TW201333275A - Selective hard gold deposition - Google Patents
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- TW201333275A TW201333275A TW101134472A TW101134472A TW201333275A TW 201333275 A TW201333275 A TW 201333275A TW 101134472 A TW101134472 A TW 101134472A TW 101134472 A TW101134472 A TW 101134472A TW 201333275 A TW201333275 A TW 201333275A
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- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/48—Electroplating: Baths therefor from solutions of gold
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- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/56—Electroplating: Baths therefor from solutions of alloys
- C25D3/62—Electroplating: Baths therefor from solutions of alloys containing more than 50% by weight of gold
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- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/02—Electroplating of selected surface areas
- C25D5/022—Electroplating of selected surface areas using masking means
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Abstract
Description
本發明涉及一種用於(特別是)在電觸點上的金的電解沉積的方法。該方法的特徵在於:將多種特殊添加劑添加到電解質之中以便防止在低電流密度區域中所不希望的金沉積。 The invention relates to a method for electrolytic deposition of gold, in particular on electrical contacts. The method is characterized in that a plurality of special additives are added to the electrolyte to prevent undesired gold deposition in the low current density region.
特定添加劑在金屬電鍍領域中的使用係熟知的。在金以及金合金,特別是硬金(例如,AuNi、AuCo、AuFe)的情況下,存在許多用於電化學法以及電解法的添加劑。商用金電鍍浴因此不僅含有金以及可任選地一或多種處於溶解形式的合金元素,而且總體上還含有導電鹽和緩衝鹽以及作為增亮劑或出於其他輔助性目的的用於調節金屬沉積以及層形成的不同的無機和/或有機物質。 The use of specific additives in the field of metal plating is well known. In the case of gold and gold alloys, particularly hard gold (for example, AuNi, AuCo, AuFe), there are many additives for electrochemical methods and electrolysis. The commercial gold electroplating bath therefore contains not only gold and optionally one or more alloying elements in dissolved form, but also generally contains conductive salts and buffer salts and as a brightening agent or for other auxiliary purposes. Different inorganic and/or organic substances formed by deposition and layer formation.
精細且堅硬的金塗層被大量用於工業應用,其中,耐磨性、耐化學性、黏合性、可焊性或磨損性能特別重要。針對電觸點上的金的電鍍,在連續式裝置中現有技術採用了掩模技術(Edelmetallschichten;H.Kaiser;Eugen G.Leuze Verlag,2002第1版,第74-89頁以及Selektive Hochgeschwindigkeitsabscheidung von Edelmetallen auf Bandanlagen;P.Wingenfeld,Galvanotechnik,2/2004,第335ff頁,Eugen G.Leuze Verlag)以便將金屬沉積物選擇性地塗覆在觸針的功能區域之中。然而,在掩模下方的偏 轉(runout)區(間隙)中,在電解沉積情況下存在多個低電流密度區域。此處,為了降低成本,應盡可能避免從硬金電解質中的塗層的沉積。為此目的,應該找到選擇性地抑制這個區域中的金的沉積的添加劑。 Fine and hard gold coatings are used in a large number of industrial applications where wear resistance, chemical resistance, adhesion, weldability or wear properties are particularly important. For the electroplating of gold on electrical contacts, the prior art uses a masking technique in a continuous device (Edelmetallschichten; H. Kaiser; Eugen G. Leuze Verlag, 2002, 1st edition, pages 74-89 and Selektive Hochgeschwindigkeitsabscheidung von Edelmetallen Auf Bandanlagen; P. Wingenfeld, Galvanotechnik, 2/2004, page 335ff, Eugen G. Leuze Verlag) in order to selectively coat metal deposits in the functional area of the stylus. However, the bias below the mask In the runout zone (gap), there are a plurality of low current density regions in the case of electrolytic deposition. Here, in order to reduce costs, the deposition of the coating from the hard gold electrolyte should be avoided as much as possible. For this purpose, additives should be found which selectively inhibit the deposition of gold in this region.
因此,例如,WO0028108揭露了一種用於金的還原沉積的方法,其中使用了抗金沉積劑。此處所使用的化合物據說可以在沉積方法的過程中防止金屬表面與金之間的(除其他之外)蝕刻性或腐蝕性二次反應。這類化合物被視為是(特別是)某些胺或它們與攜帶環氧基的化合物的反應產物。 Thus, for example, WO0028108 discloses a method for the reduction deposition of gold in which an anti-gold deposition agent is used. The compounds used herein are said to prevent, among other things, etch or corrosive secondary reactions between the metal surface and the gold during the deposition process. Such compounds are considered to be, in particular, certain amines or their reaction products with epoxy-carrying compounds.
