201233823 六、發明說明： 【發明所屬之技術領域】 [0001]本發明涉及一種殼體及其製作方法，尤其涉及一種具有 巧克力色外觀的殼體及其製作方法。 C先前技術] [_隨著科技的不斷進步，行動電話、個人數位助理等各式 電子裝置也迅速發展，其功能亦愈來愈豐富。為了使電 子裝置的外殼具有豐富色彩，傳統上可利用彩色塑膠形 Q 祕色_綠，域㈣漆料在電子裝置的殼體表 面形成色料層H塑歸殼與噴漆外殼不能呈現良 好的金屬質感。另-方面’由於真空鍍臈技術本身較為 複雜而不易精密操控’習知技術中於鉸體表面形成的金 層真空賴層的色料限’與烤漆、陽極纽等工藝相 比’真空賴層的色彩賴豐富，嚴重影響了其在裝飾 鍍膜領域的競爭力。 【發明内容】 〇 _]鑒於此，本發明提供—種籍初克力色外觀的 殼體。 … [0004]另外，本發明還提供一種上述殼體的製作方法。 [_-種殼體’其包括基體及形成於基體表面的色彩層，該 色彩層包括依次形成於基趙表面軌Μ層和氧化銘層 ’該色彩層呈現的色度區域於⑽LAB4 *座 標介於56至100之間，a木座標介於8至1〇之間，座標介 於29至31之間。 100104709 表單編號A0101 第3頁/共14頁 1002008182-0 201233823 [0006] 一種殼體的製作方法，其包括如下步驟： [0007] 提供一基體； [0008] 於該基體的表面形成色彩層，該色彩層包括籍由中頻磁 控濺射形成於基體表面的氮氧鉻層，以鉻靶為靶材，以 氧氣和氣氣為反應氣體，控制氧氣的初始流量為2 0 sccm ，氣氣的初始流量為1 5 s c c m，氧氣和氮氣的流量呈梯度 增加，使其氧原子和氮原子由靠近基體至遠離基體的方 向呈梯度增加，於基體上形成氮氧鉻層； [0009] 於氮氧鉻層上直流磁控濺射形成氧化鋁層。所述色彩層 呈現的色度區域於CIE LAB表色系統的L*座標介於56至 100之間，a*座標介於8至10之間，b*座標介於29至31之 間。 [0010] 相較於習知技術，所述殼體的製備方法在形成色彩層時 ，籍由對靶材的選取、反應氣體氧氣和氮氣流量的設計 和濺射時間的控制形成氮氧鉻層，之後再磁控濺射氧化 鋁層，籍由兩個膜層之間的重疊作用，從而達到使色彩 層呈現巧克力色的目的，以該方法所製得的殼體呈現出 具有吸引力的巧克力色的外觀，豐富了真空鍍膜層的顏 色，提高了產品的外觀競爭力。 【實施方式】 [0011] 請參閱圖1，本發明一較佳實施例的殼體10包括基體11及 形成於基體11表面的色彩層13。該色彩層13呈現巧克力 色。 [0012] 基體11的材質可為不銹鋼、玻璃、陶瓷或塑膠，優選為 100104709 表單編號A0101 第4頁/共14頁 1002008182-0 201233823 不錄鋼。 [0013] 色彩層13形成於基體11的表面。該色彩層13包括依 成於基體11表面的氮氧鉻層131和氧化鋁層133。 次形 [0014] 所述氮氧鉻層131是籍由中頻磁控濺射的方式形成。 [0015] 所述氧化鋁層133是籍由直流磁控濺射的方式形成。 [0016] 該色彩層13中的氮氧化鉻層131的厚度為〇. 3-L Qum [0017] 氧化鋁133的厚度為〇. 1~0. 2um。 〇 [0018] 該色彩層13肉眼直觀呈現巧先力色，其呈覌的色户 ，a*座 於CIE LAB表色系統的L*座標介於56至1〇β之間"^域 標介於8至10之間，b*座標介於29至31之間。 [0019] 所述氮氧鉻層tCr、0及N各元素的質量百分含量八 r η 〇/ COO/ η Ω α/ α η λ/ rt ο α/ η η/ ^ ^ 53%~58% ， 36%〜40%及6%~7% 〇 [0020] 所述氮氧鉻層中Α1、0各元素的質量百分合l董25%~65% > 35%~75% ν 分别為201233823 VI. Description of the Invention: [Technical Field] [0001] The present invention relates to a housing and a method of fabricating the same, and more particularly to a housing having a chocolate-colored appearance and a method of fabricating the same. C Prior Art] [_ With the continuous advancement of technology, various electronic devices such as mobile phones and personal digital assistants have also developed rapidly, and their functions have become more and more abundant. In order to make the outer casing of the electronic device rich in color, it is conventionally possible to use the color plastic shape Q _ green, the domain (four) lacquer to form a color layer on the surface of the housing of the electronic device. H plastic hull and spray paint shell can not present a good metal Texture. Another aspect is that the vacuum rhodium plating technology itself is more complicated and less precise. 'The color limit of the gold layer vacuum layer formed on the surface of the hinge in the conventional technology' is compared with the paint, anode and other processes. The rich color of the product has seriously affected its competitiveness in the field of decorative coating. SUMMARY OF THE INVENTION In view of the above, the present invention provides a housing for the appearance of a priming color. In addition, the present invention also provides a method of fabricating the above casing. [ _ - seed casing ' which comprises a base body and a color layer formed on the surface of the base body, the color layer comprising a chromaticity region which is sequentially formed on the surface of the base surface and the oxidized layer "the color layer is present in (10) LAB4 * coordinates Between 56 and 100, the a wooden coordinates are between 8 and 1 and the coordinates are between 29 and 31. 