TW201217425A - Organic semiconductor compound - Google Patents

Organic semiconductor compound Download PDF

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TW201217425A
TW201217425A TW100131148A TW100131148A TW201217425A TW 201217425 A TW201217425 A TW 201217425A TW 100131148 A TW100131148 A TW 100131148A TW 100131148 A TW100131148 A TW 100131148A TW 201217425 A TW201217425 A TW 201217425A
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group
substituent
compound
formula
same
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TW100131148A
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Chinese (zh)
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Tamaki Nakano
Takeshi Sakamoto
Kenta Tanaka
Hideyuki Higashimura
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Sumitomo Chemical Co
Univ Hokkaido Nat Univ Corp
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    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D495/00Heterocyclic compounds containing in the condensed system at least one hetero ring having sulfur atoms as the only ring hetero atoms
    • C07D495/02Heterocyclic compounds containing in the condensed system at least one hetero ring having sulfur atoms as the only ring hetero atoms in which the condensed system contains two hetero rings
    • C07D495/04Ortho-condensed systems
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F228/00Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a bond to sulfur or by a heterocyclic ring containing sulfur
    • C08F228/06Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a bond to sulfur or by a heterocyclic ring containing sulfur by a heterocyclic ring containing sulfur
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F232/00Copolymers of cyclic compounds containing no unsaturated aliphatic radicals in a side chain, and having one or more carbon-to-carbon double bonds in a carbocyclic ring system
    • C08F232/02Copolymers of cyclic compounds containing no unsaturated aliphatic radicals in a side chain, and having one or more carbon-to-carbon double bonds in a carbocyclic ring system having no condensed rings
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K85/00Organic materials used in the body or electrodes of devices covered by this subclass
    • H10K85/10Organic polymers or oligomers
    • H10K85/141Organic polymers or oligomers comprising aliphatic or olefinic chains, e.g. poly N-vinylcarbazol, PVC or PTFE
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K85/00Organic materials used in the body or electrodes of devices covered by this subclass
    • H10K85/60Organic compounds having low molecular weight
    • H10K85/649Aromatic compounds comprising a hetero atom
    • H10K85/657Polycyclic condensed heteroaromatic hydrocarbons
    • H10K85/6576Polycyclic condensed heteroaromatic hydrocarbons comprising only sulfur in the heteroaromatic polycondensed ring system, e.g. benzothiophene

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Thin Film Transistor (AREA)
  • Heterocyclic Carbon Compounds Containing A Hetero Ring Having Oxygen Or Sulfur (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)

Abstract

The present invention provides a novel compound having a high electrical charge mobility. Specifically, provided is a compound containing a continuous unit configured from at least two successive structural units represented by the belowmentioned formula (1). (In the formula, Ar1 and Ar2 each independently is a bivalent aromatic group that may have a substituent group, at least one of Ar1 and Ar2 is a bivalent heterocyclic group that may have a substituent group, and Ar1 and Ar2 may be the same as or different from each other. Each G is a direct bond or a linking group, and each G may be the same as or different from the others. R1 and R2 each independently is a hydrogen atom or a monovalent hydrocarbon group having 1-20 carbon atoms and that may have a substituent group, and R1 and R2 may be the same as or different from each other.)

Description

201217425 六、發明說明: 【發明所屬之技術領域】 本發明係關於一種有機半導體化合物及含有該化合物之 有機薄膜。 【先前技術】 近年來’作為有機半導體材料,以主鏈型聚噻吩為代表 之主鏈型有機半導體化合物受到關注。另一方面,已明確 作為側鍵之複數個茱單元堆疊而成之側鏈型有機半導體化 合物具有相對良好之電荷遷移率(參照非專利文獻1)Q 先前技術文獻 非專利文獻 非專利文獻 1 : P〇lymer j〇urnal (2〇1〇) 42, 1〇3123 【發明内容】 發明所欲解決之問題 本發明之目的在於提供一種具有更高電荷遷移率之新穎 之側鏈型化合物。 解決問題之技術手段 即,根據本發明,可提供下述化合物及含有該化合物之 - 有機薄膜。 • [1] 一種化合物,其含有包含2個以上連續之式(1)所表示 之結構單元之連續單元, I58119.doc 201217425 [化i]201217425 VI. Description of the Invention: TECHNICAL FIELD The present invention relates to an organic semiconductor compound and an organic thin film containing the same. [Prior Art] In recent years, as an organic semiconductor material, a main chain type organic semiconductor compound typified by a main chain type polythiophene has been attracting attention. On the other hand, a side chain type organic semiconductor compound in which a plurality of unitary units as a side bond are stacked has a relatively good charge mobility (refer to Non-Patent Document 1). Q. Prior Art Non-Patent Document Non-Patent Document 1: P〇lymer j〇urnal (2〇1〇) 42, 1〇3123 SUMMARY OF THE INVENTION Problems to be Solved by the Invention An object of the present invention is to provide a novel side chain type compound having a higher charge mobility. Means for Solving the Problems According to the present invention, the following compounds and an organic film containing the same can be provided. • [1] A compound containing two or more consecutive units of structural units represented by the formula (1), I58119.doc 201217425 [I]

(1) (式中, ^及V分別獨立為可具有取代基之2(1) (wherein, ^ and V are independently 2 which may have a substituent

Ar1及Ar2中至少—者主 香知基,且 為可具有取代基之2價雜At least one of Ar1 and Ar2, which is a divalent hetero group, and which may have a substituent

Ar2彼此可相同亦可不同, ”衣基,Ar與 各個G為直接鍵結或遠 α . v 飞連、、、°基,且各個G彼此可相同亦Ar2 may be the same or different from each other, "the base, Ar and each G are direct bonds or far α. v fly, , ° base, and each G can be the same

不同, J R1及R2分別獨立為氫原子或可具有取代基之碳數為⑽ 之1價烴基,且R丨與R2彼此可相同亦可不同 [2]如⑴之化合物,其中上述化合物含有包含細以上連 續之式⑺所表示之結構單元之連續單元, [化2]Different, J R1 and R2 are each independently a hydrogen atom or a monovalent hydrocarbon group having a carbon number of (10), and the R 丨 and R 2 may be the same or different from each other. [2] The compound of the above (1), wherein the compound contains a continuous unit of structural units represented by the above continuous formula (7), [Chem. 2]

(式中, 158119.doc 4. 201217425(in the formula, 158119.doc 4. 201217425

Ar1及Ar分別獨立為可具有取代基之2價芳香族基,且Ar1 and Ar are each independently a divalent aromatic group which may have a substituent, and

Ar1及Ar2中至少-者為可具有取代基之2價雜環基,a Ar2彼此可相同亦可不同, 、 R:及R2分別獨立為氫原子或可具有取代基之碳數為㈣ . 之1價烴基,且R1與R2彼此可相同亦可不同卜 . [3]如⑴或[2]之化合物,其中心^分„立為口 有取代基之2價之5員環雜環基。 /、 ⑷如⑴至[3]中任-項之化合物,其中 立為可具有取代基之伸隹吩基。 [5]如[4]之化合物,其中上述化合物含有包含玲以上連 續之式(Κ-1)所表示之結構單元之連續單元, [化3]At least one of Ar1 and Ar2 is a divalent heterocyclic group which may have a substituent, and a Ar2 may be the same or different, and each of R: and R2 is independently a hydrogen atom or the number of carbon atoms which may have a substituent is (IV). A monovalent hydrocarbon group, and R1 and R2 may be the same or different from each other. [3] The compound of (1) or [2], wherein the center thereof is a bivalent 5-membered ring heterocyclic group having a substituent. (4) The compound according to any one of (1) to [3], wherein the compound is a substituent which may have a substituent. [5] The compound of [4], wherein the compound contains a continuous form containing连续-1) The continuous unit of the structural unit represented, [Chemical 3]

(式中, 可具有取代基 及R12彼此可相 R、R2、R11、及R12分別獨立為氫原子 之碳數為1〜2〇之1價烴基,且Ri、r2、Rn 同亦可不同, κ久汉,分別獨立為氫原子或 之美,,4 具有取代基之碳數 之基 R及1^4彼此可相同亦可不同) I581i9.doc 201217425 [6] 如[5]之化合物,其中ru&rm分別獨立為氫原子可 具有取代基之1價烴基、可具有取代基之丨價雜環基、或可 具有取代基之烴氧基。 [7] —種有機薄膜,其含有如⑴至[6]中任一項之化合 物。 發明之效果 本發明之化合物具有較先前之側鏈型有機半導體化合物 更高之電荷遷移率。因此,可較佳地用作構成有機薄膜電 晶體元件、有機光電轉換元件等之有機薄膜之功能性材 料,可進一步提高有機薄膜電晶體元件、有機光電轉換元 件等之電氣特性。 又,與先前之主鏈型有機半導體化合物相比,具有對溶 劑更高之溶解性,因此於元件之大面積化等方面有利,可 較佳地用作用以進行實施簡便之塗佈法之塗佈液的材料。 【實施方式】 以下,對本發明進行詳細說明。本發明並非受以下描述 所限定者,以下說明之本發明之要素可於不脫離本發明之 主旨之範圍内適當變更。 本發明之化合物係含有包含2個以上連續之下述式(1)所 ^示之結構單元之連續單元者。此處,所謂「連續」,係 指結構單元彼此直接鍵結而連結之態樣。 158119.doc 201217425 [化4](wherein R1, R2, R11 and R12 may each independently have a substituent, and R12, R2, R11 and R12 are each independently a hydrogen atom, and the number of carbon atoms is 1 to 2%, and Ri, r2, and Rn may be different. κ久汉, each independently a hydrogen atom or a beauty, 4 has a carbon number of the substituent R and 1^4 may be the same or different from each other) I581i9.doc 201217425 [6] Compounds such as [5], of which ru&amp And rm are each independently a monovalent hydrocarbon group which may have a substituent of a hydrogen atom, an anthracene heterocyclic group which may have a substituent, or a hydrocarbyloxy group which may have a substituent. [7] An organic film containing the compound according to any one of (1) to [6]. EFFECTS OF THE INVENTION The compound of the present invention has a higher charge mobility than the prior side chain type organic semiconductor compound. Therefore, it can be preferably used as a functional material constituting an organic thin film such as an organic thin film transistor element or an organic photoelectric conversion element, and electrical characteristics of an organic thin film transistor element, an organic photoelectric conversion element, and the like can be further improved. Further, since it has higher solubility in a solvent than the conventional main chain type organic semiconductor compound, it is advantageous in terms of a large area of the element, and can be preferably used as a coating method for carrying out a simple coating method. The material of the cloth liquid. [Embodiment] Hereinafter, the present invention will be described in detail. The present invention is not limited by the following description, and the elements of the present invention described below can be appropriately modified without departing from the spirit and scope of the invention. The compound of the present invention contains a contiguous unit comprising two or more consecutive structural units represented by the following formula (1). Here, "continuous" refers to a state in which structural units are directly bonded to each other and connected. 158119.doc 201217425 [Chemical 4]