根據GB 2028873,將烷基多胺如四亞乙基五胺添加到電解金鎘浴中導致了具有一低觸點電阻的異常穩定的金沉積物。此外,多胺確保金沉積物中的碳含量呈現為一特殊值並且陰極效率減少了達80%。然而,針對此處建議使用相應的金鈷或金鎳合金。 According to GB 2028873, the addition of an alkyl polyamine such as tetraethylenepentamine to an electrolytic gold cadmium bath results in an abnormally stable gold deposit having a low contact resistance. In addition, the polyamine ensures that the carbon content in the gold deposits appears to be a special value and the cathode efficiency is reduced by up to 80%. However, it is recommended to use the corresponding gold cobalt or gold nickel alloy for this purpose.
US 3642589揭露了被添加到含有金以及銀的電解浴中的添加劑。該等浴被採用于沉積基於金的合金。上文提及的該等添加劑由環氧氯丙烷以及亞烷基多胺的聚合縮合物組成。例如,將環氧氯丙烷以及四亞乙基五胺的一縮合物添加到含有金以及其他合金組分(如鎳和鈷)的電解質之中。非常厚的金合金層能夠以這種方式來進行無缺陷的沉積。然而,由於電解質會含有游離氰化物,所以此處所論述的電解質被用在鹼性pH範圍內。從勞動衛生的視角來看,這似乎是一缺點。 No. 3,642,589 discloses additives which are added to an electrolytic bath containing gold and silver. These baths are used to deposit gold-based alloys. The additives mentioned above consist of a polymeric condensate of epichlorohydrin and an alkylene polyamine. For example, a condensate of epichlorohydrin and tetraethylenepentamine is added to an electrolyte containing gold and other alloy components such as nickel and cobalt. Very thick gold alloy layers can be deposited in this way without defects. However, since the electrolyte will contain free cyanide, the electrolytes discussed herein are used in the alkaline pH range. From the perspective of labor hygiene, this seems to be a disadvantage.
DE 3432784同樣地涉及了一電解浴,從該電解浴中可以沉積金鈷合金的堅硬的塗層。此處所描述的方法在電流密度範圍為0.1-3.0 A/dm2以及pH為從3.5至6.5的情況下進行操作,並且建議添加一反應產物,該反應產物具有約一份環氧氯丙烷和兩份二胺基烷,以及還有一份α,ω-二鹵代烷。此文的目的係提供具有緊密黏結塗層的高合金鋼產物,並且增大用於這一方法的電流密度上限。 DE 3432784 likewise relates to an electrolytic bath from which a hard coating of gold-cobalt alloy can be deposited. The process described herein operates at current densities ranging from 0.1 to 3.0 A/dm 2 and pH from 3.5 to 6.5, and it is recommended to add a reaction product having about one part of epichlorohydrin and two Part of the diaminoalkane, and also a part of the α,ω-dihaloalkane. The purpose of this article is to provide a high alloy steel product with a tightly bonded coating and to increase the current density upper limit for this process.
金或金合金也可以從包含以下各項的浴中電解沉積,如US 4062736中所提及,該等浴包含金的氰化物錯合物以及比例為1:2.5的一種多胺與環氧氯丙烷的一縮合產物。這種浴在從6至10的pH範圍內工作,並且另外含有砷化合物以及溫和的還原劑。這類浴據說確保了塗層的改善的均勻性以及更好的顏色穩定性。 Gold or gold alloys may also be electrolytically deposited from a bath comprising, as mentioned in US Pat. No. 4,062, 736, which contains gold cyanide complex and a polyamine and epoxy chloride in a ratio of 1:2.5. a condensation product of propane. This bath operates in a pH range from 6 to 10 and additionally contains arsenic compounds as well as mild reducing agents. Such baths are said to ensure improved uniformity of the coating as well as better color stability.
根據EP 37535,在除了合金組分之外還將胺基羧酸或膦酸添加到浴中並且在浴中設定小於3的pH時,純胺也適於在電解金(III)浴以及金(III)合金浴中生成光亮且高度延展性的沉積物。至於胺,例如,使用了四亞甲基四胺。 According to EP 37535, when an amine carboxylic acid or a phosphonic acid is added to the bath in addition to the alloy component and a pH of less than 3 is set in the bath, the pure amine is also suitable for electrolysis of the gold (III) bath as well as gold ( III) A bright and highly ductile deposit is formed in the alloy bath. As the amine, for example, tetramethylenetetramine is used.
在FR2414082中,多胺以及環氧氯丙烷也用在了電解浴中,該等電解浴具有砷化合物以及還原劑作為另外的組分。所使用的浴應具有6-10的pH。以這種方式生成的金沉積物據說具有特別均勻的厚度。 In FR 2410 082, polyamines and epichlorohydrin are also used in electrolytic baths having arsenic compounds and reducing agents as additional components. The bath used should have a pH of 6-10. The gold deposits produced in this way are said to have a particularly uniform thickness.
EP2014801描述了可以被採用於電鍍(除其他之外)觸點材料的金電解質。這類電解質含有許多種添加劑。除 了六亞甲基四胺之外,還使用了基於含氮和含硫的羧酸或醇的錯合劑以及增亮劑。低電流密度區域中的金的沉積據說借助於該等電解質而得到防止。 EP 2014801 describes a gold electrolyte that can be used to plate (among other things) contact materials. Such electrolytes contain a wide variety of additives. except In addition to hexamethylenetetramine, a complexing agent based on a nitrogen-containing and sulfur-containing carboxylic acid or alcohol and a brightening agent are also used. The deposition of gold in the low current density region is said to be prevented by means of such electrolytes.
