TW201247688A - Monomer for production of polymer compound and method for producing polymer compound - Google Patents

Monomer for production of polymer compound and method for producing polymer compound Download PDF

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TW201247688A
TW201247688A TW101111026A TW101111026A TW201247688A TW 201247688 A TW201247688 A TW 201247688A TW 101111026 A TW101111026 A TW 101111026A TW 101111026 A TW101111026 A TW 101111026A TW 201247688 A TW201247688 A TW 201247688A
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Hiroki Terai
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Sumitomo Chemical Co
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    • C08G61/12Macromolecular compounds containing atoms other than carbon in the main chain of the macromolecule
    • C08G61/122Macromolecular compounds containing atoms other than carbon in the main chain of the macromolecule derived from five- or six-membered heterocyclic compounds, other than imides
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    • C08G61/12Macromolecular compounds containing atoms other than carbon in the main chain of the macromolecule
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    • C08G61/123Macromolecular compounds containing atoms other than carbon in the main chain of the macromolecule derived from five- or six-membered heterocyclic compounds, other than imides derived from five-membered heterocyclic compounds
    • C08G61/126Macromolecular compounds containing atoms other than carbon in the main chain of the macromolecule derived from five- or six-membered heterocyclic compounds, other than imides derived from five-membered heterocyclic compounds with a five-membered ring containing one sulfur atom in the ring
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    • H10K10/00Organic devices specially adapted for rectifying, amplifying, oscillating or switching; Organic capacitors or resistors having potential barriers
    • H10K10/40Organic transistors
    • H10K10/46Field-effect transistors, e.g. organic thin-film transistors [OTFT]
    • H10K10/462Insulated gate field-effect transistors [IGFETs]
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    • C08G2261/00Macromolecular compounds obtained by reactions forming a carbon-to-carbon link in the main chain of the macromolecule
    • C08G2261/30Monomer units or repeat units incorporating structural elements in the main chain
    • C08G2261/31Monomer units or repeat units incorporating structural elements in the main chain incorporating aromatic structural elements in the main chain
    • C08G2261/314Condensed aromatic systems, e.g. perylene, anthracene or pyrene
    • C08G2261/3142Condensed aromatic systems, e.g. perylene, anthracene or pyrene fluorene-based, e.g. fluorene, indenofluorene, or spirobifluorene
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    • C08G2261/30Monomer units or repeat units incorporating structural elements in the main chain
    • C08G2261/32Monomer units or repeat units incorporating structural elements in the main chain incorporating heteroaromatic structural elements in the main chain
    • C08G2261/322Monomer units or repeat units incorporating structural elements in the main chain incorporating heteroaromatic structural elements in the main chain non-condensed
    • C08G2261/3223Monomer units or repeat units incorporating structural elements in the main chain incorporating heteroaromatic structural elements in the main chain non-condensed containing one or more sulfur atoms as the only heteroatom, e.g. thiophene
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    • C08G2261/00Macromolecular compounds obtained by reactions forming a carbon-to-carbon link in the main chain of the macromolecule
    • C08G2261/30Monomer units or repeat units incorporating structural elements in the main chain
    • C08G2261/32Monomer units or repeat units incorporating structural elements in the main chain incorporating heteroaromatic structural elements in the main chain
    • C08G2261/324Monomer units or repeat units incorporating structural elements in the main chain incorporating heteroaromatic structural elements in the main chain condensed
    • C08G2261/3246Monomer units or repeat units incorporating structural elements in the main chain incorporating heteroaromatic structural elements in the main chain condensed containing nitrogen and sulfur as heteroatoms
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    • C08G2261/00Macromolecular compounds obtained by reactions forming a carbon-to-carbon link in the main chain of the macromolecule
    • C08G2261/40Polymerisation processes
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    • C08G2261/411Suzuki reactions
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    • C08G2261/00Macromolecular compounds obtained by reactions forming a carbon-to-carbon link in the main chain of the macromolecule
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Abstract

An objective of this invention is to provide a diboronic acid derivative of conjugated polymer compound with high molecular weight capable of being produced by Suzuki coupling method. The present invention provides a compound represent by formula (I). [wherein, A represents an arylene group, a heteroarylene group, -C ≡ C- or -CR31=CR32-. R31 and CR32 each independently represent a hydrogen atom, an alkyl group, an aryl group, a heteroaryl group or cyano group. R21, R22, R23, R24, R25, R26, R27 and R28 each independently represent a hydrogen atom, an alkyl group, an alkoxyl group, an alkylthio group, a halogen atom, an aryl group or a heteroaryl group. M1, m2, m3 and m4 each independently represent an integer of 1 to 5. n1, n2, n3 and n4 each independently represent 0 or 1.]

Description

201247688 六、發明說明: 【發明所屬之技術領域】 本發明係有關於一種高分子化合物製造用的單體及 高分子化合物的製造方法。 【先前技術】 共軛高分子化合物係被檢討應用在有機電晶體元 件、有機太陽能電池元件、有機電激發光元件等的有機半 導體元件,而正積極進行各種種類的共軛高分子化合物之 研究開發。 作為對有機半導體元件的特性造成重大影響之主要 因素,已知係共輛高分子化合物的分子量。 例如非專利文獻1係記載使用具有式(A)表示的重複 單元且分子量不同的高分子化合物製造複數個有機電晶體 元件時,當使用分子量越高的高分子化合物,有機電晶體 的場效移動度(electron field-effect mobility)越高。201247688 VI. Description of the Invention: [Technical Field of the Invention] The present invention relates to a monomer for producing a polymer compound and a method for producing the polymer compound. [Prior Art] The conjugated polymer compound has been reviewed and applied to organic semiconductor devices such as organic transistor devices, organic solar cells, and organic electroluminescent devices, and research and development of various types of conjugated polymer compounds are being actively carried out. . As a main factor which greatly affects the characteristics of the organic semiconductor element, the molecular weight of the total polymer compound is known. For example, when a plurality of organic transistor elements are produced using a polymer compound having a repeating unit represented by the formula (A) and having different molecular weights, a polymer compound having a higher molecular weight is used, and the field effect of the organic transistor is shifted. The higher the electron field-effect mobility.

η-ΟβΗ-ο (A) 又,非專利文獻2係記載,使用具有式(B)表示的重 複單元且分子量高的的分子化合物所製造之有機太陽能電 池元件,相較於使用分子量低的高分子化合物所製造之有 機太陽能電池元件的特性,使用分子量高的高分子化合物 所製造之有機太陽能電池元件之光電流(JPh)係較大。 324085 4 201247688η-ΟβΗ-ο (A) Further, Non-Patent Document 2 discloses that an organic solar cell element produced by using a molecular compound having a repeating unit represented by the formula (B) and having a high molecular weight is higher than a molecular weight of a low molecular weight. The characteristics of the organic solar cell element produced by the molecular compound are large in the photocurrent (JPh) of the organic solar cell element produced by using the polymer compound having a high molecular weight. 324085 4 201247688

(B) 作為共輛高分子化合物的製造方法,係檢討在把觸媒 存在下使芳香族化合㈣m其衍生物、與芳香族化 合物的二㈣物連續地崎偶合之鈐木偶合法。 作為使用鈐木偶合法而製造分子量高的共軛高分子 化合物之方法,例如有提案揭示使n塞吩二硼酸的L3-丙二 醇醋衍生物與芳香族化合物的二減減應之方法;及使 嗟吩二鑛的頻哪_衍生物與芳香族化合物的二齒化物 反應之方法(非專利文獻3)。 另方面’專利文獻1係記載有機硼酸所含有之硼酸 基’係此夠以N-甲基亞胺基二乙酸等保護,以及經使用N_ 曱基亞胺基二乙酸等保護爾基之有機喊,係與有機鹵 化物反應(鈴木偶合法)來提供交又偶合(㈣ss e。叩Hng) 生成物。 (先前技術文獻) 專利文獻 [專利文獻1]日本特表2010-534240 非專利文獻 [非專利文獻 1] Advanced Materials、2003 年、第 15 卷、ρ· 1519-1522 324085 5 201247688 [非專利文獻 2] Organic Electronics、2009 年、第 10 卷、p. 1275-1281 [非專利文獻 3] Macromolecules、2001 年、第 34 卷、 ρ· 5386-5393 【發明内容】 (發明欲解決之課題) 但是,以合成實際上能夠應用在有機半導體元件之共 軛高分子化合物為目的時,上述之先前的方法係有難以充 分地提高共軛高分子化合物的分子量之問題。 更詳言之,藉由使用鈴木偶合法進行芳香族化合物的 二硼酸或其衍生物、與芳香族化合物的二齒化物的聚縮 合,而製造共輥咼分子化合物的情況,特別是該芳香族化 合物係雜環狀結構時,芳香族化合物與硼原子的鍵結係在 聚合反應前被切斷而難以產生偶合反應。認為這是因為二 硼酸的硼原子係具有空配位位置,水等的親核試劑係容易 進行攻擊之緣故。又’雖然理由不明確’但認為有機化合 物的二硼酸的有機基係具有芳香族性的雜環狀結構時,水 等親核試劑係更容易對硼原子的空配位位置進行攻擊。 亦即,如非專利文獻3所表示之使用有機二硼酸的伸 烷基二醇酯衍生物與有機二齒化物之鈐木偶合法,係難以 提高共輛高分子化合物的分子量,有機二棚酸的有機基係 雜芳基時’係更難以提高共輛高分子化合物的分子量。 因此,本發明係以提供能夠使用鈐木偶合法而製造分 子量咼的共輛高分子化合物之二蝴酸的衍生物作為目的。 324085 6 201247688 (解決課題之手段) 亦即,本發明係提供式(1)表示之化合物,(B) As a method for producing a total of a polymer compound, a ruthenium formula in which an aromatic compound (tetra) m derivative and a di(tetra) compound of an aromatic compound are continuously coupled in the presence of a catalyst is examined. As a method for producing a conjugated polymer compound having a high molecular weight by using an eucalyptus formula, for example, there is a proposal to disclose a method for reducing the amount of an L3-propanediol vinegar derivative of an n-dithioborate and an aromatic compound; A method of reacting a pinion-derivative of a phenanthrene ore with a bidentate of an aromatic compound (Non-Patent Document 3). In the other aspect, Patent Document 1 describes that a boric acid group contained in an organic boric acid is sufficiently protected by N-methyliminodiacetic acid or the like, and an organic shryling is used by using N-mercaptoimido diacetic acid or the like. , reacting with an organic halide (Suzuki even law) to provide cross-coupling ((iv) ss e. 叩Hng) product. (Prior Art Document) Patent Document [Patent Document 1] Japanese Patent Application Publication No. 2010-534240 Non-Patent Document 1 [Non-Patent Document 1] Advanced Materials, 2003, Vol. 15, ρ·1519-1522 324085 5 201247688 [Non-Patent Document 2 Organic Electronics, 2009, Vol. 10, p. 1275-1281 [Non-Patent Document 3] Macromolecules, 2001, Vol. 34, ρ·5386-5393 [Summary of the Invention] In the case where the synthesis can be practically applied to a conjugated polymer compound of an organic semiconductor element, the above-mentioned conventional method has a problem that it is difficult to sufficiently increase the molecular weight of the conjugated polymer compound. More specifically, a co-roller molecular compound is produced by polycondensation of an aromatic compound diboric acid or a derivative thereof with a bidentate of an aromatic compound by using a Suzuki equation, in particular, the aromatic When the compound is a heterocyclic structure, the bond between the aromatic compound and the boron atom is cleaved before the polymerization reaction, and it is difficult to cause a coupling reaction. This is considered to be because the boron atom system of diboric acid has an empty coordination position, and a nucleophile such as water is easily attacked. Further, although the reason is not clear, it is considered that when the organic group of the diboric acid of the organic compound has an aromatic heterocyclic structure, the nucleophilic reagent such as water is more likely to attack the empty coordination position of the boron atom. That is, as shown in Non-Patent Document 3, it is difficult to increase the molecular weight of a common polymer compound by using an alkylene glycol ester derivative of an organic diboric acid and an organic bidentate compound. In the case of an organic heteroaryl group, it is more difficult to increase the molecular weight of a plurality of polymer compounds. Accordingly, the present invention has an object of providing a derivative of a dicarboxylic acid which is capable of producing a molecular weight of a total of a polymer compound by using a eucalyptus formula. 324085 6 201247688 (Means for Solving the Problem) That is, the present invention provides a compound represented by the formula (1),

