention show the quantity, quality and/or storage of harvested products Changes in the stability of the storage and/or changes in the characteristics of the specific components of the harvested product, such as:

1)合成改質澱粉之轉殖基因植物,該改質澱粉與野生型植物細胞或植物中之合成澱粉相比,其物理化學特徵(尤其直鏈澱粉含量或直鏈澱粉/支鏈澱粉比率、分枝程度、平均鏈長、側鏈分佈、黏度行為、膠凝強度、澱粉粒度及/或澱粉顆粒形態)改變,以使其更適合於特定應用。該等合成改質澱粉之轉殖基因植物揭示於例如EP 0571427、WO 95/04826、EP 0719338、WO 96/15248、WO 96/19581、WO 96/27674、WO 97/11188、WO 97/26362、WO 97/32985、WO 97/42328、WO 97/44472、WO 97/45545、WO 98/27212、WO 98/40503、WO99/58688、WO 99/58690、WO 99/58654、WO 00/08184、WO 00/08185、WO 00/08175、WO 00/28052、WO 00/77229、WO 01/12782、WO 01/12826、WO 02/101059、WO 03/071860、WO 2004/056999、WO 2005/030942、WO 2005/030941、WO 2005/095632、WO 2005/095617、WO 2005/095619、WO 2005/095618、WO 2005/123927、WO 2006/018319、WO 2006/103107、WO 2006/108702、WO 2007/009823、WO 00/22140、WO 2006/063862、WO 2006/072603、WO 02/034923、EP 06090134.5、EP 06090228.5、EP 06090227.7、EP 07090007.1、EP 07090009.7、WO 01/14569、WO 02/79410、WO 03/33540、WO 2004/078983、WO 01/19975、WO 95/26407、WO 96/34968、WO 98/20145、WO 99/12950、WO 99/66050、WO 99/53072、US 6,734,341、WO 00/11192、WO 98/22604、WO 98/32326、WO 01/98509、WO 01/98509、WO 2005/002359、US 5,824,790、US 6,013,861、WO 94/04693、WO 94/09144、WO 94/11520、WO 95/35026、WO 97/20936中。 1) Synthetic modified starch transgenic plant having physical and chemical characteristics (especially amylose content or amylose/amylopectin ratio, compared with synthetic starch in wild type plant cells or plants, The degree of branching, average chain length, side chain distribution, viscosity behavior, gel strength, starch particle size, and/or starch particle morphology are altered to make it more suitable for a particular application. Transgenic plants of such synthetically modified starches are disclosed, for example, in EP 0571427, WO 95/04826, EP 0719338, WO 96/15248, WO 96/19581, WO 96/27674, WO 97/11188, WO 97/26362, WO 97/32985, WO 97/42328, WO 97/44472, WO 97/45545, WO 98/27212, WO 98/40503, WO 99/58688, WO 99/58690, WO 99/58654, WO 00/08184, WO 00/08185, WO 00/08175, WO 00/28052, WO 00/77229, WO 01/12782, WO 01/12826, WO 02/101059, WO 03/071860, WO 2004/056999, WO 2005/030942, WO 2005/030941, WO 2005/095632, WO 2005/095617, WO 2005/095619, WO 2005/095618, WO 2005/123927, WO 2006/018319, WO 2006/103107, WO 2006/108702, WO 2007/009823, WO 00/22140, WO 2006/063862, WO 2006/072603, WO 02/034923, EP 06090134.5, EP 06090228.5, EP 06090227.7, EP 07090007.1, EP 07090009.7, WO 01/14569, WO 02/79410, WO 03/33540, WO 2004/078983, WO 01/19975, WO 95/26407, WO 96/34968, WO 98/20145, WO 99/12950, WO 99/66050, WO 99/53072, US 6,734, 341, WO 00/11192, WO 98/ 22604, WO 98/32326, WO 01/98509, WO 01/98509, WO 2005/002359, US 5, 824, 790, US 6, 013, 861, WO 94/04693, WO 94/09144, WO 94/11520, WO 95/35026, WO 97/20936.

2)合成非澱粉碳水化合物聚合物或合成與無遺傳修飾之野生型植 物相比特性改變之非澱粉碳水化合物聚合物的轉殖基因植物。實例為產生多聚果糖、尤其菊糖及聚左糖型多聚果糖之植物,如EP 0663956、WO 96/01904、WO 96/21023、WO 98/39460及WO 99/24593中所揭示;產生α-1,4-葡聚糖之植物,如WO 95/31553、US 2002031826、US 6,284,479、US 5,712,107、WO 97/47806、WO 97/47807、WO 97/47808及WO 00/14249中所揭示;產生α-1,6分支鏈α-1,4-葡聚糖之植物,如WO 00/73422中所揭示;產生環狀四糖(alternan)之植物,如例如WO 00/47727、WO 00/73422、EP 06077301.7、US 5,908,975及EP 0728213中所揭示。 2) Synthesis of non-starch carbohydrate polymers or synthetic and non-genetically modified wild-type plants A transgenic plant of a non-starch carbohydrate polymer having altered properties compared to a compound. Examples are plants which produce polyfructose, in particular inulin and polydextrose-type polyfructose, as disclosed in EP 0 663 956, WO 96/01904, WO 96/21023, WO 98/39460 and WO 99/24593; a plant of 1,4-glucan, as disclosed in WO 95/31553, US 2002031826, US 6,284,479, US 5,712,107, WO 97/47806, WO 97/47807, WO 97/47808, and WO 00/14249; A plant having an alpha-1,6 branched alpha-1,4-glucan, as disclosed in WO 00/73422; a plant producing a cyclical tetrasaccharide, such as, for example, WO 00/47727, WO 00/73422 , as disclosed in EP 06077301.7, US 5,908,975 and EP 0728213.

3)產生透明質酸之轉殖基因植物,如例如WO 2006/032538、WO 2007/039314、WO 2007/039315、WO 2007/039316、JP 2006304779及WO 2005/012529中所揭示。 3) A transgenic plant that produces hyaluronic acid, as disclosed in, for example, WO 2006/032538, WO 2007/039314, WO 2007/039315, WO 2007/039316, JP 2006304779, and WO 2005/012529.

4)轉殖基因植物或雜交植物,諸如具有諸如『高可溶性固體含量』、『低刺激性』(LP)及/或『長儲存期』(LS)之特徵的洋蔥,如美國專利申請案第12/020,360號及第61/054,026號中所述。 4) a transgenic plant or a hybrid plant, such as an onion having characteristics such as "highly soluble solid content", "low irritancy" (LP) and/or "long shelf life" (LS), such as US Patent Application No. As described in 12/020,360 and 61/054,026.

亦可根據本發明處理之植物或植物栽培品種(其可藉由諸如遺傳工程改造之植物生物技術方法而獲得)為纖維特徵改變之植物,諸如棉花植物。該等植物可藉由遺傳轉化或藉由選擇含有賦予該等改變之纖維特徵之突變的植物而獲得,且該等植物包括: Plants or plant cultivars (which may be obtained by genetic engineering engineering plant biotechnology methods) which may also be treated according to the invention are plants having altered fiber characteristics, such as cotton plants. Such plants can be obtained by genetic transformation or by selecting plants containing mutations that confer such altered fiber characteristics, and such plants include:

a)含有纖維素合成酶基因之改變形式的植物,諸如棉花植物,如WO 98/00549中所述。 a) A plant containing an altered form of the cellulase synthase gene, such as a cotton plant, as described in WO 98/00549.

b)含有rsw2或rsw3同源核酸之改變形式的植物,諸如棉花植物,如WO 2004/053219中所述。 b) Plants containing altered forms of rsw2 or rsw3 homologous nucleic acids, such as cotton plants, as described in WO 2004/053219.

c)蔗糖磷酸合成酶之表現增加的植物,諸如棉花植物,如WO 01/17333中所述。 c) Plants with increased expression of sucrose phosphate synthase, such as cotton plants, as described in WO 01/17333.

d)蔗糖合成酶之表現增加的植物,諸如棉花植物,如WO 02/45485中所述。 d) plants with increased expression of sucrose synthase, such as cotton plants, such as WO Said in 02/45485.

e)其中基於纖維細胞之細胞間絲選通之時序例如經纖維選擇性β-1,3-葡聚糖酶下調而改變的植物,諸如棉花植物,如WO 2005/017157中所述或如EP 08075514.3或美國專利申請案第61/128,938號中所述。 e) a plant in which the timing of fibroblast-based intercellular filament gating is changed, for example, by a fiber-selective β-1,3-glucanase down-regulation, such as a cotton plant, as described in WO 2005/017157 or as EP 08075514.3 or U.S. Patent Application Serial No. 61/128,938.

f)具有例如經N-乙醯葡萄糖胺轉移酶基因(包括nodC及甲殼素合成酶基因)之表現而使反應性改變之纖維的植物,諸如棉花植物,如WO 2006/136351中所述。 f) A plant having, for example, a fiber which undergoes a change in reactivity by the performance of an N-acetylglucosamine transferase gene (including the nodC and chitin synthase genes), as described in WO 2006/136351.

亦可根據本發明處理之植物或植物栽培品種(其可藉由諸如遺傳工程改造之植物生物技術方法而獲得)為油型態特徵改變之植物,諸如蕓薹(oilseed rape)或相關蕓薹屬植物。該等植物可藉由遺傳轉化或藉由選擇含有賦予該等改變之油型態特徵之突變的植物而獲得,且該等植物包括: Plants or plant cultivars (which may be obtained by genetic engineering engineering plant biotechnology methods) which are also treated according to the invention are plants which have altered oil profile, such as oilseed rape or related genus plant. Such plants can be obtained by genetic transformation or by selection of plants containing mutations that confer such altered oil profile characteristics, and such plants include:

a)產生具有高油酸含量之油的植物,諸如蕓薹植物,如例如US 5,969,169、US 5,840,946或US 6,323,392或US 6,063,947中所述。 a) A plant which produces an oil having a high oleic acid content, such as a sorghum plant, as described in, for example, US 5,969,169, US 5,840,946 or US 6,323,392 or US 6,063,947.

b)產生具有低次亞麻油酸含量之油的植物,諸如蕓薹植物,如US 6,270,828、US 6,169,190或US 5,965,755中所述。 b) A plant which produces an oil having a low linoleic acid content, such as a sorghum plant, as described in US 6,270,828, US 6,169,190 or US 5,965,755.

c)產生具有低含量飽和脂肪酸之油的植物,諸如蕓薹植物,如例如美國專利第5,434,283號或美國專利申請案第12/668303號中所述。 c) A plant which produces an oil having a low content of a saturated fatty acid, such as a sorghum plant, as described in, for example, U.S. Patent No. 5,434,283 or U.S. Patent Application Serial No. 12/668,303.

亦可根據本發明處理之植物或植物栽培品種(其可藉由諸如遺傳工程改造之植物生物技術方法獲得)為落粒性特徵改變之植物,諸如蕓薹或相關蕓薹屬植物。該等植物可藉由遺傳轉化或藉由選擇含有賦予該等改變之落粒性特徵之突變的植物而獲得,且該等植物包括諸如具有延遲或減少之落粒性之蕓薹植物的植物,如美國專利申請案第61/135,230號、WO09/068313及WO10/006732中所述。 Plants or plant cultivars (which may be obtained by plant biotechnological methods such as genetic engineering) which may also be treated according to the invention are plants which have altered granulating characteristics, such as mites or related genus. Such plants may be obtained by genetic transformation or by selection of plants containing mutations conferring the altered shattering characteristics of such alterations, and such plants include plants such as plants having delayed or reduced shredding properties, It is described in U.S. Patent Application Serial No. 61/135,230, WO 09/068313, and WO 10/006732.

可根據本發明處理之尤其適用之轉殖基因植物為含有轉化事件或轉化事件組合之植物,其在美國為美國農業部(United States Department of Agriculture;USDA)之動植物衛生檢驗署(Animal and Plant Health Inspection Service;APHIS)的非管制狀態之申請主題,不論該等申請已有授權或仍在申請中。無論何時,此資訊均容易自APHIS(4700 River Road Riverdale,MD20737,USA)獲得,例如在其網際網路站點(URL http://www.aphis.usda.gov/brs/not_reg.html)上。在本申請案之申請日,與APHIS一起申請或由APHIS授權之非管制狀態之申請為表B中所列之申請,其含有以下資訊: A particularly suitable transgenic plant that can be treated in accordance with the present invention is a plant containing a combination of transformation events or transformation events, which is the United States Department of Agriculture (United States) Department of Agriculture; USDA) The subject matter of the non-regulated status of the Animal and Plant Health Inspection Service (APHIS), whether or not such application is authorized or still pending. This information is readily available from APHIS (4700 River Road Riverdale, MD20737, USA) at any time, for example on its Internet site (URL http://www.aphis.usda.gov/brs/not_reg.html) . On the filing date of this application, the application for non-regulated status with APHIS or authorized by APHIS is the application listed in Table B, which contains the following information:

- 申請:申請之識別編號。轉化事件之技術描述可參考此申請編號見於個別申請文件中,其可獲自APHIS,例如在APHIS網站上。此等描述以引用的方式併入本文中。 - Application: The identification number of the application. A technical description of the conversion event can be found in the individual application documents, which can be obtained from APHIS, for example on the APHIS website. These descriptions are incorporated herein by reference.

- 申請之擴展:參考要求擴展之前一申請。 - Extension of the application: Refer to the request to extend the previous application.

- 機構:提交申請之實體的名稱。 - Organization: The name of the entity submitting the application.

- 管制物品:相關植物物種。 - Controlled items: related plant species.

- 轉殖基因表型:由轉化事件向植物賦予之性狀。 - Transgenic gene phenotype: a trait that is imparted to a plant by a transformation event.

- 轉化事件或線路:要求非管制狀態之事件(有時亦稱為線路)之名稱。 - Conversion event or line: The name of an event (sometimes called a line) that requires an unregulated state.

- APHIS文件:與申請有關之由APHIS公開之各種文件,且其可受APHIS要求。 - APHIS documents: Various documents disclosed by APHIS related to the application, and which are subject to APHIS requirements.

含有單一轉化事件或轉化事件組合之其他尤其適用之植物列於例如各個國家或地區管制機構之資料庫中(參見例如http://gmoinfo.jrc.it/gmp_browse.aspx及http://www.agbios.com/dbase.php)。 Other particularly suitable plants containing a single conversion event or combination of conversion events are listed, for example, in a database of regulatory agencies in various countries or regions (see for example http://gmoinfo.jrc.it/gmp_browse.aspx and http://www. Agbios.com/dbase.php).

可根據本發明處理之尤其適用之轉殖基因植物為含有轉化事件或轉化事件組合之植物,且其列於例如各個國家或地區管制機構之資料庫中,包括事件1143-14A(棉花,昆蟲控制,未寄存,描述於WO 2006/128569中);事件1143-51B(棉花,昆蟲控制,未寄存,描述於 WO 2006/128570中);事件1445(棉花,耐除草劑,未寄存,描述於US-A 2002-120964或WO 02/034946中);事件17053(水稻,耐除草劑,寄存為PTA-9843,描述於WO 2010/117737中);事件17314(水稻,耐除草劑,寄存為PTA-9844,描述於WO 2010/117735中);事件281-24-236(棉花,昆蟲控制-耐除草劑,寄存為PTA-6233,描述於WO 2005/103266或US-A 2005-216969中);事件3006-210-23(棉花,昆蟲控制-耐除草劑,寄存為PTA-6233,描述於US-A 2007-143876或WO 2005/103266中);事件3272(玉米,品質性狀,寄存為PTA-9972,描述於WO 2006/098952或US-A 2006-230473中);事件40416(玉米,昆蟲控制-耐除草劑,寄存為ATCC PTA-11508,描述於WO 2011/075593中);事件43A47(玉米,昆蟲控制-耐除草劑,寄存為ATCC PTA-11509,描述於WO 2011/075595中);事件5307(玉米,昆蟲控制,寄存為ATCC PTA-9561,描述於WO 2010/077816中);事件ASR-368(翦股穎(bent grass),耐除草劑,寄存為ATCC PTA-4816,描述於US-A 2006-162007或WO 2004/053062中);事件B16(玉米,耐除草劑,未寄存,描述於US-A 2003-126634中);事件BPS-CV127-9(大豆,耐除草劑,寄存為NCIMB 41603號,描述於WO 2010/080829中);事件CE43-67B(棉花,昆蟲控制,寄存為DSM ACC2724,描述於US-A 2009-217423或WO2006/128573中);事件CE44-69D(棉花,昆蟲控制,未寄存,描述於US-A 2010-0024077中);事件CE44-69D(棉花,昆蟲控制,未寄存,描述於WO 2006/128571中);事件CE46-02A(棉花,昆蟲控制,未寄存,描述於WO 2006/128572中);事件COT102(棉花,昆蟲控制,未寄存,描述於US-A 2006-130175或WO 2004/039986中);事件COT202(棉花,昆蟲控制,未寄存,描述於US-A 2007-067868或WO 2005/054479中);事件COT203(棉花,昆蟲控制,未寄存,描述於WO 2005/054480中);事件DAS40278(玉米, 耐除草劑,寄存為ATCC PTA-10244,描述於WO 2011/022469中);事件DAS-59122-7(玉米,昆蟲控制-耐除草劑,寄存為ATCC PTA 11384,描述於US-A 2006-070139中);事件DAS-59132(玉米,昆蟲控制-耐除草劑,未寄存,描述於WO 2009/100188中);事件DAS68416(大豆,耐除草劑,寄存為ATCC PTA-10442,描述於WO 2011/066384或WO 2011/066360中);事件DP-098140-6(玉米,耐除草劑,寄存為ATCC PTA-8296,描述於US-A 2009-137395或WO 2008/112019中);事件DP-305423-1(大豆,品質性狀,未寄存,描述於US-A 2008-312082或WO 2008/054747中);事件DP-32138-1(玉米,雜交系統,寄存為ATCC PTA-9158,描述於US-A 2009-0210970或WO 2009/103049中);事件DP-356043-5(大豆,耐除草劑,寄存為ATCC PTA-8287,描述於US-A 2010-0184079或WO 2008/002872中);事件EE-1(茄子,昆蟲控制,未寄存,描述於WO 2007/091277中);事件FI117(玉米,耐除草劑,寄存為ATCC 209031,描述於US-A 2006-059581或WO 98/044140中);事件GA21(玉米,耐除草劑,寄存為ATCC 209033,描述於US-A 2005-086719或WO 98/044140中);事件GG25(玉米,耐除草劑,寄存為ATCC 209032,描述於US-A 2005-188434或WO 98/044140中);事件GHB119(棉花,昆蟲控制-耐除草劑,寄存為ATCC PTA-8398,描述於WO 2008/151780中);事件GHB614(棉花,耐除草劑,寄存為ATCC PTA-6878,描述於US-A 2010-050282或WO 2007/017186中);事件GJ11(玉米,耐除草劑,寄存為ATCC 209030,描述於US-A 2005-188434或WO 98/044140中);事件GM RZ13(甜菜,抗病毒,寄存為NCIMB-41601,描述於WO 2010/076212中);事件H7-1(甜菜,耐除草劑,寄存為NCIMB 41158或NCIMB 41159,描述於US-A 2004-172669或WO 2004/074492中);事件JOPLIN1(小麥,耐疾病,未寄存,描述於US-A 2008-064032 中);事件LL27(大豆,耐除草劑,寄存為NCIMB41658,描述於WO 2006/108674或US-A 2008-320616中);事件LL55(大豆,耐除草劑,寄存為NCIMB 41660,描述於WO 2006/108675或US-A 2008-196127中);事件LLcotton25(棉花,耐除草劑,寄存為ATCC PTA-3343,描述於WO 03/013224或US-A 2003-097687中);事件LLRICE06(水稻,耐除草劑,寄存為ATCC-23352,描述於US 6,468,747或WO 00/026345中);事件LLRICE601(水稻,耐除草劑,寄存為ATCC PTA-2600,描述於US-A 2008-2289060或WO 00/026356中);事件LY038(玉米,品質性狀,寄存為ATCC PTA-5623,描述於US-A 2007-028322或WO 2005/061720中);事件MIR162(玉米,昆蟲控制,寄存為PTA-8166,描述於US-A 2009-300784或WO 2007/142840中);事件MIR604(玉米,昆蟲控制,未寄存,描述於US-A 2008-167456或WO 2005/103301中);事件MON15985(棉花,昆蟲控制,寄存為ATCC PTA-2516,描述於US-A 2004-250317或WO 02/100163中);事件MON810(玉米,昆蟲控制,未寄存,描述於US-A 2002-102582中);事件MON863(玉米,昆蟲控制,寄存為ATCC PTA-2605,描述於WO 2004/011601或US-A 2006-095986中);事件MON87427(玉米,授粉控制,寄存為ATCC PTA-7899,描述於WO 2011/062904中);事件MON87460(玉米,耐壓力,寄存為ATCC PTA-8910,描述於WO 2009/111263或US-A 2011-0138504中);事件MON87701(大豆,昆蟲控制,寄存為ATCC PTA-8194,描述於US-A 2009-130071或WO 2009/064652中);事件MON87705(大豆,品質性狀-耐除草劑,寄存為ATCC PTA-9241,描述於US-A 2010-0080887或WO 2010/037016中);事件MON87708(大豆,耐除草劑,寄存為ATCC PTA9670,描述於WO 2011/034704中);事件MON87754(大豆,品質性狀,寄存為ATCC PTA-9385,描述於WO 2010/024976中);事件MON87769(大豆,品質性狀,寄存為 ATCC PTA-8911,描述於US-A 2011-0067141或WO 2009/102873中);事件MON88017(玉米,昆蟲控制-耐除草劑,寄存為ATCC PTA-5582,描述於US-A 2008-028482或WO 2005/059103中);事件MON88913(棉花,耐除草劑,寄存為ATCC PTA-4854,描述於WO 2004/072235或US-A 2006-059590中);事件MON89034(玉米,昆蟲控制,寄存為ATCC PTA-7455,描述於WO 2007/140256或US-A 2008-260932中);事件MON89788(大豆,耐除草劑,寄存為ATCC PTA-6708,描述於US-A 2006-282915或WO 2006/130436中);事件MS11(蕓薹,授粉控制-耐除草劑,寄存為ATCC PTA-850或PTA-2485,描述於WO 01/031042中);事件MS8(蕓薹,授粉控制-耐除草劑,寄存為ATCC PTA-730,描述於WO 01/041558或US-A 2003-188347中);事件NK603(玉米,耐除草劑,寄存為ATCC PTA-2478,描述於US-A 2007-292854中);事件PE-7(水稻,昆蟲控制,未寄存,描述於WO 2008/114282中);事件RF3(蕓薹,授粉控制-耐除草劑,寄存為ATCC PTA-730,描述於WO 01/041558或US-A 2003-188347中);事件RT73(蕓薹,耐除草劑,未寄存,描述於WO 02/036831或US-A 2008-070260中);事件T227-1(甜菜,耐除草劑,未寄存,描述於WO 02/44407或US-A 2009-265817中);事件T25(玉米,耐除草劑,未寄存,描述於US-A 2001-029014或WO 01/051654中);事件T304-40(棉花,昆蟲控制-耐除草劑,寄存為ATCC PTA-8171,描述於US-A 2010-077501或WO 2008/122406中);事件T342-142(棉花,昆蟲控制,未寄存,描述於WO 2006/128568中);事件TC1507(玉米,昆蟲控制-耐除草劑,未寄存,描述於US-A 2005-039226或WO 2004/099447中);事件VIP1034(玉米,昆蟲控制-耐除草劑,寄存為ATCC PTA-3925.,描述於WO 03/052073中);事件32316(玉米,昆蟲控制-耐除草劑,寄存為PTA-11507,描述於WO 2011/084632中);事 件4114(玉米,昆蟲控制-耐除草劑,寄存為PTA-11506,描述於WO 2011/084621中)。 Plants that are particularly suitable for treatment according to the present invention are plants containing a combination of transformation events or transformation events, and are listed, for example, in a database of regulatory agencies of various countries or regions, including event 1143-14A (cotton, insect control). , not registered, described in WO 2006/128569); event 1143-51B (cotton, insect control, unregistered, described in WO 2006/128570); event 1445 (cotton, herbicide tolerant, unregistered, described in US-A 2002-120964 or WO 02/034946); event 17053 (rice, herbicide tolerant, deposited as PTA-9843, Described in WO 2010/117737); event 17314 (rice, herbicide tolerant, deposited as PTA-9844, described in WO 2010/117735); event 281-24-236 (cotton, insect control - herbicide tolerant, deposited Is PTA-6233, described in WO 2005/103266 or US-A 2005-216969); Event 3006-210-23 (cotton, insect control - herbicide tolerant, deposited as PTA-6233, described in US-A 2007- 143876 or WO 2005/103266); event 3272 (corn, quality traits, deposited as PTA-9972, described in WO 2006/098952 or US-A 2006-230473); event 40416 (corn, insect control - herbicide tolerant) , registered as ATCC PTA-11508, described in WO 2011/075593); event 43A47 (corn, insect control - herbicide tolerant, deposited as ATCC PTA-11509, described in WO 2011/075595); event 5307 (corn, Insect control, deposited as ATCC PTA-9561, described in WO 2010/077816); Event ASR-368 (bent grass, herbicide tolerant, deposited as ATCC PTA-4816, described in US-A 2006-162007 or WO 2004/053062); Event B16 (corn, herbicide tolerant, not deposited, described in US-A 2003-126634); Event BPS-CV127-9 (Soybean, herbicide tolerant, deposited as NCIMB 41603, described in WO 2010/080829); Event CE43-67B (cotton, insect control, deposited as DSM ACC2724, as described in US-A 2009-217423 or WO2006/128573 Event CE44-69D (cotton, insect control, unregistered, described in US-A 2010-0024077); event CE44-69D (cotton, insect control, unregistered, described in WO 2006/128571); event CE46 -02A (cotton, insect control, unregistered, described in WO 2006/128572); event COT 102 (cotton, insect control, unregistered, described in US-A 2006-130175 or WO 2004/039986); event COT202 ( Cotton, insect control, unregistered, described in US-A 2007-067868 or WO 2005/054479); event COT203 (cotton, insect control, unregistered, described in WO 2005/054480); event DAS 40278 (corn, Herbicide tolerant, deposited as ATCC PTA-10244, described in WO 2011/022469); Event DAS-59122-7 (corn, insect control - herbicide tolerant, deposited as ATCC PTA 11384, described in US-A 2006-070139 Event) DAS-59132 (corn, insect control - herbicide tolerant, not deposited, as described in WO 2009/100188); event DAS68416 (soybean, herbicide tolerant, deposited as ATCC PTA-10442, described in WO 2011/ 066384 or WO 2011/066360); event DP-098140-6 (corn, herbicide tolerant, deposited as ATCC PTA-8296, as described in US-A 2009-137395 or WO 2008/112019); event DP-305423- 1 (soybean, quality traits, not deposited, as described in US-A 2008-312082 or WO 2008/054747); event DP-32138-1 (corn, hybrid system, deposited as ATCC PTA-9158, described in US-A 2009-0210970 or WO 2009/103049); event DP-356043-5 (soybean, herbicide tolerant, deposited as ATCC PTA-8287, described in US-A 2010-0184079 or WO 2008/002872); event EE- 1 (eggplant, insect control, unregistered, described in WO 2007/091277); event FI117 (corn, herbicide tolerant, deposited as ATCC 209031, described in US-A 2006-05 Event 921 or WO 98/044140); event GA21 (corn, herbicide tolerant, deposited as ATCC 209033, described in US-A 2005-086719 or WO 98/044140); event GG25 (corn, herbicide tolerant, deposited as ATCC 209032, described in US-A 2005-188434 or WO 98/044140); event GHB119 (cotton, insect control - herbicide tolerant, deposited as ATCC PTA-8398, described in WO 2008/151780); event GHB614 ( Cotton, herbicide tolerant, deposited as ATCC PTA-6878, as described in US-A 2010-050282 or WO 2007/017186); Event GJ11 (corn, herbicide tolerant, deposited as ATCC 209030, described in US-A 2005- 188434 or WO 98/044140); event GM RZ13 (beet, anti-viral, deposited as NCIMB-41601, described in WO 2010/076212); event H7-1 (beet, herbicide tolerant, deposited as NCIMB 41158 or NCIMB 41159, described in US-A 2004-172669 or WO 2004/074492); event JOPLIN1 (wheat, disease-resistant, unregistered, described in US-A 2008-064032 Event LL27 (soybean, herbicide tolerant, deposited as NCIMB 41658, described in WO 2006/108674 or US-A 2008-320616); event LL55 (soybean, herbicide tolerant, deposited as NCIMB 41660, described in WO 2006 /108675 or US-A 2008-196127); event LLcotton 25 (cotton, herbicide tolerant, deposited as ATCC PTA-3343, described in WO 03/013224 or US-A 2003-097687); event LLRICE06 (rice, resistant Herbicide, deposited as ATCC-23352, described in US 6,468,747 or WO 00/026345); Event LLRICE 601 (rice, herbicide tolerant, deposited as ATCC PTA-2600, as described in US-A 2008-2289060 or WO 00/026356 Event LY038 (corn, quality traits, deposited as ATCC PTA-5623, described in US-A 2007-028322 or WO 2005/061720); event MIR162 (corn, insect control, deposited as PTA-8166, described in US-A 2009-300784 or WO 2007/142840); event MIR604 (corn, insect control, unregistered, described in US-A 2008-167456 or WO 2005/103301); event MON15985 (cotton, insect control, deposit) For ATCC PTA-2516, described in US-A 2004-250317 or WO 02/100163); event MON810 (corn, Kun Insect control, not registered, described in US-A 2002-102582); event MON863 (corn, insect control, deposited as ATCC PTA-2605, described in WO 2004/011601 or US-A 2006-095986); event MON87427 (Maize, pollination control, deposited as ATCC PTA-7899, described in WO 2011/062904); Event MON87460 (corn, stress resistant, deposited as ATCC PTA-8910, as described in WO 2009/111263 or US-A 2011-0138504 Event) MON87701 (soybean, insect control, deposited as ATCC PTA-8194, described in US-A 2009-130071 or WO 2009/064652); event MON87705 (soybean, quality traits - herbicide tolerant, deposited as ATCC PTA -9241, described in US-A 2010-0080887 or WO 2010/037016); event MON87708 (soybean, herbicide tolerant, deposited as ATCC PTA9670, described in WO 2011/034704); event MON87754 (soybean, quality trait, Deposited as ATCC PTA-9385, described in WO 2010/024976); Event MON87769 (soybean, quality traits, deposited as ATCC PTA-8911, described in US-A 2011-0067141 or WO 2009/102873); event MON88017 (corn, insect control - herbicide tolerant, deposited as ATCC PTA-5582, described in US-A 2008-028482 or WO 2005/059103); event MON88913 (cotton, herbicide tolerant, deposited as ATCC PTA-4854, described in WO 2004/072235 or US-A 2006-059590); event MON89034 (corn, insect control, deposited as ATCC PTA) -7455, described in WO 2007/140256 or US-A 2008-260932); event MON89788 (soybean, herbicide tolerant, deposited as ATCC PTA-6708, as described in US-A 2006-282915 or WO 2006/130436) Event MS11 (芸薹, pollination control - herbicide tolerant, deposited as ATCC PTA-850 or PTA-2485, described in WO 01/031042); event MS8 (芸薹, pollination control - herbicide tolerant, deposited as ATCC) PTA-730, described in WO 01/041558 or US-A 2003-188347); event NK603 (corn, herbicide tolerant, deposited as ATCC PTA-2478, described in US-A 2007-292854); event PE- 7 (rice, insect control, unregistered, described in WO 2008/114282); event RF3 (芸薹, pollination control - herbicide tolerant, deposited as ATCC PTA-730 Described in WO 01/041558 or US-A 2003-188347); event RT73 (芸薹, herbicide tolerant, not registered, described in WO 02/036831 or US-A 2008-070260); event T227-1 ( Beet, herbicide tolerant, not deposited, as described in WO 02/44407 or US-A 2009-265817; Event T25 (corn, herbicide tolerant, not deposited, as described in US-A 2001-029014 or WO 01/051654 Medium); Event T304-40 (cotton, insect control - herbicide tolerant, deposited as ATCC PTA-8171, described in US-A 2010-077501 or WO 2008/122406); event T342-142 (cotton, insect control, Unregistered, described in WO 2006/128568); Event TC1507 (corn, insect control - herbicide tolerant, not deposited, as described in US-A 2005-039226 or WO 2004/099447); event VIP1034 (corn, insect control) - herbicide tolerant, deposited as ATCC PTA-3925., described in WO 03/052073); event 32316 (corn, insect control - herbicide tolerant, deposited as PTA-11507, described in WO 2011/084632); Section 4114 (corn, insect control - herbicide tolerant, registered as PTA-11506, described in WO 2011/084621).

