TW201141526A - Bubble facial mask - Google Patents

Bubble facial mask Download PDF

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Publication number
TW201141526A
TW201141526A TW99117158A TW99117158A TW201141526A TW 201141526 A TW201141526 A TW 201141526A TW 99117158 A TW99117158 A TW 99117158A TW 99117158 A TW99117158 A TW 99117158A TW 201141526 A TW201141526 A TW 201141526A
Authority
TW
Taiwan
Prior art keywords
bubble
skin
foaming
mask
pores
Prior art date
Application number
TW99117158A
Other languages
Chinese (zh)
Inventor
Hong-Lin Chen
Original Assignee
Tci Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tci Co Ltd filed Critical Tci Co Ltd
Priority to TW99117158A priority Critical patent/TW201141526A/en
Publication of TW201141526A publication Critical patent/TW201141526A/en

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Abstract

The present invention discloses a bubble facial mask, which contains a foaming component (e.g. ethyl perfluorobutyl ether) and an effective ingredient. By massaging, scrubbing and cleansing the face after foaming the mask, purposes of cleaning pores, promoting horn metabolism, and activating skin can be achieved. Also, the mask can perform deep cleansing for the skin and help absorb effective ingredients.

Description

201141526 六、發明說明: 【發明所屬之技術領域】 ^發明是有關於一種泡泡面膜’特別是能深層清 為肌膚毛孔並提升效性成份之吸收。 【先前技術】 從皮膚生理學來看,不管膚質是屬於乾性、油性、 =是混合性,無論化妝或不化妝,皮膚裡的皮脂 脲無時無刻在分泌油脂,只是量的多寡不同。就算足 戶•或住在空氣清潔’―點污染也沒有的深山裡, 二::膚接觸到髒空氣、灰塵或化妝,這些污垢和彩 妝就會和臉上的油脂一塊附著在皮膚表面,或阻塞毛 ^。’而臉部清潔正是把這些辦東西徹底去除的必要程 ::::多上班族在下班後都懶得仔細清潔肌膚, c潔動作,因此市面上不斷出現標榜容 f,㈣潔淨的各式清潔保養品、洗斂水等潔膚 ,但這些肌膚潔淨產品都需要以清水多次沖洗才 洗乾淨’且未能達到清潔肌膚、去除老 ::3作::更別說替肌膚做深層之清潔,而肌膚 未焚元整之清潔或去# 大打折扣。 Ί售肖質’效性成份之吸收便 之,之各項問題,為了能夠兼顧解決 ί 研究開發與諸多實務經驗,提 時深層潔淨肌膚及去角質,以 作為改善上述缺點之實現方式與依據。 201141526 【發明内容】 有鑑於此,本發明之目㈣是在提供 膜,以解決習知技藝之各項問題。 種泡泡面 根據本發明之目的,提出-種泡泡面nu 包成份及-效性成份,當泡泡面膜塗抹於臉= /刀發泡後,經按摩搓洗即可達到潔淨毛孔、代 及活化肌膚之功效。 。角貝201141526 VI. Description of the invention: [Technical field to which the invention pertains] The invention relates to a bubble mask which is particularly capable of deepening the pores of the skin and enhancing the absorption of the effective ingredients. [Prior Art] From the viewpoint of skin physiology, regardless of whether the skin type is dry, oily, or mixed, the sebum urea in the skin is secreted at all times, regardless of makeup or no makeup, but the amount is different. Even if you are in a household or live in a clean mountain where there is no air pollution, 2: The skin is exposed to dirty air, dust or makeup, and these dirt and makeup will adhere to the skin surface with the oil on your face, or Blocking hair ^. 'And face cleaning is the necessary process to completely remove these things:::: Many office workers are too lazy to clean the skin after work, c clean action, so the market continues to appear as a standard f, (four) clean all kinds Cleansing and skin care products, washing and soaking water, etc., but these skin cleansing products need to be rinsed with water several times to clean it's and can't reach clean skin, remove old::3:: let alone deepen the skin. Clean, and the skin is not burned, clean or go to #大打. In order to improve the absorption of the efficacious ingredients, in order to solve the problem, research and development and many practical experiences, we will thoroughly cleanse the skin and exfoliate as a way to improve the above-mentioned shortcomings. SUMMARY OF THE INVENTION In view of the above, the object (4) of the present invention is to provide a film to solve various problems of the prior art. According to the object of the present invention, a bubble face nu package component and a -effect component are proposed. When the bubble mask is applied to the face = / knife foaming, the massage can be washed to achieve clean pores and replace Revitalizes the skin. . Horn

