201142437 TW6433PX-A1 、 六、發明說明： 【發明所屬之技術領域】 本發明係關於一種圖案化相位延遲膜及其製造方 法，特別是關於-種製造圖案化相位延遲膜的壓印方法。 【先前技術】 將圖案化相位延遲膜應用於液晶顯示器中，觀看者經 由配戴偏光眼鏡可以觀賞到3〇立體影像，這是眾所熟知 ♦的技術並且已有夕種製造圖案化相位延遲膜的方法公開 發表。 在相關技術領域中已存在—些製造圖案化相位延遲 膜的方法，例如美國專利號M24,863揭露-種製作圖案 化相位延遲膜的方法，以及美國專利號6,498,679揭露一 種使用單片相位延遲膜製作的微結構相位差膜。 本發明提供—個彻壓印製造®案化相位延遲膜的 新穎方法。 【發明内容】 本發明係有關於—種圖案化相位延遲膜及其觀造方 法，特別是關於-種製造圖案化相位延遲膜的壓印方法。 根據本毛月之一態樣，係提出一種具備一微結構之圖 案化相位延遲膜’其包括m —相位延遲層位於 =苐土材之上以及一第二基材貼合於該相位延遲層之 上。該相位㈣層包括複數個具有液晶材料之第-相位延 201142437 TW6433PA-A1 遲區錢複數個具有可固化樹脂之第二相位延遲區，，其中 該第一相位延遲區以及該第二相位延遲區係為格栅狀帶形 構彼此間平行交錯，該第一相位延遲區提供一第一相 位延遲，該第二相位延遲區提供一第二相位延遲，且該第 相位延遲與該第二純延遲之差為⑽。。該相位延遲層 之第一區域更提供一配向層，以與該第一區域中之液晶材 料配向。 根據本發明之另一態樣，係提出一種具備一微結構之 圖案化相位延遲膜之製造方法，包括以下步驟。提供一第 -基材。塗佈一可固化樹脂於該第一基材之上。以一預定 圖案壓印該可固化樹脂以形成一圖案化結構，其包括複數 個第-區域以及複數個第二區域，其中該圖案化結構具備 格柵狀帶形結構且該第—區域係為格柵狀凹槽並且與該 第,區域平行交錯。固化該圖案化結構。於該圖案化結構 上形成-配向層。設置一液晶材料於該圖案化結構之該第 一區域内之該配向層上，以與該第二區域共同形成一相位 延遲層。提供-第二基材並貼合該第二基材於該相位延遲 層上。沿該配向詹配向並固化該第一區域中之液晶材料以 形成複數個第一相位延遲區。該第一相位延遲區提供一第 一相位延遲，該第二區域提供一第二相位延遲，該第一相 位延遲與該第二相位延遲之差為18〇。。 根據本發明之又一態樣，該配向層可形成於該第二基 201142437 TW6433PA-A1 1 材上以替換形成於該圖案化結構上。 根據本發明之再一態樣，更包括黏附至少一光學膜至 該圖案化相位延遲膜上，例如，硬塗層（hard-coating film)、 低反射膜（low reflective film)、抗反射膜（anti-reflective film)、和抗眩膜（anti-glaring film)。 根據本發明之更一態樣，該圖案化相位延遲膜可黏附 於一顯示面板上以提供觀賞者一立體影像。 • 為讓本發明之上述内容能更明顯易懂，下文特舉實施 例，並配合所附圖式，以上述實施例與圖示非用以限定本 發明之前提作詳細說明如下： 【實施方式】 本發明所附圖示係用以詳細說明，並非用以限定本發 明内容。BACKGROUND OF THE INVENTION 1. Field of the Invention This invention relates to a patterned phase retardation film and a method of fabricating the same, and more particularly to an imprint method for fabricating a patterned phase retardation film. [Prior Art] A patterned phase retardation film is applied to a liquid crystal display, and a viewer can view a stereoscopic image by wearing polarized glasses, which is a well-known technique and has been used to fabricate a patterned phase retardation film. The method is published. A method of fabricating a patterned phase retardation film, such as the method of making a patterned phase retardation film, and the use of a monolithic phase retardation film, is disclosed in U.S. Patent No. 6,498,679. Fabricated microstructured retardation film. SUMMARY OF THE INVENTION The present invention provides a novel method for the manufacture of a phase retardation film. SUMMARY OF THE INVENTION The present invention relates to a patterned phase retardation film and a method of fabricating the same, and more particularly to an imprint method for fabricating a patterned phase retardation film. According to one aspect of the present invention, a patterned phase retardation film having a microstructure is provided which includes an m-phase retardation layer on top of the 苐 soil and a second substrate affixed to the phase retardation layer. Above. The phase (four) layer includes a plurality of first phase delays 201142437 TW6433PA-A1 having a liquid crystal material, and a plurality of second phase delay regions having a curable resin, wherein the first phase delay region and the second phase delay region The grid-like strips are staggered in parallel with each other, the first phase delay region provides a first phase delay, the second phase delay region provides a second phase delay, and the second phase delay and the second pure delay The difference is (10). . The first region of the phase retardation layer further provides an alignment layer to align with the liquid crystal material in the first region. According to another aspect of the present invention, a method of fabricating a patterned phase retardation film having a microstructure is provided, comprising the following steps. A first substrate is provided. A curable resin is applied over the first substrate. The curable resin is embossed in a predetermined pattern to form a patterned structure including a plurality of first-regions and a plurality of second regions, wherein the patterned structure has a grid-like strip structure and the first region is The grid-like grooves are staggered in parallel with the first region. The patterned structure is cured. An alignment layer is formed on the patterned structure. A liquid crystal material is disposed on the alignment layer in the first region of the patterned