201233929 • 六、發明說明： c發明戶斤屬之技術領域】 發明領域 本發明係有關於一種用以控制使用電漿之真空骏置所 利用之真空容器内之氣流的真空控制閥。 Γ ^tr 發明背景 半導體裝置之製造有使用例如電漿蝕刻之電漿的製 程。電漿蝕刻之製程中，係透過真空控制閥使蝕刻氣體流 動並且控制真空容器内之真空壓力。真空壓力之控制係藉 由操作真空控制閱之氣導（conductance)來進行。氣導之 操作在廣泛使用於電漿蝕刻之擺式真空控制閥中，係藉由 操作擺式閥體來調整閥開度以進行之(專利文獻1)。然而， 操作擺式閥體調整閥開度之方法在少流量區域（低氣導區 域)之控制性不佳，因此具有無法對應於蝕刻氣體小流量化 之問題。 另一方面，真空壓力之控制亦使用可對應於蝕刻氣體 之小流量化之提動方式之真空控制閥。提動方式係藉由活 塞的直線運動而操作閥體與閥座之距離（升舉量）來調整氣 導之方式（專利文獻2)。然而，提動方式之真空控制閥由於 金屬製之伸縮管不具有耐電漿性，因此無法使用於使用電 漿之真空容器。金屬製之伸縮管係使用於活塞之直線運動 所必須之滑動部分之封閉以維持真空度之構成零件。 【先行技術文獻】 201233929 【專利文獻】 【專利文獻1】日本專利特開2009— 117444號公報 【專利文獻2】日本專利特開2010—276096號公報 【專利文獻3】曰本專利特開2003— 194257號公報 【專利文獻4】日本專利特開2000 — 130635號公報 【專利文獻5】日本專利特開平〇3 —260072號公報 C發明内容3 發明概要 發明欲解決之課題 如此’習知之技術中，要改善使用電漿之真空容器中 在少量流區域(低氣導區域)之控制性，由各種真空控制閥之 性質上的觀點來看是極為困難的。 本發明係為了解決上述習知之課題而創作者，其目的 在於提供一種用以控制使用電漿之真空容器之氣流之提動 方式的真空控制閥。 解決課題之手段 以下，因應就可有效解決上述課題的手段等顯示效果 等並加以說明。 手段1 · 一種真空控制閥，係連接於使電漿產生之真空 容器與真空栗之間’並藉由閥開度之操作，控制前述真空 容器内之真空壓力者，包含有： 控制閥本體，具有：連接前述真空容器與前述真空泵 之閥本體流路、及形成於前述閥本體流路之閥座； 致動器’具有：藉直線運動調整與前述閥座之間之距 離之升舉量’進行前述閥開度之操作的閥體；產生用以使 201233929 前述間體進行直線運動之驅動力之直_㈣$ 述驅動力從前述直線驅動部傳達至前述_之圓柱型桿則 述桿之滑動範圍且呈圓筒型之圓筒型構件·’及 型構件滑動’並且用以封閉前述_流路: 與刖遂閥本體流路之外部側之間之滑動封_， 前述滑動範圍包含藉由前述升舉 閥本趙㈣嶋細㈣流㈣H圍述 件具有外周面，該外周面相較於前述桿 ^ ，每單位面積之氣體之吸附量較少。 。。手係—種真空控制閥，連接於使電製產生之真空容 讀真空栗之間，並且藉由閥開度之操作來控制真空容器 内之真轉力。本真空控制_有覆蓋包含藉升舉量之摔 :可㈣本體流賴移動_本體流路之外部側之範圍之 滑動範圍的11筒型構件。圓筒型構件具有每單位面積之氣 體之吸附量比桿之外表面還少之外周面，因此可抑制因氣 體吸附在閥本體流路之外部側而引起氣體㈣本體流路 (構成真空流路之一部份)搬運。 藉此，可不使用無耐電漿性之金屬製伸縮管，實現了 適用於使提動方式之真空控制閥之產生電漿之真空容器。 結果，可對應於產生錢之真空容器中之㈣氣體小流量 化。 如此，手段1之真空控制閥提供一種藉由抑制氣體往桿 吸附以封閉之新封閉技術，藉此可對應於產生電漿之真空 谷器中之蝕刻氣體的小流量化。本封閉技術係與習知之基 201233929 本想法中以物理性方式將閥本體流路（構成真空流路之一 伤）與外部空間隔離之習知封閉技術有所區分，係基於全 新之想法而做成者。 本封閉技術係基於本發明人之實驗與解析而發現新锞 題而創作者。本發明人之實驗中，其中一例確認了業經陽 極處理（陽極氧化處理)之紹製桿在作動時有氣體泡漏。本洩 漏也被認為是起因於桿在作動時物理性隔離受到阻礙而發 生’但本發明人藉由解析也發現纽轉⑽衫要因素 之可^<!生。本發明人藉由裝設覆蓋桿之圓筒型構件來進 行，確認洩漏顯著減少且驗證了解析是正確的。手段1之 空控制閥係根據如此之實驗與解析而新作成者。 之真空控制閥，其中前述圓筒型 件具有絕緣性之燒結體，且該燒結體係由具有絕緣性 金屬材料經由熱處理而燒固者。 手段2中’由於圓筒型構件具有具絕緣性之非金屬 藉熱處理而燒固之絕緣性燒結體，因此藉由高絕緣性 現高焚抗性’並且可以高剛性有效地抑制封閉構造 、並且寄予低表面積化。低表面積化可實現平滑之表 並且藉抑制凹凸引起表面積之增大而實現之。具體而J ^發明人發現’例如即㈣製桿之陽極氧化皮膜進行^孔 f凹凸❹，因此氣體之吸附量多。根據本發明人之實 驗，確認了燒結體相較於陽極氧化皮膜，凹凸較少= 可使吸附量明顯減少。 口此 手段3·如手段2記载之真空控制閥，前述燒結體係由氧 201233929 ¥ 化鋁燒固之陶瓷所構成。 手段3中，由於燒結體係由氧化紹燒固之陶究所形成， 因此藉由崎料特性，可實現高構造強度與絕緣性。 手段4·如手段2或3記狀真空控㈣， 屬材料構成。 段5·如手段4記载之真空控制閥，其中_桿係_ 手段6.如手段4或5記叙真空控卿， 型構件具有每單位_之氣·附量崎 成之前述桿之絲㈣少之外^。 ㈣料 根據手段6，燒結體相較於陽極氧化皮膜 因此可顯著降低吸附量。 u凸孕乂y， 手段7_如手段丨至6巾任—項喊之真 前述圓筒型構件具有：圓筒構件， ^閥’其中 刖述外表面；及2個彈性封閉 永覆盖 上間隔配置，並具有封閉前心〜在㈣桿之作動方向 对閉_财之間隙之彈性。 手段7中，係在設有預定間隙且覆 與桿之間，具有封閉該間隙之2個彈性封:之圓筒構件 因為環境溫度之變化造成圓筒構件與桿 牛’因此即使 亦可藉由彈性封閉構件吸收。藉此，二:略脹量不同， 選擇之設計自由度變大，因此例如桿之材/與桿之材料 勒性優異之金屬材料(例如叙)，另—方面，==強度或 亦可選擇絕緣性優異之氧化铭之燒結體。_件之材料 手段8·如手段1至7之任一者記載之__, 201233929 :構::與_動封閉構件予，，之空間;及：= 二j以從前述真細室進行真叫之流路，= 之;動封閉構件係封閉前述真空滑動室與 二 二述第2滑動封閉構件係封閉前述真空滑動室= 奴間’前述真空滑動室具有筒狀空間，" 疋從前述第k滑動封閉構件到前第 4狀空間 前述桿之作動方向而形成。K第〜動封閉構件含括 ，段8之致動器中，可進行真空吸引之真空滑動室 於圓筒型構件滑動之滑動面，因此藉由升舉量之操作^ 使桿越過第1滑動封閉構件亦會插入真空滑動室。真办典P 室連接作為用以進行真空吸引之流路的真空㈣流路，= 此可抑制氣體往桿之吸W寸。另-方面，冑空滑動室1具有由 第1滑動封閉構件到第2滑動封閉構件含括桿之作動^向而 形成之筒狀因此可加大在真空滑動室與閥本體流路 之間之作為作動狀態之升舉量的操作量。 進而’若是藉由超過為在真空滑動室與閱本體流路之 間往返之作動狀態之升舉量之升舉量的操作，即使桿越過 第2滑動封閉構件’亦可抑制以滑動面為中繼點之氣體的搬 運。藉此，可進而抑制藉由氣體之吸附與脫離進行之氣體 由外部往真空流路之搬運。 手段9 ·如手段8記載之真空控制間，其中前述真空滑 動室係形成於全部覆蓋藉由前述升舉量之操作從前述閥本 201233929 體流路:往前述真空滑動室之外部側移動之區域的範圍。 手段9中，真空滑動室形成於全部覆蓋藉升舉量之操作 由閥本體流路側往真空滑動室之外部側移動之區域的範 圍’因此露出於閥本體流路内之範圍之桿可在真空滑動室 與閥本體抓路之間往返。藉此’露出於閥本體流路内之範 圍之桿經常在被真空吸引之區域的範圍内，因此可確實地 抑制氣體之吸p付弓丨起之$漏。本構成可藉由真空滑動室之 (桿之作動方向）之調整與升舉量之限制(例如機械方式 限制)之調整之至少-者而實現。 + &10_”段8或9記載之真空控制閥其巾前述第1 月動封閉構件具有：雜構件，係具有分岔㈣之一對端 緣部；及施壓邱 ... ° ’係朝擴展前述一對端緣部之方向施壓。 手奴10中’由於具有朝分岔形成之一對端緣部擴展之 ㈣’因此即使真空滑祕域因真空吸引而 成為低壓’亦可提高端緣部之面壓而實現高封閉性能。 且勹種係用以控制真空控制閥之真空控制裝置， 間 有如申叫專利範圍第8至10項中任一項之真空控制 :其中則述控制部具有氣導操作模式該氣導操作模式 1糸限制前述^ 竿里之操作，以使從前述閥本體流路側往前 之外部側移動之區域進人前述真空滑動室之 範圍内。 允抑制^ 1提供可控制真空控制閥之真空控制裝置。本 室:置中，由於具有限制由閥本體流路側往真空滑 P側移動之升舉量之操作的氣導操作模式，因此 201233929 出於閥本體流路之範圍可在真空滑動室與閥本體流路之間 往返。藉此，可防止在閥本體流路或真空滑動室之外部的 吸附，可幾乎不發生洩漏，實現高真空度。 手段12.如手段11記載之真空控制裝置，前述控制部具 有脫離模式，脫離模式係在前述氣導操作模式開始前，使 已從前述閥本體流路側移動到前述真空滑動室之外部側的 範圍在預先設定之預定時間内配置於前述真空滑動室内。 手段12係控制部具有脫離模式，該脫離模式是在氣導 操作模式開始前，使往真空滑動室之外部側移動之範圍在 予先設定之預定時間配置於真空滑動室内，因此氣導操作 模式在自吸附氣體之範圍之脫離結束後才開始。藉此，可 防止作動模式往氣導操作模式之遷移引起之洩漏。 手段13.如手段1至10之任一者記載之真空控制閥，其 中前述直線驅動部具有：壓缸，係供作動流體流通者；活 塞，係於前述壓缸内形成作動室，並且因應於前述作動室 之作動流體的壓力產生載重；及施壓部，係使前述活塞朝 向前述升舉量變小之方向施壓，其中前述桿係前述閥體與 前述活塞結合之活塞桿。 手段13中，直線驅動部係受因應於作動流體之壓力而 產生載重之活塞驅動，因此適於防爆環境，並且可以小型 產生大的驅動力。藉此，可實現適合半導體製造裝置之真 空控制閥。 再者，本發明不僅可以真空控制閥或真空控制系統， 還可以例如真空控制方法或將該方法具體化之電腦程式、 10 201233929 « 程式媒體等形式而具體化。 圖式簡單說明 第1圖係顯示非通電時（閥全閉）之真空控制閥10之構成 的截面圖。 第2圖係顯示非通電時之真空控制閥10具有之滑動部 60之構成的放大截面圖。 第3圖係顯示閥全開時之真空控制閥10之構成的截面 圖。 第4圖係顯示真空控制閥10之真空壓力之控制時之作 動狀態的截面圖。 第5圖係顯示墊圈70與内周面63之間之摩擦面的放大 截面圖。 第6圖係顯示真空控制閥10之作動内容之一例的流程 圖。 I：實施方式3 較佳實施例之詳細說明 (本發明之實施形態） 以下、依據圖式說明本發明具體化之第1實施形態。本 實施形態係就執行使用電漿之蝕刻製程之半導體製造裝置 所使用之新穎真空控制閥與該控制裝置具體化。 (真空控制閥之基本構成） 第1圖係顯示非通電時（閥全閉）之真空控制閥10之構成 的截面圖。第2圖係顯示非通電時之真空控制閥10具有之滑 動部60之構成的放大截面圖。第3圖係顯示閥全開時之真空 201233929 -a 控制閥ίο之構成的截面圖。真空控制閥1〇具有：控制閥本 體40、缸筒部70、動作部30、及滑動部6〇。再者，缸筒部 70、動作部30、及滑動部60也稱為致動器。 控制閥本體40具有朝動作部3〇之作動方向（轴線方向） 延伸之圓筒狀形狀。控制閥本體40在該軸線方向上於缸筒 部7〇側，形成有具有開口部49之略圓柱狀之凹部。控制閥 本體40有裝設有純㈣部之滑動部6()而形朗本體流路 46。閥本體流路46連接一次側埠41與二次側埠44。一次侧 槔41連接使用錢之真空容器。二次鱗44連接真空栗。 閥本體流路46形成有：與一次側埠41連通之一次側連 通口 42、與二次側崞44連通之二次側連通口 45(參照第3 圖）、及形成於二次側連通口45之周圍之間座43。另一方 面’在閥本體流路46於與二次側連通口45對向之位置安 裝有滑㈣本航路4δ之㈣隱置有具杨作部％ 之閥體33。閥體33安裝有由該一部分由閥體33突出之〇環 35。閥座43係例如相對於閥體33為與軸線方向相對之環狀 區域’且形成為在二次側連通σ45之周圍之表面粗链度相 較於其他部錄小區域（面_度健之區域）。 閥本體流路46中，可實現阻隔一次側蜂Μ與二次侧璋 ♦間之㈣機能、及操作—次側埠41與二次側埠44之間 :::之軋導調整機能。阻隔機能與氣導調整機能任一者 ㈣她，座43之間之距離的升舉量U作為間 32之位 置舶：而：現。升舉—可藉由使圓筒型構件 '上43進行相對的直線移動來調節。 12 201233929 阻隔機能係如第1圖所示，在閥本體流路46之内部中， 使閥體33抵接於閥座43(升舉量La為零），將二次側埠44與閥 本體流路46隔離來進行。阻隔時之封閉係藉由使到達閥體 33之〇環35抵接且堵住閥座43來實現。另一方面，氣導調整 機能係藉由則㈣3 3㈣座4 3之間之距離的升舉量l a (參 照第3圖）作為閥開度來調節而實現。氣導意指流路中之氣 體之流動容易度。 、 動作部30具有：閥體33、連接於閥體33之活塞桿31、 ^連接於活塞桿31之另-端敎活塞51。閥體33經由活塞 心而精由活塞51來驅動。活塞糾之外周方向之外表面 破圓筒型構件32被覆。圓筒型構件％之詳細情況於後述。 再者，活塞桿31亦單稱為桿。 严 开另别问缸官乃之内周面73朝半徑方向延伸之 二並且形成有在紅管71之内周面73密閉之閥開度 广照第3圖）。活塞51之外周端部連接筒狀構件 件52在軸線方向上朝間開度操作室36之柏反 持& /、有圓筒狀形狀。於活塞51連接有藉由調壓閥保 、D 4密封閥開度操作室36之調壓 ’、 藉螺铉 月®阀Μ凋壓閥保持器54 動室栓固於活塞51。再者，_度操作室36亦稱為作 汗又操作室36形成為由調壓閥53 型構件32雜阀53 /月動部60、圓舊 環狀密門^ 賴閥保持器54)所包圍之容積可& 7_:::=之=_部，， 1籍此凋壓閥53與滑動部60之間以及 13 201233929 調壓閥5 3與缸管7丨之間係被密閉（㈣）的。閥開度操作室3 6 係藉由調壓閥5 3將内周面7 3所形成之内部空間區隔而形 成。閥開度操作室36可經由開閥用空氣流路21與連接流路 22而供給操作空氣。 活塞51被施壓彈簧75施壓。施壓彈簧75係對動作部3〇 之活塞51朝升舉量La與閥開度操作室36之容積皆變小之方 向施加施壓力。施壓彈簧75收容於被缸管71之内周面73與 具有環狀形狀之頂蓋81所包圍之空間。施壓彈簧75之一邊 係相對於活塞51而在_開度操作室36在軸線方向為相反 側（裏側）抵接。施壓彈簧75之另—邊抵接於頂蓋81。201233929 • VI. INSTRUCTIONS: C TECHNICAL FIELD OF THE INVENTION The present invention relates to a vacuum control valve for controlling the flow of air in a vacuum vessel utilized by a vacuum chamber using plasma. Γ ^tr BACKGROUND OF THE INVENTION Semiconductor devices are manufactured using processes such as plasma etched plasma. In the plasma etching process, the etching gas is flowed through the vacuum control valve and the vacuum pressure in the vacuum vessel is controlled. The control of the vacuum pressure is performed by operating the vacuum control to conduct the conductance. The air conduction operation is performed by operating a pendulum valve body to adjust the valve opening degree in a pendulum vacuum control valve widely used for plasma etching (Patent Document 1). However, the method of operating the pendulum valve body to adjust the valve opening degree has poor controllability in a small flow rate region (low air guiding region), and therefore has a problem that it cannot cope with a small flow rate of the etching gas. On the other hand, the vacuum pressure control is also controlled by a vacuum control valve which can correspond to a small flow rate of the etching gas. The pull-out method is a method of adjusting the air conduction by operating the distance between the valve body and the valve seat (lift amount) by the linear motion of the piston (Patent Document 2). However, the vacuum control valve of the lift type cannot be used for a vacuum container using a plasma because the metal telescopic tube does not have plasma resistance. The metal