TW201314353A - Composition of white photoresist - Google Patents

Abstract

A composition of white photoresist comprises titanium dioxide that is modified by silicon alkoxide salt, an alkali soluble resin, vinyl-contained monomers, a photo initiator and a solvent. By making use of the silicon alkoxide salt modified titanium dioxide, the present invention provides the composition of white photoresist with improved dispersion, stability, and resin compatibility so that an improved capability of development is provided when applied to a photolithographic process. The present invention also provides a white film that is formed by subjecting the composition of white photoresist to photolithographic process, thereby the film shows improved reflectivity.

Description

White photoresist composition

The present invention relates to a white photoresist composition suitable for use on a color filter in a reflective display, and more particularly to a white photoresist composition comprising titanium dioxide modified with a cerium alkoxide.

Generally, the display is distinguished according to the light source used, and can be classified into a reflective type, a transmissive type, and a transflective type. Because the reflective display relies on the external light source, that is, no backlight is needed, the power consumption can be reduced; however, the reflective display has a problem of poor reflectivity, resulting in insufficient overall brightness and contrast. Taking the full colorization method of electronic paper as an example, black and white display is often used with reflective color filter. At present, the way to improve brightness and contrast is mostly outside the red, green and blue blocks, and a white reflective color block is added. To improve the reflectivity of the reflective display, and then improve the overall brightness and contrast. At present, the white photoresist material used to prepare the white reflective color block is relatively small, and the film has a reflectance of only 40% or less (the film thickness is 1 micron or less). In order to improve the reflectance, it is necessary to increase the material. The amount of white pigment used, but with the increase of the proportion of white pigment, it causes the aggregation of the pigment to cause poor dispersibility, which leads to poor compatibility of the pigment and the resin, and even causes the material to be developed and patterned in the lithography process. difficult.

Japanese Patent Publication No. 4538484B2 discloses a photocurable thermosetting resin composition applied to a solder resist ink in a printed wiring board. The composition comprises an aromatic ring-free carboxylic acid, a photoinitiator, an epoxy compound, a rutile titanium dioxide, and a diluent, wherein the aromatic ring is not disclosed in Table 5 of the specification. The amount of the rutile-type titanium oxide added was 180 parts by weight based on 100 parts by weight of the carboxylic acid, and the reflectance optical brightness (Y value, CIE 1931) of the film formed from the composition was 76 to 79. However, the film formed by the composition can have a good reflectance mainly by increasing the amount of the rutile-type titanium dioxide used, but when the amount of the rutile-type titanium dioxide used is too high, the composition is stored stably. The sexual properties will be poor, and after 3 to 4 weeks, aggregation will occur, resulting in an increase in viscosity or an increase in the average particle size, and the lithography process will not proceed smoothly. Further, if the rutile-type titanium dioxide additive is reduced, The requirement for stability of the composition is satisfied, but the film formed by the composition has insufficient reflectance and is not suitable for use on a reflective display.

European Patent No. 1036831 A1 discloses a photocurable ink composition for ink jet printing comprising a colorant, an urethane oligomer, a single having three or more reactive functional groups Body, sensitizer and solvent. The coloring agent of this patent may be titanium dioxide, which is preferably mixed with an aqueous medium containing a dispersing agent before mixing with other ingredients to obtain a colored dispersion. From this, it is understood that the ink composition using titanium dioxide as a colorant does need to solve the dispersion problem, and the ink composition is a production apparatus which can be used for inkjet printing but cannot be applied to a color filter of a lithography process.

In view of the above, there is still a need to develop a white photoresist composition having better dispersibility, stability, and developability, which has a better reflectance when subsequently formed into a white film to meet the needs of the industry.

Accordingly, it is a first object of the present invention to provide a white photoresist composition having better dispersibility and stability which is preferred for use in a lithography process.

Thus, the white photoresist composition of the present invention comprises: a titanium oxide modified with an alkoxide salt, an alkali soluble resin, a vinyl-containing unsaturated monomer, a photoinitiator; and a solvent.

A second object of the invention is to provide a white film having a preferred reflectivity.

Thus, the white film of the present invention is formed by subjecting a white photoresist composition as described above to a lithography treatment.