而此泡泡面膜之效性成份可以依照不同之 求提供美白、保濕、潔淨或抗菌等功效。 。°泝 且使用者肌膚經過細微氣泡帶走二氧化碳並 新鮮氧氣,可幫助膚質氣體交換以達淨化肌膚、清ς 毛孔底層及去除角質皮脂,進而幫助效性成份之吸 收,以增加產品之功效訴求。 【實施方式】 為讓本發明之上述目的、特徵和優點更明顯易 懂’以下特舉依本發明之泡泡面膜之較佳實施例做詳 細說明如下。 此泡泡面膜包含一發泡成份及一效性成份,當塗 抹於臉部充分發泡後,經按摩搓洗後即可達到潔淨毛 孔、代謝角質及活化肌膚之訴求。 其中該發泡成份係為Ethyl Perfluorobutyl Ether, EthylPerfluorobutylEther揮發性強,氣體溶解度高, 當氣泡破裂時會掉落到肌膚的表面,會產生溫化的剎 激,幫助肌膚裡的老廢角質剝落,增強洗淨效果,可 [S3 4 201141526 做深層…冻,具有氣泡按摩效果。可幫助肌膚呼吸, 去=因為環境所產生的髒污,提供肌膚氧氣去除二氧 化碳,進行類似呼吸作用的效果,已達到淨化肌 功能。The effective ingredients of this bubble mask can provide whitening, moisturizing, cleansing or antibacterial effects according to different requirements. . °The user's skin takes away carbon dioxide and fresh oxygen through the tiny bubbles, which can help the skin to exchange gas to purify the skin, clear the pores and remove the horny sebum, and then help the absorption of the effective ingredients to increase the efficacy of the product. . BEST MODE FOR CARRYING OUT THE INVENTION The above-described objects, features and advantages of the present invention are more apparent and understood. The following detailed description of the preferred embodiment of the bubble mask of the present invention is as follows. This bubble mask contains a foaming ingredient and an effective ingredient. When applied to the face, it is fully foamed and massaged to achieve cleansing pores, metabolic keratin and skin revitalization. The foaming component is Ethyl Perfluorobutyl Ether, EthylPerfluorobutylEther has high volatility and high gas solubility. When the bubble bursts, it will fall to the surface of the skin, which will generate a warming brake to help the old dead skin cells in the skin to peel off and strengthen. Washing effect, can be [S3 4 201141526 to do deep ... frozen, with a bubble massage effect. It can help the skin to breathe. It is because of the dirt generated by the environment, providing oxygen to the skin to remove carbon dioxide and performing a respiratory-like effect.

此内容物為液態型式,不需使用加壓之氣動瓶器 2^使用般之瓶态即可,由於其發泡成份接觸到 氣ρ θ產生作用,所以自材料混合至裝瓶過程必須 為密閉狀態,儘可能減少與空氣接觸的機會,且製作 及運,過程中應保持在攝氏20〜25t環境不,以避免長 時^溫環境造成内容物受熱仙造仙容物 況發头。 丨月 口少欠2 臈之效性成份可以依照一般市售保養 扣之各種功效訴求選擇其效性成份。 取 Ethyl Perflu〇r〇butyl mher3〇 :2,升、虎耳草萃取物2◦毫升及蘆蒼萃取物每3〇卒: :俾:混合即為1〇0毫升之泡泡面膜内容物,且可 捻保濕、吳白、鎮靜、抗發炎等功效訴求。 可.篆il此ΐ泡面膜除了作為肌膚之保養用品外,更 ;肌膚美容或藥妝用品之相關域 配方做更多元之組合即可展現更廣泛=效訴、;針對 脫離:口性,而非為限制性者。任何未 變更,均應 201141526 【圖式簡單說明】 無The content is a liquid type, and it is not necessary to use a pressurized pneumatic bottle device. The bottle is in a state of being used. Since the foaming component is in contact with the gas ρ θ, the process from the mixing of the material to the bottling process must be sealed. State, to minimize the chance of contact with the air, and to make and transport, the process should be kept at 20 ~ 25t Celsius, in order to avoid the long-term temperature environment caused by the contents of the material. The effective ingredients of the 丨 口 口 2 2 可以 可以 可以 可以 可以 可以 可以 可以 可以 可以 可以 可以 。 。 。 。 。 。 。 。 。 。 。 。 Take Ethyl Perflu〇r〇butyl mher3〇: 2, liter, saxifrage extract 2 ml and reed extract every 3 :: :俾: Mix is 1 〇 0 ml of bubble mask contents, and It can be used for moisturizing, Wu Bai, calming, anti-inflammatory and other effects. Yes. 篆il This foam mask is not only used as a skin care product, but also a combination of skin beauty or cosmeceutical products. Not a restrictive one. Any changes that have not been made shall be 201141526 [Simple description of the diagram] None

