TW201300768A - Method for setting up inspection area and X-ray inspection system - Google Patents

Method for setting up inspection area and X-ray inspection system Download PDF

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TW201300768A
TW201300768A TW101116754A TW101116754A TW201300768A TW 201300768 A TW201300768 A TW 201300768A TW 101116754 A TW101116754 A TW 101116754A TW 101116754 A TW101116754 A TW 101116754A TW 201300768 A TW201300768 A TW 201300768A
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inspection
ray
image
visible light
substrate
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Kiyoshi Murakami
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Omron Tateisi Electronics Co
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    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • G01N23/02Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by transmitting the radiation through the material
    • G01N23/04Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by transmitting the radiation through the material and forming images of the material
    • G01N23/046Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by transmitting the radiation through the material and forming images of the material using tomography, e.g. computed tomography [CT]
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2223/00Investigating materials by wave or particle radiation
    • G01N2223/40Imaging
    • G01N2223/419Imaging computed tomograph

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Abstract

This invention is to provide an X-ray inspecting method capable of precisely setting up an inspected area of an object to be inspected, by utilizing an X-ray image for inspecting the object to be inspected. In an X-ray inspecting device for inspecting a object to be inspected, a method for setting up an inspection area of the object to be inspected is comprised of: step (S104), photographing a visible image in a first area including the object to be inspected; step (S112), photographing an X-ray image in a second area including the object to be inspected; step (S118), displaying all of the visible image in the first area and the X-ray image in the second area together with a mark for showing the position of the object to be inspected at the same time based on the condition that position and the magnification of the visible image and the X-ray image are in unison; step (S120), receiving an input of an confirmation related to the position of the mark of the displayed object to be inspected and the position of the X-ray image, in order to confirm the inspection area.

Description

檢查區域設定方法及X光檢查系統 Inspection area setting method and X-ray inspection system

本發明係有關一種檢查區域設定方法及X光檢查系統,更特定來說,係關於一種用於檢查印刷基板與電路零件之間的接合良否等之檢查區域設定方法及X光檢查系統。 The present invention relates to an inspection region setting method and an X-ray inspection system, and more particularly to an inspection region setting method and an X-ray inspection system for inspecting the bonding between a printed substrate and a circuit component.

自昔至今,為了對焊接在印刷基板(以下,亦單稱「基板」)的零件採用以非破壞檢查方式來檢查焊接狀態良否等,經常使用X光CT(Computed Tomography)。在X光CT中,由多個方向以X光拍攝對象物,取得顯示X光被吸收程度(衰減量)的分布之多張透視影像。接著,依據多張透視影像進行再構成處理,而得到檢查對象的X光吸收係數的分布之二維資料或三維資料。 X-ray CT (Computed Tomography) has been used for the purpose of checking the welding state by a non-destructive inspection method for parts soldered on a printed circuit board (hereinafter also referred to as "substrate"). In the X-ray CT, an object is imaged by X-rays in a plurality of directions, and a plurality of fluoroscopic images showing a distribution of the degree of absorption (attenuation amount) of X-rays are obtained. Then, the reconstruction processing is performed based on the plurality of fluoroscopic images, and two-dimensional data or three-dimensional data of the distribution of the X-ray absorption coefficient of the inspection object is obtained.

在此種檢查中,會有針對多個同一形狀的基板,分別相繼檢查同一位置的情況,在此種情況下,採用作為定位之基準的被量測物,對檢查裝置教示檢查位置(teaching,指示)。接著,針對被教示的檢查位置,相繼生成同種的被量測物之X光透視影像,依據該透視影像針對各被量測物進行檢查。 In such an inspection, there are cases in which a plurality of substrates having the same shape are successively inspected at the same position. In this case, the inspection object is used as a reference for positioning, and the inspection position is taught to the inspection device (teaching, Instructions). Next, an X-ray image of the same type of measured object is successively generated for the inspected inspection position, and each of the measured objects is inspected based on the fluoroscopic image.

關於此種檢查的技術,自昔至今揭示許多種。例如,專利文獻1或專利文獻2揭示的技術,在教示中接受檢查位置的輸入時,顯示被量測物的可見光影像。 The techniques for such inspections have revealed many species since the past. For example, in the technique disclosed in Patent Document 1 or Patent Document 2, when an input of an inspection position is accepted in the teaching, a visible light image of the object to be measured is displayed.

關於基板,為了檢查上述零件的焊接狀態良否等,不僅是零件的位置,也必須針對用於指定零件之焊接位 置等設為檢查對象的位置或形狀之資訊進行設定。 Regarding the substrate, in order to check whether the welding condition of the above-mentioned parts is good or not, not only the position of the part but also the welding position for specifying the part Set the information such as the position or shape of the inspection object.

然而,以往的檢查裝置中,當基板上安裝有如BGA(Ball Grid Array)那樣焊接部分被零件本體掩蓋而無法看見的零件時,則焊接位置等資訊輸入之正確性會受使用者經驗大幅左右,因此,存在有檢查之精確度受使用者經驗大幅左右的問題。又,即使是如QFP(Quad Flat Package)的包裝零件,使用者也必須針對每一零件逐一指定存有多個焊接位置,因此存在有使用者必須進行繁雜作業的問題。 However, in the conventional inspection apparatus, when a part such as a BGA (Ball Grid Array) in which the welded portion is covered by the part body and is invisible is attached to the substrate, the accuracy of the information input such as the welding position is greatly affected by the user experience. Therefore, there is a problem that the accuracy of the inspection is greatly affected by the user experience. Further, even in the case of a packaging component such as a QFP (Quad Flat Package), the user must specify a plurality of welding positions for each component one by one, and thus there is a problem that the user has to perform complicated work.

因此,將如上述的X光CT作為線內檢查裝置使用的情況下,為了改善上述問題點,已知會針對存有的多個基板之檢查處,教示檢查區域及檢查邏輯。例如,專利文獻3(日本特開2010-160071號公報)揭示有,當使用者被教示零件的外型及位置時,則進行CT再構成,並擷取球(電極位置)電極位置。 Therefore, in the case where the above-described X-ray CT is used as the in-line inspection device, in order to improve the above problem, it is known to inspect the inspection region and the inspection logic for the inspection sites of the plurality of substrates present. For example, Patent Document 3 (JP-A-2010-160071) discloses that when the user is taught the appearance and position of the component, the CT is reconfigured and the ball (electrode position) electrode position is extracted.

又,專利文獻4(日本特開2006-220640號公報)揭示一種技術,該技術係為由和被檢體之保持機構及X光源同軸方向以要拍攝的CCD照相機進行拍攝,不需要對X光源進行對位且無錯位,並可正確地檢測,其中該保持機構可相對X光源及檢測器旋轉。 Further, Patent Document 4 (JP-A-2006-220640) discloses a technique of photographing a CCD camera to be photographed in a coaxial direction with a holding mechanism of a subject and an X-ray source, without requiring an X-ray source. The alignment is performed without misalignment and can be detected correctly, wherein the retention mechanism is rotatable relative to the X-ray source and detector.

[先前技術文獻] [Previous Technical Literature] [專利文獻] [Patent Literature]

[專利文獻1]日本特開2007-218784號公報 [Patent Document 1] Japanese Patent Laid-Open Publication No. 2007-218784

[專利文獻2]日本特開2007-127490號公報 [Patent Document 2] Japanese Patent Laid-Open Publication No. 2007-127490

[專利文獻3]日本特開2010-160071號公報 [Patent Document 3] Japanese Patent Laid-Open Publication No. 2010-160071

[專利文獻4]日本特開2006-220640號公報 [Patent Document 4] Japanese Laid-Open Patent Publication No. 2006-220640

然而,例如日本特開2010-160071號公報揭示,在可見光影像中以矩形等顯示檢查區域的位置之構造中,未必顯示給使用者充足的資訊用以判斷檢查位置是否正確,檢查的精確度仍然取決於使用者的經驗。 However, for example, Japanese Laid-Open Patent Publication No. 2010-160071 discloses that in a configuration in which a position of an inspection region is displayed in a rectangular shape or the like in a visible light image, sufficient information is not necessarily displayed to the user to determine whether the inspection position is correct, and the accuracy of the inspection is still Depends on the user's experience.

又,基板檢查中,除了基板表面,也可能檢查背面,此時,在正確地進行表面、背面的對位並將其重疊後,若使用者未確認檢查對象及其位置,可能會將錯誤的區域設定成檢查區域。 Further, in the substrate inspection, the back surface may be inspected in addition to the surface of the substrate. In this case, after the surface and the back surface are correctly aligned and overlapped, if the user does not confirm the inspection target and its position, the wrong area may be obtained. Set to the inspection area.

又,日本特開2006-220640號公報揭示的技術中,將穿透影像與CCD影像以同軸拍攝,並將表面影像及內部影像合併顯示。如此做的前提是用於解析,而非為進行自動檢查的檢查位置設定。又,舉例而言,如印刷基板,當對象物大於照相機的視野與X光檢查機的視野時,則無法設定檢查區域。 Further, in the technique disclosed in Japanese Laid-Open Patent Publication No. 2006-220640, the through image and the CCD image are taken coaxially, and the surface image and the internal image are combined and displayed. The premise of doing this is for parsing, not for checking the location of the auto-check. Further, for example, in the case of a printed substrate, when the object is larger than the field of view of the camera and the field of view of the X-ray inspection machine, the inspection area cannot be set.

本發明係鑑於所述之實情而開發者,其目的在於提供一種檢查區域設定方法及X光檢查系統,以在使用X光影像檢查被檢查對象的情況下,可以良好精度設定被檢查對象的檢查區域。 The present invention has been made in view of the above-described circumstances, and an object of the present invention is to provide an inspection area setting method and an X-ray inspection system for setting an inspection of an object to be inspected with good precision when an object to be inspected is inspected using an X-ray image. region.

本發明之其他目的在於提供一種檢查區域設定方法、X光檢查裝置及X光檢查程式,當被檢查物係安裝有電子零件的基板時,可正確且容易輸入關於安裝零件與基板的連接配線之資訊。 Another object of the present invention is to provide an inspection area setting method, an X-ray inspection apparatus, and an X-ray inspection program. When a substrate of an electronic component is mounted on an object to be inspected, connection wiring for the mounting part and the substrate can be accurately and easily input. News.

依據本發明的其中一個態樣,係一種檢查區域設定方法,係在使用X光執行被檢查物之檢查的X光檢查裝置中,設定前述被檢查對象之檢查區域的檢查區域設定方法,其具備以下步驟:對包含被檢查物之檢查對象的第1區域之可見光影像,進行拍攝的步驟;對包含被檢查物之檢查對象的第2區域,進行X光影像拍攝的步驟;將第1區域的可見光影像及前述第2區域的X光影像,在位置及倍率一致的情況下,與表示前述檢查對象位置的標記一起同時顯示之步驟;以及針對顯示之檢查對象的標記位置及X光影像的檢查對象位置,接受確認的輸入而確定檢查區域的步驟。 According to one aspect of the present invention, in an X-ray inspection apparatus that performs inspection of an inspection object using X-rays, an inspection area setting method for setting an inspection area of the object to be inspected is provided. The following steps: a step of capturing a visible light image of the first region including the object to be inspected; a step of performing X-ray image capturing on the second region including the object to be inspected; and the first region The visible light image and the X-ray image of the second region are displayed simultaneously with the mark indicating the position of the inspection target when the position and the magnification are the same; and the inspection of the mark position and the X-ray image of the inspection object to be displayed The position of the object, the step of accepting the input of the confirmation to determine the inspection area.