The effect of the white photoresist composition of the present invention is that the dispersibility and stability of the white photoresist composition can be improved by using the titanium oxide modified by the cerium alkoxide, and when the white photoresist composition is subsequently applied to the lithography process. It can have better developability. Further, the white film formed of the white photoresist composition has a preferable reflectance.

The white photoresist composition of the present invention comprises a bismuth alkoxide-modified titanium dioxide, an alkali-soluble resin, a vinyl-containing unsaturated monomer, a photoinitiator and a solvent.

Preferably, the content of the bismuth alkoxide-modified titanium dioxide ranges from 4 wt% to 15 wt%, based on 100 wt% of the total of the white photoresist composition.

The bismuth alkoxide-modified titanium dioxide of the present invention is obtained by hydrolytic condensation reaction of titanium dioxide with a cerium alkoxide, and the cerium salt has the chemical formula (I) shown below:

In the formula (I), R ¹ represents hydrogen, a C ₁ -C ₁₈ alkyl group, an alkenyl group, an alkoxy group, an aryl group, an alkylene vinyl group, an alkylene group, an alkyl acrylate or a stretch alkyl group. a methacrylate, an alkylene nitrile, an alkyl isocyanate, an alkylene oxide group, a halogen, a hydroxyl group, or an isocyanate group; R ² represents a C ₁ -C ₆ alkyl group; and n represents 1 to An integer of 4.

The bismuth alkoxide-modified titanium dioxide is an amphoteric substance, which not only has good hydrophilicity, but also has lipophilicity, and is applied to a photosensitive photoresist composition of an oily formulation, and can be uniformly dispersed not only in the photosensitive photoresist. In the composition, and during the development process in the lithography process, it is advantageous for development.

Preferably, the oxime salt is selected from the group consisting of triethoxyvinyl silane, triethoxymethyl silane, tetraethoxy silane, tetramethoxy. Teramethoxysilane, trimethoxy silane, triethoxy silane, aminopropyltriethoxy silane, 3-methylpropenyloxypropyltrimethoxy 3-glycidoxy propyltrimethoxy silane, 3-(trimethoxysilyl)propyl methacrylate, 4-(triethoxydecane)butyronitrile [4-(triethoxysilyl) Bytronitrile], 3-(triethoxysilyl)propyl isocyanate, or a combination thereof.

Preferably, the bismuth alkoxide-modified titanium dioxide has an average particle diameter ranging from 0.1 μm to 1.0 μm in order to provide better stability and high reflectance for subsequent applications; more preferably, the average particle size ranges from 0.1 to 0.1 μm. Mm ~ 0.5μm. When the average particle diameter of the bismuth alkoxide-modified titanium oxide is less than 0.1 μm, the reflectance of the film may be insufficient when a white film is subsequently formed. When the average particle diameter of the bismuth alkoxide-modified titanium oxide is more than 1.0 μm, the surface roughness of the film may be excessively large when a white film is subsequently formed.

The titanium dioxide may be used singly or in combination. Preferably, the titanium dioxide (titanium dioxide) is selected from DuPont under the trade name Ti-Pure. R-706, Ti-Pure R-902+, Ti-Pure R-960; manufactured by Yazhong Industrial Co., Ltd., trade name CR50-2 (purity 95%, specific gravity 4.2), TTO-55B, TTO-55S (purity 95.5%, Pb<10 ppm, As<1 ppm); The trade name is TR-50; Yushun system, the trade name is RD-3.

Preferably, the hydrolysis condensation reaction has an operating temperature in the range of from 30 ° C to 150 ° C.

Preferably, a catalyst may be further added to the hydrolysis condensation reaction, and the catalyst is selected from an acidic catalyst or a basic catalyst.

The catalyst can be used directly in the reaction, or further mixed with a solvent and added to the reaction. The solvent is not particularly limited and can be uniformly mixed with the catalyst. Preferably, the acidic catalyst is selected from the group consisting of a nitric acid solution, a sulfuric acid solution, a hydrochloric acid solution, a hydrogen bromide solution, a hydrogen iodide solution, a perchloric acid (HClO ₄ ) solution, or the like. Preferably, the acidic catalyst is selected from a hydrochloric acid solution or a hydrogen iodide solution.