100104709 Form No. A0101 Page 3 of 14 1002008182-0 201233823 [0006] A method of manufacturing a housing, comprising the steps of: [0007] providing a substrate; [0008] forming a color layer on a surface of the substrate, The color layer includes a chromium oxynitride layer formed on the surface of the substrate by medium frequency magnetron sputtering, with a chromium target as a target, oxygen and gas as a reaction gas, and an initial flow rate of controlling oxygen of 20 sccm, the initial gas and gas. The flow rate is 15 sccm, and the flow rates of oxygen and nitrogen increase in a gradient, so that the oxygen atoms and nitrogen atoms increase in a gradient from the substrate to the substrate, forming a layer of oxynitride on the substrate; [0009] On-layer DC magnetron sputtering forms an aluminum oxide layer. The color layer presents a chrominance region between the C* LAB color system with an L* coordinate between 56 and 100, an a* coordinate between 8 and 10, and a b* coordinate between 29 and 31. [0010] Compared with the prior art, the method for preparing the casing forms a oxynitride layer by forming a color layer, by selecting a target, designing a reaction gas oxygen and nitrogen flow rate, and controlling sputtering time. And then magnetron sputtering the aluminum oxide layer, by the overlap between the two film layers, thereby achieving the purpose of making the color layer appear chocolate color, and the shell produced by the method presents an attractive chocolate. The color appearance enriches the color of the vacuum coating layer and enhances the appearance competitiveness of the product. [Embodiment] Referring to Figure 1, a housing 10 according to a preferred embodiment of the present invention includes a base 11 and a color layer 13 formed on the surface of the base 11. This color layer 13 presents a chocolate color. [0012] The material of the base 11 may be stainless steel, glass, ceramic or plastic, preferably 100104709 Form No. A0101 Page 4 of 14 1002008182-0 201233823 No steel is recorded. [0013] The color layer 13 is formed on the surface of the substrate 11. The color layer 13 includes a oxynitride layer 131 and an aluminum oxide layer 133 depending on the surface of the substrate 11. The secondary form [0014] The oxynitride layer 131 is formed by medium frequency magnetron sputtering. [0015] The aluminum oxide layer 133 is formed by DC magnetron sputtering. The thickness of the aluminum oxide 133 is 〇. 1~0. 2um. The thickness of the aluminum oxide 133 is 〇. 〇[0018] The color layer 13 is visually presented with a vivid color, which is a hustle color, and the L* coordinate of the a* seat in the CIE LAB color system is between 56 and 1 〇 β " Between 8 and 10, the b* coordinates are between 29 and 31. [0019] The oxynitride layer tCr, 0 and N elements of the mass percentage of eight r η 〇 / COO / η Ω α / α η λ / rt ο α / η η / ^ ^ 53% ~ 58% , 36%~40% and 6%~7% 〇[0020] The mass percentage of each element of Α1 and 0 in the oxynitride layer is 25%~65% > 35%~75% ν respectively