較佳為,被檢查物係配置有多個電子零件的基板,且可見光影像拍攝手段係包含拍攝基板之表面側的第1可見光影像及背面側的第2可見光影像之步驟;同時顯示之步驟係包含將第1或第2可見光影像之任一者與X光影像在位置及倍率一致的情況下進行顯示之步驟;及確定步驟係包含確定表面側及背面側各自之檢查區域之步驟。 Preferably, the object to be inspected is a substrate in which a plurality of electronic components are disposed, and the visible light image capturing means includes a step of capturing a first visible light image on the surface side of the substrate and a second visible light image on the back side; and simultaneously displaying the steps The step of displaying the first or second visible light image when the X-ray image is aligned with the position and the magnification; and the determining step includes the step of determining the respective inspection areas on the front side and the back side.

較佳為,X光影像係包含依據從多數透視方向拍攝之多數X光影像所再構成之被檢查物的檢查對象的區域之再構成影像。 Preferably, the X-ray image includes a reconstructed image of a region to be inspected by the object to be inspected by a plurality of X-ray images captured from a plurality of perspective directions.

較佳為,再構成影像係在第1及第2可見光影像中,包含成為死角的檢查對象之部分之與基板平行之剖面的斷層影像。 Preferably, the reconstructed image includes a tomographic image of a cross section parallel to the substrate which is a portion of the inspection target which is a blind spot in the first and second visible light images.

較佳為,X光影像係被檢查物的X光穿透影像。 Preferably, the X-ray image is an X-ray image of the object to be inspected.

依據本發明的其他態樣,係使用X光檢查被檢查物之X光檢查系統,其具備:記憶手段,用於儲存指定之檢查物的檢查對象位置之資訊;可見光影像拍攝手段,拍攝包含被檢查物之檢查對象的第1區域之可見光影像;X光影像拍攝手段,對包含被檢查物之檢查對象的第2區域,拍攝X光影像;輸出手段,將第1區域的可見光影像和第2區域的X光影像,在位置及倍率一致的情況下進行顯示,並且依據儲存在記憶手段的資訊而同時顯示表示檢查對象位置的標記;輸入手段,針對所顯示之檢查對象的標記位置及X光影像中的檢查對象位置,接受確認的輸入;及控制手段,依據輸入,將用於特定經確定的檢查區域之設定資訊儲存於記憶手段。 According to another aspect of the present invention, an X-ray inspection system using an X-ray inspection object includes: a memory means for storing information of a position of an inspection object of a designated inspection object; and a visible light image capturing means for photographing including The visible light image of the first region of the object to be inspected; the X-ray image capturing means captures the X-ray image of the second region including the object to be inspected; and the output means, the visible light image of the first region and the second image The X-ray image of the area is displayed when the position and the magnification are the same, and the mark indicating the position of the inspection object is simultaneously displayed according to the information stored in the memory means; the input means is for the marked position of the displayed inspection object and the X-ray The position of the inspection object in the image, the input for accepting the confirmation; and the control means, according to the input, the setting information for the specific determined inspection area is stored in the memory means.

較佳為,被檢查物係配置有多個電子零件的基板;可見光影像拍攝手段係拍攝基板之表面側的第1可見光影像及背面側的第2可見光影像;輸出手段係將第1或第2可見光影像之任一者與X光影像在位置及倍率一致的情況下進行顯示;及控制手段,係將用於特定表面側及背面側各自之檢查區域之設定資訊儲存於記憶手段。 Preferably, the object to be inspected is a substrate on which a plurality of electronic components are arranged; the visible light image capturing means is to capture the first visible light image on the surface side of the substrate and the second visible light image on the back side; and the output means is the first or second Any one of the visible light images is displayed when the X-ray image is in the same position and magnification; and the control means stores the setting information for the inspection areas of the specific surface side and the back side in the memory means.

較佳為,X光影像係包含依據從多數透視方向拍攝之多數X光影像所再構成之被檢查物的檢查對象的區域之再構成影像。 Preferably, the X-ray image includes a reconstructed image of a region to be inspected by the object to be inspected by a plurality of X-ray images captured from a plurality of perspective directions.

較佳為,再構成影像係在第1及第2可見光影像中,包含成為死角的檢查對象之部分之與基板平行之剖面的斷層影像。 Preferably, the reconstructed image includes a tomographic image of a cross section parallel to the substrate which is a portion of the inspection target which is a blind spot in the first and second visible light images.

較佳為,X光影像係被檢查物的X光穿透影像。 Preferably, the X-ray image is an X-ray image of the object to be inspected.

依據此發明,因為將X光影像與可見光影像重疊並顯示檢查位置之故,使用者可掌握檢查對象物與檢查位置之關係,對使用者具有易於視覺辨識的效果。 According to the invention, since the X-ray image is superimposed on the visible light image and the inspection position is displayed, the user can grasp the relationship between the inspection object and the inspection position, and has an effect of being easily visually recognized by the user.

[實施發明之形態] [Formation of the Invention]

以下參照圖示說明關於本發明的實施形態。以下說明中,同一部分附加同一符號。其名稱及機能亦相同。因此,不再就彼等重複詳細說明。又,本說明書中,X軸、Y軸和Z軸視為互相垂直的軸。 Embodiments of the present invention will be described below with reference to the drawings. In the following description, the same reference numerals are attached to the same parts. Its name and function are also the same. Therefore, the detailed description will not be repeated for them. Further, in the present specification, the X-axis, the Y-axis, and the Z-axis are regarded as axes perpendicular to each other.

(構造概略) (structure summary)

參照第1圖,說明本實施形態之X光檢查裝置100的構造。第1圖係本實施形態之X光檢查裝置100的概略方塊圖。 The structure of the X-ray inspection apparatus 100 of the present embodiment will be described with reference to Fig. 1 . Fig. 1 is a schematic block diagram of an X-ray inspection apparatus 100 of the present embodiment.

X光檢查裝置100具備:輸出X光18的X光源10;X光檢測器23;影像取得控制機構30;及移動檢查對象1的位置之檢查對象驅動機構110。又,X光檢查裝置100具備:輸入部40;輸出部50;X光源控制機構60;位移計114;光學照相機116(未圖示);檢查對象位置控制機構120;演算部70;及記憶部90。又,X光檢查裝置100具備檢查對象資料庫(以下稱為「檢查對象DB」)200,其用於依據CAD(Computer Aided Design)資料等,儲存安裝於作為檢查對象之基板的電子零件之型號、零件本身在基板的配置位置、配置方向、零件尺寸、基板內焊接用的電極墊配置(亦即,被焊接之位置的配置)等相關資訊。 The X-ray inspection apparatus 100 includes an X-ray source 10 that outputs X-rays 18, an X-ray detector 23, an image acquisition control unit 30, and an inspection target drive mechanism 110 that moves the position of the inspection object 1. Further, the X-ray inspection apparatus 100 includes an input unit 40, an output unit 50, an X-ray source control unit 60, a displacement meter 114, an optical camera 116 (not shown), an inspection target position control unit 120, an arithmetic unit 70, and a memory unit. 90. Further, the X-ray inspection apparatus 100 includes an inspection target database (hereinafter referred to as "inspection target DB") 200 for storing the model number of the electronic component mounted on the substrate to be inspected based on CAD (Computer Aided Design) data or the like. The information about the placement position of the part itself, the arrangement direction, the part size, and the electrode pad arrangement for soldering in the substrate (that is, the arrangement of the position to be soldered).

又,關於位移計114與光學照相機116,將於之後詳細說明。 Further, the displacement meter 114 and the optical camera 116 will be described in detail later.

檢查對象1係配置於X光源10與X光檢測器23之間。本實施形態中,檢查對象1係設為安裝有零件的電路基板。又,第1圖中,由下按順序,設置有X光源10、檢查對象1、X光檢測器23,但由X光源的維護性觀點,亦可由下按順序,以X光檢測器23、檢查對象1、X光源10的次序進行配置。 The inspection object 1 is disposed between the X light source 10 and the X-ray detector 23. In the present embodiment, the inspection object 1 is a circuit board on which components are mounted. Further, in the first drawing, the X-ray source 10, the inspection object 1, and the X-ray detector 23 are provided in the order of the lower order, but the X-ray detector 23 may be used in the order of maintenance of the X-ray source. The order of the inspection object 1 and the X light source 10 is configured.

X光源10係由X光源控制機構60控制,對檢查對象1照射X光18。本實施形態中,檢查對象1係設為安裝電路零件的基板。雖然未特別限制,惟X光源10亦可依據來自外部的控制,作成可使焦點位置在目標上移動的掃描式X光源。 The X light source 10 is controlled by the X-ray source control unit 60, and irradiates the X-ray 18 to the inspection object 1. In the present embodiment, the inspection object 1 is a substrate on which circuit components are mounted. Although not particularly limited, the X-ray source 10 can also be made to scan a X-ray source that can move the focus position on the target in accordance with control from the outside.

檢查對象1係由檢查對象驅動機構110移動。關於檢查對象驅動機構110的具體構造將於後述。檢查對象位置控制機構120依據演算部70的指示,控制檢查對象驅動機構110的動作。 The inspection object 1 is moved by the inspection object drive mechanism 110. The specific structure of the inspection target drive mechanism 110 will be described later. The inspection target position control unit 120 controls the operation of the inspection target drive mechanism 110 in accordance with an instruction from the calculation unit 70.

X光檢測器23係為,檢測從X光源10輸出並穿透檢查對象1的X光並予以影像化之二維X光檢測器。作為X光檢測器23,可使用I.I.(Image Intensifier)管或FPD(Flat Panel Detector,平板檢測器)。從設置空間的觀點來看,X光檢測器23中較佳為使用FPD。又,X光檢測器23較佳為高敏感度,特佳為使用CdTe的直接變換方式之FPD,俾可在線內檢查中使用。 The X-ray detector 23 is a two-dimensional X-ray detector that detects X-rays output from the X-ray source 10 and penetrates the inspection object 1 and visualizes them. As the X-ray detector 23, an I.I. (Image Intensifier) tube or an FPD (Flat Panel Detector) can be used. From the viewpoint of the installation space, it is preferable to use the FPD in the X-ray detector 23. Further, the X-ray detector 23 is preferably of high sensitivity, and is particularly preferably an FPD using a direct conversion method of CdTe, which can be used in an in-line inspection.

影像取得控制機構30係包含檢測器驅動控制機構32 與影像資料取得部34。檢測器驅動控制機構32依據來自演算部70的指示,控制X光檢測器22的動作而移動X光檢測器23。影像資料取得部34取得由演算部70指定之X光檢測器23的影像資料。 The image acquisition control mechanism 30 includes a detector drive control mechanism 32. And the image data acquisition unit 34. The detector drive control unit 32 controls the operation of the X-ray detector 22 to move the X-ray detector 23 in accordance with an instruction from the calculation unit 70. The video data acquisition unit 34 acquires video data of the X-ray detector 23 designated by the calculation unit 70.