Preferably, the basic catalyst is selected from the group consisting of sodium hydroxide solution, potassium hydroxide solution, ammonia (NH ₃ ) solution, sodium amide (NaNH ₂ ), sodium hydrogencarbonate, sodium carbonate, potassium methoxide ( Potassium methoxide, CH ₃ OK), or a combination of these. More preferably, the basic catalyst is selected from a sodium hydroxide solution or a potassium hydroxide solution.

Preferably, the alkali soluble resin is contained in an amount ranging from 2.5 wt% to 6 wt%, based on 100 wt% of the total of the white photoresist composition.

Preferably, the alkali soluble resin is selected from the group consisting of a carboxylic acid group-containing unsaturated monomer, a vinyl group-containing unsaturated monomer, and a carboxylic acid group-containing unsaturated monomer, or a combination thereof.

Preferably, the carboxylic acid group-containing unsaturated monomer is selected from the group consisting of an acrylic compound, a methacrylic compound, or a combination thereof.

Preferably, the carboxylic acid group-containing unsaturated monomer is present in an amount of from 10 moles to 50 moles based on 100 moles of the total copolymer. More preferably, the carboxylic acid group-containing unsaturated monomer is contained in an amount of from 20 moles to 40 moles.

Preferably, the copolymer has a weight average molecular weight ranging from 1,000 to 100,000. More preferably, the copolymer has a weight average molecular weight ranging from 6,000 to 20,000.

Preferably, the vinyl-containing unsaturated monomer is selected from the group consisting of methyl acrylate, methyl methacrylate, benzyl acrylate, and phenyl methacrylate ( Benzyl methacrylate), ethyl acrylate, ethyl methacrylate, 2-hydroxyethyl acrylate, 2-hydroxyethyl methacrylate ), hydroxypropyl acrylate, hydroxylpropyl methacrylate, isobutyl methacrylate, isobutyl methacrylate, ethylene glycol dimethyl Ethylene glycol dimethacrylate, 1,4 butanediol diacrylate, diethylene glycol diacrylate, pentaerythritol triacrylate, ethoxy Ethoxylated pentaerythritol tetraacrylate, ethoxylated trimethylpropane triacrylate ( Ethoxylated trimethylpropane triacrylate), dipentaerythritol pentaacrylate, pentaerythritol tetraacrylate, dipentaerythritol hexaacrylate (trade name M400), or a combination thereof.

Preferably, the vinyl group-containing unsaturated monomer is contained in an amount ranging from 0.1 wt% to 1.5 wt% based on 100 wt% of the total of the white photoresist composition.

The photoinitiator may be used singly or in combination. Preferably, the photoinitiator is selected from (1) Ciba (trade name): ITX, DAROCURE TPO, IRGACURE 184, IRGACURE 369, T-481, OXE01, CGI242; (2) SHUANG BANG INDUSTRIAL CORP (trade name): SB-PI718. Among them, use this at the same time For OXE01 and CGI242, the white photoresist composition has high sensitivity and good adhesion to the subsequently formed white film.

Preferably, the photoinitiator is present in an amount ranging from 0.1 wt% to 1.2 wt% based on 100 wt% of the total of the white photoresist composition.

Preferably, the solvent is selected from the group consisting of cyclohexanone, glycol ether, ethylene glycol ether, ethylene glycol butyl ether, propylene glycol methyl ether acetate, ethyl-2-ethoxyethanol acetate, Polyethylene glycol monomethyl ether acetate (PGMEA), or a combination thereof.

Preferably, the solvent is contained in an amount ranging from 60% by weight to 88% by weight based on 100% by weight of the total of the white photoresist composition.

Preferably, the white photoresist composition has a solid content ranging from 10 wt% to 40 wt%; more preferably, the white photoresist composition has a solid content ranging from 12 wt% to 20 wt%. When the solid content of the white photoresist composition is higher than 40 wt%, the dispersibility and coating properties of the white photoresist composition are not good; when the solid content of the white photoresist composition is less than 10 wt When % is used, the reflectance of the white photoresist composition is not good.

The white photoresist composition of the present invention may be added with an additive as needed (e.g., coating properties) without affecting the efficacy of the present invention. The additive includes, but is not limited to, a surfactant, a dispersant, a flat agent, an antifoaming agent or a bonding aid, and the like.