structure to form a phase retardation layer together with the second region. A second substrate is provided and bonded to the second substrate on the phase retardation layer. A liquid crystal material in the first region is aligned and cured along the alignment to form a plurality of first phase retardation regions. The first phase delay region provides a first phase delay, the second region provides a second phase delay, and the difference between the first phase delay and the second phase delay is 18 〇. . According to still another aspect of the present invention, the alignment layer may be formed on the second substrate 201142437 TW6433PA-A1 1 material to be formed on the patterned structure. According to still another aspect of the present invention, the method further includes adhering at least one optical film to the patterned phase retardation film, for example, a hard-coating film, a low reflective film, an anti-reflection film ( Anti-reflective film), and anti-glaring film. According to a further aspect of the invention, the patterned phase retardation film can be adhered to a display panel to provide a stereoscopic image of the viewer. In order to make the above description of the present invention more comprehensible, the following detailed description of the embodiments and the accompanying drawings The accompanying drawings are intended to be illustrative and not restrictive.
第一圖係繪不依照本發明一實施例之圖案化相位延 ，膜100之剖面示意圖。該圖案化相位延遲膜刚包括一 第一基材110’ 一相位延遲層135以及一第二基材15〇。相 位延遲層135包括複數個具有液晶材料之第-相位延遲區 140以及複數個具有可固化樹脂之第二相位延遲區120,其 中第相位延遲區140以及第二相位 馳 狀帶形結構且彼此間平行交錯。第—相位延遲區 121之配向層130配向。第-相位延遲 :一 乂供一弟一相位延遲，第二相位延遲區m提供-一相位延遲，且第—相位延遲與第二相錢遲之差為 5 201142437 TW6433PA-A1 180。。 第一基材110與第二基材150可以例如是，聚對苯二 曱酸一乙酉旨（polyethylene terephthalate，PET)、聚碳酸酉旨 (polycarbonate ’ PC)、三醋酸纖維素(triacetyl cellulose， TAC)、t 甲基丙埽酸甲酉旨（p〇iymethyi methacrylate， 本發明之圖案化相位延遲膜之一實施例中，第一基材11〇 與第二基材15〇為相同基材。於另一實施例中，第一基材 110與第二基材150為不同基材，其中採用基材之相位延 遲，厚度，或材料為不同。第一基材11〇與第二基材15〇 的厚度係在30〜300微米（μιη)範圍内。第一基材11〇與第 二基材150的相位延遲係小於9〇。，較佳地第一基材ιι〇 與第二基材150的相位延遲實質為〇。。 相位延遲層135之厚度D1係在〇1〜9·9微米㈣範 圍内’較佳地係在1〜4微米（μηι)範圍内。相位延遲層之厚 度決定於當第-相位延遲區14G具備此厚度時所提供的相 位延遲’例如1/2λ(波長單位）。並且，第-相錢遲區14〇 之相位延遲決定於採狀聚合性液晶材料特性，例如該液 == 的ΓΓ遲以及採用之厚度此些所屬技術領 =中具有心知識者所熟知之特性。於—較佳實施例中， 第一相位延遲區14〇之液晶材料係為RMs 活性液晶元溶液，默克μ科技股份有限剌，m 才目^遲1 14〇之厚度為21微米㈣。第一相位延 區140之個別寬度W1係在 遲 忐棚齙w微未（μηι)範圍内，每 兩個鄰近之第一相位延遲區t卩彳 之間距係在10〜900 201142437 TW6433PA-A1 * 微米（μιη)範圍内’上述寬度W1與間距D2決定於採用之顯 示面板之點距尺寸(pitch size)與觀看距離。例如，於本發明 之圖案化相位延遲膜之一實施例中，應用於一個丨5.6吋之 液晶顯示面板(型號156XW01，友達光電）時，第一相位延 遲區140之個別寬度W1係約為250微米（μιη)。 於本發明之圖案化相位延遲膜之一實施例中，如第1 圖所示，配向層130形成於第一相位延遲區14〇之底部121 以與其中之液晶材料配向。於另一實施例中，如第5圖所 • 示，配向層530形成於第二基材550上，因而當第二基材 550上之配向層53〇貼合於相位延遲層535上之後，第一 相位延遲區540中之液晶材料可沿配向層530配向。 第2圖與第3Α〜3D圖係為本發明之製造方法之一較佳 實施例之示意圖。第2圖係繪示依照本發明一實施例之圖 案化相位延遲膜製造方法之流程圖，第3A至3D圖係繪示 依照本發明一實施例之圖案化相位延遲膜製造方法之步驟 圖。 _ 在步驟S201中，提供一第一基材310。第一基材310 的相位延遲係小於90。，較佳地，第一基材310的相位延遲 實質為0°。第一基材310可以例如是，聚對苯二甲酸二乙 酯 （polyethylene terephthalate，PET)、聚碳酸酯 (polycarbonate，PC)、三醋酸纖維素（triacetyl cellulose， TAC)、聚曱基丙稀酸甲 g旨（poiymethyl methacrylate， 卩^^八）、或環稀烴聚合物((^1〇_〇1成11卩〇1丫11161<，（11〇?)。第 一基材310的厚度係在30〜300微米（μιη)範圍内。 在步驟S202中，如第3Α圖所示，將一可固化樹脂s 7 201142437 TW6433PA-A1 , f 3201塗佈在第一基材310之表面31〇&上。可固化樹脂32〇1 的塗佈方式係為所屬技術領域中具有通常知識者熟知，例 如是狹縫塗佈（die coating)或凹版印刷式塗佈（gravure coating)。可固化樹脂3201可以是紫外線固化樹脂（uv curable resin)或熱固化樹脂（therm〇-curable resin)，例如是 丙烯酸樹脂（aerylie resin)、矽樹脂（silic〇ne)、或聚胺甲酸 酯（polyurethane)。在步驟S203中，以一預定圖案麗印該可 固化樹脂3201以形成一圖案化結構320於第一基材310 上’該圖案化結構320包括複數個第一區域321以及複數 個第二區域322。壓印可由一表面具備一預定圖案的印章 或滚輪實行，於本發明之圖案化相位延遲膜之製造方法之 一實施例中，如第4圖所示’壓印可以由例如是一個模具 滚輪實行。模具滚輪413的表面配置一組浮雕結構413a與 一組凹槽結構413b ’該組浮雕結構413a沿模具滾輪413 的轉動方向延伸。於另一組實施例中，浮雕結構413a的延 伸方向與模具滾輪413的轉動方向為垂直（未於圖中繪示）。 當第一基材310上的可固化樹脂3201經過模具滾輪 413 ’如第3B圖所示，一格柵狀圖案化結構320形成。圖 案化結構320包括複數個第一區域321以及複數個第二區 域322，第一區域321係為格栅狀凹槽並且與該第二區域 322平行交錯。格柵狀凹槽之深度D3與寬度W2以及相鄰 兩個格拇狀凹槽之間距D4的決定方式同前文所述。格柵 狀凹槽之深度D3係在0.1〜9.9微米（μιη)範圍内，格柵狀凹 槽之寬度W2係在10〜900微米（μιη)範圍内，而相鄰兩個 格栅狀凹槽之間距D4係在10〜900微米（μηι)範圍内。 201142437 TW6433PA-A1 , 在步驟S204中，將圖案化結構320固化。固化方式 可以經由例如是紫外線固化或是熱固化完成。 圖案化結構320在步驟S204中固化後，如第3C圖所 示，在步驟S205中，於該圖案化結構32〇的表面上形成一 配向層330。配向層330的形成方式係為所屬技術領域中 具有通常知識者熟知之方法，例如是微刮痕配向 (micro-scratch alignment treatment)、刷磨式配向（rubbing treatment)、光配向（photo-alignment)、二氧化梦蒸著法（si〇2 參 evaporation)、或離子束配向法(i〇I1 beam alignment)。