TW201343978A - Plating system and waste water treating method - Google Patents

Abstract

The present disclosure relates to a plating system. The plating system includes a first cleaning tank, a plating tank, a second cleaning tank, and a third cleaning tank, an ion exchange device, and a reverse osmosis device. The ion exchange device includes a tower body and a chelating type ion exchange resin. The tower body is connected between the second cleaning tank and the reverse osmosis device. The chelating type ion exchange resin is configured for exchanging ion with waste water from the second cleaning tank. The reverse osmosis device includes a reverse osmosis film for reverse osmosis treating the waste water from the ion exchange device, thereby gaining permeate water and rejected water. The reverse osmosis device includes a permeate water outlet and a rejected water outlet. The permeate water outlet is connected to the third cleaning tank. The rejected water outlet is connected to the first cleaning tank. The present disclosure also relates to a waste water treating method by using the plating system.

Description

Electroplating system and wastewater treatment method thereof

The invention relates to an electroplating technology, in particular to an electroplating system and a wastewater treatment method of an electroplating system.

With the rapid development of the electronics industry, the production technology of circuit boards, which are the basic components of electronic products, is becoming more and more important. The circuit board is generally fabricated by a series of processes such as cutting, drilling, electroplating, exposure, development, etching, pressing, printing, and molding of a copper-clad substrate. For details, see "Dielectric characterization of printed circuit board substrates" by C. H. Steer et al., Proceedings of the IEEE, Vol. 39, No. 2 (August 2002). Among them, an important manufacturing process of electroplating circuit board production mainly uses a plating system to selectively plate copper on the surface of the circuit board and copper plating on the through hole wall. However, the washing wastewater containing a large amount of heavy metal copper ions generated during the electroplating process not only causes serious pollution to the environment, but also causes a large amount of heavy metal resources to be lost.

In circuit board factories, because the source of washing wastewater is too complicated, most companies often use physical methods to treat washing wastewater. The physical method utilizes physical action to separate pollutants in a suspended state in the wastewater. This process does not alter the chemical nature of the material, such as coagulation sedimentation. Coagulation sedimentation technology refers to the injection of an appropriate amount of coagulant (polyaluminum chloride, polyferric sulfate, cationic polydecylamine, etc.) into the washing wastewater, and after thorough mixing and reaction, the micro-suspended particles and colloidal particles in the wastewater The coagulation acts on each other and becomes a floc with large particles and easy to settle. It is removed by precipitation, and the wastewater after coagulation and sedimentation is discharged to the outside. However, the wastewater treated by the above method is directly discharged to the outside world, pollutes the environment and wastes a large amount of water resources.

Therefore, it is necessary to provide a wastewater treatment method for an electroplating system and an electroplating system that can effectively recycle water washing wastewater.

Hereinafter, a wastewater treatment method of an electroplating system and an electroplating system will be described by way of examples.

An electroplating system includes an electroplating apparatus and a wastewater treatment apparatus. The electroplating apparatus includes a first water washing tank, a plating tank, a second water washing tank and a third water washing tank which are disposed adjacent to each other in sequence. The first water washing tank is used for water washing of the workpiece to be plated. The plating bath is used to plate a workpiece. The second water washing tank and the third water washing tank are used for water washing the electroplated workpiece. The wastewater treatment facility includes an ion exchange device and a reverse osmosis device. The ion exchange apparatus includes a tower body and a heavy metal selective ion exchange resin housed in the tower body. The tower body has a tower body inlet port and a tower body outlet port. The tower body inlet is connected to the second water washing tank. A first inlet valve is installed between the second water washing tank and the liquid inlet of the tower body. The tower body outlet is in communication with the reverse osmosis unit. A second inlet valve is installed between the tower body outlet and the reverse osmosis unit. The heavy metal selective ion exchange resin is used for ion exchange with water washing wastewater. The reverse osmosis device is provided with a reverse osmosis membrane for performing reverse osmosis treatment on the ion-washed wastewater after ion exchange to obtain pure water and concentrated water separated from each other. The reverse osmosis device has a pure water outlet and a concentrated water outlet. The pure water outflow port is connected to the third water washing tank for conveying pure water generated after the reverse osmosis device treatment to the third water washing tank. The concentrated water outlet is connected to the first water washing tank for conveying concentrated water generated after the reverse osmosis device treatment to the first water washing tank.

A wastewater treatment method for an electroplating system, comprising the steps of: providing the electroplating system; injecting the washing wastewater generated by the second water washing tank into the tower body; performing ion displacement treatment on the washing wastewater in the tower body, thereby obtaining ion replacement Then washing the wastewater; injecting the ion-washed wastewater into the reverse osmosis device, performing reverse osmosis treatment on the washing wastewater in the reverse osmosis device, thereby obtaining mutually separated pure water and concentrated water; and obtaining The pure water is injected into the third water washing tank, and the obtained concentrated water is injected into the first water washing tank.

The electroplating system of the technical solution and the wastewater treatment method of the electroplating system first treat the washing wastewater by using an ion exchange device and a reverse osmosis device, and then replenish the pure water and the concentrated water obtained after the treatment to the third water washing tank respectively. In the first water washing tank, not only the third water washing tank and the first water washing tank can be continuously added with a part of water, thereby improving the utilization rate of the washing wastewater, and effectively reducing the possibility that the washing wastewater pollutes the environment.