輸入部40係用於接受來自使用者的輸入指示等之操作輸入機器。輸出部50係將量測結果等向外部輸出的裝置。本實施形態中,輸出部50係用於顯示由演算部70構成之X光影像等的顯示器。 The input unit 40 is an operation input device for accepting an input instruction from a user or the like. The output unit 50 is a device that outputs a measurement result or the like to the outside. In the present embodiment, the output unit 50 is a display for displaying an X-ray image or the like constituted by the calculation unit 70.

亦即,使用者可經由輸入部40而執行各式各樣的輸入,藉由演算部70的處理而得到之各種演算結果顯示於輸出部50。顯示於輸出部50的影像除了用於之後說明的教示處理外,亦可輸出以便使用者透過目視判斷良否,或者,輸出以便作為之後說明的良否判斷部78的良否判斷結果。 In other words, the user can execute various types of input via the input unit 40, and various calculation results obtained by the processing of the calculation unit 70 are displayed on the output unit 50. The video displayed on the output unit 50 may be outputted so that the user can judge whether it is good or not by visual observation, or output as a result of the quality determination of the quality determination unit 78 described later.

X光源控制機構60包含控制電子束輸出的電子束控制部62。電子束控制部62接受來自演算部70的X光焦點位置、X光能量(管電壓、管電流)之指定。指定的X光能量因檢查對象的構造而異。 The X-ray source control unit 60 includes an electron beam control unit 62 that controls the output of the electron beam. The electron beam control unit 62 receives the X-ray focus position and the X-ray energy (tube voltage, tube current) from the calculation unit 70. The specified X-ray energy varies depending on the structure of the inspection object.

演算部70執行儲存於記憶部90的程式96來控制各部,又,執行規定的演算處理。演算部70包含X光源控制部72、影像取得控制部74、再構成部76、良否判定部78、檢查對象位置控制部80、X光焦點位置計算部82、拍攝條件設定部84及檢查資訊生成部86。 The calculation unit 70 executes the program 96 stored in the storage unit 90 to control each unit, and executes predetermined calculation processing. The calculation unit 70 includes an X-ray source control unit 72, a video acquisition control unit 74, a reconstruction unit 76, a quality determination unit 78, an inspection target position control unit 80, an X-ray focus position calculation unit 82, an imaging condition setting unit 84, and inspection information generation. Department 86.

X光源控制部72係決定X光焦點位置與X光能量,並傳送指令到X光源控制機構60。 The X-ray source control unit 72 determines the X-ray focus position and the X-ray energy, and transmits a command to the X-ray source control unit 60.

影像取得控制部74會傳送指令到影像取得控制機構30,以使X光檢測器23取得影像。又,影像取得控制部74從影像取得控制機構30取得影像資料。 The video acquisition control unit 74 transmits a command to the video acquisition control unit 30 to cause the X-ray detector 23 to acquire an image. Further, the video acquisition control unit 74 acquires video data from the video acquisition control unit 30.

再構成部76從藉由影像取得控制部74取得之多個影像資料,再構成三維資料。 The reconstruction unit 76 reconstructs the plurality of pieces of image data acquired by the image acquisition control unit 74 to form three-dimensional data.

良否判定部78求得安裝零件的基板表面之高度(基板高度),基於基板高度的斷層影像判定檢查對象的良否。另外,進行良否判定的演算法,或者,對演算法的輸入資訊係因檢查對象而異,因此良否判定部78從拍攝條件資訊94取得此等資訊。 The quality determination unit 78 determines the height (substrate height) of the substrate surface of the mounting component, and determines whether or not the inspection target is good or not based on the tomographic image of the substrate height. Further, the algorithm for determining the quality of the algorithm or the input information for the algorithm varies depending on the object to be inspected. Therefore, the quality determination unit 78 acquires the information from the imaging condition information 94.

檢查對象位置控制部80經由檢查對象位置控制機構120控制檢查對象驅動機構110。 The inspection target position control unit 80 controls the inspection target drive mechanism 110 via the inspection target position control mechanism 120.

X光焦點位置計算部82在檢查有檢查對象1的檢查區域時,計算對該檢查區域的X光焦點位置或照射角等。 When the X-ray focus position calculating unit 82 checks the inspection region of the inspection object 1, the X-ray focal position, the irradiation angle, and the like of the inspection region are calculated.

拍攝條件設定部84依據檢查對象1,設定從X光源10輸出X光時的條件(例如,對於X光源的施加電壓、拍攝時間等)。 The imaging condition setting unit 84 sets a condition (for example, an applied voltage to the X light source, an imaging time, and the like) when the X-ray source 10 outputs X-rays in accordance with the inspection target 1 .

記憶部90包含X光焦點位置資訊92、拍攝條件資訊94、用於實現上述演算部70所執行之各機能的程式96、及X光檢測器23拍攝的影像資料98。X光焦點位置資訊92中包含由X光焦點位置計算部82計算的X光焦點位置。拍攝條件資訊94包含由拍攝條件設定部84設定之拍攝條件或進行良否判定之演算法相關的資訊。 The memory unit 90 includes X-ray focus position information 92, imaging condition information 94, a program 96 for realizing the functions performed by the calculation unit 70, and image data 98 captured by the X-ray detector 23. The X-ray focus position information 92 includes the X-ray focus position calculated by the X-ray focus position calculating unit 82. The shooting condition information 94 includes information related to the shooting conditions set by the shooting condition setting unit 84 or the algorithm for determining the quality.

又,記憶部90及檢查對象DB200只要是可用於儲存資料者即可。記憶部90,舉例而言,由RAM(Random Access Memory)或EEPROM(Electrically Erasable and Programmable Read-Only Memory)或HDD(Hard Disc Drive)等記憶裝置構成。檢查對象DB200亦可為HDD,或者亦可為設置在以網路連接之其他電腦的記憶裝置。 Further, the storage unit 90 and the inspection target DB 200 may be used as long as they are usable for storing data. The memory unit 90, for example, by RAM (Random) Memory device such as Access Memory) or EEPROM (Electrically Erasable and Programmable Read-Only Memory) or HDD (Hard Disc Drive). The inspection object DB 200 may also be an HDD, or may be a memory device provided on another computer connected by a network.

(具體構造) (concrete structure)

針對本實施形態的X光檢查裝置100之具體構造,將參照第2圖說明。第2圖係用於說明本實施形態之X光檢查裝置100的構造之圖。又,第2圖中,對與第1圖的同一部分附加同一符號。又,在第2圖中,擷取第1圖所示之部分當中與X光焦點位置的控制、X光檢測器位置的控制、檢查對象位置的控制等直接相關且必須說明的部分並加以記載。 The specific structure of the X-ray inspection apparatus 100 of the present embodiment will be described with reference to Fig. 2 . Fig. 2 is a view for explaining the structure of the X-ray inspection apparatus 100 of the present embodiment. In the second drawing, the same reference numerals are given to the same portions as those in the first embodiment. In addition, in the second drawing, the portion which is directly related to the control of the X-ray focus position, the control of the X-ray detector position, the control of the inspection target position, and the like among the portions shown in Fig. 1 is extracted and described. .

本實施形態中,X光源10係圓錐束型的光源。又,如上述,X光源10亦可為可在指定方向掃描產生X光的位置(X光焦點位置)之掃描式X光源。X光源10按照通過X光源控制機構60之演算部70的命令而產生X光。 In the present embodiment, the X light source 10 is a cone beam type light source. Further, as described above, the X-ray source 10 may be a scanning X-ray source that can scan a position (X-ray focal position) at which X-rays are generated in a predetermined direction. The X-ray source 10 generates X-rays in accordance with an instruction from the calculation unit 70 of the X-ray source control unit 60.

X光源10係密閉型X光源,安裝於X光檢查裝置100的上方或下方。又,X光源10之目標可為穿透型,亦可為反射型。X光源10係安裝於作動部(未圖示),且可沿垂直方向移動。 The X-ray source 10 is a sealed X-ray source and is mounted above or below the X-ray inspection apparatus 100. Moreover, the target of the X-ray source 10 may be a transmissive type or a reflective type. The X-ray source 10 is attached to an actuator (not shown) and is movable in the vertical direction.

X光檢測器23係以隔著檢查對象1(基板)的方式,配置在與X光源10對向的位置。X光檢測器23將由X光源10照射的X光影像化。又,X光檢測器23安裝於X光檢測器驅動部22。X光檢測器驅動部22係三維台座,可將X光檢測器23沿水平方向及垂直方向移動。 The X-ray detector 23 is disposed at a position facing the X-ray source 10 so as to sandwich the inspection object 1 (substrate). The X-ray detector 23 images the X-rays irradiated by the X-ray source 10. Further, the X-ray detector 23 is attached to the X-ray detector driving unit 22. The X-ray detector driving unit 22 is a three-dimensional pedestal that can move the X-ray detector 23 in the horizontal direction and the vertical direction.

檢查對象驅動機構110設置於X光源10與X光檢測器23之間。檢查對象驅動機構110包含台座111a、111b及附屬於台座111a、111b的基板軌道112a、112b。台座111a、111b可將檢查對象1沿水平方向平行移動。基板軌道112a、112b分別將檢查對象1由上下方夾住以固定基板。 The inspection object drive mechanism 110 is disposed between the X-ray source 10 and the X-ray detector 23. The inspection target drive mechanism 110 includes pedestals 111a and 111b and substrate rails 112a and 112b attached to the pedestals 111a and 111b. The pedestals 111a, 111b can move the inspection object 1 in parallel in the horizontal direction. The substrate rails 112a and 112b sandwich the inspection object 1 from above to below to fix the substrate.

台座111a、111b及基板軌道112a、112b的動作係由基板驅動控制機構126控制。 The operations of the pedestals 111a and 111b and the substrate rails 112a and 112b are controlled by the substrate drive control unit 126.

參照第2圖,X光檢查裝置100具備位移計114及光學照相機116(未顯示在第1圖)。位移計114係量測至基板的距離。因此,位移計114可量測之後詳述的基板翹曲。光學照相機116利用可見光拍攝基板。光學照相機116用以拍攝用於檢查位置之設定的基標。位移計114及光學照相機116藉由退避機構退避到X光照射不到的區域,以避免使用X光拍攝時暴露於X光。 Referring to Fig. 2, the X-ray inspection apparatus 100 includes a displacement meter 114 and an optical camera 116 (not shown in Fig. 1). Displacement meter 114 measures the distance to the substrate. Therefore, the displacement meter 114 can measure the substrate warpage detailed later. The optical camera 116 photographs the substrate with visible light. The optical camera 116 is used to capture a landmark for checking the setting of the position. The displacement meter 114 and the optical camera 116 are retracted to an area where X-rays are not irradiated by the retracting mechanism to avoid exposure to X-rays when photographing with X-rays.

