201125996 六、發明說明： 【發明所屬之技術領域】 [0001] 本發明涉及一種濺鍍裝置。 【先前技術】 [0002]先前的濺鍍裝置通常包括圓柱狀的中空鍍膜腔、設置在 鑛膜腔内用於承放被錢物件的基座以及間隔均勻地設置 在所述鍍膜腔的圓柱狀外側壁上的靶座。所述靶座朝向 鍍膜腔内部的一側上設置有濺鍍靶材。在進行鍍膜時， 所述乾材被加速的帶電粒子轟擊而向鍍膜腔内濺射靶材 原子以附著在被鍍物件的表面上形成鍍膜層。 [0003] [0004] [0005] 099102395 所述把座通常固定安裝在所述外侧壁上，而且僅在靶座 面向鍍膜腔的一側設置有靶材。當經過一段時間的濺鍍 後耙材所在的一侧會被四處飛濺的靶材污染而變髒且 靶材亦會損耗，所以必須將整個靶座拆下來進行清潔及 更換靶材。惟係，拆換靶座比較麻煩且耗費時間，從而 景夕響到錢膜量產的效率。 【發明内容】 繁於此，有必要提供-種可方便清潔及更換崎的_ 不發明提供一種濺鍍裝置，其包拉岡 、乾座及滑動框架。所述㈣腔包括—圓柱狀的夕 ’所述外侧㈣舰上開設有概_均勻的通; 述把座包括至少兩個與所述通孔的形狀相對應^ 栽部及-端與所述祕轉動連接的轉_。所幻 栽部上設置有狀紐錄材材料，所述通孔與4 表單編號Λ0101 第4頁/共15頁 、 201125996 上下端之間的外侧壁上沿鍍膜 框架。所述轉錄與$座㈣Ί置有所述滑動 所述滑動_上。所綠分職動連接在 达体 接固定在所述通孔的四周 邊緣上以將至少一個所述靶材 周 ^ χ 取栽部密封在鍍膜腔的内 4 °所述靶座在所述滑動框架 ^ _ '、上q動並繞轉動轴旋轉以 替換进封在鍍膜腔内的靶材承栽 [0006] Ο [0007] Ο [0008] 相對於先前技術，本發明所提供的⑽裝置藉由在郎 腔的外側壁上滑動連接具有可旋轉替換的錄材承載部 的乾座，錢得所錢«置在更換麟_時只需要 將該靶座拉出旋轉便可快速地替換新的靶材承載部，而 無須拆裝靶座，且在進行濺鍍的同時可對剛撤換的靶材 承載部進行清潔及上料，可節省更換靶材的時間，提高 工作效率。 【實施方式】 如圖1及圖3所示，本發明實施方式所提供的濺鍍裝置！包 括圓筒狀的中空鍍膜尊10、靶座12及滑動框架14。所述 靶座12藉由滑動框架14可滑動地連接在所述鍍膜腔10上 所述鍍膜腔10包括一圓柱狀的外側壁1〇〇、一對圓形的頂 蓋102及底蓋104。所述外側壁1〇〇的外側圓周上開設有 複數間隔均勻的通孔l〇〇a。所述通孔10〇a沿平行所述鑛 膜腔10的中心軸的方向由所述外側壁1〇〇的一端延伸至另 一端。所述每一通孔l〇〇a的四周的外側壁100上沿垂直於 所述外側壁100的方向向外延伸出一連接框100b。在所述 每一連接框l〇〇b的外端面上分別開設有複數用於固定乾 099102395 表單编號A0101 0992004614-0 201125996 座1 2的螺孔1 〇 〇 c。 [0009] [0010] [0011] 所述滑動框架14設置在所述 括平行相對的上滑議及下T1G的外側壁上，其包 及下滑軌142分賴由各㈣滑軌140 與頂蓋1〇2及底蓋104之間=垂直設置在所述通孔 滑軌140及下滑軌142分別沿j外側壁1GG上。所述上 伸出—段距離。 *膜腔10的徑向向外延 請一併參閱圖2，所述靶座12 m及乾材基座124。所述固=固定框120、轉動轴 包括相互平行的-綱12=m為—矩形邊框，其 邊120a與純施分驗 1長邊12Qb。所述短 長邊咖上分別開設有複數與^目連。所述短邊_和 通職e。所糊咖124、以觀驗對應的螺紋 兩個乾材承_124a。所；矩形結構，其包括至少 有用於濺鍵的靖料。所述：承載部心上分別設置 括滑動端122a、與滑動端12^動軸122,—圓桿’其包 置在所述滑動額心侧1咖《及設 在本實施方式中，所述靶 且彼此平行相隔m❹^1243的個數為兩個， 基議還可《包括三個互成6二是：每〜 ’或者四μ㈣度角叫材承栽 應地調整崎基座124的形 ^需要對 的角度即可。 料树承“l24a之間 [0012] 請一併參閱圖2、圖3及 圖 ’在進行組裝時， 所述轉動軸 099102395 表單編號A0101 第6頁/共 15頁 〇992〇〇4ft 201125996 Ο 122的連接端122b分別與所述固定框120的短邊l2〇a的中 部轉動連接。所述靶材基座丨24固定嵌合在所述固定框 120内。所述固定框120及固定嵌合在固定框12〇中的靶 材基座124可繞所述轉動軸122旋轉。所述轉動軸122上 的滑輪122c分別收容在與所述通孔1〇〇3對應的上滑軌 14〇及下滑軌142内。所述靶座12沿上滑轨14〇及下滑軌 142潸動至所述鍍膜腔1〇的外側壁100處，轉動所述固定 框120及靶材基座124以使所述其中一個靶材承載部12切 朝甸所述外侧壁1〇〇上的通孔1〇〇a，所述靶座12藉由固 定樞120上的螺紋通孔l2〇c螺接固定在所述連接框丨⑽匕 的嫘孔100c内以使所述其中一個靶材承載部124a密封在 所述鑛·膜腔10的内部。 [0013] ❹ 在進行濺鍍時，所述靶座12上位於鍍膜腔10内的靶材承 載部124a受到鍍膜腔1〇内被加速的帶電粒子轟擊而向鍍 膜腔10内麟乾材原子。當經過一段時間㈣鑛而需要 更換及清潔被森擊的把材承載部1243時，先將固定在所 述外側壁100上的固録120及乾材基座124沿所述上滑 軌^及下滑軌142拉離所述外侧壁刚。接著將所述固 定權120連同乾材基座124繞所述轉動轴122旋轉18〇度， 以使得另-側的乾材承栽部12_向外側壁⑽上的通孔 1〇〇a。最後，將所述另一侧的粗材承載部1243密封在鍍 膜腔1〇的心卩就可以再:欠進行藏鑛操作。此時，剛被撤 換的歡材承載部124a朝向鑛膜腔10的外部，所以在所述 另-側的把材承載部I24a進行雜的同時對被撤換的乾 材承載部丨24&進行清潔並重新設置乾材材料。 099102395 表單編號A0101 第7頁/共 15頁 0992004614-0 201125996 [0014] 所述濺鍍裝置1藉由在鍍膜腔丨〇的 呈 側壁100上滑動連接 ”有可k轉替換的雙糾承载部124&叫座η，以使得 所述錢鍍裝置i在更誠射㈣時P、需要將錄座12拉出 旋轉便可快速地替換新的把材承栽部l24a，而無須拆裝 靶座12，且在進行濺鍍的同時可對剛撖換的粑材承栽邹 124a進行清潔及上料，玎節省更換靶材的時間，提高工 作效率。 [0015] 本技術領域的普通技術人員應當認識到，以上的實施方 式僅係用來說明本發明，而益非用作為對本發明的限定 ，只要於本發明的實質精神範圍之内，對以上實施例所 作的適當改變和變化均落於本發明要求保護的範圍之内 〇 .. 【圖式簡單說明】 [0016] 圖1係本發明實施方式所提供的濺鍍裴置的結構示意圖。 [0017] 圖2係圖1中濺鍍裝置的靶座的側祗圖p [0018] 圖3係圖1中濺鍍裝置的靶座的滑叙狀態示意圖。 [0019] 圖4係圖1中濺鍍裝置的靶座的固定狀態示意圖。 