TW201137921A - Method for making transmission electron microscope grid - Google Patents

Abstract

The present invention relates to a method for making a transmission electron microscope (TEM) grid. The method for making the TEM grid includes the steps of: providing a carrier, a carbon nanotube structure, and a fixture, the carrier having first through holes, and the fixture having second through holes; stacking the carrier and the fixture; and placing the carbon nanotube structure between the carrier and the fixture; and welding the carrier and the fixture together.

Description

201137921 VI. Description of the Invention: [Technical Field] [0001] The present invention relates to a method for preparing a transmission electron micro-gate, and more particularly to a method for preparing a transmission electron micro-gate based on a carbon nanotube structure. [0002] [Prior Art] In the transmission electron microscope, the micro-flip system is used to carry a powder sample and is an important tool for observation by high-resolution image (HRTEM) of transmission electron microscopy. In the prior art, the microgrid of the transmission electron microscope is usually formed by covering a metal mesh such as a steel mesh or a nickel mesh with a porous organic film and vapor-depositing an amorphous carbon film. However, in the application of the real application, when the micro-gate is used to perform the component enthalpy of the TEM high-resolution image of the sample to be tested, especially in the observation of the transmission of relatively small-sized nanoparticles, such as particles smaller than 5 nm. When the electron microscope is high-resolution image, the amorphous carbon film in the micro-gate has a large interference to the high-resolution image of the TEM of the TEM. [0003] Since the early 1990s, 'nano carbon nanotubes (see Helical mi cro crotubules of graphitic carbon, Nature, Sum--io I ijima, - YOl 354, p56 (1991)) The material has attracted great attention due to its unique structure and nature. The application of nano carbon tubes to the fabrication of micro-gates is beneficial to reduce the interference of amorphous carbon films on the analysis of the components of the sample to be tested. However, due to the relatively light mass of the carbon nanotubes, drifting is likely to occur when applied to the microgrid, which affects the resolution of the TEM and the accuracy of the measurement. SUMMARY OF THE INVENTION In view of the above, it is necessary to provide a method of preparing a TEM micro-grid capable of preventing the structure of a carbon nanotube from drifting. 099112611 Form No. A0101 Page 3 of 56 〇992〇223〇5 201137921 [〇〇〇5] A method for preparing a TEM microgrid, comprising the steps of: providing a carrier, a carbon nanotube structure, and a fixing body, the carrier has a first through hole, the fixing body has a second through hole; the fixing body is stacked with the carrier and the carbon nanotube structure is disposed on the carrier Between the fixed bodies; and fixing the carrier and the fixed body. [0006] A method for preparing a TEM microgrid, comprising the steps of: providing a plurality of spaced apart carriers, each carrier having a first through hole, providing a carbon nanotube structure, the carbon nanotube a structure covering a plurality of first through holes of the plurality of carriers; providing a plurality of fixing bodies, each of the fixing bodies having a second through hole 'such that each of the fixing bodies and the carrier are disposed in a stacking manner to make the nano a carbon tube structure disposed between the plurality of carriers and the plurality of fixing bodies; soldering and fixing each of the fixing bodies to the carrier; and disconnecting a carbon nanotube structure between the plurality of carriers , thereby forming a plurality of TEM micro-gates. Λ .. .1:..

[ οοοη η Compared with the prior art, the TEM microgrid prepared by the preparation method provided by the present invention can prevent the use of the TEM microscopy by oscillating the nanotube structure between the carrier and the fixed body. During the gate process, the device holding the TEM micro-gate is in direct contact with the carbon nanotube structure, and the structure of the carbon nanotube structure is caused by the light weight of the carbon nanotube structure to eliminate the micro-gate in use. In the process, the structure of the carbon nanotubes is easy to drift, thereby improving the resolution and accuracy of the transmission electron microscope. [Embodiment] The TEM microgrid and the preparation method thereof provided by the present invention will be further described in detail below with reference to the accompanying drawings and specific embodiments. 099112611 Form No. A0101 Page 4 of 56 0992022305-0 Bite Lai & Figure 2, the first embodiment of the present invention provides a TEM test [0009] Please refer to Figure 1 and the pleading of the micro-gate 10. The TEM micro-grid 10 includes a carrier 110, a 12-tube tube body 120, and a crucible holder 130. The nano tube breaking service is disposed between the carrier 11A and the fixed body 130. The external control of the micro-mirror micro-mirror micro-gate 1 为 is 3 strokes, the thickness of the wafer is 3 micrometers, the structure °, the first one [0010] ο The body 11〇 includes at least one first pass The hole 116; the shape of the 炱V-shaped one through hole πθ may be a circular shape, a quadrilateral shape, a hexagonal octagonal structure, or an elliptical open cage. Specifically, the 'filled body 11.0 is a plurality of disc-shaped porous structures, and the disc-shaped porous structure includes a 'thick' body 11 ' " the disc-shaped body 111 includes a first ring 112 and a first The mesh structure 114, the second ring 112 has a through hole, the first mesh structure. The size of the first through hole 116 of the first _-shaped structure 114 is not limited, 4P 'micron~ 200 microns. Wherein, the "size" refers to the first pass? 'large width'. It can be understood that the shape of the plurality of first through holes 11 6 is not limited, and can be adjusted according to the actual application. The distance between the through holes 11 6 may be equal or unequal. Preferably, the plurality of first through holes 116 are evenly distributed on the surface of the carrier 110, and the distance between adjacent first through holes 116 is greater than 1 μm. The carrier of the carrier 11 may be made of copper, nickel, molybdenum or ceramics, etc. The first reticulated phosphatium η4 of the carrier 110 may be formed by etching. Two slits 118 are provided, which are symmetrically arranged to be fixed with the fixing body 130. [0011] In this embodiment, the outer diameter of the carrier 110 is 3 mm. A plurality of 099112611 forms dock number Α 0101 page 5 / 56 pages 0992022305-0 201137921 The first through hole 11 6 has a square shape. The plurality of square first through holes 11 6 are evenly distributed on the surface of the carrier 110. The distance between the adjacent square first through holes 116 is equal. The square first through hole 116 The size is between 40 micrometers and 120 micrometers. The first mesh structure 114 is in the same plane as the first ring 112. The material of the carrier 110 is copper. [0012] The carbon nanotube support 120 is disposed on a surface of the carrier 110. Specifically, the carbon nanotube support 120 covers at least a portion of the plurality of first through holes 116. Preferably, the carbon nanotube support 120 covers the first All of the first through holes 116 of the mesh structure 114. The carbon nanotube support 120 is a one-piece structure, and preferably, the carbon nanotube support 120 is in the form of a disk having a diameter of 3 mm or less, further Preferably, the carbon nanotube support body 120 has a diameter of 2.8 mm or less. [0013] The carbon nanotube support body 120 includes at least one carbon nanotube film. The carbon nanotube film system is composed of plural a self-supporting structure composed of carbon nanotubes. The plurality of carbon nanotubes are arranged in a preferred orientation along the same direction. The preferred orientation refers to the overall extension direction of most of the carbon nanotubes in the carbon nanotube film. In the same direction. Moreover, most of the carbon nanotubes The direction of body extension is substantially parallel to the surface of the carbon nanotube film. Further, most of the carbon nanotubes in the carbon nanotube film are connected end to end by van der Waals force. Specifically, the carbon nanotube film is Each of the carbon nanotubes in most of the carbon nanotubes extending substantially in the same direction is connected end to end with a vanadium tube in the extending direction. Of course, the carbon nanotube film is present. A small number of randomly arranged carbon nanotubes, these carbon nanotubes do not significantly affect the overall orientation of most of the carbon nanotubes in the carbon nanotube membrane. The self-supporting carbon nanotube membrane does not need to be large. The area of the load 099112611 Form No. A0101 Page 6 / 56 pages 0992022305-0 201137921 body support, and as long as the support is provided on both sides, it can be suspended in the whole to maintain its own film state, that is, the carbon nanotube film is placed ( When it is fixed on two supports arranged at a certain distance, the carbon nanotube film located between the two supports can be suspended to maintain its own film state. The self-supporting is mainly achieved by the presence of continuous carbon nanotubes extending through the end-to-end extension of the van der Waals force in the carbon nanotube film. [0014] Specifically, most of the carbon nanotube membranes extending substantially in the same direction in the same direction are not absolutely linear, and may be appropriately bent; or may not be completely aligned in the extending direction, and