於本 發明之圖案化相位延遲膜之製造方法之另一實施例中，配 向層並不必須形成於圖案化結構320的表面上，如第5圖 所示，配向層可形成於第二基材上再貼合於相位延遲層535 之上。同樣地，配向層形成於第二基材上的方式係為所屬 技術領域中具有通常知識者熟知之製程，例如是微刮痕配 向（micro-scratch alignment treatment)、刷磨式配白 (rubbing treatment)、光配向（ph〇to-alignment)、二氧化石夕蒸 籲著法（Si〇2 evaporation)、或離子束配向法（i〇n alignment)。 在步驟S206中，將一液晶材料設置於圖案化結構3汕 的第一區域321中。液晶材料的設置方式係為所屬技術領 域中具有通常知識者熟知之製程。於本發明之圖案化相位 延遲膜之製造方法之一實施例中，液晶材料的設置方气例 如是狹缝塗佈（die coating)或凹版印刷式塗佈（以的 coating)。於本發明之圖案化相位延遲膜之製造方法之—實 施例中’液晶材料係為聚合性液晶材料，例如是BAsf 9 201142437 TW6433PA-A1 ( , LC242(聚合性液晶雙丙烯酸酯，BASF，德國）和 RMS10-021(光聚合性活性液晶元溶液，默克光電科技股份 有限公司，台灣）。液晶材料可因應後續塗佈需要先混合於 溶劑中，液晶溶液的固含量係在1〇〇/0〜50〇/〇範圍内，較佳 地，液晶溶液的固含量實質約係2〇〇/。。使用之溶劑係為所 屬技術領域中具有通常知識者熟知，例如是丙二醇曱趟醋 酸酯（propylene glycol monomethyl ether acetate，pGMEA) 〇 於本發明之一實施例中，液晶材料根據其固含量以一預定 尽度塗佈於圖案化結構320之整個表面上，因此使得液晶 材料在去除溶劑後具備之厚度可提供一相位延遲，例如是 1/2 λ(波長單位）。接著，液晶材料中之溶劑便以加熱方式 移除，此加熱溫度係為約45°C至100¾範圍内，較佳係為 約50 C至70〇C範圍内。溶劑移除後，液晶材料填滿第一區 域321之格柵狀凹槽以形成一相位延遲層335。於本發明 之圖案化相位延遲膜之製造方法之另一實施例中，液晶材 料可以是無溶劑的，塗佈於圖案化結構320上並填滿第一 區域321，可經由預熱方式利於無溶劑液晶材料之塗佈。 在步驟S207中，提供一第二基材35〇。於本發明之圖 案化相位延遲膜之製造方法之一實施例中，第二基材350 與第-基材310可以是相同的。於另一實施例中，第二基 材350與第一基材31〇可以是不同的，例如，採用的第一 基材與第二基材之相位延遲或材料可以是不同的。在步驟 S208中，加壓貼合第二基材35〇至相位延遲層的表面 ^。在步驟S208加壓貼合第二基材35〇的過程中，在第二 區域322上之液晶材料會被壓入第一區域321或壓出第二 201142437 TW6433PA-A1 ’ 區域322之表面。 於本發明之圖案化相位延遲膜之製造方法之另一實 施例中，第二基材350貼合於具備配向層於其上之相位延 遲層335上。在本實施例中，配向層在貼合之前形成於第 二基材350上（未於圖中繪示）。配向層之形成方式係為所 屬技術領域中具有通常知識者熟知之方法，例如是微刮痕 配向（micro-scratch alignment treatment)、刷磨式配向 (rubbing treatment)、光酋己向（photo-alignment)、二氧4匕石夕蒸 # 著法（Si02 evaporation)、或離子束配向法（ion beam alignment)。在更一實施例中，於一圖案化相位延遲膜中， 可同時在第一區域321之底部與在第二基材上都具備配向 層，前提是此兩個配向層的配向方向實質上係為相同。 當第二基材350在步驟S208中貼合於相位延遲層335 上之後，在步驟S209中，圖案化相位延遲膜300進行一配 向處理以將液晶材料配向。於本發明之圖案化相位延遲膜 之製造方法之一實施例中，液晶材料沿第一區域321底部 _ 之配向層330配向。於本發明之圖案化相位延遲膜之製造 方法之另一實施例中，液晶材料沿第二基材350上之配向 層配向。於本發明之圖案化相位延遲膜之製造方法之更一 實施例中，液晶材料同時沿第一區域321底部上以及第二 基材上之配向層配向。於本發明之圖案化相位延遲膜之製 造方法之一實施例中，採用RM10-021為液晶材料，對液 晶材料加熱之溫度係在約40°C至65°C範圍内，較佳係在約 45C至58C範圍内。於本發明之圖案化相位延遲膜之製造 方法之一較佳實施例中’配向溫度係在約55。(：。 201142437 _ TW6433PA-A1 在步驟S210中，圖案化相位延遲膜3〇〇進行一固化 處理以固化第-區域321 +之液晶材料以形成複數個第一 相位延遲區340。固化處理可以經由例如是紫外線固化或 疋熱固化完成。於本發明之圖案化相位延遲膜之製造方法 之一實施例中，採用RM10-021為液晶材料以形成第一相 位延遲區340,第一相位延遲區34〇之厚度係21微米 (μιη)。因此’如第3D圖所示製造之圖案化相位延遲臈3〇〇， 由於其第二區域322之相位延遲實質為零，第一相位延遲 區340與第二區域322之相位延遲差為18〇。。於本發明之籲 圖案化相位延遲膜之製造方法之另一實施例中，如第5圖 所示，配向層530如前述形成於第二基材55〇上，第一相 位延遲區540與第二區域522之相位延遲差為18〇。。 本發明之圖案化相位延遲膜製造方法可以批次製程 (batch production)或連續製程（c〇ntinu〇us pr〇ducti〇n)實 行。第4圖係繪示依照本發明一實施例之製造圖案化相位 延遲膜連續製程系統示意圖’例如是，捲對捲系統 (roll-to-roll system)。系統400係用以製造本發明之圖案化 _ 相位延遲膜。一第一基材410自一第一滾輪411放捲並傳 送經過一塗佈裝置412以塗佈一可固化樹脂42〇於其上。 接著，以前述之模具滾輪413對可固化樹脂420進行壓印 處理，以形成一具備格栅狀結構之圖案化結構43〇，其包 括複數個第一區域與複數個第二區域，其中第一區域係為 格柵狀凹槽並且與第二區域平行交錯。圖案化結構430接 著經由一固化裝置414進行固化處理，固化裝置414係為 紫外線固化裝置或熱固化襞置◊於本發明之圖案化相位延 12 201142437 TW6433PA-A1 , 遲膜之製造方法之-實施例中，圖案化結構43〇固化後， 於已固化圖案化結構440上形成一配向層（未於圖中繪 示）。接著，經由一液晶塗佈裝置415塗佈一液晶材料至已 固化圖案化結構440上。於本發明之圖案化相位延遲膜之 製造方法之一實施例中’液晶材料與溶劑混合後形成一液 晶材料溶液（光聚合性活性液晶元溶液）並且隨後塗佈至已 固化圖案化結構440之上’接著經由一加熱處理將液晶材 料溶液中之溶劑移除並同時令液晶材料配向。加熱溫度係 #為約45 C至c範圍内，較佳係為約50。匚至70〇c範圍 内。於本發明之另一實施例中，液晶材料可以是無溶劑的 並且經由液晶塗佈裝置415直接塗佈於已固化圖案化結構 440之上。 一第二基材460自一第二滾輪416放捲並經由一層壓 裝置417貼合至已塗佈液晶之圖案化結構45〇之上。於本 發明之實施例中’第一基材460的表面與已塗佈液晶之 圖案化結構450的表面經由層壓裝置417而加壓緊密貼 _ 合，層壓裝置417可以例如是兩個滚輪，貼合的壓力決定 於兩個滾輪之間的距離。於一實施例中，第二基材460貼 合至已具備配向層的已塗佈液晶之圖案化結構45〇之上。 於另一實施例中，配向層於貼合之前形成於第二基材之 上，具備配向層的第二基材加壓貼合於相位延遲層上（未於 圖中繪示）。貼合完成後的層合膜470經過一配向裝置418 以令液晶材料沿配向層配向。於本發明之圖案化相位延遲 膜之製造方法之一實施例中，配向處理的溫度係為約45°c 至l〇〇°C範圍内。於一較佳實施例中，配向溫度係為約5〇。 13 201142437 TW6433PA-A1 ' r 至70°C範圍内。配向完成後，以一液晶固化裝置419固化 液晶材料。固化裝置419是紫外線固化裝置或是熱固化裝 置。完成固化後，如第4圖所示，圖案化相位延遲膜接著 收捲至滾輪411a。 於本發明之一實施例之製造方法製造之圖案化相位 延遲膜表面可再黏附至少一光學膜，例如是硬塗層 (hard-coating film)、低反射膜（l〇w reflective fnm)、抗反射 膜（anti-reflective film)、或抗眩膜(anti-giaring film)，以進 一步提供額外所需的光學特性。 綜上所述，雖然本發明已以實施例揭露如上，然其並 非用以限疋本發明。本發明所屬技術領域中具有通常知識 ，在不脫離本發明之精神和範圍内，當可作各種之更動 :潤飾。因此’本發明之保護範圍當視後附之中請專利 圍所界定者為準。 【圖式簡單說明】 第1圖係繪示依照本發明一實施例之圖案化相位 膜之剖面示意圖。 第2圖係繪示依照本發明一例之圖案化相位 犋製造方法之流程圖。 、 M f 3AJL3D圖係1會示依照本發明—實施例之圖案化 位延遲造方法之步驟圖。 延4圖係繪示依照本發明—實施例之製造圖案化相 避犋製程示意圖。 第5圖係繪示依照本發明另一實施例之圖案化相位 201142437 TW6433PA-A1 * 遲膜之剖面示意圖。 