[0021] 本發明殼體10的製作方法包括以下步驟： [0022] 提供基體11。基體11的材質可為不錄鋼、玻填、 塑膠，優選為不鎊鋼。 [0023] 將基體11放入無水乙醇中進行超聲波清洗並烘乾傷用 [0024] 於基體11的表面形成色彩層13。該色彩層13包括氮氧鉻 層131和氧化鋁層133。該色彩層13採用磁控濺射的方式 形成。 100104709 表單煸號Α0101 第5頁/共14頁 1002008182-0 201233823 [0025] 結合參閱圖2，提供一鍍膜機100，該鍍膜機100包括一鍍 膜室20及連接於鍍膜室20的一真空泵30，真空泵30用以 對鍍膜室20抽真空。該鍍膜室20内設有轉架（未圖示）、 相對設置的二鉻靶22和二鋁靶23，轉架帶動基體11沿圓 形的軌跡21公轉，且基體11在沿執跡21公轉時亦自轉。 [0026] 於基體11上形成氮氧鉻層131，抽真空使該鍍膜室20的真 空度為8x10 5Pa，設置轉架的公轉轉速為0. 5rpm(轉/分 鐘），設置鍍膜室20溫度為120°C，設置鉻靶22的功率為 7~9kw，以氬氣為工作氣體，氬氣的流量為 150~300sccm，施加於基體11的偏壓為-250~-200V，設 置偏壓的佔空比為40%〜60% ;以氧氣和氮氣為反應氣體， 控制氧氣的流量為20〜80seem，氮氣的流量為 15~45sccm。滅射時，使氧氣的初始流量為20sccm，IL 氣的初使流量為1 5sccm，賤射過程中使氧氣和氮氣的流 量呈梯度增加。 [0027] 氧氣和氮氣流量具體的梯度增加方式為： [0028] 在第0~5min内，控制氧氣流量為20sccm，氮氣流量為 1 5sccm ;第5〜1 0miη内，控制氧氣流量為30sccm，氮氣 流量為20sccm;第10~15min内，控制氧氣流量為40sccm ，氮氣流量為3 0 sccm ;第1 5〜3 0m i η内，控制氧氣流量為 50sccm，氮氣流量為35sccm ;第30〜45min時，控制氧 氣流量為80sccm，氮氣流量為45sccm。 [0029] 上述氧氣和氮氣的流量變化可參見表1 : [0030] 鑛膜時間/min 〇9流量/seem N9流量/seem L· 100104709 表單編號A0101 第6頁/共14頁 1002008182-0 0-5 20 15 5-10 30 20 10-15 40 30 15-30 50 35 30-45 80 45 表1 201233823 [0031] 於基體11上形成氮氧鉻層131後，控制氧氣流量80sccm 不變，在氮氧鉻層131上形成氧化鋁層133，形成該氧化 鋁層133的工藝參數為：設置鋁靶22的功率為3〜5kw，以 氬氣為工作氣體，氬氣的流量為300〜400sccm，施加於 基體11的偏壓為-1 00 — 200V，濺射20〜30min。 [0032] 所述色彩層13呈現的色度區域於CIE LAB表色系統的L* 座標介於56至100之間，a*座標介於8至10之間，b*座標 介於29至31之間。 [0033] 所述色彩層13的厚度可為0.3〜1.0/zm。 [0034] 所述色彩層13除上述較佳的實施例外，籍由改變所述所 述氮氧鉻層131中Cr、Ο、N及氧化鋁層133中A1、0各元 素的質量百分含量，可以得到不同色差值的色彩層13， 具體請參見表2。 [0035] 表 2 100104709 表單編號A0101 第7頁/共14頁 1002008182-0 [0036]201233823 序 氮氧•鉻層 軋化鉬層 色彩層色差值 號 靶材 Cr Ο Ν 靶材 A1 D L A B 鼋源 wf % 電源 ΛΤί % wi% kW kW 1 8 58 36 6 3 65 35 58 30 2 S 55 38 7 3 55 45 60 9 3» 3 S 53 40 η 3 25 75 60 10 31 [0037] 本發明殼體10可為筆記型電腦、個人數位助理等電子裝 置的殼體，或為其他裝飾類產品的殼體。 [0038] 所述殼體10的製備方法在形成色彩層13時，籍由對鉻靶 22和鋁靶23的選取、反應氣體氧氣和氮氣流量的設計和 濺射時間的控制，形成氮氧鉻層131，之後，在氮氧鉻層 131上磁控濺射氧化鋁層133，籍由兩個膜層之間的重疊 作用，從而達到使色彩層13呈現巧克力色的目的。以該 方法所製得的殼體10呈現出具有吸引力的巧克力色的外 觀，豐富了真空鍍膜層的顏色，極大地提高了產品的外 觀競爭力。 [0039] 本發明殼體10可為筆記型電腦、個人數位助理等電子裝 置的殼體，或為其他裝飾類產品的殼體。 [0040] 所述殼體10的製備方法在形成色彩層13時，籍由對鉻靶 和銘乾材的選取、反應氣體氧氣和氮氣流量的設計和濺 射時間的控制，從而達到使色彩層13呈現巧克力色的目 的。以該方法所製得的殼體10呈現出具有吸引力的巧克 力色的外觀，豐富了真空鍍膜層的顏色，極大地提高了 產品的外觀競爭力。 100104709 表單編號A0101 第8頁/共14頁 1002008182-0 201233823 【圖式簡單說明】 [0041] 圖1係本發明較佳實施例的殼體的剖視示意圖。 [0042] 圖2係圖1殼體的製作過程中所用鍍膜機俯視示意圖。 [0043] 【主要元件符號說明】 殼體：10 [0044] 基體：11 [0045] 色彩層：13 〇 剛 氮氧鉻層：131 [0047] 氧化鋁層：133 [0048] 鍍膜機：100 [0049] 鍍膜室：20 [0050] 軌跡：21 [0051] 鉻靶：22 ξ% [0052] 鋁靶：23 [0053] 真空泵：30 100104709 表單編號Α0101 第9頁/共14頁 1002008182-0[0021] The manufacturing method of the housing 10 of the present invention comprises the following steps: [0022] A base 11 is provided. The material of the base 11 may be unrecorded steel, glass filled, plastic, preferably not pound steel. [0023] The substrate 11 is placed in absolute ethanol for ultrasonic cleaning and drying. [0024] A color layer 13 is formed on the surface of the substrate 11. The color layer 13 includes a oxynitride layer 131 and an aluminum oxide layer 133. This color layer 13 is formed by magnetron sputtering. 