TW201130733A - Methods and systems for producing silicon, e. g., polysilicon, including recycling byproducts - Google Patents

Abstract

Systems and processes are provided for efficient, cost-effective production of silicon by chemical vapor deposition. Reaction byproducts are recycled for use within the systems and processes without recovery and external processing of the byproducts. The systems and processes provide savings in both capital and operating costs.

Description

201130733 VI. Description of the Invention: TECHNICAL FIELD OF THE INVENTION The present invention relates generally to the field of systems and processes for making tantalum (e.g., polysilicon). In particular, the present invention relates to the manufacture of Shixia by chemical vapor deposition and the recycling of reaction by-products to improve the cost-effectiveness of the manufacture of Shixi. [Prior Art] Due to the use of germanium in various applications, particularly in the semiconductor and solar (i.e., photovoltaic) industries, the demand for germanium (particularly polycrystalline germanium) is extremely large. The semiconductor industry typically requires higher purity than is required by other industries, although other industries, such as those that manufacture solar wafers, are now using higher purity germanium. Due to the demand for sputum, manufacturing plants have been established all over the world. Facilities can be extremely large, designed to create dreams every year in thousands of public ridicule. The process for making polycrystalline germanium can be carried out in various types of reactors, including chemical vapor deposition reactors and fluidized bed reactors. Various aspects of the chemical vapor deposition (CVD) process (i.e., Siemens or "hotline" processes) are described, for example, in various U.S. patents or published applications (see, for example, U.S. Patent No. 3,011 , No. 877; No. 3, No. 99,534; No. 3,147,141; No. 4,15〇168; No. 4 179 53〇; No. 4,311,545; and No. 5,118,485). Both the ceramsite and the trioxane are used as feedstock for the production of polycrystalline germanium. It is easier to obtain as a high-purity raw material because it is easier to purify than sulphite. The production of trioxane introduces boron and phosphorus impurities, which tend to have a boiling point close to the boiling point of trioxane itself, which is difficult to remove. Although both methane and trichloromethane are used as starting materials in a Siemens chemical vapor deposition reactor, trioxane is more commonly used in such reactors. On the other hand, decane is a more commonly used raw material for the production of polycrystalline germanium in a fluidized bed reactor. Formane is deficient when used as a feedstock for chemical vapor deposition or fluidized bed reactors. The production of polycrystalline germanium from formane in a Siemens-type chemical vapor deposition reactor can require up to twice the electrical energy compared to the production of polycrystalline germanium from trioxane in this reactor. In addition, the cost of capital is high because the Siemens-type chemical vapor deposition reactor produces more than half of the polycrystalline germanium produced from trioxane only from trichloromethane. Therefore, in the manufacture of polycrystalline germanium from formane in a Siemens-type chemical vapor deposition reactor, any advantage arising from the higher purity of formane is offset by higher capital and operating costs. This has led to the use of trichloromethane as a feed for the production of polycrystalline germanium in such reactors. The use of formrolane as a raw material for the production of polycrystalline germanium in a fluidized bed reactor is advantageous in terms of electrical energy use as compared to manufacturing in a Siemens chemical vapor deposition reactor. However, there are disadvantages that offset the advantages of operating costs. In the fluidized bed reactor, the process itself can result in a lower quality polycrystalline ruthenium product, although the purity of the feedstock is high, for example, the process can form polycrystalline ruthenium dust, which can be formed in the reactor. The particulate material interferes with handling and can also reduce overall yield. In addition, polycrystalline germanium produced in a fluidized bed reactor may contain residual hydrogen which must be removed by subsequent processing. Further, the polycrystalline stone produced in the fluidized bed reactor may contain metal impurities due to the grinding condition in the fluidized bed. Therefore, although high purity 曱矽 152 152888.doc 201130733 alkane can be easily obtained, its use as a raw material for producing polycrystalline germanium in any type of reactor is limited by the disadvantages. In summary, the use of decane as a starting material for the production of polycrystalline germanium from a Siemens-type vapor deposition reactor or a fluidized bed reactor is limited due to cost and/or quality of the polycrystalline silicon produced. Therefore, there is still a need in the industry for a capital and operational cost-effective process for converting metaxane to polycrystalline oxime while retaining the high quality inherent in the use of formazan as a feedstock. The reaction occurring in the CVD reactor releases a gaseous material containing reaction by-products (i.e., excess reactants which are not converted in the CVD reactor) and an oily polymeric material such as a polyformamidine compound. By-products include various chloroxane (specifically, four gasified hydrazine) and hydrogenated hydrogen. Several methods have been proposed and utilized to improve the efficiency of such processes, reduce operating costs, and address environmental issues arising from the release and disposal of by-products from the manufacture of polysilicon. However, there is still a need for further improvements in process efficiency (including recycling by-products and reactants) as well as savings in plant construction and operating costs. Such improvements include, in particular, increased efficiency and cost savings associated with the reuse and/or disposal of by-products and excess reactants. The main cost of both plant construction and operation is the establishment and operation of facilities for the treatment of by-products (specifically, four gasification helium). In the production of polycrystalline spine by Cvd or Siemens process, even if the conversion system of the three gas stone to the stone eve is complete, almost every three moles will be produced for each moir deposited in the CVD reactor. A subsidiary of four gasification hydrazine. In fact, typically 20% or less of the trioxane is converted to helium in a single pass through the reactor. Conversion efficiency 152888.doc -6- 201130733 rate depends on various factors 'contains the composition of the gas delivered to the reactor, the reactor design and operating conditions, such as the ratio of the gas, temperature and pressure, however, regardless of conversion efficiency How, the stoichiometric ratio of the reaction in the reactor still determines that the tetrachloride should be the major by-product from the conversion in the reactor and is the major component of the gaseous material released from the CVD reactor. Typically, the components of the gaseous material are separated and recycled at a point back to the feed to the CVD reactor or recovered for other uses or discarded. In particular, the other components from the gaseous material are separated from the four gas fossils and discarded or reprocessed in a separate facility to convert them to triclosan as a feed back to the cvd reactor. If discarded, it is not only an environmental problem but also a significant proportion of the initial feed to the cvd reactor. Thus, more typically, four gas cuts from the recovery of gaseous materials released from the CVD reactor are reprocessed in a thermal converter in a physical and often geographically remote facility to form additional tripotaris. The heat exchanger usually has a temperature of more than 1 〇〇〇t: (the temperature can be achieved by passing electricity through the carbon electrode. The disadvantage of converting the four gas cut into three gas by using a heat exchanger therefore includes Extremely high electrical energy requirements, which represents a large proportion of the cost of operating a chemical vapor deposition polysilicon manufacturing facility. Furthermore, in this process, the heat exchanger typically only has about 20 〇/〇 per pass through the reactor. The fourth gasification fossil is converted into a triclosan and therefore needs to be separated, for example, by the steaming hall and passed multiple times. It is estimated that the cost of establishing a plant for thermal conversion of the four fossils is used to establish the entire The capital cost of the Jingshixi manufacturing facility is 10% to 2%. It is further estimated that the cost of operating the plant for thermal conversion of the four gas fossils is used to operate the entire polysilicon 152888.doc 201130733 The cost is 10% to 20%. In addition, due to the use of carbon electrodes, the trioxane produced in the heat conversion process can be contaminated by carbon/graphite in the process. The trioxane thus produced needs to be further pure. To produce materials of high purity suitable for manufacturing, for example, in semiconductors or increasingly for use in the solar industry, thereby increasing both capital and operating costs. Further disadvantages of using heat exchangers are The process produces a large amount of chloroformane by-product. Although dioxane can be converted to ruthenium in a CVD reactor, the ruthenium thus produced may not be in the required specification unless the process is extremely carefully controlled. It may also be in a polysilicon plant. In the upstream operation, an excess of a gas stone court is produced. Due to the excessive amount of dichlorite, it can usually be accumulated in the storage tank. Therefore, it must eventually be destroyed in an environmentally acceptable manner in, for example, a waste treatment facility. The large amount of dioxane accumulated, a practice widely used in the industry. Eliminating the process of producing excess dioxane and the need to discard this material will provide significant savings in operating polysilicon manufacturing facilities. The process not only produces gas decane as a field, but also produces gasification hydrogen. Hydrogen chloride also contains potentially useful components of the process for making polycrystalline germanium, that is, chlorine. Therefore, as with gaseous paraffin by-products, there is an advantage in recycling hydrogenated hydrogen. For example, due to gas-containing three gas The decane system is fed to the main reactants used to make the CVD reactor, so it is advantageous to recycle any by-products that can return gas to the b process. In addition, although there is a purified hydrogenation gas. Use in addition to polycrystalline spine manufacturing [However, such use requires purification of vaporized hydrogen. Therefore, the treatment of gaseous hydrogen by-products at 152888.doc 201130733 is suitable for other uses and usually requires the establishment and operation of additional facilities. Or at least an additional system to purify and store hydrogen chloride. Q For a variety of reasons, it may be advantageous to have the vaporized hydrogen return to a certain state of the polycrystalline process. However, the suitability for recycling hydrogen chloride depends on the process used to make the polysilicon. Certain processes for making polysilicon are susceptible to allowing gasification hydrogen to be efficiently and cost effectively recycled back into the process. However, since the reaction of vaporized hydrogen with various compounds in such processes (e.g., hydrazine or decane) can be highly pyrophoric, recycling can present challenges. For example, the recycling of hydrogen chloride can result in significant temperature increases within the system, requiring a cooling mechanism and/or careful control of the reaction conditions. Since some commonly used polycrystalline process processes involve exothermic reactions, facilities designed for such processes include systems for temperature control' specific cooling systems. Such systems can thus easily handle the increase in temperature that can result from the reaction that occurs as a result of recycling hydrogen chloride back to the processes. On the other hand, the polycrystalline germanium manufacturing process which does not contain a high exothermic reaction does not generate heat and thus does not require such a cooling system. Facilities designed for use in such processes may therefore be less suitable for recycling hydrogen chloride by-products. In various processes involving the manufacture of polysilicon, the method of making triclosan supplied to a CVD reactor differs in important respects. For example, in a common process, metallurgical grades of hydrazine react with hydrogenated hydrogen to form a three gas smoldering. This trioxane was fed to the CVD reactor after purification. Certain by-products of the CVD reaction (such as tetrachloride) in these processes are generally disposable or have associated disadvantages (including high capital costs during construction and energy costs between operating periods 152888.doc 201130733) In the case of heat conversion to trioxane. Other by-products such as hydrogen and hydrogenated hydrogen can be recycled back to some point in the process. By utilizing vaporized hydrogen in such polysilicon manufacturing facilities, by-product hydrogen chloride can be easily recycled back to the process. In particular, since the reaction of hydrogen chloride with metallurgical grades in such processes is highly heat-generating, the facility for making and forming polycrystalline germanium in accordance with such processes comprises a dedicated cooling system suitable for the treatment of recycled by-products of hydrogen chloride. The cost of establishing and operating such facilities is high due to cooling and energy requirements. The other of the current processes for making polycrystalline germanium combines metallurgical grades of helium gas and helium to produce three gas helium for the CVD reactor. In these processes, the 's Xuanxu reaction is endothermic. Accordingly, facilities designed to manufacture polycrystalline silicon by such processes do not have the same equipment and operational needs as are required for their equipment and operation designed for use with hydrogenated hydrogen. In particular, these facilities do not require a dedicated cooling system. Therefore, adapting the plants of these processes to the recycling of hydrogen chloride by-products will require considerable additional capital and operating costs and the introduction of intrinsic reactors due to the co-reaction of four gasification fossils with gasification hydrogen under significantly different fluidization methods. Sex. Therefore, different methods for recovering the use of hydrogenated hydrogen may be advantageous in a polysilicon manufacturing facility or process that is not designed and built for the treatment of the use of hydrogenated hydrogen, especially high heat generating reactions. SUMMARY OF THE INVENTION There is a need in the polysilicon industry for: (1) more cost-effective use of decane as a feedstock for CVD reactors; (2) use of thermal conversion in a dimethyl-based CVD-based CVD process Alternative method; (3) CVD system 152888.doc •10·201130733 lower capital and operating costs; (4) improved method for controlling the concentration of dioxane in trichloromethane fed to the cvd reactor; (5) An efficient method for recycling by-products from a CVD reactor, specifically four gasification fossils and hydrogenated hydrogen; and (6) more cost-effectively producing high purity polycrystalline bites. An improved process for treating ruthenium tetrachloride and gasification produced during the manufacture of polycrystalline germanium in a chemical vapor deposition facility can provide both capital and operating cost savings. For example, eliminating the need to thermally convert helium tetrachloride to trioxane provides a cost savings of 101⁄4 to 20% compared to typical facilities for the production of polycrystalline germanium by chemical vapor deposition. Significant cost savings can also be achieved by controlling the gas balance throughout the process (e.g., by limiting the generation of hydrogenated hydrogen and optimally recycling hydrogenated hydrogen). This method can result in an additional 10% to 2% savings in the cost of making polysilicon. Eliminating the requirement for co-reaction with tetrachloride and hydrogenation using the methods described herein will allow for better plant utilization with less due to downtime. In addition, the use of higher purity formrolane in this improved process employing a chemical vapor deposition reactor (e.g., a Siemens reactor) provides a suitable solution for applications requiring higher purity rhodium. A method for producing a crucible can be summarized as comprising: feeding a disproportionation reactor of one of a calcined and a gasified crucible by a disproportionation reactor; from the disproportionation by a chemical vapor deposition reactor One of the reactors performs a chemical vapor deposition to deposit ruthenium on one of the substrates in the chemical vapor deposition reactor; and recovers ruthenium from the chemical vapor deposition reactor. The X method can be improved comprising: separating the hydrogen from the chemical vapor phase-by-product mixture comprising hydrogen and four gas fossils to produce a composition comprising four gas fossils 152888.doc 201130733; by a disproportionation reactor a pre-methane/gas hexane mixer mixing the composition comprising four gasified ruthenium and a composition comprising one of the decane to produce the disproportionation reactor feed comprising decane and ruthenium hydride; by a disproportionation reactor The front temperature controller controls the temperature of the disproportionation reactor feed including the calcite and the four gasification fossils; and the disproportionation reactor including the formazan and the four gasification crucible is fed by the disproportionation reactor The components react to form a disproportionation reaction product including dioxane, trioxane, and tetragas. Mixing The composition comprising four gas fossils and one of the compositions comprising a smash may comprise mixing a composition comprising one of dioxane with one of the compositions comprising decane. Mixing the composition comprising four gasified ruthenium with one of the compositions comprising decane may comprise mixing a composition comprising one of trioxane with one of the compositions comprising decane. Mixing the composition comprising tetragassing ruthenium with one of the compositions comprising decane may comprise mixing a composition comprising one of vaporized hydrogen with one of the compositions comprising decane. Mixing the composition comprising four gasified hydrazines with a group of CT materials comprising metformin may comprise mixing a composition comprising one of liquid or vapor gangue with a composition comprising one of liquid or vapor four gasified hydrazine. Mixing the composition including the four gasification enthalpy and one of the materials; the composition of one of the g-yards may comprise one of the ranges from about 10 s/m2 to about 500 psig. The composition comprising decane and the composition comprising ruthenium tetrachloride are supplied to the disproportionation reactor pre-methane/chloromethane mixer and the disproportionation reactor or both. The composition of the pupate and the inclusion of decane, and may be included in a range from about 50 psig to about 300 psig. The composition and the composition comprising the four gas cuts are provided to the disproportionation reactor before one or both of the calculus/152888.doc •12·201130733 gas stone simmering mixer and the disproportionation reactor Mixing the composition comprising four gasified hydrazines with a composition comprising one of the decanes may comprise at a pressure ranging from about 150 psig to about 200 psig. The composition of formoxane and the composition comprising four gasified hydrazine are supplied to the disproportionation reactor One or both of a methotane/gas decane mixer and the disproportionation reactor. The composition comprising four gasification fossils and one of the compositions comprising metformane may be included in a table of about 18 psig. Providing the composition comprising a waste stone and a composition comprising four gas fossils to one or both of the disproportionation reactor pre-methane/gas decane mixer and the disproportionation reactor at a pressure of one pressure Mixing the composition comprising four gasified ruthenium with one of the compositions comprising decane may comprise a pressure in the range from about 5 psig to about 2500 hr/square gauge. The composition comprising decane and the composition comprising tetragassed hydrazine are provided to one or both of the disproportionation reactor pre-decane/chloromethane mixer and the disproportionation reactor. The mixing includes four gases. The composition of the fossil eve and the composition comprising a kiln may comprise decane including a pressure from about 1500 psig to about 25 psig. The composition and the composition comprising ruthenium tetrachloride are provided One or both of the disproportionation reactor front formazan/gas decane mixer and the disproportionation reactor. The composition comprising the four mouse fossils and the composition comprising the smectite may be included in the self. The composition comprising decane and the composition comprising decane gas are supplied to the disproportionation reaction at a pressure of about 1 800 cc/square gram. gauge to a range of about 2200 cc/square inch gauge pressure. One or both of the pre-methane/gas hexane mixer and the disproportionation reactor. The mixture includes four gasification fossils 152883.doc •13· 201130733 The composition and the 曱矽 :: one composition can be The composition comprising metformane and the composition comprising tetragas hydride are provided to the disproportionation reactor pre-decane/gas decane mixer and the disproportionation at a pressure of about 2000 psig. One or both of the reactors. The disproportionation reactor can comprise a catalyst. The catalyst may comprise a polymeric ion parent exchange resin. The catalyst can comprise a metal. The catalyst can comprise copper. The catalyst can comprise substantially pure germanium implanted with copper. Controlling the temperature of the disproportionation reactor feed comprising decane and tetragassing ruthenium can comprise controlling the temperature of the disproportionation reactor feed to be in a range from about 55 ° C to about 500 ° C. Controlling the temperature of the disproportionation reactor feed comprising a mixture of formane and tetragas hydride may comprise controlling the temperature at which the disproportionation reactor is fed from from about 300 °C to about 500. (in one of the ranges. controlling the temperature of the disproportionation reactor feed comprising the mixture of formane and tetragas hydride may comprise controlling the temperature of the feed to the disproportionation reactor from about 300 ° C to In the range of about 400 ° C. controlling the temperature of the disproportionation reactor feed comprising the mixture of formane and ruthenium tetrachloride may comprise controlling the temperature of the feed to the disproportionation reactor to be about 20 Torr. 〇 to about 300. (in one of the ranges. controlling the temperature of the disproportionation reactor feed comprising the mixture of decane and tetra-vaporized ruthenium may comprise controlling the temperature of the feed to the disproportionation reactor to be self-contained From 90 ° C to about 200. (in one of the ranges. controlling the temperature of the disproportionation reactor feed comprising the mixture of decane and four gas fossils may comprise controlling the temperature of the disproportionation reactor feed to In a range from about 3 〇 cC to about 9 〇〇 c. controlling the temperature of the disproportionation reactor feed comprising the mixture of methotrexate and tetragas hydride may comprise the temperature at which the disproportionation reactor is fed 152888.doc • 14· 201130733 Control at about 5 5 °C In the range of about 75 ° C. controlling the temperature of the disproportionation reactor feed comprising the mixture of the stone and the gasification of the gas, the temperature of the feed to the disproportionation reactor may be controlled at In a range from about 6 〇t: to about 7 〇. controlling the temperature of the disproportionation reactor feed comprising the mixture of formane and ruthenium tetrachloride may comprise the temperature at which the disproportionation reactor is fed • Degree control is about 60° C. Mixing a composition comprising one of decane and one of the compositions comprising four vaporized hydrazine may comprise a combination comprising one of gas phase, one liquid phase and one gas-liquid mixed phase comprising methotane And a composition comprising a gas phase, a liquid phase and a gas-liquid mixed phase comprising ruthenium tetrachloride. The method may further comprise controlling the composition comprising the composition of the four gasified ruthenium or comprising four gas fossils The rate at which the composition is supplied to the disproportionation reactor pre-methane/chloromethane mixer is such that the ratio of gas to enthalpy in the disproportionation reactor feed comprising the mixture of formane and tetra-glycine is about 2: a range between 1 and about 3.9:1, including stone The ratio of the gas to the enthalpy in the disproportionation reactor feed of the mixture of the four gasification fossils may be in the range of about 2:5 and about 3 m. The disproportionation of the mixture including the meson and the four gas cuts ^ The ratio of the gas to the stone in the feed of the reactor may be in the range of about 28:1 to about 3.3: ι. The gasification of the disproportionation reactor of the mixture including the stone stalk and the tetrachloride sulphate The ratio to Shi Xi may be about η: the ratio of the gas in the disproportionation reactor of the disproportionation reactor including the meteorite and the four gas fossils may be about 3:1 〇句庄甲功The ratio of chlorine to diarrhea in the disproportionation reactor feed of the mixture of η η 矽 矽 矽 及 及 及 及 及 及 及 及 及 及 及 及 及 可 可 可 可 可 可 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 The ratio of the gas in the disproportionation reactor feed to Shi Xizhi is 152888.doc •15- 201130733 The ratio can be about 3.3:1. The method may further comprise separating the gasification enthalpy of the gas from the product of the disproportionation reaction in a post-disproportionation reactor to produce a disproportionation reactor, and enriching the gas stream and the disproportionation reactor. It is then rich in a stream of three gas decane. The method may further comprise adjusting the strontium pentoxide content of the disproportionation reactor feed using the four gas enthalpy separated from the product of the disproportionation reactor in the post-disproportionation reactor. The process may further comprise separating the dioxane from the dioxane-rich stream after the disproportionation reactor and the dioxane separator to produce a dioxane-rich stream after the disproportionation reactor. The method can further include: determining a concentration of dioxane in a feed to the chemical vapor deposition reactor; and adjusting the concentration of dioxane in the feed to the chemical vapor deposition reactor. Adjusting the concentration of dioxane in the feed to the chemical vapor deposition reactor can comprise adding a stream of dioxane-rich stream after the disproportionation reactor to the feed to the chemical vapor deposition reactor. Adjusting the concentration of dioxane in the chemical vapor deposition reactor may comprise dioxane separating the chemical vapor deposition reactor effluent mixture from which hydrogen and vaporized hydrogen have been removed. The method may further comprise separating the dioxane from the trioxane in the trichloromethane-rich stream after the disproportionation reactor and the dichlorosilane/trioxane separator to produce a disproportionation reactor. A material rich in dioxane/trioxane depleted and a disproportionation reactor rich in trioxane/dioxane depleted material. The disproportionation reactor is enriched with dioxane/three 152888.doc -16·201130733 The chlorodecane depleted material can be substantially pure dioxane. The method can further comprise determining a concentration of dioxane in the material depleted of the dichlorinated/trioxane depleted material after the disproportionation reactor. The method can further comprise determining a concentration of trioxane in the material rich in triclosan/dioxane depleted after the disproportionation reactor. The method can further comprise storing the dioxane/trioxane depleted material in a dioxane storage system. The method can further comprise storing the trioxane/dichlorodecane depleted material in a trioxane storage system. The method may further comprise: mixing the dichlorodecane/trioxane-depleted material with the trioxane/dichlorodecane-depleted material to produce a chemical vapor deposition reactor feed; Supplying the feed to the chemical vapor deposition reactor" mixing the dioxane/trioxane depleted material with the trioxane/dichlorodecane depleted material may comprise mixing from the second gas A material rich in dioxane/trioxane depleted in a decane storage system. Mixing the material rich in dichao/three gas depleted and the trioxane/dioxane depleted material may comprise mixing trioxane/rich gas from the trioxane storage system. Dioxane depleted material. Mixing the material of the smear, squirting, squeezing, squeezing, squeezing, squeezing, squeezing, squeezing, squeezing The material may comprise adjusting a ratio of gas to stone in the feed of the chemical vapor deposition reactor. The method may further comprise: gasifying the disproportionation reaction product in a CVD reactor pre-gasifier to produce a gasification disproportionation reaction product; mixing hydrogen 152888.doc -17· 201130733 gas with the gasification disproportionation reaction product Generating a mixture of argon gas and disproportionation reaction product; and performing chemical vapor deposition on the mixture of hydrogen gas and disproportionation reaction product by the chemical vapor deposition reactor to deposit ruthenium in the chemical vapor deposition reactor On the substrate. The mixed hydrogen and the vaporized disproportionation reaction product may comprise a mixture of hydrogen and the gasified disproportionation reaction product by a CVD reactor premixer. The mixed hydrogen and the gasified disproportionation reaction product may comprise a mixture of hydrogen and the vaporized disproportionation reaction product in the chemical vapor deposition reactor. The method can further comprise releasing one or more of the effluent mixture comprising: hydrogen, tetrachloride, and gasification hydrogen, dichlorodecane, and trioxane from the chemical vapor deposition reactor. The method can further comprise cooling the effluent mixture from the chemical vapor deposition reactor by a first chiller after a CVD reactor to produce a gas-liquid two phase mixture. The method can further include removing the oily contaminant comprising the polymethylmethane alkyl material from the effluent mixture cooled by the first cooler. The method can further comprise separating the gas-liquid two phase mixture from the first cooler by a CVD reactor post-decant to produce a gas phase and a liquid phase. The method can further comprise converting the gas phase from the decanter into a gas-liquid two phase mixture by a CVD reactor post compressor. The method can further comprise cooling the gas-liquid two phase mixture or the gas phase from the compressor by a second chiller after a CVD reactor. The method may further comprise: supplying the effluent mixture from the chemical vapor deposition reactor 152888.doc -18-201130733 to a CVD reactor followed by an in-situ gasification hydrogen reactor; and by the CVD reactor An in situ gasification hydrogen reactor converts the vaporized hydrogen from the effluent mixture from the chemical vapor deposition reactor to gas decane. The residence time of the effluent mixture from the chemical vapor deposition reactor in the in situ gasification hydrogen reactor after the CVD reactor may be less than about 1 minute. The residence time of the effluent mixture in the in situ gasification hydrogen reactor after the CVD reactor can be less than about 5 minutes. The residence time of the effluent mixture in the in situ hydrogen chloride reactor after the CVD reactor can be less than about 1 minute. The residence time of the effluent mixture in the in situ gasification hydrogen reactor after the CVD reactor can be less than about 5 minutes. The residence time of the effluent mixture in the in situ gasification hydrogen reactor after the CVD reactor can be less than about one minute. The method may further comprise, after supplying the effluent mixture from the chemical vapor deposition reactor to the CVD reactor, the in situ gasification hydrogen reactor J is heated by the in situ gasification hydrogen reactor heat exchanger. Chemical gas, the effluent mixture of the deposition reactor. The effluent from the chemical vapor deposition reactor is heated by a __ in situ gasification nitrogen reactor heat exchanger. The effluent mixture from the chemical vapor deposition reactor may be heated to a temperature ranging from about 2 Torr (TC to about 7 Torr (in one of the ranges of rc. Heated by an in situ hydrogen chloride reactor heat exchanger) From the chemical vapor deposition reaction, the effluent mixture may comprise heating the muscle exudate mixture from the chemical vapor deposition reaction to a range from about 3 Torr to about 6 Torr. ^ a temperature-producing bismuth / dish again. The effluent mixture from the X-form vapor deposition reactor heated by an in-situ hydrogen chloride reactor heat exchanger may comprise chemical vapor deposition from the 152888.doc 19 201130733 The effluent mixture of the reactor is heated to a temperature of about 500° C. The in-situ gasification hydrogen reactor heat exchanger supplies the effluent mixture from the chemical vapor deposition reactor to the CVD reactor The in-situ gasification hydrogen reactor previously exchanges heat from one of the in-situ gasification hydrogen reactor effluent from the CVD reactor to the effluent mixture from the chemical vapor deposition reactor. The method can be further included in through The in-situ gasification hydrogen reactor heat exchanger supplies the effluent mixture from the chemical vapor deposition reactor to the CVD reactor and then activates the heater after a CVD reactor before in-situ gasification of the hydrogen reactor Heating the effluent mixture from the chemical vapor deposition reactor. The method may further comprise: cooling a effluent from the in-situ gasification hydrogen reactor from the CVD reactor by a first chiller after a CVD reactor Mixing to produce a gas-liquid two-phase mixture; separating the gas-liquid two-phase mixture from the first cooler by a CVD reactor post-decanter to produce a gas phase and a liquid phase; by a CVD reactor a post-compressor converting the gas phase from the decanter into a gas-liquid two-phase mixture or a gas phase; and cooling the gas-liquid two-phase mixture from the compressor system by a CVD reactor followed by a second cooler The method may further comprise separating hydrogen from the chemical vapor deposition reactor effluent mixture by a hydrogenation reactor after a CVD reactor to produce a CVD reactor followed by a hydrogen-rich stream and a CVD reaction. After the argon gas is exhausted, the concentration of the four gasified ruthenium in the hydrogen-rich stream after the CVD reactor may be less than 15 weight percent. The CVD reactor is rich in hydrogen gas in the middle of the gas 152888.doc - 20- 201130733 The concentration of the plutonium may be less than 10% by weight. The concentration of the four gasified ruthenium in the hydrogen-rich stream after the CVD reactor may be less than 5% by weight. The CVD reactor is rich in hydrogen flow. The concentration of the middle gasification enthalpy may be less than 1 weight percent. The concentration of the four gasified ruthenium in the hydrogen-rich stream after the CVD reactor may be less than 0.1 weight percent. The method may further comprise a CVD reaction The pre-mixer mixes the hydrogen-rich stream after the CVD reactor is enriched with a stream of trioxane, which is a disproportionation reactor from a helium tetrachloride separator after a disproportionation reactor. The method may further comprise a hydrogen gas depletion stream after mixing the CVD reactor by a disproportionation reactor front gas decane mixer and a disproportionation reactor after the disproportionation reactor from the disproportionation reactor The flow of phlegm. The method may further comprise determining the hydrogen depleted stream after the CVD reactor and the disproportionation reactor after mixing the hydrogen depleted stream after the CVD reactor and the stream of the four gasification enthalpy after the disproportionation reactor It is rich in the amount of elemental stone and elemental gas in the stream of four gasification enthalpies. The method may further comprise: mixing a certain amount of the hydrogen depleted stream after the CVD reactor by the disproportionation reactor pre-gas decane mixer; the disproportionation reactor is enriched with a stream of four gasification hydrazine; and, if desired, Purifying one of a mixture of one or more of purified gasified ruthenium, trioxane, dioxane or purified antimony tetrachloride, trioxane or dioxane; and controlled from each source The amount of elemental gas and elemental enthalpy supplied is maintained to maintain a selected ratio of chlorine to enthalpy in the feed to the disproportionation reactor.