【主要元件符號說明】 100、300、500 :圖案化相位延遲膜 110、310、410 :第一基材 120 :第二相位延遲區 121 :底部 130、330、530 :配向層 135、335、535 :相位延遲層 • 140、340、540 :第一相位延遲區 150、350、460、550 :第二基材 310a :表面 320、430 :圖案化結構 3201、420 :可固化樹脂 321 :第一區域 322 :第二區域 400 :系統 411 :第一滾輪 411a :滾輪 • 412 :塗佈裝置 413 :模具滾輪 413a :浮雕結構 413b :凹槽結構 414 :固化裝置 415 :液晶塗佈裝置 416 :第二滾輪 417 :層壓裝置 418 :配向裝置 419 :液晶固化裝置 15 201142437 TW6433PA-A1 440 已固化圖案化結構 450 已塗佈液晶之圖案化結構 470 層合膜 D1 ： 厚度 D2 ： 間距 D3 ： 深度 D4 ： 間距 W1 ： 寬度 W2 ： 寬度 S201〜S210 :步驟The first figure depicts a schematic cross-sectional view of a film 100 that is not in accordance with an embodiment of the present invention. The patterned phase retardation film has just included a first substrate 110', a phase retardation layer 135, and a second substrate 15A. The phase retardation layer 135 includes a plurality of first-phase retardation regions 140 having a liquid crystal material and a plurality of second phase retardation regions 120 having a curable resin, wherein the first-phase retardation region 140 and the second phase-like strip-shaped structure are between each other Parallel staggered. The alignment layer 130 of the first-phase delay region 121 is aligned. The first-phase delay: one phase delay for one brother, the second phase delay region m provides - one phase delay, and the difference between the first phase delay and the second phase delay is 5 201142437 TW6433PA-A1 180. . The first substrate 110 and the second substrate 150 may be, for example, polyethylene terephthalate (PET), polycarbonate 'PC, triacetyl cellulose, TAC. (p〇iymethyi methacrylate) In one embodiment of the patterned phase retardation film of the present invention, the first substrate 11 and the second substrate 15 are the same substrate. In another embodiment, the first substrate 110 and the second substrate 150 are different substrates, wherein the phase delay, thickness, or material of the substrate is different. The first substrate 11〇 and the second substrate 15〇 The thickness of the first substrate 11 〇 and the second substrate 150 is less than 9 Å. Preferably, the first substrate ι and the second substrate 150 are present in the range of 30 to 300 μm. The phase retardation of the phase retardation layer 135 is in the range of 〇1 to 9·9 micrometers (4), preferably in the range of 1 to 4 micrometers (μηι). The thickness of the phase retardation layer is determined by The phase delay provided when the first-phase retardation region 14G has this thickness is, for example, 1/2λ ( Long unit). Moreover, the phase delay of the 14th phase of the first phase is determined by the characteristics of the polymerized liquid crystal material, such as the delay of the liquid == and the thickness of the technology. The well-known characteristics. In the preferred embodiment, the liquid crystal material of the first phase retardation region 14 is a solution of RMs active liquid crystal element, and the thickness of the Merck μ technology is limited. 21 micrometers (four). The individual width W1 of the first phase extension region 140 is in the range of the late 忐 微 微 micro micro (μηι), and the distance between each two adjacent first phase delay regions t 系 is between 10 and 900 201142437 TW6433PA-A1 * The width W1 and the pitch D2 in the range of micrometers (μιη) are determined by the pitch size and viewing distance of the display panel used. For example, one embodiment of the patterned phase retardation film of the present invention When applied to a 丨5.6” liquid crystal display panel (Model 156XW01, AU Optronics), the individual width W1 of the first phase retardation region 140 is about 250 micrometers (μιη). In the patterned phase retardation film of the present invention In an embodiment, As shown in Fig. 1, the alignment layer 130 is formed at the bottom 121 of the first phase retardation region 14A to align with the liquid crystal material therein. In another embodiment, as shown in Fig. 5, the alignment layer 530 is formed on On the second substrate 550, the liquid crystal material in the first phase retardation region 540 can be aligned along the alignment layer 530 after the alignment layer 53 on the second substrate 550 is attached to the phase retardation layer 535. Fig. 2 and Figs. 3D to 3D are schematic views of a preferred embodiment of the manufacturing method of the present invention. 