在可用本發明方法控制之植物或作物疾病中,可提及:白粉病(powdery mildew disease),諸如:例如由禾本科布氏白粉菌(Blumeria graminis)引起之小麥白粉病(Blumeria disease);例如由白叉絲單囊殼菌(Podosphaera leucotricha)引起之蘋果白粉病(Podosphaera disease);例如由單絲殼白粉菌(Sphaerotheca fuliginea)引起之瓜類白粉病(Sphaerotheca disease);例如由葡萄白粉病菌(Uncinula necator)引起之葡萄白粉病(Uncinula disease);銹病(rust disease),諸如:例如由圓柏梨銹病菌(Gymnosporangium sabinae)引起之梨銹病(Gymnosporangium disease);例如由咖啡駝孢鏽菌(Hemileia vastatrix)引起之咖啡銹病(Hemileia disease);例如由大豆鏽菌(Phakopsora pachyrhizi)或層鏽層假尾孢菌(Phakopsora meibomiae)引起之層鏽菌屬病(Phakopsora disease);例如由隱匿柄鏽菌(Puccinia recondite)、禾柄鏽菌(Puccinia graminis)或條形柄鏽菌(Puccinia striiformis)引起之柄鏽菌屬病(Puccinia disease);例如由菜豆銹病菌(Uromyces appendiculatus)引起之菜豆銹病(Uromyces disease);卵菌綱病(oomycete disease),諸如:例如由白鏽菌(Albugo candida)引起之白銹病(Albugo disease); 例如由萵苣露菌病菌(Bremia lactucae)引起之露菌病(Bremia disease);例如由豌豆霜黴菌(Peronospora pisi)或蕓薹根腫菌(P.brassicae)引起之霜黴病(Peronospora disease);例如由番茄晚疫病菌(Phytophthora infestans)引起之疫黴病(Phytophthora disease);例如由葡萄生單軸黴菌(Plasmopara viticola)引起之單軸黴病(Plasmopara disease);例如由葎草假霜黴菌(Pseudoperonospora humuli)或古巴假霜黴菌(Pseudoperonospora cubensis)引起之假霜黴病(Pseudoperonospora disease);例如由終極腐黴菌(Pythium ultimum)引起之腐黴菌病(Pythium disease);葉斑病(leafspot disease)、葉皰病(leaf blotch disease)及葉枯病(leaf blight disease),諸如:例如由番茄早疫病菌(Alternaria solani)引起之鏈格孢菌病(Alternaria disease);例如由甜菜尾孢菌(Cercospora beticola)引起之尾孢菌病(Cercospora disease);例如由黃瓜黑星病菌(Cladiosporium cucumerinum)引起之黑星病(Cladiosporum disease);例如由禾旋孢腔菌(Cochliobolus sativus)(分生孢子形式(Conidiaform):內臍蠕孢屬(Drechslera),同義名:長蠕孢屬(Helminthosporium))或宮部旋孢腔菌(Cochliobolus miyabeanus)引起之旋孢腔菌病(Cochliobolus disease);例如由菜豆炭疽病菌(Colletotrichum lindemuthanium)引起之炭疽 病(Colletotrichum disease);例如由油橄欖孔雀斑病菌(Cycloconium oleaginum)引起之孔雀斑病(Cycloconium disease);例如由柑桔黑點病菌(Diaporthe citri)引起之黑點病(Diaporthe disease);例如由柑桔痂囊腔菌(Elsinoe fawcettii)引起之痂囊腔菌病(Elsinoe disease);例如由桃炭疽病菌(Gloeosporium laeticolor)引起之炭疽病(Gloeosporium disease);例如由葡萄晚腐病菌(Glomerella cingulata)引起之晚腐病(Glomerella disease);例如由葡萄球座菌(Guignardia bidwelli)引起之球座菌病(Guignardia disease);例如由十字花科小球腔菌(Leptosphaeria maculans)、穎枯殼小球腔菌(Leptosphaeria nodorum)引起之小球腔菌病(Leptosphaeria disease);例如由稻瘟病菌(Magnaporthe grisea)引起之稻瘟病(Magnaporthe disease);例如由禾生球腔菌(Mycosphaerella graminicola)、落花生球腔菌(Mycosphaerella arachidicola)、斐濟球腔菌(Mycosphaerella fijiensis)引起之球腔菌病(Mycosphaerella disease);例如由小麥穎枯病菌(Phaeosphaeria nodorum)引起之穎枯病(Phaeosphaeria disease);例如由圓核腔菌(Pyrenophora teres)或偃麥草核腔菌(Pyrenophora tritici repentis)引起之核腔菌病(Pyrenophora disease);例如由克樂希柱隔孢菌(Ramularia collocygni)或白斑柱隔孢菌 (Ramularia areola)引起之柱隔孢病(Ramularia disease);例如由大麥雲紋病菌(Rhynchosporium secalis)引起之雲紋病(Rhynchosporium disease);例如由芹菜小殼針孢菌(Septoria apii)或番茄殼針孢菌(Septoria lycopercisi)引起之殼針孢病(Septoria disease);例如由肉孢核瑚菌(Typhula incarnata)引起之灰色雪腐病(Typhula disease);例如由蘋果黑星病菌(Venturia inaequalis)引起之黑星病(Venturia disease);根、鞘及莖幹病,諸如:例如由禾穀伏革菌(Corticium graminearum)引起之伏革菌病(Corticium disease);例如由尖孢鐮孢菌(Fusarium oxysporum)引起之鐮孢菌病(Fusarium disease);例如由禾頂囊殼菌(Gaeumannomyces graminis)引起之頂囊殼病(Gaeumannomyces disease);例如由立枯絲核菌(Rhizoctonia solani)引起之絲核菌病(Rhizoctonia disease);例如由稻帚枝黴(Sarocladium oryzae)引起之葉鞘腐敗病(Sarocladium disease);例如由稻褐色桿腐病菌(Sclerotium oryzae)引起之菌核病(Sclerotium disease);例如由針形眼紋病菌(Tapesia acuformis)引起之眼紋病(Tapesia disease);例如由菸草根腐病菌(Thielaviopsis basicola)引起之根腐病(Thielaviopsis disease); 穗及圓錐花序病,諸如:例如由鏈格孢菌屬(Alternaria spp.)引起之鏈格孢病;例如由黃麯黴(Aspergillus flavus)引起之麯黴病(Aspergillus disease);例如由枝孢菌屬(Cladosporium spp.)引起之芽枝黴病(Cladosporium disease);例如由麥角菌(Claviceps purpurea)引起之麥角菌病(Claviceps disease);例如由黃色鐮孢菌(Fusarium culmorum)引起之鐮孢菌病;例如由玉蜀黍赤黴(Gibberella zeae)引起之赤黴菌病(Gibberella disease);例如由小麥雪黴葉枯病菌(Monographella nivalis)引起之雪黴葉枯病(Monographella disease);黑穗病(smut disease)及腥黑穗病(bunt disease),諸如:例如由高粱絲黑穗菌(Sphacelotheca reiliana)引起之絲黑穗病(Sphacelotheca disease);例如由小麥網腥黑穗病菌(Tilletia caries)引起之腥黑穗病(Tilletia disease);例如由黑麥桿黑穗病菌(Urocystis occulta)引起之黑穗病(Urocystis disease);例如由大麥散黑穗病菌(Ustilago nuda)引起之黑穗病(Ustilago disease);果腐病(fruit rot disease)及黴病(mould disease),諸如:例如由黃麯黴引起之麯黴病;例如由灰葡萄孢菌(Botrytis cinerea)引起之灰黴病(Botrytis disease); 例如由擴展青黴(Penicillium expansum)引起之青黴病(Penicillium disease);例如由匍枝根黴(Rhizopus stolonifer)引起之根黴病(Rhizopus disease);例如由核盤菌(Sclerotinia sclerotiorum)引起之核盤菌病(Sclerotinia disease);例如由黃萎輪枝黴(Verticilium alboatrum)引起之輪枝孢病(Verticilium disease);種子及土壤帶有之腐敗病、黴病、萎蔫病、枯病及猝倒病:例如由蕓薹鏈格孢菌(Alternaria brassicicola)引起之鏈格孢菌病;例如由豌豆絲囊黴(Aphanomyces euteiches)引起之絲囊黴病(Aphanomyces disease);例如由兵豆殼二孢(Ascochyta lentis)引起之殼二孢病(Ascochyta disease);例如由黃麯黴引起之麯黴病;例如由多主枝孢(Cladosporium herbarum)引起之枝孢菌病(Cladosporium disease);例如由禾旋孢腔菌引起之旋孢腔菌病;(分生孢子形式:內臍蠕孢屬、平臍蠕孢屬(Bipolaris),同義名:長蠕孢屬);例如由辣椒炭疽病菌(Colletotrichum coccodes)引起之炭疽病;例如由黃色鐮孢菌引起之鐮孢菌病;例如由玉蜀黍赤黴引起之赤黴菌病;例如由菜豆殼球孢菌(Macrophomina phaseolina)引起之殼球孢病(Macrophomina disease); 例如由小麥雪黴葉枯病菌(Monographella nivalis)引起之雪黴葉枯病(Monographella disease);例如由擴展青黴引起之青黴病;例如由甘藍莖點黴(Phoma lingam)引起之莖點黴病(Phoma disease);例如由大豆擬莖點黴(Phomopsis sojae)引起之擬莖點黴病(Phomopsis disease);例如由惡疫黴(Phytophthora cactorum)引起之疫黴病(Phytophthora disease);例如由麥類核腔菌(Pyrenophora graminea)引起之核腔菌病;例如由稻梨孢菌(Pyricularia oryzae)引起之梨孢病(Pyricularia disease);例如由終極腐黴菌引起之腐黴菌病;例如由立枯絲核菌引起之絲核菌病;例如由米根黴(Rhizopus oryzae)引起之根黴病;例如由齊整小核菌(Sclerotium rolfsii)引起之菌核病(Sclerotium disease);例如由穎枯殼針孢(Septoria nodorum)引起之殼針孢病;例如由肉孢核瑚菌(Typhula incarnata)引起之灰色雪腐病;例如由大麗輪枝菌(Verticillium dahliae)引起之輪枝菌病(Verticillium disease);潰瘍病(canker disease)、叢枝病(broom disease)及頂枯病(dieback disease),諸如:例如由仁果癌叢赤殼菌(Nectria galligena)引起之叢赤殼病(Nectria disease);枯萎病(blight disease),諸如: 例如由核果鏈核盤菌(Monilinia laxa)引起之鏈核盤菌病(Monilinia disease);葉皰病(leaf blister disease)或縮葉病(leaf curl disease),諸如:例如由壞損外擔菌(Exobasidium vexans)引起之外擔菌病(Exobasidium disease);例如由畸形外囊菌(Taphrina deformans)引起之外囊菌病(Taphrina disease);木本植物之衰退病(decline disease),諸如:例如由厚垣普奇尼亞菌(Phaemoniella clamydospora)引起之埃斯卡病(Esca disease);例如由側彎孢菌(Eutypa lata)引起之葡萄頂枯病(Eutypa dyeback);例如由狹長孢靈芝(Ganoderma boninense)引起之靈芝病(Ganoderma disease);例如由木硬孔菌(Rigidoporus lignosus)引起之硬孔菌病(Rigidoporus disease);花及種子疾病,諸如:例如由灰葡萄孢菌引起之灰黴病;塊莖疾病,諸如:例如由立枯絲核菌引起之絲核菌病;例如由茄長蠕孢(Helminthosporium solani)引起之長蠕孢病(Helminthosporium disease);根腫病(club root disease),諸如:例如由蕓薹根腫菌(Plamodiophora brassicae)引起之根腫病(Plasmodiophora disease);由細菌生物體引起之疾病,該等細菌生物體為諸如: 黃單胞菌屬(Xanthomonas species),例如水稻白葉枯病菌(Xanthomonas campestris pv.oryzae);假單胞菌屬(Pseudomonas species),例如甜瓜細菌性葉斑病菌(Pseudomonas syringae pv.lachrymans);歐文氏菌屬(Erwinia species),例如解澱粉歐文氏菌(Erwinia amylovora)。 Among the plant or crop diseases which can be controlled by the method of the invention, mention may be made of: powdery mildew disease, such as, for example, Blumeria disease caused by Blumeria graminis ; for example Podosphaera disease caused by Podosphaera leucotricha ; for example, Sphaerotheca disease caused by Sphaerotheca fuliginea ; for example, by grape powdery mildew ( Uncinula disease caused by Uncinula necator ; rust disease such as, for example, Gymnosporangium disease caused by Gymnosporangium sabinae ; for example, Hemileia "Hamatiaia disease" caused by vastatrix ; for example, Phakopsora pachyrhizi or Phakopsora meibomiae caused by Phakopsora disease; for example, Puccinia serrata ( Puccinia recondite ), Puccinia graminis or Puccinia striiformi s ) caused by Puccinia disease; for example, Uromyces disease caused by Uromyces appendiculatus ; oomycete disease, such as, for example, white rust ( Albugo) Albugo disease caused by candida ; for example, Bremia disease caused by Bremia lactucae ; for example, by Peony downy mildew ( Peronospora pisi ) or Rhizoctonia solani ( P. brassicae) Peronospora disease; for example, Phytophthora disease caused by Phytophthora infestans ; for example, Plasmopara caused by Plasmopara viticola ( Plasmopara ) Disease; for example, Pseudoperonospora disease caused by Pseudoperonospora humuli or Pseudoperonospora cubensis ; for example, Pythium caused by Pythium ultimum (Pythium) Disease); leaf spot disease, leaf blotch disease, and leaf blight disease, such as: As indicated by Alternaria solani (Alternaria solani) causes the tenuis disease (Alternaria disease); for example, due to the beet Cercospora (Cercospora beticola) Cercospora disease (Cercospora disease); for example cucumerinum ( Cladiosporum cucumerinum caused by Cladiosporum disease; for example, Cochliobolus sativus (Conidiaform): Drechslera, synonym: Helminthosporium Helminthosporium)) or Cochliobolus disease caused by Cochliobolus miyabeanus ; for example, Colletotrichum disease caused by Colletotrichum lindemuthanium ; for example, from olive oil peafew Cycloconium disease caused by Cycloconium oleaginum; for example, Diaporthe disease caused by Diaporthe citri ; for example, sac caused by Elsinoe fawcettii Elsinoe disease; for example, anthracnose caused by Gloeosporium laeticolor ( Gloeospo ) Rium disease); for example, Glomerella disease caused by Glomerella cingulata ; for example, Guignardia disease caused by Guignardia bidwelli ; for example, from cruciferae Leptosphaeria maculans , Leptosphaeria disease caused by Leptosphaeria nodorum ; for example, Magnaporthe disease caused by Magnaporthe grisea ; For example, Mycosphaerella graminicola , Mycosphaerella arachidicola, Mycosphaerella fijiensis , Mycosphaerella disease; for example, caused by Phaeosphaeria nodorum the glume blotch (Phaeosphaeria disease); for example, due to of a Pyrenophora teres (Pyrenophora teres), or Agropyron Pyrenophora (Pyrenophora tritici repentis) Pyrenophora diseases (Pyrenophora disease); for example Kele Greek RAMULARIA bacteria ( Ramularia collocygni ) or sclerotia caused by Ramularia areola (Ramular Ia disease); for example, Rhynchosporium disease caused by Rhynchosporium secalis ; for example, a shell needle caused by Septoria apii or Septoria lycopercisi Septoria disease; for example, gray rot (Typhula disease) caused by Typhula incarnata ; for example, Venturia disease caused by Venturia inaequalis ; root , sheath and stem stem diseases, such as, for example, Corticium disease caused by Corticium graminearum ; for example, Fusarium caused by Fusarium oxysporum (Fusarium) Disease; for example, Gaeumannomyces disease caused by Gaeumannomyces graminis ; for example Rhizoctonia disease caused by Rhizoctonia solani ; for example, from rice Sarocladium disease caused by Sarocladium oryzae ; for example, Sclerotinia dung caused by Sclerotium oryzae (Sclerotium d) isease); e.g. caused by a needle's eye Vexans (Tapesia acuformis) eyespot (Tapesia disease); for example, due to the tobacco root rot (Thielaviopsis basicola) root rot (Thielaviopsis disease); panicle and panicle diseases, For example: Alternaria spp. caused by Alternaria spp .; for example Aspergillus disease caused by Aspergillus flavus ; for example caused by Cladosporium spp. Cladosporium mold (Cladosporium disease); for example ergot (Claviceps purpurea) Claviceps diseases (Claviceps disease) caused by the; e.g. from yellow Fusarium (Fusarium culmorum) strain of Fusarium diseases caused; for example Gibberella Gibberella zeae caused by Gibberella disease; for example, Monographella disease caused by Monographella nivalis ; smut disease and black smut disease (bunt disease), such as: for example, caused by a wire sorghum smut fungi (Sphacelotheca reiliana) of Head smut (Sphacelotheca disease); for example, a net wheat Tilletia Bacteria (Tilletia caries) causing the bunt (Tilletia disease); for example, due to the straw from the black smut (Urocystis occulta) smut (Urocystis disease); for example, Ustilago from barley (Ustilago nuda) caused Ustilago disease; fruit rot disease and mould disease such as, for example, aspergillosis caused by Aspergillus flavus; for example, gray mold caused by Botrytis cinerea Botrytis disease; for example, Penicillium disease caused by Penicillium expansum ; for example, Rhizopus disease caused by Rhizopus stolonifer ; for example, Sclerotinia sclerotiorum) Sclerotinia sclerotiorum causes of disease (Sclerotinia disease); for example Verticillium sp (Verticilium alboatrum) causes the Verticillium disease (Verticilium disease); rot and seed with the soil, mold, wilt, blight and damping-off diseases: for example, due to the strain of Alternaria brassicae (Alternaria brassicicola) tenuis disease; for example, a pea Aphanomyces primers (Aphanomyces euteiches) The nematocysts mildew (Aphanomyces disease); for example, due to of a lentil Ascochyta (Ascochyta lentis) disease Ascochyta (Ascochyta disease); for example, the disease caused by the Aspergillus flavus; for example, a multi-spore main branch (Cladosporium herbarum Caclosporium disease; for example, Helminthosporium caused by Helminthosporium ; (conidial form: Helminthosporium , Bipolaris , synonym : Helminthosporium ); for example, anthracnose caused by Colletotrichum coccodes ; for example, Fusarium caused by Fusarium oxysporum; for example, gibberellosis caused by Gibberella zeae; for example, by bean bulb Macrophomina phaseolina caused by Macrophomina disease; for example, Monographella disease caused by Monographella nivalis ; for example, penicillium caused by Penicillium expansum; the mildew caused, for example Phoma (Phoma disease) from the Brassica Phoma (Phoma lingam); Phomopsis e.g. caused the mold (Phomopsis disease) from soybeans Phomopsis (Phomopsis sojae) For example Phytophthora cactorum (Phytophthora cactorum) causes blight of (Phytophthora disease); for example, due to the strain of Pyrenophora (Pyrenophora graminea) Pyrenophora diseases; of e.g. caused by the fungus Pyricularia (Pyricularia oryzae) pear Pyricularia disease; for example, pyogenic disease caused by Pythium ultimum; for example, sclerotium caused by Rhizoctonia solani; for example, rhizopus caused by Rhizopus oryzae ; Sclerotium disease caused by Sclerotium rolfsii ; for example, scleroderma caused by Septoria nodorum ; for example, gray snow caused by Typhula incarnata Rot; for example, Verticillium disease caused by Verticillium dahliae ; canker disease, broom disease, and dieback disease, such as: the example caused by a cancer cluster pome red globosum (Nectria galligena) plexus disease Neocosmospora (Nectria disease); wilt (blight disease), such as: for example, caused by Sclerotinia stone chain (Monilinia laxa) chain Monilinia disease; leaf blister disease or leaf curl disease, such as, for example, Exobasidium disease caused by Exobasidium vexans ; deformity caused by, for example, outside the outer balloon bacteria (Taphrina deformans) capsule graminis (Taphrina disease); decline disease of woody plants (decline disease), such as: for example, caused by bacteria chlamydospores Pucci Virginia (Phaemoniella clamydospora) of Esca disease; for example, Eutypa dyeback caused by Eutypa lata ; for example, Ganoderma disease caused by Ganoderma boninense ; hard wood volvatus (Rigidoporus lignosus) caused by the hard volvatus disease (Rigidoporus disease); flower and seed diseases, such as: for example, caused by Botrytis cinerea it; tuber diseases, such as: for example Rhizoctonia solani Rhizoctonia causes the disease; for example solani Helminthosporium (Helminthosporium solani) causes the helminthosporium (Helminthosporium disease); clubroot (club root disease), such as: for example Plasmodiophora brassicae (Plamodiophora brassicae) causes the clubroot (Plasmodiophora disease); of a disease caused by the bacterial organisms, such as bacterial organisms such as: Xanthomonas (Xanthomonas species), such as rice bacterial leaf blight (Xanthomonas campestris pv. Oryzae); Pseudomonas species, such as Pseudomonas syringae pv. lachrymans; Erwinia species, such as Erwinia amylovora .