【主要元件符號說明】 無[Main component symbol description] None

Claims (1)

201141526 七、申請專利範圍: 1· 一種泡泡面膜,其包含一發泡成份及一效性成份,當 塗抹於臉部充分發泡後,經按摩搓洗即可達到潔淨毛 孔、代謝角質及活化肌膚。 2. 如申請專利範圍第1項所述之泡泡面膜,其發泡成份 為 Ethyl Perfluorobutyl Ether,該 Ethyl Perfluorobutyl Ether揮發性強,具起泡作用及其氣體溶解度高。201141526 VII, the scope of application for patents: 1 · A bubble mask, which contains a foaming ingredient and a one-effect ingredient, when applied to the face to fully foam, massage to achieve clean pores, metabolic keratin and activate skin . 2. The bubble mask according to claim 1 of the patent application, wherein the foaming component is Ethyl Perfluorobutyl Ether, the Ethyl Perfluorobutyl Ether is highly volatile, has a foaming effect and has high gas solubility. 3. 如申請專利範圍第1項所述之泡泡面膜,其效性成份 為一般市售保養用品各種功效訴求之效性成份,該效 性成份可以以美白、保濕、潔淨、抗菌為訴求, 縷莓萃取物、虎耳草萃取物及蘆薈萃取物…等作 效性成份。 ’ 如申請專利範圍第2項所述之泡泡面膜,其發泡成份 於製作及運送過程需維持於攝氏2〇〜2yc環境下,以 避免長時間高溫造成發泡成份受熱作用產生氣體, 成内容物外漏之發生。 & 5. =請專職圍第2項所叙泡泡㈣,其發泡 亡,泡產生細微氣泡後,該細微氣泡接觸肌膚會 碳ΐ提供新鮮氧氣’幫助膚質氣體交換二達淨 份之1收理毛孔底層、去除肖質皮脂絲助效性成 膜,其内容物不 :=即可’當内容物擠出並接觸到空氣便4: 7· ΐΓί專利範圍第1項所述之泡泡面膜,其可作A 養用品’也可運用於肌膚美容或藥妝用品Hjj 201141526 領域。3. For the bubble mask mentioned in the first paragraph of the patent application, the effective ingredient is the effective ingredient of various functions of the general maintenance and maintenance products, and the effective ingredient can be whitened, moisturized, cleaned and antibacterial. Efficacy ingredients such as raspberry extract, saxifrage extract and aloe extract. ' As in the bubble mask mentioned in the second paragraph of the patent application, the foaming component should be maintained in the environment of 2〇~2yc during the production and transportation process to avoid the prolonged high temperature causing the foaming component to be heated to generate gas. The occurrence of content leakage. & 5. = Please refer to the bubble (4) mentioned in item 2 of the full-time, the foaming is dead, the bubble will produce fine bubbles, the fine bubble will contact the skin, the carbon will provide fresh oxygen, help the skin gas exchange, the net 1 The bottom layer of the pores is removed, and the protective film of the cholesteric sebum is removed. The content of the pores is not: = can be 'when the contents are extruded and exposed to the air 4: 7 · ΐΓί Soaking mask, which can be used as a nourishing product, can also be applied to the field of skin beauty or cosmeceutical products Hjj 201141526.
TW99117158A 2010-05-28 2010-05-28 Bubble facial mask TW201141526A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
TW99117158A TW201141526A (en) 2010-05-28 2010-05-28 Bubble facial mask

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Application Number Priority Date Filing Date Title
TW99117158A TW201141526A (en) 2010-05-28 2010-05-28 Bubble facial mask

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN104586741A (en) * 2015-02-05 2015-05-06 上海昊淼生物科技有限公司 Bubble enzyme facial mask

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN104586741A (en) * 2015-02-05 2015-05-06 上海昊淼生物科技有限公司 Bubble enzyme facial mask
CN104586741B (en) * 2015-02-05 2018-09-11 上海昊淼生物科技有限公司 A kind of bubble ferment facial mask

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