The method may further comprise separating the gasification hydrogen from the hydrogen depleted stream after the CVD reactor by a CVD reactor to produce a CVD 152888. Doc -21- 201130733 After the reactor is depleted of hydrogen, rich in hydrogenated hydrogen and a hydrogen depleted gas stream after a CVD reactor. The method can further comprise transporting the hydrogen depleted, hydrogen rich hydrogen-rich stream from the CVD reactor to the hydrogen sulfide storage system after the CVD reactor. The method may further comprise transporting the hydrogen depleted, vaporized hydrogen depleted stream from the CVD reactor to the hydrogenation separator after the CVD reactor to a procarbation reactor pre-gas decane mixer. The method may further comprise separating the four gasified ruthenium from the hydrogen depleted, vaporized hydrogen depleted stream of dichlorosilane and trichlorosilane by a CVD reactor post-gas stream separator to produce a CVD reactor. The ruthenium tetrachloride-rich stream and a CVD reactor are rich in dioxane and a gas rich in trioxane. The method may further comprise separating the dioxane to produce a CVD from the trioxane in the dioxane-rich, trichlorodecane-rich stream after the CVD reactor by a dioxane/trioxane separator. The reactor is enriched in a stream of dioxane and a stream rich in trioxane after a CVD reactor. The method may further comprise mixing the stream of trichloromethane-rich stream after the CVD reactor with a stream of trichloromethane-rich stream after a disproportionation reactor. The method may further comprise mixing the stream of four vaporized helium with the stream of dioxane rich after the CVD reactor by mixing the CVD reactor with a post-chlorocycler mixer in a CVD reactor. Mixing the ruthenium tetrachloride-rich stream with the chloranil-rich stream by a CVD reactor post-gas decane mixer comprises selecting a quantity of dioxin broth and adding the amount of dioxin to the broth The CVD reactor is followed by a gas decane mixer, thereby controlling the disproportionation reactor and the chemical vapor phase 152S88. Doc -22- 201130733 The concentration of dioxane in this feed to the deposition reactor. The concentration of dioxane in the feed to the chemical vapor deposition reactor can include controlling the ratio of gas to helium in the feed to the disproportionation reaction. Controlling the ratio of chlorine to # in the feed to the disproportionation reactor can include controlling one of the replenishment of the gasification cesium, trioxane, and dioxane added to the feed to the disproportionation reactor or More. The method can further comprise supplying dichloromethane from the dioxane/trioxane separator to the chemical vapor deposition reactor. Dioxane from the dioxane/dioxane separator is supplied to the chemical vapor deposition reactor and the concentration of dioxane in the feed to the chemical vapor deposition reactor. The method can further comprise storing all or a portion of the dichlorosilane in a dioxane storage system or disposing the dioxite by a dichlorosilane treatment system. The method may further comprise: separating hydrogen and hydrogen chloride from the chemical vapor deposition reactor effluent mixture by a hydrogenation/hydrogenation hydrogenation reactor to produce a hydrogen/hydrogen-rich hydrogen stream and a hydrogen/vaporized hydrogen depleted stream; separating the hydrogen from the hydrogenated hydrogen/hydrogenated hydrogen stream by a CVD reactor prehydrogen/gasification hydrogen separator; and The vaporized hydrogen of the hydrogen/gasification hydrogen separator in front of the CVD reactor is sent to a hydrogen chloride storage system. The method may further comprise mixing the hydrogen from the hydrogen/gasification hydrogen separator before the CVD reactor and the disproportionation reactor from the gasification ruthenium separator after the disproportionation reactor by a Cvd reactor premixer Rich in three gas 152888. Doc -23- 201130733 The flow of decane. The method may further comprise: feeding the gas-depleted, gas-rich hydrogen-rich stream and the gastrope from the gasification hydrogen separator of the CVD reactor to a procarbation reactor before the metformin/hydrogenation reaction And the decane/hydrogenation reactor is reacted with the vaporized hydrogen by the disproportionation reactor to produce a gas decane comprising dioxane and tetragas hydride. The temperature of one of the pre-methane/hydrogen chloride reactors in the disproportionation reactor can be about 5 Torr and 7 Torr. The range between 匸. The temperature in the pre-methane/hydrogenation reactor of the disproportionation reactor can be between about loot and about 600. (: between the gas range. The temperature in the front of the gasification reactor of the disproportionation reactor can be between about 3 〇〇〇c and about 5 气 between the gas range β. The disproportionation reactor The temperature in the pre-methane/hydrogenation reactor may be about 500. 至^ to the disproportionation reactor before the decane/hydrogenation reactor of the feed, the molar ratio of methotane to vaporized hydrogen It may be in the range of from about 0:1 to about 2: 1. The molar ratio of methotane to hydrogenated hydrogen may be from about 0:1 to about 1. The range of 5:1. The molar ratio of decane to hydrogenated hydrogen may range from about 0:1 to about 1:1. The molar ratio of decane to hydrogenated hydrogen may be about 0. 33:1. Reacting the metformane with the hydrogenated gas by a disproportionation reactor pre-sintering/gasification hydrogen reactor may comprise causing the cerium to be burned with the chlorinated nitrogen in the presence of a metal-containing catalyst reaction. The metal-containing catalyst may comprise copper. The metal-containing catalyst may comprise substantially pure stone infused copper. The method may further comprise: a hydrogen depleted, vaporized hydrogen depleted stream after mixing a certain amount of the CVD reactor by the disproportionation reactor front gas calciner; decane/hydrogen chloride from the disproportionation reactor The gas of the reactor 152888. Doc -24- 201130733 After calcination, one of the antimony tetrachloride separators from a disproportionation reactor is enriched in a stream of four gasification helium; and as needed, 'purified antimony tetrachloride, purified tris One of the mixture of purified two gas broth or purified four gasified hydrazine, purified three gas stone 垸 垸 or purified one gas stone 炫 • • one or more of one mixture, and controlled from each The amount of elemental gas and elemental helium supplied by the source is maintained to maintain a selected ratio of chlorine to one of the stones in the feed to the disproportionation reactor. The method may further comprise depleting the hydrogen-depleted, hydrogen-rich hydrogen stream and decane from the gasification hydrogen separator of the CVD reactor by a CVD reactor post-methane/hydrogenation reactor and The chemical vapor deposition reactor effluent mixture reacts. The method may further comprise mixing the oxime gas depleted, hydrogen chloride-rich stream with the catalysis and the effluent mixture of the chemical vapor deposition reactor in the decane/gasification wind reactor after the CVD reactor Previously, the temperature of the chemical vapor deposition reactor effluent mixture in the post-cluster/hydrogen chloride reactor of the Cvd reactor was adjusted to about 200. 〇 with about 600. Between (3) adjusting the temperature of the chemical vapor deposition reactor effluent in the decane/hydrogen chloride reactor after adjusting the CVD reactor may comprise adjusting the temperature by a CVD reactor post heat exchanger. Adjusting the temperature of the chemical vapor deposition reactor effluent mixture in the methine/hydrogen chloride reactor after adjusting the hydrogenation with the methazine and the chemical vapor deposition reactor effluent mixture may include adjusting the temperature To about 400 ° C and about 500. (: between. After the CVD reactor, in the feed of the Asahi Hyun/hydrogen chloride reactor, the molar ratio of one of the hydrogen chloride to the hydrogen chloride reactor can be from about 0. a range of from 1 to about 2: 1. To the feed of the decane/hydrogen chloride reactor after the CVD reactor, the form of decane is 152888. Doc •25· 201130733 One of the hydrogenated hydrogens can be in the range from about 0:1 to about i · 5: i. To the feed to the C VD reactor, the Mobi ratio of one of the hydrogen chloride to the hydrogen chloride in the feed can be in the range from about 〇:丨 to about 1:. To the feed of the C VD reactor, the molar ratio of the sulphur to the hydrogen chloride in the feed of the calculus/gasification hydrogen reactor may be about 0. 33:1. The method can further comprise adjusting a flow rate in the decane/hydrogenation reactor after the CVD reactor such that the vaporized hydrogen-methano azine CVD effluent mixture is after the decane/hydrogenation reaction of the CVD reactor One of the residence times in the vessel is sufficient to allow complete reaction of the vaporized hydrogen with the formazan. The Cvd reactor after the ruthenium > / gasification hydrogen reactor may comprise a sufficient total volume of one or more reaction chambers to provide a residence time suitable to allow a complete reaction of the vaporized hydrogen with the methine. The residence time of the effluent mixture in the decane/hydrogenation reactor after the CVD reactor can be less than about one minute. The residence time of the effluent mixture in the decane/hydrogenation reactor after the CVD reactor can be less than about 5 minutes. The residence time of the effluent mixture in the decane/hydrogenation reactor after the CVD reactor can be less than about 1 minute. The residence time of the effluent mixture in the decane/hydrogenation reactor after the CVD reactor may be less than about 0. 5 minutes. The residence time of the effluent mixture in the ruthenium oxide/hydrogenation reactor after the CVD reactor may be less than about 〇.  1 minute. The method may further comprise mixing one of monooxane, dioxane and trioxane by a disproportionation reactor pre-gas streamer mixer prior to reacting the disproportionation reactor feed by the disproportionation reactor or Many of them are fed with the disproportionation reactor "one of monooxane, dioxane and trioxane" 152888. Doc -26- 201130733 or more of the molar ratio of ruthenium tetrachloride can range from about 〇 to about 3:1. The molar ratio of the one or more of monooxane, dichlorodecane and trioxane to antimony tetrachloride may range from about 〇 to about 25: i. The one or more of the single gas decane, the two gas decane and the three gas decane may be at about 0. 1:1 to about 1: range of i. The one or more of the single gas sulphur, the dioxane and the trioxane may have a molar ratio of about one of the four gasification enthalpy. 5:1. The method can further comprise converting the low boiling point phosphorus contaminant to an intermediate and boiling point contaminant by the disproportionation reactor. Low boiling point pollutants can include PH3 and PH2C1. The intermediate boiling phosphorus contaminant contains pHC12. High boiling point phosphorus contaminants contain PC13. The method may further comprise separating the four gasified ruthenium and the intermediate and high boiling phosphorus contaminants from the low boiling point phosphorus contaminants in the disproportionation reaction effluent by a helium tetrachloride separator after a disproportionation reactor. The method can further comprise separating the high boiling phosphorus contaminants from the four vaporized helium and the intermediate boiling point phosphorus contaminants in a high boiling point phosphorus separator. The method can further comprise discarding the high boiling phosphorus contaminants. The method can further comprise: recycling the intermediate boiling point phosphorus contaminants to the disproportionation reaction benefit, and converting the intermediate boiling point phosphorus contaminants to high boiling point phosphorus contaminants by the disproportionation reactor. - a method for manufacturing Shi Xi can be summarized as comprising: performing a chemical vapor deposition on a mixture comprising three gas by a chemical vapor deposition reactor; recovering from the chemical vapor deposition reactor; from the chemical Vapor deposition reactor release-effluent mixture, the effluent mixture comprising hydrogen, four gas 152888. Doc •27· 201130733 矽 and one or more of hydrogenation, dichloromethane and trioxane; and the in-situ gasification hydrogen reactor after a CVD reactor will be derived from the chemical vapor deposition reaction The vaporized hydrogen in the effluent mixture is converted to gas decane. The method may further comprise controlling the chemical gas from the CVD reactor after the effluent mixture from the chemical vapor deposition reactor is supplied to the CVD reactor before the gasification reactor is in situ. The temperature of the effluent mixture of the phase deposition reactor. Controlling the temperature of the effluent mixture from the chemical vapor deposition reactor by a CVD reactor post heat exchanger can include controlling the temperature of the effluent mixture from the chemical vapor deposition reactor to be self-contained 200. (: to about 700. (: one of the temperatures in one of the ranges. The temperature of the effluent mixture from the chemical vapor deposition reactor can be controlled by a CVD reactor after the heat exchanger can contain the chemical gas from The temperature of the effluent mixture of the phase deposition reactor is controlled to be one of a range from about 300 ° C to about 600. The temperature is controlled by a cvD reactor followed by a heat exchanger to control the chemical vapor deposition reaction. The temperature of the effluent mixture of the apparatus may comprise controlling the temperature of the effluent mixture from the chemical vapor deposition reactor to a temperature of about 5 〇〇〇c. The CVD reactor post heat exchanger may be The effluent mixture from the chemical vapor deposition reactor is supplied to the CVD reactor and the effluent exchange of one of the in-situ gasification hydrogen reactors from the CVD reactor is performed before the in-situ gasification of the hydrogen reactor To the effluent mixture from the chemical vapor deposition reactor. The effluent mixture from the chemical vapor deposition reactor may have a residence time in the in-situ gasification hydrogen reactor after the CVD reactor. At 152888. Doc -28 - 201130733 About 10 minutes. The residence time of the effluent mixture in the in situ gasification hydrogen reactor after the CVD reactor can be less than about 5 minutes. The residence time of the effluent mixture in the in situ hydrogen chloride reactor after the CVD reactor can be less than about 1 minute. The residence time of the effluent mixture in the in situ gasification hydrogen reactor after the CVD reactor may be less than about 0. 5 minutes. The residence time of the effluent mixture in the in situ hydrogen chloride reactor after the CVD reactor may be less than about 0. 1 minute. The method can further comprise cooling an effluent mixture from the in situ gasification hydrogen reactor from the CVD reactor by a first cooling system. The method can further comprise converting the effluent mixture from the in situ gasification hydrogen reactor from the CVD reactor to a gas-liquid two phase mixture by a compressor system. The method can further include cooling the gas-liquid two phase mixture from the compressor system by a second cooling system. The second cooling system can include a second CVD reactor post heat exchanger. The method can further comprise separating hydrogen from the effluent mixture from the in situ gasification hydrogen reactor from the CVD reactor by a CVD reactor followed by a helium tetrachloride absorber/hydrogen separator. The method can further comprise saturating the trioxane in the hydrogen separated by the four vaporized helium absorber/hydrogen separator after the CVD reactor. The method can further comprise mixing the hydrogen from the four vaporized helium absorber/hydrogen separators of the CVD reactor with one of the feeds to the chemical vapor deposition reactor. The method may further comprise ruthenium tetrachloride/three 152S88 after being passed through a CVD reactor. Doc -29· 201130733 The chlorosilane separator was triturated from a four-gas enthalpy separator in a mixture of four liquefied helium absorbers/hydrogen separators from the CVD reactor. The method may further comprise: feeding the trichlorohydrazine from the four gasification stone/three gas stone shed separator to the four gas enthalpy absorber/hydrogen separator; and making the three gas decane and the four gas The tetrachlorination reaction in the hydrazine absorber/hydrogen separator. The method can further include adjusting the temperature of the three gas eliminator prior to feeding the trioxane to the four gas enthalpy absorber/hydrogen separator. Adjusting the temperature can include adjusting the temperature to about 35 °C. The method can further comprise mixing the trioxane from the ruthenium tetrachloride/trichlorodecane separator with one of the feeds to the chemical vapor deposition reactor. The method can further comprise: cooling the trioxane; and withdrawing a lower gas phase material from the gas phase from the trichlorosilane. The method may further comprise separating the high boiling phosphorus contaminant comprising PC13 from the antimony tetrachloride by a high boiling point phosphorus separator. The method can further comprise mixing the trichlorodecane with one of the feeds to the chemical vapor deposition reactor. A method for producing a crucible, which can be summarized as comprising: performing a chemical vapor deposition on a mixture comprising one of trichloromethane by a chemical vapor deposition reactor; recovering Shixia from the chemical vapor deposition reactor; The chemical vapor deposition reactor releases a first-rate product mixture comprising one or more of hydrogen, four gasified ruthenium and gasification hydrogen, dioxane, and trioxane; and by a first cooling System cooling comes from the chemical vapor deposition reaction 152888. Doc -30- 201130733 This effluent mixture. The method may further comprise separating hydrogen from the cooled effluent mixture from the chemical vapor deposition reactor by a CVD reactor followed by a hydrogen separator; and a gasification hydrogen separator from the CVD reactor The effluent mixture of the chemical vapor deposition reactor from which the hydrogen separator is removed by the hydrogen separator after the CVD reactor separates hydrogen chloride. The method may further comprise: feeding the hydrogen chloride and helium from the hydrogen chloride separator of the CVD reactor to a gasification hydrogen-methane reactor; and using the gasification hydrogen-methane reactor to make the crucible The decane reacts with the vaporized hydrogen to produce a chlorodecane comprising trioxane. The method may further comprise passing the vaporized hydrogen and decane from the gasification hydrogen separator of the CVD reactor and the chemical vapor deposition reactor effluent by a CVD reactor post-methane/hydrogenation reactor. The mixture reacted. A method for producing a crucible can be summarized as comprising: reacting a disproportionation reactor comprising one of trioxane and formoxane by a disproportionation reactor to form one of dichloroanthracene, trioxane, and tetragas hydride. Disproportionation reactor product; performing a chemical vapor deposition on a mixture from the disproportionation reactor by a chemical vapor deposition reactor to deposit ruthenium on one of the substrates in the chemical vapor deposition reactor; The chemical vapor deposition reactor recovers Shi Xi. Feeding the disproportionation reactor to form a disproportionation reaction product comprising dioxane, trioxane, and tetrachloride may include optimizing the operating conditions of the disproportionation reactor to maximize the production of dioxane. The method can further comprise controlling a composition of the disproportionation reactor feed comprising trioxane and formoxane such that the disproportionation reactor feeds a gas pair 152888. Doc •31 · 201130733 The ratio of 矽 can be in the range between about 1:1 and about 3:1. The method can further comprise controlling the composition of the disproportionation reactor feed comprising trichlorodecane and formoxane such that the ratio of gas to enthalpy in the disproportionation reactor feed can be between about 1:1 and about 2. 5: 〗 between the range. The method can further comprise controlling the composition of the disproportionation reactor feed comprising trioxane and formoxane such that the ratio of gas to helium in the disproportionation reactor feed can be between about 1:1 and about 2: The range between 1 the method may further comprise controlling the composition of the disproportionation reactor feed comprising trioxane and formoxane such that the ratio of chlorine to rhodium in the disproportionation reactor feed may be about 1 . 25:1 and about 1. The range between 75:1. The method can further comprise controlling the composition of the disproportionation reactor feed comprising trioxane and f decane such that the ratio of chlorine to rhodium in the disproportionation reactor feed can be about 1. The range between 75:1 and about 2.25:1. The method can further comprise controlling the composition of the disproportionation reactor feed comprising trioxane and formoxane such that the ratio of gas to enthalpy in the disproportionation reactor feed can be about 1. 5:1. The method can further comprise controlling the composition of the disproportionation reactor feed comprising trioxane and formoxane such that the ratio of chlorine to rhodium in the disproportionation reactor feed can be about 2:1. The method may further comprise separating the ruthenium tetrachloride from the product of the disproportionation reactor in a post-disproportionation reactor to generate a disproportionation reactor, and then dissolving the depleted gas and disproportionation reaction. After the device is rich in four gasification _ stream. The method may further comprise a stream of four gasified deuterium depleted from the disproportionation reactor by a disproportionation reactor followed by a diclofenane/trichloromethane separator 152888. Doc -32·201130733 The trichloromethane is separated from dioxane to produce a dioxane-rich material after a disproportionation reactor and a trichloromethane-rich material after a disproportionation reactor. The S-containing material after the disproportionation reactor can be substantially pure di-halogen. The method can further comprise determining a concentration of dioxane in the material enriched in dioxetane after the disproportionation reactor. The method can further comprise determining a concentration of trioxane in the trichloromethane-rich material of the disproportionation reactor. The method can further comprise storing the dioxane-rich material after the disproportionation reactor in a dioxane storage system. The method can further comprise storing the trichloromethane-rich material after the disproportionation reactor in a trioxane storage system. The method may further comprise: mixing the dioxane-rich material with the field 3-chlorodecane material to produce a chemical vapor deposition reactor feed; and supplying the feed to the chemical vapor deposition reactor . Mixing the dioxane-rich material with the trioxane-rich material may comprise mixing the methylene chloride-containing material from the gas storage system. Mixing the material rich in the two-stone stone and the material rich in the three-stone stone may include mixing the material rich in three gases from the gas stone system. Mixing the dioxane-rich material with the trioxane-rich material to produce a chemical vapor deposition reactor feed can include adjusting a ratio of gas to fragmentation in the chemical vapor deposition reactor feed. Μ二古# can be improved by directly supplying the disproportionation reactor to the chemical vapor deposition reactor. 152888. Doc • 33· 201130733 The method may further comprise supplying the chloroform-rich material after the disproportionation reactor directly to the chemical vapor deposition reactor. The method may further comprise: mixing the material of the gas-enriched gas after the disproportionation reactor with the material of the trichlorosilane-rich material after the disproportionation reactor; and the material rich in dioxane after the disproportionation reactor This mixture of material rich in smectite after the disproportionation reactor is supplied to the CVD reactor. The method may further comprise: mixing the trioxane-rich material and the methotane after the disproportionation reactor; and supplying the mixture of the trioxane-rich material and the waste stone chamber to the disproportionation reactor after the disproportionation reactor . The method can be summarized as comprising: manufacturing and supplying a stone garden; and treating the decane according to the methods claimed herein. [Embodiment] In the drawings, the same reference numerals are used, and the dimensions and relative positions of the components in the drawings are not necessarily drawn to scale. For example, the shapes and angles of various components are not proportionate. Drawing, and some of the elements of the elements are arbitrarily expanded and placed to improve the legibility of the drawings. In addition, the features of the elements are not intended to express any information about the actual shape of the elements. It is only for ease of illustration. To provide a thorough understanding of the various embodiments disclosed, the order: S; # θ 1 ^ specific details. However, those skilled in the art will '=etc. Or more or by other means, the embodiment is practiced in detail. In other examples, the well-known structure associated with the system for preparing S and preparing sputum is not described (inclusive, 152888. Doc-34-201130733 is not limited to the internal structure of the mixer, separator, gasifier and recombination reactor) to avoid unnecessarily obscuring the description of the embodiments. Unless the context requires otherwise, the wording "including (c〇mprjse)" and its variants (eg, including (comPrises)" and "comprising") should be interpreted throughout the following description and claims. It is open and covers the meaning of 'including but not limited to'. References throughout the specification to "one embodiment" or "an embodiment" or "an embodiment" or "an embodiment" or "an embodiment" means One of the specific reference features, structures, or characteristics described in the embodiments is included in at least one embodiment. Thus, the phrase "in one embodiment", or "in an embodiment", or "in another embodiment" or "in some embodiments", or "In some embodiments," the same does not necessarily refer to the same embodiment. In addition, the particular features, structures, or characteristics may be combined in one or more embodiments in any suitable manner. It should be noted that the singular forms "a", "a", "the" and "the" are used throughout the specification and the appended claims. Thus, for example, reference to gas decane includes a single chlorodecane species, but may also include a plurality of gas decane species. It should also be noted that the term "or" is often used to mean the meaning of "and/or" unless the context clearly dictates otherwise. As used herein, the term "silane" refers to siH4. As used herein, the term "silanes" is generally used to refer to decane and/or any derivative thereof. As used herein, the term "gas hexane 152888. Doc-35-201130733 (chlorosilane) is a nail tropane derivative in which one or more hydrogens have been replaced by chlorine. The term "chlorosilanes" means one or more gas-burning substances. The gas burn is not caused by the following examples: single gas second (S iH3 c 1 or MCS); dioxane (SiH2Cl2 or DCS); trichloromethane (siHCl3 or TCS), or four gas dreams' also known as Tetrachlorinated (Sici4 or STC). The melting point and boiling point of the stone hospital increase with the increase in the number of molecules in the molecule. Thus, for example, decane is a gas at standard temperature and pressure, while a liquefied gas is a liquid. As used herein, unless otherwise specified, the term "qi" refers to an atomic gas, i.e., a chlorine having the formula C1, rather than a molecular gas, that is, a chlorine having the formula Ch. As used herein, the term "矽" refers to an atomic 矽, i.e., has the formula S i. As used herein, the term "chemical vapor deposition reactor" or "Cvd reactor" refers to a Siemens or "hot line" reactor. The terms "chemical vapor deposition reactor" and "CVD reactor" are used interchangeably. Unless otherwise specified, the terms "石夕" and "polycrystalline stone" may be used interchangeably herein to refer to the methods and systems disclosed herein. Unless stated otherwise, the concentration expressed herein as a percentage should be understood to mean the concentration in % by mole. The headings provided herein are for convenience only and do not explain the scope or meaning of the various embodiments. Figure 1A shows an exemplary embodiment of one of the configurations for one of the processes for preparing ruthenium by chemical vapor deposition, in which the by-products of the reaction are continuously recovered and used as reactants in the system. Figures 1B to 1L are shown for borrowing 152888. Doc -36· 201130733 An exemplary embodiment of a portion of a system for preparing a second by chemical vapor deposition, wherein the embodiments are related to use in recycling and/or removing a chemical vapor deposition reactor Optional process for various by-products. The same system components in each figure are identified by the same numbered label. System components that can have similar functions but differ in different graphics are identified by different numbered tags. The shape or form of any one of the specific components provided to the system as shown in the figures is not intended to explain or limit the particular component. Figure 1A shows a schematic of one of the systems 100 for preparing crucibles for recycling and using certain reaction by-products. Although the description of FIG. 1A herein generally refers to certain reactants and by-products in the liquid phase, it should be understood that such reactants and by-products may be in a vapor phase or a gas phase or a liquid phase with a vapor phase or a gas phase. One combination exists in part or all of system 100 depending on the operating conditions or needs to be dependent on any particular reactant or by-product: characteristics. Those skilled in the art will readily appreciate that during operation, certain reactants and/or by-products at specific locations of the system