亦可使用本發明組合物對抗容易在木料上或木料內部發展之真菌疾病。術語「木料」意謂所有類型之木材種類,及欲用於建築之此木材之所有加工類型,例如緊密材、高密度木板、層壓板及膠合板。根據本發明處理木料之方法主要在於接觸一或多種本發明化合物或本發明組合物;此包括例如直接施用、噴霧、浸漬、注射或任何其他適合方式。 The compositions of the invention may also be used to combat fungal diseases that are readily developable on or in the wood. The term "wood" means all types of wood and all types of processing of the wood to be used in construction, such as compacts, high density wood, laminates and plywood. The method of treating wood according to the present invention is primarily directed to contacting one or more compounds of the invention or compositions of the invention; this includes, for example, direct application, spraying, dipping, injecting, or any other suitable means.

在本發明處理方法中通常施用之活性化合物的劑量對於葉片處理中之施用一般且適宜為10至800g/ha,較佳為50至300g/ha。所施用之活性物質的劑量在種子處理之情況下一般且適宜為每100kg種子2至200g,較佳為每100kg種子3至150g。 The dosage of the active compound which is usually applied in the treatment method of the present invention is generally from 10 to 800 g/ha, preferably from 50 to 300 g/ha, for application in the treatment of the leaves. The dose of active substance applied is generally from 2 to 200 g per 100 kg of seed, preferably from 3 to 150 g per 100 kg of seed, in the case of seed treatment.

顯然,應瞭解,本文所指示之劑量係作為本發明方法之說明性實例提供。熟習此項技術者應知曉如何改變施用劑量,尤其根據待處理植物或作物之性質。 It will be apparent that the dosages indicated herein are provided as illustrative examples of the methods of the invention. Those skilled in the art will know how to vary the dosage administered, especially depending on the nature of the plant or crop to be treated.

本發明之化合物或混合物亦可用於製備適用於治療性或預防性處理人類或動物真菌疾病之組合物,該等真菌疾病為諸如黴菌病、皮膚病、髮癬菌病及念珠菌病或由麯黴菌屬(Aspergillus spp.)(例如煙麯黴(Aspergillus fumigatus))引起之疾病。 The compounds or mixtures according to the invention can also be used for the preparation of compositions suitable for the therapeutic or prophylactic treatment of human or animal fungal diseases such as mycosis, skin diseases, rickets and candidiasis or aspergillus A disease caused by Aspergillus spp. (such as Aspergillus fumigatus ).

本發明另外係關於如本文所定義之式(I)化合物用於控制植物病原性真菌之用途。 The invention further relates to the use of a compound of formula (I) as defined herein for the control of phytopathogenic fungi.

本發明另外係關於如本文所定義之式(I)化合物用於處理轉殖基 因植物之用途。 The invention further relates to a compound of formula (I) as defined herein for use in the treatment of a transgenic group Due to the use of plants.

本發明另外係關於如本文所定義之式(I)化合物用於處理種子及轉殖基因植物之種子的用途。 The invention further relates to the use of a compound of formula (I) as defined herein for the treatment of seeds and seeds of a transgenic plant.

本發明另外係關於一種製備用於控制植物病原性有害真菌之組合物的方法,其特徵在於將如本文所定義之式(I)衍生物與增量劑及/或界面活性劑混合。 The invention further relates to a process for the preparation of a composition for the control of phytopathogenic harmful fungi, characterized in that a derivative of formula (I) as defined herein is admixed with extenders and/or surfactants.

現將參考下表之化合物實例及以下製備或功效實例來說明本發明之各個態樣。 Various aspects of the invention will now be described with reference to the examples of the compounds in the <RTIgt;

表1以非限制性方式說明本發明式(I)化合物之實例: Table 1 illustrates, by way of non-limiting example, examples of compounds of formula (I) of the present invention:

其中A可選自由以下基團組成之清單:A-G1、A-G2、A-G3、A-G4、A-G5、A-G6及A-G7: A can be selected from the list of the following groups: A-G1, A-G2, A-G3, A-G4, A-G5, A-G6 and A-G7:

其中*表示基團A與(硫代)羰基部分之連接點。 Wherein * represents the point of attachment of the group A to the (thio)carbonyl moiety.

在表1中,除非另有說明,否則M+H(ApcI+)意謂如在經由正型大氣壓化學電離之質譜分析中所觀測之分子離子峰加上1a.m.u.(原子 質量單位)。 In Table 1, unless otherwise stated, M+H(ApcI+) means a molecular ion peak as observed in mass spectrometry by positive atmospheric pressure chemical ionization plus 1 a.m.u. Quality unit).

在表1中,logP值係根據EEC Directive 79/831 Annex V.A8,藉由HPLC(高效液相層析),在逆相管柱(C 18)上,使用以下所述方法來測定:溫度:40℃;移動相:0.1%甲酸水溶液及乙腈;線性梯度:10%乙腈至90%乙腈。 In Table 1, the logP values were determined by HPLC (High Performance Liquid Chromatography) on a reverse phase column (C 18) using the method described below according to EEC Directive 79/831 Annex V.A8: Temperature : 40 ° C; mobile phase: 0.1% aqueous formic acid and acetonitrile; linear gradient: 10% acetonitrile to 90% acetonitrile.

使用具有已知logP值(在兩個連續烷酮之間使用線性內插法由滯留時間測定logP值)之未分支烷-2-酮(包含3至16個碳原子)進行校準。使用200nm至400nm之UV光譜及層析信號之峰值來測定λ最大值。 Calibration was performed using an unbranched alkan-2-one (containing 3 to 16 carbon atoms) having a known logP value (measured by a linear interpolation between two consecutive alkanones using a linear interpolation method to determine the logP value). The λ maximum is determined using a UV spectrum of 200 nm to 400 nm and a peak of the chromatographic signal.

在表1中,「位置」表示-L-B殘基與苯基環之連接點。 In Table 1, "position" indicates the point of attachment of the -L-B residue to the phenyl ring.

表2以非限制性方式說明本發明式(IIa)化合物之實例,其中L為直接鍵且B1為經取代或未經取代之環氧乙烷基環、經取代或未經取代之噻吩基環、經取代或未經取代之苯并噻吩基環、經取代或未經取代之呋喃環或經取代或未經取代之苯并呋喃環, Table 2 illustrates, in a non-limiting manner, an example of a compound of the formula (IIa) of the present invention, wherein L is a direct bond and B 1 is a substituted or unsubstituted oxiranyl ring, a substituted or unsubstituted thienyl group. a ring, a substituted or unsubstituted benzothienyl ring, a substituted or unsubstituted furan ring or a substituted or unsubstituted benzofuran ring,

在表2中,M+H(ApcI+)及logP如關於表1所定義。 In Table 2, M+H (ApcI+) and logP are as defined in Table 1.

在表2中,「位置」表示-L-B1殘基與苯基環之連接點。 In Table 2, "position" indicates the point of attachment of the -LB 1 residue to the phenyl ring.

表3以非限制性方式說明本發明式(IIb)化合物之實例,其中L為直接鍵且B1為經取代或未經取代之環氧乙烷基環、經取代或未經取代之噻吩基環、經取代或未經取代之苯并噻吩基環、經取代或未經取代之呋喃環或經取代或未經取代之苯并呋喃環 Table 3 illustrates, in a non-limiting manner, an example of a compound of the formula (IIb) of the present invention, wherein L is a direct bond and B 1 is a substituted or unsubstituted oxiranyl ring, a substituted or unsubstituted thienyl group. Ring, substituted or unsubstituted benzothienyl ring, substituted or unsubstituted furan ring or substituted or unsubstituted benzofuran ring

在表3中,M+H(ApcI+)及logP如關於表1所定義。 In Table 3, M+H (ApcI+) and logP are as defined in Table 1.

在表3中,「位置」表示-L-B1殘基與苯基環之連接點。 In Table 3, "position" indicates the point of attachment of the -LB 1 residue to the phenyl ring.

表3:table 3:

表4以非限制性方式說明本發明式(Xa)化合物之實例,其中Z2及Z3如本文所定義,A表示A13,Xa1表示鹵素原子;經取代或未經取代之C1-C8烷基;包含多至9個可相同或不同之鹵素原子之C1-C8鹵烷基;經取代或未經取代之C3-C7環烷基;三(C1-C8烷基)矽烷基;經取代或未經取代之C1-C8烷氧基;或經取代或未經取代之C1-C8烷基硫基,Xa2表示氫或Xa1,且U2表示諸如氯、溴或碘之鹵素原子或三氟甲磺酸酯基, Table 4 illustrates, in a non-limiting manner, an example of a compound of the formula (Xa) of the present invention, wherein Z 2 and Z 3 are as defined herein, A represents A 13 , X a1 represents a halogen atom; substituted or unsubstituted C 1 - C 8 alkyl; C 1 -C 8 haloalkyl containing up to 9 halogen atoms which may be the same or different; substituted or unsubstituted C 3 -C 7 cycloalkyl; tri (C 1 -C 8 Alkyl)decyl; substituted or unsubstituted C 1 -C 8 alkoxy; or substituted or unsubstituted C 1 -C 8 alkylthio, X a2 represents hydrogen or X a1 , and U 2 represents a halogen atom such as chlorine, bromine or iodine or a triflate group,

在表4中,M+H(ApcI+)及logP如關於表1所定義。 In Table 4, M+H(ApcI+) and logP are as defined in Table 1.

其中A可選自由以下基團組成之清單:A-G1。 A can be selected from the list of the following groups: A-G1.

註釋:Et:乙基;iPr:異丙基 Note: Et: ethyl; iPr: isopropyl

表5提供表1中所選編號之化合物的NMR數據(1H)。 NMR data in Table 5 provides a number of selected compounds of Table (1 H).

所選實例之1H-NMR數據以1H-NMR峰清單之形式陳述。對於各信號峰,列出δ值(ppm)及在括號內之信號強度。 The 1 H-NMR data of the selected examples are presented in the form of a list of 1 H-NMR peaks. For each signal peak, the delta value (ppm) and the signal strength in parentheses are listed.

尖銳信號之強度與印刷之NMR光譜實例中之信號高度(cm)相關聯且顯示信號強度之真實關係。自寬信號,可顯示若干信號峰值或中間值及其相較於光譜中之最密集信號的相對強度。 The intensity of the sharp signal is associated with the signal height (cm) in the printed NMR spectrum example and shows the true relationship of the signal strength. The self-width signal can show several signal peaks or intermediate values and their relative intensities relative to the densest signals in the spectrum.

1H-NMR峰清單類似於經典1H-NMR印刷圖且因此通常含有經典NMR說明中所列之所有峰。另外,其如同經典1H-NMR印刷圖一般可顯示溶劑信號、目標化合物之立體異構體(亦為本發明之標的)及/或雜質峰。為在溶劑及/或水之δ範圍內顯示化合物信號,常用溶劑峰(例如於DMSO-d6中之DMSO峰)及水峰顯示於吾人之1H-NMR峰清單中且通常平均具有高強度。 The 1 H-NMR peak list is similar to the classical 1 H-NMR print and therefore typically contains all of the peaks listed in the classical NMR description. Alternatively, it can generally exhibit a solvent signal, a stereoisomer of the target compound (which is also the subject of the invention) and/or an impurity peak, as in a classical 1 H-NMR print. To display compound signals in the range of δ of solvent and/or water, common solvent peaks (eg, DMSO peaks in DMSO-d6) and water peaks are shown in our 1 H-NMR peak list and typically have high strength on average.

目標化合物之立體異構體之峰及/或雜質之峰通常平均具有與目標化合物(例如具有大於90%之純度)之峰相比較低之強度。該等立體異構體及/或雜質對於特定製備方法而言可具有典型性。因此,其峰可經由「副產物指紋」來幫助辨識吾人之製備方法之再現性。 The peaks and/or peaks of the stereoisomers of the target compound generally have a lower average intensity compared to the peak of the target compound (e.g., having a purity greater than 90%). Such stereoisomers and/or impurities may be typical for a particular method of preparation. Therefore, its peak can be used to help identify the reproducibility of our manufacturing method via "by-product fingerprints".

用已知方法(MestreC、ACD模擬以及憑經驗評估之期望值)計算目標化合物之峰的專家可視情況使用其他強度過濾器按需分離目標化合物之峰。此分離將類似於經典1H-NMR說明中之相關峰挑選。 An expert who calculates the peak of the target compound using known methods (MestreC, ACD simulation, and empirically evaluated expected values) can optionally separate the peak of the target compound as needed using other intensity filters. This separation will be similar to the correlation peaks in the classical 1 H-NMR description.

具有峰清單之NMR數據描述之其他細節可見於研究公開資料庫564025號之公開案「Citation of NMR Peaklist Data within Patent Applications」中。 Further details of the NMR data description with the peak list can be found in the publication "Citation of NMR Peak List Data within Patent Applications" of Research Publication No. 564025.

以下實例以非限制性方式說明本發明之式(I)化合物的製備及功效。 The following examples illustrate, in a non-limiting manner, the preparation and efficacy of the compounds of formula (I) of the present invention.

製備實例1:製備N-環丙基-3-(二氟甲基)-5-氟-1-甲基-N-[2-(3-甲基氧雜環丁烷-3-基)苄基]-1H-吡唑-4-甲醯胺(化合物I.15) Preparation Example 1 : Preparation of N-cyclopropyl-3-(difluoromethyl)-5-fluoro-1-methyl-N-[2-(3-methyloxetan-3-yl)benzyl -1H-pyrazole-4-carboxamide (Compound I.15) 步驟1:製備N-[2-(3-甲基氧雜環丁烷-3-基)苄基]環丙胺 Step 1 : Preparation of N-[2-(3-methyloxetan-3-yl)benzyl]cyclopropylamine

向1.94g(34mmol)環丙胺及2.44mL(42mmol)乙酸以及9g 4Å分子篩於50mL甲醇中之經冷卻溶液中添加3g(17mmol)2-(3-甲基氧雜環丁烷-3-基)苯甲醛。在回流下攪拌反應混合物3小時。隨後使反應混合物冷卻至0℃,且緩慢添加1.6g(25mmol)氰基硼氫化鈉,且在回流下再攪拌反應混合物1小時。隨後經矽藻土餅過濾經冷卻之反應混合物。用80mL甲醇洗滌濾餅兩次,且在真空下濃縮經合併之甲醇萃 取物。隨後向殘餘物中添加100mL水,且用1N氫氧化鈉水溶液調節pH值至12。用2×50mL乙酸乙酯萃取水層。用濃NaCl水溶液洗滌有機層兩次,且經硫酸鎂乾燥以在濃縮之後得到4.37g黃色油。矽膠管柱層析(庚烷/乙酸乙酯梯度)得到2.44g(62%產率)呈無色油狀之N-[2-(3-甲基氧雜環丁烷-3-基)苄基]環丙胺。(M+H)=218。 To a cooled solution of 1.94 g (34 mmol) of cyclopropylamine and 2.44 mL (42 mmol) of acetic acid and 9 g of 4Å molecular sieve in 50 mL of methanol was added 3 g (17 mmol) of 2-(3-methyloxetan-3-yl) Benzaldehyde. The reaction mixture was stirred under reflux for 3 hours. The reaction mixture was then cooled to 0 ° C, and 1.6 g (25 mmol) of sodium cyanoborohydride was slowly added, and the reaction mixture was further stirred under reflux for 1 hour. The cooled reaction mixture was then filtered through a diatomaceous earth cake. The filter cake was washed twice with 80 mL of methanol and the combined methanol extracts were concentrated under vacuum. Take things. Then 100 mL of water was added to the residue and the pH was adjusted to 12 with 1N aqueous sodium hydroxide. The aqueous layer was extracted with 2 x 50 mL ethyl acetate. The organic layer was washed twice with aq. aq. EtOAc and dried over magnesium sulfate. Column chromatography (heptane/ethyl acetate gradient) gave 2.44 g (yield: 62% yield) of N-[2-(3-methyl oxetane-3-yl)benzyl as a colorless oil. ] Cyclopropylamine. (M+H) = 218.

步驟2:製備N-環丙基-3-(二氟甲基)-5-氟-1-甲基-N-[2-(3-甲基氧雜環丁烷-3-基)苄基]-1H-吡唑-4-甲醯胺 Step 2 : Preparation of N-cyclopropyl-3-(difluoromethyl)-5-fluoro-1-methyl-N-[2-(3-methyloxetan-3-yl)benzyl ]-1H-pyrazole-4-carboxamide

在環境溫度下,將195mg(0.92mmol)3-(二氟甲基)-5-氟-1-甲基-1H-吡唑-4-羰基氯於2mL無水四氫呋喃中之溶液添加至200mg(0.92mmol)N-[2-(3-甲基氧雜環丁烷-3-基)苄基]環丙胺與0.141mL(1.01mmol)三乙胺於3mL無水四氫呋喃中之混合物中。在環境溫度下攪拌反應混合物4天。隨後用0.1mL HCl於乙醚中之1N溶液淬滅反應混合物且濾除固體。在真空下濃縮有機相,得到400mg粗殘餘物。矽膠管柱層析(正庚烷/乙酸乙酯梯度)得到314mg(82%產率)呈油狀之N-環丙基-3-(二氟甲基)-5-氟-1-甲基-N-[2-(3-甲基氧雜環丁烷-3-基)苄基]-1H-吡唑-4-甲醯胺。LogP=1.94。(M+H)=394。 Add 195 mg (0.92 mmol) of 3-(difluoromethyl)-5-fluoro-1-methyl-1H-pyrazole-4-carbonyl chloride in 2 mL of anhydrous tetrahydrofuran to 200 mg (0.92) at ambient temperature. Methyl) a mixture of N-[2-(3-methyloxetan-3-yl)benzyl]cyclopropylamine and 0.141 mL (1.01 mmol) of triethylamine in 3 mL anhydrous THF. The reaction mixture was stirred at ambient temperature for 4 days. The reaction mixture was then quenched with 1 mL EtOAc (EtOAc)EtOAc. The organic phase was concentrated in vacuo to give a crude material. Column chromatography (n-heptane / ethyl acetate gradient) gave 314 mg (yield: 82% yield) of N-cyclopropyl-3-(difluoromethyl)-5-fluoro-1-methyl as an oil. -N-[2-(3-Methyloxetan-3-yl)benzyl]-1H-pyrazole-4-carboxamide. LogP=1.94. (M+H) = 394.

製備實例2:製備N-[5-氯-2-(2-甲基環氧乙烷-2-基)苄基]-N-環丙基-3-(二氟甲基)-5-氟-1-甲基-1H-吡唑-4-甲醯胺(化合物I.4) Preparation Example 2 : Preparation of N-[5-chloro-2-(2-methyloxiran-2-yl)benzyl]-N-cyclopropyl-3-(difluoromethyl)-5-fluoro -1-methyl-1H-pyrazole-4-carboxamide (Compound I.4) 步驟1:製備N-[5-氯-2-(丙-1-烯-2-基)苄基]-N-環丙基-3-(二氟甲基)-5-氟-1-甲基-1H-吡唑-4-甲醯胺 Step 1 : Preparation of N-[5-chloro-2-(prop-1-en-2-yl)benzyl]-N-cyclopropyl-3-(difluoromethyl)-5-fluoro-1-methyl keto-1H-pyrazole-4-carboxamide

向1.55g(3.55mmol)N-(2-溴-5-氯苄基)-N-環丙基-3-(二氟甲基)-5-氟-1-甲基-1H-吡唑-4-甲醯胺於經氬氣脫氣之20/1甲苯/水混合物中之懸浮液中依次添加753mg(4.25mmol)4,4,5,5-四甲基-2-(丙-1-烯-2-基)-1,3,2-二氧硼、205mg(0.71mmol)三環己基膦、167mg(0.355mmol)乙酸鈀(II)及4.65g(21.3mmol)磷酸三鉀。在100℃下加熱混合物3小時。將反應混合物冷卻至環境溫度。添加60mL水,且用乙酸 乙酯萃取反應混合物3次。用NaCl飽和水溶液洗滌經合併之有機萃取物且經相分離過濾器乾燥。在真空下濃縮有機相,且藉由矽膠管柱層析(正庚烷/乙酸乙酯梯度)純化粗殘餘物,得到1.01g(72%產率)N-[5-氯-2-(丙-1-烯-2-基)苄基]-N-環丙基-3-(二氟甲基)-5-氟-1-甲基-1H-吡唑-4-甲醯胺與N-環丙基-3-(二氟甲基)-N-[2,5-二(丙-1-烯-2-基)苄基]-5-氟-1-甲基-1H-吡唑-4-甲醯胺之68/32混合物,其按原樣用於下一步驟中。LogP=3.96。(M+H)=398。 To 1.55 g (3.55 mmol) of N-(2-bromo-5-chlorobenzyl)-N-cyclopropyl-3-(difluoromethyl)-5-fluoro-1-methyl-1H-pyrazole- 4-Metformamide was added 753 mg (4.25 mmol) of 4,4,5,5-tetramethyl-2-(propan-1-) in a suspension of 20/1 toluene/water mixture by argon gas degassing. Alk-2-yl)-1,3,2-dioxaboron 205 mg (0.71 mmol) of tricyclohexylphosphine, 167 mg (0.355 mmol) of palladium(II) acetate and 4.65 g (21.3 mmol) of tripotassium phosphate. The mixture was heated at 100 ° C for 3 hours. The reaction mixture was cooled to ambient temperature. 60 mL of water was added and the reaction mixture was extracted three times with ethyl acetate. The combined organic extracts were washed with a saturated aqueous solution of NaCl and dried over a phase separation filter. The organic phase was concentrated in vacuo <RTI ID=0.0></RTI> tojjjjjjjj 1-en-2-yl)benzyl]-N-cyclopropyl-3-(difluoromethyl)-5-fluoro-1-methyl-1H-pyrazole-4-carboxamide and N- Cyclopropyl-3-(difluoromethyl)-N-[2,5-di(prop-1-en-2-yl)benzyl]-5-fluoro-1-methyl-1H-pyrazole- A 68/32 mixture of 4-methanamine was used as such in the next step. LogP=3.96. (M+H)=398.