(1) 式⑴中,ΑΓΐ及Μ分別獨立為可具有取代基之2價芳香 族基,且W及Μ中至少—者為可具有取代基之2價雜環 基,P與以彼此可相同亦可不^各個G為直接鍵結或 連結基,且各個G彼此可相同亦可不同。…及^分別獨立 為氫原子或可具有取代基之碳數為卜㈣價烴基,且r1 與R2彼此可相同亦可不同。 /乍為2價芳香族基,可列舉2價芳香族烴基、2價雜環基 等。此處所謂2價芳香族烴基,係指鍵結於芳香族煙化合 物之環上之氫原子中的2個脫離而產生之基。所謂2價雜環 基’係指鍵結於雜環式化合物之環上之氫原子中的2個脫 離而產生之基。 2價芳香族烴基及2價雜環基之碳數通常為6〜60,較佳為 _,更佳為㈣,進而較佳為㈣,尤佳為6务再 者,此處所謂碳數不包含取代基之碳數。 作為上述芳香族烴化合物之具體例,可列舉選自 (A-1)〜式(A_19)之芳香族烴化合物及選自式㈣)〜式(c. 158119.doc 201217425 之方香族烴化合物,較佳為選自式(A-l)〜式(a_15)之芳香 族煙化合物、選自式(C-1)及式(C-2)之芳香族煙化合物, 更佳為選自式(A-1)〜式(A_8)及式(A_13)之芳香族烴化合 物進而較佳為選自式(A-1)〜式(A-3)及式(A-13)之芳香族 ^化。物,尤佳為選自式(A·1)〜式(A-3)之芳香族烴化合 物。 作為上述雜環式化合物之具體例,可列舉選自下述式 (Α_2〇)〜式(Α_38)之雜環式化合物、選自式(Β-1)〜式(Β·1〇) 弋(C 14)式(C-24)之雜環式化合物,較佳為選自式(八_ 20)〜式(Α-38)及式(B-丨)〜式(Β_1〇)之雜環式化合物更佳為 選自式(Α-2〇)〜式(Α·26)、式(Β-1)〜式(Β-4)及式(Β-8)之雜 環式化合物,進而較佳為選自式(Α-20)〜式(Α-23)、式(Β-1)〜式(Β-4)及式(Β-8)之雜環式化合物,尤佳為選自式(Β2) 及式(Β-3)之雜環式化合物,特佳為式之雜環式化合 物。 再者,將式(Β-3)所表示之雜環式化合物上所鍵結之氫 原子中的2個脫離而產生之基稱為thi〇phenylene(伸D塞吩 基)(存在稱為thienylene(伸«塞吩基)之情形)。 1581I9.doc 201217425 [化5](1) In the formula (1), hydrazine and hydrazine are each independently a divalent aromatic group which may have a substituent, and at least one of W and fluorene is a divalent heterocyclic group which may have a substituent, and P may be the same as each other Alternatively, each G may be a direct bond or a linker, and each G may be the same or different from each other. And the respective carbon atoms which may be a hydrogen atom or may have a substituent are a tetravalent hydrocarbon group, and r1 and R2 may be the same or different from each other. /乍 is a divalent aromatic group, and examples thereof include a divalent aromatic hydrocarbon group and a divalent heterocyclic group. Here, the divalent aromatic hydrocarbon group means a group in which two of the hydrogen atoms bonded to the ring of the aromatic tobacco compound are detached. The "bivalent heterocyclic group" means a group derived from two of the hydrogen atoms bonded to the ring of the heterocyclic compound. The carbon number of the divalent aromatic hydrocarbon group and the divalent heterocyclic group is usually from 6 to 60, preferably _, more preferably (d), further preferably (d), and particularly preferably six, and the carbon number here is not Contains the carbon number of the substituent. Specific examples of the aromatic hydrocarbon compound include an aromatic hydrocarbon compound selected from the group consisting of (A-1) to (A-19) and a compound aromatic compound selected from the group consisting of formula (4)) to formula (c. 158119.doc 201217425). Preferably, it is an aromatic smoky compound selected from the group consisting of formula (Al) to formula (a-15), an aromatic smoky compound selected from the group consisting of formula (C-1) and formula (C-2), more preferably selected from the formula (A). Further, the aromatic hydrocarbon compound of the formula (A_8) and the formula (A-13) is preferably an aromatic compound selected from the group consisting of the formula (A-1) to the formula (A-3) and the formula (A-13). The compound is preferably an aromatic hydrocarbon compound selected from the group consisting of the formula (A·1) to the formula (A-3). Specific examples of the heterocyclic compound are selected from the following formula (Α_2〇)~ a heterocyclic compound of Α_38), a heterocyclic compound selected from the group consisting of formula (Β-1)~((1·1〇) 弋(C 14) (C-24), preferably selected from the formula (8) 20) The heterocyclic compound of the formula (Α-38) and the formula (B-丨)~式(Β_1〇) is more preferably selected from the formula (Α-2〇)~式(Α·26), formula (Β -1) a heterocyclic compound of the formula (Β-4) and the formula (Β-8), further preferably selected from the formula (Α-20) to (式-23), (Β-1)~ a heterocyclic compound of the formula (Β-4) and the formula (Β-8), particularly preferably a heterocyclic compound selected from the formula (Β2) and the formula (Β-3), particularly preferably a heterocyclic compound of the formula: Further, a group derived from two of the hydrogen atoms bonded to the heterocyclic compound represented by the formula (Β-3) is referred to as thi〇phenylene. Base) (there is a case called thienylene) 1581I9.doc 201217425 [Chemical 5]

◎ CA-1)◎ CA-1)

^ 0000 (A — 5) (A-6)^ 0000 (A — 5) (A-6)

(A--9) (A—10>(A--9) (A-10)

(A—11)(A-11)

(A—12)(A-12)

ooooo οοοί (A —13) (A—14)Ooooo οοοί (A -13) (A-14)

0 (A—20> (A — 2*0 (A — 22) <A-23) (A_24>0 (A-20) (A — 2*0 (A — 22) <A-23) (A_24>

158119.doc 201217425 [化6]158119.doc 201217425 [Chem. 6]

(B-5)(B-5)

V Ο (Β—9) 158119.doc ◎ ¢3 (Β-2) (Β-3) (Β-4) ψ Η ψ Η (8—6) Ο (Β—10) (Β-7) (8-8) 201217425 [化7]V Ο (Β—9) 158119.doc ◎ ¢3 (Β-2) (Β-3) (Β-4) ψ Η ψ Η (8-6) Ο (Β—10) (Β-7) (8 -8) 201217425 [Chem. 7]

Όφ (C-1)Όφ (C-1)

Ar1及Ar2中至少1者為可具有取代基之2價雜環基,較佳 158119.doc -11 - 201217425 為Ar1及Ar2之兩者為2價雜環基。At least one of Ar1 and Ar2 is a divalent heterocyclic group which may have a substituent, and preferably 158119.doc -11 - 201217425 is a divalent heterocyclic group in which both Ar1 and Ar2 are a divalent heterocyclic group.

Ar1與Ar2彼此可相同亦可不同,較佳為相同。 作為Ar1與Ar2可具有之取代基,可列舉:齒素原子、可 具有取代基之1價經基(即烴基(hydrocarbyl))、疏基、幾基 疏基、硫幾基疏基、可具有取代基之烴硫基、可具有取代 基之煙硫基、可具有取代基之煙二硫基、經基、可呈有 取代基之烴氧基、羧基、醛基、可具有取代基之烴幾基、 可具有取代基之烴氧羰基、可具有取代基之烴羰氧基、氰 基、硝基、胺基、可具有取代基之烴單取代胺基、可具有 取代基之烴二取代胺基、膦基、可具有取代基之烴單取代 膦基、可具有取代基之烴二取代膦基、式:_p(=〇)(〇h)2 所表示之基、胺甲醯基、可具有取代基之烴單取代胺曱醯 基、可具有取代基之烴二取代胺曱醯基、式:-B(0H)2所 表示之基、硼酸酯殘基、磺基、可具有取代基之烴磺基、 可具有取代基之烴磺醯基、可具有取代基之1價雜環基、 具有2個以上醚鍵之烴基、具有2個以上酯鍵之烴基、具有 2個以上醯胺鍵之烴基、式:_C02M所表示之基、式: -Ρ03Μ所表示之基、式:_p〇2m所表示之基、式:-p〇3M2 所表示之基、式:-0M所表示之基、式:-SM所表示之 基、式.-B(0M)2所表示之基、式:-SO3M所表示之基、 式:-S02M所表示之基(M表示金屬陽離子或可具有取代基 之銨陽離子。以下亦相同)、式:-NR3M’所表示之基、 式.-BR3M'所表示之基、式:-PR3M’所表示之基、 式:-SR2M·所表示之基(式中,R表示1價烴基,M,表示陰 158119.doc •12- 201217425 離子)、及於雜環内具有經四級化之氮原子之可具有取代 基之1價雜環基等,較佳為邊素原子、可具有取代基之烴 基、羥基、可具有取代基之烴氧基、羧基、可具有取代基 之域基、氰基、胺基、可具有取代基之煙單取代胺基、 可具有取代基之烴二取代胺基、磺基、及可具有取代基之 1锅雜環基’更佳為鹵素原子、可具有取代基之烴基、羥 基、可具有取代基之烴氧基、羧基、氰基、胺基、及可具 有取代基之1價雜環基,進而較佳為可具有取代基價烴 基、可具有取代基之烴氧基、及可具有取代基之〖價雜環 基,尤佳為可具有取代基之煙氧基。 A〆及A"不具有取代基之情形較佳為與具有烴基作 為取代基之情形同等及其以上。 作為取代基(取代原子)之南素原子之例,可列舉氟原 子、氯原子、溴原子、碘原子,較佳為氟原子、氣原子、 溴原子’更佳為氣原子、溴原子。 作為取代基之1價烴基,可列舉:甲基、乙基、丙基、 異丙基、丁基、異丁基、第三丁基、戊基、己基、壬基、 十二烷基、十五烷基、十八烷基、二十二烷基等碳數為 1〜50之烷基;環丙基、環丁基、環戊基、環己基、環壬 基、環十二烷基、降冰片烷基、金剛烷基等碳數為3〜5〇之 環烷基;乙烯基、丙烯基、3_丁烯基、2_丁烯基、戍烯 基、2-己烯基、2-壬烯基、2-十二烯基等破數為2〜5〇之稀 基;苯基、1-萘基、2-萘基、2_甲基苯基、3_曱基苯基、 4-甲基苯基、4-乙基苯基、4·丙基苯基、4異丙基苯基、 I58119.doc -13- 201217425 4-丁基苯基、4_第三丁基苯基、4•己基苯基、4_環己基苯 基、4-金剛烷基苯基、4_苯基苯基等碳數為6〜5〇之芳基; 苯基甲基、1_苯基乙基、2_苯基乙基、丨_苯基_丨_丙基、卜 苯基·2-丙基、2-苯基-2-丙基、3-苯基-1-丙基、4-苯基-1-丁基、5-苯基_ι_戊基、6_苯基_丨_己基等碳數為7〜5〇之芳烷 基,較佳為碳數為1〜5〇之烧基、碳數為6〜5〇之芳基,更佳 為碳數為1〜12之烷基、碳數為6〜18之芳基,尤佳為碳數為 1〜6之烷基、碳數為6〜12之芳基。 關於該等1價烴基,基中之氫原子中之至少丨個(尤其 個〜3個氫原子,特別是i個或2個氫原子)可經取代基取 代·^作為取代基之例,可列舉氟原子、氣原子、溴原子等 齒素原子;甲氧基、乙氧基、丙氧基等碳數為卜。之烷氧 基;烷氧基羰基;氰基。 將取代基之烴硫基、烴硫隸基、烴二硫基、煙氧基、烴 幾基、烴氧幾基、及烴幾氧基含有之烴基部分作為。價 煙基」❿進行$明,1如例示所示。豸等 分之氣原子中的至少-部分亦可與上述「i價煙基二: 形同樣地經取代’作為取代基之例,亦可列舉相同之基。 將取代基之烴單取代胺基、烴二取代胺基、”取代鱗 二:二取代膦基、烴單取代胺甲醯基、煙二取代胺甲醯 ^有之煙基部分作為Μ㈣基」而進行說明,且如例 :。a"基含有之烴基部分之氫原子中的至少一部分 二例上Γ1價烴基」之情形同樣地經取代,作為取代 丞之例,亦可列舉相同之基。 158119.doc 14· 201217425 作為取代基之硼酸酯殘基之例 [化8] 可列舉選自下式之基。Ar1 and Ar2 may be the same or different from each other, and are preferably the same. Examples of the substituent which Ar1 and Ar2 may have include a dentate atom, a monovalent radical (that is, a hydrocarbyl group) which may have a substituent, a sulfhydryl group, a sulfhydryl group, a thiol group, and the like. a hydrocarbonthio group of a substituent, a niobiumthio group which may have a substituent, a nicotinyl group which may have a substituent, a mercapto group, a hydrocarbyl group which may be substituted, a carboxyl group, an aldehyde group, a hydrocarbon which may have a substituent Alkyloxycarbonyl group which may have a substituent, a hydrocarbon carbonyloxy group which may have a substituent, a cyano group, a nitro group, an amine group, a hydrocarbon monosubstituted amine group which may have a substituent, a hydrocarbon disubstituted group which may have a substituent An amine group, a phosphino group, a hydrocarbon monosubstituted phosphino group which may have a substituent, a hydrocarbon disubstituted phosphino group which may have a substituent, a group represented by the formula: _p(=〇)(〇h)2, an amine formazan group, a hydrocarbon monosubstituted amine fluorenyl group which may have a substituent, a hydrocarbon disubstituted amine fluorenyl group which may have a substituent, a group represented by the formula: -B(0H)2, a boronic acid ester residue, a sulfo group, or may have a hydrocarbon sulfo group of a substituent, a hydrocarbon sulfonyl group which may have a substituent, a monovalent heterocyclic group which may have a substituent, and a hydrocarbon group having two or more ether bonds a hydrocarbon group having two or more ester bonds, a hydrocarbon group having two or more indoleamine bonds, a group represented by the formula: _C02M, a group represented by the formula: -Ρ03Μ, a formula represented by the formula: _p〇2m, and a formula: -p The base represented by 〇3M2, the formula represented by -0M, the formula: the base represented by -SM, the base represented by the formula .-B(0M)2, the formula: the base represented by -SO3M, and the formula: - a group represented by S02M (M represents a metal cation or an ammonium cation which may have a substituent. The same applies hereinafter), a group represented by the formula: -NR3M', a group represented by the formula -BR3M', and a formula: -PR3M' The base represented by the formula: -SR2M· (wherein R represents a monovalent hydrocarbon group, M represents an anion 158119.doc •12-201217425 ion), and has a quaternized nitrogen atom in the heterocyclic ring. The monovalent heterocyclic group which may have a substituent, etc., preferably a side atom, a hydrocarbon group which may have a substituent, a hydroxyl group, a hydrocarbyl group which may have a substituent, a carboxyl group, a domain group which may have a substituent, a cyano group , an amine group, a monosubstituted amine group which may have a substituent, a hydrocarbon disubstituted amine group which may have a substituent, a sulfo group, and a pot which may have a substituent The heterocyclic group 'more preferably is a halogen atom, a hydrocarbon group which may have a substituent, a hydroxyl group, a hydrocarbyl group which may have a substituent, a carboxyl group, a cyano group, an amine group, and a monovalent heterocyclic group which may have a substituent, and further It is preferably a substituted alkyl group, a hydrocarbyloxy group which may have a substituent, and a valent heterocyclic group which may have a substituent, and particularly preferably a nicotinyl group which may have a substituent. The case where A〆 and A" have no substituent is preferably the same as or higher than the case of having a hydrocarbon group as a substituent. Examples of the south atom of the substituent (substituted atom) include a fluorine atom, a chlorine atom, a bromine atom, and an iodine atom. Preferably, the fluorine atom, the gas atom, and the bromine atom are more preferably a gas atom or a bromine atom. The monovalent hydrocarbon group as a substituent may, for example, be a methyl group, an ethyl group, a propyl group, an isopropyl group, a butyl group, an isobutyl group, a tert-butyl group, a pentyl group, a hexyl group, a decyl group, a dodecyl group or a decyl group. Pentaalkyl, octadecyl, behenyl or the like having an alkyl group having 1 to 50 carbon atoms; cyclopropyl, cyclobutyl, cyclopentyl, cyclohexyl, cyclodecyl, cyclododecyl, a norbornyl group having a carbon number of 3 to 5 Å, such as a norbornyl group or an adamantyl group; a vinyl group, a propenyl group, a 3-butenyl group, a 2-butenyl group, a nonenyl group, a 2-hexenyl group, and 2 a nonyl group, a 2-dodecenyl group or the like having a number of 2 to 5 Å; a phenyl group, a 1-naphthyl group, a 2-naphthyl group, a 2-methylphenyl group, a 3-nonylphenyl group, 4-methylphenyl, 4-ethylphenyl, 4-propylphenyl, 4-isopropylphenyl, I58119.doc -13- 201217425 4-butylphenyl, 4_t-butylphenyl , 4•hexylphenyl, 4—cyclohexylphenyl, 4-adamantylphenyl, 4-phenylphenyl, etc., an aryl group having a carbon number of 6 to 5 Å; phenylmethyl, 1-phenylene Base, 2_phenylethyl, 丨_phenyl_丨-propyl, phenyl phenyl 2-propyl, 2-phenyl-2-propyl, 3-phenyl-1-propyl, 4- Phenyl-1-butyl, 5-benzene An aralkyl group having a carbon number of 7 to 5 Å, such as a pentyl group, a 6-phenyl-indole-hexyl group, preferably an aryl group having a carbon number of 1 to 5 Å and a carbon number of 6 to 5 Å. More preferably, it is an alkyl group having a carbon number of 1 to 12 and an aryl group having a carbon number of 6 to 18, and particularly preferably an alkyl group having a carbon number of 1 to 6 and an aryl group having a carbon number of 6 to 12. With respect to the monovalent hydrocarbon group, at least one of the hydrogen atoms in the group (particularly, ~3 hydrogen atoms, particularly i or 2 hydrogen atoms) may be substituted with a substituent as an example of a substituent. The flavonoid atoms such as a fluorine atom, a gas atom, and a bromine atom are listed; the carbon number such as a methoxy group, an ethoxy group, or a propoxy group is a bu. Alkoxy group; alkoxycarbonyl; cyano group. The hydrocarbon group of the substituent, the hydrocarbon sulfur group, the hydrocarbon disulfide group, the nicotinyl group, the hydrocarbon group, the alkoxy group, and the hydrocarbon group portion of the hydrocarbon group are used. The price of the smoke base is $, and 1 is shown as an example. At least a part of the aliquot of the gas atom may be an example of the above-mentioned "i-valent smoky group II: the same substitution" as the substituent, and the same group may be mentioned. The hydrocarbon mono-substituted amino group of the substituent The hydrocarbon disubstituted amine group, the "substituted scale 2: disubstituted phosphino group, the hydrocarbon monosubstituted amine methyl sulfonyl group, and the fluorenyl group of the fluorinated disubstituted amine hydrazide" are described as fluorene (tetra) groups, and are as follows: The a" at least a part of the hydrogen atoms in the hydrocarbon group portion of the group is substituted in the same manner as in the case of the above two examples of the above-mentioned monovalent hydrocarbon group. As an example of the substituted anthracene, the same group may be mentioned. 158119.doc 14· 201217425 Examples of the boronic acid ester residue as a substituent The group selected from the following formulas is exemplified.