may be appropriately deviated. Extend the direction. Therefore, it is not possible to exclude partial contact between the carbon nanotubes juxtaposed in the majority of the carbon nanotubes extending substantially in the same direction. Specifically, each of the carbon nanotube membranes comprises a plurality of carbon nanotube fragments arranged in a continuous and preferential orientation. The plurality of carbon nanotube segments are connected end to end by Van der Valli. Each of the carbon nanotube segments includes a plurality of substantially parallel carbon nanotubes, and the plurality of substantially parallel carbon nanotubes are tightly coupled by van der Waals force. The carbon nanotube segments have any length, thickness, uniformity, and shape. The carbon nanotubes in the carbon nanotube film are arranged in a preferred orientation in the same direction. The carbon nanotube film is obtained by drawing from a carbon nanotube array. The thickness of the carbon nanotube film is from 0.5 nm to 100 μm, depending on the height and density of the carbon nanotubes in the carbon nanotube array. The width of the carbon nanotube film is related to the size of the carbon nanotube array in which the carbon nanotube film is drawn, and the length is not limited. The carbon nanotube structure may include a plurality of layers of carbon nanotube membranes stacked. When the carbon nanotube support 120 comprises two or more layers of carbon nanotube film stacked, the adjacent two layers of carbon nanotube film pass between the van der 099112611 form number A0101 page 7 / total 56 pages 0992022305-0 [0015] 201137921 Valli is tightly coupled, and the arrangement of the carbon nanotubes in the adjacent two layers of carbon nanotube film may be the same or different. Specifically, the carbon nanotubes in the adjacent carbon nanotube film have an intersection angle α between the α and the α is greater than or equal to 0 degrees and less than or equal to 90 degrees. The structure of the carbon nanotube film and the preparation method thereof are described in the Taiwan Patent Application Publication No. 200833862, which is published on Aug. 16, 2008. The two or more layers of the carbon nanotube film are preferably laminated and arranged in a cross. The so-called cascading and cross setting means that the angle α is not equal to 0 degrees. The intersection angle α is preferably 90 degrees 〇 [0016] Since the plurality of layers of carbon nanotube films are stacked and disposed at the same time, the carbon nanotubes in the different layers of the carbon nanotube film are interwoven to form a network structure, so that The mechanical properties of the carbon nanotube support 120 are enhanced while the carbon nanotube support 120 has a plurality of uniform and regularly arranged micropores 122 having a pore size and a carbon nanotube The number of layers of the film is related, and the more the number of layers, the smaller the pore diameter of the micropores 122. The pores 122 may have a pore diameter of from 1 nm to 1 μm. Further, the thickness of the carbon nanotube support 120 is preferably less than 100 μm. [0017] The carbon nanotube support 120 may also be at least one carbon nanotube network composed of a nano carbon line, the nano carbon tube network is composed of at least one nano carbon line, and The network structure composed of the at least one nanocarbon line includes a plurality of micropores, and the pores may have a size of 1 nm to 1 μm. The nanocarbon line is composed of a carbon nanotube, which may be a non-twisted nano carbon line or a twisted nano carbon line. [0018] The non-twisted nanocarbon pipeline includes a majority of carbon nanotubes aligned along the axial direction of the non-twisted nanocarbon pipeline. Non-twisted nanocarbon pipeline 099112611 Form No. 1010101 Page 8 of 56 0992022305-0 201137921 Ο [0019]

[0020] 099112611 can be obtained by treating a carbon nanotube membrane with an organic solvent. The carbon nanotube film comprises a plurality of carbon nanotube segments, the plurality of carbon nanotube segments are connected end to end by Van der Waals force, and each carbon nanotube segment comprises a plurality of parallel and through Van der Waals force Tightly bonded carbon nanotubes. The carbon nanotube segments have any length, thickness, uniformity and shape. 5纳米〜1毫米。 The non-twisted nano carbon line length is not limited, the diameter is 0. 5 nanometers ~ 1 mm. Specifically, the volatile organic solvent may be immersed in the entire surface of the carbon nanotube film, and the plurality of nanoparticles parallel to each other in the carbon nanotube film under the action of surface tension generated when the volatile organic solvent is volatilized The carbon tubes are tightly coupled by van der Waals forces, thereby shrinking the carbon nanotube membrane into a non-twisted nanocarbon pipeline. The volatile organic solvent is ethanol, decyl alcohol, acetone, dichloroethane or gas, and ethanol is used in this embodiment. The non-twisted nanocarbon line treated with a volatile organic solvent has a smaller specific surface area and a lower viscosity than a carbon nanotube film treated with a non-volatile organic solvent. The twisted nanocarbon line includes a majority of carbon nanotubes arranged axially helically about the twisted carbon nanotube line. The nanocarbon line can be obtained by mechanically twisting both ends of the carbon nanotube film in opposite directions. Further, the twisted carbon nanotube wire can be treated with a volatile organic solvent. Under the action of the surface tension generated by the volatilization of the volatile organic solvent, the adjacent carbon nanotubes in the treated twisted nanocarbon pipeline are tightly bonded by the van der Waals force, so that the specific surface area of the twisted nanocarbon pipeline Decrease, increase in density and strength. The nano carbon pipeline and its preparation method can be found in Fan Shoushan et al., which was filed on November 5, 2002, and announced on November 21, 2008. The announcement number is I Form No. 1010101 Page 9/56 Page 0992022305- 0 201137921 303239 Taiwan patent; and on December 16, 2005, the Taiwan Patent No. 1 31 2337 announced on July 21, 2009. [0021] In the embodiment, the carbon nanotube support body 120 covers the carrier 110 in the TEM micro-gate 10 and completely covers the plurality of first through holes 116. 6毫米。 The diameter of the carbon nanotube support body is 2. 6 mm. The carbon nanotube support body 120 is a two-layer laminated carbon nanotube film, and the carbon nanotubes in the two-layer carbon nanotube film are vertically disposed. [0022] The fixing body 130 is disposed on a surface of the carbon nanotube support 120 such that the carbon nanotube support 120 is fixed between the fixed body 130 and the carrier 110. The fixing body 130 includes at least one second through hole 136, and the shape of the at least one second through hole 136 may be a circle, a quadrangle, a hexagon, an octagon, an ellipse or the like. Specifically, the fixed body 130 is a disk-shaped porous structure, and the disk-shaped porous structure includes a second disk-shaped body 131. The second disk-shaped body 131 includes a second ring 132 and a second a mesh structure 134, the second ring 132 has a through hole, the second mesh structure 134 is disposed at the through hole, and forms a plurality of second through holes 136; the plurality of second mesh structures 134 The size of the second through holes 136 is not limited and may be from 10 micrometers to 200 micrometers. It can be understood that the shape and arrangement of the plurality of second through holes 136 are not limited and can be adjusted according to actual application requirements. The distance between the plurality of second through holes 136 may be equal or unequal. Preferably, the plurality of second through holes 136 are evenly distributed on the surface of the fixed body 130, and the distance between the adjacent second through holes 136 is greater than 1 micrometer. The second mesh structure 134 of the fixed body 130 may be formed by etching. The material of the fixing body 130 may be a material such as copper, nickel, molybdenum or ceramic. The second ring 132 is provided with two buckles 099112611 Form No. A0101 Page 10 / Total 56 Page 0992022305-0 201137921 [0023] 00 ❹ [0024] 138, the two buckles 138 and the slit 118 Match settings. The carrier 110 and the fixing body 130 are fixed together by inserting the buckle 138 into the slit 118, so that the carbon nanotube support 120 is fixed to the carrier 110 and Between the fixed bodies 130. In this embodiment, the structure and size of the fixing body 130 are the same as the structure and size of the carrier 110, that is, the outer diameter of the fixing body 130 is also 3 mm, and the size of the second through hole 136 is the same as the above. The size of the through hole 116 is also the same, the shape of the second through hole 136 is also square, and the second mesh structure 134 is in the same plane as the second ring 132. The plurality of first through holes 116 and the plurality of second through holes 136 are oppositely disposed opposite to each other to form a plurality of third through holes 丨5〇, wherein the third through holes 150 are first through holes 11& a portion of the second through hole 136 that is smaller than the size of the first through hole 116 or the second through hole 136. The size of the third through hole 15 is 20 micrometers to 6 Between the micrometers, the third through hole 150 corresponds to an electron transmissive portion, and the carbon nanotube branch body 120 is suspended at the third through hole 150. It is to be understood that the number of the slits 118 and the buckle 138 is not limited, and may be, for example, three as long as it can fix the carrier 11 or the fixed body 13A. In addition, the manner in which the carrier 110 and the fixing body 13 can be fixed together