The dispersant includes, but is not limited to, Solspherse 24000 SC GR (manufactured by Lubrizol) and the like.

Preferably, the additive is present in an amount ranging from 2 wt% to 4 wt%, based on the total amount of the white photoresist composition of 100 wt%.

The white photoresist composition can be prepared in a general manner, for example, a titanium oxide modified titanium oxide, an alkali soluble resin, a vinyl-containing unsaturated monomer, a photoinitiator, and a solvent are placed in a stirrer to be stirred. The white photoresist composition of the present invention can be obtained by uniformly mixing it into a solution state and adding an additive if necessary.

Alternatively, the white photoresist composition can be prepared by a general wet milling method, and the bismuth alkoxide-modified titanium dioxide is wetted in a ball mill (containing zirconium balls) in an organic solvent at normal temperature for 3 hours, and then alkali is added. A white photoresist composition of the present invention can be obtained by dissolving a resin, a vinyl-containing unsaturated monomer, a photoinitiator, a solvent, and a selective additive, and continuously grinding for several hours.

The white photoresist composition of the present invention can provide a film with high reflectivity to enhance overall brightness and contrast; in addition, the white photoresist composition has good pigment dispersibility and resin compatibility to conform to lithography The need for patterning in the process.

The white film of the present invention is formed by subjecting a white photoresist composition as described above to a lithography treatment.

Preferably, the white film has a reflectance in the range of 50% or more.

The white film of the present invention can be prepared by coating the white photoresist composition on a substrate by a coating method such as spin coating or cast coating, and then removing the solvent by prebake. A pre-baked coating film is formed. After pre-baking, the coating film is exposed to a mask, and the light used for exposure is preferably ultraviolet light, and then immersed in a developing solution (such as potassium hydroxide solution) at room temperature to remove unexposed. A part of the film is formed into a specific pattern, and after being washed with water and dried, and baked at a high temperature (for example, 220 ° C) for 30 minutes, a white film formed on the substrate can be obtained.

The white film can be applied to a color filter for a reflective display, which can improve the brightness of the reflective display, maintain an efficient display effect under various types of light sources, and can be achieved by utilizing existing mass production equipment. Production and mass production of new color filters.

The substrate may be a substrate generally used for a color filter in a reflective display. Preferably, the substrate may be selected from the group consisting of alkali-free glass, soda lime glass, and tempered glass (Pyrex glass) used in liquid crystal displays. Or quartz glass, or a black matrix, a red pattern, a green pattern, a blue pattern, or a combination of such glasses has been attached to the surface.

The invention is further described in the following examples, but it should be understood that these examples are for illustrative purposes only and are not to be construed as limiting.

<Example>

<Titanium dioxide modified by decyl alkoxide>

[Synthesis Example 1] Titanium dioxide modified with 3-(trimethoxydecane)propyl methacrylate

250 grams of methanol, 43.33 grams of titanium dioxide (trade name CR50-2, average particle size 200nm ~ 400nm) and 15.166 grams of titanium dioxide (trade name TTO-55S, average particle size 30nm ~ 50nm) placed in a circle In the bottom reaction flask, stirring was continued for 3 hours at normal temperature (25 ° C) to sufficiently wet the titanium dioxide of two different particle size ranges to obtain a first mixture. 100 grams of methanol and 5.83 grams of 3-(trimethoxydecane) propyl methacrylate were added to another round bottom reaction flask, followed by the addition of 12 grams of aqueous potassium hydroxide solution having a pH of 9 and continued. Stir for 30 minutes to obtain a second mixture. Next, the first mixture and the second mixture are mixed, and the mixture is continuously stirred at room temperature for 24 hours, and then aged at a high temperature (110 ° C) for 8 hours to carry out hydrolysis and condensation reaction of the mixture, and finally, at 50 ° C. The removal of methanol and 3-(trimethoxydecane)propyl methacrylate by concentration provides titanium dioxide modified with 3-(trimethoxydecane)propyl methacrylate.

