TW201339241A - Polymer composition for microelectronic assembly - Google Patents

Polymer composition for microelectronic assembly Download PDF

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TW201339241A
TW201339241A TW101110348A TW101110348A TW201339241A TW 201339241 A TW201339241 A TW 201339241A TW 101110348 A TW101110348 A TW 101110348A TW 101110348 A TW101110348 A TW 101110348A TW 201339241 A TW201339241 A TW 201339241A
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polymer
polymer composition
acid
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TW101110348A
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TWI507476B (en
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Christopher Apanius
Andrew Bell
Leah Langsdorf
W C Peter Tsang
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Promerus Llc
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Abstract

Embodiments in accordance with the present invention encompass polymer compositions that are useful in the assembly of microelectronic components onto a variety of substrate materials. Such polymer compositions providing for both holding the microelectronic components at desired positions on a substrate, providing fluxing for the solder bonding of such components to the substrate and remaining in place as an underfill for such components.

Description

微電子組件用之聚合物組成物 Polymer composition for microelectronic components

本申請案係被命名且請求在2010年11月23日所提出的美國臨時專利序號61/416508,發明名稱為“Polymer Composition for Microelectronic Assembly”。此臨時專利在此全部以引用方式併入本文中。 The present application is hereby incorporated by reference to U.S. Provisional Serial No. 61/416,508, entitled "Polymer Composition for Microelectronic Assembly", filed on November 23, 2010. This provisional patent is hereby incorporated by reference in its entirety.

依照本發明之具體實施例大致關於有益於將微電子元件安裝於基板之聚合物組成物,更具體而言為提供於基板上固定微電子元件在期望之位置,提供此元件焊接至基板之助熔,且保持原本之位置作為此元件用之底層填料之聚合物組成物。 Embodiments in accordance with the present invention generally relate to polymer compositions that are useful for mounting microelectronic components to a substrate, and more particularly to securing microelectronic components on a substrate at a desired location, providing assistance for soldering the component to the substrate. Melt and maintain the original position as the polymer composition of the underfill for this component.

當組裝電子電路在尺寸上已戲劇性地減小,使用焊接作為將電子元件以電性及固定性附著於基板之方法仍相當普及。然而,此附著必須在完成上述焊料附著之前先將各種元件保持在所欲位置,以及後電性底部填料連接。底部填料連接可以延長焊球連接之熱疲勞期、環保地保護該連接,以及對於組裝電子電路提供更好的機械性衝擊與穩固性。 When the assembled electronic circuit has been dramatically reduced in size, the use of soldering as a method of attaching electronic components to the substrate electrically and fixedly is still quite popular. However, this attachment must maintain the various components in the desired position prior to completion of the solder attachment described above, as well as the post-electric underfill connection. The underfill connection extends the thermal fatigue of the solder ball connection, protects the connection environmentally, and provides better mechanical shock and stability to the assembled electronic circuit.

現已大概成功地發展及使用許多種將元件保持在此所欲位置之解決方法。例如在施熱而進行焊接或焊球連接時可使用膠黏劑將該元件暫時地固定於基板。在完成此暫時之連接之後,膠黏劑會殘留成為污染物/殘渣,故組件應接受設計成移除此污染之額外處理步驟。對於一些上述解決方法,除了膠黏劑亦分別地提供助熔劑,例 如在與塗布膠黏劑不同之分別塗布步驟中塗布此助熔劑。其他之解決方法則提供組合膠黏劑之助熔劑,例如使用焊膏作為膠黏劑且將助熔劑加入或事先與之反應。 A number of solutions have been successfully developed and used to maintain the components in their desired position. For example, when soldering or solder ball bonding is applied while heat is applied, the component can be temporarily fixed to the substrate using an adhesive. After this temporary connection is completed, the adhesive will remain as a contaminant/residue, so the assembly should accept additional processing steps designed to remove this contamination. For some of the above solutions, in addition to the adhesive, the flux is separately provided, for example The flux is applied as in a separate coating step than the coating of the adhesive. Other solutions provide a fluxing agent for the combination of adhesives, such as the use of solder paste as an adhesive and the addition or prior reaction of the flux.

在其他之解決方法中,(參見美國專利第5,177,134號或美國公告申請案第2009/0294515號,分別為該’134專利及該’515申請案)於焊接時將膠黏劑與助熔劑摻合,膠黏劑汽化或分解。然而現已發現,於膠黏劑在或高於焊料回焊溫度下而汽化或分解,如上述每一例教示,任一個焊料回焊受限,來自膠黏劑之大量污染會殘留或需要特殊之處理設備。 In other solutions, (see U.S. Patent No. 5,177,134 or U.S. Patent Application Serial No. 2009/0294515, the '134 patent and the '515 application, respectively, incorporates an adhesive and a flux during welding). The adhesive vaporizes or decomposes. However, it has been found that the adhesive is vaporized or decomposed at or above the solder reflow temperature. As each of the above teachings, any solder reflow is limited, and a large amount of contamination from the adhesive may remain or require special Processing equipment.

因此新的解決方法可以提供單一材料,其在完成焊料附著之前(例如,表現如膠黏劑)保持元件於期望之位置,提供用以任何期望之助熔(例如,表現如助溶劑)並且也提供後電性底層填料連接係被期望的。更進一步地,若該解決方法可以消除對於此特殊設備之需求,如上所述,且減少或排除獲得所期望之焊料回焊及/或與其結果相關聯之任何污染的問題,其會具有優勢。 Thus a new solution can provide a single material that maintains the component in the desired position prior to completion of solder attachment (eg, as an adhesive), providing any desired fluxing (eg, performance as a co-solvent) and also It is desirable to provide a post-electric underfill connection. Still further, it would be advantageous if the solution could eliminate the need for this particular device, as described above, and reduce or eliminate the problem of obtaining the desired solder reflow and/or any contamination associated with its results.

以下參考實施例及申請專利範圍而揭述依照本發明之例示具體實施例。在此所揭述的例示具體實施例之各種修改、調整或變化因所揭示而對熟悉該技術領域之人士為顯而易知。應了解,所有此種依據本發明之教示且經此教示而改進此技術的修改、調整或變化均視為在本發明之範圍與精髓內。 Specific embodiments in accordance with the present invention are disclosed below with reference to the embodiments and claims. Various modifications, adaptations, and variations of the exemplary embodiments disclosed herein will be apparent to those skilled in the art. It is to be understood that all such modifications, adaptations, and variations of the present invention are intended to be within the scope and spirit of the invention.

於此處使用,該件數「一(”a”、”an”)」及「該(”the”)」 係包括複數參照者,除非另有明確地且直接地限制為一件參照者。 Used here, the number "one ("a", "an")" and "the" (the ")" The term includes plural referents unless otherwise explicitly and directly limited to one reference.

於此處使用,當用於關於化學化合物及/或代表的化學結構/化學式之該用語「群組(”group”或”groups”)」,其意指一或多個原子之安排。 As used herein, the term ""group" or "groups") when used in reference to a chemical compound and/or chemical structure/chemical formula, means an arrangement of one or more atoms.

於此處使用,聚合物之分子量值,如重量平均分子量(Mw)及數量平均分子量(Mn),係藉由凝膠滲透層析術使用聚苯乙烯標準品而測定。 Used herein, the molecular weight of the polymer, such as a weight average molecular weight (M w) and number average molecular weight (M n), by gel permeation chromatography-based technique measured using polystyrene standards.

於此處使用,多分散性指數(PDI)值係表示聚合物之重量平均分子量(Mw)對數量平均分子量(Mn)的比例(即Mw/Mn)。 As used herein in the polydispersity index (PDI) represented by the value-based polymer of weight average molecular weight (M w) ratio of the number average molecular weight (M n) (i.e. M w / M n).

於此處使用,除非另外指明,聚合物玻璃轉移溫度(Tg)值係藉由依據美國材料試驗學會(ASTM)方法編號D3418之微差掃瞄熱量法而測定。 As used herein, unless otherwise indicated, the polymer glass transition temperature ( Tg ) value is determined by the differential scanning thermal method according to ASTM method number D3418.

於此處使用,除非另外指明,聚合物分解溫度(Td)係藉由加熱速率為10℃/分鐘之熱重分析而測定之溫度,其聚合物之特定重量百分比(wt%)需已分解而測定。該用語Td5、Td50以及Td95係指在5wt%、50wt%以及95wt%已分解之溫度。 As used herein, unless otherwise indicated, the polymer decomposition temperature (T d ) is the temperature determined by thermogravimetric analysis at a heating rate of 10 ° C / min, and the specific weight percentage (wt %) of the polymer needs to be decomposed. And measured. The terms T d5 , T d50 and T d95 refer to temperatures which have been decomposed at 5 wt%, 50 wt% and 95 wt%.

除非另外指明,在此揭示之所有範圍或比例應該被了解係包含其中總和任何以及所有次範圍或次比例。例如所述範圍或比例「1至10」應視為包括最小值1至最大值10之間(以及包含在內)的任何以及所有次範圍;其係,所有的次範圍或是次比例係以最小值1開始或更多至最大值10結束或更少,諸如但不限於,1至6.1、3.5 至7.8、以及5.5至10。 All ranges or ratios disclosed herein are to be understood to include any and all sub-ranges or sub-ratio. For example, the range or ratio "1 to 10" shall be taken to include any and all sub-ranges between (from and including) the minimum value 1 to the maximum value 10; Minimum 1 starts or more to maximum 10 ends or less, such as but not limited to, 1 to 6.1, 3.5 To 7.8, and 5.5 to 10.

於操作實施例中,且除非另外指明,於說明書與申請專利範圍中表示成分之含量、反應之條件等所使用之所有數字應該被了解在所有之例示中均以用語「約」修飾是因為考量到測定這些值的各種不確定性。 In the working examples, and unless otherwise indicated, all numbers used in the specification and the scope of the claims, the contents of the ingredients, the conditions of the reaction, etc., should be understood in all the examples. To determine the various uncertainties of these values.

聚合物,諸如聚(碳酸丙烯酯),係廣為所知的,且前述’134專利以及’515申請案皆有教示如此之聚合物係為有效之膠黏劑。然而,此聚(碳酸丙烯酯)亦廣為所知係於200℃至280℃範圍溫度下之熱分解的物質,而在其中材料是被期望可以作為膠黏劑、助熔劑以及提供底層填料下因此也可能是有疑問的。這特別會成真係其一種不含鉛之焊料應用於製造焊料交互連接,因為此不含鉛之焊料通常具有高於一般使用之含鉛焊料30至40℃之熔點範圍。例如,當Sn99.3Cu0.7時,一般使用之Sn60Pb40焊料合金具有一183至190℃之熔點範圍,使用於提供於下述之實施例中,熔點為227℃。 Polymers, such as poly(propylene carbonate), are well known, and the '134 patents and the '515 application teach the use of such polymers as effective adhesives. However, the poly(propylene carbonate) is also widely known to be thermally decomposed under the temperature range of 200 ° C to 280 ° C, and in which the material is expected to be used as an adhesive, a flux and an underfill. Therefore, there may be doubts. This is particularly true when a lead-free solder is used to make solder interconnects because the lead-free solder typically has a melting point range of 30 to 40 ° C above the lead-containing solder used in general. For example, in the case of Sn99.3Cu0.7, the Sn60Pb40 solder alloy generally used has a melting point range of 183 to 190 ° C and is used in the following examples, and has a melting point of 227 ° C.

依據本發明之一些聚合物具體實施例係包括由立體特異性降莰烷二醇及/或二甲醇單體所形成之聚合物,而其他聚合物具體實施例係衍生自合適之伸烷基碳酸酯單體以及前述降莰烷二醇及/或二甲醇單體。有益地,一些如此聚合物具體實施例具有大於280℃之Td50,而其他如此聚合物具體實施例具有大於310℃之Td50,且又另其他如此聚合物具體實施例具有大於340℃之Td50。另外,一些如此含有聚合物具體實施例之降莰烷二醇及/或二甲醇係具有範圍為5,000至300,000之分子量(Mw),另 依具體實施例係25,000至200,000之Mw,以及又另其他如此具體實施例係40,000至185,000。 Some polymer embodiments in accordance with the present invention include polymers formed from stereospecific norcanediol and/or dimethanol monomers, while other polymer embodiments are derived from suitable alkyl carbonates. An ester monomer and the aforementioned norbornanediol and/or dimethanol monomer. Beneficially, some such polymer embodiments have a Td50 greater than 280 °C, while other such polymer embodiments have a Td50 greater than 310 °C, and still other such polymer embodiments have a T greater than 340 °C D50 . In addition, some of the norbornanediol and/or dimethanol systems thus containing a specific embodiment of the polymer have a molecular weight (M w ) ranging from 5,000 to 300,000, and in another embodiment, a M w of from 25,000 to 200,000, and Still other such embodiments are 40,000 to 185,000.