Hereinafter, the wastewater treatment system of the electroplating system and the electroplating system of the present technical solution will be described with reference to the accompanying drawings and the embodiments.

Referring to FIG. 1 , a preferred embodiment of the present invention provides an electroplating system 100 for performing electroplating treatment on a circuit substrate (not shown) and processing the wastewater generated in the electroplating process to enable processing. Waste water can be reused in the electroplating process. The electroplating system 100 includes an electroplating apparatus 10 and a wastewater treatment apparatus 20 connected to the electroplating apparatus 10.

The electroplating apparatus 10 is used for electroplating a circuit substrate, and includes a first water washing tank 11, a fourth water washing tank 12, a plating tank 16, a second water washing tank 13, a third water washing tank 14, and a fifth water washing tank 15. The fifth washing tank 15 is located between the second washing tank 13 and the third washing tank 14. The first washing tank 11, the fourth washing tank 12, the plating tank 16, the second washing tank 13, the third washing tank 14, and the fifth washing tank 15 are sequentially disposed adjacent to each other. When the circuit substrate is subjected to the plating treatment, it is sequentially subjected to a process such as water washing before plating, plating, and water washing after plating.

Both the first washing tank 11 and the fourth washing tank 12 are used to wash the circuit board before plating. The first washing tank 11 has a first liquid inlet 101 and a first liquid outlet 103. The first liquid inlet 101 is connected to the wastewater treatment facility 20. The first liquid outlet 103 is connected to a waste water collection tank (not shown) by the waste liquid discharge pipe 105, so that the water washing waste water in the first water washing tank 11 can flow into the waste liquid discharge pipe through the waste liquid discharge pipe 105. 105 connected wastewater collection tanks. The fourth washing tank 12 has a fourth liquid inlet 121. The fourth liquid inlet 121 is connected to the water washing water supply tank 125 by the water washing water supply pipe 123 to replenish the water in the fourth water washing tank 12. Since the water in the fourth water washing tank 12 is cleaner than the water in the first water washing tank 11, an overflow port 107 is provided between the fourth water washing tank 12 and the first water washing tank 11 so that the water in the fourth water washing tank 12 is Water may overflow into the first washing tank 11 to replenish the first washing tank 11 with a portion of the water.

A plating solution is placed in the plating bath 16 for plating the circuit board.

The second washing tank 13, the third washing tank 14, and the fifth washing tank 15 are both used for washing the plated circuit board. The second washing tank 13 has a second liquid outlet 132, a second liquid inlet 133, a waste liquid discharge port 135, a backwash water outlet port 137, and a backwash water inlet port 139. The second liquid outlet 132, the second liquid inlet 133, the backwash water outlet 137, and the backwash water inlet 139 are all connected to the wastewater treatment facility 20. The waste liquid discharge port 135 injects a part of the water washing waste water in the second water washing tank 13 into the waste water collection tank connected to the waste liquid discharge pipe 105 by the waste liquid discharge pipe 136. The third washing tank 14 has two third liquid inlets 141 and 143. A third liquid inlet 141 is connected to the wastewater treatment facility 20. The other third liquid inlet 143 is connected to the water washing water supply tank 125 by the water washing water supply pipe 123 to replenish the water in the third water washing tank 14.

Since the water in the third washing tank 14 is cleaner than the water in the fifth washing tank 15, the water in the fifth washing tank 15 is cleaner than the second washing tank 13, so that between the second washing tank 13 and the fifth washing tank 15 There is an overflow port 131, an overflow tank 145 between the third water washing tank 14 and the fifth water washing tank 15, so that the water in the third water washing tank 14 can overflow into the fifth water washing tank 15, the fifth water washing tank The water in 15 can overflow into the second washing tank 13.

The circuit board is sequentially transported through the water in the first water washing tank 11 and the fourth water washing tank 12, and then enters the plating tank 16 for electroplating. The circuit board after electroplating is sequentially transported through the water in the second water washing tank 13, the fifth water washing tank 15 and the third water washing tank 14, and then enters a subsequent process, such as exposure, development, etching, pressing, printing, molding, etc. .

It is understood by those skilled in the art that a water washing tank, two water washing tanks or more water washing tanks may be further disposed between the first water washing tank 11 and the fourth water washing tank 12, mainly according to the circuit to be cleaned. The substrate needs to meet the quality requirements and be specifically set. It is also understood by those skilled in the art that there may be two water washing tanks, three water washing tanks or more water washing tanks between the second water washing tank 13 and the third water washing tank 14 , mainly according to the water to be cleaned. The circuit board needs to meet the quality requirements and be specifically set.