【主要元件符號說明】 [0020] 濺鍍裝置 1 [0021] 鍍膜腔 1〇 [0022] 靶座 12201125996 VI. Description of the Invention: [Technical Field of the Invention] [0001] The present invention relates to a sputtering apparatus. [Prior Art] [0002] The prior sputtering apparatus generally includes a cylindrical hollow coating chamber, a pedestal disposed in the mineral film chamber for receiving the object to be affixed, and a cylindrical shape uniformly spaced apart from the coating chamber The target seat on the outer side wall. A sputtering target is disposed on a side of the target seat facing the interior of the coating chamber. When the coating is performed, the dry material is bombarded by the accelerated charged particles to sputter the target atoms into the coating chamber to adhere to the surface of the object to be plated to form a plating layer. [0003] [0005] 099102395 The seat is generally fixedly mounted on the outer side wall, and a target is disposed only on a side of the target seat facing the coating chamber. After a period of sputtering, the side of the coffin will be contaminated by the splashing target and become dirty and the target will be worn out, so the entire target must be removed for cleaning and replacement of the target. However, the removal of the target seat is cumbersome and time consuming, and thus the efficiency of mass production of the money film is heard. SUMMARY OF THE INVENTION In view of the above, it is necessary to provide a kind of convenient cleaning and replacement of the shovel. _ No invention provides a sputtering apparatus, which is provided with a glazing, a dry seat and a sliding frame. The (four) cavity includes a cylindrical shape, and the outer side (four) of the ship is provided with a substantially uniform passage; the seat includes at least two corresponding to the shape of the through hole and the end and the The rotation of the connection is _. The imaginary plant is provided with a material for the recording material, and the through hole is coated with a coating frame on the outer side wall between the upper and lower ends of the form number Λ0101, page 4/15, and 201125996. The transcription and the seat (four) are arranged to slide the slide_up. The green interlocking connection is fixed on the peripheral edge of the through hole to seal at least one of the target circumferences in the coating chamber, and the target seat is in the sliding The frame ^ _ ', the upper q moves and rotates around the rotating shaft to replace the target bearing that is enclosed in the coating chamber. [0007] 0008 [0008] Compared with the prior art, the (10) device provided by the present invention By slidingly connecting the dry seat with the rotatable replacement of the recording material bearing part on the outer side wall of the lang cavity, the money is saved. When the replacement lining is used, it is only necessary to pull the target seat to rotate and quickly replace the new one. The target bearing portion does not need to disassemble the target seat, and the target bearing portion that has just been replaced can be cleaned and loaded while being sputtered, thereby saving time for replacing the target and improving work efficiency. Embodiments As shown in FIGS. 1 and 3, a sputtering apparatus according to an embodiment of the present invention is provided! The cylindrical hollow coating 10, the target 12 and the sliding frame 14 are included. The target holder 12 is slidably coupled to the coating chamber 10 by a sliding frame 14. The coating chamber 10 includes a cylindrical outer side wall 1 , a pair of circular top covers 102 and a bottom cover 104. A plurality of through holes l〇〇a are formed on the outer circumference of the outer side wall 1〇〇. The through hole 10〇a extends from one end of the outer side wall 1〇〇 to the other end in a direction parallel to the central axis of the film chamber 10. A connecting