步驟2:N-[5-氯-2-(2-甲基環氧乙烷-2-基)苄基]-N-環丙基-3-(二氟甲基)-5-氟-1-甲基-1H-吡唑-4-甲醯胺之製備 Step 2 : N-[5-Chloro-2-(2-methyloxiran-2-yl)benzyl]-N-cyclopropyl-3-(difluoromethyl)-5-fluoro-1 -Preparation of methyl-1H-pyrazole-4-carboxamide

向0.5g(1.26mmol,68%純度)N-[5-氯-2-(丙-1-烯-2-基)苄基]-N-環丙基-3-(二氟甲基)-5-氟-1-甲基-1H-吡唑-4-甲醯胺於20mL二氯甲烷中之經冷卻溶液中緩慢添加1.65g(6.69mmol)70重量%間氯過苯甲酸。在環境溫度攪拌反應混合物2小時。藉由添加2.47g(12.6mmol)亞硫酸氫鈉水溶液中和過量氧化劑,隨後用二氯甲烷萃取混合物3次。用碳酸氫鈉水溶液洗合併之有機萃取物且經相分離過濾器乾燥。在真空下濃縮有機相,且藉由矽膠管柱層析(正庚烷/乙酸乙酯梯度)純化粗殘餘物,得到183mg(33%產率)N-[5-氯-2-(2-甲基環氧乙烷-2-基)苄基]-N-環丙基-3-(二氟甲基)-5-氟-1-甲基-1H-吡唑-4-甲醯胺。LogP=3.19。(M+H)=414。 To 0.5 g (1.26 mmol, 68% purity) of N-[5-chloro-2-(prop-1-en-2-yl)benzyl]-N-cyclopropyl-3-(difluoromethyl)- 5-Fluoro-1-methyl-1H-pyrazole-4-carboxamide A 1.65 g (6.69 mmol) of 70% by weight of m-chloroperbenzoic acid was slowly added to the cooled solution in 20 mL of dichloromethane. The reaction mixture was stirred at ambient temperature for 2 hours. The excess oxidizing agent was neutralized by adding 2.47 g (12.6 mmol) of an aqueous solution of sodium hydrogensulfite, and then the mixture was extracted three times with dichloromethane. The combined organic extracts were washed with aqueous sodium bicarbonate and dried over a phase separation filter. The organic phase was concentrated in vacuo <RTI ID=0.0></RTI> tojjjjjjjjj Methyl oxiran-2-yl)benzyl]-N-cyclopropyl-3-(difluoromethyl)-5-fluoro-1-methyl-1H-pyrazole-4-carboxamide. LogP=3.19. (M+H) = 414.

製備實例3:N-[5-(1-苯并噻吩-3-基)-2-異丙基苄基]-N-環丙基-3-(二氟甲基)-5-氟-1-甲基-1H-吡唑-4-甲醯胺(化合物I.157)之製備 Preparation Example 3 : N-[5-(1-Benzothiophen-3-yl)-2-isopropylbenzyl]-N-cyclopropyl-3-(difluoromethyl)-5-fluoro-1 -Preparation of methyl-1H-pyrazole-4-carboxamide (Compound I.157) 步驟1:1-(5-氯-2-異丙基苯基)-N-羥基甲亞胺之製備 Step 1 : Preparation of 1-(5-chloro-2-isopropylphenyl)-N-hydroxymethylimine

向1g(5.47mmol)5-氯-2-異丙基苯甲醛於12mL甲醇中之溶液中依次添加0.5g(6mmol)乙酸鈉及419mg(6mmol)羥胺鹽酸鹽。在環境溫度攪拌反應混合物6小時。在真空下移除溶劑,且用二氯甲烷萃取殘餘物。有機相經ChemElutTM濾筒過濾且在真空下濃縮,得到1.08 g(89%產率)1-(5-氯-2-異丙基苯基)-N-羥基甲亞胺,呈兩種異構體之8/92混合物。LogP=2.90(次要異構體)及3.17(主要異構體)。(M+H)=198。 To a solution of 1 g (5.47 mmol) of 5-chloro-2-isopropylbenzaldehyde in 12 mL of methanol was added 0.5 g (6 mmol) of sodium acetate and 419 mg (6 mmol) of hydroxylamine hydrochloride. The reaction mixture was stirred at ambient temperature for 6 hours. The solvent was removed under vacuum and the residue was extracted with dichloromethane. ChemElut TM cartridge organic phase was filtered and concentrated under vacuum to give 1.08 g (89% yield) of 1- (5-chloro-2-isopropyl-phenyl) -N- hydroxymethanimine, two isomers was 8/92 mixture of constructs. LogP = 2.90 (minor isomer) and 3.17 (major isomer). (M+H) = 198.

步驟2:1-(5-氯-2-異丙基苯基)甲胺之製備 Step 2 : Preparation of 1-(5-chloro-2-isopropylphenyl)methylamine

向1.08g(5.46mmol)1-(5-氯-2-異丙基苯基)-N-羥基甲亞胺於18mL四氫呋喃中之經冷卻溶液中緩慢添加硼烷:四氫呋喃複合物於四氫呋喃中之1M溶液21mL(21mmol)。在回流加熱反應混合物1天。藉由添加乙醇破壞過量氫化物。添加數毫升1N氫氧化鈉水溶液,且在70℃再加熱反應混合物30分鐘。用水稀釋反應混合物,用第三丁基甲基醚萃取。有機相經ChemElutTM濾筒過濾且在真空下濃縮,得到1.30g 1-(5-氯-2-異丙基苯基)甲胺,以此用於下一步驟中。LogP=1.20。(M+H)=184。 Slow addition of borane: tetrahydrofuran complex in tetrahydrofuran to 1.08 g (5.46 mmol) of 1-(5-chloro-2-isopropylphenyl)-N-hydroxymethylimine in 18 mL of tetrahydrofuran 1 M solution 21 mL (21 mmol). The reaction mixture was heated under reflux for 1 day. Excess hydride was destroyed by the addition of ethanol. A few milliliters of 1 N aqueous sodium hydroxide solution was added, and the reaction mixture was further heated at 70 ° C for 30 minutes. The reaction mixture was diluted with water and extracted with aq. The organic phase was filtered through a pad of EtOAc (EtOAc ) and concentrated in vacuo to give 1.30 g of 1-(5-chloro-2-isopropylphenyl)methylamine as the next step. LogP=1.20. (M+H) = 184.

步驟3:N-(5-氯-2-異丙基苄基)-3-(二氟甲基)-5-氟-1-甲基-1H-吡唑-4-甲醯胺(化合物Xa.1)之製備 Step 3 : N-(5-Chloro-2-isopropylbenzyl)-3-(difluoromethyl)-5-fluoro-1-methyl-1H-pyrazole-4-carboxamide (Compound Xa .1) Preparation

在環境溫度下,將824mg(3.87mmol)3-(二氟甲基)-5-氟-1-甲基-1H-吡唑-4-羰基氯添加至647mg(3.52mmol)1-(5-氯-2-異丙基-苯基)甲胺與0.590mL(4.23mmol)三乙胺於7mL無水四氫呋喃中之混合物中。在回流下加熱反應混合物2小時。添加數毫升水,且經ChemElutTM濾筒過濾反應混合物並濃縮,得到1.5g呈黃色油狀之粗物質。藉由製備型HPLC(乙腈/水+0.1% HCO2H梯度)純化殘餘物,得到360mg(27%產率)呈白色固體狀之N-(5-氯-2-異丙基苄基)-3-(二氟甲基)-5-氟-1-甲基-1H-吡唑-4-甲醯胺。LogP=3.46。(M+H)=360。 824 mg (3.87 mmol) of 3-(difluoromethyl)-5-fluoro-1-methyl-1H-pyrazole-4-carbonyl chloride was added to 647 mg (3.52 mmol) 1-(5- at ambient temperature. A mixture of chloro-2-isopropyl-phenyl)methylamine and 0.590 mL (4.23 mmol) of triethylamine in 7 mL anhydrous THF. The reaction mixture was heated under reflux for 2 hours. A few milliliters of water was added and the reaction mixture was filtered with EtOAc (EtOAc ) cartridge. By prep HPLC (acetonitrile / water + 0.1% HCO 2 H gradient) the residue to give 360mg (27% yield) as a white solid of N- (5- chloro-2-isopropyl-benzyl) - 3-(Difluoromethyl)-5-fluoro-1-methyl-1H-pyrazole-4-carboxamide. LogP = 3.46. (M+H)=360.

步驟4:製備N-(5-氯-2-異丙基苄基)-N-環丙基-3-(二氟甲基)-5-氟-1-甲基-1H-吡唑-4-甲醯胺 Step 4 : Preparation of N-(5-chloro-2-isopropylbenzyl)-N-cyclopropyl-3-(difluoromethyl)-5-fluoro-1-methyl-1H-pyrazole-4 -Procarbamide

將63mg(0.19mmol)N-(5-氯-2-異丙基苄基)-3-(二氟甲基)-5-氟-1-甲基-1H-吡唑-4-甲醯胺、35mg(0.19mmol)乙酸銅(II)及31mg (0.096mmol)碳酸銫添加至經乾燥之RadleysTM小瓶中。用乾空氣吹洗小瓶且劇烈攪拌數分鐘。添加0.5mL甲苯以及46mg(0.58mmol)吡啶及65mg(0.38mmol)2-環丙基-4,4,5,5-四甲基-1,3,2-二氧硼。用乾空氣再吹洗小瓶,密封且在100℃下加熱1天。反應之HPLC-質譜分析顯示形成4%(7% cv)N-(5-氯-2-異丙基苄基)-N-環丙基-3-(二氟甲基)-5-氟-1-甲基-1H-吡唑-4-甲醯胺。LogP=4.06。(M+H)=400。 63 mg (0.19 mmol) of N-(5-chloro-2-isopropylbenzyl)-3-(difluoromethyl)-5-fluoro-1-methyl-1H-pyrazole-4-carboxamide , 35mg (0.19mmol) of copper (II) acetate and 31mg (0.096mmol) of cesium carbonate was added to a dried Radleys TM vials. The vial was purged with dry air and stirred vigorously for a few minutes. Add 0.5 mL of toluene and 46 mg (0.58 mmol) of pyridine and 65 mg (0.38 mmol) of 2-cyclopropyl-4,4,5,5-tetramethyl-1,3,2-dioxaboron . The vial was again purged with dry air, sealed and heated at 100 ° C for 1 day. HPLC-mass spectrometry analysis of the reaction showed formation of 4% (7% cv) N-(5-chloro-2-isopropylbenzyl)-N-cyclopropyl-3-(difluoromethyl)-5-fluoro- 1-Methyl-1H-pyrazole-4-carbamide. LogP=4.06. (M+H)=400.

步驟5:製備N-[5-(1-苯并噻吩-3-基)-2-異丙基苄基]-N-環丙基-3-(二氟甲基)-5-氟-1-甲基-1H-吡唑-4-甲醯胺 Step 5 : Preparation of N-[5-(1-benzothiophen-3-yl)-2-isopropylbenzyl]-N-cyclopropyl-3-(difluoromethyl)-5-fluoro-1 -methyl-1H-pyrazole-4-carboxamide

在5mL微波小瓶中,將200mg(0.5mmol)N-(5-氯-2-異丙基苄基)-N-環丙基-3-(二氟甲基)-5-氟-1-甲基-1H-吡唑-4-甲醯胺溶解於1mL乙腈中。用氬氣使小瓶脫氣,且進一步添加溶解於1mL水中之104mg(0.75mmol)碳酸鉀,繼而添加106mg(0.6mmol)1-苯并噻吩-3-基酸及6.5mg(0.01mmol)1,1'-雙(二第三丁基膦基)(二茂鐵)二氯鈀(II)。隨後在130℃下加熱微波設備[Biotage InitiatorTM]20分鐘。將反應混合物冷卻至環境溫度,過濾且用乙酸乙酯萃取。經ChemElutTM濾筒乾燥有機萃取物且在真空下濃縮。藉由製備型HPLC(乙腈/水+0.1% HCO2H梯度)純化殘餘物,得到75mg(28%產率)呈棕色油狀之N-[5-(1-苯并噻吩-3-基)-2-異丙基-苄基]-N-環丙基-3-(二氟甲基)-5-氟-1-甲基-1H-吡唑-4-甲醯胺。LogP=5.17。(M+H)=498。 200 mg (0.5 mmol) of N-(5-chloro-2-isopropylbenzyl)-N-cyclopropyl-3-(difluoromethyl)-5-fluoro-1-methyl in a 5 mL microwave vial The benzyl-1H-pyrazole-4-carboxamide was dissolved in 1 mL of acetonitrile. The vial was degassed with argon, and 104 mg (0.75 mmol) of potassium carbonate dissolved in 1 mL of water was further added, followed by the addition of 106 mg (0.6 mmol) of 1-benzothiophen-3-yl group. Acid and 6.5 mg (0.01 mmol) of 1,1'-bis(di-t-butylphosphino)(ferrocene)dichloropalladium(II). Deg.] C followed by heating in a microwave apparatus 130. [Biotage Initiator TM] 20 minutes. The reaction mixture was cooled to ambient temperature, filtered andEtOAc evaporated. The organic extract was dried over a ChemElut (TM) cartridge and concentrated in vacuo. By prep HPLC (acetonitrile / water + 0.1% HCO 2 H gradient) the residue was purified to give 75mg of a brown oil (28% yield) N- [5- (1- benzothiophen-3-yl) 2-Isopropyl-benzyl]-N-cyclopropyl-3-(difluoromethyl)-5-fluoro-1-methyl-1H-pyrazole-4-carboxamide. LogP=5.17. (M+H) = 498.

製備實例4:製備N-環丙基-3-(二氟甲基)-5-氟-1-甲基-N-[2-(4-甲基-2-噻吩基)苄基]-1H-吡唑-4-甲醯胺(化合物I.100) Preparation Example 4 : Preparation of N-cyclopropyl-3-(difluoromethyl)-5-fluoro-1-methyl-N-[2-(4-methyl-2-thienyl)benzyl]-1H -pyrazole-4-carboxamide (Compound I.100)

在RadleysTM小瓶中,將200mg(0.49mmol)N-(2-溴苄基)-N-環丙基-3-(二氟甲基)-5-氟-1-甲基-1H-吡唑-4-甲醯胺以及溶解於0.5mL水中之137mg(0.99mmol)碳酸鉀一起溶解於5mL二噁烷中。用氬氣使小瓶脫氣10分鐘。隨後添加106mg(0.74mmol)(4-甲基-2-噻吩基)酸及115mg(0.1mmol)肆(三苯基膦)鈀(0)。在100℃下加熱反應混合 物8小時。經矽藻土餅過濾經冷卻之混合物。依序用碳酸鉀水溶液、NaCl飽和水溶液洗滌濾液,且經ChemElutTM濾筒乾燥。濃縮有機層,留下殘餘物,藉由矽膠管柱層析(正庚烷/乙酸乙酯梯度)純化該殘餘物,得到165mg(71%產率)呈無色油狀之N-環丙基-3-(二氟甲基)-5-氟-1-甲基-N-[2-(4-甲基-2-噻吩基)苄基]-1H-吡唑-4-甲醯胺。LogP=3.99。(M+H)=420。 In Radleys TM vial, 200mg (0.49mmol) N- (2- bromobenzyl) -N- cyclopropyl-3- (difluoromethyl) -5-fluoro-1-methyl -1H- pyrazolo 4-Methylguanamine was dissolved in 5 mL of dioxane together with 137 mg (0.99 mmol) of potassium carbonate dissolved in 0.5 mL of water. The vial was degassed with argon for 10 minutes. Subsequently, 106 mg (0.74 mmol) of (4-methyl-2-thienyl) was added. Acid and 115 mg (0.1 mmol) of ruthenium (triphenylphosphine) palladium (0). The reaction mixture was heated at 100 ° C for 8 hours. The cooled mixture was filtered through a diatomaceous earth cake. Sequentially with aqueous potassium carbonate, NaCl filtrate was washed with a saturated aqueous solution, and dried over ChemElut TM cartridge. The organic layer was concentrated to dryness crystals crystals eluted eluted eluted eluted 3-(Difluoromethyl)-5-fluoro-1-methyl-N-[2-(4-methyl-2-thienyl)benzyl]-1H-pyrazole-4-carboxamide. LogP=3.99. (M+H)=420.

通用製備實例5:在ChemspeedGeneral Preparation Example 5: at Chemspeed TMTM 設備上硫化式(I)之醯胺Sulfated formula (I) on the equipment

將0.27mmol五硫化磷(P2S5)稱重並放入13mL ChemspeedTM小瓶中。添加3mL 0.18M醯胺(I)(0.54mmol)於二噁烷中之溶液,且在回流下加熱混合物2小時。隨後使溫度降至80℃且添加2.5mL水。在80℃下再加熱混合物1小時。隨後添加2mL水,且用4mL二氯甲烷萃取反應混合物兩次。使有機相沈積於鹼性氧化鋁濾筒(2g)上且用8mL二氯甲烷溶離兩次。移除溶劑,且藉由LCMS及NMR分析粗硫代醯胺衍生物。藉由製備型LC進一步純化純度不足之化合物。 The 0.27mmol phosphorus pentasulfide (P 2 S 5) were weighed into 13mL Chemspeed TM vials. A solution of 3 mL of 0.18 M decylamine (I) (0.54 mmol) in dioxane was added and the mixture was heated under reflux for 2 hr. The temperature was then lowered to 80 ° C and 2.5 mL of water was added. The mixture was further heated at 80 ° C for 1 hour. Then 2 mL of water was added and the reaction mixture was extracted twice with 4 mL of dichloromethane. The organic phase was deposited on a basic alumina cartridge (2 g) and was taken twice with 8 mL dichloromethane. The solvent was removed and the crude thioguanamine derivative was analyzed by LCMS and NMR. The under-purified compound was further purified by preparative LC.

實例A:對禾本科布氏白粉菌(大麥)之活體內預防性測試Example A: In vivo prophylactic testing of Gramineae blight (barley)

溶劑:49重量份N,N-二甲基乙醯胺 Solvent: 49 parts by weight of N,N-dimethylacetamide

乳化劑:1重量份烷基芳基聚乙二醇醚 Emulsifier: 1 part by weight of alkyl aryl polyglycol ether

為產生活性化合物之適合製劑,將1重量份活性化合物或活性化合物組合與規定量之溶劑及乳化劑混合,且將濃縮物用水稀釋至所要濃度。 To produce a suitable formulation of the active compound, 1 part by weight of the active compound or active compound combination is mixed with a defined amount of solvent and emulsifier, and the concentrate is diluted with water to the desired concentration.

為測試預防活性,以規定施用量對幼小植物噴施活性化合物或活性化合物組合之製劑。 To test the prophylactic activity, a preparation of the active compound or combination of active compounds is applied to the young plants at a prescribed application rate.

在噴霧塗層已乾燥之後,對該等植物撒佈禾本科布氏白粉菌大麥專化型(Blumeria graminis f.sp.hordei)之孢子。 After the spray coating has dried, the plants are sprinkled with spores of Blumeria graminis f . sp . hordei .

將植物置放於約18℃溫度及約80%相對大氣濕度下之溫室中以促進黴菌小皰之發育。 The plants are placed in a greenhouse at a temperature of about 18 ° C and about 80% relative atmospheric humidity to promote the development of mold vesicles.

在接種之後7天對測試進行評估。0%意謂對應於未經處理對照之功效,而100%之功效意謂未觀測到疾病。 The test was evaluated 7 days after the inoculation. 0% means the efficacy corresponding to the untreated control, while 100% means that no disease is observed.

在此等條件下,在具有來自表A之以下化合物之500ppm活性成分的劑量下觀測到極佳保護(至少90%)至完全保護: Under these conditions, excellent protection (at least 90%) was observed to a complete protection at a dose of 500 ppm active ingredient from the following compounds of Table A:

實例B:對蕓薹鏈格孢菌(蘿蔔葉斑病)之活體內預防性測試Example B: In vivo prophylactic testing against Alternaria alternata (radish leaf spot)

所測試之活性成分係藉由在丙酮/tween/DMSO之混合物中均質化來製備,隨後用水稀釋以獲得所要活性物質濃度。 The active ingredients tested were prepared by homogenization in a mixture of acetone/tween/DMSO, followed by dilution with water to obtain the desired concentration of active substance.

將蘿蔔植物(「Pernod Clair」品種)播種在起子杯(starter cup)中之50/50泥炭土火山灰基質上且在17℃下生長,在子葉期藉由噴施如上所述而製備之活性成分來處理。用不含活性物質之丙酮/tween/DMSO/水之混合物處理用作對照之植物。 The radish plants ("Pernod Clair" variety) were sown on a 50/50 peat soil pozzolan substrate in a starter cup and grown at 17 ° C, and the active ingredients prepared as described above were sprayed at the cotyledon stage. To handle. The plants used as controls were treated with a mixture of acetone/tween/DMSO/water without active substance.

24小時後,藉由對子葉噴施蕓薹鏈格孢菌孢子之水性懸浮液(每毫升50,000個孢子)使植物受污染。自15天齡之培養物收集孢子。在20℃及100%相對濕度下培育經污染之蘿蔔植物。 After 24 hours, the plants were contaminated by spraying the cotyledons with an aqueous suspension of Alternaria alternata spores (50,000 spores per ml). Spores were collected from cultures of 15 days of age. The contaminated radish plants were grown at 20 ° C and 100% relative humidity.

在污染之後6天,與對照植物相比進行分級(功效%)。 Six days after the contamination, classification (% efficacy) was performed compared to the control plants.

在此等條件下,在具有來自表B之以下化合物之500ppm活性成分的劑量下觀測到良好保護(至少70%)至完全保護: Under these conditions, good protection (at least 70%) to complete protection was observed at doses of 500 ppm active ingredient with the following compounds from Table B:

實例C:對灰葡萄孢菌(灰黴)之活體內預防性測試Example C: In vivo prophylactic testing of Botrytis cinerea (Gold mold)

所測試之活性成分係藉由在丙酮/tween/DMSO之混合物中均質化來製備,隨後用水稀釋以獲得所要活性物質濃度。 The active ingredients tested were prepared by homogenization in a mixture of acetone/tween/DMSO, followed by dilution with water to obtain the desired concentration of active substance.

將小黃瓜植物(「Vert petit de Paris」品種)播種在起子杯中之50/50泥炭土火山灰基質上且在24℃下生長,在Z11子葉期藉由噴施如上所述而製備之活性成分來處理。用不含活性物質之丙酮/tween/DMSO/水之混合物處理用作對照之植物。 The cucumber plant ("Vert petit de Paris" variety) was sown on a 50/50 peat soil pozzolan substrate in a starter cup and grown at 24 ° C, and the active ingredients prepared as described above were sprayed at the Z11 cotyledon stage. To handle. The plants used as controls were treated with a mixture of acetone/tween/DMSO/water without active substance.

24小時後,藉由對子葉噴施冷凍保存之灰葡萄孢菌孢子之水性懸浮液(每毫升50,000個孢子)使植物受污染。使孢子懸浮於由10g/L PDB、50g/L D-果糖、2g/L NH4NO3及1g/L KH2PO4構成之營養溶液中。在17℃及90%相對濕度下培育經污染之小黃瓜植物。 After 24 hours, the plants were contaminated by spraying the cotyledons with an aqueous suspension of cryopreserved spores of Botrytis cinerea (50,000 spores per ml). The spores were suspended in a nutrient solution consisting of 10 g/L PDB, 50 g/L D-fructose, 2 g/L NH 4 NO 3 and 1 g/L KH 2 PO 4 . The contaminated cucumber plants were grown at 17 ° C and 90% relative humidity.

在污染之後4至5天,與對照植物相比進行分級(功效%)。 Grades (% efficacy) were compared to control plants 4 to 5 days after contamination.

在此等條件下,在具有來自表C之以下化合物之500ppm活性成分的劑量下觀測到良好保護(至少70%)至完全保護: Under these conditions, good protection (at least 70%) to complete protection was observed at doses of 500 ppm active ingredient from the following compounds from Table C:

在相同條件下,在具有來自表C2之以下化合物之100ppm活性成分的劑量下觀測到良好保護(至少70%)至完全保護: Under the same conditions, good protection (at least 70%) to complete protection was observed at doses of 100 ppm active ingredient with the following compounds from Table C2:

實例D:對穎枯殼小球腔菌測試(小麥)之活體內預防性測試Example D: In vivo prophylactic testing of the genus Corydalis (Wheat)

溶劑:49重量份N,N-二甲基乙醯胺 Solvent: 49 parts by weight of N,N-dimethylacetamide

乳化劑:1重量份烷基芳基聚乙二醇醚 Emulsifier: 1 part by weight of alkyl aryl polyglycol ether

為產生活性化合物之適合製劑,將1重量份活性化合物或活性化合物組合與規定量之溶劑及乳化劑混合,且將濃縮物用水稀釋至所要濃度。 To produce a suitable formulation of the active compound, 1 part by weight of the active compound or active compound combination is mixed with a defined amount of solvent and emulsifier, and the concentrate is diluted with water to the desired concentration.

為測試預防活性,以規定施用量對幼小植物噴施活性化合物或活性化合物組合之製劑。 To test the prophylactic activity, a preparation of the active compound or combination of active compounds is applied to the young plants at a prescribed application rate.

在噴霧塗層已乾燥之後,對該等植物噴施穎枯殼小球腔菌之孢子懸浮液。使植物在約20℃及約100%相對大氣濕度下之培育箱中保持48小時。 After the spray coating has dried, the plants are sprayed with a spore suspension of the bacterium. The plants are maintained in an incubator at about 20 ° C and about 100% relative atmospheric humidity for 48 hours.

將植物置放於約22℃溫度及約80%相對大氣濕度下之溫室中。 The plants are placed in a greenhouse at a temperature of about 22 ° C and about 80% relative atmospheric humidity.

在接種之後8天對測試進行評估。0%意謂對應於未經處理對照之功效,而100%之功效意謂未觀測到疾病。 The test was evaluated 8 days after the inoculation. 0% means the efficacy corresponding to the untreated control, while 100% means that no disease is observed.