Referring to FIG. 2 together, the wastewater treatment device 20 is used for purifying and regenerating the washing wastewater generated by the second water washing tank 13, and returning the purified water to the third water washing tank 14 and the first water washing tank 11 . The wastewater treatment apparatus 20 includes an ion exchange device 21, a filter element device 80 connected between the second water washing tank 13 and the ion exchange unit 21, a reverse osmosis unit 50, and a buffer connected between the ion exchange unit 21 and the reverse osmosis unit 50. Slot 90. The water washing waste water generated by the second washing tank 13 passes through the filter core device 80, passes through the ion exchange device 21, enters the buffer tank 90, and finally passes through the reverse osmosis device 50 for the third water washing tank 14 and the first water washing tank 11 .

Specifically, the filter element device 80 is provided with a filter material for filtering out impurities of larger particles in the washing water in the second washing tank 13 before the washing wastewater is injected into the ion exchange device 21. The filter element device 80 has a filter inlet 801 and a filter outlet 803. The filter inlet 801 is connected to the second outlet 132 of the second washing tank 13 by the first infusion tube 31, so that the washing wastewater in the second washing tank 13 is sequentially passed through the second outlet 132 and the first infusion. The tube 31 and the filter inlet port 801 are injected into the filter element unit 80. The filter outlet port 803 communicates with the ion exchange device 21 via the second infusion tube 32. The first infusion valve 40 is mounted on the second infusion tube 32, so that the washing wastewater in the second washing tank 13 filtered by the filter device 80 is sequentially passed through the filter outlet port 803, the second infusion tube 32, and the first inlet. The liquid valve 40 is injected into the ion exchange device 21.

The ion exchange device 21 is configured to perform ion exchange treatment on the washed wastewater filtered by the filter element device 80 from the second water washing tank 13 to wash the copper ions and water in the washing wastewater filtered by the filter core device 80 from the second water washing tank 13. The wastewater phase is separated. The ion exchange device 21 includes a column body 201 and a heavy metal selective ion exchange resin 203 housed in the column body 201. The heavy metal selective ion exchange resin 203 is for adsorbing copper ions in the water washing wastewater filtered by the filter element device 80 from the second water washing tank 13.

For example, the column body 201 may be a 4 L column, and the heavy metal selective ion exchange resin 203 may be an Aminodiacetic acid (IDA) group-containing Amberlite IRC 748 resin, and the volume of the heavy metal selective ion exchange resin 203. It is 2L. Of course, the heavy metal selective ion exchange resin 203 may also be a polystyrene triethanolamine resin or a triethylenetetramine type resin or other heavy metal selective resin.

The tower body 201 has a tower body inlet port 2011, an internal cavity 2012, and a tower body outlet port 2013 which are sequentially connected. The tower body inlet port 2011 is connected to the filter element outlet port 803 by the second infusion tube 32, so that the washing wastewater from the second water washing tank 13 is sequentially passed through the first infusion tube 31, the filter element device 80, the second infusion tube 32, The first inlet valve 40 and the column inlet port 2011 are injected into the internal cavity 2012 of the column body 201 to undergo an ion exchange reaction with the heavy metal selective ion exchange resin 203, thereby reducing the content of copper ions in the washing wastewater. The flow rate of the washing wastewater is from 12 liters/hour to 64 liters/hour. In the present embodiment, the flow rate of the washing wastewater is 60 liters/hour.

The tower body outlet port 2013 is connected to the reverse osmosis unit 50 via the third infusion tube 33 and the buffer tank 90 to inject the washed wastewater treated with the heavy metal selective ion exchange resin 203 into the reverse osmosis unit 50. The third infusion tube 33 is mounted with a second inlet valve 41.

The ion exchange unit 21 is also connected to a regeneration treatment tank 17 and a waste water collection tank 19. The regeneration treatment tank 17 is provided with a regeneration treatment liquid 18, and the regeneration treatment tank 17 is connected to the tower body inlet port 2011 of the tower body 201 by the first connection pipe 61, and the wastewater collection tank 19 is connected to the tower by the second connection pipe 62. The body outlets 2013 are connected. The first connecting pipe 61 is mounted with a third inlet valve 42, and the second connecting pipe 62 is mounted with a fourth inlet valve 43. When the adsorption capacity of the heavy metal selective ion exchange resin 203 is saturated, in order to regenerate the heavy metal selective ion exchange resin 203 to restore its adsorption capacity, the first inlet valve 40, the second inlet valve 41, and the fifth inlet valve may be closed. 44 and the sixth inlet valve 45, and the third inlet valve 42 and the fourth inlet valve 43 are opened, so that the regeneration treatment liquid 18 is fed through the first connection pipe 61, the third inlet valve 42, and the tower body. The port 2011 enters the internal cavity 2012 to regenerate the heavy metal selective ion exchange resin 203. The regeneration treatment liquid 18 may be 5% to 20% by volume of sulfuric acid or hydrochloric acid, and its flow rate ranges from 4 liters/hour to 8 liters/hour. Preferably, in the present embodiment, the regeneration treatment liquid 18 is 10% sulfuric acid, and the flow rate thereof is 6 liters/hour. The regeneration treatment liquid 18 may undergo an ion exchange reaction with the heavy metal selective ion exchange resin 203 to remove copper ions adsorbed on the heavy metal selective ion exchange resin 203 from the heavy metal selective ion exchange resin 203. The regeneration treatment liquid 18 carrying the copper ions after the ion exchange reaction occurs is sequentially injected into the wastewater collection tank 19 via the tower body outlet port 2013, the fourth inlet valve 43 and the second connection pipe 62 for subsequent processing, such as re-injection plating. The tank 16 is either concentrated or discarded.