取代基之1價雜環基係自雜環式化合物去除i個氣原子之 殘留原子團。作為雜環式化合物之例,可列舉:吼。定、 1,2…井、二,、η啡、^三,、。夫。南、吡 咯、噻吩、吡唑、咪唑、啰唑、噻唑、呵二唑、噻二唑、 氮雜二唑等單環式雜環式化合物;構成單環式雜環式化合 物之雜環之2個以上縮合而成之縮合多環式雜環式化合 物;具有利用亞曱基、伸乙基、幾基等2價基使構成單環 式雜環式化合物之雜環2個、或使芳香環丨個與構成單環式 雜環式化合物之雜環丨個交聯而成之結構的交聯多環式雜 環式化合物等。 作為雜環式化合物,較佳為吡啶、丨,2_二畊、二 畊、1,4-二畊、1,3,5_三畊,更佳為吡啶、U3,5_三畊。該i 價雜環基中之氫原子亦可經取代基取代,作為取代基之 例,可列舉與上述「〖價烴基」相關之取代基。 作為取代基之具有2個以上鱗鍵之烴基之例,可列舉下 式所表示之基。 [化9]The monovalent heterocyclic group of the substituent removes residual atomic groups of i gas atoms from the heterocyclic compound. As an example of a heterocyclic compound, 吼 is mentioned. Ding, 1, 2... well, two, η 啡, ^ three,,. husband. a monocyclic heterocyclic compound such as a pyrrole, thiophene, pyrazole, imidazole, oxazole, thiazole, oxadiazole, thiadiazole or azadiazole; a heterocyclic ring constituting a monocyclic heterocyclic compound a condensed polycyclic heterocyclic compound obtained by condensing one or more; having a heterocyclic ring constituting a monocyclic heterocyclic compound by using a divalent group such as a fluorenylene group, an ethyl group or a benzyl group; or an aromatic ring A crosslinked polycyclic heterocyclic compound having a structure in which a heterocyclic ring constituting a monocyclic heterocyclic compound is crosslinked. The heterocyclic compound is preferably pyridine, hydrazine, 2_two tillage, two tillage, 1,4-two tillage, 1,3,5_three tillage, more preferably pyridine, U3, 5_three tillage. The hydrogen atom in the i-valent heterocyclic group may be substituted with a substituent, and examples of the substituent include a substituent related to the above-mentioned "valent hydrocarbon group". Examples of the hydrocarbon group having two or more scaly bonds as a substituent include a group represented by the following formula. [Chemistry 9]

—R-(OR')p-H —R'-iOR'Jp-OH ~〇-(R'〇)p-H -O'-iROJp-RH 158119.doc ·15· 201217425 式中,R'表示可具有取代基之2價烴基(即經基 (hydrocarbyl)p p為2以上之整數。各個R’可相同亦可不 同。 作為R·所表示2價烴基之例,可列舉:亞甲基、伸乙 基、1,2-伸丙基、1,3-伸丙基、l,2-伸丁基、1,3-伸丁基、 1,4-伸丁基、1,5-伸戊基、1,6-伸己基、1,9-伸壬基、112 伸十二院基等碳數為1〜5 〇之2價飽和烴基;伸乙稀基、伸 丙烯基、3-伸丁烯基、2-伸丁烯基、2-伸戊烯基、2_伸己 烯基、2-伸壬烯基、2-伸十二烯基等伸烯基及伸乙炔基等 碳數為2〜50之2價不飽和烴基;伸環丙基、伸環丁基、伸 環戊基、伸環己基、伸環壬基、伸環十二烷基、伸降冰片 烷基、伸金剛烷基等碳數為3〜5〇之2價環狀飽和烴基;^ 伸苯基、1,4-伸苯基、伸萘基、以-伸蔡基、2,6伸萃 基、聯苯_4,4,.二基等碳數為6,之伸芳基等,較佳為; 乙基》該等2價烴基具有之氫原子之至少一部分亦可經取 代基取代i絲代基之例,可列舉與上述「丨價煙基」 相關之取代基。 以上酯鍵之烴基之例,可列舉選 作為取代基之具有2個 自下式之基。 [化 10] 〇 -r.~(cor.)p-h—R-(OR')pH—R′-iOR'Jp-OH ~〇-(R'〇)pH -O'-iROJp-RH 158119.doc ·15· 201217425 wherein R' represents a substituent The divalent hydrocarbon group (that is, the hydrocarbyl pp is an integer of 2 or more. Each R' may be the same or different. Examples of the divalent hydrocarbon group represented by R include a methylene group, an ethyl group, and 1 , 2-extended propyl, 1,3-propanyl, 1,2-butyl, 1,3-butyl, 1,4-butyl, 1,5-amyl, 1,6 - a divalent saturated hydrocarbon group having a carbon number of 1 to 5 Å, such as a hexanyl group, a 1,9-extension fluorenyl group, a 112-extension 12-base group; a vinylidene group, a propylene group, a 3-butenyl group, and 2 a carbon number of 2 to 50 such as an extended alkenyl group and an extended ethynyl group such as a butenyl group, a 2-endopentenyl group, a 2-hexadecenyl group, a 2-extended alkenyl group, a 2-extended dodecenyl group, and the like. Valence-unsaturated hydrocarbon group; carbon number such as cyclopropyl, cyclobutyl, cyclopentyl, cyclohexyl, fluorenyl, fluorenyl, fluorenyl, and adamantyl a 2 valence ring-shaped saturated hydrocarbon group of 3 to 5 fluorene; ^ a phenyl group, a 1,4-phenylene group, a stilbene group, a hexanyl group, a 2,6 extension group, a biphenyl _4,4,. The carbon number of the second base is 6, The aryl group or the like is preferably an ethyl group, and at least a part of the hydrogen atoms of the divalent hydrocarbon group may be substituted with a substituent, and examples of the substitution of the above-mentioned "valent smoky group" may be mentioned. Examples of the hydrocarbon group of the above ester bond include two substituents selected from the following formulas: [Chem. 10] 〇-r.~(cor.)ph

0 -(COR')p-H Ο -R'-0 -(COR')p-H Ο -R'-

OO

(〇Cf〇p-H —(〇CR')p-H 式中,R及p具有與上述相同之人& 相之含義。此處,R'所 之2價烴基如上述說明及例示 所不汉亦可具有取代基 158119.doc • 16 - 201217425 作為取代基之具有2個以上醯胺鍵之烴基之例,可列舉 選自下式之基。 [化 11] 〇(〇Cf〇pH—(〇CR′) pH, where R and p have the same meaning as the above-mentioned human & the bivalent hydrocarbon group of R′ is as described above and illustrated. Examples of the hydrocarbon group having a substituent of 158119.doc • 16 - 201217425 having two or more indoleamine bonds as a substituent include a group selected from the group consisting of the following formulas.