is not limited to that described in the embodiment, and the two can be fixed together by other mechanical means; for example, the two are fixed together by welding. . [0025] In the present embodiment, the TEM microgrid 10 is placed on the surface of the carbon nanotube support 120 when it is applied. When the size of the sample is larger than the micropores 122 of the carbon nanotube support 120 of 099112611, the form number A0101 can be 0992022305-0 201137921 to support the sample of the material. The sample can be observed through an electric portion corresponding to the third through hole (10). And when the size of the sample is smaller than the micropores (2), especially when the sample is a nanoparticle having a particle diameter of less than 5 nm, the sample can pass through a carbon nanotube in the carbon nanotube cut 12G. The adsorption is stably absorbed by the surface of the nano tube wall, and at this time, the sample can also be observed through the electron transmissive portion corresponding to the third through hole 150. From 7 to 7 nanometer particle samples with a particle size of less than 5 nm can be observed to improve the resolution and sharpness of the high resolution image of the lens. [0028] [0028] [0028] 099112611 (d) The shot-meter tube 120 is fixed by the carrier 11〇 and the fixed body 13〇, therefore, when the sub-etc. is moved by the transmission electron micro-gate, the dice directly hold the above= And the fixed body (10), and the direct fabric nano carbon tube body 12 〇; this can avoid the lock and the carbon nanotube support (2) straight (9), to avoid the quality of the carbon nanotube support 12 () Lightly and in contact with the drift of the carbon tube support 120 'also reduces the contamination of the 2 m support body 120 by the recording', thereby facilitating the improvement of the accuracy and resolution of the component analysis of the transmission electrons In addition, since the carbon nanotube support 12 is composed of a plurality of first and last carbon nanotube bundles, and the carbon nanotubes are (four) conducting t=connected edges, the carbon nanotube support is The conductivity of 12 较好 is good, and the observation of the electron sample that will accumulate on the surface of the carbon nanotube support 12 ° can be observed. More favorable for the other, since the carbon nanotube support 12 is composed of a plurality of carbon nanotube bundles connected end to end, that is, the nanophase between the nanotubes in the carbon nanotube membrane is fixed at Therefore, the carbon nanotube film has a good stability = effect form No. A0101 Page 12 of 56 at 〇992〇223〇5-〇201137921 [0029] Ο ο [0030] When the sample is observed, the nanometer The carbon nanotubes in the carbon nanotube film do not sway, making the image formed by the observed sample clearer. Further, since the carbon nanotube support 120 is composed of a plurality of end-to-end carbon nanotube bundles The carbon nanotubes in the carbon nanotube support body 120 are regularly arranged, so that it is easy to locate and look for a sample when the sample is observed. Referring to FIG. 3 and FIG. 4 in June, the second embodiment of the present invention provides a transmission electron microscope microgrid 20 The TEM micro-gate 2 has an outer diameter of 3 mm and a thickness of 3 micrometers to 20 micrometers. The TEM micro-gate 2 includes a carrier 210, a carbon nanotube support 220, and a fixed body 230. The carrier 21 0 is a wafer-shaped gift The first wafer-shaped body 211 includes a first-circle-ring 212 and a plurality of first strip-shaped structures 214. The first ring 212 has a through hole. A plurality of first strip structures 214 are disposed at the through holes of the first ring 212 and are spaced apart from each other to form a plurality of first through holes 216; the first ring 212 is provided with two slits 218. The fixed body 23 is a disk-shaped porous structure, and includes a first disk-shaped body 231. The second disk-shaped body 231 includes a second ring 232 and a plurality of second strip-shaped structures 234. The ring 232 has a through hole, and the plurality of second strip structures 234 are disposed at the through hole, and are spaced apart to form a plurality of second through holes 2 36; and the second ring 232 is provided with two buckles 238. The zircon carbon nanotube support body 220 is disposed between the carrier 21〇 and the fixed body 23〇. The carrier 210 and the fixed body 230 are fixed by the cooperation of the buckle 238 and the slit 218. Therefore, the carbon nanotube support 220 is fixed between the carrier 210 and the fixed body 23〇. The carbon nanotube support body 220 is the same as the first embodiment of the TEM microelectrode of the first embodiment of the first embodiment of the present invention. The first ring 212 and the second ring 232 are the same as the first embodiment of the TEM 1210112611. The structure is the same as that of the first ring 11 2 and the second ring 132 in the first embodiment. The TEM micro-gate 20 is different from the TEM micro-gate 10 in that: The first strip structures 214 are parallel to each other and are equally spaced apart to form a plurality of mutually parallel first through holes 216, and the spacing between adjacent first strip structures 214 is between 30 micrometers and 150 micrometers. The first strip structure 214 has a diameter greater than 1 micron. The plurality of second strip structures 234 are parallel to each other and equally spaced to form a plurality of second through holes 236 ′ that are parallel to each other and the adjacent second strip structures 2 3 4 are spaced apart by 3 μm to 15 〇. Micro. The plurality of first strip structures 214 are disposed opposite to the plurality of second strip structures 234 by the carbon nanotube support 220 and the first strip structure 214 and the second strip structure 234 The angle between the plurality of first through holes 216 and the plurality of second through holes 236 is opposite to each other to form a plurality of third through holes 250 ′. The size of the plurality of third through holes 250 Between 30 microns and 150 microns, the distance between adjacent kings is greater than 1 micron. The carbon nanotube support 220 is suspended at each of the third through holes 250 and corresponds to one electron transmission portion. The electron transmissive portion is for carrying a sample to be tested. [0031] It can be understood that the angle formed between the first strip structure 214 and the second strip structure 234 is greater than or equal to 0 degrees and less than 90 degrees. The arrangement of the plurality of first strip structures 21 4 and the second strip structures 234 is not limited to the embodiment. For example, the distance between the first strip structures 214 may be unequal, and the first strip structures 214 may be arranged in a crosswise manner; the distance between the adjacent first strip structures 214 may also be 10 micrometers. ~2〇〇micron, 099112611 Form nickname A0101 Page 14/56 page 0992022305-0 201137921 The width of the first strip structure 214 may be greater than [micrometers]. The distance between the second strip structures 234 may be unequal, and the second strip structures 234 may be arranged and arranged; the distance between the adjacent second strip structures 234 may also be 1 〇 micron. 〜200 microns, the second strip structure 234 may have a width greater than 1 micron. The arrangement of the second strip structures 234 may also be different from the arrangement of the first strip structures 214. [0032] It can be understood that the first strip structure 214 of the carrier 21〇 and the second strip structure 234 of the holder 230 can be formed by etching. The first strip structure 214 and the second strip structure 234 may also be a filament structure formed by a wire drawing method. [0033] Referring to FIG. 5 and FIG. 6, a third embodiment of the present invention provides a TEM microgrid. 30. The TEM micro-gate 30 has an outer diameter of 3 mm and a disk-like structure having a thickness of 3 to 20 μm. The transmission mirror microgrid 3 includes a carrier 310, a carbon nanotube support 320, and a fixed body 330. The carrier 310 is a disk-shaped porous structure including a first wafer-shaped body 311. The first wafer-shaped body 311 includes a first ring 312 and a first mesh structure 314. The first ring 312 has a through hole, and the first mesh 314 is disposed at the through hole. And forming a plurality of first through holes 316; two slits 318 are disposed on the first ring 312. The fixing body 330 is a second ring 332, and the fixing body 330 includes only one second through hole 336. The second ring 332 is provided with two buckles 338. The carbon nanotube branch body 320 is disposed between the carrier 310 and the fixed body 330. The carrier 310 and the fixing body 330 are fixedly coupled together with the slit 318 by the buckle 338. Therefore, the carbon nanotube support body 320 is fixed between the carrier 31A and the fixed body 330. 