telescopic tube is used for the sealing of the sliding portion necessary for the linear movement of the piston to maintain the vacuum. [Patent Document 1] [Patent Document 1] Japanese Patent Laid-Open No. 2009-117444 (Patent Document 2) Japanese Patent Laid-Open Publication No. 2010-276096 (Patent Document 3) Japanese Patent Laid-Open Publication No. Hei. No. Hei. No. Hei. No. Hei. No. Hei. No. Hei. No. Hei. No. Hei. It is extremely difficult to improve the controllability of a small amount of flow area (low air conduction area) in a vacuum vessel using plasma, from the viewpoint of the nature of various vacuum control valves. The present invention has been made in an effort to solve the above-mentioned problems, and an object thereof is to provide a vacuum control valve for controlling a manner of lifting a gas stream using a vacuum container of plasma. Means for Solving the Problems The following is a description of the effects and the like of the means for effectively solving the above problems. Means 1 · A vacuum control valve is connected between the vacuum vessel and the vacuum pump generated by the plasma and controls the vacuum pressure in the vacuum container by the operation of the valve opening degree, and includes: a control valve body, And a valve body flow path connecting the vacuum container and the vacuum pump, and a valve seat formed on the valve body flow path; the actuator 'having: a lifting amount of the distance between the valve seat and the valve seat by linear motion' a valve body that performs the operation of the valve opening; generates a driving force for linearly moving the intermediate body of 201233929. (4) The driving force is transmitted from the linear driving portion to the cylindrical rod of the aforementioned _ Sliding range and cylindrical type cylindrical member · 'and type member sliding' and used to close the aforementioned _ flow path: sliding seal _ between the outer side of the valve body flow path, the aforementioned sliding range includes The above-mentioned lift valve Ben Zhao (four) 嶋 fine (four) flow (four) H enclosure has an outer peripheral surface, the outer peripheral surface is less adsorbed by the gas per unit area than the aforementioned rod ^. . . The hand-type vacuum control valve is connected between the vacuum-reading vacuum pump generated by the electric system, and the true rotation force in the vacuum container is controlled by the operation of the valve opening degree. The present vacuum control has an 11-tube type member that covers the sliding range including the range of the outer side of the moving body path. The cylindrical member has a smaller amount of adsorption per unit area of gas than the outer surface of the rod, so that the gas (4) main body flow path (constituting the vacuum flow path) caused by gas adsorption on the outer side of the valve body flow path can be suppressed. One part)) handling. Thereby, it is possible to realize a vacuum container suitable for generating a plasma of a vacuum control valve of a lift type without using a metal telescopic tube which is resistant to plasma. As a result, it is possible to correspond to (iv) small gas flow in the vacuum container that generates money. Thus, the vacuum control valve of the means 1 provides a new closing technique for suppressing the adsorption of gas to the rod to close, thereby being able to correspond to a small flow rate of the etching gas in the vacuum vane which generates the plasma. This closed technology system and the well-known basis 201233929 This idea physically distinguishes the valve body flow path (which constitutes one of the vacuum flow paths) from the external space, and is based on a new idea. Adult. The present closure technique is based on the inventors' experiments and analysis to discover new creators and creators. In the experiments of the present inventors, one of them confirmed that the rod subjected to the anodizing treatment (anodizing treatment) had a gas bubble at the time of actuation. This leak is also thought to be caused by the physical isolation of the rod being hindered when it is actuated. However, the inventors have found that the factor of the button can be found by analysis. The inventors performed by installing a cylindrical member covering the rod, and confirmed that the leakage was remarkably reduced and verified that the analysis was correct. The air control valve of means 1 is newly developed based on such experiments and analysis. A vacuum control valve in which the cylindrical member has an insulating sintered body, and the sintered system is baked by an insulating metal material by heat treatment. In the means 2, since the cylindrical member has an insulating sintered body which is sintered by heat-insulating non-metal by heat treatment, it is highly ignitable by high insulation and can effectively suppress the closed structure with high rigidity, and Low surface area is placed. The low surface area can achieve a smooth surface and is achieved by suppressing the increase in surface area caused by the unevenness. Specifically, the inventors have found that, for example, the anodized film of the (four) rod is subjected to the pores, so that the amount of adsorption of the gas is large. According to the experiments of the present inventors, it was confirmed that the sintered body has less unevenness than the anodized film = the amount of adsorption can be remarkably reduced. The means 3 is the vacuum control valve described in the means 2, and the sintering system is composed of oxygen 201233029 aluminum-fired ceramic. In the means 3, since the sintering system is formed by the ceramics which are sintered by oxidation, high structural strength and insulation can be achieved by the sacrificial properties. Means 4 · Such as means 2 or 3 marked vacuum control (4), is a material composition. Paragraph 5: The vacuum control valve as described in the means 4, wherein the _bar system _ means 6. If the means 4 or 5 describes the vacuum control, the type member has the wire of the above-mentioned rod per unit _ gas (4) Less than ^. (4) According to means 6, the sintered body can significantly reduce the adsorption amount compared to the anodized film. u convex pregnancy y, means 7_ such as means 丨 to 6 towel 任—the shouting truth The cylindrical member has: a cylindrical member, ^ valve ' which describes the outer surface; and 2 elastic closed forever covering the interval Configuration, and has a closed front center ~ in the (four) rod of the direction of the movement of the closed-to-close gap. In the means 7, in the case where a predetermined gap is provided and the rod is covered, there are two elastic seals that close the gap: the cylindrical member is caused by the change of the ambient temperature, so that even by the rod The elastic closure member absorbs. Therefore, two: the amount of slight expansion is different, and the degree of design freedom of the selection becomes large, so for example, the material of the rod/metal material excellent in the material of the rod (for example, Syria), and the other aspect, the == strength or may also be selected. A sintered body of Oxidation, which is excellent in insulation. _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ Calling the flow path, =; the moving closure member is closed to the vacuum sliding chamber and the second sliding sealing member is closed to the vacuum sliding chamber = slave room. The vacuum sliding chamber has a cylindrical space, " The k-th sliding closure member is formed in the actuating direction of the rod in the front fourth space. The Kth moving-closing member includes the sliding surface of the vacuum sliding chamber in which the vacuum suction is applied to the cylindrical member in the actuator of