又,於光學照相機116藉由未圖示之安裝機構安裝有照明裝置115。照明裝置115將光學照相機116的視野(拍攝區域)全體均勻地點亮。本實施形態中,雖然照明裝置115係發出白色光之環形LED(Light Emitting Diode)光源,但未限定於此,亦可為其他光源。又,未必要與光學照相機116設計成一體,亦可設計成獨立於光學照相機116。又,照明裝置115亦與光學照相機116等同樣,係藉由退避機構(未圖示)退避到X光照射不到的區域,以避免使用X光拍攝時暴露於X光。 Further, the optical device 116 is mounted with an illumination device 115 by a mounting mechanism (not shown). The illumination device 115 uniformly lights the entire field of view (photographing area) of the optical camera 116. In the present embodiment, the illumination device 115 is a light-emitting diode (Light Emitting Diode) light source that emits white light, but is not limited thereto, and may be another light source. Moreover, it is not necessary to be integrated with the optical camera 116, and it may be designed to be independent of the optical camera 116. Further, similarly to the optical camera 116 and the like, the illumination device 115 is evacuated to an area where X-rays are not irradiated by a retracting mechanism (not shown) to avoid exposure to X-rays when X-rays are used for imaging.

依據以上構造,X光檢查裝置100可變更光源-基板間距離與光源-檢測器間距離的比(放大率)。因此,X光檢 查裝置100可變更由X光檢測器23拍攝之檢查對象1的大小(因此可變更解析度)。 According to the above configuration, the X-ray inspection apparatus 100 can change the ratio (magnification) of the distance between the light source and the substrate and the distance between the light source and the detector. Therefore, X-ray inspection The inspection device 100 can change the size of the inspection object 1 imaged by the X-ray detector 23 (so that the resolution can be changed).

又,X光檢查裝置100可使基板與X光檢測器23作動,以便能夠從各個方向拍攝基板。本實施形態中,根據從各個方向的拍攝結果,利用稱為CT(Computed Tomography)的三維資料生成手法而生成檢查對象1的三維資料。 Further, the X-ray inspection apparatus 100 can operate the substrate and the X-ray detector 23 so that the substrate can be imaged from various directions. In the present embodiment, the three-dimensional data of the inspection object 1 is generated by a three-dimensional data generation method called CT (Computed Tomography) based on the imaging results from the respective directions.

又,本實施形態中,X光檢查裝置100用於線內檢查。為了進行線內檢查,檢查對象驅動機構進一步包含將基板移入移出的機構。然而,此種基板的移入移出機構未顯示於第2圖。一般是使用配置於基板軌道上的運輸帶作為基板的移入移出裝置。或者,亦可使用稱為推桿(pusher)的棒子作為移入移出裝置。利用推桿使基板在軌道上滑動,藉此可使基板移動。 Further, in the present embodiment, the X-ray inspection apparatus 100 is used for in-line inspection. For in-line inspection, the inspection object drive mechanism further includes a mechanism for moving the substrate into and out of the substrate. However, such a substrate moving in and out mechanism is not shown in Fig. 2. Generally, a transport belt disposed on a substrate track is used as a moving in and out device of the substrate. Alternatively, a stick called a pusher may be used as the move in and out device. The substrate is slid on the rail by the push rod, whereby the substrate can be moved.

作為演算部70,可使用一般的中央處理器(CPU)。記憶部90包含主記憶部90a與輔助記憶部90b。舉例而言,可使用記憶體作為主記憶部90a,使用HDD(Hard Disc Drive,硬碟機)作為輔助記憶部90b。亦即,可使用一般計算機作為演算部70及記憶部90。 As the calculation unit 70, a general central processing unit (CPU) can be used. The memory unit 90 includes a main memory unit 90a and an auxiliary memory unit 90b. For example, a memory can be used as the main memory unit 90a, and an HDD (Hard Disc Drive) can be used as the auxiliary memory unit 90b. That is, a general computer can be used as the calculation unit 70 and the storage unit 90.

(教示處理的流程) (the process of teaching and processing)

以下,以表面側及背面側安裝有作為檢查對象物之電子零件的印刷基板為例,說明本實施形態的X光檢查裝置100之動作。 In the following, the operation of the X-ray inspection apparatus 100 of the present embodiment will be described by taking a printed circuit board on which the electronic component as the inspection target is mounted on the front side and the back side.

X光檢查裝置100中,關於檢查對象1,可在事前輸入對檢查對象1的檢查位置等進行教示(teaching)的資料。 關於輸入此種資訊的處理(教示處理)之內容,將參照作為該處理之流程圖的第3圖來說明。又,在X光檢查裝置100中,教示處理由資訊生成部86實現。又,在教示處理中所生成之關於檢查教示的資訊,係作為例如拍攝條件資訊94而儲存於記憶部90。 In the X-ray inspection apparatus 100, the inspection target 1 can input information for teaching the inspection position and the like of the inspection object 1 in advance. The content of the process (teaching process) for inputting such information will be described with reference to FIG. 3 which is a flowchart of the process. Further, in the X-ray inspection apparatus 100, the teaching processing is realized by the information generating unit 86. Further, the information about the inspection instruction generated in the teaching process is stored in the storage unit 90 as, for example, the shooting condition information 94.

第3圖係用於說明本實施形態中教示處理之流程的流程圖。 Fig. 3 is a flow chart for explaining the flow of the teaching process in the embodiment.

參照第3圖,當教示處理開始(S100)時,首先,將作為檢查對象的基板以背向狀態(以背面朝向光學照相機116側的方向)移入(S102)。 Referring to Fig. 3, when the teaching process is started (S100), first, the substrate to be inspected is moved in the back state (the direction in which the back surface faces the optical camera 116 side) (S102).

接著,X光檢查裝置100在基板是背向的狀態下,以光學照相機116拍攝可見光影像(S104)。之後,基板暫時從可拍攝可見光影像的驅動範圍移出(S106),藉由規定的反轉機構(未圖示於第1圖及第2圖)使方向反轉,再以基板是面向的狀態移入(S108),在基板是面向的狀態,以光學照相機116拍攝可見光影像(S112)。 Next, in the X-ray inspection apparatus 100, the visible light image is captured by the optical camera 116 in a state where the substrate is facing away (S104). Thereafter, the substrate is temporarily removed from the driving range in which the visible light image can be captured (S106), and the direction is reversed by a predetermined inversion mechanism (not shown in FIGS. 1 and 2), and the substrate is moved in a state in which the substrate is facing. (S108), the visible light image is captured by the optical camera 116 in a state where the substrate is facing (S112).

接著,在基板是面向的狀態,拍攝X光影像(S112)。 Next, an X-ray image is taken while the substrate is facing (S112).

藉由以上,由於已拍攝基板表側的可見光影像與背側的可見光影像,進而已拍攝X光影像,所以藉由X光檢查裝置100的演算部70之控制,執行此三者的影像對位(S114),接著,執行影像伸縮(倍率變更)與重疊處理(S116)。之後,藉由演算部70的控制,對輸出部50進行重疊影像的顯示(S118)。雖然未特別限定,但是以由表側的可見光影像與X光影像重疊而成之影像進行顯示者為例來說明。 As described above, since the visible light image on the front side of the substrate and the visible light image on the back side are captured, and the X-ray image is captured, the image alignment of the three is performed under the control of the calculation unit 70 of the X-ray inspection apparatus 100 ( S114) Next, image expansion and contraction (magnification change) and overlap processing (S116) are performed. Thereafter, the output unit 50 displays the superimposed video image under the control of the arithmetic unit 70 (S118). Although it is not particularly limited, it is described by taking an image in which a visible light image on the front side and an X-ray image are superimposed.

在此,依據儲存在檢查對象DB200的資訊,在如上述的重疊影像中,進一步重疊,將顯示安裝於表側的零件之檢查對象(在此指焊接球)之位置的標記,例如矩形標記也一併顯示。在此,使用者依據顯示來判斷此種標記的位置是否適合作為檢查區域(稱為「檢查視窗」),若適合,則進行用以確定檢查視窗之確認輸入。另外,若不適合,舉例而言,則以手動方式將檢查視窗的位置及方向移動到判斷為適合的位置與方向,之後,進行確認輸入。依據此種確認輸入,演算部70會將檢查視窗相對於表側的檢查對象零件之相對位置作為設定資訊儲存,以作為記憶部90的拍攝條件資訊。在此種情況,舉例而言,雖然未特別限定,但在記憶部90中,會設定檢查視窗作為相對於零件的規定基準點(零件外形之規定的角部分等)之相對位置(S120)。 Here, based on the information stored in the inspection target DB 200, the superimposed video as described above is further superimposed, and the mark of the position of the inspection object (here, referred to as the welding ball) of the component attached to the front side is displayed, for example, a rectangular mark. And display. Here, the user judges whether the position of the mark is suitable as an inspection area (referred to as an "inspection window") based on the display, and if so, performs confirmation to confirm the inspection window. Further, if it is not suitable, for example, the position and direction of the inspection window are manually moved to the position and direction determined to be appropriate, and then the confirmation input is performed. Based on the confirmation input, the calculation unit 70 stores the relative position of the inspection window with respect to the inspection target component on the front side as setting information as the imaging condition information of the storage unit 90. In this case, for example, although not particularly limited, in the storage unit 90, the inspection window is set as a relative position with respect to a predetermined reference point (a predetermined angular portion of the part outer shape) of the component (S120).

接著,藉由演算部70的控制,來自輸出部50的輸出切換成背面側的顯示(S122),並與表側同樣,顯示關於背側的重疊影像(S124),再依據儲存於檢查對象DB200的資訊,在如上述的重疊影像中,進一步重疊,將顯示安裝於背側的零件之檢查對象(在此指焊接球)之位置的標記(檢查視窗)也一併顯示。在此,使用者也依據顯示來判斷此種標記的位置是否適合作為檢查視窗,若適合,則進行用以確定檢查視窗之確認輸入。另外,若不適合,舉例而言,則手動將檢查視窗的位置及方向移動到判斷為適合的位置與方向,之後,進行確認輸入。依據此種確認輸入,演算部70也會將檢查視窗相對於背側的 檢查對象零件之相對位置作為設定資訊儲存,以作為記憶部90的拍攝條件資訊。在此種情況亦同樣,舉例而言,雖然未特別限定,但在記憶部90中,會設定檢查視窗作為相對於零件的規定基準點(零件外形之規定的角部分等)之相對位置(S126)。 Then, the output from the output unit 50 is switched to the display on the back side by the control of the calculation unit 70 (S122), and the superimposed image on the back side is displayed in the same manner as the front side (S124), and is stored in the inspection target DB 200. The information is further overlapped in the superimposed image as described above, and the mark (inspection window) indicating the position of the inspection object (here, the welding ball) of the component mounted on the back side is also displayed. Here, the user also judges whether the position of the mark is suitable as an inspection window according to the display, and if appropriate, performs confirmation input for determining the inspection window. Further, if it is not suitable, for example, the position and direction of the inspection window are manually moved to the position and direction determined to be appropriate, and then the confirmation input is made. Based on such confirmation input, the calculation unit 70 also compares the inspection window with respect to the back side. The relative position of the object part is checked as the setting information storage as the shooting condition information of the memory unit 90. In this case, for example, although not particularly limited, in the storage unit 90, the inspection window is set as a relative position with respect to a predetermined reference point of the component (a predetermined angular portion of the component outer shape, etc.) (S126) ).