It will be understood by those skilled in the art that a high pressure pump can also be provided between the regeneration treatment tank 17 and the third inlet valve 42 and between the fourth inlet valve 43 and the waste water collection tank 19 to facilitate the regeneration treatment. The regeneration treatment liquid 18 in the tank 17 and the regeneration treatment liquid 18 carrying copper ions can be more easily injected into the corresponding column body 201 and the wastewater collection tank 19.

Preferably, the tower body outlet port 2013 of the tower body 201 is also connected to the backwash water outlet port 137 of the second water washing tank 13 by the third connecting pipe 63, and the tower body inlet port 2011 of the tower body 201 is also The fourth connecting pipe 64 is connected to the backwashing water inlet 139 of the second washing tank 13. The third connecting pipe 63 is mounted with a fifth inlet valve 44, and the fourth connecting pipe 64 is mounted with a sixth inlet valve 45. After a period of ion exchange, some impurities in the tower body 201 and the broken heavy metal selective ion exchange resin 203 are left in the tower body 201, and the impurities and the broken heavy metal selective ion exchange resin 203 are compared. The bulky heavy metal selective ion exchange resin 203 is mixed together, which affects the adsorption capacity of the bulky heavy metal selective ion exchange resin 203 for copper ions, in order to separate the impurities and the broken heavy metal selective ion exchange resin 203 with The larger block of heavy metal selective ion exchange resin 203 is separated to increase the adsorption capacity of the larger bulk heavy metal selective ion exchange resin 203, and the column 201 needs to be backwashed. During the backwashing process, the first inlet valve 40, the second inlet valve 41, the third inlet valve 42 and the fourth inlet valve 43 are closed, and the fifth inlet valve 44 and the sixth inlet valve 45 are opened to The water washing waste water in the second water washing tank 13 is sequentially injected into the tower body 201 from the tower body liquid outlet port 2013 of the tower body 201 via the fifth inlet valve 44 and the third connecting pipe 63 to backwash the tower body 201, thereby The water washing wastewater is caused to bring the impurities and the broken heavy metal selective ion exchange resin 203 from the bottom of the column body 201 to the top of the column body 201. The impurities and the broken heavy metal selective ion exchange resin 203 moved to the top of the tower body 201 are sequentially injected into the second water washing tank through the sixth inlet valve 45 and the fourth connecting pipe 64 from the tower body inlet port 2011 with the washing wastewater. 13 thereby separating the impurities and the broken heavy metal selective ion exchange resin 203 from the larger heavy metal selective ion exchange resin 203 to improve the adsorption capacity of the heavy metal selective ion exchange resin 203 for copper ions.

It will be understood by those skilled in the art that a high pressure pump can be provided between the second water washing tank 13 and the fifth liquid inlet valve 44 so that the washing water in the second water washing tank 13 can be more easily discharged from the tower body. The liquid port 2013 is injected into the tower body 201; there may also be a high pressure pump between the second water washing tank 13 and the sixth liquid inlet valve 45, so that the washing waste water carrying the impurities and the broken heavy metal selective ion exchange resin 203 can be more easily The second water washing tank 13 is injected from the tower body inlet port 2011.

In addition, the water used for backwashing the tower body 201 may also be from the first water washing tank 11, the fourth water washing tank 12 or the fifth water washing tank 15, and the backwashed water may be injected into the first water washing tank 11 and the fourth water washing tank. The tank 12 or the fifth washing tank 15.

It should be noted that, in this embodiment, in order to make the heavy metal selective ion exchange resin 203 have better ion exchange quality, the filter element device 80 is used to wash the impurities of the larger particles in the washing wastewater from the second water washing tank 13 in the water washing wastewater. Filtered out before being injected into the ion exchange unit 21 to prevent the heavy metal selective ion exchange resin 203 from being crushed by the impact of larger particulate impurities in the water washing waste water, and preventing large particle impurities in the water washing waste water from surrounding the heavy metal selective ion exchange resin 203. The adsorption capacity of the heavy metal selective ion exchange resin 203 for copper ions is lowered. Of course, it will be understood by those skilled in the art that the filter cartridge device 80 is not a necessary technical feature. Even if the filter element device 80 is omitted, that is, the ion exchange device 21 is directly in communication with the second water washing tank 13, the ion exchange treatment of the washing wastewater from the second water washing tank 13 can be realized.

It will be understood by those skilled in the art that a high pressure pump can be provided between the second washing tank 13 and the filter element device 80, so that the washing water in the second washing tank 13 can be more easily injected into the filter device 80; the filter device There may also be a high pressure pump between the 80 and the ion exchange unit 21 so that the water washing waste water filtered by the filter unit 80 can be more easily injected into the tower body 201 from the tower inlet port 2011.