099112611 Form No. A0101 Page 15 of 56 0992022305-0 201137921 [0034] The structure of the TEM micro-gate 30 is similar to that of the TEM micro-gate 10 of the first embodiment, specifically, the carrier 31 The material and structure of the tantalum and carbon nanotube support 320 are the same as those of the carrier 11 and the carbon nanotube support 120 of the transmission electron microstrip. The difference is that the fixing body 330 is a second ring 332, and the fixing body 330 includes a second through hole 33δ. The diameter of the fixing body 330 is the same as the diameter of the carrier 310. Preferably, the inner diameter of the second ring 332 is the same as that of the first ring 312. The carbon nanotube support 32 is fixed between the first ring 312 and the second ring 332, and the diameter of the carbon nanotube support 32 is slightly larger than the inner diameter of the first ring 332. The first through hole 316 corresponds to one electron transmitting portion. The carbon nanotube support 320 is suspended at the first through hole 316. Referring to FIG. 7 and FIG. 8, a fourth embodiment of the present invention provides a TEM micro-gate 40. The TEM micro-gate 40 includes a carrier 41, a carbon nanotube support 420, and a fixed body 430. Preferably, the TEM microbuckle 40 has an outer diameter of 3 mm and a disk-like structure having a thickness of 3 μm to 2 μm. [0036] The carrier 41 is a first ring 412, and the carrier 410 includes a first through hole 416; and two slits 418 are disposed on the first ring 412. The fixing body 430 is a second ring 432, and the fixing body 430 includes a second through hole 436. The second ring 432 is provided with two buckles 438. The carrier 410 and the fixed body 430 are fixedly coupled to the slit 418 by the buckle 438. The carbon nanotube support body 420 is disposed between the carrier 410 and the fixed body 430, and is suspended at the first through hole 416 and the second through hole 436. 099112611 Form No. A0101 Page 16 / Total 56 〇 9 [0037] 201137921 〇W [0038] The diameter of the carbon nanotube support 420 is set to be slightly larger than the inner diameters of the first and second circular 412 and 432. The structure of the carbon nanotube support body 420 is similar to that of the first embodiment of the nano-carbon tube support body 120 of the TEM micro-gate 1 提供 provided by the example of the ear, preferably the carbon nanotube branch The building body 420 is a carbon nanotube film which is laminated and arranged in a plurality of layers. In the present embodiment, the carbon nanotube support body 420 is a four-layer laminated and cross-mounted carbon nanotube film and the carbon nanotubes in the adjacent carbon nanotube film are vertically disposed; the nano carbon 5微米。 The tube support 420 has a plurality of uniform and regularly arranged micropores, the pore size of the pores of 1 nm ~ 0. 5 microns. Referring to FIG. 9 and FIG. 1 , a fifth embodiment of the present invention provides a TEM micro-gate 50. The TEM micro-gate 5A includes a carrier 510, a carbon nanotube support 520, and a fixed body 530. The carbon nanotube support 520 is disposed between the carrier 510 and the fixed body 530. Preferably, the TEM micro-gate 50 has a sheet-like structure having an outer diameter of 3 mm and a thickness of 3 μm to 20 μm. [0039] The carrier 510 and the fixing body 530 have a connection between the G-connection forming a reputation #550, and the carrier and the fixing body 530 are movably connected through the folding portion 550, so that the The carrier 510 and the fixed body 530 are in an open state or a closed state. The folded portion 550 may be formed by the body 510 being integrally formed with the fixed body 530 or may be a pivot. The carrier 510 is a one-piece porous structure, and includes a first wafer-shaped body 511. The first wafer-shaped body 511 includes a first ring 512 and a first mesh structure 514. The first circle The ring 512 has a through hole, and the first mesh structure 514 is disposed at the through hole, and forms a plurality of first through holes 516; the first ring 512 is provided with a 099112611 0992022305-0 form number A0101 17 pages / total 56 pages 201137921 slit 518. The fixing body 530 is a one-piece porous structure, and includes a second disk-shaped body 531. The second disk-shaped body 531 includes a second ring 532 and a second mesh structure 534. The ring 532 has a through hole, and the second mesh structure 534 is disposed at the through hole, and forms a plurality of second through holes 536; the second ring 532 is provided with a buckle 538, the buckle 538 is matched to the slit 518. [0040] Specifically, the folding portion 550 is formed between the first ring 512 and the second ring 532 such that the first ring 512 and the second ring 532 intersect and are connected to each other. The shape is similar; therefore, the shape of the first wafer-shaped body 511 and the second wafer-shaped body 531, and the shapes of the first ring 512 and the second ring 532 are all circular, the first wafer The intersection of the body 511 and the second wafer body 531 is the folded portion 550. After the carrier 510 and the fixing body 530 are folded by the folding portion 550, the inner edge of the first circular garment 512 and the inner edge of the second circular ring 532 may be disposed opposite to each other. Preferably, the carrier 510 and the holder 530 are completely overlapped after being folded. The slit 518 and the buckle 538 are respectively disposed on the opposite side of the folding portion 550. After the carrier 510 and the fixing body 530 are folded by the folding portion, the buckle 538 passes through the slit 518. , the card is fixed on the second ring 512, so that the carrier and the fixing body 53 are fixed together, so that the carbon nanotube support 520 is fixed between the carrier 510 and the fixed body 530. . [0041] In this embodiment, the carrier 51〇 and the fixed body 530 are integrally formed. The carrier 51 and the damper 530 are symmetrically disposed with respect to the folded portion 550, that is, the specific structure of the carrier 51 is the same as the specific structure of the fixed body 530, the second through hole 516 and the second The specific junction of the through hole 536 is 099112611. The form number A0101 is 18th true/common 56 page 0992022305-0 201137921 is the same as the first through hole Π6 and the second through hole 136 in the TEM microgrid 1〇 provided by the first embodiment. The shape and size of the first through hole 5丨6 are the same as the shape and size of the first through hole 536. After the carrier 510 and the solid body 530 are folded, the first through hole 516 and the second hole The through holes 536-- correspond and coincide, and correspond to one electron transmitting portion. The carbon nanotube support body 520 is suspended at the second through hole 536 and the first through hole 516. [0042] The carbon nanotube support 520 is the same as the carbon nanotube support 120 in the first embodiment 'comprising at least one carbon nanotube, or a nanometer consisting of at least one carbon nanotube Carbon tube network structure. Specifically, in the present embodiment, the carbon nanotube support 520 includes two layers of carbon nanotube membranes stacked and intersected, and the carbon nanotubes in the two carbon nanotube membranes are vertical. Provided to form a plurality of uniform and regularly arranged micropores having a pore size of from 1 nm to 1 μm. [0043] It can be understood that the number and specific structure of the slit 518 and the buckle 538 are not limited as long as the fixed carrier 510 and the fixed body 530 can be realized. The carrier 510 and the fixing body 530 may not be provided with the slit 518 and the buckle 538 ′ as long as the carrier 510 and the fixing body 530 are folded and folded along the folding portion 55 《. When the grid is 5 ,, the carrier 510 and the fixed body 530 are held by the holding material, so as to avoid the large drift of the carbon nanotube structure 522 due to the direct contact of the holding material with the carbon nanotube support 520, and pollution. The carbon nanotube support "^ is advantageous for improving the resolution and accuracy of the TEM micro-gate 5". Of course, the carrier 510 and the fixed body 530 are provided with a snap or soldering device. When the connection is fixed together, the carbon nanotube support body 520 can be further fixed, thereby further preventing the carbon nanotube support body 099112611 Form No. 1010101 Page 19 / Total 56 Page 0992022305-0 201137921 In the use of transmission electron microscopy It is understood that the carrier and the fixed body in the first embodiment, the second embodiment, the third embodiment and the fourth embodiment of the present invention may also be integrated. [0045] The present invention also A method of preparing a TEM microgrid is provided, the method comprising the steps of: providing a carrier having a first via; providing a carbon nanotube structure, the first carbon nanotube structure covering the carrier a through hole; and a fixing body having a second through hole, the fixing body and the carrier are stacked, and the carbon nanotube structure is fixed between the carrier and the fixed body [0046] wherein the carrier and the fixing body may be two independent structures, or may be a unitary structure. It can be understood that when the carrier and the fixing system are integrated, the nano carbon The tube structure may simultaneously cover the first through hole of the carrier and the second through hole of the fixed body. [0047] The carbon nanotube structure is at least one carbon nanotube film, at least one nano carbon line or At least one carbon nanotube network structure. The at least one carbon nanotube membrane or at least one nanocarbon pipeline is directly extracted from a carbon nanotube array. The carbon nanotube network structure By the at least one The nano carbon line is composed of a certain order of weaving or a combination of crossover arrangements. [0048] The step of covering the first through hole of the carrier with the carbon nanotube structure further comprises covering the carrier with an organic solvent treatment The step of stacking the carbon nanotube structure of the first through hole. [0049] The step of laminating the carrier and the fixed body may be as follows: 099112611 Form No. A0101 Page 20 / Total 56 Page 0992022305-0 201137921 [ [0501] G [0052] The carrier and the fixing body are mechanically laminated such that the second through hole of the fixing body at least partially overlaps with the first through hole of the carrier. Specifically, the fixing body and the carrier may be laminated by welding or snapping so that the carbon nanotube cut body is held between the carrier and the fixing body. It can be understood that in the above method of preparing a TEM microgrid, the order of providing the carrier, the fixed body and the carbon nanotube structure can be determined according to actual conditions. For example, the carrier and the fixing body may be provided at the same time; the carrier, the fixing body and the carbon nanotube structure may be simultaneously provided; and the carrier and the carbon nanotube tube may be simultaneously provided; the structure: β. Referring to FIG. 9 to FIG. 11, the embodiment specifically provides a method for preparing the above-described TEM micro-gate 50. The preparation method comprises the steps of: (si〇) providing the carrier 510 and the fixing body 53〇, the carrier 5i〇 having a plurality of 帛-through holes 516, the fixing body 53() having a plurality of second a through hole 536; (S2G) provides a carbon nanotube structure, for example, the carbon nanotube structure 522 covers the first through hole 516 of the carrier 510; (s3 (eight) the fixed lock G _51G stacked The carbon nanotube structure 522 is fixed between the carrier 510 and the fixing body 53. Step (sio) t The carrier 510 and the fixing body 53 are integrally formed structure 'the carrier 51G and The junction of the solid body 53G has a folded portion 550 through which the carrier 51G and the solid body 53G can be completely