因此,本發明的一目的係指示如何可以避免或至少減少在掩模的偏轉區中金或金合金的過量沉積。所提出的方法應能夠使用具有十分簡單的構成的電解質來操作,並且從經濟和生態學的視角來看,應優於現有技術中建立的方法。 Accordingly, it is an object of the present invention to indicate how excessive deposition of gold or gold alloy in the deflection zone of the mask can be avoided or at least reduced. The proposed method should be capable of operating with an electrolyte having a very simple composition and should be superior to the methods established in the prior art from an economic and ecological point of view.
本領域普通技術人員可以從現有技術中明顯所見的這個目的以及另外的目的可以藉由一種具有本申請專利範圍第1項的特徵性特點的方法來實現。在從屬於申請專利範圍第1項的多個申請專利範圍中指示了本發明的方法的多個較佳的實施方式。 This and other objects which will be apparent to those skilled in the art from the prior art can be achieved by a method having the characteristic features of item 1 of the scope of the patent application. A number of preferred embodiments of the method of the present invention are indicated in the scope of a plurality of patent applications that are subject to claim 1 of the patent application.
在用於金或金合金(特別是硬金)的選擇性電解沉積的一種方法中,使用具有從3至6的pH的一水性電解質,該水性電解質包含:可溶性錯合物形式的金離子;可任選地另外的離子,它們選自由鈷、鎳、鐵或它們的混合物組成的組;脂肪族多胺,該等脂肪族多胺在電解質中是可溶的並且具有至少4個亞乙基單元以及至少2個一級胺或二級胺基團,和/或莫耳比為從1:1至1:5的只有脂肪族或芳 香族胺與攜帶環氧基的化合物(特別是環氧氯丙烷)的反應產物;並且藉由以下步驟來生成相應的沉積物:將作為陰極的基底浸入電解質中並在與電解質接觸的一陽極與該陰極之間設定一足夠的電流,對金或金合金,特別是硬金進行電解沉積,完全出乎意料但仍有利地實現了所陳述的目的。此處呈現的這種方法第一次使以下內容成為可能:減少在低電流密度區域中的金或金合金的沉積,並且同時使沉積因數在從工藝過程視角來看是較佳的電流密度範圍內不受影響。這引起了所使用的金的約10%-30%的節省。 In a method for selective electrolytic deposition of gold or a gold alloy, in particular hard gold, an aqueous electrolyte having a pH of from 3 to 6 is used, the aqueous electrolyte comprising: gold ions in the form of a soluble complex; Optionally additional ions selected from the group consisting of cobalt, nickel, iron or mixtures thereof; aliphatic polyamines which are soluble in the electrolyte and which have at least 4 ethylene groups Units and at least 2 primary or secondary amine groups, and/or molar ratios from 1:1 to 1:5 are only aliphatic or aromatic a reaction product of an aromatic amine with an epoxy group-bearing compound, particularly epichlorohydrin; and a corresponding deposit by the following steps: immersing the substrate as a cathode in an electrolyte and an anode in contact with the electrolyte The setting of a sufficient current between the cathode and the electrolytic deposition of gold or a gold alloy, in particular hard gold, is completely unexpected but still advantageously achieves the stated purpose. This method presented here makes it possible for the first time to reduce the deposition of gold or gold alloys in low current density regions and at the same time to make the deposition factor a better current density range from a process point of view. Not affected internally. This causes a savings of about 10%-30% of the gold used.
該金將以其溶解在電解質中的離子形式存在。至於金的來源,本領域普通技術人員出於這一目的而將考慮的金的所有氰化錯合物、氯化錯合物、亞硫酸根錯合物以及次胺基錯合物都有可能使用。已知的金化合物可以在以下參考文獻(Edelmetallschichten;H.Kaiser;Eugen G.Leutze Verlag,2002第1版,第35-45頁)中找到。出於這一目的,較佳的是採用氰金酸根(I)錯合物。在此上下文中,十分特別佳的是金的氰化物錯合物的鉀鹽:K[Au(CN)2]。該金化合物以以下濃度用於待使用的電解質之中,即:0.005-0.2 mol/l,較佳的是0.025-0.1 mol/l,並且十分特別佳的是0.05-0.08 mol/l。可以指出的是,該電解質理想地不含有額外的游離氰化物。所有使用的氰化物都以上文所示的錯合物形式被引入到電解質之中。 The gold will be present in the form of ions dissolved in the electrolyte. As regards the source of gold, it is possible for all cyanide complexes, chlorinated complexes, sulfite complexes and nitriamide complexes of gold to be considered by those skilled in the art for this purpose. use. Known gold compounds can be found in the following reference (Edelmetallschichten; H. Kaiser; Eugen G. Leutze Verlag, 2002, 1st edition, pages 35-45). For this purpose, it is preferred to use a cyanate (I) complex. Very particularly preferred in this context is the potassium salt of the gold cyanide complex: K[Au(CN) 2 ]. The gold compound is used in the electrolyte to be used in the following concentrations: 0.005-0.2 mol/l, preferably 0.025-0.1 mol/l, and very particularly preferably 0.05-0.08 mol/l. It may be noted that the electrolyte desirably does not contain additional free cyanide. All of the cyanide used is introduced into the electrolyte in the form of the complex shown above.