接著,由使用者進行如之後說明的檢查基準之設定,嘗試取得檢查結果並執行用於動作確認的測試(S128)。之後,將基板移出(S130),結束教示處理(S130)。 Next, the user performs setting of the inspection standard described later, attempts to acquire the inspection result, and executes a test for the operation confirmation (S128). Thereafter, the substrate is removed (S130), and the teaching process is ended (S130).

第4圖係用於說明第3圖所示「影像位置重疊處理(S114)」與「影像伸縮、重疊處理(S116)」之流程圖。 Fig. 4 is a flowchart for explaining "image position superimposition processing (S114)" and "image expansion and superimposition processing (S116)" shown in Fig. 3.

又,以下說明中,雖然未特別限定,惟光學照相機及X光照相機(為了方便,將藉由X光檢測器23拍攝之X光影像的構造稱為「X光照相機」)的光學倍率在製造組裝的時候,預先設定為規定值。作為光學照相機及X光照相機的性能,例如設為如下的值。 In the following description, the optical magnification of the optical camera and the X-ray camera (for the sake of convenience, the structure of the X-ray image captured by the X-ray detector 23 is referred to as "X-ray camera") is manufactured. When assembling, it is set to a predetermined value in advance. The performance of the optical camera and the X-ray camera is set to, for example, the following values.

光學照相機:解析度:22μm Optical camera: resolution: 22μm

X光照相機:解析度:可變10、15、20、25、30μm X-ray camera: resolution: variable 10, 15, 20, 25, 30μm

其中,用於教示的視窗設定之X光照相機的解析度為20μm。亦即,光學照相機與X光照相機之解析度未必一致。又,製造時,對於使用光學照相機拍攝之表側影像上的位置與使用與其對應之X光照相機拍攝之影像上的位置,將兩者校正成一致。 Among them, the resolution of the X-ray camera for window setting for teaching is 20 μm. That is, the resolution of the optical camera and the X-ray camera does not necessarily coincide. Further, at the time of manufacture, the position on the front side image captured by the optical camera and the position on the image captured by the X-ray camera corresponding thereto are corrected to be identical.

因此,如以下說明,藉由放大光學照相機的影像以配合X光照相機的解析度20um。又,考慮到兩者解析度的關係,亦有需要將光學照相機的影像縮小之情況。 Therefore, as explained below, the image of the optical camera is enlarged to match the resolution of the X-ray camera by 20 μm. Moreover, in consideration of the relationship between the two degrees of resolution, there is a need to reduce the image of the optical camera.

參照第4圖,以可見光影像(表側)的影像中心為基準,在上述的例子中,執行如下的倍率放大(S200)。 Referring to Fig. 4, in the above example, the magnification of magnification is performed on the basis of the image center of the visible light image (front side) (S200).

光學照相機影像(重疊用影像)的大小=光學照相機影像(原本)的大小×22/20 The size of the optical camera image (overlapping image) = the size of the optical camera image (original) × 22/20

接著,將可見光影像(表側)與X光影像彼此重疊(S202)。 Next, the visible light image (front side) and the X-ray image are superimposed on each other (S202).

在此,作為此種重疊的位置基準,例如可使用基標。基標在基板對角方向的一端以銅配線圖案形成。因此,可在不會受到基板形狀或配線相對基板之形成位置的偏移等的影響下,在印刷基板的銅配線圖案,無誤地規定裝置位置。 Here, as the position reference of such overlap, for example, a base can be used. The base mark is formed in a copper wiring pattern at one end in the diagonal direction of the substrate. Therefore, the position of the device can be determined without any error in the copper wiring pattern of the printed circuit board without being affected by the shape of the substrate or the offset of the position at which the wiring is formed on the substrate.

接著,從可見光影像(表側)的影像,檢測規定的基標位置(例如,基板表側左上的基板角)(S204),將如此擷取之「基板左上的基板角」之影像上的位置A儲存在記憶部90(S206)。 Next, a predetermined base position (for example, a substrate angle on the upper left side of the substrate side) is detected from the image of the visible light image (front side) (S204), and the position A on the image of the "substrate angle on the upper left side of the substrate" thus captured is stored. In the memory unit 90 (S206).

又,以可見光影像(背側)的影像中心為基準,執行與表側同樣的影像放大處理(S201)。 Moreover, the same image enlargement process as that of the front side is performed on the basis of the image center of the visible light image (back side) (S201).

接著,從可見光影像(背側)的影像,檢測規定的基標位置(例如,基板背側左上的基板角)(S212),將如此擷取之「基板背側左上的基板角」的影像上之與位置A之差分(△(x、y))儲存在記憶部90(S212)。 Next, a predetermined base position (for example, a substrate angle on the upper left side of the substrate) is detected from the image of the visible light image (back side) (S212), and the image of the substrate angle on the upper left side of the substrate is thus captured. The difference (Δ(x, y)) from the position A is stored in the memory unit 90 (S212).

對於背面側的影像,僅將可見光影像(背側)與X光影像錯開(△(x、y)),並將兩者重疊(S124)。 For the image on the back side, only the visible light image (back side) and the X-ray image are shifted (Δ(x, y)), and the two are overlapped (S124).

如上述,本實施形態中,以表面的可見光影像中的基板角為基準,進行可見光影像與X光影像的位置重疊, 並特定檢查視窗的位置。因為經特定的位置係登錄作為對零件的相對座標,故即使如此登錄,也會以對零件的基準座標(以基標為基準的座標)登錄。 As described above, in the present embodiment, the position of the visible light image and the X-ray image are superimposed on the basis of the substrate angle in the visible light image on the surface. And the location of the specific inspection window. Since the specific position is registered as the relative coordinate of the part, even if it is registered as such, it will be registered with the reference coordinate of the part (the coordinate based on the base mark).

在CAD資料上,對安裝於印刷基板上的各個零件,登錄有零件的編號、零件中心的座標(X、Y)、零件的旋轉角度θ。在此,檢查視窗係為欲檢查的焊接區域,依照每個零件的編號(每個零件的種類)來登錄。 In the CAD data, the part number, the coordinate (X, Y) of the part center, and the rotation angle θ of the part are registered for each part mounted on the printed circuit board. Here, the inspection window is the welding area to be inspected, and is registered in accordance with the number of each part (the type of each part).

又,本實施形態中,如之後說明,檢查時,在基板移入後,進行基標(fiducial mark)的拍攝及基板高度的量測。因為進行基板高度的量測,所以當X光影像為CT影像(再構成影像)的情況下,藉由從已量測的基板高度顯示規定的高度剖面,可顯示表面的焊接部分的影像。又,從基板高度與基板厚度的資訊,在X光影像為再構成影像(CT影像)的情況下,藉由顯示[(已量測的基板高度)-(基板厚度)-(規定高度)]的剖面,可顯示背面焊接部的影像。 Further, in the present embodiment, as will be described later, at the time of inspection, after the substrate is moved in, the imaging of the fiducial mark and the measurement of the height of the substrate are performed. Since the measurement of the height of the substrate is performed, when the X-ray image is a CT image (reconstructed image), the image of the welded portion of the surface can be displayed by displaying a predetermined height profile from the measured substrate height. Further, information on the height of the substrate and the thickness of the substrate is displayed by [(measured substrate height) - (substrate thickness) - (predetermined height)] when the X-ray image is a reconstructed image (CT image) The profile shows the image of the back weld.

第5圖係用於說明上述之基板表側之可見光影像與背側的可見光影像與X光影像之對位的概念圖。 Fig. 5 is a conceptual diagram for explaining the alignment of the visible light image on the front side of the substrate and the visible light image on the back side and the X-ray image.

作為前提,如上述,光學照相機與X光照相機的相對位置在製造組裝的時候,透過預先量測、設定偏移值,進行校正以使由光學照相機拍攝的表側影像上之位置與由與其對應之X光照相機拍攝的影像上之位置兩者一致。 As a premise, as described above, when the relative position of the optical camera and the X-ray camera is manufactured and assembled, the offset is adjusted in advance, and the offset value is corrected so that the position on the front side image captured by the optical camera corresponds to The position on the image captured by the X-ray camera is the same.

接著,如第5圖所示,以可見光影像(表側)作為參考,將可見光影像(背側)對位,因為未替換基板,故可見光影像(表側)與X光影像的位置會自然重疊。在此,X光 影像可以是單一的X光穿透影像,也可以是由從多個方向對同一處拍攝之多個X光穿透影像再構成的再構成影像(CT影像)。 Next, as shown in FIG. 5, the visible light image (front side) is aligned with the visible light image (front side) as a reference, and since the substrate is not replaced, the positions of the visible light image (front side) and the X-ray image naturally overlap. Here, X-ray The image may be a single X-ray penetrating image or a reconstructed image (CT image) reconstructed from a plurality of X-ray penetrating images taken from the same direction in multiple directions.

第6圖係將可見光影像與X光影像重疊顯示的時候,設定光學影像穿透率(將重疊的X光影像以隔著可見光影像看見的方式顯示時之穿透比率)之畫面例。 Fig. 6 is a view showing an example of a screen in which the optical image transmittance (the penetration ratio when the superimposed X-ray image is displayed in a manner of being seen through the visible light image) is displayed when the visible light image and the X-ray image are superimposed and displayed.

如第6圖所示,藉由事前或事後將穿透率設定為適當的值,如之後說明,將可見光影像與X光影像重疊顯示時之檢查對象區域的視覺辨認性得以提升。 As shown in Fig. 6, by setting the transmittance to an appropriate value before or after the event, as will be described later, the visibility of the inspection target area when the visible light image and the X-ray image are superimposed and displayed is improved.

又,能以存在於第6圖中的按鈕設定的參數如下。 Further, the parameters that can be set by the buttons existing in Fig. 6 are as follows.

第7圖係表示將可見光影像(表側)與X光再構成影像重疊顯示之顯示例的圖。 Fig. 7 is a view showing a display example in which a visible light image (front side) and an X-ray reconstruction image are superimposed and displayed.

如第7圖所示,將從表側上方拍攝之可見光影像(表側)與平行於基板方向且位於從基板表面指定之高度的X光再構成影像之平面影像重疊並顯示,並且也一併顯示表示X光再構成影像之平面影像中所指定之剖面的再構成影像。 As shown in FIG. 7, the visible light image (the front side) photographed from the upper side of the front side is superimposed and displayed on the plane image of the X-ray reconstructed image parallel to the substrate direction and located at a height specified from the surface of the substrate, and is also displayed together. The X-rays then constitute a reconstructed image of the profile specified in the planar image of the image.