在此等條件下,在具有來自表D之以下化合物之500ppm活性成分的劑量下觀測到高度保護(至少80%)至完全保護: Under these conditions, a high degree of protection (at least 80%) to complete protection was observed at doses of 500 ppm active ingredient from the following compounds from Table D:

實例E:對圓核腔菌(大麥)之活體內預防性測試Example E: In vivo prophylactic testing of nucleus bacteria (barley)

所測試之活性成分係藉由在丙酮/tween/DMSO之混合物中均質化來製備,隨後用水稀釋以獲得所要活性物質濃度。 The active ingredients tested were prepared by homogenization in a mixture of acetone/tween/DMSO, followed by dilution with water to obtain the desired concentration of active substance.

將大麥植物(「Plaisant」品種)播種在起子杯中之50/50泥炭土火山灰基質上且在22℃下生長,在1葉期(10cm高度)藉由噴施如上所述 而製備之活性成分來處理。用不含活性物質之丙酮/tween/DMSO/水之混合物處理用作對照之植物。 Barley plants ("Plaisant" varieties) were sown on a 50/50 peat soil ash matrix in a starter cup and grown at 22 ° C, at the 1 leaf stage (10 cm height) by spraying as described above The active ingredient is prepared for treatment. The plants used as controls were treated with a mixture of acetone/tween/DMSO/water without active substance.

24小時後,藉由對葉子噴施圓核腔菌孢子之水性懸浮液(每毫升12,000個孢子)使植物受污染。自12天齡之培養物收集孢子。在20℃及100%相對濕度下培育經污染之大麥植物48小時,隨後在20℃、70-80%相對濕度下培養12天。 After 24 hours, the plants were contaminated by spraying the leaves with an aqueous suspension of the nucleus spores (12,000 spores per ml). Spores were collected from 12 day old cultures. The contaminated barley plants were incubated at 20 ° C and 100% relative humidity for 48 hours, followed by incubation at 20 ° C, 70-80% relative humidity for 12 days.

在污染之後14天,與對照植物相比進行分級(功效%)。 Fractionation (% efficacy) was performed 14 days after the contamination compared to the control plants.

在此等條件下,在具有來自表E之以下化合物之500ppm活性成分的劑量下觀測到良好保護(至少70%)至完全保護: Under these conditions, good protection (at least 70%) to complete protection was observed at doses of 500 ppm active ingredient with the following compounds from Table E:

在相同條件下,在具有來自表E2之以下化合物之100ppm活性成分的劑量下觀測到良好保護(70%)至極佳保護(至少95%): Under the same conditions, good protection (70%) to excellent protection (at least 95%) was observed at doses of 100 ppm active ingredient with the following compounds from Table E2:

在相同條件下,在具有實例I.84及I.144之化合物之100ppm活性成分的劑量下觀測到良好保護(至少70%)至高度保護(至少80%),而在如表E3中之專利申請案WO-2007/087906中所揭示之吡啶類似物CMP1的情況下未觀測到保護: Under the same conditions, good protection (at least 70%) to high protection (at least 80%) was observed at doses of 100 ppm active ingredient of the compounds of Examples I.84 and I.144, while the patents in Table E3 No protection was observed in the case of the pyridine analog CMP1 disclosed in application WO-2007/087906:

國際專利WO-2007/087906中所揭示之CMP1對應於N-[2-氯-4-(吡啶-3-基)苄基]-N-環丙基-3-(二氟甲基)-1-甲基-1H-吡唑-4-甲醯胺。 CMP1 disclosed in International Patent No. WO-2007/087906 corresponds to N-[2-chloro-4-(pyridin-3-yl)benzyl]-N-cyclopropyl-3-(difluoromethyl)-1 -Methyl-1H-pyrazole-4-carboxamide.

此等結果顯示本發明化合物具有比WO-2007/087906中所揭示之結構上最接近之化合物好得多的生物活性。 These results show that the compounds of the invention have much better biological activity than the structurally closest compounds disclosed in WO-2007/087906.

實例F:對稻梨孢菌(稻熱病)之活體內預防性測試Example F: In vivo prophylactic testing of Pyricularia oryzae (rice fever)

所測試之活性成分係藉由在丙酮/tween/DMSO之混合物中均質化來製備,隨後用水稀釋以獲得所要活性物質濃度。 The active ingredients tested were prepared by homogenization in a mixture of acetone/tween/DMSO, followed by dilution with water to obtain the desired concentration of active substance.

將水稻植物(「Koshihikari」品種)播種在起子杯中之50/50泥炭土火山灰基質上且在26℃下生長,在2葉期(10cm高度)藉由噴施如上所述而製備之活性成分來處理。用不含活性物質之丙酮/tween/DMSO/水之混合物處理用作對照之植物。 Rice plants ("Koshihikari" variety) were sown on a 50/50 peat soil pozzolan substrate in a starter cup and grown at 26 ° C, and the active ingredients prepared as described above were sprayed at the 2-leaf stage (10 cm height) by spraying To handle. The plants used as controls were treated with a mixture of acetone/tween/DMSO/water without active substance.

24小時後,藉由對葉子噴施稻梨孢菌孢子之水性懸浮液(每毫升40,000個孢子)使植物受污染。自15天齡之培養物收集孢子,且使其懸浮於含有2.5g/L明膠之水中。在25℃及80%相對濕度下培育經污染之水稻植物。 After 24 hours, the plants were contaminated by spraying the leaves with an aqueous suspension of Pyricularia oryzae spores (40,000 spores per ml). Spores were collected from the 15 day old culture and suspended in water containing 2.5 g/L gelatin. The contaminated rice plants were grown at 25 ° C and 80% relative humidity.

在污染之後6天,與對照植物相比進行分級(功效%)。 Six days after the contamination, classification (% efficacy) was performed compared to the control plants.

在此等條件下,在具有來自表F之以下化合物之500ppm活性成分的劑量下觀測到良好保護(至少70%)至高度保護(至少80%): Under these conditions, good protection (at least 70%) to high protection (at least 80%) was observed at doses of 500 ppm active ingredient from the following compounds of Table F:

實例G:對隱匿柄鏽菌(Puccinia recondita)(小麥褐銹病)之活體內預防Example G: In vivo prevention of Puccinia recondita (wheat brown rust) 性測試Sex test

所測試之活性成分係藉由在丙酮/tween/DMSO之混合物中均質化來製備,隨後用水稀釋以獲得所要活性物質濃度。 The active ingredients tested were prepared by homogenization in a mixture of acetone/tween/DMSO, followed by dilution with water to obtain the desired concentration of active substance.

將小麥植物(「Scipion」品種)播種在起子杯中之50/50泥炭土火山灰基質上且在22℃下生長,在1葉期(10cm高度)藉由噴施如上所述而製備之活性成分來處理。用不含活性物質之丙酮/tween/DMSO/水之混合物處理用作對照之植物。 The wheat plant ("Scipion" variety) was sown on a 50/50 peat soil pozzolan substrate in a starter cup and grown at 22 ° C, and the active ingredient prepared as described above was sprayed at the 1 leaf stage (10 cm height) by spraying. To handle. The plants used as controls were treated with a mixture of acetone/tween/DMSO/water without active substance.

在24小時之後,藉由對葉子噴施隱匿柄鏽菌孢子之水性懸浮液(每毫升100,000個孢子)使植物受污染。自受感染之植物收集孢子,且使其懸浮於含有2.5mL/L Tween 80(10%)之水中。在20℃及100%相對濕度下培育經污染之小麥植物24小時,隨後在20℃及70-80%相對濕度下培育10天。 After 24 hours, the plants were contaminated by spraying the leaves with an aqueous suspension of Puccinia recondita spores (100,000 spores per ml). Spores were collected from infected plants and suspended in water containing 2.5 mL/L Tween 80 (10%). The contaminated wheat plants were incubated at 20 ° C and 100% relative humidity for 24 hours, followed by incubation at 20 ° C and 70-80% relative humidity for 10 days.

在污染之後12天,與對照植物相比進行分級(功效%)。 Fractionation (% efficacy) was performed 12 days after the contamination compared to the control plants.

在此等條件下,在具有來自表G之以下化合物之500ppm活性成分的劑量下觀測到良好保護(至少70%)至完全保護: Under these conditions, good protection (at least 70%) to complete protection was observed at doses of 500 ppm active ingredient from the following compounds from Table G:

在相同條件下,在具有來自表G2之以下化合物之100ppm活性成分的劑量下觀測到良好保護(至少70%)至完全保護: Under the same conditions, good protection (at least 70%) to complete protection was observed at doses of 100 ppm active ingredient with the following compounds from Table G2:

在相同條件下,在具有實例I.77、I.78或I.79之化合物之100ppm及500ppm活性成分的劑量下觀測到平均保護(至少60%)至極佳保護(至少90%),而在如表G3中之專利申請案WO-2010/130767中所揭示之吡啶類似物CMP2的情況下觀測到不良保護(小於40%)至無保護: Under the same conditions, an average protection (at least 60%) to an excellent protection (at least 90%) was observed at doses of 100 ppm and 500 ppm active ingredient of the compound of Examples I.77, I.78 or I.79, A poor protection (less than 40%) was observed to no protection in the case of the pyridine analog CMP2 as disclosed in the patent application WO-2010/130767.

國際專利WO-2010/130767中所揭示之CMP2對應於5-氯-N-[2-氯-4-(吡啶-3-基)苄基]-N-環丙基-3-(二氟甲基)-1-甲基-1H-吡唑-4-甲醯胺。 CMP2 disclosed in International Patent No. WO-2010/130767 corresponds to 5-chloro-N-[2-chloro-4-(pyridin-3-yl)benzyl]-N-cyclopropyl-3-(difluoromethyl) Base)-1-methyl-1H-pyrazole-4-carboxamide.

此等結果顯示本發明化合物具有比WO-2010/130767中所揭示之結構上最接近之化合物好得多的生物活性。 These results show that the compounds of the invention have much better biological activity than the structurally closest compounds disclosed in WO-2010/130767.

實例H:對小麥殼針孢(Septoria tritici)(小麥)之活體內預防性測試Example H: In vivo prophylactic testing of Septoria tritici (wheat)

所測試之活性成分係藉由在丙酮/tween/DMSO之混合物中均質化來製備,隨後用水稀釋以獲得所要活性物質濃度。 The active ingredients tested were prepared by homogenization in a mixture of acetone/tween/DMSO, followed by dilution with water to obtain the desired concentration of active substance.

將小麥植物(「Scipion」品種)播種在起子杯中之50/50泥炭土火山灰基質上且在22℃下生長,在1葉期(10cm高度)藉由噴施如上所述 而製備之活性成分來處理。用不含活性物質之丙酮/tween/DMSO/水之混合物處理用作對照之植物。 Wheat plants ("Scipion" varieties) were sown on a 50/50 peat soil ash matrix in a starter cup and grown at 22 °C, at the 1 leaf stage (10 cm height) by spraying as described above The active ingredient is prepared for treatment. The plants used as controls were treated with a mixture of acetone/tween/DMSO/water without active substance.

24小時後,藉由對葉子噴施冷凍保存之小麥殼針孢孢子之水性懸浮液(每毫升500,000個孢子)使植物受污染。在18℃及100%相對濕度下培育經污染之小麥植物72小時,且隨後在90%相對濕度下培育21天。 After 24 hours, the plants were contaminated by spraying the leaves on a frozen suspension of the aqueous suspension of the genus Aspergillus sp. (500,000 spores per ml). The contaminated wheat plants were incubated at 18 ° C and 100% relative humidity for 72 hours and then incubated at 90% relative humidity for 21 days.

在污染之後24天,與對照植物相比進行分級(功效%)。 Grading (% efficacy) was compared to control plants 24 days after contamination.

在此等條件下,在具有來自表H之以下化合物之500ppm活性成分的劑量下觀測到良好保護(至少70%)至完全保護: Under these conditions, good protection (at least 70%) to complete protection was observed at doses of 500 ppm active ingredient with the following compounds from Table H:

在相同條件下,在具有來自表H2之以下化合物之100ppm活性成分的劑量下觀測到良好保護(至少70%)至完全保護: Under the same conditions, good protection (at least 70%) to complete protection was observed at doses of 100 ppm active ingredient with the following compounds from Table H2:

實例I:對單絲殼白粉菌(葫蘆白粉病)之活體內預防性測試Example I: In vivo prophylactic testing of powdery mildew of the monofilament shell (Gourd powdery mildew)

所測試之活性成分係藉由在丙酮/tween/DMSO之混合物中均質化來製備,隨後用水稀釋以獲得所要活性物質濃度。 The active ingredients tested were prepared by homogenization in a mixture of acetone/tween/DMSO, followed by dilution with water to obtain the desired concentration of active substance.

將小黃瓜植物(「Vert petit de Paris」品種)播種在起子杯中之50/50泥炭土-火山灰基質上且在24℃下生長,在Z11子葉期藉由噴施如上所述而製備之活性成分來處理。用不含活性物質之丙酮/tween/DMSO/水之混合物處理用作對照之植物。 The cucumber plant ("Vert petit de Paris" variety) was sown on a 50/50 peat soil-pozzolana substrate in a starter cup and grown at 24 °C, and the activity prepared as described above was sprayed at the Z11 cotyledon stage. Ingredients to deal with. The plants used as controls were treated with a mixture of acetone/tween/DMSO/water without active substance.

24小時後,藉由對子葉噴施單絲殼白粉菌孢子之水性懸浮液(每毫升100,000個孢子)使植物受污染。自受感染之植物收集孢子。在約20℃及70-80%相對濕度下培育經污染之小黃瓜植物。 After 24 hours, the plants were contaminated by spraying the cotyledons with an aqueous suspension of spores of P. sphaeroides (100,000 spores per ml). Spores are collected from infected plants. The contaminated cucumber plants are grown at about 20 ° C and 70-80% relative humidity.

在污染之後12天,與對照植物相比進行分級(功效%)。 Fractionation (% efficacy) was performed 12 days after the contamination compared to the control plants.

在此等條件下,在具有來自表I之以下化合物之500ppm活性成分的劑量下觀測到良好保護(至少70%)至完全保護: Under these conditions, good protection (at least 70%) to complete protection was observed at doses of 500 ppm active ingredient from the following compounds of Table I:

在相同條件下,在具有來自表I2之以下化合物之100ppm活性成 分的劑量下觀測到良好保護(至少70%)至完全保護: Under the same conditions, good protection (at least 70%) to complete protection was observed at doses of 100 ppm active ingredient with the following compounds from Table I2:

在相同條件下,在具有實例I.144之化合物之100ppm活性成分的劑量下觀測到完全保護,而在如表I3中之專利申請案WO-2007/087906中所揭示之吡啶類似物CMP1的情況下觀測到無保護: Under the same conditions, complete protection is observed at a dose of 100 ppm of the active ingredient of the compound of Example I.144, as is the case of the pyridine analog CMP1 as disclosed in the patent application WO-2007/087906, which is incorporated herein by reference. No protection observed below:

國際專利WO-2007/087906中所揭示之CMP1對應於N-[2-氯-4-(吡啶-3-基)苄基]-N-環丙基-3-(二氟甲基)-1-甲基-1H-吡唑-4-甲醯胺。 CMP1 disclosed in International Patent No. WO-2007/087906 corresponds to N-[2-chloro-4-(pyridin-3-yl)benzyl]-N-cyclopropyl-3-(difluoromethyl)-1 -Methyl-1H-pyrazole-4-carboxamide.

此等結果顯示本發明化合物具有比WO-2007/087906中所揭示之結構上最接近之化合物好得多的生物活性。 These results show that the compounds of the invention have much better biological activity than the structurally closest compounds disclosed in WO-2007/087906.

在相同條件下,在具有實例I.139(相應地,I.140、I.141、I.144及I.145)之化合物之500ppm活性成分的劑量下觀測到極佳保護(至少90%)至完全保護,而在如表I4中之專利申請案WO-2007/087906或WO-2010/130767中所主張之吡啶類似物CMP3(相應地,CMP4、CMP5、CMP6及CMP7)的情況下觀測到不良保護(小於40%)或植物損壞: Excellent protection (at least 90%) was observed under the same conditions at a dose of 500 ppm active ingredient of the compound of Example I.139 (correspondingly, I.140, I.141, I.144 and I.145) Observed to the case of the pyridine analog CMP3 (respectively, CMP4, CMP5, CMP6 and CMP7) as claimed in the patent application WO-2007/087906 or WO-2010/130767, as shown in Table I4. Poor protection (less than 40%) or plant damage:

國際專利WO-2010/130767中所揭示之CMP3對應於N-[2-(6-氯吡啶-2-基)苄基]-N-環丙基-3-(二氟甲基)-5-氟-1-甲基-1H-吡唑-4-甲醯胺;國際專利WO-2007/087906中所揭示之CMP4對應於N-[2-(6-氯吡啶-2-基)苄基]-N-環丙基-3-(二氟甲基)-1-甲基-1H-吡唑-4-甲醯胺;國際專利WO-2010/130767中所揭示之CMP5對應於5-氯-N-[2-(6-氯吡啶-2-基)苄基]-N-環丙基-3-(二氟甲基)-1-甲基-1H-吡唑-4-甲醯胺;國際專利WO-2007/087906中所揭示之CMP6對應於N-[5-氯-2-(6-氯吡啶-2-基)苄基]-N-環丙基-3-(二氟甲基)-1-甲基-1H-吡唑-4-甲醯胺;及國際專利WO-2010/130767中所揭示之CMP7對應於5-氯-N-[5-氯-2-(6-氯吡啶-2-基)苄基]-N-環丙基-3-(二氟甲基)-1-甲基-1H-吡唑-4-甲醯胺。 CMP3 disclosed in International Patent No. WO-2010/130767 corresponds to N-[2-(6-chloropyridin-2-yl)benzyl]-N-cyclopropyl-3-(difluoromethyl)-5- Fluoro-1-methyl-1H-pyrazole-4-carboxamide; CMP4 disclosed in International Patent WO-2007/087906 corresponds to N-[2-(6-chloropyridin-2-yl)benzyl] -N-cyclopropyl-3-(difluoromethyl)-1-methyl-1H-pyrazole-4-carboxamide; CMP5 disclosed in International Patent WO-2010/130767 corresponds to 5-chloro- N-[2-(6-chloropyridin-2-yl)benzyl]-N-cyclopropyl-3-(difluoromethyl)-1-methyl-1H-pyrazole-4-carboxamide; CMP6 disclosed in International Patent No. WO-2007/087906 corresponds to N-[5-chloro-2-(6-chloropyridin-2-yl)benzyl]-N-cyclopropyl-3-(difluoromethyl) -1-methyl-1H-pyrazole-4-carboxamide; and CMP7 disclosed in International Patent WO-2010/130767 corresponds to 5-chloro-N-[5-chloro-2-(6-chloro) Pyridin-2-yl)benzyl]-N-cyclopropyl-3-(difluoromethyl)-1-methyl-1H-pyrazole-4-carboxamide.

此等結果顯示本發明化合物具有比WO-2007/087906中所揭示之結構上最接近之化合物好得多的生物活性。 These results show that the compounds of the invention have much better biological activity than the structurally closest compounds disclosed in WO-2007/087906.

實例J:對菜豆銹病菌(豆銹病)之活體內預防性測試Example J: In vivo prophylactic testing of bean rust (bean rust)

所測試之活性成分係藉由在丙酮/tween/DMSO之混合物中均質化來製備,隨後用水稀釋以獲得所要活性物質濃度。 The active ingredients tested were prepared by homogenization in a mixture of acetone/tween/DMSO, followed by dilution with water to obtain the desired concentration of active substance.

將豆植物(「Saxa」品種)播種在起子杯中之50/50泥炭土火山灰基質上且在24℃下生長,在2葉期(9cm高度)藉由噴施如上所述而製備之活性成分來處理。用不含活性物質之丙酮/tween/DMSO/水之混合物處理用作對照之植物。 Bean plants ("Saxa" variety) were sown on a 50/50 peat soil pozzolan substrate in a starter cup and grown at 24 ° C, and the active ingredients prepared as described above were sprayed at the 2-leaf stage (9 cm height) by spraying. To handle. The plants used as controls were treated with a mixture of acetone/tween/DMSO/water without active substance.

24小時後,藉由對葉子噴施菜豆銹病菌孢子之水性懸浮液(每毫升150,000個孢子)使植物受污染。自受感染之植物收集孢子,且使其懸浮於含有2.5mL/L Tween 80(10%)之水中。在20℃及100%相對濕度下培育經污染之豆植物24小時,隨後在20℃及70-80%相對濕度下培育10天。 After 24 hours, the plants were contaminated by spraying the leaves with an aqueous suspension of spores of R. solani (150,000 spores per ml). Spores were collected from infected plants and suspended in water containing 2.5 mL/L Tween 80 (10%). The contaminated bean plants were incubated at 20 ° C and 100% relative humidity for 24 hours, followed by incubation at 20 ° C and 70-80% relative humidity for 10 days.

在污染之後11天,與對照植物相比進行分級(功效%)。 Eleven days after the contamination, the fractionation (% efficacy) was performed compared to the control plants.

在此等條件下,在具有來自表J之以下化合物之500ppm活性成分的劑量下觀測到良好保護(至少70%)至完全保護: Under these conditions, good protection (at least 70%) to complete protection was observed at doses of 500 ppm active ingredient from the following compounds from Table J:

在相同條件下,在具有來自表J2之以下化合物之100ppm活性成分的劑量下觀測到良好保護(至少70%)至完全保護: Under the same conditions, good protection (at least 70%) to complete protection was observed at doses of 100 ppm active ingredient with the following compounds from Table J2:

實例K:對蘋果黑星病菌(蘋果)之活體內預防性測試Example K: In vivo prophylactic testing of apple scab (Apple)

溶劑:24.5重量份丙酮 Solvent: 24.5 parts by weight of acetone

24.5重量份N,N-二甲基乙醯胺 24.5 parts by weight of N,N-dimethylacetamide

乳化劑:1重量份烷基芳基聚乙二醇醚 Emulsifier: 1 part by weight of alkyl aryl polyglycol ether

為產生活性化合物之適合製劑,將1重量份活性化合物與規定量之溶劑及乳化劑混合,且將濃縮物用水稀釋至所要濃度。 To produce a suitable formulation of the active compound, 1 part by weight of active compound is mixed with a defined amount of solvent and emulsifier, and the concentrate is diluted with water to the desired concentration.

為測試預防活性,以規定施用量對幼小植物噴施活性化合物製劑。在噴霧塗層已乾燥之後,對植物接種蘋果黑星病致病因子(蘋果黑星病菌)之水性分生孢子懸浮液,隨後在約20℃及100%相對大氣濕度下之培育箱中保持1天。 To test the prophylactic activity, the active compound preparation is sprayed onto the young plants at a prescribed application rate. After the spray coating has dried, the plant is inoculated with an aqueous conidia suspension of the apple scab pathogenic factor (Apple black spot), which is then maintained in an incubator at about 20 ° C and 100% relative atmospheric humidity. day.

隨後將植物置放在約21℃及約90%相對大氣濕度下之溫室中。 The plants are then placed in a greenhouse at about 21 ° C and about 90% relative atmospheric humidity.

在接種之後10天對測試進行評估。0%意謂對應於未經處理對照之功效,而100%之功效意謂未觀測到疾病。 The test was evaluated 10 days after inoculation. 0% means the efficacy corresponding to the untreated control, while 100% means that no disease is observed.