31 [12中,A係表示伸芳基、伸雜芳基、一C = C_或一 CR ^ R及俨係各自獨立地表示氫原子、烷基、芳 基雜:基或氰基。R"及Rl2係各自獨立地表示氮原子、 烷基、芳基或雜芳基。R21、R22、r23、r24、r25、r26、r27 及 R係各^獨立地表不氫原子、烧基、院氧基、烧硫基、齒 '、子芳基或雜芳基。R21係複數個時,該等可以相同亦可 以不同。R22係複數個時,該等可以相同亦可以不同。π 係複數個時,料可以相同亦可以不同。r24係複數個時, 該等可以相同亦可以不同。r25係複數個時,該等可以相同 ^可以不同。⑼係複數個時,該等可以相同亦可以不同。 R27係複數個時,該等可以相同亦可以不同。r28係複數個 時’該等可以相同亦可以不同1卜心^及以係各自 獨立地表示1至5的整數。η卜η2、π3及n4係各自獨立 地表不0或1]。 又,本發明係提供一種含有式(6)表示的重複單元及 式(Ό表示的重複單元之高分子化合物的製造方法,其係在 324085 201247688 過渡金屬錯合物及鹼的存在下,使前述化合物與式(5)表示 的化合物進行聚合; ' X1——E——X2 (5) [式中,E係表示伸芳基、伸雜芳基、一—戋〜 CR91=CR92—。…及^係各自獨立地表示氫原子、烷A、芳 基、雜芳基或氰基係各自獨立地表示自原子、燒 基磺酸酯基、芳基磺酸酯基]; ① +A+ 如 (6) (7) [式⑹及式⑺中’ A及E係表示與前述相同意義]。 (發明之效果) 依照本發明,因為能夠使用鈴木偶合法而製造分子量 高的高分子化合物,所以本發明係非常有用。 【實施方式】 以下’說明本發明。 〈式(1)表示之化合物> 中,A係表示伸芳基、伸雜芳基、—c^c -或一CR31=CR32—。rw 另 p32 “ K及R係各自獨立地表示氫原子、烷 基、芳基、雜芳基或氰基n R,2係各自獨立地表示氨 原子、烷基、芳基或雜芳基。r21、r22、r23、r24、r25、尺26、 r及各自獨立地表示氫原子、烧基、錄基、燒硫 324085 201247688 二it原子、芳基或雜芳基。r21係複數個時,該等可以相 ^亦^不同H複數個時,該等可以㈣亦可以不 係複數個時’該等可以相同亦可以不m複數 固時,該等可以相同亦可以不同。r25係複數個時,該等可 以相同亦可以列。卩26係複數_,料可以綱亦可以 不同R係複數個時,該等可以相同亦可以不同。π係複 數個時,料可以㈣亦可以不m m3及㈣係 各自獨立地表示1至5的整數。“、^⑹及⑷系各自 獨立地表示〇或1。 以A表不之伸芳基,係從芳香族烴化合物除去直接鍵 2構成芳香環的碳原子之2個氫原子後之原子團,包括 含苯環的基、含縮合環的基、含有2個以上之獨立的芳香 族%或縮合環直接鍵結而成的結構之基。伸芳基亦可以具 有取代基。伸芳基所具有的碳數通常為6至6〇,以6至2〇 為佳。該碳數係不包含伸芳基所具有的取代基之碳數。作 為伸芳基的具體例,可舉出伸苯基、萘二基、蒽二基、菲 二基、稠四苯二基、芘二基、稠五苯二基、茈二基、薙二 基、聯苯二基、聯三苯二基、聯四苯二基。 以A表示之伸雜芳基,係從具有芳香族性的雜環狀化 合物除去直接鍵結於構成芳香環的原子之2個氫原子後之 原子團,包括含單環的基' 含縮合環的基、含有2個以上 獨立的芳香族環或縮合環直接鍵結而成的結構之基。伸雜 芳基亦可以具有取代基。伸雜芳基所具有的碳數通常為2 至60,以2至20為佳。該碳數係不包含伸雜芳基所具有 324085 9 201247688 的取代基的碳數。作為伸雜芳基的具體例,可舉出曙二吐 二基、嘆二啥二基、坐二基、嗔嗅二基、嘆吩二基、二 噻吩二基、三噻吩二基、四噻吩二基、吡咯二基、呋喃二 基、硒吩二基(selenophenediyl)、吡啶二基、吡畊二基、 嘴咬-基、二哄二基、苯并嗟吩二基、苯并t各二基、苯 并呋喃二基、喹啉二基、異喹啉二基、噻吩并噻吩二基、 苯并噻二唑二基、苯并二噻吩二基、環戊二噻吩二基。31 [12, wherein A represents an extended aryl group, a heteroaryl group, a C = C_ or a CR ^ R group and a fluorene group each independently represents a hydrogen atom, an alkyl group, an aryl group: a cyano group or a cyano group. R" and Rl2 each independently represent a nitrogen atom, an alkyl group, an aryl group or a heteroaryl group. R21, R22, r23, r24, r25, r26, r27 and R each independently represent a hydrogen atom, a pyridyl group, an alkoxy group, a sulfur-burning group, a tooth ', an aryl group or a heteroaryl group. When R21 is plural, the numbers may be the same or different. When R22 is plural, the numbers may be the same or different. When π is plural, the materials may be the same or different. When r24 is plural, the numbers may be the same or different. When r25 is plural, the same can be the same ^ can be different. (9) When there are a plurality of numbers, the items may be the same or different. When R27 is plural, these may be the same or different. When r28 is plural, these may be the same or different, and each of them may independently represent an integer of 1 to 5. The ηb, π3, and n4 systems each independently represent 0 or 1]. Further, the present invention provides a method for producing a polymer compound comprising a repeating unit represented by the formula (6) and a repeating unit represented by the formula (Ό), which is carried out in the presence of a transition metal complex and a base in 324085 201247688, The compound is polymerized with the compound represented by the formula (5); 'X1——E——X2 (5) [wherein, E represents an aryl group, a heteroaryl group, a 戋~CR91=CR92-.... and ^ each independently represents a hydrogen atom, an alkane A, an aryl group, a heteroaryl group or a cyano group, each independently representing an atom, a decyl sulfonate group, an aryl sulfonate group]; 1 + A+ such as (6) (7) In the formulas (6) and (7), 'A and E are the same meanings as described above.' (Effect of the invention) According to the present invention, since a polymer compound having a high molecular weight can be produced by using Suzuki's law, the present invention [Embodiment] The present invention is described below. In the compound represented by the formula (1), the A system represents an exoaryl group, a heteroaryl group, -c^c- or a CR31=CR32-. Rw another p32 "K and R each independently represent a hydrogen atom, an alkyl group, an aryl group, a heteroaryl group or The cyano group n R, 2 each independently represents an ammonia atom, an alkyl group, an aryl group or a heteroaryl group. r21, r22, r23, r24, r25, ruthenium 26, r and each independently represent a hydrogen atom, a burnt group, and a record. Base, sulphur 324085 201247688 di-atomic, aryl or heteroaryl. When r21 is plural, these can be different, and when H is plural, these can be (four) or not plural. The same may or may not be plural, and the same may or may not be different. When r25 is plural, the same may be the same. 卩26 is a plural _, and the material may be different or different. These may be the same or different. When the π system is plural, the material may be (4) or m m3 and (4) each independently represent an integer of 1 to 5. ", ^(6) and (4) each independently represent 〇 or 1. The group which is represented by A, which is an aryl group which removes two hydrogen atoms of a carbon atom of an aromatic ring from an aromatic hydrocarbon compound, includes a benzene ring-containing group, a condensed ring-containing group, and contains two The basis of the structure in which the above-mentioned independent aromatic % or condensed ring is directly bonded. The aryl group may have a carbon number of usually 6 to 6 Å, preferably 6 to 2 Å, and the carbon number does not include the carbon number of the substituent which the aryl group has. Specific examples of the aryl group include a phenylene group, a naphthyldiyl group, a fluorenyldiyl group, a phenanthrenyl group, a fused tetraphenyldiyl group, a fluorenyldiyl group, a fused pentaphenyldiyl group, a fluorenyldiyl group, a fluorenyldiyl group, and a hydrazine group. a benzenediyl group, a bistriphenyldiyl group, a bistetraphenyldiyl group. The heteroaryl group represented by A removes two hydrogens directly bonded to an atom constituting an aromatic ring from an aromatic heterocyclic compound. The atomic group after the atom includes a monocyclic group-containing condensed ring-containing group, and a structure in which two or more independent aromatic rings or condensed rings are directly bonded. The heteroaryl group may also have a substituent. The heteroaryl group has a carbon number of usually 2 to 60, preferably 2 to 20. The carbon number does not include the carbon number of the substituent of 324085 9 201247688 of the heteroaryl group. Specific examples of the heteroaryl group include a geminodisyl group, an indenyldiyl group, a sedanyl group, an anthraquinone diyl group, an inosine diyl group, a dithiophenediyl group, a trithiophenediyl group, and a tetrathiophene. Diyl, pyrrole diyl, furandiyl, selenophenediyl, pyridyldiyl, pyridinium, octapeptide, diterpene, benzophenanyl, benzodi A benzofurandiyl group, a quinolinediyl group, an isoquinolinyldiyl group, a thienothiophenediyl group, a benzothiadiazolediyl group, a benzodithiophenediyl group, a cyclopentadithiophenediyl group.