the segment 8, so that the rod is moved over the first sliding by the lifting amount operation The closure member is also inserted into the vacuum sliding chamber. The chamber P is connected as a vacuum (four) flow path for vacuum suction, = this can suppress the suction of gas into the rod. On the other hand, the hollow sliding chamber 1 has a cylindrical shape formed by the first sliding closing member to the second sliding closing member including the rod, so that it can be enlarged between the vacuum sliding chamber and the valve body flow path. The amount of operation as the lift amount of the actuation state. Further, if the lift exceeds the second slide closing member by the operation of the lift amount exceeding the lift amount in the operating state between the vacuum slide chamber and the read body flow path, the sliding surface can be suppressed. Carrying the gas after the point. Thereby, it is possible to further suppress the transportation of the gas by the adsorption and the detachment of the gas from the outside to the vacuum flow path. The vacuum control room according to the eighth aspect, wherein the vacuum sliding chamber is formed in an area that covers all the movement from the valve body 201233929 to the outer side of the vacuum sliding chamber by the operation of the lifting amount The scope. In the means 9, the vacuum sliding chamber is formed in a range in which all the operations for covering the lift amount are moved from the valve body flow path side to the outer side of the vacuum sliding chamber. Therefore, the rod exposed in the valve body flow path can be in the vacuum. The sliding room and the valve body grasp the road. Thereby, the rod which is exposed in the range of the valve body flow path is often in the range of the area which is attracted by the vacuum, so that the leakage of the gas can be surely suppressed. This configuration can be realized by at least the adjustment of the vacuum sliding chamber (the direction in which the rod is actuated) and the adjustment of the amount of lifting (for example, mechanical limitation). + &10_" The vacuum control valve of paragraph 8 or 9 is characterized in that the first month of the movable closing member has a miscellaneous member having a pair of end edges of the bifurcation (four); and pressing the Qiu... Pressing in the direction of extending the pair of end edges. In the slave slave 10, 'there is a (four)' expansion due to the formation of one end edge portion toward the branching, so that even if the vacuum sliding domain becomes low pressure due to vacuum suction, it can be improved. The surface of the edge portion is pressed to achieve high sealing performance. And the sputum is used to control the vacuum control device of the vacuum control valve, and the vacuum control is controlled by any one of the patent scopes 8 to 10: wherein the control is The air conduction operation mode of the air conduction operation mode limits the operation in the above-mentioned operation so that the area moving from the front side of the valve body flow path side enters the range of the vacuum sliding chamber. 1 Providing a vacuum control device that can control the vacuum control valve. This room: centering, due to the air conduction operation mode that restricts the operation of lifting from the valve body flow path side to the vacuum sliding P side, 201233929 is the valve body The range of the flow path can be The vacuum sliding chamber and the valve body flow path are reciprocated. Thereby, adsorption to the outside of the valve body flow path or the vacuum sliding chamber can be prevented, and leakage can be hardly caused to achieve high vacuum. Means 12. Recorded as by means 11. In the vacuum control device, the control unit has a disengagement mode, and the disengagement mode is configured such that a range that has moved from the valve body flow path side to the outer side of the vacuum sliding chamber is set within a predetermined time period before the start of the air conduction operation mode In the vacuum sliding chamber, the means 12 is provided with a disengagement mode in which the range of movement to the outer side of the vacuum sliding chamber is placed in the vacuum sliding chamber at a predetermined time before the start of the air conduction operation mode. Therefore, the air conduction operation mode is started after the detachment of the self-adsorbing gas is completed. Thereby, the leakage caused by the migration of the actuation mode to the air conduction operation mode can be prevented. Means 13. As described in any of means 1 to 10 The vacuum control valve, wherein the linear driving portion has a pressure cylinder for circulating fluid, and a piston for the pressure Forming an actuating chamber therein, and generating a load according to the pressure of the actuating fluid of the actuating chamber; and applying a pressure to press the piston toward a direction in which the lifting amount is smaller, wherein the rod body is coupled with the piston In the means 13, the linear drive unit is driven by a piston that generates a load in response to the pressure of the actuating fluid, so that it is suitable for an explosion-proof environment and can generate a large driving force in a small size. Thereby, a semiconductor manufacturing device can be realized. Further, the present invention can be embodied not only in a vacuum control valve or a vacuum control system, but also in a vacuum control method or a computer program embodying the method, 10 201233929 «Program media, etc. Description of the drawings Fig. 1 is a cross-sectional view showing the configuration of a vacuum control valve 10 when the power is not supplied (the valve is fully closed). Fig. 2 is an enlarged cross-sectional view showing the configuration of the sliding portion 60 of the vacuum control valve 10 when the power is not supplied. Fig. 3 is a cross-sectional view showing the configuration of the vacuum control valve 10 when the valve is fully opened. Fig. 4 is a cross-sectional view showing an operation state when the vacuum pressure of the vacuum control valve 10 is controlled. Fig. 5 is an enlarged cross-sectional view showing the frictional surface between the gasket 70 and the inner peripheral surface 63. Fig. 6 is a flow chart showing an example of the operation of the vacuum control valve 10. I. EMBODIMENT 3 BEST MODE FOR CARRYING OUT THE INVENTION (Embodiment of the Invention) Hereinafter, a first embodiment of the present invention will be described with reference to the drawings. This embodiment is embodied in a novel vacuum control valve used in a semiconductor manufacturing apparatus that performs a plasma etching process and the control apparatus. (Basic Configuration of Vacuum Control Valve) Fig. 1 is a cross-sectional view showing the configuration of the vacuum control valve 10 at the time of non-energization (full valve closing). Fig. 2 is an enlarged cross-sectional view showing the configuration of the sliding portion 60 of the vacuum control valve 10 at the time of non-energization. Figure 3 is a cross-sectional view showing the construction of the vacuum valve 201233929 -a control valve ίο. The vacuum control valve 1A includes a control valve body 40, a cylinder portion 70, an operating portion 30, and a sliding portion 6A. Further, the cylinder portion 70, the operating portion 30, and the sliding portion 60 are also referred to as actuators. The control valve body 40 has a cylindrical shape that extends in the operating direction (axial direction) of the operating portion 3''. The control valve body 40 is formed with a substantially cylindrical recess having an opening 49 in the axial direction on the side of the cylinder portion 7. The control valve body 40 has a sliding