2 is a flow chart showing a method of fabricating a phase retardation film according to an embodiment of the present invention, and FIGS. 3A to 3D are process diagrams showing a method of fabricating a patterned phase retardation film according to an embodiment of the present invention. _ In step S201, a first substrate 310 is provided. The phase retardation of the first substrate 310 is less than 90. Preferably, the phase retardation of the first substrate 310 is substantially 0°. The first substrate 310 may be, for example, polyethylene terephthalate (PET), polycarbonate (PC), triacetyl cellulose (TAC), polyacrylic acid A poisy methacrylate (poiymethyl methacrylate) or a cycloaliphatic polymer ((1〇1〇11成11卩〇1丫11161<,11〇?). The thickness of the first substrate 310 is In the range of 30 to 300 μm, in step S202, as shown in Fig. 3, a curable resin s 7 201142437 TW6433PA-A1 , f 3201 is coated on the surface of the first substrate 310 31 〇 & The coating method of the curable resin 32〇1 is well known to those of ordinary skill in the art, such as die coating or gravure coating. Curable resin 3201 It may be a uv curable resin or a thermo 〇-curable resin, for example, an acerlie resin, a silica resin, or a polyurethane. In step S203, the color is printed in a predetermined pattern. The resin 3201 forms a patterned structure 320 on the first substrate 310. The patterned structure 320 includes a plurality of first regions 321 and a plurality of second regions 322. The stamp can be stamped or rolled by a surface having a predetermined pattern. In an embodiment of the method for fabricating a patterned phase retardation film of the present invention, as shown in Fig. 4, the imprint may be performed by, for example, a mold roller. The surface of the mold roller 413 is provided with a set of relief structures 413a and A set of groove structures 413b' the set of relief structures 413a extend in the direction of rotation of the mold roller 413. In another set of embodiments, the direction of extension of the relief structure 413a is perpendicular to the direction of rotation of the mold roller 413 (not shown in the figure) When the curable resin 3201 on the first substrate 310 passes through the mold roller 413' as shown in Fig. 3B, a grid-like patterning structure 320 is formed. The patterning structure 320 includes a plurality of first regions 321 and plural a second region 322, the first region 321 is a grid-like groove and is staggered in parallel with the second region 322. The depth D3 and the width W2 of the grid-like groove and the adjacent two lattice shapes The distance between the grooves is determined in the same manner as described above. The depth D3 of the grid-like grooves is in the range of 0.1 to 9.9 micrometers, and the width W2 of the grid-like grooves is in the range of 10 to 900 micrometers. The distance between adjacent two grid-like grooves is in the range of 10 to 900 micrometers (μηι). 201142437 TW6433PA-A1, in step S204, the patterned structure 320 is cured. The curing method can be accomplished, for example, by ultraviolet curing or heat curing. After the patterned structure 320 is cured in step S204, as shown in FIG. 3C, in step S205, an alignment layer 330 is formed on the surface of the patterned structure 32A. The formation of the alignment layer 330 is a method well known to those skilled in the art, such as micro-scratch alignment treatment, rubbing treatment, photo-alignment. , Dioxide dream evaporation method (si〇2 reference evaporation), or ion beam alignment method (i〇I1 beam alignment). In another embodiment of the method for fabricating a patterned phase retardation film of the present invention, the alignment layer does not have to be formed on the surface of the patterned structure 320. As shown in FIG. 5, the alignment layer may be formed on the second substrate. The upper layer is further attached to the phase retardation layer 535. Similarly, the manner in which the alignment layer is formed on the second substrate is a process well known to those skilled in the art, such as micro-scratch alignment treatment, rubbing treatment. ), ph〇to-alignment, dioxide dioxide (Si〇2 evaporation), or ion beam alignment (i〇n alignment). In step S206, a liquid crystal