在此等條件下,在具有來自表K之以下化合物之100ppm活性成分的劑量下觀測到極佳保護(至少90%)至完全保護: Under these conditions, excellent protection (at least 90%) was observed to a complete protection at doses of 100 ppm active ingredient from the following compounds of Table K:

Claims (26)

一種式(I)化合物, 其中A表示碳連接之不飽和或部分飽和5員雜環基,其可經多至四個可相同或不同之基團R取代;T表示O或S;n表示0、1、2、3或4;L表示直接鍵、CZ4Z5、O、S、SO、SO2或NZ6;B表示包含1至4個選自由N、O、S組成之清單之雜原子的飽和、部分飽和或不飽和單環或稠合雙環3、4、5、6、7、8、9或10員環,其可經多至6個可相同或不同之基團Y取代;限制條件為當L表示直接鍵或氧原子時,B不表示吡啶基環;Z1表示未經取代之C3-C7環烷基或經多至10個原子或基團取代之C3-C7環烷基,該等原子或基團可相同或不同且可選自由以下組成之清單:鹵素原子、氰基、C1-C8烷基、包含多至9個可相同或不同之鹵素原子之C1-C8鹵烷基、C1-C8烷氧基、包含多至9個可相同或不同之鹵素原子之C1-C8鹵烷氧基、C1-C8烷氧基羰基、包含多至9個可相同或不同之鹵素原子之C1-C8鹵烷氧基羰基、C1-C8烷基胺基羰基或二-C1-C8烷基胺基羰基;Z2及Z3可相同或不同,表示氫原子;經取代或未經取代之C1-C8烷基;經取代或未經取代之C2-C8烯基;經取代或未經取 代之C2-C8炔基;氰基;異腈基;硝基;鹵素原子;經取代或未經取代之C1-C8烷氧基;經取代或未經取代之C2-C8烯氧基;經取代或未經取代之C2-C8炔氧基;經取代或未經取代之C3-C7環烷基;經取代或未經取代之C1-C8烷基硫基(sulfanyl);經取代或未經取代之C1-C8烷基磺醯基;經取代或未經取代之C1-C8烷基亞磺醯基;胺基;經取代或未經取代之C1-C8烷基胺基;經取代或未經取代之二-C1-C8烷基胺基;經取代或未經取代之C1-C8烷氧基羰基;經取代或未經取代之C1-C8烷基胺甲醯基;經取代或未經取代之二-C1-C8烷基胺甲醯基;或經取代或未經取代之N-C1-C8烷基-C1-C8烷氧基-胺甲醯基;或Z2及Z3與其所連接之碳原子一起可形成經取代或未經取代之C3-C7環烷基;或Z3及與苯基環之連接點相鄰之取代基X與彼等所連接之連續碳原子一起可形成包含多至3個雜原子之經取代或未經取代之5、6或7員部分飽和碳環或雜環,且Z2如本文所述;Z4及Z5獨立地表示氫原子;鹵素原子;氰基;經取代或未經取代之C1-C8烷基;具有1至5個鹵素原子之C1-C8鹵烷基;經取代或未經取代之C1-C8烷氧基;經取代或未經取代之C1-C8烷基硫基;或經取代或未經取代之C1-C8烷氧基羰基;或Z4及Z5與其所連接之碳原子一起可形成C(=O)羰基;Z6表示氫原子;經取代或未經取代之C1-C8烷基;包含多至9個可相同或不同之鹵素原子之C1-C8鹵烷基;經取代或未經取代之C2-C8烯基;包含多至9個可相同或不同之鹵素原子之C2-C8鹵烯基;經取代或未經取代之C3-C8炔基;包含多至9個可相同或不同之鹵素原子之C3-C8鹵炔基;經取代或未經取代之C3-C7環烷基;包含多至9個可相同或不同之鹵素原子之C3-C7鹵環 烷基;經取代或未經取代之C3-C7環烷基-C1-C8烷基;甲醯基;經取代或未經取代之C1-C8烷基羰基;包含多至9個可相同或不同之鹵素原子之C1-C8鹵烷基羰基;經取代或未經取代之C1-C8烷氧基羰基;包含多至9個可相同或不同之鹵素原子之C1-C8鹵烷氧基羰基;經取代或未經取代之C1-C8烷基磺醯基;包含多至9個可相同或不同之鹵素原子之C1-C8鹵烷基磺醯基;經取代或未經取代之苄基;或經取代或未經取代之苯基磺醯基;X獨立地表示鹵素原子;硝基;氰基;異腈基;羥基;胺基;硫基;五氟-λ6-硫基;甲醯基;甲醯氧基;甲醯胺基;經取代或未經取代之(羥亞胺基)-C1-C8烷基;經取代或未經取代之(C1-C8烷氧基亞胺基)-C1-C8烷基;經取代或未經取代之(C2-C8烯氧基亞胺基)-C1-C8烷基;經取代或未經取代之(C2-C8炔氧基亞胺基)-C1-C8烷基;經取代或未經取代之(苄氧基亞胺基)-C1-C8烷基;羧基;胺甲醯基;N-羥基胺甲醯基;胺基甲酸酯基;經取代或未經取代之C1-C8烷基;具有1至9個鹵素原子之C1-C8鹵烷基;經取代或未經取代之C2-C8烯基;具有1至9個鹵素原子之C2-C8鹵烯基;經取代或未經取代之C2-C8炔基;具有1至9個鹵素原子之C2-C8鹵炔基;經取代或未經取代之C1-C8烷氧基;具有1至9個鹵素原子之C1-C8鹵烷氧基;經取代或未經取代之C1-C8烷基硫基;具有1至9個鹵素原子之C1-C8鹵烷基硫基;經取代或未經取代之C1-C8烷基亞磺醯基;具有1至9個鹵素原子之C1-C8鹵烷基亞磺醯基;經取代或未經取代之C1-C8烷基磺醯基;具有1至9個鹵素原子之C1-C8鹵烷基磺醯基;經取代或未經取代之C1-C8烷基胺基;經取代或未經取代之二-C1-C8烷基胺基;經取代或未經取代之C2-C8烯氧基;具有1至9個鹵素原子之C2-C8鹵烯氧基;經取代或未經取代之C3-C8炔氧 基;具有1至9個鹵素原子之C2-C8鹵炔氧基;經取代或未經取代之C3-C7環烷基;具有1至9個鹵素原子之C3-C7鹵環烷基;經取代或未經取代之(C3-C7環烷基)-C1-C8烷基;經取代或未經取代之C4-C7環烯基;具有1至9個鹵素原子之C4-C7鹵環烯基;經取代或未經取代之(C3-C7環烷基)-C2-C8烯基;經取代或未經取代之(C3-C7環烷基)-C2-C8炔基;經取代或未經取代之三(C1-C8)烷基矽烷基;經取代或未經取代之三(C1-C8)烷基矽烷基-C1-C8烷基;經取代或未經取代之C1-C8烷基羰基;具有1至9個鹵素原子之C1-C8鹵烷基羰基;經取代或未經取代之C1-C8烷基羰氧基;具有1至9個鹵素原子之C1-C8鹵烷基羰氧基;經取代或未經取代之C1-C8烷基羰基胺基;具有1至9個鹵素原子之C1-C8鹵烷基羰基胺基;經取代或未經取代之C1-C8烷氧基羰基;具有1至9個鹵素原子之C1-C8鹵烷氧基羰基;經取代或未經取代之C1-C8烷氧基羰氧基;具有1至9個鹵素原子之C1-C8鹵烷氧基羰氧基;經取代或未經取代之C1-C8烷基胺甲醯基;經取代或未經取代之二-C1-C8烷基胺甲醯基;經取代或未經取代之C1-C8烷基胺基羰氧基;經取代或未經取代之二-C1-C8烷基胺基羰氧基;經取代或未經取代之N-(C1-C8烷基)羥基胺甲醯基;經取代或未經取代之C1-C8烷氧基胺甲醯基;經取代或未經取代之N-(C1-C8烷基)-C1-C8烷氧基胺甲醯基;可經多至6個可相同或不同之基團Q取代之芳基;可經多至6個可相同或不同之基團Q取代之芳基-C1-C8烷基;可經多至6個可相同或不同之基團Q取代之芳基-C2-C8烯基;可經多至6個可相同或不同之基團Q取代之芳基-C2-C8炔基;可經多至6個可相同或不同之基團Q取代之芳氧基;可經多至6個可相同或不同之基團Q取代之芳基硫基;可經多至6個可相同或不同之基團Q取代之芳基胺基;可 經多至6個可相同或不同之基團Q取代之芳基-C1-C8烷氧基;可經多至6個可相同或不同之基團Q取代之芳基-C1-C8烷基硫基;可經多至6個可相同或不同之基團Q取代之芳基-C1-C8烷基胺基;可經多至4個基團Q取代之吡啶基;或可經多至4個基團Q取代之吡啶氧基;Y獨立地表示鹵素原子;氰基;羥基;胺基;硫基;經取代或未經取代之C1-C8烷基;具有1至9個鹵素原子之C1-C8鹵烷基;經取代或未經取代之C1-C8烷氧基;具有1至9個鹵素原子之C1-C8鹵烷氧基;經取代或未經取代之C1-C8烷基硫基;具有1至9個鹵素原子之C1-C8鹵烷基硫基;經取代或未經取代之C1-C8烷基亞磺醯基;具有1至9個鹵素原子之C1-C8鹵烷基亞磺醯基;經取代或未經取代之C1-C8烷基磺醯基;具有1至9個鹵素原子之C1-C8鹵烷基磺醯基;經取代或未經取代之C1-C8烷基胺基;經取代或未經取代之二-C1-C8烷基胺基;經取代或未經取代之C1-C8烷基羰基;具有1至9個鹵素原子之C1-C8鹵烷基羰基;經取代或未經取代之C1-C8烷氧基羰基;具有1至9個鹵素原子之C1-C8鹵烷氧基羰基;或可經多至6個可相同或不同之基團Q取代之芳基;Q獨立地表示鹵素原子、氰基、硝基、經取代或未經取代之C1-C8烷基、包含多至9個可相同或不同之鹵素原子之C1-C8鹵烷基、經取代或未經取代之C1-C8烷氧基、包含多至9個可相同或不同之鹵素原子之C1-C8鹵烷氧基、經取代或未經取代之C1-C8烷基硫基、包含多至9個可相同或不同之鹵素原子之C1-C8鹵烷基硫基、經取代或未經取代之三(C1-C8)烷基矽烷基、經取代或未經取代之三(C1-C8)烷基矽烷基-C1-C8烷基、經取代或未經取代之(C1-C8烷氧基亞胺基)-C1-C8烷基或經取代或未經取代 之(苄氧基亞胺基)-C1-C8烷基;R獨立地表示氫原子;鹵素原子;硝基;氰基;羥基;胺基;硫基;五氟-λ6-硫基;經取代或未經取代之(C1-C8烷氧基亞胺基)-C1-C8烷基;經取代或未經取代之(苄氧基亞胺基)-C1-C8烷基;經取代或未經取代之C1-C8烷基;具有1至9個鹵素原子之C1-C8鹵烷基;經取代或未經取代之C2-C8烯基;具有1至9個鹵素原子之C2-C8鹵烯基;經取代或未經取代之C2-C8炔基;具有1至9個鹵素原子之C2-C8鹵炔基;經取代或未經取代之C1-C8烷氧基;具有1至9個鹵素原子之C1-C8鹵烷氧基;經取代或未經取代之C1-C8烷基硫基;具有1至9個鹵素原子之C1-C8鹵烷基硫基;經取代或未經取代之C1-C8烷基亞磺醯基;具有1至9個鹵素原子之C1-C8鹵烷基亞磺醯基;經取代或未經取代之C1-C8烷基磺醯基;具有1至9個鹵素原子之C1-C8鹵烷基磺醯基;經取代或未經取代之C1-C8烷基胺基;經取代或未經取代之二-C1-C8烷基胺基;經取代或未經取代之C2-C8烯氧基;經取代或未經取代之C3-C8炔氧基;經取代或未經取代之C3-C7環烷基;具有1至9個鹵素原子之C3-C7鹵環烷基;經取代或未經取代之三(C1-C8)烷基矽烷基;經取代或未經取代之C1-C8烷基羰基;具有1至9個鹵素原子之C1-C8鹵烷基羰基;經取代或未經取代之C1-C8烷氧基羰基;具有1至9個鹵素原子之C1-C8鹵烷氧基羰基;經取代或未經取代之C1-C8烷基胺甲醯基;經取代或未經取代之二-C1-C8烷基胺甲醯基;苯氧基;苯基硫基;苯基胺基;苄氧基;苄基硫基;或苄基胺基;以及其鹽、N-氧化物、金屬錯合物、類金屬錯合物及其光學活性異構體或幾何異構體。 a compound of formula (I), Wherein A represents a carbon-linked unsaturated or partially saturated 5-membered heterocyclic group which may be substituted with up to four groups R which may be the same or different; T represents O or S; n represents 0, 1, 2, 3 or 4; L represents a direct bond, CZ 4 Z 5, O, S, SO, SO 2 or NZ 6; B represents containing from 1 to 4 selected from the group consisting of N, the saturated hetero atoms list of O, S composition, the partially saturated or An unsaturated monocyclic or fused bicyclic 3, 4, 5, 6, 7, 8, 9 or 10 membered ring which may be substituted with up to 6 groups which may be the same or different Y; the limitation is when L represents direct when a bond or an oxygen atom, B represents a pyridyl ring not; Z 1 represents a non-substituted C 3 -C 7 cycloalkyl or substituted alkyl of up to 10 atoms or groups C 3 -C 7 cycloalkyl, which other atoms or groups may be the same or different and are selected from the list consisting of: a halogen atom, a cyano group, C 1 -C 8 alkyl group, may contain up to 9 identical or different halogen atoms C 1 -C 8 haloalkyl, C 1 -C 8 alkoxy group, may contain up to 9 identical or different halogen atoms C 1 -C 8 haloalkoxy, C 1 -C 8 alkoxycarbonyl group, comprising up to 9 It may be the same or different halogen atoms, C 1 -C 8 haloalkoxy of Carbonyl group, C 1 -C 8 alkyl aminocarbonyl or di -C 1 -C 8 alkylamino-carbonyl group; Z 2 and Z 3 may be the same or different, represent a hydrogen atom; a substituted or unsubstituted C 1 of -C 8 alkyl; substituted or unsubstituted C 2 -C 8 alkenyl; substituted or unsubstituted C 2 -C 8 alkynyl; cyano; isonitrile; nitro; halogen atom; Substituted or unsubstituted C 1 -C 8 alkoxy; substituted or unsubstituted C 2 -C 8 alkenyloxy; substituted or unsubstituted C 2 -C 8 alkynyloxy; substituted or Unsubstituted C 3 -C 7 cycloalkyl; substituted or unsubstituted C 1 -C 8 alkylsulfanyl; substituted or unsubstituted C 1 -C 8 alkylsulfonyl Substituted or unsubstituted C 1 -C 8 alkylsulfinyl; amine; substituted or unsubstituted C 1 -C 8 alkylamino; substituted or unsubstituted bis-C 1 -C 8 alkyl group; a substituted or unsubstituted of C 1 -C 8 alkoxycarbonyl group; a substituted or unsubstituted of C 1 -C 8 alkyl amine acyl; substituted or non- Substituted bis-C 1 -C 8 alkylamine carbenyl; or substituted or unsubstituted NC 1 -C 8 alkyl-C 1 -C 8 alkoxy a carbylamine group; or Z 2 and Z 3 together with the carbon atom to which they are attached may form a substituted or unsubstituted C 3 -C 7 cycloalkyl group; or Z 3 and a point of attachment to the phenyl ring The adjacent substituents X together with the consecutive carbon atoms to which they are attached may form a substituted or unsubstituted 5, 6 or 7 membered partially saturated carbocyclic or heterocyclic ring containing up to 3 heteroatoms, and Z 2 Z 4 and Z 5 independently represent a hydrogen atom; a halogen atom; a cyano group; a substituted or unsubstituted C 1 -C 8 alkyl group; a C 1 -C 8 halogen having 1 to 5 halogen atoms; Alkyl; substituted or unsubstituted C 1 -C 8 alkoxy; substituted or unsubstituted C 1 -C 8 alkylthio; or substituted or unsubstituted C 1 -C 8 alkane An oxycarbonyl group; or Z 4 and Z 5 together with the carbon atom to which they are attached may form a C(=O)carbonyl group; Z 6 represents a hydrogen atom; a substituted or unsubstituted C 1 -C 8 alkyl group; 9 may be the same or different of halogen atom, C 1 -C 8 haloalkyl; substituted or non-substituted C 2 -C 8 alkenyl group; can contain up to 9 identical or different halogen atoms C 2 - C 8 haloalkenyl; substituted or unsubstituted C 3 -C 8 alkynyl; comprising up to 9 halogen atoms may be the same or different C 3 -C 8 haloalkynyl; substituted or non-substituted C 3 -C 7 cycloalkyl; comprising up to 9 C may be the same or different halogen atoms 3 -C 7 cycloalkyl, halogen; substituted or non-substituted C 3 -C 7 cycloalkyl, -C 1 -C 8 alkyl; methyl acyl; substituted or unsubstituted the substituted C 1 -C 8 alkylcarbonyl; can contain up to 9 identical or different halogen atoms C 1 -C 8 haloalkyl carbonyl group; substituted or non-substituted C 1 -C 8 alkoxy, a carbonyl group; a C 1 -C 8 haloalkoxycarbonyl group containing up to 9 halogen atoms which may be the same or different; a substituted or unsubstituted C 1 -C 8 alkylsulfonyl group; containing up to 9 a C 1 -C 8 haloalkylsulfonyl group of the same or different halogen atom; a substituted or unsubstituted benzyl group; or a substituted or unsubstituted phenylsulfonyl group; X independently represents a halogen atom; Nitro; cyano; isocyanyl; hydroxy; amine; thio; pentafluoro-λ 6 -thio; indolyl; methyl methoxy; methionine; substituted or unsubstituted (hydroxy imino) -C 1 -C 8 alkyl group; a substituted or unsubstituted (C 1 -C 8 alkoxyimino group) -C 1 -C 8 alkyl; substituted or non-substituted (C 2 -C 8 alkylene oxyalkylene amine) -C 1 -C 8 alkyl Substituted or unsubstituted (C 2 -C 8 alkynyloxyimido)-C 1 -C 8 alkyl; substituted or unsubstituted (benzyloxyimino)-C 1 -C 8 alkyl; carboxy; amine carbenyl; N-hydroxylamine carbenyl; carbamate; substituted or unsubstituted C 1 -C 8 alkyl; C having 1 to 9 halogen atoms 1 -C 8 haloalkyl; substituted or non-substituted C 2 -C 8 alkenyl; 2 -C 8 haloalkenyl group having a C 1 to halogen atoms. 9; substituted or non-substituted C 2 - C 8 alkynyl group; a C 1 to having halogen atoms. 9 2 -C 8 haloalkynyl; substituted or non-substituted C 1 -C 8 alkoxy group; a C 1 to having halogen atoms. 9 1 -C 8 haloalkoxy; substituted or non-substituted C 1 -C 8 alkylthio; having a C 1 to halogen atoms. 9 1 -C 8 haloalkyl group; a substituted or unsubstituted of C a 1- C 8 alkylsulfinyl group; a C 1 -C 8 haloalkylsulfinyl group having 1 to 9 halogen atoms; a substituted or unsubstituted C 1 -C 8 alkylsulfonyl group; With 1 to 9 halogens Son halo C 1 -C 8 alkylsulfonyl group; a substituted or unsubstituted of C 1 -C 8 alkyl group; a substituted or unsubstituted bis -C 1 -C 8 alkylamino; substituted or non-substituted C 2 -C 8 alkenyl group; a C 1 to having halogen atoms. 9 2 -C 8 alkenyl group, a halogen; substituted or non-substituted C 3 -C 8 alkynyl group; having a C 1 to halogen atoms. 9 2 -C 8 alkynyl group, a halogen; substituted or non-substituted C 3 -C 7 cycloalkyl group; a C 1 to having halogen atoms. 9 3 -C 7 cycloalkyl halo group; substituted or non-substituted (C 3 -C 7 cycloalkyl) -C 1 -C 8 alkyl; substituted or non-substituted C 4 -C 7 cycloalkenyl; having 1-9 halo C 4 -C 7 halocycloalkenyl; a substituted or unsubstituted (C 3 -C 7 cycloalkyl)-C 2 -C 8 alkenyl group; substituted or unsubstituted (C 3 -C a 7 -cycloalkyl)-C 2 -C 8 alkynyl group; a substituted or unsubstituted tri(C 1 -C 8 )alkyldecane group; a substituted or unsubstituted tris(C 1 -C 8 ) alkane silicon alkyl group -C 1 -C 8 alkyl; substituted or non-substituted C 1 -C 8 alkylcarbonyl group; a C 1 to having halogen atoms. 9 1 -C 8 haloalkyl carbonyl group; a substituted or unsubstituted Substituted C 1 -C 8 -alkylcarbonyloxy; C 1 -C 8 haloalkylcarbonyloxy having 1 to 9 halogen atoms; substituted or unsubstituted C 1 -C 8 alkylcarbonylamino group; having 1 to 9 a halogen atoms C 1 -C 8 haloalkyl carbonyl group; substituted or non-substituted C 1 -C 8 alkoxycarbonyl group; a C 1 to having halogen atoms. 9 1 -C 8 haloalkoxy-carbonyl ; substituted or non-substituted C 1 -C 8 alkoxycarbonyl group; a C 1 to having halogen atoms. 9 1 -C 8 haloalkoxy-carbonyl group; a substituted or unsubstituted C 1 of -C 8 alkylamine carbenyl; substituted or unsubstituted bis-C 1 -C 8 alkylamine carbenyl; substituted or unsubstituted C 1 -C 8 alkylaminocarbonyloxy Substituted or unsubstituted bis-C 1 -C 8 alkylaminocarbonyloxy group; substituted or unsubstituted N-(C 1 -C 8 alkyl)hydroxylamine carbenyl; substituted or Unsubstituted C 1 -C 8 alkoxyamine indenyl; substituted or unsubstituted N-(C 1 -C 8 alkyl)-C 1 -C 8 alkoxyamine indenyl; An aryl group substituted with up to 6 groups which may be the same or different, Q; an aryl-C 1 -C 8 alkyl group which may be substituted with up to 6 groups which may be the same or different. ; It may be up to 6 may be the same or different Q groups substituted aryl group of -C 2 -C 8 alkenyl group; may be up to 6 may be the same or different substituent groups of the aryl group Q -C 2 - a C 8 alkynyl group; an aryloxy group which may be substituted with up to 6 groups which may be the same or different Q; an arylthio group which may be substituted with up to 6 groups Q which may be the same or different; 6 arylamino groups which may be substituted with the same or different groups Q; aryl-C 1 -C 8 alkoxy groups which may be substituted with up to 6 groups which may be the same or different Q; may be up to 6 may be the same or different substituent groups of Q aryl -C 1 -C 8 alkylthio; may be up to 6 may be the same or different substituent groups of Q aryl -C 1 -C 8 alkyl An amino group; a pyridyl group which may be substituted with up to 4 groups of Q; or a pyridyloxy group which may be substituted with up to 4 groups of Q; Y independently represents a halogen atom; a cyano group; a hydroxyl group; an amine group; ; substituted or non-substituted C 1 -C 8 alkyl group; a C 1 to having halogen atoms. 9 1 -C 8 haloalkyl; substituted or non-substituted C 1 -C 8 alkoxy; having 1-9 halogen atoms C 1 -C 8 haloalkoxy; a substituted or unsubstituted alkyl group of C 1 -C 8 Group; a C 1 to having halogen atoms. 9 1 -C 8 haloalkyl group; a substituted or unsubstituted of C 1 -C 8 alkylsulfinyl acyl; having a C 1 to 1. 9 halogen atoms -C 8 haloalkylsulfinyl; substituted or unsubstituted C 1 -C 8 alkylsulfonyl; C 1 -C 8 haloalkylsulfonyl having 1 to 9 halogen atoms; Substituted or unsubstituted C 1 -C 8 alkylamino group; substituted or unsubstituted di-C 1 -C 8 alkylamino group; substituted or unsubstituted C 1 -C 8 alkylcarbonyl group a C 1 -C 8 haloalkylcarbonyl group having 1 to 9 halogen atoms; a substituted or unsubstituted C 1 -C 8 alkoxycarbonyl group; a C 1 -C 8 halogen having 1 to 9 halogen atoms; alkoxycarbonyl group; or may be up to 6 may be the same or different substituent groups of the aryl group Q; Q independently represents a halogen atom, a cyano group, a nitro group, a substituted or unsubstituted of C 1 -C 8 An alkyl group, a C 1 -C 8 haloalkyl group containing up to 9 halogen atoms which may be the same or different, a substituted or unsubstituted C 1 -C 8 alkoxy group, containing up to 9 may be the same or different a C 1 -C 8 haloalkoxy group of a halogen atom, a substituted or unsubstituted C 1 -C 8 alkane a thiol group, a C 1 -C 8 haloalkylthio group containing up to 9 halogen atoms which may be the same or different, a substituted or unsubstituted tri(C 1 -C 8 )alkyldecyl group, substituted Or unsubstituted tri(C 1 -C 8 )alkyldecane-C 1 -C 8 alkyl, substituted or unsubstituted (C 1 -C 8 alkoxyimino)-C 1 - C 8 alkyl or substituted or unsubstituted (benzyloxyimino)-C 1 -C 8 alkyl; R independently represents a hydrogen atom; a halogen atom; a nitro group; a cyano group; a hydroxyl group; an amine group; Thio group; pentafluoro-λ 6 -thio group; substituted or unsubstituted (C 1 -C 8 alkoxyimino)-C 1 -C 8 alkyl group; substituted or unsubstituted (benzyl oxyalkylene amine) -C 1 -C 8 alkyl group; a substituted or unsubstituted alkyl group of C 1 -C 8; 1 -C 8 haloalkyl. 9 having a C 1 to halogen atoms; or a substituted the unsubstituted C 2 -C 8 alkenyl group; having 1-9 C atoms, halogen of halide 2 -C 8 alkenyl group; a substituted or non-substituted C 2 -C 8 alkynyl group; with 1-9 halo C 2 -C 8 halogen atoms alkynyl group; a substituted or unsubstituted of C 1 -C 8 alkoxy group; a C 1 to having halogen atoms. 9 1 -C 8 haloalkoxy; or a substituted The substituted C 1 -C 8 alkylthio; having 1-9 halogen atoms C 1 -C 8 haloalkyl group; a substituted or unsubstituted of C 1 -C 8 alkylsulfinyl acyl a C 1 -C 8 haloalkylsulfinyl group having 1 to 9 halogen atoms; a substituted or unsubstituted C 1 -C 8 alkylsulfonyl group; C 1 having 1 to 9 halogen atoms ; -C 8 haloalkylsulfonyl; substituted or unsubstituted C 1 -C 8 alkylamino; substituted or unsubstituted di-C 1 -C 8 alkylamino; substituted or not Substituted C 2 -C 8 alkenyloxy; substituted or unsubstituted C 3 -C 8 alkynyloxy; substituted or unsubstituted C 3 -C 7 cycloalkyl; having 1 to 9 halogens a C 3 -C 7 halocycloalkyl group; a substituted or unsubstituted tri(C 1 -C 8 )alkyldecylalkyl group; a substituted or unsubstituted C 1 -C 8 alkylcarbonyl group; to 9 halogen atoms C 1 -C 8 haloalkyl carbonyl group; substituted or non-substituted C 1 -C 8 alkoxycarbonyl; having a C 1 to 9 halogen atoms 1 -C 8 haloalkoxy carbonyl group; substituted or non-substituted C 1 -C 8 alkyl amine acyl; substituted or unsubstituted bis -C 1 -C 8 alkyl amine Phenoxy; phenylthio; phenylamino; benzyloxy; benzylthio; or benzylamino; and salts, N-oxides, metal complexes, metal-like complexes And optically active isomers or geometric isomers thereof. 如請求項1之化合物,其中A係選自由以下組成之清單: 式(A1)之雜環 其中:R1至R3可相同或不同,表示氫原子;鹵素原子;經取代或未經取代之C1-C5烷基;包含多至9個可相同或不同之鹵素原子之C1-C5鹵烷基;經取代或未經取代之C1-C5烷氧基或包含多至9個可相同或不同之鹵素原子之C1-C5鹵烷氧基;式(A2)之雜環 其中:R4至R6可相同或不同,表示氫原子;鹵素原子;經取代或未經取代之C1-C5烷基;包含多至9個可相同或不同之鹵素原子之C1-C5鹵烷基;經取代或未經取代之C1-C5烷氧基或包含多至9個可相同或不同之鹵素原子之C1-C5鹵烷氧基;式(A3)之雜環 其中:R7表示氫原子;鹵素原子;經取代或未經取代之C1-C5烷基;包含多至9個可相同或不同之鹵素原子之C1-C5鹵烷基;經取代或 未經取代之C1-C5烷氧基或包含多至9個可相同或不同之鹵素原子之C1-C5鹵烷氧基;R8表示氫原子或經取代或未經取代之C1-C5烷基;式(A4)之雜環 其中:R9至R11可相同或不同,表示氫原子;鹵素原子;經取代或未經取代之C1-C5烷基;胺基;經取代或未經取代之C1-C5烷氧基;經取代或未經取代之C1-C5烷基硫基;包含多至9個可相同或不同之鹵素原子之C1-C5鹵烷基或包含多至9個可相同或不同之鹵素原子之C1-C5鹵烷氧基;式(A5)之雜環 其中:R12及R13可相同或不同,表示氫原子;鹵素原子;經取代或未經取代之C1-C5烷基;經取代或未經取代之C1-C5烷氧基;胺基;包含多至9個可相同或不同之鹵素原子之C1-C5鹵烷基或包含多至9個可相同或不同之鹵素原子之C1-C5鹵烷氧基;R14表示氫原子;鹵素原子;經取代或未經取代之C1-C5烷基;經取代或未經取代之C1-C5烷氧基;胺基;包含多至9個可相同或不同之鹵素原子之C1-C5鹵烷基或包含多至9個可相同或不同之鹵素原子之C1-C5鹵烷氧基; 式(A6)之雜環 其中:R15表示氫原子;鹵素原子;氰基;經取代或未經取代之C1-C5烷基;經取代或未經取代之C1-C5烷氧基;包含多至9個可相同或不同之鹵素原子之C1-C5鹵烷氧基或包含多至9個可相同或不同之鹵素原子之C1-C5鹵烷基;R16及R18可相同或不同,表示氫原子;鹵素原子;經取代或未經取代之C1-C5烷氧基羰基;經取代或未經取代之C1-C5烷基;包含多至9個可相同或不同之鹵素原子之C1-C5鹵烷氧基或包含多至9個可相同或不同之鹵素原子之C1-C5鹵烷基;R17表示氫原子或經取代或未經取代之C1-C5烷基;式(A7)之雜環 其中:R19表示氫原子或C1-C5烷基;R20至R22可相同或不同,表示氫原子;鹵素原子;經取代或未經取代之C1-C5烷基或包含多至9個可相同或不同之鹵素原子之C1-C5鹵烷基;式(A8)之雜環 其中:R23表示氫原子;鹵素原子;經取代或未經取代之C1-C5烷基或包含多至9個可相同或不同之鹵素原子之C1-C5鹵烷基;R24表示氫原子,或經取代或未經取代之C1-C5烷基或包含多至9個可相同或不同之鹵素原子之C1-C5鹵烷基;式(A9)之雜環 其中:R25表示氫原子;鹵素原子;經取代或未經取代之C1-C5烷基或包含多至9個可相同或不同之鹵素原子之C1-C5鹵烷基;R26表示氫原子;經取代或未經取代之C1-C5烷基或包含多至9個可相同或不同之鹵素原子之C1-C5鹵烷基;式(A10)之雜環 其中:R27表示氫原子;鹵素原子;經取代或未經取代之C1-C5烷基或包含多至9個可相同或不同之鹵素原子之C1-C5鹵烷基;R28表示氫原子;鹵素原子;經取代或未經取代之C1-C5烷基;包含多至9個可相同或不同之鹵素原子之C1-C5鹵烷基;包含多至 9個可相同或不同之鹵素原子之C1-C5鹵烷氧基;胺基;經取代或未經取代之C1-C5烷基胺基或經取代或未經取代之二(C1-C5烷基)胺基;式(A11)之雜環 其中:R29表示氫原子;鹵素原子;經取代或未經取代之C1-C5烷基;經取代或未經取代之C1-C5烷氧基;包含多至9個可相同或不同之鹵素原子之C1-C5鹵烷氧基或包含多至9個可相同或不同之鹵素原子之C1-C5鹵烷基;R30表示氫原子;鹵素原子;經取代或未經取代之C1-C5烷基;包含多至9個可相同或不同之鹵素原子之C1-C5鹵烷基;包含多至9個可相同或不同之鹵素原子之C1-C5鹵烷氧基;胺基;經取代或未經取代之C1-C5烷基胺基或經取代或未經取代之二(C1-C5烷基)胺基;式(A12)之雜環 其中:R31表示氫原子或經取代或未經取代之C1-C5烷基;R32表示氫原子;鹵素原子;經取代或未經取代之C1-C5烷基或包含多至9個可相同或不同之鹵素原子之C1-C5鹵烷基; R33表示氫原子;鹵素原子;硝基;經取代或未經取代之C1-C5烷基;經取代或未經取代之C1-C5烷氧基;包含多至9個可相同或不同之鹵素原子之C1-C5鹵烷氧基或包含多至9個可相同或不同之鹵素原子之C1-C5鹵烷基;式(A13)之雜環 其中:R34表示氫原子;鹵素原子;經取代或未經取代之C1-C5烷基;經取代或未經取代之C3-C5環烷基;包含多至9個可相同或不同之鹵素原子之C1-C5鹵烷基;經取代或未經取代之C1-C5烷氧基;經取代或未經取代之C2-C5炔氧基或包含多至9個可相同或不同之鹵素原子之C1-C5鹵烷氧基;R35表示氫原子;鹵素原子;經取代或未經取代之C1-C5烷基;氰基;經取代或未經取代之C1-C5烷氧基;經取代或未經取代之C1-C5烷基硫基;包含多至9個可相同或不同之鹵素原子之C1-C5鹵烷基;包含多至9個可相同或不同之鹵素原子之C1-C5鹵烷氧基;胺基;經取代或未經取代之C1-C5烷基胺基或經取代或未經取代之二(C1-C5烷基)胺基;R36表示氫原子或經取代或未經取代之C1-C5烷基;式(A14)之雜環 其中:R37及R38可相同或不同,表示氫原子;鹵素原子;經取代或未經取代之C1-C5烷基;包含多至9個可相同或不同之鹵素原子之C1-C5鹵烷基;經取代或未經取代之C1-C5烷氧基或經取代或未經取代之C1-C5烷基硫基;R39表示氫原子或經取代或未經取代之C1-C5烷基;式(A15)之雜環 其中:R40及R41可相同或不同,表示氫原子;鹵素原子;經取代或未經取代之C1-C5烷基或包含多至9個可相同或不同之鹵素原子之C1-C5鹵烷基;式(A16)之雜環 其中:R42及R43可相同或不同,表示氫原子;鹵素原子;經取代或未經取代之C1-C5烷基;包含多至9個可相同或不同之鹵素原子之C1-C5鹵烷基;或胺基;式(A17)之雜環 其中:R44及R45可相同或不同,表示氫原子;鹵素原子;經取代或未經取代之C1-C5烷基或包含多至9個可相同或不同之鹵素原子之C1-C5鹵烷基;式(A18)之雜環 其中:R47表示氫原子;鹵素原子;經取代或未經取代之C1-C5烷基或包含多至9個可相同或不同之鹵素原子之C1-C5鹵烷基;R46表示氫原子;鹵素原子;經取代或未經取代之C1-C5烷基;包含多至9個可相同或不同之鹵素原子之C1-C5鹵烷基或經取代或未經取代之C1-C5烷基硫基;式(A19)之雜環 其中:R49及R48可相同或不同,表示氫原子;鹵素原子;經取代或未經取代之C1-C5烷基;經取代或未經取代之C1-C5烷氧基;包含多至9個可相同或不同之鹵素原子之C1-C5鹵烷氧基,或包含多至9個可相同或不同之鹵素原子之C1-C5鹵烷基;式(A20)之雜環 其中:R50及R51可相同或不同,表示氫原子;鹵素原子;經取代或未經取代之C1-C5烷基;經取代或未經取代之C1-C5烷氧基;包含多至9個可相同或不同之鹵素原子之C1-C5鹵烷氧基,或包含多至9個可相同或不同之鹵素原子之C1-C5鹵烷基;式(A21)之雜環 其中:R52表示氫原子;鹵素原子;經取代或未經取代之C1-C5烷基或包含多至9個可相同或不同之鹵素原子之C1-C5鹵烷基;式(A22)之雜環 其中:R53表示氫原子;鹵素原子;經取代或未經取代之C1-C5烷基或包含多至9個可相同或不同之鹵素原子之C1-C5鹵烷基;式(A23)之雜環 其中:R54及R56可相同或不同,表示氫原子;鹵素原子;經取代或未經取代之C1-C5烷基或包含多至9個可相同或不同之鹵素原子之C1-C5鹵烷基;R55表示氫原子或經取代或未經取代之C1-C5烷基;式(A24)之雜環 其中:R57及R59可相同或不同,表示氫原子;鹵素原子;經取代或未經取代之C1-C5烷基或包含多至9個可相同或不同之鹵素原子之C1-C5鹵烷基;R58表示氫原子或經取代或未經取代之C1-C5烷基;式(A25)之雜環 其中:R60及R61可相同或不同,表示氫原子;鹵素原子;經取代或未經取代之C1-C5烷基或包含多至9個可相同或不同之鹵素原子之C1-C5鹵烷基;R62表示氫原子或經取代或未經取代之C1-C5烷基;式(A26)之雜環 其中:R65表示氫原子;鹵素原子;經取代或未經取代之C1-C5烷基;經取代或未經取代之C3-C5環烷基;包含多至9個可相同或不同之鹵素原子之C1-C5鹵烷基;經取代或未經取代之C1-C5烷氧基;經取代或未經取代之C2-C5炔氧基或包含多至9個可相同或不同之鹵素原子之C1-C5鹵烷氧基;R63表示氫原子;鹵素原子;經取代或未經取代之C1-C5烷基;氰基;經取代或未經取代之C1-C5烷氧基;經取代或未經取代之C1-C5烷基硫基;包含多至9個可相同或不同之鹵素原子之C1-C5鹵烷基;包含多至9個可相同或不同之鹵素原子之C1-C5鹵烷氧基;胺基;經取代或未經取代之C1-C5烷基胺基或二(C1-C5烷基)胺基;R64表示氫原子或經取代或未經取代之C1-C5烷基。 