又,將從表側上方拍攝之可見光影像(表側)與X光再構成影像之平面影像重疊顯示的影像中,依據CAD資料,基板(表側)上的焊接用電極墊(land:接端面)的位置以矩形形狀顯示。又,對於事前設定的零件,矩形形狀視窗(檢查視窗)會自動在「照相機影像」的畫面上顯示。若事前未設定,亦可由使用者手動設定。 Further, in the image in which the visible light image (the front side) captured from the upper side of the front side and the X-ray reconstructed image are superimposed on the image, the position of the welding electrode pad (land: end face) on the substrate (front side) is based on the CAD data. Displayed in a rectangular shape. Also, for the parts set in advance, the rectangular shape window (inspection window) is automatically displayed on the "camera image" screen. If it is not set beforehand, it can also be set manually by the user.

使用者可依需要在進行此矩形形狀的位置調整後,執行確認輸入(例如,點擊儲存按鈕)。 The user can perform a confirmation input after performing the position adjustment of the rectangular shape as needed (for example, clicking the save button).

對於可見光影像(背側)與X光再構成影像,事前執行同樣的影像顯示與位置調整。又,依據表側與背側顯示的切換,X光再構成影像的顯示也切換成配合顯示的方向。 For the visible light image (back side) and X-ray reconstruction image, the same image display and position adjustment are performed beforehand. Moreover, according to the switching between the front side display and the back side display, the display of the X-ray reconstructed image is also switched to match the display direction.

第8圖係表示用於將第7圖所示影像進一步縮小,並確認半導體晶片全體之焊接位置的顯示例之圖。 Fig. 8 is a view showing a display example for further reducing the image shown in Fig. 7 and confirming the welding position of the entire semiconductor wafer.

第9圖係表示將可見光影像(背側)與零件編號重疊顯示之顯示例的圖。 Fig. 9 is a view showing a display example in which a visible light image (back side) is superimposed on a part number.

第10圖係表示將可見光影像(背側)與X光穿透影像重疊顯示之顯示例的圖。 Fig. 10 is a view showing a display example in which a visible light image (back side) and an X-ray transmission image are superimposed and displayed.

要使X光再構成影像顯示或使X光穿透影像顯示,可依照使用者的選擇而設定。 To make the X-ray reconstitute the image display or to make the X-ray penetrate the image display, it can be set according to the user's choice.

透過標籤的切換,對於可見光影像,可切換顯示基板的表側或顯示背側。 By switching the label, for the visible light image, the front side or the back side of the display substrate can be switched.

依據表側與背側的顯示之切換,X光穿透影像的顯示亦可切換成配合顯示的方向。 According to the display of the display on the front side and the back side, the display of the X-ray penetrating image can also be switched to match the display direction.

第11圖係與第10圖同樣表示將可見光影像(背側)與 X光穿透影像重疊顯示之顯示例的圖。 Figure 11 is the same as Figure 10 showing the visible light image (back side) and A diagram of a display example in which an X-ray transmission image is superimposed and displayed.

第11圖中,在將從表側上方拍攝之可見光影像(表側)與X光穿透影像重疊顯示的影像中,依據CAD資料,基板(表側)上的焊接用電極墊(land:接端面)的位置以矩形形狀顯示。 In Fig. 11, in the image displayed by superimposing the visible light image (the front side) and the X-ray penetrating image taken from the upper side of the front side, the electrode pads for welding (land: end face) on the substrate (front side) are based on the CAD data. The position is displayed in a rectangular shape.

使用者可依需要在進行此矩形形狀的位置調整後,執行確認輸入(例如,點擊儲存按鈕)。 The user can perform a confirmation input after performing the position adjustment of the rectangular shape as needed (for example, clicking the save button).

透過以上處理,可針對該影像確認將可見光影像與X光影像重疊顯示的位置。此時,因為有X光像,焊接區域對於使用者成為可見,且依據CAD資料,可確認其與基板上焊接用電極墊(land:接端面)的位置一致。 Through the above processing, the position where the visible light image and the X-ray image are superimposed and displayed can be confirmed for the image. At this time, since there is an X-ray image, the welded region is visible to the user, and it can be confirmed that the position of the electrode pad (land: end face) for soldering on the substrate coincides with the CAD data.

(檢查處理的流程) (check the processing flow)

第12圖係將本實施形態之X光檢查的流程以流程圖形式表示之圖。參照第12圖,對本實施形態的X光檢查全體的流程進行說明。 Fig. 12 is a view showing the flow of the X-ray inspection of the present embodiment in the form of a flowchart. The flow of the entire X-ray inspection of the present embodiment will be described with reference to Fig. 12 .

參照第12圖,首先,一開始處理(步驟SA1)時,X光檢查裝置100便利用檢查對象驅動機構,將基板移入X光檢查裝置100內部的規定位置(步驟SA3)。規定位置通常較佳為設定在X光檢查裝置100的中央,亦即,X光照射範圍的中央。然而,規定位置也可以是X光檢測器23可拍攝基板的X光透視影像之位置。 Referring to Fig. 12, first, when the processing is started (step SA1), the X-ray inspection apparatus 100 facilitates the movement of the substrate into a predetermined position inside the X-ray inspection apparatus 100 by the inspection target drive mechanism (step SA3). The predetermined position is usually preferably set in the center of the X-ray inspection apparatus 100, that is, in the center of the X-ray irradiation range. However, the predetermined position may also be a position at which the X-ray detector 23 can take an X-ray image of the substrate.

在步驟SA5,X光檢查裝置100利用光學照相機116拍攝基標。又,X光檢查裝置100依據基標的位置,必要時修正基板位置。具體而言,X光檢查裝置100與移入時同樣使基板位置移動。藉由此等處理,X光檢查裝置100可 辨識基板移入時產生的基板位置偏移或基板傾斜,並可修正偏移及傾斜。 At step SA5, the X-ray inspection apparatus 100 photographs the base using the optical camera 116. Further, the X-ray inspection apparatus 100 corrects the position of the substrate as necessary depending on the position of the base mark. Specifically, the X-ray inspection apparatus 100 moves the substrate position as in the case of moving in. By this processing, the X-ray inspection apparatus 100 can The substrate position shift or the substrate tilt generated when the substrate is moved in is recognized, and the offset and tilt can be corrected.

在步驟SA7,X光檢查裝置100利用位移計114,量測再構成區域(以下亦稱為視野)中的基板高度。X光檢查裝置100將量測的基板高度事先儲存於主記憶部90a。所儲存的基板高度用於之後所述的CT拍攝時。 In step SA7, the X-ray inspection apparatus 100 measures the height of the substrate in the reconstructed region (hereinafter also referred to as a field of view) using the displacement meter 114. The X-ray inspection apparatus 100 stores the measured substrate height in advance in the main memory unit 90a. The stored substrate height is used for CT shooting as described later.

無法以一次的拍攝對檢查對象1全體拍攝等,在檢查對象1包含多個視野的情況下,X光檢查裝置100在進行CT拍攝之前,對所有視野先量測基板高度。這是由於在CT拍攝時為了不使位移計114暴露而必須使其退避。如此預先量測所有基板高度,相較於每次對各視野進行CT拍攝都量測基板高度,可縮短全體的檢查時間。 When the inspection object 1 includes a plurality of fields of view, the X-ray inspection apparatus 100 measures the substrate height for all the fields of view before performing CT imaging. This is because the CT must be retracted in order not to expose the displacement gauge 114 during CT imaging. By measuring all the substrate heights in advance, the height of the substrate can be measured every time CT imaging is performed for each field of view, and the entire inspection time can be shortened.

在步驟SA9,X光檢查裝置100在檢查對象1內從多個方向拍攝1個視野。本實施形態中,X光檢查裝置100會以在水平方向描繪圓軌道的方式使基板與X光檢測器23移動,並從多個方向拍攝視野。拍攝時的基板及X光檢測器23的位置係由照射角度θR、光源-基板間距離(FOD)、光源-檢測器間距離(FID)決定。基板及X光檢測器23係配置成在X光檢測器23中心可拍攝視野中心。又,基板及X光檢測器23的軌道可不是圓形,可為矩形或直線。 In step SA9, the X-ray inspection apparatus 100 takes one field of view from a plurality of directions in the inspection object 1. In the present embodiment, the X-ray inspection apparatus 100 moves the substrate and the X-ray detector 23 so that the circular orbit is drawn in the horizontal direction, and captures the field of view from a plurality of directions. The position of the substrate and the X-ray detector 23 at the time of imaging is determined by the irradiation angle θR, the distance between the light source and the substrate (FOD), and the distance between the light source and the detector (FID). The substrate and the X-ray detector 23 are arranged to capture the center of the field of view at the center of the X-ray detector 23. Further, the track of the substrate and the X-ray detector 23 may not be circular, and may be rectangular or straight.

拍攝枚數可由使用者設定。較佳為使用者依據求得之再構成資料的精密度,決定拍攝張數。拍攝張數通常為4~256張左右。然而,拍攝張數並不限於此。舉例而言、X光檢查裝置100當然亦可拍攝超過256張張數的影像。 The number of shots can be set by the user. Preferably, the user determines the number of shots based on the precision of the reconstructed data obtained. The number of shots is usually around 4~256. However, the number of shots is not limited to this. For example, the X-ray inspection apparatus 100 can of course take more than 256 images.

在步驟SA11,X光檢查裝置100從多個方向的拍攝影 像生成再構成資料。對於再構成處理,提出了各種方法,舉例而言,可使用Feldkamp法。 At step SA11, the X-ray inspection apparatus 100 takes a photograph from multiple directions. Like generating reconstituted material. For the reconstitution process, various methods have been proposed, and for example, the Feldkamp method can be used.

在步驟SA13,X光檢查裝置100擷取基板高度,亦即,配置有零件的基板表面之高度。在步驟SA13進行之處理的詳細情形,將於後述。 In step SA13, the X-ray inspection apparatus 100 captures the height of the substrate, that is, the height of the surface of the substrate on which the component is placed. The details of the processing performed in step SA13 will be described later.

在步驟SA15,X光檢查裝置100取得在高度方向距離基板高度僅為規定距離高度的斷層影像作為檢查用之檢查影像。在此,檢查影像高度與基板高度間的距離係由使用者設定。又,此距離較佳為依據檢查對象1的設計資料及檢查方法而設定。本實施形態中,在配置有零件的一側,將從配置有零件之基板表面稍微遠離之高度的斷層影像設定為檢查影像。 In step SA15, the X-ray inspection apparatus 100 acquires a tomographic image having a height at a predetermined distance from the substrate in the height direction as an inspection image for inspection. Here, the distance between the height of the image and the height of the substrate is checked by the user. Moreover, this distance is preferably set in accordance with the design data and the inspection method of the inspection object 1. In the present embodiment, on the side where the component is placed, the tomographic image at a height slightly away from the surface of the substrate on which the component is placed is set as the inspection image.

在步驟SA17,X光檢查裝置100使用檢查影像,進行視野的良否判定。亦即,X光檢查裝置100檢查加熱後的焊接之濡濕性、焊接的孔洞及焊接橋的有無、異物的有無等。已知有各種良否判定手法,X光檢查裝置100只要使用適合檢查項目的良否判定手法即可。 In step SA17, the X-ray inspection apparatus 100 determines whether or not the visual field is good or bad using the inspection image. In other words, the X-ray inspection apparatus 100 checks the wettability of the welded after heating, the presence or absence of the welded hole and the welded bridge, and the presence or absence of foreign matter. Various kinds of good or bad determination methods are known, and the X-ray inspection apparatus 100 may use a good or bad determination method suitable for an inspection item.

