201207979 六、發明說明： 【發明所屬之技術領域】 ▲本發明係關於一種晶片輸送機台，尤 能之晶片輸送機台。 曰種具轉向功 【先前技術】 在晶片的製作或檢測的過程中， 送，然而晶片的結構往往較為輕要^曰片進行輸 輸送的過程中發生碰撞，便容易導致晶：本晶片在 例如出現破損、缺角或是肉眼無法辨識二：造成 導致晶片良率的下降。 β 、裂痕，並 請參閱第1圖，係習用之晶片輪 圖所示，晶片輸送機台!。包含有一第一二俯，圖。如 $輸送们3。第—輸送帶η與第二輸送帶^相鄰$第 曰以T第-輸送帶u上的晶片12傳送至第二輸送二’ 設置經常遭遇第—輸送帶u° = 速不同的問題，造成晶片在不同輸送帶Ιί 程序。犯產生震動或移位’進而影響後續的晶片傳送 夺统型t的t片輸送機台10不具備轉向功能，該 測單ί 15:行-個 此晶片輸送機台1。將不敷使用。固维度仏測的而求’則 201207979 【發明内容】 台 尤 2發明之主要目的，在於提供—種晶 指一種具轉向功能之晶片輸送機台。 钱 :發明之另一目的，在於提供一 ί送機台’其主要係以-氣浮式軌道降低晶片之;片 並以-轉向機構_晶片之_角，使其自然轉向^力 本發明之又-目的，在於提供一種具轉向功能之 ==轉::構包含有-柱體，設於軌道之， 輸二;能之“ 式者。 m直你了凋整而配合各種晶片型 本發明之又-目的，在於提供一種具轉向功能之 4含有—制動機構，用以減輕晶片與_ = 輸送又-目的’在於提供—種具轉向功能之晶片 部或側；之出動機構包含有一送風裝置及設置於軌道底 者-。Q之出風口’糟由送風破壞氣臈之平衡而產生阻力 2發明之又一目的’在於提供一種具轉向功能之晶片 =機台，其制動機構包含有-抽氣裝置及設於軌道底部 抽軋口，藉由抽氣破壞氣膜之平衡而產生阻力者。 為達成上述目的，本發明提供一種具轉向功能之 輸运機台’包含有:一軌道，該執道具有一底部及二侧；， 201207979 β底為—平板，平板上設 於該執道之下方，並與各氣孔相連通二:氣广、= 該氣室，並對該氣室進行供氣；及—轉向=早兀，連接 道底部鄰近其中一側壁處 冓於邊執 令該晶片轉向者。 了於4仃進中阻擋其-角而 【貫施方式】201207979 VI. Description of the Invention: [Technical Field of the Invention] ▲ The present invention relates to a wafer transfer machine, and in particular to a wafer transfer machine.转向 具 转向 【 【 【 【 【 【 【 【 【 【 【 【 【 【 【 【 【 【 【 【 【 【 【 【 【 【 【 【 【 【 【 【 【 【 【 【 【 【 【 【 【 【 【 【 【 【 【 【 【 【 【 【 【 【 【 【 【 【 【 【 【 【 【 【 【 【 【 【 【 【 【 【 【 【 【 【 【 【 【 【 【 【 【 【 【 【 【 【 【 【 【 【 【 【 【 【 【 Broken, missing corners or unrecognizable to the naked eye 2: causing a drop in wafer yield. β, crack, and see Figure 1, the wafer wheel shown in the figure, wafer conveyor table! Contains a first two, a picture. Such as $ transporters 3. The first conveyor belt η is adjacent to the second conveyor belt 曰 曰 曰 曰 的 的 晶片 晶片 晶片 晶片 晶片 晶片 晶片 晶片 晶片 晶片 晶片 晶片 晶片 晶片 晶片 晶片 晶片 晶片 晶片 晶片 晶片 晶片 晶片 晶片 晶片 晶片 晶片 晶片 晶片 晶片 晶片 晶片 晶片 晶片 晶片The wafer is in a different conveyor belt Ιί program. The t-sheet conveyor table 10, which generates vibration or displacement, which in turn affects the subsequent wafer transfer, does not have a steering function, and the test order is 155. Will not be used. The invention aims to provide a wafer conveyor table with a steering function. The main purpose of the invention is to provide a wafer conveyor with a steering function. Money: Another purpose of the invention is to provide a splicing machine that is mainly used to reduce the wafer by the air-floating track; the slab of the yoke is turned to the natural angle of the invention. A further object is to provide a steering function with a == turn::the structure comprises a -column, which is arranged on the track, and the second is input; the energy can be "formed." A further object is to provide a 4-bearing-brake mechanism with a steering function for mitigating wafers and _ = transporting again - the purpose is to provide a wafer portion or side having a steering function; the exit mechanism includes a blower And the bottom of the track--Q's air outlet's badness caused by the balance of the air supply and the airflow. 2 Another object of the invention is to provide a wafer with a steering function=machine, the brake mechanism includes - pumping The air device is disposed at the bottom of the track, and the resistance is generated by the air pumping to break the balance of the air film. To achieve the above object, the present invention provides a steering machine having a steering function, comprising: a track, The props have a bottom and Side;, 201207979 β bottom is - flat plate, the plate is placed under the obstruction and connected with each air hole two: gas wide, = the air chamber, and the air supply to the air chamber; and - steering = early兀, the bottom of the connecting channel is adjacent to one of the side walls, and the wafer is commanded by the side to block the angle of the wafer.