100104709 Form 煸 Α 0101 Page 5 / 14 pages 1002008182-0 201233823 [0025] Referring to FIG. 2, a coating machine 100 is provided. The coating machine 100 includes a coating chamber 20 and a vacuum pump 30 connected to the coating chamber 20. The vacuum pump 30 is used to evacuate the coating chamber 20. The coating chamber 20 is provided with a turret (not shown), a relatively disposed chrome target 22 and a two-aluminum target 23, and the turret drives the base 11 to revolve along a circular trajectory 21, and the base 11 revolves along the trajectory 21. It also rotates. The tempering speed of the coating chamber 20 is set to 0x5 5Pa, and the revolution speed of the rotating frame is set to 0.5 rpm (revolutions per minute), and the temperature of the coating chamber 20 is set to be At 120 ° C, the power of the chrome target 22 is set to 7 to 9 kW, argon gas is used as the working gas, the flow rate of the argon gas is 150 to 300 sccm, and the bias voltage applied to the substrate 11 is -250 to -200 V, and the bias voltage is set. The air ratio is 40%~60%; with oxygen and nitrogen as the reaction gas, the flow rate of controlling oxygen is 20~80seem, and the flow rate of nitrogen is 15~45sccm. When the shot is off, the initial flow rate of oxygen is 20 sccm, and the initial flow rate of IL gas is 15 sccm, and the flow of oxygen and nitrogen is increased in a gradient during the sputtering process. [0027] The specific gradient increase mode of the oxygen and nitrogen flow rate is: [0028] In the 0~5min, the controlled oxygen flow rate is 20sccm, the nitrogen flow rate is 15sccm; in the 5th to 10th, the controlled oxygen flow rate is 30sccm, nitrogen gas The flow rate is 20sccm; in the 10th to 15th minute, the controlled oxygen flow rate is 40sccm, the nitrogen flow rate is 30 sccm; in the first 5~3 0m i η, the controlled oxygen flow rate is 50sccm, the nitrogen flow rate is 35sccm; the 30th to 45th minute, The oxygen flow rate was controlled to 80 sccm and the nitrogen flow rate was 45 sccm. [0029] The above flow rates of oxygen and nitrogen can be seen in Table 1: [0030] Membrane time / min 〇 9 flow / seem N9 flow / seem L · 100104709 Form No. A0101 Page 6 / Total 14 pages 1002008182-0 0- 5 20 15 5-10 30 20 10-15 40 30 15-30 50 35 30-45 80 45 Table 1 201233823 [0031] After the formation of the oxynitride layer 131 on the substrate 11, the control oxygen flow rate of 80 sccm is unchanged, in the nitrogen The aluminum oxide layer 133 is formed on the oxychromic layer 131. The process parameters for forming the aluminum oxide layer 133 are as follows: the power of the aluminum target 22 is set to 3 to 5 kW, the argon gas is used as the working gas, and the flow rate of the argon gas is 300 to 400 sccm. The substrate 11 has a bias voltage of -100 to 200 V and is sputtered for 20 to 30 minutes. [0032] The color layer 13 presents a chrominance