Pd closes or opens any angle. In this embodiment, the carrier 51 is symmetrically disposed with the fixed body 530 at the folded portion 55Q. The carrier 510 and the fixed body 53G are opened such that the corner angle of the carrier 51A and the fixed body 53G through the folded portion 550 is 9 degrees. 099112611 Form No. A0101 Page 21 of 56 0992022305-0 201137921 [0053] Step (S20) specifically includes the following steps: (S21) providing a carbon nanotube structure 522 and covering the carbon nanotube structure 522 a first mesh structure 514 of the carrier 510; (S22) treating the carbon nanotube structure 522 covering the first through hole 516 of the carrier 510 with an organic solvent; and (S23) removing the excess carbon nanotube structure 522 To form a carbon nanotube support 520. [0054] In this embodiment, the carbon nanotube structure 522 is two stacked and cross-mounted carbon nanotube membranes, and the carbon nanotubes in the two carbon nanotube membranes are vertically disposed and covered. The first mesh structure 514 of the carrier 510. Wherein, the preparation method of each carbon nanotube film comprises the following steps: First, an array of carbon nanotubes is provided, and preferably, the array is a super-sequential carbon nanotube array. [0056] In this embodiment, the method for preparing the super-sequential carbon nanotube array adopts a chemical vapor deposition method, and the specific steps thereof include: (a) providing a flat substrate, and the substrate may be a P-type or N-type germanium substrate. Or, using a germanium substrate formed with an oxide layer, in this embodiment, a 4-inch germanium substrate is preferably used; (b) a catalyst layer is uniformly formed on the surface of the substrate, and the catalyst layer material may be iron (Fe) or cobalt (Co). One of the alloys of nickel (Ni) or any combination thereof; (c) annealing the substrate on which the catalyst layer is formed in air at 700 to 900 ° C for about 30 minutes to 90 minutes; (d) treating the substrate It is placed in a reaction furnace, heated to 500-740 ° C in a protective gas atmosphere, and then reacted with a carbon source gas for about 5 to 30 minutes to grow a super-aligned carbon nanotube array having a height of 200 to 400 μm. . The super-sequential carbon nanotube array is a plurality of pure carbon nanotube arrays formed of carbon nanotubes that are parallel to each other and perpendicular to the substrate. By controlling the growth conditions as described above, the super-shun-nai 099112611 Form No. A0101 Page 22 of 56 0992022305-0 201137921 The carbon nanotube array is substantially free of hybrid metal particles and the like. The carbon nanotubes of the carbon type or the residual urging of the van der Waals force in close contact form an array. The carbon nanotubes are connected to each other [0057] [0058] 碳 The umbrella source can be used as a carbon source gas in the application of the compound, and the carbon can be used to record the active hydrocarbon fly gas or inert gas. Secondly, using a stretching tool, it is extracted from the nanometer column of a certain width and length, and specifically includes the following steps: (a) selecting a plurality of widths of the width of the above-mentioned carbon nanotubes from the above-mentioned carbon nanotube array. Nano carbon S-slice slaves, in this embodiment, it is preferred that the tape of the predetermined width is in contact with the array of not-timbers to select a plurality of carbon nanotube segments of a certain width; y) is a "carbon tube" The plurality of carbon nanotube segments are stretched in the direction of growth, and are called a carbon nanotube film. [0059]

G In the above-mentioned stretching process, the number of segments of the carbon nanotubes is gradually separated from the substrate by the tensile force, and the multiple carbon nanotube segments selected by the Hai The other carbon nanotube segments are continuously pulled out end to end to form a Naibi carbon tube film. The carbon nanotube film is a carbon nanotube film having a constant width formed by a plurality of aligned carbon nanotube bundles. The arrangement direction of the carbon nanotubes in the carbon nanotube film is substantially parallel to the stretching direction of the carbon nanotube film [0060] In the present embodiment, the width of the carbon nanotube film and the growth of the carbon nanotube array are Related to the base mosquitoes, the Nai # carbon tube (four) is not limited in length and can be made according to actual needs. In this embodiment, a 4-inch substrate-grown super-aligned nano-shirt array is used, and the width of the carbon nanotube film can be from 〜10 cm. 099112611 Form No. A010! Page 23 of 56 0992022305-0 201137921 [0061] wherein the preparation method of the carbon nanotube structure 522 specifically includes the following steps: [0062] First, a substrate is provided. The substrate has a flat surface and its material is not limited. In this embodiment, the substrate can be a ceramic sheet. [0063] Next, the above two carbon nanotube films are sequentially laminated and cross-laid on the surface of the substrate. [0064] Since the carbon nanotubes are relatively pure and have a large specific surface area, the carbon nanotube film obtained by directly drawing from the carbon nanotube array has good viscosity. The carbon nanotube film can be directly laid on the surface of the substrate or on the surface of the other carbon nanotube film. The two layers of carbon nanotube membranes are tightly bonded by van der Waals force. [0065] It can be understood that the carbon nanotube structure 522 may also be a layer of the carbon nanotube film, or may be formed by laminating and intersecting two or more layers of the carbon nanotube film. Of course, the carbon nanotube structure 522 can also be at least one nano carbon line or at least one carbon nanotube network structure. [0066] Step (S22) specifically: the organic solvent 562 is dropped through the container 560 The surface of the carbon nanotube structure 522 wets the entire carbon nanotube structure 52. The organic solvent 652 is a volatile organic solvent such as ethanol, decyl alcohol, acetone, di-ethane or chloroform, and ethanol is used in this embodiment. After the carbon nanotube structure 522 is infiltrated by the organic solvent 562, the parallel carbon nanotube fragments in each of the carbon nanotube membranes partially aggregate into nanometers under the surface tension of the volatile organic solvent 562. Carbon tube bundle. In addition, the carbon nanotubes in the carbon nanotube film aggregated into a bundle, so that the carbon nanotube film in the flat 099112611 form number A0101 page 24 / total 56 page 0992022305-0 201137921 row of carbon nanotube bundles are basically mutual At intervals, and the carbon nanotube bundles of the two layers of carbon nanotubes in the carbon nanotube structure 522 are arranged to form a microporous structure. These micropores are composed of a carbon nanotube' and a carbon nanotube bundle which are arranged in series and overlap each other. [0067] The step (S23) is: after the organic solvent is volatilized, the excess carbon nanotube structure (10) is removed along the inner ring of the first ring 512 of the carrier 51〇, so that the diameter of the nano tube-breaking structure 522 It is smaller than the outer diameter of the first ring 512 to form the carbon nanotube support 520. Among them, the carbon nanotube bulk 520 can be formed by removing the excess carbon nanotube structure 5 22 by laser cutting. In this embodiment, a conventional argon ion laser or carbon dioxide laser can be used to remove the excess carbon nanotube structure 522, and its power is 5 to 30 watts (W)', preferably 18 watts. The diameter of the carbon nanotube support body 52 is 2.6 mm, which is equal to the inner diameter of the first ring 512. It can be understood that when the diameter of the carbon nanotube structure 52$ in the step (S20) is smaller than the outer diameter of the first ring 512, especially less than the inner diameter of the first ring 512, it may be omitted. The step (S23) is carried out. It can be understood that the order of the steps (S21), (S22) and (S23) can be determined as needed. For example, 'the step (S21) and the step (S22) may be interchanged, that is, the carbon nanotube structure 522 may be first treated with an organic solvent, and then the carbon nanotube structure 522 is placed in the The surface of the carrier 510. [0069] Step (S30) laminating the fixing body 530 and the carrier 510 such that the first through hole 516 and the second through hole 536 at least