The buffer tank 90 is connected between the ion exchange device 21 and the reverse osmosis device 50 to temporarily store the washing wastewater treated by the ion exchange device 21, thereby reducing the load of the reverse osmosis device 50. The buffer tank 90 has a buffer inlet port 903, a buffer outlet port 905, and a buffer overflow port 901. The buffer inlet port 903 is connected to the column body outlet port 2013 by the third infusion tube 33 so that the washing waste water treated by the ion exchange device 21 can be injected into the buffer tank 90. The buffer outlet port 905 is connected to the reverse osmosis unit 50 by the fourth infusion tube 34 so that the washing wastewater in the buffer tank 90 can be injected into the reverse osmosis unit 50. The buffer tank 90 is connected to the second liquid inlet 133 of the second water washing tank 13 through the buffer overflow port 901 and the overflow connecting pipe 65, so that the washing water discharged to the buffer overflow port 901 via the ion exchange device 21 can be The second water washing tank 13 is injected through the overflow connecting pipe 65.

The reverse osmosis device 50 is for performing reverse osmosis treatment on the washed wastewater from the buffer tank 90 after being treated with the heavy metal selective ion exchange resin 203, thereby obtaining phase-separated pure water and concentrated water. Strong electrolytes and weak electrolytes (such as SiO ₂ , CO _{2 ,} etc.) in pure water are removed or reduced to a certain extent. At 25 ° C, the conductivity range is: 2.0 μS/cm - 40.0 μS / Cm. The concentrated water brings the other impurities in the washing wastewater treated with the heavy metal selective ion exchange resin 203 and the impurities in the reverse osmosis device 50 out of the water of the reverse osmosis device. Preferably, in order to save cost, the reverse osmosis device 50 in the present embodiment may be similar in structure to a commercially available home type reverse osmosis water drinking device. For example, its purified water production can be approximately 7.9 liters per hour.

The reverse osmosis unit 50 includes a reverse osmosis unit 51 and a filter unit 53. The reverse osmosis unit 51 has a cavity 502 and a reverse osmosis membrane 503 disposed in the cavity 502. The cavity 502 has a reverse osmosis inlet 504 disposed at the top end of the cavity 502, a pure water outlet 505 disposed at the bottom end of the cavity 502, and a concentrated water outlet 507 disposed at the sidewall of the cavity 502. The washed wastewater treated by the heavy metal selective ion exchange resin 203 is sequentially injected into the cavity 502 via the tower body outlet port 2013, the third infusion pipe 33, the second inlet valve 41, and the reverse osmosis inlet port 504 to reverse osmosis. The membrane 503 filters the water-washed wastewater treated with the heavy metal-selective ion exchange resin 203 to obtain phase-separated pure water and concentrated water.

The pure water obtained by the reverse osmosis unit 51 is injected into the third water washing tank 14 through the pure water outflow port 505, the pure water delivery pipe 38, and the third liquid inlet port 141 to continuously supply water to the third water washing tank 14. Since the water in the third washing tank 14 can overflow into the fifth washing tank 15, the water in the fifth washing tank 15 can overflow into the second washing tank 13, so that the second washing tank 13, the third washing tank 14, and The water in the fifth washing tank 15 can be continuously updated.

The concentrated water obtained by the reverse osmosis unit 51 is injected into the first water washing tank 11 through the concentrated water outlet 507, the concentrated water delivery pipe 39, and the first liquid inlet 101, so that the first water washing tank 11 is continuously replenished with a part of the water.

The filtering unit 53 is configured to filter the washing wastewater from the buffer tank 90 treated by the heavy metal selective ion exchange resin 203 to remove impurities of larger particles in the washing wastewater treated by the heavy metal selective ion exchange resin 203, thereby reducing the inverse The amount of load of the permeation unit 51. The filter unit 53 includes a one-micron filter element unit 508, a granular activated carbon filter unit 509, and a compressed activated carbon filter unit 510 in series.

The micron-sized filter element unit 508 incorporates a micron-sized filter element material. The micron-sized filter material means that the filter material has a plurality of micron-sized pores such that impurities smaller than the pore size of the micro-scale pores can pass through the filter material. In the present embodiment, the micro-scale filter element unit 508 is a 5 micron filter element unit. It is understood by those skilled in the art that the micro-scale filter element unit 508 can also be a micron filter element unit such as a 4 micron filter element unit, a 6 micron filter element unit, a 3 micron filter element unit, etc., and should be selected according to actual needs.

The liquid inlet port 5081 of the micro-scale filter element unit 508 is connected to the buffer liquid outlet 905 by a fourth infusion tube 34. The liquid outlet 5083 of the micro-scale filter unit 508 is connected to the liquid inlet 5091 of the granular activated carbon filter unit 509 via the fifth infusion tube 35. The liquid outlet 5093 of the granular activated carbon filter unit 509 is connected to the liquid inlet 5101 of the compressed activated carbon filter unit 510 via the sixth infusion pipe 36. The liquid outlet 5013 of the compressed activated carbon filter unit 510 is connected to the reverse osmosis inlet 504 of the reverse osmosis unit 51, so that the washed wastewater treated by the heavy metal selective ion exchange resin 203 is sequentially passed through the micron filter unit 508, and the particle activity The carbon filter unit 509 and the compressed activated carbon filter unit 510 are filtered and then injected into the reverse osmosis unit 51 to reduce the load of the reverse osmosis unit 51. Of course, if the reverse osmosis unit 51 has a strong reverse osmosis ability, the filter unit 53 can also omit unnecessary. That is, the washed wastewater from the ion exchange device 21 can directly enter the reverse osmosis unit 51 after passing through the buffer tank 90, thereby separating into pure water and concentrated water.