The compound of the requested item 1, wherein A is selected from the list consisting of: heterocyclyl of formula (A 1) of Wherein: R 1 to R 3 may be the same or different, represent a hydrogen atom; a halogen atom; a substituted or unsubstituted of C 1 -C 5 alkyl; C comprising up to 9 identical or different halogen atoms 1-- C 5 haloalkyl group; a substituted or unsubstituted of C 1 -C 5 alkoxy or comprising up to 9 identical or different halogen atoms C 1 -C 5 haloalkoxy; of formula (A 2) Heterocycle Wherein: R 4 to R 6 may be the same or different, represent a hydrogen atom; a halogen atom; a substituted or unsubstituted alkyl group of C 1 -C 5; may contain up to 9 identical or different halogen atoms C 1 - C 5 haloalkyl group; a substituted or unsubstituted of C 1 -C 5 alkoxy or comprising up to 9 identical or different halogen atoms C 1 -C 5 haloalkoxy; of formula (A 3) Heterocycle Wherein: R 7 represents a hydrogen atom; a halogen atom; a substituted or unsubstituted alkyl group of C 1 -C 5; may contain up to 9 identical or different halogen atoms C 1 -C 5 haloalkyl; substituted or unsubstituted of C 1 -C 5 alkoxy group or may comprise up to nine identical or different a halogen atoms C 1 -C 5 haloalkoxy; R 8 represents a hydrogen atom or a substituted or non-substituted C 1 -C 5 alkyl; heterocyclic ring of formula (A 4 ) Wherein: R 9 to R 11 may be the same or different and represent a hydrogen atom; a halogen atom; a substituted or unsubstituted C 1 -C 5 alkyl group; an amine group; a substituted or unsubstituted C 1 -C 5 alkane group; substituted or non-substituted C 1 -C 5 alkylthio; it can contain up to 9 identical or different halogen atoms C 1 -C 5 haloalkyl, or comprising up to 9 may be the same or a C 1 -C 5 haloalkoxy group of a different halogen atom; a heterocyclic ring of the formula (A 5 ) Wherein: R 12 and R 13 may be the same or different and represent a hydrogen atom; a halogen atom; a substituted or unsubstituted C 1 -C 5 alkyl group; a substituted or unsubstituted C 1 -C 5 alkoxy group; Amino group; C 1 -C 5 haloalkyl group containing up to 9 halogen atoms which may be the same or different or C 1 -C 5 haloalkoxy group containing up to 9 halogen atoms which may be the same or different; R 14 a hydrogen atom; a halogen atom; a substituted or unsubstituted C 1 -C 5 alkyl group; a substituted or unsubstituted C 1 -C 5 alkoxy group; an amine group; containing up to 9 which may be the same or different the halogen atom of the C 1 -C 5 haloalkyl, or may contain up to 9 identical or different halogen atoms C 1 -C 5 haloalkoxy; heterocycle of formula (A 6) of Wherein: R 15 represents a hydrogen atom; a halogen atom; a cyano group; a substituted or unsubstituted C 1 -C 5 alkyl group; a substituted or unsubstituted C 1 -C 5 alkoxy group; containing up to 9 may be the same or different halogen atoms C 1 -C 5 alkoxy group or a halogen comprising up to 9 identical or different halogen atoms C 1 -C 5 haloalkyl group; R 16 and R 18 may be the same or different, a hydrogen atom; a halogen atom; a substituted or unsubstituted C 1 -C 5 alkoxycarbonyl group; a substituted or unsubstituted C 1 -C 5 alkyl group; containing up to 9 halogens which may be the same or different C 1 -C 5 atoms or haloalkoxy comprising up to 9 halogen atoms may be the same or different C 1 -C 5 haloalkyl group; R 17 represents a hydrogen atom or a substituted or unsubstituted of C 1 - C 5 alkyl; heterocyclic ring of formula (A 7 ) Wherein: R 19 represents a hydrogen atom or a C 1 -C 5 alkyl group; and R 20 to R 22 may be the same or different and represent a hydrogen atom; a halogen atom; a substituted or unsubstituted C 1 -C 5 alkyl group or a plurality of Up to 9 C 1 -C 5 haloalkyl groups which may be the same or different halogen atoms; heterocyclic ring of formula (A 8 ) Wherein: R 23 represents a hydrogen atom; a halogen atom; a substituted or unsubstituted alkyl group of C 1 -C 5 to 9 or a plurality may be the same or different halogen atoms C 1 -C 5 haloalkyl group; R 24 It represents a hydrogen atom, or a substituted or unsubstituted alkyl group of C 1 -C 5 to 9 or a plurality may be the same or different halogen atoms C 1 -C 5 haloalkyl group; heterocycle of formula (A 9) of Wherein: R 25 represents a hydrogen atom; a halogen atom; a substituted or unsubstituted alkyl group of C 1 -C 5 to 9 or a plurality may be the same or different halogen atoms C 1 -C 5 haloalkyl group; R 26 represents a hydrogen atom; a substituted or unsubstituted alkyl group of C 1 -C 5 to 9 or a plurality may be the same or different halogen atoms C 1 -C 5 haloalkyl group; heterocycle of formula (A 10) of Wherein: R 27 represents a hydrogen atom; a halogen atom; a substituted or unsubstituted alkyl group of C 1 -C 5 or comprising up to 9 identical or different halogen atoms C 1 -C 5 haloalkyl group; R 28 a hydrogen atom; a halogen atom; a substituted or unsubstituted C 1 -C 5 alkyl group; a C 1 -C 5 haloalkyl group containing up to 9 halogen atoms which may be the same or different; containing up to 9 C 1 -C 5 haloalkoxy group of the same or different halogen atom; amine group; substituted or unsubstituted C 1 -C 5 alkylamino group or substituted or unsubstituted bis (C 1 -C heterocycle of formula (A 11) of; alkyl) amino Wherein: R 29 represents a hydrogen atom; a halogen atom; a substituted or unsubstituted C 1 -C 5 alkyl group; a substituted or unsubstituted C 1 -C 5 alkoxy group; containing up to 9 may be the same or halogen atoms different from C 1 -C 5 alkoxy group or a halogen comprising up to 9 identical or different halogen atoms C 1 -C 5 haloalkyl group; R 30 represents a hydrogen atom; a halogen atom; a substituted or unsubstituted by the substituted C 1 -C 5 alkyl; may contain up to 9 identical or different halogen atoms C 1 -C 5 haloalkyl; can contain up to 9 identical or different halogen atoms C 1 -C 5 haloalkoxy; group; a substituted or unsubstituted of C 1 -C 5 alkyl substituted amino group or a substituted or unsubstituted bis (C 1 -C 5 alkyl) amino; of formula (A 12 Heterocycle Wherein: R 31 represents a hydrogen atom or a substituted or unsubstituted C 1 -C 5 alkyl group; R 32 represents a hydrogen atom; a halogen atom; a substituted or unsubstituted C 1 -C 5 alkyl group or contains up to 9 C 1 -C 5 haloalkyl groups which may be the same or different halogen atoms; R 33 represents a hydrogen atom; a halogen atom; a nitro group; a substituted or unsubstituted C 1 -C 5 alkyl group; substituted or not the substituted C 1 -C 5 alkoxy; can contain up to 9 identical or different halogen atoms C 1 -C 5 alkoxy group or a halogen comprising up to 9 C may be the same or different halogen atoms 1 -C 5 haloalkyl; heterocycle of formula (A 13 ) Wherein: R 34 represents a hydrogen atom; a halogen atom; a substituted or unsubstituted C 1 -C 5 alkyl group; a substituted or unsubstituted C 3 -C 5 cycloalkyl group; containing up to 9 may be the same or a C 1 -C 5 haloalkyl group of a different halogen atom; a substituted or unsubstituted C 1 -C 5 alkoxy group; a substituted or unsubstituted C 2 -C 5 alkynyloxy group or containing up to 9 a C 1 -C 5 haloalkoxy group which may be the same or different halogen atom; R 35 represents a hydrogen atom; a halogen atom; a substituted or unsubstituted C 1 -C 5 alkyl group; a cyano group; the substituted C 1 -C 5 alkoxy group; a substituted or unsubstituted of C 1 -C 5 alkylthio; can contain up to 9 identical or different halogen atoms C 1 -C 5 haloalkyl, a C 1 -C 5 haloalkoxy group containing up to 9 halogen atoms which may be the same or different; an amine group; a substituted or unsubstituted C 1 -C 5 alkylamino group or a substituted or unsubstituted a bis(C 1 -C 5 alkyl)amino group; R 36 represents a hydrogen atom or a substituted or unsubstituted C 1 -C 5 alkyl group; a heterocyclic ring of the formula (A 14 ) Wherein: R 37 and R 38 may be the same or different, represent a hydrogen atom; a halogen atom; a substituted or unsubstituted of C 1 -C 5 alkyl; C comprising up to 9 identical or different halogen atoms 1-- C 5 haloalkyl; substituted or unsubstituted C 1 -C 5 alkoxy or substituted or unsubstituted C 1 -C 5 alkylthio; R 39 represents a hydrogen atom or substituted or not Substituted C 1 -C 5 alkyl; heterocyclic ring of formula (A 15 ) Wherein: R 40 and R 41 may be the same or different, represent a hydrogen atom; a halogen atom; a substituted or unsubstituted alkyl group of C 1 -C 5 or C comprising up to 9 identical or different halogen atoms 1-- C 5 haloalkyl; heterocycle of formula (A 16 ) Wherein: R 42 and R 43 may be the same or different, represent a hydrogen atom; a halogen atom; a substituted or unsubstituted of C 1 -C 5 alkyl; C comprising up to 9 identical or different halogen atoms 1-- C 5 haloalkyl; or amine; heterocycle of formula (A 17 ) Wherein: R 44 and R 45 may be the same or different, represent a hydrogen atom; a halogen atom; a substituted or unsubstituted alkyl group of C 1 -C 5 or C comprising up to 9 identical or different halogen atoms 1-- C 5 haloalkyl; heterocycle of formula (A 18 ) Wherein: R 47 represents a hydrogen atom; a halogen atom; a substituted or unsubstituted alkyl group of C 1 -C 5 to 9 or a plurality may be the same or different halogen atoms C 1 -C 5 haloalkyl group; R 46 represents a hydrogen atom; a halogen atom; a substituted or unsubstituted alkyl group of C 1 -C 5; may contain up to 9 identical or different halogen atoms C 1 -C 5 haloalkyl, or a substituted or unsubstituted a C 1 -C 5 alkylthio group; a heterocyclic ring of the formula (A 19 ) Wherein: R 49 and R 48 may be the same or different and represent a hydrogen atom; a halogen atom; a substituted or unsubstituted C 1 -C 5 alkyl group; a substituted or unsubstituted C 1 -C 5 alkoxy group; may comprise up to nine identical or different a halogen atoms C 1 -C 5 haloalkoxy, or can comprise up to 9 identical or different halogen atoms C 1 -C 5 haloalkyl; of formula (A 20 Heterocycle Wherein: R 50 and R 51 may be the same or different and represent a hydrogen atom; a halogen atom; a substituted or unsubstituted C 1 -C 5 alkyl group; a substituted or unsubstituted C 1 -C 5 alkoxy group; may comprise up to nine identical or different a halogen atoms C 1 -C 5 haloalkoxy, or can comprise up to 9 identical or different halogen atoms C 1 -C 5 haloalkyl; of formula (A 21 Heterocycle Wherein: R 52 represents a hydrogen atom; a halogen atom; a substituted or unsubstituted alkyl group of C 1 -C 5 to 9 or a plurality may be the same or different halogen atoms C 1 -C 5 haloalkyl; of formula ( A 22 ) heterocyclic ring Wherein: R 53 represents a hydrogen atom; a halogen atom; a substituted or unsubstituted alkyl group of C 1 -C 5 to 9 or a plurality may be the same or different halogen atoms C 1 -C 5 haloalkyl; of formula ( A 23 ) heterocyclic ring Wherein: R 54 and R 56 may be the same or different, represent a hydrogen atom; a halogen atom; a substituted or unsubstituted alkyl group of C 1 -C 5 or C comprising up to 9 identical or different halogen atoms 1-- C 5 haloalkyl; R 55 represents a hydrogen atom or a substituted or unsubstituted C 1 -C 5 alkyl group; a heterocyclic ring of the formula (A 24 ) Wherein: R 57 and R 59 may be the same or different, represent a hydrogen atom; a halogen atom; a substituted or unsubstituted alkyl group of C 1 -C 5 or C comprising up to 9 identical or different halogen atoms 1-- C 5 haloalkyl; R 58 represents a hydrogen atom or a substituted or unsubstituted C 1 -C 5 alkyl group; a heterocyclic ring of the formula (A 25 ) Wherein: R 60 and R 61 may be the same or different, represent a hydrogen atom; a halogen atom; a substituted or unsubstituted alkyl group of C 1 -C 5 or C comprising up to 9 identical or different halogen atoms 1-- C 5 haloalkyl; R 62 represents a hydrogen atom or a substituted or unsubstituted C 1 -C 5 alkyl group; a heterocyclic ring of the formula (A 26 ) Wherein: R 65 represents a hydrogen atom; a halogen atom; a substituted or unsubstituted C 1 -C 5 alkyl group; a substituted or unsubstituted C 3 -C 5 cycloalkyl group; containing up to 9 may be the same or a C 1 -C 5 haloalkyl group of a different halogen atom; a substituted or unsubstituted C 1 -C 5 alkoxy group; a substituted or unsubstituted C 2 -C 5 alkynyloxy group or containing up to 9 a C 1 -C 5 haloalkoxy group which may be the same or different halogen atom; R 63 represents a hydrogen atom; a halogen atom; a substituted or unsubstituted C 1 -C 5 alkyl group; a cyano group; a substituted or not the substituted C 1 -C 5 alkoxy group; a substituted or unsubstituted of C 1 -C 5 alkylthio; can contain up to 9 identical or different halogen atoms C 1 -C 5 haloalkyl, a C 1 -C 5 haloalkoxy group containing up to 9 halogen atoms which may be the same or different; an amine group; a substituted or unsubstituted C 1 -C 5 alkylamino group or a di(C 1 -C A 5- alkyl)amino group; R 64 represents a hydrogen atom or a substituted or unsubstituted C 1 -C 5 alkyl group. 如請求項2之化合物,其中A係選自由A2、A5、A6、A10及A13組成之清單。 The compound of claim 2, wherein the A is selected from the list consisting of A 2 , A 5 , A 6 , A 10 and A 13 . 如請求項3之化合物,其中A表示A13,其中R34表示經取代或未經取代之C1-C5烷基、包含多至9個可相同或不同之鹵素原子之C1-C5鹵烷基,或經取代或未經取代之C1-C5烷氧基;R35表示氫原子或鹵素原子;且R36表示經取代或未經取代之C1-C5烷基。 The compound of the requested item 3, wherein A represents A 13 is wherein R 34 represents a substituted or unsubstituted alkyl group of C 1 -C 5, comprising up to 9 C may be the same or different halogen atoms 1 -C 5 Haloalkyl, or substituted or unsubstituted C 1 -C 5 alkoxy; R 35 represents a hydrogen atom or a halogen atom; and R 36 represents a substituted or unsubstituted C 1 -C 5 alkyl group. 如請求項1至4中任一項之化合物,其中T表示O。 The compound of any one of claims 1 to 4, wherein T represents O. 如請求項1至4中任一項之化合物,其中Z1表示經取代或未經取代之環丙基。 The compound of any one of claims 1 to 4, wherein Z 1 represents a substituted or unsubstituted cyclopropyl group. 如請求項6之化合物,其中Z1表示未經取代之環丙基或2-C1-C5烷基環丙基。 The compound of claim 6, wherein Z 1 represents an unsubstituted cyclopropyl or 2-C 1 -C 5 alkylcyclopropyl group. 如請求項1至4中任一項之化合物,其中Z2及Z3獨立地表示氫原子或甲基。 The compound of any one of claims 1 to 4, wherein Z 2 and Z 3 independently represent a hydrogen atom or a methyl group. 如請求項1至4中任一項之化合物,其中n表示0、1或2。 The compound of any one of claims 1 to 4, wherein n represents 0, 1, or 2. 如請求項1至4中任一項之化合物,其中L表示直接鍵、氧原子、亞甲基或羰基。 The compound of any one of claims 1 to 4, wherein L represents a direct bond, an oxygen atom, a methylene group or a carbonyl group. 如請求項1至4中任一項之化合物,其中B表示經取代或未經取代之環氧乙烷基環;經取代或未經取代之吡咯基環;經取代或未經取代之吡唑基環;經取代或未經取代之噻吩基環;經取代或未經取代之苯并噻吩基環;經取代或未經取代之喹啉基環;經取代或未經取代之異喹啉基環;經取代或未經取代之呋喃環;或經取代或未經取代之苯并呋喃環。 The compound of any one of claims 1 to 4, wherein B represents a substituted or unsubstituted oxiranyl ring; a substituted or unsubstituted pyrrolyl ring; a substituted or unsubstituted pyrazole Substituted or substituted thiophenyl ring; substituted or unsubstituted benzothienyl ring; substituted or unsubstituted quinolinyl ring; substituted or unsubstituted isoquinolyl Ring; substituted or unsubstituted furan ring; or substituted or unsubstituted benzofuran ring. 如請求項11之化合物,其中B表示經取代或未經取代之噻吩基環或經取代或未經取代之苯并噻吩基環。 The compound of claim 11, wherein B represents a substituted or unsubstituted thienyl ring or a substituted or unsubstituted benzothienyl ring. 如請求項1至4中任一項之化合物,其中X獨立地表示鹵素原子;經取代或未經取代之C1-C8烷基;包含多至9個可相同或不同之鹵素原子之C1-C8鹵烷基;經取代或未經取代之C3-C7環烷基;三(C1-C8烷基)矽烷基;經取代或未經取代之C1-C8烷氧基;或經取代或未經取代之C1-C8烷基硫基。 The compound according to any one of claims 1 to 4, wherein X independently represents a halogen atom; a substituted or unsubstituted C 1 -C 8 alkyl group; and C containing up to 9 halogen atoms which may be the same or different 1- C 8 haloalkyl; substituted or unsubstituted C 3 -C 7 cycloalkyl; tri(C 1 -C 8 alkyl)decyl; substituted or unsubstituted C 1 -C 8 alkane group; or substituted or non-substituted C 1 -C 8 alkylthio. 如請求項1至4中任一項之化合物,其中Y獨立地表示鹵素原子;經取代或未經取代之C1-C8烷基;包含多至9個可相同或不同之鹵素原子之C1-C8鹵烷基;經取代或未經取代之C1-C8烷氧基;包含多至9個可相同或不同之鹵素原子之C1-C8鹵烷氧基。 The compound according to any one of claims 1 to 4, wherein Y independently represents a halogen atom; a substituted or unsubstituted C 1 -C 8 alkyl group; and C containing up to 9 halogen atoms which may be the same or different 1 -C 8 haloalkyl; substituted or non-substituted C 1 -C 8 alkoxy; can contain up to 9 identical or different halogen atoms C 1 -C 8 haloalkoxy. 一種製備式(I)化合物之方法, 其中A、T、Z1、Z2、Z3、n、X及B如請求項1至14中任一項所定義且L表示直接鍵或亞甲基,該方法之特徵在於使式(IV)化合物 其中A、T、Z1、Z2、Z3、n、X如上文所定義且U2表示鹵素原子或三氟甲磺酸酯基,與式(V)化合物反應, 其中L及B如上文所定義且W1表示硼衍生物。 a method of preparing a compound of formula (I), Wherein A, T, Z 1 , Z 2 , Z 3 , n, X and B are as defined in any one of claims 1 to 14 and L represents a direct bond or a methylene group, the method being characterized by making the formula (IV) Compound Wherein A, T, Z 1 , Z 2 , Z 3 , n, X are as defined above and U 2 represents a halogen atom or a triflate group, which is reacted with a compound of formula (V), Wherein L and B are as defined above and W 1 represents a boron derivative. 一種式(IIa)化合物, 其中Z2、Z3、n及X如請求項1至14中任一項所定義,且L為直接鍵,且B1為經取代或未經取代之環氧乙烷基環、經取代或未經取代之噻吩基環、經取代或未經取代之苯并噻吩基環、經取代或未經取代之呋喃環或經取代或未經取代之苯并呋喃環,限制條件為(IIa)不表示: N-[2-(2-呋喃基)苄基]環丙胺N-[2-(2-呋喃基)-4,5-二甲氧基苄基]環丙胺N-[2-(3-溴-2-呋喃基)-4,5-二甲氧基苄基]環丙胺N-[2-(3-溴-2-呋喃基)苄基]環丙胺N-[2-(3-呋喃基)苄基]環丙胺N-[2-(2-噻吩基)苄基]環丙胺N-[4,5-二甲氧基-2-(2-噻吩基)苄基]環丙胺,以及其鹽。 a compound of formula (IIa), Wherein Z 2 , Z 3 , n and X are as defined in any one of claims 1 to 14, and L is a direct bond, and B 1 is a substituted or unsubstituted oxiranyl ring, substituted or Unsubstituted thienyl ring, substituted or unsubstituted benzothienyl ring, substituted or unsubstituted furan ring or substituted or unsubstituted benzofuran ring, the condition is (IIa) no Represents: N-[2-(2-furyl)benzyl]cyclopropylamine N-[2-(2-furyl)-4,5-dimethoxybenzyl]cyclopropylamine N-[2-(3 -bromo-2-furanyl)-4,5-dimethoxybenzyl]cyclopropylamine N-[2-(3-bromo-2-furanyl)benzyl]cyclopropylamine N-[2-(3- Furanyl)benzyl]cyclopropylamine N-[2-(2-thienyl)benzyl]cyclopropylamine N-[4,5-dimethoxy-2-(2-thienyl)benzyl]cyclopropylamine, And its salt. 如請求項16之式(IIa)化合物,其係選自由以下組成之清單:N-[5-氯-2-(2-呋喃基)苄基]環丙胺N-[5-氯-2-(2-噻吩基)苄基]環丙胺N-[2-(3-噻吩基)苄基]環丙胺N-{1-[2-(3-噻吩基)苯基]乙基}環丙胺N-[5-氯-2-(3-噻吩基)苄基]環丙胺N-[2-(5-氯-2-噻吩基)苄基]環丙胺N-[5-氯-2-(5-氯-2-噻吩基)苄基]環丙胺。 A compound of the formula (IIa) according to claim 16 which is selected from the list consisting of N-[5-chloro-2-(2-furyl)benzyl]cyclopropylamine N-[5-chloro-2-( 2-thienyl)benzyl]cyclopropylamine N-[2-(3-thienyl)benzyl]cyclopropylamine N-{1-[2-(3-thienyl)phenyl]ethyl}cyclopropylamine N- [5-Chloro-2-(3-thienyl)benzyl]cyclopropylamine N-[2-(5-chloro-2-thienyl)benzyl]cyclopropylamine N-[5-chloro-2-(5- Chloro-2-thienyl)benzyl]cyclopropylamine. 一種式(IIb)化合物, 其中Z2、Z3、n及X如請求項1至14中任一項所定義,且L為直接鍵,且B1為經取代或未經取代之環氧乙烷基環、經取代或未經取代之噻吩基環、經取代或未經取代之苯并噻吩基環、經取代或未經取代之呋喃環或經取代或未經取代之苯并呋喃環,限制條件為(IIb)不表示:N-[3-(2-呋喃基)苄基]環丙胺 N-[5-(2-呋喃基)-2-甲氧基苄基]環丙胺N-[4-氟-3-(2-呋喃基)苄基]環丙胺N-[2-氟-5-(2-呋喃基)苄基]環丙胺N-[2-氟-5-(3-呋喃基)苄基]環丙胺N-[3-(3-溴-2-呋喃基)-4-氟苄基]環丙胺N-[3-(3-溴-2-呋喃基)苄基]環丙胺N-[5-(3-溴-2-呋喃基)-2-氟苄基]環丙胺N-[5-(3-溴-2-呋喃基)-2-甲氧基苄基]環丙胺N-[3-(3-呋喃基)苄基]環丙胺N-[3-(2-噻吩基)苄基]環丙胺N-[4-氟-3-(2-噻吩基)苄基]環丙胺N-[2-氟-5-(2-噻吩基)苄基]環丙胺N-[2-甲氧基-5-(2-噻吩基)苄基]環丙胺5-{5-[(環丙基胺基)甲基]-2-氟苯基}噻吩-2-甲腈,以及其鹽。 a compound of formula (IIb), Wherein Z 2 , Z 3 , n and X are as defined in any one of claims 1 to 14, and L is a direct bond, and B 1 is a substituted or unsubstituted oxiranyl ring, substituted or Unsubstituted thiophene ring, substituted or unsubstituted benzothienyl ring, substituted or unsubstituted furan ring or substituted or unsubstituted benzofuran ring, the restriction condition is (IIb) Represents: N-[3-(2-furyl)benzyl]cyclopropylamine N-[5-(2-furyl)-2-methoxybenzyl]cyclopropylamine N-[4-fluoro-3-( 2-furyl)benzyl]cyclopropylamine N-[2-fluoro-5-(2-furyl)benzyl]cyclopropylamine N-[2-fluoro-5-(3-furyl)benzyl]cyclopropylamine N-[3-(3-Bromo-2-furyl)-4-fluorobenzyl]cyclopropylamine N-[3-(3-bromo-2-furyl)benzyl]cyclopropylamine N-[5-( 3-bromo-2-furanyl)-2-fluorobenzyl]cyclopropylamine N-[5-(3-bromo-2-furyl)-2-methoxybenzyl]cyclopropylamine N-[3-( 3-furyl)benzyl]cyclopropylamine N-[3-(2-thienyl)benzyl]cyclopropylamine N-[4-fluoro-3-(2-thienyl)benzyl]cyclopropylamine N-[2 -Fluoro-5-(2-thienyl)benzyl]cyclopropylamine N-[2-methoxy-5-(2-thienyl)benzyl]cyclopropylamine 5-{5-[(cyclopropylamino) )methyl]-2-fluorophenyl}thiophene-2-carbonitrile, and salts thereof . 如請求項18之式(IIb)化合物,其係選自由以下組成之清單:N-[2-氯-5-(2-呋喃基)苄基]環丙胺N-[2-氯-5-(2-噻吩基)苄基]環丙胺N-[2-氯-5-(3-噻吩基)苄基]環丙胺N-[2-氯-5-(5-氯-2-噻吩基)苄基]環丙胺。 A compound of the formula (IIb) according to claim 18, which is selected from the list consisting of N-[2-chloro-5-(2-furyl)benzyl]cyclopropylamine N-[2-chloro-5-( 2-thienyl)benzyl]cyclopropylamine N-[2-chloro-5-(3-thienyl)benzyl]cyclopropylamine N-[2-chloro-5-(5-chloro-2-thienyl)benzyl Base] cyclopropylamine. 一種式(Xa)化合物, 其中Z2及Z3如請求項1至14中任一項所定義, A表示A13,Xa1表示鹵素原子;經取代或未經取代之C1-C8烷基;包含多至9個可相同或不同之鹵素原子之C1-C8鹵烷基;經取代或未經取代之C3-C7環烷基;三(C1-C8烷基)矽烷基;經取代或未經取代之C1-C8烷氧基;或經取代或未經取代之C1-C8烷基硫基,Xa2表示氫;鹵素原子;經取代或未經取代之C1-C8烷基;包含多至9個可相同或不同之鹵素原子之C1-C8鹵烷基;經取代或未經取代之C3-C7環烷基;三(C1-C8烷基)矽烷基;經取代或未經取代之C1-C8烷氧基;或經取代或未經取代之C1-C8烷基硫基,U2表示鹵素原子或三氟甲磺酸酯基,限制條件為(Xa)不表示:N-(2,5-二氯苄基)-3-(二氟甲基)-5-氟-1-甲基-1H-吡唑-4-甲醯胺N-[1-(2,5-二氯苯基)乙基]-3-(二氟甲基)-5-氟-1-甲基-1H-吡唑-4-甲醯胺N-[2-(2,5-二氯苯基)丙-2-基]-3-(二氟甲基)-5-氟-1-甲基-1H-吡唑-4-甲醯胺N-[1-(2,5-二氯苯基)環丙基]-3-(二氟甲基)-5-氟-1-甲基-1H-吡唑-4-甲醯胺5-氯-N-[1-(2,5-二氯苯基)乙基]-3-(二氟甲基)-1-甲基-1H-吡唑-4-甲醯胺5-氯-N-[2-(2,5-二氯苯基)丙-2-基]-3-(二氟甲基)-1-甲基-1H-吡唑-4-甲醯胺5-氯-N-[1-(2,5-二氯苯基)環丙基]-3-(二氟甲基)-1-甲基-1H-吡唑-4-甲醯胺5-氯-N-(2,5-二氯苄基)-3-(二氟甲基)-1-甲基-1H-吡唑-4-甲醯胺N-(5-溴-2-氟苄基)-1,3,5-三甲基-1H-吡唑-4-甲醯胺 N-(5-溴-2-氟苄基)-3,5-二甲基-1H-吡唑-4-甲醯胺1-甲基-N-[1-(2,4,5-三氯苯基)乙基]-3-(三氟甲基)-1H-吡唑-4-甲醯胺3-(二氟甲基)-1-甲基-N-[1-(2,4,5-三氯苯基)乙基]-1H-吡唑-4-甲醯胺N-(5-氯-2-氟苄基)-1-甲基-5-丙氧基-3-(三氟甲基)-1H-吡唑-4-甲醯胺N-(2,5-二氯苄基)-1-甲基-5-丙氧基-3-(三氟甲基)-1H-吡唑-4-甲醯胺,以及其鹽。 a compound of formula (Xa), Wherein Z 2 and Z 3 are as defined in any one of claims 1 to 14, A represents A 13 , X a1 represents a halogen atom; substituted or unsubstituted C 1 -C 8 alkyl; contains up to 9 C 1 -C 8 haloalkyl which may be the same or different halogen atom; substituted or unsubstituted C 3 -C 7 cycloalkyl; tri(C 1 -C 8 alkyl)decyl; substituted or not Substituted C 1 -C 8 alkoxy group; or substituted or unsubstituted C 1 -C 8 alkylthio group, X a2 represents hydrogen; halogen atom; substituted or unsubstituted C 1 -C 8 An alkyl group; a C 1 -C 8 haloalkyl group containing up to 9 halogen atoms which may be the same or different; a substituted or unsubstituted C 3 -C 7 cycloalkyl group; a tri(C 1 -C 8 alkyl group) a nonyl group; a substituted or unsubstituted C 1 -C 8 alkoxy group; or a substituted or unsubstituted C 1 -C 8 alkylthio group; U 2 represents a halogen atom or a trifluoromethanesulfonate The restriction condition is that (Xa) does not mean: N-(2,5-dichlorobenzyl)-3-(difluoromethyl)-5-fluoro-1-methyl-1H-pyrazole-4-methyl Indoleamine N-[1-(2,5-dichlorophenyl)ethyl]-3-(difluoromethyl)-5-fluoro-1-methyl-1H-pyrazole-4-carboxamide N -[2-(2,5-dichlorophenyl)propan-2-yl]-3-(difluoromethyl) 5-)fluoro-1-methyl-1H-pyrazole-4-carboxamide N-[1-(2,5-dichlorophenyl)cyclopropyl]-3-(difluoromethyl) -5-fluoro-1-methyl-1H-pyrazole-4-carboxamide 5-chloro-N-[1-(2,5-dichlorophenyl)ethyl]-3-(difluoromethyl )-1-methyl-1H-pyrazole-4-carboxamide 5-chloro-N-[2-(2,5-dichlorophenyl)propan-2-yl]-3-(difluoromethyl )-1-methyl-1H-pyrazole-4-carboxamide 5-chloro-N-[1-(2,5-dichlorophenyl)cyclopropyl]-3-(difluoromethyl)- 1-methyl-1H-pyrazole-4-carboxamide 5-chloro-N-(2,5-dichlorobenzyl)-3-(difluoromethyl)-1-methyl-1H-pyrazole 4-Methylguanamine N-(5-bromo-2-fluorobenzyl)-1,3,5-trimethyl-1H-pyrazole-4-carboxamide N-(5-bromo-2-fluoro Benzyl)-3,5-dimethyl-1H-pyrazole-4-carboxamide 1-methyl-N-[1-(2,4,5-trichlorophenyl)ethyl]-3- (trifluoromethyl)-1H-pyrazole-4-carbamide 3-(difluoromethyl)-1-methyl-N-[1-(2,4,5-trichlorophenyl)ethyl -1H-pyrazole-4-carbamide N-(5-chloro-2-fluorobenzyl)-1-methyl-5-propoxy-3-(trifluoromethyl)-1H-pyrazole 4-Methylguanamine N-(2,5-dichlorobenzyl)-1-methyl-5-propoxy-3-(trifluoromethyl)-1H-pyrazole-4-carboxamide, And its salt. 如請求項20之化合物,其係選自由以下組成之清單:N-(5-氯-2-乙基苄基)-3-(二氟甲基)-5-氟-1-甲基-1H-吡唑-4-甲醯胺N-(5-氯-2-異丙基苄基)-3-(二氟甲基)-5-氟-1-甲基-1H-吡唑-4-甲醯胺N-[5-氯-2-(三氟甲基)苄基]-3-(二氟甲基)-5-氟-1-甲基-1H-吡唑-4-甲醯胺N-[3-氯-2-氟-6-(三氟甲基)苄基]-3-(二氟甲基)-5-氟-1-甲基-1H-吡唑-4-甲醯胺。 The compound of claim 20, which is selected from the list consisting of N-(5-chloro-2-ethylbenzyl)-3-(difluoromethyl)-5-fluoro-1-methyl-1H -pyrazole-4-carboxamide N-(5-chloro-2-isopropylbenzyl)-3-(difluoromethyl)-5-fluoro-1-methyl-1H-pyrazole-4- Methionamine N-[5-chloro-2-(trifluoromethyl)benzyl]-3-(difluoromethyl)-5-fluoro-1-methyl-1H-pyrazole-4-carboxamide N-[3-chloro-2-fluoro-6-(trifluoromethyl)benzyl]-3-(difluoromethyl)-5-fluoro-1-methyl-1H-pyrazole-4-carboxamidine amine. 一種殺真菌劑組合物,其包含作為活性成分之有效量如請求項1至14中任一項之式(I)化合物及農業上可接受之載體、載劑或填充劑。 A fungicide composition comprising as an active ingredient an effective amount of a compound of formula (I) according to any one of claims 1 to 14 and an agriculturally acceptable carrier, carrier or filler. 一種控制作物之植物病原性真菌之方法,其特徵在於向生長植物或能夠生長植物之土壤、植物之葉子及/或果實或植物之種子施用農藝學上有效且實質上非植物毒性量之如請求項1至14中任一項之化合物或如請求項21之組合物。 A method for controlling a phytopathogenic fungus of a crop, characterized by applying an agronomically effective and substantially non-phytotoxic amount to a growing plant or a soil capable of growing the plant, a leaf of the plant and/or a fruit or a plant. The compound of any one of items 1 to 14 or the composition of claim 21. 一種如請求項1至14中任一項之式(I)化合物之用途,其係用於控制植物病原性有害真菌。 A use of a compound of formula (I) according to any one of claims 1 to 14 for controlling a phytopathogenic harmful fungus. 一種產生用於控制植物病原性有害真菌之組合物之方法,其特徵在於將如請求項1至14中任一項之式(I)衍生物與增量劑及/或界面活性劑混合。 A method of producing a composition for controlling a phytopathogenic harmful fungus, characterized in that a derivative of the formula (I) according to any one of claims 1 to 14 is mixed with a bulking agent and/or a surfactant. 一種如請求項1至14中任一項之式(I)化合物之用途,其係用於處理植物、種子、轉殖基因植物或轉殖基因種子。 Use of a compound of formula (I) according to any one of claims 1 to 14 for the treatment of plants, seeds, transgenic plants or transgenic seeds.
TW102114089A 2012-04-20 2013-04-19 N-cycloalkyl-n-[(heterocyclylphenyl)methylene]-(thio)carboxamide derivatives TWI594695B (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
EP12356010 2012-04-20
EP12356015 2012-07-05
US201261675001P 2012-07-24 2012-07-24