partially overlap, and the surface of the carbon nanotube support body 52 It is fixed between the carrier 510 and the fixed body 530. Specifically, the fixed body 099112611, the military number A0101, the 25th page, the 56th page 0992022305-0 201137921 530, and the carrier 51〇 are stacked by the folding portion 550, so that the carbon nanotube structure 522 is fixed to The carrier 510 is disposed between the carrier 510 and the fixed body 530. More specifically 'close the fixing body 530 and the carrier 510 such that the angle between the carrier 5 丨〇 and the fixing body mo at the folded portion 550 is gradually reduced to a twist; at this time, the carrier 51 〇 and the fixed body The 530 is disposed opposite to each other, and the first through hole 516 of the carrier 51 is aligned with the second through hole 536 of the fixing body 530, and the carbon nanotube support 520 is in the first pass. The hole 516 and the second through hole 536 are suspended and repositioned. In this step (S33), the carrier 510 and the fixing body 530 are folded by the folding portion 55, so that the alignment of the carrier 510 and the fixing body 530 can be relatively easily realized, and in particular, the first through hole 516 and the first through hole 516 are relatively easy to implement. Precise alignment of the two through holes 536. [0071] In addition, the step (S3G) further includes: mechanically fixing the carrier 510 and the fixing body 530, so that the carbon nanotube support 520 is held by the carrier 510 and fixed. Between the bodies 530. In this embodiment, the step (S30) is to engage the first ring 532 and the first ring 512 during the process of closing the carrier 51 and the fixed body 53〇. The slit 518 is configured to fix the carrier 51 and the fixing body 530 such that the carbon nanotube support 52 is fixed between the carrier 510 and the fixed body 530. In addition, the method for manufacturing the TEM micro-gate 50 is not limited to the above steps, wherein the step (S30) may be placed between the step (S21) and the step (S22); at this time, the nanocarbon The tube structure 522 is disposed between the carrier 510 and the solid body 530, so the step ($22) is immersed in the whole of the carbon nanotube structure 522, the carrier 51, and the fixed body 53. Immersing in an organic solvent container for organic solvent treatment 099112611 Form No. A0101 Page 26 of 56 0992022305-0 201137921 Side: Step (S23) is cut along the outer edge of the first ring 512 or the second ring 532 The excess carbon nanotube structure 522 obtains the carbon nanotube support body 20, and the carbon nanotube support 52 is disposed between the carrier 51 and the fixed body 530. [0072] Although the carbon nanotube structure 522 provided in the step (S20) includes a plurality of carbon nanotube membranes or a plurality of nanocarbon pipelines, or a plurality of nanometer magnets, the s-shaped structure is The preparation method of the TEM micro-gate 5〇 is to set a part of the carbon nanotube structure in the carbon nanotube structure 5 2 2 to the first through hole 516 of the carrier 510, the nanometer Another part of the carbon nanotube structure is disposed on the first through hole 536 of the fixed body 530; and the fixed body 53〇Y having a carbon nanotube and the carrier having the carbon nanotube structure are further laminated 51〇, to form the nano carbon g support 520, and the carbon nanotube support 52 is disposed between the first through hole 516 and the second through hole 536. [0073] The invention also provides a method for preparing a plurality of TEM micro-gates, the method comprising the steps of: (Sli) providing a plurality of carriers 51, the plurality of carriers 510 being spaced apart from each other on a substrate surface, each carrier 51〇 Having a first through hole 516; (S120) providing a carbon nanotube structure 522, covering the carbon nanotube structure 522 a plurality of first through holes 516 of the plurality of carriers 51; (S130) providing a plurality of fixing bodies 530, each of the fixing bodies 530 having a second through hole 536, and each of the fixing bodies 53 and the carrier 510 corresponding to the stacking arrangement such that the carbon nanotube structure 522 is fixed between the plurality of carriers 51〇 and the plurality of fixing bodies 530; and (S140) disconnecting between the plurality of carriers 51〇 The carbon nanotube structure 522 is formed to form a plurality of transmission electron micromirrors. 099112611 Form No. A0101 Page 27 of 56 0992022305-0 201137921 [0074] wherein the said bottom of the step (silO) is a flat surface, the material of which is not limited, and may be ceramic pottery, glass or the like. The distance between the adjacent two carriers 51〇 cannot be too large or too small, and the excessively large is beneficial to improve the production efficiency of the TEM microgrid 5G. If the distance is too small, the processing difficulty of the carbon nanotube structure 522 in the subsequent y steps is increased, which is disadvantageous. In order to reduce the production cost*, when using the laser beam irradiation method at the one-meter carbon tube structure 522 in the step of the request, the difference between the adjacent two carriers 510 should be larger than that of the laser beam irradiated on the carbon nanotubes. The light beam 1 formed on the surface of the structure 522 is directly controlled. The distance between the two adjacent carriers 51〇 is preferably 5〇~2〇〇«Into v' to improve the utilization of the carbon nanotube structure 522. cut. 1] The plurality of carriers 51 can be closely and regularly arranged on the surface of the substrate. It can be understood that the carrier 510 and the fixing body 530 are the carriers and the fixing bodies in the fourth to fourth embodiments. Structure [0075] wherein the step (S120) is the same as the embodiment of the small scale (S2G). The step (S1 30) is the same as the embodiment of the small step (S3〇). The number of the fixed bodies 53 is the same as the number of the carriers 510, and each of the commission carriers 51 has a solid body 53 〇. [0076] The step (S140) may irradiate the carbon nanotube structure 52 2 between the adjacent carriers 510 by a laser beam. Specifically, the following three methods can be adopted: [0077] Method 1: irradiating the carbon nanotube structure 522-week along the outer edge region of each carrier 510 by using a laser beam to make the cover on the carrier 51〇 The carbon nanotube structure 522 has a diameter less than or equal to the outer root of the carrier 51〇, forming a separation region surrounding the carrier 51〇 along the outer edge of the carrier 510, thereby allowing the nanocarbon covering the plurality of carriers 510. Tube 0992022305-0 099112611 Meter No. A0101 Page 28 of 56 201137921 [0078] Structure 522 is separated from the carbon nanotube structure ^2 that covers the plurality of carriers 51〇. Method 2: Moving the laser beam, illuminating the carbon carbon structure 522 ' between all the carriers 510 to remove the carbon nanotube structure between all the carriers 51 522 [0079] Ο [0080] [0082] [0082 Method : [0083] Method 3: When the plurality of carriers 510 are arranged on the surface of the substrate in an array, the laser beam is moved, and the carbon nanotubes covering the inter-row and inter-column spaces of the plurality of carriers 510 are irradiated along a straight line. Structure 522, thereby breaking the carbon nanotube structure 52 2 between the plurality of carriers 51 0 . In the step of disconnecting the carbon nanotube structure 522 between the plurality of carriers 510, the line of the laser beam moving and illuminating can be controlled by a computer program 〇/1. %-V . :·;.;. The order of implementation of the step gamma (S130) and (S140) may be in any order, and may be selected in actual situations. Referring to Figures 12 and 13, a sixth embodiment of the present invention provides a transmission micromirror 60. The transmissive mirror microgrid 60 includes a carrier 610, a carbon nanotube support 620, and a fixed body 630. The carbon nanotube support 620 is disposed between the carrier 610 and the fixed body 630. Preferably, the TEM microgrid 60 has an outer diameter of 3 mm and a land structure of 3 to 20 micrometers. The carrier 610 is a disk-shaped porous structure, and includes a first wafer-shaped body 611. The first wafer-shaped body 611 includes a first ring 612 and a first mesh structure 614. The first circle The ring 612 has a through hole, and the first mesh structure 614 is disposed at the through hole, and forms a plurality of 099112611 form number A0101 page 29 / 56 pages 0992022305-0 201137921 a through hole 616. The fixed body 630 is a disk-shaped porous structure, and includes a second disk-shaped body 631. The second disk-shaped body 631 includes a second ring 632 and a second mesh structure 634. The ring 632 has a through hole, and the second mesh structure 634 is disposed at the through hole, and forms a plurality of second through holes 636. An edge of the carrier 610 and an edge of the fixing body 630 are disposed in contact with each other, and a soldering element 640 is disposed at the contact portion. [0084] The structure of the carrier 610 and the fixing body 630 is the same as that of the TEM microgrid 10 of the first embodiment. The structure of the carrier 610 and the fixing body 630 are similar, except that the edge of the first wafer-shaped body 611 and the edge of the second wafer-shaped body 631 form a surface-to-line contact. Specifically, the first ring 612 has a first surface 618, that is, the first surface 618 of the first ring 612 is a planar structure. The cross section of the first ring 612 has a shape of a rectangular shape, a semicircular shape, a triangular shape, or a trapezoidal shape. The second ring 632 has a second surface 638. The shape of the second surface 638 of the second ring 632 may be a curved surface or a ridge line. Therefore, when