It will be understood by those skilled in the art that the reverse osmosis device 50 and the first water washing tank 11 may have an inlet valve to facilitate control whether the concentrated water is injected into the first washing tank 11; the reverse osmosis unit 50 and the first A high pressure pump may also be provided between the washing tanks 11 so that concentrated water can be more easily injected into the first washing tank 11. It is also understood by those skilled in the art that the reverse osmosis device 50 and the third water washing tank 14 may have an inlet valve to control whether pure water is injected into the third water washing tank 14; the reverse osmosis device 50 and the A high pressure pump may also be provided between the three water washing tanks 14 so that pure water can be more easily injected into the third water washing tank 14.

In the present embodiment, since the flow rate of the washing wastewater is 60 liters/hour larger than the purified water production amount of the reverse osmosis device 50 by 7.9 liters/hour, a buffer tank 90 is provided between the ion exchange device 21 and the reverse osmosis device 50 to The washed wastewater treated by the ion exchange device 21 is temporarily stored, thereby reducing the load of the reverse osmosis device 50. It is understood by those skilled in the art that if the flow rate of the washing wastewater is equal to or less than the amount of purified water produced by the reverse osmosis unit 50, the buffer tank 90 can also be omitted. That is, the washing wastewater can be directly injected into the reverse osmosis unit 50 after passing through the ion exchange unit 21. It is also understood by those skilled in the art that the buffer tank 90 and the tower body 201, between the buffer tank 90 and the reverse osmosis unit 50, and between the buffer tank 90 and the second water washing tank 13 may also have liquid inlet. The valve is adapted to control whether the washing wastewater treated by the ion exchange device 21 can be correspondingly injected into the buffer tank 90, the reverse osmosis unit 50, and the first water washing tank 11. It is also understood by those skilled in the art that a high pressure pump can also be provided between the buffer tank 90 and the tower body 201, between the buffer tank 90 and the reverse osmosis unit 50, and between the buffer tank 90 and the second water washing tank 13. Therefore, the washed wastewater treated by the ion exchange device 21 can be more easily injected into the corresponding buffer tank 90, the reverse osmosis device 50, and the first water washing tank 11.

The method of treating waste water using the above electroplating system 100 is as follows: First, the water washing waste water in the second water washing tank 13 is injected into the filter element device 80 from the second water washing tank 13 to perform primary filtration on the washing wastewater; and then, the filter unit 80 is filtered. Then, the washing wastewater is injected into the column body 201; then, the copper ions in the washing wastewater injected into the column body 201 are ion-exchanged by the heavy metal selective ion exchange resin 203 in the column body 201, thereby obtaining the water washing wastewater after ion replacement. Then, the ion-washed wastewater after the ion replacement is injected into the reverse osmosis device 50; then, the reverse osmosis unit 51 in the reverse osmosis device 50 is subjected to reverse osmosis treatment in the reverse osmosis device to obtain the separation. Pure water and concentrated water; finally, the obtained pure water is injected into the third water washing tank 14, and the obtained concentrated water is injected into the first water washing tank 11.

In order to backwash the tower body 201, in the wastewater treatment method of the electroplating system 100, after the obtained pure water is injected into the third water washing tank 14, and the obtained concentrated water is injected into the first water washing tank 11, a The washing wastewater in the second washing tank 13 is injected into the tower body 201 through the backwashing water outlet 137, the sixth infusion pipe 36, the fifth inlet valve 44, and the tower body outlet port 2013, and sequentially The tower body inlet port 2011, the sixth inlet valve 45, the seventh infusion tube 37, and the backwash water inlet port 139 flow into the second water washing tank 13.

It is understood by those skilled in the art that the wastewater treatment method of the electroplating system 100 may further include the step of regenerating the heavy metal selective ion exchange resin 203 using the regeneration treatment liquid 18.

Compared with the prior art, the electroplating system 100 and the wastewater treatment method thereof of the present technical solution first treat the washing wastewater by using the ion exchange device 21 and the reverse osmosis device 50, and then supplement the pure water and the concentrated water obtained after the treatment respectively. In the third water washing tank 14 and the first water washing tank 11, not only the third water washing tank 14, the fifth water washing tank 15, the second water washing tank 13, and the first water washing tank 11 can be continuously added with water, thereby improving the washing wastewater. The utilization rate can effectively reduce the possibility that the washing wastewater pollutes the environment.

However, the above description is only a preferred embodiment of the present invention, and it is not possible to limit the scope of the patent application of the present invention. Equivalent modifications or variations made by persons skilled in the art in light of the spirit of the invention are intended to be included within the scope of the following claims.