體圖及月：第2圖及第3圖，係本發明一較佳實施例之立 二剖面圖。如圖所示’本發明具轉向功能之晶片 == 主=_同機組之間’例如設置於第- 晋is有執道22、一轉向機構24、一氣官 26及一供氣裝置28。 ’ 、其中，該執道22包含有一底部221及一側壁挪。執 ^底部221設有複數個氣孔223，各氣孔挪分別連通該 •軋室26。藉由供氣裝置28持續對氣室26進行供氣，氣體 可通過各氣孔223到執道底部221的表面。當晶片2〇1通 過執道22時，晶片201與執道底部221之間將形成一氣膜 32，令晶片201可於軌道22上以無摩擦力的狀態滑行。 該轉向機構24主要包含有一柱體241，設置於鄰近其 中一側壁225處，可於晶片2〇 J滑行時阻擋其一角，導致 晶片201自然轉向。由於多數晶片2〇1設有導角，具導角 之大小不一，故該轉向機構24之柱體241與側壁225間之 距離係可調整者。 201207979 藉由本發明之轉向機構24,可於系統需要晶片2〇1轉 向時，快速完成轉向的工作。例如晶片2〇1於第一輸送帶 203上完成第一維度的檢測後，可經由具轉向功能之晶片 3送機0 20將晶片201轉向後，傳送至第二輸送帶205 上’再以檢測單元207進行第二維度的檢測。 在本發明之一實施例中，該柱體241可連接有一連桿 245 ’藉由調整連桿245由側壁225伸出之長度而可調整該 柱2 Ml與側壁225之間的距離。此外，尚可於該側壁225Body Figure and Month: Figures 2 and 3 are two cross-sectional views of a preferred embodiment of the present invention. As shown in the figure, the wafer of the present invention having a steering function ==main =_between the units is disposed, for example, in the first stage, a steering mechanism 24, a gas commander 26, and a gas supply unit 28. The road 22 includes a bottom portion 221 and a side wall. The bottom portion 221 is provided with a plurality of air holes 223, and the respective air holes are respectively connected to the rolling chamber 26. The air chamber 26 is continuously supplied with air by the air supply means 28, and the gas can pass through the respective air holes 223 to the surface of the bottom portion 221 of the road. When the wafer 2〇1 passes through the trajectory 22, an air film 32 is formed between the wafer 201 and the ruin bottom 221, so that the wafer 201 can slide on the rail 22 in a frictionless state. The steering mechanism 24 mainly includes a post 241 disposed adjacent one of the side walls 225 to block a corner of the wafer 2 J when it slides, resulting in the wafer 201 naturally turning. Since most wafers 2〇1 are provided with lead angles having different lead angles, the distance between the cylinder 241 and the side wall 225 of the steering mechanism 24 is adjustable. 201207979 With the steering mechanism 24 of the present invention, the steering work can be quickly completed when the system requires wafer 2〇1 steering. For example, after the wafer 2〇1 completes the detection of the first dimension on the first conveyor belt 203, the wafer 201 can be turned to the second conveyor belt 205 via the wafer transfer machine 020 with the steering function, and then transmitted to the second conveyor belt 205. Unit 207 performs a second dimension of detection. In one embodiment of the invention, the post 241 can be coupled to a link 245' to adjust the distance between the post 2 M1 and the side wall 225 by adjusting the length of the link 245 extending from the side wall 225. In addition, it is still available on the side wall 225
開°又凹槽243，可於不使用轉向功能時，將柱體241收 入凹槽243中容置。 請參閱第4圖，係本發明另一實施例之立體示意圖。 =圖所示’本發明具轉向功能之晶片輸送機台40之主要構 坆與第2圖所示實施例大致相同，惟，本實施例尚一 制動機構42。The opening and the recess 243 allow the post 241 to be received in the recess 243 when the steering function is not used. Please refer to FIG. 4, which is a perspective view of another embodiment of the present invention. The main structure of the wafer transfer table 40 having the steering function of the present invention is substantially the same as that of the embodiment shown in Fig. 2, but the brake mechanism 42 is also provided in this embodiment.