一些前述立體特異性降莰烷二醇及/或二甲醇單體係由下列化學式A、B或C所代表或選自於其中: Some of the aforementioned stereospecific norbornanediol and/or dimethanol monosystems are represented by or are selected from the following chemical formulas A, B or C:

其中,對每一化學式A、B及C,n係獨立地為0、1或2,每一個R1、R2、R3及R4係獨立地選自氫或含有但不限於1至25個碳原子之烴基;每一個R5及R6係獨立地選自-(CH2)p-OH,其中p係0、1、2或3,以及每一個X及X’係獨立地選自-CH2-、-CH2-CH2-以及-O-,其中X’如果存在,則使其朝向於與X相同或相反之方向。對於依據本發明之一些具體實施例,R5及R6之至少一個之p係1、2或3。 Wherein, for each of the chemical formulas A, B and C, n is independently 0, 1 or 2, and each of R 1 , R 2 , R 3 and R 4 is independently selected from hydrogen or contains, but is not limited to, 1 to 25 a hydrocarbon group of one carbon atom; each of R 5 and R 6 is independently selected from -(CH 2 ) p -OH, wherein p is 0, 1, 2 or 3, and each X and X' is independently selected from -CH 2 -, -CH 2 -CH 2 - and -O-, wherein X', if present, is oriented in the same or opposite direction as X. For some embodiments in accordance with the invention, at least one of R 5 and R 6 is p, 1, 2 or 3.

於此處使用之用語”烴基”以及相似之用詞,諸如”烴基團”意指含有碳及視情形之氫,其非限定實施例為烷基、環烷基、聚環烷基、芳基、芳烷基、烷芳基、烯基、環烯基、聚環烯基、炔基、環炔基以及聚環炔基之基團 的自由基。於此處使用之用語”鹵化烴基”意指共價地鍵結至一個碳的至少一個氫被一個鹵素取代的烴基團。於此處使用之用語”全鹵化烴基(perhalocarbyl)”意指其中全部的氫都被鹵素取代的烴基團。另外,於此處使用之用語”雜烴基”意指其中至少一個碳原子被一個雜原子取代,諸如氧、氮及/或硫的烴基團。 The term "hydrocarbyl" as used herein, and similar terms, such as "hydrocarbon group", mean carbon containing carbon and, as the case may be, non-limiting examples of which are alkyl, cycloalkyl, polycycloalkyl, aryl. a group of an aralkyl group, an alkylaryl group, an alkenyl group, a cycloalkenyl group, a polycycloalkenyl group, an alkynyl group, a cycloalkynyl group, and a polycycloalkynyl group Free radicals. The term "halogenated hydrocarbon group" as used herein means a hydrocarbon group which is covalently bonded to at least one hydrogen of one carbon by one halogen. The term "perhalocarbyl" as used herein means a hydrocarbon group in which all of the hydrogen is replaced by a halogen. Also, as used herein, the term "heterohydrocarbyl" means a hydrocarbon radical wherein at least one carbon atom is replaced by a heteroatom such as oxygen, nitrogen and/or sulfur.

於此處使用,用語”烷基”意指具有自C1至C25之碳鏈長度的線性或分支非環狀或環狀、飽和烴基。合適之烷基之非限定實施例包括甲基、乙基、丙基、異丙基、丁基、異丁基、第二丁基、第三丁基、戊基、新戊基、己基、庚基、辛基、壬基、癸基、十一烷基、十二烷基、十三烷基、十四烷基、十五烷基、十六烷基、十七烷基、十八烷基、十九烷基、二十烷基(isocanyl)、環丙基、環丁基、環戊基、環己基、環庚基、環辛基。於此處使用,用語”雜環烷基”意指其中一或多個環狀環之碳被雜原子取代,諸如氧、氮及/或硫之環烷基團。代表性之雜環烷基團係包括但不限於四氫呋喃基、四氫哌喃基、啉基以及哌啶基。 As used herein in the term "alkyl" means a linear or branched acyclic or cyclic from a C 1 to C 25 carbon chain length of the saturated hydrocarbon. Non-limiting examples of suitable alkyl groups include methyl, ethyl, propyl, isopropyl, butyl, isobutyl, second butyl, tert-butyl, pentyl, neopentyl, hexyl, g. Base, octyl, decyl, decyl, undecyl, dodecyl, tridecyl, tetradecyl, pentadecyl, hexadecyl, heptadecyl, octadecyl , nonadecyl, isocanyl, cyclopropyl, cyclobutyl, cyclopentyl, cyclohexyl, cycloheptyl, cyclooctyl. As used herein, the term "heterocycloalkyl" means a cycloalkyl group wherein one or more of the carbons of the cyclic ring are substituted with a heteroatom such as oxygen, nitrogen and/or sulfur. Representative heterocycloalkyl groups include, but are not limited to, tetrahydrofuranyl, tetrahydropyranyl, Alkyl and piperidinyl.

於此處使用,用語”芳基”意指包括,但不限於苯基、聯苯基、苯甲基、二甲苯基、萘基、蒽基之芳香基團。於此處使用,用語”雜芳基”意指其中一或多個芳香環之碳被雜原子取代,諸如氧、氮及/或硫之芳基團代表性之雜芳基團係包括但不限於呋喃基、哌喃基以及吡啶基。 As used herein, the term "aryl" is intended to include, but is not limited to, phenyl, biphenyl, benzyl, xylyl, naphthyl, anthracenyl aromatic groups. As used herein, the term "heteroaryl" means that the carbon of one or more of the aromatic rings is replaced by a heteroatom, and the heteroaryl group of the aryl group such as oxygen, nitrogen and/or sulfur includes but not It is limited to furyl, piperanyl and pyridyl.

於此處使用之用語”烷芳基”與芳烷基”係可以相互交換的,且意指線性或分支非環狀經至少一個芳基取代 之烷基,例如,苯基,且具有C1至C25之碳鏈長度之烷基。應更進一步被了解的是上述之非環狀烷基可以是鹵化烷基或全鹵化烷基。 The use of the terms herein, "alkaryl" aryl group "lines may be interchanged, and means a linear or branched non-cyclic with at least one substituent of the aryl group, e.g., phenyl, and having a C 1 to C 25 carbon chain length of the alkyl group it should further be appreciated that the above-described non-cyclic alkyl or halogenated alkyl groups may be perhalogenated alkyl group.

於此處使用,用語”烯基”意指線性或分支非環狀或環狀具有一或更多雙鍵且具有C2至C25之碳鍵長度之烯基的烴基。烯基之非限定實施例包括,除了其他之外,乙烯基、烯丙基、丙烯基、丁烯基、戊烯基、己烯基、庚烯基、辛烯基、壬烯基、癸烯基、十一烯基、十二烯基、十三烯基、十四烯基、十五烯基、十六烯基、十七烯基、十八烯基、十九烯基、二十烯基(isocenyl)。 As used herein, the term "alkenyl" means a hydrocarbon radical which is linear or branched acyclic or cyclic, having one or more double bonds and having an alkenyl group of C 2 to C 25 carbon bond length. Non-limiting examples of alkenyl groups include, among others, vinyl, allyl, propenyl, butenyl, pentenyl, hexenyl, heptenyl, octenyl, nonenyl, decene , undecenyl, dodecenyl, tridecenyl, tetradecenyl, pentadecyl, hexadecenyl, heptadecenyl, octadecyl, pentadecenyl, hexadecene Isocenyl.

於此處使用,用語”炔基”意指線性或分支非環狀或環狀具有一或更多参鍵且具有C2至C25之碳鍵長度之炔基的烴基。代表性之炔基係包括,除了其他之外,乙炔基、1-丙炔基、2-丙炔基、1-丁炔基、2-丁炔基、戊炔基、庚炔基、辛炔基、壬炔基、癸炔基、十一炔基、十二炔基、十三炔基、十四炔基、十五炔基、十六炔基、十七炔基、十八炔基、十九炔基、二十炔基(isocynyl)。 As used herein in the term "alkynyl" means a linear or branched acyclic or cyclic hydrocarbon group having one or more carbon triple bond and having C 2 to C 25 alkynyl group of key length. Representative alkynyl groups include, among others, ethynyl, 1-propynyl, 2-propynyl, 1-butynyl, 2-butynyl, pentynyl, heptynyl, octyne Base, decynyl, decynyl, undecynyl, dodecynyl, tridecynyl, tetradecynyl, pentadecynyl, hexadecenyl, heptadecanyl, octadecynyl, Nineteen alkynyl, isocynyl.

於此處使用,”線性或分支”基團之詳述,諸如線性或分支烷基,應該要被了解的是包括亞甲基,線性基團,諸如線性C2-C25烷基,以及合適之分支基團,諸如分支C3-C25烷基。 As used herein, a reference to a "linear or branched" group, such as a linear or branched alkyl group, should be understood to include methylene, linear groups such as linear C 2 -C 25 alkyl, and suitable the branching groups, such as C 3 -C 25 branched alkyl.

對於化學式A、B及C,每一個X基團之描述將自本頁向後延伸。在化學式A,R5以及R6之每一描述將自本頁向後延伸,且如諸如順式-至相對應以及諸如外-相對於X基團。化學式A因此被認為係聚環狀順-外2,3- 二醇單體。在化學式B,R5以及R6之每一描述將自本頁向後延伸,且如諸如順式-至相對應以及諸如內-相對於X基團。化學式B因此被認為係聚環狀順-內2,3-二醇單體。在化學式C,R5之描述將自本頁向後延伸,外-相對於X基團,R6之描述將自本頁向後延伸,內-相對於X基團,以及反式-相對於相對應。化學式C因此被認為係聚環狀內/外2,3-二醇單體或聚環狀反式2,3-二醇單體。 For Chemical Formulas A, B, and C, the description of each X group will extend back from this page. Each of the descriptions of Chemical Formula A, R 5 and R 6 will extend rearward from this page, and such as, for example, cis- to corresponding and such as exo-relative to the X group. Chemical Formula A is therefore considered to be a polycyclic cis-exo 2,3-diol monomer. Each of the descriptions of Chemical Formula B, R 5 and R 6 will extend rearward from this page, and such as, for example, cis- to corresponding and such as internal-to-X groups. Chemical Formula B is therefore considered to be a polycyclic cis-internal 2,3-diol monomer. In the chemical formula C, the description of R 5 will extend backward from this page, and the outer-relative to the X group, the description of R 6 will extend backward from the page, the inner-relative to the X group, and the trans-relative to the corresponding . Chemical formula C is therefore considered to be a polycyclic inner/outer 2,3-diol monomer or a polycyclic trans 2,3-diol monomer.

對於本發明之進一步具體實施例,對於每一個化學式A、B及C:n係0;R1-R4之三個是氫;以及R1-R4之一係獨立地選自烷基、環烷基、雜烷基、雜環烷基、芳基、雜芳基以及芳烷基,以及其係相對於X為朝外(exo)。為了說明,當n=0,X為-CH2-,每一個R1、R2及R3為氫,R4為相對於X之非氫外基團,以及每一個R5及R6為-CH2OH,化學式A、B及C可以下列化學式A1、B1及C1所表示: For a further embodiment of the invention, for each of the chemical formulas A, B and C: n is 0; three of R 1 - R 4 are hydrogen; and one of R 1 - R 4 is independently selected from alkyl, cycloalkyl, heteroalkyl, heterocycloalkyl, aryl, heteroaryl and aralkyl, and X is a relative system which is towards the outer (exo). To illustrate, when n = 0, X is -CH 2 -, each of R 1 , R 2 and R 3 is hydrogen, R 4 is a non-hydrogen external group with respect to X, and each of R 5 and R 6 is -CH 2 OH, Chemical Formulas A, B and C can be represented by the following chemical formulas A1, B1 and C1:

對於每一個化學式A1、B1及C1:於每一個例子中R4可以選自包括,但不限於,於此處前述之分類與實施例之烴基,例如,參見R1-R4For each of Formulas A1, B1, and C1: R 4 may be selected from, for example, but not limited to, the hydrocarbyl groups of the foregoing classifications and examples herein, for example, see R 1 -R 4 .