100. . . Plating system

10. . . Plating equipment

20. . . Wastewater treatment equipment

11. . . First washing tank

12. . . Fourth washing tank

16. . . Plating tank

13. . . Second washing tank

14. . . Third washing tank

15. . . Fifth washing tank

twenty one. . . Ion exchange device

31. . . First infusion tube

32. . . Second infusion tube

40. . . First inlet valve

41. . . Second inlet valve

50. . . Reverse osmosis device

38. . . Pure water pipe

39. . . Concentrated water pipe

107, 131, 145, 901. . . Overflow

132. . . Second outlet

133. . . Second inlet

101. . . First inlet

103. . . First outlet

105, 136. . . Waste liquid discharge pipe

121. . . Fourth inlet

123. . . Washed water pipe

125. . . Washing water supply pool

141, 143. . . Third inlet

201. . . Tower body

203. . . Heavy metal selective ion exchange resin

2011. . . Tower inlet

2012. . . Internal cavity

2013. . . Tower body outlet

51. . . Reverse osmosis unit

502. . . Cavity

503. . . Reverse osmosis membrane

504. . . Reverse osmosis inlet

505. . . Pure water outlet

507. . . Concentrated water outlet

80. . . Filter device

801. . . Filter inlet

803. . . Filter outlet

90. . . Buffer tank

33. . . Third infusion tube

903. . . Buffer inlet

905. . . Buffer outlet

17. . . Regeneration pool

18. . . Regeneration treatment solution

34. . . Fourth infusion tube

42. . . Third inlet valve

35. . . Fifth infusion tube

43. . . Fourth inlet valve

19. . . Wastewater collection pool

36. . . Sixth infusion tube

44. . . Fifth inlet valve

37. . . Seventh infusion tube

45. . . Sixth inlet valve

137. . . Backwash water outlet

139. . . Backwash water inlet

53. . . Filter unit

508. . . Micron filter unit

509. . . Granular activated carbon filter unit

510. . . Compressed activated carbon filter unit

5081, 5091, 5101. . . Inlet port

5083, 5093, 5103. . . Liquid outlet

61. . . First connecting pipe

62. . . Second connecting pipe

63. . . Third connecting pipe

64. . . Fourth connecting pipe

65. . . Overflow connection pipe

FIG. 1 is a schematic diagram of an electroplating system provided by an embodiment of the present technical solution, which includes an ion exchange device.

2 is a schematic structural view of the ion exchange device of FIG. 1.

100. . . Plating system

10. . . Plating equipment

20. . . Wastewater treatment equipment

11. . . First washing tank

12. . . Fourth washing tank

16. . . Plating tank

13. . . Second washing tank

14. . . Third washing tank

15. . . Fifth washing tank

twenty one. . . Ion exchange device

31. . . First infusion tube

32. . . Second infusion tube

40. . . First inlet valve

41. . . Second inlet valve

50. . . Reverse osmosis device

38. . . Pure water pipe

39. . . Concentrated water pipe

107, 131, 145, 901. . . Overflow

132. . . Second outlet

133. . . Second inlet

101. . . First inlet

103. . . First outlet

105, 136. . . Waste liquid discharge pipe

121. . . Fourth inlet

123. . . Washed water pipe

125. . . Washing water supply pool

141, 143. . . Third inlet

2011. . . Tower inlet

2013. . . Tower body outlet

51. . . Reverse osmosis unit

502. . . Cavity

503. . . Reverse osmosis membrane

504. . . Reverse osmosis inlet

505. . . Pure water outlet

507. . . Concentrated water outlet

80. . . Filter device

801. . . Filter inlet

803. . . Filter outlet

90. . . Buffer tank

33. . . Third infusion tube

903. . . Buffer inlet

905. . . Buffer outlet

34. . . Fourth infusion tube

35. . . Fifth infusion tube

36. . . Sixth infusion tube

44. . . Fifth inlet valve

37. . . Seventh infusion tube

45. . . Sixth inlet valve

137. . . Backwash water outlet

139. . . Backwash water inlet

53. . . Filter unit

508. . . Micron filter unit

509. . . Granular activated carbon filter unit

510. . . Compressed activated carbon filter unit

5081, 5091, 5101. . . Inlet port

5083, 5093, 5103. . . Liquid outlet

63. . . Third connecting pipe

64. . . Fourth connecting pipe

65. . . Overflow connection pipe

Claims (12)