Ru、R12、R21、R22、R23、R24、俨、r26、r27、r28、r31 及 R32表示之絲,係可以是錢、分枝的任—者,亦可以是 環烧基。絲亦可以具有取代基。料所具有的碳數通常 為1至60,以1至20為佳。該碳數係不包含烧基所具有 的取代基的碳數。作為烷基的具體例,可舉出曱基、乙基、 正丙基、正丁基、正己基、正辛基、正十二基、正十八基 等直鍵烧基;異丙基、異丁基、第二丁基、第三丁基、2- =基己基、3, 7-二甲基辛基等分妓基、 等環烷基。 r32/'R,2'r2,'r22'r23'r24^25^26>r^r^r^ 芳基’係從芳香族烴化合物除去直接鍵結於構成 :香^碳原子之i個氫原子後之原子團,包括含苯環的 i環=合環的基'含有2個以上之獨立的芳香族環或縮 y直接鍵“成㈣構之基。芳基,村以具有取代基。 ::所::的碳數通常為6 s 60 ’以6至2。為佳。該碳 '、不包含芳基所具有的取代基之碳數。作為芳基的具體 例’可舉出笨基、1-萘基、2-萘基、卜蒽基 、2-蒽基、9- 324085 201247688 蒽基、1-祐基、2一祐基、4_ 基、4-苯基笨基。 4—第 以 R11、R12、R21、R22、p23 R、R、R、R26、R27、R28、R31 =表不之雜絲’係從具有芳香族性的雜環狀化合物, 除去直接鍵結於構料香環的原子之原子後之原子 團,包括含單環的基、含縮合環的基、含有2個以上之獨 立的雜芳香族環或縮合環直接鍵結而成的結構之基。雜芳 f亦可以具有取代基。雜芳基所具有㈣㈣常為2至 〇 ’以2至20為佳。該碳數係不包含雜芳基所具有的取代 基之碳數。作為雜芳基的具體例,可舉出2十南基、3—咬 喃基、2-♦吩基、吩基、2吻各基、3_鱗基、2—曙 唾基、2-射基、2ϋ基、2_料基、3吻定基、4_。比 咬基、2-苯并㈣基、2L塞吩基、2_齡并嚷吩基。 ,、R22、R23、R24、R25、〜㈣表示之烧氧基, 係可以是直鏈、分枝的任-者’亦可以是環燒氧基。燒氧 基亦可以具有取代基。烧氧基所具有的碳數通常為1至 6〇,以1至20為佳。該碳數係不包含烷氧基所具有的取代 基的石反數。作為烧氧基的具體例,可舉出甲氧基、正丁氧 基、正己氧基、2-乙基己氧基、3, 7-二甲基辛氧基、正十 二氧基等。 ^ 以 R2i、R22、R23、R24、R25、p 及 r28 表示之烷硫基, 係可以是直鏈、分枝的任一者,亦可以是環烷硫基。烷硫 基亦可以具有取代基。烷硫基所具有的碳數通常為丨至 60,以1至20為佳。該碳數係不包含烷硫基所具有的取代 324085 201247688 基的碳數。作為烷硫基的具體例,可舉出正丁硫基、正己 硫基、2-乙基己硫基、3, 7-二曱基辛硫基、正十二烷硫基 等。 作為以 R21、R22、R23、R24、R25、R26、R27 及 R28 表示之鹵 原子,可舉出氟原子、氯原子、漠·原子、蛾原子。 A係以伸雜芳基為佳,以苯并°塞二唑二基、"塞吩二基、 二0塞吩二基、三°塞吩二基、四β塞吩二基為較佳。 從式(1)表示之化合物的合成容易性之觀點來看,R11 及R12係以烷基為佳。 從式(1)表示之化合物的合成容易性之觀點來看, R21、R22、R23、R24、R25、R26、R27及 R28係以氫原子、烷基為 佳,以氫原子為較佳。 式(1)表示之化合物,式(1)中Ν表示的氮原子亦可以 與式(1)中Β表示的硼原子進行配位鍵結。具有由氮原子(Ν) 對硼原子(Β)的配位鍵結時,因為氮原子(Ν)係保護硼原子 (Β)的空配位位置,所以將式(1)表示之化合物作為聚合反 應的單體而使用時,可抑制Α表示之基與硼原子(Β)的鍵結 在聚合反應前被切斷之比率。 氮原子保護硼原子的空配位位置之結果,在A表示的 基係伸雜芳基時,特別地能夠有效地發揮抑制A表示之基 與硼原子(B)的鍵結被切斷之效果。 從形成由氮原子(N)對跚原子(B)的配位鍵結之觀點 來看,以ml與nl的和為2,m2與n2的和為2,m3與n3 的和為2,且m4與n4的和為2為佳;以ml、nl、m2、n2、 324085 12 201247688 m3、n3、m4及n4為1為較佳。 作為式(1)表示之化合物,例如可舉出式(U0D至式 (1-041)表示之化合物。其中’以式〇__〇14)至式(1_〇39) 表示之化合物為佳。The filaments represented by Ru, R12, R21, R22, R23, R24, 俨, r26, r27, r28, r31 and R32 may be either money or branched, or may be a cyclic alkyl group. The silk may also have a substituent. The material usually has a carbon number of from 1 to 60, preferably from 1 to 20. The carbon number does not include the carbon number of the substituent of the alkyl group. Specific examples of the alkyl group include a direct bond group such as a mercapto group, an ethyl group, a n-propyl group, a n-butyl group, a n-hexyl group, an n-octyl group, a n-dodecyl group, and an n-octadecyl group; Isobutyl, t-butyl, tert-butyl, 2-=hexyl, 3,7-dimethyloctyl alicyclic, isocyclic alkyl. R32/'R,2'r2,'r22'r23'r24^25^26>r^r^r^ aryl' is removed from the aromatic hydrocarbon compound and bonded directly to the composition: i hydrogen of the fragrant carbon atom The atomic group after the atom, including the i ring of the benzene ring = the ring group of the ring, contains two or more independent aromatic rings or a y bond direct bond "is a (four) structure. The aryl group has a substituent. The carbon number of the :: is usually 6 s 60 ', preferably 6 to 2. The carbon ' does not include the carbon number of the substituent which the aryl group has. Specific examples of the aryl group can be exemplified. , 1-naphthyl, 2-naphthyl, diterpene, 2-indenyl, 9-324085 201247688 fluorenyl, 1-youji, 2-yanoyl, 4-yl, 4-phenylphenyl. 4--R11, R12 , R21, R22, p23 R, R, R, R26, R27, R28, R31 = the surface of the miscellaneous silk is removed from the aromatic heterocyclic compound, and the atom directly bonded to the aromatic ring of the structure is removed. The atomic group after the atom includes a monocyclic group, a condensed ring-containing group, a structure having two or more independent heteroaromatic rings or a fused ring directly bonded. The heteroaryl f may have a substituent. Heteroaryl has (4) Usually 2 to 〇' is preferably 2 to 20. The carbon number does not include the carbon number of the substituent which the heteroaryl group has. Specific examples of the heteroaryl group include 20 south bases and 3 bites. Cyclol, 2-♦ phenyl, phenyl, 2, cyclinyl, 3-mercapto, 2-indolyl, 2-propenyl, 2-indenyl, 2-indenyl, 3-indenyl, 4_. , 2-benzo(tetra)yl, 2L-thenyl, 2-year-old fluorenyl, and R22, R23, R24, R25, and (d) are alkoxy groups, which may be linear or branched. The ' can also be a cyclic alkoxy group. The alkoxy group may also have a substituent. The alkoxy group has a carbon number of usually 1 to 6 Å, preferably 1 to 20. The carbon number does not contain an alkoxy group. The inverse of the stone having a substituent. Specific examples of the alkoxy group include a methoxy group, a n-butoxy group, a n-hexyloxy group, a 2-ethylhexyloxy group, and a 3,7-dimethyl group. An oxy group, n-dodecyloxy group, etc. ^ an alkylthio group represented by R2i, R22, R23, R24, R25, p and r28, which may be either a straight chain or a branched chain, or a cycloalkyl sulfide. The alkylthio group may also have a substituent. The alkylthio group usually has a carbon number It is preferably from 1 to 20. The carbon number does not include the carbon number of the substituted 324085 201247688 group of the alkylthio group. Specific examples of the alkylthio group include n-butylthio group and n-hexyl sulfide. a base, 2-ethylhexylthio, 3,7-didecyloctylthio, n-dodecylthio, etc. as a halogen atom represented by R21, R22, R23, R24, R25, R26, R27 and R28 Examples thereof include a fluorine atom, a chlorine atom, a molybdenum atom, and a moth atom. The A system is preferably an aryl group, a benzoheptazol diyl group, a "epi-diyl group, and a diophene diyl group. It is preferred that the three-degree diphene diyl group and the tetra-β-sentene diyl group are preferred. From the viewpoint of easiness of synthesis of the compound represented by the formula (1), R11 and R12 are preferably an alkyl group. From the viewpoint of easiness of synthesis of the compound represented by the formula (1), R21, R22, R23, R24, R25, R26, R27 and R28 are preferably a hydrogen atom or an alkyl group, and a hydrogen atom is preferred. The compound represented by the formula (1), the nitrogen atom represented by fluorene in the formula (1) may be coordinately bonded to the boron atom represented by fluorene in the formula (1). When there is a coordination bond of a boron atom (Β) by a nitrogen atom (Ν), since the nitrogen atom (Ν) protects the empty coordination position of the boron atom (Β), the compound represented by the formula (1) is polymerized. When the monomer to be reacted is used, the ratio of the bond between the group represented by ruthenium and the boron atom (Β) before the polymerization reaction can be suppressed. When the nitrogen atom protects the vacancy position of the boron atom, when the aryl group represented by A is extended, the effect of suppressing the bond between the group represented by A and the boron atom (B) can be effectively exhibited. . From the viewpoint of forming a coordination bond of a nitrogen atom (N) to a halogen atom (B), the sum of ml and nl is 2, the sum of m2 and n2 is 2, and the sum of m3 and n3 is 2, and The sum of m4 and n4 is preferably 2; and ml, nl, m2, n2, 324085 12 201247688 m3, n3, m4 and n4 are preferably 1. The compound represented by the formula (1) is, for example, a compound represented by the formula (U0D to the formula (1-041)), wherein a compound represented by the formula (〇__〇14) to the formula (1_〇39) is preferred. .

GG

R R R RR R R R

(1-004) (1-005) (1-001) (1-002) (1-003)(1-004) (1-005) (1-001) (1-002) (1-003)

R R G Λ ,R R」 V r1 、R G R R (1-008) RRRpd p p ^ ^ «R R G Λ ,R R" V r1 , R G R R (1-008) RRRpd p p ^ ^ «

324085 13 201247688324085 13 201247688

R N—N N_N N~/ G 乂。^G 乂 S^O (1-014) (1-015) G G (1-016) (1-017)R N—N N_N N~/ G 乂. ^G 乂 S^O (1-014) (1-015) G G (1-016) (1-017)

R R RR R R

(1-018)(1-018)

R RR R

(1-019)(1-019)

(1-020) (1-021) (1-022) (1-023) (1-024)(1-020) (1-021) (1-022) (1-023) (1-024)

RRRR RRRRRR RRRRRRRRRRRR RRRRRR RRRRRRRR

(1-025) (1-026) (1-027)(1-025) (1-026) (1-027)

R R (1-037) . (1-038) (1-039) (1-040) (1-041) 式(1-001)至式(1-041)中,R係表示氫原子、烷基、 烷氧基、烷硫基、芳基或雜芳基。複數存在的R係可以相 14 324085 201247688 同亦可以不同。IT係表錢原子、燒基、芳基或雜芳基。 Ϊ數?係可以相同亦可以不同。…r表示之烧 ^美方^雜方基較義、具體例,係與前述r2i所表示的 凡土、方基、雜方基的定義、具體例相同。以只表示之烧 ^基、烧硫基較義、諸例係與㈣r 基、烧硫基的定義、具體例相同。G係表示式(G__至^ (易構單元。從合料⑴表示的化合物的容 易性之觀點來看,係以式(G,4)表示的結構單元為佳.以 式(G-_表示的結構單元,而式中的R為氣原子且Ra 為甲基之結構單元為較佳1數存在的^可以相同亦可 以不同。 〇4r N-Ra % (G>0〇1)RR (1-037) . (1-038) (1-039) (1-040) (1-041) In the formula (1-001) to the formula (1-041), R represents a hydrogen atom or an alkyl group. , alkoxy, alkylthio, aryl or heteroaryl. The existence of a complex R system can be different from 14 324085 201247688. IT is a currency atom, an alkyl group, an aryl group or a heteroaryl group. The number of turns can be the same or different. ...r denotes the burning of the US square, and the specific examples are the same as the definitions and specific examples of the earth, square and hetero groups represented by the above r2i. The definitions and specific examples are the same as the definitions and specific examples of the firing group, the sulfur-burning group, the examples, the (iv) r group, and the sulfur-burning group. G is a formula (G__ to ^ (equivalent unit.) From the viewpoint of easiness of the compound represented by the compound (1), the structural unit represented by the formula (G, 4) is preferred. The formula (G-_) The structural unit is represented, and the structural unit in which R is a gas atom and Ra is a methyl group is preferably one or more, and may be the same or different. 〇4r N-Ra % (G>0〇1)

RR

RR

-B-B

R R R OR R R O

R \ N-|R \ N-|

Ra -B rR bv%aRa -B rR bv%a

(G-002) (G-003) -B、 N-Ra°ltR (G-004)(G-002) (G-003) -B, N-Ra°ltR (G-004)

R R R RR R R R

0 —B v o R RR R (G-005)0 —B v o R RR R (G-005)

O R RO R R

R R (G-006) RR R (G-006) R

R N-Ra R 同 式(1-GG1)至式(卜Q31)中,R及Ra係表示與前 的思、義。 示之基 式(1)中的A之一較佳態樣,係式(2)表 324085 15 201247688 ΛR N-Ra R In the formula (1-GG1) to the formula (Bu Q31), the R and Ra systems represent the former thinking and meaning. A preferred aspect of one of the formulas in (1) is shown in Table (2). Table 324085 15 201247688 Λ

式⑵中’R及R42係各自獨立地表示氣原子、烧基、 烧氧基、山燒硫基、芳基、雜芳基、南原子、氛基或硝基。 ^:的碳原子與P中的碳原子亦可鍵結而形成環狀結 構。二絲示-s—、_〇_、— Se—、— NR51—或—cr6i=cr62 R、R及R62係各自獨立地表示氣原子、 或雜芳基。 R41及R42表示之烧基、烧氧基、燒硫基、芳基、雜芳 基、自原子蚊義、具體例,係與前述R21表示㈣基、燒 氧基、烧硫基、絲、雜芳基、自原子的定義、具體例相 、雜方基的定義、具 、雜方基的定義、具 R51、R61及R62表示之烷基、芳基 體例,係與前述R21表示的烷基、芳基 體例相同。 作為式(2)表示之化合物,例如可舉出式n_Q28)至式 (1-032)表示之化合物及式(1_037)表示之化合物。 式(1)中的A之另一較佳態樣,係式(3)表示之基。 324085 16 201247688In the formula (2), 'R and R42 each independently represent a gas atom, an alkyl group, an alkoxy group, a thiol group, an aryl group, a heteroaryl group, a south atom, an aryl group or a nitro group. The carbon atom of ^: and the carbon atom in P may also be bonded to form a cyclic structure. The two filaments are -s-, _〇_, -Se-, -NR51- or -cr6i=cr62 R, R and R62 each independently represent a gas atom or a heteroaryl group. R41 and R42 represent a decyl group, an alkoxy group, a thiol group, an aryl group, a heteroaryl group, a self-atomic mosquito, and a specific example, and the above R21 represents a (tetra) group, an alkoxy group, a sulfur-burning group, a silk, a hetero group. The aryl group, the definition of the atom, the specific example phase, the definition of the heterocyclic group, the definition of the compound, the heterocyclic group, the alkyl group and the aryl group represented by R51, R61 and R62, and the alkyl group represented by the above R21, The aryl matrix is the same. The compound represented by the formula (2) includes, for example, a compound represented by the formula: n_Q28) to (1-032) and a compound represented by the formula (1-037). Another preferred aspect of A in the formula (1) is a group represented by the formula (3). 324085 16 201247688

