201209190 .六、發明說明： 【發明所屬之技術領域】 [0001] 本發明涉及一種鍍膜件及其製作方法。 [0002] [先前技術] 鋁合金由於其質量輕、散熱性佳、電磁遮罩性好等優點 ，廣泛應用於3C產品、汽車及航空等領域。但鋁合金最 明顯的缺點為耐腐姓差’暴露於自然環境中會引起鋁合 金表面快速腐钮。 ❹ [0003] 提高鋁及其合金耐腐蝕性的—種方法係對其表面進行塗 層處理。傳統的陽極氧化、鉻酸鹽轉化膜及電鍍等處理 鋁及其合金的方法生產工藝複雜、效率低，尤其易造成 嚴重的環境污染。真空鍍臈（PVD)技術廣泛應用於鋁及 其合金的表面處理，但由於壓鑄後的鋁及其合金表面存 在的孔隙缺陷及PVD技術本身的特點，談pvD鍍層不可避 免地存在針孔等一些典型的缺陷，致使其耐腐蝕性能降 低而無法很好地保護鋁及其鋁合金基材。 G [0004] 【發明内容】 有鑒於此，有必要提供一種耐腐蝕性強的鍍祺件。 [0005] 另外，還有必要提供-種工藝簡單的製作上述 方法。 X、件的 [0006] 一種嫂膜件’包括一基材、—形成於基材表面站 ，及一形成於結合層表面的複合層，所述複入層 N層及A卜N層’該Cr-N層及A1_N的層數為多0個層包括Cr〜 Cr-N層A1-N層交替排布。 且讀 099127831 表單編號A0101 第3頁/共1〇頁 〇992〇48898.〇 201209190 [0007] —種鍍膜件的製作方法，其包括如下步驟： [0008] 提供一基材； [0009] 在該基材表面形成一結合層； [0010] 通過磁控濺射在結合層上形成一複合層，該複合層為A1-N層和Cr-N層，該A卜N層及Cr-N層的沉積次數為多次。 [0011] 相較於習知技術，本發明的鍍膜件及其製作方法，先在 基材形成一結合層，再於該結合層上形成一複合層，該 複合層為A1-N層及Cr-N層，且沉積層數為多層。這種結 合形式能有效的打斷膜層的柱狀晶的生長結構，提高了 膜層的緻密性，並且作為中間層的結合層的設置一方面 可增強複合層對基材的附著力，另一方面還能極大地降 低基材與複合層之間的電位差，減緩微電池腐蝕，從而 提南基材的抗腐姓能力。 【實施方式】 [0012] 請參閱圖1，本發明一較佳實施方式的鍍膜件100包括一 基材10及形成於基材10表面的一結合層20和一形成於結 合層20上的複合層30。 [0013] 該基材1 0可為不銹鋼、鋁、鋁合金等金屬材料，也可為 陶瓷、玻璃等非金屬材料，優選為鋁、鋁合金。 [0014] 該結合層2 0為一鋁層，該鋁層以磁控濺射的方式形成於 基材10上。該結合層20的厚度為50~300nm。 [0015] 該複合層30以磁控濺射的方式形成，其包括Cr-N層301 及A1-N層303，該Cr-N層301及A卜N層303的層數為多個 099127831 表單編號A0101 第4頁/共10頁 0992048898-0 201209190 ，且該Cr-N層301及A卜N層303交替排布。本實施例中， 所述Cr-N層301及A卜N層303的層數可分別為6-10層。 該複合層30緻密性高，抗腐蝕能力強。每一Cr-N層301 及每一Al-Ν層303的厚度為40~150nm。 [0016] 可以理解，所述的複合層30中的Cr-N層301及Al-Ν層 303沉積在結合層20上的順序可以相互置換。 [0017] 請參閱圖1，本發明一較佳實施方式的鍍膜件100的製作 方法包括以下步驟：201209190. 6. Description of the Invention: [Technical Field of the Invention] [0001] The present invention relates to a coated member and a method of fabricating the same. [0002] [Prior Art] Aluminum alloys are widely used in 3C products, automobiles, and aviation because of their light weight, good heat dissipation, and good electromagnetic shielding properties. However, the most obvious disadvantage of aluminum alloys is that the corrosion resistance is poor. The exposure to the natural environment causes a rapid decay of the aluminum alloy surface. ❹ [0003] A method to improve the corrosion resistance of aluminum and its alloys is to coat the surface. Conventional anodizing, chromate conversion coatings and electroplating processes such as aluminum and its alloys have complex production processes and low efficiency, and are particularly susceptible to serious environmental pollution. Vacuum rhodium plating (PVD) technology is widely used in the surface treatment of aluminum and its alloys. However, due to the pore defects on the surface of aluminum and its alloys after die casting and the characteristics of PVD technology itself, it is inevitable that there are pinholes and other pvD coatings. Typical defects result in reduced corrosion resistance and poor protection of aluminum and its aluminum alloy substrates. G [0004] SUMMARY OF THE INVENTION In view of the above, it is necessary to provide a rhodium-plated member having high corrosion resistance. [0005] In addition, it is also necessary to provide a simple