portion 6 () having a pure (four) portion and a body flow path 46. The valve body flow path 46 connects the primary side turn 41 and the secondary side turn 44. The primary side 槔41 is connected to a vacuum container using money. The secondary scale 44 is connected to the vacuum pump. The valve main body flow path 46 is formed with a primary side communication port 42 that communicates with the primary side turn 41, a secondary side communication port 45 that communicates with the secondary side turn 44 (see FIG. 3), and a secondary side communication port. 45 around the seat 43. On the other hand, in the valve body flow path 46, a valve body 33 having a portion of the main portion 4δ is placed in a position opposite to the secondary side communication port 45. The valve body 33 is fitted with an annulus 35 projecting from the valve body 33 by the portion. The valve seat 43 is, for example, an annular region that is opposed to the axial direction with respect to the valve body 33, and is formed such that the surface thickness around the secondary side communication σ45 is smaller than that of other small portions. region). In the valve body flow path 46, it is possible to block the (four) function between the primary side bee and the secondary side, and the operation-adjustment function between the secondary side 41 and the secondary side 44::: The barrier function and the air conduction adjustment function can be used. (4) The lift amount U between her and the seat 43 is the position of the room 32. Lifting - can be adjusted by relatively linear movement of the upper member 43 of the cylindrical member. 12 201233929 The barrier function is as shown in Fig. 1, in the valve body flow path 46, the valve body 33 is brought into contact with the valve seat 43 (the lift amount La is zero), and the secondary side 埠 44 and the valve body are The flow path 46 is isolated. The closing at the time of blocking is achieved by abutting the ankle ring 35 reaching the valve body 33 and blocking the valve seat 43. On the other hand, the air conduction adjusting function is realized by adjusting the lift amount l a (refer to Fig. 3) of the distance between the (4) 3 3 (four) seats 43 as the valve opening degree. Air conduction means the ease of flow of a gas in a flow path. The operation unit 30 includes a valve body 33, a piston rod 31 connected to the valve body 33, and a further end-end piston 51 connected to the piston rod 31. The valve body 33 is driven by the piston 51 via the piston core. The surface of the piston is corrected in the outer circumferential direction and the cylindrical member 32 is covered. The details of the cylindrical member % will be described later. Furthermore, the piston rod 31 is also referred to simply as a rod. Further, the cylinder inner surface 73 is extended in the radial direction and the valve opening degree in which the inner peripheral surface 73 of the red tube 71 is sealed is formed. (Fig. 3). The outer peripheral end portion of the piston 51 is connected to the cylindrical member 52 in the axial direction toward the opening degree operation chamber 36, and has a cylindrical shape. The piston 51 is connected to the pressure regulating valve, D 4 seals the valve opening degree operating chamber 36, and the operating chamber 36 is fixed to the piston 51 by the screw valve retaining valve 54. Further, the _ degree operation chamber 36 is also referred to as sweating and the operation chamber 36 is formed by the pressure regulating valve 53 type member 32, the miscellaneous valve 53 / the moon moving portion 60, and the round old closed door keeper valve 54). The volume enclosed can be < 7_:::= = _ part, 1 between the pressure valve 53 and the sliding portion 60 and 13 201233929 between the pressure regulating valve 5 3 and the cylinder tube 7 被 is sealed ((4) )of. The valve opening degree operating chamber 36 is formed by dividing the internal space formed by the inner peripheral surface 73 by the pressure regulating valve 53. The valve opening degree operation chamber 36 can supply the operation air via the valve opening air flow path 21 and the connection flow path 22. The piston 51 is pressed by a pressing spring 75. The pressing spring 75 applies a pressure to the piston 51 of the operating portion 3A in such a manner that the volume of the lift amount La and the valve opening degree operation chamber 36 become smaller. The pressing spring 75 is housed in a space surrounded by the inner circumferential surface 73 of the cylinder tube 71 and the top cover 81 having an annular shape. One of the pressing springs 75 abuts on the opposite side (back side) of the opening degree operation chamber 36 in the axial direction with respect to the piston 51. The other side of the pressing spring 75 abuts against the top cover 81.
頂蓋81具有：具有圓筒狀之外周形狀之筒部以、及^ 有直徑比筒部82小之圓筒狀之外周形狀之滑動凸部83。: 蓋81與筒部82及滑動凸部83共有中心轴線。軸凸部叫 筒部82之直徑差形成行㈣制面84。龍_面84係如 接於形成於活塞51之行程限制端部56以限制活塞51之上； 量的抵接面。藉此，活塞51之行程之上昇升舉量J 大方向）會受行程限制面84所限制，另—方面，下降方向^ 舉量La減少方向）會受閥座43所限制。 滑動凸部83收容於形成於活塞桿31之㈣之阻隔心 產生室39。阻隔載重產生室39係相對於朝活塞桿Μ之動子 方向延伸之中心線，形成於„度操作幻6之内側。㈣ 載重產生室39由裝設於滑動凸部83<v字狀塾圈说 39b(參照第2圖）所封閉。阻隔㈣產生室39之阻隔載重亦； 利用於提高真空控制_之製紐。這相為可減輕㈣ 14 201233929 時之施壓 易。 …⑨裝時載重（阻隔時之载重）而使製造容 ;月動&。卩8 3之⑽隔著祕軸承8 5與導桿3 8而裝設 ==?桿31。線性軸承85可正•也維持垂直於動 〇 筒。Μ、及滑動部6G之相互間之軸線之方向的 位置關係並且使動作部3〇可圓滑的移動。 真空控制閥1〇震設有閥體位置感測器90。閥體位置感 測器9〇具有：隔著探針裝設構制裝設於頂蓋社探針 92、及隔料桿38與“管裝設構件93裝設於活塞桿31之 插入管94。閥體位置感測器9〇可產生因應於探針92往插入 管94之插人長度之電㈣。對於頂如之活塞_之動作 量可作為插人長度之變動量，因此可因應於該變動 量而測 量升舉量La。閥體位置感測器9G可使用例如線性脈衝編碼 器（登錄商標：LINEAR PULSE CODER)等。 (真空控制闊之吸附搬運之機制與封閉構造） 其次，說明本發明人新發現之作動流體之吸附搬運之 機制。本實施形態中’係例示作動空氣（空氣)作為作動流體 並加以說明。线係以氮與氧為主成分，如第3圖（間全開 狀態）所示，在閥開度操作室36之内部對動作部3〇進行吸附 (例如物理吸附或化學吸附）。吸附於動作部3〇之空氣在閉閥 時，如第1圖所示，可在閥本體流路46之内部脫離。 動作部30具有特定之滑動範圍Lb(參照第！圖、第3 圖）。特定之滑動範圍Lb可藉由升舉量u之操作（全開與阻 隔）露出於閥開度操作室3 6與閥本體流路4 6之雙方之範圍 15 201233929 的區域。特定之滑祕_係定義為例如動作物與滑動 部6〇之滑動面中，超過v墊圈67與封閉構件邱之間之滑動邱 分而露出於閥開度操作室36與閥本體流路46之雙方之範圍 的區域。再者，封閉構件68亦可稱為第丨滑動封閉構件。 特定之滑動範圍Lb假設若是沒有裝備圓筒型構件&， 則為可藉由閥體33之全開與阻隔之往返動作，產生在閥門 度操作室36之吸附與在閥本體流路46内部之脫離的區域: 本發明人意外發現，當發生由此等閥開度操作室36往閥本 體流路46之空氣的搬運時，真空度會降低(壓力上昇）。 以往於動作部30之滑動部使用了可防止來自滑動部之 洩漏之金屬伸縮管（未圖示）’因此關於洩漏的機制並未進行 充分的檢討。本發明人排除不具有耐電漿性之金屬伸縮 管’並且進行有關來自滑動部之洩漏的實驗與解析。本實 驗中’使用了具有圓筒型構件32之外徑並且業經陽極處理 之活塞桿。本活塞桿為未裝設有圓筒型構件32之構成。 本發明人首先令真空控制閥為全開狀態，且令真空容 器為已加熱之狀態，藉此真空泵進行真空吸引以脫離。本 發明人在到達預先設定之目標狀態（超真空）之時間點阻隔 真空控制閥。本發明人確認在真空控制閥之阻隔後，真空 度降低(壓力上昇）。藉此’可確認起因於真空控制閥之作動 的泡漏。 一般的想法也認為本洩漏係起因於活塞桿在作動時a 礙物理性隔離。可是，本發明人藉由解析也發現了氣體往 活塞桿吸附為主要原因之可能性。接著，本發明人創作出 16 201233929 Λ • ⑽體之吸附少的材料形成之關型的圓筒型構件Μ，並 覆蓋活塞桿進行實驗。 本發明人接著使用被低吸附性之圓筒型構件3 2覆蓋之 活塞桿31，並且令真空__全開狀態且令真空容器 為已加熱之狀態而在真空系進行真空吸引。本實驗中，確 認了，真空控制閥之阻隔後幾乎沒有發生真空度降低（壓 力上昇）。藉此，可確認若使用被_型構件32覆蓋之活塞 桿3卜即使不使用金厲伸縮f，也幾乎不會發生真空㈣ 閥之洩漏。 圓筒型構件3 2係由藉熱處理將氧化鋁（礬土）燒固而成 型之燒結體（陶瓷)所構成。圓筒型構件32為燒結體具有高絕 緣性，因此亦具有耐電漿性。圓筒型構件32之低吸附性藉 由該平滑的表面而抑制凹凸引起之表面積增加而實現。具 體而言，本發明人發現了例如鋁製之桿的陽極氧化皮膜即 使進行了封孔處理也很多凹凸，因此作動流體之吸附量多。 根據本發明人的實驗，確認了圓筒型構件32之燒結體 相較於陽極氧化皮膜吸附量顯然較少。若圓筒型構件32之 燒結體使用相對密度在95%以上之緻密性緣土之陶瓷時， 則洩漏量可降低到1〇〇分之一以下。但是，若相對密度在9〇 %以上，亦可達到一定的效果’並且可因應於要求之真空 度，而為比例如96%、97%、98%、99%高之相對密度， 進而亦可使用99%以上之高純度緻密質礬土 ’無限地減少 洩漏量（氣體搬運量）。 進而，若將緻密性礬土之陶瓷的表面做0 _ 2以下之平 17 201233929 均表面粗糙度(0.2Ra)之鏡面拋光，可使吸附性更為降低， 並且可確保高密封性’並且可降低桿與滑動封閉部之摩 擦。摩擦的減少可助於真空控制閥之低滯後特性_ 面粗輪度可因應於真空控制閥10之 二 〇.1、。_3、〇.4、。,5之值。 ° 由設定為 圓筒型構件32設置間隙Cr(參照第2圖）之空間 活塞桿31之外表面。間隙Cr被—對 、； ^1Uή 生封閉構件之Ο環 、封閉。〇環31&、3113在活塞桿31之 置於圓筒型構件32之兩端部附近。 °上配 即使因環境溫度之變化而圓筒型構_與活塞 干‘、、、膨脹量不同，亦可藉由◦環31a、3lb ^自^果是，圓筒型構件32與活塞桿31之材料選擇之 ^生優^變大，因此例如活塞桿31之材料可選擇強度或 優異之金屬材料(例如铭），另—方面，圓筒型構件η 之材料可選擇絕緣性優異之氧化鋁之燒結體。 如此，本發明人創作出由強度或勤性優異之金屬材料 構成之活塞桿3卜低吸附性之圓筒型構件η、及⑽川、 構成之雙重構造的桿，藉此成功開發可利用於使用電 衆之真空容器之提動式真空控制_。該結果是可對應使 電漿產生之真空容器之蝴氣體之小流量化(微小流量化）。 本封閉技術與習知基本想法之由外部空間以物理方式 隔離真空流路之習知之封閉技術做一區隔，係基於全新的 想法者。本封閉技術係基於本發明人發觀為金屬伸縮管 的排除’轉料進行纽軸㈣㈣讀流純之外 201233929 部所引起之新課題者。 藝者t 4 W金屬伸縮管時則採用與熟習此技 μ 4相反之構成之旋轉式(例如擺式閥）而新發 =:::=r 實— 然而， 由中真空往 實驗。 :止於此，本發明人還考慮技術之方向性 门真二化之要求的提高，在高真空區域中 、即 繼續 之;^ 1圖軸不真空控制_之真空壓力之控制時（氣導 采日’）之作動狀態的截面圖。