式(3)中,R71及R72係各自獨立地表示氫原子、烷基、 烷氧基、烷硫基、芳基或雜芳基。u係表示1至5的整數。 R71為複數個時,該等係可以相同亦可以不同。R72為複數個 時,該等係可以相同亦可以不同。在互相直接鍵結之2個 碳原子所各自鍵結的R71及R72,R71中的碳原子與R72中的碳 原子亦可以鍵結而形成環狀結構。 以R71及R72表示之烧基、院氧基、烧硫基、芳基、雜 芳基的定義、具體例,係與前述以R21表示的烷基、烷氧基、 烷硫基、芳基、雜芳基的定義、具體例相同。 作為A係式(3)表示的基之化合物,例如可舉出式 (1-019)表示之化合物、式(1-025)至式(1-027)表示之化合 物、式(1-038)表示之化合物及式(1-039)表示之化合物。 式(1)中的A之另外的較佳態樣,係式(4)表示之基。In the formula (3), R71 and R72 each independently represent a hydrogen atom, an alkyl group, an alkoxy group, an alkylthio group, an aryl group or a heteroaryl group. u is an integer of 1 to 5. When R71 is plural, the systems may be the same or different. When R72 is plural, the systems may be the same or different. R71 and R72 in which two carbon atoms directly bonded to each other are bonded to each other, and a carbon atom in R71 and a carbon atom in R72 may be bonded to each other to form a cyclic structure. The definitions and specific examples of the alkyl group, the pendant oxy group, the thiol group, the aryl group and the heteroaryl group represented by R71 and R72 are the alkyl group, the alkoxy group, the alkylthio group, the aryl group represented by the above R21, The definition and specific examples of the heteroaryl group are the same. Examples of the compound represented by the formula (3) of the formula A include a compound represented by the formula (1-019), a compound represented by the formula (1-025) to the formula (1-027), and a formula (1-038). The compound represented by the formula and the compound represented by the formula (1-039). Another preferred aspect of A in the formula (1) is a group represented by the formula (4).

(4) 式(4)中,R81、R82、R83及R84係各自獨立地表示氫原子、 324085 17 201247688 烷基、烷氧基、烷硫基、芳基或雜芳基。v係表示1至5 的整數。R81為複數個時,該等係可以相同亦可以不同。R82 為複數個時,該等係可以相同亦可以不同。R83為複數個 時,該等係可以相同亦可以不同。R84為複數個時,該等係 可以相同亦可以不同。在互相直接鍵結之2個碳原子所各 自鍵結的R81及R82,R81中的碳原子與R82中的碳原子亦可以 鍵結而形成環狀結構。在互相直接鍵結之2個碳原子所各 自鍵結的R83及R84,R83中的碳原子與R84中的碳原子亦可以 鍵結而形成環狀結構。 R81、R82、R83及R84表示之烷基、烷氧基、烷硫基、芳 基、雜芳基的定義、具體例,係與前述R21表示的烷基、烷 氧基、烷硫基、芳基、雜芳基的定義、具體例相同。 作為A係式(4)表示的基之化合物,例如可舉出式 (1-001)表示之化合物、式(1-012)表示之化合物及式 (1-013)表示之化合物。 式(1)表示之化合物,例如能夠以如下之方式製造。 亦即,使下式表示的有機二硼酸:(4) In the formula (4), R81, R82, R83 and R84 each independently represent a hydrogen atom, 324085 17 201247688 alkyl group, alkoxy group, alkylthio group, aryl group or heteroaryl group. v is an integer from 1 to 5. When R81 is plural, the systems may be the same or different. When R82 is plural, the systems may be the same or different. When R83 is plural, the systems may be the same or different. When R84 is plural, the systems may be the same or different. The carbon atoms in R81 and the carbon atoms in R82 may bond together to form a cyclic structure in R81 and R82 in which two carbon atoms directly bonded to each other are bonded. The carbon atoms in R83 and the carbon atoms in R84 may bond together to form a cyclic structure in R83 and R84 in which two carbon atoms directly bonded to each other are bonded. The definitions and specific examples of the alkyl group, the alkoxy group, the alkylthio group, the aryl group and the heteroaryl group represented by R81, R82, R83 and R84 are the alkyl group, the alkoxy group, the alkylthio group and the aromatic group represented by the above R21. The definitions and specific examples of the base and the heteroaryl group are the same. The compound represented by the formula (4) is, for example, a compound represented by the formula (1-001), a compound represented by the formula (1-012), and a compound represented by the formula (1-013). The compound represented by the formula (1) can be produced, for example, in the following manner. That is, the organic diboric acid represented by the following formula is used:

HO\ OHHO\ OH

B_A_BB_A_B

HO OH ⑻ [式中,A係與上述相同意義],與 下式表示之硼酸保護化合物: 324085 18 201247688 〇 〇21 R11 r23 〇HO OH (8) [wherein, the A system has the same meaning as described above], and the boric acid protecting compound represented by the following formula: 324085 18 201247688 〇 〇21 R11 r23 〇

R22 R24 (9) [式中,R11、R21、R22、R23、R24、ml、m2、nl 及 n2 係 與上述同意義],及/或 下式表示之硼酸保護化合物: 0 R25 R12 R27 ΟR22 R24 (9) [wherein R11, R21, R22, R23, R24, ml, m2, nl and n2 are the same as defined above], and/or a boronic acid protecting compound represented by the following formula: 0 R25 R12 R27 Ο

(10) [式中,R12、R25、R26、R27、R28、m3、m4、n3 及 n4 係 與上述同意義]反應。反應的操作,係例如使兩化合物溶解 於適量、適當的溶劑而加熱一定時間即可。進行硼酸基與 硼酸保護化合物的反應之條件係已公知,記載在專利文獻 1。但是,有機二硼酸與硼酸保護化合物的反應量,係以游 離的硼酸基不殘留的方式而調節成為(有機二硼酸的 量)/(硼酸保護化合物的量)以莫耳比計為1/2以下之量。 〈高分子化合物的製造方法〉 本發明之高分子化合物的製造方法,係含有式(6)表 示的重複單元及式(7)表示的重複單元之高分子化合物的 製造方法,其係在過渡金屬錯合物及鹼的存在下,使式(1) 324085 19 201247688 表示之化合物與式(5)表示的化合物進行聚合。 〈式(5)表示之化合物〉 式(5)中,E係表示伸芳基、伸雜芳基 C—或 CR91=CR92—。R91及R92係各自獨立地表示氫原子、烷基、\ 基、雜芳基或氰基。X1及χ2係各自獨立地表㈣原 基磺酸酯基或芳基磺酸酯基。 &amp; Ε表示之伸絲、伸雜絲的定義、具體例,係與前 述Α表示的伸芳基、伸雜芳基較義、具體例相同。、 從提南所製造之高A子化合物的分子量之觀 看,E係以伸芳基、伸雜芳基為佳。 ,及R92表示之烷基、芳基、雜芳基的定義、具體例,(10) wherein R12, R25, R26, R27, R28, m3, m4, n3 and n4 are reacted in the same sense as described above. The reaction is carried out, for example, by dissolving the two compounds in an appropriate amount and a suitable solvent and heating for a certain period of time. The conditions for carrying out the reaction of the boric acid group with the boric acid protecting compound are known, and are described in Patent Document 1. However, the amount of the reaction between the organic diboric acid and the boric acid protecting compound is adjusted so that the amount of the organic boric acid group does not remain (the amount of the organic diboric acid) / (the amount of the boric acid protecting compound) is 1/2 in terms of the molar ratio. The amount below. <Method for Producing Polymer Compound> The method for producing a polymer compound of the present invention is a method for producing a polymer compound comprising a repeating unit represented by the formula (6) and a repeating unit represented by the formula (7), which is a transition metal The compound represented by the formula (1) 324085 19 201247688 is polymerized with the compound represented by the formula (5) in the presence of a complex and a base. <Compound represented by the formula (5)> In the formula (5), the E system represents an exoaryl group, a heteroaryl group C- or a CR91=CR92-. R91 and R92 each independently represent a hydrogen atom, an alkyl group, a \ group, a heteroaryl group or a cyano group. X1 and χ2 are each independently a (iv) a primary sulfonate group or an aryl sulfonate group. The definition and specific examples of the stretched yarn and the stretched yarn indicated by Ε are the same as those of the extended aryl group and the heteroaryl group represented by the above Α, and the specific examples are the same. From the viewpoint of the molecular weight of the high-A compound produced by Tienan, it is preferable that E is an aryl group or a heteroaryl group. And the definition, specific examples of the alkyl group, the aryl group and the heteroaryl group represented by R92,

糸與前相R21表示的絲、芳基、雜芳基的定義、具 相同。 J 式⑸中,作為X1及χ2表示之_原子,可舉出氣原子、 氣原子、溴原子、碘原子。 式(5)中,作為X1及X2表示之烷基磺酸酯基,可 曱磺酸酯基、三氟曱磺酸酯基等。 “式(5)中,作為&amp; χ2表示之芳基續酸醋基,可舉出 本續酸酯基、對曱苯磺酸酯基等。 從提鬲所製造之高分子化合物的分子量之 為χι及r’係以氣原子、演原子、破原子為佳 /昊原子、碘原子為更佳。 作為式⑸表示之化合物,例如可舉出式(5侧)至式 (5~〇41)表示之化合物。 324085 20 •r*糸 is identical to the definition of silk, aryl, and heteroaryl represented by the former phase R21. In the formula (5), examples of the atom represented by X1 and χ2 include a gas atom, a gas atom, a bromine atom, and an iodine atom. In the formula (5), the alkylsulfonate group represented by X1 and X2 may be an oxime sulfonate group or a trifluorosulfonate group. In the formula (5), the aryl group of the acid sulfonate group represented by &amp; χ2 may, for example, be a perester group or a p-toluenesulfonate group. The molecular weight of the polymer compound produced from the oxime In the case of χι and r', it is preferable that the gas atom, the atom, and the atom to be broken are preferably a ruthenium atom or an iodine atom. Examples of the compound represented by the formula (5) include a formula (5 side) to a formula (5 to 〇41). ) indicates the compound. 324085 20 •r*

R R R RR R R R

(5-008)(5-008)

R R RR R R

201247688201247688

R R R X X R x_^^x x-^H^rR R R X X R x_^^x x-^H^r

R R R R R R (5-001) (5-002) (5-003)R R R R R R (5-001) (5-002) (5-003)

R X RR X R

(5-009) R R R R(5-009) R R R R

R X R R R R R, X- l Λ R R X R (5-012)R X R R R R R, X- l Λ R R X R (5-012)

R R R R R RR R R R R R

(5-014) (5-015) (5-016) (5-017) (5-018) (5-019)(5-014) (5-015) (5-016) (5-017) (5-018) (5-019)

(5-020) (5-021) (5-022) {5-023) (5-024) 324085 21 201247688(5-020) (5-021) (5-022) {5-023) (5-024) 324085 21 201247688

(5*025&gt; (5-026)(5*025&gt; (5-026)

XX

(5-032)(5-032)