will have to be vapor-phased. Similarly, it will be appreciated that in operation, certain reactants and/or by-products at other locations within the system will have to be present in the liquid phase. In an example, advantageously, the conditions can be controlled such that all gaseous phase enthalpy is maintained in solution to produce a unified liquid phase. For example, the pressure inside is maintained at W high to maintain all of the cerium material at the level of the solution. In other conditions, advantageously, the conditions are such that some gaseous material can be released from the liquid. For example, a gaseous material releases the pressure of a portion of the system from the helium of the system. One of the liquid phase of the knife 152888. Doc -37- 201130733 In an embodiment of system 100 (eg, as illustrated in Figure 1A and described herein), a combination of methotane and tetragasification in a decane/gas decane mixer 106 prior to a disproportionation reactor The hydrazine is produced to produce a feed mixture to one of the disproportionation reactors U4. In certain embodiments where the reaction mixture in the disproportionation reactor i 14 is intended to be a liquid at the operating temperature of the reactor 114, the feed pressures of the sulphur and the sulphur gas are each controlled to be sufficiently high. The resulting mixture was maintained as a liquid. In such embodiments, the methotoxane and the four gas fossils are supplied to the mixer 106 and maintained at a pressure sufficient to maintain the mixture supplied to the disproportionation reactor at a desired operating temperature of the disproportionation reactor. A mixture of such reactants is supplied to reactor 114. In some such embodiments, the pressure applied to the individual reactants and the mixture supplied to the reactor 114 can be maintained at a rate of about 50 rpm/square of the reactants or the mixture. The gauge pressure is under one pressure. For example, when the disproportionation reactor 114 is intended to operate at a temperature of about 60 ° C, the pressure applied to the mixture of reactants can be maintained at about 15 psig to about 400 lbs. / square inch gauge pressure in one of the ranges. In some embodiments, the methotane supplied as a liquid may be pre-gasified and then added as a vapor to the ruthenium tetrachloride, which may be absorbed into the liquid four gas fossils. In such embodiments, a static mixer or some other mixing device may mix the methane vapor with the liquid tetragas. In such embodiments, when the disproportionation reactor is operated with the material in the liquid phase, the sapphire vapor must be completely absorbed into the liquid phase such that there is only a single phase in the reactor. If necessary, the four gasification enthalpy feed can be heated or cooled to feed positively to the reaction 152888. Doc -38- 201130733 The temperature of the mixture is maintained at the required level, for example 60. Hey. As illustrated in the particular embodiment of FIG. 1A, the conduit 1〇1 supplies the strontium oxide to an optional pump 102» In certain embodiments, the conduit 1〇1 can be at a cold temperature (eg, - Supply as a liquid decane at 30 ° C). For example, the gangue can be supplied at a sufficient pressure to maintain the sputum in a liquid form under the condition that the pipe 〇1 supplies the dimethyl hydrazine to the pump 1 〇2. In one such embodiment, the pressure applied by the pump 1 〇 2 can be such that the methanane stream is liquefied and/or the formane is maintained in a liquid state under operating conditions of the system. For example, in one embodiment, the pressure can be between about 40 ° C and about 90. (: maintaining the decane in a liquid state at a temperature between. In another embodiment, the pressure may be such that the decane is at a temperature between about 45 C and about 80 ° C. Maintained in a liquid state. In yet another embodiment, the pressure may be such that the decane is maintained in a liquid state at a temperature between about 50 ° C and about 70 ° C. In a further embodiment, the pressure may be such that the decane is maintained in a liquid state at a temperature between about 55 Torr and about 65 ° C. In a particular embodiment, the pressure may be The decane is maintained in a liquid state at a temperature of about 60 ° C. In one such embodiment, the pump 102 can be applied at a pressure of about 1 〇 psig to about 5 〇〇 lbs. In the other embodiment, the pump 102 can be applied to a range of about 5 psig to about 3 psig. In another such embodiment, the pump 102 can be applied at a pressure of about 100 square feet per square inch to about 2 broken squares per square inch. The range of the pressure of the pressure. In this embodiment a further embodiment, pump 102 may be applied about 18〇 lbs / 152,888. Doc -39- 201130733 The pressure of the square inch gauge pressure. In some embodiments, system 100 may not include pump 102. In such embodiments, a monooxane spherical or cylindrical storage tank can supply decane liquid or vapor directly to system 10〇. In other embodiments of the system 100 that operate without the pump 102, a monodecane storage vessel can supply liquid helium to a heat exchanger to vaporize the decane. The vapor space from the monomethine storage vessel or the methanol vapor from a heat exchanger can be supplied at an elevated pressure (e.g., < 300 psig). The decane vapor is readily miscible with the liquid gas decane. In certain embodiments, as discussed above and elsewhere herein, the system can be operated with some or all of the reactants in the vapor phase. In some such embodiments, portions of system 1 may be operated with the reactants in a gaseous phase, while other portions of the system may be operated with the reactants in a liquid phase. In the presence of the pump 102, it can represent any type of pumping system or apparatus suitable for delivering materials or fluids in a gas phase or liquid phase. In certain embodiments, the pump 1〇2 must be adapted to sufficiently pressurize the methotrex such that the formazan is still in a liquid form under the conditions in which the feed of the system (10) and the system (10) is supplied. -Types of. In other embodiments, the pump 1〇2 can supply the methane vapor to the system 1〇〇. For example, a pump 〇 2 can be a piston-type pump in which the piston is operated to drive or supply fluid to the system (10) at a controlled rate, wherein the fluid can be a liquid Or - steam. As a further example, the pump 1〇2 can be a pressurized metering pump where the pressure drives the fluid and a metering mechanism controls the flow rate. 152888. Doc • 40- 201130733 Pump 102 pumps decane to the disproportionation reactor pre-methodane/gas decane mixer 106 via line ι〇4. In addition, line 163 delivers the four gasified hydrazine to the disproportionation reactor pre-methane/chloromethane mixer 丨〇6. The ruthenium tetrachloride delivered via line 163 may comprise ruthenium tetrachloride produced as a by-product during certain aspects of the operation of system 100, as discussed further below. This four-gas enthalpy can be referred to as recycled ruthenium tetrachloride. The ruthenium tetrachloride supplied via line 163 may contain other reaction by-products produced during the operation of system 1, for example, monochlorodecane, dioxane, trioxane, and hydrogen chloride. These substances may be referred to as recycled mono-halogenane, recycled dioxane, recycled trichlorodecane, and recycled hydrogenated hydrogen. The four vaporized helium provided via line 163 may further comprise an additional four of the molar ratio of gas to helium that has been added to adjust the mixture of reactants in the disproportionation reactor Ganggang Xi/Crusher Mixer 6 Barium chloride, as further discussed elsewhere herein. This is added to adjust the amount of the four vaporized helium delivered via line 163 and thus the molybdenum tetrachloride of the gas to the molar ratio of the reactants in the pre-reactor pre-methane/gas hexane mixer 106 can be referred to as "Supply" is four gasifications. In certain embodiments, trioxane may also be added to help adjust the molar ratio of gas to enthalpy in the reactants. This trioxane can be called "supply" three gas stone. In other embodiments, the pure chlorinated gas can be reacted with the calculus to help adjust the molar ratio of the reactants to the chlorine. This pure gasification hydrogen can be called replenishing "hydrogenated hydrogen." In some embodiments, the target molar ratio of gas to enthalpy is at 4 2. 1 with about 3. In the range between 9:1. In other embodiments, the target molar ratio can be about 2. 5:1 and about 3. In the range between 5:1. In still other embodiments, the target molar ratio can be about 2. The range between 8:1 and about 33:1 is 152888. Doc -41 · 201130733. In still other embodiments, the target molar ratio can be between about 3:1 and about 3. 2 in the range between 1 and 1. In a 杳& y, the embodiment may have a target molar ratio of about 2. 8:1. In another embodiment, your daylight indication can be about 3:1. In yet another embodiment, the target molar ratio can be about 32:1. In yet another embodiment. Xuanmu; ^ Mo Erbi can be about 3 · 3: i.乍 乍 is a replenishment of four gas fossils. The four gas materials are often highly purified. Trioxane, which is supplied as a supply of trichloro(tetra), is also generally highly purified. In certain embodiments, the disproportionation reactor pre-methane/gas hexane mixer 1 〇 6 can be any of a variety of mixers suitable for mixing liquid fluids. In other embodiments, the disproportionation reactor pre-methane/gas decane mixer 106 can be selected from any of a variety of mixers suitable for mixing fluids in a vapor or gaseous state. In some embodiments, such mixers can be static mixers. In other embodiments, such mixers may be dynamic mixers.

After the disproportionation reactor pre-methane/gas hexane mixer 1〇6 is mixed with the methanized gas supplied via the line 104 and the four gasified ruthenium supplied via the line 163, the pipe 10 8 is subjected to the self-disproportionation reactor before the stone is burned. / gas stone night burner 106 is supplied to the front of the disproportionation reactor temperature controller 11A. The disproportionation reactor pre-warm controller 110 heats the mixture comprising the gangue and the four gas fossils supplied via line 108 to a temperature ranging from about 40 t to about 9 〇t. In some of these embodiments, the disproportionation reactor front temperature controller i 10 heats the mixture supplied via the conduit 108 to a temperature ranging from about 45 ° C to about 801. In other such embodiments, the disproportionation reactor front temperature controller 110 heats the mixture supplied via line 108 to about 5 Torr. (: to a temperature of about 70 ° C I52888.doc -42 · 201130733 - In still other such embodiments, the disproportionation reactor front temperature controller 110 heats the mixture supplied via line 108 to approximately 55 C To a temperature in the range of about 65 ° C. In certain such embodiments, the temperature to which the mixture supplied via line 108 is heated may be about 6 Torr. The line 112 will include methotrexate and tetragas hydride. The heated mixture is supplied from the heater 110 to the disproportionation reactor 114. The mixture comprising recycled ruthenium tetrachloride may also contain some other recycled gas decane, including dioxane, including the recycle. The mixture of four gasified ruthenium used may also contain recycled hydrogenation gas. The disproportionation reactor 114 contains a catalyst suitable for catalyzing the rearrangement of molecules with certain gas oximes to produce ( In particular, three gas. The catalyst has been activated to contain activated charcoal, various polymeric ion exchange resins and certain metals, such as copper. The catalytic ion exchange resin comprises a resin having a tertiary amine or a quaternary group. In certain embodiments, the use of a polymeric ion exchange resin as a catalyst in a disproportionation reactor may require maintaining the heated mixture delivered via conduit 112 at a temperature of between about 55 (: and about 8 Torr). In other embodiments, the temperature of the heated mixture delivered via conduit 112 can be maintained between about (four) and about 7 generations. In still other embodiments, the temperature of the heated mixture delivered via conduit 112 can be maintained at Approximately 6 〇 t > c. Alternatively, in certain embodiments, the use of other types of catalyst (e.g., metal catalyst) in the disproportionation reactor may allow the disproportionation reactor to be at least about 300 t high. The output delivered via line 116 contains trichlorodecane, 152888.doc -43-201130733 and four gas fossils and two gas stone smoldering. However, it only contains very low amounts of 甲石夕烧' this is because Shi Xiyuan is converted into various gas sulphones such as dioxane and trioxane in the disproportionation reactor 114. For example, in which the ratio of chlorine to rhodium is maintained at 3.2:1 and the disproportionation reactor is The temperature is maintained at 6 (In one embodiment of rc, the amount of methotrexate and monoxane in the disproportionation reactor product can be 2x10.5 and 7x10.4 mole fractions, respectively, as described above and elsewhere herein. Adding tetrachloride to the reaction mixture supplied to the disproportionation reactor 114 to maintain a molar ratio of one of the reaction mixture in the reaction mixture to drive the disproportionation reaction in the reactor, thereby optimally producing trigaster These reaction mixtures thus typically contain an excess of four gasification dreams and thus the mixture of reaction products delivered from the disproportionation reactor 114 via line 116 may retain an excess of four gasified hydrazine. Operation of the system as described herein. In some embodiments, the relative amounts of the various gas smolderings in the reaction product from the disproportionation reactor 114 can be as follows: about 10% dioxane; about 8% triclosan. 'about 10% four. Gasification. Adjusting the molar ratio of the gas to the oxime can have a large effect on the amount of dichlorosilane in the reaction product. For example, in some embodiments, the molar ratio is increased from 3: i to 3: 丨: 丨 can reduce the amount of dioxane from about 10% of the total gas stone court to about 6%. Increasing the molar ratio to 3 2: 丨 further reduces the amount of dioxane to about 3.8% of the total gas decane. Increasing the molar ratio to 3.3:1 still further reduces the amount of dioxane to about 2.0 of the total gas decane. /〇. Thus, surprisingly, the amount of dioxane in the disproportionation reaction product is extremely sensitive to the molar ratio of gas to rhodium in the reactants. The pressure in the disproportionation reactor can be controlled by a back pressure control valve. When activated to adjust the pressure in the reactor, the valve conveniently releases the material to a storage tank in the process of 152888.doc -44 - 201130733. Material from this tank can also be supplied back to the system for processing in the reactor as needed. The line 116 delivers a mixture of reaction products from the disproportionation reactor U4 to the - disproportionation reactor and then the four gasification ruthenium separator 118' separates from the reaction mixture and removes excess four gasified ruthenium. The conduit 120 is self-distributing the reactor after the four gasification fossil separators 118 deliver excess helium tetrachloride for recycling, as discussed further below. When recycled, as discussed elsewhere herein, the four vaporized helium provided by the four gasification helium separators ι 18 after the self-disproportionation reactor via line 120 can be replenished with helium tetrachloride and other sources from within the system 100. Gasification and mixing. The disproportionation reactor post-cyllium tetrachloride separator 11 can employ any of a variety of separator forms for decane and/or gas decane, for example, one suitable for distillation. After the disproportionation reactor, the antimony tetrachloride separator 11 removes excess tetrachloride, the conduit 122 transports the mixture of the remaining products of the reaction in the disproportionation reactor 114 from the disproportionation reactor after the helium tetrachloride separator 118. To a CVD reactor front gasifier 128. The material conveyed via line 122 typically contains primarily trioxane, with a relatively small amount of dioxane and only a low amount of vermiculite and hafnium tetrachloride. Heat is applied to the mixture supplied by conduit 122 in the CVD reactor pre-gasifier 128 to convert the mixture to a vapor. In certain embodiments, the product can be directly removed from the gasification helium separator 118 as a vapor from the disproportionation reactor' thus avoiding the need for a CVD reactor pre-gasifier 128. The conduit 130 delivers the vaporized mixture to the CVD reactor premixer 132. The gasification mixture delivered from the gasifier 128 to the mixer 132 via line 130 to the CVD reactor pre-gasifier 128 via line 152888.doc -45 - 201130733 typically contains primarily trichloromethane. Among them, there are a relatively small amount of dioxane and a low amount of methotane and four gasified hydrazine. The dioxane in the mixture conveyed by the pipe 13 控制 can be controlled at a predetermined amount which is the optimum for the production of the polycrystalline silicon. The amount of dioxane in the conduit 130 can be controlled by adjusting the ratio of gas to helium in the material in the conduit 1〇8. Control of the ratio can be conveniently accomplished by adjusting the content of the material transported by conduit 163 and the relative rates at which the contents of conduits 163 and 104 are supplied to mixer 106. Hydrogen gas is also supplied to the CVD reactor front mixer 132. Hydrogen supplied via line 152 may be hydrogen recovered from other locations within the process. For example, the hydrogen can be recovered and recycled after the reaction in the chemical vapor deposition reactor, as described below. Hydrogen may also be supplied to the CVD reactor premixer 132 from an external source (not shown) if necessary. The conduit 134 delivers the vapor mixture (mainly comprising trioxane vapor and hydrogen) from the CVD reactor premixer 132 to the CVD reactor 136. The CVD reactor 136 includes a substrate on which cerium oxide can be deposited. The CVD reactor 136 is manufactured as a result of various reactions occurring between trichloromethane, hydrogen, and various other reactants or intermediate products occurring in the CVD apparatus. The reaction occurring within the CVD reactor may include, but is not limited to, one or more of the following reactions:

SiHCl3+H2-^Si+3HCl 4 SiHCl3(1)3SiCl4+2H2+Si SiHCl3+HCl (I) SiCl4+H2 SiHCl3 (I) SiCl2+HCl 152888.doc • 46- 201130733

SiH2Cl2 - Si + 2HC1 SiH2Cl2 + SiCl4 ^ 2SiHCl3 SiH4 - Si + 2H2 The process of depositing Shi Xi on the substrate in a CVD reactor 13 6 is called a Siemens or "hot line" process. This manufacturing process of Shi Xi usually takes place over 6 miles. 〇 Under the temperature. The Siemens process therefore requires high energy input, most of which is dissipated as heat. The cost associated with the high energy requirements of the operation of the CVD reactor' is thus economically advantageous in terms of energy 3E savings achieved elsewhere in systems based on the novel process described herein. Compensate for the costs associated with the operation of the CVD reactor. The product 138 is removed from the CVD reaction 136. The reactants and reaction by-products remaining in the cvd reactor 136 after the deposition reaction are released from the cvd reactor 136 as a mixture of one of the gaseous materials and transported via line 14 . The mixture of gaseous materials removed via conduit 140 may include, but is not limited to, one or more of the following: hydrogen, hydrogenated gas, mono-halogenated decane, dichlorodecane, trichlorodecane, antimony tetrachloride And oily contaminants, including polyalkylene compounds. The oily contaminants in the gaseous mixture may be present, for example, in the form of one vapor or one aerosol. Preferably, the oily contaminants are removed from the gaseous mixture. In one embodiment, as the temperature of the gaseous material exiting the CVD reactor decreases, the oily contaminants condense, thereby removing the contaminants from the gaseous mixture. These condensed contaminants can therefore be periodically removed from the system as fluid oil condensate. In another embodiment, the excess reactant and gas oxime by-product may be removed by distillation from a higher boiling point material (e.g., such oily contaminants) 152888.doc • 47· 201130733. In certain embodiments, the distillation can be performed using a distillation column. In other embodiments, evaporation can be carried out with a gas distillation film. In the embodiment illustrated in Figure 1A, the conduit 14 输送 delivers the gaseous mixture to a first chiller 142 after a CVD reactor. The conduit 143 delivers the cooled material to the post-CVD decanter 169. The post-CVD decanter 169 separates lower point material (e.g., 'hydrogen, hydrogen chloride, and lower boiling decane) from higher boiling materials such as ruthenium pentoxide, trichloromethane, and dioxane. The post-CVD decanter 169 can be adapted for use in any design for separating higher boiling and lower boiling materials from one another. For example, in one embodiment, the post-CVD decanter 169 can comprise a distillation apparatus. In another embodiment, the post-CVD decanter 169 can comprise a separate column bed wherein the lower boiling material rises to flow from the top and the higher boiling material exits the bottom. Pipeline 145 delivers a higher boiling point of decane for later processing in the process with similar materials, as described below. Pipe 171 delivers the lower boiling point material to CVD reactor post compressor 144. The CVD reactor post compressor 144 pressurizes the gaseous mixture supplied by line 171 to convert the gaseous mixture into a mixture of liquid chlorodecane and hydrogen and hydrogen chloride gas and gas decane vapor. The official passage 147 delivers the two-phase gas-liquid mixture to a second chiller 146 after a CVD reactor. The second cooler 146 after the CVD reactor further liquefies the higher boiling material from the gas phase in the two phase mixture to optimize subsequent removal of the higher boiling formmethane from the mixture. Line 148 delivers this mixture to a CVD reactor followed by a hydrogen separator 15〇. The CVD reactor post-hydrogen separator 150 may be suitable for any design used in the removal of two-phase gas/liquid mixtures from gas decane, 152888.doc • 48-201130733, in which hydrogen is suspended or dissolved. of. In one embodiment, for example, hydrogen may be allowed to be released from the two-phase gas/liquid mixture delivered via conduit 148 and selectively diffused through a hydrogen-specific separation membrane, for example, a polymer membrane, A metal film or a carbon film designed and used for one purpose. Alternatively, in another embodiment, hydrogen can be removed by distillation. The hydrogen thus removed can be further purified by passing it through a bed containing one of various absorbents (e.g., activated carbon). The hydrogen removed from the liquid mixture delivered via line 148 in the hydrogen separator 15A after the CVD reactor is sent to the CVD reactor premixer 132 via conduit ι52 as a recovery utilized olefin. As described above, the CVD reactor front mixer 132 mixes the recovered hydrogen and gas smoldering (mainly trichloromethane) to feed to the CVD reactor 136 to further manufacture the ruthenium. In some embodiments, excess hydrogen in system 1 可 can be removed from CVD reactor post hydrogen separator 15 to a hydrogen storage system via line i 53 if necessary. Certain embodiments of system 100 can have multiple series of separators, condensers, and cooling devices to optimize the efficiency of separating lower and higher boiling materials from by-products from the CVD reactor. Other embodiments of system 1 may only add or remove some of the separator, condenser, and cooling device components to or from the system. Still other embodiments may advantageously locate one or more of the separator, condenser or cooling device elsewhere in the system for optimal processing of the higher and lower boiling by-products produced by the system. In certain embodiments illustrated in Figure 1A, conduit 160 delivers a liquid mixture from one of the byproducts of CVD reactor 136 to a disproportionation reaction 152888.doc - 49 · 201130733 pre-gas hydride mixer 162, already in CVD Hydrogen is removed from the liquid mixture in the hydrogen separator 150 after the reactor. In some embodiments, the conduit 145 of the first cooler 142 after the CVD reactor can deliver the higher boiling gas decane to the conduit 160 for combination with and from such materials from the CVD reactor hydrogen separator 150. It is sent to the disproportionation reactor pre-gas streamer 162. The vaporized hydrogen may advantageously still be supplied via a conduit 16 to a liquid mixture of chlorodecane of the disproportionation reactor pre-gas streamer 162. In some embodiments, instead of conduit 160, the liquid mixture from the byproduct of CVD reactor 136 that has been purged of hydrogen from the liquid mixture can be passed directly to the post-disproportionation reactor four gasification helium separator 118. In these embodiments, the conduit 120 can deliver the four gasification helium to the disproportionation reactor pre-gas burner mixer 162 for recycling utilization' as discussed above. The conduit 122 can ultimately transport the four vaporized deuterated mixture back to the CVD reactor 13 6 . In certain embodiments, the contents of conduit 160 comprise primarily a mixture of gas decane and hydrogenation gas. In some embodiments, as described above and elsewhere herein, the liquid mixture conveyed by conduit 160 may be substantially free of hydrogen. In other embodiments, the contents of the conduit 160 may contain at least a portion of the hydrogen originally present in the contents of the conduit 148. In still other embodiments, the contents of the conduit 160 may contain a majority or at least a portion of the hydrogen chloride originally present in the contents of the conduit 148. In still other embodiments, the liquid mixture conveyed by conduit 160 may be substantially free of vaporized hydrogen. Alternatives for the disposal of hydrogen and hydrogenation of hydrogen are set forth elsewhere herein. In addition to the gas sent from the pipe 160 to the chloroformer mixer 162 of the disproportionation reactor, the pipe 12 will also be vaporized from the disproportionation reactor as described above. 