本實驗中，在高真空區域 ^旦發現即使使用圓筒型構件32在氣導之操作時也會發生 '、U |發明人發現該微量的沒漏起因於滑動區域 中作動流體之吸附，而創作出抑制m之構造。 *本構成係如第2圖所示在真空滑動室8中有效率地進行 引之構成。真空滑動室S係在例如V墊圈67與封閉構 件68之間之滑動部分所封閉之區域^本構成具有：真空吸 引區域形成構件62、支持構件63、ν塾圈67、封閉構件仰、 真空吸引流路23、連接流路24、及真空滑動流路25。真空 吸弓丨區域形成構件6 2係配置於圓筒型構件3 2之周圍且具有 環狀形狀之紹製構件。真空吸引區域形成構件62於與圓筒 里構件32對向之位置形成有為環狀凹部之環狀凹部62a。環 狀凹部62a藉由與圓筒型構件32之外周面的抵接而形成真 空滑動流路25。 真空滑動流路25經由連接流路24而連接真空吸引流路 19 9 9201233929 23 °連接流路24係在軸線方向上為薄型之圓筒形狀的流 路。連接流路24在其外周部分連通真空吸引流路23，且在 其底面部分連通於真空滑動流路25。 真空滑動室S之封閉構造係如以下所構成。v墊圈67係 由閥開度操作室36將真空滑動室S封閉。V墊圈67係因應於 來自閥開度操作室36之作動流體的壓力施加，而其V型部分 擴大且封閉能力變高之具有高封閉性能之墊圈。再者，v 墊圈67亦稱為第2滑動封閉構件。 第5圖顯示實施形態之封閉構件6 8之構成的截面圖。封 閉構件68係由真空滑動室S封閉為真空流路之閥本體流路 46。封閉構件68使用Roto Variseal(登錄商標：口卜八”シ /^)68f與金屬彈簧68e而構成。R〇t〇variseai68f开)成有具 有一對密封端緣68a、68b且形成u型截面之凹部68d、傾斜 凸緣伽。傾斜凸緣咖被挾持於支持構件63之内表面63a與 真空吸引區域形成構件62之内表面62b之間，並且以内表面 咖與真空吸引區域形成構件62之抵接面62e抵接為止之量 的壓緊部份壓緊。再者，封閉構_亦稱為第Η骨動封閉構 件。 、才苒件68之各部分係如以下機能。凹部68d在真空 動室1 之壓力上昇時，可擴大-對密封端緣68a 、68b而加 封閉能力。但是’封閉構件68藉金屬彈署伽而被施壓使 對被封端緣68a、日料ijt 4·# 如68b相對地擴大’因此即使維持封閉面 而真空h動室S被真空吸彳丨$ # # τ 及引之狀態下，亦可實現高封閉 此。-方面，傾斜凸緣咖與〇_可同時由真空吸引 20 201233929 路23側封閉為真空流路之閥本體流路46。 本封閉構造中，即使藉升舉量以之操作而活塞桿Η越 過封閉構件68移動’亦會插人到真空滑動室8 干 、體住活塞桿31吸附。藉此，圓筒型構件以中，在真办坪 動至S與閥本體流路46之間往返之區域在真空滑動~ $不會 吸附作動流體，因此會抑制作動流體之搬運現象。钎 ，若利用本封閉構造亦可對應更高真空狀態（‘^ 空）。 α 進而，假設即使藉由升舉量之操作來進行活塞桿Μ越 ，第2滑動封閉構件之操作，亦可抑制以滑動面為中:點之 乳體的搬運。以滑動區域為中繼點之作動流體的規 亦可發生作為以真空滑動室s為中繼點之2階段的搬運。 第1階段係在閥開度操作室36，吸祕圓筒型構件就 微量的空氣在真空滑動室S脫離後蓄積於真空滑動室S之階 段。扪階段係藉由在真空滑動室s與間開度操作室36之間 往返之區域⑽開錢作室36側之區域)之㈣型構件32而 進行。第2階段係在V塾圈67與封閉構件68之間之真空滑動 室S所吸附之空氣在閥本體流路4 6 (真空流路)脫離之階段。 第2階段係藉在真空滑動室s與閥本體流路如之間往返之區 域(閥本體流路46側之輯)之_型構件32而進行。 本封閉構造中’由於藉由上述第丨階段的搬運，在真空 滑動室s脫離之作動流體㈣真空滑動流路25、連接流路 24、及真空吸引流路23而被真空吸引，因此脫離之作動流 體不蓄積於真^滑動室S。藉此，可抑制以滑動面為中繼點 21 201233929 之氣體的搬運。 再者’亦可看到滑動部分形成有流路之構成，但該流 路為使用於設置時之$漏檢料(未圖*)之檢纽路、或者 由閥本體流路46往外部之有毒氣體的&漏防止用吸引流 路檢査流路利用於利用了氦氣之茂漏檢測。即，為設置 時於Λ紐料之附近放丨氦氣，藉氦氣到達閥本體流路 46來檢測往滑動部分之&漏的構成。另—方面，吸引流路 係用以吸引有毒氣體之埠。 因此，本構成係與上述各構成之用途本質上不同，因 此真空滑動室S之形狀也與上述各構成不同The top cover 81 has a cylindrical portion having a cylindrical outer peripheral shape and a sliding convex portion 83 having a cylindrical outer peripheral shape smaller than the cylindrical portion 82. The cover 81 shares a central axis with the tubular portion 82 and the sliding convex portion 83. The shaft projections are referred to as the difference in diameter of the tubular portion 82 to form a row (four) face 84. The dragon-face 84 is attached to the stroke limiting end portion 56 formed on the piston 51 to limit the amount of the abutting surface of the piston 51. Thereby, the rising stroke amount J of the piston 51 is limited by the stroke restricting surface 84, and the lowering direction, the amount of lifting La is reduced by the valve seat 43. The sliding convex portion 83 is housed in the barrier generating chamber 39 formed in the fourth portion of the piston rod 31. The blocking load generating chamber 39 is formed on the inner side of the movement direction of the piston rod , in the direction of the mover of the piston rod 。6. (4) The load generating chamber 39 is mounted on the sliding convex portion 83<v-shaped loop Said 39b (refer to Figure 2) is closed. Blocking (4) is the blocking load of the chamber 39; it is used to improve the vacuum control _. This phase can reduce the pressure on (4) 14 201233929. (loading at the time of blocking) to make the manufacturing capacity; the moon movement & 卩 8 3 (10) is installed with the secret bearing 8 5 and the guide rod 38 ==? rod 31. The linear bearing 85 can be positive and also maintain vertical The positional relationship between the 〇 and the sliding portion 6G in the direction of the axis and the movement of the operating portion 3 圆 can be smoothly moved. The vacuum control valve 1 is provided with a valve body position sensor 90. The position sensor 9A has a top cover probe 92 and a spacer rod 38 and a tube insertion device 94 that is attached to the insertion rod 94 of the piston rod 31 via a probe mounting structure. The valve body position sensor 9 can generate electricity (four) in response to the insertion length of the probe 92 into the insertion tube 94. For the piston of the top, the amount of movement can be used as the variation of the length of the insertion, so the amount of lift La can be measured in response to the variation. The valve body position sensor 9G can use, for example, a linear pulse encoder (registered trademark: LINEAR PULSE CODER) or the like. (Mechanism and Closure Structure of Vacuum Control and Wide Adsorption Handling) Next, the mechanism of adsorption and transportation of the newly discovered actuating fluid by the present inventors will be described. In the present embodiment, the moving air (air) is exemplified as the operating fluid. The line is mainly composed of nitrogen and oxygen, and as shown in Fig. 3 (full open state), the operating portion 3 is adsorbed (for example, physical adsorption or chemical adsorption) inside the valve opening operation chamber 36. When the air adsorbed to the operating portion 3 is closed, as shown in Fig. 1, it can be separated inside the valve body passage 46. The operation unit 30 has a specific sliding range Lb (see Fig. 3 and Fig. 3). The specific sliding range Lb can be exposed by the operation of the lift amount u (full opening and blocking) to the area of the range 15 201233929 of both the valve opening operation chamber 36 and the valve body flow path 46. The specific slippery_ is defined as, for example, a sliding surface between the action object and the sliding portion 6〇, which is exposed to the valve opening degree operation chamber 36 and the valve body flow path 46 beyond the sliding division between the v washer 67 and the closing member Qiu. The area of both sides. Further, the closure member 68 can also be referred to as a second sliding closure member. The specific sliding range Lb assumes that if the cylindrical member & is not equipped, the reciprocating action of the full opening and the blocking of the valve body 33 is generated, and the adsorption in the valve operating chamber 36 and the inside of the valve body flow path 46 are generated. Detached area: The inventors have unexpectedly found that when the air of the valve opening operation chamber 36 to the valve body flow path 46 is conveyed, the degree of vacuum is lowered (pressure rise). Conventionally, a metal telescopic tube (not shown) that can prevent leakage from the sliding portion has been used in the sliding portion of the operating portion 30. Therefore, the mechanism for leakage has not been sufficiently reviewed. The inventors of the present invention excluded the metal telescopic tube which does not have plasma resistance and conducted experiments and analysis regarding leakage from the sliding portion. In the present experiment, a piston rod having an outer diameter of a cylindrical member 32 and anodized was used. The piston rod has a configuration in which the cylindrical member 32 is not mounted. The inventors first made the vacuum control valve fully open and the vacuum container in a heated state, whereby the vacuum pump vacuum-extracted to disengage. The inventors blocked the vacuum control valve at a point in time when a predetermined target state (ultra-vacuum) was reached. The inventors confirmed that the vacuum degree is lowered (pressure rise) after the barrier of the vacuum control valve. By this, it is possible to confirm the bubble caused by the operation of the vacuum control valve. The general idea is also that this leak is caused by the physical isolation of the piston rod when it is actuated. However, the inventors have also found out the possibility that the gas is adsorbed to the piston rod as a main cause by analysis. Next, the inventors created a cylindrical member 形成 which was formed by the material of which the material of the (10) body was less