(5-038) (5-039) (5-040) 式(5-001)至式(5-041)中’ r及V係與前述相同意 義。X係表示_原子、烷基磺酸酯基或芳基磺酸酯基。複 數存在的X係可以相同亦可以不同。 X表示之齒原子、烷基磺酸酯基、芳基磺酸酯基的定 義、具體例,係與前述X1表示的鹵原子 '烧基續酸酯基、 芳基磺酸酯基的定義、具體例相同。 〈驗〉 在本發明之高分子化合物的製造方法所使用之驗’可 以是無機驗亦可以是有機驗,惟以無機驗為佳。 324085 22 201247688 作為無機驗,了舉出氫氧化納、氫氡化鉀等驗金屬氣 氧化物;氫氧化約等的驗土金屬金屬氫氧化物;乙酸納、 乙酸鉀等乙酸鹽,碳酸鈉、碳酸鉀、碳酸铯等碳酸鹽;磷 酸鈉、磷酸鉀等磷酸鹽;氟化鈉、氟化鉀等氟化物。 無機鹼中,以碳酸鈉及碳酸鉀等碳酸鹽;以及磷酸鈉 及磷酸鉀等磷酸鹽為佳。較佳之無機鹼係碳酸鈉及磷酸鉀。 作為有機驗’可舉出氫氧化四乙錄、氫氧化四丁錢等。 相對於式(1)表示的化合物1莫耳,鹼的使用量係以2 至20莫耳為佳’以2至1〇莫耳為較佳。 〈過渡金屬錯合物〉 在本發明之高分子化合物的製造方法所使用之過渡 金屬錯合物’係以含有第8至1〇族的元素之過渡金屬錯合 物為佳,以含有第10族的元素之過渡金屬錯合物為較佳, 以把錯合物、鎳錯合物為更佳,以把錯合物為特佳。 前述過渡金屬錯合物,係以具有至少丨個膦配位體為 佳。 前述過渡金屬錯合物係亦包含過渡金屬錯合物前驅 物。在此,所明過渡金屬錯合物前驅物,係在反應系統中 能夠變換成為過渡金屬錯合物之組成物。作為該組成物, 例如可舉出含有前驅物用過渡金屬錯合物及膦配位體或鱗 鹽之組成物。 作為前述鈀錯合物,可舉出肆(三苯基膦)鈀(〇)、肆 (二甲苯基膦)鈀(〇)(包含鄰位、間位及對位的各種取代異 構物)、雙(三苯基膦)二氣化鈀(11)、雙(三環己基膦)二氣 324085 23 201247688 化把(π)、雙(三乙基膦)二氯化鈀(0)、[込^雙(二苯基膦 基)乙院]二氣化鈀(u)、[丨,Γ_雙(二苯基膦基)二茂鐵] 二氯化鈀(Π)、雙(乙腈)二氣化鈀(II)、及雙(笨甲腈)二 氣化把(II)等。 其中’以肆(三苯基膦)鈀(0)、雙(三苯基膦)二氣化 鈀(Π)、[1,1’_雙(二苯基膦基)二茂鐵]二氣化鈀(11)為 佳。 作為前述鎳錯合物,可舉出肆(三苯基膦)鎳(〇)、雙 (二苯基膦)二氣化鎳(丨1)、[丨,2_雙(二苯基膦基)乙烷]二 氣化鎳(II)、[1,3-雙(二苯基膦基)丙烷]二氯化鎳(11)、 [1,4-雙(二苯基膦基)丁烷]二氯化鎳(〗〗)、[〗,丨,_雙(二苯 基膦基)二茂鐵]二氣化鎳(II)等。 作為前述前驅物用過渡金屬錯合物,可舉出 Pd2(dba)3(在此,dba係表示反式(trans)、反式_二亞苄基 丙酮(trans-dibenzylidene acetone))、Pd2(dba)2、乙酸 把(Π)、雙(1,5-環辛二烯)鎳(〇)等。 其中,以 Pd2(dba)3、Pd2(dba)2、乙酸鈀(π)為佳。 則述膦配位體,係意指能夠配位於過渡金屬之化合 物。作為該膦配位體,可舉出三_正丁基膦、三_第三丁基 膦、三環己基膦、三環戊基膦、三苄基膦等三烷基膦類; 或二苯基膦、三曱苯基膦(包含鄰位、間位及對位的各種取 代異構物)、參(甲氧基苯基)膦(包含鄰位、間位及對位的 各種取代異構物)等三芳基膦類;二苯基環己基膦等二芳基 烷基膦類’·二環己基苯基膦、(2_聯苯基)二_第三丁基膦等 324085 201247688 二烷基芳基膦類;1,2-雙(二苯基膦基)乙烷、13_雙(二苯 基膦基)丙烷、1,2-雙(二苯基膦基)環己烷、13—雙(二苯 基膦基)笨、1,1’-雙(二苯基膦基)二茂鐵等的雙牙配位膦 (bidentate ligand phosphine)類。 其中,以三-第三丁基膦、三環己基膦、三曱笨基膦(包 含鄰位、間位及對位的各種取代異構物)、參(甲氧基笨基) 膦(包含鄰位、間位及對位的各種取代異構物)為佳。 前述鳞鹽,係從上述膦配位體與HBF4、HPF6、 等酸而得到之鹽,可舉出三-正丁基鐫四氟硼酸鹽、三_第 三丁基鱗四氟硼酸鹽、三笨基鎸六氟硼酸鹽、三笨基鱗六 氟銻酸鹽等。 在本發明的製造方法使用鱗鹽時,鱗鹽能夠藉由反應 液中所存在的鹼而變換成為膦配位體。 在本發明的製造方法使用鱗鹽時,作為鹼,係以使用 氫氧化鈉、氫氧化鉀、乙酸納、乙酸鉀、碳酸納、碳酸鉀、 碳酸铯、I化納、說化卸、磷酸納、鱗酸卸為佳’以碳酸 納、碳酸钟、碳酸铯、填酸納、鱗酸鉀為較佳。 相對於式(1)表示的化合物1莫耳,過渡金屬錯合物 的使用量係以0.0001至10莫耳為佳’以0.001至1莫耳 為較佳。 相對於式(1)表示的化合物1莫耳,前驅物用過渡金 屬錯合物的使用量係以〇. 0001至10莫耳為佳’以0. 001 至1莫耳為較佳。 相對於前驅物用過渡金屬錯合物1莫耳’膦配位體的 324085 25 201247688 使用量係以1至10莫耳為佳,以1至4莫耳為較佳。 相對於前驅物用過渡金屬錯合物1莫耳,鱗鹽的使用 量係以1至10莫耳為佳,以1至4莫耳為較佳。 又,過渡金屬錯合物係可以單獨使用一種亦可併用二 種以上。 〈聚合反應條件〉 在本發明之高分子化合物的製造方法中,聚合反應溫 度係以20至200°C為佳。從有效率地進行聚合反應之觀點 來看,以50°C以上為較佳,以80°C以上為更佳。又,從抑 制副反應之觀點來看,以180°C以下為較佳,以160°C以下 為更佳。 聚合反應時間通常為1分鐘至200小時。從使聚合反 應充分地進行之觀點來看,以1小時以上為佳。 前述聚合反應係可以在無溶劑下進行亦可以在溶劑 的存在下進行,但是以在溶劑的存在下進行為佳。使用溶 劑時,所使用的溶劑只要係對反應為惰性的溶劑即可,可 以單獨使用一種亦可混合複數種溶劑而作為混合溶劑使 用。作為溶劑,例如可舉出環己烷、曱基環己烷等脂肪族 烴溶劑;苯、曱苯等芳香族烴溶劑;四氫呋喃、大茴香醚 等醚系溶劑;1-曱基-2-吡咯啶酮、N, N-二曱基曱醯胺、N,N-二曱基乙醯胺、二曱基亞砜、乙腈等非質子性極性溶劑; 及水,以芳香族烴溶劑、醚系溶劑、非質子性極性溶劑為 佳。 前述聚合反應係可以在空氣中進行,亦可以在惰性氣 324085 26 201247688 體環境下進行,但是以在氮、氬等惰性氣體環境下進行為 佳。 〈有機電晶體〉 作為有機電晶體,可舉出具有源極電極及汲極電極、 活性層以及閘極電極之結構者,其中,該活性層係成為源 極電極及汲極電極之間的電流路徑,且含有本發明的高分 子化合物者;而該閘極電極係控制通過該電流路徑的電流 量者。作為具有此種結構之有機電晶體,例如可舉出場效 型有機電晶體。 場效型有機電晶體通常為具有源極‘電極及 &gt;及極電 極、活性層、閘極電極以及絕緣層之有機電晶體,其中, 該活性層係成為源極電極及汲極電極之間的電流路徑,且 含有本發明的高分子化合物者;該閘極電極係控制通過該 電流路徑的電流量者;而該絕緣層係配置在活性層與閘極 電極之間。特別是以源極電極及汲極電極係設置為接於活 性層,而且閘極電極係隔著接於活性層的絕緣層設置之有 機電晶體為佳。 第1圖係表示有機電晶體(場效型有機電晶體)的一例 之示意剖面圖。第1圖所示之有機電晶體100,係具備:閘 極電極3、形成於閘極電極3上之絕緣層2、形成於絕緣層 2上之活性層1、以及以預定的間隔形成於活性層1上之源 極電極4及汲極電極5。 實施例 以下,係表示實施例以進一步詳細地說明本發明之, 324085 27 201247688 但是本發明係不被該等限定。 (分子量分析) 高分子化合物的數量平均分子量及重量平均分子量 係使用凝膠滲透層析儀(GPC、島津製作所製、商品名: LC-10AD)而求得。測定之高分子化合物,係使其溶解於四 氫呋喃,並注入至GPOGPC的移動相係使用四氫呋喃。管 柱係使用 PLgel MIXED-B(Polymer Laboratories 製)。檢 測器係使用UV檢測器(島津製作所製、商品名:〇A)。 (NMR分析) NMR測定係使化合物溶解於二甲基亞砜,並使用 NMR裝置(Varian公司製、INOVA300)而進行。 實施例1 (化合物A的合成)(5-038) (5-039) (5-040) The 'r and V' lines in the formula (5-001) to the formula (5-041) have the same meanings as described above. X represents a _ atom, an alkyl sulfonate group or an aryl sulfonate group. The X systems in the plural may be the same or different. The definition and specific examples of the tooth atom, the alkyl sulfonate group, and the aryl sulfonate group represented by X are the definitions of the halogen atom 'alkyl sulphonate group and the aryl sulfonate group represented by the above X1. The specific examples are the same. <Test> The test used in the method for producing a polymer compound of the present invention may be an inorganic test or an organic test, but it is preferably an inorganic test. 324085 22 201247688 As an inorganic test, metal oxides such as sodium hydroxide and potassium hydrogen hydride; metallurgical metal hydroxides such as ammonium hydroxide; acetates such as sodium acetate and potassium acetate, sodium carbonate, a carbonate such as potassium carbonate or cesium carbonate; a phosphate such as sodium phosphate or potassium phosphate; or a fluoride such as sodium fluoride or potassium fluoride. Among the inorganic bases, carbonates such as sodium carbonate and potassium carbonate; and phosphates such as sodium phosphate and potassium phosphate are preferred. Preferred inorganic bases are sodium carbonate and potassium phosphate. Examples of the organic test include tetrahydrogen hydroxide and tetrabutylammonium hydroxide. The amount of the base to be used is preferably from 2 to 20 mols with respect to the compound 1 mol represented by the formula (1), and is preferably from 2 to 1 mol. <Transition Metal Complex> The transition metal complex used in the method for producing a polymer compound of the present invention is preferably a transition metal complex containing an element of Group 8 to 1 steroid, and contains 10th. A transition metal complex of the element of the group is preferred, and a complex compound or a nickel complex is more preferred to provide a complex compound. The above transition metal complex is preferably one having at least one phosphine ligand. The aforementioned transition metal complex also includes a transition metal complex precursor. Here, the transition metal complex precursor is a composition which can be converted into a transition metal complex in the reaction system. The composition may, for example, be a composition containing a transition metal complex for a precursor, a phosphine ligand or a scale salt. Examples of the palladium complex compound include ruthenium (triphenylphosphine)palladium (ruthenium) and iridium (dimethylphenylphosphine)palladium (ruthenium) (including various substituted isomers of ortho, meta and para). , bis(triphenylphosphine) di-palladium (11), bis(tricyclohexylphosphine) digas 324085 23 201247688 (π), bis(triethylphosphine)palladium dichloride (0), [込^ bis(diphenylphosphino) phenylene] di-palladium (u), [丨, Γ_bis(diphenylphosphino)ferrocene] palladium dichloride (ruthenium), bis(acetonitrile) Dihydrogenated palladium (II), and bis (benzonitrile) gasification (II). Wherein 'palladium (triphenylphosphine) palladium (0), bis(triphenylphosphine) di-palladium (palladium), [1,1'-bis(diphenylphosphino)ferrocene] Palladium (11) is preferred. Examples of the nickel complex compound include ruthenium (triphenylphosphine) nickel (ruthenium), bis(diphenylphosphine) nickel dihydride (丨1), and [丨, 2_bis (diphenylphosphino). Ethane] nickel (II), [1,3-bis(diphenylphosphino)propane]nickel dichloride (11), [1,4-bis(diphenylphosphino)butane ] Nickel dichloride (〗), [〗, 丨, _ bis (diphenylphosphino) ferrocene] nickel (II) and other gases. Examples of the transition metal complex for the precursor include Pd2(dba)3 (here, dba means trans, trans-dibenzylidene acetone), and Pd2 ( Dba) 2, acetic acid (Π), bis (1,5-cyclooctadiene) nickel (〇) and the like. Among them, Pd2(dba)3, Pd2(dba)2, and palladium acetate (π) are preferred. By phosphine ligand is meant a compound capable of being coordinated to a transition metal. Examples of the phosphine ligand include trialkylphosphines such as tri-n-butylphosphine, tri-tert-butylphosphine, tricyclohexylphosphine, tricyclopentylphosphine, and tribenzylphosphine; or diphenyl Phosphine, triphenylphosphine (including various substituted isomers in the ortho, meta and para), ginsyl (methoxyphenyl) phosphine (including ortho, meta and para) Triarylphosphines such as diarylphosphines, dicyclohexylphenylphosphines such as diphenylcyclohexylphosphine, (2-biphenyl)di-tert-butylphosphine, etc. 324085 201247688 Dioxane Alkylphosphines; 1,2-bis(diphenylphosphino)ethane, 13-bis(diphenylphosphino)propane, 1,2-bis(diphenylphosphino)cyclohexane, 13 —Bidentate ligand phosphines such as bis(diphenylphosphino)phenyl, 1,1'-bis(diphenylphosphino)ferrocene. Among them, tri-tert-butylphosphine, tricyclohexylphosphine, triterpene phosphine (including various substituted isomers of ortho, meta and para), ginseng (methoxyphenyl) phosphine (including Preferably, the various substituted isomers of the ortho, meta and para are preferred. The above-mentioned scale salt is a salt obtained from the above phosphine ligand, HBF4, HPF6, or the like, and examples thereof include tri-n-butyl fluorene tetrafluoroborate, tri-tert-butyl quaternary tetrafluoroborate, and the like. Stupid hexafluoroborate, triptypic hexafluoroantimonate, and the like. When a scale salt is used in the production method of the present invention, the scale salt can be converted into a phosphine ligand by the base present in the reaction liquid. When the scale salt is used in the production method of the present invention, sodium hydroxide, potassium hydroxide, sodium acetate, potassium acetate, sodium carbonate, potassium carbonate, cesium carbonate, sodium hydride, sodium hydride, sodium hydride, and sodium phosphate are used as the base. It is better to use sodium carbonate, carbonic acid clock, cesium carbonate, sodium sulphate or potassium sulphate. The transition metal complex is preferably used in an amount of 0.0001 to 10 mols, preferably 0.001 to 1 mol, based on the compound 1 mole represented by the formula (1). 001至第一摩尔 is preferred, with respect to the compound 1 mole represented by the formula (1), the amount of the transition metal complex compound used in the precursor is preferably 0.001 to 10 moles, and preferably 0.001 to 1 mole. The amount of transition metal complex 1 molar 'phosphine ligand relative to the precursor is 324085 25 201247688. The amount used is preferably 1 to 10 moles, preferably 1 to 4 moles. Preferably, the scale salt is used in an amount of from 1 to 10 moles, preferably from 1 to 4 moles, per mole of the transition metal complex of the precursor. Further, the transition metal complexes may be used alone or in combination of two or more. <Polymerization reaction conditions> In the method for producing a polymer compound of the present invention, the polymerization reaction temperature is preferably 20 to 200 °C. From the viewpoint of efficiently conducting the polymerization reaction, it is preferably 50 ° C or more, more preferably 80 ° C or more. Further, from the viewpoint of suppressing side reactions, it is preferably 180 ° C or lower, more preferably 160 ° C or lower. The polymerization time is usually from 1 minute to 200 hours. From the viewpoint of allowing the polymerization reaction to proceed sufficiently, it is preferably 1 hour or longer. The above polymerization reaction may be carried out in the absence of a solvent or in the presence of a solvent, but it is preferably carried out in the presence of a solvent. When the solvent is used, the solvent to be used may be any solvent which is inert to the reaction, and may be used singly or as a mixed solvent. Examples of the solvent include aliphatic hydrocarbon solvents such as cyclohexane and nonylcyclohexane; aromatic hydrocarbon solvents such as benzene and toluene; and ether solvents such as tetrahydrofuran and anisole; and 1-mercapto-2-pyrrole. An aprotic polar solvent such as ketone, N, N-dimercaptoamine, N,N-dimercaptoacetamide, dimercaptosulfoxide, acetonitrile; and water, aromatic hydrocarbon solvent, ether system A solvent or an aprotic polar solvent is preferred. The polymerization reaction may be carried out in the air or in an inert atmosphere of 324085 26 201247688, but it is preferably carried out under an inert gas atmosphere such as nitrogen or argon. <Organic transistor> The organic transistor includes a source electrode and a drain electrode, an active layer, and a gate electrode, wherein the active layer serves as a current between the source electrode and the drain electrode. The path includes the polymer compound of the present invention; and the gate electrode controls the amount of current passing through the current path. As the organic transistor having such a structure, for example, a field effect type organic transistor can be cited. The field effect type organic transistor is usually an organic transistor having a source 'electrode and> and a pole electrode, an active layer, a gate electrode, and an insulating layer, wherein the active layer is between the source electrode and the drain electrode The current path is included in the polymer compound of the present invention; the gate electrode controls the amount of current passing through the current path; and the insulating layer is disposed between the active layer and the gate electrode. In particular, it is preferable that the source electrode and the drain electrode are provided in contact with the active layer, and the gate electrode is provided with an electromechanical crystal interposed between the insulating layers connected to the active layer. Fig. 1 is a schematic cross-sectional view showing an example of an organic transistor (field effect type organic transistor). The organic transistor 100 shown in Fig. 1 includes a gate electrode 3, an insulating layer 2 formed on the gate electrode 3, an active layer 1 formed on the insulating layer 2, and an active layer formed at a predetermined interval. The source electrode 4 and the drain electrode 5 on the layer 1. EXAMPLES Hereinafter, the present invention will be described in further detail with reference to the examples, 324085 27 201247688, but the present invention is not limited thereto. (Molecular weight analysis) The number average molecular weight and the weight average molecular weight of the polymer compound were determined by using a gel permeation chromatography (GPC, manufactured by Shimadzu Corporation, trade name: LC-10AD). The polymer compound thus measured was dissolved in tetrahydrofuran, and the mobile phase system injected into GPOGPC was tetrahydrofuran. For the column, PLgel MIXED-B (manufactured by Polymer Laboratories) was used. A UV detector (manufactured by Shimadzu Corporation, trade name: 〇A) was used for the detector. (NMR analysis) The NMR measurement was carried out by dissolving the compound in dimethyl sulfoxide and using an NMR apparatus (manufactured by Varian Co., Ltd., INOVA300). Example 1 (Synthesis of Compound A)