152888.doc • 50- 201130733 Shi Xi Separator The recovered four gas cuts are supplied to the disproportionation reactor pre-gas decane mixer 162. The composition of the contents of the disproportionation reactor pre-chloromethane mixer 162 from which the material has been supplied from the conduit 160 and the conduit 12 can be analyzed to determine the amount of gas decane in the content of the prochlorobenzene mixture 162 prior to the disproportionation reactor. In particular, the amount of chlorine and ruthenium (including chlorine derived from hydrogenated hydrogen) in the contents of the pro-disproportionator pre-gas hydride mixer 162 can advantageously be determined by analysis. A novel method for optimally recovering all or at least a majority of ruthenium tetrachloride and gasification produced as a by-product during a chemical vapor deposition reaction in system 100, as discussed below and elsewhere herein. The ratio of gas to enthalpy in the reactants delivered to the disproportionation reactor n4 needs to be carefully controlled. This careful control of the ratio of gas to hydrazine effectively controls (specifically) the relative amount of dichlorodecane and dichloromethane produced in the disproportionation reactor ι4. Therefore, based on the amount of gas and hydrazine in the content of the pre-disproportionation reactor prechlorosilane mixture i 62, the amount of additional ruthenium tetrachloride to be added to the content of the pre-disproportionation reactor chlorodecane mixer 162 can be calculated and thus The amount of methotane to be added to the mixture after the mixture comprising ruthenium tetrachloride is delivered from the disproportionation reactor pre-gas oxime mixer 162 to the disproportionation reactor pre-decane/chloromethane mixer 106. Based on these calculations, the pipe 164 can supply a metered amount of pure gasified ruthenium as a replenishment gas to the gasification reactor before the chlorination of the pre-chlorination mixer 1 62. The amount of chlorine and ruthenium in the contents of the mixer 162 is burned and finally the ratio of gas to stone in the feed of the feed to the methane/gas hydride mixer 1 〇6 in the disproportionation reactor. The contents of the disproportionation reactor pre-chloromethane mixer 162 are conveyed via line 1 63 to the disproportionation reaction 152888.doc -51 · 201130733 pre-arms zeshi kiln/gas shovel mixer 106 and will be via line 1 〇4 After Shi Xiyuan is added to the disproportionation reactor pre-decane/gas hexane mixer 106 to initiate the process of preparing the ruthenium, as discussed above, the target chlorine content of the mixture in the pre-disproportion reactor pre-gas hexane mixer 162 is such that The molar ratio of chlorine to hydrazine represents one of the best reactant mixtures for maximizing the production of trigeminal gas in the disproportionation reactor 114 and minimizing or controlling the production of lower boiling gas decane (specifically dioxane). . In some embodiments, the gas to rhyme molar ratio corresponding to the reactant mixture in the promethine/gas decane mixer 106 of the disproportionation reactor ranges from about 2:1 to about 3.8:1. In some such embodiments, the molar ratio of chlorine to rhodium is in the range from about 3.1..1 to about 3.5:1. In some such embodiments, the molar ratio of the gas to the stone is in the range of from about 3.2:1 to about 3.3:1. In other such embodiments, the gas to enthalpy molar ratio is about 3.2:1. In still other such embodiments, the molar ratio of the gas to the enthalpy is about 3.3:1. In certain embodiments, other gaseous decanes (e.g., dichlorite or trigeminal) may be advantageously employed. The contents added to the disproportionation reactor pre-gas sinter mixer 162 and/or the disproportionation reactor pre-methane/gas hexane mixer 106 to assist in accurately adjusting the feed gas to the disproportionation reactor 114 to the rate of Shi Xi . In some embodiments, 'either as an alternative to or in addition to the addition of the four gasification hydrazine to the disproportionation reactor pre-gas hydride mixer 162, may be added to the CVD by adding pure smectite Pre-reactor mixer 132 is used to achieve the same effect. In such embodiments, the addition of a pure three gas stone court to the CVD reactor premixer 132 increases the production of tetrachlorine in the chemical vapor deposition reactor 136. This additional four gas fossils eventually flows to the disproportionation reactor pre-combustion mixer 162 (as discussed above) and thus has the direct addition of ruthenium tetrachloride 152888.doc -52- 201130733 to the disproportionation reactor. The gas decane mixer 162 is similar to one effect. In certain embodiments, when determining the concentration of reactants in the mixture of the pre-protonation reactor pre-methane/gas hexane mixer 106 as feed to the disproportionation reactor 丨 14, the step-by-step considerations are The reactants are provided in an amount that more efficiently drives the balance of a targeted reaction. For example, in the reaction of tetragassing ruthenium with decane in the disproportionation reactor H4, an excess of tetrachloride, which provides an amount exceeding the stoichiometric amount, is more effective in driving the formation of dioxane. To this end, an increased amount of four vaporized ruthenium may be added to the disproportionation reactor pre-gas hydride mixer 162. Thus, an increased amount of liquefied ruthenium can more efficiently drive the reaction in reactor 114 toward a higher amount of trioxane relative to other oxanes. These considerations for manipulating the reaction balance to optimize product yield can also be applied elsewhere in the system i. In certain embodiments, monochlorohydrin, digas (tetra), and/or trioxane may be added to the four gasified ruthenium (eg, by adding one or more of the gas oxiranes to the disproportionation reactor). The chlorosilane mixer 162) serves as a reaction initiator in the disproportionation reactor U4. In some such embodiments, the molar ratio of one or more of the chlorosilanes to ruthenium tetrachloride may range from about 1:1 to about 2.5.1. In still other such embodiments, the molar ratio may range from about 1:1 to about 1:1. In still other such embodiments, the molar ratio can be about 1:2. In such embodiments, when mono-monodecane, dioxane, and/or trichloromethane and ruthenium tetrachloride are mixed, the mixtures are prepared to add methotoxane to the four gasified ruthenium, other chlorodecane, and hydrogen chloride. The mixture is maintained to maintain an optimum ratio of gas to enthalpy in the disproportionation reactor feed. 152888.doc -53· 201130733 As described herein and schematically illustrated in FIG. 1A, the system 100 for manufacturing crucibles is particularly suitable for treating an increased amount of four gas fossils supplied to a disproportionation reactor as described above. The fourth gasification enthalpy remaining after the reaction in the disproportionation reactor Π4 is separated from the reaction product in the helium tetrachloride separator 118 after the disproportionation reactor and is transported to the disproportionation reactor by the pipe i 2 〇. The simmer mixer 162 is recycled for further use within the system. More generally, the system 100 is specifically designed to efficiently use by-products of the reactions that occur during the manufacture of the crucible. In particular, the operation of system 100 does not require isolation, removal, and/or reprocessing of at least a majority of by-products from the various reactions that occur. This is because such by-products are efficiently recycled and utilized within the system. While it may be desirable to separate certain excess reactants and/or reaction byproducts from one another at various locations within the system, this process can be readily and efficiently implemented during operation of the system and provides a method than is employed in prior systems. (They need to isolate, remove and/or reprocess materials (specifically by-product by-products)) a more cost effective method. Recycling by-products as described herein further results in particularly efficient conversion of reactants and by-products to maximize the yield of hydrazine. That is, the by-products containing niobium (specifically, niobium tetrachloride and dichae) continue to circulate through the system and thus the niobium contained in the by-products can eventually be recovered as usable niobium (required product). Moreover, the operation of the system for manufacturing crucibles as described herein not only improves the efficiency and cost effectiveness of the crucible relative to existing manufacturing systems and processes, but it also overcomes environmental issues associated with the disposal of certain by-products, such as four. Gasification of hydrazine, hydrogenation of hydrogen and dioxane. The chlorination 152888.doc -54· 201130733 产生 produced as a by-product of the reaction in the CVD reactor 136 can be recycled back through the system and with other reactants (including the disproportionation reactor methylmethine/gas decane mixer i06) Mixing decane and chlorodecane throughout the process. The vaporized hydrogen by-product from CVD reactor 136 can thus participate in maintaining gas balance within the system. Hydrogen chloride must remain dissolved in the liquid gas decane mixture as it flows from the CVD reactor after the hydrogen knife separator 150 flows through the system. The reaction of vaporized hydrogen with the methane added to the mixer 1〇6 via line 104 can produce trichloromethane, for example, by the following reaction:

SiH4 + 3 HCl - SiHCl3 + 3H2 An exemplary reaction of hydrogenated hydrogen with chlorodecane is shown elsewhere herein. The reaction of methotrexate and various formoil derivatives with hydrogen chloride can be extremely hot. However, the relative amount of hydrogen chloride by-product in the fluid, and thus the amount of heat generated by the reaction with formoxane and any other reactants, may advantageously be such that the system can be borrowed, as compared to the volume of the stream through the system. The liquid is easily dissipated by mixing the liquid in the disproportionation reactor, and flowing the liquid through the disproportionation reactor pre-methane/gas hexane mixer 106. Alternatively, the apparatus may optionally be in one or more locations in the promethan/gas decane mixer 106 and the disproportionation reactor 114 prior to the disproportionation reactor and/or in the pre-disproportionation reactor meson/chlorosilane mixer 1〇6 A cooling system is included with the disproportionation reactor 114 (e.g., a heat exchanger that may allow the system to be cooled step by step or at a single location in this portion of the process. As discussed elsewhere herein, in a disproportionation reactor The resin used in 4 becomes unstable at elevated temperatures. Therefore, the process controller must maintain the feed temperature to the disproportionation reactor 114 at less than 8 〇t:, preferably no higher than 7 〇. °C, more preferably between about 6 (rc and about 7 〇t. The heat drawn from the fluid stream during cooling can be used in other aspects of the process requiring heat. 152888.doc •55· 201130733 In addition to hydrogen chloride In addition to the heat generated by the reaction with formoxane, the reaction also produces hydrogen as a by-product. Substantially the reactants must be supplied as a single phase to the disproportionation reactor 114. Therefore, it is designed to maintain hydrogenation by Process flow The facility utilizing one of the hydrogen chlorides may require application of a fluid between at least the disproportionation reactor pre-decane/gas decane mixer 1〇6 and the outlet of the disproportionation reactor U4 sufficient to maintain most or substantially all of the hydrogen dissolved in the fluid. Pressure. For example, the pressure in this portion of the system can be set at 2500 psig or below 25 〇〇/square inch gauge, specifically at about 1500 lbs/ The square inch gauge pressure is between about 25 mash/square inch gauge pressure, more specifically between about 18 mash/square inch gauge pressure and about 2200 psig. Preferably, the pressure should be set at the lowest level necessary to maintain the process fluid in the disproportionation reactor 114 at a single phase. If desired, at other locations within the facility, the pressure drop allows for release to remain dissolved. Any hydrogen in the fluid. Figure 1B shows an alternative aspect of the system 1 of Figure 1A associated with the removal of hydrogenated gas from a liquid gas decane mixture in which the vaporized hydrogen is suspended or dissolved. Figure 1B and the component shown in Figure 1A Or similar elements are identified by the same number. Although advantageously vaporized hydrogen can be maintained in the liquid chlorite mixture supplied to the gas streamer 162 before the disproportionation reactor via line 160 (as described above with respect to Figure 1A) It is contemplated that the vaporized hydrogen may be removed in other situations. In one embodiment as illustrated in Figure IB, the conduit 154 will contain a liquid of vaporized hydrogen and gas decane.

The mixture is sent from the CVD reactor to the hydrogenation separator 150 after the hydrogen separator 150 is sent to the CVD reactor. The post-CVD reactor gasification hydrogen separator 156 can be any design suitable for removing hydrogenation from chlorodecane. For example, hydrogen chloride after CVD reactor 152888. Doc • 56 · 201130733 The knife remover 156 may allow vaporized hydrogen gas to be released from the liquid mixture of the gasification hydrogen separator 156 after being delivered to the CVD reactor via line 154. In one embodiment, the vaporized hydrogen gas is then selectively moved through a gas permeable membrane. In another embodiment, the hydrogen chloride gas is moved through a dedicated helium chloride. In yet another embodiment, the vaporized hydrogen gas can be separated from a distillation column as a low boiling point product. The conduit 158 can deliver the vaporized hydrogen gas to a & gas distribution and/or storage system (not shown) after passing through or recovering from the membrane or the distillation column. This dispensing system can recycle the hydrogen chloride recovered in this manner back to the process disclosed herein for further processing. The Shixi manufacturing process disclosed herein provides an amazing opportunity to recycle the characteristics of hydrogen chloride produced during such processes, as discussed elsewhere herein. Another option is to deliver the stored hydrogen chloride gas to and used in the trichloromethane manufacturing facility. In still other alternatives, the stored gasification gas may be further purified (specifically for removal of residual chlorodecane) and sold for various applications requiring high purity gasification hydrogen gas. For example, the vaporized hydrogen gas from channel e 158 can flow through a carbon absorption bed to remove residual gas. Alternatively - the hydrogen chloride gas may be flowed on one of the exchangers containing liquid nitrogen to condense (iv) chlorine money. In either of these processes, the gas can be recovered and recycled back to the system for making a polycrystalline stone, such as the system described herein. In at least one embodiment, the separated gasified hydrogen can be suitably disposed of or disposed of, if necessary, rather than recycled or recovered and purified.隹糸 ΙϋΟ — some ---, ~ π T, after the Han Ying device gasification hydrogen distributor! 56 may only partially remove the vaporized hydrogen from the contents of the conduit 154. In other embodiments, the post-CVD system may not even contain CVD reactor gas 152888. Doc -57- 201130733 Hydrogen separator 156' as described elsewhere herein as an alternative to the removal of vaporized hydrogen by a CVD reactor post-gasification hydrogen separator ι56 as described above, hydrogen separation after CVD reactor The reactor 15 can be designed and operated to separate hydrogen and some or all of the vaporized hydrogen from the by-product mixture of the hydrogen separator 15 after self-delivery to the CVD reactor. In one such embodiment, a gaseous mixture of hydrogen and hydrogenated hydrogen can be passed through a bed of carbon (e.g., activated carbon) to remove hydrogen chloride from the hydrogen. In another embodiment, a heat exchanger comprising a coolant (e.g., liquid nitrogen) can condense hydrogenated from the mixture by cooling the gaseous mixture to a dew point of the vaporized hydrogen. In another embodiment, a combination of absorbent distillation and stripping can remove hydrogenated hydrogen from the hydrogen in the mixture. Although vaporized hydrogen can be removed in a variety of ways, as further described elsewhere herein, retaining the vaporized hydrogen in the gas decane mixture eliminates the need for equipment to treat the hydrogenated gas separately and can also help to maintain suitability. The optimal operating gas balance of the polycrystalline stone manufacturing system. In some implementations, the vaporized nitrogen by-product from CVD reactor 136 may only be partially retained in the process flow and thus only partially recycled in this manner. In some such, the post-reactor gasification gas separator 156 may remove a portion of the vaporized hydrogen for other uses, leaving residual hydrogenation in the process stream. For example, the process controller can set the amount of vaporized hydrogen to be recycled; at a level suitable for maintaining a ratio of one of the various reactants in the various reactants being fed to the disproportionation reactor 114. . The vaporized hydrogen that is not so recycled can be removed from the process shown. Thus, in some embodiments, the post-CVD reactor vaporization hydrogen separator 156 may only be partially 152888. Doc -58- 201130733 Remove gasification hydrogen. In other embodiments, the CVD reactor post-gasification hydrogen separator 156 can remove a point, if any, of vaporized hydrogen. The disposal of hydrogen and hydrogen chloride in various embodiments of system 100 is further described elsewhere herein. Figure 1C shows an alternative to the further process of system 1 of Figure 1A and a by-product for recycling the gas-fired reaction of the gas stream released from cvd reactor 136. Elements of Figure 1C that are identical or similar to elements shown in Figure 1A are identified by the same number. In one embodiment, as shown in FIG. 1C, the conduit 172 will vaporize hydrogen (if not otherwise removed) and gaseous decane by-products (including hafnium tetrachloride, trioxane, and dioxane) from the CVD reaction. After the gasification hydrogen separator 156 is sent to the CVD reactor, the gas decane separator! 74 ^ In another embodiment, the system may not include a CVD reactor post gasification hydrogen separator 156. In this embodiment, the vaporized hydrogen and gas stone by-product by-product is sent directly from the cvd reactor to the gas decane separator 174 after the hydrogen separator 150. After the CVD reactor, the gas slab separator 174 is advantageously separable from the separation of the dichloromethane and trichloromethane from the chlorination of the chlorination reactor after the separation in the gas decane separator 174 of the CVD reactor. The trichlorosulfonium is sent to a dichloromethane/trioxane separator 182. The dioxane/trioxane separator 182 advantageously separates the dioxane from the trioxane. The conduit 186 transports the trioxane from the dioxane/trichlorosilane separator 182 to the CVD reactor pre-gasifier 128. It is thus recycled for depositing polycrystalline germanium in the CVD reactor 136. Pipeline 184 delivers the dioxane from the dioxane/trioxane separator 182 to the chlororeactor mixer 178. After the CVD reactor, the gas decane mixer 178 is mixed with dioxane and the pipe 176 contains four gasification cesium 132888. Doc -59· 201130733. The conduit 160 is conveyed from the CVD reactor post-gas alkane mixer 178 to a mixture comprising dioxane and tetragas hydride for recycling to the system 100, as described above and illustrated in Figure 1A. In certain embodiments, if desired, the dioxane is delivered to the CVD reactor via line 184 and the gas decane mixer 178 is combined with the contents of the conduit 176 containing the liquefied ruthenium to be controlled to produce in the decane. The amount of dioxane and/or gas to dream ratio of the mixture of gaseous decane which is the best for the reaction in the disproportionation reactor 114 will be provided upon mixing. As described above, additional liquefied ruthenium may be added to the mixture prior to combining the chlorine > e-sinter mixture delivered by the conduit 160 with the decane to adjust the amount of reactants in the mixture and the enthalpy of the gas. The ear ratio produces an optimum amount of trioxane and delivers it from the disproportionation reactor 114 in Figure 1A to the CVD reactor 136. In certain embodiments, system 1 may not include a conduit 184 and a CVD reactor post-gasstone mixer 17 8 . In the embodiments of system 1 〇 0, the second gas stone garden separated by a gas stone kiln/three gas stone separator 182 can be transferred to a two gas smash storage system. The thus stored dichloromethane can be added to the gas sulphur mixture supplied to the disproportionation reactor 114 and/or directly to the chemical vapor deposition reactor 136 to assist in controlling the amount of reactants during operation of the system. The ratio of gas to sputum is discussed in the context of this article. Alternatively, the stored dioxane may be supplied or sold for other uses or disposed of properly. Figure 1D shows the system of Figure 1A and used for recycling hydrogen and from a CVD reactor. The gaseous by-product of the reaction removes one of the vaporized hydrogen replacement processes. Figure 1D is the same or similar component as the one shown in Figure 1A. Doc -60- 201130733 is identified by the same number. As shown in Figure 1A, conduit 140 delivers the reaction by-products and excess reactants from CVD reactor 136 to the first cooler 142 after the CVD reactor. The conduit 143 delivers the cooled material to the post-CVD decanter 169. Pipeline 145 delivers a higher boiling point of metostere for later processing with such materials in the process' as described elsewhere herein. The conduit 17 i delivers the lower boiling by-products and reactants from the post-CVD decanter 169 to the post-CVD reactor 144. The conduit 147 delivers the two-phase gas-liquid mixture produced by the CVD reactor post compressor 144 to the CVD reactor, the second cooler 146 ° conduit 148, and the gas-liquid mixture of by-products and reactants from the CVD reactor. The cooler 146 is sent to the hydrogen/hydrogenation hydrogen splitter 188 after the CVD reactor. After the CVD reactor, the hydrogen/hydrogen chloride separator 188 removes hydrogen and hydrogen chloride from the gaseous decane by-product and excess reactants, and the conduit 191 delivers a mixture of hydrogen and hydrogenated hydrogen to the hydrogen/hydrogenation hydrogen separator 192' of the CVD reactor. The hydrogen is separated from the vaporized hydrogen. Stream 196 delivers hydrogen from the CVD reactor pre-hydrogen/hydrogenation hydrogen separator 192 to the CVD reactor premixer 132' which mixes hydrogen with chlorodecane (primarily trichloromethane) for delivery to the CVD reaction via line 134. The 136 is as disclosed and discussed above. Therefore, the argon gas is recycled back to the system 1 for use in the manufacture of the CVD reactor. Line 194 delivers hydrogen chloride from the CVD reactor front hydrogen/hydrogenation hydrogen separator 192 to a gasification hydrogen storage system. As discussed elsewhere herein, the vaporized hydrogen can be transferred to a trichloromethane manufacturing facility where it can be diverted and reacted separately with formane or dioxane, either sold or discarded. Figure 1E shows the system 1 of Figure 1A and the gasification hydrogen and formoxane produced as a by-product in the CVD reactor 136 alone to produce one of the chlorodecanes. Doc 61 · 201130733 Optional aspect. Elements of Figure 1E corresponding to the elements shown in Figure 1A are identified by the same number. As described herein and as shown in Figure 1A, the conduit 154 delivers the CVD reactor by-product from which hydrogen has been removed to the CVD reactor post-hydrogen chloride separator 156. The CVD reactor post-hydrogen chloride separator 156 separates hydrogen chloride from the CVD reactor by-product. In Figure ι, line 157 delivers vaporized hydrogen from the CVD reactor post-gasification hydrogen separator i56 to a disproportionation reactor pre-methane/hydrogenation reactor 159. The disproportionation reactor pre-decane/hydrogen chloride reactor 159 receives the decane via line 155. The hydrogenation of hydrogen to the procarbazine/hydrogenation reactor 159 prior to the disproportionation reactor may also come from a variety of other sources, including sources within the polysilicon manufacturing facility and elsewhere. The disproportionation reactor pre-decane/hydrogenation reactor 159 reacts the vaporized hydrogen with the methanthanol to produce the gas decane. In certain embodiments, the disproportionation reactor front formazan/hydrogenation reactor 159 is advantageously It mainly produces three gas decane and two gas brothels. In other embodiments, the "disproportionation reactor pre-methane/hydrogenation reactor 159 can produce primarily liquefied ruthenium. The pipe ι 61 conveys the gas decane self-disproportionation reactor pre-methane/hydrogenation reactor 159 to the disproportionation reactor pre-gas sinter mixer 162. Alternatively, the gas decane from the first 159 of the disproportionation reactor can be directly sent to the disproportionation reactor shown in Figure 1A after the four gasification ruthenium separator 118» due to the pre-methane/hydrogenation reaction of the self-disproportionation reactor The gas decane supplied to the disproportionation reactor pre-gas hydride mixer 162 includes the elemental gas and thus the gas decane supplied may facilitate the operation of the processes described herein at the optimum ratio of the elements. The self-disproportionation reactor via line 161 provides the recovery of the various gas decane supplied to the gas streamer 162 of the disproportionation reactor and other sources from the system, 152888. Doc •62- 201130733 The amount of chlorite-fired can be used to limit the amount of replenishment of the four gas fossils required for the operation of the best gas to the ratio of Shi Xi, as discussed above with respect to the system (10). The output of the disproportionation reactor pre-decane/hydrogenation reactor 159 can be passed through a cooling system (e.g., one or more heat exchangers) to reduce the temperature of the output.  The heat exchanger such as helium can supply the heat of the output reaction mixture removed from the pre-disproportionation reactor before the calcining gas/gasification gas reactor 159 back to the disproportionation reactor, the monthly calcination/hydrogenation reactor 159. Or other locations in the facility that require heat. For example, σ can supply heat to various separators, in particular steamers. In certain embodiments, one or more heat exchangers may be located in the pre-disproportionation reactor pre-methane/hydrogen chloride reactor 159. In other embodiments, the disproportionation reactor pre-methane/hydrogen chloride reactor 159 may be comprised of a plurality of reactors in series with a heat exchanger or other specialized cooling element positioned at the plurality of such heat exchangers or other specialized cooling elements. Between each of the reactors. In such embodiments, the reactor and the cooling element can be alternately positioned in series, respectively. The CVD reactor post-gasification hydrogen separator 156 can supply substantially pure gasification hydrogen to the disproportionation reactor pre-methane/hydrogenation reactor 丨59 (although a small amount of tetra-gasification ruthenium and/or trichloro decane can be used. Accepted). In certain embodiments, the metformane supplied to the disproportionation reactor pre-decane/hydrogenation reactor 159 may be otherwise otherwise fed to the disproportionation of the system 100 illustrated in Figure 1 and described above. One part of the decane of the reactor of the former methan/gas mixture of the reactor, for example 5% to 15%. Under the selected operating conditions, the disproportionation reactor pre-decane/hydrogen chloride reaction 1528E8. Doc -63 - 201130733 159 operates at a temperature sufficient to fully convert the hydrogenation gas. In certain embodiments, the disproportionation reactor pre-methane/evaporation argon reactor 159 can be operated at a temperature greater than one of 100 °C. In certain other embodiments, the disproportionation reactor front shale > / gasification gas reactor 159 can be operated at a temperature greater than 200 °C. In still other embodiments, the disproportionation reactor procarbazine/hydrogen chloride reactor 159 can be operated at a temperature ranging from about 300 °C to about 60 °C. Temperatures above 600 °C can negatively affect the interior of the procarbation reactor pre-methane/hydrogenation reactor 159', for example, causing corrosion or loss of material strength. The disproportionation reactor pre-methane/hydrogenation reactor 159 can be operated with or without a catalyst. If used, the catalyst can be in the form of a copper wire or a substrate that is implanted into copper. The substrate can be ultrapure, whereby no contaminants are introduced into the product of the reactor. The conduit 161 can deliver the product of the reaction in the pre-disproportionation reactor methanine/hydrogenation reactor 159 as a vapor to the disproportionation reactor pre-gas decane mixer 162. If added as a vapor, the temperature to which the vapor is added (e.g., in the gasification mixer 162 before the disproportionation reactor) can be adjusted such that the vapor supplied by the conduit 161 condenses and combines with the liquid. As described elsewhere herein with respect to system 1A of Figure 1A, the liquid supplied to mixer 162 is primarily gas decane. In one embodiment, the product of the disproportionation reactor pre-methane/hydrogenation reactor 159 is supplied as a vapor to the disproportionation reactor pre-gas decane mixer 162 instead of the conduit 16 ,, alternatively to the disproportionation reactor. Before the gas smelting mixer 162, for example, by disclosing a heat exchanger cooled by any cooling medium suitable for the task, the disproportionation reactor front armor I52888. Doc • 64 · 201130733 The product of the reaction in the calcination/hydrogen chloride reactor 159 is condensed. Alternatively, the liquid or vapor from the disproportionation reactor pre-methane/hydrogenation reactor 159 can be supplied directly to the disproportionation reactor pre-decane/chloromethane mixer 1〇6. During operation of the procarbazine/gas hydride reactor 159 prior to the disproportionation reactor, the reaction produces hydrogen as a by-product as discussed elsewhere herein. The methane/hydrogenation reactor 159 and/or conduit 16 1 may be operated at a pressure sufficient to maintain hydrogen in the solution prior to certain embodiments' disproportionation reactor. In other embodiments, the reaction product from the disproportionation reactor pre-methane/hydrogenation reactor 159 can be directed back to the CVD reactor followed by a hydrogen separator 15 to remove hydrogen. In certain embodiments, the 'disproportionation reactor pre-decane/hydrogen chloride reactor 159 advantageously operates with an excess of the stoichiometric mole of vaporized hydrogen relative to chlorodecane. Under various embodiments of the conditions, the disproportionation reactor pre-methane/hydrogenation reactor 159 preferably provides at least 60% of the diatoms provided by the decane, preferably at least 70%, more preferably At least 8%, more preferably at least 90% 'and optimally 1% to 0% converted to chlorodecane. In certain embodiments, the "disproportionation reactor pre-decane/hydrogenation reactor 159 converts at least a majority of the meteorites to dioxane, trichlorodecane, and tetragas hydride. In other embodiments, the "disproportionation reactor pre-decane/hydrogenation reactor 159 converts at least a majority of the methanthanol to trichlorodecane and hafnium tetrachloride. In most embodiments, there is a little bit of methotane or mono-decane, if any. Since the excess hydrogenation of hydrogen on the moles is present in the methane/hydrogen chloride reactor 159 prior to the disproportionation reactor, the output of the pre-reactor pre-decane/hydrogenation reactor 1 59 also contains unreacted Hydrogenated hydrogen. Additionally, disproportionation 152888. Doc -65- 201130733 The reaction in the reactor pre-methane/hydrogenation reactor 159 produces hydrogen. In certain embodiments, the 'disproportionation reactor pre-methane/hydrogenation reactor 159 can be operated in a stoichiometric excess relative to the vaporized hydroformane to quantitatively incorporate gas from the hydrogenation gas into the gas. Shi Xiyuan. In some such embodiments, the gas oxane produced in the procarbation reactor pre-methane/hydrogenation reactor 159 may comprise primarily dioxane and trioxane. In other embodiments, the chlorodecane produced in the metaxane/hydrogenation reactor 159 prior to the disproportionation reactor may comprise a single gas helium. In some embodiments, the output of the disproportionation reactor pre-decane/hydrogen chloride reactor 159 to line 161 may comprise unreacted formane. In certain embodiments, the 'disproportionation reactor pre-methane/hydrogenation reactor 159 can be supplied to the gasification hydrogen before the disproportionation reactor decane/hydrogen chloride reactor 159 and the sulphur gas is burned at any one of It is not operated in the case of a stoichiometric excess relative to the other. That is, under these conditions, substantially all of the ruthenium supplied in the formane and substantially all of the gas supplied in the hydrogen chloride are reacted in the formazan/gas hydride reactor 159 before the disproportionation reactor to form Gas decane. In such embodiments, the output of the disproportionation reactor pre-methane/vaporized argon reactor 159 may be substantially free of formazan and substantially free of vaporized hydrogen. In some of these embodiments, the disproportionation reactor pre-combustion/gasification hydrogen reactor 159 converts the gas and gas into two gas stone, three gas, and four gas. In certain embodiments, the disproportionation reactor pre-decane/hydrogen chloride reactor 159 converts the helium and the gas primarily to dioxane and trioxane. In some such embodiments, the disproportionation reactor pre-methane/hydrogenation reactor 