[Synthesis Example 2] Titanium dioxide modified by triethoxy decane

250 grams of methanol, 43.33 grams of titanium dioxide (trade name CR50-2, average particle size 200nm ~ 400nm) and 15.166 grams of titanium dioxide (trade name TTO-55S, average particle size 30nm ~ 50nm) placed in a circle In the bottom reaction flask, stirring was continued for 3 hours at normal temperature (25 ° C) to sufficiently wet the titanium dioxide of two different particle size ranges to obtain a first mixture. 100 g of methanol and 2.915 g of triethoxy decane were added to another round bottom reaction flask, followed by the addition of 12 g of an aqueous solution of potassium hydroxide having a pH of 9, and stirring was continued for 30 minutes to obtain a second mixture. . Next, the first mixture and the second mixture are mixed, and the mixture is continuously stirred at room temperature for 24 hours, and then aged at a high temperature (110 ° C) for 8 hours to carry out hydrolysis and condensation reaction of the mixture, and finally, at 5 ° C. The titanium dioxide modified by triethoxy decane is obtained by removing methanol and triethoxy decane by concentration.

[Synthesis Example 3] Alkali soluble resin

Weighing 29.07 grams of PGMEA, 71.03 grams of benzyl methacrylate (BzMA), 5.80 grams of methyl methacrylate (MMA), 14.80 grams of methacrylic acid (MAA) ), 6.10 g of 2-hydroxyethyl methacrylate (2-HEMA), 0.67 g of 1-dodecanethiol, and 0.67 g of 2,2'-azo diiso Nitrile (2,2'-azobis-isobutyronitrile, AIBN for short) was placed in an Erlenmeyer flask, stirred and mixed to form a first component. Next, weigh 116.29 grams of PGMEA in a 500 ml separation reaction tank, and set up a stirrer, a condenser tube and a temperature controller, and pass nitrogen gas, while stirring and heating to 100 ° C, after constant temperature, the above The first batch is dropped into the reaction tank at a rate of about 2.5 cc/min. After the reaction is completed at 100 ° C for 6 hours, the heater and nitrogen are turned off, the product is taken out from the reaction tank, and left to stand for cooling. An alkali-soluble resin having a solid content of 36.46 wt% is obtained.

<White photoresist composition and white film>

[Example 1]

1.25 kg of zirconium spheres having a diameter of 3 mm and 54 g of titanium dioxide modified with 3-(trimethoxydecane)propyl methacrylate of Synthesis Example 1, 280 g of PGMEA were added using a 4 kg ball mill. And 16.2 g of a dispersant (trade name: Solspherse 24000), which was ground in a ball mill for 48 hours, followed by the addition of 93.3 g of the alkali soluble resin of Synthesis Example 3, 7 g of dipentaerythritol hexaacrylate (Model M400), 2.92 g. The photoinitiator (trade name CGI242), 2.92 g of a photoinitiator (trade name: OXE01), and 117 g of PGMEA were continuously milled for 24 hours to obtain a white photoresist composition of the present invention.

The prepared white photoresist composition was spin-coated at 500 rpm for 5 seconds and spin at 800 rpm for 15 seconds by spin coating, and the white photoresist composition was coated on a transparent glass substrate. The film was pre-baked at 90 ° C for 1 minute, and then exposed to a UV light source having an exposure energy of 72 mJ/cm ² , and the film was exposed to a mask, and then developed with a developing solution (purchased from Changchun Chemical Co., trade name: CD706). The unexposed portion will be washed away by the developer, and the exposed portion is washed with water and dried, and then baked at a high temperature (220 ° C) for 30 minutes to obtain a white film of the present invention. The results of evaluation of each test item of the white photoresist composition and the white film are shown in Table 1.

[Embodiment 2]

1.25 kg of zirconium spheres having a diameter of 3 mm and 54 g of triethoxy decane-modified titanium dioxide of Synthesis Example 2, 280 g of PGMEA and 16.2 g of dispersant (trade name) were added using a 4 kg ball mill tank. For Solspherse 24000), it was ground and dispersed by a ball mill for 48 hours, followed by the addition of 93.3 g of the alkali soluble resin of Synthesis Example 3, 7 g of dipentaerythritol hexaacrylate (trade name M400), and 2.92 g of a photoinitiator (trade name). It was CGI242), 2.92 g of a photoinitiator (trade name: OXE01), and 117 g of PGMEA, and was continuously ground for 24 hours to obtain a white photoresist composition of the present invention.