adsorbed, and covered the piston rod for the experiment. The inventors then used the piston rod 31 covered by the low-adsorption cylindrical member 32, and vacuum-vacued the vacuum system in a state where the vacuum was fully opened and the vacuum vessel was heated. In this experiment, it was confirmed that almost no vacuum reduction (pressure rise) occurred after the vacuum control valve was blocked. Thereby, it can be confirmed that if the piston rod 3 covered by the _-shaped member 32 is used, the leakage of the vacuum (four) valve hardly occurs even if the gold telescopic f is not used. The cylindrical member 32 is composed of a sintered body (ceramic) formed by burning alumina (alumina) by heat treatment. The cylindrical member 32 has a high insulating property for the sintered body, and therefore also has plasma resistance. The low adsorptivity of the cylindrical member 32 is achieved by suppressing the increase in surface area due to the unevenness by the smooth surface. Specifically, the inventors have found that, for example, an anodized film of a rod made of aluminum has many irregularities even when it is subjected to a sealing treatment, and therefore the amount of adsorption of the working fluid is large. According to the experiments of the present inventors, it was confirmed that the sintered body of the cylindrical member 32 was significantly less adsorbed than the anodized film. If the sintered body of the cylindrical member 32 is made of a ceramic having a density of 95% or more, the amount of leakage can be reduced to less than 1 part. However, if the relative density is above 9〇%, a certain effect can be achieved, and depending on the required degree of vacuum, the relative density is higher than, for example, 96%, 97%, 98%, 99%, and Use 99% or more of high-purity dense alumina to 'infinitely reduce the amount of leakage (gas handling). Further, if the surface of the ceramic of the compact bauxite is made of mirror polishing of a flat surface roughness of 0.2 2012 2 201233929, the surface roughness (0.2Ra) can be further lowered, and a high sealing property can be ensured. Reduce the friction between the rod and the sliding closure. The reduction in friction can contribute to the low hysteresis characteristics of the vacuum control valve. The surface coarseness can be adapted to the vacuum control valve 10. _3, 〇.4,. , the value of 5. ° The outer surface of the piston rod 31 is provided with a clearance Cr (see Fig. 2) set to the cylindrical member 32. The gap Cr is -, and the ^1U is a closed loop of the closing member. The loops 31 & 3113 are placed near the end portions of the cylindrical member 32 at the piston rod 31. ° Even if the cylindrical structure is different from the piston dryness, and the expansion amount is different due to the change of the ambient temperature, the cylindrical member 32 and the piston rod 31 can also be obtained by the annulus 31a, 3lb ^ The material selection is large, so that, for example, the material of the piston rod 31 can be selected as the strength or the excellent metal material (for example, inscription), and on the other hand, the material of the cylindrical member η can be selected to have excellent insulating properties. Sintered body. In this way, the present inventors have created a cylindrical member η composed of a metal material excellent in strength or flexibility, and a cylindrical member η having a low adsorption property, and a double-structured rod composed of (10), thereby being successfully developed and utilized. Use the vacuum control of the vacuum container of the electrician _. As a result, it is possible to reduce the flow rate (small flow rate) of the butterfly gas in the vacuum container in which the plasma is generated. This closed technique is based on the well-known closed idea of the physical space separating the vacuum flow path from the external space, based on a new idea. This sealing technique is based on the new problem caused by the inventors' view that the metal telescopic tube is excluded from the 'transfer material' and the new axis (4) and (4) read stream purity. For the artist t 4 W metal telescopic tube, a rotary type (for example, a pendulum valve) which is opposite to the conventional technique μ 4 is used, and the new hair is made =:::=r true - however, from the medium vacuum to the experiment. : In view of this, the inventors also consider the improvement of the requirements of the directionality of the technology, in the high vacuum region, that is, continue; ^ 1 axis control is not vacuum control _ vacuum pressure control (air conduction A cross-sectional view of the state of action of the picking day. In this experiment, it was found in the high vacuum region that even when the cylindrical member 32 was used in the operation of the air conduction, ', U | the inventors found that the trace amount of leakage was caused by the adsorption of the working fluid in the sliding region, and Create a structure that suppresses m. * This configuration is configured to be efficiently introduced in the vacuum sliding chamber 8 as shown in Fig. 2. The vacuum sliding chamber S is closed in a region where, for example, the sliding portion between the V washer 67 and the closing member 68 is closed. The vacuum suction region forming member 62, the supporting member 63, the ν coil 67, the closing member, the vacuum suction The flow path 23, the connection flow path 24, and the vacuum sliding flow path 25. The vacuum suction bow forming region member 6 2 is a member which is disposed around the cylindrical member 32 and has an annular shape. The vacuum suction region forming member 62 is formed with an annular recess 62a which is an annular recess at a position opposed to the cylindrical inner member 32. The annular recessed portion 62a forms a vacuum sliding passage 25 by abutment with the outer peripheral surface of the cylindrical member 32. The vacuum sliding flow path 25 is connected to the vacuum suction flow path via the connection flow path 24. 19 9201233929 The 23 ° connection flow path 24 is a cylindrical flow path which is thin in the axial direction. The connection flow path 24 communicates with the vacuum suction flow path 23 at its outer peripheral portion, and communicates with the vacuum slide flow path 25 at its bottom surface portion. The closed structure of the vacuum sliding chamber S is constructed as follows. The washer 67 is closed by the valve opening operation chamber 36 to close the vacuum sliding chamber S. The V-cushion 67 is a gasket having a high sealing performance in which the V-shaped portion is enlarged and the sealing ability is increased in response to the pressure of the operating fluid from the valve opening operation chamber 36. Further, the v washer 67 is also referred to as a second sliding closure member. Fig. 5 is a cross-sectional view showing the configuration of the closing member 6.8 of the embodiment. The closing member 68 is closed by the vacuum sliding chamber S as a valve body flow path 46 of the vacuum flow path. The closing member 68 is constructed using a Roto Variseal (registered trademark: 口八八シ/^) 68f and a metal spring 68e. The R〇t〇variseai 68f is opened to have a pair of sealed end edges 68a, 68b and form a u-shaped cross section. The recessed portion 68d and the inclined flange are slid. The inclined flange is held between the inner surface 63a of the support member 63 and the inner surface 62b of the vacuum suction region forming member 62, and the inner surface is abutted against the vacuum suction region forming member 62. The pressing portion of the surface 62e is pressed against the pressing portion. Further, the closed structure is also referred to as the third metatarsal closing member. The portions of the