material is disposed in the first region 321 of the patterned structure 3A. The manner in which the liquid crystal material is disposed is a process well known to those skilled in the art. In one embodiment of the method for producing a patterned phase retardation film of the present invention, the gas-setting material is, for example, a die coating or a gravure coating. In the embodiment of the method for producing a patterned phase retardation film of the present invention, the liquid crystal material is a polymerizable liquid crystal material, for example, BAsf 9 201142437 TW6433PA-A1 ( , LC242 (Polymerized Liquid Crystal Diacrylate, BASF, Germany). And RMS10-021 (photopolymerizable active liquid crystal element solution, Merck Optoelectronics Technology Co., Ltd., Taiwan). The liquid crystal material can be mixed in the solvent according to the subsequent coating, and the solid content of the liquid crystal solution is 1〇〇/0. Preferably, the solids content of the liquid crystal solution is about 2 Å. The solvent used is well known to those of ordinary skill in the art, for example, propylene glycol oxime acetate (propylene). Glycol monomethyl ether acetate, pGMEA) In one embodiment of the present invention, the liquid crystal material is applied to the entire surface of the patterned structure 320 according to its solid content at a predetermined degree, thereby allowing the liquid crystal material to be provided after the solvent is removed. The thickness provides a phase retardation, for example 1/2 λ (wavelength unit). Then, the solvent in the liquid crystal material is removed by heating, the heating temperature It is in the range of about 45 ° C to 100 3⁄4, preferably in the range of about 50 C to 70 ° C. After the solvent is removed, the liquid crystal material fills the grid-like grooves of the first region 321 to form a phase retardation layer 335. In another embodiment of the method for fabricating a patterned phase retardation film of the present invention, the liquid crystal material may be solvent-free, coated on the patterned structure 320 and filled with the first region 321 , which may be facilitated by preheating. Coating of a solventless liquid crystal material. In step S207, a second substrate 35 is provided. In one embodiment of the method for fabricating a patterned phase retardation film of the present invention, the second substrate 350 and the first substrate 310 may be the same. In another embodiment, the second substrate 350 and the first substrate 31 may be different, for example, the phase delay of the first substrate and the second substrate may be used or the material may be In step S208, the second substrate 35 is press-bonded to the surface of the phase retardation layer. In the process of press-fitting the second substrate 35A in step S208, on the second region 322. The liquid crystal material will be pressed into the first region 321 or pressed out of the second 201142437 TW6433PA-A1 The surface of the region 322. In another embodiment of the method of fabricating the patterned phase retardation film of the present invention, the second substrate 350 is bonded to the phase retardation layer 335 having the alignment layer thereon. The alignment layer is formed on the second substrate 350 prior to bonding (not shown). The alignment layer is formed by methods well known to those skilled in the art, such as micro-scratch alignment. (micro-scratch alignment treatment), rubbing treatment, photo-alignment, dioxin, SiO2 evaporation, or ion beam alignment Alignment). In a further embodiment, in a patterned phase retardation film, an alignment layer may be provided on both the bottom of the first region 321 and the second substrate at the same time, provided that the alignment directions of the two alignment layers are substantially For the same. After the second substrate 350 is attached to the phase retardation layer 335 in step S208, the patterned phase retardation film 300 performs an alignment process to align the liquid crystal material in step S209. In one embodiment of the method of fabricating a patterned phase retardation film of the present invention, the liquid crystal material