本實施形態中,良否判定部78依據二元化影像內的焊接面積,判定安裝基板的良否。以下,參照第13圖,對本實施形態中基板的良否判定之態樣進行說明。第13圖係用於說明關於依據二元化影像內之焊接面積的良否判定之圖。 In the present embodiment, the quality determination unit 78 determines whether or not the mounting substrate is good or not based on the welding area in the binarized image. Hereinafter, the aspect of the determination of the quality of the substrate in the present embodiment will be described with reference to Fig. 13. Figure 13 is a diagram for explaining the determination of the quality of the welded area in the binarized image.

第13(A)圖係安裝有電子零件之基板的斜視圖。在基板501上,安裝有第1零件502與第2零件503。第2的零件503係透過BGA(Ball Grid Array)504等,在物理上及電氣 上連接到基板501。 Fig. 13(A) is a perspective view of the substrate on which the electronic component is mounted. The first component 502 and the second component 503 are attached to the substrate 501. The second part 503 is physically and electrically transmitted through a BGA (Ball Grid Array) 504 or the like. Connected to the substrate 501.

第13(B)圖係在垂直於基板501面之剖面切斷基板501與第2零件503的連接處之剖面圖。BGA504係連接第2零件503與基板501的表面層505。BGA504經加熱變形成為加熱後的狀態506。然而,在加熱後的狀態506有時候會產生孔洞507。又,多個焊接球(以下,亦稱「球端子」)有時候會結合而形成焊接橋508。 Fig. 13(B) is a cross-sectional view showing the connection between the substrate 501 and the second member 503 in a cross section perpendicular to the surface of the substrate 501. The BGA 504 connects the second part 503 and the surface layer 505 of the substrate 501. The BGA 504 is thermally deformed into a heated state 506. However, the hole 507 is sometimes created in the heated state 506. Further, a plurality of solder balls (hereinafter also referred to as "ball terminals") sometimes combine to form a solder bridge 508.

X光檢查裝置100若包含焊接橋,會生成期望區域的三維資料,並切割三維資料而形成斷層影像。X光檢查裝置100會將形成之斷層影像二元化,取得將影像分離為焊接與和接以外的二元化影像。在此二元化處理,可使用判別分析法等一般的二元化處理。檢查裝置從二元化影像對白色(或1)的部分進行標示,而取得區別焊接的標示影像。此標示處理中,可使用如藉由光柵掃描判定有無連結的一般標示處理。 When the X-ray inspection apparatus 100 includes a welding bridge, three-dimensional data of a desired area is generated, and three-dimensional data is cut to form a tomographic image. The X-ray inspection apparatus 100 binarizes the formed tomographic image, and separates the image into a binary image other than the welding and the bonding. In this binary processing, a general binary processing such as a discriminant analysis method can be used. The inspection device marks the white (or 1) portion from the binarized image to obtain a distinctive image of the weld. In this labeling process, general labeling processing such as determining whether or not there is a link by raster scanning can be used.

平行於基板501面的剖面之例顯示於第13(C)圖。第13(C)圖係第13(B)圖中以虛線表示之剖面所切斷的連接處之剖面圖。在第13(C)圖,將焊接以白色表示,焊接以外以斜線表示。在此表示正常、孔洞、焊接橋3種狀態。參照第13(C)圖,有孔洞507的情況下,焊接內產生無焊接的部分。有焊接橋508的情況下,在比正常時更廣泛的區域觀察到焊接。 An example of a cross section parallel to the surface of the substrate 501 is shown in Fig. 13(C). Fig. 13(C) is a cross-sectional view of the joint cut by the cross section indicated by the broken line in Fig. 13(B). In the 13th (C) diagram, the welding is indicated by white, and the welding is indicated by oblique lines. Here, three states of normal, hole, and welded bridge are shown. Referring to Fig. 13(C), in the case of the hole 507, a portion having no weld is generated in the weld. In the case of the welded bridge 508, the welding is observed in a wider area than normal.

檢查裝置從標示影像計算個別焊接的面積(白色或1的像素的個數),並求得焊接的面積。檢查裝置為,只要面積在一定範圍內則視為良品,除此之外則視為不良品 ,藉此方式來判定焊接接合面的良否。一般由使用者預先設定此一定範圍的閾值。 The inspection device calculates the area of the individual welds (the number of white or 1 pixels) from the mark image and obtains the area of the weld. The inspection device is considered to be a good product as long as the area is within a certain range, and is regarded as a defective product. In this way, the quality of the welded joint is determined. The threshold of this range is generally preset by the user.

回到第12圖,在步驟SA18,X光檢查裝置100判定是否對所有視野進行良否判定。在有不進行良否判定之視野的情況下,(在步驟SA18為否),則X光檢查裝置100重複從CT拍攝(步驟SA9)開始的處理。另外,對所有視野進行良否判定(在步驟SA18為是)的情況下,則前進到步驟SA19進行處理。 Returning to Fig. 12, in step SA18, the X-ray inspection apparatus 100 determines whether or not the quality of all the visual fields is determined. When there is a field of view in which the determination is not made, (NO in step SA18), the X-ray inspection apparatus 100 repeats the processing from the CT imaging (step SA9). When the quality of all the fields of view is determined (YES in step SA18), the process proceeds to step SA19.

在步驟SA19,X光檢查裝置100將基板從X光檢查裝置100移出。具體而言,X光檢查裝置100藉由檢查對象驅動機構110將基板移動到X光檢查裝置100外。 At step SA19, the X-ray inspection apparatus 100 removes the substrate from the X-ray inspection apparatus 100. Specifically, the X-ray inspection apparatus 100 moves the substrate outside the X-ray inspection apparatus 100 by the inspection target drive mechanism 110.

以上,X光檢查裝置100完成對1個檢查對象1的檢查(步驟SA21)。X光檢查裝置100對多個檢查對象1執行線內檢查的情況下,則重複目前為止說明的從步驟SA1到步驟SA21之一連串處理。 As described above, the X-ray inspection apparatus 100 completes the inspection of one inspection object 1 (step SA21). When the X-ray inspection apparatus 100 performs the in-line inspection on the plurality of inspection objects 1, the series of processing from step SA1 to step SA21 described so far is repeated.

第14圖係用於說明X光檢查裝置100的其他構造之概念圖。 Fig. 14 is a conceptual diagram for explaining other configurations of the X-ray inspection apparatus 100.

在第1圖所示構造,檢查對象DB200係設置於X光檢查裝置100的內部之構造。 In the structure shown in FIG. 1, the inspection target DB 200 is configured to be disposed inside the X-ray inspection apparatus 100.

然而,若將X光檢查裝置100使用於線內,未必要將CAD資料等儲存於此X光檢查裝置100,亦可如第14圖所示那樣在由網路連接並配置於生產線外之外部資料作成裝置內,儲存檢查對象DB200。 However, if the X-ray inspection apparatus 100 is used in a line, it is not necessary to store CAD data or the like in the X-ray inspection apparatus 100, and as shown in Fig. 14, it may be connected by a network and disposed outside the production line. In the data creation device, the inspection object DB 200 is stored.

藉由如以上說明之本實施形態的X光檢查裝置100之構造,因為將X光影像與可見光影像重疊並顯示檢查位置 ,所以使用者可掌握檢查對象物(例如,焊接球)與檢查位置的關係,具有使用者易於視覺辨識的效果。 According to the configuration of the X-ray inspection apparatus 100 of the present embodiment as described above, the X-ray image is superimposed on the visible light image and the inspection position is displayed. Therefore, the user can grasp the relationship between the inspection object (for example, the welding ball) and the inspection position, and has an effect that the user can easily visually recognize.

又,可將表面及背面對位並確定檢查位置,以良好精度執行表面及背面的對位。 Further, the surface and the back surface can be aligned and the inspection position can be determined, and the alignment of the surface and the back surface can be performed with good precision.

又,因為係顯示表面/背面相關之CT斷層影像,故對於表面/背面,將更容易分辨對象物。 Moreover, since the CT tomographic image related to the surface/back surface is displayed, it is easier to distinguish the object from the surface/back surface.

此處揭示的實施形態應視為全為例示,而非用來限制。本發明範圍並非僅為上述說明,而是由申請專利範圍所示,且包含與申請專利範圍均等的意義及範圍內之所有變更。 The embodiments disclosed herein are to be considered as illustrative and not restrictive. The scope of the present invention is defined by the scope of the claims and the scope of the claims and the scope of the invention.

1‧‧‧檢查對象 1‧‧‧Check objects

10‧‧‧X光源 10‧‧‧X source

12‧‧‧基板 12‧‧‧Substrate

18‧‧‧X光 18‧‧‧X-ray

22‧‧‧X光檢測器驅動部 22‧‧‧X-ray detector drive unit

23‧‧‧X光檢測器 23‧‧‧X-ray detector

30‧‧‧影像取得控制機構 30‧‧‧Image acquisition control agency

32‧‧‧檢測器驅動控制機構 32‧‧‧Detector drive control mechanism

34‧‧‧影像資料取得部 34‧‧‧Image Data Acquisition Department

40‧‧‧輸入部 40‧‧‧ Input Department

50‧‧‧輸出部 50‧‧‧Output Department

60‧‧‧X光源控制機構 60‧‧‧X light source control mechanism

62‧‧‧電子束控制部 62‧‧‧Electronic Beam Control Department

70‧‧‧演算部 70‧‧‧ Calculation Department

72‧‧‧X光源控制部 72‧‧‧X Light Source Control Department

74‧‧‧影像取得控制部 74‧‧‧Image Acquisition Control Department

76‧‧‧再構成部 76‧‧‧Reconstitution

78‧‧‧良否判定部 78‧‧‧Good and bad judgment department

80‧‧‧檢查對象位置控制部 80‧‧‧Check object position control unit

82‧‧‧X光焦點位置計算部 82‧‧‧X-ray focus position calculation unit

84‧‧‧拍攝條件設定部 84‧‧‧Photographing conditions setting section

86‧‧‧檢查資訊生成部 86‧‧‧Check information generation department

90‧‧‧記憶部 90‧‧‧Memory Department

92‧‧‧X光焦點位置資訊 92‧‧‧X-ray focus position information

94‧‧‧拍攝條件資訊 94‧‧‧ shooting conditions information

96‧‧‧程式 96‧‧‧Program

98‧‧‧影像資料 98‧‧‧Image data

100‧‧‧X光檢查裝置 100‧‧‧X-ray inspection device

110‧‧‧檢查對象位置驅動機構 110‧‧‧Check object position drive mechanism

111a、111b‧‧‧台座 111a, 111b‧‧‧ pedestal

112a、112b‧‧‧基板軌道 112a, 112b‧‧‧ substrate track

114‧‧‧位移計 114‧‧‧displacement meter

116‧‧‧光學照相機 116‧‧‧Optical camera

120‧‧‧檢查對象位置控制機構 120‧‧‧Check object position control mechanism

第1圖為本實施形態之X光檢查裝置100的概略方塊圖。 Fig. 1 is a schematic block diagram of an X-ray inspection apparatus 100 according to the present embodiment.