根據本發明生成的沉積物可以同樣地由一種金合金組成。對於合金,發現硬金在這一方面是有用的,因為相應 的觸點應能承受特定的機械應力。硬金總體上被理解為是金以及選自下組的金屬之一的合金,該組由鐵、鈷、鎳或它們的混合物組成。後者同樣有利地以它們溶解於電解質中的離子形式存在。對於在電解質中可以溶解為相應離子的化合物,可以特別提及的是具有選自下組的陰離子的它們的易溶于水的鹽,該組由以下各項組成:氯離子、溴離子、碳酸根、碳酸氫根、磷酸根、磷酸氫根、硫酸根、檸檬酸根、甲磺酸根、酒石酸根、草酸根以及硝酸根。此處提及的鹽有利地以以下濃度用於電解質中,即:0.0001-0.1 mol/l,特別佳的是0.0025-0.02 mol/l,並且十分特別佳的是0.005-0.015 mol/l。可以注意的是,根據本發明並不排除在該電解質中存在其他金屬以及非金屬的另外的離子。但是,出於成本原因,電解質應盡可能地保持簡單。從這一視角來看,除其他之外,可以省卻另外的鹽或其他無機化合物的添加。具體來說,除了此處被提及為可任選的那些之外,電解質中不應存在任何另外的(非)金屬。可以十分特別佳的是省卻的是砷、銀和/或鎘的添加。 The deposits produced in accordance with the present invention may likewise be composed of a gold alloy. For alloys, hard gold is found to be useful in this regard because The contacts should be able to withstand specific mechanical stresses. Hard gold is generally understood to be an alloy of gold and one of the metals selected from the group consisting of iron, cobalt, nickel or a mixture thereof. The latter are likewise advantageously present in the form of ions which they dissolve in the electrolyte. As the compound which can be dissolved as a corresponding ion in the electrolyte, mention may be made especially of their water-soluble salts having an anion selected from the group consisting of chloride ion, bromide ion, carbonic acid. Roots, bicarbonate, phosphate, hydrogen phosphate, sulfate, citrate, mesylate, tartrate, oxalate, and nitrate. The salts mentioned herein are advantageously used in the electrolyte at a concentration of 0.0001 to 0.1 mol/l, particularly preferably 0.0025 to 0.02 mol/l, and very particularly preferably 0.005 to 0.015 mol/l. It may be noted that the presence of other metals as well as non-metal additional ions in the electrolyte is not excluded according to the invention. However, for cost reasons, the electrolyte should be as simple as possible. From this point of view, the addition of additional salts or other inorganic compounds can be dispensed with, among other things. In particular, no additional (non)metals should be present in the electrolyte other than those mentioned herein as optional. It is very particularly preferable to dispense with the addition of arsenic, silver and/or cadmium.
在本案中有可能作為用於從電解浴中沉積金或金合金的電流密度特異性抑制劑的脂肪族多胺,特別有利地是具有至少4個亞乙基單元以及至少2個一級胺或二級胺基團的那些。這一定義涵蓋了具有在末端胺基團之間的一排中的至少4個亞乙基單元的多胺以及其中所有或至少一些亞乙基單元的兩側有胺基團的多胺。針對後者的兩種通式藉由以下實例來示出: It is possible in this case to act as an aliphatic polyamine for the deposition of a current density specific inhibitor of gold or gold alloy from an electrolytic bath, particularly advantageously having at least 4 ethylene units and at least 2 primary amines or two Those of the amine group. This definition encompasses polyamines having at least 4 ethylene units in a row between terminal amine groups and polyamines having amine groups on either side of all or at least some of the ethylene units. The two general formulas for the latter are shown by the following examples:
1. NH2-(CH2-CH2-NR1-)nCH2-CH2-NH2 1. NH 2 -(CH 2 -CH 2 -NR 1 -) n CH 2 -CH 2 -NH 2
n3 R1,2,3,4=H或脂肪族基團(例如,甲基、乙基、(異)丙基、(正、二級、異)丁基) n 3 R 1,2,3,4 =H or an aliphatic group (for example, methyl, ethyl, (iso)propyl, (normal, secondary, iso)butyl)