The prepared white photoresist composition was spin-coated at 500 rpm for 5 seconds and spin at 800 rpm for 15 seconds by spin coating, and the white photoresist composition was coated on a transparent glass substrate. Pre-baked at 90 ° C for 1 minute, followed by exposure to a UV light source with an exposure energy of 72 mj / cm ² , and then developed with a developer (purchased from Changchun Chemical, trade name CD706). The unexposed portion will be washed away by the developer, and the exposed portion is washed with water and dried, and then baked at a high temperature (220 ° C) for 30 minutes to obtain a white film of the present invention. The results of evaluation of each test item of the white photoresist composition and the white film are shown in Table 1.

[Comparative Example 1]

Use a 4 kg ball mill jar to add 1.25 kg of zirconium spheres with a diameter of 3 mm, and 40 g of titanium dioxide (trade name CR50-2) and 14 g of titanium dioxide (trade name TTO-55S), 280 g of PGMEA and 16.2 g of a dispersant (trade name: Solspherse 24000), which was ground and dispersed by a ball mill for 48 hours, followed by the addition of 93.3 g of the alkali-soluble resin of Synthesis Example 3, 7 g of dipentaerythritol hexaacrylate (trade name M400), and 2.92 g. The photoinitiator (trade name CGI242), 2.92 g of a photoinitiator (trade name: OXE01), and 117 g of PGMEA were continuously milled for 24 hours to obtain a white photoresist composition of the present invention.

The prepared white photoresist composition was spin-coated at 500 rpm for 5 seconds and spin at 800 rpm for 15 seconds by spin coating, and the white photoresist composition was coated on a transparent glass substrate. Pre-baked at 90 ° C for 1 minute, followed by exposure to a UV light source with an exposure energy of 72 mj / cm ² , and then developed with a developer (purchased from Changchun Chemical, trade name CD706) The unexposed portion will be washed away by the developer, and the exposed portion is washed with water and dried, and then baked at a high temperature (220 ° C) for 30 minutes to obtain a white film of the present invention. The results of evaluation of each test item of the white photoresist composition and the white film are shown in Table 1.

【Test items】

1. Developability measurement:

The white film of Example 1, Example 2 and Comparative Example 1 was observed for the exposed portion and the unexposed portion with a 100-fold optical microscope, wherein the unexposed portion was completely washed, and the developability was evaluated as excellent (O); A small number of black spots (less than 1 micron) are rated as acceptable (△); if there are many black spots or black blocks (greater than 1 micron), they are rated as bad (X).

2. Dispersion measurement:

The white films of Example 1, Example 2 and Comparative Example 1 were observed on the surface of the pattern by a 200-fold optical microscope, wherein if it was a uniform film layer, it was rated as excellent (O); if there were a few cracks or unevenness ( If it is less than 10% of the pattern area, it is rated as (△); if most of the surface is uneven or cracked (greater than 10% of the pattern area), it is rated as bad (X).

3. Reflectance measurement: UV spectrometer, model: PERKIN ELMER UV/VIS/NIR Spectrometer Lambda 900.

4. Stability measurement:

The white photoresist compositions of Example 1, Example 2 and Comparative Example 1 were subjected to viscosity measurement and recorded. The white photoresist compositions of Example 1, Example 2 and Comparative Example 1 were placed at -10 ° C for 7 days, and after 7 days, they were taken out and placed at room temperature for 1 hour, and then the viscosity was measured. A total of 28 days were measured, and then the original viscosity of the compositions was compared and the viscosity change range was calculated. If the viscosity variation range is less than 5%, it indicates that the stability is excellent (O); if the viscosity varies from 5% to 10%, it indicates that the stability is acceptable (△); if the viscosity varies by more than 10%, it indicates that the stability is not Good (X).

5. Average particle size measurement: high concentration laser nanoparticle zeta potential and molecular weight meter, model: Malvern Zetasizer Nano ZS.