An electroplating system comprising an electroplating apparatus comprising a first water washing tank, a plating tank, a second water washing tank and a third water washing tank which are disposed adjacent to each other, wherein the first water washing tank is used for washing the workpiece to be plated The electroplating tank is used for electroplating a workpiece, and the second water washing tank and the third water washing tank are used for washing the electroplated workpiece, wherein the electroplating system further comprises a wastewater treatment device, and the wastewater treatment device comprises An ion exchange device comprising a tower body and a heavy metal selective ion exchange resin contained in the tower body, wherein the tower body has a tower body inlet port and a tower body outlet port, a liquid inlet of the tower body is connected to the second water washing tank, and a first liquid inlet valve is installed between the second water washing tank and the liquid inlet of the tower body, and the liquid outlet of the tower body is connected with the reverse osmosis device. A second inlet valve is installed between the tower body outlet port and the reverse osmosis device, and the heavy metal selective ion exchange resin is used for ion exchange with the washing wastewater, and the reverse osmosis device is provided with a reverse osmosis membrane. It is used for reverse osmosis treatment of the ion-washed wastewater after ion exchange to obtain pure water and concentrated water separated from each other, the reverse osmosis device has a pure water outlet and a concentrated water outlet, the pure water outlet and the first The triple water washing tank is connected to transport the pure water produced by the treatment of the reverse osmosis device to the third water washing tank, and the concentrated water outlet is connected to the first water washing tank for using the reverse osmosis device The concentrated water produced after the treatment is delivered to the first water washing tank. The electroplating system of claim 1, wherein the wastewater treatment apparatus further comprises a filter element device connected between the second water washing tank and the ion exchange device, the filter element device having a filter element a liquid inlet and a filter outlet, the filter inlet is connected to the second water washing tank by a first infusion tube, and the filter outlet is connected to the tower body by a second infusion tube The filter device is configured to filter out impurities of larger particles in the washing wastewater in the second water washing tank before the water washing wastewater is injected into the tower body of the ion exchange device, and the first inlet valve is installed. In the second infusion tube. The electroplating system of claim 1 or 2, wherein the wastewater treatment apparatus further comprises a buffer tank having a buffer inlet, a buffer outlet, and a buffer overflow. The buffer inlet port is connected to the tower body outlet port by a third infusion tube, and the buffer outlet port is connected to the reverse osmosis device by a fourth infusion tube, and the buffer overflow port is borrowed Connected to the second water washing tank by an overflow connecting pipe, and the second liquid inlet valve is installed in the third infusion pipe. The electroplating system of claim 3, wherein the wastewater treatment apparatus further comprises a high pressure pump connected between the buffer tank and the second water washing tank. The electroplating system of claim 1, wherein the ion exchange device is further connected to a regeneration treatment tank and a waste water collection tank, wherein the regeneration treatment tank contains a regeneration treatment liquid, and the regeneration treatment tank is used. a first connecting pipe is connected to the liquid inlet of the tower body, the first connecting pipe is installed with a third liquid inlet valve, and the waste water collecting pool is connected to the liquid outlet of the tower body by a second connecting pipe, The second connecting pipe is provided with a fourth inlet valve. The electroplating system of claim 1, wherein the ion exchange device further comprises a third connecting pipe, a fifth inlet valve installed in the third connecting pipe, a fourth connecting pipe, and a mounting a sixth inlet valve of the fourth connecting pipe, the second washing tank further has a backwash water outlet port and a backwash water inlet port, and the backwash water outlet port of the second water washing tank The backwater inlet is connected to the tower liquid inlet by the third connecting pipe, and the backwashing liquid inlet is connected to the tower body outlet by the fourth connecting pipe. The electroplating system of claim 1, wherein the ion exchange device further comprises a third connecting pipe, a fifth inlet valve installed in the third connecting pipe, a fourth connecting pipe, and a mounting a sixth inlet valve of the fourth connecting pipe, the first washing tank further has a backwashing water outlet and a backwashing water inlet, and the backwashing outlet of the first washing tank The backwater inlet is connected to the tower liquid inlet by the third connecting pipe, and the backwashing liquid inlet is connected to the tower body outlet by the fourth connecting pipe. The electroplating system of claim 1, wherein the reverse osmosis device comprises a filter unit and a reverse osmosis unit, and the filter unit is connected between the reverse osmosis unit and the liquid outlet of the tower body, For filtering impurities in the washing wastewater from the ion exchange device, the reverse osmosis unit has a cavity for accommodating the reverse osmosis membrane, the cavity having the pure water outlet, the concentrated water outlet and an inverse The liquid inlet is infiltrated, and the reverse osmosis inlet is connected to the filtering unit. The electroplating system of claim 8, wherein the filtering unit comprises a micron-sized filter unit, a granular activated carbon filter unit and a compressed activated carbon filter unit, which are sequentially connected in series, and the micro-scale filter unit and ion exchange The apparatus is connected, and the compressed activated carbon filter unit is connected to the reverse osmosis unit. A method for treating wastewater in an electroplating system, comprising the steps of:
Providing an electroplating system as described in claim 1;
Injecting the washing wastewater generated by the second water washing tank into the tower body;
The water washing wastewater in the tower body is subjected to ion replacement treatment to obtain the water washing wastewater after ion replacement;
The washed water washing wastewater is injected into the reverse osmosis device, and the water washing wastewater in the reverse osmosis device is subjected to reverse osmosis treatment to obtain mutually separated pure water and concentrated water; and the obtained pure water is injected into the water. The third water washing tank is described, and the obtained concentrated water is injected into the first water washing tank. The wastewater treatment method of claim 10, wherein the water washing wastewater generated in the second water washing tank is injected into a filter device before the water washing wastewater in the second water washing tank is injected into the tower body. And filtering the impurities in the washing wastewater in the second water washing tank. The wastewater treatment method according to claim 10, wherein after the obtained pure water is injected into the third water washing tank, and the obtained concentrated water is injected into the first water washing tank, a The water washing wastewater of the second water washing tank is injected into the tower body in a reverse direction to backwash the heavy metal selective ion exchange resin.