the edge of the first ring 612 is in contact with the edge of the second ring 632, it is a face-to-line contact. The specific structure of the carrier 610 and the fixing body 630 is not limited as long as the edge of the fixing body 630 and the edge of the carrier 610 can achieve line-to-plane contact to form a line contact, for example, When the surface of the carrier 610 in contact with the carbon nanotube support 620 is a flat surface, the fixed body 630 may also be composed of a second ring 632 or a second ring 632 and a plurality of strip structures. The surface of the second ring 632 contacting the carbon nanotube support 620 is a curved surface or a ridge line. The cross section of the first ring 61 2 in this embodiment is a rectangle, and the cross section of the second ring 099112611 form number A0101 page 30 / page 56 0992022305-0 201137921 632 is circular; therefore, the The first surface 618 of the first ring 612 and the second surface 638 of the second ring 632 may be in line contact. [0085] The carbon nanotube support 620 is the same as the carbon nanotube support 120 in the first embodiment, and includes at least one carbon nanotube film, or a nanometer composed of at least one nano tube. Carbon tube network structure. In this embodiment, the carbon nanotube support body 620 includes two layers of carbon nanotube membranes stacked, and the carbon nanotubes in the two layers of carbon nanotube membranes are vertically disposed to form a plurality of ❹ [0086 Uniform and regularly arranged micropores, the pores of which may be nanometers q micron, the soldering elements 640 are formed by soldering the carrier 61〇 and the fixed body 63〇 and are located at the The contact of a ring 612 with the second ring 632 'specifically' the welding element 640 is disposed on the line of the first surface 618 of the first ring 612 and the second surface 638 of the second ring 632 a contact portion; the first ring 612 and the second ring 632 are welded together by spot welding, brazing, or the like at the line contact to fix the carrier 61〇 and the fixing body 630; thereby making the nano The carbon tube support 620 is fixed between the carrier 610 and the fixed body 630. In this embodiment, the soldering component 640 is a plurality of spot solder joints. [0087] The present invention also provides a method for preparing a TEM microgrid by soldering, the method comprising the steps of: providing a carrier, a carbon nanotube structure, and a fixing body, wherein the carrier has a first through hole, the fixing body has a second through hole; the fixing body is stacked with the carrier, and the carbon nanotube structure is disposed between the carrier and the fixed body; The carrier and the fixing body are welded and fixed. 099112611 Form No. 101 0101 Page 31 / Total 56 Page 0992022305-0 201137921 [0088] The carrier has a first ring, the first ring has a through hole, and the at least one first hole is disposed in the first The through hole of the ring. The fixing body has a second annular ring, the second annular ring has a through hole, and the at least one second through hole is disposed at the through hole of the second annular ring. The first ring has a first surface, and the second ring has a second surface opposite to the first surface. [0089] The carbon nanotube structure is at least one carbon nanotube membrane, at least one nanocarbon pipeline, or at least one nanocarbon tubular network. The at least one carbon nanotube membrane or at least one nano-barrier line is directly extracted from a nanometer carbon nanotube array. The carbon nanotube network structure is composed of the at least one nanocarbon line woven or combined in a certain order. [0090] The step of laminating the fixed body and the carrier further comprises treating the carbon nanotube structure with an organic solvent. When the fixing body is stacked with the carrier, the edge of the fixing body forms a line-to-face contact with the edge of the carrier, which is advantageous for achieving alignment between the fixing body and the carrier, in particular It is a reality that the first through hole and the second through hole are aligned. Referring to FIG. 14, the embodiment specifically provides a method for preparing the TEM micro-gate 60 described above. The preparation method comprises the steps of: (W10) providing the carrier 610, a carbon nanotube structure 622, and the fixing body 630; (W20) laminating the fixing body 630 and the carrier 610, and arranging the nai The carbon nanotube structure 622 is disposed between the carrier 610 and the fixed body 630; and (W30) the carrier 610 and the fixed body 630 are soldered and fixed. 099112611 Form No. A0101 Page 32 / Total 56 Page 0992022305-0 201137921 [0093 The carbon nanotube structure 622 in the step (W10) and the preparation method thereof are the same as the carbon nanotube structure 522 in the preparation method of the TEM microgrid 50 provided in the fifth embodiment, and a preparation method thereof. The first ring 612 has a first surface 618, and the first surface 618 is a flat surface. The second ring 632 has a second surface 638. The second surface 638 is a curved surface or a ridge line. The shape may be in line-to-face contact with the first surface 618 of the first ring 612. [0094]

[0095]

It will be appreciated that the carbon nanotube structure 62 may also be at least one carbon nanotube network or one nanocarbon line. The step (W20) includes the steps of: (W21) disposing the carbon nanotube structure 622 on the first surface 618 of the first ring 612 of the carrier 610; (W22) being placed in a container 66〇 The organic solvent 662 processes the carbon nanotube structure 622 covering the first through hole 616 of the carrier 610; (W23) ruining the excess carbon nanotube structure 622 to form the carbon nanotube support 髅The fixing body 630 is disposed on the carbon nanotube support 620 such that the second through hole 636 is at least partially overlapped with the first through hole 616. Specifically, the step (W24) causes the second surface 638 of the second ring 632 to face the "" surface 618 of the first ankle ring 612, and the second through hole 636 is The first through holes 616 are arranged in an overlapping manner one by one. The method specifically adopted in the steps (W21) to (W23) is the same as the method adopted in the evenings (S21) to (S23). The order of the fewer spines (W21), (W22), and (tf23) can be determined as needed. For example, 099112611, the sequence of the nightmare (W21) and the step (W22) can be interchanged with the form number A0101, page 33 / 56 pages 0992022305-0 201137921, that is, the carbon nanotube structure can be treated first with an organic solvent. 622, and then the carbon nanotube structure 6 22 is disposed on the surface of the carrier 610. [0096] Step (W30) specifically includes the following steps: First, a pressure is applied to the first ring 612 and the second ring 632 by a welding system such that the first surface 618 of the first ring 612 is The second surface 638 of the second ring 632 is in line contact; then, welding is performed at a line contact of the first surface gig of the first ring 612 with the second surface 638 of the second ring 632. During the welding process, a large amount of heat is generated at the line contact, and the materials of the first ring 612 and the second ring 632 in the hottest region of the center are quickly heated to a molten state to continue to apply pressure. After the ring 612 and the second ring 632 are cooled, the first ring 612 and the second ring 632 are welded together to form the welding element 640· at the weld. Therefore, the material of the welding element 640 is the same as that of the first ring 612 and the second ring 632. In the present embodiment, the welding system is a spot welding machine, and the welding element 640 is a solder joint. In this step (W30), the contact between the carrier 610 and the fixed body 630 is made by the contact of the wire with the plane, and the alignment of the carrier 61〇 and the fixed body 630 can be relatively easily realized. [0097] In addition, when the carbon nanotube structure 622 provided in the step (W1) comprises a plurality of carbon nanotube membranes or a plurality of nano carbon pipelines, or a plurality of nanotube networks, The preparation method of the transmission electron micro-figure 60 can also be: the step (W10) remains unchanged. The step (w2〇) can be performed by passing a portion of the carbon nanotubes in the nano-tube structure 6 2 2 a gentleman is placed on the first through hole 616 of the carrier 61〇, and another part of the carbon nanotube structure in the carbon nanotube structure 622 is disposed on the second through hole of the fixed body 63〇. 636. Then, the fixed body having a carbon nanotube structure 099112611 Form No. A0101 Page 34 / 56 pages 0992022305-0 201137921 [0099] G [0100] 630 is directly opposite to the carrier 610 having a carbon nanotube structure The carbon nanotube support 620 is disposed and formed such that the carbon nanotube support 62 is clamped between the carrier 610 and the fixed body 630. The present invention also provides a method for preparing a plurality of TEM micro-gates 60, the method comprising the steps of: (ff 11 0 ) providing a plurality of spaced-apart carriers 610, each carrier 610 having a --via 616 (W120) providing a carbon nanotube structure 622, and covering the first via hole 616 of the plurality of carriers 610 with the carbon nanotube structure 622; (W130) providing a plurality of fixing bodies 630' for each The fixing body 63〇 is disposed in a corresponding manner with the carrier 610 such that the carbon nanotube structure 622 is disposed between the plurality of carriers 61〇 and the plurality of fixing bodies 63〇; (W140) each fixed The body 63〇 is welded and fixed to the intercepting vessel 61; and (W150) the carbon nanotube structure 622 between the plurality of carriers 61〇 is broken, thereby forming a plurality of transmission electron micromirrors 6〇. Wherein the steps (W11), (wl2〇), and (W150) are the same as the steps of the steps (S110)' (si2〇) and (S140), wherein the carrier 61Ό and the fixed The body 63{) may be a separate, separate structure; it may also be a body structure. The embodiment of the step (W130) is substantially the same as the step of the step (W24). Wherein the number of the fixed bodies 630 is the same as the number of the carriers 610. Each of the carriers 61 is stacked with a fixed body 630. Embodiments and steps (W3) of the step (W140) The implementation is basically the same. Each carrier 61 is welded to a fixed body 63. 