第2圖為用於說明本實施形態之X光檢查裝置100的構造之圖。 Fig. 2 is a view for explaining the structure of the X-ray inspection apparatus 100 of the embodiment.

第3圖為用於說明本實施形態中教示處理之流程的流程圖。 Fig. 3 is a flow chart for explaining the flow of the teaching process in the embodiment.

第4圖為用於說明第3圖所示「影像對位處理(S114)」與「影像伸縮、重疊處理(S116)」之流程圖。 Fig. 4 is a flow chart for explaining "image matching processing (S114)" and "image stretching and superimposing processing (S116)" shown in Fig. 3.

第5圖為用於說明基板表側之可見光影像與背側的可見光影像與X光影像之對位的概念圖。 Fig. 5 is a conceptual diagram for explaining the alignment of the visible light image on the front side of the substrate and the visible light image on the back side and the X-ray image.

第6圖為將可見光影像與X光影像重疊顯示的時候,設定光學影像穿透率之畫面例。 Fig. 6 is a view showing an example of a screen for setting the optical image transmittance when the visible light image and the X-ray image are superimposed and displayed.

第7圖為表示將可見光影像(表側)與X光再構成影像重疊顯示之顯示例的圖。 Fig. 7 is a view showing a display example in which a visible light image (front side) and an X-ray reconstruction image are superimposed and displayed.

第8圖為表示用於將第7圖所示影像進一步縮小,並確認半導體晶片全體之焊接位置的顯示例之圖。 Fig. 8 is a view showing a display example for further reducing the image shown in Fig. 7 and confirming the welding position of the entire semiconductor wafer.

第9圖為表示將可見光影像(背側)與零件編號重疊顯示之顯示例的圖。 Fig. 9 is a view showing a display example in which a visible light image (back side) is superimposed on a part number.

第10圖為表示將可見光影像(背側)與X光穿透影像重疊顯示之顯示例的圖。 Fig. 10 is a view showing a display example in which a visible light image (back side) and an X-ray transmission image are superimposed and displayed.

第11圖為表示與第10圖同樣將可見光影像(背側)與X光穿透影像重疊顯示之顯示例的圖。 Fig. 11 is a view showing a display example in which a visible light image (back side) and an X-ray transmission image are superimposed and displayed in the same manner as in Fig. 10.

第12圖為將本實施形態之X光檢查的流程以流程圖形式表示之圖。 Fig. 12 is a view showing the flow of the X-ray inspection of the present embodiment in the form of a flowchart.

第13圖為針對依據二元化影像內之焊接面積的良否判定進行說明之圖。 Fig. 13 is a view for explaining the determination of the quality of the welded area in the binarized image.

第14圖為用於說明X光檢查裝置100的其他構造之概念圖。 Fig. 14 is a conceptual diagram for explaining another configuration of the X-ray inspection apparatus 100.

S100‧‧‧教示開始 S100‧‧‧ teaching begins

S102‧‧‧移入基板(背向) S102‧‧‧ Moving into the substrate (backward)

S104‧‧‧拍攝基板(背面):可見光影像 S104‧‧‧Photographing substrate (back): visible light image

S106‧‧‧移出基板 S106‧‧‧Remove the substrate

S108‧‧‧移入基板(面向) S108‧‧‧ Move into the substrate (facing)

S110‧‧‧拍攝基板(表面):可見光影像 S110‧‧‧Photographing substrate (surface): visible light image

S112‧‧‧拍攝基板:X光影像 S112‧‧‧Photographing substrate: X-ray image

S114‧‧‧重疊影像位置 S114‧‧‧Overlapping image position

S116‧‧‧伸縮、重疊影像 S116‧‧‧ Telescopic, overlapping images

S118‧‧‧顯示重疊影像(表面用) S118‧‧‧Display overlay image (for surface)

S120‧‧‧設定表面視窗(手動或CAD模式) S120‧‧‧Set surface window (manual or CAD mode)

S122‧‧‧切換成背面顯示 S122‧‧‧Switch to back display

S124‧‧‧顯示重疊影像(背面用) S124‧‧‧Display overlay image (for back)

S126‧‧‧設定背面視窗(手動或CAD模式) S126‧‧‧Set back window (manual or CAD mode)

S128‧‧‧設定、測試檢查基準 S128‧‧‧Setting, test and inspection criteria

S130‧‧‧移出基板 S130‧‧‧Remove the substrate

S132‧‧‧教示結束 S132‧‧‧Teaching ends

Claims (10)

一種檢查區域設定方法,係在使用X光執行被檢查物之檢查的X光檢查裝置中,設定前述被檢查對象的檢查區域,其具備以下步驟:對包含前述被檢查物之檢查對象的第1區域之可見光影像,進行拍攝的步驟;對包含前述被檢查物之前述檢查對象的第2區域,進行X光影像拍攝的步驟;將前述第1區域的前述可見光影像及前述第2區域的前述X光影像,在位置及倍率一致的情況下,連同表示前述檢查對象位置的標記一起同時顯示之步驟;及針對所顯示之前述檢查對象的前述標記位置及前述X光影像的前述檢查對象位置,接受確認的輸入而確定前述檢查區域的步驟。 In an X-ray inspection apparatus that performs inspection of an inspection object using X-rays, an inspection area to be inspected is set, and the inspection area includes the first step of inspecting the inspection target including the inspection object. a step of capturing a visible light image of the region; and performing a X-ray image capturing process on the second region of the inspection target including the inspection object; and the visible light image of the first region and the X of the second region The optical image is displayed simultaneously with the mark indicating the position of the inspection object when the position and the magnification are the same; and the position of the mark to be displayed and the position of the test object of the X-ray image are accepted The step of determining the aforementioned inspection area by the input of the confirmation. 如申請專利範圍第1項之檢查區域設定方法,其中前述被檢查物係配置有多個電子零件的基板,拍攝前述可見光影像的步驟係包含拍攝前述基板之表面側的第1可見光影像及背面側的第2可見光影像的步驟;前述同時顯示之步驟係包含將前述第1或第2可見光影像之任一者與前述X光影像在位置及倍率一致的情況下進行顯示之步驟;及前述確定步驟係包含確定表面側及背面側各自之前述檢查區域之步驟。 The method for setting an inspection region according to the first aspect of the invention, wherein the object to be inspected is a substrate on which a plurality of electronic components are arranged, and the step of capturing the visible light image includes capturing a first visible light image and a back side of a surface side of the substrate. The step of displaying the second visible light image; the step of simultaneously displaying the step of displaying the first or second visible light image when the X-ray image is aligned with the position and the magnification; and the determining step The step of determining the aforementioned inspection regions of each of the front side and the back side is included. 如申請專利範圍第2項之檢查區域設定方法,其中前述 X光影像係包含依據從多數透視方向拍攝之多數X光影像所再構成之前述被檢查物的前述檢查對象的區域之再構成影像。 The method for setting an inspection area according to item 2 of the patent application scope, wherein the foregoing The X-ray image includes a reconstructed image of the region of the inspection target based on the plurality of X-ray images captured from a plurality of perspective directions. 如申請專利範圍第3項之檢查區域設定方法,其中前述再構成影像係在前述第1及第2可見光影像中,包含成為死角的前述檢查對象之部分之與前述基板平行之剖面的斷層影像。 The method for setting an inspection region according to the third aspect of the invention, wherein the reconstructed image includes a tomographic image of a cross section parallel to the substrate in a portion of the inspection target that is a blind spot in the first and second visible light images. 如申請專利範圍第1項之檢查區域設定方法,其中前述X光影像係前述被檢查物的X光穿透影像。 The method for setting an inspection region according to the first aspect of the invention, wherein the X-ray image is an X-ray image of the object to be inspected. 一種X光檢查系統,係使用X光檢查被檢查物,其具備:記憶手段,用於儲存指定前述檢查物的檢查對象位置之資訊;可見光影像拍攝手段,拍攝包含前述被檢查物之前述檢查對象的第1區域之可見光影像;X光影像拍攝手段,對包含前述被檢查物之前述檢查對象的第2區域,拍攝X光影像;輸出手段,將前述第1區域的前述可見光影像和前述第2區域的前述X光影像,在位置及倍率一致的情況下進行顯示,並且依據儲存在前述記憶手段的資訊而同時顯示表示前述檢查對象位置的標記;輸入手段,針對所顯示之前述檢查對象的前述標記位置及前述X光影像中的前述檢查對象位置,接受確認的輸入;及控制手段,依據前述輸入,將用於特定經確定的前述檢查區域之設定資訊儲存於前述記憶手段。 An X-ray inspection system for detecting an inspection object by X-ray inspection, comprising: a memory means for storing information specifying an inspection target position of the inspection object; and a visible light imaging means for photographing the inspection object including the inspection object The visible light image of the first region; the X-ray image capturing means captures the X-ray image of the second region including the inspection target of the inspection object; and the output means, the visible light image of the first region and the second image The X-ray image of the area is displayed when the position and the magnification are the same, and the mark indicating the position of the inspection object is simultaneously displayed according to the information stored in the memory means; and the input means is for the aforementioned inspection object to be displayed. And the control means inputs the setting information for specifying the determined inspection area to the memory means according to the input. 如申請專利範圍第6項之X光檢查系統,其中前述被檢查物係配置有多個電子零件的基板;前述可見光影像拍攝手段係拍攝前述基板之表面側的第1可見光影像及背面側的第2可見光影像;前述輸出手段係將前述第1或第2可見光影像之任一者與前述X光影像在位置及倍率一致的情況下進行顯示;及前述控制手段,係將用於特定表面側及背面側各自之前述檢查區域之設定資訊儲存於前述記憶手段。 The X-ray inspection system according to the sixth aspect of the invention, wherein the object to be inspected is a substrate in which a plurality of electronic components are disposed; and the visible light image capturing means captures a first visible light image on the front surface side of the substrate and a rear side 2 visible light image; wherein the output means displays any one of the first or second visible light images and the X-ray image at a position and magnification; and the control means is used for a specific surface side and The setting information of each of the aforementioned inspection areas on the back side is stored in the aforementioned memory means. 如申請專利範圍第7項之X光檢查系統,其中前述X光影像係包含依據從多數透視方向拍攝之多數X光影像所再構成之前述被檢查物的前述檢查對象的區域之再構成影像。 The X-ray inspection system according to claim 7, wherein the X-ray image includes a reconstructed image of a region of the inspection target based on the plurality of X-ray images captured from a plurality of perspective directions. 如申請專利範圍第8項之X光檢查系統,其中前述再構成影像係在前述第1及第2可見光影像中,包含成為死角的前述檢查對象之部分之與前述基板平行之剖面的斷層影像。 The X-ray inspection system of claim 8, wherein the reconstructed image includes a tomographic image of a cross section parallel to the substrate in a portion of the inspection target that is a blind spot in the first and second visible light images. 如申請專利範圍第6項之X光檢查系統,其中前述X光影像係前述被檢查物的X光穿透影像。 The X-ray inspection system of claim 6, wherein the X-ray image is an X-ray image of the object to be inspected.
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