frame 100b extends outwardly from the outer side wall 100 of each of the through holes 10a in a direction perpendicular to the outer side wall 100. A plurality of screw holes 1 〇 〇 c for fixing the dry 099102395 form number A0101 0992004614-0 201125996 seat 12 are respectively disposed on the outer end faces of each of the connecting frames 10b. [0011] [0011] The sliding frame 14 is disposed on the outer side walls of the parallel opposing upper and lower T1G, and the bag and the sliding rail 142 are separated by the (four) sliding rails 140 and the top cover. Between the 2 〇 2 and the bottom cover 104 = vertically disposed on the through-hole slide rail 140 and the lower slide rail 142 respectively along the outer side wall 1GG of the j. The upper extension - the distance of the segment. * Radial outward extension of the membrane chamber 10. Referring to Figure 2 together, the target holder 12 m and the dry material base 124. The solid=fixing frame 120 and the rotating shaft include parallel to each other - the frame 12=m is a rectangular frame, and the side 120a and the purely divided test 1 long side 12Qb. The short long-side coffee is respectively provided with a plurality of links. The short side _ and the general e. The paste coffee 124, to observe the corresponding thread two dry material bearing _124a. A rectangular structure that includes at least a seal for the splash bond. The housing portion is provided with a sliding end 122a and a sliding end 121, respectively, and a round rod 'which is disposed on the sliding front side 1 and is provided in the embodiment. The number of targets and parallel to each other is m❹^1243, and the number can also be "including three mutual formations. 6: Each ~' or four μ (four) degree angles are used to adjust the shape of the shovel base 124. ^ Need the right angle. The material tree is "between l24a [0012] Please refer to Fig. 2, Fig. 3 and Fig. together. When assembling, the rotating shaft 099102395 Form No. A0101 Page 6 of 15 〇992〇〇4ft 201125996 Ο 122 The connecting ends 122b are respectively rotatably connected to the middle of the short side l2〇a of the fixing frame 120. The target base 丨24 is fixedly fitted in the fixing frame 120. The fixing frame 120 and the fixing and fitting are fixed. The target base 124 in the fixed frame 12A is rotatable about the rotating shaft 122. The pulleys 122c on the rotating shaft 122 are respectively received in the upper sliding rails 14 corresponding to the through holes 1〇〇3, and In the lower rail 142, the target base 12 is slid along the upper rail 14 下滑 and the lower rail 142 to the outer side wall 100 of the coating chamber 1 , and the fixing frame 120 and the target base 124 are rotated to make the One of the target bearing portions 12 cuts the through hole 1〇〇a on the outer side wall 1 of the south side, and the target base 12 is screwed and fixed by the threaded through hole l2〇c on the fixed pivot 120. The inside of the bore 100c of the connecting frame 10(10)匕 is such that the one of the target carrying portions 124a is sealed inside the mine/membrane chamber 10. [0013] When the sputtering is performed, the target bearing portion 124a of the target holder 12 located in the coating chamber 10 is bombarded by charged particles accelerated in the coating chamber 1 to the inner cavity of the coating chamber 10. When a period of time (4) When the mine needs to replace