(NCR()p-H ~R,-'(CNRl)p-H —(ΟΝΡ·)ρ-Η —R'-INCR-Jp-H — 式中’ R’及p具有與上述相同之含義。此處,R,所表示2 價煙基如上述說明及例示所示,R’亦可具有取代基。 作為Μ所表示之金屬陽離子’較佳為1〜3價之離子,可 列舉 Li、Na、Κ、Cs、Be、Mg、Ca、Ba、Ag、Al、Bi、(NCR()pH ~R, -'(CNRl)pH - (ΟΝΡ·)ρ-Η -R'-INCR-Jp-H - where 'R' and p have the same meaning as above. Here, R The divalent nicotine group represented by the above description and exemplified, R' may have a substituent. The metal cation represented by ruthenium is preferably a valence of 1 to 3, and examples thereof include Li, Na, ruthenium, and Cs. , Be, Mg, Ca, Ba, Ag, Al, Bi,

Cu、Fe、Ga、Mn、Pb、Sn、Ti、V、w、Y、Yb、Zn、Zr 等金屬之離子。 M所表示之銨陽離子亦可具有取代基,作為取代基之 例,可列舉甲基、乙基、丙基、異丙基、丁基、異丁基、 第三丁基等碳數為1〜10之烷基。 作為R所表示之1價烴基之例,可列舉烷基、環烷基、芳 基、芳烷基等。 作為Μ'所表示之陰離子之例,可列舉:1?-、(:1-、;61*-、1- 、OH.、CIO·、C102-、Cl〇3·、C104·、SCN·、CN.、Ν03·、 S042.、HS〇4-、ρ〇43·、ΗΡ0 42_、Η2Ρ04-、bf4'、ΡΙ?6-、 CH3S〇3、CF3S〇3、四(.*»米β坐基)棚酸酯陰離子、8_經基啥 琳根基陰離子、2-甲基_8-羥基喹琳根基陰離子、2-苯基 羥基喹啉根基陰離子等。 作為取代基之於雜環内具有經四級化之氮原子之丨價雜 158119.doc •17· 201217425 環基之例,可列舉選自下式之基。 [化 12]Ions of metals such as Cu, Fe, Ga, Mn, Pb, Sn, Ti, V, w, Y, Yb, Zn, and Zr. The ammonium cation represented by M may have a substituent. Examples of the substituent include a methyl group, an ethyl group, a propyl group, an isopropyl group, a butyl group, an isobutyl group, and a third butyl group. 10 alkyl. Examples of the monovalent hydrocarbon group represented by R include an alkyl group, a cycloalkyl group, an aryl group, and an aralkyl group. Examples of the anion represented by Μ' include: 1?-, (:1-,; 61*-, 1-, OH., CIO·, C102-, Cl〇3·, C104·, SCN·, CN.,Ν03·, S042., HS〇4-, ρ〇43·, ΗΡ0 42_, Η2Ρ04-, bf4', ΡΙ?6-, CH3S〇3, CF3S〇3, four (.*»米β坐基a sulphonate anion, a benzoyl anion, a 2-methyl-8 hydroxyquinolinyl anion, a 2-phenyl hydroxyquinolinyl anion, etc. as a substituent having a tetra The arsenic of the nitrogen atom of the gradation is 158119.doc •17·201217425 The example of the ring group may be a group selected from the following formulas.

9 Ο 〇 RM· RM' ^ 式中’ R及M·如上述定義所述。 於Ar1與Ar2具有複數個取代基之情形時,複數個(通常2 個)取代基亦可彼此鍵結一起形成2價基而形成環,構成所 形成環之原子個數較佳為5個〜1〇個,進而較佳為5個〜了 個,尤佳為6個。就所形成之環而言,共軛應於分子内廣 泛擴展,較佳為存在π軌道,進而較佳為π軌道為2個以 上’尤佳為形成芳香環。 各個G為直接鍵結或2價連結基,作為連結基之例,除可 具有取代基之2價烴基以外,可列舉選自以下之式(D_丨)〜 式(D-7)之2價基《作為g之例,較佳為直接鍵結、可具有 取代基之2價烴基、式(ΕΜ)〜式(D_3)、式(D 6)及式(D_7)之 基,更佳為直接鍵結、可具有取代基之2價烴基、式(1> 1)、式(D-2)及式(D-3)之基,進而較佳為直接鍵結、·^異 有取代基之2價烴基,尤佳為直接鍵結。 [化 13]9 Ο RM RM· RM' ^ where R and M are as defined above. In the case where Ar1 and Ar2 have a plurality of substituents, a plurality of (usually two) substituents may be bonded to each other to form a divalent group to form a ring, and the number of atoms constituting the ring formed is preferably five. 1 ,, and preferably 5 to ~, especially preferably 6. In the case of the ring formed, the conjugation should be widely spread in the molecule, preferably in the presence of a π orbital, and it is preferred that the π orbital is more than two or more preferably forming an aromatic ring. Each G is a direct bond or a divalent linking group. Examples of the linking group include a divalent hydrocarbon group which may have a substituent, and a formula selected from the following formula (D_丨) to (D-7) The valence group "is preferably a direct bond, a divalent hydrocarbon group which may have a substituent, a formula (D), a formula (D6), and a formula (D_7), more preferably a direct bond, a divalent hydrocarbon group which may have a substituent, a group of the formula (1 > 1), the formula (D-2) and the formula (D-3), and further preferably a direct bond, a hetero substituent The divalent hydrocarbon group is particularly preferably a direct bond. [Chem. 13]

φ-l) (D-2) (D-3) (D-4) (D-5) (D.g) p.7) 158119.doc -18 · 201217425 式中,Rd表示氫原子或取代基,該取代基係如作為^ 與Ar2可具有之取代基所定義般。Rd較佳為碳數為㈣之^ 價飽和烴基或氫原子。 作為上述可具有取代基之2價烴基之例,可列舉選自以 下之式(E-1)〜式(E-5)之2價基。 [化 14]Φ-l) (D-2) (D-3) (D-4) (D-5) (Dg) p.7) 158119.doc -18 · 201217425 wherein Rd represents a hydrogen atom or a substituent, Substituents are as defined for the substituents which the ^ and Ar2 may have. Rd is preferably a valence saturated hydrocarbon group or a hydrogen atom having a carbon number of (d). Examples of the divalent hydrocarbon group which may have a substituent include a divalent group selected from the following formulae (E-1) to (E-5). [Chem. 14]

式2中,表示氫原子或取代基,該取代基係如作為 與ΑΓ2可具有之取代基所示般。較佳為碳數為1〜20之1價 飽和烴基或氫原子。 作為連結基G之具體例,可列舉選自下述式(Fq)〜式(f· 32)之2價基,該等之中,因合成容易,故較佳為式+ 式(F-25)之基,更佳為式(IM)〜式(F_14)之基。 158119.doc -19- 201217425 [化 15] -r Ψ Η CH3 (F-l) (F-2) P2H5 C2H5 (F-3) -PrIn the formula 2, a hydrogen atom or a substituent which is as shown as a substituent which may be possessed by ruthenium 2 is represented. It is preferably a monovalent saturated hydrocarbon group or a hydrogen atom having a carbon number of 1 to 20. Specific examples of the linking group G include a divalent group selected from the following formula (Fq) to formula (f. 32), and among these, since synthesis is easy, it is preferably a formula + (F-25) The basis of the formula, more preferably the formula (IM) ~ formula (F_14). 158119.doc -19- 201217425 [化15] -r Ψ Η CH3 (F-l) (F-2) P2H5 C2H5 (F-3) -Pr

n-Hex π-Oct n-CiaH25 SSS|vHex ^ivOct n-Ci2H25 T Ύ Ψ5 H CHj H t-Bu (F-8) (F-9) (F-10) (F-ll) (F-4) (F-5) (F-6) t-Bu (F-7) t-Bu n-Oct n-CtjHjτ τ T n*Hex n-Pr H (F-12) (F-13) (F-14)n-Hex π-Oct n-CiaH25 SSS|vHex ^ivOct n-Ci2H25 T Ύ H5 H CHj H t-Bu (F-8) (F-9) (F-10) (F-ll) (F-4 (F-5) (F-6) t-Bu (F-7) t-Bu n-Oct n-CtjHjτ τ T n*Hex n-Pr H (F-12) (F-13) (F- 14)

n-Octn-Oct

«Μ«Μ

(F-21) (F-22) Y N 〇 C2H5 (F-26) (F-27) (F-28) (F-29) (F-30) Η H H3C CH3 (F-23) (F-24)K H n-HexV( n-Oct (F-25) 0 n-Hex (F-32) (F-31) 式(F-l)〜式(F-32)中,n-Pr為丙基,n-Hex為己基,n-Oct 為辛基,Ph係苯基,及t-Bu為第三丁基。 於G為直接鍵結之情形時,本發明之化合物係含有包含2 個以上連續之下述式(2)所表示之結構單元之連續單元者。 •20· 158119.doc 201217425[化 16](F-21) (F-22) YN 〇C2H5 (F-26) (F-27) (F-28) (F-29) (F-30) Η H H3C CH3 (F-23) (F- 24) KH n-HexV( n-Oct (F-25) 0 n-Hex (F-32) (F-31) In the formula (Fl)~(F-32), n-Pr is propyl, n -Hex is a hexyl group, n-Oct is an octyl group, Ph is a phenyl group, and t-Bu is a third butyl group. When G is a direct bond, the compound of the present invention contains two or more consecutive contents. a contiguous unit of the structural unit represented by the formula (2). • 20· 158119.doc 201217425 [Chem. 16]

(2) 式(2)中,Ar1、Ar2、尺丨及!^係如式(1)所定義般。 於式(1)及式(2)之結構單元中,…與尺2為氫原子或可具 有取代基之碳數為1〜2〇之1價烴基。Ri與R2彼此可相同亦 了不同。該1價煙基係如作為Ar 1與Ar2可具有之取代基所 示般。R1及R2較佳為碳數為之1價飽和烴基或氫原子, 進而較佳為氫原子。 本發明之化合物較佳為含有選自下述式(Kd)〜式(κ_12) 之結構單元連續2個以上而成之連續單元者,更佳為含有 選自式(Κ-1)〜式(Κ-4)及式(Κ_7)〜式(Κ-10)之結構單元連續2 個以上而成之連續單元者,進而較佳為含有選自式(κ_ 1)、式(Κ-2)、式(Κ-7)及式(Κ-8)之結構單元連續2個以上而 成之連續單元者,尤佳為含有選自式(Κ])、式(κ_7)及式 (Κ-8)之結構單元連續2個以上而成之連續單元者,特佳為 含有包含2個以上連續之式(Κ-1)所表示之結構單元之連續 單元者。 158119.doc 21 · 201217425 [化 17](2) In equation (2), Ar1, Ar2, ruler and! ^ is as defined in equation (1). In the structural unit of the formula (1) and the formula (2), ... and the rule 2 are a hydrogen atom or a monovalent hydrocarbon group having a carbon number of 1 to 2 Å which may have a substituent. Ri and R2 can be identical to each other. The monovalent smoke group is as shown in the substituents which Ar 1 and Ar 2 may have. R1 and R2 are preferably a monovalent saturated hydrocarbon group or a hydrogen atom having a carbon number, and more preferably a hydrogen atom. The compound of the present invention is preferably a continuous unit containing two or more structural units selected from the following formula (Kd) to formula (κ_12), and more preferably contains a compound selected from the formula (Κ-1) to (formula). Κ-4) and a continuous unit in which two or more structural units of the formula (Κ_7) to (Κ-10) are consecutively selected, and further preferably contain a selected from the group consisting of a formula (κ_1) and a formula (Κ-2). It is preferable that the structural unit of the formula (Κ-7) and the formula (Κ-8) has two or more consecutive units, and it is particularly preferable to contain a selected one of the formula (Κ), the formula (κ_7), and the formula (Κ-8). In the case of a continuous unit in which two or more structural units are continuous, it is particularly preferable to include a continuous unit including two or more consecutive structural units represented by the formula (Κ-1). 158119.doc 21 · 201217425 [Chem. 17]

CK-10)CK-10)

R21 R2* (K 一 5〉R21 R2* (K-5)