Publications (2)

Publication Number Publication Date
TW201347673A true TW201347673A (en) 2013-12-01
TWI594695B TWI594695B (en) 2017-08-11

Family

ID=50157223

Family Applications (2)

Application Number Title Priority Date Filing Date
TW102114089A TWI594695B (en) 2012-04-20 2013-04-19 N-cycloalkyl-n-[(heterocyclylphenyl)methylene]-(thio)carboxamide derivatives
TW102114088A TW201348243A (en) 2012-04-20 2013-04-19 N-cycloalkyl-N-[(trisubstitutedsilylphenyl)methylene]-(thio)carboxamide derivatives

Family Applications After (1)

Application Number Title Priority Date Filing Date
TW102114088A TW201348243A (en) 2012-04-20 2013-04-19 N-cycloalkyl-N-[(trisubstitutedsilylphenyl)methylene]-(thio)carboxamide derivatives

Country Status (1)

Country Link
TW (2) TWI594695B (en)

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2008065500A2 (en) * 2006-11-30 2008-06-05 Pfizer Products Inc. Heteroaryl amides as type i glycine transport inhibitors
AR066162A1 (en) * 2007-07-31 2009-07-29 Bayer Cropscience Sa FUNGICIDE DERIVATIVES OF N- CICLOALQUIL -N- CARBOXAMIDA- BICICLICA
WO2009024342A2 (en) * 2007-08-23 2009-02-26 Syngenta Participations Ag Novel microbiocides
TW201225957A (en) * 2010-09-17 2012-07-01 Taisho Pharmaceutical Co Ltd Glycine transporter inhibitor

Also Published As

Publication number Publication date
TWI594695B (en) 2017-08-11
TW201348243A (en) 2013-12-01

Similar Documents

Publication Publication Date Title
TW201534589A (en) N-cycloalkyl-N-[(fusedphenyl)methylene]-(thio)carboxamide derivatives
TW201605820A (en) N-cycloalkyl-N-(biheterocyclymethylene)-(thio)carboxamide derivatives
US20190092765A1 (en) N-cycloalkyl-n-[(heterocyclylphenyl)methylene]-(thio)carboxamide derivatives
US9686985B2 (en) Fungicide N-cycloalkyl-N-bicyclicmethylene-carboxamide derivatives
TW201607929A (en) N-cycloalkyl-N-{[2-(1-substitutedcycloalkyl) phenyl]methylene}-(thio)carboxamide derivatives
US9765049B2 (en) N-cycloalkyl-N-[(fusedphenyl)methylene]-(thio)carboxamide derivatives
TW201605792A (en) N-hetaryl(thio)carbonyl-2-(benzocycloalken-1-yl)cyclamines
TW201609661A (en) N-cycloalkyl-N-{[2-(1-substitutedcycloalkyl)phenyl]methylene}-(thio)carboxamide derivatives
US9540314B2 (en) N-cycloalkyl-N-[(cycloalkenylphenyl)methylene]-(thio) carboxamide derivatives
TWI594695B (en) N-cycloalkyl-n-[(heterocyclylphenyl)methylene]-(thio)carboxamide derivatives
US10214510B2 (en) N-cycloalkyl-N-(biheterocyclylethylene)-(thio)carboxamide derivatives
JP2015516396A (en) N-cycloalkyl-N-[(trisubstituted silylphenyl) methylene]-(thio) carboxamide derivatives
JP2015504442A (en) Bactericidal N-bicycloalkyl and N-tricycloalkyl (thio) carboxamide derivatives

Legal Events

Date Code Title Description
MM4A Annulment or lapse of patent due to non-payment of fees