099112611 Cousin No. A0101 Page 35 / Total 56 Page 0992022305-0 [0101] 201137921 [_ It can be understood that the second embodiment, the third embodiment, the fourth embodiment q The fifth embodiment can also be made by the above method The carrier and the fixed body are welded together to prepare a transmission electron microscope microgrid. It will be understood that the structure of the carrier and the anchor in the embodiment of the invention may be interchanged. The TEM micro-gate provided by the embodiment of the present invention and the preparation method thereof have the following advantages: the carbon nanotube structure is disposed between the carrier and the fixed body, and when the TEM micro-gate is used The device for holding the TEM microgrid can be prevented from directly contacting the nano carbon tube structure, and the nano carbon tube structure is drifted due to the light weight of the carbon nanotube structure, and the pair of holding devices is also reduced. The contamination of the carbon nanotube structure is beneficial to improve the accuracy and resolution of the composition analysis using the transmission electron microscopy of the TEM. Secondly, the carrier and the fixing body are fixed together by snapping, welding, etc., so that the carbon nanotube structure is fixed between the carrier and the fixed body, and the carbon nanotube structure is not drifted, thereby being more advantageous. The accuracy and the degree of disassembly of the TEM are improved by using the TEM of the TEM micro-gate. Thirdly, the method for preparing the TEM micro-gate provided by the embodiment of the present invention is simple, quick, and relatively easy to make the The carbon nanotube structure is fixed in the TEM micro-gate, and it is relatively easy to achieve alignment between the carrier and the fixed body, and in particular, it is relatively easy to achieve precise alignment of the first through hole and the second through hole. [0104] In summary, the present invention has indeed met the requirements of the invention patent, and the patent application is filed according to law. However, the above description is only a preferred embodiment of the present invention, and it is not possible to limit the scope of the patent application of the present invention. Equivalent modifications or variations made by those skilled in the art in light of the spirit of the invention are intended to be included within the scope of the following claims. 099112611 Form No. A0101 Page 36 of 56 0992022305-0 201137921 t Brief Description of Drawings [0105] FIG. 1 is an exploded perspective view of a TEM micro-gate provided by a first embodiment of the present invention. 2 is a perspective view of a TEM micro-gate provided by a first embodiment of the present invention. 3 is an exploded perspective view of a TEM micro-gate provided by a second embodiment of the present invention. 4 is a perspective view of a TEM micro-gate provided by a second embodiment of the present invention. [0109] FIG. 5 is an exploded perspective view of a TEM micro-gate provided by a third embodiment of the present invention. 6 is a perspective view of a TEM micro-gate provided by a third embodiment of the present invention. 7 is a perspective exploded view of a TEM micro-gate provided by a fourth embodiment of the present invention. 8 is a perspective view of a TEM micro-gate provided by a fourth embodiment of the present invention. 9 is a perspective exploded view of a TEM micro-gate provided by a fifth embodiment of the present invention. 10 is a perspective view of a TEM micro-gate provided by a fifth embodiment of the present invention. [0115] FIG. 11 is a flow chart showing the preparation of a TEM micro-gate provided by a fifth embodiment of the present invention. [0117] FIG. 1 is a perspective view of a carrier and a fixed body in a TEM microgrid according to a sixth embodiment of the present invention. 13 is a cross-sectional view of a TEM micro-gate provided by a sixth embodiment of the present invention. 099112611 Form No. A0101 Page 37/56 of 0992022305-0 [0117] FIG. 14 is a sixth embodiment of the present invention. Flow chart of preparation of TEM micro-gate. [Description of main component symbols] [0119] Transmission electron microstrip: 1 〇; 20; 30; 40; 50; 60 [0120] Carrier: 110; 210; 310; 410; 510; 610 [0121] Body: 111; 211; 311; 511; 611 [0122] First ring: 112; 212; 312; 412; 512; 612 [0123] First mesh structure: 114; 314; 514; 614 [0124] a through hole: 116; 216; 316; 416; 516; 616 [0125] slit: 118; 218; 318; 418; 518 [0126] carbon nanotube support: 120; 220; 320; 420; 520; 620 [0127] Fixed body: 130; 230; 330; 430; 530; 1 with 0 [0128] Second disk-shaped body: 131; 231; 431; 531; 631 [0129] Second ring: 132; 332; 432; 532; 632 [0130] second mesh structure: 134; 534; 634 [0131] second via: 136; 236; 336; 436; 536; 636 [0132] snap: 138; ; 338 ; 438 ; 538 [0133] Third through hole: 150 [0134] First line structure: 214 099112611 Form number A0101 Page 38 / Total 56 page 0992022305-0 201137921

[0138] [0140] [0143] [0143] Second strip structure: 234 Third through hole: 250 Folding portion: 5 5 0 First surface: 618 carbon nanotube structure: 522; 622 second surface: 638 welding component: 640 container: 560; 660 organic solvent: 562; 662 ❹ 099112611 Form No. A0101 Page 39 / Total 56 Page 0992022305-0

Claims (1)

201137921 VII. Patent application scope: 1. A method for preparing a transmission electron microstrip, comprising the steps of: providing a carrier, a carbon nanotube structure, and a fixing body, the carrier having a first through hole, the fixing The body has a second through hole; the fixing body is laminated with the carrier, and the carbon nanotube structure is disposed between the carrier and the fixed body; and the carrier and the fixed body are welded fixed. 2. The method of preparing a TEM microgrid according to claim 1, wherein the carbon nanotube structure comprises at least one carbon nanotube film directly extracted from the carbon nanotube array or at least One nanometer obstructs the pipeline. 3. The method of preparing a TEM micro-gate according to claim 2, wherein the carbon nanotube structure is a nano-carbon tube network structure composed of at least one nano carbon line. 4. The method of preparing a TEM micro-gate according to claim 1, wherein the step of laminating the fixed body and the carrier comprises covering the carbon nanotube structure with the carrier. A step of a through hole. 5. The method of producing a TEM microgate according to claim 4, further comprising the step of treating the carbon nanotube structure covering the first through hole of the carrier with an organic solvent. 6. The method for producing a TEM micro-gate according to claim 1, wherein, when the fixing body and the carrier are stacked, the second through hole of the fixing body and the carrier are A through hole at least partially overlaps. 7. The method for producing a TEM micro-gate according to claim 1, wherein the edge of the fixed body forms a line and a surface with the edge of the carrier when the fixed body is stacked with the carrier. s contact. The method of preparing a TEM micro-gate according to claim 7, wherein the carrier includes a first ring 'the first The ring has a first surface; the fixed body includes/the second ring, the second ring has a second surface disposed opposite the first surface of the first ring, the nanocarbon The tube structure is disposed between the first surface of the first ring and the second surface of the second ring such that the second surface forms a line-to-face contact with the first surface. The method of manufacturing the TEM micro-gate according to Item 8, wherein the first surface of the first ring is a plane, and the second surface of the second ring is a curved surface. Or edge. 10 . A method for preparing a TEM micro-grid comprises the steps of: providing a plurality of spaced-apart carriers each having a first through-hole; providing a carbon nanotube structure to cover the carbon nanotube structure a plurality of first through holes of the plurality of carriers; a plurality of fixing bodies are provided, each of the fixing bodies having a second through hole, such that each of the fixing bodies and the carrier are stacked correspondingly, so that the carbon nanotube structure Provided between the plurality of carriers and the plurality of fixing bodies; 焊接 fixing each of the fixing bodies to the carrier, and disconnecting the carbon nanotube structure between the plurality of carriers, Thereby a plurality of TEM micro-gates are formed. 11. The method for preparing a TEM micro-grid according to the invention of claim 1, wherein the method of disconnecting the carbon nanotube structure between the plurality of carriers is to irradiate the adjacent carrier with a laser beam The structure of the carbon nanotubes between them. The method for preparing a TEM micro-gate according to claim 10, wherein the method of disconnecting the carbon nanotube structure between the plurality of carriers is to use a laser beam along each carrier The edge of the carrier is closed along the outer edge of the carrier covering the carrier 099112611 Form No. A0101 Page 41 / Hing 56 Page 0992022305-0 201137921. 099112611 Form No. A0101 Page 42 of 56 0992022305-0