尸/τ逆 式(κ·1)〜式(K-l2)中’R1及R2係如上述定義 式(K-ι)〜式(K-12)中,R"、R12、R21&R22為氫原子或可 具有取代基之碳數為1〜202!價烴基。Ru、R!2、R2!及R22 彼此可相同亦可不同。該1價烴基係如作為Ari與Ar2可具 有之取代基所示般^、…^心較佳為碳數為^ 之1價飽和烴基或氫原子,進而較佳為氫原子。 式(κ-υ〜式(κ-12)中,Ru、Rl4、Rl5及 具有取代基之碳數為卜心# d13 , 可相n f叮數為1 20之基。R 3、R14、R15及R16彼此 可相叼亦可不同。 為Ar1愈s 之碳數為1〜20之基係如作 ”可具有之取代基所示般。Rn、R】4、Rl5及r16較 J58JI9.doc -22· 201217425 佳為氫原子、或選自可具有取代基之!價煙基、可具有取 ^基之1價雜環基及可具有取代基之烴氧基之基,更佳為 氫原子、可具有取代基之碳數為卜6之丨價烴基、可具有取 代基之碳數為卜…價雜環基、可具有取代基之碳數為 .1〜6之烴氧基’進⑲佳為氫原子、可具有取代基之碳數 • 為1〜6之1價雜環基、可具有取代基之碳數為丨〜6之烴氧 基,尤佳為氫原子、可具有取代基之碳數為丨〜6之烴氧 基’特佳為氫原子。 本發明之化合物係含有包含2個以上連續之式⑴所表示 之結構單元之連續單元者。換言之,本發明之化合物為如 下之侧鏈型化合物,於該化合物_包含式⑴所表示之複數 =構單元彼此直接鍵結而成之連續結構,且使該連續結 冓:式⑴所表示之結構單元中之側鍵即G、Arl及Ar2構成 結構且為複數個相鄰侧鏈之環結構彼此堆疊而成。此 斤明使(側鏈之)環結構彼此堆疊」,係指以接近複數 個相鄰側鏈之環結構分別具有之π轨道彼此相互重疊之程 度之方式配置複數個環結構。 •、發月之化°物較佳為具有較佳為3個以上、更佳為4個 以上連續之式(1)所表示之結構單元。 • 於本發明之化合物中,式⑴所表示之結構單元連續而 =連續結财的式⑴所表示之結構單元彼此之鍵結態樣 ^ pm毛鍵、。頭-頭鍵結、尾-尾鍵結之任一種,並無特 職制,就電氣特性之觀點而言,較料如下述 不之頭-尾鍵結0 158119.doc -23- 201217425[化 18]In the corpse/τ inverse (κ·1)~(K-l2), 'R1 and R2 are as defined above (K-ι)~(K-12), and R", R12, R21&R22 are The hydrogen atom or the carbon group which may have a substituent is a 1- to 20-valent hydrocarbon group. Ru, R!2, R2!, and R22 may be the same or different from each other. The monovalent hydrocarbon group is preferably a monovalent saturated hydrocarbon group having a carbon number of 1, or a hydrogen atom, as the substituent which may be represented by Ari and Ar2, and more preferably a hydrogen atom. In the formula (κ-υ~ (κ-12), Ru, Rl4, Rl5 and the carbon number of the substituent are Buxin #d13, and the nf叮 number is 1 to 20. R 3 , R 14 , R 15 and R16 may be different from each other or different. The base having a carbon number of 1 to 20 for Ar1 is as "may be substituted". Rn, R] 4, Rl5 and r16 are more than J58JI9.doc -22 · 201217425 is preferably a hydrogen atom, or a group selected from a valent valent group which may have a substituent, a monovalent heterocyclic group which may have a substituent, and a hydrocarbyloxy group which may have a substituent, more preferably a hydrogen atom The number of carbon atoms having a substituent is a fluorene hydrocarbon group of the group 6, the carbon number which may have a substituent is a heterocyclic group, and the hydrocarbon group having a substituent having a carbon number of from 1 to 6 is preferably a hydrogen atom, a carbon number which may have a substituent, a monovalent heterocyclic group of 1 to 6, a hydrocarbon group having a carbon number of 丨~6, preferably a hydrogen atom, and a carbon which may have a substituent The hydrocarbon group having a number of 丨~6 is particularly preferably a hydrogen atom. The compound of the present invention contains a contiguous unit comprising two or more consecutive structural units represented by the formula (1). In other words, the compound of the present invention is a side chain type compound in which the compound _ comprises a continuous structure in which a complex number represented by the formula (1) is directly bonded to each other, and the continuous bond is formed: a side bond in the structural unit represented by the formula (1) G, Arl and Ar2 form a structure and a plurality of ring structures of adjacent side chains are stacked on each other. The ring structure of the (side chain) is stacked on each other, and refers to a ring close to a plurality of adjacent side chains. The plurality of ring structures are arranged such that the structures have mutually overlapping π orbitals. The shape of the moon is preferably three or more, more preferably four or more consecutive patterns (1). The structural unit represented by the present invention. In the compound of the present invention, the structural unit represented by the formula (1) is continuous and = the continuous structural unit of the structural unit represented by the formula (1) is bonded to each other. Any of the bond and tail-tail bonds, there is no special system, from the point of view of electrical characteristics, compared to the following head-tail bond 0 158119.doc -23- 201217425[化18]

(1-1) 本發明之化合物具有之式(1)所表示之複數個結構單元 亦可不為單一種類。即,於式(1)所表示之結構單元中’ R1、R2、Ar1、At2及G中之至少1者相互不同之複數種結構 單元彼此連結之情形時’亦包含於「包含2個以上連續之 式(1)所表示之結構單元之連續單元」中。 作為確認於本發明之化合物中含有包含2個以上連續之 式(1)所表示之結構單元之連續單元的方法,可列舉利用 W-NMR之光譜測定。即,,只要檢測出於〗h_nmr光譜中 Ar1及/或〜之質子訊號相比通常之化學位移而向高磁場側 位移即可。該訊號之向高磁場側之位移係由在相鄰之複數 個結構單A中相鄰之複數個側鍵之π軌道彼&重疊而引 起0 就式(1)所表示之結構單元中尺】與尺2不同之 本發明之化合物中式⑴所表*之結構單元連續之情形日 R1及R2鍵結之碳原子成為不對稱碳原子,可成為酬 結構。於式⑴所表示之結構單元進而連續之情形時,? 為更多種類之連續結構。於本發明之化合物中,該連_ 構並無限制。又,於式⑴所表^之結構單元中W與」 158119.doc •24- 201217425 同之情形時,亦同樣地於本發明之化合物中在式(1)所表示 之結構單兀之連續結構之種類上呈現多樣性。於該情形 時,連續結構之種類亦無限制。其中,於連續之結構中, 為表現π軌道之充分重疊,而於該等多樣之連續結構中存 在較佳之連續結構之種類。 對於本發明之化合物所具有之結構單元中、式所表 不之結構單元以外之其他結構單元,並無特別限制,若於 本發明之化合物中式⑴所表*之結構單元變少,則存在側 鏈之π執道彼此重疊之比例減少,故而導電性下降之情 形。因此,本發明之化合物之每單元重量中、式(1)所表= 之結構單元之比例較佳為6〇%以上,更佳為7〇%以上,進 而較佳為80%以上,尤佳為9〇%以上。 本發明之化合物具有之結構單元中、式⑴所表示之鈇 構單元以外之其他結構單元較佳為下述式(4)所表示之: 單元及下述式(6)所表示之結構單元,更佳為 : 表示之結構單元。 ()所 [化 19](1-1) The compound of the present invention may have a plurality of structural units represented by the formula (1), and may not be a single species. In other words, when a plurality of structural units in which at least one of 'R1, R2, Ar1, At2, and G are different from each other in the structural unit represented by the formula (1) is connected to each other, 'including two or more consecutive In the continuous unit of the structural unit represented by the formula (1). As a method of confirming that the compound of the present invention contains a continuous unit containing two or more consecutive structural units represented by the formula (1), spectrometric measurement by W-NMR is exemplified. That is, it is only necessary to detect that the proton signal of Ar1 and/or ~ in the spectrum of the ?h_nmr shifts to the high magnetic field side as compared with the normal chemical shift. The displacement of the signal to the high magnetic field side is caused by the overlap of the π orbitals of the plurality of side keys adjacent to each other in the adjacent plurality of structural sheets A, and the square of the structural unit represented by the formula (1) When the structural unit of the formula (1) in the compound of the present invention which is different from the rule 2 is continuous, the carbon atom bonded to R1 and R2 becomes an asymmetric carbon atom, and it can be a structure. When the structural unit represented by the formula (1) is further continuous, ? is a more diverse type of continuous structure. In the compounds of the present invention, the structure is not limited. Further, in the case where the structural unit of the formula (1) is the same as the case of "158119.doc.24-201217425, the continuous structure of the structural unit represented by the formula (1) in the compound of the present invention is also similarly. The variety is diverse. In this case, there is no limit to the type of continuous structure. Among them, in the continuous structure, in order to express the sufficient overlap of the π orbitals, there are preferred types of continuous structures among the various continuous structures. The structural unit other than the structural unit represented by the formula in the structural unit of the compound of the present invention is not particularly limited, and if the structural unit represented by the formula (1) in the compound of the present invention is small, the side exists. The ratio in which the chains of π are overlapped with each other is reduced, and thus the conductivity is lowered. Therefore, the ratio of the structural unit of the formula (1) to the weight per unit weight of the compound of the present invention is preferably 6% by weight or more, more preferably 7% by weight or more, still more preferably 80% or more, and particularly preferably It is 9〇% or more. The structural unit other than the structural unit represented by the formula (1) in the structural unit of the compound of the present invention is preferably represented by the following formula (4): a unit and a structural unit represented by the following formula (6). More preferably: a structural unit represented. () 19 [Chem. 19]

(4) 二 式(4)中,Ar5為可具有取代基 個之Ar5彼此可相同亦可不同, 158119.doc •25- 201217425 義般。 [化 20](4) In the formula (4), Ar5 is a substituent which may have the same or different, and 158119.doc •25- 201217425 is equivalent. [Chem. 20]

式(6)中,R1與R2為氫原子或可具有取代基之碳數為 同亦可不同。R21及R25為 〜2〇之基,且彼此可相同 1〜20之1價烴基,R1與R2彼此可相 氫原子或可具有取代基之碳數為j 亦可不同。In the formula (6), the number of carbon atoms in which R1 and R2 are a hydrogen atom or which may have a substituent may be the same or different. R21 and R25 are a group of 〜2〇, and may be the same as 1 to 20 of a monovalent hydrocarbon group, and R1 and R2 may each have a hydrogen atom or a carbon number which may have a substituent may be different.

Ar2之說明中之芳香族煙基相同。2香族煙基係與4 具體例,可列舉式(1Μ)〜式d 為式㈠)之結構單 [化21] ~ )之結構單元。The aromatic cigarette groups in the description of Ar2 are the same. 2 Aromatic group and 4 specific examples, the structural unit of the structural formula (Form 21) of the formula (1) to the formula (1) can be exemplified.

158119.doc -26- 201217425 於式(6)之結構單元中,R21及R25係如作為Ar1與Ar2可具 有之取代基所示般。作為式(6)所表示之結構單元之具體 例,可列舉下述式(V-1)〜式(V-12)之結構單元。 [化 22]158119.doc -26- 201217425 In the structural unit of the formula (6), R21 and R25 are as shown in the substituents which Ar1 and Ar2 may have. Specific examples of the structural unit represented by the formula (6) include structural units of the following formulas (V-1) to (V-12). [化22]