可以指出的是,該等脂肪族多胺係在本發明的電解質中在下文所示的量下可溶的脂肪族多胺。因此,在電解質的3-6(具體來說是4-5)的給定pH下,多胺中胺基團的鏈長或數目存在一上限。脂肪族胺的2個胺基團之間的鏈長的上限預期是8個碳原子,較佳的是6個碳原子,並且特別佳的是4碳原子。二級胺和/或一級胺基團的數目可以同樣具有上限10。特別佳的是骨架中具有從3至9個胺基團,較佳的是從4至7個胺基團,並且特別佳的是從5或6個胺基團的多胺。有利的多胺係在開篇處所引用的文獻中可以找到並且遵循本文標準的那些多胺。特別佳的是使用選自下組的多胺,該組由四亞乙基五胺以及五亞乙基六胺組成。脂肪族多胺以以下濃度用於所使用的電解質中,即:0.001-0.5 mmol/l,特別佳的是0.005-0.4 mmol/l,並且十分特別佳的是0.01-0.03 mmol/l。 It may be noted that the aliphatic polyamines are aliphatic polyamines soluble in the electrolytes of the invention at the amounts shown below. Thus, at a given pH of 3-6 (specifically 4-5) of the electrolyte, there is an upper limit to the chain length or number of amine groups in the polyamine. The upper limit of the chain length between the two amine groups of the aliphatic amine is expected to be 8 carbon atoms, preferably 6 carbon atoms, and especially good is 4 carbon atoms. The number of secondary amines and/or primary amine groups may likewise have an upper limit of 10. Particularly preferred are polyamines having from 3 to 9 amine groups in the backbone, preferably from 4 to 7 amine groups, and particularly preferably from 5 or 6 amine groups. Advantageous polyamines are those which can be found in the literature cited at the outset and which comply with the standards herein. It is particularly preferred to use a polyamine selected from the group consisting of tetraethylenepentamine and pentaethylenehexamine. The aliphatic polyamine is used in the electrolyte to be used in the following concentrations: 0.001-0.5 mmol/l, particularly preferably 0.005-0.4 mmol/l, and very particularly preferably 0.01-0.03 mmol/l.
作為一替代方案或此外,脂肪族或芳香族胺與攜帶環氧基的化合物(特別是環氧鹵丙烷,如環氧氯丙烷)的反應產物可以同樣被用作電解質中的添加劑。可以指出的是,此處論及的反應產物只是由該胺以及該攜帶環氧基的化合物所形成。從現有技術中已經知道這類化合物。在這一方面,可以參考開篇處所引用的文獻,特別是WO 0028108,它的揭露內容藉由引用結合在此。這兩類化合物之間的反應產物可以有利地以從1:1至1:5的環氧衍生物與胺的比例來形成。特別佳的是從1:2至1:4的範圍,十分特別佳的是約1:3(基於莫耳量)。至於脂肪族或芳香族胺,此處可能選擇本領域普通技術人員在此上下文中將會考慮的所有化合物。在開篇處所引用的文獻中揭露的那些化合物係特別合適的。對於這類胺,特別佳的是選自下組的那些,該組由以下各項組成:乙二胺、二亞乙基三胺、三亞乙基四胺、五亞乙基六胺、四亞乙基五胺、六亞甲基七胺、七亞乙基八胺、咪唑、呱嗪、二胺基丙胺。此處在考慮中的反應產物以以下濃度被用於所使用的電解質中,即:0.00001-2 g/l,特別佳的為0.0001-0.5 g/l,十分特別佳的是0.0001-0.1 g/l,並且最佳的是0.0001-0.05 g/l。有利的是,莫耳比約為1:3的含有4至6個胺基團(特別是5個胺基團)的一種多胺與環氧氯丙烷的,或莫耳比約為1:1的一種三級胺與環氧氯丙烷的反應產物存在於電解質之中。 As an alternative or in addition, the reaction product of an aliphatic or aromatic amine with an epoxy-carrying compound, in particular an epihalohydrin such as epichlorohydrin, can likewise be used as an additive in the electrolyte. It may be noted that the reaction product referred to herein is formed solely from the amine and the epoxy-carrying compound. Such compounds are known from the prior art. In this respect, reference is made to the literature cited in the opening paragraph, in particular to WO 0028108, the disclosure of which is incorporated herein by reference. The reaction product between the two types of compounds can advantageously be formed in a ratio of epoxy derivative to amine from 1:1 to 1:5. Particularly preferred is a range from 1:2 to 1:4, very particularly preferably about 1:3 (based on the amount of moles). With regard to aliphatic or aromatic amines, it is possible here to select all compounds which will be considered by one of ordinary skill in the art in this context. Those compounds disclosed in the literature cited at the outset are particularly suitable. Particularly preferred for such amines are those selected from the group consisting of ethylenediamine, diethylenetriamine, triethylenetetramine, pentaethylenehexamine, and tetrakiene. Ethylpentamine, hexamethyleneheptaamine, heptaethylene octaamine, imidazole, pyridazine, diaminopropylamine. The reaction product under consideration here is used in the electrolyte to be used in the following concentrations, namely: 0.00001-2 g/l, particularly preferably 0.0001-0.5 g/l, very particularly preferably 0.0001-0.1 g/ l, and the best is 0.0001-0.05 g/l. Advantageously, a polyamine having a molar ratio of about 1:3 containing 4 to 6 amine groups (particularly 5 amine groups) and epichlorohydrin, or a molar ratio of about 1:1 A reaction product of a tertiary amine with epichlorohydrin is present in the electrolyte.