and clean the load-bearing portion 1243, the sluice 120 and the dry material pedestal 124 fixed on the outer sidewall 100 are first pulled along the upper rail and the lower rail 142. The outer side wall is just rotated. Then, the fixing right 120 is rotated 18 degrees around the rotating shaft 122 together with the dry material base 124 so that the other side of the dry material bearing part 12_ is passed on the outer side wall (10). Hole 1〇〇a. Finally, sealing the other side of the thick material bearing portion 1243 in the heart of the coating chamber 1 卩 can be: owing to the mining operation. At this time, the fresh material bearing portion that has just been replaced 124a faces the outside of the film chamber 10, so that the removed dry material carrying portion &24& is cleaned and the dry material is re-set while the other side of the material carrying portion I24a is being mixed. 099102395 Form No. A0101 Page 7 of 15 0992004614-0 201125996 [0014] The sputtering apparatus 1 is coated by a film The squat is slidably connected to the side wall 100. The double aligning bearing portion 124 &ft; can be replaced by a knuckle, so that the money plating device i is more injecting (four) P, and the recording 12 needs to be pulled out and rotated. The new material bearing part l24a can be quickly replaced without disassembling the target base 12, and the coffin material can be cleaned and loaded while the sputtering is being carried out, and the replacement target is saved. Material time, improve work efficiency. [0015] Those skilled in the art should understand that the above embodiments are merely illustrative of the present invention, and are not intended to limit the present invention as long as it is within the spirit of the present invention. The appropriate changes and modifications made by the examples are within the scope of the claimed invention. [FIG. 1] FIG. 1 is a schematic view showing the structure of a sputtering apparatus provided by an embodiment of the present invention. 2 is a side view of a target holder of the sputtering apparatus of FIG. 1 [0018] FIG. 3 is a schematic diagram of a sliding state of a target holder of the sputtering apparatus of FIG. 1. 4 is a schematic view showing a fixed state of a target holder of the sputtering apparatus of FIG. 1. [Main component symbol description] [0020] Sputtering device 1 [0021] Coating chamber 1〇 [0022] Target holder 12
[0023] 滑動框架 U[0023] sliding frame U
[0024] 外側壁 1 〇 0 099102395 表單編號 A0101 第 8 頁/共 15 頁 0992004614-0 201125996 [0025] 頂蓋 102 [0026] 底蓋 104 [0027] 通孔 100a [0028] 連接框 100b [0029] 螺孔 100c [0030] 上滑軌 140 [0031] 下滑執 142 〇 [0032] 固定框 120 [0033] 轉動軸 122 [0034] 靶材基座 124 [0035] 短邊 120a [0036] 長邊 120b [0037] 螺紋通孔 120c [0038] 靶材承載部 124a [0039] 滑動端 122a [0040] 連接端 122b [0041] 滑輪 122c 099102395 表單編號A0101 第9頁/共15頁 0992004614-0[0024] Outer Side Wall 1 〇0 099102395 Form No. A0101 Page 8 of 15 0992004614-0 201125996 [0025] Top Cover 102 [0026] Bottom Cover 104 [0027] Through Hole 100a [0028] Connection Frame 100b [0029] Screw hole 100c [0030] Upper slide rail 140 [0031] Sliding 142 〇 [0032] Fixing frame 120 [0033] Rotary shaft 122 [0034] Target base 124 [0035] Short side 120a [0036] Long side 120b [ 0037] Threaded through hole 120c [0038] Target bearing portion 124a [0039] Sliding end 122a [0040] Connecting end 122b [0041] Pulley 122c 099102395 Form No. A0101 Page 9 / Total 15 Page 0992004614-0