158119.doc •27· 201217425 就相鄰側鏈之π軌道彼此之重疊容易性之觀點而言,本 發明之化合物較佳為主鏈延伸較長之鏈狀結構。即,較佳 為通常稱為高分子及低聚物之形態。於該情形時,末端基 鍵結於主鏈之末端。作為末端基之具體例,可列舉氫原 子、甲基、乙基、異丙基、丁基、苯基。 本發明之化合物之分子量可使用凝膠滲透層析法 (GPC,Gel Permeation Chromatography)而以標準聚苯乙烯 換算值之數量平均分子量獲得。作為本發明之化合物之數 罝平均分子量之值,較佳為3〇〇〜1〇〇〇萬,更佳為3004^ 萬,進而較佳為400〜20萬,尤佳為4〇〇〜1萬,特佳為 400〜4000 〇 本發明之化合物具有含有複數根主鏈,且鍵結於不同主 鏈之側鏈之環結構彼此相互交聯而成之結構。 <合成方法> 作為用以合成本發明之化合物之方法之例,可列舉使下 述式(1-2)所表示之化合物反應之方法。 [化 23] I人° ° (1-2) j(1-2)中,Arl、ΑΡϋ及G係如式⑴所定義般。 就使用式(1-2)所表示之化合物之本發明之化合物之合成 158U9.doc • 28· 201217425 令的反應條件而言,可應用於陰離子聚合、陽離子聚入或 自由基聚合中使用之條件。尤佳為於陰離子聚合中使用之 條件。 作為使用陰離子聚合之條件之情形的具體方法,可列舉 於四虱呋喃或二甲基甲醯胺等溶劑中,使用子基鋰 (MeLi)、丁基鋰(n_BuLi)等有機鐘化合物 之化合物反應之方法。 )所表不 本發明係關於-種含有本發明之化合物之有機薄膜。本 發明之化合物可藉由選擇側鏈、取代基而作為電子接受性 化β物電子供應性化合物之任一種發揮功能,因此可較 佳地用作場效型電晶體等有機半導體元件之電荷注入層、 電荷傳輸層、活性層等有機薄膜之功能性材料。 此處,作為可較佳地應用本發明之化合物之有機半導體 7G件之例,對場效型有機薄臈電晶體之構成及其製造方法 進行說明。 場效型有機薄膜電晶體較佳為包含源極電極及汲極電 極、成為該等之間之電流路徑且含有本發明之化合物之有 機半導體層、控制通過電流路徑之電流量之閘極電極、以 及配置於有機半導體層與閘極電極之間之絕緣層。尤佳為 與含有本發明之化合物之有機半導體層接觸而設置源極電 極及汲極電極,進而挾持與有機半導體層接觸之絕緣層而 設置間極電極。 使用本發明之化合物之場效型有機薄膜電晶體例如可藉 由如日本專利特開平5_110069號公報所揭示之先前公知之 158119.doc •29· 201217425 方法而製造。根據該方法,場效型電晶體可藉由如下方式 製造:於包含端子之閘極電極上形成閘極絕緣膜,於該閉 極絕緣膜上形成含有本發明之化合物且藉由活化處理而具 有半導體特性之有機薄膜,一面保護該閉極電極一面活化 處理上述有機薄膜而形成具有半導體特性之有機薄膜後, ~閘極電極之端子露出,以及於上述具有半導體特性之 有機薄膜上形成源極電極及汲極電極。 、就形成含有本發明之化合物之有機薄膜而言,如上所 f ’可選擇先前公知之任意較佳之形成方法,較佳為利用 使用塗佈液之塗佈法而形成。 作為利用塗佈法之形成方法,較佳為塗佈使本發明之化 合物分散於溶劑或分散媒中而成之塗佈液之方法,以及轉 印形成於另一支持基板上之塗佈液之層之方法等。 作為塗佈法之例,可列舉:旋轉塗佈法、繞鑄法、微凹 版印刷塗佈法、凹版印刷塗佈法、棒式塗佈法、輕式塗佈 法、線棒式塗佈法、浸潰塗佈法、噴塗法、網版印刷法、 軟板印刷法、套版印刷法、及噴墨印刷法等。 於形成上述有機薄膜時,藉由選擇適當之溶劑、於經摩 擦之基板上形成有機薄膜、於光配向膜上形成有機薄膜、 或使所形成之膜之溶劑緩緩蒸發、於高溫下對形成之膜進 灯退火、延伸、施加磁場等處理,可提高有機薄膜所含之 本發明之化合物之相鄰複數個側鏈中的兀軌道彼此之重函 程度,即堆疊程度,從而獲得更為良好之π·π相互作用: 堆疊程度得…可利用χ射線繞射(咖 158119.doc -30- 201217425 diffraction)等確認。於堆疊程度提高之連續結構中, H0M0(Highest Occupied Molecular Orbital,最高佔用分 子軌域)間及 / 或 LUMO(Lowest Unoccupied Molecular Orbital,最低未佔用分子轨域)間之共振積分絕對值變得 更大,因此可使載子遷移率變得更大。 實施例 以下,基於實施例對本發明進行更為詳細之說明,但本 發明並不受該等實施例之任何限定。 <合成例1 >化合物1之合成 依照下述流程而合成化合物1。 [化 24] 1. n-BuLi 2. 3-噻吩曱醛158119.doc •27·201217425 The compound of the present invention is preferably a chain structure in which a main chain extends a long length from the viewpoint of ease of overlapping of π orbitals of adjacent side chains. That is, it is preferably a form generally called a polymer and an oligomer. In this case, the terminal group is bonded to the end of the main chain. Specific examples of the terminal group include a hydrogen atom, a methyl group, an ethyl group, an isopropyl group, a butyl group, and a phenyl group. The molecular weight of the compound of the present invention can be obtained by gel permeation chromatography (GPC, Gel Permeation Chromatography) in a number average molecular weight in terms of standard polystyrene. The value of the average molecular weight of the number of the compound of the present invention is preferably from 3 to 1,000,000, more preferably from 3004 to 10,000, still more preferably from 400 to 200,000, and particularly preferably from 4 to 10,000. 10,000, particularly preferably 400 to 4000. The compound of the present invention has a structure in which a plurality of main chains are bonded, and ring structures bonded to side chains of different main chains are cross-linked to each other. <Synthesis method> Examples of the method for synthesizing the compound of the present invention include a method of reacting a compound represented by the following formula (1-2). [Im. 23] I. ° ° (1-2) j (1-2), Arl, ΑΡϋ and G are as defined in formula (1). For the reaction conditions of the compound of the present invention using the compound represented by the formula (1-2) 158U9.doc • 28·201217425, the conditions for use in anionic polymerization, cationic polymerization or radical polymerization can be applied. . It is especially preferred to use it in anionic polymerization. Specific examples of the case of using anionic polymerization conditions include a compound reaction of an organic clock compound such as lithium (MeLi) or butyl lithium (n-BuLi) in a solvent such as tetrahydrofuran or dimethylformamide. The method. The present invention relates to an organic film containing the compound of the present invention. The compound of the present invention can function as any one of the electron-accepting β-electron supply compounds by selecting a side chain or a substituent, and thus can be preferably used as a charge injection for an organic semiconductor element such as a field effect transistor. A functional material of an organic film such as a layer, a charge transport layer, or an active layer. Here, as an example of an organic semiconductor 7G member to which the compound of the present invention can be preferably applied, a configuration of a field effect type organic thin tantalum transistor and a method for producing the same will be described. The field effect type organic thin film transistor is preferably a gate electrode including a source electrode and a drain electrode, an organic semiconductor layer which is a current path between the electrodes and containing the compound of the present invention, and a current amount for controlling a current path through the current path, And an insulating layer disposed between the organic semiconductor layer and the gate electrode. It is particularly preferable to provide a source electrode and a drain electrode in contact with the organic semiconductor layer containing the compound of the present invention, and further to form an interlayer electrode by holding an insulating layer in contact with the organic semiconductor layer. The field-effect type organic thin film transistor using the compound of the present invention can be produced, for example, by the previously known method of 158119.doc •29·201217425 as disclosed in Japanese Laid-Open Patent Publication No. Hei No. Hei 5-110069. According to the method, the field effect type transistor can be manufactured by forming a gate insulating film on a gate electrode including a terminal, forming a compound containing the present invention on the closed insulating film, and having an activation treatment An organic thin film having semiconductor characteristics, wherein the organic thin film having semiconductor characteristics is formed by activating the organic thin film while protecting the closed electrode, the terminal of the gate electrode is exposed, and a source electrode is formed on the organic thin film having semiconductor characteristics And the electrode of the drain. In the case of forming an organic film containing the compound of the present invention, any of the previously known formation methods can be selected as described above, and is preferably formed by a coating method using a coating liquid. As a method of forming by the coating method, a method of applying a coating liquid obtained by dispersing a compound of the present invention in a solvent or a dispersion medium, and a coating liquid formed on another support substrate are preferably used. Layer method, etc. Examples of the coating method include a spin coating method, a ring casting method, a micro gravure coating method, a gravure coating method, a bar coating method, a light coating method, and a bar coating method. , dipping coating method, spray coating method, screen printing method, soft board printing method, plate printing method, and inkjet printing method. In forming the organic thin film, an organic thin film is formed on the rubbed substrate by an appropriate solvent, an organic thin film is formed on the photoalignment film, or a solvent of the formed film is slowly evaporated, and formed at a high temperature. The film is subjected to a lamp annealing, stretching, application of a magnetic field or the like to increase the degree of the enthalpy of the enthalpy orbits in the adjacent plurality of side chains of the compound of the present invention contained in the organic film, that is, the degree of stacking, thereby obtaining better π·π interaction: The degree of stacking can be confirmed by using X-ray diffraction (Cai 158119.doc -30- 201217425 diffraction). In the continuous structure with increased stacking, the absolute value of the resonance integral between H0M0 (Highest Occupied Molecular Orbital) and/or LUMO (Lowest Unoccupied Molecular Orbital) becomes larger. Therefore, the carrier mobility can be made larger. EXAMPLES Hereinafter, the present invention will be described in more detail based on examples, but the present invention is not limited by the examples. <Synthesis Example 1 > Synthesis of Compound 1 Compound 1 was synthesized according to the following scheme. [Chem. 24] 1. n-BuLi 2. 3-thiophene furfural

3. /7-BuLi 4.12 5. Na2SQ3aq. Hlaq.3. /7-BuLi 4.12 5. Na2SQ3aq. Hlaq.

對容量500 mL之3 口燒瓶内之環境進行氮氣置換(以下, 有時將「對燒瓶内之環境進行氮氣置換」僅記載為「氮氣 置換」)。於燒瓶中放入3-漠嗟吩(10.6 mL,109 mmol) (Aldrich 製造)與 Et2O(150 mL),冷卻至-78°C,加入 n-BuLi 己烷溶液(68 mL,109 mmol)。於-78°C下攪拌3小時後, 加入將3-°塞吩曱酸 (9.6 mL,1 09 mmol)(Aldrich製造)溶於 Et2O(150 mL)而成之溶液,於-78°C下攪拌30分鐘後,進而 於室溫下攪拌30分鐘。將反應混合物冷卻至-23°C,加入 158119.doc -31 - 201217425 n-BuLi 己烧溶液(136 mL,218 mmol),於- 23°C 下擾拌 2 小 時後’進而於室溫下搜拌1小時〇將反應混合物冷卻至 -23 C,滴加將Ι2(87·2 g,343 mmol)(和光純藥工業製造)溶 於Et2〇(600 mL)而成之溶液(約30分鐘)〇於室溫下授摔30 分鐘’加入 10% w/w 之 Na2S03aq.(300 mL)、10% 〜~之 HIaq.(10 mL)(Aldrich製造),移至分液漏斗,利用醚進行 萃取’以水洗淨7次’利用MgS〇4加以乾燥,並進行過 濾、溶劑餾去、真空乾燥。利用苯-己烷混合液(體積比: 1/2)60 mL洗淨1次、30 mL洗淨3次,從而以苯-己烧不溶 部分(3 0.09 g ’產率62%)獲得化合物1。另一方面,藉由石夕 膠層析法(CHfl2)對苯•己烧可溶部分進行純化,從而獲得 化合物1(4.83 g,產率9%)。 <合成例2>化合物2之合成 依照下述流程而合成化合物2。 [化 25]The atmosphere in a three-necked flask having a capacity of 500 mL was replaced with nitrogen (hereinafter, "the nitrogen substitution in the environment inside the flask" is sometimes referred to as "nitrogen replacement"). 3-desophenone (10.6 mL, 109 mmol) (manufactured by Aldrich) and Et2O (150 mL) were placed in a flask, cooled to -78 ° C, and then n-BuLi hexane solution (68 mL, 109 mmol). After stirring at -78 ° C for 3 hours, a solution of 3-° Cetric acid (9.6 mL, 1 09 mmol) (manufactured by Aldrich) in Et 2 O (150 mL) was added at -78 ° C. After stirring for 30 minutes, it was further stirred at room temperature for 30 minutes. The reaction mixture was cooled to -23 ° C, and 158119.doc -31 - 201217425 n-BuLi hexane solution (136 mL, 218 mmol) was added, and the mixture was stirred at - 23 ° C for 2 hours, and then searched at room temperature. After stirring for 1 hour, the reaction mixture was cooled to -23 C, and a solution of Ι2 (87·2 g, 343 mmol) (manufactured by Wako Pure Chemical Industries, Ltd.) dissolved in Et 2 〇 (600 mL) was added dropwise (about 30 minutes).授 30 30 30 30 30 30 30 30 30 30 30 30 30 30 30 30 30 30 30 30 30 30 30 30 30 30 30 30 30 30 30 30 30 30 30 30 30 30 30 30 30 30 30 30 30 30 30 30 30 30 30 30 30 30 30 30 30 30 30 30 30 30 30 30 30 30 30 30 30 30 30 30 30 30 30 30 30 30 30 30 30 30 30 30 30 30 30 30 30 30 30 30 30 30 30 30 30 30 30 30 30 30 30 30 30 30 30 30 30 30 30 30 The mixture was washed 7 times with water, dried with MgS 4, filtered, solvent distilled, and vacuum dried. The benzene-hexane mixed solution (volume ratio: 1/2) was washed once with 60 mL and washed with 30 mL for 3 times to obtain the compound 1 in a benzene-hexane-insoluble portion (3 0.09 g 'yield 62%). . On the other hand, the soluble fraction of benzene·hexane was purified by Shixi gum chromatography (CHfl2) to obtain Compound 1 (4.83 g, yield 9%). <Synthesis Example 2> Synthesis of Compound 2 Compound 2 was synthesized according to the following scheme. [Chem. 25]