在沉積方法的過程中陰極與陽極之間的電解質中建立 的電流密度可以由本領域普通技術人員根據沉積的效率以及質量來選擇。取決於電鍍裝置的應用以及類型,電解質中的電流密度被有利地設定成從0.5至100 A/dm2。電流密度可以可任選地藉由匹配於裝置參數(如塗布單元的結構、流速、陽極以及陰極條件等)來增大或減小。1-100 A/dm2、較佳的是2-90 A/dm2、並且十分特別佳的是4-80 A/dm2的電流密度係有利的。pH範圍可以由本領域普通技術人員設定在開篇處所提及的區域之內。電解質的從約4至5,特別佳的是約4.5的pH係有利的。 The current density established in the electrolyte between the cathode and the anode during the deposition process can be selected by one of ordinary skill in the art based on the efficiency and quality of the deposition. The current density in the electrolyte is advantageously set from 0.5 to 100 A/dm 2 depending on the application and type of plating apparatus. The current density can optionally be increased or decreased by matching device parameters such as the structure of the coating unit, flow rate, anode and cathode conditions, and the like. 1-100 A/dm 2 , preferably 2-90 A/dm 2 , and very particularly preferably a current density of 4-80 A/dm 2 is advantageous. The pH range can be set by those of ordinary skill in the art at the regions mentioned at the outset. A pH of from about 4 to 5, particularly preferably about 4.5, of the electrolyte is advantageous.
在使用電解質時,有可能採用不同的不溶性陽極。對於不溶性陽極,較佳的是使用由選自下組的一材料構成的不溶性陽極,該組由鉑化的鈦(platinated titanium)、石墨、銥-過渡金屬混合氧化物以及一特種碳材料(“類金剛石碳”,DLC)或該等陽極的組合組成。特別佳的是由銥釕混合氧化物、銥釕鈦混合氧化物或銥組混合氧化物構成的混合氧化物陽極。另外合適的陽極材料可以在Cobley,A.J.等(不溶性陽極在酸性硫酸銅電沉積溶液中的使用(The use of insoluble Anodes in Acid Sulphate Copper Electrodeposition Solutions),Trans IMF,2001,79(3),第113和114頁)中找到。如果使用了不溶性陽極,則在使用如DE 102010055143中所描述的一直接接觸式膜陽極時獲得該方法的一特別佳的實施方式。 When using an electrolyte, it is possible to use different insoluble anodes. For the insoluble anode, it is preferred to use an insoluble anode composed of a material selected from the group consisting of platinumd titanium, graphite, ruthenium-transition metal mixed oxide, and a special carbon material (" Diamond-like carbon", DLC) or a combination of such anodes. Particularly preferred are mixed oxide anodes composed of cerium mixed oxide, cerium-titanium mixed oxide or cerium mixed oxide. Further suitable anode materials can be found in Cobley, AJ, et al. (The use of insoluble Anodes in Acid Sulphate Copper Electrodeposition Solutions, Trans IMF, 2001, 79(3), 113. And found in page 114). If an insoluble anode is used, a particularly preferred embodiment of the method is obtained when using a direct contact membrane anode as described in DE 102010055143.
在根據本發明的電解質中,陰離子型以及非離子型表面活性劑,例如聚乙二醇加合物、脂肪醇硫酸酯、烷基硫 酸酯、烷基磺酸酯、芳基磺酸酯、烷基芳基磺酸酯、以及雜芳基硫酸酯以及它們的鹽和衍生物,可以典型地用作濕潤劑(也可參見:Kanani,N:Galvanotechnik;Hanser Verlag,Munich Vienna,2000;第84ff頁)。 In the electrolyte according to the invention, anionic and nonionic surfactants, such as polyethylene glycol adducts, fatty alcohol sulfates, alkyl sulfurs Acid esters, alkyl sulfonates, aryl sulfonates, alkyl aryl sulfonates, and heteroaryl sulfates, as well as their salts and derivatives, are typically used as wetting agents (see also: Kanani) , N: Galvanotechnik; Hanser Verlag, Munich Vienna, 2000; page 84ff).