159 converts rhodium and chlorine primarily to trioxane. In other this 152888. Doc • 66 - 201130733 In the examples, etc., the disproportionation reactor pre-stone calcination/hydrogenation reactor 1 5 9 can convert helium and gas into dichlorodecane. In certain embodiments, the disproportionation reactor pre-decane/hydrogen chloride reactor 159 can produce only a low amount of monogas decane. For example, the disproportionation reactor pre-decane/hydrogenation reactor 159 can produce only 1 mole% to 2 mole% of monogas decane, with the remainder being gas decane having a higher ratio of chlorine to ruthenium. Figure 1F shows an alternative aspect of the system 100 of Figure 1A in combination with replenishing hydrogen chloride and replenishing the meteorite to produce gas decane. In particular, Figure F shows an alternative to the aspect shown in Figure 1E of system 100. Figure 1 Corresponding to the elements of the elements shown in Figures 1A and 1E are identified by the same number. As described elsewhere herein and shown in FIG. 1A, conduit 16A delivers a by-product mixture from CVD reactor 136 to a disproportionation reactor pre-gas streamer 162' that has been in the post-CVD reactor 150 from the by-product mixture Remove hydrogen. In FIG. 1E, conduit 183 delivers replenished gaseous hydrogen to the disproportionation reactor pre-methane/argon chloride reactor 159 » conduit 155 delivers the makeup to the disproportionation reactor mash-burn/disproportionate hydrogen reactor 159 . The replenishing hydrogen chloride and the supplemental decane are reacted in a decane/hydrogen chloride reactor 159 before the disproportionation reactor to produce gas decane. In certain embodiments, the disproportionation reactor pre-methane/hydrogenation reactor 159 advantageously produces primarily trioxane and dioxane. In other embodiments, the disproportionation reactor pre-decane/hydrogenation reactor 159 can produce primarily ruthenium tetrachloride. The conduit 161 delivers the gas decane self-disproportionation reactor pre-methane/hydrogenation reactor 159 to the disproportionation reactor pre-chlorosilane mixer 162. Alternatively, the chlorodecane from the disproportionation reactor pre-decane/hydrogenation reactor 159 can be delivered directly to the differential 152888 shown in Figure ία. Doc •67· 201130733 After the reactor, the four gasification enthalpy separator i! As discussed elsewhere herein, the gas decane supplied may be advantageous as the gas decane supplied to the disproportionation reactor pre-chlorosilane mixer 162 by the auto-disproportionation reactor pre-methane/hydrogenation reactor 159 includes elemental helium and gas. The processes described herein are operated at the optimum ratio of the elements. The aspect shown in FIG. 1F may provide an alternative to supplying replenishment of gasified ruthenium to a disproportionation reactor pre-gas decane mixer 162 via line 164 as described elsewhere herein. Figure 1G shows an alternative aspect of the in-situ reaction of the system of Figure 1A with the vaporized hydrogen by-product from the chemical vapor deposition reactor 136 and the gas decane by-product. In one such embodiment, the system is designed to allow the in situ reaction to advantageously occur near the exit from the CVD reactor. The components of Fig. 1G corresponding to the elements shown in Fig. 1A are identified by the same reference numerals. As shown in Figure 1G and elsewhere herein, the conduit 〇4〇 delivers by-products from the CVD reactor 136. As described elsewhere herein, by-products from the reactor contain hydrogen, hydrogenated hydrogen, and various gas decanes. The temperature of the by-product leaving the CVD reaction 136 may range from about 8 Torr to about 1000 °C. In some processes for making polycrystalline germanium in a CVD reactor, the by-products from the CVD reactor can be rapidly cooled to a temperature of less than 150 °C. However, recycling the gasification hydrogen by in-situ reaction of the vaporized hydrogen by-product from the CVD reactor with the gas-stone by-products benefits from maintaining the temperature of the output from the CVD reactor at an elevated level. . In some such processes, the by-product can be cooled to a temperature in the range of from about 300 °C to about 400 °C. In other such processes, the by-products can be cooled to from about 400 ° C to about 700. One of the ranges of 〇 152888. Doc • 68 · 201130733 degrees. In some of these processes, the by-products can be cooled to a temperature ranging from about 400 ° C to about 500 ° C. Appropriate temperature control can be achieved by heat exchange between the effluent from various reactors within system 100 and the input to the reactors. In certain embodiments, as shown in Figure 1G, conduit 140 delivers by-products from CVD reactor 136 to an in-situ gasification reactor heat exchanger I]. The in situ hydrogen chloride reactor heat exchanger 135 can transfer heat to the inner valley of the pipe to increase the temperature of the gaseous by-product from the CVD reactor 13 to an in situ reaction system for the gasification of hydrogen and gas stone. One of the temperatures, for example, to about 500 °C. The conduit 133 (the conduit 140 or a continuation of one of the conduits 126 discussed below) delivers the gaseous by-product mixture from the in-situ gasification hydrogen reactor heat exchanger 135 to the CVD reactor followed by the in-situ gasification hydrogen reactor 137. The reaction in the in-situ reactor is slightly hot, and thus the temperature may rise during the reaction, e.g., by about 20 ° C to about 25 ° C or by about 40 T: to about 50 ° C. The official passage 139 delivers the reaction mixture to the in situ gasification hydrogen reactor heat exchanger 135. In the embodiment shown in Figure 1G, the in-situ gasification hydrogen reactor heat exchanger 135 delivers heat from the reaction mixture exiting reactor 137 via line 139 to the reaction mixture entering reactor 137 via line 133. The pipe 141 (continuation of the pipe 139) delivers the reaction mixture from the CVD reactor after the in-situ hydrogen chloride reactor 137 to the post-reflux first cooler 142 via the in-situ gasification helium reactor heat exchanger 135. In some embodiments, it may be necessary to raise the temperature of the exhaust stream from the CVD reactor 13 in the conduit i4 to initiate an in situ reaction of the argon chloride with the chlorodecane. In these embodiments, the conduit 丨4〇 delivers the exhaust stream to an optional 152888. Doc •69· 201130733 Start the heater 131. When an optional starter heater ^ is used, line ι26 will be passed through a heated stream to the in-situ hydrogen chloride reactor system after the CVD reactor. In some embodiments, the temperature of the exhaust stream from CVD reactor 136 in conduit 14A can be greater than 500 ° C. In such embodiments, a waste heat boiler can be placed in conduit 140 to remove heat and The temperature is reduced to 500 〇c while producing a stream for use elsewhere in the system 100 or discharged from the system 1 。. In some embodiments, advantageously a conduit i 85 can deliver pure decane and/or pure gasification hydrogen to the mixture supplied from the CVD reactor 136 to the in situ gasification hydrogen reactor 13 7 after CVD. In such embodiments, the supply of gangue and/or vaporized hydrogen may minimize the need to add pure four gas fossils at other stages of the process as described elsewhere herein. In certain embodiments, a small amount of slate can be delivered to a mixture of other stages of the process (e.g., to the contents of line 141) to convert traces of residual hydrogen chloride to gas smoldering. In one embodiment of this aspect of system 100 shown in Figure 1G, the by-product mixture delivered from CVD reactor 136 via line 140 can be cooled to about 30,000 C. In such embodiments, as an alternative to the optional starter heater 13 1 'the in situ gasification hydrogen reactor heat exchanger 135 can transfer sufficient heat to the contents of the conduit 140 to bring the byproduct mixture to a temperature of about 3 〇〇〇c is raised to about 500 °C. In a particular embodiment, the reaction in the in situ gasification hydrogen reactor 137 after the CVD reactor can raise the temperature of the reaction mixture from about 500 ° C to about 522 ° C. Further, in this embodiment, the in-situ hydrogen chloride reactor heat exchanger 135 can transfer heat from the reaction mixture delivered from the reactor 137 via line 139 to the by-product mixture conveyed from the CVD reactor 136 via line 140. The transferred heat may be sufficient to exit 152888 via conduit 141. Doc -70· 201130733 The temperature of the reaction mixture of the in-situ gasification hydrogen reactor heat exchanger 13 5 is lowered to about 322 ° C and the by-product mixture leaving the in-situ gasification hydrogen reactor heat exchanger 135 by the pipe 133 The temperature is increased to about 500. (: The reaction between the vaporized hydrogen and the gas oxime by-product in the in-situ gasification hydrogen reactor 137 after the CVD reactor depends on the residence time and temperature of the reaction mixture in the in-situ hydrogen chloride reactor 13 7 after the CVD reactor. The residence time must be Sufficient to allow the reaction of gasification of hydrogen in the in-situ hydrogen chloride reactor 137 after the CVD reactor. The reactor 13 is thus designed to pass the by-product hydrogenation reaction after passing the by-product mixture from the CVD reactor 136 through the CVD reactor. The flow rate and temperature considerations of 137 are internal and allow sufficient residence time of the reaction mixture in reactor 137. The flow rate of the by-product mixture from the CVD reactor typically varies from system to system and is therefore not easily controllable. The residence time in the hydrogen chloride reactor is most easily controlled by setting the volume of the in-situ reactor. This can be most easily provided by adding the number of necessary in-situ reactors (in parallel or in series) to provide a suitable by-product mixture. The reaction conditions and the flow rate of one of the flow rates are achieved. In some embodiments where multiple reactors are used, the reactions are carried out in different reactors. The temperature can be different. For example, the temperature in one of the series of initial reactors can be higher than the temperature in a subsequent reactor. The initial reactor with higher temperature allows most of the reaction to occur (faster) Kinetics) with one of the lower temperatures, the subsequent reactor may be more suitable to bring the reaction to equilibrium. In certain embodiments, the reaction in the in situ gasification hydrogen reactor 137 after the CVD reactor may take up to two minutes. Or longer. In some embodiments, the 152888. Doc 201130733 and other reactions can take up to 1 minute. In other embodiments, the reactions may need to be between 30 seconds and 1 minute. In still other embodiments, the responses may need to be between 10 seconds and 30 seconds. In still other embodiments, the reactions may need to be between 1 second and 1 second. In certain embodiments, the reactions may take less than one second. In some embodiments, a manufacturing plant may include one, two, three or four CVD reactors followed by an in-situ gasification hydrogen reactor. Figure 1H shows an alternative to the system of Figure 1A and the reaction of vaporized hydrogen with decane in the vicinity of the outlet of the autochemical vapor deposition reactor 136. Elements of Figure 1H corresponding to the elements shown in Figure 1A are identified by the same number. As shown in Figure 1H and elsewhere herein, the conduit 14 is transported from a by-product of the CVD reaction | § 13 6 . In the embodiment shown in Figure 1 η, conduit 140 delivers the by-products to a decane/hydrogen chloride reactor 149 after a CVD reactor. As also shown in FIG. 1A and elsewhere herein, the CVD reactor post-hydrogen chloride separator 156 separates the vaporized hydrogen from a by-product of the CVD reactor 136. The conduit 165 delivers the vaporized hydrogen from the CVD reactor post-gasification hydrogen separator 156 to the decane/hydrogenation reactor 149 after the CVD reactor. The contents of the decane/hydrogenation reactor 149 after the 0 VD reactor contain the by-product of the CVD reactor 136 delivered by the conduit 140. Line 167 delivers the decane to the decane/hydrogenation reactor 149 after the CVD reactor. Hydrogen chloride supplied via line 165 and decane supplied via line 167 are combined with by-products exiting CVD reactor 136 via line 140. In certain embodiments, the amount of formoxane in the gangue/hydrogenation reactor 149 after delivery to the CVD reactor via line 167 is the same as the amount of hydrogenation in reactor 149 (including via 152888. Doc • 72- 201130733 Pipeline 165 added hydrogen chloride) is limited in stoichiometry. That is, after the hydrogen chloride and dimethyl hydride are added to the decane/hydrogen chloride reactor 149 after the CVD reactor, there is a vaporized hydrogen gas in excess of the dimethyl hydride in the reactor 149. In certain embodiments, the process in the decane/hydrogen chloride reactor after CVD can be staged in various ways to optimize the results. In general, most of the vaporized hydrogen is reacted in situ in a first stage to achieve 8〇% to 100°/. Conversion. A small amount of formane can then be added as needed to further convert any residual hydrogenation to chlorodecane. This process for the conversion of gasification to chlorite in the release stream and careful control of the addition of formazan can allow complete reaction of the substantially vaporized hydrogen by-products. This phased and controlled can thus avoid borrowing The vaporized hydrogen is removed by the post-CVD gasification hydrogen separator 156 and recycled back to the CVD post-methane/hydrogenation reactor 149 via line 165. The rapid cooling of the chemical vapor deposition reactor releases the by-products to help limit the production of tetragassing ruthenium, which typically requires disposal in the absence of the recycling process described herein. However, the reaction of decane with hydrogenated hydrogen proceeds only slowly at these reduced temperatures. Thus, recovery of the use of vaporized hydrogen by reaction with decane in the decane/hydrogenation reactor 149 after the CVD reactor can benefit from maintaining the temperature of the output from the CVD reactor 136 at an elevated level. Be sure. The content of the decane/hydrogenation reactor 149 after the CVD reactor. The selection of an optimum temperature must take into account the various reactions that occur. The temperature is selected to maximize the production of preferred products from such reactions. Preferably, the determination condition 152SB8 can be expected for the polycrystalline process described herein. Doc -73- 201130733 such that the output of the decane/hydrogenation reactor 149 from the CVD reactor into the manufacturing system contains mainly trioxane and tetragas ruthenium, with only a limited amount of dioxane, and a minimum amount Single gas decane, formane or hydrogenated gas. The CVD reactor post-hydrogenation hydrogen separator 156 is not necessary in a system capable of reacting all of the vaporized hydrogen from the by-product. Based on the calculation using the equilibrium reaction, during the reaction involving hydrogen chloride and formoxane, a temperature of about 300 ° C to 600 ° C is optimal for the content of the decane/hydrogenation reactor 149 after the CVD reactor (see Example 丨) herein, wherein only decane is added for removal of any residual hydrogenation. For these conditions, the output from CVD reactor 136 can be from about 8 Torr. 〇 to 1〇〇〇. The ruthenium is cooled such that the temperature of the contents of the decane/hydrogen chloride reactor 149 after the CVD reactor is less than about 6 Torr after the addition of decane and hydrogenation. (:, more generally at a temperature between about 400 ° C and about 500 ° C. In such embodiments, the first cooler 142 or a similar cooling system after the CVD reactor is advantageously positionable in the CVD reaction 136 is between the CVD reactor and the decane/hydrogenation reactor 149. Alternatively or additionally, the inlet and outlet streams of the decane/hydrogenation reactor 149 after the CVD reactor are advantageously passed A heat exchanger. For example, as shown in Figure 1H, the conduit 14 is discharged from the CVD reactor 136 via an optional CVD post-decane/hydrogenation reactor heat exchanger 177 and conduit i79. The by-product mixture is sent to the cvd post-methane/hydrogenation reactor 149. The line 181 delivers the reaction product from the CVD post-methane/hydrogen chloride reactor 149 via a heat exchanger π? and a line 151. If used, the heat exchanger 177 can The exchange of heat between the inlet and outlet of the decane/hydrogen chloride reactor 149 after CVD is required to be in each of the 152888 from the system. Doc -74· 201130733 Exchanges heat between the reactors and the inputs to the reactors. By way of example, it may be advantageous to pass the heat exchange with the vapor reactant entering the chemical vapor deposition reactor or by generating a waste heat boiler for use in the system 100 or a stream discharged from the system 1〇〇. Reduce to the desired level. The control of the reaction conditions can be based on the analysis of residual hydrogenated hydrogen in the contents of the pipe. The system may not require additional formane and/or vaporized hydrogen because sufficient chlorodecane may be present in the liberated by-product to react almost completely with the vaporized hydrogen in the liberated gas 'eg, at least 99% or even at least 99. 6% of gasification hydrogen. In the embodiment shown in Figure 1A, the product of the pipe i51wcvD post reactor and the gas stream/hydrogenation reactor 149 is sent to the first cooler 142 after the CVD reactor. In other embodiments, the product of the CVD reactor post-decane/hydrogenation reactor 149 can be delivered directly to the CVD reactor post compressor 144. Those skilled in the art will readily appreciate that the position of the decane/hydrogen chloride reactor 149 relative to each other after the cooling system, compressor system, and CVD reactor may depend on the temperature requirements of the optimum reaction from the byproduct of the CVD reactor 136. Variety. Since the decane is delivered to the decane gas/hydrogenation reactor 149 in a stoichiometrically limited amount compared to the vaporized hydrogen, the metformane is delivered after the CVD reactor by the decane/hydrogenated hydrogen. The reactor 149 is substantially completely reacted with the vaporized hydrogen to form a gas decane. In the embodiment shown in FIG. 1H, the hydrogen chloride with which decane is reacted in the decane/hydrogenation reactor 149 after the CVD reactor comprises directly from the chemical vapor deposition reactor 136 and from the CVD reactor via line 165. Gasification of the post-gasification hydrogen separator 156 152888. Doc -75- 201130733 Hydrogen. In certain embodiments, the system can include a small reactor to which a very small amount of slate can be added to allow for the conversion of a small amount of residual hydrogenated hydrogen. This reactor can be referred to as a "gasification hydrogen reforming reactor". In these examples, the formazan may not be added to the initial reactor and only to the subsequent reactor. The transport of the reactants of the decane/hydrogenation reactor 149 after passing through the CVD reactor can be controlled to optimize the contents of the methotane/hydrogenation reactor 149 after the supply of the ruthenium and the CVD reactor via the conduit 167. The reaction of hydrogenated hydrogen in the middle. In some embodiments 'the flow in the decane/hydrogenation reactor 149 after the CVD reactor can be controlled by the number and size of the reactor elements in the reactor 149 to allow for the most within the contents of the reactor 149. Good reaction. For example, the flow of the methane/hydrogenation reactor 149 after passing through the CVD reactor can be controlled by the characteristics of the reactor elements such that the duration within the reactor 1 49 is the most complete for the desired reaction system. Good. In certain embodiments, the hydrazine reaction may require up to 2 minutes or more. In some embodiments, such reactions can take up to 1 minute. In other embodiments, the reactions may need to be between 30 seconds and 1 minute. In still other embodiments, the reactions may need to be between 1 〇 and 3 〇 seconds. In still other embodiments, the reactions may require between 1 second and 10 seconds. In some embodiments, such reactions may require less than 丨 seconds. The gas decane produced by the reaction of the gasified argon with the methane in the kiln reactor/kiln reactor 149 can be recycled back together with the other gas decane produced in the chemical vapor deposition reactor 136. To the disproportionation reactor 114. After the CVD reactor, the hydrogen chloride which is not converted to gas decane in the kiln/gas sinter reactor 149 can be retained at 152888. Doc -76· 201130733 The content of system 100 is separated from or separated from it, as shown in Figure VIII to 1]. As described above and elsewhere herein, operating system 100 in this manner to optimally utilize vaporized hydrogen facilitates efficient maintenance of gas balance within the system. It is also possible to effectively control the chlorine balance in the system by supplying trioxane instead of tetraxane as a make-up gas decane when appropriate. For example, trichloromethane can be added to the disproportionation reactor pre-chlorosilane mixer 162 'added to the disproportionation reactor pre-methane/chloromethane mixer 106 or directly to the CVD reactor 136 to control gas balance or supply to The ratio of chlorine to hydrazine of the feed to the chemical vapor deposition reactor 136. Alternatively or additionally, the replenishing of the hydrogenated gas and the methanol may be reacted in an in situ hydrogen chloride reactor to form a vaporized decane. The operating system 100 as described herein also utilizes vaporized argon to eliminate or at least limit the need to separate the vaporized hydrogen for recycling and eliminate or at least limit and establish and operate to process and store the vaporized hydrogen for use. The costs associated with the facilities sold or used at other facilities. The process for recycling hydrogenated by-products described herein (e.g., as shown in Figures 1E through 1H) is not limited to use in the embodiments of the polysilicon manufacturing process described herein. Such processes for recycling hydrogenation gas may be suitable for use in any polysilicon manufacturing facility, system or process, particularly those facilities, systems or processes that are typically designed to contain no hydrogenated hydrogen as a reactant. For example, t 'favorably, the process for recycling hydrogenated hydrogen can be used in the following facilities or processes: wherein four gasification ruthenium, metallurgical grade ruthenium and hydrogen are combined to produce trichloro decane for producing polycrystalline ruthenium . The conversion of hydrogen chloride to gas decane as described herein allows for the recovery of hydrogen chloride from the system or its transfer to a separate metallurgical helium reactor without resorting to 152888. Doc •77- 201130733 and maintain the gas balance in a manufacturing facility under the conditions of the reaction. Figure 11 shows an alternative to the system 100 of Figure 1A in relation to controlling the amount of dioxane during system operation. As discussed elsewhere herein, the optimal operation of system 100 (specifically, the fabrication of polysilicon) may benefit from precise control of the amount of dioxane in the feed to CVD reactor 136 via line 134. A facility that typically produces polycrystalline dreams by chemical vapor deposition can have a two-gas fragmentation imbalance. The dichlorodecane is sourced from various sources within this operation and is ultimately locked to the chemical vapor deposition reactor. For example, both the gasification fossil heat exchanger and the front end of the polysilicon production operation produce dichloromethane. However, there is a limit to the amount of dioxane that can be utilized in a chemical vapor deposition reactor. Thus excess dioxane may be present downstream of the chemical vapor deposition reactor. In the embodiment of the process illustrated schematically in Figure 11, 'dioxane can be used more efficiently and efficiently, and the various aspects of the illustrated system 100 can eliminate or significantly reduce the handling of dioxane. need. The elements of Fig. II corresponding to the elements shown in Fig. 1A are identified by the same reference numerals. In certain embodiments, as shown in Figure 1 j, the conduit 丨6 delivers the reaction product mixture from the disproportionation reactor 1丨4 to the post-disproportionation reactor four gasification ruthenium separator 118. Removal of the four gasified ruthenium from the reaction product mixture by separator 118 is set forth elsewhere herein. The conduit 121 delivers the reaction product mixture from which the four gasifications have been removed to the disproportionation reactor, after the dichlorosilane separator 117° disproportionation reactor, the dichlorohydrazine burner 117 separates from the reaction product mixture and removes the two gases. Shi Xiyuan. The amount of dichasite burned at various points in the process for making the polycrystalline crumb can be achieved by using the reaction of the self-disproportionation reactor U4 152888. Doc •78- 201130733 The product is separated by dioxane to adjust. Alternatively, the conduit 123 may advantageously be provided to the CVD reactor pre-gasifier 128 or to the CVD reactor pre-mixer, either after the dioxon gas auto-disproportionation reactor is supplied to the CVD reactor pre-gasifier 128. 132 to precisely adjust the amount of dioxane in the feed to the CVD reactor 136 via line 134. In another embodiment, the conduit 113 may supply the chlorite oxime auto-disproportionation reactor post-chlorine sinter separator 117 to the disproportionation reactor pre-gas decane mixer 162. Mixer 162 is advantageously miscible with dichlorodecane and tetragas hydride, other chlorodecane and hydrogen chloride (if present) to optimally control the ratio of chlorine to hydrazine in the feed to disproportionation reactor 114 and the amount of dioxane . In certain embodiments, if desired, the conduit 5i 5 can be diverted from the disproportionation reactor post-dioxane separator 117 as needed for storage and subsequent use. The system for recycling the chlorite to the process for making the polycrystalline crucible described herein efficiently utilizes the two-mass igniting produced by the reaction in the system. In certain embodiments, any small excess of dioxane removed from the dichloromethane separator 1丨7 via the conduit 11 5 from the disproportionation reactor may be disposed, if necessary. The polycrystalline fabrication facility can include multiple CVD reactors. The optimum requirements for the amount of dioxane in the feed to the CVD reactor can be unique for each particular reactor within the manufacturing operation. Thus, the self-disproportionation reactor can be uniquely pre-programmed with a dioxane separator 117 to supply dichloromethane to the feed to each CVD reactor. Dichloromethane can be supplied to each reactor in a stylized manner' thus allowing for precise control of the flexibility of a single gas in the feed to any particular reactor and thus allows for optimum operation. The rate of reaction and energy depletion in a given CVD reactor can be at least partially achieved by 152,888. Doc •79- 201130733 This mode controls the amount of dioxane fed to the reactor. In some embodiments, the addition of dioxane to the feed to the CVD reactor may not be necessary. In some embodiments, the operation of the aspect shown in Figure U of the system 1 can be performed in a time-independent manner. In such embodiments, the disproportionation reactor 114 is operable to maintain the amount of the second gas in the product of the disproportionation reactor 1丨4 at a constant predetermined amount. The concentration of dioxane in the product of the disproportionation reactor U4 can be controlled, for example, from about 2% by weight to about 80/Torr (by weight) (both based on no four gasification) The scope of the situation). In such embodiments, the amount of the second gas smoldering in the trioxane feed to all of the CVD reactors may be the same. In some such embodiments, the amount of dioxane in the trioxane feed to the chemical vapor deposition reactor can be selected to be the highest possible amount that does not adversely affect the quality of the polycrystalline crucible being produced. In some of these embodiments, the disproportionation reactor can be first controlled to produce a product containing a low amount of dioxane over a period of time. This product can be delivered to a first storage tank and stored therein. In such embodiments, the disproportionation reactor can then be controlled to produce a product containing a high amount of dioxane over a period of time. This product can be delivered to a second storage tank and stored therein. In such embodiments, the feed to any particular chemical vapor deposition reactor can then be produced by blending the product from the first tank with the product from the second tank. In such embodiments, the amount of dioxane supplied to the feed to any given chemical vapor deposition reactor may be blended differently than the amount of dioxane supplied to any other chemical vapor deposition reactor. In these embodiments, 152888 is supplied to the dioxane feed of any particular chemical vapor deposition reactor. Doc -80· 201130733 The amount of dioxane may not vary over time, but may still differ from the amount of dichlorodecane supplied to any other chemical vapor deposition reactor. The above method allows controlled and efficient use of the dioxane produced in the disproportionation reactor. Therefore, if present, there may be an excess of dichloromethane at a point where disposal is required. In addition, the use of dioxane can be precisely controlled so that it can be converted to polycrystalline spine without adversely affecting the quality of the resulting product. The portion of system 100 described above that operates in the presence of a reactant and/or product in the liquid phase may alternatively (where appropriate) be such that the reactants and/or products are in place at the appropriate location within the S-system. Under the conditions of the operation. In some embodiments of the system 100 of Fig. A, as shown in Fig. J, the 曱石夕烧 and the gas stone kiln can be supplied in the gas phase to the disproportionation reactor before the shale/steam smoldering 106. Pipeline 104 supplies the methanol as a vapor to the disproportionation reactor pre-cane/gas hexane mixer 106. In practice, the heat supplied by one of the heat exchangers elsewhere in the operation vaporizes the methanol, as further discussed elsewhere herein. In certain of the illustrated embodiments, conduits 120 and 160 supply gas smoldering (including, in particular, four gas enthalpies) to a disproportionation reactor pre-gas decane mixer 162. The conduit 164 delivers additional four gasified helium to the disproportionation reactor pre-gassing mixer 162 (as described above) to adjust the disproportionation reactor pre-gas mixture 162 and thus to the disproportionation reactor pre-methane/chlorine The molar ratio of gas to enthalpy in the mixture of decane mixers 106. As explained elsewhere herein, it is advantageous to add other chlorodecane to adjust the molar ratio of gas to enthalpy in the mixer 162. The conduit 166 delivers a mixture of chlorodecane in the prochlorosilane mixture 162 of the disproportionation reactor to the disproportionation reactor pre-gasifier 168. Disproportionation 152888. Doc -81- 201130733 Pre-reactor gasifier 168 vaporizes the mixture of chlorodecane from the disproportionation reactor pre-gas streamer 162. The line 17 is supplied with a mixture of vaporized chlorodecane from the disproportionation reactor pre-gasifier 168 to the front of the disproportionation reactor, decane/chloromethane mixer 1〇6. As shown in Fig. u, the mixer 1〇6 mixes the metformane vapor supplied through the pipe 1 with the vaporized chlorodecane supplied via the pipe 丨7〇. The contents of the mixer 106 may also include other by-products of the reaction in the system, such as hydrogen and/or vaporized hydrogen that may not have been removed from the process stream elsewhere in the system. Pipe 1 〇 8 feeds the mixture from the disproportionation reactor pre-decane/gas decane mixer 106 to system 100 for processing as shown elsewhere in Figure 1A*. Under these embodiments, the gasification of the materials and the portion of the system must be carried out at a pressure in the gas phase at a temperature within the temperature range in which all of the materials are operated within the process of the disproportionation reactor 丨丨4. Operation. That is, the system operates under conditions such that all of the reactants remain in a single phase except at locations where it is desirable to separate and remove certain components within the system. Line 108 supplies the vaporized mixture of methotane and gas decane to the front of the disproportionation reactor temperature controller 11 〇. The disproportionation reactor front temperature controller 110 heats the gasification reaction mixture under a controlled pressure to a selected temperature within the range of operating the system as described above when the reactants are in the liquid phase. The conduit 112 delivers the heated vapor to the disproportionation reactor 114. The conduit 116 delivers the gas phase reaction product from the disproportionation reactor 114 to the post-disproportionation reactor four gas fossil separators 118. After the disproportionation reactor, the four gasification waste separators 8 separate the four gasified ruthenium from the reaction products and other excess reactants for recycling through the pipeline 120 to the disproportionation reactor pre-gas hydride mixer 162. 