其他有用的二醇單體,包括以下列化學式D、E及F所表示之聚環狀二醇單體: Other useful diol monomers include polycyclic diol monomers represented by the following chemical formulas D, E and F:

獨立地,對於每一個進一步地以下列化學式D、E及F所表示之聚環狀二醇單體:m係0、1或2;每一個Z及Z’係獨立地選自-CH2-、-CH2-CH2-以及-O-;Z係-CH-;於每一個例子中R7、R8、R9及R10係獨立地選自氫以及烴基;於每一個例子中R11及R12係獨立地選自-(CH2)p-OH,其中於每一個例子中對於R11及R12,p係獨立地選自0、1、2或3;以及每一個Z’如果存在,則使其分別地朝向與Z或Z之方向相同或相反。 Independently, for each polycyclic diol monomer further represented by the following chemical formulas D, E and F: m system 0, 1 or 2; each Z and Z' system is independently selected from -CH 2 - , -CH 2 -CH 2 - and -O-; Z * is -CH-; in each case R 7 , R 8 , R 9 and R 10 are independently selected from hydrogen and hydrocarbyl; in each case R 11 and R 12 are independently selected from -(CH 2 ) p -OH, wherein in each of the examples, for R 11 and R 12 , the p is independently selected from 0, 1, 2 or 3; and each Z 'If present, they are oriented the same or opposite to the direction of Z or Z * , respectively.

對於化學式D、E及F,每一個Z基團及Z基團之描述將自本頁向後延伸。在化學式D,每一個Z’如果存在,則每一個m具有一獨立地方向,其相對於Z之方向係相同或相反。在化學式E及F,每一個Z’如果存在,則每一個m具有一獨立地方向,其相對於Z之方向係相同或相反。 For Chemical Formulas D, E, and F, the description of each Z group and Z * group will extend back from this page. In Formula D, if each Z' is present, each m has an independent orientation that is the same or opposite to the direction of Z. In Chemical Formulas E and F, if each Z' is present, each m has an independent orientation that is the same or opposite to the direction of Z * .

每一個來自R7-R10之烴基可以獨立地選自包括,但不限於,列舉於此處前述之分類與實施例。對於每一個 化學式D-F,於本發明之具體實施例中,至少一之R7-R10係獨立地選自烷基、環烷基、雜烷基、雜環烷基、芳基、雜芳基以及芳烷基之基團,以及其他R7-R10基團,如果有任何,其並非選自如非氫基團,即係為氫。每一個來自其R7-R10之烷基、環烷基、雜烷基、雜環烷基、芳基、雜芳基以及芳烷基的實施例可以選自包括,但不限於,參照R1-R4之列舉於此處前述之分類與實施例。 Each of the hydrocarbyl groups from R 7 to R 10 may be independently selected from the group consisting of, but not limited to, the foregoing classifications and examples. For each of the formula DF, in a particular embodiment of the invention, at least one R 7 -R 10 is independently selected from the group consisting of alkyl, cycloalkyl, heteroalkyl, heterocycloalkyl, aryl, heteroaryl And a group of an aralkyl group, as well as other R 7 -R 10 groups, if any, are not selected from, for example, a non-hydrogen group, that is, hydrogen. Examples of each of the alkyl, cycloalkyl, heteroalkyl, heterocycloalkyl, aryl, heteroaryl and aralkyl groups from which R 7 -R 10 are derived may be selected from, but not limited to, reference to R 1 - R 4 are listed in the foregoing classifications and examples.

於另一具體實施例中,對於每一個化學式D-F:m係0;R7-R10之三個是氫;以及R7-R10之一係獨立地選自烷基、環烷基、雜烷基、雜環烷基、芳基、雜芳基以及芳烷基,以及其係相對於Z或Z為朝。為了說明,當m=0,Z為-CH2-,每一個R7、R8及R9為氫,R10為非氫外基團,每一個R11及R12對於化學式D為-CH2OH,而對於化學式E及F為-OH,化學式D-F可以下列化學式D1、E1及F1所表示。為了更進一步說明,當m=0,Z為-CH2-,每一個R8、R9及R10為氫,R7為非氫外基團,每一個R11及R12對於化學式D為-CH2OH,而對於化學式E及F為-OH,化學式D-F可以下列化學式D1’、E1’及F1’所表示。應該被了解的是,除非特別指明,於此處所表示之所有化學式係包括其鏡像、及非鏡像類似物。 In another embodiment, for each chemical formula DF: m is 0; three of R 7 - R 10 are hydrogen; and one of R 7 - R 10 is independently selected from alkyl, cycloalkyl, hetero alkyl, heterocycloalkyl, aryl, heteroaryl and arylalkyl, and which system relative to Z or Z * toward the outside. To illustrate, when m=0, Z is -CH 2 -, each of R 7 , R 8 and R 9 is hydrogen, R 10 is a non-hydrogen external group, and each of R 11 and R 12 is -CH for formula D. 2 OH, and for the formulae E and F are -OH, the chemical formula DF can be represented by the following chemical formulas D1, E1 and F1. For further explanation, when m=0, Z is -CH 2 -, each of R 8 , R 9 and R 10 is hydrogen, and R 7 is a non-hydrogen external group, and each of R 11 and R 12 is for chemical formula D. -CH 2 OH, and for the formulae E and F are -OH, the chemical formula DF can be represented by the following chemical formulas D1', E1' and F1'. It should be understood that all chemical formulae expressed herein include mirror images thereof and non-mirrored analogs, unless otherwise specified.

又其他二醇單體包括下列化學式G所表示之聚環狀二醇單體。 Still other diol monomers include polycyclic diol monomers represented by the following chemical formula G.

於化學式G所表示之聚環狀二醇,每一個Z、R11及R12係如前述參照化學式E-F。 The polycyclic diol represented by the chemical formula G, each of Z, R 11 and R 12 is as described above with reference to the chemical formula EF.

另外之二醇單體,包括下列化學式I至XII所表示之環狀二醇單體。 Further diol monomers include the cyclic diol monomers represented by the following Chemical Formulas I to XII.

於化學式X及XI,R13係獨立地選自C1-C6之烷基,諸如但不限於C1-C6線性烷基或C3-C6分之烷基。 In Formulas X and XI, R 13 is independently selected from C 1 -C 6 alkyl such as, but not limited to, C 1 -C 6 linear alkyl or C 3 -C 6 alkyl.

另外選擇性地多元醇單體包括,但不限於,具有兩 個或更多羥基,諸如但不限於2、3或4個羥基,之烴基。選擇性地多元醇單體之實施例包括,但不限於:C1-C25之線性或分支烯基二醇類,諸如1,2-乙烯基二醇、1,3-丙烯基二醇以及1,2-丙烯基二醇;以及聚烯烴基二醇類,諸如雙-、参-、肆-以及更高之乙二醇類,雙-、参-、肆-以及更高之丙二醇類。選擇性地具有多於兩個羥基之多元醇單體通常以小量存在,諸如但不限於,基於羥基官能基單體之總莫耳%,小於10莫耳%、或小於5莫耳%。具有多於兩個羥基之多元醇單體的實施例包括,但不限於,三羥甲丙烷、新戊四醇以及雙-三羥甲丙烷。對於某些具體實施例,聚碳酸酯聚合物並非衍生自具有多於兩個羥基之多元醇單體。 Further optionally, the polyol monomer includes, but is not limited to, a hydrocarbon group having two or more hydroxyl groups such as, but not limited to, 2, 3 or 4 hydroxyl groups. Examples of selectively polyol monomers include, but are not limited to, C 1 -C 25 linear or branched alkenyl glycols such as 1,2-vinyl diol, 1,3-propenyl diol, and 1,2-propenyl glycol; and polyolefin-based glycols such as bis-, gin-, oxime- and higher glycols, bis-, gin-, oxime- and higher propylene glycols. The polyol monomer optionally having more than two hydroxyl groups is typically present in minor amounts such as, but not limited to, based on the total mole % of hydroxyl functional monomer, less than 10 mole percent, or less than 5 mole percent. Examples of polyol monomers having more than two hydroxyl groups include, but are not limited to, trimethylolpropane, neopentyl alcohol, and bis-trimethylolpropane. For certain embodiments, the polycarbonate polymer is not derived from a polyol monomer having more than two hydroxyl groups.

化學式A、B及C所表示之聚環狀2,3-二醇單體可藉由一般技藝方法所製備,諸如以下所示之合成流程圖1至6。 The polycyclic 2,3-diol monomers represented by Chemical Formulas A, B and C can be prepared by a general method, such as the synthetic schemes 1 to 6 shown below.

非以限制為目的之說明:化學式A所表示之聚環狀順-外2,3-二醇單體可依據下列合成流程圖1製備,其中n係0,每一個R1-R4為氫,X係-CH2-,以及每一個R5及R6為-CH2OH。 Non-limiting description: The polycyclic cis-exo 2,3-diol monomer represented by Chemical Formula A can be prepared according to the following Synthesis Scheme 1, wherein n is 0, and each R 1 -R 4 is hydrogen. X-CH 2 -, and each of R 5 and R 6 is -CH 2 OH.

合成流程圖1Synthesis flow chart 1

參照合成流程圖1,內-2,3-降莰烯二羧酸酐(亦可視為內-納迪克酸酐(endo-nadic anhydride))(1a)係曝置於140至210℃之溫度下一段充足的時間,諸如自熔化之後15分鐘至24小時,接著重複再結晶,諸如自乙酸乙酯或甲苯之兩次或更多的再結晶,以利形成外-2,3-降莰烯二羧酸酐(亦可視為外-納迪克酸酐)(1b)。順-外-納迪克酸酐(1b)之氫化作用在氫氣(H2),承載在多孔性碳上之鈀催化劑(Pd/C),以及乙酸乙酯(EtOAc)的存在下,結果產生外-2,3-降莰烷二羧酸酐(1c)。外-2,3-降莰烷二羧酸酐(1c)之還原作用在氫化鋁鋰(LiAlH4)以及乙醚(Et2O)的存在下,結果產生順-外-2,3-降莰烷二甲醇(A2)。 Referring to the synthesis scheme 1, endo-2,3-northene dicarboxylic anhydride (which may also be regarded as endo- nadic anhydride) (1a) is exposed to a temperature of 140 to 210 ° C for a sufficient period of time. Time, such as from 15 minutes to 24 hours after melting, followed by repeated recrystallization, such as two or more recrystallizations from ethyl acetate or toluene to form exo-2,3-nordecene dicarboxylic anhydride (Also considered as exo-nadic anhydride) (1b). Hydrogenation of cis-exo-nadic anhydride (1b) in the presence of hydrogen (H 2 ), a palladium catalyst supported on porous carbon (Pd/C), and ethyl acetate (EtOAc) results in an external 2,3-norbornane dicarboxylic anhydride (1c). Reduction of exo-2,3-norbornane dicarboxylic anhydride (1c) in the presence of lithium aluminum hydride (LiAlH 4 ) and diethyl ether (Et 2 O), resulting in cis-exo-2,3-norbornane Dimethanol (A2).

非以限制為目的之說明:化學式B所表示之聚環狀 順-內2,3-二醇單體可依據下列合成流程圖2製備,其中n係0,每一個R1-R4為氫,X係-CH2-,以及每一個R5及R6為-CH2OH。 Non-limiting description: Polycyclic cis-endo-2,3-diol monomer represented by Chemical Formula B can be prepared according to the following Synthesis Scheme 2, wherein n is 0, and each R 1 -R 4 is hydrogen. X-CH 2 -, and each of R 5 and R 6 is -CH 2 OH.