伽該制動機構42設置於該執道22上與轉向機構24 並具有一預設距離處。當晶片201因轉向機構24之 ‘而轉向時，可於晶片2〇 1碰撞軌道側壁之前令晶 201的滑行產生阻力，藉以減輕晶片201與側壁225之, 撞。如此，除了可防止晶片2〇1因碰撞而毀損或產生瑕; 之外，尚可減少執道側壁225之磨損而延長其使用壽命 =動機構42可包含有一送風裝置425及複數個制望 鄰近4:槿Γ’制動氣孔421係設於軌道底部22 4向機構24同側的側壁奶處。藉由位於軌道底名 之制動氣孔421喷出較—般氣孔223強的氣流，可4 201207979 晶片201接近制動氣 阻力，藉以減輕晶片2() “㈣氣膜32的平衡而形成 制動氣孔423亦可1置=25的碰撞。 孔423之出口略朝下^ ^執道側壁225上’令制動氣 同方向的氣流破==2=晶片201接近時，藉由不 Μ賴32的平衡而形成阻力。The brake mechanism 42 is disposed on the road 22 and has a predetermined distance from the steering mechanism 24. When the wafer 201 is turned by the steering mechanism 24, the sliding of the crystal 201 can be generated before the wafer 2〇 1 collides with the track sidewall, thereby mitigating the collision between the wafer 201 and the sidewall 225. In this way, in addition to preventing the wafer 2〇1 from being damaged or generating defects due to collision; the wear of the side wall 225 of the road can be reduced to prolong its service life. The moving mechanism 42 can include a blowing device 425 and a plurality of desired neighbors. 4: 槿Γ 'Brake vent 421 is provided at the side wall of the rail at the bottom of the rail 22 to the side of the mechanism 24. By blowing the airflow stronger than the general air hole 223 at the brake air hole 421 at the bottom of the track, the wafer 201 can approach the brake gas resistance, thereby reducing the balance of the wafer 2() "(4) the gas film 32 to form the brake air hole 423. The collision of the hole 423 can be set slightly downward. ^ The side wall 225 of the road is erected to make the airflow in the same direction of the brake gas break ==2=When the wafer 201 is close, the balance is formed by not balancing the 32 resistance.