於經氮氣置換之容量2 L之3 口燒瓶中放入化合物1(39.〇 g,87 mm〇l)與CH2C12(900 mL),製成溶液後,加入氣鉻 酸0比鍵(28.2 g,13 1 mmol)(Aldrich製造)。於室溫下撥摔 12小時後,減壓潑去二氯甲烷直至溶劑量成為一半為止。 利用石夕膠層析法(Ci^Cl2)進行純化,從而獲得化合物 158119.doc -32- 201217425 2(35.0 g,產率 90%)。 <合成例3> 依照下述流程而合成化合物3。 [化 26]Compound 1 (39.〇g, 87 mm〇l) and CH2C12 (900 mL) were placed in a 2-L flask of 2 L volume with nitrogen substitution, and a solution of chromic acid 0 was added to the solution (28.2 g). , 13 1 mmol) (manufactured by Aldrich). After dropping for 12 hours at room temperature, the dichloromethane was removed under reduced pressure until the amount of the solvent became half. Purification was carried out by means of Shixi gum chromatography (Ci^Cl2) to obtain Compound 158119.doc -32 - 201217425 2 (35.0 g, yield 90%). <Synthesis Example 3> Compound 3 was synthesized according to the following scheme. [Chem. 26]

於容量300 mL之3 口燒瓶中放入銅粉(15 〇 g,236 mmol)(Aldrich製造),實施脫氣而進行氮氣置換,加入化 合物2(3 5.0 g,79 mmol)之二曱基曱醛(200 mL)溶液。利用 150°C之油浴加熱15小時’冷卻至室溫為止。過渡反應混 合物,利用醚進行萃取,以水進行清洗,利用MgS〇4加以 乾無後’藉由過據而去除MgS〇4 ’顧去溶劑,進行真空乾 燥。進行利用矽膠層析法(溶劑:氯仿-苯混合液(體積比: W1))之純化’從而獲得化合物3(11.8 g,產率78%)。 <合成例4>化合物5之合成 依照下述流程而合成化合物5。 [化 27]Copper powder (15 〇g, 236 mmol) (manufactured by Aldrich) was placed in a 3-mL flask of 300 mL capacity, degassed and replaced with nitrogen, and compound 2 (3 5.0 g, 79 mmol) of ruthenium ruthenium was added. Aldehyde (200 mL) solution. It was heated by an oil bath at 150 ° C for 15 hours and cooled to room temperature. The transition reaction mixture was extracted with ether, washed with water, dried with MgS 4 and removed by vacuum. The solvent was removed and vacuum dried. Purification by gelatin chromatography (solvent: chloroform-benzene mixture (volume ratio: W1)) was carried out to obtain Compound 3 (11.8 g, yield 78%). <Synthesis Example 4> Synthesis of Compound 5 Compound 5 was synthesized according to the following scheme. [化27]

加入THF 於容量500 mL之3 口燒瓶中放入化合物3(5 〇 g,% mmol) ’實施脫氣而進行氮氣置換, 158119.doc -33· 201217425 (tetrahydrofuran,四氫呋喃)(250 mL)進行溶解。冷卻至 〇°C,加入3.0 Μ之溴化甲基鎂醚溶液(Aldrich製造)(13 mL,39 mmol),攪拌2小時。於反應混合物中加入水及1 N 之鹽酸’利用乙酸乙酯進行萃取’以水洗淨,利用MgS〇4 加以乾燥後’藉由過渡而去除MgS04,潑去溶劑,進行真 空乾燥,從而獲得化合物5(5.35 g,產率99%)。 <合成例6>化合物6之合成 依照下述流程而合成化合物6。 [化 28]Add THF to a 500 mL 3-neck flask and place compound 3 (5 〇g, % mmol). Perform degassing and replace with nitrogen, 158119.doc -33· 201217425 (tetrahydrofuran, tetrahydrofuran) (250 mL) for dissolution. . After cooling to 〇 ° C, a 3.0 溴 solution of methylmagnesium bromide (manufactured by Aldrich) (13 mL, 39 mmol) was added and stirred for 2 hours. Water and 1 N hydrochloric acid 'extracted with ethyl acetate' were added to the reaction mixture, washed with water, dried with MgS 4 , and then removed by a transition to remove MgS04, and the solvent was removed by vacuum drying to obtain a compound. 5 (5.35 g, yield 99%). <Synthesis Example 6> Synthesis of Compound 6 Compound 6 was synthesized according to the following scheme. [化 28]

於容量500 mL之3 口燒瓶中,將化合物5與對甲苯磺酸 (p-TsOH)(137 mg,0_72 mmol)之苯(400 mL)溶液於氮氣環 境下,以70°C攪拌40分鐘。利用冰水進行冷卻,加入水 (約20 mL) ’利用己烷(400 mL)進行萃取,以水洗淨,利用 MgS〇4加以乾燥後’藉由過濾而去除MgS〇4,顧去溶劑, 進行真空乾燥。藉由矽膠層析法(溶劑:己烷)而以黃色固 體獲得化合物6(683 mg,產率50%)。 〈實施例1及2&gt; 依照下述流程而獲得本發明之實施例1及2之化合物。 158119.doc -34- 201217425 [化 29]A solution of compound 5 and p-toluenesulfonic acid (p-TsOH) (137 mg, 0-72 mmol) in benzene (400 mL) was stirred at 70 ° C for 40 min. Cool with ice water, add water (about 20 mL), extract with hexane (400 mL), wash with water, dry with MgS〇4, and remove MgS〇4 by filtration. Vacuum drying was carried out. Compound 6 (683 mg, yield 50%) was obtained as a yellow solid by silica gel chromatography (solvent:hexane). <Examples 1 and 2> The compounds of Examples 1 and 2 of the present invention were obtained according to the following scheme. 158119.doc -34- 201217425 [Chem. 29]

1) MeLi 2) Etl1) MeLi 2) Etl

THF 於乾燥之經氮氣置換之容量25 mL之安瓶管中放入化合 物6之THF溶液,冷卻至-78°C,加入1.0 Μ之MeLi二乙醚 溶液作為起始劑,使其反應24小時。加入碘乙烷(EtI)(和 光純藥工業製造)作為終止劑。藉由離心分離而分離THF不 溶部分與THF可溶部分。將聚合條件及結果示於表1。 [表1] (表1) [6]〇 [1]〇 EtI 產率 THF不溶 THF可溶部分 (M) (M) (mmol) (%) 部分 (%) Μη Mw/Mn 實施例1 0.20 0.040 2.0 &gt;99 13 87 900 1.29 實施例2 0.20 0.10 2.5 &gt;99 〜0 &gt;99 520 1.28 表1中,[6]〇表示反應開始時反應溶液中之化合物6之濃 度,[1]〇表示反應開始時反應溶液中之起始劑之濃度,EtI 表示終止劑之碘乙烷之量(下表中亦相同)。 產率係由1H-NMR求出。Μη(數量平均分子量)及Mw(重 量平均分子量)係藉由GPC而以聚苯乙烯換算值獲得。於 TOF-MS(Time of Flight-Mass Spectrometry,飛行時間質譜 法)測定中,於實施例1中確認到相當於2聚物〜18聚物之分 子量之峰值,於實施例2中確認到相當於2聚物〜8聚物之分 158119.doc -35- 201217425 子量之奪值。 &lt;實施例3&gt; 依照下述流程而獲得本發明之實施例3之化合物。 [化 30]The THF solution of the compound 6 was placed in a dry nitrogen-substituted 25 mL ampoule tube, cooled to -78 ° C, and a 1.0 Torr MeLi diethyl ether solution was added as a starter to carry out a reaction for 24 hours. Ethyl iodide (EtI) (manufactured by Wako Pure Chemical Industries, Ltd.) was added as a terminator. The THF insoluble portion and the THF soluble portion were separated by centrifugation. The polymerization conditions and results are shown in Table 1. [Table 1] (Table 1) [6] 〇 [1] 〇 EtI Yield THF insoluble THF soluble fraction (M) (M) (mmol) (%) Part (%) Μη Mw/Mn Example 1 0.20 0.040 2.0 &gt;99 13 87 900 1.29 Example 2 0.20 0.10 2.5 &gt;99 〜0 &gt;99 520 1.28 In Table 1, [6] 〇 indicates the concentration of the compound 6 in the reaction solution at the start of the reaction, [1] 〇 represents The concentration of the initiator in the reaction solution at the start of the reaction, and EtI represents the amount of iodoethane of the terminator (the same is true in the following table). The yield was determined by 1H-NMR. Μη (number average molecular weight) and Mw (weight average molecular weight) are obtained by GPC in terms of polystyrene. In the measurement of TOF-MS (Time of Flight-Mass Spectrometry), the peak value of the molecular weight corresponding to the 2 to 18 polymer was confirmed in Example 1, and it was confirmed in Example 2 that the equivalent was obtained. The fraction of the 2 mer to 8 mer is 158119.doc -35- 201217425. &lt;Example 3&gt; The compound of Example 3 of the present invention was obtained according to the following scheme. [化30]

於乾燥之經氮氣置換之容量2 5 mL之安瓶管中放入環戊 [2,l-b;3,4-b’]二噻吩及THF,滴加n-BuLi。於室溫下放置 10分鐘,獲得起始劑之化合物7。將其冷卻至-78°C,滴加 化合物6之THF溶液,藉此開始聚合。24小時後,加入鹽 酸曱醇而終止聚合。將聚合條件及結果歸納於表2。 [表2] (表2) [6]〇 (M) [1]〇 (M) 產率 (%) THF不溶部 分(%) THF可溶部分 (%) Μη Mw/Mn 實施例3 0.20 0.4 &gt;99 〜0 &gt;99 390 1.28 產率係由1H-NMR求出。Μη(數量平均分子量)及Mw(重 量平均分子量)係藉由GPC而以聚苯乙烯換算值獲得。於 TOF-MS測定中,確認到相當於2聚物〜25聚物之分子量之 峰值。 (NMR光譜) 對於實施例1及3中獲得之化合物,藉由分取GPC而按每 158119.doc -36- 201217425 個聚合度進行分取,進行ih_Nmr測定。 環戊[2,l-b;3,4-b·]二噻吩之合成 依照下述流程而合成環戊二噻吩。 [化 31]The cyclopentan [2,l-b;3,4-b']dithiophene and THF were placed in a dry, nitrogen-substituted ampere tube of a volume of 25 mL, and n-BuLi was added dropwise. After standing at room temperature for 10 minutes, the starting compound 7 was obtained. This was cooled to -78 ° C, and a solution of the compound 6 in THF was added dropwise, whereby the polymerization was started. After 24 hours, the polymerization was terminated by the addition of sterol hydrochloride. The polymerization conditions and results are summarized in Table 2. [Table 2] (Table 2) [6] 〇 (M) [1] 〇 (M) Yield (%) THF insoluble portion (%) THF soluble portion (%) Μη Mw/Mn Example 3 0.20 0.4 &gt 99 to 0 &gt; 99 390 1.28 The yield was determined by 1H-NMR. Μη (number average molecular weight) and Mw (weight average molecular weight) are obtained by GPC in terms of polystyrene. In the TOF-MS measurement, the peak value of the molecular weight corresponding to the 2 to 25 polymer was confirmed. (NMR spectrum) The compounds obtained in Examples 1 and 3 were fractionated by fractionation of 158,119.doc -36 to 201217425 by GPC, and ih_Nmr was measured. Synthesis of cyclopenta[2,l-b;3,4-b.]dithiophene Cyclopentadithiophene was synthesized according to the following scheme. [化31]