is aligned along the alignment layer 330 at the bottom of the first region 321 . In another embodiment of the method of fabricating a patterned phase retardation film of the present invention, the liquid crystal material is aligned along an alignment layer on the second substrate 350. In still another embodiment of the method of fabricating a patterned phase retardation film of the present invention, the liquid crystal material is simultaneously aligned along the bottom of the first region 321 and the alignment layer on the second substrate. In one embodiment of the method for fabricating a patterned phase retardation film of the present invention, RM10-021 is used as the liquid crystal material, and the temperature for heating the liquid crystal material is in the range of about 40 ° C to 65 ° C, preferably about 45C to 58C. In a preferred embodiment of the method of fabricating a patterned phase retardation film of the present invention, the 'alignment temperature is about 55. (: 201142437 _ TW6433PA-A1 In step S210, the patterned phase retardation film 3 is subjected to a curing process to cure the liquid crystal material of the first region 321 + to form a plurality of first phase retardation regions 340. The curing process may be performed via For example, ultraviolet curing or heat curing is completed. In one embodiment of the method for fabricating a patterned phase retardation film of the present invention, RM10-021 is used as a liquid crystal material to form a first phase retardation region 340, and the first phase retardation region 34 is formed. The thickness of the crucible is 21 micrometers (μιη). Therefore, the patterned phase retardation 制造3〇〇 fabricated as shown in Fig. 3D, since the phase retardation of the second region 322 is substantially zero, the first phase retardation region 340 and the first The phase difference of the two regions 322 is 18 〇. In another embodiment of the method for fabricating the patterned phase retardation film of the present invention, as shown in FIG. 5, the alignment layer 530 is formed on the second substrate as described above. At 55 ,, the phase delay difference between the first phase delay region 540 and the second region 522 is 18 〇. The method for fabricating the patterned phase retardation film of the present invention can be batch production or continuous process (c〇nti). 〇 实行 实行 ) ) ) 。 。 第 第 第 第 第 第 第 第 第 第 第 第 第 第 第 第 第 第 第 第 第 第 第 第 第 第 第 第 第 第 第 第 第 第 第 示意图 示意图 示意图 示意图 示意图 示意图 示意图 示意图 示意图 示意图 示意图The system 400 is used to fabricate the patterned _ phase retardation film of the present invention. A first substrate 410 is unwound from a first roller 411 and conveyed through a coating device 412 to coat a curable resin 42. Then, the curable resin 420 is embossed by the aforementioned mold roller 413 to form a patterned structure 43〇 having a grid-like structure, which includes a plurality of first regions and a plurality of second regions, wherein The first region is a grid-like groove and is staggered in parallel with the second region. The patterned structure 430 is then cured by a curing device 414, which is an ultraviolet curing device or a heat curing device. Patterned phase extension 12 201142437 TW6433PA-A1 , Method for manufacturing late film - In the embodiment, after the patterned structure 43 is cured, an alignment layer is formed on the cured patterned structure 440 (not shown) Next, a liquid crystal material is applied to the cured patterned structure 440 via a liquid crystal coating device 415. In one embodiment of the method for fabricating the patterned phase retardation film of the present invention, the liquid crystal material is mixed with a solvent to form a liquid crystal. A material solution (photopolymerizable active mesogen solution) and then applied onto the cured patterned structure 440' then removes the solvent in the liquid crystal material solution via a heat treatment while aligning the liquid crystal material. Heating temperature system# It is in the range of about 45 C to c, preferably about 50.