參照合成流程圖2,順-內-2,3-降莰烯二羧酸酐(亦可視為內-納迪克酸酐)(1a)係在氫氣(H2),承載在多孔性碳上之鈀催化劑(Pd/C),以及乙酸乙酯(EtOAc)的存在下氫化,結果產生內-2,3-降莰烷二羧酸酐(2a)。內-2,3-降莰烷二羧酸酐(2a)之還原作用在氫化鋁鋰(LiAlH4)以及乙醚(Et2O)的存在下,結果產生順-內-2,3-降莰烷二甲醇(B2)。 Referring to the synthesis scheme 2, cis-endo-2,3-nordecene dicarboxylic anhydride (which may also be regarded as endo-nadic anhydride) (1a) is hydrogen (H 2 ), a palladium catalyst supported on porous carbon. Hydrogenation in the presence of (Pd/C), and ethyl acetate (EtOAc) afforded the product <RTI ID=0.0>> Reduction of endo-2,3-norbornane dicarboxylic anhydride (2a) in the presence of lithium aluminum hydride (LiAlH 4 ) and diethyl ether (Et 2 O), resulting in cis-endo-2,3-norbornane Dimethanol (B2).

化學式C所表示之聚環狀內-外-2,3-二醇單體可依據下列合成流程圖3製備,其為非以限制為目的之說明,其中n係0,每一個R1-R4為氫,X係-CH2-,以及每一個R5及R6為-CH2OH。 The polycyclic internal-external-2,3-diol monomer represented by Chemical Formula C can be prepared according to the following Synthesis Scheme 3, which is not intended to be a limitation, wherein n is 0, and each R 1 -R 4 is hydrogen, X is -CH 2 -, and each of R 5 and R 6 is -CH 2 OH.

參照合成流程圖3,將環戊二烯(3a)以及反丁烯二酸二乙酯(3b)藉由狄-阿反應於低溫下一起進行反應,諸如0℃,以形成內-外-2,3-降莰烯雙(乙基碳酸酯)(3c)。內-外-2,3-降莰烯雙(乙基碳酸酯)(3c)之氫化作用在氫氣(H2),承載在多孔性碳上之鈀催化劑(Pd/C),以及乙酸乙酯(EtOAc)的存在下,結果產生內-外-2,3-降莰烷雙(乙基碳酸酯)(3d)。內-外-2,3-降莰烷雙(乙基碳酸酯)(3d)之還原作用在氫化鋁鋰(LiAlH4)以及乙醚(Et2O)的存在下,結 果產生外-內-2,3-降莰烷二甲醇(C2)。 Referring to the synthesis scheme 3, cyclopentadiene (3a) and diethyl fumarate (3b) are reacted together at a low temperature by a Di-A reaction, such as 0 ° C, to form an inner-outer-2 , 3-northene bis(ethyl carbonate) (3c). Hydrogenation of endo-exo-2,3-northene bis(ethyl carbonate) (3c) in hydrogen (H 2 ), palladium catalyst (Pd/C) supported on porous carbon, and ethyl acetate In the presence of (EtOAc), the result is an internal-exo-2,3-norbornane bis(ethyl carbonate) (3d). Reduction of endo-exo-2,3-norbornane bis(ethyl carbonate) (3d) in the presence of lithium aluminum hydride (LiAlH 4 ) and diethyl ether (Et 2 O), resulting in exo-endo-2 , 3-norbornane dimethanol (C2).

化學式A所表示之聚環狀順-外-2,3-二醇單體可依據下列合成流程圖4製備,其為非以限制為目的之說明,其中n係0,每一個R1-R4為氫,X係-CH2-,以及R5為-OH及R6為-CH2OH。 The polycyclic cis-exo-2,3-diol monomer represented by Chemical Formula A can be prepared according to the following Synthesis Scheme 4, which is not intended to be a limitation, wherein n is 0, and each R 1 -R 4 is hydrogen, X is -CH 2 -, and R 5 is -OH and R 6 is -CH 2 OH.

參照合成流程圖4,六氫-4H-5,8-伸甲基苯并[d]-外-[1,3]二烷(4a)在乙酐(Ac2O)與具催化量之硫酸(H2SO4)的存在下,轉化為順-外-(3-乙醯氧基降莰-2-基)乙酸甲酯(4b)與順-外-((3-乙醯氧基降莰-2-基)甲氧基)乙酸甲酯(4c)。中間產物(4b)與(4c)在水與具催化量之氫氧化鈉(NaOH)之存在下,轉化為順-外-3-(羥甲基)降莰烷-2-基(A3)。 Referring to the synthesis scheme 4, hexahydro-4H-5,8-extended methylbenzo[d]-exo-[1,3] The alkane (4a) is converted to cis-exo-(3-acetoxynorridin-2-yl)acetate in the presence of acetic anhydride (Ac 2 O) and a catalytic amount of sulfuric acid (H 2 SO 4 ). Ester (4b) and cis-exo-((3-acetoxyoxin-2-yl)methoxy)acetic acid methyl ester (4c). The intermediates (4b) and (4c) are converted to cis-exo-3-(hydroxymethyl)nordecan-2-yl (A3) in the presence of water and a catalytic amount of sodium hydroxide (NaOH).

化學式B所表示之聚環狀順-內-2,3-二醇單體可依據下列合成流程圖5製備,其為非以限制為目的之說 明,其中n係0,每一個R1-R4為氫,X係-CH2-,以及R5為-OH及R6為-CH2OH。 The polycyclic cis-endo-2,3-diol monomer represented by Chemical Formula B can be prepared according to the following Synthesis Scheme 5, which is not intended to be a limitation, wherein n is 0, and each R 1 -R 4 is hydrogen, X is -CH 2 -, and R 5 is -OH and R 6 is -CH 2 OH.

參照合成流程圖5,六氫-4H-5,8-伸甲基苯并[d]-內-[1,3]二烷(5a)在乙酐(Ac2O)與具催化量之硫酸(H2SO4)的存在下,轉化為順-內-(3-乙醯氧基降莰-2-基)乙酸甲酯(5b)與順-內-((3-乙醯氧基降莰-2-基)甲氧基)乙酸甲酯(5c)。中間產物(5b)與(5c)在水與具催化量之氫氧化鈉(NaOH)之存在下,轉化為順-內-3-(羥甲基)降莰烷-2-基(R3)。 Referring to the synthesis scheme 5, hexahydro-4H-5,8-methylbenzo[d]-endo-[1,3] The alkane (5a) is converted to cis-endo-(3-acetoxyoxen-2-yl)acetate in the presence of acetic anhydride (Ac 2 O) and a catalytic amount of sulfuric acid (H 2 SO 4 ) Ester (5b) and methyl cis-endo-((3-ethyloximeoxypurin-2-yl)methoxy)acetate (5c). The intermediates (5b) and (5c) are converted to cis-endo-3-(hydroxymethyl)nordecan-2-yl (R3) in the presence of water and a catalytic amount of sodium hydroxide (NaOH).

化學D、E、F及G所表示之選擇性聚環狀二醇可依據一般技藝方式製備。非以限制為目的之說明:化學式F所表示之選擇性聚環狀二醇可依據下列合成流程圖6製備,其為非以限制為目的之說明,其中m係0,每一 個R7-R10為氫,Z係-CH2-,以及R11為-OH及R12為-CH2OH。 The selective polycyclic diols represented by Chemical D, E, F and G can be prepared according to the general art. Non-limiting description: The selective polycyclic diol represented by Chemical Formula F can be prepared according to the following Synthesis Scheme 6, which is not intended to be a limitation, wherein m is 0, and each R 7 -R 10 is hydrogen, Z is -CH 2 -, and R 11 is -OH and R 12 is -CH 2 OH.

參照合成流程圖6,2,3-降莰烯(6a)在甲酸(HCOOH)、硫酸(H2SO4)與甲醛(H2CO)的存在下,轉化為(2-(甲醯氧基)降莰-7-基)-外-甲酸甲酯(6b)。中間產物(6b)在氫氧化鈉(NaOH)與甲醇(MeOH)之存在下,轉化為順-內-7-(羥甲基)降莰-2-外-醇(F1)。 Referring to the synthesis scheme 6, 2,3-northene (6a) is converted to (2-(methyloxy) in the presence of formic acid (HCOOH), sulfuric acid (H 2 SO 4 ) and formaldehyde (H 2 CO). ) 莰-7-yl)-exo-methyl formate (6b). The intermediate product (6b) is converted to cis-endo-7-(hydroxymethyl)norborn-2-exo-alcohol (F1) in the presence of sodium hydroxide (NaOH) and methanol (MeOH).

依據本發明之聚碳酸酯聚合物之具體實施例可藉由一般技藝方式製備,其包括,但不限於,聚合物方法實施例1-12,以及可選自同元聚合物,諸如含有衍生自任 一化學式A至G及/或I至XV或無規共聚物、或嵌段共聚物、或交替共聚物,其於此處係選擇地視為無規共聚物、嵌段共聚物以及交替共聚物,之重複單元的單一類型之同元聚合物。依據本發明之無規、嵌段及交替聚碳酸酯共聚合物具體實施例可以包括衍生自至少一個化學式A至G以及視情形至少一個化學式I至XV之重複單元之兩個或更多類型。 Specific examples of polycarbonate polymers in accordance with the present invention can be prepared by conventional techniques including, but not limited to, polymer method embodiments 1-12, and can be selected from homopolymers, such as containing derivatives. a chemical formula A to G and/or I to XV or a random copolymer, or a block copolymer, or an alternating copolymer, which is selectively considered herein as a random copolymer, a block copolymer, and an alternating copolymer , a single type of homopolymer of repeating units. Particular embodiments of the random, block and alternating polycarbonate copolymers according to the present invention may comprise two or more types derived from at least one chemical formula A to G and optionally at least one repeating unit of formulas I to XV.

如前述之一些聚碳酸酯聚合物之具體實施例可以包含衍生自選自每一個化學式A至G或選自任一個或任兩個如此之化學式的聚環狀2,3-二醇類之重複單元。 Particular embodiments of some polycarbonate polymers as described above may comprise repeating units derived from polycyclic 2,3-diols selected from each of Formulas A to G or selected from any one or both of such chemical formulas. .

當如此聚碳酸酯聚合物之具體實施例包含衍生自兩個聚環狀2,3-二醇單體其係,例如,由化學式A、化學式B及化學式C所表示或選自於其中,之重複單元,該等重複單元之莫耳百分比例可以自1至99、自10至90、自30至70、或編入任何此列舉比例之任何其他次比例,此提供之該等重複單元總合係100莫耳百分比。 Specific examples of such polycarbonate polymers include those derived from two polycyclic 2,3-diol monomers, for example, represented by or selected from Chemical Formula A, Chemical Formula B, and Chemical Formula C, Repeating units, the percentage of moles of such repeating units may be from 1 to 99, from 10 to 90, from 30 to 70, or any other sub-ratio of any of the listed ratios, which provides the total unit of the repeating units 100 mole percentage.

本發明之一些聚碳酸酯聚合物之具體實施例包含例如,由化學式A、化學式B及化學式C所表示或選自於其中之一,之單體,該等具體實施例可以被了解其包含之莫耳百分比,其中任何單一莫耳百分比係1,任何單一莫耳百分比係98,亦及其編入之任何其他次比例。沒有任何限制,此莫耳百分比例包括1至1至98、10至10至80、33.33至33.33至33.33,此提供之該等重複單元總合係100莫耳百分比。 Specific examples of some of the polycarbonate polymers of the present invention include, for example, a monomer represented by or selected from the chemical formula A, formula B, and formula C, and the specific embodiments can be understood to include The percentage of moles, where any single mole percentage is 1, any single mole percentage is 98, and any other minor proportions thereof. Without any limitation, this percentage of moles includes from 1 to 1 to 98, from 10 to 10 to 80, from 33.33 to 33.33 to 33.33, and the total number of such repeat units provided is 100 mole percent.

對於依據本發明之一些聚碳酸酯聚合物之具體實施 例,化學式A至G之每一個R5及R6可獨立地選自-(CH2)pOH,其中p係0、1、2或3。當對於其他如此具體實施例時,對於至少R5及R6之一,p係獨立地為1、2或3,例如其p為1時提供-CH2OH。於又另如此具體實施例中,對於每一個R5及R6,p係獨立地為1、2或3。 For specific embodiments of some of the polycarbonate polymers according to the present invention, each of R 5 and R 6 of Formulas A through G can be independently selected from -(CH 2 ) p OH, wherein p is 0, 1, 2 or 3. For other such embodiments, for at least one of R 5 and R 6 , the p-system is independently 1, 2 or 3, for example, when p is 1, -CH 2 OH is provided. In still another specific embodiment, for each of R 5 and R 6 , the p-system is independently 1, 2 or 3.