'In the system' as described above. Self-disproportionation reactor after helium tetrachloride separator 152888. Doc • 82· 201130733 118 'The pipe 198 delivers the vapor mixture of the reaction product after removal of the four gasified helium to the CVD reactor premixer 132. Additionally, conduit 152 delivers hydrogen to CVD reactor premixer 132 as described above. The CVD reactor premixer 132 mixes the vapor mixture of the reaction product delivered via line 198 with the hydrogen gas delivered via line 152. Stream 134 delivers the vaporization or gaseous mixture of the reaction product and hydrogen from CVD reactor premixer 132 to CVD reactor 136' as described above. Alternatively, the recovered hydrogen can be fed separately to the chemical vapor deposition reactor 丨36 and mixed with the trioxane in the reactor 136. Figure 1K shows an alternative aspect of the system 1 of Figure 1A associated with the removal of reactants from the system 1 麟 or other Nanfo point impurities. Male contaminants can be introduced into the reactants from a variety of sources', for example, extracted from metals in the system or contained in reactants such as decane, replenished bismuth hydride, and/or replenished trigas. These contaminants can also have a negative impact on the quality of the polycrystalline germanium produced by this system even at very low levels. Phosphorus contaminants in system 1 and/or products may contain low boiling point phosphorus contaminants (e.g., PH3 and PH2CI) and/or rlj boiling point dish contaminants (e.g., PHC12 & PC13). The components of Fig. 1K corresponding to the elements shown in Fig. 1A are identified by the same reference numerals. Disproportionation reactor 114 converts low boiling point dish contaminants into high boiling point cesium contaminants. The conduit 116 delivers the reaction product of the disproportionation reactor 114 (containing the high boiling phosphorus contaminants PHCh and PCh) to the helium tetrachloride separator 118 after the disproportionation reactor. As explained above with respect to Figure 1A, the post-disproportionation reactor four gasification helium separator 118 separates the four gasified helium from trichlorosilane. However, after the disproportionation reactor under the selective operating conditions, the tetrachloride cherries 1 1 8 may also be from 152888. Doc -83- 201130733 Three gas smoldering to separate high boiling point contaminants. Under these conditions, the pipe i 25 transports the four gasification fossils and the high boiling point scale contaminants to the high boiling point separator 119. In certain embodiments under selected operating conditions, the high boiling point separator 119 can separate the four gasified hydrazine and PHCh from PCh. In other embodiments under other operating conditions, the high boiling point phosphorus separator 119 can separate the four gasified ruthenium from pci3 or from PHCl2 and PC13. PC13 or PHC12 & PC13 can be accumulated for collection from the High Phosphorus Phosphorus Separator 119. The conduit 127 can remove and deliver the collected high-boiling phosphorus contaminants to the waste for disposal. For each pass, the high-boiling phosphorus separator 119 can only partially remove high-boiling disc contaminants from the four-gassing crucible. The conduit 129 delivers the four gasified helium and any high boiling phosphorus contaminants or other high boiling impurities that have not been removed to the disproportionation reactor pre-gas streamer 162. The high-boiling phosphorus contaminant in the disproportionation reactor pre-gas hydride mixer 162 is again passed through the disproportionation reactor 114, the disproportionation reactor, the post-four gasification ruthenium separator 118, and the high-boiling scale separator Π9^disproportionation reactor 114 to further further the PHC12. These cycles, which are converted to high boiling PCI", can ultimately convert all of the dish contaminants from the reactants and products of system 100 and remove them as PCI3. The system can remove the low trillions of phosphorus in this way. If the phosphorus contaminant needs to be removed from the feed to the CVD reactor, the operating system 100 only includes this optional aspect. In certain embodiments, the high boiling point phosphorus separator 丨丨9 can be relatively medium sized. One of the distillation apparatus, for example, has about 5 trays. In some embodiments, the disproportionation reactor rear four gasification rhodium separator 118 can be operated under relatively stringent specifications regarding antimony tetrachloride. For example, After the disproportionation reactor, the four gasification helium separator 118 can be passed through the conduit 122. 5 weight percent or less 152888. Doc •84- 201130733 Four gas fossils are transferred to the CVD reactor. In some such embodiments, the amount of strontium carbide vaporized via conduit 122 may be 005 005 weight percent or less. Within the quartz tetrachloride separator 11 8 after the disproportionation reactor, the stringent specification that severely limits the transfer of the four gasification helium to the chemical vapor deposition reactor 136 via line 122 is beneficial for transferring the PHC 12 to the high boiling point phosphorus separator 119 via line 125. . Such stringent specifications may result in an increased amount of triclosan in the material delivered by the four gas shift separators 118 after the disproportionation reactor via line 125. However, moving the three gas stone in this way is not a problem, because the three gas stone will eventually circulate back through the disproportionation reactor 114. In some embodiments, the specification of the four gasification enthalpy of the disproportionation reactor after the disproportionation reactor can be more loosely set so that the amount of the four gas fossils transported through the conduit 1 22 can be about 0. . A range between 5 weight percent and 5 weight percent. In some embodiments, the specification for designing and operating the high boiling point phosphorus separator 119 can be set to remove the majority of the pCi3 in a single pass. In some other embodiments, the specification for removing PC 13 can be set more loosely such that the high boiling point phosphorus separator 119 removes less than half of the pcl3 in a single pass. Even if the system is loosely set, the high boiling point phosphorus separator 119 will also remove the PC 13 in subsequent passes. Figure 1L shows an alternative aspect of the system 10 of Figure 1A associated with separation and utilization of two gas smoldering during system operation. As discussed elsewhere herein, the optimal operation of system 100 (specifically, the fabrication of polysilicon) can benefit from the precise control of the amount of the second gas furnace supplied to the CVD reactor 136 via line 134. During the operation of one of the facilities for the manufacture of polycrystalline stone by chemical vapor deposition, the second gas fragment can be derived from various sources. For example, a self-disproportionation reactor 152888. Doc -85- 201130733 π 4 transported gas decane contains dioxane. In the system 100 shown in Figure 1A, as described above, the dioxane delivered from the disproportionation reactor u 4 is ultimately fed to the CVD reactor 136. The embodiment illustrated in Figure 1L, which is illustrative of the process for making polyliths, allows for the removal and more efficient, efficient, and optimal use of the dichloromethane during the manufacturing process. Elements of Figure 1L corresponding to the elements shown in Figure 1A are identified by the same number. In certain embodiments, as shown in Figure 1L, the conduit 116 delivers a mixture of reaction products from the disproportionation reactor crucible 14 to the helium tetrachloride separator 118 after the disproportionation reactor. Removal of ruthenium tetrachloride from the reaction product mixture by separator 118 is set forth elsewhere herein. The pipe 1121 conveys the reaction product mixture from which the ruthenium tetrachloride has been removed to the trioxane/dioxane separator 1101 after the disproportionation reactor. The separator 11〇1 produces a mixture of dichlorodecane or a mixture rich in dioxane and a mixture of triclosan or trioxane. The pipe 丨丨〇3 transports the two gas stone courtyard or the mixture rich in dioxane from the separator 11〇1 to the second gas storage system 11 〇7 ^ In some embodiments, the pipe 丨丨丨丨The second gas stone court can be transported to the first dioxane/trioxane mixer 1117 of the CVD reactor. Dioxane may be supplied via conduit 9 for other uses within the system or elsewhere or may be sold. In certain embodiments, the dioxane or the mixture rich in dioxane may be pure dioxane. In certain embodiments, the conduit 11〇5 delivers a mixture of trioxane or tri-decane-rich from the disproportionation reactor post-trioxane/dichlorodecane separator 1101 to the second gas storage system 1113. In certain embodiments, the conduit 1115 can deliver trioxane to the CVD reactor pre-dioxane/three gas sinter mixer 1117. In certain embodiments, it can be from a chlorobenzene storage system 152888. Doc •86· 201130733 1113 Trioxane is supplied for other uses in the system or elsewhere or it can be sold. In certain embodiments, the mixture of trichloromethane or trioxane-rich may be pure trioxane. Depending on the need to optimize the production of polysilicon in the CVD reactor 136, the conduit 1119 can supply mixed dichloromethane and tri-gas hydrazine from the chloroformane/trichloromethane mixer 1117 to the CVD reactor pre-gasifier. 128. Figure 2 shows an example of one of the configurations associated with one of the systems for preparing polycrystalline germanium and for controlling the amount of gas decane in the system and for in situ reaction of hydrogen chloride and gas by-products from a chemical vapor deposition reactor. Sexual embodiment. The components of Fig. 2 corresponding to the elements shown in Figs. 1A and 1G are identified by numbers starting with "2" instead of "1" but having the same parts. Although elements numbered in this manner are similar, those skilled in the art will readily recognize that this portion of a system shown in Figure 2 can be fed from any source to a chemical vapor deposition reactor, not necessarily in this context. Suitable materials associated with the systems for making crucibles illustrated elsewhere in Figures 1A through 1K function. In particular, conduit 203 can be fed to CVD reactor 236 from any source of suitable reactants. By-products from CVD reactor 236 may contain hydrogen, hydrogen chloride, and various gas smelting. As noted above, the temperature of by-products exiting a CVD reactor can range from about 800 ° C to about 1 Torr. The scope of 〇. In some processes for producing polycrystalline germanium in a CVD reactor, the product from the cvd reactor can be cooled to from about 3 Torr (rc to about 4 ° C or from about 400 ° C to about 700). °C or from about 40 〇. (: to a temperature in the range of about 500 ° C. Appropriate temperature control can be achieved by exchanging heat to various sources or exchanging heat from various sources. 152888. Doc-87- 201130733 In certain embodiments, as illustrated in Figure 2, conduit 240 delivers by-products from CVD reactor 236 to an in-situ gasification reactor heat exchanger 235. The in-situ gasification hydrogen reactor heat exchanger 235 can transfer heat to the contents of the conduit 240 to raise the temperature of the gaseous by-product from the CVD reactor 236 to one of the in-situ reaction systems for gasification and gas combustion. The temperature is, for example, about 500 °C. The conduit 233 (the conduit 240 or a continuation of the conduit 226 as discussed below) delivers the gaseous by-product mixture from the in-situ gasification hydrogen heat exchanger 23 5 to the CVD reactor followed by the in-situ gasification hydrogen reactor 237. Line 239 delivers the reaction mixture from the in-situ gasification hydrogen reactor 237 after CVD to the in situ gasification hydrogen reactor heat exchanger 235. The reaction in the in situ hydrogen chloride reactor 237 is slightly hot. The in situ gasification hydrogen reactor heat exchanger 235 transfers heat between the mixture exiting the reactor 237 via line 239 and the mixture supplied to the reactor 237 via line 233, as described above with respect to the embodiment illustrated in Figure 1G. . The conduit 241 (continuation of conduit 239) delivers the reaction mixture from the CVD reactor after the in-situ gasification hydrogen reactor 237 to the first chiller 242 after the CVD reactor. The conduit 243 delivers the cooled material to the first decanter 269 after CVD. The first decanter 269 after CVD separates lower boiling materials such as hydrogen, vaporized hydrogen and lower boiling decane from higher boiling materials such as ruthenium tetrachloride, trioxane and methylene chloride. The first decanter 269 after CVD can be any design suitable for use in separating higher boiling and lower boiling materials from one another. For example, in one embodiment, post-CVD decanter 269 can include a distillation apparatus. In another embodiment, the post-CVD decanter 269 can comprise a separate column bed wherein the lower boiling material rises from the top 152888. Doc -88- 201130733 The effluent and higher boiling material flows out from the bottom. Pipeline 245 delivers a higher boiling point of metostere to be treated with similar materials at other points in the polysilicon manufacturing process. The conduit 271 delivers the lower boiling material to the CVD reactor post compressor 244. The CVD reactor post compressor 244 pressurizes the gaseous mixture supplied through line 271 to convert the gaseous mixture into a mixture of liquid chlorodecane and hydrogen and one of hydrogen chloride gas and gas decane vapor. Line 247 delivers the two phase gas-liquid mixture to the second cooler 246 after the CVD reactor. The second cooler 246 after the CVD reactor further liquefies the higher boiling material from the gas phase of the two phase mixture to optimize subsequent removal of the higher boiling methyl decane from the mixture. The conduit 248 delivers the cooled material to the second decanter 273 after CVD. The second decanter 273 separates the lower boiling material from the higher boiling material after CVD. Line 275 delivers the lower boiling point material to the post-CVD helium tetrachloride absorber/hydrogen separator 224. After CVD, the ruthenium tetrachloride absorber/hydrogen separator 224 contains an inert material (for example, a steel filler) and is used to allow the material (specifically, trichloromethane) to flow downward to reduce the four gasification enthalpy absorber after CVD. / The content of the gasification enthalpy of the hydrogen separator 224 leaving. Line 252 delivers a gas phase mixture from CVD post-cyllium tetrachloride absorber/hydrogen separator 224 to CVD reactor 236. Line 293 delivers a liquid phase mixture to a four gas enthalpy/trichloromethane separator 295. The conduit 299 delivers the trioxane-rich material from the four gasification rhodium/trioxane separator 295 to the CVD reactor 23 6 . Pipe 299 includes a first class steering gear/controller 287. The conduit 290 delivers the trichloromethane-rich material from the four gasification rhodium/three gas decane separator 295 to the post-CVD four gasification helium absorber/hydrogen separator 224 as needed for optimal operation of the system. The flow diverter/controller 287 controls the enrichment via conduits 290 and 299 152888. Doc •89- 201130733 The relative flow of dichlorinated materials. The flow of the trioxane control in the system as shown in Figure 2 allows for the efficient production of polycrystalline germanium by the CVD reactor 236 in an effortless manner. For example, the amount of the resulting four gas cuts (specifically, transported back to the four gas fossils in the CVD reactor 236 via conduit (5)) can be fed to the trichloromethane at a controlled temperature and rate. Cvn; ^ Yang 芏 CVD after the four gasification 矽 absorber / hydrogen separator 224 to control. The person transported to the CVD reactor 236 by the conduit 252 under appropriate control of the full B 4 degree and k motion 榀叮a a ^ 0 <The core compound may comprise tricyclohexane saturated hydrogen' wherein it has only a minimum amount of ruthenium tetrachloride. In one embodiment, for example, it is supplied via a conduit 29 to a post-CVD silicon tetrachloride absorber. / Hydrogen separator 2 2 4 The temperature of the material rich in the three gas stone garden can be about 35C. The operation of the system shown in Figure 2 allows the use of the product that is usually used to remove this by-product during the polysilicon manufacturing process. The amount of four gasification enthalpy is optimally managed in the case of cold temperature. In some embodiments, it may be necessary to raise the temperature of the exhaust stream from the CVD reactor 236 in the conduit 240 to initiate an in situ reaction of the vaporized hydrogen with the gas decane. In such embodiments, the conduit 24 can deliver the exhaust stream to an optional starter heater 23 1 . In such embodiments, conduit 226 delivers the heated stream from optional starter heater 231 to the CVD reactor and to the in situ gasification hydrogen reactor system. In some embodiments, the temperature of the exhaust stream from CVD reactor 236 in conduit 240 can be greater than 500 C. In such embodiments, a waste hot steel furnace can be placed in line 240 to remove heat and reduce the temperature to 5 Torr. 〇, at the same time, generate a stream for use within one of the component operations of Figure 2 or from the system 152888.doc -90· 201130733. In some embodiments, a conduit 285 advantageously delivers pure decane and/or pure hydrogenated hydrogen to a mixture of CVD reactor 236 supplied to the in situ hydrogen chloride reactor 237 after CVD. In these embodiments, 'supplying a stone garden and/or gasification hydrogen may minimize the addition of pure four gasification to other stages of the process of, for example, the system described elsewhere herein. need. In certain embodiments, only a small amount of metformin may be delivered to a mixture of other stages of the process (e.g., delivered to conduit 241) to convert a small residual amount of vaporized hydrogen to gaseous decane. Although FIG. 2 shows the ruthenium tetrachloride/trichloromethane separator 295 as an element of the illustrated unit, those skilled in the art will appreciate that such an element may, for example, be supplied to it from any suitable source. The material to be processed is operated separately. Figure 3 shows an exemplary embodiment of one of the configurations of one of the systems for preparing polycrystalline silicon. The portion of the system in which the disproportionation reaction is carried out is optimized to produce and treat dioxane. The components of Fig. 3 corresponding to the elements in Figs. 8 and 1L are identified by the same number starting with r 3" instead of "1" but other parts. Although elements numbered in this manner are similar to those described elsewhere herein, those skilled in the art will readily appreciate that this portion of a system shown in Figure 3 can be fed from any source to a CVD reactor without necessarily Suitable materials associated with the systems described herein and illustrated in Figures 1A through 1L for the manufacture of crucibles function. In particular, trioxane, methylene chloride, and arsenic may be supplied from any suitable source within or external to the system. 152888.doc -91 - 201130733 In certain embodiments ' as illustrated in Figure 3, conduit 304 supplies decane and conduit 3133 supplies trioxane to a disproportionation reactor pre-methane/gas argon mixer 306. The conduit 3135 can also supply trioxane to the procarbation reactor pre-methane/gas decane mixer 306. The disproportionation reactor pre-decane/gas argon mixer 306 can be any of the various mixers described herein elsewhere for mixing decane and trioxane to be delivered to a disproportionation reactor. In certain embodiments, a mixture of decane and trioxane is determined to maximize the production of dioxane in the disproportionation reactor 314. In some embodiments, dioxane and decane may be mixed in an amount of one molar ratio of chlorine to rhodium in a range between about 丨: about 3: 丨. In some such embodiments, the target molar ratio can be in the range between approximately 〗: 约 and approximately 2 5: i. In other such embodiments, the target molar ratio can be in the range between about 1:1 and about 2:1. In still other such embodiments, the target molar ratio can be in the range between about 1.25: 丨 and about K75:1. In still other such embodiments, the target molar ratio can be in the range between about 75:1 and about 2:25:1. In certain embodiments, the target molar ratio can be about 15:1. In some other embodiments, the target molar ratio can be about 2:1. After the disproportionation reactor pre-methane/trioxane mixer 3〇6 mixes the methotane supplied via line 304 with the tri-gas decane provided via line 3133 and/or line 3135, line 308 pre-distributes the resulting mixture to the reactor. A decane/trioxane mixer 306 is supplied to the disproportionation reactor front temperature controller 310. The disproportionation reactor front temperature controller 31 加热 heats a mixture comprising methane and methylene chloride supplied via a pipe 3〇8 to a temperature suitable for reaction in the disproportionation reactor 152888.doc-92·201130733 314' as herein Said elsewhere. The pipe 3 12 transports the heated mixture including decane and trichloromethane from the temperature controller 3 10 to the disproportionation reactor 3 14 . The pipe 3 16 transports the reaction mixture from the disproportionation reactor 314 to the disproportionation reactor. Separator 3 1 8 » The reaction mixture may comprise dichlorodecane, trioxane and tetragas hydride. The hafnium tetrachloride separator 3 18 removes antimony tetrachloride from the reaction mixture to produce a stream rich in dioxane. The conduit 3121 delivers the dichloromethane-rich stream to the disproportionation reactor post-dioxane/trioxane separator 3101. Separator 3101 produces a mixture of dioxane or a mixture rich in dioxane and a mixture of trioxane or trioxane. The conduit 3103 delivers a mixture of dioxane or dioxane rich to the dioxane storage system 3 107. In certain embodiments, the dichlorosilane or the mixture of dichlorodecane delivered by the second gas calcination/trioxane separator 3103 via the conduit 3103 from the disproportionation reactor may be pure dioxane. In certain embodiments, the conduit 3 127 can deliver the dioxane or dioxane-rich mixture directly to the CVD reactor 336. In other embodiments, conduit 3111 can deliver dioxane to the CVD reactor pre-dioxane/trioxane mixer 3117. Dioxane may be sold or dichlorodecane may be supplied via line 3109 for other uses. In certain embodiments, the conduit 3105 delivers a mixture of trioxane or tri-decane-rich from the disproportionation reactor post-chlorination/trichlorosilane separator 3j0i to the trioxane storage system 3113. In certain embodiments, the trioxane or trichlorodecane-rich mixture can be pure trioxane. In some embodiments, the conduit 3 13 1 can deliver the trioxane or trioxane-rich mixture directly to the CVD reactor 336. In other embodiments, the conduit 3115 can be sent to the CVD reactor pre-dioxane/trichlorodecane mixer 3117 at 152888.doc •93-201130733. In still other embodiments, conduit 3135 can deliver trioxane to the disproportionation reactor pre-decane/trioxane mixer 3〇6, as described above. In some embodiments, trioxane can be supplied from trioxane storage system 3113 via line 3125 for other purposes. Depending on the optimum manufacturing needs of the reactor 丨36, the pipeline 3129 can supply the mixed dioxane and the three gas smelting gas from the two gas sulphur/three gas decane mixer 3117 to the CVD reactor 336 ° The systems and processes used to manufacture crucibles disclosed and discussed herein have significant advantages over currently employed systems and processes. These systems and processes are suitable for the fabrication of semiconductor grade or solar grade germanium. The use of methotrex as a starting material in this manufacturing process allows for easier production of high purity germanium. Decane is easier to purify. Due to the low boiling point of decane, it can be easily purified and does not have a tendency to carry contaminants as may occur in the preparation and purification of trioxane as a starting material during purification. In addition, certain processes for making dioxane utilize carbon or graphite that can be carried into the product or reacted with chlorodecane to form a carbon-containing compound. The systems and processes disclosed herein for manufacturing crucibles provide significant cost savings associated with both the establishment and operation of manufacturing facilities. In particular, since the four gasification helium is recycled in the processes, rather than being removed for external reprocessing into trioxane via the use of a thermal shift reactor, there is a pole associated with establishing and operating such facilities. High cost savings. In particular, capital and operational savings can be approximately 20% to 40%. As described in this article, it is usually necessary to self-contain and to be removed. (4) The stone product I52888.doc •94- 201130733 itself. If desired for a particular purpose, the vaporized hydrogen gas and/or gas decane (specifically dioxane and/or tetragas hydride) may be removed for disposal or other use during operation of the system. However, it is not necessary to remove it and its exclusive removal may not even be preferred. The above description of the illustrated embodiments, which are included in the summary of the invention, are not intended to be exhaustive or to limit the embodiments. It is to be understood that the various modifications of the invention may be made without departing from the spirit and scope of the disclosure. The teachings provided by the various embodiments above are applicable not only to the example systems, methods, and apparatus outlined above, but also to other systems, methods, and/or processes for making defects. For example, the above detailed description illustrates various embodiments of the systems, processes, methods, and/or devices. Each of the block diagrams, schematic diagrams, flowcharts, and examples may have one or more functions and/or operations, and those skilled in the art will understand that each of these blocks, diagrams, flowcharts or examples The functions and/or operations may be performed individually and/or collectively by any of a wide variety of components, hardware, software, or physical, or virtually any combination thereof. In some embodiments, the system used or the device made may comprise fewer structures or components than in the particular embodiment described above. The systems or devices made in other embodiments may include other structures or components in addition to those described herein. In other embodiments, the system or device used may comprise structures or components having configurations identical to those of the structures or components described herein that are not 152888.doc-95·201130733. For example, the ancient ^ ^. In some embodiments, additional heaters and/or mixers, and/or separators may be provided in the