匚 to 70〇c. In another embodiment of the invention, the liquid crystal material may be solvent free and applied directly onto the cured patterned structure 440 via liquid crystal coating apparatus 415. A second substrate 460 is unwound from a second roller 416 and attached to the patterned liquid crystal patterned structure 45 via a laminating device 417. In the embodiment of the present invention, the surface of the first substrate 460 and the surface of the liquid crystal-patterned structure 450 are pressed and adhered via the laminating device 417, and the laminating device 417 may be, for example, two rollers. The pressure of the fit is determined by the distance between the two rollers. In one embodiment, the second substrate 460 is attached to the patterned structure 45〇 of the coated liquid crystal that already has the alignment layer. In another embodiment, the alignment layer is formed on the second substrate prior to bonding, and the second substrate having the alignment layer is press-fitted to the phase retardation layer (not shown). The laminated film 470 after the bonding is completed passes through an alignment device 418 to align the liquid crystal material along the alignment layer. In one embodiment of the method of fabricating a patterned phase retardation film of the present invention, the temperature of the alignment treatment is in the range of from about 45 ° C to about 10 ° C. In a preferred embodiment, the alignment temperature is about 5 Torr. 13 201142437 TW6433PA-A1 ' r to 70 ° C range. After the alignment is completed, the liquid crystal material is cured by a liquid crystal curing device 419. The curing device 419 is an ultraviolet curing device or a heat curing device. After the curing is completed, as shown in Fig. 4, the patterned phase retardation film is then wound up to the roller 411a. The surface of the patterned phase retardation film manufactured by the manufacturing method of one embodiment of the present invention may re-attach at least one optical film, such as a hard-coating film, a low-reflection film (l〇w reflective fnm), and an anti-reflection film. An anti-reflective film, or an anti-giaring film, further provides additional desired optical properties. In summary, although the present invention has been disclosed above by way of example, it is not intended to limit the invention. There is a general knowledge in the art to which the invention pertains, and various modifications can be made without departing from the spirit and scope of the invention: retouching. Therefore, the scope of protection of the present invention is subject to the definition of patent enclosure. BRIEF DESCRIPTION OF THE DRAWINGS Fig. 1 is a schematic cross-sectional view showing a patterned phase film according to an embodiment of the present invention. Figure 2 is a flow chart showing a method of fabricating a patterned phase 依照 according to an example of the present invention. The M f 3AJL3D system 1 will show a step diagram of the patterning delay manufacturing method in accordance with the present invention. The Fig. 4 is a schematic view showing the process of fabricating a patterned phase avoidance process in accordance with the present invention. FIG. 5 is a schematic cross-sectional view showing a patterned film according to another embodiment of the present invention; 201142437 TW6433PA-A1. [Main Element Symbol Description] 100, 300, 500: Patterned Phase Delay Films 110, 310, 410: First Substrate 120: Second Phase Delay Region 121: Bottom 130, 330, 530: Alignment Layers 135, 335, 535 : Phase retardation layer • 140, 340, 540: first phase retardation region 150, 350, 460, 550: second substrate 310a: surface 320, 430: patterned structure 3201, 420: curable resin 321 : first region 322: second area 400: system 411: first roller 411a: roller • 412: coating device 413: mold roller 413a: relief structure 413b: groove structure 414: curing device 415: liquid crystal coating device 416: second roller 417: laminating device 418: alignment device 419: liquid crystal curing device 15 201142437 TW6433PA-A1 440 cured patterned structure 450 patterned structure of coated liquid crystal 470 laminated film D1: thickness D2: pitch D3: depth D4: pitch W1 : Width W2 : Width S201 ~ S210 : Step
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