於下述所提供之實施例中,對於依據本發明具有化學式之聚合物組成物提供一般程序。如此聚合物組成物具體實施例,於此處選擇性地被視為TFU聚合物組成物,包含聚合物之具體實施例,載體溶劑以及助熔劑,例如,甲酸(FA)。其應該被了解的是每一個所提及之TFU聚合物組成物實際上係已經被製造且已產生數份評估報告,發明人相信這提供了該等一般程序足以操作示範依據本發明之具體實施例可以確實據以實施,並且對於提供於其組件置於基板上之期間以及之後固定微電子元件,亦及充分的助熔活性以提供優異之焊接上為有用的。 In the examples provided below, a general procedure is provided for polymer compositions of the formula according to the invention. Specific examples of such polymer compositions are here selectively considered to be TFU polymer compositions, including specific examples of polymers, carrier solvents, and fluxes such as formic acid (FA). It should be understood that each of the TFU polymer compositions mentioned has actually been manufactured and several evaluation reports have been generated, and the inventors believe that this provides a general procedure sufficient to operate the demonstration in accordance with the specific implementation of the present invention. The examples can be implemented as such, and are useful for providing microelectronic components during and after their components are placed on the substrate, as well as sufficient fluxing activity to provide superior soldering.

於此處使用,”助熔劑”應該要被了解的為意指化學清潔劑,其藉由移除金屬被鍵接之氧化作用以促進焊接。助熔劑可包含,但不限於,酸性、中性、或鹼性組成物。助熔劑之例示具體實施例包括,但不限於甲醛、甲酸、2-硝苯甲酸、丙二酸、檸檬酸、蘋果酸及琥珀酸。其他例示助熔劑包括草酸、己二酸、戊二酸、庚二酸、辛二酸、壬二酸、癸二酸、順丁烯二酸、酒石酸、乳酸、杏仁酸、甘油酸、戊酸、己酸、苯乙酸、苯甲酸、水楊酸及胺苯甲酸。為了簡便地比對及了解,甲酸(FA)於以下實施例中係作為助熔劑使用,如此實施例示範操作FA 藉由所呈現之焊料回焊數據提供優異之助熔。另外,提供儲存穩定性數據以示範操作於高溫下本發明之聚合物公式化具體實施例之儲存,在FA或其他通常可使用之助熔劑的存在下,並不會指出任何明顯的於如此具體實施例中聚合物之Mw變化(參照下述之表5及表6)。 As used herein, "flux" is understood to mean a chemical cleaner that promotes soldering by removing the oxidation of the metal by bonding. Flux may include, but is not limited to, an acidic, neutral, or basic composition. Illustrative examples of fluxes include, but are not limited to, formaldehyde, formic acid, 2-nitrobenzoic acid, malonic acid, citric acid, malic acid, and succinic acid. Other exemplary fluxes include oxalic acid, adipic acid, glutaric acid, pimelic acid, suberic acid, azelaic acid, sebacic acid, maleic acid, tartaric acid, lactic acid, mandelic acid, glyceric acid, valeric acid, Caproic acid, phenylacetic acid, benzoic acid, salicylic acid and amine benzoic acid. For ease of comparison and understanding, formic acid (FA) is used as a fluxing agent in the following examples, and the exemplary operation FA of such an embodiment provides excellent fluxing by the solder reflow data presented. In addition, storage stability data is provided to demonstrate storage of the polymer formulation specific embodiments of the present invention at elevated temperatures, in the presence of FA or other commonly used fluxes, and does not indicate any significant implementation. The M w change of the polymer in the examples (see Tables 5 and 6 below).

於此處使用,”載體溶劑”應該要被了解的為意指用於形成依據本發明之選定聚合物具體實施例之溶液以及選定之助熔劑因而形成本發明之聚合物組成物具體實施例之溶劑。應更進一步地了解的是如此載體溶劑實質上不與選定聚合物具體實施例以及選定助熔劑反應。所以可以這麼說如此聚合物組成物具體實施例會展現期望之儲存穩定性,也提供期望之膠黏、助熔以及底層填料。例示載體溶劑包括,但不限於,環己酮、環戊酮、二甘醇二甲醚、γ-丁內酯(GBL)、N,N-二甲基乙醯胺、N,N-二甲基甲醯胺、苯甲醚、3-甲氧基丙酸甲酯、四氫呋喃及其混合物。 As used herein, "carrier solvent" shall be taken to mean a solution for forming a selected embodiment of a polymer according to the present invention, and a selected flux to form a polymer composition of the present invention. Solvent. It will be further appreciated that the carrier solvent is such that it does not substantially react with the selected polymer embodiment and the selected flux. It can therefore be said that such polymer composition embodiments will exhibit the desired storage stability and also provide the desired adhesion, fluxing and underfill. Exemplary carrier solvents include, but are not limited to, cyclohexanone, cyclopentanone, diglyme, γ-butyrolactone (GBL), N,N-dimethylacetamide, N,N-dimethyl Carbenamide, anisole, methyl 3-methoxypropionate, tetrahydrofuran, and mixtures thereof.

進一步地,當下述所呈現之焊料回焊數據使用錫-銅共熔焊球(Sn99.3Cu0.7)而獲得,其他類型之焊料,特別係指不含鉛之焊料,諸如SAC305(購自M.G.化學品之Sn96.5Ag5Cu0.5)或K100以及K100LD(分別為購自Kester公司之Sn99.4Cu0.6以及Sn99.5Cu0.5),需經任何特定之配方校正或不需亦可有效地被使用。又更進一步地,應該被瞭解的是發明人經由下述提供之實施例示範操作其不具單一有效之TFU聚合物組成物,但寧可聚合物具體實施例,載體溶劑以及助熔劑之許多配方可以 被製作為適用於大範圍之微電子元件組件。也就是說,依據本發明之聚合物組成物具體實施例可以迅速地對應於分解溫度,黏著性,Mw以及助熔活性而變得合適以對於大範圍之組裝過程提供優異之溶液。 Further, when the solder reflow data presented below is obtained using tin-copper eutectic solder balls (Sn99.3Cu0.7), other types of solders, especially lead-free solders, such as SAC305 (purchased from MG) Chemicals of Sn96.5Ag5Cu0.5) or K100 and K100LD (Sn99.4Cu0.6 and Sn99.5Cu0.5, respectively, available from Kester), need to be calibrated with or without any specific formulation. . Still further, it is to be understood that the inventors have exemplified the operation of the TFU polymer composition which does not have a single effective effect by the examples provided below, but rather the polymer specific embodiment, the carrier solvent and many formulations of the flux can be Made to work with a wide range of microelectronic component assemblies. That is, the polymer composition according to the present invention can be quickly adapted to the decomposition temperature, adhesion, Mw, and fluxing activity to provide an excellent solution for a wide range of assembly processes.

綜上所述,本發明之聚合物組成物具體實施例,具有作為助熔劑使用之甲酸(FA)係被製備且被評估以示範操作其助熔活性之範圍。請參見表3,可以觀察到實施例C1-C3,示範焊料延展或回焊,例如延展之焊料的直徑為約1.6倍之控制組樣本,C4,所示之原始焊球的直徑。當FA僅為使用於前述回焊實施例之助熔劑時,應該被瞭解的是其他助熔劑,諸如前述所提及之助熔劑,亦係落於本發明之TFU聚合物組成物具體實施例之範圍。進一步地,當焊料助熔實施例C1-C3應用於實施例B1-B3之化學式的注射器應用中,對於應用該配方之任何其他合適之方法可以被使用。因此,除了注射器應用外,例示應用方法包括,除了其他之外,旋轉塗布,噴塗,浸塗以及刮刀塗法。 In summary, a specific embodiment of the polymer composition of the present invention having a formic acid (FA) system used as a flux is prepared and evaluated to demonstrate the range of its fluxing activity. Referring to Table 3, Examples C1-C3 can be observed to demonstrate solder extension or reflow, such as a controlled solder sample having a diameter of about 1.6 times the extended solder sample, C4, the diameter of the original solder ball shown. When the FA is only a flux used in the foregoing reflow embodiment, it should be understood that other fluxes, such as the aforementioned fluxes, also fall within the specific embodiment of the TFU polymer composition of the present invention. range. Further, when solder fluxing embodiments C1-C3 are applied to the syringe application of the chemical formula of Examples B1-B3, any other suitable method for applying the formulation can be used. Thus, in addition to syringe applications, exemplary application methods include, among other things, spin coating, spray coating, dip coating, and knife coating.

於如下所示之實施例與表中,數個商標名稱及/或縮寫係被使用為分辨本發明之聚合物組成物具體實施例之成分。當在多數例子中,如此實施例亦提供此成分之全名,一些成分之化學名稱於實施例中可能不會完整被呈現。 In the examples and tables shown below, several trade names and/or abbreviations are used to distinguish the ingredients of the specific embodiments of the polymer compositions of the present invention. In most instances, such embodiments also provide the full name of the ingredient, and the chemical names of some of the ingredients may not be fully presented in the examples.

實施例Example A.合成聚合物A. Synthetic polymer 實施例1之聚合作用:順-外-2,3-降莰烷二甲醇及順 -內-2,3-降莰烷二甲醇 Polymerization of Example 1: cis-exo-2,3-norbornane dimethanol and cis-endo-2,3-norbornane dimethanol

將22.5公克之順-外-2,3-降莰烷二甲醇(144mmol),15公克之順-內-2,3-降莰烷二甲醇(96mmol),51.3公克之碳酸二苯酯(240mmol),以及12毫克之氫化鋰(1.5mmol)加入合適尺寸及裝備之多頸反應容器中。容器中之內容物被加熱至且維持在120℃下,於氮氣環境下維持一段時間至足以形成反應溶液以及接著維持此溫度兩小時。於氮氣下,持續穩定攪拌。接著等溫地降低反應容器之壓力至10kPa且持續地攪拌又另一個小時。進一步地等溫地降低容器之壓力至0.5kPa,且攪拌又另一個1.5小時,接著增加反應溶液溫度至180℃且維持該溫度及攪拌又另1.5個小時。冷卻反應容器之內容物至室溫,加入四氫呋喃(800mL)並攪拌,以及過濾最終溶液。過濾液接著被逐滴地加入8升之9:1的甲醇:水溶液,會產生沉澱即所期望之聚合物。經分離該沉澱以及以另外4升之9:1的甲醇:水溶液清洗該沉澱之後,獲得經乾燥之聚合物為一定數重量30.7公克之聚合物。該聚合物產率為70%,其分子量(Mw)為41,000,且多分散性指數(PDI)為1.70。 22.5 g of cis-exo-2,3-norbornane dimethanol (144 mmol), 15 g of cis-endo-2,3-norbornane dimethanol (96 mmol), 51.3 g of diphenyl carbonate (240 mmol) And 12 mg of lithium hydride (1.5 mmol) were added to a multi-necked reaction vessel of suitable size and equipment. The contents of the vessel were heated to and maintained at 120 ° C, maintained under nitrogen for a period of time sufficient to form a reaction solution and then maintained at this temperature for two hours. Stable stirring was continued under nitrogen. The pressure in the reaction vessel was then isothermally lowered to 10 kPa and stirring was continued for another hour. The pressure of the vessel was further isothermally lowered to 0.5 kPa, and the stirring was again for another 1.5 hours, then the temperature of the reaction solution was increased to 180 ° C and the temperature was maintained and stirred for another 1.5 hours. The contents of the reaction vessel were cooled to room temperature, tetrahydrofuran (800 mL) was added and stirred, and the final solution was filtered. The filtrate was then added dropwise to 8 liters of a 9:1 methanol:water solution, which gave rise to the desired polymer. After separating the precipitate and washing the precipitate with an additional 4 liters of a 9:1 methanol:water solution, a polymer having a dry weight of 30.7 g of a certain weight was obtained. The polymer yield was 70%, its molecular weight ( Mw ) was 41,000, and the polydispersity index (PDI) was 1.70.