process for producing the above method. [0006] [0006] A diaphragm member 'comprises a substrate, is formed on a substrate surface station, and a composite layer formed on the surface of the bonding layer, the re-entry layer N layer and the A-N layer' The number of layers of the Cr-N layer and the A1_N is more than 0 layers including Cr~Cr-N layers A1-N layers are alternately arranged. And reading 099127831 Form No. A0101 Page 3 / Total 1 page 〇 992〇48898. 〇 201209190 [0007] A method for fabricating a coated member, comprising the following steps: [0008] providing a substrate; [0009] Forming a bonding layer on the surface of the substrate; [0010] forming a composite layer on the bonding layer by magnetron sputtering, the composite layer being an A1-N layer and a Cr-N layer, the A-N layer and the Cr-N layer The number of depositions is multiple. [0011] Compared with the prior art, the coated member of the present invention and the manufacturing method thereof first form a bonding layer on the substrate, and then form a composite layer on the bonding layer, the composite layer is an A1-N layer and Cr -N layer, and the number of deposited layers is multiple layers. The combination form can effectively break the growth structure of the columnar crystal of the film layer and improve the compactness of the film layer, and the setting of the bonding layer as the intermediate layer can enhance the adhesion of the composite layer to the substrate on the one hand, and On the one hand, it can greatly reduce the potential difference between the substrate and the composite layer, and slow down the corrosion of the microbattery, thereby improving the anti-corruption ability of the substrate. [0012] Referring to FIG. 1, a coated article 100 according to a preferred embodiment of the present invention includes a substrate 10, a bonding layer 20 formed on the surface of the substrate 10, and a composite formed on the bonding layer 20. Layer 30. [0013] The substrate 10 may be a metal material such as stainless steel, aluminum or aluminum alloy, or may be a non-metal material such as ceramic or glass, and is preferably aluminum or aluminum alloy. [0014] The bonding layer 20 is an aluminum layer which is formed on the substrate 10 by magnetron sputtering. The bonding layer 20 has a thickness of 50 to 300 nm. [0015] The composite layer 30 is formed by magnetron sputtering, and includes a Cr-N layer 301 and an A1-N layer 303. The number of layers of the Cr-N layer 301 and the A-N layer 303 is a plurality of 099127831 forms. No. A0101, page 4/10 pages 0992048898-0 201209190, and the Cr-N layer 301 and the A-N layer 303 are alternately arranged. In this embodiment, the number of layers of the Cr-N layer 301 and the A-N layer 303 may be 6-10 layers, respectively. The composite layer 30 has high density and strong corrosion resistance. Each Cr-N layer 301 and each Al-germanium layer 303 has a thickness of 40 to 150 nm. [0016] It can be understood that the order in which the Cr-N layer 301 and the Al-germanium layer 303 in the composite layer 30 are deposited on the bonding layer 20 can be replaced with each other. Referring to FIG. 1, a method for fabricating a coated member 100 according to a preferred embodiment of the present invention includes the following steps:
[0018] 提供一基材10。該基材10可為不銹鋼、鋁、鋁合金等金 屬材料，也可為陶瓷、玻璃等非金屬材料，優選為鋁、 銘合金。 [0019] 對該基材10進行表面預處理。該表面預處理可包括常規 的對基材10進行化學除油、除蠟、酸洗、超聲波清洗及 烘乾等步驟。 [0020] 對經上述處理後的基材10的表面進行氬氣電漿清洗，以 進一步去除基材10表面的油污，以及改善基材10表面與 、後續塗層的結合力。該電漿清洗的具體操作及工藝參數 可為：將基材10放入一磁控濺射鍍膜機（圖未示）的鍍 膜室内，將該鍍膜室抽真空至8. 0x1 0_3Pa，然後向鍍膜 室内通入流量為50〜400sccm (標準狀態毫升/分鐘）的 氬氣（純度為99.999%)，並施加-300~-600¥的偏壓於 基材10，對基材10表面進行電漿清洗，清洗時間為 5〜lOmin。採用磁控濺射法在經電漿清洗後的基材10的 表面濺鍍一結合層20，該結合層20為一金屬鋁層。 099127831 表單編號A0101 第5頁/共10頁 0992048898-0 201209190 [0021] 濺射該結合層20時，開啟一鋁靶的電源，並對該鋁靶施 加-150〜- 500V的偏壓，調節氬氣流量至50〜300sccm， 於經電漿清洗後的基材1 0表面沉積一所述的結合層20。 該結合層20的厚度為50~300nm。 [0022] 形成所述結合層20後，對基材10施加-150〜-500V的偏 壓，向所述鑛膜室内通入流量為10~150sccm的反應氣體 氮氣，調節氬氣的流量為300〜500sccm，交替開啟所述 鋁靶及一鉻靶的電源，於結合層20上沉積Cr-N層301及 A卜N層303，且Cr-N層301及Α[-Ν層303的沉積次數為多 次，該Cr-Ν層301及Α1-Ν層303通過磁控濺射交替沉積形 成，以形成複合層30。交替沉積的次數以6~ 10次為宜。 每一 A1-N層301及每一Cr-N層303的厚度均為40〜150nm 〇 [0023] 可以理解，所述的複合層30中的Cr-N層301及A1-N層 30 3的沉積順序可以相互置換。 [0024] 相較於習知技術，所述的複合層30以Cr-N層303及A1-N 層301交替沉積多層，以克服單一膜層的柱狀晶的生長結 構的缺陷，可有效改善膜層的緻密性；更進一步的，所 述的結合層20的設置一方面可增強複合層30對基材10的 附著力，另一方面還能極大地降低基材10與複合層30之 間的電位差，減缓微電池腐蝕，從而提高了複合層30的 而才腐姓性。 [0025] 應該指出，上述實施方式僅為本發明的較佳實施方式， 本領域技術人員還可在本發明精神内做其他變化。這些 099127831 表單編號A0101 第6頁/共10頁 0992048898-0 201209190 依據本發明精神所做的變化，都應包含在本發明所要求 保護的範圍之内。 【圖式簡單說明】 [0026] 圖1係本發明較佳實施例的鍍膜件的結構示意圖。 【主要元件符號說明】 [0027] 鍍膜件：100 [0028] 基材：10 [0029] 結合層：20 ❹ [0030] 複合層：30 [0031] Cr-N層：301 [0032] A卜N層：303 ❹ 099127831 表單編號A0101 第7頁/共10頁 0992048898-0[0018] A substrate 10 is provided. The substrate 10 may be a metal material such as stainless steel, aluminum or aluminum alloy, or a non-metal material such as ceramic or glass, and is preferably aluminum or alloy. [0019] The substrate 10 is subjected to surface pretreatment. The surface pretreatment can include conventional steps of chemical degreasing, wax removal, pickling, ultrasonic cleaning, and drying of the substrate 10. [0020] The surface of the substrate 10 subjected to the above treatment is subjected to argon plasma cleaning to further remove the oil stain on the surface of the substrate 10, and to improve the bonding force between the surface of the substrate 10 and the subsequent coating. The specific operation and process parameters of the plasma cleaning may be as follows: the substrate 10 is placed in a coating chamber of a magnetron sputtering coating machine (not shown), and the coating chamber is evacuated to 8. 0x1 0_3Pa, and then coated. An indoor argon gas (purity of 99.999%) having a flow rate of 50 to 400 sccm (standard state ML/min) was applied, and a bias of -300 to 600 Å was applied to the substrate 10 to plasma-clean the surface of the substrate 10. The cleaning time is 5~lOmin. A bonding layer 20 is sputtered on the surface of the plasma-treated substrate 10 by magnetron sputtering, and the bonding layer 20 is a metal aluminum layer. 