對於合適的增亮劑,可能使用(例如)DE 2355581以及DE1000 7325 A1中所描述的3-(4-咪唑基)丙烯酸、3-吡啶基羥基甲磺酸、吡啶、吡啶磺酸類、吡啶羧酸類、煙醯胺、3-(3-吡啶基)丙烯酸、喹啉磺酸、3-胺基吡啶、2,3-二胺基吡啶、2,3-二(2-吡啶基)吡嗪、2-(吡啶基)-4-乙磺酸、1-(3-磺丙基)吡啶鎓甜菜鹼、1-(3-磺丙基)異喹啉鎓甜菜鹼以及它們的鹽和衍生物。 For suitable brighteners, it is possible to use, for example, DE 2355581 and DE 1000 7325 A1 for 3-(4-imidazolyl)acrylic acid, 3-pyridylhydroxymethanesulfonic acid, pyridine, pyridinesulfonic acid, pyridinecarboxylic acid. , nicotinamide, 3-(3-pyridyl)acrylic acid, quinoline sulfonic acid, 3-aminopyridine, 2,3-diaminopyridine, 2,3-bis(2-pyridyl)pyrazine, 2 -(pyridyl)-4-ethanesulfonic acid, 1-(3-sulfopropyl)pyridinium betaine, 1-(3-sulfopropyl)isoquinolinium betaines, and salts and derivatives thereof.
可以指出的是,本發明的方法藉由電流的使用來較佳的是確保了只是具有金或金合金的一沉積物。另外的還原劑的使用可以因此被完全省卻,這係有利的。同樣地,沒有必要在本發明的方法中使用選自下組的任何化合物,該組由以下各項組成:砷化合物、水楊酸鹽、聚乙烯吡啶烷酮、含氮或含硫的羧酸、膦酸、醇以及芳香族硝基化合物。 It may be noted that the method of the present invention preferably ensures that only a deposit of gold or gold alloy is ensured by the use of electrical current. The use of additional reducing agents can therefore be completely dispensed with, which is advantageous. Likewise, it is not necessary to use any compound selected from the group consisting of arsenic compounds, salicylates, polyvinylpyrrolidone, nitrogen-containing or sulfur-containing carboxylic acids in the process of the invention. , phosphonic acid, alcohol and aromatic nitro compounds.
從描繪的圖表可以清楚看到,在小於4 A/dm2的低電流密度範圍中,添加劑對硬金電解質的沉積速度具有巨大的影響。此處,適當的多胺(單獨地)以及環氧氯丙烷和一種胺的反應產物都對硬金沉積具有抑制效果。最優量抑制物質在從0.5至4 A/dm2的低電流密度範圍中的使用使得沉積速度降低達80%,從約80 mg/Amin減少到15 mg/Amin。這引起較少的乃至沒有硬金被沉積在該等區域中,這最終說明節省了昂貴的貴金屬,並且因此降低了塗覆該塗層的成本。此處描述的並且被描述了其所有有利的且較佳的實施方式的該方法因此適於產生電觸點。 Can be clearly seen from the graph depicted in the low current density range of less than 4 A / dm 2, the additive has great influence on the deposition rate of the hard gold electrolyte. Here, a suitable polyamine (alone) and a reaction product of epichlorohydrin and an amine have an inhibitory effect on hard gold deposition. The use of an optimal amount of inhibiting species in the low current density range from 0.5 to 4 A/dm 2 resulted in a reduction in deposition rate of up to 80%, from about 80 mg/Amin to 15 mg/Amin. This causes less or even no hard gold to be deposited in these areas, which ultimately illustrates the savings in expensive precious metals and thus reduces the cost of coating the coating. The method described herein and described with all its advantageous and preferred embodiments is therefore suitable for producing electrical contacts.
具有表鹵代醇與一種脂肪族胺的反應產物的水性硬金電解質
借助於一反應產物來擴大工作範圍的水性硬金電解質
具有多胺的水性硬金電解質
具有無效多胺的硬金電解質
預鍍有金的拋光的黃銅板用作基底。該等基底的清洗以及塗布如下: A polished brass plate pre-plated with gold was used as the substrate. The cleaning and coating of the substrates are as follows:
1.陰極除油 30 sec/5V 1. Cathode degreasing 30 sec/5V
2.漂洗 2. Rinsing
3.浸入酸中 10 sec 3. Immersed in acid 10 sec
4.漂洗 4. Rinse
5.在硬金電解質中基底的塗布在以下條件下進行:按照11的規模,物品進行水平移動(5 m/min)並且在不同的電流密度下,攪動電解質(200 rpm/6 cm攪拌器)。 5. Coating of the substrate in the hard gold electrolyte was carried out under the following conditions: the article was moved horizontally (5 m/min) according to the scale of 11, and the electrolyte was agitated at a different current density (200 rpm / 6 cm stirrer) .
6.漂洗 6. Rinsing
7.使用壓縮空氣對被塗布的基底進行乾燥 7. Dry the coated substrate with compressed air
在乾燥操作之後,經由基底的重量差異(塗布前與塗布後的重量)確定沉積速度並且將其描繪在以下圖表中。(參見圖1-圖5) After the drying operation, the deposition speed was determined via the weight difference of the substrate (before coating and weight after coating) and is depicted in the following chart. (See Figure 1 - Figure 5)
圖1示出了根據本發明的使用不同濃度的添加劑時硬金電解質中的沉積速度[mg/Amin](表鹵代醇與脂肪族胺的反應產物=環氧氯丙烷以及五亞乙基六胺)。 Figure 1 shows the deposition rate [mg/Amin] in a hard gold electrolyte using different concentrations of additives according to the present invention (reaction product of epihalohydrin with aliphatic amine = epichlorohydrin and pentaethylene) amine).