AA

在燒瓶中’添加l,5〇g(6.70mmol)2,l,3-苯并嘆二0全 -4, 7-二硼酸、2. 07g(14. lmmol)N-甲基亞胺基二乙酸、30mL 甲苯’使其回流5小時。其次,將所生成的析出物過濾取 出’並以水洗淨析出物。之後,使析出物乾燥而得到化合 物A。化合物A的取得量為2. 75g ’產率為92%。 Ή-NMR (300MHz, DMS0-d6) δ7. 92 (s, 2H), 4. 28-4. 5 6 (m, 8H) , 2. 57 (s, 6 H) 324085 28 201247688 實施例2 (化合物B的合成)In the flask, '1,5 〇g (6.70 mmol) of 2,1,3-benzoindene dioxin-4,7-diboronic acid, 2.07 g (14. lmmol) of N-methyliminodi Acetic acid, 30 mL of toluene' was refluxed for 5 hours. Next, the produced precipitate was filtered and taken out, and the precipitate was washed with water. Thereafter, the precipitate was dried to obtain Compound A. The yield of the compound A was 2.75 g' yield of 92%. Ή-NMR (300MHz, DMS0-d6) δ7. 92 (s, 2H), 4. 28-4. 5 6 (m, 8H), 2. 57 (s, 6 H) 324085 28 201247688 Example 2 (Compound Synthesis of B)

在燒瓶中,添加1.50运(6.2〇111111〇1)聯苯基-4,4,-二硼 酸、1· 91g(13. Ommol)N-曱基亞胺基二乙酸、30mL甲笨, 使其回流5小時。之後,將所生成的析出物過濾取出,並 以水洗淨析出物,其次,以甲醇洗淨。使其乾燥而得到化 合物B。化合物B的取得量為2. 59g,產率為90〇/〇。 1 H-NMR (3 Ο OMH z,DMS O-d 6) S 7. 7 Ί (d, 4 Η), 7. 5 6 (d, 4 Η) , 4. 1 4 - 4 4 2 (m,8 Η),2. 5 7 (s, 6 Η) 實施例3 (化合物C的合成)In the flask, 1.50 (6.2 〇 111111 〇 1) biphenyl-4,4,-diboronic acid, 1.91 g (1. Ommol) N-mercaptoimido diacetic acid, and 30 mL of stupid were added to make it Reflux for 5 hours. Thereafter, the formed precipitate was taken out by filtration, washed with water, and then washed with methanol. It was dried to obtain Compound B. The yield of the compound B was 2.59 g, and the yield was 90 〇/〇. 1 H-NMR (3 Ο OMH z, DMS Od 6) S 7. 7 Ί (d, 4 Η), 7. 5 6 (d, 4 Η) , 4. 1 4 - 4 4 2 (m, 8 Η ), 2. 5 7 (s, 6 Η) Example 3 (Synthesis of Compound C)

c 在燒瓶中,添加1.50g(8. 73mmol)嘆吩-2, 5-二删酸、 2. 70g(18. 3mmol)N-曱基亞胺基二乙酸、3〇mL曱苯,使其 回流5小時。之後,將所生成的析出物過濾取出,以水洗 淨析出物,並以曱醇洗淨。使其乾燥而得到化合物C。化 合物C的取得量為3. 16g,產率為92%。 324085 29 201247688 1H-NMR (3 00MHz, DMSO — d6) δ7· 30 (s,2H), 4. 00 — 4. 41 (m, 8 H) , 2. 60 (s, 6H) 實施例4 (高分子化合物D的合成)c In a flask, add 1.50 g (8. 73 mmol) of sinter-2, 5-di-decanoic acid, 2. 70 g (18.3 mmol) of N-mercaptoimido diacetic acid, and 3 〇mL of hydrazine to make it Reflux for 5 hours. Thereafter, the formed precipitate was taken out by filtration, washed with water, and washed with decyl alcohol. It was dried to give Compound C. The yield of the compound C was 3.16 g, and the yield was 92%. 324085 29 201247688 1H-NMR (3 00MHz, DMSO — d6) δ7· 30 (s, 2H), 4. 00 — 4. 41 (m, 8 H) , 2. 60 (s, 6H) Example 4 (High Synthesis of molecular compound D)

ch3 n-s、n h3c、Ch3 n-s, n h3c,

AA

Pd(OAc)2Pd(OAc)2

在經氮氣取代燒瓶内的氣體之燒瓶_,添加 50. 0mg(0. 112mmol)化合物 A、61. 5mg(0. 112mmol)2, 7-二 溴-9, 9-二辛基苐、50mL四氫D夫喃、0. 25mg乙酸把、0· 79mg 參(2-甲氧基苯基)膦並進行攪拌。在該反應液中,滴入使 11911^(0.561111111〇1)填酸_溶解於1〇1111水而成之溶液,並使 其回流9小時,得到高分子化合物D。高分子化合物D之 換算聚苯乙烯的數量平均分子量為1.9xl04,換算聚苯乙 烯的重量平均分子量為6. lxlO4。 比較例1 (高分子化合物E的合成) I %5克(0. 112mmol) Compound A, 61.5 mg (0. 112 mmol) 2,7-dibromo-9,9-dioctylhydrazine, 50 mL four were added to the flask of the gas in the flask. Hydrogen D-propanol, 0.25 mg of acetic acid, and 0.779 mg of bis(2-methoxyphenyl)phosphine were stirred. Into the reaction mixture, a solution obtained by dissolving 11911 (0.561111111〇1) of acid-dissolved in 1〇1111 water was added dropwise thereto, and the mixture was refluxed for 9 hours to obtain a polymer compound D. lxlO4。 The weight average molecular weight of the converted polystyrene is 6. lxlO4. Comparative Example 1 (Synthesis of Polymer Compound E) I %