裝置，配❹純裝置425取代送風 接近時進行:氣制動氣孔421，於晶片-以減輕晶〜壁 當圖，係本發明之動作示意圖。如圖所示， .道22上滑行時，由氣孔223喷出之氣體將 > ’令晶片52之滑行幾乎不具摩擦力。 體24;Γ:晶片52進行轉向時，可將轉向機構24之柱 整連桿並配合晶片52之導角523大小調 52fl\ 度，令該柱體241可抵住晶片52之前緣 行進中的晶片52因前緣521 ―角受阻，並配合慣性的 而自然轉動。當滑動中同時轉動的晶片52鄰近導角 525之部位接近側μ挪日寺，即進人制動機構^之作用範 圍此時’制動機構42可藉由制動氣孔421喷氣或抽氣而 破壞氣膜的平衡，令晶片52的轉動受到阻力，藉以減輕晶 片52與側壁225的碰撞，可防止晶片52目碰撞而受損， 並可延長側壁225的使用壽命。 、 晶片52鄰近導角525之部位與側壁225輕微碰觸後， 201207979 將被側土 225導正方向，並依慣性而繼續往前滑行。此時， f先的前緣521及在下方的導角525已轉而位於上方而 晶片52之轉向動作亦已完成。 ，由亡發明具有轉向功能之晶片輸送機台，可於晶片 的傳送中簡便而快速完成晶片的轉 的轉向機台。 一又置額外 以上所述者，僅為本發明之實施例而已，並非用 =發1!施之範圍，即凡依本發明申請專利範圍所述: 均、特徵、方法及精神所為之均等變化與修韩’ 句應I括於本發明之申請專利範圍内。 【圖式簡單說明】 第1圖：係一習用晶片輸送機台之示意圖。 第2圖：係本發明一較佳實施例之立體圖。 第3圖：係如第2圖所示實施例之局部剖面圖 第4圖：係本發明另—實施例之立體示意圖。 第5圖：係本發明之動作示意圖。 10 1215 20 201 【主要元件符號說明】 晶片輸送機台 日曰日# 13檢測單元具轉向功能之晶片輪送機台 晶片 2的 第一輸送帶 第二輸送帶 第一輸送帶 201207979 205 ^ ^ 地 弟一"料 j 207 檢測單元 22 軌道 221 底部 223 氣孔 225 側壁 24 轉向機構 241 柱體 243 凹槽 245 連桿 26 氣室 28 供氣裝置 32 氣膜 40 具轉向功能之晶片輸送機台 42 制動機構 421 制動氣孔 423 制動氣孔 425 送風/抽氣裝置 52 晶片 521 前緣 523 導角 525 導角The device is equipped with a purging device 425 instead of the air supply. When the air is approaching, the air brake vent 421 is on the wafer to reduce the crystal to the wall. As shown, when the track 22 is slid, the gas ejected by the air holes 223 will >> cause the wafer 52 to slide with little friction. Body 24; Γ: When the wafer 52 is turned, the column of the steering mechanism 24 can be adjusted to 52 fl \ degrees with the lead angle 523 of the wafer 52, so that the column 241 can withstand the leading edge of the wafer 52. The wafer 52 is blocked by the leading edge 521 - angle and naturally rotates in conjunction with inertia. When the wafer 52 that is simultaneously rotated in the sliding is adjacent to the side of the lead angle 525, the side is approached to the side of the temple, that is, the range of the action of the brake mechanism. At this time, the brake mechanism 42 can break the air film by blowing or pumping the brake air hole 421. The balance is such that the rotation of the wafer 52 is resisted, thereby mitigating the collision of the wafer 52 with the sidewall 225, preventing the wafer 52 from colliding and being damaged, and extending the life of the sidewall 225. After the wafer 52 is slightly in contact with the side wall 225 near the lead angle 525, the 201207979 will be guided by the lateral soil 225 and continue to slide forward according to the inertia. At this time, the leading edge 521 of f first and the leading angle 525 at the lower side are turned upward and the steering operation of the wafer 52 is completed. The wafer conveyor table, which has a steering function, has been able to easily and quickly complete the turning of the wafer in the transfer of the wafer. Further, the above is only an embodiment of the present invention, and is not intended to be used in the scope of the invention, which is equivalent to the average, characteristics, methods and spirits. And the syllabus should be included in the scope of the patent application of the present invention. [Simple diagram of the drawing] Fig. 1 is a schematic diagram of a conventional wafer conveyor table. Figure 2 is a perspective view of a preferred embodiment of the present invention. Fig. 3 is a partial cross-sectional view of the embodiment shown in Fig. 2. Fig. 4 is a perspective view showing another embodiment of the present invention. Fig. 5 is a schematic view showing the operation of the present invention. 10 1215 20 201 [Description of main component symbols] Wafer conveyor table 曰日# 13 Detecting unit wafer transfer machine wafer 2 first conveyor belt 2 second conveyor belt 1st conveyor belt 201207979 205 ^ ^弟一"Mat j 207 Detection unit 22 Track 221 Bottom 223 Air hole 225 Side wall 24 Steering mechanism 241 Cylinder 243 Groove 245 Connecting rod 26 Air chamber 28 Air supply device 32 Gas film 40 Wafer conveyor table with steering function 42 Braking Mechanism 421 Brake vent 423 Brake vent 425 Air supply/exhaust device 52 Wafer 521 Leading edge 523 Leading angle 525 Leading angle