圖2示出了在存在以及不存在添加劑的情況下硬金電解質中的沉積速度[mg/Amin](工作範圍借助於環氧氯丙烷以及二甲基胺基丙胺的反應產物得以擴大)。 Figure 2 shows the deposition rate [mg/Amin] in the hard gold electrolyte in the presence and absence of additives (the working range is extended by means of the reaction product of epichlorohydrin and dimethylaminopropylamine).
圖3示出了在添加以及不添加具有4個亞乙基單元的一種多胺(四亞乙基五胺)的情況下硬金電解質中的沉積速度[mg/Amin]。 Figure 3 shows the deposition rate [mg/Amin] in a hard gold electrolyte with and without the addition of a polyamine (tetraethylenepentamine) having 4 ethylene units.
圖4示出了在添加以及不添加具有3個亞乙基單元的一種多胺(三亞乙基四胺)的情況下硬金電解質中的沉積速度[mg/Amin]。 Figure 4 shows the deposition rate [mg/Amin] in a hard gold electrolyte with and without the addition of a polyamine (triethylenetetramine) having 3 ethylene units.
圖5示出了來自實例3以及4的具有3個以及4個亞乙基單元的多胺之間的比較。 Figure 5 shows a comparison between the polyamines having 3 and 4 ethylene units from Examples 3 and 4.
Claims (5)
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US2967135A (en) * | 1960-06-08 | 1961-01-03 | Barnet D Ostrow | Electroplating baths for hard bright gold deposits |
US3642589A (en) * | 1969-09-29 | 1972-02-15 | Fred I Nobel | Gold alloy electroplating baths |
DE2355581C3 (en) | 1973-11-07 | 1979-07-12 | Deutsche Gold- Und Silber-Scheideanstalt Vormals Roessler, 6000 Frankfurt | Galvanic bright gold bath with high deposition rate |
CH606502A5 (en) * | 1974-11-15 | 1978-10-31 | Oxy Metal Industries Corp | |
FR2414082A1 (en) | 1978-01-04 | 1979-08-03 | Oxy Metal Industries Corp | Bath for galvanic gold plating - contg. arsenic and poly:amine, giving uniform deposits on irregular shaped objects |
DE2930035C2 (en) * | 1978-08-31 | 1983-09-08 | Lea-Ronal (U.K.) Ltd., Buxton, Derbyshire | Galvanic bath and process for the deposition of a gold-cadmium-carbon alloy and electrical connection element with a contact material produced according to this process |
GB2028873B (en) * | 1978-08-31 | 1982-11-10 | Lea Ronal Uk Ltd | Gold alloy electroplating bath and method |
DE3012999C2 (en) * | 1980-04-03 | 1984-02-16 | Degussa Ag, 6000 Frankfurt | Bath and process for the galvanic deposition of high-gloss and ductile gold alloy coatings |
HU191879B (en) * | 1983-09-09 | 1987-04-28 | Videoton Elekt Vallalat | Processor fot the galvanic speretaion of hard gold plating for electronic purposes |
GB8334226D0 (en) * | 1983-12-22 | 1984-02-01 | Learonal Uk Ltd | Electrodeposition of gold alloys |
DE19643091B4 (en) * | 1996-10-18 | 2006-11-23 | Raschig Gmbh | Use of water-soluble reaction products of polyamidoamines, polyamines and epihalohydrin in galvanic baths, and processes for their preparation and galvanic baths containing them |
JP4116718B2 (en) * | 1998-11-05 | 2008-07-09 | 日本リーロナール有限会社 | Electroless gold plating method and electroless gold plating solution used therefor |
DE10007325A1 (en) | 1999-06-17 | 2000-12-21 | Degussa | Acid bath for galvanically depositing glossy gold and gold alloy layers contains gold and optionally one or more alloying elements in dissolved form as well as an organic compound as brightening agent |
JP4945193B2 (en) * | 2006-08-21 | 2012-06-06 | ローム・アンド・ハース・エレクトロニック・マテリアルズ,エル.エル.シー. | Hard gold alloy plating solution |
JP5317433B2 (en) * | 2007-06-06 | 2013-10-16 | ローム・アンド・ハース・エレクトロニック・マテリアルズ,エル.エル.シー. | Acid gold alloy plating solution |
JP5513784B2 (en) * | 2008-08-25 | 2014-06-04 | 日本エレクトロプレイテイング・エンジニヤース株式会社 | Hard gold plating solution |
JP5731802B2 (en) * | 2010-11-25 | 2015-06-10 | ローム・アンド・ハース電子材料株式会社 | Gold plating solution |
DE102010055143B4 (en) | 2010-12-18 | 2022-12-01 | Umicore Galvanotechnik Gmbh | Direct contact membrane anode for use in electrolytic cells |
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