Pd(OAc)zPd(OAc)z

除 了使用 43. 5mg(0· 112mmol)4, 7-雙(4, 4, 5, 5-四曱 基-1,3, 2-二氧雜硼雜環戊烷-2-基)-2, 1,3-苯并噻二唑代 324085 30 201247688 替化合物A以外,與實施例4以相同方式進行反應而得到 高分子化合物E。高分子化合物E之換算聚笨乙歸的數量 平均分子量為7. 4xl03,換算聚苯乙烯的重量平均分子量 為 1·5χ104。 比較例2 (高分子化合物F的合成)In addition to the use of 43.5 mg (0·112 mmol) of 4,7-bis(4,4,5,5-tetradecyl-1,3,2-dioxaborolan-2-yl)-2, 1,3-Benzothiadiazole 324085 30 201247688 A polymer compound E was obtained in the same manner as in Example 4 except for the compound A. The amount of the polymer compound E is converted to a polystyrene. The average molecular weight is 7. 4xl03, and the weight average molecular weight of the converted polystyrene is 1.5 χ 104. Comparative Example 2 (Synthesis of Polymer Compound F)

Pd(OAc)2Pd(OAc)2

除 了使用 25. lmg(0. 112mmol)2, 1, 3-苯并噻二唑 -4, 7-二硼酸代替化合物A以外,與實施例4以相同方式進 行反應而得到高分子化合物F。高分子化合物F之換算聚 苯乙烯的數量平均分子量為4, 8xl03,換算聚苯乙烯的重 量平均分子量為6.8xl03。 實施例5 (高分子化合物G的合成)Polymer compound F was obtained in the same manner as in Example 4 except that 25. lmg (0. 112 mmol) of 2,1 -benzothiadiazole -4,7-diboronic acid was used instead of compound A. The number average molecular weight of the polystyrene converted from the polymer compound F was 4, 8 x 10 3, and the weight average molecular weight of the converted polystyrene was 6.8 x 10 3 . Example 5 (Synthesis of Polymer Compound G)

Pd(OAc)2Pd(OAc)2

在經氮氣取代燒瓶内的氣體之燒瓶中,添加 50· 0mg(0. 112mmol)化合物 A、61, 5mg(0. 112mmol)2, 7-二 漠-9, 9-二辛基苐、50mL四氫吱e南、〇· 25mg乙酸把、0· 79mg 324085 31 201247688 參(2-曱氧基苯基)膦而攪拌。在該反應液中,滴入使 59. 4mg(0. 561mmol)碳酸鈉溶解於i〇mL水而成之溶液,並 使其回流9小時而付到南分子化合物.G。高分子化合物G 之換算聚苯乙烯的數量平均分子量為3.OxlO4,換算聚苯 乙稀的重量平均分子量為1.5x105。 比較例3 (高分子化合物Η的合成)In a flask in which the gas in the flask was replaced with nitrogen, 50. 0 mg (0. 112 mmol) of Compound A, 61, 5 mg (0. 112 mmol) 2, 7-di- -9, 9-dioctyl hydrazine, 50 mL of 4 was added. Hydroquinone e, 〇 · 25 mg of acetic acid, 0. 79 mg 324085 31 201247688 ginseng (2-decyloxyphenyl) phosphine and stirred. A solution obtained by dissolving 59.4 mg (0.561 mmol) of sodium carbonate in i〇mL of water was added dropwise to the reaction mixture, and the mixture was refluxed for 9 hours to be added to the south molecular compound .G. The number average molecular weight of the converted polystyrene of the polymer compound G was 3.OxlO4, and the weight average molecular weight of the converted polystyrene was 1.5x105. Comparative Example 3 (Synthesis of polymer compound hydrazine)

除 了使用 43. 5mg(0. 112mmol)4, 7-雙(4, 4, 5, 5-四曱 基_1,3,2_ —氧雜棚雜壞戍烧-2-基)-2,1, 3_苯并°塞二β坐代 替化合物Α以外,與實施例5以相同方式進行反應而得到 高分子化合物Η。高分子化合物Η之換算聚苯乙烯的數量 平均分子量為1·7χ104,換算聚苯乙烯的重量平均分子量 為 5. lxlO4。 比較例4 (高分子化合物I的合成)In addition to the use of 43.5 mg (0. 112 mmol) of 4,7-bis(4,4,5,5-tetradecyl-1,3,2-oxo-poor oxazol-2-yl)-2,1 The polymer compound oxime was obtained in the same manner as in Example 5 except that the compound was reacted in the same manner as in Example 5. The number of converted polystyrenes of the polymer compound 平均 is 1·7χ104, and the weight average molecular weight of the converted polystyrene is 5. lxlO4. Comparative Example 4 (Synthesis of Polymer Compound I)

Pd(OAc)2Pd(OAc)2

P(o-MeOC6H4)3 fci,S、NP(o-MeOC6H4)3 fci,S,N

Νθ2〇〇3Νθ2〇〇3

THF Η20 除 了使用 25. lmg(0. 112mmol)2, 1,3-苯并噻二唑 324085 32 201247688 -4, 7-二硼酸代替化合物A以外’與實施例5以相同方式進 行反應而得到高分子化合物I。高分子化合物I之換算聚 本乙婦的數量平均分子量為5.4x103,換算聚笨乙稀的重 量平均分子量為7. 2xl03。 實施例6 (高分子化合物J的合成)THF Η20 was obtained in the same manner as in Example 5 except that 25.1 mg (0. 112 mmol) of 2,1,3-1,3-benzothiadiazole 324085 32 201247688 -4, 7-diboronic acid was used instead of compound A Molecular compound I. 2xl03。 The weight average molecular weight of the polystyrene is 7. 2xl03. Example 6 (Synthesis of Polymer Compound J)

BB

Pd(OAc)2Pd(OAc)2

在經氮氣取代燒瓶内的氣體之燒瓶中,添加 50· 0mg(0. 108mmol)化合物 B、59. lmg(0_ 108mmol)2, 7-二 溴-9, 9-二辛基苐、50mL四氫呋喃、〇. 24mg乙酸la、〇. 60mg 參(2-曱氧基苯基)膦並進行攪拌。在該反應液中,滴入使 57‘ lmg(0. 539mmol)碳酸鈉溶解於1〇虬水而成之溶液,且 使其回流9小時而得到高分子化合物j a高分子化合物j 之換算聚苯乙烯的數量平均分子量為5.6χ1〇4,換算聚笨 乙烯的重量平均分子量為1.5χΐ〇5。 比較例5 (1¾分子化合物Κ的合成) 324085 33 20124768850 mg (0. 108 mmol) of compound B, 59. 24 24 mg of acetic acid la, 〇. 60 mg of ginseng (2-decyloxyphenyl) phosphine and stirred. A solution obtained by dissolving 57' lmg (0.539 mmol) of sodium carbonate in 1 Torr of water was added dropwise to the reaction liquid, and the mixture was refluxed for 9 hours to obtain a polymer compound ja polymer compound j. The number average molecular weight of ethylene is 5.6 χ 1 〇 4, and the weight average molecular weight of the converted polystyrene is 1.5 χΐ〇 5. Comparative Example 5 (Synthesis of 13⁄4 molecular compound hydrazine) 324085 33 201247688

(h〇)2b〇〇-b(〇h&gt;2 + ^-^ULXJ(h〇)2b〇〇-b(〇h&gt;2 + ^-^ULXJ

CgH^ CgHuCgH^ CgHu

Pd(OAc)2Pd(OAc)2

除了使用26. lmg(0. 108minol)聯苯基-4, 4’-二蝴g楚代 替化合物B以外,與實施例6以相同方式進行反應而得到 高分子化合物K。高分子化合物K之換算聚苯乙稀的數量 平均分子量為5. 6x103,換算聚苯乙埽的重量平均分子旦 為 1. lxlO4。 實施例7 (高分子化合物L的合成)The polymer compound K was obtained in the same manner as in Example 6 except that 26. lmg (0. 108 minol) of biphenyl-4,4'-dibromo compound was used instead of the compound B. The number of polystyrenes in the conversion of the polymer compound K is an average molecular weight of 5. 6x103, and the weight average molecular weight of the polystyrene is 1. lxlO4. Example 7 (Synthesis of Polymer Compound L)

Pd(OAc)2 P(o-MeOCBH4)3 Ν32〇〇3Pd(OAc)2 P(o-MeOCBH4)3 Ν32〇〇3

THF HzOTHF HzO

在經氮氣取代燒瓶内的氣體之燒瓶中,添加 50. 0mg(0· 127mmol)化合物 C、69. 6mmol(〇. 127mmol)5, 5,- 二溴-4,4’-二(十四基)-2,2’-二°塞吩、5〇1111四氫吱喃、 0. 28mg乙酸I巴、〇. 71mg參(2-曱氧基苯基)膦並進行攪拌。 在該反應液中’滴入使67. 3mg(0. 635mmol)碳酸納溶解於 10mL水而成之溶液,並使其回流9小時而得到高分子化合 物L。高分子化合物L之換算聚苯乙烯的數量平均分子量 324085 34In a flask in which the gas in the flask was replaced with nitrogen, 50. 0 mg (0·127 mmol) of compound C, 69. 6 mmol (〇. 127 mmol) of 5,5,-dibromo-4,4'-di(tetradecyl) was added. 2,2'-di-epex, 5〇1111 tetrahydrofuran, 0. 28 mg of acetic acid I bar, 〇. 71 mg of ginseng (2-decyloxyphenyl)phosphine and stirred. A solution obtained by dissolving 67.3 mg (0.635 mmol) of sodium carbonate in 10 mL of water was added dropwise to the reaction liquid, and the mixture was refluxed for 9 hours to obtain a polymer compound L. The number average molecular weight of the polystyrene compound L converted polystyrene 324085 34

201247688 為3. 7x104’換算聚苯乙稀的重量平均分子量為8 比較例6 (高分子化合物Μ的合成)201247688 The weight average molecular weight of polystyrene converted to 3. 7x104' is 8 Comparative Example 6 (Synthesis of polymer compound hydrazine)