system to provide effective control of the slope, pressure or flow rate. In addition, in practicing the procedures or methods described herein, there may be fewer operations, additional operations, or operations performed in the order described herein. Those skilled in the art will be able to remove, add or reconfigure a system or device component, or an operational aspect of a process or method, in accordance with the present disclosure. The methods and systems described herein for making a polycrystalline crystal can be operated under the control of an automated control system. Such automatic control systems may include one or more of the following: appropriate sensors (eg, flow rate sensors, pressure sensors, temperature sensors), actuators (eg, motors, valves) , a solenoid, a damper, a chemical analyzer, and a processor-based system executing instructions stored in the processor readable storage medium based at least in part on the sensors, analyzers, and/or Or the data entered by the user or the afl automatically controls the flow rate, pressure and/or temperature of various components and/or materials. Regarding the control and operation of the systems and processes for fabricating polysilicon, or the design of such systems and devices, in some embodiments, the subject matter herein can be implemented via a dedicated integrated circuit (ASIC). However, those skilled in the art will recognize that the embodiments (in whole or in part) disclosed herein may be equivalently implemented in a standard integrated circuit as one or more computer programs running on one or more computers. (eg, one or more programs running on one or more computer systems), one or more programs running on one or more controllers (eg, microcontrollers), in one or more processors (Example 152888.doc • 96· 201130733 eg, Microprocessing Benefits) Any combination of one or more programs, firmware, or virtually any of them. Accordingly, those skilled in the art will be able to design circuits and/or write code for software and/or firmware in accordance with the teachings of the present disclosure. This disclosure may be further illustrated by reference to the following examples. This example is provided by way of illustration and not limitation. EXAMPLES Example 1 Chemical Vapor Deposition Reactor Release Gas Mole Flow Rate vs. Temperature Figure 4 shows the chemical vapor deposition reactor to which the control has been added with methane and vaporized hydrogen to release the reactants in the gas. The Gibbs temperature is calculated from the flow rate plotted. The results plotted assume that all reactions have reached equilibrium. The conditions used in this calculation included an excess of moles of molybdenum chloride relative to the added. As a result, no hydrogen gas was shown, and the amount of the coefficient was much larger than that of the products shown. The inclusion of hydrogen in the calculation will change the shape of the curve. However, it is believed that the calculated equilibrium results reflect the dynamics within the released gas of the cvd reactor. These results are indicated at 400. Between 〇 and 500t, the main gas and/or gas-containing components of the evolved gas are trioxane and tetragas, which are deuterated. The amount of dichlorodecane is lower than that of trichlorodecane and antimony tetrachloride. Basically, there is no hyperthyroidism, monochlorite and gasification. For example, t, the result of the count # shows that at 500C and 400C, 99.9% and 99.99% of hydrogen chloride have reacted. The various embodiments described above can be combined to provide other embodiments. If desired, the embodiment can be modified to provide yet other embodiments using the various patents, applications, and concepts of the 152888.doc-97.201130733. These and other changes can be made to the embodiments in light of the above detailed description. In general, the terms used in the following claims are not to be construed as limiting the scope of the invention to the specific embodiments disclosed in the specification and the claims. The full range of equivalents given. Therefore, the scope of patent application is not limited to the disclosure. BRIEF DESCRIPTION OF THE DRAWINGS FIG. 1A is a schematic diagram of one of the systems for preparing a stone-making system according to one illustrated embodiment, including a recycling reaction by-product; FIG. 1B is used in accordance with one illustrated embodiment of FIG. A schematic diagram of one of the alternatives for the preparation of the Shixi system further comprising one of the alternatives for the removal of the gasification by-product; FIG. 1C is a further inclusion of the system for preparing the Shixi system according to one illustrated embodiment of FIG. Schematic diagram of one of the parts of the recycled gas by-product by-product; FIG. 1D is a schematic diagram of one of the alternatives for further removing the hydrogen chloride by-product according to one illustrated embodiment of FIG. 1a for preparing the system; Figure 1E is a schematic diagram of a portion of the system for preparing ruthenium for reacting hydrogenation gas with decane in a separate reactor; Figure 1F is a further embodiment of the system for preparing ruthenium of Figure 1A. Schematic diagram of one of the parts of the reaction of replenishing hydrogenated hydrogen with propanol in a separate reactor; 152888.doc -98- 201130733 Figure 1G The system of Figure 1A for use in the preparation of a * 裂 裂 进一步 进一步 进一步 进一步 进一步 进一步 进一步 进一步 进一步 进一步 进一步 进一步 进一步 进一步 进一步 进一步 进一步 进一步 进一步 进一步 进一步 进一步 进一步 进一步 进一步 系统 系统 系统 系统 系统 系统 系统 系统 系统 系统 系统 系统 系统 系统 系统One part of the schematic diagram; Figure 1 is the one used in the system of the chemical vapor deposition reactor for the reaction of the hydrogen and the money in the system for the preparation of the system. Schematic diagram of one of the parts; Figure (10) Figure 1 is a schematic diagram of one of the steps for preparing and dissolving the dioxane; Figure 1J is used to prepare the crumb according to an embodiment. A schematic diagram of one of the parts of the system, wherein the system is designed to operate in a vapor phase; Figure 1 is a schematic diagram of a portion of the system for preparing a crucible for the preparation of a crucible, and a portion of the system; Figure 1A is a schematic diagram of the system for preparing ruthenium further comprising a portion of the separation and use of chlorhexidine; and Figure 2 is a schematic diagram of a system for preparing ruthenium containing an effluent from a chemical vapor deposition reactor. Hydrogen chloride in the in-situ reactor A schematic diagram of one of the parts; Figure 3 is a schematic diagram of one of the systems for preparing, separating and using two gas for the preparation of Shishi; and Figure 4 shows the in-situ gasification hydrogen reactor after a CVD reactor. A graph showing the change in the molar flow rate of the field product as a function of the temperature of the released gas during the equilibrium of the reaction. [Main component symbol description] 100 Preparation of the system 101 Pipeline 152888.doc • 99- 201130733 102 Pump 104 Pipe 106 Disproportionation reactor Pre-methane/gas hexane mixer 108 Pipe 110 Disproportionation reactor front temperature controller 112 Pipe 113 Pipe 114 Disproportionation reactor 115 Pipe 116 Pipe 117 Disproportionation reactor post-dioxane separator 118 Disproportionation reactor post-gasification helium separator 119 High-boiling phosphorus separator 120 Pipe 121 Pipe 122 Pipe 123 Pipe 125 Pipe 126 Pipe 127 Pipe 128 chemical vapor deposition reactor pre-gasifier 129 pipe 130 pipe 131 starter heater 152888.doc -100- 201130733 132 chemical vapor deposition reactor front mixer 133 pipe 134 pipe 135 in-situ gasification hydrogen reactor heat exchange 136 chemical vapor deposition reactor 137 chemical vapor deposition reactor after in-situ gasification hydrogen reactor 138 shredded product 139 pipe 140 pipe 141 pipe 142 chemical vapor deposition reactor after the first cooler 143 pipe 144 chemical gas phase Deposition reactor post compressor 145 pipe 146 chemical vapor After the reactor, the second cooler 147, the pipe 148, the pipe 149, the chemical vapor deposition, the decane/hydrogenation reactor 150, the chemical vapor deposition reactor, the hydrogen separator 151, the pipe 152, the pipe 153, the pipe 154, the pipe 155, the pipe 156, the chemical gas Phase deposition reactor after hydrogen chloride separator 152888.doc -101 - 201130733 157 Pipe 158 Pipe 159 Disproportionation reactor Pre-methine/hydrogen chloride reactor 160 Pipe 161 Pipe 162 Disproportionation reactor pre-gas hexane mixer 163 164 165 166 167 168 169 170 171 172 174 176 Pipeline Pipeline Pipeline Pipeline Disproportionation Reactor Pre-gasifier Chemical Vapor Deposition Decanter Pipeline Pipeline Chemical Vapor Deposition Reactor Post-Chlorocyclohexane Separator Pipeline 177 Methane/Gas after Chemical Vapor Deposition Hydrogenation reactor heat exchanger 178 Chemical vapor deposition reactor post-chloromethane mixer 179 Pipe 180 Pipe 181 Pipe 182 Gas decane / three gas decane separator 152888.doc -102- 201130733 183 Pipe 184 Pipe 185 Pipe 186 Pipe 188 Chemical vapor deposition reaction 191 Pipeline 192 Chemical vapor deposition reaction 194 Lane 196 Pipe 198 Pipe 203 Pipe 224 Chemical Vapor Deposition Four 226 Pipe 231 Starter Heater 233 Pipe 235 In-situ Gasification Hydrogen Reactor 236 Chemical Vapor Deposition Reaction 237 Chemical Vapor Deposition After 239 Pipe 240 Pipe 241 Pipe 242 Chemical vapor deposition reaction 243 Pipeline 244 Chemical vapor deposition reactor after hydrogen/hydrogen chloride separator front hydrogen/gasification hydrogen separator cesium chloride absorber/hydrogen separator heat exchanger position after gasification hydrogen reactor First cooler after compressor 152888.doc •103- 201130733 245 Pipe 246 chemical vapor deposition reactor after second cooling; 247 pipe 248 pipe 252 pipe 269 chemical vapor deposition after the first decanter 271 pipe 273 chemistry After vapor deposition, second decanter 275 pipe 285 pipe 287 flow diverter / controller 290 pipe 293 pipe 295 four gasification helium / three gas decane separator 299 pipe 304 pipe 306 disproportionation reactor pre-methane / chlorodecane mixture 308 Pipeline 310 Disproportionation reactor front temperature controller 312 Pipeline 314 Disproportionation reactor 316 Pipeline 31 8 Disproportionation reactor after four gasification helium separator 320 Pipeline 152888.doc -104- 201130733 336 Chemical vapor deposition reactor 1101 Disproportionation reactor post-trioxane/dioxane separator 1103 Pipeline 1105 Pipeline 1107 Dichloromethane storage System 1109 Pipe 1111 Pipe 1113 Trioxane Storage System 1115 Pipe 1 117 Chemical Vapor Deposition Reactor Pre-dioxane/Tri-Gasane Mixer 1119 Pipe 1121 Pipeline '3101 Disproportionation Reactor Dioxane/Trichloromethane Separator 3103 Pipe 3105 Pipeline ' 3107 Chlorochlorane Storage System 3109 Pipe 3111 Pipe 3113 Trioxane Storage System 3115 Pipe 3117 CVD Reactor Front Dioxane / Trichloromethane Mixer 3121 Pipe 3125 Pipe 3127 Pipe 152888.doc 105- 201130733 3129 3131 3133 3135 Pipeline Pipeline Pipeline 152888.doc

Claims (1)

201130733 VII. Patent application scope: 1. A method for manufacturing ruthenium, the method comprising: reacting a disproportionation reactor comprising methotoxane and ruthenium tetrachloride by a disproportionation reactor; by chemical vapor deposition The reactor performs a chemical vapor deposition on a mixture from the disproportionation reactor to deposit ruthenium on one of the substrates in the chemical vapor deposition reactor; and recovers ruthenium from the chemical vapor deposition reactor. 2. The method of claim 1, further comprising: separating hydrogen from a by-product mixture of the chemical vapor deposition comprising hydrogen and tetragas hydride to produce a composition comprising ruthenium tetrachloride; The pre-reactor decane/gas hexane mixer mixes the composition comprising four gasification fossils and a composition comprising gangue kiln to produce the disproportionation reactor feed comprising decane and ruthenium tetrachloride; Controlling, by a disproportionation reactor front temperature controller, a temperature of the disproportionation reactor feed comprising gangue Xixuan and ruthenium tetrachloride; and disproportionation reaction comprising methotoxane and ruthenium tetrachloride by the disproportionation reactor The components of the feed are reacted to form a disproportionation reaction product comprising dioxane, trigassing and tetragassing. 3. The method of claim 2, wherein mixing the composition comprising tetragassing ruthenium with one of the compositions comprising methotoxan comprises: mixing a composition comprising one of dichloromethane and a composition comprising one of the cerium oxides. 4. The method of claim 2, wherein mixing the composition comprising four gasified hydrazines with one of the compositions comprising gangue smelting comprises: mixing comprising one of three gas stone kiln 152888.doc 201130733 composition and including a One of the compositions of Shi Xiyuan. 5. The method of claim 2, wherein mixing the composition comprising tetragassing ruthenium with one of the compositions comprising methotoxan comprises: mixing a composition comprising one of vaporized hydrogen and a composition comprising one of decane. 6. The method of claim 2, wherein mixing the composition comprising tetragassing ruthenium with one of the compositions comprising methotoxan comprises: mixing a composition comprising one of liquid or vapor decane and comprising liquid or vapor ruthenium tetrachloride One of the compositions. 7. The method of claim 2, wherein mixing the composition comprising four gasified hydrazines with a composition comprising decane comprises: pressing from about 丨〇 pounds per square inch to about 500 pounds per square inch The composition comprising metformane and the composition comprising tetragas hydride are supplied to one of the disproportionation reactor pre-methane/gas hexane mixer and one of the disproportionation reactors under pressure of one of the ranges of gauge pressure Or both. 8. The method of claim 2, wherein the composition comprising tetraclic and the composition comprising the group (IV) comprises: a gauge pressure of from about 300 psig to about 300 psig. One of the ranges of the composition, including the composition of the fushi Xiyuan and the composition including the four gas cuts, to the disproportionation reactor before the one of the money/chlorite sinter mixer and the disproportionation reactor Or both. For example, the method of the term 2 of the month 'the mixture of the mixture comprising the antimony tetrachloride and the composition comprising the m-containing residue comprises: in the range from about Η·············· The scope of the composition - under the friction 'will include the composition of the money and the composition including the four gas cut to 152888.doc 201130733 the disproportionation reactor pre-methane / gas decane mixer and the disproportionation reactor One or both. 10. The method of claim 2, wherein mixing the composition comprising four gasified hydrazines with one of the compositions comprising decane comprises: at a pressure of about 18 psig. The composition and the composition comprising the four gasification fossils are supplied to one or both of the disproportionation reactor preoxane/gas decane mixer and the disproportionation reactor. 11. The method of claim 2, wherein mixing the composition comprising four gasified hydrazines with one of the compositions comprising decane comprises: pressing from about 5 mash/square inch to about 255 s/square The composition comprising decane and the composition comprising ruthenium hydride are supplied to the disproportionation reactor pre-decane/chloromethane mixer and the disproportionation reactor at a pressure within one of the ranges of the osmium pressure gauge One or both. The method of claim 2, wherein the composition comprising the four gasified hydrazine and the composition comprising one of the decane comprises: at a pressure of from about 15 psi to about 2,500 psi. The composition comprising formoxane and the composition comprising ruthenium tetrachloride are supplied to the disproportionation reactor pre-decane/chloromethane mixer and one of the disproportionation reactors under pressure of one of the ranges of 吋 gauge pressure Or both. 13 _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ The composition comprising the stone body and the composition comprising the four gas cuts are supplied to the front of the disproportionation reactor. And one or both of the 152888.doc 201130733 in the disproportionation reactor. 14_ The method of claim 2, wherein the composition comprising the four gasified hydrazine and the composition comprising one of the decane comprises: at a pressure of about 2 psi/gauge, including The composition of formoxane and the composition comprising four gas fossils are provided to one or both of the disproportionation reactor pre-methane/chloromethane mixer and the disproportionation reactor. 15. The method of claim 2, wherein the disproportionation reactor comprises a catalyst. 16. The method of claim 15 wherein the catalyst comprises a polymeric ion exchange resin. 17. The method of claim 15, wherein the catalyst comprises a metal. 18. The method of claim 15, wherein the catalyst comprises copper. 19. The method of claim 15 wherein the catalyst comprises substantially pure copper infused with copper. 20. The method of claim 2, wherein controlling the temperature of the disproportionation reactor feed comprising methane and tetragas hydride comprises: controlling the temperature of the disproportionation reactor feed from about 3 (rc to 21. The method of claim 2, wherein the method of claim 2, wherein controlling the temperature of the disproportionation reactor feed comprising a mixture of formoxane and tetragas hydride comprises: dissolving the disproportionation reactor The temperature is controlled in a range from about 300 ° C to about 500 ° C. 22. The method of claim 2, wherein the disproportionation reactor of the mixture comprising decane and tetragassing ruthenium is controlled The temperature of the feed comprises: controlling the temperature of the disproportionation reaction to be in a range from about 3001 to about 400. (: 152888.doc 201130733 23. The method of claim 2, wherein the control comprises The temperature of the disproportionation reactor feed of the decane and the condensate of the quaternary condensate comprises: controlling the temperature of the disproportionation reactor feed to be from about 200. (: to one of about 300 ° C 24. In the scope of claim 2, the control includes the 曱石夕烧和四The temperature of the disproportionation reactor feed of the mixture comprises: controlling the temperature of the disproportionation reactor feed to be in a range from about 90 ° C to about 200 ° C. The method of month 2, wherein controlling the temperature of the disproportionation reactor feed comprising the mixture of methotrexate and tetragas hydride comprises: controlling the temperature of the disproportionation reactor feed from about 30 ° C to 26. The method of claim 2, wherein the method of controlling the temperature of the disproportionation reactor comprising decane and tetragassing ruthenium comprises: the disproportionation reactor The temperature of the feed is controlled in a range from about 55 ° C to about 75 ° C. 27. The method of claim 2, wherein the disproportionation reaction comprising a mixture of metformin and tetragas ruthenium is controlled. The temperature of the feed to the feed comprises: controlling the temperature of the feed to the disproportionation reactor from about 6 Torr to about 7 Torr. One of the ranges. 28. The method of claim 2, wherein the control The temperature component of the disproportionation reactor feed of the mixed sigma including metformin and tetragas hydride The temperature of the disproportionation reaction is controlled to be about 60° C. 29. The method of claim 2, further comprising: 152888.doc 201130733 controlling a composition comprising the composition of four gas fossils or The rate of supplying the composition of the four gasification fossils to the front of the disproportionation reactor, such that the mixture comprising the sarcophagus 匕祜 匕祜 及 及 and the 气 气 四The ratio of the gas to the enthalpy in the disproportionation reactor feed is in the range of between about 2:1 and about 3.9:1. 30. The method of claim 29, wherein the chalk is a form of methotrex and tetragas. The ratio of the window to the gas-to-gas ratio in the disproportionation reactor feed of the mixture of the plutonium is in the range between about 2:5 and about 3.5:1. 31. The method of claim 29, wherein the mixture of chalk, A, and methanthanol and the mixture of the four gasified ruthenium in the disproportionation reactor feeds a window π T wind to a ratio of shi hai to about 28: The range between j and about 3.3:1. 32. The method of claim 29, wherein the ratio of the gas to the diarrhea in the disproportionation reactor feed of the mixture of the methacrylate and the gasification enthalpy is about 2.8:1. 33. The method of claim 29, wherein the ratio of the gas to enthalpy in the disproportionation reactor feed of the mixture of the mixture of decane and tetragas hydride is about Η. 34. The method of claim 29, wherein the ratio of chlorine to ruthenium in the disproportionation reactor feed of the mixture of the calculus and the four gasification fossils is about 3:1. 35. The ratio of chlorine to rhodium in the disproportionation reactor feed of the method of claim 29, wherein the mixture comprising metformin and tetragas hydride is about 3 3:ι. 36. The method of claim 2, further comprising: separating ruthenium tetrachloride from the product of the disproportionation reaction in a post-disproportionation reactor to produce a disproportionation reactor The stream of hydrazine and a disproportionation reactor are enriched in a stream of three gas decane. 37. The method of claim 36, further comprising: 152888.doc • 6 · 201130733 using the four gasified helium separated from the product of the disproportionation reactor in a four gasification helium separator after the disproportionation reactor To adjust the ruthenium tetrachloride content of the disproportionation reactor feed. 38. The method of claim 2, further comprising: gasifying a mixture comprising the disproportionation reaction product in a CVD reactor pre-gasifier to produce a vaporized disproportionation reaction product; by a CVD reaction The pre-mixer mixes hydrogen with the vaporized disproportionation reaction product to produce a mixture of hydrogen and disproportionation reaction products; and performs chemical vapor deposition on the mixture of hydrogen and disproportionation reaction products by the chemical vapor deposition reactor A crucible is deposited on the substrate in the chemical vapor deposition reactor. The method of claim 38, wherein the mixing of the hydrogen and the vaporized disproportionation reaction product comprises mixing hydrogen with the vaporized disproportionation reaction product by a CVD reactor premixer. 40. The method of claim 38, wherein mixing the hydrogen with the gasified disproportionation reaction product comprises mixing hydrogen with the vaporized disproportionation reaction product in the chemical vapor deposition reactor. 41. The method of claim 2, further comprising: releasing an effluent mixture comprising one of: argon, ruthenium tetrachloride, and hydrogen sulfide, dichlorodecane, and trigas from the chemical vapor deposition reactor. One or more of decane. 42. The method of claim 41, further comprising: cooling the effluent mixture from the chemical vapor deposition reactor by a first chiller after a CVD reactor to produce a gas-liquid two phase mixture 152888.doc 201130733. 43. The method of claim 42, further comprising: removing the oily contaminant comprising the polymetasite base material from the effluent mixture cooled by the first cooler. 44. The method of claim 42, further comprising: separating the gas-liquid two-phase mixture from the first cooler by a CVD reactor post-decant to produce a gas phase and a liquid phase. 45. The method of claim 44, further comprising: converting the gas phase from the decanter to a gas-liquid two phase mixture or a gas phase by a CVD reactor post compressor. 46. The method of claim 45, further comprising: cooling the gas-liquid two-phase mixture or the gas phase from the compressor by a second chiller after a CVD reactor. 47. The method of claim 41, further comprising: supplying the effluent mixture from the chemical vapor deposition reactor to a CVD reactor followed by an in-situ gasification hydrogen reactor; and by using the CVD reactor An in situ gasification hydrogen reactor converts the vaporized hydrogen from the effluent mixture from the chemical vapor deposition reactor to gas decane. 48. The method of claim 47, further comprising: using an in situ gas prior to supplying the effluent mixture from the chemical vapor deposition reactor to the CVD reactor after in situ gasification of the hydrogen reactor An argon reactor heat exchanger heats the effluent mixture from the chemical vapor deposition reactor. The method of claim 48, wherein the effluent mixture from the chemical vapor deposition reactor is heated by an in situ hydrogen chloride reactor heat exchanger comprising: from the chemical vapor deposition reactor The effluent mixture is heated to a temperature in the range of from about 200 °C to about 700 °C. 50. The method of claim 48, wherein the effluent mixture from the chemical vapor deposition reactor is heated by an in situ gasification hydrogen reactor heat exchanger comprising: from the chemical vapor deposition reactor The effluent mixture is heated to a temperature from about 300 ° C to about 60 (one of the range of TC. 51. The method of claim 48, wherein the chemical vapor phase is heated by an in situ hydrogen chloride reactor heat exchanger The effluent mixture of the deposition reactor comprises: heating the effluent mixture from the chemical vapor deposition reactor to about 500. (3) One temperature. 52. The method of claim 48, wherein the in situ hydrogen chloride reaction The heat exchanger will heat the in-situ hydrogen chloride reactor from the CVD reactor before the effluent mixture from the chemical vapor deposition reactor is supplied to the sth CVD reactor and the hydrogenation reactor is in-situ. One of the effluent is exchanged to the effluent mixture from the chemical vapor deposition reactor.. 53. The method of claim 48, further comprising: passing through the in situ gasification hydrogen reactor heat exchanger After the effluent mixture from the chemical vapor deposition reactor is supplied to the CVD reactor and before the in-situ gasification hydrogen reactor, the heater from the chemical vapor deposition reactor is heated by a CVD reactor after starting the heater. The method of claim 47, wherein the effluent mixture from the chemical vapor deposition reactor is in the in situ gasification hydrogen reactor after the CVD reactor 152888.doc 201130733 one of the residence time is less than Approximately 10 minutes. 55. The method of claim 47, wherein the effluent present in the in-situ gasification reactor after the (10) reactor has a residence time of less than about 5 minutes. 56. The method wherein the effluent mixture has a residence time of less than about i minutes in the in situ gasification hydrogen reactor after the (iv) reactor. 57. The method of claim 47, wherein the effluent mixture is after the cvd reactor One of the residence time in the in-situ gasification rhodium reactor is less than about 分钟5 minutes. 58. The method of claim 47, wherein the effluent mixture is in situ in the hydrogenation reactor after the cvd reactor The method of claim 47, further comprising: cooling the effluent mixture of one of the in-situ gasification hydrogen reactors from the cVD reactor by a first chiller after a CVD reactor To produce a gas-liquid two-phase mixture; separating the gas-liquid two-phase mixture from the first cooler by a CVD reactor post-decanter to produce a gas phase and a liquid phase; by a CVD reaction The post-compressor converts the gas phase from the decanter into a gas-liquid two-phase mixture or a gas phase; and the second cooler cools the gas-liquid two phase from the compressor by a CVD reactor Mixture or the gas phase. 60. The method of claim 41, further comprising: separating hydrogen from the chemical vapor deposition reactor effluent mixture by a CVD reactor followed by a hydrogen separator to produce a hydrogen-rich stream after the CVD reactor A stream of hydrogen depleted after a CVD reactor. 61. The method of claim 60, wherein the CVD reactor is enriched in a hydrogen stream 152888.doc • 10· 201130733 wherein the concentration of the four gas fossils is less than 15 weight percent. 62. The method of claim 60, wherein the concentration of ruthenium tetrachloride in the hydrogen-rich stream after the CVD reactor is less than 10 weight percent. 63. The method of claim 60, wherein the concentration of ruthenium tetrachloride in the hydrogen-rich stream after the CVD reactor is less than 5 weight percent. 64. The method of claim 60, wherein the concentration of the four gasified ruthenium in the hydrogen-rich stream after the CVD reactor is less than 1 weight percent. 65. The method of claim 60, wherein the concentration of ruthenium tetrachloride in the hydrogen-rich stream after the CVD reactor is less than 0.1% by weight. 66. The method of claim 60, further comprising: disproportionation of a hydrogen-rich stream and a gasification helium separator from a disproportionation reactor after mixing the CVD reactor by a CVD reactor premixer It is enriched with a stream of three gas decane. 67. The method of claim 60, further comprising: a hydrogen depleted stream after mixing the CVD reactor with a protonation reactor pre-chlorosilane mixer and one of the four gasification rhodium separators from the disproportionation reactor The disproportionation reactor is enriched in a stream of hafnium tetrachloride. 68. The method of claim 67, further comprising: determining that the hydrogen is depleted after the CVD reactor after mixing the hydrogen depleted stream after the CVD reactor with the helium tetrachloride-rich stream after the disproportionation reactor The amount of elemental bismuth and elemental chlorine in the stream enriched in four gasification enthalpy after the disproportionation reactor. 