member 68 are as follows. The recess 68d is in the vacuum chamber. When the pressure of 1 rises, it can be expanded - the sealing ability is added to the sealing edges 68a, 68b. However, the closing member 68 is pressed by the metal bullet to make the end edge 68a, the Japanese material ijt 4·# 68b is relatively enlarged'. Therefore, even if the closed surface is maintained and the vacuum chamber S is vacuumed and sucked in the state of ## τ and 引, it is possible to achieve high sealing. In this respect, the inclined flange coffee and the 〇 _ can simultaneously Vacuum suction 20 201233929 Road 23 side closed as a vacuum flow path valve The body flow path 46. In the closed structure, even if the piston rod 移动 moves over the closing member 68 by the lifting amount, it will be inserted into the vacuum sliding chamber 8 to dry, and the piston rod 31 is attracted. In the case of the cylindrical member, the vacuum is slid in the area between the true ping to the S and the valve body flow path 46. The suction fluid is not adsorbed, so the movement of the actuating fluid is suppressed. The structure can also correspond to a higher vacuum state ('^ empty). Further, it is assumed that even if the piston rod is swung by the operation of the lift amount, the operation of the second sliding closing member can suppress the sliding surface as the middle: The transportation of the milk in the point. The regulation of the fluid in which the sliding area is the relay point may also be carried out in two stages of the vacuum sliding chamber s as a relay point. The first stage is in the valve opening operation chamber 36. The sucking cylindrical member is in the stage of accumulating a small amount of air in the vacuum sliding chamber S after the vacuum sliding chamber S is detached. The 扪 stage is opened by the area (10) between the vacuum sliding chamber s and the opening degree operating chamber 36. (4) type member 3 of the area on the side of the money room 36 The second stage is a stage in which the air adsorbed by the vacuum sliding chamber S between the V-ring 67 and the closing member 68 is separated from the valve body flow path 46 (vacuum flow path). The second stage is borrowed. In the closed structure, the vacuum sliding chamber s and the valve body flow path are in the region (the valve body flow path 46 side). In the closed structure, the vacuum is carried out by the above-described third stage. Since the sliding chamber s is separated from the actuating fluid (4), the vacuum sliding flow path 25, the connecting flow path 24, and the vacuum suction flow path 23 are vacuum-sucked, the detached operating fluid is not accumulated in the true sliding chamber S. The sliding surface is the transport of gas at the relay point 21 201233929. Furthermore, it is also possible to see that the sliding portion is formed with a flow path, but the flow path is used for the inspection of the leaky material (not shown) at the time of installation, or by the valve body flow path 46 to the outside. The toxic gas & leak prevention suction flow path is used for leak detection using helium gas. That is, in order to set the helium gas in the vicinity of the crucible, the helium gas reaches the valve body flow path 46 to detect the & leakage configuration of the sliding portion. On the other hand, the attraction flow path is used to attract toxic gases. Therefore, the present configuration is substantially different from the use of each of the above-described configurations, and therefore the shape of the vacuum sliding chamber S is also different from the above-described respective configurations.
。真空滑動室S 具有涵括活塞桿31之作動方向而形成之筒狀空間。筒狀空 間於其中央部分㈣成有A空滑動流路25 。此種筒狀空間 具有與上述任m不整合之形狀，因此，與中請時之 熟習此技藝者的技術常識相違。 第6圖係顯示真空控制閥1〇之作動内容之一例的流程 圖。步驟S10中，實行第1真空吸引工程。第】真空吸引工程 係在真空㈣之初期階段中，操作〇環35(參照第！圖、第3 圖）之壓緊量慢慢地排氣的工程(慢排氣工程）。慢排氣工程 系由本《月人之其中—人所提案為用以防止真空容器内 *子4机的排氣工程（日本專利特開2_—i63i37號 公報）。 步驟咖中，實行第2真空吸引工程$真空吸引工程 二在真°及弓丨之終期W又中，以全開狀態（參照第3圖）順利 地進行作為隨機的流動之分子流之排氣仏程。分子流的 22 201233929 * % 排氣一般需要時間，因此也加大升舉量La與閥體33之外周 長度之積（面積），以期能使排氣時間縮短化。 Y驟中Λ行脫離工程。脫離工程係使特定之滑動 範圍Lb配置於真空滑動室s，並停止僅預先設定之預定時 間，使作動流體脫離特定之滑動範圍Lb之工程。本工程是 宜在進-步要求高真空度(例如高真空）時實行的工程。停止 時間根據要求之真空度等來決定。 再者，本工程是以將升舉量[&之動程設定較大以產生 特定之滑動範圍Lb之構成較佳的構成。又，亦可於活塞桿 31之内部|備脫離促進用之加熱器以縮短停止時間。 步驟S4G中實行氣導操作卫程。氣導操作卫程係使姓刻 . 議動並控制真空容器内之真空度之工程。氣導操作工 程中，係根據如特定之滑動範圍Lb不露出於閥本體流路％ 之控制規則（氣導操作模式）來進行真空控制。藉此，由於縮 短可從閥本體流路46側越過封閉構⑽而移動到閥本體流 路46之外部側之範❿，因此可令範_為真空滑動室$ 之範圍内。 乳導才呆作亦可為視需要而進行以包含閥體33之〇環Μ 往閥座43之接觸之範圍之升舉量w小流量的操作。藉 此’可防止作動流體往作為真空流路之閥本體流路如的茂 漏’並可實現從阻隔到黏性流或分子流之較廣的壓力範圍 之無境界的真空控制。 以上詳述之本實施形態具有以下優點。 ⑴本實施形態之真空㈣㈣具有阻隔機能，可以單 23 201233929 一的真空控制閥10實現使用電漿之真空容器從真空吸引之 初期階段到高真空區域之真空控制。 (2)真空控制閥10為提動方式之真空控制閥，因此可活 用該該特性’而對應於蝕刻氣體之小流量化(微小域）。 (其他實施形態） 本發明不限定於上述實施形態，亦可如下來實施。 (1) 上述實施形態中’係例示使用電漿之蝕刻用真空容 器所使用之真空控制閥來說明本發明，但不限定於此，亦 可廣泛利用於一般使用電漿之真空容器之真空控制閥。 (2) 上述實施形態中，真空控制閥係以作動空氣來產生 驅動力，但亦可為如使用電動馬達以驅動之構成。本發明 可廣泛適用於具有可使提動式閥體直線移動之直線驅動部 之發明。真空控制閥之控制裝置可安裝用以實行往電動馬 達之電力供給或往閥開度操作室36之作動流體的控制（電_ 氣動控制閥之控制）之控制部（CPU、記憶體、及電腦程式）。 再者，作動流體不限定於作動空氣，亦可使用例如氮 氣等其他種類之氣體（氣體或者液體）。 (3) 上述實施形態中，頂蓋81側之行程限制面討與動作 部3 0側之行程限制端部5 6形成於如產生特定之滑動範圍 =相對的位置。可是，亦可構成為例如使行^制 行权限制端部56相互接近而不產生特定之滑動範圍Lb 使如此，由於從閥本體流路46側越過封閉構件。 ^ 到閥本體流路46之外部側的範圍Lc變短，因此可八—動 在真空滑動室S之範圍内。 範圍Lc 24 201233929 但是，前者具有可使分子區域之真空吸弓卜丨員利化之優 點’後者具有可以機械式確實地防止作動流體之$漏之具 有故障自動防護性(fail-safe)的優點。 進而，亦可準備行程限制面之位置互異之複數種類的 頂蓋，藉由頂蓋的選擇而自由設定升舉量之限制範圍，或 者亦可構成為行程限制面可手動或電動調整。 ⑷上述實施形態中，圓筒型構件32使用氧化链燒固而 成之陶瓷作為具有絕緣性之非金屬材料之燒結體。可是， 亦可使用如氮化鋁或鈦酸鋁、或者氮化硼或氧化錯。但是， 右使用氧化鋁（礬土）’可簡單地實現高剛性與絕緣性。 (5)上述實施形態中，圓筒型構件32覆蓋涵括活塞桿“ =作動方向之幾乎全體，但只要構成為至少覆蓋藉由升舉 量La之操作由閥本體流路46側越過封閉構件砧而可移動到 閥本體流路46之外部側的範圍Lc(參照第3圖）即可。如此， 可抑制氣體由閥本體流路46之外部（包含滑動面）往閥本體 流路46搬運。. The vacuum sliding chamber S has a cylindrical space formed by including the operating direction of the piston rod 31. The cylindrical space has an A-sliding flow path 25 at its central portion (4). Such a cylindrical space has a shape that is not integrated with any of the above, and therefore, contrary to the technical common sense of those skilled in the art. Fig. 6 is a flow chart showing an example of the operation of the vacuum control valve. In step S10, the first vacuum suction project is executed. In the initial stage of the vacuum (4), the vacuum (4) is used to operate the slewing ring 35 (see the Fig. 3, Fig. 3). The slow-exhaustion engineering is proposed by the "Month of the Moon" to prevent the exhausting of the four-machine in the vacuum vessel (Japanese Patent Laid-Open No. 2_-i63i37). In the step coffee, the second vacuum suction project is carried out. The vacuum suction project 2 is in the final state of the true and the bow, and the exhaust gas as a random flow molecular flow is smoothly performed in the fully open state (refer to FIG. 3). Cheng. Molecular flow 22 201233929 * % Exhaust gas generally takes time, so the product (area) of the lift amount La and the outer circumference of the valve body 33 is also increased in order to shorten the exhaust time. Y is in the middle of the process. The disengagement system causes the specific sliding range Lb to be disposed in the vacuum sliding chamber s, and stops the predetermined time from the predetermined time to deactivate the operating fluid from the specific sliding range Lb. This project is a work that should be carried out when the high vacuum (such as high vacuum) is required. The stop time is determined according to the required degree of vacuum or the like. Further, this project is a configuration in which the lift amount is set to a larger stroke to produce a specific sliding range Lb. Further, it is also possible to provide a heater for the release prevention inside the piston rod 31 to shorten the stop time. The air conduction operation guard is implemented in step S4G. The air conduction operation guard system makes the surname inscribed. The project of moving and controlling the vacuum degree in the vacuum