Pd(OAc)2 P(o-MeOC6H4)3 (ΗΟ)ζΒPd(OAc)2 P(o-MeOC6H4)3 (ΗΟ)ζΒ

Β(ΟΗ)2 +Β(ΟΗ)2 +

Na2C03 CuHa C„H29 了 除了使用21.8mg(0.127iM〇l)嗟吩、2,5_二侧酸代替 化合物C以外,與實蘭7以相同方式進行反應而得到高 分子化合物Μ°高分子化合物Μ之換算聚笨乙稀的數量平 均分子量為5.4χ103’換算聚苯乙烯的重量平均分子量為 L OxlO4 ° 刀 里,、.、 參考例1 (有機電晶體1的製造及評價) 使用含有高分子化合物L的溶液作失|_ F句電何輸送性化合 物,而製造具有第1 ®所表示的結構之有機電晶體卜 將作為閘極電極之經高濃度地摻雜+ Βθ 滩之η-型矽基板的 表面進行熱氧化,形成石夕氧化膜(以下稱為「執知 熱氧化膜的功能係作為絕緣層。其“、、氧化膜」)° 、久’藉由#絲玄I丨 (phot ο 1 i thography )步驟在熱氧化膜上剪 农作源極電極及汲 極電極。該源極電極及該汲極電極係從熱 队 (Cr)層及金(Au)層,且通道長度為2G 化膜側具有絡 # m ’通道寬度為 2mm。將如此操作而得到之形成有熱氧化 ^ %'源極電極及汲 極電極之基板,以丙酮進行超音波洗潫,# 久 並以臭氧UV清淨 35 324085 201247688 器進行UV臭氧處理。之後,以/5-苯乙基三氯矽烷修飾熱 氧化膜的表面,並使用五氟苯硫醇修飾源極電極及汲極電 極的表面。其次,在經上述表面處理之熱氧化膜、源極電 極及汲極電極上,將0.5重量%的高分子化合物L的鄰二氯 苯溶液以lOOOrpm的轉速進行旋轉塗佈而形成有機半導體 層。之後,將有機半導體層於230°C加熱1小時來製造有 機電晶體1。 使所得到之有機電晶體1的閘極電壓Vg、源極-汲極 間電壓Vsd變化,以測定電晶體特性。場效移動度係1. 8x 10_2cm2/Vs。 參考例2 (有機電晶體2的製造及評價) 除了使用高分子化合物Μ代替高分子化合物L以外, 與參考例1以相同方式製造有機電晶體2。 使所得到之有機電晶體2的閘極電壓Vg、源極-汲極 間電壓Vsd變化,以測定電晶體特性。場效移動度係2. Ox 10-3cm2/Vs。 【圖式簡單說明】 第1圖係表示有機電晶體(場效型有機電晶體)之一例 之示意剖面圖。 【主要元件符號說明】 1 活性層 2 絕緣層 3 閘極電極 4 源極電極 5 汲極電極 100 有機電晶體 324085 36Na2C03 CuHa C„H29 In addition to using 21.8 mg (0.127 μM〇l) porphin and 2,5-di-acid instead of compound C, it reacted with real blue 7 in the same manner to obtain a polymer compound Μ° polymer compound. The number average molecular weight of the polystyrene is 5.4 χ 103'. The weight average molecular weight of the polystyrene is L OxlO4 °. Knife,,,,,,,,,, The solution of compound L is lost, and the organic transistor having the structure represented by the first formula is used as a gate electrode with a high concentration of doping + Βθ beach η-type. The surface of the ruthenium substrate is thermally oxidized to form a ruthenium oxide film (hereinafter referred to as "the function of the known thermal oxide film is used as the insulating layer. The ",, oxide film") °, long time by #丝玄 I丨 ( Phot ο 1 i thography ) The step of cutting the agricultural source electrode and the drain electrode on the thermal oxide film. The source electrode and the drain electrode are from the heat (Cr) layer and the gold (Au) layer, and the channel length is 2G. The film side has a network #m' channel width of 2 mm. The substrate obtained by the thermal oxidation of the % electrode electrode and the electrode electrode was ultrasonically washed with acetone, and subjected to UV ozone treatment with ozone UV cleaning 35 324085 201247688. Thereafter, the surface of the thermal oxide film was modified with /5-phenethyltrichloromethane, and the surface of the source electrode and the drain electrode was modified with pentafluorobenzenethiol. Next, 0.5% by weight of a polymer compound L ortho-dichlorobenzene solution was spin-coated at a number of revolutions of 1000 rpm on the surface-treated thermal oxide film, source electrode and drain electrode to form an organic semiconductor layer. Thereafter, the organic semiconductor layer was heated at 230 ° C for 1 hour to fabricate an electromechanical crystal 1. The gate voltage Vg and the source-electrode voltage Vsd of the obtained organic transistor 1 were changed to measure the transistor characteristics. The field effect mobility is 1. 8x 10_2cm2/Vs. Reference Example 2 (Manufacturing and evaluation of the organic transistor 2) An organic transistor 2 was produced in the same manner as in Reference Example 1 except that the polymer compound Μ was used instead of the polymer compound L. The gate voltage Vg and the source-electrode voltage Vsd of the obtained organic transistor 2 were changed to measure the transistor characteristics. Field effect mobility is 2. Ox 10-3cm2/Vs. BRIEF DESCRIPTION OF THE DRAWINGS Fig. 1 is a schematic cross-sectional view showing an example of an organic transistor (field effect type organic transistor). [Main component symbol description] 1 Active layer 2 Insulation layer 3 Gate electrode 4 Source electrode 5 Dip electrode 100 Organic transistor 324085 36

Claims (1)

201247688 七、申請專利範圍: 1· 一種化合物,其係式(1)所表示者: R23 R24201247688 VII. Patent application scope: 1. A compound expressed by the formula (1): R23 R24 L式中,A係表示伸芳基、伸雜芳基 各自獨立地表示氫原;;、海 基、方基、雜芳基或氰基,^及R,2係各自獨立地表六 虱原子、烧基、芳基或雜芳基;R21、R22、r23、r24、R25 R、R及R係各自獨立地表示氫原子、烷基、烷氧基 烧硫基、㈣子、芳基或雜芳基;複數個時,^ 以相同亦可以不同H複數個時,可以相同亦可以 不同,R係複數個時,可以相同亦可以不同;π係複 數個時,可以相同亦可以不同;R25係複數個時,可以 相同亦可以不同;R26係複數個時,可以相同亦可以不 同;R27係複數個時,可以相同亦可以不同;R28係複數 個時’可以相同亦可以不同;ml、…、…及蚪係各自 獨立地表示1至5的整數,ni、n2、n3及n4係各自獨 立地表示〇或1 ]。 如申請專利範圍第1項所述之化合物,其中,A係伸雜 方基。 324085 1 201247688 3·如申請專利範圍第2項所述之化合物,其中,A係式(2) 表示之基:In the formula L, the A system represents that the aryl group and the heteroaryl group each independently represent a hydrogen atom;; a sea group, a square group, a heteroaryl group or a cyano group, and the R and 2 groups each independently represent a hexafluorene atom, An alkyl group, an aryl group or a heteroaryl group; R21, R22, r23, r24, R25 R, R and R each independently represent a hydrogen atom, an alkyl group, an alkoxythio group, a (tetra), an aryl group or a heteroaryl group. Base; when plural, ^ can be the same or different H, when they are plural, they can be the same or different. When R is plural, they can be the same or different; when π is plural, they can be the same or different; R25 is plural When R26 is plural, it can be the same or different; when R27 is plural, it can be the same or different; when R28 is plural, it can be the same or different; ml,...,... The 蚪 and 蚪 are each independently representing an integer from 1 to 5, and ni, n2, n3 and n4 each independently represent 〇 or 1 ]. The compound of claim 1, wherein the A is a heterocyclic group. 324085 1 201247688 3. The compound according to claim 2, wherein the base of formula A (2) is: (2) [式中,R41及R42係各自獨立地表示氫原子、烷基、 燒氧基、烧硫基、芳基、雜芳基、齒原子、氛基或石肖 基;R41中的碳原子與R42中的碳原子亦可鍵結而形成環 狀結構;Y 係表示一S—、一0—、— Se_、_NR51—、 或-cn- m R62係、各自獨立地表示氮原 子、烷基、芳基或雜芳基]。 4·如申請專利範㈣2項所述之化合物,其巾,A係式⑶ 表示之基:(2) wherein R41 and R42 each independently represent a hydrogen atom, an alkyl group, an alkoxy group, a sulfur-containing group, an aryl group, a heteroaryl group, a tooth atom, an aryl group or a schlossyl group; and a carbon atom in R41 The carbon atoms in R42 may also be bonded to form a cyclic structure; Y represents an S-, a 0-, - Se_, _NR51-, or -cn-m R62 system, each independently representing a nitrogen atom, an alkyl group, Aryl or heteroaryl]. 4. If the compound described in the application of the patent (4) 2, the towel, the basis of the formula A (3): [式中R &amp; R係各自獨立地表示氣原子、烧基、 院氧基丨、、院硫基、芳基或雜芳基;U係表示1至5的整 數R為複數個時,係可以相同亦可以不同;為複 數個時’係可以㈣亦可以不同;在互相直接鍵結之2 324085 2 201247688 個2碳原子所各自鍵結的眇及R72中’ Rn中的碳原子與 R72中的碳原子亦可以鍵結而形成環狀結構]。 5.如申請專利範圍第丨項所述之化合物,其中,A係式(4 表示之基,Wherein R &amp; R each independently represents a gas atom, a pyridyl group, a sulfhydryl group, a thiol group, an aryl group or a heteroaryl group; and a U system represents a plurality of integers R of 1 to 5, It can be the same or different; when it is plural, it can be different (4); it can be directly bonded to each other 2 324085 2 201247688 2 carbon atoms are bonded to each other and R72 is the carbon atom in Rn and R72 The carbon atoms can also be bonded to form a cyclic structure]. 5. The compound of claim 3, wherein the formula A is based on 餘 R84 R33 (4) [式中,R8i、m眇係各自獨立地表示氣原 子、烷基、烷氧基、烷硫基、芳基或雜芳基;乂係表示 '至1的整數;R81為複數個時,係可以相同亦可以不 同,R2為複數個時,係可以相同亦可以不同;R83為複 數個時,係可以相同亦可以不同;R84為複數個時,係 可以相同亦可以不同;在互相直接鍵結之2個碳原子 所各自鍵結的R81及R82中,R81中的碳原子與R82中的碳 原子亦可賴結㈣成賴結構;在互相直接鍵結之2 個碳原子山所各自鍵結的R83及R84中,r83中的碳原子與 R中的碳原子亦可以鍵結而形成環狀結構卜 如中π專利$&amp;圍第1至5項中任-項所述之化合物,其 中ml與η1的和為2,m2與η2的和為2,m3與η3的 和為2,且m4與η4的和為2。 -種:有式(6)表示的重複單元及式⑺表示的重複單 π之呵分子化合物的製造方法,其係在過渡金屬錯合 324085 3 201247688 物及鹼的存在下,使如申請專利範圍第1至6項中任 一項所述之化合物與式(5)表示的化合物進行聚合; X1——E——χ2 (5) [式中,Ε係表示伸芳基、伸雜芳基、一esc—或 CR -CR — , R91及R92係各自獨立地表示氫原子、烧 基、芳基、雜芳基或氰基;χΐ及X2係各自獨立地表示 齒原子、烷基磺酸酯基或芳基磺酸酯基];R84 R33 (4) wherein R8i and m眇 each independently represent a gas atom, an alkyl group, an alkoxy group, an alkylthio group, an aryl group or a heteroaryl group; the lanthanide group represents an integer from '1'; R81 When it is plural, the system may be the same or different. When R2 is plural, the system may be the same or different. When R83 is plural, the system may be the same or different. When R84 is plural, the system may be the same or different. In R81 and R82 in which each of the two carbon atoms directly bonded to each other is bonded, the carbon atom in R81 and the carbon atom in R82 may also depend on the structure of (4); the two carbons directly bonded to each other; In R83 and R84, each of which is bonded to the atomic mountain, the carbon atom in r83 and the carbon atom in R may also be bonded to form a cyclic structure. For example, in the middle π patent $&amp; The compound wherein the sum of ml and η1 is 2, the sum of m2 and η2 is 2, the sum of m3 and η3 is 2, and the sum of m4 and η4 is 2. - a method for producing a repeating unit represented by the formula (6) and a repeating single π molecule compound represented by the formula (7), which is in the presence of a transition metal mismatch 324085 3 201247688 and a base, as in the scope of application The compound according to any one of items 1 to 6 is polymerized with the compound represented by the formula (5); X1 - E - χ 2 (5) [wherein, the lanthanide group represents an aryl group, a heteroaryl group, An esc- or CR-CR-, R91 and R92 each independently represent a hydrogen atom, an alkyl group, an aryl group, a heteroaryl group or a cyano group; the oxime and the X2 group each independently represent a tooth atom, an alkyl sulfonate group Or aryl sulfonate group]; ⑹ (7) [式(6)及式(7)中,人及Ε係表示與前述相同意義] •如申請專利範圍第7項所述之高分子化合物的製造&gt; 去其中,E係伸芳基或伸雜芳基。 9·^請專利範圍第7或8項所述之高分子化合物的㈣ 中,X,及r係氯原子 '演原子或蛾原子。 .物:=:ΠΓ9項中任,述― 11 其_,鹼係碳酸鹽或磷酸鹽。 申请專利範圍第7至10項中任一 合物的製造方法“ 局分子化 合物。 ,其中,前述過渡金屬錯合物係鈀錯 324085(6) (7) [In the formulas (6) and (7), the human and the lanthanide are expressed in the same meaning as described above] • The production of the polymer compound as described in claim 7 of the patent application&gt; Aryl or heteroaryl. 9. In the (4) of the polymer compound described in the seventh or eighth aspect of the patent, X, and the r-type chlorine atom are 'atoms or moth atoms'. .::: ΠΓ9 of the ninth, -11, its base, alkali carbonate or phosphate. The method for producing a compound according to any one of claims 7 to 10, wherein the transition metal complex is a palladium error 324085
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