69. The method of claim 67, further comprising: mixing a quantity of the 152888.doc 201130733 CVD reactor with a hydrogen depleted stream by the disproportionation reactor pre-gas decane mixer; the disproportionation reactor is enriched a stream of ruthenium tetrachloride; and, if necessary, a mixture of one or more of purified gasified ruthenium, trichloromethane, dichloromethane or purified ruthenium tetrachloride, trichloromethane or dioxane One of the feeds; and controlling the amount of elemental gas and element enthalpy supplied from each source to maintain a selected ratio of gas to enthalpy in the disproportionation reactor feed. 70. The method of claim 60, further comprising: separating hydrogen chloride from the hydrogen depleted stream after the CVD reactor by a CVD reactor to produce a CVD reactor after hydrogen depletion, A stream rich in hydrogen sulfide and a hydrogen depleted stream after gasification of a CVD reactor. 71. The method of claim 70, further comprising: transporting the hydrogen depleted, hydrogen rich stream from the CVD reactor to the hydrogen chloride storage system after the CVD reactor. 72. The method of claim 70, further comprising: after the argon reactor is depleted, the hydrogen chloride depleted stream is sent from the CVD reactor to the gasification hydrogen separator to a disproportionation reactor. mixer. 73. The method of claim 70, further comprising: separating the four gasified ruthenium from the hydrogen depleted, hydrogen chloride depleted stream of dichloromethane and trioxane by a CVD reactor post gas decane separator. In order to produce a CVD reactor rich in ruthenium tetrachloride and a CVD reactor, the dioxane-rich stream is rich in tri-decane. 152888.doc -12. 201130733 74. The method of claim 73, further comprising: a stream of dioxane-rich, trichlorodecane-rich stream from the CVD reactor by a dioxane/trichloromethane separator The trichlorosilane is separated from the trichloromethane to produce a stream of chloroformane-rich stream after a CVD reactor and a trioxane-rich stream after a CVD reactor. 75. The method of claim 74, further comprising: mixing the trioxane-rich stream after the CVD reactor with a trioxane-rich stream after a disproportionation reactor. 76. The method of claim 74, further comprising: mixing the ruthenium tetrachloride-rich stream with the CVD reactor by a CVD reactor followed by a chlorosilane mixer and enriching the dioxane with the CVD reactor flow. 77. The method of claim 76, wherein mixing the stream of four gas-enriched ruthenium with the stream of dioxane-rich stream by a CVD reactor post-gas hexane mixer comprises: selecting a quantity of dioxane and This amount of dichloromethane is added to the decane gas mixer after the CVD reactor, thereby controlling the concentration of dichloromethane in the feed to the disproportionation reactor and the chemical vapor deposition reactor. 78. The method of claim 77, wherein controlling the concentration of dioxane in the feed to the chemical vapor deposition reactor comprises controlling the ratio of chlorine to rhodium in the feed to the disproportionation reactor. 79. The method of claim 78, wherein controlling the ratio of gas to enthalpy in the feed to the disproportionation reactor comprises: controlling the replenishment of the feed gas to the feed to the disproportionation reactor, trichlorosilane One of decane and dichlorodecane 152888.doc -13· 201130733 or more. 80. The method of claim 74, further comprising: supplying the dichlorosilane from the dioxane/trioxane separator to the chemical vapor deposition reactor. 81. The method of claim 80, wherein supplying dioxane from the dioxane/trioxane separator to the chemical vapor deposition reactor comprises: adjusting the feed to the chemical vapor deposition reactor This concentration of dioxin. 82. The method of claim 74, further comprising: storing all or a portion of the dichloromethane in a dioxane storage system or disposing the dioxane by a dioxane treatment system. 83. The method of claim 41, further comprising: separating hydrogen and gasification hydrogen from the chemical vapor deposition reactor effluent mixture by a CVD reactor followed by a hydrogen/gasification hydrogen separator to produce a a hydrogen/vaporized hydrogen stream and a hydrogen/vaporized hydrogen depleted stream; the hydrogen/gasification hydrogen separator is used in the hydrogen/gasification hydrogen rich stream by a CVD reactor Hydrogen is separated from the hydrogen; and the vaporized hydrogen from the hydrogen/hydrogenation hydrogen separator before the CVD reactor is sent to a gasification hydrogen storage system. 84. The method of claim 83, further comprising: mixing the hydrogen from the CVD reactor by a -CVD reactor premixer and the hydrogen from the disproportionation reactor The disproportionation reactor of the four gasification helium separator is rich in trichloromethane. 85. The method of claim 70, the further comprising: 152888.doc • 14· 201130733 the hydrogen depleted, hydrogen rich hydrogen-rich stream and formane from the gasification hydrogen separator of the CVD reactor Feeding to a disproportionation reactor pre-methane/hydrogenation reactor; and reacting the decane with the gasification hydrogen by the disproportionation reactor pre-decane/hydrogenation reactor to produce a gas containing three gas And four gasified oxime gas decane. 86. The method of claim 85, wherein one of the temperature in the pre-methane/hydrogenation reactor of the disproportionation reactor is about 5 Torr. 〇 with 700. (A range between: 87. The method of claim 85, wherein a temperature in the pre-reactor pre- decane/hydrogenation reactor is between about 1 〇〇〇c and about 6 〇〇t 88. The method of claim 85, wherein the temperature in the pre-reactor pre- decane/hydrogenation reactor is between about 300 Torr and about 500 ° C. 89. The method 'wherein the temperature of one of the procarbazine/hydrogenated hydrogen reactor in the disproportionation reactor is about 500 ° C. 90. The method of claim </ RTI> </ RTI> </ RTI> </ RTI> </ RTI> </ RTI> </ RTI> The molar ratio of methotane to hydrogen chloride in the feed of the nitrogen reactor ranges from about 1:1 to about 2:1. 91. The method of claim 85, wherein the decane is one of hydrogen chloride The ratio is in the range of from about 0:1 to about 1.5:1. 92' The method of claim 85, wherein the molar ratio of the gas to the gas to hydrogen is from about 1:1 to about 1:1. 9 3. As requested in item 8 5 &lt;Method&apos; wherein the molar ratio of methotane to hydrogen chloride is about 0.33:1. 94. According to the claim 85, + ^ Wanfa' wherein by a disproportionation reactor pre-methane/gas 152888.doc 15 201130733 hydrogenation reaction MW money reacts with the gasification hydrogen in the presence of - containing metal In the case of a catalyst, the (9) hydrazine is reacted with the hydrogen chloride. The method of claim 94, wherein the metal-containing catalyst comprises a copper moon length 95, wherein the metal-containing catalyst comprises substantially purely ground copper. 97. The method of claim 85, further comprising: a hydrogen depleted, vaporized hydrogen depleted stream after mixing a quantity of the CVD reactor by the disproportionation reactor pre-gas decane mixer; from the disproportionation reactor The gas sands of the former Jiashixi system/gasification hydrogen reactor; the four gasification ruthenium separators from a disproportionation reactor - rich in gas stream of four gasification; and, if necessary, purified gasification One of the mixture of one or more of hydrazine, purified tri-gas decane, purified digas sulphate or purified four-gas fossil sulphate, purified three gas stone sacred garden or purified two gas stone ceremonial courtyard Feeding; and controlling the amount of elemental gas and elemental stone supplied from each source to maintain. A ratio of gas to enthalpy in the feed of the Hai disproportionation reactor. 98. The method of claim 70, further comprising: depleting the argon gas from the gasification hydrogen separator after the CVD reactor by a CVD reactor post-methane/hydrogenation reactor The nitrogen stream is reacted with the methanol and the chemical vapor deposition reactor effluent mixture. 99. The method of claim 98, further comprising: mixing the hydrogen depleted, hydrogen rich hydrogen-rich stream with the decane and the chemical vapor phase in a decane/hydrogenation reactor after the CVD reactor The temperature of the chemical vapor deposition reactor effluent mixture in the decane/chlorine 152888.doc -16-201130733 hydrogenation reactor is adjusted to about 200 ° C and about before the deposition of the reactor effluent mixture. 600. Between 〇. 100. The method of claim 99, wherein adjusting the temperature of the chemical vapor deposition reactor effluent in the decane/hydrogenation reactor after the CVD reactor comprises: adjusting the heat exchanger by a CVD reactor The temperature. 101. The method of claim 99, wherein the chemistry in the calcining/gasification hydrogen reactor after adjusting the CVD reactor prior to mixing the vaporized hydrogen with the decane and the chemical vapor deposition reactor effluent mixture The temperature of the vapor deposition reactor effluent mixture comprises adjusting the temperature to between about 4 ° C and about 500 ° C. 102. The method of claim 98, wherein the molar ratio of methotane to vaporized hydrogen in the feed to the cvD reactor after the decane/hydrogenation reactor is from about 0:1 to about 2: The scope of 1. 103. The method of claim 1, wherein the one molar ratio of methotane to hydrogenation in the feed to the cvd reactor after the decane/hydrogenation reactor is from about 0:1 to about 1 · 5:1 range. 104. The method of claim 1, wherein the molar ratio of methotane to hydrogen chloride in the feed to the methane/evaporized argon reactor after the cvd reactor is from about 0:1 to about 1: The scope of 1. 105. The method of claim 1 wherein the one molar ratio of methotane to hydrogen chloride in the feed to the methane/hydrogenation reactor after the cvd reactor is about 0.33:1. 106. The method of claim 98, wherein the step of: adjusting the flow rate in the decane/hydrogen chloride reactor after the CVD reactor is 152888.doc • 17·201130733 to make the gas hydrogenation/methanine-CVD One of the residence time of the effluent mixture in the decane/hydrogenation reactor after the CVD reactor is sufficient to allow complete reaction of the vaporized argon with the decane. 107. The method of claim 106, wherein the CVD reactor post-methane/hydrogen chloride reactor comprises a sufficient total volume of one or more reaction chambers to provide one of a complete reaction suitable for allowing the vaporized hydrogen to react with the decane Residence time. 108. The method of claim 107, wherein the residence time of the effluent mixture in the decane/hydrogenation reactor after the CVD reactor is less than about 10 minutes. 109. The method of claim 107, wherein the residence time of the effluent mixture in the T-steam/hydrogenation reactor after the cvd reactor is less than about 5 minutes. 110. The method of claim 107, wherein the residence time of the effluent mixture in the decane/hydrogenation reactor after the CVD reactor is less than about i minutes. 111. The method of claim 107, wherein the residence time of the effluent mixture in the methan/hydrogenation reactor after the cvD reactor is less than about 〇5 minutes. 112. The method of claim 107, wherein the residence time of the effluent mixture in the methan/hydrogenation reactor after the cvD reactor is less than about 1 minute. 113. The method of claim 36, further comprising: separating the dichloromethane from the trichloromethane-rich stream after the disproportionation reactor and the second gas furnace to generate disproportionation Reaction 152888.doc -18· 201130733 is rich in dioxane stream. 114. The method of claim 113, further comprising: determining a concentration of dioxane in the feed to one of the chemical vapor deposition reactors; and adjusting the dichloride to the feed to the chemical vapor deposition reactor The concentration of Shi Xi burning. 115. The method of claim 114, wherein the concentration of dioxane in the feed to the chemical vapor deposition reactor comprises: adding the flow of the second gas after the disproportionation reactor to The feed to the chemical vapor deposition reactor. 116. The method of claim 114, wherein the adjusting the concentration of dioxane in the chemical vapor deposition reactor comprises: adding a chemical vapor deposition reactor effluent mixture from which hydrogen and hydrogen chloride have been removed. Dichlorodecane. 117. The method of claim 2, wherein mixing the composition comprising one of the decane and the composition comprising the ruthenium tetrachloride comprises: mixing one of the gas phase, the liquid phase, or the gas-liquid mixed phase The composition comprises a composition comprising one of hafnium tetrachloride in a gas phase, a liquid phase or a gas-liquid mixed phase. 118. The method of claim 2, further comprising: mixing the monochlorodecane, the second gas kiln by a disproportionation reactor pre-chlorosilane mixer prior to feeding the disproportionation reactor by the disproportionation reactor One or more of the institute and trichloromethane are fed with the disproportionation reactor. 119. The method of claim 118, wherein the one or more of monochlorodecane, dichlorodecane, and trichloromethane are one of four gasification enthalpy ratios at 〇 〇 152888.doc • 19· 201130733 To a range of about 3:1. 120. The method of claim 118, wherein the one or more of Ningsole, Dioxane, and Trioxane are in the form of a milk to about (1). The molar ratio of the gas cut is from about 0 121. The method of claim 118, wherein the one or more of the dry gas, the dioxane, and the trioxane are the molar ratio of the vaporized gas. In the range of from about 0.1:1 to about 1:1. 122. The method of claim 118, wherein the one of the nitrous oxide, the dichloro decane, and the trioxane is one of the four gasification enthalpy ratios of about 0.5..1 . 123. The method of claim 2, wherein the step of: converting the low boiling point contaminant into intermediate and high boiling phosphorus contaminants by the disproportionation reactor. Wherein the low boiling phosphorus contaminant comprises ΡΗ3 and 124. The method of claim 123 ΡΗ2α. 125. The method of claim 123 wherein the intermediate boiling point phosphorus contaminant comprises PHC12. 126. The method of claim 123, wherein the Gaohong dot dish contaminant comprises bismuth (3). 127. The method of claim 123, further comprising separating the four gas fossils and the intermediate and high boiling phosphorus contamination from the low-dot-disc pollutants in the self-disproportionation reaction effluent by the disproportionation reactor after the four gasification splitters. Things. 128. The method of claim m, further comprising: separating the high-boiling phosphorus contaminants from the tetrachloride and the intermediate boiling point 152888.doc •20·201130733 contaminants at the inter-disc separator . 129. The method of claim 128, further comprising: discarding the high boiling phosphorus contaminants. 130. The method of claim 128, further comprising: recycling the intermediate boiling point phosphorus contaminants to the disproportionation reactor; and converting the intermediate boiling point phosphorus contaminants to high boiling point phosphorus contaminants by the disproportionation reactor. 131. The method of claim 36, further comprising: separating the two gases from the trioxane in the trioxane-rich stream after the disproportionation reactor by a dioxane/trioxane separator The decane' is a material rich in dioxane/trioxane depleted after producing a disproportionation reactor and a material rich in trioxane/dioxane depleted after a disproportionation reactor. 132. The method of claim 1-3, further comprising: determining a dioxane concentration in the dioxane/trioxane depleted material after the disproportionation reactor. 133. The method of claim 131, further comprising: determining a trioxane concentration in the trioxane/dioxane depleted material after the disproportionation reactor. 134. The method of claim 131, wherein the material rich in dioxane/dichlorite after the disproportionation reactor is substantially pure dicha. 135. The method of claim 131, further comprising: storing the dichlorodecane/trichlorodecane-depleted material in a second gas sputum storage system. 136. The method of claim 131, further comprising: storing the trioxane/dioxane depleted material in a trioxane storage system. 137. The method of claim 131, further comprising: mixing the material rich in the two-gas stone/three gas stone exhausted with the material rich in three gas stone burning/two gas depleting materials And generating a chemical vapor deposition reactor feed; and supplying the feed to the chemical vapor deposition reactor. 138. The method of claim 137, wherein the dioxane-rich material and the trioxane/dioxane-depleted material are mixed: the mixture is stored from the dioxane. A system rich in dioxane/trichlorodecane depleted material. 139. The method of claim 137, wherein mixing the dioxane/trioxane depleted material with the trichlorodecane/dioxane depleted material comprises mixing from the trioxane storage system It is rich in trioxane/two gas stone exhausted materials. 140. The method of claim 137, wherein the dichlorodecane/trioxane depleted material is mixed with the trioxane/dioxane depleted material to produce a chemical vapor deposition reactor. The material comprises: adjusting a ratio of chlorine to stone eve in the chemical vapor deposition reactor feed. Ml. - A method of making a crucible, the method comprising: performing a chemical vapor deposition on a mixture comprising one of trioxane by a chemical vapor deposition reactor; recovering rhodium from the chemical vapor deposition reactor; 152888. Doc -22- 201130733 releasing a first-rate product mixture from the chemical vapor deposition reactor, the effluent mixture comprising hydrogen, four gasified ruthenium, and one or more of hydrogenation gas, dioxane, and trichloromethane; And converting the vaporized hydrogen in the effluent mixture from the chemical vapor deposition reactor to chlorodecane by a CVD reactor followed by an in-situ gasification hydrogen reactor. 142. The method of claim 14, wherein the method further comprises: performing a first CVD reaction prior to supplying the effluent mixture from the chemical vapor deposition reactor to the in situ hydrogen chloride reactor after the CVD reactor is supplied to the CVD reactor The post-heat exchanger controls the temperature of the effluent mixture from the chemical vapor deposition reactor. 143. The method of claim 142, wherein the temperature of the effluent mixture from the chemical vapor deposition reactor is controlled by a first CVD reactor post heat exchanger comprising: from the chemical vapor deposition reactor The temperature of the effluent mixture is controlled to be about 2 Torr. 〇 to about 700. 144. The method of claim 142, wherein the temperature of the effluent mixture from the chemical vapor deposition reactor is controlled by a first cvd reactor post heat exchanger comprising: : controlling the temperature of the effluent mixture from the chemical vapor deposition reactor to a temperature ranging from about 3 Torr to about 6 Torr. 145 • Method of claim ι 42 Wherein the temperature of the effluent mixture from the chemical vapor deposition reactor is controlled by a first cvd reactor post heat exchanger comprising: the stream from the chemical vapor deposition reactor 152888.doc -23 - 201130733 The temperature of the mixture of the mixture is controlled to be about 500. The method of claim 142, wherein the first CVD reactor after the heat exchanger is to be from the chemical vapor deposition reactor After the effluent mixture is supplied to the CVD reactor and before the in-situ gasification of the hydrogen reactor, heat is exchanged from an effluent from the in-situ gasification hydrogen reactor after the C VD reaction to the chemical vapor deposition reactor. The method of claim 141, wherein the effluent mixture from the chemical vapor deposition reactor has a residence time of less than about 1 minute in the in-situ gasification hydrogen reactor after the CVD reactor. 148. The method of claim 141, wherein the effluent mixture has a residence time of less than about 5 minutes in the in situ gasification hydrogen reactor after the CVD reactor. 149. The method of claim 141, wherein The residence time of the effluent mixture in the in-situ gasification hydrogen reactor after the CVD reactor is less than about 1 minute. 150. The method of claim 141, wherein the effluent mixture is hydrolyzed in situ after the CVD reactor One of the residence times in the apparatus is less than about 分钟5 minutes. 15L. The method of claim 141, wherein the effluent mixture is internally vaporized in the hydrogen reaction H after the cvd reactor - the residence time is less than about 1 minute. The method of claim 141, further comprising: borrowing & cooling the system to cool an effluent mixture from the in-situ gasification hydrogen reactor from the Cvd reactor. I52888.doc • 24-20 153. The method of claim 152, further comprising: converting the effluent mixture from the in-situ chlorination reactor after the CVD reactor to a gas-liquid two-phase mixture by a compressor system. The method of claim 153, further comprising: cooling the gas-liquid two-phase mixture from the compressor system by a second cooling system. 155. The method of claim 154, wherein the second cooling system comprises a The second CVD reactor post heat exchanger. 156. The method of claim 154, further comprising: using a CVD reactor followed by a four gasification helium absorber/hydrogen separator from the CVD reactor after in situ gas The effluent mixture of the hydrogenation reactor separates hydrogen. 157. The method of claim 156, further comprising: saturating the trioxane in the hydrogen separated by the four gasification waste absorber/hydrogen separator after the CVD reactor. 158. The method of claim 156, further comprising: mixing the hydrogen from the ruthenium tetrachloride absorber/hydrogen separator from the CVD reactor with one of the feed to the chemical vapor deposition reactor. 159. The method of claim 156, further comprising: passing the ruthenium tetrachloride/trioxane separator after a CVD reactor from the effluent/hydrogen separator from the CVD reactor The four gasification enthalpies in the mixture of materials separate the three gas stone courts. 160. The method of claim 15 further comprising: feeding trioxane from the ruthenium tetrachloride/trichloromethane separator to 152888.doc • 25-201130733 the four gas enthalpy absorber/hydrogen separation And reacting the triclosan with the ruthenium tetrachloride in the ruthenium tetrachloride absorber/hydrogen separator. 161. The method of claim 160, further comprising: adjusting a temperature of the three gas smelting furnace prior to feeding the dioxane to the four gas enthalpy absorber/hydrogen separator. 162. The method of claim 161, wherein adjusting the temperature comprises adjusting the temperature of the triclosan to about 35. Hey. 163. The method of claim 159, further comprising: mixing the trichloromethane from the four gasification rhodium/trioxane separator with one of the chemical vapor deposition reactors. 164. The method of claim 159, further comprising: cooling the trioxane; and withdrawing a lower gas phase material from the gas phase from the trichloromethane. 165. The method of claim 159, further comprising: separating P(:l32 high boiling point phosphorus contaminants from the antimony tetrachloride by a high boiling point phosphorus separator. 166. The method of claim 159 further The method comprises: mixing the two gas and burning to one of the chemical vapor deposition reactors. 167. A method for manufacturing a crucible, the method comprising: using a chemical vapor deposition reactor, including triclosan One of the mixture is subjected to a chemical vapor deposition, and the hydrazine is recovered from the chemical vapor deposition reactor; 152888.doc -26- 201130733 The primary vapor mixture is released from the chemical vapor deposition reactor, and the effluent mixture includes hydrogen And one or more of ruthenium tetrachloride and vaporized hydrogen, dioxane and difluorocarbon; and the effluent mixture from the chemical vapor deposition reactor is cooled by a first cooling system. 168. The method of claim 167, further comprising: separating hydrogen from the cooled effluent mixture from the chemical vapor deposition reactor by a CVD reactor followed by a hydrogen separator; A CVD reactor post-hydrogen chloride separator separates the gasification hydrogen from the effluent mixture from the chemical vapor deposition reactor from which hydrogen has been removed by the hydrogen separator after the CVD reactor. 169. The method further comprising: feeding the vaporized hydrogen and the gangue from the hydrogen chloride separator of the CVD reactor to a gasification hydrogen-methane reactor; and using the hydrogen chloride-decane reactor The methooxane reacts with the hydrogenated gas to produce a gas decane comprising trioxane. 170. The method of claim 169, further comprising: passing the decane/hydrogenation reactor after a CVD reactor The vaporized hydrogen of the gasification hydrogen separator of the CVD reactor is reacted with the methanol and the chemical vapor deposition reactor effluent mixture. 171. A method for producing a crucible, the method comprising: using a disproportionation reactor Reversing the reaction of a disproportionation reactor comprising trioxane and decane to form a disproportionation reactor product comprising dioxane, trichlorodecane and tetragas hydride; 152888.doc -27- 201130733 a chemical vapor deposition reactor performing a chemical vapor deposition on a mixture from the disproportionation reactor to deposit germanium on one of the substrates in the chemical vapor deposition reactor; and from the chemical vapor deposition reactor 172. The method of claim 171, further comprising: controlling a composition of the disproportionation reactor feed comprising trioxane and formoxane such that a ratio of gas to enthalpy in the disproportionation reactor feed is at The range between about 1:1 and about 3: 1. 173. The method of claim 171, further comprising: controlling a composition of the disproportionation reactor feed comprising trioxane and formane to cause the disproportionation The ratio of gas to stone in the reactor feed is in the range between about 1:1 and about 2.5:1. 174. The method of claim 171, further comprising: controlling a composition of the disproportionation reactor feed comprising trioxane and formoxane such that the ratio of gas to enthalpy in the disproportionation reactor feed is about 1 : Range between 1 and about 2:1. 175. The method of claim 171, further comprising: controlling a composition of the disproportionation reactor feed comprising trioxane and formoxane such that the ratio of gas to enthalpy in the disproportionation reactor feed is about 1.25 : Range between 1 and about 1.75:1. 176. The method of claim 171, further comprising: controlling a composition of the disproportionation reactor feed comprising trioxane and decane such that the ratio of gas to enthalpy in the disproportionation reactor feed is about 1.75 : Range between 1 and about 2.25:1. 172. The method of claim 171, further comprising: controlling a composition of the disproportionation reactor feed comprising trioxane and decane to cause a gas pair in the disproportionation reactor feed The ratio is about 1.5:1. 178. The method of claim 171, further comprising: controlling a composition of the disproportionation reactor feed comprising trioxane and decane such that the ratio of gas to enthalpy in the disproportionation reactor feed is about 179 The method of claim 17, wherein the disproportioning reaction of the disproportionation reactor to form a disproportionation reaction product comprising dioxane, trichloromethane, and tetragas hydride comprises: optimizing operating conditions of the disproportionation reactor To maximize the production of dioxane. 180. The method of claim 179, further comprising: separating four gasification hydrazines from a product of the disproportionation reactor in a post-disproportionation reactor in a four gasification helium separator to produce a disproportionation reactor followed by tetrachloro Chemical 181. The method of claim 180, the further comprising: After the reactor, it is rich in materials from Sanshishi Xiyuan. 182. The method of claim 18, after loading _ Burning Handu. 183888.doc -29-201130733 183. The method of claim 18, further comprising: determining a triclosan concentration in the trioxane-rich material after the disproportionation reactor. 184. The method of claim 181, wherein the material enriched in the gas after the disproportionation reactor is substantially pure two gas. 185. The method of claim 181, further comprising: storing the dichloromethane-rich material in the disproportionation reactor in a chlorinated storage system. 186. The method of claim 1, wherein the method further comprises: storing the material rich in the triphosite after the disproportionation reactor in the clathra storage system. 187. The method of claim 181, further comprising: mixing the dioxane-rich material with the trichloromethane-rich material to produce a chemical vapor deposition reactor feed; and supplying the feed To the chemical vapor deposition reactor. 188. The method of claim 187, wherein the material enriched in the gas-enriched decane comprises a material comprising a dioxane-containing material from the dioxane storage system. 189. If the claimant 187 is enriched with the material system of the three-gas traits: the mixture containing the three gases, the rich and the second gas (four) material feed contains Chemical gas (four) product reactor s chemical vapor deposition reactor feed gas in the 152888.doc 201130733 a ratio. 191. The method of claim 181, further comprising: supplying the disproportionation reactor post-rich -$ » &amp; field 3 - calcined material directly to the § hai chemical vapor deposition reactor. 192. The method of claim 181, the advancing step comprising: supplying the material after the disproportionation reactor with the celite-rich material directly to the chemical vapor deposition reactor. 193. The method of claim 181, further comprising: mixing the dioxane-rich material after the disproportionation reactor with the trichloromethane-rich material after the disproportionation reactor; and enriching the disproportionation reactor The mixture of the material of dioxane and the material of the trichloromethane-rich material after the disproportionation reactor is supplied to the CVD reactor. 194. The method of claim 181, further comprising: mixing the trioxane-rich material and the decane after the disproportionation reactor; and dissolving the trioxane-rich material and the methotane after the disproportionation reactor The mixture is supplied to the disproportionation reactor. 195. A method of making a crucible comprising: manufacturing and supplying methotane; and treating the rock garden according to the methods claimed herein. 152888.doc -31 -