099127831 Form No. A0101 Page 5 / Total 10 Page 0992048898-0 201209190 [0021] When the bonding layer 20 is sputtered, a power source of an aluminum target is turned on, and a bias voltage of -150 〜 500 V is applied to the aluminum target to adjust argon. The gas flow rate is 50 to 300 sccm, and the bonding layer 20 is deposited on the surface of the substrate 10 after plasma cleaning. The bonding layer 20 has a thickness of 50 to 300 nm. [0022] After the bonding layer 20 is formed, a bias voltage of -150 to -500 V is applied to the substrate 10, and a reaction gas nitrogen gas having a flow rate of 10 to 150 sccm is introduced into the film chamber to adjust the flow rate of the argon gas to 300. 〜500sccm, alternately turning on the power source of the aluminum target and a chrome target, depositing a Cr-N layer 301 and an A-N layer 303 on the bonding layer 20, and depositing the Cr-N layer 301 and the Α[-Ν layer 303 For a plurality of times, the Cr-germanium layer 301 and the Α1-Ν layer 303 are alternately deposited by magnetron sputtering to form the composite layer 30. The number of alternate depositions is preferably 6-10 times. The thickness of each of the A1-N layer 301 and each of the Cr-N layers 303 is 40 to 150 nm. [0023] It can be understood that the Cr-N layer 301 and the A1-N layer 30 3 in the composite layer 30 are The deposition order can be replaced with each other. [0024] Compared with the prior art, the composite layer 30 is alternately deposited with a plurality of Cr-N layers 303 and A1-N layers 301 to overcome the defects of the growth structure of the columnar crystals of the single film layer, and can be effectively improved. The denseness of the film layer; further, the arrangement of the bonding layer 20 enhances the adhesion of the composite layer 30 to the substrate 10 on the one hand, and greatly reduces the relationship between the substrate 10 and the composite layer 30 on the other hand. The potential difference slows down the corrosion of the microbattery, thereby increasing the composite layer 30. [0025] It should be noted that the above-described embodiments are merely preferred embodiments of the present invention, and those skilled in the art may make other changes within the spirit of the present invention. These 099127831 Form No. A0101 Page 6 of 10 0992048898-0 201209190 Variations made in accordance with the spirit of the present invention are intended to be included within the scope of the present invention. BRIEF DESCRIPTION OF THE DRAWINGS [0026] FIG. 1 is a schematic view showing the structure of a coated member according to a preferred embodiment of the present invention. [Main component symbol description] [0027] Coating member: 100 [0028] Substrate: 10 [0029] Bonding layer: 20 ❹ [0030] Composite layer: 30 [0031] Cr-N layer: 301 [0032] Ab N Layer: 303 ❹ 099127831 Form No. A0101 Page 7 / Total 10 Page 0992048898-0