實施例2之聚合作用:1,3-環己二醇及順-外-2,3-降莰烷二甲醇 Polymerization of Example 2: 1,3-cyclohexanediol and cis-exo-2,3-norbornane dimethanol

使用實施例1中之程序除了將20.5公克之1,3-環己二醇(176mmols(TCI美國,波特蘭,俄勒岡州));15.5公克之順-外-2,3-降莰烷二甲醇(99mmols);56.6公克之碳酸二苯酯(264mmols),以及13.2毫克之氫化鋰(1.7mmols) 填入反應容器中。獲得28.1公克之聚合物其產率為69%。該聚合物之Mw為47,000,以及PDI為1.75。 Using the procedure in Example 1, except 20.5 grams of 1,3-cyclohexanediol (176 mmols (TCI, Portland, OR)); 15.5 grams of cis-exo-2,3-norbornane II Methanol (99 mmols); 56.6 g of diphenyl carbonate (264 mmols), and 13.2 mg of lithium hydride (1.7 mmols) were charged to the reaction vessel. The yield of 28.1 grams of polymer was 69%. The polymer had a Mw of 47,000 and a PDI of 1.75.

實施例3之聚合作用:1,3-環己二醇及順-內-2,3-降莰烷二甲醇 Polymerization of Example 3: 1,3-cyclohexanediol and cis-endo-2,3-norbornane dimethanol

使用實施例1中之程序除了將19.2公克之1,3-環己二醇(165mmols,TCI美國);14.5公克之順-內-2,3-降莰烷二甲醇(93mmol);53公克之碳酸二苯酯(248mmol),以及10.1毫克之氫化鋰(1.3mmol)填入反應容器中。獲得28.7公克之聚合物其產率為76%。該聚合物之Mw為38,000,以及PDI為1.61。 Using the procedure in Example 1, except 19.2 grams of 1,3-cyclohexanediol (165 mmols, TCI USA); 14.5 grams of cis-endo-2,3-norbornane dimethanol (93 mmol); 53 grams Diphenyl carbonate (248 mmol) and 10.1 mg of lithium hydride (1.3 mmol) were charged into a reaction vessel. A polymer of 28.7 grams was obtained with a yield of 76%. The polymer had a Mw of 38,000 and a PDI of 1.61.

自聚合作用實施例1-3所獲得之聚碳酸酯之特性總和於下方之表1及表2中。於表2中,”終端苯基”係基於填入碳酸二苯酯原料之最初量且於聚合作用期間未經移除,指出苯酚之理論值之鏈-終端苯基百分莫耳值;”莫耳%”提供如所指之藉由1H NMR分析所測定之值,其指出於衍生自順-外-或順-內-2,3-降莰烷二甲醇單體之聚合物中的單體單元百分比;以及該管柱”可溶性”係關於聚合物之目標樹脂內容物(RC,20wt%)為可溶或不可溶於所指定溶劑之品質上的代表,其中”A”視為苯甲醚以及”G”視為γ-丁內酯。 The sum of the properties of the polycarbonates obtained from the polymerization examples 1-3 are summarized in Tables 1 and 2 below. In Table 2, the "terminal phenyl group" is based on the initial amount of the diphenyl carbonate feedstock and is not removed during the polymerization, indicating the chain-terminal phenyl percent molar value of the theoretical value of phenol;""Mole%" provides the value as determined by 1 H NMR analysis as indicated in the polymer derived from cis-exo- or cis-endo-2,3-norbornane dimethanol monomer. Percentage of monomer units; and the column "soluble" is representative of the target resin content of the polymer (RC, 20 wt%) being soluble or insoluble in the quality of the specified solvent, where "A" is considered to be benzene Methyl ether and "G" are regarded as γ-butyrolactone.

實施例4之聚合作用:順-外-2,3-降莰烷二甲醇同元聚合物 Polymerization of Example 4: cis-exo-2,3-norbornane dimethanol terpolymer

使用實施例1中之程序除了將25.0公克(160mmol)之順-外-2,3-降莰烷二甲醇以及34.3公克(185mmol)之碳酸二苯酯以及6.4毫克(0.80mmol)之氫化鋰填入反應容器中。經過最初聚合物沉澱之後,將材料再溶解在四氫呋喃中並且再次沉澱至純甲醇中。經動力真空爐過濾以及乾燥之後,獲得23.5公克之白色聚合物。聚合物特性總結如下:Mw=72,000,PDI=3.0,Tg=85℃,Td50=313℃。 Using the procedure of Example 1, except 25.0 g (160 mmol) of cis-exo-2,3-norbornane dimethanol and 34.3 g (185 mmol) of diphenyl carbonate and 6.4 mg (0.80 mmol) of lithium hydride were used. Into the reaction vessel. After initial polymer precipitation, the material was redissolved in tetrahydrofuran and precipitated again into pure methanol. After filtration through a power vacuum oven and drying, 23.5 g of a white polymer was obtained. The polymer properties are summarized as follows: M w = 72,000, PDI = 3.0, T g = 85 ° C, T d50 = 313 ° C.

實施例5之聚合作用:5-外-苯基-順-內-2,3-降莰烷二甲醇同元聚合物 Polymerization of Example 5: 5-Exo-phenyl-cis-endo-2,3-norbornane dimethanol homopolymer

使用實施例1中之程序除了將25.0公克(108mmol)之5-外-苯基-順-內-2,3-降莰烷二甲醇以及23.1公克(108mmol)之碳酸二苯酯以及58.0毫克(0.55mmol)之碳酸鈉填入反應容器中。溶解在四氫呋喃中之聚合物溶液係於沉澱期間逐滴地加入純甲醇中。經動力真空爐過濾以及乾燥之後,獲得19.6公克之白色聚合物。聚合物特 性總結如下:Mw=63,000,PDI=2.0,Tg=114℃,Td50=321℃。 Using the procedure in Example 1 except 25.0 g (108 mmol) of 5-exo-phenyl-cis-endo-2,3-norbornane dimethanol and 23.1 g (108 mmol) of diphenyl carbonate and 58.0 mg ( 0.55 mmol) of sodium carbonate was charged into the reaction vessel. The polymer solution dissolved in tetrahydrofuran was added dropwise to the pure methanol during the precipitation. After filtration through a power vacuum oven and drying, 19.6 g of a white polymer was obtained. The polymer properties are summarized as follows: M w = 63,000, PDI = 2.0, T g = 114 ° C, T d50 = 321 ° C.

實施例6之聚合作用:5-外-苯基-順-外-2,3-降莰烷二甲醇同元聚合物 Polymerization of Example 6: 5-Exo-phenyl-cis-exo-2,3-norbornane dimethanol homopolymer

使用實施例1中之程序除了將10.0公克(43mmol)之5-外-苯基-順-外-2,3-降莰烷二甲醇以及9.2公克(43mmol)之碳酸二苯酯以及1.7毫克(0.22mmol)之氫化鋰填入反應容器中。溶解在二氯甲烷及四氫呋喃之混合物中之聚合物溶液係於沉澱期間逐滴地加入純甲醇中。經動力真空爐過濾以及乾燥之後,獲得9.1公克之白色聚合物。聚合物特性總結如下:Mw=49,000,PDI=2.0,Tg=115℃,Td50=284℃。 Using the procedure of Example 1, except 10.0 g (43 mmol) of 5-exo-phenyl-cis-exo-2,3-norbornane dimethanol and 9.2 g (43 mmol) of diphenyl carbonate and 1.7 mg ( 0.22 mmol) of lithium hydride was charged into the reaction vessel. The polymer solution dissolved in a mixture of dichloromethane and tetrahydrofuran was added dropwise to the pure methanol during the precipitation. After filtration through a power vacuum oven and drying, 9.1 g of a white polymer was obtained. The polymer properties are summarized as follows: M w = 49,000, PDI = 2.0, T g = 115 ° C, T d50 = 284 °C.

實施例7之聚合作用:反-2,3-降莰烷二甲醇同元聚合物 Polymerization of Example 7: trans-2,3-norbornane dimethanol homopolymer

使用實施例1中之程序除了將70.0公克(448mmol)之反-2,3-降莰烷二甲醇以及96.5公克(450mmol)之碳酸二苯酯以及238毫克(2.24mmol)之碳酸鈉填入反應容器中。溶解在四氫呋喃中之聚合物溶液係於沉澱期間逐滴地加入純甲醇中。經動力真空爐過濾以及乾燥之後,獲得75.4公克之白色聚合物。聚合物特性總結如下:Mw=177,000,PDI=2.1,Tg=81℃,Td50=360℃。 Using the procedure of Example 1, except that 70.0 grams (448 mmol) of trans-2,3-norbornane dimethanol and 96.5 grams (450 mmol) of diphenyl carbonate and 238 mg (2.24 mmol) of sodium carbonate were charged. In the container. The polymer solution dissolved in tetrahydrofuran was added dropwise to the pure methanol during the precipitation. After filtration through a power vacuum oven and drying, 75.4 g of a white polymer was obtained. The polymer properties are summarized as follows: M w = 177,000, PDI = 2.1, T g = 81 ° C, T d50 = 360 °C.

實施例8之聚合作用:異山梨糖醇同元聚合物 Polymerization of Example 8: isosorbide homopolymer

使用實施例1中之程序除了將102.3公克之異山梨糖醇(0.7mol,Cargill公司,明尼阿波利斯,明尼蘇達州);149.95公克之碳酸二苯酯(0.7mol);以及3.0毫克 之碳酸銫(0.01mmol)填入反應容器中。粗抽聚合物溶解於γ-丁內酯(GBL)中。在沉澱於7:3之異丙醇:水中,過濾以及中空乾燥之後,獲得約119公克之聚(異山梨糖醇)同元聚合物。聚合物特性總結如下:Mw=38,500,PDI=2.61,Tg=167℃,Td50=376℃。 Using the procedure of Example 1, except 102.3 grams of isosorbide (0.7 mol, Cargill Corporation, Minneapolis, Minnesota); 149.95 grams of diphenyl carbonate (0.7 mol); and 3.0 mg of carbonic acid铯 (0.01 mmol) was charged into the reaction vessel. The crude polymer was dissolved in γ-butyrolactone (GBL). After precipitation in 7:3 isopropanol: water, filtration and hollow drying, about 119 g of poly(isosorbitol) isomer was obtained. The polymer properties are summarized as follows: M w = 38,500, PDI = 2.61, T g = 167 ° C, T d50 = 376 ° C.

實施例9之聚合作用:異山梨糖醇及反-2,3-降莰烷二甲醇 Polymerization of Example 9: isosorbide and trans-2,3-norbornane dimethanol

下述物將加入至裝備有合適尺寸之磁性攪拌子的250mL圓形燒瓶中:13.17公克之異山梨糖醇(90mmol,Cargill公司),14.09公克之反-2,3-降莰烷二甲醇(90mmol),38.63公克之碳酸二苯酯(180mmol),以及95.6毫克之碳酸鈉(9.0mmol)。將燒瓶排氣至1.3kPa並再填入氮氣三次。當燒瓶浸入在120℃油浴中,內容物維持在氮氣環境下。反應維持在120℃下兩個小時且於氮氣環境下。燒瓶中之內容物接著被降壓至10kPa,於120℃下一小時。緊接著,油浴溫度逐漸地在10kPa下自120增加至180℃,於期間其多數苯酚係蒸餾且收集於液態氮冷卻筒中。壓力逐漸地降低至0.7kPa以及反應維持在180℃又另外兩個小時。燒瓶中之反應物冷卻至室溫,並且伴隨著迴轉地震盪溶解於適當量之四氫呋喃中,諸如150mL。溶液進一步地以四氫呋喃稀釋至500mL並且過濾。過濾後之溶液逐滴地加入5L純甲醇中。於真空爐中18個小時過濾以及乾燥而收集白色聚合物(70℃,29.4吋水真空)。乾燥之聚合物重量為30.2公克。聚合物之特性總結如下:Mw=32,000,PDI=1.94,Tg=116℃,Td50=372 ℃。 The following materials were added to a 250 mL round flask equipped with a magnetic stirrer of the appropriate size: 13.17 grams of isosorbide (90 mmol, Cargill), 14.09 grams of trans-2,3-norbornane dimethanol ( 90 mmol), 38.63 g of diphenyl carbonate (180 mmol), and 95.6 mg of sodium carbonate (9.0 mmol). The flask was vented to 1.3 kPa and refilled with nitrogen three times. When the flask was immersed in an oil bath at 120 ° C, the contents were maintained under a nitrogen atmosphere. The reaction was maintained at 120 ° C for two hours and under a nitrogen atmosphere. The contents of the flask were then depressurized to 10 kPa for one hour at 120 °C. Immediately thereafter, the oil bath temperature was gradually increased from 120 to 180 ° C at 10 kPa during which most of the phenol was distilled and collected in a liquid nitrogen cooling cylinder. The pressure was gradually reduced to 0.7 kPa and the reaction was maintained at 180 ° C for another two hours. The reactants in the flask were cooled to room temperature and dissolved in a suitable amount of tetrahydrofuran, such as 150 mL, with a rotary shock. The solution was further diluted to 500 mL with tetrahydrofuran and filtered. The filtered solution was added dropwise to 5 L of pure methanol. The white polymer (70 ° C, 29.4 Torr water vacuum) was collected by filtration in a vacuum oven for 18 hours and dried. The dry polymer weighed 30.2 grams. The properties of the polymer are summarized as follows: M w = 32,000, PDI = 1.94, T g = 116 ° C, T d50 = 372 °C.