region with a L* coordinate between 56 and 100 in the CIE LAB color system, an a* coordinate between 8 and 10, and a b* coordinate between 29 and 31. between. [0033] The color layer 13 may have a thickness of 0.3 to 1.0/zm. [0034] The color layer 13 is in addition to the above preferred embodiment, by changing the mass percentage of each of the elements A1 and 0 in the Cr, yttrium, N and aluminum oxide layers 133 in the oxynitride layer 131. , the color layer 13 with different color difference values can be obtained, as shown in Table 2. Table 2 100104709 Form No. A0101 Page 7 / Total 14 Page 1002008182-0 [0036] 201233823 Nitrogen Oxide • Chromium Layer Rolled Molybdenum Layer Color Layer Difference Number Target Cr Ο 靶 Target A1 DLAB Source Wf % Power supply ΛΤ % %%% kW kW 1 8 58 36 6 3 65 35 58 30 2 S 55 38 7 3 55 45 60 9 3» 3 S 53 40 η 3 25 75 60 10 31 [0037] The housing 10 of the present invention It can be a housing for an electronic device such as a notebook computer or a personal digital assistant, or a housing for other decorative products. [0038] The method for preparing the casing 10 forms a chromium oxynitride in the formation of the color layer 13 by the selection of the chromium target 22 and the aluminum target 23, the design of the reaction gas oxygen and nitrogen flow rate, and the sputtering time. After the layer 131, the aluminum oxide layer 133 is magnetron-sputtered on the oxynitride layer 131, whereby the color layer 13 is rendered chocolate-colored by the overlap between the two film layers. The casing 10 produced by this method exhibits an attractive chocolate color appearance, enriches the color of the vacuum coating layer, and greatly enhances the appearance competitiveness of the product. [0039] The housing 10 of the present invention may be a housing of an electronic device such as a notebook computer, a personal digital assistant, or the like, or a housing of other decorative products. [0040] The method for preparing the casing 10 is to form a color layer 13 by selecting a chromium target and a dry material, designing a reaction gas oxygen and nitrogen flow rate, and controlling the sputtering time. 13 presents the purpose of chocolate color. The casing 10 produced by this method exhibits an attractive chocolate color appearance, enriches the color of the vacuum coating layer, and greatly enhances the appearance competitiveness of the product. 100104709 Form No. A0101 Page 8 of 14 1002008182-0 201233823 BRIEF DESCRIPTION OF THE DRAWINGS [0041] FIG. 1 is a cross-sectional view of a casing in accordance with a preferred embodiment of the present invention. 2 is a top plan view of a coating machine used in the manufacturing process of the housing of FIG. 1. [Main component symbol description] Case: 10 [0044] Base: 11 [0045] Color layer: 13 〇 氮 oxynitride layer: 131 [0047] Alumina layer: 133 [0048] Coating machine: 100 [ 0049] Coating chamber: 20 [0050] Track: 21 [0051] Chrome target: 22 ξ% [0052] Aluminum target: 23 [0053] Vacuum pump: 30 100104709 Form number Α 0101 Page 9 / Total 14 pages 1002008182-0