•2 4 於容量30 mL之2 口燒瓶中放入化合物3(5〇〇 mg,2.6 mmol)及二乙二醇(1〇 mL)(和光純藥工業製造),實施脫氣 而進行氮氣置換,加入肼一水合物(1.3 mL,26 mm〇l)(和 光純藥工業製造)。利用130°C之油浴將其加熱2小時,冷 卻至室溫為止。加入氫氧化鉀,利用18(rc之油浴加熱2小 時,冷卻至室溫為止。於反應混合物中加入水,利用醚進 行萃取,以水洗淨,利用MgS〇4加以乾燥後,藉由過濾而 去除MgS〇4,顧去溶劑,進行真空乾燥。進行利用石夕膠層 析法(溶劑:己烷)之純化,從而獲得化合物4(33〇 mg,產 率 71%) 〇 將結果示於圖1及圖2。圖1係表示實施例丨之化合物之 H-NMR光譜之圖,圖2係表示實施例3之iH_NMR光譜之 圖。各圖,中,η表示聚合度。 由圖1及圖2可明確,與圖2之最上段所示環戊 b1]二噻吩之光譜相比,側鏈之雜環之質子訊號向更高磁場 側位移》其表示複數個雜環堆疊而使π軌道彼此重疊。又 158119.doc -37- 201217425 可知,於末端基為氫原子之實施例3之化合物中,若聚合 度為4以上,則侧鏈之雜環之所有質子之訊號向更高磁場 側位移,因此具有位於兩端之雜環未翻轉而側鏈之所有雜 環彼此整體堆疊而成之結構。 (發光行為) 對以與實施例1相同之方法獲得之化合物之利用紫外線 照射之發光行為進行調查。自於波長38〇 nm處具有峰值之 紫外線光獲得藍色光之波長區域之光譜。 (電化學之行為) &lt;實施例4&gt; 對以與實施例1相同之方法獲得之化合物之循環伏安法 進行測定。測定係對試樣溶液進行丨〇分鐘n2起泡後,於氮 氣流t ’在下述測定條件下進行。 [測定條件] 溶劑:THF ’試樣濃度:〇.〇1 μ(每單體單元)、支援電 解質:(n-Bu)4NCl〇4(TBAP)0.1 Μ 參考電極:Ag/AgCl(sat.KCl)、工作電極:Pt盤(面積: 約0.001 cm2)、相對電極:pt線 掃描速度:100 mVs-1 循環伏安法雖顯示2個氧化波,但未觀測到還原波,且 第2次掃描中未顯示氧化波。然而,若將掃描範圍縮小至 第2氧化波附近,則可觀測到被認為對應第2氧化波之還原 波’若進而重複掃描,則於較起初之氧化還原波更低電位 側觀測到新的氧化還原波。於測定後之作用電極上產生黑 158119.doc -38 - 201217425 色之膜。可認為其原因在於, 子間藉由氧化偶合而彼此交聯 (導電性之評價) 側鏈之雜環於複數個不同分 若於電極間之寬度為5微米之梳型電極上塗佈相對 施例4之化合物而掺雜有5〇%或1〇〇%之對甲苯確暖之^ 樣’並施加80 V之電压,則於5〇%摻雜之試樣中/尚 ΜΧΗΓ7 A之電流,於100%摻雜之試樣中流過叫〇6^ 電流。 ( 本發明之化合物具有側鏈之複數個雜環堆疊而成之社 構’且具有即便末端基為氫原子位於兩端之雜環亦不^ 而進行堆疊之結構,因此具有較先前之側鏈型有機半導體 化合物更高之電荷遷移率。因此可較佳用作有機薄膜電晶 體元件、有機光電轉換元件等之材料,可進一步提高有= 薄膜電晶體元件、有機光電轉換元件等之電氣特性。 又,與先前之主鏈型有機半導體化合物相比,具有對溶 劑更高之溶解性,因此於元件之大面積化等方面有利,可 較佳地用作用以進行實施簡便之塗佈法之塗佈液的材料。 進而,若對本發明之化合物施加較強電場,則可於分子 間相互交聯’因此利用其亦可應用於圖案化。 可將使用本發明之化合物之有機薄膜電晶體元件例如用 作開關元件。若將使用本發明之化合物之有機薄膜電晶體 元件與可利用喷墨法等塗佈法而形成之有機電致發光元件 加以組合’則可利用更為簡便之方法製作電氣特性更為優 異之具有大面積發光區域之裝置例如軟性顯示器。 158119.doc -39- 201217425 【圖式簡單說明】 圖1係表示iH-NMR光譜之圖(1)。 圖2係表示^-NMR光譜之圖(2)。 158119.doc 40-• 2 4 In a two-necked flask of 30 mL, compound 3 (5 〇〇 mg, 2.6 mmol) and diethylene glycol (1 〇 mL) (manufactured by Wako Pure Chemical Industries, Ltd.) were placed and degassed for nitrogen replacement. Add hydrazine monohydrate (1.3 mL, 26 mm 〇l) (manufactured by Wako Pure Chemical Industries, Ltd.). It was heated in an oil bath at 130 ° C for 2 hours and cooled to room temperature. Add potassium hydroxide, heat in an oil bath of 18 (rc for 2 hours, and cool to room temperature. Add water to the reaction mixture, extract with ether, wash with water, dry with MgS〇4, and filter by The MgS〇4 was removed, and the solvent was removed, and vacuum drying was carried out. Purification by using Shiqi gum chromatography (solvent: hexane) was carried out to obtain Compound 4 (33 mg, yield 71%). 1 and Fig. 2. Fig. 1 is a view showing the H-NMR spectrum of the compound of Example ,, and Fig. 2 is a view showing the iH-NMR spectrum of Example 3. In each of the figures, η represents the degree of polymerization. 2 is clear that the proton signal of the heterocyclic ring of the side chain shifts to a higher magnetic field side than the spectrum of the cyclopenta b1]dithiophene shown in the uppermost part of FIG. 2, which means that a plurality of heterocyclic rings are stacked to make π orbital It is also known that, in the compound of Example 3 in which the terminal group is a hydrogen atom, if the degree of polymerization is 4 or more, the signal of all protons of the side chain heterocyclic ring is shifted to the higher magnetic field side. Displacement, thus having a heterocyclic ring at both ends that is not flipped and all of the side chains The structure in which the rings are integrally stacked with each other. (Luminescence behavior) The luminescence behavior of the compound obtained by the same method as in Example 1 by ultraviolet irradiation was investigated. Ultraviolet light having a peak at a wavelength of 38 〇 nm was obtained. Spectrum of the wavelength region (electrochemical behavior) &lt;Example 4&gt; The cyclic voltammetry of the compound obtained in the same manner as in Example 1 was carried out. After the bubble, the nitrogen flow t' was carried out under the following measurement conditions. [Measurement conditions] Solvent: THF 'Sample concentration: 〇.〇1 μ (per monomer unit), supporting electrolyte: (n-Bu) 4NCl〇4 (TBAP)0.1 Μ Reference electrode: Ag/AgCl(sat.KCl), working electrode: Pt disk (area: about 0.001 cm2), opposite electrode: pt line scanning speed: 100 mVs-1 Although cyclic voltammetry shows 2 Oxidation wave, but no reduction wave was observed, and no oxidation wave was observed in the second scan. However, if the scanning range is narrowed to the vicinity of the second oxidation wave, the reduction wave which is considered to correspond to the second oxidation wave can be observed. If the scan is repeated A new redox wave was observed on the lower potential side of the original redox wave. A black film of 158119.doc -38 - 201217425 was produced on the working electrode after the measurement. The reason is that Oxidative coupling and cross-linking with each other (evaluation of conductivity) The heterocyclic ring of the side chain is coated with a compound of the fourth embodiment on a comb-shaped electrode having a width of 5 μm between the electrodes and doped with 5 〇. % or 1%% of the toluene is as warm as '' and applying a voltage of 80 V, then in a 5〇% doped sample / still 7 A current, flowing in a 100% doped sample Called 〇6^ current. (The compound of the present invention has a structure in which a plurality of heterocyclic rings of a side chain are stacked, and has a structure in which a terminal group is a heterocyclic ring in which a hydrogen atom is located at both ends, and is stacked, and thus has a side chain which is earlier than the above. The organic semiconductor compound has a higher charge mobility, and thus can be preferably used as a material for an organic thin film transistor element, an organic photoelectric conversion element, etc., and can further improve electrical characteristics of a thin film transistor element, an organic photoelectric conversion element, and the like. Further, since it has higher solubility in a solvent than the conventional main chain type organic semiconductor compound, it is advantageous in terms of a large area of the element, and can be preferably used as a coating method for carrying out a simple coating method. Further, if a strong electric field is applied to the compound of the present invention, it can be cross-linked to each other between molecules. Therefore, it can also be applied to patterning by using it. For example, an organic thin film transistor element using the compound of the present invention can be used. Used as a switching element. If an organic thin film transistor element using the compound of the present invention is formed by a coating method such as an inkjet method By combining electromechanical light-emitting elements, it is possible to produce a device having a large-area light-emitting area, such as a soft display, which is more excellent in electrical characteristics by a simpler method. 158119.doc -39- 201217425 [Simplified Schematic] FIG. Figure (1) of the iH-NMR spectrum Fig. 2 shows the diagram of the ^-NMR spectrum (2). 158119.doc 40-

Claims (1)

201217425 七、申請專利範圍··201217425 VII. Patent application scope·· 一種化合物,其含有 結構單元之連續單元 [化1] 包含2個以上連續之 式(1)所表示之 R2A compound comprising a continuous unit of a structural unit [Chemical Formula 1] comprising two or more consecutive R2 represented by the formula (1) (穴T, 八’及Ar2分別獨. 八…中至少_^可具有取代基之2價芳香族基,且 她此可相同亦:不:具有取代基之2價雜環一 各個G為直接鍵結或連結基,且各個G彼此可相同亦可 不同》 R及R分別獨立為氫原子或可具有取代基之碳數為 卜20之1價烴基,且R1與r2彼此可相同亦可不同)。 2.如請求項1之化合物’其中上述化合物含有包含2個以上 連續之式(2)所表示之結構單元之連續單元, 158119.doc 201217425[化2] R2(Atoms T, VIII' and Ar2 are respectively independent. At least _^ may have a divalent aromatic group having a substituent, and she may be the same: no: a divalent heterocyclic ring having a substituent - each G is directly Bonding or linking group, and each G may be the same or different from each other. R and R are each independently a hydrogen atom or a monovalent hydrocarbon group having a carbon number of 20, and R1 and r2 may be the same or different. ). 2. The compound of claim 1, wherein the compound contains a contiguous unit comprising two or more consecutive structural units represented by the formula (2), 158119.doc 201217425 [Chemical 2] R2 (2) (式中, Ar1及Ar2分別獨立為可具有取代基之2價芳香族基且 Ar1及Ar2中至少一者為可具有取代基之2價雜環基,Afl 與Ar2彼此可相同亦可不同, R及R ”削蜀立為氫原+或可具有取代基之碳數為 1〜20之1價烴基,且Ri與R2彼此可相同亦可不同)。 3. 如請求項1之化合物,其中Afl及Ar2分別獨立為可具有取 代基之2價之5員環雜環基。 4. 如响求項3之化合物,其中及心2分別獨立為可具有取 代基之伸噻吩基。 5. 如4求項4之化合物,其中上述化合物含有包含2個以上 連績之式(K-1)所表示之結構單元之連續單元, [化3](2) In the formula, Ar1 and Ar2 are each independently a divalent aromatic group which may have a substituent, and at least one of Ar1 and Ar2 is a divalent heterocyclic group which may have a substituent, and Afl and Ar2 may be the same as each other. R and R may be reduced to a hydrogen source + or a monovalent hydrocarbon group having a carbon number of 1 to 20 which may have a substituent, and Ri and R 2 may be the same or different from each other. A compound wherein Afl and Ar2 are each independently a divalent 5-membered ring heterocyclic group which may have a substituent. 4. The compound of claim 3, wherein the core 2 is independently a thienyl group which may have a substituent. 5. The compound of claim 4, wherein the compound contains a continuous unit of a structural unit represented by the formula (K-1) containing two or more consecutive achievements, [Chemical 3] (K- 1) 158119.doc 201217425 T RI、R2、R &quot; 12 基之碟 及R分別獨立為氫原子或可具有取代 灭數為1〜20之1價烴基,丨 可相同亦可不同, ^、妙、及以彼此 R及R14分別獨立為氫原子或可 1〜20之基,Ri3j r14 八 代基之碳數 暴R及尺彼此可相同亦可不同)。 &amp;如請求項5之化合物,其中R,3及r14分別獨 可具有取代基之!價烴基、可具有取代基::子、 或可具有取代基之烴氧基。 基、 7. 一種有機薄膜,其含有如請求項丨之化合物。 158119.doc(K-1) 158119.doc 201217425 T RI, R2, R &quot; 12 base disc and R are each independently a hydrogen atom or a monovalent hydrocarbon group which may have a substitution number of 1 to 20, and may be the same or different. ^, 妙, and R and R14 are each independently a hydrogen atom or a group of 1 to 20, and the carbon number R and the ruler of the Ri3j r14 octabase may be the same or different. And a compound according to claim 5, wherein R, 3 and r14 each independently have a substituent; a valent hydrocarbon group, which may have a substituent: a substituent, or a hydrocarbyloxy group which may have a substituent. Base 7. An organic film containing a compound as claimed. 158119.doc
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