實施例10之聚合作用:異山梨糖醇及1,4-環己二甲醇 Polymerization of Example 10: isosorbide and 1,4-cyclohexanedimethanol

使用實施例10中之程序除了將29.04公克之異山梨糖醇(199mmol,Cargill公司),28.7公克之1,4-環己二甲醇(199mmol),85.2公克之碳酸二苯酯(398mmol):以及211毫克之碳酸鈉(19.9mmol)填入反應容器中。乾燥聚合物重量為65.1公克。聚合物特性總結如下:Mw=72,000,PDI=2.84,Tg=110℃,Td50=373℃。 Using the procedure of Example 10, except that 29.04 grams of isosorbide (199 mmol, Cargill Corporation), 28.7 grams of 1,4-cyclohexanedimethanol (199 mmol), 85.2 grams of diphenyl carbonate (398 mmol): 211 mg of sodium carbonate (19.9 mmol) was charged into the reaction vessel. The dry polymer weighed 65.1 grams. The polymer properties are summarized as follows: M w = 72,000, PDI = 2.84, T g = 110 ° C, T d50 = 373 ° C.

實施例11之聚合作用:環狀降莰烷螺碳酸酯同元聚合物 Polymerization of Example 11: cyclic norbornane spirocarbonate homopolymer

第二丁基鋰(於環己酮中0.21mL,1.4M)在0℃下於氮氣層中被添加至溶解於甲苯(200mL)中之螺[聯-環[2.2.1]庚烷-2,5’-[1,3]二]-2’-酮(15公克,82.3mmol)中。反應混合物於0℃下攪拌5個小時,且接著逐漸地允許加溫至室溫。在聚合物自甲醇沉澱後於室溫下連續攪拌又另外12小時,並且於真空下乾燥而獲得9公克之白色聚合物。聚合物之Mw測定為32,000,而PDI為1.63以及Td50=284℃。 The second butyl lithium (0.21 mL in cyclohexanone, 1.4 M) was added to the snail [L-[2.2.1] heptane-2 dissolved in toluene (200 mL) at 0 ° C in a nitrogen blanket. , 5'-[1,3] two ]-2'-ketone (15 g, 82.3 mmol). The reaction mixture was stirred at 0 ° C for 5 hours and then gradually allowed to warm to room temperature. After the polymer was precipitated from methanol, it was continuously stirred at room temperature for another 12 hours, and dried under vacuum to obtain 9 g of a white polymer. The Mw of the polymer was determined to be 32,000, while the PDI was 1.63 and Td50 = 284 °C.

B.助熔配方實施例B. Flux Formulation Example 實施例B1:自1,3-環己二醇與內-內-2,3-降莰烷二甲醇之聚碳酸酯與於GBL中之甲酸的配方 Example B1: Formulation of polycarbonate from 1,3-cyclohexanediol and endo-endo-2,3-norbornane dimethanol with formic acid in GBL

以於聚合物實施例3中之下列程序製備之乾燥聚合物(4.54公克)係加入之γ-丁內酯(GBL)而產生聚合物溶液其總重量為12.8公克(35.3wt%樹脂內容物)。澄清、具黏 性、均質之聚合物溶液藉由輥混合至少12小時。該黏性溶液係透過PTFE所製成之1.0μm圓盤式濾片過濾,且黏度以布式黏度計(Model DV I Prime)於25℃下經測試後為17500cPs。甲酸(0.67公克,全部溶液之5wt%)接著被加入,且經輥混合8小時之後獲得均質配方。 The dry polymer (4.54 g) prepared by the following procedure in Polymer Example 3 was added with γ-butyrolactone (GBL) to give a polymer solution having a total weight of 12.8 g (35.3 wt% resin content). . Clarified, sticky The homogeneous, homogeneous polymer solution was mixed by roller for at least 12 hours. The viscous solution was filtered through a 1.0 μm disc filter made of PTFE, and the viscosity was 17500 cPs after testing at 25 ° C with a Brookfield viscometer (Model DV I Prime). Formic acid (0.67 g, 5 wt% of the total solution) was then added and a homogenous formulation was obtained after 8 hours of roll mixing.

實施例B2:自異山梨糖醇與內-外-2,3-降莰烷二甲醇之聚碳酸酯與於GBL中之甲酸的配方 Example B2: Formulation of polycarbonate from isosorbide and endo-exo-2,3-norbornane dimethanol and formic acid in GBL

依據本發明具體實施例之聚碳酸酯配方係依據實施例B1所述之程序而製備,其與5.25公克來自聚合物實施例9之乾燥聚合物生成15.0公克之基質聚合物溶液(35.0wt%樹脂內容物)。黏度經測試後為4600cPs。甲酸加入0.78公克。 A polycarbonate formulation according to a specific embodiment of the invention was prepared according to the procedure described in Example B1, which produced 15.0 grams of a matrix polymer solution (35.0% by weight of resin) with 5.25 grams of dry polymer from Polymer Example 9. Content)). The viscosity was tested to 4600 cPs. Formic acid was added to 0.78 grams.

實施例B3:自異山梨糖醇與1,4-環己二甲醇之聚碳酸酯與於GBL中之甲酸的配方 Example B3: Formulation of polycarbonate from isosorbide and 1,4-cyclohexanedimethanol with formic acid in GBL

依據本發明具體實施例之聚碳酸酯配方係依據實施例B1所述之程序而製備,其與2.00公克來自聚合物實施例10之乾燥聚合物生成10.0公克之基質聚合物溶液(20.0wt%樹脂內容物)。黏度經測試後為8000cPs。甲酸加入0.52公克。 A polycarbonate formulation according to a specific embodiment of the present invention was prepared according to the procedure described in Example B1, which produced 10.0 grams of a matrix polymer solution (20.0% by weight of resin) with 2.00 grams of dry polymer from Polymer Example 10. Content)). The viscosity was 8000 cPs after testing. Formic acid was added to 0.52 g.

C.與於GBL中之甲酸的焊料助熔配方C. Solder flux formulation with formic acid in GBL

實施例B1-B3之配方係被使用以分別提供對於評估C1-C3之數據,如表3所示。此些實施例使用之程序如下:配方係以27-劑量注射劑注射至部分氧化表面之銅版上(1.7cm×3.4cm)如清晰的點分散。焊球(Sn99.3Cu0.7;600μm)係小心地轉移至銅版上之每一個點上面。整個版 裝置於一個裝置上,接著藉由在兩分鐘以內增加圍繞在版之周圍溫度自室溫上升至230及260℃之間,使其受到熱回焊,如版穿過回焊爐。最終溫度在允許版回到室溫之前接著維持又另兩分鐘。可以觀察到在載送放置之焊球的版之轉移期間,聚合物組成物之每一個點維持其所放置之焊球於所在的位置,因此焊料材料回焊之後,如測定,當與控制組(C4)相比較,範圍自930至990μm其顯示優異之助熔。控制組(C4)之配方係不含甲酸之配方B2。實施例C1-C4之焊料回焊結果顯示如下表3。 The formulations of Examples B1-B3 were used to provide data for the evaluation of C1-C3, respectively, as shown in Table 3. The procedure used in these examples was as follows: The formulation was injected onto a copper plate (1.7 cm x 3.4 cm) of a partially oxidized surface with a 27-dose injection as clearly spotted. Solder balls (Sn99.3 Cu0.7; 600 μm) were carefully transferred to each point on the copper plate. Entire version The device is placed on a device and then subjected to thermal reflow, such as through a reflow oven, by increasing the ambient temperature around the plate from room temperature to between 230 and 260 ° C within two minutes. The final temperature is then maintained for another two minutes before allowing the plate to return to room temperature. It can be observed that during the transfer of the plate carrying the placed solder balls, each point of the polymer composition maintains its placed solder balls in place, so after the solder material is reflowed, as determined, when compared to the control group (C4), compared to 930 to 990 μm, it showed excellent fluxing. The formulation of Control Group (C4) is Formulation B2 without formic acid. The solder reflow results of Examples C1-C4 are shown in Table 3 below.

D.熱穩定性實施例D. Thermal stability example

D1:自異山梨糖醇與內-外-2,3-降莰烷二甲醇之聚碳酸酯的等溫熱重分析 D1: Isothermal thermogravimetric analysis of polycarbonate from isosorbide and endo-exo-2,3-norbornane dimethanol

聚合物組成物係由以聚合物實施例9(Mw=32,000)之方法所製備之聚合物以及適當量之γ-丁內酯所配製。組成物係旋轉塗布至四吋矽基板上以及於120℃下烘烤10分鐘以形成澄清膜。膜之樣本自基板上剝除下來並且於220℃下藉由等溫熱重分析分析。一小時之後相較於最初 膜重,重量流失係小於2%。一小時內於260℃下相似樣本之重量流失係小於5%。可以想像材料在200℃至260℃區間具有熱穩定性。 The polymer composition was prepared from a polymer prepared by the method of Polymer Example 9 (M w = 32,000) and an appropriate amount of γ-butyrolactone. The composition was spin-coated onto a four-ply substrate and baked at 120 ° C for 10 minutes to form a clear film. A sample of the film was peeled off from the substrate and analyzed by isothermal thermogravimetric analysis at 220 °C. After one hour, the weight loss was less than 2% compared to the initial membrane weight. The weight loss of similar samples at 260 ° C in less than one hour was less than 5%. It is conceivable that the material has thermal stability in the range of 200 ° C to 260 ° C.

D2:於熱回焊時之膜厚度評估 D2: Film thickness evaluation during thermal reflow

聚合物組成物係由以聚合物實施例9(Mw=32,000)之方法所製備之聚合物以及適當量之γ-丁內酯所配製。組成物係旋轉塗布至四吋矽基板上以及於120℃下烘烤10分鐘以形成適當之厚度為2μm的膜。矽基板於回焊爐中藉由在兩分鐘以內增加圍繞在版之周圍溫度自室溫上升至230及260℃之間加熱。基板維持在其溫度又另兩分鐘接著再冷卻至室溫。紀錄最終膜厚度以及與加熱錢之最初膜厚度比較。如表4所示,厚度變化係1%,亦及典型膜厚度測量錯誤,且沒有觀察到膜品質之劣化。所有的數據指出材料係適合於230及260℃之間使用作為耐久材料。 The polymer composition was prepared from a polymer prepared by the method of Polymer Example 9 (M w = 32,000) and an appropriate amount of γ-butyrolactone. The composition was spin-coated onto a four-ply substrate and baked at 120 ° C for 10 minutes to form a film having a suitable thickness of 2 μm. The tantalum substrate is heated in the reflow oven by increasing the ambient temperature around the plate within two minutes from room temperature to between 230 and 260 °C. The substrate was maintained at its temperature for another two minutes and then cooled to room temperature. The final film thickness was recorded and compared to the initial film thickness of the heated money. As shown in Table 4, the thickness variation system 1%, and typical film thickness measurement errors, and no deterioration in film quality was observed. All data indicate that the material is suitable for use as a durable material between 230 and 260 °C.