It can be seen from the test results of Example 1 and Example 2 in Table 1 that the white photoresist composition uses titanium oxide modified by decyl alcohol to make the white photoresist composition have better dispersibility and developability. And the white films formed by the white photoresist compositions have reflectances of 50.38% and 50.87%, respectively, indicating that the bismuth alkoxide-modified titanium dioxide does not aggregate, thereby making the white photoresist composition It has better dispersibility, and then forms a white film with high reflectivity. Furthermore, since the white photoresist composition has better dispersibility, the stability of storage can be improved; in contrast, the white photoresist composition of Comparative Example 1 has Poor developability, dispersibility and stability, and the film reflectance formed is only 39.65%, and its efficacy is inferior to those of the examples, thereby demonstrating that the white photoresist composition of the present invention is used through The bismuth alkoxide-modified titanium dioxide does achieve the object of the present invention.

The above is only the preferred embodiment of the present invention, and the scope of the invention is not limited thereto, that is, the simple equivalent changes and modifications made by the scope of the invention and the description of the invention are All remain within the scope of the invention patent.

Claims (10)

A white photoresist composition comprising: a titanium oxide modified by a decyl salt; an alkali soluble resin; a vinyl-containing unsaturated monomer; a photoinitiator; and a solvent. The white photoresist composition according to claim 1, wherein the bismuth alkoxide-modified titanium dioxide is obtained by subjecting titanium dioxide to a hydrolytic condensation reaction with a monohydric alkoxide, and the decoxide has the following The chemical formula (I) shown: In the formula (I), R ¹ represents hydrogen, a C ₁ -C ₁₈ alkyl group, an alkenyl group, an alkoxy group, an aryl group, an alkylene vinyl group, an alkylene group, an alkyl acrylate or a stretch alkyl group. a methacrylate, an alkylene nitrile, an alkyl isocyanate, an alkylene oxide group, a halogen, a hydroxyl group, or an isocyanate group; R ² represents a C ₁ -C ₆ alkyl group; and n represents 1 to An integer of 4. The white photoresist composition according to claim 1, wherein the bismuth alkoxide-modified titanium dioxide has an average particle diameter ranging from 0.1 μm to 1.0 μm. The white photoresist composition according to claim 2, wherein the oxime salt is selected from the group consisting of triethoxyvinyl decane, triethoxymethyl decane, tetraethoxy decane, and tetramethyl Oxy decane, trimethoxy decane, triethoxy decane, aminopropyl triethoxy decane, 3-methyl propylene oxypropyl trimethoxy decane, 3-(trimethoxy decane) propyl group A acrylate, 4-(triethoxydecane) butyronitrile, 3-(triethoxydecane) propyl isocyanate, or a combination thereof. The white photoresist composition according to claim 1, wherein the content of the bismuth alkoxide-modified titanium oxide is 4 wt% based on 100 wt% of the total amount of the white photoresist composition. ~15 wt%. The white photoresist composition according to claim 1, wherein the white photoresist composition has a solid content ranging from 10 wt% to 40 wt%. The white photoresist composition according to claim 1, wherein the alkali-soluble resin is selected from the group consisting of a carboxylic acid-containing unsaturated monomer, a carboxylic acid-containing unsaturated monomer, and a vinyl-containing unsaturated group. a copolymer of monomers, or a combination of these. The white photoresist composition according to the first application of the patent application, wherein the vinyl-containing unsaturated monomer is selected from the group consisting of methyl acrylate, methyl methacrylate, phenyl acrylate, and phenyl methacrylate. Ester, ethyl acrylate, ethyl methacrylate, 2-hydroxyethyl acrylate, 2-hydroxyethyl methacrylate, hydroxypropyl acrylate, hydroxypropyl methacrylate, isobutyl acrylate, Isobutyl methacrylate, ethylene glycol dimethacrylate, 1,4-butanediol diacrylate, diethylene glycol diacrylate, pentaerythritol triacrylate, ethoxylated pentaerythritol tetraacrylate, ethoxy A trimethylpropane triacrylate, dipentaerythritol pentaacrylate, pentaerythritol tetraacrylate, dipentaerythritol hexaacrylate, or a combination thereof. A white film formed by subjecting a white photoresist composition according to any one of claims 1 to 8 to a lithography treatment. The white film according to claim 9, wherein the white film has a reflectance in a range of 50% or more.