container is discussed. In the air conduction operation, the vacuum control is performed in accordance with a control rule (air conduction operation mode) in which the specific sliding range Lb is not exposed to the valve body flow path %. Thereby, since the contraction can be moved from the valve body flow path 46 side beyond the closed structure (10) to the outer side of the valve body flow path 46, the range can be made within the range of the vacuum sliding chamber $. The milk guide can be operated for a small amount of flow including the lift amount w of the range of the contact of the valve body 33 to the valve seat 43 as needed. By this, it is possible to prevent the actuating fluid from flowing toward the valve body flow path as a vacuum flow path, and to realize a vacuum control without a boundary from a wide range of pressures from blocking to viscous flow or molecular flow. The present embodiment detailed above has the following advantages. (1) The vacuum (4) (4) of the present embodiment has a barrier function, and the vacuum control valve 10 of No. 2012 201233929 can realize vacuum control from the initial stage of vacuum suction to the high vacuum region using a vacuum container of plasma. (2) The vacuum control valve 10 is a vacuum control valve of the poppet type, so that this characteristic can be utilized to correspond to a small flow rate (micro domain) of the etching gas. (Other Embodiments) The present invention is not limited to the above embodiment, and may be implemented as follows. (1) In the above embodiment, the present invention is described by exemplifying a vacuum control valve used in a vacuum container for etching plasma. However, the present invention is not limited thereto, and can be widely used for vacuum control of a vacuum container generally using plasma. valve. (2) In the above embodiment, the vacuum control valve generates driving force by operating air, but may be configured to be driven by using an electric motor. The present invention can be widely applied to an invention having a linear drive unit that can linearly move a poppet type valve body. The control unit of the vacuum control valve may be installed with a control unit (CPU, memory, and computer) for performing power supply to the electric motor or control of the actuating fluid to the valve opening operation chamber 36 (control of the electric_pneumatic control valve) Program). Further, the actuating fluid is not limited to the actuating air, and other types of gases (gas or liquid) such as nitrogen may be used. (3) In the above embodiment, the stroke restricting surface on the side of the top cover 81 and the stroke restricting end portion 56 on the side of the operating portion 30 are formed at positions where the specific sliding range is opposite. However, it is also possible to configure, for example, the line restriction end portions 56 to approach each other without generating a specific sliding range Lb. Thus, the closing member is passed from the valve body flow path 46 side. The range Lc to the outer side of the valve body flow path 46 becomes short, so that it can be moved within the range of the vacuum sliding chamber S. Scope Lc 24 201233929 However, the former has the advantage that the vacuum suctioning of the molecular region can be improved. The latter has the advantage of fail-safe which can mechanically prevent the leakage of the operating fluid. . Further, a plurality of types of top covers having different stroke limit surfaces may be prepared, and the limit range of the lift amount may be freely set by the selection of the top cover, or the stroke limit surface may be manually or electrically adjusted. (4) In the above embodiment, the cylindrical member 32 is formed by sintering an oxidized chain as a sintered body of an insulating non-metallic material. However, it is also possible to use, for example, aluminum nitride or aluminum titanate, or boron nitride or oxidization. However, the use of alumina (alumina) on the right can easily achieve high rigidity and insulation. (5) In the above embodiment, the cylindrical member 32 covers the piston rod "= almost all of the actuation direction, but the configuration is such that at least the operation by the lift amount La is passed over the valve body flow path 46 side over the closure member. The anvil can be moved to the outside of the valve body flow path 46 in the range Lc (see Fig. 3). Thus, the gas can be prevented from being carried by the outside of the valve body flow path 46 (including the sliding surface) to the valve body flow path 46. .
【圖式簡單說明J 第1圖係顯示非通電時（閥全閉）之真空控制閥丨〇之構成 的戴面圖。 第2圖係顯示非通電時之真空控制閥1 〇具有之滑動部 60之構成的放大截面圖。 第3圖係顯示閥全開時之真空控制閥丨〇之構成的截面 圖。 第4圖係顯示真空控制閥10之真空壓力之控制時之作 25 201233929 動狀態的截面圖。 第5圖係顯示墊圈70與内周面63之間之摩擦面的放大 截面圖。 第6圖係顯示真空控制閥10之作動内容之一例的流程 圖。 【主要元件符號說明 10.. .真空控制閥 21.. .開閥用空氣流路 22.. .連接流路 23.. .真空吸引流路 24…連接流路 25.. .真空區域形成流路 30.. .動作部 31.. .活塞桿 31a，31b...Ο環 32.. .圓筒型構件 33.. .閥體 34.. .調壓閥 35.. .0. 36.. .閥開度操作室 38.. .導桿 39.. .阻隔載重產生室 39a，39b...V字狀墊圈 40…控制閥本體 41.. .一次側埠 42.. .—次側連通口 43.. .閥座 44.. .二次側埠 45.. .二次側連通口 46…閥箱 49.. .開口部 51.. .活塞 52.. .筒狀構件 53.. .調壓閥 53a...端部 54.. .保持器 54a...螺絲 56.. .行程限制端部 60.. .滑動部 62.. .真空吸引區域形成構件 62a...環狀凹部 62b...内表面 26 201233929 62c...抵接面 82…筒部 63...内周面 83...滑動凸部 67...V墊圈 84...行程限制面 68...封閉構件 85...線性軸承 68a，68b...密封端緣 90…閥體位置感測器 68c...傾斜凸緣 91...探針裝設構件 68d...凹部 92...探針 68e···金屬彈簧 93...插入管裝設構件 68f.. .Roto Variseal 94...插入管 69... Ο環 Cr...間隙 70...缸筒部 La...升舉量 71...缸管 Lb...滑動範圍 73...内周面 Lc...範圍 75...施壓彈簧 S...真空滑動室 81...頂蓋 27[Simple diagram of the drawing J Fig. 1 shows a wearing diagram of the vacuum control valve 非 when the power is not supplied (the valve is fully closed). Fig. 2 is an enlarged cross-sectional view showing the configuration of the sliding portion 60 of the vacuum control valve 1 非 when the power is not supplied. Fig. 3 is a cross-sectional view showing the configuration of the vacuum control valve 全 when the valve is fully opened. Fig. 4 is a sectional view showing the state of the vacuum pressure control of the vacuum control valve 10; Fig. 5 is an enlarged cross-sectional view showing the frictional surface between the gasket 70 and the inner peripheral surface 63. Fig. 6 is a flow chart showing an example of the operation of the vacuum control valve 10. [Main component symbol description 10... Vacuum control valve 21.. Open air flow path 22.. Connection flow path 23. Vacuum suction flow path 24... Connection flow path 25.. Vacuum area formation flow Road 30.. Action part 31.. piston rod 31a, 31b... Ο ring 32.. cylindrical member 33... valve body 34... pressure regulating valve 35.. .0. 36. . Valve opening operation room 38.. Guide rod 39.. Block load generating chamber 39a, 39b... V-shaped washer 40... Control valve body 41.. Primary side 埠 42.. - Secondary side Connecting port 43.. Valve seat 44.. . Secondary side 埠 45.. . Secondary side communication port 46... Valve box 49.. Opening part 51.. . Piston 52.. Tube member 53.. Pressure regulating valve 53a...end 54.. retainer 54a...screw 56.. stroke limit end 60.. sliding portion 62.. vacuum suction region forming member 62a...ring Concave portion 62b... inner surface 26 201233929 62c... abutting surface 82... tubular portion 63... inner peripheral surface 83... sliding convex portion 67...V washer 84...stroke restricting surface 68.. Closure member 85...linear bearing 68a,68b...sealing edge 90...body position sensor 68c...inclined flange 91...probe mounting member 68d...recess 92.. .Probe 68e ···Metal spring 93...insert tube mounting member 68f..Roto Variseal 94...insert tube 69...Ο环Cr... clearance 70...cylinder section La...lift Amount 71: Cylinder tube Lb... Sliding range 73... Inner peripheral surface Lc... Range 75... Pressure spring S... Vacuum sliding chamber 81... Top cover 27