E.具甲酸之配方的儲存穩定性實施例E. Storage stability example of formula with formic acid

對於下述實施例,溶解於γ-丁內酯中之具甲酸(FA)之配方係被製備且於65℃下儲存一星期,之後測定其最終莫耳分子量Mw(最終)。表5之Mw比例係藉由評估Mw(最終)/Mw(最初)之比例測定,其中Mw(最初)係於加熱 至65℃之前測定其莫耳分子量。如所示,每一個樣本指出當次被儲存之穩定性。 For the following examples, a formulation with formic acid (FA) dissolved in γ-butyrolactone was prepared and stored at 65 ° C for one week, after which the final molecular weight M w (final) was determined. The Mw ratio of Table 5 was determined by evaluating the ratio of Mw (final) / Mw (initial), where Mw (initial) was determined by measuring its molecular weight before heating to 65 °C. As shown, each sample indicates the stability of the current storage.

F.具其他酸性助熔劑之配方的儲存穩定性實施例F. Storage stability examples of formulations with other acidic fluxes

對於列舉於下方表6之每一個已知酸性助熔劑,溶解於γ-丁內酯中之聚(碳酸丙烯酯)(Novomer公司)係使用所指定載量之助熔劑製備。測定最初Mw以及樣本儲存於95℃下48小時,之後測定最終Mw以及Mw比例係藉由計算Mw(最終)/Mw(最初)之比例測定。對於這些配方,當儲存時間短於報告於表5之甲酸配方的儲存穩定性實施例時,可以相信這些配方儲存在較高的溫度下,對於這些儲存穩定性實施例之條件會至少與甲酸儲存穩定性實施例之條件一樣嚴格。因此,如所示,對於每一個如表6所示之配方,其指出穩定性。 For each of the known acidic fluxes listed in Table 6 below, the poly(propylene carbonate) (Novomer Company) dissolved in γ-butyrolactone was prepared using a flux of the specified loading. The initial Mw was measured and the samples were stored at 95 ° C for 48 hours, after which the final M w and M w ratios were determined by calculating the ratio of M w (final) / M w (initial). For these formulations, when the storage time is shorter than the storage stability examples of the formic acid formulations reported in Table 5, it is believed that these formulations are stored at higher temperatures, and the conditions for these storage stability examples will be at least with formic acid storage. The conditions of the stability examples are as stringent. Thus, as shown, for each of the formulations shown in Table 6, it indicates stability.

現在應該可以了解依據本發明之TFU聚合物組成物具體實施例於此示範操作對於微電子元件至基板之黏著的焊料回焊類型提供助熔之能力,以及在焊料回焊過程之前,之間與之後作用如底層填料連接以維持如此組件在原本位置之能力兩者。另外,應該要明瞭的是如此TFU組成物可以涵蓋多種聚合物具體實施例,其中如此聚合物具體實施例可以變得合適而藉由以及經由校正如此聚合物及/或如此聚合物之組成物之Mw以具有期望之Td50。進一步地,應該被明瞭的是,任何一種或多種前述已知助熔劑結合任何一種或多種前述聚合物具體實施例以及任何一種或多種前述載體溶劑以形成依據本發明期望之TFU聚合物組成物。進一步地,應該被明瞭的是,當配方實施例其例示聚合物重量百分比自20至35或更多,某些TFU聚合物組成物具體實施例之聚合物重量百分比涵蓋範圍係自15至50以及又另其他自10至80; 其中聚合物之如此多種wt%係可以有效地選擇TFU組成物之期望黏性亦及其形成最終底層填料特性。 It should now be understood that the specific embodiment of the TFU polymer composition according to the present invention provides the ability to flux the type of solder reflow for the bonding of the microelectronic component to the substrate in this exemplary operation, and before and during the solder reflow process. The effect then acts as an underfill connection to maintain the ability of such components to be in their original position. Additionally, it should be understood that such a TFU composition can encompass a variety of polymer embodiments, wherein such polymer embodiments can be adapted by and by calibrating such polymers and/or compositions of such polymers. M w has the desired T d50 . Further, it should be understood that any one or more of the foregoing known fluxes incorporate any one or more of the foregoing polymer embodiments and any one or more of the foregoing carrier solvents to form a TFU polymer composition contemplated in accordance with the present invention. Further, it should be understood that when the formulation examples exemplify polymer weight percentages from 20 to 35 or more, the polymer weight percentages of certain TFU polymer composition embodiments range from 15 to 50 and Still other from 10 to 80; wherein such a plurality of wt% of the polymer is effective to select the desired viscosity of the TFU composition and its formation into the final underfill characteristics.

應該進一步地瞭解本發明之TFU聚合物組成物對於形成多種微電子裝置組件係有用的,其中第一基板,其具有複數個配置於第一表面之第一接觸,例如,半導體模,其具有電接觸墊或透過矽經過電接觸墊配置於第一表面,其係電性或物性地連接至第二基板,第二基板具有複數個配置於第二表面之第二接觸墊,第一接觸墊與第二接觸墊至少實質上與彼此連結。該電性及物性之連結係藉由提供焊料預形體,例如焊球,至一個或兩者第一及第二複數個接地墊之個別的接觸,將TFU聚合物組成物塗布至一個或是兩者第一及第二表面因而TFU聚合物組成物密封焊料預形體而完成。進一步地完成物性及電性連結,使第一及第二基板透過TFU聚合物層與彼此相互接觸以形成預組裝結構,其係接著被加熱至可有效允許焊料預形體形成第一及第二複數個接觸電性連接之溫度,亦可對於TFU聚合物密封焊料預形體以及物性連結第一基板至第二基板係有效的。 It should be further appreciated that the TFU polymer composition of the present invention is useful for forming a plurality of microelectronic device components, wherein the first substrate has a plurality of first contacts disposed on the first surface, such as a semiconductor die having electrical The contact pad is disposed on the first surface through the electrical contact pad, and is electrically or physically connected to the second substrate, and the second substrate has a plurality of second contact pads disposed on the second surface, the first contact pad and The second contact pads are at least substantially joined to each other. The electrical and physical properties are bonded to one or both of the TFU polymer composition by providing solder preforms, such as solder balls, to individual contacts of one or both of the first and second plurality of ground pads. The first and second surfaces are thus completed by sealing the solder preform with the TFU polymer composition. Further completing the physical and electrical connection, the first and second substrates are passed through the TFU polymer layer and are in contact with each other to form a pre-assembled structure, which is then heated to effectively allow the solder preform to form the first and second plurality The temperature of the contact electrical connection can also be effective for the TFU polymer sealing solder preform and the physical connection of the first substrate to the second substrate.

Claims (12)

一種TFU聚合物組成物,其係包含:聚合物,該聚合物係包含分子量(Mw)自5,000至300,000之聚碳酸酯;載體溶劑;及助熔劑。 A TFU polymer composition comprising: a polymer comprising a polycarbonate having a molecular weight ( Mw ) of from 5,000 to 300,000; a carrier solvent; and a fluxing agent. 如申請專利範圍第1項之聚合物組成物,其中助熔劑係選自甲醛、甲酸、2-硝苯甲酸、丙二酸、檸檬酸、蘋果酸及琥珀酸。 The polymer composition of claim 1, wherein the fluxing agent is selected from the group consisting of formaldehyde, formic acid, 2-nitrobenzoic acid, malonic acid, citric acid, malic acid, and succinic acid. 如申請專利範圍第2項之聚合物組成物,其中助熔劑係甲酸。 The polymer composition of claim 2, wherein the fluxing agent is formic acid. 如申請專利範圍第1項之聚合物組成物,其中聚碳酸酯係選自聚(伸烷基碳酸酯)或自立體特異性降莰烷二醇及/或二甲醇單體所形成的聚合物。 The polymer composition of claim 1, wherein the polycarbonate is selected from the group consisting of poly(alkylene carbonate) or a polymer formed from stereospecific norbornanediol and/or dimethanol monomer. . 如申請專利範圍第4項之聚合物組成物,其中自立體特異性降莰烷二醇及/或二甲醇單體所形成的聚合物係外-外-2,3-聚降莰烷二甲基碳酸酯與內-內-2,3-聚降莰烷二甲基碳酸酯聚合物、1,3-聚環己碳酸酯與內-外-2,3-聚降莰烷二甲基碳酸酯聚合物、聚(異山梨糖醇基碳酸酯)與反-2,3-聚降莰烷二甲基碳酸酯聚合物之一。 The polymer composition of claim 4, wherein the polymer formed from the stereospecific norbornanediol and/or the dimethanol monomer is exo-exo-2,3-polynorzane. Carbonate and endo-endo-2,3-polynorbornane dimethyl carbonate polymer, 1,3-polycyclohexyl carbonate and endo-exo-2,3-polynorbornane dimethyl carbonate One of an ester polymer, a poly(isosorbitol carbonate) and a trans-2,3-polynordecane dimethyl carbonate polymer. 如申請專利範圍第1項之聚合物組成物,其中聚合物係包含衍生自由化學式I至XV所表示之降莰烷二醇單體、降莰烷二甲醇單體、以及二醇單體之重複單元。 The polymer composition of claim 1, wherein the polymer comprises a repeating derivative of the norbornanediol monomer, the norbornane dimethanol monomer, and the diol monomer represented by the chemical formulas I to XV. unit. 如申請專利範圍第1項之聚合物組成物,其中聚合物 係佔聚合物組成物之15至80wt%。 The polymer composition of claim 1, wherein the polymer It is 15 to 80% by weight of the polymer composition. 如申請專利範圍第7項之聚合物組成物,其中基於聚合物之總重,甲酸係包含組成物之0.5至10.0wt%。 The polymer composition of claim 7, wherein the formic acid comprises from 0.5 to 10.0% by weight of the composition based on the total weight of the polymer. 如申請專利範圍第1項之聚合物組成物,其中載體溶劑係選自環己酮、環戊酮、二甘醇二甲醚、γ-丁內酯(GBL)、N,N-二甲基乙醯胺、N,N-二甲基甲醯胺、苯甲醚、3-甲氧基丙酸甲酯、四氫呋喃及其混合物。 The polymer composition of claim 1, wherein the carrier solvent is selected from the group consisting of cyclohexanone, cyclopentanone, diglyme, γ-butyrolactone (GBL), N,N-dimethyl Acetamide, N,N-dimethylformamide, anisole, methyl 3-methoxypropionate, tetrahydrofuran, and mixtures thereof. 如申請專利範圍第9項之聚合物組成物,其中載體溶劑係GBL。 The polymer composition of claim 9, wherein the carrier solvent is GBL. 一種形成微電子元件組件方法,其包含:提供第一基板,該第一基板具有第一接觸區域配置於第一表面;提供第二基板,該第二基板具有第二接觸區域配置於第二表面;提供焊料預形體配置於一個或多個之第一接觸區域或一個或多個之第二接觸區域;形成TFU聚合物層覆蓋以及密封焊料預形體;使第一基板之第一表面接觸第二基板之第二表面,其中TFU聚合物層係配置於其兩者之間,第一接觸區域係與第二接觸區域連結,且於其中形成預組裝結構已形成;以及加熱該預組裝結構至可有效(1)使得焊料預形體物性及電性連結一個或多個第一接觸區域至一個或多個第二接觸區域,並且(2)形成聚合物底層填料物性連結至第一及第二基板之溫度。 A method of forming a microelectronic component assembly, comprising: providing a first substrate having a first contact region disposed on a first surface; providing a second substrate having a second contact region disposed on the second surface Providing a solder preform disposed in one or more first contact regions or one or more second contact regions; forming a TFU polymer layer covering and sealing the solder preform; contacting the first surface of the first substrate with the second a second surface of the substrate, wherein the TFU polymer layer is disposed between the two, the first contact region is coupled to the second contact region, and a pre-assembled structure is formed therein; and the pre-assembled structure is heated to Effective (1) to cause the solder preform to be physically and electrically bonded to the one or more first contact regions to the one or more second contact regions, and (2) to form a polymeric underfill material that is physically coupled to the first and second substrates temperature. 如申請專利範圍第11項之方法,其中形成TFU聚合物層覆蓋以及密封焊料預形體係包含形成如此層覆蓋於一具有焊球配置於接觸墊之微電子裝置之活性表面上。 The method of claim 11, wherein forming the TFU polymer layer covering and sealing the solder preform system comprises forming such a layer overlying an active surface of the microelectronic device having solder balls disposed on the contact pads.
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